WO2022073357A1 - Sequencing system and bearing apparatus - Google Patents

Sequencing system and bearing apparatus Download PDF

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Publication number
WO2022073357A1
WO2022073357A1 PCT/CN2021/099329 CN2021099329W WO2022073357A1 WO 2022073357 A1 WO2022073357 A1 WO 2022073357A1 CN 2021099329 W CN2021099329 W CN 2021099329W WO 2022073357 A1 WO2022073357 A1 WO 2022073357A1
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WO
WIPO (PCT)
Prior art keywords
reactor
base
flow channel
hole
positioning
Prior art date
Application number
PCT/CN2021/099329
Other languages
French (fr)
Chinese (zh)
Inventor
张松振
姜泽飞
王光明
郑焦
赖林
Original Assignee
深圳市真迈生物科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CN202022246419.9U external-priority patent/CN213924845U/en
Priority claimed from CN202022251614.0U external-priority patent/CN213680707U/en
Priority claimed from CN202022251300.0U external-priority patent/CN213570512U/en
Priority claimed from CN202110297328.4A external-priority patent/CN115109694A/en
Application filed by 深圳市真迈生物科技有限公司 filed Critical 深圳市真迈生物科技有限公司
Publication of WO2022073357A1 publication Critical patent/WO2022073357A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence

Definitions

  • the present application relates to the field of biological sample detection equipment, and in particular, to a sequencing system and a carrying device.
  • the sequencing system is also constantly updated.
  • the sequencing system includes an imaging component, and the imaging component is used to perform a sequencing reaction on the nucleic acid in the reactor (for example, the flow cell flowc-ell or the chip). Molecules are photographed, and the resulting images are analyzed to obtain sequencing results.
  • a sequencing system includes a carrier device for carrying the chip and/or for adjusting the position of the chip.
  • biochemical reactions are often involved, especially those involving biocatalysts such as proteases, which are sensitive to temperature and generally need to control the temperature of the reaction environment, such as cooling the chip or The temperature is controlled to ensure the effective progress of the biochemical reaction on it.
  • Existing sequencing devices include temperature control components. For example, semiconductor cooling sheets are used to cool or heat the chips, and metal heat sinks or water cooling systems are used to dissipate heat.
  • the so-called temperature control component is in direct or indirect contact with the reactor to achieve refrigeration or heating. During the process of temperature change, the structure in contact with the temperature control component, such as the reactor, will deform, which may affect the biochemical reaction in the reactor. and/or increase the difficulty of focusing and tracking the signal acquisition.
  • Embodiments of the present application provide a sequencing system and a carrying device.
  • the sequencing system of the embodiment of the present application includes: a carrying device for carrying a reactor and adjusting the temperature of the reactor, a plurality of polynucleotides are connected to the reactor, and the carrying device includes: a base having a On the bearing surface that carries the reactor, the temperature control assembly includes a connected heat conduction plate, a refrigerator and a heat dissipation module.
  • the refrigerator is connected to the reactor through the heat conduction plate, and is placed on the bearing surface.
  • the thermally conductive plate is rigidly connected to the reactor, and a connecting component connects the base and the temperature control component, the connecting component includes a support seat, and the thermally conductive plate is connected to the
  • the base is connected through the support base;
  • a fluid device is connected with the carrying device for controllably moving one or more fluorescently labeled reagents to the reactor and the polynucleotide contacting;
  • an imaging device positioned above the carrier device for exciting and collecting fluorescence generated by the fluorescent label;
  • a computing device operably coupled to the imaging device, including means for acquiring fluorescence from the imaging device Signal instruction set.
  • the automation can be improved. Sequencing accuracy and instrument life.
  • Using the sequencing device for nucleic acid sequencing can better control the temperature of the reaction environment of the reactor to ensure the effective progress of the biochemical reaction in the reactor, and can also better achieve focusing and tracking, and quickly obtain a clear and clear view of the designated surface of the reactor. images, and then based on these clear images, the bases can be accurately identified, and the accurate determination of the nucleic acid sequence can be realized.
  • a bearing device in an embodiment of the present application includes: a base having a bearing surface for bearing a reactor; and a temperature control assembly, wherein the temperature control assembly includes a connected heat conducting plate, a refrigerator and a heat dissipation module.
  • the refrigerator is connected with the reactor through the heat-conducting plate, and when the reactor is placed on the bearing surface, the heat-conducting plate is rigidly connected with the reactor; and a connecting assembly, the base and The temperature control assembly is connected through the connection assembly, and the connection assembly includes a support seat, and the heat conduction plate and the base are connected through the support seat.
  • the bearing device including the above-mentioned structural composition and connection relationship, including that the heat-conducting plate and the reactor are arranged to be rigidly connected and/or that the heat-conducting plate and the base are not directly connected, can better control the influence of temperature changes on the structure and the connection relationship between the structures. , so that the carrying device can carry the reactor more stably all the time, including maintaining the position of the reactor in the moving process is always fast, and can achieve better heat transfer, which is conducive to the reaction in the carried reactor and the driving of the reactor. So that the detection device can continuously collect signals from different parts of the reactor, and stably realize the detection of the sample.
  • FIG. 1 is a schematic perspective view of a sequencing system according to an embodiment of the present application.
  • FIG. 2 is an exploded schematic view of a carrying device according to an embodiment of the present application
  • FIG. 3 is a schematic structural diagram of a mobile platform according to an embodiment of the present application when a base is carried;
  • FIG. 4 is a schematic structural diagram of a base according to an embodiment of the present application.
  • FIG. 5 is a schematic structural diagram of a reactor according to an embodiment of the present application.
  • FIG. 6 is a schematic structural diagram of a base according to an embodiment of the present application.
  • FIG. 7 is a schematic side view of the mobile platform according to the embodiment of the present application when the base is carried;
  • FIG. 8 is a partial enlarged schematic diagram of FIG. 7 according to an embodiment of the present application.
  • FIG. 9 is a schematic longitudinal cross-sectional view of the carrying device carrying the reactor according to the embodiment of the present application.
  • FIG. 11 is a schematic structural diagram of a water bath according to an embodiment of the present application.
  • FIG. 12 is a schematic structural diagram of a heat dissipation plate according to an embodiment of the present application.
  • FIG. 13 is a schematic structural diagram of a cover plate according to an embodiment of the present application.
  • FIG. 14 is another schematic structural diagram of the heat dissipation plate according to the embodiment of the present application.
  • 15 is a schematic longitudinal cross-sectional view of the carrying device from another perspective of an embodiment of the present application.
  • FIG. 16 is an enlarged schematic diagram of a part in FIG. 15 of an embodiment of the present application.
  • FIG. 17 is a schematic structural diagram of a support seat according to an embodiment of the present application.
  • FIG. 18 is a schematic structural diagram of a thermally conductive plate according to an embodiment of the present application.
  • FIG. 19 is a schematic structural diagram of the reactor according to the embodiment of the present application from another perspective.
  • 20 is a schematic longitudinal cross-sectional view of the carrying device according to the embodiment of the present application from another perspective;
  • 21 is a schematic longitudinal cross-sectional view of the carrying device according to the embodiment of the present application at the first manifold;
  • 22 is a partial cross-sectional view of a first manifold of an embodiment of the present application.
  • 23 is a schematic longitudinal cross-sectional view of the carrying device of the embodiment of the present application at the second manifold;
  • 24 is a schematic structural diagram of an imaging device according to an embodiment of the present application.
  • 25 is a schematic structural diagram of a first light source according to an embodiment of the present application.
  • FIG. 26 is a schematic structural diagram of a fluid device according to an embodiment of the present application.
  • the carrying device 1000 the base 100 , the carrying surface 120 , the accommodating groove 122 , the first through hole 124 , the gap 126 , the temperature control assembly 200 , the heat conduction plate 220 , the first hole 222 , the second hole 224 ,
  • Reactor 300 chip frame 320, third hole 322, fourth hole 324, sheet 340, flow path 360, inlet 362, outlet 364, rigid plate 380,
  • Base 700 adjustment structure 720, fine adjustment nut 722, tension spring 724, mobile platform 800, table top body 820, first drive mechanism 840, first slide rail 842, first slide seat 844, second drive mechanism 860, second The slide rail 862, the second slide seat 864, the first support portion 864a, the second support portion 864b, the third through hole 864c, the guide member 866,
  • Fluidic device 2000 reservoir 60, multi-port valve 70, sample inlet 72, sample outlet 74, manifold 76, pump assembly 80, liquid collector 90,
  • Imaging device 3000 first light source 12, first light emitter 13, first beam splitter 14, third lens 15, first lens 16, fourth lens 17, second lens 18, beam splitting module 40, first reflecting surface 26.
  • first and second are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, features defined as “first”, “second” may expressly or implicitly include one or more of said features. In the description of the present application, “plurality” means two or more, unless otherwise expressly and specifically defined.
  • the terms “installed”, “connected” and “connected” should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; it can be mechanical connection, electrical connection or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction of two elements relation.
  • installed should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; it can be mechanical connection, electrical connection or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction of two elements relation.
  • a first feature "on” or “under” a second feature may include direct contact between the first and second features, or may include the first and second features Not directly but through additional features between them.
  • the first feature being “above”, “over” and “above” the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is level higher than the second feature.
  • the first feature is “below”, “below” and “below” the second feature includes the first feature being directly below and diagonally below the second feature, or simply means that the first feature has a lower level than the second feature.
  • the so-called chip refers to a solid-phase substrate and has a surface capable of connecting or immobilizing target biomolecules.
  • the surface can be a curved surface or a flat surface.
  • Such techniques include, for example, immobilizing a large number of probes, such as oligonucleotide fragments, on the surface of a support, and/or hybridizing probes immobilized on the surface of a support to DNA or other target molecules (such as proteins, factors or small molecules),
  • both the probe and the biomolecule to be tested are nucleic acid molecules, and at least a part of the probe can complementarily bind to the biomolecule to be tested (based on the principle of complementary base pairing), so that the target biomolecule can be linked or immobilized on the surface of the solid-phase substrate .
  • the Z-axis referred to in this application is the shooting direction of the imaging component
  • the imaging component may be, for example, an optical imaging component, wherein the Z-axis is the optical axis of the optical imaging component, and the Z-axis is perpendicular to the plane formed by the X-axis and the Y-axis.
  • the working distance of the objective lens referred to in this application refers to the distance between the front edge of the objective lens and the surface of the sample when the sample is in focus.
  • an embodiment of the present application provides a sequencing system 10000 for detecting biological samples.
  • the sequencing system 10000 includes a carrier device 1000 , a fluid device 2000 , an imaging device 3000 and a computing device (not shown).
  • the carrying device 1000 is used for carrying the reactor 300 and adjusting the temperature of the reactor 300, and the reactor 300 is connected with a plurality of polynucleotides.
  • this embodiment provides a carrying device 1000 , including two bases 100 , a base 700 and a mobile platform 800 . In other embodiments, more than two bases 100 may also be included.
  • each base 100 has a carrying surface 120 for carrying the reactor 300 , and the carrying surface 120 is provided with an accommodating groove 122 for accommodating the reactor 300 .
  • the reactor 300 when sequencing is performed, the reactor 300 is placed on the receiving tank 122, so that the reactor 300 placed on the base 100 is more stable during the process of being moved.
  • the reactor 300 can provide a space for biochemical reactions, and can also be called a reaction chamber, such as a chip.
  • the reactor 300 includes a chip frame 320 and a sheet layer 340 disposed in the chip frame 320 .
  • the shape of the accommodating groove 122 can match the shape of the chip frame 320 of the reactor 300 , which is a rectangular accommodating groove 122 in this embodiment.
  • the base 700 included in the carrying device 1000 may be a hollow structure, and the top of the base 700 may be provided with an opening. It can be easily understood that the base 700 with the hollow structure can accommodate other components provided on the base 100 .
  • two bases 100 are placed in parallel at the openings on the base 700 , and each base 100 is connected to the base 700 through an adjustment structure 720 , and the adjustment structure 720 can lengthen or shorten the space between the base 100 and the base 700 and the base 100 is disposed on the top of the base 700 , so the height of the base 100 can be changed by adjusting the structure 720 .
  • the adjustment structure 720 in this embodiment includes a fine adjustment nut 722 and a tension spring 724 , and a plurality of fine adjustment nuts 722 are connected between a base 100 and the base 700 .
  • the adjustment directions of the fine adjustment nut 722 are respectively perpendicular to the first direction and the second direction, wherein the first direction and the second direction are both horizontal directions, so in this embodiment, the direction of the fine adjustment nut 722 is the vertical direction.
  • One effect of setting the fine adjustment nut 722 may be that the overall height of the entire base 100 can be adjusted through the fine adjustment nut 722. Specifically, each fine adjustment nut 722 can be adjusted separately, and then the base 100 can be adjusted after rising to a certain height. Leveling is performed to ensure the imaging effect. Another effect can be to change the inclination of the base 100, for example, by adjusting only the fine adjustment nut 722 on one side of the base 100, so that the base 100 on this side is slightly raised or slightly descend, so that the base 100 has a certain inclination angle with respect to the horizontal position.
  • the height difference between the surfaces of the respective sheets 340 in the two reactors 300 can be made not greater than 20% of the working distance of the objective lens in the imaging assembly.
  • a plurality of tension springs 724 are connected between a base 100 and the base 700, and the elastic directions of the tension springs 724 are also perpendicular to the first direction and the second direction respectively, and the base 100 receives the force from the tension springs 724 all the time.
  • the fine adjustment nut 722 and the tension spring 724 cooperate with each other, so that the base 100 is clamped in a position suspended from the base 700, and even if it is collided by other objects, the clamped base 100 generates There is also little to no shaking.
  • the carrying device 1000 further includes a moving platform 800 .
  • the moving platform 800 is located below the base 700 and can be used to support and move the base 700 .
  • the mobile platform 800 includes a table top body 820, a first driving mechanism 840 and a second driving mechanism 860.
  • the table top body 820 is connected to the base 700.
  • the bottom of the base 700 is provided with threaded holes for threading with the table top body 820. connect.
  • the first driving mechanism 840 includes a first sliding rail 842, a first sliding seat 844 and a first motor (not shown in the figure).
  • the first sliding rail 842 is arranged parallel to the first direction, then the first driving mechanism 840 can drive the table top body 820 to move in the first direction, and the first sliding seat 844 is mounted on the first sliding rail 842 and is driven by the first motor Moving downward along the first slide rail 842 , the table top body 820 is connected with the first sliding seat 844 , and with the movement of the first sliding seat 844 , the table top body 820 drives the base 700 to move.
  • the second driving mechanism 860 includes a second sliding rail 862, a second sliding seat 864 and a second motor (not shown in the figure).
  • the second sliding rail 862 is arranged in parallel with the second direction, then the second driving mechanism 860 can drive the table top body 820 to move in the second direction, and the second sliding seat 864 is mounted on the second sliding rail 862 and driven by the second motor Moving along the second sliding rail 862 , the first sliding rail 842 is disposed on the second sliding seat 864 .
  • the second sliding seat 864 in this embodiment includes a first support portion 864a and a second support portion 864b located on both sides of the first support portion 864a. One support portion 864a is connected to the other second support portion 864b in sequence.
  • the first support portion 864a has a cuboid structure
  • the first support portion 864a is provided with a slot along the first direction to form the first slide rail 842
  • the second support portion 864b has a slope, specifically the second support portion The greater the distance between the top of the 864b and the first support portion 864a along the second direction, the lower the height thereof, so the second sliding seat 864 is in the shape of a terrace as a whole.
  • a guide member 866 is provided in the second slide rail 862, and the guide member 866 is parallel to the second direction.
  • the second sliding seat 864 may include a first side and a second side opposite to the first side along the second direction.
  • the first side is the left side in FIG. 7
  • the second side is the right side in FIG. 7 .
  • the first side has a third through hole 864c matching with the guide member 866, and the guide member 866 extends through the third through hole 864c to the outside of the second sliding seat 864, of course, in other embodiments, the guide member 866 A matching third through hole 864c may also be provided on the second side.
  • the purpose of providing the guide member 866 is that compared with the first slide rail 842, the second slide rail 862 is longer in length and the weight of the components it carries is larger, the provision of the guide member 866 can make the second slide rail 862 longer.
  • the seat 864 can remain parallel to the second direction during movement so that the base 100 also remains stable during movement.
  • a plurality of pedestals 100 that can carry the reactors 300 can be arranged on the pedestal 700 , and the pedestal 700 is moved by the moving platform 800 to move the pedestals 100, multiple reactors 300 can be adjusted simultaneously.
  • the carrier device 1000 can better adjust the focal plane to meet the imaging requirements; by adjusting the base 100 and the base
  • the adjustment structure 720 between 700 can finely adjust, such as increasing or shortening the distance between the reactor 300 and the imaging component, and the imaging object such as the verticality of a certain field of view (FOV) on the reactor 300 and the optical axis.
  • the cooperation of the moving platform 800 and the adjustment structure 720 can easily and precisely realize the adjustment of the desired position/relationship of the reactor 300 and the imaging device 3000 .
  • biochemical reactions are generally involved, especially biochemical reactions involving biocatalysts such as proteases.
  • biocatalysts such as proteases.
  • Such biochemical reactions are sensitive to temperature, and generally it is necessary to control the temperature of the reaction environment, such as cooling or heating the chip, to ensure the effective progress of the biochemical reactions thereon.
  • the carrier device 1000 on the sequencing system 10000 in the present application further includes a temperature control assembly 200 for efficiently and stably controlling the temperature of the reactor 300, so that the biochemical reaction can be performed effectively.
  • the so-called semiconductor refrigeration sheet is based on the Peltier effect, so that the effect of cooling or heating can be achieved.
  • the principle of cooling or cooling is: when the current passes through the two phases When connecting conductors, there will be a temperature difference at the connection, that is, heat absorption and heat release at the connection.
  • the effect was discovered by the Frenchman Peltier (Jean-CharlesPeltier).
  • the amount of heat absorbed and released in the Peltier effect is determined by the magnitude of the current.
  • People have made cooling and heating elements based on the Peltier effect, such as Peltier cooling and heating fins. When the Peltier cooling and heating sheet is energized, one side absorbs heat (cooling) and the other side releases heat (heating).
  • the heat absorption surface and the heat release surface can be changed by changing the direction of the current.
  • the temperature control assembly 200 includes a refrigerator 240 , a heat dissipation module 260 and a control module 280 , and the refrigerator 240 has a first surface and a second surface opposite to each other.
  • the reactor 300 is placed on the bearing surface 120.
  • the bearing surface 120 is provided with an accommodating groove 122 for placing the reactor 300.
  • the bottom wall of the groove 122 is provided with a first through hole 124 . Then, when the bearing surface 120 carries the reactor 300 , the first surface of the refrigerator 240 is in contact with the reactor 300 through the first through hole 124 .
  • passing through the first through hole 124 means that the refrigerator 240 contacts the reactor 300 through the first through hole 124 from bottom to top, and the contact here includes both direct contact and indirect contact.
  • the reactor 300 is cooled or heated by direct contact heat transfer or indirect contact heat transfer.
  • the so-called direct contact is, for example, that the first surface of the refrigerator 240 is attached to the reactor 300
  • the indirect contact is, for example, the temperature control assembly 200 may further include a heat-conducting plate 220, so that the heat-conducting plate 220 abuts on the cooling plate 220.
  • a part of the heat-conducting plate 220 is located in the first through hole 124.
  • a heat-conducting adhesive with good thermal conductivity is used to bond the heat-conducting plate 220 and the refrigerator 240, so that the refrigerator 240 is connected to the refrigerator 240 through the heat-conducting plate 220.
  • Reactor 300 contacts.
  • the material of the heat conducting plate 220 is a metal material, such as a material containing silver or aluminum.
  • the heat-conducting plate 220 may be approximately in the shape of a cuboid, and the cross-sectional dimension of the heat-conducting plate 220 may be approximately the same as that of the refrigerator 240 , so that the structure between the heat-conducting plate 220 and the refrigerator 240 can be matched more compactly, which is conducive to efficient heat conduction.
  • the refrigerator 240 starts to work after being powered on. At this time, one of the first surface and the second surface starts to cool, and the other surface starts to heat. For example, after the refrigerator 240 works, the first side starts to cool, and the second side starts to heat. It can be understood that when the working current of the refrigerator 240 is different, the cooling type of the first side is different. For example, when the working current of the refrigerator 240 is forward, the first side cools; when the working current of the refrigerator 240 is reverse, the first side heats. Compared with other refrigeration elements, the refrigerator 240 has the advantages of being more environmentally friendly and not generating noise.
  • the heat dissipation module 260 is in contact with the second surface of the refrigerator 240 , for example, connected to the second surface through a paste-like substance with good thermal conductivity such as silicone grease, so as to take away the heat generated during the operation of the refrigerator 240 .
  • the heat dissipation module 260 includes a water bath 262 and a liquid component 264 .
  • the material of the water bath 262 can be a metal material, for example, the material of the water bath 262 is copper, aluminum and other materials.
  • the water bath 262 has a chamber for accommodating the cooling liquid, and the water bath 262 is provided with a liquid inlet 262e and a liquid outlet 262f which communicate with the chambers.
  • the water bath 262 includes a heat dissipation plate 2622 and a cover plate 2624 , a surface of the heat dissipation plate 2622 is provided with a flow channel 2626 for accommodating the cooling liquid, and the cover plate
  • the 2624 is sealed and closed on the flow channel 2626 to form a cavity.
  • a sealing ring 2628 is provided between the cover plate 2624 and the heat dissipation plate 2622, and the sealing ring 2628 can seal the gap between the cover plate 2624 and the heat dissipation plate 2622.
  • the flow channel 2626 is in a tortuous shape, which can further increase the circuit through which the cooling liquid flows, thereby enhancing the cooling effect of the water bath 262 .
  • the water bath 262 may include a heat dissipation plate 2622 and a cover plate 2624, and the heat dissipation plate 2622 is provided with a first heat dissipation area 2622a and a second heat dissipation area 2622b.
  • the first heat dissipation area 2622a is provided with a first flow channel 262a and a second flow channel 262b
  • the second heat dissipation area 2622b is provided with a third flow channel 262c and a fourth flow channel 262d.
  • each flow channel has a first end and a second end facing different, the first end of the first flow channel 262a is communicated with the first end of the second flow channel 262b, and the second end of the first flow channel 262a is connected to the liquid inlet
  • the port 262e is in communication
  • the second end of the third flow channel 262c is in communication with the second end of the fourth flow channel 262d
  • the first end of the fourth flow channel 262d is in communication with the liquid outlet 262f
  • the second end of the second flow channel 262b It communicates with the first end of the third flow channel 262c.
  • FIG. 14 takes FIG. 14 as an example to illustrate a layout of the flow channels.
  • the flow channels may also be laid out in other ways.
  • the second heat dissipation area 2622b is located on the side where the first end of each flow channel in the first heat dissipation area 2622a is located.
  • the direction to the left in the figure is the direction of the first end of each flow channel, and the direction to the right in the figure is the direction of the second end of each flow channel.
  • the cover plate 2624 is connected to the cooling plate 2622 and covers the first flow channel 262a and the second flow channel. 262b, the third flow channel 262c and the fourth flow channel 262d.
  • first flow channel 262a, the second flow channel 262b, the third flow channel 262c and the fourth flow channel 262d flow in sequence, so it can also be considered that the entire flow channel is divided into four sections, so as to obtain the above four flow channels road.
  • At least one flow channel in the first heat dissipation area 2622a is in a tortuous shape
  • at least one flow channel in the second heat dissipation area 2622b is in a tortuous shape
  • the second flow channel 262b and the fourth flow channel 262d are respectively in a tortuous shape
  • the first flow channel 262a and the third flow channel 262c are respectively straight flow channels.
  • the tortuous flow channel can extend the length of the coolant flow path in a single flow channel.
  • the first flow channel 262a may also be in a zigzag shape
  • the third flow channel 262c may also be in a zigzag shape.
  • the liquid inlet 262e and the liquid outlet 262f are approximately located near the middle of the entire water bath 262, and the cooling liquid flows into the first end of the first flow channel 262a from the liquid inlet 262e, and passes through the first flow channel 262a It reaches the second end of the first flow channel 262a after a straight section of the first flow channel 262a, then enters the third flow channel 262c after passing through the tortuous second flow channel 262b, and then enters the tortuous fourth flow channel 262d after passing through a straight section of the third flow channel 262c. , and finally flows out from the liquid outlet 262f at the second end of the fourth flow channel 262d.
  • the above-mentioned flow channel design of the water bath 262 makes full use of the space of the water bath 262 and extends the length of the flow path of the cooling liquid under the same volume, thereby bringing about a better heat dissipation effect.
  • the liquid assembly 264 includes a connected pump 2642 and a cooler 2644, the pump 2642 is used to provide power to the cooling liquid, the cooler 2644 is used to cool the cooling liquid, and the pump 2642 is connected to the water through the liquid inlet 262e.
  • the bathroom 262 is connected, the cooler 2644 is connected to the water bathroom 262 through the liquid outlet 262f, that is, the pump 2642 is connected to the liquid inlet 262e through pipelines, and the cooler 2644 is connected to the liquid outlet 262f through other pipelines.
  • the cooling liquid is discharged from the liquid outlet 262f under the action of the pump 2642 and then cooled by the cooler 2644.
  • the cooler 2644 can use the existing cooling structure, for example, it can include a copper box, which is filled with refrigerant, the pipeline for the cooling liquid to flow through the box, and the cooling liquid flows in the pipeline and the box.
  • the coolant undergoes heat exchange, so as to achieve the purpose of cooling the coolant.
  • connection sequence of the cooler 2644 and the pump 2642 can also be changed.
  • the pump 2642 is connected to the water bath 262 through the liquid outlet 262f
  • the cooler 2644 is connected to the water bath 262 through the inlet port 262f.
  • the liquid port 262e is connected to the water bath 262.
  • the cooling liquid in the water bath 262 is discharged from the liquid outlet 262f under the action of the pump 2642, and passes through the cooler 2644 for heat dissipation before entering the water bath 262.
  • the liquid component 264 further includes a water reservoir 2644, and the water reservoir 2644 stores the cooling liquid, so as to provide the cooling liquid for the water bath 262.
  • the pump 2642 and the cooler 2644 are connected to the water tank 262 through pipelines, respectively. Reservoir 2644 is connected.
  • the cooling liquid is drawn out from the reservoir 2644 under the action of the pump 2642, passes through the pump 2642 and reaches the water bath 262 to absorb heat, and then passes through the cooler 2644 to dissipate heat and return to the reservoir 2644.
  • the cooling liquid in the water bath 262 is continuously pumped out under the action of the pump 2642, returns to the reservoir 2644 and flows through the cooler 2644 to be cooled, and then enters the water bath 262 to absorb heat.
  • the cooling liquid enters the first flow channel 262a from the liquid inlet 262e on the first flow channel 262a, and flows through the first flow channel 262a and the second flow channel 262b in sequence.
  • 2622a realizes multiple flows from one end of the flow channel to the other end, extending the flow path of the cooling liquid such as condensed water, which can improve the heat dissipation capacity, and at least one of the first flow channel 262a and the second flow channel 262b
  • the zigzag shape further extends the coolant flow path within the same volume/space.
  • the cooler 2644 further includes a cooling row, the cooling row is provided with a channel, and the channel is provided with a plurality of cooling fins for dissipating the cooling liquid flowing through the cooler 2644. Further, the cooler 2644 also A fan may be included that generates airflow towards the cooling row, resulting in better cooling.
  • control module 280 is connected to the refrigerator 240 and the heat dissipation module 260 for detecting the temperature of the reactor 300 and controlling the operation of the heat dissipation module 260 according to the detected temperature.
  • control module 280 controls the working state of the pump 2642 according to the temperature of the reactor 300 , so as to control the operation of the heat dissipation module 260 .
  • the temperature suitable for the reactor 300 has a preset range
  • the control module 280 detects that the temperature of the reactor 300 is much lower than the maximum temperature value within the preset range (still within the preset range)
  • the control module 280 can control the pump 2642 to stop working, so that the cooling liquid in the water bath 262 stops flowing.
  • the temperature of the reactor 300 is prevented from falling too low, and on the other hand, the energy consumption is also reduced.
  • the control module 280 detects When the temperature of the reactor 300 is much higher than the minimum temperature within the preset range (still within the preset range), the control module 280 can control the pump 2642 to start working again, drive the cooling liquid to flow, and improve the heat dissipation capacity.
  • the control module 280 includes a microprocessor 284 and a temperature sensor 282 electrically connected to the microprocessor 284 .
  • the temperature sensor 282 may be provided on the thermally conductive plate 220 for detecting the thermally conductive plate 220
  • the temperature of the reactor 300 is estimated by the temperature of the thermal conductive plate 220.
  • the microprocessor 284 can also be electrically connected to the pump 2642, and can control the pump 2642 to work or stop. For example, a relay controlled by the microprocessor 284 is set in the working circuit of the pump 2642, so as to control the closing or opening of the working circuit of the pump 2642. open.
  • the control module 280 may also control the working current of the refrigerator 240 according to the temperature sensed by the temperature sensor 282 .
  • the microprocessor 284 can control to increase the working current of the refrigerator 240 to increase the power of the refrigerator 240, so that the refrigerator 240 can improve the heat-conducting plate 220.
  • the temperature sensor 282 is a contact temperature sensor 282 , for example, the temperature sensor 282 is in contact with the heat conducting plate 220 .
  • the temperature sensor 282 can be a non-contact temperature sensor 282, for example, the temperature sensor 282 is an infrared temperature sensor.
  • the cooling liquid in the above-mentioned water bath 262 may be water. In this way, the cost of the carrier device 1000 can be reduced.
  • the cooling liquid may be a specially made cooling liquid, without any limitation. The specially made coolant can ensure that the thermal conductivity can reach a more ideal state.
  • the temperature control component 200 included in the sequencing system 10000 can adjust the temperature of the reactor 300, for example, use a cooling sheet to cool or heat the chip, and then use a metal heat sink or a water cooling system to discharge the temperature. Take heat, etc.
  • the increase and decrease of temperature will cause deformation of the relevant mechanical firmware, such as thermal expansion and cooling contraction.
  • the temperature control assembly 200 and the structures directly connected or in contact with the above structures are easily affected, for example, the base 100 of the carrying device 1000 in the embodiment of the present application.
  • the entire temperature control assembly 200 can be in contact with the reactor 300 placed in the accommodating tank through the first through hole 124 from bottom to top.
  • a portion of the thermally conductive plate 220 is located in the first through hole 124 .
  • 15 and FIG. 16 in the horizontal direction shown in the figures, there is a certain gap between the edge of the heat-conducting plate 220 and the inner wall of the first through hole 124 , and the gap is used for the heat of the heat-conducting plate 220 .
  • Expansion and contraction provide enough deformation space.
  • the principle is similar to that there is a certain gap between the adjacent rails on the railway, leaving enough space for the deformation of the rails when the temperature changes, so as to avoid extrusion between the adjacent rails. Therefore, in this embodiment, the heat conduction plate 220 and the base 100 can be prevented from being pressed against each other as much as possible.
  • the carrying device 1000 further includes a connecting component, and the connecting component is used for connecting the base 100 and the temperature control component 200 .
  • the connection assembly includes a support base 420 , a first positioning structure 440 and a second positioning structure 460 .
  • the heat-conducting plate 220 and the base 100 are connected through the support seat 420, and the support seat 420 is made of a material whose thermal deformation degree is smaller than that of the heat-conducting plate 220, so that the deformation amount of the support seat 420 is smaller under the same temperature change condition.
  • the support base 420 is directly connected to the base 100 , so the influence on the base 100 is also small.
  • the support base 420 can be installed at the bottom of the base 100 , and a through groove 422 is provided in the center of the support base 420 , and the through groove 422 communicates with the first through hole 124 on the base 100 ,
  • the size of the through groove 422 may be smaller than the size of the first through hole 124 , and a part of the refrigerator and the heat dissipation plate of the heat dissipation module 260 are located in the through groove 422 .
  • the through grooves 422 can function as heat insulation.
  • the support base 420 may not be provided with the through slot 422, and the heat dissipation module 260 is located above the support base 420.
  • the groove of the temperature control component 200 located outside the first through hole 124 (in the case where a part of the temperature control component 200 is located in the first through hole 124 and a part is located outside the first through hole 124 ).
  • the support base 420 includes a first side and a second side opposite to the first side.
  • the first side is provided with a first positioning structure 440 and the second side is provided with a second positioning structure 460. Both positioning structures can pass through the first side.
  • the through hole 124 extends above the bottom wall of the receiving groove. In other embodiments, the two positioning structures may also directly pass through the base 100 and extend above the bottom wall of the accommodating groove.
  • the thermally conductive plate 220 is provided with a first hole 222 that can be matched with the first positioning structure 440 and a second hole 224 that can be matched with the second positioning structure 460 respectively.
  • the first hole 222 is a waist hole, and the waist hole is opposite to the waist hole. For the round hole, it has a higher deformation tolerance in its length direction.
  • the thermally conductive plate 220 expands under heat or shrinks under cold, it can deform along the length direction of the waist hole, and maintain the first hole 222 and the first position.
  • the matching relationship of the structures 440 ensures that the thermally conductive plate 220 is still closely matched with the positioning structure after being heated, and the position does not shift.
  • the first positioning structure 440 includes a first positioning post 442 that is matched with the first hole 222 .
  • the first positioning post 442 includes a first end and a second end opposite to the first end. The first end is connected to the support seat 420 , the second end of the first positioning post 442 is provided with a first positioning ball 444 , and the heat conducting plate 220 is located between the first positioning ball 444 and the support seat 420 .
  • the second positioning structure 460 includes a second positioning post 462 matched with the second hole 224 , the second positioning post 462 includes a first end and a second end opposite to the first end, and the first end of the second positioning post 462 is connected to the support
  • the seat 420 is connected, the second end of the second positioning post 462 is provided with a second positioning ball 464, the heat conducting plate 220 is located between the second positioning ball 464 and the support seat 420, and the reactor 300 is provided with a first positioning ball 444
  • the third hole for matching and the fourth hole for matching with the second positioning ball 464 is provided.
  • the two positioning posts cooperate with each other to position the heat-conducting plate 220 at the position to be in contact with the reactor 300 , and the arrangement of the two positioning balls, on the one hand, also positions the reactor 300 when it is placed, In addition, the placed reactor 300 is prevented from being displaced. On the other hand, the heat-conducting plate 220 cannot pass through the two positioning balls upward, and the heat-conducting plate 220 can be restricted between the positioning balls and the refrigerator.
  • one of the first positioning structure 440 and the second positioning structure 460 includes a positioning column, which can also meet the requirements of the present invention.
  • a thermally conductive adhesive with good thermal conductivity is used to bond the thermally conductive plate 220 and the refrigerator to further ensure that the thermally conductive plate 220 will not be separated from the refrigerator.
  • the first side of the support base 420 is provided with a first protruding portion 424 for supporting the thermally conductive plate 220 , the first protruding portion 424 is located in the first through hole 124 , and the top of the first protruding portion 424 is In contact with the bottom of the heat conducting plate 220 , there is also a gap between the first protruding portion 424 and the inner wall of the first through hole 124 , and the first positioning structure 440 is disposed on the first protruding portion 424 .
  • the second side of the support base 420 is provided with a second protruding portion 426 for supporting the thermally conductive plate 220 .
  • the second protruding portion 426 is located in the first through hole 124 and has a gap with the inner wall of the first through hole 124 .
  • the two positioning structures 460 are disposed on the second protruding portion 426 . In this way, the two protrusions can reduce the contact area between the heat-conducting plate 220 and the support seat 420 , and further reduce the influence of the heat-conducting heat of the heat-conducting plate 220 on the support seat 420 .
  • the heat-conducting plate 220 that is greatly deformed by the temperature is not directly in contact with or connected to the base 100, but is connected through the support seat 420.
  • the heat-conducting plate 220 is connected to the inner wall of the first through hole 124. There is a gap between them, so that even if the heat-conducting plate 220 is thermally expanded, it will not squeeze the base 100 , which can prolong the service life of the base 100 .
  • the increase and decrease of the temperature will not only deform the relevant mechanical firmware, but may also cause the temperature control assembly 200 to contact the reactor 300. part is deformed by heat.
  • a squeezing force will be generated on the reactor 300, so that the reactor 300 is also deformed, thereby causing the flow path 360 in the reactor 300 to deform, affecting the biochemical reaction and/or increasing the focus tracking signal. Difficulty of collection.
  • the reactor 300 further includes a rigid plate 380, the rigid plate 380 is arranged under the sheet layer 340, the rigid plate 380 can be a metal plate such as an aluminum plate, and the temperature control component 200 is in contact with reactor 300 through rigid plate 380 .
  • the temperature control assembly 200 includes a heat conduction plate 220, a refrigerator 240 and a water bath 260 that are connected in sequence, and the heat conduction plate 220, the refrigerator 240 and the water bath 260 are stacked in sequence, and the entire temperature control assembly 200 can be worn from bottom to top
  • the first through hole 124 is in contact with the reactor 300 placed in the receiving groove 122 , wherein the thermally conductive plate 220 is in direct contact with the rigid plate 380 .
  • the connecting assembly further includes a first connecting member 480 and a second connecting member 482 which are connected.
  • the first connecting member 480 is connected to the base 100
  • the second connecting member 482 is connected to the water bath 260
  • the first connecting member 480 is a rigid connecting member
  • the second connecting member 482 is an elastic connecting member.
  • the first connecting member 480 is a screw rod
  • the second connecting member 482 is a spring
  • the screw rod and the spring are respectively arranged in the vertical direction.
  • the rod portion of the screw rod passes through the cover plate 264 and is threadedly connected to the support seat 420
  • the spring is sleeved on the screw rod, one end of the spring elastically abuts against the head of the screw rod, and the other end of the spring elastically abuts against the head of the cover plate 264 .
  • an upward force is applied to the entire temperature control assembly 200 , and the cover plate 264 is pressed against the bottom of the support base 420 .
  • the reactor 300 is placed in the holding tank 122 .
  • the rigid plate 380 will first come into contact with the heat-conducting plate 220 .
  • the spring is compressed, and the temperature control assembly 200 moves downward until the chip frame 320 of the reactor 300 is in contact with the carrier. face 120 contacts.
  • the temperature control assembly 200 cools or heats the reactor 300
  • the top of the temperature control assembly 200 is in contact with the rigid plate 380.
  • the bottom is in contact with the spring, so the deformation is likely to occur downward, and the reactor 300 is not easily squeezed by the deformation.
  • the refrigerator 240 is flexibly connected to the water bath 262, so the extrusion of the refrigerator 240 towards the reactor 300 is also small; and the elastic force or extrusion can be transmitted downward to be released, showing These forces mainly cause the deformation and connection strength/strength of the refrigerator 240 and the water bath 262 under the carrying device 1000 , so that the carrying device 1000 can be stably and stably carried and moved, and the mechanical service life can be prolonged.
  • the support base 420 can be made of a relatively soft material.
  • the spring is compressed, and the temperature control assembly 200 moves downward.
  • the temperature control assembly 200 cannot continue to move downward after the thermal conductive plate 220 is in contact with the top of the support base 420 , so the reactor 300 stops moving.
  • the temperature control assembly 200 may stop moving after reaching the limit position connected to the base 100 .
  • the sequencing system 10000 and the carrying device 1000 include a temperature control assembly 200 for cooling or heating the reactor 300.
  • the temperature control assembly 200 and the reactor 300 are rigidly connected, so the temperature The temperature of the control assembly 200 and/or the deformation of the reactor 300 caused by heating will not basically affect the relative positional relationship between the two.
  • the device 1000 has less tolerance to the deformation of the supported and connected reactor 300 (reaction chamber), so that the reactor 300 placed therein can be tightly and firmly connected to the supporting device 1000; in this way, it is beneficial for the biochemical reaction process.
  • Accurate focusing and fast and stable focusing on the designated surface or part of the reactor 300 are beneficial to the acquisition of clear images of signals in the reactor and the realization of accurate sequencing based on the clear images.
  • imaging or cleaning or reaction reagents are usually passed into the reactor 300 to achieve the corresponding purpose. These reagents are generally placed in the reagent box.
  • the reactor 300 is first connected to the fluid device 2000 of the sequencing system 10000, so that the reactor 300 is connected to the liquid circuit of the sequencing system 10000, and then these reagents are introduced by the power device. into the reactor 300 flow path 360 of the reactor 300 for the corresponding process.
  • the flow path 360 of the sequencing system 10000 is established by connecting the various components with hoses, and in order to avoid liquid leakage and to connect more closely, a manifold is used with the reactor 300 including a plurality of flow paths 360 connect.
  • a manifold is used with the reactor 300 including a plurality of flow paths 360 connect.
  • the connection between the manifold and the reactor 300 will inevitably have different degrees of liquid leakage.
  • the support member 660 supporting the manifold is provided below the manifold, the support member 660 is easily damaged by the accumulation of fluid, which affects the performance stability of the carrying device 1000 and even the entire sequencing system 10000.
  • manifold mentioned in this application refers to the general name of the liquid inlet pipeline and the liquid outlet pipeline between the hose of the self-fluid system and the reactor 300 .
  • the carrying device 1000 in this embodiment further includes a fluid connector and a support structure 600 .
  • the reactor 300 has four flow paths 360, and the inlet and outlet of each flow path 360 may be located at the bottom of the reactor 300. In other embodiments, the reactor 300 may also be There is one or other number of flow paths 360 .
  • the base 100 includes a first side and a second side opposite to the second side.
  • the inlet of the flow path 360 in the reactor 300 may be close to the first side of the base 100
  • the flow path 360 of the reactor 300 may be close to the first side of the base 100
  • the outlet of the base 100 may be close to the second side.
  • the fluid connector communicates with the flow path 360 of the reactor 300, the fluid connector can pass through the base 100 from bottom to top, and the fluid connector is located in the reactor 300 and placed in the accommodating tank After 122 , the position that communicates with the inlet and outlet of the flow path 360 .
  • the fluid connection member includes a first manifold 520 and a second manifold 540 , and the first manifold 520 is located on the first side of the base 100 , as shown in FIGS. 21 and 21 .
  • FIG. 22 shows a schematic longitudinal cross-sectional view of a first manifold 520 of a structure, which has four inlet flow channels 522 for communicating with the inlets of the four flow channels 360 in the reactor 300 .
  • the second manifold 540 is located on the second side of the base 100 , as shown in FIG.
  • FIG. 23 which is a schematic longitudinal interface diagram of the second manifold 540 of a structure, which has an outlet flow channel 524 in which four branches merge into one main channel , the liquids discharged from the outlets of the four flow paths 360 of the reactor 300 converge on the main path of the outlet flow path 524 .
  • the internal flow channels are manifolds of other structures.
  • the support structure 600 is used to support the fluid connection.
  • the support structure 600 is located below the fluid connection and connected to the base 100 , so as to fix the fluid connection on the base 100 .
  • the fluid connector includes a first manifold 520 and a second manifold 540.
  • the supporting structure 600 also has two, which are respectively used to support the first manifold 520 and the second manifold 540, namely, the first manifold 520 and the second manifold 540.
  • the manifold 520 and the second manifold 540 are connected to the base 100 through the support structure 600 .
  • the following takes the support structure 600 under the first manifold 520 as an example for description, and the support structure 600 under the second manifold 540 is also the same.
  • the support structure 600 includes a support surface 620 for supporting the first manifold 520 and a support member 660 .
  • the support structure 600 may have a substantially U-shaped structure, and two ends of the U-shaped opening are screwed with the base 100 .
  • the bottom wall of the U-shaped structure can be used as the support surface 620 of the support structure 600.
  • the support surface 620 is provided with a first groove 640, one end of the support member 660 is set in the first groove 640, and the other end of the support member 660 is connected to the first groove
  • the manifold 520 is provided with a second through hole 624 in the first groove 640 .
  • the second through hole 624 is located on the bottom wall of the first groove 640 , and the radius of the second through hole 624 is smaller than the size that one end of the support member 660 can pass through, so the support member 660 will not slip from the second through hole 624 .
  • the bottom of the first manifold 520 has a second groove 524 matched with the other end of the support member 660 , and the other end of the support member 660 abuts in the second groove 524
  • the support member 660 is a spring and there may be a gap between the first manifold 520 and the support surface 620.
  • the first manifold 520 will press the spring downward.
  • the spring can elastically abut the first manifold 520 on the reactor 300 .
  • the two lateral sides of the first manifold 520 in the horizontal direction may have two connecting parts 526 respectively.
  • the support surface 620 is provided with a third positioning structure 680
  • the first manifold 520 is provided with a fourth positioning structure 530.
  • the third positioning structure 680 includes positioning posts 682
  • the fourth positioning structure 530 includes The positioning grooves 532 matched with the positioning posts 682 , that is, the positioning posts 682 on the support structure 600 are inserted into the positioning grooves 532 on the first manifold 520 to complete the positioning.
  • the third positioning structure 680 includes positioning grooves 532
  • the fourth positioning structure 530 includes a positioning post 682 matched with the positioning groove 532 .
  • the supports 660 are two and symmetrically arranged so that the first manifold 520 is supported more stably.
  • the carrier device 1000 of any of the above-mentioned embodiments and the sequencing system 10000 including the carrier device 1000 are connected to the reactor 300 provided with the flow path 360 by including the fluid connector, so as to realize the fluid connector and the flow path 360 in the reactor 300 of connectivity.
  • the fluid connection is fixed in position through the cooperation of the support surface 620 in the support structure 600 and the support 660 .
  • the liquid flowing to the support member 660 along the fluid connection member can be discharged from the second through hole 624 in the first groove 640, thereby preventing One end of the support member 660 is immersed in the liquid, which ensures the normal use of the support structure 600 and makes the performance of the sequencing system 10000 more stable.
  • the present application also provides an imaging device 3000, which is located above the carrying device 1000, and is used to excite the reactor 300 to emit optical signals and collect at least a part of the optical signals.
  • the imaging device 3000 may include a laser generator and a camera, the laser generated by the laser generator is irradiated on the sheet layer 240 after reacting with the reagent on the reactor 300, and the camera collects the image information, and the image information includes the sheet layer 240.
  • the fluorescence information emitted by the layer 240 after being irradiated by the laser can be analyzed to obtain the sequencing result according to the fluorescence information.
  • an imaging device 3000 includes a first light source 12 , a first lens 16 and a beam splitting module 40 , and the beam splitting module 40 includes a first beam splitter 14 and a second lens 18 , a first camera 20 and a second camera 22 .
  • the first lens 16 is used for receiving the first light beam from the first light source 12 and collimating the light beam onto the reactor 300 , and for receiving and collimating the light beam from the reactor 300 .
  • the second lens 18 is used to focus the collimated light beam from the first lens 16 to the first camera 20 and the second camera 22 .
  • the first beam splitter 14 is used to split the focused beam from the second lens 18 into a second beam and a third beam.
  • the first camera 20 is used to receive the second light beam.
  • the second camera 22 is used to receive the third light beam.
  • the beam splitter 14 divides the light into the second beam and the third beam, which can reduce the use of optical elements and shorten the optical path length of the splitting light, so that the total optical path length of the imaging device 3000 is reduced.
  • the shortening is beneficial to the miniaturization of the imaging device 3000 and the industrialization.
  • the nucleic acid sample to be tested can be placed in the reactor 300, such as in a chip.
  • the first light source 12 may be a laser light source.
  • the chip includes a substrate, the substrate is provided with a flow channel, and the substrate is provided with glass.
  • the first beam splitter 14 splits the fluorescent convergent beam into a second beam and a third beam
  • the first camera 20 receives the second beam
  • the second camera 22 receives the third beam
  • a first image and a second image of the field of view are acquired respectively.
  • the first light source 12 may include a first light emitter 13 and a third lens 15 , and the first light beam is a light beam emitted by the first light emitter 13 passing through the third lens 15 After the collimated beam, the first beam is focused to the back focal plane of the first lens 16 through the fourth lens 17 , and then is collimated and incident on the reactor 300 through the first lens 16 .
  • the first light source 12 also includes a fiber optic coupler, such as a single mode light coupler.
  • the imaging device 3000 is a total internal reflection imaging device 3000.
  • the collimated light beam (parallel light beam) passing through the first lens 16 is incident on the surface of the chip at a greater than critical angle, and total internal reflection occurs, which is generated on the lower surface of the chip glass.
  • Evanescent field evanescent wave. The fluorescence emitted by the excited fluorescent molecules in the evanescent field is received by the first lens 16 .
  • the light beam from the reactor 300 received by the first lens 16 is the light beam emitted by the sample under test in the reactor 300 .
  • the image sensors of the first camera 20 and the second camera 22 may adopt CCD or CMOS.
  • the image sensors used by the first camera 20 and the second camera 22 are of the same type, for example, both are CCD or both are CMOS.
  • the first beam splitter 14 may be a dichroic mirror.
  • the second beam is the transmitted beam of the first beam splitter 14
  • the third beam is the reflected beam of the first beam splitter 14 .
  • the first camera 20 and the second camera 22 are disposed at 90 degrees or 270 degrees. In this way, it is convenient to configure multiple cameras of the first camera 20 and the second camera 22 into the imaging device 3000 in a limited space.
  • the first beam splitter 14 has a first reflection surface 26 , the angle between the first reflection surface 26 and the horizontal plane is 45 degrees, and incident on a part of the first reflection surface 26 along the horizontal direction The light beam is reflected and turned by 90 degrees to reach the second camera 22 , while another part of the light beam incident on the first reflecting surface 26 in the horizontal direction passes through the first reflecting surface 26 and is incident on the first camera 20 .
  • the first camera 20 and the second camera 22 are arranged 90 degrees clockwise and 270 degrees counterclockwise.
  • the sample to be tested in the reactor 300 has two fluorescent labels, such as Cy3 and Atto647N, and the emission wavelengths of the two fluorescent molecules are 550-620 nm and 650-750 nm (the peaks are about 564 nm, respectively). and 670nm);
  • the first beam splitter 14 is a dichroic mirror, the dichroic mirror has a high transmittance for light with a wavelength of 550-620nm, and a high reflectance for light above 650nm.
  • the so-called fluorescently labeled nucleotide reagents include four types of nucleotide reagents, A, T, C and G, and different kinds of nucleotide reagents can be stored in different containers respectively.
  • four nucleotides carry the same fluorescent label, and during DNA sequencing, each round of sequencing reaction includes four base extension reactions, and the four base extension reactions are sequentially adding the four nucleotides and obtain the corresponding image.
  • each round of sequencing reaction includes two base extension reactions.
  • the nucleic acid to be tested, the enzyme, and the first fluorescent label and the second fluorescent are mixed in the flow path to react, and the first light source 12 simultaneously emits the first laser and the second laser to enter a specific field of view of the chip through the first lens 16, and the first fluorescent marker of the field of view is
  • the first and second fluorescent markers are excited by the first laser and the second laser to emit first and second fluorescence, respectively, and the first and second fluorescence are condensed to the first beam splitter 14 through the first lens 16 and the second lens 18 ( dichroic mirror), the dichroic mirror separates the converged first and second fluorescent light, the first fluorescent light is focused on the image plane of the first camera 20, and the second fluorescent light is focused on the image plane of the second camera 22, thus, respectively A first image and a second image formed by the first fluorescence and the second fluorescence of the field of view are obtained.
  • each round of sequencing reaction includes a base extension reaction.
  • the nucleic acid to be tested, the enzyme, and the above four nucleotide reagents The first light source 12 simultaneously emits the first laser and the second laser through the first lens 16 to enter the specific field of view of the chip, and the fluorescent markers in the field of view are excited by the first laser and the second laser respectively.
  • the fluorescence from fluorescent marker a is focused on the image plane of the first camera 20, and the fluorescence from fluorescent marker b is focused on the image plane of the second camera 22, thereby obtaining the first image and the second image of the field of view respectively.
  • Base calling/sequencing is achieved by combining first and second images of different rounds of sequencing reactions and merging information from the first and second images of the same round of sequencing reactions.
  • an embodiment of the present application provides a sequencing system 10000 , including a mobile platform 800 and an imaging device 3000 .
  • the mobile platform is used to carry the reactor 300
  • the imaging device 3000 is the imaging device 3000 in any of the above embodiments.
  • the above-mentioned sequencing system 10000 since it includes the imaging device 3000 having any of the above-mentioned technical features and advantages, has a compact structure, which is favorable for miniaturization and industrialization.
  • the mobile platform 800 is movable.
  • the moving platform 800 can drive the reactor 300 to move relative to the imaging device 3000 , for example, move along the direction perpendicular to the optical axis of the first lens 16 , or move along the direction parallel to the optical axis of the first lens 16 , or move along the direction inclined to the first lens 16 .
  • 16 moves in the direction of the optical axis, so that different positions of the reactor 300 are located directly under the first lens 16, so that the sequencing system 10000 including the imaging device 3000 can be used to realize the image acquisition of the reactor 300, thereby realizing sequence determination.
  • the sequencing system 10000 according to the embodiment of the present application may include the imaging device 3000 according to any of the foregoing embodiments.
  • the sequencing system 10000 of the embodiment of the present application further includes a computing device, the computing device can be operably coupled with the imaging device 3000 , and the computing device can be used to obtain an instruction set of the fluorescence signal from the imaging device 3000 .
  • the fluorescence signal collected by the imaging device 3000 is, for example, an image
  • the computing device acquires the image set from the imaging device 3000, processes and recognizes the information on the image to recognize the sequence determination.
  • Embodiments of the present application provide a fluidic device 2000, which is connected to the carrier device 1000 and used to controllably move one or more fluorescently labeled reagents to the reactor 300 to contact the polynucleotide.
  • the fluid device 2000 includes a reservoir 60 and a multi-port valve 70 .
  • the storage 60 is used to store solutions, and the solutions include a variety of solutions, such as reaction solutions, buffer solutions, cleaning solutions and/or purified water, etc., including reagents for different reactions or different steps of a reaction;
  • the multi-port valve 70 is provided with multiple A sample inlet 72 and a sample outlet 74, wherein the sample inlet 72 is used for the reagent to enter the multi-port valve 70, and the sample outlet 74 can be selectively communicated with one of the sample inlets 72, and is then realized through the set manifold 76 Connections to multiple flow paths within the reactor 300 for reagents to move from the sample outlet 74 to the reactor 300 to contact the polynucleotides.
  • the carrier device 1000 of the sequencing system 10000 may include multiple bases 100, and correspondingly, multiple reactors 300 may also be provided.
  • the multiple injection ports 72 of the multi-port valve 70 allow multiple Each of the reactors 300 can enter different liquids, thereby realizing multiple rounds/repeated reactions, and the setting of the multi-port valve 70 can realize the injection of multiple reagents to meet the biochemical process of sequencing, and also avoid cross-contamination between reagents.
  • the fluidic device 2000 may also include a pump assembly 80 and a sump 90 .
  • the pump assembly 80 is used as a negative pressure power source, so that the reagent flows into the flow path of the reactor 300 under the action of negative pressure to carry out a biochemical reaction, and the liquid collector 90 can collect the liquid flowing out of the multiple reactors 300.

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Abstract

A sequencing system, comprising a bearing apparatus used for bearing a reactor and adjusting the temperature of the reactor, the reactor being connected to a plurality of polynucleotides, wherein the bearing apparatus comprises: a base with a bearing surface for bearing the reactor; a temperature control assembly comprising a heat transfer plate, a refrigerator and a heat dissipation module which are all connected to one another, the refrigerator being connected to the reactor by means of the heat transfer plate, and when the reactor is placed on the bearing surface, the heat transfer plate being rigidly connected to the reactor; and a connecting assembly connecting the base to the temperature control assembly, the connecting assembly comprising a supporting seat, and the heat transfer plate being connected to the base by means of the supporting seat; and the sequencing system further comprising a fluid apparatus connected to the bearing apparatus and used for controllably moving one or more fluorescently marked reagents to the reactor to make contact with the polynucleotides; an imaging apparatus positioned above the bearing apparatus and used for exciting and collecting fluorescence generated by fluorescent markers; and a computing apparatus operatively coupled to the imaging apparatus, and comprising an instruction set for acquiring a fluorescence signal from the imaging apparatus.

Description

测序系统和承载装置Sequencing system and carrier device
优先权信息priority information
本申请请求2021年03月19日向中国国家知识产权局提交的、专利申请号为202110297328.4的专利申请以及2020年10月10日向中国国家知识产权局提交的、专利申请号为202022246419.9、202022251300.0、202022251614.0的专利申请的优先权和权益,并且通过参照将其全文并入此处。This application requests the patent application number 202110297328.4 submitted to the State Intellectual Property Office of China on March 19, 2021 and the patent application number 202022246419.9, 202022251300.0, 202022251614.0 submitted to the State Intellectual Property Office of China on October 10, 2020 priority to and interest in the patent application, which is hereby incorporated by reference in its entirety.
技术领域technical field
本申请涉及生物样本检测设备领域,尤其涉及一种测序系统和承载装置。The present application relates to the field of biological sample detection equipment, and in particular, to a sequencing system and a carrying device.
背景技术Background technique
随着核酸测序技术的不断发展,测序系统也不断更新。在基于光学成像系统检测芯片中的待测核酸分子的测序系统/测序平台中,测序系统包括成像组件,利用成像组件对测序反应时的反应器(例如流动池flowc-ell或芯片)中的核酸分子进行拍摄,并分析拍摄所得的图像进而得到测序结果。With the continuous development of nucleic acid sequencing technology, the sequencing system is also constantly updated. In a sequencing system/sequencing platform for detecting nucleic acid molecules to be detected in a chip based on an optical imaging system, the sequencing system includes an imaging component, and the imaging component is used to perform a sequencing reaction on the nucleic acid in the reactor (for example, the flow cell flowc-ell or the chip). Molecules are photographed, and the resulting images are analyzed to obtain sequencing results.
一般地,要实现对焦和/或追焦以采集多个时间点的芯片上的一个或多个位置/视野的图像,要求测序平台上安装的芯片与成像组件满足或者说保持相对的位置关系。通常地,测序系统包括有承载芯片和/或调节芯片位置用的承载装置。Generally, to achieve focusing and/or tracking to capture images of one or more positions/fields of view on the chip at multiple time points, it is required that the chip installed on the sequencing platform and the imaging component meet or maintain a relative positional relationship. Typically, a sequencing system includes a carrier device for carrying the chip and/or for adjusting the position of the chip.
而在对待测样本的检测和分析中,经常会涉及生化反应,特别是涉及包含生物催化剂例如蛋白酶等参与的生化反应,对温度较敏感,一般需要控制反应环境的温度,例如对芯片进行降温或升温控制,以保证其上生化反应的有效进行。现有的测序装置中包含温控组件,例如,使用半导体制冷片对芯片进行制冷或制热,再利用金属散热片或水冷系统排走热量等。所称的温控组件与反应器直接或间接接触实现制冷或制热,在温度变化的过程中,与温控组件接触的结构如反应器等都会发生形变,从而可能影响反应器内的生化反应的进行、和/或增加对焦追焦采集信号的难度。In the detection and analysis of the sample to be tested, biochemical reactions are often involved, especially those involving biocatalysts such as proteases, which are sensitive to temperature and generally need to control the temperature of the reaction environment, such as cooling the chip or The temperature is controlled to ensure the effective progress of the biochemical reaction on it. Existing sequencing devices include temperature control components. For example, semiconductor cooling sheets are used to cool or heat the chips, and metal heat sinks or water cooling systems are used to dissipate heat. The so-called temperature control component is in direct or indirect contact with the reactor to achieve refrigeration or heating. During the process of temperature change, the structure in contact with the temperature control component, such as the reactor, will deform, which may affect the biochemical reaction in the reactor. and/or increase the difficulty of focusing and tracking the signal acquisition.
如何控制相关元件/零部件/结构受温度的影响,包括如何合理排设相关元件/结构,以更好的实现元件/结构/装置的功能和/或延长其使用寿命,是待解决或改进的问题。How to control related components/components/structures affected by temperature, including how to arrange related components/structures reasonably, to better realize the functions of components/structures/devices and/or prolong their service life, is to be solved or improved question.
申请内容Application content
本申请实施方式提供一种测序系统和承载装置。Embodiments of the present application provide a sequencing system and a carrying device.
本申请实施方式的测序系统包括:承载装置,用于承载反应器和调节所述反应器的温度,所述反应器上连接有多个多核苷酸,所述承载装置包括:基座,具有用于承载所述反应器的承载面,温控组件,包括相连接的导热板、制冷器和散热模块,所述制冷器通过所述导热板与所述反应器连接,在所述承载面上放置有所述反应器的情况下,所述导热板与所述反应器刚性连接,以及连接组件,连接所述基座和所述温控组件,所述连接组件包括支撑座,所述导热板与所述基座通过所述支撑座连接;流体装置,与所述承载装置连接,用于可控地将一种或多种带有荧光标记的试剂移动到所述反应器与所述多核苷酸接触;成像装置,位于所述承载装置的上方,用于激发和采集所述荧光标记产生的荧光;计算装置,可操作性地和所述成像装置耦合,包括用于从所述成像装置获取荧光信号的指令集。The sequencing system of the embodiment of the present application includes: a carrying device for carrying a reactor and adjusting the temperature of the reactor, a plurality of polynucleotides are connected to the reactor, and the carrying device includes: a base having a On the bearing surface that carries the reactor, the temperature control assembly includes a connected heat conduction plate, a refrigerator and a heat dissipation module. The refrigerator is connected to the reactor through the heat conduction plate, and is placed on the bearing surface. In the case of the reactor, the thermally conductive plate is rigidly connected to the reactor, and a connecting component connects the base and the temperature control component, the connecting component includes a support seat, and the thermally conductive plate is connected to the The base is connected through the support base; a fluid device is connected with the carrying device for controllably moving one or more fluorescently labeled reagents to the reactor and the polynucleotide contacting; an imaging device positioned above the carrier device for exciting and collecting fluorescence generated by the fluorescent label; a computing device operably coupled to the imaging device, including means for acquiring fluorescence from the imaging device Signal instruction set.
本申请实施方式的包含上述结构、组件或模块以及连接关系的测序装置,通过合理布局机械固件使得在温度调节过程中相关零部件发生形变较小和/或保持较稳固的连接关系,能提高自动化测序的精度和仪器使用寿命。利用该测序装置进行核酸测序,可以较好地控制反应器反应环境的温度以保证反应器中的生化反应的有效进行,也能够较好地实现对焦和追焦,快速获得反应器指定表面的清晰图像,后续基于该些清晰图像能准确地识别碱基,实现核酸序列的准确测定。In the sequencing device according to the embodiments of the present application, including the above structures, components or modules, and connection relationships, by rationally arranging the mechanical firmware so that the related parts are less deformed and/or maintain a relatively stable connection relationship during the temperature adjustment process, the automation can be improved. Sequencing accuracy and instrument life. Using the sequencing device for nucleic acid sequencing can better control the temperature of the reaction environment of the reactor to ensure the effective progress of the biochemical reaction in the reactor, and can also better achieve focusing and tracking, and quickly obtain a clear and clear view of the designated surface of the reactor. images, and then based on these clear images, the bases can be accurately identified, and the accurate determination of the nucleic acid sequence can be realized.
本申请实施方式中的一种承载装置,包括:基座,具有用于承载反应器的承载面;温控组件,所述温控组件包括相连接的导热板、制冷器和散热模块,所述制冷器通过所述导热板与所述反应器连接,在所述承载面放置有所述反应器的情况下,所述导热板与所述反应器刚性连接;以及连接组件,所述基座和所述温控组件通过所述连接组件连接,所述连接组件包括支撑座,所述导热板与所述基座通过所述支撑座连接。A bearing device in an embodiment of the present application includes: a base having a bearing surface for bearing a reactor; and a temperature control assembly, wherein the temperature control assembly includes a connected heat conducting plate, a refrigerator and a heat dissipation module. The refrigerator is connected with the reactor through the heat-conducting plate, and when the reactor is placed on the bearing surface, the heat-conducting plate is rigidly connected with the reactor; and a connecting assembly, the base and The temperature control assembly is connected through the connection assembly, and the connection assembly includes a support seat, and the heat conduction plate and the base are connected through the support seat.
包含上述结构组成和连接关系的承载装置,包括导热板与反应器设置为刚性连接和/或导热板与基座不直接连接,能够较好地控制温度变化对其上结构和结构连接关系的影响,使得该承载装置能一直较稳 固地承载反应器包括维持反应器在移动过程中位置始终紧固,并且能实现较好的热传递,有利于在其承载的反应器中进行反应、带动反应器以使检测装置能连续采集来自反应器不同部分的信号,稳定地实现样品的检测。The bearing device including the above-mentioned structural composition and connection relationship, including that the heat-conducting plate and the reactor are arranged to be rigidly connected and/or that the heat-conducting plate and the base are not directly connected, can better control the influence of temperature changes on the structure and the connection relationship between the structures. , so that the carrying device can carry the reactor more stably all the time, including maintaining the position of the reactor in the moving process is always fast, and can achieve better heat transfer, which is conducive to the reaction in the carried reactor and the driving of the reactor. So that the detection device can continuously collect signals from different parts of the reactor, and stably realize the detection of the sample.
本申请的附加方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本申请的实践了解到。Additional aspects and advantages of the present application will be set forth, in part, from the following description, and in part will become apparent from the following description, or may be learned by practice of the present application.
附图说明Description of drawings
本申请的上述和/或附加的方面和优点从结合下面附图对实施方式的描述中将变得明显和容易理解,其中:The above and/or additional aspects and advantages of the present application will become apparent and readily understood from the following description of embodiments taken in conjunction with the accompanying drawings, wherein:
图1是本申请实施方式的测序系统的立体示意图;1 is a schematic perspective view of a sequencing system according to an embodiment of the present application;
图2是本申请实施方式的承载装置的分解示意图;FIG. 2 is an exploded schematic view of a carrying device according to an embodiment of the present application;
图3是本申请实施方式的移动平台承载有底座时的结构示意图;3 is a schematic structural diagram of a mobile platform according to an embodiment of the present application when a base is carried;
图4是本申请实施方式的基座的结构示意图;4 is a schematic structural diagram of a base according to an embodiment of the present application;
图5是本申请实施方式的反应器的结构示意图5 is a schematic structural diagram of a reactor according to an embodiment of the present application
图6是本申请实施方式的底座的结构示意图;6 is a schematic structural diagram of a base according to an embodiment of the present application;
图7是本申请实施方式的移动平台承载有底座时的侧面示意图;7 is a schematic side view of the mobile platform according to the embodiment of the present application when the base is carried;
图8为本申请实施方式的图7中的局部放大示意图;FIG. 8 is a partial enlarged schematic diagram of FIG. 7 according to an embodiment of the present application;
图9是本申请实施方式的承载装置承载有反应器的纵向截面示意图;9 is a schematic longitudinal cross-sectional view of the carrying device carrying the reactor according to the embodiment of the present application;
图10是本申请实施方式的散热模块与控制模块的工作原理图;10 is a working principle diagram of the heat dissipation module and the control module according to the embodiment of the present application;
图11是本申请实施方式的水浴室的结构示意图;11 is a schematic structural diagram of a water bath according to an embodiment of the present application;
图12是本申请实施方式的散热板的结构示意图;12 is a schematic structural diagram of a heat dissipation plate according to an embodiment of the present application;
图13是本申请实施方式的盖板的结构示意图;13 is a schematic structural diagram of a cover plate according to an embodiment of the present application;
图14是本申请实施方式的散热板的又一结构示意图;FIG. 14 is another schematic structural diagram of the heat dissipation plate according to the embodiment of the present application;
图15是本申请实施方式的另一视角的承载装置的纵向截面示意图;15 is a schematic longitudinal cross-sectional view of the carrying device from another perspective of an embodiment of the present application;
图16是本申请实施方式的图15中局部放大示意图;FIG. 16 is an enlarged schematic diagram of a part in FIG. 15 of an embodiment of the present application;
图17是本申请实施方式的支撑座的结构示意图;17 is a schematic structural diagram of a support seat according to an embodiment of the present application;
图18是本申请实施方式的导热板的结构示意图;18 is a schematic structural diagram of a thermally conductive plate according to an embodiment of the present application;
图19是本申请实施方式的反应器的另一视角的结构示意图;FIG. 19 is a schematic structural diagram of the reactor according to the embodiment of the present application from another perspective;
图20是本申请实施方式的承载装置的又一视角的纵向截面示意图;20 is a schematic longitudinal cross-sectional view of the carrying device according to the embodiment of the present application from another perspective;
图21是本申请实施方式的承载装置在第一歧管处的纵向截面示意图;21 is a schematic longitudinal cross-sectional view of the carrying device according to the embodiment of the present application at the first manifold;
图22是本申请实施方式的第一歧管的局部剖视图;22 is a partial cross-sectional view of a first manifold of an embodiment of the present application;
图23是本申请实施方式的承载装置在第二歧管处的纵向截面示意图;23 is a schematic longitudinal cross-sectional view of the carrying device of the embodiment of the present application at the second manifold;
图24是本申请实施方式的成像装置的结构示意图;24 is a schematic structural diagram of an imaging device according to an embodiment of the present application;
图25是本申请实施方式的第一光源的结构示意图;25 is a schematic structural diagram of a first light source according to an embodiment of the present application;
图26是本申请实施方式的流体装置的结构示意图。FIG. 26 is a schematic structural diagram of a fluid device according to an embodiment of the present application.
主要元件符号说明:Description of main component symbols:
测序系统10000、 Sequencing system 10000,
承载装置1000、基座100、承载面120、容纳槽122、第一通孔124、间隙126、温控组件200、导热板220、第一孔222、第二孔224、The carrying device 1000 , the base 100 , the carrying surface 120 , the accommodating groove 122 , the first through hole 124 , the gap 126 , the temperature control assembly 200 , the heat conduction plate 220 , the first hole 222 , the second hole 224 ,
制冷器240、散热模块260、水浴室262、第一流道262a、第二流道262b、第三流道262c、第四流道262d、进液口262e、出液口262f、散热板2622、第一散热区域2622a、第二散热区域2622b、盖板2624、流道2626、密封圈2628、液体组件264、泵2642、冷却器2644、蓄水池2646、控制模块280、温度传感器282、微处理器284、The refrigerator 240, the heat dissipation module 260, the water bath 262, the first flow channel 262a, the second flow channel 262b, the third flow channel 262c, the fourth flow channel 262d, the liquid inlet 262e, the liquid outlet 262f, the heat dissipation plate 2622, the first A heat dissipation area 2622a, a second heat dissipation area 2622b, a cover plate 2624, a flow channel 2626, a sealing ring 2628, a liquid component 264, a pump 2642, a cooler 2644, a water reservoir 2646, a control module 280, a temperature sensor 282, a microprocessor 284.
反应器300、芯片框320、第三孔322、第四孔324、片层340、流路360、进口362、出口364、刚性板380、 Reactor 300, chip frame 320, third hole 322, fourth hole 324, sheet 340, flow path 360, inlet 362, outlet 364, rigid plate 380,
支撑座420、通槽422、第一凸起部424、第二凸起部426、第一定位结构440、第一定位柱442、第一定位球444、第二定位结构460、第二定位柱462、第二定位球464、第一连接件480、第二连接件482、The support seat 420, the through groove 422, the first raised portion 424, the second raised portion 426, the first positioning structure 440, the first positioning post 442, the first positioning ball 444, the second positioning structure 460, the second positioning post 462, the second positioning ball 464, the first connector 480, the second connector 482,
第一歧管520、进口流道522、第二凹槽524、连接部526、第四定位结构530、定位槽532、第二歧管540、出口流道542、The first manifold 520, the inlet flow channel 522, the second groove 524, the connecting portion 526, the fourth positioning structure 530, the positioning groove 532, the second manifold 540, the outlet flow channel 542,
支撑结构600、支撑面620、第一凹槽640、第二通孔642、支撑件660、第三定位结构680、定位柱682、The support structure 600, the support surface 620, the first groove 640, the second through hole 642, the support member 660, the third positioning structure 680, the positioning column 682,
底座700、调节结构720、细调螺母722、拉簧724、移动平台800、台面主体820、第一驱动机构840、第一滑轨842、第一滑座844、第二驱动机构860、第二滑轨862、第二滑座864、第一支撑部864a、第二支撑部864b、第三通孔864c、导向件866、 Base 700, adjustment structure 720, fine adjustment nut 722, tension spring 724, mobile platform 800, table top body 820, first drive mechanism 840, first slide rail 842, first slide seat 844, second drive mechanism 860, second The slide rail 862, the second slide seat 864, the first support portion 864a, the second support portion 864b, the third through hole 864c, the guide member 866,
流体装置2000、存储器60、多通阀70、进样口72、出样口74、歧管76、泵组件80、集液器90、 Fluidic device 2000, reservoir 60, multi-port valve 70, sample inlet 72, sample outlet 74, manifold 76, pump assembly 80, liquid collector 90,
成像装置3000、第一光源12、第一发光器13、第一分光器14、第三透镜15、第一透镜16、第四透镜17、第二透镜18、分光模组40、第一反射面26、第一相机20、第二相机22。 Imaging device 3000, first light source 12, first light emitter 13, first beam splitter 14, third lens 15, first lens 16, fourth lens 17, second lens 18, beam splitting module 40, first reflecting surface 26. A first camera 20 and a second camera 22.
具体实施方式Detailed ways
下面详细描述本申请的实施方式,所述实施方式的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施方式是示例性的,仅用于解释本申请,而不能理解为对本申请的限制。Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary, only used to explain the present application, and should not be construed as a limitation on the present application.
在本申请的描述中,需要理解的是,术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请的描述中,“多个”的含义是两个或两个以上,除非另有明确具体的限定。In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", " rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc., or The positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, Therefore, it should not be construed as a limitation on this application. In addition, the terms "first" and "second" are only used for descriptive purposes, and should not be construed as indicating or implying relative importance or implying the number of indicated technical features. Thus, features defined as "first", "second" may expressly or implicitly include one or more of said features. In the description of the present application, "plurality" means two or more, unless otherwise expressly and specifically defined.
在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接或可以相互通讯;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本申请中的具体含义。In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it may be a fixed connection or a detachable connection Connection, or integral connection; it can be mechanical connection, electrical connection or can communicate with each other; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal communication of two elements or the interaction of two elements relation. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific situations.
在本申请中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。In this application, unless otherwise expressly specified and defined, a first feature "on" or "under" a second feature may include direct contact between the first and second features, or may include the first and second features Not directly but through additional features between them. Also, the first feature being "above", "over" and "above" the second feature includes the first feature being directly above and obliquely above the second feature, or simply means that the first feature is level higher than the second feature. The first feature is "below", "below" and "below" the second feature includes the first feature being directly below and diagonally below the second feature, or simply means that the first feature has a lower level than the second feature.
下文的公开提供了许多不同的实施方式或例子用来实现本申请的不同结构。为了简化本申请的公开,下文中对特定例子的部件和设置进行描述。当然,它们仅仅为示例,并且目的不在于限制本申请。此外,本申请可以在不同例子中重复参考数字和/或参考字母,这种重复是为了简化和清楚的目的,其本身不指示所讨论各种实施方式和/或设置之间的关系。此外,本申请提供了的各种特定的工艺和材料的例子,但是本领域普通技术人员可以意识到其他工艺的应用和/或其他材料的使用。The following disclosure provides many different embodiments or examples for implementing different structures of the present application. To simplify the disclosure of the present application, the components and arrangements of specific examples are described below. Of course, they are only examples and are not intended to limit the application. Furthermore, this application may repeat reference numerals and/or reference letters in different instances for the purpose of simplicity and clarity, and does not in itself indicate a relationship between the various embodiments and/or arrangements discussed. In addition, this application provides examples of various specific processes and materials, but one of ordinary skill in the art will recognize the application of other processes and/or the use of other materials.
需要说明的是,在本申请中,所称的芯片,涉及固相基底,具有能连接或固定目标生物分子的表面,表面可以是曲面也可以是平面,表面为曲面例如也称为微球。该技术例如包括将大量探针例如寡核苷酸片段固定于支持物表面、和/或使固定于支持物表面的探针与DNA或其他目标分子(例如蛋白,因子或小分子)进行杂交,例如,探针和待测生物分子均为核酸分子、且探针的至少一部分能够与待测生物分子互补结合(基于碱基互补配对原则),从而实现目标生物分子连接或固定到固相基底表面。It should be noted that in this application, the so-called chip refers to a solid-phase substrate and has a surface capable of connecting or immobilizing target biomolecules. The surface can be a curved surface or a flat surface. Such techniques include, for example, immobilizing a large number of probes, such as oligonucleotide fragments, on the surface of a support, and/or hybridizing probes immobilized on the surface of a support to DNA or other target molecules (such as proteins, factors or small molecules), For example, both the probe and the biomolecule to be tested are nucleic acid molecules, and at least a part of the probe can complementarily bind to the biomolecule to be tested (based on the principle of complementary base pairing), so that the target biomolecule can be linked or immobilized on the surface of the solid-phase substrate .
本申请中所称Z轴为成像组件的拍摄方向,成像组件可以例如是光学成像组件,其中的Z轴为光学成像组件的光轴,Z轴垂直于X轴和Y轴形成的平面。The Z-axis referred to in this application is the shooting direction of the imaging component, and the imaging component may be, for example, an optical imaging component, wherein the Z-axis is the optical axis of the optical imaging component, and the Z-axis is perpendicular to the plane formed by the X-axis and the Y-axis.
本申请所称的物镜工作距离,指试样调准焦点时的物镜前缘与试样表面的距离。The working distance of the objective lens referred to in this application refers to the distance between the front edge of the objective lens and the surface of the sample when the sample is in focus.
请参阅图1与图2,本申请实施方式提供一种用于检测生物样本的测序系统10000,测序系统10000包括承载装置1000、流体装置2000、成像装置3000以及计算装置(图未示)。Referring to FIGS. 1 and 2 , an embodiment of the present application provides a sequencing system 10000 for detecting biological samples. The sequencing system 10000 includes a carrier device 1000 , a fluid device 2000 , an imaging device 3000 and a computing device (not shown).
其中承载装置1000用于承载反应器300和调节反应器300的温度,反应器300上连接有多个多核苷酸。The carrying device 1000 is used for carrying the reactor 300 and adjusting the temperature of the reactor 300, and the reactor 300 is connected with a plurality of polynucleotides.
具体的,请参阅图3、图4与图5,本实施例提供了一种承载装置1000,包括两个基座100、底座700以及移动平台800。在其他实施例中,也可以包括两个以上的基座100。其中,每个基座100上均具有用于承载反应器300的承载面120,该承载面120上设有用于容纳反应器300的容纳槽122。Specifically, please refer to FIG. 3 , FIG. 4 and FIG. 5 , this embodiment provides a carrying device 1000 , including two bases 100 , a base 700 and a mobile platform 800 . In other embodiments, more than two bases 100 may also be included. Wherein, each base 100 has a carrying surface 120 for carrying the reactor 300 , and the carrying surface 120 is provided with an accommodating groove 122 for accommodating the reactor 300 .
例如在进行测序时,反应器300放置于在容纳槽122上,以使得放置在基座100上的反应器300在 被移动的过程中更加稳定。反应器300能够为生化反应提供空间,也可称作反应室,例如为芯片。通常,反应器300包括芯片框320和设于芯片框320内的片层340,容纳槽122的形状可以与反应器300的芯片框320形状匹配,本实施例中为长方形的容纳槽122。For example, when sequencing is performed, the reactor 300 is placed on the receiving tank 122, so that the reactor 300 placed on the base 100 is more stable during the process of being moved. The reactor 300 can provide a space for biochemical reactions, and can also be called a reaction chamber, such as a chip. Generally, the reactor 300 includes a chip frame 320 and a sheet layer 340 disposed in the chip frame 320 . The shape of the accommodating groove 122 can match the shape of the chip frame 320 of the reactor 300 , which is a rectangular accommodating groove 122 in this embodiment.
请参阅图1、图6与图7,承载装置1000所包括的底座700可以是中空结构,并且其顶部可以设有开口。可以容易理解,中空结构的底座700能够容纳基座100上设置的其他部件。本实施例中,两个基座100平行置于底座700上的开口处,每个基座100均通过调节结构720和底座700相连,调节结构720能够增长或缩短基座100与底座700之间的距离,而基座100设置于底座700的顶部,故通过调节结构720能够改变基座100的高度。Please refer to FIG. 1 , FIG. 6 and FIG. 7 , the base 700 included in the carrying device 1000 may be a hollow structure, and the top of the base 700 may be provided with an opening. It can be easily understood that the base 700 with the hollow structure can accommodate other components provided on the base 100 . In this embodiment, two bases 100 are placed in parallel at the openings on the base 700 , and each base 100 is connected to the base 700 through an adjustment structure 720 , and the adjustment structure 720 can lengthen or shorten the space between the base 100 and the base 700 and the base 100 is disposed on the top of the base 700 , so the height of the base 100 can be changed by adjusting the structure 720 .
请参阅图7与图8,本实施例中的调节结构720包括细调螺母722和拉簧724,一个基座100与底座700之间连接有多个细调螺母722。细调螺母722的调节方向分别与第一方向和第二方向垂直,其中第一方向与第二方向均为水平方向,那么在本实施例中细调螺母722的方向为竖直方向。Referring to FIGS. 7 and 8 , the adjustment structure 720 in this embodiment includes a fine adjustment nut 722 and a tension spring 724 , and a plurality of fine adjustment nuts 722 are connected between a base 100 and the base 700 . The adjustment directions of the fine adjustment nut 722 are respectively perpendicular to the first direction and the second direction, wherein the first direction and the second direction are both horizontal directions, so in this embodiment, the direction of the fine adjustment nut 722 is the vertical direction.
设置细调螺母722的一个作用可以是通过细调螺母722能够调节整个基座100整体的高度,具体的,可以分别对每一个细调螺母722进行调节,上升到一定高度后再对基座100进行调平,以保证成像的效果,另一个作用可以是能够改变基座100的倾角,例如通过只调节位于基座100一侧的细调螺母722,使得该侧的基座100微微上升或微微下降,从而让基座100相对于水平位置有一定的倾角。通过上述调节结构720的调节,能够使得两个反应器300内的各自片层340表面的高度差不大于成像组件中物镜工作距离的20%。One effect of setting the fine adjustment nut 722 may be that the overall height of the entire base 100 can be adjusted through the fine adjustment nut 722. Specifically, each fine adjustment nut 722 can be adjusted separately, and then the base 100 can be adjusted after rising to a certain height. Leveling is performed to ensure the imaging effect. Another effect can be to change the inclination of the base 100, for example, by adjusting only the fine adjustment nut 722 on one side of the base 100, so that the base 100 on this side is slightly raised or slightly descend, so that the base 100 has a certain inclination angle with respect to the horizontal position. Through the adjustment of the above-mentioned adjustment structure 720, the height difference between the surfaces of the respective sheets 340 in the two reactors 300 can be made not greater than 20% of the working distance of the objective lens in the imaging assembly.
进一步地,一个基座100与底座700之间连接有多个拉簧724,拉簧724的弹力方向也分别与第一方向和第二方向垂直,基座100受到的来自拉簧724的力始终朝向底座700方向,细调螺母722与拉簧724两者配合,使得基座100被夹紧在悬空于底座700的位置,且即便被其他物体所碰撞,被夹紧的基座100所产生的晃动也很小甚至几乎没有晃动。Further, a plurality of tension springs 724 are connected between a base 100 and the base 700, and the elastic directions of the tension springs 724 are also perpendicular to the first direction and the second direction respectively, and the base 100 receives the force from the tension springs 724 all the time. In the direction of the base 700, the fine adjustment nut 722 and the tension spring 724 cooperate with each other, so that the base 100 is clamped in a position suspended from the base 700, and even if it is collided by other objects, the clamped base 100 generates There is also little to no shaking.
请再次参阅图1与图7,承载装置1000还包括有移动平台800,移动平台800位于底座700下方,可以用于支撑和移动底座700。其中移动平台800包括台面主体820、第一驱动机构840和第二驱动机构860,台面主体820与底座700相连,本实施例中,底座700的底部设有螺纹孔,用于与台面主体820螺纹连接。Referring to FIG. 1 and FIG. 7 again, the carrying device 1000 further includes a moving platform 800 . The moving platform 800 is located below the base 700 and can be used to support and move the base 700 . The mobile platform 800 includes a table top body 820, a first driving mechanism 840 and a second driving mechanism 860. The table top body 820 is connected to the base 700. In this embodiment, the bottom of the base 700 is provided with threaded holes for threading with the table top body 820. connect.
具体的,第一驱动机构840包括第一滑轨842、第一滑座844和第一电机(图中未示出)。其中第一滑轨842与第一方向平行设置,那么第一驱动机构840可以驱动台面主体820沿第一方向运动,第一滑座844安装在第一滑轨842上并在第一电机的驱动下沿第一滑轨842移动,台面主体820与第一滑座844相连,随第一滑座844的移动,台面主体820带动底座700移动。Specifically, the first driving mechanism 840 includes a first sliding rail 842, a first sliding seat 844 and a first motor (not shown in the figure). Wherein the first sliding rail 842 is arranged parallel to the first direction, then the first driving mechanism 840 can drive the table top body 820 to move in the first direction, and the first sliding seat 844 is mounted on the first sliding rail 842 and is driven by the first motor Moving downward along the first slide rail 842 , the table top body 820 is connected with the first sliding seat 844 , and with the movement of the first sliding seat 844 , the table top body 820 drives the base 700 to move.
第二驱动机构860包括第二滑轨862、第二滑座864和第二电机(图中未示出)。第二滑轨862与第二方向平行设置,那么第二驱动机构860可以驱动台面主体820沿第二方向运动,第二滑座864安装在第二滑轨862上并在第二电机的驱动下沿第二滑轨862移动,第一滑轨842设于第二滑座864上。本实施例中的第二滑座864包括第一支撑部864a和位于第一支撑部864a两侧的第二支撑部864b,也可以看作是,沿第二方向一个第二支撑部864b、第一支撑部864a和另一个第二支撑部864b依次相连。The second driving mechanism 860 includes a second sliding rail 862, a second sliding seat 864 and a second motor (not shown in the figure). The second sliding rail 862 is arranged in parallel with the second direction, then the second driving mechanism 860 can drive the table top body 820 to move in the second direction, and the second sliding seat 864 is mounted on the second sliding rail 862 and driven by the second motor Moving along the second sliding rail 862 , the first sliding rail 842 is disposed on the second sliding seat 864 . The second sliding seat 864 in this embodiment includes a first support portion 864a and a second support portion 864b located on both sides of the first support portion 864a. One support portion 864a is connected to the other second support portion 864b in sequence.
可以容易理解,第一支撑部864a为长方体结构,第一支撑部864a上沿第一方向开设有开槽,从而形成第一滑轨842,第二支撑部864b具有坡度,具体为第二支撑部864b的顶部沿第二方向与第一支撑部864a之间的距离越大,其高度越低,故第二滑座864整体为梯台状。It can be easily understood that the first support portion 864a has a cuboid structure, the first support portion 864a is provided with a slot along the first direction to form the first slide rail 842, and the second support portion 864b has a slope, specifically the second support portion The greater the distance between the top of the 864b and the first support portion 864a along the second direction, the lower the height thereof, so the second sliding seat 864 is in the shape of a terrace as a whole.
另外,在一些实施例中,第二滑轨862内设有导向件866,导向件866与第二方向平行。而第二滑座864沿第二方向可以包括有第一侧和与第一侧相对的第二侧,本实例中,第一侧为图7中左侧,第二侧为图7中右侧。其中,第一侧具有与导向件866匹配的第三通孔864c,导向件866穿过第三通孔864c延伸至第二滑座864的外部,当然,在其他实施例中,与导向件866匹配的第三通孔864c也可以设置在第二侧。In addition, in some embodiments, a guide member 866 is provided in the second slide rail 862, and the guide member 866 is parallel to the second direction. The second sliding seat 864 may include a first side and a second side opposite to the first side along the second direction. In this example, the first side is the left side in FIG. 7 , and the second side is the right side in FIG. 7 . . Wherein, the first side has a third through hole 864c matching with the guide member 866, and the guide member 866 extends through the third through hole 864c to the outside of the second sliding seat 864, of course, in other embodiments, the guide member 866 A matching third through hole 864c may also be provided on the second side.
特别地,设置导向件866的作用在于:由于相较于第一滑轨842,第二滑轨862的长度较长且其承载的部件重量更大,设置了导向件866可以使得让第二滑座864在移动中能够保持平行于第二方向,以使基座100在移动的过程中也保持稳定。In particular, the purpose of providing the guide member 866 is that compared with the first slide rail 842, the second slide rail 862 is longer in length and the weight of the components it carries is larger, the provision of the guide member 866 can make the second slide rail 862 longer. The seat 864 can remain parallel to the second direction during movement so that the base 100 also remains stable during movement.
依据上述任一实施例的承载装置1000和任一实施例中的测序系统10000,包含底座700上可以设置多个可以承载反应器300的基座100,通过移动平台800移动底座700以移动基座100,就可以同时调节多个反应器300。According to the carrying device 1000 of any of the above embodiments and the sequencing system 10000 of any of the above embodiments, a plurality of pedestals 100 that can carry the reactors 300 can be arranged on the pedestal 700 , and the pedestal 700 is moved by the moving platform 800 to move the pedestals 100, multiple reactors 300 can be adjusted simultaneously.
在特定的应用情景中,例如要对多个反应器300、多个反应器300的不同区域成像,该承载装置1000能够较好的调节焦面以满足该成像要求;通过调节基座100与底座700之间的调节结构720,能够精细地调节比如增长或缩短反应器300与成像组件之间的距离、成像对象例如反应器300上某个视野 (Fieldofview,FOV)与光轴的垂直度。移动平台800和调节结构720的配合能够方便且精细地实现反应器300与成像装置3000预期位置/关系的调整。In a specific application scenario, for example, multiple reactors 300 and different regions of multiple reactors 300 are to be imaged, the carrier device 1000 can better adjust the focal plane to meet the imaging requirements; by adjusting the base 100 and the base The adjustment structure 720 between 700 can finely adjust, such as increasing or shortening the distance between the reactor 300 and the imaging component, and the imaging object such as the verticality of a certain field of view (FOV) on the reactor 300 and the optical axis. The cooperation of the moving platform 800 and the adjustment structure 720 can easily and precisely realize the adjustment of the desired position/relationship of the reactor 300 and the imaging device 3000 .
需要说明的是,目前在对待测样本的检测和分析中,一般会涉及生化反应,特别是涉及包含生物催化剂例如蛋白酶等参与的生化反应。此类生化反应对温度较敏感,一般需要控制反应环境的温度,例如对芯片进行降温或升温控制,以保证其上生化反应的有效进行。It should be noted that currently, in the detection and analysis of the sample to be tested, biochemical reactions are generally involved, especially biochemical reactions involving biocatalysts such as proteases. Such biochemical reactions are sensitive to temperature, and generally it is necessary to control the temperature of the reaction environment, such as cooling or heating the chip, to ensure the effective progress of the biochemical reactions thereon.
在本申请中的测序系统10000上的承载装置1000中,还包括有温控组件200用于高效稳定地控制反应器300的温度,以使得生化反应能够有效进行。The carrier device 1000 on the sequencing system 10000 in the present application further includes a temperature control assembly 200 for efficiently and stably controlling the temperature of the reactor 300, so that the biochemical reaction can be performed effectively.
具体的,需要提及的是,在本申请中,所称的半导体制冷片基于帕尔贴效应,从而可以实现制冷或制热的效果,该制冷或制冷的原理为:当电流经过两种相连接的导体时,其连接处将产生温差,即连接处产生吸热和放热现象。该效应由法国人珀尔帖(Jean-CharlesPeltier)于年发现。珀尔帖效应中吸热量和放热量的多少由电流的大小决定。人们根据珀尔帖效应制造出了制冷制热元件,如珀尔帖制冷制热片。珀尔帖制冷制热片在通电时,一面吸热(制冷),另一面放热(制热),可以通过改变电流的方向改变吸热面和放热面。Specifically, it should be mentioned that in this application, the so-called semiconductor refrigeration sheet is based on the Peltier effect, so that the effect of cooling or heating can be achieved. The principle of cooling or cooling is: when the current passes through the two phases When connecting conductors, there will be a temperature difference at the connection, that is, heat absorption and heat release at the connection. The effect was discovered by the Frenchman Peltier (Jean-CharlesPeltier). The amount of heat absorbed and released in the Peltier effect is determined by the magnitude of the current. People have made cooling and heating elements based on the Peltier effect, such as Peltier cooling and heating fins. When the Peltier cooling and heating sheet is energized, one side absorbs heat (cooling) and the other side releases heat (heating). The heat absorption surface and the heat release surface can be changed by changing the direction of the current.
请参阅图4和图9,温控组件200包括制冷器240、散热模块260和控制模块280,制冷器240具有相背的第一面和第二面。可以理解,在进行测序时,反应器300放置在承载面120上,为了让反应器300放置地更为稳定不易偏移,承载面120上设有用于放置反应器300的容纳槽122,该容纳槽122的底壁上设有第一通孔124。那么,在承载面120承载有反应器300的情况下,制冷器240的第一面通过第一通孔124与反应器300接触。Referring to FIG. 4 and FIG. 9 , the temperature control assembly 200 includes a refrigerator 240 , a heat dissipation module 260 and a control module 280 , and the refrigerator 240 has a first surface and a second surface opposite to each other. It can be understood that, during sequencing, the reactor 300 is placed on the bearing surface 120. In order to make the placement of the reactor 300 more stable and less prone to deviation, the bearing surface 120 is provided with an accommodating groove 122 for placing the reactor 300. The bottom wall of the groove 122 is provided with a first through hole 124 . Then, when the bearing surface 120 carries the reactor 300 , the first surface of the refrigerator 240 is in contact with the reactor 300 through the first through hole 124 .
其中,通过第一通孔124的意思为制冷器240自下而上经由第一通孔124与反应器300接触,这里的接触既包括直接接触,也包括间接接触。从而以直接接触的热传递或间接接触的热传递的方式对反应器300进行制冷或制热。Wherein, passing through the first through hole 124 means that the refrigerator 240 contacts the reactor 300 through the first through hole 124 from bottom to top, and the contact here includes both direct contact and indirect contact. Thus, the reactor 300 is cooled or heated by direct contact heat transfer or indirect contact heat transfer.
所称的直接接触例如为制冷器240的第一面贴合在反应器300上,间接接触则可例如,温控组件200还可以再包括一导热板220,使该导热板220抵设于制冷器240的第一面上,导热板220的一部分位于第一通孔124内,例如采用导热性能良好的导热胶将导热板220与制冷器240进行粘合,使得制冷器240通过导热板220与反应器300接触。较佳地,导热板220的材料为金属材料,例如为包含银或铝的材料。导热板220可以大致呈长方体形,导热板220的截面尺寸与制冷器240的截面尺寸可以大致相同,以使导热板220与制冷器240之间的结构配合得更加紧凑,利于高效热传导。The so-called direct contact is, for example, that the first surface of the refrigerator 240 is attached to the reactor 300, and the indirect contact is, for example, the temperature control assembly 200 may further include a heat-conducting plate 220, so that the heat-conducting plate 220 abuts on the cooling plate 220. On the first side of the cooler 240, a part of the heat-conducting plate 220 is located in the first through hole 124. For example, a heat-conducting adhesive with good thermal conductivity is used to bond the heat-conducting plate 220 and the refrigerator 240, so that the refrigerator 240 is connected to the refrigerator 240 through the heat-conducting plate 220. Reactor 300 contacts. Preferably, the material of the heat conducting plate 220 is a metal material, such as a material containing silver or aluminum. The heat-conducting plate 220 may be approximately in the shape of a cuboid, and the cross-sectional dimension of the heat-conducting plate 220 may be approximately the same as that of the refrigerator 240 , so that the structure between the heat-conducting plate 220 and the refrigerator 240 can be matched more compactly, which is conducive to efficient heat conduction.
制冷器240在通电后开始工作,此时,第一面和第二面中的其中一个面开始制冷,另外一个面开始制热。例如,制冷器240工作后,第一面开始制冷,第二面开始制热。可以理解的是,当制冷器240的工作电流不同时,第一面的制冷类型不同。例如,当制冷器240的工作电流为正向时,第一面制冷;当制冷器240的工作电流为反向时,第一面制热。制冷器240相对于其他的制冷元件,具有更加环保,且不会产生噪声的优点。The refrigerator 240 starts to work after being powered on. At this time, one of the first surface and the second surface starts to cool, and the other surface starts to heat. For example, after the refrigerator 240 works, the first side starts to cool, and the second side starts to heat. It can be understood that when the working current of the refrigerator 240 is different, the cooling type of the first side is different. For example, when the working current of the refrigerator 240 is forward, the first side cools; when the working current of the refrigerator 240 is reverse, the first side heats. Compared with other refrigeration elements, the refrigerator 240 has the advantages of being more environmentally friendly and not generating noise.
散热模块260与制冷器240的第二面接触,例如,通过硅脂等导热良好的膏状物质与第二面连接,用于带走制冷器240工作过程中产生的热量。The heat dissipation module 260 is in contact with the second surface of the refrigerator 240 , for example, connected to the second surface through a paste-like substance with good thermal conductivity such as silicone grease, so as to take away the heat generated during the operation of the refrigerator 240 .
请参阅图10,散热模块260包括水浴室262和液体组件264。水浴室262的材料可以为金属材料,例如,水浴室262的材料为铜、铝等材料。水浴室262具有用于容纳冷却液的腔室,水浴室262上设有连通腔室的进液口262e和出液口262f。Referring to FIG. 10 , the heat dissipation module 260 includes a water bath 262 and a liquid component 264 . The material of the water bath 262 can be a metal material, for example, the material of the water bath 262 is copper, aluminum and other materials. The water bath 262 has a chamber for accommodating the cooling liquid, and the water bath 262 is provided with a liquid inlet 262e and a liquid outlet 262f which communicate with the chambers.
在一些实施例中,如图11、图12与图13所示,水浴室262包括散热板2622和盖板2624,散热板2622的一表面上设有用于容纳冷却液的流道2626,盖板2624密封盖合于流道2626上形成腔室,例如,在盖板2624与散热板2622之间设置有密封圈2628,该密封圈2628可以密封盖板2624和散热板2622之间的间隙。优选的,流道2626呈迂回曲折形,可以进一步增长冷却液流经的回路,增强了水浴室262的冷却效果。In some embodiments, as shown in FIG. 11 , FIG. 12 and FIG. 13 , the water bath 262 includes a heat dissipation plate 2622 and a cover plate 2624 , a surface of the heat dissipation plate 2622 is provided with a flow channel 2626 for accommodating the cooling liquid, and the cover plate The 2624 is sealed and closed on the flow channel 2626 to form a cavity. For example, a sealing ring 2628 is provided between the cover plate 2624 and the heat dissipation plate 2622, and the sealing ring 2628 can seal the gap between the cover plate 2624 and the heat dissipation plate 2622. Preferably, the flow channel 2626 is in a tortuous shape, which can further increase the circuit through which the cooling liquid flows, thereby enhancing the cooling effect of the water bath 262 .
例如,请参照图13与图14,水浴室262可以包括散热板2622和盖板2624,散热板2622上设有第一散热区域2622a和第二散热区域2622b。第一散热区域2622a中设有第一流道262a和第二流道262b,第二散热区域2622b中设有第三流道262c和第四流道262d。For example, referring to FIG. 13 and FIG. 14 , the water bath 262 may include a heat dissipation plate 2622 and a cover plate 2624, and the heat dissipation plate 2622 is provided with a first heat dissipation area 2622a and a second heat dissipation area 2622b. The first heat dissipation area 2622a is provided with a first flow channel 262a and a second flow channel 262b, and the second heat dissipation area 2622b is provided with a third flow channel 262c and a fourth flow channel 262d.
其中,每个流道均具有朝向不同的第一端和第二端,第一流道262a的第一端和第二流道262b的第一端连通,第一流道262a的第二端与进液口262e连通,第三流道262c的第二端和第四流道262d的第二端连通,第四流道262d的第一端与出液口262f连通,第二流道262b的第二端和第三流道262c的第一端连通。Wherein, each flow channel has a first end and a second end facing different, the first end of the first flow channel 262a is communicated with the first end of the second flow channel 262b, and the second end of the first flow channel 262a is connected to the liquid inlet The port 262e is in communication, the second end of the third flow channel 262c is in communication with the second end of the fourth flow channel 262d, the first end of the fourth flow channel 262d is in communication with the liquid outlet 262f, and the second end of the second flow channel 262b It communicates with the first end of the third flow channel 262c.
下面以图14为例以一种流道的布局方式进行说明,在其他实施例中,各流道的也可以其他方式进行布局。The following takes FIG. 14 as an example to illustrate a layout of the flow channels. In other embodiments, the flow channels may also be laid out in other ways.
请参照图14,第二散热区域2622b位于第一散热区域2622a内每个流道的第一端所在一侧。图中朝左的方向为各流道第一端的方向,图中朝右的方向为各流道第二端的方向,盖板2624连接散热板2622并覆盖在第一流道262a、第二流道262b、第三流道262c和第四流道262d上。Referring to FIG. 14 , the second heat dissipation area 2622b is located on the side where the first end of each flow channel in the first heat dissipation area 2622a is located. The direction to the left in the figure is the direction of the first end of each flow channel, and the direction to the right in the figure is the direction of the second end of each flow channel. The cover plate 2624 is connected to the cooling plate 2622 and covers the first flow channel 262a and the second flow channel. 262b, the third flow channel 262c and the fourth flow channel 262d.
需要说明的是,第一流道262a、第二流道262b、第三流道262c和第四流道262d依次流通,因此也可以认为将一整个流道分为四段,从而得到上述四个流道。It should be noted that the first flow channel 262a, the second flow channel 262b, the third flow channel 262c and the fourth flow channel 262d flow in sequence, so it can also be considered that the entire flow channel is divided into four sections, so as to obtain the above four flow channels road.
第一散热区域2622a中的至少一个流道呈曲折状,所述第二散热区域2622b中的至少一个流道呈曲折状,例如,第二流道262b和第四流道262d分别呈曲折状,而第一流道262a和第三流道262c分别为直线型流道。曲折状的流道可以延长冷却液在单个流道内流动路径的长度。在其他实施例中,第一流道262a也可以呈曲折状,第三流道262c也可以呈曲折状。At least one flow channel in the first heat dissipation area 2622a is in a tortuous shape, and at least one flow channel in the second heat dissipation area 2622b is in a tortuous shape. For example, the second flow channel 262b and the fourth flow channel 262d are respectively in a tortuous shape, The first flow channel 262a and the third flow channel 262c are respectively straight flow channels. The tortuous flow channel can extend the length of the coolant flow path in a single flow channel. In other embodiments, the first flow channel 262a may also be in a zigzag shape, and the third flow channel 262c may also be in a zigzag shape.
下面对图13与14所示实施例的冷却液在水浴室262内的流动路径进行说明:The flow path of the cooling liquid in the water bath 262 of the embodiment shown in FIGS. 13 and 14 will be described below:
请继续参照图13与图14,进液口262e和出液口262f大致位于整个水浴室262的中部附近,冷却液由进液口262e流入第一流道262a的第一端,经过第一流道262a的一段直道后到达第一流道262a的第二端,接着经过曲折的第二流道262b后进入第三流道262c,再经过第三流道262c的一段直道后进入曲折的第四流道262d,最后从第四流道262d第二端处的出液口262f流出。Please continue to refer to FIGS. 13 and 14 , the liquid inlet 262e and the liquid outlet 262f are approximately located near the middle of the entire water bath 262, and the cooling liquid flows into the first end of the first flow channel 262a from the liquid inlet 262e, and passes through the first flow channel 262a It reaches the second end of the first flow channel 262a after a straight section of the first flow channel 262a, then enters the third flow channel 262c after passing through the tortuous second flow channel 262b, and then enters the tortuous fourth flow channel 262d after passing through a straight section of the third flow channel 262c. , and finally flows out from the liquid outlet 262f at the second end of the fourth flow channel 262d.
上述水浴室262的流道设计,充分利用了水浴室262的空间,在同样的体积下延长了冷却液的流动路径的长度,从而带来了更好的散热效果。The above-mentioned flow channel design of the water bath 262 makes full use of the space of the water bath 262 and extends the length of the flow path of the cooling liquid under the same volume, thereby bringing about a better heat dissipation effect.
另外,请再次参阅图10,液体组件264包括相连接的泵2642和冷却器2644,泵2642用于提供动力给冷却液,冷却器2644用于冷却冷却液,泵2642通过进液口262e与水浴室262连接,冷却器2644通过出液口262f与水浴室262连接,即泵2642通过管路与进液口262e连通,冷却器2644通过另一些管路与出液口262f连通,水浴室262内的冷却液在泵2642的作用下自出液口262f排出后经冷却器2644冷却。冷却器2644可以采用现有的冷却结构,例如可以包括一个铜制的箱体,内部填充有制冷剂,供冷却液流动的管路穿过箱体,冷却液在管路内流动时与箱体内的冷却剂发生热交换,从而达到冷却冷却液的目的。In addition, referring again to FIG. 10, the liquid assembly 264 includes a connected pump 2642 and a cooler 2644, the pump 2642 is used to provide power to the cooling liquid, the cooler 2644 is used to cool the cooling liquid, and the pump 2642 is connected to the water through the liquid inlet 262e. The bathroom 262 is connected, the cooler 2644 is connected to the water bathroom 262 through the liquid outlet 262f, that is, the pump 2642 is connected to the liquid inlet 262e through pipelines, and the cooler 2644 is connected to the liquid outlet 262f through other pipelines. The cooling liquid is discharged from the liquid outlet 262f under the action of the pump 2642 and then cooled by the cooler 2644. The cooler 2644 can use the existing cooling structure, for example, it can include a copper box, which is filled with refrigerant, the pipeline for the cooling liquid to flow through the box, and the cooling liquid flows in the pipeline and the box. The coolant undergoes heat exchange, so as to achieve the purpose of cooling the coolant.
在其他实施例中,也可以改变冷却器2644和泵2642的连接顺序,在上述任一包括液体组件264的实施例中,泵2642通过出液口262f与水浴室262连接,冷却器2644通过进液口262e与水浴室262连接,水浴室262内的冷却液在泵2642的作用下自出液口262f排出,在要进入水浴室262之前才再经过冷却器2644进行散热。In other embodiments, the connection sequence of the cooler 2644 and the pump 2642 can also be changed. In any of the above embodiments including the liquid component 264, the pump 2642 is connected to the water bath 262 through the liquid outlet 262f, and the cooler 2644 is connected to the water bath 262 through the inlet port 262f. The liquid port 262e is connected to the water bath 262. The cooling liquid in the water bath 262 is discharged from the liquid outlet 262f under the action of the pump 2642, and passes through the cooler 2644 for heat dissipation before entering the water bath 262.
在图10中的实施例中,液体组件264还包括蓄水池2644,蓄水池2644内存贮有冷却液,从而为水浴室262提供冷却液,泵2642和冷却器2644分别通过管路与蓄水池2644连接。标号①显示的回路中,冷却液在泵2642的作用下自蓄水池2644内抽出,经过泵2642后到达水浴室262内吸收热量,然后在经过冷却器2644后散热回到蓄水池2644内,标号②所示的回路中,水浴室262内的冷却液在泵2642的作用下不断被抽出,回到蓄水池2644后流经冷却器2644后被冷却,再进入水浴室262吸收热量。In the embodiment shown in FIG. 10 , the liquid component 264 further includes a water reservoir 2644, and the water reservoir 2644 stores the cooling liquid, so as to provide the cooling liquid for the water bath 262. The pump 2642 and the cooler 2644 are connected to the water tank 262 through pipelines, respectively. Reservoir 2644 is connected. In the circuit shown by the symbol ①, the cooling liquid is drawn out from the reservoir 2644 under the action of the pump 2642, passes through the pump 2642 and reaches the water bath 262 to absorb heat, and then passes through the cooler 2644 to dissipate heat and return to the reservoir 2644. , In the circuit shown by the mark ②, the cooling liquid in the water bath 262 is continuously pumped out under the action of the pump 2642, returns to the reservoir 2644 and flows through the cooler 2644 to be cooled, and then enters the water bath 262 to absorb heat.
上述任一实施例的温控组件200以及包含该温控组件200的系统,其包含的水浴室262中具有多个散热区域且每个散热区域均包括多个流道,具有较佳的散热效果,该温控组件200或者包含该温控组件200的系统能高效地散热,使得装置或系统内部环境的温度能得以较好的控制,特别适于应用于运行时对温度要求较严格的装置或系统,也使得易受温度影响的装置或系统特别适合在温度较高的季节或地区运行。The temperature control assembly 200 of any of the above-mentioned embodiments and the system including the temperature control assembly 200, the water bath 262 includes a plurality of heat dissipation areas and each heat dissipation area includes a plurality of flow channels, which has a better heat dissipation effect , the temperature control component 200 or the system including the temperature control component 200 can efficiently dissipate heat, so that the temperature of the internal environment of the device or system can be better controlled, which is especially suitable for use in devices with strict temperature requirements during operation or It also makes devices or systems that are susceptible to temperature especially suitable for operation in seasons or areas with higher temperatures.
具体地,例如在第一散热区域2622a,冷却液从第一流道262a上的进液口262e进入第一流道262a,依次流经第一流道262a和第二流道262b,在该第一散热区域2622a内实现了多次在流道的一端到另一端的流动,延长了冷却液例如冷凝水的流动路径,能提高散热能力,并且,第一流道262a和第二流道262b之中的至少一个呈曲折状,从而在相同的体积/空间内冷却液的流动路径进一步延长。Specifically, for example, in the first heat dissipation area 2622a, the cooling liquid enters the first flow channel 262a from the liquid inlet 262e on the first flow channel 262a, and flows through the first flow channel 262a and the second flow channel 262b in sequence. 2622a realizes multiple flows from one end of the flow channel to the other end, extending the flow path of the cooling liquid such as condensed water, which can improve the heat dissipation capacity, and at least one of the first flow channel 262a and the second flow channel 262b The zigzag shape further extends the coolant flow path within the same volume/space.
在一些实施例中,冷却器2644还包括冷却排,冷却排上设有通道,通道上设有多个散热片,用于对流经冷却器2644的冷却液进行散热,进一步的,冷却器2644还可以包括风扇,风扇产生朝向所述冷却排的气流,从而带来更好的冷却效果。In some embodiments, the cooler 2644 further includes a cooling row, the cooling row is provided with a channel, and the channel is provided with a plurality of cooling fins for dissipating the cooling liquid flowing through the cooler 2644. Further, the cooler 2644 also A fan may be included that generates airflow towards the cooling row, resulting in better cooling.
在一些实施例中,控制模块280连接制冷器240和散热模块260,用于检测反应器300的温度,并据检测出的温度控制散热模块260作业。例如,控制模块280根据反应器300的温度来控制泵2642的工作状态,从而控制散热模块260作业。In some embodiments, the control module 280 is connected to the refrigerator 240 and the heat dissipation module 260 for detecting the temperature of the reactor 300 and controlling the operation of the heat dissipation module 260 according to the detected temperature. For example, the control module 280 controls the working state of the pump 2642 according to the temperature of the reactor 300 , so as to control the operation of the heat dissipation module 260 .
具体的,例如,适合反应器300的温度有一预设范围,当控制模块280检测到反应器300的温度远低于预设范围内的最大温度值时(仍在预设范围内),控制模块280可以控制泵2642停止工作,使得水浴室262内的冷却液停止流动,一方面避免反应器300温度降得过低,另一方面也减少了能源的消耗, 相反的,若控制模块280检测到反应器300的温度远高于预设范围内的最低温度时(仍在预设范围内),控制模块280可以控制泵2642再次开始工作,驱使冷却液流动,提升散热能力。Specifically, for example, the temperature suitable for the reactor 300 has a preset range, and when the control module 280 detects that the temperature of the reactor 300 is much lower than the maximum temperature value within the preset range (still within the preset range), the control module 280 can control the pump 2642 to stop working, so that the cooling liquid in the water bath 262 stops flowing. On the one hand, the temperature of the reactor 300 is prevented from falling too low, and on the other hand, the energy consumption is also reduced. On the contrary, if the control module 280 detects When the temperature of the reactor 300 is much higher than the minimum temperature within the preset range (still within the preset range), the control module 280 can control the pump 2642 to start working again, drive the cooling liquid to flow, and improve the heat dissipation capacity.
在一些实施例中,如图10所示,控制模块280包括微处理器284和与微处理器284电连接的温度传感器282,温度传感器282可以设于导热板220上,用于检测导热板220的温度,从而用导热板220的温度估计反应器300的温度。微处理器284也可与泵2642电连接,可以控制泵2642工作或停机,例如,在泵2642的工作电路中设置受微处理器284控制的继电器,从而控制泵2642的工作回路的闭合或断开。In some embodiments, as shown in FIG. 10 , the control module 280 includes a microprocessor 284 and a temperature sensor 282 electrically connected to the microprocessor 284 . The temperature sensor 282 may be provided on the thermally conductive plate 220 for detecting the thermally conductive plate 220 The temperature of the reactor 300 is estimated by the temperature of the thermal conductive plate 220. The microprocessor 284 can also be electrically connected to the pump 2642, and can control the pump 2642 to work or stop. For example, a relay controlled by the microprocessor 284 is set in the working circuit of the pump 2642, so as to control the closing or opening of the working circuit of the pump 2642. open.
在一些实施例中,控制模块280还可以根据温度传感器282感应到的温度控制制冷器240的工作电流大小。例如,温度传感器282检测到导热板220的温度低于目标温度时,微处理器284可以控制加大制冷器240的工作电流,以提高制冷器240的功率,从而使得制冷器240提高导热板220的温度。本实施方式中,温度传感器282为接触式温度传感器282,例如,温度传感器282与导热板220接触。当然,温度传感器282可以为非接触式温度传感器282,例如,温度传感器282为红外温度传感器。In some embodiments, the control module 280 may also control the working current of the refrigerator 240 according to the temperature sensed by the temperature sensor 282 . For example, when the temperature sensor 282 detects that the temperature of the heat-conducting plate 220 is lower than the target temperature, the microprocessor 284 can control to increase the working current of the refrigerator 240 to increase the power of the refrigerator 240, so that the refrigerator 240 can improve the heat-conducting plate 220. temperature. In this embodiment, the temperature sensor 282 is a contact temperature sensor 282 , for example, the temperature sensor 282 is in contact with the heat conducting plate 220 . Of course, the temperature sensor 282 can be a non-contact temperature sensor 282, for example, the temperature sensor 282 is an infrared temperature sensor.
另外,上述水浴室262内的冷却液可以是水。如此,能够降低承载装置1000的成本。在一些实施例中,冷却液可以是专门制作的冷却液,在此不做任何限制。专门制作的冷却液可保证导热能力达到较为理想的状态。In addition, the cooling liquid in the above-mentioned water bath 262 may be water. In this way, the cost of the carrier device 1000 can be reduced. In some embodiments, the cooling liquid may be a specially made cooling liquid, without any limitation. The specially made coolant can ensure that the thermal conductivity can reach a more ideal state.
由上文所述,可以理解,在测序系统10000中包含的温控组件200可以对反应器300进行温度调节,例如使用制冷片对芯片进行制冷或制热,再利用金属散热片或者水冷系统排走热量等。此时,需要注意的是,温度的升高和降低会使相关机械固件产生形变,例如受热膨胀、遇冷收缩。其中,特别是温控对象、温控组件200以及与上述结构直接连接或接触的结构容易受到影响,例如本申请实施方式中承载装置1000的基座100。From the above, it can be understood that the temperature control component 200 included in the sequencing system 10000 can adjust the temperature of the reactor 300, for example, use a cooling sheet to cool or heat the chip, and then use a metal heat sink or a water cooling system to discharge the temperature. Take heat, etc. At this time, it should be noted that the increase and decrease of temperature will cause deformation of the relevant mechanical firmware, such as thermal expansion and cooling contraction. Among them, especially the temperature control object, the temperature control assembly 200 and the structures directly connected or in contact with the above structures are easily affected, for example, the base 100 of the carrying device 1000 in the embodiment of the present application.
本申请中,整个温控组件200可以自下而上通过第一通孔124与放置在容纳槽内的反应器300接触,即可以认为制冷器通过导热板220与反应器300间接接触,此时导热板220的一部分位于第一通孔124内。并且,请参阅图15与图16,在图中所示的水平方向上,导热板220的边缘与第一通孔124的内壁之间具有一定的间隙,该间隙用于为导热板220的热胀冷缩提供足够的形变空间。其原理类似于铁路上相邻铁轨之间留有一定的空隙,为铁轨在温度变化时发生的形变留出足够的空间,避免相邻铁轨之间发生挤压。故本实施例也可以实现尽量避免导热板220与基座100之间发生相互挤压。In the present application, the entire temperature control assembly 200 can be in contact with the reactor 300 placed in the accommodating tank through the first through hole 124 from bottom to top. A portion of the thermally conductive plate 220 is located in the first through hole 124 . 15 and FIG. 16 , in the horizontal direction shown in the figures, there is a certain gap between the edge of the heat-conducting plate 220 and the inner wall of the first through hole 124 , and the gap is used for the heat of the heat-conducting plate 220 . Expansion and contraction provide enough deformation space. The principle is similar to that there is a certain gap between the adjacent rails on the railway, leaving enough space for the deformation of the rails when the temperature changes, so as to avoid extrusion between the adjacent rails. Therefore, in this embodiment, the heat conduction plate 220 and the base 100 can be prevented from being pressed against each other as much as possible.
请参阅图9、图15与图17,在一些实施方式中,承载装置1000还包括有连接组件,连接组件用于连接基座100与温控组件200。其中,连接组件包括支撑座420、第一定位结构440和第二定位结构460。导热板220与基座100通过支撑座420连接,支撑座420采用热形变程度小于导热板220受热形变程度的材质,使得支撑座420在同样温度变化状况下,支撑座420的形变量更小,而与基座100直接相连的为支撑座420,故对基座100的影响也较小。Referring to FIG. 9 , FIG. 15 and FIG. 17 , in some embodiments, the carrying device 1000 further includes a connecting component, and the connecting component is used for connecting the base 100 and the temperature control component 200 . The connection assembly includes a support base 420 , a first positioning structure 440 and a second positioning structure 460 . The heat-conducting plate 220 and the base 100 are connected through the support seat 420, and the support seat 420 is made of a material whose thermal deformation degree is smaller than that of the heat-conducting plate 220, so that the deformation amount of the support seat 420 is smaller under the same temperature change condition. The support base 420 is directly connected to the base 100 , so the influence on the base 100 is also small.
如图15所示的实施例中,支撑座420可以安装在基座100的底部,支撑座420的中央设有通槽422,该通槽422与基座100上的第一通孔124连通,且通槽422的尺寸可以小于第一通孔124的尺寸,制冷器的一部分以及散热模块260的散热板位于通槽422内。通槽422可以起到隔热的作用。In the embodiment shown in FIG. 15 , the support base 420 can be installed at the bottom of the base 100 , and a through groove 422 is provided in the center of the support base 420 , and the through groove 422 communicates with the first through hole 124 on the base 100 , The size of the through groove 422 may be smaller than the size of the first through hole 124 , and a part of the refrigerator and the heat dissipation plate of the heat dissipation module 260 are located in the through groove 422 . The through grooves 422 can function as heat insulation.
在其他未有图示的实施例中,支撑座420也可以不设置通槽422,此时散热模块260位于支撑座420的上方,例如,支撑座420靠近基座100的一侧包括用于容纳位于第一通孔124外的温控组件200(温控组件200一部分位于第一通孔124内,一部分位于第一通孔124外的情形)的凹槽。In other not-shown embodiments, the support base 420 may not be provided with the through slot 422, and the heat dissipation module 260 is located above the support base 420. The groove of the temperature control component 200 located outside the first through hole 124 (in the case where a part of the temperature control component 200 is located in the first through hole 124 and a part is located outside the first through hole 124 ).
支撑座420包括第一侧和与第一侧相对的第二侧,第一侧设有第一定位结构440,第二侧设有第二定位结构460,两个定位结构均可以穿过第一通孔124延伸至容纳槽底壁的上方。在其他实施例中,两个定位结构也可以直接穿过基座100并伸至容纳槽底壁的上方。The support base 420 includes a first side and a second side opposite to the first side. The first side is provided with a first positioning structure 440 and the second side is provided with a second positioning structure 460. Both positioning structures can pass through the first side. The through hole 124 extends above the bottom wall of the receiving groove. In other embodiments, the two positioning structures may also directly pass through the base 100 and extend above the bottom wall of the accommodating groove.
请参阅图18,导热板220设有分别能够与第一定位结构440配合的第一孔222以及与第二定位结构460配合的第二孔224,第一孔222为腰孔,腰孔相对于圆孔而言,在其长度方向上具有更高的形变容忍度,当导热板220受热膨胀或者遇冷收缩时,能够沿腰孔的长度方向发生形变,并保持第一孔222与第一定位结构440的配合关系使得导热板220在受热后仍与定位结构配合紧密,位置不发生偏移。Please refer to FIG. 18 , the thermally conductive plate 220 is provided with a first hole 222 that can be matched with the first positioning structure 440 and a second hole 224 that can be matched with the second positioning structure 460 respectively. The first hole 222 is a waist hole, and the waist hole is opposite to the waist hole. For the round hole, it has a higher deformation tolerance in its length direction. When the thermally conductive plate 220 expands under heat or shrinks under cold, it can deform along the length direction of the waist hole, and maintain the first hole 222 and the first position. The matching relationship of the structures 440 ensures that the thermally conductive plate 220 is still closely matched with the positioning structure after being heated, and the position does not shift.
本实施例中,第一定位结构440包括与第一孔222配合的第一定位柱442,第一定位柱442包括第一端和与第一端相对的第二端,第一定位柱442的第一端与支撑座420相连接,第一定位柱442的第二端设有第一定位球444,导热板220位于第一定位球444与支撑座420之间。In this embodiment, the first positioning structure 440 includes a first positioning post 442 that is matched with the first hole 222 . The first positioning post 442 includes a first end and a second end opposite to the first end. The first end is connected to the support seat 420 , the second end of the first positioning post 442 is provided with a first positioning ball 444 , and the heat conducting plate 220 is located between the first positioning ball 444 and the support seat 420 .
第二定位结构460包括与第二孔224配合的第二定位柱462,第二定位柱462包括第一端和与第一端相对的第二端,第二定位柱462的第一端与支撑座420相连接,第二定位柱462的第二端设有第二定位球464,导热板220位于第二定位球464与支撑座420之间,反应器300设有能够与第一定位球444配合的第三孔以及能够与第二定位球464配合的第四孔。The second positioning structure 460 includes a second positioning post 462 matched with the second hole 224 , the second positioning post 462 includes a first end and a second end opposite to the first end, and the first end of the second positioning post 462 is connected to the support The seat 420 is connected, the second end of the second positioning post 462 is provided with a second positioning ball 464, the heat conducting plate 220 is located between the second positioning ball 464 and the support seat 420, and the reactor 300 is provided with a first positioning ball 444 The third hole for matching and the fourth hole for matching with the second positioning ball 464 .
本实施例中,两个定位柱相互配合能够将导热板220定位在待与反应器300接触的位置,而两个定位球的设置,一方面,在反应器300放置时也对其进行定位,并且防止放置后的反应器300发生偏移,另一方面,导热板220向上无法通过两个定位球,可将导热板220限制在定位球与制冷器之间。In this embodiment, the two positioning posts cooperate with each other to position the heat-conducting plate 220 at the position to be in contact with the reactor 300 , and the arrangement of the two positioning balls, on the one hand, also positions the reactor 300 when it is placed, In addition, the placed reactor 300 is prevented from being displaced. On the other hand, the heat-conducting plate 220 cannot pass through the two positioning balls upward, and the heat-conducting plate 220 can be restricted between the positioning balls and the refrigerator.
在其他实施例中,第一定位结构440与第二定位结构460中的其中一个包括定位柱,也能够满足本实用新型的要求。In other embodiments, one of the first positioning structure 440 and the second positioning structure 460 includes a positioning column, which can also meet the requirements of the present invention.
在其他实施例中,导热板220与制冷器之间采用导热性能良好的导热胶进行粘合,更加保证导热板220不会与制冷器分离。In other embodiments, a thermally conductive adhesive with good thermal conductivity is used to bond the thermally conductive plate 220 and the refrigerator to further ensure that the thermally conductive plate 220 will not be separated from the refrigerator.
在其他实施例中,支撑座420的第一侧设有用于支撑导热板220的第一凸起部424,第一凸起部424位于第一通孔124内,第一凸起部424的顶部与导热板220的底部相接触,第一凸起部424与第一通孔124的内壁之间也具有间隙,第一定位结构440设于第一凸起部424上。In other embodiments, the first side of the support base 420 is provided with a first protruding portion 424 for supporting the thermally conductive plate 220 , the first protruding portion 424 is located in the first through hole 124 , and the top of the first protruding portion 424 is In contact with the bottom of the heat conducting plate 220 , there is also a gap between the first protruding portion 424 and the inner wall of the first through hole 124 , and the first positioning structure 440 is disposed on the first protruding portion 424 .
支撑座420的第二侧设有用于支撑导热板220的第二凸起部426,第二凸起部426位于第一通孔124内且与第一通孔124的内壁之间具有间隙,第二定位结构460设于第二凸起部426上。如此,两个凸起部能够减少导热板220与支撑座420之间的接触面积,进一步减小支撑座420受导热板220所传导热量的影响。The second side of the support base 420 is provided with a second protruding portion 426 for supporting the thermally conductive plate 220 . The second protruding portion 426 is located in the first through hole 124 and has a gap with the inner wall of the first through hole 124 . The two positioning structures 460 are disposed on the second protruding portion 426 . In this way, the two protrusions can reduce the contact area between the heat-conducting plate 220 and the support seat 420 , and further reduce the influence of the heat-conducting heat of the heat-conducting plate 220 on the support seat 420 .
上述实施例的承载装置1000中,受温度影响形变较大的导热板220并不直接与基座100接触或相连,而是通过支撑座420连接,导热板220与第一通孔124的内壁之间具有间隙,这样,即便导热板220受热膨胀,也不会挤压基座100,可以延长基座100的使用寿命。In the carrying device 1000 of the above-mentioned embodiment, the heat-conducting plate 220 that is greatly deformed by the temperature is not directly in contact with or connected to the base 100, but is connected through the support seat 420. The heat-conducting plate 220 is connected to the inner wall of the first through hole 124. There is a gap between them, so that even if the heat-conducting plate 220 is thermally expanded, it will not squeeze the base 100 , which can prolong the service life of the base 100 .
另外,还需要注意是,温控组件200对反应器300进行温度调节的过程中,温度的升高和降低不仅会使相关机械固件产生形变,还有可能致使温控组件200与反应器300接触的部分发生受热形变。此时,在形变的过程中会向反应器300产生一个挤压力,使得反应器300也发生形变,从而导致反应器300内的流路360变形而影响生化反应和/或增加对焦追焦信号采集的难度。In addition, it should also be noted that, during the temperature control assembly 200 to adjust the temperature of the reactor 300, the increase and decrease of the temperature will not only deform the relevant mechanical firmware, but may also cause the temperature control assembly 200 to contact the reactor 300. part is deformed by heat. At this time, during the deformation process, a squeezing force will be generated on the reactor 300, so that the reactor 300 is also deformed, thereby causing the flow path 360 in the reactor 300 to deform, affecting the biochemical reaction and/or increasing the focus tracking signal. Difficulty of collection.
那么,请参阅图19与图20,在本申请实施方式中,反应器300还包括刚性板380,刚性板380设于片层340之下,刚性板380可以为铝板等金属板,温控组件200通过刚性板380与反应器300接触。Then, please refer to FIG. 19 and FIG. 20, in the embodiment of the present application, the reactor 300 further includes a rigid plate 380, the rigid plate 380 is arranged under the sheet layer 340, the rigid plate 380 can be a metal plate such as an aluminum plate, and the temperature control component 200 is in contact with reactor 300 through rigid plate 380 .
具体的,温控组件200包括依次相连的导热板220、制冷器240和水浴室260,并且导热板220、制冷器240和水浴室260依次叠设,整个温控组件200可以自下而上穿过第一通孔124与放置在容纳槽122内的反应器300接触,其中,导热板220与刚性板380直接接触。Specifically, the temperature control assembly 200 includes a heat conduction plate 220, a refrigerator 240 and a water bath 260 that are connected in sequence, and the heat conduction plate 220, the refrigerator 240 and the water bath 260 are stacked in sequence, and the entire temperature control assembly 200 can be worn from bottom to top The first through hole 124 is in contact with the reactor 300 placed in the receiving groove 122 , wherein the thermally conductive plate 220 is in direct contact with the rigid plate 380 .
如图20所示,连接组件还包括相连接的第一连接件480和第二连接件482。其中,第一连接件480连接基座100,第二连接件482连接水浴室260,第一连接件480为刚性连接件,第二连接件482为弹性连接件。As shown in FIG. 20 , the connecting assembly further includes a first connecting member 480 and a second connecting member 482 which are connected. The first connecting member 480 is connected to the base 100, the second connecting member 482 is connected to the water bath 260, the first connecting member 480 is a rigid connecting member, and the second connecting member 482 is an elastic connecting member.
例如,第一连接件480为螺杆,第二连接件482为弹簧,螺杆和弹簧分别沿竖直方向设置。螺杆的杆部穿过盖板264并与支撑座420螺纹连接,弹簧套设于螺杆上,弹簧的一端弹性地抵接于螺杆的头部,弹簧的另一端弹性地抵接于盖板264的底部,向整个温控组件200施加一个向上的力,并将盖板264压紧在支撑座420的底部。For example, the first connecting member 480 is a screw rod, the second connecting member 482 is a spring, and the screw rod and the spring are respectively arranged in the vertical direction. The rod portion of the screw rod passes through the cover plate 264 and is threadedly connected to the support seat 420 , the spring is sleeved on the screw rod, one end of the spring elastically abuts against the head of the screw rod, and the other end of the spring elastically abuts against the head of the cover plate 264 . At the bottom, an upward force is applied to the entire temperature control assembly 200 , and the cover plate 264 is pressed against the bottom of the support base 420 .
下面对本实施例中反应器300放置在承载面120的过程进行说明:The process of placing the reactor 300 on the bearing surface 120 in this embodiment will be described below:
将反应器300放置在容纳槽122中。在朝容纳槽122移动的过程中,首先刚性板380会与导热板220接触,在持续移动的过程中,弹簧被压缩,温控组件200向下移动,直到反应器300的芯片框320与承载面120接触。The reactor 300 is placed in the holding tank 122 . In the process of moving toward the accommodating groove 122 , the rigid plate 380 will first come into contact with the heat-conducting plate 220 . During the continuous movement, the spring is compressed, and the temperature control assembly 200 moves downward until the chip frame 320 of the reactor 300 is in contact with the carrier. face 120 contacts.
在温控组件200对反应器300进行制冷或制热的过程中,若温控组件200受热膨胀要在竖直方向上发生形变,则对于温控组件200来说,顶部与刚性板380接触,底部则和弹簧接触,故形变更容易向下发生,反应器300不易受到形变的挤压。并且,在温控组件200中,制冷器240与水浴室262柔性连接,故制冷器240向反应器300方向发生的挤压也较小;并且,弹力或挤压能够往下传递得以释放,表现为该些作用力主要造成位于承载装置1000下方的制冷器240与水浴室262的形变和连接强度/力度,能够使得承载装置1000稳固和稳定承载和运动,能够延长机械使用寿命。When the temperature control assembly 200 cools or heats the reactor 300, if the temperature control assembly 200 is heated and expands to deform in the vertical direction, the top of the temperature control assembly 200 is in contact with the rigid plate 380. The bottom is in contact with the spring, so the deformation is likely to occur downward, and the reactor 300 is not easily squeezed by the deformation. Moreover, in the temperature control assembly 200, the refrigerator 240 is flexibly connected to the water bath 262, so the extrusion of the refrigerator 240 towards the reactor 300 is also small; and the elastic force or extrusion can be transmitted downward to be released, showing These forces mainly cause the deformation and connection strength/strength of the refrigerator 240 and the water bath 262 under the carrying device 1000 , so that the carrying device 1000 can be stably and stably carried and moved, and the mechanical service life can be prolonged.
在一些实施例中,支撑座420可以采用较为柔软的材料,在反应器300持续移动的过程中,弹簧被压缩,温控组件200向下移动。虽然反应器300的芯片框320未和承载面120接触,但是导热板220与支撑座420的顶部接触后,温控组件200无法继续向下移动,故反应器300也就停止移动。在其他实施例中,也可以是温控组件200到达与基座100连接的极限位置后停止移动。In some embodiments, the support base 420 can be made of a relatively soft material. During the continuous movement of the reactor 300, the spring is compressed, and the temperature control assembly 200 moves downward. Although the chip frame 320 of the reactor 300 is not in contact with the bearing surface 120 , the temperature control assembly 200 cannot continue to move downward after the thermal conductive plate 220 is in contact with the top of the support base 420 , so the reactor 300 stops moving. In other embodiments, the temperature control assembly 200 may stop moving after reaching the limit position connected to the base 100 .
依据上述任一实施例的测序系统10000和承载装置1000,其包含用于对反应器300进行制冷或制热的温控组件200,温控组件200与反应器300之间为刚性连接,故温控组件200升温和/或反应器300受热产生的形变基本不会影响双方的相对位置关系,也可以说,温控装置200和反应器300之间紧密连接,在温控装置200和反应器300之间基本没有能容纳形变的物理空间,因此,反应器300的位置基本不会 受到形变的影响;这样可以减少温控组件200向反应器300挤压造成的反应器300的位置的改变,承载装置1000对所承载连接的反应器300(反应小室)发生形变具有较小的容忍,能够使置于其中的反应器300紧密稳固地连接在该承载装置1000中;如此,利于在生化反应过程中对反应器300指定表面或部分进行准确的对焦和快速稳定的追焦,利于反应器中信号的清晰图像的获取,利于基于该些清晰图像实现准确测序。The sequencing system 10000 and the carrying device 1000 according to any of the above embodiments include a temperature control assembly 200 for cooling or heating the reactor 300. The temperature control assembly 200 and the reactor 300 are rigidly connected, so the temperature The temperature of the control assembly 200 and/or the deformation of the reactor 300 caused by heating will not basically affect the relative positional relationship between the two. There is basically no physical space that can accommodate deformation, so the position of the reactor 300 is basically not affected by the deformation; this can reduce the change of the position of the reactor 300 caused by the extrusion of the temperature control assembly 200 to the reactor 300, and the load The device 1000 has less tolerance to the deformation of the supported and connected reactor 300 (reaction chamber), so that the reactor 300 placed therein can be tightly and firmly connected to the supporting device 1000; in this way, it is beneficial for the biochemical reaction process. Accurate focusing and fast and stable focusing on the designated surface or part of the reactor 300 are beneficial to the acquisition of clear images of signals in the reactor and the realization of accurate sequencing based on the clear images.
进一步地,在测序过程中,通常会向反应器300通入成像或清洗或反应用试剂以实现相应目的。这些试剂一般是放置在试剂盒中,测序时,先将反应器300与测序系统10000的流体装置2000连接,使反应器300接入测序系统10000的液路中,再通过动力装置将这些试剂引到反应器300的反应器300流路360中以进行相应进程。Further, during the sequencing process, imaging or cleaning or reaction reagents are usually passed into the reactor 300 to achieve the corresponding purpose. These reagents are generally placed in the reagent box. During sequencing, the reactor 300 is first connected to the fluid device 2000 of the sequencing system 10000, so that the reactor 300 is connected to the liquid circuit of the sequencing system 10000, and then these reagents are introduced by the power device. into the reactor 300 flow path 360 of the reactor 300 for the corresponding process.
通常地,通过软管将各部件连接而建立测序系统10000的流路360,并且,为了避免漏液以及更紧密地连接,会利用歧管(manifold)与包含多个流路360的反应器300连接。然而,实际作业中,由于连接处液压变化、老化,歧管与反应器300的连接处难免有不同程度的漏液,漏出的液体容易自歧管滴落至歧管下方的零部件上,特别是歧管下方设有支撑歧管的支撑件660的场合,积液容易造成该支撑件660发生损坏而影响到承载装置1000乃至整个测序系统10000的性能稳定Generally, the flow path 360 of the sequencing system 10000 is established by connecting the various components with hoses, and in order to avoid liquid leakage and to connect more closely, a manifold is used with the reactor 300 including a plurality of flow paths 360 connect. However, in actual operation, due to the change and aging of the hydraulic pressure at the connection, the connection between the manifold and the reactor 300 will inevitably have different degrees of liquid leakage. In the case where a support member 660 supporting the manifold is provided below the manifold, the support member 660 is easily damaged by the accumulation of fluid, which affects the performance stability of the carrying device 1000 and even the entire sequencing system 10000.
需要指出的是,本申请中所称的歧管,指的是自流体系统的软管与反应器300之间的进液管路和出液管路的总称。It should be pointed out that the manifold mentioned in this application refers to the general name of the liquid inlet pipeline and the liquid outlet pipeline between the hose of the self-fluid system and the reactor 300 .
请参照图21,本实施例中的承载装置1000还包括流体连接件和支撑结构600。Referring to FIG. 21 , the carrying device 1000 in this embodiment further includes a fluid connector and a support structure 600 .
具体的,如图5与图19所示,反应器300具有四条流路360,每条流路360的进口和出口可以均位于反应器300的底部,在其他实施例中,反应器300也可以具有一条或其他数量的流路360。本实施例中,基座100包括第一侧和与第二侧相对的第二侧,例如,反应器300内流路360的进口可以靠近基座100的第一侧,反应器300流路360的出口可以靠近基座100的第二侧。Specifically, as shown in FIG. 5 and FIG. 19 , the reactor 300 has four flow paths 360, and the inlet and outlet of each flow path 360 may be located at the bottom of the reactor 300. In other embodiments, the reactor 300 may also be There is one or other number of flow paths 360 . In this embodiment, the base 100 includes a first side and a second side opposite to the second side. For example, the inlet of the flow path 360 in the reactor 300 may be close to the first side of the base 100 , and the flow path 360 of the reactor 300 may be close to the first side of the base 100 . The outlet of the base 100 may be close to the second side.
在承载面承载有反应器300的情况下,流体连接件连通反应器300的流路360,流体连接件可以自下而上穿过基座100,并且流体连接件位于反应器300放置在容纳槽122内后,与流路360的进口和出口连通的位置。When the bearing surface carries the reactor 300, the fluid connector communicates with the flow path 360 of the reactor 300, the fluid connector can pass through the base 100 from bottom to top, and the fluid connector is located in the reactor 300 and placed in the accommodating tank After 122 , the position that communicates with the inlet and outlet of the flow path 360 .
请参阅图21、图22与图23,本实施例中,流体连接件包括第一歧管520和第二歧管540,第一歧管520位于基座100的第一侧,如图21与图22所示为一种结构的第一歧管520的纵向截面示意图,其具有四个进口流道522,用于与反应器300中四个流路360的进口相连通。第二歧管540位于基座100的第二侧,如图23所示为一种结构的第二歧管540的纵向界面示意图,其具有一个四条支路汇合成一条主路的出口流道524,自反应器300的四个流路360的出口排出的液体在出口流道524的主路上汇合。当然,在其他实施例中,内部流道为其他结构的歧管也是可行的。Referring to FIGS. 21 , 22 and 23 , in this embodiment, the fluid connection member includes a first manifold 520 and a second manifold 540 , and the first manifold 520 is located on the first side of the base 100 , as shown in FIGS. 21 and 21 . FIG. 22 shows a schematic longitudinal cross-sectional view of a first manifold 520 of a structure, which has four inlet flow channels 522 for communicating with the inlets of the four flow channels 360 in the reactor 300 . The second manifold 540 is located on the second side of the base 100 , as shown in FIG. 23 , which is a schematic longitudinal interface diagram of the second manifold 540 of a structure, which has an outlet flow channel 524 in which four branches merge into one main channel , the liquids discharged from the outlets of the four flow paths 360 of the reactor 300 converge on the main path of the outlet flow path 524 . Of course, in other embodiments, it is also feasible that the internal flow channels are manifolds of other structures.
如图21与图22所示,支撑结构600用于支撑流体连接件,例如,支撑结构600位于流体连接件下方并与基座100连接,从而将流体连接件固定在基座100上。本实施例中流体连接件包括第一歧管520和第二歧管540,对应的,支撑结构600也具有两个,分别用于支撑第一歧管520和第二歧管540,即将第一歧管520和第二歧管540通过支撑结构600与基座100相连。As shown in FIGS. 21 and 22 , the support structure 600 is used to support the fluid connection. For example, the support structure 600 is located below the fluid connection and connected to the base 100 , so as to fix the fluid connection on the base 100 . In this embodiment, the fluid connector includes a first manifold 520 and a second manifold 540. Correspondingly, the supporting structure 600 also has two, which are respectively used to support the first manifold 520 and the second manifold 540, namely, the first manifold 520 and the second manifold 540. The manifold 520 and the second manifold 540 are connected to the base 100 through the support structure 600 .
下面以第一歧管520下方的支撑结构600为例进行说明,第二歧管540下方的支撑结构600也是相同的。The following takes the support structure 600 under the first manifold 520 as an example for description, and the support structure 600 under the second manifold 540 is also the same.
支撑结构600包括用于支撑第一歧管520的支撑面620以及支撑件660,支撑结构600可以呈大致U型结构,U型的开口处的两个端部与基座100螺纹连接。U型结构的底壁可以作为支撑结构600的支撑面620,支撑面620设有第一凹槽640,支撑件660的一端设于第一凹槽640中,支撑件660的另一端连接第一歧管520,在第一凹槽640内设有第二通孔624。The support structure 600 includes a support surface 620 for supporting the first manifold 520 and a support member 660 . The support structure 600 may have a substantially U-shaped structure, and two ends of the U-shaped opening are screwed with the base 100 . The bottom wall of the U-shaped structure can be used as the support surface 620 of the support structure 600. The support surface 620 is provided with a first groove 640, one end of the support member 660 is set in the first groove 640, and the other end of the support member 660 is connected to the first groove The manifold 520 is provided with a second through hole 624 in the first groove 640 .
该第二通孔624位于第一凹槽640的底壁上,且第二通孔624的半径小于支撑件660的一端可以通过的尺寸,故支撑件660不至于自第二通孔624滑落。第一歧管520的底部具有与支撑件660的另一端匹配的第二凹槽524,支撑件660的另一端抵设于第二凹槽524内The second through hole 624 is located on the bottom wall of the first groove 640 , and the radius of the second through hole 624 is smaller than the size that one end of the support member 660 can pass through, so the support member 660 will not slip from the second through hole 624 . The bottom of the first manifold 520 has a second groove 524 matched with the other end of the support member 660 , and the other end of the support member 660 abuts in the second groove 524
在一些实施例中,第一歧管520与支撑面620之间可以具有间隙,两者之间仅通过支撑件660相连,第一歧管520上的漏液更易经过支撑件660流入第一凹槽640内。In some embodiments, there may be a gap between the first manifold 520 and the supporting surface 620, and the two are connected only by the supporting member 660, and the leakage liquid on the first manifold 520 is more likely to flow into the first concave through the supporting member 660. in slot 640.
在一些实施例中,支撑件660为弹簧且第一歧管520与支撑面620之间可以具有间隙,当反应器300放置在容纳槽122内时,第一歧管520会向下压紧弹簧,相应的,弹簧可以将第一歧管520弹性地抵接在反应器300上。进一步的,第一歧管520在水平方向的两个侧面可分别具有两个连接部526,当反应器300从容纳槽122内取出,弹簧向上顶着第一歧管520时,两个连接部526的顶部可以顶住基座100的底部,防止第一歧管520脱出。In some embodiments, the support member 660 is a spring and there may be a gap between the first manifold 520 and the support surface 620. When the reactor 300 is placed in the receiving groove 122, the first manifold 520 will press the spring downward. , correspondingly, the spring can elastically abut the first manifold 520 on the reactor 300 . Further, the two lateral sides of the first manifold 520 in the horizontal direction may have two connecting parts 526 respectively. When the reactor 300 is taken out from the accommodating tank 122 and the spring pushes upward against the first manifold 520, the two connecting parts The top of the 526 can bear against the bottom of the base 100 to prevent the first manifold 520 from coming out.
在一些实施例中,支撑面620上设有第三定位结构680,第一歧管520上设有第四定位结构530, 例如,第三定位结构680包括定位柱682,第四定位结构530包括与定位柱682配合的定位槽532,即支撑结构600上的定位柱682插入第一歧管520上的定位槽532完成定位,当然的,另一种方式,例如第三定位结构680包括定位槽532,第四定位结构530包括与定位槽532配合的定位柱682,也是可行的。In some embodiments, the support surface 620 is provided with a third positioning structure 680, and the first manifold 520 is provided with a fourth positioning structure 530. For example, the third positioning structure 680 includes positioning posts 682, and the fourth positioning structure 530 includes The positioning grooves 532 matched with the positioning posts 682 , that is, the positioning posts 682 on the support structure 600 are inserted into the positioning grooves 532 on the first manifold 520 to complete the positioning. Of course, in another way, for example, the third positioning structure 680 includes positioning grooves 532 , it is also feasible that the fourth positioning structure 530 includes a positioning post 682 matched with the positioning groove 532 .
在一些实例中,支撑件660有两个并且对称设置,使得第一歧管520被支撑地更稳定。In some instances, the supports 660 are two and symmetrically arranged so that the first manifold 520 is supported more stably.
第二歧管540下方同样具有一个支撑结构600,在此不赘述。There is also a support structure 600 below the second manifold 540 , which is not repeated here.
上述任一实施方式的承载装置1000以及包含该承载装置1000的测序系统10000,通过包含流体连接件来与设有流路360的反应器300连接,实现流体连接件与反应器300内流路360的连通。流体连接件通过支撑结构600中的支撑面620和支撑件660的配合实现位置的固定。当流体连接件与反应器300内流路360的连接处发生漏液时,顺着流体连接件流向支撑件660的液体可从第一凹槽640内的第二通孔624内排出,从而避免支撑件660的一端浸泡于液体中,保证了支撑结构600的正常使用,使得测序系统10000的性能更加地稳定。The carrier device 1000 of any of the above-mentioned embodiments and the sequencing system 10000 including the carrier device 1000 are connected to the reactor 300 provided with the flow path 360 by including the fluid connector, so as to realize the fluid connector and the flow path 360 in the reactor 300 of connectivity. The fluid connection is fixed in position through the cooperation of the support surface 620 in the support structure 600 and the support 660 . When liquid leakage occurs at the connection between the fluid connection member and the flow path 360 in the reactor 300, the liquid flowing to the support member 660 along the fluid connection member can be discharged from the second through hole 624 in the first groove 640, thereby preventing One end of the support member 660 is immersed in the liquid, which ensures the normal use of the support structure 600 and makes the performance of the sequencing system 10000 more stable.
进一步地,本申请还提供了一种成像装置3000,位于承载装置1000的上方,用于激发反应器300发出光学信号和采集至少一部分光学信号。本实施例中,成像装置3000可以包括激光发生器以及相机,激光发生器产生的激光照射于反应器300上与试剂反应后的片层240上,相机采集该图像信息,该图像信息中包括片层240经激光照射后发出的荧光信息,根据该荧光信息可以分析得到测序结果。Further, the present application also provides an imaging device 3000, which is located above the carrying device 1000, and is used to excite the reactor 300 to emit optical signals and collect at least a part of the optical signals. In this embodiment, the imaging device 3000 may include a laser generator and a camera, the laser generated by the laser generator is irradiated on the sheet layer 240 after reacting with the reagent on the reactor 300, and the camera collects the image information, and the image information includes the sheet layer 240. The fluorescence information emitted by the layer 240 after being irradiated by the laser can be analyzed to obtain the sequencing result according to the fluorescence information.
本申请实施方式的成像装置3000,可参考专利申请CN111308726A披露的光学系统、调校光学系统的方法和测序系统,该专利申请的内容以引用的方式并入在本申请中。For the imaging device 3000 in the embodiment of the present application, reference may be made to the optical system, the method for adjusting the optical system, and the sequencing system disclosed in the patent application CN111308726A, the contents of which are incorporated herein by reference.
具体的,请参阅图24,本申请实施方式的一种成像装置3000,包括第一光源12、第一透镜16和分光模组40,分光模组40包括第一分光器14、第二透镜18、第一相机20和第二相机22。第一透镜16用于接收来自第一光源12的第一光束并使该光束准直入射至反应器300上,以及用于接收来自反应器300的光束并使该光束准直。第二透镜18用于将来自第一透镜16的准直光束聚焦至第一相机20和第二相机22。第一分光器14用于将来自第二透镜18的聚焦光束分为第二光束和第三光束。第一相机20用于接收第二光束。第二相机22用于接收第三光束。Specifically, please refer to FIG. 24 , an imaging device 3000 according to an embodiment of the present application includes a first light source 12 , a first lens 16 and a beam splitting module 40 , and the beam splitting module 40 includes a first beam splitter 14 and a second lens 18 , a first camera 20 and a second camera 22 . The first lens 16 is used for receiving the first light beam from the first light source 12 and collimating the light beam onto the reactor 300 , and for receiving and collimating the light beam from the reactor 300 . The second lens 18 is used to focus the collimated light beam from the first lens 16 to the first camera 20 and the second camera 22 . The first beam splitter 14 is used to split the focused beam from the second lens 18 into a second beam and a third beam. The first camera 20 is used to receive the second light beam. The second camera 22 is used to receive the third light beam.
上述成像装置3000,由于第二透镜18将光聚焦后,再由分光器14分成第二光束和第三光束,这样可减少光学元件的使用、分光光路长度小,使得成像装置3000的总光路长度变短,有利于成像装置3000的小型化,利于工业化。In the above imaging device 3000, after the light is focused by the second lens 18, the beam splitter 14 divides the light into the second beam and the third beam, which can reduce the use of optical elements and shorten the optical path length of the splitting light, so that the total optical path length of the imaging device 3000 is reduced. The shortening is beneficial to the miniaturization of the imaging device 3000 and the industrialization.
具体地,待测核酸样本可放置在反应器300内,如芯片内。第一光源12可为激光光源。在一个示例中,芯片包含基底,基底上设有流路,基底上设有玻璃,在利用该成像装置3000的测序系统进行测序时,在一定条件下,待测核酸、酶、带荧光标记的核苷酸试剂或溶液等混合于流路中发生反应,然后第一光源12发射激光经第一透镜16入射至芯片特定视野,该视野的荧光基团被激发发出荧光,荧光经第一透镜16和第二透镜18聚焦到达第一分光器14,第一分光器14将该荧光会聚光束分成第二光束和第三光束,第一相机20接收第二光束,第二相机22接收第三光束,分别采集得该视野的第一图像和第二图像。Specifically, the nucleic acid sample to be tested can be placed in the reactor 300, such as in a chip. The first light source 12 may be a laser light source. In one example, the chip includes a substrate, the substrate is provided with a flow channel, and the substrate is provided with glass. When using the sequencing system of the imaging device 3000 to perform sequencing, under certain conditions, the nucleic acid, enzyme, fluorescently labeled nucleic acid to be detected, and fluorescently labeled Nucleotide reagents or solutions are mixed in the flow path to react, and then the first light source 12 emits laser light through the first lens 16 to enter a specific field of view of the chip, the fluorophores in the field of view are excited to emit fluorescence, and the fluorescence passes through the first lens 16. and the second lens 18 focus to reach the first beam splitter 14, the first beam splitter 14 splits the fluorescent convergent beam into a second beam and a third beam, the first camera 20 receives the second beam, the second camera 22 receives the third beam, A first image and a second image of the field of view are acquired respectively.
在一个例子中,请结合图25,第一光源12可包括第一发光器13和第三透镜15,所述第一光束为所述第一发光器13发出的光束经过所述第三透镜15后的准直光束,所述第一光束经第四透镜17聚焦到第一透镜16的后焦面、进而经过所述第一透镜16准直入射至所述反应器300上。在一个示例中,第一光源12还包括光纤耦合器,例如单模光线耦合器。具体地,成像装置3000为全内反射成像装置3000,经过所述第一透镜16的准直光束(平行光束)以大于临界角入射至芯片表面,发生全内反射,在芯片玻璃的下表面产生消逝场(消逝波)。该消逝场中的荧光分子被激发发出的荧光被第一透镜16接收。In one example, referring to FIG. 25 , the first light source 12 may include a first light emitter 13 and a third lens 15 , and the first light beam is a light beam emitted by the first light emitter 13 passing through the third lens 15 After the collimated beam, the first beam is focused to the back focal plane of the first lens 16 through the fourth lens 17 , and then is collimated and incident on the reactor 300 through the first lens 16 . In one example, the first light source 12 also includes a fiber optic coupler, such as a single mode light coupler. Specifically, the imaging device 3000 is a total internal reflection imaging device 3000. The collimated light beam (parallel light beam) passing through the first lens 16 is incident on the surface of the chip at a greater than critical angle, and total internal reflection occurs, which is generated on the lower surface of the chip glass. Evanescent field (evanescent wave). The fluorescence emitted by the excited fluorescent molecules in the evanescent field is received by the first lens 16 .
在第一光源16发射的光束激发反应器300中的待测样品的荧光基团发光时,第一透镜16接收的来自反应器300的光束是反应器300中的待测样品发出的光束。When the light beam emitted by the first light source 16 excites the fluorophore of the sample under test in the reactor 300 to emit light, the light beam from the reactor 300 received by the first lens 16 is the light beam emitted by the sample under test in the reactor 300 .
第一相机20和第二相机22的图像传感器可采用CCD或CMOS。较佳地,第一相机20和第二相机22所采用的图像传感器的类型相同,例如,均为CCD或均为CMOS。第一分光器14可为二向色镜。The image sensors of the first camera 20 and the second camera 22 may adopt CCD or CMOS. Preferably, the image sensors used by the first camera 20 and the second camera 22 are of the same type, for example, both are CCD or both are CMOS. The first beam splitter 14 may be a dichroic mirror.
在图示的实施方式中,第二光束为第一分光器14的透射光束,第三光束为第一分光器14的反射光束。In the illustrated embodiment, the second beam is the transmitted beam of the first beam splitter 14 , and the third beam is the reflected beam of the first beam splitter 14 .
在某些实施方式中,第一相机20与第二相机22呈90度或270度设置。如此,便于在有限空间内将第一相机20和第二相机22多个相机配置到该成像装置3000中。具体地,在图24所示的方位中,第一分光器14具有第一反射面26,第一反射面26与水平面的夹角成45度,沿水平方向入射至第一反射面26的一部分光束被反射转向90度到达第二相机22,而沿水平方向入射至第一反射面26的另一部分光束穿过第一反射面26并入射至第一相机20。在图24中,第一相机20与第二相机22沿顺时针呈90 度设置,沿逆时针呈270度设置。在一个示例中,反应器300中的待测样品带有两种荧光标记,例如为Cy3和Atto647N,该两种荧光分子的发射光波段分别为550-620nm和650-750nm(波峰分别大约为564nm和670nm);第一分光器14为二向色镜,该二向色镜对波长550-620nm的光具有较高的透射率,对650nm以上的光具有较高的反射率。In some embodiments, the first camera 20 and the second camera 22 are disposed at 90 degrees or 270 degrees. In this way, it is convenient to configure multiple cameras of the first camera 20 and the second camera 22 into the imaging device 3000 in a limited space. Specifically, in the orientation shown in FIG. 24 , the first beam splitter 14 has a first reflection surface 26 , the angle between the first reflection surface 26 and the horizontal plane is 45 degrees, and incident on a part of the first reflection surface 26 along the horizontal direction The light beam is reflected and turned by 90 degrees to reach the second camera 22 , while another part of the light beam incident on the first reflecting surface 26 in the horizontal direction passes through the first reflecting surface 26 and is incident on the first camera 20 . In FIG. 24 , the first camera 20 and the second camera 22 are arranged 90 degrees clockwise and 270 degrees counterclockwise. In one example, the sample to be tested in the reactor 300 has two fluorescent labels, such as Cy3 and Atto647N, and the emission wavelengths of the two fluorescent molecules are 550-620 nm and 650-750 nm (the peaks are about 564 nm, respectively). and 670nm); the first beam splitter 14 is a dichroic mirror, the dichroic mirror has a high transmittance for light with a wavelength of 550-620nm, and a high reflectance for light above 650nm.
所称的带荧光标记的核苷酸试剂包括A、T、C和G四种类型核苷酸试剂,不同种核苷酸试剂可分别盛放于不同容器中。在一个示例中,四种核苷酸带有同一种荧光标记,在DNA测序时,每轮测序反应包括四次碱基延伸反应,四次碱基延伸反应分别为依次加入该四种核苷酸以及获得相应的图像。The so-called fluorescently labeled nucleotide reagents include four types of nucleotide reagents, A, T, C and G, and different kinds of nucleotide reagents can be stored in different containers respectively. In one example, four nucleotides carry the same fluorescent label, and during DNA sequencing, each round of sequencing reaction includes four base extension reactions, and the four base extension reactions are sequentially adding the four nucleotides and obtain the corresponding image.
在一个示例中,四种核苷酸两两分别带有第一荧光标记和第二荧光标记,第一荧光标记和第二荧光标记可被激发发出不同的荧光,利用该四种核苷酸进行双色测序,每轮测序反应包括两次碱基延伸反应,在利用包含该成像装置3000的测序系统10000进行测序时,在一定条件下,待测核酸、酶以及带第一荧光标记和第二荧光标记的两种核苷酸试剂或溶液等混合于流路中发生反应,第一光源12同时发射第一激光和第二激光经第一透镜16入射至芯片特定视野,该视野的第一荧光标记和第二荧光标记分别被第一激光和第二激光激发发出第一荧光和第二荧光,该第一荧光和第二荧光经第一透镜16和第二透镜18会聚至第一分光器14(二向色镜),该二向色镜分开会聚的第一荧光和第二荧光,第一荧光聚焦到第一相机20像面,第二荧光聚焦到第二相机22像面,由此,分别获得该视野的第一荧光和第二荧光形成的第一图像和第二图像。基于核苷酸加入顺序和不同轮测序反应的第一图像和第二图像信息,实现碱基识别/测序。In one example, four nucleotides have a first fluorescent label and a second fluorescent label, respectively, and the first fluorescent label and the second fluorescent label can be excited to emit different fluorescence, and the four nucleotides are used to carry out Two-color sequencing, each round of sequencing reaction includes two base extension reactions. When sequencing is performed using the sequencing system 10000 including the imaging device 3000, under certain conditions, the nucleic acid to be tested, the enzyme, and the first fluorescent label and the second fluorescent The two labeled nucleotide reagents or solutions are mixed in the flow path to react, and the first light source 12 simultaneously emits the first laser and the second laser to enter a specific field of view of the chip through the first lens 16, and the first fluorescent marker of the field of view is The first and second fluorescent markers are excited by the first laser and the second laser to emit first and second fluorescence, respectively, and the first and second fluorescence are condensed to the first beam splitter 14 through the first lens 16 and the second lens 18 ( dichroic mirror), the dichroic mirror separates the converged first and second fluorescent light, the first fluorescent light is focused on the image plane of the first camera 20, and the second fluorescent light is focused on the image plane of the second camera 22, thus, respectively A first image and a second image formed by the first fluorescence and the second fluorescence of the field of view are obtained. Base calling/sequencing is achieved based on the order of nucleotide addition and first and second image information from different rounds of sequencing reactions.
在另一个示例中,四种核苷酸分别带荧光标记a、荧光标记b、双荧光标记a-b以及不带标记,荧光标记a和荧光标记b可被激发发出不同的荧光,利用该四种核苷酸进行四色测序,每轮测序反应包括一次碱基延伸反应,在利用包含该成像装置3000的测序系统进行测序时,在一定条件下,待测核酸、酶以及上述四种核苷酸试剂或溶液等混合于流路中发生反应,第一光源12同时发射第一激光和第二激光经第一透镜16入射至芯片特定视野,该视野的荧光标记分别被第一激光和第二激光激发发出荧光,该荧光经第一透镜16和第二透镜18会聚至第一分光器14(二向色镜),该二向色镜将该荧光分为来自荧光标记a的荧光和自荧光标记b的荧光,来自荧光标记a的荧光聚焦到第一相机20像面,来自荧光标记b的荧光聚焦到第二相机22像面,由此,分别获得该视野的第一图像和第二图像。通过不同轮测序反应的第一图像和第二图像以及合并同一轮测序反应的第一图像和第二图像的信息,实现碱基识别/测序。In another example, four nucleotides with fluorescent label a, fluorescent label b, double fluorescent label a-b and no label, respectively, fluorescent label a and fluorescent label b can be excited to emit different fluorescence, using the four nuclei Four-color sequencing of nucleotides is performed, and each round of sequencing reaction includes a base extension reaction. When sequencing is performed using the sequencing system including the imaging device 3000, under certain conditions, the nucleic acid to be tested, the enzyme, and the above four nucleotide reagents The first light source 12 simultaneously emits the first laser and the second laser through the first lens 16 to enter the specific field of view of the chip, and the fluorescent markers in the field of view are excited by the first laser and the second laser respectively. Emits fluorescence, which is collected by the first lens 16 and the second lens 18 to the first beam splitter 14 (dichroic mirror), which divides the fluorescence into fluorescence from fluorescent label a and autofluorescence label b The fluorescence from fluorescent marker a is focused on the image plane of the first camera 20, and the fluorescence from fluorescent marker b is focused on the image plane of the second camera 22, thereby obtaining the first image and the second image of the field of view respectively. Base calling/sequencing is achieved by combining first and second images of different rounds of sequencing reactions and merging information from the first and second images of the same round of sequencing reactions.
请参阅图1,本申请实施方式提供一种测序系统10000,包括移动平台800和成像装置3000,移动平台用于承载反应器300,成像装置3000为上述任一实施方式中的成像装置3000。Referring to FIG. 1 , an embodiment of the present application provides a sequencing system 10000 , including a mobile platform 800 and an imaging device 3000 . The mobile platform is used to carry the reactor 300 , and the imaging device 3000 is the imaging device 3000 in any of the above embodiments.
上述测序系统10000,由于包含具有上述任一技术特征和优点的成像装置3000,结构紧凑,利于小型化、工业化。The above-mentioned sequencing system 10000, since it includes the imaging device 3000 having any of the above-mentioned technical features and advantages, has a compact structure, which is favorable for miniaturization and industrialization.
具体地,本实施方式中,移动平台800是可移动的。移动平台800可带动反应器300相对于成像装置3000运动,例如沿垂直于第一透镜16的光轴方向运动、或沿平行于第一透镜16的光轴方向运动,或沿倾斜于第一透镜16的光轴方向运动,以使得反应器300的不同位置位于第一透镜16的正下方,使得能够利用包含该成像装置3000的测序系统10000实现对反应器300的图像采集,进而实现序列测定。可以理解,本申请实施方式的测序系统10000可包括上述任一实施方式的成像装置3000。Specifically, in this embodiment, the mobile platform 800 is movable. The moving platform 800 can drive the reactor 300 to move relative to the imaging device 3000 , for example, move along the direction perpendicular to the optical axis of the first lens 16 , or move along the direction parallel to the optical axis of the first lens 16 , or move along the direction inclined to the first lens 16 . 16 moves in the direction of the optical axis, so that different positions of the reactor 300 are located directly under the first lens 16, so that the sequencing system 10000 including the imaging device 3000 can be used to realize the image acquisition of the reactor 300, thereby realizing sequence determination. It can be understood that the sequencing system 10000 according to the embodiment of the present application may include the imaging device 3000 according to any of the foregoing embodiments.
另外,本申请实施方式的测序系统10000还包括计算装置,计算装置可以可操作地与成像装置3000耦合,计算装置可以用于从成像装置3000中获取荧光信号的指令集。具体地,成像装置3000采集的荧光信号例如为图像,计算装置从成像装置3000获取图像集,进行处理和识别图像上的信息,以识别序列测定。In addition, the sequencing system 10000 of the embodiment of the present application further includes a computing device, the computing device can be operably coupled with the imaging device 3000 , and the computing device can be used to obtain an instruction set of the fluorescence signal from the imaging device 3000 . Specifically, the fluorescence signal collected by the imaging device 3000 is, for example, an image, and the computing device acquires the image set from the imaging device 3000, processes and recognizes the information on the image to recognize the sequence determination.
本申请实施方式提供了一种流体装置2000,流体装置2000与承载装置1000相连接,用于可控地将一种或多种带有荧光标记的试剂移动到反应器300与多核苷酸接触。Embodiments of the present application provide a fluidic device 2000, which is connected to the carrier device 1000 and used to controllably move one or more fluorescently labeled reagents to the reactor 300 to contact the polynucleotide.
具体的,请参阅图26,在某些实施方式中,流体装置2000包括存储器60和多通阀70。存储器60用于存储溶液,所称的溶液包括多种,例如反应液、缓冲液、清洗溶液和/或纯净水等,包括不同反应或者一个反应不同步骤的试剂;多通阀70设有多个进样口72和一个出样口74,其中进样口72用于供试剂进入多通阀70,而出样口74可选择地连通其中一个进样口72,然后通过设置的歧管76实现与反应器300内多条流路的连接,以供试剂从出样口74移动至反应器300与多核苷酸接触。Specifically, referring to FIG. 26 , in some embodiments, the fluid device 2000 includes a reservoir 60 and a multi-port valve 70 . The storage 60 is used to store solutions, and the solutions include a variety of solutions, such as reaction solutions, buffer solutions, cleaning solutions and/or purified water, etc., including reagents for different reactions or different steps of a reaction; the multi-port valve 70 is provided with multiple A sample inlet 72 and a sample outlet 74, wherein the sample inlet 72 is used for the reagent to enter the multi-port valve 70, and the sample outlet 74 can be selectively communicated with one of the sample inlets 72, and is then realized through the set manifold 76 Connections to multiple flow paths within the reactor 300 for reagents to move from the sample outlet 74 to the reactor 300 to contact the polynucleotides.
需要说明的是,测序系统10000的承载装置1000中可以包含有多个基座100,相应的,也可以设置有多个反应器300,如此,多通阀70的多个进样口72使得多个反应器300都可以进入不同的液体,从而实现多轮/重复反应,并且多通阀70的设置可以实现多种试剂的进样以满足测序的生化过程,并且还可以避免试剂间交叉污染。It should be noted that the carrier device 1000 of the sequencing system 10000 may include multiple bases 100, and correspondingly, multiple reactors 300 may also be provided. In this way, the multiple injection ports 72 of the multi-port valve 70 allow multiple Each of the reactors 300 can enter different liquids, thereby realizing multiple rounds/repeated reactions, and the setting of the multi-port valve 70 can realize the injection of multiple reagents to meet the biochemical process of sequencing, and also avoid cross-contamination between reagents.
如图26所示,在某些实施方式中,流体装置2000还可以包括泵组件80和集液器90。其中泵组件 80用以作为负压动力源,使得试剂在负压的作用下流入反应器300的流路进行生化反应,集液器90可以收集多个反应器300流出的液体。As shown in FIG. 26 , in certain embodiments, the fluidic device 2000 may also include a pump assembly 80 and a sump 90 . The pump assembly 80 is used as a negative pressure power source, so that the reagent flows into the flow path of the reactor 300 under the action of negative pressure to carry out a biochemical reaction, and the liquid collector 90 can collect the liquid flowing out of the multiple reactors 300.
在本说明书的描述中,参考术语“一个实施方式”、“某些实施方式”、“示意性实施方式”、“示例”、“具体示例”、或“一些示例”等的描述意指结合所述实施方式或示例描述的具体特征、结构、材料或者特点包含于本申请的至少一个实施方式或示例中。在本说明书中,对上述术语的示意性表述不一定指的是相同的实施方式或示例。而且,描述的具体特征、结构、材料或者特点可以在任何的一个或多个实施方式或示例中以合适的方式结合。In the description of this specification, reference to the terms "one embodiment," "some embodiments," "exemplary embodiment," "example," "specific example," or "some examples", etc. A particular feature, structure, material, or characteristic described in this embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
尽管已经示出和描述了本申请的实施方式,本领域的普通技术人员可以理解:在不脱离本申请的原理和宗旨的情况下可以对这些实施方式进行多种变化、修改、替换和变型,本申请的范围由权利要求及其等同物限定。Although the embodiments of the present application have been shown and described, those of ordinary skill in the art will appreciate that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present application, The scope of the application is defined by the claims and their equivalents.

Claims (89)

  1. 一种测序系统,其特征在于,包括:A sequencing system, comprising:
    承载装置,用于承载反应器和调节所述反应器的温度,所述反应器上连接有多个多核苷酸,所述承载装置包括,A carrying device for carrying a reactor and adjusting the temperature of the reactor, the reactor is connected with a plurality of polynucleotides, and the carrying device includes,
    基座,具有用于承载所述反应器的承载面,a base having a bearing surface for carrying the reactor,
    温控组件,包括相连接的导热板、制冷器和散热模块,所述制冷器通过所述导热板与所述反应器连接,在所述承载面上放置有所述反应器的情况下,所述导热板与所述反应器刚性连接,以及The temperature control assembly includes a connected heat-conducting plate, a refrigerator and a heat-dissipating module, the refrigerator is connected to the reactor through the heat-conducting plate, and when the reactor is placed on the bearing surface, the the thermally conductive plate is rigidly connected to the reactor, and
    连接组件,连接所述基座和所述温控组件,所述连接组件包括支撑座,所述导热板与所述基座通过所述支撑座连接;a connecting assembly, connecting the base and the temperature control assembly, the connecting assembly includes a support seat, and the heat conducting plate and the base are connected through the support seat;
    流体装置,与所述承载装置连接,用于可控地将一种或多种带有荧光标记的试剂移动到所述反应器与所述多核苷酸接触;a fluidic device connected to the carrier device for controllably moving one or more fluorescently labeled reagents to the reactor to contact the polynucleotide;
    成像装置,位于所述承载装置的上方,用于激发和采集所述荧光标记产生的荧光;an imaging device, located above the carrying device, used to excite and collect the fluorescence generated by the fluorescent label;
    计算装置,可操作地与所述成像装置耦合,包括用于从所述成像装置获取荧光信号的指令集。A computing device, operably coupled to the imaging device, includes a set of instructions for acquiring fluorescence signals from the imaging device.
  2. 根据权利要求1所述的测序系统,其特征在于,所述流体装置包括多通阀,所述多通阀设有多个进液口和一个出液口,所述出液口可选择地连通其中一个所述进液口,所述进液口用于供所述试剂进入所述多通阀,并从所述出液口移动至所述反应器。The sequencing system according to claim 1, wherein the fluid device comprises a multi-port valve, the multi-port valve is provided with a plurality of liquid inlets and a liquid outlet, and the liquid outlet can be selectively communicated One of the liquid inlets is used for allowing the reagents to enter the multi-way valve and move from the liquid outlet to the reactor.
  3. 根据权利要求1所述的测序系统,其特征在于,所述成像装置包括第一光源、第一透镜和分光模组,所述分光模组包括第一分光器、第二透镜、第一相机和第二相机,所述第一透镜用于接收来自所述第一光源的第一光束并使该第一光束准直入射至所述反应器上,以及用于接收来自所述反应器的光束并使该光束准直,所述第二透镜用于将来自所述第一透镜的准直光束聚焦至所述第一相机和所述第二相机,所述第一分光器用于将来自所述第二透镜的聚焦光束分为第二光束和第三光束,所述第一相机用于接收所述第二光束,所述第二相机用于接收所述第三光束。The sequencing system according to claim 1, wherein the imaging device comprises a first light source, a first lens and a beam splitting module, the beam splitting module includes a first beam splitter, a second lens, a first camera and a a second camera, the first lens is used for receiving the first light beam from the first light source and collimating the first light beam onto the reactor, and for receiving the light beam from the reactor and The beam is collimated, the second lens is used to focus the collimated beam from the first lens to the first camera and the second camera, and the first beam splitter is used to focus the collimated beam from the first lens The focused beam of the two lenses is divided into a second beam and a third beam, the first camera is used for receiving the second beam, and the second camera is used for receiving the third beam.
  4. 根据权利要求3所述的测序系统,其特征在于,所述第一光源包括第一发光器和第三透镜,所述光学系统包括第四透镜,所述第一光束为所述第一发光器发出的光束经过所述第三透镜后的准直光束,所述第一光束经过所述第四透镜聚焦到所述第一透镜的后焦面、进而经过所述第一透镜准直入射至所述反应器上。The sequencing system according to claim 3, wherein the first light source includes a first light source and a third lens, the optical system includes a fourth lens, and the first light beam is the first light source The emitted light beam is a collimated light beam after passing through the third lens, the first beam is focused to the back focal plane of the first lens through the fourth lens, and then is collimated and incident to the first lens through the first lens. on the reactor.
  5. 根据权利要求1所述的测序系统,其特征在于,所述承载面上设有第一通孔,所述温控组件穿过所述第一通孔并延伸至所述承载面的上方,所述散热模块包括水浴室,所述导热板、所述制冷器和所述水浴室依次叠设;The sequencing system according to claim 1, wherein a first through hole is provided on the bearing surface, and the temperature control component passes through the first through hole and extends above the bearing surface, so The heat dissipation module includes a water bath, and the heat conduction plate, the refrigerator and the water bath are stacked in sequence;
    所述制冷器与所述水浴室柔性连接,所述水浴室通过所述连接组件与所述基座连接。The refrigerator is flexibly connected to the water bath, and the water bath is connected to the base through the connection assembly.
  6. 根据权利要求5所述的测序系统,其特征在于,在所述承载面承载有所述反应器的情况下,所述导热板通过所述第一通孔与所述反应器接触,所述导热板与所述第一通孔不直接接触。The sequencing system according to claim 5, wherein, in the case that the reactor is supported on the bearing surface, the thermally conductive plate is in contact with the reactor through the first through hole, and the thermally conductive plate is in contact with the reactor through the first through hole. The board is not in direct contact with the first through hole.
  7. 根据权利要求6所述的测序系统,其特征在于,所述导热板位于所述第一通孔内的部分与所述第一通孔的内壁之间具有间隙。The sequencing system according to claim 6, wherein a gap is formed between a portion of the heat conducting plate located in the first through hole and an inner wall of the first through hole.
  8. 根据权利要求5所述的测序系统,其特征在于,所述制冷器具有相背的第一面和第二面,在所述承载面承载有所述反应器的情况下,所述制冷器的所述第一面通过所述第一通孔与所述反应器接触;The sequencing system according to claim 5, wherein the refrigerator has a first surface and a second surface that are opposite to each other, and when the bearing surface carries the reactor, the refrigerator has a first surface and a second surface opposite to each other. the first surface is in contact with the reactor through the first through hole;
    所述水浴室与所述制冷器的所述第二面接触,所述水浴室具有用于容纳冷却液的腔室,所述水浴室上设有连通所述腔室的进液口和出液口。The water bath is in contact with the second surface of the refrigerator, the water bath has a chamber for accommodating cooling liquid, and the water bath is provided with a liquid inlet and a liquid outlet communicating with the chamber mouth.
  9. 根据权利要求5所述的测序系统,其特征在于,所述水浴室具有用于容纳冷却液的腔室,所述水浴室上设有连通所述腔室的进液口和出液口,所述水浴室设有第一散热区域和第二散热区域,所述第一散热区中设有第一流道和第二流道,所述第二散热区中设有第三流道和第四流道,每个所述流道均具有朝向不同的第一端和第二端;The sequencing system according to claim 5, wherein the water bath has a chamber for accommodating cooling liquid, and the water bath is provided with a liquid inlet and a liquid outlet that communicate with the chamber, so The water bath is provided with a first heat dissipation area and a second heat dissipation area, the first heat dissipation area is provided with a first flow channel and a second flow channel, and the second heat dissipation area is provided with a third flow channel and a fourth flow channel channels, each of the flow channels having a first end and a second end oriented differently;
    所述第一流道的第一端和所述第二流道的第一端连通,所述第一流道的第二端与所述水浴室的进液口连通;The first end of the first flow channel is communicated with the first end of the second flow channel, and the second end of the first flow channel is communicated with the liquid inlet of the water bath;
    所述第三流道的第二端和所述第四流道的第二端连通,所述第四流道的第一端与水浴室的出液口连通;The second end of the third flow channel is communicated with the second end of the fourth flow channel, and the first end of the fourth flow channel is communicated with the liquid outlet of the water bath;
    所述第二流道的第二端和所述第三流道的第一端连通;the second end of the second flow channel communicates with the first end of the third flow channel;
    所述第一散热区域中的至少一个流道呈曲折状,所述第二散热区域中的至少一个流道呈曲折状。At least one flow channel in the first heat dissipation area is in a zigzag shape, and at least one flow channel in the second heat dissipation area is in a tortuous shape.
  10. 根据权利要求9所述的测序系统,其特征在于,所述水浴室还包括散热板和盖板;The sequencing system according to claim 9, wherein the water bath further comprises a heat dissipation plate and a cover plate;
    所述散热板上设有所述第一流道、所述第二流道、所述第三流道和所述第四流道,所述盖板连接所述 散热板并覆盖于所述第一流道、所述第二流道、所述第三流道和所述第四流道上形成所述腔室。The heat dissipation plate is provided with the first flow channel, the second flow channel, the third flow channel and the fourth flow channel, and the cover plate is connected to the heat dissipation plate and covers the first flow channel. The chamber is formed on the channel, the second channel, the third channel and the fourth channel.
  11. 根据权利要求5-10任一项所述的测序系统,其特征在于,所述散热模块包括所述水浴室和液体组件,所述液体组件包括相连接的泵和冷却器,所述泵用于提供动力给冷却液,所述冷却器用于冷却冷却液,所述泵与所述水浴室的进液口连接,所述冷却器与所述水浴室的出液口连接。The sequencing system according to any one of claims 5-10, wherein the heat dissipation module includes the water bath and a liquid component, the liquid component includes a connected pump and a cooler, and the pump is used for Power is supplied to the cooling liquid, the cooler is used for cooling the cooling liquid, the pump is connected with the liquid inlet of the water bath, and the cooler is connected with the liquid outlet of the water bath.
  12. 根据权利要求11所述的测序系统,其特征在于,所述冷却器包括冷却排,所述冷却排上设有通道,所述通道上设有多个散热片。The sequencing system according to claim 11, wherein the cooler comprises a cooling row, the cooling row is provided with a channel, and the channel is provided with a plurality of cooling fins.
  13. 根据权利要求12所述的测序系统,其特征在于,所述冷却器还包括风扇,所述风扇能够产生朝向所述冷却排的气流。13. The sequencing system of claim 12, wherein the cooler further comprises a fan capable of generating airflow toward the cooling row.
  14. 根据权利要求13所述的测序系统,其特征在于,所述液体组件还包括蓄水池,所述蓄水池用于储存冷却液,所述泵和所述冷却器通过所述蓄水池相连接。The sequencing system according to claim 13, wherein the liquid component further comprises a water reservoir, the water reservoir is used for storing cooling liquid, and the pump and the cooler are connected to each other through the water reservoir. connect.
  15. 根据权利要求1-14任一项所述的测序系统,其特征在于,所述温控组件还包括控制模块,所述控制模块连接所述制冷器和所述散热模块,所述控制模块用于检测所述反应器的温度,并据检测出的温度控制所述散热模块作业。The sequencing system according to any one of claims 1-14, wherein the temperature control assembly further comprises a control module, the control module is connected to the refrigerator and the heat dissipation module, and the control module is used for The temperature of the reactor is detected, and the operation of the heat dissipation module is controlled according to the detected temperature.
  16. 根据权利要求15所述的测序系统,其特征在于,所述控制模块包括温度传感器,所述温度传感器设于所述导热板上,用于检测所述导热板的温度。The sequencing system according to claim 15, wherein the control module comprises a temperature sensor, and the temperature sensor is arranged on the heat-conducting plate for detecting the temperature of the heat-conducting plate.
  17. 根据权利要求9或10所述的测序系统,其特征在于,所述第一流道、第二流道、第三流道和第四流道的第一端朝向相同,和/或所述第一流道、第二流道、第三流道和第四流道的第二端朝向相同。The sequencing system according to claim 9 or 10, wherein the first ends of the first flow channel, the second flow channel, the third flow channel and the fourth flow channel face the same direction, and/or the first flow channel The second ends of the channel, the second flow channel, the third flow channel and the fourth flow channel are oriented in the same direction.
  18. 根据权利要求5所述的测序系统,其特征在于,所述承载面上设有容纳槽,所述第一通孔设于所述容纳槽中,所述容纳槽用于容纳反应器。The sequencing system according to claim 5, wherein an accommodating groove is provided on the bearing surface, the first through hole is provided in the accommodating groove, and the accommodating groove is used for accommodating a reactor.
  19. 根据权利要求5所述的测序系统,其特征在于,所述连接组件包括相连接的第一连接件和第二连接件,所述第一连接件通过所述支撑座与所述基座相连,所述第二连接件的一端与所述第一连接件相连,所述第二连接件的另一端与所述水浴室的底部相连,所述第一连接件为刚性连接件,所述第二连接件为弹性连接件。The sequencing system according to claim 5, wherein the connecting assembly comprises a first connecting piece and a second connecting piece that are connected to each other, the first connecting piece is connected to the base through the support seat, One end of the second connecting piece is connected with the first connecting piece, the other end of the second connecting piece is connected with the bottom of the water bath, the first connecting piece is a rigid connecting piece, and the second connecting piece is a rigid connecting piece. The connecting piece is an elastic connecting piece.
  20. 根据权利要求19所述的测序系统,其特征在于,所述第二连接件为弹簧。The sequencing system of claim 19, wherein the second connector is a spring.
  21. 根据权利要求5-20任一项所述的测序系统,其特征在于,所述连接组件还包括第一定位结构和第二定位结构,所述支撑座包括第一侧和与所述第一侧相对的第二侧,所述支撑座的第一侧设有所述第一定位结构,所述支撑座的第二侧设有所述第二定位结构,所述支撑座与所述基座的底部相连;The sequencing system according to any one of claims 5-20, wherein the connection assembly further includes a first positioning structure and a second positioning structure, and the support base includes a first side and a connection with the first side. On the opposite second side, the first positioning structure is provided on the first side of the support seat, the second positioning structure is provided on the second side of the support seat, and the support seat and the base are provided with the first positioning structure. connected at the bottom;
    所述导热板设有分别能够与所述第一定位结构以及所述第二定位结构配合的第一孔和第二孔。The heat-conducting plate is provided with a first hole and a second hole which can be respectively matched with the first positioning structure and the second positioning structure.
  22. 根据权利要求21所述的测序系统,其特征在于,所述第一孔为腰孔。The sequencing system according to claim 21, wherein the first hole is a waist hole.
  23. 根据权利要求21所述的测序系统,其特征在于,所述第一定位结构包括与所述第一孔配合的第一定位柱,所述第一定位柱包括第一端部和与第一端部相对的第二端部,所述第一定位柱的第一端部与所述支撑座相连接,所述第一定位柱的第二端部设有半径大于所述第一孔半径的第一定位球,所述导热板位于所述第一定位球与所述支撑座之间;和/或The sequencing system according to claim 21, wherein the first positioning structure comprises a first positioning post matched with the first hole, and the first positioning post comprises a first end and a first end The second end of the first positioning column is connected to the support seat, and the second end of the first positioning column is provided with a second end with a radius larger than that of the first hole. a positioning ball, the heat conducting plate is located between the first positioning ball and the support seat; and/or
    所述第二定位结构包括与所述第二孔配合的第二定位柱,所述第二定位柱包括第一端部和与第一端部相对的第二端部,所述第二定位柱的第一端部与所述支撑座相连接,所述第二定位柱的第二端部设有半径大于所述第二孔宽度的第二定位球,所述导热板位于所述第二定位球与所述支撑座之间。The second positioning structure includes a second positioning column matched with the second hole, the second positioning column includes a first end and a second end opposite to the first end, the second positioning column The first end of the second positioning column is connected to the support seat, the second end of the second positioning column is provided with a second positioning ball with a radius greater than the width of the second hole, and the heat conduction plate is located in the second positioning between the ball and the support seat.
  24. 根据权利要求23所述的测序系统,其特征在于,所述反应器设有能够与所述第一定位球配合的第三孔以及能够与所述第二定位球配合的第四孔。The sequencing system according to claim 23, wherein the reactor is provided with a third hole that can be matched with the first positioning ball and a fourth hole that can be matched with the second positioning ball.
  25. 根据权利要求21所述的测序系统,其特征在于,所述承载面上设有所述第一通孔,所述温控组件穿过所述第一通孔并延伸至所述承载面的上方,所述支撑座的第一侧设有用于支撑所述导热板的第一凸起部,所述第一凸起部位于所述第一通孔内且与所述第一通孔的内壁之间具有间隙;和/或The sequencing system according to claim 21, wherein the first through hole is provided on the bearing surface, and the temperature control component passes through the first through hole and extends above the bearing surface , the first side of the support seat is provided with a first protruding portion for supporting the heat conducting plate, the first protruding portion is located in the first through hole and is in contact with the inner wall of the first through hole there are gaps between; and/or
    所述支撑座的第二侧设有用于支撑所述导热板的第二凸起部,所述第二凸起部位于所述第一通孔内且与所述第一通孔的内壁之间具有间隙。The second side of the support seat is provided with a second protruding portion for supporting the heat conducting plate, the second protruding portion is located in the first through hole and between the inner wall of the first through hole with gaps.
  26. 根据权利要求1-25任一项所述的测序系统,其特征在于,所述反应器还包括刚性板,所述温控组件通过所述刚性板与所述反应器刚性连接。The sequencing system according to any one of claims 1-25, wherein the reactor further comprises a rigid plate, and the temperature control assembly is rigidly connected to the reactor through the rigid plate.
  27. 根据权利要求26所述的测序系统,其特征在于,所述刚性板为铝板。The sequencing system of claim 26, wherein the rigid plate is an aluminum plate.
  28. 根据权利要求1-25任一项所述的测序系统,其特征在于,所述支撑座采用受热形变程度小于所述导热板受热形变程度的材质。The sequencing system according to any one of claims 1-25, wherein the support base is made of a material with a degree of thermal deformation less than that of the thermally conductive plate.
  29. 根据权利要求1-28任一项所述的测序系统,其特征在于,所述承载装置还包括流体连接件,所述流体连接件连接所述流体装置,所述反应器设有一条或多条流路,在所述承载面承载有所述反应器的 情况下,所述流体连接件连通所述反应器和所述流体装置。The sequencing system according to any one of claims 1-28, wherein the carrying device further comprises a fluid connector, the fluid connector is connected to the fluid device, and the reactor is provided with one or more In a flow path, when the bearing surface carries the reactor, the fluid connector communicates the reactor and the fluid device.
  30. 根据权利要求29所述的测序系统,其特征在于,所述承载装置还包括支撑结构,用于支撑所述流体连接件,所述支撑结构位于所述流体连接件下方并与所述基座连接;The sequencing system of claim 29, wherein the carrying device further comprises a support structure for supporting the fluid connector, the support structure being located below the fluid connector and connected to the base ;
    所述支撑结构包括用于支撑所述流体连接件的支撑面以及支撑件,所述流体连接件通过所述支撑件连设于所述支撑面上,所述支撑面设有第一凹槽,所述支撑件的一端设于所述第一凹槽中,所述支撑件的另一端连接所述流体连接件;The support structure includes a support surface for supporting the fluid connection piece and a support piece, the fluid connection piece is connected to the support surface through the support piece, and the support surface is provided with a first groove, One end of the support member is set in the first groove, and the other end of the support member is connected to the fluid connection member;
    所述第一凹槽设有第二通孔。The first groove is provided with a second through hole.
  31. 根据权利要求30所述的测序系统,其特征在于,所述流体连接件具有与所述支撑件的另一端匹配的第二凹槽,所述支撑件的另一端抵设于所述第二凹槽内。The sequencing system according to claim 30, wherein the fluid connection member has a second groove matching with the other end of the support member, and the other end of the support member abuts against the second groove in the slot.
  32. 根据权利要求30所述的测序系统,其特征在于,所述流路设有进口和出口,所述流体连接件包括第一歧管和第二歧管;The sequencing system of claim 30, wherein the flow path is provided with an inlet and an outlet, and the fluid connection includes a first manifold and a second manifold;
    在所述承载面承载有所述反应器的情况下,所述第一歧管与所述流路的进口连通,所述第二歧管与所述流路的出口连通。When the bearing surface carries the reactor, the first manifold communicates with the inlet of the flow path, and the second manifold communicates with the outlet of the flow path.
  33. 根据权利要求30所述的测序系统,其特征在于,所述支撑面上设有第三定位结构,所述流体连接件具有与所述第三定位结构配合的第四定位结构。The sequencing system according to claim 30, wherein a third positioning structure is provided on the support surface, and the fluid connector has a fourth positioning structure matched with the third positioning structure.
  34. 根据权利要求33所述的测序系统,其特征在于,所述第三定位结构包括定位柱,所述第四定位结构包括与所述定位柱配合的定位槽;或者The sequencing system according to claim 33, wherein the third positioning structure comprises a positioning post, and the fourth positioning structure comprises a positioning groove matched with the positioning post; or
    所述第三定位结构包括定位槽,所述第四定位结构包括与所述定位槽配合的定位柱。The third positioning structure includes a positioning groove, and the fourth positioning structure includes a positioning column matched with the positioning groove.
  35. 根据权利要求30所述的测序系统,其特征在于,所述流体连接件与所述支撑面之间具有间隙。The sequencing system of claim 30, wherein there is a gap between the fluid connector and the support surface.
  36. 根据权利要求30所述的测序系统,其特征在于,所述支撑件为弹簧,使得所述流体连接件弹性地抵接在所述反应器上。The sequencing system of claim 30, wherein the support member is a spring, so that the fluid connection member elastically abuts on the reactor.
  37. 根据权利要求30所述的测序系统,其特征在于,所述支撑件的数目为两个,两个所述支撑件对称设置。The sequencing system according to claim 30, wherein the number of the support members is two, and the two support members are arranged symmetrically.
  38. 根据权利要求1-37任一项所述的测序系统,其特征在于,所述承载装置还包括底座,所述底座用于容置多个所述基座,多个所述基座平行置于所述底座上,所述底座上设有调节结构,所述底座与所述基座通过所述调节结构连接,所述调节结构用于调节所述基座与所述底座之间的距离;The sequencing system according to any one of claims 1-37, wherein the carrying device further comprises a base, and the base is used for accommodating a plurality of the bases, and a plurality of the bases are placed in parallel on the base, an adjustment structure is arranged on the base, the base and the base are connected by the adjustment structure, and the adjustment structure is used to adjust the distance between the base and the base;
  39. 根据权利要求38所述的测序系统,其特征在于,所述调节结构包括细调螺母,用于调节所述基座与所述底座之间的距离;The sequencing system according to claim 38, wherein the adjustment structure comprises a fine adjustment nut for adjusting the distance between the base and the base;
    一个所述基座与所述底座之间连接有多个所述细调螺母。A plurality of the fine adjustment nuts are connected between one of the bases and the base.
  40. 根据权利要求39所述的测序系统,其特征在于,所述调节结构还包括拉簧,一个所述基座与所述底座之间连接有多个所述拉簧。The sequencing system according to claim 39, wherein the adjustment structure further comprises a tension spring, and a plurality of the tension springs are connected between one of the bases and the base.
  41. 根据权利要求38所述的测序系统,其特征在于,所述底座为中空结构,所述底座的顶部设有开口;The sequencing system according to claim 38, wherein the base is a hollow structure, and the top of the base is provided with an opening;
    多个所述基座均设于所述底座的开口处。A plurality of the bases are disposed at the openings of the bases.
  42. 根据权利要求38所述的测序系统,其特征在于,所述承载装置还包括移动平台,所述移动平台位于所述底座下方,用于支撑和移动所述底座。The sequencing system according to claim 38, wherein the carrying device further comprises a moving platform, and the moving platform is located under the base for supporting and moving the base.
  43. 根据权利要求42所述的测序系统,其特征在于,所述移动平台包括台面主体、第一驱动机构和第二驱动机构,所述台面主体与所述底座相连;The sequencing system according to claim 42, wherein the moving platform comprises a table main body, a first driving mechanism and a second driving mechanism, and the table main body is connected to the base;
    所述第一驱动机构驱动所述台面主体沿第一方向运动,所述第二驱动机构驱动所述台面主体沿第二方向运动,所述第一方向与所述第二方向垂直;The first driving mechanism drives the table main body to move in a first direction, the second driving mechanism drives the table main body to move in a second direction, and the first direction is perpendicular to the second direction;
  44. 根据权利要求43所述的测序系统,其特征在于,所述第一驱动机构包括第一滑轨、第一滑座和第一电机,所述第一滑轨与所述第一方向平行设置,所述第一滑座安装在所述第一滑轨上并在所述第一电机的驱动下沿所述第一滑轨移动,所述台面主体与所述第一滑座相连。The sequencing system according to claim 43, wherein the first driving mechanism comprises a first sliding rail, a first sliding seat and a first motor, and the first sliding rail is arranged parallel to the first direction, The first sliding seat is mounted on the first sliding rail and moves along the first sliding rail under the driving of the first motor, and the table main body is connected with the first sliding seat.
  45. 根据权利要求44所述的测序系统,其特征在于,所述第二驱动机构包括第二滑轨、第二滑座和第二电机,所述第二滑轨与所述第二方向平行设置,所述第二滑座安装在所述第二滑轨上并在所述第二电机的驱动下沿所述第二滑轨移动,所述第一滑轨设于所述第二滑座上。The sequencing system according to claim 44, wherein the second driving mechanism comprises a second sliding rail, a second sliding seat and a second motor, the second sliding rail is arranged parallel to the second direction, The second sliding seat is mounted on the second sliding rail and moves along the second sliding rail under the driving of the second motor, and the first sliding rail is arranged on the second sliding seat.
  46. 根据权利要求45所述的测序系统,其特征在于,所述第二滑轨内设有导向件,所述导向件与所述第二方向平行;The sequencing system according to claim 45, wherein a guide member is provided in the second slide rail, and the guide member is parallel to the second direction;
    所述第二滑座沿所述第二方向包括第一侧和与所述第一侧相对的第二侧,所述第二滑座的第一侧与所述第二滑座的第二侧其中的一侧具有与所述导向件匹配的第三通孔,所述导向件穿过所述第三通孔延伸至所述第二滑座的外部。The second sliding seat includes a first side and a second side opposite to the first side along the second direction, the first side of the second sliding seat and the second side of the second sliding seat One side thereof has a third through hole matched with the guide piece, and the guide piece extends through the third through hole to the outside of the second sliding seat.
  47. 一种承载装置,其特征在于,包括:A bearing device, characterized in that, comprising:
    基座,具有用于承载反应器的承载面;a base having a bearing surface for carrying the reactor;
    温控组件,所述温控组件包括相连接的导热板、制冷器和散热模块,所述制冷器通过所述导热板与所述反应器连接,在所述承载面放置有所述反应器的情况下,所述导热板与所述反应器刚性连接;以及A temperature control assembly, the temperature control assembly includes a connected heat conduction plate, a refrigerator and a heat dissipation module, the refrigerator is connected with the reactor through the heat conduction plate, and the bearing surface of the reactor is placed on the bearing surface. case, the thermally conductive plate is rigidly connected to the reactor; and
    连接组件,所述基座和所述温控组件通过所述连接组件连接,所述连接组件包括支撑座,所述导热板与所述基座通过所述支撑座连接。A connection assembly, the base and the temperature control assembly are connected through the connection assembly, the connection assembly includes a support seat, and the heat conduction plate and the base are connected through the support seat.
  48. 根据权利要求47所述的承载装置,其特征在于,所述承载面上设有第一通孔,所述温控组件穿过所述第一通孔并延伸至所述承载面的上方,所述散热模块包括水浴室,所述导热板、所述制冷器和所述水浴室依次叠设;The carrying device according to claim 47, wherein the carrying surface is provided with a first through hole, the temperature control component passes through the first through hole and extends above the carrying surface, so The heat dissipation module includes a water bath, and the heat conduction plate, the refrigerator and the water bath are stacked in sequence;
    所述制冷器与所述水浴室柔性连接,所述水浴室通过所述连接组件与所述基座连接。The refrigerator is flexibly connected to the water bath, and the water bath is connected to the base through the connection assembly.
  49. 根据权利要求48所述的承载装置,其特征在于,在所述承载面承载有所述反应器的情况下,所述导热板通过所述第一通孔与所述反应器接触,所述导热板与所述第一通孔不直接接触。The carrying device according to claim 48, wherein when the carrying surface carries the reactor, the heat-conducting plate is in contact with the reactor through the first through hole, and the heat-conducting plate is in contact with the reactor. The board is not in direct contact with the first through hole.
  50. 根据权利要求49所述的承载装置,其特征在于,所述导热板位于所述第一通孔内的部分与所述第一通孔的内壁之间具有间隙。The carrying device according to claim 49, wherein a gap is formed between a portion of the heat conducting plate located in the first through hole and an inner wall of the first through hole.
  51. 根据权利要求48所述的承载装置,其特征在于,所述制冷器具有相背的第一面和第二面,在所述承载面承载有所述反应器的情况下,所述制冷器的所述第一面通过所述第一通孔与所述反应器接触;The carrying device according to claim 48, wherein the refrigerator has a first surface and a second surface that are opposite to each other, and when the carrying surface carries the reactor, the refrigerator has a first surface and a second surface opposite to each other. the first surface is in contact with the reactor through the first through hole;
    所述水浴室与所述制冷器的所述第二面接触,所述水浴室具有用于容纳冷却液的腔室,所述水浴室上设有连通所述腔室的进液口和出液口。The water bath is in contact with the second surface of the refrigerator, the water bath has a chamber for accommodating cooling liquid, and the water bath is provided with a liquid inlet and a liquid outlet communicating with the chamber mouth.
  52. 根据权利要求48所述的承载装置,其特征在于,所述水浴室具有用于容纳冷却液的腔室,所述水浴室上设有连通所述腔室的进液口和出液口,所述水浴室设有第一散热区域和第二散热区域,所述第一散热区中设有第一流道和第二流道,所述第二散热区中设有第三流道和第四流道,每个所述流道均具有朝向不同的第一端和第二端;The carrying device according to claim 48, wherein the water bath has a chamber for accommodating cooling liquid, and the water bath is provided with a liquid inlet and a liquid outlet communicating with the chamber, so The water bath is provided with a first heat dissipation area and a second heat dissipation area, the first heat dissipation area is provided with a first flow channel and a second flow channel, and the second heat dissipation area is provided with a third flow channel and a fourth flow channel channels, each of the flow channels having a first end and a second end oriented differently;
    所述第一流道的第一端和所述第二流道的第一端连通,所述第一流道的第二端与所述水浴室的进液口连通;The first end of the first flow channel is communicated with the first end of the second flow channel, and the second end of the first flow channel is communicated with the liquid inlet of the water bath;
    所述第三流道的第二端和所述第四流道的第二端连通,所述第四流道的第一端与水浴室的出液口连通;The second end of the third flow channel is communicated with the second end of the fourth flow channel, and the first end of the fourth flow channel is communicated with the liquid outlet of the water bath;
    所述第二流道的第二端和所述第三流道的第一端连通;the second end of the second flow channel communicates with the first end of the third flow channel;
    所述第一散热区域中的至少一个流道呈曲折状,所述第二散热区域中的至少一个流道呈曲折状。At least one flow channel in the first heat dissipation area is in a zigzag shape, and at least one flow channel in the second heat dissipation area is in a tortuous shape.
  53. 根据权利要求52所述的承载装置,其特征在于,所述水浴室还包括散热板和盖板;The carrying device according to claim 52, wherein the water bath further comprises a heat dissipation plate and a cover plate;
    所述散热板上设有所述第一流道、所述第二流道、所述第三流道和所述第四流道,所述盖板连接所述散热板并覆盖于所述第一流道、所述第二流道、所述第三流道和所述第四流道上形成所述腔室。The heat dissipation plate is provided with the first flow channel, the second flow channel, the third flow channel and the fourth flow channel, and the cover plate is connected to the heat dissipation plate and covers the first flow channel. The chamber is formed on the channel, the second channel, the third channel and the fourth channel.
  54. 根据权利要求48-53任一项所述的承载装置,其特征在于,所述散热模块包括所述水浴室和液体组件,所述液体组件包括相连接的泵和冷却器,所述泵用于提供动力给冷却液,所述冷却器用于冷却冷却液,所述泵与所述水浴室的进液口连接,所述冷却器与所述水浴室的出液口连接。The carrying device according to any one of claims 48-53, wherein the heat dissipation module includes the water bath and a liquid assembly, the liquid assembly includes a connected pump and a cooler, and the pump is used for Power is supplied to the cooling liquid, the cooler is used for cooling the cooling liquid, the pump is connected with the liquid inlet of the water bath, and the cooler is connected with the liquid outlet of the water bath.
  55. 根据权利要求54所述的承载装置,其特征在于,所述冷却器包括冷却排,所述冷却排上设有通道,所述通道上设有多个散热片。The carrier device of claim 54, wherein the cooler comprises a cooling row, the cooling row is provided with a channel, and the channel is provided with a plurality of cooling fins.
  56. 根据权利要求55所述的承载装置,其特征在于,所述冷却器还包括风扇,所述风扇能够产生朝向所述冷却排的气流。56. The carrier of claim 55, wherein the cooler further comprises a fan capable of generating airflow toward the cooling row.
  57. 根据权利要求54所述的承载装置,其特征在于,所述液体组件还包括蓄水池,所述蓄水池用于储存冷却液,所述泵和所述冷却器通过所述蓄水池相连接。55. The carrier device of claim 54, wherein the liquid assembly further comprises a reservoir for storing the cooling fluid, the pump and the cooler passing through the reservoir. connect.
  58. 根据权利要求47-57任一项所述的承载装置,其特征在于,所述温控组件还包括控制模块,所述控制模块连接所述制冷器和所述散热模块,所述控制模块用于检测所述反应器的温度,并据检测出的温度控制所述散热模块作业。The carrying device according to any one of claims 47-57, wherein the temperature control assembly further comprises a control module, the control module is connected to the refrigerator and the heat dissipation module, and the control module is used for The temperature of the reactor is detected, and the operation of the heat dissipation module is controlled according to the detected temperature.
  59. 根据权利要求58所述的承载装置,其特征在于,所述控制模块包括温度传感器,所述温度传感器设于所述导热板上,用于检测所述导热板的温度。The carrier device according to claim 58, wherein the control module comprises a temperature sensor, and the temperature sensor is arranged on the heat-conducting plate for detecting the temperature of the heat-conducting plate.
  60. 根据权利要求52或53所述的承载装置,其特征在于,所述第一流道、第二流道、第三流道和第四流道的第一端朝向相同,和/或所述第一流道、第二流道、第三流道和第四流道的第二端朝向相同。The carrier device according to claim 52 or 53, wherein the first ends of the first flow channel, the second flow channel, the third flow channel and the fourth flow channel face the same direction, and/or the first flow channel The second ends of the channel, the second flow channel, the third flow channel and the fourth flow channel are oriented in the same direction.
  61. 根据权利要求48所述的承载装置,其特征在于,所述承载面上设有容纳槽,所述第一通孔设于所述容纳槽中,所述容纳槽用于容纳反应器。The carrying device according to claim 48, wherein a receiving groove is provided on the carrying surface, the first through hole is provided in the holding groove, and the holding groove is used for holding a reactor.
  62. 根据权利要求48所述的承载装置,其特征在于,所述连接组件包括相连接的第一连接件和第二 连接件,所述第一连接件通过所述支撑座与所述基座相连,所述第二连接件的一端与所述第一连接件相连,所述第二连接件的另一端与所述水浴室的底部相连,所述第一连接件为刚性连接件,所述第二连接件为弹性连接件。The carrying device according to claim 48, wherein the connecting assembly comprises a first connecting piece and a second connecting piece which are connected to each other, and the first connecting piece is connected with the base through the support seat, One end of the second connecting piece is connected with the first connecting piece, the other end of the second connecting piece is connected with the bottom of the water bath, the first connecting piece is a rigid connecting piece, and the second connecting piece is a rigid connecting piece. The connecting piece is an elastic connecting piece.
  63. 根据权利要求62所述的承载装置,其特征在于,所述第二连接件为弹簧。The carrying device of claim 62, wherein the second connecting member is a spring.
  64. 根据权利要求48-63任一项所述的承载装置,其特征在于,所述连接组件还包括第一定位结构和第二定位结构,所述支撑座包括第一侧和与所述第一侧相对的第二侧,所述第一侧设有所述第一定位结构,所述第二侧设有所述第二定位结构,所述支撑座与所述基座的底部相连;The carrying device according to any one of claims 48-63, wherein the connecting assembly further includes a first positioning structure and a second positioning structure, and the support base includes a first side and a connection with the first side. the opposite second side, the first side is provided with the first positioning structure, the second side is provided with the second positioning structure, and the support seat is connected to the bottom of the base;
    所述导热板设有分别能够与所述第一定位结构以及所述第二定位结构配合的第一孔和第二孔。The heat-conducting plate is provided with a first hole and a second hole which can be respectively matched with the first positioning structure and the second positioning structure.
  65. 根据权利要求64所述的承载装置,其特征在于,所述第一孔为腰孔。The carrying device of claim 64, wherein the first hole is a waist hole.
  66. 根据权利要求64所述的承载装置,其特征在于,所述第一定位结构包括与所述第一孔配合的第一定位柱,所述第一定位柱包括第一端部和与所述第一端部相对的第二端部,所述第一定位柱的第一端部与所述支撑座相连接,所述第一定位柱的第二端部设有半径大于所述第一孔半径的第一定位球,所述导热板位于所述第一定位球与所述支撑座之间;和/或The carrying device of claim 64, wherein the first positioning structure comprises a first positioning post matched with the first hole, the first positioning post comprising a first end and A second end opposite to one end, the first end of the first positioning post is connected to the support seat, and the second end of the first positioning post is provided with a radius larger than the radius of the first hole the first positioning ball, the heat conducting plate is located between the first positioning ball and the support seat; and/or
    所述第二定位结构包括与所述第二孔配合的第二定位柱,所述第二定位柱包括第一端部和与所述第一端部相对的第二端部,所述第二定位柱的第一端部与所述支撑座相连接,所述第二定位柱的第二端部设有半径大于所述第二孔宽度的第二定位球,所述导热板位于所述第二定位球与所述支撑座之间。The second positioning structure includes a second positioning post matched with the second hole, the second positioning post includes a first end and a second end opposite to the first end, the second The first end of the positioning column is connected to the support seat, the second end of the second positioning column is provided with a second positioning ball with a radius larger than the width of the second hole, and the heat conducting plate is located on the first between the two positioning balls and the support seat.
  67. 根据权利要求66所述的承载装置,其特征在于,所述反应器设有能够与所述第一定位球配合的第三孔以及能够与所述第二定位球配合的第四孔。The carrying device of claim 66, wherein the reactor is provided with a third hole capable of engaging with the first positioning ball and a fourth hole capable of engaging with the second positioning ball.
  68. 根据权利要求64所述的承载装置,其特征在于,所述承载面上设有所述第一通孔,所述温控组件穿过所述第一通孔并延伸至所述承载面的上方,所述支撑座的第一侧设有用于支撑所述导热板的第一凸起部,所述第一凸起部位于所述第一通孔内且与所述第一通孔的内壁之间具有间隙;和/或The carrying device according to claim 64, wherein the carrying surface is provided with the first through hole, and the temperature control component passes through the first through hole and extends above the carrying surface , the first side of the support seat is provided with a first protruding portion for supporting the heat conducting plate, the first protruding portion is located in the first through hole and is in contact with the inner wall of the first through hole There are gaps between; and/or
    所述支撑座的第二侧设有用于支撑所述导热板的第二凸起部,所述第二凸起部位于所述第一通孔内且与所述第一通孔的内壁之间具有间隙。The second side of the support seat is provided with a second protruding portion for supporting the heat conducting plate, the second protruding portion is located in the first through hole and between the inner wall of the first through hole with gaps.
  69. 根据权利要求47-68任一项所述的承载装置,其特征在于,所述反应器还包括刚性板,所述温控组件通过所述刚性板与所述反应器刚性连接。The carrying device according to any one of claims 47-68, wherein the reactor further comprises a rigid plate, and the temperature control assembly is rigidly connected to the reactor through the rigid plate.
  70. 根据权利要求69所述的承载装置,其特征在于,所述刚性板为铝板。The carrying device of claim 69, wherein the rigid plate is an aluminum plate.
  71. 根据权利要求47-68任一项所述的承载装置,其特征在于,所述支撑座采用受热形变程度小于所述导热板受热形变程度的材质。The carrying device according to any one of claims 47 to 68, wherein the support base is made of a material whose degree of thermal deformation is smaller than that of the thermally conductive plate.
  72. 根据权利要求47-71任一项所述的承载装置,其特征在于,所述承载装置还包括流体连接件,所述流体连接件连接流体装置,所述反应器设有一条或多条流路,在所述承载面承载有所述反应器的情况下,所述流体连接件连通所述反应器和所述流体装置。The carrying device according to any one of claims 47-71, characterized in that, the carrying device further comprises a fluid connector, the fluid connector is connected to the fluid device, and the reactor is provided with one or more flow paths , in the case that the bearing surface carries the reactor, the fluid connection piece communicates the reactor and the fluid device.
  73. 根据权利要求72所述的承载装置,其特征在于,所述承载装置还包括支撑结构,用于支撑所述流体连接件,所述支撑结构位于所述流体连接件下方并与所述基座连接;72. The carrier device of claim 72, wherein the carrier device further comprises a support structure for supporting the fluid connector, the support structure positioned below the fluid connector and connected to the base ;
    所述支撑结构包括用于支撑所述流体连接件的支撑面以及支撑件,所述流体连接件通过所述支撑件连设于所述支撑面上,所述支撑面设有第一凹槽,所述支撑件的一端设于所述第一凹槽中,所述支撑件的另一端连接所述流体连接件;The support structure includes a support surface for supporting the fluid connection piece and a support piece, the fluid connection piece is connected to the support surface through the support piece, and the support surface is provided with a first groove, One end of the support member is set in the first groove, and the other end of the support member is connected to the fluid connection member;
    所述第一凹槽设有第二通孔。The first groove is provided with a second through hole.
  74. 根据权利要求73所述的承载装置,其特征在于,所述流体连接件具有与所述支撑件的另一端匹配的第二凹槽,所述支撑件的另一端抵设于所述第二凹槽内。The carrying device according to claim 73, wherein the fluid connection member has a second groove matching with the other end of the support member, and the other end of the support member abuts against the second groove in the slot.
  75. 根据权利要求73所述的承载装置,其特征在于,所述流路设有进口和出口,所述流体连接件包括第一歧管和第二歧管;在所述承载面承载有所述反应器的情况下,所述第一歧管与所述流路的进口连通,所述第二歧管与所述流路的出口连通。The carrying device of claim 73, wherein the flow path is provided with an inlet and an outlet, the fluid connection includes a first manifold and a second manifold; the reaction is carried on the carrying surface In the case of the device, the first manifold communicates with the inlet of the flow path, and the second manifold communicates with the outlet of the flow path.
  76. 根据权利要求73所述的承载装置,其特征在于,所述支撑面上设有第三定位结构,所述流体连接件具有与所述第三定位结构配合的第四定位结构。The carrying device according to claim 73, wherein a third positioning structure is provided on the supporting surface, and the fluid connecting member has a fourth positioning structure matched with the third positioning structure.
  77. 根据权利要求76所述的承载装置,其特征在于,所述第三定位结构包括定位柱,所述第四定位结构包括与所述定位柱配合的定位槽;或者The carrying device according to claim 76, wherein the third positioning structure comprises a positioning post, and the fourth positioning structure comprises a positioning groove matched with the positioning post; or
    所述第三定位结构包括定位槽,所述第四定位结构包括与所述定位槽配合的定位柱。The third positioning structure includes a positioning groove, and the fourth positioning structure includes a positioning column matched with the positioning groove.
  78. 根据权利要求73所述的承载装置,其特征在于,所述流体连接件与所述支撑面之间具有间隙。73. The carrier device of claim 73, wherein a gap is provided between the fluid connector and the support surface.
  79. 根据权利要求73所述的承载装置,其特征在于,所述支撑件为弹簧,使得所述流体连接件弹性地抵接在所述反应器上。The carrying device of claim 73, wherein the support member is a spring, so that the fluid connection member elastically abuts on the reactor.
  80. 根据权利要求73所述的承载装置,其特征在于,所述支撑件的数目为两个,两个所述支撑件对 称设置。The carrying device according to claim 73, wherein the number of the support members is two, and the two support members are arranged symmetrically.
  81. 根据权利要求47-80任一项所述的承载装置,其特征在于,所述承载装置还包括底座,所述底座用于容置多个所述基座,多个所述基座平行置于所述底座上,所述底座上设有调节结构,所述底座与所述基座通过所述调节结构连接,所述调节结构用于调节所述基座与所述底座之间的距离。The carrying device according to any one of claims 47-80, characterized in that, the carrying device further comprises a base, and the base is used for accommodating a plurality of the bases, and the plurality of the bases are placed in parallel On the base, an adjustment structure is provided on the base, the base and the base are connected by the adjustment structure, and the adjustment structure is used to adjust the distance between the base and the base.
  82. 根据权利要求81所述的承载装置,其特征在于,所述调节结构包括细调螺母,用于调节所述基座与所述底座之间的距离;The carrying device of claim 81, wherein the adjustment structure comprises a fine adjustment nut for adjusting the distance between the base and the base;
    一个所述基座与所述底座之间连接有多个所述细调螺母。A plurality of the fine adjustment nuts are connected between one of the bases and the base.
  83. 根据权利要求82所述的承载装置,其特征在于,所述调节结构还包括拉簧,一个所述基座与底座之间连接有多个所述拉簧。The carrying device according to claim 82, wherein the adjusting structure further comprises a tension spring, and a plurality of the tension springs are connected between one of the bases and the base.
  84. 根据权利要求81所述的承载装置,其特征在于,所述底座为中空结构,所述底座的顶部设有开口;The carrying device according to claim 81, wherein the base is a hollow structure, and the top of the base is provided with an opening;
    多个所述基座均设于所述底座的开口处。A plurality of the bases are disposed at the openings of the bases.
  85. 根据权利要求81所述的承载装置,其特征在于,所述承载装置还包括移动平台,所述移动平台位于所述底座下方,用于支撑和移动所述底座。The carrying device according to claim 81, characterized in that, the carrying device further comprises a moving platform, and the moving platform is located under the base for supporting and moving the base.
  86. 根据权利要求85所述的承载装置,其特征在于,所述移动平台包括台面主体、第一驱动机构和第二驱动机构,所述台面主体与所述底座相连;The carrying device according to claim 85, wherein the moving platform comprises a table main body, a first driving mechanism and a second driving mechanism, and the table main body is connected with the base;
    所述第一驱动机构驱动所述台面主体沿第一方向运动,所述第二驱动机构驱动所述台面主体沿第二方向运动,所述第一方向与所述第二方向垂直。The first driving mechanism drives the table main body to move in a first direction, and the second driving mechanism drives the table main body to move in a second direction, and the first direction is perpendicular to the second direction.
  87. 根据权利要求86所述的承载装置,其特征在于,所述第一驱动机构包括第一滑轨、第一滑座和第一电机,所述第一滑轨与所述第一方向平行设置,所述第一滑座安装在所述第一滑轨上并在所述第一电机的驱动下沿所述第一滑轨移动,所述台面主体与所述第一滑座相连。The carrying device according to claim 86, wherein the first driving mechanism comprises a first sliding rail, a first sliding seat and a first motor, and the first sliding rail is arranged parallel to the first direction, The first sliding seat is mounted on the first sliding rail and moves along the first sliding rail under the driving of the first motor, and the table main body is connected with the first sliding seat.
  88. 根据权利要求87所述的承载装置,其特征在于,所述第二驱动机构包括第二滑轨、第二滑座和第二电机,所述第二滑轨与所述第二方向平行设置,所述第二滑座安装在所述第二滑轨上并在所述第二电机的驱动下沿所述第二滑轨移动,所述第一滑轨设于所述第二滑座上。The carrying device according to claim 87, wherein the second driving mechanism comprises a second sliding rail, a second sliding seat and a second motor, the second sliding rail is arranged parallel to the second direction, The second sliding seat is mounted on the second sliding rail and moves along the second sliding rail under the driving of the second motor, and the first sliding rail is arranged on the second sliding seat.
  89. 根据权利要求88所述的承载装置,其特征在于,所述第二滑轨内设有导向件,所述导向件与所述第二方向平行;The carrying device according to claim 88, wherein a guide member is provided in the second slide rail, and the guide member is parallel to the second direction;
    所述第二滑座沿所述第二方向包括第一侧和与所述第一侧相对的第二侧,所述第二滑座的第一侧与所述第二滑座的第二侧中的一侧具有与所述导向件匹配的第三通孔,所述导向件穿过所述第三通孔延伸至所述第二滑座的外部。The second sliding seat includes a first side and a second side opposite to the first side along the second direction, the first side of the second sliding seat and the second side of the second sliding seat One side of the middle has a third through hole matched with the guide piece, and the guide piece extends through the third through hole to the outside of the second sliding seat.
PCT/CN2021/099329 2020-10-10 2021-06-10 Sequencing system and bearing apparatus WO2022073357A1 (en)

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CN202022251614.0 2020-10-10
CN202022246419.9U CN213924845U (en) 2020-10-10 2020-10-10 Bearing system and sequencing device
CN202022251614.0U CN213680707U (en) 2020-10-10 2020-10-10 Bearing system and sequencing device
CN202022251300.0U CN213570512U (en) 2020-10-10 2020-10-10 Bearing system and sequencing device
CN202022251300.0 2020-10-10
CN202022246419.9 2020-10-10
CN202110297328.4 2021-03-19
CN202110297328.4A CN115109694A (en) 2021-03-19 2021-03-19 Sequencing system and bearing device

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