WO2022145399A1 - Black matrix sheet, self-luminous display body, and method for manufacturing self-luminous display body - Google Patents

Black matrix sheet, self-luminous display body, and method for manufacturing self-luminous display body Download PDF

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WO2022145399A1
WO2022145399A1 PCT/JP2021/048431 JP2021048431W WO2022145399A1 WO 2022145399 A1 WO2022145399 A1 WO 2022145399A1 JP 2021048431 W JP2021048431 W JP 2021048431W WO 2022145399 A1 WO2022145399 A1 WO 2022145399A1
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black matrix
self
matrix layer
sheet
luminous display
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PCT/JP2021/048431
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French (fr)
Japanese (ja)
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佳世 下川
明日香 遠藤
涼平 大幡
王彦 吉松
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日東電工株式会社
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Publication of WO2022145399A1 publication Critical patent/WO2022145399A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/33Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/58Optical field-shaping elements

Definitions

  • the present invention relates to a black matrix sheet, a self-luminous display body, and a method for manufacturing a self-luminous display body.
  • the micro LED display in which each pixel is composed of fine micro LED chips is a self-luminous display in which the micro LED chips are densely spread on the surface of the display substrate at intervals, and the manufacturing method is It has not been established and is under development. Further, from the viewpoint of improving the optical performance such as the image quality of the self-luminous display, it is necessary to arrange a black matrix for shading that suppresses light leakage from between the micro LED chips on the display substrate.
  • Patent Document 1 a technique is studied in which a black matrix is formed at intervals between LED chips by using a thermosetting black ink between the LED chips after crimping the LED chips onto a substrate.
  • Patent Document 1 describes an active energy ray-curable inkjet ink for a black matrix containing a black colorant, a polymerizable compound, and a photopolymerization initiator, wherein the polymerizable compound is an active energy ray-curable ink containing an amide monomer. Ink composition is described.
  • Patent Document 2 describes a technique for transferring a sheet-like material onto a substrate.
  • Patent Document 3 describes a technique for transferring a functional layer to a target material by thermal transfer.
  • Patent Document 1 it takes a lot of man-hours, it is difficult to perform fine processing, and the yield is low, and a black matrix cannot be applied or formed on the pad portion on which the micro LED is mounted, which causes a problem in terms of optical characteristics. there were. Further, in the technique described in Patent Document 2, an olefin-based resin type is used, and there is a problem in adhesion to a substrate. In the technique described in Patent Document 3, the light-shielding property and coloring required for black matrix applications have not been studied.
  • the conventional technique has a problem in terms of cost due to an increase in processes and a decrease in yield, and further improvement in productivity and optical characteristics has been required.
  • the present invention has been made in view of the above, and is a highly productive black matrix that has excellent light-shielding properties, improves optical characteristics, can reduce man-hours to form a black matrix layer, and can improve yield.
  • the purpose is to provide a sheet.
  • Another object of the present invention is to provide a self-luminous display body and a method for manufacturing a self-luminous display body using this black matrix sheet.
  • the present inventors have conducted diligent studies to solve the above problems. As a result, by providing a release sheet and a black matrix layer and making a black matrix sheet having a specific storage elastic modulus of the black matrix layer, excellent light-shielding property is improved, optical characteristics are improved, and man-hours are reduced.
  • a highly productive black matrix sheet that can form a black matrix layer on the surface of a thermocompression bonding object and can improve the yield can be obtained, and has completed the present invention.
  • the present invention is as follows. [1] A mold release sheet and a black matrix layer containing a polymer component and a colorant are provided. A black matrix sheet having a storage elastic modulus of the black matrix layer at 150 ° C. of 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa. [2] The black matrix sheet according to [1], wherein the release elastic modulus of the release sheet at 150 ° C. is 7 ⁇ 10 6 to 2 ⁇ 10 8 Pa. [3] The black matrix sheet according to [1] or [2], wherein the polymer component has a polar unit and a non-polar unit. [4] The black matrix sheet according to any one of [1] to [3], wherein the polymer component contains a polyamide resin.
  • a self-luminous display body including a black matrix layer and a self-luminous body.
  • the black matrix layer contains a polymer component and a colorant.
  • the storage elastic modulus of the black matrix layer at 150 ° C. is 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa.
  • the polymer component has a polar unit and a non-polar unit.
  • Self-luminous display [12] A self-luminous display body including a black matrix layer and a self-luminous body. A self-luminous display body in which the black matrix layer does not exist on the surface of the self-luminous body and the black matrix layer is provided only around the self-luminous body.
  • [14] [1] A method for manufacturing a self-luminous display body using the black matrix sheet according to any one of [10].
  • [15] A method for manufacturing a self-luminous display using a black matrix sheet including a release sheet and a black matrix layer containing a polymer component and a colorant.
  • a method for manufacturing a self-luminous display body which comprises the following steps (I) and (II).
  • II) A step of peeling off the release sheet.
  • the present invention it is possible to provide a highly productive black matrix sheet which is excellent in light-shielding property, improves optical characteristics, can reduce man-hours to form a black matrix layer, and can realize an improvement in yield.
  • FIG. 1 is a schematic cross-sectional view showing an example of a black matrix sheet.
  • FIG. 2 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention, on a laminate including (a) a substrate, a TFT, an anisotropic conductive layer, and a pad. A state in which a black matrix sheet is arranged between the arranged micro LED chip and a heat pressurizing head, (b) a pad arranged on a laminate including a substrate, a TFT, an anisotropic conductive layer, and a pad.
  • FIG. 3 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention, on a laminate including (a) a substrate, a TFT, an anisotropic conductive layer, and a pad.
  • FIG. 4 is a schematic cross-sectional view showing an example of a self-luminous display body according to an embodiment of the present invention.
  • the black matrix layer transferred from the black matrix sheet onto the surface of the thermocompression bonding object may be referred to as a “transfer black matrix layer”.
  • the black matrix sheet according to the embodiment of the present invention includes a release sheet and a black matrix layer containing a polymer component and a colorant.
  • the storage elastic modulus of the black matrix layer at 150 ° C. is 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa.
  • the black matrix sheet 10 is a laminate of the release sheet 11 and the black matrix layer 12.
  • the black matrix sheet according to the embodiment of the present invention has excellent mold releasability because it is provided with a mold releasable sheet. It can be used as a heat-resistant release sheet that is placed between the pressure head and the thermocompression bonding object to prevent them from sticking together. Since the black matrix layer having a storage elastic modulus at 150 ° C. of 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa is provided, the black matrix layer is melted during thermocompression bonding and transferred to the surface of the thermocompression bonding object to transfer black. A matrix layer can be formed.
  • the thermocompression bonding object is, for example, an electronic component such as a substrate, a semiconductor chip, or a self-luminous body.
  • the black matrix sheet can be used, for example, for manufacturing semiconductor chips by thermocompression bonding, mounting flip chips, connecting electronic components such as self-luminous bodies, and the like. Among them, it can be preferably used for forming a black matrix layer in a self-luminous display body including a self-luminous body.
  • thermocompression bonding When the object to be thermocompression bonded is a substrate and fine chip parts such as a self-luminous body, a black matrix sheet is placed between the heat-pressurized head and the chip component when the chip component is thermocompression bonded to the substrate or substrate mask.
  • chip components can be mounted and a black matrix layer can be formed on the substrate and the substrate mask.
  • the black matrix layer between the thermocompression bonding head and the chip component melts during thermocompression bonding and flows onto the substrate and the substrate mask to solidify. Therefore, the residue of the transfer black matrix layer is unlikely to remain on the chip component.
  • the black matrix layer can be formed at the time of thermocompression bonding between the substrate and the chip component instead of applying ink or the like on the surface of the substrate, there is no need to separately provide a process for forming the black matrix layer. It is possible to form a black matrix layer even in a fine place such as an interval between chip parts, which was difficult to apply. Therefore, it is possible to suppress a decrease in yield and form a black matrix layer having high productivity and excellent optical characteristics.
  • the storage elastic modulus of the black matrix layer at 150 ° C. is 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa.
  • the thickness uniformity of the transferred black matrix layer was improved.
  • the residue of the transferred black matrix layer on the chip component is reduced, and it is possible to improve the productivity and the optical characteristics. became.
  • the storage elastic modulus of the black matrix layer at 150 ° C. exceeds 1 ⁇ 10 6 Pa, more preferably 5 ⁇ 10 5 Pa or less, and further preferably 1 ⁇ 10 5 Pa or less. Further, it is preferably 1 ⁇ 10 3 Pa or more, more preferably 3 ⁇ 10 3 Pa or more, and further preferably 5 ⁇ 10 3 Pa or more.
  • the storage elastic modulus at 150 ° C. exceeds 1 ⁇ 10 6 Pa, the residue generation rate of the transferred black matrix layer on the chip component increases and the productivity decreases. Further, if the storage elastic modulus at 150 ° C. is less than 1 ⁇ 10 3 Pa, the uniformity of the thickness of the transfer black matrix layer of the substrate mask portion is impaired, and when applied to a self-luminous display or the like, the optical characteristics are improved. Inferior visibility is reduced.
  • the storage elastic modulus of the black matrix layer refers to the storage elastic modulus measured by the following method using a laminated product in which a resin material (black matrix layer) constituting a measurement target portion is laminated to 500 ⁇ m as a measurement sample. Specifically, the laminated product is cut to a diameter of 25 mm to prepare a test piece. Using a jig with a diameter of 25 mm, temperature dispersion at 25 to 200 ° C. is carried out with a viscoelastic device ARES-G2 manufactured by TA Instruments. At that time, the rate of temperature rise is 5 ° C./min, the frequency is 1 Hz, and the elastic modulus at 150 ° C. at this time is defined as the storage elastic modulus.
  • the black matrix layer according to the embodiment of the present invention contains a polymer component and a colorant.
  • the polymer component contained in the black matrix layer (which may be the material of the black matrix layer) preferably has a non-polar unit and a polar unit.
  • the polar unit comprises a polar group. Due to the polymer component having polar and non-polar units, the transferred black matrix layer exhibits excellent adhesion to the surface of the thermocompression bonding object.
  • the content of the polymer component in the black matrix layer is preferably 20% by mass to 99% by mass, more preferably 30% by mass to 95% by mass, and further preferably 40% by mass to 93% by mass. Particularly preferably, it is 50% by mass to 90% by mass, and most preferably 60% by mass to 88% by mass.
  • non-polar unit in the polymer component examples include a polyethylene unit, a polypropylene unit, a polystyrene unit and the like.
  • the non-polar unit may be only one type or two or more types.
  • Examples of the polar group included in the polar unit in the polymer component include an epoxy group, a carboxyl group, a nitrile group, an amide group, an ester group, a hydroxyl group, an acid anhydride and a silanol group.
  • Examples of the polar unit having such a polar group include a glycidyl methacrylate unit, a vinyl acetate unit, an acrylonitrile unit, an amide unit, a (meth) acrylic acid ester unit, a hydroxyethyl (meth) acrylate unit, and a maleic anhydride unit.
  • the polar unit may be of only one type or may be two or more types.
  • the polymer component that can be contained in the black matrix layer (which may be the material of the black matrix layer) is selected from at least an amide group-containing polymer, a methoxymethyl group-containing polymer, a hydroxyl group-containing polymer, a carboxyl group-containing polymer, and an amino group-containing polymer. It may be one kind.
  • Such a polymer component which may be contained in the black matrix layer (which may be the material of the black matrix layer), is preferably an addition-type curing agent, and more preferably an addition-type curing agent that reacts with an epoxy group. ..
  • the amide group-containing polymer examples include polyamide resins.
  • the polymer component preferably contains a polyamide resin.
  • a commercially available product may be adopted. Examples of such commercially available products include the "Amiran” series (Toray Industries, Inc.).
  • the amide group-containing polymer may be one kind or two or more kinds.
  • the weight average molecular weight (Mw) of the amide group-containing polymer is preferably 10,000 to 200,000, more preferably 20,000 to 100,000 in that the effect of the present invention can be more exhibited.
  • methoxymethyl group-containing polymer examples include methoxymethylated polyamide resin and the like.
  • methoxymethyl group-containing polymer a commercially available product may be adopted. Examples of such commercially available products include the "Fine Resin” (registered trademark) series (manufactured by Namariichi Co., Ltd.).
  • the methoxymethyl group-containing polymer may be one kind or two or more kinds.
  • the weight average molecular weight (Mw) of the methoxymethyl group-containing polymer is preferably 10,000 to 200,000, more preferably 20,000 to 150,000, and further preferably 30,000 to 30,000 in that the effects of the present invention can be more exhibited. It is 100,000.
  • hydroxyl group-containing polymer examples include hydroxyl group-containing acrylic polymers.
  • hydroxyl group-containing polymer a commercially available product may be adopted. Examples of such commercially available products include "ARUFON (registered trademark) UH-2000 series” (manufactured by Toagosei Corporation).
  • the hydroxyl group-containing polymer may be one kind or two or more kinds.
  • the hydroxyl group-containing polymer has a weight average molecular weight (Mw) of preferably 500 to 1,000,000, more preferably 700 to 500,000, still more preferably 1,000 to 100,000 in that the effect of the present invention can be more exhibited. It is particularly preferably 1500 to 70,000, and most preferably 2000 to 50,000.
  • Mw weight average molecular weight
  • Examples of the carboxyl group-containing polymer include a carboxyl group-containing acrylic polymer.
  • a commercially available product may be adopted. Examples of such a commercially available product include "ARUFON (registered trademark) UC-3000 series” (manufactured by Toagosei Co., Ltd.).
  • the carboxyl group-containing polymer may be one kind or two or more kinds.
  • the weight average molecular weight (Mw) of the carboxyl group-containing polymer is preferably 500 to 1,000,000, more preferably 700 to 500,000, still more preferably 1,000 to 100,000 in that the effect of the present invention can be more exhibited. It is particularly preferably 1500 to 70,000, and most preferably 2000 to 50,000.
  • Mw the polystyrene-equivalent molecular weight in the GPC measurement can be used.
  • any suitable polymer can be adopted as long as it is a polymer containing an amino group (-NH 2 ), as long as the effect of the present invention is not impaired.
  • a commercially available product may be adopted.
  • the amino group-containing polymer may be one kind or two or more kinds.
  • the black matrix layer (which may be the material of the black matrix layer) may contain at least one selected from a tertiary amine-containing compound and a strong acid.
  • Such a tertiary amine-containing compound or strong acid that can be contained in the black matrix layer is preferably a catalytic curing agent, and more preferably a catalyst that reacts with an epoxy group. It is a mold curing agent.
  • the tertiary amine-containing compound examples include imidazole derivatives and polyethyleneimine.
  • a commercially available product may be adopted. Examples of such commercially available products include the "Curesol” series (imidazole-based epoxy resin curing agent, manufactured by Shikoku Chemicals Corporation) as an imidazole derivative, and the "Epomin” (registered trademark) series as a polyethyleneimine. (Manufactured by Nippon Shokubai Co., Ltd.) and the like.
  • the tertiary amine-containing compound may be one kind or two or more kinds.
  • Examples of the strong acid include trifluoroborane, ionic liquid, naphthion and the like.
  • Examples of the ionic liquid include BF 3 -C 2 H 5 NH 2 , HMI (1-hexyl-3 methylimidazolium) -PF 6 .
  • As the strong acid a commercially available product may be adopted.
  • the strong acid may be one kind or two or more kinds.
  • the colorant examples include coloring materials such as dyes and pigments, and it is preferable that the colorant contains at least one selected from dyes and pigments.
  • the dyes include azo dyes, anthraquinone dyes, quinonephthalone dyes, styryl dyes, diphenylmethane dyes, triphenylmethane dyes, oxazine dyes, triazine dyes, xanthane dyes, methane dyes, and azomethine dyes.
  • examples thereof include dyes, acridin-based dyes, diazine-based dyes, phthalocyanine-based dyes, and preferably azo-based dyes and phthalocyanine-based dyes.
  • the dye a commercially available product can be used, and specific examples thereof include the Varifast series (manufactured by Orient Chemical Industry Co., Ltd.).
  • Pigments include, for example, zinc carbonate, zinc oxide, zinc sulfide, talc, kaolin, calcium carbonate, titanium oxide, silica, lithium fluoride, calcium fluoride, barium sulfate, alumina, zirconia, iron oxide, iron hydroxide, etc.
  • Inorganic pigments such as chromium oxide, calcium phosphate, bone black, graphite and iron black, for example, organic pigments such as carbon black, acetylene black, lamp black, aniline black and cyanine black can be mentioned.
  • the pigment a commercially available product can be used. Specifically, the carbon black dispersion liquid No. 1 manufactured by Mikuni Color Co., Ltd. 3684, No. 3685, MHI Black # 217 and the like can be mentioned.
  • a color material that exhibits black color by itself may be used, or a color material that exhibits black color by mixing a plurality of color materials such as red, green, and blue may be used.
  • the colorants can be used alone or in combination of two or more.
  • Examples of the colorant that can be used alone include carbon black, acetylene black, lamp black, bone black, graphite, iron black, aniline black, cyanine black and the like.
  • the colorant according to the embodiment of the present invention preferably contains carbon black.
  • the average particle size of the colorant is preferably 1000 nm or less, more preferably 500 nm or less, still more preferably 300 nm or less from the viewpoint of surface smoothness of the transferred black matrix layer, and preferably 10 nm from the viewpoint of light shielding property. As mentioned above, it is more preferably 30 nm or more, still more preferably 50 nm or more.
  • the blending ratio of the colorant is appropriately selected in consideration of dispersion uniformity, and specifically, from the viewpoint of transmittance, it is preferably 200 parts by mass or less, more preferably 100 parts by mass with respect to 100 parts by mass of the polymer component. Hereinafter, it is more preferably 80 parts by mass or less, preferably 5 parts by mass or more, more preferably 10 parts by mass or more, still more preferably 15 parts by mass or more.
  • the black matrix layer preferably has an average thickness of 0.1 to 10 ⁇ m.
  • the average thickness of the black matrix layer is more preferably 0.1 ⁇ m or more, still more preferably 0.5 ⁇ m or more, from the viewpoint of improving the light-shielding property. Further, from the viewpoint of improving the visibility after transfer, it is more preferably 10 ⁇ m or less, still more preferably 5 ⁇ m or less.
  • a dial thickness gauge for example, Peacock GC-9
  • measure the thickness of the release sheet from which the black matrix layer has been removed and measure the difference in black. It can be measured as the thickness of the matrix layer.
  • the average thickness of the black matrix layer is an average value measured at 10 points.
  • the total light transmittance of the black matrix layer is preferably 0.01 or more and less than 5%. Further, in the black matrix sheet according to the embodiment of the present invention, the black matrix layer has a thickness of 0.1 to 10 ⁇ m, and the total light transmittance of the black matrix sheet is 0.01 or more 5 from the viewpoint of improving the light shielding property. It is preferably less than%. In the embodiment of the present invention, the total light transmittance of the black matrix sheet when the thickness of the black matrix layer is 10 ⁇ m or less is preferably less than 5%, more preferably 3% or less, still more preferably 1% or less, still more. It is preferably 0.5% or less, and particularly preferably 0.3% or less.
  • the black matrix sheet according to the embodiment of the present invention includes a release sheet and the black matrix layer.
  • the black matrix sheet is used to thermocompression-bond the chip component to the substrate and transfer black matrix in the same manner as the release sheet is used when the chip component is thermocompression-bonded to the substrate. Layers can be formed.
  • the release sheet preferably has a melting point of 150 ° C. or higher, and a storage elastic modulus at 150 ° C. of 1 GPa or less.
  • the storage elastic modulus of the release sheet at 150 ° C. is preferably 7 ⁇ 10 6 to 2 ⁇ 10 8 Pa.
  • the storage elastic modulus of the release sheet at 150 ° C. is preferably 1.5 ⁇ 10 8 Pa or less, more preferably 1.2 ⁇ 10 8 Pa or less, and further preferably 1 ⁇ 10 8 Pa or less. .. Further, it is preferably 8 ⁇ 10 6 Pa or more, more preferably 9 ⁇ 10 6 Pa or more, and further preferably 1 ⁇ 10 7 Pa or more.
  • the storage elastic modulus of the release sheet refers to the storage elastic modulus measured by the following method using the release sheet as a measurement sample. Specifically, the release sheet is cut into strips having a length of 10 mm (measurement length) x width of 5 mm with a cutter knife, and a solid viscoelasticity measuring device (RSAIII, manufactured by TA Instruments Co., Ltd.) is used at 25 ° C. The storage elastic modulus at ⁇ 500 ° C. is measured. The measurement conditions were a frequency of 1 Hz and a heating rate of 5 ° C./min. At this time, the elastic modulus at 150 ° C. is defined as the storage elastic modulus (Pa) of the release sheet.
  • RSAIII solid viscoelasticity measuring device
  • the melting point of the release sheet is more preferably 180 ° C. or higher, still more preferably 200 ° C. or higher. Further, since it is sufficient to have heat resistance at a temperature corresponding to the molding processing temperature, it is preferably 500 ° C. or lower, more preferably 450 ° C. or lower, and further preferably 430 ° C. or lower.
  • the thickness of the release sheet is preferably 10 ⁇ m or more, more preferably 15 ⁇ m or more, further preferably 20 ⁇ m or more, and particularly preferably 30 ⁇ m or more.
  • it is preferably 200 ⁇ m or less, more preferably 100 ⁇ m or less, in order to obtain a black matrix sheet that easily develops curved surface followability and step followability and can be applied to a member having a complicated three-dimensional curved surface shape. It is more preferably 80 ⁇ m or less, and even more preferably 70 ⁇ m or less.
  • the black matrix sheet can be manufactured by any suitable method. For example, a method of dipping the release sheet into a solution containing the material and solvent of the black matrix layer and then drying as necessary, the material and solvent of the black matrix layer on the surface of the release sheet. A method of brushing the containing solution and then drying as needed, a method of applying the black matrix layer material to the surface of the release sheet with various coaters of the solution containing the solvent and then drying as needed, the release sheet. Examples thereof include a method of spray-applying a solution containing the material of the black matrix layer and a solvent to the surface of the surface and then drying as necessary.
  • Examples of the black matrix composition include a solution in which the material of the black matrix layer is dissolved in a solvent.
  • Solvents include, for example, alcohols such as water, methanol, ethanol and isopropyl alcohol; ketones such as methyl ethyl ketone; esters; aliphatic, alicyclic and aromatic hydrocarbons; halogenated hydrocarbons; amides such as dimethylformamide. Classes; sulfoxides such as dimethyl sulfoxide; ethers such as dimethyl ether and tetrahydrofuran; and the like; in order to suppress the formation of gelled products, ethanol or a mixed solvent of ethanol and water is preferable.
  • the solvent may be only one kind or two or more kinds.
  • the solid content concentration in the black matrix composition can be appropriately set according to the purpose.
  • the mass ratio is preferably 1% by mass to 50% by mass, more preferably 5% by mass to 30% by mass, and further preferably 10% by mass to 25% by mass. be.
  • Black matrix compositions may include pH regulators, cross-linking agents, viscosity regulators (thickeners, etc.), leveling agents, release regulators, plasticizers, softeners, fillers, colorants (pigments, etc.), as required. It may contain various additives such as dyes), surfactants, antistatic agents, preservatives, antiaging agents, ultraviolet absorbers, antioxidants, light stabilizers and the like.
  • the black matrix sheet according to the embodiment of the present invention can be used when a chip component such as a self-luminous body is mounted on a substrate by thermocompression bonding using, for example, a conductive adhesive.
  • the substrate on which the black matrix layer can be formed is not particularly limited, and is, for example, a silicon substrate for semiconductor wafers, a sapphire substrate for LEDs, a SiC substrate and a metal base substrate, and a TFT (Thin Film Transistor) substrate for displays. And a color filter substrate, and a base substrate for an organic EL panel.
  • the self-luminous display body is a self-luminous display body including a black matrix layer and a self-luminous display body, and the black matrix layer contains a polymer component and a colorant and is a black matrix layer.
  • the storage elastic modulus at 150 ° C. is 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa.
  • the polymer component preferably has a polar unit and a non-polar unit.
  • the self-luminous display body is a self-luminous display body including a black matrix layer and a self-luminous body.
  • the black matrix layer is not present on the surface of the self-luminous body, and the black matrix layer is provided only around the self-luminous body.
  • the black matrix layer included in the self-luminous display according to the embodiment of the present invention is preferably a transferred black matrix layer transferred using the above black matrix sheet. Since the self-luminous display body according to the embodiment of the present invention contains a black matrix layer having excellent light-shielding properties, it has excellent optical characteristics. Further, the transferred black matrix layer has an advantage of improving productivity by being formed by the above-mentioned black matrix layer.
  • the self-luminous display body preferably includes a transfer black matrix layer formed by the above-mentioned black matrix layer.
  • the transfer black matrix layer can be formed, for example, on a substrate in a self-luminous display.
  • Chip components such as self-luminous bodies can be mounted on the substrate by thermocompression bonding using, for example, a conductive adhesive.
  • the conductive adhesive include a conductive adhesive paste, a conductive adhesive film, an anisotropic conductive material and the like.
  • the anisotropic conductive material is a material in which conductive particles are mixed with a binder resin such as epoxy, and is, for example, an anisotropic conductive paste (ACP), an anisotropic conductive film (ACF), an anisotropic conductive ink, or a different material.
  • ACP anisotropic conductive paste
  • ACF anisotropic conductive film
  • An anisotropic conductive sheet and the like can be mentioned.
  • Examples of the self-luminous body include an LED chip, a micro LED chip, and the like.
  • Examples of the substrate include transparent substrates such as glass and transparent films.
  • the self-luminous display body includes a substrate 21, a TFT (Thin Film Transistor) 22, and an anisotropic conductive layer 23 formed of an anisotropic conductive material.
  • the polymer component in the black matrix layer preferably has a polar unit and a non-polar unit, and the transferred black matrix layer 12 and the anisotropic conductive layer 23 show excellent adhesion.
  • the TFT 22 is provided on the substrate 21, and the TFT 22, the pad 30, and the micro LED chip 31 are physically and electrically connected via the anisotropic conductive layer 23 provided in the peripheral portion, and are connected on the TFT 22.
  • the micro LED chip 31 is mounted on the pad 30 of the above.
  • the black matrix layer 12 has a storage elastic modulus at 150 ° C. of 1 ⁇ 10 3 to 1 ⁇ 10 6 Pa, it melts during thermocompression bonding and flows onto the anisotropic conductive layer 23 to solidify. Therefore, the residue of the black matrix layer 12 is unlikely to be generated on the micro LED chip 31.
  • the self-luminous body may be a micro LED chip or a micro LED display.
  • black matrix layer and the transfer black matrix layer the above description can be used as they are.
  • the black matrix sheet is used as a method for manufacturing a self-luminous display body according to an embodiment of the present invention.
  • a method for producing a self-luminous display according to another embodiment of the present invention is a self-luminous display using a release sheet and a black matrix sheet including a black matrix layer containing a polymer component and a colorant.
  • the production method of is included in the following steps (I) and (II).
  • a step of peeling off the release sheet A step of peeling off the release sheet.
  • FIG. 2 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention.
  • FIG. 2A shows a state in which the substrate 21, the TFT 22, the micro LED chip 31 arranged on the laminate including the anisotropic conductive layer 23, the pad 30, and the black matrix sheet 10 are arranged. show.
  • FIG. 2B shows a state in which the micro LED chip 31 is thermocompression bonded to a pad 30 arranged on a laminate including a substrate 21, a TFT 22, an anisotropic conductive layer 23, and a pad 30. Is shown.
  • FIG. 2A shows a state in which the substrate 21, the TFT 22, the micro LED chip 31 arranged on the laminate including the anisotropic conductive layer 23, the pad 30, and the black matrix sheet 10 are arranged.
  • FIG. 2B shows a state in which the micro LED chip 31 is thermocompression bonded to a pad 30 arranged on a laminate including a substrate 21, a TFT 22, an anisotropic conductive layer 23, and
  • FIG. 2C shows a state in which the micro LED chip 31 is mounted on the laminate by thermocompression bonding and the black matrix layer 12 (transfer black matrix layer) is formed on the anisotropic conductive layer 23.
  • FIG. 2D shows a state in which the release sheet 11 is peeled off and a self-luminous display body is manufactured.
  • thermocompression bonding In the step of transferring the black matrix layer by thermocompression bonding using a black matrix sheet to manufacture a self-luminous display body, the heating and the pressure bonding in the thermocompression bonding may or may not be simultaneous. .. Further, heating and crimping may be performed a plurality of times each.
  • the crimping may be reduced pressure or pressurized. For example, it may be crimped after heating, may be heated after crimping, may be crimped after heating, and may be further heated.
  • Examples of the crimping by reducing the pressure include crimping by creating a vacuum in the space between the laminate and the micro LED chip 31 and the black matrix sheet 10.
  • pressurization include crimping by pressurizing the black matrix sheet 10 with compressed air, a heat pressurizing head, a press machine, or the like.
  • a black matrix layer is subjected to heat-pressing in a state where a black matrix sheet is placed between the heat-pressing head and a self-luminous body and a laminated body which are objects of heat-pressing. Can be melted and transferred to the surface of the laminate to produce a self-luminous display body provided with a transfer black matrix layer.
  • FIG. 3 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention.
  • black is shown between the substrate 21, the TFT 22, the micro LED chip 31 arranged on the laminate including the anisotropic conductive layer 23, and the pad 30, and the heat pressurizing head 40.
  • the state in which the matrix sheet 10 is arranged is shown.
  • FIG. 3B shows the micro LED chip on a pad 30 arranged on a laminate including a substrate 21, a TFT 22, an anisotropic conductive layer 23, and a pad 30 using a heat-pressurized head 40.
  • the state where the thermocompression bonding of 31 is performed is shown.
  • FIG. 3C shows a state in which the micro LED chip 31 is mounted on the laminate by thermocompression bonding and the black matrix layer 12 (transfer black matrix layer) is formed on the anisotropic conductive layer 23.
  • FIG. 3D shows a state in which the release sheet 11 is peeled off and a self-luminous display body is manufactured.
  • the heat pressurizing head 40 and the micro LED chip 31 are used.
  • the micro LED chip 31 is placed on a pad 30 arranged on a laminate including a substrate 21, a TFT 22, and an anisotropic conductive layer 23 using the heat pressurizing head with a black matrix sheet arranged between the two. May be thermally pressure-bonded to form a black matrix layer 12 (transfer black matrix layer) on the anisotropic conductive layer 23.
  • the black matrix sheet according to the embodiment of the present invention has excellent mold releasability because it includes a mold releasable sheet. It can be used as a heat-resistant release sheet that is placed between the object to be crimped and prevents the two from sticking. Then, at the time of thermocompression bonding, the black matrix layer is melted and transferred to the surface of the thermocompression bonding object to form a transfer black matrix layer.
  • the black matrix sheet according to the embodiment of the present invention may be supplied and arranged by transport between the heat pressurizing head 40 and the micro LED chip which is a thermocompression bonding object.
  • the black matrix sheet supplied and arranged by transport is, for example, strip-shaped.
  • the thermocompression bonding is preferably performed at a temperature of, for example, 100 ° C to 200 ° C. That is, the heating set temperature of the thermocompression bonding head 40 at the time of thermocompression bonding, in other words, the operating temperature of the black matrix sheet 10 is preferably 100 ° C to 200 ° C.
  • the operating temperature of the black matrix sheet 10 is not limited to these ranges. It is also possible to use the black matrix sheet 10 at a lower operating temperature than the above example.
  • the black matrix layer 12 is formed on the anisotropic conductive layer 23 by peeling the release sheet 11.
  • a self-luminous display body provided can be obtained.
  • the release of the release sheet 11 is not particularly limited, such as peeling by hand or using a dedicated peeling facility.
  • the black matrix layer 12 (transferred black matrix layer) is formed on the surface of the anisotropic conductive layer 23 on the laminated body by the black matrix layer provided in the black matrix sheet. , A self-luminous display can be obtained.
  • the black matrix layer is thermoplastic, it is melted by thermocompression bonding using the thermocompression bonding head 40, flows onto the anisotropic conductive layer 23, and solidifies. Therefore, the residue of the black matrix layer 12 is unlikely to be generated on the micro LED chip 31.
  • the black matrix layer 12 (transfer black matrix layer) is formed by the black matrix layer using a sheet-shaped black matrix sheet instead of being coated on the anisotropic conductive layer 23, it is possible to prevent coating unevenness. .. Therefore, productivity can be improved. In addition, no organic solvent or monomer is required, and the workability is excellent, and the environmental load and work load can be reduced.
  • ⁇ Total light transmittance> The black matrix sheet produced in Examples and Comparative Examples was cut into a size of width: 50 mm and length: 50 mm, and using a DOT-3 UV-VIS type manufactured by Murakami Color Science Institute, all light rays based on JIS K 7361. The transmittance was measured.
  • the storage elastic modulus was measured by the following operation.
  • the black matrix layer from which the release sheet was peeled off was laminated, and the laminated product laminated to about 500 ⁇ m was used as a measurement sample.
  • the laminated product was cut to a diameter of 25 mm to prepare a test piece.
  • temperature dispersion at 25 to 200 ° C. was carried out with a viscoelastic device ARES-G2 manufactured by TA Instruments. At that time, the temperature rising rate was 5 ° C./min and the frequency was 1 Hz.
  • the elastic modulus at 150 ° C. was defined as the storage elastic modulus (Pa) of the black matrix layer.
  • ⁇ Retractable elastic modulus of mold release sheet> Cut the release sheet into strips with a length of 10 mm (measurement length) x width of 5 mm with a cutter knife, and store them at 25 ° C to 500 ° C using a solid viscoelasticity measuring device (RSAIII, manufactured by TA Instruments Co., Ltd.). The elastic modulus was measured. The measurement conditions were a frequency of 1 Hz and a heating rate of 5 ° C./min. At this time, the elastic modulus at 150 ° C. was defined as the storage elastic modulus (Pa) of the release sheet.
  • Pa storage elastic modulus
  • ⁇ Residue on chip> The evaluation sample prepared above was observed with a digital microscope (VHX-100F manufactured by KEYENCE CORPORATION). The results of observing the residue on the chip surface with a digital microscope were evaluated according to the following evaluation criteria. ⁇ : No black matrix layer residue on the chip surface ⁇ : Residue is more than 0% and 50% or less of the total chip surface area ⁇ : Residue is more than 50% of the total chip surface area
  • ⁇ Step followability> The evaluation sample prepared above was observed with a digital microscope (VHX-100F manufactured by KEYENCE CORPORATION). The results of observing with a digital microscope the presence or absence of bubbles generated in the black matrix layer around the chip due to the step between the chip and the substrate (epoxy resin sheet) were evaluated according to the following evaluation criteria. ⁇ : No bubbles around the chip (not observable) ⁇ : Bubble generation width around the chip is more than 0 ⁇ m and less than 0.5 ⁇ m ⁇ : Bubble generation width around the chip is 0.5 ⁇ m or more
  • ⁇ Adhesion> The part where the chip of the evaluation sample produced above is not mounted is cut out to a width of about 20 mm and a length of about 20 mm, and cross-cut evaluation is performed by the cross-cut method described in JIS K5600-5-6 to obtain adhesion. evaluated.
  • ⁇ Film thickness> The film thickness of the black matrix layer in the black matrix sheet was measured with a dial gauge (GC-9 manufactured by Peacock). The thickness of the black matrix sheet was measured, the thickness ( ⁇ m) of the release sheet from which the black matrix layer was removed at that location was measured, and the difference was taken as the thickness ( ⁇ m) of the black matrix layer.
  • the average thickness ( ⁇ m) is an average value measured at 10 points.
  • Fine Resin 105 FR105 methoxymethylated polyamide resin (PA6) manufactured by Namariichi Co., Ltd.
  • Solmix AP-1 mixed solvent of industrial ethanol
  • Carbon black (CB average particle size 105 nm) No. 50 parts by mass of 3648 was added and stirred at room temperature to prepare a solution (1) having a solid content concentration of 15% by mass.
  • the prepared solution (1) is filtered through a nylon mesh with an opening of 188 ⁇ m, and then placed on a release sheet (Nitto Denko Corporation, Nitto Flon No. 900UL (thickness 0.05 mm, dimensions: width 250 mm ⁇ length 450 mm)). After coating with an applicator and air-drying, the mixture was further dried at 80 ° C. for 3 minutes in a constant temperature dryer to prepare a black matrix sheet (1) having a thickness of 2.1 ⁇ m and a black matrix layer and a release sheet.
  • Examples 2 to 13, 101 to 103, Comparative Examples 1 and 2 A black matrix sheet was produced in the same manner as in Example 1 except that the black matrix layer and the release sheet were changed as shown in Tables 1 to 3.
  • the evaluation results of the prepared black matrix sheet are shown in Tables 1 to 3 below.
  • the amount of CB added in the table is the amount with respect to 100 parts by mass of the polymer.
  • FR105 Methoxymethylated polyamide resin (Fine Resin 105 manufactured by Lead City Co., Ltd.)
  • CM8000 Polyamide copolymer resin (Amilan manufactured by Toray Industries, Inc.)
  • Uniamide Polyamide resin (manufactured by Unitika Ltd.)
  • V01 Polyamide resin (bagging film manufactured by Motoki Corporation)
  • [Release sheet] 900UL Fluororesin sheet film (Polytetrafluoroethylene (PTFE) Niftron 900UL manufactured by Nitto Denko Corporation) FMN50WD: PET film (manufactured by Fujiko Co., Ltd.) TPX X-88BMT4: Special polyolefin film (manufactured by Mitsui Chemicals Tocello Co., Ltd.) E930H50: Easy-to-mold PET film (manufactured by Mitsubishi Chemical Corporation)
  • the present invention it is possible to provide a highly productive black matrix sheet which is excellent in light-shielding property, improves optical characteristics, can reduce man-hours to form a black matrix layer, and can realize an improvement in yield.

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Abstract

The present invention relates to a black matrix sheet comprising a release sheet, and a black matrix layer containing a polymer component and a coloring agent, wherein the storage elastic modulus at 150°C of the black matrix layer is 1×103 to 1×106 Pa.

Description

ブラックマトリックスシート、自発光型表示体、及び自発光型表示体の製造方法A method for manufacturing a black matrix sheet, a self-luminous display body, and a self-luminous display body.
 本発明は、ブラックマトリックスシート、自発光型表示体、及び自発光型表示体の製造方法に関する。 The present invention relates to a black matrix sheet, a self-luminous display body, and a method for manufacturing a self-luminous display body.
 近年、自発光型表示体として発光ダイオード(LED)を用いたディスプレイが注目されている。なかでも、個々の画素が微細なマイクロLEDチップからなるマイクロLEDディスプレイは、このマイクロLEDチップがディスプレイ基板の表面に間隔を空けて高密度に敷き詰められた自発光型表示体であり、製造方法が確立されておらず開発が進められている。
 また、ディスプレイ基板上には自発光型表示体の画像品質等の光学性能を向上させる観点からマイクロLEDチップ間からの光漏れを抑制する遮光用のブラックマトリックスを配置する必要がある。
In recent years, a display using a light emitting diode (LED) as a self-luminous display has attracted attention. Among them, the micro LED display in which each pixel is composed of fine micro LED chips is a self-luminous display in which the micro LED chips are densely spread on the surface of the display substrate at intervals, and the manufacturing method is It has not been established and is under development.
Further, from the viewpoint of improving the optical performance such as the image quality of the self-luminous display, it is necessary to arrange a black matrix for shading that suppresses light leakage from between the micro LED chips on the display substrate.
 例えば、特許文献1においては、基板上へLEDチップを圧着した後にLEDチップ間に熱硬化性の黒色インクを用いてLEDチップの間隔にブラックマトリックスを形成する技術が検討されている。特許文献1には、黒色色材、重合性化合物、および光重合開始剤を含有するブラックマトリクス用活性エネルギー線硬化型インクジェットインキであって、重合性化合物が、アミドモノマーを含む活性エネルギー線硬化型インクジェットインキ組成物が記載されている。
 また、特許文献2には基板上へシート状材料を転写する技術が記載されている。
For example, in Patent Document 1, a technique is studied in which a black matrix is formed at intervals between LED chips by using a thermosetting black ink between the LED chips after crimping the LED chips onto a substrate. Patent Document 1 describes an active energy ray-curable inkjet ink for a black matrix containing a black colorant, a polymerizable compound, and a photopolymerization initiator, wherein the polymerizable compound is an active energy ray-curable ink containing an amide monomer. Ink composition is described.
Further, Patent Document 2 describes a technique for transferring a sheet-like material onto a substrate.
 一方、特許文献3には、熱転写にて機能層を目的材料へ転写する技術が記載されている。 On the other hand, Patent Document 3 describes a technique for transferring a functional layer to a target material by thermal transfer.
日本国特開2019-214697号公報Japanese Patent Application Laid-Open No. 2019-2146697 日本国特開2019-204905号公報Japanese Patent Application Laid-Open No. 2019-204905 日本国特開2019-194016号公報Japanese Patent Application Laid-Open No. 2019-194016
 しかしながら、特許文献1においては、工数がかかると共に微細な加工が困難であり歩留りが低く、また、マイクロLEDを搭載したパッド部にはブラックマトリックスが塗布・形成できず、光学特性の面で課題があった。
 また、特許文献2に記載の技術においては、オレフィン系の樹脂種を用いており、基板との密着性に課題があった。特許文献3に記載の技術においては、ブラックマトリックス用途に必要な遮光性や着色については検討がされていない。
However, in Patent Document 1, it takes a lot of man-hours, it is difficult to perform fine processing, and the yield is low, and a black matrix cannot be applied or formed on the pad portion on which the micro LED is mounted, which causes a problem in terms of optical characteristics. there were.
Further, in the technique described in Patent Document 2, an olefin-based resin type is used, and there is a problem in adhesion to a substrate. In the technique described in Patent Document 3, the light-shielding property and coloring required for black matrix applications have not been studied.
 以上のように、従来技術においては工程の増加や歩留まりの低下等によってコスト面で課題があり、更なる生産性及び光学特性の向上が求められていた。 As described above, the conventional technique has a problem in terms of cost due to an increase in processes and a decrease in yield, and further improvement in productivity and optical characteristics has been required.
 本発明は、上記に鑑みてなされたものであり、遮光性に優れ光学特性を向上し、工数を削減してブラックマトリックス層を形成でき、歩留まりの向上を実現し得る、生産性の高いブラックマトリックスシートを提供することを目的とする。また、このブラックマトリックスシートを用いた、自発光型表示体、及び自発光型表示体の製造方法を提供することを目的とする。 The present invention has been made in view of the above, and is a highly productive black matrix that has excellent light-shielding properties, improves optical characteristics, can reduce man-hours to form a black matrix layer, and can improve yield. The purpose is to provide a sheet. Another object of the present invention is to provide a self-luminous display body and a method for manufacturing a self-luminous display body using this black matrix sheet.
 本発明者らは上記課題を解決するために鋭意検討を行った。その結果、離型シートと、ブラックマトリックス層とを備え、ブラックマトリックス層の貯蔵弾性率を特定範囲としたブラックマトリックスシートとすることにより、遮光性に優れ光学特性を向上し、工数を削減して熱圧着対象物の表面にブラックマトリックス層を形成でき、歩留まりの向上を実現し得る、生産性の高いブラックマトリックスシートが得られることを見出し、本発明を完成するに至った。 The present inventors have conducted diligent studies to solve the above problems. As a result, by providing a release sheet and a black matrix layer and making a black matrix sheet having a specific storage elastic modulus of the black matrix layer, excellent light-shielding property is improved, optical characteristics are improved, and man-hours are reduced. We have found that a highly productive black matrix sheet that can form a black matrix layer on the surface of a thermocompression bonding object and can improve the yield can be obtained, and has completed the present invention.
 すなわち、本発明は以下のとおりである。
〔1〕
 離型シートと、ポリマー成分及び着色剤を含むブラックマトリックス層とを備え、
 前記ブラックマトリックス層の150℃における貯蔵弾性率が、1×10~1×10Paである、ブラックマトリックスシート。
〔2〕
 前記離型シートの150℃における貯蔵弾性率が、7×10~2×10Paである、〔1〕に記載のブラックマトリックスシート。
〔3〕
 前記ポリマー成分が極性ユニットと非極性ユニットを有する、〔1〕又は〔2〕に記載のブラックマトリックスシート。
〔4〕
 前記ポリマー成分が、ポリアミド樹脂を含有する、〔1〕~〔3〕のいずれか一項に記載のブラックマトリックスシート。
〔5〕
 前記着色剤が、染料または顔料から選択される少なくとも1種を含有する、〔1〕~〔4〕のいずれか一項に記載のブラックマトリックスシート。
〔6〕
 前記着色剤が、カーボンブラックを含有する、〔1〕~〔5〕のいずれか一項に記載のブラックマトリックスシート。
〔7〕
 前記着色剤の含有量が、前記ポリマー成分100質量部に対し10~200質量部である、〔1〕~〔6〕のいずれか一項に記載のブラックマトリックスシート。
〔8〕
 前記ブラックマトリックス層の厚みが0.1~10μmである、〔1〕~〔6〕のいずれか一項に記載のブラックマトリックスシート。
〔9〕
 前記離型シートの厚みが10~200μmである、〔1〕~〔8〕のいずれか一項に記載のブラックマトリクックスシート。
〔10〕
 全光線透過率が0.01以上5%未満である、〔1〕~〔9〕のいずれか一項に記載のブラックマトリックスシート。
〔11〕
 ブラックマトリックス層、及び自発光体を含む自発光型表示体であって、
 前記ブラックマトリックス層は、ポリマー成分及び着色剤を含み、
 前記ブラックマトリックス層の150℃における貯蔵弾性率が、1×10~1×10Paであり、
 前記ポリマー成分が極性ユニットと非極性ユニットを有する、
自発光型表示体。
〔12〕
 ブラックマトリックス層、及び自発光体を含む自発光型表示体であって、
 前記自発光体の表面上に前記ブラックマトリックス層が存在せず、前記自発光体の周囲のみに前記ブラックマトリックス層を備えた、自発光型表示体。
〔13〕
 前記自発光体がマイクロLEDチップである、〔11〕又は〔12〕に記載の自発光型表示体。
〔14〕
 〔1〕~〔10〕のいずれか一項に記載のブラックマトリックスシートを用いた自発光型表示体の製造方法。
〔15〕
 離型シートと、ポリマー成分及び着色剤を含むブラックマトリックス層とを備えたブラックマトリックスシートを用いた、自発光型表示体の製造方法であって、
 下記(I)及び(II)の工程を含む、自発光型表示体の製造方法。
(I)前記ブラックマトリックスシートを用いた熱圧着により前記ブラックマトリックス層を転写し自発光型表示体を製造する工程
(II)前記離型シートを剥離する工程
That is, the present invention is as follows.
[1]
A mold release sheet and a black matrix layer containing a polymer component and a colorant are provided.
A black matrix sheet having a storage elastic modulus of the black matrix layer at 150 ° C. of 1 × 10 3 to 1 × 10 6 Pa.
[2]
The black matrix sheet according to [1], wherein the release elastic modulus of the release sheet at 150 ° C. is 7 × 10 6 to 2 × 10 8 Pa.
[3]
The black matrix sheet according to [1] or [2], wherein the polymer component has a polar unit and a non-polar unit.
[4]
The black matrix sheet according to any one of [1] to [3], wherein the polymer component contains a polyamide resin.
[5]
The black matrix sheet according to any one of [1] to [4], wherein the colorant contains at least one selected from dyes and pigments.
[6]
The black matrix sheet according to any one of [1] to [5], wherein the colorant contains carbon black.
[7]
The black matrix sheet according to any one of [1] to [6], wherein the content of the colorant is 10 to 200 parts by mass with respect to 100 parts by mass of the polymer component.
[8]
The black matrix sheet according to any one of [1] to [6], wherein the thickness of the black matrix layer is 0.1 to 10 μm.
[9]
The black matrix sheet according to any one of [1] to [8], wherein the release sheet has a thickness of 10 to 200 μm.
[10]
The black matrix sheet according to any one of [1] to [9], wherein the total light transmittance is 0.01 or more and less than 5%.
[11]
A self-luminous display body including a black matrix layer and a self-luminous body.
The black matrix layer contains a polymer component and a colorant.
The storage elastic modulus of the black matrix layer at 150 ° C. is 1 × 10 3 to 1 × 10 6 Pa.
The polymer component has a polar unit and a non-polar unit.
Self-luminous display.
[12]
A self-luminous display body including a black matrix layer and a self-luminous body.
A self-luminous display body in which the black matrix layer does not exist on the surface of the self-luminous body and the black matrix layer is provided only around the self-luminous body.
[13]
The self-luminous display according to [11] or [12], wherein the self-luminous body is a micro LED chip.
[14]
[1] A method for manufacturing a self-luminous display body using the black matrix sheet according to any one of [10].
[15]
A method for manufacturing a self-luminous display using a black matrix sheet including a release sheet and a black matrix layer containing a polymer component and a colorant.
A method for manufacturing a self-luminous display body, which comprises the following steps (I) and (II).
(I) A step of transferring the black matrix layer by thermocompression bonding using the black matrix sheet to manufacture a self-luminous display body (II) A step of peeling off the release sheet.
 本発明によれば、遮光性に優れ光学特性を向上し、工数を削減してブラックマトリックス層を形成でき、歩留まりの向上を実現し得る、生産性の高いブラックマトリックスシートを提供することができる。 According to the present invention, it is possible to provide a highly productive black matrix sheet which is excellent in light-shielding property, improves optical characteristics, can reduce man-hours to form a black matrix layer, and can realize an improvement in yield.
図1は、ブラックマトリックスシートの一例を示す概略断面図である。FIG. 1 is a schematic cross-sectional view showing an example of a black matrix sheet. 図2は、本発明の実施形態に係る自発光型表示体の製造方法を説明する図であり、(a)基板と、TFTと、異方性導電層と、パッドとを含む積層体上に配置したマイクロLEDチップと、熱加圧ヘッドとの間にブラックマトリックスシートを配置した状態、(b)基板と、TFTと、異方性導電層と、パッドとを含む積層体上に配置したパッドへのマイクロLEDチップの熱圧着が行われる状態、(c)積層体にマイクロLEDチップが熱圧着により実装され、異方性導電層上にブラックマトリックス層が形成された状態、(d)離型シートを剥離し、自発光表型示体が形成された状態を説明するための図である。FIG. 2 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention, on a laminate including (a) a substrate, a TFT, an anisotropic conductive layer, and a pad. A state in which a black matrix sheet is arranged between the arranged micro LED chip and a heat pressurizing head, (b) a pad arranged on a laminate including a substrate, a TFT, an anisotropic conductive layer, and a pad. A state in which the micro LED chip is heat-bonded to, (c) a state in which the micro LED chip is mounted on the laminate by heat-bonding, and a black matrix layer is formed on the anisotropic conductive layer, (d) mold release. It is a figure for demonstrating the state which the sheet is peeled off, and the self-luminous surface type display body is formed. 図3は、本発明の実施形態に係る自発光型表示体の製造方法を説明する図であり、(a)基板と、TFTと、異方性導電層と、パッドとを含む積層体上に配置したマイクロLEDチップと、熱加圧ヘッドとの間にブラックマトリックスシートを配置した状態、(b)熱加圧ヘッドを用いて基板と、TFTと、異方性導電層と、パッドとを含む積層体上に配置したパッドへのマイクロLEDチップの熱圧着が行われる状態、(c)積層体にマイクロLEDチップが熱圧着により実装され、異方性導電層上にブラックマトリックス層が形成された状態、(d)離型シートを剥離し、自発光表型示体が形成された状態を説明するための図である。FIG. 3 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention, on a laminate including (a) a substrate, a TFT, an anisotropic conductive layer, and a pad. A state in which a black matrix sheet is arranged between the arranged micro LED chip and the heat pressurizing head, (b) the substrate, the TFT, the anisotropic conductive layer, and the pad are included using the heat pressurizing head. In a state where the micro LED chip is heat-bonded to the pad arranged on the laminate, (c) the micro LED chip is mounted on the laminate by heat-bonding, and a black matrix layer is formed on the anisotropic conductive layer. It is a figure for demonstrating the state, (d) the state which the release sheet was peeled off, and the self-luminous table type display body was formed. 図4は、本発明の実施形態に係る自発光型表示体の一例を示す概略断面図である。FIG. 4 is a schematic cross-sectional view showing an example of a self-luminous display body according to an embodiment of the present invention.
 以下、本発明の実施形態について、詳細に説明する。以下においては、説明の便宜のために本発明の好適な実施形態のみを示すが、勿論、これによって本発明を限定しようとするものではない。
 なお、以下の説明において、ブラックマトリックスシートから熱圧着対象物の表面上に転写したブラックマトリックス層を「転写ブラックマトリックス層」と称する場合がある。
Hereinafter, embodiments of the present invention will be described in detail. In the following, for convenience of explanation, only preferred embodiments of the present invention are shown, but of course, this is not intended to limit the present invention.
In the following description, the black matrix layer transferred from the black matrix sheet onto the surface of the thermocompression bonding object may be referred to as a “transfer black matrix layer”.
 本発明の実施形態に係るブラックマトリックスシートは離型シートと、ポリマー成分、及び着色剤を含むブラックマトリックス層とを備え、
 前記ブラックマトリックス層の150℃における貯蔵弾性率が、1×10~1×10Paである。
The black matrix sheet according to the embodiment of the present invention includes a release sheet and a black matrix layer containing a polymer component and a colorant.
The storage elastic modulus of the black matrix layer at 150 ° C. is 1 × 10 3 to 1 × 10 6 Pa.
 図1に示すように、本発明の実施形態に係るブラックマトリックスシート10は、離型シート11とブラックマトリックス層12の積層体である。 As shown in FIG. 1, the black matrix sheet 10 according to the embodiment of the present invention is a laminate of the release sheet 11 and the black matrix layer 12.
 本発明の実施形態に係るブラックマトリックスシートは、離型シートを備えるため離型性に優れ、例えば、加圧ヘッドによる熱圧着を行う場合は、加圧ヘッドによる熱圧着対象物の熱圧着時に熱加圧ヘッドと熱圧着対象物との間に配置して両者の固着を防ぐ耐熱離型シートとして使用できる。そして、150℃における貯蔵弾性率が、1×10~1×10Paであるブラックマトリックス層を備えるため、熱圧着時にブラックマトリックス層が溶融し、熱圧着対象物の表面に転写され転写ブラックマトリックス層を形成することができる。 The black matrix sheet according to the embodiment of the present invention has excellent mold releasability because it is provided with a mold releasable sheet. It can be used as a heat-resistant release sheet that is placed between the pressure head and the thermocompression bonding object to prevent them from sticking together. Since the black matrix layer having a storage elastic modulus at 150 ° C. of 1 × 10 3 to 1 × 10 6 Pa is provided, the black matrix layer is melted during thermocompression bonding and transferred to the surface of the thermocompression bonding object to transfer black. A matrix layer can be formed.
 熱圧着対象物としては、例えば、基板、半導体チップ、自発光体等の電子部品である。ブラックマトリックスシートは、例えば、熱圧着による半導体チップの製造、フリップチップ実装、及び自発光体等の電子部品の接続等に使用できる。
 なかでも、自発光体を含む自発光型表示体におけるブラックマトリックス層の形成に好ましく使用することができる。
The thermocompression bonding object is, for example, an electronic component such as a substrate, a semiconductor chip, or a self-luminous body. The black matrix sheet can be used, for example, for manufacturing semiconductor chips by thermocompression bonding, mounting flip chips, connecting electronic components such as self-luminous bodies, and the like.
Among them, it can be preferably used for forming a black matrix layer in a self-luminous display body including a self-luminous body.
 熱圧着対象物が基板と自発光体等の微細なチップ部品である場合、チップ部品を基板や基板マスクに熱圧着する際に、熱加圧ヘッドとチップ部品との間にブラックマトリックスシートを配置して熱圧着することで、基板及び基板マスク上にチップ部品の実装とブラックマトリックス層の形成を行うことができる。例えば熱圧着に熱加圧ヘッドを用いる場合、熱加圧ヘッドとチップ部品との間のブラックマトリックス層は熱圧着の際に溶融して基板及び基板マスク上に流れて固化する。そのため、チップ部品上には転写ブラックマトリックス層の残渣が残りにくい。
 ブラックマトリックス層が、基板の表面にインク等を塗設するのではなく、基板とチップ部品との熱圧着の際に形成できるため、ブラックマトリックス層を形成するための工程を別途設ける必要がなく、塗設が困難であったチップ部品の間隔等の微細な箇所にもブラックマトリックス層を形成することができる。このため、歩留まりの低下を抑制でき高い生産性で光学特性に優れたブラックマトリックス層を形成できる。
When the object to be thermocompression bonded is a substrate and fine chip parts such as a self-luminous body, a black matrix sheet is placed between the heat-pressurized head and the chip component when the chip component is thermocompression bonded to the substrate or substrate mask. By thermocompression bonding, chip components can be mounted and a black matrix layer can be formed on the substrate and the substrate mask. For example, when a thermocompression bonding head is used for thermocompression bonding, the black matrix layer between the thermocompression bonding head and the chip component melts during thermocompression bonding and flows onto the substrate and the substrate mask to solidify. Therefore, the residue of the transfer black matrix layer is unlikely to remain on the chip component.
Since the black matrix layer can be formed at the time of thermocompression bonding between the substrate and the chip component instead of applying ink or the like on the surface of the substrate, there is no need to separately provide a process for forming the black matrix layer. It is possible to form a black matrix layer even in a fine place such as an interval between chip parts, which was difficult to apply. Therefore, it is possible to suppress a decrease in yield and form a black matrix layer having high productivity and excellent optical characteristics.
 〔ブラックマトリックス層〕
 本発明の実施形態に係るブラックマトリックスシートにおいて、ブラックマトリックス層の150℃における貯蔵弾性率は、1×10~1×10Paである。
 ブラックマトリックス層の150℃における貯蔵弾性率を1×10Pa以上とすることにより、転写ブラックマトリックス層の厚み均一性が良好となった。また、ブラックマトリックス層の150℃における貯蔵弾性率を1×10Pa以下とすることにより、チップ部品上の転写ブラックマトリックス層の残渣が少なくなり、生産性の向上と光学特性の向上が可能となった。
 ブラックマトリックス層の150℃における貯蔵弾性率は、好ましくは1×10Pa以下であり、より好ましくは5×10Pa以下であり、さらに好ましくは1×10Pa以下である。また、好ましくは1×10Pa以上であり、より好ましくは3×10Pa以上であり、さらに好ましくは5×10Pa以上である。
 ブラックマトリックス層は、150℃における貯蔵弾性率が1×10Pa超であると、チップ部品上への転写ブラックマトリックス層の残渣発生率が高くなり生産性が低下する。また、150℃における貯蔵弾性率が1×10Pa未満であると、基板マスク部の転写ブラックマトリックス層の厚みの均一性が損なわれ、自発光型表示体等に適用した場合、光学特性に劣り視認性が低下する。
[Black matrix layer]
In the black matrix sheet according to the embodiment of the present invention, the storage elastic modulus of the black matrix layer at 150 ° C. is 1 × 10 3 to 1 × 10 6 Pa.
By setting the storage elastic modulus of the black matrix layer at 150 ° C. to 1 × 10 3 Pa or more, the thickness uniformity of the transferred black matrix layer was improved. Further, by setting the storage elastic modulus of the black matrix layer at 150 ° C. to 1 × 10 6 Pa or less, the residue of the transferred black matrix layer on the chip component is reduced, and it is possible to improve the productivity and the optical characteristics. became.
The storage elastic modulus of the black matrix layer at 150 ° C. is preferably 1 × 10 6 Pa or less, more preferably 5 × 10 5 Pa or less, and further preferably 1 × 10 5 Pa or less. Further, it is preferably 1 × 10 3 Pa or more, more preferably 3 × 10 3 Pa or more, and further preferably 5 × 10 3 Pa or more.
When the storage elastic modulus of the black matrix layer at 150 ° C. exceeds 1 × 10 6 Pa, the residue generation rate of the transferred black matrix layer on the chip component increases and the productivity decreases. Further, if the storage elastic modulus at 150 ° C. is less than 1 × 10 3 Pa, the uniformity of the thickness of the transfer black matrix layer of the substrate mask portion is impaired, and when applied to a self-luminous display or the like, the optical characteristics are improved. Inferior visibility is reduced.
 ブラックマトリックス層の貯蔵弾性率は、測定対象部分を構成する樹脂材料(ブラックマトリックス層)を500μmに積層した積層品を測定サンプルとして、以下の方法で測定される貯蔵弾性率をいう。具体的には、上記積層品を直径25mmにカットし試験片を作製する。直径25mmの治具を用いて、TAインスツルメンツ社製粘弾性装置ARES-G2にて25~200℃の温度分散を実施する。その際、昇温速度は5℃/min、周波数は1Hzとし、このときの150℃での弾性率を貯蔵弾性率とする。 The storage elastic modulus of the black matrix layer refers to the storage elastic modulus measured by the following method using a laminated product in which a resin material (black matrix layer) constituting a measurement target portion is laminated to 500 μm as a measurement sample. Specifically, the laminated product is cut to a diameter of 25 mm to prepare a test piece. Using a jig with a diameter of 25 mm, temperature dispersion at 25 to 200 ° C. is carried out with a viscoelastic device ARES-G2 manufactured by TA Instruments. At that time, the rate of temperature rise is 5 ° C./min, the frequency is 1 Hz, and the elastic modulus at 150 ° C. at this time is defined as the storage elastic modulus.
 本発明の実施形態に係るブラックマトリックス層はポリマー成分及び着色剤を含む。 The black matrix layer according to the embodiment of the present invention contains a polymer component and a colorant.
 ブラックマトリックス層(ブラックマトリックス層の材料であってもよい)が含むポリマー成分は、非極性ユニットと極性ユニットを有することが好ましい。極性ユニットは極性基を備える。
 ポリマー成分が極性ユニットと非極性ユニットを有することにより、転写されたブラックマトリックス層が熱圧着対象物の表面と優れた密着性を示す。
 ブラックマトリックス層中の上記ポリマー成分の含有割合は、好ましくは20質量%~99質量%であり、より好ましくは30質量%~95質量%であり、さらに好ましくは40質量%~93質量%であり、特に好ましくは50質量%~90質量%であり、最も好ましくは60質量%~88質量%である。
The polymer component contained in the black matrix layer (which may be the material of the black matrix layer) preferably has a non-polar unit and a polar unit. The polar unit comprises a polar group.
Due to the polymer component having polar and non-polar units, the transferred black matrix layer exhibits excellent adhesion to the surface of the thermocompression bonding object.
The content of the polymer component in the black matrix layer is preferably 20% by mass to 99% by mass, more preferably 30% by mass to 95% by mass, and further preferably 40% by mass to 93% by mass. Particularly preferably, it is 50% by mass to 90% by mass, and most preferably 60% by mass to 88% by mass.
 ポリマー成分における非極性ユニットとしては、例えば、ポリエチレンユニット、ポリプロピレンユニット、ポリスチレンユニットなどが挙げられる。非極性ユニットは、1種のみであってもよいし、2種以上であってもよい。 Examples of the non-polar unit in the polymer component include a polyethylene unit, a polypropylene unit, a polystyrene unit and the like. The non-polar unit may be only one type or two or more types.
 ポリマー成分における極性ユニットが備える極性基としては、例えば、エポキシ基、カルボキシル基、ニトリル基、アミド基、エステル基、水酸基、酸無水物、シラノール基などが挙げられる。このような極性基を有する極性ユニットとしては、例えば、グリシジルメタクリレートユニット、酢酸ビニルユニット、アクリロニトリルユニット、アミドユニット、(メタ)アクリル酸エステルユニット、ヒドロキシエチル(メタ)アクリレートユニット、無水マレイン酸ユニットなどが挙げられる。極性ユニットは、1種のみであってもよいし、2種以上であってもよい。 Examples of the polar group included in the polar unit in the polymer component include an epoxy group, a carboxyl group, a nitrile group, an amide group, an ester group, a hydroxyl group, an acid anhydride and a silanol group. Examples of the polar unit having such a polar group include a glycidyl methacrylate unit, a vinyl acetate unit, an acrylonitrile unit, an amide unit, a (meth) acrylic acid ester unit, a hydroxyethyl (meth) acrylate unit, and a maleic anhydride unit. Can be mentioned. The polar unit may be of only one type or may be two or more types.
 ブラックマトリックス層(ブラックマトリックス層の材料であってもよい)が含み得るポリマー成分は、アミド基含有ポリマー、メトキシメチル基含有ポリマー、水酸基含有ポリマー、カルボキシル基含有ポリマー、アミノ基含有ポリマーから選ばれる少なくとも1種であってもよい。 The polymer component that can be contained in the black matrix layer (which may be the material of the black matrix layer) is selected from at least an amide group-containing polymer, a methoxymethyl group-containing polymer, a hydroxyl group-containing polymer, a carboxyl group-containing polymer, and an amino group-containing polymer. It may be one kind.
 ブラックマトリックス層(ブラックマトリックス層の材料であってもよい)が含み得るこのようなポリマー成分は、好ましくは、付加型硬化剤であり、より好ましくは、エポキシ基と反応する付加型硬化剤である。 Such a polymer component, which may be contained in the black matrix layer (which may be the material of the black matrix layer), is preferably an addition-type curing agent, and more preferably an addition-type curing agent that reacts with an epoxy group. ..
 アミド基含有ポリマーとしては、例えばポリアミド樹脂などが挙げられる。ポリマー成分は、ポリアミド樹脂を含有することが好ましい。
 アミド基含有ポリマーとしては、市販品を採用してもよい。このような市販品としては、例えば「アミラン」シリーズ(東レ株式会社)などが挙げられる。
 アミド基含有ポリマーは1種であってもよいし、2種以上であってもよい。
Examples of the amide group-containing polymer include polyamide resins. The polymer component preferably contains a polyamide resin.
As the amide group-containing polymer, a commercially available product may be adopted. Examples of such commercially available products include the "Amiran" series (Toray Industries, Inc.).
The amide group-containing polymer may be one kind or two or more kinds.
 アミド基含有ポリマーは、本発明の効果をより発現させ得る点で、その重量平均分子量(Mw)が、好ましくは10000~200000であり、より好ましくは20000~100000である。 The weight average molecular weight (Mw) of the amide group-containing polymer is preferably 10,000 to 200,000, more preferably 20,000 to 100,000 in that the effect of the present invention can be more exhibited.
 メトキシメチル基含有ポリマーとしては、例えば、メトキシメチル化ポリアミド樹脂などが挙げられる。
 メトキシメチル基含有ポリマーとしては、市販品を採用してもよい。このような市販品としては、例えば、「Fine Resin」(登録商標)シリーズ(株式会社鉛市製)などが挙げられる。
 メトキシメチル基含有ポリマーは、1種であってもよいし、2種以上であってもよい。
Examples of the methoxymethyl group-containing polymer include methoxymethylated polyamide resin and the like.
As the methoxymethyl group-containing polymer, a commercially available product may be adopted. Examples of such commercially available products include the "Fine Resin" (registered trademark) series (manufactured by Namariichi Co., Ltd.).
The methoxymethyl group-containing polymer may be one kind or two or more kinds.
 メトキシメチル基含有ポリマーは、本発明の効果をより発現させ得る点で、その重量平均分子量(Mw)が、好ましくは10000~200000であり、より好ましくは20000~150000であり、さらに好ましくは30000~100000である。 The weight average molecular weight (Mw) of the methoxymethyl group-containing polymer is preferably 10,000 to 200,000, more preferably 20,000 to 150,000, and further preferably 30,000 to 30,000 in that the effects of the present invention can be more exhibited. It is 100,000.
 水酸基含有ポリマーとしては、例えば、水酸基含有アクリル系ポリマーなどが挙げられる。
 水酸基含有ポリマーとしては、市販品を採用してもよい。このような市販品としては、例えば、「ARUFON(登録商標) UH-2000シリーズ」(東亜合成株式会社製)などが挙げられる。
 水酸基含有ポリマーは、1種であってもよいし、2種以上であってもよい。
Examples of the hydroxyl group-containing polymer include hydroxyl group-containing acrylic polymers.
As the hydroxyl group-containing polymer, a commercially available product may be adopted. Examples of such commercially available products include "ARUFON (registered trademark) UH-2000 series" (manufactured by Toagosei Corporation).
The hydroxyl group-containing polymer may be one kind or two or more kinds.
 水酸基含有ポリマーは、本発明の効果をより発現させ得る点で、その重量平均分子量(Mw)が、好ましくは500~1000000であり、より好ましくは700~500000であり、さらに好ましくは1000~100000であり、特に好ましくは1500~70000であり、最も好ましくは2000~50000である。 The hydroxyl group-containing polymer has a weight average molecular weight (Mw) of preferably 500 to 1,000,000, more preferably 700 to 500,000, still more preferably 1,000 to 100,000 in that the effect of the present invention can be more exhibited. It is particularly preferably 1500 to 70,000, and most preferably 2000 to 50,000.
 カルボキシル基含有ポリマーとしては、例えば、カルボキシル基含有アクリル系ポリマーなどが挙げられる。
 カルボキシル基含有ポリマーとしては、市販品を採用してもよい。このような市販品としては、例えば、「ARUFON(登録商標) UC-3000シリーズ」(東亜合成株式会社製)などが挙げられる。
 カルボキシル基含有ポリマーは、1種であってもよいし、2種以上であってもよい。
Examples of the carboxyl group-containing polymer include a carboxyl group-containing acrylic polymer.
As the carboxyl group-containing polymer, a commercially available product may be adopted. Examples of such a commercially available product include "ARUFON (registered trademark) UC-3000 series" (manufactured by Toagosei Co., Ltd.).
The carboxyl group-containing polymer may be one kind or two or more kinds.
 カルボキシル基含有ポリマーは、本発明の効果をより発現させ得る点で、その重量平均分子量(Mw)が、好ましくは500~1000000であり、より好ましくは700~500000であり、さらに好ましくは1000~100000であり、特に好ましくは1500~70000であり、最も好ましくは2000~50000である。重量平均分子量(Mw)はGPC測定におけるポリスチレン換算分子量を用いることができる。 The weight average molecular weight (Mw) of the carboxyl group-containing polymer is preferably 500 to 1,000,000, more preferably 700 to 500,000, still more preferably 1,000 to 100,000 in that the effect of the present invention can be more exhibited. It is particularly preferably 1500 to 70,000, and most preferably 2000 to 50,000. As the weight average molecular weight (Mw), the polystyrene-equivalent molecular weight in the GPC measurement can be used.
 アミノ基含有ポリマーとしては、アミノ基(-NH)を含有するポリマーであれば、本発明の効果を損なわない範囲で、任意の適切なポリマーを採用し得る。
 アミノ基含有ポリマーとしては、市販品を採用してもよい。
 アミノ基含有ポリマーは、1種であってもよいし、2種以上であってもよい。
 ブラックマトリックス層(ブラックマトリックス層の材料であってもよい)は、3級アミン含有化合物、強酸から選ばれる少なくとも1種を含んでいてもよい。
As the amino group-containing polymer, any suitable polymer can be adopted as long as it is a polymer containing an amino group (-NH 2 ), as long as the effect of the present invention is not impaired.
As the amino group-containing polymer, a commercially available product may be adopted.
The amino group-containing polymer may be one kind or two or more kinds.
The black matrix layer (which may be the material of the black matrix layer) may contain at least one selected from a tertiary amine-containing compound and a strong acid.
 ブラックマトリックス層(ブラックマトリックス層の材料であってもよい)が含み得るこのような3級アミン含有化合物や強酸は、好ましくは、触媒型硬化剤であり、より好ましくは、エポキシ基と反応する触媒型硬化剤である。 Such a tertiary amine-containing compound or strong acid that can be contained in the black matrix layer (which may be the material of the black matrix layer) is preferably a catalytic curing agent, and more preferably a catalyst that reacts with an epoxy group. It is a mold curing agent.
 3級アミン含有化合物としては、例えば、イミダゾール誘導体、ポリエチレンイミンなどが挙げられる。
 3級アミン含有化合物としては、市販品を採用してもよい。このような市販品としては、例えば、イミダゾール誘導体として、「キュアゾール」シリーズ(イミダゾール系エポキシ樹脂硬化剤、四国化成工業株式会社製)などが挙げられ、ポリエチレンイミンとして、「エポミン」(登録商標)シリーズ(株式会社日本触媒製)などが挙げられる。
 3級アミン含有化合物は、1種であってもよいし、2種以上であってもよい。
Examples of the tertiary amine-containing compound include imidazole derivatives and polyethyleneimine.
As the tertiary amine-containing compound, a commercially available product may be adopted. Examples of such commercially available products include the "Curesol" series (imidazole-based epoxy resin curing agent, manufactured by Shikoku Chemicals Corporation) as an imidazole derivative, and the "Epomin" (registered trademark) series as a polyethyleneimine. (Manufactured by Nippon Shokubai Co., Ltd.) and the like.
The tertiary amine-containing compound may be one kind or two or more kinds.
 強酸としては、例えば、トリフルオロボラン、イオン液体、ナフィオンなどが挙げられる。
 イオン液体としては、例えば、BF-CNH、HMI(1-ヘキシル-3メチルイミダゾリウム)-PFなどが挙げられる。
 強酸としては、市販品を採用してもよい。
 強酸は、1種であってもよいし、2種以上であってもよい。
Examples of the strong acid include trifluoroborane, ionic liquid, naphthion and the like.
Examples of the ionic liquid include BF 3 -C 2 H 5 NH 2 , HMI (1-hexyl-3 methylimidazolium) -PF 6 .
As the strong acid, a commercially available product may be adopted.
The strong acid may be one kind or two or more kinds.
 着色剤としては、例えば、染料、顔料などの色材が挙げられ、着色剤が、染料または顔料から選択される少なくとも1種を含有することが好ましい。 Examples of the colorant include coloring materials such as dyes and pigments, and it is preferable that the colorant contains at least one selected from dyes and pigments.
 染料としては、例えば、アゾ系染料、アントラキノン系染料、キノンフタロン系染料、スチリル系染料、ジフェニルメタン系染料、トリフェニルメタン系染料、オキサジン系染料、トリアジン系染料、キサンタン系染料、メタン系染料、アゾメチン系染料、アクリジン系染料、ジアジン系染料、フタロシアニン系染料などが挙げられ、好ましくは、アゾ系染料、フタロシアニン系染料などが挙げられる。 Examples of the dyes include azo dyes, anthraquinone dyes, quinonephthalone dyes, styryl dyes, diphenylmethane dyes, triphenylmethane dyes, oxazine dyes, triazine dyes, xanthane dyes, methane dyes, and azomethine dyes. Examples thereof include dyes, acridin-based dyes, diazine-based dyes, phthalocyanine-based dyes, and preferably azo-based dyes and phthalocyanine-based dyes.
 また、染料としては、市販品を用いることができ、具体的には、Valifastシリーズ(オリエント化学工業社製)などが挙げられる。 Further, as the dye, a commercially available product can be used, and specific examples thereof include the Varifast series (manufactured by Orient Chemical Industry Co., Ltd.).
 顔料としては、例えば、炭酸亜鉛、酸化亜鉛、硫化亜鉛、タルク、カオリン、炭酸カルシウム、酸化チタン、シリカ、フッ化リチウム、フッ化カルシウム、硫酸バリウム、アルミナ、ジルコニア、酸化鉄系、水酸化鉄、酸化クロム、リン酸カルシウム、ボーンブラック、黒鉛、鉄黒、などの無機顔料、例えば、カーボンブラック、アセチレンブラック、ランプブラック、アニリンブラック、シアニンブラックなどの有機顔料などが挙げられる。 Pigments include, for example, zinc carbonate, zinc oxide, zinc sulfide, talc, kaolin, calcium carbonate, titanium oxide, silica, lithium fluoride, calcium fluoride, barium sulfate, alumina, zirconia, iron oxide, iron hydroxide, etc. Inorganic pigments such as chromium oxide, calcium phosphate, bone black, graphite and iron black, for example, organic pigments such as carbon black, acetylene black, lamp black, aniline black and cyanine black can be mentioned.
 また、顔料としては、市販品を用いることができ、具体的には、御国色素株式会社製カーボンブラック分散液No.3684、No.3685、MHIブラック#217等が挙げられる。 Further, as the pigment, a commercially available product can be used. Specifically, the carbon black dispersion liquid No. 1 manufactured by Mikuni Color Co., Ltd. 3684, No. 3685, MHI Black # 217 and the like can be mentioned.
 着色剤としては、単独で黒色を呈する色材を用いても良く、又は赤、緑、青等の複数の色材の混合により黒色を呈する色材を用いても良い。 As the colorant, a color material that exhibits black color by itself may be used, or a color material that exhibits black color by mixing a plurality of color materials such as red, green, and blue may be used.
 着色剤は、単独使用または2種以上併用できる。
 単独使用可能な着色剤としては、カーボンブラック、アセチレンブラック、ランプブラック、ボーンブラック、黒鉛、鉄黒、アニリンブラック、シアニンブラック等が挙げられる。
The colorants can be used alone or in combination of two or more.
Examples of the colorant that can be used alone include carbon black, acetylene black, lamp black, bone black, graphite, iron black, aniline black, cyanine black and the like.
 本発明の実施形態に係る着色剤は、カーボンブラックを含有することが好ましい。 The colorant according to the embodiment of the present invention preferably contains carbon black.
 着色剤の平均粒径は、転写ブラックマトリックス層の表面平滑性の観点から、好ましくは1000nm以下、より好ましくは500nm以下、更に好ましくは300nm以下であり、また、遮光性の観点から、好ましくは10nm以上、より好ましくは30nm以上、更に好ましくは50nm以上である。 The average particle size of the colorant is preferably 1000 nm or less, more preferably 500 nm or less, still more preferably 300 nm or less from the viewpoint of surface smoothness of the transferred black matrix layer, and preferably 10 nm from the viewpoint of light shielding property. As mentioned above, it is more preferably 30 nm or more, still more preferably 50 nm or more.
 着色剤の配合割合は、分散均一性を考慮して適宜選択され、具体的には、透過率の観点からポリマー成分100質量部に対して、好ましくは200質量部以下、より好ましくは100質量部以下、更に好ましくは80質量部以下であり、また、好ましくは5質量部以上、より好ましくは10質量部以上、更に好ましくは15質量部以上である。 The blending ratio of the colorant is appropriately selected in consideration of dispersion uniformity, and specifically, from the viewpoint of transmittance, it is preferably 200 parts by mass or less, more preferably 100 parts by mass with respect to 100 parts by mass of the polymer component. Hereinafter, it is more preferably 80 parts by mass or less, preferably 5 parts by mass or more, more preferably 10 parts by mass or more, still more preferably 15 parts by mass or more.
 本発明の実施形態に係るブラックマトリックスシートにおいて、ブラックマトリックス層は平均厚みが0.1~10μmであることが好ましい。
 ブラックマトリックス層の平均厚みは遮光性を向上させる観点から、より好ましくは0.1μm以上、更に好ましくは0.5μm以上である。また、転写後の視認性を向上させる観点から、より好ましくは10μm以下であり、更に好ましくは5μm以下である。
 ブラックマトリックス層の厚みはダイヤルシックネスゲージ(例えば、ピーコックGC-9)等によりブラックマトリックスシートの厚みを測定し、その箇所のブラックマトリックス層を除去した離型シートの厚みを測定し、その差をブラックマトリックス層の厚みとして測定できる。
 ブラックマトリックス層の平均厚みとは10点を測定した平均値である。
In the black matrix sheet according to the embodiment of the present invention, the black matrix layer preferably has an average thickness of 0.1 to 10 μm.
The average thickness of the black matrix layer is more preferably 0.1 μm or more, still more preferably 0.5 μm or more, from the viewpoint of improving the light-shielding property. Further, from the viewpoint of improving the visibility after transfer, it is more preferably 10 μm or less, still more preferably 5 μm or less.
For the thickness of the black matrix layer, measure the thickness of the black matrix sheet with a dial thickness gauge (for example, Peacock GC-9), measure the thickness of the release sheet from which the black matrix layer has been removed, and measure the difference in black. It can be measured as the thickness of the matrix layer.
The average thickness of the black matrix layer is an average value measured at 10 points.
 本発明の実施形態に係るブラックマトリックスシートにおいて、ブラックマトリックス層の全光線透過率が0.01以上5%未満であることが好ましい。
 また、本発明の実施形態に係るブラックマトリックスシートにおいて、ブラックマトリックス層は、厚みが0.1~10μmであり、遮光性を向上させる観点からブラックマトリックスシートの全光線透過率が0.01以上5%未満であることが好ましい。本発明の実施形態においては、ブラックマトリックス層の厚さが10μm以下におけるブラックマトリックスシートの全光線透過率は、好ましくは5%未満、より好ましくは3%以下、更に好ましくは1%以下、より更に好ましくは0.5%以下、特に好ましくは0.3%以下である。
In the black matrix sheet according to the embodiment of the present invention, the total light transmittance of the black matrix layer is preferably 0.01 or more and less than 5%.
Further, in the black matrix sheet according to the embodiment of the present invention, the black matrix layer has a thickness of 0.1 to 10 μm, and the total light transmittance of the black matrix sheet is 0.01 or more 5 from the viewpoint of improving the light shielding property. It is preferably less than%. In the embodiment of the present invention, the total light transmittance of the black matrix sheet when the thickness of the black matrix layer is 10 μm or less is preferably less than 5%, more preferably 3% or less, still more preferably 1% or less, still more. It is preferably 0.5% or less, and particularly preferably 0.3% or less.
 〔離型シート〕
 本発明の実施形態に係るブラックマトリックスシートは、離型シートと上記ブラックマトリックス層とを含む。
 ブラックマトリックスシートが離型シートを含むことにより、チップ部品を基板に熱圧着する際に離型シートを用いるのと同様に、ブラックマトリックスシートを用いてチップ部品を基板に熱圧着すると共に転写ブラックマトリックス層を形成することができる。
[Release sheet]
The black matrix sheet according to the embodiment of the present invention includes a release sheet and the black matrix layer.
By including the release sheet, the black matrix sheet is used to thermocompression-bond the chip component to the substrate and transfer black matrix in the same manner as the release sheet is used when the chip component is thermocompression-bonded to the substrate. Layers can be formed.
 離型シートは融点が150℃以上であることが好ましく、150℃における貯蔵弾性率が1GPa以下であることが好ましい。
 離型シートの150℃における貯蔵弾性率は、7×10~2×10Paであることが好ましい。離型シートの150℃における貯蔵弾性率は、好ましくは1.5×10Pa以下であり、より好ましくは1.2×10Pa以下であり、さらに好ましくは1×10Pa以下である。また、好ましくは8×10Pa以上であり、より好ましくは9×10Pa以上であり、さらに好ましくは1×10Pa以上である。
The release sheet preferably has a melting point of 150 ° C. or higher, and a storage elastic modulus at 150 ° C. of 1 GPa or less.
The storage elastic modulus of the release sheet at 150 ° C. is preferably 7 × 10 6 to 2 × 10 8 Pa. The storage elastic modulus of the release sheet at 150 ° C. is preferably 1.5 × 10 8 Pa or less, more preferably 1.2 × 10 8 Pa or less, and further preferably 1 × 10 8 Pa or less. .. Further, it is preferably 8 × 10 6 Pa or more, more preferably 9 × 10 6 Pa or more, and further preferably 1 × 10 7 Pa or more.
 離型シートの貯蔵弾性率は、離型シートを測定サンプルとして、以下の方法で測定される貯蔵弾性率をいう。具体的には、離型シートを長さ10mm(測定長さ)×幅5mmの短冊状にカッターナイフで切り出し、個体粘弾性測定装置(RSAIII、TAインスツルメンツ(株)製)を用いて、25℃~500℃における貯蔵弾性率を測定する。測定条件は、周波数1Hz、昇温速度5℃/minとした。このとき150℃での弾性率を離型シートの貯蔵弾性率(Pa)とする。 The storage elastic modulus of the release sheet refers to the storage elastic modulus measured by the following method using the release sheet as a measurement sample. Specifically, the release sheet is cut into strips having a length of 10 mm (measurement length) x width of 5 mm with a cutter knife, and a solid viscoelasticity measuring device (RSAIII, manufactured by TA Instruments Co., Ltd.) is used at 25 ° C. The storage elastic modulus at ~ 500 ° C. is measured. The measurement conditions were a frequency of 1 Hz and a heating rate of 5 ° C./min. At this time, the elastic modulus at 150 ° C. is defined as the storage elastic modulus (Pa) of the release sheet.
 離型シートの150℃における貯蔵弾性率を上記の範囲とすることで、チップと基板との段差に空気を噛み込むことで生じるブラックマトリックス層中の気泡の発生を抑制することができ、段差追従性に優れたブラックマトリックスシートを得ることができる。
 耐熱性の観点から、離型シートの融点はより好ましくは180℃以上であり、さらに好ましくは200℃以上である。また、成形加工温度に相当する温度での耐熱性があれば十分であるため、好ましくは500℃以下であり、より好ましくは450℃以下であり、さらに好ましくは430℃以下である。
By setting the storage elastic modulus of the release sheet at 150 ° C. within the above range, it is possible to suppress the generation of air bubbles in the black matrix layer caused by air being caught in the step between the chip and the substrate, and it is possible to follow the step. A black matrix sheet having excellent properties can be obtained.
From the viewpoint of heat resistance, the melting point of the release sheet is more preferably 180 ° C. or higher, still more preferably 200 ° C. or higher. Further, since it is sufficient to have heat resistance at a temperature corresponding to the molding processing temperature, it is preferably 500 ° C. or lower, more preferably 450 ° C. or lower, and further preferably 430 ° C. or lower.
 上記の離型シートとしては、市販品を採用してもよく、例えば、フッ素樹脂シートフィルム(日東電工製、ニトフロン)、ポリエステル樹脂シート、ポリメチルペンテン樹脂シート(三井化学東セロ製、オピュラン(登録商標))、ポリスチレン樹脂シート(クラボウ製、オイディス(登録商標))などが挙げられる。
 離型シートの厚みは、取扱い性や加工性の観点から、好ましくは10μm以上であり、より好ましくは15μm以上であり、更に好ましくは20μm以上であり、特に好ましくは30μm以上である。また、曲面追従性や段差追従性を発現し易くなり、複雑な三次元曲面の形状の部材に対しても適用し得るブラックマトリックスシートとするため、好ましくは200μm以下であり、より好ましくは100μm以下であり、さらに好ましくは80μm以下であり、よりさらに好ましくは70μm以下である。
As the above-mentioned release sheet, a commercially available product may be adopted, for example, a fluororesin sheet film (manufactured by Nitto Denko, Nitoflon), a polyester resin sheet, a polymethylpentene resin sheet (manufactured by Mitsui Chemicals Tosero, Opulan (registered trademark)). )), Polystyrene resin sheet (manufactured by Kurabo, Oydis (registered trademark)) and the like.
From the viewpoint of handleability and processability, the thickness of the release sheet is preferably 10 μm or more, more preferably 15 μm or more, further preferably 20 μm or more, and particularly preferably 30 μm or more. Further, it is preferably 200 μm or less, more preferably 100 μm or less, in order to obtain a black matrix sheet that easily develops curved surface followability and step followability and can be applied to a member having a complicated three-dimensional curved surface shape. It is more preferably 80 μm or less, and even more preferably 70 μm or less.
〔ブラックマトリックスシートの製造〕
 ブラックマトリックスシートは、任意の適切な方法によって製造し得る。例えば、ブラックマトリックス層の材料と溶剤を含む溶液(ブラックマトリックス組成物)への離型シートのディッピングの後に必要に応じて乾燥する方法、離型シートの表面へのブラックマトリックス層の材料と溶剤を含む溶液の刷毛塗りの後に必要に応じて乾燥する方法、離型シートの表面へのブラックマトリックス層の材料と溶剤を含む溶液の各種コーターによる塗布の後に必要に応じて乾燥する方法、離型シートの表面へのブラックマトリックス層の材料と溶剤を含む溶液のスプレー塗布の後に必要に応じて乾燥する方法などが挙げられる。
[Manufacturing of black matrix sheet]
The black matrix sheet can be manufactured by any suitable method. For example, a method of dipping the release sheet into a solution containing the material and solvent of the black matrix layer and then drying as necessary, the material and solvent of the black matrix layer on the surface of the release sheet. A method of brushing the containing solution and then drying as needed, a method of applying the black matrix layer material to the surface of the release sheet with various coaters of the solution containing the solvent and then drying as needed, the release sheet. Examples thereof include a method of spray-applying a solution containing the material of the black matrix layer and a solvent to the surface of the surface and then drying as necessary.
 ブラックマトリックス組成物としては、ブラックマトリックス層の材料を、溶剤に溶解した溶液が挙げられる。
 溶剤としては、例えば、水、メタノール、エタノール、イソプロピルアルコールなどのアルコール類;メチルエチルケトンなどのケトン類;エステル;脂肪族、脂環族、並びに芳香族炭化水素;ハロゲン化炭化水素;ジメチルホルムアミドなどのアミド類;ジメチルスルホキシドなどのスルホキシド類;ジメチルエーテル、テトラヒドロフランなどのエーテル類;などが挙げられ、ゲル化物の生成を抑制するため、エタノール又はエタノールと水との混合溶媒が好ましい。溶剤は、1種のみであってもよいし、2種以上であってもよい。
Examples of the black matrix composition include a solution in which the material of the black matrix layer is dissolved in a solvent.
Solvents include, for example, alcohols such as water, methanol, ethanol and isopropyl alcohol; ketones such as methyl ethyl ketone; esters; aliphatic, alicyclic and aromatic hydrocarbons; halogenated hydrocarbons; amides such as dimethylformamide. Classes; sulfoxides such as dimethyl sulfoxide; ethers such as dimethyl ether and tetrahydrofuran; and the like; in order to suppress the formation of gelled products, ethanol or a mixed solvent of ethanol and water is preferable. The solvent may be only one kind or two or more kinds.
 ブラックマトリックス組成物における固形分濃度は、目的に応じて適宜設定し得る。ブラックマトリックス層の厚み精度の観点から、質量割合として、好ましくは1質量%~50質量%であり、より好ましくは5質量%~30質量%であり、さらに好ましくは10質量%~25質量%である。 The solid content concentration in the black matrix composition can be appropriately set according to the purpose. From the viewpoint of the thickness accuracy of the black matrix layer, the mass ratio is preferably 1% by mass to 50% by mass, more preferably 5% by mass to 30% by mass, and further preferably 10% by mass to 25% by mass. be.
 ブラックマトリックス組成物には、必要に応じて、pH調整剤、架橋剤、粘度調整剤(増粘剤等)、レベリング剤、剥離調整剤、可塑剤、軟化剤、充填剤、着色剤(顔料、染料等)、界面活性剤、帯電防止剤、防腐剤、老化防止剤、紫外線吸収剤、酸化防止剤、光安定剤等の各種の添加剤を含有してもよい。 Black matrix compositions may include pH regulators, cross-linking agents, viscosity regulators (thickeners, etc.), leveling agents, release regulators, plasticizers, softeners, fillers, colorants (pigments, etc.), as required. It may contain various additives such as dyes), surfactants, antistatic agents, preservatives, antiaging agents, ultraviolet absorbers, antioxidants, light stabilizers and the like.
 本発明の実施形態に係るブラックマトリックスシートは、基板上に、例えば導電性接着剤を用いた熱圧着によって自発光体等のチップ部品を実装する際に用いることができる。
 ブラックマトリックス層を形成し得る基板としては、特に制限はなく、例えば、半導体ウエハ用途のシリコン基板、LED用のサファイア基板、SiC基板および金属ベース基板、ディスプレイ用のTFT(Thin Film Transistor:薄膜トランジスタ)基板およびカラーフィルター基板、並びに有機ELパネル用のベース基板が挙げられる。
The black matrix sheet according to the embodiment of the present invention can be used when a chip component such as a self-luminous body is mounted on a substrate by thermocompression bonding using, for example, a conductive adhesive.
The substrate on which the black matrix layer can be formed is not particularly limited, and is, for example, a silicon substrate for semiconductor wafers, a sapphire substrate for LEDs, a SiC substrate and a metal base substrate, and a TFT (Thin Film Transistor) substrate for displays. And a color filter substrate, and a base substrate for an organic EL panel.
〔自発光型表示体〕
 本発明の実施形態に係る自発光型表示体は、ブラックマトリックス層、及び自発光体を含む自発光型表示体であって、ブラックマトリックス層は、ポリマー成分及び着色剤を含み、ブラックマトリックス層の150℃における貯蔵弾性率が、1×10~1×10Paである。ポリマー成分は極性ユニットと非極性ユニットを有することが好ましい。
[Self-luminous display]
The self-luminous display body according to the embodiment of the present invention is a self-luminous display body including a black matrix layer and a self-luminous display body, and the black matrix layer contains a polymer component and a colorant and is a black matrix layer. The storage elastic modulus at 150 ° C. is 1 × 10 3 to 1 × 10 6 Pa. The polymer component preferably has a polar unit and a non-polar unit.
 本発明の他の実施形態に係る自発光型表示体は、ブラックマトリックス層、及び自発光体を含む自発光型表示体であって、
 前記自発光体の表面上に前記ブラックマトリックス層が存在せず、前記自発光体の周囲のみに前記ブラックマトリックス層を備える。
The self-luminous display body according to another embodiment of the present invention is a self-luminous display body including a black matrix layer and a self-luminous body.
The black matrix layer is not present on the surface of the self-luminous body, and the black matrix layer is provided only around the self-luminous body.
 本発明の実施形態に係る自発光型表示体が含むブラックマトリックス層は、上記ブラックマトリックスシートを用いて転写された転写ブラックマトリックス層であることが好ましい。
 本発明の実施形態に係る自発光型表示体は、遮光性に優れたブラックマトリックス層を含むため、光学特性に優れる。また、転写ブラックマトリックス層は、上述のブラックマトリックス層により形成されることにより、生産性向上の利点がある。
The black matrix layer included in the self-luminous display according to the embodiment of the present invention is preferably a transferred black matrix layer transferred using the above black matrix sheet.
Since the self-luminous display body according to the embodiment of the present invention contains a black matrix layer having excellent light-shielding properties, it has excellent optical characteristics. Further, the transferred black matrix layer has an advantage of improving productivity by being formed by the above-mentioned black matrix layer.
 本発明の実施形態に係る自発光型表示体は、上述のブラックマトリックス層により形成された転写ブラックマトリックス層を備えることが好ましい。
 転写ブラックマトリックス層は、例えば、自発光型表示体における基板上に形成することができる。
The self-luminous display body according to the embodiment of the present invention preferably includes a transfer black matrix layer formed by the above-mentioned black matrix layer.
The transfer black matrix layer can be formed, for example, on a substrate in a self-luminous display.
 基板上には、例えば、導電性接着剤を用いた熱圧着によって自発光体等のチップ部品を実装することができる。導電性接着剤としては、例えば、導電接着ペースト、導電性接着フィルム、異方性導電材料等が挙げられる。
 異方性導電材料は、導電性粒子をエポキシ等のバインダー樹脂に混合した材料であり、例えば、異方性導電ペースト(ACP)、異方性導電フィルム(ACF)、異方性導電インク、異方性導電シート等が挙げられる。
Chip components such as self-luminous bodies can be mounted on the substrate by thermocompression bonding using, for example, a conductive adhesive. Examples of the conductive adhesive include a conductive adhesive paste, a conductive adhesive film, an anisotropic conductive material and the like.
The anisotropic conductive material is a material in which conductive particles are mixed with a binder resin such as epoxy, and is, for example, an anisotropic conductive paste (ACP), an anisotropic conductive film (ACF), an anisotropic conductive ink, or a different material. An anisotropic conductive sheet and the like can be mentioned.
 自発光体としては、例えば、LEDチップ、マイクロLEDチップ等が挙げられる。
 基板としては、例えば、ガラス、透明フィルム等の透明基板等が挙げられる。
Examples of the self-luminous body include an LED chip, a micro LED chip, and the like.
Examples of the substrate include transparent substrates such as glass and transparent films.
 例えば、本発明の実施形態に係る自発光型表示体は、図4に示すように、基板21、TFT(Thin Film Transistor:薄膜トランジスタ)22、異方性導電材料により形成した異方性導電層23、マイクロLEDチップ31、及びブラックマトリックス層12を備え、異方性導電層23上にブラックマトリックス層12を有する部分を含むものであってもよい。
 ブラックマトリックス層におけるポリマー成分が、好ましくは、極性ユニットと非極性ユニットを有し、転写されたブラックマトリックス層12と異方性導電層23とが優れた密着性を示す。
For example, as shown in FIG. 4, the self-luminous display body according to the embodiment of the present invention includes a substrate 21, a TFT (Thin Film Transistor) 22, and an anisotropic conductive layer 23 formed of an anisotropic conductive material. , The micro LED chip 31, and the black matrix layer 12, and may include a portion having the black matrix layer 12 on the anisotropic conductive layer 23.
The polymer component in the black matrix layer preferably has a polar unit and a non-polar unit, and the transferred black matrix layer 12 and the anisotropic conductive layer 23 show excellent adhesion.
 図4においては、基板21上にTFT22が設けられ、TFT22、パッド30及びマイクロLEDチップ31が周辺部に設けられた異方性導電層23を介して物理的かつ電気的に接続し、TFT22上のパッド30にマイクロLEDチップ31が実装されている。 In FIG. 4, the TFT 22 is provided on the substrate 21, and the TFT 22, the pad 30, and the micro LED chip 31 are physically and electrically connected via the anisotropic conductive layer 23 provided in the peripheral portion, and are connected on the TFT 22. The micro LED chip 31 is mounted on the pad 30 of the above.
 自発光型表示体における光学特性の観点から、マイクロLEDチップ31上にはブラックマトリックス層12の残渣が無いことが好ましい。ブラックマトリックス層は150℃における貯蔵弾性率が、1×10~1×10Paであるため、熱圧着の際に溶融し、異方性導電層23上に流れて固化する。そのため、マイクロLEDチップ31上にはブラックマトリックス層12の残渣が生じ難い。 From the viewpoint of optical characteristics in the self-luminous display, it is preferable that there is no residue of the black matrix layer 12 on the micro LED chip 31. Since the black matrix layer has a storage elastic modulus at 150 ° C. of 1 × 10 3 to 1 × 10 6 Pa, it melts during thermocompression bonding and flows onto the anisotropic conductive layer 23 to solidify. Therefore, the residue of the black matrix layer 12 is unlikely to be generated on the micro LED chip 31.
 本発明の実施形態に係る自発光型表示体は、自発光体がマイクロLEDチップであってもよく、マイクロLEDディスプレイであってもよい。 In the self-luminous display body according to the embodiment of the present invention, the self-luminous body may be a micro LED chip or a micro LED display.
 ブラックマトリックス層、転写ブラックマトリックス層としては、上述の説明をそのまま援用し得る。 As the black matrix layer and the transfer black matrix layer, the above description can be used as they are.
<自発光型表示体の製造方法>
 本発明の実施形態に係る自発光型表示体の製造方法は、上記ブラックマトリックスシートを用いる。
 本発明の他の実施形態に係る自発光型表示体の製造方法は、離型シートと、ポリマー成分及び着色剤を含むブラックマトリックス層とを備えたブラックマトリックスシートを用いた、自発光型表示体の製造方法であって、下記(I)及び(II)の工程を含む。
 (I)ブラックマトリックスシートを用いた熱圧着によりブラックマトリックス層を転写し自発光型表示体を製造する工程
 (II)離型シートを剥離する工程
<Manufacturing method of self-luminous display>
The black matrix sheet is used as a method for manufacturing a self-luminous display body according to an embodiment of the present invention.
A method for producing a self-luminous display according to another embodiment of the present invention is a self-luminous display using a release sheet and a black matrix sheet including a black matrix layer containing a polymer component and a colorant. The production method of is included in the following steps (I) and (II).
(I) A step of transferring the black matrix layer by thermocompression bonding using a black matrix sheet to manufacture a self-luminous display body (II) A step of peeling off the release sheet.
 (I)ブラックマトリックスシートを用いた熱圧着によりブラックマトリックス層を転写し自発光型表示体を製造する工程について説明する。 (I) The process of transferring the black matrix layer by thermocompression bonding using the black matrix sheet to manufacture a self-luminous display body will be described.
 図2は、本発明の実施形態に係る自発光型表示体の製造方法を説明する図である。
 図2の(a)は、基板21と、TFT22と、異方性導電層23と、パッド30とを含む積層体上に配置したマイクロLEDチップ31と、ブラックマトリックスシート10とを配置した状態を示す。
 図2の(b)は、基板21と、TFT22と、異方性導電層23と、パッド30とを含む積層体上に配置したパッド30への前記マイクロLEDチップ31の熱圧着が行われる状態を示す。
 図2の(c)は、積層体にマイクロLEDチップ31が熱圧着により実装され、異方性導電層23上にブラックマトリックス層12(転写ブラックマトリックス層)が形成された状態を示す。
 図2の(d)は、離型シート11を剥離し、自発光型表示体が製造された状態を示す。
FIG. 2 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention.
FIG. 2A shows a state in which the substrate 21, the TFT 22, the micro LED chip 31 arranged on the laminate including the anisotropic conductive layer 23, the pad 30, and the black matrix sheet 10 are arranged. show.
FIG. 2B shows a state in which the micro LED chip 31 is thermocompression bonded to a pad 30 arranged on a laminate including a substrate 21, a TFT 22, an anisotropic conductive layer 23, and a pad 30. Is shown.
FIG. 2C shows a state in which the micro LED chip 31 is mounted on the laminate by thermocompression bonding and the black matrix layer 12 (transfer black matrix layer) is formed on the anisotropic conductive layer 23.
FIG. 2D shows a state in which the release sheet 11 is peeled off and a self-luminous display body is manufactured.
 (I)ブラックマトリックスシートを用いた熱圧着によりブラックマトリックス層を転写し自発光型表示体を製造する工程においては、熱圧着における加熱と圧着は同時であってもよく、同時でなくてもよい。また、加熱と圧着はそれぞれ複数回行ってもよい。圧着は減圧であっても加圧であってもよい。例えば、加熱後に圧着してもよく、圧着後に加熱してもよく、加熱後に圧着し、更に加熱してもよい。
 減圧による圧着としては、例えば、積層体及びマイクロLEDチップ31と、ブラックマトリックスシート10との空間を真空状態にすることによる圧着が挙げられる。
 加圧による圧着としては、例えば、ブラックマトリックスシート10を、例えば、圧縮空気、熱加圧ヘッド、プレス機等で加圧することによる圧着が挙げられる。
(I) In the step of transferring the black matrix layer by thermocompression bonding using a black matrix sheet to manufacture a self-luminous display body, the heating and the pressure bonding in the thermocompression bonding may or may not be simultaneous. .. Further, heating and crimping may be performed a plurality of times each. The crimping may be reduced pressure or pressurized. For example, it may be crimped after heating, may be heated after crimping, may be crimped after heating, and may be further heated.
Examples of the crimping by reducing the pressure include crimping by creating a vacuum in the space between the laminate and the micro LED chip 31 and the black matrix sheet 10.
Examples of the crimping by pressurization include crimping by pressurizing the black matrix sheet 10 with compressed air, a heat pressurizing head, a press machine, or the like.
 熱圧着に熱加圧ヘッドを用いる場合、例えば、ブラックマトリックスシートを熱加圧ヘッドと熱圧着対象物である自発光体及び積層体との間に配置した状態で、熱圧着により、ブラックマトリックス層を溶融して積層体の表面に転写し、転写ブラックマトリックス層を備えた自発光型表示体を製造することができる。 When a heat-pressurizing head is used for heat-pressing, for example, a black matrix layer is subjected to heat-pressing in a state where a black matrix sheet is placed between the heat-pressing head and a self-luminous body and a laminated body which are objects of heat-pressing. Can be melted and transferred to the surface of the laminate to produce a self-luminous display body provided with a transfer black matrix layer.
 図3は、本発明の実施形態に係る自発光型表示体の製造方法を説明する図である。
 図3の(a)は、基板21と、TFT22と、異方性導電層23と、パッド30とを含む積層体上に配置したマイクロLEDチップ31と、熱加圧ヘッド40との間にブラックマトリックスシート10を配置した状態を示す。
 図3の(b)は、熱加圧ヘッド40を用いて基板21と、TFT22と、異方性導電層23と、パッド30とを含む積層体上に配置したパッド30への前記マイクロLEDチップ31の熱圧着が行われる状態を示す。
 図3の(c)は、積層体にマイクロLEDチップ31が熱圧着により実装され、異方性導電層23上にブラックマトリックス層12(転写ブラックマトリックス層)が形成された状態を示す。
 図3の(d)は、離型シート11を剥離し、自発光型表示体が製造された状態を示す。
FIG. 3 is a diagram illustrating a method for manufacturing a self-luminous display body according to an embodiment of the present invention.
In FIG. 3A, black is shown between the substrate 21, the TFT 22, the micro LED chip 31 arranged on the laminate including the anisotropic conductive layer 23, and the pad 30, and the heat pressurizing head 40. The state in which the matrix sheet 10 is arranged is shown.
FIG. 3B shows the micro LED chip on a pad 30 arranged on a laminate including a substrate 21, a TFT 22, an anisotropic conductive layer 23, and a pad 30 using a heat-pressurized head 40. The state where the thermocompression bonding of 31 is performed is shown.
FIG. 3C shows a state in which the micro LED chip 31 is mounted on the laminate by thermocompression bonding and the black matrix layer 12 (transfer black matrix layer) is formed on the anisotropic conductive layer 23.
FIG. 3D shows a state in which the release sheet 11 is peeled off and a self-luminous display body is manufactured.
 (I)ブラックマトリックスシートを用いた熱圧着によりブラックマトリックス層を転写し自発光型表示体を製造する工程においては、例えば、図3に示すように、熱加圧ヘッド40とマイクロLEDチップ31との間にブラックマトリックスシートを配置した状態で、前記熱加圧ヘッドを用いて基板21と、TFT22と、異方性導電層23とを含む積層体上に配置したパッド30に前記マイクロLEDチップ31を熱圧着し、前記異方性導電層23上にブラックマトリックス層12(転写ブラックマトリックス層)を形成してもよい。 (I) In the step of transferring the black matrix layer by thermal pressure bonding using the black matrix sheet to manufacture a self-luminous display body, for example, as shown in FIG. 3, the heat pressurizing head 40 and the micro LED chip 31 are used. The micro LED chip 31 is placed on a pad 30 arranged on a laminate including a substrate 21, a TFT 22, and an anisotropic conductive layer 23 using the heat pressurizing head with a black matrix sheet arranged between the two. May be thermally pressure-bonded to form a black matrix layer 12 (transfer black matrix layer) on the anisotropic conductive layer 23.
 上述した通り、本発明の実施形態に係るブラックマトリックスシートは、離型シートを備えるため離型性に優れ、例えば、熱加圧ヘッド40による熱圧着対象物の熱圧着時に熱加圧ヘッドと熱圧着対象物との間に配置して両者の固着を防ぐ耐熱離型シートとして使用できる。そして、熱圧着時にブラックマトリックス層が溶融し熱圧着対象物の表面に転写され転写ブラックマトリックス層を形成することができる。 As described above, the black matrix sheet according to the embodiment of the present invention has excellent mold releasability because it includes a mold releasable sheet. It can be used as a heat-resistant release sheet that is placed between the object to be crimped and prevents the two from sticking. Then, at the time of thermocompression bonding, the black matrix layer is melted and transferred to the surface of the thermocompression bonding object to form a transfer black matrix layer.
 本発明の実施形態に係るブラックマトリックスシートは、熱加圧ヘッド40と熱圧着対象物であるマイクロLEDチップとの間に搬送により供給及び配置してもよい。搬送により供給及び配置されるブラックマトリックスシートは、例えば、帯状である。 The black matrix sheet according to the embodiment of the present invention may be supplied and arranged by transport between the heat pressurizing head 40 and the micro LED chip which is a thermocompression bonding object. The black matrix sheet supplied and arranged by transport is, for example, strip-shaped.
 熱圧着は、例えば100℃~200℃の温度で行うことが好ましい。
 すなわち、熱圧着時における熱加圧ヘッド40の加熱設定温度、言い換えると、ブラックマトリックスシート10の使用温度は100℃~200℃であることが好ましい。ただし、ブラックマトリックスシート10の使用温度は、これらの範囲に限定されない。上記例示より低い使用温度でのブラックマトリックスシート10の使用も可能である。
The thermocompression bonding is preferably performed at a temperature of, for example, 100 ° C to 200 ° C.
That is, the heating set temperature of the thermocompression bonding head 40 at the time of thermocompression bonding, in other words, the operating temperature of the black matrix sheet 10 is preferably 100 ° C to 200 ° C. However, the operating temperature of the black matrix sheet 10 is not limited to these ranges. It is also possible to use the black matrix sheet 10 at a lower operating temperature than the above example.
 (II)前記離型シートを剥離する工程においては、例えば、図3の(d)に示すように、離型シート11を剥離することにより、異方性導電層23上にブラックマトリックス層12を備えた自発光型表示体が得られる。離型シート11の剥離は、手で剥離する、専用の剥離設備を用いて剥離する等、特に限定されない。 (II) In the step of peeling the release sheet, for example, as shown in FIG. 3D, the black matrix layer 12 is formed on the anisotropic conductive layer 23 by peeling the release sheet 11. A self-luminous display body provided can be obtained. The release of the release sheet 11 is not particularly limited, such as peeling by hand or using a dedicated peeling facility.
 このように離型シートが除去されることにより、積層体上の異方性導電層23の表面に、ブラックマトリックスシートが備えるブラックマトリックス層により、ブラックマトリックス層12(転写ブラックマトリックス層)が形成され、自発光型表示体が得られる。
 なお、前述したように、光学特性の観点から、マイクロLEDチップ31上にはブラックマトリックス層12の残渣が無いことが好ましい。ブラックマトリックス層は熱可塑性であるため、熱加圧ヘッド40を用いた熱圧着により溶融し、異方性導電層23上に流れて固化する。そのため、マイクロLEDチップ31上にはブラックマトリックス層12の残渣が生じ難い。
By removing the release sheet in this way, the black matrix layer 12 (transferred black matrix layer) is formed on the surface of the anisotropic conductive layer 23 on the laminated body by the black matrix layer provided in the black matrix sheet. , A self-luminous display can be obtained.
As described above, from the viewpoint of optical characteristics, it is preferable that there is no residue of the black matrix layer 12 on the micro LED chip 31. Since the black matrix layer is thermoplastic, it is melted by thermocompression bonding using the thermocompression bonding head 40, flows onto the anisotropic conductive layer 23, and solidifies. Therefore, the residue of the black matrix layer 12 is unlikely to be generated on the micro LED chip 31.
 ブラックマトリックス層12(転写ブラックマトリックス層)は異方性導電層23上に塗設するのではなくシート状のブラックマトリックスシートを用いてブラックマトリックス層により形成されるため、塗布ムラを防ぐことができる。そのため、生産性を向上することができる。また有機溶剤やモノマーが必要なく作業性に優れ環境負荷や作業負荷が軽減できる。 Since the black matrix layer 12 (transfer black matrix layer) is formed by the black matrix layer using a sheet-shaped black matrix sheet instead of being coated on the anisotropic conductive layer 23, it is possible to prevent coating unevenness. .. Therefore, productivity can be improved. In addition, no organic solvent or monomer is required, and the workability is excellent, and the environmental load and work load can be reduced.
 以下、実施例により本発明を具体的に説明するが、本発明はこれら実施例になんら限定されるものではない。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited to these Examples.
<全光線透過率>
 実施例及び比較例で作製したブラックマトリックスシートを幅:50mm、長さ:50mmのサイズに切断し、村上色彩科学研究所製DOT-3 UV-VIS型を用いて、JIS K 7361に基づき全光線透過率を測定した。
<Total light transmittance>
The black matrix sheet produced in Examples and Comparative Examples was cut into a size of width: 50 mm and length: 50 mm, and using a DOT-3 UV-VIS type manufactured by Murakami Color Science Institute, all light rays based on JIS K 7361. The transmittance was measured.
<ブラックマトリックス層の貯蔵弾性率>
 実施例及び比較例で作製したブラックマトリックスシートを用い、下記の操作により貯蔵弾性率を測定した。
 離型シートを剥離したブラックマトリックス層を積層し、約500μmに積層した積層品を測定サンプルとして用いた。前記積層品を直径25mmにカットし、試験片を作製した。直径25mmの治具を用いて、TAインスツルメンツ社製粘弾性装置ARES-G2にて25~200℃の温度分散を実施した。その際、昇温速度は5℃/min、周波数は1Hzとした。このとき150℃での弾性率をブラックマトリックス層の貯蔵弾性率(Pa)とした。
<Store modulus of black matrix layer>
Using the black matrix sheets prepared in Examples and Comparative Examples, the storage elastic modulus was measured by the following operation.
The black matrix layer from which the release sheet was peeled off was laminated, and the laminated product laminated to about 500 μm was used as a measurement sample. The laminated product was cut to a diameter of 25 mm to prepare a test piece. Using a jig having a diameter of 25 mm, temperature dispersion at 25 to 200 ° C. was carried out with a viscoelastic device ARES-G2 manufactured by TA Instruments. At that time, the temperature rising rate was 5 ° C./min and the frequency was 1 Hz. At this time, the elastic modulus at 150 ° C. was defined as the storage elastic modulus (Pa) of the black matrix layer.
<離型シートの貯蔵弾性率>
 離型シートを長さ10mm(測定長さ)×幅5mmの短冊状にカッターナイフで切り出し、個体粘弾性測定装置(RSAIII、TAインスツルメンツ(株)製)を用いて、25℃~500℃における貯蔵弾性率を測定した。測定条件は、周波数1Hz、昇温速度5℃/minとした。このとき150℃での弾性率を離型シートの貯蔵弾性率(Pa)とした。
<Retractable elastic modulus of mold release sheet>
Cut the release sheet into strips with a length of 10 mm (measurement length) x width of 5 mm with a cutter knife, and store them at 25 ° C to 500 ° C using a solid viscoelasticity measuring device (RSAIII, manufactured by TA Instruments Co., Ltd.). The elastic modulus was measured. The measurement conditions were a frequency of 1 Hz and a heating rate of 5 ° C./min. At this time, the elastic modulus at 150 ° C. was defined as the storage elastic modulus (Pa) of the release sheet.
<評価用サンプルの作製>
 無アルカリガラス基板上にエポキシ樹脂シートを貼り合せ、その上に高さ約5μmの金属片(チップ)を設置し、凸部含有積層体を作製した。
 上記積層体に、ブラックマトリックス層が積層体側となるようにブラックマトリックスシートを設置し、ヒートシーラーで180℃、5分間、0.5MPaで熱圧着させた。5分放冷後、離型シートを剥離し、評価用サンプルとした。
<Preparation of sample for evaluation>
An epoxy resin sheet was laminated on a non-alkali glass substrate, and a metal piece (chip) having a height of about 5 μm was placed on the epoxy resin sheet to prepare a laminated body containing a convex portion.
A black matrix sheet was placed on the laminate so that the black matrix layer was on the laminate side, and thermocompression bonding was performed at 180 ° C. for 5 minutes at 0.5 MPa with a heat sealer. After allowing to cool for 5 minutes, the release sheet was peeled off to prepare a sample for evaluation.
<チップ上残渣>
 上記で作製した評価用サンプルをデジタルマイクロスコープ(キーエンス社製、VHX-100F)で観察した。チップ表面上の残渣をデジタルマイクロスコープにて観察した結果を下記の評価基準により評価した。
 〇:チップ表面上にブラックマトリックス層の残渣なし
 △:残渣がチップ表面積全体の0%超50%以下
 ×:残渣がチップ表面積全体の50%超
<Residue on chip>
The evaluation sample prepared above was observed with a digital microscope (VHX-100F manufactured by KEYENCE CORPORATION). The results of observing the residue on the chip surface with a digital microscope were evaluated according to the following evaluation criteria.
〇: No black matrix layer residue on the chip surface Δ: Residue is more than 0% and 50% or less of the total chip surface area ×: Residue is more than 50% of the total chip surface area
<段差追従性>
 上記で作製した評価用サンプルをデジタルマイクロスコープ(キーエンス社製、VHX-100F)で観察した。チップと基板(エポキシ樹脂シート)との段差によるチップ周囲のブラックマトリックス層中に生じた気泡の発生の有無をデジタルマイクロスコープにて観察した結果を、下記の評価基準により評価した。
 〇:チップ周囲の気泡の発生なし(観察できず)
 △:チップ周囲の気泡の発生幅が0μm超0.5μm未満
 ×:チップ周囲の気泡の発生幅が0.5μm以上
<Step followability>
The evaluation sample prepared above was observed with a digital microscope (VHX-100F manufactured by KEYENCE CORPORATION). The results of observing with a digital microscope the presence or absence of bubbles generated in the black matrix layer around the chip due to the step between the chip and the substrate (epoxy resin sheet) were evaluated according to the following evaluation criteria.
〇: No bubbles around the chip (not observable)
Δ: Bubble generation width around the chip is more than 0 μm and less than 0.5 μm ×: Bubble generation width around the chip is 0.5 μm or more
<密着性>
 上記で作製した評価用サンプルのチップが搭載されていない箇所を、幅約20mm長さ約20mmに切り出し、JIS K5600-5-6記載のクロスカット法にてクロスカット評価を実施し、密着性として評価した。
  ・カットの間隔:2mm
  ・クロスカット個数:100マス
  ・剥離テープ:(ニチバン)セロハンテープ(登録商標)24mm幅
 〇:剥離したマス数が0~10個
 △:剥離したマス数が11~50個
 ×:剥離したマス数が51~100個
<Adhesion>
The part where the chip of the evaluation sample produced above is not mounted is cut out to a width of about 20 mm and a length of about 20 mm, and cross-cut evaluation is performed by the cross-cut method described in JIS K5600-5-6 to obtain adhesion. evaluated.
・ Cut interval: 2 mm
・ Number of cross-cuts: 100 squares ・ Peeling tape: (Nichiban) Cellophane tape (registered trademark) 24 mm width 〇: Number of peeled squares is 0 to 10 △: Number of peeled squares is 11 to 50 ×: Number of peeled squares 51-100 pieces
<膜厚>
 ブラックマトリックスシートにおけるブラックマトリックス層の膜厚はダイヤルゲージ(ピーコック製GC-9)により測定した。ブラックマトリックスシートの厚みを測定し、その箇所のブラックマトリックス層を除去した離型シートの厚み(μm)を測定し、その差をブラックマトリックス層の厚み(μm)とした。平均厚み(μm)は10点を測定した平均値である。
<Film thickness>
The film thickness of the black matrix layer in the black matrix sheet was measured with a dial gauge (GC-9 manufactured by Peacock). The thickness of the black matrix sheet was measured, the thickness (μm) of the release sheet from which the black matrix layer was removed at that location was measured, and the difference was taken as the thickness (μm) of the black matrix layer. The average thickness (μm) is an average value measured at 10 points.
〔実施例1〕
 (ブラックマトリックスシート(1))
 株式会社鉛市製 Fine Resin 105(FR105 メトキシメチル化ポリアミド樹脂(PA6))100質量部を60℃の工業用エタノール(ソルミックスAP-1)/水=80質量%/20質量%の混合溶媒に溶解し、着色剤として御国色素社製 カーボンブラック(CB 平均粒径105nm)No.3684を50質量部添加して常温で撹拌し、固形分濃度15質量%の溶液(1)を調製した。
[Example 1]
(Black matrix sheet (1))
100 parts by mass of Fine Resin 105 (FR105 methoxymethylated polyamide resin (PA6)) manufactured by Namariichi Co., Ltd. in a mixed solvent of industrial ethanol (Solmix AP-1) at 60 ° C./water = 80% by mass / 20% by mass. As a colorant, it dissolves and is manufactured by Mikuni Color Co., Ltd. Carbon black (CB average particle size 105 nm) No. 50 parts by mass of 3648 was added and stirred at room temperature to prepare a solution (1) having a solid content concentration of 15% by mass.
 調製した溶液(1)を目開き188μmのナイロンメッシュでろ過した後、離型シート(日東電工(株)製、ニトフロンNo.900UL(厚み0.05mm、寸法:幅250mm×長さ450mm))にアプリケーターにて塗工し、風乾した後、恒温乾燥器にて80℃×3分間さらに乾燥させ、厚み2.1μmのブラックマトリックス層及び離型シートを備えたブラックマトリックスシート(1)を作製した。 The prepared solution (1) is filtered through a nylon mesh with an opening of 188 μm, and then placed on a release sheet (Nitto Denko Corporation, Nitto Flon No. 900UL (thickness 0.05 mm, dimensions: width 250 mm × length 450 mm)). After coating with an applicator and air-drying, the mixture was further dried at 80 ° C. for 3 minutes in a constant temperature dryer to prepare a black matrix sheet (1) having a thickness of 2.1 μm and a black matrix layer and a release sheet.
〔実施例2~13、101~103、比較例1及び2〕
 ブラックマトリックス層、及び離型シートを表1~表3のように変更した以外は、実施例1と同様にしてブラックマトリックスシートを作製した。
[Examples 2 to 13, 101 to 103, Comparative Examples 1 and 2]
A black matrix sheet was produced in the same manner as in Example 1 except that the black matrix layer and the release sheet were changed as shown in Tables 1 to 3.
 作製したブラックマトリックスシートについて評価した結果を、以下の表1~表3に示す。表中のCBの添加量はポリマー100質量部に対する量である。 The evaluation results of the prepared black matrix sheet are shown in Tables 1 to 3 below. The amount of CB added in the table is the amount with respect to 100 parts by mass of the polymer.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 表1~表3中に記載の材料は下記のとおりである。
〔ブラックマトリックス層〕
(主剤)
 FR105:メトキシメチル化ポリアミド樹脂(鉛市株式会社製 Fine Resin 105)
 CM8000:ポリアミド共重合樹脂(東レ株式会社製 アミラン)
 ユニアミド:ポリアミド樹脂(ユニチカ株式会社製)
 V01:ポリアミド樹脂(モトキコーポレーション株式会社製 バギングフィルム)
The materials listed in Tables 1 to 3 are as follows.
[Black matrix layer]
(Main agent)
FR105: Methoxymethylated polyamide resin (Fine Resin 105 manufactured by Lead City Co., Ltd.)
CM8000: Polyamide copolymer resin (Amilan manufactured by Toray Industries, Inc.)
Uniamide: Polyamide resin (manufactured by Unitika Ltd.)
V01: Polyamide resin (bagging film manufactured by Motoki Corporation)
(着色剤)
 No.3684:カーボンブラック分散液(御国色素株式会社製)
 No.3685:カーボンブラック分散液(御国色素株式会社製)
 #217:カーボンブラック分散液(御国色素株式会社製 MHIブラック#217)
(Colorant)
No. 3648: Carbon black dispersion (manufactured by Mikuni Color Co., Ltd.)
No. 3685: Carbon black dispersion (manufactured by Mikuni Color Co., Ltd.)
# 217: Carbon black dispersion (MHI Black # 217 manufactured by Mikuni Color Co., Ltd.)
〔離型シート〕
 900UL:フッ素樹脂シートフィルム(日東電工株式会社製 ポリテトラフルオロエチレン(PTFE)ニフトロン900UL)
 FMN50WD:PETフィルム(フジコー株式会社製)
 TPX X-88BMT4:特殊ポリオレフィンフィルム(三井化学東セロ株式会社製)
 E930H50:易成型PETフィルム(三菱ケミカル株式会社製)
[Release sheet]
900UL: Fluororesin sheet film (Polytetrafluoroethylene (PTFE) Niftron 900UL manufactured by Nitto Denko Corporation)
FMN50WD: PET film (manufactured by Fujiko Co., Ltd.)
TPX X-88BMT4: Special polyolefin film (manufactured by Mitsui Chemicals Tocello Co., Ltd.)
E930H50: Easy-to-mold PET film (manufactured by Mitsubishi Chemical Corporation)
 本発明によれば、遮光性に優れ光学特性を向上し、工数を削減してブラックマトリックス層を形成でき、歩留まりの向上を実現し得る、生産性の高いブラックマトリックスシートを提供することができる。 According to the present invention, it is possible to provide a highly productive black matrix sheet which is excellent in light-shielding property, improves optical characteristics, can reduce man-hours to form a black matrix layer, and can realize an improvement in yield.
 本発明を詳細にまた特定の実施態様を参照して説明したが、本発明の精神と範囲を逸脱することなく様々な変更や修正を加えることができることは当業者にとって明らかである。
 本出願は、2020年12月28日出願の日本特許出願(特願2020-219257)に基づくものであり、その内容はここに参照として取り込まれる。
Although the present invention has been described in detail and with reference to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the spirit and scope of the invention.
This application is based on a Japanese patent application filed on December 28, 2020 (Japanese Patent Application No. 2020-219257), the contents of which are incorporated herein by reference.
10  ブラックマトリックスシート
11  離型シート
12  ブラックマトリックス層
21  基板
22  TFT
23  異方性導電層
30  パッド
31  マイクロLEDチップ
40  熱加圧ヘッド
10 Black Matrix Sheet 11 Release Sheet 12 Black Matrix Layer 21 Substrate 22 TFT
23 Anisotropic conductive layer 30 Pad 31 Micro LED chip 40 Thermal pressurization head

Claims (15)

  1.  離型シートと、ポリマー成分及び着色剤を含むブラックマトリックス層とを備え、
     前記ブラックマトリックス層の150℃における貯蔵弾性率が、1×10~1×10Paである、ブラックマトリックスシート。
    A mold release sheet and a black matrix layer containing a polymer component and a colorant are provided.
    A black matrix sheet having a storage elastic modulus of the black matrix layer at 150 ° C. of 1 × 10 3 to 1 × 10 6 Pa.
  2.  前記離型シートの150℃における貯蔵弾性率が、7×10~2×10Paである、請求項1に記載のブラックマトリックスシート。 The black matrix sheet according to claim 1, wherein the release elastic modulus of the release sheet at 150 ° C. is 7 × 10 6 to 2 × 10 8 Pa.
  3.  前記ポリマー成分が極性ユニットと非極性ユニットを有する、請求項1又は2に記載のブラックマトリックスシート。 The black matrix sheet according to claim 1 or 2, wherein the polymer component has a polar unit and a non-polar unit.
  4.  前記ポリマー成分が、ポリアミド樹脂を含有する、請求項1~3のいずれか一項に記載のブラックマトリックスシート。 The black matrix sheet according to any one of claims 1 to 3, wherein the polymer component contains a polyamide resin.
  5.  前記着色剤が、染料または顔料から選択される少なくとも1種を含有する、請求項1~4のいずれか一項に記載のブラックマトリックスシート。 The black matrix sheet according to any one of claims 1 to 4, wherein the colorant contains at least one selected from a dye or a pigment.
  6.  前記着色剤が、カーボンブラックを含有する、請求項1~5のいずれか一項に記載のブラックマトリックスシート。 The black matrix sheet according to any one of claims 1 to 5, wherein the colorant contains carbon black.
  7.  前記着色剤の含有量が、前記ポリマー成分100質量部に対し10~200質量部である、請求項1~6のいずれか一項に記載のブラックマトリックスシート。 The black matrix sheet according to any one of claims 1 to 6, wherein the content of the colorant is 10 to 200 parts by mass with respect to 100 parts by mass of the polymer component.
  8.  前記ブラックマトリックス層の厚みが0.1~10μmである、請求項1~7のいずれか一項に記載のブラックマトリックスシート。 The black matrix sheet according to any one of claims 1 to 7, wherein the thickness of the black matrix layer is 0.1 to 10 μm.
  9.  前記離型シートの厚みが10~200μmである、請求項1~8のいずれか一項に記載のブラックマトリクックスシート。 The black matrix sheet according to any one of claims 1 to 8, wherein the release sheet has a thickness of 10 to 200 μm.
  10.  全光線透過率が0.01以上5%未満である、請求項1~9のいずれか一項に記載のブラックマトリックスシート。 The black matrix sheet according to any one of claims 1 to 9, wherein the total light transmittance is 0.01 or more and less than 5%.
  11.  ブラックマトリックス層、及び自発光体を含む自発光型表示体であって、
     前記ブラックマトリックス層は、ポリマー成分及び着色剤を含み、
     前記ブラックマトリックス層の150℃における貯蔵弾性率が、1×10~1×10Paであり、
     前記ポリマー成分が極性ユニットと非極性ユニットを有する、
    自発光型表示体。
    A self-luminous display body including a black matrix layer and a self-luminous body.
    The black matrix layer contains a polymer component and a colorant.
    The storage elastic modulus of the black matrix layer at 150 ° C. is 1 × 10 3 to 1 × 10 6 Pa.
    The polymer component has a polar unit and a non-polar unit.
    Self-luminous display.
  12.  ブラックマトリックス層、及び自発光体を含む自発光型表示体であって、
     前記自発光体の表面上に前記ブラックマトリックス層が存在せず、前記自発光体の周囲のみに前記ブラックマトリックス層を備えた、自発光型表示体。
    A self-luminous display body including a black matrix layer and a self-luminous body.
    A self-luminous display body in which the black matrix layer is not present on the surface of the self-luminous body and the black matrix layer is provided only around the self-luminous body.
  13.  前記自発光体がマイクロLEDチップである、請求項11又は12に記載の自発光型表示体。 The self-luminous display according to claim 11 or 12, wherein the self-luminous body is a micro LED chip.
  14.  請求項1~10のいずれか一項に記載のブラックマトリックスシートを用いた自発光型表示体の製造方法。 A method for manufacturing a self-luminous display using the black matrix sheet according to any one of claims 1 to 10.
  15.  離型シートと、ポリマー成分及び着色剤を含むブラックマトリックス層とを備えたブラックマトリックスシートを用いた、自発光型表示体の製造方法であって、
     下記(I)及び(II)の工程を含む、自発光型表示体の製造方法。
    (I)前記ブラックマトリックスシートを用いた熱圧着により前記ブラックマトリックス層を転写し自発光型表示体を製造する工程
    (II)前記離型シートを剥離する工程
    A method for manufacturing a self-luminous display using a black matrix sheet including a release sheet and a black matrix layer containing a polymer component and a colorant.
    A method for manufacturing a self-luminous display body, which comprises the following steps (I) and (II).
    (I) A step of transferring the black matrix layer by thermocompression bonding using the black matrix sheet to manufacture a self-luminous display body (II) A step of peeling off the release sheet.
PCT/JP2021/048431 2020-12-28 2021-12-24 Black matrix sheet, self-luminous display body, and method for manufacturing self-luminous display body WO2022145399A1 (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0566305A (en) * 1991-09-09 1993-03-19 Matsushita Electric Ind Co Ltd Color filter and production thereof
JPH08160218A (en) * 1994-12-09 1996-06-21 Toppan Printing Co Ltd Production of color filter
JP2014208767A (en) * 2013-03-28 2014-11-06 大阪ガスケミカル株式会社 Polyamide resin having fluorene skeleton and application thereof
WO2017149521A1 (en) * 2016-03-04 2017-09-08 Vuereal Inc. Micro device integration into system substrate
JP2019194016A (en) * 2018-04-26 2019-11-07 日東電工株式会社 Surface modification sheet, surface modification member, coated article and method for producing coated article
WO2020115837A1 (en) * 2018-12-05 2020-06-11 凸版印刷株式会社 Black matrix substrate and display device equipped with black matrix substrate
JP2020117570A (en) * 2019-01-21 2020-08-06 三菱ケミカル株式会社 Alkali-soluble resin, photosensitive resin composition, cured product, and image display device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0566305A (en) * 1991-09-09 1993-03-19 Matsushita Electric Ind Co Ltd Color filter and production thereof
JPH08160218A (en) * 1994-12-09 1996-06-21 Toppan Printing Co Ltd Production of color filter
JP2014208767A (en) * 2013-03-28 2014-11-06 大阪ガスケミカル株式会社 Polyamide resin having fluorene skeleton and application thereof
WO2017149521A1 (en) * 2016-03-04 2017-09-08 Vuereal Inc. Micro device integration into system substrate
JP2019194016A (en) * 2018-04-26 2019-11-07 日東電工株式会社 Surface modification sheet, surface modification member, coated article and method for producing coated article
WO2020115837A1 (en) * 2018-12-05 2020-06-11 凸版印刷株式会社 Black matrix substrate and display device equipped with black matrix substrate
JP2020117570A (en) * 2019-01-21 2020-08-06 三菱ケミカル株式会社 Alkali-soluble resin, photosensitive resin composition, cured product, and image display device

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