WO2022025018A1 - Vacuum pressure supply system - Google Patents

Vacuum pressure supply system Download PDF

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Publication number
WO2022025018A1
WO2022025018A1 PCT/JP2021/027622 JP2021027622W WO2022025018A1 WO 2022025018 A1 WO2022025018 A1 WO 2022025018A1 JP 2021027622 W JP2021027622 W JP 2021027622W WO 2022025018 A1 WO2022025018 A1 WO 2022025018A1
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WIPO (PCT)
Prior art keywords
vacuum pressure
vacuum
pressure supply
supply path
supply system
Prior art date
Application number
PCT/JP2021/027622
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French (fr)
Japanese (ja)
Inventor
中村牧人
室田真弘
Original Assignee
ファナック株式会社
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Publication of WO2022025018A1 publication Critical patent/WO2022025018A1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/02—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for mounting on a work-table, tool-slide, or analogous part
    • B23Q3/06—Work-clamping means
    • B23Q3/08—Work-clamping means other than mechanically-actuated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J15/00—Gripping heads and other end effectors
    • B25J15/06—Gripping heads and other end effectors with vacuum or magnetic holding means

Definitions

  • the present invention relates to a vacuum pressure supply system.
  • Japanese Unexamined Patent Publication No. 2014-50940 discloses a robot hand that sucks and holds a work.
  • the main surface of the robot hand is provided with an intake hole and a vacuum path communicating with the intake hole.
  • the vacuum path is connected to the vacuum pump.
  • the work is attracted and held by the vacuum pressure supplied from the vacuum pump to the intake hole via the vacuum path, and the work is prevented from falling.
  • An object of the present invention is to provide a vacuum pressure supply system capable of preventing damage to an object held by using the vacuum pressure even if the supply of the vacuum pressure from the vacuum source is interrupted.
  • the vacuum pressure supply system has a vacuum pressure supply path for supplying the vacuum pressure from the vacuum source to a holding portion that holds an object using the vacuum pressure, and a vacuum pressure supply path on the vacuum pressure supply path. It is provided with a tank for storing the vacuum pressure.
  • the present invention it is possible to provide a vacuum pressure supply system capable of preventing damage to an object held by using the vacuum pressure even if the supply of the vacuum pressure from the vacuum source is interrupted.
  • FIG. 1A and 1B are block diagrams showing a vacuum pressure supply system according to the first embodiment.
  • FIG. 2 is a graph showing the evaluation results.
  • 3A and 3B are block diagrams showing a vacuum pressure supply system according to the second embodiment.
  • FIG. 4 is a graph showing the evaluation results.
  • FIGS. 1A and 1B are block diagrams showing a vacuum pressure supply system according to the present embodiment.
  • FIG. 1A shows a state in which vacuum pressure is normally supplied from the vacuum source 16 to the vacuum pressure supply path 12.
  • FIG. 1B shows a state in which the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off.
  • the arrows in FIGS. 1A and 1B conceptually indicate the supply of vacuum pressure.
  • the vacuum pressure supply system 10 is provided with a vacuum pressure supply path 12.
  • the vacuum pressure supply path 12 may supply the vacuum pressure generated by the vacuum source 16 to the holding portion 14 described later. That is, the vacuum pressure supply path 12 can supply a pressure lower than the atmospheric pressure to the holding portion 14, which will be described later.
  • the holding portion 14 may hold the object 18 using vacuum pressure.
  • the holding force of the holding portion 14 is proportional to the pressure difference between the space inside the holding portion 14 and the atmosphere. Therefore, from the viewpoint of reliably holding the object 18 described later by the holding portion 14, it is preferable that the holding portion 14 is supplied with a pressure sufficiently lower than the atmospheric pressure. Specifically, it is preferable that the vacuum pressure is supplied to the holding portion 14.
  • the length of the vacuum pressure supply path 12 is, for example, about 2 to 3 m, but the length is not limited to this.
  • the inner diameter of the vacuum pressure supply path 12 is, for example, about 4.5 mm, but is not limited thereto.
  • the vacuum pressure supply path 12 may be configured by, for example, pipes 13A and 13B, but is not limited thereto. Reference numeral 13 is used when describing pipes in general, and reference numerals 13A and 13B are used when describing individual pipes.
  • the vacuum source 16 may be configured by, for example, a vacuum pressure generator such as a vacuum pump.
  • the vacuum source 16 may supply the vacuum pressure to the holding portion 14 via the vacuum pressure supply path 12.
  • the holding portion 14 is, for example, a vacuum chuck provided in the spindle device 24.
  • the holding portion 14 can adsorb and hold the object 18 by using the vacuum pressure supplied from the vacuum source 16.
  • the holding portion 14 is provided at one end of a spindle shaft (not shown) provided in the spindle device 24, and may rotate on the front side of the spindle housing (not shown) in association with the rotation of the spindle shaft.
  • the holding portion 14 is formed in a disk shape, for example, but may have another shape.
  • the holding portion 14 includes a base member 20 fixed to the front side of the spindle shaft, and a suction pad 22 detachably attached to the base member 20.
  • the base member 20 and the suction pad 22 are formed with a suction flow path 26 through which air sucked from the outside flows.
  • a plurality of suction ports 26a of the suction flow path 26 are provided on the suction surface side of the suction pad 22.
  • the object 18 is, for example, a work or the like, but is not limited thereto.
  • a tank 28 for storing vacuum pressure is provided on the vacuum pressure supply path 12.
  • the volume of the tank 28 is set sufficiently larger than the volume inside the pipe 13 constituting the vacuum pressure supply path 12.
  • the volume of the tank 28 is, for example, about 5 liters, but the volume is not limited to this.
  • the tank 28 is provided with, for example, an opening 29A and an opening 29B.
  • one end of the pipe 13A is connected to the opening 29A of the tank 28, and the other end of the pipe 13A is connected to the vacuum source 16.
  • one end of the pipe 13B is connected to the opening 29B of the tank 28, and the other end of the pipe 13B is connected to the suction flow path 26. That is, in the example shown in FIG.
  • one end of the pipe 13B is connected to the opening 29B of the tank 28, and the other end of the pipe 13B is connected to the vacuum pressure passage.
  • Reference numeral 29 is used when describing the openings in general, and reference numerals 29A and 29B are used when describing individual openings.
  • the vacuum pressure is supplied to the vacuum pressure supply path 12 as shown in FIG. 1A. That is, the vacuum pressure generated by the vacuum source 16 is supplied to the tank 28 via the pipe 13A. The vacuum pressure supplied to the tank 28 via the pipe 13A is supplied to the holding portion 14 via the pipe 13B.
  • a part of the vacuum pressure stored in the tank 28 can be supplied to the vacuum source 16 side via the pipe 13A.
  • FIG. 2 is a graph showing the evaluation results.
  • the horizontal axis of FIG. 2 indicates the time after the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off.
  • the vertical axis of FIG. 2 shows the magnitude of the vacuum pressure supplied to the holding portion 14.
  • Example 1 in FIG. 2 shows the case of the present embodiment. That is, Example 1 in FIG. 2 shows a case where the tank 28 is provided on the vacuum pressure supply path 12. Comparative Example 1 in FIG. 2 shows a case where the tank 28 is not provided on the vacuum pressure supply path 12.
  • the tank 28 is provided on the vacuum pressure supply path 12, even if the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, the tank 28 is provided.
  • the vacuum pressure stored in the holding unit 14 continues to be supplied to the holding unit 14 for a relatively long period of time. Therefore, according to the present embodiment, it is possible to sufficiently lengthen the time grace until the vacuum pressure is excessively reduced. Since the time grace until the vacuum pressure is excessively reduced can be sufficiently long, according to the present embodiment, the object 18 is placed before the vacuum pressure is excessively reduced. It becomes possible to do. Therefore, according to the present embodiment, even if the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, it is possible to prevent the object 18 held by using the vacuum pressure from falling. As a result, damage to the object 18 can be prevented.
  • FIGS. 3A and 3B are block diagrams showing a vacuum pressure supply system according to the present embodiment.
  • FIG. 3A shows a state in which the vacuum pressure is normally supplied from the vacuum source 16 to the vacuum pressure supply path 12.
  • FIG. 3B shows a state in which the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off.
  • the arrows in FIGS. 3A and 3B conceptually indicate the supply of vacuum pressure.
  • a part of the vacuum pressure stored in the tank 28 can be supplied to the vacuum source 16 side via the pipe 13A.
  • a part of the vacuum pressure stored in the tank 28 is a vacuum source via the pipe 13A. It is preferable that it is not supplied to the 16 side. Therefore, in the vacuum pressure supply system 10 according to the present embodiment, the solenoid valve 32 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the tank 28, and a part of the vacuum pressure stored in the tank 28 is removed. It is prevented from being supplied to the vacuum source 16 side via the pipe 13A.
  • a solenoid valve 32 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the tank 28.
  • the solenoid valve 32 is, for example, a normally closed solenoid valve, but is not limited thereto.
  • a pressure sensor 30 is provided on the vacuum pressure supply path 12.
  • the pressure sensor 30 can detect the magnitude of the vacuum pressure supplied from the vacuum source 16 to the vacuum pressure supply path 12.
  • the pressure sensor 30 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the solenoid valve 32, but the pressure sensor 30 is not limited thereto.
  • a pressure sensor 30 may be provided on the vacuum pressure supply path 12 between the solenoid valve 32 and the holding portion 14. Even when the pressure sensor 30 is provided on the vacuum pressure supply path 12 between the electromagnetic valve 32 and the holding portion 14, the magnitude of the vacuum pressure supplied from the vacuum source 16 is determined by the pressure sensor 30. Can be detected.
  • the vacuum pressure supply system 10 is further provided with a control device 34.
  • the control device 34 includes a calculation unit 36 and a storage unit 38.
  • the arithmetic unit 36 may be configured by, for example, a processor such as a CPU (Central Processing Unit), but is not limited thereto.
  • the calculation unit 36 includes a control unit 40, a determination unit 42, and a display control unit 44.
  • the control unit 40, the determination unit 42, and the display control unit 44 can be realized by executing the program stored in the storage unit 38 by the calculation unit 36.
  • the storage unit 38 is provided with, for example, a volatile memory (not shown) and a non-volatile memory (not shown).
  • volatile memory include RAM (Random Access Memory) and the like.
  • non-volatile memory include ROM (Read Only Memory) and flash memory.
  • Programs, data and the like can be stored in the storage unit 38. Data indicating a normal range with respect to the pressure or the like detected by the pressure sensor 30 can be stored in advance in the storage unit 38.
  • the control unit 40 controls the entire control device 34.
  • the control unit 40 can control the opening and closing of the solenoid valve 32.
  • the determination unit 42 can determine whether or not the pressure detected by the pressure sensor 30 is within the normal range. When the determination unit 42 determines that the pressure detected by the pressure sensor 30 is out of the normal range (outside the normal pressure range), the control unit 40 may control to close the solenoid valve 32.
  • the pressure sensor 30 is positioned between the vacuum source 16 and the solenoid valve 32.
  • the pressure sensor 30 is positioned between the vacuum source 16 and the solenoid valve 32 for the following reasons. That is, when the pressure detected by the pressure sensor 30 is out of the normal pressure range, the solenoid valve 32 is closed by the control unit 40.
  • the pressure sensor 30 is positioned between the electromagnetic valve 32 and the holding portion 14, the vacuum pressure supply to the pressure sensor 30 is cut off by the closed electromagnetic valve 32, so that the pressure sensor 30 is supplied from the vacuum source 16. It cannot be detected by the pressure sensor 30 whether or not the vacuum pressure has returned to normal.
  • the pressure sensor 30 when the pressure sensor 30 is positioned between the vacuum source 16 and the electromagnetic valve 32, the vacuum pressure supplied from the vacuum source 16 is applied even when the electromagnetic valve 32 is closed. Whether or not it has returned to normal can be detected by the pressure sensor 30. For this reason, in the example shown in FIG. 3A, the pressure sensor 30 is positioned between the vacuum source 16 and the solenoid valve 32. As described above, the pressure sensor 30 may be provided on the vacuum pressure supply path 12 between the solenoid valve 32 and the holding portion 14. In this case, by opening the closed solenoid valve 32, the pressure sensor 30 can detect whether or not the vacuum pressure supplied from the vacuum source 16 has returned to normal.
  • a display unit 46 may be connected to the control device 34.
  • the display control unit 44 may display the pressure or the like detected by the pressure sensor 30 on the display screen of the display unit 46. Further, the display control unit 44 may display on the display screen of the display unit 46 whether or not the pressure detected by the pressure sensor 30 is within the normal pressure range.
  • the display unit 46 may be configured by, for example, a liquid crystal display or the like, but is not limited thereto.
  • An operation unit 48 may be connected to the control device 34.
  • the operation unit 48 may be composed of, for example, a keyboard, a mouse, or the like, but is not limited thereto.
  • the operation unit 48 may be configured by a touch panel (not shown) provided on the screen of the display unit 46. The user can input an operation to the control device 34 via the operation unit 48.
  • FIG. 4 is a graph showing the evaluation results.
  • the horizontal axis of FIG. 4 indicates the time after the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off.
  • the vertical axis of FIG. 4 shows the magnitude of the vacuum pressure supplied to the holding portion 14.
  • Example 2 in FIG. 4 shows the case of the present embodiment, that is, the case where the solenoid valve 32 is provided between the vacuum source 16 and the tank 28.
  • Example 1 and Comparative Example 1 in FIG. 4 are the same as those of Example 1 and Comparative Example 1 described above with reference to FIG.
  • the vacuum pressure supplied to the holding unit 14 after the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off. Will continue to be well maintained for an extremely long period of time.
  • the solenoid valve 32 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the tank 28, and the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is provided.
  • the solenoid valve 32 is closed. Therefore, according to the present embodiment, when the supply of the vacuum pressure from the vacuum source 16 is interrupted, the vacuum pressure stored in the tank 28 is sufficiently supplied to the holding portion 14 via the pipe 13B. Can be done. Therefore, according to the present embodiment, it is possible to more reliably prevent a sudden decrease in the vacuum pressure used for holding the object 18, and there is a time grace until the vacuum pressure is excessively decreased. Can be made longer enough.
  • the object 18 is placed before the vacuum pressure is excessively reduced because the time grace until the vacuum pressure is excessively reduced can be sufficiently extended. It becomes possible to make them equal. Therefore, according to the present embodiment, even if the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, it is possible to prevent the object 18 held by using the vacuum pressure from falling. As a result, damage to the object 18 can be prevented more reliably.
  • the tank 28 may have only one opening 29.
  • a branch pipe (not shown) branched from the pipe 13 may be connected to one opening 29 provided in the tank 28. Even when the branch pipe branching from the pipe 13 is connected to the tank 28, it can be said that the tank 28 is provided on the vacuum pressure supply path 12. Even when the branch pipe branching from the pipe 13 is connected to the tank 28, the vacuum pressure stored in the tank 28 is stored when the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted. Continues to be supplied to the holding unit 14 for a relatively long period of time. Therefore, even in such a configuration, the time grace until the vacuum pressure is excessively reduced can be sufficiently long.
  • the holding portion 14 is provided in the spindle device 24 as an example, but the present invention is not limited to this.
  • the holding portion 14 may be provided on a robot hand or the like.
  • the vacuum pressure supply system (10) is a vacuum pressure supply path (12) for supplying the vacuum pressure from the vacuum source (16) to the holding portion (14) that holds the object (18) using the vacuum pressure. ), And a tank (28) provided on the vacuum pressure supply path and storing the vacuum pressure.
  • the time grace until the vacuum pressure is excessively reduced can be sufficiently long, so that an object is placed before the vacuum pressure is excessively reduced. It is possible to make it. Therefore, according to such a configuration, even if the supply of the vacuum pressure from the vacuum source to the vacuum pressure supply path is interrupted, it is possible to prevent the object held by the vacuum pressure from falling. As a result, the vacuum pressure can be used to prevent damage to the held object.
  • the solenoid valve is closed when the supply of vacuum pressure from the vacuum source to the vacuum pressure supply path is interrupted, so that the vacuum pressure stored in the tank is sufficiently supplied to the holding portion. obtain. Therefore, according to such a configuration, it is possible to more reliably prevent a sudden decrease in the vacuum pressure used for holding the object, and a time delay until the vacuum pressure is excessively decreased. Can be made longer enough.
  • the pressure sensor may be provided on the vacuum pressure supply path between the vacuum source and the solenoid valve. According to such a configuration, whether or not the vacuum pressure supplied from the vacuum source has returned to normal can be detected by the pressure sensor even when the solenoid valve is closed.
  • the holding portion may be a vacuum chuck.
  • the vacuum source may be a vacuum pump.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

Provided is a vacuum pressure supply system (10) that can prevent damage to an object held by means of a vacuum pressure, even if supply of the vacuum pressure from a vacuum source (16) ceases. The vacuum pressure supply system (10) is provided with: a vacuum pressure supply channel (12) for supplying a vacuum pressure from the vacuum source (16) to a holding portion (14) that holds an object (18) by means of the vacuum pressure; and a tank (28) that is provided on the vacuum pressure supply channel and accumulates the vacuum pressure.

Description

真空圧供給システムVacuum pressure supply system
　本発明は、真空圧供給システムに関する。 The present invention relates to a vacuum pressure supply system.
　特開２０１４－５０９４０号公報には、ワークを吸着して保持するロボットハンドが開示されている。ロボットハンドの主面には、吸気孔と、当該吸気孔に連通する真空経路とが備えられている。真空経路は、真空ポンプに接続されている。真空ポンプから真空経路を介して吸気孔に供給される真空圧によってワークが吸着保持され、ワークの落下が防止される。 Japanese Unexamined Patent Publication No. 2014-50940 discloses a robot hand that sucks and holds a work. The main surface of the robot hand is provided with an intake hole and a vacuum path communicating with the intake hole. The vacuum path is connected to the vacuum pump. The work is attracted and held by the vacuum pressure supplied from the vacuum pump to the intake hole via the vacuum path, and the work is prevented from falling.
　しかしながら、特開２０１４－５０９４０号公報に記載されたロボットハンドは、真空ポンプからの真空圧の供給が途絶えると、ワークが落下してしまい、ひいては、ワークの損傷を招く虞がある。 However, in the robot hand described in Japanese Patent Application Laid-Open No. 2014-50940, if the supply of vacuum pressure from the vacuum pump is cut off, the work may fall, which may lead to damage to the work.
　本発明の目的は、真空源からの真空圧の供給が途絶えたとしても、真空圧を用いて保持される物体の損傷を防止し得る、真空圧供給システムを提供することにある。 An object of the present invention is to provide a vacuum pressure supply system capable of preventing damage to an object held by using the vacuum pressure even if the supply of the vacuum pressure from the vacuum source is interrupted.
　本発明の一態様による真空圧供給システムは、真空圧を用いて物体を保持する保持部に対して真空源からの前記真空圧を供給するための真空圧供給路と、前記真空圧供給路上に設けられ、前記真空圧を蓄えるタンクと、を備える。 The vacuum pressure supply system according to one aspect of the present invention has a vacuum pressure supply path for supplying the vacuum pressure from the vacuum source to a holding portion that holds an object using the vacuum pressure, and a vacuum pressure supply path on the vacuum pressure supply path. It is provided with a tank for storing the vacuum pressure.
　本発明によれば、真空源からの真空圧の供給が途絶えたとしても、真空圧を用いて保持される物体の損傷を防止し得る、真空圧供給システムを提供することができる。 According to the present invention, it is possible to provide a vacuum pressure supply system capable of preventing damage to an object held by using the vacuum pressure even if the supply of the vacuum pressure from the vacuum source is interrupted.
図１Ａ及び図１Ｂは、第１実施形態による真空圧供給システムを示すブロック図である。1A and 1B are block diagrams showing a vacuum pressure supply system according to the first embodiment. 図２は、評価結果を示すグラフである。FIG. 2 is a graph showing the evaluation results. 図３Ａ及び図３Ｂは、第２実施形態による真空圧供給システムを示すブロック図である。3A and 3B are block diagrams showing a vacuum pressure supply system according to the second embodiment. 図４は、評価結果を示すグラフである。FIG. 4 is a graph showing the evaluation results.
　本発明による真空圧供給システムについて、好適な実施形態を挙げ、添付の図面を参照しながら以下に詳細に説明する。 The vacuum pressure supply system according to the present invention will be described in detail below with reference to the attached drawings, citing suitable embodiments.
　［第１実施形態］
　第１実施形態による真空圧供給システムについて図１Ａ及び図１Ｂを用いて説明する。図１Ａ及び図１Ｂは、本実施形態による真空圧供給システムを示すブロック図である。図１Ａは、真空源１６から真空圧供給路１２に真空圧が正常に供給されている状態を示している。図１Ｂは、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた状態を示している。図１Ａ及び図１Ｂの矢印は、真空圧の供給を概念的に示している。 [First Embodiment]
The vacuum pressure supply system according to the first embodiment will be described with reference to FIGS. 1A and 1B. 1A and 1B are block diagrams showing a vacuum pressure supply system according to the present embodiment. FIG. 1A shows a state in which vacuum pressure is normally supplied from the vacuum source 16 to the vacuum pressure supply path 12. FIG. 1B shows a state in which the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off. The arrows in FIGS. 1A and 1B conceptually indicate the supply of vacuum pressure.
　図１Ａに示すように、本実施形態による真空圧供給システム１０には、真空圧供給路１２が備えられている。真空圧供給路１２は、真空源１６によって生成される真空圧を、後述する保持部１４に対して供給し得る。即ち、真空圧供給路１２は、大気圧よりも低い圧力を、後述する保持部１４に対して供給し得る。保持部１４は、物体１８を、真空圧を用いて保持し得る。保持部１４の保持力は、保持部１４内の空間と大気との圧力差に比例する。従って、後述する物体１８を保持部１４によって確実に保持する観点からは、大気圧に対して充分に低い気圧が保持部１４に供給されることが好ましい。具合的には、真空圧が保持部１４に供給されることが好ましい。ここでは、保持部１４に対して真空圧が供給される場合を例に説明する。真空圧供給路１２の長さは、例えば２～３ｍ程度であるが、これに限定されるものではない。真空圧供給路１２の内径は、例えば４．５ｍｍ程度であるが、これに限定されるものではない。真空圧供給路１２は、例えば配管１３Ａ、１３Ｂによって構成され得るが、これに限定されるものではない。配管一般について説明する際には、符号１３を用い、個々の配管について説明する際には、符号１３Ａ、１３Ｂを用いる。 As shown in FIG. 1A, the vacuum pressure supply system 10 according to the present embodiment is provided with a vacuum pressure supply path 12. The vacuum pressure supply path 12 may supply the vacuum pressure generated by the vacuum source 16 to the holding portion 14 described later. That is, the vacuum pressure supply path 12 can supply a pressure lower than the atmospheric pressure to the holding portion 14, which will be described later. The holding portion 14 may hold the object 18 using vacuum pressure. The holding force of the holding portion 14 is proportional to the pressure difference between the space inside the holding portion 14 and the atmosphere. Therefore, from the viewpoint of reliably holding the object 18 described later by the holding portion 14, it is preferable that the holding portion 14 is supplied with a pressure sufficiently lower than the atmospheric pressure. Specifically, it is preferable that the vacuum pressure is supplied to the holding portion 14. Here, a case where a vacuum pressure is supplied to the holding portion 14 will be described as an example. The length of the vacuum pressure supply path 12 is, for example, about 2 to 3 m, but the length is not limited to this. The inner diameter of the vacuum pressure supply path 12 is, for example, about 4.5 mm, but is not limited thereto. The vacuum pressure supply path 12 may be configured by, for example, pipes 13A and 13B, but is not limited thereto. Reference numeral 13 is used when describing pipes in general, and reference numerals 13A and 13B are used when describing individual pipes.
　真空源１６は、例えば、真空ポンプ等の真空圧発生装置によって構成され得る。真空源１６は、真空圧供給路１２を介して保持部１４に真空圧を供給し得る。 The vacuum source 16 may be configured by, for example, a vacuum pressure generator such as a vacuum pump. The vacuum source 16 may supply the vacuum pressure to the holding portion 14 via the vacuum pressure supply path 12.
　保持部１４は、例えば、主軸装置２４に備えられた真空チャックである。保持部１４は、真空源１６から供給される真空圧を用いて物体１８を吸着保持し得る。保持部１４は、主軸装置２４に備えられた不図示の主軸シャフトの一端に備えられており、当該主軸シャフトの回転に連動して不図示の主軸ハウジングの前側で回転し得る。保持部１４は、例えば円盤状に形成されているが、他の形状であってもよい。保持部１４には、主軸シャフトの前側に固定されたベース部材２０と、ベース部材２０に対して着脱可能に取り付けられた吸着パッド２２とが備えられている。ベース部材２０及び吸着パッド２２には、外部から吸引された空気が流れる吸引流路２６が形成されている。吸着パッド２２の吸着面側には、吸引流路２６の吸引口２６ａが複数設けられている。物体１８は、例えばワーク等であるが、これに限定されるものではない。 The holding portion 14 is, for example, a vacuum chuck provided in the spindle device 24. The holding portion 14 can adsorb and hold the object 18 by using the vacuum pressure supplied from the vacuum source 16. The holding portion 14 is provided at one end of a spindle shaft (not shown) provided in the spindle device 24, and may rotate on the front side of the spindle housing (not shown) in association with the rotation of the spindle shaft. The holding portion 14 is formed in a disk shape, for example, but may have another shape. The holding portion 14 includes a base member 20 fixed to the front side of the spindle shaft, and a suction pad 22 detachably attached to the base member 20. The base member 20 and the suction pad 22 are formed with a suction flow path 26 through which air sucked from the outside flows. A plurality of suction ports 26a of the suction flow path 26 are provided on the suction surface side of the suction pad 22. The object 18 is, for example, a work or the like, but is not limited thereto.
　真空圧供給路１２上には、真空圧を蓄えるタンク２８が備えられている。タンク２８の容積は、真空圧供給路１２を構成する配管１３の内側の容積に対して充分に大きく設定されている。タンク２８の容積は、例えば５リットル程度であるが、これに限定されるものではない。タンク２８には、例えば、開口２９Ａと開口２９Ｂとが備えられている。図１Ａに示す例においては、配管１３Ａの一端が、タンク２８の開口２９Ａに接続されており、配管１３Ａの他端が、真空源１６に接続されている。また、図１Ａに示す例においては、配管１３Ｂの一端が、タンク２８の開口２９Ｂに接続されており、配管１３Ｂの他端が、吸引流路２６に接続されている。即ち、図１Ａに示す例においては、配管１３Ｂの一端が、タンク２８の開口２９Ｂに接続されており、配管１３Ｂの他端が、真空圧通路に接続されている。開口一般について説明する際には、符号２９を用い、個々の開口について説明する際には、符号２９Ａ、２９Ｂを用いる。 A tank 28 for storing vacuum pressure is provided on the vacuum pressure supply path 12. The volume of the tank 28 is set sufficiently larger than the volume inside the pipe 13 constituting the vacuum pressure supply path 12. The volume of the tank 28 is, for example, about 5 liters, but the volume is not limited to this. The tank 28 is provided with, for example, an opening 29A and an opening 29B. In the example shown in FIG. 1A, one end of the pipe 13A is connected to the opening 29A of the tank 28, and the other end of the pipe 13A is connected to the vacuum source 16. Further, in the example shown in FIG. 1A, one end of the pipe 13B is connected to the opening 29B of the tank 28, and the other end of the pipe 13B is connected to the suction flow path 26. That is, in the example shown in FIG. 1A, one end of the pipe 13B is connected to the opening 29B of the tank 28, and the other end of the pipe 13B is connected to the vacuum pressure passage. Reference numeral 29 is used when describing the openings in general, and reference numerals 29A and 29B are used when describing individual openings.
　真空源１６から真空圧供給路１２に正常に真空圧が供給されている際には、図１Ａに示すように、真空圧供給路１２に真空圧が供給される。即ち、真空源１６によって生成される真空圧は、配管１３Ａを介してタンク２８に供給される。配管１３Ａを介してタンク２８に供給される真空圧は、配管１３Ｂを介して保持部１４に供給される。 When the vacuum pressure is normally supplied from the vacuum source 16 to the vacuum pressure supply path 12, the vacuum pressure is supplied to the vacuum pressure supply path 12 as shown in FIG. 1A. That is, the vacuum pressure generated by the vacuum source 16 is supplied to the tank 28 via the pipe 13A. The vacuum pressure supplied to the tank 28 via the pipe 13A is supplied to the holding portion 14 via the pipe 13B.
　真空源１６の故障、真空圧供給路１２が破損等によって、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた際には、図１Ｂに示すように、タンク２８内に蓄えられている真空圧が、配管１３Ｂを介して保持部１４に供給され得る。タンク２８の容積が充分に大きいため、タンク２８に蓄えられている真空圧が比較的長時間に亘って保持部１４に供給され続ける。このため、本実施形態によれば、保持部１４に供給される真空圧の急激な減少が抑制される。 When the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted due to a failure of the vacuum source 16 or damage to the vacuum pressure supply path 12, it is stored in the tank 28 as shown in FIG. 1B. The vacuum pressure being applied can be supplied to the holding portion 14 via the pipe 13B. Since the volume of the tank 28 is sufficiently large, the vacuum pressure stored in the tank 28 continues to be supplied to the holding portion 14 for a relatively long time. Therefore, according to the present embodiment, a rapid decrease in the vacuum pressure supplied to the holding portion 14 is suppressed.
　なお、図１Ｂに示すように、タンク２８に蓄えられていた真空圧の一部は、配管１３Ａを介して真空源１６側にも供給され得る。 As shown in FIG. 1B, a part of the vacuum pressure stored in the tank 28 can be supplied to the vacuum source 16 side via the pipe 13A.
　図２は、評価結果を示すグラフである。図２の横軸は、真空源１６から真空圧供給路１２への真空圧の供給が途絶えてからの時間を示している。図２の縦軸は、保持部１４に供給される真空圧の大きさを示している。図２における実施例１は、本実施形態の場合を示している。即ち、図２における実施例１は、真空圧供給路１２上にタンク２８が設けられている場合を示している。図２における比較例１は、真空圧供給路１２上にタンク２８が設けられていない場合を示している。 FIG. 2 is a graph showing the evaluation results. The horizontal axis of FIG. 2 indicates the time after the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off. The vertical axis of FIG. 2 shows the magnitude of the vacuum pressure supplied to the holding portion 14. Example 1 in FIG. 2 shows the case of the present embodiment. That is, Example 1 in FIG. 2 shows a case where the tank 28 is provided on the vacuum pressure supply path 12. Comparative Example 1 in FIG. 2 shows a case where the tank 28 is not provided on the vacuum pressure supply path 12.
　図２から分かるように、比較例１の場合には、真空源１６から真空圧供給路１２への真空圧の供給が途絶えると、保持部１４に供給される真空圧が、比較的短時間で減少してしまう。これに対し、実施例１、即ち、本実施形態の場合には、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた後、保持部１４に供給される真空圧は、比較的長時間に亘って充分に維持され続ける。 As can be seen from FIG. 2, in the case of Comparative Example 1, when the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off, the vacuum pressure supplied to the holding portion 14 becomes relatively short. It will decrease. On the other hand, in the case of the first embodiment, that is, in the present embodiment, the vacuum pressure supplied to the holding unit 14 after the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off is compared. It will continue to be sufficiently maintained for a long period of time.
　このように、本実施形態によれば、真空圧供給路１２上にタンク２８が備えられているため、真空源１６から真空圧供給路１２への真空圧の供給が途絶えたとしても、タンク２８に蓄えられている真空圧が比較的長時間に亘って保持部１４に供給され続ける。このため、本実施形態によれば、真空圧が過度に減少してしまうまでの時間的な猶予を充分に長くすることができる。真空圧が過度に減少してしまうまでの時間的な猶予を充分に長くすることができるため、本実施形態によれば、真空圧が過度に減少してしまう前に、物体１８を載置等することが可能となる。このため、本実施形態によれば、真空源１６から真空圧供給路１２への真空圧の供給が途絶えたとしても、真空圧を用いて保持される物体１８の落下を防止することができ、ひいては、物体１８の損傷を防止することができる。 As described above, according to the present embodiment, since the tank 28 is provided on the vacuum pressure supply path 12, even if the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, the tank 28 is provided. The vacuum pressure stored in the holding unit 14 continues to be supplied to the holding unit 14 for a relatively long period of time. Therefore, according to the present embodiment, it is possible to sufficiently lengthen the time grace until the vacuum pressure is excessively reduced. Since the time grace until the vacuum pressure is excessively reduced can be sufficiently long, according to the present embodiment, the object 18 is placed before the vacuum pressure is excessively reduced. It becomes possible to do. Therefore, according to the present embodiment, even if the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, it is possible to prevent the object 18 held by using the vacuum pressure from falling. As a result, damage to the object 18 can be prevented.
　［第２実施形態］
　第２実施形態による真空圧供給システムについて図３Ａ及び図３Ｂを用いて説明する。図１Ａ～図２に示す第１実施形態による真空圧供給システムと同一の構成要素には、同一の符号を付して説明を省略又は簡潔にする。図３Ａ及び図３Ｂは、本実施形態による真空圧供給システムを示すブロック図である。図３Ａは、真空源１６から真空圧供給路１２に真空圧が正常に供給されている状態を示している。図３Ｂは、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた状態を示している。図３Ａ及び図３Ｂの矢印は、真空圧の供給を概念的に示している。 [Second Embodiment]
The vacuum pressure supply system according to the second embodiment will be described with reference to FIGS. 3A and 3B. The same components as those of the vacuum pressure supply system according to the first embodiment shown in FIGS. 1A to 2 are designated by the same reference numerals, and the description thereof will be omitted or simplified. 3A and 3B are block diagrams showing a vacuum pressure supply system according to the present embodiment. FIG. 3A shows a state in which the vacuum pressure is normally supplied from the vacuum source 16 to the vacuum pressure supply path 12. FIG. 3B shows a state in which the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off. The arrows in FIGS. 3A and 3B conceptually indicate the supply of vacuum pressure.
　上述したように、第１実施形態による真空圧供給システム１０においては、タンク２８に蓄えられていた真空圧の一部が、配管１３Ａを介して真空源１６側にも供給され得る。タンク２８内に蓄えられていた真空圧を、配管１３Ｂを介して保持部１４により充分に供給する観点からは、タンク２８に蓄えられていた真空圧の一部が、配管１３Ａを介して真空源１６側に供給されないことが好ましい。そこで、本実施形態による真空圧供給システム１０は、真空源１６とタンク２８との間における真空圧供給路１２上に電磁弁３２を設け、タンク２８に蓄えられていた真空圧の一部が、配管１３Ａを介して真空源１６側に供給されないようにしている。 As described above, in the vacuum pressure supply system 10 according to the first embodiment, a part of the vacuum pressure stored in the tank 28 can be supplied to the vacuum source 16 side via the pipe 13A. From the viewpoint of sufficiently supplying the vacuum pressure stored in the tank 28 to the holding portion 14 via the pipe 13B, a part of the vacuum pressure stored in the tank 28 is a vacuum source via the pipe 13A. It is preferable that it is not supplied to the 16 side. Therefore, in the vacuum pressure supply system 10 according to the present embodiment, the solenoid valve 32 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the tank 28, and a part of the vacuum pressure stored in the tank 28 is removed. It is prevented from being supplied to the vacuum source 16 side via the pipe 13A.
　図３Ａに示すように、真空源１６とタンク２８との間における真空圧供給路１２上には、電磁弁３２が備えられている。電磁弁３２は、例えばノーマルクローズの電磁弁であるが、これに限定されるものではない。 As shown in FIG. 3A, a solenoid valve 32 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the tank 28. The solenoid valve 32 is, for example, a normally closed solenoid valve, but is not limited thereto.
　真空圧供給路１２上には、圧力センサ３０が備えられている。圧力センサ３０は、真空源１６から真空圧供給路１２に供給される真空圧の大きさを検出し得る。図３Ａに示す例においては、真空源１６と電磁弁３２との間における真空圧供給路１２上に圧力センサ３０が備えられているが、これに限定されるものではない。電磁弁３２と保持部１４との間における真空圧供給路１２上に圧力センサ３０が備えられていてもよい。電磁弁３２と保持部１４との間における真空圧供給路１２上に圧力センサ３０が備えられている場合であっても、真空源１６から供給される真空圧の大きさを当該圧力センサ３０によって検出し得る。 A pressure sensor 30 is provided on the vacuum pressure supply path 12. The pressure sensor 30 can detect the magnitude of the vacuum pressure supplied from the vacuum source 16 to the vacuum pressure supply path 12. In the example shown in FIG. 3A, the pressure sensor 30 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the solenoid valve 32, but the pressure sensor 30 is not limited thereto. A pressure sensor 30 may be provided on the vacuum pressure supply path 12 between the solenoid valve 32 and the holding portion 14. Even when the pressure sensor 30 is provided on the vacuum pressure supply path 12 between the electromagnetic valve 32 and the holding portion 14, the magnitude of the vacuum pressure supplied from the vacuum source 16 is determined by the pressure sensor 30. Can be detected.
　真空圧供給システム１０には、制御装置３４が更に備えられている。制御装置３４には、演算部３６と、記憶部３８とが備えられている。演算部３６は、例えば、ＣＰＵ（Ｃｅｎｔｒａｌ　Ｐｒｏｃｅｓｓｉｎｇ　Ｕｎｉｔ）等のプロセッサによって構成され得るが、これに限定されるものではない。演算部３６には、制御部４０と、判定部４２と、表示制御部４４とが備えられている。制御部４０と、判定部４２と、表示制御部４４とは、記憶部３８に記憶されているプログラムが演算部３６によって実行されることによって実現され得る。 The vacuum pressure supply system 10 is further provided with a control device 34. The control device 34 includes a calculation unit 36 and a storage unit 38. The arithmetic unit 36 may be configured by, for example, a processor such as a CPU (Central Processing Unit), but is not limited thereto. The calculation unit 36 includes a control unit 40, a determination unit 42, and a display control unit 44. The control unit 40, the determination unit 42, and the display control unit 44 can be realized by executing the program stored in the storage unit 38 by the calculation unit 36.
　記憶部３８には、例えば、不図示の揮発性メモリと、不図示の不揮発性メモリとが備えられている。揮発性メモリとしては、例えばＲＡＭ（Ｒａｎｄｏｍ　Ａｃｃｅｓｓ　Ｍｅｍｏｒｙ）等が挙げられる。不揮発性メモリとしては、例えばＲＯＭ（Ｒｅａｄ　Ｏｎｌｙ　Ｍｅｍｏｒｙ）、フラッシュメモリ等が挙げられる。プログラム、データ等が、記憶部３８に記憶され得る。圧力センサ３０によって検出される圧力等に関しての正常範囲を示すデータが、記憶部３８に予め記憶され得る。 The storage unit 38 is provided with, for example, a volatile memory (not shown) and a non-volatile memory (not shown). Examples of the volatile memory include RAM (Random Access Memory) and the like. Examples of the non-volatile memory include ROM (Read Only Memory) and flash memory. Programs, data and the like can be stored in the storage unit 38. Data indicating a normal range with respect to the pressure or the like detected by the pressure sensor 30 can be stored in advance in the storage unit 38.
　制御部４０は、制御装置３４の全体の制御を司る。制御部４０は、電磁弁３２の開閉の制御を行い得る。 The control unit 40 controls the entire control device 34. The control unit 40 can control the opening and closing of the solenoid valve 32.
　判定部４２は、圧力センサ３０によって検出された圧力が正常範囲内であるか否かを判定し得る。圧力センサ３０によって検出された圧力が正常範囲外（正常圧力範囲外）であることが判定部４２によって判定された場合、制御部４０は、電磁弁３２を閉じる制御を行い得る。 The determination unit 42 can determine whether or not the pressure detected by the pressure sensor 30 is within the normal range. When the determination unit 42 determines that the pressure detected by the pressure sensor 30 is out of the normal range (outside the normal pressure range), the control unit 40 may control to close the solenoid valve 32.
　上述したように、図３Ａに示す例においては、真空源１６と電磁弁３２との間に圧力センサ３０を位置させている。図３Ａに示す例において、真空源１６と電磁弁３２との間に圧力センサ３０を位置させているのは、以下のような理由によるものである。即ち、圧力センサ３０によって検出された圧力が正常圧力範囲外である場合には、制御部４０によって電磁弁３２が閉じられる。電磁弁３２と保持部１４との間に圧力センサ３０を位置させた場合には、閉じられた電磁弁３２によって圧力センサ３０への真空圧の供給が遮断されるため、真空源１６から供給される真空圧が正常に復帰したか否かを圧力センサ３０によって検出し得ない。これに対し、真空源１６と電磁弁３２との間に圧力センサ３０を位置させた場合には、電磁弁３２が閉じられている場合であっても、真空源１６から供給される真空圧が正常に復帰したか否かを圧力センサ３０によって検出し得る。このような理由により、図３Ａに示す例においては、真空源１６と電磁弁３２との間に圧力センサ３０を位置させている。なお、上述したように、電磁弁３２と保持部１４との間における真空圧供給路１２上に圧力センサ３０が備えられていてもよい。この場合には、閉じられた電磁弁３２を開くことにより、真空源１６から供給される真空圧が正常に復帰したか否かを圧力センサ３０によって検出し得る。 As described above, in the example shown in FIG. 3A, the pressure sensor 30 is positioned between the vacuum source 16 and the solenoid valve 32. In the example shown in FIG. 3A, the pressure sensor 30 is positioned between the vacuum source 16 and the solenoid valve 32 for the following reasons. That is, when the pressure detected by the pressure sensor 30 is out of the normal pressure range, the solenoid valve 32 is closed by the control unit 40. When the pressure sensor 30 is positioned between the electromagnetic valve 32 and the holding portion 14, the vacuum pressure supply to the pressure sensor 30 is cut off by the closed electromagnetic valve 32, so that the pressure sensor 30 is supplied from the vacuum source 16. It cannot be detected by the pressure sensor 30 whether or not the vacuum pressure has returned to normal. On the other hand, when the pressure sensor 30 is positioned between the vacuum source 16 and the electromagnetic valve 32, the vacuum pressure supplied from the vacuum source 16 is applied even when the electromagnetic valve 32 is closed. Whether or not it has returned to normal can be detected by the pressure sensor 30. For this reason, in the example shown in FIG. 3A, the pressure sensor 30 is positioned between the vacuum source 16 and the solenoid valve 32. As described above, the pressure sensor 30 may be provided on the vacuum pressure supply path 12 between the solenoid valve 32 and the holding portion 14. In this case, by opening the closed solenoid valve 32, the pressure sensor 30 can detect whether or not the vacuum pressure supplied from the vacuum source 16 has returned to normal.
　制御装置３４には、表示部４６が接続され得る。表示制御部４４は、圧力センサ３０によって検出された圧力等を表示部４６の表示画面に表示し得る。また、表示制御部４４は、圧力センサ３０によって検出された圧力が正常圧力範囲内であるか否かを、表示部４６の表示画面に表示し得る。表示部４６は、例えば、液晶ディスプレイ等によって構成され得るが、これに限定されるものではない。 A display unit 46 may be connected to the control device 34. The display control unit 44 may display the pressure or the like detected by the pressure sensor 30 on the display screen of the display unit 46. Further, the display control unit 44 may display on the display screen of the display unit 46 whether or not the pressure detected by the pressure sensor 30 is within the normal pressure range. The display unit 46 may be configured by, for example, a liquid crystal display or the like, but is not limited thereto.
　制御装置３４には、操作部４８が接続され得る。操作部４８は、例えば、キーボード、マウス等によって構成され得るが、これに限定されるものではない。表示部４６の画面に備えられた不図示のタッチパネルによって、操作部４８が構成されてもよい。ユーザは、操作部４８を介して制御装置３４に対する操作入力を行い得る。 An operation unit 48 may be connected to the control device 34. The operation unit 48 may be composed of, for example, a keyboard, a mouse, or the like, but is not limited thereto. The operation unit 48 may be configured by a touch panel (not shown) provided on the screen of the display unit 46. The user can input an operation to the control device 34 via the operation unit 48.
　真空源１６からの真空圧が真空圧供給路１２に正常に供給されている際には、図３Ａに示すように、真空圧が真空圧供給路１２に供給される。 When the vacuum pressure from the vacuum source 16 is normally supplied to the vacuum pressure supply path 12, the vacuum pressure is supplied to the vacuum pressure supply path 12 as shown in FIG. 3A.
　真空源１６から真空圧供給路１２への真空圧の供給が途絶えた際には、圧力センサ３０によって検出される圧力が正常圧力範囲外となり、制御部４０によって電磁弁３２が閉じられる。電磁弁３２が閉じられると、図３Ｂに示すように、タンク２８内に蓄えられている真空圧は、真空源１６側には供給されない。このため、本実施形態によれば、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた際には、タンク２８内に蓄えられている真空圧が、配管１３Ｂを介して保持部１４に充分に供給され得る。 When the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, the pressure detected by the pressure sensor 30 is out of the normal pressure range, and the electromagnetic valve 32 is closed by the control unit 40. When the solenoid valve 32 is closed, as shown in FIG. 3B, the vacuum pressure stored in the tank 28 is not supplied to the vacuum source 16 side. Therefore, according to the present embodiment, when the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, the vacuum pressure stored in the tank 28 is maintained via the pipe 13B. It can be sufficiently supplied to the unit 14.
　図４は、評価結果を示すグラフである。図４の横軸は、真空源１６から真空圧供給路１２への真空圧の供給が途絶えてからの時間を示している。図４の縦軸は、保持部１４に供給される真空圧の大きさを示している。図４における実施例２は、本実施形態の場合、即ち、真空源１６とタンク２８との間に電磁弁３２が設けられている場合を示している。図４における実施例１及び比較例１は、図２を用いて上述した実施例１及び比較例１と同様である。 FIG. 4 is a graph showing the evaluation results. The horizontal axis of FIG. 4 indicates the time after the supply of vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off. The vertical axis of FIG. 4 shows the magnitude of the vacuum pressure supplied to the holding portion 14. Example 2 in FIG. 4 shows the case of the present embodiment, that is, the case where the solenoid valve 32 is provided between the vacuum source 16 and the tank 28. Example 1 and Comparative Example 1 in FIG. 4 are the same as those of Example 1 and Comparative Example 1 described above with reference to FIG.
　図４から分かるように、実施例２、即ち、本実施形態の場合には、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた後、保持部１４に供給される真空圧は、極めて長時間に亘って充分に維持され続ける。 As can be seen from FIG. 4, in the second embodiment, that is, in the case of the present embodiment, the vacuum pressure supplied to the holding unit 14 after the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is cut off. Will continue to be well maintained for an extremely long period of time.
　このように、本実施形態によれば、真空源１６とタンク２８との間における真空圧供給路１２上に電磁弁３２が備えられており、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた場合には、電磁弁３２が閉じられる。このため、本実施形態によれば、真空源１６からの真空圧の供給が途絶えた際には、タンク２８内に蓄えられていた真空圧が、配管１３Ｂを介して保持部１４に充分に供給され得る。このため、本実施形態によれば、物体１８を保持するために用いられる真空圧の急激な減少をより確実に防止することができ、真空圧が過度に減少してしまうまでの時間的な猶予をより充分に長くすることができる。真空圧が過度に減少してしまうまでの時間的な猶予をより充分に長くすることができるため、本実施形態によれば、真空圧が過度に減少してしまう前に、物体１８を載置等させることが可能となる。このため、本実施形態によれば、真空源１６から真空圧供給路１２への真空圧の供給が途絶えたとしても、真空圧を用いて保持される物体１８が落下するのを防止することができ、ひいては、物体１８の損傷をより確実に防止することができる。 As described above, according to the present embodiment, the solenoid valve 32 is provided on the vacuum pressure supply path 12 between the vacuum source 16 and the tank 28, and the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is provided. When the supply of the vacuum is cut off, the solenoid valve 32 is closed. Therefore, according to the present embodiment, when the supply of the vacuum pressure from the vacuum source 16 is interrupted, the vacuum pressure stored in the tank 28 is sufficiently supplied to the holding portion 14 via the pipe 13B. Can be done. Therefore, according to the present embodiment, it is possible to more reliably prevent a sudden decrease in the vacuum pressure used for holding the object 18, and there is a time grace until the vacuum pressure is excessively decreased. Can be made longer enough. According to the present embodiment, the object 18 is placed before the vacuum pressure is excessively reduced because the time grace until the vacuum pressure is excessively reduced can be sufficiently extended. It becomes possible to make them equal. Therefore, according to the present embodiment, even if the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted, it is possible to prevent the object 18 held by using the vacuum pressure from falling. As a result, damage to the object 18 can be prevented more reliably.
　［変形実施形態］
　本発明についての好適な実施形態を上述したが、本発明は上記実施形態に限定されるものではなく、本発明の要旨を逸脱しない範囲において、種々の改変が可能である。 [Modification Embodiment]
Although the preferred embodiments of the present invention have been described above, the present invention is not limited to the above embodiments, and various modifications can be made without departing from the gist of the present invention.
　例えば、上記実施形態では、タンク２８に２つの開口２９Ａ、２９Ｂが備えられている場合を例に説明したが、これに限定されるものではない。タンク２８に備えられた開口２９が１つのみであってもよい。このような場合には、配管１３から分岐した不図示の分岐管を、タンク２８に備えられた１つの開口２９に接続すればよい。配管１３から分岐する分岐管がタンク２８に接続されている場合も、真空圧供給路１２上にタンク２８が設けられているといえる。配管１３から分岐する分岐管がタンク２８に接続されている場合においても、真空源１６から真空圧供給路１２への真空圧の供給が途絶えた際には、タンク２８に蓄えられている真空圧が比較的長時間に亘って保持部１４に供給され続ける。従って、このような構成においても、真空圧が過度に減少してしまうまでの時間的な猶予を充分に長くすることができる。 For example, in the above embodiment, the case where the tank 28 is provided with the two openings 29A and 29B has been described as an example, but the present invention is not limited to this. The tank 28 may have only one opening 29. In such a case, a branch pipe (not shown) branched from the pipe 13 may be connected to one opening 29 provided in the tank 28. Even when the branch pipe branching from the pipe 13 is connected to the tank 28, it can be said that the tank 28 is provided on the vacuum pressure supply path 12. Even when the branch pipe branching from the pipe 13 is connected to the tank 28, the vacuum pressure stored in the tank 28 is stored when the supply of the vacuum pressure from the vacuum source 16 to the vacuum pressure supply path 12 is interrupted. Continues to be supplied to the holding unit 14 for a relatively long period of time. Therefore, even in such a configuration, the time grace until the vacuum pressure is excessively reduced can be sufficiently long.
　また、上記実施形態では、保持部１４が主軸装置２４に備えられている場合を例に説明したが、これに限定されるものではない。保持部１４が、ロボットハンド等に備えられていてもよい。 Further, in the above embodiment, the case where the holding portion 14 is provided in the spindle device 24 has been described as an example, but the present invention is not limited to this. The holding portion 14 may be provided on a robot hand or the like.
　上記実施形態をまとめると以下のようになる。 The above embodiments can be summarized as follows.
　真空圧供給システム（１０）は、真空圧を用いて物体（１８）を保持する保持部（１４）に対して真空源（１６）からの前記真空圧を供給するための真空圧供給路（１２）と、前記真空圧供給路上に設けられ、前記真空圧を蓄えるタンク（２８）と、を備える。このような構成によれば、真空圧が過度に減少してしまうまでの時間的な猶予を充分に長くすることができるため、真空圧が過度に減少してしまう前に、物体を載置等させることが可能となる。このため、このような構成によれば、真空源から真空圧供給路への真空圧の供給が途絶えたとしても、真空圧を用いて保持される物体が落下するのを防止することができ、ひいては、真空圧を用いて保持される物体の損傷を防止することができる。 The vacuum pressure supply system (10) is a vacuum pressure supply path (12) for supplying the vacuum pressure from the vacuum source (16) to the holding portion (14) that holds the object (18) using the vacuum pressure. ), And a tank (28) provided on the vacuum pressure supply path and storing the vacuum pressure. According to such a configuration, the time grace until the vacuum pressure is excessively reduced can be sufficiently long, so that an object is placed before the vacuum pressure is excessively reduced. It is possible to make it. Therefore, according to such a configuration, even if the supply of the vacuum pressure from the vacuum source to the vacuum pressure supply path is interrupted, it is possible to prevent the object held by the vacuum pressure from falling. As a result, the vacuum pressure can be used to prevent damage to the held object.
　前記真空圧供給路上に備えられ、前記真空圧の大きさを検出する圧力センサ（３０）と、前記真空源と前記タンクとの間における前記真空圧供給路上に備えられた電磁弁（３２）と、前記圧力センサによって検出された前記真空圧が正常範囲外である場合に、前記電磁弁を閉じる制御を行う制御部（４０）と、を更に備えてもよい。このような構成によれば、真空源から真空圧供給路への真空圧の供給が途絶えた際に電磁弁が閉じられるため、タンク内に蓄えられていた真空圧が保持部に充分に供給され得る。このため、このような構成によれば、物体を保持するために用いられる真空圧の急激な減少をより確実に防止することができ、真空圧が過度に減少してしまうまでの時間的な猶予をより充分に長くすることができる。真空圧が過度に減少してしまうまでの時間的な猶予をより充分に長くすることができるため、このような構成によれば、真空圧が過度に減少してしまう前に、物体を載置等させることが可能となる。このため、このような構成によれば、真空源から真空圧供給路への真空圧の供給が途絶えたとしても、真空圧を用いて支持される物体の損傷をより確実に防止することができる。 A pressure sensor (30) provided on the vacuum pressure supply path and detecting the magnitude of the vacuum pressure, and an electromagnetic valve (32) provided on the vacuum pressure supply path between the vacuum source and the tank. Further, a control unit (40) for controlling the closing of the electromagnetic valve when the vacuum pressure detected by the pressure sensor is out of the normal range may be further provided. According to such a configuration, the solenoid valve is closed when the supply of vacuum pressure from the vacuum source to the vacuum pressure supply path is interrupted, so that the vacuum pressure stored in the tank is sufficiently supplied to the holding portion. obtain. Therefore, according to such a configuration, it is possible to more reliably prevent a sudden decrease in the vacuum pressure used for holding the object, and a time delay until the vacuum pressure is excessively decreased. Can be made longer enough. With such a configuration, the object is placed before the vacuum pressure is excessively reduced, as the time grace before the vacuum pressure is excessively reduced can be extended sufficiently. It becomes possible to make them equal. Therefore, according to such a configuration, even if the supply of the vacuum pressure from the vacuum source to the vacuum pressure supply path is interrupted, it is possible to more reliably prevent damage to the object supported by the vacuum pressure. ..
　前記圧力センサは、前記真空源と前記電磁弁との間における前記真空圧供給路上に備えられていてもよい。このような構成によれば、真空源から供給される真空圧が正常に復帰したか否かを、電磁弁が閉じている場合であっても当該圧力センサによって検出し得る。 The pressure sensor may be provided on the vacuum pressure supply path between the vacuum source and the solenoid valve. According to such a configuration, whether or not the vacuum pressure supplied from the vacuum source has returned to normal can be detected by the pressure sensor even when the solenoid valve is closed.
　前記保持部は、真空チャックであってもよい。 The holding portion may be a vacuum chuck.
　前記真空源は、真空ポンプであってもよい。 The vacuum source may be a vacuum pump.

Claims (5)

  1. 　真空圧を用いて物体（１８）を保持する保持部（１４）に対して真空源（１６）からの前記真空圧を供給するための真空圧供給路（１２）と、
    　前記真空圧供給路上に設けられ、前記真空圧を蓄えるタンク（２８）と、
    　を備える、真空圧供給システム（１０）。     A vacuum pressure supply path (12) for supplying the vacuum pressure from the vacuum source (16) to the holding portion (14) that holds the object (18) using the vacuum pressure.
    A tank (28) provided on the vacuum pressure supply path and storing the vacuum pressure,
    A vacuum pressure supply system (10).
  2. 　請求項１に記載の真空圧供給システムにおいて、
    　前記真空圧供給路上に備えられ、前記真空圧の大きさを検出する圧力センサ（３０）と、
    　前記真空源と前記タンクとの間における前記真空圧供給路上に備えられた電磁弁（３２）と、
    　前記圧力センサによって検出された前記真空圧が正常範囲外である場合に、前記電磁弁を閉じる制御を行う制御部（４０）と、
    　を更に備える、真空圧供給システム。     In the vacuum pressure supply system according to claim 1,
    A pressure sensor (30) provided on the vacuum pressure supply path and detecting the magnitude of the vacuum pressure,
    A solenoid valve (32) provided on the vacuum pressure supply path between the vacuum source and the tank,
    A control unit (40) that controls closing of the solenoid valve when the vacuum pressure detected by the pressure sensor is out of the normal range.
    Vacuum pressure supply system further equipped with.
  3. 　請求項２に記載の真空圧供給システムにおいて、
    　前記圧力センサは、前記真空源と前記電磁弁との間における前記真空圧供給路上に備えられている、真空圧供給システム。     In the vacuum pressure supply system according to claim 2,
    The pressure sensor is a vacuum pressure supply system provided on the vacuum pressure supply path between the vacuum source and the solenoid valve.
  4. 　請求項１～３のいずれか１項に記載の真空圧供給システムにおいて、
    　前記保持部は、真空チャックである、真空圧供給システム。     In the vacuum pressure supply system according to any one of claims 1 to 3.
    The holding portion is a vacuum pressure supply system which is a vacuum chuck.
  5. 　請求項１～４のいずれか１項に記載の真空圧供給システムにおいて、
    　前記真空源は、真空ポンプである、真空圧供給システム。     In the vacuum pressure supply system according to any one of claims 1 to 4.
    The vacuum source is a vacuum pressure supply system, which is a vacuum pump.
PCT/JP2021/027622 2020-07-30 2021-07-27 Vacuum pressure supply system WO2022025018A1 (en)

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4927869U (en) * 1972-06-14 1974-03-09
JPH0451539A (en) * 1990-06-19 1992-02-20 Canon Inc Substrate carrying apparatus
JPH04201086A (en) * 1990-11-29 1992-07-22 House Food Ind Co Ltd Suction type robot hand
JPH07311203A (en) * 1994-05-10 1995-11-28 Bayer Corp Vacuum suction method for test piece and vacuum suction circuit device thereof
JPH10107105A (en) * 1996-09-30 1998-04-24 Dainippon Screen Mfg Co Ltd Pressure stabilization device and measuring instrument for electrical characteristics of substrate with it
JP2000164674A (en) * 1998-11-26 2000-06-16 Nikon Corp Substrate transfer device and its method
US20160059425A1 (en) * 2013-04-02 2016-03-03 Inva Invest Holding Aps Flow blocking valve, a vacuum lifting device and a method for operating a vacuum lifting device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4927869U (en) * 1972-06-14 1974-03-09
JPH0451539A (en) * 1990-06-19 1992-02-20 Canon Inc Substrate carrying apparatus
JPH04201086A (en) * 1990-11-29 1992-07-22 House Food Ind Co Ltd Suction type robot hand
JPH07311203A (en) * 1994-05-10 1995-11-28 Bayer Corp Vacuum suction method for test piece and vacuum suction circuit device thereof
JPH10107105A (en) * 1996-09-30 1998-04-24 Dainippon Screen Mfg Co Ltd Pressure stabilization device and measuring instrument for electrical characteristics of substrate with it
JP2000164674A (en) * 1998-11-26 2000-06-16 Nikon Corp Substrate transfer device and its method
US20160059425A1 (en) * 2013-04-02 2016-03-03 Inva Invest Holding Aps Flow blocking valve, a vacuum lifting device and a method for operating a vacuum lifting device

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