WO2022055609A3 - Reactor system coupled to an energy emitter control circuit - Google Patents

Reactor system coupled to an energy emitter control circuit Download PDF

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Publication number
WO2022055609A3
WO2022055609A3 PCT/US2021/041050 US2021041050W WO2022055609A3 WO 2022055609 A3 WO2022055609 A3 WO 2022055609A3 US 2021041050 W US2021041050 W US 2021041050W WO 2022055609 A3 WO2022055609 A3 WO 2022055609A3
Authority
WO
WIPO (PCT)
Prior art keywords
microwave energy
energy source
control circuit
state
supply gas
Prior art date
Application number
PCT/US2021/041050
Other languages
French (fr)
Other versions
WO2022055609A2 (en
Inventor
Michael W. Stowell
Tung Van Pham
Bryce H. ANZELMO
Thomas Riso
Original Assignee
Lyten, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US17/008,188 external-priority patent/US11923176B2/en
Priority claimed from US17/039,736 external-priority patent/US11107662B2/en
Application filed by Lyten, Inc. filed Critical Lyten, Inc.
Priority to CN202180050881.6A priority Critical patent/CN116075361A/en
Publication of WO2022055609A2 publication Critical patent/WO2022055609A2/en
Publication of WO2022055609A3 publication Critical patent/WO2022055609A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32201—Generating means
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32311—Circuits specially adapted for controlling the microwave discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/20—Graphite
    • C01B32/205—Preparation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)

Abstract

A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.
PCT/US2021/041050 2020-08-31 2021-07-09 Reactor system coupled to an energy emitter control circuit WO2022055609A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202180050881.6A CN116075361A (en) 2020-08-31 2021-07-09 Reactor system coupled to energy emitter control circuit

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US17/008,188 US11923176B2 (en) 2017-02-09 2020-08-31 Temperature-controlled chemical processing reactor
US17/008,188 2020-08-31
US17/039,736 US11107662B2 (en) 2019-08-19 2020-09-30 Reactor system coupled to an energy emitter control circuit
US17/039,736 2020-09-30

Publications (2)

Publication Number Publication Date
WO2022055609A2 WO2022055609A2 (en) 2022-03-17
WO2022055609A3 true WO2022055609A3 (en) 2022-06-16

Family

ID=80629789

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2021/041050 WO2022055609A2 (en) 2020-08-31 2021-07-09 Reactor system coupled to an energy emitter control circuit

Country Status (3)

Country Link
CN (1) CN116075361A (en)
TW (1) TWI766760B (en)
WO (1) WO2022055609A2 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012064444A (en) * 2010-09-16 2012-03-29 Nagoya Univ Plasma generation device, plasma processing apparatus and plasma processing method
US20180226229A1 (en) * 2017-02-09 2018-08-09 Lyten, Inc. Microwave Chemical Processing Reactor
KR20190032621A (en) * 2016-08-16 2019-03-27 어플라이드 머티어리얼스, 인코포레이티드 Modular microwave plasma source
US20190185325A1 (en) * 2016-10-06 2019-06-20 Lyten, Inc. Microwave Reactor System with Gas-Solids Separation
US20190341228A1 (en) * 2018-05-01 2019-11-07 Tokyo Electron Limited Microwave output device and plasma processing apparatus

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5216695A (en) * 1991-06-14 1993-06-01 Anro Engineering, Inc. Short pulse microwave source with a high prf and low power drain
US9754791B2 (en) * 2015-02-07 2017-09-05 Applied Materials, Inc. Selective deposition utilizing masks and directional plasma treatment
US9812295B1 (en) * 2016-11-15 2017-11-07 Lyten, Inc. Microwave chemical processing

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012064444A (en) * 2010-09-16 2012-03-29 Nagoya Univ Plasma generation device, plasma processing apparatus and plasma processing method
KR20190032621A (en) * 2016-08-16 2019-03-27 어플라이드 머티어리얼스, 인코포레이티드 Modular microwave plasma source
US20190185325A1 (en) * 2016-10-06 2019-06-20 Lyten, Inc. Microwave Reactor System with Gas-Solids Separation
US20180226229A1 (en) * 2017-02-09 2018-08-09 Lyten, Inc. Microwave Chemical Processing Reactor
US20190341228A1 (en) * 2018-05-01 2019-11-07 Tokyo Electron Limited Microwave output device and plasma processing apparatus

Also Published As

Publication number Publication date
CN116075361A (en) 2023-05-05
TW202211731A (en) 2022-03-16
WO2022055609A2 (en) 2022-03-17
TWI766760B (en) 2022-06-01

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