WO2022163778A1 - Method for manufacturing laminate, method for manufacturing circuit wiring, method for manufacturing electronic device, and photosensitive transfer material - Google Patents
Method for manufacturing laminate, method for manufacturing circuit wiring, method for manufacturing electronic device, and photosensitive transfer material Download PDFInfo
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- WO2022163778A1 WO2022163778A1 PCT/JP2022/003169 JP2022003169W WO2022163778A1 WO 2022163778 A1 WO2022163778 A1 WO 2022163778A1 JP 2022003169 W JP2022003169 W JP 2022003169W WO 2022163778 A1 WO2022163778 A1 WO 2022163778A1
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- Prior art keywords
- layer
- photosensitive
- mass
- photosensitive layer
- meth
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- FHIODWDKXMVJGO-UHFFFAOYSA-N sodium;8-anilino-5-[[4-[(5-sulfonaphthalen-1-yl)diazenyl]naphthalen-1-yl]diazenyl]naphthalene-1-sulfonic acid Chemical compound [Na+].C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1N=NC(C1=CC=CC=C11)=CC=C1N=NC(C1=CC=CC(=C11)S(O)(=O)=O)=CC=C1NC1=CC=CC=C1 FHIODWDKXMVJGO-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical class C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000375 suspending agent Substances 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003577 thiophenes Chemical class 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 239000005341 toughened glass Substances 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 125000005259 triarylamine group Chemical group 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- LZTRCELOJRDYMQ-UHFFFAOYSA-N triphenylmethanol Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C1=CC=CC=C1 LZTRCELOJRDYMQ-UHFFFAOYSA-N 0.000 description 1
- JODJRDDQVZMRIY-UHFFFAOYSA-N trityloxyboronic acid Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(OB(O)O)C1=CC=CC=C1 JODJRDDQVZMRIY-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 230000004304 visual acuity Effects 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000012463 white pigment Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 239000001018 xanthene dye Substances 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 229910000166 zirconium phosphate Inorganic materials 0.000 description 1
- LEHFSLREWWMLPU-UHFFFAOYSA-B zirconium(4+);tetraphosphate Chemical compound [Zr+4].[Zr+4].[Zr+4].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LEHFSLREWWMLPU-UHFFFAOYSA-B 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
Abstract
Description
一般的にパターン化した層の形成には、必要とするパターン形状を得るための工程数が少ないといったことから、感光性転写材料を用いて任意の基板上に設けた感光性樹脂組成物の層に対して、所望のパターンを有するマスクを介して露光した後に現像する方法が広く使用されている。 In a display device with a touch panel such as a capacitive input device (organic electroluminescence (EL) display device, liquid crystal display device, etc.), the electrode pattern corresponding to the sensor in the visible part, the wiring of the peripheral wiring part and the lead-out wiring part A conductive layer pattern such as is provided inside the touch panel.
Generally, the formation of a patterned layer requires a small number of steps to obtain the required pattern shape. In contrast, a method of developing after exposure through a mask having a desired pattern is widely used.
特許文献1には、支持フィルムと、上記支持フィルム上に形成された、感光性樹脂組成物を含む感光性樹脂組成物層と、を備える感光性樹脂積層体がロールされてなる感光性樹脂積層体ロールであって、上記支持フィルムは、上記支持フィルムの互いに異なる任意の10箇所において、0.75mm×11mmの小片を切り出したときの、各小片中に含まれる、直径2μm以上の微粒子の数が、前記10箇所の数平均で200個以下となる領域を有し、上記支持フィルムの裏面は算術平均粗さが0.01μm以上である領域を含む感光性樹脂積層体ロールが記載されている。 Further, as a conventional photosensitive resin laminate roll, one described in Patent Document 1 is known.
In Patent Document 1, a photosensitive resin laminate obtained by rolling a photosensitive resin laminate including a support film and a photosensitive resin composition layer containing a photosensitive resin composition formed on the support film The number of fine particles having a diameter of 2 μm or more contained in each small piece of the support film when a small piece of 0.75 mm × 11 mm is cut out from any 10 different locations of the support film. However, the number average of the 10 locations is 200 or less, and the back surface of the support film includes a region having an arithmetic mean roughness of 0.01 μm or more. .
本発明の他の一実施形態が解決しようとする課題は、上記積層体の製造方法により得られる積層体を用いた回路配線の製造方法、及び、電子デバイスの製造方法を提供することである。
また、本発明の更に他の実施形態が解決しようとする課題は、ピンホール欠陥の少ない樹脂パターンが得られる感光性転写材料を提供することである。 A problem to be solved by one embodiment of the present invention is to provide a method for manufacturing a laminate having a resin pattern with few pinhole defects.
A problem to be solved by another embodiment of the present invention is to provide a circuit wiring manufacturing method and an electronic device manufacturing method using the laminate obtained by the laminate manufacturing method.
Further, another object of the present invention is to provide a photosensitive transfer material with which a resin pattern with few pinhole defects can be obtained.
<1> 仮支持体と感光性層を含む転写層とを有する感光性転写材料の転写層側が基板と接するように、上記感光性転写材料と上記基板とを貼合する貼合工程、上記感光性層を露光する露光工程、及び、上記感光性層を現像して樹脂パターンを形成する現像工程を含み、上記露光工程における感光性層の限界解像度をXμmとして定義し、粒子及び空隙の基準直径をY=0.5×Xで表されるYμmとして定義した場合、上記露光工程における感光性層の表面及び内部におけるYμm以上の直径を有する粒子及び空隙の個数が、15個/cm2以下である積層体の製造方法。
<2> 上記感光性層の厚さが、5.0μm以下である<1>に記載の積層体の製造方法。
<3> 上記仮支持体の厚さが、16μm以下である<1>又は<2>に記載の積層体の製造方法。
<4> 上記樹脂パターンが、線幅が10μm以下である樹脂パターンを有する<1>~<3>のいずれか1つに記載の積層体の製造方法。
<5> 上記貼合工程と上記露光工程との間に、上記仮支持体を剥離する剥離工程を含む<1>~<4>のいずれか1つに記載の積層体の製造方法。
<6> 上記露光工程において、上記転写層とマスクとを接触させ露光処理を行う<1>~<5>のいずれか1つに記載の積層体の製造方法。
<7> 上記転写層が、熱可塑性樹脂層、及び、水溶性樹脂層を更に含む<1>~<6>のいずれか1つに記載の積層体の製造方法。
<8> 上記感光性層が、多官能重合性化合物を含む<1>~<7>のいずれか1つに記載の積層体の製造方法。
<9> 上記感光性層が、3官能以上の重合性化合物を含む<1>~<8>のいずれか1つに記載の積層体の製造方法。
<10> 上記感光性層が、ポリエチレンオキサイド構造を有する重合性化合物を含む<1>~<9>のいずれか1つに記載の積層体の製造方法。
<11> <1>~<10>のいずれか1つに記載の積層体の製造方法により得られた積層体を準備する準備工程、及び、上記樹脂パターンが配置されていない領域における上記基板をエッチング処理するエッチング工程をこの順に含む回路配線の製造方法。
<12> <1>~<10>のいずれか1つに記載の積層体の製造方法により得られた積層体を準備する準備工程、及び、上記樹脂パターンが配置されていない領域における上記基板をエッチング処理するエッチング工程をこの順に含む電子デバイスの製造方法。
<13> 仮支持体と感光性層を含む転写層とを有し、上記感光性層の限界解像度をXTμmとして定義し、粒子の基準直径をYT=0.5×XTで表されるYTμmとして定義した場合、上記感光性層の表面及び内部におけるYTμm以上の直径を有する粒子の個数が、15個/cm2以下である感光性転写材料。
<14> 上記感光性層の厚さが、5.0μm以下である<13>に記載の感光性転写材料。
<15> 上記仮支持体の厚さが、16μm以下である<13>又は<14>に記載の感光性転写材料。 Means for solving the above problems include the following aspects.
<1> A bonding step of bonding the photosensitive transfer material and the substrate so that the transfer layer side of the photosensitive transfer material having the temporary support and the transfer layer including the photosensitive layer is in contact with the substrate, the photosensitive and a developing step of developing the photosensitive layer to form a resin pattern. is defined as Y μm represented by Y=0.5×X, the number of particles and voids having a diameter of Y μm or more on the surface and inside of the photosensitive layer in the exposure step is 15/cm 2 or less. A method of manufacturing a laminate.
<2> The method for producing a laminate according to <1>, wherein the photosensitive layer has a thickness of 5.0 μm or less.
<3> The method for producing a laminate according to <1> or <2>, wherein the temporary support has a thickness of 16 μm or less.
<4> The method for producing a laminate according to any one of <1> to <3>, wherein the resin pattern has a line width of 10 μm or less.
<5> The method for producing a laminate according to any one of <1> to <4>, including a peeling step of peeling the temporary support between the bonding step and the exposure step.
<6> The method for producing a laminate according to any one of <1> to <5>, wherein in the exposure step, the transfer layer and the mask are brought into contact with each other.
<7> The method for producing a laminate according to any one of <1> to <6>, wherein the transfer layer further includes a thermoplastic resin layer and a water-soluble resin layer.
<8> The method for producing a laminate according to any one of <1> to <7>, wherein the photosensitive layer contains a polyfunctional polymerizable compound.
<9> The method for producing a laminate according to any one of <1> to <8>, wherein the photosensitive layer contains a trifunctional or higher polymerizable compound.
<10> The method for producing a laminate according to any one of <1> to <9>, wherein the photosensitive layer contains a polymerizable compound having a polyethylene oxide structure.
<11> A preparation step of preparing a laminate obtained by the method for producing a laminate according to any one of <1> to <10>, and removing the substrate in a region where the resin pattern is not arranged. A circuit wiring manufacturing method including an etching step of performing an etching treatment in this order.
<12> A preparation step of preparing a laminate obtained by the method for producing a laminate according to any one of <1> to <10>, and removing the substrate in a region where the resin pattern is not arranged. A method of manufacturing an electronic device including etching steps of etching in this order.
<13> Having a temporary support and a transfer layer containing a photosensitive layer, defining the limiting resolution of the photosensitive layer as X T μm, and expressing the reference diameter of the particles as Y T =0.5×X T a photosensitive transfer material, wherein the number of particles having a diameter of YT μm or more on the surface and inside of the photosensitive layer is 15 particles/cm 2 or less when defined as YT μm.
<14> The photosensitive transfer material according to <13>, wherein the photosensitive layer has a thickness of 5.0 μm or less.
<15> The photosensitive transfer material according to <13> or <14>, wherein the temporary support has a thickness of 16 μm or less.
本発明の他の一実施形態によれば、上記積層体の製造方法により得られる積層体を用いた回路配線の製造方法、及び、電子デバイスの製造方法を提供することができる。
また、本発明の他の実施形態によれば、ピンホール欠陥の少ない樹脂パターンが得られる感光性転写材料を提供することができる。 According to one embodiment of the present invention, it is possible to provide a method for manufacturing a laminate having a resin pattern with few pinhole defects.
According to another embodiment of the present invention, it is possible to provide a circuit wiring manufacturing method and an electronic device manufacturing method using the laminate obtained by the laminate manufacturing method described above.
Further, according to another embodiment of the present invention, it is possible to provide a photosensitive transfer material that can obtain a resin pattern with few pinhole defects.
また、本明細書において「~」を用いて表される数値範囲は、「~」の前後に記載される数値を下限値及び上限値として含む範囲を意味する。
また、本明細書において、「(メタ)アクリル」はアクリル及びメタクリルの双方、又は、いずれかを表し、「(メタ)アクリレート」はアクリレート及びメタクリレートの双方、又は、いずれかを表し、「(メタ)アクリロイル」はアクリロイル及びメタクリロイルの双方、又は、いずれかを表す。
更に、本明細書において組成物中の各成分の量は、組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、組成物中に存在する該当する複数の物質の合計量を意味する。
本明細書において「工程」との語は、独立した工程だけでなく、他の工程と明確に区別できない場合であっても工程の所期の目的が達成されれば、本用語に含まれる。
本明細書における基(原子団)の表記において、置換及び無置換を記していない表記は、置換基を有さないものと共に置換基を有するものをも包含するものである。例えば「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含するものである。
本明細書において「露光」とは、特に断らない限り、光を用いた露光のみならず、電子線、イオンビーム等の粒子線を用いた描画も含む。また、露光に用いられる光としては、一般的に、水銀灯の輝線スペクトル、エキシマレーザに代表される遠紫外線、極紫外線(EUV光)、X線、電子線等の活性光線(活性エネルギー線)が挙げられる。
また、本明細書における化学構造式は、水素原子を省略した簡略構造式で記載する場合もある。
本開示において、「質量%」と「重量%」とは同義であり、「質量部」と「重量部」とは同義である。
また、本開示において、2以上の好ましい態様の組み合わせは、より好ましい態様である。
また、本開示における重量平均分子量(Mw)及び数平均分子量(Mn)は、特に断りのない限り、TSKgel GMHxL、TSKgel G4000HxL、TSKgel G2000HxL(何れも東ソー(株)製の商品名)のカラムを使用したゲルパーミエーションクロマトグラフィ(GPC)分析装置により、溶剤THF(テトラヒドロフラン)、示差屈折計により検出し、標準物質としてポリスチレンを用いて換算した分子量である。
本明細書において「全固形分」とは、組成物の全組成から溶剤を除いた成分の総質量をいう。また、「固形分」とは、上述のように、溶剤を除いた成分であり、例えば、25℃において固体であっても、液体であってもよい。 The contents of the present disclosure will be described below. Although the description will be made with reference to the attached drawings, reference numerals may be omitted.
Further, in this specification, a numerical range represented by "to" means a range including the numerical values before and after "to" as lower and upper limits.
Further, in the present specification, "(meth)acryl" represents both or either acrylic and methacrylic, "(meth)acrylate" represents both or either acrylate and methacrylate, and "(meth) ) acryloyl” refers to either or both acryloyl and methacryloyl.
Furthermore, the amount of each component in the composition herein refers to the sum of the corresponding substances present in the composition when there are multiple substances corresponding to each component in the composition, unless otherwise specified. means quantity.
As used herein, the term "process" includes not only independent processes but also processes that cannot be clearly distinguished from other processes as long as the intended purpose of the process is achieved.
In the description of a group (atomic group) in the present specification, a description that does not describe substitution or unsubstituted includes not only those without substituents but also those with substituents. For example, the term “alkyl group” includes not only alkyl groups without substituents (unsubstituted alkyl groups) but also alkyl groups with substituents (substituted alkyl groups).
In this specification, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified. The light used for exposure generally includes the emission line spectrum of a mercury lamp, far ultraviolet rays represented by excimer lasers, extreme ultraviolet rays (EUV light), X-rays, and active rays (active energy rays) such as electron beams. mentioned.
In addition, chemical structural formulas in this specification may be described as simplified structural formulas in which hydrogen atoms are omitted.
In the present disclosure, "% by mass" and "% by weight" are synonymous, and "parts by mass" and "parts by weight" are synonymous.
Moreover, in the present disclosure, a combination of two or more preferred aspects is a more preferred aspect.
In addition, unless otherwise specified, the weight average molecular weight (Mw) and number average molecular weight (Mn) in the present disclosure use columns of TSKgel GMHxL, TSKgel G4000HxL, and TSKgel G2000HxL (all trade names manufactured by Tosoh Corporation). It is a molecular weight converted using polystyrene as a standard substance, detected with a solvent THF (tetrahydrofuran) and a differential refractometer using a gel permeation chromatography (GPC) analyzer.
As used herein, "total solid content" refers to the total mass of components excluding the solvent from the total composition of the composition. Moreover, as described above, the “solid content” is the component excluding the solvent, and may be solid or liquid at 25° C., for example.
本開示に係る積層体の製造方法は、仮支持体と感光性層を含む転写層とを有する感光性転写材料の転写層側が基板と接するように、上記感光性転写材料と上記基板とを貼合する貼合工程、上記感光性層を露光する露光工程、及び、上記感光性層を現像して樹脂パターンを形成する現像工程を含み、上記露光工程における感光性層の限界解像度をXμmとして定義し、粒子及び空隙の基準直径をY=0.5×Xで表されるYμmとして定義した場合、上記露光工程における感光性層の表面及び内部におけるYμm以上の直径を有する粒子及び空隙の個数が、15個/cm2以下である。 (Laminate manufacturing method)
In the method for manufacturing a laminate according to the present disclosure, the photosensitive transfer material and the substrate are attached so that the transfer layer side of the photosensitive transfer material having the temporary support and the transfer layer including the photosensitive layer is in contact with the substrate. Including a lamination step of bonding, an exposure step of exposing the photosensitive layer, and a developing step of developing the photosensitive layer to form a resin pattern, wherein the limiting resolution of the photosensitive layer in the exposure step is defined as X μm When the reference diameter of particles and voids is defined as Y μm represented by Y=0.5×X, the number of particles and voids having a diameter of Y μm or more on the surface and inside of the photosensitive layer in the above exposure step is , 15/cm 2 or less.
例えば、特許文献1に開示された技術では、直径2μm以上の粒子の数を制限することで、仮支持体に含まれる異物に起因する解像度の低下を回避している。しかしながら、露光障害を引き起こす粒子及び空隙の大きさは、要求される解像度に応じて変動する。要求される解像度が小さくなるにつれて、従来の技術では許容されていた微小な粒子及び空隙も感光性層の露光を阻害する。そこで、本発明者は、感光性層の解像度に対する、感光性層の表面及び内部における粒子及び空隙の大きさ及び個数の関係に着目した。感光性層の解像度と露光障害を引き起こす粒子及び空隙の大きさとの関係に関する検証によって、本発明者は、感光性層の限界解像度(Xμm)に対して、Y(Y=0.5×X)μm以上の直径を有する粒子及び空隙が露光障害の発生率の増大を招くことを明らかにした。感光性層の限界解像度(Xμm)から導き出される粒子及び空隙の基準直径(Yμm)に従って、感光性層の表面及び内部におけるYμm以上の直径を有する粒子及び空隙の個数を15個/cm2以下に調節することで、露光障害の発生率を低減することができる。したがって、本開示に係る積層体の製造方法によれば、ピンホール欠陥の少ない樹脂パターンを有する積層体の製造方法が提供される。 The presumed reason why the above effects are exhibited will be described below.
For example, in the technique disclosed in Patent Document 1, by limiting the number of particles having a diameter of 2 μm or more, deterioration in resolution due to foreign matter contained in the temporary support is avoided. However, the size of particles and voids that cause exposure disturbances varies depending on the required resolution. As the required resolution becomes smaller, the small particles and voids allowed in the prior art also interfere with the exposure of the photosensitive layer. Therefore, the present inventor focused on the relationship between the resolution of the photosensitive layer and the size and number of particles and voids on the surface and inside of the photosensitive layer. By examining the relationship between the resolution of the photosensitive layer and the size of particles and voids that cause exposure failure, the present inventor found that Y (Y = 0.5 x X) for the limit resolution (X μm) of the photosensitive layer It has been found that particles and voids with a diameter of .mu.m or more lead to an increased incidence of exposure disturbances. According to the reference diameter (Y μm) of particles and voids derived from the limiting resolution (X μm) of the photosensitive layer, the number of particles and voids having a diameter of Y μm or more on the surface and inside of the photosensitive layer is 15/cm 2 or less. By adjusting, the incidence of exposure failure can be reduced. Therefore, according to the method for manufacturing a laminate according to the present disclosure, a method for manufacturing a laminate having a resin pattern with few pinhole defects is provided.
本開示に係る積層体の製造方法は、上記露光工程における感光性層の限界解像度をXμmとして定義し、粒子及び空隙の基準直径をY=0.5×Xで表されるYμmとして定義した場合、上記露光工程における感光性層の表面及び内部におけるYμm以上の直径を有する粒子及び空隙の個数が、15個/cm2以下であり、ピンホール欠陥抑制の観点から、10個/cm2以下であることが好ましく、7個/cm2以下であることがより好ましく、5個/cm2以下であることが特に好ましい。なお、下限値は、0個/cm2である。 <Number of particles and voids having a diameter of Y μm or more on the surface and inside of the photosensitive layer>
In the method for manufacturing a laminate according to the present disclosure, the limit resolution of the photosensitive layer in the exposure step is defined as X μm, and the reference diameter of the particles and voids is Y = 0.5 × X When defined as Y μm , The number of particles having a diameter of Y μm or more and voids on the surface and inside of the photosensitive layer in the exposure step is 15 particles/cm 2 or less, and from the viewpoint of suppressing pinhole defects, 10 particles/cm 2 or less. It is preferably 7/cm 2 or less, and particularly preferably 5/cm 2 or less. The lower limit is 0/cm 2 .
積層体を、超高圧水銀灯を用いて、ラインアンドスペースパターンマスク(Duty比は1:1であり、線幅は1μmから20μmまで1μmおきに段階的に変化している。)を介して感光性層を露光する。
必要に応じ、仮支持体を剥離した後、現像する。現像は、25℃の1.0質量%炭酸ナトリウム水溶液を用い、シャワー現像で30秒間行う。
感光性層を現像することで、樹脂パターンを形成する。
マスクのパターンに対応する最小の線幅を有する樹脂パターン(以下、本段落において「基準パターン」という。)が得られるまで、露光量(単位:mJ/cm2)を都度調節しながら上記した一連の手順を実施する。基準パターンの最小線幅を、感光性層の限界解像度Xμmとして採用する。 A method for measuring the critical resolution of the photosensitive layer in the present disclosure is shown below.
The laminate is photosensitized through a line-and-space pattern mask (the duty ratio is 1:1 and the line width is changed stepwise from 1 μm to 20 μm every 1 μm) using an ultra-high pressure mercury lamp. Expose the layer.
If necessary, the temporary support is peeled off and then developed. Development is performed by shower development for 30 seconds using a 1.0% by mass sodium carbonate aqueous solution at 25°C.
A resin pattern is formed by developing the photosensitive layer.
While adjusting the exposure amount (unit: mJ/cm 2 ) each time, the above-described series of perform the steps in The minimum line width of the reference pattern is taken as the limit resolution X μm of the photosensitive layer.
必要に応じて仮支持体を剥離した後の積層体における感光性層の表面における任意の10か所の領域(各領域の大きさ:10mm×10mm、合計面積:1,000mm2)を、光学顕微鏡を用いて目視にて観察する。各領域に含まれる直径がYμm以上の異物及び空隙の個数を測定する。10か所の領域で測定されたYμm以上の粒子及び空隙の個数の合計値に基づき、測定領域の1cm2あたりのYμm以上の粒子及び空隙の個数(個/cm2)を算出する。
なお、粒子と空隙とは、まとめて測定しても、別々に測定してもよい。 A method for measuring the number of particles having a diameter of Y μm or more and voids on the surface and inside of the photosensitive layer in the present disclosure is shown below.
If necessary, arbitrary 10 regions on the surface of the photosensitive layer in the laminate after peeling the temporary support (size of each region: 10 mm × 10 mm, total area: 1,000 mm 2 ), optical Observe visually with a microscope. The number of foreign particles and voids with a diameter of Y μm or more included in each area is measured. Based on the total number of particles with a size of Y μm or larger and voids measured in 10 areas, the number of particles with a size of Y μm or larger and voids per 1 cm 2 of the measurement area (particles/cm 2 ) is calculated.
Particles and voids may be measured together or separately.
また、本開示に係る積層体の製造方法は、上記貼合工程と上記露光工程との間に、上記仮支持体を剥離する剥離工程を含むことが好ましい。
更に、本開示に係る積層体の製造方法は、必要に応じ、上記貼合工程の前に、保護フィルムを剥離する保護フィルム剥離工程を含むことが好ましい。 In the method for manufacturing a laminate according to the present disclosure, the photosensitive transfer material and the substrate are attached so that the transfer layer side of the photosensitive transfer material having the temporary support and the transfer layer including the photosensitive layer is in contact with the substrate. It includes a bonding step of bonding, an exposure step of exposing the photosensitive layer, and a developing step of developing the photosensitive layer to form a resin pattern.
Moreover, it is preferable that the method for manufacturing a laminate according to the present disclosure includes a peeling step of peeling the temporary support between the bonding step and the exposure step.
Furthermore, it is preferable that the method for manufacturing a laminate according to the present disclosure includes a protective film peeling step of peeling off the protective film before the bonding step, if necessary.
本開示に係る積層体の製造方法は、上記感光性転写材料から上記保護フィルムを剥離する工程を含むことが好ましい。保護フィルムを剥離する方法は、制限されず、公知の方法を適用することができる。 <Protective film peeling process>
The method for manufacturing a laminate according to the present disclosure preferably includes a step of peeling the protective film from the photosensitive transfer material. A method for peeling off the protective film is not limited, and a known method can be applied.
本開示に係る積層体の製造方法は、貼合工程を含む。
貼合工程においては、感光性転写材料における上記転写層に基板(基板の表面に導電層が設けられている場合は導電層)を接触させ、感光性転写材料と基板とを圧着させることが好ましい。上記態様であると、感光性転写材料における上記転写層と基板との密着性が向上するため、露光及び現像後のパターン形成された感光性層は、導電層をエッチングする際のエッチングレジストとして好適に用いることができる。
なお、本開示に係る積層体の製造方法に用いられる感光性転写材料の好ましい態様は、まとめて後述する。 <Lamination process>
A method for manufacturing a laminate according to the present disclosure includes a bonding step.
In the lamination step, it is preferable to bring the transfer layer of the photosensitive transfer material into contact with the substrate (or the conductive layer if the substrate has a conductive layer on its surface), and press the photosensitive transfer material and the substrate together. . In the above aspect, the adhesion between the transfer layer and the substrate in the photosensitive transfer material is improved, so the patterned photosensitive layer after exposure and development is suitable as an etching resist when etching the conductive layer. can be used for
Preferred aspects of the photosensitive transfer material used in the method for producing a laminate according to the present disclosure will be collectively described later.
感光性転写材料の基板への貼り合わせは、感光性転写材料における上記仮支持体に対して感光性層を有する側の最外層と基板と重ね、ロール等の手段を用いて加圧及び加熱を施すことにより、行われることが好ましい。貼り合わせには、ラミネーター、真空ラミネーター、及び、より生産性を高めることができるオートカットラミネーター等の公知のラミネーターが使用できる。
ラミネート温度としては、特に制限されないが、例えば、70℃~130℃であることが好ましい。 The method for pressure-bonding the substrate and the photosensitive transfer material is not particularly limited, and known transfer methods and lamination methods can be used.
The photosensitive transfer material is laminated to the substrate by stacking the outermost layer of the photosensitive transfer material on the side having the photosensitive layer with respect to the temporary support and the substrate, and applying pressure and heat using means such as rolls. It is preferably done by applying. A known laminator such as a laminator, a vacuum laminator, and an autocut laminator that can further improve productivity can be used for the lamination.
Although the lamination temperature is not particularly limited, it is preferably 70° C. to 130° C., for example.
以下、ロールツーロール方式について説明する。
ロールツーロール方式とは、基板として、巻き取り及び巻き出しが可能な基板を用い、本開示に係る積層体の製造方法に含まれるいずれかの工程の前に、基板又は基板を含む構造体を巻き出す工程(「巻き出し工程」ともいう。)と、いずれかの工程の後に、基板又は基板を含む構造体を巻き取る工程(「巻き取り工程」ともいう。)と、を含み、少なくともいずれかの工程(好ましくは、全ての工程、又は加熱工程以外の全ての工程)を、基板又は基板を含む構造体を搬送しながら行う方式をいう。
巻き出し工程における巻き出し方法、及び巻き取り工程における巻取り方法としては、特に制限されず、ロールツーロール方式を適用する製造方法において、公知の方法を用いればよい。 The method for manufacturing a laminate according to the present disclosure is preferably performed by a roll-to-roll method.
The roll-to-roll method will be described below.
The roll-to-roll method uses a substrate that can be wound and unwound as a substrate, and before any of the steps included in the method for manufacturing a laminate according to the present disclosure, a substrate or a structure including a substrate At least any It refers to a method in which the above steps (preferably all steps or all steps other than the heating step) are performed while the substrate or a structure including the substrate is being transported.
The unwinding method in the unwinding step and the winding method in the winding step are not particularly limited, and known methods may be used in manufacturing methods to which a roll-to-roll system is applied.
本開示に係る積層体の製造方法に用いられる基板としては、公知の基板を用いればよいが、導電層を有する基板が好ましく、基板の表面に導電層を有することがより好ましい。
基板は、必要に応じて導電層以外の任意の層を有してもよい。
基板としては、例えば、樹脂基板、ガラス基板、及び、半導体基板が挙げられる。
基板の好ましい態様としては、例えば、国際公開第2018/155193号の段落0140に記載されたものが挙げられ、この内容は本明細書に組み込まれる。 <Substrate>
As the substrate used in the method for producing a laminate according to the present disclosure, a known substrate may be used, but a substrate having a conductive layer is preferable, and it is more preferable to have a conductive layer on the surface of the substrate.
The substrate may have any layer other than the conductive layer, if desired.
Examples of substrates include resin substrates, glass substrates, and semiconductor substrates.
Preferred embodiments of the substrate include, for example, those described in paragraph 0140 of WO2018/155193, the contents of which are incorporated herein.
基板を構成する基材は、透明であることが好ましい。本明細書において「透明である」とは、波長400nm~700nmの光の透過率が80%以上であることを意味する。
また、基板を構成する基板の屈折率は、1.50~1.52であることが好ましい。 Base materials that constitute the substrate include, for example, glass, silicon, and films.
The base material constituting the substrate is preferably transparent. As used herein, "transparent" means that the transmittance of light with a wavelength of 400 nm to 700 nm is 80% or more.
Further, the refractive index of the substrate constituting the substrate is preferably 1.50 to 1.52.
導電層としては、導電性及び細線形成性の観点から、金属層、導電性金属酸化物層、グラフェン層、カーボンナノチューブ層及び導電ポリマー層よりなる群から選ばれた少なくとも1種の層が好ましく、金属層がより好ましく、銅層又は銀層が更に好ましい。
基板は、導電層を1層単独で有してよく、2層以上有してもよい。2層以上の導電層を有する場合は、異なる材質の導電層を有することが好ましい。 Examples of the conductive layer that the substrate has include conductive layers that are used for general circuit wiring or touch panel wiring.
The conductive layer is preferably at least one layer selected from the group consisting of a metal layer, a conductive metal oxide layer, a graphene layer, a carbon nanotube layer and a conductive polymer layer, from the viewpoint of conductivity and fine line formation. A metal layer is more preferred, and a copper or silver layer is even more preferred.
The substrate may have a single conductive layer, or may have two or more layers. When it has two or more conductive layers, it is preferable to have the conductive layers made of different materials.
金属としては、Al、Zn、Cu、Fe、Ni、Cr、Mo、Ag及びAuが挙げられる。
導電性金属酸化物としては、ITO(Indium Tin Oxide)、IZO(Indium Zinc Oxide)及びSiO2が挙げられる。
なお、本明細書において「導電性」とは、体積抵抗率が1×106Ωcm未満であることをいう。導電性金属酸化物の体積抵抗率は、1×104Ωcm未満が好ましい。 Materials for the conductive layer include metals and conductive metal oxides.
Metals include Al, Zn, Cu, Fe, Ni, Cr, Mo, Ag and Au.
Conductive metal oxides include ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide) and SiO2 .
In this specification, the term “conductivity” means that the volume resistivity is less than 1×10 6 Ωcm. The volume resistivity of the conductive metal oxide is preferably less than 1×10 4 Ωcm.
導電層としては、静電容量型タッチパネルに用いられる視認部のセンサーに相当する電極パターン又は周辺取り出し部の配線が好ましい。
導電層の好ましい態様としては、例えば、国際公開第2018/155193号の段落0141に記載が挙げられ、この内容は本明細書に組み込まれる。 When manufacturing a resin pattern using a substrate having a plurality of conductive layers, at least one of the plurality of conductive layers preferably contains a conductive metal oxide.
The conductive layer is preferably an electrode pattern corresponding to a sensor in the visual recognition portion used in a capacitive touch panel or wiring in the peripheral extracting portion.
Preferred embodiments of the conductive layer are described, for example, in paragraph 0141 of WO2018/155193, the contents of which are incorporated herein.
透明電極は、タッチパネル用電極として好適に機能し得る。透明電極は、ITO(酸化インジウムスズ)、及び、IZO(酸化インジウム亜鉛)等の金属酸化膜、並びに、金属メッシュ、及び、銀ナノワイヤー等の金属細線により構成されることが好ましい。
金属細線としては、銀、銅等の細線が挙げられる。なかでも、銀メッシュ、銀ナノワイヤー等の銀導電性材料が好ましい。 As the substrate having a conductive layer, a substrate having at least one of a transparent electrode and lead wiring is preferable. The substrate as described above can be suitably used as a touch panel substrate.
A transparent electrode can function suitably as an electrode for touch panels. The transparent electrode is preferably composed of a metal oxide film such as ITO (indium tin oxide) and IZO (indium zinc oxide), a metal mesh, and metal wires such as silver nanowires.
Fine metal wires include fine wires of silver, copper, and the like. Among them, silver conductive materials such as silver mesh and silver nanowire are preferable.
引き回し配線の材質である金属としては、金、銀、銅、モリブデン、アルミニウム、チタン、クロム、亜鉛、及び、マンガン、並びに、これらの金属元素の2種以上からなる合金が挙げられる。引き回し配線の材質としては、銅、モリブデン、アルミニウム、又は、チタンが好ましく、銅が特に好ましい。 A metal is preferable as the material of the routing wiring.
Examples of metals for the routing wiring include gold, silver, copper, molybdenum, aluminum, titanium, chromium, zinc, manganese, and alloys composed of two or more of these metal elements. Copper, molybdenum, aluminum, or titanium is preferable as the material of the routing wiring, and copper is particularly preferable.
本開示に係る積層体の製造方法は、貼合工程と露光工程との間に、仮支持体を剥離する仮支持体剥離工程を含むことが好ましい。
仮支持体の剥離方法は特に制限されず、特開2010-072589号公報の段落0161~0162に記載されたカバーフィルム剥離機構と同様の機構を使用できる。 <Temporary support peeling step>
The method for producing a laminate according to the present disclosure preferably includes a temporary support peeling step for peeling the temporary support between the bonding step and the exposure step.
The peeling method of the temporary support is not particularly limited, and a mechanism similar to the cover film peeling mechanism described in paragraphs 0161 to 0162 of JP-A-2010-072589 can be used.
本開示に係る積層体の製造方法は、露光工程を含む。
露光工程における露光処理は、パターン状の露光処理(「パターン露光」ともいう。)、すなわち、露光部と非露光部とが存在する形態の露光処理である。
パターン露光における露光領域と未露光領域との位置関係は特に制限されず、適宜調整される。 <Exposure process>
A method for manufacturing a laminate according to the present disclosure includes an exposure step.
The exposure process in the exposure process is a patterned exposure process (also referred to as “pattern exposure”), that is, an exposure process in which an exposed portion and a non-exposed portion exist.
The positional relationship between the exposed area and the unexposed area in pattern exposure is not particularly limited and is adjusted as appropriate.
また、得られる樹脂パターンは、本開示における効果をより発揮する観点から、線幅が20μm以下である樹脂パターンを有することが好ましく、線幅が10μm以下である樹脂パターンを有することがより好ましく、線幅が8μm以下である樹脂パターンを有することが更に好ましく、線幅が5μm以下である樹脂パターンを有することが特に好ましい。 The detailed arrangement and specific size of the pattern in pattern exposure are not particularly limited. For example, at least part of the pattern (preferably The electrode pattern and/or lead-out wiring portion of the touch panel) preferably includes fine lines with a width of 20 μm or less, and more preferably includes fine lines with a width of 10 μm or less.
In addition, from the viewpoint of further exerting the effects of the present disclosure, the obtained resin pattern preferably has a resin pattern with a line width of 20 μm or less, and more preferably has a resin pattern with a line width of 10 μm or less. It is more preferable to have a resin pattern with a line width of 8 μm or less, and it is particularly preferable to have a resin pattern with a line width of 5 μm or less.
露光量としては、5mJ/cm2~200mJ/cm2が好ましく、10mJ/cm2~100mJ/cm2がより好ましい。
露光に使用する光源、露光量及び露光方法の好ましい態様としては、例えば、国際公開第2018/155193号の段落0146~0147に記載が挙げられ、これらの内容は本明細書に組み込まれる。 The light source used for exposure can be appropriately selected and used as long as it is a light source that emits light having a wavelength (for example, 365 nm or 405 nm) capable of exposing the photosensitive layer. Specifically, ultra-high pressure mercury lamps, high pressure mercury lamps, metal halide lamps and LEDs (Light Emitting Diodes) are included.
The exposure dose is preferably 5 mJ/cm 2 to 200 mJ/cm 2 , more preferably 10 mJ/cm 2 to 100 mJ/cm 2 .
Preferred embodiments of the light source, exposure amount and exposure method used for exposure include, for example, paragraphs 0146 to 0147 of WO 2018/155193, the contents of which are incorporated herein.
また、露光工程において、解像性の観点から、上記転写層とマスクとを接触させ露光処理を行うことが好ましい。 In the exposure step, pattern exposure may be performed after peeling the temporary support from the transfer layer, and before peeling the temporary support, pattern exposure is performed through the temporary support, and then the temporary support is peeled off. good too. When the temporary support is peeled off before exposure, the mask may be exposed in contact with the transfer layer, or may be exposed in proximity without contact. When exposure is performed without peeling off the temporary support, the mask may be exposed in contact with the temporary support, or may be exposed in close proximity without contact. In order to prevent contamination of the mask due to contact between the transfer layer and the mask and to avoid the influence of foreign matter adhering to the mask on the exposure, it is preferable to carry out pattern exposure without peeling off the temporary support. The exposure method may be a contact exposure method in the case of contact exposure, a proximity exposure method in the case of a non-contact exposure method, a projection exposure method using a lens system or a mirror system, or a direct exposure method using an exposure laser or the like. It can be selected and used. In the case of projection exposure using a lens system or a mirror system, an exposure machine having an appropriate lens numerical aperture (NA) can be used according to the required resolving power and depth of focus. In the case of the direct exposure method, drawing may be performed directly on the photosensitive layer, or reduction projection exposure may be performed on the photosensitive layer via a lens. Further, the exposure may be performed not only in the air but also in a reduced pressure or a vacuum, or the exposure may be performed by interposing a liquid such as water between the light source and the transfer layer.
Moreover, in the exposure step, from the viewpoint of resolution, the transfer layer and the mask are preferably brought into contact with each other to carry out the exposure process.
本開示に係る積層体の製造方法は、現像工程を含む。
現像工程における露光された感光性層の現像は、現像液を用いて行うことができる。
現像液としては、感光性層の非画像部を除去することができれば特に制限されず、例えば、特開平5-72724号公報に記載の現像液等の公知の現像液が使用できる。
現像液としては、pKa=7~13の化合物を0.05mol/L~5mol/L(リットル)の濃度で含むアルカリ水溶液系の現像液が好ましい。現像液は、水溶性の有機溶剤及び/又は界面活性剤を含有してもよい。
アルカリ性水溶液に含まれ得るアルカリ性化合物としては、例えば、水酸化ナトリウム、水酸化カリウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム、テトラメチルアンモニウムヒドロキシド、テトラエチルアンモニウムヒドロキシド、テトラプロピルアンモニウムヒドロキシド、テトラブチルアンモニウムヒドロキシド、及び、コリン(2-ヒドロキシエチルトリメチルアンモニウムヒドロキシド)が挙げられる。
現像液としては、国際公開第2015/093271号の段落0194に記載の現像液も好ましく挙げられる。好適に用いられる現像方式としては、例えば、国際公開第2015/093271号の段落0195に記載の現像方式が挙げられる。 <Development process>
A method for manufacturing a laminate according to the present disclosure includes a developing step.
Development of the exposed photosensitive layer in the development step can be performed using a developer.
The developer is not particularly limited as long as it can remove the non-image area of the photosensitive layer. For example, known developers such as the developer described in JP-A-5-72724 can be used.
The developer is preferably an alkaline aqueous solution containing a compound having a pKa of 7 to 13 at a concentration of 0.05 mol/L to 5 mol/L (liter). The developer may contain a water-soluble organic solvent and/or a surfactant.
Alkaline compounds that can be contained in the alkaline aqueous solution include, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogen carbonate, potassium hydrogen carbonate, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, and choline (2-hydroxyethyltrimethylammonium hydroxide).
As the developer, the developer described in paragraph 0194 of International Publication No. 2015/093271 is also preferably used. A development method that is preferably used includes, for example, the development method described in paragraph 0195 of International Publication No. 2015/093271.
現像工程の後に、洗浄剤をシャワーにより吹き付け、ブラシで擦りながら、現像残渣を除去することが好ましい。
現像液の液温は特に制限されないが、20℃~40℃が好ましい。 The development method is not particularly limited, and may be any of puddle development, shower development, shower and spin development, and dip development. Shower development is a development process in which non-image areas are removed by spraying a developing solution onto the photosensitive layer after exposure.
After the development step, it is preferable to remove the development residue by spraying a cleaning agent with a shower and rubbing with a brush.
Although the liquid temperature of the developer is not particularly limited, it is preferably 20°C to 40°C.
本開示に係る積層体の製造方法は、露光工程の前、好ましくは仮支持体剥離工程の後、かつ露光工程の前に、転写層又は仮支持体の表面に付着した粒子を除去する表面付着粒子除去工程を含むことが好ましい。
表面付着粒子除去工程における粒子除去方法としては、粘着ロール又はクリーニングロールを転写層又は仮支持体の表面に接触させて除去する方法が好適に挙げられる。
粘着ロール又はクリーニングロールの材質、大きさ、及び、接触圧力等は、所望に応じて、適宜選択することができる。 <Step of removing particles adhering to surface>
In the method for producing a laminate according to the present disclosure, a surface attachment method for removing particles attached to the surface of the transfer layer or the temporary support is performed before the exposure step, preferably after the temporary support peeling step, and before the exposure step. Preferably, a particle removal step is included.
As a method for removing particles in the step of removing particles adhering to the surface, a method of contacting an adhesive roll or a cleaning roll with the surface of the transfer layer or the temporary support to remove the particles is suitably exemplified.
The material, size, contact pressure, etc. of the adhesive roll or cleaning roll can be appropriately selected as desired.
本開示に係る積層体の製造方法は、上述した工程以外の任意の工程(その他の工程)を含んでもよい。例えば、以下の工程が挙げられるが、これらの工程に制限されない。
また、本開示に係る積層体の製造方法に適用可能な露光工程、現像工程、及びその他の工程としては、特開2006-23696号公報の段落0035~0051に記載の工程が挙げられる。 <Other processes>
The method for manufacturing a laminate according to the present disclosure may include arbitrary steps (other steps) other than the steps described above. Examples include, but are not limited to, the following steps.
Further, the exposure step, development step, and other steps applicable to the method for manufacturing a laminate according to the present disclosure include the steps described in paragraphs 0035 to 0051 of JP-A-2006-23696.
本開示に係る積層体の製造方法により製造される積層体は、種々の装置に適用することができる。上記積層体を備えた装置としては、例えば、入力装置等が挙げられ、タッチパネルであることが好ましく、静電容量型タッチパネルであることがより好ましい。また、上記入力装置は、有機エレクトロルミネッセンス表示装置、液晶表示装置等の表示装置に適用することができる。
積層体がタッチパネルに適用される場合、形成された樹脂パターンは、タッチパネル用電極又はタッチパネル用配線の保護膜として用いられることが好ましい。 <Application>
A laminate manufactured by the method for manufacturing a laminate according to the present disclosure can be applied to various devices. Examples of the device including the laminate include an input device and the like, preferably a touch panel, and more preferably a capacitive touch panel. Moreover, the input device can be applied to display devices such as an organic electroluminescence display device and a liquid crystal display device.
When the laminate is applied to a touch panel, the formed resin pattern is preferably used as a protective film for touch panel electrodes or touch panel wiring.
本開示に係る積層体の製造方法に用いられる感光性転写材料は、仮支持体と、感光性層を含む転写層とを有し、仮支持体と、感光性層を含む転写層と、保護フィルムとをこの順に有することが好ましい。
また、本開示に用いられる感光性転写材料は、仮支持体と感光性層との間、感光性層と保護フィルムとの間等に他の層を有していてもよい。
更に、本開示に用いられる感光性転写材料は、仮支持体と感光性層との間に、熱可塑性樹脂層、及び、水溶性樹脂層を更に有することが好ましい。
更に、上記転写層は、熱可塑性樹脂層、及び、水溶性樹脂層を更に含むことが好ましい。
本開示に用いられる感光性転写材料は、本開示における効果をより発揮する観点から、ロール状の感光性転写材料であることが好ましい。 <Photosensitive transfer material>
The photosensitive transfer material used in the method for producing a laminate according to the present disclosure has a temporary support and a transfer layer containing a photosensitive layer, the temporary support, a transfer layer containing a photosensitive layer, and a protective It is preferred to have a film in this order.
In addition, the photosensitive transfer material used in the present disclosure may have other layers between the temporary support and the photosensitive layer, between the photosensitive layer and the protective film, and the like.
Furthermore, the photosensitive transfer material used in the present disclosure preferably further has a thermoplastic resin layer and a water-soluble resin layer between the temporary support and the photosensitive layer.
Furthermore, the transfer layer preferably further includes a thermoplastic resin layer and a water-soluble resin layer.
The photosensitive transfer material used in the present disclosure is preferably a roll-shaped photosensitive transfer material from the viewpoint of exhibiting the effects of the present disclosure more effectively.
(1)「仮支持体/感光性層/屈折率調整層/保護フィルム」
(2)「仮支持体/感光性層/保護フィルム」
(3)「仮支持体/水溶性樹脂層/感光性層/保護フィルム」
(4)「仮支持体/熱可塑性樹脂層/水溶性樹脂層/感光性層/保護フィルム」
なお、上記各構成において、感光性層は、ネガ型感光性層であることが好ましい。また、感光性層が着色樹脂層であることも好ましい。本開示に用いられる感光性転写材料は、エッチングレジスト用感光性転写材料として使用されることが好ましい。
エッチングレジスト用感光性転写材料とする場合、感光性転写材料の構成としては、例えば、上述した(2)~(4)の構成であることが好ましい。 Examples of embodiments of the photosensitive transfer material used in the present disclosure are shown below, but are not limited thereto.
(1) "Temporary support/photosensitive layer/refractive index adjusting layer/protective film"
(2) "Temporary support/photosensitive layer/protective film"
(3) "Temporary support/water-soluble resin layer/photosensitive layer/protective film"
(4) "Temporary support/thermoplastic resin layer/water-soluble resin layer/photosensitive layer/protective film"
In addition, in each of the above structures, the photosensitive layer is preferably a negative photosensitive layer. It is also preferred that the photosensitive layer is a colored resin layer. The photosensitive transfer material used in the present disclosure is preferably used as a photosensitive transfer material for etching resist.
When it is used as a photosensitive transfer material for etching resist, the configuration of the photosensitive transfer material preferably has, for example, the configurations (2) to (4) described above.
図1に示す感光性転写材料20は、仮支持体11と、熱可塑性樹脂層13、水溶性樹脂層15、及び、感光性層17を含む転写層12と、保護フィルム19とを、この順に有する。
また、図1で示す感光性転写材料20は熱可塑性樹脂層13及び水溶性樹脂層15を配置した形態であるが、熱可塑性樹脂層13及び水溶性樹脂層15は、配置されなくてもよい。
以下において、感光性転写材料を構成する各要素について説明する。 An example of the photosensitive transfer material will be described below.
The
Further, the
Each element constituting the photosensitive transfer material will be described below.
本開示に用いられる感光性転写材料は、仮支持体を有する。
仮支持体は、感光性層又は感光性層を含む積層体を支持し、且つ、剥離可能な支持体である。 [Temporary support]
The photosensitive transfer material used in the present disclosure has a temporary support.
A temporary support is a support that supports a photosensitive layer or a laminate containing a photosensitive layer and that can be peeled off.
仮支持体は、感光性層の露光感度向上の観点から、パターン露光に使用する波長(より好ましくは波長365nm)の光の透過率が60%以上であることが好ましく、70%以上であることがより好ましい。
なお、感光性転写材料が備える層の透過率とは、層の主面に垂直な方向(厚さ方向)に光を入射させたときの、入射光の強度に対する層を通過して出射した出射光の強度の比率であり、大塚電子(株)製MCPD Seriesを用いて測定される。 The temporary support preferably has light transmittance from the viewpoint that the photosensitive layer can be exposed through the temporary support when patternwise exposing the photosensitive layer. In this specification, "having light transmittance" means having a transmittance of 50% or more for light having a wavelength used for pattern exposure.
From the viewpoint of improving the exposure sensitivity of the photosensitive layer, the temporary support preferably has a light transmittance of 60% or more, more preferably 70% or more, at a wavelength used for pattern exposure (more preferably a wavelength of 365 nm). is more preferred.
The transmittance of a layer included in a photosensitive transfer material is the light emitted through the layer relative to the intensity of the incident light when the light is incident in the direction perpendicular to the main surface of the layer (thickness direction). It is a ratio of intensity of incident light, and is measured using MCPD Series manufactured by Otsuka Electronics Co., Ltd.
樹脂フィルムとしては、ポリエチレンテレフタレート(PET:polyethylene terephthalate)フィルム、トリ酢酸セルロースフィルム、ポリスチレンフィルム及びポリカーボネートフィルムが挙げられる。中でも、PETフィルムが好ましく、2軸延伸PETフィルムがより好ましい。 Materials constituting the temporary support include, for example, glass substrates, resin films, and paper, with resin films being preferred from the viewpoints of strength, flexibility, and light transmittance.
Resin films include polyethylene terephthalate (PET) films, cellulose triacetate films, polystyrene films and polycarbonate films. Among them, a PET film is preferable, and a biaxially stretched PET film is more preferable.
仮支持体の厚さは、5μm~100μmの範囲が好ましく、取扱い易さ及び汎用性の点から、10μm~50μmの範囲がより好ましく、10μm~20μmの範囲が更に好ましく、10μm~16μmの範囲が特に好ましい。
また、仮支持体の厚さは、樹脂パターンの欠陥抑制性、解像性及び直線性の観点から、50μm以下であることが好ましく、25μm以下であることがより好ましく、20μm以下であることが更に好ましく、16μm以下であることが特に好ましい。 The thickness (layer thickness) of the temporary support is not particularly limited, and the strength as a support, the flexibility required for bonding with the substrate for forming circuit wiring, and the light required in the first exposure step From the viewpoint of permeability, the material may be selected according to the material.
The thickness of the temporary support is preferably in the range of 5 μm to 100 μm, more preferably in the range of 10 μm to 50 μm, still more preferably in the range of 10 μm to 20 μm, even more preferably in the range of 10 μm to 16 μm, from the viewpoint of ease of handling and versatility. Especially preferred.
In addition, the thickness of the temporary support is preferably 50 μm or less, more preferably 25 μm or less, and more preferably 20 μm or less from the viewpoint of defect suppression, resolution and linearity of the resin pattern. More preferably, it is particularly preferably 16 μm or less.
仮支持体を介するパターン露光時のパターン形成性、及び、仮支持体の透明性の観点から、仮支持体に含まれる微粒子、異物、欠陥、析出物などの数は少ない方が好ましい。直径1μm以上の微粒子や異物や欠陥の数は、50個/10mm2以下であることが好ましく、10個/10mm2以下であることがより好ましく、3個/10mm2以下であることが更に好ましく、0個/10mm2であることが特に好ましい。 Moreover, it is preferable that the film used as the temporary support does not have deformation such as wrinkles, flaws, or defects.
From the viewpoint of pattern formability during pattern exposure through the temporary support and transparency of the temporary support, the number of fine particles, foreign matter, defects, precipitates, etc. contained in the temporary support is preferably as small as possible. The number of fine particles, foreign substances, and defects with a diameter of 1 μm or more is preferably 50/10 mm 2 or less, more preferably 10/10 mm 2 or less, and even more preferably 3/10 mm 2 or less. , 0/10 mm 2 .
本開示におけるヘイズ値は、ヘイズメーター(NDH-2000、日本電色工業(株)製)を用いて、JIS K 7105:1981年に準ずる方法により測定する。 The haze of the temporary support is preferably as small as possible from the viewpoints of the defect-suppressing property of the resin pattern, the resolution, and the transparency of the temporary support. Specifically, the haze value of the temporary support is preferably 2% or less, more preferably 1.5% or less, still more preferably less than 1.0%, and particularly preferably 0.5% or less.
The haze value in the present disclosure is measured by a method according to JIS K 7105:1981 using a haze meter (NDH-2000, manufactured by Nippon Denshoku Industries Co., Ltd.).
仮支持体における上記感光性層側とは反対側の面の算術平均粗さRaは、搬送性、樹脂パターンの欠陥抑制性、及び、解像性の観点から、100nm以下であることが好ましく、50nm以下であることがより好ましく、20nm以下であることが更に好ましく、10nm以下であることが特に好ましい。
仮支持体における上記感光性層側の面の算術平均粗さRaは、仮支持体の剥離性、樹脂パターンの欠陥抑制性、及び、解像性の観点から、100nm以下であることが好ましく、50nm以下であることがより好ましく、20nm以下であることが更に好ましく、10nm以下であることが特に好ましい。
また、仮支持体における上記感光性層側とは反対側の面の算術平均粗さRa-仮支持体における上記感光性層側の面の算術平均粗さRaの値は、搬送性、樹脂パターンの欠陥抑制性、及び、解像性の観点から、0nm~10nmであることが好ましく、0nm~5nmであることがより好ましい。 The arithmetic mean roughness Ra of the surface of the temporary support opposite to the photosensitive layer side is the photosensitive layer of the temporary support from the viewpoint of transportability, defect suppression of the resin pattern, and resolution. It is preferably equal to or greater than the arithmetic mean roughness Ra of the side surface.
The arithmetic mean roughness Ra of the surface of the temporary support opposite to the photosensitive layer side is preferably 100 nm or less from the viewpoints of transportability, resin pattern defect suppression, and resolution. It is more preferably 50 nm or less, still more preferably 20 nm or less, and particularly preferably 10 nm or less.
The arithmetic mean roughness Ra of the surface of the temporary support on the photosensitive layer side is preferably 100 nm or less from the viewpoints of peelability of the temporary support, defect suppression of the resin pattern, and resolution. It is more preferably 50 nm or less, still more preferably 20 nm or less, and particularly preferably 10 nm or less.
Further, the value of the arithmetic mean roughness Ra of the surface opposite to the photosensitive layer side in the temporary support - the arithmetic mean roughness Ra of the surface of the temporary support on the side of the photosensitive layer is transportability, resin pattern From the viewpoint of defect suppression and resolution, the thickness is preferably 0 nm to 10 nm, more preferably 0 nm to 5 nm.
3次元光学プロファイラー(New View7300、Zygo社製)を用いて、以下の条件にて仮支持体又は保護フィルムの表面を測定し、フィルムの表面プロファイルを得る。
測定・解析ソフトとしては、MetroPro ver8.3.2のMicroscope Applicationを用いる。次に、上記解析ソフトにてSurface Map画面を表示し、Surface Map画面中でヒストグラムデータを得る。得られたヒストグラムデータから、算術平均粗さを算出し、仮支持体又は保護フィルムの表面のRa値を得る。
仮支持体又は保護フィルムが感光性層等に貼り合わされている場合は、感光性層から仮支持体又は保護フィルムを剥離して、剥離した側の表面のRa値を測定すればよい。 The arithmetic mean roughness Ra of the surface of the temporary support or protective film in the present disclosure shall be measured by the following method.
Using a three-dimensional optical profiler (New View 7300, manufactured by Zygo), the surface of the temporary support or protective film is measured under the following conditions to obtain the surface profile of the film.
Microscope Application of MetroPro ver 8.3.2 is used as measurement/analysis software. Next, the Surface Map screen is displayed by the above analysis software, and histogram data is obtained on the Surface Map screen. From the obtained histogram data, the arithmetic average roughness is calculated to obtain the Ra value of the surface of the temporary support or protective film.
When the temporary support or protective film is attached to the photosensitive layer or the like, the temporary support or protective film may be peeled off from the photosensitive layer and the Ra value of the peeled surface may be measured.
厚さ100μmのポリエチレンテレフタレート(PET)フィルム上に、スパッタ法にて厚さ200nmの銅層を作製し、銅層付きPET基板を作製する。
作製した感光性転写材料から保護フィルムを剥離し、ラミネートロール温度100℃、線圧0.6MPa、線速度(ラミネート速度)1.0m/minのラミネート条件で上記銅層付きPET基板にラミネートする。次に、仮支持体の表面にテープ(日東電工(株)製PRINTACK)を貼りつけた後に、銅層付きPET基板上に少なくとも仮支持体及び感光性層を有する積層体を、70mm×10mmにカットしてサンプルを作製する。上記サンプルのPET基板側を試料台の上に固定する。
引張圧縮試験機((株)今田製作所製、SV-55)を用いて、180度の方向に、5.5mm/秒でテープを引っ張って、感光性層又は熱可塑性樹脂層と仮支持体との間で剥離して、剥離に必要な力(剥離力)密着力を測定する。 The peel strength of the temporary support in the present disclosure shall be measured as follows.
A copper layer with a thickness of 200 nm is formed on a polyethylene terephthalate (PET) film with a thickness of 100 μm by a sputtering method to prepare a PET substrate with a copper layer.
The protective film is peeled off from the prepared photosensitive transfer material, and the material is laminated on the PET substrate with the copper layer under the lamination conditions of laminating roll temperature of 100° C., linear pressure of 0.6 MPa, and linear speed (laminating speed) of 1.0 m/min. Next, after pasting a tape (PRINTACK manufactured by Nitto Denko Corporation) on the surface of the temporary support, a laminate having at least a temporary support and a photosensitive layer on a PET substrate with a copper layer is formed into a size of 70 mm × 10 mm. Make a sample by cutting. The PET substrate side of the sample is fixed on the sample table.
Using a tensile compression tester (SV-55, manufactured by Imada Seisakusho Co., Ltd.), the tape is pulled at 5.5 mm / sec in the direction of 180 degrees, and the photosensitive layer or thermoplastic resin layer and the temporary support. and measure the force required for peeling (peeling force) adhesion.
本開示に用いられる感光性転写材料は、感光性層を有する。
感光性層は、ネガ型感光性層であることが好ましい。
感光性層は、アルカリ可溶性樹脂、重合性化合物及び光重合開始剤を含むことが好ましく、上記感光性層の全質量基準で、アルカリ可溶性樹脂:10質量%~90質量%;エチレン性不飽和化合物:5質量%~70質量%;及び光重合開始剤:0.01質量%~20質量%を含むことがより好ましい。
以下、各成分を順に説明する。 [Photosensitive layer]
The photosensitive transfer material used in this disclosure has a photosensitive layer.
The photosensitive layer is preferably a negative photosensitive layer.
The photosensitive layer preferably contains an alkali-soluble resin, a polymerizable compound and a photopolymerization initiator, based on the total weight of the photosensitive layer, alkali-soluble resin: 10% to 90% by weight; ethylenically unsaturated compound : 5% by mass to 70% by mass; and photopolymerization initiator: 0.01% by mass to 20% by mass.
Each component will be described in order below.
感光性層は、重合性化合物を含むことが好ましい。なお、本明細書において「重合性化合物」とは、後述する光重合開始剤の作用を受けて重合する化合物であって、上述したアルカリ可溶性樹脂とは異なる化合物を意味する。 <<polymerizable compound>>
The photosensitive layer preferably contains a polymerizable compound. As used herein, the term "polymerizable compound" means a compound that polymerizes under the action of a photopolymerization initiator, which will be described later, and that is different from the alkali-soluble resin described above.
重合性基としては、エチレン性不飽和基を有する基が好ましく、アクリロイル基又はメタクリロイル基がより好ましい。
また、重合性化合物としては、エチレン性不飽和化合物を含むことが好ましく、(メタ)アクリレート化合物を含むことがより好ましい。 The polymerizable group possessed by the polymerizable compound is not particularly limited as long as it is a group involved in the polymerization reaction. For example, it has an ethylenically unsaturated group such as a vinyl group, an acryloyl group, a methacryloyl group, a styryl group and a maleimide group. groups; and groups having cationic polymerizable groups such as epoxy groups and oxetane groups.
As the polymerizable group, a group having an ethylenically unsaturated group is preferable, and an acryloyl group or a methacryloyl group is more preferable.
Moreover, as a polymerizable compound, it is preferable that an ethylenically unsaturated compound is included, and it is more preferable that a (meth)acrylate compound is included.
ここで、2官能以上の重合性化合物とは、一分子中に重合性基を2つ以上有する化合物を意味する。
また、解像性及び剥離性に優れる点で、重合性化合物が一分子中に有する重合性基の数は、6つ以下が好ましい。 From the viewpoint of resolution and pattern formability, the photosensitive layer preferably contains a bifunctional or higher polymerizable compound (polyfunctional polymerizable compound), and more preferably contains a trifunctional or higher polymerizable compound. preferable.
Here, the bifunctional or higher polymerizable compound means a compound having two or more polymerizable groups in one molecule.
Moreover, the number of polymerizable groups in one molecule of the polymerizable compound is preferably 6 or less from the viewpoint of excellent resolution and releasability.
感光性層における、エチレン性不飽和化合物の総含有量に対する2官能又は3官能エチレン性不飽和化合物の含有量は、剥離性に優れる点から、60質量%以上が好ましく、70質量%超がより好ましく、90質量%以上が更に好ましい。上限は特に制限されず、100質量%であってもよい。即ち、感光性層に含まれるエチレン性不飽和化合物が全て2官能エチレン性不飽和化合物であってもよい。 The photosensitive layer preferably contains a bifunctional or trifunctional ethylenically unsaturated compound in terms of better balance between the photosensitivity of the photosensitive layer and the resolution and releasability, and the bifunctional ethylenically unsaturated compound It is more preferable to include
In the photosensitive layer, the content of the bifunctional or trifunctional ethylenically unsaturated compound with respect to the total content of the ethylenically unsaturated compounds is preferably 60% by mass or more, and more than 70% by mass, from the viewpoint of excellent peelability. Preferably, 90% by mass or more is more preferable. The upper limit is not particularly limited, and may be 100% by mass. That is, all ethylenically unsaturated compounds contained in the photosensitive layer may be bifunctional ethylenically unsaturated compounds.
ポリアルキレンオキサイド構造を有する重合性化合物としては、後述するポリアルキレングリコールジ(メタ)アクリレート等が好ましく挙げられる。 The photosensitive layer preferably contains a polymerizable compound having a polyalkylene oxide structure, more preferably a polymerizable compound having a polyethylene oxide structure, from the viewpoint of resolution and pattern formability.
Preferred examples of the polymerizable compound having a polyalkylene oxide structure include polyalkylene glycol di(meth)acrylate, which will be described later.
感光性層は、芳香環及び2つのエチレン性不飽和基を有するエチレン性不飽和化合物B1を含有することが好ましい。エチレン性不飽和化合物B1は、上述したエチレン性不飽和化合物のうち、一分子中に1つ以上の芳香環を有する2官能エチレン性不飽和化合物である。 -Ethylenically unsaturated compound B1-
The photosensitive layer preferably contains an ethylenically unsaturated compound B1 having an aromatic ring and two ethylenically unsaturated groups. The ethylenically unsaturated compound B1 is a bifunctional ethylenically unsaturated compound having one or more aromatic rings in one molecule among the ethylenically unsaturated compounds described above.
エチレン性不飽和化合物B1は、芳香環を1つのみ有してもよく、2つ以上の芳香環を有してもよい。 Examples of the aromatic ring of the ethylenically unsaturated compound B1 include aromatic hydrocarbon rings such as benzene ring, naphthalene ring and anthracene ring, thiophene ring, furan ring, pyrrole ring, imidazole ring, triazole ring and pyridine ring. Aromatic heterocycles and condensed rings thereof are included, with aromatic hydrocarbon rings being preferred, and benzene rings being more preferred. In addition, the said aromatic ring may have a substituent.
Ethylenically unsaturated compound B1 may have only one aromatic ring, or may have two or more aromatic rings.
ビスフェノール構造としては、例えば、ビスフェノールA(2,2-ビス(4-ヒドロキシフェニル)プロパン)に由来するビスフェノールA構造、ビスフェノールF(2,2-ビス(4-ヒドロキシフェニル)メタン)に由来するビスフェノールF構造、及び、ビスフェノールB(2,2-ビス(4-ヒドロキシフェニル)ブタン)に由来するビスフェノールB構造が挙げられ、ビスフェノールA構造が好ましい。 The ethylenically unsaturated compound B1 preferably has a bisphenol structure from the viewpoint of improving the resolution by suppressing swelling of the photosensitive layer due to the developer.
Examples of the bisphenol structure include a bisphenol A structure derived from bisphenol A (2,2-bis(4-hydroxyphenyl)propane) and a bisphenol derived from bisphenol F (2,2-bis(4-hydroxyphenyl)methane). The F structure and the bisphenol B structure derived from bisphenol B (2,2-bis(4-hydroxyphenyl)butane) can be mentioned, with the bisphenol A structure being preferred.
ビスフェノール構造の両端と2つの重合性基とは、直接結合してもよく、1つ以上のアルキレンオキシ基を介して結合してもよい。ビスフェノール構造の両端に付加するアルキレンオキシ基としては、エチレンオキシ基又はプロピレンオキシ基が好ましく、エチレンオキシ基がより好ましい。ビスフェノール構造に付加するアルキレンオキシ基の付加数は特に制限されないが、1分子あたり4~16個が好ましく、6~14個がより好ましい。
ビスフェノール構造を有するエチレン性不飽和化合物B1については、特開2016-224162号公報の段落0072~0080に記載されており、この公報に記載の内容は本明細書に組み込まれる。 Examples of the ethylenically unsaturated compound B1 having a bisphenol structure include compounds having a bisphenol structure and two polymerizable groups (preferably (meth)acryloyl groups) bonded to both ends of the bisphenol structure.
Both ends of the bisphenol structure and the two polymerizable groups may be directly bonded or bonded via one or more alkyleneoxy groups. The alkyleneoxy group added to both ends of the bisphenol structure is preferably an ethyleneoxy group or a propyleneoxy group, more preferably an ethyleneoxy group. The number of alkyleneoxy groups added to the bisphenol structure is not particularly limited, but is preferably 4 to 16, more preferably 6 to 14 per molecule.
The ethylenically unsaturated compound B1 having a bisphenol structure is described in paragraphs 0072 to 0080 of JP-A-2016-224162, and the contents described in this publication are incorporated herein.
2,2-ビス(4-((メタ)アクリロキシポリアルコキシ)フェニル)プロパンとしては、例えば、2,2-ビス(4-(メタクリロキシジエトキシ)フェニル)プロパン(FA-324M、日立化成(株)製)、2,2-ビス(4-(メタクリロキシエトキシプロポキシ)フェニル)プロパン、2,2-ビス(4-(メタクリロキシペンタエトキシ)フェニル)プロパン(BPE-500、新中村化学工業(株)製)、2,2-ビス(4-(メタクリロキシドデカエトキシテトラプロポキシ)フェニル)プロパン(FA-3200MY、日立化成(株)製)、2,2-ビス(4-(メタクリロキシペンタデカエトキシ)フェニル)プロパン(BPE-1300、新中村化学工業(株)製)、2,2-ビス(4-(メタクリロキシジエトキシ)フェニル)プロパン(BPE-200、新中村化学工業(株)製)、及び、エトキシ化(10)ビスフェノールAジアクリレート(NKエステルA-BPE-10、新中村化学工業(株)製)が挙げられる。 The ethylenically unsaturated compound B1 is preferably a bifunctional ethylenically unsaturated compound having a bisphenol A structure, more preferably 2,2-bis(4-((meth)acryloxypolyalkoxy)phenyl)propane.
Examples of 2,2-bis(4-((meth)acryloxypolyalkoxy)phenyl)propane include 2,2-bis(4-(methacryloxydiethoxy)phenyl)propane (FA-324M, Hitachi Chemical ( Co., Ltd.), 2,2-bis(4-(methacryloxyethoxypropoxy)phenyl)propane, 2,2-bis(4-(methacryloxypentaethoxy)phenyl)propane (BPE-500, Shin-Nakamura Chemical Industry ( Ltd.), 2,2-bis(4-(methacryloxydodecaethoxytetrapropoxy)phenyl)propane (FA-3200MY, manufactured by Hitachi Chemical Co., Ltd.), 2,2-bis(4-(methacryloxypentadeca Ethoxy)phenyl)propane (BPE-1300, manufactured by Shin-Nakamura Chemical Co., Ltd.), 2,2-bis(4-(methacryloxydiethoxy)phenyl)propane (BPE-200, manufactured by Shin-Nakamura Chemical Co., Ltd.) ), and ethoxylated (10) bisphenol A diacrylate (NK Ester A-BPE-10, manufactured by Shin-Nakamura Chemical Co., Ltd.).
一態様において、n1+n2+n3+n4は、2~20の整数が好ましく、2~16の整数がより好ましく、4~12の整数が更に好ましい。また、n2+n4は、0~10の整数が好ましく、0~4の整数がより好ましく、0~2の整数が更に好ましく、0が特に好ましい。 In formula (Bis), R 1 and R 2 each independently represent a hydrogen atom or a methyl group, A is C 2 H 4 , B is C 3 H 6 , n 1 and n 3 are each independently , an integer of 1 to 39, n 1 + n 3 is an integer of 2 to 40, n 2 and n 4 are each independently an integer of 0 to 29, and n 2 + n 4 is 0 to It is an integer of 30, and the arrangement of repeating units of -(AO)- and -(B-O)- may be random or block. In the case of a block, either -(AO)- or -(B-O)- may be on the bisphenol structure side.
In one aspect, n 1 +n 2 +n 3 +n 4 is preferably an integer of 2-20, more preferably an integer of 2-16, and even more preferably an integer of 4-12. Also, n 2 +n 4 is preferably an integer of 0 to 10, more preferably an integer of 0 to 4, even more preferably an integer of 0 to 2, and particularly preferably 0.
感光性層における、エチレン性不飽和化合物B1の含有量は、解像性がより優れる点から、感光性層の全質量に対して、10質量%以上が好ましく、20質量%以上がより好ましい。上限は特に制限されないが、転写性及びエッジフュージョン(感光性転写材料の端部から感光性層中の成分が滲み出す現象)の点から、70質量%以下が好ましく、60質量%以下がより好ましい。 Ethylenically unsaturated compound B1 may be used alone or in combination of two or more.
The content of the ethylenically unsaturated compound B1 in the photosensitive layer is preferably 10% by mass or more, more preferably 20% by mass or more, relative to the total mass of the photosensitive layer from the viewpoint of better resolution. Although the upper limit is not particularly limited, it is preferably 70% by mass or less, more preferably 60% by mass or less, from the viewpoint of transferability and edge fusion (a phenomenon in which components in the photosensitive layer ooze out from the edges of the photosensitive transfer material). .
エチレン性不飽和化合物B1以外のエチレン性不飽和化合物は、特に制限されず、公知の化合物の中から適宜選択できる。例えば、一分子中に1つのエチレン性不飽和基を有する化合物(単官能エチレン性不飽和化合物)、芳香環を有さない2官能エチレン性不飽和化合物、及び、3官能以上のエチレン性不飽和化合物が挙げられる。 The photosensitive layer may contain an ethylenically unsaturated compound other than the ethylenically unsaturated compound B1 described above.
Ethylenically unsaturated compounds other than the ethylenically unsaturated compound B1 are not particularly limited and can be appropriately selected from known compounds. For example, a compound having one ethylenically unsaturated group in one molecule (monofunctional ethylenically unsaturated compound), a bifunctional ethylenically unsaturated compound having no aromatic ring, and a trifunctional or higher ethylenically unsaturated compound.
アルキレングリコールジ(メタ)アクリレートとしては、例えば、トリシクロデカンジメタノールジアクリレート(A-DCP、新中村化学工業(株)製)、トリシクロデカンジメタノールジメタクリレート(DCP、新中村化学工業(株)製)、1,9-ノナンジオールジアクリレート(A-NOD-N、新中村化学工業(株)製)、1,6-ヘキサンジオールジアクリレート(A-HD-N、新中村化学工業(株)製)、エチレングリコールジメタクリレート、1,10-デカンジオールジアクリレート、及び、ネオペンチルグリコールジ(メタ)アクリレートが挙げられる。
ポリアルキレングリコールジ(メタ)アクリレートとしては、例えば、ポリエチレングリコールジ(メタ)アクリレート、ジプロピレングリコールジアクリレート、トリプロピレングリコールジアクリレート、及び、ポリプロピレングリコールジ(メタ)アクリレートが挙げられる。
ウレタンジ(メタ)アクリレートとしては、例えば、プロピレンオキサイド変性ウレタンジ(メタ)アクリレート、並びに、エチレンオキサイド及びプロピレンオキサイド変性ウレタンジ(メタ)アクリレートが挙げられる。の市販品としては、例えば、8UX-015A(大成ファインケミカル(株)製)、UA-32P(新中村化学工業(株)製)、及び、UA-1100H(新中村化学工業(株)製)が挙げられる。 Examples of bifunctional ethylenically unsaturated compounds having no aromatic ring include alkylene glycol di(meth)acrylate, polyalkylene glycol di(meth)acrylate, urethane di(meth)acrylate, and trimethylolpropane diacrylate. be done.
Alkylene glycol di(meth)acrylates include, for example, tricyclodecanedimethanol diacrylate (A-DCP, manufactured by Shin-Nakamura Chemical Co., Ltd.), tricyclodecanedimethanol dimethacrylate (DCP, Shin-Nakamura Chemical Co., Ltd. ), 1,9-nonanediol diacrylate (A-NOD-N, Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (A-HD-N, Shin-Nakamura Chemical Co., Ltd. ), ethylene glycol dimethacrylate, 1,10-decanediol diacrylate, and neopentyl glycol di(meth)acrylate.
Polyalkylene glycol di(meth)acrylates include, for example, polyethylene glycol di(meth)acrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, and polypropylene glycol di(meth)acrylate.
Urethane di(meth)acrylates include, for example, propylene oxide-modified urethane di(meth)acrylates, and ethylene oxide and propylene oxide-modified urethane di(meth)acrylates. Commercially available products include, for example, 8UX-015A (manufactured by Taisei Fine Chemical Co., Ltd.), UA-32P (manufactured by Shin-Nakamura Chemical Co., Ltd.), and UA-1100H (manufactured by Shin-Nakamura Chemical Co., Ltd.). mentioned.
ここで、「(トリ/テトラ/ペンタ/ヘキサ)(メタ)アクリレート」は、トリ(メタ)アクリレート、テトラ(メタ)アクリレート、ペンタ(メタ)アクリレート、及びヘキサ(メタ)アクリレートを包含する概念であり、「(トリ/テトラ)(メタ)アクリレート」は、トリ(メタ)アクリレート及びテトラ(メタ)アクリレートを包含する概念である。一態様において、感光性層は、上述したエチレン性不飽和化合物B1及び3官能以上のエチレン性不飽和化合物を含むことが好ましく、上述したエチレン性不飽和化合物B1及び2種以上の3官能以上のエチレン性不飽和化合物を含むことがより好ましい。この場合、エチレン性不飽和化合物B1と3官能以上のエチレン性不飽和化合物の質量比は、(エチレン性不飽和化合物B1の合計質量):(3官能以上のエチレン性不飽和化合物の合計質量)=1:1~5:1が好ましく、1.2:1~4:1がより好ましく、1.5:1~3:1が更に好ましい。
また、一態様において、感光性層は、上述したエチレン性不飽和化合物B1及び2種以上の3官能のエチレン性不飽和化合物を含むことが好ましい。 Examples of trifunctional or higher ethylenically unsaturated compounds include dipentaerythritol (tri/tetra/penta/hexa) (meth) acrylate, pentaerythritol (tri/tetra) (meth) acrylate, trimethylolpropane tri(meth) Acrylate, ditrimethylolpropane tetra(meth)acrylate, trimethylolethane tri(meth)acrylate, isocyanurate tri(meth)acrylate, glycerin tri(meth)acrylate, and alkylene oxide modified products thereof.
Here, "(tri/tetra/penta/hexa) (meth)acrylate" is a concept including tri(meth)acrylate, tetra(meth)acrylate, penta(meth)acrylate, and hexa(meth)acrylate. , "(tri/tetra)(meth)acrylate" is a concept including tri(meth)acrylate and tetra(meth)acrylate. In one aspect, the photosensitive layer preferably contains the above-described ethylenically unsaturated compound B1 and a trifunctional or higher ethylenically unsaturated compound, and the above-described ethylenically unsaturated compound B1 and two or more trifunctional or higher functional More preferably, it contains an ethylenically unsaturated compound. In this case, the mass ratio of the ethylenically unsaturated compound B1 and the tri- or higher functional ethylenically unsaturated compound is (total mass of the ethylenically unsaturated compound B1):(total mass of the tri- or higher functional ethylenically unsaturated compound). = 1:1 to 5:1 is preferred, 1.2:1 to 4:1 is more preferred, and 1.5:1 to 3:1 is even more preferred.
In one aspect, the photosensitive layer preferably contains the above-described ethylenically unsaturated compound B1 and two or more trifunctional ethylenically unsaturated compounds.
また、感光性層におけるエチレン性不飽和化合物は、硬化性、及び、解像性の観点から、(メタ)アクリル化合物を含むことが好ましい。
更に、感光性層におけるエチレン性不飽和化合物は、硬化性、解像性及び直線性の観点から、(メタ)アクリル化合物を含み、かつ感光性層に含まれる上記(メタ)アクリル化合物の全質量に対するアクリル化合物の含有量が、60質量%以下であることがより好ましい。 The ratio Mm/Mb between the content Mm of the ethylenically unsaturated compound and the content Mb of the alkali-soluble resin in the photosensitive layer is preferably 1.0 or less from the viewpoint of resolution and linearity. , is more preferably 0.9 or less, and particularly preferably 0.5 or more and 0.9 or less.
Moreover, the ethylenically unsaturated compound in the photosensitive layer preferably contains a (meth)acrylic compound from the viewpoint of curability and resolution.
Furthermore, the ethylenically unsaturated compound in the photosensitive layer contains a (meth)acrylic compound from the viewpoint of curability, resolution and linearity, and the total mass of the (meth)acrylic compound contained in the photosensitive layer It is more preferable that the content of the acrylic compound is 60% by mass or less.
感光性層におけるエチレン性不飽和化合物の含有量は、感光性層の全質量に対し、10質量%~70質量%が好ましく、20質量%~60質量%がより好ましく、20質量%~50質量%が更に好ましい。 An ethylenically unsaturated compound may be used individually by 1 type, or may use 2 or more types together.
The content of the ethylenically unsaturated compound in the photosensitive layer is preferably 10% by mass to 70% by mass, more preferably 20% by mass to 60% by mass, and 20% by mass to 50% by mass, based on the total mass of the photosensitive layer. % is more preferred.
感光性層は、光重合開始剤を含むことが好ましい。
光重合開始剤は、紫外線、可視光線及びX線等の活性光線を受けて、エチレン性不飽和化合物の重合を開始する化合物である。光重合開始剤としては、特に制限されず、公知の光重合開始剤を用いることができる。
光重合開始剤としては、例えば、光ラジカル重合開始剤及び光カチオン重合開始剤が挙げられる。
中でも、感光性層は、解像性、及び、パターン形成性の観点から、光ラジカル重合開始剤が好ましい。 <<Photoinitiator>>
The photosensitive layer preferably contains a photopolymerization initiator.
A photopolymerization initiator is a compound that initiates polymerization of an ethylenically unsaturated compound upon exposure to actinic rays such as ultraviolet rays, visible rays, and X-rays. The photopolymerization initiator is not particularly limited, and known photopolymerization initiators can be used.
Photopolymerization initiators include, for example, radical photopolymerization initiators and cationic photopolymerization initiators.
Among them, the photo-radical polymerization initiator is preferable for the photosensitive layer from the viewpoint of resolution and pattern formability.
光カチオン重合開始剤としては、pKaが4以下の酸を発生する光カチオン重合開始剤が好ましく、pKaが3以下の酸を発生する光カチオン重合開始剤がより好ましく、pKaが2以下の酸を発生する光カチオン重合開始剤が特に好ましい。pKaの下限値は特に定めないが、例えば、-10.0以上が好ましい。 A photocationic polymerization initiator (photoacid generator) is a compound that generates an acid upon receiving an actinic ray. The photocationic polymerization initiator is preferably a compound that responds to an actinic ray with a wavelength of 300 nm or more, preferably 300 to 450 nm, and generates an acid, but its chemical structure is not limited. In addition, even for photocationic polymerization initiators that do not directly react to actinic rays with a wavelength of 300 nm or more, if they are compounds that react to actinic rays with a wavelength of 300 nm or more and generate an acid by using them in combination with a sensitizer, the sensitizer can be used. It can be preferably used in combination with.
The photocationic polymerization initiator is preferably a photocationic polymerization initiator that generates an acid with a pKa of 4 or less, more preferably a photocationic polymerization initiator that generates an acid with a pKa of 3 or less, and an acid with a pKa of 2 or less. Photocationic polymerization initiators generated are particularly preferred. Although the lower limit of pKa is not particularly defined, it is preferably -10.0 or more, for example.
イオン性光カチオン重合開始剤として、例えば、ジアリールヨードニウム塩類及びトリアリールスルホニウム塩類等のオニウム塩化合物、並びに、第4級アンモニウム塩類が挙げられる。
イオン性光カチオン重合開始剤としては、特開2014-85643号公報の段落0114~0133に記載のイオン性光カチオン重合開始剤を用いてもよい。 Examples of photocationic polymerization initiators include ionic photocationic polymerization initiators and nonionic photocationic polymerization initiators.
Ionic photocationic polymerization initiators include, for example, onium salt compounds such as diaryliodonium salts and triarylsulfonium salts, and quaternary ammonium salts.
As the ionic photocationic polymerization initiator, the ionic photocationic polymerization initiators described in paragraphs 0114 to 0133 of JP-A-2014-85643 may be used.
感光性層における光重合開始剤の含有量は、特に制限されないが、感光性層の全質量に対し、0.1質量%以上が好ましく、0.5質量%以上がより好ましく、1.0質量%以上が更に好ましい。上限は特に制限されないが、感光性層の全質量に対し、10質量%以下が好ましく、5質量%以下がより好ましい。 The photosensitive layer may contain one type of photopolymerization initiator alone, or two or more types thereof.
The content of the photopolymerization initiator in the photosensitive layer is not particularly limited, but is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and 1.0% by mass, based on the total mass of the photosensitive layer. % or more is more preferable. Although the upper limit is not particularly limited, it is preferably 10% by mass or less, more preferably 5% by mass or less, relative to the total mass of the photosensitive layer.
感光性層は、アルカリ可溶性樹脂を含むことが好ましい。
なお、本明細書において、「アルカリ可溶性」とは、液温22℃において炭酸ナトリウムの1質量%水溶液100gへの溶解度が0.1g以上であることを意味する。
アルカリ可溶性樹脂としては、特に制限はなく、例えば、エッチングレジストに用いられる公知のアルカリ可溶性樹脂が好適に挙げられる。
また、アルカリ可溶性樹脂は、バインダーポリマーであることが好ましい。
アルカリ可溶性樹脂としては、酸基を有するアルカリ可溶性樹脂であることが好ましい。
中でも、アルカリ可溶性樹脂としては、後述する重合体Aが好ましい。 << Alkali-soluble resin >>
The photosensitive layer preferably contains an alkali-soluble resin.
In this specification, the term “alkali-soluble” means that the solubility in 100 g of a 1 mass % aqueous solution of sodium carbonate at a liquid temperature of 22° C. is 0.1 g or more.
Alkali-soluble resins are not particularly limited, and suitable examples include known alkali-soluble resins used in etching resists.
Also, the alkali-soluble resin is preferably a binder polymer.
The alkali-soluble resin is preferably an alkali-soluble resin having an acid group.
Among them, as the alkali-soluble resin, a polymer A described later is preferable.
アルカリ可溶性樹脂としては、重合体Aを含むことが好ましい。
重合体Aの酸価は、現像液による感光性層の膨潤を抑制することにより、解像性がより優れる点から、220mgKOH/g以下が好ましく、200mgKOH/g未満がより好ましく、190mgKOH/g未満が更に好ましい。
重合体Aの酸価の下限は特に制限されないが、現像性がより優れる点から、60mgKOH/g以上が好ましく、120mgKOH/g以上がより好ましく、150mgKOH/g以上が更に好ましく、170mgKOH/g以上が特に好ましい。 -Polymer A-
It is preferable that the polymer A is included as the alkali-soluble resin.
The acid value of the polymer A is preferably 220 mgKOH/g or less, more preferably less than 200 mgKOH/g, more preferably less than 190 mgKOH/g, from the viewpoint of better resolution by suppressing swelling of the photosensitive layer by the developer. is more preferred.
The lower limit of the acid value of polymer A is not particularly limited, but from the viewpoint of better developability, it is preferably 60 mgKOH/g or more, more preferably 120 mgKOH/g or more, still more preferably 150 mgKOH/g or more, and 170 mgKOH/g or more. Especially preferred.
本明細書においては、単位をmgKOH/gと記載する。酸価は、例えば、化合物中における酸基の平均含有量から算出できる。
重合体Aの酸価は、重合体Aを構成する構成単位の種類及び酸基を含有する構成単位の含有量により調整すればよい。 The acid value is the mass [mg] of potassium hydroxide required to neutralize 1 g of the sample.
In this specification, the unit is described as mgKOH/g. The acid value can be calculated, for example, from the average content of acid groups in the compound.
The acid value of the polymer A may be adjusted according to the type of structural units constituting the polymer A and the content of structural units containing an acid group.
重合体Aにおける第一の単量体の含有割合は、全単量体成分の合計質量を基準として、5質量%~50質量%であることが好ましく、10質量%~40質量%であることがより好ましく、15質量%~30質量%であることが更に好ましい。 A 1st monomer is a monomer which has a carboxy group in a molecule|numerator. Examples of the first monomer include (meth)acrylic acid, fumaric acid, cinnamic acid, crotonic acid, itaconic acid, 4-vinylbenzoic acid, maleic anhydride, and maleic acid half ester. Among these, (meth)acrylic acid is preferred.
The content of the first monomer in the polymer A is preferably 5% by mass to 50% by mass, based on the total mass of all monomer components, and 10% by mass to 40% by mass. is more preferable, and 15% by mass to 30% by mass is even more preferable.
重合体Aにおける第二の単量体の含有割合は、全単量体成分の合計質量を基準として、5質量%~60質量%であることが好ましく、15質量%~50質量%であることがより好ましく、20質量%~45質量%であることが更に好ましい。 The second monomer is a non-acidic monomer having at least one polymerizable unsaturated group in the molecule. Examples of the second monomer include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, and isobutyl (meth) acrylate. , tert-butyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate and other (meth)acrylates; vinyl acetate esters of vinyl alcohol such as; and (meth)acrylonitrile. Among them, methyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and n-butyl (meth)acrylate are preferred, and methyl (meth)acrylate is particularly preferred.
The content of the second monomer in the polymer A is preferably 5% by mass to 60% by mass, based on the total mass of all monomer components, and 15% by mass to 50% by mass. is more preferable, and 20% by mass to 45% by mass is even more preferable.
一態様において、重合体Aは、芳香族炭化水素基を有する単量体成分を25質量%~40質量%、第一の単量体成分を20質量%~35質量%、第二の単量体成分を30質量%~45質量%含む重合体であることが好ましい。また、別の態様において、芳香族炭化水素基を有する単量体成分を70質量%~90質量%、第一の単量体成分を10質量%~25質量%含む重合体であることが好ましい。 Containing a monomer having an aralkyl group and/or styrene as a monomer is preferable from the viewpoint of suppressing widening of line width and deterioration of resolution when the focal position during exposure is shifted. For example, a copolymer containing methacrylic acid, benzyl methacrylate and styrene, a copolymer containing methacrylic acid, methyl methacrylate, benzyl methacrylate and styrene, and the like are preferable.
In one embodiment, the polymer A contains 25% to 40% by mass of the monomer component having an aromatic hydrocarbon group, 20% to 35% by mass of the first monomer component, and the second monomer It is preferably a polymer containing 30% by mass to 45% by mass of the solid component. In another aspect, the polymer preferably contains 70% by mass to 90% by mass of the monomer component having an aromatic hydrocarbon group and 10% by mass to 25% by mass of the first monomer component. .
側鎖に分岐構造を有する基を含有するモノマーの具体例としては、例えば(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、(メタ)アクリル酸s-ブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸i-アミル、(メタ)アクリル酸t-アミル、(メタ)アクリル酸sec-iso-アミル、(メタ)アクリル酸2-オクチル、(メタ)アクリル酸3-オクチル、(メタ)アクリル酸t-オクチル等が挙げられる。これらの中でも、(メタ)アクリル酸i-プロピル、(メタ)アクリル酸i-ブチル、又は、メタクリル酸t-ブチルが好ましく、メタクリル酸i-プロピル、又は、メタクリル酸t-ブチルがより好ましい。
側鎖に脂環構造を有する基を含有するモノマーとしては、単環の脂肪族炭化水素基を有するモノマー、多環の脂肪族炭化水素基を有するモノマーが挙げられ、炭素数(炭素原子数)5~20個の脂環式炭化水素基を有する(メタ)アクリレートが挙げられる。より具体的な例としては、例えば(メタ)アクリル酸(ビシクロ[2.2.1]ヘプチル-2)、(メタ)アクリル酸-1-アダマンチル、(メタ)アクリル酸-2-アダマンチル、(メタ)アクリル酸-3-メチル-1-アダマンチル、(メタ)アクリル酸-3,5-ジメチル-1-アダマンチル、(メタ)アクリル酸-3-エチルアダマンチル、(メタ)アクリル酸-3-メチル-5-エチル-1-アダマンチル、(メタ)アクリル酸-3,5,8-トリエチル-1-アダマンチル、(メタ)アクリル酸-3,5-ジメチル-8-エチル-1-アダマンチル、(メタ)アクリル酸2-メチル-2-アダマンチル、(メタ)アクリル酸2-エチル-2-アダマンチル、(メタ)アクリル酸3-ヒドロキシ-1-アダマンチル、(メタ)アクリル酸オクタヒドロ-4,7-メンタノインデン-5-イル、(メタ)アクリル酸オクタヒドロ-4,7-メンタノインデン-1-イルメチル、(メタ)アクリル酸-1-メンチル、(メタ)アクリル酸トリシクロデカン、(メタ)アクリル酸-3-ヒドロキシ-2,6,6-トリメチル-ビシクロ[3.1.1]ヘプチル、(メタ)アクリル酸-3,7,7-トリメチル-4-ヒドロキシビシクロ[4.1.0]ヘプチル、(メタ)アクリル酸(ノル)ボルニル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸フェンチル、(メタ)アクリル酸-2,2,5-トリメチルシクロヘキシル、(メタ)アクリル酸シクロヘキシル等が挙げられる。これら(メタ)アクリル酸エステルの中でも、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸(ノル)ボルニル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸-1-アダマンチル、(メタ)アクリル酸-2-アダマンチル、(メタ)アクリル酸フェンチル、(メタ)アクリル酸1-メンチル、又は、(メタ)アクリル酸トリシクロデカンが好ましく、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸(ノル)ボルニル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸-2-アダマンチル、又は、(メタ)アクリル酸トリシクロデカンが特に好ましい。 Polymer A may have any one of a linear structure, a branched structure, and an alicyclic structure in the side chain. Introducing a branched structure or an alicyclic structure to the side chain of the polymer A by using a monomer containing a group having a branched structure in the side chain or a monomer containing a group having an alicyclic structure in the side chain. can be done. A group having an alicyclic structure may be monocyclic or polycyclic.
Specific examples of the monomer containing a group having a branched structure in the side chain include i-propyl (meth)acrylate, i-butyl (meth)acrylate, s-butyl (meth)acrylate, (meth)acrylic t-butyl acid, i-amyl (meth)acrylate, t-amyl (meth)acrylate, sec-iso-amyl (meth)acrylate, 2-octyl (meth)acrylate, 3-(meth)acrylate octyl, t-octyl (meth)acrylate and the like. Among these, i-propyl (meth)acrylate, i-butyl (meth)acrylate, and t-butyl methacrylate are preferred, and i-propyl methacrylate and t-butyl methacrylate are more preferred.
Examples of the monomer containing a group having an alicyclic structure in the side chain include monomers having a monocyclic aliphatic hydrocarbon group and monomers having a polycyclic aliphatic hydrocarbon group, and the number of carbon atoms (number of carbon atoms) (Meth)acrylates having 5 to 20 alicyclic hydrocarbon groups are mentioned. More specific examples include (meth) acrylic acid (bicyclo[2.2.1] heptyl-2), (meth) acrylic acid-1-adamantyl, (meth) acrylic acid-2-adamantyl, (meth) ) 3-methyl-1-adamantyl acrylate, 3,5-dimethyl-1-adamantyl (meth) acrylate, 3-ethyladamantyl (meth) acrylate, 3-methyl-5 (meth) acrylate -ethyl-1-adamantyl, (meth)acrylate-3,5,8-triethyl-1-adamantyl, (meth)acrylate-3,5-dimethyl-8-ethyl-1-adamantyl, (meth)acrylic acid 2-methyl-2-adamantyl, 2-ethyl-2-adamantyl (meth)acrylate, 3-hydroxy-1-adamantyl (meth)acrylate, octahydro-4,7-mentanoindene-5 (meth)acrylate -yl, octahydro-4,7-menthanoinden-1-ylmethyl (meth)acrylate, 1-menthyl (meth)acrylate, tricyclodecane (meth)acrylate, 3-hydroxy (meth)acrylate -2,6,6-trimethyl-bicyclo[3.1.1]heptyl, (meth)acrylate-3,7,7-trimethyl-4-hydroxybicyclo[4.1.0]heptyl, (meth)acrylic acid (nor)bornyl, isobornyl (meth)acrylate, fenchyl (meth)acrylate, 2,2,5-trimethylcyclohexyl (meth)acrylate, cyclohexyl (meth)acrylate and the like. Among these (meth)acrylic esters, cyclohexyl (meth)acrylate, (nor)bornyl (meth)acrylate, isobornyl (meth)acrylate, -1-adamantyl (meth)acrylate, (meth)acrylate - 2-adamantyl, fenchyl (meth)acrylate, 1-menthyl (meth)acrylate, or tricyclodecane (meth)acrylate is preferred, cyclohexyl (meth)acrylate, (nor)bornyl (meth)acrylate, Isobornyl (meth)acrylate, 2-adamantyl (meth)acrylate, or tricyclodecane (meth)acrylate are particularly preferred.
アルカリ可溶性樹脂以外の樹脂としては、アクリル樹脂、スチレン-アクリル共重合体(但し、スチレン含有率が40質量%以下であるもの)、ポリウレタン樹脂、ポリビニルアルコール、ポリビニルホルマール、ポリアミド樹脂、ポリエステル樹脂、ポリアミド樹脂、エポキシ樹脂、ポリアセタール樹脂、ポリヒドロキシスチレン樹脂、ポリイミド樹脂、ポリベンゾオキサゾール樹脂、ポリシロキサン樹脂、ポリエチレンイミン、ポリアリルアミン、及び、ポリアルキレングリコールが挙げられる。 The photosensitive layer may contain a resin other than the alkali-soluble resin.
Resins other than alkali-soluble resins include acrylic resins, styrene-acrylic copolymers (with a styrene content of 40% by mass or less), polyurethane resins, polyvinyl alcohol, polyvinyl formal, polyamide resins, polyester resins, and polyamides. Resins, epoxy resins, polyacetal resins, polyhydroxystyrene resins, polyimide resins, polybenzoxazole resins, polysiloxane resins, polyethyleneimines, polyallylamines, and polyalkylene glycols.
アルカリ可溶性樹脂の、感光性層の全質量に対する割合は、好ましくは10質量%~90質量%の範囲であり、より好ましくは30質量%~70質量%であり、更に好ましくは40質量%~60質量%である。感光性層に対するアルカリ可溶性樹脂の割合を90質量%以下にすることは、現像時間を制御する観点から好ましい。一方で、感光性層に対するアルカリ可溶性樹脂の割合を10質量%以上にすることは、耐エッジフューズ性を向上させる観点から好ましい。 Alkali-soluble resins may be used singly or in combination of two or more.
The ratio of the alkali-soluble resin to the total weight of the photosensitive layer is preferably in the range of 10% by mass to 90% by mass, more preferably 30% by mass to 70% by mass, and still more preferably 40% by mass to 60% by mass. % by mass. It is preferable from the viewpoint of controlling the developing time that the ratio of the alkali-soluble resin to the photosensitive layer is 90% by mass or less. On the other hand, it is preferable from the viewpoint of improving the edge fuse resistance that the ratio of the alkali-soluble resin to the photosensitive layer is 10% by mass or more.
感光性層は、露光部及び非露光部の視認性、現像後のパターン視認性、及び、解像性の観点から、色素を含有することが好ましく、発色時の波長範囲400nm~780nmにおける最大吸収波長が450nm以上であり、かつ、酸、塩基、又はラジカルにより最大吸収波長が変化する色素(単に「色素N」ともいう。)を含有することがより好ましい。色素Nを含有すると、詳細なメカニズムは不明であるが、隣接する層(例えば仮支持体及び第1樹脂層)との密着性が向上し、解像性により優れる。 <<Dye>>
The photosensitive layer preferably contains a dye from the viewpoint of the visibility of the exposed and unexposed areas, the visibility of the pattern after development, and the resolution. It is more preferable to contain a dye whose wavelength is 450 nm or more and whose maximum absorption wavelength is changed by an acid, a base, or a radical (also simply referred to as “dye N”). When the dye N is contained, although the detailed mechanism is unknown, the adhesion to the adjacent layers (for example, the temporary support and the first resin layer) is improved, and the resolution is improved.
具体的には、色素Nは、露光により消色状態から変化して発色する化合物であってもよいし、露光により発色状態から変化して消色する化合物であってもよい。この場合、露光により酸、塩基又はラジカルが感光性層内において発生し作用することにより、発色又は消色の状態が変化する色素でもよく、酸、塩基又はラジカルにより感光性層内の状態(例えばpH)が変化することで発色又は消色の状態が変化する色素でもよい。また、露光を介さずに、酸、塩基又はラジカルを刺激として直接受けて発色又は消色の状態が変化する色素でもよい。 As used herein, the term "the maximum absorption wavelength of a dye changes with an acid, a base, or a radical" means that the dye in a colored state is decolored by an acid, a base, or a radical, the dye in a decolored state is an acid, It may mean either a mode in which a color is developed by a base or a radical, or a mode in which a dye in a coloring state changes to a coloring state of another hue.
Specifically, the dye N may be a compound that changes from a decolored state to develop color upon exposure, or a compound that changes from a colored state to decolor upon exposure. In this case, it may be a dye whose coloring or decoloring state is changed by the action of an acid, a base, or a radical generated in the photosensitive layer by exposure, and the state in the photosensitive layer by the acid, the base, or the radical (for example, It may also be a dye that changes its coloring or decoloring state with a change in pH). Moreover, it may be a dye that changes its coloring or decoloring state by being directly stimulated by an acid, a base, or a radical without being exposed to light.
感光性層は、露光部及び非露光部の視認性並びに解像性の観点から、色素Nとしてラジカルにより最大吸収波長が変化する色素、及び、光ラジカル重合開始剤の両者を含有することが好ましい。
また、露光部及び非露光部の視認性の観点から、色素Nは、酸、塩基、又はラジカルにより発色する色素であることが好ましい。 Among them, from the viewpoint of the visibility and resolution of the exposed and unexposed areas, the dye N is preferably a dye whose maximum absorption wavelength is changed by acid or radicals, more preferably a dye whose maximum absorption wavelength is changed by radicals.
From the viewpoint of the visibility and resolution of the exposed and unexposed areas, the photosensitive layer preferably contains both a dye whose maximum absorption wavelength is changed by radicals as the dye N and a photoradical polymerization initiator. .
From the viewpoint of the visibility of the exposed and unexposed areas, the dye N is preferably a dye that develops color with an acid, a base, or a radical.
また、色素Nは、発色時の波長範囲400nm~780nmにおける極大吸収波長を1つのみ有していてもよく、2つ以上有していてもよい。色素Nが発色時の波長範囲400nm~780nmにおける極大吸収波長を2つ以上有する場合は、2つ以上の極大吸収波長のうち吸光度が最も高い極大吸収波長が450nm以上であればよい。 From the viewpoint of the visibility of the exposed and unexposed areas, the dye N preferably has a maximum absorption wavelength of 550 nm or more in the wavelength range of 400 nm to 780 nm during color development, more preferably 550 nm to 700 nm, and 550 nm. More preferably ~650 nm.
In addition, the dye N may have only one maximum absorption wavelength in the wavelength range of 400 nm to 780 nm during color development, or may have two or more. When the dye N has two or more maximum absorption wavelengths in the wavelength range of 400 nm to 780 nm during color development, the maximum absorption wavelength with the highest absorbance among the two or more maximum absorption wavelengths may be 450 nm or more.
露光により消色する色素としては、例えば、ロイコ化合物、ジアリールメタン系色素、オキザジン系色素、キサンテン系色素、イミノナフトキノン系色素、アゾメチン系色素及びアントラキノン系色素が挙げられる。
色素Nとしては、露光部及び非露光部の視認性の観点から、ロイコ化合物が好ましい。 Examples of dyes that develop or decolorize upon exposure include leuco compounds.
Examples of dyes that are decolorized by exposure include leuco compounds, diarylmethane dyes, oxazine dyes, xanthene dyes, iminonaphthoquinone dyes, azomethine dyes, and anthraquinone dyes.
As the dye N, a leuco compound is preferable from the viewpoint of the visibility of the exposed area and the non-exposed area.
中でも、トリアリールメタン系色素又はフルオラン系色素が好ましく、トリフェニルメタン骨格を有するロイコ化合物(トリフェニルメタン系色素)又はフルオラン系色素がより好ましい。 Examples of leuco compounds include leuco compounds having a triarylmethane skeleton (triarylmethane dyes), leuco compounds having a spiropyran skeleton (spiropyran dyes), leuco compounds having a fluorane skeleton (fluoran dyes), and diarylmethane skeletons. a leuco compound (diarylmethane dye), a leuco compound having a rhodamine lactam skeleton (rhodamine lactam dye), a leuco compound having an indolylphthalide skeleton (indolylphthalide dye), and a leuco auramine skeleton leuco compounds (leuco auramine dyes) having
Among them, triarylmethane-based dyes or fluoran-based dyes are preferable, and leuco compounds having a triphenylmethane skeleton (triphenylmethane-based dyes) or fluoran-based dyes are more preferable.
色素Nのうち染料の具体例としては、ブリリアントグリーン、エチルバイオレット、メチルグリーン、クリスタルバイオレット、ベイシックフクシン、メチルバイオレット2B、キナルジンレッド、ローズベンガル、メタニルイエロー、チモールスルホフタレイン、キシレノールブルー、メチルオレンジ、パラメチルレッド、コンゴーフレッド、ベンゾプルプリン4B、α-ナフチルレッド、ナイルブルー2B、ナイルブルーA、メチルバイオレット、マラカイトグリーン、パラフクシン、ビクトリアピュアブルー-ナフタレンスルホン酸塩、ビクトリアピュアブルーBOH(保土谷化学工業(株)製)、オイルブルー#603(オリヱント化学工業(株)製)、オイルピンク#312(オリヱント化学工業(株)製)、オイルレッド5B(オリヱント化学工業(株)製)、オイルスカーレット#308(オリヱント化学工業(株)製)、オイルレッドOG(オリヱント化学工業(株)製)、オイルレッドRR(オリヱント化学工業(株)製)、オイルグリーン#502(オリヱント化学工業(株)製)、スピロンレッドBEHスペシャル(保土谷化学工業(株)製)、m-クレゾールパープル、クレゾールレッド、ローダミンB、ローダミン6G、スルホローダミンB、オーラミン、4-p-ジエチルアミノフェニルイミノナフトキノン、2-カルボキシアニリノ-4-p-ジエチルアミノフェニルイミノナフトキノン、2-カルボキシステアリルアミノ-4-p-N,N-ビス(ヒドロキシエチル)アミノ-フェニルイミノナフトキノン、1-フェニル-3-メチル-4-p-ジエチルアミノフェニルイミノ-5-ピラゾロン、及び、1-β-ナフチル-4-p-ジエチルアミノフェニルイミノ-5-ピラゾロンが挙げられる。 Examples of dye N include the following dyes and leuco compounds.
Specific examples of dyes among dyes N include brilliant green, ethyl violet, methyl green, crystal violet, basic fuchsine, methyl violet 2B, quinaldine red, rose bengal, methanyl yellow, thymolsulfophtalein, xylenol blue, methyl Orange, Paramethyl Red, Congo Fred, Benzopurpurin 4B, α-Naphthyl Red, Nile Blue 2B, Nile Blue A, Methyl Violet, Malachite Green, Parafuchsin, Victoria Pure Blue-Naphthalene Sulfonate, Victoria Pure Blue BOH (protective Tsuchiya Chemical Industry Co., Ltd.), Oil Blue #603 (Orient Chemical Industry Co., Ltd.), Oil Pink #312 (Orient Chemical Industry Co., Ltd.), Oil Red 5B (Orient Chemical Industry Co., Ltd.), Oil Scarlet #308 (manufactured by Orient Chemical Industry Co., Ltd.), Oil Red OG (manufactured by Orient Chemical Industry Co., Ltd.), Oil Red RR (manufactured by Orient Chemical Industry Co., Ltd.), Oil Green #502 (manufactured by Orient Chemical Industry Co., Ltd.) ), Spiron Red BEH Special (manufactured by Hodogaya Chemical Co., Ltd.), m-cresol purple, cresol red, rhodamine B, rhodamine 6G, sulforhodamine B, auramine, 4-p-diethylaminophenyliminonaphthoquinone, 2-carboxy Anilino-4-p-diethylaminophenyliminonaphthoquinone, 2-carboxystearylamino-4-p-N,N-bis(hydroxyethyl)amino-phenyliminonaphthoquinone, 1-phenyl-3-methyl-4-p-diethylamino phenylimino-5-pyrazolone and 1-β-naphthyl-4-p-diethylaminophenylimino-5-pyrazolone.
色素Nとしては、ロイコクリスタルバイオレット、クリスタルバイオレットラクトン、ブリリアントグリーン、又は、ビクトリアピュアブルー-ナフタレンスルホン酸塩が好ましい。 Dye N is preferably a dye whose maximum absorption wavelength is changed by radicals from the viewpoint of visibility of exposed and unexposed areas, pattern visibility after development, and resolution, and is a dye that develops color by radicals. is more preferable.
Preferred dyes N are leuco crystal violet, crystal violet lactone, brilliant green, or victoria pure blue-naphthalene sulfonate.
色素の含有量は、露光部及び非露光部の視認性、現像後のパターン視認性、及び、解像性の観点から、感光性層の全質量に対し、0.1質量%以上が好ましく、0.1質量%~10質量%がより好ましく、0.1質量%~5質量%が更に好ましく、0.1質量%~1質量%が特に好ましい。
また、色素Nの含有量は、露光部及び非露光部の視認性、現像後のパターン視認性、及び、解像性の観点から、感光性層の全質量に対し、0.1質量%以上が好ましく、0.1質量%~10質量%がより好ましく、0.1質量%~5質量%が更に好ましく、0.1質量%~1質量%が特に好ましい。 A dye may be used individually by 1 type, or may use 2 or more types.
The content of the dye is preferably 0.1% by mass or more based on the total mass of the photosensitive layer, from the viewpoints of visibility of exposed and unexposed areas, pattern visibility after development, and resolution. It is more preferably 0.1% by mass to 10% by mass, still more preferably 0.1% by mass to 5% by mass, and particularly preferably 0.1% by mass to 1% by mass.
In addition, the content of the dye N is 0.1% by mass or more with respect to the total mass of the photosensitive layer from the viewpoint of the visibility of the exposed area and the non-exposed area, the pattern visibility after development, and the resolution. is preferred, 0.1% by mass to 10% by mass is more preferred, 0.1% by mass to 5% by mass is even more preferred, and 0.1% by mass to 1% by mass is particularly preferred.
メチルエチルケトン100mLに、色素0.001g又は0.01gを溶かした2種類の溶液を調製する。得られた各溶液に、光ラジカル重合開始剤Irgacure OXE01(商品名、BASFジャパン株式会社)を加え、365nmの光を照射することによりラジカルを発生させ、全ての色素を発色状態にする。その後、大気雰囲気下で、分光光度計(UV3100、(株)島津製作所製)を用いて、液温が25℃である各溶液の吸光度を測定し、検量線を作成する。
次に、色素に代えて感光性層3gをメチルエチルケトンに溶かすこと以外は上記と同様の方法で、色素を全て発色させた溶液の吸光度を測定する。得られた感光性層を含有する溶液の吸光度から、検量線に基づいて感光性層に含まれる色素の含有量を算出する。 The content of the dye N means the content of the dye when all the dyes N contained in the photosensitive layer are in a colored state. A method for quantifying the content of dye N will be described below using a dye that develops color by radicals as an example.
Two solutions are prepared by dissolving 0.001 g or 0.01 g of dye in 100 mL of methyl ethyl ketone. A radical photopolymerization initiator Irgacure OXE01 (trade name, BASF Japan Co., Ltd.) is added to each of the solutions obtained, and radicals are generated by irradiation with light of 365 nm to bring all the dyes into a colored state. After that, the absorbance of each solution having a liquid temperature of 25° C. is measured using a spectrophotometer (UV3100, manufactured by Shimadzu Corporation) in an air atmosphere to create a calibration curve.
Next, the absorbance of the solution in which all the dyes are developed is measured in the same manner as described above except that 3 g of the photosensitive layer is dissolved in methyl ethyl ketone instead of the dyes. From the absorbance of the obtained solution containing the photosensitive layer, the content of the dye contained in the photosensitive layer is calculated based on the calibration curve.
感光性層は、得られる硬化膜の強度、及び、得られる未硬化膜の粘着性の観点から、熱架橋性化合物を含むことが好ましい。なお、本明細書においては、後述するエチレン性不飽和基を有する熱架橋性化合物は、重合性化合物としては扱わず、熱架橋性化合物として扱うものとする。
熱架橋性化合物としては、メチロール化合物、及びブロックイソシアネート化合物が挙げられる。中でも、得られる硬化膜の強度、及び、得られる未硬化膜の粘着性の観点から、ブロックイソシアネート化合物が好ましい。
ブロックイソシアネート化合物は、ヒドロキシ基及びカルボキシ基と反応するため、例えば、樹脂及び/又は重合性化合物等が、ヒドロキシ基及びカルボキシ基の少なくとも一方を有する場合には、形成される膜の親水性が下がり、感光性層を硬化した膜を保護膜として使用する場合の機能が強化される傾向がある。
なお、ブロックイソシアネート化合物とは、「イソシアネートのイソシアネート基をブロック剤で保護(いわゆる、マスク)した構造を有する化合物」を指す。 <<Thermal crosslinkable compound>>
The photosensitive layer preferably contains a thermal crosslinkable compound from the viewpoint of the strength of the resulting cured film and the adhesiveness of the resulting uncured film. In this specification, a thermally crosslinkable compound having an ethylenically unsaturated group, which will be described later, is not treated as a polymerizable compound, but as a thermally crosslinkable compound.
Thermally crosslinkable compounds include methylol compounds and blocked isocyanate compounds. Among them, a blocked isocyanate compound is preferable from the viewpoint of the strength of the cured film to be obtained and the adhesiveness of the uncured film to be obtained.
Since the blocked isocyanate compound reacts with the hydroxy group and the carboxy group, for example, when the resin and/or the polymerizable compound has at least one of the hydroxy group and the carboxy group, the hydrophilicity of the formed film is lowered. , there is a tendency for the function to be enhanced when a film obtained by curing the photosensitive layer is used as a protective film.
The blocked isocyanate compound refers to "a compound having a structure in which the isocyanate group of isocyanate is protected (so-called masked) with a blocking agent".
ブロックイソシアネートの解離温度とは、「示差走査熱量計を用いて、DSC(Differential scanning calorimetry)分析にて測定した場合における、ブロックイソシアネートの脱保護反応に伴う吸熱ピークの温度」を意味する。
示差走査熱量計としては、例えば、セイコーインスツルメンツ(株)製の示差走査熱量計(型式:DSC6200)を好適に使用できる。但し、示差走査熱量計は、これに限定されない。 The dissociation temperature of the blocked isocyanate compound is not particularly limited, but is preferably 100°C to 160°C, more preferably 130°C to 150°C.
The dissociation temperature of the blocked isocyanate means "the temperature of the endothermic peak associated with the deprotection reaction of the blocked isocyanate as measured by DSC (Differential Scanning Calorimetry) analysis using a differential scanning calorimeter".
As the differential scanning calorimeter, for example, a differential scanning calorimeter (model: DSC6200) manufactured by Seiko Instruments Inc. can be preferably used. However, the differential scanning calorimeter is not limited to this.
これらの中でも、解離温度が100℃~160℃であるブロック剤としては、例えば、保存安定性の観点から、オキシム化合物を含むことが好ましい。 Blocking agents having a dissociation temperature of 100° C. to 160° C. include active methylene compounds [malonic acid diesters (dimethyl malonate, diethyl malonate, di-n-butyl malonate, di-2-ethylhexyl malonate, etc.)] and oxime compounds. (Compounds having a structure represented by -C(=N-OH)- in the molecule such as formaldoxime, acetaldoxime, acetoxime, methylethylketoxime, and cyclohexanone oxime).
Among these, the blocking agent having a dissociation temperature of 100° C. to 160° C. preferably contains an oxime compound from the viewpoint of storage stability.
イソシアヌレート構造を有するブロックイソシアネート化合物は、例えば、ヘキサメチレンジイソシアネートをイソシアヌレート化して保護することにより得られる。
イソシアヌレート構造を有するブロックイソシアネート化合物の中でも、オキシム化合物をブロック剤として用いたオキシム構造を有する化合物が、オキシム構造を有さない化合物よりも解離温度を好ましい範囲にしやすく、且つ、現像残渣を少なくしやすいという観点から好ましい。 The blocked isocyanate compound preferably has an isocyanurate structure from the viewpoint of, for example, improving the brittleness of the film and improving the adhesion to the transferred material.
A blocked isocyanate compound having an isocyanurate structure can be obtained, for example, by converting hexamethylene diisocyanate into an isocyanurate for protection.
Among the blocked isocyanate compounds having an isocyanurate structure, compounds having an oxime structure using an oxime compound as a blocking agent tend to have a dissociation temperature within a preferred range and can reduce development residues more easily than compounds having no oxime structure. This is preferable from the viewpoint of ease of use.
重合性基としては、特に制限はなく、公知の重合性基を用いることができ、ラジカル重合性基が好ましい。
重合性基としては、(メタ)アクリロキシ基、(メタ)アクリルアミド基及びスチリル基等のエチレン性不飽和基、並びに、グリシジル基等のエポキシ基を有する基が挙げられる。
中でも、重合性基としては、エチレン性不飽和基が好ましく、(メタ)アクリロキシ基がより好ましく、アクリロキシ基が更に好ましい。 The blocked isocyanate compound may have a polymerizable group.
The polymerizable group is not particularly limited, and any known polymerizable group can be used, and a radically polymerizable group is preferred.
Polymerizable groups include groups having ethylenically unsaturated groups such as (meth)acryloxy groups, (meth)acrylamide groups and styryl groups, and epoxy groups such as glycidyl groups.
Among them, the polymerizable group is preferably an ethylenically unsaturated group, more preferably a (meth)acryloxy group, and still more preferably an acryloxy group.
ブロックイソシアネート化合物の市販品の例としては、カレンズ(登録商標) AOI-BM、カレンズ(登録商標) MOI-BM、カレンズ(登録商標) MOI-BP等(以上、昭和電工(株)製)、ブロック型のデュラネートシリーズ(例えば、デュラネート(登録商標) TPA-B80E、デュラネート(登録商標) WT32-B75P等、旭化成ケミカルズ(株)製)が挙げられる。
また、ブロックイソシアネート化合物として、下記の構造の化合物を用いることもできる。 A commercial item can be used as a blocked isocyanate compound.
Examples of commercially available blocked isocyanate compounds include Karenz (registered trademark) AOI-BM, Karenz (registered trademark) MOI-BM, Karenz (registered trademark) MOI-BP, etc. (manufactured by Showa Denko K.K.), block type Duranate series (eg, Duranate (registered trademark) TPA-B80E, Duranate (registered trademark) WT32-B75P, etc., manufactured by Asahi Kasei Chemicals Corporation).
Moreover, the compound of the following structure can also be used as a blocked isocyanate compound.
感光性層が熱架橋性化合物を含む場合、熱架橋性化合物の含有量は、感光性層の全質量に対して、1質量%~50質量%が好ましく、5質量%~30質量%がより好ましい。 The thermally crosslinkable compounds may be used singly or in combination of two or more.
When the photosensitive layer contains a thermally crosslinkable compound, the content of the thermally crosslinkable compound is preferably 1% by mass to 50% by mass, more preferably 5% by mass to 30% by mass, based on the total mass of the photosensitive layer. preferable.
感光性層は、上述したアルカリ可溶性樹脂、エチレン性不飽和化合物、光重合開始剤、色素、及び、熱架橋性化合物以外の成分を含有してもよい。 <<Other Ingredients>>
The photosensitive layer may contain components other than the above-described alkali-soluble resin, ethylenically unsaturated compound, photopolymerization initiator, dye, and thermally crosslinkable compound.
感光性層は、厚さ均一性の観点から、界面活性剤を含有することが好ましい。
界面活性剤としては、例えば、アニオン性界面活性剤、カチオン性界面活性剤、ノニオン性(非イオン性)界面活性剤、及び、両性界面活性剤が挙げられ、ノニオン性界面活性剤が好ましい。
界面活性剤としては、例えば、特許第4502784号公報の段落0017、及び、特開2009-237362号公報の段落0060~0071に記載の界面活性剤が挙げられる。 -Surfactant-
From the viewpoint of thickness uniformity, the photosensitive layer preferably contains a surfactant.
Examples of surfactants include anionic surfactants, cationic surfactants, nonionic (nonionic) surfactants, and amphoteric surfactants, with nonionic surfactants being preferred.
Examples of surfactants include surfactants described in paragraph 0017 of Japanese Patent No. 4502784 and paragraphs 0060 to 0071 of JP-A-2009-237362.
フッ素系界面活性剤の市販品としては、例えば、メガファック(商品名)F-171、F-172、F-173、F-176、F-177、F-141、F-142、F-143、F-144、F-437、F-444、F-475、F-477、F-479、F-482、F-551-A、F-552、F-554、F-555-A、F-556、F-557、F-558、F-559、F-560、F-561、F-565、F-563、F-568、F-575、F-780、EXP.MFS-578-2、EXP.MFS-579、EXP.MFS-586、EXP.MFS-587、EXP.MFS-628、EXP.MFS-631、EXP.MFS-603、R-41、R-41-LM、R-01、R-40、R-40-LM、RS-43、TF-1956、RS-90、R-94、RS-72-K、DS-21(以上、DIC(株)製)、フロラード(商品名)FC430、FC431、FC171(以上、住友スリーエム(株)製)、サーフロン(商品名)S-382、SC-101、SC-103、SC-104、SC-105、SC-1068、SC-381、SC-383、S-393、KH-40(以上、AGC(株)製)、PolyFox(商品名)PF636、PF656、PF6320、PF6520、PF7002(以上、OMNOVA社製)、フタージェント 710FL、710FM、610FM、601AD、601ADH2、602A、215M、245F、251、212M、250、209F、222F、208G、710LA、710FS、730LM、650AC、681、683(以上、(株)NEOS製)、U-120E(ユニケム(株)製)等が挙げられる。
また、フッ素系界面活性剤は、フッ素原子を含有する官能基を持つ分子構造を有し、熱を加えるとフッ素原子を含有する官能基の部分が切断されてフッ素原子が揮発するアクリル系化合物も好適に使用できる。このようなフッ素系界面活性剤としては、DIC(株)製のメガファック(商品名)DSシリーズ(化学工業日報(2016年2月22日)、日経産業新聞(2016年2月23日))、例えばメガファック(商品名)DS-21が挙げられる。 As the surfactant, a fluorine-based surfactant or a silicone-based surfactant is preferable.
Examples of commercially available fluorosurfactants include Megafac (trade name) F-171, F-172, F-173, F-176, F-177, F-141, F-142, and F-143. , F-144, F-437, F-444, F-475, F-477, F-479, F-482, F-551-A, F-552, F-554, F-555-A, F -556, F-557, F-558, F-559, F-560, F-561, F-565, F-563, F-568, F-575, F-780, EXP. MFS-578-2, EXP. MFS-579, EXP. MFS-586, EXP. MFS-587, EXP. MFS-628, EXP. MFS-631, EXP. MFS-603, R-41, R-41-LM, R-01, R-40, R-40-LM, RS-43, TF-1956, RS-90, R-94, RS-72-K, DS-21 (manufactured by DIC Corporation), Florard (trade names) FC430, FC431, FC171 (manufactured by Sumitomo 3M Limited), Surflon (trade names) S-382, SC-101, SC-103 , SC-104, SC-105, SC-1068, SC-381, SC-383, S-393, KH-40 (manufactured by AGC Co., Ltd.), PolyFox (trade name) PF636, PF656, PF6320, PF6520 , PF7002 (manufactured by OMNOVA), Futergent 710FL, 710FM, 610FM, 601AD, 601ADH2, 602A, 215M, 245F, 251, 212M, 250, 209F, 222F, 208G, 710LA, 710FS, 730LM, 650AC, 681, 683 (manufactured by NEOS Corporation), U-120E (manufactured by Unichem Corporation) and the like.
In addition, fluorine-based surfactants have a molecular structure with a functional group containing a fluorine atom, and when heat is applied, the portion of the functional group containing a fluorine atom is cleaved and the fluorine atom volatilizes. It can be used preferably. As such a fluorosurfactant, Megafac (trade name) DS series manufactured by DIC Corporation (Chemical Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)) , for example, Megafac (trade name) DS-21.
フッ素系界面活性剤は、ブロックポリマーを用いることもできる。フッ素系界面活性剤は、フッ素原子を有する(メタ)アクリレート化合物に由来する構成単位と、アルキレンオキシ基(好ましくはエチレンオキシ基、プロピレンオキシ基)を2以上(好ましくは5以上)有する(メタ)アクリレート化合物に由来する構成単位と、を含む含フッ素高分子化合物も好ましく用いることができる。
フッ素系界面活性剤は、エチレン性不飽和基を側鎖に有する含フッ素重合体を用いることもできる。メガファック(商品名)RS-101、RS-102、RS-718K、RS-72-K(以上、DIC(株)製)等が挙げられる。 It is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound as the fluorosurfactant.
A block polymer can also be used as the fluorosurfactant. The fluorosurfactant has 2 or more (preferably 5 or more) structural units derived from a (meth)acrylate compound having a fluorine atom and an alkyleneoxy group (preferably an ethyleneoxy group and a propyleneoxy group) (meta). A fluorine-containing polymer compound containing structural units derived from an acrylate compound can also be preferably used.
A fluoropolymer having an ethylenically unsaturated group in a side chain can also be used as the fluorosurfactant. Megafac (trade name) RS-101, RS-102, RS-718K, RS-72-K (manufactured by DIC Corporation) and the like.
また、近年、炭素数が7以上の直鎖状パーフルオロアルキル基を有する化合物は、環境適性が懸念されるため、パーフルオロオクタン酸(PFOA)、及び、パーフルオロオクタンスルホン酸(PFOS)の代替材料を使用した界面活性剤を用いることが好ましい。 Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane and their ethoxylates and propoxylates (e.g., glycerol propoxylate, glycerol ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene stearyl ether, Polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic (trade name) L10, L31, L61, L62, 10R5, 17R2 , 25R2 (manufactured by BASF), Tetronic (trade name) 304, 701, 704, 901, 904, 150R1, HYDROPALAT WE 3323 (manufactured by BASF), Solsperse (trade name) 20000 (manufactured by Nippon Lubri Zol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.), Pionin (trade name) D-1105, D-6112, D-6112-W , D-6315 (manufactured by Takemoto Oil & Fat Co., Ltd.), OLFINE E1010, Surfynol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.) and the like.
In recent years, compounds having linear perfluoroalkyl groups with 7 or more carbon atoms are concerned about their environmental suitability. It is preferred to use surfactants using materials.
シリコーン系界面活性剤の具体例としては、EXP.S-309-2、EXP.S-315、EXP.S-503-2、EXP.S-505-2(以上、DIC(株)製)、DOWSIL(商品名)8032 ADDITIVE、トーレシリコーンDC3PA、トーレシリコーンSH7PA、トーレシリコーンDC11PA、トーレシリコーンSH21PA、トーレシリコーンSH28PA、トーレシリコーンSH29PA、トーレシリコーンSH30PA、トーレシリコーンSH8400(以上、東レ・ダウコーニング(株)製)並びに、X-22-4952、X-22-4272、X-22-6266、KF-351A、K354L、KF-355A、KF-945、KF-640、KF-642、KF-643、X-22-6191、X-22-4515、KF-6004、KP-341、KF-6001、KF-6002、KP-101、KP-103、KP-104、KP-105、KP-106、KP-109、KP-109、KP-112、KP-120、KP-121、KP-124、KP-125、KP-301、KP-306、KP-310、KP-322、KP-323、KP-327、KP-341、KP-368、KP-369、KP-611、KP-620、KP-621、KP-626、KP-652(以上、信越化学工業(株)製)、F-4440、TSF-4300、TSF-4445、TSF-4460、TSF-4452(以上、モメンティブ・パフォーマンス・マテリアルズ社製)、BYK300、BYK306、BYK307、BYK310、BYK320、BYK323、BYK325、BYK330、BYK313、BYK315N、BYK331、BYK333、BYK345、BYK347、BYK348、BYK349、BYK370、BYK377、BYK378、BYK323(以上、ビックケミー社製)等が挙げられる。 Examples of silicone-based surfactants include linear polymers composed of siloxane bonds, and modified siloxane polymers in which organic groups are introduced into side chains or terminals.
Specific examples of silicone surfactants include EXP. S-309-2, EXP. S-315, EXP. S-503-2, EXP. S-505-2 (manufactured by DIC Corporation), DOWSIL (trade name) 8032 ADDITIVE, Toray Silicone DC3PA, Toray Silicone SH7PA, Toray Silicone DC11PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA , Toray Silicone SH8400 (manufactured by Dow Corning Toray Co., Ltd.) and X-22-4952, X-22-4272, X-22-6266, KF-351A, K354L, KF-355A, KF-945, KF-640, KF-642, KF-643, X-22-6191, X-22-4515, KF-6004, KP-341, KF-6001, KF-6002, KP-101, KP-103, KP- 104, KP-105, KP-106, KP-109, KP-109, KP-112, KP-120, KP-121, KP-124, KP-125, KP-301, KP-306, KP-310, KP-322, KP-323, KP-327, KP-341, KP-368, KP-369, KP-611, KP-620, KP-621, KP-626, KP-652 (Shin-Etsu Chemical ( Co.), F-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (manufactured by Momentive Performance Materials), BYK300, BYK306, BYK307, BYK310, BYK320, BYK323, BYK325 , BYK330, BYK313, BYK315N, BYK331, BYK333, BYK345, BYK347, BYK348, BYK349, BYK370, BYK377, BYK378, BYK323 (manufactured by BYK-Chemie) and the like.
界面活性剤の含有量は、感光性層の全質量に対し、0.001質量%~10質量%が好ましく、0.01質量%~3質量%がより好ましい。 The photosensitive layer may contain one type of surfactant alone, or two or more types thereof.
The content of the surfactant is preferably 0.001% by mass to 10% by mass, more preferably 0.01% by mass to 3% by mass, relative to the total mass of the photosensitive layer.
感光性層は、上記成分以外に、必要に応じて公知の添加剤を含有してもよい。
添加剤としては、例えば、重合禁止剤、増感剤、可塑剤、ヘテロ環状化合物、ベンゾトリアゾール類、カルボキシベンゾトリアゾール類、ピリジン類(イソニコチンアミド等)、プリン塩基(アデニン等)、及び、溶剤が挙げられる。感光性層は、各添加剤を1種単独で含有してもよいし、2種以上を含有してもよい。 -Additive-
The photosensitive layer may contain known additives, if necessary, in addition to the above components.
Examples of additives include polymerization inhibitors, sensitizers, plasticizers, heterocyclic compounds, benzotriazoles, carboxybenzotriazoles, pyridines (isonicotinamide, etc.), purine bases (adenine, etc.), and solvents. is mentioned. The photosensitive layer may contain each additive singly or in combination of two or more.
重合禁止剤としては、例えば、特許第4502784号公報の段落0018に記載された熱重合防止剤が挙げられる。中でも、フェノチアジン、フェノキサジン又は4-メトキシフェノールが好ましい。その他の重合禁止剤としては、ナフチルアミン、塩化第一銅、ニトロソフェニルヒドロキシアミンアルミニウム塩、ジフェニルニトロソアミン等が挙げられる。感光性樹脂組成物の感度を損なわないために、ニトロソフェニルヒドロキシアミンアルミニウム塩を重合禁止剤として使用することが好ましい。 The photosensitive layer may contain a polymerization inhibitor. As the polymerization inhibitor, a radical polymerization inhibitor is preferred.
Examples of polymerization inhibitors include thermal polymerization inhibitors described in paragraph 0018 of Japanese Patent No. 4502784 . Among them, phenothiazine, phenoxazine and 4-methoxyphenol are preferred. Other polymerization inhibitors include naphthylamine, cuprous chloride, nitrosophenylhydroxyamine aluminum salt, diphenylnitrosamine and the like. In order not to impair the sensitivity of the photosensitive resin composition, it is preferred to use a nitrosophenylhydroxyamine aluminum salt as a polymerization inhibitor.
増感剤は、特に制限されず、公知の増感剤、染料及び顔料を用いることができる。増感剤としては、例えば、ジアルキルアミノベンゾフェノン化合物、ピラゾリン化合物、アントラセン化合物、クマリン化合物、キサントン化合物、チオキサントン化合物、アクリドン化合物、オキサゾール化合物、ベンゾオキサゾール化合物、チアゾール化合物、ベンゾチアゾール化合物、トリアゾール化合物(例えば、1,2,4-トリアゾール)、スチルベン化合物、トリアジン化合物、チオフェン化合物、ナフタルイミド化合物、トリアリールアミン化合物、及び、アミノアクリジン化合物が挙げられる。 The photosensitive layer may contain a sensitizer.
The sensitizer is not particularly limited, and known sensitizers, dyes and pigments can be used. Sensitizers include, for example, dialkylaminobenzophenone compounds, pyrazoline compounds, anthracene compounds, coumarin compounds, xanthone compounds, thioxanthone compounds, acridone compounds, oxazole compounds, benzoxazole compounds, thiazole compounds, benzothiazole compounds, and triazole compounds (e.g., 1,2,4-triazole), stilbene compounds, triazine compounds, thiophene compounds, naphthalimide compounds, triarylamine compounds, and aminoacridine compounds.
感光性層が増感剤を含有する場合、増感剤の含有量は、目的により適宜選択できるが、光源に対する感度の向上、及び、重合速度と連鎖移動のバランスによる硬化速度の向上の観点から、感光性層の全質量に対して、0.01質量%~5質量%が好ましく、0.05質量%~1質量%がより好ましい。 The photosensitive layer may contain one type of sensitizer alone, or may contain two or more types.
When the photosensitive layer contains a sensitizer, the content of the sensitizer can be appropriately selected depending on the purpose, but from the viewpoint of improving the sensitivity to the light source and improving the curing speed due to the balance between the polymerization speed and the chain transfer. , preferably 0.01% by mass to 5% by mass, more preferably 0.05% by mass to 1% by mass, based on the total mass of the photosensitive layer.
可塑剤及びヘテロ環状化合物としては、国際公開第2018/179640号の段落0097~0103及び0111~0118に記載された化合物が挙げられる。 The photosensitive layer may contain at least one selected from the group consisting of plasticizers and heterocyclic compounds.
Plasticizers and heterocyclic compounds include compounds described in paragraphs 0097-0103 and 0111-0118 of WO2018/179640.
感光性層に含有される添加剤については特開2014-85643号公報の段落0165~0184に記載されており、この公報の内容は本明細書に組み込まれる。 The photosensitive layer contains metal oxide particles, antioxidants, dispersants, acid multipliers, development accelerators, conductive fibers, thermal radical polymerization initiators, thermal acid generators, ultraviolet absorbers, thickeners, It may further contain known additives such as cross-linking agents and organic or inorganic suspending agents.
Additives contained in the photosensitive layer are described in paragraphs 0165 to 0184 of JP-A-2014-85643, and the contents of this publication are incorporated herein.
感光性層は、所定量の不純物を含んでいてもよい。
不純物の具体例としては、ナトリウム、カリウム、マグネシウム、カルシウム、鉄、マンガン、銅、アルミニウム、チタン、クロム、コバルト、ニッケル、亜鉛、スズ、ハロゲン及びこれらのイオンが挙げられる。中でも、ハロゲン化物イオン、ナトリウムイオン、及びカリウムイオンは不純物として混入し易いため、下記の含有量にすることが好ましい。 <<impurities, etc.>>
The photosensitive layer may contain a certain amount of impurities.
Specific examples of impurities include sodium, potassium, magnesium, calcium, iron, manganese, copper, aluminum, titanium, chromium, cobalt, nickel, zinc, tin, halogens and ions thereof. Among them, halide ions, sodium ions, and potassium ions are likely to be mixed as impurities, so the following contents are preferable.
下限は、質量基準で、感光性層の全質量に対して、10ppb以上とすることができ、100ppb以上とすることができる。これら化合物は、上記の金属の不純物と同様の方法で含有量を抑制できる。また、公知の測定法により定量できる。 The content of compounds such as benzene, formaldehyde, trichlorethylene, 1,3-butadiene, carbon tetrachloride, chloroform, N,N-dimethylformamide, N,N-dimethylacetamide, and hexane in the photosensitive layer should be small. preferable. The content of these compounds with respect to the total mass of the photosensitive layer is preferably 100 ppm or less, more preferably 20 ppm or less, and even more preferably 4 ppm or less, based on mass.
The lower limit can be 10 ppb or more, and can be 100 ppb or more based on the total weight of the photosensitive layer. The content of these compounds can be suppressed in the same manner as the metal impurities described above. Moreover, it can quantify by a well-known measuring method.
感光性層は、上述したアルカリ可溶性樹脂の各構成単位に対応する残存モノマーを含む場合がある。
残存モノマーの含有量は、パターニング性、及び、信頼性の点から、アルカリ可溶性樹脂全質量に対して、5,000質量ppm以下が好ましく、2,000質量ppm以下がより好ましく、500質量ppm以下が更に好ましい。下限は特に制限されないが、1質量ppm以上が好ましく、10質量ppm以上がより好ましい。
アルカリ可溶性樹脂の各構成単位の残存モノマーは、パターニング性、及び、信頼性の点から、感光性層の全質量に対して、3,000質量ppm以下が好ましく、600質量ppm以下がより好ましく、100質量ppm以下が更に好ましい。下限は特に制限されないが、0.1質量ppm以上が好ましく、1質量ppm以上がより好ましい。 <<Residual monomer>>
The photosensitive layer may contain residual monomers corresponding to the constituent units of the alkali-soluble resin described above.
The content of the residual monomer is preferably 5,000 ppm by mass or less, more preferably 2,000 ppm by mass or less, and 500 ppm by mass or less, relative to the total mass of the alkali-soluble resin, from the viewpoints of patterning properties and reliability. is more preferred. Although the lower limit is not particularly limited, it is preferably 1 mass ppm or more, more preferably 10 mass ppm or more.
The residual monomer of each structural unit of the alkali-soluble resin is preferably 3,000 ppm by mass or less, more preferably 600 ppm by mass or less, relative to the total mass of the photosensitive layer, from the viewpoints of patterning properties and reliability. 100 mass ppm or less is more preferable. Although the lower limit is not particularly limited, it is preferably 0.1 mass ppm or more, more preferably 1 mass ppm or more.
残存モノマーの量は、液体クロマトグラフィー、及び、ガスクロマトグラフィー等の公知の方法で測定できる。 It is preferable that the amount of residual monomers when synthesizing an alkali-soluble resin by a polymer reaction is also within the above range. For example, when synthesizing an alkali-soluble resin by reacting a carboxylic acid side chain with glycidyl acrylate, the content of glycidyl acrylate is preferably within the above range.
The amount of residual monomers can be measured by known methods such as liquid chromatography and gas chromatography.
感光性層の層厚は、0.1μm~300μmが好ましく、0.2μm~100μmがより好ましく、0.5μm~50μmが更に好ましく、0.5μm~15μmがより更に好ましく、0.5μm~10μmが特に好ましく、0.5μm~8μmが最も好ましい。これにより、感光性層の現像性が向上し、解像性を向上させることができる。
また、感光性層の層厚(厚さ)は、解像性、及び、本開示における効果をより発揮する観点から、10μm以下であることが好ましく、5.0μm以下であることがより好ましく、0.5μm~4.0μmであることが更に好ましく、0.5μm~3.0μmが特に好ましい。
感光性転写材料又は積層体が備える各層の層厚は、感光性転写材料の主面に対し垂直な方向の断面を走査型電子顕微鏡(SEM:Scanning Electron Microscope)により観察し、得られた観察画像に基づいて各層の厚さを10点以上計測し、その平均値を算出することにより、測定される。 <<physical properties>>
The layer thickness of the photosensitive layer is preferably 0.1 μm to 300 μm, more preferably 0.2 μm to 100 μm, still more preferably 0.5 μm to 50 μm, still more preferably 0.5 μm to 15 μm, and 0.5 μm to 10 μm. Particularly preferred, 0.5 μm to 8 μm is most preferred. Thereby, the developability of the photosensitive layer is improved, and the resolution can be improved.
In addition, the layer thickness (thickness) of the photosensitive layer is preferably 10 μm or less, more preferably 5.0 μm or less, from the viewpoint of exhibiting the resolution and the effects of the present disclosure. It is more preferably 0.5 μm to 4.0 μm, particularly preferably 0.5 μm to 3.0 μm.
The layer thickness of each layer provided in the photosensitive transfer material or laminate is an observation image obtained by observing a cross section in a direction perpendicular to the main surface of the photosensitive transfer material with a scanning electron microscope (SEM). It is measured by measuring the thickness of each layer at 10 or more points based on and calculating the average value.
感光性層の形成方法は、上記の成分を含有する層を形成可能な方法であれば特に制限されない。
感光性層の形成方法としては、例えば、アルカリ可溶性樹脂、重合性化合物、光重合開始剤及び溶剤等を含有する感光性樹脂組成物を調製し、仮支持体等の表面に感光性樹脂組成物を塗布し、感光性樹脂組成物の塗膜を乾燥することにより形成する方法が挙げられる。 <<Method of Formation>>
The method for forming the photosensitive layer is not particularly limited as long as it is a method capable of forming a layer containing the above components.
As a method for forming the photosensitive layer, for example, a photosensitive resin composition containing an alkali-soluble resin, a polymerizable compound, a photopolymerization initiator, a solvent, etc. is prepared, and the photosensitive resin composition is applied to the surface of a temporary support or the like. and drying the coating film of the photosensitive resin composition.
感光性樹脂組成物は、感光性樹脂組成物の粘度を調節し、感光性層の形成を容易にするため、溶剤を含有することが好ましい。 The photosensitive resin composition used for forming the photosensitive layer includes, for example, a composition containing an alkali-soluble resin, a polymerizable compound, a photopolymerization initiator, any of the above optional components, and a solvent.
The photosensitive resin composition preferably contains a solvent in order to adjust the viscosity of the photosensitive resin composition and facilitate the formation of the photosensitive layer.
感光性樹脂組成物に含有される溶剤としては、アルカリ可溶性樹脂、重合性化合物、光重合開始剤及び上記の任意成分を溶解又は分散可能であれば特に制限されず、公知の溶剤を使用できる。
溶剤としては、例えば、アルキレングリコールエーテル溶剤、アルキレングリコールエーテルアセテート溶剤、アルコール溶剤(メタノール及びエタノール等)、ケトン溶剤(アセトン及びメチルエチルケトン等)、芳香族炭化水素溶剤(トルエン等)、非プロトン性極性溶剤(N,N-ジメチルホルムアミド等)、環状エーテル溶剤(テトラヒドロフラン等)、エステル溶剤、アミド溶剤、ラクトン溶剤、並びにこれらの2種以上を含む混合溶剤が挙げられる。
仮支持体、熱可塑性樹脂層、水溶性樹脂層、感光性層及び保護フィルムを備える感光性転写材料を作製する場合、感光性樹脂組成物は、アルキレングリコールエーテル溶剤及びアルキレングリコールエーテルアセテート溶剤よりなる群から選択される少なくとも1種を含有することが好ましい。中でも、アルキレングリコールエーテル溶剤及びアルキレングリコールエーテルアセテート溶剤よりなる群から選択される少なくとも1種と、ケトン溶剤及び環状エーテル溶剤よりなる群から選択される少なくとも1種とを含む混合溶剤がより好ましく、アルキレングリコールエーテル溶剤及びアルキレングリコールエーテルアセテート溶剤よりなる群から選択される少なくとも1種、ケトン溶剤、並びに環状エーテル溶剤の3種を少なくとも含む混合溶剤が更に好ましい。 -solvent-
The solvent contained in the photosensitive resin composition is not particularly limited as long as it can dissolve or disperse the alkali-soluble resin, the polymerizable compound, the photopolymerization initiator and the above optional components, and known solvents can be used.
Examples of solvents include alkylene glycol ether solvents, alkylene glycol ether acetate solvents, alcohol solvents (methanol, ethanol, etc.), ketone solvents (acetone, methyl ethyl ketone, etc.), aromatic hydrocarbon solvents (toluene, etc.), aprotic polar solvents. (N,N-dimethylformamide, etc.), cyclic ether solvents (tetrahydrofuran, etc.), ester solvents, amide solvents, lactone solvents, and mixed solvents containing two or more of these.
When producing a photosensitive transfer material comprising a temporary support, a thermoplastic resin layer, a water-soluble resin layer, a photosensitive layer and a protective film, the photosensitive resin composition consists of an alkylene glycol ether solvent and an alkylene glycol ether acetate solvent. It is preferable to contain at least one selected from the group. Among them, a mixed solvent containing at least one selected from the group consisting of alkylene glycol ether solvents and alkylene glycol ether acetate solvents and at least one selected from the group consisting of ketone solvents and cyclic ether solvents is more preferable. A mixed solvent containing at least one selected from the group consisting of a glycol ether solvent and an alkylene glycol ether acetate solvent, a ketone solvent, and a cyclic ether solvent is more preferable.
アルキレングリコールエーテルアセテート溶剤としては、例えば、エチレングリコールモノアルキルエーテルアセテート、プロピレングリコールモノアルキルエーテルアセテート、ジエチレングリコールモノアルキルエーテルアセテート及びジプロピレングリコールモノアルキルエーテルアセテートが挙げられる。
溶剤としては、国際公開第2018/179640号の段落0092~0094に記載された溶剤、及び、特開2018-177889公報の段落0014に記載された溶剤を用いてもよく、これらの内容は本明細書に組み込まれる。 Alkylene glycol ether solvents include, for example, ethylene glycol monoalkyl ether, ethylene glycol dialkyl ether, propylene glycol monoalkyl ether, propylene glycol dialkyl ether, diethylene glycol dialkyl ether, dipropylene glycol monoalkyl ether and dipropylene glycol dialkyl ether. .
Alkylene glycol ether acetate solvents include, for example, ethylene glycol monoalkyl ether acetate, propylene glycol monoalkyl ether acetate, diethylene glycol monoalkyl ether acetate and dipropylene glycol monoalkyl ether acetate.
As the solvent, the solvent described in paragraphs 0092 to 0094 of WO 2018/179640, and the solvent described in paragraph 0014 of JP 2018-177889 may be used, the contents of which are herein incorporated into the book.
感光性樹脂組成物を塗布する際における溶剤の含有量は、感光性樹脂組成物中の全固形分100質量部に対し、50質量部~1,900質量部が好ましく、100質量部~900質量部がより好ましい。 The photosensitive resin composition may contain one type of solvent alone, or may contain two or more types.
The content of the solvent when applying the photosensitive resin composition is preferably 50 parts by mass to 1,900 parts by mass, and 100 parts by mass to 900 parts by mass with respect to 100 parts by mass of the total solid content in the photosensitive resin composition. part is more preferred.
Yμm以上の粒子の除去性の観点から、感光性樹脂組成物は、感光性層を形成する前に、フィルターを用いてろ過することが好ましく、孔径0.2μm~10μmのフィルターを用いてろ過することがより好ましく、孔径0.2μm~7μmのフィルターを用いてろ過することが更に好ましく、孔径0.2μm~5μmのフィルターを用いてろ過することが特に好ましい。
フィルターの材質及び形状については、特に制限はなく、公知のものを用いることができる。
また、上記ろ過は、1回以上行うことが好ましく、また、複数回行うことも好ましい。 The method of preparing the photosensitive resin composition is not particularly limited, for example, by preparing a solution in which each component is dissolved in the solvent in advance and mixing the obtained solution in a predetermined ratio, the photosensitive resin composition and a method for preparing the
From the viewpoint of removability of particles of Y μm or more, the photosensitive resin composition is preferably filtered using a filter before forming the photosensitive layer, and filtered using a filter with a pore size of 0.2 μm to 10 μm. Filtration using a filter with a pore size of 0.2 µm to 7 µm is more preferred, and filtering using a filter with a pore size of 0.2 µm to 5 µm is particularly preferred.
The material and shape of the filter are not particularly limited, and known filters can be used.
Moreover, it is preferable to perform said filtration once or more, and it is also preferable to perform multiple times.
また、感光性層は、感光性樹脂組成物を後述する保護フィルム上に塗布し、乾燥することにより形成してもよい。 The method of applying the photosensitive resin composition is not particularly limited, and a known method may be used. Examples of coating methods include slit coating, spin coating, curtain coating, and inkjet coating.
Also, the photosensitive layer may be formed by applying a photosensitive resin composition onto a protective film described later and drying the composition.
他の層としては、水溶性樹脂層、熱可塑性樹脂層、保護フィルム等が好ましく挙げられる。
中でも、上記転写層として、水溶性樹脂層を有することが好ましく、熱可塑性樹脂層、及び、水溶性樹脂層を有することがより好ましい。 In addition, the photosensitive transfer material in the present disclosure preferably has another layer between the temporary support and the photosensitive layer from the viewpoint of resolution and peelability of the temporary support.
Other layers preferably include a water-soluble resin layer, a thermoplastic resin layer, a protective film, and the like.
Among them, the transfer layer preferably has a water-soluble resin layer, and more preferably has a thermoplastic resin layer and a water-soluble resin layer.
感光性転写材料は、仮支持体と感光性層との間、後述する熱可塑性樹脂層を有する場合は、熱可塑性樹脂層と感光性層との間に、水溶性樹脂層を有することが好ましい。水溶性樹脂層によれば、複数の層を形成する際、及び保存の際における成分の混合を抑制できる。 [Water-soluble resin layer]
When the photosensitive transfer material has a thermoplastic resin layer described later between the temporary support and the photosensitive layer, it preferably has a water-soluble resin layer between the thermoplastic resin layer and the photosensitive layer. . According to the water-soluble resin layer, it is possible to suppress mixing of components when forming a plurality of layers and during storage.
また、水溶性樹脂層は、酸素遮断性、解像性、及び、パターン形成性の観点から、無機層状化合物を含むことが好ましい。
無機層状化合物としては、薄い平板状の形状を有する粒子であり、例えば、天然雲母、合成雲母等の雲母化合物、式:3MgO・4SiO・H2Oで表されるタルク、テニオライト、モンモリロナイト、サポナイト、ヘクトライト、リン酸ジルコニウム等が挙げられる。
雲母化合物としては、例えば、式:A(B,C)2-5D4O10(OH,F,O)2〔ただし、Aは、K、Na、Caのいずれか、B及びCは、Fe(II)、Fe(III)、Mn、Al、Mg、Vのいずれかであり、Dは、Si又はAlである。〕で表される天然雲母、合成雲母等の雲母群が挙げられる。 Examples of the water-soluble resin layer include an oxygen-blocking layer having an oxygen-blocking function, which is described as a "separation layer" in JP-A-5-72724. Since the water-soluble resin layer is an oxygen-blocking layer, the sensitivity during exposure is improved and the time load of the exposure machine is reduced, resulting in improved productivity. The oxygen barrier layer used as the water-soluble resin layer may be appropriately selected from known layers. The oxygen-blocking layer used as the water-soluble resin layer is preferably an oxygen-blocking layer that exhibits low oxygen permeability and is dispersed or dissolved in water or an alkaline aqueous solution (1% by mass aqueous solution of sodium carbonate at 22°C). .
In addition, the water-soluble resin layer preferably contains an inorganic stratiform compound from the viewpoints of oxygen blocking properties, resolution, and pattern formability.
Examples of the inorganic layered compound include particles having a thin tabular shape, and examples thereof include mica compounds such as natural mica and synthetic mica, talc represented by the formula: 3MgO.4SiO.H 2 O, taeniolite, montmorillonite, saponite, hectorite, zirconium phosphate, and the like.
Examples of mica compounds include compounds of the formula: A(B,C) 2-5 D 4 O 10 (OH,F,O) 2 [wherein A is any one of K, Na and Ca, and B and C are Fe(II), Fe(III), Mn, Al, Mg, or V, and D is Si or Al. ] and a group of mica such as natural mica and synthetic mica.
水溶性化合物としては、特に制限はないが、酸素遮断性、現像性、解像性、及び、パターン形成性の観点から、水溶性セルロース誘導体、多価アルコール類、多価アルコール類のオキサイド付加物、ポリエーテル類、フェノール誘導体、及び、アミド化合物よりなる群から選ばれる1種以上の化合物であることが好ましく、ポリビニルアルコール、ポリビニルピロリドン、ヒドロキシプロピルセルロース及びヒドロキシプロピルメチルセルロースよりなる群から選ばれる少なくとも1種の水溶性樹脂であることがより好ましい。
水溶性樹脂としては、例えば、水溶性セルロース誘導体、ポリビニルアルコール、ポリビニルピロリドン、アクリルアミド樹脂、(メタ)アクリレート樹脂、ポリエチレンオキサイド樹脂、ゼラチン、ビニルエーテル樹脂、ポリアミド樹脂、及びこれらの共重合体などの樹脂が挙げられる。
中でも、水溶性化合物は、酸素遮断性、現像性、解像性、及び、パターン形成性の観点から、ポリビニルアルコールを含むことが好ましく、ポリビニルアルコールであることがより好ましい。
ポリビニルアルコールの加水分解度は、特に制限はないが、酸素遮断性、現像性、解像性、及び、パターン形成性の観点から、73mol%~99mol%であることが好ましい。
また、ポリビニルアルコールは、酸素遮断性、現像性、解像性、及び、パターン形成性の観点から、エチレンをモノマーユニットとして含むことが好ましい。 In addition, the water-soluble resin layer preferably contains a water-soluble compound, and more preferably contains a water-soluble resin, from the viewpoints of oxygen barrier properties, developability, resolution, and pattern formability.
The water-soluble compound is not particularly limited, but from the viewpoint of oxygen blocking properties, developability, resolution, and pattern formation properties, water-soluble cellulose derivatives, polyhydric alcohols, and oxide adducts of polyhydric alcohols. , polyethers, phenol derivatives, and amide compounds, preferably at least one compound selected from the group consisting of polyvinyl alcohol, polyvinylpyrrolidone, hydroxypropylcellulose and hydroxypropylmethylcellulose More preferably, it is a kind of water-soluble resin.
Examples of water-soluble resins include resins such as water-soluble cellulose derivatives, polyvinyl alcohol, polyvinylpyrrolidone, acrylamide resins, (meth)acrylate resins, polyethylene oxide resins, gelatin, vinyl ether resins, polyamide resins, and copolymers thereof. mentioned.
Among them, the water-soluble compound preferably contains polyvinyl alcohol, more preferably polyvinyl alcohol, from the viewpoint of oxygen barrier properties, developability, resolution, and pattern formability.
The degree of hydrolysis of polyvinyl alcohol is not particularly limited, but is preferably 73 mol % to 99 mol % from the viewpoints of oxygen blocking properties, developability, resolution, and pattern formability.
Moreover, polyvinyl alcohol preferably contains ethylene as a monomer unit from the viewpoint of oxygen blocking properties, developability, resolution, and pattern formability.
本開示に用いられる感光性転写材料は、熱可塑性樹脂層を有してもよい。感光性転写材料は、仮支持体と感光性層との間に熱可塑性樹脂層を有することが好ましい。感光性転写材料が仮支持体と感光性層との間に熱可塑性樹脂層を有することで、被着物への追従性が向上して、被着物と感光性転写材料との間の気泡の混入が抑制される結果、層間の密着性が向上するためである。 [Thermoplastic resin layer]
The photosensitive transfer material used in the present disclosure may have a thermoplastic resin layer. The photosensitive transfer material preferably has a thermoplastic resin layer between the temporary support and the photosensitive layer. Since the photosensitive transfer material has a thermoplastic resin layer between the temporary support and the photosensitive layer, the followability to the adherend is improved, and air bubbles are not mixed between the adherend and the photosensitive transfer material. This is because the adhesion between the layers is improved as a result of the suppression of the
感光性転写材料は、保護フィルムを有する。
なお、保護フィルムは、上記転写層には含まれない。
感光性層と保護フィルムとは、直接接していることが好ましい。 〔Protective film〕
A photosensitive transfer material has a protective film.
Note that the protective film is not included in the transfer layer.
It is preferable that the photosensitive layer and the protective film are in direct contact with each other.
樹脂フィルムとしては、ポリエチレンフィルム、ポリプロピレンフィルム、ポリエチレンテレフタレートフィルム、トリ酢酸セルロースフィルム、ポリスチレンフィルム、及び、ポリカーボネートフィルムが挙げられる。中でも、ポリエチレンフィルム、ポリプロピレンフィルム、又は、ポリエチレンテレフタレートフィルムが好ましい。 Materials constituting the protective film include resin films and paper, and resin films are preferable from the viewpoint of strength and flexibility.
Resin films include polyethylene films, polypropylene films, polyethylene terephthalate films, cellulose triacetate films, polystyrene films, and polycarbonate films. Among them, polyethylene film, polypropylene film, or polyethylene terephthalate film is preferable.
保護フィルムにおける上記感光性層側とは反対側の面の算術平均粗さRaは、搬送性、樹脂パターンの欠陥抑制性、及び、解像性の観点から、保護フィルムにおける上記感光性層側の面の算術平均粗さRa以下であることが好ましく、保護フィルムにおける上記感光性層側の面の算術平均粗さRaより小さいことがより好ましい。
保護フィルムにおける上記感光性層側とは反対側の面の算術平均粗さRaは、搬送性及び巻き取り性の観点から、300nm以下が好ましく、100nm以下がより好ましく、70nm以下が更に好ましく、50nm以下であることが特に好ましい。
また、保護フィルムにおける上記感光性層側の面の算術平均粗さRaは、解像性により優れる点から、300nm以下が好ましく、100nm以下がより好ましく、70nm以下が更に好ましく、50nm以下であることが特に好ましい。保護フィルムの表面のRa値が上記範囲であることにより、感光性層及び形成される樹脂パターンの層厚の均一性が向上するためと考えられる。
保護フィルムの表面のRa値の下限は、特に制限されないが、両面ともそれぞれ、1nm以上が好ましく、10nm以上がより好ましく、20nm以上が特に好ましい。
また、保護フィルムの剥離力は、仮支持体の剥離力よりも小さいことが好ましい。 The thickness (layer thickness) of the protective film is not particularly limited, but is preferably 5 μm to 100 μm, more preferably 10 μm to 50 μm.
The arithmetic mean roughness Ra of the surface of the protective film opposite to the photosensitive layer side is the same as that of the photosensitive layer side of the protective film, from the viewpoints of transportability, resin pattern defect suppression, and resolution. It is preferably less than the arithmetic mean roughness Ra of the surface, and more preferably smaller than the arithmetic mean roughness Ra of the surface of the protective film on the photosensitive layer side.
The arithmetic mean roughness Ra of the surface of the protective film opposite to the photosensitive layer side is preferably 300 nm or less, more preferably 100 nm or less, still more preferably 70 nm or less, and 50 nm, from the viewpoint of transportability and winding properties. The following are particularly preferred.
In addition, the arithmetic mean roughness Ra of the surface on the photosensitive layer side of the protective film is preferably 300 nm or less, more preferably 100 nm or less, even more preferably 70 nm or less, and 50 nm or less from the viewpoint of better resolution. is particularly preferred. It is considered that the thickness uniformity of the photosensitive layer and the formed resin pattern is improved when the Ra value of the surface of the protective film is within the above range.
Although the lower limit of the Ra value on the surface of the protective film is not particularly limited, it is preferably 1 nm or more, more preferably 10 nm or more, and particularly preferably 20 nm or more for both surfaces.
Moreover, the peeling force of the protective film is preferably smaller than the peeling force of the temporary support.
コントラストエンハンスメント層については、国際公開第2018/179640号の段落0134に記載されている。また、その他の層については特開2014-85643号公報の段落0194~0196に記載されている。これらの公報の内容は本明細書に組み込まれる。 The photosensitive transfer material may include layers other than the layers described above (hereinafter also referred to as "other layers"). Other layers include, for example, a contrast enhancement layer.
Contrast enhancement layers are described in paragraph 0134 of WO2018/179640. Other layers are described in paragraphs 0194 to 0196 of JP-A-2014-85643. The contents of these publications are incorporated herein.
感光性転写材料における仮支持体及び保護フィルムを除く各層の総厚みは、本開示における効果をより発揮する観点から、20μm以下であることが好ましく、10μm以下であることがより好ましく、8μm以下であることが更に好ましく、2μm以上8μm以下であることが特に好ましい。
また、感光性転写材料における感光性層、水溶性樹脂層及び熱可塑性樹脂層の総厚みは、本開示における効果をより発揮する観点から、20μm以下であることが好ましく、10μm以下であることがより好ましく、8μm以下であることが更に好ましく、2μm以上8μm以下であることが特に好ましい。 The total thickness of the photosensitive transfer material is preferably 5 μm to 55 μm, more preferably 10 μm to 50 μm, particularly preferably 20 μm to 40 μm. The total thickness of the photosensitive transfer material is measured according to the method for measuring the thickness of each layer described above.
The total thickness of each layer excluding the temporary support and the protective film in the photosensitive transfer material is preferably 20 μm or less, more preferably 10 μm or less, and 8 μm or less from the viewpoint of exhibiting the effects of the present disclosure. It is more preferable to be 2 μm or more, and particularly preferably 2 μm or more and 8 μm or less.
Further, the total thickness of the photosensitive layer, the water-soluble resin layer and the thermoplastic resin layer in the photosensitive transfer material is preferably 20 μm or less, more preferably 10 μm or less, from the viewpoint of exhibiting the effects of the present disclosure. It is more preferably 8 µm or less, and particularly preferably 2 µm or more and 8 µm or less.
本開示に用いられる感光性転写材料の製造方法は、特に制限されず、公知の製造方法、例えば、公知の各層の形成方法を用いることができる。
以下、図1を参照しながら、本開示に用いられる感光性転写材料の製造方法について説明する。但し、本開示に用いられる感光性転写材料は、図1に示す構成を有するものに制限されない。
図1は、本開示に用いられる感光性転写材料の一実施態様における層構成の一例を示す概略断面図である。図1に示す感光性転写材料20は、仮支持体11と、熱可塑性樹脂層13と、水溶性樹脂層15と、感光性層17と、保護フィルム19とがこの順に積層された構成を有する。また、図1における転写層12は、熱可塑性樹脂層13、水溶性樹脂層15、及び、感光性層17である。 [Method for producing photosensitive transfer material]
The method for producing the photosensitive transfer material used in the present disclosure is not particularly limited, and known production methods such as known methods for forming each layer can be used.
A method for manufacturing a photosensitive transfer material used in the present disclosure will be described below with reference to FIG. However, the photosensitive transfer material used in the present disclosure is not limited to those having the configuration shown in FIG.
FIG. 1 is a schematic cross-sectional view showing an example of a layer structure in one embodiment of a photosensitive transfer material used in the present disclosure. The
上記の製造方法において、アルキレングリコールエーテル溶剤及びアルキレングリコールエーテルアセテート溶剤よりなる群から選択される少なくとも1種を含有する熱可塑性樹脂組成物と、水及び水混和性の有機溶剤よりなる群から選択される少なくとも1種を含有する水溶性樹脂層組成物と、バインダーポリマー、エチレン性不飽和化合物、並びに、アルキレングリコールエーテル溶剤及びアルキレングリコールエーテルアセテート溶剤よりなる群から選択される少なくとも1種を含有する感光性樹脂組成物とを使用することが好ましい。これにより、熱可塑性樹脂層13の表面への水溶性樹脂層組成物の塗布、及び/又は、水溶性樹脂層組成物の塗膜を有する積層体の保存期間における、熱可塑性樹脂層13に含有される成分と水溶性樹脂層15に含有される成分との混合を抑制でき、なお且つ、水溶性樹脂層15の表面への感光性樹脂組成物の塗布、及び/又は、感光性樹脂組成物の塗膜を有する積層体の保存期間における、水溶性樹脂層15に含有される成分と感光性層16に含有される成分との混合を抑制できる。 As a method for producing the
In the above production method, a thermoplastic resin composition containing at least one selected from the group consisting of alkylene glycol ether solvents and alkylene glycol ether acetate solvents, and selected from the group consisting of water and water-miscible organic solvents and a binder polymer, an ethylenically unsaturated compound, and at least one selected from the group consisting of alkylene glycol ether solvents and alkylene glycol ether acetate solvents. It is preferable to use a flexible resin composition. As a result, the water-soluble resin layer composition is applied to the surface of the
本開示に用いられる感光性転写材料の製造方法としては、感光性層17の第2面に接するように保護フィルム19を設ける工程を含むことにより、仮支持体11、熱可塑性樹脂層13、水溶性樹脂層15、感光性層17及び保護フィルム19を備える感光性転写材料20を製造することが好ましい。
上記の製造方法により感光性転写材料20を製造した後、感光性転写材料20を巻き取ることにより、ロール形態の感光性転写材料を作製及び保管してもよい。ロール形態の感光性転写材料は、後述するロールツーロール方式での基板との貼り合わせ工程にそのままの形態で提供できる。 The
As a method for producing the photosensitive transfer material used in the present disclosure, by including the step of providing a
After manufacturing the
着色樹脂層の用途としては、上述した以外に、例えば、液晶表示装置(LCD)、並びに、固体撮像素子〔例えば、CCD(charge-coupled device)及びCMOS(complementary metal oxide semiconductor)〕に用いられるカラーフィルタ等の着色画素又はブラックマトリクスを形成する用途に好適である。
着色樹脂層における顔料以外の態様については、上述した態様と同様である。 Moreover, in the photosensitive transfer material used in the present disclosure, an aspect in which the photosensitive layer is a colored resin layer containing a pigment is also preferred.
Applications of the colored resin layer include, in addition to those described above, for example, liquid crystal display devices (LCD), and solid-state imaging devices [e.g., CCD (charge-coupled device) and CMOS (complementary metal oxide semiconductor)]. It is suitable for use in forming colored pixels such as filters or a black matrix.
Aspects other than the pigment in the colored resin layer are the same as those described above.
感光性層は、顔料を含む着色樹脂層となっていてもよい。
近年の電子機器が有する液晶表示窓には、液晶表示窓を保護するために、透明なガラス基板等の裏面周縁部に黒色の枠状遮光層が形成されたカバーガラスが取り付けられている場合がある。このような遮光層を形成するために着色樹脂層が使用し得る。
顔料としては、所望とする色相に合わせて適宜選択すればよく、黒色顔料、白色顔料、黒色及び白色以外の有彩色の顔料の中から選択できる。中でも、黒色系のパターンを形成する場合には、顔料として黒色顔料が好適に選択される。 <Pigment>
The photosensitive layer may be a colored resin layer containing a pigment.
In order to protect the liquid crystal display window of electronic equipment in recent years, there are cases where a cover glass with a black frame-shaped light-shielding layer formed on the periphery of the back surface of a transparent glass substrate or the like is attached to the liquid crystal display window. be. A colored resin layer may be used to form such a light shielding layer.
The pigment may be appropriately selected according to the desired hue, and may be selected from black pigments, white pigments, and chromatic pigments other than black and white. Among them, when forming a black pattern, a black pigment is preferably selected as the pigment.
ここで、粒径とは、電子顕微鏡で撮影した顔料粒子の写真像から顔料粒子の面積を求め、顔料粒子の面積と同面積の円を考えた場合の円の直径を指し、数平均粒径は、任意の100個の粒子について上記の粒径を求め、求められた100個の粒径を平均して得られる平均値である。 From the viewpoint of dispersion stability, the number average particle size of the black pigment is preferably 0.001 μm to 0.1 μm, more preferably 0.01 μm to 0.08 μm.
Here, the particle size refers to the diameter of a circle obtained by obtaining the area of a pigment particle from a photographic image of the pigment particle taken with an electron microscope and considering a circle having the same area as the area of the pigment particle. is an average value obtained by obtaining the above particle size for 100 arbitrary particles and averaging the obtained 100 particle sizes.
また、酸化チタンの表面は、シリカ処理、アルミナ処理、チタニア処理、ジルコニア処理、又は有機物処理が施されていてもよく、二つ以上の処理が施されてもよい。これにより、酸化チタンの触媒活性が抑制され、耐熱性及び褪光性等が改善される。
加熱後の感光性層の厚みを薄くする観点から、酸化チタンの表面への表面処理としては、アルミナ処理及びジルコニア処理の少なくとも一方が好ましく、アルミナ処理及びジルコニア処理の両方が特に好ましい。 White pigments described in paragraphs 0015 and 0114 of JP-A-2005-007765 can be used as pigments other than black pigments. Specifically, among white pigments, titanium oxide, zinc oxide, lithopone, light calcium carbonate, white carbon, aluminum oxide, aluminum hydroxide, or barium sulfate are preferable as inorganic pigments, and titanium oxide or zinc oxide is more preferable. Preferred, and more preferred is titanium oxide. As the inorganic pigment, rutile-type or anatase-type titanium oxide is more preferable, and rutile-type titanium oxide is particularly preferable.
In addition, the surface of titanium oxide may be subjected to silica treatment, alumina treatment, titania treatment, zirconia treatment, or organic substance treatment, or may be subjected to two or more treatments. As a result, the catalytic activity of titanium oxide is suppressed, and the heat resistance, fade resistance, and the like are improved.
From the viewpoint of reducing the thickness of the photosensitive layer after heating, the surface treatment of the titanium oxide surface is preferably at least one of alumina treatment and zirconia treatment, and particularly preferably both alumina treatment and zirconia treatment.
有彩色の顔料としては、例えば、ビクトリア・ピュアーブルーBO(Color Index(以下C.I.)42595)、オーラミン(C.I.41000)、ファット・ブラックHB(C.I.26150)、モノライト・エローGT(C.I.ピグメント・エロー12)、パーマネント・エローGR(C.I.ピグメント・エロー17)、パーマネント・エローHR(C.I.ピグメント・エロー83)、パーマネント・カーミンFBB(C.I.ピグメント・レッド146)、ホスターバームレッドESB(C.I.ピグメント・バイオレット19)、パーマネント・ルビーFBH(C.I.ピグメント・レッド11)、ファステル・ピンクBスプラ(C.I.ピグメント・レッド81)、モナストラル・ファースト・ブルー(C.I.ピグメント・ブルー15)、モノライト・ファースト・ブラックB(C.I.ピグメント・ブラック1)及びカーボン、C.I.ピグメント・レッド97、C.I.ピグメント・レッド122、C.I.ピグメント・レッド149、C.I.ピグメント・レッド168、C.I.ピグメント・レッド177、C.I.ピグメント・レッド180、C.I.ピグメント・レッド192、C.I.ピグメント・レッド215、C.I.ピグメント・グリーン7、C.I.ピグメント・ブルー15:1、C.I.ピグメント・ブルー15:4、C.I.ピグメント・ブルー22、C.I.ピグメント・ブルー60、C.I.ピグメント・ブルー64、及びC.I.ピグメント・バイオレット23等が挙げられる。中でも、C.I.ピグメント・レッド177が好ましい。 Moreover, when the photosensitive layer is a colored resin layer, from the viewpoint of transferability, the photosensitive layer preferably further contains a chromatic pigment other than the black pigment and the white pigment. When a chromatic pigment is included, the particle size of the chromatic pigment is preferably 0.1 μm or less, more preferably 0.08 μm or less, from the viewpoint of better dispersibility.
Examples of chromatic pigments include Victoria Pure Blue BO (Color Index (hereinafter C.I.) 42595), Auramine (C.I. 41000), Fat Black HB (C.I. 26150), and Monolite.・Yellow GT (C.I. Pigment Yellow 12), Permanent Yellow GR (C.I. Pigment Yellow 17), Permanent Yellow HR (C.I. Pigment Yellow 83), Permanent Carmine FBB (C) Pigment Red 146), Hoster Balm Red ESB (C.I. Pigment Violet 19), Permanent Ruby FBH (C.I. Pigment Red 11), Fastel Pink B Spra (C.I. Pigment Red 81), Monastral Fast Blue (C.I. Pigment Blue 15), Monolite Fast Black B (C.I. Pigment Black 1) and Carbon, C.I. I. Pigment Red 97, C.I. I. Pigment Red 122, C.I. I. Pigment Red 149, C.I. I. Pigment Red 168, C.I. I. Pigment Red 177, C.I. I. Pigment Red 180, C.I. I. Pigment Red 192, C.I. I. Pigment Red 215, C.I. I. Pigment Green 7, C.I. I. Pigment Blue 15:1, C.I. I. Pigment Blue 15:4, C.I. I. Pigment Blue 22, C.I. I. Pigment Blue 60, C.I. I. Pigment Blue 64, and C.I. I. Pigment Violet 23 and the like. Among them, C.I. I. Pigment Red 177 is preferred.
分散液は、黒色顔料と顔料分散剤とをあらかじめ混合して得られる混合物を、有機溶剤(又はビヒクル)に加えて分散機で分散させることによって調製されるものでもよい。顔料分散剤は、顔料及び溶剤に応じて選択すればよく、例えば市販の分散剤を使用することができる。なお、ビヒクルとは、顔料分散液とした場合に顔料を分散させている媒質の部分を指し、液状であり、黒色顔料を分散状態で保持するバインダー成分と、バインダー成分を溶解及び希釈する溶剤成分(有機溶剤)と、を含む。 In addition, when the photosensitive layer contains a black pigment and the photosensitive layer is formed of a photosensitive resin composition, the black pigment (preferably carbon black) is added to the photosensitive resin composition in the form of a pigment dispersion. preferably introduced.
The dispersion liquid may be prepared by adding a mixture obtained by previously mixing a black pigment and a pigment dispersant to an organic solvent (or vehicle) and dispersing the mixture with a dispersing machine. A pigment dispersant may be selected according to the pigment and solvent, and for example, a commercially available dispersant can be used. In addition, the vehicle refers to the part of the medium in which the pigment is dispersed when it is made into a pigment dispersion, and is a liquid binder component that holds the black pigment in a dispersed state, and a solvent component that dissolves and dilutes the binder component. (Organic solvent) and.
本開示に係る回路配線の製造方法は、本開示に係る積層体の製造方法により製造された積層体又は後述する本開示に係る感光性転写材料を用いる方法であれば、特に制限されない。
また、本開示に係る回路配線の製造方法は、本開示に係る積層体の製造方法により得られた積層体を準備する準備工程、及び、上記樹脂パターンが配置されていない領域における上記基板をエッチング処理するエッチング工程をこの順に含む方法が好ましい。
以下、回路配線の製造方法が含む各工程について説明するが、特に言及した場合を除き、積層体の製造方法に含まれる各工程について説明した内容は、回路配線の製造方法に含まれる各工程についても適用されるものとする。 (Method for manufacturing circuit wiring)
The method for producing circuit wiring according to the present disclosure is not particularly limited as long as it is a method using a laminate produced by the method for producing a laminate according to the present disclosure or a photosensitive transfer material according to the present disclosure, which will be described later.
Further, the method for manufacturing a circuit wiring according to the present disclosure includes a preparation step of preparing a laminate obtained by the method for manufacturing a laminate according to the present disclosure, and etching the substrate in a region where the resin pattern is not arranged. A method including etching steps for processing in this order is preferred.
Hereinafter, each step included in the circuit wiring manufacturing method will be described. shall also apply.
本開示に係る回路配線の製造方法は、本開示に係る積層体の製造方法により得られた積層体を準備する準備工程を含むことが好ましい。
準備工程における積層体の好ましい態様は、本開示に係る積層体の製造方法における好ましい態様と同様である。 <Preparation process>
The circuit wiring manufacturing method according to the present disclosure preferably includes a preparation step of preparing the laminate obtained by the laminate manufacturing method according to the present disclosure.
Preferred aspects of the laminate in the preparation step are the same as the preferred aspects of the laminate manufacturing method according to the present disclosure.
回路配線の製造方法は、上記樹脂パターンが配置されていない領域における上記基板をエッチング処理する工程(エッチング工程)を含むことが好ましい。 <Etching process>
It is preferable that the circuit wiring manufacturing method includes a step of etching the substrate in a region where the resin pattern is not arranged (etching step).
エッチング処理の方法としては、公知の方法を適用でき、例えば、特開2017-120435号公報の段落0209~段落0210に記載の方法、特開2010-152155号公報の段落0048~段落0054に記載の方法、エッチング液に浸漬するウェットエッチング法、及び、プラズマエッチング等のドライエッチングによる方法が挙げられる。 In the etching step, the conductive layer is etched using the resin pattern formed from the photosensitive layer as an etching resist.
As the etching method, a known method can be applied, for example, the method described in paragraphs 0209 to 0210 of JP-A-2017-120435, and the method described in paragraphs 0048 to 0054 of JP-A-2010-152155. method, a wet etching method in which the substrate is immersed in an etching solution, and a dry etching method such as plasma etching.
酸性のエッチング液としては、例えば、塩酸、硫酸、硝酸、酢酸、フッ酸、シュウ酸及びリン酸から選択される酸性成分単独の水溶液、並びに、酸性成分と、塩化第2鉄、フッ化アンモニウム及び過マンガン酸カリウムから選択される塩との混合水溶液が挙げられる。酸性成分は、複数の酸性成分を組み合わせた成分であってもよい。
アルカリ性のエッチング液としては、水酸化ナトリウム、水酸化カリウム、アンモニア、有機アミン、及び、有機アミンの塩(テトラメチルアンモニウムハイドロオキサイド等)から選択されるアルカリ成分単独の水溶液、並びに、アルカリ成分と塩(過マンガン酸カリウム等)との混合水溶液が挙げられる。アルカリ成分は、複数のアルカリ成分を組み合わせた成分であってもよい。 As the etchant used for wet etching, an acidic or alkaline etchant may be appropriately selected according to the object to be etched.
Examples of acidic etching solutions include aqueous solutions of acidic components alone selected from hydrochloric acid, sulfuric acid, nitric acid, acetic acid, hydrofluoric acid, oxalic acid and phosphoric acid, and acidic components, ferric chloride, ammonium fluoride and A mixed aqueous solution with a salt selected from potassium permanganate can be mentioned. The acidic component may be a combination of multiple acidic components.
Alkaline etching solutions include aqueous solutions of alkali components alone selected from sodium hydroxide, potassium hydroxide, ammonia, organic amines, and salts of organic amines (tetramethylammonium hydroxide, etc.), and alkali components and salts. (potassium permanganate, etc.). The alkaline component may be a component obtained by combining a plurality of alkaline components.
回路配線の製造方法においては、残存する樹脂パターンを除去する工程(除去工程)を行うことが好ましい。
除去工程は、特に制限されず、必要に応じて行うことができるが、エッチング工程の後に行うことが好ましい。
残存する樹脂パターンを除去する方法としては特に制限されないが、薬品処理により除去する方法が挙げられ、除去液を用いて除去する方法が好ましい。
感光性層の除去方法としては、液温が好ましくは30℃~80℃、より好ましくは50℃~80℃である撹拌中の除去液に、残存する樹脂パターンを有する基板を、1分間~30分間浸漬する方法が挙げられる。 <Removal process>
In the circuit wiring manufacturing method, it is preferable to perform a step of removing the remaining resin pattern (removing step).
The removal step is not particularly limited and can be performed as necessary, but is preferably performed after the etching step.
A method for removing the remaining resin pattern is not particularly limited, but a method of removing by chemical treatment is mentioned, and a method of removing using a removing liquid is preferable.
As a method for removing the photosensitive layer, the substrate having the remaining resin pattern is placed in a stirring removal liquid whose liquid temperature is preferably 30° C. to 80° C., more preferably 50° C. to 80° C., for 1 minute to 30° C. A method of immersing for a minute can be mentioned.
また、除去液を使用し、スプレー法、シャワー法及びパドル法等の公知の方法により除去してもよい。 Examples of the remover include a remover obtained by dissolving an inorganic alkaline component or an organic alkaline component in water, dimethylsulfoxide, N-methylpyrrolidone, or a mixed solution thereof. Examples of inorganic alkaline components include sodium hydroxide and potassium hydroxide. Organic alkaline components include primary amine compounds, secondary amine compounds, tertiary amine compounds and quaternary ammonium salt compounds.
Alternatively, it may be removed by a known method such as a spray method, a shower method, or a paddle method using a remover.
回路配線の製造方法は、上述した工程以外の任意の工程(その他の工程)を含んでもよい。例えば、以下の工程が挙げられるが、これらの工程に制限されない。
また、回路配線の製造方法に適用可能な露光工程、現像工程、及びその他の工程としては、特開2006-23696号公報の段落0035~0051に記載の工程が挙げられる。
更に、その他の工程としては、例えば、国際公開第2019/022089号の段落0172に記載の可視光線反射率を低下させる工程、国際公開第2019/022089号の段落0172に記載の絶縁膜上に新たな導電層を形成する工程等が挙げられるが、これらの工程に制限されない。 <Other processes>
The circuit wiring manufacturing method may include arbitrary steps (other steps) other than the steps described above. Examples include, but are not limited to, the following steps.
Further, the exposure process, the development process, and other processes applicable to the circuit wiring manufacturing method include the processes described in paragraphs 0035 to 0051 of JP-A-2006-23696.
Furthermore, other steps include, for example, a step of reducing the visible light reflectance described in paragraph 0172 of WO 2019/022089, and a new step on the insulating film described in paragraph 0172 of WO 2019/022089. Examples include a step of forming a conductive layer, but the present invention is not limited to these steps.
回路配線の製造方法は、基板が有する複数の導電層の一部又は全ての可視光線反射率を低下させる処理を行う工程を含んでいてもよい。
可視光線反射率を低下させる処理としては、酸化処理が挙げられる。基板が銅を含有する導電層を有する場合、銅を酸化処理して酸化銅とし、導電層を黒化することにより、導電層の可視光線反射率を低下させることができる。
可視光線反射率を低下させる処理については、特開2014-150118号公報の段落0017~0025、並びに、特開2013-206315号公報の段落0041、段落0042、段落0048及び段落0058に記載されており、これらの公報に記載の内容は本明細書に組み込まれる。 - Step of reducing visible light reflectance -
The circuit wiring manufacturing method may include a step of performing a process for reducing the visible light reflectance of a part or all of the plurality of conductive layers of the substrate.
The treatment for reducing the visible light reflectance includes oxidation treatment. When the substrate has a conductive layer containing copper, the visible light reflectance of the conductive layer can be reduced by oxidizing the copper to form copper oxide and blackening the conductive layer.
The treatment for reducing the visible light reflectance is described in paragraphs 0017 to 0025 of JP-A-2014-150118, and paragraphs 0041, 0042, 0048 and 0058 of JP-A-2013-206315. , the contents of which are incorporated herein.
回路配線の製造方法は、回路配線の表面に絶縁膜を形成する工程と、絶縁膜の表面に新たな導電層を形成する工程と、を含むことも好ましい。
上記の工程により、第一の電極パターンと絶縁した第二の電極パターンを形成することができる。
絶縁膜を形成する工程としては、特に制限されず、公知の永久膜を形成する方法が挙げられる。また、絶縁性を有する感光性材料を用いて、フォトリソグラフィにより所望のパターンの絶縁膜を形成してもよい。
絶縁膜上に新たな導電層を形成する工程は、特に制限されず、例えば、導電性を有する感光性材料を用いて、フォトリソグラフィにより所望のパターンの新たな導電層を形成してもよい。 -Step of Forming Insulating Film, Step of Forming New Conductive Layer on Surface of Insulating Film-
It is also preferable that the circuit wiring manufacturing method includes a step of forming an insulating film on the surface of the circuit wiring, and a step of forming a new conductive layer on the surface of the insulating film.
Through the above steps, a second electrode pattern insulated from the first electrode pattern can be formed.
The process of forming the insulating film is not particularly limited, and a known method of forming a permanent film can be used. Alternatively, an insulating film having a desired pattern may be formed by photolithography using an insulating photosensitive material.
The step of forming a new conductive layer on the insulating film is not particularly limited. For example, a conductive photosensitive material may be used to form a new conductive layer in a desired pattern by photolithography.
本開示に係る樹脂パターンの製造方法により製造された樹脂パターン、本開示に係る積層体の製造方法により製造される積層体、及び、本開示に係る回路配線の製造方法により製造される回路配線は、種々の装置に適用することができる。上記積層体を備えた装置としては、例えば、入力装置等が挙げられ、タッチパネルであることが好ましく、静電容量型タッチパネルであることがより好ましい。また、上記入力装置は、有機エレクトロルミネッセンス表示装置、液晶表示装置等の表示装置に適用することができる。
積層体がタッチパネルに適用される場合、形成された樹脂パターンは、タッチパネル用電極又はタッチパネル用配線の保護膜として用いられることが好ましい。つまり、本開示に係る感光性転写材料は、タッチパネル用電極保護膜又はタッチパネル用配線の形成に用いられることが好ましい。 <Application>
The resin pattern manufactured by the resin pattern manufacturing method according to the present disclosure, the laminate manufactured by the laminate manufacturing method according to the present disclosure, and the circuit wiring manufactured by the circuit wiring manufacturing method according to the present disclosure , can be applied to various devices. Examples of the device provided with the laminate include an input device and the like, preferably a touch panel, and more preferably a capacitive touch panel. Further, the input device can be applied to display devices such as an organic electroluminescence display device and a liquid crystal display device.
When the laminate is applied to a touch panel, the formed resin pattern is preferably used as a protective film for touch panel electrodes or touch panel wiring. That is, the photosensitive transfer material according to the present disclosure is preferably used for forming a touch panel electrode protective film or a touch panel wiring.
本開示に係る電子デバイスの製造方法は、本開示に係る積層体の製造方法により製造された積層体又は後述する本開示に係る感光性転写材料を用いる方法であれば、特に制限されない。
また、本開示に係る電子デバイスの製造方法は、本開示に係る積層体の製造方法により得られた積層体を準備する準備工程、及び、上記樹脂パターンが配置されていない領域における上記基板をエッチング処理するエッチング工程をこの順に含む方法が好ましい。
本開示に係る電子デバイスの製造方法により製造された電子デバイスは、上記樹脂パターンを永久膜として有することが好ましい。 (Method for manufacturing electronic device)
The method for producing an electronic device according to the present disclosure is not particularly limited as long as it is a method using a laminate produced by the method for producing a laminate according to the present disclosure or a photosensitive transfer material according to the present disclosure, which will be described later.
Further, a method for manufacturing an electronic device according to the present disclosure includes a preparation step of preparing a laminate obtained by the method for manufacturing a laminate according to the present disclosure, and etching the substrate in a region where the resin pattern is not arranged. A method including etching steps for processing in this order is preferred.
An electronic device manufactured by the method for manufacturing an electronic device according to the present disclosure preferably has the resin pattern as a permanent film.
電子デバイスの製造方法は、上記の方法により電子デバイス用配線を形成すること以外は、公知の電子デバイスの製造方法を参照すればよい。
また、電子デバイスの製造方法は、上述した以外の任意の工程(その他の工程)を含んでもよい。 The specific aspects of each step and the order of performing each step in the method of manufacturing an electronic device are described in the above sections of "Method for manufacturing laminate" and "Method for manufacturing circuit wiring". and preferred embodiments are also the same.
As for the method for manufacturing an electronic device, a known method for manufacturing an electronic device may be referred to, except that the electronic device wiring is formed by the method described above.
Moreover, the method for manufacturing an electronic device may include arbitrary steps (other steps) other than those described above.
上記樹脂パターンは、上記電子デバイスにおいて、永久膜である、例えば、層間絶縁膜、配線保護膜、インデックスマッチング層を有する配線保護膜などとして用いることが好ましい。
中でも、電子デバイスとしては、タッチパネルが特に好適に挙げられる。 Electronic devices are not particularly limited, but semiconductor packages, printed circuit boards, various wiring formation applications for sensor substrates, touch panels, electromagnetic wave shielding materials, conductive films such as film heaters, liquid crystal sealing materials, micromachines or in the field of microelectronics Structures are preferred.
In the electronic device, the resin pattern is preferably used as a permanent film, such as an interlayer insulating film, a wiring protective film, or a wiring protective film having an index matching layer.
Among them, a touch panel is particularly suitable as an electronic device.
図2に示されるパターンA、及び、図3に示されるパターンBにおいて、GRは非画像部(遮光部)であり、EXは画像部(露光部)であり、DLはアライメント合わせの枠を仮想的に示したものである。タッチパネルの製造方法において、例えば、図2に示されるパターンAを有するマスクを介して上記感光性層を露光することで、EXに対応するパターンAを有する回路配線が形成されたタッチパネルを製造できる。具体的には、国際公開第2016/190405号の図1に記載の方法で作製できる。製造されたタッチパネルの一例においては、露光部EXの中央部(資格が連結したパターン部分)は透明電極(タッチパネル用電極)が形成される部分であり、露光部EXの周縁部(細線部分)は周辺取出し部の配線が形成される部分である。 An example of a mask pattern used for manufacturing a touch panel is shown in FIGS. 2 and 3. FIG.
In pattern A shown in FIG. 2 and pattern B shown in FIG. It is shown In the touch panel manufacturing method, for example, by exposing the photosensitive layer through a mask having pattern A shown in FIG. 2, a touch panel having circuit wiring having pattern A corresponding to EX formed thereon can be manufactured. Specifically, it can be produced by the method described in FIG. 1 of International Publication No. 2016/190405. In one example of the manufactured touch panel, the central portion of the exposed portion EX (the pattern portion where the qualifications are connected) is the portion where the transparent electrode (touch panel electrode) is formed, and the peripheral portion (thin line portion) of the exposed portion EX is This is the portion where the wiring of the peripheral extracting portion is formed.
タッチパネルは、透明基板と、電極と、絶縁層又は保護層とを有することが好ましい。
タッチパネルにおける検出方法としては、抵抗膜方式、静電容量方式、超音波方式、電磁誘導方式、及び、光学方式等の公知の方式が挙げられる。中でも、静電容量方式が好ましい。 By the method for manufacturing an electronic device, an electronic device having at least electronic device wiring is manufactured, and preferably, a touch panel having at least touch panel wiring is manufactured, for example.
The touch panel preferably has a transparent substrate, electrodes, and an insulating layer or protective layer.
As a detection method for a touch panel, known methods such as a resistive film method, a capacitance method, an ultrasonic method, an electromagnetic induction method, and an optical method can be used. Among them, the capacitance method is preferable.
タッチパネルとしては、例えば、特開2017-120435号公報の段落0229に記載のものが挙げられる。 As the touch panel type, the so-called in-cell type (for example, those described in FIGS. 5, 6, 7 and 8 of JP-A-2012-517051), the so-called on-cell type (for example, JP 2013-168125) Those described in FIG. 19, and those described in FIGS. 1 and 5 of JP-A-2012-89102), OGS (One Glass Solution) type, TOL (Touch-on-Lens) type (for example, JP-A 2013-54727), various out-cell types (so-called GG, G1 G2, GFF, GF2, GF1 and G1F, etc.) and other configurations (for example, Japanese Patent Application Laid-Open No. 2013-164871 6).
Examples of touch panels include those described in paragraph 0229 of JP-A-2017-120435.
本開示に係る感光性転写材料は、仮支持体と感光性層を含む転写層とを有し、上記感光性層の限界解像度をXTμmとして定義し、粒子の基準直径をYT=0.5×XTで表されるYTμmとして定義した場合、上記感光性層の表面及び内部におけるYTμm以上の直径を有する粒子の個数が、15個/cm2以下である。
また、本開示に係る感光性転写材料の好ましい態様は、後述する以外、上述した本開示に係る積層体の製造方法に用いられる感光性転写材料の好ましい態様と同様である。 (Photosensitive transfer material)
A photosensitive transfer material according to the present disclosure has a temporary support and a transfer layer including a photosensitive layer, wherein the limiting resolution of the photosensitive layer is defined as X T μm, and the reference diameter of the particles is Y T =0 When defined as Y T μm represented by .5×X T , the number of particles having a diameter of Y T μm or more on the surface and inside of the photosensitive layer is 15 particles/cm 2 or less.
In addition, the preferred aspects of the photosensitive transfer material according to the present disclosure are the same as the preferred aspects of the photosensitive transfer material used in the above-described method for producing a laminate according to the present disclosure, except as described later.
本開示に係る感光性転写材料は、上記感光性層の限界解像度をXTμmとして定義し、粒子の基準直径をYT=0.5×XTで表されるYTμmとして定義した場合、上記感光性層の表面及び内部におけるYTμm以上の直径を有する粒子の個数が、15個/cm2以下であり、ピンホール欠陥抑制の観点から、10個/cm2以下であることが好ましく、7個/cm2以下であることがより好ましく、5個/cm2以下であることが特に好ましい。なお、下限値は、0個/cm2である。 <The critical resolution of the photosensitive layer is X T μm, and the number of particles having a diameter of Y T μm or more on the surface and inside of the photosensitive layer>
In the photosensitive transfer material according to the present disclosure, when the critical resolution of the photosensitive layer is defined as X T μm and the reference diameter of the particles is defined as Y T μm represented by Y T =0.5×X T , the number of particles having a diameter of Y T μm or more on the surface and inside of the photosensitive layer is 15 particles/cm 2 or less, and from the viewpoint of suppressing pinhole defects, it is preferably 10 particles/cm 2 or less. It is preferably 7/cm 2 or less, and particularly preferably 5/cm 2 or less. The lower limit is 0/cm 2 .
以下の方法によって仮支持体Aを製造した。 <Production of temporary support A>
A temporary support A was produced by the following method.
下記に示す配合で、各成分を混合し、粒子含有層形成組成物1を得た。粒子含有層形成組成物1を調製後、6μmフィルター(F20、マーレフィルターシステムズ(株)製)にてろ過し、続いて、2x6ラジアルフロースーパーフォビック(ポリポア(株)製)を用いて、膜脱気した。
・アクリルポリマー(AS-563A、ダイセルファインケム(株)製、固形分27.5質量%)167部
・ノニオン系界面活性剤(ナロアクティーCL95、三洋化成工業(株)製、固形分100質量%)0.7部
・アニオン系界面活性剤(ラピゾールA-90、日油(株)製、固形分1質量%に水で希釈)114.4部
・カルナバワックス分散物(セロゾール524、中京油脂(株)製、固形分30質量%)7部
・カルボジイミド化合物(カルボジライトV-02-L2、日清紡(株)製、固形分10質量%に水で希釈)20.9部
・マット剤(スノーテックスXL、日産化学(株)製、固形分40質量%、平均粒子径50nm)2.8部
・水 690.2部 [Preparation of Particle-Containing Layer-Forming Composition 1]
A particle-containing layer-forming composition 1 was obtained by mixing each component according to the formulation shown below. After preparing the particle-containing layer-forming composition 1, it was filtered with a 6 μm filter (F20, manufactured by Mahle Filter Systems Co., Ltd.), and then a membrane was filtered using a 2×6 radial flow superphobic (manufactured by Polypore Co., Ltd.). Degassed.
・Acrylic polymer (AS-563A, manufactured by Daicel Finechem Co., Ltd., solid content 27.5% by mass) 167 parts ・Nonionic surfactant (Naroacty CL95, manufactured by Sanyo Chemical Industries, Ltd., solid content 100% by mass) 0.7 parts Anionic surfactant (Rapisol A-90, manufactured by NOF Corporation, diluted with water to a solid content of 1% by mass) 114.4 parts Carnauba wax dispersion (Cerosol 524, Chukyo Yushi Co., Ltd. ), solid content 30% by mass) 7 parts Carbodiimide compound (Carbodilite V-02-L2, manufactured by Nisshinbo Co., Ltd., diluted with water to a solid content of 10% by mass) 20.9 parts Matting agent (Snowtex XL, Nissan Chemical Co., Ltd., solid content 40 mass%, average particle diameter 50 nm) 2.8 parts, water 690.2 parts
特許第5575671号公報に記載されたクエン酸キレート有機チタン錯体を重合触媒として用いて製造したポリエチレンテレフタレート(PET)のペレットを乾燥し、上記ペレットの含水率を50ppm以下にした。乾燥したペレットを、直径が30mmである1軸混練押出機のホッパーに投入し、280℃で溶融した。この溶融体(メルト)を、濾過器(孔径2μm)を通した後、ダイから25℃の冷却ロールに押し出し、未延伸フィルムを得た。上記方法において、溶融体は、静電印加法を用いて冷却ロールに密着させた。 [Extrusion]
Pellets of polyethylene terephthalate (PET) produced using the citric acid chelate organotitanium complex described in Japanese Patent No. 5575671 as a polymerization catalyst were dried to reduce the moisture content of the pellets to 50 ppm or less. The dried pellets were put into the hopper of a single-screw kneading extruder with a diameter of 30 mm and melted at 280°C. This melt was passed through a filter (pore size of 2 μm) and then extruded from a die onto a cooling roll at 25° C. to obtain an unstretched film. In the above method, the melt was brought into close contact with the cooling roll using an electrostatic application method.
固化した未延伸フィルムに対し、以下の方法によって逐次2軸延伸を施すことで、厚さが16μmのポリエチレンテレフタレートフィルムの上に、厚さが40nmの粒子含有層を形成した。 [Stretching and coating]
The solidified unstretched film was sequentially biaxially stretched by the following method to form a particle-containing layer with a thickness of 40 nm on a polyethylene terephthalate film with a thickness of 16 μm.
未延伸フィルムを周速の異なる2対のニップロールの間に通し、縦方向(搬送方向)に延伸した。縦延伸の条件を以下に示す。
・予熱温度:75℃
・延伸温度:90℃
・延伸倍率:3.4倍
・延伸速度:1,300%/秒 (a) Longitudinal Stretching An unstretched film was passed between two pairs of nip rolls with different peripheral speeds and stretched in the longitudinal direction (conveyance direction). The conditions for longitudinal stretching are shown below.
・Preheating temperature: 75℃
・Stretching temperature: 90°C
・Stretching ratio: 3.4 times ・Stretching speed: 1,300%/sec
縦延伸したフィルムの片面に、バーコーターを用いて、粒子含有層形成用組成物1を製膜後の厚さが40nmとなるように塗布した。 (b) Coating Using a bar coater, the particle-containing layer-forming composition 1 was coated on one side of the longitudinally stretched film so that the thickness after forming the film was 40 nm.
粒子含有層形成用組成物1が塗布されたフィルムに対し、テンターを用いて下記条件にて横延伸した。
・予熱温度:110℃
・延伸温度:120℃
・延伸倍率:4.2倍
・延伸速度:50%/秒 (c) Lateral Stretching The film coated with the particle-containing layer-forming composition 1 was laterally stretched using a tenter under the following conditions.
・Preheating temperature: 110℃
・Stretching temperature: 120°C
・Stretching ratio: 4.2 times ・Stretching speed: 50%/sec
縦延伸及び横延伸を経た二軸延伸フィルムを下記条件で熱固定した。
・熱固定温度:227℃
・熱固定時間:6秒 [Heat setting and heat relaxation]
A biaxially stretched film that had undergone longitudinal stretching and transverse stretching was heat set under the following conditions.
・Heat setting temperature: 227°C
・Heat fixation time: 6 seconds
・熱緩和温度:190℃
・熱緩和率:4% After heat setting, the width of the tenter was reduced and the biaxially stretched film was thermally relaxed under the following conditions.
・Thermal relaxation temperature: 190°C
・Thermal relaxation rate: 4%
熱固定及び熱緩和の後、フィルムの両端をトリミングし、フィルムの端部に10mm幅で押出し加工(ナーリング)した後、40kg/mの張力でフィルムを巻き取った。フィルムの幅は1.5mであり、フィルムの巻長は6,300mであった。得られたフィルムロールを、仮支持体Aとした。 〔Take-up〕
After heat setting and heat relaxation, both ends of the film were trimmed, the ends of the film were extruded (knurled) with a width of 10 mm, and the film was wound under a tension of 40 kg/m. The width of the film was 1.5 m and the roll length of the film was 6,300 m. The resulting film roll was used as a temporary support A.
仮支持体Aのヘーズは、0.2%であった。ヘーズは、ヘーズメーター(日本電色工業(株)製NDH2000)を用いて全光ヘーズとして測定した。
仮支持体Aの断面TEM写真から測定した粒子含有層の厚さは、40nmであった。(株)日立ハイテクノロジーズ製のHT-7700型透過型電子顕微鏡(TEM)を用いて上述の方法によって測定した、粒子含有層に含まれる粒子の平均粒子径は、50nmであった。 Temporary support A has a polyethylene terephthalate film (substrate) and a particle-containing layer in this order.
The haze of the temporary support A was 0.2%. Haze was measured as total light haze using a haze meter (NDH2000 manufactured by Nippon Denshoku Industries Co., Ltd.).
The thickness of the particle-containing layer measured from a cross-sectional TEM photograph of the temporary support A was 40 nm. The average particle diameter of the particles contained in the particle-containing layer measured by the method described above using a HT-7700 transmission electron microscope (TEM) manufactured by Hitachi High-Technologies Corporation was 50 nm.
溶融流量及び延伸条件を調整することにより、厚み25μmとした以外は、仮支持体Aの作製と同じ方法によって、仮支持体Bを得た。 <Preparation of temporary support B>
A temporary support B was obtained in the same manner as the temporary support A except that the thickness was adjusted to 25 μm by adjusting the melt flow rate and stretching conditions.
表1に記載の各成分と、メチルエチルケトン(三協化学(株)製)(60部)、及び、プロピレングリコールモノメチルエーテルアセテート(昭和電工(株)製)(40部)の混合溶剤とを、感光性組成物の固形分濃度が13質量%となるように、混合溶剤を加えて混合液を得た。その後、得られた混合溶液を、後述する表4に記載の孔径のポリテトラフルオロエチレン製フィルターを用いてろ過を表4に記載の回数行うことにより、感光性組成物1~4をそれぞれ調製した。 <Preparation of Photosensitive Compositions 1 to 4>
Each component shown in Table 1 and a mixed solvent of methyl ethyl ketone (manufactured by Sankyo Chemical Co., Ltd.) (60 parts) and propylene glycol monomethyl ether acetate (manufactured by Showa Denko Co., Ltd.) (40 parts) were subjected to exposure. A mixed solvent was added to obtain a mixed liquid so that the solid content concentration of the liquid composition was 13% by mass. Thereafter, the resulting mixed solution was filtered using a polytetrafluoroethylene filter having a pore size shown in Table 4, which will be described later, the number of times shown in Table 4, thereby preparing photosensitive compositions 1 to 4, respectively. .
BPE-500:2,2-ビス(4-(メタクリロキシペンタエトキシ)フェニル)プロパン、新中村化学工業(株)製
M-270:ポリプロピレングリコールジアクリレート、東亞合成(株)製
A-TMPT:トリメチロールプロパントリアクリレート、新中村化学工業(株)製
SR-454:エトキシ化(3)トリメチロールプロパントリアクリレート、サートマー社製
A-9300-CL1:ε-カプロラクトン変性トリス(2-アクリロキシエチル)イソシアヌレート、新中村化学工業(株)製
B-CIM:光ラジカル発生剤(光重合開始剤)、Hampford社製、2-(2-クロロフェニル)-4,5-ジフェニルイミダゾール二量体
SB-PI 701:増感剤、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、三洋貿易(株)より入手
CBT-1:防錆剤、カルボキシベンゾトリアゾール、城北化学工業(株)製
TDP-G:重合禁止剤、フェノチアジン、川口化学工業(株)製
Irganox245:ヒンダードフェノール系重合禁止剤、BASF社製
F-552:フッ素系界面活性剤、メガファック F552、DIC(株)製 Further, the details of the compounds listed in Table 1 are shown below.
BPE-500: 2,2-bis (4-(methacryloxypentaethoxy) phenyl) propane, manufactured by Shin-Nakamura Chemical Co., Ltd. M-270: polypropylene glycol diacrylate, manufactured by Toagosei Co., Ltd. A-TMPT: Tri Methylolpropane triacrylate, manufactured by Shin-Nakamura Chemical Co., Ltd. SR-454: Ethoxylated (3) trimethylolpropane triacrylate, manufactured by Sartomer A-9300-CL1: ε-caprolactone-modified tris(2-acryloxyethyl) isocyanate Nurate, manufactured by Shin-Nakamura Chemical Co., Ltd. B-CIM: photoradical generator (photopolymerization initiator), manufactured by Hampford, 2-(2-chlorophenyl)-4,5-diphenylimidazole dimer SB-PI 701 : Sensitizer, 4,4'-bis(diethylamino)benzophenone, available from Sanyo Boeki Co., Ltd. CBT-1: Antirust agent, carboxybenzotriazole, Johoku Chemical Industry Co., Ltd. TDP-G: polymerization inhibitor, Phenothiazine, manufactured by Kawaguchi Chemical Industry Co., Ltd. Irganox245: Hindered phenol-based polymerization inhibitor, manufactured by BASF F-552: Fluorine-based surfactant, Megafac F552, manufactured by DIC Corporation
表2に記載の各成分を混合し、熱可塑性樹脂組成物を調製した。 <Preparation of thermoplastic resin composition>
Each component shown in Table 2 was mixed to prepare a thermoplastic resin composition.
上記の表2に記載された略号の意味を以下に示す。
・A-2:ベンジルメタクリレート/メタクリル酸/アクリル酸共重合体(75質量%/10質量%/15質量%、重量平均分子量:30,000、Tg:75℃、酸価:186mgKOH/g)
・B-1:下記に示す構造の化合物(酸により発色する色素) In addition, the unit of the numerical value of each component of Table 2 is a mass part.
The meanings of the abbreviations described in Table 2 are shown below.
A-2: benzyl methacrylate/methacrylic acid/acrylic acid copolymer (75% by mass/10% by mass/15% by mass, weight average molecular weight: 30,000, Tg: 75°C, acid value: 186 mgKOH/g)
・B-1: A compound having the structure shown below (a dye that develops color with an acid)
・D-4:8UX-015A(多官能ウレタンアクリレート化合物、大成ファインケミカル株式会社)
・D-5:アロニックスTO-2349(カルボキシ基を有する多官能アクリレート化合物、東亞合成(株)製)
・E-1:メガファックF552(DIC(株)製)
・F-1:フェノチアジン(富士フイルム和光純薬(株)製)
・F-2:CBT-1(城北化学工業(株)製)
・MEK:メチルエチルケトン
・PGME:プロピレングリコールモノメチルエーテル
・PGMEA:プロピレングリコールモノメチルエーテルアセテート ・ D-3: NK Ester A-DCP (tricyclodecanedimethanol diacrylate, manufactured by Shin-Nakamura Chemical Co., Ltd.)
・ D-4: 8UX-015A (polyfunctional urethane acrylate compound, Taisei Fine Chemical Co., Ltd.)
・ D-5: Aronix TO-2349 (polyfunctional acrylate compound having a carboxy group, manufactured by Toagosei Co., Ltd.)
・ E-1: Megaface F552 (manufactured by DIC Corporation)
・ F-1: Phenothiazine (manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.)
・ F-2: CBT-1 (manufactured by Johoku Chemical Industry Co., Ltd.)
・MEK: Methyl ethyl ketone ・PGME: Propylene glycol monomethyl ether ・PGMEA: Propylene glycol monomethyl ether acetate
以下の成分を混合し、水溶性樹脂組成物の調製を行った。なお、各成分の量の単位は、質量部である。
イオン交換水:38.12部
メタノール(三菱ガス化学(株)製):57.17部
クラレポバール 4-88LA(ポリビニルアルコール、(株)クラレ製):3.22部
ポリビニルピロリドンK-30(日本触媒(株)製):1.49部
メガファックF-444(フッ素系界面活性剤、DIC(株)製):0.0035部 <Preparation of water-soluble resin composition>
A water-soluble resin composition was prepared by mixing the following components. In addition, the unit of the quantity of each component is a mass part.
Ion-exchanged water: 38.12 parts Methanol (manufactured by Mitsubishi Gas Chemical Co., Ltd.): 57.17 parts Kuraray Poval 4-88LA (polyvinyl alcohol, manufactured by Kuraray Co., Ltd.): 3.22 parts Polyvinylpyrrolidone K-30 (Japan Catalyst Co., Ltd.): 1.49 parts Megafac F-444 (fluorosurfactant, manufactured by DIC Corporation): 0.0035 parts
仮支持体の基材(ポリエチレンテレフタレートフィルム)の上に、スリット状ノズルを用いて、熱可塑性樹脂組成物を塗布した。塗布された熱可塑性樹脂組成物を100℃で120秒間かけて乾燥し、表3に記載の厚さを有する熱可塑性樹脂層を形成した。 (Examples 1 to 5)
A thermoplastic resin composition was applied onto the base material (polyethylene terephthalate film) of the temporary support using a slit nozzle. The applied thermoplastic resin composition was dried at 100° C. for 120 seconds to form a thermoplastic resin layer having the thickness shown in Table 3.
表3及び表4の記載に従って適宜変更したこと以外は、実施例1と同様にして、感光性転写材料を得た。 (Examples 6 to 18 and Comparative Example 1)
A photosensitive transfer material was obtained in the same manner as in Example 1, except that the contents were appropriately changed according to the descriptions in Tables 3 and 4.
(1)厚さが100μmのポリエチレンテレフタレート(PET)フィルム上に、厚さが200nmの銅層をスパッタリングによって形成することで、銅層付きPET基板を作製した。真空ラミネーター((株)MCK製、ロール温度:100℃、線圧:1.0MPa、線速度:0.5m/分)を用いたロールツーロール方式によって、感光性転写材料と銅層付きPET基板とを貼り合わせ、積層体を得た。得られた積層体は、少なくとも、PETフィルムと、銅層と、感光性層と、仮支持体と、をこの順で含む。
(2)得られた積層体を、オートクレーブ装置を用いて、0.6MPa及び60℃の条件下で30分間加圧脱泡した。その後、クリーニングロール((株)オサダコーポレーション製、DCH-12H2LS)を用い、手動にて仮支持体の表面を10回擦ることにより、仮支持体上の異物を除去した。
(3)超高圧水銀灯を用いて、仮支持体を剥離せずにラインアンドスペースパターンマスク(Duty比は1:1であり、線幅は1μmから20μmまで1μmおきに段階的に変化している。)を介して感光性層を露光した。
(4)仮支持体を剥離した後、現像した。現像は、25℃の1.0質量%炭酸ナトリウム水溶液を用い、シャワー現像で30秒間行った。
感光性層を現像することで、樹脂パターンを形成した。
マスクのパターンに対応する最小の線幅を有する樹脂パターン(以下、本段落において「基準パターン」という。)が得られるまで、露光量(単位:mJ/cm2)を都度調節しながら上記した一連の手順(1)~(4)を実施した。基準パターンの最小線幅を、感光性層の限界解像度Xμmとして採用した。
測定結果を表4に示す。 <Resolution>
(1) A PET substrate with a copper layer was produced by forming a copper layer with a thickness of 200 nm on a polyethylene terephthalate (PET) film with a thickness of 100 μm by sputtering. By a roll-to-roll method using a vacuum laminator (manufactured by MCK Co., Ltd., roll temperature: 100 ° C., linear pressure: 1.0 MPa, linear speed: 0.5 m / min), the photosensitive transfer material and the PET substrate with a copper layer were laminated to obtain a laminate. The obtained laminate includes at least a PET film, a copper layer, a photosensitive layer, and a temporary support in this order.
(2) The obtained laminate was pressurized and defoamed under conditions of 0.6 MPa and 60° C. for 30 minutes using an autoclave. After that, using a cleaning roll (manufactured by Osada Corporation, DCH-12H2LS), the surface of the temporary support was manually rubbed 10 times to remove foreign matters on the temporary support.
(3) Using an ultra-high pressure mercury lamp, a line and space pattern mask without peeling off the temporary support (the duty ratio is 1: 1, the line width is changed step by step from 1 μm to 20 μm every 1 μm .) to expose the photosensitive layer.
(4) After peeling off the temporary support, development was carried out. Development was performed by shower development for 30 seconds using a 1.0% by mass sodium carbonate aqueous solution at 25°C.
A resin pattern was formed by developing the photosensitive layer.
While adjusting the exposure amount (unit: mJ/cm 2 ) each time, the above-described series of Procedures (1) to (4) were performed. The minimum line width of the reference pattern was taken as the limiting resolution X μm of the photosensitive layer.
Table 4 shows the measurement results.
(1)厚さが100μmのポリエチレンテレフタレート(PET)フィルム上に、真空ラミネーター((株)MCK製、ロール温度:100℃、線圧:1.0MPa、線速度:0.5m/分)を用いたロールツーロール方式によって、感光性転写材料とPET基板とを貼り合わせた。得られた積層体は、少なくとも、PETフィルムと、感光性層と、仮支持体と、をこの順で含む。
(2)得られた積層体を、オートクレーブ装置を用いて、0.6MPa及び60℃の条件下で30分間加圧脱泡した。
仮支持体を剥離したあとの表面における任意の10か所の領域(各領域の大きさ:10mm×10mm、合計面積:1,000mm2)を、光学顕微鏡を用いて目視にて観察した。各領域に含まれる直径がYμm以上の異物及び空隙の個数を測定した。10か所の領域で測定されたYμm以上の異物及び空隙の個数の合計値に基づき、測定領域の1cm2あたりのYμm以上の異物及び空隙の個数(個/cm2)を算出した。測定結果を表4に示す。 <Total number of foreign substances and voids on the surface and inside of the photosensitive layer>
(1) Use a vacuum laminator (manufactured by MCK Co., Ltd., roll temperature: 100 ° C., linear pressure: 1.0 MPa, linear speed: 0.5 m / min) on a polyethylene terephthalate (PET) film with a thickness of 100 μm. The photosensitive transfer material and the PET substrate were bonded together by a roll-to-roll method. The obtained laminate includes at least a PET film, a photosensitive layer, and a temporary support in this order.
(2) The obtained laminate was pressurized and defoamed under conditions of 0.6 MPa and 60° C. for 30 minutes using an autoclave.
Ten arbitrary regions (size of each region: 10 mm×10 mm, total area: 1,000 mm 2 ) on the surface after peeling the temporary support were visually observed using an optical microscope. The number of foreign particles and voids with a diameter of Y μm or more included in each region was measured. Based on the total number of foreign matter and voids of Y μm or more measured in 10 regions, the number of foreign matter and voids of Y μm or more per 1 cm 2 of the measurement region (pieces/cm 2 ) was calculated. Table 4 shows the measurement results.
配線形成用マスク(Duty比は1:1であり、線幅は1μmから20μmまで1μmおきに段階的に変化している。配線パターンの長さは50mmである。配線の本数は10本である。)を用いたこと以外は、上記「解像性」の項で説明した方法(すなわち、基準露光量で感光性層を露光して樹脂パターンを形成する方法)と同じ方法によって、配線パターン(すなわち、樹脂パターン)を形成した。光学顕微鏡を用いて配線パターンを目視で観察し、ピンホールの最大サイズ及び個数に基づき、以下の基準に従って、配線パターンのピンホールに関して評価した。評価結果を表4に示す。
A:ピンホールが確認されない、又は配線幅の1/4以下の大きさのピンホールが確認された。
B:配線幅の1/4を超え1/2以下の大きさのピンホールが確認された。
C:配線幅の1/2を超え3/4以下の大きさのピンホールが確認された。
D:配線幅の3/4を超える大きさのピンホールが確認された。 <Pinhole in wiring pattern>
Wiring formation mask (Duty ratio is 1:1, line width is changed step by step from 1 μm to 20 μm every 1 μm. The length of the wiring pattern is 50 mm. The number of wiring is 10. ), except that the wiring pattern ( That is, a resin pattern) was formed. The wiring pattern was visually observed using an optical microscope, and the pinholes in the wiring pattern were evaluated according to the following criteria based on the maximum size and number of pinholes. Table 4 shows the evaluation results.
A: No pinhole was observed, or a pinhole having a size of 1/4 or less of the wiring width was confirmed.
B: A pinhole having a size exceeding 1/4 and not more than 1/2 of the wiring width was confirmed.
C: A pinhole having a size exceeding 1/2 and 3/4 or less of the wiring width was confirmed.
D: A pinhole having a size exceeding 3/4 of the wiring width was confirmed.
配線パターンのピンホール評価に用いたサンプルに対し、光学顕微鏡を用いてパターンの欠損(いわゆるバイト)の状態をを目視で観察し、以下の基準に従って評価した。
A:パターンの欠損が確認されないか、又は、最大径が1μm未満のパターンの欠損が確認された。
B:最大径が1μm以上2μm以下のパターンの欠損が確認された。
C:最大径が2μmを超えるパターンの欠損が確認された。 <Defective Wiring Pattern>
With respect to the sample used for the pinhole evaluation of the wiring pattern, the state of pattern defects (so-called bite) was visually observed using an optical microscope, and evaluated according to the following criteria.
A: No pattern defects were observed, or pattern defects with a maximum diameter of less than 1 μm were confirmed.
B: Pattern defects with a maximum diameter of 1 μm or more and 2 μm or less were confirmed.
C: Pattern defects with a maximum diameter exceeding 2 μm were confirmed.
解像性を評価したパターンの10μmのパターンに対し、走査型電子顕微鏡(SEM)にて観察し、100μmの長さの範囲で線幅の最大値-最小値(「線幅の変動値」ともいう。)を評価することで、以下の基準に従って、樹脂パターンの直線性の評価を行った。
A:線幅の変動値が0.4μm未満である。
B:線幅の変動値が0.4μm以上0.7μm未満である。
C:線幅の変動値が0.7μm以上1.0μm未満である。
D:線幅の変動値が1.0μm以上1.5μm未満である。
E:線幅の変動値が1.5μm以上である。 <Linearity of Wiring Pattern>
A 10 μm pattern of the pattern for which resolution was evaluated was observed with a scanning electron microscope (SEM), and the maximum value − minimum value of the line width (also referred to as “variation value of line width”) within a length range of 100 μm. ) was evaluated, and the linearity of the resin pattern was evaluated according to the following criteria.
A: Line width fluctuation value is less than 0.4 μm.
B: Line width fluctuation value is 0.4 μm or more and less than 0.7 μm.
C: Line width fluctuation value is 0.7 μm or more and less than 1.0 μm.
D: Line width fluctuation value is 1.0 μm or more and less than 1.5 μm.
E: Line width fluctuation value is 1.5 μm or more.
実施例1で作製した感光性転写材料を、ロール温度100℃、線圧1.0MPa、線速度4.0m/minのラミネート条件で、上記銅層付きPET基板にラミネートした。仮支持体を剥離して、ラインアンドスペースパターンマスク(Duty比 1:1、線幅1μm~10μmまで1μmおきに段階的に変化)を介して超高圧水銀灯で露光後、現像した。
現像は25℃の1.0%炭酸ナトリウム水溶液を用い、シャワー現像で30秒行った。
得られたパターン基板を、顕微鏡で観察したところ、解像性及びパターン形状が良好なパターンであった。 (Example 101: Contact exposure)
The photosensitive transfer material prepared in Example 1 was laminated on the PET substrate with the copper layer under lamination conditions of a roll temperature of 100° C., a linear pressure of 1.0 MPa, and a linear velocity of 4.0 m/min. The temporary support was peeled off, and after exposure with an ultra-high pressure mercury lamp through a line-and-space pattern mask (Duty ratio 1:1, line width changed stepwise from 1 μm to 10 μm at intervals of 1 μm), the film was developed.
Development was carried out by shower development using a 1.0% sodium carbonate aqueous solution at 25° C. for 30 seconds.
When the obtained patterned substrate was observed with a microscope, the pattern had good resolution and pattern shape.
実施例1で作製した感光性転写材料を、ロール温度100℃、線圧1.0MPa、線速度4.0m/minのラミネート条件で、上記銅層付きPET基板にラミネートした。直接描画露光機(日立ビアメカニクス(株)製、DE-1DH、光源:GaN青紫ダイオード(主波長405nm±5nm))により、ストーファー21段ステップタブレット又は所定のDI露光用のマスクパターンを用いて、照度80mW/cm2の条件で露光した。この露光は、上記のストーファー21段ステップタブレットをマスクとして露光、現像したときの最高残膜段数が6段となる露光量で行った。現像は25℃の1.0%炭酸ナトリウム水溶液を用い、シャワー現像で30秒行った。
得られたパターン基板を、顕微鏡で観察したところ、解像性及びパターン形状が良好なパターンであった。 (Example 102: Laser direct drawing)
The photosensitive transfer material prepared in Example 1 was laminated on the PET substrate with the copper layer under lamination conditions of a roll temperature of 100° C., a linear pressure of 1.0 MPa, and a linear velocity of 4.0 m/min. Direct writing exposure machine (DE-1DH, manufactured by Hitachi Via Mechanics Co., Ltd., light source: GaN blue-violet diode (dominant wavelength 405 nm ± 5 nm)) using a Stofer 21-step step tablet or a predetermined mask pattern for DI exposure. , and an illuminance of 80 mW/cm 2 . This exposure was carried out with an exposure amount such that the maximum number of remaining film steps was 6 when exposure and development were performed using the Stouffer 21 step tablet as a mask. Development was carried out by shower development using a 1.0% sodium carbonate aqueous solution at 25° C. for 30 seconds.
When the obtained patterned substrate was observed with a microscope, the pattern had good resolution and pattern shape.
100μm厚PET基材上に、第2層の導電層としてITOをスパッタリングで150nm厚にて成膜し、その上に第1層の導電層として銅を真空蒸着法で200nm厚にて成膜して、回路形成用基板とした。
銅層上に実施例1で得られた感光性転写材料を、カバーフィルムを剥離して、基板に貼り合わせて(ラミネートロール温度100℃、線圧0.8MPa、線速度3.0m/min.)、積層体とした。得られた積層体を、仮支持体を剥離して一方向に導電層パッドが連結された構成を持つ図2に示すパターンAを設けたフォトマスクを用いてコンタクトパターン露光した。露光にはi線(365nm)を露光主波長とする高圧水銀灯を用いた。
その後、現像、水洗を行ってパターンAを得た。次いで銅エッチング液(関東化学(株)製Cu-02)を用いて銅層をエッチングした後、ITOエッチング液(関東化学(株)製ITO-02)を用いてITO層をエッチングすることで、銅とITOが共にパターンAで描画された基板を得た。
次いで、残存しているレジスト(硬化したネガ型感光性層)上に、実施例1で得られた感光性転写材料を、カバーフィルムを剥離して、実施例101と同様の条件で再度貼り合わせた。アライメントを合わせた状態で、仮支持体を剥離して図3に示すパターンBを設けたフォトマスクを用いてパターン露光し、その後、現像、水洗を行ってパターンBを得た。次いで、Cu-02を用いて銅配線をエッチングし、残った硬化したネガ型感光性層を剥離液(関東化学(株)製KP-301)を用いて剥離し、回路配線基板を得た。
得られた回路配線基板を、顕微鏡で観察したところ、剥がれ、欠けなどは無く、きれいなパターンであった。 (Example 103)
On a 100 μm-thick PET substrate, a second conductive layer of ITO was formed by sputtering to a thickness of 150 nm, and a first conductive layer of copper was formed thereon by a vacuum deposition method to a thickness of 200 nm. and used as a substrate for forming a circuit.
The photosensitive transfer material obtained in Example 1 was laminated on the copper layer after peeling off the cover film (laminating roll temperature: 100° C., linear pressure: 0.8 MPa, linear velocity: 3.0 m/min.). ) to form a laminate. The resulting laminate was subjected to contact pattern exposure using a photomask having a pattern A shown in FIG. A high-pressure mercury lamp with i-line (365 nm) as the main exposure wavelength was used for exposure.
Then, the pattern A was obtained by developing and washing with water. Then, after etching the copper layer using a copper etching solution (manufactured by Kanto Chemical Co., Ltd. Cu-02), by etching the ITO layer using an ITO etching solution (manufactured by Kanto Chemical Co., Ltd. ITO-02), A substrate on which pattern A was drawn for both copper and ITO was obtained.
Next, the photosensitive transfer material obtained in Example 1 was laminated on the remaining resist (cured negative photosensitive layer) under the same conditions as in Example 101 after peeling off the cover film. rice field. In the aligned state, the temporary support was peeled off, pattern exposure was performed using a photomask having a pattern B shown in FIG. Then, the copper wiring was etched using Cu-02, and the remaining cured negative photosensitive layer was peeled off using a peeling solution (KP-301 manufactured by Kanto Kagaku Co., Ltd.) to obtain a circuit wiring board.
Observation of the resulting circuit wiring board with a microscope revealed that there was no peeling or chipping, and the pattern was clean.
本明細書に記載された全ての文献、特許出願、及び、技術規格は、個々の文献、特許出願、及び、技術規格が参照により取り込まれることが具体的かつ個々に記された場合と同程度に、本明細書中に参照により取り込まれる。 The disclosure of Japanese Patent Application No. 2021-011932 filed on January 28, 2021 is incorporated herein by reference in its entirety.
All publications, patent applications and technical standards mentioned herein are to the same extent as if each individual publication, patent application or technical standard were specifically and individually noted to be incorporated by reference. , incorporated herein by reference.
Claims (15)
- 仮支持体と感光性層を含む転写層とを有する感光性転写材料の転写層側が基板と接するように、前記感光性転写材料と前記基板とを貼合する貼合工程、
前記感光性層を露光する露光工程、及び、
前記感光性層を現像して樹脂パターンを形成する現像工程を含み、
前記露光工程における感光性層の限界解像度をXμmとして定義し、粒子及び空隙の基準直径をY=0.5×Xで表されるYμmとして定義した場合、前記露光工程における感光性層の表面及び内部におけるYμm以上の直径を有する粒子及び空隙の個数が、15個/cm2以下である
積層体の製造方法。 A bonding step of bonding the photosensitive transfer material and the substrate so that the transfer layer side of the photosensitive transfer material having the temporary support and the transfer layer containing the photosensitive layer is in contact with the substrate;
An exposure step of exposing the photosensitive layer, and
including a developing step of developing the photosensitive layer to form a resin pattern;
When the critical resolution of the photosensitive layer in the exposure step is defined as X μm, and the reference diameter of the particles and voids is defined as Y μm represented by Y=0.5×X, the surface of the photosensitive layer in the exposure step and A method for producing a laminate, wherein the number of particles having a diameter of Y μm or more and voids therein is 15/cm 2 or less. - 前記感光性層の厚さが、5.0μm以下である請求項1に記載の積層体の製造方法。 The method for producing a laminate according to claim 1, wherein the thickness of the photosensitive layer is 5.0 µm or less.
- 前記仮支持体の厚さが、16μm以下である請求項1又は請求項2に記載の積層体の製造方法。 The method for producing a laminate according to claim 1 or claim 2, wherein the temporary support has a thickness of 16 µm or less.
- 前記樹脂パターンが、線幅が10μm以下である樹脂パターンを有する請求項1~請求項3のいずれか1項に記載の積層体の製造方法。 The method for producing a laminate according to any one of claims 1 to 3, wherein the resin pattern has a line width of 10 µm or less.
- 前記貼合工程と前記露光工程との間に、前記仮支持体を剥離する剥離工程を含む請求項1~請求項4のいずれか1項に記載の積層体の製造方法。 The method for producing a laminate according to any one of claims 1 to 4, comprising a peeling step of peeling off the temporary support between the bonding step and the exposure step.
- 前記露光工程において、前記転写層とマスクとを接触させ露光処理を行う請求項1~請求項5のいずれか1項に記載の積層体の製造方法。 The method for manufacturing a laminate according to any one of claims 1 to 5, wherein in the exposure step, the transfer layer and the mask are brought into contact with each other for exposure processing.
- 前記転写層が、熱可塑性樹脂層、及び、水溶性樹脂層を更に含む請求項1~請求項6のいずれか1項に記載の積層体の製造方法。 The method for producing a laminate according to any one of claims 1 to 6, wherein the transfer layer further includes a thermoplastic resin layer and a water-soluble resin layer.
- 前記感光性層が、多官能重合性化合物を含む請求項1~請求項7のいずれか1項に記載の積層体の製造方法。 The method for producing a laminate according to any one of claims 1 to 7, wherein the photosensitive layer contains a polyfunctional polymerizable compound.
- 前記感光性層が、3官能以上の重合性化合物を含む請求項1~請求項8のいずれか1項に記載の積層体の製造方法。 The method for producing a laminate according to any one of claims 1 to 8, wherein the photosensitive layer contains a trifunctional or higher polymerizable compound.
- 前記感光性層が、ポリエチレンオキサイド構造を有する重合性化合物を含む請求項1~請求項9のいずれか1項に記載の積層体の製造方法。 The method for producing a laminate according to any one of claims 1 to 9, wherein the photosensitive layer contains a polymerizable compound having a polyethylene oxide structure.
- 請求項1~請求項10のいずれか1項に記載の積層体の製造方法により得られた積層体を準備する準備工程、及び、
前記樹脂パターンが配置されていない領域における前記基板をエッチング処理するエッチング工程をこの順に含む
回路配線の製造方法。 A preparation step of preparing a laminate obtained by the method for producing a laminate according to any one of claims 1 to 10, and
A method of manufacturing a circuit wiring, comprising, in this order, an etching step of etching the substrate in a region where the resin pattern is not arranged. - 請求項1~請求項10のいずれか1項に記載の積層体の製造方法により得られた積層体を準備する準備工程、及び、
前記樹脂パターンが配置されていない領域における前記基板をエッチング処理するエッチング工程をこの順に含む
電子デバイスの製造方法。 A preparation step of preparing a laminate obtained by the method for producing a laminate according to any one of claims 1 to 10, and
A method of manufacturing an electronic device, comprising, in this order, an etching step of etching the substrate in a region where the resin pattern is not arranged. - 仮支持体と感光性層を含む転写層とを有し、
前記感光性層の限界解像度をXTμmとして定義し、粒子の基準直径をYT=0.5×XTで表されるYTμmとして定義した場合、前記感光性層の表面及び内部におけるYTμm以上の直径を有する粒子の個数が、15個/cm2以下である
感光性転写材料。 Having a temporary support and a transfer layer containing a photosensitive layer,
If the limiting resolution of the photosensitive layer is defined as X T μm and the reference diameter of the particles is defined as Y T μm expressed by Y T =0.5×X T , then A photosensitive transfer material, wherein the number of particles having a diameter of Y T μm or more is 15/cm 2 or less. - 前記感光性層の厚さが、5.0μm以下である請求項13に記載の感光性転写材料。 The photosensitive transfer material according to claim 13, wherein the photosensitive layer has a thickness of 5.0 µm or less.
- 前記仮支持体の厚さが、16μm以下である請求項13又は請求項14に記載の感光性転写材料。 The photosensitive transfer material according to claim 13 or 14, wherein the temporary support has a thickness of 16 µm or less.
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JP2020091346A (en) * | 2018-12-04 | 2020-06-11 | 三菱製紙株式会社 | Positive dry film resist and etching method |
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