WO2022202059A1 - Method for manufacturing polishing pad - Google Patents

Method for manufacturing polishing pad Download PDF

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Publication number
WO2022202059A1
WO2022202059A1 PCT/JP2022/007227 JP2022007227W WO2022202059A1 WO 2022202059 A1 WO2022202059 A1 WO 2022202059A1 JP 2022007227 W JP2022007227 W JP 2022007227W WO 2022202059 A1 WO2022202059 A1 WO 2022202059A1
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WO
WIPO (PCT)
Prior art keywords
detection window
polishing pad
manufacturing
end point
window member
Prior art date
Application number
PCT/JP2022/007227
Other languages
French (fr)
Japanese (ja)
Inventor
佳秀 川村
光紀 糸山
仁志 関谷
哲平 立野
堅一 小池
大和 ▲高▼見沢
Original Assignee
富士紡ホールディングス株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2021050341A external-priority patent/JP2022148596A/en
Priority claimed from JP2021051702A external-priority patent/JP2022149504A/en
Priority claimed from JP2021156497A external-priority patent/JP2023047530A/en
Priority claimed from JP2021156530A external-priority patent/JP2023047558A/en
Priority claimed from JP2021156483A external-priority patent/JP2023047519A/en
Priority claimed from JP2021160631A external-priority patent/JP2023050503A/en
Application filed by 富士紡ホールディングス株式会社 filed Critical 富士紡ホールディングス株式会社
Publication of WO2022202059A1 publication Critical patent/WO2022202059A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/013Devices or means for detecting lapping completion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/22Lapping pads for working plane surfaces characterised by a multi-layered structure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/24Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/26Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/22Rubbers synthetic or natural
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/48Polyethers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/74Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/75Polyisocyanates or polyisothiocyanates cyclic cycloaliphatic
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Definitions

  • the present invention relates to a method for manufacturing a polishing pad.
  • CMP chemical mechanical polishing
  • polishing endpoint detection for detecting whether the polishing process has been completed. For example, over-polishing or under-polishing to the target polishing end point directly leads to product defects. Therefore, in chemical mechanical polishing, it is necessary to strictly control the polishing amount by detecting the polishing end point.
  • polishing speed (polishing rate) varies depending on the operating conditions of the polishing equipment, the quality of consumables (slurry, polishing pads, dressers, etc.), and variations in conditions over time during the polishing process. Change. Furthermore, in recent years, the precision and in-plane uniformity of the residual film thickness required in the semiconductor manufacturing process have become more and more severe. Under these circumstances, it is becoming more difficult to detect the polishing end point with sufficient accuracy.
  • Known major polishing end point detection methods include the optical end point detection method, the torque end point detection method, and the eddy current end point detection method.
  • the end point is detected by irradiating the wafer with light through and monitoring the reflected light.
  • Patent Documents 1 to 3 are known as methods of manufacturing a polishing pad using such an optical end point detection system. Further, as a method for manufacturing a transparent endpoint detection window, for example, Patent Document 4 is known. Further, as a polishing pad using an optical endpoint detection system, for example, Patent Document 5 is known.
  • JP 2013-197597 A Japanese Patent Application Laid-Open No. 2013-219276 Japanese Patent Application Laid-Open No. 2001-291686 Japanese Patent Application Laid-Open No. 2004-260156 JP-A-2002-001647
  • the method described in Patent Document 1 if the liner is deformed by heat during curing, a problem arises in that the window block cannot be vertically fixed to the mold. In addition, since the window block is directly fixed to the liner, it is difficult to reuse and the manufacturing cost is a problem. In addition, the method described in Patent Document 2 may damage the polishing layer and the endpoint detection window, which may lead to a reduction in the strength of the polishing pad and a reduction in optical properties required for endpoint detection. Furthermore, in the method described in Patent Document 3, the alignment notch exists at the edge of the polishing layer, and even if the size of the alignment notch is limited, there is a possibility that the polishing performance may be adversely affected. Further, in the method described in Patent Document 4, the obtained window member is inferior in film thickness evaluation performance unless the surface is smoothed by buffing or the like.
  • An object of one embodiment of the present invention is to provide a manufacturing method that can more easily manufacture a polishing pad having an endpoint detection window.
  • a method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window comprising: a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; , a slicing step of slicing the resin sheet to form a polishing layer; In the curing step, the end point detection window member is suspended and fixed by a position fixing jig installed above the mold.
  • a method for manufacturing a polishing pad comprising: a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; , a slicing step of slicing the resin sheet to form a polishing layer; In the curing step, the end point detection window member is suspended and fixed by a position fixing j
  • the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
  • a curable resin is filled and cured.
  • the position fixing jig has a first fitting part that fits with the mold upper part, and/or The mold has a second fitting portion that fits with the position fixing jig, [1] A method for producing a polishing pad according to any one of [3].
  • the position fixing jig has a positioning portion that positions and fixes the end point detection window member, [1] A method for producing a polishing pad according to any one of [4]. [6] In the curing step, the end point detection window member is suspended and fixed by being clamped by the clamping part of the position fixing jig installed on the upper part of the mold, The holding portion detachably holds the end point detection window member, [1] A method for producing a polishing pad according to any one of [5].
  • the end point detection window member is suspended and fixed by being clamped by the clamping part of the position fixing jig installed on the upper part of the mold, A lower end of the endpoint detection window member when suspended and fixed has a convex shape, [1] A method for producing a polishing pad according to any one of [6]. [8] The length L of the portion having the convex shape of the endpoint detection window member is 3.0 to 20 mm. [7] The method for producing a polishing pad according to [7]. [9] The ratio (L/S) of the length L of the convex portion of the endpoint detection window member to the horizontal cross-sectional area S of the endpoint detection window member is 0.002 to 0.4.
  • the method for producing a polishing pad [10] The length L of the portion having the convex shape of the end point detection window member is 0.03 to 0.30 Lw with respect to the total length Lw of the end point detection window member. [7] A method for producing a polishing pad according to any one of [9]. [11] further comprising a step of manufacturing the endpoint detection window member, The manufacturing process is A first mixing step of mixing polyisocyanate, polyol, and part of a curing agent, which are raw materials for window materials, to prepare a first reaction mixture, and mixing the first reaction mixture with the remainder of the curing agent.
  • the curing agent contained in the window material raw material has 3 or more functional groups.
  • the curing agent contained in the window material raw material contains a low-molecular-weight polyol having a molecular weight of less than 300.
  • the polyol contained in the window material raw material contains a high-molecular-weight polyol having a molecular weight of 300 or more.
  • the method for producing a polishing pad is described in the window material raw material.
  • the polyisocyanate contained in the window material raw material contains an alicyclic polyisocyanate and/or an aliphatic polyisocyanate.
  • a method for producing a polishing pad according to any one of [13]. a first acquisition step of acquiring position information of an endpoint detection window provided in the opening of the resin sheet; a first hole forming step of forming a hole in a portion corresponding to the installation position of the end point detection window on the adhesive sheet based on the position information; a first bonding step in which the end point detection window and the hole are aligned and the resin sheet and the adhesive surface of the adhesive sheet are bonded together; [1] A method for producing a polishing pad according to any one of [1] to [14].
  • the positional information is based on image information obtained by an imaging device, or information obtained by receiving a laser beam that has passed through an end point detection window among the laser beams applied to the resin sheet by a laser receiver.
  • the method for producing a polishing pad according to [15]. [17] forming the hole smaller than the endpoint detection window in the first hole forming step; [15] or [16] The method for producing a polishing pad.
  • the position information includes information about the center position of the endpoint detection window; In the first hole forming step, the hole is formed so that the center position of the endpoint detection window and the center position of the hole match.
  • the pressure-sensitive adhesive sheet is a double-sided tape or a laminate of a double-sided tape and another layer, [15] The method for producing a polishing pad according to any one of [18].
  • FIG. 4 is a perspective view showing one mode in which the end point detection window member of the present embodiment is sandwiched between sandwiching portions.
  • FIG. 11 is a perspective view showing another aspect in which the end point detection window member of the present embodiment is sandwiched between sandwiching portions.
  • FIG. 3 is a top view showing one mode in which a mold and a position fixing jig are combined for producing a resin sheet used in the present embodiment.
  • FIG. 4 is a top view showing another mode in which a mold and a position fixing jig are combined for producing a resin sheet used in the present embodiment.
  • FIG. 4 is a top view showing another mode in which a mold and a position fixing jig are combined for producing a resin sheet used in the present embodiment.
  • FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3A before injecting the curable resin.
  • FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3B before the curable resin is injected.
  • FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG.
  • FIG. 3A after the curable resin is injected.
  • FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3B after the curable resin is injected.
  • FIG. 4 is a top view showing a resin sheet obtained after a curing step;
  • FIG. 10 is a cross-sectional view of the resin sheet obtained after the curing process, near the end point detection window;
  • 1 is a schematic perspective view of a polishing pad of this embodiment;
  • 3 is a schematic cross-sectional view of the end point detection window portion of the polishing pad of the present embodiment; It is a schematic sectional drawing which shows the aspect
  • 1 is a schematic diagram showing a film thickness control system installed in CMP; FIG. It is a graph which shows the dispersion
  • an end-point detection window member (hereinafter simply referred to as “window member”) is fixed in a mold, and the polishing pad is in contact with the end-point detection window member. and a slicing step of slicing the resin sheet to form a polishing layer.
  • window member an end-point detection window member
  • a slicing step of slicing the resin sheet to form a polishing layer 1, a method of manufacturing a polishing pad having a polishing layer with an end point detection window by being suspended and fixed by a position fixing jig installed on the upper part of the mold.
  • the position fixing jig installed on the upper part of the mold, even if the contact part between the window material and the position fixing jig is formed to be wide, the part is not hardened resin.
  • the resin sheet can be molded without touching the Therefore, it is not necessary to remove unnecessary portions from the obtained resin sheet.
  • the window material is attached to the position fixing jig instead of the mold, the mold itself does not need to be processed, and the conventional mold can be used as it is.
  • the position fixing jig can be used repeatedly, unlike the liner, it does not need to be thrown away.
  • the method for manufacturing the polishing pad of the present embodiment may further include, before the curing step, a window member forming step of forming a window member having a convex shape at least at one end.
  • the method of forming the window member 10 is not particularly limited, but for example, resin may be injected into a mold (not shown) having a shape corresponding to a convex shape and cured, or a cured product having an arbitrary shape may be cut. It can be produced by molding a convex shape after curing with.
  • the method for manufacturing the window material described below can be referred to.
  • window material is prepared prior to the curing step.
  • the window member 10 may be rectangular parallelepiped or columnar.
  • the rectangular parallelepiped window member 10 has, for example, a columnar portion 11. As shown in FIG. Here, after the curing process, the columnar portion 11 is embedded in the resin sheet (polishing layer 50) and becomes the end point detection window 51. As shown in FIG. Since the columnar portion 11 of the rectangular parallelepiped window member 10 has side surfaces that are easy to hold, it can be more stably fixed to the position fixing jig 30 .
  • the end face of the columnar portion 11 in the hanging direction may be planar or convex. Since the end face in the hanging direction has a convex shape, the curable resin can easily flow between the end face of the window material 10 and the bottom surface 21 of the mold 20, and the entrainment of air bubbles in the curable resin can be suppressed. can. As a result, it is possible to prevent air portions from appearing as voids (holes) when slicing, and to prevent deterioration of polishing performance due to voids.
  • the columnar window material 10 can have, for example, a columnar portion 11 and a pedestal portion 12 .
  • the columnar portion 11 is embedded in the resin sheet (polishing layer 50) and becomes the end point detection window 51.
  • the cross-sectional shape of the columnar portion 11 is not particularly limited, and may be circular or polygonal.
  • the lower end 10a of the columnar portion 11 in the hanging direction may have a convex shape (Fig. 1B) or may have a planar shape (Fig. 1C).
  • the pedestal portion 12 may be used differently depending on the method of fixing the window member 10 to the position fixing jig 30 .
  • the pedestal portion 12 is a portion to be fixed to the position fixing jig 30 with an adhesive or the like. good too.
  • the columnar portion 11 and the pedestal portion 12 into a shape having the columnar portion 11 and the base portion 12 , the columnar portion 11 can be made relatively small within a range necessary for the end point detection window, and the pedestal portion 12 can be brought into close contact with the position fixing jig 30 . can ensure the integrity of the
  • the holding portion 31 may be displaced toward the pedestal portion 12 when the holding portion 31 holds the columnar portion 11. It may be a part for deterring In this case, the pedestal portion 12 may be configured to be wider than the hole diameter of the holding portion 31 of the position fixing jig 30 . As a result, when the window member 10 is inserted through the holding portion 31 of the position fixing jig 30 from above, it is locked by the pedestal portion 12, and the columnar window member 10 is fixed without falling off.
  • the columnar window member 10 has a shape having the columnar portion 11 and the pedestal portion 12 , so that the columnar portion 11 is relatively small within the range necessary for the end point detection window, and the columnar portion 11 is dropped by the pedestal portion 12 . can be further suppressed.
  • the window material By configuring the window material as described above, the tendency of the window material 10 to be displaced or slanted due to the resin injected in the curing process or the resin being cured is suppressed. It is in.
  • the columnar portion 11 can be configured to be relatively small within a necessary range as the end point detection window, the effect of embedding the end point detection window on the polishing characteristics of the polishing pad can be further reduced.
  • the shape of the window material 10 is not limited to that shown in FIGS. 1B and 1C.
  • the columnar window member 10 may have only the columnar portion 11 without the pedestal portion 12 .
  • the window material 10 is not particularly limited, it can be produced, for example, by injecting resin into a mold (not shown) and curing the resin. It is preferable that the side surface of the columnar portion 11 of the window material 10 removed from the mold is treated with sandpaper or treated with a solvent. As a result, if the release agent is attached to the window material 10, the release agent can be removed. When the window material 10 is embedded in the inner wall, the adhesiveness between the resin sheet (polishing layer 50) and the window material 10 (end point detection window 51) tends to be further improved.
  • Convex shape means a surface that rises from an end toward an arbitrary portion.
  • the term “convex shape” has a convex shape with both ends in the axial direction being low and gradually rising toward the central portion in the longitudinal direction.
  • the shape of the convex surface need not be curved as long as it is convex, and any shape that is convex toward the center can be selected.
  • the highest portion may be flat, but the area S1 of the highest portion is preferably 0 to 50 area%, more preferably 0 to 40 area%, still more preferably 0 to 30 area%, even more preferably 0 to 20 area%, still more preferably 0 to 10 area% %. Since the ratio of the area S1 to the cross-sectional area S is 50 area % or less, the curable resin easily flows between the lower surface of the window member 10 and the bottom surface 21 of the mold 20, and the curable resin does not involve air bubbles. is easily suppressed, and trapped air bubbles can be easily released.
  • the ratio of the area S1 to the cross-sectional area S is 50 area % or less means that the "convex shape" in the present embodiment does not include the case where the lower end of the window material is simply chamfered. But also.
  • the length L of the convex portion of the window member 10 is preferably 3.0 to 20 mm, more preferably 3.0 to 15 mm, and even more preferably 3.0 to 10 mm.
  • the longer the length L the greater the difference between the lowest part and the highest part of the convex shape, which tends to suppress entrainment of air bubbles in the curable resin and facilitate release of entrained air bubbles.
  • the shorter the length L the shorter the portion that cannot be used as a polishing pad and is discarded.
  • the ratio (L/S) between the length L of the convex portion of the window member 10 and the horizontal cross-sectional area S of the window member 10 is preferably 0.002 to 0.4, more preferably It is 0.005 to 0.35, more preferably 0.010 to 0.30.
  • the smaller the ratio (L/S) the shorter the portion that cannot be used as a polishing pad and is discarded.
  • the length L of the convex portion of the window member 10 is preferably 0.03 to 0.30 Lw, more preferably 0.03 to 0.25 Lw, relative to the total length Lw of the window member 10, More preferably 0.03 to 0.20 Lw.
  • the larger the length L the greater the difference between the lowest part and the highest part of the convex shape, which tends to suppress entrainment of air bubbles in the curable resin and facilitate release of entrained air bubbles.
  • the smaller the length L the shorter the portion that cannot be used as a polishing pad and is discarded.
  • the curing step is a step of fixing the window member in the mold and curing the curable resin in contact with the window member to form a resin sheet incorporating the window member.
  • FIG. 3A to 3C show top views of a mold 20 for producing a resin sheet.
  • the position fixing jig 30 is installed above the mold 20, and the window member 10 is fixed vertically downward from the position fixing jig 30.
  • FIG. 3B is a top view of the mold 20 and shows a mode in which the window material 10 is fixed below the position fixing jig 30 with an adhesive. showing.
  • FIGS. 4A and 4B are shown in order to explain the positional relationship between the mold 20, the position fixing jig 30 and the window material 10 in more detail.
  • FIGS. 4A and 4B are cross-sectional views taken along line A-A' in FIGS. 3A and 3B before the curable resin is injected into the mold 20.
  • FIG. As can be seen from FIGS. 3A and 3B and FIGS. 4A and 4B, the mold 20 is a flat mold for forming a resin sheet, and the position fixing jig 30 is a concave portion of the mold 20. is fixed in contact with the side wall 22 so as to cover the .
  • the portion of the position fixing jig 30 that contacts the mold 20 may have an uneven shape (first fitting portion) that can be fitted to the upper portion of the mold 20 . Further, the portion of the mold 20 that contacts the position fixing jig 30 may also have an uneven shape (second fitting portion) that can be fitted with the position fixing jig 30 . This facilitates the positioning of the position fixing jig 30 when installing the position fixing jig 30 in the mold 20, and tends to suppress deviation of the embedding position of the window material 10 for each curing process. be.
  • the window member 10 is suspended and fixed to the lower side of the position fixing jig 30, and the columnar portion 11 faces downward in the vertical direction.
  • the window member 10 may be fixed to the position fixing jig 30 by the pedestal portion 12 . Any adhesive, double-sided tape, or the like can be used for this fixation.
  • the position fixing jig 30 may have a positioning portion for positioning and fixing the window material 10 .
  • the positioning portion may have an uneven shape formed at a place where the position fixing jig 30 and the pedestal portion 12 are in contact with each other so that the position fixing jig 30 and the pedestal portion 12 can be fitted. As a result, it tends to be possible to suppress displacement of the embedding position of the window member 10 for each curing step.
  • the window material 10 when the window material 10 is fixed to the bottom surface of the mold 20, it is difficult to change the number and position of the window material 10 after filling the mold with a curable resin.
  • the window material 10 when the window material 10 is suspended and fixed as in the present embodiment, the position of the window material 10 is changed even after the curable resin is filled into the mold 20 but before it is cured. or change the number of window materials 10 .
  • the mold 20 is similar to that used for manufacturing a polishing pad without an endpoint detection window. It is also possible to use the object as it is.
  • the material of the position fixing jig 30 is not particularly limited, it may be a heat-resistant material that does not deform even with the heat of the hardening process. Examples include aluminum alloy and stainless steel.
  • the position fixing jig 30 preferably has a holding part 31 .
  • the holding part 31 can hold a part of the window member 10 and suspend and fix it.
  • the window member 10 can be vertically suspended and fixed. becomes less likely to occur. Therefore, if the window material 10 is fixed obliquely rather than straight and vertically, it may not function as an endpoint detection window, or may be caused by the flow of the curable material, or by the expansion or contraction of the curable material during curing. , the window material 10 is suppressed from being pushed and causing positional deviation or the like.
  • the clamping part 31 it is not necessary to use fixing means such as an adhesive, and the attachment and detachment of the window material 10 is facilitated.
  • fixing means such as an adhesive
  • the window member 10 can be clamped from at least one direction, and the clamping force can be weakened to facilitate attachment and detachment.
  • processing such as flattening the bonding surface of the window material 10 by scraping it with sandpaper or the like is required, but such a treatment is not required when the clamping portion 31 is used. Become.
  • the position cannot be adjusted once fixed.
  • the clamping portion can be loosened to finely adjust the embedding position of the window material.
  • the size of the window placed in the polishing pad should be as small as possible to accurately deliver the transmitted light to the detector portion of the polishing apparatus through the small endpoint detection window. For this purpose, it is necessary to place the windows at exactly the same location on both polishing pads. Therefore, by enabling fine adjustment as described above, it is also possible to improve the non-defective product rate. Further, after the curable resin is cured, the clamping portion is loosened and the window material is removed from the clamping portion, thereby separating the position fixing jig and the obtained resin sheet.
  • the clamping portion 31 is not particularly limited as long as it clamps and fixes the window member 10 as described above, and may have one or more members that clamp the window member 10. Further, the clamping force may be reduced. It may have an adjusting section 32 for adjustment. Among these, from the viewpoint of ease of attachment and detachment, the holding portion 31 configured to hold the window material 10 by simply fitting is preferable, and from the point of being able to adjust the fixing strength, the holding portion 31 having the adjustment portion 32 is preferred. preferable.
  • such an adjusting portion 32 may be a screw or a spring that tightens a plurality of members (holding portion 31) that hold the window material 10 therebetween as shown in FIG. 2A.
  • the clamping part 31 made up of two members is connected via an adjusting part 32 (screw), and the adjusting part 32 can adjust the distance between the clamping part 31 made up of the two members.
  • the adjusting portion 32 tightens the clamping portions 31 so that the distance between the clamping portions 31 is shortened, thereby pressing the side surfaces of the window member 10 and adjusting the clamping force.
  • the adjustment part 32 may be, for example, a screw or a spring that tightens the window member 10 together with the clamping part 31 as shown in FIG. 2B.
  • the forms of the holding part 31 and the adjusting part 32 are not limited to the above, and can have any structure as long as they are configured to increase or decrease the holding force.
  • the position fixing jig 30 may have a through-hole 33 through which the window member 10 is inserted, and at this time, the holding portion 31 may hold the window member 10 inserted through the through-hole 33 .
  • FIGS. 3A and 3B show a top view of the mold 20 for making the resin sheet
  • FIGS. 4A and 4B show the A ⁇ in FIGS. A' shows a cross-sectional view.
  • a mold 20 shown in FIGS. 3A and 4A includes a position fixing jig 30 that fixes the window member 10 shown in FIG. 1B by an adjusting portion 32 shown in FIG. 2B.
  • the position fixing jig 30 is installed on top of the mold 20, and the window member 10 is held by the holding portion 31 of the position fixing jig 30, thereby vertically downward. Suspended and fixed.
  • the shape of the mold 20 is not particularly limited. can be a type.
  • a position fixing jig 30 is fixed in contact with the side wall 22 so as to cover the upper portion of the mold 20 .
  • the window member 10 is fixed in the mold 20 as described above, and the curable resin 40 is cured while in contact with the window member 10 to form the window member 10 (end point detection window 51). to form a resin sheet (polishing layer 50) in which is incorporated.
  • FIG. 4A shows a cross-sectional view of A-A' in FIG. 3A.
  • the window member 10 is fixed to the position fixing jig 30 by the holding portion 31 (see FIG. 2A).
  • FIG. 5A shows a cross-sectional view of a state in which the curable resin is injected into the mold 20 in FIG. 4A.
  • FIG. 4B shows a cross-sectional view along A-A' in FIG. 3B.
  • the window material 10 is fixed to the position fixing jig 30 with an adhesive.
  • FIG. 5B shows a cross-sectional view of a state in which the curable resin is injected into the mold 20 in FIG. 4B.
  • the curing process is not particularly limited as long as it cures the curable resin 40 in contact with the window material 10 .
  • the mold 20 may be filled with the curable resin 40 and the curable resin 40 may be cured.
  • the mold 20 may be filled with the curable resin 40, the window material 10 may be brought into contact with the curable resin 40, and then the curable resin 40 may be cured.
  • the curable resin is not particularly limited, but examples include polyester-based polyurethane resins, polyether-based polyurethane resins, and polycarbonate-based polyurethane resins. You may use these individually by 1 type or in combination of 2 or more types.
  • Such a polyurethane resin can be synthesized from polyisocyanate and polyol.
  • the slicing step is a step of slicing the resin sheet to form a polishing layer.
  • 6 and 7 show a top view and a cross-sectional view of the resin sheet (polishing layer 50) obtained by removing it from the mold 20 and removing the pedestal portion 12 after the curing process. As shown in FIGS. 6 and 7, the resin sheet has a window material embedded therein.
  • the slicing method is not particularly limited, but for example, a method of cutting a resin sheet as shown in FIGS. Moreover, as shown in FIG. 8, a rectangular polishing pad may be cut into a circular shape.
  • the temperature for slicing is preferably 80.degree. C. to 100.degree. This tends to further improve flatness.
  • the polished surface of the resin sheet obtained may be dressed.
  • the temperature in the dressing treatment is preferably 85°C to 95°C. This tends to further improve flatness.
  • the method of manufacturing the polishing pad of the present embodiment may optionally include a groove forming step of performing groove processing on the polishing surface of the polishing layer (see FIG. 9). Note that it is preferable not to perform grooving on the exposed portion of the window material, as this interferes with the detection of the optical end point.
  • the method for producing the polishing pad of the present embodiment may optionally include a lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface. good.
  • the stacking process may be performed before or after the dressing process and the groove forming process. That is, the stacking process, the dressing process, and the groove forming process can be performed in any order.
  • the lamination step for the above purpose includes a first acquisition step of acquiring position information of the end point detection window provided in the opening of the resin sheet, and a portion corresponding to the installation position of the end point detection window on the adhesive sheet based on the position information. a first hole forming step of forming a hole; and a first bonding step of bonding the resin sheet and the adhesive surface of the adhesive sheet together by aligning the end point detection window with the hole.
  • the lamination step of this aspect further includes a second acquisition step of acquiring position information of holes formed in the double-sided tape on the resin sheet when the adhesive sheet is a double-sided tape, and based on the position information, A second hole forming step of forming a hole in a portion corresponding to the installation position of the end point detection window on another layer, and aligning the hole in the double-sided tape with the hole in the other layer, and a second bonding step of bonding the tape and another layer.
  • a cushion layer is mentioned as "another layer" here.
  • FIGS. 10 and 11 are schematic cross-sectional views of each step.
  • the stacking step of this embodiment may include a cutting step for trimming the outer shape of the resin sheet in which the end point detection window 51 is embedded (hereinafter referred to as “polishing layer 50”) before the first obtaining step. good.
  • a center position O that is equidistant from each of the end point detection windows 51 is specified from the positions of the end point detection windows 51, and the polishing layer 50 is cut into a predetermined square shape centering on that position. You can cut it.
  • polishing layer 50 having a standardized outer shape based on the center position O specified by the end point detection window 51 .
  • each step can be performed with higher accuracy.
  • the polishing layer 50 provided after the first obtaining step is formed into a square shape as shown in FIG. It may be one before punching. Among these, a rectangular shape is preferable in carrying out subsequent steps related to alignment, such as regulating the orientation of the polishing layer 50 during transportation.
  • the polishing pad is obtained by further punching into a circular shape based on the center position O specified by the end point detection window 51.
  • the first acquisition step is a step of acquiring position information of the endpoint detection window 51 provided in the opening of the polishing layer 50 .
  • the resin sheet may have multiple endpoint detection windows.
  • the first manufacturing apparatus 100 acquires the position information of the transport mechanism 110 such as a belt conveyor that transports the polishing layer 50 having the end point detection window 51 and the end point detection window 51 provided at the opening of the polishing layer 50.
  • a roller 141 for sending out an adhesive sheet 61 with a release sheet 62 attached thereto; a hole forming device 130 for forming openings in the sent adhesive sheet 61;
  • the polishing layer 50 and the adhesive sheet 61 are bonded together while aligning the roller 142 for peeling the sheet 62, the hole of the adhesive sheet 61 from which the release sheet 62 has been peeled, and the end point detection window 51 of the polishing layer 50.
  • - ⁇ A roller 143 is provided.
  • the conveying mechanism 110, the imaging device 120, the hole forming device 130, and the rollers 141, 142, 143 may be connected by wire or wirelessly to a control unit (not shown) that controls them.
  • the control unit can be configured as an information processing device such as a personal computer. Driving control of the conveying mechanism 110, imaging device 120, hole forming device 130, and rollers 141, 142, 143, and transmission of information can be performed via this controller.
  • a method of acquiring the positional information of the end point detection window 51 is not particularly limited, but for example, image information captured when the polishing layer 50 conveyed in the direction of arrow F by the conveying mechanism 110 passes directly below the imaging device 120 is used. can be obtained. At this time, the transport mechanism 110 may be driven so that the polishing layer 50 is temporarily stopped immediately below the imaging device 120 for imaging.
  • the method for extracting the position information of the end point detection window 51 from the image information acquired in this way is not particularly limited.
  • a laser receiver may be used instead of the imaging device 120.
  • the position of the end-point detection window 51 may be specified based on the information obtained by receiving the laser light that has passed through the end-point detection window 51 out of the laser beams applied to the polishing layer 50 by a laser receiver. good.
  • the conveying mechanism 110 may be driven so as to temporarily stop the polishing layer 50 immediately below the laser oscillator and the laser receiver, and the laser oscillator and the laser receiver may be scanned with respect to the polishing layer 50, or By fixing the laser oscillator and the laser receiver in the middle of the transport mechanism 110 and continuing to move the transport mechanism 110 at a constant speed, the laser oscillator and the laser receiver relatively scan the polishing layer 50.
  • the position of the endpoint detection window 51 may be specified.
  • control unit may calculate the center position of the end point detection window 51 based on the information regarding the contour of the end point detection window 51 obtained from the image information.
  • the positional information such as the outline and center position of the end point detection window 51 acquired in this manner may be transmitted to the hole forming device 130 via the control unit.
  • the first hole forming step is a step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on the adhesive sheet based on the positional information.
  • the adhesive sheet may be a double-sided tape, or may be a laminate of a double-sided tape and another layer such as a cushion layer.
  • control unit drives and controls the roller 141 to send out the adhesive sheet 61 , transmits the positional information of the end point detection window 51 to the hole forming device 130 , and detects the end point detection window on the sent adhesive sheet 61 .
  • a hole is formed by the hole forming device 130 in a portion corresponding to the installation position of the .
  • the rollers 141 may be paused while the perforations are being performed by the perforator 130 .
  • the hole forming device 130 may form a hole smaller than the end point detection window 51 . More specifically, the control unit transmits positional information including information on the contour of the end point detection window 51 and its center position to the hole forming device 130, and the hole forming device 130 forms a hole smaller than the contour. , can be formed while aligning so that the center position of the end point detection window 51 and the center position of the hole to be formed match.
  • the adhesive sheet 61 having a hole smaller than the end point detection window 51 can be attached to the polishing layer 50 while aligning the center position of the formed hole with the center position of the end point detection window 51 . can.
  • the endpoint detection window 51 can be supported from the back side of the polishing layer 50 by the adhesive sheet 61 . Therefore, the durability of the resulting polishing pad can be further improved.
  • the first bonding step is a step of aligning the endpoint detection window and the hole and bonding the resin sheet and the adhesive surface of the adhesive sheet together.
  • the adhesive sheet after bonding may be cut according to the size of the resin sheet.
  • control unit drives and controls the roller 141 to further feed out the perforated adhesive sheet 61 , and drives and controls the roller 142 to release the mold release bonded to the adhesive surface of the adhesive sheet 61 .
  • the sheet 62 is wound.
  • the controller drives the conveying mechanism 110 to further feed the polishing layer 50 in the direction of the arrow F, align the end point detection window 51 with the hole, and adhere the polishing layer 50 and the adhesive sheet 61 to each other. Glue the surface together.
  • the controller can drive and control the roller 143 and the transport mechanism 110 while calculating the positional relationship between the adhesive sheet 61 sent by the roller 141 and the polishing layer 50 transported by the transport mechanism 110 . Further, in the drive control, based on the information on the center position of the hole formed in the adhesive sheet 61 and the information on the center position of the end point detection window 51 of the polishing layer 50, polishing is performed so that these center positions overlap each other. The moving distance of the layer 50 and the adhesive sheet 61 may be controlled to adhere them together.
  • the end point detection window 51 and the holes formed in the adhesive sheet 61 can be stuck together in a state where they overlap concentrically. Therefore, for example, as shown in FIGS. 8 and 9, when the hole formed in the adhesive sheet 61 is smaller than the endpoint detection window 51, the endpoint detection window 51 can be supported from the back side of the polishing layer 50 by the adhesive sheet 61. can. Therefore, the durability of the resulting polishing pad can be further improved.
  • the second acquisition step is a step of acquiring the positional information of the holes of the double-sided tape laminated onto the polishing layer 50 in the first lamination step.
  • the second manufacturing apparatus 200 includes a transport mechanism 210 that transports the polishing layer 50, an imaging device 220 that acquires the positional information of the holes of the double-sided tape, a roller 241 that transports the other layer 71, and a
  • the hole forming device 230 for forming openings in the other layer 71 and the polishing layer 50 and the other layer 71 are aligned while aligning the holes of the other layer 71 with the holes of the double-sided tape of the polishing layer 50 . and a roller 242 for bonding.
  • the conveying mechanism 210, the imaging device 220, the hole forming device 230, and the rollers 241 and 242 may be connected by wire or wirelessly to a second control section (not shown) that controls them.
  • the second control unit can be configured as an information processing device such as a personal computer. Driving control of the conveying mechanism 210, imaging device 220, hole forming device 230, and rollers 241 and 242, and transmission of information can be performed via this second control section.
  • the method for acquiring the positional information of the holes of the double-sided tape bonded onto the polishing layer 50 is not particularly limited. method.
  • the second hole forming step is a step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on another layer based on the position information acquired in the second acquiring step.
  • the other layer may be a cushion layer, or may be a cushion layer laminated with double-sided tape.
  • control unit drives and controls the roller 241 to send out the other layer 71, and transmits the positional information of the holes of the double-sided tape to the hole forming device 230, and Holes are formed by the hole forming device 230 in portions corresponding to the installation positions of the double-sided tape.
  • the rollers 241 may be paused while the perforations are being performed by the perforator 230 .
  • the second bonding step is a step of aligning the holes in the double-sided tape with the holes in the other layer and bonding the double-sided tape on the resin sheet to the other layer. Other layers after bonding may be cut according to the size of the resin sheet.
  • the second control unit drives and controls the roller 242 to further send out the perforated adhesive sheet 61, drives the conveying mechanism 210 to further send out the polishing layer 50 in the direction of arrow F,
  • the adhesive surface (adhesive sheet 61) of the polishing layer 50 and the other layer 71 are bonded together by aligning the holes in the double-sided tape with the holes in the other layer.
  • the transport mechanism is arranged so that these center positions overlap each other. 210 and roller 242 may be driven and controlled. As a result, the holes formed in the other layer 71 and the holes of the double-sided tape of the polishing layer 50 can be laminated in a state where they overlap concentrically, so that the durability of the resulting polishing pad can be further improved. .
  • polishing layer 50 to which the other layer 71 is attached as described above can be punched into a circular shape in the subsequent steps and used as a polishing pad.
  • the window material is not particularly limited as long as it is a method for obtaining a transparent window material by curing a window material raw material. Among them, Mode I for the purpose of removing air bubbles efficiently in a shorter time and Mode II for the purpose of improving the uniformity of physical properties of the resulting window material will be described below. In addition, you may use these aspects in combination, respectively.
  • Aspect I is a rotational movement step in which a container containing the prepared window material is rotated at 100 to 800 rpm while revolving on a predetermined circumference at 200 to 1600 rpm, and the window material after the rotational movement is cured. and a window material curing step of obtaining a window material.
  • the endpoint detection window is non-foaming and evenly mixed so as not to adversely affect the optical transparency. This is because if there is bubbling, the attenuation of the reflected light increases due to light scattering, which lowers the polishing end point detection accuracy and the film thickness measurement accuracy. This is because there is a portion that advances, and an end-point detection window with non-uniform crosslink density is formed.
  • the window material raw material containing no air bubbles and uniformly mixed can be obtained by going through the rotational movement step as described above. As a result, it is possible to manufacture an endpoint detection window with excellent polishing endpoint detection accuracy and film thickness measurement accuracy.
  • non-foaming and uniform mixing can be achieved in a shorter period of time by going through the rotational movement process.
  • a highly reactive window material which could not be used until now in consideration of the time required for defoaming, etc., as the window material for the endpoint detection window.
  • the reactivity is different, only the slow-reacting components are mixed first, and then the highly reactive components are added.
  • the raw material for the window material it is possible to prepare the raw material for the window material at the same time, and to perform stirring and defoaming.
  • the method of manufacturing the endpoint detection window member may include a preheating step of individually heating each component contained in the window material in advance.
  • each component contained in the raw material for the window material may react and generate heat. Therefore, by individually preheating each component contained in the window material in advance and then mixing them as the window material, the processing temperature tends to be stabilized in the rotation process. This tends to promote degassing and improve mixing uniformity.
  • the preheating temperature is not particularly limited, for example, it is preferably 50 to 130°C, more preferably 60 to 125°C, and even more preferably 70 to 120°C.
  • the preheating temperature is within the above range, the degassing is further promoted, and the uniformity of mixing tends to be further improved.
  • the rotational motion step is a step of revolving on a predetermined circle at 200 to 1600 rpm while rotating the container containing the blended window material raw material at 100 to 800 rpm.
  • the rotation speed is 100-800 rpm, preferably 200-700 rpm, more preferably 300-600 rpm. When the rotation speed is within the above range, the uniformity of mixing tends to be further improved.
  • the revolution speed is 200-1600 rpm, preferably 400-1400 rpm, more preferably 600-1200 rpm. When the revolution speed is within the above range, degassing tends to be promoted more.
  • the inclination of the axis of rotation and the axis of revolution in the rotational motion process is preferably 20 to 70°, more preferably 30 to 60°, and even more preferably 35 to 55°.
  • a three-dimensional swirling flow is generated in the raw material for the window material in the container, which tends to promote degassing and improve uniformity of mixing.
  • the rotary motion step is preferably performed under reduced pressure, more preferably 0.1 to 0.9 atm or less, and even more preferably 0.2 to 0.8 atm or less. Degassing tends to be promoted more by performing the rotary movement process under reduced pressure. Further, by performing the rotational movement process at 0.1 atm or more, there is a tendency that unintended volatilization of the components can be suppressed.
  • the processing time of the rotational motion step is preferably 1 to 10 minutes, more preferably 2 to 8 minutes, and even more preferably 3 to 6 minutes. If the treatment time is shorter than the above range, mixing will be insufficient and a uniform window material raw material will not be obtained. As the reaction of the raw materials progresses, the viscosity increases, and it tends to be difficult to take out the window material raw materials from the container. When the surface of the endpoint detection window is flush with the polishing surface, polishing is likely to be adversely affected unless the endpoint detection window is made of a window material with a short curing time (high reactivity).
  • a window material having a long hardening time is less likely to be worn, and the produced polishing pad having the end point detection window may have a protruded window portion during polishing, which may adversely affect polishing such as scratches.
  • the window material raw material having a short curing time is moderately hard and brittle, and as the polishing layer wears, the end-point detection window is also worn, preventing the end-point detection window alone from protruding. Therefore, it is preferable that the treatment time is within the above range.
  • the temperature of the rotational motion step is preferably 50-130°C, more preferably 60-125°C, and even more preferably 70-120°C.
  • the temperature is 50° C. or higher, the viscosity tends to be relatively low and the degassing tends to be promoted more.
  • the temperature is 130° C. or lower, the reaction rate of the window material raw materials does not become too high, and the mixing uniformity tends to be further improved.
  • the window material curing step is a step of obtaining the window material by curing the window material raw material after the rotational movement.
  • This window material curing step is not particularly limited, but for example, the window material is provided by pouring the window material material after rotational movement into the hollowed out portion of the polishing layer and allowing the curing reaction to proceed in the hollowed out portion.
  • a curable resin that constitutes the polishing layer is then cast around the obtained window material, and cured to constitute the polishing layer.
  • a mode of obtaining a polishing layer provided with a window material by curing a curable resin; a mode of obtaining a polishing layer provided with a window material by slicing the obtained window material as necessary and inserting it into a polishing layer provided with an opening. may be included.
  • the window material raw material for obtaining the window material is not particularly limited as long as it is a transparent member that can function as a window when cured.
  • Ethersulfone resin, polystyrene resin, polyethylene resin, polytetrafluoroethylene resin and the like can be mentioned. Among these, polyurethane resin is preferable.
  • the window material raw material preferably contains polyisocyanate, polyol, and curing agent.
  • a polyurethane resin can be synthesized from such a window material.
  • Polyisocyanate is not particularly limited, but includes, for example, alicyclic polyisocyanate, aliphatic polyisocyanate, and aromatic polyisocyanate. Polyisocyanate may be used individually by 1 type, or may use 2 or more types together. Among these, the polyurethane resin preferably contains an alicyclic isocyanate and/or an aliphatic isocyanate. This tends to further improve the transparency.
  • alicyclic polyisocyanate is not particularly limited, for example, 4,4′-methylene-bis(cyclohexyl isocyanate) (hydrogenated MDI), cyclohexylene-1,2-diisocyanate, cyclohexylene-1,4-diisocyanate , isophorone diisocyanate, and the like.
  • aliphatic polyisocyanates include, but are not limited to, hexamethylene diisocyanate (HDI), pentamethylene diisocyanate (PDI), tetramethylene diisocyanate, propylene-1,2-diisocyanate, butylene-1,2-diisocyanate, and trimethylene. diisocyanate, trimethylhexamethylene diisocyanate, and the like.
  • aromatic polyisocyanates include, but are not limited to, phenylene diisocyanate, 2,6-tolylene diisocyanate (2,6-TDI), 2,4-tolylene diisocyanate (2,4-TDI), and xylylene diisocyanate. , naphthalene diisocyanate, and diphenylmethane-4,4′-diisocyanate (MDI).
  • the number of isocyanates in the polyisocyanate is preferably 2-4, more preferably 2-3, and still more preferably 2.
  • a high molecular weight polyol is a polyol having a molecular weight of 300 or higher.
  • high-molecular-weight polyols include, but are not limited to, polyether polyols, polyester polyols, polycarbonate polyols, polyether polycarbonate polyols, polyurethane polyols, epoxy polyols, vegetable oil polyols, polyolefin polyols, acrylic polyols, and vinyl monomers. modified polyols;
  • the high-molecular-weight polyols may be used singly or in combination of two or more.
  • polyether polyol is preferred, and polytetramethylene ether glycol is more preferred. Use of such a high-molecular-weight polyol tends to further improve transparency.
  • the number of hydroxyl groups possessed by the polyol is preferably 2-4, more preferably 2-3, still more preferably 2.
  • the content of polyether polyol in the window material raw material is preferably 10 to 60 mol%, more preferably 20 to 50 mol%, relative to the total amount of polyol.
  • the polyether polyol content is within the above range, the transparency tends to be further improved.
  • curing agent is not particularly limited, examples thereof include low-molecular-weight polyols and polyamines having a molecular weight of less than 300.
  • low-molecular-weight polyols include, but are not limited to, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, 1,2-butylene glycol, 1,3-butylene glycol, 2,3-butylene glycol, 1,4- butylene glycol, 1,5-pentanediol, neopentyl glycol, 1,6-hexane glycol, 2,5-hexanediol, dipropylene glycol, 2,2,4-trimethyl-1,3-pentanediol, tricyclode low molecular weight polyols having two hydroxyl groups such as candimethanol and 1,4-cyclohexanedimethanol; and low molecular weight polyols having three or more hydroxyl groups such as glycerin, hexanetriol, trimethylolpropane, isocyanuric acid and erythritol. Low-molecular-weight polyols may be used sing
  • low-molecular-weight polyols having 3 or more hydroxyl groups are preferred, and glycerin is more preferred. Use of such a low-molecular-weight polyol tends to further improve transparency.
  • the polyamine is not particularly limited, but for example, aliphatic polyamines such as ethylenediamine, propylenediamine and hexamethylenediamine; alicyclic polyamines such as isophoronediamine and dicyclohexylmethane-4,4'-diamine; '-dichloro-4,4'-diaminodiphenylmethane (MOCA), 4-methyl-2,6-bis(methylthio)-1,3-benzenediamine, 2-methyl-4,6-bis(methylthio)-1, aromatic polyamines such as 3-benzenediamine and 2,2-bis(3-amino-4-hydroxyphenyl)propane;
  • aliphatic polyamines such as ethylenediamine, propylenediamine and hexamethylenediamine
  • alicyclic polyamines such as isophoronediamine and dicyclohexylmethane-4,4'-diamine
  • MOCA '-dichloro-4,
  • aromatic polyamines are preferred, and 3'-dichloro-4,4'-diaminodiphenylmethane (MOCA) is more preferred.
  • MOCA 3'-dichloro-4,4'-diaminodiphenylmethane
  • the content of the curing agent in the window material raw material is preferably 40 to 90 mol%, more preferably 50 to 80 mol%, still more preferably 60 to 70 mol%, relative to the total amount of the polyol and the curing agent. .
  • the content of the curing agent is within the above range, hardness or durability suitable for the endpoint detection window tends to be obtained.
  • the method for producing a window material of Embodiment II includes a first mixing step of mixing a polyisocyanate, a polyol, and a portion of a curing agent to prepare a first reaction mixture; and a window material curing step of curing the second reaction mixture to obtain a window material, wherein the curing agent has three or more functional groups have.
  • the polymerization reaction progresses from the most reactive component first, so when viewed from a microscopic point of view, the cross-linked portion becomes dense. , a portion where cross-linking is sparse is likely to occur, and physical properties of the obtained window material may vary. Such variations in physical properties may make it difficult to stabilize the surface shape of the end-point detection window during slicing, destabilize polishing performance, and cause variations in end-point detection accuracy.
  • a prepolymer is prepared by reacting a polyol with an excess amount of polyisocyanate in advance, then taken out and mixed with a prepolymer and a chain extender (curing agent) in a container separate from the container in which the prepolymer was prepared. Therefore, compared with the one-shot method, there is a problem that the work becomes more complicated.
  • the polyisocyanate, the polyol, and a portion of the curing agent are mixed to synthesize a pseudo-prepolymer, and in the second mixing step, the remaining curing agent is added to allow chain extension of the quasi-prepolymer to proceed.
  • the curing agent and the pseudo-prepolymer are reacted in the second mixing step, so that the physical properties of the window material can be easily stabilized in the same manner as in the prepolymer method.
  • the second mixing step can be started only by adding a chain extender (curing agent) without taking out the pseudo prepolymer after the first mixing step. Allow the reaction to proceed. Therefore, the complexity of the work surface in the prepolymer method can be omitted, and a window material having uniform physical properties can be obtained more easily.
  • the first mixing step is the step of mixing the polyisocyanate, the polyol, and a portion of the curing agent to form a first reaction mixture.
  • the mixing method is not particularly limited as long as it is mixed by a conventionally known method, but it is preferable to mix using a rotation-revolution mixer.
  • mixing is preferably performed under reduced pressure and/or with centrifugal force applied. As a result, air bubbles generated during mixing can be easily removed, and air bubbles can be prevented from entering the obtained window material.
  • the first reaction mixture (pseudo-prepolymer) obtained by this first mixing step is a compound obtained by reacting one or more functional groups of the curing agent with the isocyanate groups of the polyisocyanate, one or more hydroxyl groups of the polyol and the polyisocyanate. Compounds reacted with isocyanate groups, or compounds obtained by further reacting isocyanate groups of these compounds with functional groups of curing agents or hydroxyl groups of polyols may be included.
  • the terminal of each compound rather has an isocyanate group, which is close to the prepolymer in the prepolymer method.
  • a compound obtained by reacting the hydroxyl groups of the polyol with the isocyanate groups of the polyisocyanate is produced as a prepolymer
  • one of the curing agents Compounds obtained by reacting the above functional groups with isocyanate groups of polyisocyanate, compounds obtained by reacting one or more hydroxyl groups of polyol with isocyanate groups of polyisocyanate, or isocyanate groups possessed by these compounds, and further functional groups of curing agents or polyols.
  • a compound etc. is produced by reaction of the hydroxyl group of Compounds in this state are referred to as quasi-prepolymers in Embodiment II.
  • the mixing temperature in the first mixing step is preferably 40-80°C, more preferably 40-70°C, still more preferably 40-60°C.
  • the mixing time in the first mixing step is preferably 5 to 30 minutes, more preferably 7 to 25 minutes, still more preferably 10 to 20 minutes.
  • Polyisocyanate is not particularly limited, but includes, for example, alicyclic polyisocyanate, aliphatic polyisocyanate, and aromatic polyisocyanate. Polyisocyanate may be used individually by 1 type, or may use 2 or more types together. Among these, it preferably contains alicyclic polyisocyanate and/or aliphatic polyisocyanate, and more preferably contains alicyclic polyisocyanate. As a result, the dynamic viscoelastic properties and the D hardness can be easily adjusted within the above range, and the transparency tends to be further improved.
  • alicyclic polyisocyanate examples include those exemplified in Mode I above.
  • low molecular weight diols are diols with a molecular weight of less than 300.
  • a high molecular weight polyol is a polyol having a molecular weight of 300 or more.
  • Each of the low-molecular-weight diol and the high-molecular-weight polyol may be used alone or in combination of two or more. Among these, it is preferable to contain a high-molecular-weight polyol. As a result, the physical properties of the resulting window material tend to be more uniform.
  • low-molecular-weight diols include, but are not limited to, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, 1,2-butylene glycol, 1,3-butylene glycol, 2,3-butylene glycol, 1,4- butylene glycol, 1,5-pentanediol, neopentyl glycol, 1,6-hexane glycol, 2,5-hexanediol, dipropylene glycol, 2,2,4-trimethyl-1,3-pentanediol, tricyclode Kandimethanol, 1,4-cyclohexanedimethanol and the like can be mentioned.
  • high-molecular-weight polyols examples include those exemplified in Mode I above. Among these, it is preferable to contain a polyether polyol. As a result, the physical properties of the resulting window material tend to be more uniform.
  • the number of hydroxyl groups possessed by the polyol is preferably 2-4, more preferably 2-3, still more preferably 2.
  • the amount of isocyanate groups in polyisocyanate and the amount of hydroxyl groups in polyol are defined as follows.
  • the hydroxyl group content of the polyol in this definition is preferably 0.20 to 0.50, more preferably 0.25 to 0.40, and still more preferably 0.30, relative to the isocyanate group content of the polyisocyanate. ⁇ 0.35.
  • the curing agent in Mode II has 3 or more functional groups in one molecule.
  • functional groups include, but are not limited to, hydroxyl groups and primary amino groups.
  • the curing agent has 3 or more functional groups may mean that the total number of hydroxyl groups and primary amino groups is 3 or more.
  • the curing agent forms cross-linking points by reacting with the polyisocyanate.
  • curing agents examples include, but are not limited to, polyamines and polyols having 3 or more functional groups. Curing agents may be used singly or in combination of two or more.
  • the polyamine is not particularly limited as long as it is a substance having 3 or more amino groups, and examples thereof include a trifunctional triamine compound, a tetrafunctional or higher polyamine compound, and the like.
  • the polyol having 3 or more hydroxyl groups is not particularly limited, for example, a low-molecular-weight polyol is preferable, and glycerin is more preferable.
  • low-molecular-weight polyols include, but are not limited to, glycerin, hexanetriol, trimethylolpropane, isocyanuric acid, erythritol, and the like.
  • the amount of the curing agent used in the first mixing step is preferably when the sum of the amount a of the curing agent used in the first mixing step and the amount b of the curing agent used in the second mixing step is 100% by mass.
  • the amount a used is 10 to 90% by mass, more preferably 20 to 80% by mass, still more preferably 30 to 70% by mass, and even more preferably 40 to 60% by mass.
  • the amount a used is within the above range, the resulting window material tends to have more uniform physical properties.
  • the number of functional groups possessed by the curing agent is preferably 3-5, more preferably 3-4, still more preferably 3.
  • the molecular weight of the curing agent is preferably less than 500, more preferably less than 300, even more preferably less than 100.
  • the functional group amount of the curing agent used in the first mixing step is preferably relative to the isocyanate group amount of the polyisocyanate. is 0.20 to 0.50, more preferably 0.25 to 0.40, still more preferably 0.30 to 0.35.
  • Isocyanate group weight of polyisocyanate number of isocyanate groups per molecule of polyisocyanate x parts by mass of polyisocyanate/molecular weight of polyisocyanate (1)
  • Amount of functional groups in curing agent number of functional groups per molecule of curing agent ⁇ parts by mass of curing agent/molecular weight of curing agent (3)
  • the functional group amount of the curing agent used in the first mixing step and the second mixing step is the same as the isocyanate group amount of the polyisocyanate.
  • the amount is preferably 0.40 to 1.0, more preferably 0.50 to 0.80, still more preferably 0.60 to 0.70.
  • the second mixing step is the step of mixing the first reaction mixture with the remainder of the curing agent to form a second reaction mixture.
  • the mixing method is not particularly limited as long as it is mixed by a conventionally known method, but it is preferable to mix using a rotation-revolution mixer. Moreover, mixing is preferably performed under reduced pressure and/or with centrifugal force applied. As a result, air bubbles generated during mixing can be easily removed, and air bubbles can be prevented from entering the obtained window material.
  • the reaction between the isocyanate groups of the pseudo-prepolymer produced in the first mixing step and the functional groups of the newly added remaining curing agent proceeds.
  • the polymerization reaction can proceed in a controlled manner as compared with the one-shot method, and a polyurethane having more uniform physical properties can be produced.
  • a reaction between a functional group such as a hydroxyl group of the pseudo-prepolymer and an isocyanate group of the pseudo-prepolymer may proceed.
  • the mixing temperature in the second mixing step is preferably 40-80°C, more preferably 40-70°C, still more preferably 40-60°C. Further, the mixing time in the second mixing step is preferably 10 seconds to 5 minutes, more preferably 30 seconds to 4 minutes, still more preferably 60 seconds to 3 minutes.
  • the curing agent may be the same type as the curing agent used in the first mixing step, or may be different, but it is preferable to use the same type of curing agent. This makes it possible to make the physical properties of the obtained window material more uniform while using a simple manufacturing method in terms of manufacturing work.
  • the functional group amount of the curing agent used in the second mixing step is preferably relative to the isocyanate group amount of the polyisocyanate. is 0.20 to 0.50, more preferably 0.25 to 0.40, still more preferably 0.30 to 0.35.
  • the window material curing step is a step of obtaining a window material by curing the window material raw material after stirring the second reaction mixture.
  • This window material curing step is not particularly limited, but for example, the window material is provided by pouring the window material material after rotational movement into the hollowed out portion of the polishing layer and allowing the curing reaction to proceed in the hollowed out portion.
  • the window material curing process may be performed in multiple stages of pre-curing and post-curing.
  • the curing temperature in precuring is preferably 70 to 170°C, more preferably 90 to 150°C, still more preferably 110 to 130°C.
  • the curing time in precuring is preferably 5 to 180 minutes, more preferably 10 to 120 minutes, still more preferably 15 to 60 minutes.
  • the curing temperature in post curing is preferably 70 to 170°C, more preferably 90 to 150°C, still more preferably 110 to 130°C.
  • the curing time in post-curing is preferably 1 to 18 hours, more preferably 2 to 12 hours, still more preferably 4 to 8 hours.
  • polishing pad of the present embodiment has a polishing layer and an endpoint detection window provided in the opening of the polishing layer.
  • FIG. 8 shows a schematic perspective view of the polishing pad of this embodiment. As shown in FIG. 8, the polishing pad 1 of this embodiment has a polishing layer 50 and an end point detection window 51, and optionally a cushion layer 52 on the side opposite to the polishing surface 50a. You may have
  • FIG. 9 shows a cross-sectional view around the end point detection window 51 in FIG.
  • an adhesive layer 53 may be provided between the polishing layer 50 and the cushion layer 52, and an adhesive layer 53 may be provided on the surface of the cushion layer 52 for attachment to the table of the polishing apparatus.
  • a layer 54 may be provided.
  • the polishing surface 50a of the polishing pad of the present embodiment may be flat or uneven with grooves 55 formed therein, as shown in FIG.
  • the grooves 55 may be formed with a plurality of grooves having various shapes such as concentric circles, grids, and radial grooves singly or in combination.
  • the endpoint detection window may be produced by the manufacturing method disclosed herein.
  • the endpoint detection window is a transparent member provided in the opening of the polishing layer, and serves as a transmission path for light from the film thickness detection sensor in optical endpoint detection.
  • the endpoint detection window is circular, but the endpoint detection window may be circular, square, rectangular, polygonal, elliptical, or any other shape, if desired.
  • the endpoint detection window of the present embodiment preferably has polyisocyanate, high-molecular-weight polyol, and low-molecular-weight polyol having 3 or more hydroxyl groups as structural units.
  • the standard deviation of the D hardness (D W20 to D W80 ) at 20° C. to 80° C. at the center and both ends (upper end and lower end) of the endpoint detection window is preferably 1.5 or less, more preferably. is 0.2 to 1.4, more preferably 0.3 to 1.2, still more preferably 0.4 to 1.0.
  • the polishing layer of the present embodiment is not particularly limited, but for example, a polyurethane sheet can be used.
  • This polyurethane sheet has an opening in which the endpoint detection window is embedded.
  • the position of the opening is not particularly limited, it is preferably provided at a position in the radial direction corresponding to the film thickness detection sensor installed on the table of the polishing apparatus.
  • the number of openings is not particularly limited, a plurality of openings are provided at similar radial positions so that the windows pass over the film thickness detection sensor multiple times when the polishing pad attached to the table rotates once. is preferred.
  • the form of the polyurethane sheet is not particularly limited, but examples thereof include a foamed resin article, a non-foamed resin article, and a resin-impregnated base material in which a fiber base material is impregnated with polyurethane.
  • the resin foam molding refers to a foam that does not have a fiber base material and is composed of a predetermined resin.
  • the foam shape is not particularly limited, but examples thereof include spherical cells, substantially spherical cells, tear-shaped cells, and open cells in which each cell is partially connected.
  • non-foamed resin molded body refers to a non-foamed body that does not have a fiber base material and is composed of a predetermined resin.
  • a non-foamed body refers to a body that does not have air bubbles as described above.
  • non-foamed molded articles of resin include those obtained by applying a curable composition to a base material such as a film and then curing the same. More specifically, the resin cured product formed by a labia coater method, a small diameter gravure coater method, a reverse roll coater method, a transfer roll coater method, a kiss coater method, a die coater method, a screen printing method, a spray coating method, etc. Included in non-foamed molded products.
  • a resin-impregnated base material refers to a material obtained by impregnating a fiber base material with a resin.
  • the fiber base material is not particularly limited, and examples thereof include woven fabrics, nonwoven fabrics, and knitted fabrics.
  • the method for producing a polished object according to the present embodiment includes a polishing step of polishing an object to be polished using the above-described polishing pad in the presence of a polishing slurry to obtain a polished object; and an endpoint detection step of performing endpoint detection by an optical endpoint detection method.
  • polishing process may be primary lapping polishing (rough lapping), secondary lapping (finish lapping), primary polishing (rough polishing), or secondary polishing (finish polishing). ), or may also serve as polishing.
  • lapping refers to polishing at a relatively high rate using coarse abrasive grains
  • polishing refers to increasing the surface quality at a relatively low rate using fine abrasive grains.
  • the polishing pad of the present embodiment is preferably used for chemical mechanical polishing (CMP).
  • CMP chemical mechanical polishing
  • the method for producing a polished object of this embodiment will be described below using chemical mechanical polishing as an example, but the method for producing a polished object of this embodiment is not limited to the following.
  • the object to be polished is not particularly limited, but for example, materials such as semiconductor devices and electronic components, particularly Si substrates (silicon wafers), SiC (silicon carbide) substrates, GaAs (gallium arsenide) substrates, glass, hard disks and LCDs. Thin substrates (objects to be polished) such as substrates for (liquid crystal displays) can be mentioned. In particular, semiconductor devices having metal wiring such as W (tungsten) and Cu (copper) are mentioned.
  • a conventionally known method can be used as the polishing method, and is not particularly limited. For example, first, an object to be polished held on a holding surface plate arranged to face the polishing pad is pressed against the polishing surface, and the polishing pad and/or the holding surface plate are rotated while slurry is supplied from the outside. Let The polishing pad and the holding platen may rotate in the same direction or in opposite directions at different rotational speeds. Further, the object to be polished may be polished while moving (rotating) inside the frame during the polishing process.
  • the slurry may contain water, chemical components such as oxidizing agents represented by hydrogen peroxide, additives, abrasive grains (abrasive particles; for example, SiC, SiO 2 , Al 2 O 3 , CeO 2 ) and the like.
  • oxidizing agents represented by hydrogen peroxide
  • additives such as oxidizing agents represented by hydrogen peroxide, additives, abrasive grains (abrasive particles; for example, SiC, SiO 2 , Al 2 O 3 , CeO 2 ) and the like.
  • the method for manufacturing a polished workpiece according to the present embodiment has an end point detection step of detecting the end point by an optical end point detection method in the polishing step.
  • a conventionally known method can be used as the end point detection method by the optical end point detection method.
  • FIG. 13 shows a schematic diagram of the endpoint detection method of the optical endpoint detection method.
  • This schematic diagram shows a chemical mechanical polishing process in which a wafer W held by a top ring 90 is pressed onto a polishing pad 1 affixed on a table 91 while slurry 92 is flowing therethrough, and the uneven film on the surface of the wafer W is scraped and flattened.
  • the polishing apparatus 94 has a film thickness detection sensor 93 mounted on the table 91 for monitoring the film thickness in order to detect a predetermined film thickness at the end point and finish the process with high accuracy at the same time as the planarization.
  • the film thickness detection sensor 93 can detect the polishing end point by, for example, irradiating the polishing surface of the wafer W with light and measuring and analyzing the spectral intensity characteristics of the reflected light.
  • the film thickness detection sensor 93 causes light to enter the surface of the wafer W through the end point detection window 51, and the light reflected by the film on the wafer W (wafer surface) and the film on the wafer W are detected.
  • a film thickness change can be detected by detecting the strength of the reflection intensity caused by the phase difference with respect to the light reflected at the interface between the wafer and the substrate.
  • Aspect A is, inter alia, an aspect aimed at providing a manufacturing method capable of more easily manufacturing a polishing pad having an endpoint detection window. Its configuration is as follows.
  • a method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window comprising: a curing step of fixing the end-point detection window member in the mold and curing the curable resin in a state of contact with the end-point detection window member to form a resin sheet in which the end-point detection window member is incorporated; a slicing step of slicing the resin sheet to form a polishing layer; In the curing step, the end point detection window member is suspended and fixed by a position fixing jig installed above the mold.
  • the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
  • a curable resin is filled and cured.
  • the endpoint detection window member has a columnar portion that serves as an endpoint detection window, and a pedestal portion for fixing the endpoint detection window member to the position fixing jig.
  • the position fixing jig has a first fitting part that fits with the upper part of the mold, [1] A method for producing a polishing pad according to any one of [4]. [6] The mold has a second fitting portion that fits with the position fixing jig, [1] A method for producing a polishing pad according to any one of [5]. [7] The position fixing jig has a positioning portion that positions and fixes the end point detection window member, [1] A method for producing a polishing pad according to any one of [6]. [8] a groove forming step of performing groove processing on the polishing surface of the polishing layer; Grooving is not performed on the exposed portion of the end point detection window member before the groove forming step.
  • [1] A method for producing a polishing pad according to any one of [7]. [9] A lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface, [1] A method for producing a polishing pad according to any one of [8].
  • Aspect B aims to provide a method of manufacturing a polishing pad that can easily adjust the position of the end-point detection window member while suppressing the positional deviation of the end-point detection window member. It is a mode. Its configuration is as follows.
  • a method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window comprising: a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; , a slicing step of slicing the resin sheet to form a polishing layer; In the curing step, the end point detection window member is held by a holding portion of a position fixing jig installed on the upper portion of the mold, thereby being suspended and fixed.
  • a method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window, comprising: a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; , a slicing step of slicing the resin sheet to form
  • the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
  • a curable resin is filled and cured.
  • the position fixing jig has a through hole through which the end point detection window member is inserted, The holding portion holds the end point detection window member inserted through the through hole.
  • the holding portion detachably holds the end point detection window member, [1] A method for producing a polishing pad according to any one of [4].
  • the position fixing jig has a first fitting part that fits with the upper part of the mold, [1] A method for producing a polishing pad according to any one of [5].
  • the mold has a second fitting portion that fits with the position fixing jig, [1] A method for producing a polishing pad according to any one of [6].
  • [1] A method for producing a polishing pad according to any one of [7]. [9] A lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface, [1] A method for producing a polishing pad according to any one of [8].
  • Aspect C aims to provide a method for manufacturing a polishing pad in which air bubbles are less likely to occur when the curable resin is cured while in contact with the end-point detection window member suspended from the mold and fixed. It is a mode. Its configuration is as follows.
  • a method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window comprising: a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; , a slicing step of slicing the resin sheet to form a polishing layer;
  • the end point detection window member is suspended and fixed by a position fixing jig installed on the upper part of the mold, A lower end of the endpoint detection window member when suspended and fixed has a convex shape, A method for manufacturing a polishing pad.
  • the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
  • a curable resin is filled and cured.
  • [4] further comprising a window member forming step of forming the endpoint detection window member having at least one end with the convex shape; [1] A method for producing a polishing pad according to any one of [3].
  • the length L of the portion having the convex shape of the endpoint detection window member is 3.0 to 20 mm. [1] A method for producing a polishing pad according to any one of [4]. [6] The ratio (L/S) of the length L of the convex portion of the endpoint detection window member to the horizontal cross-sectional area S of the endpoint detection window member is 0.002 to 0.4. be, [1] A method for producing a polishing pad according to any one of [5]. [7] The length L of the portion having the convex shape of the end point detection window member is 0.03 to 0.30 Lw with respect to the total length Lw of the end point detection window member. [1] A method for producing a polishing pad according to any one of [6].
  • the position fixing jig has a first fitting part that fits with the upper part of the mold, [1] A method for producing a polishing pad according to any one of [7]. [9] The mold has a second fitting portion that fits with the position fixing jig, [1] A method for producing a polishing pad according to any one of [8]. [10] The position fixing jig has a positioning portion that positions and fixes the end point detection window member, [1] A method for producing a polishing pad according to any one of [9]. [11] a groove forming step of performing groove processing on the polishing surface of the polishing layer; Grooving is not performed on the exposed portion of the end point detection window member before the groove forming step.
  • Aspect D is an aspect aimed at providing a method of manufacturing a polishing pad that can efficiently remove air bubbles in a shorter time. Its configuration is as follows.
  • a method for manufacturing a polishing pad having an endpoint detection window comprising: a rotational motion step of revolving on a predetermined circumference at 200 to 1600 rpm while rotating the container containing the prepared window material raw material at 100 to 800 rpm; a window material curing step for obtaining an endpoint detection window member by curing the window material raw material after the rotational movement; A method for manufacturing a polishing pad. [2] performing the rotational movement step under reduced pressure; [1] The method for producing a polishing pad according to [1]. [3] The processing time of the rotational motion step is 1 to 10 minutes, A method for producing a polishing pad according to [1] or [2].
  • the temperature of the rotational motion step is 50 to 130°C, [1] A method for producing a polishing pad according to any one of [3]. [5] The inclination of the axis of rotation and the axis of revolution in the rotational motion step is 20 to 70°. [1] A method for producing a polishing pad according to any one of [4]. [6] The window material raw material contains a polyisocyanate, a polyol, and a curing agent, [1] A method for producing a polishing pad according to any one of [5].
  • [7] a groove forming step of performing groove processing on the polishing surface of the polishing layer provided with the end point detection window member; [1] A method for producing a polishing pad according to any one of [6].
  • [8] a lamination step of laminating a base material layer and/or a cushion layer on the surface opposite to the polishing surface of the polishing layer provided with the end point detection window member; [1] A method for producing a polishing pad according to any one of [7].
  • Aspect E is, inter alia, an aspect aimed at providing a manufacturing method that can more easily obtain an endpoint detection window material having uniform physical properties. Its configuration is as follows.
  • a method for manufacturing an endpoint detection window material in a polishing pad with an endpoint detection window comprising: a first mixing step of mixing the polyisocyanate, the polyol and a portion of the curing agent to form a first reaction mixture; a second mixing step of mixing the first reaction mixture with the remainder of the curing agent to form a second reaction mixture; a window material curing step of curing the second reaction mixture to obtain the endpoint detection window material; the curing agent has 3 or more functional groups; A method for manufacturing an endpoint detection window material.
  • the curing agent comprises a low molecular weight polyol having a molecular weight of less than 300; [1] or [2] manufacturing method of the endpoint detection window material.
  • the polyol contains a high molecular weight polyol having a molecular weight of 300 or more, [1] A method for manufacturing an endpoint detection window material according to any one of [3].
  • the polyisocyanate comprises an alicyclic polyisocyanate and/or an aliphatic polyisocyanate, [1] to [4] A method for manufacturing an endpoint detection window material according to any one of items.
  • Endpoint detection window material [7] The endpoint detection window material according to [6]; a polishing layer comprising the endpoint detection window material; polishing pad.
  • Mode F is, inter alia, an aspect aimed at providing a manufacturing method capable of more easily manufacturing a polishing pad having an endpoint detection window. Its configuration is as follows.
  • the positional information is based on image information obtained by an imaging device, or information obtained by receiving a laser beam that has passed through an end point detection window among the laser beams applied to the resin sheet by a laser receiver. be, [1] The method for producing a polishing pad according to [1].
  • [3] forming the hole smaller than the endpoint detection window in the first hole forming step; A method for producing a polishing pad according to [1] or [2].
  • the position information includes information about the center position of the endpoint detection window; In the first hole forming step, the hole is formed so that the center position of the endpoint detection window and the center position of the hole match.
  • the resin sheet has a plurality of endpoint detection windows, [1] A method for producing a polishing pad according to any one of [4].
  • the pressure-sensitive adhesive sheet is a double-sided tape or a laminate of a double-sided tape and another layer, [1] A method for producing a polishing pad according to any one of [5].
  • the endpoint detection window material will be described in more detail below.
  • the present invention is by no means limited by the following examples.
  • Example 1 Poly(oxytetramethylene) glycol (PTMG) with a number average molecular weight of 1000, glycerin, and 4,4′-methylene-bis(cyclohexyl isocyanate) (hydrogenated MDI) window material raw materials were preheated at 80° C., and the number average 120.9 parts by mass of poly(oxytetramethylene) glycol (PTMG) having a molecular weight of 1000, 7.4 parts by mass of glycerin, 4,4′-methylene-bis(cyclohexyl isocyanate) (hydrogenated MDI) 100 parts by mass, A first reaction mixture was obtained by mixing by performing vacuum stirring and defoaming under room temperature conditions for 15 minutes.
  • the resulting second reaction mixture was poured into a mold and heated (precured) at 120°C for 30 minutes, after which the cured reaction mixture was removed from the mold and post-cured at 120°C for 6 hours. It was cured to produce a transparent endpoint detection window material.
  • Example 2 An endpoint detection window material was prepared in the same manner as in Example 1, except that the second mixing step was omitted and the entire amount of glycerin as a curing agent was mixed in the first mixing step (one-shot method).
  • D hardness measurement was performed at each temperature in order to confirm variations in hardness change with temperature rise.
  • the D hardness was measured according to JIS K6253. In the measurement, a metal plate was placed under the end point detection window material, and a D hardness tester manufactured by Teclock was used under the same conditions as the actual polishing process (polishing pad attached to the metal surface plate of the polishing apparatus). It was measured.
  • the sample was prepared by stacking four polyurethane sheets (thickness: about 0.125 cm (1.25 mm)) so that the total thickness would be at least 0.45 cm (4.5 mm).
  • Example 1 the variation in physical properties was evaluated by performing D hardness measurement at each temperature. If the D hardness varies at each temperature, the surface shape of the endpoint detection window material will not be stable during slicing. The end point cannot be detected accurately. Also, if the surface of the window is convex, it may hit the object to be polished and cause scratches or the like. Based on the above, the standard deviation of heat resistance between samples (1) and (2) of Example 1 and between samples (1) and (2) of Example 2 was evaluated as variation in physical properties, and the results are shown in Table 1 and It is shown in FIG.
  • the standard deviation of D hardness between samples (1) and (2) of Example 1 is 1.0 or less at 20 ° C. to 80 ° C.
  • samples (1) to ( 2) The standard deviations of D hardness between 20° C., 40° C., and 80° C. are 3.0, 4.0, and 2.0, respectively. It was found that variations in heat resistance can be controlled while using a manufacturing method that is simple in terms of work.
  • Example 1 the D hardness was measured at each temperature at the top, center, and bottom of a cylindrical window member (length 60 mm) to evaluate the variation in D hardness at each temperature. did. Table 2 shows the results.
  • the manufacturing method of the present embodiment can be used to control variations in heat resistance while using a simple manufacturing method in terms of manufacturing work. It turns out that it can be done.
  • the method for manufacturing a polishing pad of the present invention has industrial applicability as an efficient method for manufacturing a polishing pad suitable for an optical endpoint detection method.

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Abstract

Provided is a method for manufacturing a polishing pad that comprises a polishing layer having an endpoint detection window, the method including: a curing step for fixing an endpoint detection window member inside of a die, and curing a curable resin that is in contact with the endpoint detection window member so as to form a resin sheet in which the endpoint detection window member is incorporated; and a slicing step for slicing the resin sheet so as to form the polishing layer. In the curing step, the endpoint detection window member is fixed so as to be suspended from a position fixation jig which is installed on top of the die.

Description

研磨パッドの製造方法Polishing pad manufacturing method
 本発明は、研磨パッドの製造方法に関する。 The present invention relates to a method for manufacturing a polishing pad.
 半導体製造工程においては、絶縁膜成膜後の平坦化や金属配線の形成過程で化学機械研磨(CMP)が使用される。化学機械研磨に要求される重要な技術の一つとして、研磨プロセスが完了したかどうかを検出する研磨終点検出がある。例えば、目標とする研磨終点に対する過研磨や研磨不足は製品不良に直結する。そのため、化学機械研磨では、研磨終点検出により研磨量を厳しく管理する必要がある。 In the semiconductor manufacturing process, chemical mechanical polishing (CMP) is used in the process of flattening after insulating film deposition and forming metal wiring. One of the important techniques required for chemical mechanical polishing is polishing endpoint detection for detecting whether the polishing process has been completed. For example, over-polishing or under-polishing to the target polishing end point directly leads to product defects. Therefore, in chemical mechanical polishing, it is necessary to strictly control the polishing amount by detecting the polishing end point.
 化学機械研磨は複雑なプロセスであり、研磨装置の運転状態や消耗品(スラリー、研磨パッド、ドレッサー等)の品質や研磨過程における経時的な状態のばらつきの影響によって、研磨速度(研磨レート)が変化する。さらに、近年半導体製造工程で求められる残膜厚の精度、面内均一性はますます厳しくなっている。このような事情から、十分な精度の研磨終点検出はより困難となってきている。 Chemical mechanical polishing is a complicated process, and the polishing speed (polishing rate) varies depending on the operating conditions of the polishing equipment, the quality of consumables (slurry, polishing pads, dressers, etc.), and variations in conditions over time during the polishing process. Change. Furthermore, in recent years, the precision and in-plane uniformity of the residual film thickness required in the semiconductor manufacturing process have become more and more severe. Under these circumstances, it is becoming more difficult to detect the polishing end point with sufficient accuracy.
 研磨終点検出の主な方法としては、光学式終点検出方式、トルク終点検出方式、渦電流終点検出方式などが知られており、光学式終点検出方式では、研磨パッド上に設けた透明な窓部材を通してウエハに光を照射し、反射光をモニタすることで終点検出を行う。 Known major polishing end point detection methods include the optical end point detection method, the torque end point detection method, and the eddy current end point detection method. The end point is detected by irradiating the wafer with light through and monitoring the reflected light.
 このような光学式終点検出方式を用いる研磨パッドの製造方法としては、例えば、特許文献1~3が知られている。また、透明な終点検出窓の製造方法としては、例えば、特許文献4が知られている。さらに、光学式終点検出方式を用いる研磨パッドとしては、例えば、特許文献5が知られている。 Patent Documents 1 to 3, for example, are known as methods of manufacturing a polishing pad using such an optical end point detection system. Further, as a method for manufacturing a transparent endpoint detection window, for example, Patent Document 4 is known. Further, as a polishing pad using an optical endpoint detection system, for example, Patent Document 5 is known.
特開2013-197597号公報JP 2013-197597 A 特開2013-219276号公報Japanese Patent Application Laid-Open No. 2013-219276 特開2001-291686号公報Japanese Patent Application Laid-Open No. 2001-291686 特開2004-260156号公報Japanese Patent Application Laid-Open No. 2004-260156 特開2002-001647号公報JP-A-2002-001647
 しかしながら、特許文献1に記載の方法では、硬化の際の熱によってライナーが変形すると、金型に窓用ブロックを垂直に固定できないという問題が生じる。また、ライナーには窓用ブロックが直接固定されているため、再使用することが難しく、製造コストに問題がある。また、特許文献2に記載の方法では、研磨層や終点検出窓を傷つける恐れがあり、研磨パッドの強度低下や終点検出に要する光学特性の低下を招くことが懸念される。さらに、特許文献3に記載の方法では、位置合わせノッチが研磨層端部に存在することとなり、位置合わせノッチの大きさを制限したとしても研磨性能に悪影響を及ぼす恐れがある。また、特許文献4に記載の方法では、得られる窓部材はバフィングなどにより表面を平滑しないと膜厚評価性能に劣るものである。 However, in the method described in Patent Document 1, if the liner is deformed by heat during curing, a problem arises in that the window block cannot be vertically fixed to the mold. In addition, since the window block is directly fixed to the liner, it is difficult to reuse and the manufacturing cost is a problem. In addition, the method described in Patent Document 2 may damage the polishing layer and the endpoint detection window, which may lead to a reduction in the strength of the polishing pad and a reduction in optical properties required for endpoint detection. Furthermore, in the method described in Patent Document 3, the alignment notch exists at the edge of the polishing layer, and even if the size of the alignment notch is limited, there is a possibility that the polishing performance may be adversely affected. Further, in the method described in Patent Document 4, the obtained window member is inferior in film thickness evaluation performance unless the surface is smoothed by buffing or the like.
 本発明の一実施形態は、終点検出窓を有する研磨パッドをより簡易に製造することのできる製造方法を提供することを目的とする。 An object of one embodiment of the present invention is to provide a manufacturing method that can more easily manufacture a polishing pad having an endpoint detection window.
 本発明の一実施形態は、以下のとおりである。
〔1〕
 終点検出窓付き研磨層を備える研磨パッドの製造方法であって、
 金型内に終点検出窓用部材を固定し、該終点検出窓用部材と接触した状態で硬化性樹脂を硬化して、前記終点検出窓用部材が組み込まれた樹脂シートを形成する硬化工程と、
 前記樹脂シートをスライスして研磨層を形成するスライス工程と、を有し、
 前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した位置固定治具により吊り下げられて固定される、
 研磨パッドの製造方法。
〔2〕
 前記硬化工程において、前記金型内に硬化性樹脂を充填してから、前記終点検出窓用部材を前記硬化性樹脂に接触させて、前記硬化性樹脂を硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔3〕
 前記硬化工程において、前記金型内に前記終点検出窓用部材を固定してから、硬化性樹脂を充填して硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔4〕
 前記位置固定治具が、前記金型上部と嵌合する第1嵌合部を有する、及び/又は、
 前記金型が、前記位置固定治具と嵌合する第2嵌合部を有する、
 〔1〕~〔3〕のいずれか一項に記載の研磨パッドの製造方法。
〔5〕
 前記位置固定治具が、前記終点検出窓用部材を位置決めして固定する位置決め部を有する、
 〔1〕~〔4〕のいずれか一項に記載の研磨パッドの製造方法。
〔6〕
 前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した前記位置固定治具の挟持部により挟持されることで、吊り下げられて固定され、
 前記挟持部は、前記終点検出窓用部材を着脱可能に挟持する、
 〔1〕~〔5〕のいずれか一項に記載の研磨パッドの製造方法。
〔7〕
 前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した前記位置固定治具の挟持部により挟持されることで、吊り下げられて固定され、
 吊り下げられて固定された際の前記終点検出窓用部材の下端が、凸面形状を有する、
 〔1〕~〔6〕のいずれか一項に記載の研磨パッドの製造方法。
〔8〕
 前記終点検出窓用部材の前記凸面形状を有する部分の長さLが、3.0~20mmである、
 〔7〕に記載の研磨パッドの製造方法。
〔9〕
 前記終点検出窓用部材の前記凸面形状を有する部分の長さLと、前記終点検出窓用部材の水平方向の断面積Sとの比(L/S)が、0.002~0.4である、
 〔7〕又は〔8〕に記載の研磨パッドの製造方法。
〔10〕
 前記終点検出窓用部材の前記凸面形状を有する部分の長さLが、前記終点検出窓用部材の全長Lwに対して、0.03~0.30Lwである、
 〔7〕~〔9〕のいずれか一項に記載の研磨パッドの製造方法。
〔11〕
 前記終点検出窓用部材の製造工程をさらに含み、
 該製造工程が、
 窓材原料であるポリイソシアネートとポリオールと硬化剤の一部とを混合し、第1の反応混合物を調製する第1混合工程と、前記第1の反応混合物と前記硬化剤の残部とを混合し、第2の反応混合物を調製する第2混合工程と、前記第2の反応混合物を硬化して、前記終点検出窓用部材を得る窓材硬化工程と、を含み、
 前記窓材原料に含まれる前記硬化剤が3以上の官能基を有する、
 〔1〕~〔10〕のいずれか一項に記載の研磨パッドの製造方法。
〔12〕
 前記窓材原料に含まれる前記硬化剤が、分子量300未満の低分子量ポリオールを含む、
 〔11〕に記載の研磨パッドの製造方法。
〔13〕
 前記窓材原料に含まれる前記ポリオールが、分子量300以上の高分子量ポリオールを含む、
 〔11〕又は〔12〕に記載の研磨パッドの製造方法。
〔14〕
 前記窓材原料に含まれる前記ポリイソシアネートが、脂環族ポリイソシアネート及び/又は脂肪族ポリイソシアネートを含む、
 〔11〕~〔13〕のいずれか一項に記載の研磨パッドの製造方法。
〔15〕
 前記樹脂シートの開口に設けられた終点検出窓の位置情報を取得する第1取得工程と、
 前記位置情報に基づいて、粘着シート上の前記終点検出窓の設置位置に相当する部分に、孔を形成する第1孔形成工程と、
 前記終点検出窓と前記孔とを位置合わせして、前記樹脂シートと前記粘着シートの粘着面とを貼り合わせる第1貼合工程と、を有する、
 〔1〕~14のいずれか一項に記載の研磨パッドの製造方法。
〔16〕
 前記位置情報が、撮像装置により得られた画像情報、又は、前記樹脂シートに当てたレーザー光のうち終点検出窓を透過したレーザー光をレーザー受光機により受信して得られた情報に基づくものである、
 〔15〕に記載の研磨パッドの製造方法。
〔17〕
 前記第1孔形成工程において、前記終点検出窓よりも小さい前記孔を形成する、
 〔15〕又は〔16〕に記載の研磨パッドの製造方法。
〔18〕
 前記位置情報が、前記終点検出窓の中心位置に関する情報を含み、
 前記第1孔形成工程において、前記終点検出窓の中心位置と前記孔の中心位置が一致するように前記孔を形成する、
 〔15〕~〔17〕のいずれか一項に記載の研磨パッドの製造方法。
〔19〕
 前記粘着シートが、両面テープ、又は、両面テープと他の層との積層体である、
 〔15〕~〔18〕のいずれか一項に記載の研磨パッドの製造方法。
〔20〕
 前記粘着シートが前記両面テープである場合に、
 前記樹脂シート上の前記両面テープに形成された孔の位置情報を取得する第2取得工程と、
 前記位置情報に基づいて、他の層上の前記終点検出窓の設置位置に相当する部分に、孔を形成する第2孔形成工程と、
 前記両面テープにおける前記孔と前記他の層における前記孔とを位置合わせして、前記樹脂シート上の前記両面テープと前記他の層とを貼り合わせる第2貼合工程と、を有する、
 〔19〕に記載の研磨パッドの製造方法。
One embodiment of the invention is as follows.
[1]
A method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window, comprising:
a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; ,
a slicing step of slicing the resin sheet to form a polishing layer;
In the curing step, the end point detection window member is suspended and fixed by a position fixing jig installed above the mold.
A method for manufacturing a polishing pad.
[2]
In the curing step, the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
[1] The method for producing a polishing pad according to [1].
[3]
In the curing step, after fixing the end point detection window member in the mold, a curable resin is filled and cured.
[1] The method for producing a polishing pad according to [1].
[4]
The position fixing jig has a first fitting part that fits with the mold upper part, and/or
The mold has a second fitting portion that fits with the position fixing jig,
[1] A method for producing a polishing pad according to any one of [3].
[5]
The position fixing jig has a positioning portion that positions and fixes the end point detection window member,
[1] A method for producing a polishing pad according to any one of [4].
[6]
In the curing step, the end point detection window member is suspended and fixed by being clamped by the clamping part of the position fixing jig installed on the upper part of the mold,
The holding portion detachably holds the end point detection window member,
[1] A method for producing a polishing pad according to any one of [5].
[7]
In the curing step, the end point detection window member is suspended and fixed by being clamped by the clamping part of the position fixing jig installed on the upper part of the mold,
A lower end of the endpoint detection window member when suspended and fixed has a convex shape,
[1] A method for producing a polishing pad according to any one of [6].
[8]
The length L of the portion having the convex shape of the endpoint detection window member is 3.0 to 20 mm.
[7] The method for producing a polishing pad according to [7].
[9]
The ratio (L/S) of the length L of the convex portion of the endpoint detection window member to the horizontal cross-sectional area S of the endpoint detection window member is 0.002 to 0.4. be,
[7] or [8] The method for producing a polishing pad.
[10]
The length L of the portion having the convex shape of the end point detection window member is 0.03 to 0.30 Lw with respect to the total length Lw of the end point detection window member.
[7] A method for producing a polishing pad according to any one of [9].
[11]
further comprising a step of manufacturing the endpoint detection window member,
The manufacturing process is
A first mixing step of mixing polyisocyanate, polyol, and part of a curing agent, which are raw materials for window materials, to prepare a first reaction mixture, and mixing the first reaction mixture with the remainder of the curing agent. , a second mixing step of preparing a second reaction mixture, and a window material curing step of curing the second reaction mixture to obtain the endpoint detection window member,
The curing agent contained in the window material raw material has 3 or more functional groups.
[1] The method for producing a polishing pad according to any one of [10].
[12]
The curing agent contained in the window material raw material contains a low-molecular-weight polyol having a molecular weight of less than 300.
[11] The method for producing a polishing pad according to [11].
[13]
The polyol contained in the window material raw material contains a high-molecular-weight polyol having a molecular weight of 300 or more.
[11] or [12] The method for producing a polishing pad.
[14]
The polyisocyanate contained in the window material raw material contains an alicyclic polyisocyanate and/or an aliphatic polyisocyanate.
[11] A method for producing a polishing pad according to any one of [13].
[15]
a first acquisition step of acquiring position information of an endpoint detection window provided in the opening of the resin sheet;
a first hole forming step of forming a hole in a portion corresponding to the installation position of the end point detection window on the adhesive sheet based on the position information;
a first bonding step in which the end point detection window and the hole are aligned and the resin sheet and the adhesive surface of the adhesive sheet are bonded together;
[1] A method for producing a polishing pad according to any one of [1] to [14].
[16]
The positional information is based on image information obtained by an imaging device, or information obtained by receiving a laser beam that has passed through an end point detection window among the laser beams applied to the resin sheet by a laser receiver. be,
[15] The method for producing a polishing pad according to [15].
[17]
forming the hole smaller than the endpoint detection window in the first hole forming step;
[15] or [16] The method for producing a polishing pad.
[18]
the position information includes information about the center position of the endpoint detection window;
In the first hole forming step, the hole is formed so that the center position of the endpoint detection window and the center position of the hole match.
[15] The method for producing a polishing pad according to any one of [17].
[19]
The pressure-sensitive adhesive sheet is a double-sided tape or a laminate of a double-sided tape and another layer,
[15] The method for producing a polishing pad according to any one of [18].
[20]
When the adhesive sheet is the double-sided tape,
a second acquisition step of acquiring position information of holes formed in the double-sided tape on the resin sheet;
a second hole forming step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on another layer based on the position information;
a second bonding step of aligning the holes in the double-sided tape with the holes in the other layer and bonding the double-sided tape on the resin sheet and the other layer;
[19] The method for producing a polishing pad according to [19].
 本発明によれば、終点検出窓を有する研磨パッドをより簡易に製造することのできる製造方法を提供することができる。 According to the present invention, it is possible to provide a manufacturing method that can more easily manufacture a polishing pad having an end point detection window.
本実施形態の終点検出窓用部材の一態様を示す斜視図である。It is a perspective view which shows one aspect|mode of the member for endpoint detection windows of this embodiment. 本実施形態の終点検出窓用部材の別態様を示す斜視図である。It is a perspective view which shows another aspect of the member for endpoint detection windows of this embodiment. 本実施形態の終点検出窓用部材の別態様を示す斜視図である。It is a perspective view which shows another aspect of the member for endpoint detection windows of this embodiment. 本実施形態の終点検出窓用部材が挟持部に挟持された一態様を示す斜視図である。FIG. 4 is a perspective view showing one mode in which the end point detection window member of the present embodiment is sandwiched between sandwiching portions. 本実施形態の終点検出窓用部材が挟持部に挟持された別態様を示す斜視図である。FIG. 11 is a perspective view showing another aspect in which the end point detection window member of the present embodiment is sandwiched between sandwiching portions. 本実施形態において用いる樹脂シートを作製するための金型と位置固定治具が組み合わされた一態様を示す上面図である。FIG. 3 is a top view showing one mode in which a mold and a position fixing jig are combined for producing a resin sheet used in the present embodiment. 本実施形態において用いる樹脂シートを作製するための金型と位置固定治具が組み合わされた別態様を示す上面図である。FIG. 4 is a top view showing another mode in which a mold and a position fixing jig are combined for producing a resin sheet used in the present embodiment. 本実施形態において用いる樹脂シートを作製するための金型と位置固定治具が組み合わされた別態様を示す上面図である。FIG. 4 is a top view showing another mode in which a mold and a position fixing jig are combined for producing a resin sheet used in the present embodiment. 図3Aに記載の金型の硬化性樹脂を注入する前のA-A’断面の一態様を示す断面図である。FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3A before injecting the curable resin. 図3Bに記載の金型の硬化性樹脂を注入する前のA-A’断面の一態様を示す断面図である。FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3B before the curable resin is injected. 図3Aに記載の金型の硬化性樹脂を注入した後のA-A’断面の一態様を示す断面図である。FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3A after the curable resin is injected. 図3Bに記載の金型の硬化性樹脂を注入した後のA-A’断面の一態様を示す断面図である。FIG. 3B is a cross-sectional view showing one aspect of the A-A′ cross section of the mold shown in FIG. 3B after the curable resin is injected. 硬化工程後により得られた樹脂シートを示す上面図である。FIG. 4 is a top view showing a resin sheet obtained after a curing step; 硬化工程後により得られた樹脂シートの終点検出窓付近の断面図である。FIG. 10 is a cross-sectional view of the resin sheet obtained after the curing process, near the end point detection window; 本実施形態の研磨パッドの概略斜視図である。1 is a schematic perspective view of a polishing pad of this embodiment; FIG. 本実施形態の研磨パッドの終点検出窓部分の概略断面図である。FIG. 3 is a schematic cross-sectional view of the end point detection window portion of the polishing pad of the present embodiment; 本実施形態の研磨パッドの製造方法における、第1取得工程、第1孔形成工程、及び第1貼合工程の一態様を示す概略断面図である。It is a schematic sectional drawing which shows the aspect|mode of the 1st acquisition process, the 1st hole formation process, and the 1st bonding process in the manufacturing method of the polishing pad of this embodiment. 本実施形態の研磨パッドの製造方法における、第2取得工程、第2孔形成工程、及び第2貼合工程の一態様を示す概略断面図である。It is a schematic sectional drawing which shows one aspect|mode of the 2nd acquisition process, the 2nd hole formation process, and the 2nd bonding process in the manufacturing method of the polishing pad of this embodiment. 本実施形態の樹脂シートの一態様を示す上面図である。It is a top view which shows one aspect|mode of the resin sheet of this embodiment. CMPに搭載する膜厚制御システムを示す概略図である。1 is a schematic diagram showing a film thickness control system installed in CMP; FIG. 各温度におけるD硬度のばらつきを示すグラフである。It is a graph which shows the dispersion|variation in D hardness in each temperature.
 以下、必要に応じて図面を参照しつつ、本発明の実施の形態(以下、「本実施形態」という。)について詳細に説明するが、本発明はこれに限定されるものではなく、その要旨を逸脱しない範囲で様々な変形が可能である。なお、図面中、同一要素には同一符号を付すこととし、重複する説明は省略する。又上下左右などの位置関係は、特に断らない限り、図面に示す位置関係に基づくものとする。さらに、図面の寸法比率は図示の比率に限られるものではない。 Hereinafter, embodiments of the present invention (hereinafter referred to as "present embodiments") will be described in detail with reference to the drawings as necessary, but the present invention is not limited thereto and the gist thereof. Various modifications are possible without departing from the above. In the drawings, the same elements are denoted by the same reference numerals, and overlapping descriptions are omitted. Moreover, the positional relationship such as up, down, left and right is based on the positional relationship shown in the drawings unless otherwise specified. Furthermore, the dimensional ratios of the drawings are not limited to the illustrated ratios.
1.研磨パッドの製造方法
 本実施形態の研磨パッドの製造方法は、金型内に終点検出窓用部材(以下、単に「窓材」という。)を固定し、該終点検出窓用部材と接触した状態で硬化性樹脂を硬化して、窓材が組み込まれた樹脂シートを形成する硬化工程と、樹脂シートをスライスして研磨層を形成するスライス工程と、を有し、硬化工程において、窓材が、金型上部に設置した位置固定治具により吊り下げられて固定されることで、終点検出窓付き研磨層を備える研磨パッドを製造する方法である。
1. Method for Manufacturing Polishing Pad In the method for manufacturing a polishing pad according to the present embodiment, an end-point detection window member (hereinafter simply referred to as “window member”) is fixed in a mold, and the polishing pad is in contact with the end-point detection window member. and a slicing step of slicing the resin sheet to form a polishing layer. 1, a method of manufacturing a polishing pad having a polishing layer with an end point detection window by being suspended and fixed by a position fixing jig installed on the upper part of the mold.
 このように、窓材を金型上部に設置した位置固定治具により吊り下げて固定することで、窓材と位置固定治具の接触部分を幅広に成形した場合でも、その部分が硬化性樹脂に触れることなく、樹脂シートを成型することができる。そのため、得られた樹脂シートから不要な部分を除く必要がない。また、金型ではなく位置固定治具に窓材を取り付けるため、金型自体は加工する必要がなく、従来のものをそのまま使用することができる。さらに、位置固定治具も何度でも使用可能であるため、ライナーのように使い捨てにする必要はない。 In this way, by suspending and fixing the window material by the position fixing jig installed on the upper part of the mold, even if the contact part between the window material and the position fixing jig is formed to be wide, the part is not hardened resin. The resin sheet can be molded without touching the Therefore, it is not necessary to remove unnecessary portions from the obtained resin sheet. Moreover, since the window material is attached to the position fixing jig instead of the mold, the mold itself does not need to be processed, and the conventional mold can be used as it is. Furthermore, since the position fixing jig can be used repeatedly, unlike the liner, it does not need to be thrown away.
 その上、窓材を金型上部に設置した位置固定治具により吊り下げて固定することで、硬化性樹脂が硬化するまでは、窓材の埋設位置を微調整することができるため、そのような微調整により製品歩留まりを向上することもできる。 In addition, by suspending and fixing the window material with a position fixing jig installed on the upper part of the mold, it is possible to finely adjust the embedding position of the window material until the hardening resin hardens. It is also possible to improve the product yield by fine adjustment.
1.1.窓用部材形成工程
 本実施形態の研磨パッドの製造方法は、硬化工程の前に、少なくとも一端が凸面形状である窓材を形成する窓用部材形成工程をさらに有していてもよい。窓材10の形成方法は、特に限定されないが、例えば、凸面形状に対応する形状を備えた金型(不図示)に樹脂を注入して硬化したり、任意の形状の硬化物を切削することで硬化後に凸面形状を成形したりすることで作製することができる。
1.1. Window Member Forming Step The method for manufacturing the polishing pad of the present embodiment may further include, before the curing step, a window member forming step of forming a window member having a convex shape at least at one end. The method of forming the window member 10 is not particularly limited, but for example, resin may be injected into a mold (not shown) having a shape corresponding to a convex shape and cured, or a cured product having an arbitrary shape may be cut. It can be produced by molding a convex shape after curing with.
 なお、窓用部材形成工程における硬化物(窓材)の重合方法としては、後述の窓材の製造方法を参照することができる。 As for the polymerization method of the cured product (window material) in the step of forming the window member, the method for manufacturing the window material described below can be referred to.
1.1.1.窓材
 まず、硬化工程に先立って窓材を用意する。窓材10は、図1A~図1Cに示すように、直方体状のものと、柱状のものが挙げられる。
1.1.1. Window Material First, a window material is prepared prior to the curing step. As shown in FIGS. 1A to 1C, the window member 10 may be rectangular parallelepiped or columnar.
 図1Aに示すように、直方体状の窓材10は、例えば、柱状部11を有する。ここで、柱状部11は硬化工程後において、樹脂シート(研磨層50)に埋設されて終点検出窓51となる。直方体状の窓材10の柱状部11は、挟持しやすい側面を有するため、より安定して位置固定治具30に固定することができる。 As shown in FIG. 1A, the rectangular parallelepiped window member 10 has, for example, a columnar portion 11. As shown in FIG. Here, after the curing process, the columnar portion 11 is embedded in the resin sheet (polishing layer 50) and becomes the end point detection window 51. As shown in FIG. Since the columnar portion 11 of the rectangular parallelepiped window member 10 has side surfaces that are easy to hold, it can be more stably fixed to the position fixing jig 30 .
 吊り下げ方向の柱状部11の端面は、平面状であっても凸面形状であってもよい。吊り下げ方向の端面が凸面形状を有することにより、窓材10の端面と金型20の底面21との間に硬化性樹脂が流入しやすくなり、硬化性樹脂が気泡を巻き込んだりすることが抑制できる。これにより、スライスしたときに空気の部分がボイド(穴)として顕出することを抑制でき、ボイドによる研磨性能の低下を抑制できる。 The end face of the columnar portion 11 in the hanging direction may be planar or convex. Since the end face in the hanging direction has a convex shape, the curable resin can easily flow between the end face of the window material 10 and the bottom surface 21 of the mold 20, and the entrainment of air bubbles in the curable resin can be suppressed. can. As a result, it is possible to prevent air portions from appearing as voids (holes) when slicing, and to prevent deterioration of polishing performance due to voids.
 図1B及び図1Cに示すように、柱状の窓材10は、例えば、柱状部11と台座部12とを有するものとすることができる。ここで、柱状部11は硬化工程後において、樹脂シート(研磨層50)に埋設されて終点検出窓51となる。柱状部11の断面形状は特に制限されず、円形であっても多角形であってもよい。 As shown in FIGS. 1B and 1C, the columnar window material 10 can have, for example, a columnar portion 11 and a pedestal portion 12 . Here, after the curing process, the columnar portion 11 is embedded in the resin sheet (polishing layer 50) and becomes the end point detection window 51. As shown in FIG. The cross-sectional shape of the columnar portion 11 is not particularly limited, and may be circular or polygonal.
 柱状部11の吊り下げ方向の下端10aは凸面形状を有してもよいし(図1B)、平面形状を有していてもよい(図1C)。 The lower end 10a of the columnar portion 11 in the hanging direction may have a convex shape (Fig. 1B) or may have a planar shape (Fig. 1C).
 また、台座部12は、窓材10を位置固定治具30に固定する方法によって、使用態様が異なってもよい。 Also, the pedestal portion 12 may be used differently depending on the method of fixing the window member 10 to the position fixing jig 30 .
 例えば、接着剤などを介して、窓材10を位置固定治具30に固定する場合には、台座部12は接着剤などを介して位置固定治具30に固定されるための部分となってもよい。このように、柱状部11と台座部12とを有する形状とすることで、柱状部11は終点検出窓として必要な範囲で比較的小さくしつつ、台座部12により位置固定治具30との密着性を確保することができる。 For example, when the window member 10 is fixed to the position fixing jig 30 with an adhesive or the like, the pedestal portion 12 is a portion to be fixed to the position fixing jig 30 with an adhesive or the like. good too. Thus, by forming the columnar portion 11 and the pedestal portion 12 into a shape having the columnar portion 11 and the base portion 12 , the columnar portion 11 can be made relatively small within a range necessary for the end point detection window, and the pedestal portion 12 can be brought into close contact with the position fixing jig 30 . can ensure the integrity of the
 位置固定治具30の挟持部31により窓材10を位置固定治具30に固定する場合には、挟持部31が柱状部11を挟持したときに、挟持部31が台座部12側にずれることを抑止するための部分となってもよい。なお、この場合には、また、台座部12は、位置固定治具30の挟持部31の孔径よりも広く構成されていてもよい。これにより、位置固定治具30の挟持部31に上方から窓材10を挿通したときに、台座部12で係止され、柱状の窓材10が脱落せずに固定される。このように、柱状の窓材10は、柱状部11と台座部12とを有する形状とすることで、柱状部11は終点検出窓として必要な範囲で比較的小さくしつつ、台座部12により脱落をより抑制することができる。 When the window member 10 is fixed to the position fixing jig 30 by the holding portion 31 of the position fixing jig 30, the holding portion 31 may be displaced toward the pedestal portion 12 when the holding portion 31 holds the columnar portion 11. It may be a part for deterring In this case, the pedestal portion 12 may be configured to be wider than the hole diameter of the holding portion 31 of the position fixing jig 30 . As a result, when the window member 10 is inserted through the holding portion 31 of the position fixing jig 30 from above, it is locked by the pedestal portion 12, and the columnar window member 10 is fixed without falling off. In this way, the columnar window member 10 has a shape having the columnar portion 11 and the pedestal portion 12 , so that the columnar portion 11 is relatively small within the range necessary for the end point detection window, and the columnar portion 11 is dropped by the pedestal portion 12 . can be further suppressed.
 以上のように窓材を構成することにより、硬化工程において注入された樹脂や硬化中の樹脂によって、窓材10の位置がずれたり、窓材10が斜めになったりすることが抑制される傾向にある。また、柱状部11を終点検出窓として必要な範囲で比較的小さく構成できるため、終点検出窓を埋設したことによる研磨パッドの研磨特性への影響をより小さくすることができる。 By configuring the window material as described above, the tendency of the window material 10 to be displaced or slanted due to the resin injected in the curing process or the resin being cured is suppressed. It is in. In addition, since the columnar portion 11 can be configured to be relatively small within a necessary range as the end point detection window, the effect of embedding the end point detection window on the polishing characteristics of the polishing pad can be further reduced.
 なお、窓材10の形状は図1B及び図1Cに限定されない。例えば、柱状の窓材10は、台座部12を有さず、柱状部11のみを有するものであってもよい。 The shape of the window material 10 is not limited to that shown in FIGS. 1B and 1C. For example, the columnar window member 10 may have only the columnar portion 11 without the pedestal portion 12 .
 窓材10は、特に限定されないが、例えば、金型(不図示)に樹脂を注入して硬化することで作製することができる。金型から取り出した窓材10は、柱状部11の側面を、サンドペーパーで処理したり溶剤で処理したりすることが好ましい。これにより、窓材10に離型剤が付着している場合には離型剤を除去することができ、また、サンドペーパーで側面が粗面化されることによって、樹脂シート(研磨層50)に窓材10を埋設したときに、樹脂シート(研磨層50)と窓材10(終点検出窓51)との密着性がより向上する傾向にある。 Although the window material 10 is not particularly limited, it can be produced, for example, by injecting resin into a mold (not shown) and curing the resin. It is preferable that the side surface of the columnar portion 11 of the window material 10 removed from the mold is treated with sandpaper or treated with a solvent. As a result, if the release agent is attached to the window material 10, the release agent can be removed. When the window material 10 is embedded in the inner wall, the adhesiveness between the resin sheet (polishing layer 50) and the window material 10 (end point detection window 51) tends to be further improved.
1.1.2.凸面形状
 本実施形態において「凸面形状」とは、端部から任意の部分に向かって高くなっている面を意味し、例えば、図1Aにおいては、直方体状の窓材10は、底面のうち長軸方向の両端が低く、長軸方向の中央部に向かって徐々に盛り上がっている面を凸面形状として有する。凸面形状は凸状であれば曲線でなくともよく、中央に向かって凸な任意の形状を選択でき、曲面や、あるいは三角錐のようにとがったものでもよい。
1.1.2. Convex shape In the present embodiment, the term “convex shape” means a surface that rises from an end toward an arbitrary portion. For example, in FIG. It has a convex shape with both ends in the axial direction being low and gradually rising toward the central portion in the longitudinal direction. The shape of the convex surface need not be curved as long as it is convex, and any shape that is convex toward the center can be selected.
 本実施形態における「凸面形状」では、もっとも高くなっている部分が平坦であってもよいが、その最も高くなっている部分の面積S1は、窓材10の断面積Sに対して、好ましくは0~50面積%であり、より好ましくは0~40面積%であり、さらに好ましくは0~30面積%であり、よりさらに好ましくは0~20面積%であり、さらにより好ましくは0~10面積%である。断面積Sに対する面積S1の割合が50面積%以下ということにより、窓材10の下面と金型20の底面21との間に硬化性樹脂が流入しやすくなり、硬化性樹脂が気泡を巻き込むことが抑制されやすく、また巻き込まれた気泡を逃がしやすくすることができる。 In the "convex shape" of the present embodiment, the highest portion may be flat, but the area S1 of the highest portion is preferably 0 to 50 area%, more preferably 0 to 40 area%, still more preferably 0 to 30 area%, even more preferably 0 to 20 area%, still more preferably 0 to 10 area% %. Since the ratio of the area S1 to the cross-sectional area S is 50 area % or less, the curable resin easily flows between the lower surface of the window member 10 and the bottom surface 21 of the mold 20, and the curable resin does not involve air bubbles. is easily suppressed, and trapped air bubbles can be easily released.
 なお、断面積Sに対する面積S1の割合が50面積%以下であることは、本実施形態における「凸面形状」は、窓材の下端が単に面取り加工がされた場合を含まないことを意味するものでもある。 The fact that the ratio of the area S1 to the cross-sectional area S is 50 area % or less means that the "convex shape" in the present embodiment does not include the case where the lower end of the window material is simply chamfered. But also.
 また、窓材10の凸面形状を有する部分の長さLは、好ましくは3.0~20mmであり、より好ましくは3.0~15mmであり、さらに好ましくは3.0~10mmである。長さLが長いほど、凸面形状の一番低い部分と高い部分との差が大きくなり、硬化性樹脂が気泡を巻き込むことが抑制されやすく、また巻き込まれた気泡を逃がしやすくなる傾向にある。一方で、長さLが短いほど、研磨パッドとして使用できず破棄する部分が短くなる傾向にある。 Further, the length L of the convex portion of the window member 10 is preferably 3.0 to 20 mm, more preferably 3.0 to 15 mm, and even more preferably 3.0 to 10 mm. The longer the length L, the greater the difference between the lowest part and the highest part of the convex shape, which tends to suppress entrainment of air bubbles in the curable resin and facilitate release of entrained air bubbles. On the other hand, the shorter the length L, the shorter the portion that cannot be used as a polishing pad and is discarded.
 窓材10の凸面形状を有する部分の長さLと、窓材10の水平方向の断面積Sとの比(L/S)は、好ましくは0.002~0.4であり、より好ましくは0.005~0.35であり、さらに好ましくは0.010~0.30である。比(L/S)が大きいほど、凸面形状の一番低い部分と高い部分との差が大きくなり、硬化性樹脂が気泡を巻き込むことが抑制されやすく、また巻き込まれた気泡を逃がしやすくなる傾向にある。一方で、比(L/S)が小さいほど、研磨パッドとして使用できず破棄する部分が短くなる傾向にある。 The ratio (L/S) between the length L of the convex portion of the window member 10 and the horizontal cross-sectional area S of the window member 10 is preferably 0.002 to 0.4, more preferably It is 0.005 to 0.35, more preferably 0.010 to 0.30. The larger the ratio (L/S), the greater the difference between the lowest part and the highest part of the convex shape, the tendency that the curable resin tends to suppress the entrainment of air bubbles, and the entrained air bubbles tend to escape. It is in. On the other hand, the smaller the ratio (L/S), the shorter the portion that cannot be used as a polishing pad and is discarded.
 窓材10の凸面形状を有する部分の長さLは、窓材10の全長Lwに対して、好ましくは0.03~0.30Lwであり、より好ましくは0.03~0.25Lwであり、さらに好ましくは0.03~0.20Lwである。長さLが大きいほど、凸面形状の一番低い部分と高い部分との差が大きくなり、硬化性樹脂が気泡を巻き込むことが抑制されやすく、また巻き込まれた気泡を逃がしやすくなる傾向にある。一方で、長さLが小さいほど、研磨パッドとして使用できず破棄する部分が短くなる傾向にある。 The length L of the convex portion of the window member 10 is preferably 0.03 to 0.30 Lw, more preferably 0.03 to 0.25 Lw, relative to the total length Lw of the window member 10, More preferably 0.03 to 0.20 Lw. The larger the length L, the greater the difference between the lowest part and the highest part of the convex shape, which tends to suppress entrainment of air bubbles in the curable resin and facilitate release of entrained air bubbles. On the other hand, the smaller the length L, the shorter the portion that cannot be used as a polishing pad and is discarded.
1.2.硬化工程
 硬化工程は、金型内に窓材を固定し、該窓材と接触した状態で硬化性樹脂を硬化して、窓材が組み込まれた樹脂シートを形成する工程である。
1.2. Curing Step The curing step is a step of fixing the window member in the mold and curing the curable resin in contact with the window member to form a resin sheet incorporating the window member.
1.2.1.位置固定治具
 硬化工程において、窓材10は、金型20上部に設置した位置固定治具30により吊り下げられて固定される。図3A~図3Cに、樹脂シートを作製するための金型20の上面図を示す。図3A~図3Cにおいては、位置固定治具30が金型20の上部に設置されており、位置固定治具30から、鉛直下向きに窓材10が固定されている。なお、図3Bは金型20の上面図であり、窓材10が位置固定治具30の下方に接着剤にて固定された態様を示すものであるため、窓材10の固定箇所は破線で示している。
1.2.1. Position Fixing Jig In the curing process, the window member 10 is suspended and fixed by a position fixing jig 30 installed above the mold 20 . 3A to 3C show top views of a mold 20 for producing a resin sheet. 3A to 3C, the position fixing jig 30 is installed above the mold 20, and the window member 10 is fixed vertically downward from the position fixing jig 30. In FIG. Note that FIG. 3B is a top view of the mold 20 and shows a mode in which the window material 10 is fixed below the position fixing jig 30 with an adhesive. showing.
 金型20と位置固定治具30と窓材10との位置関係をより詳細に説明するために、図4A及び図4Bを示す。図4A及び図4Bは、金型20に硬化性樹脂を注入する前の図3A及び図3BにおけるA-A’の断面図である。図3A及び図3Bと図4A及び図4Bからわかるように、金型20は、樹脂シートを形成するための扁平な金型となっており、位置固定治具30は、その金型20の凹部を覆うように側壁22に接して固定されている。 4A and 4B are shown in order to explain the positional relationship between the mold 20, the position fixing jig 30 and the window material 10 in more detail. FIGS. 4A and 4B are cross-sectional views taken along line A-A' in FIGS. 3A and 3B before the curable resin is injected into the mold 20. FIG. As can be seen from FIGS. 3A and 3B and FIGS. 4A and 4B, the mold 20 is a flat mold for forming a resin sheet, and the position fixing jig 30 is a concave portion of the mold 20. is fixed in contact with the side wall 22 so as to cover the .
 位置固定治具30の金型20と接触する場所は、金型20の上部と嵌合可能な凹凸形状(第1嵌合部)を有していてもよい。また、金型20の位置固定治具30と接触する場所も、位置固定治具30と嵌合可能な凹凸形状(第2嵌合部)を有していてもよい。これにより、金型20に位置固定治具30を設置する際において、位置固定治具30の位置決めが容易になり、硬化工程ごとに窓材10の埋設位置がずれたりすることを抑制できる傾向にある。 The portion of the position fixing jig 30 that contacts the mold 20 may have an uneven shape (first fitting portion) that can be fitted to the upper portion of the mold 20 . Further, the portion of the mold 20 that contacts the position fixing jig 30 may also have an uneven shape (second fitting portion) that can be fitted with the position fixing jig 30 . This facilitates the positioning of the position fixing jig 30 when installing the position fixing jig 30 in the mold 20, and tends to suppress deviation of the embedding position of the window material 10 for each curing process. be.
 さらに、窓材10は、位置固定治具30の下側に、吊り下げられて固定され、柱状部11が鉛直方向下方を向く。この際、窓材10は、台座部12によって位置固定治具30に固定されていてもよい。この固定には、任意の接着剤や両面テープなどを用いることができる。 Furthermore, the window member 10 is suspended and fixed to the lower side of the position fixing jig 30, and the columnar portion 11 faces downward in the vertical direction. At this time, the window member 10 may be fixed to the position fixing jig 30 by the pedestal portion 12 . Any adhesive, double-sided tape, or the like can be used for this fixation.
 さらに、位置固定治具30は、窓材10を位置決めして固定する位置決め部を有していてもよい。ここで、位置決め部は、位置固定治具30と台座部12とが接触する場所に形成された、位置固定治具30と台座部12とが嵌合可能な凹凸形状とすることができる。これにより、硬化工程ごとに窓材10の埋設位置がずれたりすることを抑制できる傾向にある。 Furthermore, the position fixing jig 30 may have a positioning portion for positioning and fixing the window material 10 . Here, the positioning portion may have an uneven shape formed at a place where the position fixing jig 30 and the pedestal portion 12 are in contact with each other so that the position fixing jig 30 and the pedestal portion 12 can be fitted. As a result, it tends to be possible to suppress displacement of the embedding position of the window member 10 for each curing step.
 例えば、金型20の底面に窓材10を固定する場合には、硬化性樹脂を金型に充填した後に、窓材10の個数や位置を変更することは困難である。一方で、本実施形態のように窓材10を吊り下げて固定する場合には、硬化性樹脂を金型20に充填した後であっても硬化前であれば、窓材10の位置を変更したり、窓材10の個数を変更したりすることが容易となる。 For example, when the window material 10 is fixed to the bottom surface of the mold 20, it is difficult to change the number and position of the window material 10 after filling the mold with a curable resin. On the other hand, when the window material 10 is suspended and fixed as in the present embodiment, the position of the window material 10 is changed even after the curable resin is filled into the mold 20 but before it is cured. or change the number of window materials 10 .
 また、その他、金型20の底など金型自体に窓材10を固定するための変更を施す必要がなく、金型20としては終点検出窓を有しない研磨パッドの製造に用いるのと同様のものをそのまま用いることもできる。 In addition, there is no need to modify the mold itself such as the bottom of the mold 20 to fix the window member 10, and the mold 20 is similar to that used for manufacturing a polishing pad without an endpoint detection window. It is also possible to use the object as it is.
 位置固定治具30の素材は、特に限定されないが、例えば、硬化工程の熱でも変形しない程度の耐熱性の素材であればよく、例えば、アルミ合金やステンレス鋼が挙げられる。 Although the material of the position fixing jig 30 is not particularly limited, it may be a heat-resistant material that does not deform even with the heat of the hardening process. Examples include aluminum alloy and stainless steel.
1.2.3.挟持部
 位置固定治具30は、挟持部31を有することが好ましい。挟持部31は、窓材10の一部を挟持し、吊り下げて固定することができる。このような挟持部31により窓材10の側面を挟持することにより、窓材10をまっすぐ垂直に吊り下げて固定することができ、また、平面方向に対する力が付加された場合にも位置ずれ等が生じにくくなる。そのため、窓材10がまっすぐ垂直に固定されず斜めに固定されてしまうことにより、終点検出窓として機能しなくなったり、硬化性材料の流れによって、または、硬化性材料の硬化時における膨張又は収縮によって、窓材10が押されて位置ずれ等が生じたりすることが抑制される。
1.2.3. Holding Part The position fixing jig 30 preferably has a holding part 31 . The holding part 31 can hold a part of the window member 10 and suspend and fix it. By holding the side surface of the window member 10 with such a holding portion 31, the window member 10 can be vertically suspended and fixed. becomes less likely to occur. Therefore, if the window material 10 is fixed obliquely rather than straight and vertically, it may not function as an endpoint detection window, or may be caused by the flow of the curable material, or by the expansion or contraction of the curable material during curing. , the window material 10 is suppressed from being pushed and causing positional deviation or the like.
 また、挟持部31を用いることにより、接着剤等の固定化手段を用いる必要がなく、窓材10の着脱も容易となる。例えば、接着剤等を使用した場合には、接着力が弱い場合には位置ずれや脱落が生じることが懸念されるほか、接着力が強い場合には硬化工程後に位置固定治具30から窓材10を取り外すことが困難となる。これに対して、挟持部31を用いる場合は、少なくとも一方向から窓材10を挟み込めればよく、その挟み込みの力を弱めることで容易に着脱することができる。さらに、接着剤を用いる場合には、窓材10の接着面をサンドペーパー等で削って平坦とするなどの処理が必要となるが、挟持部31を用いる場合にはそのような処置も不要となる。 Further, by using the clamping part 31, it is not necessary to use fixing means such as an adhesive, and the attachment and detachment of the window material 10 is facilitated. For example, when an adhesive or the like is used, if the adhesive strength is weak, there is a concern that misalignment or falling off may occur. 10 becomes difficult to remove. On the other hand, when the clamping portion 31 is used, the window member 10 can be clamped from at least one direction, and the clamping force can be weakened to facilitate attachment and detachment. Furthermore, when an adhesive is used, processing such as flattening the bonding surface of the window material 10 by scraping it with sandpaper or the like is required, but such a treatment is not required when the clamping portion 31 is used. Become.
 さらに、金型底面に接着剤等で窓材を固定する場合には一度固定したらその位置を調整できないが、窓材を挟持部により吊り下げて固定することにより、窓材の取り外しが容易となり、硬化性樹脂が硬化するまでは挟持部を弛めて、窓材の埋設位置を微調整することができる。 Furthermore, when the window material is fixed to the bottom surface of the mold with an adhesive or the like, the position cannot be adjusted once fixed. Until the hardening resin is hardened, the clamping portion can be loosened to finely adjust the embedding position of the window material.
 終点検出窓は通常は研磨能力を持たないため、研磨パッドに配置する窓の大きさはできるだけ小さいことが好ましく、小さい終点検出窓を介して、研磨装置の検出器部分に正確に透過光を届けるためには、いずれの研磨パッドにも同一箇所に正確に窓を配置する必要がある。そのため、上記のような微調整を可能とすることにより良品率を向上することもできる。また、硬化性樹脂が硬化した後には、挟持部を弛めて、挟持部から窓材を取り外すことにより、位置固定治具と得られた樹脂シートを分離することができる。 Since the endpoint detection window usually has no polishing capability, the size of the window placed in the polishing pad should be as small as possible to accurately deliver the transmitted light to the detector portion of the polishing apparatus through the small endpoint detection window. For this purpose, it is necessary to place the windows at exactly the same location on both polishing pads. Therefore, by enabling fine adjustment as described above, it is also possible to improve the non-defective product rate. Further, after the curable resin is cured, the clamping portion is loosened and the window material is removed from the clamping portion, thereby separating the position fixing jig and the obtained resin sheet.
 挟持部31は、上記のように窓材10を挟持して固定するものであれば特に制限されず、窓材10を挟み込む一又は複数の部材を有してもよいし、さらに挟持する力を調整するための調整部32を有してもよい。このなかでも、着脱の容易性の点から、はめ込むだけで窓材10を挟持できるように構成された挟持部31が好ましく、固定の強度を調整できる点で、調整部32を備える挟持部31が好ましい。 The clamping portion 31 is not particularly limited as long as it clamps and fixes the window member 10 as described above, and may have one or more members that clamp the window member 10. Further, the clamping force may be reduced. It may have an adjusting section 32 for adjustment. Among these, from the viewpoint of ease of attachment and detachment, the holding portion 31 configured to hold the window material 10 by simply fitting is preferable, and from the point of being able to adjust the fixing strength, the holding portion 31 having the adjustment portion 32 is preferred. preferable.
 このような調整部32としては、例えば、図2Aのように窓材10を挟み込む複数の部材(挟持部31)を締め付けるネジやバネなどであってもよい。図2Aでは、調整部32(ネジ)を介して2つの部材からなる挟持部31が接続されており、調整部32によって、2つの部材からなる挟持部31の間の距離が調整可能とされている。これにより調整部32によって挟持部31の間の距離が短くなるように締め付けることで、窓材10の側面が押さえつけられ、挟持する力が調整される。 For example, such an adjusting portion 32 may be a screw or a spring that tightens a plurality of members (holding portion 31) that hold the window material 10 therebetween as shown in FIG. 2A. In FIG. 2A, the clamping part 31 made up of two members is connected via an adjusting part 32 (screw), and the adjusting part 32 can adjust the distance between the clamping part 31 made up of the two members. there is As a result, the adjusting portion 32 tightens the clamping portions 31 so that the distance between the clamping portions 31 is shortened, thereby pressing the side surfaces of the window member 10 and adjusting the clamping force.
 また、調整部32としては、例えば、図2Bのように挟持部31とともに窓材10を締め付けるネジやバネなどであってもよい。図2Bでは、挟持部31の側面から貫通した調整部32(ネジ)の底部が窓材10の側面を押さえつけ、これにより、挟持部31内壁と調整部32(ネジ)の底部の押さえつける力によって、挟持する力が調整される。 Further, the adjustment part 32 may be, for example, a screw or a spring that tightens the window member 10 together with the clamping part 31 as shown in FIG. 2B. In FIG. 2B, the bottom portion of the adjusting portion 32 (screw) penetrating from the side surface of the clamping portion 31 presses the side surface of the window member 10, thereby pressing the inner wall of the clamping portion 31 and the bottom portion of the adjusting portion 32 (screw). The clamping force is adjusted.
 なお、挟持部31や調整部32の形態は、上記に制限されることなく、その他にも挟持する力を強く又は弱くできるよう構成されたものであれば、任意の構造を有することができる。 The forms of the holding part 31 and the adjusting part 32 are not limited to the above, and can have any structure as long as they are configured to increase or decrease the holding force.
 位置固定治具30は、窓材10が挿通される貫通孔33を有してもよく、この際、挟持部31は、貫通孔33に挿通された窓材10を挟持してもよい。このように位置固定治具30にあらかじめ設けられた貫通孔33に対して窓材10を挿通しこれを挟持することで、貫通孔33に応じて容易に位置決めを行うことができる。 The position fixing jig 30 may have a through-hole 33 through which the window member 10 is inserted, and at this time, the holding portion 31 may hold the window member 10 inserted through the through-hole 33 . By inserting the window member 10 into the through-hole 33 provided in advance in the position fixing jig 30 and holding it therebetween, it is possible to easily perform positioning according to the through-hole 33 .
 図3A及び図3Bに、樹脂シートを作製するための金型20の上面図を示し、図4A及び図4Bに、金型20に硬化性樹脂を注入する前の図3A及び図3BにおけるA-A’の断面図を示す。図3A,図4Aにおいて示す金型20は、図1Bで示す態様の窓材10を図2Bで示す態様の調整部32により固定する位置固定治具30を備える。 3A and 3B show a top view of the mold 20 for making the resin sheet, and FIGS. 4A and 4B show the A− in FIGS. A' shows a cross-sectional view. A mold 20 shown in FIGS. 3A and 4A includes a position fixing jig 30 that fixes the window member 10 shown in FIG. 1B by an adjusting portion 32 shown in FIG. 2B.
 図4A及び図5Aに示すように、位置固定治具30は金型20の上部に設置されており、窓材10は位置固定治具30の挟持部31により挟持されることで、鉛直下向きに吊り下げられて固定されている。 As shown in FIGS. 4A and 5A, the position fixing jig 30 is installed on top of the mold 20, and the window member 10 is held by the holding portion 31 of the position fixing jig 30, thereby vertically downward. Suspended and fixed.
 また、金型20の形状は、特に限定されないが、例えば、樹脂シートを形成するための扁平な金型とすることができ、樹脂シートを切り出すための樹脂ブロックを形成するような直方体状の金型であってもよい。位置固定治具30は、その金型20の上部を覆うように側壁22に接して固定されている。 The shape of the mold 20 is not particularly limited. can be a type. A position fixing jig 30 is fixed in contact with the side wall 22 so as to cover the upper portion of the mold 20 .
1.2.3.硬化性樹脂
 硬化工程では、上記のように金型20内に窓材10を固定し、該窓材10と接触した状態で硬化性樹脂40を硬化して、窓材10(終点検出窓51)が組み込まれた樹脂シート(研磨層50)を形成する。
1.2.3. Curable Resin In the curing step, the window member 10 is fixed in the mold 20 as described above, and the curable resin 40 is cured while in contact with the window member 10 to form the window member 10 (end point detection window 51). to form a resin sheet (polishing layer 50) in which is incorporated.
 図4Aに、図3AにおけるA-A’の断面図を示す。この断面図では、窓材10が、挟持部31により位置固定治具30に固定されている(図2A参照)。また、図5Aには、図4Aにおいて、金型20に硬化性樹脂を注入した状態の断面図を示す。 FIG. 4A shows a cross-sectional view of A-A' in FIG. 3A. In this cross-sectional view, the window member 10 is fixed to the position fixing jig 30 by the holding portion 31 (see FIG. 2A). Further, FIG. 5A shows a cross-sectional view of a state in which the curable resin is injected into the mold 20 in FIG. 4A.
 図4Bに、図3BにおけるA-A’の断面図を示す。この断面図では、窓材10が、接着剤により位置固定治具30に固定されている。また、図5Bには、図4Bにおいて、金型20に硬化性樹脂を注入した状態の断面図を示す。 FIG. 4B shows a cross-sectional view along A-A' in FIG. 3B. In this cross-sectional view, the window material 10 is fixed to the position fixing jig 30 with an adhesive. Further, FIG. 5B shows a cross-sectional view of a state in which the curable resin is injected into the mold 20 in FIG. 4B.
 硬化工程は、窓材10と接触した状態で硬化性樹脂40を硬化する態様であれば特に限定されない。例えば、図5A,図5Bのように金型20に窓材10を固定してから、金型20に硬化性樹脂40を充填して硬化性樹脂40を硬化させてもよい。または、金型20に硬化性樹脂40を充填してから、窓材10を硬化性樹脂40に接触させて、その後に硬化性樹脂40を硬化させてもよい。 The curing process is not particularly limited as long as it cures the curable resin 40 in contact with the window material 10 . For example, after fixing the window member 10 to the mold 20 as shown in FIGS. 5A and 5B, the mold 20 may be filled with the curable resin 40 and the curable resin 40 may be cured. Alternatively, the mold 20 may be filled with the curable resin 40, the window material 10 may be brought into contact with the curable resin 40, and then the curable resin 40 may be cured.
 また、図5Bにおいては、柱状部11のみが硬化性樹脂40と接触する態様としているが、台座部12が硬化性樹脂40と接触してもよい。 Also, in FIG. 5B, only the columnar portion 11 is in contact with the curable resin 40 , but the pedestal portion 12 may be in contact with the curable resin 40 .
 硬化性樹脂としては、特に制限されないが、例えば、ポリエステル系ポリウレタン樹脂、ポリエーテル系ポリウレタン樹脂、及びポリカーボネート系ポリウレタン樹脂が挙げられる。これらは1種を単独で又は2種以上を組み合わせて用いてもよい。このようなポリウレタン樹脂としては、ポリイソシアネートとポリオールにより合成することができる。 The curable resin is not particularly limited, but examples include polyester-based polyurethane resins, polyether-based polyurethane resins, and polycarbonate-based polyurethane resins. You may use these individually by 1 type or in combination of 2 or more types. Such a polyurethane resin can be synthesized from polyisocyanate and polyol.
1.3.スライス工程
 スライス工程は、樹脂シートをスライスして研磨層を形成する工程である。図6~図7に、硬化工程後に、金型20から外して、台座部12を除去して得られた樹脂シート(研磨層50)の上面図と断面図を示す。図6~図7に示されるように、樹脂シートは窓材が埋設されたものである。
1.3. Slicing Step The slicing step is a step of slicing the resin sheet to form a polishing layer. 6 and 7 show a top view and a cross-sectional view of the resin sheet (polishing layer 50) obtained by removing it from the mold 20 and removing the pedestal portion 12 after the curing process. As shown in FIGS. 6 and 7, the resin sheet has a window material embedded therein.
 スライス方法は、特に限定されないが、例えば、図6~図7に示すような樹脂シートを、面方向に切断し、任意の厚さの研磨パッドとする方法が挙げられる。また、図8に示すように四角形状の研磨パッドは、円形状に切り出してもよい。なお、スライスする際の温度は、好ましくは80℃~100℃である。これにより、平坦性がより向上する傾向にある。 The slicing method is not particularly limited, but for example, a method of cutting a resin sheet as shown in FIGS. Moreover, as shown in FIG. 8, a rectangular polishing pad may be cut into a circular shape. The temperature for slicing is preferably 80.degree. C. to 100.degree. This tends to further improve flatness.
1.4.ドレス処理
 必要に応じて、得られた樹脂シート研磨面をドレス処理してもよい。ドレス処理における温度は、好ましくは85℃~95℃である。これにより、平坦性がより向上する傾向にある。
1.4. Dressing Treatment If necessary, the polished surface of the resin sheet obtained may be dressed. The temperature in the dressing treatment is preferably 85°C to 95°C. This tends to further improve flatness.
1.5.溝形成工程
 本実施形態の研磨パッドの製造方法は、必要に応じて、研磨層の研磨面に溝加工を施す溝形成工程を有していてもよい(図9参照)。なお、光学終点検出に支障があるため、溝加工は、窓材の露出している部分には行わないことが好ましい。
1.5. Groove Forming Step The method of manufacturing the polishing pad of the present embodiment may optionally include a groove forming step of performing groove processing on the polishing surface of the polishing layer (see FIG. 9). Note that it is preferable not to perform grooving on the exposed portion of the window material, as this interferes with the detection of the optical end point.
1.6.積層工程
 本実施形態の研磨パッドの製造方法は、必要に応じて、研磨層の研磨面と反対側の面に、基材層及び/又はクッション層を積層する積層工程などを有していてもよい。なお、積層工程は、ドレス処理工程及び溝形成工程の前に行ってもよいし、後に行ってもよい。すなわち、積層工程、ドレス処理工程、及び溝形成工程は、順不同で行うことができる。
1.6. Lamination step The method for producing the polishing pad of the present embodiment may optionally include a lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface. good. The stacking process may be performed before or after the dressing process and the groove forming process. That is, the stacking process, the dressing process, and the groove forming process can be performed in any order.
 積層工程は各層を単純に積層するなど公知の手段を用いてもよい。以下においては、窓材の位置ずれ等を抑制できるようにしつつも、窓材の位置の調整も容易に行うことを目的とした態様の積層工程について説明する。 For the lamination process, known means such as simply laminating each layer may be used. In the following, a description will be given of a lamination process in which the positional deviation of the window material can be suppressed and the position of the window material can be easily adjusted.
 上記目的の積層工程は、樹脂シートの開口に設けられた終点検出窓の位置情報を取得する第1取得工程と、位置情報に基づいて、粘着シート上の終点検出窓の設置位置に相当する部分に、孔を形成する第1孔形成工程と、終点検出窓と孔とを位置合わせして、樹脂シートと粘着シートの粘着面とを貼り合わせる第1貼合工程と、を有する。 The lamination step for the above purpose includes a first acquisition step of acquiring position information of the end point detection window provided in the opening of the resin sheet, and a portion corresponding to the installation position of the end point detection window on the adhesive sheet based on the position information. a first hole forming step of forming a hole; and a first bonding step of bonding the resin sheet and the adhesive surface of the adhesive sheet together by aligning the end point detection window with the hole.
 また、本態様の積層工程は、さらに、粘着シートが両面テープである場合に、樹脂シート上の両面テープに形成された孔の位置情報を取得する第2取得工程と、位置情報に基づいて、他の層上の終点検出窓の設置位置に相当する部分に、孔を形成する第2孔形成工程と、両面テープにおける孔と他の層における孔とを位置合わせして、樹脂シート上の両面テープと他の層とを貼り合わせる第2貼合工程と、を有していてもよい。なお、ここで、「他の層」としては、クッション層が挙げられる。 Further, the lamination step of this aspect further includes a second acquisition step of acquiring position information of holes formed in the double-sided tape on the resin sheet when the adhesive sheet is a double-sided tape, and based on the position information, A second hole forming step of forming a hole in a portion corresponding to the installation position of the end point detection window on another layer, and aligning the hole in the double-sided tape with the hole in the other layer, and a second bonding step of bonding the tape and another layer. In addition, a cushion layer is mentioned as "another layer" here.
 以下、各工程の概略断面図である図10~11を用いて各工程について詳説する。 Each step will be described in detail below with reference to FIGS. 10 and 11, which are schematic cross-sectional views of each step.
1.6.1.カッティング工程
 本態様の積層工程は、第1取得工程前に、終点検出窓51が埋設された樹脂シート(以下、「研磨層50」という)の外形を整えるためのカッティング工程を有していてもよい。カッティング工程においては、複数の終点検出窓51の位置から、各終点検出窓51と等距離であるような中心位置Oを特定し、その位置を中心にして、所定の正方形形状に研磨層50を切断してもよい。
1.6.1. Cutting step The stacking step of this embodiment may include a cutting step for trimming the outer shape of the resin sheet in which the end point detection window 51 is embedded (hereinafter referred to as “polishing layer 50”) before the first obtaining step. good. In the cutting process, a center position O that is equidistant from each of the end point detection windows 51 is specified from the positions of the end point detection windows 51, and the polishing layer 50 is cut into a predetermined square shape centering on that position. You can cut it.
 これにより、終点検出窓51により特定される中心位置Oに基づいて、規格化された外形を有する研磨層50を得ることができる。そして、このように形の定まった研磨層50を後述する各工程に供することで、より精度よく各工程を行うことができる。 Thereby, it is possible to obtain the polishing layer 50 having a standardized outer shape based on the center position O specified by the end point detection window 51 . By providing the polishing layer 50 having a fixed shape in this manner to each step described later, each step can be performed with higher accuracy.
 なお、第1取得工程以降に供される研磨層50は、円形に打ち抜かれた後のものであっても、研磨層50の一態様の上面図を示す図12のように四角形として、円形に打ち抜かれる前のものであってもよい。このなかでも、搬送中に研磨層50の向きを規制するなど以降の位置合わせに関する各工程を実施するにあたり、四角形であることが好ましい。研磨層50を四角形の状態で各工程を実施する場合、各工程後の最終段階において、終点検出窓51により特定される中心位置Oに基づいて、円形にさらに打ち抜くことで、研磨パッドを得るようにしてもよい。 It should be noted that the polishing layer 50 provided after the first obtaining step is formed into a square shape as shown in FIG. It may be one before punching. Among these, a rectangular shape is preferable in carrying out subsequent steps related to alignment, such as regulating the orientation of the polishing layer 50 during transportation. When each step is performed with the polishing layer 50 in a square state, in the final step after each step, the polishing pad is obtained by further punching into a circular shape based on the center position O specified by the end point detection window 51. can be
1.6.2.第1取得工程
 第1取得工程は、研磨層50の開口に設けられた終点検出窓51の位置情報を取得する工程である。樹脂シートは、複数の終点検出窓を有していてもよい。
1.6.2. First Acquisition Step The first acquisition step is a step of acquiring position information of the endpoint detection window 51 provided in the opening of the polishing layer 50 . The resin sheet may have multiple endpoint detection windows.
 図10において、第1製造装置100は、終点検出窓51を有する研磨層50を搬送するベルトコンベアなどの搬送機構110と、研磨層50の開口に設けられた終点検出窓51の位置情報を取得する撮像装置120と、離型シート62が付いた粘着シート61を送り出すローラ141と、送り出された粘着シート61に開口を形成する孔形成装置130と、孔が形成された粘着シート61から離型シート62を剥離するローラ142と、離型シート62が剥離された粘着シート61の孔と研磨層50の終点検出窓51とを位置合わせをしつつ、研磨層50と粘着シート61とを貼り合わせるローラ143と、を備える。 In FIG. 10, the first manufacturing apparatus 100 acquires the position information of the transport mechanism 110 such as a belt conveyor that transports the polishing layer 50 having the end point detection window 51 and the end point detection window 51 provided at the opening of the polishing layer 50. a roller 141 for sending out an adhesive sheet 61 with a release sheet 62 attached thereto; a hole forming device 130 for forming openings in the sent adhesive sheet 61; The polishing layer 50 and the adhesive sheet 61 are bonded together while aligning the roller 142 for peeling the sheet 62, the hole of the adhesive sheet 61 from which the release sheet 62 has been peeled, and the end point detection window 51 of the polishing layer 50. - 特許庁A roller 143 is provided.
 ここで、搬送機構110、撮像装置120、孔形成装置130、及びローラ141,142,143は、有線又は無線により、これらを制御する制御部(不図示)に接続されていてもよい。制御部は、パーソナルコンピュータなどの情報処理装置として構成することができる。搬送機構110、撮像装置120、孔形成装置130、及びローラ141,142,143の駆動制御、及び情報の伝達は、この制御部を介して行うことができる。 Here, the conveying mechanism 110, the imaging device 120, the hole forming device 130, and the rollers 141, 142, 143 may be connected by wire or wirelessly to a control unit (not shown) that controls them. The control unit can be configured as an information processing device such as a personal computer. Driving control of the conveying mechanism 110, imaging device 120, hole forming device 130, and rollers 141, 142, 143, and transmission of information can be performed via this controller.
 終点検出窓51の位置情報の取得方法は、特に限定されないが、例えば、搬送機構110により矢印F方向へ搬送された研磨層50が撮像装置120の直下を通過する際に撮影された画像情報により取得することができる。この際、撮像装置120の直下で、研磨層50が撮影のために一時停止するように搬送機構110を駆動してもよい。 A method of acquiring the positional information of the end point detection window 51 is not particularly limited, but for example, image information captured when the polishing layer 50 conveyed in the direction of arrow F by the conveying mechanism 110 passes directly below the imaging device 120 is used. can be obtained. At this time, the transport mechanism 110 may be driven so that the polishing layer 50 is temporarily stopped immediately below the imaging device 120 for imaging.
 このように取得した画像情報から終点検出窓51の位置情報を抽出する方法としては、特に限定されないが、例えば、画像情報における研磨層50と終点検出窓51の色の濃淡等の違いによって終点検出窓51を特定し、その輪郭を特定する方法;画像情報からエッジ検出等の画像処理によって終点検出窓51を特定し、その輪郭を特定する方法が挙げられる。 The method for extracting the position information of the end point detection window 51 from the image information acquired in this way is not particularly limited. A method of specifying the window 51 and specifying its contour; and a method of specifying the end point detection window 51 by image processing such as edge detection from image information and specifying its contour.
 また、撮像装置120に代えて、レーザー受光機を用いてもよい。例えば、研磨層50に当てたレーザー光のうち終点検出窓51を透過したレーザー光をレーザー受光機により受信して得られた情報に基づいて、終点検出窓51の位置を特定するようにしてもよい。 Also, instead of the imaging device 120, a laser receiver may be used. For example, the position of the end-point detection window 51 may be specified based on the information obtained by receiving the laser light that has passed through the end-point detection window 51 out of the laser beams applied to the polishing layer 50 by a laser receiver. good.
 この際、レーザー発振器とレーザー受光機の直下で研磨層50を一時停止するように搬送機構110を駆動し、レーザー発振器とレーザー受光機を研磨層50に対して走査してもよいし、また、レーザー発振器とレーザー受光機を搬送機構110の途中に固定し、搬送機構110を定速で動かし続けることにより、研磨層50に対してレーザー発振器とレーザー受光機が相対的に走査するようにして、終点検出窓51の位置を特定するようにしてもよい。 At this time, the conveying mechanism 110 may be driven so as to temporarily stop the polishing layer 50 immediately below the laser oscillator and the laser receiver, and the laser oscillator and the laser receiver may be scanned with respect to the polishing layer 50, or By fixing the laser oscillator and the laser receiver in the middle of the transport mechanism 110 and continuing to move the transport mechanism 110 at a constant speed, the laser oscillator and the laser receiver relatively scan the polishing layer 50. The position of the endpoint detection window 51 may be specified.
 さらに、制御部は、このように画像情報から取得した終点検出窓51の輪郭に関する情報に基づいて、終点検出窓51の中心位置を算出するようにしてもよい。このようにして取得した終点検出窓51の輪郭や中心位置などの位置情報は、制御部を介して、孔形成装置130に伝達してもよい。 Further, the control unit may calculate the center position of the end point detection window 51 based on the information regarding the contour of the end point detection window 51 obtained from the image information. The positional information such as the outline and center position of the end point detection window 51 acquired in this manner may be transmitted to the hole forming device 130 via the control unit.
1.6.3.第1孔形成工程
 第1孔形成工程は、位置情報に基づいて、粘着シート上の終点検出窓の設置位置に相当する部分に、孔を形成する工程である。ここで、粘着シートは両面テープであってもよいし、両面テープとクッション層などの他の層との積層体であってもよい。
1.6.3. First Hole Forming Step The first hole forming step is a step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on the adhesive sheet based on the positional information. Here, the adhesive sheet may be a double-sided tape, or may be a laminate of a double-sided tape and another layer such as a cushion layer.
 具体的には、制御部は、ローラ141を駆動制御して粘着シート61を送り出すとともに、終点検出窓51の位置情報を孔形成装置130に送信し、送り出された粘着シート61上の終点検出窓の設置位置に相当する部分に、孔形成装置130によって孔形成を行う。孔形成装置130によって孔形成を行う際には、ローラ141は一時停止してもよい。 Specifically, the control unit drives and controls the roller 141 to send out the adhesive sheet 61 , transmits the positional information of the end point detection window 51 to the hole forming device 130 , and detects the end point detection window on the sent adhesive sheet 61 . A hole is formed by the hole forming device 130 in a portion corresponding to the installation position of the . The rollers 141 may be paused while the perforations are being performed by the perforator 130 .
 この際、孔形成装置130は終点検出窓51よりも小さい孔を形成するようにしてもよい。より具体的には、制御部は、孔形成装置130に対して、終点検出窓51の輪郭とその中心位置に関する情報を含む位置情報を送信し、孔形成装置130はその輪郭よりも小さい孔を、終点検出窓51の中心位置と形成される孔の中心位置とが一致するように位置合わせをしつつ、形成することができる。 At this time, the hole forming device 130 may form a hole smaller than the end point detection window 51 . More specifically, the control unit transmits positional information including information on the contour of the end point detection window 51 and its center position to the hole forming device 130, and the hole forming device 130 forms a hole smaller than the contour. , can be formed while aligning so that the center position of the end point detection window 51 and the center position of the hole to be formed match.
 これによって、終点検出窓51よりも小さい孔を形成した粘着シート61を、形成される孔の中心位置と終点検出窓51の中心位置とを位置合わせをしつつ、研磨層50に貼り合わせることができる。このように、終点検出窓51よりも貼り合わされる粘着シート61の孔を小さくすることにより、終点検出窓51を粘着シート61により研磨層50の裏側から支持することができる。そのため、得られる研磨パッドの耐久性をより向上することができる。 As a result, the adhesive sheet 61 having a hole smaller than the end point detection window 51 can be attached to the polishing layer 50 while aligning the center position of the formed hole with the center position of the end point detection window 51 . can. Thus, by making the hole of the adhesive sheet 61 bonded together smaller than the endpoint detection window 51 , the endpoint detection window 51 can be supported from the back side of the polishing layer 50 by the adhesive sheet 61 . Therefore, the durability of the resulting polishing pad can be further improved.
1.6.4.第1貼合工程
 第1貼合工程は、終点検出窓と孔とを位置合わせして、樹脂シートと粘着シートの粘着面とを貼り合わせる工程である。貼り合わせ後の粘着シートは、樹脂シートの大きさに合わせてカットしてもよい。
1.6.4. First Bonding Step The first bonding step is a step of aligning the endpoint detection window and the hole and bonding the resin sheet and the adhesive surface of the adhesive sheet together. The adhesive sheet after bonding may be cut according to the size of the resin sheet.
 具体的には、制御部は、ローラ141を駆動制御して、孔形成された粘着シート61をさらに送り出すとともに、ローラ142を駆動制御して、粘着シート61の粘着面に貼り合わせられた離型シート62の巻取を行う。そして、これとともに、制御部は、搬送機構110を駆動して、研磨層50を矢印F方向にさらに送り出し、終点検出窓51と孔とを位置合わせして、研磨層50と粘着シート61の粘着面とを貼り合わせる。 Specifically, the control unit drives and controls the roller 141 to further feed out the perforated adhesive sheet 61 , and drives and controls the roller 142 to release the mold release bonded to the adhesive surface of the adhesive sheet 61 . The sheet 62 is wound. At the same time, the controller drives the conveying mechanism 110 to further feed the polishing layer 50 in the direction of the arrow F, align the end point detection window 51 with the hole, and adhere the polishing layer 50 and the adhesive sheet 61 to each other. Glue the surface together.
 この際に、制御部は、ローラ141により送り出される粘着シート61と、搬送機構110により搬送される研磨層50の位置関係を計算しつつ、ローラ143と搬送機構110を駆動制御することができる。さらに、その駆動制御において、粘着シート61に形成した孔の中心位置の情報と、研磨層50が有する終点検出窓51の中心位置の情報とに基づいて、これらの中心位置が重なるように、研磨層50と粘着シート61の移動距離を制御し、貼り合わせるようにしてもよい。 At this time, the controller can drive and control the roller 143 and the transport mechanism 110 while calculating the positional relationship between the adhesive sheet 61 sent by the roller 141 and the polishing layer 50 transported by the transport mechanism 110 . Further, in the drive control, based on the information on the center position of the hole formed in the adhesive sheet 61 and the information on the center position of the end point detection window 51 of the polishing layer 50, polishing is performed so that these center positions overlap each other. The moving distance of the layer 50 and the adhesive sheet 61 may be controlled to adhere them together.
 これにより、終点検出窓51と粘着シート61に形成した孔が、同心円状に重なった状態で貼り合わせることができる。そのため、例えば、図8及び図9に示されるように、粘着シート61に形成した孔が終点検出窓51より小さい場合、終点検出窓51を粘着シート61により研磨層50の裏側から支持することができる。そのため、得られる研磨パッドの耐久性をより向上することができる。 As a result, the end point detection window 51 and the holes formed in the adhesive sheet 61 can be stuck together in a state where they overlap concentrically. Therefore, for example, as shown in FIGS. 8 and 9, when the hole formed in the adhesive sheet 61 is smaller than the endpoint detection window 51, the endpoint detection window 51 can be supported from the back side of the polishing layer 50 by the adhesive sheet 61. can. Therefore, the durability of the resulting polishing pad can be further improved.
1.6.5.第2取得工程
 第2取得工程は、第1貼合工程において研磨層50上に貼り合わされた両面テープが有する孔の位置情報を取得する工程である。
1.6.5. Second Acquisition Step The second acquisition step is a step of acquiring the positional information of the holes of the double-sided tape laminated onto the polishing layer 50 in the first lamination step.
 図11において、第2製造装置200は、研磨層50を搬送する搬送機構210と、両面テープが有する孔の位置情報を取得する撮像装置220と、他の層71を送り出すローラ241と、送り出された他の層71に開口を形成する孔形成装置230と、他の層71の孔と研磨層50の両面テープが有する孔とを位置合わせをしつつ、研磨層50と他の層71とを貼り合わせるローラ242と、を備える。 In FIG. 11, the second manufacturing apparatus 200 includes a transport mechanism 210 that transports the polishing layer 50, an imaging device 220 that acquires the positional information of the holes of the double-sided tape, a roller 241 that transports the other layer 71, and a The hole forming device 230 for forming openings in the other layer 71 and the polishing layer 50 and the other layer 71 are aligned while aligning the holes of the other layer 71 with the holes of the double-sided tape of the polishing layer 50 . and a roller 242 for bonding.
 ここで、搬送機構210、撮像装置220、孔形成装置230、及びローラ241,242は、有線又は無線により、これらを制御する第2制御部(不図示)に接続されていてもよい。第2制御部は、パーソナルコンピュータなどの情報処理装置として構成することができる。搬送機構210、撮像装置220、孔形成装置230、及びローラ241,242の駆動制御、及び情報の伝達は、この第2制御部を介して行うことができる。 Here, the conveying mechanism 210, the imaging device 220, the hole forming device 230, and the rollers 241 and 242 may be connected by wire or wirelessly to a second control section (not shown) that controls them. The second control unit can be configured as an information processing device such as a personal computer. Driving control of the conveying mechanism 210, imaging device 220, hole forming device 230, and rollers 241 and 242, and transmission of information can be performed via this second control section.
 研磨層50上に貼り合わされた両面テープが有する孔の位置情報の取得方法は、特に限定されないが、例えば、上記第1取得工程において記載した、撮像装置を用いた方法やレーザー受光機を用いた方法が挙げられる。 The method for acquiring the positional information of the holes of the double-sided tape bonded onto the polishing layer 50 is not particularly limited. method.
1.6.6.第2孔形成工程
 第2孔形成工程は、第2取得工程で取得した位置情報に基づいて、他の層上の終点検出窓の設置位置に相当する部分に、孔を形成する工程である。ここで、他の層はクッション層であってもよいし、クッション層に両面テープが貼り合わせられたものなどであってものよい。
1.6.6. Second Hole Forming Step The second hole forming step is a step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on another layer based on the position information acquired in the second acquiring step. Here, the other layer may be a cushion layer, or may be a cushion layer laminated with double-sided tape.
 具体的には、制御部は、ローラ241を駆動制御して他の層71を送り出すとともに、両面テープが有する孔の位置情報を孔形成装置230に送信し、送り出された他の層71上の両面テープの設置位置に相当する部分に、孔形成装置230によって孔形成を行う。孔形成装置230によって孔形成を行う際には、ローラ241は一時停止してもよい。 Specifically, the control unit drives and controls the roller 241 to send out the other layer 71, and transmits the positional information of the holes of the double-sided tape to the hole forming device 230, and Holes are formed by the hole forming device 230 in portions corresponding to the installation positions of the double-sided tape. The rollers 241 may be paused while the perforations are being performed by the perforator 230 .
1.6.7.第2貼合工程
 第2貼合工程は、両面テープにおける孔と他の層における孔とを位置合わせして、樹脂シート上の両面テープと他の層とを貼り合わせる工程である。貼り合わせ後の他の層は、樹脂シートの大きさに合わせてカットしてもよい。
1.6.7. Second Bonding Step The second bonding step is a step of aligning the holes in the double-sided tape with the holes in the other layer and bonding the double-sided tape on the resin sheet to the other layer. Other layers after bonding may be cut according to the size of the resin sheet.
 具体的には、第2制御部は、ローラ242を駆動制御して、孔形成された粘着シート61をさらに送り出すとともに、搬送機構210を駆動して、研磨層50を矢印F方向にさらに送り出し、両面テープにおける孔と他の層における孔とを位置合わせして、研磨層50の粘着面(粘着シート61)と他の層71とを貼り合わせる。 Specifically, the second control unit drives and controls the roller 242 to further send out the perforated adhesive sheet 61, drives the conveying mechanism 210 to further send out the polishing layer 50 in the direction of arrow F, The adhesive surface (adhesive sheet 61) of the polishing layer 50 and the other layer 71 are bonded together by aligning the holes in the double-sided tape with the holes in the other layer.
 この際においても、他の層71に形成した孔の中心位置の情報と、研磨層50が有する両面テープの孔の中心位置の情報とに基づいて、これらの中心位置が重なるように、搬送機構210とローラ242とを駆動制御してもよい。これにより、他の層71に形成した孔と研磨層50が有する両面テープの孔が同心円状に重なった状態で貼り合わせることができるため、得られる研磨パッドの耐久性をより向上することができる。 Also at this time, based on the information on the center position of the hole formed in the other layer 71 and the information on the center position of the hole of the double-sided tape of the polishing layer 50, the transport mechanism is arranged so that these center positions overlap each other. 210 and roller 242 may be driven and controlled. As a result, the holes formed in the other layer 71 and the holes of the double-sided tape of the polishing layer 50 can be laminated in a state where they overlap concentrically, so that the durability of the resulting polishing pad can be further improved. .
 また、上記のように他の層71が貼り合わされた研磨層50は、この後の工程において円形に打ち抜かれ、研磨パッドとして使用することができる。 In addition, the polishing layer 50 to which the other layer 71 is attached as described above can be punched into a circular shape in the subsequent steps and used as a polishing pad.
2.終点検出窓用部材の製造方法
 窓材は、窓材原料を硬化させて透明な窓材を得る方法であれば、特に限定されない。そのなかでも、より短時間で効率的に気泡を取り除くことを目的とした態様Iと、得られる窓材の物性の均一性の向上を目的とした態様IIについて、以下に記載する。なお、これら態様は、それぞれ組み合わせて用いてもよい。
2. Method for Manufacturing End Point Detection Window Member The window material is not particularly limited as long as it is a method for obtaining a transparent window material by curing a window material raw material. Among them, Mode I for the purpose of removing air bubbles efficiently in a shorter time and Mode II for the purpose of improving the uniformity of physical properties of the resulting window material will be described below. In addition, you may use these aspects in combination, respectively.
2.1.態様I
 態様Iは、調合した窓材原料を入れた容器を100~800rpmで自転させながら、所定の円周上を200~1600rpmで公転させる回転運動工程と、該回転運動後の窓材原料を硬化させて窓材を得る窓材硬化工程と、を有する。
2.1. Aspect I
Aspect I is a rotational movement step in which a container containing the prepared window material is rotated at 100 to 800 rpm while revolving on a predetermined circumference at 200 to 1600 rpm, and the window material after the rotational movement is cured. and a window material curing step of obtaining a window material.
 終点検出窓には光透過性に悪影響を及ぼさないように、無発泡かつ均一に混合されることが望まれる。これは、発泡があると、光の散乱により反射光の減衰が大きくなり研磨終点検出精度や膜厚測定精度が低下するからであり、また、混合が不均一であると、部分的に反応が進む部分が生じ、架橋密度が不均一な終点検出窓が形成されてしまうためである。 It is desirable that the endpoint detection window is non-foaming and evenly mixed so as not to adversely affect the optical transparency. This is because if there is bubbling, the attenuation of the reflected light increases due to light scattering, which lowers the polishing end point detection accuracy and the film thickness measurement accuracy. This is because there is a portion that advances, and an end-point detection window with non-uniform crosslink density is formed.
 これに対して、態様Iにおいては、上記のような回転運動工程を経ることにより、気泡を含まず、かつ、均一に混合された窓材原料を得ることができる。これにより、研磨終点検出精度や膜厚測定精度に優れた終点検出窓を製造することができる。 On the other hand, in Mode I, the window material raw material containing no air bubbles and uniformly mixed can be obtained by going through the rotational movement step as described above. As a result, it is possible to manufacture an endpoint detection window with excellent polishing endpoint detection accuracy and film thickness measurement accuracy.
 また、上記回転運動工程を経ることにより、より短時間で、無発泡かつ均一な混合を達成することができる。これによって、これまでは脱泡等にかかる時間を考慮すると使用できなかったような反応性の速い窓材原料についても、終点検出窓の窓材原料として使用することが可能となる。また、これまでは、反応性が異なるために、反応が遅い成分だけを先に混合させておき、その後反応性の高いものを加える等をすることで、混合を多段階で行っていたような窓材原料についても、窓材原料を同時に調合し、攪拌、脱泡を行うことが可能となる。 In addition, non-foaming and uniform mixing can be achieved in a shorter period of time by going through the rotational movement process. As a result, it becomes possible to use even a highly reactive window material, which could not be used until now in consideration of the time required for defoaming, etc., as the window material for the endpoint detection window. Also, until now, since the reactivity is different, only the slow-reacting components are mixed first, and then the highly reactive components are added. As for the raw material for the window material, it is possible to prepare the raw material for the window material at the same time, and to perform stirring and defoaming.
2.1.1.予熱工程
 終点検出窓用部材の製造方法は、予め窓材原料に含まれる各成分をそれぞれ個別に加熱する予熱工程を有していてもよい。混合を開始すると窓材原料に含まれる各成分が反応し、発熱することがある。そのため、予め窓材原料に含まれる各成分をそれぞれ個別に予熱してから、窓材原料として混合することで回転運動工程において処理温度が安定する傾向にある。これにより脱気がより促進され、混合の均一性がより向上する傾向にある。
2.1.1. Preheating Step The method of manufacturing the endpoint detection window member may include a preheating step of individually heating each component contained in the window material in advance. When mixing is started, each component contained in the raw material for the window material may react and generate heat. Therefore, by individually preheating each component contained in the window material in advance and then mixing them as the window material, the processing temperature tends to be stabilized in the rotation process. This tends to promote degassing and improve mixing uniformity.
 予熱温度は、特に限定されないが、例えば、好ましくは50~130℃であり、より好ましくは60~125℃であり、さらに好ましくは70~120℃である。予熱温度が上記範囲内であることにより、脱気がより促進され、混合の均一性がより向上する傾向にある。 Although the preheating temperature is not particularly limited, for example, it is preferably 50 to 130°C, more preferably 60 to 125°C, and even more preferably 70 to 120°C. When the preheating temperature is within the above range, the degassing is further promoted, and the uniformity of mixing tends to be further improved.
2.1.2.回転運動工程
 回転運動工程は、調合した窓材原料を入れた容器を100~800rpmで自転させながら、所定の円周上を200~1600rpmで公転させる工程である。この回転運動工程を経ることで、攪拌翼での攪拌の必要がなく、攪拌と脱泡を同一行程で行うことができる。これにより、攪拌翼を用いないために余計な気泡が発生しにくく、また、工程の簡略化が行える。
2.1.2. Rotational Motion Step The rotational motion step is a step of revolving on a predetermined circle at 200 to 1600 rpm while rotating the container containing the blended window material raw material at 100 to 800 rpm. By going through this rotary movement process, there is no need for stirring with a stirring blade, and stirring and defoaming can be performed in the same process. As a result, since no stirring blade is used, unnecessary air bubbles are less likely to occur, and the process can be simplified.
 自転速度は、100~800rpmであり、好ましくは200~700rpmであり、より好ましくは300~600rpmである。自転速度が上記範囲内であることにより、混合の均一性がより向上する傾向にある。 The rotation speed is 100-800 rpm, preferably 200-700 rpm, more preferably 300-600 rpm. When the rotation speed is within the above range, the uniformity of mixing tends to be further improved.
 公転速度は、200~1600rpmであり、好ましくは400~1400rpmであり、より好ましくは600~1200rpmである。公転速度が上記範囲内であることにより、脱気がより促進される傾向にある。 The revolution speed is 200-1600 rpm, preferably 400-1400 rpm, more preferably 600-1200 rpm. When the revolution speed is within the above range, degassing tends to be promoted more.
 回転運動工程における自転軸と公転軸の傾きは、好ましくは20~70°であり、より好ましくは30~60°であり、さらに好ましくは35~55°である。傾きが上記範囲内であることにより、容器内の窓材原料に三次元渦流れが生じ、これにより脱気がより促進され、混合の均一性がより向上する傾向にある。 The inclination of the axis of rotation and the axis of revolution in the rotational motion process is preferably 20 to 70°, more preferably 30 to 60°, and even more preferably 35 to 55°. When the inclination is within the above range, a three-dimensional swirling flow is generated in the raw material for the window material in the container, which tends to promote degassing and improve uniformity of mixing.
 回転運動工程は減圧下で行うことが好ましく、より好ましくは0.1~0.9atm以下であり、さらに好ましくは0.2~0.8atm以下である。回転運動工程を減圧下で行うことにより、脱気がより促進される傾向にある。また、回転運動工程を0.1atm以上で行うことにより、成分の意図しない揮発を抑制できる傾向にある。 The rotary motion step is preferably performed under reduced pressure, more preferably 0.1 to 0.9 atm or less, and even more preferably 0.2 to 0.8 atm or less. Degassing tends to be promoted more by performing the rotary movement process under reduced pressure. Further, by performing the rotational movement process at 0.1 atm or more, there is a tendency that unintended volatilization of the components can be suppressed.
 回転運動工程の処理時間は、好ましくは1~10分であり、より好ましくは2~8分であり、さらに好ましくは3~6分である。処理時間が上記範囲より短い場合には、混合が不十分となり均一な窓材原料が得られず、処理時間が上記範囲より長い場合には、混合の均一性は上がるものの、混合された窓材原料の反応が進んで粘度が上がり、容器より窓材原料が取り出し難くなる傾向にある。終点検出窓の表面が研磨面と同一面となる場合、終点検出窓の材料として、硬化時間の短い(反応性の高い)窓材原料でなければ研磨に悪影響を与えてしまう傾向にある。硬化時間の長い窓材原料は摩耗しにくく、作製した終点検出窓を備えた研磨パッドは、研磨中に窓部分が突出してきてしまい、スクラッチ等研磨に悪影響を及ぼす可能性がある。一方、硬化時間の短い窓材原料は適度な硬脆さがあり、研磨層の摩耗と共に終点検出窓も摩耗していくので、終点検出窓のみが突出することを防ぐ。そのため、処理時間が上記範囲内であることが好ましい。 The processing time of the rotational motion step is preferably 1 to 10 minutes, more preferably 2 to 8 minutes, and even more preferably 3 to 6 minutes. If the treatment time is shorter than the above range, mixing will be insufficient and a uniform window material raw material will not be obtained. As the reaction of the raw materials progresses, the viscosity increases, and it tends to be difficult to take out the window material raw materials from the container. When the surface of the endpoint detection window is flush with the polishing surface, polishing is likely to be adversely affected unless the endpoint detection window is made of a window material with a short curing time (high reactivity). A window material having a long hardening time is less likely to be worn, and the produced polishing pad having the end point detection window may have a protruded window portion during polishing, which may adversely affect polishing such as scratches. On the other hand, the window material raw material having a short curing time is moderately hard and brittle, and as the polishing layer wears, the end-point detection window is also worn, preventing the end-point detection window alone from protruding. Therefore, it is preferable that the treatment time is within the above range.
 回転運動工程の温度は、好ましくは50~130℃であり、より好ましくは60~125℃であり、さらに好ましくは70~120℃である。温度が50℃以上であることにより、比較的に粘度が低下して、脱気がより促進される傾向にある。温度が130℃以下であることにより、窓材原料の反応速度が高くなりすぎず、混合の均一性がより向上する傾向にある。 The temperature of the rotational motion step is preferably 50-130°C, more preferably 60-125°C, and even more preferably 70-120°C. When the temperature is 50° C. or higher, the viscosity tends to be relatively low and the degassing tends to be promoted more. When the temperature is 130° C. or lower, the reaction rate of the window material raw materials does not become too high, and the mixing uniformity tends to be further improved.
2.1.3.窓材硬化工程
 窓材硬化工程は、回転運動後の窓材原料を硬化させて窓材を得る工程である。この窓材硬化工程には、特に限定されないが、例えば、研磨層のくりぬいた部分に回転運動後の窓材原料を流しいれそのくりぬいた部分の中で、硬化反応を進行させて窓材を備える研磨層を得る態様;金型内で窓材原料を硬化させて窓材を得る態様が挙げられる。
2.1.3. Window Material Curing Step The window material curing step is a step of obtaining the window material by curing the window material raw material after the rotational movement. This window material curing step is not particularly limited, but for example, the window material is provided by pouring the window material material after rotational movement into the hollowed out portion of the polishing layer and allowing the curing reaction to proceed in the hollowed out portion. A mode of obtaining a polishing layer; and a mode of obtaining a window material by curing a window material raw material in a mold.
 また、金型内で窓材原料を硬化させて窓材を得る態様には、その後、得られた窓材の周りに研磨層を構成する硬化性樹脂を注型し、研磨層を構成する硬化性樹脂を硬化させることで窓材を備える研磨層を得る態様;得られた窓材を必要に応じてスライスして、開口を設けた研磨層にはめ込むことで窓材を備える研磨層を得る態様が含まれていてもよい。 In addition, in the mode of obtaining the window material by curing the window material raw material in the mold, a curable resin that constitutes the polishing layer is then cast around the obtained window material, and cured to constitute the polishing layer. A mode of obtaining a polishing layer provided with a window material by curing a curable resin; a mode of obtaining a polishing layer provided with a window material by slicing the obtained window material as necessary and inserting it into a polishing layer provided with an opening. may be included.
2.1.4.窓材原料
 窓材を得るための窓材原料は、硬化したときに窓として機能し得る透明な部材であれば特に限定されないが、例えば、ポリウレタン樹脂、ポリ塩化ビニル樹脂、ポリフッ化ビニリデン樹脂、ポリエーテルサルホン樹脂、ポリスチレン樹脂、ポリエチレン樹脂、ポリテトラフルオロエチレン樹脂などが挙げられる。このなかでも、ポリウレタン樹脂が好ましい。
2.1.4. Window material raw material The window material raw material for obtaining the window material is not particularly limited as long as it is a transparent member that can function as a window when cured. Ethersulfone resin, polystyrene resin, polyethylene resin, polytetrafluoroethylene resin and the like can be mentioned. Among these, polyurethane resin is preferable.
 窓材原料は、ポリイソシアネート、ポリオール、及び硬化剤を含むものが好ましい。このような窓材原料によりポリウレタン樹脂を合成することができる。 The window material raw material preferably contains polyisocyanate, polyol, and curing agent. A polyurethane resin can be synthesized from such a window material.
2.1.4.1.ポリイソシアネート
 ポリイソシアネートとしては、特に限定されないが、例えば、脂環族ポリイソシアネート、脂肪族ポリイソシアネート、及び芳香族ポリイソシアネートが挙げられる。ポリイソシアネートは、1種単独で用いても、2種以上を併用してもよい。このなかでも、ポリウレタン樹脂は、脂環族イソシアネート及び/又は脂肪族イソシアネートを含むことが好ましい。これにより、透明性がより向上する傾向にある。
2.1.4.1. Polyisocyanate Polyisocyanate is not particularly limited, but includes, for example, alicyclic polyisocyanate, aliphatic polyisocyanate, and aromatic polyisocyanate. Polyisocyanate may be used individually by 1 type, or may use 2 or more types together. Among these, the polyurethane resin preferably contains an alicyclic isocyanate and/or an aliphatic isocyanate. This tends to further improve the transparency.
 脂環族ポリイソシアネートとしては、特に限定されないが、例えば、4,4’-メチレン-ビス(シクロヘキシルイソシアネート)(水添MDI)、シクロヘキシレン-1,2-ジイソシアネート、シクロヘキシレン-1,4-ジイソシアネート、イソホロンジイソシアネートなどが挙げられる。 Although the alicyclic polyisocyanate is not particularly limited, for example, 4,4′-methylene-bis(cyclohexyl isocyanate) (hydrogenated MDI), cyclohexylene-1,2-diisocyanate, cyclohexylene-1,4-diisocyanate , isophorone diisocyanate, and the like.
 脂肪族ポリイソシアネートとしては、特に限定されないが、例えば、ヘキサメチレンジイソシアネート(HDI)、ペンタメチレンジイソシアネート(PDI)、テトラメチレンジイソシアネート、プロピレン-1,2-ジイソシアネート、ブチレン-1,2-ジイソシアネート、トリメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネートなどが挙げられる。 Examples of aliphatic polyisocyanates include, but are not limited to, hexamethylene diisocyanate (HDI), pentamethylene diisocyanate (PDI), tetramethylene diisocyanate, propylene-1,2-diisocyanate, butylene-1,2-diisocyanate, and trimethylene. diisocyanate, trimethylhexamethylene diisocyanate, and the like.
 芳香族ポリイソシアネートとしては、特に限定されないが、例えば、フェニレンジイソシアネート、2,6-トリレンジイソシアネート(2,6-TDI)、2,4-トリレンジイソシアネート(2,4-TDI)、キシリレンジイソシアネート、ナフタレンジイソシアネート、ジフェニルメタン-4,4’-ジイソシアネー卜(MDI)が挙げられる。 Examples of aromatic polyisocyanates include, but are not limited to, phenylene diisocyanate, 2,6-tolylene diisocyanate (2,6-TDI), 2,4-tolylene diisocyanate (2,4-TDI), and xylylene diisocyanate. , naphthalene diisocyanate, and diphenylmethane-4,4′-diisocyanate (MDI).
 ポリイソシアネートが有するイソシアネートの数は、好ましくは2~4であり、より好ましくは2~3であり、さらに好ましくは2である。 The number of isocyanates in the polyisocyanate is preferably 2-4, more preferably 2-3, and still more preferably 2.
2.1.4.2.高分子量ポリオール
 本明細書において、高分子量ポリオールは分子量300以上のポリオールである。このような高分子量ポリオールとしては、特に限定されないが、例えば、ポリエーテルポリオール、ポリエステルポリオール、ポリカーボネートポリオール、ポリエーテルポリカーボネートポリオール、ポリウレタンポリオール、エポキシポリオール、植物油ポリオール、ポリオレフィンポリオール、アクリルポリオール、および、ビニルモノマー変性ポリオールが挙げられる。高分子量ポリオールは1種単独で用いても、2種以上を併用してもよい。
2.1.4.2. High Molecular Weight Polyol As used herein, a high molecular weight polyol is a polyol having a molecular weight of 300 or higher. Examples of such high-molecular-weight polyols include, but are not limited to, polyether polyols, polyester polyols, polycarbonate polyols, polyether polycarbonate polyols, polyurethane polyols, epoxy polyols, vegetable oil polyols, polyolefin polyols, acrylic polyols, and vinyl monomers. modified polyols; The high-molecular-weight polyols may be used singly or in combination of two or more.
 このなかでも、ポリエーテルポリオールが好ましく、ポリテトラメチレンエーテルグリコールがより好ましい。このような高分子量ポリオールを用いることにより、透明性がより向上する傾向にある。 Among these, polyether polyol is preferred, and polytetramethylene ether glycol is more preferred. Use of such a high-molecular-weight polyol tends to further improve transparency.
 ポリオールが有する水酸基の数は、好ましくは2~4であり、より好ましくは2~3であり、さらに好ましくは2である。 The number of hydroxyl groups possessed by the polyol is preferably 2-4, more preferably 2-3, still more preferably 2.
 窓材原料中のポリエーテルポリオールの含有量は、ポリオールの総量に対して、好ましくは10~60mol%であり、より好ましくは20~50mol%である。ポリエーテルポリオールの含有量が上記範囲内であることにより、透明性がより向上する傾向にある。 The content of polyether polyol in the window material raw material is preferably 10 to 60 mol%, more preferably 20 to 50 mol%, relative to the total amount of polyol. When the polyether polyol content is within the above range, the transparency tends to be further improved.
2.1.4.3.硬化剤
 硬化剤としては、特に限定されないが、例えば、分子量300未満の低分子量ポリオールやポリアミンが挙げられる。
2.1.4.3. Curing Agent Although the curing agent is not particularly limited, examples thereof include low-molecular-weight polyols and polyamines having a molecular weight of less than 300.
 低分子量ポリオールとしては、特に限定されないが、例えば、エチレングリコール、プロピレングリコール、ジエチレングリコール、トリエチレングリコール、1,2-ブチレングリコール、1,3-ブチレングリコール、2,3-ブチレングリコール、1,4-ブチレングリコール、1,5-ペンタンジオール、ネオペンチルグリコール、1,6-ヘキサングリコール、2,5-ヘキサンジオール、ジプロピレングリコール、2,2,4-トリメチル-1,3-ペンタンジオール、トリシクロデカンジメタノール、1,4-シクロヘキサンジメタノール等の水酸基を2つ有する低分子量ポリオール;グリセリン、ヘキサントリオール、トリメチロールプロパン、イソシアヌル酸、エリスリトール等の水酸基を3つ以上有する低分子量ポリオールが挙げられる。低分子量ポリオールは1種単独で用いても、2種以上を併用してもよい。 Examples of low-molecular-weight polyols include, but are not limited to, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, 1,2-butylene glycol, 1,3-butylene glycol, 2,3-butylene glycol, 1,4- butylene glycol, 1,5-pentanediol, neopentyl glycol, 1,6-hexane glycol, 2,5-hexanediol, dipropylene glycol, 2,2,4-trimethyl-1,3-pentanediol, tricyclode low molecular weight polyols having two hydroxyl groups such as candimethanol and 1,4-cyclohexanedimethanol; and low molecular weight polyols having three or more hydroxyl groups such as glycerin, hexanetriol, trimethylolpropane, isocyanuric acid and erythritol. Low-molecular-weight polyols may be used singly or in combination of two or more.
 このなかでも、水酸基を3つ以上有する低分子量ポリオールが好ましく、グリセリンがより好ましい。このような低分子量ポリオールを用いることにより、透明性がより向上する傾向にある。 Among these, low-molecular-weight polyols having 3 or more hydroxyl groups are preferred, and glycerin is more preferred. Use of such a low-molecular-weight polyol tends to further improve transparency.
 また、ポリアミンとしては、特に限定されないが、例えば、エチレンジアミン、プロピレンジアミン、ヘキサメチレンジアミンなどの脂肪族ポリアミン;、イソホロンジアミン、ジシクロヘキシルメタン-4,4’-ジアミンなどの脂環族ポリアミン;3,3’-ジクロロ-4,4’-ジアミノジフェニルメタン(MOCA)、4-メチル-2,6-ビス(メチルチオ)-1,3-ベンゼンジアミン、2-メチル-4,6-ビス(メチルチオ)-1,3-ベンゼンジアミン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)プロパンなどの芳香族ポリアミンなどが挙げられる。 The polyamine is not particularly limited, but for example, aliphatic polyamines such as ethylenediamine, propylenediamine and hexamethylenediamine; alicyclic polyamines such as isophoronediamine and dicyclohexylmethane-4,4'-diamine; '-dichloro-4,4'-diaminodiphenylmethane (MOCA), 4-methyl-2,6-bis(methylthio)-1,3-benzenediamine, 2-methyl-4,6-bis(methylthio)-1, aromatic polyamines such as 3-benzenediamine and 2,2-bis(3-amino-4-hydroxyphenyl)propane;
 このなかでも、芳香族ポリアミンが好ましく、3’-ジクロロ-4,4’-ジアミノジフェニルメタン(MOCA)を用いることがより好ましい。 Among these, aromatic polyamines are preferred, and 3'-dichloro-4,4'-diaminodiphenylmethane (MOCA) is more preferred.
 窓材原料中の硬化剤の含有量は、ポリオール及び硬化剤の総量に対して、好ましくは40~90mol%であり、より好ましくは50~80mol%であり、さらに好ましくは60~70mol%である。硬化剤の含有量が上記範囲内であることにより、終点検出窓に適した硬度、又は耐久性が得られる傾向にある。 The content of the curing agent in the window material raw material is preferably 40 to 90 mol%, more preferably 50 to 80 mol%, still more preferably 60 to 70 mol%, relative to the total amount of the polyol and the curing agent. . When the content of the curing agent is within the above range, hardness or durability suitable for the endpoint detection window tends to be obtained.
2.2.態様II
 態様IIの窓材の製造方法は、ポリイソシアネートとポリオールと硬化剤の一部とを混合し、第1の反応混合物を調製する第1混合工程と、第1の反応混合物と硬化剤の残部とを混合し、第2の反応混合物を調製する第2混合工程と、第2の反応混合物を硬化して、窓材を得る窓材硬化工程と、を含み、硬化剤が3以上の官能基を有する。
2.2. Aspect II
The method for producing a window material of Embodiment II includes a first mixing step of mixing a polyisocyanate, a polyol, and a portion of a curing agent to prepare a first reaction mixture; and a window material curing step of curing the second reaction mixture to obtain a window material, wherein the curing agent has three or more functional groups have.
 全ての窓材原料を同時に投入して反応させるワンショット法では、反応性の高い成分から先に重合反応が進行するために、ミクロな視点で見たときに、架橋が密となった部分と、架橋が疎となった部分が生じやすく、得られる窓材の物性にばらつきが生じ得る。このような物性のばらつきが生じると、スライス時に終点検出窓の表面形状が安定し難かったり、また、研磨性能が不安定になったり、終点検出精度にばらつきが生じたりする可能性がある。 In the one-shot method, in which all of the window material raw materials are put in at the same time and reacted, the polymerization reaction progresses from the most reactive component first, so when viewed from a microscopic point of view, the cross-linked portion becomes dense. , a portion where cross-linking is sparse is likely to occur, and physical properties of the obtained window material may vary. Such variations in physical properties may make it difficult to stabilize the surface shape of the end-point detection window during slicing, destabilize polishing performance, and cause variations in end-point detection accuracy.
 また、プレポリマー法では、硬化剤とプレポリマーの間で反応が進行しているため、ワンショット法に比べて反応が制御しやすく、安定した物性の窓材が得られるという利点があるものの、予めポリオールと過剰量のポリイソシアネートを反応させることによりプレポリマーを作製してから一度取り出して、プレポリマーを作製した容器とは別の容器でプレポリマーと鎖延長剤(硬化剤)と混合することとなるため、ワンショット法に比べて、作業面で煩雑になるという問題点がある。 In addition, in the prepolymer method, since the reaction is progressing between the curing agent and the prepolymer, compared to the one-shot method, the reaction is easier to control, and there is an advantage that a window material with stable physical properties can be obtained. A prepolymer is prepared by reacting a polyol with an excess amount of polyisocyanate in advance, then taken out and mixed with a prepolymer and a chain extender (curing agent) in a container separate from the container in which the prepolymer was prepared. Therefore, compared with the one-shot method, there is a problem that the work becomes more complicated.
 これに対して、態様IIにおいては、第1混合工程において、ポリイソシアネートとポリオールと硬化剤の一部とを混合することで、疑似プレポリマーを合成し、第2混合工程において、残りの硬化剤を添加し、疑似プレポリマーの鎖延長化を進行させる。これにより、第2混合工程における反応は硬化剤と疑似プレポリマーとなるため、プレポリマー法と同様に、窓材の物性が安定しやすくなる。また、第1混合工程と第2混合工程とをワンバッチで実行することで、第1混合工程後に疑似プレポリマーを取り出すことなく、鎖延長剤(硬化剤)を添加するだけで第2混合工程の反応を進行させることができる。そのため、プレポリマー法における作業面の煩雑さを省くことができ、均一な物性を有する窓材をより簡便に得ることが可能となる。 In contrast, in mode II, in the first mixing step, the polyisocyanate, the polyol, and a portion of the curing agent are mixed to synthesize a pseudo-prepolymer, and in the second mixing step, the remaining curing agent is added to allow chain extension of the quasi-prepolymer to proceed. As a result, the curing agent and the pseudo-prepolymer are reacted in the second mixing step, so that the physical properties of the window material can be easily stabilized in the same manner as in the prepolymer method. Further, by performing the first mixing step and the second mixing step in one batch, the second mixing step can be started only by adding a chain extender (curing agent) without taking out the pseudo prepolymer after the first mixing step. Allow the reaction to proceed. Therefore, the complexity of the work surface in the prepolymer method can be omitted, and a window material having uniform physical properties can be obtained more easily.
2.2.1.第1混合工程
 第1混合工程は、ポリイソシアネートとポリオールと硬化剤の一部とを混合し、第1の反応混合物を調製する工程である。混合方法は従来公知の方法で混合するものであれば、特に限定されないが、自転公転式混合機を用いて混合することが好ましい。また、混合は減圧下及び/又は遠心力を印加した状態で行うことが好ましい。これにより、混合の際に生じた気泡が除かれやすくなり、得られる窓材に気泡が混入することが抑制できる。
2.2.1. First Mixing Step The first mixing step is the step of mixing the polyisocyanate, the polyol, and a portion of the curing agent to form a first reaction mixture. The mixing method is not particularly limited as long as it is mixed by a conventionally known method, but it is preferable to mix using a rotation-revolution mixer. Moreover, mixing is preferably performed under reduced pressure and/or with centrifugal force applied. As a result, air bubbles generated during mixing can be easily removed, and air bubbles can be prevented from entering the obtained window material.
 この第1混合工程により得られる第1の反応混合物(疑似プレポリマー)は、硬化剤の1以上の官能基とポリイソシアネートのイソシアネート基とが反応した化合物、ポリオールの1以上の水酸基とポリイソシアネートのイソシアネート基とが反応した化合物、或いはこれら化合物が有するイソシアネート基にさらに硬化剤の官能基又はポリオールの水酸基が反応した化合物などを含みうる。 The first reaction mixture (pseudo-prepolymer) obtained by this first mixing step is a compound obtained by reacting one or more functional groups of the curing agent with the isocyanate groups of the polyisocyanate, one or more hydroxyl groups of the polyol and the polyisocyanate. Compounds reacted with isocyanate groups, or compounds obtained by further reacting isocyanate groups of these compounds with functional groups of curing agents or hydroxyl groups of polyols may be included.
 このようにして得られる第1の反応混合物は硬化剤が不足した状態であるため、各化合物の末端はどちらかというとイソシアネート基を有するものとなり、これがプレポリマー法におけるプレポリマーに近いものとなる。より具体的に言えば、プレポリマー法では、ポリオールの水酸基とポリイソシアネートのイソシアネート基とが反応した化合物をプレポリマーとして生成させるのに対して、態様IIの疑似プレポリマー法では、硬化剤の1以上の官能基とポリイソシアネートのイソシアネート基とが反応した化合物、ポリオールの1以上の水酸基とポリイソシアネートのイソシアネート基とが反応した化合物、或いはこれら化合物が有するイソシアネート基にさらに硬化剤の官能基又はポリオールの水酸基が反応した化合物などが生じる。このような状態の化合物(群)を態様IIでは疑似プレポリマーと呼称する。 Since the first reaction mixture obtained in this manner lacks the curing agent, the terminal of each compound rather has an isocyanate group, which is close to the prepolymer in the prepolymer method. . More specifically, in the prepolymer method, a compound obtained by reacting the hydroxyl groups of the polyol with the isocyanate groups of the polyisocyanate is produced as a prepolymer, whereas in the quasi-prepolymer method of Mode II, one of the curing agents Compounds obtained by reacting the above functional groups with isocyanate groups of polyisocyanate, compounds obtained by reacting one or more hydroxyl groups of polyol with isocyanate groups of polyisocyanate, or isocyanate groups possessed by these compounds, and further functional groups of curing agents or polyols. A compound etc. is produced by reaction of the hydroxyl group of Compounds in this state are referred to as quasi-prepolymers in Embodiment II.
 第1混合工程における混合温度は、好ましくは40~80℃であり、より好ましくは40~70℃であり、さらに好ましくは40~60℃である。また、第1混合工程における混合時間は、好ましくは5~30分であり、より好ましくは7~25分であり、さらに好ましくは10~20分である。上記のような条件で混合を行うことにより、各成分の反応率を制御することができ、得られる窓材の物性がより均一になる傾向にある。 The mixing temperature in the first mixing step is preferably 40-80°C, more preferably 40-70°C, still more preferably 40-60°C. Also, the mixing time in the first mixing step is preferably 5 to 30 minutes, more preferably 7 to 25 minutes, still more preferably 10 to 20 minutes. By performing mixing under the above conditions, the reaction rate of each component can be controlled, and the resulting window material tends to have more uniform physical properties.
2.2.1.1.ポリイソシアネート
 ポリイソシアネートとしては、特に限定されないが、例えば、脂環族ポリイソシアネート、脂肪族ポリイソシアネート、及び芳香族ポリイソシアネートが挙げられる。ポリイソシアネートは、1種単独で用いても、2種以上を併用してもよい。このなかでも、脂環族ポリイソシアネート及び/又は脂肪族ポリイソシアネートを含むことが好ましく、脂環族ポリイソシアネートを含むことがより好ましい。これにより、動的粘弾性特性、D硬度を上記範囲内に調整しやすいほか、透明性がより向上する傾向にある。
2.2.1.1. Polyisocyanate Polyisocyanate is not particularly limited, but includes, for example, alicyclic polyisocyanate, aliphatic polyisocyanate, and aromatic polyisocyanate. Polyisocyanate may be used individually by 1 type, or may use 2 or more types together. Among these, it preferably contains alicyclic polyisocyanate and/or aliphatic polyisocyanate, and more preferably contains alicyclic polyisocyanate. As a result, the dynamic viscoelastic properties and the D hardness can be easily adjusted within the above range, and the transparency tends to be further improved.
 脂環族ポリイソシアネート、脂肪族ポリイソシアネート、及び芳香族ポリイソシアネートとしては、上記態様Iで例示したものを挙げることができる。 Examples of the alicyclic polyisocyanate, aliphatic polyisocyanate, and aromatic polyisocyanate include those exemplified in Mode I above.
2.2.1.2.低分子量ジオール及び高分子量ポリオール
 本明細書において、低分子量ジオールは分子量300未満のジオールである。また、本明細書において、高分子量ポリオールは分子量300以上のポリオールである。低分子量ジオール及び高分子量ポリオールは、それぞれ、1種単独で用いても、2種以上を併用してもよい。このなかでも、高分子量ポリオールを含むことが好ましい。それにより、得られる窓材の物性がより均一になる傾向にある。
2.2.1.2. Low Molecular Weight Diols and High Molecular Weight Polyols As used herein, low molecular weight diols are diols with a molecular weight of less than 300. Moreover, in this specification, a high molecular weight polyol is a polyol having a molecular weight of 300 or more. Each of the low-molecular-weight diol and the high-molecular-weight polyol may be used alone or in combination of two or more. Among these, it is preferable to contain a high-molecular-weight polyol. As a result, the physical properties of the resulting window material tend to be more uniform.
 低分子量ジオールとしては、特に限定されないが、例えば、エチレングリコール、プロピレングリコール、ジエチレングリコール、トリエチレングリコール、1,2-ブチレングリコール、1,3-ブチレングリコール、2,3-ブチレングリコール、1,4-ブチレングリコール、1,5-ペンタンジオール、ネオペンチルグリコール、1,6-ヘキサングリコール、2,5-ヘキサンジオール、ジプロピレングリコール、2,2,4-トリメチル-1,3-ペンタンジオール、トリシクロデカンジメタノール、1,4-シクロヘキサンジメタノール等が挙げられる。 Examples of low-molecular-weight diols include, but are not limited to, ethylene glycol, propylene glycol, diethylene glycol, triethylene glycol, 1,2-butylene glycol, 1,3-butylene glycol, 2,3-butylene glycol, 1,4- butylene glycol, 1,5-pentanediol, neopentyl glycol, 1,6-hexane glycol, 2,5-hexanediol, dipropylene glycol, 2,2,4-trimethyl-1,3-pentanediol, tricyclode Kandimethanol, 1,4-cyclohexanedimethanol and the like can be mentioned.
 高分子量ポリオールとしては、上記態様Iで例示したものを挙げることができる。このなかでも、ポリエーテルポリオールを含むことが好ましい。それにより、得られる窓材の物性がより均一になる傾向にある。 Examples of high-molecular-weight polyols include those exemplified in Mode I above. Among these, it is preferable to contain a polyether polyol. As a result, the physical properties of the resulting window material tend to be more uniform.
 ポリオールが有する水酸基の数は、好ましくは2~4であり、より好ましくは2~3であり、さらに好ましくは2である。 The number of hydroxyl groups possessed by the polyol is preferably 2-4, more preferably 2-3, still more preferably 2.
 以下のように、ポリイソシアネートのイソシアネート基量とポリオールの水酸基量とを定義する。当該定義におけるポリオールの水酸基量は、ポリイソシアネートのイソシアネート基量に対して、好ましくは0.20~0.50であり、より好ましくは0.25~0.40であり、さらに好ましくは0.30~0.35である。 The amount of isocyanate groups in polyisocyanate and the amount of hydroxyl groups in polyol are defined as follows. The hydroxyl group content of the polyol in this definition is preferably 0.20 to 0.50, more preferably 0.25 to 0.40, and still more preferably 0.30, relative to the isocyanate group content of the polyisocyanate. ~0.35.
 ポリイソシアネートのイソシアネート基量=ポリイソシアネート1分子当たりのイソシアネート基数×ポリイソシアネートの質量部/ポリイソシアネートの分子量・・・(1)
 ポリオールの水酸基量=ポリオール1分子当たりの水酸基数×ポリオールの質量部/ポリオールの分子量・・・(2)
Isocyanate group weight of polyisocyanate = number of isocyanate groups per molecule of polyisocyanate x parts by mass of polyisocyanate/molecular weight of polyisocyanate (1)
Hydroxyl group content of polyol = number of hydroxyl groups per polyol molecule x parts by mass of polyol/molecular weight of polyol (2)
2.2.1.3.硬化剤
 態様Iにおける硬化剤と態様IIにおける硬化剤とは、一部重複する。
2.2.1.3. Curing Agent The curing agent in Embodiment I and the curing agent in Embodiment II partially overlap.
 態様IIにおける硬化剤は、1分子中に3以上の官能基を有する。官能基としては、特に限定されないが、例えば、水酸基、1級アミノ基などが挙げられる。なお、「硬化剤が3以上の官能基を有する」とは、水酸基と1級アミノ基等の合計が3つ以上であってもよい。硬化剤は、ポリイソシアネートと反応することにより、架橋点を構成する。 The curing agent in Mode II has 3 or more functional groups in one molecule. Examples of functional groups include, but are not limited to, hydroxyl groups and primary amino groups. In addition, "the curing agent has 3 or more functional groups" may mean that the total number of hydroxyl groups and primary amino groups is 3 or more. The curing agent forms cross-linking points by reacting with the polyisocyanate.
 そのような硬化剤としては、特に限定されないが、例えば、3以上の官能基を有するポリアミンやポリオールが挙げられる。硬化剤は、1種単独で用いても、2種以上を併用してもよい。 Examples of such curing agents include, but are not limited to, polyamines and polyols having 3 or more functional groups. Curing agents may be used singly or in combination of two or more.
 ポリアミンとしては、3以上のアミノ基を有する物質であれば、特に限定されないが、例えば、3官能のトリアミン化合物、4官能以上のポリアミン化合物等が挙げられる。 The polyamine is not particularly limited as long as it is a substance having 3 or more amino groups, and examples thereof include a trifunctional triamine compound, a tetrafunctional or higher polyamine compound, and the like.
 水酸基を3以上有するポリオールとしては、特に限定されないが、例えば、低分子量ポリオールが好ましく、グリセリンがより好ましい。そのような低分子量ポリオールとしては、特に限定されないが例えば、グリセリンの他、ヘキサントリオール、トリメチロールプロパン、イソシアヌル酸、エリスリトール等が挙げられる。この様な硬化剤を用いることにより、第1の反応混合物の凝集を制御することができ、製造作業面で簡易な製造方法を用いつつ、窓材の物性を安定させることができる。 Although the polyol having 3 or more hydroxyl groups is not particularly limited, for example, a low-molecular-weight polyol is preferable, and glycerin is more preferable. Examples of such low-molecular-weight polyols include, but are not limited to, glycerin, hexanetriol, trimethylolpropane, isocyanuric acid, erythritol, and the like. By using such a curing agent, aggregation of the first reaction mixture can be controlled, and the physical properties of the window material can be stabilized while using a simple production method in terms of production work.
 第1混合工程においては、第1混合工程及び第2混合工程で用いる硬化剤の全使用量のうち一部を用いる。第1混合工程における硬化剤の使用量としては、好ましくは第1混合工程における硬化剤の使用量aと、第2混合工程における硬化剤の使用量bとの合計を100質量%としたときに、使用量aは、10~90質量%であり、より好ましくは20~80質量%であり、さらに好ましくは30~70質量%であり、よりさらに好ましくは40~60質量%である。使用量aが上記範囲内にあることにより、得られる窓材の物性がより均一になる傾向にある。 In the first mixing step, part of the total amount of curing agent used in the first mixing step and the second mixing step is used. The amount of the curing agent used in the first mixing step is preferably when the sum of the amount a of the curing agent used in the first mixing step and the amount b of the curing agent used in the second mixing step is 100% by mass. , the amount a used is 10 to 90% by mass, more preferably 20 to 80% by mass, still more preferably 30 to 70% by mass, and even more preferably 40 to 60% by mass. When the amount a used is within the above range, the resulting window material tends to have more uniform physical properties.
 硬化剤が有する官能基の数は、好ましくは3~5であり、より好ましくは3~4であり、さらに好ましくは3である。硬化剤の分子量は、好ましくは500未満であり、より好ましくは、300未満であり、さらに好ましくは100未満である。 The number of functional groups possessed by the curing agent is preferably 3-5, more preferably 3-4, still more preferably 3. The molecular weight of the curing agent is preferably less than 500, more preferably less than 300, even more preferably less than 100.
 以下のように、ポリイソシアネートのイソシアネート基量と硬化剤の官能基量とを定義した時、第1混合工程において使用する硬化剤の官能基量は、ポリイソシアネートのイソシアネート基量に対して、好ましくは0.20~0.50であり、より好ましくは0.25~0.40であり、さらに好ましくは0.30~0.35である。 When the isocyanate group amount of the polyisocyanate and the functional group amount of the curing agent are defined as follows, the functional group amount of the curing agent used in the first mixing step is preferably relative to the isocyanate group amount of the polyisocyanate. is 0.20 to 0.50, more preferably 0.25 to 0.40, still more preferably 0.30 to 0.35.
 ポリイソシアネートのイソシアネート基量=ポリイソシアネート1分子当たりのイソシアネート基数×ポリイソシアネートの質量部/ポリイソシアネートの分子量・・・(1)
 硬化剤の官能基量=硬化剤1分子当たりの官能基数×硬化剤の質量部/硬化剤の分子量・・・(3)
Isocyanate group weight of polyisocyanate = number of isocyanate groups per molecule of polyisocyanate x parts by mass of polyisocyanate/molecular weight of polyisocyanate (1)
Amount of functional groups in curing agent=number of functional groups per molecule of curing agent×parts by mass of curing agent/molecular weight of curing agent (3)
 また、上記のようにポリイソシアネートのイソシアネート基量と硬化剤の官能基量とを定義した時、第1混合工程及び第2混合工程において使用する硬化剤の官能基量は、ポリイソシアネートのイソシアネート基量に対して、好ましくは0.40~1.0であり、より好ましくは0.50~0.80であり、さらに好ましくは0.60~0.70である。 Further, when the isocyanate group amount of the polyisocyanate and the functional group amount of the curing agent are defined as described above, the functional group amount of the curing agent used in the first mixing step and the second mixing step is the same as the isocyanate group amount of the polyisocyanate. The amount is preferably 0.40 to 1.0, more preferably 0.50 to 0.80, still more preferably 0.60 to 0.70.
2.2.2.第2混合工程
 第2混合工程は、第1の反応混合物と硬化剤の残部とを混合し、第2の反応混合物を調製する工程である。混合方法は従来公知の方法で混合するものであれば、特に限定されないが、自転公転式混合機を用いて混合することが好ましい。また、混合は減圧下及び/又は遠心力を印加した状態で行うことが好ましい。これにより、混合の際に生じた気泡が除かれやすくなり、得られる窓材に気泡が混入することが抑制できる。
2.2.2. Second Mixing Step The second mixing step is the step of mixing the first reaction mixture with the remainder of the curing agent to form a second reaction mixture. The mixing method is not particularly limited as long as it is mixed by a conventionally known method, but it is preferable to mix using a rotation-revolution mixer. Moreover, mixing is preferably performed under reduced pressure and/or with centrifugal force applied. As a result, air bubbles generated during mixing can be easily removed, and air bubbles can be prevented from entering the obtained window material.
 この第2混合工程により、第1混合工程にて生成した疑似プレポリマーの有するイソシアネート基と、新たに添加された残りの硬化剤の有する官能基との反応が進行する。これによって、ワンショット法と比較して反応が制御された形で重合反応を進行することができ、物性がより均一なポリウレタンを生成させることができる。なお、この反応の際には、疑似プレポリマーの有する水酸基などの官能基と、疑似プレポリマーの有するイソシアネート基との反応が進行してもよい。 Through this second mixing step, the reaction between the isocyanate groups of the pseudo-prepolymer produced in the first mixing step and the functional groups of the newly added remaining curing agent proceeds. As a result, the polymerization reaction can proceed in a controlled manner as compared with the one-shot method, and a polyurethane having more uniform physical properties can be produced. During this reaction, a reaction between a functional group such as a hydroxyl group of the pseudo-prepolymer and an isocyanate group of the pseudo-prepolymer may proceed.
 第2混合工程における混合温度は、好ましくは40~80℃であり、より好ましくは40~70℃であり、さらに好ましくは40~60℃である。また、第2混合工程における混合時間は、好ましくは10秒~5分であり、より好ましくは30秒~4分であり、さらに好ましくは60秒~3分である。上記のような条件で混合を行うことにより、各成分の反応率を制御することができ、得られる窓材の物性がより均一になる傾向にある。 The mixing temperature in the second mixing step is preferably 40-80°C, more preferably 40-70°C, still more preferably 40-60°C. Further, the mixing time in the second mixing step is preferably 10 seconds to 5 minutes, more preferably 30 seconds to 4 minutes, still more preferably 60 seconds to 3 minutes. By performing mixing under the above conditions, the reaction rate of each component can be controlled, and the resulting window material tends to have more uniform physical properties.
2.2.2.1.硬化剤
 硬化剤は、第1混合工程で用いた硬化剤と同種のものを用いてもよく、異なるものを用いてもよいが、同種のものを用いることが好ましい。これにより、製造作業面で簡易な製造方法を用いつつ、得られる窓材の物性をより均一にすることができる。
2.2.2.1. Curing Agent The curing agent may be the same type as the curing agent used in the first mixing step, or may be different, but it is preferable to use the same type of curing agent. This makes it possible to make the physical properties of the obtained window material more uniform while using a simple manufacturing method in terms of manufacturing work.
 上記のように、ポリイソシアネートのイソシアネート基量と硬化剤の官能基量とを定義した時、第2混合工程において使用する硬化剤の官能基量は、ポリイソシアネートのイソシアネート基量に対して、好ましくは0.20~0.50であり、より好ましくは0.25~0.40であり、さらに好ましくは0.30~0.35である。 As described above, when the isocyanate group amount of the polyisocyanate and the functional group amount of the curing agent are defined, the functional group amount of the curing agent used in the second mixing step is preferably relative to the isocyanate group amount of the polyisocyanate. is 0.20 to 0.50, more preferably 0.25 to 0.40, still more preferably 0.30 to 0.35.
2.2.3.窓材硬化工程
 窓材硬化工程は、第2の反応混合物の攪拌後の窓材原料を硬化させて窓材を得る工程である。この窓材硬化工程には、特に限定されないが、例えば、研磨層のくりぬいた部分に回転運動後の窓材原料を流しいれそのくりぬいた部分の中で、硬化反応を進行させて窓材を備える研磨層を得る態様;金型内で窓材原料を硬化させて窓材を得る態様が挙げられる。
2.2.3. Window Material Curing Step The window material curing step is a step of obtaining a window material by curing the window material raw material after stirring the second reaction mixture. This window material curing step is not particularly limited, but for example, the window material is provided by pouring the window material material after rotational movement into the hollowed out portion of the polishing layer and allowing the curing reaction to proceed in the hollowed out portion. A mode of obtaining a polishing layer; and a mode of obtaining a window material by curing a window material raw material in a mold.
 窓材硬化工程は、プレキュアとポストキュアの多段階で行ってもよい。 The window material curing process may be performed in multiple stages of pre-curing and post-curing.
 プレキュアにおける硬化温度は、好ましくは70~170℃であり、より好ましくは90~150℃であり、さらに好ましくは110~130℃である。また、プレキュアにおける硬化時間は、好ましくは5~180分であり、より好ましくは10~120分であり、さらに好ましくは15~60分である。 The curing temperature in precuring is preferably 70 to 170°C, more preferably 90 to 150°C, still more preferably 110 to 130°C. The curing time in precuring is preferably 5 to 180 minutes, more preferably 10 to 120 minutes, still more preferably 15 to 60 minutes.
 ポストキュアにおける硬化温度は、好ましくは70~170℃であり、より好ましくは90~150℃であり、さらに好ましくは110~130℃である。また、ポストキュアにおける硬化時間は、好ましくは1~18時間であり、より好ましくは2~12時間であり、さらに好ましくは4~8時間である。 The curing temperature in post curing is preferably 70 to 170°C, more preferably 90 to 150°C, still more preferably 110 to 130°C. The curing time in post-curing is preferably 1 to 18 hours, more preferably 2 to 12 hours, still more preferably 4 to 8 hours.
3.研磨パッド
 本実施形態の研磨パッドは、研磨層、及び該研磨層の開口に設けられた終点検出窓と、を有する。図8に、本実施形態の研磨パッドの概略斜視図を示す。図8に示すように、本実施形態の研磨パッド1は、研磨層50と、終点検出窓51と、を有し、必要に応じて、研磨面50aとは反対側に、クッション層52を有していてもよい。
3. Polishing Pad The polishing pad of the present embodiment has a polishing layer and an endpoint detection window provided in the opening of the polishing layer. FIG. 8 shows a schematic perspective view of the polishing pad of this embodiment. As shown in FIG. 8, the polishing pad 1 of this embodiment has a polishing layer 50 and an end point detection window 51, and optionally a cushion layer 52 on the side opposite to the polishing surface 50a. You may have
 図9に、図8における終点検出窓51の周辺の断面図を示す。図9に示すように、研磨層50とクッション層52の間には、接着層53が設けられていてもよく、また、クッション層52の表面には、研磨装置のテーブルと貼り合わせるための接着層54が設けられていてもよい。 FIG. 9 shows a cross-sectional view around the end point detection window 51 in FIG. As shown in FIG. 9, an adhesive layer 53 may be provided between the polishing layer 50 and the cushion layer 52, and an adhesive layer 53 may be provided on the surface of the cushion layer 52 for attachment to the table of the polishing apparatus. A layer 54 may be provided.
 本実施形態の研磨パッドの研磨面50aは、平坦の場合の他、図9に示すように、溝55が形成された凹凸状であってもよい。溝55は複数の同心円状、格子状、放射状等の様々な形状の溝を単独又は併用して形成してもよい。 The polishing surface 50a of the polishing pad of the present embodiment may be flat or uneven with grooves 55 formed therein, as shown in FIG. The grooves 55 may be formed with a plurality of grooves having various shapes such as concentric circles, grids, and radial grooves singly or in combination.
3.1.終点検出窓
 終点検出窓としては、本明細書に開示された製造方法により作製したものを用いてもよい。終点検出窓は、研磨層の開口に設けられた透明な部材であり、光学式の終点検出において、膜厚検出センサからの光の透過路となるものである。本実施形態において、終点検出窓は円形であるが、必要に応じて、終点検出窓は円形、正方形、長方形、多角形、楕円形等のいずれの形状としてもよい。
3.1. Endpoint Detection Window The endpoint detection window may be produced by the manufacturing method disclosed herein. The endpoint detection window is a transparent member provided in the opening of the polishing layer, and serves as a transmission path for light from the film thickness detection sensor in optical endpoint detection. In this embodiment, the endpoint detection window is circular, but the endpoint detection window may be circular, square, rectangular, polygonal, elliptical, or any other shape, if desired.
 なお、本実施形態の終点検出窓は、ポリイソシアネートと、高分子量ポリオールと、3以上の水酸基を有する低分子量ポリオールを構成単位に有することが好ましい。 It should be noted that the endpoint detection window of the present embodiment preferably has polyisocyanate, high-molecular-weight polyol, and low-molecular-weight polyol having 3 or more hydroxyl groups as structural units.
 また、終点検出窓の中心部及び両端部(上端部及び下端部)の20℃~80℃におけるD硬度(DW20~DW80)の標準偏差は、好ましくは1.5以下であり、より好ましくは0.2~1.4であり、さらに好ましくは0.3~1.2であり、よりさらに好ましくは0.4~1.0である。 In addition, the standard deviation of the D hardness (D W20 to D W80 ) at 20° C. to 80° C. at the center and both ends (upper end and lower end) of the endpoint detection window is preferably 1.5 or less, more preferably. is 0.2 to 1.4, more preferably 0.3 to 1.2, still more preferably 0.4 to 1.0.
3.2.研磨層
 本実施形態の研磨層としては、特に限定されないが、例えば、ポリウレタンシートを用いることができる。このポリウレタンシートは終点検出窓が埋設される開口を有する。開口の位置は特に制限されないが、研磨装置のテーブルに設置された膜厚検出センサに対応する半径方向の位置に設けることが好ましい。また、開口の数は特に制限されないが、テーブルに貼られた研磨パッドが一回転する際に、窓が膜厚検出センサ上を複数回通過するように、同様の半径方向の位置に複数個有することが好ましい。
3.2. Polishing Layer The polishing layer of the present embodiment is not particularly limited, but for example, a polyurethane sheet can be used. This polyurethane sheet has an opening in which the endpoint detection window is embedded. Although the position of the opening is not particularly limited, it is preferably provided at a position in the radial direction corresponding to the film thickness detection sensor installed on the table of the polishing apparatus. Although the number of openings is not particularly limited, a plurality of openings are provided at similar radial positions so that the windows pass over the film thickness detection sensor multiple times when the polishing pad attached to the table rotates once. is preferred.
 ポリウレタンシートの態様としては、特に制限されないが、例えば、樹脂の発泡成形体、樹脂の無発泡成形体、繊維基材にポリウレタンを含浸した樹脂含侵基材などが挙げられる。 The form of the polyurethane sheet is not particularly limited, but examples thereof include a foamed resin article, a non-foamed resin article, and a resin-impregnated base material in which a fiber base material is impregnated with polyurethane.
 ここで、樹脂の発泡成形体とは、繊維基材を有さず、所定の樹脂から構成される発泡体をいう。発泡形状は、特に制限されないが、例えば、球状気泡、略球状気泡、涙型気泡、あるいは、各気泡が部分的に連結した連続気泡などが挙げられる。 Here, the resin foam molding refers to a foam that does not have a fiber base material and is composed of a predetermined resin. The foam shape is not particularly limited, but examples thereof include spherical cells, substantially spherical cells, tear-shaped cells, and open cells in which each cell is partially connected.
 また、樹脂の無発泡成形体とは、繊維基材を有さず、所定の樹脂から構成される無発泡体をいう。無発泡体とは、上記のような気泡を有しないものをいう。第1実施形態においては、フィルムなどの基材の上に、硬化性組成物を付着させて硬化させたようなものも樹脂の無発泡成形体に含まれる。より具体的には、ラビアコーター法、小径グラビアコーター法、リバースロールコーター法、トランスファロールコーター法、キスコーター法、ダイコーター法、スクリーン印刷法、スプレー塗布法等により形成された樹脂硬化物も樹脂の無発泡成形体に含まれる。 In addition, a non-foamed resin molded body refers to a non-foamed body that does not have a fiber base material and is composed of a predetermined resin. A non-foamed body refers to a body that does not have air bubbles as described above. In the first embodiment, non-foamed molded articles of resin include those obtained by applying a curable composition to a base material such as a film and then curing the same. More specifically, the resin cured product formed by a labia coater method, a small diameter gravure coater method, a reverse roll coater method, a transfer roll coater method, a kiss coater method, a die coater method, a screen printing method, a spray coating method, etc. Included in non-foamed molded products.
 さらに、樹脂含侵基材とは、繊維基材に樹脂を含浸させて得られるものをいう。ここで、繊維基材としては、特に制限されないが、例えば、織布、不織布、編地などが挙げられる。 Furthermore, a resin-impregnated base material refers to a material obtained by impregnating a fiber base material with a resin. Here, the fiber base material is not particularly limited, and examples thereof include woven fabrics, nonwoven fabrics, and knitted fabrics.
4.研磨加工物の製造方法
 本実施形態の研磨加工物の製造方法は、研磨スラリーの存在下、上記研磨パッドを用いて、被研磨物を研磨し研磨加工物を得る研磨工程と、該研磨中に光学式終点検出方式で終点検出を行う終点検出工程と、を有する。
4. Method for producing a polished object The method for producing a polished object according to the present embodiment includes a polishing step of polishing an object to be polished using the above-described polishing pad in the presence of a polishing slurry to obtain a polished object; and an endpoint detection step of performing endpoint detection by an optical endpoint detection method.
4.1.研磨工程
 研磨工程は、一次ラッピング研磨(粗ラッピング)であってもよく、二次ラッピング(仕上げラッピング)であってもよく、一次ポリッシング(粗ポリッシング)であってもよく、二次ポリッシング(仕上げポリッシング)であってもよく、これら研磨を兼ねるものであってもよい。なお、ここで、「ラッピング」とは粗砥粒を用いて比較的に高いレートで研磨することを言い、「ポリッシング」とは微細砥粒を用いて比較的に低いレートで表面品位を高くするために研磨することを言う。
4.1. Polishing process The polishing process may be primary lapping polishing (rough lapping), secondary lapping (finish lapping), primary polishing (rough polishing), or secondary polishing (finish polishing). ), or may also serve as polishing. Here, "lapping" refers to polishing at a relatively high rate using coarse abrasive grains, and "polishing" refers to increasing the surface quality at a relatively low rate using fine abrasive grains. Say to polish for.
 このなかでも、本実施形態の研磨パッドは化学機械研磨(CMP)に用いられることが好ましい。以下、化学機械研磨を例に本実施形態の研磨物の製造方法を説明するが、本実施形態の研磨物の製造方法は以下に限定されない。 Among these, the polishing pad of the present embodiment is preferably used for chemical mechanical polishing (CMP). The method for producing a polished object of this embodiment will be described below using chemical mechanical polishing as an example, but the method for producing a polished object of this embodiment is not limited to the following.
 被研磨物としては、特に限定されないが、例えば、半導体デバイス、電子部品等の材料、特に、Si基板(シリコンウエハ)、SiC(炭化珪素)基板、GaAs(ガリウム砒素)基板、ガラス、ハードディスクやLCD(液晶ディスプレイ)用基板等の薄型基板(被研磨物)が挙げられる。特に、W(タングステン)やCu(銅)などの金属配線を有する半導体デバイスが挙げられる。 The object to be polished is not particularly limited, but for example, materials such as semiconductor devices and electronic components, particularly Si substrates (silicon wafers), SiC (silicon carbide) substrates, GaAs (gallium arsenide) substrates, glass, hard disks and LCDs. Thin substrates (objects to be polished) such as substrates for (liquid crystal displays) can be mentioned. In particular, semiconductor devices having metal wiring such as W (tungsten) and Cu (copper) are mentioned.
 研磨方法としては、従来公知の方法を用いることができ、特に限定されない。例えば、まず、研磨パッドと対向するように配置された保持定盤に保持させた被研磨物を研磨面側へ押し付けると共に、外部からスラリーを供給しながら、研磨パッド及び/又は保持定盤を回転させる。研磨パッドと保持定盤は、互いに異なる回転速度で同方向に回転しても、異方向に回転してもよい。また、被研磨物は、研磨加工中に、枠部の内側で移動(自転)しながら研磨加工されてもよい。 A conventionally known method can be used as the polishing method, and is not particularly limited. For example, first, an object to be polished held on a holding surface plate arranged to face the polishing pad is pressed against the polishing surface, and the polishing pad and/or the holding surface plate are rotated while slurry is supplied from the outside. Let The polishing pad and the holding platen may rotate in the same direction or in opposite directions at different rotational speeds. Further, the object to be polished may be polished while moving (rotating) inside the frame during the polishing process.
 スラリーは、被研磨物や研磨条件等に応じて、水、過酸化水素に代表される酸化剤などの化学成分、添加剤、砥粒(研磨粒子;例えば、SiC、SiO、Al、CeO)等を含んでいてもよい。 Depending on the object to be polished, polishing conditions, etc., the slurry may contain water, chemical components such as oxidizing agents represented by hydrogen peroxide, additives, abrasive grains (abrasive particles; for example, SiC, SiO 2 , Al 2 O 3 , CeO 2 ) and the like.
4.2.終点検出工程
 本実施形態の研磨加工物の製造方法は、上記研磨工程において、光学式終点検出方式で終点検出を行う終点検出工程を有する。光学式終点検出方式による終点検出方法としては、具体的には従来公知の方法を用いることができる。
4.2. End Point Detection Step The method for manufacturing a polished workpiece according to the present embodiment has an end point detection step of detecting the end point by an optical end point detection method in the polishing step. Specifically, a conventionally known method can be used as the end point detection method by the optical end point detection method.
 図13に、光学式終点検出方式の終点検出方法の模式図を示す。この模式図は、トップリング90で保持したウエハWをテーブル91上に貼られた研磨パッド1上にスラリー92を流しながら押し付けてウエハW表面の凹凸膜を削り平坦化する化学機械研磨プロセスを示す。研磨装置94は平坦化と同時に所定の膜厚を終点検出して精度良くプロセスを終了させるため、膜厚をモニタする膜厚検出センサ93をテーブル91に搭載している。膜厚検出センサ93は、例えば、ウエハWの研磨面に光を照射し、その反射光の分光強度特性を測定・解析することにより、研磨終点を検出することができる。 FIG. 13 shows a schematic diagram of the endpoint detection method of the optical endpoint detection method. This schematic diagram shows a chemical mechanical polishing process in which a wafer W held by a top ring 90 is pressed onto a polishing pad 1 affixed on a table 91 while slurry 92 is flowing therethrough, and the uneven film on the surface of the wafer W is scraped and flattened. . The polishing apparatus 94 has a film thickness detection sensor 93 mounted on the table 91 for monitoring the film thickness in order to detect a predetermined film thickness at the end point and finish the process with high accuracy at the same time as the planarization. The film thickness detection sensor 93 can detect the polishing end point by, for example, irradiating the polishing surface of the wafer W with light and measuring and analyzing the spectral intensity characteristics of the reflected light.
 より具体的には、膜厚検出センサ93は終点検出窓51を介して、ウエハW表面に光を入射し、ウエハW上の膜(ウェハ表面)で反射した光と、ウエハW上の膜とウエハの基板との界面において反射した光との位相差により生じる、反射強度の強弱を検出することで、膜厚変化を検出することができる。 More specifically, the film thickness detection sensor 93 causes light to enter the surface of the wafer W through the end point detection window 51, and the light reflected by the film on the wafer W (wafer surface) and the film on the wafer W are detected. A film thickness change can be detected by detecting the strength of the reflection intensity caused by the phase difference with respect to the light reflected at the interface between the wafer and the substrate.
5.態様
 上記開示に基づけば、本発明としてさらに以下の態様が認められる。
5. Aspects Based on the above disclosure, the following aspects are further recognized as the present invention.
5.1.態様A
 態様Aは、とりわけ、終点検出窓を有する研磨パッドをより簡易に製造することのできる製造方法を提供することを目的とした態様である。その構成は以下のとおりである。
5.1. Aspect A
Aspect A is, inter alia, an aspect aimed at providing a manufacturing method capable of more easily manufacturing a polishing pad having an endpoint detection window. Its configuration is as follows.
〔1〕
 終点検出窓付き研磨層を備える研磨パッドの製造方法であって、
 金型内に終点検出窓用部材を固定し、該終点検出窓用部材と接触した状態で硬化性樹脂を硬化して、終点検出窓用部材が組み込まれた樹脂シートを形成する硬化工程と、
 前記樹脂シートをスライスして研磨層を形成するスライス工程と、を有し、
 前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した位置固定治具により吊り下げられて固定される、
 研磨パッドの製造方法。
〔2〕
 前記硬化工程において、前記金型内に硬化性樹脂を充填してから、前記終点検出窓用部材を前記硬化性樹脂に接触させて、前記硬化性樹脂を硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔3〕
 前記硬化工程において、前記金型内に前記終点検出窓用部材を固定してから、硬化性樹脂を充填して硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔4〕
 前記終点検出窓用部材は、終点検出窓となる柱状部と、前記終点検出窓用部材を前記位置固定治具に固定するための台座部と、を有する、
 〔1〕~〔3〕のいずれか一項に記載の研磨パッドの製造方法。
〔5〕
 前記位置固定治具が、前記金型上部と嵌合する第1嵌合部を有する、
 〔1〕~〔4〕のいずれか一項に記載の研磨パッドの製造方法。
〔6〕
 前記金型が、前記位置固定治具と嵌合する第2嵌合部を有する、
 〔1〕~〔5〕のいずれか一項に記載の研磨パッドの製造方法。
〔7〕
 前記位置固定治具が、前記終点検出窓用部材を位置決めして固定する位置決め部を有する、
 〔1〕~〔6〕のいずれか一項に記載の研磨パッドの製造方法。
〔8〕
 前記研磨層の研磨面に溝加工を施す溝形成工程を有し、
 前記溝形成工程の前に前記終点検出窓用部材の露出している部分には、溝加工を行わない、
 〔1〕~〔7〕のいずれか一項に記載の研磨パッドの製造方法。
〔9〕
 前記研磨層の研磨面と反対側の面に、基材層及び/又はクッション層を積層する積層工程を有する、
 〔1〕~〔8〕のいずれか一項に記載の研磨パッドの製造方法。
[1]
A method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window, comprising:
a curing step of fixing the end-point detection window member in the mold and curing the curable resin in a state of contact with the end-point detection window member to form a resin sheet in which the end-point detection window member is incorporated;
a slicing step of slicing the resin sheet to form a polishing layer;
In the curing step, the end point detection window member is suspended and fixed by a position fixing jig installed above the mold.
A method for manufacturing a polishing pad.
[2]
In the curing step, the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
[1] The method for producing a polishing pad according to [1].
[3]
In the curing step, after fixing the end point detection window member in the mold, a curable resin is filled and cured.
[1] The method for producing a polishing pad according to [1].
[4]
The endpoint detection window member has a columnar portion that serves as an endpoint detection window, and a pedestal portion for fixing the endpoint detection window member to the position fixing jig.
[1] A method for producing a polishing pad according to any one of [3].
[5]
The position fixing jig has a first fitting part that fits with the upper part of the mold,
[1] A method for producing a polishing pad according to any one of [4].
[6]
The mold has a second fitting portion that fits with the position fixing jig,
[1] A method for producing a polishing pad according to any one of [5].
[7]
The position fixing jig has a positioning portion that positions and fixes the end point detection window member,
[1] A method for producing a polishing pad according to any one of [6].
[8]
a groove forming step of performing groove processing on the polishing surface of the polishing layer;
Grooving is not performed on the exposed portion of the end point detection window member before the groove forming step.
[1] A method for producing a polishing pad according to any one of [7].
[9]
A lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface,
[1] A method for producing a polishing pad according to any one of [8].
5.2.態様B
 態様Bは、とりわけ、終点検出窓用部材の位置ずれ等を抑制できるようにしつつも、終点検出窓用部材の位置の調整も容易に行うことのできる研磨パッドの製造方法を提供することを目的とした態様である。その構成は以下のとおりである。
5.2. Aspect B
Aspect B aims to provide a method of manufacturing a polishing pad that can easily adjust the position of the end-point detection window member while suppressing the positional deviation of the end-point detection window member. It is a mode. Its configuration is as follows.
〔1〕
 終点検出窓付き研磨層を備える研磨パッドの製造方法であって、
 金型内に終点検出窓用部材を固定し、該終点検出窓用部材と接触した状態で硬化性樹脂を硬化して、前記終点検出窓用部材が組み込まれた樹脂シートを形成する硬化工程と、
 前記樹脂シートをスライスして研磨層を形成するスライス工程と、を有し、
 前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した位置固定治具の挟持部により挟持されることで、吊り下げられて固定される、
 研磨パッドの製造方法。
〔2〕
 前記硬化工程において、前記金型内に硬化性樹脂を充填してから、前記終点検出窓用部材を前記硬化性樹脂に接触させて、前記硬化性樹脂を硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔3〕
 前記硬化工程において、前記金型内に前記終点検出窓用部材を固定してから、硬化性樹脂を充填して硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔4〕
 前記位置固定治具が、前記終点検出窓用部材が挿通される貫通孔を有し、
 前記挟持部は、前記貫通孔に挿通された前記終点検出窓用部材を挟持する、
 〔1〕~〔3〕のいずれか一項に記載の研磨パッドの製造方法。
〔5〕
 前記挟持部は、前記終点検出窓用部材を着脱可能に挟持する、
 〔1〕~〔4〕のいずれか一項に記載の研磨パッドの製造方法。
〔6〕
 前記位置固定治具が、前記金型上部と嵌合する第1嵌合部を有する、
 〔1〕~〔5〕のいずれか一項に記載の研磨パッドの製造方法。
〔7〕
 前記金型が、前記位置固定治具と嵌合する第2嵌合部を有する、
 〔1〕~〔6〕のいずれか一項に記載の研磨パッドの製造方法。
〔8〕
 前記研磨層の研磨面に溝加工を施す溝形成工程を有し、
 前記溝形成工程の前に前記終点検出窓用部材の露出している部分には、溝加工を行わない、
 〔1〕~〔7〕のいずれか一項に記載の研磨パッドの製造方法。
〔9〕
 前記研磨層の研磨面と反対側の面に、基材層及び/又はクッション層を積層する積層工程を有する、
 〔1〕~〔8〕のいずれか一項に記載の研磨パッドの製造方法。
[1]
A method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window, comprising:
a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; ,
a slicing step of slicing the resin sheet to form a polishing layer;
In the curing step, the end point detection window member is held by a holding portion of a position fixing jig installed on the upper portion of the mold, thereby being suspended and fixed.
A method for manufacturing a polishing pad.
[2]
In the curing step, the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
[1] The method for producing a polishing pad according to [1].
[3]
In the curing step, after fixing the end point detection window member in the mold, a curable resin is filled and cured.
[1] The method for producing a polishing pad according to [1].
[4]
The position fixing jig has a through hole through which the end point detection window member is inserted,
The holding portion holds the end point detection window member inserted through the through hole.
[1] A method for producing a polishing pad according to any one of [3].
[5]
The holding portion detachably holds the end point detection window member,
[1] A method for producing a polishing pad according to any one of [4].
[6]
The position fixing jig has a first fitting part that fits with the upper part of the mold,
[1] A method for producing a polishing pad according to any one of [5].
[7]
The mold has a second fitting portion that fits with the position fixing jig,
[1] A method for producing a polishing pad according to any one of [6].
[8]
a groove forming step of performing groove processing on the polishing surface of the polishing layer;
Grooving is not performed on the exposed portion of the end point detection window member before the groove forming step.
[1] A method for producing a polishing pad according to any one of [7].
[9]
A lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface,
[1] A method for producing a polishing pad according to any one of [8].
5.3.態様C
 態様Cは、とりわけ、金型の上から吊り下げて固定した終点検出窓用部材と接触した状態で硬化性樹脂を硬化した際において、気泡が生じにくい研磨パッドの製造方法を提供することを目的とした態様である。その構成は以下のとおりである。
5.3. Aspect C
Aspect C aims to provide a method for manufacturing a polishing pad in which air bubbles are less likely to occur when the curable resin is cured while in contact with the end-point detection window member suspended from the mold and fixed. It is a mode. Its configuration is as follows.
〔1〕
 終点検出窓付き研磨層を備える研磨パッドの製造方法であって、
 金型内に終点検出窓用部材を固定し、該終点検出窓用部材と接触した状態で硬化性樹脂を硬化して、前記終点検出窓用部材が組み込まれた樹脂シートを形成する硬化工程と、
 前記樹脂シートをスライスして研磨層を形成するスライス工程と、を有し、
 前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した位置固定治具により吊り下げられて固定されるものであり、
 吊り下げられて固定された際の前記終点検出窓用部材の下端が、凸面形状を有する、
 研磨パッドの製造方法。
〔2〕
 前記硬化工程において、前記金型内に硬化性樹脂を充填してから、前記終点検出窓用部材を前記硬化性樹脂に接触させて、前記硬化性樹脂を硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔3〕
 前記硬化工程において、前記金型内に前記終点検出窓用部材を固定してから、硬化性樹脂を充填して硬化する、
 〔1〕に記載の研磨パッドの製造方法。
〔4〕
 少なくとも一端が前記凸面形状である前記終点検出窓用部材を形成する窓用部材形成工程をさらに有する、
 〔1〕~〔3〕のいずれか一項に記載の研磨パッドの製造方法。
〔5〕
 前記終点検出窓用部材の前記凸面形状を有する部分の長さLが、3.0~20mmである、
 〔1〕~〔4〕のいずれか一項に記載の研磨パッドの製造方法。
〔6〕
 前記終点検出窓用部材の前記凸面形状を有する部分の長さLと、前記終点検出窓用部材の水平方向の断面積Sとの比(L/S)が、0.002~0.4である、
 〔1〕~〔5〕のいずれか一項に記載の研磨パッドの製造方法。
〔7〕
 前記終点検出窓用部材の前記凸面形状を有する部分の長さLが、前記終点検出窓用部材の全長Lwに対して、0.03~0.30Lwである、
 〔1〕~〔6〕のいずれか一項に記載の研磨パッドの製造方法。
〔8〕
 前記位置固定治具が、前記金型上部と嵌合する第1嵌合部を有する、
 〔1〕~〔7〕のいずれか一項に記載の研磨パッドの製造方法。
〔9〕
 前記金型が、前記位置固定治具と嵌合する第2嵌合部を有する、
 〔1〕~〔8〕のいずれか一項に記載の研磨パッドの製造方法。
〔10〕
 前記位置固定治具が、前記終点検出窓用部材を位置決めして固定する位置決め部を有する、
 〔1〕~〔9〕のいずれか一項に記載の研磨パッドの製造方法。
〔11〕
 前記研磨層の研磨面に溝加工を施す溝形成工程を有し、
 前記溝形成工程の前に前記終点検出窓用部材の露出している部分には、溝加工を行わない、
 〔1〕~〔10〕のいずれか一項に記載の研磨パッドの製造方法。
〔12〕
 前記研磨層の研磨面と反対側の面に、基材層及び/又はクッション層を積層する積層工程を有する、
 〔1〕~〔11〕のいずれか一項に記載の研磨パッドの製造方法。
[1]
A method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window, comprising:
a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; ,
a slicing step of slicing the resin sheet to form a polishing layer;
In the curing step, the end point detection window member is suspended and fixed by a position fixing jig installed on the upper part of the mold,
A lower end of the endpoint detection window member when suspended and fixed has a convex shape,
A method for manufacturing a polishing pad.
[2]
In the curing step, the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
[1] The method for producing a polishing pad according to [1].
[3]
In the curing step, after fixing the end point detection window member in the mold, a curable resin is filled and cured.
[1] The method for producing a polishing pad according to [1].
[4]
further comprising a window member forming step of forming the endpoint detection window member having at least one end with the convex shape;
[1] A method for producing a polishing pad according to any one of [3].
[5]
The length L of the portion having the convex shape of the endpoint detection window member is 3.0 to 20 mm.
[1] A method for producing a polishing pad according to any one of [4].
[6]
The ratio (L/S) of the length L of the convex portion of the endpoint detection window member to the horizontal cross-sectional area S of the endpoint detection window member is 0.002 to 0.4. be,
[1] A method for producing a polishing pad according to any one of [5].
[7]
The length L of the portion having the convex shape of the end point detection window member is 0.03 to 0.30 Lw with respect to the total length Lw of the end point detection window member.
[1] A method for producing a polishing pad according to any one of [6].
[8]
The position fixing jig has a first fitting part that fits with the upper part of the mold,
[1] A method for producing a polishing pad according to any one of [7].
[9]
The mold has a second fitting portion that fits with the position fixing jig,
[1] A method for producing a polishing pad according to any one of [8].
[10]
The position fixing jig has a positioning portion that positions and fixes the end point detection window member,
[1] A method for producing a polishing pad according to any one of [9].
[11]
a groove forming step of performing groove processing on the polishing surface of the polishing layer;
Grooving is not performed on the exposed portion of the end point detection window member before the groove forming step.
[1] The method for producing a polishing pad according to any one of [10].
[12]
A lamination step of laminating a base material layer and/or a cushion layer on the surface of the polishing layer opposite to the polishing surface,
[1] A method for producing a polishing pad according to any one of [11].
5.4.態様D
 態様Dは、とりわけ、より短時間で効率的に気泡を取り除くことのできる研磨パッドの製造方法を提供することを目的とした態様である。その構成は以下のとおりである。
5.4. Aspect D
Aspect D is an aspect aimed at providing a method of manufacturing a polishing pad that can efficiently remove air bubbles in a shorter time. Its configuration is as follows.
〔1〕
 終点検出用窓を有する研磨パッドの製造方法であって、
 調合した窓材原料を入れた容器を100~800rpmで自転させながら、所定の円周上を200~1600rpmで公転させる回転運動工程と、
 該回転運動後の窓材原料を硬化させて終点検出用窓部材を得る窓材硬化工程と、を有する、
 研磨パッドの製造方法。
〔2〕
 前記回転運動工程を、減圧下で行う、
 〔1〕に記載の研磨パッドの製造方法。
〔3〕
 前記回転運動工程の処理時間が1~10分である、
 〔1〕又は〔2〕に記載の研磨パッドの製造方法。
〔4〕
 前記回転運動工程の温度が50~130℃である、
 〔1〕~〔3〕のいずれか一項に記載の研磨パッドの製造方法。
〔5〕
 前記回転運動工程における自転軸と公転軸の傾きが、20~70°である、
 〔1〕~〔4〕のいずれか一項に記載の研磨パッドの製造方法。
〔6〕
 前記窓材原料が、ポリイソシアネート、ポリオール、及び硬化剤を含む、
 〔1〕~〔5〕のいずれか一項に記載の研磨パッドの製造方法。
〔7〕
 前記終点検出用窓部材を備える研磨層の研磨面に、溝加工を施す溝形成工程を有する、
 〔1〕~〔6〕のいずれか一項に記載の研磨パッドの製造方法。
〔8〕
 前記終点検出用窓部材を備える研磨層の研磨面と反対側の面に、基材層及び/又はクッション層を積層する積層工程を有する、
 〔1〕~〔7〕のいずれか一項に記載の研磨パッドの製造方法。
[1]
A method for manufacturing a polishing pad having an endpoint detection window, comprising:
a rotational motion step of revolving on a predetermined circumference at 200 to 1600 rpm while rotating the container containing the prepared window material raw material at 100 to 800 rpm;
a window material curing step for obtaining an endpoint detection window member by curing the window material raw material after the rotational movement;
A method for manufacturing a polishing pad.
[2]
performing the rotational movement step under reduced pressure;
[1] The method for producing a polishing pad according to [1].
[3]
The processing time of the rotational motion step is 1 to 10 minutes,
A method for producing a polishing pad according to [1] or [2].
[4]
The temperature of the rotational motion step is 50 to 130°C,
[1] A method for producing a polishing pad according to any one of [3].
[5]
The inclination of the axis of rotation and the axis of revolution in the rotational motion step is 20 to 70°.
[1] A method for producing a polishing pad according to any one of [4].
[6]
The window material raw material contains a polyisocyanate, a polyol, and a curing agent,
[1] A method for producing a polishing pad according to any one of [5].
[7]
a groove forming step of performing groove processing on the polishing surface of the polishing layer provided with the end point detection window member;
[1] A method for producing a polishing pad according to any one of [6].
[8]
a lamination step of laminating a base material layer and/or a cushion layer on the surface opposite to the polishing surface of the polishing layer provided with the end point detection window member;
[1] A method for producing a polishing pad according to any one of [7].
5.5.態様E
 態様Eは、とりわけ、均一な物性を有する終点検出窓材をより簡便に得ることのできる製造方法を提供することを目的とした態様である。その構成は以下のとおりである。
5.5. Aspect E
Aspect E is, inter alia, an aspect aimed at providing a manufacturing method that can more easily obtain an endpoint detection window material having uniform physical properties. Its configuration is as follows.
〔1〕
 終点検出用窓付き研磨パッドにおける終点検出窓材の製造方法であって、
 ポリイソシアネートとポリオールと硬化剤の一部とを混合し、第1の反応混合物を調製する第1混合工程と、
 前記第1の反応混合物と前記硬化剤の残部とを混合し、第2の反応混合物を調製する第2混合工程と、
 前記第2の反応混合物を硬化して、前記終点検出窓材を得る窓材硬化工程と、を含み、
 前記硬化剤が3以上の官能基を有する、
 終点検出窓材の製造方法。
〔2〕
 前記第1混合工程における前記硬化剤の使用量aと、前記第2混合工程における前記硬化剤の使用量bとの合計を100質量%としたときに、
 前記使用量aが、10~90質量%である、
 〔1〕記載の終点検出窓材の製造方法。
〔3〕
 前記硬化剤が、分子量300未満の低分子量ポリオールを含む、
 〔1〕又は〔2〕に記載の終点検出窓材の製造方法。
〔4〕
 前記ポリオールが、分子量300以上の高分子量ポリオールを含む、
 〔1〕~〔3〕のいずれか一項に記載の終点検出窓材の製造方法。
〔5〕
 前記ポリイソシアネートが、脂環族ポリイソシアネート及び/又は脂肪族ポリイソシアネートを含む、
 〔1〕~〔4〕いずれか一項に記載の終点検出窓材の製造方法。
〔6〕
 終点検出窓付き研磨パッドにおける終点検出窓材であって、
 前記終点検出窓材の中心部及び両端部の20℃~80℃におけるD硬度(DW20~DW80)の標準偏差が1.5以下である、
 終点検出窓材。
〔7〕
 〔6〕に記載の終点検出窓材と、
 該終点検出窓材を備える研磨層と、を有する、
 研磨パッド。
[1]
A method for manufacturing an endpoint detection window material in a polishing pad with an endpoint detection window, comprising:
a first mixing step of mixing the polyisocyanate, the polyol and a portion of the curing agent to form a first reaction mixture;
a second mixing step of mixing the first reaction mixture with the remainder of the curing agent to form a second reaction mixture;
a window material curing step of curing the second reaction mixture to obtain the endpoint detection window material;
the curing agent has 3 or more functional groups;
A method for manufacturing an endpoint detection window material.
[2]
When the sum of the amount a of the curing agent used in the first mixing step and the amount b of the curing agent used in the second mixing step is 100% by mass,
The amount a used is 10 to 90% by mass,
[1] The method for manufacturing the endpoint detection window material described above.
[3]
the curing agent comprises a low molecular weight polyol having a molecular weight of less than 300;
[1] or [2] manufacturing method of the endpoint detection window material.
[4]
The polyol contains a high molecular weight polyol having a molecular weight of 300 or more,
[1] A method for manufacturing an endpoint detection window material according to any one of [3].
[5]
The polyisocyanate comprises an alicyclic polyisocyanate and/or an aliphatic polyisocyanate,
[1] to [4] A method for manufacturing an endpoint detection window material according to any one of items.
[6]
An endpoint detection window material in a polishing pad with an endpoint detection window,
The standard deviation of the D hardness (D W20 to D W80 ) at 20° C. to 80° C. of the center and both ends of the endpoint detection window material is 1.5 or less.
Endpoint detection window material.
[7]
The endpoint detection window material according to [6];
a polishing layer comprising the endpoint detection window material;
polishing pad.
5.6.態様F
 態様Fは、とりわけ、終点検出窓を有する研磨パッドをより簡易に製造することのできる製造方法を提供することを目的とした態様である。その構成は以下のとおりである。
5.6. Mode F
Aspect F is, inter alia, an aspect aimed at providing a manufacturing method capable of more easily manufacturing a polishing pad having an endpoint detection window. Its configuration is as follows.
〔1〕
 樹脂シートの開口に設けられた終点検出窓の位置情報を取得する第1取得工程と、
 前記位置情報に基づいて、粘着シート上の前記終点検出窓の設置位置に相当する部分に、孔を形成する第1孔形成工程と、
 前記終点検出窓と前記孔とを位置合わせして、前記樹脂シートと前記粘着シートの粘着面とを貼り合わせる第1貼合工程と、を有する、
 研磨パッドの製造方法。
〔2〕
 前記位置情報が、撮像装置により得られた画像情報、又は、前記樹脂シートに当てたレーザー光のうち終点検出窓を透過したレーザー光をレーザー受光機により受信して得られた情報に基づくものである、
 〔1〕に記載の研磨パッドの製造方法。
〔3〕
 前記第1孔形成工程において、前記終点検出窓よりも小さい前記孔を形成する、
 〔1〕又は〔2〕に記載の研磨パッドの製造方法。
〔4〕
 前記位置情報が、前記終点検出窓の中心位置に関する情報を含み、
 前記第1孔形成工程において、前記終点検出窓の中心位置と前記孔の中心位置が一致するように前記孔を形成する、
 〔1〕~〔3〕のいずれか一項に記載の研磨パッドの製造方法。
〔5〕
 前記樹脂シートが、複数の前記終点検出窓を有する、
 〔1〕~〔4〕のいずれか一項に記載の研磨パッドの製造方法。
〔6〕
 前記粘着シートが、両面テープ、又は、両面テープと他の層との積層体である、
 〔1〕~〔5〕のいずれか一項に記載の研磨パッドの製造方法。
〔7〕
 前記粘着シートが前記両面テープである場合に、
 前記樹脂シート上の前記両面テープに形成された孔の位置情報を取得する第2取得工程と、
 前記位置情報に基づいて、他の層上の前記終点検出窓の設置位置に相当する部分に、孔を形成する第2孔形成工程と、
 前記両面テープにおける前記孔と前記他の層における前記孔とを位置合わせして、前記樹脂シート上の前記両面テープと前記他の層とを貼り合わせる第2貼合工程と、を有する、
 〔6〕に記載の研磨パッドの製造方法。
[1]
a first acquisition step of acquiring position information of an endpoint detection window provided in the opening of the resin sheet;
a first hole forming step of forming a hole in a portion corresponding to the installation position of the end point detection window on the adhesive sheet based on the position information;
a first bonding step in which the end point detection window and the hole are aligned and the resin sheet and the adhesive surface of the adhesive sheet are bonded together;
A method for manufacturing a polishing pad.
[2]
The positional information is based on image information obtained by an imaging device, or information obtained by receiving a laser beam that has passed through an end point detection window among the laser beams applied to the resin sheet by a laser receiver. be,
[1] The method for producing a polishing pad according to [1].
[3]
forming the hole smaller than the endpoint detection window in the first hole forming step;
A method for producing a polishing pad according to [1] or [2].
[4]
the position information includes information about the center position of the endpoint detection window;
In the first hole forming step, the hole is formed so that the center position of the endpoint detection window and the center position of the hole match.
[1] A method for producing a polishing pad according to any one of [3].
[5]
The resin sheet has a plurality of endpoint detection windows,
[1] A method for producing a polishing pad according to any one of [4].
[6]
The pressure-sensitive adhesive sheet is a double-sided tape or a laminate of a double-sided tape and another layer,
[1] A method for producing a polishing pad according to any one of [5].
[7]
When the adhesive sheet is the double-sided tape,
a second acquisition step of acquiring position information of holes formed in the double-sided tape on the resin sheet;
a second hole forming step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on another layer based on the position information;
a second bonding step of aligning the holes in the double-sided tape with the holes in the other layer and bonding the double-sided tape on the resin sheet and the other layer;
[6] The method for producing a polishing pad according to [6].
 以下、終点検出窓材についてより具体的に説明する。本発明は、以下の実施例によって何ら限定されるものではない。 The endpoint detection window material will be described in more detail below. The present invention is by no means limited by the following examples.
〔例1〕
(終点検出窓材の作製)
 数平均分子量1000のポリ(オキシテトラメチレン)グリコール(PTMG)、グリセリン、4,4’-メチレン-ビス(シクロヘキシルイソシアネート)(水添MDI)の各窓材原料を80℃で予め保温し、数平均分子量1000のポリ(オキシテトラメチレン)グリコール(PTMG)120.9質量部と、グリセリン7.4質量部と、4,4’-メチレン-ビス(シクロヘキシルイソシアネート)(水添MDI)100質量部と、を室温条件下、15分間真空攪拌脱泡を行うことにより混合することで第1の反応混合物を得た。
[Example 1]
(Production of endpoint detection window material)
Poly(oxytetramethylene) glycol (PTMG) with a number average molecular weight of 1000, glycerin, and 4,4′-methylene-bis(cyclohexyl isocyanate) (hydrogenated MDI) window material raw materials were preheated at 80° C., and the number average 120.9 parts by mass of poly(oxytetramethylene) glycol (PTMG) having a molecular weight of 1000, 7.4 parts by mass of glycerin, 4,4′-methylene-bis(cyclohexyl isocyanate) (hydrogenated MDI) 100 parts by mass, A first reaction mixture was obtained by mixing by performing vacuum stirring and defoaming under room temperature conditions for 15 minutes.
 その後、第1の反応混合物に対して、グリセリン7.4質量部を添加した後、室温条件下、1~2分間真空攪拌脱泡を行うことにより第2の反応混合物を得た。 After that, 7.4 parts by mass of glycerin was added to the first reaction mixture, and vacuum stirring and defoaming were performed for 1 to 2 minutes at room temperature to obtain a second reaction mixture.
 得られた第2の反応混合物を、得られた混合液を型枠に注型し、120℃で30分間加熱(プレキュア)した後、硬化した反応混合物を型から取りだし、120℃で6時間ポストキュアして、透明な終点検出窓材を作製した。 The resulting second reaction mixture was poured into a mold and heated (precured) at 120°C for 30 minutes, after which the cured reaction mixture was removed from the mold and post-cured at 120°C for 6 hours. It was cured to produce a transparent endpoint detection window material.
〔例2〕
 第2混合工程を有さず、第1混合工程において硬化剤であるグリセリンを全量混合(ワンショット法)すること以外は、例1と同様にして、終点検出窓材を調製した。
[Example 2]
An endpoint detection window material was prepared in the same manner as in Example 1, except that the second mixing step was omitted and the entire amount of glycerin as a curing agent was mixed in the first mixing step (one-shot method).
 それぞれ別個に調製した窓用部材をスライスしてポリウレタンシートを用意し、それぞれ例1及び例2として以下の試験に用いた。 Separately prepared window members were sliced to prepare polyurethane sheets, which were used in the following tests as Examples 1 and 2, respectively.
〔物性ばらつきの評価〕
 温度上昇に伴う硬度変化のばらつきを確認するため各温度におけるD硬度測定を行った。
 D硬度の測定はJIS K6253に準じて行った。測定に際しては、終点検出窓材の下に金属板を敷いて、実際の研磨工程と同様の条件(研磨パッドを研磨装置の金属定盤に貼付した状態)でテクロック社製D硬度計を用いて測定した。なお、試料は、ポリウレタンシート(厚さ約0.125cm(1.25mm))を4枚重ねとし、少なくとも総厚さ0.45cm(4.5mm)以上になるように設定した。
[Evaluation of variation in physical properties]
D hardness measurement was performed at each temperature in order to confirm variations in hardness change with temperature rise.
The D hardness was measured according to JIS K6253. In the measurement, a metal plate was placed under the end point detection window material, and a D hardness tester manufactured by Teclock was used under the same conditions as the actual polishing process (polishing pad attached to the metal surface plate of the polishing apparatus). It was measured. The sample was prepared by stacking four polyurethane sheets (thickness: about 0.125 cm (1.25 mm)) so that the total thickness would be at least 0.45 cm (4.5 mm).
 例1及び例2に対して、各温度におけるD硬度測定を行うことにより、物性ばらつきを評価した。各温度においてD硬度のばらつきが生じる場合は、スライス時に終点検出窓材の表面形状が安定せず、それにより、終点検出窓の表面形状が凹状になれば、スラリーや研磨くずがたまってしまい研磨終点を正確に検出できない。また、窓の表面形状が凸状になれば、被研磨物にあたり、スクラッチ等が発生する可能性がある。以上を踏まえ、例1のサンプル(1)~(2)間、及び例2のサンプル(1)~(2)間における耐熱性の標準偏差を物性のばらつきとして評価し、その結果を表1及び図14に示す。 For Examples 1 and 2, the variation in physical properties was evaluated by performing D hardness measurement at each temperature. If the D hardness varies at each temperature, the surface shape of the endpoint detection window material will not be stable during slicing. The end point cannot be detected accurately. Also, if the surface of the window is convex, it may hit the object to be polished and cause scratches or the like. Based on the above, the standard deviation of heat resistance between samples (1) and (2) of Example 1 and between samples (1) and (2) of Example 2 was evaluated as variation in physical properties, and the results are shown in Table 1 and It is shown in FIG.
Figure JPOXMLDOC01-appb-T000001
                       
Figure JPOXMLDOC01-appb-T000001
                       
 表1より、例1のサンプル(1)~(2)間のD硬度の標準偏差は20℃~80℃においていずれも1.0以下であるのに対し、例2のサンプル(1)~(2)間におけるD硬度の標準偏差は、特に20℃、40℃、80℃においてそれぞれ3.0、4.0及び2.0であることから、本実施形態の製造方法を用いることにより、製造作業面で簡易な製造方法を用いつつ、耐熱性のばらつきを制御することができることがわかった。 From Table 1, the standard deviation of D hardness between samples (1) and (2) of Example 1 is 1.0 or less at 20 ° C. to 80 ° C., whereas samples (1) to ( 2) The standard deviations of D hardness between 20° C., 40° C., and 80° C. are 3.0, 4.0, and 2.0, respectively. It was found that variations in heat resistance can be controlled while using a manufacturing method that is simple in terms of work.
 また、例1及び例2において、円柱状の窓用部材(長さ60mm)における上端部、中心部及び下端部の各温度におけるD硬度測定を行うことにより、各温度におけるD硬度のばらつきを評価した。その結果を表2に示す。 Further, in Examples 1 and 2, the D hardness was measured at each temperature at the top, center, and bottom of a cylindrical window member (length 60 mm) to evaluate the variation in D hardness at each temperature. did. Table 2 shows the results.
Figure JPOXMLDOC01-appb-T000002
                       
Figure JPOXMLDOC01-appb-T000002
                       
 表2より、例1におけるD硬度の標準偏差は20℃~80℃においていずれも1.5以下であるのに対し、例2におけるD硬度の標準偏差は、特に20℃~80℃においてそれぞれ1.7、1.9、1.7及び1.9であることから、本実施形態の製造方法を用いることにより、製造作業面で簡易な製造方法を用いつつ、耐熱性のばらつきを制御することができることがわかった。 From Table 2, the standard deviation of D hardness in Example 1 is 1.5 or less at 20 ° C. to 80 ° C., whereas the standard deviation of D hardness in Example 2 is 1 at 20 ° C. to 80 ° C. 7, 1.9, 1.7 and 1.9, the manufacturing method of the present embodiment can be used to control variations in heat resistance while using a simple manufacturing method in terms of manufacturing work. It turns out that it can be done.
 本発明の研磨パッドの製造方法は、光学式の終点検出法に適した研磨パッドの効率的な製造方法として、産業上の利用可能性を有する。 The method for manufacturing a polishing pad of the present invention has industrial applicability as an efficient method for manufacturing a polishing pad suitable for an optical endpoint detection method.
1…研磨パッド、10…終点検出窓用部材、10a…下端、11…柱状部、12…台座部、20…金型、21…底面、22…側壁、30…位置固定治具、31…挟持部、32…調整部、33…貫通孔、40…硬化性樹脂、50…研磨層、50a…研磨面、51…終点検出窓、52…クッション層、53…接着層、54…接着層、55…溝、61…粘着シート、62…離型シート、71…他の層、90…トップリング、91…テーブル、92…スラリー、93…膜厚検出センサ、94…研磨装置、100…第1製造装置、110…搬送機構、120…撮像装置、130…孔形成装置、141…ローラ、142…ローラ、143…ローラ、200…第2製造装置、210…搬送機構、220…撮像装置、230…孔形成装置、241…ローラ、242…ローラ、L…凸面形状を有する部分の長さ、Lw…全長、S…断面積、S1…面積、W…ウエハ DESCRIPTION OF SYMBOLS 1... Polishing pad 10... End point detection window member 10a... Lower end 11... Columnar part 12... Pedestal part 20... Mold 21... Bottom surface 22... Side wall 30... Position fixing jig 31... Clamping Parts 32... Adjusting part 33... Through hole 40... Curing resin 50... Polishing layer 50a... Polishing surface 51... End point detection window 52... Cushion layer 53... Adhesive layer 54... Adhesive layer 55 Groove 61 Adhesive sheet 62 Release sheet 71 Other layer 90 Top ring 91 Table 92 Slurry 93 Film thickness detection sensor 94 Polishing device 100 First production Apparatus 110 Conveying mechanism 120 Imaging device 130 Hole forming device 141 Roller 142 Roller 143 Roller 200 Second manufacturing device 210 Conveying mechanism 220 Imaging device 230 Hole Forming device 241 Roller 242 Roller L Length of portion having convex shape Lw Total length S Cross-sectional area S1 Area W Wafer

Claims (20)

  1.  終点検出窓付き研磨層を備える研磨パッドの製造方法であって、
     金型内に終点検出窓用部材を固定し、該終点検出窓用部材と接触した状態で硬化性樹脂を硬化して、前記終点検出窓用部材が組み込まれた樹脂シートを形成する硬化工程と、
     前記樹脂シートをスライスして研磨層を形成するスライス工程と、を有し、
     前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した位置固定治具により吊り下げられて固定される、
     研磨パッドの製造方法。
    A method for manufacturing a polishing pad comprising a polishing layer with an endpoint detection window, comprising:
    a curing step of fixing an endpoint detection window member in a mold and curing a curable resin in a state of contact with the endpoint detection window member to form a resin sheet in which the endpoint detection window member is incorporated; ,
    a slicing step of slicing the resin sheet to form a polishing layer;
    In the curing step, the end point detection window member is suspended and fixed by a position fixing jig installed above the mold.
    A method for manufacturing a polishing pad.
  2.  前記硬化工程において、前記金型内に硬化性樹脂を充填してから、前記終点検出窓用部材を前記硬化性樹脂に接触させて、前記硬化性樹脂を硬化する、
     請求項1に記載の研磨パッドの製造方法。
    In the curing step, the mold is filled with a curable resin, and then the end point detection window member is brought into contact with the curable resin to cure the curable resin.
    A method for manufacturing the polishing pad according to claim 1 .
  3.  前記硬化工程において、前記金型内に前記終点検出窓用部材を固定してから、硬化性樹脂を充填して硬化する、
     請求項1に記載の研磨パッドの製造方法。
    In the curing step, after fixing the end point detection window member in the mold, a curable resin is filled and cured.
    A method for manufacturing the polishing pad according to claim 1 .
  4.  前記位置固定治具が、前記金型上部と嵌合する第1嵌合部を有する、及び/又は、
     前記金型が、前記位置固定治具と嵌合する第2嵌合部を有する、
     請求項1~3のいずれか一項に記載の研磨パッドの製造方法。
    The position fixing jig has a first fitting part that fits with the mold upper part, and/or
    The mold has a second fitting portion that fits with the position fixing jig,
    A method for manufacturing a polishing pad according to any one of claims 1 to 3.
  5.  前記位置固定治具が、前記終点検出窓用部材を位置決めして固定する位置決め部を有する、
     請求項1~4のいずれか一項に記載の研磨パッドの製造方法。
    The position fixing jig has a positioning portion that positions and fixes the end point detection window member,
    A method for producing a polishing pad according to any one of claims 1 to 4.
  6.  前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した前記位置固定治具の挟持部により挟持されることで、吊り下げられて固定され、
     前記挟持部は、前記終点検出窓用部材を着脱可能に挟持する、
     請求項1~5のいずれか一項に記載の研磨パッドの製造方法。
    In the curing step, the end point detection window member is suspended and fixed by being clamped by the clamping part of the position fixing jig installed on the upper part of the mold,
    The holding portion detachably holds the end point detection window member,
    A method for manufacturing a polishing pad according to any one of claims 1 to 5.
  7.  前記硬化工程において、前記終点検出窓用部材が、前記金型上部に設置した前記位置固定治具の挟持部により挟持されることで、吊り下げられて固定され、
     吊り下げられて固定された際の前記終点検出窓用部材の下端が、凸面形状を有する、
     請求項1~6のいずれか一項に記載の研磨パッドの製造方法。
    In the curing step, the end point detection window member is suspended and fixed by being clamped by the clamping part of the position fixing jig installed on the upper part of the mold,
    A lower end of the endpoint detection window member when suspended and fixed has a convex shape,
    A method for producing a polishing pad according to any one of claims 1 to 6.
  8.  前記終点検出窓用部材の前記凸面形状を有する部分の長さLが、3.0~20mmである、
     請求項7に記載の研磨パッドの製造方法。
    The length L of the portion having the convex shape of the endpoint detection window member is 3.0 to 20 mm.
    A method for manufacturing a polishing pad according to claim 7 .
  9.  前記終点検出窓用部材の前記凸面形状を有する部分の長さLと、前記終点検出窓用部材の水平方向の断面積Sとの比(L/S)が、0.002~0.4である、
     請求項7又は8に記載の研磨パッドの製造方法。
    The ratio (L/S) of the length L of the convex portion of the endpoint detection window member to the horizontal cross-sectional area S of the endpoint detection window member is 0.002 to 0.4. be,
    A method for manufacturing a polishing pad according to claim 7 or 8.
  10.  前記終点検出窓用部材の前記凸面形状を有する部分の長さLが、前記終点検出窓用部材の全長Lwに対して、0.03~0.30Lwである、
     請求項7~9のいずれか一項に記載の研磨パッドの製造方法。
    The length L of the portion having the convex shape of the end point detection window member is 0.03 to 0.30 Lw with respect to the total length Lw of the end point detection window member.
    A method for producing a polishing pad according to any one of claims 7 to 9.
  11.  前記終点検出窓用部材の製造工程をさらに含み、
     該製造工程が、
     窓材原料であるポリイソシアネートとポリオールと硬化剤の一部とを混合し、第1の反応混合物を調製する第1混合工程と、前記第1の反応混合物と前記硬化剤の残部とを混合し、第2の反応混合物を調製する第2混合工程と、前記第2の反応混合物を硬化して、前記終点検出窓用部材を得る窓材硬化工程と、を含み、
     前記窓材原料に含まれる前記硬化剤が3以上の官能基を有する、
     請求項1~10のいずれか一項に記載の研磨パッドの製造方法。
    further comprising a step of manufacturing the endpoint detection window member,
    The manufacturing process is
    A first mixing step of mixing polyisocyanate, polyol, and part of a curing agent, which are raw materials for window materials, to prepare a first reaction mixture, and mixing the first reaction mixture with the remainder of the curing agent. , a second mixing step of preparing a second reaction mixture, and a window material curing step of curing the second reaction mixture to obtain the endpoint detection window member,
    The curing agent contained in the window material raw material has 3 or more functional groups.
    A method for manufacturing a polishing pad according to any one of claims 1 to 10.
  12.  前記窓材原料に含まれる前記硬化剤が、分子量300未満の低分子量ポリオールを含む、
     請求項11に記載の研磨パッドの製造方法。
    The curing agent contained in the window material raw material contains a low-molecular-weight polyol having a molecular weight of less than 300.
    A method for manufacturing a polishing pad according to claim 11 .
  13.  前記窓材原料に含まれる前記ポリオールが、分子量300以上の高分子量ポリオールを含む、
     請求項11又は12に記載の研磨パッドの製造方法。
    The polyol contained in the window material raw material contains a high-molecular-weight polyol having a molecular weight of 300 or more.
    A method for manufacturing a polishing pad according to claim 11 or 12.
  14.  前記窓材原料に含まれる前記ポリイソシアネートが、脂環族ポリイソシアネート及び/又は脂肪族ポリイソシアネートを含む、
     請求項11~13のいずれか一項に記載の研磨パッドの製造方法。
    The polyisocyanate contained in the window material raw material contains an alicyclic polyisocyanate and/or an aliphatic polyisocyanate.
    A method for manufacturing a polishing pad according to any one of claims 11 to 13.
  15.  前記樹脂シートの開口に設けられた終点検出窓の位置情報を取得する第1取得工程と、
     前記位置情報に基づいて、粘着シート上の前記終点検出窓の設置位置に相当する部分に、孔を形成する第1孔形成工程と、
     前記終点検出窓と前記孔とを位置合わせして、前記樹脂シートと前記粘着シートの粘着面とを貼り合わせる第1貼合工程と、を有する、
     請求項1~14のいずれか一項に記載の研磨パッドの製造方法。
    a first acquisition step of acquiring position information of an endpoint detection window provided in the opening of the resin sheet;
    a first hole forming step of forming a hole in a portion corresponding to the installation position of the end point detection window on the adhesive sheet based on the position information;
    a first bonding step in which the end point detection window and the hole are aligned and the resin sheet and the adhesive surface of the adhesive sheet are bonded together;
    A method for manufacturing a polishing pad according to any one of claims 1 to 14.
  16.  前記位置情報が、撮像装置により得られた画像情報、又は、前記樹脂シートに当てたレーザー光のうち前記終点検出窓を透過したレーザー光をレーザー受光機により受信して得られた情報に基づくものである、
     請求項15に記載の研磨パッドの製造方法。
    The positional information is based on image information obtained by an imaging device, or information obtained by receiving, with a laser receiver, the laser beam that has passed through the end point detection window among the laser beams applied to the resin sheet. is
    A method for manufacturing a polishing pad according to claim 15 .
  17.  前記第1孔形成工程において、前記終点検出窓よりも小さい前記孔を形成する、
     請求項15又は16に記載の研磨パッドの製造方法。
    forming the hole smaller than the endpoint detection window in the first hole forming step;
    A method for manufacturing a polishing pad according to claim 15 or 16.
  18.  前記位置情報が、前記終点検出窓の中心位置に関する情報を含み、
     前記第1孔形成工程において、前記終点検出窓の中心位置と前記孔の中心位置が一致するように前記孔を形成する、
     請求項15~17のいずれか一項に記載の研磨パッドの製造方法。
    the position information includes information about the center position of the endpoint detection window;
    In the first hole forming step, the hole is formed so that the center position of the endpoint detection window and the center position of the hole match.
    A method for manufacturing a polishing pad according to any one of claims 15 to 17.
  19.  前記粘着シートが、両面テープ、又は、両面テープと他の層との積層体である、
     請求項15~18のいずれか一項に記載の研磨パッドの製造方法。
    The pressure-sensitive adhesive sheet is a double-sided tape or a laminate of a double-sided tape and another layer,
    A method for manufacturing a polishing pad according to any one of claims 15 to 18.
  20.  前記粘着シートが前記両面テープである場合に、
     前記樹脂シート上の前記両面テープに形成された孔の位置情報を取得する第2取得工程と、
     前記位置情報に基づいて、他の層上の前記終点検出窓の設置位置に相当する部分に、孔を形成する第2孔形成工程と、
     前記両面テープにおける前記孔と前記他の層における前記孔とを位置合わせして、前記樹脂シート上の前記両面テープと前記他の層とを貼り合わせる第2貼合工程と、を有する、
     請求項19に記載の研磨パッドの製造方法。
    When the adhesive sheet is the double-sided tape,
    a second acquisition step of acquiring position information of holes formed in the double-sided tape on the resin sheet;
    a second hole forming step of forming a hole in a portion corresponding to the installation position of the endpoint detection window on another layer based on the position information;
    a second bonding step of aligning the holes in the double-sided tape with the holes in the other layer and bonding the double-sided tape on the resin sheet and the other layer;
    A method for manufacturing a polishing pad according to claim 19 .
PCT/JP2022/007227 2021-03-24 2022-02-22 Method for manufacturing polishing pad WO2022202059A1 (en)

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JP2021-050341 2021-03-24
JP2021050341A JP2022148596A (en) 2021-03-24 2021-03-24 Manufacturing method of polishing pad
JP2021-051702 2021-03-25
JP2021051702A JP2022149504A (en) 2021-03-25 2021-03-25 Polishing pad manufacturing method
JP2021156497A JP2023047530A (en) 2021-09-27 2021-09-27 Method for manufacturing polishing pad
JP2021-156530 2021-09-27
JP2021-156483 2021-09-27
JP2021156530A JP2023047558A (en) 2021-09-27 2021-09-27 Method for manufacturing polishing pad
JP2021156483A JP2023047519A (en) 2021-09-27 2021-09-27 Polishing pad and method for producing polished workpiece
JP2021-156497 2021-09-27
JP2021160631A JP2023050503A (en) 2021-09-30 2021-09-30 Manufacturing method of window material for endpoint detection
JP2021-160631 2021-09-30

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JP2006069158A (en) * 2004-09-06 2006-03-16 Bridgestone Corp Molding mold and molding method
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JP2012071416A (en) * 2010-09-29 2012-04-12 Rohm & Haas Electronic Materials Cmp Holdings Inc Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith
JP2012524672A (en) * 2009-04-23 2012-10-18 アプライド マテリアルズ インコーポレイテッド Polishing pad window processing
JP2013539233A (en) * 2010-09-30 2013-10-17 ネクスプラナー コーポレイション Polishing pad for eddy current end point detection

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JPS4530584B1 (en) * 1965-12-02 1970-10-03
JP2005210143A (en) * 1995-08-21 2005-08-04 Rohm & Haas Electronic Materials Cmp Holdings Inc Manufacturing method of polishing pad and polishing pad
JP2006069158A (en) * 2004-09-06 2006-03-16 Bridgestone Corp Molding mold and molding method
JP2006110686A (en) * 2004-10-15 2006-04-27 Toyo Tire & Rubber Co Ltd Polishing pad
JP2012524672A (en) * 2009-04-23 2012-10-18 アプライド マテリアルズ インコーポレイテッド Polishing pad window processing
JP2012071416A (en) * 2010-09-29 2012-04-12 Rohm & Haas Electronic Materials Cmp Holdings Inc Chemical mechanical polishing pad with light stable polymeric endpoint detection window and method of polishing therewith
JP2013539233A (en) * 2010-09-30 2013-10-17 ネクスプラナー コーポレイション Polishing pad for eddy current end point detection

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