WO2022055609A3 - Reactor system coupled to an energy emitter control circuit - Google Patents
Reactor system coupled to an energy emitter control circuit Download PDFInfo
- Publication number
- WO2022055609A3 WO2022055609A3 PCT/US2021/041050 US2021041050W WO2022055609A3 WO 2022055609 A3 WO2022055609 A3 WO 2022055609A3 US 2021041050 W US2021041050 W US 2021041050W WO 2022055609 A3 WO2022055609 A3 WO 2022055609A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- microwave energy
- energy source
- control circuit
- state
- supply gas
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32201—Generating means
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
- H01J37/32311—Circuits specially adapted for controlling the microwave discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/20—Graphite
- C01B32/205—Preparation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Inorganic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Abstract
A microwave energy source that generates a microwave energy is disclosed. The microwave energy source has an on-state and an off-state. A control circuit is coupled to the microwave energy source and includes an output to generate a control signal that adjusts a pulse frequency of the microwave energy. A voltage generator applies a non-zero voltage to the microwave energy source during the off-state. A frequency and a duty cycle of the non-zero voltage is based on a frequency and a duty cycle of the control signal. A waveguide is coupled to the microwave energy source. The waveguide has a supply gas inlet that receives a supply gas, a reaction zone that generates a plasma, a process inlet that injects a raw material into the reaction zone, and an outlet that outputs a powder based on a mixture of the supply gas and the raw material within the plasma.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202180050881.6A CN116075361A (en) | 2020-08-31 | 2021-07-09 | Reactor system coupled to energy emitter control circuit |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17/008,188 US11923176B2 (en) | 2017-02-09 | 2020-08-31 | Temperature-controlled chemical processing reactor |
US17/008,188 | 2020-08-31 | ||
US17/039,736 US11107662B2 (en) | 2019-08-19 | 2020-09-30 | Reactor system coupled to an energy emitter control circuit |
US17/039,736 | 2020-09-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2022055609A2 WO2022055609A2 (en) | 2022-03-17 |
WO2022055609A3 true WO2022055609A3 (en) | 2022-06-16 |
Family
ID=80629789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2021/041050 WO2022055609A2 (en) | 2020-08-31 | 2021-07-09 | Reactor system coupled to an energy emitter control circuit |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN116075361A (en) |
TW (1) | TWI766760B (en) |
WO (1) | WO2022055609A2 (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012064444A (en) * | 2010-09-16 | 2012-03-29 | Nagoya Univ | Plasma generation device, plasma processing apparatus and plasma processing method |
US20180226229A1 (en) * | 2017-02-09 | 2018-08-09 | Lyten, Inc. | Microwave Chemical Processing Reactor |
KR20190032621A (en) * | 2016-08-16 | 2019-03-27 | 어플라이드 머티어리얼스, 인코포레이티드 | Modular microwave plasma source |
US20190185325A1 (en) * | 2016-10-06 | 2019-06-20 | Lyten, Inc. | Microwave Reactor System with Gas-Solids Separation |
US20190341228A1 (en) * | 2018-05-01 | 2019-11-07 | Tokyo Electron Limited | Microwave output device and plasma processing apparatus |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5216695A (en) * | 1991-06-14 | 1993-06-01 | Anro Engineering, Inc. | Short pulse microwave source with a high prf and low power drain |
US9754791B2 (en) * | 2015-02-07 | 2017-09-05 | Applied Materials, Inc. | Selective deposition utilizing masks and directional plasma treatment |
US9812295B1 (en) * | 2016-11-15 | 2017-11-07 | Lyten, Inc. | Microwave chemical processing |
-
2021
- 2021-07-09 CN CN202180050881.6A patent/CN116075361A/en active Pending
- 2021-07-09 WO PCT/US2021/041050 patent/WO2022055609A2/en active Application Filing
- 2021-07-15 TW TW110126106A patent/TWI766760B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012064444A (en) * | 2010-09-16 | 2012-03-29 | Nagoya Univ | Plasma generation device, plasma processing apparatus and plasma processing method |
KR20190032621A (en) * | 2016-08-16 | 2019-03-27 | 어플라이드 머티어리얼스, 인코포레이티드 | Modular microwave plasma source |
US20190185325A1 (en) * | 2016-10-06 | 2019-06-20 | Lyten, Inc. | Microwave Reactor System with Gas-Solids Separation |
US20180226229A1 (en) * | 2017-02-09 | 2018-08-09 | Lyten, Inc. | Microwave Chemical Processing Reactor |
US20190341228A1 (en) * | 2018-05-01 | 2019-11-07 | Tokyo Electron Limited | Microwave output device and plasma processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
CN116075361A (en) | 2023-05-05 |
TW202211731A (en) | 2022-03-16 |
WO2022055609A2 (en) | 2022-03-17 |
TWI766760B (en) | 2022-06-01 |
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