WO2022127457A1 - Led device for visible light communication - Google Patents

Led device for visible light communication Download PDF

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Publication number
WO2022127457A1
WO2022127457A1 PCT/CN2021/130180 CN2021130180W WO2022127457A1 WO 2022127457 A1 WO2022127457 A1 WO 2022127457A1 CN 2021130180 W CN2021130180 W CN 2021130180W WO 2022127457 A1 WO2022127457 A1 WO 2022127457A1
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led
light
micro
visible light
layer
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PCT/CN2021/130180
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French (fr)
Chinese (zh)
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李国强
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河源市众拓光电科技有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission
    • H01L27/153Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission in a repetitive configuration, e.g. LED bars
    • H01L27/156Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components with at least one potential-jump barrier or surface barrier specially adapted for light emission in a repetitive configuration, e.g. LED bars two-dimensional arrays
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B10/00Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
    • H04B10/11Arrangements specific to free-space transmission, i.e. transmission through air or vacuum
    • H04B10/114Indoor or close-range type systems
    • H04B10/116Visible light communication
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04BTRANSMISSION
    • H04B10/00Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
    • H04B10/50Transmitters
    • H04B10/501Structural aspects
    • H04B10/502LED transmitters

Definitions

  • the invention relates to the technical field of visible light communication, in particular to a visible light communication LED device.
  • LED As a new type of green solid-state light source, compared with traditional incandescent lamps and energy-saving lamps, LED has excellent characteristics such as low power consumption and long life, and has strong competitiveness in the field of lighting. Its influence has also penetrated into the global economy, Various fields of science and technology have brought earth-shaking changes to human life.
  • visible light communication uses light as the transmission medium, which has good security, strong anti-electromagnetic interference, high communication rate, rich spectrum resources, and white light and radio frequency signals do not interfere with each other, and can coexist with wireless communication networks. compatible.
  • the purpose of the present invention is to provide a visible light communication LED device with high modulation bandwidth and satisfying communication and lighting functions at the same time.
  • the present invention realizes above-mentioned purpose through following technical means:
  • a visible light communication LED device by integrating a plurality of individually addressable microarray LED chips, the plurality of LED chips are divided into LED chip regions of different light colors, and the light and dark of the chips in different regions are alternated to realize signal identification.
  • the visible light communication LED device includes four different LED chip areas, which are the red microarray LED R area, the green microarray LED G area, the blue microarray LED B area and the white light LED RGB area.
  • the chip selected for the R region is an N ⁇ N matrix addressing array of micro-array LEDs, the p-electrodes of 2N micro-LED units in every two rows are connected to each other, and all the micro-LED units share n-electrodes.
  • the chips selected for the R, G, and B regions are micro-array LEDs with an N ⁇ N matrix addressing array.
  • the n electrodes of 2N micro LED units in every two rows are connected to each other, and the p electrodes of the micro LED units in every two columns are connected. Electrodes are interconnected.
  • the diameter of a single light-emitting unit of the micro LED is 100-200um, the distance between adjacent micro LED units is 50um, and the side length of the rectangular pad metal layer is 50um.
  • GaN material is selected for the blue light B region and the green light G region, and the LED structure is grown on the sapphire substrate by using MOCVD technology.
  • MOCVD technology MOCVD technology.
  • the micro LED devices in the array are electrically isolated from each other, and the p-GaN layer, the AlGaN current blocking layer and the InGaN/GaN multiple quantum well layer are removed in the selected part of the etching. Until the n-GaN layer is exposed; the diameter of the outer n-GaN layer region is 100um, and the diameter of the inner p-GaN layer region is 50um;
  • the two annular regions were again exposed by photolithography, Cr/Pd/Au metal stacks were deposited by e-beam evaporation as p-type and n-type electrodes, and rapidly annealed in a N atmosphere at 200 °C for 2 min.
  • the inner diameter difference of the n electrodes is all 5um.
  • the R, G and B regions meet the requirements of different wavelengths of emitted light, wherein the wavelength of the red light in the R region is 600-620 nm, the wavelength of the green light in the G region is 520-540 nm, and the wavelength of the blue light in the B region is 440-460 nm .
  • the white light area is a high-power RGB type white light LED chip to meet daily lighting requirements.
  • the micro-array LED chips in different areas of the R, G, and B area arrays can be controlled separately to transmit different data and be received by multiple photodetectors.
  • different signals are amplified by the driver and then loaded on the chips in the three regions of R, G, and B through the DC biaser, and the three beams of different colors are Coupling in space and transmission in space; at the receiving end, red, green and blue filters are used to select signals of different wavelengths, and then the receiving circuit performs signal acquisition and back-end processing to realize signal identification and data transmission .
  • the beneficial effects of the present invention at least include:
  • the microarray LEDs in the R, G, and B areas have a large modulation bandwidth and can realize high-speed data transmission;
  • red, green and blue wavelength division multiplexing technology can improve the transmission capacity of the visible light communication system
  • FIG. 1 is a top-view structural schematic diagram of a microarray LED integrated chip according to an embodiment of the present invention
  • FIG. 2 is a schematic structural diagram of a microarray LED in regions R, G, and B according to an embodiment of the present invention
  • FIG. 3 is a schematic top-view structural diagram of a microarray LED chip in the R region according to an embodiment of the present invention.
  • FIG. 4 is a schematic cross-sectional view of a microarray LED chip in regions G and B according to an embodiment of the present invention
  • FIG. 5 is a schematic top-view structural diagram of a single microarray LED chip in areas G and B according to an embodiment of the present invention
  • FIG. 6 is a top-view structural schematic diagram of the interconnection of row electrodes of microarray LED chips in regions G and B of the embodiment of the present invention.
  • FIG. 7 is a schematic top-view structural diagram of the interconnection of column electrodes of microarray LED chips in regions G and B of the embodiment of the present invention.
  • FIG. 8 is a schematic cross-sectional view of the interconnection of column electrodes of microarray LED chips in regions G and B of the embodiment of the present invention.
  • the red light R area 1 and FIG. 2 by integrating a plurality of individually addressable LED chips by microarrays, they are the red light R area 1, the green light G area 2, the blue light B area 3 and the white light RGB area 4.
  • the chips selected for R, G, and B areas are micro-array LEDs of 8 ⁇ 8 matrix addressing arrays, and the white light areas are high-power RGB white light LED chips.
  • a typical AlGaInP red light LED chip is selected for the red light R region, wherein the wavelength of the red light in the R region is 600-620 nm.
  • the photolithography process and the inductively coupled plasma etching process are used to electrically isolate the micro-LED devices in the array from each other to form an 8 ⁇ 8 micro-array LED array with a size of 100um.
  • a pad metal layer is deposited in the rectangular area surrounded by 2 ⁇ 2 micro-LED units, and interconnected with the p-electrodes of the surrounding 4 micro-LED units. 16 micro-LED units can be controlled together, and the row of pad contacts is used to connect the positive pole of the power supply. All the microarray LEDs in the array share the n-pole, and an n-pad contact layer is drawn out on the bottom of the chip to connect the negative pole of the power supply.
  • the blue light B area and the green light G area are made of GaN material, and the LED structure is grown on the sapphire substrate using MOCVD technology.
  • the sapphire substrate 5 and the undoped GaN buffer are respectively Layer 6 , n-GaN layer 7 , InGaN/GaN multiple quantum well layer 8 , AlGaN current blocking layer 9 , p-GaN layer 10 .
  • the wavelength of the green light in the G region is 520-540 nm
  • the wavelength of the blue light in the B region is 440-460 nm.
  • the micro LED devices in the array are electrically isolated from each other, and the p-GaN layer, the AlGaN current blocking layer and the InGaN/GaN multiple quantum well layer are removed in the selected part of the etching. until the n-GaN layer is exposed.
  • the diameter of the outer n-GaN layer region is 100um and the diameter of the inner p-GaN layer region is 50um.
  • a pad metal layer is deposited on the rectangular area surrounded by 2 ⁇ 2 micro-LED units, and interconnected with the n-electrodes of the surrounding 4 micro-LED units through n-type metal wires.
  • a row pad contact layer is drawn out, so that 16 micro-LED units in every two rows can be controlled together, and the row pad contact layer is used to connect the negative pole of the power supply.
  • the p-electrodes of 8 micro-LED monoliths in each column are electrode-interconnected, and a column pad contact layer is jointly drawn out for every two columns, so that the 16 micro-LED units are connected to each other. It can be controlled together, and the pad contact layer of this column is used to connect the positive pole of the power supply.
  • microarray LED chips are arranged in a certain structure and integrated on the substrate, not limited to four cores.
  • the invention utilizes the on-off key control technology and the pulse width modulation technology to control the micro-array LEDs with different light colors in different areas, so as to couple out different lights for signal identification and data transmission.
  • the visible light communication LED device of the present invention uses on-off key control technology and pulse width modulation technology to control the luminous conditions of microarray LEDs with different light colors in different regions, so that they can couple out different lights, and can realize high-speed data transmission through optical signals.
  • the device Compared with LED chips, the device has better modulation bandwidth, larger information transmission capacity, and can meet lighting needs at the same time.

Abstract

Disclosed is an LED device for visible light communication. A plurality of microarray and individually addressable LED chips are integrated; the plurality of LED chips are divided into LED chip areas of different light colors; and chips in different areas alternate between light and dark to achieve signal recognition. The LED device is composed of chips in four parts: R, G and B areas and a white-light area. The R, G and B areas have red, green and blue N*N microarray LED array chips respectively. A single chip is limited to 100-200 um in size, and has excellent modulation characteristics. The white-light area has a high-power RGB white-light LED chip. By using on-off key control and the technology of pulse width modulation, microarray LEDs in different areas alternate between light and dark to couple different types of light, and the light is recognized through a photoelectric detector at a receiving end and can be used for realizing a high-speed and stable visible light system. The present invention has a high modulation bandwidth, and can realize the functions of communication and illumination at the same time.

Description

一种可见光通信LED器件A visible light communication LED device 技术领域technical field
本发明涉及可见光通信技术领域,具体涉及一种可见光通信LED器件。The invention relates to the technical field of visible light communication, in particular to a visible light communication LED device.
背景技术Background technique
LED作为一种新型的绿色固态光源,相比于传统的白炽灯和节能灯,具有功耗小、寿命长等优异特性,在照明领域拥有强大的竞争力,其影响也已渗透到全球经济、科技的各个领域,给人类生活带来了天翻地覆的变化。As a new type of green solid-state light source, compared with traditional incandescent lamps and energy-saving lamps, LED has excellent characteristics such as low power consumption and long life, and has strong competitiveness in the field of lighting. Its influence has also penetrated into the global economy, Various fields of science and technology have brought earth-shaking changes to human life.
固态照明的普及推动了可见光通信的发展,利用LED响应速度快、易调制的特性,通信、照明两用的LED具有广阔的应用前景。相比于传统的无线电通信,可见光通信以光为传输媒介,安全性好、抗电磁干扰性强、通信速率高、频谱资源丰富,且白光与射频信号互不干扰,可以和无线通信网络共存与兼容。The popularity of solid-state lighting has promoted the development of visible light communication. Using the characteristics of fast response and easy modulation of LEDs, LEDs for both communication and lighting have broad application prospects. Compared with traditional radio communication, visible light communication uses light as the transmission medium, which has good security, strong anti-electromagnetic interference, high communication rate, rich spectrum resources, and white light and radio frequency signals do not interfere with each other, and can coexist with wireless communication networks. compatible.
发明内容SUMMARY OF THE INVENTION
有鉴于此,本发明的目的在于提出一种具有高调制带宽、同时满足通信、照明功能的可见光通信LED器件。In view of this, the purpose of the present invention is to provide a visible light communication LED device with high modulation bandwidth and satisfying communication and lighting functions at the same time.
本发明通过以下技术手段实现上述目的:The present invention realizes above-mentioned purpose through following technical means:
一种可见光通信LED器件,通过将多个微阵列可单独寻址的LED芯片集成在一起,多个LED芯片分成不同光色的LED芯片区域,利用不同区域的芯片明暗交替,来实现信号识别。A visible light communication LED device, by integrating a plurality of individually addressable microarray LED chips, the plurality of LED chips are divided into LED chip regions of different light colors, and the light and dark of the chips in different regions are alternated to realize signal identification.
作为优选地,所述可见光通信LED器件包括四块不同的LED芯片区域,分别为红光微阵列LED R区、绿光微阵列LED G区、蓝光微阵列LED B区和白光LED RGB区。Preferably, the visible light communication LED device includes four different LED chip areas, which are the red microarray LED R area, the green microarray LED G area, the blue microarray LED B area and the white light LED RGB area.
作为优选地,R区所选用的芯片为N×N矩阵寻址阵列的微阵列LED,每两 行2N个微型LED单元的p电极进行电极互联,所有微型LED单元共同引出n电极。Preferably, the chip selected for the R region is an N×N matrix addressing array of micro-array LEDs, the p-electrodes of 2N micro-LED units in every two rows are connected to each other, and all the micro-LED units share n-electrodes.
作为优选地,R、G、B区所选用的芯片为N×N矩阵寻址阵列的微阵列LED,每两行2N个微型LED单元的n电极进行电极互联,每两列微型LED单元的p电极进行电极互联。Preferably, the chips selected for the R, G, and B regions are micro-array LEDs with an N×N matrix addressing array. The n electrodes of 2N micro LED units in every two rows are connected to each other, and the p electrodes of the micro LED units in every two columns are connected. Electrodes are interconnected.
作为优选地,R、G、B区中,微型LED的单一发光单元的直径为100-200um,相邻微型LED单元的间距为50um,其中矩形pad金属层的边长为50um。Preferably, in the R, G and B regions, the diameter of a single light-emitting unit of the micro LED is 100-200um, the distance between adjacent micro LED units is 50um, and the side length of the rectangular pad metal layer is 50um.
作为优选地,蓝光B区与绿光G区选用GaN材料,利用MOCVD技术在蓝宝石衬底上生长LED结构,自下而上分别为蓝宝石衬底、非掺杂的GaN缓冲层、n-GaN层、InGaN/GaN多量子阱层、AlGaN电流阻挡层和p-GaN层;通过调节InGaN/GaN多量子阱的厚度以满足G、B区不同波长发射光的要求;Preferably, GaN material is selected for the blue light B region and the green light G region, and the LED structure is grown on the sapphire substrate by using MOCVD technology. , InGaN/GaN multiple quantum well layer, AlGaN current blocking layer and p-GaN layer; by adjusting the thickness of InGaN/GaN multiple quantum well to meet the requirements of different wavelengths of light emission in G and B regions;
利用光刻工艺与感应耦合等离子体刻蚀工艺,使阵列中微型LED器件之间相互电学隔离,并在刻蚀选区部分除去p-GaN层、AlGaN电流阻挡层和InGaN/GaN多量子阱层,直至暴露出n-GaN层;外部n-GaN层区域的直径为100um,内部p-GaN层区域的直径为50um;Using the photolithography process and the inductively coupled plasma etching process, the micro LED devices in the array are electrically isolated from each other, and the p-GaN layer, the AlGaN current blocking layer and the InGaN/GaN multiple quantum well layer are removed in the selected part of the etching. Until the n-GaN layer is exposed; the diameter of the outer n-GaN layer region is 100um, and the diameter of the inner p-GaN layer region is 50um;
再次利用光刻暴露出两个环形区域,通过电子束蒸发沉积Cr/Pd/Au金属叠层作为p型和n型电极,并在200℃的N 2气氛中快速退火2min,环形p电极与环形n电极的内径差均为5um。 The two annular regions were again exposed by photolithography, Cr/Pd/Au metal stacks were deposited by e-beam evaporation as p-type and n-type electrodes, and rapidly annealed in a N atmosphere at 200 °C for 2 min. The inner diameter difference of the n electrodes is all 5um.
作为优选地,R、G、B区满足不同波长发射光的要求,其中R区红光的波长为600~620nm,G区绿光的波长为520~540nm,B区蓝光的波长为440~460nm。Preferably, the R, G and B regions meet the requirements of different wavelengths of emitted light, wherein the wavelength of the red light in the R region is 600-620 nm, the wavelength of the green light in the G region is 520-540 nm, and the wavelength of the blue light in the B region is 440-460 nm .
作为优选地,白光区为大功率RGB型白光LED芯片,满足日常照明需求。Preferably, the white light area is a high-power RGB type white light LED chip to meet daily lighting requirements.
作为优选地,利用MIMO技术,R、G、B区阵列中不同区域的微阵列LED芯片可分别控制,发送不同数据,并由多个光电探测器接收。Preferably, using the MIMO technology, the micro-array LED chips in different areas of the R, G, and B area arrays can be controlled separately to transmit different data and be received by multiple photodetectors.
作为优选地,利用通断键控制和脉冲宽度调制技术,将不同的信号通过驱动器放大后通过直流偏置器加载到R、G、B这三个区域的芯片上,这三束不同 颜色的光束在空间耦合,并在空间传输;在接收端,采用红、绿、蓝三色滤光片将不同波长的信号选择出来,再由接收电路进行信号采集和后端处理,实现信号识别与数据传输。Preferably, using on-off key control and pulse width modulation technology, different signals are amplified by the driver and then loaded on the chips in the three regions of R, G, and B through the DC biaser, and the three beams of different colors are Coupling in space and transmission in space; at the receiving end, red, green and blue filters are used to select signals of different wavelengths, and then the receiving circuit performs signal acquisition and back-end processing to realize signal identification and data transmission .
与现有技术相比,本发明的有益效果至少包括:Compared with the prior art, the beneficial effects of the present invention at least include:
1、R、G、B区的微阵列LED调制带宽大,可实现高速的数据传输;1. The microarray LEDs in the R, G, and B areas have a large modulation bandwidth and can realize high-speed data transmission;
2、利用红、绿、蓝三色波分复用技术,可以提升可见光通信系统的传输容量;2. The use of red, green and blue wavelength division multiplexing technology can improve the transmission capacity of the visible light communication system;
3、白光区的大尺寸LED可以制备成功率器件,适用于LED灯照明领域。3. Large-size LEDs in the white light area can be prepared as high-efficiency devices, which are suitable for the field of LED lighting.
附图说明Description of drawings
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to illustrate the technical solutions in the embodiments of the present invention more clearly, the following briefly introduces the accompanying drawings used in the description of the embodiments. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without creative effort.
图1为本发明实施例微阵列LED集成芯片的俯视结构示意图;FIG. 1 is a top-view structural schematic diagram of a microarray LED integrated chip according to an embodiment of the present invention;
图2为本发明实施例R、G、B区微阵列LED的结构示意图;FIG. 2 is a schematic structural diagram of a microarray LED in regions R, G, and B according to an embodiment of the present invention;
图3为本发明实施例R区微阵列LED芯片俯视结构示意图;3 is a schematic top-view structural diagram of a microarray LED chip in the R region according to an embodiment of the present invention;
图4为本发明实施例G、B区微阵列LED芯片的截面示意图;4 is a schematic cross-sectional view of a microarray LED chip in regions G and B according to an embodiment of the present invention;
图5为本发明实施例G、B区单个微阵列LED芯片俯视结构示意图;5 is a schematic top-view structural diagram of a single microarray LED chip in areas G and B according to an embodiment of the present invention;
图6为本发明实施例G、B区微阵列LED芯片行电极互联俯视结构示意图;6 is a top-view structural schematic diagram of the interconnection of row electrodes of microarray LED chips in regions G and B of the embodiment of the present invention;
图7为本发明实施例G、B区微阵列LED芯片列电极互联俯视结构示意图;FIG. 7 is a schematic top-view structural diagram of the interconnection of column electrodes of microarray LED chips in regions G and B of the embodiment of the present invention;
图8为本发明实施例G、B区微阵列LED芯片列电极互联截面示意图。8 is a schematic cross-sectional view of the interconnection of column electrodes of microarray LED chips in regions G and B of the embodiment of the present invention.
具体实施方式Detailed ways
为使本发明的上述目的、特征和优点能够更加明显易懂,下面将结合附图 和具体的实施例对本发明的技术方案进行详细说明。需要指出的是,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例,基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。In order to make the above objects, features and advantages of the present invention more clearly understood, the technical solutions of the present invention will be described in detail below with reference to the accompanying drawings and specific embodiments. It should be pointed out that the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, those of ordinary skill in the art can obtain all the Other embodiments fall within the protection scope of the present invention.
实施例Example
根据图1、图2所示,通过将多个微阵列可单独寻址的LED芯片集成在一起,分别为红光R区1,绿光G区2,蓝光B区3和白光RGB区4。R、G、B区所选用的芯片为8×8矩阵寻址阵列的微阵列LED,白光区为大功率RGB型白光LED芯片。As shown in FIG. 1 and FIG. 2 , by integrating a plurality of individually addressable LED chips by microarrays, they are the red light R area 1, the green light G area 2, the blue light B area 3 and the white light RGB area 4. The chips selected for R, G, and B areas are micro-array LEDs of 8×8 matrix addressing arrays, and the white light areas are high-power RGB white light LED chips.
根据图2、图3所示,红光R区选用典型的AlGaInP红光LED芯片,其中R区红光的波长为600~620nm。利用光刻工艺与感应耦合等离子体刻蚀工艺,使阵列中微型LED器件之间相互电学隔离,形成尺寸为100um的8×8微阵列LED阵列。将2×2微型LED单元所包围的矩形区沉积pad金属层,并与其周围的4个微型LED单元的p电极进行互联,通过p型金属线共同引出一个行pad接触层,使每两行的16个微型LED单元可以共同控制,该行pad接触层用于连接电源正极。阵列中所有微阵列LED共n极,在芯片底面引出一个n pad接触层用于连接电源负极。As shown in Fig. 2 and Fig. 3, a typical AlGaInP red light LED chip is selected for the red light R region, wherein the wavelength of the red light in the R region is 600-620 nm. The photolithography process and the inductively coupled plasma etching process are used to electrically isolate the micro-LED devices in the array from each other to form an 8×8 micro-array LED array with a size of 100um. A pad metal layer is deposited in the rectangular area surrounded by 2×2 micro-LED units, and interconnected with the p-electrodes of the surrounding 4 micro-LED units. 16 micro-LED units can be controlled together, and the row of pad contacts is used to connect the positive pole of the power supply. All the microarray LEDs in the array share the n-pole, and an n-pad contact layer is drawn out on the bottom of the chip to connect the negative pole of the power supply.
根据图4、图5所示,蓝光B区与绿光G区选用GaN材料,利用MOCVD技术在蓝宝石衬底上生长LED结构,自下而上分别为蓝宝石衬底5、非掺杂的GaN缓冲层6、n-GaN层7、InGaN/GaN多量子阱层8、AlGaN电流阻挡层9、p-GaN层10。通过调节InGaN/GaN多量子阱的厚度以满足G、B区不同波长发射光的要求,其中G区绿光的波长为520~540nm,B区蓝光的波长为440~460nm。As shown in Figure 4 and Figure 5, the blue light B area and the green light G area are made of GaN material, and the LED structure is grown on the sapphire substrate using MOCVD technology. From bottom to top, the sapphire substrate 5 and the undoped GaN buffer are respectively Layer 6 , n-GaN layer 7 , InGaN/GaN multiple quantum well layer 8 , AlGaN current blocking layer 9 , p-GaN layer 10 . By adjusting the thickness of the InGaN/GaN multiple quantum wells to meet the requirements of different wavelengths of light emitted in the G and B regions, the wavelength of the green light in the G region is 520-540 nm, and the wavelength of the blue light in the B region is 440-460 nm.
利用光刻工艺与感应耦合等离子体刻蚀工艺,使阵列中微型LED器件之间相互电学隔离,并在刻蚀选区部分除去p-GaN层、AlGaN电流阻挡层和InGaN/GaN多量子阱层,直至暴露出n-GaN层。外部n-GaN层区域的直径为100um,内部 p-GaN层区域的直径为50um。Using the photolithography process and the inductively coupled plasma etching process, the micro LED devices in the array are electrically isolated from each other, and the p-GaN layer, the AlGaN current blocking layer and the InGaN/GaN multiple quantum well layer are removed in the selected part of the etching. until the n-GaN layer is exposed. The diameter of the outer n-GaN layer region is 100um and the diameter of the inner p-GaN layer region is 50um.
再次利用光刻暴露出如图5所示的两个环形区域,通过电子束蒸发沉积Cr/Pd/Au金属叠层作为p型电极12和n型电极11,并在200℃的N 2气氛中快速退火2min,环形p电极12与环形n电极11的内径差均为5um。 The two annular regions shown in Figure 5 were again exposed by photolithography, Cr/Pd/Au metal stacks were deposited by e-beam evaporation as p-type electrode 12 and n-type electrode 11, and were deposited at 200 °C in a N atmosphere After rapid annealing for 2 minutes, the inner diameter difference between the annular p-electrode 12 and the annular n-electrode 11 is both 5um.
如图6、图7、图8所示,将2×2微型LED单元所包围的矩形区沉积pad金属层,并与其周围的4个微型LED单元的n电极进行互联,通过n型金属线共同引出一个行pad接触层,使每两行的16个微型LED单元可以共同控制,该行pad接触层用于连接电源负极。As shown in Fig. 6, Fig. 7, Fig. 8, a pad metal layer is deposited on the rectangular area surrounded by 2×2 micro-LED units, and interconnected with the n-electrodes of the surrounding 4 micro-LED units through n-type metal wires. A row pad contact layer is drawn out, so that 16 micro-LED units in every two rows can be controlled together, and the row pad contact layer is used to connect the negative pole of the power supply.
在列方向上的选定区域沉积钝化层后,将每列8个微型LED单片的p电极进行电极互联,并让每两列共同引出一个列pad接触层,使这16个微型LED单元可以共同控制,该列pad接触层用于连接电源正极。After depositing a passivation layer in a selected area in the column direction, the p-electrodes of 8 micro-LED monoliths in each column are electrode-interconnected, and a column pad contact layer is jointly drawn out for every two columns, so that the 16 micro-LED units are connected to each other. It can be controlled together, and the pad contact layer of this column is used to connect the positive pole of the power supply.
将四种类型的微阵列LED芯片按一定的结构排列,集成在基板上,不局限于四芯。The four types of microarray LED chips are arranged in a certain structure and integrated on the substrate, not limited to four cores.
本发明利用通断键控制技术和脉冲宽度调制技术控制不同区域不同光色的微阵列LED,使之耦合出不同的光,用于信号识别与数据传输。The invention utilizes the on-off key control technology and the pulse width modulation technology to control the micro-array LEDs with different light colors in different areas, so as to couple out different lights for signal identification and data transmission.
本发明的可见光通信LED器件运用通断键控制技术和脉冲宽度调制技术控制不同区域不同光色的微阵列LED的发光情况,使之耦合出不同的光,通过光信号可实现高速数据传输。相比于LED芯片,该器件具有更好的调制带宽,更大的信息传输容量,并能够同时满足照明需要。The visible light communication LED device of the present invention uses on-off key control technology and pulse width modulation technology to control the luminous conditions of microarray LEDs with different light colors in different regions, so that they can couple out different lights, and can realize high-speed data transmission through optical signals. Compared with LED chips, the device has better modulation bandwidth, larger information transmission capacity, and can meet lighting needs at the same time.
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对本发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。The above-mentioned embodiments only represent several embodiments of the present invention, and the descriptions thereof are specific and detailed, but should not be construed as a limitation on the scope of the patent of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can also be made, which all belong to the protection scope of the present invention. Therefore, the protection scope of the patent of the present invention should be subject to the appended claims.

Claims (10)

  1. 一种可见光通信LED器件,其特征在于,通过将多个微阵列可单独寻址的LED芯片集成在一起,多个LED芯片分成不同光色的LED芯片区域,利用不同区域的芯片明暗交替,来实现信号识别。A visible light communication LED device is characterized in that, by integrating a plurality of individually addressable LED chips in a microarray, the plurality of LED chips are divided into LED chip areas of different light colors, and the chips in different areas are alternated between light and dark. Implement signal recognition.
  2. 根据权利要求1所述的可见光通信LED器件,其特征在于,所述可见光通信LED器件包括四块不同的LED芯片区域,分别为红光微阵列LED R区、绿光微阵列LED G区、蓝光微阵列LED B区和白光LED RGB区。The visible light communication LED device according to claim 1, wherein the visible light communication LED device comprises four different LED chip regions, which are respectively a red light microarray LED R region, a green light microarray LED G region, and a blue light microarray LED region. Microarray LED B area and white LED RGB area.
  3. 根据权利要求2所述的可见光通信LED器件,其特征在于,R区微阵列LED的芯片均为N×N的阵列结构,2×2微型LED单元的p电极与其所包围的pad金属层电极互联,每两行2N个微型LED单元通过p型金属线共同引出一个p pad接触层;阵列中所有微阵列LED共n极,在芯片底面引出一个n pad接触层。The visible light communication LED device according to claim 2, wherein the chips of the R-region micro-array LED are all N×N array structures, and the p-electrodes of the 2×2 micro-LED units are interconnected with the pad metal layer electrodes surrounded by them. , every two rows of 2N micro-LED units lead out a p pad contact layer through p-type metal wires; all the micro-array LEDs in the array share n-pole, and lead out an n pad contact layer on the bottom surface of the chip.
  4. 根据权利要求2所述的可见光通信LED器件,其特征在于,G、B区微阵列LED的芯片均为N×N的阵列结构,2×2微型LED单元的n电极与其所包围的pad金属层电极互联,每两行2N个微型LED单元通过n型金属线共同引出一个行pad接触层;每两列2N个微型LED单片的p电极进行电极互联,并共同引出一个列pad接触层。The visible light communication LED device according to claim 2, wherein the chips of the micro-array LEDs in the G and B regions are all of an N×N array structure, and the n-electrode of the 2×2 micro-LED unit and the pad metal layer surrounded by it Electrode interconnection, 2N micro-LED units in every two rows lead out a row pad contact layer through n-type metal wires; 2N micro-LED monolithic p-electrodes in every two columns are electrode interconnected, and lead out a column pad contact layer together.
  5. 根据权利要求2所述的可见光通信LED器件,其特征在于,R、G、B区中,微型LED的单一发光单元的直径为100-200um,相邻微型LED单元的间距为50um,其中矩形pad金属层的边长为50um。The visible light communication LED device according to claim 2, wherein in the R, G, and B regions, the diameter of a single light-emitting unit of the micro-LED is 100-200um, and the distance between adjacent micro-LED units is 50um, wherein the rectangular pad The side length of the metal layer is 50um.
  6. 根据权利要求2所述的可见光通信LED器件,其特征在于,蓝光B区与绿光G区选用GaN材料,利用MOCVD技术在蓝宝石衬底上生长LED结构,自下而上分别为蓝宝石衬底、非掺杂的GaN缓冲层、n-GaN层、InGaN/GaN多量子阱层、AlGaN电流阻挡层和p-GaN层;通过调节InGaN/GaN多量子阱的厚度以满足G、B区不同波长发射光的要求;The visible light communication LED device according to claim 2, wherein the blue light B area and the green light G area are made of GaN material, and the LED structure is grown on the sapphire substrate by using MOCVD technology, and the sapphire substrate, Undoped GaN buffer layer, n-GaN layer, InGaN/GaN multi-quantum well layer, AlGaN current blocking layer and p-GaN layer; By adjusting the thickness of InGaN/GaN multi-quantum well to meet different wavelength emission in G and B regions light requirements;
    利用光刻工艺与感应耦合等离子体刻蚀工艺,使阵列中微型LED器件之间相互电学隔离,并在刻蚀选区部分除去p-GaN层、AlGaN电流阻挡层和InGaN/GaN多量子阱层,直至暴露出n-GaN层;外部n-GaN层区域的直径为100um,内部p-GaN层区域的直径为50um;Using the photolithography process and the inductively coupled plasma etching process, the micro LED devices in the array are electrically isolated from each other, and the p-GaN layer, the AlGaN current blocking layer and the InGaN/GaN multiple quantum well layer are removed in the selected part of the etching. Until the n-GaN layer is exposed; the diameter of the outer n-GaN layer region is 100um, and the diameter of the inner p-GaN layer region is 50um;
    再次利用光刻暴露出两个环形区域,通过电子束蒸发沉积Cr/Pd/Au金属叠层作为p型和n型电极,并在200℃的N 2气氛中快速退火2min,环形p电极与环形n电极的内径差均为5um。 The two annular regions were again exposed by photolithography, Cr/Pd/Au metal stacks were deposited by e-beam evaporation as p-type and n-type electrodes, and rapidly annealed in a N atmosphere at 200 °C for 2 min. The inner diameter difference of the n electrodes is all 5um.
  7. 根据权利要求2所述的可见光通信LED器件,其特征在于,R、G、B区满足不同波长发射光的要求,其中R区红光的波长为600~620nm,G区绿光的波长为520~540nm,B区蓝光的波长为440~460nm。The visible light communication LED device according to claim 2, wherein the R, G and B regions meet the requirements of different wavelengths of emitted light, wherein the wavelength of the red light in the R region is 600-620 nm, and the wavelength of the green light in the G region is 520 nm. ~540nm, the wavelength of blue light in the B region is 440 ~ 460nm.
  8. 根据权利要求2所述的可见光通信LED器件,其特征在于,白光区的大功率RGB型白光LED芯片,在直流电源的作用下,发出稳定的白光。The visible light communication LED device according to claim 2, wherein the high-power RGB white light LED chip in the white light region emits stable white light under the action of the DC power supply.
  9. 根据权利要求2所述的可见光通信LED器件,其特征在于,利用MIMO技术,R、G、B区阵列中不同区域的微阵列LED芯片可分别控制,发送不同数据,并由多个光电探测器接收。The visible light communication LED device according to claim 2, characterized in that, using MIMO technology, the micro-array LED chips in different areas of the R, G, and B area arrays can be controlled separately, send different data, and are detected by a plurality of photodetectors. take over.
  10. 根据权利要求2所述的可见光通信LED器件,其特征在于,利用通断键控制和脉冲宽度调制技术,将不同的信号通过驱动器放大后通过直流偏置器加载到R、G、B这三个区域的芯片上,这三束不同颜色的光束在空间耦合,并在空间传输;在接收端,采用红、绿、蓝三色滤光片将不同波长的信号选择出来,再由接收电路进行信号采集和后端处理,实现信号识别与数据传输。The visible light communication LED device according to claim 2, characterized in that, by using on-off key control and pulse width modulation technology, different signals are amplified by a driver and then loaded into three of R, G, and B through a DC biaser. On the chip in the area, the three beams of different colors are coupled in space and transmitted in space; at the receiving end, red, green, and blue filters are used to select signals of different wavelengths, and then the receiving circuit performs the signal processing. Acquisition and back-end processing to realize signal identification and data transmission.
PCT/CN2021/130180 2020-12-18 2021-11-12 Led device for visible light communication WO2022127457A1 (en)

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