WO2022068429A1

WO2022068429A1 - Display substrate and manufacturing method therefor, and display apparatus

Info

Publication number: WO2022068429A1
Application number: PCT/CN2021/112657
Authority: WO
Inventors: 金度岭; 王本莲; 黄炜赟; 龙跃; 程羽雕; 孙开鹏
Original assignee: 京东方科技集团股份有限公司; 成都京东方光电科技有限公司
Priority date: 2020-09-30
Filing date: 2021-08-16
Publication date: 2022-04-07
Also published as: US20230047280A1; CN114335374A

Abstract

Provided are a display substrate and a manufacturing method therefor, and a display apparatus. The display substrate comprises a display area, wherein the display area comprises a pixel area (10), a light-transmitting area (20), and an isolation area (30) located between the pixel area (10) and the light-transmitting area (20); the isolation area (30) is arranged at least partially around the light-transmitting area (20); the isolation area (30) comprises isolation components (31, 32) and retaining wall structures (33, 34), and groove structures (43, 48) located between the isolation components (31, 32) and the retaining wall structures (33, 34); the pixel area (10) comprises a light-emitting functional layer (44) and an organic encapsulation layer (47); the part of the light-emitting functional layer (44) extending to the isolation area (30) is broken on side faces of the isolation components (31, 32); the organic encapsulation layer (47) extends from the pixel area (10) to the isolation area (30); and the groove structures (43, 48) and the retaining wall structures (33, 34) are used for limiting the extension of the organic encapsulation layer (47) toward the light-transmitting area (20).

Description

A display substrate, its manufacturing method, and a display device

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to Chinese Patent Application No. 202011057090.X filed in China on Sep. 30, 2020, the entire contents of which are incorporated herein by reference.

technical field

The present disclosure relates to the field of display technology, and in particular, to a display substrate, a manufacturing method thereof, and a display device.

Background technique

In order to increase the screen ratio of the display product, in the related art, the camera is placed in the hole located in the display area of the display product, and at the same time, a blocking structure is set near the edge of the hole to prevent the display product from being encapsulated in a thin film. , the organic packaging material overflows and extends to the light-transmitting area, which affects the packaging performance of the display product. However, due to the current thin film encapsulation, the organic encapsulation layer is required to cover the boundary of the blocking structure away from the light-transmitting area, resulting in a very high risk of the organic encapsulation material overflowing the blocking structure and flowing to the light-transmitting area, which is easy to trust in display products. Sex has an impact.

SUMMARY OF THE INVENTION

The purpose of the present disclosure is to provide a display substrate, a manufacturing method thereof, and a display device.

In order to achieve the above object, the present disclosure provides the following technical solutions:

A first aspect of the present disclosure provides a display substrate including a display area including a pixel area, a light-transmitting area, and an isolation area between the pixel area and the light-transmitting area, the isolation area at least partially surrounding the light-transmitting area;

The isolation area includes an isolation part and a retaining wall structure, and a groove structure between the isolation part and the retaining wall structure;

The pixel region includes a light-emitting functional layer and an organic encapsulation layer; a portion of the light-emitting functional layer extending to the isolation region is disconnected at the side of the isolation member; the organic encapsulation layer extends from the pixel region to the isolation region The isolation area, the groove structure and the blocking wall structure are used to restrict the organic encapsulation layer from extending to the light-transmitting area.

Optionally, the isolation member includes at least two inner isolation members, the at least two inner isolation members are arranged at intervals along the direction from the pixel region to the light-transmitting region, and the at least two inner isolation members are located in the between the pixel area and the retaining wall structure;

The groove structure includes a first groove structure located between the at least two inner isolation members and the retaining wall structure, and the organic encapsulation layer is filled in the first groove structure.

Optionally, the isolation member includes at least two outer isolation members, the at least two outer isolation members are arranged at intervals along the direction from the pixel region to the light-transmitting region, and the at least two outer isolation members are located in the between the light-transmitting area and the retaining wall structure;

The groove structure includes a second groove structure located between the at least two outer isolation members and the retaining wall structure.

Optionally, the side surface of the inner isolation part included in the isolation part has a notch, and/or the side surface of the outer isolation part has a notch.

Optionally, the display substrate includes an interlayer insulating layer, and the interlayer insulating layer is located between the isolation member and the base of the display substrate; a groove is provided on the interlayer insulating layer, and the groove The orthographic projection of the groove on the base is located between the orthographic projections of two adjacent outer isolation parts on the base; and/or, when the isolation part includes at least two inner isolation parts, the The orthographic projection of the trench on the substrate is located between the orthographic projections of the two adjacent inner isolation members on the substrate.

Optionally, the isolation region is provided with a first gate insulating layer, a second gate insulating layer, and an interlayer insulating layer that are sequentially stacked along a direction away from the base of the display substrate; The depth of the groove structure is greater than or equal to the thickness of the interlayer insulating layer.

Optionally, the blocking wall structure includes a first blocking wall member and a second blocking wall member that are arranged in sequence along a direction from the pixel area to the light-transmitting area, and the first blocking wall member faces away from the display. The height of the surface of the base of the substrate is lower than the height of the surface of the second retaining wall member facing away from the base.

Optionally, the pixel area is provided with a flat layer, a pixel defining layer and a spacer layer that are sequentially stacked along a direction away from the substrate;

The first retaining wall component includes a first retaining wall graphic and a second retaining wall graphic that are sequentially stacked along a direction away from the substrate, and the first retaining wall graphic and the pixel defining layer are provided on the same layer and the same material, The second retaining wall pattern and the spacer layer are arranged in the same layer and the same material;

The second retaining wall component includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern that are sequentially stacked in a direction away from the base, and the third retaining wall pattern is the same as the flat layer. The fourth retaining wall pattern and the pixel defining layer are provided in the same layer and the same material, and the fifth retaining wall pattern and the spacer layer are provided in the same layer and the same material.

Optionally, the pixel area is provided with a flat layer, a pixel defining layer and a spacer layer that are sequentially stacked in a direction away from the base of the display substrate;

The retaining wall structure includes a second retaining wall component, and the second retaining wall component includes a third retaining wall figure, a fourth retaining wall figure and a fifth retaining wall figure that are sequentially stacked in a direction away from the base, so that the The third retaining wall graphics and the flat layer are arranged on the same layer and the same material, the fourth retaining wall graphics and the pixel defining layer are arranged on the same layer and the same material, and the fifth retaining wall graphics and the spacer layer Same layer and same material setting.

Optionally, the groove structure surrounds the light-transmitting area.

Optionally, in a direction perpendicular to the base of the display substrate, a ratio between the depth of the groove structure and the height of the isolation member is between 0.5 and 1.

Based on the technical solution of the above-mentioned display substrate, a second aspect of the present disclosure provides a display device including the above-mentioned display substrate.

Based on the above technical solution of the display substrate, a third aspect of the present disclosure provides a method for manufacturing a display substrate, the display substrate includes a display area, and the display area includes a pixel area, a light-transmitting area, and a an isolation region between the light-transmitting regions, the isolation region is at least partially arranged around the light-transmitting region; the manufacturing method includes:

Fabricating an isolation part and a retaining wall structure in the isolation area, and a groove structure between the isolation part and the retaining wall structure;

A light-emitting functional layer and an organic encapsulation layer are fabricated in the pixel region; the portion of the light-emitting functional layer extending to the isolation region is disconnected at the side of the isolation member; the organic encapsulation layer extends from the pixel region to the isolation region. The isolation area, the groove structure and the blocking wall structure are used to restrict the organic encapsulation layer from extending to the light-transmitting area.

Optionally, the pixel area is provided with a flat layer, a pixel defining layer and a spacer layer that are sequentially stacked in a direction away from the base of the display substrate; the retaining wall structure includes a second retaining wall component, the The second retaining wall component includes a third retaining wall graphic, a fourth retaining wall graphic and a fifth retaining wall graphic that are sequentially stacked along the direction away from the base; the step of making the second retaining wall component includes:

By one patterning process, the third retaining wall pattern and the flat layer are simultaneously formed;

By one patterning process, the fourth retaining wall pattern and the pixel defining layer are simultaneously formed;

Through one patterning process, the fifth retaining wall pattern and the spacer layer are simultaneously formed.

Description of drawings

The accompanying drawings described herein are used to provide further understanding of the present disclosure and constitute a part of the present disclosure. The exemplary embodiments of the present disclosure and their descriptions are used to explain the present disclosure and do not constitute an improper limitation of the present disclosure. In the attached image:

FIG. 1 is a schematic structural diagram of a display substrate provided by an embodiment of the present disclosure;

Fig. 2 is the first cross-sectional schematic diagram along the A1A2 direction in Fig. 1;

3 is a second schematic cross-sectional view along the A1A2 direction in FIG. 1;

4 is a third schematic cross-sectional view along the A1A2 direction in FIG. 1;

5 is a fourth schematic cross-sectional view along the A1A2 direction in FIG. 1;

6 is a fifth schematic cross-sectional view along the A1A2 direction in FIG. 1;

7 is a sixth schematic cross-sectional view along the A1A2 direction in FIG. 1;

8 is a seventh schematic cross-sectional view along the A1A2 direction in FIG. 1;

FIG. 9 is an eighth schematic cross-sectional view along the A1A2 direction in FIG. 1 .

Detailed ways

In order to further illustrate the display substrate, the manufacturing method thereof, and the display device provided by the embodiments of the present disclosure, the following detailed description is given with reference to the accompanying drawings.

Referring to FIG. 1 , FIG. 2 and FIG. 6 , an embodiment of the present disclosure provides a display substrate, including a display area, and the display area includes a pixel area 10 , a light-transmitting area 20 , and a display substrate located in the pixel area 10 and the display area. The isolation area 30 between the light-transmitting areas 20, the isolation area 30 is arranged at least partially around the light-transmitting area 20; the isolation area 30 includes isolation parts (such as the inner isolation part 31 and the outer isolation part 32) and the retaining wall structures (such as the first retaining wall member 33 and the second retaining wall member 34 ), and the groove structure between the isolation member and the retaining wall structure; the pixel region 10 includes a light-emitting functional layer 44 and an organic package layer 47; the portion of the light-emitting functional layer 44 extending to the isolation region 30 is disconnected at the side of the isolation member; the organic encapsulation layer 47 extends from the pixel region 10 to the isolation region 30, the The groove structure and the retaining wall structure are used to limit the extension of the organic encapsulation layer 47 to the light-transmitting area 20 .

Specifically, the display substrate includes a display area and a peripheral area surrounding the display area, the display area includes a pixel area 10 , a light-transmitting area 20 , and is located between the pixel area 10 and the light-transmitting area 20 The isolation area 30 is arranged around the light-transmitting area 20 , and the pixel area 10 is arranged around the isolation area 30 .

The specific position of the light-transmitting area 20 can be set according to actual needs. Exemplarily, the display substrate includes a rectangular display area, and the light-transmitting area 20 is located at the upper left corner or the upper right corner of the rectangular display area. Exemplarily, the shape of the light-transmitting area 20 includes a regular shape such as a circle or a rectangle.

The base 40 of the display substrate includes a flexible base, exemplarily, includes a flexible polyimide (PI) base. When the light-transmitting area 20 is formed, the base 40 of the light-transmitting area 20 and the base 40 located in the The film layer on the substrate 40 is removed together.

The light-emitting functional layer 44 is located on the side of the isolation member and the retaining wall structure facing away from the substrate 40. The light-emitting functional layer 44 at least includes an organic light-emitting material layer, and the organic light-emitting material layer includes a light-emitting material for emitting white light. An entire organic light-emitting material layer, or a pattern of organic light-emitting material layers for emitting colored light (such as red light, green light, blue light, etc.). Further, in addition to the organic light-emitting material layer, the light-emitting functional layer 44 may also include, for example, an electron transport layer (election transport layer, referred to as ETL), an electron injection layer (election injection layer, abbreviated as EIL), and a hole transport layer. The common layer of the whole layer structure such as hole transporting layer (HTL) and hole injection layer (HIL). The light-emitting functional layer 44 can cover the pixel region 10 and the isolation region 30 , and can extend to the boundary of the light-transmitting region 20 .

The display substrate further includes an encapsulation structure, and the encapsulation structure generally includes a first inorganic encapsulation layer 45, an organic encapsulation layer 47 and a second inorganic encapsulation layer 46 that are sequentially stacked along a direction away from the substrate 40; The inorganic encapsulation layer 45 and the second inorganic encapsulation layer 46 can completely cover the entire area of the display substrate. Exemplarily, both the first inorganic encapsulation layer 45 and the second inorganic encapsulation layer 46 may be fabricated by chemical vapor deposition. The organic encapsulation layer 47 may be fabricated by an inkjet printing process. The groove structure and the retaining wall structure are used to limit the overflow of the organic encapsulation material used for making the organic encapsulation layer 47 during the process of making the organic encapsulation layer 47.

According to the specific structure of the above-mentioned display substrate, in the display substrate provided by the embodiment of the present disclosure, the portion of the light-emitting functional layer 44 extending to the isolation region 30 is disconnected at the side of the isolation member, preventing water and oxygen from flowing along The light-emitting functional layer 44 penetrates into the interior of the display substrate. Moreover, in the display substrate provided by the embodiment of the present disclosure, when the organic encapsulation layer 47 is formed, the retaining wall structure can block the encapsulation material used to form the organic encapsulation layer 47, and when the groove structure is located in the barrier When the structure is close to one side of the pixel area 10, the groove structure can accommodate part of the organic packaging material. When the groove structure is located on the side of the blocking structure close to the light-transmitting area 20, when the organic packaging material overflows the blocking structure, the groove The structure can accommodate part of the overflowing organic packaging material; therefore, in the display substrate provided by the embodiment of the present disclosure, by arranging the groove structure and the blocking structure in the isolation region 30, the groove structure and the blocking wall are formed. The structure can effectively limit the extension of the organic encapsulation layer 47 to the light-transmitting area 20, thereby limiting the boundary of the organic encapsulation layer 47 within the isolation area 30, which solves the problem that the organic encapsulation material is easy to be used during thin film encapsulation. The overflow blocking structure flows to the light-transmitting area 20, which affects the reliability of the display product.

As shown in FIG. 2 , FIG. 3 , FIG. 5 , FIG. 6 , FIG. 8 and FIG. 9 , in some embodiments, the isolation member includes at least two inner isolation members 31 , the at least two inner isolation members 31 are The pixel regions 10 are arranged at intervals in the direction of the light-transmitting region 20, and the at least two inner isolation members 31 are located between the pixel region 10 and the retaining wall structure; The first groove structure 43 between the at least two inner isolation parts 31 and the retaining wall structure, and the organic encapsulation layer 47 is filled in the first groove structure 43 .

Exemplarily, in the direction perpendicular to the base, the height of the inner isolation member is

In between, endpoint values can be included.

Exemplarily, each of the inner isolation members 31 surrounds the light-transmitting area 20 .

Exemplarily, the first groove structure 43 is located between the entirety of the at least two inner isolation members 31 and the retaining wall structure.

Exemplarily, the width of the first groove is smaller than the distance between the at least two inner isolation parts 31 as a whole and the retaining wall structure.

Exemplarily, the width of the first groove is between 10 μm and 20 μm, such as 12 μm, 14 μm, 16 μm, 18 μm, etc., including endpoint values.

Exemplarily, the depth of the first groove is

Such as

etc., may include endpoint values.

In the display substrate provided in the above-mentioned embodiment, by setting the groove structure to include the first groove structure 43 located between the at least two inner isolation members 31 and the retaining wall structure, so that the organic packaging can be guaranteed. The layer 47 can completely cover the at least two inner isolation parts 31, and under the condition that the inner isolation parts 31 are guaranteed to be effective, the storage space for the organic packaging material on the side of the retaining wall structure far from the light-transmitting area 20 is increased, Thus, the risk of the organic encapsulation material overflowing from the retaining wall structure is effectively reduced.

As shown in FIGS. 4 to 8 , in some embodiments, the isolation member includes at least two outer isolation members 32 , and the at least two outer isolation members 32 are directed to the light-transmitting region 20 along the pixel region 10 . The at least two outer isolation members 32 are located between the light-transmitting area 20 and the blocking wall structure; the groove structure includes the at least two outer isolation members 32 and the blocking wall structure. A second groove structure 48 between the wall structures.

Exemplarily, in the direction perpendicular to the base, the height of the outer isolation member is

In between, endpoint values can be included.

Exemplarily, each of the outer isolation members 32 surrounds the light-transmitting area 20 .

Exemplarily, the second groove structure 48 is located between the at least two outer isolation members 32 as a whole and the retaining wall structure.

Exemplarily, the width of the second groove is smaller than the distance between the at least two outer isolation members 32 as a whole and the retaining wall structure.

Exemplarily, the width of the second groove is between 10 μm and 20 μm, such as 12 μm, 14 μm, 16 μm, 18 μm, etc., which may include endpoint values.

Exemplarily, the depth of the second groove is

Such as

etc., may include endpoint values.

A cutting spacer 50 can be provided between the at least two outer isolation members 32 and the light-transmitting region 20 to avoid the heat generated by cutting during the cutting process to form the light-transmitting region 20 from the external isolation members 32 and the retaining wall structure. Influence.

Exemplarily, more than two outer isolation members 32 may be provided, such as more than 5, so that the outer isolation members 32 can be located in the cutting spacer 50, which can also alleviate the adverse effects caused by the thermal influence of cutting.

In the display substrate provided by the above embodiment, by setting the groove structure to include the second groove structure 48 between the at least two outer isolation members 32 and the retaining wall structure, the organic packaging material can be prevented from overflowing. After the wall structure is formed, it can flow into the second groove structure 48 , thereby effectively preventing the organic packaging material from overflowing the blocking wall structure and continuing to flow to the light-transmitting area 20 , thus ensuring the reliability of the display substrate.

It is worth noting that the first groove structure 43 and the second groove structure 48 can be provided in the display substrate at the same time to further improve the reliability of the display substrate; or only the first groove structure 43 and the second groove structure 48 can be provided. One of the second groove structures 48 . Exemplarily, the first groove structure 43 and the second groove structure 48 can surround the light-transmitting area 20 .

In some embodiments, a first groove structure may also be provided between adjacent inner isolation members 31, that is, the first groove structure is provided on both sides of the inner isolation member 31, which is more conducive to preventing organic encapsulation materials. overflow. Similarly, a second groove structure is also provided between adjacent outer isolation members 32 , so that both sides of the outer isolation member 32 have second groove structures.

In some embodiments, a metal pad layer may be provided directly under the inner isolation member 31 and/or the outer isolation member 32. Exemplarily, the metal pad layer includes a light-shielding metal pattern, a first gate metal pattern G1, a second One or more of the gate metal pattern G2 and the third gate metal pattern. As shown in FIG. 9, FIG. 9 illustrates that the metal pad layer includes a first gate metal pattern G1 and a second gate metal pattern G2.

It should be noted that, along the direction away from the substrate 40 , the light-shielding metal pattern, the first gate metal pattern G1 , the second gate metal pattern G2 and the third gate metal pattern are stacked in sequence.

Disposing a metal backing layer directly under the inner isolation member 31 and/or the outer isolation member 32 can increase the height of the inner isolation member 31 and/or the outer isolation member 32, thereby better ensuring that the light-emitting functional layer 44 is in the The sides of the inner insulating part 31 and/or the outer insulating part 32 are broken.

As shown in FIG. 9 , the film layer 41 includes a blocking layer 410 , a buffer layer 411 , a first gate insulating layer 412 , and a second gate insulating layer 413 . The blocking layer 410 , the buffer layer 411 , the first gate insulating layer 412 , and the second gate insulating layer 413 can all be made of inorganic materials such as silicon nitride and silicon oxide. When the blocking layer 410 , the buffer layer 411 , the first gate insulating layer 412 , the second gate insulating layer 413 and the interlayer insulating layer are all made of the same material, there is no obvious boundary between the film layers.

Exemplarily, the thickness of the barrier layer 410 is

Such as

etc.; the thickness of the buffer layer 411 is

E.g:

etc.; the thickness of the first gate insulating layer 412 is

The thickness of the second gate insulating layer 413 is

Such as:

etc. The thickness of the interlayer insulating layer is in

Such as

Wait.

In some embodiments, the inner insulating part 31 includes a side surface with a notch, and/or the outer insulating part 32 has a side surface with a notch.

Specifically, the display substrate includes a first source-drain metal layer, and the first source-drain metal layer is used to form source electrodes and drain electrodes of transistors in the display substrate, as well as some conductive connection parts. Exemplarily, the isolation component and the first source-drain metal layer are made of the same layer and material,

Exemplarily, the cross-section of the inner isolation part 31 and the outer isolation part 32 in the direction perpendicular to the base 40 may be I-shaped (as shown in FIG. 9 ) or T-shaped.

Exemplarily, the first source-drain metal layer includes a first titanium metal layer, an aluminum metal layer and a second titanium metal layer that are stacked and arranged, and the isolation member also includes these three layers.

In the display substrate provided by the above embodiment, the inner isolation member 31 and/or the outer isolation member 32 is provided with a notch on the side surface, so that the portion of the light emitting functional layer 44 extending to the isolation region 30 can be used in the inner isolation member 31 . And/or the side notch of the outer isolation member 32 is disconnected, thereby preventing water and oxygen from infiltrating into the interior of the display substrate along the light-emitting functional layer 44 at the cutting line of the border of the light-transmitting area 20 and causing erosion to the interior of the display substrate , causing the display to fail.

As shown in FIG. 3, in some embodiments, the display substrate includes an interlayer insulating layer 42, and the interlayer insulating layer 42 is located between the isolation member and the base 40 of the display substrate; the interlayer The insulating layer 42 is provided with a trench 49, and the orthographic projection of the trench 49 on the substrate 40 is located between the orthographic projections of the two adjacent outer isolation members 32 on the substrate 40; and/or , when the isolation member includes at least two inner isolation members 31 , the orthographic projection of the trench 49 on the substrate 40 is the orthographic projection of the two adjacent inner isolation members 31 on the substrate 40 between.

Specifically, the surface of the interlayer insulating layer 42 facing away from the substrate 40 is provided with a groove 49 . Exemplarily, the groove 49 surrounds the light-transmitting region 20 , and the interlayer insulating layer 42 is vertically The depth in the direction of the substrate 40 is greater than or equal to the thickness of the interlayer insulating layer 42 .

In the display substrate provided by the above embodiment, by arranging trenches 49 between adjacent inner isolation members 31 (or outer isolation members 32 ), the inner isolation members 31 (or outer isolation members 32 ) are enlarged to face away from the The height difference between the surface of the substrate 40 and the substrate 40 makes it easier for the portion of the light-emitting functional layer 44 to extend to the isolation region 30 at the side notch of the inner isolation member 31 (or the outer isolation member 32 ). disconnected, so as to better avoid the problem of water and oxygen infiltrating into the interior of the display substrate along the light-emitting functional layer 44 at the cutting line at the boundary of the light-transmitting area 20 , causing erosion of the interior of the display substrate, resulting in display failure.

In some embodiments, the isolation region 30 is provided with a first gate insulating layer, a second gate insulating layer and an interlayer insulating layer 42 that are sequentially stacked along a direction away from the base 40 of the display substrate; In the direction of the substrate 40 , the depth of the groove structure is greater than or equal to the thickness of the interlayer insulating layer 42 .

Specifically, the isolation region 30 is provided with a barrier layer, a buffer layer, a first gate insulating layer, a second gate insulating layer and an interlayer insulating layer 42 that are sequentially stacked along a direction away from the base 40 of the display substrate. It should be noted that the film layer 41 in FIGS. 2 to 8 includes a barrier layer, a buffer layer, a first gate insulating layer, and a second gate insulating layer.

In the direction perpendicular to the substrate 40 , the depths of the first groove structures 43 and the second groove structures 48 are greater than or equal to the thickness of the interlayer insulating layer 42 .

During specific implementation, the depth of the first groove structure 43 and/or the second groove structure 48 is approximately equal to the thickness of the interlayer insulating layer.

During specific implementation, the depth of the first groove structure 43 and/or the second groove structure 48 is approximately equal to the sum of the thicknesses of the interlayer insulating layer and the second gate insulating layer.

During specific implementation, the depth of the first groove structure 43 and/or the second groove structure 48 is approximately equal to the sum of the thicknesses of the interlayer insulating layer, the second gate insulating layer, and the thickness of the first gate insulating layer.

It should be noted that, "substantially" in the embodiments of the present disclosure means that the thickness fluctuation range is not greater than 20%, such as less than 15%, 10%, 5%, and the like.

The above-mentioned arrangement is perpendicular to the direction of the substrate 40, and the depth of the groove structure is greater than or equal to the thickness of the interlayer insulating layer 42, so that the groove structure has a larger capacity, thereby better avoiding The organic encapsulation material overflows to the light-transmitting area 20 .

As shown in FIGS. 6 to 8 , in some embodiments, the blocking wall structure includes a first blocking wall member 33 and a second blocking wall that are arranged in sequence along the direction from the pixel region 10 to the light-transmitting region 20 . The height of the component 34 , the height of the surface of the first blocking wall component 33 facing away from the base 40 of the display substrate is lower than the height of the surface of the second blocking wall component 34 facing away from the base 40 .

Specifically, the specific structures of the blocking wall structure are various. Exemplarily, the blocking wall structure includes a plurality of blocking wall components arranged in sequence along a direction close to the light-transmitting area 20 . In the direction of the zone 20 , the heights of the plurality of retaining wall components in the direction perpendicular to the base 40 are sequentially increased.

Exemplarily, in the direction perpendicular to the substrate, the heights of the first retaining wall member 33 and the second retaining wall member 34 are between 3 μm and 10 μm, such as: 4 μm, 5 μm, 6 μm, 7 μm, 8 μm, 9 μm, etc. Endpoint values can be included.

Exemplarily, the blocking wall structure may be configured to include the first blocking wall member 33 and the second blocking wall member 34 arranged in sequence along the direction close to the light-transmitting area 20 , and the first blocking wall member Both 33 and the second blocking wall member 34 can surround the light-transmitting area 20 . When the retaining wall structure of the above structure is provided in the display substrate, not only the effective blocking of the organic encapsulation layer 47 is achieved, but also the retaining wall structure occupies a small layout space.

As shown in FIGS. 6 to 8 , in some embodiments, the pixel region 10 is provided with a flat layer 11 , a pixel defining layer 12 and a spacer layer that are sequentially stacked along a direction away from the substrate 40 ;

The first blocking wall component 33 includes a first blocking wall pattern and a second blocking wall pattern that are sequentially stacked along the direction away from the substrate 40 , and the first blocking wall pattern is on the same layer as the pixel defining layer 12 . Material setting, the second retaining wall pattern and the spacer layer are arranged on the same layer and the same material;

The second retaining wall component 34 includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern that are sequentially stacked along the direction away from the base 40 , and the third retaining wall pattern is the same as the flat pattern. The layer 11 is provided on the same layer and the same material, the fourth retaining wall pattern and the pixel defining layer 12 are provided on the same layer and the same material, and the fifth retaining wall pattern and the spacer layer are provided on the same layer and the same material.

Specifically, the pixel region 10 is provided with a driving circuit layer, a flat layer 11 located on the side of the driving circuit layer facing away from the substrate 40 , and a flat layer 11 located on the side of the flat layer 11 facing away from the substrate 40 . The anode layer, the pixel defining layer 12 on the side of the anode layer facing away from the substrate 40 , and the spacer layer on the side of the pixel defining layer 12 facing away from the substrate 40 . The pixel defining layer 12 is used to form pixel openings in the pixel region 10 ; the spacer is located on the side of the pixel defining layer 12 facing away from the substrate 40 and plays a supporting role in the display substrate .

In more detail, the driving circuit layer includes a plurality of sub-pixel driving circuits, the anode layer includes anode patterns one-to-one corresponding to the sub-pixel driving circuits, and the pixel defines a one-to-one relationship with the anode patterns. Corresponding pixel openings, the orthographic projection of each pixel opening on the substrate 40 is surrounded by the orthographic projection of the corresponding anode pattern on the substrate 40, and each pixel opening is provided with an organic light-emitting material layer of a corresponding color. .

The above-mentioned setting of the first retaining wall pattern and the pixel defining layer 12 on the same layer and the same material, and setting the second barrier wall pattern and the spacer layer on the same layer and the same material, so that the first barrier The wall pattern and the pixel defining layer 12 can be formed in the same patterning process, so that the second barrier wall pattern and the spacer layer can be formed in the same patterning process, which simplifies the The manufacturing process of the display substrate saves the manufacturing cost.

The above-mentioned third retaining wall graphics and the flat layer 11 are set on the same layer and the same material, the fourth retaining wall graphics and the pixel defining layer 12 are set on the same layer and the same material, and the fifth retaining wall graphics and all The spacer layer is set in the same layer and the same material; so that the third retaining wall pattern and the flat layer 11 can be formed in the same patterning process, so that the fourth retaining wall pattern can be formed with the pixel defining layer 12 It is formed in the same patterning process, so that the fifth retaining wall pattern and the spacer layer can be formed in the same patterning process, which simplifies the production process of the display substrate and saves the production cost. .

It should be noted that when the retaining wall structure includes the first retaining wall member 33 and the second retaining wall member 34, the display substrate may include an outer isolation member 32 and an inner isolation member 31, or may include a first groove Structure 43 and/or second groove structure 48 .

When the blocking wall structure includes the first blocking wall member 33 and the second blocking wall member 34 , it can have a better blocking effect on the organic packaging material, so as to ensure that the blocking wall structure is close to the light-transmitting area 20 . On one side of the display substrate, the first inorganic encapsulation layer 45 and the second inorganic encapsulation layer 46 have better sealing effect and ensure the reliability of the display substrate.

As shown in FIG. 2 to FIG. 5 and FIG. 9 , in some embodiments, the pixel region 10 is provided with a flat layer 11 , a pixel defining layer 12 , and a spacer layer 11 , a pixel defining layer 12 , and a spacer layer 11 , a pixel defining layer 12 and a spacer layer 11 , a pixel defining layer 12 , and a spacer layer 11 . cushion layer;

The retaining wall structure includes a second retaining wall member 34 , and the second retaining wall member 34 includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall that are sequentially stacked in a direction away from the base 40 . Graphics, the third retaining wall graphics and the flat layer 11 are set on the same layer and the same material, the fourth retaining wall graphics and the pixel defining layer 12 are set on the same layer and the same material, and the fifth retaining wall graphics and all The spacer layer is provided with the same material and the same layer.

Specifically, when the retaining wall structure only includes the second retaining wall member 34, the display substrate may include the outer isolation member 32 and the inner isolation member 31, and may also include the first groove structure 43 and/or the second recess Slot structure 48 .

When the blocking wall structure only includes the second blocking wall member 34 , the frame width of the display substrate in the isolation area 30 can be effectively reduced, and a narrow frame design of the display substrate near the light-transmitting area 20 can be realized.

In some embodiments, in a direction perpendicular to the base of the display substrate, a ratio between the depth of the groove structure and the height of the isolation member is between 0.5 and 1.

Exemplarily, in the direction perpendicular to the base of the display substrate, the depths of the first groove structure 43 and the second groove structure 48 are the same, and the inner isolation part 31 and the outer isolation part 32 of the same height.

Embodiments of the present disclosure further provide a display device including the display substrate provided by the above embodiments.

In the display substrate provided by the above embodiment, the portion of the light-emitting functional layer 44 extending to the isolation region 30 is disconnected at the side of the isolation member, preventing water and oxygen from invading the display substrate along the light-emitting functional layer 44 internal. Moreover, in the display substrate provided by the above-mentioned embodiment, when the organic encapsulation layer 47 is formed, the retaining wall structure can block the encapsulation material used to form the organic encapsulation layer 47, and when the groove structure is located in the blocking structure When the groove structure is close to one side of the pixel area 10, the groove structure can accommodate part of the organic packaging material. When the groove structure is located on the side of the blocking structure close to the light-transmitting area 20, when the organic packaging material overflows the blocking structure, the groove structure Part of the organic packaging material that overflows can be accommodated; therefore, in the display substrate provided by the above embodiment, by arranging the groove structure and the blocking structure in the isolation region 30, the groove structure and the blocking wall structure are both It can effectively limit the extension of the organic encapsulation layer 47 to the light-transmitting area 20 , thereby confining the boundary of the organic encapsulation layer 47 within the isolation area 30 , which solves the problem that the organic encapsulation material is prone to overflow during thin film encapsulation. The structure flows to the light-transmitting area 20, which affects the reliability of the display product.

Therefore, when the display device provided by the embodiment of the present disclosure includes the above-mentioned display substrate, it also has the above-mentioned beneficial effects, which will not be repeated here.

It should be noted that the display device may be any product or component with a display function, such as a TV, a monitor, a digital photo frame, a mobile phone, and a tablet computer.

An embodiment of the present disclosure further provides a method for fabricating a display substrate, which is used to fabricate the display substrate provided in the above-mentioned embodiments. The display substrate includes a display area, and the display area includes a pixel area 10, a light-transmitting area 20, and a The isolation region 30 between the pixel region 10 and the light-transmitting region 20, the isolation region 30 is at least partially arranged around the light-transmitting region 20; the manufacturing method includes:

Fabricating isolation parts and retaining wall structures in the isolation area 30, and a groove structure between the isolation parts and the retaining wall structures;

A light-emitting functional layer 44 and an organic encapsulation layer 47 are fabricated in the pixel region 10; the portion of the light-emitting functional layer 44 extending to the isolation region 30 is disconnected at the side of the isolation member; the organic encapsulation layer 47 is separated from the The pixel region 10 extends to the isolation region 30 , and the groove structure and the blocking wall structure are used to restrict the extension of the organic encapsulation layer 47 to the light-transmitting region 20 .

In the display substrate manufactured by using the manufacturing method provided by the embodiment of the present disclosure, the portion of the light-emitting functional layer 44 extending to the isolation region 30 is disconnected at the side of the isolation member, preventing water and oxygen from passing along the light-emitting function. The layer 44 penetrates into the interior of the display substrate. Moreover, in the display substrate manufactured by the manufacturing method provided by the embodiment of the present disclosure, when the organic encapsulation layer 47 is formed, the retaining wall structure can block the encapsulation material used to form the organic encapsulation layer 47, and when the organic encapsulation layer 47 is formed When the groove structure is located on the side of the blocking structure close to the pixel area 10, the groove structure can accommodate part of the organic encapsulation material. When the groove structure is located on the side of the blocking structure close to the light-transmitting area 20, the organic encapsulation material overflows to prevent During the structure, the groove structure can accommodate part of the overflowing organic packaging material; therefore, in the display substrate manufactured by the manufacturing method provided by the embodiment of the present disclosure, the groove structure and the blocking structure are arranged in the isolation region 30, so that the Both the groove structure and the retaining wall structure can effectively limit the extension of the organic encapsulation layer 47 to the light-transmitting area 20 , thereby confining the boundary of the organic encapsulation layer 47 within the isolation area 30 , solving the problem. During thin film encapsulation, the organic encapsulation material easily overflows the blocking structure and flows to the light-transmitting area 20, which affects the reliability of the display product.

In some embodiments, the pixel region 10 is provided with a flat layer 11 , a pixel defining layer 12 and a spacer layer that are sequentially stacked along a direction away from the base 40 of the display substrate; the retaining wall structure includes a second The retaining wall part 34, the second retaining wall part 34 includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern that are sequentially stacked along the direction away from the base 40; making the second retaining wall pattern The steps of wall member 34 include:

Through one patterning process, the third retaining wall pattern and the flat layer 11 are simultaneously formed;

Through one patterning process, the fourth retaining wall pattern and the pixel defining layer 12 are simultaneously formed;

When the display substrate is fabricated by the fabrication method provided in the above embodiment, the third retaining wall pattern and the flat layer 11 can be formed in the same patterning process, and the fourth retaining wall pattern can be formed with the pixel defining layer 12 in the same patterning process. Formed in the same patterning process, the fifth retaining wall pattern and the spacer layer can be formed in the same patterning process, which greatly simplifies the manufacturing process of the display substrate and saves the manufacturing cost.

It should be noted that each embodiment in this specification is described in a progressive manner, and the same and similar parts between the various embodiments may be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, as for the method embodiment, since it is basically similar to the product embodiment, the description is relatively simple, and the relevant part can be referred to the part of the description of the product embodiment.

Unless otherwise defined, technical or scientific terms used in this disclosure shall have the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. As used in this disclosure, "first," "second," and similar terms do not denote any order, quantity, or importance, but are merely used to distinguish the various components. "Comprises" or "comprising" and similar words mean that the elements or things appearing before the word encompass the elements or things recited after the word and their equivalents, but do not exclude other elements or things. Words like "connected," "coupled," or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "Down", "Left", "Right", etc. are only used to represent the relative positional relationship, and when the absolute position of the described object changes, the relative positional relationship may also change accordingly.

It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" or "under" another element, it can be "directly on" or "under" the other element, Or intermediate elements may be present.

In the foregoing description of the embodiments, the particular features, structures, materials or characteristics may be combined in any suitable manner in any one or more of the embodiments or examples.

The above are only specific embodiments of the present disclosure, but the protection scope of the present disclosure is not limited to this. should be included within the scope of protection of the present disclosure. Therefore, the protection scope of the present disclosure should be based on the protection scope of the claims.

Claims

A display substrate, comprising a display area, the display area including a pixel area, a light-transmitting area, and an isolation area between the pixel area and the light-transmitting area, the isolation area at least partially surrounding the light-transmitting area zone settings;

The isolation area includes an isolation part and a retaining wall structure, and a groove structure between the isolation part and the retaining wall structure;

The pixel region includes a light-emitting functional layer and an organic encapsulation layer; a portion of the light-emitting functional layer extending to the isolation region is disconnected at the side of the isolation member; the organic encapsulation layer extends from the pixel region to the isolation region The isolation area, the groove structure and the blocking wall structure are used to restrict the organic encapsulation layer from extending to the light-transmitting area.
The display substrate according to claim 1, wherein the isolation member comprises at least two inner isolation members, and the at least two inner isolation members are arranged at intervals along a direction in which the pixel area points to the light-transmitting area, the At least two inner isolation members are located between the pixel region and the retaining wall structure;

The groove structure includes a first groove structure located between the at least two inner isolation members and the retaining wall structure, and the organic encapsulation layer is filled in the first groove structure.
The display substrate according to claim 1 or 2, wherein the isolation member comprises at least two outer isolation members, and the at least two outer isolation members are arranged at intervals along the direction from the pixel region to the light-transmitting region, The at least two outer isolation components are located between the light-transmitting area and the retaining wall structure;

The groove structure includes a second groove structure located between the at least two outer isolation members and the retaining wall structure.
The display substrate according to claim 3, wherein the side surfaces of the inner spacer parts included in the spacer parts have notches, and/or the side surfaces of the outer spacer parts have notches.
The display substrate according to claim 3, wherein the display substrate comprises an interlayer insulating layer, the interlayer insulating layer is located between the isolation member and the base of the display substrate; on the interlayer insulating layer A trench is provided, and the orthographic projection of the trench on the substrate is located between the orthographic projections of two adjacent outer isolation components on the substrate; and/or, when the isolation component includes at least two When there are two inner isolation components, the orthographic projection of the trench on the substrate is located between the orthographic projections of the two adjacent inner isolation components on the substrate.
The display substrate according to claim 1, wherein the isolation region is provided with a first gate insulating layer, a second gate insulating layer and an interlayer insulating layer which are sequentially stacked along a direction away from the base of the display substrate; In the direction of the substrate, the depth of the groove structure is greater than or equal to the thickness of the interlayer insulating layer.
The display substrate according to claim 1, wherein the blocking wall structure comprises a first blocking wall member and a second blocking wall member arranged in sequence along a direction from the pixel region to the light-transmitting region, the first blocking wall member The height of the surface of the retaining wall member facing away from the base of the display substrate is lower than the height of the surface of the second retaining wall member facing away from the base.
The display substrate according to claim 7, wherein the pixel region is provided with a flat layer, a pixel defining layer and a spacer layer which are sequentially stacked in a direction away from the substrate;

The first retaining wall component includes a first retaining wall graphic and a second retaining wall graphic that are sequentially stacked along a direction away from the substrate, and the first retaining wall graphic and the pixel defining layer are provided on the same layer and the same material, The second retaining wall pattern and the spacer layer are arranged in the same layer and the same material;

The second retaining wall component includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern that are sequentially stacked in a direction away from the base, and the third retaining wall pattern is the same as the flat layer. The fourth retaining wall pattern and the pixel defining layer are provided in the same layer and the same material, and the fifth retaining wall pattern and the spacer layer are provided in the same layer and the same material.
The display substrate according to claim 1, wherein the pixel region is provided with a flat layer, a pixel definition layer and a spacer layer which are sequentially stacked in a direction away from the base of the display substrate;

The retaining wall structure includes a second retaining wall component, and the second retaining wall component includes a third retaining wall figure, a fourth retaining wall figure and a fifth retaining wall figure that are sequentially stacked in a direction away from the base, so that the The third retaining wall graphics and the flat layer are arranged on the same layer and the same material, the fourth retaining wall graphics and the pixel defining layer are arranged on the same layer and the same material, and the fifth retaining wall graphics and the spacer layer Same layer and same material setting.
The display substrate of claim 1, wherein the groove structure surrounds the light-transmitting area.
The display substrate of claim 1 , wherein, in a direction perpendicular to the base of the display substrate, a ratio between the depth of the groove structure and the height of the isolation member is between 0.5 and 1.
A display device comprising the display substrate according to any one of claims 1 to 11.
A method for manufacturing a display substrate, the display substrate includes a display area, the display area includes a pixel area, a light-transmitting area, and an isolation area between the pixel area and the light-transmitting area, the isolation area at least partially surrounding the light-transmitting area; the manufacturing method includes:

Fabricating an isolation part and a retaining wall structure in the isolation area, and a groove structure between the isolation part and the retaining wall structure;

A light-emitting functional layer and an organic encapsulation layer are fabricated in the pixel region; the portion of the light-emitting functional layer extending to the isolation region is disconnected at the side of the isolation member; the organic encapsulation layer extends from the pixel region to the isolation region. The isolation area, the groove structure and the blocking wall structure are used to restrict the organic encapsulation layer from extending to the light-transmitting area.
The method for fabricating a display substrate according to claim 13, wherein the pixel region is provided with a flat layer, a pixel defining layer and a spacer layer that are sequentially stacked along a direction away from the base of the display substrate; The wall structure includes a second retaining wall component, and the second retaining wall component includes a third retaining wall pattern, a fourth retaining wall pattern and a fifth retaining wall pattern that are sequentially stacked in a direction away from the base; making the first retaining wall pattern The steps for the second retaining wall assembly include:

By one patterning process, the third retaining wall pattern and the flat layer are simultaneously formed;

By one patterning process, the fourth retaining wall pattern and the pixel defining layer are simultaneously formed;

Through one patterning process, the fifth retaining wall pattern and the spacer layer are simultaneously formed.