WO2022088299A1 - Radio frequency chip with rc circuit integrated on chip - Google Patents

Radio frequency chip with rc circuit integrated on chip Download PDF

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Publication number
WO2022088299A1
WO2022088299A1 PCT/CN2020/129810 CN2020129810W WO2022088299A1 WO 2022088299 A1 WO2022088299 A1 WO 2022088299A1 CN 2020129810 W CN2020129810 W CN 2020129810W WO 2022088299 A1 WO2022088299 A1 WO 2022088299A1
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metal layer
chip
field plate
metal
layer
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PCT/CN2020/129810
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French (fr)
Chinese (zh)
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马强
肖智敏
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苏州远创达科技有限公司
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5222Capacitive arrangements or effects of, or between wiring layers
    • H01L23/5223Capacitor integral with wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/5228Resistive arrangements or effects of, or between, wiring layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Geometry or layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Geometry or layout of the interconnection structure
    • H01L23/5283Cross-sectional geometry

Definitions

  • the invention relates to the technical field of radio frequency device chips, in particular to a radio frequency chip with an on-chip integrated RC circuit.
  • An existing radio frequency chip with an on-chip integrated RC circuit such as an LDMOS chip, has the structure of the input part of the chip as shown in Figure 1.
  • the gate 3 of the chip is directly connected to the input metal pad 1 through a low-resistance metal 21 (eg, gold). superior.
  • a low-resistance metal 21 eg, gold
  • the circuit is stabilized by adding damping structures such as resistors and capacitors outside the power amplifier device. This circuit is generally realized through the PCB board.
  • the external damping structure of the device can play a certain role in stability, because the external damping structure is far from the active area of the RF chip with the integrated RC circuit on the chip in the circuit matching structure, the external damping occurs when the loop oscillation occurs inside the chip.
  • the role of structure is not obvious.
  • the existing improvement method is to connect a resistor in series on the chip input as shown in FIG. 2 , the input metal pad 1 is connected in series with a resistor 22 and then connected to the gate 3 of the chip. Its resistance is achieved through thin-film metal. Connecting a resistor in series to the gate can really suppress the problem of excessive gain, and there is no problem in low-frequency applications, but when the frequency exceeds 200MHz, the gain of the device is reduced too much due to the resistor connected in series to the gate of the chip, and the thin-film resistor It is easy to burn out due to power overload, resulting in device failure.
  • the present invention aims to provide a radio frequency chip with an on-chip integrated RC circuit, which integrates an RC circuit inside the chip to improve the gain and robustness of the radio frequency power device at low and high frequencies.
  • a radio frequency chip with an integrated RC circuit on a chip including a substrate and an epitaxial layer, is arranged in an active region extending the epitaxial layer, and on the epitaxial layer, a plurality of groups are arranged between the gate of the active region and the input metal pad Resistor-capacitor combination structure, the resistance and capacitance of the resistance-capacitance combination structure are connected in parallel, and the gate of the active region is connected to the input metal pad after passing through the resistance-capacitor combination structure.
  • the resistance of the resistor-capacitor combination structure includes at least one double field plate structure
  • the double field plate structure includes a first metal field plate and a second metal field plate arranged on the epitaxial layer, and the first metal field plate is arranged on the epitaxial layer.
  • Two metal field plates are disposed above the first metal field plate, a dielectric layer is disposed between the first metal field plate and the second metal field plate, and both ends of the first metal field plate and the second metal field plate are respectively
  • the upper metal layer disposed above is connected through a via hole, one end of the upper metal layer is connected to the gate, the other end is connected to the input metal pad, and the thickness of the metal layer is greater than that of the metal field plate.
  • a plurality of double field plate structures are connected in series through the upper metal layer.
  • the capacitor of the resistor-capacitor combination structure includes a lower metal layer and an upper metal layer arranged on the epitaxial layer, the upper metal layer is arranged above the lower metal layer, and the lower metal layer and the upper metal layer A dielectric layer is arranged between the layers, the lower metal layer is connected to the gate, and the upper metal layer is connected to the input metal pad.
  • the upper metal layer is divided into a first upper metal layer and a second upper metal layer through a fracture, a dielectric layer is arranged in the fracture, and the first upper metal layer is connected to the lower metal through a through hole layer, the first upper metal layer is connected to the gate electrode, and the second upper metal layer is connected to the input metal pad.
  • the radio frequency chip with an on-chip integrated RC circuit of the present invention integrates an RC circuit inside the chip, so that loop oscillation will not occur inside the chip, avoiding the problem of resistance power overload due to too low gain when inputting high-frequency applications, and improving the Gain and robustness of RF power devices at low and high frequencies.
  • Fig. 1 is the input part structure schematic diagram of the existing radio frequency chip
  • FIG. 2 is a schematic structural diagram of an input part of an existing radio frequency chip with resistors connected in series;
  • Fig. 3 is the structural schematic diagram of the input part of the radio frequency chip of the on-chip integrated RC circuit of the present invention.
  • Fig. 4 is the input layout schematic diagram of the input part of the radio frequency chip of the on-chip integrated RC circuit of the present invention.
  • FIG. 5 is a schematic diagram of a resistor structure according to an embodiment of the present invention.
  • Fig. 6 is AA' sectional view of Fig. 5;
  • FIG. 7 is a schematic diagram of a capacitor structure according to an embodiment of the present invention.
  • Fig. 8 is a cross-sectional view taken along line AA' of Fig. 7 .
  • a radio frequency chip with an on-chip integrated RC circuit of the present invention is suitable for GaAs, Si-based LDMOS, and GaN technology. Specifically, it includes a substrate 100 and an epitaxial layer 101, an active region disposed on the epitaxial layer 101, and a plurality of groups of resistor-capacitor combination structures 60 are arranged on the epitaxial layer 101 between the gate 40 of the active region and the input metal pad 50. , the resistor and capacitor of the resistor-capacitor combination structure 60 are connected in parallel, and the gate 40 of the active region is connected to the input metal pad 50 through the resistor-capacitor combination structure.
  • the structure of the resistor 61 of the resistor-capacitor combination structure 60 is shown in FIGS. 5 and 6 , which is realized by stacking and paralleling double-layer thin-film metals, and includes at least one double-field plate structure 63 .
  • the double-field plate structure includes a first The metal field plate 611 and the second metal field plate 612, the second metal field plate 612 is disposed above the first metal field plate 611, the dielectric layer 613 is disposed between the first metal field plate 611 and the second metal field plate 612, Two ends of a metal field plate 611 and a second metal field plate 612 are respectively connected to the upper metal layer 615 disposed above through through holes 614 .
  • the thicknesses of the first metal field plate 611 and the second metal field plate 612 are very thin, ranging from tens of nanometers to hundreds of nanometers, and are composed of metals or a combination of metals and metal nitrides.
  • the resistance value is relatively large.
  • the upper metal layer 615 is made of metal with a relatively thick thickness and has a relatively small resistance value.
  • the thicknesses of the first metal field plate 611 , the second metal field plate 612 and the upper metal layer 615 are different by more than 10 times.
  • the use of double-layer field plate metal stacking can significantly improve the heat dissipation of the resistor and increase the overall power capacity of the resistor.
  • a dielectric layer 616 may also be disposed above the second metal field plate 612 .
  • multiple groups of the above-mentioned double field plate structures 63 can be connected in series through the upper metal layer 615, which can improve the resistance power capacity, reduce the length of the field plate metal of each group of resistance units, further optimize the resistance reliability, and effectively. Prevents resistor burnout issues.
  • the structure of the capacitor 62 of the resistor-capacitor combination structure 60 is shown in FIGS. 7 and 8 , including a lower metal layer 621 and an upper metal layer 622 disposed on the epitaxial layer 101 .
  • the upper metal layer 622 is disposed above the lower metal layer 621 , and the lower The dielectric layer 624 between the metal layer 621 and the upper metal layer 622 is used as the epitaxial layer of the capacitor to form a parallel plate capacitor.
  • the lower metal layer 621 is connected to the gate 40
  • the upper metal layer 622 is connected to the input metal pad 50 .
  • the upper metal layer 622 can be used as a connecting metal to connect the gate 40 or the input metal pad 50 .
  • the upper metal layer 622 is divided into a first upper metal layer 6222 and a second upper metal layer 6223 by a fracture 6221, and a dielectric layer is provided in the fracture 6221.
  • a fracture 6221 is provided at the periphery of 622 , so that the divided first upper metal layer 6222 surrounds the second upper metal layer 6223 .
  • the first upper metal layer 6222 is connected to the lower metal layer 621 through the through hole 623 , and a dielectric layer 624 is disposed between the lower metal layer 621 and the upper metal layer 622 .
  • the lower metal layer 621 serves as the lower plate of the capacitor
  • the second upper metal layer 6223 serves as the upper plate of the capacitor
  • the dielectric layer 624 between the lower metal layer 621 and the upper metal layer 622 serves as the dielectric layer (oxide) of the capacitor, form a parallel plate capacitor.
  • All the above-mentioned dielectric layers are generally oxides or nitrides, and the capacitance value required by the application can be achieved by adjusting the thickness of the dielectric layers and the metal area of the upper and lower plates.
  • the lower metal layer 621 of the capacitor can be implemented by a metal field plate.
  • the first upper metal layer 6222 and the second upper metal layer 6223 are made of metal with a relatively thick thickness, and the thickness is about 1-5um, and the resistance value thereof is relatively small.
  • the upper metal layer 622 of the capacitor and the upper metal layer 615 of the resistor are the same metal layer, and both ends are connected to the gate 40 and the input metal pad 50 respectively.
  • the above-mentioned RC circuit and active area are packaged as a whole into a radio frequency chip.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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  • Semiconductor Integrated Circuits (AREA)
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Abstract

A radio frequency chip with an RC circuit integrated on chip. The radio frequency chip comprises a substrate (100), an epitaxial layer (101), and an active area disposed on the epitaxial layer, wherein on the epitaxial layer, a plurality of sets of resistor-capacitor combined structures (60) are arranged between a gate electrode (40) of the active area and an input metal pad (50); resistors and capacitors of the resistor-capacitor combined structures (60) are connected in parallel; and the gate electrode (40) of the active area is connected to the input metal pad (50) by means of the resistor-capacitor combined structures (60). According to the radio frequency chip with an RC circuit integrated on chip, an RC circuit is integrated inside the chip, thereby improving the gains and robustness of a radio-frequency power device at a low frequency and a high frequency.

Description

一种片上集成RC电路的射频芯片A radio frequency chip with on-chip integrated RC circuit 技术领域technical field
本发明涉及射频器件芯片技术领域,具体地涉及一种片上集成RC电路的射频芯片。The invention relates to the technical field of radio frequency device chips, in particular to a radio frequency chip with an on-chip integrated RC circuit.
背景技术Background technique
现有的片上集成RC电路的射频芯片,例如LDMOS芯片,其芯片输入部分的结构如图1所示,芯片的栅极3通过低阻值金属21(例如金)直接连接到输入金属焊盘1上。这种芯片当在低频率应用时,往往会由于器件增益过高引起功放管振荡等问题。通常会通过功放器件外部加电阻、电容等阻尼结构稳定电路,这种电路一般是通过PCB板实现。虽然器件外部加阻尼结构可以起到一定的稳定作用,但由于外接的阻尼结构在电路匹配结构上离片上集成RC电路的射频芯片有源区较远,芯片内部发生环路振荡时外置的阻尼结构的作用就不明显了。An existing radio frequency chip with an on-chip integrated RC circuit, such as an LDMOS chip, has the structure of the input part of the chip as shown in Figure 1. The gate 3 of the chip is directly connected to the input metal pad 1 through a low-resistance metal 21 (eg, gold). superior. When this kind of chip is used at low frequency, problems such as oscillation of the power amplifier tube are often caused due to the high gain of the device. Usually, the circuit is stabilized by adding damping structures such as resistors and capacitors outside the power amplifier device. This circuit is generally realized through the PCB board. Although the external damping structure of the device can play a certain role in stability, because the external damping structure is far from the active area of the RF chip with the integrated RC circuit on the chip in the circuit matching structure, the external damping occurs when the loop oscillation occurs inside the chip. The role of structure is not obvious.
现有的改进方法是在芯片输入上串联电阻如图2所示,输入金属焊盘1串联电阻22然后连接到芯片的栅极3。其电阻是通过薄膜金属实现的。在栅极串接电阻确实可以很好的抑制增益过高问题,在低频率应用时没有问题,但是当频率超过200MHz时,由于芯片栅极串接了电阻,器件的增益降低太多,薄膜电阻很容易由于功率过载而烧毁,导致器件失效。The existing improvement method is to connect a resistor in series on the chip input as shown in FIG. 2 , the input metal pad 1 is connected in series with a resistor 22 and then connected to the gate 3 of the chip. Its resistance is achieved through thin-film metal. Connecting a resistor in series to the gate can really suppress the problem of excessive gain, and there is no problem in low-frequency applications, but when the frequency exceeds 200MHz, the gain of the device is reduced too much due to the resistor connected in series to the gate of the chip, and the thin-film resistor It is easy to burn out due to power overload, resulting in device failure.
发明内容SUMMARY OF THE INVENTION
针对上述存在的技术问题,本发明目的在于提供一种片上集成RC电路的射频芯片,在芯片内部集成RC电路,提高了射频功率器件在低频和高频的增益及鲁棒性。In view of the above existing technical problems, the present invention aims to provide a radio frequency chip with an on-chip integrated RC circuit, which integrates an RC circuit inside the chip to improve the gain and robustness of the radio frequency power device at low and high frequencies.
为了解决现有技术中的这些问题,本发明提供的技术方案是:In order to solve these problems in the prior art, the technical scheme provided by the present invention is:
一种片上集成RC电路的射频芯片,包括衬底和外延层,设置于延伸外延层的有源区,所述外延层上在有源区的栅极与输入金属焊盘之间设置有多组电阻电容组合结构,所述电阻电容组合结构的电阻和电容并联,所述有源区的栅极通过电阻电容组合结构后连接输入金属焊盘。A radio frequency chip with an integrated RC circuit on a chip, including a substrate and an epitaxial layer, is arranged in an active region extending the epitaxial layer, and on the epitaxial layer, a plurality of groups are arranged between the gate of the active region and the input metal pad Resistor-capacitor combination structure, the resistance and capacitance of the resistance-capacitance combination structure are connected in parallel, and the gate of the active region is connected to the input metal pad after passing through the resistance-capacitor combination structure.
优选的技术方案中,所述电阻电容组合结构的电阻包括至少一个双场板结构,所述双场板结构包括设置在外延层上的第一金属场板和第二金属场板,所述第二金属场板设置于第一金属场板的上方,所述第一金属场板与第二金属场板间设置有介质层,所述第一金属场板和第二金属场板的两端分别通过通孔连接设置在上方的上层金属层,所述上层金属层的一端连接栅极,另一端连接输入金属焊盘,所述金属层的厚度大于金属场板的厚度。In a preferred technical solution, the resistance of the resistor-capacitor combination structure includes at least one double field plate structure, and the double field plate structure includes a first metal field plate and a second metal field plate arranged on the epitaxial layer, and the first metal field plate is arranged on the epitaxial layer. Two metal field plates are disposed above the first metal field plate, a dielectric layer is disposed between the first metal field plate and the second metal field plate, and both ends of the first metal field plate and the second metal field plate are respectively The upper metal layer disposed above is connected through a via hole, one end of the upper metal layer is connected to the gate, the other end is connected to the input metal pad, and the thickness of the metal layer is greater than that of the metal field plate.
优选的技术方案中,多个双场板结构通过上层金属层串联。In a preferred technical solution, a plurality of double field plate structures are connected in series through the upper metal layer.
优选的技术方案中,所述电阻电容组合结构的电容包括设置在外延层上的下金属层和上金属层,所述上金属层设置于下金属层的上方,所述下金属层与上金属层间设置有介质层,所述下金属层连接栅极,上金属层连接输入金属焊盘。In a preferred technical solution, the capacitor of the resistor-capacitor combination structure includes a lower metal layer and an upper metal layer arranged on the epitaxial layer, the upper metal layer is arranged above the lower metal layer, and the lower metal layer and the upper metal layer A dielectric layer is arranged between the layers, the lower metal layer is connected to the gate, and the upper metal layer is connected to the input metal pad.
优选的技术方案中,所述上金属层的通过断口分割为第一上金属层和第二上金属层,所述断口内设置有介质层,所述第一上金属层通过通孔连接下金属层,所述第一上金属层连接栅极,第二上金属层连接输入金属焊盘。In a preferred technical solution, the upper metal layer is divided into a first upper metal layer and a second upper metal layer through a fracture, a dielectric layer is arranged in the fracture, and the first upper metal layer is connected to the lower metal through a through hole layer, the first upper metal layer is connected to the gate electrode, and the second upper metal layer is connected to the input metal pad.
相对于现有技术中的方案,本发明的优点是:Compared with the solutions in the prior art, the advantages of the present invention are:
本发明的片上集成RC电路的射频芯片,在芯片内部集成RC电路,使得在芯片内部不会发生环路振荡,避免了输入高频应用时,由于增益过低导致电阻功率过载的问题,提高了射频功率器件在低频和高频的增益及鲁棒性。The radio frequency chip with an on-chip integrated RC circuit of the present invention integrates an RC circuit inside the chip, so that loop oscillation will not occur inside the chip, avoiding the problem of resistance power overload due to too low gain when inputting high-frequency applications, and improving the Gain and robustness of RF power devices at low and high frequencies.
附图说明Description of drawings
下面结合附图及实施例对本发明作进一步描述:Below in conjunction with accompanying drawing and embodiment, the present invention is further described:
图1为现有射频芯片的输入部分结构示意图;Fig. 1 is the input part structure schematic diagram of the existing radio frequency chip;
图2为现有射频芯片的输入部分带电阻串联的结构示意图;FIG. 2 is a schematic structural diagram of an input part of an existing radio frequency chip with resistors connected in series;
图3为本发明片上集成RC电路的射频芯片的输入部分的结构示意图;Fig. 3 is the structural schematic diagram of the input part of the radio frequency chip of the on-chip integrated RC circuit of the present invention;
图4为本发明片上集成RC电路的射频芯片的输入部分的输入版图示意图;Fig. 4 is the input layout schematic diagram of the input part of the radio frequency chip of the on-chip integrated RC circuit of the present invention;
图5为本发明实施例的电阻结构示意图;5 is a schematic diagram of a resistor structure according to an embodiment of the present invention;
图6为图5的AA’剖视图;Fig. 6 is AA' sectional view of Fig. 5;
图7为本发明实施例的电容结构示意图;7 is a schematic diagram of a capacitor structure according to an embodiment of the present invention;
图8为图7的AA’剖视图。Fig. 8 is a cross-sectional view taken along line AA' of Fig. 7 .
具体实施方式Detailed ways
以下结合具体实施例对上述方案做进一步说明。应理解,这些实施例是用于说明本发明而不限于限制本发明的范围。实施例中采用的实施条件可以根据具体厂家的条件做进一步调整,未注明的实施条件通常为常规实验中的条件。The above scheme will be further described below in conjunction with specific embodiments. It should be understood that these examples are intended to illustrate the invention and not to limit the scope of the invention. The implementation conditions used in the examples can be further adjusted according to the conditions of specific manufacturers, and the implementation conditions not specified are usually the conditions in routine experiments.
实施例:Example:
如图3、4所示,本发明的一种片上集成RC电路的射频芯片,该片上集成RC电路的射频芯片适用于GaAs,基于Si的LDMOS,以及GaN工艺。具体包括衬底100和外延层101,设置于外延层101上的有源区,外延层101上在有源区的栅极40与输入金属焊盘50之间设置有多组电阻电容组合结构60,电阻电容组合结构60的电阻和电容并联,有源区的栅极40通过电阻电容组合结构后连接输入金属焊盘50。As shown in FIGS. 3 and 4 , a radio frequency chip with an on-chip integrated RC circuit of the present invention is suitable for GaAs, Si-based LDMOS, and GaN technology. Specifically, it includes a substrate 100 and an epitaxial layer 101, an active region disposed on the epitaxial layer 101, and a plurality of groups of resistor-capacitor combination structures 60 are arranged on the epitaxial layer 101 between the gate 40 of the active region and the input metal pad 50. , the resistor and capacitor of the resistor-capacitor combination structure 60 are connected in parallel, and the gate 40 of the active region is connected to the input metal pad 50 through the resistor-capacitor combination structure.
通过设计一定大小的阻值和容值组合的RC结构,在芯片应用于低频率时,射频信号会通过串联的电阻,有效抑制了芯片增益防止器件振荡,当芯片应用于高频率时,射频信号会通过串联的电容,降低了电阻结构承受的射频功率,实现高增益高效率工作目的。By designing an RC structure with a combination of resistance and capacitance of a certain size, when the chip is applied to a low frequency, the RF signal will pass through the series resistor, which effectively suppresses the chip gain and prevents the device from oscillating. When the chip is applied to a high frequency, the RF signal Through the series capacitor, the radio frequency power that the resistance structure bears is reduced, and the purpose of high gain and high efficiency is achieved.
电阻电容组合结构60的电阻61的结构如图5、6所示,采用双层薄膜金属叠加并联实现,包括至少一个双场板结构63,双场板结构包括设置在外延层101上的第一金属场板611和第二金属场板612,第二金属场板612设置于第一金属场板611的上方,第一金属场板611与第二金属场板612间设置有介质层613,第一金属场板611和第二金属场板612的两端分别通过通孔614连接设置在上方的上层金属层615,上层金属层615的一端连接栅极40,另一端连接输入金属焊盘50。The structure of the resistor 61 of the resistor-capacitor combination structure 60 is shown in FIGS. 5 and 6 , which is realized by stacking and paralleling double-layer thin-film metals, and includes at least one double-field plate structure 63 . The double-field plate structure includes a first The metal field plate 611 and the second metal field plate 612, the second metal field plate 612 is disposed above the first metal field plate 611, the dielectric layer 613 is disposed between the first metal field plate 611 and the second metal field plate 612, Two ends of a metal field plate 611 and a second metal field plate 612 are respectively connected to the upper metal layer 615 disposed above through through holes 614 .
在一较佳的实施例中,第一金属场板611和第二金属场板612的厚度很薄,在几十nm到几百nm左右,由金属或金属和金属氮化物的组合物构成,阻值相对较大。上层金属层615由厚度比较厚的金属制成,阻值比较小。第一金属场板611、第二金属场板612与上层金属层615的厚度相差10倍以上为佳。In a preferred embodiment, the thicknesses of the first metal field plate 611 and the second metal field plate 612 are very thin, ranging from tens of nanometers to hundreds of nanometers, and are composed of metals or a combination of metals and metal nitrides. The resistance value is relatively large. The upper metal layer 615 is made of metal with a relatively thick thickness and has a relatively small resistance value. Preferably, the thicknesses of the first metal field plate 611 , the second metal field plate 612 and the upper metal layer 615 are different by more than 10 times.
通过设计金属场板的长宽比实现应用所需的阻值,考虑到金属电流容量, 采用双层场板金属叠加使用的方式,可以显著改善电阻散热情况,提高电阻整体功率容量。By designing the aspect ratio of the metal field plate to achieve the resistance value required for the application, considering the current capacity of the metal, the use of double-layer field plate metal stacking can significantly improve the heat dissipation of the resistor and increase the overall power capacity of the resistor.
第二金属场板612上方还可以设置介质层616。A dielectric layer 616 may also be disposed above the second metal field plate 612 .
在一较佳的实施例中,可以通过上层金属层615串接多组上述双场板结构63,可以提高电阻功率容量,降低每一组电阻单元场板金属的长度进一步优化电阻可靠性,有效防止电阻烧毁问题。In a preferred embodiment, multiple groups of the above-mentioned double field plate structures 63 can be connected in series through the upper metal layer 615, which can improve the resistance power capacity, reduce the length of the field plate metal of each group of resistance units, further optimize the resistance reliability, and effectively. Prevents resistor burnout issues.
电阻电容组合结构60的电容62的结构如图7、8所示,包括设置在外延层101上的下金属层621和上金属层622,上金属层622设置于下金属层621的上方,下金属层621与上金属层622间的介质层624作为电容的外延层,形成一个平行板电容。下金属层621连接栅极40,上金属层622连接输入金属焊盘50。The structure of the capacitor 62 of the resistor-capacitor combination structure 60 is shown in FIGS. 7 and 8 , including a lower metal layer 621 and an upper metal layer 622 disposed on the epitaxial layer 101 . The upper metal layer 622 is disposed above the lower metal layer 621 , and the lower The dielectric layer 624 between the metal layer 621 and the upper metal layer 622 is used as the epitaxial layer of the capacitor to form a parallel plate capacitor. The lower metal layer 621 is connected to the gate 40 , and the upper metal layer 622 is connected to the input metal pad 50 .
较佳的实施例中,可以将上金属层622作为连接金属连接栅极40或者输入金属焊盘50。具体的:上金属层622通过断口6221分割为第一上金属层6222和第二上金属层6223,断口6221内设置有介质层,如图7所示的一种示例中,通过在上金属层622的周边设置断口6221,使得分割的第一上金属层6222环绕第二上金属层6223。第一上金属层6222通过通孔623连接下金属层621,下金属层621与上金属层622间设置有介质层624。其中,下金属层621作为电容的下极板,第二上金属层6223作为电容的上极板,下金属层621与上金属层622间的介质层624作为电容的介质层(氧化物),形成一个平行板电容。上述的所有介质层一般为氧化或氮化物,通过调整介质层的厚度和上下极板金属面积可以实现应用所需的容值。In a preferred embodiment, the upper metal layer 622 can be used as a connecting metal to connect the gate 40 or the input metal pad 50 . Specifically: the upper metal layer 622 is divided into a first upper metal layer 6222 and a second upper metal layer 6223 by a fracture 6221, and a dielectric layer is provided in the fracture 6221. In an example shown in FIG. A fracture 6221 is provided at the periphery of 622 , so that the divided first upper metal layer 6222 surrounds the second upper metal layer 6223 . The first upper metal layer 6222 is connected to the lower metal layer 621 through the through hole 623 , and a dielectric layer 624 is disposed between the lower metal layer 621 and the upper metal layer 622 . Among them, the lower metal layer 621 serves as the lower plate of the capacitor, the second upper metal layer 6223 serves as the upper plate of the capacitor, and the dielectric layer 624 between the lower metal layer 621 and the upper metal layer 622 serves as the dielectric layer (oxide) of the capacitor, form a parallel plate capacitor. All the above-mentioned dielectric layers are generally oxides or nitrides, and the capacitance value required by the application can be achieved by adjusting the thickness of the dielectric layers and the metal area of the upper and lower plates.
当然,为了实现特殊的要求,电容的下金属层621可以通过金属场板实现。Of course, in order to achieve special requirements, the lower metal layer 621 of the capacitor can be implemented by a metal field plate.
一较佳的实施例中,第一上金属层6222和第二上金属层6223由厚度比较厚的金属制成,厚度在1-5um左右,其阻值比较小。In a preferred embodiment, the first upper metal layer 6222 and the second upper metal layer 6223 are made of metal with a relatively thick thickness, and the thickness is about 1-5um, and the resistance value thereof is relatively small.
一较佳的实施例中,为了操作方便,如图4所示,电容的上金属层622与电阻的上层金属层615为同一金属层,两端分别连接栅极40和输入金属焊盘50。将上述RC电路和有源区作为一个整体进行封装成射频芯片。In a preferred embodiment, for convenience of operation, as shown in FIG. 4 , the upper metal layer 622 of the capacitor and the upper metal layer 615 of the resistor are the same metal layer, and both ends are connected to the gate 40 and the input metal pad 50 respectively. The above-mentioned RC circuit and active area are packaged as a whole into a radio frequency chip.
应当理解的是,本发明的上述具体实施方式仅仅用于示例性说明或解释本发明的原理,而不构成对本发明的限制。因此,在不偏离本发明的精神和 范围的情况下所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。此外,本发明所附权利要求旨在涵盖落入所附权利要求范围和边界、或者这种范围和边界的等同形式内的全部变化和修改例。It should be understood that the above-mentioned specific embodiments of the present invention are only used to illustrate or explain the principle of the present invention, but not to limit the present invention. Therefore, any modification, equivalent replacement, improvement, etc. made without departing from the spirit and scope of the present invention should be included within the protection scope of the present invention. Furthermore, the appended claims of this invention are intended to cover all changes and modifications that fall within the scope and boundaries of the appended claims, or the equivalents of such scope and boundaries.

Claims (5)

  1. 一种片上集成RC电路的射频芯片,包括衬底和外延层,设置于外延层的有源区,其特征在于,所述外延层上在有源区的栅极与输入金属焊盘之间设置有多组电阻电容组合结构,所述电阻电容组合结构的电阻和电容并联,所述有源区的栅极通过电阻电容组合结构后连接输入金属焊盘。A radio frequency chip with an on-chip integrated RC circuit, comprising a substrate and an epitaxial layer, which is arranged in an active region of the epitaxial layer, characterized in that, the epitaxial layer is arranged between a gate of the active region and an input metal pad There are multiple groups of resistor-capacitor combination structures, the resistors and capacitors of the resistor-capacitor combination structures are connected in parallel, and the gate of the active region is connected to the input metal pad after passing through the resistor-capacitor combination structure.
  2. 根据权利要求1所述的片上集成RC电路的射频芯片,其特征在于,所述电阻电容组合结构的电阻包括至少一个双场板结构,所述双场板结构包括设置在外延层上的第一金属场板和第二金属场板,所述第二金属场板设置于第一金属场板的上方,所述第一金属场板与第二金属场板间设置有介质层,所述第一金属场板和第二金属场板的两端分别通过通孔连接设置在上方的上层金属层,所述上层金属层的一端连接栅极,另一端连接输入金属焊盘,所述金属层的厚度大于金属场板的厚度。The radio frequency chip with an on-chip integrated RC circuit according to claim 1, wherein the resistor of the resistor-capacitor combination structure includes at least one double field plate structure, and the double field plate structure includes a first a metal field plate and a second metal field plate, the second metal field plate is arranged above the first metal field plate, a dielectric layer is arranged between the first metal field plate and the second metal field plate, the first metal field plate The two ends of the metal field plate and the second metal field plate are respectively connected to the upper metal layer arranged above through through holes. One end of the upper metal layer is connected to the gate, and the other end is connected to the input metal pad. The thickness of the metal layer is greater than the thickness of the metal field plate.
  3. 根据权利要求2所述的片上集成RC电路的射频芯片,其特征在于,多个双场板结构通过上层金属层串联。The radio frequency chip with an on-chip integrated RC circuit according to claim 2, wherein a plurality of double field plate structures are connected in series through an upper metal layer.
  4. 根据权利要求2所述的片上集成RC电路的射频芯片,其特征在于,所述电阻电容组合结构的电容包括设置在外延层上的下金属层和上金属层,所述上金属层设置于下金属层的上方,所述下金属层与上金属层间设置有介质层,所述下金属层连接栅极,上金属层连接输入金属焊盘。The radio frequency chip with an on-chip integrated RC circuit according to claim 2, wherein the capacitor of the resistor-capacitor combination structure comprises a lower metal layer and an upper metal layer arranged on the epitaxial layer, and the upper metal layer is arranged on the lower Above the metal layer, a dielectric layer is disposed between the lower metal layer and the upper metal layer, the lower metal layer is connected to the gate, and the upper metal layer is connected to the input metal pad.
  5. 根据权利要求4所述的片上集成RC电路的射频芯片,其特征在于,所述上金属层的通过断口分割为第一上金属层和第二上金属层,所述断口内设置有介质层,所述第一上金属层通过通孔连接下金属层,所述第一上金属层连接栅极,第二上金属层连接输入金属焊盘。The radio frequency chip with an on-chip integrated RC circuit according to claim 4, wherein the upper metal layer is divided into a first upper metal layer and a second upper metal layer through a fracture, and a dielectric layer is provided in the fracture, The first upper metal layer is connected to the lower metal layer through the through hole, the first upper metal layer is connected to the gate electrode, and the second upper metal layer is connected to the input metal pad.
PCT/CN2020/129810 2020-10-30 2020-11-18 Radio frequency chip with rc circuit integrated on chip WO2022088299A1 (en)

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