WO2022104932A1 - Piezoelectric microphone - Google Patents

Piezoelectric microphone Download PDF

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Publication number
WO2022104932A1
WO2022104932A1 PCT/CN2020/133741 CN2020133741W WO2022104932A1 WO 2022104932 A1 WO2022104932 A1 WO 2022104932A1 CN 2020133741 W CN2020133741 W CN 2020133741W WO 2022104932 A1 WO2022104932 A1 WO 2022104932A1
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WIPO (PCT)
Prior art keywords
cantilever beam
piezoelectric
electrode layer
free
thickness
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PCT/CN2020/133741
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French (fr)
Chinese (zh)
Inventor
石正雨
童贝
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瑞声声学科技(深圳)有限公司
瑞声科技(南京)有限公司
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Application filed by 瑞声声学科技(深圳)有限公司, 瑞声科技(南京)有限公司 filed Critical 瑞声声学科技(深圳)有限公司
Publication of WO2022104932A1 publication Critical patent/WO2022104932A1/en

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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04RLOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R19/00Electrostatic transducers
    • H04R19/04Microphones

Definitions

  • the present application relates to the technical field of acoustic-electrical conversion, and in particular, to a piezoelectric microphone.
  • Microphone is an acoustic-electrical conversion transducer, which can convert the sound pressure signal of external conditions into electrical signals for output, and form different electrical signals according to the different characteristics of the sound pressure signals for storage and transportation, and transmit signals.
  • the piezoelectric microphone in the prior art is a cantilever beam structure with 3 layers (electrode/piezoelectric material/electrode) or 5 layers (electrode/piezoelectric material/electrode/piezoelectric material/electrode).
  • the beam is divided into a voltage sensing area and other areas.
  • the edges of each cantilever beam are fixed, and the cantilever beam bends under the action of sound pressure, and the piezoelectric film at the voltage sensing part is subjected to force to generate an electrical signal.
  • it is usually necessary to increase the length of the cantilever beam, which reduces the resonant frequency of the microphone and thus increases the noise of the microphone.
  • the purpose of the present application is to provide a piezoelectric microphone, which can reduce the mass of the cantilever beam, thereby increasing the resonance frequency of the cantilever beam and reducing the noise of the microphone.
  • a piezoelectric microphone including:
  • a cantilever beam fixed on the base the cantilever beam includes a fixed part fixed on the base and a free part extended from the fixed part and suspended on the receiving cavity, the thickness of the free part is less than The thickness of the fixed part, or the thickness of the part of the free part is smaller than the thickness of the fixed part; the cantilever beam includes an upper electrode layer and a lower electrode layer that are stacked and sandwiched between the upper electrode layer and the lower electrode layer. at least one piezoelectric layer between the lower electrode layers.
  • the free portion is formed with a plurality of first groove structures arranged at intervals in a direction perpendicular to the vibration direction of the cantilever beam, and formed between two adjacent first groove structures There is the first reinforcement structure.
  • the first groove structure extends from the fixed portion toward the free portion, and the first groove structure is recessed along the vibration direction.
  • the free portion includes a connecting segment connected to the fixing portion and a free segment extending from the connecting segment in a direction away from the fixing portion, and the thickness of the free segment is smaller than that of the fixed portion. the thickness of the fixing part.
  • a plurality of second groove structures arranged at intervals are formed on the free section perpendicular to the vibration direction of the cantilever beam, and two adjacent second groove structures are formed between two adjacent groove structures.
  • the second groove structure extends from the connecting section in a direction away from the fixing portion, and the second groove structure is recessed along the vibration direction.
  • the shape of the orthographic projection of the cantilever beam on the base along the vibration direction of the cantilever beam is one of a rectangle, a trapezoid, a triangle and a fan.
  • a plurality of cantilever beams are provided, and a gap is provided between two adjacent cantilever beams.
  • At least two of the piezoelectric layers are sandwiched between the upper electrode layer and the lower electrode layer, and the cantilever beam further includes sandwiched between the adjacent piezoelectric layers. between the intermediate electrode layers.
  • the beneficial effect of the present application is that: by setting the thickness of the free part to be smaller than the thickness of the fixed part, or the thickness of a part of the free part is smaller than the thickness of the fixed part, the mass of the cantilever beam can be reduced under the cantilever beam of the same area, thereby reducing the mass of the cantilever beam. Increase the resonant frequency of the cantilever beam and reduce the noise of the microphone.
  • FIG. 1 is a schematic structural diagram of a piezoelectric microphone according to a first embodiment of the application
  • Fig. 2 is the sectional view of the line A-A of Fig. 1;
  • FIG. 3 is a schematic structural diagram of a piezoelectric microphone according to a second embodiment of the present application.
  • Fig. 4 is the sectional view of the line B-B of Fig. 3;
  • FIG. 5 is a schematic structural diagram of a piezoelectric microphone according to a third embodiment of the present application.
  • Fig. 6 is the sectional view of the C-C line of Fig. 5;
  • FIG. 7 is a partial enlarged schematic diagram of the D area in FIG. 1 .
  • the piezoelectric microphone 100 includes a substrate 10 , a cantilever beam 20 fixed on the substrate 10 , and a piezoelectric laminate structure 30 disposed on the cantilever beam 20 .
  • the base 10 includes an accommodating cavity 11 and an annular peripheral wall 12 surrounding the accommodating cavity 11 , and the shape of the base 10 may be a circle or a polygon.
  • the substrate 10 is a micro-silicon substrate.
  • the shape of the orthographic projection of the cantilever beam 20 on the base 10 along the vibration direction of the cantilever beam 20 is one of a rectangle, a trapezoid, a triangle and a fan.
  • a plurality of cantilever beams 20 are provided, and a gap 23 is provided between two adjacent cantilever beams 20 .
  • each cantilever beam 20 includes a fixed portion 21 and a free portion 22 .
  • the shape of the orthographic projection of the cantilever beam 20 on the substrate 10 along the vibration direction of the cantilever beam 20 in this embodiment is a rectangle, and the number is two.
  • the free portion 22 when the thickness of the free portion 22 is smaller than the thickness of the fixed portion 21 , further, referring to FIGS. 3 and 4 , the free portion 22 is perpendicular to the vibration direction of the cantilever beam 20 .
  • a plurality of first groove structures 221 are formed at intervals, and a first reinforcing structure 222 is formed between two adjacent first groove structures 221 .
  • the height of the first reinforcement structure 222 is smaller than the height of the fixed portion 21 and is equal to the height of the free portion 22 , and the height of the first groove structure 221 is smaller than that of the free portion 22 .
  • the first groove structure 221 extends from the fixed portion 21 toward the free portion 22 , and the first groove structure 221 is recessed along the vibration direction.
  • the thickness of a partial region of the free portion 22 is smaller than the thickness of the fixed portion 21 , specifically, the free portion 22 is formed with a plurality of intervals perpendicular to the vibration direction of the cantilever beam 20 .
  • the second groove structures 223 are provided, and a second reinforcing structure 224 is formed between two adjacent second groove structures 223 .
  • the height of the second reinforcing structure 224 is equal to the height of the fixing portion 21 , and the height of the second groove structure 223 is smaller than the height of the fixing portion 21 .
  • the second groove structure 223 extends from the fixed portion 21 toward the free portion 22 , and the second groove structure 223 is recessed along the vibration direction.
  • the free portion 22 when the thickness of the partial area of the free portion 22 is smaller than the thickness of the fixed portion 21, further, the free portion 22 is divided into two partial areas, and the free portion 22 includes a connection segment connected to the fixed portion 21 (in the figure). (not shown) and a free segment (not shown in the figure) extending from the connecting segment in the direction away from the fixing part 21 , the thickness of the free segment is smaller than that of the fixing part 21 , and the thickness of the connecting segment is the same as the thickness of the fixing part 21 .
  • a plurality of third groove structures (not shown in the figure) arranged at intervals are formed in the free section perpendicular to the vibration direction of the cantilever beam 20, and a third reinforcement structure (not shown in the figure).
  • the height of the third reinforcement structure is smaller than the height of the fixing portion 21 and is equal to the height of the free segment, and the height of the third groove structure is smaller than the height of the free segment.
  • the third groove structure extends from the connecting section toward the direction away from the fixing portion 21 , and the third groove structure is recessed along the vibration direction.
  • the piezoelectric laminated structure 30 includes an upper electrode layer and a lower electrode layer arranged in layers and at least one piezoelectric layer sandwiched between the upper electrode layer and the lower electrode layer.
  • a piezoelectric layer is disposed between the upper electrode layer and the lower electrode layer, and the piezoelectric laminated structure 30 includes an upper electrode layer, a piezoelectric layer and a lower electrode layer stacked sequentially from top to bottom.
  • the piezoelectric layer is made of aluminum nitride, scandium-doped aluminum nitride, zinc oxide or lead zirconate titanate piezoelectric ceramic material, or a combination of the above materials
  • the upper electrode layer and the lower electrode layer are made of aluminum, molybdenum or titanium. , or a combination of the above materials.
  • the piezoelectric laminate structure 30 further includes a middle electrode layer sandwiched between adjacent piezoelectric layers.
  • the piezoelectric laminated structure 30 includes an upper electrode layer 31 and an upper piezoelectric layer that are stacked in sequence from top to bottom. layer 32 , intermediate electrode layer 33 , lower piezoelectric layer 34 and lower electrode layer 35 .
  • the upper piezoelectric layer 32 and the lower piezoelectric layer 34 are made of aluminum nitride, scandium-doped aluminum nitride, zinc oxide or lead zirconate titanate piezoelectric ceramic material, or a combination of the above-mentioned materials.
  • the electrode layer 33 and the lower electrode layer 35 are made of aluminum, molybdenum or titanium, or a combination of the above-mentioned materials.
  • the number of piezoelectric layers may also be three layers, four layers or more, which is not limited in this embodiment.
  • the piezoelectric microphone 100 of this embodiment when an external sound signal is transmitted from the sound hole, under the action of sound pressure, the free portion 22 vibrates, which drives the piezoelectric laminated structure 30 to vibrate, so that the fixed portion 21 is close to the piezoelectric microphone 100 .
  • the piezoelectric laminate structure 30 generates a voltage signal. Under the cantilever beam 20 of the same area, by reducing the mass of the cantilever beam 20, the free part of the cantilever beam 20 can be deformed more, thereby increasing the resonance frequency of the cantilever beam 20 and reducing the noise of the microphone.
  • the piezoelectric microphone 100 of this embodiment can be used in a piezoelectric microphone device, and the piezoelectric microphone device includes a plurality of piezoelectric microphones distributed in an array structure. Multiple piezoelectric microphones can be connected in parallel or in series. Piezoelectric microphone devices include but are not limited to microphones, mobile phones, PCs, and vehicle-mounted voice recognition. By using multiple piezoelectric microphones, the generated voltage signals are superimposed on each other, thereby effectively enhancing the sensitivity of the piezoelectric microphone device.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Piezo-Electric Transducers For Audible Bands (AREA)

Abstract

Provided is a piezoelectric microphone, comprising: a substrate having an accommodation cavity; and a cantilever beam fixed to the substrate. The cantilever beam comprises a fixed portion fixed at the substrate and a free portion extending from the fixed portion and suspended above the accommodation cavity. The thickness of the free portion is less than the thickness of the fixed portion. Alternatively, the thickness of a portion of the free portion is less than the thickness of the fixed portion. The cantilever beam comprises an upper electrode layer and a lower electrode layer which are arranged in a stacked manner, and at least one piezoelectric layer sandwiched between the upper electrode layer and the lower electrode layer. In the piezoelectric microphone of the present invention, the cantilever beam has reduced mass, such that the resonance frequency of the cantilever beam can be improved, and noise of the microphone can be reduced.

Description

压电式麦克风Piezo Microphone 技术领域technical field
本申请涉及声电转换技术领域,具体涉及一种压电式麦克风。The present application relates to the technical field of acoustic-electrical conversion, and in particular, to a piezoelectric microphone.
背景技术Background technique
麦克风是一种声电转换类的换能器,能够把外界条件的声压信号转换成电信号进行输出,根据声压信号的不同特点形成不同的电信号,进行存储和运输,传递信号。Microphone is an acoustic-electrical conversion transducer, which can convert the sound pressure signal of external conditions into electrical signals for output, and form different electrical signals according to the different characteristics of the sound pressure signals for storage and transportation, and transmit signals.
现有技术的压电式麦克风为3层(电极/压电材料/电极)或5层(电极/压电材料/电极/压电材料/电极)的悬臂梁结构,通过电极的刻蚀将悬臂梁分为电压感知区和其他区域,各个悬臂梁的边缘固定,在声压作用下悬臂梁弯曲,电压感知部位的压电薄膜受力产生电信号。但是,为保证麦克风有足够的灵敏度,通常需要增加悬臂梁的长度,导致麦克风的谐振频率降低,从而导致麦克风的噪声增大。The piezoelectric microphone in the prior art is a cantilever beam structure with 3 layers (electrode/piezoelectric material/electrode) or 5 layers (electrode/piezoelectric material/electrode/piezoelectric material/electrode). The beam is divided into a voltage sensing area and other areas. The edges of each cantilever beam are fixed, and the cantilever beam bends under the action of sound pressure, and the piezoelectric film at the voltage sensing part is subjected to force to generate an electrical signal. However, in order to ensure sufficient sensitivity of the microphone, it is usually necessary to increase the length of the cantilever beam, which reduces the resonant frequency of the microphone and thus increases the noise of the microphone.
因此,有必要提供一种新的压电式麦克风以解决上述缺陷。Therefore, it is necessary to provide a new piezoelectric microphone to solve the above-mentioned defects.
技术问题technical problem
本申请的目的在于提供一种压电式麦克风,能够减小悬臂梁的质量,从而提高悬臂梁的谐振频率,降低麦克风的噪声。The purpose of the present application is to provide a piezoelectric microphone, which can reduce the mass of the cantilever beam, thereby increasing the resonance frequency of the cantilever beam and reducing the noise of the microphone.
技术解决方案technical solutions
本申请的技术方案如下:提供一种压电式麦克风,包括:The technical solution of the present application is as follows: a piezoelectric microphone is provided, including:
具有收容腔的基底;a base with a receiving cavity;
固定于所述基底的悬臂梁,所述悬臂梁包括固定于所述基底上的固定部和自所述固定部延伸并悬设置于所述收容腔上的自由部,所述自由部的厚度小于所述固定部的厚度,或者所述自由部的部分区域的厚度小于所述固定部的厚度;所述悬臂梁包括层叠设置的上电极层与下电极层以及夹设于所述上电极层与所述下电极层之间的至少一层压电层。A cantilever beam fixed on the base, the cantilever beam includes a fixed part fixed on the base and a free part extended from the fixed part and suspended on the receiving cavity, the thickness of the free part is less than The thickness of the fixed part, or the thickness of the part of the free part is smaller than the thickness of the fixed part; the cantilever beam includes an upper electrode layer and a lower electrode layer that are stacked and sandwiched between the upper electrode layer and the lower electrode layer. at least one piezoelectric layer between the lower electrode layers.
根据本申请的一个实施例,所述自由部在垂直于所述悬臂梁的振动方向上形成有多个间隔设置的第一凹槽结构,相邻两个所述第一凹槽结构之间形成有第一加强结构。According to an embodiment of the present application, the free portion is formed with a plurality of first groove structures arranged at intervals in a direction perpendicular to the vibration direction of the cantilever beam, and formed between two adjacent first groove structures There is the first reinforcement structure.
根据本申请的一个实施例,所述第一凹槽结构自所述固定部朝向所述自由部的方向延伸,所述第一凹槽结构沿所述振动方向凹陷形成。According to an embodiment of the present application, the first groove structure extends from the fixed portion toward the free portion, and the first groove structure is recessed along the vibration direction.
根据本申请的一个实施例,所述自由部包括与所述固定部连接的连接段以及自所述连接段朝向远离所述固定部的方向延伸形成的自由段,所述自由段的厚度小于所述固定部的厚度。According to an embodiment of the present application, the free portion includes a connecting segment connected to the fixing portion and a free segment extending from the connecting segment in a direction away from the fixing portion, and the thickness of the free segment is smaller than that of the fixed portion. the thickness of the fixing part.
根据本申请的一个实施例,所述自由段在垂直于所述悬臂梁的振动方向上形成有多个间隔设置的第二凹槽结构,相邻两个所述第二凹槽结构之间形成有第二加强结构。According to an embodiment of the present application, a plurality of second groove structures arranged at intervals are formed on the free section perpendicular to the vibration direction of the cantilever beam, and two adjacent second groove structures are formed between two adjacent groove structures. There is a second reinforcement structure.
根据本申请的一个实施例,所述第二凹槽结构自所述连接段朝向远离所述固定部的方向延伸,所述第二凹槽结构沿所述振动方向凹陷形成。According to an embodiment of the present application, the second groove structure extends from the connecting section in a direction away from the fixing portion, and the second groove structure is recessed along the vibration direction.
根据本申请的一个实施例,所述悬臂梁沿所述悬臂梁的振动方向在所述基底上的正投影的形状为矩形、梯形、三角形和扇形中的一种。According to an embodiment of the present application, the shape of the orthographic projection of the cantilever beam on the base along the vibration direction of the cantilever beam is one of a rectangle, a trapezoid, a triangle and a fan.
根据本申请的一个实施例,所述悬臂梁设置多个,且相邻两个悬臂梁之间设置有间隙。According to an embodiment of the present application, a plurality of cantilever beams are provided, and a gap is provided between two adjacent cantilever beams.
根据本申请的一个实施例,至少两层所述压电层夹设于所述上电极层与所述下电极层之间,所述悬臂梁还包括夹设于相邻所述压电层之间的中间电极层。According to an embodiment of the present application, at least two of the piezoelectric layers are sandwiched between the upper electrode layer and the lower electrode layer, and the cantilever beam further includes sandwiched between the adjacent piezoelectric layers. between the intermediate electrode layers.
有益效果beneficial effect
本申请的有益效果在于:通过设置自由部的厚度小于固定部的厚度,或者自由部的部分区域的厚度小于固定部的厚度,能够在相同面积的悬臂梁下,减小悬臂梁的质量,从而提高悬臂梁的谐振频率,降低麦克风的噪声。The beneficial effect of the present application is that: by setting the thickness of the free part to be smaller than the thickness of the fixed part, or the thickness of a part of the free part is smaller than the thickness of the fixed part, the mass of the cantilever beam can be reduced under the cantilever beam of the same area, thereby reducing the mass of the cantilever beam. Increase the resonant frequency of the cantilever beam and reduce the noise of the microphone.
附图说明Description of drawings
图1为本申请第一实施例的压电式麦克风的结构示意图;FIG. 1 is a schematic structural diagram of a piezoelectric microphone according to a first embodiment of the application;
图2为图1的A-A向线的截面图;Fig. 2 is the sectional view of the line A-A of Fig. 1;
图3为本申请第二实施例的压电式麦克风的结构示意图;3 is a schematic structural diagram of a piezoelectric microphone according to a second embodiment of the present application;
图4为图3的B-B向线的截面图;Fig. 4 is the sectional view of the line B-B of Fig. 3;
图5为本申请第三实施例的压电式麦克风的结构示意图;5 is a schematic structural diagram of a piezoelectric microphone according to a third embodiment of the present application;
图6为图5的C-C向线的截面图;Fig. 6 is the sectional view of the C-C line of Fig. 5;
图7为图1中D区域的局部放大示意图。FIG. 7 is a partial enlarged schematic diagram of the D area in FIG. 1 .
本发明的实施方式Embodiments of the present invention
下面结合附图和实施方式对本申请作进一步说明。The present application will be further described below with reference to the accompanying drawings and embodiments.
请参见图1至图6,压电式麦克风100包括基底10、固定于基底10的悬臂梁20以及设于悬臂梁20上的压电叠层结构30。Referring to FIGS. 1 to 6 , the piezoelectric microphone 100 includes a substrate 10 , a cantilever beam 20 fixed on the substrate 10 , and a piezoelectric laminate structure 30 disposed on the cantilever beam 20 .
进一步地,基底10包括收容腔11以及围设形成收容腔11的环形周壁12,基底10的形状可以为圆形或多边形。基底10为微硅基片。Further, the base 10 includes an accommodating cavity 11 and an annular peripheral wall 12 surrounding the accommodating cavity 11 , and the shape of the base 10 may be a circle or a polygon. The substrate 10 is a micro-silicon substrate.
进一步地,悬臂梁20包括固定于基底10上的固定部21和自固定部21延伸并悬设置于收容腔11上的自由部22,自由部22的厚度小于固定部21的厚度,或者自由部22的部分区域的厚度小于固定部21的厚度。更进一步地,自由部22的厚度小于固定部21的厚度可以理解为自由部22的厚度自固定部21至自由部22的方向逐渐减小;自由部22的部分区域的厚度小于固定部21的厚度可以理解为自由部22的部分区域的厚度自固定部21至自由部22的方向逐渐减小。Further, the cantilever beam 20 includes a fixed portion 21 fixed on the base 10 and a free portion 22 extending from the fixed portion 21 and suspended on the receiving cavity 11 . The thickness of the free portion 22 is smaller than the thickness of the fixed portion 21, or the free portion The thickness of the partial region of 22 is smaller than the thickness of the fixing portion 21 . Further, the thickness of the free part 22 is smaller than the thickness of the fixed part 21 can be understood as the thickness of the free part 22 gradually decreases from the fixed part 21 to the direction of the free part 22; The thickness can be understood as the thickness of the partial region of the free portion 22 gradually decreases from the fixed portion 21 to the direction of the free portion 22 .
悬臂梁20沿悬臂梁20的振动方向在基底10上的正投影的形状为矩形、梯形、三角形和扇形中的一种。悬臂梁20设置多个,且相邻两个悬臂梁20之间设置有间隙23。在本实施例中,每个悬臂梁20均包括固定部21和自由部22。本实施例的悬臂梁20沿悬臂梁20的振动方向在基底10上的正投影的形状为矩形,数量为两个。The shape of the orthographic projection of the cantilever beam 20 on the base 10 along the vibration direction of the cantilever beam 20 is one of a rectangle, a trapezoid, a triangle and a fan. A plurality of cantilever beams 20 are provided, and a gap 23 is provided between two adjacent cantilever beams 20 . In this embodiment, each cantilever beam 20 includes a fixed portion 21 and a free portion 22 . The shape of the orthographic projection of the cantilever beam 20 on the substrate 10 along the vibration direction of the cantilever beam 20 in this embodiment is a rectangle, and the number is two.
一实施例中,请参见图1和图2,自由部22的厚度小于固定部21的厚度时,进一步地,请参见图3和图4,自由部22在垂直于悬臂梁20的振动方向上形成有多个间隔设置的第一凹槽结构221,相邻两个第一凹槽结构221之间形成有第一加强结构222。第一加强结构222的高度小于固定部21的高度,且等于自由部22的高度,第一凹槽结构221的高度小于自由部22的高度。第一凹槽结构221自固定部21朝向自由部22的方向延伸,第一凹槽结构221沿振动方向凹陷形成。In one embodiment, referring to FIGS. 1 and 2 , when the thickness of the free portion 22 is smaller than the thickness of the fixed portion 21 , further, referring to FIGS. 3 and 4 , the free portion 22 is perpendicular to the vibration direction of the cantilever beam 20 . A plurality of first groove structures 221 are formed at intervals, and a first reinforcing structure 222 is formed between two adjacent first groove structures 221 . The height of the first reinforcement structure 222 is smaller than the height of the fixed portion 21 and is equal to the height of the free portion 22 , and the height of the first groove structure 221 is smaller than that of the free portion 22 . The first groove structure 221 extends from the fixed portion 21 toward the free portion 22 , and the first groove structure 221 is recessed along the vibration direction.
另一实施例中,请参见图5和图6,自由部22的部分区域的厚度小于固定部21的厚度,具体地,自由部22在垂直于悬臂梁20的振动方向上形成有多个间隔设置的第二凹槽结构223,相邻两个第二凹槽结构223之间形成有第二加强结构224。第二加强结构224的高度等于固定部21的高度,第二凹槽结构223的高度小于固定部21的高度。第二凹槽结构223自固定部21朝向自由部22的方向延伸,第二凹槽结构223沿振动方向凹陷形成。In another embodiment, please refer to FIG. 5 and FIG. 6 , the thickness of a partial region of the free portion 22 is smaller than the thickness of the fixed portion 21 , specifically, the free portion 22 is formed with a plurality of intervals perpendicular to the vibration direction of the cantilever beam 20 . The second groove structures 223 are provided, and a second reinforcing structure 224 is formed between two adjacent second groove structures 223 . The height of the second reinforcing structure 224 is equal to the height of the fixing portion 21 , and the height of the second groove structure 223 is smaller than the height of the fixing portion 21 . The second groove structure 223 extends from the fixed portion 21 toward the free portion 22 , and the second groove structure 223 is recessed along the vibration direction.
再一实施例中,自由部22的部分区域的厚度小于固定部21的厚度时,进一步地,将自由部22分为两部分区域,自由部22包括与固定部21连接的连接段(图中未示出)以及自连接段朝向远离固定部21的方向延伸形成的自由段(图中未示出),自由段的厚度小于固定部21的厚度,连接段的厚度与固定部21的厚度相同。自由段在垂直于悬臂梁20的振动方向上形成有多个间隔设置的第三凹槽结构(图中未示出),相邻两个第三凹槽结构之间形成有第三加强结构(图中未示出)。第三加强结构的高度小于固定部21的高度,且等于自由段的高度,第三凹槽结构的高度小于自由段的高度。第三凹槽结构自连接段朝向远离固定部21的方向延伸,第三凹槽结构沿振动方向凹陷形成。In yet another embodiment, when the thickness of the partial area of the free portion 22 is smaller than the thickness of the fixed portion 21, further, the free portion 22 is divided into two partial areas, and the free portion 22 includes a connection segment connected to the fixed portion 21 (in the figure). (not shown) and a free segment (not shown in the figure) extending from the connecting segment in the direction away from the fixing part 21 , the thickness of the free segment is smaller than that of the fixing part 21 , and the thickness of the connecting segment is the same as the thickness of the fixing part 21 . A plurality of third groove structures (not shown in the figure) arranged at intervals are formed in the free section perpendicular to the vibration direction of the cantilever beam 20, and a third reinforcement structure ( not shown in the figure). The height of the third reinforcement structure is smaller than the height of the fixing portion 21 and is equal to the height of the free segment, and the height of the third groove structure is smaller than the height of the free segment. The third groove structure extends from the connecting section toward the direction away from the fixing portion 21 , and the third groove structure is recessed along the vibration direction.
进一步地,压电叠层结构30包括层叠设置的上电极层与下电极层以及夹设于上电极层与下电极层之间的至少一层压电层。Further, the piezoelectric laminated structure 30 includes an upper electrode layer and a lower electrode layer arranged in layers and at least one piezoelectric layer sandwiched between the upper electrode layer and the lower electrode layer.
在一实施例中,上电极层与下电极层之间设有一层压电层,则压电叠层结构30包括自上而下依次叠设的上电极层、压电层以及下电极层。其中,压电层为氮化铝、掺钪氮化铝、氧化锌或锆钛酸铅压电陶瓷材质,或者上述多种材料的组合,上电极层和下电极层为铝、钼或钛材质,或者上述多种材料的组合。In one embodiment, a piezoelectric layer is disposed between the upper electrode layer and the lower electrode layer, and the piezoelectric laminated structure 30 includes an upper electrode layer, a piezoelectric layer and a lower electrode layer stacked sequentially from top to bottom. The piezoelectric layer is made of aluminum nitride, scandium-doped aluminum nitride, zinc oxide or lead zirconate titanate piezoelectric ceramic material, or a combination of the above materials, and the upper electrode layer and the lower electrode layer are made of aluminum, molybdenum or titanium. , or a combination of the above materials.
在另一实施例中,至少两层压电层夹设于上电极层与下电极层之间,压电叠层结构30还包括夹设于相邻压电层之间的中间电极层。请参见图2和图7,上电极层31与下电极层35之间设有两层压电层,压电叠层结构30包括自上而下依次叠设的上电极层31、上压电层32、中间电极层33、下压电层34以及下电极层35。其中,上压电层32和下压电层34为氮化铝、掺钪氮化铝、氧化锌或锆钛酸铅压电陶瓷材质,或者上述多种材料的组合,上电极层31、中间电极层33和下电极层35为铝、钼或钛材质,或者上述多种材料的组合。In another embodiment, at least two piezoelectric layers are sandwiched between the upper electrode layer and the lower electrode layer, and the piezoelectric laminate structure 30 further includes a middle electrode layer sandwiched between adjacent piezoelectric layers. Referring to FIGS. 2 and 7 , two piezoelectric layers are disposed between the upper electrode layer 31 and the lower electrode layer 35 , and the piezoelectric laminated structure 30 includes an upper electrode layer 31 and an upper piezoelectric layer that are stacked in sequence from top to bottom. layer 32 , intermediate electrode layer 33 , lower piezoelectric layer 34 and lower electrode layer 35 . The upper piezoelectric layer 32 and the lower piezoelectric layer 34 are made of aluminum nitride, scandium-doped aluminum nitride, zinc oxide or lead zirconate titanate piezoelectric ceramic material, or a combination of the above-mentioned materials. The electrode layer 33 and the lower electrode layer 35 are made of aluminum, molybdenum or titanium, or a combination of the above-mentioned materials.
在其他实施例中,压电层的层数还可以为三 层、四层或更多,本实施例对此不做限制。In other embodiments, the number of piezoelectric layers may also be three layers, four layers or more, which is not limited in this embodiment.
本实施例的压电式麦克风100在外部声音信号从声孔中传入时,在声压的作用下,自由部22发生振动,带动压电叠层结构30发生振动,从而使靠近固定部21的压电叠层结构30产生电压信号。在相同面积的悬臂梁20下,通过减小悬臂梁20的质量,使悬臂梁20的自由部能够产生更大的变形,从而提高悬臂梁20的谐振频率,降低麦克风的噪声。In the piezoelectric microphone 100 of this embodiment, when an external sound signal is transmitted from the sound hole, under the action of sound pressure, the free portion 22 vibrates, which drives the piezoelectric laminated structure 30 to vibrate, so that the fixed portion 21 is close to the piezoelectric microphone 100 . The piezoelectric laminate structure 30 generates a voltage signal. Under the cantilever beam 20 of the same area, by reducing the mass of the cantilever beam 20, the free part of the cantilever beam 20 can be deformed more, thereby increasing the resonance frequency of the cantilever beam 20 and reducing the noise of the microphone.
本实施例的压电式麦克风100可用于压电式麦克风装置,压电式麦克风装置包括多个压电式麦克风呈阵列结构分布。多个压电式麦克风可以为并联或串联。压电式麦克风装置包括但不限于话筒、手机、PC和车载语音识别等,通过采用多个压电式麦克风,使产生的电压信号相互叠加,从而有效增强压电式麦克风装置的灵敏度。The piezoelectric microphone 100 of this embodiment can be used in a piezoelectric microphone device, and the piezoelectric microphone device includes a plurality of piezoelectric microphones distributed in an array structure. Multiple piezoelectric microphones can be connected in parallel or in series. Piezoelectric microphone devices include but are not limited to microphones, mobile phones, PCs, and vehicle-mounted voice recognition. By using multiple piezoelectric microphones, the generated voltage signals are superimposed on each other, thereby effectively enhancing the sensitivity of the piezoelectric microphone device.
以上所述的仅是本申请的实施方式,在此应当指出,对于本领域的普通技术人员来说,在不脱离本申请创造构思的前提下,还可以做出改进,但这些均属于本申请的保护范围。The above are only the embodiments of the present application. It should be pointed out that for those of ordinary skill in the art, improvements can be made without departing from the creative concept of the present application, but these belong to the present application. scope of protection.

Claims (9)

1、一种压电式麦克风,其特征在于,包括:1. A piezoelectric microphone, comprising:
具有收容腔的基底;a base with a receiving cavity;
固定于所述基底的悬臂梁,所述悬臂梁包括固定于所述基底上的固定部和自所述固定部延伸并悬设置于所述收容腔上的自由部,所述自由部的厚度小于所述固定部的厚度,或者所述自由部的部分区域的厚度小于所述固定部的厚度;所述悬臂梁包括层叠设置的上电极层与下电极层以及夹设于所述上电极层与所述下电极层之间的至少一层压电层。A cantilever beam fixed on the base, the cantilever beam includes a fixed part fixed on the base and a free part extended from the fixed part and suspended on the receiving cavity, the thickness of the free part is less than The thickness of the fixed part, or the thickness of the part of the free part is smaller than the thickness of the fixed part; the cantilever beam includes an upper electrode layer and a lower electrode layer that are stacked and sandwiched between the upper electrode layer and the lower electrode layer. at least one piezoelectric layer between the lower electrode layers.
2、根据权利要求1所述的压电式麦克风,其特征在于,所述自由部在垂直于所述悬臂梁的振动方向上形成有多个间隔设置的第一凹槽结构,相邻两个所述第一凹槽结构之间形成有第一加强结构。2 . The piezoelectric microphone according to claim 1 , wherein the free portion is formed with a plurality of first groove structures arranged at intervals along the vibration direction perpendicular to the cantilever beam, and two adjacent groove structures are formed. A first reinforcement structure is formed between the first groove structures.
3、根据权利要求2所述的压电式麦克风,其特征在于,所述第一凹槽结构自所述固定部朝向所述自由部的方向延伸,所述第一凹槽结构沿所述振动方向凹陷形成。3. The piezoelectric microphone of claim 2, wherein the first groove structure extends from the fixed portion toward the free portion, and the first groove structure vibrates along the direction of the free portion. Directional depressions are formed.
4、根据权利要求1所述的压电式麦克风,其特征在于,所述自由部包括与所述固定部连接的连接段以及自所述连接段朝向远离所述固定部的方向延伸形成的自由段,所述自由段的厚度小于所述固定部的厚度。4. The piezoelectric microphone according to claim 1, wherein the free portion comprises a connecting segment connected to the fixing portion and a free portion extending from the connecting segment in a direction away from the fixing portion. segment, the thickness of the free segment is smaller than the thickness of the fixed portion.
5、根据权利要求4所述的压电式麦克风,其特征在于,所述自由段在垂直于所述悬臂梁的振动方向上形成有多个间隔设置的第二凹槽结构,相邻两个所述第二凹槽结构之间形成有第二加强结构。5. The piezoelectric microphone according to claim 4, wherein the free segment is formed with a plurality of second groove structures arranged at intervals along the vibration direction perpendicular to the cantilever beam, and two adjacent groove structures are formed. A second reinforcement structure is formed between the second groove structures.
6、根据权利要求5所述的压电式麦克风,其特征在于,所述第二凹槽结构自所述连接段朝向远离所述固定部的方向延伸,所述第二凹槽结构沿所述振动方向凹陷形成。6. The piezoelectric microphone of claim 5, wherein the second groove structure extends from the connecting section in a direction away from the fixing portion, and the second groove structure extends along the The vibration direction concave is formed.
7、根据权利要求1所述的压电式麦克风,其特征在于,所述悬臂梁沿所述悬臂梁的振动方向在所述基底上的正投影的形状为矩形、梯形、三角形和扇形中的一种。7. The piezoelectric microphone according to claim 1, wherein the shape of the orthographic projection of the cantilever beam on the substrate along the vibration direction of the cantilever beam is a rectangle, a trapezoid, a triangle and a fan shape A sort of.
8、根据权利要求1所述的压电式麦克风,其特征在于,所述悬臂梁设置多个,且相邻两个悬臂梁之间设置有间隙。8. The piezoelectric microphone of claim 1, wherein a plurality of cantilever beams are provided, and a gap is provided between two adjacent cantilever beams.
9、根据权利要求1所述的压电式麦克风,其特征在于,至少两层所述压电层夹设于所述上电极层与所述下电极层之间,所述悬臂梁还包括夹设于相邻所述压电层之间的中间电极层。9. The piezoelectric microphone of claim 1, wherein at least two piezoelectric layers are sandwiched between the upper electrode layer and the lower electrode layer, and the cantilever beam further comprises a sandwich The intermediate electrode layer is arranged between the adjacent piezoelectric layers.
  
PCT/CN2020/133741 2020-11-19 2020-12-04 Piezoelectric microphone WO2022104932A1 (en)

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