WO2022063509A3 - Pressure relief apparatus and method in a target material supply system - Google Patents

Pressure relief apparatus and method in a target material supply system Download PDF

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Publication number
WO2022063509A3
WO2022063509A3 PCT/EP2021/073421 EP2021073421W WO2022063509A3 WO 2022063509 A3 WO2022063509 A3 WO 2022063509A3 EP 2021073421 W EP2021073421 W EP 2021073421W WO 2022063509 A3 WO2022063509 A3 WO 2022063509A3
Authority
WO
WIPO (PCT)
Prior art keywords
target material
supply system
pressure relief
material supply
relief apparatus
Prior art date
Application number
PCT/EP2021/073421
Other languages
French (fr)
Other versions
WO2022063509A2 (en
Inventor
Rahul Sunil KAPADIA
Chirag Rajyaguru
Martinus Hendrikus Antonius Leenders
Stephen William KOWALK
Georgiy Olegovich VASCHENKO
Original Assignee
Asml Netherlands B.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands B.V. filed Critical Asml Netherlands B.V.
Priority to CN202180065017.3A priority Critical patent/CN116235637A/en
Priority to KR1020237009677A priority patent/KR20230071137A/en
Publication of WO2022063509A2 publication Critical patent/WO2022063509A2/en
Publication of WO2022063509A3 publication Critical patent/WO2022063509A3/en

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

Abstract

A pressure relief apparatus includes a pressure relief component formed of a compressible material and disposed at an interior surface of a structure within a target material supply system. The target material supply system is configured to deliver target material. The interior surface of the structure defines a cavity within the target material supply system. The structure is formed of a rigid material, and is configured to contain the target material within the cavity. The pressure relief component is configured to passively prevent a pressure in the cavity from exceeding a maximum allowed value.
PCT/EP2021/073421 2020-09-23 2021-08-24 Pressure relief apparatus and method in a target material supply system WO2022063509A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN202180065017.3A CN116235637A (en) 2020-09-23 2021-08-24 Pressure reducing device and method in target material supply system
KR1020237009677A KR20230071137A (en) 2020-09-23 2021-08-24 Apparatus and method for relieving pressure in target material supply system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202063082234P 2020-09-23 2020-09-23
US63/082,234 2020-09-23

Publications (2)

Publication Number Publication Date
WO2022063509A2 WO2022063509A2 (en) 2022-03-31
WO2022063509A3 true WO2022063509A3 (en) 2022-05-05

Family

ID=77739053

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2021/073421 WO2022063509A2 (en) 2020-09-23 2021-08-24 Pressure relief apparatus and method in a target material supply system

Country Status (4)

Country Link
KR (1) KR20230071137A (en)
CN (1) CN116235637A (en)
TW (1) TW202231126A (en)
WO (1) WO2022063509A2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2949840A1 (en) * 2009-09-10 2011-03-11 Mahytec RESERVOIR, IN PARTICULAR FOR GAS UNDER PRESSURE, AND METHOD OF MANUFACTURE
US8154000B2 (en) * 2009-05-08 2012-04-10 Xtreme Technologies Gmbh Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources
US20120291627A1 (en) * 2010-01-06 2012-11-22 Advanced Technology Materials, Inc. Liquid dispensing systems with gas removal and sensing capabilities

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8154000B2 (en) * 2009-05-08 2012-04-10 Xtreme Technologies Gmbh Arrangement for the continuous generation of liquid tin as emitter material in EUV radiation sources
FR2949840A1 (en) * 2009-09-10 2011-03-11 Mahytec RESERVOIR, IN PARTICULAR FOR GAS UNDER PRESSURE, AND METHOD OF MANUFACTURE
US20120291627A1 (en) * 2010-01-06 2012-11-22 Advanced Technology Materials, Inc. Liquid dispensing systems with gas removal and sensing capabilities

Also Published As

Publication number Publication date
KR20230071137A (en) 2023-05-23
WO2022063509A2 (en) 2022-03-31
TW202231126A (en) 2022-08-01
CN116235637A (en) 2023-06-06

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