WO2022071286A1 - Liquid-crystal composition, liquid-crystal display element production method, and liquid-crystal display element - Google Patents

Liquid-crystal composition, liquid-crystal display element production method, and liquid-crystal display element Download PDF

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WO2022071286A1
WO2022071286A1 PCT/JP2021/035557 JP2021035557W WO2022071286A1 WO 2022071286 A1 WO2022071286 A1 WO 2022071286A1 JP 2021035557 W JP2021035557 W JP 2021035557W WO 2022071286 A1 WO2022071286 A1 WO 2022071286A1
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liquid crystal
group
carbon atoms
crystal display
substrate
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正人 森内
尚宏 野田
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日産化学株式会社
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02Silicon compounds
    • C07F7/08Compounds having one or more C—Si linkages
    • C07F7/18Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F30/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F30/04Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F30/08Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/04Liquid crystal materials characterised by the chemical structure of the liquid crystal components, e.g. by a specific unit
    • C09K19/38Polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/54Additives having no specific mesophase characterised by their chemical composition
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K19/00Liquid crystal materials
    • C09K19/52Liquid crystal materials characterised by components which are not liquid crystals, e.g. additives with special physical aspect: solvents, solid particles
    • C09K19/54Additives having no specific mesophase characterised by their chemical composition
    • C09K19/56Aligning agents
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Definitions

  • the present invention is a method for manufacturing a liquid crystal display element, which can manufacture a weak anchoring film by an inexpensive method and a method not including a complicated process, and which applies a technique for stabilizing a liquid crystal layer with a polymer.
  • the present invention relates to a liquid crystal display element for realizing a further low voltage drive, a liquid crystal composition that can be used for them, and a radically polymerizable compound.
  • liquid crystal display elements have been widely used in mobile phones, computers, television displays, and the like.
  • Liquid crystal display elements have characteristics such as thinness, light weight, and low power consumption, and are expected to be applied to further contents such as VR (Virtual Reality) and ultra-high-definition displays in the future.
  • Various display modes such as TN (Twisted Nematic), IPS (In-Plane Switching), and VA (Vertical Indicator) have been proposed as display methods for liquid crystal displays, but the liquid crystal is oriented in a desired orientation in all modes.
  • a film (liquid crystal alignment film) that induces IPS is used.
  • the IPS mode which does not distort the display even when touched, is preferred.
  • Liquid crystal display elements using Field Switching and technologies using non-contact technology using optical orientation have come to be used.
  • FFS has a higher substrate manufacturing cost than IPS, and has a problem that a display defect peculiar to FFS mode called Vcom shift occurs.
  • photo-alignment compared to the rubbing method, there are merits that the size of the element that can be manufactured can be increased and the display characteristics can be greatly improved.
  • seizure due to insufficient alignment force, etc. can be mentioned.
  • liquid crystal display element makers and liquid crystal alignment film makers are making various efforts to solve these problems.
  • a liquid crystal alignment film having strong anchoring energy is used for the substrate on one side, and the substrate side provided with the electrode for generating a transverse electric field on one side has no liquid crystal alignment regulating force.
  • Patent Document 3 As a method for solving this, a method of weakly anchoring only on the pixel electrode has been proposed (see Patent Document 3). It has been reported that this makes it possible to achieve both improvement in brightness and response speed.
  • Japanese Patent No. 40553530 Japanese Unexamined Patent Publication No. 2013-231757 Japanese Unexamined Patent Publication No. 2017-21166
  • the response speed delay during driving is suppressed, while in order to make the weak anchoring state only on the electrode, different materials are used in very small areas. It is necessary to prepare difficult techniques such as painting separately, which may be a big issue for actual industrialization.
  • the present invention has been made to solve the above-mentioned problems, and in narrowing the cell gap, a weak anchoring transverse electric field liquid crystal display element can be stably manufactured without generating a pretilt angle, and a low drive voltage can be produced.
  • a method for manufacturing a liquid crystal display element that can manufacture a transverse electric field liquid crystal display element with a small decrease in VHR (voltage retention rate) even at high temperatures, and a method for manufacturing a liquid crystal display element, which can simultaneously realize the change in voltage and increase the response speed when the voltage is off. It is an object of the present invention to provide the liquid crystal display element, a liquid crystal composition that can be used for the liquid crystal display element, and a radically polymerizable compound.
  • a liquid crystal comprising a step of polymerizing the radically polymerizable compound in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the following formula (A) are in contact with a radical generating film.
  • Method of manufacturing display element M represents a radically polymerizable polymerizable group
  • R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms
  • the three Xs are independent of each other.
  • Y represents a single bond, -O-, -S-, or -NR-
  • R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
  • * represents a bond site.
  • R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.
  • [2] The method for producing a liquid crystal display element according to [1], wherein the aromatic hydrocarbon group which may have the substituent in the formula (B) is a phenyl group.
  • R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
  • R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
  • the radical-generating film is coated with a composition containing a compound having an organic group that generates a radical and a polymer, and cured to form a film, whereby the organic group that generates the radical is obtained.
  • the polymer containing an organic group that induces radical polymerization is selected from a polyimide precursor, a polyimide, a polyurea, and a polyamide obtained by using a diamine component containing a diamine containing an organic group that induces radical polymerization.
  • the organic group that induces radical polymerization is an organic group represented by the following formulas [X-1] to [X-18], [W], [Y], or [Z], [9]. The method for manufacturing a liquid crystal display element according to the above.
  • S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is.
  • S2R or NR when a part of the ⁇ CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.).
  • R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)
  • Ar is a group consisting of phenylene, naphthylene, and biphenylylene which may have an organic group and / or a halogen atom as a substituent.
  • R 9 and R 10 each independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and R 9 and R 10 are alkyl groups. In the case of, they may be bonded to each other at the ends to form a ring structure.
  • Q represents any of the following structures.
  • R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is indicated.
  • S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-.
  • R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.
  • the diamine containing an organic group that induces radical polymerization is a diamine having a structure represented by the following formula (6), the following formula (7), or the following formula (7'), [9] or [10]
  • R 6 is a single bond, -CH 2- , -O-, -COO-, -OCO-, -NHCO-, -CONH-, -NH-, -CH 2 O-, -N. Represents (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
  • R 8 represents a radical polymerization reactive group represented by a formula selected from the following formulas [X-1] to [X-18].
  • S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is.
  • S2R or NR when a part of the ⁇ CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.).
  • R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.))) (In equations (7) and (7'), T 1 and T 2 are independently single-bonded, -O-, -S-, -COO-, -OCO-, -NHCO-, -CONH-, respectively. -NH-, -CH 2 O-, -N (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
  • E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -COO-,-(CH 2 ) m- , -SO 2- , -O.
  • J is an organic group represented by a formula selected from the following formulas [W], [Y] and [Z].
  • R 9 and R 10 independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and Q is described below. Represents either structure.
  • R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond.
  • S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-.
  • R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.
  • q is independently 0 or 1
  • at least one q is 1
  • p represents an integer of 1 to 2.
  • a liquid crystal composition comprising a liquid crystal display and a radically polymerizable compound represented by the following formula (A).
  • M represents a radically polymerizable polymerizable group
  • R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms
  • the three Xs are independent of each other.
  • Y represents a single bond, -O-, -S-, or -NR-
  • R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
  • * represents a bond site.
  • R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.
  • the radically polymerizable compound in a state where the liquid crystal composition containing the liquid crystal and the radically polymerizable compound represented by the following formula (A) is in contact with the radically polymerized film of the first substrate having the radically generated film.
  • a liquid crystal display element characterized by having a polymerization reaction.
  • M represents a radically polymerizable polymerizable group
  • R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms
  • the three Xs are independent of each other.
  • a weak anchoring transverse electric field liquid crystal display element in narrowing the cell gap, can be stably manufactured without generating a pretilt angle, and at the same time, the drive voltage can be lowered and the response speed when the voltage is turned off can be increased at the same time.
  • a method for manufacturing a liquid crystal display element that can be realized and that can produce a transverse electric field liquid crystal display element with a small decrease in VHR even at high temperatures, the liquid crystal display element, a liquid crystal composition that can be used for them, and radical polymerizable. Compounds can be provided.
  • the present invention is an additive (with a specific structure) capable of suppressing the development of a pretilt angle due to the formation of a weak anchoring film and stably producing a highly reliable weak anchoring transverse electric field liquid crystal display element even in a narrow cell gap. It utilizes a radically polymerizable compound). For example, a step of preparing a cell having a liquid crystal composition containing a liquid crystal and a radically polymerizable compound having a specific structure between a first substrate having a radical generating film and a second substrate having a liquid crystal alignment film, and the above-mentioned step.
  • It is a method for manufacturing a weak anchoring transverse electric field liquid crystal display element which comprises a step of imparting sufficient energy to a cell to polymerize the radically polymerizable compound.
  • a method for producing a liquid crystal cell comprising a step of creating a cell and a step of filling a liquid crystal composition containing a liquid crystal and a radically polymerizable compound having a specific structure between the first substrate and the second substrate.
  • one substrate has an oriented radical generation film
  • the other substrate has a uniaxially oriented liquid crystal alignment film
  • one of the substrates has a comb tooth for driving the liquid crystal.
  • the "weak anchoring film” means that there is no force to regulate the orientation of liquid crystal molecules in the in-plane direction, or even if there is, it is weaker than the intramolecular force between liquid crystals.
  • the weak anchoring film is not limited to the solid film, but also includes a liquid film covering the solid surface.
  • a liquid crystal display element uses a film that regulates the orientation of liquid crystal molecules, that is, a liquid crystal alignment film in pairs to align the liquid crystal, but even when the weak anchoring film and the liquid crystal alignment film are used in pairs, the liquid crystal is oriented. Can be made to.
  • Horizontal orientation refers to a state in which the major axes of liquid crystal molecules are arranged substantially parallel to the liquid crystal alignment film surface, and inclined orientation of about several degrees is also included in the category of horizontal orientation.
  • the applicant of the present application comprises a step of imparting sufficient energy to polymerize the radically polymerizable compound in a state where the liquid crystal composition containing the liquid crystal and the radically polymerizable compound is in contact with the radical generating film.
  • a method for producing a zero-plane anchoring film is proposed (see claim 1 of International Publication No. 2019/004433). [0077] to [0086] of International Publication No. 2019/004433 exemplify the radically polymerizable compound used in the proposal.
  • the present inventors can stably manufacture a weak anchoring lateral electric field liquid crystal display element without generating a pretilt angle in a narrow cell gap, and can reduce the drive voltage and turn off the voltage.
  • the radically polymerizable compound having a specific structure is represented by the following formula (A).
  • M represents a radically polymerizable polymerizable group
  • R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms
  • the three Xs are independent of each other.
  • Y represents a single bond, -O-, -S-, or -NR-
  • R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
  • * represents a bond site.
  • R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.
  • a radically polymerizable compound is polymerized in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the formula (A) are in contact with the radical generating film.
  • the present inventors have stated that a weak anchoring film is obtained by changing the surface of the radical-generating film by the polymerization reaction of the radically polymerizable compound using the radical generated by the radical-generating film. I'm guessing.
  • a weak anchoring lateral electric field liquid crystal display element can be stably manufactured without generating a pretilt angle in a narrow cell gap, and the drive voltage can be lowered and the response speed when the voltage is turned off.
  • the voltage can be increased, and in addition, a lateral electric field liquid crystal display element with a small decrease in VHR even at a high temperature can be manufactured.
  • the present inventors consider how the radically polymerizable compound represented by the formula (A) contributes to this as follows.
  • the radically polymerizable compound M represented by the formula (A) contributes to the radical polymerization of the radically polymerizable compound.
  • the radically polymerizable compound represented by the formula (A) -SiR 2 R 3 R 4 contributes to the suppression of the generation of pretilt angle, the improvement of the response speed, and the high VHR at high temperature.
  • the inventors are speculating.
  • the narrow cell gap means a cell gap of 3.5 ⁇ m or less.
  • the radical-generating film-forming composition for forming a radical-generating film used in the present invention contains a polymer as a component and contains a group capable of generating radicals. At that time, the composition may contain a polymer to which a group capable of generating radicals is bonded, or a composition of a compound having a group capable of generating radicals and a polymer serving as a base resin. It may be a thing. By applying and curing such a composition to form a film, a radical generation film in which radical-generating groups are immobilized in the film can be obtained.
  • the group capable of generating radicals is preferably an organic group that induces radical polymerization.
  • Examples of such an organic group that induces radical polymerization include organic groups represented by the following formulas [X-1] to [X-18], [W], [Y], and [Z].
  • [X-1] to [X-18] * indicates a binding site
  • S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is.
  • R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.
  • Ar is a group consisting of phenylene, naphthylene, and biphenylylene which may have an organic group and / or a halogen atom as a substituent.
  • R 9 and R 10 each independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and R 9 and R 10 are alkyl groups. In the case of, they may be bonded to each other at the ends to form a ring structure.
  • Q represents any of the following structures.
  • R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is shown.).
  • S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-.
  • R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )
  • the polymer at least one polymer selected from the group consisting of a polyimide precursor, a polyimide, a polyurea, a polyamide, a polyacrylate, a polymethacrylate, and a polyorganosiloxane is preferable.
  • a methacrylic group is used as a monomer component.
  • a monomer having a photoreactive side chain containing at least one selected from an acrylic group, a vinyl group, an allyl group, a coumarin group, a styryl group and a cinnamoyl group, and a site that is decomposed by ultraviolet irradiation and generates a radical is a side chain. It is preferable to use the monomer contained in the above.
  • the monomer that generates radicals has a problem that it spontaneously polymerizes, and becomes an unstable compound. Therefore, it has a radical generation site in terms of ease of synthesis.
  • Polymers derived from diamines are preferred, and polyimide precursors such as polyamic acids and polyamic acid esters, polyimides, polyureas, polyamides and the like are more preferred.
  • the polymer containing an organic group that induces radical polymerization is at least one weight selected from a polyimide precursor, a polyimide, a polyurea, and a polyamide obtained by using a diamine component containing a diamine containing an organic group that induces radical polymerization. It is preferably coalesced.
  • the diamine containing an organic group that induces such radical polymerization is, specifically, for example, a diamine having a side chain that can generate radicals and can be polymerized, and has a structure represented by the following formula (6). Examples include, but are not limited to, having diamines.
  • R 6 is a single bond, -CH 2- , -O-, -COO-, -OCO-, -NHCO-, -CONH-, -NH-, -CH 2 O-, -N.
  • R 7 represents an alkylene group having 1 to 20 carbon atoms which is single-bonded, or unsubstituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independent of each other.
  • R 8 represents a radical polymerization reactive group represented by a formula selected from the following formulas [X-1] to [X-18].
  • [X-1] to [X-18] * indicates a binding site
  • S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is.
  • R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)
  • the bonding position of the two amino groups (-NH 2 ) in the formula (6) is not limited. Specifically, with respect to the bonding group of the side chain, 2,3 positions, 2,4 positions, 2,5 positions, 2,6 positions, 3,4 positions, 3, on the benzene ring. The position of 5 is mentioned. Of these, the 2,4 position, the 2,5 position, or the 3,5 position is preferable from the viewpoint of reactivity in synthesizing the polyamic acid. Considering the ease of synthesizing the diamine, the positions 2, 4 or 3, 5 are more preferable.
  • diamine having a photoreactive group including at least one selected from the group consisting of a methacryl group, an acrylic group, a vinyl group, an allyl group, a coumaryl group, a styryl group and a cinnamoyl group are as follows. Examples include, but are not limited to, compounds.
  • J 1 is a bonding group selected from a single bond, -O-, -COO-, -NHCO-, and -NH-
  • J 2 is a single bond, or unsubstituted or substituted with a fluorine atom. Represents an alkylene group having 1 to 20 carbon atoms.
  • diamines having a site that is decomposed by ultraviolet irradiation to generate radicals as a side chain have a structure represented by the following formula (7) or formula (7').
  • Diamines having, but are not limited to, may be mentioned.
  • T 1 and T 2 are independently single-bonded, -O-, -S-, -COO-, -OCO-, -NHCO-, -CONH-, respectively.
  • E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -COO-,-(CH 2 ) m- , -SO 2- , -O.
  • J is an organic group represented by a formula selected from the following formulas [W], [Y] and [Z].
  • R 9 and R 10 independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and Q is described below. Represents either structure.
  • R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond.
  • S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-.
  • R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.
  • equation (7') q is independently 0 or 1, at least one q is 1, and p represents an integer of 1 to 2.
  • the bonding position of the two amino groups (-NH 2 ) in the above formula (7) is not limited. Specifically, with respect to the bonding group of the side chain, 2,3 positions, 2,4 positions, 2,5 positions, 2,6 positions, 3,4 positions, 3, on the benzene ring. The position of 5 is mentioned. Of these, the 2,4 position, the 2,5 position, or the 3,5 position is preferable from the viewpoint of reactivity in synthesizing the polyamic acid.
  • n is an integer of 2 to 8.
  • the bonding position of the amino group (-NH 2 ) and the bonding group E on the benzene ring in the above formula (7') is not limited.
  • the para position is preferable from the viewpoint of availability of raw materials, orientation quality when used as a liquid crystal display element, and black brightness.
  • n is an integer of 2 to 8
  • E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -CONH-,-.
  • the above diamine can be used alone or in combination of two or more depending on the liquid crystal orientation when the radical generation film is formed, the sensitivity in the polymerization reaction, the voltage holding characteristic, the accumulated charge and the like.
  • the diamine containing an organic group that induces such radical polymerization it is preferable to use an amount of 5 to 50 mol% of the total diamine component used for synthesizing the polymer contained in the radical generation film forming composition. It is preferably 10 to 40 mol%, and particularly preferably 15 to 30 mol%.
  • the polymer used for the radical polymerization film of the present invention is obtained from a diamine
  • other diamines other than the diamine containing an organic group that induces the radical polymerization are used as the diamine component as long as the effect of the present invention is not impaired. Can be used together.
  • p-phenylenediamine 2,3,5,6-tetramethyl-p-phenylenediamine, 2,5-dimethyl-p-phenylenediamine, m-phenylenediamine, 2,4-dimethyl-m- Phenylene diamine, 2,5-diaminotoluene, 2,6-diaminotoluene, 2,5-diaminophenol, 2,4-diaminophenol, 3,5-diaminophenol, 3,5-diaminobenzyl alcohol, 2,4- Diaminobenzyl alcohol, 4,6-diaminoresorcinol, 4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 3 , 3'-Dihydroxy-4,4'-diaminobiphenyl, 3,3'-dicarboxy-4,4'
  • Alicyclic diamines 1,3-diaminopropane, 1,4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1, Aliphatic diamines such as 9-diaminononane, 1,10-diaminodecane, 1,11-diaminoundecane, 1,12-diaminododecane; 1,3-bis [2- (p-aminophenyl) ethyl] urea, 1, Diamine having a urea structure such as 3-bis [2- (p-aminophenyl) ethyl] -1-tert-butoxycarbonyl urea; Np-aminophenyl-4-p-aminophenyl (tert-butoxycarbonyl) amino Diamine having a nitrogen-containing unsaturated
  • the above other diamines may be used alone or in combination of two or more depending on the liquid crystal orientation when the radical generation film is formed, the sensitivity in the polymerization reaction, the voltage holding characteristics, the accumulated charge and the like. ..
  • the tetracarboxylic dianhydride that reacts with the above diamine component in the synthesis when the polymer is a polyamic acid is not particularly limited. Specifically, pyromellitic acid, 2,3,6,7-naphthalenetetracarboxylic acid, 1,2,5,6-naphthalenetetracarboxylic acid, 1,4,5,8-naphthalenetetracarboxylic acid, 2, 3,6,7-Anthracenetetracarboxylic acid, 1,2,5,6-anthracenetetracarboxylic acid, 3,3', 4,4'-biphenyltetracarboxylic acid, 2,3,3', 4'-biphenyl Tetracarboxylic acid, bis (3,4-dicarboxyphenyl) ether, 3,3', 4,4'-benzophenone tetracarboxylic acid, bis (3,4-dicarboxyphenyl) sulfone, bis (3,4-dicarboxyphenyl
  • one or two or more types of tetracarboxylic dianhydride may be used in combination depending on the liquid crystal orientation when the radical generating film is formed, the sensitivity in the polymerization reaction, the voltage holding property, the accumulated charge, and the like. ..
  • the structure of the tetracarboxylic acid dialkyl ester to be reacted with the above diamine component in the synthesis when the polymer is a polyamic acid ester is not particularly limited, but specific examples thereof are given below.
  • aliphatic tetracarboxylic acid diester examples include 1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1,2-dimethyl-1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1.
  • aromatic tetracarboxylic acid dialkyl ester examples include pyromellitic acid dialkyl ester, 3,3', 4,4'-biphenyltetracarboxylic acid dialkyl ester, 2,2', 3,3'-biphenyltetracarboxylic acid dialkyl ester, and the like.
  • the diisocyanate to be reacted with the above diamine component is not particularly limited and can be used depending on availability and the like.
  • the specific structure of the diisocyanate is shown below.
  • R 2 and R 3 represent an aliphatic hydrocarbon group having 1 to 10 carbon atoms.
  • K-1 to K-5 are inferior in reactivity but have the advantage of improving solvent solubility
  • aromatic diisocyanates shown in K-6 to K-13 are highly reactive and heat resistant.
  • K-1, K-7, K-8, K-9, and K-10 are preferable in terms of versatility and characteristics
  • K-12 is preferable from the viewpoint of electrical characteristics
  • K-13 is preferable from the viewpoint of liquid crystal orientation.
  • Two or more kinds of diisocyanates can be used in combination, and it is preferable to apply various diisocyanates according to the desired characteristics.
  • diisocyanates can be replaced with the tetracarboxylic acid dianhydride described above, and they may be used in the form of a copolymer of polyamic acid and polyurea. It may be used in the form of a copolymer.
  • the structure of the dicarboxylic acid to be reacted in the synthesis when the polymer is polyamide is not particularly limited, but specific examples are as follows.
  • the aliphatic dicarboxylic acid include malonic acid, oxalic acid, dimethylmalonic acid, succinic acid, fumaric acid, glutaric acid, adipic acid, muconic acid, 2-methyladipic acid, trimethyladipic acid, pimelic acid, and 2,2-dimethylglutal.
  • dicarboxylic acids such as acids, 3,3-diethylsuccinic acid, adipic acid, sebacic acid and suberic acid.
  • Examples of the alicyclic dicarboxylic acid include 1,1-cyclopropanedicarboxylic acid, 1,2-cyclopropanedicarboxylic acid, 1,1-cyclobutanedicarboxylic acid, 1,2-cyclobutanedicarboxylic acid, and 1,3-cyclobutanedicarboxylic acid.
  • aromatic dicarboxylic acids examples include o-phthalic acid, isophthalic acid, terephthalic acid, 5-methylisophthalic acid, 5-tert-butylisophthalic acid, 5-aminoisophthalic acid, 5-hydroxyisophthalic acid, and 2,5-dimethylterephthalic acid.
  • dicarboxylic acid containing a heterocycle examples include 1,5- (9-oxofluorene) dicarboxylic acid, 3,4-furandicarboxylic acid, 4,5-thiazoledicarboxylic acid, 2-phenyl-4,5-thiazoledicarboxylic acid, and the like.
  • 1,2,5-Thiadiazol-3,4-dicarboxylic acid 1,2,5-oxadiazole-3,4-dicarboxylic acid, 2,3-pyridinedicarboxylic acid, 2,4-pyridinedicarboxylic acid, 2, Examples thereof include 5-pyridinedicarboxylic acid, 2,6-pyridinedicarboxylic acid, 3,4-pyridinedicarboxylic acid, and 3,5-pyridinedicarboxylic acid.
  • various dicarboxylic acids may have an acid dihalide or an anhydrous structure. It is particularly preferable that these dicarboxylic acids are dicarboxylic acids capable of giving a polyamide having a linear structure from the viewpoint of maintaining the orientation of the liquid crystal molecules.
  • terephthalic acid isoterephthalic acid, 1,4-cyclohexanedicarboxylic acid, 4,4'-biphenyldicarboxylic acid, 4,4'-diphenylmethanedicarboxylic acid, 4,4'-diphenylethanedicarboxylic acid, 4,4 '-Diphenylpropandicarboxylic acid, 4,4'-diphenylhexafluoropropanedicarboxylic acid, 2,2-bis (phenyl) propandicarboxylic acid, 4,4-terphenyldicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 2, 5-Ppyridinedicarboxylic acid or acid dihalide thereof and the like are preferably used. Some of these compounds have isomers, but they may be mixtures containing them. Further, two or more kinds of compounds may be used in combination.
  • the dicarboxylic acids used in the present invention are not limited to the above-mentioned
  • tetracarboxylic acid diester tetracarboxylic acid diester
  • diamine component raw material diamine
  • tetracarboxylic acid dianhydride component raw material tetracarboxylic acid diester
  • diisocyanate and dicarboxylic acid tetracarboxylic acid diester
  • a diamine component is a method of reacting a diamine component with one or more components selected from a tetracarboxylic dianhydride component, a tetracarboxylic acid diester, a diisocyanate and a dicarboxylic acid in an organic solvent.
  • the reaction between the diamine component and the tetracarboxylic dianhydride component is advantageous in that it proceeds relatively easily in an organic solvent and no by-products are generated.
  • the organic solvent used in the above reaction is not particularly limited as long as it dissolves the produced polymer. Further, even if the organic solvent does not dissolve the polymer, it may be mixed with the above solvent and used as long as the produced polymer does not precipitate. Since the water content in the organic solvent inhibits the polymerization reaction and further causes the produced polymer to be hydrolyzed, it is preferable to use a dehydrated and dried organic solvent.
  • organic solvent examples include N, N-dimethylformamide, N, N-dimethylacetamide, N, N-diethylformamide, N-methylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, 2 -Pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 3-methoxy-N, N-dimethylpropanamide, N-methylcaprolactam, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, ⁇ -Butyrolactone, isopropyl alcohol, methoxymethylpentanol, dipentene, ethylamyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cell solve, ethyl cell solve, methyl cello
  • the solution in which the diamine component is dispersed or dissolved in the organic solvent is stirred, and the tetracarboxylic acid dianhydride component is used as it is or is organic.
  • a method of adding a tetracarboxylic acid dianhydride component dispersed or dissolved in a solvent conversely a method of adding a diamine component to a solution in which a tetracarboxylic acid dianhydride component is dispersed or dissolved in an organic solvent, a method of adding a tetracarboxylic acid dianhydride component and a diamine component.
  • Examples thereof include a method of adding alternately, and any of these methods may be used.
  • the diamine component or the tetracarboxylic dianhydride component is composed of a plurality of types of compounds, they may be reacted in a premixed state, may be reacted individually in sequence, or may be reacted individually, and have a low molecular weight.
  • the bodies may be mixed and reacted to form a high molecular weight compound.
  • the temperature at which the diamine component and the tetracarboxylic dianhydride component are reacted can be selected from any temperature, and is, for example, in the range of -20 to 100 ° C, preferably -5 to 80 ° C.
  • the reaction can be carried out at any concentration, for example, the total amount of the diamine component and the tetracarboxylic dianhydride component is 1 to 50% by mass, preferably 5 to 30% by mass with respect to the reaction solution. ..
  • the ratio of the total number of moles of the tetracarboxylic acid dianhydride component to the total number of moles of the diamine component in the above polymerization reaction can be arbitrarily selected according to the molecular weight of the polyamic acid to be obtained. Similar to a normal polycondensation reaction, the closer the molar ratio is to 1.0, the larger the molecular weight of the polyamic acid produced. The preferred range is 0.8 to 1.2.
  • the method for synthesizing the polymer used in the present invention is not limited to the above-mentioned method, and when synthesizing a polyamic acid, the above-mentioned tetracarboxylic acid dianhydride is used in the same manner as a general method for synthesizing a polyamic acid.
  • a tetracarboxylic acid having a corresponding structure or a tetracarboxylic acid derivative such as a tetracarboxylic acid dihalide can be used and reacted by a known method to obtain the corresponding polyamic acid.
  • diamine and diisocyanate may be reacted.
  • a diamine and a component selected from a tetracarboxylic acid diester and a dicarboxylic acid are induced into an acid halide in the presence of a known condensing agent or by a known method. , Diamine may be reacted.
  • polyimide can be obtained by ring-closing (imidizing) the polyamic acid.
  • the imidization rate as used herein is the ratio of the imide group to the total amount of the imide group and the carboxy group derived from the tetracarboxylic acid dianhydride.
  • the imidization ratio does not necessarily have to be 100%, and can be arbitrarily adjusted according to the application and purpose.
  • the imidization ratio of the polyimide in the present invention is preferably 30% or more because the voltage retention rate can be increased, and on the other hand, from the viewpoint of whitening characteristics, that is, from the viewpoint of suppressing the precipitation of the polymer in the varnish, 80 % Or less is preferable.
  • the temperature at which the polyamic acid is thermally imidized in the solution is usually 100 to 400 ° C, preferably 120 to 250 ° C, and it is preferable to remove the water generated by the imidization reaction from the outside of the system.
  • the catalytic imidization of the polyamic acid can be carried out by adding a basic catalyst and an acid anhydride to the solution of the polyamic acid and stirring at -20 to 250 ° C, preferably 0 to 180 ° C.
  • the amount of the basic catalyst is usually 0.5 to 30 mol times, preferably 2 to 20 mol times the amount of the amic acid group
  • the amount of acid anhydride is usually 1 to 50 mol times, preferably 1 to 50 mol times the amic acid group. It is 3 to 30 mol times.
  • Examples of the basic catalyst include pyridine, triethylamine, trimethylamine, tributylamine, trioctylamine and the like, and among them, pyridine is preferable because it has an appropriate basicity for advancing the reaction.
  • Examples of the acid anhydride include acetic anhydride, trimellitic anhydride, pyromellitic anhydride and the like, and among them, acetic anhydride is preferable because it facilitates purification after the reaction is completed.
  • the imidization rate by catalytic imidization can be controlled by adjusting the amount of catalyst, the reaction temperature, the reaction time, and the like.
  • the reaction solution When recovering the produced polymer from the reaction solution of the polymer, the reaction solution may be put into a poor solvent and precipitated.
  • the poor solvent used for precipitate formation include methanol, acetone, hexane, butyl cellsolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, water and the like.
  • the polymer put into a poor solvent and precipitated can be collected by filtration and then dried at room temperature or by heating under normal pressure or reduced pressure.
  • impurities in the polymer can be reduced.
  • the poor solvent at this time include alcohols, ketones, hydrocarbons, and the like, and it is preferable to use three or more kinds of poor solvents selected from these because the efficiency of purification is further improved.
  • the radical generation film-forming composition used in the present invention is other than a polymer containing an organic group that induces radical polymerization. It may contain other polymers. At that time, the content of the other polymer in all the components of the polymer is preferably 5 to 95% by mass, more preferably 30 to 70% by mass.
  • the molecular weight of the polymer contained in the radical generation film forming composition is GPC (GPC) when the strength of the radical generation film obtained by applying the radical generation film, the workability at the time of forming the coating film, the uniformity of the coating film, etc. are taken into consideration.
  • the weight average molecular weight measured by the Gel Permeation Chromatography method is preferably 5,000 to 1,000,000, more preferably 10,000 to 150,000.
  • At least one polymer obtained by using the diamine component in which the diamine to be used is 0 mol% of the total diamine component used for synthesizing the polymer contained in the radical generation film forming composition may be used.
  • Examples of the compound having a group that generates a radical to be added at that time include the following.
  • the compound that generates radicals by heat is a compound that generates radicals by heating to a temperature higher than the decomposition temperature.
  • radical thermal polymerization initiators include ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), and hydroperoxides (peroxidation).
  • the compound that generates radicals with light is not particularly limited as long as it is a compound that initiates radical polymerization by light irradiation.
  • radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis (diethylamino) benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone and 2-hydroxy.
  • the radical generation film is made of a polymer containing an organic group that induces radical polymerization
  • the group that generates the above radical is used for the purpose of promoting radical polymerization when energy is applied.
  • the compound may be contained.
  • the radical generating film forming composition can contain a polymer component, and if necessary, an organic solvent that dissolves or disperses a radical generating agent or other contained components.
  • an organic solvent is not particularly limited, and examples thereof include organic solvents as exemplified in the above-mentioned synthesis of polyamic acid.
  • N-methyl-2-pyrrolidone, ⁇ -butyrolactone, N-ethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 3-methoxy-N, N-dimethylpropanamide and the like are soluble. It is preferable from the viewpoint of.
  • N-methyl-2-pyrrolidone or N-ethyl-2-pyrrolidone is preferable, but two or more kinds of mixed solvents may be used.
  • a solvent that improves the uniformity and smoothness of the coating film by mixing it with an organic solvent having high solubility of the components contained in the radical generation film forming composition.
  • Examples of the solvent for improving the uniformity and smoothness of the coating material include isopropyl alcohol, methoxymethylpentanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve (ethylene glycol monobutyl ether), methyl cellosolve acetate, butyl cellosolve acetate, and ethyl cellosolve acetate.
  • the radical generation film forming composition may contain components other than the above. Examples thereof include compounds that improve the film thickness uniformity and surface smoothness when the radical generation film forming composition is applied, compounds that improve the adhesion between the radical generation film forming composition and the substrate, and radical generation film formation. Examples thereof include compounds that further improve the film strength of the composition.
  • Examples of the compound that improves the uniformity of the film thickness and the surface smoothness include a fluorine-based surfactant, a silicone-based surfactant, and a nonion-based surfactant. More specifically, for example, Ftop EF301, EF303, EF352 (manufactured by Mitsubishi Materials Electronics Chemical Co., Ltd.), Megafuck F171, F173, R-30 (manufactured by DIC), Florard FC430, FC431 (manufactured by 3M), Asahi. Examples thereof include Guard AG710 (manufactured by AGC), Surflon S-382, SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Seimi Chemical). When these surfactants are used, the ratio of their use is preferably 0.01 to 2 parts by mass, more preferably 0, with respect to 100 parts by mass of the total amount of the polymer contained in the radical generation film forming composition. It is 0.01 to 1 part by mass.
  • the compound that improves the adhesion between the radical generation film forming composition and the substrate include a functional silane-containing compound and an epoxy group-containing compound.
  • a functional silane-containing compound and an epoxy group-containing compound For example, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-aminopropyltrimethoxysilane, 2-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane.
  • a phenol compound such as 2,2'-bis (4-hydroxy-3,5-dihydroxymethylphenyl) propane or tetra (methoxymethyl) bisphenol is added. May be good.
  • the amount is preferably 0.1 to 30 parts by mass, more preferably 1 to 20 parts by mass with respect to 100 parts by mass of the total amount of the polymer contained in the radical generation film forming composition. Is.
  • the radical generating film forming composition includes a dielectric or a conductive material for changing the electrical properties such as the dielectric constant and the conductivity of the radical generating film as long as the effect of the present invention is not impaired. Substances may be added.
  • the radical generation film of the present invention can be obtained, for example, by using the above-mentioned radical generation film forming composition.
  • a cured film obtained by applying the radical generation film forming composition used in the present invention to a substrate and then drying and firing it can be used as it is as a radical generation film.
  • this cured film can be subjected to alignment processing by rubbing, polarization, light of a specific wavelength, or the like, and by processing an ion beam or the like, and UV (ultraviolet rays) are applied to the liquid crystal display element after filling the liquid crystal as a PSA alignment film. ) Is also possible.
  • the substrate on which the radical generation film forming composition is applied is not particularly limited as long as it is a highly transparent substrate, but a substrate on which a transparent electrode for driving a liquid crystal display is formed is preferable.
  • glass plates polycarbonate, poly (meth) acrylate, polyethersulfone, polyarylate, polyurethane, polysulfone, polyether, polyetherketone, trimethylpentene, polyolefin, polyethylene terephthalate, (meth) acrylonitrile, and tri.
  • a substrate in which a transparent electrode is formed on a plastic plate such as acetyl cellulose, diacetyl cellulose, acetate butylate cellulose or the like.
  • electrode patterns such as standard IPS comb tooth electrodes and PSA fishbone electrodes and protrusion patterns such as MVA can also be used.
  • an element such as a transistor is used between an electrode for driving a liquid crystal display and a substrate.
  • a transmissive liquid crystal display element When a transmissive liquid crystal display element is intended, it is common to use a substrate as described above, but when a reflective liquid crystal display element is intended, silicon is used only on one side of the substrate. An opaque substrate such as a wafer can also be used. At that time, a material such as aluminum that reflects light can be used for the electrodes formed on the substrate.
  • Examples of the method for applying the radical-generating film-forming composition include a spin coating method, a printing method, an inkjet method, a spray method, a roll coating method, and the like, but the transfer printing method is widely used industrially from the viewpoint of productivity. It is also suitably used in the present invention.
  • the step of drying after applying the radical generation film forming composition is not always necessary, but if the time from application to firing is not constant for each substrate or if it is not fired immediately after coating, it is dried. It is preferable to include the process.
  • the drying is not particularly limited as long as the solvent is removed to the extent that the shape of the coating film is not deformed by transporting the substrate or the like, and the drying means thereof is not particularly limited.
  • a method of drying on a hot plate having a temperature of 40 to 150 ° C., preferably 60 to 100 ° C. for 0.5 to 30 minutes, preferably 1 to 5 minutes can be mentioned.
  • the coating film formed by applying the radical generation film forming composition by the above method can be fired to form a cured film.
  • the firing temperature can be usually any temperature of 100 to 350 ° C., but is preferably 140 to 300 ° C., more preferably 150 to 230 ° C., and further preferably 160 to 220 ° C.
  • the firing time is usually any time of 5 to 240 minutes. It is preferably 10 to 90 minutes, more preferably 20 to 90 minutes.
  • a generally known method for example, a hot plate, a hot air circulation oven, an IR (infrared) type oven, a belt furnace, or the like can be used.
  • the thickness of this cured film can be selected as needed, but preferably 5 nm or more, more preferably 10 nm or more, because the reliability of the liquid crystal display element is improved. Further, when the thickness of the cured film is preferably 300 nm or less, more preferably 150 nm or less, the power consumption of the liquid crystal display element does not become extremely large, which is preferable.
  • the radical generating film can be subjected to uniaxial orientation treatment.
  • the method for performing the uniaxial alignment treatment include a photoalignment method, an orthorhombic vapor deposition method, rubbing, and a uniaxial alignment treatment using a magnetic field.
  • the substrate is moved so that the rubbing cloth and the film come into contact with each other while rotating the rubbing roller around which the rubbing cloth is wound.
  • the alignment process can be performed by irradiating the entire surface of the film with polarized UV having a specific wavelength and heating the film as necessary.
  • the direction is selected by the electrical properties of the liquid crystal, but when a liquid crystal having positive dielectric anisotropy is used, the rubbing direction is the comb tooth electrode. It is preferable that the direction is substantially the same as the extending direction of.
  • a step of creating a weak anchoring part and a strong anchoring part there is a method of irradiating radiation with an arbitrary pattern via a photomask or the like.
  • the radiation used in this step include polarized light or light having a specific wavelength, an ion beam, and the like. It is particularly preferable to irradiate light having a wavelength having the highest absorbance at the portion corresponding to the photoradical generation site.
  • the second substrate of the present invention may or may not have a radical generation film.
  • the second substrate is preferably a substrate having a conventionally known liquid crystal alignment film.
  • the first substrate may be a substrate having a comb tooth electrode
  • the second substrate may be a facing substrate
  • the second substrate may be a substrate having a comb tooth electrode
  • the first substrate may be a facing substrate.
  • the liquid crystal cell of the present invention comprises a substrate having the radical generating film (first substrate) and a substrate having a known liquid crystal alignment film (second substrate) after forming a radical generating film on the substrate by the above method. Is obtained by arranging the radical generating film and the liquid crystal alignment film so as to face each other, sandwiching a spacer, fixing with a sealing agent, and injecting and sealing a liquid crystal composition containing a liquid crystal and a radically polymerizable compound. Be done. At that time, the size of the spacer used is usually 1 to 30 ⁇ m, but preferably 2 to 10 ⁇ m.
  • the method of injecting a liquid crystal composition containing a liquid crystal and a radically polymerizable compound is not particularly limited, and a vacuum method of injecting a mixture containing the liquid crystal and the polymerizable compound after depressurizing the inside of the produced liquid crystal cell, polymerization with the liquid crystal.
  • a dropping method in which a mixture containing a sex compound is dropped and then sealed.
  • the radically polymerizable compound of the present invention is represented by the following formula (A).
  • M represents a radically polymerizable polymerizable group
  • R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms
  • the three Xs are independent of each other.
  • Y represents a single bond, -O-, -S-, or -NR-
  • R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms
  • * represents a bond site.
  • R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.
  • the aliphatic hydrocarbon group in R1 has 1 to 10 carbon atoms, may have 1 to 8 carbon atoms, may have 1 to 6 carbon atoms, and may have 1 to 4 carbon atoms. May be good.
  • the alkyl group having 1 to 6 carbon atoms in R 2 , R 3 and R 4 may be, for example, an alkyl group having 1 to 5 carbon atoms or an alkyl group having 1 to 4 carbon atoms. good. These alkyl groups may have a linear structure or a branched structure.
  • the aromatic hydrocarbon groups in R 2 , R 3 and R 4 may be unsubstituted or the hydrogen atom may be substituted with a substituent.
  • substituent of the aromatic hydrocarbon group which may have a substituent include a halogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and a halogen having 1 to 4 carbon atoms. Examples thereof include an alkylated group and an alkoxy halide group having 1 to 4 carbon atoms.
  • the halogenation in the alkyl halide group and the halogenated alkoxy group may be total halogenation or partial halogenation.
  • halogen atom examples include a fluorine atom and a chlorine atom.
  • aromatic hydrocarbon group in the aromatic hydrocarbon group which may have a substituent examples include a phenyl group and a naphthyl group. The number of substituents in the aromatic hydrocarbon group is not particularly limited.
  • the number of groups represented by the formula (B) is one or more, and may be one, two, or three. May be.
  • the three Xs are independent of each other. Therefore, in the radically polymerizable compound represented by the formula (A), when there are two or more groups represented by the formula (B), the groups represented by the two or more formulas (B) have the same structure. It may be present or may have a different structure.
  • R 2 , R 3 , and R 4 may be an aromatic hydrocarbon group which may have a substituent. Therefore, in the formula (B), one of R 2 , R 3 , and R 4 may be an aromatic hydrocarbon group which may have a substituent, or R 2 , R 3 , and R 4 . Two may be aromatic hydrocarbon groups which may have a substituent, and three of R 2 , R 3 and R 4 may be an aromatic hydrocarbon group which may have a substituent. There may be.
  • the radically polymerizable polymerizable group M of the radically polymerizable compound is preferably a polymerizable group selected from the following structures.
  • * indicates a binding site.
  • R b represents a linear alkyl group having 2 to 8 carbon atoms
  • E represents a single bond, -O-, -NR c- , -S-, an ester bond and an amide bond.
  • R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms;
  • R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
  • Examples of the radically polymerizable compound represented by the formula (A) include radically polymerizable compounds satisfying the following (1) to (3).
  • M represents the following structure (C) or structure (D)
  • R 1 represents an aliphatic hydrocarbon group having a linear or branched structure having 1 to 10 carbon atoms.
  • Each X independently represents a hydrogen atom or formula (B). However, at least one of the three Xs represents equation (B).
  • R2 , R3 , and R4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.
  • R 2 , R 3 and R 4 represents an aromatic hydrocarbon group which may have a substituent.
  • Examples of the radically polymerizable compound contained in the formula (A) include the following radically polymerizable compounds.
  • the liquid crystal composition contains at least the liquid crystal and the radically polymerizable compound.
  • the content of the radically polymerizable compound in the liquid crystal composition is preferably 0.5% by mass or more, more preferably 1% by mass or more, and preferably 1% by mass or more, based on the total mass of the liquid crystal and the radically polymerizable compound. It is 10% by mass or less, more preferably 5% by mass or less.
  • a plurality of compounds having other monofunctional radically polymerizable groups (hereinafter, may be referred to as “other radically polymerizable compounds”) are used in combination. May be.
  • radically polymerizable compounds have unsaturated bonds capable of performing radical polymerization in the presence of organic radicals, and are, for example, tert-butyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, nonyl methacrylate, lauryl.
  • Methacrylate monomers such as methacrylate, n-octyl methacrylate; acrylate monomers such as tert-butyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, nonyl acrylate, lauryl acrylate, n-octyl acrylate; styrene, styrene derivatives (eg, o- , M-, p-methoxystyrene, o-, m-, p-tert-butoxystyrene, o-, m-, p-chloromethylstyrene, etc.), vinyl esters (eg, vinyl acetate, vinyl propionate, benzoate) Vinyl acid acid, etc.), vinyl ketones (eg, vinyl methyl ketone, vinyl hexyl ketone, methyl isopropenyl ketone, etc.), N-vinyl compounds (eg,
  • Ra and R b each independently represent a linear alkyl group having 2 to 8 carbon atoms, and E is a single bond, —O—, —NR c ⁇ , —S—, an ester bond, And a bonding group selected from an amide bond.
  • R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • At least one of the radically polymerizable compounds contained in the liquid crystal composition has a compound having a polymerizable unsaturated bond in one molecule, which is compatible with the liquid crystal, that is, a monofunctional radically polymerizable group. It is preferably a compound.
  • Those are preferable from the viewpoints of ease of synthesis, compatibility with liquid crystal, and polymerization reactivity, and specifically, compounds represented by the following structures are preferable, but are not particularly limited.
  • the liquid crystal composition contains a radically polymerizable compound in which the Tg of the polymer obtained by polymerizing the radically polymerizable compound is 100 ° C. or lower.
  • the polymer obtained by polymerizing a radically polymerizable compound preferably has a Tg of 100 ° C. or lower, more preferably 0 ° C. or lower.
  • the liquid crystal generally refers to a substance exhibiting both solid and liquid properties, and typical liquid crystal phases include nematic liquid crystal and smectic liquid crystal, but the liquid crystal that can be used in the present invention is not particularly limited.
  • One example is 4-pentyl-4'-cyanobiphenyl.
  • the liquid crystal cell into which the mixture (liquid crystal composition) containing the liquid crystal and the radically polymerizable compound is introduced to carry out the polymerization reaction of the radically polymerizable compound.
  • This can be done, for example, by applying heat or UV irradiation, and the radically polymerizable compound is polymerized in situ to exhibit the desired properties.
  • UV irradiation is preferable because it enables oriented patterning and allows the polymerization reaction to occur in a shorter time.
  • heating may be performed during UV irradiation.
  • the heating temperature at the time of UV irradiation is preferably in a temperature range in which the introduced liquid crystal exhibits liquid crystal properties, is usually 40 ° C. or higher, and is preferably heated at a temperature lower than a temperature at which the liquid crystal changes to an isotropic phase.
  • the UV irradiation wavelength in the case of UV irradiation, it is preferable to select the wavelength having the best reaction quantum yield of the reactive polymerizable compound, and the UV irradiation amount is usually 0.01 to 30 J / cm 2 . However, preferably, it is 10 J / cm 2 or less, and the smaller the UV irradiation amount, the more the reliability deterioration due to the destruction of the members constituting the liquid crystal display can be suppressed, and the UV irradiation time can be reduced, so that the manufacturing process can be performed. It is suitable because it improves tact.
  • the heating in the case of polymerizing only by heating instead of UV irradiation is performed in a temperature range in which the temperature at which the polymerizable compound reacts and is lower than the decomposition temperature of the liquid crystal display. Specifically, it is 100 to 150 ° C.
  • a liquid crystal display element can be manufactured using the liquid crystal cell thus obtained.
  • the liquid crystal display element has, for example, a first substrate, a second substrate arranged to face the first substrate, and a liquid crystal filled between the first substrate and the second substrate. Then, the liquid crystal display element is subjected to radical polymerization in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the formula (A) are brought into contact with the radical generating film of the first substrate having the radical generating film. It is made by polymerizing a sex compound.
  • the liquid crystal display element can be made into a reflective liquid crystal display element by, for example, providing a reflective electrode, a transparent electrode, a ⁇ / 4 plate, a polarizing film, a color filter layer, or the like in the liquid crystal cell according to a conventional method. Further, a transmissive liquid crystal display element can be obtained by providing the liquid crystal cell with a backlight, a polarizing plate, a ⁇ / 4 plate, a transparent electrode, a polarizing film, a color filter layer and the like according to a conventional method, if necessary.
  • FIG. 1 is a schematic cross-sectional view showing an example of a transverse electric field liquid crystal display element of the present invention, and is an example of an IPS mode liquid crystal display element.
  • the liquid crystal 3 is sandwiched between the comb tooth electrode substrate 2 provided with the liquid crystal alignment film 2c and the opposed substrate 4 provided with the liquid crystal alignment film 4a.
  • the comb tooth electrode substrate 2 is formed on the base material 2a and the base material 2a, and is formed so as to cover the plurality of linear electrodes 2b arranged in a comb tooth shape and the linear electrodes 2b on the base material 2a. It also has a liquid crystal alignment film 2c.
  • the facing substrate 4 has a base material 4b and a liquid crystal alignment film 4a formed on the base material 4b.
  • the liquid crystal alignment film 2c is, for example, a weak anchoring film obtained by chemically changing a radical generation film.
  • the liquid crystal alignment film on the comb-shaped electrode substrate side is obtained, for example, by polymerizing a radically polymerizable compound in a state where a liquid crystal composition containing a liquid crystal and a radically polymerizable compound is in contact with a radical generating film.
  • a voltage is applied to the linear electrodes 2b, an electric field is generated between the linear electrodes 2b as shown by the electric lines of force L.
  • FIG. 2 is a schematic cross-sectional view showing another example of the transverse electric field liquid crystal display element of the present invention, and is an example of an FFS mode liquid crystal display element.
  • the liquid crystal 3 is sandwiched between the comb tooth electrode substrate 2 provided with the liquid crystal alignment film 2h and the opposed substrate 4 provided with the liquid crystal alignment film 4a.
  • the comb tooth electrode substrate 2 is formed on the base material 2d, the surface electrode 2e formed on the base material 2d, the insulating film 2f formed on the surface electrode 2e, and the insulating film 2f, and has a comb tooth shape.
  • the facing substrate 4 has a base material 4b and a liquid crystal alignment film 4a formed on the base material 4b.
  • the liquid crystal alignment film 2h is, for example, a weak anchoring film obtained by chemically changing a radical generating film.
  • the liquid crystal alignment film on the comb-shaped electrode substrate side is obtained, for example, by polymerizing a radically polymerizable compound in a state where a liquid crystal composition containing a liquid crystal and a radically polymerizable compound is in contact with a radical generating film.
  • the lateral electric field liquid crystal display element 1 when a voltage is applied to the surface electrode 2e and the linear electrode 2g, an electric field is generated between the surface electrode 2e and the linear electrode 2g as shown by the electric lines of force L.
  • TC-1 to TC-3 Compounds represented by the following formulas (TC-1) to (TC-3), respectively.
  • Add-1 to Add-11 Compounds represented by the following formulas (Add-1) to (Add-11), respectively.
  • Addd-C1 to Add-C3 The following formulas (Add-C1) to (Add-C3, respectively).
  • AD-1 Compound represented by the following formula (AD-1)
  • N N-dimethylformamide (as an additive, lithium bromide monohydrate (LiBr ⁇ H 2 O) is 30 mmol / L (liter), phosphoric acid / anhydrous crystal (o-phosphoric acid) is 30 mmol / L, tetrahydrofuran (THF) is 10 mL / L)
  • Flow rate 1.0 mL / min Standard sample for preparing a calibration curve: TSK standard polyethylene oxide (molecular weight; about 900,000, 150,000, 100,000 and 30,000) (Tosoh) and polyethylene glycol (molecular weight; about) 12,000, 4,000 and 1,000) (manufactured by Polymer Laboratory).
  • FT-NMR Fourier transform type superconducting nuclear magnetic resonance apparatus
  • the chemical imidization rate is determined by using a proton derived from a structure that does not change before and after imidization as a reference proton, and the peak integrated value of this proton and the proton derived from the NH group of the amic acid appearing in the vicinity of 9.5 to 10.0 ppm. It was calculated by the following formula using the peak integrated value.
  • x is the integrated proton peak value derived from the NH group of the amic acid
  • y is the integrated peak value of the reference proton
  • is the integrated value of the amic acid in the case of a polyamic acid (imidization rate is 0%).
  • Imidization rate (%) (1- ⁇ ⁇ x / y) ⁇ 100
  • TC-1 (1.84 g: 9.40 mmol) and NMP (10.0 g) were added and reacted at room temperature for 18 hours to have a viscosity of about 1120 mPa ⁇ s and a solid content concentration of 20 mass.
  • % Polyamic acid solution (PAA-1) was obtained.
  • the molecular weight of this polyamic acid was a number average molecular weight: 11200 and a weight average molecular weight: 31360.
  • the polyamic acid solution (PAA-1) (40.0 g) obtained above was weighed in a 300 mL eggplant flask equipped with a stirrer and a nitrogen introduction tube, NMP (74.3 g) was added, and the mixture was stirred at room temperature for a while.
  • anhydrous acetic acid (5.61 g: 54.98 mmol) and pyridine (2.90 g, 36.65 mmol) were added, and the mixture was stirred at room temperature for 30 minutes under a nitrogen atmosphere and then reacted at 50 ° C. for 3 hours under a nitrogen atmosphere.
  • the reaction solution was slowly poured into methanol (500 mL) cooled to 10 ° C. or lower to precipitate a solid, and the mixture was stirred for 10 minutes. The precipitate was separated by filtration, and the slurry was washed again with methanol (200 mL) for 30 minutes twice in total, and the solid was vacuum dried at 80 ° C.
  • DA-2 (3.42 g: 14.00 mmol) and DA-4 (4.11 g: 6.00 mmol) were weighed in a 100 mL four-necked flask equipped with a mechanical stirrer and a nitrogen introduction tube, and NMP (56.8 g) was weighed. ), Stir and dissolve in a nitrogen atmosphere, then add TC-3 (4.26 g: 19.00 mol) and NMP (10.0 g) in an ice bath while keeping the temperature below 10 ° C., and add 24 at room temperature.
  • PAA-2 polyamic acid solution having a viscosity of about 680 mPa ⁇ s and a solid content concentration of 15% by mass was obtained.
  • the molecular weight of this polyamic acid was a number average molecular weight: 17200 and a weight average molecular weight: 48160.
  • DA-2 (3.42 g: 14.00 mmol) and DA-5 (1.55 g: 6.00 mmol) were weighed in a 100 mL four-necked flask equipped with a mechanical stirrer and a nitrogen introduction tube, and NMP (42.0 g) was weighed. ), Stir and dissolve in a nitrogen atmosphere, then add TC-3 (4.21 g: 18.8 mmol) and NMP (10.0 g) in an ice bath while keeping the temperature below 10 ° C., and add 24 at room temperature.
  • a polyamic acid solution (PAA-3) having a viscosity of about 710 mPa ⁇ s and a solid content concentration of 15% by mass was obtained.
  • the molecular weight of this polyamic acid was a number average molecular weight: 15500 and a weight average molecular weight: 41800.
  • a substrate with electrodes was prepared.
  • the substrate is a non-alkali glass substrate having a size of 30 mm ⁇ 35 mm and a thickness of 0.7 mm.
  • the size of each pixel is 10 mm in length and about 5 mm in width.
  • an IPS board Hereinafter referred to as an IPS board.
  • the radical generation film forming composition AL-1 and AL-2 obtained by the above method, the liquid crystal alignment agent AL-3, and the liquid crystal alignment agent SE-6414 for horizontal alignment (manufactured by Nissan Chemical Industries, Ltd.). ) Is filtered through a filter having a pore size of 1.0 ⁇ m, and then the prepared IPS substrate and a glass substrate having an ITO film formed on the back surface and having a columnar spacer having a height of 3.0 ⁇ m (hereinafter referred to as a facing substrate). It was coated and filmed by the spin coating method. Then, it was dried on a hot plate at 80 ° C. for 80 minutes and then fired at 230 ° C.
  • the rubbing method is used for AL-1 and SE-6414, and a rubbing device manufactured by Iinuma Gauge, a rubbing cloth (YA-20R) manufactured by Yoshikawa Kako, a rubbing roller (diameter 10.0 cm), and a stage.
  • the feed rate was 30 mm / s
  • the roller rotation speed was 700 rpm
  • the pushing pressure was 0.3 mm.
  • a UV exposure device manufactured by Ushio, Inc. is used so that the irradiation amount of linearly polarized UV having an extinction ratio of about 26: 1 is 300 mJ / cm 2 based on the wavelength of 254 nm.
  • a radical generation alignment film is used on the IPS substrate side for the display element to be the target of the embodiment and some display elements to be compared (Comparative Examples 2 to 4, 6 to 8).
  • Comparative Example 1 A part of the display elements to be compared (Comparative Example 1) using a combination of AL-1 or AL-2 and those provided with the liquid crystal alignment film SE-6414 or AL-3 on the facing substrate side.
  • SE-6414 or AL-3 was used for both substrates.
  • the cells were combined so that their orientation directions were parallel to each other, and the periphery was sealed leaving the liquid crystal injection port, to prepare an empty cell having a cell gap of about 3.0 ⁇ m.
  • As the liquid crystal mixture used LC-A (manufactured by DIC Corporation, ⁇ n: 0.130, ⁇ : 4.4) was used.
  • Add-C1 to Add-C2 those purchased from Tokyo Chemical Industry were used.
  • the obtained liquid crystal cell constitutes an IPS mode liquid crystal display element.
  • the obtained liquid crystal cell was heat-treated at 120 ° C. for 10 minutes, and UV (UV lamp: FLR40SUV32 / A-1) was applied using a UV-FL irradiation device manufactured by Toshiba Lighting & Technology Corporation in a state where no voltage was applied. Irradiation for 30 minutes was performed to obtain a liquid crystal display element.
  • VT curve and drive threshold voltage, maximum luminance voltage, transmittance evaluation A white LED backlight and a luminance meter are set so that the optical axes are aligned, and a liquid crystal cell (liquid crystal display element) with a polarizing plate is set between them so that the brightness is the smallest, and the voltage is applied to 8V at 1V intervals.
  • the VT curve was measured by applying and measuring the brightness at the voltage. From the obtained VT curve, the value of the voltage (Vmax) at which the brightness was maximized was estimated. Further, the maximum transmittance (Tmax) was estimated by comparing the maximum transmitted luminance in the VT curve with the transmitted luminance at the time of parallel Nicol set to 100% via the liquid crystal cell to which no voltage was applied.
  • VHR voltage retention rate
  • the voltage retention rate at room temperature was measured.
  • a voltage of 4 V for 60 ⁇ s was applied to the prepared liquid crystal display element at a temperature of 23 ° C. and measuring the voltage after 16.7 ms, how much the voltage could be maintained was calculated as the voltage retention rate.
  • the voltage retention rate at high temperature was measured.
  • a voltage of 1 V was applied to the prepared liquid crystal display element at a temperature of 70 ° C. for 60 ⁇ s, and the voltage after 1667 ms was measured to measure how much the voltage could be maintained as the voltage retention rate.
  • a VHR-1 voltage holding rate measuring device manufactured by Toyo Corporation was used for measuring the voltage holding rate.
  • Table 1 shows the compositions of the polymers synthesized in Synthesis Examples 13 to 15.
  • Table 2 shows the compositions of the liquid crystal alignment agent or the radical-generating film-forming composition prepared in Preparation Examples 1 to 3.
  • Table 3 shows the contents of Examples and Comparative Examples of the liquid crystal cells subjected to the alignment treatment by the rubbing method.
  • Tables 4-1 and 4-2 show the characteristics evaluation results of the liquid crystal cells that have been oriented by the rubbing method.
  • the orientation state and the black brightness are good, and the occurrence of the pretilt angle on the weak anchoring side is not confirmed and is 0. It was less than 1 °. It can be seen that Vmax is also significantly reduced as compared with the strong anchoring liquid crystal cell of Comparative Example 1, and the transmittance is greatly improved as compared with Comparative Examples 1 to 4. On the other hand, in Comparative Examples 2 to 3, the liquid crystal display element using Addd-C1 or Addd-C2 as an additive has many rubbing streaks and poor black brightness.
  • the additive of the present invention good weak anchoring IPS characteristics can be obtained even when such a liquid crystal display having a high ⁇ n and a small ⁇ can be used, and the response speed can be improved by narrowing the cell gap. Further, the VHR was also higher than that of Comparative Examples 2 to 4 especially at high temperature, and it was found that the reliability can be improved by using the additive of the present invention.
  • Table 5 shows the contents of Examples and Comparative Examples of the liquid crystal cells subjected to the alignment treatment by the optical alignment method.
  • Table 6 shows the characteristics evaluation results of the liquid crystal cells that have been oriented by the optical alignment method.
  • the anisotropy of the pre-tilt angle does not appear, so if a relatively large pre-tilt angle occurs due to some influence, the direction of the pre-tilt angle is not specified and it becomes a domain. It is presumed that the domain cannot be driven because the domain area is expanded by the electric field when it is tried to be driven. It has been found that the additive of the present invention is very useful because no domain is generated even when photo-orientation is used and good weak anchoring IPS characteristics can be obtained. As for VHR, it was found that VHR was good at high temperature as well as rubbing, and it was found that the use of this polymerizable compound as an additive for weak anchoring IPS was effective in improving reliability.
  • the present invention it is possible to provide a lateral electric field liquid crystal display element capable of realizing high backlight transmittance and fast response speed without generating a pretilt angle or a domain even when a liquid crystal having a high ⁇ n and a low ⁇ is used.
  • a liquid crystal display element with good reliability can be obtained. Therefore, the liquid crystal display element obtained by the method of the present invention is useful as a horizontal electric field drive type liquid crystal display element.

Abstract

A liquid-crystal display element production method that includes a step in which a liquid-crystal composition comprising a liquid crystal and a radically polymerizable compound represented by formula (A) is brought into contact with a radical-generating film and, while in the contact state, the radically polymerizable compound is polymerized. (In formula (A), M indicates a radically-polymerizable compound, R1 indicates a C1–10 aliphatic hydrocarbon group having a linear or branched structure, and the three Xs each independently indicate a hydrogen atom or formula (B). At least one of the three Xs indicates formula (B).) (In formula (B): Y indicates a single bond, –O–, –S–, or –NR–; R indicates a hydrogen atom or a C1–4 alkyl group; and * indicates a bonding site. R2, R3, and R4 each independently indicate a C1–6 alkyl group or an aromatic hydrocarbon group that may have a substituent.)

Description

液晶組成物、液晶表示素子の製造方法、及び液晶表示素子Liquid crystal composition, manufacturing method of liquid crystal display element, and liquid crystal display element
 本発明は、安価な手法かつ複雑な工程を含まない手法にて、弱アンカリング膜を製造することが可能であり、かつポリマーによる液晶層の安定化技術を応用した、液晶表示素子の製造方法、及び、更なる低電圧駆動を実現するための液晶表示素子、並びにそれらに利用可能な液晶組成物、及びラジカル重合性化合物に関するものである。 INDUSTRIAL APPLICABILITY The present invention is a method for manufacturing a liquid crystal display element, which can manufacture a weak anchoring film by an inexpensive method and a method not including a complicated process, and which applies a technique for stabilizing a liquid crystal layer with a polymer. The present invention relates to a liquid crystal display element for realizing a further low voltage drive, a liquid crystal composition that can be used for them, and a radically polymerizable compound.
 近年、携帯電話、コンピュータ及びテレビのディスプレイなどには液晶表示素子が広く用いられている。液晶表示素子は薄型、軽量、低消費電力などの特性を有しており、今後はVR(Virtual Reality)や超高精細のディスプレイ等、更なるコンテンツへの応用が期待されている。液晶ディスプレイの表示方式には、TN(Twisted Nematic)、IPS(In-Plane Switching)、VA(Vertical Alignment)など様々な表示モードが提案されているが、すべてのモードには液晶を所望の配向状態に誘導する膜(液晶配向膜)が使用されている。 In recent years, liquid crystal display elements have been widely used in mobile phones, computers, television displays, and the like. Liquid crystal display elements have characteristics such as thinness, light weight, and low power consumption, and are expected to be applied to further contents such as VR (Virtual Reality) and ultra-high-definition displays in the future. Various display modes such as TN (Twisted Nematic), IPS (In-Plane Switching), and VA (Vertical Indicator) have been proposed as display methods for liquid crystal displays, but the liquid crystal is oriented in a desired orientation in all modes. A film (liquid crystal alignment film) that induces IPS is used.
 特にタブレットPCやスマートフォン、スマートTV等のタッチパネルを具備した製品には、タッチしても表示が乱れにくいIPSモードが好まれており、近年ではコントラスト向上や視野角特性の向上の点でFFS(Frindge Field Switching)を用いた液晶表示素子や、光配向を用いた非接触技術を用いた技術が用いられるようになってきた。 In particular, for products equipped with a touch panel such as tablet PCs, smartphones, and smart TVs, the IPS mode, which does not distort the display even when touched, is preferred. Liquid crystal display elements using Field Switching) and technologies using non-contact technology using optical orientation have come to be used.
 しかしながら、FFSはIPSに比べ基板の製造コストが大きく、Vcomシフトと呼ばれるFFSモード特有の表示不良が発生する課題がある。また光配向に関しては、ラビング法に比べ、製造できる素子の大きさを大きくできる点や表示特性を大きく向上できるというメリットがあるが、光配向の原理上の課題(分解型であれば分解物由来の表示不良、異性化型であれば配向力不足による焼き付き等)が挙げられる。それらの課題を解決するために液晶表示素子メーカーや液晶配向膜メーカーは種々工夫を行っているのが現状である。 However, FFS has a higher substrate manufacturing cost than IPS, and has a problem that a display defect peculiar to FFS mode called Vcom shift occurs. In addition, regarding photo-alignment, compared to the rubbing method, there are merits that the size of the element that can be manufactured can be increased and the display characteristics can be greatly improved. In the case of isomerized type, seizure due to insufficient alignment force, etc.) can be mentioned. At present, liquid crystal display element makers and liquid crystal alignment film makers are making various efforts to solve these problems.
 一方で、近年弱アンカリングというものを利用したIPSモードが提案されており、この手法を用いることで従来のIPSモードに比べてコントラスト向上や大幅な低電圧駆動が可能になるという報告がされている(特許文献1参照)。 On the other hand, in recent years, an IPS mode using weak anchoring has been proposed, and it has been reported that using this method enables improved contrast and significantly lower voltage drive compared to the conventional IPS mode. (See Patent Document 1).
 具体的には、片側の基板には強いアンカリングエネルギーを有する液晶配向膜を用い、一方の横電界を発生させる方の電極を具備した基板側には一切液晶の配向規制力を有さなくなるような処理を施し、それらを用いてIPSモードの液晶表示素子を作る方法である。 Specifically, a liquid crystal alignment film having strong anchoring energy is used for the substrate on one side, and the substrate side provided with the electrode for generating a transverse electric field on one side has no liquid crystal alignment regulating force. This is a method of making a liquid crystal display element in IPS mode by performing various processes and using them.
 近年では、濃厚ポリマーブラシ等を用いて弱状態を作り出す、弱アンカリングIPSモードの技術提案がなされている(特許文献2参照)。この技術によりコントラスト比の大幅な向上や駆動電圧の大幅な低下を実現している。 In recent years, a technical proposal for a weak anchoring IPS mode that creates a weak state using a concentrated polymer brush or the like has been made (see Patent Document 2). This technology has realized a significant improvement in the contrast ratio and a significant reduction in the drive voltage.
 一方で、応答速度特に電圧OFF時の応答速度が著しく低下する課題がある。これは駆動電圧が低くなるため、通常の駆動方式に比べ弱い電界で応答させることによる影響と、配向膜のアンカリング力が極めて小さいが故に、液晶の復元に時間がかかってしまうことに起因する。 On the other hand, there is a problem that the response speed, especially when the voltage is off, is significantly reduced. This is due to the effect of responding with a weaker electric field compared to the normal drive method because the drive voltage is low, and because the anchoring force of the alignment film is extremely small, it takes time to restore the liquid crystal display. ..
 これを解決する方法として、画素電極上のみ弱アンカリングにする手法が提案されている(特許文献3参照)。これにより輝度の向上と応答速度の両立が可能になることが報告されている。 As a method for solving this, a method of weakly anchoring only on the pixel electrode has been proposed (see Patent Document 3). It has been reported that this makes it possible to achieve both improvement in brightness and response speed.
特許第4053530号公報Japanese Patent No. 40553530 特開2013-231757号公報Japanese Unexamined Patent Publication No. 2013-231757 特開2017-211566号公報Japanese Unexamined Patent Publication No. 2017-21166
 IPS櫛歯電極の電極上のみ弱アンカリングにすることで駆動時の応答速度遅延が抑制される一方で、電極上のみ弱アンカリングの状態にするためには非常に細かな領域に異なる材料を塗り分けする等の難しい技術を用意する必要があり、実際の工業化には大きな課題となることが考えられる。 By making the IPS comb tooth electrode weak anchoring only on the electrode, the response speed delay during driving is suppressed, while in order to make the weak anchoring state only on the electrode, different materials are used in very small areas. It is necessary to prepare difficult techniques such as painting separately, which may be a big issue for actual industrialization.
 これらとは別の方法で、セルギャップを狭くすることによる応答速度の改善が検討されている。通常、液晶表示素子はセルギャップが狭くなるほど応答速度が速くなる傾向にある。しかし、その反面、透過率が低下してしまう問題がある。これを解決するには複屈折率差(Δn)の大きな液晶の使用が挙げられる。セルギャップDとΔnの積(リタデーション)が300nm~400nm(測定波長550nm)となるように設定することで、透過率の低下を解決できる。しかしながら、Δnを大きくする場合、基本的にはそのパラメーターだけを変えることはできず、Δε(誘電率異方性)や弾性係数等のパラメーターも変わるため、液晶の基礎物性が大きく変化することが考えられる。例えば弱アンカリング配向のような場合、液晶が垂直方向に配向してしまうようなケースが発生する可能性等も考えられる。よって、ΔnやΔε等のパラメーターが変化しても安定した弱アンカリング特性が得られることが重要課題となる。 A different method from these is being studied to improve the response speed by narrowing the cell gap. Normally, the response speed of a liquid crystal display element tends to increase as the cell gap becomes narrower. However, on the other hand, there is a problem that the transmittance is lowered. To solve this problem, the use of a liquid crystal display having a large birefringence difference (Δn) can be mentioned. By setting the product (literation) of the cell gap D and Δn to be 300 nm to 400 nm (measurement wavelength 550 nm), the decrease in transmittance can be solved. However, when Δn is increased, basically only the parameters cannot be changed, and parameters such as Δε (dielectric constant anisotropy) and elastic modulus also change, so that the basic physical properties of the liquid crystal display may change significantly. Conceivable. For example, in the case of weak anchoring orientation, there is a possibility that the liquid crystal may be oriented in the vertical direction. Therefore, it is an important issue to obtain stable weak anchoring characteristics even if parameters such as Δn and Δε change.
 このような技術的課題を解決できればパネルメーカーとしても大きなコストメリットとなり、バッテリーの消費抑制や画質の向上等にもメリットとなることが考えられる。 If such a technical problem can be solved, it will be a great cost merit as a panel maker, and it is considered that it will be a merit for suppressing battery consumption and improving image quality.
 本発明は、上記のような課題を解決するためになされたものであり、狭セルギャップ化において、プレチルト角が発生せず安定的に弱アンカリング横電界液晶表示素子が作製でき、低駆動電圧化と電圧Off時の応答速度も速くすることが同時に実現でき、加えて高温時においてもVHR(電圧保持率)の低下が少ない横電界液晶表示素子が製造可能な液晶表示素子の製造方法、及び当該液晶表示素子、並びにそれらに利用可能な液晶組成物、及びラジカル重合性化合物を提供することを目的とする。 The present invention has been made to solve the above-mentioned problems, and in narrowing the cell gap, a weak anchoring transverse electric field liquid crystal display element can be stably manufactured without generating a pretilt angle, and a low drive voltage can be produced. A method for manufacturing a liquid crystal display element that can manufacture a transverse electric field liquid crystal display element with a small decrease in VHR (voltage retention rate) even at high temperatures, and a method for manufacturing a liquid crystal display element, which can simultaneously realize the change in voltage and increase the response speed when the voltage is off. It is an object of the present invention to provide the liquid crystal display element, a liquid crystal composition that can be used for the liquid crystal display element, and a radically polymerizable compound.
 本発明者らは、上記の課題を解決する為、鋭意検討を行った結果、上記の課題を解決出来ることを見出し、以下の要旨を有する本発明を完成させた。 As a result of diligent studies to solve the above problems, the present inventors have found that the above problems can be solved, and have completed the present invention having the following gist.
 すなわち、本発明は以下を包含する。
 [1] 液晶及び下記式(A)で表されるラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜に接触させた状態で、前記ラジカル重合性化合物を重合反応させるステップを含む、液晶表示素子の製造方法。
Figure JPOXMLDOC01-appb-C000019
(式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
Figure JPOXMLDOC01-appb-C000020
(式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
[2] 前記式(B)中、前記置換基を有していてもよい芳香族炭化水素基がフェニル基である[1]に記載の液晶表示素子の製造方法。
 [3] 前記式(A)中のMが以下の構造から選ばれる、[1]または[2]に記載の液晶表示素子の製造方法。
Figure JPOXMLDOC01-appb-C000021
(式中、*は結合部位を示す。Rは炭素数2~8の直鎖アルキル基を表し、Eは単結合、-O-、-NR-、-S-、エステル結合及びアミド結合から選ばれる結合基を表す。Rは水素原子、または炭素数1~4のアルキル基を示す。Rは水素原子、または炭素数1~6のアルキル基を表す。)
 [4] 前記ラジカル発生膜が一軸配向処理されたラジカル発生膜である、[1]~[3]のいずれかに記載の液晶表示素子の製造方法。
 [5] 前記重合反応させるステップが無電界条件下で行われる、[1]~[4]のいずれかに記載の液晶表示素子の製造方法。
 [6] 前記ラジカル発生膜が、ラジカル重合を誘発する有機基が固定化されて成る膜である、[1]~[5]のいずれかに記載の液晶表示素子の製造方法。
 [7] 前記ラジカル発生膜が、ラジカルを発生する有機基を有する化合物と重合体とを含有する組成物を塗布、および硬化して膜を形成することにより、前記ラジカルを発生する有機基を前記膜中に固定化させて得られる、[1]~[5]のいずれかに記載の液晶表示素子の製造方法。
 [8] 前記ラジカル発生膜が、ラジカル重合を誘発する有機基を含有する重合体から成る、[1]~[5]のいずれかに記載の液晶表示素子の製造方法。
 [9] 前記ラジカル重合を誘発する有機基を含有する重合体が、ラジカル重合を誘発する有機基を含有するジアミンを含むジアミン成分を用いて得られるポリイミド前駆体、ポリイミド、ポリウレアおよびポリアミドから選ばれる少なくとも一種の重合体である、[8]に記載の液晶表示素子の製造方法。
 [10] 前記ラジカル重合を誘発する有機基が下記式[X-1]~[X-18]、[W]、[Y]、または[Z]で表される有機基である、[9]に記載の液晶表示素子の製造方法。
Figure JPOXMLDOC01-appb-C000022
(式[X-1]~[X-18]中、*は結合部位を示し、S、およびSはそれぞれ独立して-O-、-NR-、または-S-を表し、Rは水素原子、または炭素数1~10のアルキル基を表す(前記炭素数1~10のアルキル基のうち、炭素数2~10のアルキル基の-CH-基の一部は酸素原子に置き換わっていてもよい。ただし、SRまたはNRにおいて、前記アルキル基の-CH-基の一部が酸素原子に置き換わっている場合、前記酸素原子は、SまたはNには、直接結合していない。)。R、およびRはそれぞれ独立して水素原子、ハロゲン原子、または炭素数1~4のアルキル基を表す。)
Figure JPOXMLDOC01-appb-C000023
(式[W]、[Y]、および[Z]中、*は結合部位を示し、Arは有機基及び/又はハロゲン原子を置換基として有しても良いフェニレン、ナフチレン、及びビフェニリレンからなる群より選ばれる芳香族炭化水素基を示し、R及びR10は、それぞれ独立に、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表し、RとR10がアルキル基の場合、末端で互いに結合し環構造を形成していても良い。Qは下記のいずれかの構造を表す。
Figure JPOXMLDOC01-appb-C000024
(式中、R11は-CH-、-NR-、-O-、又は-S-を表し、Rはそれぞれ独立して水素原子又は炭素数1~4のアルキル基を表し、*は結合部位を示す。)Sは単結合、-O-、-NR-(Rは水素原子または炭素数1~14のアルキル基を表す。)、または-S-を表す。R12は水素原子、ハロゲン原子、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表す。)
 [11] 前記ラジカル重合を誘発する有機基を含有するジアミンが下記式(6)、下記式(7)、または下記式(7’)で表される構造を有するジアミンである、[9]または[10]に記載の液晶表示素子の製造方法。
Figure JPOXMLDOC01-appb-C000025
(式(6)中、Rは単結合、-CH-、-O-、-COO-、-OCO-、-NHCO-、-CONH-、-NH-、-CHO-、-N(CH)-、-CON(CH)-、又は-N(CH)CO-を表し、
 Rは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表し、当該アルキレン基の任意の-CH-又は-CF-の1以上は、それぞれ独立に-CH=CH-、二価の炭素環、および二価の複素環から選ばれる基で置き換えられていてもよく、さらに、次に挙げるいずれかの基、すなわち、-O-、-COO-、-OCO-、-NHCO-、-CONH-、又は-NH-が互いに隣り合わないことを条件に、これらの基で置き換えられていてもよい;
 Rは、下記式[X-1]~[X-18]から選択される式で表されるラジカル重合反応性基を表す。
Figure JPOXMLDOC01-appb-C000026
(式[X-1]~[X-18]中、*は結合部位を示し、S、およびSはそれぞれ独立して-O-、-NR-、または-S-を表し、Rは水素原子、または炭素数1~10のアルキル基を表す(前記炭素数1~10のアルキル基のうち、炭素数2~10のアルキル基の-CH-基の一部は酸素原子に置き換わっていてもよい。ただし、SRまたはNRにおいて、前記アルキル基の-CH-基の一部が酸素原子に置き換わっている場合、前記酸素原子は、SまたはNには、直接結合していない。)。R、およびRはそれぞれ独立して水素原子、ハロゲン原子、または炭素数1~4のアルキル基を表す。))
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000028
(式(7)及び(7’)中、T及びTは、それぞれ独立に、単結合、-O-、-S-、-COO-、-OCO-、-NHCO-、-CONH-、-NH-、-CHO-、-N(CH)-、-CON(CH)-、又は-N(CH)CO-であり、
 Sは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表し、当該アルキレン基の任意の-CH-又は-CF-の1以上は、それぞれ独立に-CH=CH-、二価の炭素環、および二価の複素環から選ばれる基で置き換えられていてもよく、さらに、次に挙げるいずれかの基、すなわち、-O-、-COO-、-OCO-、-NHCO-、-CONH-、又は-NH-が互いに隣り合わないことを条件に、これらの基で置き換えられていてもよく、
 Eは、単結合、-O-、-C(CH-、-NH-、-CO-、-NHCO-、-COO-、-(CH-、-SO-、-O-(CH-O-、-O-C(CH-、-CO-(CH-、-NH-(CH-、-SO-(CH-、-CONH-(CH-、-CONH-(CH-NHCO-、または-COO-(CH-OCO-であり、mは1~8の整数であり、
 Jは下記式[W]、[Y]及び[Z]から選ばれる式で表される有機基である。
Figure JPOXMLDOC01-appb-C000029
(式[W]、[Y]、および[Z]中、*はTとの結合箇所を表し、Arは有機基及び/又はハロゲン原子を置換基として有しても良いフェニレン、ナフチレン、及びビフェニリレンからなる群より選ばれる芳香族炭化水素基を示し、R及びR10は、それぞれ独立に、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表し、Qは下記のいずれかの構造を表す。
Figure JPOXMLDOC01-appb-C000030
(式中、R11は-CH-、-NR-、-O-、又は-S-を表し、Rはそれぞれ独立して水素原子又は炭素数1~4のアルキル基を表し、*は結合部位を示す。)Sは単結合、-O-、-NR-(Rは水素原子または炭素数1~14のアルキル基を表す。)、または-S-を表す。R12は水素原子、ハロゲン原子、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表す。))式(7’)中、qはそれぞれ独立に0又は1であり、少なくとも1つのqは1であり、pは1~2の整数を表す。)
 [12] 前記ラジカル発生膜を有する第一基板と、ラジカル発生膜を有していてもよい第二基板とを用意するステップ、
 前記第一基板における前記ラジカル発生膜が前記第二基板に対向するように、前記第一基板および前記第二基板を対向配置するステップ、
 前記第一基板と前記第二基板との間に、前記液晶組成物を充填するステップ、および
 前記重合反応させるステップ、
を含む、[1]~[11]のいずれかに記載の液晶表示素子の製造方法。
 [13] 前記第二基板がラジカル発生膜を有しない第二基板である、[12]に記載の液晶表示素子の製造方法。
 [14] 前記第二基板が、一軸配向性を有する液晶配向膜がコーティングされた基板である、[12]に記載の液晶表示素子の製造方法。
 [15] 前記一軸配向性を有する液晶配向膜が水平配向用の液晶配向膜である、[14]に記載の液晶表示素子の製造方法。
 [16] 前記第一基板および前記第二基板のいずれか一方が櫛歯電極を有する基板である、[12]~[15]のいずれかに記載の液晶表示素子の製造方法。
 [17] 液晶及び下記式(A)で表されるラジカル重合性化合物を含有することを特徴とする液晶組成物。
Figure JPOXMLDOC01-appb-C000031
(式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
Figure JPOXMLDOC01-appb-C000032
(式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
 [18] 前記式(B)中の前記置換基を有していてもよい芳香族炭化水素基がフェニル基である[17]に記載の液晶組成物。
 [19] 前記式(A)中のMが以下の構造から選ばれる、[17]または[18]に記載の液晶組成物。
Figure JPOXMLDOC01-appb-C000033
(式中、*は結合部位を示す。Rは炭素数2~8の直鎖アルキル基を表し、Eは単結合、-O-、-NR-、-S-、エステル結合及びアミド結合から選ばれる結合基を表す。Rは水素原子、または炭素数1~4のアルキル基を表す。Rは水素原子、または炭素数1~6のアルキル基を表す。)
 [20] 第一基板、前記第一基板に対向して配置された第二基板、および前記第一基板と前記第二基板との間に充填された液晶を有し、
 前記液晶及び下記式(A)で表されるラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜を有する前記第一基板の前記ラジカル発生膜に接触させた状態で、前記ラジカル重合性化合物を重合反応させてなる、ことを特徴とする液晶表示素子。
Figure JPOXMLDOC01-appb-C000034
(式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
Figure JPOXMLDOC01-appb-C000035
(式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
 [21] 前記第一基板および前記第二基板のいずれか一方が櫛歯電極を有する基板である、[20]に記載の液晶表示素子。
 [22] 低電圧駆動横電界液晶表示素子である、[20]または[21]に記載の液晶表示素子。
 [23] 下記式(F-1)~(F-6)のいずれかで表されるラジカル重合性化合物。
Figure JPOXMLDOC01-appb-C000036
That is, the present invention includes the following.
[1] A liquid crystal comprising a step of polymerizing the radically polymerizable compound in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the following formula (A) are in contact with a radical generating film. Method of manufacturing display element.
Figure JPOXMLDOC01-appb-C000019
(In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or formula (B), where at least one of the three Xs represents formula (B).)
Figure JPOXMLDOC01-appb-C000020
(In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
[2] The method for producing a liquid crystal display element according to [1], wherein the aromatic hydrocarbon group which may have the substituent in the formula (B) is a phenyl group.
[3] The method for manufacturing a liquid crystal display element according to [1] or [2], wherein M in the formula (A) is selected from the following structures.
Figure JPOXMLDOC01-appb-C000021
(In the formula, * indicates a binding site. R b represents a linear alkyl group having 2 to 8 carbon atoms, and E represents a single bond, -O-, -NR c- , -S-, an ester bond and an amide bond. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.)
[4] The method for manufacturing a liquid crystal display element according to any one of [1] to [3], wherein the radical generation film is a radical generation film subjected to uniaxial orientation treatment.
[5] The method for manufacturing a liquid crystal display element according to any one of [1] to [4], wherein the step of performing the polymerization reaction is performed under no electric field conditions.
[6] The method for manufacturing a liquid crystal display element according to any one of [1] to [5], wherein the radical generating film is a film formed by immobilizing an organic group that induces radical polymerization.
[7] The radical-generating film is coated with a composition containing a compound having an organic group that generates a radical and a polymer, and cured to form a film, whereby the organic group that generates the radical is obtained. The method for manufacturing a liquid crystal display element according to any one of [1] to [5], which is obtained by immobilizing in a film.
[8] The method for producing a liquid crystal display element according to any one of [1] to [5], wherein the radical generating film is made of a polymer containing an organic group that induces radical polymerization.
[9] The polymer containing an organic group that induces radical polymerization is selected from a polyimide precursor, a polyimide, a polyurea, and a polyamide obtained by using a diamine component containing a diamine containing an organic group that induces radical polymerization. The method for manufacturing a liquid crystal display element according to [8], which is at least one kind of polymer.
[10] The organic group that induces radical polymerization is an organic group represented by the following formulas [X-1] to [X-18], [W], [Y], or [Z], [9]. The method for manufacturing a liquid crystal display element according to the above.
Figure JPOXMLDOC01-appb-C000022
(In formulas [X-1] to [X-18], * indicates a binding site, S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is. Represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (among the alkyl groups having 1 to 10 carbon atoms, a part of the −CH2- group of the alkyl group having 2 to 10 carbon atoms is replaced with an oxygen atom. However, in S2R or NR, when a part of the −CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.). R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)
Figure JPOXMLDOC01-appb-C000023
(In the formulas [W], [Y], and [Z], * indicates a bond site, and Ar is a group consisting of phenylene, naphthylene, and biphenylylene which may have an organic group and / or a halogen atom as a substituent. R 9 and R 10 each independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and R 9 and R 10 are alkyl groups. In the case of, they may be bonded to each other at the ends to form a ring structure. Q represents any of the following structures.
Figure JPOXMLDOC01-appb-C000024
(In the formula, R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is indicated.) S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-. R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )
[11] The diamine containing an organic group that induces radical polymerization is a diamine having a structure represented by the following formula (6), the following formula (7), or the following formula (7'), [9] or [10] The method for manufacturing a liquid crystal display element according to [10].
Figure JPOXMLDOC01-appb-C000025
(In formula (6), R 6 is a single bond, -CH 2- , -O-, -COO-, -OCO-, -NHCO-, -CONH-, -NH-, -CH 2 O-, -N. Represents (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
R 7 represents an alkylene group having 1 to 20 carbon atoms which is single-bonded or substituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independent of each other. May be replaced with a group selected from -CH = CH-, a divalent carbocycle, and a divalent heterocycle, and any of the following groups, i.e., -O-, -COO-. , -OCO-, -NHCO-, -CONH-, or -NH- may be replaced by these groups provided they are not adjacent to each other;
R 8 represents a radical polymerization reactive group represented by a formula selected from the following formulas [X-1] to [X-18].
Figure JPOXMLDOC01-appb-C000026
(In formulas [X-1] to [X-18], * indicates a binding site, S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is. Represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (among the alkyl groups having 1 to 10 carbon atoms, a part of the −CH2- group of the alkyl group having 2 to 10 carbon atoms is replaced with an oxygen atom. However, in S2R or NR, when a part of the −CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.). R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)))
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000028
(In equations (7) and (7'), T 1 and T 2 are independently single-bonded, -O-, -S-, -COO-, -OCO-, -NHCO-, -CONH-, respectively. -NH-, -CH 2 O-, -N (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
S represents an alkylene group having 1 to 20 carbon atoms which is single-bonded, or unsubstituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independently. It may be replaced with a group selected from -CH = CH-, a divalent carbocycle, and a divalent heterocyclic ring, and further, any of the following groups, that is, -O-, -COO-,. -OCO-, -NHCO-, -CONH-, or -NH- may be replaced by these groups provided that they are not adjacent to each other.
E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -COO-,-(CH 2 ) m- , -SO 2- , -O. -(CH 2 ) m -O-, -OC (CH 3 ) 2- , -CO- (CH 2 ) m- , -NH- (CH 2 ) m- , -SO 2- (CH 2 ) m -, -CONH- (CH 2 ) m- , -CONH- (CH 2 ) m -NHCO-, or -COO- (CH 2 ) m -OCO-, where m is an integer from 1 to 8.
J is an organic group represented by a formula selected from the following formulas [W], [Y] and [Z].
Figure JPOXMLDOC01-appb-C000029
(In the formulas [W], [Y], and [Z], * represents a bond with T 2 , Ar represents an organic group and / or a halogen atom as a substituent, phenylene, naphthylene, and Indicates an aromatic hydrocarbon group selected from the group consisting of biphenylylene, R 9 and R 10 independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and Q is described below. Represents either structure.
Figure JPOXMLDOC01-appb-C000030
(In the formula, R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is indicated.) S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-. R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )) In equation (7'), q is independently 0 or 1, at least one q is 1, and p represents an integer of 1 to 2. )
[12] A step of preparing a first substrate having the radical generation film and a second substrate which may have the radical generation film.
A step of arranging the first substrate and the second substrate facing each other so that the radical generating film on the first substrate faces the second substrate.
A step of filling the liquid crystal composition between the first substrate and the second substrate, and a step of causing the polymerization reaction.
The method for manufacturing a liquid crystal display element according to any one of [1] to [11], which comprises.
[13] The method for manufacturing a liquid crystal display element according to [12], wherein the second substrate is a second substrate having no radical generation film.
[14] The method for manufacturing a liquid crystal display element according to [12], wherein the second substrate is a substrate coated with a liquid crystal alignment film having uniaxial orientation.
[15] The method for manufacturing a liquid crystal display element according to [14], wherein the liquid crystal alignment film having uniaxial orientation is a liquid crystal alignment film for horizontal alignment.
[16] The method for manufacturing a liquid crystal display element according to any one of [12] to [15], wherein either the first substrate or the second substrate is a substrate having a comb tooth electrode.
[17] A liquid crystal composition comprising a liquid crystal display and a radically polymerizable compound represented by the following formula (A).
Figure JPOXMLDOC01-appb-C000031
(In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or formula (B), where at least one of the three Xs represents formula (B).)
Figure JPOXMLDOC01-appb-C000032
(In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
[18] The liquid crystal composition according to [17], wherein the aromatic hydrocarbon group which may have the substituent in the formula (B) is a phenyl group.
[19] The liquid crystal composition according to [17] or [18], wherein M in the formula (A) is selected from the following structures.
Figure JPOXMLDOC01-appb-C000033
(In the formula, * indicates a binding site. R b represents a linear alkyl group having 2 to 8 carbon atoms, and E represents a single bond, -O-, -NR c- , -S-, an ester bond and an amide bond. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.)
[20] It has a first substrate, a second substrate arranged to face the first substrate, and a liquid crystal display filled between the first substrate and the second substrate.
The radically polymerizable compound in a state where the liquid crystal composition containing the liquid crystal and the radically polymerizable compound represented by the following formula (A) is in contact with the radically polymerized film of the first substrate having the radically generated film. A liquid crystal display element characterized by having a polymerization reaction.
Figure JPOXMLDOC01-appb-C000034
(In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or formula (B), where at least one of the three Xs represents formula (B).)
Figure JPOXMLDOC01-appb-C000035
(In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
[21] The liquid crystal display element according to [20], wherein either the first substrate or the second substrate is a substrate having a comb tooth electrode.
[22] The liquid crystal display element according to [20] or [21], which is a low voltage drive horizontal electric field liquid crystal display element.
[23] A radically polymerizable compound represented by any of the following formulas (F-1) to (F-6).
Figure JPOXMLDOC01-appb-C000036
 本発明によれば、狭セルギャップ化において、プレチルト角が発生せず安定的に弱アンカリング横電界液晶表示素子が作製でき、低駆動電圧化と電圧Off時の応答速度も速くすることが同時に実現でき、加えて高温時においてもVHRの低下が少ない横電界液晶表示素子が製造可能な液晶表示素子の製造方法、及び当該液晶表示素子、並びにそれらに利用可能な液晶組成物、及びラジカル重合性化合物を提供できる。 According to the present invention, in narrowing the cell gap, a weak anchoring transverse electric field liquid crystal display element can be stably manufactured without generating a pretilt angle, and at the same time, the drive voltage can be lowered and the response speed when the voltage is turned off can be increased at the same time. A method for manufacturing a liquid crystal display element that can be realized and that can produce a transverse electric field liquid crystal display element with a small decrease in VHR even at high temperatures, the liquid crystal display element, a liquid crystal composition that can be used for them, and radical polymerizable. Compounds can be provided.
本発明の横電界液晶表示素子の一例を示す概略断面図である。It is a schematic sectional drawing which shows an example of the transverse electric field liquid crystal display element of this invention. 本発明の横電界液晶表示素子の他の例を示す概略断面図である。It is the schematic sectional drawing which shows the other example of the transverse electric field liquid crystal display element of this invention.
 本発明は、弱アンカリング膜形成に伴うプレチルト角の発現等が抑制でき、狭セルギャップ化においても安定的に高信頼な弱アンカリング横電界液晶表示素子を作製可能な添加剤(特定構造のラジカル重合性化合物)を利用するものである。例えば、液晶及び特定構造のラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜を有する第一基板と、液晶配向膜を有する第二基板との間に有するセルを用意するステップ、及び前記セルに、前記ラジカル重合性化合物を重合反応させるのに十分なエネルギーを与えるステップを含む、弱アンカリング横電界液晶表示素子の製造方法である。好ましくは、ラビング又は光配向により配向処理されたラジカル発生膜を有する第一基板と、ラジカル発生膜を有しない液晶配向膜を有する第二基板とを用意するステップ、それぞれの基板が対向するようにセルを作成するステップ、および、第一基板と第二基板との間に、液晶及び特定構造のラジカル重合性化合物を含有する液晶組成物を充填するステップを含む液晶セルの製造方法である。例えば、片方の基板に配向処理されたラジカル発生膜を有しており、もう一方の基板に一軸配向処理された液晶配向膜を有し、どちらか一方の基板が液晶を駆動させるための櫛歯電極を有する基板である、低電圧駆動横電界液晶表示素子の作成方法である。 INDUSTRIAL APPLICABILITY The present invention is an additive (with a specific structure) capable of suppressing the development of a pretilt angle due to the formation of a weak anchoring film and stably producing a highly reliable weak anchoring transverse electric field liquid crystal display element even in a narrow cell gap. It utilizes a radically polymerizable compound). For example, a step of preparing a cell having a liquid crystal composition containing a liquid crystal and a radically polymerizable compound having a specific structure between a first substrate having a radical generating film and a second substrate having a liquid crystal alignment film, and the above-mentioned step. It is a method for manufacturing a weak anchoring transverse electric field liquid crystal display element, which comprises a step of imparting sufficient energy to a cell to polymerize the radically polymerizable compound. Preferably, a step of preparing a first substrate having a radical generating film oriented by rubbing or photoalignment and a second substrate having a liquid crystal alignment film having no radical generating film so that the respective substrates face each other. A method for producing a liquid crystal cell, comprising a step of creating a cell and a step of filling a liquid crystal composition containing a liquid crystal and a radically polymerizable compound having a specific structure between the first substrate and the second substrate. For example, one substrate has an oriented radical generation film, the other substrate has a uniaxially oriented liquid crystal alignment film, and one of the substrates has a comb tooth for driving the liquid crystal. This is a method for manufacturing a low voltage drive transverse electric field liquid crystal display element, which is a substrate having electrodes.
 本発明において「弱アンカリング膜」とは、面内方向における液晶分子の配向規制力が全く無いか、あったとしても液晶同士の分子間力よりも弱く、この膜のみでは液晶分子をいずれの方向にも一軸配向させない膜をいう。また、この弱アンカリング膜は、固体膜に限定されず固体表面を覆う液体膜も含まれる。通常、液晶表示素子には液晶分子の配向を規制する膜、すなわち液晶配向膜を対で用いて液晶を配向させるが、この弱アンカリング膜と液晶配向膜を対で用いた場合も液晶を配向させることが出来る。これは、液晶配向膜の配向規制力が液晶分子同士の分子間力によって液晶層の厚み方向にも伝達し、結果として弱アンカリング膜に近接する液晶分子も配向するからである。よって液晶配向膜に水平配向用の液晶配向膜を用いた場合においては液晶セル内全体で水平配向状態を作り出すことが出来る。水平配向とは液晶分子の長軸が液晶配向膜面に対してほぼ平行に配列している状態をいい、数度程度の傾斜配向も水平配向の範疇に含まれる。 In the present invention, the "weak anchoring film" means that there is no force to regulate the orientation of liquid crystal molecules in the in-plane direction, or even if there is, it is weaker than the intramolecular force between liquid crystals. A film that is not uniaxially oriented in the direction. Further, the weak anchoring film is not limited to the solid film, but also includes a liquid film covering the solid surface. Normally, a liquid crystal display element uses a film that regulates the orientation of liquid crystal molecules, that is, a liquid crystal alignment film in pairs to align the liquid crystal, but even when the weak anchoring film and the liquid crystal alignment film are used in pairs, the liquid crystal is oriented. Can be made to. This is because the alignment restricting force of the liquid crystal alignment film is transmitted to the thickness direction of the liquid crystal layer by the intramolecular force between the liquid crystal molecules, and as a result, the liquid crystal molecules close to the weak anchoring film are also oriented. Therefore, when a liquid crystal alignment film for horizontal alignment is used as the liquid crystal alignment film, a horizontal alignment state can be created in the entire liquid crystal cell. Horizontal orientation refers to a state in which the major axes of liquid crystal molecules are arranged substantially parallel to the liquid crystal alignment film surface, and inclined orientation of about several degrees is also included in the category of horizontal orientation.
 本願の出願人は、液晶及びラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜に接触させた状態で、前記ラジカル重合性化合物を重合反応させるのに十分なエネルギーを与えるステップを含む、ゼロ面アンカリング膜の製造方法を提案している(国際公開第2019/004433号の請求項1参照)。国際公開第2019/004433号の〔0077〕~〔0086〕には、当該提案に用いるラジカル重合性化合物が例示されている。
 本発明者らは、上記提案の技術を利用し、狭セルギャップ化において、プレチルト角が発生せず安定的に弱アンカリング横電界液晶表示素子が作製でき、低駆動電圧化と電圧Off時の応答速度も速くすることが同時に実現でき、加えて高温時においてもVHRの低下が少ない横電界液晶表示素子を作製するために鋭意検討を行った。その結果、ラジカル重合性化合物の中でも特定構造のラジカル重合性化合物を用いることで、狭セルギャップ化において、プレチルト角が発生せず安定的に弱アンカリング横電界液晶表示素子が作製でき、低駆動電圧化と電圧Off時の応答速度も速くすることが同時に実現でき、加えて高温時においてもVHRの低下が少ない横電界液晶表示素子が製造可能になることを見出した。
 ここで、特定構造のラジカル重合性化合物は、下記式(A)で表される。
Figure JPOXMLDOC01-appb-C000037
(式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または下記式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
Figure JPOXMLDOC01-appb-C000038
(式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
The applicant of the present application comprises a step of imparting sufficient energy to polymerize the radically polymerizable compound in a state where the liquid crystal composition containing the liquid crystal and the radically polymerizable compound is in contact with the radical generating film. A method for producing a zero-plane anchoring film is proposed (see claim 1 of International Publication No. 2019/004433). [0077] to [0086] of International Publication No. 2019/004433 exemplify the radically polymerizable compound used in the proposal.
By using the above-mentioned technology, the present inventors can stably manufacture a weak anchoring lateral electric field liquid crystal display element without generating a pretilt angle in a narrow cell gap, and can reduce the drive voltage and turn off the voltage. At the same time, it was possible to increase the response speed, and in addition, we made diligent studies to fabricate a transverse electric field liquid crystal display element with a small decrease in VHR even at high temperatures. As a result, by using a radically polymerizable compound having a specific structure among the radically polymerizable compounds, a weak anchoring transverse electric field liquid crystal display element can be stably manufactured without generating a pretilt angle even when the cell gap is narrowed, and the drive is low. It has been found that it is possible to simultaneously realize voltage conversion and increase the response speed when the voltage is off, and in addition, it is possible to manufacture a lateral electric field liquid crystal display element having a small decrease in VHR even at a high temperature.
Here, the radically polymerizable compound having a specific structure is represented by the following formula (A).
Figure JPOXMLDOC01-appb-C000037
(In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or the following formula (B), but at least one of the three Xs represents the formula (B).)
Figure JPOXMLDOC01-appb-C000038
(In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
 本発明の液晶表示素子の製造方法においては、液晶及び式(A)で表されるラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜に接触させた状態で、ラジカル重合性化合物を重合反応させるステップを含む。このステップにおいては、ラジカル発生膜により発生したラジカルを利用したラジカル重合性化合物の重合反応によって、ラジカル発生膜の表面に変化が生じ、弱アンカリング膜が得られていると、本発明者らは推測している。しかし、かかるステップによるラジカル発生膜の表面の変化が、ラジカル発生膜自体の変化であるのか、それともラジカル発生膜上にラジカル重合性化合物の重合層が形成されていることによる変化であるのかは、確認が困難である。そのため、かかるステップによる結果物を特定するには至っていない。 In the method for producing a liquid crystal display element of the present invention, a radically polymerizable compound is polymerized in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the formula (A) are in contact with the radical generating film. Including the step of reacting. In this step, the present inventors have stated that a weak anchoring film is obtained by changing the surface of the radical-generating film by the polymerization reaction of the radically polymerizable compound using the radical generated by the radical-generating film. I'm guessing. However, whether the change in the surface of the radical-generating film due to such a step is a change in the radical-generating film itself or a change due to the formation of a polymerized layer of the radical-polymerizable compound on the radical-generating film. It is difficult to confirm. Therefore, it has not been possible to identify the result of such a step.
 本発明においては、上記ステップを行うことで、狭セルギャップ化において、プレチルト角が発生せず安定的に弱アンカリング横電界液晶表示素子が作製でき、低駆動電圧化と電圧Off時の応答速度も速くすることが同時に実現でき、加えて高温時においてもVHRの低下が少ない横電界液晶表示素子が製造可能となる。式(A)で表されるラジカル重合性化合物がそのことにどのように寄与しているかについて、本発明者らは以下のように考えている。
 式(A)で表されるラジカル重合性化合物のMは、ラジカル重合性化合物のラジカル重合に寄与する。そのことにより、弱アンカリング膜が形成でき、低駆動電圧化が実現できる。
 また、式(A)で表されるラジカル重合性化合物の-SiRは、プレチルト角の発生の抑制、応答速度の改善、及び高温時の高VHRに寄与していると、本発明者らは推測している。
 なお、本明細書において狭セルギャップとは、3.5μm以下のセルギャップを意味する。
In the present invention, by performing the above steps, a weak anchoring lateral electric field liquid crystal display element can be stably manufactured without generating a pretilt angle in a narrow cell gap, and the drive voltage can be lowered and the response speed when the voltage is turned off. At the same time, it can be realized that the voltage can be increased, and in addition, a lateral electric field liquid crystal display element with a small decrease in VHR even at a high temperature can be manufactured. The present inventors consider how the radically polymerizable compound represented by the formula (A) contributes to this as follows.
The radically polymerizable compound M represented by the formula (A) contributes to the radical polymerization of the radically polymerizable compound. As a result, a weak anchoring film can be formed, and a low drive voltage can be realized.
In addition, the radically polymerizable compound represented by the formula (A) -SiR 2 R 3 R 4 contributes to the suppression of the generation of pretilt angle, the improvement of the response speed, and the high VHR at high temperature. The inventors are speculating.
In the present specification, the narrow cell gap means a cell gap of 3.5 μm or less.
[ラジカル発生膜形成組成物]
 本発明に用いるラジカル発生膜を形成するためのラジカル発生膜形成組成物は、成分として、重合体を含有し、ラジカルを発生しうる基を含有する。その際、当該組成物は、ラジカルを発生しうる基が結合した重合体を含有するものであってもよいし、ラジカルを発生しうる基を有する化合物と、ベース樹脂となる重合体との組成物であってもよい。このような組成物を塗布、硬化して膜を形成することにより、ラジカルを発生しうる基が膜中に固定化されたラジカル発生膜を得ることができる。ラジカルを発生しうる基は、ラジカル重合を誘発する有機基であることが好ましい。
[Radical generation film forming composition]
The radical-generating film-forming composition for forming a radical-generating film used in the present invention contains a polymer as a component and contains a group capable of generating radicals. At that time, the composition may contain a polymer to which a group capable of generating radicals is bonded, or a composition of a compound having a group capable of generating radicals and a polymer serving as a base resin. It may be a thing. By applying and curing such a composition to form a film, a radical generation film in which radical-generating groups are immobilized in the film can be obtained. The group capable of generating radicals is preferably an organic group that induces radical polymerization.
 そのような、ラジカル重合を誘発する有機基としては下記式[X-1]~[X-18]、[W]、[Y]、[Z]で表される有機基が挙げられる。
Figure JPOXMLDOC01-appb-C000039
(式[X-1]~[X-18]中、*は結合部位を示し、S、およびSはそれぞれ独立して-O-、-NR-、または-S-を表し、Rは水素原子、または炭素数1~10のアルキル基を表す(前記炭素数1~10のアルキル基のうち、炭素数2~10のアルキル基の-CH-基の一部は酸素原子に置き換わっていてもよい。ただし、SRまたはNRにおいて、前記アルキル基の-CH-基の一部が酸素原子に置き換わっている場合、前記酸素原子は、SまたはNには、直接結合していない。)。R、およびRはそれぞれ独立して水素原子、ハロゲン原子、または炭素数1~4のアルキル基を表す。)
Figure JPOXMLDOC01-appb-C000040
(式[W]、[Y]、および[Z]中、*は結合部位を示し、Arは有機基及び/又はハロゲン原子を置換基として有しても良いフェニレン、ナフチレン、及びビフェニリレンからなる群より選ばれる芳香族炭化水素基を示し、R及びR10は、それぞれ独立に、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表し、RとR10がアルキル基の場合、末端で互いに結合し環構造を形成していても良い。Qは下記のいずれかの構造を表す。
Figure JPOXMLDOC01-appb-C000041
(式中、R11は-CH-、-NR-、-O-、又は-S-を表し、Rはそれぞれ独立して水素原子又は炭素数1~4のアルキル基を表し、*は結合部位を示す。)。Sは単結合、-O-、-NR-(Rは水素原子または炭素数1~14のアルキル基を表す。)、または-S-を表す。R12は水素原子、ハロゲン原子、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表す。)
Examples of such an organic group that induces radical polymerization include organic groups represented by the following formulas [X-1] to [X-18], [W], [Y], and [Z].
Figure JPOXMLDOC01-appb-C000039
(In formulas [X-1] to [X-18], * indicates a binding site, S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is. Represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (among the alkyl groups having 1 to 10 carbon atoms, a part of the −CH2- group of the alkyl group having 2 to 10 carbon atoms is replaced with an oxygen atom. However, in S2R or NR, when a part of the −CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.). R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)
Figure JPOXMLDOC01-appb-C000040
(In the formulas [W], [Y], and [Z], * indicates a bond site, and Ar is a group consisting of phenylene, naphthylene, and biphenylylene which may have an organic group and / or a halogen atom as a substituent. R 9 and R 10 each independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and R 9 and R 10 are alkyl groups. In the case of, they may be bonded to each other at the ends to form a ring structure. Q represents any of the following structures.
Figure JPOXMLDOC01-appb-C000041
(In the formula, R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is shown.). S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-. R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )
 重合体としては、ポリイミド前駆体、ポリイミド、ポリウレア、ポリアミド、ポリアクリレート、ポリメタクリレート、及びポリオルガノシロキサンからなる群から選ばれる少なくとも1種の重合体が好ましい。 As the polymer, at least one polymer selected from the group consisting of a polyimide precursor, a polyimide, a polyurea, a polyamide, a polyacrylate, a polymethacrylate, and a polyorganosiloxane is preferable.
 本発明に用いるラジカル発生膜を得るために、前記ラジカル重合を誘発する有機基を有する重合体を用いる場合、ラジカルを発生しうる基を有する重合体を得るには、モノマー成分として、メタクリル基、アクリル基、ビニル基、アリル基、クマリン基、スチリル基及びシンナモイル基から選択される少なくとも一種を含む光反応性の側鎖を有するモノマーや、紫外線照射により分解し、ラジカルを発生する部位を側鎖に有するモノマーを用いて製造することが好ましい。一方で、ラジカルを発生するモノマーはそれ自体が自発的に重合をしてしまうなどの問題点が考えられ、不安定化合物となってしまうため、合成のしやすさの点ではラジカル発生部位を有するジアミンから誘導される重合体が好ましく、ポリアミック酸やポリアミック酸エステル等のポリイミド前駆体、ポリイミド、ポリウレア、ポリアミドなどがより好ましい。 When a polymer having an organic group that induces radical polymerization is used to obtain a radical generation film used in the present invention, in order to obtain a polymer having a group capable of generating radicals, a methacrylic group is used as a monomer component. A monomer having a photoreactive side chain containing at least one selected from an acrylic group, a vinyl group, an allyl group, a coumarin group, a styryl group and a cinnamoyl group, and a site that is decomposed by ultraviolet irradiation and generates a radical is a side chain. It is preferable to use the monomer contained in the above. On the other hand, the monomer that generates radicals has a problem that it spontaneously polymerizes, and becomes an unstable compound. Therefore, it has a radical generation site in terms of ease of synthesis. Polymers derived from diamines are preferred, and polyimide precursors such as polyamic acids and polyamic acid esters, polyimides, polyureas, polyamides and the like are more preferred.
 ラジカル重合を誘発する有機基を含有する重合体は、ラジカル重合を誘発する有機基を含有するジアミンを含むジアミン成分を用いて得られるポリイミド前駆体、ポリイミド、ポリウレアおよびポリアミドから選ばれる少なくとも一種の重合体であることが好ましい。
 そのようなラジカル重合を誘発する有機基を含有するジアミンは、具体的には、例えば、ラジカルを発生し重合可能な側鎖を有するジアミンであり、下記の式(6)で表される構造を有するジアミンを挙げることができるが、これに限定されるものではない。
Figure JPOXMLDOC01-appb-C000042
(式(6)中、Rは単結合、-CH-、-O-、-COO-、-OCO-、-NHCO-、-CONH-、-NH-、-CHO-、-N(CH)-、-CON(CH)-、又は-N(CH)CO-を表し、
 Rは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表し、当該アルキレン基の任意の-CH-又は-CF-の1以上は、それぞれ独立に-CH=CH-、二価の炭素環、および二価の複素環から選ばれる基で置き換えられていてもよく、さらに、次に挙げるいずれかの基、すなわち、-O-、-COO-、-OCO-、-NHCO-、-CONH-、又は-NH-が互いに隣り合わないことを条件に、これらの基で置き換えられていてもよい;
 Rは、下記式[X-1]~[X-18]から選択される式で表されるラジカル重合反応性基を表す。
Figure JPOXMLDOC01-appb-C000043
(式[X-1]~[X-18]中、*は結合部位を示し、S、およびSはそれぞれ独立して-O-、-NR-、または-S-を表し、Rは水素原子、または炭素数1~10のアルキル基を表す(前記炭素数1~10のアルキル基のうち、炭素数2~10のアルキル基の-CH-基の一部は酸素原子に置き換わっていてもよい。ただし、SRまたはNRにおいて、前記アルキル基の-CH-基の一部が酸素原子に置き換わっている場合、前記酸素原子は、SまたはNには、直接結合していない。)。R、およびRはそれぞれ独立して水素原子、ハロゲン原子、または炭素数1~4のアルキル基を表す。))
The polymer containing an organic group that induces radical polymerization is at least one weight selected from a polyimide precursor, a polyimide, a polyurea, and a polyamide obtained by using a diamine component containing a diamine containing an organic group that induces radical polymerization. It is preferably coalesced.
The diamine containing an organic group that induces such radical polymerization is, specifically, for example, a diamine having a side chain that can generate radicals and can be polymerized, and has a structure represented by the following formula (6). Examples include, but are not limited to, having diamines.
Figure JPOXMLDOC01-appb-C000042
(In formula (6), R 6 is a single bond, -CH 2- , -O-, -COO-, -OCO-, -NHCO-, -CONH-, -NH-, -CH 2 O-, -N. Represents (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
R 7 represents an alkylene group having 1 to 20 carbon atoms which is single-bonded, or unsubstituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independent of each other. May be replaced with a group selected from -CH = CH-, a divalent carbocycle, and a divalent heterocycle, and any of the following groups, i.e., -O-, -COO-. , -OCO-, -NHCO-, -CONH-, or -NH- may be replaced by these groups provided they are not adjacent to each other;
R 8 represents a radical polymerization reactive group represented by a formula selected from the following formulas [X-1] to [X-18].
Figure JPOXMLDOC01-appb-C000043
(In formulas [X-1] to [X-18], * indicates a binding site, S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is. Represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (among the alkyl groups having 1 to 10 carbon atoms, a part of the −CH2- group of the alkyl group having 2 to 10 carbon atoms is replaced with an oxygen atom. However, in S2R or NR, when a part of the −CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.). R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)))
 式(6)における二つのアミノ基(-NH)の結合位置は限定されない。具体的には、側鎖の結合基に対して、ベンゼン環上の2,3の位置、2,4の位置、2,5の位置、2,6の位置、3,4の位置、3,5の位置が挙げられる。なかでも、ポリアミック酸を合成する際の反応性の観点から、2,4の位置、2,5の位置、又は3,5の位置が好ましい。ジアミンを合成する際の容易性も加味すると、2,4の位置、又は3,5の位置がより好ましい。 The bonding position of the two amino groups (-NH 2 ) in the formula (6) is not limited. Specifically, with respect to the bonding group of the side chain, 2,3 positions, 2,4 positions, 2,5 positions, 2,6 positions, 3,4 positions, 3, on the benzene ring. The position of 5 is mentioned. Of these, the 2,4 position, the 2,5 position, or the 3,5 position is preferable from the viewpoint of reactivity in synthesizing the polyamic acid. Considering the ease of synthesizing the diamine, the positions 2, 4 or 3, 5 are more preferable.
 メタクリル基、アクリル基、ビニル基、アリル基、クマリル基、スチリル基及びシンナモイル基からなる群から選ばれる少なくとも1種を含む光反応性基を有するジアミンとしては、具体的には、以下のような化合物が挙げられるが、これらに限定されるものではない。
Figure JPOXMLDOC01-appb-C000044
(式中、Jは単結合、-O-、-COO-、-NHCO-、及び-NH-より選ばれる結合基であり、Jは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表す。)
Specific examples of the diamine having a photoreactive group including at least one selected from the group consisting of a methacryl group, an acrylic group, a vinyl group, an allyl group, a coumaryl group, a styryl group and a cinnamoyl group are as follows. Examples include, but are not limited to, compounds.
Figure JPOXMLDOC01-appb-C000044
(In the formula, J 1 is a bonding group selected from a single bond, -O-, -COO-, -NHCO-, and -NH-, and J 2 is a single bond, or unsubstituted or substituted with a fluorine atom. Represents an alkylene group having 1 to 20 carbon atoms.)
 ラジカル重合を誘発する有機基を含有するジアミンのうち、紫外線照射により分解してラジカルを発生する部位を側鎖として有するジアミンは、下記の式(7)又は式(7’)で表される構造を有するジアミンを挙げることができるが、これに限定されるものではない。
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000046
(式(7)及び(7’)中、T及びTは、それぞれ独立に、単結合、-O-、-S-、-COO-、-OCO-、-NHCO-、-CONH-、-NH-、-CHO-、-N(CH)-、-CON(CH)-、又は-N(CH)CO-であり、
 Sは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表し、当該アルキレン基の任意の-CH-又は-CF-の1以上は、それぞれ独立に-CH=CH-、二価の炭素環、および二価の複素環から選ばれる基で置き換えられていてもよく、さらに、次に挙げるいずれかの基、すなわち、-O-、-COO-、-OCO-、-NHCO-、-CONH-、又は-NH-が互いに隣り合わないことを条件に、これらの基で置き換えられていてもよく、
 Eは、単結合、-O-、-C(CH-、-NH-、-CO-、-NHCO-、-COO-、-(CH-、-SO-、-O-(CH-O-、-O-C(CH-、-CO-(CH-、-NH-(CH-、-SO-(CH-、-CONH-(CH-、-CONH-(CH-NHCO-、または-COO-(CH-OCO-であり、mは1~8の整数であり、
 Jは下記式[W]、[Y]及び[Z]から選ばれる式で表される有機基であり、
Figure JPOXMLDOC01-appb-C000047
(式[W]、[Y]、および[Z]中、*はTとの結合箇所を表し、Arは有機基及び/又はハロゲン原子を置換基として有しても良いフェニレン、ナフチレン、及びビフェニリレンからなる群より選ばれる芳香族炭化水素基を示し、R及びR10は、それぞれ独立に、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表し、Qは下記のいずれかの構造を表す。
Figure JPOXMLDOC01-appb-C000048
(式中、R11は-CH-、-NR-、-O-、又は-S-を表し、Rはそれぞれ独立して水素原子又は炭素数1~4のアルキル基を表し、*は結合部位を示す。)。Sは単結合、-O-、-NR-(Rは水素原子または炭素数1~14のアルキル基を表す。)、または-S-を表す。R12は水素原子、ハロゲン原子、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表す。))式(7’)中、qはそれぞれ独立に0又は1であり、少なくとも1つのqは1であり、pは1~2の整数を表す。)
Among diamines containing organic groups that induce radical polymerization, diamines having a site that is decomposed by ultraviolet irradiation to generate radicals as a side chain have a structure represented by the following formula (7) or formula (7'). Diamines having, but are not limited to, may be mentioned.
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000046
(In equations (7) and (7'), T 1 and T 2 are independently single-bonded, -O-, -S-, -COO-, -OCO-, -NHCO-, -CONH-, respectively. -NH-, -CH 2 O-, -N (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
S represents an alkylene group having 1 to 20 carbon atoms which is single-bonded, or unsubstituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independently. It may be replaced with a group selected from -CH = CH-, a divalent carbocycle, and a divalent heterocyclic ring, and further, any of the following groups, that is, -O-, -COO-,. -OCO-, -NHCO-, -CONH-, or -NH- may be replaced by these groups provided they are not adjacent to each other.
E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -COO-,-(CH 2 ) m- , -SO 2- , -O. -(CH 2 ) m -O-, -OC (CH 3 ) 2- , -CO- (CH 2 ) m- , -NH- (CH 2 ) m- , -SO 2- (CH 2 ) m -, -CONH- (CH 2 ) m- , -CONH- (CH 2 ) m -NHCO-, or -COO- (CH 2 ) m -OCO-, where m is an integer from 1 to 8.
J is an organic group represented by a formula selected from the following formulas [W], [Y] and [Z].
Figure JPOXMLDOC01-appb-C000047
(In the formulas [W], [Y], and [Z], * represents a bond with T 2 , Ar represents an organic group and / or a halogen atom as a substituent, phenylene, naphthylene, and Indicates an aromatic hydrocarbon group selected from the group consisting of biphenylylene, R 9 and R 10 independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and Q is described below. Represents either structure.
Figure JPOXMLDOC01-appb-C000048
(In the formula, R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is shown.). S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-. R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )) In equation (7'), q is independently 0 or 1, at least one q is 1, and p represents an integer of 1 to 2. )
 上記式(7)における二つのアミノ基(-NH)の結合位置は限定されない。具体的には、側鎖の結合基に対して、ベンゼン環上の2,3の位置、2,4の位置、2,5の位置、2,6の位置、3,4の位置、3,5の位置が挙げられる。なかでも、ポリアミック酸を合成する際の反応性の観点から、2,4の位置、2,5の位置、又は3,5の位置が好ましい。 The bonding position of the two amino groups (-NH 2 ) in the above formula (7) is not limited. Specifically, with respect to the bonding group of the side chain, 2,3 positions, 2,4 positions, 2,5 positions, 2,6 positions, 3,4 positions, 3, on the benzene ring. The position of 5 is mentioned. Of these, the 2,4 position, the 2,5 position, or the 3,5 position is preferable from the viewpoint of reactivity in synthesizing the polyamic acid.
 特に合成の容易さ、汎用性の高さ、特性などの点を鑑みて、下記式で表される構造が最も好ましいが、これらに限定されない。
Figure JPOXMLDOC01-appb-C000049
(式中、nは2~8の整数である。)
In particular, in view of ease of synthesis, high versatility, characteristics, and the like, the structure represented by the following formula is most preferable, but the structure is not limited thereto.
Figure JPOXMLDOC01-appb-C000049
(In the formula, n is an integer of 2 to 8.)
 上記式(7’)におけるベンゼン環上のアミノ基(-NH)と結合基Eの結合位置は限定されない。原料の入手性や、液晶表示素子にした際の配向品位や黒輝度の観点から、パラ位が好ましい。 The bonding position of the amino group (-NH 2 ) and the bonding group E on the benzene ring in the above formula (7') is not limited. The para position is preferable from the viewpoint of availability of raw materials, orientation quality when used as a liquid crystal display element, and black brightness.
 式(7)及び式(7’)で表されるジアミンにおいては特に合成の容易さ、汎用性の高さ、特性などの点を鑑みて、下記式で表される構造が最も好ましいが、これらに限定されない。
Figure JPOXMLDOC01-appb-C000050
(式中、nは2~8の整数であり、Eは、単結合、-O-、-C(CH-、-NH-、-CO-、-NHCO-、-CONH-、-COO-、-OCO-、-(CH-、-SO-、-O-(CH-O-、-O-C(CH-、-C(CH-O-、-CO-(CH-、-(CH-CO-、-NH-(CH-、-(CH-NH-、-SO-(CH-、-(CH-SO-、-CONH-(CH-、-(CH-NHCO-、-CONH-(CH-NHCO-または-COO-(CH-OCO-であり、mは1~8の整数である。)
In the diamines represented by the formulas (7) and (7'), the structures represented by the following formulas are most preferable in consideration of ease of synthesis, high versatility, characteristics and the like. Not limited to.
Figure JPOXMLDOC01-appb-C000050
(In the equation, n is an integer of 2 to 8, and E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -CONH-,-. COO-, -OCO-,-(CH 2 ) m- , -SO 2- , -O- (CH 2 ) m -O-, -OC (CH 3 ) 2- , -C (CH 3 ) 2 -O-, -CO- (CH 2 ) m -,-(CH 2 ) m -CO-, -NH- (CH 2 ) m -,-(CH 2 ) m -NH-, -SO 2- (CH) 2 ) m -,-(CH 2 ) m -SO 2- , -CONH- (CH 2 ) m -,-(CH 2 ) m -NHCO-, -CONH- (CH 2 ) m -NHCO- or -COO -(CH 2 ) m -OCO-, where m is an integer of 1-8.)
 上記のジアミンは、ラジカル発生膜とした際の液晶配向性、重合反応における感度、電圧保持特性、蓄積電荷などの特性に応じて、1種類又は2種類以上を混合して使用することもできる。 The above diamine can be used alone or in combination of two or more depending on the liquid crystal orientation when the radical generation film is formed, the sensitivity in the polymerization reaction, the voltage holding characteristic, the accumulated charge and the like.
 このようなラジカル重合を誘発する有機基を含有するジアミンは、ラジカル発生膜形成組成物に含有させる重合体の合成に用いるジアミン成分全体の5~50モル%となる量を用いることが好ましく、より好ましくは10~40モル%であり、特に好ましくは15~30モル%である。 As the diamine containing an organic group that induces such radical polymerization, it is preferable to use an amount of 5 to 50 mol% of the total diamine component used for synthesizing the polymer contained in the radical generation film forming composition. It is preferably 10 to 40 mol%, and particularly preferably 15 to 30 mol%.
 なお、本発明のラジカル発生膜に用いる重合体をジアミンから得る場合、本発明の効果を損なわない限りにおいて、上記ラジカル重合を誘発する有機基を含有するジアミン以外の、その他のジアミンをジアミン成分として併用することができる。具体的には、p-フェニレンジアミン、2,3,5,6-テトラメチル-p-フェニレンジアミン、2,5-ジメチル-p-フェニレンジアミン、m-フェニレンジアミン、2,4-ジメチル-m-フェニレンジアミン、2,5-ジアミノトルエン、2,6-ジアミノトルエン、2,5-ジアミノフェノール、2,4-ジアミノフェノール、3,5-ジアミノフェノール、3,5-ジアミノベンジルアルコール、2,4-ジアミノベンジルアルコール、4,6-ジアミノレゾルシノール、4,4’-ジアミノビフェニル、3,3’-ジメチル-4,4’-ジアミノビフェニル、3,3’-ジメトキシ-4,4’-ジアミノビフェニル、3,3’-ジヒドロキシ-4,4’-ジアミノビフェニル、3,3’-ジカルボキシ-4,4’-ジアミノビフェニル、3,3’-ジフルオロ-4,4’-ジアミノビフェニル、3,3’-ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル、3,4’-ジアミノビフェニル、3,3’-ジアミノビフェニル、2,2’-ジアミノビフェニル、2,3’-ジアミノビフェニル、4,4’-ジアミノジフェニルメタン、3,3’-ジアミノジフェニルメタン、3,4’-ジアミノジフェニルメタン、2,2’-ジアミノジフェニルメタン、2,3’-ジアミノジフェニルメタン、4,4’-ジアミノジフェニルエーテル、3,3’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、2,2’-ジアミノジフェニルエーテル、2,3’-ジアミノジフェニルエーテル、4,4’-スルホニルジアニリン、3,3’-スルホニルジアニリン、ビス(4-アミノフェニル)シラン、ビス(3-アミノフェニル)シラン、ジメチル-ビス(4-アミノフェニル)シラン、ジメチル-ビス(3-アミノフェニル)シラン、4,4’-チオジアニリン、3,3’-チオジアニリン、4,4’-ジアミノジフェニルアミン、3,3’-ジアミノジフェニルアミン、3,4’-ジアミノジフェニルアミン、2,2’-ジアミノジフェニルアミン、2,3’-ジアミノジフェニルアミン、N-メチル(4,4’-ジアミノジフェニル)アミン、N-メチル(3,3’-ジアミノジフェニル)アミン、N-メチル(3,4’-ジアミノジフェニル)アミン、N-メチル(2,2’-ジアミノジフェニル)アミン、N-メチル(2,3’-ジアミノジフェニル)アミン、4,4’-ジアミノベンゾフェノン、3,3’-ジアミノベンゾフェノン、3,4’-ジアミノベンゾフェノン、2,2’-ジアミノベンゾフェノン、2,3’-ジアミノベンゾフェノン、1,4-ジアミノナフタレン、1,5-ジアミノナフタレン、1,6-ジアミノナフタレン、1,7-ジアミノナフタレン、1,8-ジアミノナフタレン、2,5-ジアミノナフタレン、2,6-ジアミノナフタレン、2,7-ジアミノナフタレン、1,2-ビス(4-アミノフェニル)エタン、1,2-ビス(3-アミノフェニル)エタン、1,3-ビス(4-アミノフェニル)プロパン、1,3-ビス(3-アミノフェニル)プロパン、1,4-ビス(4-アミノフェニル)ブタン、1,4-ビス(3-アミノフェニル)ブタン、ビス(3,5-ジエチル-4-アミノフェニル)メタン、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、1,4-ビス(4-アミノフェニル)ベンゼン、1,3-ビス(4-アミノフェニル)ベンゼン、1,4-ビス(4-アミノベンジル)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、4,4’-[1,4-フェニレンビス(メチレン)]ジアニリン、4,4’-[1,3-フェニレンビス(メチレン)]ジアニリン、3,4’-[1,4-フェニレンビス(メチレン)]ジアニリン、3,4’-[1,3-フェニレンビス(メチレン)]ジアニリン、3,3’-[1,4-フェニレンビス(メチレン)]ジアニリン、3,3’-[1,3-フェニレンビス(メチレン)]ジアニリン、1,4-フェニレンビス[(4-アミノフェニル)メタノン]、1,4-フェニレンビス[(3-アミノフェニル)メタノン]、1,3-フェニレンビス[(4-アミノフェニル)メタノン]、1,3-フェニレンビス[(3-アミノフェニル)メタノン]、1,4-フェニレンビス(4-アミノベンゾエート)、1,4-フェニレンビス(3-アミノベンゾエート)、1,3-フェニレンビス(4-アミノベンゾエート)、1,3-フェニレンビス(3-アミノベンゾエート)、ビス(4-アミノフェニル)テレフタレート、ビス(3-アミノフェニル)テレフタレート、ビス(4-アミノフェニル)イソフタレート、ビス(3-アミノフェニル)イソフタレート、N,N’-(1,4-フェニレン)ビス(4-アミノベンズアミド)、N,N’-(1,3-フェニレン)ビス(4-アミノベンズアミド)、N,N’-(1,4-フェニレン)ビス(3-アミノベンズアミド)、N,N’-(1,3-フェニレン)ビス(3-アミノベンズアミド)、N,N’-ビス(4-アミノフェニル)テレフタルアミド、N,N’-ビス(3-アミノフェニル)テレフタルアミド、N,N’-ビス(4-アミノフェニル)イソフタルアミド、N,N’-ビス(3-アミノフェニル)イソフタルアミド、9,10-ビス(4-アミノフェニル)アントラセン、4,4’-ビス(4-アミノフェノキシ)ジフェニルスルホン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]プロパン、2,2-ビス[4-(4-アミノフェノキシ)フェニル]ヘキサフルオロプロパン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、2,2-ビス(3-アミノフェニル)ヘキサフルオロプロパン、2,2-ビス(3-アミノ-4-メチルフェニル)ヘキサフルオロプロパン、2,2-ビス(4-アミノフェニル)プロパン、2,2-ビス(3-アミノフェニル)プロパン、2,2-ビス(3-アミノ-4-メチルフェニル)プロパン、トランス-1,4-ビス(4-アミノフェニル)シクロヘキサン、3,5-ジアミノ安息香酸、2,5-ジアミノ安息香酸、ビス(4-アミノフェノキシ)メタン、1,2-ビス(4-アミノフェノキシ)エタン、1,3-ビス(4-アミノフェノキシ)プロパン、1,3-ビス(3-アミノフェノキシ)プロパン、1,4-ビス(4-アミノフェノキシ)ブタン、1,4-ビス(3-アミノフェノキシ)ブタン、1,5-ビス(4-アミノフェノキシ)ペンタン、1,5-ビス(3-アミノフェノキシ)ペンタン、1,6-ビス(4-アミノフェノキシ)へキサン、1,6-ビス(3-アミノフェノキシ)へキサン、1,7-ビス(4-アミノフェノキシ)ヘプタン、1,7-ビス(3-アミノフェノキシ)ヘプタン、1,8-ビス(4-アミノフェノキシ)オクタン、1,8-ビス(3-アミノフェノキシ)オクタン、1,9-ビス(4-アミノフェノキシ)ノナン、1,9-ビス(3-アミノフェノキシ)ノナン、1,10-ビス(4-アミノフェノキシ)デカン、1,10-ビス(3-アミノフェノキシ)デカン、1,11-ビス(4-アミノフェノキシ)ウンデカン、1,11-ビス(3-アミノフェノキシ)ウンデカン、1,12-ビス(4-アミノフェノキシ)ドデカン、1,12-ビス(3-アミノフェノキシ)ドデカンなどの芳香族ジアミン;ビス(4-アミノシクロヘキシル)メタン、ビス(4-アミノ-3-メチルシクロヘキシル)メタンなどの脂環式ジアミン;1,3-ジアミノプロパン、1,4-ジアミノブタン、1,5-ジアミノペンタン、1,6-ジアミノへキサン、1,7-ジアミノヘプタン、1,8-ジアミノオクタン、1,9-ジアミノノナン、1,10-ジアミノデカン、1,11-ジアミノウンデカン、1,12-ジアミノドデカンなどの脂肪族ジアミン;1,3-ビス[2-(p-アミノフェニル)エチル]ウレア、1,3-ビス[2-(p-アミノフェニル)エチル]-1-tert-ブトキシカルボニルウレア等のウレア構造を有するジアミン;N-p-アミノフェニル-4-p-アミノフェニル(tert-ブトキシカルボニル)アミノメチルピペリジン等の含窒素不飽和複素環構造を有するジアミン;N-tert-ブトキシカルボニル-N-(2-(4-アミノフェニル)エチル)-N-(4-アミノベンジル)アミン等のN-Boc基(Bocはtert-ブトキシカルボニル基を表す)を有するジアミン等が挙げられる。 When the polymer used for the radical polymerization film of the present invention is obtained from a diamine, other diamines other than the diamine containing an organic group that induces the radical polymerization are used as the diamine component as long as the effect of the present invention is not impaired. Can be used together. Specifically, p-phenylenediamine, 2,3,5,6-tetramethyl-p-phenylenediamine, 2,5-dimethyl-p-phenylenediamine, m-phenylenediamine, 2,4-dimethyl-m- Phenylene diamine, 2,5-diaminotoluene, 2,6-diaminotoluene, 2,5-diaminophenol, 2,4-diaminophenol, 3,5-diaminophenol, 3,5-diaminobenzyl alcohol, 2,4- Diaminobenzyl alcohol, 4,6-diaminoresorcinol, 4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethoxy-4,4'-diaminobiphenyl, 3 , 3'-Dihydroxy-4,4'-diaminobiphenyl, 3,3'-dicarboxy-4,4'-diaminobiphenyl, 3,3'-difluoro-4,4'-diaminobiphenyl, 3,3'- Bis (Trifluoromethyl) -4,4'-diaminobiphenyl, 3,4'-diaminobiphenyl, 3,3'-diaminobiphenyl, 2,2'-diaminobiphenyl, 2,3'-diaminobiphenyl, 4,4 '-Diaminodiphenylmethane, 3,3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 2,2'-diaminodiphenylmethane, 2,3'-diaminodiphenylmethane, 4,4'-diaminodiphenylether, 3,3'- Diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 2,2'-diaminodiphenyl ether, 2,3'-diaminodiphenyl ether, 4,4'-sulfonyldianiline, 3,3'-sulfonyldianiline, bis (4-amino) Phenyl) silane, bis (3-aminophenyl) silane, dimethyl-bis (4-aminophenyl) silane, dimethyl-bis (3-aminophenyl) silane, 4,4'-thiodianiline, 3,3'-thiodianiline, 4 , 4'-diaminodiphenylamine, 3,3'-diaminodiphenylamine, 3,4'-diaminodiphenylamine, 2,2'-diaminodiphenylamine, 2,3'-diaminodiphenylamine, N-methyl (4,4'-diaminodiphenyl) ) Amine, N-methyl (3,3'-diaminodiphenyl) amine, N-methyl (3,4'-diaminodiphenyl) amine, N-methyl (2,2'-diaminodiphenyl) amine, N-methyl (2) , 3'-diaminodiphenyl) amine, 4,4'- Diaminobenzophenone, 3,3'-diaminobenzophenone, 3,4'-diaminobenzophenone, 2,2'-diaminobenzophenone, 2,3'-diaminobenzophenone, 1,4-diaminonaphthalene, 1,5-diaminonaphthalene, 1 , 6-Diaminonaphthalene, 1,7-diaminonaphthalene, 1,8-diaminonaphthalene, 2,5-diaminonaphthalene, 2,6-diaminonaphthalene, 2,7-diaminonaphthalene, 1,2-bis (4-amino) Phenyl) ethane, 1,2-bis (3-aminophenyl) ethane, 1,3-bis (4-aminophenyl) propane, 1,3-bis (3-aminophenyl) propane, 1,4-bis (4) -Aminophenyl) butane, 1,4-bis (3-aminophenyl) butane, bis (3,5-diethyl-4-aminophenyl) methane, 1,4-bis (4-aminophenoxy) benzene, 1,3 -Bis (4-aminophenoxy) benzene, 1,4-bis (4-aminophenyl) benzene, 1,3-bis (4-aminophenyl) benzene, 1,4-bis (4-aminobenzyl) benzene, 1 , 3-bis (4-aminophenoxy) benzene, 4,4'-[1,4-phenylenebis (methylene)] dianiline, 4,4'-[1,3-phenylenebis (methylene)] dianiline, 3, 4'-[1,4-Benzenebis (methylene)] dianylin, 3,4'-[1,3-phenylenebis (methylene)] dianylin, 3,3'-[1,4-phenylenebis (methylene)] Dianiline, 3,3'-[1,3-phenylenebis (methylene)] dianiline, 1,4-phenylenebis [(4-aminophenyl) methanone], 1,4-phenylenebis [(3-aminophenyl) methanone] ], 1,3-Phenylenebis [(4-aminophenyl) methanone], 1,3-Phenylenebis [(3-aminophenyl) methanone], 1,4-Phenylenebis (4-aminobenzoate), 1,4 -Phenylenebis (3-aminobenzoate), 1,3-phenylenebis (4-aminobenzoate), 1,3-phenylenebis (3-aminobenzoate), bis (4-aminophenyl) terephthalate, bis (3-amino) Phenyl) terephthalate, bis (4-aminophenyl) isophthalate, bis (3-aminophenyl) isophthalate, N, N'-(1,4-phenylene) bis (4-aminobenzamide), N, N'-( 1 , 3-Phenylene) bis (4-aminobenzamide), N, N'-(1,4-phenylene) bis (3-aminobenzamide), N, N'-(1,3-phenylene) bis (3-amino) Benzamide), N, N'-bis (4-aminophenyl) terephthalamide, N, N'-bis (3-aminophenyl) terephthalamide, N, N'-bis (4-aminophenyl) isophthalamide, N, N'-bis (3-aminophenyl) isophthalamide, 9,10-bis (4-aminophenyl) anthracene, 4,4'-bis (4-aminophenoxy) diphenyl sulfone, 2,2-bis [4- (4) 4-Aminophenoxy) Phenyl] Propane, 2,2-Bis [4- (4-Aminophenoxy) Phenyl] Hexafluoropropane, 2,2-Bis (4-Aminophenyl) Hexafluoropropane, 2,2-Bis ( 3-Aminophenyl) Hexafluoropropane, 2,2-bis (3-amino-4-methylphenyl) Hexafluoropropane, 2,2-bis (4-aminophenyl) propane, 2,2-bis (3-amino) Phenyl) propane, 2,2-bis (3-amino-4-methylphenyl) propane, trans-1,4-bis (4-aminophenyl) cyclohexane, 3,5-diaminobenzoic acid, 2,5-diaminobenzoic acid Acid, bis (4-aminophenoxy) methane, 1,2-bis (4-aminophenoxy) ethane, 1,3-bis (4-aminophenoxy) propane, 1,3-bis (3-aminophenoxy) propane, 1,4-Bis (4-aminophenoxy) butane, 1,4-bis (3-aminophenoxy) butane, 1,5-bis (4-aminophenoxy) pentane, 1,5-bis (3-aminophenoxy) Pentan, 1,6-bis (4-aminophenoxy) hexane, 1,6-bis (3-aminophenoxy) hexane, 1,7-bis (4-aminophenoxy) heptane, 1,7-bis (3) -Aminophenoxy) heptane, 1,8-bis (4-aminophenoxy) octane, 1,8-bis (3-aminophenoxy) octane, 1,9-bis (4-aminophenoxy) nonane, 1,9-bis (3-Aminophenoxy) nonane, 1,10-bis (4-aminophenoxy) decane, 1,10-bis (3-aminophenoxy) decane, 1,11-bis (4-aminophenoxy) undecane, 1,11 -Bis (3-aminophenoxy) undecane, 1,12- Aromatic diamines such as bis (4-aminophenoxy) dodecane, 1,12-bis (3-aminophenoxy) dodecane; bis (4-aminocyclohexyl) methane, bis (4-amino-3-methylcyclohexyl) methane, etc. Alicyclic diamines; 1,3-diaminopropane, 1,4-diaminobutane, 1,5-diaminopentane, 1,6-diaminohexane, 1,7-diaminoheptane, 1,8-diaminooctane, 1, Aliphatic diamines such as 9-diaminononane, 1,10-diaminodecane, 1,11-diaminoundecane, 1,12-diaminododecane; 1,3-bis [2- (p-aminophenyl) ethyl] urea, 1, Diamine having a urea structure such as 3-bis [2- (p-aminophenyl) ethyl] -1-tert-butoxycarbonyl urea; Np-aminophenyl-4-p-aminophenyl (tert-butoxycarbonyl) amino Diamine having a nitrogen-containing unsaturated heterocyclic structure such as methylpiperidin; N-Boc such as N-tert-butoxycarbonyl-N- (2- (4-aminophenyl) ethyl) -N- (4-aminobenzyl) amine Examples thereof include diamines having a group (Boc represents a tert-butoxycarbonyl group).
 上記その他のジアミンは、ラジカル発生膜とした際の液晶配向性、重合反応における感度、電圧保持特性、蓄積電荷などの特性に応じて、1種類又は2種類以上を混合して使用することもできる。 The above other diamines may be used alone or in combination of two or more depending on the liquid crystal orientation when the radical generation film is formed, the sensitivity in the polymerization reaction, the voltage holding characteristics, the accumulated charge and the like. ..
 重合体がポリアミック酸である場合の合成で、上記のジアミン成分と反応させるテトラカルボン酸二無水物は特に限定されない。具体的には、ピロメリット酸、2,3,6,7-ナフタレンテトラカルボン酸、1,2,5,6-ナフタレンテトラカルボン酸、1,4,5,8-ナフタレンテトラカルボン酸、2,3,6,7-アントラセンテトラカルボン酸、1,2,5,6-アントラセンテトラカルボン酸、3,3’,4,4’-ビフェニルテトラカルボン酸、2,3,3’,4’-ビフェニルテトラカルボン酸、ビス(3,4-ジカルボキシフェニル)エーテル、3,3’,4,4’-ベンゾフェノンテトラカルボン酸、ビス(3,4-ジカルボキシフェニル)スルホン、ビス(3,4-ジカルボキシフェニル)メタン、2,2-ビス(3,4-ジカルボキシフェニル)プロパン、1,1,1,3,3,3-ヘキサフルオロ-2,2-ビス(3,4-ジカルボキシフェニル)プロパン、ビス(3,4-ジカルボキシフェニル)ジメチルシラン、ビス(3,4-ジカルボキシフェニル)ジフェニルシラン、2,3,4,5-ピリジンテトラカルボン酸、2,6-ビス(3,4-ジカルボキシフェニル)ピリジン、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸、3,4,9,10-ペリレンテトラカルボン酸、1,3-ジフェニル-1,2,3,4-シクロブタンテトラカルボン酸、4,4’-オキシジフタル酸、1,2,3,4-シクロブタンテトラカルボン酸、1,2,3,4-シクロペンタンテトラカルボン酸、1,2,4,5-シクロヘキサンテトラカルボン酸、1,2,3,4-テトラメチル-1,2,3,4-シクロブタンテトラカルボン酸、1,2-ジメチル-1,2,3,4-シクロブタンテトラカルボン酸、1,3-ジメチル-1,2,3,4-シクロブタンテトラカルボン酸、1,2,3,4-シクロヘプタンテトラカルボン酸、テトラヒドロフラン-2,3,4,5-テトラカルボン酸、2-(3,4-ジカルボキシシクロへキシル)コハク酸、2,3,5-トリカルボキシシクロペンチル酢酸、3,4-ジカルボキシ-1,2,3,4-テトラヒドロ-1-ナフタレンコハク酸、ビシクロ[3.3.0]オクタン-2,4,6,8-テトラカルボン酸、ビシクロ[4.3.0]ノナン-2,4,7,9-テトラカルボン酸、ビシクロ[4.4.0]デカン-2,4,7,9-テトラカルボン酸、ビシクロ[4.4.0]デカン-2,4,8,10-テトラカルボン酸、トリシクロ[6.3.0.0<2,6>]ウンデカン-3,5,9,11-テトラカルボン酸、1,2,3,4-ブタンテトラカルボン酸、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレン-1,2-ジカルボン酸、ビシクロ[2.2.2]オクタ-7-エン-2,3,5,6-テトラカルボン酸、5-(2,5-ジオキソテトラヒドロフリル)-3-メチル-3-シクロへキサン-1,2-ジカルボン酸、テトラシクロ[6.2.1.1<3,6>.0<2,7>]ドデカン-4,5,9,10-テトラカルボン酸、3,5,6-トリカルボキシノルボルナン-2:3,5:6ジカルボン酸、1,2,4,5-シクロヘキサンテトラカルボン酸等のテトラカルボン酸の二無水物が挙げられる。 The tetracarboxylic dianhydride that reacts with the above diamine component in the synthesis when the polymer is a polyamic acid is not particularly limited. Specifically, pyromellitic acid, 2,3,6,7-naphthalenetetracarboxylic acid, 1,2,5,6-naphthalenetetracarboxylic acid, 1,4,5,8-naphthalenetetracarboxylic acid, 2, 3,6,7-Anthracenetetracarboxylic acid, 1,2,5,6-anthracenetetracarboxylic acid, 3,3', 4,4'-biphenyltetracarboxylic acid, 2,3,3', 4'-biphenyl Tetracarboxylic acid, bis (3,4-dicarboxyphenyl) ether, 3,3', 4,4'-benzophenone tetracarboxylic acid, bis (3,4-dicarboxyphenyl) sulfone, bis (3,4-dicarboxyphenyl) Carboxyphenyl) methane, 2,2-bis (3,4-dicarboxyphenyl) propane, 1,1,1,3,3,3-hexafluoro-2,2-bis (3,4-dicarboxyphenyl) Propane, bis (3,4-dicarboxyphenyl) dimethylsilane, bis (3,4-dicarboxyphenyl) diphenylsilane, 2,3,4,5-pyridinetetracarboxylic acid, 2,6-bis (3,4) -Dicarboxyphenyl) pyridine, 3,3', 4,4'-diphenylsulfonetetracarboxylic acid, 3,4,9,10-perylenetetracarboxylic acid, 1,3-diphenyl-1,2,3,4- Cyclobutanetetracarboxylic acid, 4,4'-oxydiphthalic acid, 1,2,3,4-cyclobutanetetracarboxylic acid, 1,2,3,4-cyclopentanetetracarboxylic acid, 1,2,4,5-cyclohexanetetra Carboxylic acid, 1,2,3,4-tetramethyl-1,2,3,4-cyclobutanetetracarboxylic acid, 1,2-dimethyl-1,2,3,4-cyclobutanetetracarboxylic acid, 1,3- Dimethyl-1,2,3,4-cyclobutanetetracarboxylic acid, 1,2,3,4-cycloheptanetetracarboxylic acid, tetrahydrofuran-2,3,4,5-tetracarboxylic acid, 2- (3,4-) Dicarboxycyclohexyl) succinic acid, 2,3,5-tricarboxycyclopentylacetic acid, 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic acid, bicyclo [3.3.0 ] Octane-2,4,6,8-tetracarboxylic acid, bicyclo [4.3.0] nonan-2,4,7,9-tetracarboxylic acid, bicyclo [4.4.0] decan-2,4 , 7,9-Tetracarboxylic Acid, Bicyclo [4.4.0] Decane-2,4,8,10-Tetracarboxylic Acid, Tricyclo [6.3.0.0 <2,6>] Undecane-3,5,9,11-tetracarboxylic acid, 1,2,3,4-butanetetracarboxylic acid, 4- (2,5-dioxotetraaxial-3-yl) -1,2,3,4 -Tetrahydronaphthalene-1,2-dicarboxylic acid, bicyclo [2.2.2] octa-7-ene-2,3,5,6-tetracarboxylic acid, 5- (2,5-dioxotetrahydrofuryl)- 3-Methyl-3-cyclohexane-1,2-dicarboxylic acid, tetracyclo [6.2.1.1 <3,6>. 0 <2,7>] Dodecane-4,5,9,10-tetracarboxylic acid, 3,5,6-tricarboxynorbornane-2: 3,5: 6 dicarboxylic acid, 1,2,4,5-cyclohexane Examples thereof include tetracarboxylic acid dianhydrides such as tetracarboxylic acid.
 勿論、テトラカルボン酸二無水物も、ラジカル発生膜とした際の液晶配向性、重合反応における感度、電圧保持特性、蓄積電荷などの特性に応じて、1種類又は2種類以上併用してもよい。 Of course, one or two or more types of tetracarboxylic dianhydride may be used in combination depending on the liquid crystal orientation when the radical generating film is formed, the sensitivity in the polymerization reaction, the voltage holding property, the accumulated charge, and the like. ..
 重合体がポリアミック酸エステルである場合の合成で、上記のジアミン成分と反応させるテトラカルボン酸ジアルキルエステルの構造は特に限定されないが、その具体例を以下に挙げる。 The structure of the tetracarboxylic acid dialkyl ester to be reacted with the above diamine component in the synthesis when the polymer is a polyamic acid ester is not particularly limited, but specific examples thereof are given below.
 脂肪族テトラカルボン酸ジエステルの具体的な例としては1,2,3,4-シクロブタンテトラカルボン酸ジアルキルエステル、1,2-ジメチル-1,2,3,4-シクロブタンテトラカルボン酸ジアルキルエステル、1,3-ジメチル-1,2,3,4-シクロブタンテトラカルボン酸ジアルキルエステル、1,2,3,4-テトラメチル-1,2,3,4-シクロブタンテトラカルボン酸ジアルキルエステル、1,2,3,4-シクロペンタンテトラカルボン酸ジアルキルエステル、テトラヒドロフラン-2,3,4,5-テトラカルボン酸ジアルキルエステル、1,2,4,5-シクロヘキサンテトラカルボン酸ジアルキルエステル、2-(3,4-ジカルボキシシクロヘキシル)コハク酸ジアルキルエステル、3,4-ジカルボキシ-1,2,3,4-テトラヒドロ-1-ナフタレンコハク酸ジアルキルエステル、1,2,3,4-ブタンテトラカルボン酸ジアルキルエステル、ビシクロ[3.3.0]オクタン-2,4,6,8-テトラカルボン酸ジアルキルエステル、3,3’,4,4’-ジシクロヘキシルテトラカルボン酸ジアルキルエステル、2,3,5-トリカルボキシシクロペンチル酢酸ジアルキルエステル、シス-3,7-ジブチルシクロオクタ-1,5-ジエン-1,2,5,6-テトラカルボン酸ジアルキルエステル、トリシクロ[4.2.1.0<2,5>]ノナン-3,4,7,8-テトラカルボン酸-3,4:7,8-ジアルキルエステル、ヘキサシクロ[6.6.0.1<2,7>.0<3,6>.1<9,14>.0<10,13>]ヘキサデカン-4,5,11,12-テトラカルボン酸-4,5:11,12-ジアルキルエステル、4-(2,5-ジオキソテトラヒドロフラン-3-イル)-1,2,3,4-テトラヒドロナフタレンー1,2-ジカルボンジアルキルエステルなどが挙げられる。 Specific examples of the aliphatic tetracarboxylic acid diester include 1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1,2-dimethyl-1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1. , 3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1,2,3,4-tetramethyl-1,2,3,4-cyclobutanetetracarboxylic acid dialkyl ester, 1,2, 3,4-Cyclopentane tetracarboxylic acid dialkyl ester, tetrahydrofuran-2,3,4,5-tetracarboxylic acid dialkyl ester, 1,2,4,5-cyclohexanetetracarboxylic acid dialkyl ester, 2- (3,4-) Dicarboxycyclohexyl) succinic acid dialkyl ester, 3,4-dicarboxy-1,2,3,4-tetrahydro-1-naphthalene succinic acid dialkyl ester, 1,2,3,4-butanetetracarboxylic acid dialkyl ester, bicyclo [3.3.0] Octane-2,4,6,8-tetracarboxylic acid dialkyl ester, 3,3', 4,4'-dicyclohexyltetracarboxylic acid dialkyl ester, 2,3,5-tricarboxycyclopentylacetic acid Dialkyl ester, cis-3,7-dibutylcycloocta-1,5-diene-1,2,5,6-tetracarboxylic acid dialkyl ester, tricyclo [4.2.1.0 <2,5>] nonane- 3,4,7,8-Tetracarboxylic acid-3,4: 7,8-dialkylester, hexacyclo [6.6.0.1 <2,7>. 0 <3,6>. 1 <9,14>. 0 <10,13>] Hexadecane-4,5,11,12-tetracarboxylic acid-4,5:11,12-dialkylester, 4- (2,5-dioxotetrahydrofuran-3-yl) -1, Examples thereof include 2,3,4-tetrahydronaphthalene-1,2-dicarboxylic dialkyl ester.
 芳香族テトラカルボン酸ジアルキルエステルとしては、ピロメリット酸ジアルキルエステル、3,3’,4,4’-ビフェニルテトラカルボン酸ジアルキルエステル、2,2’,3,3’-ビフェニルテトラカルボン酸ジアルキルエステル、2,3,3’,4-ビフェニルテトラカルボン酸ジアルキルエステル、3,3’,4,4’-ベンゾフェノンテトラカルボン酸ジアルキルエステル、2,3,3’,4’-ベンゾフェノンテトラカルボン酸ジアルキルエステル、ビス(3,4-ジカルボキシフェニル)エーテルジアルキルエステル、ビス(3,4-ジカルボキシフェニル)スルホンジアルキルエステル、1,2,5,6-ナフタレンテトラカルボン酸ジアルキルエステル、2,3,6,7-ナフタレンテトラカルボン酸ジアルキルエステルなどが挙げられる。 Examples of the aromatic tetracarboxylic acid dialkyl ester include pyromellitic acid dialkyl ester, 3,3', 4,4'-biphenyltetracarboxylic acid dialkyl ester, 2,2', 3,3'-biphenyltetracarboxylic acid dialkyl ester, and the like. 2,3,3', 4-biphenyltetracarboxylic acid dialkyl ester, 3,3', 4,4'-benzophenone tetracarboxylic acid dialkyl ester, 2,3,3', 4'-benzophenone tetracarboxylic acid dialkyl ester, Bis (3,4-dicarboxyphenyl) ether dialkyl ester, bis (3,4-dicarboxyphenyl) sulfone dialkyl ester, 1,2,5,6-naphthalenetetracarboxylic acid dialkyl ester, 2,3,6,7 -Naphthalene tetracarboxylic acid dialkyl ester and the like can be mentioned.
 重合体がポリウレアである場合の合成で、上記のジアミン成分と反応させるジイソシアネートに関しては、特に限定はせず、入手性等に応じて使用することができる。ジイソシアネートの具体的構造を以下に示す。
Figure JPOXMLDOC01-appb-C000051
 式中R、およびRは炭素数1~10の脂肪族炭化水素基を表す。
In the synthesis when the polymer is polyurea, the diisocyanate to be reacted with the above diamine component is not particularly limited and can be used depending on availability and the like. The specific structure of the diisocyanate is shown below.
Figure JPOXMLDOC01-appb-C000051
In the formula, R 2 and R 3 represent an aliphatic hydrocarbon group having 1 to 10 carbon atoms.
 K-1~K-5に示す脂肪族ジイソシアネートは、反応性は劣るが溶媒溶解性を向上させるメリットがあり、K-6~K-13に示すような芳香族ジイソシアネートは反応性に富み耐熱性を向上させる効果があるが、溶媒溶解性を低下させる欠点が挙げられる。汎用性や特性面においてはK-1、K-7、K-8、K-9、K-10が好ましく、電気特性の観点ではK-12、液晶配向性の観点ではK-13が好ましい。ジイソシアネートは2種以上を併用して使用することもでき、得たい特性に応じて種々適用するのが好ましい。 The aliphatic diisocyanates shown in K-1 to K-5 are inferior in reactivity but have the advantage of improving solvent solubility, and the aromatic diisocyanates shown in K-6 to K-13 are highly reactive and heat resistant. However, there is a drawback that the solvent solubility is lowered. K-1, K-7, K-8, K-9, and K-10 are preferable in terms of versatility and characteristics, K-12 is preferable from the viewpoint of electrical characteristics, and K-13 is preferable from the viewpoint of liquid crystal orientation. Two or more kinds of diisocyanates can be used in combination, and it is preferable to apply various diisocyanates according to the desired characteristics.
 また、一部のジイソシアネートを上記で説明したテトラカルボン酸二無水物に置き換えることもでき、ポリアミック酸とポリウレアの共重合体のような形で使用しても良く、化学イミド化によってポリイミドとポリウレアの共重合体のような形で使用しても良い。 In addition, some diisocyanates can be replaced with the tetracarboxylic acid dianhydride described above, and they may be used in the form of a copolymer of polyamic acid and polyurea. It may be used in the form of a copolymer.
 重合体がポリアミドである場合の合成で、反応させるジカルボン酸の構造は特に限定されないが、あえて具体例を以下に挙げれば以下のとおりである。脂肪族ジカルボン酸としては、マロン酸、蓚酸、ジメチルマロン酸、コハク酸、フマル酸、グルタル酸、アジピン酸、ムコン酸、2-メチルアジピン酸、トリメチルアジピン酸、ピメリン酸、2,2-ジメチルグルタル酸、3,3-ジエチルコハク酸、アゼライイン酸、セバシン酸およびスベリン酸等のジカルボン酸を挙げることができる。 The structure of the dicarboxylic acid to be reacted in the synthesis when the polymer is polyamide is not particularly limited, but specific examples are as follows. Examples of the aliphatic dicarboxylic acid include malonic acid, oxalic acid, dimethylmalonic acid, succinic acid, fumaric acid, glutaric acid, adipic acid, muconic acid, 2-methyladipic acid, trimethyladipic acid, pimelic acid, and 2,2-dimethylglutal. Examples thereof include dicarboxylic acids such as acids, 3,3-diethylsuccinic acid, adipic acid, sebacic acid and suberic acid.
 脂環式系のジカルボン酸としては、1,1-シクロプロパンジカルボン酸、1,2-シクロプロパンジカルボン酸、1,1-シクロブタンジカルボン酸、1,2-シクロブタンジカルボン酸、1,3-シクロブタンジカルボン酸、3,4-ジフェニル-1,2-シクロブタンジカルボン酸、2,4-ジフェニル-1,3-シクロブタンジカルボン酸、1-シクロブテン-1,2-ジカルボン酸、1-シクロブテン-3,4-ジカルボン酸、1,1-シクロペンタンジカルボン酸、1,2-シクロペンタンジカルボン酸、1,3-シクロペンタンジカルボン酸、1,1-シクロヘキサンジカルボン酸、1,2-シクロヘキサンジカルボン酸、1,3-シクロヘキサンジカルボン酸、1,4-シクロヘキサンジカルボン酸、1,4-(2-ノルボルネン)ジカルボン酸、ノルボルネン-2,3-ジカルボン酸、ビシクロ[2.2.2]オクタン-1,4-ジカルボン酸、ビシクロ[2.2.2]オクタン-2,3-ジカルボン酸、2,5-ジオキソ-1,4-ビシクロ[2.2.2]オクタンジカルボン酸、1,3-アダマンタンジカルボン酸、4,8-ジオキソ-1,3-アダマンタンジカルボン酸、2,6-スピロ[3.3]ヘプタンジカルボン酸、1,3-アダマンタン二酢酸、カンファー酸等を挙げることができる。 Examples of the alicyclic dicarboxylic acid include 1,1-cyclopropanedicarboxylic acid, 1,2-cyclopropanedicarboxylic acid, 1,1-cyclobutanedicarboxylic acid, 1,2-cyclobutanedicarboxylic acid, and 1,3-cyclobutanedicarboxylic acid. Acid, 3,4-diphenyl-1,2-cyclobutane dicarboxylic acid, 2,4-diphenyl-1,3-cyclobutane dicarboxylic acid, 1-cyclobutene-1,2-dicarboxylic acid, 1-cyclobutene-3,4-dicarboxylic acid Acid, 1,1-cyclopentanedicarboxylic acid, 1,2-cyclopentanedicarboxylic acid, 1,3-cyclopentanedicarboxylic acid, 1,1-cyclohexanedicarboxylic acid, 1,2-cyclohexanedicarboxylic acid, 1,3-cyclohexane Dicarboxylic acid, 1,4-cyclohexanedicarboxylic acid, 1,4- (2-norbornen) dicarboxylic acid, norbornen-2,3-dicarboxylic acid, bicyclo [2.2.2] octane-1,4-dicarboxylic acid, bicyclo [2.2.2] Octane-2,3-dicarboxylic acid, 2,5-dioxo-1,4-bicyclo [2.2.2] Octanedicarboxylic acid, 1,3-adamantandicarboxylic acid, 4,8- Examples thereof include dioxo-1,3-adamantan dicarboxylic acid, 2,6-spiro [3.3] heptane dicarboxylic acid, 1,3-adamantan diacetic acid, camphor acid and the like.
 芳香族ジカルボン酸としては、o-フタル酸、イソフタル酸、テレフタル酸、5-メチルイソフタル酸、5-tert-ブチルイソフタル酸、5-アミノイソフタル酸、5-ヒドロキシイソフタル酸、2,5-ジメチルテレフタル酸、テトラメチルテレフタル酸、1,4-ナフタレンジカルボン酸、2,5-ナフタレンジカルボン酸、2,6-ナフタレンジカルボン酸、2,7-ナフタレンジカルボン酸、1,4-アントラセンジカルボン酸、1,4-アントラキノンジカルボン酸、2,5-ビフェニルジカルボン酸、4,4’-ビフェニルジカルボン酸、1,5-ビフェニレンジカルボン酸、4,4”-ターフェニルジカルボン酸、4,4’-ジフェニルメタンジカルボン酸、4,4’-ジフェニルエタンジカルボン酸、4,4’-ジフェニルプロパンジカルボン酸、4,4’-ジフェニルヘキサフルオロプロパンジカルボン酸、4,4’-ジフェニルエーテルジカルボン酸、4,4’-ビベンジルジカルボン酸、4,4’-スチルベンジカルボン酸、4,4’-トランジカルボン酸、4,4’-カルボニル二安息香酸、4,4’-スルホニル二安息香酸、4,4’-ジチオ二安息香酸、p-フェニレン二酢酸、3,3’-p-フェニレンジプロピオン酸、4-カルボキシ桂皮酸、p-フェニレンジアクリル酸、3,3’-[4,4’-(メチレンジ-p-フェニレン)]ジプロピオン酸、4,4’-[4,4’-(オキシジ-p-フェニレン)]ジプロピオン酸、4,4’-[4,4’-(オキシジ-p-フェニレン)]二酪酸、(イソプロピリデンジ-p-フェニレンジオキシ)二酪酸、ビス(p-カルボキシフェニル)ジメチルシラン等のジカルボン酸を挙げることができる。 Examples of aromatic dicarboxylic acids include o-phthalic acid, isophthalic acid, terephthalic acid, 5-methylisophthalic acid, 5-tert-butylisophthalic acid, 5-aminoisophthalic acid, 5-hydroxyisophthalic acid, and 2,5-dimethylterephthalic acid. Acid, tetramethylterephthalic acid, 1,4-naphthalenedicarboxylic acid, 2,5-naphthalenedicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 2,7-naphthalenedicarboxylic acid, 1,4-anthracendicarboxylic acid, 1,4 -Anthraquinone dicarboxylic acid, 2,5-biphenyldicarboxylic acid, 4,4'-biphenyldicarboxylic acid, 1,5-biphenylenedicarboxylic acid, 4,4 "-terphenyldicarboxylic acid, 4,4'-diphenylmethanedicarboxylic acid, 4 , 4'-diphenylethanedicarboxylic acid, 4,4'-diphenylpropanedicarboxylic acid, 4,4'-diphenylhexafluoropropanedicarboxylic acid, 4,4'-diphenyletherdicarboxylic acid, 4,4'-bibenzyldicarboxylic acid, 4,4'-Stylbenzicarboxylic acid, 4,4'-transicarboxylic acid, 4,4'-carbonyldibenzoic acid, 4,4'-sulfonyldibenzoic acid, 4,4'-dithiodibenzoic acid, p- Phenylene diacetic acid, 3,3'-p-phenylenedipropionic acid, 4-carboxycarboxylic acid, p-phenylenediacrylic acid, 3,3'-[4,4'-(methylenedi-p-phenylene)] dipropion Acid, 4,4'-[4,4'-(oxydi-p-phenylene)] dipropionic acid, 4,4'-[4,4'-(oxydi-p-phenylene)] dibutyric acid, (isopropyry Examples thereof include dicarboxylic acids such as dendi-p-phenylenedioxy) dibutyric acid and bis (p-carboxyphenyl) dimethylsilane.
 複素環を含むジカルボン酸としては、1,5-(9-オキソフルオレン)ジカルボン酸、3,4-フランジカルボン酸、4,5-チアゾールジカルボン酸、2-フェニル-4,5-チアゾールジカルボン酸、1,2,5-チアジアゾール-3,4-ジカルボン酸、1,2,5-オキサジアゾール-3,4-ジカルボン酸、2,3-ピリジンジカルボン酸、2,4-ピリジンジカルボン酸、2,5-ピリジンジカルボン酸、2,6-ピリジンジカルボン酸、3,4-ピリジンジカルボン酸、3,5-ピリジンジカルボン酸等を挙げることができる。 Examples of the dicarboxylic acid containing a heterocycle include 1,5- (9-oxofluorene) dicarboxylic acid, 3,4-furandicarboxylic acid, 4,5-thiazoledicarboxylic acid, 2-phenyl-4,5-thiazoledicarboxylic acid, and the like. 1,2,5-Thiadiazol-3,4-dicarboxylic acid, 1,2,5-oxadiazole-3,4-dicarboxylic acid, 2,3-pyridinedicarboxylic acid, 2,4-pyridinedicarboxylic acid, 2, Examples thereof include 5-pyridinedicarboxylic acid, 2,6-pyridinedicarboxylic acid, 3,4-pyridinedicarboxylic acid, and 3,5-pyridinedicarboxylic acid.
 上記の各種ジカルボン酸は酸ジハライドあるいは無水の構造のものであってもよい。これらのジカルボン酸類は、特に直線的な構造のポリアミドを与えることが可能なジカルボン酸類であることが液晶分子の配向性を保つ上から好ましい。これらの中でも、テレフタル酸、イソテレフタル酸、1,4-シクロヘキサンジカルボン酸、4,4’-ビフェニルジカルボン酸、4,4’-ジフェニルメタンジカルボン酸、4,4’-ジフェニルエタンジカルボン酸、4,4’-ジフェニルプロパンジカルボン酸、4,4’-ジフェニルヘキサフルオロプロパンジカルボン酸、2,2-ビス(フェニル)プロパンジカルボン酸、4、4-ターフェニルジカルボン酸、2,6-ナフタレンジカルボン酸、2,5-ピリジンジカルボン酸またはこれらの酸ジハライド等が好ましく用いられる。これらの化合物には異性体が存在するものもあるが、それらを含む混合物であってもよい。また、2種以上の化合物を併用してもよい。なお、本発明に使用するジカルボン酸類は、上記の例示化合物に限定されるものではない。 The above-mentioned various dicarboxylic acids may have an acid dihalide or an anhydrous structure. It is particularly preferable that these dicarboxylic acids are dicarboxylic acids capable of giving a polyamide having a linear structure from the viewpoint of maintaining the orientation of the liquid crystal molecules. Among these, terephthalic acid, isoterephthalic acid, 1,4-cyclohexanedicarboxylic acid, 4,4'-biphenyldicarboxylic acid, 4,4'-diphenylmethanedicarboxylic acid, 4,4'-diphenylethanedicarboxylic acid, 4,4 '-Diphenylpropandicarboxylic acid, 4,4'-diphenylhexafluoropropanedicarboxylic acid, 2,2-bis (phenyl) propandicarboxylic acid, 4,4-terphenyldicarboxylic acid, 2,6-naphthalenedicarboxylic acid, 2, 5-Ppyridinedicarboxylic acid or acid dihalide thereof and the like are preferably used. Some of these compounds have isomers, but they may be mixtures containing them. Further, two or more kinds of compounds may be used in combination. The dicarboxylic acids used in the present invention are not limited to the above-mentioned exemplary compounds.
 原料であるジアミン(「ジアミン成分」とも記載する)と原料であるテトラカルボン酸二無水物(「テトラカルボン酸二無水物成分」とも記載する)、テトラカルボン酸ジエステル、ジイソシアネート及びジカルボン酸から選ばれる成分との反応により、ポリアミック酸、ポリアミック酸エステル、ポリウレア、ポリアミドを得るにあたっては、公知の合成手法を用いることができる。一般的には、ジアミン成分とテトラカルボン酸二無水物成分、テトラカルボン酸ジエステル、ジイソシアネート及びジカルボン酸から選ばれる一種以上の成分とを、有機溶媒中で反応させる方法である。 It is selected from the raw material diamine (also referred to as "diamine component") and the raw material tetracarboxylic acid dianhydride (also referred to as "tetracarboxylic acid dianhydride component"), tetracarboxylic acid diester, diisocyanate and dicarboxylic acid. A known synthetic method can be used to obtain a polyamic acid, a polyamic acid ester, a polyurea, or a polyamide by reaction with a component. Generally, it is a method of reacting a diamine component with one or more components selected from a tetracarboxylic dianhydride component, a tetracarboxylic acid diester, a diisocyanate and a dicarboxylic acid in an organic solvent.
 ジアミン成分とテトラカルボン酸二無水物成分との反応は、有機溶媒中で比較的容易に進行し、かつ副生成物が発生しない点で有利である。 The reaction between the diamine component and the tetracarboxylic dianhydride component is advantageous in that it proceeds relatively easily in an organic solvent and no by-products are generated.
 上記反応に用いる有機溶媒としては、生成した重合体が溶解するものであれば特に限定されない。さらに、重合体が溶解しない有機溶媒であっても、生成した重合体が析出しない範囲で、上記溶媒に混合して使用してもよい。なお、有機溶媒中の水分は、重合反応を阻害し、さらには生成した重合体を加水分解させる原因となるので、有機溶媒は脱水乾燥させたものを用いることが好ましい。 The organic solvent used in the above reaction is not particularly limited as long as it dissolves the produced polymer. Further, even if the organic solvent does not dissolve the polymer, it may be mixed with the above solvent and used as long as the produced polymer does not precipitate. Since the water content in the organic solvent inhibits the polymerization reaction and further causes the produced polymer to be hydrolyzed, it is preferable to use a dehydrated and dried organic solvent.
 有機溶媒としては、例えば、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジエチルホルムアミド、N-メチルホルムアミド、N-メチル-2-ピロリドン、N-エチル-2-ピロリドン、2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、3-メトキシ-N,N-ジメチルプロパンアミド、N-メチルカプロラクタム、ジメチルスルホキシド、テトラメチル尿素、ピリジン、ジメチルスルホン、ヘキサメチルホスホルアミド、γ-ブチロラクトン、イソプロピルアルコール、メトキシメチルペンタノール、ジペンテン、エチルアミルケトン、メチルノニルケトン、メチルエチルケトン、メチルイソアミルケトン、メチルイソプロピルケトン、メチルセルソルブ、エチルセルソルブ、メチルセロソルブアセテート、ブチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、エチレングリコールモノブチルエーテル、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジプロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、ジエチレングリコール、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、ジオキサン、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、シクロヘキサノン、エチレンカーボネート、プロピレンカーボネート、乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸メチルエチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、ジグライム、4-ヒドロキシ-4-メチル-2-ペンタノン、2-エチル-1-ヘキサノール等が挙げられる。これらの有機溶媒は単独で使用しても、混合して使用してもよい。 Examples of the organic solvent include N, N-dimethylformamide, N, N-dimethylacetamide, N, N-diethylformamide, N-methylformamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, 2 -Pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 3-methoxy-N, N-dimethylpropanamide, N-methylcaprolactam, dimethylsulfoxide, tetramethylurea, pyridine, dimethylsulfone, hexamethylphosphoramide, γ-Butyrolactone, isopropyl alcohol, methoxymethylpentanol, dipentene, ethylamyl ketone, methyl nonyl ketone, methyl ethyl ketone, methyl isoamyl ketone, methyl isopropyl ketone, methyl cell solve, ethyl cell solve, methyl cellosolve acetate, butyl cellosolve acetate, ethyl cellosolve acetate. , Butyl carbitol, ethyl carbitol, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol monobutyl ether, propylene glycol-tert -Butyl ether, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether. Dipropylene glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl Ether, ethylisobutyl ether, diisobutylene, amylacetate, butylbutyrate, butyl ether, diisobutylketone, methylcyclohexene, propyl ether, dihexyl ether, dioxane, n-hexane, n-pentane, n-octane, diethyl Ether, cyclohexanone, ethylene carbonate, propylene carbonate, methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl ether acetate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, 3 -Methylethyl ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, diglime, 4-hydroxy-4-methyl- Examples thereof include 2-pentanone and 2-ethyl-1-hexanol. These organic solvents may be used alone or in combination.
 ジアミン成分とテトラカルボン酸二無水物成分とを有機溶媒中で反応させる際には、ジアミン成分を有機溶媒に分散あるいは溶解させた溶液を撹拌し、テトラカルボン酸二無水物成分をそのまま、又は有機溶媒に分散あるいは溶解させて添加する方法、逆にテトラカルボン酸二無水物成分を有機溶媒に分散あるいは溶解させた溶液にジアミン成分を添加する方法、テトラカルボン酸二無水物成分とジアミン成分とを交互に添加する方法などが挙げられ、これらのいずれの方法を用いてもよい。また、ジアミン成分又はテトラカルボン酸二無水物成分が複数種の化合物からなる場合は、あらかじめ混合した状態で反応させてもよく、個別に順次反応させてもよく、さらに個別に反応させた低分子量体を混合反応させ高分子量体としてもよい。 When the diamine component and the tetracarboxylic acid dianhydride component are reacted in an organic solvent, the solution in which the diamine component is dispersed or dissolved in the organic solvent is stirred, and the tetracarboxylic acid dianhydride component is used as it is or is organic. A method of adding a tetracarboxylic acid dianhydride component dispersed or dissolved in a solvent, conversely a method of adding a diamine component to a solution in which a tetracarboxylic acid dianhydride component is dispersed or dissolved in an organic solvent, a method of adding a tetracarboxylic acid dianhydride component and a diamine component. Examples thereof include a method of adding alternately, and any of these methods may be used. When the diamine component or the tetracarboxylic dianhydride component is composed of a plurality of types of compounds, they may be reacted in a premixed state, may be reacted individually in sequence, or may be reacted individually, and have a low molecular weight. The bodies may be mixed and reacted to form a high molecular weight compound.
 ジアミン成分とテトラカルボン酸二無水物成分とを反応させる際の温度は、任意の温度を選択することができ、例えば、-20~100℃、好ましくは-5~80℃の範囲である。また、反応は任意の濃度で行うことができ、例えば、反応液に対してジアミン成分とテトラカルボン酸二無水物成分との合計量が1~50質量%、好ましくは5~30質量%である。 The temperature at which the diamine component and the tetracarboxylic dianhydride component are reacted can be selected from any temperature, and is, for example, in the range of -20 to 100 ° C, preferably -5 to 80 ° C. The reaction can be carried out at any concentration, for example, the total amount of the diamine component and the tetracarboxylic dianhydride component is 1 to 50% by mass, preferably 5 to 30% by mass with respect to the reaction solution. ..
 上記の重合反応における、ジアミン成分の合計モル数に対するテトラカルボン酸二無水物成分の合計モル数の比率は、得ようとするポリアミック酸の分子量に応じて任意の値を選択することができる。通常の重縮合反応と同様に、このモル比が1.0に近いほど生成するポリアミック酸の分子量は大きくなる。好ましい範囲としては、0.8~1.2である。 The ratio of the total number of moles of the tetracarboxylic acid dianhydride component to the total number of moles of the diamine component in the above polymerization reaction can be arbitrarily selected according to the molecular weight of the polyamic acid to be obtained. Similar to a normal polycondensation reaction, the closer the molar ratio is to 1.0, the larger the molecular weight of the polyamic acid produced. The preferred range is 0.8 to 1.2.
 本発明に用いられる重合体を合成する方法は、上記の手法に限定されず、ポリアミック酸を合成する場合は、一般的なポリアミック酸の合成方法と同様に、上記のテトラカルボン酸二無水物に代えて、対応する構造のテトラカルボン酸又はテトラカルボン酸ジハライドなどのテトラカルボン酸誘導体を用い、公知の方法で反応させることでも対応するポリアミック酸を得ることができる。また、ポリウレアを合成する場合は、ジアミンとジイソシアネートとを反応させればよい。ポリアミック酸エステルまたはポリアミドを製造する際には、ジアミンと、テトラカルボン酸ジエステル及びジカルボン酸から選ばれる成分を、公知の縮合剤の存在下で、又は、公知の方法で酸ハライドに誘導したのちに、ジアミンと反応させればよい。 The method for synthesizing the polymer used in the present invention is not limited to the above-mentioned method, and when synthesizing a polyamic acid, the above-mentioned tetracarboxylic acid dianhydride is used in the same manner as a general method for synthesizing a polyamic acid. Alternatively, a tetracarboxylic acid having a corresponding structure or a tetracarboxylic acid derivative such as a tetracarboxylic acid dihalide can be used and reacted by a known method to obtain the corresponding polyamic acid. In addition, when synthesizing polyurea, diamine and diisocyanate may be reacted. When producing a polyamic acid ester or polyamide, a diamine and a component selected from a tetracarboxylic acid diester and a dicarboxylic acid are induced into an acid halide in the presence of a known condensing agent or by a known method. , Diamine may be reacted.
 また、上記ポリアミック酸を閉環(イミド化)させることによりポリイミドを得ることができる。なお、本明細書でいうイミド化率とは、テトラカルボン酸二無水物由来のイミド基とカルボキシ基との合計量に占めるイミド基の割合のことである。ポリイミドにおいては、イミド化率は必ずしも100%である必要はなく、用途や目的に応じて任意に調整できる。本発明におけるポリイミドのイミド化率は、電圧保持率を高くできることから、30%以上であることが好ましく、一方、白化特性の、すなわち、ワニス中での重合体の析出を抑制する観点から、80%以下が好ましい。 Further, polyimide can be obtained by ring-closing (imidizing) the polyamic acid. The imidization rate as used herein is the ratio of the imide group to the total amount of the imide group and the carboxy group derived from the tetracarboxylic acid dianhydride. In polyimide, the imidization ratio does not necessarily have to be 100%, and can be arbitrarily adjusted according to the application and purpose. The imidization ratio of the polyimide in the present invention is preferably 30% or more because the voltage retention rate can be increased, and on the other hand, from the viewpoint of whitening characteristics, that is, from the viewpoint of suppressing the precipitation of the polymer in the varnish, 80 % Or less is preferable.
 ポリアミック酸を溶液中で熱イミド化させる場合の温度は、通常100~400℃、好ましくは120~250℃であり、イミド化反応により生成する水を系外に除きながら行うことが好ましい。 The temperature at which the polyamic acid is thermally imidized in the solution is usually 100 to 400 ° C, preferably 120 to 250 ° C, and it is preferable to remove the water generated by the imidization reaction from the outside of the system.
 ポリアミック酸の触媒イミド化は、ポリアミック酸の溶液に、塩基性触媒と酸無水物とを添加し、通常-20~250℃、好ましくは0~180℃で撹拌することにより行うことができる。塩基性触媒の量は、アミック酸基の通常0.5~30モル倍、好ましくは2~20モル倍であり、酸無水物の量は、アミック酸基の通常1~50モル倍、好ましくは3~30モル倍である。塩基性触媒としては、ピリジン、トリエチルアミン、トリメチルアミン、トリブチルアミン、トリオクチルアミンなどを挙げることができ、中でもピリジンは反応を進行させるのに適度な塩基性を持つので好ましい。酸無水物としては、無水酢酸、無水トリメリット酸、無水ピロメリット酸などを挙げることができるが、中でも無水酢酸を用いると反応終了後の精製が容易となるので好ましい。触媒イミド化によるイミド化率は、触媒量と反応温度、反応時間などを調節することにより制御することができる。 The catalytic imidization of the polyamic acid can be carried out by adding a basic catalyst and an acid anhydride to the solution of the polyamic acid and stirring at -20 to 250 ° C, preferably 0 to 180 ° C. The amount of the basic catalyst is usually 0.5 to 30 mol times, preferably 2 to 20 mol times the amount of the amic acid group, and the amount of acid anhydride is usually 1 to 50 mol times, preferably 1 to 50 mol times the amic acid group. It is 3 to 30 mol times. Examples of the basic catalyst include pyridine, triethylamine, trimethylamine, tributylamine, trioctylamine and the like, and among them, pyridine is preferable because it has an appropriate basicity for advancing the reaction. Examples of the acid anhydride include acetic anhydride, trimellitic anhydride, pyromellitic anhydride and the like, and among them, acetic anhydride is preferable because it facilitates purification after the reaction is completed. The imidization rate by catalytic imidization can be controlled by adjusting the amount of catalyst, the reaction temperature, the reaction time, and the like.
 重合体の反応溶液から、生成した重合体を回収する場合には、反応溶液を貧溶媒に投入して沈殿させればよい。沈殿生成に用いる貧溶媒としては、メタノール、アセトン、ヘキサン、ブチルセルソルブ、ヘプタン、メチルエチルケトン、メチルイソブチルケトン、エタノール、トルエン、ベンゼン、水などを挙げることができる。貧溶媒に投入して沈殿させたポリマーは、濾過して回収した後、常圧あるいは減圧下で、常温あるいは加熱して乾燥することができる。また、沈殿回収した重合体を、有機溶媒に再溶解させ、再沈殿回収する操作を2~10回繰り返すと、重合体中の不純物を少なくすることができる。この際の貧溶媒として、例えば、アルコール類、ケトン類、炭化水素などが挙げられ、これらの内から選ばれる3種類以上の貧溶媒を用いると、より一層精製の効率が上がるので好ましい。 When recovering the produced polymer from the reaction solution of the polymer, the reaction solution may be put into a poor solvent and precipitated. Examples of the poor solvent used for precipitate formation include methanol, acetone, hexane, butyl cellsolve, heptane, methyl ethyl ketone, methyl isobutyl ketone, ethanol, toluene, benzene, water and the like. The polymer put into a poor solvent and precipitated can be collected by filtration and then dried at room temperature or by heating under normal pressure or reduced pressure. Further, by re-dissolving the polymer recovered by precipitation in an organic solvent and repeating the operation of re-precipitation recovery 2 to 10 times, impurities in the polymer can be reduced. Examples of the poor solvent at this time include alcohols, ketones, hydrocarbons, and the like, and it is preferable to use three or more kinds of poor solvents selected from these because the efficiency of purification is further improved.
 また、前記ラジカル発生膜が、ラジカル重合を誘発する有機基を含有する重合体から成る場合、本発明に用いるラジカル発生膜形成組成物は、ラジカル重合を誘発する有機基を含有する重合体以外の他の重合体を含有していてもよい。その際、重合体全成分中における、他の重合体の含有量は5~95質量%が好ましく、より好ましくは30~70質量%である。 When the radical generation film is composed of a polymer containing an organic group that induces radical polymerization, the radical generation film-forming composition used in the present invention is other than a polymer containing an organic group that induces radical polymerization. It may contain other polymers. At that time, the content of the other polymer in all the components of the polymer is preferably 5 to 95% by mass, more preferably 30 to 70% by mass.
 ラジカル発生膜形成組成物が有する重合体の分子量は、ラジカル発生膜を塗布して得られるラジカル発生膜の強度、塗膜形成時の作業性、塗膜の均一性等を考慮した場合、GPC(Gel Permeation Chromatography)法で測定した重量平均分子量で、5,000~1,000,000が好ましく、より好ましくは、10,000~150,000である。 The molecular weight of the polymer contained in the radical generation film forming composition is GPC (GPC) when the strength of the radical generation film obtained by applying the radical generation film, the workability at the time of forming the coating film, the uniformity of the coating film, etc. are taken into consideration. The weight average molecular weight measured by the Gel Permeation Chromatography method is preferably 5,000 to 1,000,000, more preferably 10,000 to 150,000.
 本発明に用いるラジカル発生膜を、ラジカルを発生する基を有する化合物と重合体との組成物を塗布、硬化して膜を形成することにより膜中に固定化させて得る場合の重合体としては、上記の製造方法に準じて製造されるポリイミド前駆体、及びポリイミド、ポリウレア、ポリアミド、ポリアクリレート、ポリメタクリレートなどからなる群から選ばれる重合体であって、上記ラジカル重合を誘発する有機基を含有するジアミンが、ラジカル発生膜形成組成物に含有させる重合体の合成に用いるジアミン成分全体の0モル%であるジアミン成分を用いて得られる少なくとも1種の重合体を用いてもよい。その際に添加するラジカルを発生する基を有する化合物としては、以下のものが挙げられる。 As a polymer in the case where the radical generation film used in the present invention is immobilized in the film by applying a composition of a compound having a radical-generating group and a polymer and curing the film to form a film. , A polyimide precursor produced according to the above production method, and a polymer selected from the group consisting of polyimide, polyurea, polyamide, polyacrylate, polymethacrylate and the like, and containing an organic group that induces the above radical polymerization. At least one polymer obtained by using the diamine component in which the diamine to be used is 0 mol% of the total diamine component used for synthesizing the polymer contained in the radical generation film forming composition may be used. Examples of the compound having a group that generates a radical to be added at that time include the following.
 熱でラジカルを発生する化合物としては、分解温度以上に加熱することにより、ラジカルを発生させる化合物である。このようなラジカル熱重合開始剤としては、例えば、ケトンパーオキサイド類(メチルエチルケトンパーオキサイド、シクロヘキサノンパーオキサイド等)、ジアシルパーオキサイド類(アセチルパーオキサイド、ベンゾイルパーオキサイド等)、ハイドロパーオキサイド類(過酸化水素、tert-ブチルハイドロパーオキサイド、クメンハイドロパーオキサイド等)、ジアルキルパーオキサイド類(ジ-tert-ブチルパーオキサイド、ジクミルパーオキサイド、ジラウロイルパーオキサイド等)、パーオキシケタール類(ジブチルパーオキシシクロヘキサン等)、アルキルパーエステル類(パーオキシネオデカン酸-tert-ブチルエステル、パーオキシピバリン酸-tert-ブチルエステル、パーオキシ2-エチルシクロヘキサン酸-tert-アミルエステル等)、過硫酸塩類(過硫酸カリウム、過硫酸ナトリウム、過硫酸アンモニウム等)、アゾ系化合物(アゾビスイソブチロニトリル、および2,2’-ジ(2-ヒドロキシエチル)アゾビスイソブチロニトリル等)が挙げられる。このようなラジカル熱重合開始剤は、1種を単独で使用することもできるし、あるいは2種以上を組み合わせて使用することもできる。 The compound that generates radicals by heat is a compound that generates radicals by heating to a temperature higher than the decomposition temperature. Examples of such radical thermal polymerization initiators include ketone peroxides (methyl ethyl ketone peroxide, cyclohexanone peroxide, etc.), diacyl peroxides (acetyl peroxide, benzoyl peroxide, etc.), and hydroperoxides (peroxidation). Hydrogen, tert-butyl hydroperoxide, cumene hydroperoxide, etc.), dialkyl peroxides (di-tert-butyl peroxide, dicumyl peroxide, dilauroyl peroxide, etc.), peroxyketals (dibutylperoxycyclohexane, etc.) Etc.), alkyl peresters (peroxyneodecanoic acid-tert-butyl ester, peroxypivalic acid-tert-butyl ester, peroxy2-ethylcyclohexanoic acid-tert-amyl ester, etc.), persulfates (potassium persulfate, etc.) Examples thereof include sodium persulfate, ammonium persulfate, etc.) and azo compounds (azobisisobutyronitrile, and 2,2'-di (2-hydroxyethyl) azobisisobutyronitrile, etc.). Such a radical thermal polymerization initiator may be used alone or in combination of two or more.
 光でラジカルを発生する化合物としては、ラジカル重合を光照射によって開始する化合物であれば特に限定されない。このようなラジカル光重合開始剤としては、ベンゾフェノン、ミヒラーズケトン、4,4’-ビス(ジエチルアミノ)ベンゾフェノン、キサントン、チオキサントン、イソプロピルキサントン、2,4-ジエチルチオキサントン、2-エチルアントラキノン、アセトフェノン、2-ヒドロキシ-2-メチルプロピオフェノン、2-ヒドロキシ-2-メチル-4’-イソプロピルプロピオフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、イソプロピルベンゾインエーテル、イソブチルベンゾインエーテル、2,2-ジエトキシアセトフェノン、2,2-ジメトキシ-2-フェニルアセトフェノン、カンファーキノン、ベンズアントロン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジル-2-ジメチルアミノ-1-(4-モルホリノフェニル)-ブタノン-1、4-ジメチルアミノ安息香酸エチル、4-ジメチルアミノ安息香酸イソアミル、4,4’-ジ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,4,4’-トリ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイド、2-(4’-メトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(3’,4’-ジメトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2’,4’-ジメトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(2’-メトキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、2-(4’-ペンチルオキシスチリル)-4,6-ビス(トリクロロメチル)-s-トリアジン、4-[p-N,N-ジ(エトキシカルボニルメチル)]-2,6-ジ(トリクロロメチル)-s-トリアジン、1,3-ビス(トリクロロメチル)-5-(2’-クロロフェニル)-s-トリアジン、1,3-ビス(トリクロロメチル)-5-(4’-メトキシフェニル)-s-トリアジン、2-(p-ジメチルアミノスチリル)ベンズオキサゾール、2-(p-ジメチルアミノスチリル)ベンズチアゾール、2-メルカプトベンゾチアゾール、3,3’-カルボニルビス(7-ジエチルアミノクマリン)、2-(o-クロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラキス(4-エトキシカルボニルフェニル)-1,2’-ビイミダゾール、2,2’-ビス(2,4-ジクロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’ビス(2,4-ジブロモフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、2,2’-ビス(2,4,6-トリクロロフェニル)-4,4’,5,5’-テトラフェニル-1,2’-ビイミダゾール、3-(2-メチル-2-ジメチルアミノプロピオニル)カルバゾール、3,6-ビス(2-メチル-2-モルホリノプロピオニル)-9-n-ドデシルカルバゾール、1-ヒドロキシシクロヘキシルフェニルケトン、ビス(5-2,4-シクロペンタジエン-1-イル)-ビス(2,6-ジフルオロ-3-(1H-ピロール-1-イル)-フェニル)チタニウム、3,3’,4,4’-テトラ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,3’,4,4’-テトラ(tert-ヘキシルペルオキシカルボニル)ベンゾフェノン、3,3’-ジ(メトキシカルボニル)-4,4’-ジ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、3,4’-ジ(メトキシカルボニル)-4,3’-ジ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、4,4’-ジ(メトキシカルボニル)-3,3’-ジ(tert-ブチルペルオキシカルボニル)ベンゾフェノン、2-(3-メチル-3H-ベンゾチアゾール-2-イリデン)-1-ナフタレン-2-イル-エタノン、又は2-(3-メチル-1,3-ベンゾチアゾール-2(3H)-イリデン)-1-(2-ベンゾイル)エタノン等を挙げることができる。これらの化合物は単独で使用してもよく、2つ以上を混合して使用することもできる。 The compound that generates radicals with light is not particularly limited as long as it is a compound that initiates radical polymerization by light irradiation. Examples of such radical photopolymerization initiators include benzophenone, Michler's ketone, 4,4'-bis (diethylamino) benzophenone, xanthone, thioxanthone, isopropylxanthone, 2,4-diethylthioxanthone, 2-ethylanthraquinone, acetophenone and 2-hydroxy. -2-Methylpropiophenone, 2-Hydroxy-2-methyl-4'-isopropylpropiophenone, 1-hydroxycyclohexylphenylketone, isopropylbenzoin ether, isobutylbenzoin ether, 2,2-diethoxyacetophenone, 2,2 -Dimethoxy-2-phenylacetophenone, camphorquinone, benzanthron, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1-( 4-Molholinophenyl) -butanone-1, 4-ethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4,4'-di (tert-butylperoxycarbonyl) benzophenone, 3,4,4'-tri (3,4'-tri ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzoyldiphenylphosphinoxide, 2- (4'-methoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (3' , 4'-dimethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2- (2', 4'-dimethoxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 2 -(2'-Methtylyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4'-pentyloxystyryl) -4,6-bis (trichloromethyl) -s-triazine, 4- [P-N, N-di (ethoxycarbonylmethyl)]-2,6-di (trichloromethyl) -s-triazine, 1,3-bis (trichloromethyl) -5- (2'-chlorophenyl) -s- Triazine, 1,3-bis (trichloromethyl) -5- (4'-methoxyphenyl) -s-triazine, 2- (p-dimethylaminostyryl) benzoxazole, 2- (p-dimethylaminostyryl) benzthiazole, 2-Mercaptobenzothiazole, 3,3'-carbonylbis (7-diethylaminocoumarin), 2- (o-chlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetrakis (4-ethoxycarbonylphenyl) -1,2'-biimidazole, 2,2'-bis (2,4-) Dichlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole, 2,2'bis (2,4-dibromophenyl) -4,4', 5,5'-tetraphenyl -1,2'-biimidazole, 2,2'-bis (2,4,6-trichlorophenyl) -4,4', 5,5'-tetraphenyl-1,2'-biimidazole, 3-( 2-Methyl-2-dimethylaminopropionyl) carbazole, 3,6-bis (2-methyl-2-morpholinopropionyl) -9-n-dodecylcarbazole, 1-hydroxycyclohexylphenylketone, bis (5-2,4- Cyclopentadiene-1-yl) -bis (2,6-difluoro-3- (1H-pyrrole-1-yl) -phenyl) titanium, 3,3', 4,4'-tetra (tert-butylperoxycarbonyl) Phenylphenone, 3,3', 4,4'-tetra (tert-hexylperoxycarbonyl) benzophenone, 3,3'-di (methoxycarbonyl) -4,4'-di (tert-butylperoxycarbonyl) benzophenone, 3, 4'-di (methoxycarbonyl) -4,3'-di (tert-butylperoxycarbonyl) benzophenone, 4,4'-di (methoxycarbonyl) -3,3'-di (tert-butylperoxycarbonyl) benzophenone, 2- (3-Methyl-3H-benzothiazole-2-iriden) -1-naphthalen-2-yl-etanone, or 2- (3-methyl-1,3-benzothiazole-2 (3H) -iriden)- Examples thereof include 1- (2-benzoyl) etanone. These compounds may be used alone or in admixture of two or more.
 なお、前記ラジカル発生膜が、ラジカル重合を誘発する有機基を含有する重合体から成る場合であっても、エネルギーを与えた際にラジカル重合を促進する目的で、上記のラジカルを発生する基を有する化合物を含有させてもよい。 Even when the radical generation film is made of a polymer containing an organic group that induces radical polymerization, the group that generates the above radical is used for the purpose of promoting radical polymerization when energy is applied. The compound may be contained.
 ラジカル発生膜形成組成物は、重合体成分、必要に応じてラジカル発生剤その他の含有成分を溶解又は分散する有機溶媒を含有することができる。そのような有機溶媒に特に限定はなく、例えば、上記のポリアミック酸の合成で例示したような有機溶媒を挙げることができる。中でも、N-メチル-2-ピロリドン、γ-ブチロラクトン、N-エチル-2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、3-メトキシ-N,N-ジメチルプロパンアミド等は、溶解性の観点から好ましい。特に、N-メチル-2-ピロリドン又はN-エチル-2-ピロリドンが好ましいが、2種類以上の混合溶媒を用いてもよい。 The radical generating film forming composition can contain a polymer component, and if necessary, an organic solvent that dissolves or disperses a radical generating agent or other contained components. Such an organic solvent is not particularly limited, and examples thereof include organic solvents as exemplified in the above-mentioned synthesis of polyamic acid. Among them, N-methyl-2-pyrrolidone, γ-butyrolactone, N-ethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, 3-methoxy-N, N-dimethylpropanamide and the like are soluble. It is preferable from the viewpoint of. In particular, N-methyl-2-pyrrolidone or N-ethyl-2-pyrrolidone is preferable, but two or more kinds of mixed solvents may be used.
 また、塗膜の均一性や平滑性を向上させる溶媒を、ラジカル発生膜形成組成物の含有成分の溶解性が高い有機溶媒に混合して使用すると好ましい。 Further, it is preferable to use a solvent that improves the uniformity and smoothness of the coating film by mixing it with an organic solvent having high solubility of the components contained in the radical generation film forming composition.
 塗膜の均一性や平滑性を向上させる溶媒としては、例えば、イソプロピルアルコール、メトキシメチルペンタノール、メチルセロソルブ、エチルセロソルブ、ブチルセロソルブ(エチレングリコールモノブチルエーテル)、メチルセロソルブアセテート、ブチルセロソルブアセテート、エチルセロソルブアセテート、ブチルカルビトール、エチルカルビトール、エチルカルビトールアセテート、エチレングリコール、エチレングリコールモノアセテート、エチレングリコールモノイソプロピルエーテル、プロピレングリコール、プロピレングリコールモノアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコールモノブチルエーテル、プロピレングリコール-tert-ブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジエチレングリコール、ジエチレングリコールモノアセテート、ジエチレングリコールジメチルエーテル、ジエチレングリコールジエチルエーテル、ジプロピレングリコールモノアセテートモノメチルエーテル、ジプロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノアセテートモノエチルエーテル、ジプロピレングリコールモノプロピルエーテル、ジプロピレングリコールモノアセテートモノプロピルエーテル、3-メチル-3-メトキシブチルアセテート、トリプロピレングリコールメチルエーテル、3-メチル-3-メトキシブタノール、ジイソプロピルエーテル、エチルイソブチルエーテル、ジイソブチレン、アミルアセテート、ブチルブチレート、ブチルエーテル、ジイソブチルケトン、メチルシクロへキセン、プロピルエーテル、ジヘキシルエーテル、n-へキサン、n-ペンタン、n-オクタン、ジエチルエーテル、乳酸メチル、乳酸エチル、乳酸n-プロピル、乳酸n-ブチル、乳酸イソアミル、酢酸メチル、酢酸エチル、酢酸n-ブチル、酢酸プロピレングリコールモノエチルエーテル、ピルビン酸メチル、ピルビン酸エチル、3-メトキシプロピオン酸メチル、3-エトキシプロピオン酸メチルエチル、3-メトキシプロピオン酸エチル、3-エトキシプロピオン酸、3-メトキシプロピオン酸、3-メトキシプロピオン酸プロピル、3-メトキシプロピオン酸ブチル、1-メトキシ-2-プロパノール、1-エトキシ-2-プロパノール、1-ブトキシ-2-プロパノール、1-フェノキシ-2-プロパノール、プロピレングリコールジアセテート、プロピレングリコール-1-モノメチルエーテル-2-アセテート、プロピレングリコール-1-モノエチルエーテル-2-アセテート、ジプロピレングリコール、2-(2-エトキシプロポキシ)プロパノール、2-エチル-1-ヘキサノールなどが挙げられる。これらの溶媒は複数種類を混合してもよい。これらの溶媒を用いる場合は、ラジカル発生膜形成組成物に含まれる溶媒全体の5~80質量%であることが好ましく、より好ましくは20~60質量%である。 Examples of the solvent for improving the uniformity and smoothness of the coating material include isopropyl alcohol, methoxymethylpentanol, methyl cellosolve, ethyl cellosolve, butyl cellosolve (ethylene glycol monobutyl ether), methyl cellosolve acetate, butyl cellosolve acetate, and ethyl cellosolve acetate. Butyl carbitol, ethyl carbitol, ethyl carbitol acetate, ethylene glycol, ethylene glycol monoacetate, ethylene glycol monoisopropyl ether, propylene glycol, propylene glycol monoacetate, propylene glycol monomethyl ether, propylene glycol monobutyl ether, propylene glycol-tert- Butyl ether, dipropylene glycol monomethyl ether, diethylene glycol, diethylene glycol monoacetate, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, dipropylene glycol monoacetate monomethyl ether, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, dipropylene glycol monoethyl ether, dipropylene Glycol monoacetate monoethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoacetate monopropyl ether, 3-methyl-3-methoxybutyl acetate, tripropylene glycol methyl ether, 3-methyl-3-methoxybutanol, diisopropyl ether , Ethylisobutyl ether, diisobutylene, amylacetate, butylbutyrate, butyl ether, diisobutylketone, methylcyclohexene, propyl ether, dihexyl ether, n-hexane, n-pentane, n-octane, diethyl ether, methyl lactate, lactic acid. Ethyl, n-propyl lactate, n-butyl lactate, isoamyl lactate, methyl acetate, ethyl acetate, n-butyl acetate, propylene glycol monoethyl ether acetate, methyl pyruvate, ethyl pyruvate, methyl 3-methoxypropionate, 3- Methyl ethyl ethoxypropionate, ethyl 3-methoxypropionate, 3-ethoxypropionic acid, 3-methoxypropionic acid, propyl 3-methoxypropionate, butyl 3-methoxypropionate, 1-methoxy-2-propanol, 1-ethoxy - 2-propanol, 1-butoxy-2-propanol, 1-phenoxy-2-propanol, propylene glycol diacetate, propylene glycol-1-monomethyl ether-2-acetate, propylene glycol-1-monoethyl ether-2-acetate, Examples thereof include dipropylene glycol, 2- (2-ethoxypropanol) propanol, 2-ethyl-1-hexanol and the like. A plurality of types of these solvents may be mixed. When these solvents are used, it is preferably 5 to 80% by mass, more preferably 20 to 60% by mass, based on the total amount of the solvent contained in the radical generation film forming composition.
 ラジカル発生膜形成組成物には、上記以外の成分を含有させてもよい。その例としては、ラジカル発生膜形成組成物を塗布した際の膜厚均一性や表面平滑性を向上させる化合物、ラジカル発生膜形成組成物と基板との密着性を向上させる化合物、ラジカル発生膜形成組成物の膜強度をさらに向上させる化合物などが挙げられる。 The radical generation film forming composition may contain components other than the above. Examples thereof include compounds that improve the film thickness uniformity and surface smoothness when the radical generation film forming composition is applied, compounds that improve the adhesion between the radical generation film forming composition and the substrate, and radical generation film formation. Examples thereof include compounds that further improve the film strength of the composition.
 膜厚の均一性や表面平滑性を向上させる化合物としては、フッ素系界面活性剤、シリコーン系界面活性剤、ノ二オン系界面活性剤などが挙げられる。より具体的には、例えば、エフトップEF301、EF303、EF352(三菱マテリアル電子化成社製)、メガファックF171、F173、R-30(DIC社製)、フロラードFC430、FC431(スリーエム社製)、アサヒガードAG710(AGC社製)、サーフロンS-382、SC101、SC102、SC103、SC104、SC105、SC106(AGCセイミケミカル社製)などが挙げられる。これらの界面活性剤を使用する場合、その使用割合は、ラジカル発生膜形成組成物に含有される重合体の総量100質量部に対して、好ましくは0.01~2質量部、より好ましくは0.01~1質量部である。 Examples of the compound that improves the uniformity of the film thickness and the surface smoothness include a fluorine-based surfactant, a silicone-based surfactant, and a nonion-based surfactant. More specifically, for example, Ftop EF301, EF303, EF352 (manufactured by Mitsubishi Materials Electronics Chemical Co., Ltd.), Megafuck F171, F173, R-30 (manufactured by DIC), Florard FC430, FC431 (manufactured by 3M), Asahi. Examples thereof include Guard AG710 (manufactured by AGC), Surflon S-382, SC101, SC102, SC103, SC104, SC105, SC106 (manufactured by AGC Seimi Chemical). When these surfactants are used, the ratio of their use is preferably 0.01 to 2 parts by mass, more preferably 0, with respect to 100 parts by mass of the total amount of the polymer contained in the radical generation film forming composition. It is 0.01 to 1 part by mass.
 ラジカル発生膜形成組成物と基板との密着性を向上させる化合物の具体例としては、官能性シラン含有化合物やエポキシ基含有化合物などが挙げられる。例えば、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、2-アミノプロピルトリメトキシシラン、2-アミノプロピルトリエトキシシラン、N-(2-アミノエチル)-3-アミノプロピルトリメトキシシラン、N-(2-アミノエチル)-3-アミノプロピルメチルジメトキシシラン、3-ウレイドプロピルトリメトキシシラン、3-ウレイドプロピルトリエトキシシラン、N-エトキシカルボニル-3-アミノプロピルトリメトキシシラン、N-エトキシカルボニル-3-アミノプロピルトリエトキシシラン、N-(3-トリエトキシシリルプロピル)トリエチレンテトラミン、N-(3-トリメトキシシリルプロピル)トリエチレンテトラミン、10-トリメトキシシリル-1,4,7-トリアザデカン、10-トリエトキシシリル-1,4,7-トリアザデカン、9-トリメトキシシリル-3,6-ジアザノニルアセテート、9-トリエトキシシリル-3,6-ジアザノニルアセテート、N-ベンジル-3-アミノプロピルトリメトキシシラン、N-ベンジル-3-アミノプロピルトリエトキシシラン、N-フェニル-3-アミノプロピルトリメトキシシラン、N-フェニル-3-アミノプロピルトリエトキシシラン、N-ビス(オキシエチレン)-3-アミノプロピルトリメトキシシラン、N-ビス(オキシエチレン)-3-アミノプロピルトリエトキシシラン、エチレングリコールジグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル、トリプロピレングリコールジグリシジルエーテル、ポリプロピレングリコールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,6-ヘキサンジオールジグリシジルエーテル、グリセリンジグリシジルエーテル、2,2-ジブロモネオペンチルグリコールジグリシジルエーテル、1,3,5,6-テトラグリシジル-2,4-ヘキサンジオール、N,N,N’,N’-テトラグリシジル-m-キシレンジアミン、1,3-ビス(N,N-ジグリシジルアミノメチル)シクロヘキサン、N,N,N’,N’-テトラグリシジル-4、4’-ジアミノジフェニルメタン、3-(N-アリル-N-グリシジル)アミノプロピルトリメトキシシラン、3-(N,N-ジグリシジル)アミノプロピルトリメトキシシランなどが挙げられる。 Specific examples of the compound that improves the adhesion between the radical generation film forming composition and the substrate include a functional silane-containing compound and an epoxy group-containing compound. For example, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-aminopropyltrimethoxysilane, 2-aminopropyltriethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane. , N- (2-Aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane, N-ethoxycarbonyl-3-aminopropyltrimethoxysilane, N-ethoxy Carbonyl-3-aminopropyltriethoxysilane, N- (3-triethoxysilylpropyl) triethylenetetramine, N- (3-trimethoxysilylpropyl) triethylenetetramine, 10-trimethoxysilyl-1,4,7- Triazadecane, 10-triethoxysilyl-1,4,7-triazadecane, 9-trimethoxysilyl-3,6-diazanonyl acetate, 9-triethoxysilyl-3,6-diazanonyl acetate, N-benzyl- 3-Aminopropyltrimethoxysilane, N-benzyl-3-aminopropyltriethoxysilane, N-phenyl-3-aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltriethoxysilane, N-bis (oxyethylene) ) -3-Aminopropyltrimethoxysilane, N-bis (oxyethylene) -3-aminopropyltriethoxysilane, ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether , Polypropylene Glycol Diglycidyl Ether, Neopentyl Glycol Diglycidyl Ether, 1,6-Hexanediol Diglycidyl Ether, Glycerin Diglycidyl Ether, 2,2-Dibromo Neopentyl Glycol Diglycidyl Ether, 1,3,5,6-Tetra Glycidyl-2,4-hexanediol, N, N, N', N'-tetraglycidyl-m-xylene diamine, 1,3-bis (N, N-diglycidylaminomethyl) cyclohexane, N, N, N' , N'-Tetraglycidyl-4, 4'-diaminodiphenylmethane, 3- (N-allyl-N-glycidyl) aminopropyltrimethoxysilane, 3- (N, N-diglycidyl) aminopropyltrimethoxysilane, etc. ..
 また、ラジカル発生膜の膜強度をさらに上げるためには、2,2’-ビス(4-ヒドロキシ-3,5-ジヒドロキシメチルフェニル)プロパン、テトラ(メトキシメチル)ビスフェノール等のフェノール化合物を添加してもよい。これらの化合物を使用する場合は、ラジカル発生膜形成組成物に含有される重合体の総量100質量部に対して0.1~30質量部であることが好ましく、より好ましくは1~20質量部である。 Further, in order to further increase the film strength of the radical generation film, a phenol compound such as 2,2'-bis (4-hydroxy-3,5-dihydroxymethylphenyl) propane or tetra (methoxymethyl) bisphenol is added. May be good. When these compounds are used, the amount is preferably 0.1 to 30 parts by mass, more preferably 1 to 20 parts by mass with respect to 100 parts by mass of the total amount of the polymer contained in the radical generation film forming composition. Is.
 さらに、ラジカル発生膜形成組成物には、上記の他、本発明の効果が損なわれない範囲であれば、ラジカル発生膜の誘電率や導電性などの電気特性を変化させる目的の誘電体や導電物質を添加してもよい。 Further, in addition to the above, the radical generating film forming composition includes a dielectric or a conductive material for changing the electrical properties such as the dielectric constant and the conductivity of the radical generating film as long as the effect of the present invention is not impaired. Substances may be added.
[ラジカル発生膜]
 本発明のラジカル発生膜は、例えば、上記ラジカル発生膜形成組成物を用いて得られる。例えば、本発明に用いるラジカル発生膜形成組成物を、基板に塗布した後、乾燥・焼成を行うことで得られる硬化膜を、そのままラジカル発生膜として用いることもできる。また、この硬化膜をラビングや偏光又は特定の波長の光等を照射、イオンビーム等の処理にて配向処理を行うことができ、PSA用配向膜として液晶充填後の液晶表示素子にUV(紫外線)を照射することも可能である。
[Radical generation membrane]
The radical generation film of the present invention can be obtained, for example, by using the above-mentioned radical generation film forming composition. For example, a cured film obtained by applying the radical generation film forming composition used in the present invention to a substrate and then drying and firing it can be used as it is as a radical generation film. Further, this cured film can be subjected to alignment processing by rubbing, polarization, light of a specific wavelength, or the like, and by processing an ion beam or the like, and UV (ultraviolet rays) are applied to the liquid crystal display element after filling the liquid crystal as a PSA alignment film. ) Is also possible.
 ラジカル発生膜形成組成物を塗布する基板としては、透明性の高い基板であれば特に限定されないが、基板上に液晶を駆動するための透明電極が形成された基板が好ましい。 The substrate on which the radical generation film forming composition is applied is not particularly limited as long as it is a highly transparent substrate, but a substrate on which a transparent electrode for driving a liquid crystal display is formed is preferable.
 具体例を挙げると、ガラス板、ポリカーボネート、ポリ(メタ)アクリレート、ポリエーテルサルホン、ポリアリレート、ポリウレタン、ポリサルホン、ポリエーテル、ポリエーテルケトン、トリメチルペンテン、ポリオレフィン、ポリエチレンテレフタレート、(メタ)アクリロニトリル、トリアセチルセルロース、ジアセチルセルロース、アセテートブチレートセルロースなどのプラスチック板などに透明電極が形成された基板を挙げることができる。 Specific examples include glass plates, polycarbonate, poly (meth) acrylate, polyethersulfone, polyarylate, polyurethane, polysulfone, polyether, polyetherketone, trimethylpentene, polyolefin, polyethylene terephthalate, (meth) acrylonitrile, and tri. Examples thereof include a substrate in which a transparent electrode is formed on a plastic plate such as acetyl cellulose, diacetyl cellulose, acetate butylate cellulose or the like.
 IPS方式の液晶表示素子に使用できる基板には、標準的なIPS櫛歯電極やPSAフィッシュボーン電極といった電極パターンやMVAのような突起パターンでも使用できる。 For the substrate that can be used for the IPS liquid crystal display element, electrode patterns such as standard IPS comb tooth electrodes and PSA fishbone electrodes and protrusion patterns such as MVA can also be used.
 また、TFT型の素子のような高機能素子においては、液晶駆動のための電極と基板の間にトランジスタの如き素子が形成されたものが用いられる。 Further, in a high-performance element such as a TFT type element, an element such as a transistor is used between an electrode for driving a liquid crystal display and a substrate.
 透過型の液晶表示素子を意図している場合は、上記の如き基板を用いることが一般的であるが、反射型の液晶表示素子を意図している場合では、片側の基板のみにならばシリコンウエハー等の不透明な基板も用いることが可能である。その際、基板に形成された電極には、光を反射するアルミニウムの如き材料を用いることもできる。 When a transmissive liquid crystal display element is intended, it is common to use a substrate as described above, but when a reflective liquid crystal display element is intended, silicon is used only on one side of the substrate. An opaque substrate such as a wafer can also be used. At that time, a material such as aluminum that reflects light can be used for the electrodes formed on the substrate.
 ラジカル発生膜形成組成物の塗布方法としては、スピンコート法、印刷法、インクジェット法、スプレー法、ロールコート法などが挙げられるが、生産性の面から工業的には転写印刷法が広く用いられており、本発明でも好適に用いられる。 Examples of the method for applying the radical-generating film-forming composition include a spin coating method, a printing method, an inkjet method, a spray method, a roll coating method, and the like, but the transfer printing method is widely used industrially from the viewpoint of productivity. It is also suitably used in the present invention.
 ラジカル発生膜形成組成物を塗布した後の乾燥の工程は、必ずしも必要とされないが、塗布後から焼成までの時間が基板ごとに一定していない場合、又は塗布後ただちに焼成されない場合には、乾燥工程を含める方が好ましい。この乾燥は、基板の搬送等により塗膜形状が変形しない程度に溶媒が除去されていればよく、その乾燥手段については特に限定されない。例えば、温度40~150℃、好ましくは60~100℃のホットプレート上で、0.5~30分、好ましくは1~5分乾燥させる方法が挙げられる。 The step of drying after applying the radical generation film forming composition is not always necessary, but if the time from application to firing is not constant for each substrate or if it is not fired immediately after coating, it is dried. It is preferable to include the process. The drying is not particularly limited as long as the solvent is removed to the extent that the shape of the coating film is not deformed by transporting the substrate or the like, and the drying means thereof is not particularly limited. For example, a method of drying on a hot plate having a temperature of 40 to 150 ° C., preferably 60 to 100 ° C. for 0.5 to 30 minutes, preferably 1 to 5 minutes can be mentioned.
 上記の方法でラジカル発生膜形成組成物を塗布して形成される塗膜は、焼成して硬化膜とすることができる。その際、焼成温度は、通常100~350℃の任意の温度で行うことができるが、好ましくは140~300℃であり、より好ましくは150~230℃、更に好ましくは160~220℃である。焼成時間は通常5~240分の任意の時間で焼成を行うことができる。好ましくは10~90分であり、より好ましくは20~90分である。加熱は、通常公知の方法、例えば、ホットプレート、熱風循環オーブン、IR(赤外線)型オーブン、ベルト炉などを用いることができる。 The coating film formed by applying the radical generation film forming composition by the above method can be fired to form a cured film. At that time, the firing temperature can be usually any temperature of 100 to 350 ° C., but is preferably 140 to 300 ° C., more preferably 150 to 230 ° C., and further preferably 160 to 220 ° C. The firing time is usually any time of 5 to 240 minutes. It is preferably 10 to 90 minutes, more preferably 20 to 90 minutes. For heating, a generally known method, for example, a hot plate, a hot air circulation oven, an IR (infrared) type oven, a belt furnace, or the like can be used.
 この硬化膜の厚みは必要に応じて選択することができるが、好ましくは5nm以上、より好ましくは10nm以上の場合、液晶表示素子の信頼性が向上するので好適である。また、硬化膜の厚みが好ましくは300nm以下、より好ましくは150nm以下の場合は、液晶表示素子の消費電力が極端に大きくならないので好適である。 The thickness of this cured film can be selected as needed, but preferably 5 nm or more, more preferably 10 nm or more, because the reliability of the liquid crystal display element is improved. Further, when the thickness of the cured film is preferably 300 nm or less, more preferably 150 nm or less, the power consumption of the liquid crystal display element does not become extremely large, which is preferable.
 以上のようにしてラジカル発生膜を有する第一基板を得ることができるが、当該ラジカル発生膜に一軸配向処理を施すことができる。一軸配向処理を行う方法としては、光配向法、斜方蒸着法、ラビング、磁場による一軸配向処理等が挙げられる。 Although the first substrate having a radical generating film can be obtained as described above, the radical generating film can be subjected to uniaxial orientation treatment. Examples of the method for performing the uniaxial alignment treatment include a photoalignment method, an orthorhombic vapor deposition method, rubbing, and a uniaxial alignment treatment using a magnetic field.
 一方向にラビング処理することによる配向処理を行う場合には、例えば、ラビング布が巻きつけられたラビングローラーを回転させながら、ラビング布と膜とが接触するように基板を移動させる。光配向法を用いる場合には、特定波長の偏光UVを膜全面に照射し、必要に応じて加熱することにより配向処理ができる。
 櫛歯電極が形成されている本発明の第一基板の場合、液晶の電気的物性によって方向が選択されるが、正の誘電異方性を有する液晶を用いる場合において、ラビング方向は櫛歯電極の延びている方向とほぼ同一の方向とすることが好ましい。
When the orientation treatment is performed by the rubbing treatment in one direction, for example, the substrate is moved so that the rubbing cloth and the film come into contact with each other while rotating the rubbing roller around which the rubbing cloth is wound. When the photo-alignment method is used, the alignment process can be performed by irradiating the entire surface of the film with polarized UV having a specific wavelength and heating the film as necessary.
In the case of the first substrate of the present invention in which the comb tooth electrode is formed, the direction is selected by the electrical properties of the liquid crystal, but when a liquid crystal having positive dielectric anisotropy is used, the rubbing direction is the comb tooth electrode. It is preferable that the direction is substantially the same as the extending direction of.
 弱アンカリング部と強アンカリング部を作り出す工程として、フォトマスク等を介して任意のパターンにて放射線を照射する方法が挙げられる。これは予めラジカル発生膜に放射線を照射することによりラジカル発生部位を消失させ、弱アンカリング状態にならないようにする工程である。この工程を行う際の放射線として偏光又は特定の波長の光や、イオンビーム等が挙げられる。光ラジカル発生部位に該当する部分の吸光度が最も高くなる波長の光を照射することが特に好ましい。 As a step of creating a weak anchoring part and a strong anchoring part, there is a method of irradiating radiation with an arbitrary pattern via a photomask or the like. This is a step of irradiating the radical generation membrane with radiation in advance to eliminate the radical generation site and prevent a weak anchoring state. Examples of the radiation used in this step include polarized light or light having a specific wavelength, an ion beam, and the like. It is particularly preferable to irradiate light having a wavelength having the highest absorbance at the portion corresponding to the photoradical generation site.
 本発明の第二基板は、ラジカル発生膜を有していてもよいし、有していなくてもよい。第二基板は従来から知られている液晶配向膜を有する基板とすることが好ましい。 The second substrate of the present invention may or may not have a radical generation film. The second substrate is preferably a substrate having a conventionally known liquid crystal alignment film.
 本発明においては、第一基板が櫛歯電極を有する基板であり、第二基板が対向基板であってもよい。また、本発明においては、第二基板が櫛歯電極を有する基板であり、第一基板が対向基板であってもよい。 In the present invention, the first substrate may be a substrate having a comb tooth electrode, and the second substrate may be a facing substrate. Further, in the present invention, the second substrate may be a substrate having a comb tooth electrode, and the first substrate may be a facing substrate.
<液晶セル>
 本発明の液晶セルは、上記の方法により、基板にラジカル発生膜を形成した後、当該ラジカル発生膜を有する基板(第一基板)と、公知の液晶配向膜を有する基板(第二基板)とを、ラジカル発生膜と液晶配向膜とが向かい合うように配置し、スペーサーを挟んで、シール剤で固定し、液晶及びラジカル重合性化合物を含有する液晶組成物を注入して封止することにより得られる。その際、用いるスペーサーの大きさは通常1~30μmであるが、好ましくは2~10μmである。
<LCD cell>
The liquid crystal cell of the present invention comprises a substrate having the radical generating film (first substrate) and a substrate having a known liquid crystal alignment film (second substrate) after forming a radical generating film on the substrate by the above method. Is obtained by arranging the radical generating film and the liquid crystal alignment film so as to face each other, sandwiching a spacer, fixing with a sealing agent, and injecting and sealing a liquid crystal composition containing a liquid crystal and a radically polymerizable compound. Be done. At that time, the size of the spacer used is usually 1 to 30 μm, but preferably 2 to 10 μm.
 液晶及びラジカル重合性化合物を含有する液晶組成物を注入する方法は特に制限されず、作製した液晶セル内を減圧にした後、液晶と重合性化合物を含む混合物を注入する真空法、液晶と重合性化合物とを含む混合物を滴下した後に封止を行う滴下法などを挙げることができる。 The method of injecting a liquid crystal composition containing a liquid crystal and a radically polymerizable compound is not particularly limited, and a vacuum method of injecting a mixture containing the liquid crystal and the polymerizable compound after depressurizing the inside of the produced liquid crystal cell, polymerization with the liquid crystal. Examples thereof include a dropping method in which a mixture containing a sex compound is dropped and then sealed.
<ラジカル重合性化合物、及び液晶組成物>
 本発明のラジカル重合性化合物は、下記式(A)で表される。
Figure JPOXMLDOC01-appb-C000052
(式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または下記式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
Figure JPOXMLDOC01-appb-C000053
(式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
<Radical polymerizable compound and liquid crystal composition>
The radically polymerizable compound of the present invention is represented by the following formula (A).
Figure JPOXMLDOC01-appb-C000052
(In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or the following formula (B), but at least one of the three Xs represents the formula (B).)
Figure JPOXMLDOC01-appb-C000053
(In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
 Rにおける脂肪族炭化水素基の炭素数は1~10であり、炭素数1~8であってもよいし、炭素数1~6であってもよいし、炭素数1~4であってもよい。 The aliphatic hydrocarbon group in R1 has 1 to 10 carbon atoms, may have 1 to 8 carbon atoms, may have 1 to 6 carbon atoms, and may have 1 to 4 carbon atoms. May be good.
 R、R、及びRにおける炭素数1~6のアルキル基としては、例えば、炭素数1~5のアルキル基であってもよいし、炭素数1~4のアルキル基であってもよい。これらアルキル基は、直鎖構造であってもよいし、分岐構造であってもよい。 The alkyl group having 1 to 6 carbon atoms in R 2 , R 3 and R 4 may be, for example, an alkyl group having 1 to 5 carbon atoms or an alkyl group having 1 to 4 carbon atoms. good. These alkyl groups may have a linear structure or a branched structure.
 R、R、及びRにおける芳香族炭化水素基は、無置換であってもよいし、水素原子が置換基により置換されていてもよい。
 置換基を有していてもよい芳香族炭化水素基の置換基としては、例えば、ハロゲン原子、炭素数1~4のアルキル基、炭素数1~4のアルコキシ基、炭素数1~4のハロゲン化アルキル基、炭素数1~4のハロゲン化アルコキシ基などが挙げられる。ハロゲン化アルキル基、およびハロゲン化アルコキシ基におけるハロゲン化は、全ハロゲン化であってもよいし、一部のハロゲン化であってもよい。ハロゲン原子としては、例えば、フッ素原子、塩素原子などが挙げられる。
 置換基を有していてもよい芳香族炭化水素基における芳香族炭化水素基としては、例えば、フェニル基、ナフチル基が挙げられる。
 芳香族炭化水素基における置換基の数としては、特に限定されない。
The aromatic hydrocarbon groups in R 2 , R 3 and R 4 may be unsubstituted or the hydrogen atom may be substituted with a substituent.
Examples of the substituent of the aromatic hydrocarbon group which may have a substituent include a halogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, and a halogen having 1 to 4 carbon atoms. Examples thereof include an alkylated group and an alkoxy halide group having 1 to 4 carbon atoms. The halogenation in the alkyl halide group and the halogenated alkoxy group may be total halogenation or partial halogenation. Examples of the halogen atom include a fluorine atom and a chlorine atom.
Examples of the aromatic hydrocarbon group in the aromatic hydrocarbon group which may have a substituent include a phenyl group and a naphthyl group.
The number of substituents in the aromatic hydrocarbon group is not particularly limited.
 式(A)で表されるラジカル重合性化合物において、式(B)で表される基は1つ以上であり、1つであってもよいし、2つであってもよいし、3つであってもよい。
 式(A)で表されるラジカル重合性化合物において、3つのXはそれぞれ独立している。そのため、式(A)で表されるラジカル重合性化合物において、式(B)で表される基が2つ以上の場合、2つ以上の式(B)で表される基は、同じ構造であってもよいし、異なる構造であってもよい。
In the radically polymerizable compound represented by the formula (A), the number of groups represented by the formula (B) is one or more, and may be one, two, or three. May be.
In the radically polymerizable compound represented by the formula (A), the three Xs are independent of each other. Therefore, in the radically polymerizable compound represented by the formula (A), when there are two or more groups represented by the formula (B), the groups represented by the two or more formulas (B) have the same structure. It may be present or may have a different structure.
 式(B)において、R、R、およびRの少なくとも一つは、置換基を有していてもよい芳香族炭化水素基であってもよい。そのため、式(B)において、R、R、およびRの一つが置換基を有していてもよい芳香族炭化水素基であってもよいし、R、R、およびRの二つが置換基を有していてもよい芳香族炭化水素基であってもよし、R、R、およびRの三つが置換基を有していてもよい芳香族炭化水素基であってもよい。 In formula (B), at least one of R 2 , R 3 , and R 4 may be an aromatic hydrocarbon group which may have a substituent. Therefore, in the formula (B), one of R 2 , R 3 , and R 4 may be an aromatic hydrocarbon group which may have a substituent, or R 2 , R 3 , and R 4 . Two may be aromatic hydrocarbon groups which may have a substituent, and three of R 2 , R 3 and R 4 may be an aromatic hydrocarbon group which may have a substituent. There may be.
 そして、前記ラジカル重合性化合物のラジカル重合可能な重合性基Mとしては以下の構造から選ばれる重合性基が好ましい。
Figure JPOXMLDOC01-appb-C000054
(式中、*は結合部位を示す。Rは炭素数2~8の直鎖アルキル基を表し、Eは単結合、-O-、-NR-、-S-、エステル結合及びアミド結合から選ばれる結合基を表す。Rは水素原子、または炭素数1~4のアルキル基を示す。Rは水素原子、または炭素数1~6のアルキル基を表す。)
The radically polymerizable polymerizable group M of the radically polymerizable compound is preferably a polymerizable group selected from the following structures.
Figure JPOXMLDOC01-appb-C000054
(In the formula, * indicates a binding site. R b represents a linear alkyl group having 2 to 8 carbon atoms, and E represents a single bond, -O-, -NR c- , -S-, an ester bond and an amide bond. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.)
 式(A)で表されるラジカル重合性化合物としては、例えば、以下の(1)~(3)を満たすラジカル重合性化合物が挙げられる。
 (1):式(A)中、Mは下記構造(C)又は構造(D)を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。
 (2):式(B)中、Yは-O-を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。ただし、R、R、およびRの少なくとも一つは、置換基を有していてもよい芳香族炭化水素基を表す。
 (3):下記式(E)で表されるラジカル重合性化合物ではない。
Figure JPOXMLDOC01-appb-C000055
(構造(C)、及び構造(D)中、*は結合部位を示す。)
Examples of the radically polymerizable compound represented by the formula (A) include radically polymerizable compounds satisfying the following (1) to (3).
(1): In the formula (A), M represents the following structure (C) or structure (D), and R 1 represents an aliphatic hydrocarbon group having a linear or branched structure having 1 to 10 carbon atoms. Each X independently represents a hydrogen atom or formula (B). However, at least one of the three Xs represents equation (B).
(2): In the formula (B), Y represents —O— and * indicates a binding site. R2 , R3 , and R4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms. However, at least one of R 2 , R 3 and R 4 represents an aromatic hydrocarbon group which may have a substituent.
(3): It is not a radically polymerizable compound represented by the following formula (E).
Figure JPOXMLDOC01-appb-C000055
(In the structure (C) and the structure (D), * indicates a binding site.)
 式(A)に含まれるラジカル重合性化合物としては、例えば、以下のラジカル重合性化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000056
Examples of the radically polymerizable compound contained in the formula (A) include the following radically polymerizable compounds.
Figure JPOXMLDOC01-appb-C000056
 液晶組成物は、液晶と、上記ラジカル重合性化合物とを少なくとも含有する。
 液晶組成物中の上記ラジカル重合性化合物の含有量は、液晶とラジカル重合性化合物との合計質量に対して、好ましくは0.5質量%以上、より好ましくは1質量%以上であり、好ましくは10質量%以下、より好ましくは5質量%以下である。
The liquid crystal composition contains at least the liquid crystal and the radically polymerizable compound.
The content of the radically polymerizable compound in the liquid crystal composition is preferably 0.5% by mass or more, more preferably 1% by mass or more, and preferably 1% by mass or more, based on the total mass of the liquid crystal and the radically polymerizable compound. It is 10% by mass or less, more preferably 5% by mass or less.
 また、液晶組成物においては、上記ラジカル重合性化合物とは別に他の単官能のラジカル重合性基を有する化合物(以下、「他のラジカル重合性化合物」と称することがある)とを複数併用してもよい。 Further, in the liquid crystal composition, in addition to the above radically polymerizable compound, a plurality of compounds having other monofunctional radically polymerizable groups (hereinafter, may be referred to as “other radically polymerizable compounds”) are used in combination. May be.
 他のラジカル重合性化合物は、有機ラジカルの存在下でラジカル重合を行うことが可能な不飽和結合を有するものであり、例えば、tert-ブチルメタクリレート、ヘキシルメタクリレート、2-エチルヘキシルメタクリレート、ノニルメタクリレート、ラウリルメタクリレート、n-オクチルメタクリレートなどのメタクリレート系モノマー;tert-ブチルアクリレート、ヘキシルアクリレート、2-エチルヘキシルアクリレート、ノニルアクリレート、ラウリルアクリレート、n-オクチルアクリレートなどのアクリレート系モノマー;スチレン、スチレン誘導体(例えば、o-、m-、p-メトキシスチレン、o-、m-、p-tert-ブトキシスチレン、o-、m-、p-クロロメチルスチレンなど)、ビニルエステル類(例えば、酢酸ビニル、プロピオン酸ビニル、安息香酸ビニルなど)、ビニルケトン類(例えば、ビニルメチルケトン、ビニルヘキシルケトン、メチルイソプロペニルケトンなど)、N-ビニル化合物(例えば、N-ビニルピロリドン、N-ビニルピロール、N-ビニルカルバゾール、N-ビニルインドールなど)、(メタ)アクリル酸誘導体(例えば、アクリロニトリル、メタアクリロニトリル、アクリルアミド、イソプロピルアクリルアミド、メタクリルアミドなど)、ハロゲン化ビニル類(例えば、塩化ビニル、塩化ビニリデン、テトラクロロエチレン、ヘキサクロロプレン、フッ化ビニルなど)などのビニルモノマーが挙げられるが、これらに限定はしない。また、これらは、液晶と相溶性を有することが好ましい。 Other radically polymerizable compounds have unsaturated bonds capable of performing radical polymerization in the presence of organic radicals, and are, for example, tert-butyl methacrylate, hexyl methacrylate, 2-ethylhexyl methacrylate, nonyl methacrylate, lauryl. Methacrylate monomers such as methacrylate, n-octyl methacrylate; acrylate monomers such as tert-butyl acrylate, hexyl acrylate, 2-ethylhexyl acrylate, nonyl acrylate, lauryl acrylate, n-octyl acrylate; styrene, styrene derivatives (eg, o- , M-, p-methoxystyrene, o-, m-, p-tert-butoxystyrene, o-, m-, p-chloromethylstyrene, etc.), vinyl esters (eg, vinyl acetate, vinyl propionate, benzoate) Vinyl acid acid, etc.), vinyl ketones (eg, vinyl methyl ketone, vinyl hexyl ketone, methyl isopropenyl ketone, etc.), N-vinyl compounds (eg, N-vinylpyrrolidone, N-vinylpyrrole, N-vinylcarbazole, N-vinyl, etc.) Indole, etc.), (meth) acrylic acid derivatives (eg, acrylonitrile, metaacrylonitrile, acrylamide, isopropylacrylamide, methacrylicamide, etc.), vinyl halides (eg, vinyl chloride, vinylidene chloride, tetrachloroethylene, hexachloroprene, vinyl fluoride, etc.) ) And other vinyl monomers, but are not limited to these. Further, it is preferable that these have compatibility with the liquid crystal.
 また、他のラジカル重合性化合物としては、下記式(1)で表される化合物も好ましい。
Figure JPOXMLDOC01-appb-C000057
(式(1)中、RおよびRはそれぞれ独立に炭素数2~8の直鎖アルキル基を表し、Eは単結合、-O-、-NR-、-S-、エステル結合、およびアミド結合から選ばれる結合基を表す。Rは水素原子または炭素数1~4のアルキル基を表す。)
Further, as the other radically polymerizable compound, a compound represented by the following formula (1) is also preferable.
Figure JPOXMLDOC01-appb-C000057
(In the formula (1 ), Ra and R b each independently represent a linear alkyl group having 2 to 8 carbon atoms, and E is a single bond, —O—, —NR c −, —S—, an ester bond, And a bonding group selected from an amide bond. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.)
 液晶組成物に含有されるラジカル重合性化合物のうち少なくとも一種は、液晶と相溶性を有する、一分子中に一個の重合性不飽和結合を有する化合物、すなわち、単官能のラジカル重合性基を有する化合物であることが好ましい。 At least one of the radically polymerizable compounds contained in the liquid crystal composition has a compound having a polymerizable unsaturated bond in one molecule, which is compatible with the liquid crystal, that is, a monofunctional radically polymerizable group. It is preferably a compound.
 そして、前記式(1)で表されるラジカル重合性化合物としては式中Eがエステル結合(-C(=O)-O-または-O-C(=O)-で表される結合)のものが合成のしやすさや液晶への相溶性、重合反応性の観点で好ましく、具体的には以下のような構造で表される化合物が好ましいが、特に限定はしない。
Figure JPOXMLDOC01-appb-C000058
 また、液晶組成物において、ラジカル重合性化合物を重合させて得られるポリマーのTgが100℃以下になるラジカル重合性化合物を含有することが好ましい。
As the radically polymerizable compound represented by the formula (1), E in the formula has an ester bond (bond represented by —C (= O) —O— or —O—C (= O) −). Those are preferable from the viewpoints of ease of synthesis, compatibility with liquid crystal, and polymerization reactivity, and specifically, compounds represented by the following structures are preferable, but are not particularly limited.
Figure JPOXMLDOC01-appb-C000058
Further, it is preferable that the liquid crystal composition contains a radically polymerizable compound in which the Tg of the polymer obtained by polymerizing the radically polymerizable compound is 100 ° C. or lower.
 これらの各種ラジカル重合性モノマーは、単独で使用しても、2種以上を併用してもよい。また、これらは、液晶と相溶性を有することが好ましい。 These various radically polymerizable monomers may be used alone or in combination of two or more. Further, it is preferable that these have compatibility with the liquid crystal.
 ラジカル重合性化合物を重合させて得られるポリマーは、そのTgを100℃以下とすることが好ましく、より好ましくは0℃以下である。 The polymer obtained by polymerizing a radically polymerizable compound preferably has a Tg of 100 ° C. or lower, more preferably 0 ° C. or lower.
 なお、液晶とは一般に固体と液体の両方の性質を示す状態にある物質をいい、代表的な液晶相としてネマティック液晶とスメクティック液晶があるが、本発明において使用できる液晶は特に限定されない。一例を挙げれば4-ペンチル-4’-シアノビフェニルである。 The liquid crystal generally refers to a substance exhibiting both solid and liquid properties, and typical liquid crystal phases include nematic liquid crystal and smectic liquid crystal, but the liquid crystal that can be used in the present invention is not particularly limited. One example is 4-pentyl-4'-cyanobiphenyl.
 次に、この液晶とラジカル重合性化合物とを含む混合物(液晶組成物)が導入された液晶セルに当該ラジカル重合性化合物を重合反応させるのに十分なエネルギーを与える。これは、例えば、熱を加えるか、UV照射することにより実施することができ、当該ラジカル重合性化合物がその場で重合されることで、所望の特性が発現する。中でも配向性のパターニングが可能となり、更に短時間で重合反応させられる点で、UV照射が好ましい。 Next, sufficient energy is given to the liquid crystal cell into which the mixture (liquid crystal composition) containing the liquid crystal and the radically polymerizable compound is introduced to carry out the polymerization reaction of the radically polymerizable compound. This can be done, for example, by applying heat or UV irradiation, and the radically polymerizable compound is polymerized in situ to exhibit the desired properties. Of these, UV irradiation is preferable because it enables oriented patterning and allows the polymerization reaction to occur in a shorter time.
 またUV照射の際、加熱を行ってもよい。UV照射を行う際の加熱温度は、導入された液晶が液晶性を発現する温度範囲が好ましく、通常40℃以上であり、液晶の等方相に変わる温度未満での加熱が好ましい。 Also, heating may be performed during UV irradiation. The heating temperature at the time of UV irradiation is preferably in a temperature range in which the introduced liquid crystal exhibits liquid crystal properties, is usually 40 ° C. or higher, and is preferably heated at a temperature lower than a temperature at which the liquid crystal changes to an isotropic phase.
 ここで、UV照射する場合におけるUV照射波長は、反応する重合性化合物の反応量子収率の最も良い波長を選択することが好ましく、UVの照射量は、通常0.01~30J/cmであるが、好ましくは、10J/cm以下であり、UV照射量が少ないほうが、液晶ディスプレイを構成する部材の破壊からなる信頼性低下を抑制でき、かつUV照射時間を減らせることで製造上のタクトが向上するので好適である。 Here, as the UV irradiation wavelength in the case of UV irradiation, it is preferable to select the wavelength having the best reaction quantum yield of the reactive polymerizable compound, and the UV irradiation amount is usually 0.01 to 30 J / cm 2 . However, preferably, it is 10 J / cm 2 or less, and the smaller the UV irradiation amount, the more the reliability deterioration due to the destruction of the members constituting the liquid crystal display can be suppressed, and the UV irradiation time can be reduced, so that the manufacturing process can be performed. It is suitable because it improves tact.
 また、UV照射ではなく、加熱のみで重合させる場合の加熱は、重合性化合物の反応する温度であって、液晶の分解温度未満となる温度範囲で行うことが好ましい。具体的には、100~150℃である。 Further, it is preferable that the heating in the case of polymerizing only by heating instead of UV irradiation is performed in a temperature range in which the temperature at which the polymerizable compound reacts and is lower than the decomposition temperature of the liquid crystal display. Specifically, it is 100 to 150 ° C.
 ラジカル重合性化合物を重合反応させるのに十分なエネルギーを与えるとき、電圧を印加しない、無電界状態であることが好ましい。 When giving sufficient energy to polymerize the radically polymerizable compound, it is preferable that no voltage is applied and the state is in an electric field-free state.
<液晶表示素子>
 このようにして得られた液晶セルを用いて液晶表示素子を作製することができる。
 液晶表示素子は、例えば、第一基板、第一基板に対向して配置された第二基板、および第一基板と第二基板との間に充填された液晶を有する。そして、液晶表示素子は、液晶及び式(A)で表されるラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜を有する第一基板のラジカル発生膜に接触させた状態で、ラジカル重合性化合物を重合反応させてなる。
 液晶表示素子は、例えば、液晶セルに必要に応じて反射電極、透明電極、λ/4板、偏光膜、カラーフィルター層等を常法に従って設けることにより反射型液晶表示素子とすることができる。また、液晶セルに必要に応じてバックライト、偏光板、λ/4板、透明電極、偏光膜、カラーフィルター層等を常法に従って設けることにより透過型液晶表示素子とすることができる。
<Liquid crystal display element>
A liquid crystal display element can be manufactured using the liquid crystal cell thus obtained.
The liquid crystal display element has, for example, a first substrate, a second substrate arranged to face the first substrate, and a liquid crystal filled between the first substrate and the second substrate. Then, the liquid crystal display element is subjected to radical polymerization in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the formula (A) are brought into contact with the radical generating film of the first substrate having the radical generating film. It is made by polymerizing a sex compound.
The liquid crystal display element can be made into a reflective liquid crystal display element by, for example, providing a reflective electrode, a transparent electrode, a λ / 4 plate, a polarizing film, a color filter layer, or the like in the liquid crystal cell according to a conventional method. Further, a transmissive liquid crystal display element can be obtained by providing the liquid crystal cell with a backlight, a polarizing plate, a λ / 4 plate, a transparent electrode, a polarizing film, a color filter layer and the like according to a conventional method, if necessary.
 図1は、本発明の横電界液晶表示素子の一例を示す概略断面図であり、IPSモード液晶表示素子の例である。
 図1に例示する横電界液晶表示素子1においては、液晶配向膜2cを具備する櫛歯電極基板2と液晶配向膜4aを具備する対向基板4との間に、液晶3が挟持されている。櫛歯電極基板2は、基材2aと、基材2a上に形成され、櫛歯状に配置された複数の線状電極2bと、基材2a上に線状電極2bを覆うように形成された液晶配向膜2cとを有している。対向基板4は、基材4bと、基材4b上に形成された液晶配向膜4aとを有している。液晶配向膜2cは、例えば、ラジカル発生膜を化学変化させて得られる弱アンカリング膜である。櫛型電極基板側の液晶配向膜は、例えば、ラジカル発生膜に、液晶とラジカル重合性化合物とを含有する液晶組成物を接触させた状態で、ラジカル重合性化合物を重合反応させて得られる。
 この横電界液晶表示素子1においては、線状電極2bに電圧が印加されると、電気力線Lで示すように線状電極2b間で電界が発生する。
FIG. 1 is a schematic cross-sectional view showing an example of a transverse electric field liquid crystal display element of the present invention, and is an example of an IPS mode liquid crystal display element.
In the transverse electric field liquid crystal display element 1 illustrated in FIG. 1, the liquid crystal 3 is sandwiched between the comb tooth electrode substrate 2 provided with the liquid crystal alignment film 2c and the opposed substrate 4 provided with the liquid crystal alignment film 4a. The comb tooth electrode substrate 2 is formed on the base material 2a and the base material 2a, and is formed so as to cover the plurality of linear electrodes 2b arranged in a comb tooth shape and the linear electrodes 2b on the base material 2a. It also has a liquid crystal alignment film 2c. The facing substrate 4 has a base material 4b and a liquid crystal alignment film 4a formed on the base material 4b. The liquid crystal alignment film 2c is, for example, a weak anchoring film obtained by chemically changing a radical generation film. The liquid crystal alignment film on the comb-shaped electrode substrate side is obtained, for example, by polymerizing a radically polymerizable compound in a state where a liquid crystal composition containing a liquid crystal and a radically polymerizable compound is in contact with a radical generating film.
In the lateral electric field liquid crystal display element 1, when a voltage is applied to the linear electrodes 2b, an electric field is generated between the linear electrodes 2b as shown by the electric lines of force L.
 図2は、本発明の横電界液晶表示素子の他の例を示す概略断面図であり、FFSモード液晶表示素子の例である。
 図2に例示する横電界液晶表示素子1においては、液晶配向膜2hを具備する櫛歯電極基板2と液晶配向膜4aを具備する対向基板4との間に、液晶3が挟持されている。櫛歯電極基板2は、基材2dと、基材2d上に形成された面電極2eと、面電極2e上に形成された絶縁膜2fと、絶縁膜2f上に形成され、櫛歯状に配置された複数の線状電極2gと、絶縁膜2f上に線状電極2gを覆うように形成された液晶配向膜2hとを有している。対向基板4は、基材4bと、基材4b上に形成された液晶配向膜4aとを有している。液晶配向膜2hは、例えば、ラジカル発生膜を化学変化させて得られる弱アンカリング膜である。櫛型電極基板側の液晶配向膜は、例えば、ラジカル発生膜に、液晶とラジカル重合性化合物とを含有する液晶組成物を接触させた状態で、ラジカル重合性化合物を重合反応させて得られる。
 この横電界液晶表示素子1においては、面電極2eおよび線状電極2gに電圧が印加されると、電気力線Lで示すように面電極2eおよび線状電極2g間で電界が発生する。
FIG. 2 is a schematic cross-sectional view showing another example of the transverse electric field liquid crystal display element of the present invention, and is an example of an FFS mode liquid crystal display element.
In the transverse electric field liquid crystal display element 1 illustrated in FIG. 2, the liquid crystal 3 is sandwiched between the comb tooth electrode substrate 2 provided with the liquid crystal alignment film 2h and the opposed substrate 4 provided with the liquid crystal alignment film 4a. The comb tooth electrode substrate 2 is formed on the base material 2d, the surface electrode 2e formed on the base material 2d, the insulating film 2f formed on the surface electrode 2e, and the insulating film 2f, and has a comb tooth shape. It has a plurality of arranged linear electrodes 2g and a liquid crystal alignment film 2h formed on the insulating film 2f so as to cover the linear electrodes 2g. The facing substrate 4 has a base material 4b and a liquid crystal alignment film 4a formed on the base material 4b. The liquid crystal alignment film 2h is, for example, a weak anchoring film obtained by chemically changing a radical generating film. The liquid crystal alignment film on the comb-shaped electrode substrate side is obtained, for example, by polymerizing a radically polymerizable compound in a state where a liquid crystal composition containing a liquid crystal and a radically polymerizable compound is in contact with a radical generating film.
In the lateral electric field liquid crystal display element 1, when a voltage is applied to the surface electrode 2e and the linear electrode 2g, an electric field is generated between the surface electrode 2e and the linear electrode 2g as shown by the electric lines of force L.
 以下に実施例を挙げて本発明を具体的に説明するが、本発明は、これらの実施例に限定して解釈されるものではない。化合物の略号、及び各特性の測定方法は以下のとおりである。 The present invention will be specifically described below with reference to examples, but the present invention is not construed as being limited to these examples. The abbreviations of the compounds and the measuring method of each characteristic are as follows.
(ジアミン)
 DA-1~DA-5:それぞれ、下記式(DA-1)~(DA-5)で表される化合物
Figure JPOXMLDOC01-appb-C000059
(Diamine)
DA-1 to DA-5: Compounds represented by the following formulas (DA-1) to (DA-5), respectively.
Figure JPOXMLDOC01-appb-C000059
(テトラカルボン酸二無水物)
 TC-1~TC-3:それぞれ、下記式(TC-1)~(TC-3)で表される化合物
Figure JPOXMLDOC01-appb-C000060
(Tetracarboxylic dianhydride)
TC-1 to TC-3: Compounds represented by the following formulas (TC-1) to (TC-3), respectively.
Figure JPOXMLDOC01-appb-C000060
(添加剤)
 Add-1~Add-11:それぞれ、下記式(Add-1)~(Add-11)で表される化合物
 Add-C1~Add-C3:それぞれ、下記式(Add-C1)~(Add-C3)で表される化合物
 AD-1:下記式(AD-1)で表される化合物
Figure JPOXMLDOC01-appb-C000061
(Additive)
Add-1 to Add-11: Compounds represented by the following formulas (Add-1) to (Add-11), respectively. Addd-C1 to Add-C3: The following formulas (Add-C1) to (Add-C3, respectively). ): Compound represented by the following formula (AD-1)
Figure JPOXMLDOC01-appb-C000061
(溶媒)
 THF:テトラヒドロフラン
 CHCl:ジクロロメタン
 CHCl:クロロホルム
 DMF:N,N-ジメチルホルムアミド
 NMP:N-メチル-2-ピロリドン
 BCS:ブチルセロソルブ
 GBL:γ-ブチロラクトン
(反応試剤)
 TEA:トリエチルアミン
 DMAP:4-ジメチルアミノピリジン
(その他)
 BHT:2,6-ジ-tert-ブチル-p-クレゾール
 MEHQ:4-メトキシフェノール
(solvent)
THF: tetrahydrofuran CH 2 Cl 2 : dichloromethane CHCl 3 : chloroform DMF: N, N-dimethylformamide NMP: N-methyl-2-pyrrolidone BCS: butyl cellosolve GBL: γ-butyrolactone (reaction tester)
TEA: Triethylamine DMAP: 4-Dimethylaminopyridine (Other)
BHT: 2,6-di-tert-butyl-p-cresol MEHQ: 4-methoxyphenol
<粘度測定>
 ポリアミック酸溶液などの粘度は、E型粘度計TVE-22H(東機産業社製)を用い、サンプル量1.1mL(ミリリットル)、コーンロータTE-1(1°34’、R24)、温度25℃において測定した。
<Viscosity measurement>
For the viscosity of the polyamic acid solution, etc., use an E-type viscometer TVE-22H (manufactured by Toki Sangyo Co., Ltd.), sample volume 1.1 mL (milliliter), cone rotor TE-1 (1 ° 34', R24), temperature 25. Measured at ° C.
<分子量の測定>
 ポリイミド前駆体及びポリイミドなどの分子量は、常温ゲル浸透クロマトグラフィー(GPC)装置(GPC-101)(昭和電工社製)、カラム(GPC KD-803,GPC KD-805)(昭和電工社製)を用いて、以下のようにして測定した。
 カラム温度:50℃
 溶離液:N,N-ジメチルホルムアミド(添加剤として、臭化リチウム一水和物(LiBr・HO)が30mmol/L(リットル)、リン酸・無水結晶(o-リン酸)が30mmol/L、テトラヒドロフラン(THF)が10mL/L)
 流速:1.0mL/分
 検量線作成用標準サンプル:TSK 標準ポリエチレンオキサイド(分子量;約900,000、150,000、100,000及び30,000)(東ソー社製)及びポリエチレングリコール(分子量;約12,000、4,000及び1,000)(ポリマーラボラトリー社製)。
<Measurement of molecular weight>
For the molecular weight of the polyimide precursor and polyimide, use a room temperature gel permeation chromatography (GPC) device (GPC-101) (manufactured by Showa Denko), a column (GPC KD-803, GPC KD-805) (manufactured by Showa Denko). Using, it was measured as follows.
Column temperature: 50 ° C
Eluent: N, N-dimethylformamide (as an additive, lithium bromide monohydrate (LiBr · H 2 O) is 30 mmol / L (liter), phosphoric acid / anhydrous crystal (o-phosphoric acid) is 30 mmol / L, tetrahydrofuran (THF) is 10 mL / L)
Flow rate: 1.0 mL / min Standard sample for preparing a calibration curve: TSK standard polyethylene oxide (molecular weight; about 900,000, 150,000, 100,000 and 30,000) (Tosoh) and polyethylene glycol (molecular weight; about) 12,000, 4,000 and 1,000) (manufactured by Polymer Laboratory).
<イミド化率の測定>
 ポリイミド粉末20mgをNMRサンプル管(草野科学社製 NMRサンプリングチューブスタンダード φ5)に入れ、重水素化ジメチルスルホキシド(DMSO-d、0.05質量%テトラメチルシラン(TMS)混合品)1.0mLを添加し、超音波をかけて完全に溶解させた。この溶液をフーリエ変換型超伝導核磁気共鳴装置(FT-NMR)「AVANCE III」(BRUKER製)にて500MHzのプロトンNMRを測定した。
 化学イミド化率は、イミド化前後で変化しない構造に由来するプロトンを基準プロトンとして決め、このプロトンのピーク積算値と、9.5~10.0ppm付近に現れるアミック酸のNH基に由来するプロトンピーク積算値とを用い以下の式によって求めた。なお、式中、xはアミック酸のNH基由来のプロトンピーク積算値であり、yは基準プロトンのピーク積算値であり、αはポリアミック酸(イミド化率が0%)の場合におけるアミック酸のNH基のプロトン1個に対する基準プロトンの個数割合である。
   イミド化率(%)=(1-α・x/y)×100
<Measurement of imidization rate>
20 mg of polyimide powder is placed in an NMR sample tube (NMR sampling tube standard φ5 manufactured by Kusano Kagaku Co., Ltd.), and 1.0 mL of deuterated dimethyl sulfoxide (DMSO-d 6 , 0.05 mass% tetramethylsilane (TMS) mixture) is added. It was added and ultrasonically applied to completely dissolve it. This solution was measured by proton NMR at 500 MHz with a Fourier transform type superconducting nuclear magnetic resonance apparatus (FT-NMR) “AVANCE III” (manufactured by BRUKER).
The chemical imidization rate is determined by using a proton derived from a structure that does not change before and after imidization as a reference proton, and the peak integrated value of this proton and the proton derived from the NH group of the amic acid appearing in the vicinity of 9.5 to 10.0 ppm. It was calculated by the following formula using the peak integrated value. In the formula, x is the integrated proton peak value derived from the NH group of the amic acid, y is the integrated peak value of the reference proton, and α is the integrated value of the amic acid in the case of a polyamic acid (imidization rate is 0%). The number ratio of the reference protons to one proton of the NH group.
Imidization rate (%) = (1-α · x / y) × 100
<<合成例 弱アンカリングIPS用添加剤の合成>>
 下記合成例に記載の生成物はH-NMR分析により同定した(分析条件は下記の通り)。
 装置:フーリエ変換型超伝導核磁気共鳴装置(FT-NMR)「AVANCE III」(BRUKER社製)500MHz。
 溶媒:CDCl(重水素化クロロホルム)又はDMSO-d(重水素化ジメチルスルホキシド)。
 基準物質:テトラメチルシラン(TMS)(δ0.0 ppm for H)。
<< Synthesis example Synthesis of additives for weak anchoring IPS >>
The products described in the following synthetic examples were identified by 1 H-NMR analysis (analytical conditions are as follows).
Device: Fourier transform type superconducting nuclear magnetic resonance device (FT-NMR) "AVANCE III" (manufactured by BRUKER) 500 MHz.
Solvent: CDCl 3 (deuterated chloroform) or DMSO-d 6 (deuterated dimethyl sulfoxide).
Reference substance: Tetramethylsilane (TMS) (δ0.0 ppm for 1 H).
<合成例1 Add-1(2-((Triisopropylsilyl)oxy)ethyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000062
<Synthesis Example 1 Synthesis of Add-1 (2-((Triisopropylsilyl) oxy) ethyl methyllate)>
Figure JPOXMLDOC01-appb-C000062
(第1工程)
 撹拌子を備えた300mL4つ口フラスコに、2-Bromoethanol(12.96g:103.73mmol)、Imidazole(7.06g:103.73mmol)、Triisopropylsilyl Chloride(10.00g:51.87mmol)、及びCHCl(200mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(9.19g:収率63%、無色透明液体)を得た。
(First step)
2-Bromoethanol (12.96 g: 103.73 mmol), Imidazole (7.06 g: 103.73 mmol), Trisopropylsilyl Chloroform (10.00 g: 51.87 mmol), and CHCl 3 in a 300 mL four-necked flask equipped with a stir bar. (200 mL) was weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (9.19 g: yield 63%, colorless) is obtained by distilling off the solvent and vacuum drying. Clear liquid) was obtained.
(第2工程)
 撹拌子を備えた300mL4つ口フラスコに第1工程で得られた(2-Bromoethoxy)triisopropylsilane(9.00g:32.68mmol)、Potassium methacrylate(4.77g:38.39mmol)、BHT(0.07g:0.32mmol)、及びDMF(200mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、200mLのヘプタンに反応溶液を注ぎ、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-1(8.80g:収率96%、淡黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:6.03(1H)、5.67(1H)、4.20-4.18(2H)、3.91-3.89(2H)、1.88(3H)、1.09-1.00(21H)
(Second step)
A 300 mL four-necked flask equipped with a stirrer was obtained in the first step (2-Bromoethoxy) triisopropylsilane (9.00 g: 32.68 mmol), Potassium methyllate (4.77 g: 38.39 mmol), BHT (0.07 g). : 0.32 mmol) and DMF (200 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into 200 mL of heptane and washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product is Add-1 (8.80 g: yield) by distilling off the solvent and vacuum drying. A rate of 96%, pale yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 6.03 (1H), 5.67 (1H), 4.20-4.18 (2H), 3.91-3.89 (2H), 1 .88 (3H), 1.09-1.00 (21H)
<合成例2 Add-2(2-((tert-butyldimethylsilyl)oxy)ethyl methacrylateの合成>
Figure JPOXMLDOC01-appb-C000063
<Synthesis Example 2 Addd-2 (2-((tert-butyldimethylyl) oxy) synthesis of ethyl methyllate>
Figure JPOXMLDOC01-appb-C000063
(第1工程)
 撹拌子を備えた300mL4つ口フラスコに、2-Bromoethanol(16.58g:132.70mmol)、Imidazole(9.03g:132.70mmol)、tert-butyldimethylchlorosilane(10.00g:66.35mmol)、及びCHCl(200mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(7.30g:収率46%、無色透明液体)を得た。
(First step)
2-Bromoethanol (16.58 g: 132.70 mmol), Imidazole (9.03 g: 132.70 mmol), tert-butyldimethylchloroform (10.00 g: 66.35 mmol), and CHCl in a 300 mL four-necked flask equipped with a stir bar. 3 (200 mL) was weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (7.30 g: yield 46%, colorless) is obtained by distilling off the solvent and vacuum drying. Clear liquid) was obtained.
(第2工程)
 撹拌子を備えた300mL4つ口フラスコに第1工程で得られた(2-bromoethoxy)(tert-butyl)dimethylsilane(7.00g:29.26mmol)、Potassium methacrylate(4.36g:35.11mmol)、BHT(0.06g:0.29mmol)、及びDMF(200mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、200mLのヘプタンに反応溶液を注ぎ、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-2(5.80g:収率86%、淡黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:6.03(1H)、5.69(1H)、4.16-4.14(2H)、3.82-3.80(2H)、1.88(3H)、0.85(9H)、0.04(6H)
(Second step)
A 300 mL four-necked flask equipped with a stirrer, obtained in the first step (2-bromoethoxy) (tert-butyl) dimethyllane (7.00 g: 29.26 mmol), Potassium methyllate (4.36 g: 35.11 mmol),. BHT (0.06 g: 0.29 mmol) and DMF (200 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into 200 mL of heptane and washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product is Add-2 (5.80 g: yield) by distilling off the solvent and vacuum drying. A rate of 86%, a pale yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 6.03 (1H), 5.69 (1H), 4.16-4.14 (2H), 3.82-3.80 (2H), 1 .88 (3H), 0.85 (9H), 0.04 (6H)
<合成例3 Add-3(2-((tert-butyldiphenylsilyl)oxy)ethyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000064
<Synthesis Example 3 Synthesis of Add-3 (2-((tert-butyldiphenylsylyl) oxy) ethyl meshrylate)>
Figure JPOXMLDOC01-appb-C000064
(第1工程)
 撹拌子を備えた300mL4つ口フラスコに、2-Bromoethanol(18.19g:145.53mmol)、Imidazole(9.91:145.53mmol)、tert-Butyldiphenylchlorosilane(10.00g:36.38mmol)、及びCHCl(400mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(9.78g:収率74%、無色透明液体)を得た。
(First step)
2-Bromoethanol (18.19 g: 145.53 mmol), Imidazole (9.91: 145.53 mmol), tert-Butyldiphenylchloroform (10.00 g: 36.38 mmol), and CHCl in a 300 mL four-necked flask equipped with a stir bar. 3 (400 mL) was weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (9.78 g: yield 74%, colorless) is obtained by distilling off the solvent and vacuum drying. Clear liquid) was obtained.
(第2工程)
 撹拌子を備えた300mL4つ口フラスコに第1工程で得られた(2-bromoethoxy)(tert-butyl)diphenylsilane(9.78:26.91mmol)、Potassium methacrylate(4.00g:32.29mmol)、BHT(0.057g:0.26mmol)、及びDMF(200mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、200mLのヘプタンに反応溶液を注ぎ、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=20/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-3(6.55g:収率34%、淡黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:7.63-7.62(4H)、7.48-7.41(6H)、6.03(1H)、5.70-5.71(1H)、4.25-4.27(2H)、3.87-3.89(2H)、1.89(3H)、0.98(9H)
(Second step)
A 300 mL four-necked flask equipped with a stirrer, (2-bromoethoxy) (tert-butyl) diphenylsilane (9.78: 26.91 mmol), Potassium methyllate (4.00 g: 32.29 mmol), obtained in the first step. BHT (0.057 g: 0.26 mmol) and DMF (200 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into 200 mL of heptane and washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 20/1 (volume ratio)), and the target product is Addd-3 (6.55 g: yield) by distilling off the solvent and vacuum drying. A rate of 34%, a pale yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 7.63-7.62 (4H), 7.48-7.41 (6H), 6.03 (1H), 5.70-5.71 ( 1H), 4.25-4.27 (2H), 3.87-3.89 (2H), 1.89 (3H), 0.98 (9H)
<合成例4 Add-4(2-(trimethylsilyl)ethyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000065
<Synthesis Example 4 Synthesis of Add-4 (2- (trimethylsilyl) ethylmetrilate)>
Figure JPOXMLDOC01-appb-C000065
(第1工程)
 撹拌子を備えた300mL4つ口フラスコに、2-(Trimethylsilyl)ethanol(10.00g:84.6mmol)、Pyridine(13.38g:169.1mmol)、Methacryloyl chloride(11.50g:110.0mmol)、及びTHF(100mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-4(12.00g:収率76%、淡黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in CDCl:6.06(1H)、5.51(1H)、4.21-4.24(2H)、1.92(3H)、1.00-1.03(2H)、0.03-0.05(9H)
(First step)
In a 300 mL four-necked flask equipped with a stirrer, 2- (Trimethylylyl) ethanol (10.00 g: 84.6 mmol), Pyridine (13.38 g: 169.1 mmol), Metacrylloid (11.50 g: 110.0 mmol), And THF (100 mL) was weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product is Add-4 (12.00 g: yield) by distilling off the solvent and vacuum drying. A rate of 76%, a pale yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in CDCl 3 : 6.06 (1H), 5.51 (1H), 4.21-4.24 (2H), 1.92 (3H), 1.00-1.03 (2H), 0.03-0.05 (9H)
<合成例5 Add-5(3-(trimethylsilyl)propyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000066
<Synthesis Example 5 Synthesis of Add-5 (3- (trimethylsilyl) propanol methyllate)>
Figure JPOXMLDOC01-appb-C000066
(第1工程)
 撹拌子を備えた300mL4つ口フラスコに、3-(Trimethylsilyl)-1-propanol(5.00g:37.8mmol)、Pyridine(5.98g:75.6mmol)、Methacryloyl chloride(5.14g:49.1mmol)、及びTHF(50mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=20/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-5(6.56g:収率87%、淡黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in CDCl:6.08(1H)、5.52(1H)、4.06-4.09(2H)、1.92(3H)、1.61-1.67(2H)、0.48-0.52(2H)、0.01(9H)
(First step)
In a 300 mL four-necked flask equipped with a stirrer, 3- (Trimethylsylyl) -1-propanol (5.00 g: 37.8 mmol), Pyridine (5.98 g: 75.6 mmol), and Methacryloyl chloride (5.14 g: 49.). 1 mmol) and THF (50 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 20/1 (volume ratio)), and the target product is Add-5 (6.56 g: yield) by distilling off the solvent and vacuum drying. A rate of 87%, a pale yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500MHz) in CDCl 3 : 6.08 (1H), 5.52 (1H), 4.06-4.09 (2H), 1.92 (3H), 1.61-1.67 (2H), 0.48-0.52 (2H), 0.01 (9H)
<合成例6 Add-6(3-((tert-butyldiphenylsilyl)oxy)propyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000067
<Synthesis Example 6 Synthesis of Addd-6 (3-((tert-butyldiphenylylyl) oxy) propyl methyllate)>
Figure JPOXMLDOC01-appb-C000067
(第1工程)
 撹拌子を備えた1L4つ口フラスコに、3-Chloro-1-propanol(68.79g:727.6mmol)、Imidazole(49.53g:727.6mmol)、tert-Butyldiphenylchlorosilane(50.00g:181.9mmol)、及びCHCl(300mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(400mL)を加え、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(42.79g:収率71%、淡黄色透明液体)を得た。
(First step)
3-Chloro-1-propanol (68.79 g: 727.6 mmol), Imidazole (49.53 g: 727.6 mmol), tert-Butyldiphenylchloroform (50.00 g: 181.9 mmol) in a 1 L 4-neck flask equipped with a stir bar. ) And CHCl 3 (300 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (400 mL) was added, and the reaction solution was washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (42.79 g: yield 71%, light) is obtained by distilling off the solvent and vacuum drying. A yellow transparent liquid) was obtained.
(第2工程)
 撹拌子を備えた500mL4つ口フラスコに第1工程で得られたtert-butyl(3-chloropropoxy)diphenylsilane(14.55g:43.7mmol)、Potassium methacrylate(8.14g:65.6mmol)、Potassium iodide(0.73g:4.4mmol)、BHT(0.096g:0.44mmol)、及びDMF(150mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、ヘプタン(600mL)に反応溶液を注ぎ、分液ロートを用いて純水(100mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-6(14.54g:収率87%、黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:7.60-7.62(4H)、7.40-7.46(6H)、5.96(1H)、5.64(1H)、4.22-4.25(2H)、3.73-3.75(2H)、1.88-1.90(2H)、1.84(3H)、0.99(9H)
(Second step)
In a 500 mL four-necked flask equipped with a stirrer, tert-butyl (3-chloropropoxy) diphenylsilane (14.55 g: 43.7 mmol), Potassium methyllate (8.14 g: 65.6 mmol), Potassium obtained in the first step. (0.73 g: 4.4 mmol), BHT (0.096 g: 0.44 mmol), and DMF (150 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into heptane (600 mL) and washed 3 times with pure water (100 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Add-6 (14.54 g: yield) by distilling off the solvent and vacuum drying. (Yield 87%, yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 7.60-7.62 (4H), 7.40-7.46 (6H), 5.96 (1H), 5.64 (1H), 4 .22-4.25 (2H), 3.73-3.75 (2H), 1.88-1.90 (2H), 1.84 (3H), 0.99 (9H)
<合成例7 Add-7(2-((tert-butyldiphenylsilyl)oxy)ethyl acrylate)の合成>
Figure JPOXMLDOC01-appb-C000068
<Synthesis Example 7 Addd-7 (2-((tert-butyldiphenylsylyl) oxy) ethyl acrylicate) synthesis>
Figure JPOXMLDOC01-appb-C000068
(第1工程)
 撹拌子を備えた1L4つ口フラスコに、2-Bromoethanol(45.46g:363.8mmol)、Imidazole(24.77g:363.8mmol)、tert-Butyldiphenylchlorosilane(25.00g:91.0mmol)、及びCHCl(150mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(200mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(23.93g:収率72%、淡黄色液体)を得た。
(First step)
2-Bromoethanol (45.46 g: 363.8 mmol), Imidazole (24.77 g: 363.8 mmol), tert-Butyldiphenyl chloroform (25.00 g: 91.0 mmol), and CHCl in a 1 L 4-neck flask equipped with a stir bar. 3 (150 mL) was weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (200 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (23.93 g: yield 72%, light) is obtained by distilling off the solvent and vacuum drying. Yellow liquid) was obtained.
(第2工程)
 撹拌子を備えた500mL4つ口フラスコに第1工程で得られた(2-bromoethoxy)(tert-butyl)diphenylsilane(20.18g:55.6mmol)、Potassium acrylate(9.18g:83.3mmol)、BHT(1.23g:5.6mmol)、及びDMF(200mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、600mLのヘプタンに反応溶液を注ぎ、分液ロートを用いて純水(300mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-7(13.88g:収率70%、黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:7.62-7.64(4H)、7.41-7.49(6H)、6.31-6.35(1H)、6.16-6.21(1H)、5.96-5.98(1H)、4.26-4.27(2H)、3.86-3.88(2H)、0.99(9H)
(Second step)
A 500 mL four-necked flask equipped with a stirrer was provided with (2-bromoethoxy) (tert-butyl) diphenylsilane (20.18 g: 55.6 mmol), Potassium acrylicate (9.18 g: 83.3 mmol), obtained in the first step. BHT (1.23 g: 5.6 mmol) and DMF (200 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into 600 mL of heptane and washed 3 times with pure water (300 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Add-7 (13.88 g: yield) by distilling off the solvent and vacuum drying. 70%, yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 7.62-7.64 (4H), 7.41-7.49 (6H), 6.31-6.35 (1H), 6.16- 6.21 (1H), 5.96-5.98 (1H), 4.26-4.27 (2H), 3.86-3.88 (2H), 0.99 (9H)
<合成例8 Add-8(3-((tert-butyldiphenylsilyl)oxy)propyl acrylate)の合成>
Figure JPOXMLDOC01-appb-C000069
<Synthesis Example 8 Addd-8 (Synthesis of 3-((tert-butyldiphenylsylyl) oxy) propyl acrylicate)>
Figure JPOXMLDOC01-appb-C000069
(第1工程)
 撹拌子を備えた500mL4つ口フラスコに、3-Bromo-1-propanol(47.34g:340.6mmol)、Imidazole(23.19g:340.6mmol)、tert-Butyldiphenylchlorosilane(20.00g:85.2mmol)、及びCHCl(150mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(150mL)を加え、分液ロートを用いて純水(200mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(20.35g:収率63%、黄色液体)を得た。
(First step)
3-Bromo-1-propanol (47.34 g: 340.6 mmol), Imidazole (23.19 g: 340.6 mmol), tert-Budyldiphenyl chloroformirane (20.00 g: 85.2 mmol) in a 500 mL four-necked flask equipped with a stir bar. ) And CHCl 3 (150 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (150 mL) was added, and the reaction solution was washed 3 times with pure water (200 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (20.35 g: yield 63%, yellow) is obtained by distilling off the solvent and vacuum drying. Liquid) was obtained.
(第2工程)
 撹拌子を備えた500mL4つ口フラスコに第1工程で得られた(3-bromopropoxy)(tert-butyl)diphenylsilane(19.26g:51.0mmol)、Potassium acrylate(6.75g:61.2mmol)、BHT(1.12g:5.1mmol)、及びDMF(200mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、ヘプタン(600mL)に反応溶液を注ぎ、分液ロートを用いて純水(500mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-8(13.63g:収率73%、黄色液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:7.60-7.63(4H)、7.41-7.48(6H)、6.27-6.31(1H)、6.11-6.17(1H)、5.92-5.94(1H)、4.24-4.26(2H)、3.72-3.75(2H)、1.87-1.90(2H)、0.99(9H)
(Second step)
A 500 mL four-necked flask equipped with a stirrer, obtained in the first step (3-bromopoxy) (tert-butyl) diphenylsilane (19.26 g: 51.0 mmol), Potassium acrylicate (6.75 g: 61.2 mmol),. BHT (1.12 g: 5.1 mmol) and DMF (200 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into heptane (600 mL) and washed 3 times with pure water (500 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Add-8 (13.63 g: yield) by distilling off the solvent and vacuum drying. A rate of 73%, yellow liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 7.60-7.63 (4H), 7.41-7.48 (6H), 6.27-6.31 (1H), 6.11- 6.17 (1H), 5.92-5.94 (1H), 4.24-4.26 (2H), 3.72-3.75 (2H), 1.87-1.90 (2H) , 0.99 (9H)
<合成例9 Add-9(4-((tert-butyldiphenylsilyl)oxy)butyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000070
<Synthesis Example 9 Addd-9 (4-((tert-butyldiphenylsylly) oxy) butyl methyllate) synthesis>
Figure JPOXMLDOC01-appb-C000070
(第1工程)
 撹拌子を備えた500mL4つ口フラスコに、1,4-Butanediol(49.57g:550.0mmol)、Imidazole(14.86g:218.3mmol)、tert-Butyldiphenylchlorosilane(15.00g:54.6mmol)、及びCHCl(100mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(200mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(16.78g:収率93%、透明液体)を得た。
(First step)
In a 500 mL four-necked flask equipped with a stirrer, 1,4-Butanediol (49.57 g: 550.0 mmol), Imidazole (14.86 g: 218.3 mmol), tert-Butyldiphenylchloroform (15.00 g: 54.6 mmol), And CHCl 3 (100 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (200 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (16.78 g: yield 93%, transparent) is obtained by distilling off the solvent and vacuum drying. Liquid) was obtained.
(第2工程)
 撹拌子を備えた500mL4つ口フラスコに第1工程で得られた4-((tert-butyldiphenylsilyl)oxy)butan-1-ol(15.75g:47.9mmol)、Methacryloyl chloride(6.01g:57.5mmol)、Pyridine(5.70g:72.1mmol)、及びTHF(150mL)を秤量し、室温(20℃)にて24時間撹拌した。HPLCにて反応の終了を確認した後、ヘプタン(500mL)に反応溶液を注ぎ、分液ロートを用いて純水(500mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-9(8.92g:収率43%、透明液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in CDCl:7.65-7.67(4H)、7.36-7.44(6H)、6.07(1H)、5.53(1H)、4.13-4.16(2H)、3.68-3.70(2H)、1.93(3H)、1.75-1.79(2H)、1.63-1.67(2H)、1.05(9H)
(Second step)
4-((tert-butyldiphenylsyll) oxy) butan-1-ol (15.75 g: 47.9 mmol), Methacrylchloro chloride (6.01 g: 57) obtained in the first step in a 500 mL four-necked flask equipped with a stir bar. .5 mmol), Pyridine (5.70 g: 72.1 mmol), and THF (150 mL) were weighed and stirred at room temperature (20 ° C.) for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into heptane (500 mL) and washed 3 times with pure water (500 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Add-9 (8.92 g: yield) by distilling off the solvent and vacuum drying. (Yield 43%, transparent liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in CDCl 3 : 7.65-7.67 (4H), 7.36-7.44 (6H), 6.07 (1H), 5.53 (1H), 4.13 -4.16 (2H), 3.68-3.70 (2H), 1.93 (3H), 1.75-1.79 (2H), 1.63-1.67 (2H), 1. 05 (9H)
<合成例10 Add-10(5-((tert-butyldiphenylsilyl)oxy)pentyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000071
<Synthesis Example 10 Addd-10 (5-((tert-butyldiphenylsyll) oxy) pentyl methyllate) synthesis>
Figure JPOXMLDOC01-appb-C000071
(第1工程)
 撹拌子を備えた500mL4つ口フラスコに、1,5-Pentanediol(50.00g:480.0mmol)、Imidazole(13.07g:192.0mmol)、tert-Butyldiphenylchlorosilane(13.19g:48.0mmol)、及びCHCl(90mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(200mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(15.00g:収率91%、透明液体)を得た。
(First step)
In a 500 mL four-necked flask equipped with a stirrer, 1,5-Pentanediol (50.00 g: 480.0 mmol), Imidazole (13.07 g: 192.0 mmol), tert-Butyldiphenylchloroform (13.19 g: 48.0 mmol), And CHCl 3 (90 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (200 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (15.00 g: yield 91%, transparent) is obtained by distilling off the solvent and vacuum drying. Liquid) was obtained.
(第2工程)
 撹拌子を備えた500mL4つ口フラスコに第1工程で得られた5-((tert-butyldiphenylsilyl)oxy)pentan-1-ol(15.00g:43.8mmol)、Methacryloyl chloride(5.49g:52.6mmol)、Pyridine(5.20g:65.7mmol)、及びTHF(150mL)を秤量し、室温(20℃)にて24時間撹拌した。HPLCにて反応の終了を確認した後、500mLのヘプタンに反応溶液を注ぎ、分液ロートを用いて純水(500mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-10(14.31g:収率80%、透明液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in CDCl:7.64-7.66(4H)、7.34-7.40(6H)、6.07(1H)、5.52(1H)、4.10-4.13(2H)、3.64-3.67(2H)、1.93(3H)、1.62-1.68(2H)、1.56-1.60(2H)、1.44-1.49(2H)、1.03(9H)
(Second step)
5-((tert-butyldiphenylsylly) oxy) pentan-1-ol (15.00 g: 43.8 mmol), Methacrylchloro chloride (5.49 g: 52) obtained in the first step in a 500 mL four-necked flask equipped with a stir bar. .6 mmol), Pyridine (5.20 g: 65.7 mmol), and THF (150 mL) were weighed and stirred at room temperature (20 ° C.) for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into 500 mL of heptane and washed 3 times with pure water (500 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Add-10 (14.31 g: yield) by distilling off the solvent and vacuum drying. (Yield 80%, transparent liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in CDCl 3 : 7.64-7.66 (4H), 6.34-7.40 (6H), 6.07 (1H), 5.52 (1H), 4.10 -4.13 (2H), 3.64-3.67 (2H), 1.93 (3H), 1.62-1.68 (2H), 1.56-1.60 (2H), 1. 44-1.49 (2H), 1.03 (9H)
<合成例11 Add-11(2,2,10,10-tetramethyl-3,3,9,9-tetraphenyl-4,8-dioxa-3,9-disilaundecan-6-yl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000072
<Synthesis Example 11 Addd-11 (2,2,10,10-tetramethyl-3,3,9,9-tetrapeneyl-4,8-dioxa-3,9-disilandecan-6-ylmethylate)>
Figure JPOXMLDOC01-appb-C000072
(第1工程)
 撹拌子を備えた500mL4つ口フラスコに、1,2,3-Propanetriol(4.60g:50.0mmol)、TEA(12.10g:119.6mmol)、DMAP(0.37g:3.0mmol)、tert-Butyldiphenylchlorosilane(30.20g:109.9mmol)、及びCHCl(120mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、ヘプタン(200mL)を加え、分液ロートを用いて純水(200mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=10/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(23.73g:収率83%、淡黄色液体)を得た。
(First step)
1,2,3-Propanetriol (4.60 g: 50.0 mmol), TEA (12.10 g: 119.6 mmol), DMAP (0.37 g: 3.0 mmol), in a 500 mL four-necked flask equipped with a stir bar. tert-Butyldiphenylchlorosirane (30.20 g: 109.9 mmol) and CHCl 3 (120 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, heptane (200 mL) was added, and the reaction solution was washed 3 times with pure water (200 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 10/1 (volume ratio)), and the target product (23.73 g: yield 83%, light) is obtained by distilling off the solvent and vacuum drying. Yellow liquid) was obtained.
(第2工程)
 撹拌子を備えた500mL4つ口フラスコに第1工程で得られた2,2,10,10-tetramethyl-3,3,9,9-tetraphenyl-4,8-dioxa-3,9-disilaundecan-6-ol(21.09g:37.1mmol)、Methacryloyl chloride(15.51g:148.4mmol)、Pyridine(14.66g:185.3mmol)、4-Dimethylaminopyridine(1.81g:14.8mmol)、及びTHF(200mL)を秤量し、室温(20℃)にて24時間撹拌した。HPLCにて反応の終了を確認した後、500mLのヘプタンに反応溶液を注ぎ、分液ロートを用いて純水(500mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-11(20.61g:収率88%、透明液体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in CDCl:7.62-7.65(8H)、7.38-7.42(4H)、7.31-7.36(8H)、6.11(1H)、5.56(1H)、5.15-5.19(1H)、3.89-3.90(4H)、1.93(3H)、1.00(18H)
(Second step)
2,2,10,10-tetramethyl-3,3,9,9-tetraphenyl-4,8-dioxa-3,9-disilandecan-6 obtained in the first step in a 500 mL four-necked flask equipped with a stir bar. -Ol (21.09 g: 37.1 mmol), Metacidlyl chloride (15.51 g: 148.4 mmol), Pyridine (14.66 g: 185.3 mmol), 4-Dimethylaminopyridine (1.81 g: 14.8 mmol), and THF. (200 mL) was weighed and stirred at room temperature (20 ° C.) for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into 500 mL of heptane and washed 3 times with pure water (500 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Add-11 (20.61 g: yield) by distilling off the solvent and vacuum drying. (Yield 88%, transparent liquid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in CDCl 3 : 7.62-7.65 (8H), 7.38-7.42 (4H), 7.31-7.36 (8H), 6.11 (1H) 5.56 (1H), 5.15-5.19 (1H), 3.89-3.90 (4H), 1.93 (3H), 1.00 (18H)
<合成例12 Add-C3(3-(trityloxy)propyl methacrylate)の合成>
Figure JPOXMLDOC01-appb-C000073
<Synthesis Example 12 Synthesis of Addd-C3 (3- (trityloxy) propanol methyllate)>
Figure JPOXMLDOC01-appb-C000073
(第1工程)
 撹拌子を備えた200mL4つ口フラスコに、3-Bromo-1-propanol(10.93g:78.6mmol)、TEA(7.96g:78.6mmol)、DMAP(0.96g:7.8mmol)、Trityl chloride(10.96g:39.3mmol)、及びCHCl(100mL)を秤量し、室温(20℃)にて12時間撹拌した。HPLCにて反応の終了を確認した後、この反応溶液を、ロータリーエバポレーターを用いて濃縮し、酢酸エチル(500mL)を加え、分液ロートを用いて純水(400mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=100/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物(8.06g:収率54%、白色固体)を得た。
(First step)
In a 200 mL four-necked flask equipped with a stirrer, 3-Bromo-1-propanol (10.93 g: 78.6 mmol), TEA (7.96 g: 78.6 mmol), DMAP (0.96 g: 7.8 mmol), Trityl chloride (10.96 g: 39.3 mmol) and CHCl 3 (100 mL) were weighed and stirred at room temperature (20 ° C.) for 12 hours. After confirming the completion of the reaction by HPLC, the reaction solution was concentrated using a rotary evaporator, ethyl acetate (500 mL) was added, and the reaction solution was washed 3 times with pure water (400 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 100/1 (volume ratio)), and the target product (8.06 g: yield 54%, white color) is obtained by distilling off the solvent and vacuum drying. Solid) was obtained.
(第2工程)
 撹拌子を備えた200mL4つ口フラスコに第1工程で得られた((3-bromopropoxy)methanetriyl)tribenzene(8.06g:21.1mmol)、Potassium methacrylate(3.14g:25.3mmol)、MEHQ(0.26g:2.1mmol)、及びDMF(80mL)を秤量し、80℃にて24時間撹拌した。HPLCにて反応の終了を確認した後、酢酸エチル(400mL)に反応溶液を注ぎ、分液ロートを用いて純水(500mL)で3回洗浄した。洗浄後、硫酸マグネシウムで脱水し、ロータリーエバポレーターを用いて溶媒留去を行うことで粗物を得た。精製はシリカゲルカラムクロマトグラフィー(展開溶媒:ヘプタン/酢酸エチル=50/1(容量比))にて行い、溶媒留去と真空乾燥を行うことにより目的物であるAdd-C3(5.91g:収率73%、白色固体)を得た。H-NMR測定により目的物であることを確認した。
 H-NMR(500MHz) in DMSO-d:7.31-7.38(12H)、7.24-7.27(3H)、5.90(1H)、5.62(1H)、4.22-4.24(2H)、3.05-3.08(2H)、1.89-1.91(2H)、1.80(3H)
(Second step)
A 200 mL four-necked flask equipped with a stirrer was obtained in the first step ((3-bromopropoxy) methaneriyl) tribenzen (8.06 g: 21.1 mmol), Potassium methacrylate (3.14 g: 25.3 mmol), MEHQ ( 0.26 g: 2.1 mmol) and DMF (80 mL) were weighed and stirred at 80 ° C. for 24 hours. After confirming the completion of the reaction by HPLC, the reaction solution was poured into ethyl acetate (400 mL) and washed 3 times with pure water (500 mL) using a separating funnel. After washing, the product was dehydrated with magnesium sulfate and distilled off with a rotary evaporator to obtain a crude product. Purification is performed by silica gel column chromatography (developing solvent: heptane / ethyl acetate = 50/1 (volume ratio)), and the target product is Addd-C3 (5.91 g: yield) by distilling off the solvent and vacuum drying. 73%, white solid) was obtained. 1 It was confirmed by 1 H-NMR measurement that it was the target product.
1 1 H-NMR (500 MHz) in DMSO-d 6 : 7.31-7.38 (12H), 7.24-7.27 (3H), 5.90 (1H), 5.62 (1H), 4 .22-4.24 (2H), 3.05-3.08 (2H), 1.89-1.91 (2H), 1.80 (3H)
<<ポリアミック酸・ポリイミドの合成>>
<合成例13>
 メカニカルスターラー及び窒素導入管を備え付けた100mL四つ口フラスコに、DA-1(1.08g:10.00mmol)及びDA-3(3.30g:10.00mmol)を量り取り、NMP(24.9g)を加え、窒素雰囲気下で撹拌し溶解させた後、氷浴にて10℃以下を保ちながらTC-2(2.50g:10.00mmol)を加え、窒素雰囲気下50℃で6時間反応させた。室温に戻した後、TC-1(1.84g:9.40mmol)及びNMP(10.0g)を加え、室温で18時間反応させることにより、粘度が約1120mPa・s、固形分濃度が20質量%のポリアミック酸溶液(PAA-1)を得た。このポリアミック酸の分子量は、数平均分子量:11200、重量平均分子量:31360であった。
 撹拌子と窒素導入管を備え付けた300mLのナスフラスコに、上記で得られたポリアミック酸溶液(PAA-1)(40.0g)を量り取り、NMP(74.3g)を加え室温でしばらく撹拌した後、無水酢酸(5.61g:54.98mmol)及びピリジン(2.90g、36.65mmol)を加え、窒素雰囲気下室温で30分撹拌した後、窒素雰囲気下50℃で3時間反応させた。反応終了後、10℃以下に冷やしたメタノール(500mL)中に撹拌しながら反応溶液をゆっくり注ぎ固体を析出させ、10分間撹拌した。この沈殿物を濾過により分取し、再びメタノール(200mL)で30分間スラリー洗浄を計2回行い、固体を80℃で真空乾燥させることにより目的とするポリイミド粉末(SPI-1)(7.04g、収率88%)を得た。このポリイミドのイミド化率は57%、分子量は数平均分子量:10400、重量平均分子量:29120であった。
<< Synthesis of polyamic acid / polyimide >>
<Synthesis Example 13>
DA-1 (1.08 g: 10.00 mmol) and DA-3 (3.30 g: 10.00 mmol) were weighed in a 100 mL four-necked flask equipped with a mechanical stirrer and a nitrogen introduction tube, and NMP (24.9 g) was weighed. ), Stir and dissolve in a nitrogen atmosphere, then add TC-2 (2.50 g: 10.00 mmol) in an ice bath while keeping the temperature below 10 ° C, and react at 50 ° C for 6 hours under a nitrogen atmosphere. rice field. After returning to room temperature, TC-1 (1.84 g: 9.40 mmol) and NMP (10.0 g) were added and reacted at room temperature for 18 hours to have a viscosity of about 1120 mPa · s and a solid content concentration of 20 mass. % Polyamic acid solution (PAA-1) was obtained. The molecular weight of this polyamic acid was a number average molecular weight: 11200 and a weight average molecular weight: 31360.
The polyamic acid solution (PAA-1) (40.0 g) obtained above was weighed in a 300 mL eggplant flask equipped with a stirrer and a nitrogen introduction tube, NMP (74.3 g) was added, and the mixture was stirred at room temperature for a while. After that, anhydrous acetic acid (5.61 g: 54.98 mmol) and pyridine (2.90 g, 36.65 mmol) were added, and the mixture was stirred at room temperature for 30 minutes under a nitrogen atmosphere and then reacted at 50 ° C. for 3 hours under a nitrogen atmosphere. After completion of the reaction, the reaction solution was slowly poured into methanol (500 mL) cooled to 10 ° C. or lower to precipitate a solid, and the mixture was stirred for 10 minutes. The precipitate was separated by filtration, and the slurry was washed again with methanol (200 mL) for 30 minutes twice in total, and the solid was vacuum dried at 80 ° C. to obtain the desired polyimide powder (SPI-1) (7.04 g). , 88% yield) was obtained. The imidization ratio of this polyimide was 57%, the molecular weight was a number average molecular weight: 10400, and a weight average molecular weight: 29120.
<合成例14>
 メカニカルスターラー及び窒素導入管を備え付けた100mL四つ口フラスコに、DA-2(3.42g:14.00mmol)及びDA-4(4.11g:6.00mmol)を量り取り、NMP(56.8g)を加え、窒素雰囲気下で撹拌し溶解させた後、氷浴にて10℃以下を保ちながらTC-3(4.26g:19.00mol)及びNMP(10.0g)を加え、室温で24時間反応させることにより、粘度が約680mPa・s、固形分濃度が15質量%のポリアミック酸溶液(PAA-2)を得た。このポリアミック酸の分子量は、数平均分子量:17200、重量平均分子量:48160であった。
<Synthesis Example 14>
DA-2 (3.42 g: 14.00 mmol) and DA-4 (4.11 g: 6.00 mmol) were weighed in a 100 mL four-necked flask equipped with a mechanical stirrer and a nitrogen introduction tube, and NMP (56.8 g) was weighed. ), Stir and dissolve in a nitrogen atmosphere, then add TC-3 (4.26 g: 19.00 mol) and NMP (10.0 g) in an ice bath while keeping the temperature below 10 ° C., and add 24 at room temperature. By reacting for a time, a polyamic acid solution (PAA-2) having a viscosity of about 680 mPa · s and a solid content concentration of 15% by mass was obtained. The molecular weight of this polyamic acid was a number average molecular weight: 17200 and a weight average molecular weight: 48160.
<合成例15>
 メカニカルスターラー及び窒素導入管を備え付けた100mL四つ口フラスコに、DA-2(3.42g:14.00mmol)及びDA-5(1.55g:6.00mmol)を量り取り、NMP(42.0g)を加え、窒素雰囲気下で撹拌し溶解させた後、氷浴にて10℃以下を保ちながらTC-3(4.21g:18.8mmol)及びNMP(10.0g)を加え、室温で24時間反応させることにより、粘度が約710mPa・s、固形分濃度が15質量%のポリアミック酸溶液(PAA-3)を得た。このポリアミック酸の分子量は、数平均分子量:15500、重量平均分子量:41800であった。
<Synthesis Example 15>
DA-2 (3.42 g: 14.00 mmol) and DA-5 (1.55 g: 6.00 mmol) were weighed in a 100 mL four-necked flask equipped with a mechanical stirrer and a nitrogen introduction tube, and NMP (42.0 g) was weighed. ), Stir and dissolve in a nitrogen atmosphere, then add TC-3 (4.21 g: 18.8 mmol) and NMP (10.0 g) in an ice bath while keeping the temperature below 10 ° C., and add 24 at room temperature. By reacting for a time, a polyamic acid solution (PAA-3) having a viscosity of about 710 mPa · s and a solid content concentration of 15% by mass was obtained. The molecular weight of this polyamic acid was a number average molecular weight: 15500 and a weight average molecular weight: 41800.
<<液晶配向剤の調製>>
<調製例1 ラジカル発生膜形成組成物AL-1の調製>
 撹拌子を備えた50mL三角フラスコに、上記合成例13で得られたポリイミド粉末(SPI-1)を2.0g量り取り、NMP(18.0g)を加え室温で12時間撹拌して溶解させた。固体がすべて溶けたのを確認した後、NMP(8.0g)、BCS(12.0g)、及びAD-1(0.20g)を加え、室温で1時間撹拌することで、本発明で使用する液晶配向剤兼ラジカル発生膜形成組成物(AL-1)を得た。
<< Preparation of liquid crystal alignment agent >>
<Preparation Example 1 Preparation of Radical Generation Film Forming Composition AL-1>
2.0 g of the polyimide powder (SPI-1) obtained in Synthesis Example 13 was weighed in a 50 mL Erlenmeyer flask equipped with a stirrer, NMP (18.0 g) was added, and the mixture was stirred at room temperature for 12 hours to dissolve. .. After confirming that all the solids have melted, NMP (8.0 g), BCS (12.0 g), and AD-1 (0.20 g) are added, and the mixture is stirred at room temperature for 1 hour to be used in the present invention. A liquid crystal alignment agent and a radical generating film forming composition (AL-1) was obtained.
<調製例2 ラジカル発生膜形成組成物AL-2の調製>
 撹拌子を備えた50mL三角フラスコに、上記合成例14で得られたポリアミック酸溶液(PAA-2)を15.0g量り取り、NMP(16.5g)及びBCS(13.5g)を加え、室温で1時間撹拌することで、本発明で使用する液晶配向剤兼ラジカル発生膜形成組成物(AL-2)を得た。
<Preparation Example 2 Preparation of Radical Generation Film Forming Composition AL-2>
In a 50 mL Erlenmeyer flask equipped with a stirrer, 15.0 g of the polyamic acid solution (PAA-2) obtained in Synthesis Example 14 is weighed, NMP (16.5 g) and BCS (13.5 g) are added, and room temperature is reached. The liquid crystal aligning agent and radical generating film-forming composition (AL-2) used in the present invention was obtained by stirring with the mixture for 1 hour.
<調製例3 液晶配向剤AL-3の調製>
 撹拌子を備えた50mL三角フラスコに、上記合成例15で得られたポリアミック酸溶液(PAA-3)を15.0g量り取り、NMP(16.5g)及びBCS(13.5g)を加え、室温で1時間撹拌することで、本発明で使用する液晶配向剤(AL-3)を得た。
<Preparation Example 3 Preparation of liquid crystal alignment agent AL-3>
In a 50 mL Erlenmeyer flask equipped with a stirrer, 15.0 g of the polyamic acid solution (PAA-3) obtained in Synthesis Example 15 was weighed, NMP (16.5 g) and BCS (13.5 g) were added, and room temperature was reached. The liquid crystal alignment agent (AL-3) used in the present invention was obtained by stirring with the mixture for 1 hour.
<液晶表示素子の作成>
 以下に、液晶配向性および電気光学応答を評価するための液晶セルの作製方法を示す。
 初めに電極付きの基板を準備した。基板は、30mm×35mmの大きさで、厚さが0.7mmの無アルカリガラス基板である。基板上には電極幅が3μm、電極と電極の間隔が6μm、基板の長辺に対して10°の角度となるような櫛歯型パターンを備えたITO(Indium-Tin-Oxide)電極が形成され、画素を形成している。各画素のサイズは、縦10mmで横約5mmである。以後IPS基板と呼ぶ。
 次に、上記の方法で得られたラジカル発生膜形成組成物AL-1、AL-2、及び液晶配向剤AL-3、並びに水平配向用の液晶配向剤であるSE-6414(日産化学社製)を孔径1.0μmのフィルターで濾過した後、準備された上記IPS基板と、裏面にITO膜が成膜されており、かつ高さ3.0μmの柱状のスペーサーを有するガラス基板(以後対向基板と呼ぶ)にスピンコート法にて塗布・成膜を行った。次いで、80℃のホットプレート上で80分乾燥後、230℃で20分焼成し、膜厚100nmの塗膜を得た。IPS基板側のポリイミド膜においては、櫛歯の方向に添う方向で配向処理を行い、対向基板側ポリイミド膜においては櫛歯電極と直交する方向に配向処理を行った。尚、配向処理においては、AL-1およびSE-6414においてはラビング法を用い、飯沼ゲージ社製ラビング装置、吉川化工社製ラビング布(YA-20R)、ラビングローラー(径10.0cm)、ステージ送り速度30mm/s、ローラー回転数700rpm、押し込み圧0.3mmにて行った。AL-2、AL-3においてはいずれもウシオ電機社製のUV露光装置を用い、消光比が約26:1の直線偏光UVを、254nmの波長を基準として照射量300mJ/cmになるように偏光UVを照射し、230℃にて20分加熱することで行い配向処理を行った。
 その後、上記2種類の基板を用いて、実施例の対象とする表示素子及び比較対象とする一部の表示素子(比較例2~4、6~8)に関してはIPS基板側にラジカル発生配向膜AL-1またはAL-2、対向基板側に液晶配向膜SE-6414またはAL-3を設けたもの同士の組み合わせにて作製したものを用い、比較対象とする一部の表示素子(比較例1及び比較例5)においては両方の基板にSE-6414またはAL-3を用いたものを使用した。それぞれの配向方向が平行になるように組み合わせ、液晶注入口を残して周囲をシールし、セルギャップが約3.0μmの空セルを作製した。この空セルに、上記合成例にて得られた(Add-1)~(Add-11)を2質量%添加した液晶混合物、および比較対象として無添加の液晶混合物または(Add-C1)~(Add-C3)を2質量%添加した液晶混合物を用い、それぞれ常温で真空注入した後、注入口を封止して、アンチパラレル配向の液晶セルとした。尚、使用した液晶混合物はLC-A(DIC社製、Δn:0.130、Δε:4.4)を用いた。Add-C1~Add-C2はそれぞれ東京化成工業から購入したものを使用した。
 得られた液晶セルは、IPSモード液晶表示素子を構成する。その後、得られた液晶セルを120℃で10分加熱処理を行い、電圧を印加していない状態で東芝ライテック社製UV-FL照射装置を用いてUV(UVランプ:FLR40SUV32/A-1)を30分間照射して液晶表示素子を得た。
<Creation of liquid crystal display element>
The method for producing a liquid crystal cell for evaluating the liquid crystal orientation and the electro-optic response is shown below.
First, a substrate with electrodes was prepared. The substrate is a non-alkali glass substrate having a size of 30 mm × 35 mm and a thickness of 0.7 mm. An ITO (Indium-Tin-Oxide) electrode having a comb-shaped pattern such that the electrode width is 3 μm, the distance between the electrodes is 6 μm, and the angle is 10 ° with respect to the long side of the substrate is formed on the substrate. And form a pixel. The size of each pixel is 10 mm in length and about 5 mm in width. Hereinafter referred to as an IPS board.
Next, the radical generation film forming composition AL-1 and AL-2 obtained by the above method, the liquid crystal alignment agent AL-3, and the liquid crystal alignment agent SE-6414 for horizontal alignment (manufactured by Nissan Chemical Industries, Ltd.). ) Is filtered through a filter having a pore size of 1.0 μm, and then the prepared IPS substrate and a glass substrate having an ITO film formed on the back surface and having a columnar spacer having a height of 3.0 μm (hereinafter referred to as a facing substrate). It was coated and filmed by the spin coating method. Then, it was dried on a hot plate at 80 ° C. for 80 minutes and then fired at 230 ° C. for 20 minutes to obtain a coating film having a film thickness of 100 nm. The polyimide film on the IPS substrate side was oriented along the direction of the comb teeth, and the polyimide film on the opposite substrate side was oriented in the direction orthogonal to the comb tooth electrode. In the alignment process, the rubbing method is used for AL-1 and SE-6414, and a rubbing device manufactured by Iinuma Gauge, a rubbing cloth (YA-20R) manufactured by Yoshikawa Kako, a rubbing roller (diameter 10.0 cm), and a stage. The feed rate was 30 mm / s, the roller rotation speed was 700 rpm, and the pushing pressure was 0.3 mm. In both AL-2 and AL-3, a UV exposure device manufactured by Ushio, Inc. is used so that the irradiation amount of linearly polarized UV having an extinction ratio of about 26: 1 is 300 mJ / cm 2 based on the wavelength of 254 nm. Was irradiated with polarized UV and heated at 230 ° C. for 20 minutes to perform alignment treatment.
After that, using the above two types of substrates, a radical generation alignment film is used on the IPS substrate side for the display element to be the target of the embodiment and some display elements to be compared (Comparative Examples 2 to 4, 6 to 8). A part of the display elements to be compared (Comparative Example 1) using a combination of AL-1 or AL-2 and those provided with the liquid crystal alignment film SE-6414 or AL-3 on the facing substrate side. In Comparative Example 5), SE-6414 or AL-3 was used for both substrates. The cells were combined so that their orientation directions were parallel to each other, and the periphery was sealed leaving the liquid crystal injection port, to prepare an empty cell having a cell gap of about 3.0 μm. A liquid crystal mixture obtained by adding 2% by mass of (Add-1) to (Add-11) obtained in the above synthesis example to this empty cell, and a liquid crystal mixture without addition or (Add-C1) to ((Add-C1) to ( A liquid crystal mixture containing 2% by mass of Addd-C3) was used, and each was vacuum-injected at room temperature, and then the injection port was sealed to obtain an anti-parallel oriented liquid crystal cell. As the liquid crystal mixture used, LC-A (manufactured by DIC Corporation, Δn: 0.130, Δε: 4.4) was used. As Add-C1 to Add-C2, those purchased from Tokyo Chemical Industry were used.
The obtained liquid crystal cell constitutes an IPS mode liquid crystal display element. After that, the obtained liquid crystal cell was heat-treated at 120 ° C. for 10 minutes, and UV (UV lamp: FLR40SUV32 / A-1) was applied using a UV-FL irradiation device manufactured by Toshiba Lighting & Technology Corporation in a state where no voltage was applied. Irradiation for 30 minutes was performed to obtain a liquid crystal display element.
<液晶配向性の評価>
 偏光顕微鏡を用い、偏光版をクロスニコルに設定し、液晶セルの輝度が最も小さくなる状態で固定し、そこから1°液晶セルを回転させ、液晶の配向状態の観察を行った。ムラやドメイン等の配向不良が観察されない場合あるいは非常に軽微な場合は「良好」とし、明確に観察させた場合は「不良」と定義して評価を行った。
 また、同偏光顕微鏡にフォトダイオードを取り付け、電流-電圧変換アンプを介してエレクトロメーターに接続し、クロスニコル下で輝度が最も小さくなる条件での電圧をモニターすることで黒輝度(V:a.u.)の測定を行った。
<Evaluation of liquid crystal orientation>
Using a polarizing microscope, the polarizing plate was set to cross Nicol, the liquid crystal cell was fixed in the state where the brightness was the smallest, and the liquid crystal cell was rotated by 1 ° from the state, and the alignment state of the liquid crystal was observed. When no uneven orientation such as unevenness or domain was observed or when it was very slight, it was defined as "good", and when it was clearly observed, it was defined as "poor" and evaluated.
In addition, a photodiode is attached to the same polarizing microscope, connected to an electrometer via a current-voltage conversion amplifier, and the voltage is monitored under the condition where the brightness is the smallest under the cross Nicol to monitor the black brightness (V: a. u.) Was measured.
<V-Tカーブの測定と駆動閾値電圧、最大輝度電圧、透過率評価>
 光軸が合うように白色LEDバックライトと輝度計をセットし、その間に、輝度が最も小さくなるように偏光板を取り付けた液晶セル(液晶表示素子)をセットし、1V間隔で8Vまで電圧を印加し、電圧における輝度を測定することでV-Tカーブの測定を行った。得られたV-Tカーブから輝度が最大になる電圧(Vmax)の値を見積もった。また、電圧無印加の液晶セルを介して、パラレルニコル時の透過輝度を100%とし、V-Tカーブでの最大透過輝度を比較することにより最大透過率(Tmax)として見積もった。
<Measurement of VT curve and drive threshold voltage, maximum luminance voltage, transmittance evaluation>
A white LED backlight and a luminance meter are set so that the optical axes are aligned, and a liquid crystal cell (liquid crystal display element) with a polarizing plate is set between them so that the brightness is the smallest, and the voltage is applied to 8V at 1V intervals. The VT curve was measured by applying and measuring the brightness at the voltage. From the obtained VT curve, the value of the voltage (Vmax) at which the brightness was maximized was estimated. Further, the maximum transmittance (Tmax) was estimated by comparing the maximum transmitted luminance in the VT curve with the transmitted luminance at the time of parallel Nicol set to 100% via the liquid crystal cell to which no voltage was applied.
<応答時間(Ton、Toff)の測定>
 上記V-Tカーブの測定で使用した装置を用い、輝度計をオシロスコープに接続し、最大輝度になる電圧を印加した際の応答速度(Ton)及び電圧を0Vに戻した際の応答速度(Toff)を測定した。
<Measurement of response time (Ton, Toff)>
Using the device used in the above VT curve measurement, connect the luminance meter to the oscilloscope, and the response speed (Ton) when the voltage that maximizes the brightness is applied and the response speed (Toff) when the voltage is returned to 0V. ) Was measured.
<電圧保持率(VHR)の測定>
 常温での電圧保持率の測定を行った。作成した液晶表示素子に、23℃の温度下で4Vの電圧を60μs間印加し、16.7ms後の電圧を測定することで、電圧がどのくらい保持できているかを電圧保持率として計算した。
 また、高温での電圧保持率の測定を行った。作成した液晶表示素子に、70℃の温度下で1Vの電圧を60μs間印加し、1667ms後の電圧を測定することで、電圧がどのくらい保持できているかを電圧保持率として測定した。
 なお、電圧保持率の測定には東陽テクニカ社製のVHR-1電圧保持率測定装置を使用した。
<Measurement of voltage retention rate (VHR)>
The voltage retention rate at room temperature was measured. By applying a voltage of 4 V for 60 μs to the prepared liquid crystal display element at a temperature of 23 ° C. and measuring the voltage after 16.7 ms, how much the voltage could be maintained was calculated as the voltage retention rate.
In addition, the voltage retention rate at high temperature was measured. A voltage of 1 V was applied to the prepared liquid crystal display element at a temperature of 70 ° C. for 60 μs, and the voltage after 1667 ms was measured to measure how much the voltage could be maintained as the voltage retention rate.
A VHR-1 voltage holding rate measuring device manufactured by Toyo Corporation was used for measuring the voltage holding rate.
<重合体の内容>
 合成例13~合成例15で合成した重合体の組成を表1に示す。
<Contents of polymer>
Table 1 shows the compositions of the polymers synthesized in Synthesis Examples 13 to 15.
Figure JPOXMLDOC01-appb-T000074
Figure JPOXMLDOC01-appb-T000074
<液晶配向剤またはラジカル発生膜形成組成物の内容>
 調製例1~調製例3で調製した液晶配向剤またはラジカル発生膜形成組成物の組成を表2に示す。
<Contents of liquid crystal alignment agent or radical generation film forming composition>
Table 2 shows the compositions of the liquid crystal alignment agent or the radical-generating film-forming composition prepared in Preparation Examples 1 to 3.
Figure JPOXMLDOC01-appb-T000075
Figure JPOXMLDOC01-appb-T000075
<液晶セル内容(ラビング)>
 ラビング法にて配向処理を行った液晶セルの実施例及び比較例の内容を表3に示す。
<LCD cell contents (rubbing)>
Table 3 shows the contents of Examples and Comparative Examples of the liquid crystal cells subjected to the alignment treatment by the rubbing method.
Figure JPOXMLDOC01-appb-T000076
Figure JPOXMLDOC01-appb-T000076
<特性評価結果>
 ラビング法にて配向処理を行った液晶セルの特性評価結果を表4-1及び表4-2に示す。
<Characteristic evaluation result>
Tables 4-1 and 4-2 show the characteristics evaluation results of the liquid crystal cells that have been oriented by the rubbing method.
Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-T000077
Figure JPOXMLDOC01-appb-T000078
Figure JPOXMLDOC01-appb-T000078
 本発明の添加剤(Add-1)~(Add-11)を用いた弱アンカリング液晶セルにおいて、配向状態及び黒輝度が良好であり、弱アンカリング側のプレチルト角の発生は確認されず0.1°以下であった。Vmaxも比較例1の強アンカリング液晶セルと比べて大きく低下し、透過率が比較例1~4と比べて大きく向上していることが分かる。一方で、比較例2~3において、Add-C1又はAdd-C2を添加剤として使用した液晶表示素子は、ラビングの筋が多く確認され、黒輝度も悪い。また、比較例2~4は、比較例1の強アンカリング液晶セルと比べるとVmaxは低下しているが透過率は低下する挙動が確認された。これは弱アンカリング化に伴うプレチルト角の発生によるものであることが分かり、比較例2では約72°、比較例3では83°と非常に大きなプレチルト角が発生していることがわかった。一方で応答速度に関しても合成例1~11の添加剤を用いた実施例1~11の液晶セルは比較例1の強アンカリング液晶セルより応答速度は少し遅くなっているが、それでも許容の範囲であって早い応答速度を実現しており、比較例2~4よりも大きく改善していることが分かる。上記実施例及び比較例において、LC-Aに代えて、液晶にメルク社製MLC-3019(Δn:0.104、Δε:9.9)を用いた場合は、比較例2~4で使用したAdd-C1~Add-C3を用いた場合においても良好な弱アンカリングIPS特性を得ることができるが、LC-AのようにΔnが大きな液晶やΔεが小さい液晶に使用すると良好な弱アンカリングIPSの特性が得られなくなる。これは、例えばセルギャップを狭くして(例えば、3.5μm以下にして)液晶表示素子を作製する場合には、比較例2~4で使用したような添加剤では対応ができないことを意味する。本発明の添加剤ではこのような高いΔn及び小さなΔεの液晶を使用しても良好な弱アンカリングIPSの特性を得ることができ、セルギャップの狭小化による応答速度改善が可能になる。またVHRに関しても、特に高温下においては比較例2~4と比べても高く、本発明の添加剤を使用することで信頼性を改善することができることが分かった。 In the weak anchoring liquid crystal cell using the additives (Add-1) to (Add-11) of the present invention, the orientation state and the black brightness are good, and the occurrence of the pretilt angle on the weak anchoring side is not confirmed and is 0. It was less than 1 °. It can be seen that Vmax is also significantly reduced as compared with the strong anchoring liquid crystal cell of Comparative Example 1, and the transmittance is greatly improved as compared with Comparative Examples 1 to 4. On the other hand, in Comparative Examples 2 to 3, the liquid crystal display element using Addd-C1 or Addd-C2 as an additive has many rubbing streaks and poor black brightness. Further, in Comparative Examples 2 to 4, it was confirmed that the Vmax was lower than that of the strong anchoring liquid crystal cell of Comparative Example 1, but the transmittance was lower. It was found that this was due to the generation of the pre-tilt angle due to the weak anchoring, and it was found that a very large pre-tilt angle of about 72 ° was generated in Comparative Example 2 and 83 ° in Comparative Example 3. On the other hand, regarding the response speed, the liquid crystal cells of Examples 1 to 11 using the additives of Synthesis Examples 1 to 11 have a slightly slower response speed than the strong anchoring liquid crystal cells of Comparative Example 1, but they are still within the allowable range. It can be seen that the response speed is fast and the response speed is significantly improved as compared with Comparative Examples 2 to 4. In the above Examples and Comparative Examples, when MLC-3019 (Δn: 0.104, Δε: 9.9) manufactured by Merck Group was used for the liquid crystal instead of LC-A, it was used in Comparative Examples 2 to 4. Good weak anchoring IPS characteristics can be obtained even when Add-C1 to Add-C3 are used, but good weak anchoring is obtained when used for a liquid crystal display having a large Δn or a liquid crystal display having a small Δε such as LC-A. The characteristics of IPS cannot be obtained. This means that, for example, when a liquid crystal display element is manufactured by narrowing the cell gap (for example, making it 3.5 μm or less), the additives used in Comparative Examples 2 to 4 cannot be used. .. With the additive of the present invention, good weak anchoring IPS characteristics can be obtained even when such a liquid crystal display having a high Δn and a small Δε can be used, and the response speed can be improved by narrowing the cell gap. Further, the VHR was also higher than that of Comparative Examples 2 to 4 especially at high temperature, and it was found that the reliability can be improved by using the additive of the present invention.
<液晶セル内容(光配向)>
 光配向法にて配向処理を行った液晶セルの実施例及び比較例の内容を表5に示す。
<LCD cell contents (optical orientation)>
Table 5 shows the contents of Examples and Comparative Examples of the liquid crystal cells subjected to the alignment treatment by the optical alignment method.
Figure JPOXMLDOC01-appb-T000079
Figure JPOXMLDOC01-appb-T000079
<特性評価結果>
 光配向法にて配向処理を行った液晶セルの特性評価結果を表6に示す。
<Characteristic evaluation result>
Table 6 shows the characteristics evaluation results of the liquid crystal cells that have been oriented by the optical alignment method.
Figure JPOXMLDOC01-appb-T000080
Figure JPOXMLDOC01-appb-T000080
 光配向法を用いて作製した弱アンカリングIPSにおいても、本発明の添加剤(Add-1)~(Add-11)を用いた場合には、ラビング法を用いて作成した弱アンカリングIPSと同様の良好な特性が得られることを確認した。一方、比較例2~4で使用した(Add-C1)、(Add-C2)、又は(Add-C3)を用いると比較例6~8のようにドメインが発生し駆動出来ない状態になった。光配向の場合、ラビング法とは異なりプレチルト角の異方性が発現しないため、何等かの影響で比較的大きなプレチルト角が発生した場合、プレチルト角の方向が規定されずドメインとなってしまい、駆動しようとするとドメインの領域が電界によって拡大してしまうためにか駆動が出来なくなったと推測される。本発明の添加剤を用いると、光配向を用いてもドメインは発生せず、良好な弱アンカリングIPS特性を得ることができるため、非常に有用であることが分かった。VHRに関してもラビング同様に高温下でVHRが良好であることが分かり、本重合性化合物を弱アンカリングIPSの添加剤として使用すると信頼性向上に効果があることが判明した。 Even in the weak anchoring IPS prepared by the photoalignment method, when the additives (Add-1) to (Add-11) of the present invention are used, the weak anchoring IPS prepared by the rubbing method is used. It was confirmed that similar good characteristics could be obtained. On the other hand, when (Add-C1), (Add-C2), or (Add-C3) used in Comparative Examples 2 to 4 is used, a domain is generated as in Comparative Examples 6 to 8, and the drive cannot be performed. .. In the case of photo-orientation, unlike the rubbing method, the anisotropy of the pre-tilt angle does not appear, so if a relatively large pre-tilt angle occurs due to some influence, the direction of the pre-tilt angle is not specified and it becomes a domain. It is presumed that the domain cannot be driven because the domain area is expanded by the electric field when it is tried to be driven. It has been found that the additive of the present invention is very useful because no domain is generated even when photo-orientation is used and good weak anchoring IPS characteristics can be obtained. As for VHR, it was found that VHR was good at high temperature as well as rubbing, and it was found that the use of this polymerizable compound as an additive for weak anchoring IPS was effective in improving reliability.
 本発明によれば、高Δn、低Δεの液晶を使用してもプレチルト角やドメインが発生せず、高いバックライト透過率、早い応答速度を実現できる横電界液晶表示素子を提供することができ、また良好な信頼性の液晶表示素子を得ることができる。よって本発明の方法で得られる液晶表示素子は、横電界駆動方式の液晶表示素子として有用である。 According to the present invention, it is possible to provide a lateral electric field liquid crystal display element capable of realizing high backlight transmittance and fast response speed without generating a pretilt angle or a domain even when a liquid crystal having a high Δn and a low Δε is used. In addition, a liquid crystal display element with good reliability can be obtained. Therefore, the liquid crystal display element obtained by the method of the present invention is useful as a horizontal electric field drive type liquid crystal display element.
 1  横電界液晶表示素子
 2  櫛歯電極基板
 2a 基材
 2b 線状電極
 2c 液晶配向膜
 2d 基材
 2e 面電極
 2f 絶縁膜
 2g 線状電極
 2h 液晶配向膜
 3  液晶
 4  対向基板
 4a 液晶配向膜
 4b 基材
 L  電気力線

 
1 Transverse electric field liquid crystal display element 2 Comb tooth electrode substrate 2a Base material 2b Linear electrode 2c Liquid crystal alignment film 2d Base material 2e Surface electrode 2f Insulation film 2g Linear electrode 2h Liquid crystal alignment film 3 Liquid crystal 4 Opposing substrate 4a Liquid crystal alignment film 4b base Material L Electric power wire

Claims (23)

  1.  液晶及び下記式(A)で表されるラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜に接触させた状態で、前記ラジカル重合性化合物を重合反応させるステップを含む、液晶表示素子の製造方法。
    Figure JPOXMLDOC01-appb-C000001
    (式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または下記式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
    Figure JPOXMLDOC01-appb-C000002
    (式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
    A liquid crystal display element comprising a step of polymerizing the radically polymerizable compound in a state where the liquid crystal and the liquid crystal composition containing the radically polymerizable compound represented by the following formula (A) are in contact with the radical generating film. Production method.
    Figure JPOXMLDOC01-appb-C000001
    (In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or the following formula (B), but at least one of the three Xs represents the formula (B).)
    Figure JPOXMLDOC01-appb-C000002
    (In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
  2.  前記式(B)中、前記置換基を有していてもよい芳香族炭化水素基がフェニル基である請求項1に記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to claim 1, wherein in the formula (B), the aromatic hydrocarbon group which may have the substituent is a phenyl group.
  3.  前記式(A)中のMが以下の構造から選ばれる、請求項1または2に記載の液晶表示素子の製造方法。
    Figure JPOXMLDOC01-appb-C000003
    (式中、*は結合部位を示す。Rは炭素数2~8の直鎖アルキル基を表し、Eは単結合、-O-、-NR-、-S-、エステル結合及びアミド結合から選ばれる結合基を表す。Rは水素原子、または炭素数1~4のアルキル基を示す。Rは水素原子、または炭素数1~6のアルキル基を表す。)
    The method for manufacturing a liquid crystal display element according to claim 1 or 2, wherein M in the formula (A) is selected from the following structures.
    Figure JPOXMLDOC01-appb-C000003
    (In the formula, * indicates a binding site. R b represents a linear alkyl group having 2 to 8 carbon atoms, and E represents a single bond, -O-, -NR c- , -S-, an ester bond and an amide bond. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.)
  4.  前記ラジカル発生膜が一軸配向処理されたラジカル発生膜である、請求項1~3のいずれかに記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to any one of claims 1 to 3, wherein the radical generation film is a radical generation film subjected to uniaxial orientation processing.
  5.  前記重合反応させるステップが無電界条件下で行われる、請求項1~4のいずれかに記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to any one of claims 1 to 4, wherein the step of performing the polymerization reaction is performed under no electric field conditions.
  6.  前記ラジカル発生膜が、ラジカル重合を誘発する有機基が固定化されて成る膜である、請求項1~5のいずれかに記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to any one of claims 1 to 5, wherein the radical generating film is a film formed by immobilizing an organic group that induces radical polymerization.
  7.  前記ラジカル発生膜が、ラジカルを発生する有機基を有する化合物と重合体とを含有する組成物を塗布、および硬化して膜を形成することにより、前記ラジカルを発生する有機基を前記膜中に固定化させて得られる、請求項1~5のいずれかに記載の液晶表示素子の製造方法。 The radical-generating film is coated with a composition containing a compound having an organic group that generates radicals and a polymer, and cured to form a film, whereby the organic group that generates radicals is formed in the film. The method for manufacturing a liquid crystal display element according to any one of claims 1 to 5, which is obtained by immobilization.
  8.  前記ラジカル発生膜が、ラジカル重合を誘発する有機基を含有する重合体から成る、請求項1~5のいずれかに記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to any one of claims 1 to 5, wherein the radical generating film is made of a polymer containing an organic group that induces radical polymerization.
  9.  前記ラジカル重合を誘発する有機基を含有する重合体が、ラジカル重合を誘発する有機基を含有するジアミンを含むジアミン成分を用いて得られるポリイミド前駆体、ポリイミド、ポリウレアおよびポリアミドから選ばれる少なくとも一種の重合体である、請求項8に記載の液晶表示素子の製造方法。 The polymer containing an organic group that induces radical polymerization is at least one selected from a polyimide precursor, a polyimide, a polyurea, and a polyamide obtained by using a diamine component containing a diamine containing an organic group that induces radical polymerization. The method for manufacturing a liquid crystal display element according to claim 8, which is a polymer.
  10.  前記ラジカル重合を誘発する有機基が下記式[X-1]~[X-18]、[W]、[Y]、または[Z]で表される有機基である、請求項9に記載の液晶表示素子の製造方法。
    Figure JPOXMLDOC01-appb-C000004
    (式[X-1]~[X-18]中、*は結合部位を示し、S、およびSはそれぞれ独立して-O-、-NR-、または-S-を表し、Rは水素原子、または炭素数1~10のアルキル基を表す(前記炭素数1~10のアルキル基のうち、炭素数2~10のアルキル基の-CH-基の一部は酸素原子に置き換わっていてもよい。ただし、SRまたはNRにおいて、前記アルキル基の-CH-基の一部が酸素原子に置き換わっている場合、前記酸素原子は、SまたはNには、直接結合していない。)。R、およびRはそれぞれ独立して水素原子、ハロゲン原子、または炭素数1~4のアルキル基を表す。)
    Figure JPOXMLDOC01-appb-C000005
    (式[W]、[Y]、および[Z]中、*は結合部位を示し、Arは有機基及び/又はハロゲン原子を置換基として有しても良いフェニレン、ナフチレン、及びビフェニリレンからなる群より選ばれる芳香族炭化水素基を示し、R及びR10は、それぞれ独立に、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表し、RとR10がアルキル基の場合、末端で互いに結合し環構造を形成していても良い。Qは下記のいずれかの構造を表す。
    Figure JPOXMLDOC01-appb-C000006
    (式中、R11は-CH-、-NR-、-O-、又は-S-を表し、Rはそれぞれ独立して水素原子又は炭素数1~4のアルキル基を表し、*は結合部位を示す。)Sは単結合、-O-、-NR-(Rは水素原子または炭素数1~14のアルキル基を表す。)、または-S-を表す。R12は水素原子、ハロゲン原子、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表す。)
    The ninth aspect of the present invention, wherein the organic group that induces radical polymerization is an organic group represented by the following formulas [X-1] to [X-18], [W], [Y], or [Z]. A method for manufacturing a liquid crystal display element.
    Figure JPOXMLDOC01-appb-C000004
    (In formulas [X-1] to [X-18], * indicates a binding site, S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is. Represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (among the alkyl groups having 1 to 10 carbon atoms, a part of the −CH2- group of the alkyl group having 2 to 10 carbon atoms is replaced with an oxygen atom. However, in S2R or NR, when a part of the −CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.). R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)
    Figure JPOXMLDOC01-appb-C000005
    (In the formulas [W], [Y], and [Z], * indicates a bond site, and Ar is a group consisting of phenylene, naphthylene, and biphenylylene which may have an organic group and / or a halogen atom as a substituent. R 9 and R 10 each independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and R 9 and R 10 are alkyl groups. In the case of, they may be bonded to each other at the ends to form a ring structure. Q represents any of the following structures.
    Figure JPOXMLDOC01-appb-C000006
    (In the formula, R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is indicated.) S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-. R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )
  11.  前記ラジカル重合を誘発する有機基を含有するジアミンが下記式(6)、下記式(7)、または下記式(7’)で表される構造を有するジアミンである、請求項9または10に記載の液晶表示素子の製造方法。
    Figure JPOXMLDOC01-appb-C000007
    (式(6)中、Rは単結合、-CH-、-O-、-COO-、-OCO-、-NHCO-、-CONH-、-NH-、-CHO-、-N(CH)-、-CON(CH)-、又は-N(CH)CO-を表し、
     Rは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表し、当該アルキレン基の任意の-CH-又は-CF-の1以上は、それぞれ独立に-CH=CH-、二価の炭素環、および二価の複素環から選ばれる基で置き換えられていてもよく、さらに、次に挙げるいずれかの基、すなわち、-O-、-COO-、-OCO-、-NHCO-、-CONH-、又は-NH-が互いに隣り合わないことを条件に、これらの基で置き換えられていてもよい;
     Rは、下記式[X-1]~[X-18]から選択される式で表されるラジカル重合反応性基を表す。
    Figure JPOXMLDOC01-appb-C000008
    (式[X-1]~[X-18]中、*は結合部位を示し、S、およびSはそれぞれ独立して-O-、-NR-、または-S-を表し、Rは水素原子、または炭素数1~10のアルキル基を表す(前記炭素数1~10のアルキル基のうち、炭素数2~10のアルキル基の-CH-基の一部は酸素原子に置き換わっていてもよい。ただし、SRまたはNRにおいて、前記アルキル基の-CH-基の一部が酸素原子に置き換わっている場合、前記酸素原子は、SまたはNには、直接結合していない。)。R、およびRはそれぞれ独立して水素原子、ハロゲン原子、または炭素数1~4のアルキル基を表す。))
    Figure JPOXMLDOC01-appb-C000009
    Figure JPOXMLDOC01-appb-C000010
    (式(7)及び(7’)中、T及びTは、それぞれ独立に、単結合、-O-、-S-、-COO-、-OCO-、-NHCO-、-CONH-、-NH-、-CHO-、-N(CH)-、-CON(CH)-、又は-N(CH)CO-であり、
     Sは単結合、又は非置換もしくはフッ素原子によって置換されている炭素数1~20のアルキレン基を表し、当該アルキレン基の任意の-CH-又は-CF-の1以上は、それぞれ独立に-CH=CH-、二価の炭素環、および二価の複素環から選ばれる基で置き換えられていてもよく、さらに、次に挙げるいずれかの基、すなわち、-O-、-COO-、-OCO-、-NHCO-、-CONH-、又は-NH-が互いに隣り合わないことを条件に、これらの基で置き換えられていてもよく、
     Eは、単結合、-O-、-C(CH-、-NH-、-CO-、-NHCO-、-COO-、-(CH-、-SO-、-O-(CH-O-、-O-C(CH-、-CO-(CH-、-NH-(CH-、-SO-(CH-、-CONH-(CH-、-CONH-(CH-NHCO-、または-COO-(CH-OCO-であり、mは1~8の整数であり、
     Jは下記式[W]、[Y]及び[Z]から選ばれる式で表される有機基である。
    Figure JPOXMLDOC01-appb-C000011
    (式[W]、[Y]、および[Z]中、*はTとの結合箇所を表し、Arは有機基及び/又はハロゲン原子を置換基として有しても良いフェニレン、ナフチレン、及びビフェニリレンからなる群より選ばれる芳香族炭化水素基を示し、R及びR10は、それぞれ独立に、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表し、Qは下記のいずれかの構造を表す。
    Figure JPOXMLDOC01-appb-C000012
    (式中、R11は-CH-、-NR-、-O-、又は-S-を表し、Rはそれぞれ独立して水素原子又は炭素数1~4のアルキル基を表し、*は結合部位を示す。)Sは単結合、-O-、-NR-(Rは水素原子または炭素数1~14のアルキル基を表す。)、または-S-を表す。R12は水素原子、ハロゲン原子、炭素数1~10のアルキル基又は炭素数1~10のアルコキシ基を表す。))式(7’)中、qはそれぞれ独立に0又は1であり、少なくとも1つのqは1であり、pは1~2の整数を表す。)
    The diamine according to claim 9 or 10, wherein the diamine containing an organic group that induces radical polymerization is a diamine having a structure represented by the following formula (6), the following formula (7), or the following formula (7'). Manufacturing method of liquid crystal display element.
    Figure JPOXMLDOC01-appb-C000007
    (In formula (6), R 6 is a single bond, -CH 2- , -O-, -COO-, -OCO-, -NHCO-, -CONH-, -NH-, -CH 2 O-, -N. Represents (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
    R 7 represents an alkylene group having 1 to 20 carbon atoms which is single-bonded or substituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independent of each other. May be replaced with a group selected from -CH = CH-, a divalent carbocycle, and a divalent heterocycle, and any of the following groups, i.e., -O-, -COO-. , -OCO-, -NHCO-, -CONH-, or -NH- may be replaced by these groups provided they are not adjacent to each other;
    R 8 represents a radical polymerization reactive group represented by a formula selected from the following formulas [X-1] to [X-18].
    Figure JPOXMLDOC01-appb-C000008
    (In formulas [X-1] to [X-18], * indicates a binding site, S 1 and S 2 independently represent -O-, -NR-, or -S-, respectively, and R is. Represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms (among the alkyl groups having 1 to 10 carbon atoms, a part of the −CH2- group of the alkyl group having 2 to 10 carbon atoms is replaced with an oxygen atom. However, in S2R or NR, when a part of the −CH2 - group of the alkyl group is replaced with an oxygen atom, the oxygen atom is directly bonded to S2 or N. No.). R 1 and R 2 independently represent a hydrogen atom, a halogen atom, or an alkyl group having 1 to 4 carbon atoms.)))
    Figure JPOXMLDOC01-appb-C000009
    Figure JPOXMLDOC01-appb-C000010
    (In equations (7) and (7'), T 1 and T 2 are independently single-bonded, -O-, -S-, -COO-, -OCO-, -NHCO-, -CONH-, respectively. -NH-, -CH 2 O-, -N (CH 3 )-, -CON (CH 3 )-, or -N (CH 3 ) CO-.
    S represents an alkylene group having 1 to 20 carbon atoms which is single-bonded, or unsubstituted or substituted with a fluorine atom, and one or more of any -CH 2- or -CF 2- of the alkylene group is independently. It may be replaced with a group selected from -CH = CH-, a divalent carbocycle, and a divalent heterocyclic ring, and further, any of the following groups, that is, -O-, -COO-,. -OCO-, -NHCO-, -CONH-, or -NH- may be replaced by these groups provided that they are not adjacent to each other.
    E is a single bond, -O-, -C (CH 3 ) 2- , -NH-, -CO-, -NHCO-, -COO-,-(CH 2 ) m- , -SO 2- , -O. -(CH 2 ) m -O-, -OC (CH 3 ) 2- , -CO- (CH 2 ) m- , -NH- (CH 2 ) m- , -SO 2- (CH 2 ) m -, -CONH- (CH 2 ) m- , -CONH- (CH 2 ) m -NHCO-, or -COO- (CH 2 ) m -OCO-, where m is an integer from 1 to 8.
    J is an organic group represented by a formula selected from the following formulas [W], [Y] and [Z].
    Figure JPOXMLDOC01-appb-C000011
    (In the formulas [W], [Y], and [Z], * represents a bond with T 2 , Ar represents an organic group and / or a halogen atom as a substituent, phenylene, naphthylene, and Indicates an aromatic hydrocarbon group selected from the group consisting of biphenylylene, R 9 and R 10 independently represent an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms, and Q is described below. Represents either structure.
    Figure JPOXMLDOC01-appb-C000012
    (In the formula, R 11 represents -CH 2- , -NR-, -O-, or -S-, R independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond. The site is indicated.) S 3 represents a single bond, -O-, -NR- (R represents a hydrogen atom or an alkyl group having 1 to 14 carbon atoms), or -S-. R 12 represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms. )) In equation (7'), q is independently 0 or 1, at least one q is 1, and p represents an integer of 1 to 2. )
  12.  前記ラジカル発生膜を有する第一基板と、ラジカル発生膜を有していてもよい第二基板とを用意するステップ、
     前記第一基板における前記ラジカル発生膜が前記第二基板に対向するように、前記第一基板および前記第二基板を対向配置するステップ、
     前記第一基板と前記第二基板との間に、前記液晶組成物を充填するステップ、および
     前記重合反応させるステップ、
    を含む、請求項1~11のいずれかに記載の液晶表示素子の製造方法。
    The step of preparing the first substrate having the radical generation film and the second substrate having the radical generation film may be prepared.
    A step of arranging the first substrate and the second substrate facing each other so that the radical generation film on the first substrate faces the second substrate.
    A step of filling the liquid crystal composition between the first substrate and the second substrate, and a step of causing the polymerization reaction.
    The method for manufacturing a liquid crystal display element according to any one of claims 1 to 11.
  13.  前記第二基板がラジカル発生膜を有しない第二基板である、請求項12に記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to claim 12, wherein the second substrate is a second substrate having no radical generation film.
  14.  前記第二基板が、一軸配向性を有する液晶配向膜がコーティングされた基板である、請求項12に記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to claim 12, wherein the second substrate is a substrate coated with a liquid crystal alignment film having uniaxial orientation.
  15.  前記一軸配向性を有する液晶配向膜が水平配向用の液晶配向膜である、請求項14に記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to claim 14, wherein the liquid crystal alignment film having uniaxial orientation is a liquid crystal alignment film for horizontal alignment.
  16.  前記第一基板および前記第二基板のいずれか一方が櫛歯電極を有する基板である、請求項12~15のいずれかに記載の液晶表示素子の製造方法。 The method for manufacturing a liquid crystal display element according to any one of claims 12 to 15, wherein either the first substrate or the second substrate is a substrate having a comb tooth electrode.
  17.  液晶及び下記式(A)で表されるラジカル重合性化合物を含有することを特徴とする液晶組成物。
    Figure JPOXMLDOC01-appb-C000013
    (式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または下記式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
    Figure JPOXMLDOC01-appb-C000014
    (式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
    A liquid crystal composition comprising a liquid crystal display and a radically polymerizable compound represented by the following formula (A).
    Figure JPOXMLDOC01-appb-C000013
    (In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or the following formula (B), but at least one of the three Xs represents the formula (B).)
    Figure JPOXMLDOC01-appb-C000014
    (In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
  18.  前記式(B)中の前記置換基を有していてもよい芳香族炭化水素基がフェニル基である請求項17に記載の液晶組成物。 The liquid crystal composition according to claim 17, wherein the aromatic hydrocarbon group which may have the substituent in the formula (B) is a phenyl group.
  19.  前記式(A)中のMが以下の構造から選ばれる、請求項17または18に記載の液晶組成物。
    Figure JPOXMLDOC01-appb-C000015
    (式中、*は結合部位を示す。Rは炭素数2~8の直鎖アルキル基を表し、Eは単結合、-O-、-NR-、-S-、エステル結合及びアミド結合から選ばれる結合基を表す。Rは水素原子、または炭素数1~4のアルキル基を表す。Rは水素原子、または炭素数1~6のアルキル基を表す。)
    The liquid crystal composition according to claim 17 or 18, wherein M in the formula (A) is selected from the following structures.
    Figure JPOXMLDOC01-appb-C000015
    (In the formula, * indicates a binding site. R b represents a linear alkyl group having 2 to 8 carbon atoms, and E represents a single bond, -O-, -NR c- , -S-, an ester bond and an amide bond. R c represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. R d represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.)
  20.  第一基板、前記第一基板に対向して配置された第二基板、および前記第一基板と前記第二基板との間に充填された液晶を有し、
     前記液晶及び下記式(A)で表されるラジカル重合性化合物を含有する液晶組成物を、ラジカル発生膜を有する前記第一基板の前記ラジカル発生膜に接触させた状態で、前記ラジカル重合性化合物を重合反応させてなる、ことを特徴とする液晶表示素子。
    Figure JPOXMLDOC01-appb-C000016
    (式(A)中、Mはラジカル重合可能な重合性基を表し、Rは炭素数1~10の直鎖もしくは分岐構造を有する脂肪族炭化水素基を表し、3つのXはそれぞれ独立して水素原子または下記式(B)を表す。ただし、3つのXの少なくとも一つは式(B)を表す。)
    Figure JPOXMLDOC01-appb-C000017
    (式(B)中、Yは単結合、-O-、-S-、または-NR-を表し、Rは水素原子または炭素数1~4のアルキル基を表し、*は結合部位を示す。R、R、およびRは、それぞれ独立して、炭素数1~6のアルキル基または置換基を有していてもよい芳香族炭化水素基を表す。)
    It has a first substrate, a second substrate arranged facing the first substrate, and a liquid crystal display filled between the first substrate and the second substrate.
    The radically polymerizable compound in a state where the liquid crystal composition containing the liquid crystal and the radically polymerizable compound represented by the following formula (A) is in contact with the radically polymerized film of the first substrate having the radically generated film. A liquid crystal display element characterized by having a polymerization reaction.
    Figure JPOXMLDOC01-appb-C000016
    (In the formula (A), M represents a radically polymerizable polymerizable group, R 1 represents a linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, and the three Xs are independent of each other. Represents a hydrogen atom or the following formula (B), but at least one of the three Xs represents the formula (B).)
    Figure JPOXMLDOC01-appb-C000017
    (In the formula (B), Y represents a single bond, -O-, -S-, or -NR-, R represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and * represents a bond site. R 2 , R 3 and R 4 each independently represent an aromatic hydrocarbon group which may have an alkyl group or a substituent having 1 to 6 carbon atoms.)
  21.  前記第一基板および前記第二基板のいずれか一方が櫛歯電極を有する基板である、請求項20に記載の液晶表示素子。 The liquid crystal display element according to claim 20, wherein either the first substrate or the second substrate is a substrate having a comb tooth electrode.
  22.  低電圧駆動横電界液晶表示素子である、請求項20または21に記載の液晶表示素子。 The liquid crystal display element according to claim 20 or 21, which is a low voltage drive horizontal electric field liquid crystal display element.
  23.  下記式(F-1)~(F-6)のいずれかで表されるラジカル重合性化合物。
    Figure JPOXMLDOC01-appb-C000018

     
    A radically polymerizable compound represented by any of the following formulas (F-1) to (F-6).
    Figure JPOXMLDOC01-appb-C000018

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Publication number Priority date Publication date Assignee Title
WO2015033921A1 (en) * 2013-09-03 2015-03-12 日産化学工業株式会社 Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element
EP3543263A1 (en) * 2016-11-16 2019-09-25 Zhejiang University Polyolefin-based emulsifier and application thereof for preparing high internal phase emulsion and porous polymeric material
JP2019196480A (en) * 2018-05-07 2019-11-14 達興材料股▲ふん▼有限公司 Liquid crystal composition and liquid crystal display containing the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015033921A1 (en) * 2013-09-03 2015-03-12 日産化学工業株式会社 Liquid crystal aligning agent, liquid crystal alignment film, and liquid crystal display element
EP3543263A1 (en) * 2016-11-16 2019-09-25 Zhejiang University Polyolefin-based emulsifier and application thereof for preparing high internal phase emulsion and porous polymeric material
JP2019196480A (en) * 2018-05-07 2019-11-14 達興材料股▲ふん▼有限公司 Liquid crystal composition and liquid crystal display containing the same

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