WO2022138173A1 - Copolymer, and method for producing said copolymer - Google Patents
Copolymer, and method for producing said copolymer Download PDFInfo
- Publication number
- WO2022138173A1 WO2022138173A1 PCT/JP2021/045180 JP2021045180W WO2022138173A1 WO 2022138173 A1 WO2022138173 A1 WO 2022138173A1 JP 2021045180 W JP2021045180 W JP 2021045180W WO 2022138173 A1 WO2022138173 A1 WO 2022138173A1
- Authority
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- WIPO (PCT)
- Prior art keywords
- solvent
- copolymer
- structural unit
- resin composition
- meth
- Prior art date
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- 229920001577 copolymer Polymers 0.000 title claims abstract description 196
- 238000004519 manufacturing process Methods 0.000 title claims description 31
- -1 pyrazole compound Chemical class 0.000 claims abstract description 91
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 90
- 239000002253 acid Substances 0.000 claims abstract description 37
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims abstract description 24
- 230000009477 glass transition Effects 0.000 claims abstract description 20
- 239000002904 solvent Substances 0.000 claims description 267
- 239000000178 monomer Substances 0.000 claims description 159
- 239000011342 resin composition Substances 0.000 claims description 158
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 98
- 239000000243 solution Substances 0.000 claims description 83
- 238000006116 polymerization reaction Methods 0.000 claims description 76
- 238000010438 heat treatment Methods 0.000 claims description 42
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 claims description 42
- 239000003085 diluting agent Substances 0.000 claims description 35
- 239000003505 polymerization initiator Substances 0.000 claims description 34
- 239000012986 chain transfer agent Substances 0.000 claims description 33
- 239000003086 colorant Substances 0.000 claims description 32
- 238000004040 coloring Methods 0.000 claims description 32
- 239000003999 initiator Substances 0.000 claims description 23
- 239000011259 mixed solution Substances 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 14
- 238000003756 stirring Methods 0.000 claims description 9
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 4
- 150000001735 carboxylic acids Chemical class 0.000 claims description 2
- 239000000758 substrate Substances 0.000 description 59
- 238000000576 coating method Methods 0.000 description 48
- 239000011248 coating agent Substances 0.000 description 46
- 239000000047 product Substances 0.000 description 41
- 239000000463 material Substances 0.000 description 37
- 238000006243 chemical reaction Methods 0.000 description 36
- 238000000034 method Methods 0.000 description 27
- 239000000470 constituent Substances 0.000 description 23
- 239000000203 mixture Substances 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 22
- 238000001723 curing Methods 0.000 description 22
- 238000003786 synthesis reaction Methods 0.000 description 22
- 238000003860 storage Methods 0.000 description 20
- 230000000052 comparative effect Effects 0.000 description 19
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- 239000011159 matrix material Substances 0.000 description 18
- 239000000049 pigment Substances 0.000 description 17
- 229920000642 polymer Polymers 0.000 description 16
- 239000004973 liquid crystal related substance Substances 0.000 description 15
- 239000003513 alkali Substances 0.000 description 14
- 125000004432 carbon atom Chemical group C* 0.000 description 13
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 12
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 12
- 239000002270 dispersing agent Substances 0.000 description 12
- 239000000975 dye Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 10
- 239000012948 isocyanate Substances 0.000 description 10
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 9
- 125000002947 alkylene group Chemical group 0.000 description 9
- 239000007864 aqueous solution Substances 0.000 description 9
- 238000011161 development Methods 0.000 description 9
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 9
- 238000005401 electroluminescence Methods 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 8
- 238000002156 mixing Methods 0.000 description 8
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 7
- 125000006850 spacer group Chemical group 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 6
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 5
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 4
- WLTSXAIICPDFKI-UHFFFAOYSA-N 3-dodecene Chemical compound CCCCCCCCC=CCC WLTSXAIICPDFKI-UHFFFAOYSA-N 0.000 description 4
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 239000012965 benzophenone Substances 0.000 description 4
- 230000008033 biological extinction Effects 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- WYGWHHGCAGTUCH-UHFFFAOYSA-N 2-[(2-cyano-4-methylpentan-2-yl)diazenyl]-2,4-dimethylpentanenitrile Chemical compound CC(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)C WYGWHHGCAGTUCH-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000000732 arylene group Chemical group 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 230000008719 thickening Effects 0.000 description 3
- 150000003573 thiols Chemical class 0.000 description 3
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 3
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 2
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 2
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 2
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 2
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 2
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 2
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- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
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- VTLHIRNKQSFSJS-UHFFFAOYSA-N [3-(3-sulfanylbutanoyloxy)-2,2-bis(3-sulfanylbutanoyloxymethyl)propyl] 3-sulfanylbutanoate Chemical compound CC(S)CC(=O)OCC(COC(=O)CC(C)S)(COC(=O)CC(C)S)COC(=O)CC(C)S VTLHIRNKQSFSJS-UHFFFAOYSA-N 0.000 description 2
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
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- 125000006297 carbonyl amino group Chemical group [H]N([*:2])C([*:1])=O 0.000 description 2
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- BEQIIZJSZSVJJK-UHFFFAOYSA-M chembl2028372 Chemical compound [Na+].OC1=CC=C(S([O-])(=O)=O)C=C1N=NC1=C(O)C=CC2=CC=CC=C12 BEQIIZJSZSVJJK-UHFFFAOYSA-M 0.000 description 2
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- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
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- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
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- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
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- 125000000075 primary alcohol group Chemical group 0.000 description 1
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- OXTXYKOWIHKUFN-UHFFFAOYSA-N tetratert-butyl 5-benzoylbenzene-1,2,3,4-tetracarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC(C(=O)C=2C=CC=CC=2)=C1C(=O)OOC(C)(C)C OXTXYKOWIHKUFN-UHFFFAOYSA-N 0.000 description 1
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- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/20—Esters of polyhydric alcohols or phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
Definitions
- the present invention relates to a copolymer, a resin composition, a color filter, an image display element, and a method for producing a copolymer.
- an organic electroluminescence (EL) display device (particularly, a WRGB method that combines a white light emitting organic EL and a color filter), a liquid crystal display element, an integrated circuit element, a color filter for an image display element such as a solid-state image sensor, A film such as a black matrix, a color filter protective film, a photo spacer, a protrusion for liquid crystal alignment, a microlens, an insulating film for a touch panel, and a fine pattern are provided.
- EL organic electroluminescence
- Patent Document 1 describes (a) a polymerization initiator having an extinction coefficient of 365 nm in methanol of 1.0 ⁇ 10 3 mL / gcm or more, and (b) an extinction coefficient of 365 nm in methanol of 1.0 ⁇ .
- Patent Document 2 describes a photosensitive composition for a color filter containing a compound (A) containing a frill group, a compound (B) containing a photopolymerizable functional group, a photopolymerization initiator (C), and a colorant. It has been disclosed.
- the conventional resin composition has good developability and storage stability when used as a photosensitive material, and does not provide a cured product having excellent solvent resistance when cured at a low temperature. rice field.
- the present invention has been made in view of the above circumstances, has good developability when used as a photosensitive material, has excellent storage stability, and has excellent solvent resistance even when cured at a low temperature. It is an object of the present invention to provide a resin composition for obtaining a cured product, a copolymer useful for preparing the resin composition, and a method for producing the copolymer.
- the present invention provides a color filter having a coloring pattern made of a cured product of a resin composition, which has good developability and a cured product having excellent solvent resistance even when cured at a low temperature, and a color filter thereof. It is an object of the present invention to provide an image display element provided.
- the first aspect of the present invention provides the following copolymers.
- the copolymer of the first aspect of the present invention preferably has the characteristics described in the following [2] to [6]. It is also preferable to arbitrarily combine two or more of the features described in the following [2] to [6]. [2] The copolymer according to [1], wherein the structural unit (b) is a structural unit derived from hydroxyalkyl (meth) acrylate. [3] The copolymer according to [1] or [2], wherein the structural unit (c) is a structural unit derived from an unsaturated carboxylic acid.
- [5] [1] to [4] contain the structural unit (a) in an amount of 1 to 45 mol%, the structural unit (b) in an amount of 1 to 50 mol%, and the structural unit (c) in an amount of 1 to 60 mol%.
- the copolymer according to any one of. [6] The copolymer according to any one of [1] to [5], which has a weight average molecular weight of 1000 to 50,000.
- a second aspect of the present invention provides the following resin composition.
- the copolymer (A) according to any one of [1] to [6] and the solvent (B) are contained, and the solvent (B) contains a hydroxy group-containing solvent.
- the second aspect of the present invention preferably has the following features [8] to [10]. It is also preferable that these features are used in combination.
- the resin composition according to [7] which further contains a reactive diluent (C) and a photopolymerization initiator (D).
- the resin composition according to [8] further containing the colorant (E).
- the copolymer (A) is 10 to 90 parts by mass, 30 to 1000 parts by mass of the solvent (B), 10 to 90 parts by mass of the reactive diluent (C), 0.1 to 30 parts by mass of the photopolymerization initiator (D),
- the resin composition according to [9] which contains 3 to 80 parts by mass of the colorant (E).
- a fifth aspect of the present invention provides the following method for producing a copolymer.
- the solvent heating step (I) for raising the temperature of the solvent (B-1) to 60 to 90 ° C.
- the solvent (B) in which the temperature of the monomer (ma) having a blocked isocyanato group blocked by the pyrazole compound, the hydroxy group-containing monomer (mb), and the acid group-containing monomer (mc) was heated.
- a dropping polymerization step (II) in which a polymerization initiator solution in which a polymerization initiator is dissolved in a solvent (B-2) is added dropwise to the solvent (B-1) to form a mixed solution.
- the fifth aspect of the present invention has the following features [14] and [15].
- [14] The method for producing a copolymer according to [13], wherein in the solvent heating step (I), a chain transfer agent is added to the solvent (B-1) and then the temperature is raised.
- [15] The structural unit (a) having a blocked isocyanato group blocked by the pyrazole compound, the structural unit (b) having a hydroxy group, and the structural unit (c) having an acid group by the post-polymerization step (III).
- the method for producing a copolymer according to [13] wherein a copolymer containing (1) and having a glass transition temperature of 30 ° C. or lower can be obtained.
- a resin composition capable of obtaining a cured product having good alkali developability when used as a photosensitive material, excellent storage stability, and excellent solvent resistance even when cured at a low temperature.
- a product, a copolymer useful for preparing the resin composition, and a method for producing the copolymer can be provided.
- An image display element provided with a color filter can be provided.
- the copolymer of the present invention the method for producing the copolymer, the resin composition, the color filter, and the image display element will be described in detail.
- the present invention is not limited to the embodiments shown below.
- the present invention is not limited to the following examples, and additions, omissions, and substitutions are added, omitted, and substituted with respect to numbers, quantities, ratios, compositions, types, positions, materials, configurations, etc., without departing from the spirit of the present invention. Or, it can be changed.
- the copolymer (A) of the present embodiment has a structural unit (a) having a blocked isocyanato group blocked with a pyrazole compound (hereinafter, also simply referred to as “constituent unit (a)”) and a hydroxy group. It contains a structural unit (b) (hereinafter, also simply referred to as “constituent unit (b)”) and a structural unit (c) having an acid group (hereinafter, also simply referred to as “constituent unit (c)”). ..
- the structural unit (a) is a structural unit derived from a monomer (ma) having a blocked isocyanate group blocked with a pyrazole compound (hereinafter, also simply referred to as “monomer (ma)”).
- the blocked isocyanate group of the structural unit (a) contained in the copolymer (A) is deblocked by thermally curing the resin composition containing the copolymer (A) to generate an isocyanate group. Then, it reacts with the hydroxy group of the structural unit (b) to form a crosslinked structure. Therefore, the resin composition containing the copolymer (A) can be cured at a low temperature of 50 ° C. to 150 ° C. to obtain a cured film having excellent solvent resistance.
- Examples of the pyrazole compound that is a blocking agent for the block isocyanato group include pyrazole; alkylpyrazole such as 3-methylpyrazole and 5-ethylpyrazole; and dialkylpyrazole such as 3,5-dimethylpyrazole and 3,5-diethylpyrazole; 3-. Examples thereof include acetylaminopyrazole and pyrazole-3,5-dicarboxylic acid diethyl ester. Among these, dialkylpyrazole is preferable, and 3,5-dimethylpyrazole is more preferable, from the viewpoint of low-temperature curability as a resin composition and availability of raw materials.
- the monomer (ma) that gives the structural unit (a) is not particularly limited as long as it is a compound that can be copolymerized with the hydroxy group-containing monomer (mb) and the acid group-containing monomer (mc) described later. ..
- the monomer (ma) for example, a monomer having a blocked isocyanato group and an ethylenically unsaturated bond can be used from the viewpoint of reactivity when synthesizing the copolymer (A).
- Specific examples of the group having an ethylenically unsaturated bond include a vinyl group and a (meth) acryloyloxy group.
- Examples of the monomer (ma) having a block isocyanato group and an ethylenically unsaturated bond include a reaction product of an ethylenically unsaturated group-containing isocyanate compound and a pyrazole compound. These monomers (ma) may be used alone or in combination of two or more.
- the ethylenically unsaturated group-containing isocyanate compound used for forming the monomer (ma) or possessed by the monomer (ma) is preferably a compound represented by the following formula (1).
- R 4 represents a hydrogen atom or a methyl group
- R 5 is -CO-, -COOR 6- (where R 6 is an alkylene group having 1 to 6 carbon atoms. ) Or -COO-R 7 O-CONH-R 8- (where R 7 is an alkylene group having 2 to 6 carbon atoms; R 8 is an alkylene group having 2 to 6 carbon atoms which may have a substituent. It represents 12 alkylene groups or arylene groups having 6 to 12 carbon atoms.
- R4 in the formula (1) represents a hydrogen atom or a methyl group.
- R 5 in the formula (1) represents -CO-, -COOR 6- or -COO-R 7 O-CONH-R 8- .
- R 6 is an alkylene group having 1 to 6 carbon atoms.
- the number of carbon atoms may be 2 to 5 or 3 to 4.
- R 7 is an alkylene group having 2 to 6 carbon atoms.
- the number of carbon atoms may be 2 to 5 or 3 to 4.
- R 8 is an alkylene group having 2 to 12 carbon atoms or an arylene group having 6 to 12 carbon atoms which may have a substituent.
- the number of carbon atoms of the alkylene group may be 3 to 10 or 4 to 8.
- the number of carbon atoms of the arylene group may be 7 to 10 or 8 to 9.
- R 5 in the formula (1) is preferably ⁇ COOR 6 ⁇ .
- R 6 is preferably an alkylene group having 1 to 4 carbon atoms.
- ethylenically unsaturated group-containing isocyanate compound represented by the above formula (1) include 2-isocyanatoethyl (meth) acrylate, 2-isocyanatopropyl (meth) acrylate, and 3-isocyanatopropyl.
- an equimolar (1 mol: 1 mol) reaction product of a 2-hydroxyalkyl (meth) acrylate and a diisocyanate compound can also be used. ..
- an alkyl group contained in the above-mentioned 2-hydroxyalkyl (meth) acrylate an ethyl group or an n-propyl group is preferable, and an ethyl group is more preferable.
- diisocyanate compound examples include hexamethylene diisocyanate, 2,4- (or 2,6-) toluene diisocyanate (TDI), 4,4'-diphenylmethane diisocyanate (MDI), and 3,5,5-trimethyl-.
- examples thereof include 3-isocyanatomethylcyclohexylisocyanate (IPDI), m- (or p-) xylenediisocyanate, 1,3- (or 1,4-) bis (isocyanatomethyl) cyclohexane, and lysine diisocyanate.
- These ethylenically unsaturated group-containing isocyanate compounds may be used alone or in combination of two or more.
- the reaction between the ethylenically unsaturated group-containing isocyanate compound and the pyrazole compound can be carried out with or without the presence of a solvent.
- a solvent that is inert to the isocyanato group is used.
- an organometallic salt such as tin, zinc, lead or the like, a tertiary amine or the like may be used as a catalyst.
- reaction product of the ethylenically unsaturated group-containing isocyanate compound and the pyrazole compound include 2-[(3,5-dimethylpyrazolyl) carbonylamino] ethyl methacrylate and 2-[(3-methyl). Pyrazolyl) carbonylamino] ethyl methacrylate and the like.
- a easily available resin composition containing the copolymer (A) has good curability, and by curing the resin composition, a cured product having excellent solvent resistance can be obtained. Therefore, 2-[((A) 3,5-Dimethylpyrazolyl) carbonylamino] ethyl methacrylate is preferred.
- the structural unit (b) having a hydroxy group contained in the copolymer (A) does not have a block isocyanate group but has a hydroxy group.
- the structural unit (b) is a structural unit derived from a monomer (mb) having a hydroxy group (hereinafter, also simply referred to as “monomer (mb)”) (however, in the structural unit (a)). Applicable ones are excluded).
- the hydroxy group of the structural unit (b) contained in the copolymer (A) is a block isocyanate contained in the structural unit (a) by thermally curing the resin composition containing the copolymer (A). The group reacts with the isocyanato group produced by deblocking to form a crosslinked structure.
- the monomer (mb) that gives the structural unit (b) is not particularly limited as long as it does not have a block isocyanato group and has a polymerizable unsaturated bond and a hydroxy group.
- the monomer (mb) include (meth) acrylic acid ester derivatives having a hydroxy group.
- Specific examples of such a monomer (mb) include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, and 2,3-. Examples thereof include dihydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, and 2-hydroxy-3-phenoxypropyl (meth) acrylate.
- These monomers (mb) may be used alone or in combination of two or more.
- the monomer (mb) among the above-mentioned monomers, the reactivity at the time of synthesizing the copolymer (A) and the low-temperature curability of the resin composition containing the copolymer (A) are available.
- hydroxyalkyl (meth) acrylate is preferable.
- examples of hydroxyalkyl (meth) acrylates are 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, and 4-hydroxybutyl (meth) acrylate, which are easily available and have a copolymer (A). ), 2-Hydroxyethyl (meth) acrylate and 4-hydroxybutyl (meth) acrylate are more preferable from the viewpoint of reducing the glass transition temperature.
- the structural unit (c) having an acid group contained in the copolymer (A) does not have a block isocyanato group and a hydroxy group, but has an acid group.
- the structural unit (c) is a structural unit derived from a monomer (mc) having an acid group (hereinafter, also simply referred to as “monomer (mc)”) (however, the structural unit (a) and the constitutional unit (c)). Excluding those corresponding to unit (b)). Since the copolymer (A) contains the structural unit (c), the alkali developability becomes good when the resin composition containing the copolymer (A) is used as a photosensitive material.
- Examples of the acid group contained in the structural unit (c) include a carboxy group, a sulfo group, a phospho group and the like. Among these acid groups, a carboxy group is preferable as the acid group of the structural unit (c) from the viewpoint of easy availability.
- the monomer (mc) that gives the structural unit (c) is not particularly limited as long as it is a monomer that does not have a blocked isocyanato group or a hydroxy group and has a polymerizable unsaturated bond and an acid group.
- Examples of the monomer (mc) include unsaturated carboxylic acid or an anhydride thereof, unsaturated sulfonic acid, unsaturated phosphonic acid and the like.
- the monomer (mc) include (meth) acrylic acid, ⁇ -bromo (meth) acrylic acid, ⁇ -frill (meth) acrylic acid, crotonic acid, propiole acid, and silicic acid.
- Unsaturated carboxylic acids such as ⁇ -cyanosilicate skin acid, maleic acid, maleic anhydride, monomethyl maleate, monoethyl maleate, monoisopropyl maleate, fumaric acid, itaconic acid, itaconic anhydride, citraconic acid, and citraconic anhydride thereof.
- unsaturated sulfonic acid such as 2-acrylamide-2-methylpropanesulfonic acid, tert-butylacrylamide sulfonic acid, p-styrenesulfonic acid
- unsaturated phosphonic acid such as vinylphosphonic acid
- the monomer (mc) among these monomers, an unsaturated carboxylic acid is easily available and the resin composition containing the copolymer (A) has excellent alkaline developability. It is preferable to use, and it is more preferable to use (meth) acrylic acid.
- the ratio of the structural unit (a), the structural unit (b), and the structural unit (c) contained in the copolymer (A) will be described.
- the ratio of the structural unit (a) contained in the copolymer (A) is not particularly limited, but is preferably 1 to 45 mol%, more preferably 5 to 40 mol%, and most preferably 15 to 35 mol%. Is. If necessary, it may be 18 to 33 mol%, 20 to 30 mol%, 25 to 28 mol%, or the like.
- the ratio of the structural unit (b) contained in the copolymer (A) is not particularly limited, but is preferably 1 to 50 mol%, more preferably 5 to 45 mol%, and most preferably 10 to 35 mol%. Is.
- the ratio of the structural unit (c) contained in the copolymer (A) is not particularly limited, but is preferably 1 to 60 mol%, more preferably 5 to 50 mol%, and most preferably 10 to 40 mol%. Is. If necessary, it may be 13 to 35 mol%, 15 to 30 mol%, 20 to 28 mol%, 22 to 25 mol%, or the like.
- the copolymer (A) contains 1 to 45 mol% of the constituent unit (a), 1 to 50 mol% of the constituent unit (b), and 1 to 60 mol% of the constituent unit (c). ..
- the copolymer (A) of the present embodiment when the ratio of the structural unit (a) and the structural unit (b) is 1 mol% or more, the resin composition containing the copolymer (A) is thermally cured. As a result, the hydroxy group of the structural unit (b) and the isocyanate group generated by deblocking the blocked isocyanato group of the structural unit (a) react with each other to sufficiently form a crosslinked structure.
- the resin composition containing the copolymer (A) containing 1 mol% or more of the structural unit (a) and the structural unit (b), respectively, is a cured product having good solvent resistance even when thermally cured at a low temperature. Is obtained.
- the proportion of the structural unit (a) in the copolymer (A) is 45 mol% or less, the storage stability of the resin composition containing the copolymer (A) becomes better. Further, when the ratio of the constituent unit (a) is 45 mol% or less, it becomes easy to secure the contents of the constituent unit (b) and the constituent unit (c). Therefore, the effect of including the constituent unit (b) and the constituent unit (c) can be easily obtained.
- the ratio of the constituent unit (b) in the copolymer (A) is 50 mol% or less, gelation during the polymerization reaction for producing the copolymer (A) can be prevented. Further, the crosslinked structure formed by the reaction between the isocyanato group generated by deblocking the blocked isocyanato group of the structural unit (a) and the structural unit (b) is not excessively generated, and the copolymer (A) is produced. The storage stability of the contained resin composition becomes better. Further, when the ratio of the constituent unit (b) is 50 mol% or less, it becomes easy to secure the contents of the constituent unit (a) and the constituent unit (c). Therefore, it becomes easy to obtain the effect of including the constituent unit (a) and the constituent unit (c).
- the resin composition containing the copolymer (A) has a sufficiently high alkaline development rate. ..
- the ratio of the constituent unit (c) in the copolymer (A) is 60 mol% or less
- the alkaline development speed of the resin composition containing the copolymer (A) is appropriately suppressed, so that it is precise. It becomes easier to form a pattern.
- the ratio of the structural unit (c) in the copolymer (A) is 60 mol% or less, it becomes easy to secure the contents of the structural unit (a) and the structural unit (b). Therefore, even when the resin composition containing the copolymer (A) is cured at a low temperature, it becomes easy to obtain a cured product having better solvent resistance.
- the total amount of the content of the structural unit (a) and the content of the structural unit (b) contained in the copolymer (A) is preferably 10 to 90 mol%, preferably 20 to 80 mol%. It is more preferably present, and even more preferably 30 to 70 mol%. If necessary, it may be 35 to 65 mol%, 40 to 60 mol%, 45 to 55 mol%, or the like.
- the resin composition containing the copolymer (A) has more storage stability. It is possible to obtain a cured product having excellent solvent resistance even when cured at a low temperature. Further, since the content of the structural unit (c) can be easily secured, it becomes easy to obtain a resin composition having better alkaline developability when used as a photosensitive material.
- the resin composition containing the copolymer (A) contains a compound having a hydroxy group as the reactive diluent (C) in addition to the copolymer (A), it is contained in the copolymer (A).
- the total amount of hydroxy groups contained in the structural unit (b) is preferably reduced according to the amount of hydroxy groups contained in the reactive diluent (C). Specifically, the total amount of the blocked isocyanato group contained in the constituent unit (a) and the total amount of the hydroxy groups contained in the resin composition (the hydroxy group possessed by the constituent unit (b) and the reactive diluent (C)).
- the molar ratio with the hydroxy group contained in the above is preferably 10:90 to 90:10, more preferably 30:70 to 70:30, and 40:60 to 60:40. It is more preferable to have.
- the resin composition containing the copolymer (A) is thermally cured to contain the hydroxy group contained in the resin composition and the block isocyanato having the structural unit (a).
- a crosslinked structure is easily generated by the reaction with the isocyanato group generated by the deblocking of the group. Therefore, a cured product having even better solvent resistance can be obtained.
- the copolymer (A) of the present embodiment includes the structural units (a) to (c) as well as other structural units (d) that can be copolymerized with the structural units (a) to (c) (provided that the structural units (a) to (a) to the same. (Excluding those corresponding to (c)) may be contained.
- the monomer (md) that gives the other structural unit (d) does not have a block isocyanato group, a hydroxy group, or an acid group, and is a monomer (hereinafter, also referred to as “monomer (md)”).
- the compound is not particularly limited as long as it is a compound copolymerizable with the mA) to the monomer (mc).
- the monomer (md) that gives the other structural unit (d) include styrene, ⁇ -methylstyrene, o-vinyltoluene, p-vinyltoluene, o-chlorostyrene, m-chlorostyrene, and methoxystyrene. , P-nitrostyrene, p-cyanostyrene, p-acetylaminostyrene and other aromatic vinyl compounds; norbornene (bicyclo [2.2.1] hept-2-ene), 5-methylbicyclo [2.2.1] ] Hept-2-ene, tetracyclo [4.4.0.1 2,5 .
- Cyclic olefins having a norbornene structure such as pentadeca-4-ene; dienes such as butadiene, isoprene and chloroprene; methyl (meth) acrylates, ethyl (meth) acrylates, iso-propyl (meth) acrylates, tert- Butyl (meth) acrylic rate, pentyl (meth) acrylate, benzyl (meth) acrylate, isoamyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, lauryl (meth) acrylate, dodecyl (meth) acrylate, cyclohexyl (meth) acrylate , Methylcyclohexyl (meth) acrylate, rosin (meth) acrylate, norbornyl (meth) acrylate, 5-ethylnorbornyl (meth)
- (meth) acrylic acid ester as the monomer (md), and from the viewpoint of adjusting the glass transition temperature of the copolymer (A) to 30 ° C. or lower, the glass transition of the homopolymer.
- the temperature is preferably ⁇ 20 ° C. or lower, and it is particularly preferable to use 2-ethylhexyl (meth) acrylate or 4-hydroxybutyl acrylate.
- These monomers (md) may be used alone or in combination of two or more.
- the ratio thereof is not particularly limited, but is preferably 1 to 80 mol%, more preferably 5 to 75 mol%. Most preferably, it is 10 to 50 mol%. If necessary, it may be 3 to 45 mol%, 5 to 40 mol%, 10 to 35 mol%, 15 to 30 mol%, or 12 to 25 mol%.
- the copolymer (A) contains the other structural unit (d)
- the properties such as solvent resistance of the cured product of the resin composition containing the copolymer (A) can be appropriately improved.
- the polystyrene-equivalent weight average molecular weight of the copolymer (A) is not particularly limited, but is preferably 1,000 to 50,000, more preferably 3,000 to 40,000. If necessary, it may be 5,000 to 20,000, 7,000 to 15,000, 9,000 to 12,000, or the like.
- the weight average molecular weight of the copolymer (A) is 1,000 or more, the alkali developability when the resin composition containing the copolymer (A) is used as a photosensitive material becomes good, and the pattern is obtained after the alkali development. It becomes difficult for the chip to occur.
- the weight average molecular weight of the copolymer (A) is 50,000 or less, the development time when the resin composition containing the copolymer (A) is used as a photosensitive material becomes appropriate and practical. Is secured.
- the glass transition temperature (Tg) of the copolymer (A) is 30 ° C. or lower, preferably 20 ° C. or lower, and more preferably 0 ° C. or lower. If the glass transition temperature of the copolymer (A) is more than 30 ° C., the curability at a low temperature is adversely affected. Therefore, the glass transition temperature of the copolymer (A) is set to 30 ° C. or lower.
- the glass transition temperature of the copolymer (A) is preferably ⁇ 50 ° C. or higher, more preferably ⁇ 40 ° C. or higher, and even more preferably ⁇ 30 ° C. or higher.
- the glass transition temperature of the copolymer (A) is ⁇ 50 ° C. or higher, the resin composition containing the copolymer (A) can obtain a cured film having excellent heat resistance.
- the glass transition temperature is ⁇ 45 ° C. or higher and 25 ° C. or lower, ⁇ 35 ° C. or higher and 15 ° C. or lower, -25 ° C. or higher and 10 ° C. or lower, or ⁇ 15 ° C. or higher and 5 ° C. or lower. It may be as follows.
- the acid value of the copolymer (A) (JIS K6901 5.3) can be appropriately selected.
- the acid value of the copolymer (A) is preferably 20 to 300 KOH mg / g, more preferably 30 to 200 KOH mg / g when the resin composition containing the copolymer (A) is used as a photosensitive material. g. If necessary, it may be 40 to 150 KOH mg / g, 50 to 100 KOH mg / g, or the like.
- the acid value of the copolymer (A) is 20 KOHmg / g or more, the alkali developability becomes good when the resin composition containing the copolymer (A) is used as a photosensitive material.
- the acid value of the copolymer (A) is 300 KOHmg / g or less
- the resin composition containing the copolymer (A) is used as a photosensitive material
- the exposed portion is exposed portion to the alkaline developer. Since the photocured portion) is difficult to dissolve, the pattern shape becomes good.
- the copolymer (A) contains a blocked isocyanate group blocked by a pyrazole compound in the molecule.
- the equivalent number of the block isocyanate group may be appropriately selected, but is preferably 300 to 6000, and more preferably 500 to 3500. If necessary, it may be 400 to 2000 or 600 to 1000.
- the equivalent number of the block isocyanato group is 300 or more, if a hydroxy group is sufficiently present in the resin composition containing the copolymer (A), the hydroxy group is thermally cured to form a resin composition.
- a crosslinked structure is sufficiently produced by the reaction between the hydroxy group in the substance and the isocyanato group generated by deblocking the blocked isocyanato group having the structural unit (a). Therefore, a cured product having even better solvent resistance can be obtained.
- the equivalent number of blocked isocyanato groups in the copolymer (A) is the mass of the copolymer (A) per mole of the blocked isocyanato groups contained in the copolymer (A).
- the number of equivalents of the blocked isocyanato groups is determined by dividing the mass of the copolymer (A) by the number of moles of the blocked isocyanato groups contained in the copolymer (A) (g / mol).
- the equivalent number of the block isocyanate groups is a theoretical value calculated from the amount of the monomer (ma) charged.
- the copolymer (A) of the present embodiment can be produced, for example, by using a method in which the solvent heating step (I), the dropping polymerization step (II), and the post-polymerization step (III) shown below are performed in this order.
- solvent heating step (I) A solvent (B-1) is prepared, and the temperature of the solvent (B-1) is raised to 60 to 90 ° C. In the solvent heating step (I), the temperature may be raised after the chain transfer agent described later is added to the solvent (B-1).
- the degree of polymerization of the copolymer (A) synthesized in the dropping polymerization step (II) and the post-polymerization step (III) can be controlled by adding the chain transfer agent to the solvent (B-1) and then raising the temperature.
- the concentration of the chain transfer agent in the solvent (B-1) can be, for example, 0.1 to 10% by mass, and is not particularly limited.
- the polymerization initiator solution is added dropwise to the heated solvent (B-1) together with the monomer solution to prepare a mixed solution, and the dropping polymerization is performed.
- the monomer solution includes a monomer having a blocked isocyanato group (ma), a hydroxy group-containing monomer (mb), an acid group-containing monomer (mc), and a monomer (m-) used as needed.
- d) is dissolved in a solvent (B-2).
- the solvent (B-2) those exemplified for the solvent (B-1) can be used in the same manner.
- the polymerization initiator solution is obtained by dissolving the polymerization initiator in a solvent (B-2).
- either one or both of the solvent (B-1) and the solvent (B-2) contains a hydroxy group-containing solvent.
- the chain transfer agent solution described later may be added while dropping instead of the chain transfer agent that can be added in the solvent heating step (I).
- the chain transfer agent solution is a solution of the chain transfer agent in a solvent (B-2). Further, in the solvent heating step (I), a part of the chain transfer agent used for producing the copolymer (A) is put into the solvent (B-1) and then the temperature is raised, and in the subliquid polymerization step (II). A chain transfer agent solution obtained by dissolving a portion of the chain transfer agent to be used in a solvent (B-2) may be added dropwise to the heated solvent (B-1).
- solvent (B-1) The solvent (B-1) used in the solvent heating step (I) may be only a hydroxy group-containing solvent, may be only a hydroxy group-free solvent, or may be a hydroxy group-containing solvent and a hydroxy group. It may contain both of the solvents which do not contain.
- the solvent (B-1) preferably contains a hydroxy group-containing solvent containing a hydroxy group, and more preferably only a hydroxy group-containing solvent.
- hydroxy group-containing solvent examples include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monomethyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, and tri.
- (Poly) alkylene glycol monoalkyl ethers such as propylene glycol monoethyl ether and 3-methoxy-1-butanol; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, methyl 2-hydroxy-2-methylpropionate, 2 Hydroxy group-containing carboxylic acid esters such as ethyl hydroxy-2-methylpropionate, ethyl hydroxyacetate, and methyl 2-hydroxy-3-methylbutyrate; diethylene glycol and the like can be mentioned.
- hydroxy group-containing solvents the effect of preventing gelation of the reaction solution and the effect of controlling the molecular weight of the copolymer (A) within an appropriate range in the dropping polymerization step (II) and / or the post-polymerization step (III). It is preferable to use a primary and / or secondary alcohol solvent and an ether solvent, and it is more preferable to use propylene glycol monomethyl ether, ethylene glycol monomethyl ether, and 3-methoxy-1-butanol. These hydroxy group-containing solvents may be used alone or in combination of two or more.
- hydroxy group-free solvent examples include (poly) alkylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, and propylene glycol monoethyl ether acetate; diethylene glycol.
- Ethers such as dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran; ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; methyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl ethoxyacetate , 3-Methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-butyl acetate, i-propyl acetate, i-butyl acetate, n-amyl acetate, i-amyl acetate , Esters such as n-butyl propionate, ethyl butyrate, n-propyl butyrate, i-propyl butyrate, ethyl pyru
- ether solvent from the viewpoint of availability, cost and quality, and it is more preferable to use propylene glycol monomethyl ether acetate and diethylene glycol methyl ethyl ether.
- propylene glycol monomethyl ether acetate and diethylene glycol methyl ethyl ether.
- These hydroxy group-free solvents may be used alone or in combination of two or more.
- the content ratio of the hydroxy group-containing solvent in the solvent (B-1) is 10 to 100% by mass. Is more preferable, 20 to 90% by mass is more preferable, and 40 to 80% by mass is further preferable.
- the content ratio of the hydroxy group-containing solvent is 10% by mass or more, the isocyanato group and the monomer (mb) derived from the monomer (ma) in the dropping polymerization step (II) and / or the post-polymerization step (III). ) Sufficiently obtains the effect of inhibiting the reaction with the hydroxy group derived from.
- the solvent (B-1) contains a solvent that does not contain a hydroxy group, an isocyanato group derived from the monomer (ma) and a hydroxy group derived from the monomer (mb) when the resin composition is cured.
- the effect of improving the amount of the cross-linking reaction of the above can be obtained.
- solvent and mixed solution temperature In the production method of the present embodiment, in the solvent heating step (I), the solvent (B-1) is put into the reaction vessel and the temperature is raised to 60 to 90 ° C. Further, in the dropping polymerization step (II) and the post-polymerization step (III), the mixed solution is reacted at 60 to 90 ° C. for 1 to 5 hours while stirring.
- the temperature of the solvent (B-1) in the solvent heating step (I) and the temperature of the mixed solution in the dropping polymerization step (II) and the post-polymerization step (III) may be the same or different. good.
- the dropping polymerization is performed.
- the polymerization reaction of the monomers (ma) to (mc) and, if necessary, the monomer (md) used is sufficiently advanced.
- the temperature of the solvent (B-1) in the solvent heating step (I) and the temperature of the mixed solution in the dropping polymerization step (II) and the post-polymerization step (III) are 90 ° C. or lower, the monomer (ma) is used.
- the reaction product of an ethylenically unsaturated group-containing isocyanate compound and a pyrazole compound is used, the following effects can be obtained. That is, in the drop polymerization step (II) and the post-polymerization step (III), it is possible to prevent the pyrazole compound from being dissociated from the blocked isocyanate group to generate an isocyanate group.
- the isocyanate group generated by the deblocking of the blocked isocyanate group reacts with the hydroxy group derived from the monomer (mb) or the acid group derived from the monomer (mc), and is in the process of production. It is possible to prevent the copolymer (A) from gelling. Further, since the temperature is 90 ° C. or lower, in the dropping polymerization step (II) and the post-polymerization step (III), a part of the blocked isocyanato group contained in the monomer (ma) is deblocked to form the isocyanato group. Even if it is produced, the reaction between the isocyanate group and the hydroxy group derived from the monomer (mb) can be suppressed. From these, a copolymer (A) sufficiently containing the structural unit (a) having a block isocyanate group and the structural unit (b) having a hydroxy group can be obtained.
- the polymerization initiator solution and the monomer solution are dropped onto the solvent (B-1) heated to 60 to 90 ° C. in the solvent heating step (I) to polymerize while forming a mixed solution. I do.
- the chain transfer agent solution may be further added dropwise to the heated solvent (B-1) to prepare a mixed solution containing the chain transfer agent.
- the dropping polymerization step (II) it is preferable to simultaneously drop the polymerization initiator solution and the monomer solution into the heated solvent (B-1). In this case, the molecular weight of the copolymer (A) can be controlled accurately, and the copolymer (A) in the process of production can be prevented from gelling.
- the chain transfer agent solution when the chain transfer agent solution is dropped onto the heated solvent (B-1), the chain transfer agent solution may be dropped at the same time as the polymerization initiator solution and the monomer solution, or the polymerization may be carried out. The chain transfer agent solution may be added dropwise before or after the initiator solution and the monomer solution are added dropwise.
- the dropping rate of the polymerization initiator solution, monomer solution, and chain transfer agent solution depends on the reaction scale such as the volume of the reaction vessel, the volume of the heated solvent (B-1) and the polymerization initiator solution, the monomer solution, and the chain transfer agent solution. It can be decided as appropriate.
- the dropping rate of the polymerization initiator solution, the monomer solution, and the chain transfer agent solution is preferably 0.1 to 5 mL / min, for example, when a 1 L reaction vessel is used.
- the dropping time of the polymerization initiator solution, the monomer solution, and the chain transfer agent solution can be, for example, 30 minutes to 1 hour.
- the dropping rate and dropping time of the polymerization initiator solution, the monomer solution, and the chain transfer agent solution may be different from each other, or may be partially or wholly the same.
- the polymerization initiator solution, the monomer solution, and the chain transfer agent solution used as needed are prepared individually.
- the polymerization initiator solution is obtained by dissolving the polymerization initiator in a solvent (B-2).
- the polymerization initiator is not particularly limited, but is, for example, 2,2'-azobis (2,4-dimethylvaleronitrile), azobisisobutyronitrile, azobisisobutyronitrile, benzoyl peroxide, t-butylper. Examples thereof include oxy-2-ethylhexanoate. These polymerization initiators may be used alone or in combination of two or more.
- the concentration of the polymerization initiator in the polymerization initiator solution is preferably a concentration at which a mixed solution having a uniform concentration can be easily obtained, and is, for example, 16 to 50% by mass, and is not particularly limited.
- the amount of the polymerization initiator solution used is such that the polymerization initiator contained in the polymerization initiator solution is the total amount of the monomers charged (that is, the mass of the monomers (ma) to the monomers (md) in the monomer solution).
- the amount is preferably 0.5 to 20 parts by mass, more preferably 1.0 to 10 parts by mass with respect to 100 parts by mass.
- the monomer solution includes a monomer having a blocked isocyanato group (ma), a hydroxy group-containing monomer (mb), an acid group-containing monomer (mc), and a monomer (m-) used as needed.
- d) is dissolved in a solvent (B-2).
- the monomer (ma) to the monomer (md) those exemplified in the item of the copolymer (A) can be used.
- the monomer solution may be produced by a method in which the monomers (ma) to (md) are individually dissolved in a solvent (B-2) and then mixed, or the monomers (ma) to the monomer solution may be produced. (Md) may be mixed and then dissolved in a solvent (B-2).
- the total concentration of the monomers (ma) to (md) in the monomer solution is preferably a concentration at which a mixed solution having a uniform concentration can be easily obtained, and can be, for example, 50 to 95% by mass. However, it is not particularly limited.
- the monomer that is liquid at room temperature may also serve as a solvent in the monomer solution.
- the monomer solution may not contain the solvent (B-2).
- the monomer that is liquid at room temperature include 2-[(3,5-dimethylpyrazolyl) carbonylamino] ethyl methacrylate, which is a monomer (ma) having a blocked isocyanate group.
- the ratio of each of the monomers (ma) to (mc) used in the production of the copolymer (A) is not particularly limited, but the monomer (ma) is 1 to 45 mol% and the monomer (m).
- -B) 1 to 50 mol%, preferably 1 to 60 mol% of the monomer (mc), 5 to 40 mol% of the monomer (ma), 5 to 45 mol% of the monomer (mb), It is more preferably 5 to 50 mol% of the monomer (mc), 15 to 35 mol% of the monomer (ma), 10 to 35 mol% of the monomer (mb), and 10 to 35 mol% of the monomer (mc). It is more preferably 40 mol%.
- the ratio of each of the monomers (ma) to (md) used in the production of the copolymer (A) is not particularly limited.
- the content is 1 to 45 mol% of the monomer (ma), 1 to 50 mol% of the monomer (mb), 1 to 60 mol% of the monomer (mc), and 1 to 80 mol% of the monomer (md). It is preferably 5 to 40 mol% of the monomer (ma), 5 to 45 mol% of the monomer (mb), 5 to 50 mol% of the monomer (mc), and 5 to 75 of the monomer (md).
- the chain transfer agent solution is a solution of the chain transfer agent in a solvent (B-2).
- the chain transfer agent is not particularly limited, but for example, a polyfunctional thiol can be preferably used.
- a polyfunctional thiol is a compound having two or more mercapto groups in the molecule.
- the polyfunctional thiol is not particularly limited, and is, for example, thioglycolic acid, 1,2-ethanedithiol, 1,4-bis (3-mercaptobutyryloxy) butane, tetraethylene glycolbis (3-mercaptopropionate).
- Trimethylolethane (3-mercaptobutyrate), trimethylolpropanetris (3-mercaptobutyrate), trimethylolpropanetris (3-mercaptopropionate), pentaerythritol tetrakis (3-mercaptobutyrate), Pentaerythritol tetrakis (3-mercaptopropionate), 1,3,5-tris (3-mercaptobutyloxyethyl) -1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trion , Tris-[(3-mercaptopropionyloxy) -ethyl] -isocyanurate, dipentaethritol hexakis (3-mercaptopropionate) and the like.
- the chain transfer agents include pentaerythritol tetrakis (3-mercaptobutyrate) and / or thioglycolic acid and pentaerythritol tetrakis (3-mercaptopropio) from the viewpoint of availability, cost and quality. Nate) is preferably used.
- the concentration of the chain transfer agent in the polymerization initiator solution is preferably a concentration at which a mixed solution having a uniform concentration can be easily obtained, and is, for example, 0.1 to 10% by mass, and is not particularly limited.
- the amount of the chain transfer agent used is 100 mass of the total amount of the monomer charged in the chain transfer agent contained in the mixed solution (that is, the mass of the monomer (ma) to the monomer (md) in the monomer solution).
- the amount is preferably 0.5 to 20 parts by mass, and more preferably 1.0 to 10 parts by mass.
- solvent (B-2) As the solvent (B-2) used in the dropping polymerization step (II), the same solvent as the solvent (B-1) used in the solvent heating step (I) can be used. Like the solvent (B-1), the solvent (B-2) may be only a hydroxy group-containing solvent, may be only a hydroxy group-free solvent, or may be a hydroxy group-containing solvent and hydroxy. It may contain both groups-free solvents.
- the solvent (B-2) preferably contains a hydroxy group-containing solvent containing a hydroxy group, and more preferably only a hydroxy group-containing solvent.
- either one or both of the solvent (B-1) and the solvent (B-2) contains a hydroxy group-containing solvent. Therefore, when the solvent (B-1) used in the solvent heating step (I) does not contain a hydroxy group-containing solvent, the solvent (B-2) used in the dropping polymerization step (II) is a hydroxy group-containing solvent. include.
- the content ratio of the hydroxy group-containing solvent contained in the total amount of the solvent (B-1) used in the solvent heating step (I) and the solvent (B-2) used in the dropping polymerization step (II) is 10 to 100. It is preferably by mass, more preferably 20 to 90% by mass, and even more preferably 40 to 80% by mass.
- the content ratio of the hydroxy group-containing solvent is 10% by mass or more, the isocyanato group and the monomer (mb) derived from the monomer (ma) in the dropping polymerization step (II) and / or the post-polymerization step (III). ) Sufficiently obtains the effect of inhibiting the reaction with the hydroxy group derived from.
- the solvent (B-1) and the solvent (B-2) contain a solvent containing no hydroxy group, if the content ratio of the hydroxy group-containing solvent is 90% by mass or less, for example, polymerization initiation is started.
- 2,2'-azobis (2,4-dimethylvaleronitrile) is used as the agent, the polymerization initiator is easily dissolved and the workability is good.
- the solvent (B-1) used in the solvent heating step (I) and / or the solvent (B-2) used in the dropping polymerization step (II) contains a hydroxy group-containing solvent.
- the hydroxy group of the hydroxy group-containing solvent reacts with a part of the isocyanato group generated from the blocked isocyanato group of the monomer (ma). do.
- the isocyanato group derived from the monomer (ma) and the hydroxy group derived from the monomer (mb) are used. Reaction is moderately inhibited. Therefore, in the post-polymerization step (III), it is possible to prevent the copolymer (A) during production from gelling. Further, the storage stability of the resin composition containing the copolymer (A) is improved.
- the reaction in the dropping polymerization step (II) and / or the post-polymerization step (III) is appropriately inhibited to thermally cure the resin composition containing the copolymer (A).
- the copolymer (A) in which the isocyanato group derived from the monomer (ma) and the hydroxy group derived from the monomer (mb) are appropriately left can be obtained. Therefore, by thermally curing the resin composition containing the copolymer (A), a crosslinked structure is sufficiently generated, and a cured product having good solvent resistance can be obtained.
- the amount of the solvent (B-1) used in the solvent heating step (I) and the solvent (B-2) used in the dropping polymerization step (II) is not particularly limited, but the total amount of the monomer charged (that is, the monomer solution).
- the total amount of the solvent (B-1) and the solvent (B-2) is 30 to 1,000 with respect to 100 parts by mass of the monomer (ma) to the monomer (md) in the mixture. It is preferably parts by mass, more preferably 50 to 800 parts by mass.
- the copolymer weight obtained in the post-polymerization step (III) is obtained.
- the viscosity of the reaction solution containing the coalescence (A) becomes appropriate. Further, by setting the total amount of the solvent (B-1) and the solvent (B-2) to 1,000 parts by mass or less, the chain transfer action is performed when the chain transfer agent solution is dropped in the dropping polymerization step (II). It is possible to suppress a decrease in the molecular weight of the copolymer (A) due to the above.
- the mixed solution obtained in the dropping polymerization step (II) is reacted at 60 to 90 ° C. for 1 to 5 hours while stirring.
- the reaction time in the post-polymerization step (III) can be 1 to 5 hours, preferably 1 to 4 hours, and more preferably 2 to 3 hours.
- the copolymer (A) having an appropriate molecular weight can be produced in good yield.
- the copolymer (A) of the present embodiment has a structural unit (a) having a blocked isocyanato group blocked by a pyrazole compound, a structural unit (b) having a hydroxy group, and a structural unit (c) having an acid group. ), And the glass transition temperature is 30 ° C. or lower. Therefore, the resin composition containing the copolymer (A) of the present embodiment has good alkali developability when used as a photosensitive material, has excellent storage stability, and is cured at a low temperature. However, a cured product having excellent solvent resistance can be obtained.
- the solvent (B-1) used in the solvent heating step (I) and / or the solvent (B-2) used in the dropping polymerization step (II) is used. It is a solvent containing a hydroxy group-containing solvent.
- the temperature of the solvent (B-1) is raised to 60 to 90 ° C.
- the post-polymerization step (III) the mixed solution is reacted at 60 to 90 ° C. ..
- the reaction between the isocyanato group derived from the monomer (ma) and the hydroxy group derived from the monomer (mb) is moderately performed. Be hindered.
- the copolymer (A) of the present embodiment sufficiently containing the structural unit (a) having a block isocyanate group and the structural unit (b) having a hydroxy group can be obtained.
- the resin composition of the present embodiment contains the copolymer (A) of the present embodiment and the solvent (B).
- the resin composition of the present embodiment further contains not only the copolymer (A) and the solvent (B), but also the reactive diluent (C) and the photopolymerization initiator (D). May be good.
- Such a resin composition can be preferably used as a photosensitive resin composition.
- the resin composition of the present embodiment may further contain a colorant (E) in addition to the above-mentioned copolymer (A) to the photopolymerization initiator (D).
- Such a resin composition can be preferably used as a material for forming a coloring pattern such as a color filter, a black matrix, and a black column spacer.
- the solvent (B) contains a hydroxy group-containing solvent.
- the solvent (B) may be only a hydroxy group-containing solvent.
- the storage stability is improved.
- the hydroxy group-containing solvent used as the solvent (B) is not particularly limited as long as it is a hydroxy group-containing solvent, and the solvent (B-1) and the solvent (B-) are used in the step of producing the copolymer (A).
- the same as the one that can be used as 2) can be used.
- the content ratio of the hydroxy group-containing solvent in the solvent (B) can be set in the same manner as the content ratio of the hydroxy group-containing solvent in the solvent (B-1) used in the step of producing the copolymer (A).
- the solvent (B) may be the same as or different from the solvent (B-1) and / or the solvent (B-2) used in the step of producing the copolymer (A).
- the resin composition of the present embodiment is, for example, a copolymer (A) isolated from a reaction solution containing the copolymer (A) obtained in the post-polymerization step (III) for producing the copolymer (A). ) And the solvent (B) can be produced by a method of appropriately mixing.
- the reaction solution containing the copolymer (A) obtained when the copolymer (A) is produced may be used as it is. In this case, it is not necessary to isolate the copolymer (A) from the reaction solution.
- the solvent (B-1) and / or the solvent (B-2) used for producing the copolymer (A) is contained in the reaction solution, the solvent (B-1) in the reaction solution is contained.
- / or the solvent (B-2) can be used as it is as the solvent (B). If necessary, the solvent (B) may be added to the reaction solution.
- the blending amounts of the copolymer (A) and the solvent (B) may be appropriately adjusted according to the purpose of use of the resin composition.
- the content of the solvent (B) is 30 parts by mass or more, the viscosity of the resin composition becomes appropriate.
- the content of the solvent (B) is 1,000 parts by mass or less, the viscosity of the resin composition can be controlled in an appropriate range, and the film thickness can be appropriately adjusted.
- the reactive diluent (C) is contained together with the photopolymerization initiator (D), if necessary.
- the reactive diluent (C) is a compound having at least one polymerizable ethylenically unsaturated group as a polymerizable functional group in the molecule.
- the reactive diluent (C) may be a monofunctional monomer or a polyfunctional monomer, and is preferably a polyfunctional monomer having a plurality of polymerizable functional groups.
- Examples of the monofunctional monomer used as the reactive diluent (C) include (meth) acrylamide, methylol (meth) acrylamide, methoxymethyl (meth) acrylamide, ethoxymethyl (meth) acrylamide, propoxymethyl (meth) acrylamide, and butoxymethoxy.
- (Meta) acrylates aromatic vinyl compounds such as styrene, ⁇ -methylstyrene, ⁇ -chloromethylstyrene, vinyltoluene; and carboxylic acid esters such as vinyl acetate and vinyl propionate can be mentioned. These monofunctional monomers may be used alone or in combination of two or more.
- Examples of the polyfunctional monomer used as the reactive diluent (C) include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, tetraethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate, and polypropylene glycol.
- (meth) acrylates such as tri (meth) acrylate of tris (hydroxyethyl) isocyanurate; divinylbenzene, diallylphthalate, diallyl.
- Aromatic vinyl compounds such as benzenephosphonate; dicarboxylic acid esters such as divinyl adipate; triallyl cyanurate, methylenebis (meth) acrylamide, (meth) acrylamide methylene ether, polyhydric alcohols and N-methylol (meth) acrylamide. Examples thereof include the condensate of.
- These polyfunctional monomers may be used alone or in combination of two or more.
- a polyfunctional (meth) acrylate as the reactive diluent (C), and trimethylolpropane tri (meth) acrylate
- the blending amount of each component is the same weight with respect to 100 parts by mass of the total amount of the copolymer (A) and the reactive diluent (C).
- the coalescence (A) is preferably 10 to 90 parts by mass
- the solvent (B) is preferably 30 to 1,000 parts by mass
- the reactive diluent (C) is preferably 10 to 90 parts by mass
- the copolymer (A) is. It is more preferable that the amount is 20 to 80 parts by mass
- the solvent (B) is 50 to 800 parts by mass
- the reactive diluent (C) is 20 to 80 parts by mass
- the copolymer (A) is 30 to 75 parts by mass.
- the solvent (B) is 100 to 700 parts by mass and the reactive diluent (C) is 25 to 70 parts by mass.
- the resin composition has an appropriate viscosity and can be suitably used for various coatings, adhesives, binders for printing inks and the like.
- the photopolymerization initiator (D) is not particularly limited, and is, for example, benzophenones such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin butyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1,1.
- the content thereof is 0.1 to 100 parts by mass with respect to 100 parts by mass of the total amount of the copolymer (A) and the reactive diluent (C). It is preferably 30 parts by mass, more preferably 0.5 to 20 parts by mass, and even more preferably 1 to 15 parts by mass.
- the colorant (E) is contained as needed.
- the colorant (E) is not particularly limited as long as it dissolves or disperses in the solvent (B), and examples thereof include dyes and pigments.
- the colorant (E) may be used alone or in combination of two or more, depending on the color of the cured product of the target resin composition. As the colorant (E), only the dye may be used, only the pigment may be used, or the dye and the pigment may be used in combination.
- an acidic dye having an acidic group such as a carboxylic acid or a sulfonic acid from the viewpoints of solubility in the solvent (B) and an alkaline developing solution, interaction with other components in the resin composition, heat resistance, and the like. It is preferable to use a salt of an acidic dye with a nitrogen compound, a sulfonamide of an acidic dye, or the like.
- dyes examples include acid alizarin violet N; acid black1, 2, 24, 48; acid blue1, 7, 9, 25, 29, 40, 45, 62, 70, 74, 80, 83, 90, 92, 112, 113, 120, 129, 147; acid chrome violet K; acid Fuchsin; acid green 1, 3, 5, 25, 27, 50; acid orange 6, 7, 8, 10, 12, 50, 51, 52, 56, 63, 74, 95; acid red1, 4, 8, 14, 17, 18, 26, 27, 29, 31, 34, 35, 37, 42, 44, 50, 51, 52, 57, 69, 73.
- dyes it is preferable to use azo-based, xanthene-based, anthraquinone-based or phthalocyanine-based acid dyes. These dyes may be used alone or in combination of two or more, depending on the color of the cured product of the target resin composition.
- pigments examples include C.I. I. Pigment Yellow 1, 3, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53, 83, 86, 93, 94, 109, 110, 117, 125, 128, 137, 138, 139, Yellow pigments such as 147, 148, 150, 153, 154, 166, 173, 194, 214; C.I. I. Pigment Orange 13, 31, 36, 38, 40, 42, 43, 51, 55, 59, 61, 64, 65, 71, 73 and other orange pigments; I.
- a known dispersant may be contained in the resin composition from the viewpoint of improving the dispersibility of the pigment.
- the dispersant it is preferable to use a polymer dispersant having excellent dispersion stability over time.
- polymer dispersants include urethane dispersants, polyethyleneimine dispersants, polyoxyethylene alkyl ether dispersants, polyoxyethylene glycol diester dispersants, sorbitan aliphatic ester dispersants, and aliphatic modified esters. Examples include system dispersants.
- EFKA manufactured by EFKA
- Disperbyk-161 manufactured by Big Chemie
- Disparon manufactured by Kusumoto Kasei Co., Ltd.
- SOLPERSE manufactured by Zeneca. You may use what has been done.
- the type and blending amount of the dispersant may be appropriately set according to the type of pigment to be used and the like.
- the content thereof is 3 to 80 parts by mass with respect to 100 parts by mass of the total amount of the copolymer (A) and the reactive diluent (C). Is preferable, 5 to 70 parts by mass is more preferable, and 10 to 60 parts by mass is further preferable.
- the resin composition containing the copolymer (A) of the present embodiment has excellent storage stability, and a cured product having excellent solvent resistance can be obtained even when cured at a low temperature. Therefore, for example, the content of the colorant (E) can be 20 parts by mass or more with respect to 100 parts by mass of the total amount of the copolymer (A) and the reactive diluent (C). By using the resin composition containing 20 parts by mass or more of the colorant (E) as a material of the color filter, the color reproducibility in the image display element provided with the color filter can be enhanced.
- the resin composition of the present embodiment may contain known additives such as a coupling agent, a leveling agent, and a thermal polymerization inhibitor in order to impart predetermined properties.
- additives such as a coupling agent, a leveling agent, and a thermal polymerization inhibitor in order to impart predetermined properties.
- the blending amount of these additives is not particularly limited as long as it does not impair the effects of the present invention.
- the resin composition of the present embodiment contains the copolymer (A) of the present embodiment, the crosslinking reaction proceeds sufficiently even at a low temperature. Therefore, the resin composition of the present embodiment can be cured at a low temperature. Specifically, the resin composition of the present embodiment is preferably cured at a temperature of 150 ° C. or lower, more preferably 120 ° C. or lower, still more preferably 100 ° C. or lower, and most preferably 80 ° C. or lower. Is. When the temperature at which the resin composition is cured is 150 ° C. or lower, the amount of energy required to cure the resin composition is small.
- the resin composition contains a colorant (E) having inferior heat resistance
- deterioration of the colorant (E) due to heat curing can be suppressed, and a cured product exhibiting the original characteristics of the colorant (E) can be obtained. Easy to get rid of. Therefore, as the colorant (E), those made of various materials can be used.
- a cured product is formed by a method of applying a resin composition on a substrate and thermally curing the substrate, the cured product can be formed even if the substrate is made of a material having inferior heat resistance. Therefore, as the substrate, for example, a substrate made of various materials such as a resin for a flexible display can be used.
- the resin composition of the present embodiment is preferably cured at a temperature of 50 ° C. or higher, more preferably 60 ° C. or higher, and even more preferably 70 ° C. or higher.
- the temperature at which the resin composition is cured is 50 ° C. or higher, a sufficiently crosslinked structure is sufficiently formed in a short time, and a cured product having good solvent resistance can be efficiently formed.
- the heating time (curing time) for curing the resin composition of the present embodiment can be appropriately determined according to the size, thickness, curing temperature, etc. of the cured product, and is, for example, 10 minutes to 4 hours. It can be done, preferably 20 minutes to 2 hours.
- the resin composition of the present embodiment can be produced by a method of mixing the above components using a known mixing device.
- the solvent contained in each component used as a raw material in producing the resin composition of the present embodiment can be used as the solvent (B).
- the resin composition of the present embodiment contains components other than the copolymer (A) and the solvent (B), for example, in the resin composition containing the copolymer (A) and the solvent (B) prepared in advance. , The reactive diluent (C), the photopolymerization initiator (D), and the colorant (E) may be added and mixed.
- the resin composition of the present embodiment contains the copolymer (A) of the present embodiment, a cured product having excellent storage stability and excellent solvent resistance even when cured at a low temperature can be obtained. .. Therefore, the resin composition of the present embodiment is, for example, a color filter, a black matrix, a color filter protective film, a photo spacer, a protrusion for liquid crystal alignment, a microlens, an insulating film for a touch panel, and an adhesive for electronic materials around a flexible printed wiring board. It can be preferably used as a material for agents, adhesive sheets and the like.
- the resin composition of the present embodiment contains the copolymer (A) of the present embodiment, the solvent (B), the reactive diluent (C), and the photopolymerization initiator (D), it is alkaline. It can be preferably used as a photosensitive material having good developability. In particular, for organic electroluminescence (EL) displays (for black Pixel Defining Layer (PDL)), liquid crystal displays, charge-coupled devices (CCD), and solid-state imaging devices using complementary metal oxide semiconductor (CMOS) elements. It is suitable as a resist used for a built-in color filter.
- EL organic electroluminescence
- LCD liquid crystal displays
- CCD charge-coupled devices
- CMOS complementary metal oxide semiconductor
- the resin composition of the present embodiment contains the copolymer (A) of the present embodiment, the solvent (B), the reactive diluent (C), the photopolymerization initiator (D), and the colorant (
- E) When E is contained, a colored pattern made of a cured product having excellent solvent resistance can be formed at a low temperature. Therefore, deterioration of the colorant (E) due to heat curing is suppressed, and a coloring pattern in which the original characteristics of the colorant (E) are exhibited can be formed. Therefore, the above resin composition can be preferably used as a photosensitive material for a color filter.
- the color filter of the present embodiment includes a substrate, a plurality of pixels composed of three coloring patterns of a red (R) pattern, a green (G) pattern, and a blue (B) pattern formed on the substrate, and each coloring pattern. It has a black matrix formed at the boundary and a protective film formed on the pixels and the black matrix.
- a known substrate can be adopted, and for example, a glass substrate, a silicon substrate, a polycarbonate substrate, a polyester substrate, a polyamide substrate, a polyamide-imide substrate, a polyimide substrate, an aluminum substrate, a printed wiring board, an array substrate, or the like is used. be able to.
- an organic substrate such as a polycarbonate substrate, a polyester substrate, a polyamide substrate, a polyamide-imide substrate, or a polyimide substrate having a relatively low heat resistant temperature can be used, which is suitable as a flexible substrate. ..
- the black matrix and the three coloring patterns forming each pixel are the copolymer (A) of the present embodiment, the solvent (B), and the reactive diluent (C).
- a coloring pattern comprising a cured product of the resin composition of the present embodiment containing a photopolymerization initiator (D) and a coloring agent (E).
- the protective film is not particularly limited, and a known one can be used.
- a coloring pattern to be a black matrix and three coloring patterns forming each pixel are formed on a substrate.
- a coloring pattern that becomes a black matrix is formed on the substrate, and then a red pattern, a green pattern, and a blue pattern that form each pixel are formed within the range partitioned by the black matrix.
- the order in which the red pattern, the green pattern, and the blue pattern are formed is not particularly limited.
- Each coloring pattern can be formed by a photolithography method using the resin composition of the present embodiment.
- the resin composition of the present embodiment is applied onto the substrate to form a coating film.
- the coating film is exposed through a photomask having a predetermined pattern shape, and the exposed portion is photocured.
- the unexposed portion of the coating film is alkaline-developed with an alkaline aqueous solution and removed.
- the exposed portion of the coating film is heated and cured.
- the method of applying the resin composition for forming the coloring pattern is not particularly limited, and for example, a screen printing method, a roll coating method, a curtain coating method, a spray coating method, a spin coating method, or the like is used. Can be done.
- the solvent (B) contained in the coating film is volatilized by heating the coating film using a heating means such as a circulating oven, an infrared heater, or a hot plate, if necessary. May be removed.
- the heating for removing the solvent (B) in the coating film can be performed at a temperature of, for example, 50 ° C to 120 ° C. Further, heating for removing the solvent (B) in the coating film can be performed, for example, for 30 seconds to 30 minutes.
- the heating temperature and heating time for removing the solvent (B) in the coating film can be appropriately set according to the composition of the resin composition, the thickness of the coating film, and the like.
- a known negative type mask can be used as the photomask.
- active energy rays such as ultraviolet rays and excimer laser light.
- the light source used for the exposure is not particularly limited, and for example, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, a xenon lamp, a metal halide lamp, or the like can be used.
- the energy dose to be applied to the coating film can be appropriately selected depending on the thickness of the coating film, the composition of the resin composition, and the like, and can be, for example, 30 to 2000 mJ / cm 2 .
- the alkaline aqueous solution used for alkaline development is not particularly limited, and is, for example, an aqueous solution of sodium carbonate, potassium carbonate, calcium carbonate, sodium hydroxide, potassium hydroxide and the like; amine-based compounds such as ethylamine, diethylamine and dimethylethanolamine.
- An aqueous solution of a p-phenylenediamine-based compound or the like can be used, and can be appropriately selected depending on the composition of the resin composition and the like. Antifoaming agents and surfactants may be added to these alkaline aqueous solutions, if necessary. Further, in the present embodiment, it is preferable to wash the substrate with water after alkaline development with an alkaline aqueous solution and before baking to remove the alkaline aqueous solution and dry the substrate.
- the temperature at which the exposed portion of the coating film is heated and cured by baking can be appropriately selected according to the thickness of the coating film, the composition of the resin composition, and the like.
- the coating film is formed by using the resin composition containing the copolymer (A) of the present embodiment, the exposed portion of the coating film can be cured even at a low temperature.
- the temperature for heating the exposed portion of the coating film can be, for example, 210 ° C or lower, 150 ° C or lower, 120 ° C or lower, 100 ° C or lower, or even 80 ° C or lower, if necessary. ..
- a material having low heat resistance such as a substrate having low heat resistance can be used as the material for the color filter.
- the temperature for heating the exposed portion of the coating film is 150 ° C. or lower, the amount of energy required to cure the coating film is small, which is preferable. Further, when the temperature at which the exposed portion of the coating film is heated is set to 150 ° C.
- the coloring pattern containing the coloring agent (E) having inferior heat resistance which has been difficult to use as a material for the coloring pattern in the past, is deteriorated by the coloring agent (E). Can be formed while suppressing.
- the temperature for heating the exposed portion of the coating film is set to 150 ° C. or lower, a coloring pattern can be formed on a substrate having poor heat resistance, which has been difficult to use as a substrate for a conventional color filter.
- the temperature for heating the exposed portion of the coating film is preferably 50 ° C. or higher, more preferably 60 ° C. or higher, and even more preferably 70 ° C. or higher.
- the temperature at which the exposed portion of the coating film is heated is 50 ° C. or higher, the copolymer (A) and the reactive diluent (C) are sufficiently crosslinked, so that the solvent resistance of the coloring pattern becomes good, which is good. A pattern shape is obtained.
- the temperature for heating the exposed portion of the coating film is 50 ° C. or higher, the exposed portion of the coating film can be heated in a short time, and a colored pattern can be efficiently produced.
- the time for heating the exposed portion of the coating film can be appropriately selected depending on the temperature for heating the exposed portion of the coating film, the thickness of the coating film, the composition of the resin composition, and the like, for example, 10 minutes to 4 hours. It can be done, preferably 20 minutes to 2 hours.
- a protective film is formed by a known method on a coloring pattern that becomes a black matrix and three coloring patterns that form each pixel.
- the three coloring patterns and the black matrix forming each pixel are composed of the copolymer (A), the solvent (B), and the reactive diluent (C) of the present embodiment.
- a coloring pattern comprising a cured product of the resin composition of the present embodiment containing a photopolymerization initiator (D) and a coloring agent (E).
- the resin composition of the present embodiment has good alkali developability, and a cured product having excellent solvent resistance can be obtained even when cured at a low temperature. Therefore, in the color filter of the present embodiment, the pixels and the black matrix can be formed by using the method of curing the resin composition at a low temperature, and the selection of materials that can be used for the color filter can be increased.
- the color filter of the present embodiment may have, for example, a pixel and / or a black matrix containing a colorant (E) having a poor heat resistance and having a good pattern shape. Further, by forming the pixels and the black matrix by using a method of curing the resin composition at a low temperature, a color filter having a substrate made of a material having inferior heat resistance can be obtained.
- the temperature at which the exposed portion of the coating film is heated and cured is less than 210 ° C.
- the solvent resistance of the colored pattern, which is a cured product, is insufficient. Therefore, when the coloring pattern is formed using the conventional resin composition, the temperature for heating the exposed portion of the coating film cannot be set to 210 ° C. or lower. Therefore, in the conventional technique, it is difficult to use the colorant (E) having inferior heat resistance as the material of the coloration pattern. Further, it is difficult to use a substrate having inferior heat resistance as the substrate of the color filter.
- the coloring pattern is the copolymer (A) of the present embodiment, the solvent (B), the reactive diluent (C), the photopolymerization initiator (D), and the coloring.
- the case of having a pixel made of a cured product of the resin composition containing the agent (E) and a black matrix has been described as an example, instead of the photopolymerization initiator (D), a curing accelerator and a known epoxy have been described.
- a resin composition containing a resin may be used.
- the coloring pattern can be formed by the method shown below.
- the resin composition is applied onto the substrate by an inkjet method to form a coating film having a predetermined pattern shape.
- the coating film is heated and cured.
- a resin composition containing a curing accelerator and a known epoxy resin instead of the photopolymerization initiator (D) can also be cured at a low temperature to obtain a cured product having excellent solvent resistance. Therefore, even in this case, the pixels and the black matrix can be formed by using the method of curing the resin composition at a low temperature, and the choice of materials that can be used for the color filter can be increased.
- the image display element of this embodiment for example, a first substrate having a color filter and a first electrode formed on the surface and a second substrate having a second electrode formed on the surface thereof can be used. Examples thereof include a device in which a first electrode and a second electrode are arranged so as to face each other via a spacer, and a liquid crystal composition is sandwiched between the first substrate and the second substrate.
- the liquid crystal display element of the present embodiment includes the color filter of the present embodiment as the color filter.
- known members other than the color filter can be used.
- the liquid crystal display element of the present embodiment can be manufactured, for example, by using the manufacturing method shown below. First, a color filter and a first electrode are formed on the first substrate in this order.
- the color filter can be formed by using the manufacturing method described above.
- the first electrode can be formed by using a known method.
- the second electrode and the spacer are formed on the second substrate by a known method. After that, the first substrate and the second substrate are arranged and bonded with the first electrode and the second electrode facing each other, and the liquid crystal composition is injected and sealed between the first substrate and the second substrate.
- the liquid crystal display element of the present embodiment can be obtained.
- the liquid crystal display element of the present embodiment includes the color filter of the present embodiment, the pixels of the color filter and the black matrix can be formed by using a method of curing the resin composition at a low temperature. Therefore, as a material that can be used for the liquid crystal display element, it is possible to use a material having inferior heat resistance, and it is possible to increase the choices of usable materials.
- a liquid crystal display element has been described as an example of the image display element of the present embodiment, but the image display element of the present embodiment may include the color filter of the present embodiment. It is not limited to the liquid crystal display element.
- the image display element of the present embodiment may be, for example, an organic EL display element, a solid-state image pickup device using a CCD element / CMOS element.
- the polymerization initiator solution and the monomer solution were simultaneously added dropwise using a dropping funnel into the flask containing the solvent heated to 78 ° C.
- the drop polymerization was carried out to prepare a mixed solution (drop polymerization step (II)).
- the dropping rate was 1.7 ml / min for both the polymerization initiator solution and the monomer solution.
- the mixed solution was reacted at 78 ° C. for 3 hours while stirring to form the copolymer (A) (post-polymerization step (III)).
- Propylene glycol monomethyl ether as the solvent (B) was added to the reaction solution containing the copolymer (A) thus obtained so that the content other than the solvent was 35% by mass, and the weight of Synthesis Example 1 was increased. A coalesced composition was obtained.
- (ma) represents a monomer having a blocked isocyanate group.
- (Mb) represents a hydroxy group-containing monomer.
- (Mc) indicates an acid group-containing monomer.
- (D) indicates other monomers that do not correspond to (ma), (mb), and (mc).
- (equivalent number of block isocyanate groups) indicates the number of equivalents of block isocyanate groups contained in the molecule of the copolymer (A).
- MOI-BP Karenz (registered trademark) MOI-BP (2-[(3,5-dimethylpyrazolyl) carbonylamino] ethyl methacrylate, manufactured by Showa Denko KK)
- MOI-BM Karenz (registered trademark) MOI-BM (2-"0- (1'-methylpropanolamino) carboxyamino] ethylmethacrylate, manufactured by Showa Denko KK) ⁇ 4-Hydroxybutyl acrylate (manufactured by Mitsubishi Chemical Corporation) ⁇ 2-Hydroxyethyl methacrylate (manufactured by Kyoeisha Chemical Co., Ltd.) ⁇ Methacrylic acid (manufactured by Kuraray) ⁇ Acrylic acid (manufactured by Toagosei Co., Ltd.)
- ⁇ Weight average molecular weight (Mw)> The weight average molecular weight (Mw) of each of the copolymers (A) contained in the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 was measured.
- the weight average molecular weight is a standard polystyrene-equivalent weight average molecular weight measured under the following conditions using gel permeation chromatography (GPC).
- Tg Glass transition temperature
- the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 were applied to a glass substrate and dried at 50 ° C. under reduced pressure for 24 hours. Then, it was redissolved in acetone and dried again at 50 ° C. under reduced pressure for 24 hours.
- Regarding the solid content of the copolymer solution from which the volatile components have been removed in this manner using DSC (differential scanning calorimetry, measuring instrument: Seiko DSC6200), JIS- at a temperature rise rate of 10 ° C./min under a nitrogen stream. Measured according to K7121 (midpoint glass transition point). The obtained result was taken as the glass transition temperature (Tg) of the copolymer (A).
- the viscosity increase rate of the viscosity after standing for 3 months with respect to the viscosity before standing in the incubator ⁇ (1- (Viscosity after standing for 3 months / Viscosity before standing) Viscosity)) ⁇ 100 (%) ⁇ was calculated and evaluated according to the criteria shown below.
- the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Example 3 were all evaluated for storage stability as ⁇ (excellent) or ⁇ (good), and were excellent in storage. It was confirmed that it had stability.
- the polymer compositions of Comparative Synthesis Examples 1 and 2 had an evaluation of storage stability of ⁇ (inferior) and were not cured by storage, but the results of Examples were obtained. The viscosity was higher than that of the above, and the storage stability was insufficient.
- the acid values of the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 were measured and used as the acid value of the copolymer (A).
- the copolymer (A) shown in Table 3 does not include the amount of the solvent contained in the reaction solution used for producing the copolymer (A).
- the amount of the solvent (B) shown in Table 3 is the sum of the solvent contained in the polymer composition (propylene glycol monomethyl ether) and the solvent added during the production of the resin composition (propylene glycol monomethyl ether acetate). Is.
- the content ratio of the hydroxy group-containing solvent in the solvent (B) shown in Table 3 is 79.1% by mass.
- the resin compositions of Examples 1 to 6 and Comparative Examples 1 to 3 were evaluated for alkali developability and solvent resistance by the methods shown below.
- (1) Alkaline Developability The resin compositions of Examples and Comparative Examples are placed on a square glass substrate (non-alkali glass substrate) having a length of 5 cm and a width of 5 cm, respectively, and have a thickness of 2.5 ⁇ m after exposure.
- the coating film was formed by spin coating as described above. Then, the solvent in the coating film was volatilized and removed by heating at 100 ° C. for 3 minutes.
- a photomask having a predetermined pattern is placed at a distance of 100 ⁇ m from the coating film, and the coating film is exposed to ultraviolet rays having a wavelength of 365 nm at an energy dose of 40 mJ / cm 2 through the photomask to expose the exposed portion. It was photocured. Next, an aqueous solution containing 0.1% by mass of sodium carbonate was sprayed at a temperature of 23 ° C. and a pressure of 0.3 MPa to dissolve and develop the unexposed portion. Then, it was baked at 100 ° C. for 20 minutes to form a predetermined pattern.
- the coating film was exposed to ultraviolet rays having a wavelength of 365 nm at an energy dose of 40 mJ / cm 2 , and the exposed portion was photocured. Then, the coating film was cured by baking at 80 ° C. for 30 minutes or at 100 ° C. for 20 minutes to obtain a cured film.
- the prepared cured membrane was immersed in 20 g of propylene glycol monomethyl ether at 23 ° C. for 15 minutes.
- the color change ( ⁇ Eab) before and after immersion of the cured film was measured with a spectrophotometer UV-1650PC (manufactured by Shimadzu Corporation), and the solvent resistance was evaluated based on the results. The results are shown in Table 4. The smaller the value, the better the color change before and after immersion.
- the cured films obtained by curing the resin compositions of Examples 1 to 6 had a good evaluation of alkali developability. Further, in the cured film obtained by curing the resin compositions of Examples 1 to 6, the temperature for curing the coating film was 80 ° C. and the time was 30 minutes, and the temperature was 100 ° C. and the time was 20 minutes. In all of these cases, ⁇ Eab was less than 2, and the solvent resistance was good.
- the cured film obtained by curing the resin compositions of Comparative Examples 1 to 3 had a good evaluation of alkali developability.
- the cured film obtained by curing the resin compositions of Comparative Examples 1 and 2 has a ⁇ Eab of 2 or more when the temperature at which the coating film is cured is 80 ° C. and the time is 30 minutes, and the solvent resistance is high. It was inadequate. Further, in the cured film obtained by curing the resin composition of Comparative Example 3, even when the temperature for curing the coating film is 80 ° C. and the time is 30 minutes, the temperature is 100 ° C. and the time is 20 minutes. However, ⁇ Eab was 2 or more, and the solvent resistance was insufficient.
- a resin composition capable of obtaining a cured product having good alkali developability when used as a photosensitive material, excellent storage stability, and excellent solvent resistance even when cured at a low temperature.
- a product, a copolymer useful for preparing the resin composition, and a method for producing the copolymer are provided.
- an image display element including the color filter thereof.
- the resin composition of the present invention can be preferably used in a wide range of applications as a material such as a transparent film, a protective film, an insulating film, an overcoat, a photo spacer, a black matrix, a black column spacer, and a resist for a color filter.
Abstract
Description
本願は、2020年12月24日に、日本に出願された特願2020-215474号に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to a copolymer, a resin composition, a color filter, an image display element, and a method for producing a copolymer.
This application claims priority based on Japanese Patent Application No. 2020-215474 filed in Japan on December 24, 2020, the contents of which are incorporated herein by reference.
例えば、カラーフィルターは、従来、基板上で樹脂組成物を210~230℃の温度で熱硬化させて形成していた。しかし、樹脂からなるフレキシブル基板上にカラーフィルターを形成する場合には、基板の耐熱性が劣るため、樹脂組成物を80~150℃の温度で熱硬化させて形成することが要求されている。 In recent years, with the flexibility and wearability of displays, the switch from glass to organic materials such as resin has been promoted in the substrate material. Organic materials are inferior in heat resistance to glass. Therefore, in a member formed by thermosetting a resin composition on a substrate, it is desired to lower the temperature at which the resin composition is thermoset according to the heat resistance of the substrate made of an organic material.
For example, a color filter has conventionally been formed by thermally curing a resin composition on a substrate at a temperature of 210 to 230 ° C. However, when a color filter is formed on a flexible substrate made of a resin, the heat resistance of the substrate is inferior, so that it is required to thermally cure the resin composition at a temperature of 80 to 150 ° C.
特許文献1には、(a)メタノール中での365nmの吸光係数が1.0×103mL/gcm以上である重合開始剤、(b)メタノール中での365nmの吸光係数が1.0×102mL/gcm以下であり、254nmの吸光係数が1.0×103mL/gcm以上である重合開始剤、(c)不飽和二重結合を有する化合物、(d)アルカリ可溶性樹脂、(e)色材を含有する感光性着色組成物が開示されている。
特許文献2には、フリル基を含む化合物(A)、光重合性官能基を含む化合物(B)、光重合開始剤(C)、および着色剤を含有する、カラーフィルター用感光性組成物が開示されている。 Conventionally, as a resin composition used as a material of a color filter, there are those described in Patent Document 1 and Patent Document 2, for example.
Patent Document 1 describes (a) a polymerization initiator having an extinction coefficient of 365 nm in methanol of 1.0 × 10 3 mL / gcm or more, and (b) an extinction coefficient of 365 nm in methanol of 1.0 ×. A polymerization initiator having an extinction coefficient of 102 mL / g cm or less and an extinction coefficient of 254 nm of 1.0 × 10 3 mL / g cm or more, (c) a compound having an unsaturated double bond, (d) an alkali-soluble resin, ( e) A photosensitive coloring composition containing a coloring material is disclosed.
Patent Document 2 describes a photosensitive composition for a color filter containing a compound (A) containing a frill group, a compound (B) containing a photopolymerizable functional group, a photopolymerization initiator (C), and a colorant. It has been disclosed.
本発明は、上記事情に鑑みてなされたものであり、感光性材料として使用する場合の現像性が良好で、保存安定性に優れ、低温で硬化させた場合であっても耐溶剤性に優れた硬化物が得られる樹脂組成物、この樹脂組成物の調製に有用な共重合体、及び共重合体の製造方法を提供することを目的とする。
また、本発明は、現像性が良好であり、低温で硬化させても耐溶剤性に優れた硬化物が得られる樹脂組成物の硬化物からなる着色パターンを有するカラーフィルター、及びそのカラーフィルターを具備する画像表示素子を提供することを目的とする。 However, the conventional resin composition has good developability and storage stability when used as a photosensitive material, and does not provide a cured product having excellent solvent resistance when cured at a low temperature. rice field.
The present invention has been made in view of the above circumstances, has good developability when used as a photosensitive material, has excellent storage stability, and has excellent solvent resistance even when cured at a low temperature. It is an object of the present invention to provide a resin composition for obtaining a cured product, a copolymer useful for preparing the resin composition, and a method for producing the copolymer.
Further, the present invention provides a color filter having a coloring pattern made of a cured product of a resin composition, which has good developability and a cured product having excellent solvent resistance even when cured at a low temperature, and a color filter thereof. It is an object of the present invention to provide an image display element provided.
本発明の第一の態様は、以下の共重合体を提供する。[1] ピラゾール化合物でブロックされたブロックイソシアナト基を有する構成単位(a)と、
ヒドロキシ基を有する構成単位(b)と、
酸基を有する構成単位(c)とを含有し、
ガラス転移温度が30℃以下であることを特徴とする共重合体。
The first aspect of the present invention provides the following copolymers. [1] A structural unit (a) having a blocked isocyanate group blocked with a pyrazole compound, and
The structural unit (b) having a hydroxy group and
Containing a structural unit (c) having an acid group,
A copolymer characterized by having a glass transition temperature of 30 ° C. or lower.
[3] 前記構成単位(c)が、不飽和カルボン酸に由来する構成単位である、[1]または[2]に記載の共重合体。
[4] 前記構成単位(a)が、前記ブロックイソシアナト基と、(メタ)アクリロイルオキシ基とを有する化合物に由来する構成単位である、[1]~[3]のいずれかに記載の共重合体。 The copolymer of the first aspect of the present invention preferably has the characteristics described in the following [2] to [6]. It is also preferable to arbitrarily combine two or more of the features described in the following [2] to [6]. [2] The copolymer according to [1], wherein the structural unit (b) is a structural unit derived from hydroxyalkyl (meth) acrylate.
[3] The copolymer according to [1] or [2], wherein the structural unit (c) is a structural unit derived from an unsaturated carboxylic acid.
[4] The copolymer according to any one of [1] to [3], wherein the structural unit (a) is a structural unit derived from a compound having the block isocyanate group and the (meth) acryloyloxy group. Polymer.
[6] 重量平均分子量が1000~50000である、[1]~[5]のいずれかに記載の共重合体。 [5] [1] to [4] contain the structural unit (a) in an amount of 1 to 45 mol%, the structural unit (b) in an amount of 1 to 50 mol%, and the structural unit (c) in an amount of 1 to 60 mol%. ] The copolymer according to any one of.
[6] The copolymer according to any one of [1] to [5], which has a weight average molecular weight of 1000 to 50,000.
[7] [1]~[6]のいずれかに記載の共重合体(A)と、溶剤(B)とを含有し、前記溶剤(B)が、ヒドロキシ基含有溶剤を含むことを特徴とする樹脂組成物。
本発明の第二の態様は、以下の[8]~[10]の特徴を有することが好ましい。これら特徴は組み合わせて使用されることも好ましい。
[8] 反応性希釈剤(C)および光重合開始剤(D)をさらに含有する、[7]に記載の樹脂組成物。
[9] 着色剤(E)をさらに含有する、[8]に記載の樹脂組成物。 A second aspect of the present invention provides the following resin composition.
[7] The copolymer (A) according to any one of [1] to [6] and the solvent (B) are contained, and the solvent (B) contains a hydroxy group-containing solvent. Resin composition to be used.
The second aspect of the present invention preferably has the following features [8] to [10]. It is also preferable that these features are used in combination.
[8] The resin composition according to [7], which further contains a reactive diluent (C) and a photopolymerization initiator (D).
[9] The resin composition according to [8], further containing the colorant (E).
前記共重合体(A)が10~90質量部、
前記溶剤(B)が30~1000質量部、
前記反応性希釈剤(C)が10~90質量部、
前記光重合開始剤(D)が0.1~30質量部、
前記着色剤(E)が3~80質量部含有される、[9]に記載の樹脂組成物。 [10] With respect to 100 parts by mass of the total amount of the copolymer (A) and the reactive diluent (C).
The copolymer (A) is 10 to 90 parts by mass,
30 to 1000 parts by mass of the solvent (B),
10 to 90 parts by mass of the reactive diluent (C),
0.1 to 30 parts by mass of the photopolymerization initiator (D),
The resin composition according to [9], which contains 3 to 80 parts by mass of the colorant (E).
[11] [9]または[10]に記載の樹脂組成物の硬化物からなる着色パターンを有することを特徴とするカラーフィルター。
本発明の第四の態様は、以下の画像表示素子を提供する。
[12] [11]に記載のカラーフィルターを具備することを特徴とする画像表示素子。 A third aspect of the present invention provides the following color filters.
[11] A color filter having a coloring pattern made of a cured product of the resin composition according to [9] or [10].
A fourth aspect of the present invention provides the following image display element.
[12] An image display element comprising the color filter according to [11].
[13] 溶剤(B-1)を60~90℃に昇温する溶剤加熱工程(I)と、
ピラゾール化合物でブロックされたブロックイソシアナト基を有するモノマー(m-a)と、ヒドロキシ基含有モノマー(m-b)と、酸基含有モノマー(m-c)とを、昇温した前記溶剤(B-1)に滴下するとともに、
重合開始剤を溶剤(B-2)に溶解させた重合開始剤溶液を、前記溶剤(B-1)に滴下して混合溶液とする滴下重合工程(II)と、
前記混合溶液を攪拌しながら、60~90℃で1~5時間反応させる後重合工程(III)とを有し、
前記溶剤(B-1)と前記溶剤(B-2)のいずれか一方または両方が、ヒドロキシ基含有溶剤を含有することを特徴とする共重合体の製造方法。 A fifth aspect of the present invention provides the following method for producing a copolymer.
[13] The solvent heating step (I) for raising the temperature of the solvent (B-1) to 60 to 90 ° C.
The solvent (B) in which the temperature of the monomer (ma) having a blocked isocyanato group blocked by the pyrazole compound, the hydroxy group-containing monomer (mb), and the acid group-containing monomer (mc) was heated. In addition to dropping in -1)
A dropping polymerization step (II) in which a polymerization initiator solution in which a polymerization initiator is dissolved in a solvent (B-2) is added dropwise to the solvent (B-1) to form a mixed solution.
It has a post-polymerization step (III) in which the mixed solution is reacted at 60 to 90 ° C. for 1 to 5 hours while stirring.
A method for producing a copolymer, wherein one or both of the solvent (B-1) and the solvent (B-2) contains a hydroxy group-containing solvent.
[14] 前記溶剤加熱工程(I)において、前記溶剤(B-1)に連鎖移動剤を入れてから昇温する、[13]に記載の共重合体の製造方法。
[15] 前記後重合工程(III)により、ピラゾール化合物でブロックされたブロックイソシアナト基を有する構成単位(a)と、ヒドロキシ基を有する構成単位(b)と、酸基を有する構成単位(c)とを含有し、ガラス転移温度が30℃以下である共重合体が得られる、[13]に記載の共重合体の製造方法。 It is also preferable that the fifth aspect of the present invention has the following features [14] and [15].
[14] The method for producing a copolymer according to [13], wherein in the solvent heating step (I), a chain transfer agent is added to the solvent (B-1) and then the temperature is raised.
[15] The structural unit (a) having a blocked isocyanato group blocked by the pyrazole compound, the structural unit (b) having a hydroxy group, and the structural unit (c) having an acid group by the post-polymerization step (III). The method for producing a copolymer according to [13], wherein a copolymer containing (1) and having a glass transition temperature of 30 ° C. or lower can be obtained.
また、本発明によれば、アルカリ現像性が良好であり、低温で硬化させても耐溶剤性に優れた硬化物が得られる樹脂組成物の硬化物からなる着色パターンを有するカラーフィルター、及びそのカラーフィルターを具備する画像表示素子を提供できる。 According to the present invention, a resin composition capable of obtaining a cured product having good alkali developability when used as a photosensitive material, excellent storage stability, and excellent solvent resistance even when cured at a low temperature. A product, a copolymer useful for preparing the resin composition, and a method for producing the copolymer can be provided.
Further, according to the present invention, a color filter having a coloring pattern made of a cured product of a resin composition having good alkali developability and a cured product having excellent solvent resistance even when cured at a low temperature, and a color filter thereof. An image display element provided with a color filter can be provided.
本実施形態の共重合体(A)は、ピラゾール化合物でブロックされたブロックイソシアナト基を有する構成単位(a)(以下、単に「構成単位(a)」とも言う。)と、ヒドロキシ基を有する構成単位(b)(以下、単に「構成単位(b)」とも言う。)と、酸基を有する構成単位(c)(以下、単に「構成単位(c)」とも言う。)とを含有する。 <Copolymer (A)>
The copolymer (A) of the present embodiment has a structural unit (a) having a blocked isocyanato group blocked with a pyrazole compound (hereinafter, also simply referred to as “constituent unit (a)”) and a hydroxy group. It contains a structural unit (b) (hereinafter, also simply referred to as “constituent unit (b)”) and a structural unit (c) having an acid group (hereinafter, also simply referred to as “constituent unit (c)”). ..
構成単位(a)は、ピラゾール化合物でブロックされたブロックイソシアナト基を有するモノマー(m-a)(以下、単に「モノマー(m-a)」とも言う。)に由来する構成単位である。共重合体(A)に含まれている構成単位(a)のブロックイソシアナト基は、共重合体(A)を含有する樹脂組成物を熱硬化させることにより、脱ブロック化してイソシアナト基を生成し、構成単位(b)の有するヒドロキシ基と反応して、架橋構造を生成する。そのため、共重合体(A)を含有する樹脂組成物は、50℃~150℃の低温で硬化させても耐溶剤性に優れた硬化膜が得られる。 <Constituent unit (a)>
The structural unit (a) is a structural unit derived from a monomer (ma) having a blocked isocyanate group blocked with a pyrazole compound (hereinafter, also simply referred to as “monomer (ma)”). The blocked isocyanate group of the structural unit (a) contained in the copolymer (A) is deblocked by thermally curing the resin composition containing the copolymer (A) to generate an isocyanate group. Then, it reacts with the hydroxy group of the structural unit (b) to form a crosslinked structure. Therefore, the resin composition containing the copolymer (A) can be cured at a low temperature of 50 ° C. to 150 ° C. to obtain a cured film having excellent solvent resistance.
これらのモノマー(m-a)は、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of the monomer (ma) having a block isocyanato group and an ethylenically unsaturated bond include a reaction product of an ethylenically unsaturated group-containing isocyanate compound and a pyrazole compound.
These monomers (ma) may be used alone or in combination of two or more.
(式(1)中、R4は、水素原子又はメチル基を表す;R5は、-CO-、-COOR6-(ここで、R6は炭素原子数1~6のアルキレン基である。)又は-COO-R7O-CONH-R8-(ここで、R7は炭素原子数2~6のアルキレン基である;R8は置換基を有していてもよい炭素原子数2~12のアルキレン基又は炭素原子数6~12のアリーレン基である。)を表す。)
(In the formula (1), R 4 represents a hydrogen atom or a methyl group; R 5 is -CO-, -COOR 6- (where R 6 is an alkylene group having 1 to 6 carbon atoms. ) Or -COO-R 7 O-CONH-R 8- (where R 7 is an alkylene group having 2 to 6 carbon atoms; R 8 is an alkylene group having 2 to 6 carbon atoms which may have a substituent. It represents 12 alkylene groups or arylene groups having 6 to 12 carbon atoms.)
式(1)中のR5は、-CO-、-COOR6-又は-COO-R7O-CONH-R8-を示す。ここで、R6は炭素原子数1~6のアルキレン基である。例えば、前記炭素原子数は2~5や、3~4であってもよい。R7は炭素原子数2~6のアルキレン基である。例えば、前記炭素原子数は2~5や、3~4であってもよい。また、R8は置換基を有していてもよい炭素原子数2~12のアルキレン基又は炭素原子数6~12のアリーレン基である。例えば、前記アルキレン基の前記炭素原子数は3~10や、4~8であってもよい。前記アリーレン基の前記炭素原子数は7~10や、8~9であってもよい。これらの中でも、式(1)中のR5は、-COOR6-であることが好ましい。R5が-COOR6-である場合、R6は、好ましくは炭素原子数1~4のアルキレン基である。 As described above, R4 in the formula (1) represents a hydrogen atom or a methyl group.
R 5 in the formula (1) represents -CO-, -COOR 6- or -COO-R 7 O-CONH-R 8- . Here, R 6 is an alkylene group having 1 to 6 carbon atoms. For example, the number of carbon atoms may be 2 to 5 or 3 to 4. R 7 is an alkylene group having 2 to 6 carbon atoms. For example, the number of carbon atoms may be 2 to 5 or 3 to 4. Further, R 8 is an alkylene group having 2 to 12 carbon atoms or an arylene group having 6 to 12 carbon atoms which may have a substituent. For example, the number of carbon atoms of the alkylene group may be 3 to 10 or 4 to 8. The number of carbon atoms of the arylene group may be 7 to 10 or 8 to 9. Among these, R 5 in the formula (1) is preferably −COOR 6 −. When R 5 is −COOR 6 −, R 6 is preferably an alkylene group having 1 to 4 carbon atoms.
上記反応は、一般に、-20~150℃の温度で行うことができ、25~130℃の温度で行うことが好ましい。上記反応の温度が-20℃以上であると、十分な反応速度が得られる。また、上記反応の温度が150℃以下であると、C=C(二重結合)を有する原料が重合されることによって、反応後に生成する構成単位(a)を与えるモノマー(m-a)がゲル化することを防止できる。 The reaction between the ethylenically unsaturated group-containing isocyanate compound and the pyrazole compound can be carried out with or without the presence of a solvent. When the above reaction is carried out using a solvent, a solvent that is inert to the isocyanato group is used. In the above reaction, an organometallic salt such as tin, zinc, lead or the like, a tertiary amine or the like may be used as a catalyst.
The reaction can generally be carried out at a temperature of −20 to 150 ° C., preferably at a temperature of 25 to 130 ° C. When the temperature of the above reaction is −20 ° C. or higher, a sufficient reaction rate can be obtained. Further, when the temperature of the reaction is 150 ° C. or lower, the monomer (ma) that gives the structural unit (a) generated after the reaction is produced by polymerizing the raw material having C = C (double bond). It is possible to prevent gelation.
共重合体(A)の含有するヒドロキシ基を有する構成単位(b)は、ブロックイソシアナト基を有さず、ヒドロキシ基を有する。構成単位(b)は、ヒドロキシ基を有するモノマー(m-b)(以下、単に「モノマー(m-b)」とも言う。)に由来する構成単位である(ただし、前記構成単位(a)に該当するものは除く)。共重合体(A)に含まれている構成単位(b)のヒドロキシ基は、共重合体(A)を含有する樹脂組成物を熱硬化させることにより、構成単位(a)の有するブロックイソシアナト基が脱ブロック化して生成したイソシアナト基と反応し、架橋構造を生成する。 <Constituent unit having a hydroxy group (b)>
The structural unit (b) having a hydroxy group contained in the copolymer (A) does not have a block isocyanate group but has a hydroxy group. The structural unit (b) is a structural unit derived from a monomer (mb) having a hydroxy group (hereinafter, also simply referred to as “monomer (mb)”) (however, in the structural unit (a)). Applicable ones are excluded). The hydroxy group of the structural unit (b) contained in the copolymer (A) is a block isocyanate contained in the structural unit (a) by thermally curing the resin composition containing the copolymer (A). The group reacts with the isocyanato group produced by deblocking to form a crosslinked structure.
共重合体(A)の含有する酸基を有する構成単位(c)は、ブロックイソシアナト基並びにヒドロキシ基を有さず、酸基を有する。構成単位(c)は、酸基を有するモノマー(m-c)(以下、単に「モノマー(m-c)」とも言う。)に由来する構成単位である(ただし、構成単位(a)および構成単位(b)に該当するものは除く)。共重合体(A)に構成単位(c)が含まれていることにより、共重合体(A)を含有する樹脂組成物を感光性材料として使用する場合のアルカリ現像性が良好となる。 <Constituent unit having an acid group (c)>
The structural unit (c) having an acid group contained in the copolymer (A) does not have a block isocyanato group and a hydroxy group, but has an acid group. The structural unit (c) is a structural unit derived from a monomer (mc) having an acid group (hereinafter, also simply referred to as “monomer (mc)”) (however, the structural unit (a) and the constitutional unit (c)). Excluding those corresponding to unit (b)). Since the copolymer (A) contains the structural unit (c), the alkali developability becomes good when the resin composition containing the copolymer (A) is used as a photosensitive material.
構成単位(c)を与えるモノマー(m-c)としては、ブロックイソシアナト基並びにヒドロキシ基を有さず、重合性不飽和結合と酸基とを有するモノマーであればよく、特に限定されない。モノマー(m-c)としては、例えば、不飽和カルボン酸又はその無水物、不飽和スルホン酸、不飽和ホスホン酸等が挙げられる。 Examples of the acid group contained in the structural unit (c) include a carboxy group, a sulfo group, a phospho group and the like. Among these acid groups, a carboxy group is preferable as the acid group of the structural unit (c) from the viewpoint of easy availability.
The monomer (mc) that gives the structural unit (c) is not particularly limited as long as it is a monomer that does not have a blocked isocyanato group or a hydroxy group and has a polymerizable unsaturated bond and an acid group. Examples of the monomer (mc) include unsaturated carboxylic acid or an anhydride thereof, unsaturated sulfonic acid, unsaturated phosphonic acid and the like.
共重合体(A)中に含まれる構成単位(a)の割合は、特に制限はないが、好ましくは1~45モル%、より好ましくは5~40モル%、最も好ましくは15~35モル%である。必要に応じて、18~33モル%や、20~30モル%や、25~28モル%などであってもよい。
共重合体(A)中に含まれる構成単位(b)の割合は、特に制限はないが、好ましくは1~50モル%、より好ましくは5~45モル%、最も好ましくは10~35モル%である。必要に応じて、15~40モル%や、18~33モル%や、20~30モル%や、22~25モル%などであってもよい。
共重合体(A)中に含まれる構成単位(c)の割合は、特に制限はないが、好ましくは1~60モル%、より好ましくは5~50モル%、最も好ましくは10~40モル%である。必要に応じて、13~35モル%や、15~30モル%や、20~28モル%や、22~25モル%などであってもよい。 Here, the ratio of the structural unit (a), the structural unit (b), and the structural unit (c) contained in the copolymer (A) will be described.
The ratio of the structural unit (a) contained in the copolymer (A) is not particularly limited, but is preferably 1 to 45 mol%, more preferably 5 to 40 mol%, and most preferably 15 to 35 mol%. Is. If necessary, it may be 18 to 33 mol%, 20 to 30 mol%, 25 to 28 mol%, or the like.
The ratio of the structural unit (b) contained in the copolymer (A) is not particularly limited, but is preferably 1 to 50 mol%, more preferably 5 to 45 mol%, and most preferably 10 to 35 mol%. Is. If necessary, it may be 15 to 40 mol%, 18 to 33 mol%, 20 to 30 mol%, 22 to 25 mol%, or the like.
The ratio of the structural unit (c) contained in the copolymer (A) is not particularly limited, but is preferably 1 to 60 mol%, more preferably 5 to 50 mol%, and most preferably 10 to 40 mol%. Is. If necessary, it may be 13 to 35 mol%, 15 to 30 mol%, 20 to 28 mol%, 22 to 25 mol%, or the like.
本実施形態の共重合体(A)において、構成単位(a)および構成単位(b)の割合が1モル%以上であると、共重合体(A)を含有する樹脂組成物を熱硬化させることにより、構成単位(b)のヒドロキシ基と、構成単位(a)のブロックイソシアナト基が脱ブロック化して生成するイソシアナト基とが反応して、十分に架橋構造が生成される。したがって、構成単位(a)および構成単位(b)をそれぞれ1モル%以上含む共重合体(A)を含有する樹脂組成物は、低温で熱硬化させても、耐溶剤性の良好な硬化物が得られる。 Therefore, it is preferable that the copolymer (A) contains 1 to 45 mol% of the constituent unit (a), 1 to 50 mol% of the constituent unit (b), and 1 to 60 mol% of the constituent unit (c). ..
In the copolymer (A) of the present embodiment, when the ratio of the structural unit (a) and the structural unit (b) is 1 mol% or more, the resin composition containing the copolymer (A) is thermally cured. As a result, the hydroxy group of the structural unit (b) and the isocyanate group generated by deblocking the blocked isocyanato group of the structural unit (a) react with each other to sufficiently form a crosslinked structure. Therefore, the resin composition containing the copolymer (A) containing 1 mol% or more of the structural unit (a) and the structural unit (b), respectively, is a cured product having good solvent resistance even when thermally cured at a low temperature. Is obtained.
具体的には、構成単位(a)の有するブロックイソシアナト基の総量と、樹脂組成物中に含まれるヒドロキシ基の総量(構成単位(b)の有するヒドロキシ基と、反応性希釈剤(C)に含まれるヒドロキシ基との合計)とのモル比率は、10:90~90:10であることが好ましく、30:70~70:30であることがより好ましく、40:60~60:40であることがさらに好ましい。上記モル比率が上記範囲であると、共重合体(A)を含有する樹脂組成物を熱硬化させることにより、樹脂組成物中に含まれるヒドロキシ基と、構成単位(a)の有するブロックイソシアナト基の脱ブロック化により生成したイソシアナト基との反応による架橋構造が生成されやすくなる。このため、より一層耐溶剤性の良好な硬化物が得られる。 When the resin composition containing the copolymer (A) contains a compound having a hydroxy group as the reactive diluent (C) in addition to the copolymer (A), it is contained in the copolymer (A). The total amount of hydroxy groups contained in the structural unit (b) is preferably reduced according to the amount of hydroxy groups contained in the reactive diluent (C).
Specifically, the total amount of the blocked isocyanato group contained in the constituent unit (a) and the total amount of the hydroxy groups contained in the resin composition (the hydroxy group possessed by the constituent unit (b) and the reactive diluent (C)). The molar ratio with the hydroxy group contained in the above is preferably 10:90 to 90:10, more preferably 30:70 to 70:30, and 40:60 to 60:40. It is more preferable to have. When the molar ratio is in the above range, the resin composition containing the copolymer (A) is thermally cured to contain the hydroxy group contained in the resin composition and the block isocyanato having the structural unit (a). A crosslinked structure is easily generated by the reaction with the isocyanato group generated by the deblocking of the group. Therefore, a cured product having even better solvent resistance can be obtained.
本実施形態の共重合体(A)は、必要に応じて、構成単位(a)~(c)と共に、これらと共重合可能なその他の構成単位(d)(但し、構成単位(a)~(c)に該当するものは除く)を含有していてもよい。 <Other structural units (d)>
The copolymer (A) of the present embodiment includes the structural units (a) to (c) as well as other structural units (d) that can be copolymerized with the structural units (a) to (c) (provided that the structural units (a) to (a) to the same. (Excluding those corresponding to (c)) may be contained.
共重合体(A)のポリスチレン換算の重量平均分子量は、特に制限されないが、好ましくは1,000~50,000、より好ましくは3,000~40,000である。必要に応じて、5,000~20,000や、7,000~15,000や、9,000~12,000などであってもよい。共重合体(A)の重量平均分子量が1,000以上であると、共重合体(A)を含む樹脂組成物を感光性材料として使用する場合のアルカリ現像性が良好となり、アルカリ現像後にパターンの欠けが発生し難くなる。一方、共重合体(A)の重量平均分子量が50,000以下であると、共重合体(A)を含む樹脂組成物を感光性材料として使用する場合の現像時間が適切になり、実用性が確保される。 (Weight average molecular weight (Mw))
The polystyrene-equivalent weight average molecular weight of the copolymer (A) is not particularly limited, but is preferably 1,000 to 50,000, more preferably 3,000 to 40,000. If necessary, it may be 5,000 to 20,000, 7,000 to 15,000, 9,000 to 12,000, or the like. When the weight average molecular weight of the copolymer (A) is 1,000 or more, the alkali developability when the resin composition containing the copolymer (A) is used as a photosensitive material becomes good, and the pattern is obtained after the alkali development. It becomes difficult for the chip to occur. On the other hand, when the weight average molecular weight of the copolymer (A) is 50,000 or less, the development time when the resin composition containing the copolymer (A) is used as a photosensitive material becomes appropriate and practical. Is secured.
共重合体(A)のガラス転移温度(Tg)は、30℃以下であり、20℃以下であることが好ましく、0℃以下であることがさらに好ましい。共重合体(A)のガラス転移温度が30℃超であると、低温での硬化性に悪影響を及ぼす。このため、共重合体(A)のガラス転移温度を、30℃以下とする。共重合体(A)のガラス転移温度は、-50℃以上であることが好ましく、-40℃以上であることがより好ましく、-30℃以上であることがさらに好ましい。共重合体(A)のガラス転移温度が-50℃以上であると、共重合体(A)を含む樹脂組成物は、耐熱性に優れた硬化膜が得られるものとなる。必要に応じて、前記ガラス転移温度は、-45℃以上25℃以下であったり、-35℃以上15℃以下であったり、-25℃以上10℃以下であったり、-15℃以上5℃以下であってもよい。 (Glass transition temperature (Tg))
The glass transition temperature (Tg) of the copolymer (A) is 30 ° C. or lower, preferably 20 ° C. or lower, and more preferably 0 ° C. or lower. If the glass transition temperature of the copolymer (A) is more than 30 ° C., the curability at a low temperature is adversely affected. Therefore, the glass transition temperature of the copolymer (A) is set to 30 ° C. or lower. The glass transition temperature of the copolymer (A) is preferably −50 ° C. or higher, more preferably −40 ° C. or higher, and even more preferably −30 ° C. or higher. When the glass transition temperature of the copolymer (A) is −50 ° C. or higher, the resin composition containing the copolymer (A) can obtain a cured film having excellent heat resistance. If necessary, the glass transition temperature is −45 ° C. or higher and 25 ° C. or lower, −35 ° C. or higher and 15 ° C. or lower, -25 ° C. or higher and 10 ° C. or lower, or −15 ° C. or higher and 5 ° C. or lower. It may be as follows.
共重合体(A)の酸価(JIS K6901 5.3)は、適宜選択できる。共重合体(A)の酸価は、共重合体(A)を含む樹脂組成物を感光性材料として使用する場合には、好ましくは20~300KOHmg/gであり、より好ましくは30~200KOHmg/gである。必要に応じて、40~150KOHmg/gや、50~100KOHmg/gなどであってもよい。共重合体(A)の酸価が20KOHmg/g以上であると、共重合体(A)を含む樹脂組成物を感光性材料として使用する場合のアルカリ現像性が良好となる。一方、共重合体(A)の酸価が300KOHmg/g以下であると、共重合体(A)を含む樹脂組成物を感光性材料として使用する場合に、アルカリ現像液に対して露光部分(光硬化部分)が溶解し難いものとなるため、パターン形状が良好となる。 (Acid value)
The acid value of the copolymer (A) (JIS K6901 5.3) can be appropriately selected. The acid value of the copolymer (A) is preferably 20 to 300 KOH mg / g, more preferably 30 to 200 KOH mg / g when the resin composition containing the copolymer (A) is used as a photosensitive material. g. If necessary, it may be 40 to 150 KOH mg / g, 50 to 100 KOH mg / g, or the like. When the acid value of the copolymer (A) is 20 KOHmg / g or more, the alkali developability becomes good when the resin composition containing the copolymer (A) is used as a photosensitive material. On the other hand, when the acid value of the copolymer (A) is 300 KOHmg / g or less, when the resin composition containing the copolymer (A) is used as a photosensitive material, the exposed portion (exposed portion to the alkaline developer). Since the photocured portion) is difficult to dissolve, the pattern shape becomes good.
共重合体(A)は、分子中にピラゾール化合物でブロックされたブロックイソシアナト基を含んでいる。ブロックイソシアナト基の当量数は、適宜選択すればよいが、300~6000であることが好ましく、500~3500であることがより好ましい。必要に応じて、400~2000や、600~1000であってもよい。ブロックイソシアナト基の当量数が、300以上であると、共重合体(A)を含有する樹脂組成物中にヒドロキシ基が十分に存在している場合、これを熱硬化させることにより、樹脂組成物中のヒドロキシ基と、構成単位(a)の有するブロックイソシアナト基が脱ブロック化して生じるイソシアナト基との反応による架橋構造が十分に生成されるものとなる。このため、より一層耐溶剤性の良好な硬化物が得られる。 (Equivalent number of block isocyanate groups)
The copolymer (A) contains a blocked isocyanate group blocked by a pyrazole compound in the molecule. The equivalent number of the block isocyanate group may be appropriately selected, but is preferably 300 to 6000, and more preferably 500 to 3500. If necessary, it may be 400 to 2000 or 600 to 1000. When the equivalent number of the block isocyanato group is 300 or more, if a hydroxy group is sufficiently present in the resin composition containing the copolymer (A), the hydroxy group is thermally cured to form a resin composition. A crosslinked structure is sufficiently produced by the reaction between the hydroxy group in the substance and the isocyanato group generated by deblocking the blocked isocyanato group having the structural unit (a). Therefore, a cured product having even better solvent resistance can be obtained.
本実施形態の共重合体(A)は、例えば、以下に示す溶剤加熱工程(I)と滴下重合工程(II)と後重合工程(III)とをこの順に行う方法を用いて製造できる。
(溶剤加熱工程(I))
溶剤(B-1)を用意し、溶剤(B-1)を60~90℃に昇温する。溶剤加熱工程(I)においては、溶剤(B-1)に後述する連鎖移動剤を入れてから昇温してもよい。溶剤(B-1)に連鎖移動剤を入れてから昇温することにより、滴下重合工程(II)および後重合工程(III)において合成される共重合体(A)の重合度を制御できる。
溶剤(B-1)中の連鎖移動剤の濃度は、例えば、0.1~10質量%とすることができ、特に限定されない。 <Method for producing copolymer (A)>
The copolymer (A) of the present embodiment can be produced, for example, by using a method in which the solvent heating step (I), the dropping polymerization step (II), and the post-polymerization step (III) shown below are performed in this order.
(Solvent heating step (I))
A solvent (B-1) is prepared, and the temperature of the solvent (B-1) is raised to 60 to 90 ° C. In the solvent heating step (I), the temperature may be raised after the chain transfer agent described later is added to the solvent (B-1). The degree of polymerization of the copolymer (A) synthesized in the dropping polymerization step (II) and the post-polymerization step (III) can be controlled by adding the chain transfer agent to the solvent (B-1) and then raising the temperature.
The concentration of the chain transfer agent in the solvent (B-1) can be, for example, 0.1 to 10% by mass, and is not particularly limited.
昇温した溶剤(B-1)を攪拌しながら、昇温した溶剤(B-1)に、モノマー溶液とともに、重合開始剤溶液を滴下して、混合溶液とする、滴下重合を行う。
モノマー溶液は、ブロックイソシアナト基を有するモノマー(m-a)と、ヒドロキシ基含有モノマー(m-b)と、酸基含有モノマー(m-c)と、必要に応じて用いられるモノマー(m-d)とを、溶剤(B-2)に溶解させたものである。なお溶剤(B-2)としては、溶剤(B-1)に例示されたものを、同様に用いることができる。
重合開始剤溶液は、重合開始剤を、溶剤(B-2)に溶解させたものである。
本実施形態の共重合体(A)の製造方法では、溶剤(B-1)と溶剤(B-2)のいずれか一方または両方が、ヒドロキシ基含有溶剤を含有する。 (Dripping Polymerization Step (II))
While stirring the heated solvent (B-1), the polymerization initiator solution is added dropwise to the heated solvent (B-1) together with the monomer solution to prepare a mixed solution, and the dropping polymerization is performed.
The monomer solution includes a monomer having a blocked isocyanato group (ma), a hydroxy group-containing monomer (mb), an acid group-containing monomer (mc), and a monomer (m-) used as needed. d) is dissolved in a solvent (B-2). As the solvent (B-2), those exemplified for the solvent (B-1) can be used in the same manner.
The polymerization initiator solution is obtained by dissolving the polymerization initiator in a solvent (B-2).
In the method for producing the copolymer (A) of the present embodiment, either one or both of the solvent (B-1) and the solvent (B-2) contains a hydroxy group-containing solvent.
モノマー溶液および重合開始剤溶液の滴下終了後、前記混合溶液を攪拌しながら、さらに60~90℃で1~5時間反応させる。 (Post-polymerization step (III))
After the addition and drop of the monomer solution and the polymerization initiator solution are completed, the mixed solution is further reacted at 60 to 90 ° C. for 1 to 5 hours while stirring.
溶剤加熱工程(I)において使用する溶剤(B-1)は、ヒドロキシ基含有溶剤のみであってもよいし、ヒドロキシ基を含有しない溶剤のみであってもよいし、ヒドロキシ基含有溶剤とヒドロキシ基を含有しない溶剤の両方を含むものであってもよい。溶剤(B-1)は、ヒドロキシ基を含有するヒドロキシ基含有溶剤を含むことが好ましく、ヒドロキシ基含有溶剤のみであることがより好ましい。 "Solvent (B-1)"
The solvent (B-1) used in the solvent heating step (I) may be only a hydroxy group-containing solvent, may be only a hydroxy group-free solvent, or may be a hydroxy group-containing solvent and a hydroxy group. It may contain both of the solvents which do not contain. The solvent (B-1) preferably contains a hydroxy group-containing solvent containing a hydroxy group, and more preferably only a hydroxy group-containing solvent.
本実施形態の製造方法では、溶剤加熱工程(I)において、反応容器に溶剤(B-1)を入れて、60~90℃に昇温する。また、滴下重合工程(II)および後重合工程(III)において、混合溶液を攪拌しながら、60~90℃で1~5時間反応させる。
溶剤加熱工程(I)における溶剤(B-1)の温度と、滴下重合工程(II)および後重合工程(III)における混合溶液の温度とは、同じであってもよいし、異なっていてもよい。 "Solvent and mixed solution temperature"
In the production method of the present embodiment, in the solvent heating step (I), the solvent (B-1) is put into the reaction vessel and the temperature is raised to 60 to 90 ° C. Further, in the dropping polymerization step (II) and the post-polymerization step (III), the mixed solution is reacted at 60 to 90 ° C. for 1 to 5 hours while stirring.
The temperature of the solvent (B-1) in the solvent heating step (I) and the temperature of the mixed solution in the dropping polymerization step (II) and the post-polymerization step (III) may be the same or different. good.
滴下重合工程(II)において、連鎖移動剤溶液を昇温した溶剤(B-1)に滴下する場合、重合開始剤溶液およびモノマー溶液と同時に、連鎖移動剤溶液を滴下してもよいし、重合開始剤溶液およびモノマー溶液を滴下する前または後に、連鎖移動剤溶液を滴下してもよい。 In the dropping polymerization step (II), it is preferable to simultaneously drop the polymerization initiator solution and the monomer solution into the heated solvent (B-1). In this case, the molecular weight of the copolymer (A) can be controlled accurately, and the copolymer (A) in the process of production can be prevented from gelling.
In the dropping polymerization step (II), when the chain transfer agent solution is dropped onto the heated solvent (B-1), the chain transfer agent solution may be dropped at the same time as the polymerization initiator solution and the monomer solution, or the polymerization may be carried out. The chain transfer agent solution may be added dropwise before or after the initiator solution and the monomer solution are added dropwise.
重合開始剤溶液、モノマー溶液、連鎖移動剤溶液の滴下時間は、例えば、30分~1時間とすることができる。
重合開始剤溶液、モノマー溶液、連鎖移動剤溶液の滴下速度および滴下時間は、それぞれ異なっていてもよいし、一部または全部が同じであってもよい。 The dropping rate of the polymerization initiator solution, monomer solution, and chain transfer agent solution depends on the reaction scale such as the volume of the reaction vessel, the volume of the heated solvent (B-1) and the polymerization initiator solution, the monomer solution, and the chain transfer agent solution. It can be decided as appropriate. The dropping rate of the polymerization initiator solution, the monomer solution, and the chain transfer agent solution is preferably 0.1 to 5 mL / min, for example, when a 1 L reaction vessel is used.
The dropping time of the polymerization initiator solution, the monomer solution, and the chain transfer agent solution can be, for example, 30 minutes to 1 hour.
The dropping rate and dropping time of the polymerization initiator solution, the monomer solution, and the chain transfer agent solution may be different from each other, or may be partially or wholly the same.
(重合開始剤溶液)
重合開始剤溶液は、重合開始剤を溶剤(B-2)に溶解させたものである。
重合開始剤としては、特に限定されないが、例えば、2,2’-アゾビス(2,4-ジメチルバレロニトリル)、アゾビスイソブチロニトリル、アゾビスイソバレロニトリル、過酸化ベンゾイル、t-ブチルパーオキシ-2-エチルヘキサノエートなどが挙げられる。これらの重合開始剤は、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 In the present embodiment, the polymerization initiator solution, the monomer solution, and the chain transfer agent solution used as needed are prepared individually.
(Polymer initiator solution)
The polymerization initiator solution is obtained by dissolving the polymerization initiator in a solvent (B-2).
The polymerization initiator is not particularly limited, but is, for example, 2,2'-azobis (2,4-dimethylvaleronitrile), azobisisobutyronitrile, azobisisobutyronitrile, benzoyl peroxide, t-butylper. Examples thereof include oxy-2-ethylhexanoate. These polymerization initiators may be used alone or in combination of two or more.
重合開始剤溶液の使用量は、重合開始剤溶液中に含まれる重合開始剤が、モノマーの全仕込み量(すなわち、モノマー溶液中のモノマー(m-a)~モノマー(m-d)の質量)100質量部に対して、0.5~20質量部となる量であることが好ましく、より好ましくは1.0~10質量部となる量である。 The concentration of the polymerization initiator in the polymerization initiator solution is preferably a concentration at which a mixed solution having a uniform concentration can be easily obtained, and is, for example, 16 to 50% by mass, and is not particularly limited.
The amount of the polymerization initiator solution used is such that the polymerization initiator contained in the polymerization initiator solution is the total amount of the monomers charged (that is, the mass of the monomers (ma) to the monomers (md) in the monomer solution). The amount is preferably 0.5 to 20 parts by mass, more preferably 1.0 to 10 parts by mass with respect to 100 parts by mass.
モノマー溶液は、ブロックイソシアナト基を有するモノマー(m-a)と、ヒドロキシ基含有モノマー(m-b)と、酸基含有モノマー(m-c)と、必要に応じて用いられるモノマー(m-d)とを、溶剤(B-2)に溶解させたものである。モノマー(m-a)~モノマー(m-d)としては、共重合体(A)の項目で例示したものを使用できる。 (Monomer solution)
The monomer solution includes a monomer having a blocked isocyanato group (ma), a hydroxy group-containing monomer (mb), an acid group-containing monomer (mc), and a monomer (m-) used as needed. d) is dissolved in a solvent (B-2). As the monomer (ma) to the monomer (md), those exemplified in the item of the copolymer (A) can be used.
モノマー溶液中のモノマー(m-a)~(m-d)の合計濃度は、均一な濃度の混合溶液が得られやすい濃度であることが好ましく、例えば、50~95質量%とすることができるが、特に限定されない。 The monomer solution may be produced by a method in which the monomers (ma) to (md) are individually dissolved in a solvent (B-2) and then mixed, or the monomers (ma) to the monomer solution may be produced. (Md) may be mixed and then dissolved in a solvent (B-2).
The total concentration of the monomers (ma) to (md) in the monomer solution is preferably a concentration at which a mixed solution having a uniform concentration can be easily obtained, and can be, for example, 50 to 95% by mass. However, it is not particularly limited.
常温で液体であるモノマーとしては、例えば、ブロックイソシアナト基を有するモノマー(m-a)である2-[(3,5-ジメチルピラゾリル)カルボニルアミノ]エチルメタクリレートなどが挙げられる。 When one or more of the monomers used for producing the copolymer (A) is liquid at room temperature, the monomer that is liquid at room temperature may also serve as a solvent in the monomer solution. In this case, the monomer solution may not contain the solvent (B-2).
Examples of the monomer that is liquid at room temperature include 2-[(3,5-dimethylpyrazolyl) carbonylamino] ethyl methacrylate, which is a monomer (ma) having a blocked isocyanate group.
連鎖移動剤溶液は、連鎖移動剤を溶剤(B-2)に溶解させたものである。
滴下重合工程(II)において、連鎖移動剤溶液を滴下することにより、後重合工程(III)において合成される共重合体(A)の重合度を制御できる。したがって、所望の分子量範囲の共重合体(A)を容易に製造できる。
連鎖移動剤としては、特に限定されないが、例えば、多官能チオールを好ましく用いることができる。多官能チオールは、分子内に2個以上のメルカプト基を有する化合物である。 (Chain transfer agent solution)
The chain transfer agent solution is a solution of the chain transfer agent in a solvent (B-2).
By dropping the chain transfer agent solution in the dropping polymerization step (II), the degree of polymerization of the copolymer (A) synthesized in the post-polymerization step (III) can be controlled. Therefore, the copolymer (A) having a desired molecular weight range can be easily produced.
The chain transfer agent is not particularly limited, but for example, a polyfunctional thiol can be preferably used. A polyfunctional thiol is a compound having two or more mercapto groups in the molecule.
重合開始剤溶液中の連鎖移動剤の濃度は、均一な濃度の混合溶液が得られやすい濃度であることが好ましく、例えば、0.1~10質量%とすることができ、特に限定されない。 Among the above, the chain transfer agents include pentaerythritol tetrakis (3-mercaptobutyrate) and / or thioglycolic acid and pentaerythritol tetrakis (3-mercaptopropio) from the viewpoint of availability, cost and quality. Nate) is preferably used.
The concentration of the chain transfer agent in the polymerization initiator solution is preferably a concentration at which a mixed solution having a uniform concentration can be easily obtained, and is, for example, 0.1 to 10% by mass, and is not particularly limited.
滴下重合工程(II)において使用する溶剤(B-2)としては、溶剤加熱工程(I)において使用する溶剤(B-1)と同様のものを用いることができる。溶剤(B-2)は、溶剤(B-1)と同様に、ヒドロキシ基含有溶剤のみであってもよいし、ヒドロキシ基を含有しない溶剤のみであってもよいし、ヒドロキシ基含有溶剤とヒドロキシ基を含有しない溶剤の両方を含むものであってもよい。溶剤(B-2)は、ヒドロキシ基を含有するヒドロキシ基含有溶剤を含むことが好ましく、ヒドロキシ基含有溶剤のみであることがより好ましい。 "Solvent (B-2)"
As the solvent (B-2) used in the dropping polymerization step (II), the same solvent as the solvent (B-1) used in the solvent heating step (I) can be used. Like the solvent (B-1), the solvent (B-2) may be only a hydroxy group-containing solvent, may be only a hydroxy group-free solvent, or may be a hydroxy group-containing solvent and hydroxy. It may contain both groups-free solvents. The solvent (B-2) preferably contains a hydroxy group-containing solvent containing a hydroxy group, and more preferably only a hydroxy group-containing solvent.
すなわち、滴下重合工程(II)および/または後重合工程(III)において、ヒドロキシ基含有溶剤の有するヒドロキシ基が、モノマー(m-a)の有するブロックイソシアナト基から生じるイソシアナト基の一部と反応する。 In the production method of the present embodiment, the solvent (B-1) used in the solvent heating step (I) and / or the solvent (B-2) used in the dropping polymerization step (II) contains a hydroxy group-containing solvent. , The following effects can be obtained.
That is, in the dropping polymerization step (II) and / or the post-polymerization step (III), the hydroxy group of the hydroxy group-containing solvent reacts with a part of the isocyanato group generated from the blocked isocyanato group of the monomer (ma). do.
次に、本実施形態の樹脂組成物について説明する。
本実施形態の樹脂組成物は、本実施形態の共重合体(A)と、溶剤(B)とを含有する。
本実施形態の樹脂組成物は、共重合体(A)と、溶剤(B)だけでなく、反応性希釈剤(C)と、光重合開始剤(D)とをさらに含有するものであってもよい。このような樹脂組成物は、感光性の樹脂組成物として好ましく使用できる。
本実施形態の樹脂組成物は、上記共重合体(A)~光重合開始剤(D)に加えて、着色剤(E)をさらに含有するものであってもよい。このような樹脂組成物は、カラーフィルター、ブラックマトリックス、ブラックカラムスペーサー等の着色パターンを形成するための材料として好ましく使用できる。 <Resin composition>
Next, the resin composition of this embodiment will be described.
The resin composition of the present embodiment contains the copolymer (A) of the present embodiment and the solvent (B).
The resin composition of the present embodiment further contains not only the copolymer (A) and the solvent (B), but also the reactive diluent (C) and the photopolymerization initiator (D). May be good. Such a resin composition can be preferably used as a photosensitive resin composition.
The resin composition of the present embodiment may further contain a colorant (E) in addition to the above-mentioned copolymer (A) to the photopolymerization initiator (D). Such a resin composition can be preferably used as a material for forming a coloring pattern such as a color filter, a black matrix, and a black column spacer.
本実施形態の樹脂組成物において、溶剤(B)は、ヒドロキシ基含有溶剤を含む。溶剤(B)は、ヒドロキシ基含有溶剤のみであってもよい。本実施形態の樹脂組成物では、溶剤(B)が、ヒドロキシ基含有溶剤を含むため、保存安定性が向上する。 (Solvent (B))
In the resin composition of the present embodiment, the solvent (B) contains a hydroxy group-containing solvent. The solvent (B) may be only a hydroxy group-containing solvent. In the resin composition of the present embodiment, since the solvent (B) contains a hydroxy group-containing solvent, the storage stability is improved.
溶剤(B)は、共重合体(A)を製造する工程において使用した溶剤(B-1)および/または溶剤(B-2)と同じであってもよいし、異なっていてもよい。 The content ratio of the hydroxy group-containing solvent in the solvent (B) can be set in the same manner as the content ratio of the hydroxy group-containing solvent in the solvent (B-1) used in the step of producing the copolymer (A).
The solvent (B) may be the same as or different from the solvent (B-1) and / or the solvent (B-2) used in the step of producing the copolymer (A).
本実施形態の樹脂組成物としては、共重合体(A)を製造する際に得られた共重合体(A)を含む反応液をそのまま用いてもよい。この場合、反応液から共重合体(A)を単離する必要はない。また、共重合体(A)の製造に使用した溶剤(B-1)および/または溶剤(B-2)が反応液中に含まれている場合には、反応液中の溶剤(B-1)および/または溶剤(B-2)を、溶剤(B)としてそのまま用いることができる。反応液中には、必要に応じて、溶剤(B)を追加してもよい。 The resin composition of the present embodiment is, for example, a copolymer (A) isolated from a reaction solution containing the copolymer (A) obtained in the post-polymerization step (III) for producing the copolymer (A). ) And the solvent (B) can be produced by a method of appropriately mixing.
As the resin composition of the present embodiment, the reaction solution containing the copolymer (A) obtained when the copolymer (A) is produced may be used as it is. In this case, it is not necessary to isolate the copolymer (A) from the reaction solution. When the solvent (B-1) and / or the solvent (B-2) used for producing the copolymer (A) is contained in the reaction solution, the solvent (B-1) in the reaction solution is contained. ) And / or the solvent (B-2) can be used as it is as the solvent (B). If necessary, the solvent (B) may be added to the reaction solution.
反応性希釈剤(C)は、必要に応じて、光重合開始剤(D)とともに含有される。反応性希釈剤(C)は、分子内に重合性官能基として、少なくとも一つの重合可能なエチレン性不飽和基を有する化合物である。反応性希釈剤(C)は、単官能モノマーであってもよいし、多官能モノマーであってもよく、重合性官能基を複数有する多官能モノマーであることが好ましい。反応性希釈剤(C)を含有する樹脂組成物とすることにより、粘度の調整が容易となる。また、反応性希釈剤(C)を含有する樹脂組成物とすることにより、樹脂組成物の硬化物の基材に対する密着性を向上させたり、樹脂組成物の硬化物における強度を調整したりできる。 (Reactive Diluent (C))
The reactive diluent (C) is contained together with the photopolymerization initiator (D), if necessary. The reactive diluent (C) is a compound having at least one polymerizable ethylenically unsaturated group as a polymerizable functional group in the molecule. The reactive diluent (C) may be a monofunctional monomer or a polyfunctional monomer, and is preferably a polyfunctional monomer having a plurality of polymerizable functional groups. By preparing the resin composition containing the reactive diluent (C), the viscosity can be easily adjusted. Further, by preparing the resin composition containing the reactive diluent (C), the adhesion of the cured resin composition to the substrate can be improved, and the strength of the cured resin composition can be adjusted. ..
光重合開始剤(D)としては、特に限定されないが、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインブチルエーテルなどのベンゾイン類;アセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、1,1-ジクロロアセトフェノン、4-(1-t-ブチルジオキシ-1-メチルエチル)アセトフェノン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノ-プロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)ブタノン-1などのアセトフェノン類;2-メチルアントラキノン、2-アミルアントラキノン、2-t-ブチルアントラキノン、1-クロロアントラキノンなどのアントラキノン類;キサントン、チオキサントン、2,4-ジメチルチオキサントン、2,4-ジイソプロピルチオキサントン、2-クロロチオキサントンなどのチオキサントン類;アセトフェノンジメチルケタール、ベンジルジメチルケタールなどのケタール類;ベンゾフェノン、4-(1-t-ブチルジオキシ-1-メチルエチル)ベンゾフェノン、3,3’,4,4’-テトラキス(t-ブチルジオキシカルボニル)ベンゾフェノンなどのベンゾフェノン類;アシルホスフィンオキサイド類;エタノン1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-1-(O-アセチルオキシム)などが挙げられる。これらの光重合開始剤(D)は、単独で用いてもよく、2種以上を組み合わせて用いてもよい。 (Photopolymerization Initiator (D))
The photopolymerization initiator (D) is not particularly limited, and is, for example, benzophenones such as benzoin, benzoin methyl ether, benzoin ethyl ether, and benzoin butyl ether; acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 1,1. -Dichloroacetophenone, 4- (1-t-butyldioxy-1-methylethyl) acetophenone, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-propane-1-one, 2-benzyl-2 -Acetophenones such as dimethylamino-1- (4-morpholinophenyl) butanone-1; anthracinones such as 2-methylanthraquinone, 2-amylanthraquinone, 2-t-butylanthraquinone, 1-chloroanthraquinone; xanthone, thioxanthone, Thioxanthons such as 2,4-dimethylthioxanthone, 2,4-diisopropylthioxanthone, 2-chlorothioxanthone; acetophenone dimethyl ketal, ketals such as benzyl dimethyl ketal; benzophenone, 4- (1-t-butyldioxy-1-methylethyl) ) Benzophenones, 3,3', 4,4'-Benzophenones such as tetrakis (t-butyldioxycarbonyl) benzophenone; acylphosphine oxides; etanone 1- [9-ethyl-6- (2-methylbenzoyl)- 9H-carbazole-3-yl] -1- (O-acetyloxime) and the like can be mentioned. These photopolymerization initiators (D) may be used alone or in combination of two or more.
着色剤(E)は、必要に応じて含有される。着色剤(E)としては、溶剤(B)に溶解又は分散するものであれば特に限定されず、例えば、染料や顔料などが挙げられる。着色剤(E)は、目的とする樹脂組成物の硬化物の色に応じて、1種のみ単独で用いてもよいし、2種以上を組み合わせて用いてもよい。着色剤(E)としては、染料のみ用いてもよいし、顔料のみ用いてもよいし、染料と顔料とを組み合わせて用いてもよい。 (Colorant (E))
The colorant (E) is contained as needed. The colorant (E) is not particularly limited as long as it dissolves or disperses in the solvent (B), and examples thereof include dyes and pigments. The colorant (E) may be used alone or in combination of two or more, depending on the color of the cured product of the target resin composition. As the colorant (E), only the dye may be used, only the pigment may be used, or the dye and the pigment may be used in combination.
高分子分散剤の例としては、ウレタン系分散剤、ポリエチレンイミン系分散剤、ポリオキシエチレンアルキルエーテル系分散剤、ポリオキシエチレングリコールジエステル系分散剤、ソルビタン脂肪族エステル系分散剤、脂肪族変性エステル系分散剤などが挙げられる。 When a pigment is used as the colorant (E), a known dispersant may be contained in the resin composition from the viewpoint of improving the dispersibility of the pigment. As the dispersant, it is preferable to use a polymer dispersant having excellent dispersion stability over time.
Examples of polymer dispersants include urethane dispersants, polyethyleneimine dispersants, polyoxyethylene alkyl ether dispersants, polyoxyethylene glycol diester dispersants, sorbitan aliphatic ester dispersants, and aliphatic modified esters. Examples include system dispersants.
分散剤の種類および配合量は、使用する顔料の種類などに応じて適宜設定すればよい。 As polymer dispersants, commercially available under trade names such as EFKA (manufactured by EFKA), Disperbyk-161 (manufactured by Big Chemie), Disparon (manufactured by Kusumoto Kasei Co., Ltd.), and SOLPERSE (manufactured by Zeneca). You may use what has been done.
The type and blending amount of the dispersant may be appropriately set according to the type of pigment to be used and the like.
具体的には、本実施形態の樹脂組成物は、150℃以下の温度で硬化させることが好ましく、より好ましくは120℃以下であり、さらに好ましくは100℃以下であり、最も好ましくは80℃以下である。樹脂組成物を硬化させる温度が150℃以下であると、樹脂組成物を硬化させることに必要なエネルギー量が少なくて済む。また、樹脂組成物が耐熱性の劣る着色剤(E)を含む場合、熱硬化に伴う着色剤(E)の劣化を抑制でき、着色剤(E)本来の特性が発揮された硬化物が得られやすい。したがって、着色剤(E)として、様々な材料からなるものを用いることができる。また、基板上に樹脂組成物を塗布して熱硬化させる方法により硬化物を形成する場合、基板が耐熱性の劣る材料からなるものであっても硬化物を形成できる。したがって、基板として、例えば、フレキシブルディスプレイ用の樹脂など様々な材料からなるものを用いることができる。 Since the resin composition of the present embodiment contains the copolymer (A) of the present embodiment, the crosslinking reaction proceeds sufficiently even at a low temperature. Therefore, the resin composition of the present embodiment can be cured at a low temperature.
Specifically, the resin composition of the present embodiment is preferably cured at a temperature of 150 ° C. or lower, more preferably 120 ° C. or lower, still more preferably 100 ° C. or lower, and most preferably 80 ° C. or lower. Is. When the temperature at which the resin composition is cured is 150 ° C. or lower, the amount of energy required to cure the resin composition is small. Further, when the resin composition contains a colorant (E) having inferior heat resistance, deterioration of the colorant (E) due to heat curing can be suppressed, and a cured product exhibiting the original characteristics of the colorant (E) can be obtained. Easy to get rid of. Therefore, as the colorant (E), those made of various materials can be used. Further, when a cured product is formed by a method of applying a resin composition on a substrate and thermally curing the substrate, the cured product can be formed even if the substrate is made of a material having inferior heat resistance. Therefore, as the substrate, for example, a substrate made of various materials such as a resin for a flexible display can be used.
本実施形態の樹脂組成物を硬化させるための加熱時間(硬化時間)は、硬化物の大きさ、厚み、硬化させる温度などに応じて適宜決定することができ、例えば、10分~4時間とすることができ、20分~2時間とすることが好ましい。 The resin composition of the present embodiment is preferably cured at a temperature of 50 ° C. or higher, more preferably 60 ° C. or higher, and even more preferably 70 ° C. or higher. When the temperature at which the resin composition is cured is 50 ° C. or higher, a sufficiently crosslinked structure is sufficiently formed in a short time, and a cured product having good solvent resistance can be efficiently formed.
The heating time (curing time) for curing the resin composition of the present embodiment can be appropriately determined according to the size, thickness, curing temperature, etc. of the cured product, and is, for example, 10 minutes to 4 hours. It can be done, preferably 20 minutes to 2 hours.
本実施形態の樹脂組成物が、共重合体(A)および溶剤(B)以外の成分を含む場合、例えば、予め製造した共重合体(A)と溶剤(B)とを含む樹脂組成物に、反応性希釈剤(C)と、光重合開始剤(D)と、着色剤(E)とを添加して混合する方法により製造してもよい。 The resin composition of the present embodiment can be produced by a method of mixing the above components using a known mixing device. The solvent contained in each component used as a raw material in producing the resin composition of the present embodiment can be used as the solvent (B).
When the resin composition of the present embodiment contains components other than the copolymer (A) and the solvent (B), for example, in the resin composition containing the copolymer (A) and the solvent (B) prepared in advance. , The reactive diluent (C), the photopolymerization initiator (D), and the colorant (E) may be added and mixed.
次に、本実施形態のカラーフィルターについて説明する。
本実施形態のカラーフィルターは、基板と、基板上に形成された赤色(R)パターンと緑色(G)パターンと青色(B)パターンの3つの着色パターンからなる複数の画素と、各着色パターンの境界に形成されたブラックマトリックスと、画素およびブラックマトリックスの上に形成された保護膜とを有する。 <Color filter>
Next, the color filter of this embodiment will be described.
The color filter of the present embodiment includes a substrate, a plurality of pixels composed of three coloring patterns of a red (R) pattern, a green (G) pattern, and a blue (B) pattern formed on the substrate, and each coloring pattern. It has a black matrix formed at the boundary and a protective film formed on the pixels and the black matrix.
保護膜としては、特に限定されず、公知のものを用いることができる。 In the color filter of the present embodiment, the black matrix and the three coloring patterns forming each pixel are the copolymer (A) of the present embodiment, the solvent (B), and the reactive diluent (C). , A coloring pattern comprising a cured product of the resin composition of the present embodiment containing a photopolymerization initiator (D) and a coloring agent (E).
The protective film is not particularly limited, and a known one can be used.
本実施形態のカラーフィルターを製造するには、まず、基板上に、ブラックマトリックスとなる着色パターンおよび各画素を形成する3つの着色パターンを、それぞれ形成する。初めに、基板上にブラックマトリックスとなる着色パターンを形成し、その後、ブラックマトリックスによって区画された範囲内に、各画素を形成する赤色パターンと緑色パターンと青色パターンを、それぞれ形成する。赤色パターンと緑色パターンと青色パターンを形成する順序は、特に限定されない。 Next, an example of the method for manufacturing the color filter of the present embodiment will be described.
In order to manufacture the color filter of the present embodiment, first, a coloring pattern to be a black matrix and three coloring patterns forming each pixel are formed on a substrate. First, a coloring pattern that becomes a black matrix is formed on the substrate, and then a red pattern, a green pattern, and a blue pattern that form each pixel are formed within the range partitioned by the black matrix. The order in which the red pattern, the green pattern, and the blue pattern are formed is not particularly limited.
具体的には、基板上に、本実施形態の樹脂組成物を塗布し、塗布膜を形成する。次に、所定のパターン形状を有するフォトマスクを介して、塗布膜を露光し、露光部分を光硬化させる。そして、塗布膜の未露光部分を、アルカリ水溶液を用いてアルカリ現像し、除去する。その後、ベーキングを行うことにより、塗布膜の露光部分を加熱して硬化させる。以上の工程により、所定の形状を有し、本実施形態の樹脂組成物の硬化物からなる着色パターンが得られる。 Each coloring pattern can be formed by a photolithography method using the resin composition of the present embodiment.
Specifically, the resin composition of the present embodiment is applied onto the substrate to form a coating film. Next, the coating film is exposed through a photomask having a predetermined pattern shape, and the exposed portion is photocured. Then, the unexposed portion of the coating film is alkaline-developed with an alkaline aqueous solution and removed. Then, by baking, the exposed portion of the coating film is heated and cured. By the above steps, a colored pattern having a predetermined shape and made of a cured product of the resin composition of the present embodiment can be obtained.
樹脂組成物を塗布した後、必要に応じて、循環式オーブン、赤外線ヒーター、ホットプレートなどの加熱手段を用いて塗布膜を加熱することにより、塗布膜中に含まれる溶剤(B)を揮発させて除去してもよい。
塗布膜中の溶剤(B)を除去するための加熱は、例えば、50℃~120℃の温度で行うことができる。また、塗布膜中の溶剤(B)を除去するための加熱は、例えば、30秒~30分行うことができる。塗布膜中の溶剤(B)を除去するための加熱温度および加熱時間は、樹脂組成物の組成、塗布膜の厚みなどに応じて適宜設定できる。 The method of applying the resin composition for forming the coloring pattern is not particularly limited, and for example, a screen printing method, a roll coating method, a curtain coating method, a spray coating method, a spin coating method, or the like is used. Can be done.
After applying the resin composition, the solvent (B) contained in the coating film is volatilized by heating the coating film using a heating means such as a circulating oven, an infrared heater, or a hot plate, if necessary. May be removed.
The heating for removing the solvent (B) in the coating film can be performed at a temperature of, for example, 50 ° C to 120 ° C. Further, heating for removing the solvent (B) in the coating film can be performed, for example, for 30 seconds to 30 minutes. The heating temperature and heating time for removing the solvent (B) in the coating film can be appropriately set according to the composition of the resin composition, the thickness of the coating film, and the like.
塗布膜を露光する際には、例えば、紫外線、エキシマレーザー光等の活性エネルギー線を用いることが好ましい。露光に用いる光源としては、特に限定されるものではなく、例えば、低圧水銀ランプ、中圧水銀ランプ、高圧水銀ランプ、キセノンランプ、メタルハライドランプなどを用いることができる。塗布膜に照射するエネルギー線量は、塗布膜の厚み、樹脂組成物の組成などに応じて適宜選択することができ、例えば、30~2000mJ/cm2とすることができる。 When exposing the coating film, for example, a known negative type mask can be used as the photomask.
When exposing the coating film, it is preferable to use, for example, active energy rays such as ultraviolet rays and excimer laser light. The light source used for the exposure is not particularly limited, and for example, a low-pressure mercury lamp, a medium-pressure mercury lamp, a high-pressure mercury lamp, a xenon lamp, a metal halide lamp, or the like can be used. The energy dose to be applied to the coating film can be appropriately selected depending on the thickness of the coating film, the composition of the resin composition, and the like, and can be, for example, 30 to 2000 mJ / cm 2 .
これらのアルカリ水溶液には、必要に応じて、消泡剤、界面活性剤の添加剤を添加してもよい。
また、本実施形態では、アルカリ水溶液によるアルカリ現像の後、ベーキングを行う前に、基板上を水洗してアルカリ水溶液を除去し、乾燥させることが好ましい。 The alkaline aqueous solution used for alkaline development is not particularly limited, and is, for example, an aqueous solution of sodium carbonate, potassium carbonate, calcium carbonate, sodium hydroxide, potassium hydroxide and the like; amine-based compounds such as ethylamine, diethylamine and dimethylethanolamine. Aqueous solution of: tetramethylammonium, 3-methyl-4-amino-N, N-diethylaniline, 3-methyl-4-amino-N-ethyl-N-β-hydroxyethylaniline, 3-methyl-4-amino- N-ethyl-N-β-methanesulfonamide ethylaniline, 3-methyl-4-amino-N-ethyl-N-β-methoxyethylaniline and their sulfates, hydrochlorides or p-toluenesulfonates, etc. An aqueous solution of a p-phenylenediamine-based compound or the like can be used, and can be appropriately selected depending on the composition of the resin composition and the like.
Antifoaming agents and surfactants may be added to these alkaline aqueous solutions, if necessary.
Further, in the present embodiment, it is preferable to wash the substrate with water after alkaline development with an alkaline aqueous solution and before baking to remove the alkaline aqueous solution and dry the substrate.
塗布膜の露光部分を加熱する時間は、塗布膜の露光部分を加熱する温度、塗布膜の厚み、樹脂組成物の組成などに応じて適宜選択することができ、例えば、10分~4時間とすることができ、好ましくは20分~2時間である。 The temperature for heating the exposed portion of the coating film is preferably 50 ° C. or higher, more preferably 60 ° C. or higher, and even more preferably 70 ° C. or higher. When the temperature at which the exposed portion of the coating film is heated is 50 ° C. or higher, the copolymer (A) and the reactive diluent (C) are sufficiently crosslinked, so that the solvent resistance of the coloring pattern becomes good, which is good. A pattern shape is obtained. Further, when the temperature for heating the exposed portion of the coating film is 50 ° C. or higher, the exposed portion of the coating film can be heated in a short time, and a colored pattern can be efficiently produced.
The time for heating the exposed portion of the coating film can be appropriately selected depending on the temperature for heating the exposed portion of the coating film, the thickness of the coating film, the composition of the resin composition, and the like, for example, 10 minutes to 4 hours. It can be done, preferably 20 minutes to 2 hours.
以上の工程により、本実施形態のカラーフィルターが得られる。 Next, a protective film is formed by a known method on a coloring pattern that becomes a black matrix and three coloring patterns that form each pixel.
By the above steps, the color filter of the present embodiment can be obtained.
次に、本実施形態の画像表示素子について説明する。
本実施形態の画像表示素子としての液晶表示素子としては、例えば、表面にカラーフィルターと第1電極とが形成された第1基板と、表面に第2電極が形成された第2基板とを、第1電極と第2電極とをスペーサーを介して対向させて配置し、第1基板と第2基板と間に液晶組成物を挟持させたものが挙げられる。
本実施形態の液晶表示素子においては、カラーフィルターとして、本実施形態のカラーフィルターを具備する。本実施形態の液晶表示素子において、カラーフィルター以外の部材については、公知のものを用いることができる。 <Image display element>
Next, the image display element of this embodiment will be described.
As the liquid crystal display element as the image display element of the present embodiment, for example, a first substrate having a color filter and a first electrode formed on the surface and a second substrate having a second electrode formed on the surface thereof can be used. Examples thereof include a device in which a first electrode and a second electrode are arranged so as to face each other via a spacer, and a liquid crystal composition is sandwiched between the first substrate and the second substrate.
The liquid crystal display element of the present embodiment includes the color filter of the present embodiment as the color filter. In the liquid crystal display element of the present embodiment, known members other than the color filter can be used.
まず、第1基板上に、カラーフィルターと第1電極とをこの順に形成する。カラーフィルターは、上述した製造方法を用いて形成できる。第1電極は、公知の方法を用いて形成できる。
次に、第2基板上に公知の方法により、第2電極とスペーサーとを形成する。
その後、第1基板と第2基板とを、第1電極と第2電極とを対向させて配置して張り合わせ、第1基板と第2基板と間に液晶組成物を注入し、封止する。
以上の工程により、本実施形態の液晶表示素子が得られる。 The liquid crystal display element of the present embodiment can be manufactured, for example, by using the manufacturing method shown below.
First, a color filter and a first electrode are formed on the first substrate in this order. The color filter can be formed by using the manufacturing method described above. The first electrode can be formed by using a known method.
Next, the second electrode and the spacer are formed on the second substrate by a known method.
After that, the first substrate and the second substrate are arranged and bonded with the first electrode and the second electrode facing each other, and the liquid crystal composition is injected and sealed between the first substrate and the second substrate.
By the above steps, the liquid crystal display element of the present embodiment can be obtained.
攪拌装置、滴下ロート、コンデンサー、温度計及びガス導入管を備えたフラスコに、溶剤(B-1)としての207.7gのプロピレングリコールモノメチルエーテル(三協化学株式会社製)を入れ、窒素ガス置換しながら攪拌し、78℃に昇温した(溶剤加熱工程(I))。 [Synthesis Example 1]
207.7 g of propylene glycol monomethyl ether (manufactured by Sankyo Chemical Co., Ltd.) as a solvent (B-1) was placed in a flask equipped with a stirrer, a dropping funnel, a condenser, a thermometer and a gas introduction tube, and replaced with nitrogen gas. While stirring, the temperature was raised to 78 ° C. (solvent heating step (I)).
また、50.2g(20モル%)のMOI-BPと、26.0g(20モル%)の2-ヒドロキシエチルメタクリレートと、12.9g(15モル%)のメタクリル酸と、82.8g(45モル%)の2-エチルヘキシルアクリレート(2EHA)とを、溶剤(B-2)としての61.8gのプロピレングリコールモノメチルエーテルに溶解させてから混合し、モノマー溶液とした。
その後、78℃に昇温した溶剤を入れた前記フラスコ中に、フラスコ中の溶剤(B-1)を攪拌しながら、重合開始剤溶液とモノマー溶液とを、それぞれ滴下ロートを用いて同時に滴下して混合溶液とする、滴下重合を行った(滴下重合工程(II))。滴下速度は、重合開始剤溶液およびモノマー溶液ともに1.7ml/分とした。 Next, 20.6 g of 2,2'-azobis (2,4-dimethylvaleronitrile) (polymerization initiator) was dissolved in 79.1 g of propylene glycol monomethyl ether as a solvent (B-2). A polymerization initiator solution was used.
Also, 50.2 g (20 mol%) of MOI-BP, 26.0 g (20 mol%) of 2-hydroxyethyl methacrylate, 12.9 g (15 mol%) of methacrylic acid, and 82.8 g (45). 2-Ethylhexyl acrylate (2EHA) (mol%) was dissolved in 61.8 g of propylene glycol monomethyl ether as a solvent (B-2) and then mixed to obtain a monomer solution.
Then, while stirring the solvent (B-1) in the flask, the polymerization initiator solution and the monomer solution were simultaneously added dropwise using a dropping funnel into the flask containing the solvent heated to 78 ° C. The drop polymerization was carried out to prepare a mixed solution (drop polymerization step (II)). The dropping rate was 1.7 ml / min for both the polymerization initiator solution and the monomer solution.
このようにして得られた共重合体(A)を含む反応液に、溶剤以外の成分が35質量%となるように、溶剤(B)としてのプロピレングリコールモノメチルエーテルを加え、合成例1の重合体組成物を得た。 After completion of the dropping, the mixed solution was reacted at 78 ° C. for 3 hours while stirring to form the copolymer (A) (post-polymerization step (III)).
Propylene glycol monomethyl ether as the solvent (B) was added to the reaction solution containing the copolymer (A) thus obtained so that the content other than the solvent was 35% by mass, and the weight of Synthesis Example 1 was increased. A coalesced composition was obtained.
表1、表2に記載の材料を、表1、表2に記載の割合で使用したこと以外は、合成例1と同様にして、合成例2~6、比較合成例1~3の重合体組成物を得た。 [Synthesis Examples 2 to 6, Comparative Synthesis Examples 1 to 3]
Polymers of Synthesis Examples 2 to 6 and Comparative Synthesis Examples 1 to 3 in the same manner as in Synthesis Example 1 except that the materials shown in Tables 1 and 2 were used in the proportions shown in Tables 1 and 2. The composition was obtained.
また、表1、表2において、(ブロックイソシアナト基の当量数)は、共重合体(A)の分子中に含まれるブロックイソシアナト基の当量数を示す。 In Tables 1 and 2, (ma) represents a monomer having a blocked isocyanate group. (Mb) represents a hydroxy group-containing monomer. (Mc) indicates an acid group-containing monomer. (D) indicates other monomers that do not correspond to (ma), (mb), and (mc).
Further, in Tables 1 and 2, (equivalent number of block isocyanate groups) indicates the number of equivalents of block isocyanate groups contained in the molecule of the copolymer (A).
・MOI-BP:カレンズ(登録商標)MOI-BP(2-[(3,5-ジメチルピラゾリル)カルボニルアミノ]エチルメタクリレート、昭和電工株式会社製)
・MOI-BM:カレンズ(登録商標)MOI-BM(2-「0-(1‘-メチルプロピリデンアミノ)カルボキシアミノ]エチルメタクリラート、昭和電工株式会社製)
・4-ヒドロキシブチルアクリレート(三菱ケミカル株式会社製)
・2-ヒドロキシエチルメタクリレート(共栄社化学株式会社製)
・メタクリル酸(クラレ会社製)
・アクリル酸(東亜合成株式会社製) The materials used in Tables 1 and 2 are as follows.
MOI-BP: Karenz (registered trademark) MOI-BP (2-[(3,5-dimethylpyrazolyl) carbonylamino] ethyl methacrylate, manufactured by Showa Denko KK)
MOI-BM: Karenz (registered trademark) MOI-BM (2-"0- (1'-methylpropanolamino) carboxyamino] ethylmethacrylate, manufactured by Showa Denko KK)
・ 4-Hydroxybutyl acrylate (manufactured by Mitsubishi Chemical Corporation)
・ 2-Hydroxyethyl methacrylate (manufactured by Kyoeisha Chemical Co., Ltd.)
・ Methacrylic acid (manufactured by Kuraray)
・ Acrylic acid (manufactured by Toagosei Co., Ltd.)
・TCDMA:トリシクロ[5.2.1.02,6]デカニル-8-メタクリレート(日立化成会社製)
・GMA:グリシジルメタクリレート(日油株式会社製) ・ 2EHA: 2-Ethylhexyl acrylate (manufactured by Toagosei Co., Ltd.)
-TCDMA: Tricyclo [5.2.1.0 2,6 ] decanyl-8-methacrylate (manufactured by Hitachi Chemical Co., Ltd.)
・ GMA: Glycidyl methacrylate (manufactured by NOF CORPORATION)
合成例1~6、比較合成例1~3の重合体組成物に含まれる共重合体(A)について、それぞれ重量平均分子量(Mw)を測定した。
重量平均分子量は、ゲルパーミエーションクロマトグラフィー(GPC)を用いて、下記条件にて測定した標準ポリスチレン換算の重量平均分子量である。
カラム:ショウデックス(登録商標)LF-804+LF-804(昭和電工株式会社製)
カラム温度:40℃
試料:共重合体の0.2質量%テトラヒドロフラン溶液
展開溶媒:テトラヒドロフラン
検出器:示差屈折計(ショウデックス(登録商標)RI-71S)(昭和電工株式会社製)
流速:1mL/min <Weight average molecular weight (Mw)>
The weight average molecular weight (Mw) of each of the copolymers (A) contained in the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 was measured.
The weight average molecular weight is a standard polystyrene-equivalent weight average molecular weight measured under the following conditions using gel permeation chromatography (GPC).
Column: Showdex (registered trademark) LF-804 + LF-804 (manufactured by Showa Denko KK)
Column temperature: 40 ° C
Sample: 0.2 mass% tetrahydrofuran solution of copolymer Developing solvent: Tetrahydrofuran Detector: Differential refractometer (SHODEX (registered trademark) RI-71S) (manufactured by Showa Denko KK)
Flow velocity: 1 mL / min
合成例1~6、比較合成例1~3の重合体組成物をガラス基板に塗布し、50℃、減圧下にて24時間乾燥させた。その後、アセトンに再溶解し、再度50℃、減圧下にて24時間乾燥させた。このようにして揮発成分を除去した共重合体溶液の固形分について、DSC(示差走査熱量計法、測定機器:セイコーDSC6200)を用いて、窒素気流下、昇温速度10℃/minでJIS-K7121に準拠し測定した(中間点ガラス転移点)。得られた結果を共重合体(A)のガラス転移温度(Tg)とした。 <Glass transition temperature (Tg)>
The polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 were applied to a glass substrate and dried at 50 ° C. under reduced pressure for 24 hours. Then, it was redissolved in acetone and dried again at 50 ° C. under reduced pressure for 24 hours. Regarding the solid content of the copolymer solution from which the volatile components have been removed in this manner, using DSC (differential scanning calorimetry, measuring instrument: Seiko DSC6200), JIS- at a temperature rise rate of 10 ° C./min under a nitrogen stream. Measured according to K7121 (midpoint glass transition point). The obtained result was taken as the glass transition temperature (Tg) of the copolymer (A).
調整後、溶剤以外の成分が35質量%である合成例1~6、比較合成例1~3の重合体組成物をガラス容器に等量ずつ計り取り、ほこりなどが入らないように蓋をし、サンプルとした。各サンプルの粘度を測定した後、それぞれ12℃に保った恒温器の中に3ヶ月間静置した。そして、3ヶ月間静置した各サンプルの粘度を測定した。なお粘度の測定はE型粘度計(RE-80L、東機産業製、コーンNo.3)を使用して25℃、回転数10rpmで行った。 <Storage stability>
After the adjustment, weigh the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 in which the components other than the solvent are 35% by mass in equal amounts in a glass container, and cover them with a lid to prevent dust from entering. , As a sample. After measuring the viscosity of each sample, it was allowed to stand in an incubator kept at 12 ° C. for 3 months. Then, the viscosity of each sample left to stand for 3 months was measured. The viscosity was measured using an E-type viscometer (RE-80L, manufactured by Toki Sangyo, Cone No. 3) at 25 ° C. and a rotation speed of 10 rpm.
◎(優):増粘率10%以下
〇(良):増粘率10.1%~20%
△(劣):増粘率20.1%以上 For each sample, the viscosity increase rate of the viscosity after standing for 3 months with respect to the viscosity before standing in the incubator {(1- (Viscosity after standing for 3 months / Viscosity before standing) Viscosity)) × 100 (%)} was calculated and evaluated according to the criteria shown below.
◎ (excellent): thickening rate 10% or less 〇 (good): thickening rate 10.1% to 20%
△ (inferior): thickening rate of 20.1% or more
これに対し、表2に示すように、比較合成例1、2の重合体組成物は、保存安定性の評価が△(劣)であり、保存により硬化はしなかったが、実施例の結果と比べて粘度が高くなり、保存安定性が不十分であった。 As shown in Tables 1 and 2, the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Example 3 were all evaluated for storage stability as ⊚ (excellent) or ○ (good), and were excellent in storage. It was confirmed that it had stability.
On the other hand, as shown in Table 2, the polymer compositions of Comparative Synthesis Examples 1 and 2 had an evaluation of storage stability of Δ (inferior) and were not cured by storage, but the results of Examples were obtained. The viscosity was higher than that of the above, and the storage stability was insufficient.
合成例1~6、比較合成例1~3の重合体組成物の酸価をそれぞれ測定し、共重合体(A)の酸価とした。
JIS K6901 5.3に従って測定した硬化性ポリマーの酸価である。すなわち、酸価は、共重合体1g中に含まれる酸性成分を中和するのに要する水酸化カリウムのmg数を意味する。 <Acid value>
The acid values of the polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 were measured and used as the acid value of the copolymer (A).
The acid value of the curable polymer measured according to JIS K6901 5.3. That is, the acid value means the number of mg of potassium hydroxide required to neutralize the acidic component contained in 1 g of the copolymer.
表1、表2に示す合成例1~6、比較合成例1~3の重合体組成物と、(B)溶剤としてのプロピレングリコールモノメチルエーテルアセテートと、(C)反応性希釈剤としてのジペンタエリスリトールペンタアクリレートとジペンタエリスリトールヘキサアクリレートとの混合物(カヤラッドDPHA、日本化薬社製)と、(D)光重合開始剤としてのエタノン,1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-,1-(o-アセチルオキシム)(BASFジャパン株式会社製)と、(E)着色剤としての染料(VALIFAST BLUE 2620)とを、それぞれ表3に示す割合で混合し、実施例1~6、比較例1~3の樹脂組成物を調製した。 [Examples 1 to 6, Comparative Examples 1 to 3]
The polymer compositions of Synthesis Examples 1 to 6 and Comparative Synthesis Examples 1 to 3 shown in Tables 1 and 2, (B) propylene glycol monomethyl ether acetate as a solvent, and (C) dipenta as a reactive diluent. A mixture of erythritol pentaacrylate and dipentaerythritol hexaacrylate (Kayarad DPHA, manufactured by Nippon Kayaku Co., Ltd.) and (D) etanone as a photopolymerization initiator, 1- [9-ethyl-6- (2-methylbenzoyl)). The ratios of -9H-carbazole-3-yl]-, 1- (o-acetyloxime) (manufactured by BASF Japan Co., Ltd.) and (E) dye as a colorant (VALIFAST BLUE 2620) are shown in Table 3, respectively. The resin compositions of Examples 1 to 6 and Comparative Examples 1 to 3 were prepared.
表3に示す溶剤(B)の量は、重合体組成物中に含まれる溶剤(プロピレングリコールモノメチルエーテル)と、樹脂組成物の製造時に添加した溶剤(プロピレングリコールモノメチルエーテルアセテート)とを合算した量である。表3に示す溶剤(B)中におけるヒドロキシ基含有溶剤の含有割合は、79.1質量%である。 The copolymer (A) shown in Table 3 does not include the amount of the solvent contained in the reaction solution used for producing the copolymer (A).
The amount of the solvent (B) shown in Table 3 is the sum of the solvent contained in the polymer composition (propylene glycol monomethyl ether) and the solvent added during the production of the resin composition (propylene glycol monomethyl ether acetate). Is. The content ratio of the hydroxy group-containing solvent in the solvent (B) shown in Table 3 is 79.1% by mass.
(1)アルカリ現像性
実施例および比較例の樹脂組成物をそれぞれ、縦5cm、横5cmの平面視正方形のガラス基板(無アルカリガラス基板)上に、露光後の厚さが2.5μmとなるようにスピンコートして塗布膜を形成した。次いで、100℃で3分間加熱することにより塗布膜中の溶剤を揮発させて除去した。 The resin compositions of Examples 1 to 6 and Comparative Examples 1 to 3 were evaluated for alkali developability and solvent resistance by the methods shown below.
(1) Alkaline Developability The resin compositions of Examples and Comparative Examples are placed on a square glass substrate (non-alkali glass substrate) having a length of 5 cm and a width of 5 cm, respectively, and have a thickness of 2.5 μm after exposure. The coating film was formed by spin coating as described above. Then, the solvent in the coating film was volatilized and removed by heating at 100 ° C. for 3 minutes.
次に、0.1質量%の炭酸ナトリウムを含む水溶液を23℃の温度及び0.3MPaの圧力でスプレーし、未露光部分を溶解して現像した。その後、100℃で20分間ベーキングすることで所定のパターンを形成した。 Next, a photomask having a predetermined pattern is placed at a distance of 100 μm from the coating film, and the coating film is exposed to ultraviolet rays having a wavelength of 365 nm at an energy dose of 40 mJ / cm 2 through the photomask to expose the exposed portion. It was photocured.
Next, an aqueous solution containing 0.1% by mass of sodium carbonate was sprayed at a temperature of 23 ° C. and a pressure of 0.3 MPa to dissolve and develop the unexposed portion. Then, it was baked at 100 ° C. for 20 minutes to form a predetermined pattern.
○(良):未露光部分の残渣なし
×(不可):未露光部分の残渣あり Then, by observing the pattern after alkaline development using an electron microscope S-3400 manufactured by Hitachi High-Technologies Corporation, the residue after alkaline development was confirmed and evaluated according to the criteria shown below. The results are shown in Table 4.
○ (Good): No residue in the unexposed part × (No): Residue in the unexposed part
実施例および比較例の樹脂組成物をそれぞれ、縦5cm、横5cmの平面視正方形のガラス基板(無アルカリガラス基板)上に、露光後の厚さが2.5μmとなるようにスピンコートして塗布膜を形成した。次いで、100℃で3分間加熱することにより塗布膜中の溶剤を揮発させて除去した。 (2) Solvent resistance The resin compositions of Examples and Comparative Examples are placed on a square glass substrate (non-alkali glass substrate) having a length of 5 cm and a width of 5 cm, respectively, and have a thickness of 2.5 μm after exposure. The coating film was formed by spin coating as described above. Then, the solvent in the coating film was volatilized and removed by heating at 100 ° C. for 3 minutes.
作成した硬化膜を、20gのプロピレングリコールモノメチルエーテルに23℃で15分間浸漬した。硬化膜の浸漬前後の色変化(ΔEab)を分光光度計UV-1650PC(株式会社島津製作所製)にて測定し、その結果に基づいて耐溶剤性の評価を行った。その結果を表4に示す。なお浸漬前後の色変化は値が小さい方が良い。 Next, the coating film was exposed to ultraviolet rays having a wavelength of 365 nm at an energy dose of 40 mJ / cm 2 , and the exposed portion was photocured. Then, the coating film was cured by baking at 80 ° C. for 30 minutes or at 100 ° C. for 20 minutes to obtain a cured film.
The prepared cured membrane was immersed in 20 g of propylene glycol monomethyl ether at 23 ° C. for 15 minutes. The color change (ΔEab) before and after immersion of the cured film was measured with a spectrophotometer UV-1650PC (manufactured by Shimadzu Corporation), and the solvent resistance was evaluated based on the results. The results are shown in Table 4. The smaller the value, the better the color change before and after immersion.
また、実施例1~6の樹脂組成物を硬化させて得た硬化膜は、塗布膜を硬化させる温度を80℃、時間を30分間とした場合と、温度を100℃、時間を20分間とした場合のいずれにおいても、ΔEabが2未満であり、耐溶剤性が良好であった。 As shown in Table 4, the cured films obtained by curing the resin compositions of Examples 1 to 6 had a good evaluation of alkali developability.
Further, in the cured film obtained by curing the resin compositions of Examples 1 to 6, the temperature for curing the coating film was 80 ° C. and the time was 30 minutes, and the temperature was 100 ° C. and the time was 20 minutes. In all of these cases, ΔEab was less than 2, and the solvent resistance was good.
本発明の樹脂組成物は、透明膜、保護膜、絶縁膜、オーバーコート、フォトスペーサー、ブラックマトリックス、ブラックカラムスペーサー、カラーフィルター用のレジストなどの材料として、幅広い用途に好ましく用いることができる。 According to the present invention, a resin composition capable of obtaining a cured product having good alkali developability when used as a photosensitive material, excellent storage stability, and excellent solvent resistance even when cured at a low temperature. A product, a copolymer useful for preparing the resin composition, and a method for producing the copolymer are provided. Further, according to the present invention, a coloring pattern made of a cured product of a resin composition, which has good alkaline developability and a cured product having excellent solvent resistance even when cured at a low temperature, and a color filter having the same. And an image display element including the color filter thereof.
The resin composition of the present invention can be preferably used in a wide range of applications as a material such as a transparent film, a protective film, an insulating film, an overcoat, a photo spacer, a black matrix, a black column spacer, and a resist for a color filter.
Claims (15)
- ピラゾール化合物でブロックされたブロックイソシアナト基を有する構成単位(a)と、
ヒドロキシ基を有する構成単位(b)と、
酸基を有する構成単位(c)とを含有し、
ガラス転移温度が30℃以下であることを特徴とする共重合体。 A structural unit (a) having a blocked isocyanato group blocked with a pyrazole compound, and
The structural unit (b) having a hydroxy group and
Containing a structural unit (c) having an acid group,
A copolymer characterized by having a glass transition temperature of 30 ° C. or lower. - 前記構成単位(b)が、ヒドロキシアルキル(メタ)アクリレートに由来する構成単位である、請求項1に記載の共重合体。 The copolymer according to claim 1, wherein the structural unit (b) is a structural unit derived from hydroxyalkyl (meth) acrylate.
- 前記構成単位(c)が、不飽和カルボン酸に由来する構成単位である、請求項1または請求項2に記載の共重合体。 The copolymer according to claim 1 or 2, wherein the structural unit (c) is a structural unit derived from an unsaturated carboxylic acid.
- 前記構成単位(a)が、前記ブロックイソシアナト基と、(メタ)アクリロイルオキシ基とを有する化合物に由来する構成単位である、請求項1~請求項3のいずれか一項に記載の共重合体。 The copolymer according to any one of claims 1 to 3, wherein the structural unit (a) is a structural unit derived from a compound having the block isocyanate group and the (meth) acryloyloxy group. Combined.
- 前記構成単位(a)を1~45モル%、前記構成単位(b)を1~50モル%、前記構成単位(c)を1~60モル%含有する、請求項1~請求項4のいずれか一項に記載の共重合体。 Any of claims 1 to 4, wherein the structural unit (a) is contained in an amount of 1 to 45 mol%, the structural unit (b) is contained in an amount of 1 to 50 mol%, and the structural unit (c) is contained in an amount of 1 to 60 mol%. The copolymer according to claim 1.
- 重量平均分子量が1000~50000である、請求項1~請求項5のいずれか一項に記載の共重合体。 The copolymer according to any one of claims 1 to 5, wherein the weight average molecular weight is 1000 to 50,000.
- 請求項1~請求項6のいずれか一項に記載の共重合体(A)と、溶剤(B)とを含有し、
前記溶剤(B)が、ヒドロキシ基含有溶剤を含むことを特徴とする樹脂組成物。 The copolymer (A) according to any one of claims 1 to 6 and the solvent (B) are contained.
A resin composition, wherein the solvent (B) contains a hydroxy group-containing solvent. - 反応性希釈剤(C)および光重合開始剤(D)をさらに含有する、請求項7に記載の樹脂組成物。 The resin composition according to claim 7, further comprising a reactive diluent (C) and a photopolymerization initiator (D).
- 着色剤(E)をさらに含有する、請求項8に記載の樹脂組成物。 The resin composition according to claim 8, further containing the colorant (E).
- 前記共重合体(A)と前記反応性希釈剤(C)との合計量100質量部に対して、
前記共重合体(A)が10~90質量部、
前記溶剤(B)が30~1000質量部、
前記反応性希釈剤(C)が10~90質量部、
前記光重合開始剤(D)が0.1~30質量部、
前記着色剤(E)が3~80質量部含有される、請求項9に記載の樹脂組成物。 With respect to 100 parts by mass of the total amount of the copolymer (A) and the reactive diluent (C).
The copolymer (A) is 10 to 90 parts by mass,
30 to 1000 parts by mass of the solvent (B),
10 to 90 parts by mass of the reactive diluent (C),
0.1 to 30 parts by mass of the photopolymerization initiator (D),
The resin composition according to claim 9, wherein the colorant (E) is contained in an amount of 3 to 80 parts by mass. - 請求項9または請求項10に記載の樹脂組成物の硬化物からなる着色パターンを有することを特徴とするカラーフィルター。 A color filter having a coloring pattern made of a cured product of the resin composition according to claim 9 or 10.
- 請求項11に記載のカラーフィルターを具備することを特徴とする画像表示素子。 An image display element comprising the color filter according to claim 11.
- 溶剤(B-1)を60~90℃に昇温する溶剤加熱工程(I)と、
ピラゾール化合物でブロックされたブロックイソシアナト基を有するモノマー(m-a)と、ヒドロキシ基含有モノマー(m-b)と、酸基含有モノマー(m-c)とを、昇温した前記溶剤(B-1)に滴下するとともに、
重合開始剤を溶剤(B-2)に溶解させた重合開始剤溶液を、前記溶剤(B-1)に滴下して混合溶液とする滴下重合工程(II)と、
前記混合溶液を攪拌しながら、60~90℃で1~5時間反応させる後重合工程(III)とを有し、
前記溶剤(B-1)と前記溶剤(B-2)のいずれか一方または両方が、ヒドロキシ基含有溶剤を含有することを特徴とする共重合体の製造方法。 The solvent heating step (I) for raising the temperature of the solvent (B-1) to 60 to 90 ° C.
The solvent (B) in which the temperature of the monomer (ma) having a blocked isocyanato group blocked by the pyrazole compound, the hydroxy group-containing monomer (mb), and the acid group-containing monomer (mc) was heated. In addition to dropping in -1)
A dropping polymerization step (II) in which a polymerization initiator solution in which a polymerization initiator is dissolved in a solvent (B-2) is added dropwise to the solvent (B-1) to form a mixed solution.
It has a post-polymerization step (III) in which the mixed solution is reacted at 60 to 90 ° C. for 1 to 5 hours while stirring.
A method for producing a copolymer, wherein one or both of the solvent (B-1) and the solvent (B-2) contains a hydroxy group-containing solvent. - 前記溶剤加熱工程(I)において、前記溶剤(B-1)に連鎖移動剤を入れてから昇温する、請求項13に記載の共重合体の製造方法。 The method for producing a copolymer according to claim 13, wherein in the solvent heating step (I), a chain transfer agent is added to the solvent (B-1) and then the temperature is raised.
- 前記後重合工程(III)により、
ピラゾール化合物でブロックされたブロックイソシアナト基を有する構成単位(a)と、ヒドロキシ基を有する構成単位(b)と、酸基を有する構成単位(c)とを含有し、ガラス転移温度が30℃以下である共重合体が得られる、請求項13に記載の共重合体の製造方法。 By the post-polymerization step (III)
It contains a structural unit (a) having a blocked isocyanato group blocked by a pyrazole compound, a structural unit (b) having a hydroxy group, and a structural unit (c) having an acid group, and has a glass transition temperature of 30 ° C. The method for producing a copolymer according to claim 13, wherein the following copolymer can be obtained.
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