WO2022202461A1 - Processing device and processing method - Google Patents
Processing device and processing method Download PDFInfo
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- WO2022202461A1 WO2022202461A1 PCT/JP2022/011457 JP2022011457W WO2022202461A1 WO 2022202461 A1 WO2022202461 A1 WO 2022202461A1 JP 2022011457 W JP2022011457 W JP 2022011457W WO 2022202461 A1 WO2022202461 A1 WO 2022202461A1
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- Prior art keywords
- electrode
- liquid
- wet
- pulse
- dry
- Prior art date
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- 238000003672 processing method Methods 0.000 title description 4
- 239000007788 liquid Substances 0.000 claims abstract description 51
- 239000001257 hydrogen Substances 0.000 claims description 38
- 229910052739 hydrogen Inorganic materials 0.000 claims description 38
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 26
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 25
- 239000007789 gas Substances 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 5
- 239000007921 spray Substances 0.000 claims description 3
- 230000003213 activating effect Effects 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 28
- 238000002485 combustion reaction Methods 0.000 description 28
- 239000000203 mixture Substances 0.000 description 13
- 238000010586 diagram Methods 0.000 description 12
- 239000000446 fuel Substances 0.000 description 10
- -1 hydrogen ions Chemical class 0.000 description 10
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 9
- 238000003780 insertion Methods 0.000 description 8
- 230000037431 insertion Effects 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 6
- 230000005684 electric field Effects 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000008151 electrolyte solution Substances 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000002407 reforming Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
- C01B3/02—Production of hydrogen or of gaseous mixtures containing a substantial proportion of hydrogen
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/02—Hydrogen or oxygen
- C25B1/04—Hydrogen or oxygen by electrolysis of water
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/13—Ozone
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/60—Constructional parts of cells
- C25B9/65—Means for supplying current; Electrode connections; Electric inter-cell connections
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
Definitions
- the present disclosure relates to processing equipment and processing methods for processing liquids or gases.
- Patent Document 1 As a method of modifying the substance contained in the space, a method of generating low-temperature plasma in the electrode space is used (see Patent Document 1, for example). In order to improve the processing speed, a method of introducing a liquid into plasma to generate hydrogen or the like has also been tried (see, for example, Patent Documents 2 and 3).
- the present inventors recognized that further improving the efficiency of modifying substances was a problem and came up with the technology of the present disclosure.
- the present disclosure is made in view of such problems, and its purpose is to improve liquid or gas processing technology.
- a processing apparatus includes a first electrode, a second electrode, and a pulse supply unit that applies a pulse voltage between the first electrode and the second electrode. .
- a liquid is present on the surface of the first electrode and a gas separates the liquid from the second electrode.
- Another aspect of the present disclosure is a processing method.
- the method comprises the steps of: presenting a liquid on the surface of a first electrode; applying a positive pulse voltage between the first electrode and the second electrode to activate a substance contained in the liquid; applying a negative pulse voltage between the electrode and the second electrode to return the activated material in the liquid to the surface of the first electrode.
- liquid or gas processing technology can be improved.
- FIG. 4 illustrates what happens when applying a steep high voltage positive pulse to the anode followed by a steep negative pulse; It is an enlarged view near an anode.
- FIG. 4 is a diagram showing potentials near the anode; It is a figure for demonstrating the method to process a liquid by a processing apparatus.
- FIGS. 6A and 6B are diagrams schematically showing configurations of a first (wet) electrode and a second (dry) electrode.
- 7A and 7B are diagrams schematically showing the configuration of the processing apparatus according to the first embodiment of the present disclosure; FIG.
- FIG. 4 is a diagram showing voltage supplied by a pulse supply unit, current flowing through the processing unit, and power in the processing apparatus according to the first embodiment;
- FIG. FIG. 4 is a diagram showing the result of treating a mixture of pure water and air by the treatment apparatus according to Example 1;
- FIG. 5 is a diagram schematically showing the configuration of a processing apparatus according to Example 2 of the present disclosure;
- FIG. 10 is a diagram showing results of processing pure water, ethanol, and 95% ethanol by the processing apparatus according to Example 2;
- FIG. 10 is a diagram showing plasma when pure water is processed by the processing apparatus according to Example 2;
- 13(a) and 13(b) are diagrams schematically showing the configuration of an internal combustion engine provided with the processing device according to the embodiment.
- 1 is a diagram schematically showing the configuration of an internal combustion engine provided with a processing device according to an embodiment;
- FIG. 1 schematically shows the configuration of a processing device according to an embodiment.
- the processing device 1 comprises a processing portion 4 comprising a first (wet) electrode 2 and a second (dry) electrode 3, and a voltage pulse between the first (wet) electrode 2 and the second (dry) electrode 3. and a pulse supply unit 5 for applying A liquid 6 to be modified is present on the surface of the first (wet) electrode 2 .
- a gas 7 separates the liquid 6 from the second (dry) electrode 3 .
- the second (dry) electrode 3 is grounded, and voltage pulses in forward and reverse directions are applied to the first (wet) electrode 2 from the pulse supply unit 5 .
- the second (dry) electrode 3 may be connected to the pulse supply section 5 .
- a positive pulse may be applied to the second (dry) electrode 3 to achieve the same potential state as a negative pulse to the first (wet) electrode 2 .
- the second (dry) electrode 3 may be composed of a wet electrode similar to the first (wet) electrode 2 and may be separated from the first (wet) electrode 2 by a gas 7 .
- the voltage pulse may be a current pulse or a power pulse.
- the liquid molecules present on the surface of the first (wet) electrode 2 are It is activated by impact ionization and electric field effect, and active species such as ions, radicals, excited molecules and excited atoms are generated.
- active species such as ions, radicals, excited molecules and excited atoms are generated.
- a discharge occurs between the first (wet) electrode 2 and the second (dry) electrode 3, and plasma is generated from gas molecules originating from the active species.
- the molecular density of liquid is at the level of 10 22 /cm 3 , which is three orders of magnitude higher than the molecular density of gas at atmospheric pressure, 10 19 /cm 3 .
- FIG. 2 to 4 are diagrams for explaining a method of processing liquid by the processing device 1.
- FIG. FIG. 2 illustrates what happens when applying a sharp high voltage positive pulse to the first (wet) electrode 2 followed by a sharp negative pulse.
- FIG. 3 is an enlarged view of the vicinity of the first (wet) electrode 2.
- FIG. 4 shows the potential near the first (wet) electrode 2 .
- the liquid 6 on the surface of the first (wet) electrode 2 is water and the gas 7 between the liquid 6 and the second (dry) electrode 3 is air.
- oxygen atoms O On the second (dry) electrode 3 side, electrons injected from the second (dry) electrode 3 collide with oxygen molecules O 2 in the air to generate oxygen atoms O, and oxygen atoms O and excited oxygen molecules O 2 combine to generate ozone O3 . Further, the oxygen atoms O bond to each other to generate an oxygen molecule O2 .
- the hydrogen ions H + generated by the oxidation reaction on the anode side move to the cathode side in the electrolytic solution, receive electrons at the cathode, and become hydrogen molecules H 2 .
- Such a method which is completely different in technical concept from the conventional one, can significantly shorten the movement path of hydrogen ions H + , so that the forward reaction in which hydrogen molecules H 2 are generated from hydrogen ions H + can be promoted. can be formed, and the probability of a reverse reaction in which the generated hydrogen molecules H 2 and OH recombine to return to water H 2 O can be reduced. Therefore, the hydrogen generation efficiency can be dramatically improved.
- the cycle of generating hydrogen ions H + from water and generating hydrogen molecules H 2 from hydrogen ions H + can be quickly repeated, so that the cycle can be performed in a short period of time. can efficiently generate a large amount of hydrogen H2 .
- the liquid to be reformed does not have to be an electrolytic solution, and it is also characterized by being able to reform a high-resistance liquid such as pure water.
- the processing apparatus 1 of the present disclosure it is not necessary to move the hydrogen ions generated on the first (wet) electrode 2 side to the second (dry) electrode 3 side. ) It is not necessary to fill between the electrodes 3 with the electrolyte. Rather, it is necessary to generate a high electric field between the first (wet) electrode 2 and the second (dry) electrode 3 that is capable of impact ionizing water molecules. 2 (dry) electrode 3 needs to have a high resistance. Therefore, as the liquid 6 to be reformed, a high-resistance liquid such as pure water, pure ethanol, or a mixture of ethanol and water can be used instead of the electrolytic solution.
- a high-resistance liquid such as pure water, pure ethanol, or a mixture of ethanol and water can be used instead of the electrolytic solution.
- the first (wet) electrode 2 and the second (dry) electrode 3 are separated by the gas 7 such as air, Homogeneous plasma can be stably generated.
- the mixture of the liquid 6 and the gas 7 can be efficiently reformed, and gases such as hydrogen, oxygen, and ozone can be efficiently generated.
- FIG. 5 is a diagram for explaining a method of processing liquid by the processing apparatus 1.
- FIG. 2 shows the case where the surface area of the first (wet) electrode 2 is larger than the surface area of the second (dry) electrode 3, while FIG. 3 shows a case where a positive pulse is applied after a negative pulse is applied to the second (dry) electrode 3 when the surface area of the dry) electrode 3 is larger.
- a steep positive voltage pulse is applied to the first (wet) electrode 2
- injected electrons from the first (wet) electrode 2 collide with oxygen molecules O2 in the air to generate oxygen atoms O.
- O combines with excited oxygen molecules O2 to generate ozone O3 .
- the amount of ozone O 3 generated is proportional to the surface area of the second (dry) electrode 3 .
- the voltage supplied by the pulse supply unit 5 may be 1 to 50 kV.
- the voltage supplied by the pulse supply unit 5 may be, for example, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13 kV or higher.
- the voltage supplied by the pulse supply unit 5 may be, for example, 50, 45, 40, 35, 30, 25, 20, 15 kV or less.
- the distance between the first (wet) electrode 2 and the second (dry) electrode 3 may be 1-50 mm.
- the distance between the electrodes is, for example, 1, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7, 1.8, 1.9, 2 mm or more.
- the distance between electrodes may be, for example, 50, 45, 40, 35, 30, 25, 20, 15, 10, 5, 4, 3, 2 mm or less.
- the electric field between the first (wet) electrode 2 and the second (dry) electrode 3 may be between 10 4 and 10 5 V/cm.
- the electric field between the first ( wet) electrode 2 and the second ( dry) electrode 3 is e.g. cm or more.
- the electric field between the first ( wet) electrode 2 and the second ( dry) electrode 3 is e.g. It may be x10 4 or less.
- the half width of the pulse supplied by the pulse supply unit 5 may be 100 to 1000 ns.
- the half width of the pulse supplied by the pulse supply unit 5 may be, for example, 100, 200, 300, 400, 500 ns or more.
- the half width of the pulse supplied by the pulse supply unit 5 may be, for example, 1000, 900, 800, 700, 600, 500 ns or less.
- the rising speed (dV/dt) of the pulse supplied by the pulse supply unit 5 may be 5 ⁇ 10 10 to 5 ⁇ 10 11 V/s.
- the rising speed of the pulse supplied by the pulse supply unit 5 is, for example, 5 ⁇ 10 10 , 6 ⁇ 10 10 , 7 ⁇ 10 10 , 8 ⁇ 10 10 , 9 ⁇ 10 10 , 1 ⁇ 10 11 V/s or higher. There may be.
- the rising speed of the pulse supplied by the pulse supply unit 5 may be, for example, 5 ⁇ 10 11 , 4 ⁇ 10 11 , 3 ⁇ 10 11 , 2 ⁇ 10 11 , 1 ⁇ 10 11 V/s or less.
- the falling speed (-dV/dt) of the pulse supplied by the pulse supply unit 5 may be 5 ⁇ 10 10 to 5 ⁇ 10 11 V/s.
- the falling speed of the pulse supplied by the pulse supply unit 5 is, for example, 5 ⁇ 10 10 , 6 ⁇ 10 10 , 7 ⁇ 10 10 , 8 ⁇ 10 10 , 9 ⁇ 10 10 , 1 ⁇ 10 11 V/s or more.
- the falling speed of the pulse supplied by the pulse supply unit 5 may be, for example, 5 ⁇ 10 11 , 4 ⁇ 10 11 , 3 ⁇ 10 11 , 2 ⁇ 10 11 , 1 ⁇ 10 11 V/s or less. .
- the frequency (frequency) of pulses supplied by the pulse supply unit 5 may be 1 to 100 kpps.
- the frequency of pulses supplied by the pulse supply unit 5 may be, for example, 1, 2, 3, 4, 5 kpps or more.
- the frequency of pulses supplied by the pulse supply unit 5 may be, for example, 100, 90, 80, 70, 60, 50, 40, 30, 20, 10, 5 kpps or less.
- FIGS. 6(a) and 6(b) schematically show the configuration of the first (wet) electrode 2 and the second (dry) electrode 3.
- FIG. 6( a ) the liquid is sprayed from the spray unit 10 onto the surface of the first (wet) electrode 2 in order to make the liquid 6 to be modified exist on the surface of the first (wet) electrode 2 . .
- the surface of the second (dry) electrode 3 may be sprayed with the liquid, or the second (dry) electrode 3 may not be sprayed with the liquid.
- the liquid is sprayed on the surface of the second (dry) electrode 3 as well, and the liquid 6 to be modified exists on the surface of the second (dry) electrode 3 as well.
- the outside of the first (wet) electrode 2 is composed of a porous body 11, and the liquid is injected from the injection part 12 into the inside of the porous body 11, so that the porous body 11 is A liquid 6 is exuded on the surface. In this case, no liquid may be present on the surface of the second (dry) electrode 3 .
- FIGS. 7A and 7B schematically show the configuration of the processing apparatus 1 according to Example 1 of the present disclosure.
- FIG. 7(a) shows the configuration of a pair of electrodes
- FIG. 7(b) shows the configuration of a processing apparatus 1 in which a plurality of electrodes are integrated.
- the electrode with the larger surface area comprises a 1 mm diameter stainless steel wire and a 3 mm diameter, 1 mm thick hollow porous ceramic (SiC) rod, with a It is configured to be able to supply the liquid to be reformed.
- the electrode with the smaller surface area (small electrode) consists of a stainless steel rod with a diameter of 1 mm and a hollow ceramic (Al 2 O 3 ) rod with a diameter of 2 mm and a thickness of 0.5 mm.
- the small electrodes are not supplied with the liquid to be reformed.
- the distance between the surface of the stainless steel wire of the large electrode and the surface of the stainless steel rod of the small electrode is 5.75 mm.
- the distance between the surface of the porous ceramic rod of the large electrode and the surface of the ceramic rod of the small electrode is 4.25 mm.
- FIG. 8 shows the voltage V(1) supplied by the pulse supply unit 5, the current I(2) flowing through the processing unit 4, and the power P(3) in the processing device 1 according to the first embodiment.
- a positive pulse voltage is supplied during period t1 and a negative pulse voltage is supplied during period t2.
- the input power to the pulse supply unit 5 is 19 W, and the pulse frequency is 1 kpps.
- FIG. 9 shows the result of treating a mixture of pure water and air by the treatment apparatus 1 according to Example 1.
- FIG. 9A shows Example 1 of the present invention.
- the electrode on the left side is a wet electrode (pure water supply), and the electrode on the right side is a dry electrode.
- the electrode on the right side is a wet electrode (pure water supply)
- the electrode on the right side is a dry electrode.
- FIG. 10 schematically shows the configuration of a processing apparatus 1 according to Example 2 of the present disclosure.
- the processing apparatus 1 according to the second embodiment includes a second (dry) electrode 3 composed of planar mesh nickel and a first (wet) electrode composed of planar mesh nickel and a liquid-fillable honeycomb ceramic. 2.
- FIG. 11 shows the results of processing pure water, ethanol, and 95% ethanol by the processing apparatus 1 according to Example 2.
- pure water was treated, it was possible to generate as much hydrogen as the theoretical value.
- Ethanol contains more hydrogen atoms than water, so when ethanol was treated, it was possible to generate as much hydrogen as pure water with less consumption than pure water.
- 95% ethanol a large amount of hydrogen could be generated with higher efficiency than when treated with pure water and when treated with ethanol.
- FIG. 12 shows plasma when pure water is processed by the processing apparatus 1 according to the second embodiment.
- FIG. 12 shows plasma when the hydrogen generation efficiency is high. Uniform plasma is generated by uniform streamer discharge.
- FIG. 13(a) and 13(b) schematically show the configuration of an internal combustion engine 50 provided with the processing device 1 according to the embodiment.
- the internal combustion engine 50 includes an air cleaner 21 , a throttle body 22 , an injector 23 , a first electrode holder 24 , a second electrode holder 25 , an intake pipe 26 and an internal combustion engine body 27 .
- the air cleaner 21 removes foreign matter such as dust and dirt from the intake air.
- the throttle body 22 holds a throttle valve for adjusting the amount of fresh air taken into the intake pipe 26 .
- the injector 23 injects fuel containing ethanol into the intake pipe 26 .
- the intake pipe 26 introduces a mixture of fresh air and fuel into the internal combustion engine body 27 .
- a first electrode holder 24 and a second electrode holder 25 are provided in the middle of the intake pipe 26 and hold the first (wet) electrode 2 and the second (dry) electrode 3, respectively.
- FIG. 13(b) is a view of the first (wet) electrode 2 and the second (dry) electrode 3 held by the first electrode holder 24 and the second electrode holder 25 as seen from the upstream side of the intake pipe 26.
- the first (wet) electrodes 2 and the second (dry) electrodes 3 are arranged in a staggered pattern.
- the air-fuel mixture can be efficiently reformed and hydrogen can be generated without significantly impeding the flow of the air-fuel mixture.
- the hydrogen generation efficiency can be improved.
- the first (wet) electrode 2 has a two-layer structure and the second (dry) electrode 3 has a single-layer structure.
- the second (dry) electrode 3 may have a multi-layer structure of two or more layers.
- FIG. 14 schematically shows the configuration of an internal combustion engine 60 provided with the processing device 1 according to the embodiment.
- the internal combustion engine 60 is a four-stroke gasoline engine, and includes a cylinder block 62 defining a cylindrical cylinder 62a, a cylinder head 63 joined to the upper surface of the cylinder block 62, and a cylinder 62a slidably provided in the cylinder 62a.
- a piston 64 and the like are provided.
- the number of cylinders and the row of cylinders of the internal combustion engine 60 may be arbitrary.
- combustion chamber recess 63a which is a curved recess, is formed.
- a combustion chamber 65 is formed by a space surrounded by the combustion chamber recess 63 a , the cylinder 62 a and the top surface of the piston 64 . That is, the combustion chamber recess 63 a defines the top of the combustion chamber 65 .
- a spark plug insertion hole 63 b extending from the upper surface of the cylinder head 63 to the combustion chamber 65 is formed at substantially the center of the cylinder head 63 .
- one spark plug insertion hole 63b is formed for one cylinder 62a.
- the ignition plug insertion hole 63b is formed on the cylinder axis so as to open at the center of the combustion chamber recess 63a.
- a cylindrical plug guide 66 is press-fitted into the ignition plug insertion hole 63b of the cylinder head 63, and the plug guide 66 extends the ignition plug insertion hole 63b upward.
- the cylinder head 63 is also formed with an intake port 63c that opens on the left side and opens into the combustion chamber recess 63a, and an exhaust port 63d that opens on the combustion chamber recess 63a and opens on the right side.
- two intake ports 63c and two exhaust ports 63d are formed for one cylinder 62a.
- the cylinder head 63 is slidably provided with an intake valve 67 for opening and closing each intake port 63c and an exhaust valve 68 for opening and closing each exhaust port 63d.
- the internal combustion engine 60 is provided with an ignition device 70 that ignites the mixed gas drawn into the combustion chamber 65 from the intake port 63c.
- the ignition device 70 is inserted into the ignition plug insertion hole 63b, and the ignition plug 71 is attached to the cylinder head 63 so that the tip thereof is exposed or protrudes into the combustion chamber 65. and a controller (not shown) for controlling the voltage.
- the spark plug 71 is screwed into a female thread formed in the lower portion of the spark plug insertion hole 63b.
- the spark plug 71 is held at its proximal end by a plug cap 75 and screwed into a female thread formed in the lower portion of the spark plug insertion hole 63b.
- a terminal portion 76 is formed at the base end (upper end) of the spark plug 71 .
- the terminal portion 76 is electrically connected to the pulse supply portion 5 by elastically contacting the terminal portion 76 with the high-voltage conductive member 77 made of a coil spring housed inside the plug cap 75 .
- the spark plug 71 has a first (wet) electrode 2 and a second (dry) electrode 3 at its tip (lower end).
- a first (wet) electrode 2 arranged on the central axis of the ignition plug 71 is a central electrode that is electrically connected to the pulse supply section 5 via a terminal section 76 and is applied with a high voltage.
- a second (dry) electrode 3 extending from the outer periphery of the spark plug 71 and bent to face the center electrode is a ground electrode electrically connected to the cylinder head 63 .
- An insulating ceramic 8 is provided between the first (wet) electrode 2 and the second (dry) electrode 3 .
- the control device controls the voltage applied to the spark plug 71, the pulse width of the applied voltage, and the like, thereby causing the first (wet) electrode 2 and the second (dry) electrode 3 to A streamer discharge is generated between the intake ports 63c to ignite a mixture of fuel containing ethanol and fresh air sucked into the combustion chamber 65 from the intake port 63c.
- the control device controls the voltage applied to the spark plug 71, the pulse width of the applied voltage, and the like, thereby causing the first (wet) electrode 2 and the second (dry) electrode 3 to A streamer discharge is generated between the intake ports 63c to ignite a mixture of fuel containing ethanol and fresh air sucked into the combustion chamber 65 from the intake port 63c.
- hydrogen is generated from the ethanol adhering to the surface of the first (wet) electrode 2 .
- the combustion efficiency of the air-fuel mixture can be improved.
- the present disclosure is applicable to processing apparatuses and processing methods for processing liquids or gases.
- 1 treatment device 2 first (wet) electrode, 3 second (dry) electrode, 4 treatment section, 5 pulse supply section, 6 liquid, 7 gas, 10 atomization section, 11 porous body, 12 injection section, 50 internal combustion Engine, 60 internal combustion engine, 70 ignition device.
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- Water Treatment By Electricity Or Magnetism (AREA)
Abstract
In the present invention, a processing device 1 comprises a first electrode 2, a second electrode 3, and a pulse feeding unit 5 for applying a pulse voltage between the first electrode 2 and the second electrode 3. A liquid 6 is present on the surface of the first electrode 2, and the liquid 6 and the second electrode 3 are separated from each other by a gas 7.
Description
本開示は液体又は気体を処理するための処理装置及び処理方法に関する。
The present disclosure relates to processing equipment and processing methods for processing liquids or gases.
空間内に含まれる物質を改質する方法として、電極空間において低温プラズマを発生させる方法などが用いられる(例えば、特許文献1参照)。処理速度を向上させるために、液体をプラズマ中に投入して水素等を生成する方法も試行されている(例えば、特許文献2及び3参照)。
As a method of modifying the substance contained in the space, a method of generating low-temperature plasma in the electrode space is used (see Patent Document 1, for example). In order to improve the processing speed, a method of introducing a liquid into plasma to generate hydrogen or the like has also been tried (see, for example, Patent Documents 2 and 3).
本発明者らは、物質を改質する効率を更に向上させることを課題として認識し、本開示の技術に想到した。
The present inventors recognized that further improving the efficiency of modifying substances was a problem and came up with the technology of the present disclosure.
本開示は、このような課題に鑑みてなされ、その目的は、液体又は気体の処理技術を向上させることである。
The present disclosure is made in view of such problems, and its purpose is to improve liquid or gas processing technology.
上記課題を解決するために、本開示のある態様の処理装置は、第1電極と、第2電極と、第1電極と第2電極の間にパルス電圧を印加するパルス供給部と、を備える。第1電極の表面に液体が存在し、液体と第2電極との間は気体で隔てられる。
In order to solve the above problems, a processing apparatus according to one aspect of the present disclosure includes a first electrode, a second electrode, and a pulse supply unit that applies a pulse voltage between the first electrode and the second electrode. . A liquid is present on the surface of the first electrode and a gas separates the liquid from the second electrode.
本開示の別の態様は、処理方法である。この方法は、第1電極の表面に液体を存在させるステップと、第1電極と第2電極の間に正パルス電圧を印加することにより、液体に含まれる物質を活性化させるステップと、第1電極と第2電極の間に負パルス電圧を印加することにより、液体中で活性化された物質を第1電極の表面に戻すステップと、を備える。
Another aspect of the present disclosure is a processing method. The method comprises the steps of: presenting a liquid on the surface of a first electrode; applying a positive pulse voltage between the first electrode and the second electrode to activate a substance contained in the liquid; applying a negative pulse voltage between the electrode and the second electrode to return the activated material in the liquid to the surface of the first electrode.
本開示によれば、液体又は気体の処理技術を向上させることができる。
According to the present disclosure, liquid or gas processing technology can be improved.
図1は、実施の形態に係る処理装置の構成を概略的に示す。処理装置1は、第1(ウェット)電極2と、第2(ドライ)電極3とを含む処理部4と、第1(ウェット)電極2と第2(ドライ)電極3との間に電圧パルスを印加するパルス供給部5とを備える。第1(ウェット)電極2の表面には、改質対象の液体6が存在する。液体6と第2(ドライ)電極3の間は、気体7により隔てられている。本図の例では、第2(ドライ)電極3は接地されており、第1(ウェット)電極2にパルス供給部5から正逆方向の電圧パルスが印加される。なお、第2(ドライ)電極3はパルス供給部5に接続してもよい。この場合、第2(ドライ)電極3に正パルスを印加して、第1(ウェット)電極2に負パルスを印加したのと同じ電位状態を実現してもよい。さらに、第2(ドライ)電極3は第1(ウェット)電極2と同様なウェット電極で構成されていてもよく、第1(ウェット)電極2と気体7により隔てられていればよい。さらに、電圧パルスは電流パルスもしくは電力パルスであってもよい。
FIG. 1 schematically shows the configuration of a processing device according to an embodiment. The processing device 1 comprises a processing portion 4 comprising a first (wet) electrode 2 and a second (dry) electrode 3, and a voltage pulse between the first (wet) electrode 2 and the second (dry) electrode 3. and a pulse supply unit 5 for applying A liquid 6 to be modified is present on the surface of the first (wet) electrode 2 . A gas 7 separates the liquid 6 from the second (dry) electrode 3 . In the example of this figure, the second (dry) electrode 3 is grounded, and voltage pulses in forward and reverse directions are applied to the first (wet) electrode 2 from the pulse supply unit 5 . The second (dry) electrode 3 may be connected to the pulse supply section 5 . In this case, a positive pulse may be applied to the second (dry) electrode 3 to achieve the same potential state as a negative pulse to the first (wet) electrode 2 . Furthermore, the second (dry) electrode 3 may be composed of a wet electrode similar to the first (wet) electrode 2 and may be separated from the first (wet) electrode 2 by a gas 7 . Additionally, the voltage pulse may be a current pulse or a power pulse.
パルス供給部5から電圧パルスが印加されて第1(ウェット)電極2と第2(ドライ)電極3の間に高電界が生じると、第1(ウェット)電極2の表面に存在する液体分子が衝突電離や電界効果により活性化され、イオン、ラジカル、励起分子、励起原子などの活性種が生成される。次に、第1(ウェット)電極2と第2(ドライ)電極3との間で放電が起こり、活性種が元となって気体分子からプラズマが生じる。液体の分子密度は1022個/cm3のレベルであり、大気圧中の気体の分子密度のレベルである1019個/cm3に比べて3桁も高い。まず第1(ウェット)電極2の近傍において液体6の改質により活性種を多量に生成し、それらを元に均一なプラズマを生じさせることにより、気体のみを改質する場合に比べて高い効率で気体7及び液体6の混合物を改質することができる。
When a voltage pulse is applied from the pulse supply unit 5 to generate a high electric field between the first (wet) electrode 2 and the second (dry) electrode 3, the liquid molecules present on the surface of the first (wet) electrode 2 are It is activated by impact ionization and electric field effect, and active species such as ions, radicals, excited molecules and excited atoms are generated. Next, a discharge occurs between the first (wet) electrode 2 and the second (dry) electrode 3, and plasma is generated from gas molecules originating from the active species. The molecular density of liquid is at the level of 10 22 /cm 3 , which is three orders of magnitude higher than the molecular density of gas at atmospheric pressure, 10 19 /cm 3 . First, a large amount of active species are generated by reforming the liquid 6 in the vicinity of the first (wet) electrode 2, and a uniform plasma is generated based on them, resulting in higher efficiency than the case of reforming only the gas. can reform the mixture of gas 7 and liquid 6 at .
図2~図4は、処理装置1により液体を処理する方法について説明するための図である。図2は、第1(ウェット)電極2に急峻な高電圧正パルスを印加した後に急峻な負パルスを印加する場合に起こる現象を示す。図3は、第1(ウェット)電極2付近の拡大図である。図4は、第1(ウェット)電極2付近のポテンシャルを示す。第1(ウェット)電極2の表面の液体6は水であり、液体6と第2(ドライ)電極3の間の気体7は空気である。
2 to 4 are diagrams for explaining a method of processing liquid by the processing device 1. FIG. FIG. 2 illustrates what happens when applying a sharp high voltage positive pulse to the first (wet) electrode 2 followed by a sharp negative pulse. FIG. 3 is an enlarged view of the vicinity of the first (wet) electrode 2. FIG. FIG. 4 shows the potential near the first (wet) electrode 2 . The liquid 6 on the surface of the first (wet) electrode 2 is water and the gas 7 between the liquid 6 and the second (dry) electrode 3 is air.
まず、第1(ウェット)電極2に正の急峻な電圧パルスを印加すると、第1(ウェット)電極2側では、水が衝突電離によりラジカル化及びイオン化し、OHラジカル(OH・)が発生するとともに、電極界面近傍の外側に水素イオンH+が、内側に酸素イオンO2-がそれぞれ生成して電気二重層が形成される。その直後に第1(ウェット)電極2に負パルスを印加すると、電極界面近傍の外側に多量に生じていた水素イオンH+が第1(ウェット)電極2の表面に移動して第1(ウェット)電極2から電子を受け取り、水素分子H2が発生する。水素分子H2の発生量は、第1(ウェット)電極2の表面積に比例する。第2(ドライ)電極3側では、空気中の酸素分子O2に第2(ドライ)電極3からの注入電子が衝突して酸素原子Oが生成し、酸素原子Oと励起された酸素分子O2とが結合してオゾンO3が発生する。また、酸素原子O同士が結合して酸素分子O2が発生する。
First, when a steep positive voltage pulse is applied to the first (wet) electrode 2, water on the first (wet) electrode 2 side is radicalized and ionized by impact ionization, and OH radicals (OH.) are generated. At the same time, hydrogen ions H 2 + are generated outside and oxygen ions O 2− are generated inside near the electrode interface to form an electric double layer. Immediately after that, when a negative pulse is applied to the first (wet) electrode 2, a large amount of hydrogen ions H 2 + generated outside in the vicinity of the electrode interface migrate to the surface of the first (wet) electrode 2, ) receives electrons from the electrode 2 and generates hydrogen molecules H2. The amount of hydrogen molecules H 2 generated is proportional to the surface area of the first (wet) electrode 2 . On the second (dry) electrode 3 side, electrons injected from the second (dry) electrode 3 collide with oxygen molecules O 2 in the air to generate oxygen atoms O, and oxygen atoms O and excited oxygen molecules O 2 combine to generate ozone O3 . Further, the oxygen atoms O bond to each other to generate an oxygen molecule O2 .
従来の電解液を用いた電気分解法では、陽極側の酸化反応により生じた水素イオンH+は、電解液中で陰極側に移動し、陰極で電子を受け取って水素分子H2となる。それに対して、本開示の処理装置1では、第1(ウェット)電極2に印加された正パルスにより第1(ウェット)電極2側に生じた水素イオンH+は、直後に第1(ウェット)電極2に印加された負パルスにより第1(ウェット)電極2に移動し、第1(ウェット)電極2で電子を受け取って水素分子H2となる。このような、従来とは全く技術思想の異なる方法により、水素イオンH+の移動経路を大幅に短くすることができるので、水素イオンH+から水素分子H2が発生する順反応を促進することができるとともに、発生した水素分子H2とOHとの再結合により水H2Oに戻る逆反応の確率を低減させることができる。したがって、水素の発生効率を飛躍的に向上させることができる。また、上記のサイクルを電圧パルスを印加して実現することにより、水から水素イオンH+を発生させ、水素イオンH+から水素分子H2を発生させるサイクルを素早く繰り返すことができるので、短期間に多量の水素H2を効率良く発生させることができる。第2(ドライ)電極3側で発生するオゾンO3及び酸素O2についても同様である。また、改質する液体は電解液である必要はなく、純水などの高抵抗液体も改質可能であることも特徴である。
In the conventional electrolysis method using an electrolytic solution, the hydrogen ions H + generated by the oxidation reaction on the anode side move to the cathode side in the electrolytic solution, receive electrons at the cathode, and become hydrogen molecules H 2 . In contrast, in the processing apparatus 1 of the present disclosure, the hydrogen ions H + generated on the side of the first (wet) electrode 2 by the positive pulse applied to the first (wet) electrode 2 immediately after Due to the negative pulse applied to the electrode 2, it moves to the first (wet) electrode 2, receives electrons at the first (wet) electrode 2 , and becomes hydrogen molecules H2. Such a method, which is completely different in technical concept from the conventional one, can significantly shorten the movement path of hydrogen ions H + , so that the forward reaction in which hydrogen molecules H 2 are generated from hydrogen ions H + can be promoted. can be formed, and the probability of a reverse reaction in which the generated hydrogen molecules H 2 and OH recombine to return to water H 2 O can be reduced. Therefore, the hydrogen generation efficiency can be dramatically improved. In addition, by realizing the above cycle by applying a voltage pulse, the cycle of generating hydrogen ions H + from water and generating hydrogen molecules H 2 from hydrogen ions H + can be quickly repeated, so that the cycle can be performed in a short period of time. can efficiently generate a large amount of hydrogen H2 . The same applies to ozone O3 and oxygen O2 generated on the second (dry) electrode 3 side. Moreover, the liquid to be reformed does not have to be an electrolytic solution, and it is also characterized by being able to reform a high-resistance liquid such as pure water.
本開示の処理装置1では、第1(ウェット)電極2側で発生した水素イオンを第2(ドライ)電極3側に移動させる必要がないので、第1(ウェット)電極2と第2(ドライ)電極3の間を電解液で満たす必要がない。むしろ、水分子を衝突電離させることが可能な高い電界を第1(ウェット)電極2と第2(ドライ)電極3との間に生じさせる必要があるので、第1(ウェット)電極2と第2(ドライ)電極3との間の抵抗を高くする必要がある。したがって、改質対象の液体6として、電解液ではなく、純水、純エタノール、エタノールと水の混合物などの高抵抗の液体を使用することができる。また、第1(ウェット)電極2と第2(ドライ)電極3との間を、空気などの気体7で隔てるので、第1(ウェット)電極2と第2(ドライ)電極3との間に均質なプラズマを安定的に生じさせることができる。これにより、液体6と気体7の混合物を効率良く改質することができるとともに、水素、酸素、オゾンなどの気体を効率良く発生させることができる。
In the processing apparatus 1 of the present disclosure, it is not necessary to move the hydrogen ions generated on the first (wet) electrode 2 side to the second (dry) electrode 3 side. ) It is not necessary to fill between the electrodes 3 with the electrolyte. Rather, it is necessary to generate a high electric field between the first (wet) electrode 2 and the second (dry) electrode 3 that is capable of impact ionizing water molecules. 2 (dry) electrode 3 needs to have a high resistance. Therefore, as the liquid 6 to be reformed, a high-resistance liquid such as pure water, pure ethanol, or a mixture of ethanol and water can be used instead of the electrolytic solution. Moreover, since the first (wet) electrode 2 and the second (dry) electrode 3 are separated by the gas 7 such as air, Homogeneous plasma can be stably generated. As a result, the mixture of the liquid 6 and the gas 7 can be efficiently reformed, and gases such as hydrogen, oxygen, and ozone can be efficiently generated.
図5は、処理装置1により液体を処理する方法について説明するための図である。図2では、第2(ドライ)電極3の表面積よりも第1(ウェット)電極2の表面積が広い場合を示したが、図5では、第1(ウェット)電極2の表面積よりも第2(ドライ)電極3の表面積の方が広い場合に、第2(ドライ)電極3に負パルスを印加した後に正パルスを印加する場合を示す。第1(ウェット)電極2に正の急峻な電圧パルスを印加すると、空気中の酸素分子O2に第1(ウェット)電極2からの注入電子が衝突して酸素原子Oが生成し、酸素原子Oと励起された酸素分子O2とが結合してオゾンO3が発生する。オゾンO3の発生量は、第2(ドライ)電極3の表面積に比例する。
FIG. 5 is a diagram for explaining a method of processing liquid by the processing apparatus 1. FIG. 2 shows the case where the surface area of the first (wet) electrode 2 is larger than the surface area of the second (dry) electrode 3, while FIG. 3 shows a case where a positive pulse is applied after a negative pulse is applied to the second (dry) electrode 3 when the surface area of the dry) electrode 3 is larger. When a steep positive voltage pulse is applied to the first (wet) electrode 2, injected electrons from the first (wet) electrode 2 collide with oxygen molecules O2 in the air to generate oxygen atoms O. O combines with excited oxygen molecules O2 to generate ozone O3 . The amount of ozone O 3 generated is proportional to the surface area of the second (dry) electrode 3 .
パルス供給部5により供給される電圧は、1~50kVであってもよい。パルス供給部5により供給される電圧は、例えば、1、2、3、4、5、6、7、8、9、10、11、12、13kV以上であってもよい。パルス供給部5により供給される電圧は、例えば、50、45、40、35、30、25、20、15kV以下であってもよい。
The voltage supplied by the pulse supply unit 5 may be 1 to 50 kV. The voltage supplied by the pulse supply unit 5 may be, for example, 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13 kV or higher. The voltage supplied by the pulse supply unit 5 may be, for example, 50, 45, 40, 35, 30, 25, 20, 15 kV or less.
第1(ウェット)電極2と第2(ドライ)電極3との間の距離は、1~50mmであってもよい。電極間の距離は、例えば、1、1.1、1.2、1.3、1.4、1.5、1.6、1.7、1.8、1.9、2mm以上であってもよい。電極間の距離は、例えば、50、45、40、35、30、25、20、15、10、5、4、3、2mm以下であってもよい。
The distance between the first (wet) electrode 2 and the second (dry) electrode 3 may be 1-50 mm. The distance between the electrodes is, for example, 1, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7, 1.8, 1.9, 2 mm or more. may The distance between electrodes may be, for example, 50, 45, 40, 35, 30, 25, 20, 15, 10, 5, 4, 3, 2 mm or less.
第1(ウェット)電極2と第2(ドライ)電極3との間の電界は、104~105V/cmであってもよい。第1(ウェット)電極2と第2(ドライ)電極3との間の電界は、例えば、1×104、2×104、3×104、4×104、5×104V/cm以上であってもよい。第1(ウェット)電極2と第2(ドライ)電極3との間の電界は、例えば、1×105、9×104、8×104、7×104、6×104、5×104以下であってもよい。
The electric field between the first (wet) electrode 2 and the second (dry) electrode 3 may be between 10 4 and 10 5 V/cm. The electric field between the first ( wet) electrode 2 and the second ( dry) electrode 3 is e.g. cm or more. The electric field between the first ( wet) electrode 2 and the second ( dry) electrode 3 is e.g. It may be x10 4 or less.
パルス供給部5により供給されるパルスの半値幅は、100~1000nsであってもよい。パルス供給部5により供給されるパルスの半値幅は、例えば、100、200、300、400、500ns以上であってもよい。パルス供給部5により供給されるパルスの半値幅は、例えば、1000、900、800、700、600、500ns以下であってもよい。
The half width of the pulse supplied by the pulse supply unit 5 may be 100 to 1000 ns. The half width of the pulse supplied by the pulse supply unit 5 may be, for example, 100, 200, 300, 400, 500 ns or more. The half width of the pulse supplied by the pulse supply unit 5 may be, for example, 1000, 900, 800, 700, 600, 500 ns or less.
パルス供給部5により供給されるパルスの立ち上がり速度(dV/dt)は、5×1010~5×1011V/sであってもよい。パルス供給部5により供給されるパルスの立ち上がり速度は、例えば、5×1010、6×1010、7×1010、8×1010、9×1010、1×1011V/s以上であってもよい。パルス供給部5により供給されるパルスの立ち上がり速度は、例えば、5×1011、4×1011、3×1011、2×1011、1×1011V/s以下であってもよい。
The rising speed (dV/dt) of the pulse supplied by the pulse supply unit 5 may be 5×10 10 to 5×10 11 V/s. The rising speed of the pulse supplied by the pulse supply unit 5 is, for example, 5×10 10 , 6×10 10 , 7×10 10 , 8×10 10 , 9×10 10 , 1×10 11 V/s or higher. There may be. The rising speed of the pulse supplied by the pulse supply unit 5 may be, for example, 5×10 11 , 4×10 11 , 3×10 11 , 2×10 11 , 1×10 11 V/s or less.
パルス供給部5により供給されるパルスの立ち下がり速度(-dV/dt)は、5×1010~5×1011V/sであってもよい。パルス供給部5により供給されるパルスの立ち下がり速度は、例えば、5×1010、6×1010、7×1010、8×1010、9×1010、1×1011V/s以上であってもよい。パルス供給部5により供給されるパルスの立ち下がり速度は、例えば、5×1011、4×1011、3×1011、2×1011、1×1011V/s以下であってもよい。
The falling speed (-dV/dt) of the pulse supplied by the pulse supply unit 5 may be 5×10 10 to 5×10 11 V/s. The falling speed of the pulse supplied by the pulse supply unit 5 is, for example, 5×10 10 , 6×10 10 , 7×10 10 , 8×10 10 , 9×10 10 , 1×10 11 V/s or more. may be The falling speed of the pulse supplied by the pulse supply unit 5 may be, for example, 5×10 11 , 4×10 11 , 3×10 11 , 2×10 11 , 1×10 11 V/s or less. .
パルス供給部5により供給されるパルスの頻度(周波数)は、1~100kppsであってもよい。パルス供給部5により供給されるパルスの頻度は、例えば、1、2、3、4、5kpps以上であってもよい。パルス供給部5により供給されるパルスの頻度は、例えば、100、90、80、70、60、50、40、30、20、10、5kpps以下であってもよい。
The frequency (frequency) of pulses supplied by the pulse supply unit 5 may be 1 to 100 kpps. The frequency of pulses supplied by the pulse supply unit 5 may be, for example, 1, 2, 3, 4, 5 kpps or more. The frequency of pulses supplied by the pulse supply unit 5 may be, for example, 100, 90, 80, 70, 60, 50, 40, 30, 20, 10, 5 kpps or less.
図6(a)(b)は、第1(ウェット)電極2及び第2(ドライ)電極3の構成を概略的に示す。図6(a)に示す例では、第1(ウェット)電極2の表面に改質対象の液体6を存在させるために、第1(ウェット)電極2の表面に噴霧部10から液体を噴霧する。この場合、第2(ドライ)電極3の表面にも液体が噴霧されてもよいし、第2(ドライ)電極3には液体が噴霧されなくてもよい。図6(a)の例では、第2(ドライ)電極3の表面にも液体が噴霧され、第2(ドライ)電極3の表面にも改質対象の液体6が存在する。図6(b)に示す例では、第1(ウェット)電極2の外側を多孔質体11により構成し、多孔質体11の内側に注入部12から液体を注入して、多孔質体11の表面に液体6を浸み出させる。この場合、第2(ドライ)電極3の表面には液体が存在しなくてもよい。
FIGS. 6(a) and 6(b) schematically show the configuration of the first (wet) electrode 2 and the second (dry) electrode 3. FIG. In the example shown in FIG. 6( a ), the liquid is sprayed from the spray unit 10 onto the surface of the first (wet) electrode 2 in order to make the liquid 6 to be modified exist on the surface of the first (wet) electrode 2 . . In this case, the surface of the second (dry) electrode 3 may be sprayed with the liquid, or the second (dry) electrode 3 may not be sprayed with the liquid. In the example of FIG. 6A, the liquid is sprayed on the surface of the second (dry) electrode 3 as well, and the liquid 6 to be modified exists on the surface of the second (dry) electrode 3 as well. In the example shown in FIG. 6B, the outside of the first (wet) electrode 2 is composed of a porous body 11, and the liquid is injected from the injection part 12 into the inside of the porous body 11, so that the porous body 11 is A liquid 6 is exuded on the surface. In this case, no liquid may be present on the surface of the second (dry) electrode 3 .
[実施例1]
図7(a)(b)は、本開示の実施例1に係る処理装置1の構成を概略的に示す。図7(a)は、1対の電極の構成を示し、図7(b)は、複数の電極を集積させた処理装置1の構成を示す。表面積が大きい方の電極(大電極)は、直径1mmのステンレスワイヤと、直径3mm、厚さ1mmの中空の多孔性セラミックス(SiC)棒とを含み、多孔性セラミックス棒とステンレスワイヤとの間に改質対象の液体を供給可能に構成される。表面積が小さい方の電極(小電極)は、直径1mmのステンレス棒と、直径2mm、厚さ0.5mmの中空のセラミックス(Al2O3)棒とで構成される。小電極には改質対象の液体は供給されない。大電極のステンレスワイヤの表面と小電極のステンレス棒の表面との間の距離は、5.75mmである。大電極の多孔性セラミックス棒の表面と、小電極のセラミックス棒の表面との間の距離は、4.25mmである。 [Example 1]
FIGS. 7A and 7B schematically show the configuration of theprocessing apparatus 1 according to Example 1 of the present disclosure. FIG. 7(a) shows the configuration of a pair of electrodes, and FIG. 7(b) shows the configuration of a processing apparatus 1 in which a plurality of electrodes are integrated. The electrode with the larger surface area (large electrode) comprises a 1 mm diameter stainless steel wire and a 3 mm diameter, 1 mm thick hollow porous ceramic (SiC) rod, with a It is configured to be able to supply the liquid to be reformed. The electrode with the smaller surface area (small electrode) consists of a stainless steel rod with a diameter of 1 mm and a hollow ceramic (Al 2 O 3 ) rod with a diameter of 2 mm and a thickness of 0.5 mm. The small electrodes are not supplied with the liquid to be reformed. The distance between the surface of the stainless steel wire of the large electrode and the surface of the stainless steel rod of the small electrode is 5.75 mm. The distance between the surface of the porous ceramic rod of the large electrode and the surface of the ceramic rod of the small electrode is 4.25 mm.
図7(a)(b)は、本開示の実施例1に係る処理装置1の構成を概略的に示す。図7(a)は、1対の電極の構成を示し、図7(b)は、複数の電極を集積させた処理装置1の構成を示す。表面積が大きい方の電極(大電極)は、直径1mmのステンレスワイヤと、直径3mm、厚さ1mmの中空の多孔性セラミックス(SiC)棒とを含み、多孔性セラミックス棒とステンレスワイヤとの間に改質対象の液体を供給可能に構成される。表面積が小さい方の電極(小電極)は、直径1mmのステンレス棒と、直径2mm、厚さ0.5mmの中空のセラミックス(Al2O3)棒とで構成される。小電極には改質対象の液体は供給されない。大電極のステンレスワイヤの表面と小電極のステンレス棒の表面との間の距離は、5.75mmである。大電極の多孔性セラミックス棒の表面と、小電極のセラミックス棒の表面との間の距離は、4.25mmである。 [Example 1]
FIGS. 7A and 7B schematically show the configuration of the
図8は、実施例1に係る処理装置1においてパルス供給部5により供給される電圧V(1)、処理部4を流れる電流I(2)、及び電力P(3)を示す。このように、期間t1に正パルス電圧が供給され、期間t2に負パルス電圧が供給される。なお、パルス供給部5への入力電力は19Wであり、パルス周波数は1kppsである。
FIG. 8 shows the voltage V(1) supplied by the pulse supply unit 5, the current I(2) flowing through the processing unit 4, and the power P(3) in the processing device 1 according to the first embodiment. Thus, a positive pulse voltage is supplied during period t1 and a negative pulse voltage is supplied during period t2. The input power to the pulse supply unit 5 is 19 W, and the pulse frequency is 1 kpps.
図9は、実施例1に係る処理装置1により純水と空気の混合物を処理した結果を示す。図9(a)は、本発明の実施例1である。図9(a)において、左側の電極はウェット電極(純水供給)、右側の電極はドライ電極である。右側の電極を接地し、左側の電極に正→負のパルスを印加したところ、オゾンO3と水素H2が大量に発生した。図9(b)において、左側の電極はウェット電極(純水供給)、右側の電極はドライ電極である。左側の電極を接地し、右側の電極に正→負のパルスを印加したところ、オゾンO3が大量に発生し、水素H2は発生しなかった。このように、正→負のパルスを印加する電極に純水が無い場合、水素H2は発生しない。図9(c)において、左側の電極はドライ電極、右側の電極もドライ電極である。右側の電極を接地し、左側の電極に正→負のパルスを印加したところ、オゾンO3が少量発生し、水素H2は発生しなかった。このように、正→負のパルスを印加する電極に純水が無い場合、水素H2は発生しない。図9(d)において、左側の電極はドライ電極、右側の電極もドライ電極である。左側の電極を接地し、右側の電極に正→負のパルスを印加したところ、オゾンO3が大量に発生し、水素H2は発生しなかった。このように、正→負のパルスを印加する電極に純水が無い場合、水素H2は発生しない。以上のように、正→負のパルスを印加する電極に純水がある場合に限って、水素H2が発生することが明らかである。
FIG. 9 shows the result of treating a mixture of pure water and air by the treatment apparatus 1 according to Example 1. FIG. FIG. 9A shows Example 1 of the present invention. In FIG. 9A, the electrode on the left side is a wet electrode (pure water supply), and the electrode on the right side is a dry electrode. When the right electrode was grounded and a positive→negative pulse was applied to the left electrode , a large amount of ozone O3 and hydrogen H2 was generated. In FIG. 9B, the electrode on the left side is a wet electrode (pure water supply), and the electrode on the right side is a dry electrode. When the left electrode was grounded and a positive→negative pulse was applied to the right electrode , a large amount of ozone O3 was generated and no hydrogen H2 was generated. Thus, hydrogen H 2 is not generated when there is no pure water on the electrode to which the positive→negative pulse is applied. In FIG. 9(c), the left electrode is a dry electrode, and the right electrode is also a dry electrode. When the right electrode was grounded and a positive→negative pulse was applied to the left electrode , a small amount of ozone O3 and no hydrogen H2 was generated. Thus, hydrogen H 2 is not generated when there is no pure water on the electrode to which the positive→negative pulse is applied. In FIG. 9(d), the left electrode is a dry electrode, and the right electrode is also a dry electrode. When the left electrode was grounded and a positive→negative pulse was applied to the right electrode , a large amount of ozone O3 was generated and no hydrogen H2 was generated. Thus, hydrogen H 2 is not generated when there is no pure water on the electrode to which the positive→negative pulse is applied. As described above, it is clear that hydrogen H2 is generated only when there is pure water at the electrode to which the positive→negative pulse is applied.
[実施例2]
図10は、本開示の実施例2に係る処理装置1の構成を概略的に示す。実施例2に係る処理装置1は、平面網目状ニッケルで構成される第2(ドライ)電極3と、平面網目状ニッケルと液体を充填可能なハニカム状セラミックから構成される第1(ウェット)電極2とを備える。 [Example 2]
FIG. 10 schematically shows the configuration of aprocessing apparatus 1 according to Example 2 of the present disclosure. The processing apparatus 1 according to the second embodiment includes a second (dry) electrode 3 composed of planar mesh nickel and a first (wet) electrode composed of planar mesh nickel and a liquid-fillable honeycomb ceramic. 2.
図10は、本開示の実施例2に係る処理装置1の構成を概略的に示す。実施例2に係る処理装置1は、平面網目状ニッケルで構成される第2(ドライ)電極3と、平面網目状ニッケルと液体を充填可能なハニカム状セラミックから構成される第1(ウェット)電極2とを備える。 [Example 2]
FIG. 10 schematically shows the configuration of a
図11は、実施例2に係る処理装置1により純水、エタノール、95%エタノールを処理した結果を示す。純水を処理した場合は、理論値と同程度の水素を発生させることができた。エタノールは、水よりも多くの水素原子を含むので、エタノールを処理した場合は、純水よりも少ない消費量で純水と同程度の水素を発生させることができた。95%エタノールを処理した場合は、純水を処理した場合、及びエタノールを処理した場合よりも高い効率で多量の水素を発生させることができた。
FIG. 11 shows the results of processing pure water, ethanol, and 95% ethanol by the processing apparatus 1 according to Example 2. When pure water was treated, it was possible to generate as much hydrogen as the theoretical value. Ethanol contains more hydrogen atoms than water, so when ethanol was treated, it was possible to generate as much hydrogen as pure water with less consumption than pure water. When treated with 95% ethanol, a large amount of hydrogen could be generated with higher efficiency than when treated with pure water and when treated with ethanol.
図12は、実施例2に係る処理装置1により純水を処理したときのプラズマを示す。図12は、水素の発生効率が高かった場合のプラズマを示す。均一なストリーマ放電により均一なプラズマが発生している。
FIG. 12 shows plasma when pure water is processed by the processing apparatus 1 according to the second embodiment. FIG. 12 shows plasma when the hydrogen generation efficiency is high. Uniform plasma is generated by uniform streamer discharge.
[適用例1]
図13(a)(b)は、実施の形態に係る処理装置1を備える内燃機関50の構成を概略的に示す。図13(a)に示すように、内燃機関50は、エアクリーナー21、スロットルボディー22、インジェクター23、第1電極ホルダー24、第2電極ホルダー25、インテークパイプ26、及び内燃機関本体27を備える。 [Application example 1]
13(a) and 13(b) schematically show the configuration of an internal combustion engine 50 provided with theprocessing device 1 according to the embodiment. As shown in FIG. 13( a ), the internal combustion engine 50 includes an air cleaner 21 , a throttle body 22 , an injector 23 , a first electrode holder 24 , a second electrode holder 25 , an intake pipe 26 and an internal combustion engine body 27 .
図13(a)(b)は、実施の形態に係る処理装置1を備える内燃機関50の構成を概略的に示す。図13(a)に示すように、内燃機関50は、エアクリーナー21、スロットルボディー22、インジェクター23、第1電極ホルダー24、第2電極ホルダー25、インテークパイプ26、及び内燃機関本体27を備える。 [Application example 1]
13(a) and 13(b) schematically show the configuration of an internal combustion engine 50 provided with the
エアクリーナー21は、吸入空気から塵や埃などの異物を除去する。スロットルボディー22は、インテークパイプ26内に吸入する新気の量を調整するためのスロットルバルブを保持する。インジェクター23は、エタノールを含む燃料をインテークパイプ26内に噴射する。インテークパイプ26は、新気と燃料の混合気を内燃機関本体27に導入する。第1電極ホルダー24及び第2電極ホルダー25は、インテークパイプ26の途中に設けられ、それぞれ、第1(ウェット)電極2及び第2(ドライ)電極3を保持する。
The air cleaner 21 removes foreign matter such as dust and dirt from the intake air. The throttle body 22 holds a throttle valve for adjusting the amount of fresh air taken into the intake pipe 26 . The injector 23 injects fuel containing ethanol into the intake pipe 26 . The intake pipe 26 introduces a mixture of fresh air and fuel into the internal combustion engine body 27 . A first electrode holder 24 and a second electrode holder 25 are provided in the middle of the intake pipe 26 and hold the first (wet) electrode 2 and the second (dry) electrode 3, respectively.
内燃機関50の運転時には、スロットルバルブの開度に応じた量の新気がインテークパイプ26に吸引され、インジェクター23から噴射された燃料と混合される。混合気がインテークパイプ26を通過するときに、燃料の一部が第1(ウェット)電極2の表面に付着する。上述したように、第1(ウェット)電極2又は第2(ドライ)電極3にパルス供給部からパルス電圧を印加すると、第1(ウェット)電極2の表面に付着したエタノールから水素が発生する。水素を含む混合気が内燃機関本体27内に導入されるので、混合気の燃焼効率を向上させることができる。
During operation of the internal combustion engine 50, an amount of fresh air corresponding to the opening of the throttle valve is sucked into the intake pipe 26 and mixed with the fuel injected from the injector 23. A portion of the fuel adheres to the surface of the first (wet) electrode 2 as the mixture passes through the intake pipe 26 . As described above, when a pulse voltage is applied to the first (wet) electrode 2 or the second (dry) electrode 3 from the pulse supply unit, hydrogen is generated from the ethanol adhering to the surface of the first (wet) electrode 2 . Since the air-fuel mixture containing hydrogen is introduced into the internal combustion engine main body 27, the combustion efficiency of the air-fuel mixture can be improved.
図13(b)は、第1電極ホルダー24及び第2電極ホルダー25に保持された第1(ウェット)電極2及び第2(ドライ)電極3を、インテークパイプ26の上流側から見た図である。第1(ウェット)電極2及び第2(ドライ)電極3は、千鳥形状に配置される。これにより、混合気の流れを大きく阻害することなく、効率良く混合気を改質し、水素を発生させることができる。また、第1(ウェット)電極2の表面積を大きくすることにより、水素の発生効率を向上させることができる。本図の例では、第1(ウェット)電極2を二層構造にし、第2(ドライ)電極3を一層構造にしているが、第1(ウェット)電極2を一層構造又は三層以上の多層構造にしてもよいし、第2(ドライ)電極3を二層以上の多層構造にしてもよい。
FIG. 13(b) is a view of the first (wet) electrode 2 and the second (dry) electrode 3 held by the first electrode holder 24 and the second electrode holder 25 as seen from the upstream side of the intake pipe 26. FIG. be. The first (wet) electrodes 2 and the second (dry) electrodes 3 are arranged in a staggered pattern. As a result, the air-fuel mixture can be efficiently reformed and hydrogen can be generated without significantly impeding the flow of the air-fuel mixture. Further, by increasing the surface area of the first (wet) electrode 2, the hydrogen generation efficiency can be improved. In the example of this figure, the first (wet) electrode 2 has a two-layer structure and the second (dry) electrode 3 has a single-layer structure. Alternatively, the second (dry) electrode 3 may have a multi-layer structure of two or more layers.
[適用例2]
図14は、実施の形態に係る処理装置1を備える内燃機関60の構成を概略的に示す。内燃機関60は、4ストロークガソリンエンジンであり、円筒状のシリンダ62aを画成するシリンダブロック62や、シリンダブロック62の上面に接合されたシリンダヘッド63、シリンダ62a内に摺動可能に設けられたピストン64等を備えている。内燃機関60の気筒数や気筒列は任意であってよい。 [Application example 2]
FIG. 14 schematically shows the configuration of aninternal combustion engine 60 provided with the processing device 1 according to the embodiment. The internal combustion engine 60 is a four-stroke gasoline engine, and includes a cylinder block 62 defining a cylindrical cylinder 62a, a cylinder head 63 joined to the upper surface of the cylinder block 62, and a cylinder 62a slidably provided in the cylinder 62a. A piston 64 and the like are provided. The number of cylinders and the row of cylinders of the internal combustion engine 60 may be arbitrary.
図14は、実施の形態に係る処理装置1を備える内燃機関60の構成を概略的に示す。内燃機関60は、4ストロークガソリンエンジンであり、円筒状のシリンダ62aを画成するシリンダブロック62や、シリンダブロック62の上面に接合されたシリンダヘッド63、シリンダ62a内に摺動可能に設けられたピストン64等を備えている。内燃機関60の気筒数や気筒列は任意であってよい。 [Application example 2]
FIG. 14 schematically shows the configuration of an
シリンダヘッド63の下面におけるシリンダ62aに対応する位置には、曲面状の窪みである燃焼室凹部63aが形成されている。燃焼室凹部63a、シリンダ62a及びピストン64の頂面により囲まれる空間により燃焼室65が形成される。つまり、燃焼室凹部63aが燃焼室65の頂部を画定している。
At a position corresponding to the cylinder 62a on the lower surface of the cylinder head 63, a combustion chamber recess 63a, which is a curved recess, is formed. A combustion chamber 65 is formed by a space surrounded by the combustion chamber recess 63 a , the cylinder 62 a and the top surface of the piston 64 . That is, the combustion chamber recess 63 a defines the top of the combustion chamber 65 .
シリンダヘッド63の略中央には、シリンダヘッド63の上面から燃焼室65に至る点火プラグ挿入孔63bが形成されている。本適用例2では、1つのシリンダ62aに対して1つの点火プラグ挿入孔63bが形成されている。点火プラグ挿入孔63bは、燃焼室凹部63aの中央に開口するようにシリンダ軸線上に形成されている。シリンダヘッド63の点火プラグ挿入孔63bには筒状のプラグガイド66が圧入されており、プラグガイド66によって点火プラグ挿入孔63bが上方に延長されている。
A spark plug insertion hole 63 b extending from the upper surface of the cylinder head 63 to the combustion chamber 65 is formed at substantially the center of the cylinder head 63 . In Application Example 2, one spark plug insertion hole 63b is formed for one cylinder 62a. The ignition plug insertion hole 63b is formed on the cylinder axis so as to open at the center of the combustion chamber recess 63a. A cylindrical plug guide 66 is press-fitted into the ignition plug insertion hole 63b of the cylinder head 63, and the plug guide 66 extends the ignition plug insertion hole 63b upward.
また、シリンダヘッド63には、左側面に開口すると共に燃焼室凹部63aに開口する吸気ポート63cと、燃焼室凹部63aに開口すると共に右側面に開口する排気ポート63dとが形成されている。本適用例2では、1つのシリンダ62aに対して2つの吸気ポート63cと2つの排気ポート63dとが形成されている。シリンダヘッド63には、各吸気ポート63cを開閉する吸気弁67及び各排気ポート63dを開閉する排気弁68が摺動可能に設けられている。
The cylinder head 63 is also formed with an intake port 63c that opens on the left side and opens into the combustion chamber recess 63a, and an exhaust port 63d that opens on the combustion chamber recess 63a and opens on the right side. In Application Example 2, two intake ports 63c and two exhaust ports 63d are formed for one cylinder 62a. The cylinder head 63 is slidably provided with an intake valve 67 for opening and closing each intake port 63c and an exhaust valve 68 for opening and closing each exhaust port 63d.
内燃機関60には、吸気ポート63cから燃焼室65に吸入される混合ガスに点火を行う点火装置70が設けられている。点火装置70は、点火プラグ挿入孔63bに挿入され、先端を燃焼室65に露出或いは突出させるようにシリンダヘッド63に取り付けられた点火プラグ71と、パルス供給部5から点火プラグ71に印加される電圧を制御する図示しない制御装置とを備えている。点火プラグ71は、点火プラグ挿入孔63bの下部に形成された雌ねじに螺着される。
The internal combustion engine 60 is provided with an ignition device 70 that ignites the mixed gas drawn into the combustion chamber 65 from the intake port 63c. The ignition device 70 is inserted into the ignition plug insertion hole 63b, and the ignition plug 71 is attached to the cylinder head 63 so that the tip thereof is exposed or protrudes into the combustion chamber 65. and a controller (not shown) for controlling the voltage. The spark plug 71 is screwed into a female thread formed in the lower portion of the spark plug insertion hole 63b.
点火プラグ71は、プラグキャップ75により基端部を保持されており、点火プラグ挿入孔63bの下部に形成された雌ねじに螺着される。点火プラグ71の基端(上端)にはターミナル部76が形成されている。プラグキャップ75の内部に収容されたコイルスプリングからなる高電圧導電部材77がターミナル部76に弾接することにより、ターミナル部76がパルス供給部5と電気的に接続される。
The spark plug 71 is held at its proximal end by a plug cap 75 and screwed into a female thread formed in the lower portion of the spark plug insertion hole 63b. A terminal portion 76 is formed at the base end (upper end) of the spark plug 71 . The terminal portion 76 is electrically connected to the pulse supply portion 5 by elastically contacting the terminal portion 76 with the high-voltage conductive member 77 made of a coil spring housed inside the plug cap 75 .
点火プラグ71は、先端(下端)に第1(ウェット)電極2及び第2(ドライ)電極3を有している。点火プラグ71の中心軸線上に配置された第1(ウェット)電極2は、ターミナル部76を介してパルス供給部5と電気的に接続され、高電圧を印加される中心電極である。点火プラグ71の外周部から延出し、中心電極に対向するように屈曲する第2(ドライ)電極3は、シリンダヘッド63と電気的に接続された接地電極である。第1(ウェット)電極2と第2(ドライ)電極3の間には、絶縁性セラミック8が設けられる。
The spark plug 71 has a first (wet) electrode 2 and a second (dry) electrode 3 at its tip (lower end). A first (wet) electrode 2 arranged on the central axis of the ignition plug 71 is a central electrode that is electrically connected to the pulse supply section 5 via a terminal section 76 and is applied with a high voltage. A second (dry) electrode 3 extending from the outer periphery of the spark plug 71 and bent to face the center electrode is a ground electrode electrically connected to the cylinder head 63 . An insulating ceramic 8 is provided between the first (wet) electrode 2 and the second (dry) electrode 3 .
このように構成された点火装置70において、制御装置が点火プラグ71の印加電圧や印加電圧のパルス幅等を制御することにより、第1(ウェット)電極2と第2(ドライ)電極3との間でストリーマ放電を生じさせ、吸気ポート63cから燃焼室65に吸入されるエタノールを含む燃料と新気の混合気への点火を行う。このとき、上述したように、パルス供給部5から第1(ウェット)電極2にパルス電圧を印加することにより、第1(ウェット)電極2の表面に付着したエタノールから水素が発生する。これにより、混合気の燃焼効率を向上させることができる。
In the ignition device 70 configured as described above, the control device controls the voltage applied to the spark plug 71, the pulse width of the applied voltage, and the like, thereby causing the first (wet) electrode 2 and the second (dry) electrode 3 to A streamer discharge is generated between the intake ports 63c to ignite a mixture of fuel containing ethanol and fresh air sucked into the combustion chamber 65 from the intake port 63c. At this time, as described above, by applying a pulse voltage from the pulse supply unit 5 to the first (wet) electrode 2 , hydrogen is generated from the ethanol adhering to the surface of the first (wet) electrode 2 . Thereby, the combustion efficiency of the air-fuel mixture can be improved.
以上、本開示を実施例をもとに説明した。この実施例は例示であり、それらの各構成要素や各処理プロセスの組合せにいろいろな変形例が可能なこと、またそうした変形例も本開示の範囲にあることは当業者に理解されるところである。
The present disclosure has been described above based on the examples. It should be understood by those skilled in the art that this embodiment is an example, and that various modifications can be made to combinations of each component and each treatment process, and such modifications are within the scope of the present disclosure. .
本開示は液体又は気体を処理するための処理装置及び処理方法に利用可能である。
The present disclosure is applicable to processing apparatuses and processing methods for processing liquids or gases.
1 処理装置、2 第1(ウェット)電極、3 第2(ドライ)電極、4 処理部、5 パルス供給部、6 液体、7 気体、10 噴霧部、11 多孔質体、12 注入部、50 内燃機関、60 内燃機関、70 点火装置。
1 treatment device, 2 first (wet) electrode, 3 second (dry) electrode, 4 treatment section, 5 pulse supply section, 6 liquid, 7 gas, 10 atomization section, 11 porous body, 12 injection section, 50 internal combustion Engine, 60 internal combustion engine, 70 ignition device.
Claims (7)
- 第1電極と、
第2電極と、
前記第1電極と前記第2電極の間にパルス電圧を印加するパルス供給部と、
を備え、
前記第1電極の表面に液体が存在し、
前記液体と前記第2電極との間は気体で隔てられる
処理装置。 a first electrode;
a second electrode;
a pulse supply unit that applies a pulse voltage between the first electrode and the second electrode;
with
a liquid is present on the surface of the first electrode;
A processing apparatus in which a gas separates the liquid and the second electrode. - 前記パルス供給部は、正と負のパルスを連続して供給可能である請求項1に記載の処理装置。 The processing apparatus according to claim 1, wherein the pulse supply unit can continuously supply positive and negative pulses.
- 前記液体から水素が発生する請求項1又は2に記載の処理装置。 The processing apparatus according to claim 1 or 2, wherein hydrogen is generated from the liquid.
- 前記液体を前記第1電極の表面に噴霧する噴霧部を更に備える請求項1から3のいずれかに記載の処理装置。 The processing apparatus according to any one of claims 1 to 3, further comprising a spray section that sprays the liquid onto the surface of the first electrode.
- 前記第1電極の外側は多孔質体を含み、
前記第1電極の内側から前記多孔質体を介して前記液体を前記第1電極の表面に供給する液体供給部を備える
請求項1から3のいずれかに記載の処理装置。 The outside of the first electrode includes a porous body,
4. The processing apparatus according to any one of claims 1 to 3, further comprising a liquid supply unit that supplies the liquid to the surface of the first electrode from inside the first electrode through the porous body. - 前記液体は、水である請求項1から5のいずれかに記載の処理装置。 The processing apparatus according to any one of claims 1 to 5, wherein the liquid is water.
- 第1電極の表面に液体を存在させるステップと、
前記第1電極と第2電極の間に正パルス電圧を印加することにより、前記液体に含まれる物質を活性化させるステップと、
前記第1電極と前記第2電極の間に負パルス電圧を印加することにより、前記液体中で活性化された物質を前記第1電極の表面に戻すステップと、
を備える液体の処理方法。 presenting a liquid on the surface of the first electrode;
activating a substance contained in the liquid by applying a positive pulse voltage between the first electrode and the second electrode;
applying a negative pulse voltage between the first electrode and the second electrode to return activated substances in the liquid to the surface of the first electrode;
A method of treating a liquid comprising:
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012157248A1 (en) * | 2011-05-17 | 2012-11-22 | パナソニック株式会社 | Plasma generating apparatus and plasma generating method |
JP2014503689A (en) * | 2010-12-20 | 2014-02-13 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | Hydrogen production cell including high temperature steam electrolysis cell |
CN105858982A (en) * | 2015-09-20 | 2016-08-17 | 大连双迪创新科技研究院有限公司 | Simple table type water dispenser |
JP2019502019A (en) * | 2015-11-16 | 2019-01-24 | シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft | Electrochemical cell and method |
WO2020241802A1 (en) * | 2019-05-28 | 2020-12-03 | 三輪 有子 | Oxyhydrogen gas mixture generation device, suction apparatus, oxyhydrogen gas mixture generation method and oxyhydrogen gas mixture |
WO2020241656A1 (en) * | 2019-05-28 | 2020-12-03 | 徳田 美幸 | Combustion reactor and combustion method |
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Publication number | Priority date | Publication date | Assignee | Title |
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WO2012157248A1 (en) * | 2011-05-17 | 2012-11-22 | パナソニック株式会社 | Plasma generating apparatus and plasma generating method |
CN105858982A (en) * | 2015-09-20 | 2016-08-17 | 大连双迪创新科技研究院有限公司 | Simple table type water dispenser |
JP2019502019A (en) * | 2015-11-16 | 2019-01-24 | シーメンス アクチエンゲゼルシヤフトSiemens Aktiengesellschaft | Electrochemical cell and method |
WO2020241802A1 (en) * | 2019-05-28 | 2020-12-03 | 三輪 有子 | Oxyhydrogen gas mixture generation device, suction apparatus, oxyhydrogen gas mixture generation method and oxyhydrogen gas mixture |
WO2020241656A1 (en) * | 2019-05-28 | 2020-12-03 | 徳田 美幸 | Combustion reactor and combustion method |
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