WO2022099797A1 - 位移装置 - Google Patents

位移装置 Download PDF

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Publication number
WO2022099797A1
WO2022099797A1 PCT/CN2020/131732 CN2020131732W WO2022099797A1 WO 2022099797 A1 WO2022099797 A1 WO 2022099797A1 CN 2020131732 W CN2020131732 W CN 2020131732W WO 2022099797 A1 WO2022099797 A1 WO 2022099797A1
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WIPO (PCT)
Prior art keywords
magnets
magnet
plane
array
frame
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Ceased
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PCT/CN2020/131732
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English (en)
French (fr)
Inventor
丁晨阳
龚威
吴立伟
杨晓峰
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Fudan University
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Fudan University
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Publication of WO2022099797A1 publication Critical patent/WO2022099797A1/zh
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    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K11/00—Structural association of dynamo-electric machines with electric components or with devices for shielding, monitoring or protection
    • H02K11/20—Structural association of dynamo-electric machines with electric components or with devices for shielding, monitoring or protection for measuring, monitoring, testing, protecting or switching
    • H02K11/21—Devices for sensing speed or position, or actuated thereby

Definitions

  • the invention relates to the field of automation equipment, in particular to a displacement device.
  • Microelectronics is a new technology developed with integrated circuits, especially VLSI.
  • Microelectronics technology is the core technology of high-tech and information industry, which has penetrated into all fields of modern technology and social life.
  • the rapid development of microelectronics technology has increased the demand for automation equipment, and put forward higher requirements for the performance and production capacity of automation equipment.
  • displacement devices especially large-stroke displacement device technology
  • the performance and production capacity of automation equipment also put forward higher requirements for the performance of displacement devices such as speed acceleration and positioning accuracy.
  • the traditional large-stroke displacement device usually adopts the technical method of linear motor combined with mechanical guide rail, or the technical method of linear motor combined with air floating guide rail.
  • the technical way of combining the linear motor with the mechanical guide rail introduces mechanical friction, which limits the improvement of performance.
  • the technical method of combining the linear motor with the air-floating guide rail reduces the influence of mechanical friction, but the large-size air-floating support has very high requirements for flatness, which increases the difficulty of processing and manufacturing and increases the production cost;
  • the stroke of the bearing table increases accordingly, which requires the length of the base table to cover the movement stroke to be larger.
  • the increase of the stroke and the requirements of productivity have raised the requirements for the speed, acceleration and motion accuracy of the displacement device, and at the same time require the convenience of the maintenance of the displacement device, as well as the controllable difficulty and cost of processing and manufacturing. This series of requirements all bring huge challenges and tests to traditional technical methods.
  • the purpose of the present invention is to provide a displacement device, which solves the problem that the displacement device is applied to different stroke requirements to achieve different displacements.
  • the present invention provides a displacement device, comprising at least one first frame part and at least one second frame part, each first frame part and the corresponding second frame part can produce relative movement, each A frame portion includes a first frame and a plurality of coil arrays including:
  • first coil array disposed on a first plane of the first frame portion parallel to the first direction, the first coil array including a plurality of first coils, the plurality of first coils being arranged along the first The directions are arranged adjacent to each other;
  • a second coil array is disposed on a second plane of the first frame portion parallel to the first direction, the second coil array includes a plurality of second coils, the plurality of second coils are arranged along the The first directions are arranged adjacently in pairs; wherein, the first plane and the second plane are not parallel to each other;
  • the second frame portion includes a second frame and a plurality of magnet arrays including:
  • the first magnet array is arranged on a third plane of the second frame portion parallel to the first plane, and the projections of the first magnet array and the first coil array respectively on the first plane intersect;
  • a magnet array includes a plurality of first N magnets and a plurality of first S magnets, and the first N magnets and the first S magnets are alternately arranged along the first direction, and the first N magnets and the first S magnets are alternately arranged along the first direction.
  • the magnetization directions of the first S magnets are different from each other;
  • the second magnet array is arranged on the fourth plane of the second frame part parallel to the second plane, and the projections of the second magnet array and the second coil array on the second plane intersect;
  • the first The two-magnet array includes a plurality of second N magnets and a plurality of second S magnets, and the second N magnets and the second S magnets are alternately arranged along the first direction, and the second N magnets and the second S magnets are alternately arranged along the first direction.
  • the magnetization directions of the second S magnets are different from each other;
  • the third plane is disposed opposite and parallel to the first plane
  • the fourth plane is disposed opposite and parallel to the second plane.
  • the technical solution provided by the present invention does not require the use of the air-floating support surface in the existing air-floating guide rail technology, and does not have the difficulty of processing and manufacturing large-sized air-floating support surfaces, as well as the difficulty of assembly and maintenance.
  • the interaction force with the magnet realizes the relative movement of the frame, which can realize different displacements according to various needs, and there is no direct mechanical contact between the frames, which is also convenient for equipment and maintenance operations. For large-scale use, it can effectively reduce Manufacturing and operating costs.
  • each coil array is a multi-dimensional array
  • the first coil array further includes a row configuration along the fourth direction;
  • the second coil array also includes a row configuration along a fifth direction.
  • the plurality of coil arrays further comprise:
  • a third coil array is disposed on a fifth plane of the first frame portion parallel to the first direction, the third coil array includes a plurality of third coils, and the plurality of third coils are arranged along the The first direction is adjacently arranged in pairs;
  • At least two of the first plane, the second plane and the fifth plane are not parallel to each other;
  • the plurality of magnet arrays also include:
  • the third magnet array is arranged on the sixth plane of the second frame part that is parallel to the fifth plane, and the projections of the third magnet array and the third coil array on the fifth plane respectively intersect;
  • the third magnet array includes a plurality of third N magnets and a plurality of third S magnets, and the third N magnets and the third S magnets are alternately arranged along the first direction, and the third N magnets and the third S magnets are alternately arranged along the first direction.
  • the magnetization directions of the third S magnets are different from each other.
  • the plurality of coil arrays further comprise:
  • a fourth coil array disposed on a seventh plane of the first frame portion parallel to the first direction, the fourth coil array including a plurality of fourth coils, the plurality of fourth coils extending along the The first direction is adjacently arranged in pairs;
  • At least two of the first plane, the second plane, the fifth plane and the seventh plane are not parallel to each other;
  • the plurality of magnet arrays also include:
  • a fourth magnet array is arranged on an eighth plane of the second frame portion parallel to the seventh plane, and the projections of the fourth magnet array and the fourth coil array on the seventh plane intersect;
  • the fourth magnet array at least includes a plurality of fourth N magnets and a plurality of fourth S magnets, and the fourth N magnets and the fourth S magnets are alternately arranged along the first direction, and the fourth N magnets are arranged alternately along the first direction.
  • the magnetization directions of the fourth S magnet are different from each other.
  • the first plane is coplanar with the fifth plane, the first plane is orthogonal to the second plane, and the fifth plane is orthogonal to the seventh plane.
  • each coil array is a multi-dimensional array
  • the fourth coil array further includes a row configuration along the seventh direction;
  • the third coil array also includes a row configuration along a sixth direction.
  • the first magnet array further includes a first H magnet, the plurality of first H magnets are disposed between the first N magnet and the first S magnet, and the first The N magnets and the first S magnets are alternately arranged along the first direction, and the magnetization direction of the first H magnet is directed from the adjacent first S magnet to the first N magnet, and is parallel to the first direction ;
  • the second magnet array further includes a second H magnet, the plurality of second H magnets are disposed between the second N magnet and the second S magnet, and the second N magnet and the second magnet The two S magnets are alternately arranged along the first direction, and the magnetization direction of the second H magnet is directed from the adjacent second secondary S magnet to the second N magnet, and is parallel to the first direction.
  • the displacement device further includes a first position sensor
  • One of the dimensions of the first magnet array and the first coil array in the second direction, respectively, has a dimensional difference portion less than the other, the dimensional difference portion forming a first difference space, and the first position sensor is located in the first difference space for measuring the movement displacement generated along the first direction;
  • the displacement device further includes a second position sensor
  • One of the dimensions of the second magnet array and the second coil array respectively along the third direction has a dimensional difference portion less than the other, the dimensional difference portion forming a second difference space, the second A position sensor is located in the second differential space for measuring the movement displacement along the first direction.
  • the displacement device further includes a third position sensor
  • Either one of the dimensions of the third magnet array and the third coil array in the second direction has a dimensional difference portion less than the other, and the dimensional difference portion forms a third difference space, and the third a position sensor is located in the third difference space for measuring the movement displacement along the first direction;
  • the displacement device further includes a fourth position sensor
  • One of the dimensions of the fourth magnet array and the fourth coil array respectively along the third direction has a dimensional difference portion less than the other, the dimensional difference portion forming a fourth difference space, the fourth A position sensor is located in the fourth differential space for measuring the movement displacement along the first direction.
  • the displacement device further includes a power amplifier for driving the plurality of coil arrays to generate a first magnetic field, respectively interacting with the second magnetic field generated by the plurality of magnet arrays to generate a magnetic field along the first magnetic field. relative motion in the direction.
  • the displacement device includes at least two first frame parts; the at least two first frame parts are respectively controlled by independent drives; and/or
  • the displacement device includes at least one second frame portion, and the at least one second frame portion is linearly extended along the first direction by mechanical splicing.
  • the displacement device includes at least one first frame portion
  • the at least one first frame portion is linearly extended along the first direction by mechanical splicing; and/or
  • the displacement device includes at least two second frame parts; the at least two second frame parts are controlled by independent drives, respectively.
  • FIG. 1 is a perspective view of a displacement device according to a first embodiment of the present invention
  • FIG. 3 is an X-Z view of the first magnet array and the first coil array of the first embodiment of the present invention
  • FIG. 4 is a schematic diagram of the Lorentz force and torque of the displacement device according to the first embodiment of the present invention.
  • FIG. 5 is a schematic diagram of the self-stabilizing rotation adjustment mechanism of the first embodiment of the present invention.
  • FIG. 6 is a schematic diagram of a position sensor configuration according to the first embodiment of the present invention.
  • FIG. 7 is a perspective view of a displacement device according to a second embodiment of the present invention.
  • FIG. 8 is a schematic diagram of the Lorentz force and torque of the displacement device of the second embodiment of the present invention.
  • FIG. 9 is a perspective view of a displacement device according to a third embodiment of the present invention.
  • FIG. 10 is a perspective view of a coil array corresponding to a magnet array according to some embodiments of the present invention.
  • Fig. 11 is a perspective view of a displacement device of a multi-stage according to some embodiments of the present invention.
  • FIG. 12 is a perspective view of another multi-stage displacement device according to some embodiments of the present invention.
  • the exercise device 10 includes a first frame portion 11 and a second frame portion 12 disposed opposite to the first frame portion 11 , and the second frame portion 12 is located at the bottom and the outer side relative to the first frame portion 11 . It is a semi-enclosed structure; the first frame part 11 can produce displacement movement relative to the second frame part 12 .
  • the first frame portion 11 includes a first frame and a plurality of coil arrays.
  • the plurality of coil arrays namely the first coil array 111 and the second coil array 112 are respectively fixed and arranged on two planes of the first frame, That is, the first plane 21 and the second plane 22 .
  • the two planes are both parallel to the first direction (X direction), and the first plane 21 and the second plane 22 are not parallel to each other.
  • the first plane 21 is orthogonal to the second plane 22
  • the first plane 21 is orthogonal to the third direction (Z direction)
  • the second plane 22 is orthogonal to the second direction (Y direction).
  • the first plane 21 and the second plane 23 may not be orthogonal, and the two planes may form a certain angle, which is not specifically limited here.
  • the first frame portion 11 and the second frame portion 12 can also be placed vertically or placed in any direction in other spaces, which are not specifically limited here.
  • the X direction is the first direction
  • the Y direction is the second direction
  • the Z direction is the third direction for description.
  • any direction in the three-dimensional rectangular coordinate system may be used as the first direction
  • the other two directions may be used as the second direction and the third direction to implement the various embodiments of the present invention, which will not be repeated hereinafter.
  • the first coil array 111 includes a plurality of first coils 115
  • the second coil array 112 includes a plurality of second coils 116 , wherein the plurality of first coils 115 and the plurality of second coils 116 are respectively along the They are arranged adjacent to each other in the X direction.
  • the second frame portion 12 includes a second frame and a plurality of magnet arrays.
  • the plurality of coil arrays namely the first magnet array 121 and the second magnet array 122, are fixedly arranged on two planes of the second frame, respectively. That is, the third plane 23 and the fourth plane 24 , wherein the third plane 23 is disposed opposite and parallel to the first plane 21 , and the fourth plane 24 is disposed opposite and parallel to the second plane 22 .
  • the first magnet array 121 includes a plurality of first magnets 125, and the first magnets 125 include at least two kinds of magnets with different magnetization directions, that is, a first N magnet 125A and a first S magnet 125B, The first N magnets 125A and the first S magnets 125B are alternately arranged in the X direction.
  • the second magnet array 122 shown in FIG. 1 includes a plurality of second magnets 126, and the second magnets 126 include at least two kinds of magnets with different magnetization directions, ie, a second N magnet and a second S magnet, the second magnet 126 is similar to the first magnet 125 and will not be repeated here.
  • the N magnet and S magnet mentioned above are named according to the functional surface used.
  • the magnet usually includes an N-pole surface and an S-pole surface.
  • the magnet is called For the N magnet
  • the magnet is called the S magnet.
  • the first magnet 125 may include three types of magnets, ie, a first N magnet 125A, a first S magnet 125B, and a first H magnet 125C, as shown in FIGS. 2 and 3 .
  • the first H magnets 125C are disposed between the first N magnets 125A and the first S magnets 125B, and the first N magnets 125A and the first S magnets 125B are alternately arranged in the X direction.
  • the magnetization directions of the first H magnets 125C are phase-dependent.
  • the adjacent first S magnet 125B points to the first N magnet 125A and is parallel to the X direction.
  • the H magnet is named according to the functional surface it uses. Specifically, the H magnet is located between the N magnet and the S magnet. When the magnetic field of the magnet needs to be directed from the adjacent S magnet to the N magnet, the magnet is called H magnet.
  • the names of the H magnets mentioned below are the same, and are not repeated for the sake of brevity.
  • the magnetization directions of each of the first N magnets 125A and the first S magnets 125B of the first magnet array 121 are orthogonal to the third plane 23 , and the magnetization directions of the first N magnets 125A point to For the first coil 115 , the magnetization direction of the first S magnet 125B is away from the first coil 115 of the first coil array 111 .
  • the magnetization direction of the first H magnet 125C is parallel to the X direction, and is directed from the adjacent first S magnet 125B to the adjacent first N magnet 125A, thereby providing a magnetic field space.
  • the second magnet 126 in FIG. 1 may also include three types of magnets arranged in the same arrangement to strengthen the magnetic field where the second coil 116 is located, which will not be repeated here.
  • FIG. 4 is a schematic diagram corresponding to the Lorentz force and torque of the displacement device of the first embodiment.
  • the first coil array 111 is supplied with a driving current
  • the first coil array 111 and the first magnet array 121 generate The interaction can drive the first frame portion 11 to translate relative to the second frame portion 12 along the X and Z directions in FIG. 1 , and the first frame portion 11 to rotate relative to the second frame portion 12 along the Y direction.
  • the second coil array 112 interacts with the second magnet array 122, which can drive the first frame portion 11 to move relative to the second frame portion 12 along the X direction and the Y direction.
  • the first frame part 11 rotates along the Z direction relative to the second frame part 12 .
  • the technical solution provided by the present invention does not require the use of the air-floating support surface in the existing air-floating guide rail technology, and does not have the difficulty of processing and manufacturing large-scale air-floating support surfaces, as well as the difficulty of assembly and maintenance.
  • the interaction force between the frames realizes the relative movement of the frames, which can realize different displacements according to various needs, and there is no direct mechanical contact between the frames, which is also convenient for equipment and maintenance operations. For large-scale use, it can effectively reduce manufacturing costs. and cost of use.
  • the self-stable rotation adjustment mechanism between the first frame portion 11 and the second frame portion 12.
  • a frame portion 11 is deflected in the X direction relative to the second frame portion 12, causing the gap between the first coil array 111 and the first magnet array 121 or the gap between the second coil array 112 and the second magnet array 122 to be larger or smaller
  • the self-stable rotation adjustment mechanism adjusts the reverse rotation of the first frame portion 11 relative to the second frame portion 12 in the X direction, so as to keep the gap between the first frame portion 11 and the second frame portion 12 uniform.
  • the self-stabilizing rotation adjustment mechanism between the first frame portion and the second frame portion in the embodiment of the present invention is based on the balance of force and torque between the coil array and the magnet array.
  • the corresponding force and torque also change, resulting in a displacement that tends to the equilibrium point, thereby maintaining the stability of the gap between the coil array and the magnet array.
  • the displacement device further includes a first position sensor, and one of the dimensions of the first magnet array and the first coil array along the second direction has a dimensional difference portion less than the other, the dimensional difference portion A first difference space is formed, and the first position sensor is located in the first difference space to measure the movement displacement along the first direction.
  • the size of the first magnet array 121 along the Y direction is different from the size of the first coil array 111 along the Y direction.
  • the first magnet array 121 has a portion protruding from the first coil array 111 along the Y direction, and the first coil array 111 forms a first magnet array 121 along the Y direction corresponding to the first magnet array 121.
  • a difference space, the first difference space can be used to configure the first position sensor 16a.
  • the A coil array 111 has a portion protruding from the first magnet array 121 along the Y direction, and the first magnet array 121 also forms a first differential space corresponding to the first coil array 111 along the Y direction, which can be used to configure the first position sensor 16a, the first position sensor 16a is used to measure the long-distance displacement generated in the X direction.
  • the first position sensor 16a may be a Hall sensor, or other sensors, which are not specifically limited.
  • the second magnet array 122 and the second coil array 112 are also similar to the first magnet array 121 and the first coil array 111 described above, that is, the second magnet array 122 and the second coil array 112 form a second difference space.
  • the second position sensor 16b may be of the same type as the first position sensor 16a, or may be of a different type, which will not be repeated here.
  • both of the two position sensors can be used to measure the displacement in the X direction, so the two sensors can not work at the same time, and when one of them is in a working state, the other can be in a standby state.
  • the two sensors can be set for mutual calibration. Specifically, a first difference can be set, wherein the first difference is the measured value of the first position sensor somewhere and the second position. The difference between the measured values of the sensors, the system can determine that when the first difference exceeds a preset threshold, at least one position sensor is not working properly, so as to better control the risk of position sensor errors.
  • a second embodiment of the present invention relates to a displacement device.
  • the second embodiment is based on the extension of the first embodiment, and the main difference is that, as shown in FIG. 7 , the first frame part 11 of the displacement device 10 of the second embodiment further includes a third coil array 113 .
  • the third coil array 113 is fixedly arranged on the fifth plane 25 of the first frame, and the fifth plane 25 is parallel to the X direction.
  • at least two of the fifth plane 25 , the first plane 21 and the second plane 22 are not parallel to each other. That is to say, the fifth plane 25 may be coplanar with or parallel to the first plane 21 , or may be orthogonal to the first plane 21 .
  • the fifth plane 25 is coplanar with the first plane 21
  • the fifth plane 25 is orthogonal to the second plane 22
  • the fifth plane 25 is orthogonal to the Z direction.
  • the second frame portion 12 in FIG. 7 further includes a third magnet array 123, and the third magnet array 123 is fixedly arranged on the sixth plane 26 of the second frame, wherein the sixth plane 26 is parallel and opposite to the fifth plane 25.
  • the sixth plane 26 is coplanar with the third plane 23 .
  • the specific arrangement of the third coil array 113 is similar to that of the first coil array 111 , and the specific arrangement of the third magnet array 123 is similar to that of the first magnet array 121 , which will not be repeated here.
  • FIG. 8 is a schematic diagram of the Lorentz force and torque of the displacement device according to the second embodiment of the present invention.
  • the third coil array 113 is supplied with a driving current
  • the third coil array 113 and the third magnet array 123 The interaction causes the first frame portion 11 to translate relative to the second frame portion 12 in the X and Z directions in FIG. 7 , and the first frame portion 11 to rotate relative to the second frame portion 12 in the Y direction.
  • the interaction between the third coil array 113 and the third magnet array 123 and the interaction between the first coil array 111 and the first magnet array 121 generate a torque along the X direction, causing the first frame portion 11 to face each other.
  • the second frame portion 12 is rotated in the X direction.
  • the displacement device 10 of the second embodiment by adding a set of coil arrays 113 and magnet arrays 123, the torque along the X direction is strengthened, and the motion state in the X direction is stabilized.
  • the third magnet array 123 and the second coil array 113 are also similar to the first magnet array 121 and the first coil array 111 described above, and the third magnet array 123 and its corresponding third coil array 113 are formed A third difference space is used to configure the third position sensor, which will not be repeated here.
  • all three position sensors in this implementation can be used to measure the displacement in the X direction, so the three position sensors can not work at the same time, and when one of them is in a working state, the other two can be in a standby state.
  • three sensors can also be used to calibrate each other.
  • three position sensors can be set by setting a first threshold. If the difference between the measurement value of the first position sensor and the measurement value of the second position sensor does not exceed the first threshold value , and the difference between the measurement value of the second position sensor and the measurement value of the third position sensor exceeds the first threshold value, it can be preliminarily determined that there is a problem with the third position sensor or the error exceeds the allowable range, and the third position sensor can be checked. Check or replace, etc.
  • a third embodiment of the present invention relates to a displacement device.
  • the third embodiment is an extension based on the second embodiment, and the main difference is that, as shown in FIG. 9 , in the displacement device 10 of the third embodiment, the first frame part 11 further includes a fourth coil array 114 , and the fourth The coil array 114 is fixedly arranged on the seventh plane 27 of the first frame, the seventh plane 27 is spaced apart from the second plane 22 of the first frame portion 11 , the seventh plane 27 is parallel to the X direction, and the second frame portion 12 is opposite to the second plane 22 of the first frame portion 11 .
  • a frame part 11 is located at the bottom and the outer part forms a semi-enclosed structure.
  • the seventh plane 27 is parallel to the second plane 22, and the seventh plane 27 is orthogonal to the Y direction.
  • the second frame portion 12 further includes a fourth magnet array 124 , and the fourth magnet array 124 is arranged on the eighth plane 28 of the second frame, wherein the eighth plane 28 is parallel and opposite to the seventh plane 27 . .
  • the specific arrangement of the fourth coil array 114 is similar to that of the second coil array 112 , and the specific arrangement of the fourth magnet array 124 is similar to that of the second magnet array 122 , which will not be repeated here.
  • the fourth coil array 114 After the fourth coil array 114 is supplied with the driving current, the fourth coil array 114 interacts with the fourth magnet array 124, causing the first frame portion 11 to translate relative to the second frame portion 12 along the X and Y directions, and the first The frame portion 11 rotates in the Z direction relative to the second frame portion 12 .
  • the interaction between the fourth coil array 114 and the fourth magnet array 124 and the interaction between the second coil array 112 and the second magnet array 122 strengthen the Y direction of the first frame portion 11 relative to the second frame portion 12 The translation in the direction, and the rotation in the Z direction.
  • the displacement device 10 of the third embodiment has an additional set of coil arrays 114 and magnet arrays 124 .
  • the four sets of coil arrays are in a U-shaped symmetrical layout, that is, the first coil array 111 is symmetrical with the third coil array 113 , and the second coil array 112 is symmetrical with the fourth coil array 114 .
  • the U-shaped symmetrical layout enhances the Lorentz force and torque in all directions.
  • the mechanical resonance generated by the flexible mode is suppressed through redundant control.
  • each coil array is a multi-dimensional array; wherein, the first coil array further includes a row configuration along the fourth direction; the second coil array further includes a row configuration along the fifth direction; the third coil array The array also includes a row configuration in a sixth direction; the second coil array further includes a row configuration in a seventh direction.
  • each coil array on the first frame portion 11 can be a multi-dimensional array, that is, it includes a column configuration along the X direction, a row configuration along the Y direction, and a vertical configuration along the Z direction. Increase the degree of freedom of the interaction force between the magnet and the coil.
  • each coil array on the first frame portion 11 is a two-dimensional array, including not only a column configuration along the X direction, but also a row configuration along the Y direction.
  • the first coil array 111 also includes a fourth direction array.
  • the fourth direction is the same as the Y direction.
  • the fourth direction can also be other directions at any angle with the Y direction.
  • the first coils 115 of the first coil array 111 not only are arranged adjacently in pairs along the X direction, but also include a row arrangement along the Y direction,
  • the first coil array 111 is configured with two adjacent first coils 115 as a row along the Y direction, and the first magnet array 121 extends linearly along the Y direction, wherein the projection of the first coil array 111 on the first plane is the same as the first coil array 111 .
  • the projections of a magnet array 121 on the first plane intersect.
  • the first coil array 111 includes a row configuration in a fourth direction (preferably the Y direction) in addition to the column configuration in the first direction (X direction).
  • a fourth direction preferably the Y direction
  • the interaction between the first coil array 111 and the first magnet array 121 adds a torque along the first direction (X direction), which can cause the first One frame part 11 rotates relative to the second frame part 12 in the first direction (X direction).
  • the use of this array configuration and implementation improves the adjustment ability and stability of the first coil array 111 itself.
  • the second coil array 112 , the third coil array 113 and the fourth coil array 114 in FIG. 9 can also be configured with column and row configurations of multi-dimensional arrays.
  • the displacement device in some embodiments includes at least two first frame parts and at least one second frame part; in the first direction, the length of the first frame part is smaller than the length of the second frame part, and at least two The first frame parts are spaced apart from each other along the first direction on at least one second frame part, the at least two first frame parts are respectively controlled by independent drives, and the at least one second frame part passes along the first direction
  • the mechanical splicing linearly extends to form a whole.
  • the displacement device 10 includes two first frame parts 11 and two second frame parts 12 , and the two first frame parts 11 can be driven and controlled independently of each other, so as to serve as the first frame parts 11 respectively.
  • a workbench and a second workbench a second workbench.
  • the two second frame parts 12 are formed as a base by linearly extending along the X direction. Specifically, the connection can be realized by mechanical splicing. It can be spliced on the tooling stand or spliced with its own buckle. There are no restrictions.
  • the two first frame parts are spaced apart from each other and arranged on the two second frame parts spliced into one body. At least two first frame parts 11 and at least one second frame part 12 form a multi-stage displacement device system.
  • the embodiment of the present invention greatly increases the freedom of operation of the worktable by independently driving the first worktable and the second worktable, thereby improving the work efficiency, and by adopting a modular design to meet the expansion requirements of the motion system, Extending the motion system does not require redesigning a new structure, making maintenance more convenient, and can effectively reduce manufacturing and use costs.
  • the displacement device in some embodiments includes at least one first frame part and at least two second frame parts, the length of the first frame part is greater than the length of the second frame part in the first direction, and at least two The at least one second frame portion is spaced apart from each other along the first direction on the at least one first frame portion, the at least one first frame portion is linearly extended along the first direction through mechanical splicing to form an integral body, and the at least two second frame portions are respectively Controlled by independent drives.
  • the displacement device 10 includes two first frame parts 11 and two second frame parts 12 . As a base, the first frame portion 11 can extend linearly or substantially linearly along the X direction to form an integral body.
  • connection can be realized by mechanical splicing, splicing on the tooling platform, or using its own buckle. Splicing is not limited here.
  • the two second frame parts 12 can also be independently driven and controlled to serve as the first workbench and the second workbench respectively.
  • the two second frame parts are spaced apart from each other on the two first frame parts which are spliced into one body as a base.
  • the at least one first frame portion 11 and the at least two second frame portions 12 form a multi-stage displacement device system.
  • the embodiment of the present invention greatly increases the freedom of operation of the worktable by independently driving the first worktable and the second worktable, thereby improving the work efficiency, and can meet the expansion requirements of the motion system by adopting a modular design , to extend the motion system, no need to redesign a new structure, maintenance is more convenient, and production and use costs can be effectively reduced.
  • the multi-table displacement device provided by the present invention can be applied to the motion table system of automatic equipment, and the motion table system of the above-mentioned automatic equipment can adjust the first frame according to the actual motion stroke and the requirements of control strategy planning.
  • the relative position of the part and the second frame part, and the number of configurations of the two can be applied to the motion table system of automatic equipment, and the motion table system of the above-mentioned automatic equipment can adjust the first frame according to the actual motion stroke and the requirements of control strategy planning.
  • the relative position of the part and the second frame part, and the number of configurations of the two are examples of the multi-table displacement device provided by the present invention.

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Abstract

本发明公开了一种位移装置，包括至少一个第一框架部和至少一个第二框架部，每个第一框架部和对应的第二框架部可以产生相对运动，第一框架部包括第一框架和多个线圈阵列，多个线圈阵列配置在第一框架的多个平面上，每个线圈阵列包括多个线圈，多个线圈沿第一方向两两相邻配置，第二框架部包括第二框架和多个磁体阵列，多个磁体阵列配置在第二框架的多个平面上，每个磁体阵列包含多个磁体，多个磁体中至少两个磁体具有相互不同的磁化方向，每一磁体沿第一方向交替排列，本位移装置实现各框架之间的相对运动，可根据各种需求实现不同距离位移，框架间无直接机械式接触，也方便于装备和维护操作，对于规模化的使用，能有效降低制造和使用成本。

Description

位移装置
相关申请交叉引用
本专利申请要求于2020年11月12日提交的、申请号为202011261343.5、发明名称为“位移装置”的中国专利申请的优先权，上述申请的全文以引用的方式并入本文中。
技术领域
本发明涉及自动化装备领域，具体涉及一种位移装置。
背景技术
微电子技术是随着集成电路，尤其是超大规模集成电路而发展起来的一门新的技术。微电子技术是高科技和信息产业的核心技术，已经渗入到现代技术和社会生活的各个领域。微电子技术的迅速发展，对自动化装备的需求越来越大，对自动化装备的性能和产能也提出了更高的要求。
在自动化装备制造领域，位移装置尤其是大行程位移装置技术是自动化装备制造系统的核心技术，一直受到行业内的高度重视。自动化装备的性能和产能，也对位移装置的速度加速度和定位精度等性能提出了更高的要求。传统的大行程位移装置，通常采用直线电机结合机械导轨的技术方式，或者采用直线电机结合气浮导轨的技术方式。直线电机结合机械导轨的技术方式，引入了机械摩擦，限制了性能的提高。直线电机结合气浮导轨的技术方式，虽然降低了机械摩擦的影响，但大尺寸的气浮支撑面对平整度要求非常高，增加了加工制造难度，提高了生产成本；随着位移装置的工位增加，承载台的行程随之增大，就要求基座台覆盖运动行程的长度尺寸要更大。而行程的增大和产率的要求，又对位移装置的速度加速度和运动精度等指标提高了要求，同时又要求位移装置维护的便利性，以及要求加工制造难度和成本可控。这一系列的要求都对传统技术方式带来巨大的挑战和考验。
发明内容
本发明的目的是提供一种位移装置，解决位移装置应用于不同行程需求实现不同位移的问题。
为实现上述目的，本发明提供了一种位移装置，包括至少一个第一框架部和至少一个第二框架部，每个第一框架部与对应的第二框架部可以产生相对运动，每个第一框架部包括第一框架和多个线圈阵列，所述多个线圈阵列包括：
第一线圈阵列，配置在与第一方向平行的所述第一框架部的第一平面上，所述第一线圈阵列包括多个第一线圈，所述多个第一线圈沿所述第一方向两两相邻配置；
第二线圈阵列，配置在与所述第一方向平行的所述第一框架部的第二平面上，所述第二线圈阵列包括多个第二线圈，所述多个第二线圈沿所述第一方向两两相邻配置；其中，所述第一平面和所述第二平面相互不平行；
所述第二框架部包括第二框架和多个磁体阵列，所述多个磁体阵列包括：
第一磁体阵列，配置在与第一平面平行的所述第二框架部的第三平面上，所述第一磁体阵列与第一线圈阵列分别在第一平面上的投影有交集；所述第一磁体阵列包括多个第一N磁体和多个第一S磁体，且所述第一N磁体与所述第一S磁体沿所述第一方向交替排列，所述第一N磁体与所述第一S磁体的磁化方向相互不同；
第二磁体阵列，配置在与第二平面平行的所述第二框架部的第四平面上，所述第二磁体阵列与第二线圈阵列分别在第二平面上的投影有交集；所述第二磁体阵列包括多个第二N磁体和多个第二S磁体，且所述第二N磁体与所述第二S磁体沿所述第一方向交替排列，所述第二N磁体与所述第二S磁体的磁化方向相互不同；
其中，所述第三平面相对设置且平行于所述第一平面，所述第四平面相对设置且平行于所述第二平面。
本发明提供的技术方案，由于不需要采用现有的气浮导轨技术中的气浮支撑面，没有了大尺寸气浮支撑面的加工制造难度问题，以及装配维护困难问题，本发明通过通电线圈与磁体之间的相互作用力实现框架的相对运动，可根据各种需求实现不同位移，而框架之间无直接机械式接触，也方便于装备和维护操作，对于规模化的使用，能有效降低制造成本和使用成本。
在一个实施例中，每个线圈阵列为一个多维阵列；
其中，所述第一线圈阵列还包括沿第四方向的行配置；和/或
所述第二线圈阵列还包括沿第五方向的行配置。
在一个实施例中，所述多个线圈阵列还包括：
第三线圈阵列，配置在与所述第一方向平行的所述第一框架部的第五平面上，所述第三线圈阵列包括多个第三线圈，所述多个第三线圈沿所述第一方向两两相邻配置；
其中，所述第一平面、所述第二平面和所述第五平面，至少有两个平面相互不平行；
所述多个磁体阵列还包括：
第三磁体阵列，配置在与第五平面平行的所述第二框架部的第六平面上，所述第三磁体阵列与所述第三线圈阵列分别在第五平面上的投影有交集；所述第三磁体阵列包括多个第三N磁体和多个第三S磁体，且所述第三N磁体与所述第三S磁体沿所述第一方向交替排列，所述第三N磁体与所述第三S磁体的磁化方向相互不同。
在一个实施例中，所述多个线圈阵列还包括：
第四线圈阵列，配置在与所述第一方向平行的所述第一框架部的第七平面上，所述第四线圈阵列包括多个第四线圈，所述多个第四线圈沿所述第一方向两两相邻配置；
所述第一平面、所述第二平面、所述第五平面和所述第七平面中至少有两个平面相互不平行；
所述多个磁体阵列还包括：
第四磁体阵列，配置在与所述第七平面平行的所述第二框架部的第八平面上，所述第四磁体阵列与第四线圈阵列分别在第七平面上的投影有交集；所述第四磁体阵列至少包括多个第四N磁体和多个第四S磁体，且所述第四N磁体与所述第四S磁体沿所述第一方向交替排列，所述第四N磁体与所述第四S磁体的磁化方向相互不同。
在一个实施例中，所述第一平面与所述第五平面共面，所述第一平面正交于所述第二平面，所述第五平面正交于所述第七平面。
在一个实施例中，每个线圈阵列为一个多维阵列；
其中，所述第四线圈阵列还包括沿第七方向的行配置；和/或
所述第三线圈阵列还包括沿第六方向的行配置。
在一个实施例中，所述第一磁体阵列还包括第一H磁体，所述多个第一H磁体配置在所述第一N磁体和所述第一S磁体之间，且所述第一N磁体和所述第一S磁体沿所述第一方向交替排列，所述第一H磁体的磁化方向由相邻的第一次S磁体指向第一N磁体，且与所述第一方向平行；
和/或
所述第二磁体阵列还包括第二H磁体，所述多个第二H磁体配置在所述第二N磁体和所述第二S磁体之间，且所述第二N磁体和所述第二S磁体沿所述第一方向交替排列，所述第二H磁体的磁化方向由相邻的第二次S磁体指向第二N磁体，且与所述第一方向平行。
在一个实施例中，所述位移装置还包括第一位置传感器；
所述第一磁体阵列和所述第一线圈阵列分别沿第二方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第一差别空间，所述第一位置传感器位于所述第一差别空间内，用以测量沿所述第一方向上产生的运动位移；
和/或
所述位移装置还包括第二位置传感器；
所述第二磁体阵列和所述第二线圈阵列分别沿所述第三方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第二差别空间，所述第二位置传感器位于所述第二差别空间内，用以测量沿所述第一方向上产生的运动位移。
在一个实施例中，所述位移装置还包括第三位置传感器；
所述第三磁体阵列和所述第三线圈阵列分别沿所述第二方向的尺寸中任一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第三差别空间，所述第三位置传感器位于所述第三差别空间内，用以测量沿所述第一方向上产生的运动位移；
和/或
所述位移装置还包括第四位置传感器；
所述第四磁体阵列和所述第四线圈阵列分别沿所述第三方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第四差别空间，所 述第四位置传感器位于所述第四差别空间内，用以测量沿所述第一方向上产生的运动位移。
在一个实施例中，所述位移装置还包括功率放大器，用来驱动所述多个线圈阵列产生第一磁场，分别和所述多个磁体阵列产生的第二磁场作用，产生沿所述第一方向上的相对运动。
在一个实施例中，所述位移装置包括至少两个第一框架部；所述至少两个第一框架部分别通过独立驱动控制；和/或
所述位移装置包括至少一个第二框架部，所述至少一个第二框架部沿所述第一方向通过机械拼接实现线性延伸。
在一个实施例中，所述位移装置包括至少一个第一框架部；
所述至少一个第一框架部沿所述第一方向通过机械拼接实现线性延伸；和/或
所述位移装置包括至少两个第二框架部；所述至少两个第二框架部分别通过独立驱动控制。
附图说明
图1是本发明第一实施例的位移装置的立体图；
图2是本发明第一实施例的第一磁体阵列的X-Y视图；
图3是本发明第一实施例的第一磁体阵列和第一线圈阵列的X-Z视图；
图4是本发明第一实施例的位移装置的洛伦兹力和转矩的示意图；
图5是本发明第一实施例的自稳定转动调节机制的示意图；
图6是本发明第一实施例的位置传感器配置的示意图；
图7是本发明第二实施例的位移装置的立体图；
图8是本发明第二实施例的位移装置的洛伦兹力和转矩的示意图；
图9是本发明第三实施例的位移装置的立体图；
图10是本发明部分实施例的一种线圈阵列对应磁体阵列的立体图；
图11是本发明部分实施例的一种多工作台的位移装置的立体图；
图12是本发明部分实施例的另一种多工作台的位移装置的立体图。
具体实施例
以下将结合附图对本发明的各实施例进行详细说明，以便更清楚理解本发明的目的、特点和优点。应理解的是，附图所示的实施例并不是对本发明范围的限制，而只是为了说明本发明技术方案的实质精神。
在下文的描述中，出于说明各种公开的实施例的目的阐述了某些具体细节以提供对各种公开实施例的透彻理解。但是，相关领域技术人员将认识到可在无这些具体细节中的一个或多个细节的情况来实践实施例。在其它情形下，与本申请相关联的熟知的装置、结构和技术可能并未详细地示出或描述从而避免不必要地混淆实施例的描述。
除非语境有其它需要，在整个说明书和权利要求中，词语“包括”和其变型，诸如“包含”和“具有”应被理解为开放的、包含的含义，即应解释为“包括，但不限于”。
在整个说明书中对“一个实施例”或“一实施例”的提及表示结合实施例所描述的特定特点、结构或特征包括于至少一个实施例中。因此，在整个说明书的各个位置“在一个实施例中”或“在一实施例”中的出现无需全都指相同实施例。另外，特定特点、结构或特征可在一个或多个实施例中以任何方式组合。
如该说明书和所附权利要求中所用的单数形式“一”和“所述”包括复数指代物，除非文中清楚地另外规定。应当指出的是术语“或”通常以其包括“和/或”的含义使用，除非文中清楚地另外规定。
在以下描述中，为了清楚展示本发明的结构及工作方式，将借助诸多方向性词语进行描述，但是应当将“前”、“后”、“左”、“右”、“外”、“内”、“向外”、“向内”、“上”、“下”等词语理解为方便用语，而不应当理解为限定性词语。
下文参照附图描述本发明的第一实施例。如图1中所示的运动装置10，包括第一框架部11和与第一框架部11相对设置的第二框架部12，且第二框架部12相对第一框架部11位于底部和外侧部呈半包围结构；第一框架部11可以相对于第二框架部12产生位移运动。第一框架部11包括第一框架和多个线圈阵 列，本发明实施例中多个线圈阵列即第一线圈阵列111和第二线圈阵列112，分别固定配置在第一框架的两个平面上，即第一平面21和第二平面22。其中，这两个平面都与第一方向(X方向)平行，第一平面21与第二平面22相互不平行。优选地，第一平面21与第二平面22正交，第一平面21与第三方向(Z方向)正交，第二平面22与第二方向(Y方向)正交。可以理解的是，第一平面21与第二平面23也可以不正交，两个平面可以成一定角度，这里不做具体限制。需要说明的是，第一框架部11和第二框架部12也可以垂直放置或其他空间内任意方向放置，这里不做具体限制。另外，本发明实施例中以X方向为第一方向，Y方向为第二方向，Z方向为第三方向为例进行描述，然而，本领域技术人员可以理解，本发明并不局限于此，而是可以以三维直角坐标系中的任意方向来作为第一方向，另外两个方向分别作为第二方向和第三方向来实现本发明的各个实施例，下文中不再重复。
如图1所示，第一线圈阵列111包括多个第一线圈115，第二线圈阵列112包括多个第二线圈116，其中，多个第一线圈115和多个第二线圈116都分别沿X方向两两相邻配置。第二框架部12包括第二框架和多个磁体阵列，本发明实施例中多个线圈阵列即第一磁体阵列121和第二磁体阵列122，分别固定配置在第二框架的两个平面上，即第三平面23和第四平面24，其中，第三平面23相对设置且平行于第一平面21，第四平面24相对设置且平行于第二平面22。
如图1和图2所示，第一磁体阵列121包括多个第一磁体125，第一磁体125包括至少两种具有不同磁化方向的磁体，即第一N磁体125A和第一S磁体125B，第一N磁体125A与第一S磁体125B沿X方向交替排列。另外，图1中所示的第二磁体阵列122包括多个第二磁体126，第二磁体126包括至少两种具有不同磁化方向的磁体，即第二N磁体和第二S磁体，第二磁体126类似于第一磁体125，这里不再赘述。其中，上文中提到的N磁体和S磁体根据所使用的功能面来命名，具体地说，通常磁体包括N极面和S极面，当需要使用磁体N极面的磁场时，该磁体称为N磁体，当需要使用磁体S极面的磁场时，该磁体称为S磁体，下文中所提到的N磁体和S磁体的命名与此相同，为了表达简洁不再重复。
在一些实施例中，第一磁体125可以包括三种类型的磁体，即第一N磁体125A、第一S磁体125B和第一H磁体125C，如图2和图3所示。第一H磁体125C配置在第一N磁体125A和第一S磁体125B之间，且第一N磁体125A和第一S磁体125B沿X方向交替排列，第一H磁体125C的磁化方向为由相邻的第一S磁体125B指向第一N磁体125A，且与X方向平行。这样配置使得第一线圈115所处的磁场得到加强，以此可以增强第一磁体125和第一线圈115的相互作用力。其中，H磁体根据其所使用的功能面来命名，具体地说，H磁体位于N磁体和S磁体之间，当需要使用磁体的磁场由相邻的S磁体指向N磁体时，该磁体称为H磁体。下文中所提到的H磁体的命名与此相同，为了表达简洁不再重复。
具体地说，如图3所示，第一磁体阵列121的每个第一N磁体125A与第一S磁体125B的磁化方向与第三平面23正交，且第一N磁体125A的磁化方向指向第一线圈115，第一S磁体125B的磁化方向背离第一线圈阵列111的第一线圈115。第一H磁体125C的磁化方向与X方向平行，由相邻的第一S磁体125B指向相邻的第一N磁体125A，以此来提供磁场空间。另外，类似于第一磁体125，图1中第二磁体126同样可以包括三种类型的磁体，以同样的排列布置，以加强第二线圈116所处的磁场，这里不再赘述。
图4为对应第一实施例的位移装置的洛伦兹力和转矩的示意图，如图所示，第一线圈阵列111通入驱动电流后，第一线圈阵列111与第一磁体阵列121产生相互作用，能够带动图1中第一框架部11相对第二框架部12沿着X方向和Z方向做平动，以及第一框架部11相对第二框架部12沿着Y方向做转动。第二线圈阵列112通入驱动电流后，第二线圈阵列112与第二磁体阵列122产生相互作用，能够带动第一框架部11相对第二框架部12沿着X方向和Y方向做平动、以及第一框架部11相对第二框架部12沿着Z方向做转动。
本发明提供的技术方案，由于不需要采用现有的气浮导轨技术中的气浮支撑面，没有了大尺寸气浮支撑面的加工制造难度问题，以及装配维护困难问题，通过通电线圈与磁体之间的相互作用力实现框架的相对运动，可根据各种需求实现不同位移，而框架之间无直接机械式接触，也方便于装备和维护操作，对于规模化的使用，能有效降低制造成本和使用成本。
此外，利用本发明实施例中框架间通电线圈和磁体相互作用的结构，在第一框架部11与第二框架部12之间存在着一个自稳定转动调节机制，如图5所示，当第一框架部11相对第二框架部12沿X方向发生偏转，导致第一线圈阵列111和第一磁体阵列121的间隙或者第二线圈阵列112和第二磁体阵列122的间隙偏大或偏小，自稳定转动调节机制调节第一框架部11相对第二框架部12沿X方向的反向转动，保持第一框架部11与第二框架部12的间隙的均匀。
具体地说，本发明实施例中的第一框架部和第二框架部之间的自稳定转动调节机制基于线圈阵列与磁体阵列之间的力和转矩的平衡，当线圈阵列与磁体阵列的间隙发生变化，对应的力和转矩也随之发生变化，产生趋向于平衡点的位移，从而保持线圈阵列与磁体阵列的间隙的稳定。
进一步的，在一些实施例中，位移装置还包括第一位置传感器，第一磁体阵列和第一线圈阵列沿第二方向的尺寸中的一个具有少于另一个的尺寸差别部分，这个尺寸差别部分形成第一差别空间，第一位置传感器位于第一差别空间中，用以测量沿第一方向上产生的运动位移。
具体地说，部分实施例中，如图6所示，第一磁体阵列121沿Y方向尺寸与第一线圈阵列111沿Y方向尺寸并不相同，例如当第一磁体阵列121沿Y方向尺寸大于第一线圈阵列111沿Y方向的尺寸时，第一磁体阵列121沿Y方向上具有突出第一线圈阵列111的部分，第一线圈阵列111沿Y方向上对应第一磁体阵列121形成了一个第一差别空间，这个第一差别空间内可以用来配置第一位置传感器16a，当然可以理解的是，当第一磁体阵列121沿Y方向尺寸小于第一线圈阵列111沿Y方向的尺寸时，第一线圈阵列111沿Y方向上具有突出第一磁体阵列121的部分，第一磁体阵列121沿Y方向上对应第一线圈阵列111也同样形成一个第一差别空间，可以用来配置第一位置传感器16a，第一位置传感器16a用来测量X方向上产生的长距离位移。第一位置传感器16a可以为霍尔传感器，也可以是其他传感器，具体不做限制。
另外，第二磁体阵列122与第二线圈阵列112也类似于上述的第一磁体阵列121与第一线圈阵列111，即第二磁体阵列122与第二线圈阵列112形成一个第二差别空间，用来配置第二位置传感器16b，第二位置传感器16b可以与第一 位置传感器16a相同类型，也可以不同类型，具体这里不再赘述。
需要说明的是，两个位置传感器都可用于测量X方向的位移，因此两个传感器可以不同时工作，当其中一处处于工作状态时，另外一处可以处于备用状态。当两处传感器同时处于工作状态时，可以设置两处传感器进行相互校准，具体可以通过设置一个第一差值，其中，第一差值为某处的第一位置传感器的测量值与第二位置传感器的测量值的差值，系统可以判断当第一差值超过某一预设阀值时，确定至少有一处位置传感器不正常工作，以此可以更好的控制位置传感器出错的风险。
本发明第二实施例涉及一种位移装置。第二实施例是基于第一实施例的扩展，主要区别之处在于，如图7所示，第二实施例的位移装置10第一框架部11还包括第三线圈阵列113，第三线圈阵列113固定配置在第一框架的第五平面25上，第五平面25与X方向平行。其中，第五平面25、第一平面21和第二平面22中至少有两个平面相互不平行。也就是说，第五平面25既可以与第一平面21共面或平行，也可以与第一平面21正交。优选地，第五平面25与第一平面21共面，第五平面25与第二平面22正交，且第五平面25与Z方向正交。
另外，图7中第二框架部12还包括第三磁体阵列123，第三磁体阵列123固定配置在第二框架的第六平面26上，其中，第六平面26平行且相对设置于第五平面25。优选地，第六平面26与第三平面23共面。
其中，第三线圈阵列113的具体排列方式与第一线圈阵列111类似，第三磁体阵列123的具体排列方式与第一磁体阵列121类似，这里不再赘述。
图8是本发明第二实施例的位移装置的洛伦兹力和转矩的示意图，如图所示，第三线圈阵列113通入驱动电流后，第三线圈阵列113与第三磁体阵列123产生相互作用，引起图7中第一框架部11相对第二框架部12沿X方向和Z方向做平动，以及第一框架部11相对第二框架部12沿Y方向做转动。
本实施例中，第三线圈阵列113和第三磁体阵列123的相互作用与第一线圈阵列111和第一磁体阵列121的相互作用，产生沿X方向的转矩，引起第一框架部11相对第二框架部12沿X方向做转动。
与第一实施例相比，第二实施例的位移装置10，通过增加一组线圈阵列113 和磁体阵列123，强化了沿X方向的转矩，稳定了X方向的运动状态。
进一步的，在一些实施例中，第三磁体阵列123与第二线圈阵列113也类似于上述的第一磁体阵列121与第一线圈阵列111，第三磁体阵列123与其对应第三线圈阵列113形成一个第三差别空间，用来配置第三位置传感器，这里不再重复。
需要说明的是，本实施中的三个位置传感器都可用于测量X方向的位移，因此三个位置传感器可以不同时工作，当其中一个处于工作状态时，另外的两个可以处于备用状态。当然也可以使用三个传感器相互校准，例如三个位置传感器，可以通过设置一个第一阀值，如果第一位置传感器的测量值与第二位置传感器的测量值的差值未超过第一阀值，而第二位置传感器的测量值与第三位置传感器的测量值的差值超过第一阀值，可以初步判定第三位置传感器出现问题或者误差超出可允许范围，就可以对第三位置传感器进行检查或更换等。
由于本实施例是对第一实施例的扩展，因此第一实施例中提到的相关技术细节在本实施例中依然有效，在第一实施例中所能达到的技术效果在本实施例中也同样可以实现，为了减少重复，这里不再赘述。
本发明第三实施例涉及一种位移装置。第三实施例是基于第二实施例的扩展，主要区别之处在于，如图9所示，第三实施例的位移装置10中，第一框架部11还包括第四线圈阵列114，第四线圈阵列114固定配置在第一框架的第七平面27上，第七平面27与第一框架部11的第二平面22间隔设置，第七平面27与X方向平行，第二框架部12相对第一框架部11位于底部和外侧部呈半包围结构。其中，第七平面27、第一平面21、第二平面22和第五平面25中至少有两个平面相互不平行。优选地，第七平面27与第二平面22平行，且第七平面27与Y方向正交。
另外，图9中第二框架部12还包括第四磁体阵列124，第四磁体阵列124配置在第二框架的第八平面28上，其中，第八平面28平行且相对设置于第七平面27。
其中，第四线圈阵列114的具体排列方式与第二线圈阵列112类似，第四磁体阵列124的具体排列方式与第二磁体阵列122类似，这里不再赘述。
第四线圈阵列114通入驱动电流后，第四线圈阵列114与第四磁体阵列124产生相互作用，引起第一框架部11相对第二框架部12沿X和Y方向做平动，以及第一框架部11相对第二框架部12沿Z方向做转动。
本实施例中，第四线圈阵列114和第四磁体阵列124的相互作用与第二线圈阵列112和第二磁体阵列122的相互作用，强化了第一框架部11相对第二框架部12沿Y方向的平动，以及沿Z方向的转动。
与第二实施例相比，第三实施例的位移装置10多了一组线圈阵列114和磁体阵列124。从X方向上看，四组线圈阵列呈U型对称布局，即第一线圈阵列111与第三线圈阵列113对称，第二线圈阵列112与第四线圈阵列114对称。采用U型对称布局，强化了沿各个方向的洛伦兹力和转矩。有了第四线圈阵列114和第四磁体阵列124的加入，通过冗余控制，抑制了柔性模态产生的机械共振。
由于本实施例是基于第一实施例和第二实施例的扩展，因此第一实施例和第二实施例中提到的相关技术细节在本实施例中依然有效，在第一实施例和第二实施例中所能达到的技术效果在本实施例中也同样可以实现，为了减少重复，这里不再赘述。
进一步的，部分实施例中，每个线圈阵列为一个多维阵列；其中，第一线圈阵列还包括沿第四方向的行配置；第二线圈阵列还包括沿第五方向的行配置；第三线圈阵列还包括沿第六方向的行配置；第二线圈阵列还包括沿第七方向的行配置。
具体地说，第一框架部11上的各线圈阵列可以为一个多维阵列，即既包括沿X方向的列配置、沿Y方向的行配置和沿Z方向的竖配置，多维阵列的设置，可以提高磁体与线圈相互作用力的自由度。
优选地，第一框架部11上的各线圈阵列为一个二维阵列，既包括沿X方向的列配置，还包括沿Y方向的行配置，例如第一线圈阵列111还包括沿第四方向的行配置，优选地，第四方向与Y方向相同，当然第四方向也可以是与Y方向成任意角度的其他方向。
以第一线圈阵列和第一磁体阵列为例，如图10所示，第一线圈阵列111的第一线圈115除了沿X方向的两两相邻配置外，还包括沿Y方向的行配置，第 一线圈阵列111沿Y方向以两个相邻第一线圈115配置作为一个行配置，第一磁体阵列121沿Y方向线性延伸，其中，第一线圈阵列111在第一平面上的投影与第一磁体阵列121在第一平面上的投影有交集。
第一线圈阵列111除了沿第一方向(X方向)的列配置外，还包括沿第四方向(优选地Y方向)的行配置。采用这样的布置，当第一线圈阵列111通入电流后，第一线圈阵列111与第一磁体阵列121产生的相互作用，新增一个沿第一方向(X方向)的转矩，能够引起第一框架部11相对第二框架部12沿第一方向(X方向)做转动，采用这种阵列的配置实施方式，提高了第一线圈阵列111自身的调节能力和稳定能力。
图9中第二线圈阵列112、第三线圈阵列113和第四线圈阵列114的也可配置多维阵列的列配置和行配置，具体实施方式类似于第一线圈阵列111，这里不再赘述。
进一步的，部分实施例中的位移装置，包括至少两个第一框架部和至少一个第二框架部；在所述第一方向上第一框架部的长度小于第二框架部的长度，至少两个第一框架部在至少一个第二框架部上沿所述第一方向彼此间隔开设置，至少两个第一框架部分别通过独立驱动控制，至少一个第二框架部沿所述第一方向通过机械拼接线性延伸形成一体。具体地说，如图11所示，位移装置10包括两个第一框架部11和两个第二框架部12，两个第一框架部11之间可相互独立地驱动控制，从而分别充当第一工作台和第二工作台。两个第二框架部12作为基座沿X方向线性延伸形成一体，具体地，可以通过机械拼接的方式实现连接，可以通过在工装台架上拼接，也可以用自身的卡扣进行拼接，此处不做限定。两个第一框架部在拼接成一体的两个的第二框架部上彼此间隔可分离设置。至少两个第一框架部11与至少一个第二框架部12组成一种多工作台的位移装置系统。本发明实施例通过对第一工作台和第二工作台的独立驱动，大大加大了工作台的操作自由度，由此提高了工作效率，并且通过采用模块化设计满足运动系统的拓展需求，对运动系统进行延伸，无需重新设计新结构，维护更方便，可以有效的降低生产制造和使用成本。
进一步的，部分实施例中的位移装置，包括至少一个第一框架部和至少两 个第二框架部，在所述第一方向上第一框架部的长度大于第二框架部的长度，至少两个第二框架部在至少一个第一框架部上沿所述第一方向彼此间隔开设置，至少一个第一框架部沿第一方向通过机械拼接线性延伸形成一体，至少两个第二框架部分别通过独立驱动控制。具体地说，如图12所示，位移装置10包括两个第一框架部11和两个第二框架部12。第一框架部11作为基座可沿X方向线性延伸或大致线性延伸形成一体，具体地，可以通过机械拼接的方式实现连接，可以通过在工装台架上拼接，也可以用自身的卡扣进行拼接，此处不做限定。两个第二框架部12之间也可相互独立地驱动控制，从而分别作为第一工作台和第二工作台。两个第二框架部在拼接成一体作为基座的两个的第一框架部上彼此间隔可分离设置。这至少一个第一框架部11与至少两个第二框架部12，组成为一种多工作台的位移装置系统。本发明实施例通过对第一工作台和第二工作台的独立驱动，大大加大了工作台的操作自由度，由此提高了工作效率，并且可通过采用模块化设计满足运动系统的拓展需求，对运动系统进行延伸，无需重新设计新结构，维护更方便，可以有效的降低生产制造和使用成本。
需要说明的是，本发明提供的多工作台的位移装置，可应用于自动化装备的运动台系统，上述自动化装备的运动台系统，可以根据实际运动行程和控制策略规划的需求，调整第一框架部和第二框架部的相对位置，以及两者的配置数量。
以上已详细描述了本发明的较佳实施例，但应理解到，若需要，能修改实施例的方面来采用各种专利、申请和出版物的方面、特征和构思来提供另外的实施例。
考虑到上文的详细描述，能对实施例做出这些和其它变化。一般而言，在权利要求中，所用的术语不应被认为限制在说明书和权利要求中公开的具体实施例，而是应被理解为包括所有可能的实施例连同这些权利要求所享有的全部等同范围。

Claims (10)

  1. 一种位移装置，包括至少一个第一框架部和至少一个第二框架部，每个第一框架部与对应的第二框架部可以产生相对运动，其特征在于，
    每个第一框架部包括第一框架和多个线圈阵列，所述多个线圈阵列包括：
    第一线圈阵列，配置在与第一方向平行的所述第一框架的第一平面上，所述第一线圈阵列包括多个第一线圈，所述多个第一线圈沿所述第一方向两两相邻配置；
    第二线圈阵列，配置在与所述第一方向平行的所述第一框架的第二平面上，所述第二线圈阵列包括多个第二线圈，所述多个第二线圈沿所述第一方向两两相邻配置；其中，所述第一平面和所述第二平面相互不平行；
    所述第二框架部包括第二框架和多个磁体阵列，所述多个磁体阵列包括：
    第一磁体阵列，配置在与第一平面平行的所述第二框架的第三平面上，所述第一磁体阵列与第一线圈阵列分别在第一平面上的投影有交集；所述第一磁体阵列包括多个第一N磁体和多个第一S磁体，且所述第一N磁体与所述第一S磁体沿所述第一方向交替排列，所述第一N磁体与所述第一S磁体的磁化方向相互不同；
    第二磁体阵列，配置在与第二平面平行的所述第二框架的第四平面上，所述第二磁体阵列与第二线圈阵列分别在第二平面上的投影有交集；所述第二磁体阵列包括多个第二N磁体和多个第二S磁体，且所述第二N磁体与所述第二S磁体沿所述第一方向交替排列，所述第二N磁体与所述第二S磁体的磁化方向相互不同；
    其中，所述第三平面相对设置且平行于所述第一平面，所述第四平面相对设置且平行于所述第二平面。
  2. 根据权利要求1所述的位移装置，其特征在于，每个线圈阵列为一个多维阵列；
    其中，所述第一线圈阵列还包括沿第四方向的行配置；和/或
    所述第二线圈阵列还包括沿第五方向的行配置。
  3. 根据权利要求1所述的位移装置，其特征在于，所述多个线圈阵列还包括：
    第三线圈阵列，配置在与所述第一方向平行的所述第一框架的第五平面上，所述第三线圈阵列包括多个第三线圈，所述多个第三线圈沿所述第一方向两两相邻配置；
    其中，所述第一平面、所述第二平面和所述第五平面，至少有两个平面相互不平行；
    所述多个磁体阵列还包括：
    第三磁体阵列，配置在与第五平面平行的所述第二框架的第六平面上，所述第三磁体阵列与所述第三线圈阵列分别在第五平面上的投影有交集；所述第三磁体阵列包括多个第三N磁体和多个第三S磁体，且所述第三N磁体与所述第三S磁体沿所述第一方向交替排列，所述第三N磁体与所述第三S磁体的磁化方向相互不同。
  4. 根据权利要求3所述的位移装置，其特征在于，
    所述多个线圈阵列还包括：
    第四线圈阵列，配置在与所述第一方向平行的所述第一框架的第七平面上，所述第四线圈阵列包括多个第四线圈，所述多个第四线圈沿所述第一方向两两相邻配置；
    所述第一平面、所述第二平面、所述第五平面和所述第七平面中至少有两个平面相互不平行；
    所述多个磁体阵列还包括：
    第四磁体阵列，配置在与所述第七平面平行的所述第二框架的第八平面上，所述第四磁体阵列与第四线圈阵列分别在第七平面上的投影有交集；所述第四磁体阵列至少包括多个第四N磁体和多个第四S磁体，且所述第四N磁体与所述第四S磁体沿所述第一方向交替排列，所述第四N磁体与所述第四S磁体的磁化方向相互不同。
  5. 根据权利要求4所述的位移装置，其特征在于，每个线圈阵列为一个多维阵列；
    其中，所述第三线圈阵列还包括沿第六方向的行配置；
    和/或
    所述第四线圈阵列还包括沿第七方向的行配置。
  6. 根据权利要求1所述的位移装置，其特征在于，所述第一磁体阵列还包括第一H磁体，所述多个第一H磁体配置在所述第一N磁体和所述第一S磁体之间，且所述第一N磁体和所述第一S磁体沿所述第一方向交替排列，所述第一H磁体的磁化方向由相邻的第一次S磁体指向第一N磁体，且与所述第一方向平行；
    和/或
    所述第二磁体阵列还包括第二H磁体，所述多个第二H磁体配置在所述第二N磁体和所述第二S磁体之间，且所述第二N磁体和所述第二S磁体沿所述第一方向交替排列，所述第二H磁体的磁化方向由相邻的第二次S磁体指向第二N磁体，且与所述第一方向平行。
  7. 根据权利要求1所述的位移装置，其特征在于，
    所述位移装置还包括第一位置传感器；
    所述第一磁体阵列和所述第一线圈阵列沿第二方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第一差别空间，所述第一位置传感器位于所述第一差别空间内，用以测量沿所述第一方向上产生的运动位移；
    和/或
    所述位移装置还包括第二位置传感器；
    所述第二磁体阵列和所述第二线圈阵列沿第三方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第二差别空间，所述第二位置传感器位于所述第二差别空间内，用以测量沿所述第一方向上产生的运动位移。
  8. 根据权利要求4所述的位移装置，其特征在于，
    所述位移装置还包括第三位置传感器；
    所述第三磁体阵列和所述第三线圈阵列沿第二方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第三差别空间，所述第三位置传感器位于所述第三差别空间内，用以测量沿所述第一方向上产生的运动位移；
    和/或
    所述位移装置还包括第四位置传感器；
    所述第四磁体阵列和所述第四线圈阵列沿第三方向的尺寸中的一个具有少于另一个的尺寸差别部分，所述尺寸差别部分形成第四差别空间，所述第四位置传感器位于所述第四差别空间内，用以测量沿所述第一方向上产生的运动位移。
  9. 如权利要求1至8任一项所述的位移装置，其特征在于，
    所述位移装置包括至少两个第一框架部；
    所述至少两个第一框架部分别通过独立驱动控制；
    和/或
    所述位移装置包括至少一个第二框架部，所述至少一个第二框架部沿所述第一方向通过机械拼接实现线性延伸。
  10. 如权利要求1至8任一项所述的位移装置，其特征在于，
    所述位移装置包括至少一个第一框架部；
    所述至少一个第一框架部沿所述第一方向通过机械拼接实现线性延伸；
    和/或
    所述位移装置包括至少两个第二框架部；所述至少两个第二框架部分别通过独立驱动控制。
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