WO2022042354A1 - Chip packaging process and packaging chip - Google Patents

Chip packaging process and packaging chip Download PDF

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Publication number
WO2022042354A1
WO2022042354A1 PCT/CN2021/112780 CN2021112780W WO2022042354A1 WO 2022042354 A1 WO2022042354 A1 WO 2022042354A1 CN 2021112780 W CN2021112780 W CN 2021112780W WO 2022042354 A1 WO2022042354 A1 WO 2022042354A1
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WO
WIPO (PCT)
Prior art keywords
chip
substrate
facing away
layer
plastic
Prior art date
Application number
PCT/CN2021/112780
Other languages
French (fr)
Chinese (zh)
Inventor
于上家
陈建超
詹新明
胡光华
Original Assignee
青岛歌尔微电子研究院有限公司
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Application filed by 青岛歌尔微电子研究院有限公司 filed Critical 青岛歌尔微电子研究院有限公司
Publication of WO2022042354A1 publication Critical patent/WO2022042354A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/561Batch processing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0655Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00 the devices being arranged next to each other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Definitions

  • the present application relates to the technical field of semiconductor packaging, and in particular, to a chip packaging process and a packaging chip.
  • Chips are placed to realize an integrated package structure of multiple chips in the vertical direction, which makes full use of the vertical space, and inevitably, the thickness of the package body will increase.
  • the main purpose of the present application is to propose a chip packaging process and a packaged chip, aiming at improving the related problem of the large thickness of the integrated packaged chip.
  • the chip packaging process proposed by the present application includes the following steps:
  • the second chip is attached to the side of the first chip facing away from the substrate.
  • the step of processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate includes:
  • the step of processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate includes:
  • the plastic sealing layer corresponding to the position of the first chip is ground, and the side of the first chip facing away from the substrate is exposed.
  • the chip packaging process further includes:
  • the chip packaging process further includes: include:
  • a circuit layer is formed on the side of the plastic packaging layer facing away from the substrate, the substrate is electrically connected to the circuit layer through a wire bonding chip, and the second chip is electrically connected to the circuit layer through a bonding wire.
  • the step of forming a circuit layer on the side of the plastic encapsulation layer facing away from the substrate includes:
  • the circuit layer is formed on the side of the plastic encapsulation layer facing away from the substrate.
  • the plastic sealing layer is an organic metal compound modified plastic sealing compound, and the side of the plastic sealing layer facing away from the substrate is activated by laser irradiation to form the seed layer.
  • the method before performing the step of activating the side of the plastic encapsulation layer facing away from the substrate by laser irradiation to form the seed layer, the method further includes:
  • a mask layer is applied on the side of the plastic sealing layer facing away from the substrate, and the mask layer is provided with a light-transmitting portion corresponding to the circuit pattern of the circuit layer.
  • the step of electrically connecting the substrate to the circuit layer through a wire bonding chip includes:
  • a wire-bonding chip is provided, the wire-bonding chip is electrically connected to the substrate, the wire-bonding chip is plastic-sealed by the plastic sealing layer, and the wire-bonding chip has conductive posts, and the plastic sealing layer is ground to make the conductive posts Exposing, electrically connecting the conductive post with the circuit layer; or
  • a wire-bonding chip is provided, the wire-bonding chip is electrically connected to the substrate, the wire-bonding chip is plastic-sealed by the plastic sealing layer, the wire-bonding chip has conductive posts, and the plastic sealing layer is drilled so that the The conductive posts are exposed, and conductors are filled in the drilled holes, and the conductive posts are electrically connected to the circuit layer through the conductors.
  • the wire bonding chip is electrically connected to the substrate through connecting wires, and the wire bonding chip is electrically connected to the circuit layer.
  • the chip packaging process further includes:
  • a third chip is provided, and the third chip is attached to the circuit layer.
  • the chip packaging process further includes:
  • Secondary plastic sealing is performed on the side of the plastic sealing layer facing away from the substrate, so as to perform plastic sealing of the second chip, the third chip and the circuit layer.
  • the present application also proposes a packaged chip, comprising:
  • a plastic encapsulation layer disposed on the substrate, and a accommodating portion is recessed on the side of the plastic encapsulation layer facing away from the substrate;
  • a first chip which is attached to the substrate and located in the plastic encapsulation layer, and the side of the first chip facing away from the substrate is communicated with the accommodating portion;
  • the second chip is disposed in the accommodating portion and attached to the side of the first chip facing away from the substrate.
  • the packaged chip further includes:
  • a wire bonding chip which is arranged on the plastic sealing layer and is electrically connected to the substrate;
  • the circuit layer is arranged on the side of the plastic sealing layer facing away from the substrate, the wire bonding chip is electrically connected to the circuit layer, and the second chip is electrically connected to the circuit layer through the bonding wire.
  • the technical solution of the present application is to expose the back of the first chip by grinding after the first chip is plastic-sealed.
  • the distance between the substrate and the second chip is reduced. , to reduce the thickness of the overall chip after encapsulation.
  • FIG. 1 is a schematic flowchart of an embodiment of a chip packaging process of the present application
  • FIG. 2 is a schematic flowchart of an embodiment of grinding a plastic sealing layer of the present application
  • FIG. 3 is a schematic flowchart of another embodiment of grinding the plastic sealing layer of the present application.
  • FIG. 4 is a schematic flowchart of etching the first chip according to an embodiment of the present application
  • FIG. 5 is a schematic flowchart of an embodiment of step S50 of the present application.
  • FIG. 6 is a schematic flowchart of forming a circuit layer according to an embodiment of the present application.
  • FIG. 7 is a schematic flowchart of an embodiment of the connection between the substrate and the circuit layer of the present application.
  • FIG. 8 is a schematic flowchart of another embodiment of the connection between the substrate and the circuit layer of the present application.
  • FIG. 9 is a schematic flowchart of an embodiment of step S60 of the present application.
  • FIG. 10 is a schematic structural diagram of an embodiment of a packaged chip of the present application.
  • FIG. 11 is a schematic flowchart of forming a packaged chip according to an embodiment of the present application.
  • FIG. 12 is a schematic flowchart of forming a packaged chip according to another embodiment of the present application.
  • label name label name 10 substrate 201 wire chip 202 connecting wires twenty one Conductive pillar twenty two conductor 30 Solder balls 40 first chip 50 Plastic layer 51 seed layer 52 mask layer 53 accommodating part 60 second chip 61 welding wire 70 third chip 80 Laser equipment
  • the present application proposes a chip packaging process, including the following steps:
  • Circuits are provided on the substrate 10 , and mounting positions corresponding to the first chips 40 are provided on the substrate 10 , and the mounting positions have connection contacts for connecting the circuits in the substrate 10 .
  • the first chip 40 can be flip-chip mounted on the substrate 10, so that the pins or connection contacts of the first chip 40 are disposed toward the substrate 10, and the first chip 40 is mounted on the corresponding substrate 10. After the mounting position, the first chip 40 is connected to the connection contacts of the mounting position, so that the circuit between the first chip 40 and the substrate 10 is conducted.
  • the end face of the first chip 40 facing away from the substrate 10 is its back.
  • the first chip 40 may be a flip chip. Chip Die), the solder balls 30 are connected to the connection contacts on the substrate 10 to realize the mounting of the first chip 40 .
  • the plastic encapsulation layer 50 is formed on the substrate 10 by using a plastic encapsulation material, and the first chip 40 is encapsulated in the plastic encapsulation layer 50 .
  • the plastic-sealing layer is processed so that the plastic-sealing layer 50 on the side of the first chip 40 facing away from the substrate 10 is removed, so that the first chip 40 is removed.
  • the side of 40 facing away from the base 10 forms a space that can be used for accommodating the second chip 60 .
  • connection contacts of the second chip 60 are arranged away from the substrate 10 .
  • the second chip 60 When the second chip 60 is attached to the back of the first chip 40 , the second chip 60 , the plastic sealing layer 50 and the substrate 10 form a package body. Compared with the existing method of directly mounting the second chip 60 on the surface of the plastic sealing layer 50 after the plastic packaging is completed, the second chip 60 faces away from the substrate after grinding and etching. The distance between one side of the 10 and the substrate 10 is relatively reduced, thereby reducing the overall thickness of the package body.
  • the thickness of the chip itself accounts for a large part of the overall thickness of the generated package.
  • the backside of the first chip 40 can be utilized. space to make full use of the internal space of the package.
  • the second chip 60 is placed on the first chip 40, the distance between the chips can be reduced, the overall thickness of the package body can be reduced, the SIP (System In a Package, system-in-package) packaging space can be reduced, and the The SIP is more miniaturized; since the proportion of the first chip 40 in the total thickness of the package can be reduced, the space for attaching the second chip 60 can be relatively more, and more chips can be integrated in the plastic package to achieve higher density requirements.
  • a bonding wire or the like may be provided on the substrate 10 as a connecting structure, and part of the connecting structure is plastic-sealed in the plastic sealing layer 50 , and part of the connecting structure protrudes from the plastic sealing layer 50 and is connected with the first plastic sealing layer 50 .
  • the two chips 60 are electrically connected, so that the second chip 60 and the substrate 10 are electrically connected through a connection structure, so as to realize the mutual conduction between the first chip 40 and the second chip 60 .
  • the conduction between the second chip 60 and the substrate 10 may also be achieved in other manners.
  • the step S30 includes:
  • the plastic sealing layer 50 can be The entire surface of the first chip 40 is ground to reduce the overall thickness of the plastic encapsulation layer 50 until the backside of the first chip 40 is exposed.
  • the positioning of the grinding process can be facilitated, and the control of the grinding process can be facilitated. Due to the overall grinding of the plastic encapsulation layer 50, the distance between the end face of the plastic encapsulation layer 50 facing away from the substrate 10 and the substrate 10 is reduced. The thickness of the overall structure formed by mounting is also relatively reduced. For example, when a rewiring layer is formed on the plastic packaging layer 50 and a circuit layer is formed, the distance between the circuit layer and the substrate 10 is reduced, and when the chip is mounted on the circuit layer again, the thickness of the formed package body is reduced. little. For the method of grinding the side of the plastic sealing layer 50 facing away from the substrate 10, reference may be made to the prior art.
  • the step S30 includes:
  • the concave portion is the accommodating portion 53 for accommodating the second chip 60 . Since only the plastic encapsulation layer 50 corresponding to the first chip 40 is ground during grinding, the required grinding area is relatively reduced, thereby reducing the grinding workload.
  • the surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole first, and after the overall thickness of the plastic sealing layer 50 is reduced, the first chip 40 is The plastic sealing layer 50 corresponding to the position continues to be ground until the backside of the first chip 40 is exposed. At this time, the overall thickness of the plastic sealing layer 50 is reduced.
  • the second chip 60 is placed on the back of the first chip 40 and a rewiring layer is formed on the plastic sealing layer 50, the resulting The overall thickness of the package body is reduced.
  • the chip packaging process further includes:
  • the backside of the first chip 40 is etched with hydrofluoric acid, so that the side of the first chip 40 facing away from the substrate 10 is between the substrate 10 .
  • the distance between them decreases, so that at the position where the first chip 40 is located, the depth of the accommodating portion 53 increases.
  • the first chip 40 is etched, it is preferable not to affect the internal circuit of the first chip 40 .
  • the second chip 60 is attached to the back of the first chip 40, the distance between the side of the second chip 60 facing away from the substrate 10 and the substrate 10 is relatively reduced, thereby reducing the distance between the second chip 60 and the substrate 10. The overall thickness of the small package.
  • the etching thickness of the first chip 40 may be between 0 and 1000 microns. Taking a flip chip as an example for the first chip 40, the thickness of the flip chip after grinding is usually 50 to 500 microns, while the thickness of the flip chip is usually 50 to 500 microns. The thickness of the circuits in is usually around 10 microns. By reducing the overall thickness of the first chip 40 , a larger accommodating space can be provided for the second chip 60 . The etching thickness of the first chip 40 can be determined according to the specific conditions of the first chip 40 , and it is preferable that the internal circuit of the first chip 40 is not affected.
  • the surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole first, and after the overall thickness of the plastic sealing layer 50 is reduced, the first chip 40 is The plastic encapsulation layer 50 corresponding to the position continues to be ground until the backside of the first chip 40 is exposed. Then, step S330 is performed to etch the back of the first chip 40 to reduce the thickness of the first chip 40 .
  • the chip packaging process further includes:
  • the second chip 60 and the circuit layer form a second-layer circuit structure.
  • the wire bonding chip 201 is used to connect the substrate 10 and the circuit layer to each other, and the first chip 40 is attached to the substrate 10 to realize the circuit layer and the first chip 40 mutual conduction.
  • the bonding wire 61 is used to realize the conduction between the second chip 60 and the circuit layer, and thus can be in conduction with the first chip 40 .
  • the circuit layer By forming the circuit layer, the circuit layer can be used for conduction between the second chip 60 and the first chip 40 , so that it is not necessary to provide a separate adapter board, so as to improve the performance of the existing package.
  • the wire bonding chip 201 is electrically connected to the substrate 10 through the connecting wires 202 , and the wire bonding chip 201 is electrically connected to the circuit layer.
  • the wire bonding chip 201 can be used to connect the circuit layer and the substrate 10, and also has its own chip function.
  • the thickness of the wire-bonding chip 201 after grinding is usually 30 to 500 microns, the thickness of the internal circuit is usually 10 microns.
  • the connecting wire 202 can also be a bonding wire. As shown in the figure, there are only two first chips 40 and one wire bonding chip 201 , which are only partial structures of the plastic package. In actual processing, a plurality of the first chips 40 may be placed on the substrate 10 . and the wire bonding chip 201, which are not limited here.
  • the step of forming a circuit layer on the side of the plastic encapsulation layer 50 facing away from the substrate 10 includes:
  • the circuit layer is first etched, and the seed layer 51 forms the circuit pattern.
  • the seed layer 51 forms the circuit pattern.
  • a strong reducing agent is used in a solution containing metal ions to deposit metal ions on the surface of the seed layer 51 to form the pattern of the circuit layer.
  • the surface of the side of the plastic encapsulation layer 50 facing away from the substrate 10 may be ground first.
  • the plastic sealing layer 50 may also be ground simultaneously.
  • a copper seed layer 51 needs to be formed for conduction when forming the copper circuit.
  • the copper in the anode reacts and converts into copper ions and electrons, and the cathode also reacts, and the copper ions on the surface of the seed layer 51 near the cathode combine with the electrons to form a plating Copper on the surface of the seed layer 51 to form a circuit, thereby forming the circuit layer.
  • the plastic sealing layer 50 is an organic metal compound modified plastic sealing compound, and the side of the plastic sealing layer 50 facing away from the substrate 10 is activated by laser irradiation to form the seed layer 51 .
  • the organometallic compound modified plastic sealant contains metal ions, and after being irradiated by a laser, the ions can be released to form a conductive seed layer 51 .
  • the seed layer 51 can be formed on the surface of the plastic encapsulation layer 50 by laser irradiation generated by the laser device 80 , the subsequent circuit layer fabrication can be facilitated, and at the same time, there is no need to provide a device on the plastic encapsulation layer 50 for conducting the first chip 40 and the The adapter plate of the second chip 60 further reduces the overall thickness of the plastic package.
  • a mask layer 52 is applied to the side of the layer 50 facing away from the substrate 10 , and the mask layer 52 is provided with a light-transmitting portion corresponding to the circuit pattern of the circuit layer.
  • the mask layer 52 is used to block the laser light, so that the laser light can only be irradiated on the plastic sealing layer 50 according to a preset position.
  • the light-transmitting portion is used for laser light to pass through, so that the laser light can act on the surface of the plastic sealing layer 50 facing away from the substrate 10 to form the seed layer 51 . Since the light-transmitting portion is consistent with the circuit pattern of the circuit layer, the pattern of the seed layer 51 formed after laser irradiation is the same as the circuit pattern of the circuit layer.
  • the step of electrically connecting the substrate 10 to the circuit layer through a wire bonding chip includes:
  • S520 Provide a wire bonding chip, the wire bonding chip is electrically connected to the substrate 10, the plastic sealing layer 50 plastic-encapsulates the wire bonding chip, the wire bonding chip has conductive posts 21, the plastic sealing layer 50 is ground, so that the conductive pillars 21 are exposed, and the conductive pillars 21 are electrically connected to the circuit layer;
  • one end of the wire bonding chip is connected to the circuit of the substrate 10 , and the conductive pillars 21 of the wire bonding chip are disposed in a direction away from the substrate 10 .
  • the side of the conductive pillar 21 away from the substrate 10 is exposed.
  • the formed circuit layer is connected to one end of the conductive pillar 21 away from the substrate 10 , so that the wire bonding chip and the circuit layer are connected to each other.
  • the step of electrically connecting the substrate 10 to the circuit layer through a wire bonding chip includes:
  • one end of the conductive column 21 is connected to the wire bonding chip, and the other end of the conductive column 21 faces the side surface of the plastic sealing layer 50 away from the substrate 10 .
  • an accommodating portion 53 corresponding to the position of the first chip 40 is formed in the plastic sealing layer 50 .
  • the plastic encapsulation layer 50 is drilled to expose one end of the conductive pillar 21 away from the substrate 10 .
  • Conductors 22 are filled in the drilled holes, and when the circuit layer is fabricated, the conductors 22 in the drilled holes are connected to the circuit layer, so that the wire bonding chip and the circuit layer are connected to each other. .
  • the plastic sealing layer 50 may also be drilled first to form the conductors 22 , and then the accommodating portion 53 is formed in the plastic sealing layer 50 . Can also be done at the same time.
  • the entire surface of the side surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole to reduce the overall thickness of the plastic sealing layer 50 and at the same time make the It is easier to form a stable, high-quality circuit layer on the surface of the plastic encapsulation layer 50 . Then, the plastic sealing layer 50 is ground to form the accommodating portion 53 , and the plastic sealing layer 50 is drilled to form the conductor 22 .
  • the conductor 22 can be made of a metal substance, or a material capable of having electrical conductivity such as conductive glue.
  • the chip packaging process further includes:
  • S60 Provide a third chip 70, and attach the third chip 70 to the circuit layer.
  • the third chip 70 is located on the side of the circuit layer facing away from the substrate 10 , and the end face of the third chip 70 facing away from the circuit layer is its back.
  • the third chip 70 can be flip-chip mounted on the circuit layer.
  • the backside of the third chip 70 can be etched with reference to the manufacturing method of the first chip 40 . , and further chips can be mounted on the third chip 70 .
  • the second chip 60 Since the second chip 60 is electrically connected to the circuit layer through the bonding wire 61 , the second chip 60 can be electrically connected to the third chip 70 . Since the circuit layer is connected to the substrate 10 through the wire bonding chip, the third chip 70 and the substrate 10 can be connected to each other. There is no need to dispose an adapter plate on the plastic encapsulation layer 50 to communicate with the third chip 70 and the first chip 40 , thereby reducing the thickness of the plastic encapsulation.
  • the flip-chip mounting of the third chip 70 on the substrate 10 means that the pins or connection contacts of the third chip 70 are disposed toward the substrate 10, and the third chip 70 is mounted on the corresponding After the mounting position, the third chip 70 is connected to the connection contacts of the mounting position, so that the circuit of the third chip 70 and the substrate 10 is conducted.
  • the end face of the third chip 70 facing away from the substrate 10 is its back.
  • the third chip 70 can also be a flip chip, and the solder balls 30 of the third chip 70 are connected to the connection contacts on the substrate 10 to realize the installation of the third chip 70
  • the chip packaging process further includes:
  • S70 Perform secondary plastic encapsulation on the side of the plastic encapsulation layer 50 facing away from the substrate 10 to encapsulate the second chip 60, the third chip 70 and the circuit layer.
  • the third chip 70 , the second chip 60 and the first chip 40 form an integral plastic packaging body.
  • the surface of the plastic packaging body facing away from the substrate 10 may be ground by referring to step S310 or step S320 , and further chips are mounted on the third chip 70 again. Since no adapter plate is provided in the package body, the overall thickness of the package body can be reduced.
  • the conductive pillars 21 may be arranged on the second chip 60.
  • the circuit layer is fabricated again on the surface of the plastic packaging body formed by the secondary plastic packaging that faces away from the substrate 10, the second The conductive pillars 21 on the chip 60 realize the conduction of the circuit layers.
  • the present application also provides an embodiment of a packaged chip.
  • the packaged chip includes: a substrate 10; a plastic sealing layer 50 disposed on the substrate 10;
  • the chip 40 is flip-chip mounted on the substrate 10 and located in the plastic sealing layer 50 , and the side of the first chip 40 facing away from the substrate 10 is communicated with the accommodating portion 53 ;
  • Two chips 60 are disposed in the accommodating portion 53 and attached to the side of the first chip 40 facing away from the substrate 10 .
  • the plastic encapsulation layer 50 may use an organic metal compound to modify the plastic encapsulation material, and the first chip 40 is encapsulated by the plastic encapsulation layer 50 .
  • the first chip 40 may be a flip chip.
  • the substrate 10 is provided with a circuit layer, a mounting position for mounting the chip is provided on the substrate 10, and the mounting position is provided with connecting contacts such as pads connecting the circuit layer, the first When the chip 40 is mounted on the substrate 10 , it is in conduction with the substrate 10 .
  • the side surface of the first chip 40 facing away from the substrate 10 is its back.
  • the accommodating portion 53 is a concave portion disposed on the side surface of the plastic sealing layer 50 facing away from the substrate 10 .
  • the accommodating portion 53 corresponds to the position of the first chip 40 , so that the The back of the first chip 40 is exposed.
  • the second chip 60 is disposed in the accommodating portion 53 .
  • the second chip 60 and the substrate are The distance between 10 is reduced, thereby reducing the thickness of the entire plastic package.
  • the surface of the plastic layer 50 facing away from the substrate 10 may be ground as a whole to expose the back of the first chip 40 .
  • the backside of the first chip 40 is etched to form the accommodating portion 53 .
  • the plastic sealing layer 50 at the position corresponding to the first chip 40 may also be ground, so that the plastic sealing layer 50 forms an accommodating portion corresponding to the position of the first chip 40 . 53, until the back of the first chip 40 is exposed.
  • the surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole first, so as to reduce the overall thickness of the plastic sealing layer 50 . Then, the plastic sealing layer 50 at the position corresponding to the first chip 40 is ground until the backside of the first chip 40 is exposed. Then, the back of the first chip 40 is etched to reduce the thickness of the first chip 40 and correspondingly increase the depth of the accommodating portion 53, and the second chip 60 is placed on the The backside of the first chip 40 after etching.
  • the packaged chip further includes: a wire bonding chip, which is disposed on the plastic sealing layer 50 and is electrically connected to the substrate 10 ; a bonding wire 61 is connected to the first The two chips 60 are electrically connected; and the circuit layer is disposed on the side of the plastic encapsulation layer 50 facing away from the substrate 10 , and the end of the wire bonding chip away from the substrate 10 is electrically connected to the circuit layer, and the first The two chips 60 are electrically connected to the circuit layer through the bonding wires 61 .
  • the wire bonding chip is used to connect the circuit of the substrate 10 and the circuit layer.
  • the second chip 60 is electrically connected to the circuit layer through the bonding wire 61 , the second chip 60 can also be implemented.
  • the interconnection with the substrate 10 is conducted. Since the first chip 40 is attached to the substrate 10 , the second chip 60 can be electrically connected to the first substrate 10 .
  • the wire bonding chip 201 may be a wire bonding chip 201 attached to the substrate 10 , the wire bonding chip 201 is electrically connected to the substrate 10 through bonding wires, and the wire bonding chip 201 is connected to the substrate 10 through a conductive column 21 .
  • the circuit layers are electrically connected. Since the wire bonding chip 201 itself has its chip function, more chips can be integrated in the plastic package while the substrate 10 and the circuit layer are conducting, so as to improve the integration degree of the plastic package.
  • a third chip 70 can be flip-chip attached on the circuit layer, and then the packaged chip is subjected to secondary plastic sealing. After the secondary plastic encapsulation is completed, the accommodating portion 53 corresponding to the position of the third chip 70 can be set, or the third chip 70 can be continuously etched, and the back of the third chip 70 can be pasted again. set the chip.
  • the mutual conduction between the second chip 60 and the substrate 10 can be achieved, and there is no need to install an existing transfer board on the plastic package again, thereby reducing the size of the packaged chip.
  • the overall thickness Since the second chip 60 is placed on the back of the first chip 40, or after the first chip 40 is etched, the thickness of the first chip 40 is reduced and the second chip 40 is then mounted.
  • the chip 60 makes the space occupied by the second chip 60 in the thickness direction of the packaged chip smaller, which helps to reduce the thickness of the packaged chip.

Abstract

Disclosed in the present application are a chip packaging process and a packaging chip, the chip packaging process comprising the following steps: providing a substrate, a first chip, and a second chip, and attaching the first chip to the substrate; forming a plastic packaging layer on the substrate, the plastic packaging layer plastic-packaging the first chip; processing the plastic packaging layer on a side facing away from the substrate, so as to expose the first chip on a side facing away from the substrate; and attaching the second chip on a side of the first chip facing away from the substrate.

Description

芯片封装工艺及封装芯片Chip packaging process and packaging chips
本申请要求2020年8月27日申请的,申请号为202010884926.7,名称为“芯片封装工艺及封装芯片”的中国专利申请的优先权,在此将其全文引入作为参考。This application claims the priority of the Chinese patent application filed on August 27, 2020, the application number is 202010884926.7, and the title is "Chip Packaging Process and Packaging Chips", which is hereby incorporated by reference in its entirety.
技术领域technical field
本申请涉及半导体封装技术领域,特别涉及一种芯片封装工艺及封装芯片。The present application relates to the technical field of semiconductor packaging, and in particular, to a chip packaging process and a packaging chip.
背景技术Background technique
相关层叠封装技术(Package on Package)生产的叠型集成封装芯片,将芯片贴附在基板上之后,进行塑封,然后再在塑封层上设置基板转接板,在基板转接板上再重新贴置芯片,以实现上下垂直方向上多个芯片的集成封装结构,这样充分利用了垂直空间,不可避免的,封装体厚度会有所增大。For the stacked integrated package chips produced by the related package on package technology, after the chips are attached to the substrate, plastic sealing is performed, and then a substrate adapter plate is set on the plastic sealing layer, and then the substrate adapter plate is re-attached. Chips are placed to realize an integrated package structure of multiple chips in the vertical direction, which makes full use of the vertical space, and inevitably, the thickness of the package body will increase.
技术问题technical problem
本申请的主要目的是提出一种芯片封装工艺及封装芯片,旨在改善相关的集成封装芯片厚度大的问题。The main purpose of the present application is to propose a chip packaging process and a packaged chip, aiming at improving the related problem of the large thickness of the integrated packaged chip.
技术解决方案technical solutions
为实现上述目的,本申请提出的芯片封装工艺,包括如下步骤:In order to achieve the above purpose, the chip packaging process proposed by the present application includes the following steps:
提供基板、第一芯片和第二芯片,将所述第一芯片贴置于所述基板上;providing a substrate, a first chip and a second chip, and attaching the first chip on the substrate;
于所述基板上形成塑封层,所述塑封层将所述第一芯片塑封;forming a plastic encapsulation layer on the substrate, and the plastic encapsulation layer encapsulates the first chip;
对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露;processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate;
将所述第二芯片贴置于所述第一芯片背向所述基板的一侧。The second chip is attached to the side of the first chip facing away from the substrate.
在一实施例中,所述对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露的步骤包括:In one embodiment, the step of processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate includes:
研磨所述塑封层背向所述基板的一侧,以使研磨后的所述第一芯片背向所述基板的一侧表面与所述塑封层背向所述基板的一侧表面在同一平面上,以将所述第一芯片背向所述基板的一侧裸露。grinding the side of the plastic sealing layer facing away from the substrate, so that the surface of the side of the ground first chip facing away from the substrate and the surface of the plastic sealing layer facing away from the substrate are on the same plane to expose the side of the first chip facing away from the substrate.
在一实施例中,所述对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露的步骤包括:In one embodiment, the step of processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate includes:
研磨与所述第一芯片所在位置相对应的所述塑封层,将所述第一芯片背向所述基板的一侧裸露。The plastic sealing layer corresponding to the position of the first chip is ground, and the side of the first chip facing away from the substrate is exposed.
在一实施例中,在执行将所述第一芯片背向所述基板的一侧裸露的步骤之后,所述芯片封装工艺还包括:In one embodiment, after performing the step of exposing the side of the first chip away from the substrate, the chip packaging process further includes:
刻蚀所述第一芯片背向所述基板的一侧,以使研磨后的所述第一芯片背向所述基板的一侧表面与所述基板之间的距离小于所述塑封层背向所述基板的一侧表面与所述基板之间的距离。etching the side of the first chip facing away from the substrate, so that the distance between the surface of the ground side of the first chip facing away from the substrate and the substrate is smaller than the distance between the surface of the first chip facing away from the substrate and the substrate facing away from the plastic sealing layer The distance between one side surface of the substrate and the substrate.
在一实施例中,在执行对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露的步骤之后,所述芯片封装工艺还包括:In one embodiment, after the step of processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate, the chip packaging process further includes: include:
于所述塑封层背向所述基板的一侧形成电路层,所述基板通过打线芯片与所述电路层电连接,所述第二芯片通过焊线与所述电路层电连接。A circuit layer is formed on the side of the plastic packaging layer facing away from the substrate, the substrate is electrically connected to the circuit layer through a wire bonding chip, and the second chip is electrically connected to the circuit layer through a bonding wire.
在一实施例中,所述于所述塑封层背向所述基板的一侧形成电路层的步骤包括:In one embodiment, the step of forming a circuit layer on the side of the plastic encapsulation layer facing away from the substrate includes:
于所述塑封层背向所述基板的一侧形成种子层;以及forming a seed layer on the side of the plastic encapsulation layer facing away from the substrate; and
于所述塑封层背向所述基板的一侧形成所述电路层。The circuit layer is formed on the side of the plastic encapsulation layer facing away from the substrate.
在一实施例中,所述塑封层为有机金属复合物改性塑封料,通过激光照射使所述塑封层背向所述基板的一侧活化形成所述种子层。In one embodiment, the plastic sealing layer is an organic metal compound modified plastic sealing compound, and the side of the plastic sealing layer facing away from the substrate is activated by laser irradiation to form the seed layer.
在一实施例中,在执行所述通过激光照射使所述塑封层背向所述基板的一侧活化形成所述种子层的步骤之前还包括:In an embodiment, before performing the step of activating the side of the plastic encapsulation layer facing away from the substrate by laser irradiation to form the seed layer, the method further includes:
在所述塑封层背向所述基板的一侧施加掩膜层,所述掩膜层设有与所述电路层的电路图案相对应的透光部。A mask layer is applied on the side of the plastic sealing layer facing away from the substrate, and the mask layer is provided with a light-transmitting portion corresponding to the circuit pattern of the circuit layer.
在一实施例中,所述基板通过打线芯片与所述电路层电连接的步骤包括:In one embodiment, the step of electrically connecting the substrate to the circuit layer through a wire bonding chip includes:
提供打线芯片,所述打线芯片与所述基板电连接,所述塑封层将所述打线芯片塑封,所述打线芯片具有导电柱,研磨所述塑封层,以使所述导电柱裸露,将所述导电柱与所述电路层电连接;或者A wire-bonding chip is provided, the wire-bonding chip is electrically connected to the substrate, the wire-bonding chip is plastic-sealed by the plastic sealing layer, and the wire-bonding chip has conductive posts, and the plastic sealing layer is ground to make the conductive posts Exposing, electrically connecting the conductive post with the circuit layer; or
提供打线芯片,所述打线芯片与所述基板电连接,所述塑封层将所述打线芯片塑封,所述打线芯片具有导电柱,对所述塑封层进行钻孔,以使所述导电柱裸露,在所述钻孔内填充导体,通过所述导体将所述导电柱与所述电路层电连接。A wire-bonding chip is provided, the wire-bonding chip is electrically connected to the substrate, the wire-bonding chip is plastic-sealed by the plastic sealing layer, the wire-bonding chip has conductive posts, and the plastic sealing layer is drilled so that the The conductive posts are exposed, and conductors are filled in the drilled holes, and the conductive posts are electrically connected to the circuit layer through the conductors.
在一实施例中,所述打线芯片通过连接导线与所述基板电连接,所述打线芯片与所述电路层电连接。In one embodiment, the wire bonding chip is electrically connected to the substrate through connecting wires, and the wire bonding chip is electrically connected to the circuit layer.
在一实施例中,在执行所述第二芯片通过焊线与所述电路层电连接的步骤之后,所述芯片封装工艺之后还包括:In one embodiment, after performing the step of electrically connecting the second chip with the circuit layer through bonding wires, the chip packaging process further includes:
提供第三芯片,将所述第三芯片贴置于所述电路层。A third chip is provided, and the third chip is attached to the circuit layer.
在一实施例中,在执行提供第三芯片,将所述第三芯片倒装贴置于所述电路层的步骤之后,所述芯片封装工艺还包括:In one embodiment, after the step of providing a third chip and flip-chip attaching the third chip to the circuit layer, the chip packaging process further includes:
在所述塑封层背向所述基板的一侧进行二次塑封,以将所述第二芯片、第三芯片以及所述电路层进行塑封。Secondary plastic sealing is performed on the side of the plastic sealing layer facing away from the substrate, so as to perform plastic sealing of the second chip, the third chip and the circuit layer.
本申请还提出一种封装芯片,包括:The present application also proposes a packaged chip, comprising:
基板;substrate;
塑封层,设于所述基板上,所述塑封层背向所述基板的一侧凹设有容置部;a plastic encapsulation layer, disposed on the substrate, and a accommodating portion is recessed on the side of the plastic encapsulation layer facing away from the substrate;
第一芯片,贴置于所述基板上,并位于所述塑封层内,所述第一芯片背向所述基板的一侧与所述容置部相连通;以及a first chip, which is attached to the substrate and located in the plastic encapsulation layer, and the side of the first chip facing away from the substrate is communicated with the accommodating portion; and
第二芯片,设于所述容置部内,并贴置于所述第一芯片背向所述基板的一侧。The second chip is disposed in the accommodating portion and attached to the side of the first chip facing away from the substrate.
在一实施例中,所述封装芯片还包括:In one embodiment, the packaged chip further includes:
打线芯片,设于所述塑封层,并与所述基板电连接;a wire bonding chip, which is arranged on the plastic sealing layer and is electrically connected to the substrate;
焊线,与所述第二芯片电连接;以及bonding wires, electrically connected to the second chip; and
电路层,设于所述塑封层背向所述基板的一侧,所述打线芯片与所述电路层电连接,所述第二芯片通过所述焊线与所述电路层电连接。The circuit layer is arranged on the side of the plastic sealing layer facing away from the substrate, the wire bonding chip is electrically connected to the circuit layer, and the second chip is electrically connected to the circuit layer through the bonding wire.
有益效果beneficial effect
本申请技术方案通过将第一芯片进行塑封之后,通过研磨将第一芯片的背部裸露,当将第二芯片贴置在第一芯片的背部上时,基板和第二芯片之间的距离减小,实现减小封装后的整体芯片的厚度。The technical solution of the present application is to expose the back of the first chip by grinding after the first chip is plastic-sealed. When the second chip is placed on the back of the first chip, the distance between the substrate and the second chip is reduced. , to reduce the thickness of the overall chip after encapsulation.
附图说明Description of drawings
为了更清楚地说明本申请实施例或现有技术中的技术方案,下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图示出的结构获得其他的附图。In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the accompanying drawings that are used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only These are some embodiments of the present application. For those of ordinary skill in the art, other drawings can also be obtained according to the structures shown in these drawings without any creative effort.
图1为本申请芯片封装工艺一实施例的流程示意图;FIG. 1 is a schematic flowchart of an embodiment of a chip packaging process of the present application;
图2为本申请研磨塑封层一实施例的流程示意图;FIG. 2 is a schematic flowchart of an embodiment of grinding a plastic sealing layer of the present application;
图3为本申请研磨塑封层另一实施例的流程示意图;FIG. 3 is a schematic flowchart of another embodiment of grinding the plastic sealing layer of the present application;
图4为本申请刻蚀第一芯片一实施例的流程示意图FIG. 4 is a schematic flowchart of etching the first chip according to an embodiment of the present application
图5为本申请步骤S50一实施例的流程示意图;FIG. 5 is a schematic flowchart of an embodiment of step S50 of the present application;
图6为本申请形成电路层一实施例的流程示意图;FIG. 6 is a schematic flowchart of forming a circuit layer according to an embodiment of the present application;
图7为本申请基板与电路层连接一实施例的流程示意图;7 is a schematic flowchart of an embodiment of the connection between the substrate and the circuit layer of the present application;
图8为本申请基板与电路层连接另一实施例的流程示意图;8 is a schematic flowchart of another embodiment of the connection between the substrate and the circuit layer of the present application;
图9为本申请步骤S60一实施例的流程示意图;FIG. 9 is a schematic flowchart of an embodiment of step S60 of the present application;
图10为本申请封装芯片一实施例的结构示意图;10 is a schematic structural diagram of an embodiment of a packaged chip of the present application;
图11为本申请形成封装芯片一实施例的流程示意图;FIG. 11 is a schematic flowchart of forming a packaged chip according to an embodiment of the present application;
图12为本申请形成封装芯片另一实施例的流程示意图。FIG. 12 is a schematic flowchart of forming a packaged chip according to another embodiment of the present application.
附图标号说明:Description of reference numbers:
标号 label 名称 name 标号 label 名称 name
10 10 基板 substrate 201 201 打线芯片 wire chip
202 202 连接导线 connecting wires 21 twenty one 导电柱 Conductive pillar
22 twenty two 导体 conductor 30 30 锡球 Solder balls
40 40 第一芯片 first chip 50 50 塑封层 Plastic layer
51 51 种子层 seed layer 52 52 掩膜层 mask layer
53 53 容置部 accommodating part 60 60 第二芯片 second chip
61 61 焊线 welding wire 70 70 第三芯片 third chip
80 80 激光设备 Laser equipment        
本申请目的的实现、功能特点及优点将结合实施例,参照附图做进一步说明。The realization, functional characteristics and advantages of the purpose of the present application will be further described with reference to the accompanying drawings in conjunction with the embodiments.
本发明的实施方式Embodiments of the present invention
下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请的一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present application.
需要说明,若本申请实施例中有涉及方向性指示(诸如上、下、左、右、前、后……),则该方向性指示仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。It should be noted that if there are directional indications (such as up, down, left, right, front, back, etc.) involved in the embodiments of the present application, the directional indications are only used to explain a certain posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication also changes accordingly.
另外,若本申请实施例中有涉及“第一”、“第二”等的描述,则该“第一”、“第二”等的描述仅用于描述目的,而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。另外,各个实施例之间的技术方案可以相互结合,但是必须是以本领域普通技术人员能够实现为基础,当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在,也不在本申请要求的保护范围之内。In addition, if there are descriptions related to "first", "second", etc. in the embodiments of the present application, the descriptions of "first", "second", etc. are only for the purpose of description, and should not be construed as indicating or implying Its relative importance or implicitly indicates the number of technical features indicated. Thus, a feature delimited with "first", "second" may expressly or implicitly include at least one of that feature. In addition, the technical solutions between the various embodiments can be combined with each other, but must be based on the realization by those of ordinary skill in the art. When the combination of technical solutions is contradictory or cannot be realized, it should be considered that the combination of such technical solutions does not exist. , is not within the scope of protection claimed in this application.
请参阅图1,本申请提出一种芯片封装工艺,包括如下步骤:Referring to FIG. 1, the present application proposes a chip packaging process, including the following steps:
S10:提供基板10、第一芯片40和第二芯片60,将所述第一芯片40贴置于所述基板10上。S10 : providing the substrate 10 , the first chip 40 and the second chip 60 , and attaching the first chip 40 on the substrate 10 .
所述基板10上设有电路,所述基板10上具有与所述第一芯片40相对应的安装位,所述安装位具有连接基板10中的电路的连接触点。所述第一芯片40可以倒装贴置于所述基板10上,以使所述第一芯片40的引脚或连接触点朝向所述基板10设置,所述第一芯片40安装在对应的所述安装位上之后,所述第一芯片40与所述安装位的连接触点相互连接,以使所述第一芯片40与所述基板10的电路导通。所述第一芯片40背向所述基板10的一侧端面为其背部。所述第一芯片40可以为倒装芯片(Flip Chip Die),将其锡球30与基板10上的连接触点相互连接,实现所述第一芯片40的贴装。Circuits are provided on the substrate 10 , and mounting positions corresponding to the first chips 40 are provided on the substrate 10 , and the mounting positions have connection contacts for connecting the circuits in the substrate 10 . The first chip 40 can be flip-chip mounted on the substrate 10, so that the pins or connection contacts of the first chip 40 are disposed toward the substrate 10, and the first chip 40 is mounted on the corresponding substrate 10. After the mounting position, the first chip 40 is connected to the connection contacts of the mounting position, so that the circuit between the first chip 40 and the substrate 10 is conducted. The end face of the first chip 40 facing away from the substrate 10 is its back. The first chip 40 may be a flip chip. Chip Die), the solder balls 30 are connected to the connection contacts on the substrate 10 to realize the mounting of the first chip 40 .
S20:于所述基板10上形成塑封层50,所述塑封层50将所述第一芯片40塑封。S20 : forming a plastic encapsulation layer 50 on the substrate 10 , and the plastic encapsulation layer 50 encapsulates the first chip 40 in plastic.
通过塑封材料在所述基板10上形成所述塑封层50,所述第一芯片40被塑封在所述塑封层50内。The plastic encapsulation layer 50 is formed on the substrate 10 by using a plastic encapsulation material, and the first chip 40 is encapsulated in the plastic encapsulation layer 50 .
S30:对所述塑封层50背向所述基板10的一侧进行加工,以将所述第一芯片40背向所述基板10的一侧裸露。S30 : Process the side of the plastic sealing layer 50 facing away from the substrate 10 to expose the side of the first chip 40 facing away from the substrate 10 .
在将所述第一芯片40进行塑封之后,对所述塑封层进行加工,使所述第一芯片40背向所述基板10的一侧的塑封层50被除去,以使所述第一芯片40背向所述基本10的一侧形成可以用于容置第二芯片60的空间。After the first chip 40 is plastic-sealed, the plastic-sealing layer is processed so that the plastic-sealing layer 50 on the side of the first chip 40 facing away from the substrate 10 is removed, so that the first chip 40 is removed. The side of 40 facing away from the base 10 forms a space that can be used for accommodating the second chip 60 .
S40:将所述第二芯片60贴置于所述第一芯片40背向所述基板10的一侧。S40 : Attach the second chip 60 to the side of the first chip 40 facing away from the substrate 10 .
请结合参阅图10,通过研磨所述塑封层50,使所述第一芯片40的背向所述基板的一侧裸露,将所述第二芯片60的背部贴置于所述第一芯片40的背向所述基板的一侧,所述第二芯片60的连接触点背向所述基板10设置。Please refer to FIG. 10 , by grinding the plastic sealing layer 50 , the side of the first chip 40 facing away from the substrate is exposed, and the back of the second chip 60 is attached to the first chip 40 On the side facing away from the substrate, the connection contacts of the second chip 60 are arranged away from the substrate 10 .
当将所述第二芯片60贴置于所述第一芯片40的背部时,所述第二芯片60、所述塑封层50以及所述基板10形成封装体。相比现有的直接在完成塑封之后,将所述第二芯片60贴装在所述塑封层50表面的方式,由于经过研磨以及刻蚀加工之后,所述第二芯片60背向所述基板10的一侧与所述基板10的距离会相对减小,进而使得封装体的整体厚度减小。When the second chip 60 is attached to the back of the first chip 40 , the second chip 60 , the plastic sealing layer 50 and the substrate 10 form a package body. Compared with the existing method of directly mounting the second chip 60 on the surface of the plastic sealing layer 50 after the plastic packaging is completed, the second chip 60 faces away from the substrate after grinding and etching. The distance between one side of the 10 and the substrate 10 is relatively reduced, thereby reducing the overall thickness of the package body.
由于在对芯片进行封装时,生成的封装体的整体厚度中,芯片本身的厚度占很大一部分,通过采用将第一芯片40倒装贴置在基板10上,能够利用第一芯片40的背部空间来实现对封装体内部空间的充分利用。将第二芯片60贴置在第一芯片40上时,可以减小芯片之间的距离,实现减小封装体的整体厚度,可以减少SIP(System In a Package,系统级封装)封装空间,实现SIP更小型化;由于可以减小第一芯片40在封装体的总厚度中所占的比例,使贴附第二芯片60的空间相对更多,进而可以在塑封体内集成更多的芯片,达到更高密度要求。When the chip is packaged, the thickness of the chip itself accounts for a large part of the overall thickness of the generated package. By flip-chip mounting the first chip 40 on the substrate 10, the backside of the first chip 40 can be utilized. space to make full use of the internal space of the package. When the second chip 60 is placed on the first chip 40, the distance between the chips can be reduced, the overall thickness of the package body can be reduced, the SIP (System In a Package, system-in-package) packaging space can be reduced, and the The SIP is more miniaturized; since the proportion of the first chip 40 in the total thickness of the package can be reduced, the space for attaching the second chip 60 can be relatively more, and more chips can be integrated in the plastic package to achieve higher density requirements.
在形成所述塑封层50时,可以在所述基板10上设置焊线等作为连接结构,将连接结构部分塑封于所述塑封层50内,部分伸出所述塑封层50并与所述第二芯片60电连接,进而实现通过连接结构将所述第二芯片60与所述基板10电连接,以使实现所述第一芯片40与所述第二芯片60之间的相互导通。也可以采用其他方式实现所述第二芯片60与所述基板10之间的导通。When forming the plastic sealing layer 50 , a bonding wire or the like may be provided on the substrate 10 as a connecting structure, and part of the connecting structure is plastic-sealed in the plastic sealing layer 50 , and part of the connecting structure protrudes from the plastic sealing layer 50 and is connected with the first plastic sealing layer 50 . The two chips 60 are electrically connected, so that the second chip 60 and the substrate 10 are electrically connected through a connection structure, so as to realize the mutual conduction between the first chip 40 and the second chip 60 . The conduction between the second chip 60 and the substrate 10 may also be achieved in other manners.
请参阅图2,在本申请的一个实施例中,所述步骤S30包括:Referring to FIG. 2, in an embodiment of the present application, the step S30 includes:
S310:研磨所述塑封层50背向所述基板10的一侧,以使研磨后的所述第一芯片40背向所述基板10的一侧表面与所述塑封层50背向所述基板10的一侧表面在同一平面上,以将所述第一芯片40背向所述基板10的一侧裸露。S310 : grinding the side of the plastic sealing layer 50 facing away from the substrate 10 so that the ground surface of the first chip 40 facing away from the substrate 10 and the plastic sealing layer 50 facing away from the substrate One side of the surface of the first chip 40 is on the same plane, so that the side of the first chip 40 facing away from the substrate 10 is exposed.
请结合参阅图11,在对所述塑封层50背向所述基板10的一侧进行研磨时,由于所述第一芯片40被塑封在所述塑封层50内,可以对所述塑封层50的整个表面进行研磨,以使所述塑封层50的整体厚度减小,直到所述第一芯片40的背部裸露。Please refer to FIG. 11 , when the side of the plastic sealing layer 50 facing away from the substrate 10 is ground, since the first chip 40 is plastically sealed in the plastic sealing layer 50 , the plastic sealing layer 50 can be The entire surface of the first chip 40 is ground to reduce the overall thickness of the plastic encapsulation layer 50 until the backside of the first chip 40 is exposed.
通过对所述塑封层50的整体进行研磨,能够方便研磨加工定位,方便对研磨加工的控制。由于对所述塑封层50整体进行打磨,使得所述塑封层50背向所述基板10的一侧端面与所述基板10之间的距离减小,在对封装体进行再次贴装时,所贴装形成的整体结构的厚度也相对减小。如在所述塑封层50上形成重新布线层,并生成电路层时,电路层与基板10之间的距离减小,当在电路层上再次贴装芯片时,所形成的封装体的厚度减小。对所述塑封层50背向所述基板10的一侧进行研磨的方法,可以参考现有技术。By grinding the whole of the plastic sealing layer 50 , the positioning of the grinding process can be facilitated, and the control of the grinding process can be facilitated. Due to the overall grinding of the plastic encapsulation layer 50, the distance between the end face of the plastic encapsulation layer 50 facing away from the substrate 10 and the substrate 10 is reduced. The thickness of the overall structure formed by mounting is also relatively reduced. For example, when a rewiring layer is formed on the plastic packaging layer 50 and a circuit layer is formed, the distance between the circuit layer and the substrate 10 is reduced, and when the chip is mounted on the circuit layer again, the thickness of the formed package body is reduced. little. For the method of grinding the side of the plastic sealing layer 50 facing away from the substrate 10, reference may be made to the prior art.
请参阅图3,在本申请的另一个实施例中,所述步骤S30包括:Referring to FIG. 3, in another embodiment of the present application, the step S30 includes:
S320:研磨与所述第一芯片40所在位置相对应的所述塑封层50,将所述第一芯片40背向所述基板10的一侧裸露。S320 : Grinding the plastic encapsulation layer 50 corresponding to the position of the first chip 40 to expose the side of the first chip 40 facing away from the substrate 10 .
请结合参阅图12,在研磨所述塑封层50时,仅研磨与所述第一芯片40对应位置的塑封层50,以使所述塑封层50上形成与所述第一芯片40的背部相对应内凹部位,直到所述第一芯片40的背部裸露,所述内凹部位为容置所述第二芯片60的容置部53。由于在进行研磨时,仅研磨与所述第一芯片40的对应位置的塑封层50,所需研磨的面积相对减小,进而可以减小研磨加工的工作量。Please refer to FIG. 12 , when grinding the plastic encapsulation layer 50 , only the plastic encapsulation layer 50 corresponding to the first chip 40 is ground, so that the plastic encapsulation layer 50 is formed on the plastic encapsulation layer 50 which is opposite to the back of the first chip 40 . Corresponding to the concave portion until the back of the first chip 40 is exposed, the concave portion is the accommodating portion 53 for accommodating the second chip 60 . Since only the plastic encapsulation layer 50 corresponding to the first chip 40 is ground during grinding, the required grinding area is relatively reduced, thereby reducing the grinding workload.
在本实施例中,也可以先对所述塑封层50背向所述基板10的一侧表面进行整体研磨,在减小所述塑封层50的整体厚度之后,对所述第一芯片40所在位置相对应的塑封层50继续进行研磨,直到所述第一芯片40的背部裸露。此时所述塑封层50的整体厚度减小,当将所述第二芯片60贴置于所述第一芯片40的背部之后,在所述塑封层50上形成重新布线层时,所形成的封装体的整体厚度减小。In this embodiment, the surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole first, and after the overall thickness of the plastic sealing layer 50 is reduced, the first chip 40 is The plastic sealing layer 50 corresponding to the position continues to be ground until the backside of the first chip 40 is exposed. At this time, the overall thickness of the plastic sealing layer 50 is reduced. When the second chip 60 is placed on the back of the first chip 40 and a rewiring layer is formed on the plastic sealing layer 50, the resulting The overall thickness of the package body is reduced.
请参阅图4,在本申请的一个实施例中,在执行步骤S30之后,所述芯片封装工艺还包括:Referring to FIG. 4, in an embodiment of the present application, after step S30 is performed, the chip packaging process further includes:
S330:刻蚀所述第一芯片40背向所述基板10的一侧,以使研磨后的所述第一芯片40背向所述基板10的一侧表面与所述基板10之间的距离小于所述塑封层50背向所述基板10的一侧表面与所述基板10之间的距离。S330 : Etch the side of the first chip 40 facing away from the substrate 10 , so that the distance between the surface of the ground side of the first chip 40 facing away from the substrate 10 and the substrate 10 It is smaller than the distance between the side surface of the plastic sealing layer 50 facing away from the substrate 10 and the substrate 10 .
请结合参阅图11和图12,采用氢氟酸对所述第一芯片40的背部进行刻蚀,以使所述第一芯片40背向所述基板10的一侧与所述基板10之间的距离减小,进而使得所述第一芯片40所在的位置处,所述容置部53的深度增大。在对所述第一芯片40进行刻蚀时,以不影响所述第一芯片40的内部电路为宜。当所述第二芯片60贴置于所述第一芯片40的背部时,所述第二芯片60背向所述基板10的一侧的与所述基板10的距离相对减小,进而可以减小封装体的整体厚度。Please refer to FIG. 11 and FIG. 12 , the backside of the first chip 40 is etched with hydrofluoric acid, so that the side of the first chip 40 facing away from the substrate 10 is between the substrate 10 . The distance between them decreases, so that at the position where the first chip 40 is located, the depth of the accommodating portion 53 increases. When the first chip 40 is etched, it is preferable not to affect the internal circuit of the first chip 40 . When the second chip 60 is attached to the back of the first chip 40, the distance between the side of the second chip 60 facing away from the substrate 10 and the substrate 10 is relatively reduced, thereby reducing the distance between the second chip 60 and the substrate 10. The overall thickness of the small package.
所述第一芯片40的刻蚀厚度可以在0至1000微米之间,以所述第一芯片40采用倒装芯片为例,倒装芯片的研磨后的厚度通常为50至500微米,而芯片中的电路的厚度通常在10微米左右。通过减小所述第一芯片40的整体厚度,能够为所述第二芯片60提供更大的容置空间。对所述第一芯片40的刻蚀厚度可以根据第一芯片40的具体情况来确定,以不影响所述第一芯片40的内部电路为宜。The etching thickness of the first chip 40 may be between 0 and 1000 microns. Taking a flip chip as an example for the first chip 40, the thickness of the flip chip after grinding is usually 50 to 500 microns, while the thickness of the flip chip is usually 50 to 500 microns. The thickness of the circuits in is usually around 10 microns. By reducing the overall thickness of the first chip 40 , a larger accommodating space can be provided for the second chip 60 . The etching thickness of the first chip 40 can be determined according to the specific conditions of the first chip 40 , and it is preferable that the internal circuit of the first chip 40 is not affected.
在本实施例中,也可以先对所述塑封层50背向所述基板10的一侧表面进行整体研磨,在减小所述塑封层50的整体厚度之后,对所述第一芯片40所在位置相对应的塑封层50继续进行研磨,直到所述第一芯片40的背部裸露。然后再执行步骤S330,对所述第一芯片40的背部进行刻蚀,以减小所述第一芯片40的厚度。In this embodiment, the surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole first, and after the overall thickness of the plastic sealing layer 50 is reduced, the first chip 40 is The plastic encapsulation layer 50 corresponding to the position continues to be ground until the backside of the first chip 40 is exposed. Then, step S330 is performed to etch the back of the first chip 40 to reduce the thickness of the first chip 40 .
请参阅图5,在本申请的一个实施例中,在执行步骤S30之后,所述芯片封装工艺还包括:Referring to FIG. 5, in an embodiment of the present application, after step S30 is performed, the chip packaging process further includes:
S50:于所述塑封层50背向所述基板10的一侧形成电路层,所述基板10通过打线芯片201与所述电路层电连接,所述第二芯片60通过焊线61与所述电路层电连接。S50 : forming a circuit layer on the side of the plastic encapsulation layer 50 facing away from the substrate 10 , the substrate 10 is electrically connected to the circuit layer through the wire bonding chip 201 , and the second chip 60 is connected to the circuit layer through the bonding wire 61 . The circuit layers are electrically connected.
请结合参阅图11和图12,所述第二芯片60和所述电路层形成第二层电路结构。所述打线芯片201用于将所述基板10和所述电路层相互导通,所述第一芯片40贴置于所述基板10上,可以实现所述电路层与所述第一芯片40的相互导通。所述焊线61用于实现所述第二芯片60和所述电路层之间的导通,进而可以与所述第一芯片40相互导通。Please refer to FIG. 11 and FIG. 12 in combination, the second chip 60 and the circuit layer form a second-layer circuit structure. The wire bonding chip 201 is used to connect the substrate 10 and the circuit layer to each other, and the first chip 40 is attached to the substrate 10 to realize the circuit layer and the first chip 40 mutual conduction. The bonding wire 61 is used to realize the conduction between the second chip 60 and the circuit layer, and thus can be in conduction with the first chip 40 .
通过形成所述电路层,使所述电路层能够用于所述第二芯片60和所述第一芯片40之间导通,进而不需要单独设置转接板,以改善现有的封装体中转接板设置导致的封装体整体厚度增加的问题。By forming the circuit layer, the circuit layer can be used for conduction between the second chip 60 and the first chip 40 , so that it is not necessary to provide a separate adapter board, so as to improve the performance of the existing package. The problem of increasing the overall thickness of the package caused by the arrangement of the adapter plate.
所述打线芯片201通过所述连接导线202与所述基板10电连接,所述打线芯片201与所述电路层电连接。所述打线芯片201可以用于连接所述电路层和所述基板10,其本身也具有自身的芯片功能。The wire bonding chip 201 is electrically connected to the substrate 10 through the connecting wires 202 , and the wire bonding chip 201 is electrically connected to the circuit layer. The wire bonding chip 201 can be used to connect the circuit layer and the substrate 10, and also has its own chip function.
由于打线芯片201研磨后的厚度通常为30至500微米,其中,内部的电路的厚度通常为10微米,通过采用打线芯片201,能够起到芯片本身的功能,通过将其集成在所述塑封体内,以提高SIP的封装密度。所述连接导线202也可以采用焊线。如图中所示仅为两个第一芯片40和一个打线芯片201,仅为塑封体的局部结构,在实际加工中,可以在所述基板10上贴置多个所述第一芯片40和所述打线芯片201,在此不做限制。Since the thickness of the wire-bonding chip 201 after grinding is usually 30 to 500 microns, the thickness of the internal circuit is usually 10 microns. By using the wire-bonding chip 201, the function of the chip itself can be played. Plastic body to improve the packing density of SIP. The connecting wire 202 can also be a bonding wire. As shown in the figure, there are only two first chips 40 and one wire bonding chip 201 , which are only partial structures of the plastic package. In actual processing, a plurality of the first chips 40 may be placed on the substrate 10 . and the wire bonding chip 201, which are not limited here.
请参阅图6,在本申请的一个实施例中,所述于所述塑封层50背向所述基板10的一侧形成电路层的步骤包括:Referring to FIG. 6 , in an embodiment of the present application, the step of forming a circuit layer on the side of the plastic encapsulation layer 50 facing away from the substrate 10 includes:
S510:于所述塑封层50背向所述基板10的一侧形成种子层51。S510 : forming a seed layer 51 on the side of the plastic sealing layer 50 facing away from the substrate 10 .
S511:于所述塑封层50背向所述基板10的一侧形成所述电路层。S511 : forming the circuit layer on the side of the plastic sealing layer 50 facing away from the substrate 10 .
请结合参阅图11和图12,由于在形成电路层时,先刻蚀出线路图形,所述种子层51形成线路图案。通过形成所述种子层51,在形成所述电路层时,能够提高所述电路层与所述塑封层50之间的结合力,有助于提升封装体的质量。Please refer to FIG. 11 and FIG. 12 in combination. When the circuit layer is formed, the circuit pattern is first etched, and the seed layer 51 forms the circuit pattern. By forming the seed layer 51, when the circuit layer is formed, the bonding force between the circuit layer and the plastic encapsulation layer 50 can be improved, and the quality of the package body can be improved.
当采用化镀工艺时,依据氧化还原反应原理,利用强还原剂在含有金属离子的溶液中,将金属离子沉积在种子层51的表面形成所述电路层的图案。When the electroless plating process is adopted, according to the principle of redox reaction, a strong reducing agent is used in a solution containing metal ions to deposit metal ions on the surface of the seed layer 51 to form the pattern of the circuit layer.
在进行化镀工艺时,为了提高化镀后的电路平整度,可以先对所述塑封层50背向所述基板10的一侧表面进行研磨。也可以在研磨形成所述容置部53的过程中,同步对所述塑封层50进行研磨。During the electroless plating process, in order to improve the circuit flatness after electroless plating, the surface of the side of the plastic encapsulation layer 50 facing away from the substrate 10 may be ground first. In the process of grinding to form the accommodating portion 53 , the plastic sealing layer 50 may also be ground simultaneously.
当采用电镀时,在形成铜线路时,需要形成一层铜种子层51用于导电。当电源加在铜(阳极)和硅片(阴极)之间时,阳极的铜发生反应转化成铜离子和电子,同时阴极也发生反应,阴极附近种子层51表面的铜离子与电子结合形成镀在种子层51表面的铜,以形成线路,进而形成所述电路层。When electroplating is used, a copper seed layer 51 needs to be formed for conduction when forming the copper circuit. When the power supply is applied between the copper (anode) and the silicon wafer (cathode), the copper in the anode reacts and converts into copper ions and electrons, and the cathode also reacts, and the copper ions on the surface of the seed layer 51 near the cathode combine with the electrons to form a plating Copper on the surface of the seed layer 51 to form a circuit, thereby forming the circuit layer.
本实施例中可选地,所述塑封层50为有机金属复合物改性塑封料,通过激光照射使所述塑封层50背向所述基板10的一侧活化形成所述种子层51。所述有机金属复合物改性塑封料中含有金属离子,经过激光照射后,能够释放出离子,进而形成导电的种子层51。In this embodiment, optionally, the plastic sealing layer 50 is an organic metal compound modified plastic sealing compound, and the side of the plastic sealing layer 50 facing away from the substrate 10 is activated by laser irradiation to form the seed layer 51 . The organometallic compound modified plastic sealant contains metal ions, and after being irradiated by a laser, the ions can be released to form a conductive seed layer 51 .
由于可以通过激光设备80产生激光照射在所述塑封层50表面形成种子层51,可以方便进行后续的电路层制作,同时不需要在所述塑封层50上设置用于导通第一芯片40和第二芯片60的转接板,进而减小塑封体的整体厚度。Since the seed layer 51 can be formed on the surface of the plastic encapsulation layer 50 by laser irradiation generated by the laser device 80 , the subsequent circuit layer fabrication can be facilitated, and at the same time, there is no need to provide a device on the plastic encapsulation layer 50 for conducting the first chip 40 and the The adapter plate of the second chip 60 further reduces the overall thickness of the plastic package.
为了形成电路图案,本实施例中可选地,在执行所述通过激光照射使所述塑封层50背向所述基板10的一侧活化形成所述种子层51的步骤之前,在所述塑封层50背向所述基板10的一侧施加掩膜层52,所述掩膜层52设有与所述电路层的电路图案相对应的透光部。所述掩膜层52用于阻挡激光,以使激光仅能够按照预设位置照射到所述塑封层50上。所述透光部用于供激光穿过,以使激光能够作用于所述塑封层50背向所述基板10的一侧表面,进而形成所述种子层51。由于所述透光部与所述电路层的线路图案相一致,经过激光照射后所形成的所述种子层51的图案与所述电路层的线路图案相同。In order to form a circuit pattern, in this embodiment, optionally, before performing the step of activating the side of the plastic encapsulation layer 50 facing away from the substrate 10 by laser irradiation to form the seed layer 51 A mask layer 52 is applied to the side of the layer 50 facing away from the substrate 10 , and the mask layer 52 is provided with a light-transmitting portion corresponding to the circuit pattern of the circuit layer. The mask layer 52 is used to block the laser light, so that the laser light can only be irradiated on the plastic sealing layer 50 according to a preset position. The light-transmitting portion is used for laser light to pass through, so that the laser light can act on the surface of the plastic sealing layer 50 facing away from the substrate 10 to form the seed layer 51 . Since the light-transmitting portion is consistent with the circuit pattern of the circuit layer, the pattern of the seed layer 51 formed after laser irradiation is the same as the circuit pattern of the circuit layer.
请参阅图7,在本申请的一个实施例中,所述基板10通过打线芯片与所述电路层电连接的步骤包括:Referring to FIG. 7, in an embodiment of the present application, the step of electrically connecting the substrate 10 to the circuit layer through a wire bonding chip includes:
S520:提供打线芯片,所述打线芯片与所述基板10电连接,所述塑封层50将所述打线芯片塑封,所述打线芯片具有导电柱21,研磨所述塑封层50,以使所述导电柱21裸露,将所述导电柱21与所述电路层电连接;S520: Provide a wire bonding chip, the wire bonding chip is electrically connected to the substrate 10, the plastic sealing layer 50 plastic-encapsulates the wire bonding chip, the wire bonding chip has conductive posts 21, the plastic sealing layer 50 is ground, so that the conductive pillars 21 are exposed, and the conductive pillars 21 are electrically connected to the circuit layer;
请结合参阅图11,所述打线芯片的一端与所述基板10的电路相连接,所述打线芯片的导电柱21朝向远离所述基板10的方向设置。在按照步骤S310对所述塑封层50进行整体研磨时,使所述导电柱21远离所述基板10的一侧裸露。在制作所述电路层时,形成的所述电路层与所述导电柱21远离所述基板10的一端相连接,以使所述打线芯片与所述电路层相互导通。Please refer to FIG. 11 , one end of the wire bonding chip is connected to the circuit of the substrate 10 , and the conductive pillars 21 of the wire bonding chip are disposed in a direction away from the substrate 10 . During the overall grinding of the plastic encapsulation layer 50 according to step S310 , the side of the conductive pillar 21 away from the substrate 10 is exposed. When the circuit layer is fabricated, the formed circuit layer is connected to one end of the conductive pillar 21 away from the substrate 10 , so that the wire bonding chip and the circuit layer are connected to each other.
请参阅图8,在本申请的另一个实施例中,所述基板10通过打线芯片与所述电路层电连接的步骤包括:Referring to FIG. 8 , in another embodiment of the present application, the step of electrically connecting the substrate 10 to the circuit layer through a wire bonding chip includes:
S530:提供打线芯片,所述打线芯片与所述基板10电连接,所述塑封层50将所述打线芯片塑封,所述打线芯片具有导电柱21,对所述塑封层50进行钻孔,以使所述导电柱21裸露,在所述钻孔内填充导体22,通过所述导体22将所述导电柱21与所述电路层电连接。S530 : providing a wire bonding chip, the wire bonding chip is electrically connected to the substrate 10 , the plastic sealing layer 50 plastic-encapsulates the wire bonding chip, the wire bonding chip has conductive posts 21 , and the plastic sealing layer 50 is plastic-sealed. Drill holes to expose the conductive pillars 21 , fill conductors 22 in the drilled holes, and electrically connect the conductive pillars 21 to the circuit layer through the conductors 22 .
请结合参阅图12,所述导电柱21的一端连接所述打线芯片,所述导电柱21的另一端朝向所述塑封层50背向所述基板10的一侧表面。在按照步骤S320对所述塑封层50进行研磨时,在所述塑封层50内形成与所述第一芯片40位置相对应的容置部53。然后对所述塑封层50进行钻孔,以使所述导电柱21远离所述基板10的一端裸露。在所述钻孔内填充导体22,当制作完成所述电路层时,所述钻孔内的导体22与所述电路层向连接,以使所述打线芯片与所述电路层相互导通。Please refer to FIG. 12 , one end of the conductive column 21 is connected to the wire bonding chip, and the other end of the conductive column 21 faces the side surface of the plastic sealing layer 50 away from the substrate 10 . When the plastic sealing layer 50 is ground according to step S320 , an accommodating portion 53 corresponding to the position of the first chip 40 is formed in the plastic sealing layer 50 . Then, the plastic encapsulation layer 50 is drilled to expose one end of the conductive pillar 21 away from the substrate 10 . Conductors 22 are filled in the drilled holes, and when the circuit layer is fabricated, the conductors 22 in the drilled holes are connected to the circuit layer, so that the wire bonding chip and the circuit layer are connected to each other. .
也可以先对所述塑封层50进行钻孔,以形成所述导体22,然后再在所述塑封层50内形成所述容置部53。也可以同时进行。The plastic sealing layer 50 may also be drilled first to form the conductors 22 , and then the accommodating portion 53 is formed in the plastic sealing layer 50 . Can also be done at the same time.
当采用化镀工艺形成所述电路层时,可以先对所述塑封层50背向所述基板10的一侧表面整体进行研磨,以减小所述塑封层50的整体厚度,同时使所述塑封层50表面更容易形成稳定的、高质量的电路层。然后在对所述塑封层50进行研磨,以形成所述容置部53,并对所述塑封层50进行钻孔,以形成所述导体22。When the circuit layer is formed by an electroless plating process, the entire surface of the side surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole to reduce the overall thickness of the plastic sealing layer 50 and at the same time make the It is easier to form a stable, high-quality circuit layer on the surface of the plastic encapsulation layer 50 . Then, the plastic sealing layer 50 is ground to form the accommodating portion 53 , and the plastic sealing layer 50 is drilled to form the conductor 22 .
所述导体22可以采用金属物质,也可以采用导电胶等能够具有导电性能的材料。The conductor 22 can be made of a metal substance, or a material capable of having electrical conductivity such as conductive glue.
请参阅图9,在本申请的一个实施例中,在执行所述第二芯片60通过焊线61与所述电路层电连接的步骤之后,所述芯片封装工艺之后还包括:Referring to FIG. 9, in an embodiment of the present application, after performing the step of electrically connecting the second chip 60 with the circuit layer through the bonding wire 61, the chip packaging process further includes:
S60:提供第三芯片70,将所述第三芯片70贴置于所述电路层。S60: Provide a third chip 70, and attach the third chip 70 to the circuit layer.
请结合参阅图10,所述第三芯片70位于所述电路层背向所述基板10的一侧,所述第三芯片70背向所述电路层的一侧端面为其背部。所述第三芯片70可以倒装贴置于所述电路层上,在后续进一步对封装体进行加工时,可以参照第一芯片40的制作方式,对所述第三芯片70的背部进行刻蚀,进而可以在所述第三芯片70上继续贴装芯片。Please refer to FIG. 10 , the third chip 70 is located on the side of the circuit layer facing away from the substrate 10 , and the end face of the third chip 70 facing away from the circuit layer is its back. The third chip 70 can be flip-chip mounted on the circuit layer. When the package body is further processed, the backside of the third chip 70 can be etched with reference to the manufacturing method of the first chip 40 . , and further chips can be mounted on the third chip 70 .
由于所述第二芯片60通过所述焊线61与所述电路层电连接,所述第二芯片60能够实现与所述第三芯片70电路导通。由于所述电路层通过所述打线芯片与所述基板10导通,进而可以实现所述第三芯片70与所述基板10的相互导通。不需要在所述塑封层50上设置连通所述第三芯片70和所述第一芯片40的转接板,进而减小塑封件的厚度。Since the second chip 60 is electrically connected to the circuit layer through the bonding wire 61 , the second chip 60 can be electrically connected to the third chip 70 . Since the circuit layer is connected to the substrate 10 through the wire bonding chip, the third chip 70 and the substrate 10 can be connected to each other. There is no need to dispose an adapter plate on the plastic encapsulation layer 50 to communicate with the third chip 70 and the first chip 40 , thereby reducing the thickness of the plastic encapsulation.
请结合参阅图11和图12,当研磨所述塑封层50背向所述基板10的一侧表面,并通过对所述第一芯片40进行刻蚀形成所述容置部53时,在对所述第二芯片60进行贴装时,由于所述第二芯片60背向所述基板10的一侧与所述基板10之间的距离相对减小,且所述电路层与所述基板10之间的距离减小,使得封装体的厚度减小,在贴装所述第三芯片70之后,所述第三芯片70背向所述基板10的一侧表面与所述基板10的距离也相对减小。Please refer to FIG. 11 and FIG. 12 , when the surface of the plastic sealing layer 50 facing away from the substrate 10 is ground and the accommodating portion 53 is formed by etching the first chip 40 , When the second chip 60 is mounted, since the distance between the side of the second chip 60 facing away from the substrate 10 and the substrate 10 is relatively reduced, and the circuit layer is connected to the substrate 10 The distance between them is reduced, so that the thickness of the package body is reduced. After the third chip 70 is mounted, the distance between the side surface of the third chip 70 facing away from the substrate 10 and the substrate 10 is also reduced. relatively reduced.
所述第三芯片70倒装贴置于所述基板10上,是指所述第三芯片70的引脚或连接触点朝向所述基板10设置,所述第三芯片70安装在对应的所述安装位上之后,所述第三芯片70与所述安装位的连接触点相互连接,以使所述第三芯片70与所述基板10的电路导通。所述第三芯片70背向所述基板10的一侧端面为其背部。所述第三芯片70也可以为倒装芯片,将其锡球30与基板10上的连接触点相互连接,实现所述第三芯片70的安装The flip-chip mounting of the third chip 70 on the substrate 10 means that the pins or connection contacts of the third chip 70 are disposed toward the substrate 10, and the third chip 70 is mounted on the corresponding After the mounting position, the third chip 70 is connected to the connection contacts of the mounting position, so that the circuit of the third chip 70 and the substrate 10 is conducted. The end face of the third chip 70 facing away from the substrate 10 is its back. The third chip 70 can also be a flip chip, and the solder balls 30 of the third chip 70 are connected to the connection contacts on the substrate 10 to realize the installation of the third chip 70
请参阅图9,在本申请的一个实施例中,在执行提供第三芯片70,将所述第三芯片70倒装贴置于所述电路层的步骤之后,所述芯片封装工艺还包括:Referring to FIG. 9, in an embodiment of the present application, after performing the steps of providing a third chip 70 and flip-chip attaching the third chip 70 to the circuit layer, the chip packaging process further includes:
S70:在所述塑封层50背向所述基板10的一侧进行二次塑封,以将所述第二芯片60、第三芯片70以及所述电路层进行塑封。S70: Perform secondary plastic encapsulation on the side of the plastic encapsulation layer 50 facing away from the substrate 10 to encapsulate the second chip 60, the third chip 70 and the circuit layer.
请结合参阅图11和图12,在进行二次塑封之后,所述第三芯片70、所述第二芯片60以及所述第一芯片40形成整体的塑封体。在完成塑封之后,可以参照步骤S310或步骤S320对塑封体背向所述基板10的一侧表面进行研磨,进一步在所述第三芯片70上再次贴装芯片。由于封装体内没有设置转接板,能够减小封装体的整体厚度。Please refer to FIG. 11 and FIG. 12 in combination, after the secondary plastic packaging is performed, the third chip 70 , the second chip 60 and the first chip 40 form an integral plastic packaging body. After the plastic packaging is completed, the surface of the plastic packaging body facing away from the substrate 10 may be ground by referring to step S310 or step S320 , and further chips are mounted on the third chip 70 again. Since no adapter plate is provided in the package body, the overall thickness of the package body can be reduced.
在进行二次塑封之后,可以在所述第二芯片60上设置导电柱21,当在二次塑封形成的塑封体背向所述基板10的一侧表面再次制作电路层时,可以通过第二芯片60上的导电柱21实现电路层的导通。After the secondary plastic packaging is performed, the conductive pillars 21 may be arranged on the second chip 60. When the circuit layer is fabricated again on the surface of the plastic packaging body formed by the secondary plastic packaging that faces away from the substrate 10, the second The conductive pillars 21 on the chip 60 realize the conduction of the circuit layers.
本申请还提出一种封装芯片的实施例。The present application also provides an embodiment of a packaged chip.
请参阅图10,所述封装芯片包括:基板10;塑封层50,设于所述基板10上,所述塑封层50背向所述基板10的一侧凹设有容置部53;第一芯片40,倒装贴置于所述基板10上,并位于所述塑封层50内,所述第一芯片40背向所述基板10的一侧与所述容置部53相连通;以及第二芯片60,设于所述容置部53内,并贴置于所述第一芯片40背向所述基板10的一侧。Referring to FIG. 10, the packaged chip includes: a substrate 10; a plastic sealing layer 50 disposed on the substrate 10; The chip 40 is flip-chip mounted on the substrate 10 and located in the plastic sealing layer 50 , and the side of the first chip 40 facing away from the substrate 10 is communicated with the accommodating portion 53 ; Two chips 60 are disposed in the accommodating portion 53 and attached to the side of the first chip 40 facing away from the substrate 10 .
所述塑封层50可以采用有机金属复合物改性塑封料,通过所述塑封层50将所述第一芯片40进行塑封。所述第一芯片40可以采用倒装芯片。The plastic encapsulation layer 50 may use an organic metal compound to modify the plastic encapsulation material, and the first chip 40 is encapsulated by the plastic encapsulation layer 50 . The first chip 40 may be a flip chip.
所述基板10设置有电路层,在所述基板10上设置有用于贴装所述芯片的安装位,所述安装位设置有连接所述电路层的焊盘等连接触点,所述第一芯片40贴装在所述基板10上时,与所述基板10相导通。所述第一芯片40背向所述基板10的一侧表面为其背部。The substrate 10 is provided with a circuit layer, a mounting position for mounting the chip is provided on the substrate 10, and the mounting position is provided with connecting contacts such as pads connecting the circuit layer, the first When the chip 40 is mounted on the substrate 10 , it is in conduction with the substrate 10 . The side surface of the first chip 40 facing away from the substrate 10 is its back.
所述容置部53为设置于所述塑封层50背向所述基板10的一侧表面上的内凹部位,所述容置部53与所述第一芯片40的位置相对应,以使所述第一芯片40的背部裸露。所述第二芯片60设于所述容置部53内。相比于直接将所述第二芯片60贴装于所述塑封层50背向所述基板10的一侧的方式,采用本实施例中所述方式,所述第二芯片60与所述基板10之间的距离减小,进而使得整个塑封体的厚度减小。The accommodating portion 53 is a concave portion disposed on the side surface of the plastic sealing layer 50 facing away from the substrate 10 . The accommodating portion 53 corresponds to the position of the first chip 40 , so that the The back of the first chip 40 is exposed. The second chip 60 is disposed in the accommodating portion 53 . Compared with the method of directly mounting the second chip 60 on the side of the plastic sealing layer 50 facing away from the substrate 10 , the method described in this embodiment is adopted, the second chip 60 and the substrate are The distance between 10 is reduced, thereby reducing the thickness of the entire plastic package.
请参阅图11,在制作所述容置部53时,可以对所述塑封层50背向所述基板10的一侧表面进行整体研磨,以使所述第一芯片40的背部裸露,然后对所述第一芯片40的背部进行刻蚀,以形成所述容置部53。Referring to FIG. 11 , when the accommodating portion 53 is fabricated, the surface of the plastic layer 50 facing away from the substrate 10 may be ground as a whole to expose the back of the first chip 40 . The backside of the first chip 40 is etched to form the accommodating portion 53 .
请参阅图12,也可以对所述第一芯片40所对应位置处的所述塑封层50进行研磨,以使所述塑封层50上形成与所述第一芯片40位置相对应的容置部53,直到所述第一芯片40的背部裸露。Referring to FIG. 12 , the plastic sealing layer 50 at the position corresponding to the first chip 40 may also be ground, so that the plastic sealing layer 50 forms an accommodating portion corresponding to the position of the first chip 40 . 53, until the back of the first chip 40 is exposed.
请参阅图11和图12,也可以先对所述塑封层50背向所述基板10的一侧表面进行整体研磨,以减小所述塑封层50的整体厚度。然后对与所述第一芯片40所对应位置处的塑封层50进行研磨,直到所述第一芯片40的背部裸露。之后再对所述第一芯片40的背部进行刻蚀,以减小所述第一芯片40的厚度,相应地增大所述容置部53的深度,将所述第二芯片60贴置于经刻蚀后的所述第一芯片40的背部。Referring to FIGS. 11 and 12 , the surface of the plastic sealing layer 50 facing away from the substrate 10 may be ground as a whole first, so as to reduce the overall thickness of the plastic sealing layer 50 . Then, the plastic sealing layer 50 at the position corresponding to the first chip 40 is ground until the backside of the first chip 40 is exposed. Then, the back of the first chip 40 is etched to reduce the thickness of the first chip 40 and correspondingly increase the depth of the accommodating portion 53, and the second chip 60 is placed on the The backside of the first chip 40 after etching.
请参阅图10,在本申请的一个实施例中,所述封装芯片还包括:打线芯片,设于所述塑封层50,并与所述基板10电连接;焊线61,与所述第二芯片60电连接;以及电路层,设于所述塑封层50背向所述基板10的一侧,所述打线芯片远离所述基板10的一端与所述电路层电连接,所述第二芯片60通过所述焊线61与所述电路层电连接。Referring to FIG. 10 , in an embodiment of the present application, the packaged chip further includes: a wire bonding chip, which is disposed on the plastic sealing layer 50 and is electrically connected to the substrate 10 ; a bonding wire 61 is connected to the first The two chips 60 are electrically connected; and the circuit layer is disposed on the side of the plastic encapsulation layer 50 facing away from the substrate 10 , and the end of the wire bonding chip away from the substrate 10 is electrically connected to the circuit layer, and the first The two chips 60 are electrically connected to the circuit layer through the bonding wires 61 .
所述打线芯片用于连接所述基板10的电路和所述电路层,所述第二芯片60通过所述焊线61与所述电路层电连接时,所述第二芯片60也可以实现与所述基板10的相互导通。由于所述第一芯片40贴置于所述基板10上,所述第二芯片60可以实现与所述第一基板10相互导通。The wire bonding chip is used to connect the circuit of the substrate 10 and the circuit layer. When the second chip 60 is electrically connected to the circuit layer through the bonding wire 61 , the second chip 60 can also be implemented. The interconnection with the substrate 10 is conducted. Since the first chip 40 is attached to the substrate 10 , the second chip 60 can be electrically connected to the first substrate 10 .
所述打线芯片可以为贴置于所述基板10上的打线芯片201,所述打线芯片201通过焊线与所述基板10电连接,所述打线芯片201通过导电柱21与所述电路层电连接。由于打线芯片201本身具有其芯片功能,进而可以实现在所述基板10和所述电路层的导通的同时,在塑封体内集成更多的芯片,以提高塑封体的集成度。The wire bonding chip 201 may be a wire bonding chip 201 attached to the substrate 10 , the wire bonding chip 201 is electrically connected to the substrate 10 through bonding wires, and the wire bonding chip 201 is connected to the substrate 10 through a conductive column 21 . The circuit layers are electrically connected. Since the wire bonding chip 201 itself has its chip function, more chips can be integrated in the plastic package while the substrate 10 and the circuit layer are conducting, so as to improve the integration degree of the plastic package.
在制作所述电路层之后,可以在所述电路层上倒装贴附第三芯片70,然后对所述封装芯片进行二次塑封。在完成二次塑封之后,可以设置与所述第三芯片70位置相对应的容置部53,也可以继续对所述第三芯片70进行刻蚀,在所述第三芯片70的背部再次贴置芯片。After the circuit layer is fabricated, a third chip 70 can be flip-chip attached on the circuit layer, and then the packaged chip is subjected to secondary plastic sealing. After the secondary plastic encapsulation is completed, the accommodating portion 53 corresponding to the position of the third chip 70 can be set, or the third chip 70 can be continuously etched, and the back of the third chip 70 can be pasted again. set the chip.
通过设置所述电路层,可以实现所述第二芯片60与所述基板10的相互导通,不需要在所述塑封体上再次设置现有的转接板,进而可以减小所述封装芯片的整体厚度。由于所述第二芯片60被贴置于所述第一芯片40的背部,或者对所述第一芯片40进行刻蚀之后,减小所述第一芯片40的厚度再贴装所述第二芯片60,使得所述第二芯片60在所述封装芯片的厚度方向上所占用的空间更小,有助于减小所述封装芯片的厚度。By arranging the circuit layer, the mutual conduction between the second chip 60 and the substrate 10 can be achieved, and there is no need to install an existing transfer board on the plastic package again, thereby reducing the size of the packaged chip. the overall thickness. Since the second chip 60 is placed on the back of the first chip 40, or after the first chip 40 is etched, the thickness of the first chip 40 is reduced and the second chip 40 is then mounted. The chip 60 makes the space occupied by the second chip 60 in the thickness direction of the packaged chip smaller, which helps to reduce the thickness of the packaged chip.
以上所述仅为本申请的可选实施例,并非因此限制本申请的专利范围,凡是在本申请的发明构思下,利用本申请说明书及附图内容所作的等效结构变换,或直接/间接运用在其他相关的技术领域均包括在本申请的专利保护范围内。The above descriptions are only optional embodiments of the present application, and are not intended to limit the patent scope of the present application. Under the inventive concept of the present application, any equivalent structural transformations made by using the contents of the description and drawings of the present application, or direct/indirect Applications in other related technical fields are included in the scope of patent protection of this application.

Claims (14)

  1. 一种芯片封装工艺,其中,包括如下步骤:A chip packaging process, comprising the following steps:
    提供基板、第一芯片和第二芯片,将所述第一芯片贴置于所述基板上;providing a substrate, a first chip and a second chip, and attaching the first chip on the substrate;
    于所述基板上形成塑封层,所述塑封层将所述第一芯片塑封;forming a plastic encapsulation layer on the substrate, and the plastic encapsulation layer encapsulates the first chip;
    对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露;processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate;
    将所述第二芯片贴置于所述第一芯片背向所述基板的一侧。The second chip is attached to the side of the first chip facing away from the substrate.
  2. 如权利要求1所述的芯片封装工艺,其中,所述对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露的步骤包括:The chip packaging process according to claim 1, wherein the step of processing the side of the plastic packaging layer facing away from the substrate to expose the side of the first chip facing away from the substrate comprises the following steps: :
    研磨所述塑封层背向所述基板的一侧,以使研磨后的所述第一芯片背向所述基板的一侧表面与所述塑封层背向所述基板的一侧表面在同一平面上,以将所述第一芯片背向所述基板的一侧裸露。grinding the side of the plastic sealing layer facing away from the substrate, so that the surface of the side of the ground first chip facing away from the substrate and the surface of the plastic sealing layer facing away from the substrate are on the same plane to expose the side of the first chip facing away from the substrate.
  3. 如权利要求1所述的芯片封装工艺,其中,所述对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露的步骤包括:The chip packaging process according to claim 1, wherein the step of processing the side of the plastic packaging layer facing away from the substrate to expose the side of the first chip facing away from the substrate comprises the following steps: :
    研磨与所述第一芯片所在位置相对应的所述塑封层,将所述第一芯片背向所述基板的一侧裸露。The plastic sealing layer corresponding to the position of the first chip is ground, and the side of the first chip facing away from the substrate is exposed.
  4. 如权利要求1至3任一项所述的芯片封装工艺,其中,在执行将所述第一芯片背向所述基板的一侧裸露的步骤之后,所述芯片封装工艺还包括:The chip packaging process according to any one of claims 1 to 3, wherein after performing the step of exposing the side of the first chip away from the substrate, the chip packaging process further comprises:
    刻蚀所述第一芯片背向所述基板的一侧,以使研磨后的所述第一芯片背向所述基板的一侧表面与所述基板之间的距离小于所述塑封层背向所述基板的一侧表面与所述基板之间的距离。etching the side of the first chip facing away from the substrate, so that the distance between the surface of the ground side of the first chip facing away from the substrate and the substrate is smaller than the distance between the surface of the first chip facing away from the substrate and the substrate facing away from the plastic sealing layer The distance between one side surface of the substrate and the substrate.
  5. 如权利要求1所述的芯片封装工艺,其中,在执行对所述塑封层背向所述基板的一侧进行加工,以将所述第一芯片背向所述基板的一侧裸露的步骤之后,所述芯片封装工艺还包括:The chip packaging process according to claim 1, wherein after the step of processing the side of the plastic encapsulation layer facing away from the substrate to expose the side of the first chip facing away from the substrate , the chip packaging process further includes:
    于所述塑封层背向所述基板的一侧形成电路层,所述基板通过打线芯片与所述电路层电连接,所述第二芯片通过焊线与所述电路层电连接。A circuit layer is formed on the side of the plastic packaging layer facing away from the substrate, the substrate is electrically connected to the circuit layer through a wire bonding chip, and the second chip is electrically connected to the circuit layer through a bonding wire.
  6. 如权利要求5所述的芯片封装工艺,其中,所述于所述塑封层背向所述基板的一侧形成电路层的步骤包括:The chip packaging process according to claim 5, wherein the step of forming a circuit layer on the side of the plastic packaging layer facing away from the substrate comprises:
    于所述塑封层背向所述基板的一侧形成种子层;以及forming a seed layer on the side of the plastic encapsulation layer facing away from the substrate; and
    于所述塑封层背向所述基板的一侧形成所述电路层。The circuit layer is formed on the side of the plastic encapsulation layer facing away from the substrate.
  7. 如权利要求6所述的芯片封装工艺,其中,所述塑封层为有机金属复合物改性塑封料,通过激光照射使所述塑封层背向所述基板的一侧活化形成所述种子层。The chip packaging process according to claim 6 , wherein the plastic sealing layer is an organic metal compound modified plastic sealing compound, and a side of the plastic sealing layer facing away from the substrate is activated by laser irradiation to form the seed layer.
  8. 如权利要求7所述的芯片封装工艺,其中,在执行所述通过激光照射使所述塑封层背向所述基板的一侧活化形成所述种子层的步骤之前还包括:The chip packaging process according to claim 7, wherein before performing the step of activating the side of the plastic sealing layer facing away from the substrate by laser irradiation to form the seed layer, further comprising:
    在所述塑封层背向所述基板的一侧施加掩膜层,所述掩膜层设有与所述电路层的电路图案相对应的透光部。A mask layer is applied on the side of the plastic sealing layer facing away from the substrate, and the mask layer is provided with a light-transmitting portion corresponding to the circuit pattern of the circuit layer.
  9. 如权利要求5至8任一项所述的芯片封装工艺,其中,所述基板通过打线芯片与所述电路层电连接的步骤包括:The chip packaging process according to any one of claims 5 to 8, wherein the step of electrically connecting the substrate with the circuit layer through a wire bonding chip comprises:
    提供打线芯片,所述打线芯片与所述基板电连接,所述塑封层将所述打线芯片塑封,所述打线芯片具有导电柱,研磨所述塑封层,以使所述导电柱裸露,将所述导电柱与所述电路层电连接;或者A wire-bonding chip is provided, the wire-bonding chip is electrically connected to the substrate, the wire-bonding chip is plastic-sealed by the plastic sealing layer, and the wire-bonding chip has conductive posts, and the plastic sealing layer is ground to make the conductive posts Exposing, electrically connecting the conductive post with the circuit layer; or
    提供打线芯片,所述打线芯片与所述基板电连接,所述塑封层将所述打线芯片塑封,所述打线芯片具有导电柱,对所述塑封层进行钻孔,以使所述导电柱裸露,在所述钻孔内填充导体,通过所述导体将所述导电柱与所述电路层电连接。A wire-bonding chip is provided, the wire-bonding chip is electrically connected to the substrate, the wire-bonding chip is plastic-sealed by the plastic sealing layer, the wire-bonding chip has conductive posts, and the plastic sealing layer is drilled so that the The conductive posts are exposed, and conductors are filled in the drilled holes, and the conductive posts are electrically connected to the circuit layer through the conductors.
  10. 如权利要求5至8任一项所述的芯片封装工艺,其中,所述打线芯片通过连接导线与所述基板电连接,所述打线芯片与所述电路层电连接。The chip packaging process according to any one of claims 5 to 8, wherein the wire bonding chip is electrically connected to the substrate through connecting wires, and the wire bonding chip is electrically connected to the circuit layer.
  11. 如权利要求5至8任一项所述的芯片封装工艺,其中,在执行所述第二芯片通过焊线与所述电路层电连接的步骤之后,所述芯片封装工艺之后还包括:The chip packaging process according to any one of claims 5 to 8, wherein after performing the step of electrically connecting the second chip with the circuit layer through bonding wires, the chip packaging process further comprises:
    提供第三芯片,将所述第三芯片贴置于所述电路层。A third chip is provided, and the third chip is attached to the circuit layer.
  12. 如权利要求11所述的芯片封装工艺,其中,在执行提供第三芯片,将所述第三芯片倒装贴置于所述电路层的步骤之后,所述芯片封装工艺还包括:The chip packaging process according to claim 11, wherein after performing the step of providing a third chip and flip-chip attaching the third chip to the circuit layer, the chip packaging process further comprises:
    在所述塑封层背向所述基板的一侧进行二次塑封,以将所述第二芯片、第三芯片以及所述电路层进行塑封。Secondary plastic sealing is performed on the side of the plastic sealing layer facing away from the substrate, so as to perform plastic sealing of the second chip, the third chip and the circuit layer.
  13. 一种封装芯片,其中,包括:A packaged chip, comprising:
    基板;substrate;
    塑封层,设于所述基板上,所述塑封层背向所述基板的一侧凹设有容置部;a plastic encapsulation layer, disposed on the substrate, and a accommodating portion is recessed on the side of the plastic encapsulation layer facing away from the substrate;
    第一芯片,贴置于所述基板上,并位于所述塑封层内,所述第一芯片背向所述基板的一侧与所述容置部相连通;以及a first chip, which is attached to the substrate and located in the plastic encapsulation layer, and the side of the first chip facing away from the substrate is communicated with the accommodating portion; and
    第二芯片,设于所述容置部内,并贴置于所述第一芯片背向所述基板的一侧。The second chip is disposed in the accommodating portion and attached to the side of the first chip facing away from the substrate.
  14. 如权利要求13所述的封装芯片,其中,所述封装芯片还包括:The packaged chip of claim 13, wherein the packaged chip further comprises:
    打线芯片,设于所述塑封层,并与所述基板电连接;a wire bonding chip, which is arranged on the plastic sealing layer and is electrically connected to the substrate;
    焊线,与所述第二芯片电连接;以及bonding wires, electrically connected to the second chip; and
    电路层,设于所述塑封层背向所述基板的一侧,所述打线芯片与所述电路层电连接,所述第二芯片通过所述焊线与所述电路层电连接。The circuit layer is arranged on the side of the plastic sealing layer facing away from the substrate, the wire bonding chip is electrically connected to the circuit layer, and the second chip is electrically connected to the circuit layer through the bonding wire.
PCT/CN2021/112780 2020-08-27 2021-08-16 Chip packaging process and packaging chip WO2022042354A1 (en)

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Publication number Priority date Publication date Assignee Title
CN111968949B (en) * 2020-08-27 2022-05-24 青岛歌尔微电子研究院有限公司 Chip packaging process and packaged chip

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080150100A1 (en) * 2006-12-22 2008-06-26 Powertech Technology Inc. Ic package encapsulating a chip under asymmetric single-side leads
CN104538368A (en) * 2014-12-30 2015-04-22 华天科技(西安)有限公司 Three-dimensional stacking packaging structure based on secondary plastic packaging technology and preparing method thereof
CN109841603A (en) * 2017-11-27 2019-06-04 力成科技股份有限公司 Encapsulating structure and its manufacturing method
CN110634838A (en) * 2019-08-29 2019-12-31 上海先方半导体有限公司 Ultrathin fan-out type packaging structure and manufacturing method thereof
CN111009475A (en) * 2019-11-22 2020-04-14 青岛歌尔智能传感器有限公司 Packaging structure and packaging method of optical module
CN111968949A (en) * 2020-08-27 2020-11-20 青岛歌尔微电子研究院有限公司 Chip packaging process and packaged chip

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100521124C (en) * 2007-10-31 2009-07-29 日月光半导体制造股份有限公司 Carrier and its making method
CN102842551A (en) * 2012-08-21 2012-12-26 华天科技(西安)有限公司 Wafer level chip scale package (WLCSP) multiple chip stackable packaging piece based on substrate and solder paste layer and packaging method thereof
CN109698154B (en) * 2017-10-20 2020-12-15 中芯国际集成电路制造(上海)有限公司 Chip packaging method and chip packaging structure

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080150100A1 (en) * 2006-12-22 2008-06-26 Powertech Technology Inc. Ic package encapsulating a chip under asymmetric single-side leads
CN104538368A (en) * 2014-12-30 2015-04-22 华天科技(西安)有限公司 Three-dimensional stacking packaging structure based on secondary plastic packaging technology and preparing method thereof
CN109841603A (en) * 2017-11-27 2019-06-04 力成科技股份有限公司 Encapsulating structure and its manufacturing method
CN110634838A (en) * 2019-08-29 2019-12-31 上海先方半导体有限公司 Ultrathin fan-out type packaging structure and manufacturing method thereof
CN111009475A (en) * 2019-11-22 2020-04-14 青岛歌尔智能传感器有限公司 Packaging structure and packaging method of optical module
CN111968949A (en) * 2020-08-27 2020-11-20 青岛歌尔微电子研究院有限公司 Chip packaging process and packaged chip

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