WO2022183738A1 - Reactor for chemical vapor deposition method-based coated glass - Google Patents

Reactor for chemical vapor deposition method-based coated glass Download PDF

Info

Publication number
WO2022183738A1
WO2022183738A1 PCT/CN2021/123791 CN2021123791W WO2022183738A1 WO 2022183738 A1 WO2022183738 A1 WO 2022183738A1 CN 2021123791 W CN2021123791 W CN 2021123791W WO 2022183738 A1 WO2022183738 A1 WO 2022183738A1
Authority
WO
WIPO (PCT)
Prior art keywords
chamber
reaction
reactor
gas
exhaust
Prior art date
Application number
PCT/CN2021/123791
Other languages
French (fr)
Chinese (zh)
Inventor
韩高荣
刘军波
刘涌
莫建良
Original Assignee
浙江大学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 浙江大学 filed Critical 浙江大学
Publication of WO2022183738A1 publication Critical patent/WO2022183738A1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/245Oxides by deposition from the vapour phase
    • C03C17/2456Coating containing TiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/212TiO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/152Deposition methods from the vapour phase by cvd

Definitions

  • the invention relates to the field of on-line production of coated glass by a flat glass production line, in particular to a reactor for coating glass by chemical vapor deposition.
  • Coated glass is one of the important building materials in the field of building energy saving. It not only retains the light transmission properties of windows, but also develops into a glass that can effectively block heat transfer.
  • the coated glass is heated and tempered into insulating glass or vacuum glass. It is endowed with many new functions such as special energy saving, environmental protection, safety and decoration of ordinary flat glass; at the same time, because coated glass has good electrical conductivity and thermal processing properties, it becomes the substrate glass for solar cells and electronic products.
  • Coated glass can be divided into two processes: online coated glass and offline coated glass according to the manufacturing process.
  • the so-called online coated glass is the process in which raw materials such as quartz sand are melted and clarified in a furnace to manufacture flat glass, and the coating is grafted in a suitable temperature range.
  • Equipment the coating precursor is evenly sprayed on the glass surface with a higher temperature through the coating equipment, the coating precursor is pyrolyzed at high temperature, and the reactant is deposited on the glass plate to form a process with a certain functional film layer;
  • the main process of offline coating technology is vacuum cathode magnetron sputtering coating process, which means that the original flat glass sheet is washed and dried and then transported to a vacuum chamber.
  • the core equipment of online coating is a reactor that can uniformly coat the entire glass production line in the width direction.
  • the mainstream process of online coating implementation is grafting on the float glass production line.
  • the float glass production line is composed of raw material system, melting furnace, tin bath, transition roller table, annealing kiln, online monitoring system, cold end cutting and packing.
  • the online coating position is mainly in the area where the temperature of the tin bath and the annealing kiln is 500 ⁇ 700°C, and the width of this area is generally between 4000 ⁇ 5600mm, so this requires the main equipment of the online coating here - coating reaction It has good thermal stability, good rigidity, and at the same time, it has an inlet chamber that meets the temperature required for the reaction precursor, a reaction chamber that is different from the temperature requirement of the inlet chamber, and an exhaust chamber that can be evenly arranged in the lateral direction of the glass ribbon. Air chamber.
  • the main companies with float glass coating technology are: Pilkington Company of the United Kingdom, PPG Company of the United States, Saint-Gobain Company of France, Graveble Company of Belgium, and Weihai my country Glass New Material Technology Research and Development Co., Ltd., etc.
  • American PPG and French Saint-Gobain originally purchased the patented technology of Pilkington, UK.
  • the common feature of these three companies is to arrange coating equipment in the reducing atmosphere in the tin bath, while the Belgian Graveber and Weihai
  • the characteristic of Glass New Material Technology R&D Co., Ltd. is that the coating equipment is arranged in the oxidizing atmosphere of the transition table and the A0 area of the annealing kiln.
  • US Patent US4088471A introduces a U-shaped single-channel reactor used in the low temperature section of the tin bath of a float glass production line.
  • the inlet chamber of the reactor is immersed in the cooling medium water of the steel beam, and consists of an upstream block, a central block and a downstream block.
  • the equipment uses the water temperature to keep the temperature of the intake chamber constant below 100 °C. Water is the cooling medium of the steel beam as a whole. The temperature of the reaction zone is controlled by an insulating gasket to adjust the interface temperature of the reaction zone.
  • Elemental silicon is very effective. Its advantage is that it is suitable for deposition and coating process of small flow, low temperature and pure gas.
  • the disadvantage is that the temperature of the reaction zone is greatly affected by the cooling medium water, and the temperature of the reaction chamber can only be within the cooling medium cooling range. , the control cannot be adjusted arbitrarily.
  • US Patent US4857097A proposes structural improvements in related processes, such as changing the toe structure of the downstream block of the U-shaped channel to a circular arc, so as to introduce the outside gas medium, improve the coating cycle, and play a very important role.
  • Connecting the exhaust chamber to the main steel beam is beneficial to the stability of the exhaust chamber and the intake chamber.
  • the temperature control of the reaction zone and the temperature control of the inlet chamber remain as they were.
  • U.S. Patent US5065696A introduces a reactor capable of implementing double U-shaped channels and a single U-shaped channel reactor.
  • the patent specification describes the use of steel parts to form a bearing steel beam with cooling medium cooling across the float process.
  • two relatively independent air inlet chambers without direct cooling medium are provided with air distributors at the outlet nozzles, and the lower end is composed of a central block with good thermal conductivity and a mixing chamber with a fingerboard that promotes mixing , so that the gas enters the mixing chamber from the independent inlet chamber through the respective nozzles and is mixed and guided to the upper surface of the hot glass ribbon.
  • the temperature of the central block is controlled by the electric heating element, and the unreacted or reaction product waste gas enters the exhaust channel, and the exhaust gas is discharged. There is an even exhaust fingerboard in the air channel.
  • US Patent US5286295A introduces a reactor with a single-entry double-row double U-shaped structure composed of four graphites of different shapes.
  • the patent specification analyzes in detail the optimal length of the upstream and downstream reaction zones within the same reaction time. It adapts to the problem that the reaction gas flow is large and the reaction is uniform, which lays a theoretical foundation for the practical application of the reactor.
  • US patent US9540277B2 introduces a single-inlet, double-row, double-U-shaped structure reactor capable of separating various reactants from each other and composed of four main parts to form an inlet channel, a gas distribution channel, a reaction channel and an exhaust channel.
  • the air intake channel is a uniform air distribution chamber for air intake composed of main body parts, cover plate parts, baffle parts and gas adjustment parts.
  • the temperature control of this part mainly relies on the cooling pipe in the middle of the main body part. To meet the temperature of the reaction chamber and the temperature of the intake air, the control is difficult, the use effect is single, and the requirements for the precursor material of the reaction are relatively strong.
  • the glass plate is less than 10mm, which is not conducive to the implementation of gas uniformity, especially the implementation of large-flow reactive gas coating reaction.
  • Chinese patent ZL201510014233.1 proposes an online float glass atmospheric pressure chemical vapor deposition coating reactor that utilizes waste heat of exhaust gas and has the effect of enhancing convective heat transfer, adjusting the airflow on the surface of the glass ribbon, and preventing the backflow of dust exhaust process.
  • the mixing chamber and the exhaust gas chamber are arranged in the thermal insulation shell, the pre-mixing chamber is connected to the gas inlet pipe of the coating precursor, and the pre-mixing chamber is embedded in the exhaust gas chamber. Decrease the coating reaction temperature. However, independent control of the temperature of the premix chamber and the exhaust chamber is not achieved.
  • the present invention provides a reactor for coating glass by chemical vapor deposition, including an air inlet chamber, a steel beam carrier, a gas U-shaped channel and an exhaust chamber, etc. , a chemical vapor deposition process can be used to deposit a film with certain functions on a glass substrate that moves heat.
  • a reactor for chemical vapor deposition coated glass comprising an air inlet chamber and a steel beam carrier capable of independently and uniformly distributing gas independently and uniformly to the incoming reaction gas in the length direction of the reactor;
  • the intake chamber :
  • the pressure equalization cavity is provided with an air inlet pipe for the reaction gas to enter, and a plurality of small holes are regularly distributed along the length direction of the reactor on the pipe wall of the air inlet pipe;
  • a damping belt with a plurality of micropores for uniform air distribution is arranged, and the damping belt is selected from a sintered plate or a stacked orifice plate, and the stacked orifice plate is composed of longitudinally arranged and alternately distributed Composed of flat belt and toothed belt.
  • the steel beam bearing body includes:
  • an air intake passage communicating with the outlet of the air intake chamber and having an adjustable temperature gradient from top to bottom;
  • reaction gas in the reaction gas can be coated with the hot glass ribbon, and the concentration and flow rate are uniform;
  • an exhaust channel that communicates with the outlet of the reaction chamber and can uniformly discharge the reaction waste gas in the length direction of the reactor;
  • an exhaust chamber communicating with the outlet of the exhaust passage and capable of discharging the reaction exhaust gas, and a cooling medium cavity for controlling the temperature of the reaction exhaust gas in the exhaust chamber is arranged around the exhaust chamber;
  • the intake chamber, the intake channel, the reaction chamber, the exhaust channel, and the exhaust chamber constitute a reaction gas channel, wherein the intake channel, the reaction chamber, and the exhaust channel constitute a single U-shaped or double U-shaped channel, and the reaction The gas undergoes preheating, reaction and discharge processes in this channel;
  • the air inlet chamber is connected to the steel beam carrier by a non-welded form (for example, through a pressing device), and the steel structure of the air inlet chamber is independent of the steel structures of the reaction chamber and the exhaust chamber.
  • the invention realizes the different temperature control of the air inlet chamber and the reaction chamber, and the exhaust chamber which can be evenly arranged in the lateral direction of the glass ribbon. , suitable for flat glass production line applications.
  • the existing technology and the chemical vapor deposition device used are only suitable for pure gas or a single vaporized gas mixture operating at a certain temperature.
  • the temperature of the reaction mixture cannot be adjusted according to the requirements of different raw material characteristics.
  • the temperature of the reaction chamber and the temperature of the inlet chamber are related, that is, when the temperature of the reaction chamber increases, the temperature of the inlet chamber also increases accordingly, and it is easy to produce an early reaction in the inlet chamber, which affects the coating efficiency and quality.
  • the reactor of the present invention is different from the known chemical vapor reaction deposition device.
  • the inlet chamber is relatively independent from the inlet passage, reaction chamber, exhaust passage, exhaust chamber, etc.
  • the inlet chamber can be independently heated, which can be more suitable for coating
  • the requirements of the precursor raw materials for coating production, and the reactor of the present invention also has the function of uniform gas distribution in the vertical glass advancing direction, that is, the length direction of the reactor (in Figure 1, the direction perpendicular to the paper).
  • the air inlet chamber includes a pressure equalization cavity and a heat medium cavity surrounding the pressure equalization cavity, controlled by an external control system, and used to control the temperature of the reaction gas in the pressure equalization cavity.
  • the pressure equalization cavity can ensure stable and balanced pressure in the length direction of the reactor under the premise of a certain reaction gas flow rate, and its outlet is connected with the air inlet channel.
  • the pressure equalizing cavity and the heat medium cavity are welded by high-quality carbon steel with a thickness of not less than 5 mm, and the pressure resistance and air tightness are greater than 0.5 MPa/24h.
  • the heat medium in the heat medium cavity may be water or heat-conducting oil, preferably heat-conducting oil. Further preferably, the heat transfer oil with a temperature resistance of 320°C or higher.
  • the pressure equalizing cavity is provided with an air inlet pipe for the reaction gas to enter.
  • the diameter of the air intake pipe is preferably 10 to 35 mm, more preferably 15 to 25 mm.
  • a plurality of small holes are regularly distributed on the wall of the air inlet pipe along the length direction of the reactor, so as to ensure stable and balanced pressure and uniform gas distribution in the length direction of the reactor.
  • the diameter of the small holes is preferably 1-5 mm, more preferably 1-3 mm, most preferably 1.5-2 mm, and the spacing is preferably 5-25 mm, more preferably 5-15 mm, and most preferably 10 mm.
  • a damping belt with a plurality of micro-holes for uniform air distribution is provided at the outlet of the bottom of the pressure equalizing cavity.
  • the diameter of the micropores is preferably 0.2 to 1.5 mm, more preferably 0.5 to 0.8 mm.
  • the damping band can be fixed on the lower end of the pressure equalizing cavity by clamping with two fixing blocks.
  • the height of the damping belt is preferably not less than 15 mm, more preferably 20 mm, and the thickness is preferably 5-25 mm, and further preferably 7-15 mm.
  • the damping band is preferably made from a sintered plate or a perforated plate.
  • the perforated plate preferably consists of longitudinally arranged and alternately distributed flat belts and toothed belts.
  • the flat belt and toothed belt are preferably made of stainless steel.
  • the thickness of the flat belt is preferably 0.05-0.5mm, more preferably 0.08-0.15mm, and the peak-to-valley range of the toothed belt (referring to the height difference between the peak and the trough when the toothed belt is laid flat) is preferably 0.3 ⁇ 1.5 mm, more preferably 0.5 to 0.75 mm, and the distance between the crests is preferably not more than 1.5 mm, more preferably 1.0 mm.
  • the intake passage is surrounded by a first steel structure and an upstream block, a center block, or a first steel structure and two center blocks, and the first steel structure is used to form the refrigerant medium cavity, and the row
  • the air chamber, the cooling medium cavity and the center block are all located on the inner side of the U-shaped channel.
  • the center block is located under the first steel structure and the gap between the center block and the first steel structure is adjustable, so that the center can be adjusted.
  • the temperature of the block is to meet the conditions for the reaction gas to deposit the functional film on the upper surface of the glass.
  • the gap between the first steel structure and the center block can be adjusted by adding spacers.
  • the temperature of the center block is preferably 150 to 500°C, more preferably 180 to 380°C.
  • the temperature of the inlet passage gradually increases from top to bottom, forming a preheating passage for the reaction gas.
  • the temperature of the preheating channel is preferably 50-420°C, more preferably 100-350°C.
  • the width of the air intake passage is preferably 5 to 25 mm, more preferably 7 to 15 mm.
  • the reaction chamber is a reaction channel for coating formed by the central block and the hot glass ribbon, and the reaction chamber is directly placed on the hot glass ribbon. Under the guidance of the channel, the reactant gas is rapidly preheated, contacts with the hot glass ribbon in the reaction chamber, a chemical reaction occurs, and the reaction product is deposited on the hot glass ribbon to form a film with certain functions.
  • the temperature is the highest, and the temperature of the cold medium above the central block is lower.
  • the temperature range of the central block in the middle can be controlled, such as An intake passage with a gradually increasing temperature from top to bottom can be formed.
  • the material of the center block is preferably silicon carbide or graphite, and the graphite includes isostatic graphite, high-purity graphite, anode graphite, and the like.
  • the exhaust passage is surrounded by the center block and the exhaust block, and the width is preferably 10-40 mm, more preferably 20-35 mm.
  • the exhaust chamber is controlled to a constant temperature through the cooling medium cavity, so as to ensure the stable air pressure in the exhaust chamber, which is conducive to the stable and uniform extraction of exhaust gas.
  • the exhaust chamber is welded by high-strength carbon steel plates and pipes.
  • the exhaust chamber communicates with the exhaust passage through a slit.
  • a plurality of the slits may be provided along the length of the reactor.
  • the length of the slit opening along the length direction of the reactor is preferably 200-450 mm, more preferably 250-350 mm, and the height along the vertical direction of the reactor is preferably 1.5-12.5 mm, more preferably 2-12 mm.
  • the length and width of each slit can be set independently.
  • the cooling medium in the cooling medium cavity may be water or heat-conducting oil, preferably heat-conducting oil.
  • the length of the single U-shaped channel horizontal section used for coating is preferably not more than 300 mm, more preferably 120-280 mm, and still more preferably 160-265 mm.
  • the total length of the double U-shaped channel horizontal section used for coating is preferably not more than 550 mm, more preferably 400-465 mm.
  • the steel structure of the intake chamber is connected with the steel structures of the reaction chamber and the exhaust chamber through slider bolts, and the connection is preferably provided with a thermal insulation material for thermal insulation.
  • the thermal insulation material includes aluminum silicate fiber felt and the like.
  • the present invention also provides a method for depositing a coating film by using the reactor, comprising: the reaction gas is preheated in the air inlet chamber and then flows into the air inlet channel after being preheated and distributed at a constant pressure, and after further preheating Arriving in the reaction chamber, the reaction gas reacts chemically on the glass surface, the product is deposited on the glass surface to form a film, and the reaction waste gas containing the reaction gas flows into the exhaust chamber through the exhaust passage and is discharged to the outdoor or recovery device.
  • the invention mainly relates to a special equipment and method for making coated glass on a flat glass production line, especially a float glass production line by chemical vapor deposition, which can be widely used in flat glass, especially a float glass production line.
  • the inlet chamber of the reactor of the present invention is relatively independent from the inlet passage, the reaction chamber, the exhaust passage, the exhaust chamber, etc., the inlet chamber can be independently heated, and is not affected by the
  • the influence of the steel beam carrier can better meet the requirements of the coating precursor raw materials for coating production, better realize the inlet temperature gradient and preheating effect, and avoid problems such as the reaction of the reaction gas in the inlet chamber.
  • the reactor of the present invention also has the function of uniform gas distribution in the vertical glass advancing direction, that is, the length direction of the reactor.
  • the setting of the damping belt also makes the flow of the reaction gas in the air inlet channel more stable and uniform, which is beneficial to the subsequent coating of the reaction chamber.
  • Fig. 1 is the cross-sectional structure schematic diagram of the single U-shaped channel coating reactor of the present invention
  • Fig. 2 is the cross-sectional structural schematic diagram of the steel beam carrier and the reaction chamber of the single U-channel coating reactor of the present invention
  • FIG. 3 is a schematic diagram of the cross-sectional structure of the air inlet chamber of the single U-channel coating reactor of the present invention.
  • Fig. 4 is the cross-sectional structure schematic diagram of the double U-shaped channel coating reactor of the present invention.
  • Fig. 5 is the cross-sectional structural schematic diagram of the steel beam carrier and the reaction chamber of the double U-shaped channel coating reactor of the present invention
  • FIG. 6 is a schematic diagram of the cross-sectional structure of the air inlet chamber of the double U-channel coating reactor of the present invention.
  • the float glass production line is that the glass raw materials mixed according to a certain proportion are continuously put into the float glass melting furnace through the conveying device, and the molten glass solution with certain fluidity is formed through the chemical reaction of high temperature melting.
  • the runner gate controls a certain flow rate, so that the molten glass flows into the tin bath, and the space in the tin bath and the temperature of the tin bath are jointly controlled by the electric heating controller and the tin bath cooler, so that the glass liquid is gradually cooled to form a certain width.
  • the glass sheet with the thickness and thickness is drawn into the annealing furnace for annealing, and finally the glass product is formed.
  • the tin bath is composed of a space protected by a mixed gas of nitrogen and hydrogen and the molten metal tin is carried. It can be seen that the tin bath space is a reducing atmosphere, which prevents the oxidation of the molten tin liquid and makes the glass liquid or glass plate float on it at the same time. Float glass with high flatness is formed.
  • the reactors 1 and 4 for chemical vapor deposition coated glass according to the present invention are all devices implemented in the float glass production line, and are suitable for single or multiple gases to carry out chemical vapor deposition reaction.
  • the device is suitable for the reaction of different total amount of gas, and it is also suitable for various kinds of chemical vapor deposition reactions that can be produced on a hot substrate by vaporizing the coating precursor to form a gaseous substance to form a film layer with different design requirements, as described here.
  • a hot substrate such as a hot float glass substrate 68, uniformly produces glass with a solar thermal reflection, low emissivity or transparent conductive film coating by chemical vapor deposition film formation on the hot substrate.
  • one of the main bodies of the film coating reactor device 1 of the present invention is an air inlet chamber 2, which is provided with a chamber 50 (ie, a pressure equalizing cavity) to accommodate the coating reaction gas, and a chamber is provided in the chamber.
  • the inlet pipe 22 is made of 304 or 316L stainless steel. The pipe traverses the gas chamber in the length direction of the coating reactor. The diameter of the pipe 22 is not greater than 32mm.
  • the spacing is most preferably 10mm;
  • the diameter of the small hole is between 1mm and 5mm, and the size of the small hole is preferably between 1mm and 3mm; the diameter of the small hole is most preferably 1.5mm to 2mm;
  • the diameter of the trachea is preferably 15-25mm, the diameter of the holes is preferably 2mm, and the spacing between the holes is preferably 10mm;
  • the air damping belt installed at the lower end of the cavity 50 is connected with the long slit 26 with a width W9, wherein the width W9 of the long slit 26 corresponding to the reactor 1 is not greater than 10mm, and the device of the present invention is preferably 7mm; the long slit is installed With a damping belt with uniform air distribution, the damping belt is preferably but not limited to sintered plates and perforated plates of a certain thickness.
  • the device of the present invention preferentially selects a perforated plate, and the perforated plate is made of 304 or 316L stainless steel flat plate.
  • the belt is composed of a stainless steel toothed belt.
  • the thickness of the flat belt is between 0.05mm and 0.5mm.
  • the device of the present invention is preferably 0.08 to 0.15mm. It is preferably 0.5-0.75mm, the distance between the crests is not more than 1.5mm, and the preferred distance between the crests is 1.0mm; the damping belt is fixed on the lower end of the cavity 50 by clamping two fixing blocks 23; the height H1 of the damping belt is not less than 15mm , the height H1 of the damping belt of the coating film reactor 1 of the present invention is preferably 20 mm.
  • the heat medium cavities 24 and 84 are respectively composed of high-strength welded steel plates or profiles 25, 27, 28, and 29 to form the heat medium cavities 24 and 84.
  • the inflow of the heat medium cavity is not limited to water.
  • hot oil and other media the device of the present invention preferably uses heat transfer oil with a maximum temperature of not lower than 320 ° C. The heat transfer oil is accurately controlled to the temperature required by the project precursor through electric heating on the outside, so as to keep the chamber 50 in the process. controlled temperature.
  • connection between the air inlet chamber 2 of the main body of the coating film reactor device 1 of the present invention and the upper end of the steel beam carrier 3 of the other main body is performed by co-fastening the special pressure block and high temperature resistant bolts, and the lower end is fastened together.
  • the seal is fixed by the limit groove and the seal.
  • the steel beam carrier 3 of the other main body of the coating reactor device 1 of the present invention contains an inlet preheating channel 7 (ie, an inlet channel) of the reaction precursor, a reaction chamber 66 formed with hot flat glass, and a reaction pair.
  • the exhaust channel 8 of the product exhaust gas and the unreacted precursor, the exhaust chamber 9 and the bearing beam 69 carrying the first four functions, the steel beam bearing body 3 is processed and manufactured from profiles of various materials.
  • the air inlet channel 7 of the steel beam carrier 3 of the coating reactor 1 of the present invention is composed of metal profiles 19, 20, and upstream blocks 12 and center blocks 13 processed from non-metallic materials.
  • the metal profiles 19, 20 are in this
  • channel-shaped steel materials are preferred, while the upstream block 12 and the center block 13 are silicon carbide and graphite with fast heat transfer, uniform thermal conductivity, and machinability.
  • isostatic graphite and high-purity graphite are preferred.
  • the inlet channel 7 is connected to the outlet of the damping zone of the inlet chamber, the coating reaction precursor gas is gradually heated isothermally under the control of a certain flow rate, and the gas leaves the damping zone to the inlet channel 7 After good homogenization, it is guided to the hot and clean glass ribbon 68 , and the cavity space 66 formed by the hot glass ribbon 68 and the central block 13 becomes the key area for chemical reaction, and the reactive substances are deposited on the hot glass ribbon 68 .
  • the chambers 58, 59, 60, 61, 62, 63, 64, and 65 composed of metal material profiles are the passages for the cooling medium of the entire bearing beam.
  • the cooling medium is mainly water and high-temperature hot oil.
  • the cooling medium used in the device of the present invention is mainly water, and the temperature of the water is controlled not to exceed 35°C, and the device of the present invention preferably does not exceed 25°C.
  • the coating reactor 1 of the present invention is suitable for the mixed gas flow in a completely laminar state.
  • the Reynolds number Re is a dimensionless parameter that can accurately describe the gas flow state, that is, Among them, ⁇ and ⁇ are the density and dynamic viscosity coefficient of the gas, and ⁇ is the gas flow rate. Therefore, under a given gas condition, the Reynolds number is proportional to the gas flow rate.
  • the experimental results show that the Reynolds number is less than 2300 flow is laminar, and the Reynolds number for fluid in two parallel plates b is the distance between two flat plates, the Reynolds number of the film coating reactor 1 of the present invention is required to be no greater than 350, and the Reynolds number of the coating film reactor 1 of the present invention is preferably no greater than 200.
  • the size of the slit width W1 of the inlet channel 7 of the reactor is not greater than 10mm, and the slit width W1 of the present invention is preferably 7mm; it also illustrates that the total flow rate of the maximum mixed gas of the coating reactor 1 of the present invention is not greater than 10Nm 3 / h, the coating reactor 1 of the present invention preferably has a total mixed gas volume of 8.5 Nm 3 /h.
  • the height H2 of the air inlet channel 7 of the film coating reactor 1 of the present invention is not less than 100 mm, and the height H2 of the air inlet channel 7 of the film coating reactor 1 of the present invention is preferably 125 mm;
  • the total height H4 of the key reaction chamber 66 is not greater than 12mm, and H4 is preferably 8mm in the present invention, and the flow length W2 of the reaction mixture is not greater than 300mm, the coating reactor of the present invention is preferably 120mm ⁇ 300mm, and the best consideration is preferably 160 ⁇ 265mm ;
  • the deposition rate and deposition time of the coating film reactor 1 of the present invention are determined by the pulling speed ⁇ f of the float glass, the mixed gas conveying speed ⁇ g , and the flow length W2 of the reactor chamber, wherein: the deposition time
  • the deposition rate is one of the indicators to measure the deposition capacity of the chemical vapor deposition coating reactor. Limited by the temperature range of the float glass production line and the glass pulling speed, the deposition time cannot be infinitely long, which determines the length of the reaction chamber. It is strictly limited, and the film thickness of the final film-forming product is required to reach 80 to 600 nm, and a relatively high deposition rate is required.
  • the film deposition rate of the coating reactor of the present invention is not less than 20 nm/s.
  • the deposition rate of the film coating reactor is preferably not less than 30 nm/s.
  • one of the main bodies of the film coating reactor device 2 of the present invention is the air inlet chamber 5 , which is provided with a chamber 75 (ie, a pressure equalizing cavity) to accommodate the coating film reaction gas.
  • the air inlet pipe 51 is made of 304 or 316L stainless steel. The pipe traverses the gas chamber in the length direction of the coating reactor.
  • the diameter of the pipe 51 is not greater than 32mm, and the pipes are distributed with holes with a diameter not greater than 5mm and a mutual spacing of not greater than 30mm.
  • the diameter of the inlet pipe of the reactor 2 of the present invention is preferably 25 mm, the diameter of the holes is preferably 2 mm, and the spacing between the holes is preferably 10 mm.
  • the air damping belt installed at the lower end of the cavity 75 is connected with the long slit 57 with a width W10, wherein the width W10 of the long slit 57 corresponding to the reactor 2 is not greater than 20mm, and the device of the present invention is preferably 15mm; the long slit is installed With a damping belt with uniform air distribution, the damping belt is preferentially considered but not limited to a certain thickness of sintered plate and perforated plate.
  • the device of the present invention preferentially selects a perforated plate, and the perforated plate is made of 304 or 316L stainless steel. It is composed of a flat belt and a stainless steel toothed belt. The thickness of the flat belt is between 0.05mm and 0.5mm.
  • the device of the present invention is preferably 0.1mm. 0.6mm, the distance between the crests is not more than 1.5mm, and the preferred distance between the crests is 1.0mm; the damping belt is fixed on the lower end of the cavity 75 by clamping two fixing blocks 23; the height H5 of the damping belt is not less than 15mm, the The height H5 of the damping belt of the film coating reactor 1 is preferably 25 mm.
  • the heat medium cavities 49 and 83 which are made of high-strength welded steel plates or profiles 48, 52, 53, 54, 74 and 90 to form the heat medium cavities 49 and 83.
  • the flowing medium is but not limited to water, hot oil, etc.
  • the device of the present invention preferably has a heat transfer oil whose maximum operating temperature is not lower than 320°C, and the heat transfer oil is accurately controlled to the temperature required by the project precursor gas through electric heating on the outside. , in order to maintain the chamber 75 at a process controlled temperature.
  • connection between the inlet chamber 5 of the main body of the coating film reactor device 4 of the present invention and the upper end of the steel beam carrier 6 of the other main body is realized by the joint fastening of special pressing blocks and high temperature resistant bolts, and makes the The lower end is fixed and sealed through a limit groove and a seal.
  • the steel beam carrier 6 of the other main body of the coating reactor device 4 of the present invention contains an inlet preheating channel 71 (ie, an inlet channel) of the reaction precursor, a reaction chamber 67 formed with a hot flat glass 68, and a reaction pair.
  • the exhaust gas channels 72, 87, the exhaust chambers 73, 88 of the product exhaust gas and the unreacted precursor, and the bearing beam 70 carrying the first four functions, the steel beam bearing body 6 is processed and manufactured from profiles of various materials.
  • the air inlet channel 71 of the steel beam carrier 6 of the film coating reactor device 4 of the present invention is composed of metal profiles 34, 35, and an upstream center block 30 and a downstream center block 76 processed from non-metallic materials.
  • the metal profiles 34, 35, 35 In the present invention, channel-shaped steel materials are preferred, while the upstream center block 30 and the downstream center block 76 are silicon carbide and graphite with fast heat transfer, uniform thermal conductivity, and machinability, and isostatic pressing is preferred in the present invention.
  • the inlet passage 71 is connected to the outlet of the inlet chamber through the damping belt, the coating reaction precursor gas is gradually heated isothermally under the control of a certain flow rate, and the gas leaves the damping
  • the ribbon is well homogenized in the air inlet channel 71 and directed to the hot clean glass ribbon 68, and the spaces 67 and 77 formed by the hot glass ribbon 68 and the upstream center block 30 and the downstream center block 76 become the key to the chemical reaction.
  • the reactive species are deposited on the upper surface of the hot glass ribbon 68 to form the desired or designed thin film; the reaction by-products and unreacted precursor gases flow naturally with the gas into the rows of the upstream and downstream central blocks 30, 76
  • the air blocks 31, 32, 33, 78, 79, 80, 93 and the exhaust passages 72, 87 formed by the metal profiles 34, 35 enter the exhaust chamber 73 through the specially designed exhaust slits, and then are discharged.
  • the chambers 40, 41, 42, 43, 44, 45, 46, 47, 81, and 82 composed of metal profiles are the channels for the flow of the cooling medium of the entire bearing beam.
  • the cooling medium is mainly composed of water and high-temperature hot oil.
  • the cooling medium used in the device of the present invention is mainly high-temperature heat-conducting oil, and the temperature of the heat-conducting oil is controlled not to exceed 325°C, and the device of the present invention preferably does not exceed 225°C.
  • the film coating reactor device 4 of the present invention is suitable for the state where the mixed gas flow is in a completely laminar flow state. It is known from the foregoing that the Reynolds number for the fluid in two parallel flat plates b is the distance between two flat plates, the Reynolds number of the film coating reactor 4 of the present invention is required to be no greater than 750, and the Reynolds number of the coating film reactor 4 of the present invention is preferably no greater than 500.
  • the size of the slit width W6 of the inlet channel 71 of the reactor is not more than 20mm, and the slit width W6 of the present invention is preferably 15mm; it also shows that the total flow rate of the maximum mixed gas of the coating reactor 4 of the present invention is not greater than 35Nm 3 / h, the minimum total mixed gas flow is not less than 12Nm 3 /h, and the film coating reactor 4 of the present invention preferably has a total mixed gas volume of 25Nm 3 /h.
  • the height H6 of the air inlet channel 71 of the film coating reactor device 4 of the present invention is not less than 100 mm, and the height H6 of the air inlet channel 71 of the film coating reactor 4 of the present invention is preferably 125 mm;
  • the total height H8 of the key reaction chambers 67 and 77 is not more than 12mm, and H4 is preferably 8mm in the present invention.
  • the rate is not less than 20 nm/s, and the deposition rate of the film coating reactor of the present invention is preferably not less than 30 nm/s.
  • the film coating reactor 1 is placed at a position where the temperature of the tin liquid under the glass plate on both sides of the tin bath of the float glass production line is 625 ° C, and the height of the lower surface of the reactor from the glass plate is 5mm, Adjust the hot oil circulation system to control the oil temperature of the heat transfer oil to enter the intake chamber at 200°C, and keep it at this temperature; at the same time, adjust the hot oil circulation system to control the oil temperature of the main bearing beam at 130°C, so that the bearing beam is at this temperature Good rigidity can be maintained under this condition, so that the reactor can be kept level on the float glass plate; by adjusting the thermal insulation material between the bottom plate 19 of the main bearing beam and the center block 13, the temperature of the center block 13 can be adjusted under this working condition. Keep at 200 ⁇ 220°C.
  • the tetrabutyl titanate raw material was placed in a standard bubbler, the temperature of the bubbler was controlled at 170 ° C, and the flow rate of 6.21 standard cubic meters per hour, which had been heated to a temperature of 170 ° C by a heater, was passed through nitrogen gas.
  • the temperature of the bubbler was controlled at 170 ° C, and the flow rate of 6.21 standard cubic meters per hour, which had been heated to a temperature of 170 ° C by a heater, was passed through nitrogen gas.
  • the temperature is kept at 180 ° C and is transported to the reactor, and is transported to the upper surface of the hot glass ribbon through the reactor;
  • the glass ribbon was moved under the reactor at a pulling speed of 415 m/h, and a titanium dioxide film with a thickness of 85 nm was deposited at a deposition rate of 36.8 nm/sec.
  • the film coating reactor 2 was placed at a position where the temperature of the tin liquid under the glass plate on both sides of the float glass production line was 615 ° C, and the height of the lower surface of the reactor from the glass plate was 5mm, Adjust the hot oil circulation system to control the oil temperature of the heat transfer oil to enter the intake chamber at 160°C, and keep it at this temperature; at the same time, adjust the hot oil circulation system to control the oil temperature of the main bearing beam at 130°C, so that the bearing beam is at this temperature Good rigidity can be maintained under this condition, so that the reactor can be kept level on the float glass plate; by adjusting the thermal insulation material between the main bearing beam bottom plates 34, 35 and the center blocks 30, 76, under this working condition, the center The temperature of the block 13 is maintained at 190-200°C.
  • the tetrabutyl titanate raw material is placed in a standard bubbler, the temperature of the bubbler is controlled at 160 ° C, and the flow rate is 9.85 standard cubic meters per hour, which has been heated to a temperature of 160 ° C by a heater.
  • the bubbler supplemented with a flow rate of 15.05 standard cubic meters per hour and well-heated diluent gas to mix well, keep the temperature at 160 ° C pipeline to the reactor, and through the reactor to the hot glass ribbon the upper surface of the;
  • the glass ribbon was moved under the reactor at a pulling speed of 498 m/h, and a TiO2 film with a thickness of 176 nm was deposited at a deposition rate of 55.3 nm/sec.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

A reactor for chemical vapor deposition method-based coated glass, comprising: a gas inlet chamber of which the temperature may be independently preset and capable of implementing independent and uniform gas distribution on an ingoing reactant gas in the length direction of the reactor, and a steel beam carrying body. The gas inlet chamber comprises a pressure equalization cavity, and a hot medium cavity that surrounds the pressure equalization cavity and is controlled by an external control system and used for controlling the temperature of the reactant gas in the pressure equalization cavity; the steel beam carrying body comprises the gas inlet chamber, a gas inlet passage, a reaction chamber, a gas exhaust passage, and a gas exhaust chamber that constitute a reactant gas passage. The steel structure of the air inlet chamber is independent of the steel structures of the reaction chamber and the gas exhaust chamber and is connected to the steel structures of the reaction chamber and the gas exhaust chamber by means of sliding block bolts, and a thermal insulation material is provided at the connections. Different temperature control of the gas inlet chamber and the reaction chamber, and the gas exhaust chamber that can be uniformly arranged in the transverse direction of a glass ribbon are achieved, so that the process controllability and product quality of chemical vapor deposition method-based coated glass are effectively improved, and thus the present invention is suitable for plate glass production line applications.

Description

一种用于化学气相沉积法镀膜玻璃的反应器A reactor for chemical vapor deposition coated glass 技术领域technical field
本发明涉及平板玻璃生产线在线生产镀膜玻璃领域,具体涉及一种用于化学气相沉积法镀膜玻璃的反应器。The invention relates to the field of on-line production of coated glass by a flat glass production line, in particular to a reactor for coating glass by chemical vapor deposition.
背景技术Background technique
镀膜玻璃是建筑节能领域重要的建筑材料之一,它既保留了窗户的透光性能,又发展成为具有能够高效阻隔热量传递功能的玻璃,将镀膜玻璃经过加热钢化制成中空玻璃或真空玻璃,就被赋予普通平板玻璃的特殊的节能、环保、安全和装饰等多项新功能;同时由于镀膜玻璃又可以具有良好的导电和热加工性能,成为太阳能电池和电子产品的基板玻璃。Coated glass is one of the important building materials in the field of building energy saving. It not only retains the light transmission properties of windows, but also develops into a glass that can effectively block heat transfer. The coated glass is heated and tempered into insulating glass or vacuum glass. It is endowed with many new functions such as special energy saving, environmental protection, safety and decoration of ordinary flat glass; at the same time, because coated glass has good electrical conductivity and thermal processing properties, it becomes the substrate glass for solar cells and electronic products.
镀膜玻璃按照制造工艺可分为在线镀膜玻璃和离线镀膜玻璃两种工艺,所谓在线镀膜玻璃就是石英砂等原料通过熔窑熔化澄清制造平板玻璃的过程中,在适合的温度区域内,嫁接上镀膜设备,将镀膜的先驱物通过镀膜设备均匀地喷洒在具有较高温度的玻璃表面上,镀膜先驱物在高温下热解反应,反应物沉积在玻璃板上形成具有一定功能膜层的工艺;而离线镀膜技术目前流行的主要工艺是真空阴极磁控溅射镀膜工艺,是指平板玻璃原片经过洗涤干燥后输送至真空室,在电场和磁场作用下,电离气体而成的离子以一定的速度撞击靶材,激发出靶材离子,最后沉积在玻璃表面上形成具有一定功能的膜层的工艺,这是非常成熟的工艺。在线制造镀膜玻璃和离线制造镀膜玻璃的最大区别在于,在线镀膜玻璃可随意热加工以及制造过程中不需附加能源,而离线镀膜玻璃则需要严格的苛刻条件才能满足要求,需要耗费大量的电能才能制备,因此在线镀膜是发展镀膜玻璃的良好方向。Coated glass can be divided into two processes: online coated glass and offline coated glass according to the manufacturing process. The so-called online coated glass is the process in which raw materials such as quartz sand are melted and clarified in a furnace to manufacture flat glass, and the coating is grafted in a suitable temperature range. Equipment, the coating precursor is evenly sprayed on the glass surface with a higher temperature through the coating equipment, the coating precursor is pyrolyzed at high temperature, and the reactant is deposited on the glass plate to form a process with a certain functional film layer; The main process of offline coating technology is vacuum cathode magnetron sputtering coating process, which means that the original flat glass sheet is washed and dried and then transported to a vacuum chamber. The process of hitting the target, exciting the target ions, and finally depositing on the glass surface to form a film with a certain function is a very mature process. The biggest difference between online coated glass and offline coated glass is that online coated glass can be thermally processed at will and does not require additional energy during the manufacturing process, while offline coated glass requires strict and harsh conditions to meet the requirements and consumes a lot of electricity. Therefore, online coating is a good direction for the development of coated glass.
在线镀膜的核心装备就是在整个玻璃生产线宽度方向上能够均匀实施镀膜的反应器。而在线镀膜实施的主流工艺是嫁接于浮法玻璃生产线上,该浮法玻璃生产线是由原料系统、熔窑、锡槽、过渡辊台、退火窑、在线监测系统、冷端切裁装箱构成,在线镀膜位置主要在锡槽和退火窑的温度 500~700℃的区域,此区域的宽度一般都在4000~5600mm之间,因此这就要求在此处的在线镀膜的主体设备——镀膜反应器,具备良好的热稳定性,良好的刚性,同时具有保持满足反应先驱物所要求温度的进气室和不同于进气室温度要求的反应室,以及在玻璃带横向方向能够均匀布置的排气室。The core equipment of online coating is a reactor that can uniformly coat the entire glass production line in the width direction. The mainstream process of online coating implementation is grafting on the float glass production line. The float glass production line is composed of raw material system, melting furnace, tin bath, transition roller table, annealing kiln, online monitoring system, cold end cutting and packing. , the online coating position is mainly in the area where the temperature of the tin bath and the annealing kiln is 500~700℃, and the width of this area is generally between 4000~5600mm, so this requires the main equipment of the online coating here - coating reaction It has good thermal stability, good rigidity, and at the same time, it has an inlet chamber that meets the temperature required for the reaction precursor, a reaction chamber that is different from the temperature requirement of the inlet chamber, and an exhaust chamber that can be evenly arranged in the lateral direction of the glass ribbon. Air chamber.
拥有浮法在线镀膜玻璃技术的公司主要有:英国Pilkington公司、美国PPG公司、法国圣戈班公司、比利时格拉韦伯尔公司以及我国威海中玻新材料技术研发有限公司等。美国PPG和法国圣戈班公司起初的技术都是购买英国皮尔金顿的专利技术发展起来,这三家公司共同的特点都是在锡槽内的还原气氛中布置镀膜设备,而比利时格拉韦伯尔和威海中玻新材料技术研发有限公司的特点是在过渡棍台和退火窑A0区的氧化气氛中布置镀膜设备。The main companies with float glass coating technology are: Pilkington Company of the United Kingdom, PPG Company of the United States, Saint-Gobain Company of France, Graveble Company of Belgium, and Weihai my country Glass New Material Technology Research and Development Co., Ltd., etc. American PPG and French Saint-Gobain originally purchased the patented technology of Pilkington, UK. The common feature of these three companies is to arrange coating equipment in the reducing atmosphere in the tin bath, while the Belgian Graveber and Weihai The characteristic of Glass New Material Technology R&D Co., Ltd. is that the coating equipment is arranged in the oxidizing atmosphere of the transition table and the A0 area of the annealing kiln.
美国专利US4088471A介绍一种用于浮法玻璃生产线锡槽低温段使用的具有U型单通道反应器,该反应器进气室浸没在钢梁的冷却介质水中,由上游块、中心块和下游块直接或间接与钢梁相连接,构成进入气体反应区的U型通道,即气体从进气室经气体分布件,均匀地进入U型通道的上游通道预热达到热解反应前的温度,然后进入到由中心块与热玻璃带构成的U型通道的反应区,反应的废气则通过该U型通道的另一侧进入排气室排除反应区。因此,该装备是利用水温保持进气室的温度恒定在100℃以下,水是钢梁整体的冷却介质,反应区温度控制以绝热垫片调节反应区界面温度,对于硅烷为主体气体分解反应沉积单质硅是非常有效,其优点是适用于小流量、低温度、纯气体的沉积镀膜工艺,缺点是反应区的温度受冷却介质水的影响比较大,反应室温度只能在冷却介质冷却范围内,不能够任意调节控制。US Patent US4088471A introduces a U-shaped single-channel reactor used in the low temperature section of the tin bath of a float glass production line. The inlet chamber of the reactor is immersed in the cooling medium water of the steel beam, and consists of an upstream block, a central block and a downstream block. It is directly or indirectly connected with the steel beam to form a U-shaped channel entering the gas reaction zone, that is, the gas enters the upstream channel of the U-shaped channel uniformly from the gas inlet chamber through the gas distribution member and preheats to the temperature before the pyrolysis reaction, and then It enters the reaction zone of the U-shaped channel formed by the central block and the hot glass ribbon, and the reacted exhaust gas enters the exhaust chamber through the other side of the U-shaped channel to remove the reaction zone. Therefore, the equipment uses the water temperature to keep the temperature of the intake chamber constant below 100 °C. Water is the cooling medium of the steel beam as a whole. The temperature of the reaction zone is controlled by an insulating gasket to adjust the interface temperature of the reaction zone. For silane as the main gas decomposition reaction deposition Elemental silicon is very effective. Its advantage is that it is suitable for deposition and coating process of small flow, low temperature and pure gas. The disadvantage is that the temperature of the reaction zone is greatly affected by the cooling medium water, and the temperature of the reaction chamber can only be within the cooling medium cooling range. , the control cannot be adjusted arbitrarily.
美国专利US4857097A中针对以上不足提出了有关工艺方面的结构改进,例如将U型通道下游块脚趾结构改为圆弧形,以便引入外界气体介质进入,改善镀膜周期,起到非常大的作用,同时将排气室与主钢梁连接在一起,有利于排气室与进气室保持稳定。但是反应区温度控制和进气室的温度控制方面仍然保持原来状态。In view of the above deficiencies, US Patent US4857097A proposes structural improvements in related processes, such as changing the toe structure of the downstream block of the U-shaped channel to a circular arc, so as to introduce the outside gas medium, improve the coating cycle, and play a very important role. Connecting the exhaust chamber to the main steel beam is beneficial to the stability of the exhaust chamber and the intake chamber. However, the temperature control of the reaction zone and the temperature control of the inlet chamber remain as they were.
美国专利US5065696A介绍一种可实施双U型通道的反应器和单U型通道的反应器,专利说明书中描述了利用钢件围制成能够成具有冷却介质冷却的承载钢梁横跨在浮法玻璃锡槽两侧,两个没有直接冷却媒介的相 对独立的进气室在出口的喷嘴设置布气件,下端是由热传导性能好的中心块件构成并带有促进混合的指板的混合室,使气体从独立的进气室经各自的喷嘴进入混合室混合好后引导至热玻璃带的上表面,中心块的温度由电加热元件控制,未反应或反应产物废气进入排气通道,排气通道内设有排气均匀指板。U.S. Patent US5065696A introduces a reactor capable of implementing double U-shaped channels and a single U-shaped channel reactor. The patent specification describes the use of steel parts to form a bearing steel beam with cooling medium cooling across the float process. On both sides of the glass tin bath, two relatively independent air inlet chambers without direct cooling medium are provided with air distributors at the outlet nozzles, and the lower end is composed of a central block with good thermal conductivity and a mixing chamber with a fingerboard that promotes mixing , so that the gas enters the mixing chamber from the independent inlet chamber through the respective nozzles and is mixed and guided to the upper surface of the hot glass ribbon. The temperature of the central block is controlled by the electric heating element, and the unreacted or reaction product waste gas enters the exhaust channel, and the exhaust gas is discharged. There is an even exhaust fingerboard in the air channel.
美国专利US5286295A介绍了一种四块不同形状的石墨构成单进双排的双U型结构的反应器,专利说明书详细分析了在相同反应时间内,上下游反应区优化的最佳长度,同时也适应了反应气体流量大而反应均匀的问题,为该反应器在实际应用中奠定了理论基础,进气室温度与反应区温度的处理如同美国专利US4088471A相同。US Patent US5286295A introduces a reactor with a single-entry double-row double U-shaped structure composed of four graphites of different shapes. The patent specification analyzes in detail the optimal length of the upstream and downstream reaction zones within the same reaction time. It adapts to the problem that the reaction gas flow is large and the reaction is uniform, which lays a theoretical foundation for the practical application of the reactor.
美国专利US9540277B2介绍了一种能够使各种反应物彼此分离、且由四块主体件构成进气通道、布气通道、反应通道和排气通道的单进双排双U型结构反应器,专利详细叙述了进气通道是由主体件、盖板件、挡板件和气体调节件组成的进气均匀布气室,该部分的温度控制主要是依靠主体件中间的冷却管,该冷却管既要满足反应室的温度,又要满足进气温度的需求,控制难度大,使用效果单一,对反应的先驱体物料的要求比较强,同时气体调节件位于进气室气体出口的底部,距离热玻璃板小于10mm,不利于气体均匀性的实施,尤其不利于大流量反应气体镀膜反应的实施。US patent US9540277B2 introduces a single-inlet, double-row, double-U-shaped structure reactor capable of separating various reactants from each other and composed of four main parts to form an inlet channel, a gas distribution channel, a reaction channel and an exhaust channel. It is described in detail that the air intake channel is a uniform air distribution chamber for air intake composed of main body parts, cover plate parts, baffle parts and gas adjustment parts. The temperature control of this part mainly relies on the cooling pipe in the middle of the main body part. To meet the temperature of the reaction chamber and the temperature of the intake air, the control is difficult, the use effect is single, and the requirements for the precursor material of the reaction are relatively strong. The glass plate is less than 10mm, which is not conducive to the implementation of gas uniformity, especially the implementation of large-flow reactive gas coating reaction.
中国专利ZL201510014233.1提出了一种利用废气余热且具有强化对流传热效果、调节玻璃带表面气流、防止粉尘排气过程回流的浮法在线玻璃常压化学气相沉积镀膜反应器,反应先驱体预混室和废气室设置于保温外壳中,预混室连接镀膜前驱气体进气管,且预混室嵌装在废气室中,通过利用废气余热以及进气室内充分混合强化对流预热反应前驱气体达到降低镀膜反应温度。但是对预混室和废气室的温度没有实现独立控制。Chinese patent ZL201510014233.1 proposes an online float glass atmospheric pressure chemical vapor deposition coating reactor that utilizes waste heat of exhaust gas and has the effect of enhancing convective heat transfer, adjusting the airflow on the surface of the glass ribbon, and preventing the backflow of dust exhaust process. The mixing chamber and the exhaust gas chamber are arranged in the thermal insulation shell, the pre-mixing chamber is connected to the gas inlet pipe of the coating precursor, and the pre-mixing chamber is embedded in the exhaust gas chamber. Decrease the coating reaction temperature. However, independent control of the temperature of the premix chamber and the exhaust chamber is not achieved.
发明内容SUMMARY OF THE INVENTION
针对上述技术问题以及本领域存在的不足之处,本发明提供了一种用于化学气相沉积法镀膜玻璃的反应器,包括进气室、钢梁承载体、气体U型通道和排气室等,可采用化学气相沉积工艺将具有一定功能的薄膜沉积在移动热的玻璃基板上。In view of the above-mentioned technical problems and the deficiencies in the art, the present invention provides a reactor for coating glass by chemical vapor deposition, including an air inlet chamber, a steel beam carrier, a gas U-shaped channel and an exhaust chamber, etc. , a chemical vapor deposition process can be used to deposit a film with certain functions on a glass substrate that moves heat.
一种用于化学气相沉积法镀膜玻璃的反应器,包括可独立预设温度的 对进入的反应气体在所述反应器长度方向上能够实施独立均匀布气的进气室和钢梁承载体;A reactor for chemical vapor deposition coated glass, comprising an air inlet chamber and a steel beam carrier capable of independently and uniformly distributing gas independently and uniformly to the incoming reaction gas in the length direction of the reactor;
所述进气室:The intake chamber:
包括均压空腔和包围所述均压空腔、由外界控制系统实施控制的用于控制所述均压空腔内反应气体温度的热媒介质腔;comprising a pressure equalization cavity and a heat medium cavity surrounding the pressure equalization cavity and controlled by an external control system for controlling the temperature of the reaction gas in the pressure equalization cavity;
所述均压空腔内设有供反应气体进入的进气管,所述进气管的管壁上沿所述反应器长度方向规则分布多个小孔;The pressure equalization cavity is provided with an air inlet pipe for the reaction gas to enter, and a plurality of small holes are regularly distributed along the length direction of the reactor on the pipe wall of the air inlet pipe;
所述均压空腔底部出口处设置具有多个微孔、用于均匀布气的阻尼带,所述阻尼带选自烧结板或叠孔板,所述叠孔板由纵向设置且交替分布的平带和齿形带组成。At the outlet of the bottom of the pressure equalizing cavity, a damping belt with a plurality of micropores for uniform air distribution is arranged, and the damping belt is selected from a sintered plate or a stacked orifice plate, and the stacked orifice plate is composed of longitudinally arranged and alternately distributed Composed of flat belt and toothed belt.
所述钢梁承载体包括:The steel beam bearing body includes:
与所述进气室出口连通、从上至下具有可调温度梯度的进气通道;an air intake passage communicating with the outlet of the air intake chamber and having an adjustable temperature gradient from top to bottom;
与所述进气通道出口以及外界相通、与热玻璃带形成的反应室,其内的反应气体可与所述热玻璃带接触镀膜且浓度和流速均匀;a reaction chamber communicated with the outlet of the air inlet channel and the outside, and formed with the hot glass ribbon, the reaction gas in the reaction gas can be coated with the hot glass ribbon, and the concentration and flow rate are uniform;
与所述反应室出口连通、在所述反应器长度方向上能够均匀使反应废气均衡排出的排气通道;an exhaust channel that communicates with the outlet of the reaction chamber and can uniformly discharge the reaction waste gas in the length direction of the reactor;
与所述排气通道出口连通、能够排出反应废气的排气室,其四周设有用于控制所述排气室内反应废气温度的冷媒介质腔;an exhaust chamber communicating with the outlet of the exhaust passage and capable of discharging the reaction exhaust gas, and a cooling medium cavity for controlling the temperature of the reaction exhaust gas in the exhaust chamber is arranged around the exhaust chamber;
所述进气室、进气通道、反应室、排气通道、排气室构成反应气体通道,其中,所述进气通道、反应室、排气通道构成单U型或双U型通道,反应气体在该通道内经历预热、反应、排出过程;The intake chamber, the intake channel, the reaction chamber, the exhaust channel, and the exhaust chamber constitute a reaction gas channel, wherein the intake channel, the reaction chamber, and the exhaust channel constitute a single U-shaped or double U-shaped channel, and the reaction The gas undergoes preheating, reaction and discharge processes in this channel;
所述进气室通过非焊接形式(例如,通过压紧装置)与所述钢梁承载体连接,且所述进气室的钢构独立于所述反应室、排气室的钢构。The air inlet chamber is connected to the steel beam carrier by a non-welded form (for example, through a pressing device), and the steel structure of the air inlet chamber is independent of the steel structures of the reaction chamber and the exhaust chamber.
本发明实现了进气室和反应室不同温度控制,以及在玻璃带横向方向能够均匀布置的排气室,技术思路新颖,有效提高用于化学气相沉积法镀膜玻璃的工艺可控性和产品质量,适合平板玻璃生产线应用。The invention realizes the different temperature control of the air inlet chamber and the reaction chamber, and the exhaust chamber which can be evenly arranged in the lateral direction of the glass ribbon. , suitable for flat glass production line applications.
现有技术和使用的化学气相沉积装置只适用于纯气体或单一的汽化后的气体混合物运行于一定温度下的装置,对于反应混合气体的温度不能够随着不同的原料特性的要求进行调节,反应室温度和进气室温度是相关联的,即反应室温度提高时,进气室的温度也相应提高,容易在进气室产生提前反应,影响镀膜效率和质量。本发明反应器则与已知的化学气相反 应沉积装置不同,进气室与进气通道、反应室、排气通道、排气室等相对独立设置,进气室可独立加热,能够更加适应镀膜先驱体原料对镀膜生产的要求,同时本发明反应器还具有在垂直玻璃前进方向,也就是反应器长度方向(在图1中即为与纸面垂直的方向)均匀布气的功能。The existing technology and the chemical vapor deposition device used are only suitable for pure gas or a single vaporized gas mixture operating at a certain temperature. The temperature of the reaction mixture cannot be adjusted according to the requirements of different raw material characteristics. The temperature of the reaction chamber and the temperature of the inlet chamber are related, that is, when the temperature of the reaction chamber increases, the temperature of the inlet chamber also increases accordingly, and it is easy to produce an early reaction in the inlet chamber, which affects the coating efficiency and quality. The reactor of the present invention is different from the known chemical vapor reaction deposition device. The inlet chamber is relatively independent from the inlet passage, reaction chamber, exhaust passage, exhaust chamber, etc. The inlet chamber can be independently heated, which can be more suitable for coating The requirements of the precursor raw materials for coating production, and the reactor of the present invention also has the function of uniform gas distribution in the vertical glass advancing direction, that is, the length direction of the reactor (in Figure 1, the direction perpendicular to the paper).
作为优选,所述进气室包括均压空腔和包围所述均压空腔、由外界控制系统实施控制、用于控制所述均压空腔内反应气体温度的热媒介质腔。所述均压空腔在一定反应气体流量的前提下能够保证在反应器长度方向上压力稳定均衡,且其出口与所述进气通道相连。作为优选,所述均压空腔和热媒介质腔均由厚度不小于5mm的优质碳钢焊接而成,耐压气密性大于0.5MPa/24h。所述热媒介质腔内的热媒介质可为水或导热油,优选为导热油。进一步优选,所述耐温320℃以上的导热油。Preferably, the air inlet chamber includes a pressure equalization cavity and a heat medium cavity surrounding the pressure equalization cavity, controlled by an external control system, and used to control the temperature of the reaction gas in the pressure equalization cavity. The pressure equalization cavity can ensure stable and balanced pressure in the length direction of the reactor under the premise of a certain reaction gas flow rate, and its outlet is connected with the air inlet channel. Preferably, the pressure equalizing cavity and the heat medium cavity are welded by high-quality carbon steel with a thickness of not less than 5 mm, and the pressure resistance and air tightness are greater than 0.5 MPa/24h. The heat medium in the heat medium cavity may be water or heat-conducting oil, preferably heat-conducting oil. Further preferably, the heat transfer oil with a temperature resistance of 320°C or higher.
作为优选,所述均压空腔内设有供反应气体进入的进气管。所述进气管的直径优选为10~35mm,进一步优选为15~25mm。Preferably, the pressure equalizing cavity is provided with an air inlet pipe for the reaction gas to enter. The diameter of the air intake pipe is preferably 10 to 35 mm, more preferably 15 to 25 mm.
所述进气管的管壁上沿所述反应器长度方向规则分布多个小孔,从而可保证在反应器长度方向上压力稳定均衡,布气均匀。所述小孔直径优选为1~5mm,进一步优选为1~3mm,最优选为1.5~2mm,间距优选为5~25mm,进一步优选为5~15mm,最优选为10mm。A plurality of small holes are regularly distributed on the wall of the air inlet pipe along the length direction of the reactor, so as to ensure stable and balanced pressure and uniform gas distribution in the length direction of the reactor. The diameter of the small holes is preferably 1-5 mm, more preferably 1-3 mm, most preferably 1.5-2 mm, and the spacing is preferably 5-25 mm, more preferably 5-15 mm, and most preferably 10 mm.
作为优选,所述均压空腔底部出口处设置具有多个微孔、用于均匀布气的阻尼带。所述微孔直径优选为0.2~1.5mm,进一步优选为0.5~0.8mm。所述阻尼带可采用两块固定块夹紧的方式固定于所述均压空腔下端。所述阻尼带的高度优选不低于15mm,进一步优选为20mm,厚度优选为5~25mm,进一步优选为7~15mm。所述阻尼带优选自烧结板或叠孔板。所述叠孔板优选由纵向设置且交替分布的平带和齿形带组成。所述平带、齿形带优选为不锈钢材质。所述平带厚度优选为0.05~0.5mm,进一步优选为0.08~0.15mm,所述齿形带的波峰波谷极差(指齿形带平放时波峰与波谷之间的高度差)优选为0.3~1.5mm,进一步优选为0.5~0.75mm,波峰之间间距优选不大于1.5mm,进一步优选为1.0mm。Preferably, a damping belt with a plurality of micro-holes for uniform air distribution is provided at the outlet of the bottom of the pressure equalizing cavity. The diameter of the micropores is preferably 0.2 to 1.5 mm, more preferably 0.5 to 0.8 mm. The damping band can be fixed on the lower end of the pressure equalizing cavity by clamping with two fixing blocks. The height of the damping belt is preferably not less than 15 mm, more preferably 20 mm, and the thickness is preferably 5-25 mm, and further preferably 7-15 mm. The damping band is preferably made from a sintered plate or a perforated plate. The perforated plate preferably consists of longitudinally arranged and alternately distributed flat belts and toothed belts. The flat belt and toothed belt are preferably made of stainless steel. The thickness of the flat belt is preferably 0.05-0.5mm, more preferably 0.08-0.15mm, and the peak-to-valley range of the toothed belt (referring to the height difference between the peak and the trough when the toothed belt is laid flat) is preferably 0.3 ~1.5 mm, more preferably 0.5 to 0.75 mm, and the distance between the crests is preferably not more than 1.5 mm, more preferably 1.0 mm.
作为优选,所述进气通道由第一钢构与上游块、中心块或第一钢构与两块中心块围成,所述第一钢构用于构成所述冷媒介质腔,所述排气室、冷媒介质腔、中心块均位于所述U型通道的内侧,所述中心块位于所述第一钢构下方且与所述第一钢构的间隙可调,从而可调整所述中心块的温度, 以满足反应气体在玻璃上表面沉积功能薄膜的条件。第一钢构与中心块之间的间隙可通过添加垫片调整。所述中心块的温度优选为150~500℃,进一步优选为180~380℃。Preferably, the intake passage is surrounded by a first steel structure and an upstream block, a center block, or a first steel structure and two center blocks, and the first steel structure is used to form the refrigerant medium cavity, and the row The air chamber, the cooling medium cavity and the center block are all located on the inner side of the U-shaped channel. The center block is located under the first steel structure and the gap between the center block and the first steel structure is adjustable, so that the center can be adjusted. The temperature of the block is to meet the conditions for the reaction gas to deposit the functional film on the upper surface of the glass. The gap between the first steel structure and the center block can be adjusted by adding spacers. The temperature of the center block is preferably 150 to 500°C, more preferably 180 to 380°C.
所述进气通道由上至下温度逐渐升高,形成反应气体的预热通道。所述预热通道的温度优选在50~420℃,进一步优选在100~350℃。所述进气通道的宽度优选为5~25mm,进一步优选为7~15mm。The temperature of the inlet passage gradually increases from top to bottom, forming a preheating passage for the reaction gas. The temperature of the preheating channel is preferably 50-420°C, more preferably 100-350°C. The width of the air intake passage is preferably 5 to 25 mm, more preferably 7 to 15 mm.
所述反应室为所述中心块与热玻璃带组成的用于镀膜的反应通道,所述反应室直接置于所述热玻璃带之上。在通道的导引下,反应气体迅速预热,在反应室与热玻璃带接触,发生化学反应,反应产物沉积在热玻璃带上,形成具有一定功能的薄膜。The reaction chamber is a reaction channel for coating formed by the central block and the hot glass ribbon, and the reaction chamber is directly placed on the hot glass ribbon. Under the guidance of the channel, the reactant gas is rapidly preheated, contacts with the hot glass ribbon in the reaction chamber, a chemical reaction occurs, and the reaction product is deposited on the hot glass ribbon to form a film with certain functions.
中心块下方即为热玻璃带,温度最高,中心块上方的冷媒介质温度较低,通过调整冷媒介质腔和位于其下方的中心块之间的距离,可控制位于中间的中心块温度范围,如此可形成自上而下温度逐渐升高的进气通道。Below the central block is the hot glass ribbon, the temperature is the highest, and the temperature of the cold medium above the central block is lower. By adjusting the distance between the cold medium cavity and the central block below it, the temperature range of the central block in the middle can be controlled, such as An intake passage with a gradually increasing temperature from top to bottom can be formed.
所述中心块的材质优选为碳化硅或石墨,所述石墨包括等静压石墨、高纯石墨、阳极石墨等。The material of the center block is preferably silicon carbide or graphite, and the graphite includes isostatic graphite, high-purity graphite, anode graphite, and the like.
在一优选例中,所述排气通道由所述中心块和排气块围成,宽度优选为10~40mm,进一步优选为20~35mm。In a preferred example, the exhaust passage is surrounded by the center block and the exhaust block, and the width is preferably 10-40 mm, more preferably 20-35 mm.
排气室通过冷媒介质腔控制为恒定温度,从而保证其内气压稳定,有利于废气稳定、均匀地抽出。The exhaust chamber is controlled to a constant temperature through the cooling medium cavity, so as to ensure the stable air pressure in the exhaust chamber, which is conducive to the stable and uniform extraction of exhaust gas.
作为优选,所述排气室由高强度碳钢板和管焊接而成。Preferably, the exhaust chamber is welded by high-strength carbon steel plates and pipes.
作为优选,所述排气室通过狭缝与所述排气通道连通。所述狭缝可沿所述反应器长度方向设置多个。所述狭缝开口沿反应器长度方向的长度优选为200~450mm,进一步优选为250~350mm,沿反应器竖直方向的高度优选为1.5~12.5mm,进一步优选为2~12mm。各狭缝长、宽可独立设置。Preferably, the exhaust chamber communicates with the exhaust passage through a slit. A plurality of the slits may be provided along the length of the reactor. The length of the slit opening along the length direction of the reactor is preferably 200-450 mm, more preferably 250-350 mm, and the height along the vertical direction of the reactor is preferably 1.5-12.5 mm, more preferably 2-12 mm. The length and width of each slit can be set independently.
所述冷媒介质腔内的冷媒介质可为水或导热油,优选为导热油。The cooling medium in the cooling medium cavity may be water or heat-conducting oil, preferably heat-conducting oil.
所述单U型通道水平段用于镀膜的长度优选不大于300mm,进一步优选为120~280mm,更进一步优选为160~265mm。The length of the single U-shaped channel horizontal section used for coating is preferably not more than 300 mm, more preferably 120-280 mm, and still more preferably 160-265 mm.
所述双U型通道水平段用于镀膜的总长度优选不大于550mm,进一步优选为400~465mm。The total length of the double U-shaped channel horizontal section used for coating is preferably not more than 550 mm, more preferably 400-465 mm.
作为优选,所述进气室的钢构通过滑块螺栓与所述反应室、排气室的钢构连接,连接处优选设有保温材料,用于隔热。所述保温材料包括硅酸 铝纤维毡等。Preferably, the steel structure of the intake chamber is connected with the steel structures of the reaction chamber and the exhaust chamber through slider bolts, and the connection is preferably provided with a thermal insulation material for thermal insulation. The thermal insulation material includes aluminum silicate fiber felt and the like.
作为一个总的发明构思,本发明还提供了一种利用所述的反应器沉积镀膜的方法,包括:反应气体经进气室预热恒压布气后流入进气通道,经进一步预热后抵达反应室,反应气体在玻璃表面发生化学反应,生成物沉积在玻璃表面成膜,而含反应余气的反应废气则经排气通道流入排气室排至室外或回收装置。As a general inventive concept, the present invention also provides a method for depositing a coating film by using the reactor, comprising: the reaction gas is preheated in the air inlet chamber and then flows into the air inlet channel after being preheated and distributed at a constant pressure, and after further preheating Arriving in the reaction chamber, the reaction gas reacts chemically on the glass surface, the product is deposited on the glass surface to form a film, and the reaction waste gas containing the reaction gas flows into the exhaust chamber through the exhaust passage and is discharged to the outdoor or recovery device.
本发明主要涉及利用化学气相沉积法在平板玻璃生产线尤其是在浮法玻璃生产线上制作镀膜玻璃的专有装备和方法,可广泛应用在平板玻璃尤其是浮法玻璃生产线上。The invention mainly relates to a special equipment and method for making coated glass on a flat glass production line, especially a float glass production line by chemical vapor deposition, which can be widely used in flat glass, especially a float glass production line.
本发明与现有技术相比,主要优点包括:本发明反应器的进气室与进气通道、反应室、排气通道、排气室等相对独立设置,进气室可独立加热,不受钢梁承载体影响,能够更加适应镀膜先驱体原料对镀膜生产的要求,更好地实现进气温度梯度和预热效果的实现,避免了反应气体在进气室即发生反应等问题产生,同时本发明反应器还具有在垂直玻璃前进方向,也就是反应器长度方向均匀布气的功能。此外,阻尼带的设置也使得进气通道内的反应气体流动更为平稳、均匀,有利于后续反应室镀膜的进行。Compared with the prior art, the main advantages of the present invention include: the inlet chamber of the reactor of the present invention is relatively independent from the inlet passage, the reaction chamber, the exhaust passage, the exhaust chamber, etc., the inlet chamber can be independently heated, and is not affected by the The influence of the steel beam carrier can better meet the requirements of the coating precursor raw materials for coating production, better realize the inlet temperature gradient and preheating effect, and avoid problems such as the reaction of the reaction gas in the inlet chamber. The reactor of the present invention also has the function of uniform gas distribution in the vertical glass advancing direction, that is, the length direction of the reactor. In addition, the setting of the damping belt also makes the flow of the reaction gas in the air inlet channel more stable and uniform, which is beneficial to the subsequent coating of the reaction chamber.
附图说明Description of drawings
图1为本发明单U型通道镀膜反应器的横截面结构示意图;Fig. 1 is the cross-sectional structure schematic diagram of the single U-shaped channel coating reactor of the present invention;
图2为本发明单U型通道镀膜反应器的钢梁承载体和反应室横截面结构示意图;Fig. 2 is the cross-sectional structural schematic diagram of the steel beam carrier and the reaction chamber of the single U-channel coating reactor of the present invention;
图3为本发明单U型通道镀膜反应器的进气室横截面结构示意图;3 is a schematic diagram of the cross-sectional structure of the air inlet chamber of the single U-channel coating reactor of the present invention;
图4为本发明双U型通道镀膜反应器的横截面结构示意图;Fig. 4 is the cross-sectional structure schematic diagram of the double U-shaped channel coating reactor of the present invention;
图5为本发明双U型通道镀膜反应器的钢梁承载体和反应室横截面结构示意图;Fig. 5 is the cross-sectional structural schematic diagram of the steel beam carrier and the reaction chamber of the double U-shaped channel coating reactor of the present invention;
图6为本发明双U型通道镀膜反应器的进气室横截面结构示意图。FIG. 6 is a schematic diagram of the cross-sectional structure of the air inlet chamber of the double U-channel coating reactor of the present invention.
具体实施方式Detailed ways
下面结合附图及具体实施例,进一步阐述本发明。应理解,这些实施例仅用于说明本发明而不用于限制本发明的范围。下列实施例中未注明具体条件的操作方法,通常按照常规条件,或按照制造厂商所建议的条件。The present invention will be further described below with reference to the accompanying drawings and specific embodiments. It should be understood that these examples are only used to illustrate the present invention and not to limit the scope of the present invention. The operation method without specifying the specific conditions in the following examples is usually in accordance with the conventional conditions, or in accordance with the conditions suggested by the manufacturer.
浮法玻璃生产线是经过按照一定比例混合好的玻璃原料连续经过输送装置投入浮法玻璃熔窑,经过高温熔化的化学反应,形成具有一定流动性能的熔融玻璃溶液,在澄清区排出气泡后,经流道闸板控制一定的流量,使熔融玻璃液流入锡槽内,通过电加热控制器和锡槽冷却器共同控制锡槽内的空间和锡液温度,使玻璃液逐渐冷却,形成具有一定宽度和厚度的玻璃板被牵引进入退火窑退火,最后形成玻璃产品。所述的锡槽是由氮气和氢气混合气体的保护的空间和承载着熔融的金属锡组成,可知锡槽空间是还原气氛,防止熔融锡液氧化,同时使玻璃液或玻璃板漂浮其上,形成具有高平整度的浮法玻璃。参考说明书附图1、4可知,本发明所述的用于化学气相沉积法镀膜玻璃的反应器1、4都是在浮法玻璃生产线实施的装置,适合单一或多种气体实施化学气相沉积反应的装置,分别适用于不同气体总量的反应,也是适用于各种能够通过将镀膜先驱体汽化形成气态物质后在热的基板上产生化学气相沉积反应,形成不同设计要求膜层,这里所述的热的基板比如热的浮法玻璃基板68,通过在热的基板上发生化学气相沉积成膜、均匀地制备出具有太阳能热反射、低辐射或透明导电膜涂层的玻璃。The float glass production line is that the glass raw materials mixed according to a certain proportion are continuously put into the float glass melting furnace through the conveying device, and the molten glass solution with certain fluidity is formed through the chemical reaction of high temperature melting. The runner gate controls a certain flow rate, so that the molten glass flows into the tin bath, and the space in the tin bath and the temperature of the tin bath are jointly controlled by the electric heating controller and the tin bath cooler, so that the glass liquid is gradually cooled to form a certain width. The glass sheet with the thickness and thickness is drawn into the annealing furnace for annealing, and finally the glass product is formed. The tin bath is composed of a space protected by a mixed gas of nitrogen and hydrogen and the molten metal tin is carried. It can be seen that the tin bath space is a reducing atmosphere, which prevents the oxidation of the molten tin liquid and makes the glass liquid or glass plate float on it at the same time. Float glass with high flatness is formed. Referring to the accompanying drawings 1 and 4 of the description, it can be seen that the reactors 1 and 4 for chemical vapor deposition coated glass according to the present invention are all devices implemented in the float glass production line, and are suitable for single or multiple gases to carry out chemical vapor deposition reaction. The device is suitable for the reaction of different total amount of gas, and it is also suitable for various kinds of chemical vapor deposition reactions that can be produced on a hot substrate by vaporizing the coating precursor to form a gaseous substance to form a film layer with different design requirements, as described here. A hot substrate, such as a hot float glass substrate 68, uniformly produces glass with a solar thermal reflection, low emissivity or transparent conductive film coating by chemical vapor deposition film formation on the hot substrate.
1)本发明涂膜反应器1的说明:1) Description of the coating film reactor 1 of the present invention:
如图1~3所示,本发明的涂膜反应器装置1的主体之一是进气室2,设有腔室50(即均压空腔),容纳涂膜反应气体,腔体内设有一支材料为304或316L不锈钢的进气管22,该管横穿涂膜反应器长度方向的气室内,管22直径不大于32mm,管上分布小孔间距在5mm~25mm,小孔间距优先5mm~15mm之间,间距最优选10mm;小孔尺寸直径在1mm~5mm之间,小孔尺寸优先选在1mm~3mm之间;小孔直径最优选1.5mm~2mm;对于本发明反应器1的进气管直径优选15~25mm,孔的直径优选2mm、孔之间的间距优选10mm;As shown in FIGS. 1 to 3 , one of the main bodies of the film coating reactor device 1 of the present invention is an air inlet chamber 2, which is provided with a chamber 50 (ie, a pressure equalizing cavity) to accommodate the coating reaction gas, and a chamber is provided in the chamber. The inlet pipe 22 is made of 304 or 316L stainless steel. The pipe traverses the gas chamber in the length direction of the coating reactor. The diameter of the pipe 22 is not greater than 32mm. 15mm, the spacing is most preferably 10mm; the diameter of the small hole is between 1mm and 5mm, and the size of the small hole is preferably between 1mm and 3mm; the diameter of the small hole is most preferably 1.5mm to 2mm; The diameter of the trachea is preferably 15-25mm, the diameter of the holes is preferably 2mm, and the spacing between the holes is preferably 10mm;
腔体50下端安装的布气阻尼带,与具有宽度W9的长狭缝26相连,其中反应器1对应的长狭缝26的宽度W9不大于10mm,本发明装置优选7mm;该长狭缝安装着具有均匀布气作用的阻尼带,该阻尼带优先考虑但不限于一定厚度的烧结板、叠孔板,本发明装置优先选择叠孔板,叠孔板是由材料为304或316L的不锈钢平带和不锈钢齿形带组成,平带厚度在0.05mm~0.5mm之间,本发明装置优选在0.08~0.15mm,齿形带的波峰波 谷极差在0.3mm~1.5mm之间,本发明装置优选在0.5~0.75mm,波峰之间间距不大于1.5mm,优选波峰间距1.0mm;阻尼带采用两块固定块23夹紧的方式固定于腔体50下端;阻尼带的高度H1不低于15mm,本发明的涂膜反应器1的阻尼带的高度H1优选为20mm。The air damping belt installed at the lower end of the cavity 50 is connected with the long slit 26 with a width W9, wherein the width W9 of the long slit 26 corresponding to the reactor 1 is not greater than 10mm, and the device of the present invention is preferably 7mm; the long slit is installed With a damping belt with uniform air distribution, the damping belt is preferably but not limited to sintered plates and perforated plates of a certain thickness. The device of the present invention preferentially selects a perforated plate, and the perforated plate is made of 304 or 316L stainless steel flat plate. The belt is composed of a stainless steel toothed belt. The thickness of the flat belt is between 0.05mm and 0.5mm. The device of the present invention is preferably 0.08 to 0.15mm. It is preferably 0.5-0.75mm, the distance between the crests is not more than 1.5mm, and the preferred distance between the crests is 1.0mm; the damping belt is fixed on the lower end of the cavity 50 by clamping two fixing blocks 23; the height H1 of the damping belt is not less than 15mm , the height H1 of the damping belt of the coating film reactor 1 of the present invention is preferably 20 mm.
腔体50外面是热媒介质腔24、84,分别由材料为高强度的焊接钢板或型材25、27、28、29组成热媒介质腔24和84,该热媒介质腔流入的不限于水、热油等介质,本发明装置优选最高使用温度不低于320℃的导热油,该导热油在外侧通过电加热方式准确控制到项目先驱体所要求的温度,以便使腔室50保持在工艺控制的温度。Outside the cavity 50 are the heat medium cavities 24 and 84, which are respectively composed of high-strength welded steel plates or profiles 25, 27, 28, and 29 to form the heat medium cavities 24 and 84. The inflow of the heat medium cavity is not limited to water. , hot oil and other media, the device of the present invention preferably uses heat transfer oil with a maximum temperature of not lower than 320 ° C. The heat transfer oil is accurately controlled to the temperature required by the project precursor through electric heating on the outside, so as to keep the chamber 50 in the process. controlled temperature.
本发明的涂膜反应器装置1的主体之一进气室2与另一主体钢梁承载体3的上端的连接是通过特制的压块和耐高温螺栓共同紧固实施而成,并使下端通过限位槽和密封件固定密封。The connection between the air inlet chamber 2 of the main body of the coating film reactor device 1 of the present invention and the upper end of the steel beam carrier 3 of the other main body is performed by co-fastening the special pressure block and high temperature resistant bolts, and the lower end is fastened together. The seal is fixed by the limit groove and the seal.
本发明的涂膜反应器装置1的另一主体之钢梁承载体3内含反应先驱体进气预热通道7(即进气通道)、与热的平板玻璃构成的反应室66、反应副产物废气和未反应先驱体的排气通道8、排气室9和承载前四种功能的承载梁69,该钢梁承载体3是由多种材质的型材加工制造而成。The steel beam carrier 3 of the other main body of the coating reactor device 1 of the present invention contains an inlet preheating channel 7 (ie, an inlet channel) of the reaction precursor, a reaction chamber 66 formed with hot flat glass, and a reaction pair. The exhaust channel 8 of the product exhaust gas and the unreacted precursor, the exhaust chamber 9 and the bearing beam 69 carrying the first four functions, the steel beam bearing body 3 is processed and manufactured from profiles of various materials.
本发明涂膜反应器1的钢梁承载体3的进气通道7是由金属型材19、20以及由非金属材料加工的上游块12、中心块13组成,所述金属型材19、20在本发明中优选槽型钢制材料,而上游块12和中心块13是具有传热快、导热均匀、且具有可加工性的碳化硅和石墨,在本发明中优选等静压石墨和高纯石墨,更优选等静压石墨,该进气通道7上面承接进气室阻尼带的出口,涂膜反应先驱气体在一定的流速的控制下经过逐渐等温加热、气体离开阻尼带至进气通道7内经过良好的均化、被引导至热的、洁净的玻璃带68上,热玻璃带68与中心块13形成的腔体空间66成为发生化学反应关键区域,反应物质沉积在热玻璃带68的上表面,形成所需要或所设计的薄膜;反应副产物和未反应的先驱气体随着气体自然流动进入由中心块13、下游块14、17以及金属型材18、19、21构成的排气通道8,再经过专有设计的排气狭缝进入排气室9,而后排出。而由金属材料型材构成的腔室58、59、60、61、62、63、64、65则是整个承载梁的冷媒介质流动的通道,该冷媒介质主要以水、高温热油为主,本发明装置所用的冷媒介质以水为主,水温度控制不超过35℃,本发明装置优选不超过25℃。The air inlet channel 7 of the steel beam carrier 3 of the coating reactor 1 of the present invention is composed of metal profiles 19, 20, and upstream blocks 12 and center blocks 13 processed from non-metallic materials. The metal profiles 19, 20 are in this In the present invention, channel-shaped steel materials are preferred, while the upstream block 12 and the center block 13 are silicon carbide and graphite with fast heat transfer, uniform thermal conductivity, and machinability. In the present invention, isostatic graphite and high-purity graphite are preferred. , more preferably isostatic graphite, the inlet channel 7 is connected to the outlet of the damping zone of the inlet chamber, the coating reaction precursor gas is gradually heated isothermally under the control of a certain flow rate, and the gas leaves the damping zone to the inlet channel 7 After good homogenization, it is guided to the hot and clean glass ribbon 68 , and the cavity space 66 formed by the hot glass ribbon 68 and the central block 13 becomes the key area for chemical reaction, and the reactive substances are deposited on the hot glass ribbon 68 . surface, forming the desired or designed film; reaction by-products and unreacted precursor gases flow naturally with the gas into the exhaust channel 8 formed by the central block 13, downstream blocks 14, 17 and metal profiles 18, 19, 21 , and then enter the exhaust chamber 9 through a specially designed exhaust slit, and then discharge. The chambers 58, 59, 60, 61, 62, 63, 64, and 65 composed of metal material profiles are the passages for the cooling medium of the entire bearing beam. The cooling medium is mainly water and high-temperature hot oil. The cooling medium used in the device of the present invention is mainly water, and the temperature of the water is controlled not to exceed 35°C, and the device of the present invention preferably does not exceed 25°C.
本发明涂膜反应器1适用于混合气体流动处于完全层流的状态,众所周知,雷诺准数Re是能够准确描述气体流动状态的无量纲参数,即
Figure PCTCN2021123791-appb-000001
Figure PCTCN2021123791-appb-000002
其中ρ和μ为气体的密度和动力粘性系数,υ为气体流速,因此在给定气体工况的情况下,雷诺准数与气体流速成正比;在管流中,实验结果证明,雷诺数小于2300的流动是层流,而对于两个平行平板内的流体的雷诺准数
Figure PCTCN2021123791-appb-000003
b为两个平板之间的间距,本发明所述的涂膜反应器1的雷诺准数要求不大于350,本发明的涂膜反应器1的雷诺数优选不大于200,由此对于该反应器的进气通道7的狭缝宽度W1的尺寸不大于10mm,本发明狭缝宽度W1优选7mm;同时也说明本发明的该涂膜反应器1的最大混合气体的总流量不大于10Nm 3/h,本发明的涂膜反应器1优选总混合气体量8.5Nm 3/h。
The coating reactor 1 of the present invention is suitable for the mixed gas flow in a completely laminar state. It is well known that the Reynolds number Re is a dimensionless parameter that can accurately describe the gas flow state, that is,
Figure PCTCN2021123791-appb-000001
Figure PCTCN2021123791-appb-000002
Among them, ρ and μ are the density and dynamic viscosity coefficient of the gas, and υ is the gas flow rate. Therefore, under a given gas condition, the Reynolds number is proportional to the gas flow rate. In pipe flow, the experimental results show that the Reynolds number is less than 2300 flow is laminar, and the Reynolds number for fluid in two parallel plates
Figure PCTCN2021123791-appb-000003
b is the distance between two flat plates, the Reynolds number of the film coating reactor 1 of the present invention is required to be no greater than 350, and the Reynolds number of the coating film reactor 1 of the present invention is preferably no greater than 200. Therefore, for this reaction The size of the slit width W1 of the inlet channel 7 of the reactor is not greater than 10mm, and the slit width W1 of the present invention is preferably 7mm; it also illustrates that the total flow rate of the maximum mixed gas of the coating reactor 1 of the present invention is not greater than 10Nm 3 / h, the coating reactor 1 of the present invention preferably has a total mixed gas volume of 8.5 Nm 3 /h.
本发明的涂膜反应器1的进气通道7的其高度H2不小于100mm,本发明的涂膜反应器1的进气通道7的高度H2优选125mm;而作为本发明涂膜反应器1的关键的反应室66总高度H4不大于12mm,本发明H4优选8mm,且反应混合气体的流经长度W2不大于300mm,本发明涂膜反应器优先考虑120mm~300mm,最佳考虑优选160~265mm;The height H2 of the air inlet channel 7 of the film coating reactor 1 of the present invention is not less than 100 mm, and the height H2 of the air inlet channel 7 of the film coating reactor 1 of the present invention is preferably 125 mm; The total height H4 of the key reaction chamber 66 is not greater than 12mm, and H4 is preferably 8mm in the present invention, and the flow length W2 of the reaction mixture is not greater than 300mm, the coating reactor of the present invention is preferably 120mm~300mm, and the best consideration is preferably 160~265mm ;
本发明涂膜反应器1的沉积速率和沉积时间是由浮法玻璃的拉引速度υ f、混合气体输送速度υ g、反应器反应室流经长度W2所决定,其中:沉积时间
Figure PCTCN2021123791-appb-000004
沉积速率是衡量化学气相沉积涂膜反应器的沉积能力的指标之一,受浮法玻璃生产线温度区间和玻璃拉引速度的限制,沉积时间不可能无限地长,这就决定经过反应室的长度严格受到限制,而对于最后成膜的产品的膜层厚度要求达到80~600nm,就需要比较高的沉积速率,本发明的涂膜反应器的膜层沉积速率不小于20nm/s,本发明的涂膜反应器的沉积速率优选不小于30nm/s。
The deposition rate and deposition time of the coating film reactor 1 of the present invention are determined by the pulling speed υ f of the float glass, the mixed gas conveying speed υ g , and the flow length W2 of the reactor chamber, wherein: the deposition time
Figure PCTCN2021123791-appb-000004
The deposition rate is one of the indicators to measure the deposition capacity of the chemical vapor deposition coating reactor. Limited by the temperature range of the float glass production line and the glass pulling speed, the deposition time cannot be infinitely long, which determines the length of the reaction chamber. It is strictly limited, and the film thickness of the final film-forming product is required to reach 80 to 600 nm, and a relatively high deposition rate is required. The film deposition rate of the coating reactor of the present invention is not less than 20 nm/s. The deposition rate of the film coating reactor is preferably not less than 30 nm/s.
2)本发明涂膜反应器2的说明:2) description of coating film reactor 2 of the present invention:
如图4~6所示,本发明的涂膜反应器装置2的主体之一是进气室5,设有腔室75(即均压空腔),容纳涂膜反应气体,腔体内设有一材料为304或316L不锈钢的进气管51,该管横穿涂膜反应器长度方向的气室内,管 51直径不大于32mm,管上分布直径不大于5mm的、相互间距不大于30mm的孔,对于本发明反应器2的进气管直径优选25mm,孔的直径优选2mm、孔之间的间距优选10mm。As shown in FIGS. 4 to 6 , one of the main bodies of the film coating reactor device 2 of the present invention is the air inlet chamber 5 , which is provided with a chamber 75 (ie, a pressure equalizing cavity) to accommodate the coating film reaction gas. The air inlet pipe 51 is made of 304 or 316L stainless steel. The pipe traverses the gas chamber in the length direction of the coating reactor. The diameter of the pipe 51 is not greater than 32mm, and the pipes are distributed with holes with a diameter not greater than 5mm and a mutual spacing of not greater than 30mm. The diameter of the inlet pipe of the reactor 2 of the present invention is preferably 25 mm, the diameter of the holes is preferably 2 mm, and the spacing between the holes is preferably 10 mm.
腔体75下端安装的布气阻尼带,与具有宽度W10的长狭缝57相连,其中反应器2对应的长狭缝57的宽度W10不大于20mm,本发明装置优选15mm;该长狭缝安装着具有均匀布气作用的阻尼带,该阻尼带优先考虑但不限于一定厚度的烧结板、叠孔板,本发明装置优先选择叠孔板,叠孔板是是由材料为304或316L的不锈钢平带和不锈钢齿形带组成,平带厚度在0.05mm~0.5mm之间,本发明装置优选在0.1mm,齿形带的波峰波谷间距在0.3mm~1.5mm之间,本发明装置优选在0.6mm,波峰之间间距不大于1.5mm,优选波峰间距1.0mm;阻尼带采用两块固定块23夹紧的方式固定于腔体75下端;阻尼带的高度H5不低于15mm,本发明的涂膜反应器1的阻尼带的高度H5优选为25mm。The air damping belt installed at the lower end of the cavity 75 is connected with the long slit 57 with a width W10, wherein the width W10 of the long slit 57 corresponding to the reactor 2 is not greater than 20mm, and the device of the present invention is preferably 15mm; the long slit is installed With a damping belt with uniform air distribution, the damping belt is preferentially considered but not limited to a certain thickness of sintered plate and perforated plate. The device of the present invention preferentially selects a perforated plate, and the perforated plate is made of 304 or 316L stainless steel. It is composed of a flat belt and a stainless steel toothed belt. The thickness of the flat belt is between 0.05mm and 0.5mm. The device of the present invention is preferably 0.1mm. 0.6mm, the distance between the crests is not more than 1.5mm, and the preferred distance between the crests is 1.0mm; the damping belt is fixed on the lower end of the cavity 75 by clamping two fixing blocks 23; the height H5 of the damping belt is not less than 15mm, the The height H5 of the damping belt of the film coating reactor 1 is preferably 25 mm.
腔体75外面是热媒介质腔49、83,由材料为高强度的焊接钢板或型材48、52、53、54、74和90组成热媒介质腔49和83,该热媒介质腔49和83流动的介质是但不限于水、热油等,本发明装置优选最高使用温度不低于320℃的导热油,该导热油在外侧通过电加热方式准确控制到项目先驱体气体所要求的温度,以便使腔室75保持在工艺控制的温度。Outside the cavity 75 are the heat medium cavities 49 and 83, which are made of high-strength welded steel plates or profiles 48, 52, 53, 54, 74 and 90 to form the heat medium cavities 49 and 83. 83 The flowing medium is but not limited to water, hot oil, etc. The device of the present invention preferably has a heat transfer oil whose maximum operating temperature is not lower than 320°C, and the heat transfer oil is accurately controlled to the temperature required by the project precursor gas through electric heating on the outside. , in order to maintain the chamber 75 at a process controlled temperature.
本发明的涂膜反应器装置4的主体之一进气室5与另一主体之钢梁承载体6的上端的连接是通过特制的压块和耐高温螺栓共同紧固实施而成,并使下端通过限位槽和密封件固定密封。The connection between the inlet chamber 5 of the main body of the coating film reactor device 4 of the present invention and the upper end of the steel beam carrier 6 of the other main body is realized by the joint fastening of special pressing blocks and high temperature resistant bolts, and makes the The lower end is fixed and sealed through a limit groove and a seal.
本发明的涂膜反应器装置4的另一主体之钢梁承载体6内含反应先驱体进气预热通道71(即进气通道)、与热平板玻璃68构成的反应室67、反应副产物废气和未反应先驱体的废气通道72、87、排气室73、88和承载前四种功能的承载梁70,该钢梁承载体6是由多种材质的型材加工制造而成。The steel beam carrier 6 of the other main body of the coating reactor device 4 of the present invention contains an inlet preheating channel 71 (ie, an inlet channel) of the reaction precursor, a reaction chamber 67 formed with a hot flat glass 68, and a reaction pair. The exhaust gas channels 72, 87, the exhaust chambers 73, 88 of the product exhaust gas and the unreacted precursor, and the bearing beam 70 carrying the first four functions, the steel beam bearing body 6 is processed and manufactured from profiles of various materials.
本发明涂膜反应器装置4的钢梁承载体6的进气通道71是由金属型材34、35以及由非金属材料加工的上游中心块30、下游中心块76组成,所述金属型材34、35在本发明中优选槽型钢制材料,而上游中心块30和下游中心块76是具有传热快、导热均匀、且具有可加工性的碳化硅和石墨,在本发明中优选等静压石墨和高纯石墨,更优选等静压石墨,该进气 通道71上面承接进气室经过阻尼带的出口,涂膜反应先驱体气体在一定的流速的控制下经过逐渐等温加热、气体离开阻尼带在进气通道71内经过良好的均化、被引导至热的洁净的玻璃带68上,热玻璃带68与上游中心块30和下游中心块76形成的空间67和77成为发生化学反应关键区域,反应物质沉积在热玻璃带68的上表面,形成所需要或所设计的薄膜;反应副产物和未反应的先驱体气体随着气体的而自然流动进入由上下游中心块30、76排气块31、32、33、78、79、80、93以及金属型材34、35构成的排气通道72、87,再经过专有设计的排气狭缝进入排气室73,而后排出。而由金属型材构成的腔室40、41、42、43、44、45、46、47、81、82则是整个承载梁的冷媒介质流动的通道,该冷媒介质主要以水、高温热油为主,本发明装置所用的冷媒介质以高温导热油为主,导热油温度控制不超过325℃,本发明装置优选不超过225℃。The air inlet channel 71 of the steel beam carrier 6 of the film coating reactor device 4 of the present invention is composed of metal profiles 34, 35, and an upstream center block 30 and a downstream center block 76 processed from non-metallic materials. The metal profiles 34, 35, 35 In the present invention, channel-shaped steel materials are preferred, while the upstream center block 30 and the downstream center block 76 are silicon carbide and graphite with fast heat transfer, uniform thermal conductivity, and machinability, and isostatic pressing is preferred in the present invention. Graphite and high-purity graphite, more preferably isostatic graphite, the inlet passage 71 is connected to the outlet of the inlet chamber through the damping belt, the coating reaction precursor gas is gradually heated isothermally under the control of a certain flow rate, and the gas leaves the damping The ribbon is well homogenized in the air inlet channel 71 and directed to the hot clean glass ribbon 68, and the spaces 67 and 77 formed by the hot glass ribbon 68 and the upstream center block 30 and the downstream center block 76 become the key to the chemical reaction. zone, the reactive species are deposited on the upper surface of the hot glass ribbon 68 to form the desired or designed thin film; the reaction by-products and unreacted precursor gases flow naturally with the gas into the rows of the upstream and downstream central blocks 30, 76 The air blocks 31, 32, 33, 78, 79, 80, 93 and the exhaust passages 72, 87 formed by the metal profiles 34, 35 enter the exhaust chamber 73 through the specially designed exhaust slits, and then are discharged. The chambers 40, 41, 42, 43, 44, 45, 46, 47, 81, and 82 composed of metal profiles are the channels for the flow of the cooling medium of the entire bearing beam. The cooling medium is mainly composed of water and high-temperature hot oil. Mainly, the cooling medium used in the device of the present invention is mainly high-temperature heat-conducting oil, and the temperature of the heat-conducting oil is controlled not to exceed 325°C, and the device of the present invention preferably does not exceed 225°C.
本发明涂膜反应器装置4适用于混合气体流动处于完全层流的状态,由前述得知,对于两个平行平板内的流体的雷诺准数
Figure PCTCN2021123791-appb-000005
b为两个平板之间的间距,本发明所述的涂膜反应器4的雷诺准数要求不大于750,本发明的涂膜反应器4的雷诺数优选不大于500,由此对于该反应器的进气通道71的狭缝宽度W6的尺寸不大于20mm,本发明狭缝宽度W6优选15mm;同时也说明本发明的该涂膜反应器4的最大混合气体的总流量不大于35Nm 3/h,最小混合气体总流量不低于12Nm 3/h,本发明的涂膜反应器4优选总混合气体量25Nm 3/h。
The film coating reactor device 4 of the present invention is suitable for the state where the mixed gas flow is in a completely laminar flow state. It is known from the foregoing that the Reynolds number for the fluid in two parallel flat plates
Figure PCTCN2021123791-appb-000005
b is the distance between two flat plates, the Reynolds number of the film coating reactor 4 of the present invention is required to be no greater than 750, and the Reynolds number of the coating film reactor 4 of the present invention is preferably no greater than 500. Therefore, for this reaction The size of the slit width W6 of the inlet channel 71 of the reactor is not more than 20mm, and the slit width W6 of the present invention is preferably 15mm; it also shows that the total flow rate of the maximum mixed gas of the coating reactor 4 of the present invention is not greater than 35Nm 3 / h, the minimum total mixed gas flow is not less than 12Nm 3 /h, and the film coating reactor 4 of the present invention preferably has a total mixed gas volume of 25Nm 3 /h.
本发明的涂膜反应器装置4的进气通道71的其高度H6不小于100mm,本发明的涂膜反应器4的进气通道71的高度H6优选125mm;而作为本发明涂膜反应器4的关键的反应室67和77总高度H8不大于12mm,本发明H4优选8mm。The height H6 of the air inlet channel 71 of the film coating reactor device 4 of the present invention is not less than 100 mm, and the height H6 of the air inlet channel 71 of the film coating reactor 4 of the present invention is preferably 125 mm; The total height H8 of the key reaction chambers 67 and 77 is not more than 12mm, and H4 is preferably 8mm in the present invention.
本发明涂膜反应器装置4的沉积速率和沉积时间是由浮法玻璃的拉引速度υ f、混合气体输送速度υ g、反应器反应室流经长度W5和W7所决定,其中:沉积时间
Figure PCTCN2021123791-appb-000006
总沉积时间t=t 上游+t 下游
Figure PCTCN2021123791-appb-000007
Figure PCTCN2021123791-appb-000008
因此本发明涂膜反应器2的反应混合气体的流经 长度设计W5≤W7,W5和W7不大于300mm,本发明涂膜反应器优选W5=180~200mm,W7=220~265mm,膜层沉积速率不小于20nm/s,本发明的涂膜反应器的沉积速率优选不小于30nm/s。
The deposition rate and deposition time of the coating film reactor device 4 of the present invention are determined by the pulling speed υ f of the float glass, the mixed gas conveying speed υ g , and the lengths W5 and W7 of the reactor chamber, wherein: the deposition time
Figure PCTCN2021123791-appb-000006
Total deposition time t = t upstream + t downstream ,
Figure PCTCN2021123791-appb-000007
Figure PCTCN2021123791-appb-000008
Therefore, the flow length of the reaction mixture gas in the coating reactor 2 of the present invention is designed to be W5≤W7, and W5 and W7 are not greater than 300mm. The coating reactor of the present invention preferably has W5=180~200mm, W7=220~265mm, and film deposition The rate is not less than 20 nm/s, and the deposition rate of the film coating reactor of the present invention is preferably not less than 30 nm/s.
实施例1Example 1
使用上述涂膜反应器1,涂膜反应器1置放在浮法玻璃生产线锡槽两侧玻璃板下锡液温度为625℃的位置,并且反应器的下表面距离玻璃板的高度为5mm,调节热油循环系统控制导热油的油温200℃进入进气室,并使之保持在该温度下;同时调整热油循环系统控制主承载梁的油温在130℃,使承载梁在该温度下能够保持良好的刚度,使反应器在浮法玻璃板面上保持水平;通过调整主承载梁底板19与中心块13之间的隔热材料,使在此工况条件下中心块13的温度保持在200~220℃。Using the above-mentioned film coating reactor 1, the film coating reactor 1 is placed at a position where the temperature of the tin liquid under the glass plate on both sides of the tin bath of the float glass production line is 625 ° C, and the height of the lower surface of the reactor from the glass plate is 5mm, Adjust the hot oil circulation system to control the oil temperature of the heat transfer oil to enter the intake chamber at 200°C, and keep it at this temperature; at the same time, adjust the hot oil circulation system to control the oil temperature of the main bearing beam at 130°C, so that the bearing beam is at this temperature Good rigidity can be maintained under this condition, so that the reactor can be kept level on the float glass plate; by adjusting the thermal insulation material between the bottom plate 19 of the main bearing beam and the center block 13, the temperature of the center block 13 can be adjusted under this working condition. Keep at 200~220℃.
将钛酸四丁酯原料放置于标准的鼓泡器内,鼓泡器的温度控制在170℃,并将流量为6.21标准立方米/小时、已经通过加热器加热到温度为170℃的氮气通入鼓泡器内,同时再辅以流量为2.25标准立方米/小时的稀释氮气混合后一起在温度保持在180℃管道输送至反应器,并通过反应器输送至热的玻璃带的上表面;The tetrabutyl titanate raw material was placed in a standard bubbler, the temperature of the bubbler was controlled at 170 ° C, and the flow rate of 6.21 standard cubic meters per hour, which had been heated to a temperature of 170 ° C by a heater, was passed through nitrogen gas. Into the bubbler, at the same time, it is mixed with dilute nitrogen with a flow rate of 2.25 standard cubic meters per hour, and then the temperature is kept at 180 ° C and is transported to the reactor, and is transported to the upper surface of the hot glass ribbon through the reactor;
在此条件下,玻璃带在反应器下以拉引速度415米/小时移动,以36.8纳米/秒的沉积速率沉积厚度为85纳米的二氧化钛薄膜,该二氧化钛薄膜经检测其颜色值L*=65.5,a*=5.22,b*=1.01。Under this condition, the glass ribbon was moved under the reactor at a pulling speed of 415 m/h, and a titanium dioxide film with a thickness of 85 nm was deposited at a deposition rate of 36.8 nm/sec. The color value of the titanium dioxide film was detected L*=65.5 , a*=5.22, b*=1.01.
实施例2Example 2
使用上述涂膜反应器2,涂膜反应器2置放在浮法玻璃生产线锡槽两侧玻璃板下锡液温度为615℃的位置,并且反应器的下表面距离玻璃板的高度为5mm,调节热油循环系统控制导热油的油温160℃进入进气室,并使之保持在该温度下;同时调整热油循环系统控制主承载梁的油温在130℃,使承载梁在该温度下能够保持良好的刚度,使反应器在浮法玻璃板面上保持水平;通过调整主承载梁底板34、35与中心块30、76之间的隔热材料,使在此工况条件下中心块13的温度保持在190~200℃。Using the above-mentioned film coating reactor 2, the film coating reactor 2 was placed at a position where the temperature of the tin liquid under the glass plate on both sides of the float glass production line was 615 ° C, and the height of the lower surface of the reactor from the glass plate was 5mm, Adjust the hot oil circulation system to control the oil temperature of the heat transfer oil to enter the intake chamber at 160°C, and keep it at this temperature; at the same time, adjust the hot oil circulation system to control the oil temperature of the main bearing beam at 130°C, so that the bearing beam is at this temperature Good rigidity can be maintained under this condition, so that the reactor can be kept level on the float glass plate; by adjusting the thermal insulation material between the main bearing beam bottom plates 34, 35 and the center blocks 30, 76, under this working condition, the center The temperature of the block 13 is maintained at 190-200°C.
将钛酸四丁酯原料放置于标准的鼓泡器内,鼓泡器的温度控制在160℃,并将流量为9.85标准立方米/小时,已经通过加热器加热到温度为 160℃的氮气通入鼓泡器内,、并辅以流量为15.05标准立方米/小时的并加热良好的稀释气体充分混合,在温度保持在160℃管道输送至反应器,并通过反应器输送至热的玻璃带的上表面;The tetrabutyl titanate raw material is placed in a standard bubbler, the temperature of the bubbler is controlled at 160 ° C, and the flow rate is 9.85 standard cubic meters per hour, which has been heated to a temperature of 160 ° C by a heater. Into the bubbler, supplemented with a flow rate of 15.05 standard cubic meters per hour and well-heated diluent gas to mix well, keep the temperature at 160 ° C pipeline to the reactor, and through the reactor to the hot glass ribbon the upper surface of the;
在此条件下,玻璃带在反应器下以拉引速度498米/小时移动,以55.3纳米/秒的沉积速率沉积厚度为176纳米的二氧化钛薄膜,该二氧化钛薄膜经检测其颜色值L*=63.8,a*=9.64,b*=-0.50。Under this condition, the glass ribbon was moved under the reactor at a pulling speed of 498 m/h, and a TiO2 film with a thickness of 176 nm was deposited at a deposition rate of 55.3 nm/sec. The color value of the TiO2 film was detected L*=63.8 , a*=9.64, b*=-0.50.
此外应理解,在阅读了本发明的上述描述内容之后,本领域技术人员可以对本发明作各种改动或修改,这些等价形式同样落于本申请所附权利要求书所限定的范围。In addition, it should be understood that after reading the above description of the present invention, those skilled in the art can make various changes or modifications to the present invention, and these equivalent forms also fall within the scope defined by the appended claims of the present application.

Claims (10)

  1. 一种用于化学气相沉积法镀膜玻璃的反应器,其特征在于,包括可独立预设温度的对进入的反应气体在所述反应器长度方向上能够实施独立均匀布气的进气室和钢梁承载体;A reactor for coating glass by chemical vapor deposition is characterized in that it comprises an air inlet chamber and a steel inlet chamber capable of independently and uniformly distributing the incoming reaction gas in the length direction of the reactor, the temperature of which can be independently preset. beam carrier;
    所述进气室:The intake chamber:
    包括均压空腔和包围所述均压空腔、由外界控制系统实施控制的用于控制所述均压空腔内反应气体温度的热媒介质腔;comprising a pressure equalization cavity and a heat medium cavity surrounding the pressure equalization cavity and controlled by an external control system for controlling the temperature of the reaction gas in the pressure equalization cavity;
    所述均压空腔内设有供反应气体进入的进气管,所述进气管的管壁上沿所述反应器长度方向规则分布多个小孔;The pressure equalization cavity is provided with an air inlet pipe for the reaction gas to enter, and a plurality of small holes are regularly distributed along the length direction of the reactor on the pipe wall of the air inlet pipe;
    所述均压空腔底部出口处设置具有多个微孔、用于均匀布气的阻尼带,所述阻尼带选自烧结板或叠孔板,所述叠孔板由纵向设置且交替分布的平带和齿形带组成;At the outlet of the bottom of the pressure equalizing cavity, a damping belt with a plurality of micropores for uniform air distribution is arranged, and the damping belt is selected from a sintered plate or a perforated plate, and the laminated orifice plate is composed of longitudinally arranged and alternately distributed Composed of flat belt and toothed belt;
    所述钢梁承载体包括:The steel beam bearing body includes:
    与所述进气室出口连通、从上至下具有可调温度梯度的进气通道;an air intake passage communicating with the outlet of the air intake chamber and having an adjustable temperature gradient from top to bottom;
    与所述进气通道出口以及外界相通、与热玻璃带形成的反应室,其内的反应气体可与所述热玻璃带接触反应镀膜且浓度和流速均匀;a reaction chamber communicated with the outlet of the air inlet channel and the outside, and formed with the heated glass ribbon, the reaction gas in the reaction chamber can contact the heated glass ribbon for reaction coating, and the concentration and flow rate are uniform;
    与所述反应室出口连通、在所述反应器长度方向上能够均匀使反应废气均衡排出的排气通道;an exhaust channel that communicates with the outlet of the reaction chamber and can uniformly discharge the reaction waste gas in the length direction of the reactor;
    与所述排气通道出口连通、能够排出反应废气的排气室,其四周设有用于控制所述排气室内反应废气温度的冷媒介质腔;an exhaust chamber communicating with the outlet of the exhaust passage and capable of discharging the reaction exhaust gas, and a cooling medium cavity for controlling the temperature of the reaction exhaust gas in the exhaust chamber is arranged around the exhaust chamber;
    所述进气室、进气通道、反应室、排气通道、排气室构成反应气体通道,其中,所述进气通道、反应室、排气通道构成单U型或双U型通道,反应气体在该通道内经历预热、反应、排出过程;The inlet chamber, the inlet channel, the reaction chamber, the exhaust channel, and the exhaust chamber constitute a reaction gas channel, wherein the inlet channel, the reaction chamber, and the exhaust channel constitute a single U-shaped or double U-shaped channel, and the reaction The gas undergoes preheating, reaction and discharge processes in this channel;
    所述进气室通过非焊接形式与所述钢梁承载体连接,且所述进气室的钢构独立于所述反应室、排气室的钢构。The intake chamber is connected to the steel beam carrier in a non-welded form, and the steel structure of the intake chamber is independent of the steel structure of the reaction chamber and the exhaust chamber.
  2. 根据权利要求1所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,所述均压空腔和热媒介质腔均由厚度不小于5mm的优质碳钢 焊接而成,耐压气密性大于0.5MPa/24h;所述热媒介质腔内的热媒介质为水或导热油,所述导热油耐温320℃以上;The reactor for chemical vapor deposition coated glass according to claim 1, wherein the pressure equalizing cavity and the heat medium cavity are welded by high-quality carbon steel with a thickness of not less than 5 mm, and are pressure-resistant The air tightness is greater than 0.5MPa/24h; the heat medium in the heat medium cavity is water or heat transfer oil, and the heat transfer oil has a temperature resistance of more than 320°C;
    所述进气管的直径为10~35mm;所述进气管规则分布的小孔间距在5mm~25mm,小孔尺寸直径在1mm~5mm之间。The diameter of the air inlet pipe is 10-35 mm; the regularly distributed small holes of the air inlet pipe are spaced between 5 mm and 25 mm, and the diameter of the small holes is between 1 mm and 5 mm.
  3. 根据权利要求1所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,由平带和齿形带组成的阻尼带的微孔直径为0.2~1.5mm,所述平带厚度为0.05~0.5mm,所述齿形带的波峰波谷极差为0.3~1.5mm,波峰之间间距不大于1.5mm;The reactor for coating glass by chemical vapor deposition method according to claim 1, wherein the diameter of the pores of the damping belt composed of the flat belt and the toothed belt is 0.2-1.5 mm, and the thickness of the flat belt is 0.2-1.5 mm. 0.05-0.5mm, the peak-to-valley range of the toothed belt is 0.3-1.5mm, and the distance between the peaks is not more than 1.5mm;
    所述阻尼带采用两块固定块夹紧的方式固定于所述均压空腔下端,所述阻尼带的高度不低于15mm,厚度为5~25mm。The damping band is fixed on the lower end of the pressure equalizing cavity by means of clamping two fixing blocks, the height of the damping band is not less than 15mm, and the thickness is 5-25mm.
  4. 根据权利要求1所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,所述进气通道由第一钢构与上游块、中心块或第一钢构与两块中心块围成,由上至下温度逐渐升高,形成反应气体的预热通道;The reactor for chemical vapor deposition coated glass according to claim 1, wherein the air inlet channel is surrounded by a first steel structure and an upstream block, a center block, or a first steel structure and two center blocks The temperature gradually increases from top to bottom to form a preheating channel for the reaction gas;
    所述第一钢构用于构成所述冷媒介质腔;所述排气室、冷媒介质腔、中心块均位于所述U型通道的内侧;所述中心块位于所述第一钢构下方且与所述第一钢构的间隙可调,从而可调整所述中心块的温度;The first steel structure is used to form the cooling medium cavity; the exhaust chamber, the cooling medium cavity and the center block are all located inside the U-shaped channel; the center block is located under the first steel structure and The gap with the first steel structure is adjustable, so that the temperature of the center block can be adjusted;
    所述反应室为所述中心块与热玻璃带组成的用于镀膜的反应通道,所述反应室直接置于所述热玻璃带之上。The reaction chamber is a reaction channel for coating formed by the central block and the hot glass ribbon, and the reaction chamber is directly placed on the hot glass ribbon.
  5. 根据权利要求4所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,所述中心块的材质为碳化硅或石墨,所述石墨包括等静压石墨;所述中心块的温度为150~500℃,预热通道的温度在50~420℃,进气通道的宽度为5~25mm。The reactor for chemical vapor deposition coated glass according to claim 4, wherein the material of the center block is silicon carbide or graphite, and the graphite includes isostatic graphite; the temperature of the center block is The temperature of the preheating channel is 50-420 °C, and the width of the intake channel is 5-25 mm.
  6. 根据权利要求4或5所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,所述排气通道由所述中心块和排气块围成,用于排出反应后的生成的气体和未反应气体组成的混合气体,排气通道宽度10mm~40mm。The reactor for chemical vapor deposition coated glass according to claim 4 or 5, characterized in that, the exhaust passage is surrounded by the center block and the exhaust block, and is used for discharging the reacted products. Mixed gas composed of gas and unreacted gas, the width of the exhaust channel is 10mm to 40mm.
  7. 根据权利要求1所述的用于化学气相沉积法镀膜玻璃的反应器,其 特征在于,所述排气室由高强度碳钢板和管焊接而成,所述排气室通过狭缝与所述排气通道连通,所述狭缝开口沿反应器长度方向的长度为200~450mm,沿反应器竖直方向的长度为1.5~12.5mm;The reactor for chemical vapor deposition coated glass according to claim 1, characterized in that, the exhaust chamber is formed by welding high-strength carbon steel plates and pipes, and the exhaust chamber is connected to the exhaust chamber through a slit. The exhaust channel is connected, and the length of the slit opening along the length direction of the reactor is 200-450 mm, and the length along the vertical direction of the reactor is 1.5-12.5 mm;
    所述冷媒介质腔内的冷媒介质为水或导热油。The cooling medium in the cooling medium cavity is water or heat-conducting oil.
  8. 根据权利要求1所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,所述的单U型通道水平段用于镀膜的长度不大于300mm,双U型通道水平段用于镀膜的总长度不大于550mm。The reactor for coating glass by chemical vapor deposition method according to claim 1, wherein the length of the single U-shaped channel horizontal section used for coating is not more than 300mm, and the double U-shaped channel horizontal section is used for coating The total length is not more than 550mm.
  9. 根据权利要求1所述的用于化学气相沉积法镀膜玻璃的反应器,其特征在于,所述进气室的钢构通过滑块螺栓与所述反应室、排气室的钢构连接,连接处设有保温材料,所述保温材料包括硅酸铝纤维毡。The reactor for chemical vapor deposition coated glass according to claim 1, wherein the steel structure of the intake chamber is connected with the steel structures of the reaction chamber and the exhaust chamber through slider bolts, and the connection is A thermal insulation material is provided at the place, and the thermal insulation material includes an aluminum silicate fiber felt.
  10. 一种利用权利要求1~9任一权利要求所述的反应器沉积镀膜的方法,其特征在于,包括:反应气体经进气室预热恒压布气后流入进气通道,经进一步预热后抵达反应室,反应气体在玻璃表面发生化学反应,生成物沉积在玻璃表面成膜,而含反应余气的反应废气则经排气通道流入排气室排至室外或回收装置。A method for depositing a coating film using the reactor according to any one of claims 1 to 9, wherein the method comprises: the reaction gas is preheated in an air inlet chamber and then flows into an air inlet channel after being preheated and distributed at a constant pressure, and further preheated After reaching the reaction chamber, the reaction gas reacts chemically on the glass surface, the product is deposited on the glass surface to form a film, and the reaction waste gas containing the reaction gas flows into the exhaust chamber through the exhaust channel and is discharged to the outdoor or recovery device.
PCT/CN2021/123791 2021-03-02 2021-10-14 Reactor for chemical vapor deposition method-based coated glass WO2022183738A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202110231874.8A CN112777943B (en) 2021-03-02 2021-03-02 Reactor for chemical vapor deposition method coated glass
CN202110231874.8 2021-03-02

Publications (1)

Publication Number Publication Date
WO2022183738A1 true WO2022183738A1 (en) 2022-09-09

Family

ID=75762099

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2021/123791 WO2022183738A1 (en) 2021-03-02 2021-10-14 Reactor for chemical vapor deposition method-based coated glass

Country Status (2)

Country Link
CN (1) CN112777943B (en)
WO (1) WO2022183738A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112777943B (en) * 2021-03-02 2021-11-19 浙江大学 Reactor for chemical vapor deposition method coated glass
CN115806393A (en) * 2022-12-09 2023-03-17 耀华(秦皇岛)玻璃技术开发有限公司 Online siliceous sunlight coating system of super large sheet width float glass

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4469045A (en) * 1975-06-11 1984-09-04 Pilkington Brothers P.L.C. Coating glass
US4793282A (en) * 1987-05-18 1988-12-27 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
US4857097A (en) * 1987-08-28 1989-08-15 Pilkington Plc Method and apparatus for coating glass
US5065696A (en) * 1987-05-18 1991-11-19 Libbey-Owens-Ford Co. Temperature controlled distributor beam for chemical vapor deposition
US5286295A (en) * 1991-02-13 1994-02-15 Saint-Gobain Vitrage International Nozzle with nonsymmetrical feed for the formation of a coating layer on a ribbon of glass, by pyrolysis of a gas mixture
CN2230760Y (en) * 1994-09-26 1996-07-10 秦皇岛开发区蓝光玻璃新技术公司 Online glass coating apparatus for float process
CN202626033U (en) * 2012-06-29 2012-12-26 海阳中浮新型建材有限公司 Online coating machine for hanging type float glass
CN112777943A (en) * 2021-03-02 2021-05-11 浙江大学 Reactor for chemical vapor deposition method coated glass

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100340512C (en) * 2005-11-08 2007-10-03 浙江大学蓝星新材料技术有限公司 Apparatus for on-line coating film of float glass
CN101844873B (en) * 2009-03-24 2012-12-19 深圳市拓日新能源科技股份有限公司 On-line film coating method of conductive glass and on-line film coating device
CN201770773U (en) * 2010-06-25 2011-03-23 蚌埠玻璃工业设计研究院 Gas distributing device for film coating of large-size substrate
CN202337730U (en) * 2011-11-19 2012-07-18 蚌埠玻璃工业设计研究院 Reactor for glass coating
CN103058530B (en) * 2013-01-23 2015-05-06 秦皇岛玻璃工业研究设计院 Film plating device and method for preparing TCO (Transparent Conducting Oxide) glass online by floating method
CN104561938B (en) * 2015-01-09 2017-04-19 浙江大学 Online normal-pressure chemical vapor deposition film-plating reactor through floatation process

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4469045A (en) * 1975-06-11 1984-09-04 Pilkington Brothers P.L.C. Coating glass
US4793282A (en) * 1987-05-18 1988-12-27 Libbey-Owens-Ford Co. Distributor beam for chemical vapor deposition on glass
US5065696A (en) * 1987-05-18 1991-11-19 Libbey-Owens-Ford Co. Temperature controlled distributor beam for chemical vapor deposition
US4857097A (en) * 1987-08-28 1989-08-15 Pilkington Plc Method and apparatus for coating glass
US5286295A (en) * 1991-02-13 1994-02-15 Saint-Gobain Vitrage International Nozzle with nonsymmetrical feed for the formation of a coating layer on a ribbon of glass, by pyrolysis of a gas mixture
CN2230760Y (en) * 1994-09-26 1996-07-10 秦皇岛开发区蓝光玻璃新技术公司 Online glass coating apparatus for float process
CN202626033U (en) * 2012-06-29 2012-12-26 海阳中浮新型建材有限公司 Online coating machine for hanging type float glass
CN112777943A (en) * 2021-03-02 2021-05-11 浙江大学 Reactor for chemical vapor deposition method coated glass

Also Published As

Publication number Publication date
CN112777943A (en) 2021-05-11
CN112777943B (en) 2021-11-19

Similar Documents

Publication Publication Date Title
WO2022183738A1 (en) Reactor for chemical vapor deposition method-based coated glass
JP6110004B2 (en) Apparatus for coating thin film coating and coating method using such apparatus
US20100162765A1 (en) Atmosphere Regulator and Coating Apparatus for Coating on Float Glass Production Line
EP2688850B1 (en) Method of depositing zinc oxide coatings by chemical vapor deposition
US10573765B2 (en) APCVD of doped titanium oxide and the coated article made thereby
MX2011001142A (en) Unit and process for treating the surface of flat glass with thermal conditioning of the glass.
WO2022077637A1 (en) Spraying plate, mocvd reaction system having spraying plate, and use method thereof
US9776914B2 (en) Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby
CN104561938A (en) Online normal-pressure chemical vapor deposition film-plating reactor through floatation process
JP4058364B2 (en) Semiconductor manufacturing equipment
EP2391743B1 (en) Method of depositing an electrically conductive titanium oxide coating on a substrate
KR20160125288A (en) Apparatus for producing float glass and method for producing float glass
US6103015A (en) Symmetrical CVD coater with lower upstream exhaust toe
CN104451601B (en) Atmospheric-pressure chemical vapor deposition coating reactor
CN212426180U (en) Multiunit hot wire reaction unit
CN202322985U (en) Equipment for depositing conducting film or semiconductor material on substrate
CN221238163U (en) Sintering furnace for high-quality aluminum nitride ceramic plate
CN1067119C (en) Method and apparatus for large area high-speed thermal filament chemical vapor deposition of diamond
CN103132021A (en) Device and method for depositing conductive membrane or semiconductor material on substrate
CN116121732A (en) Reaction device for offline chemical vapor deposition coating of transparent electrode glass for solar cell
CN103132022A (en) Device and method for depositing conductive membrane or semiconductor material on glass or metal substrate

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 21928812

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 21928812

Country of ref document: EP

Kind code of ref document: A1