WO2021255113A1 - Messsystem und verfahren zur vermessung von lichtquellen - Google Patents
Messsystem und verfahren zur vermessung von lichtquellen Download PDFInfo
- Publication number
- WO2021255113A1 WO2021255113A1 PCT/EP2021/066280 EP2021066280W WO2021255113A1 WO 2021255113 A1 WO2021255113 A1 WO 2021255113A1 EP 2021066280 W EP2021066280 W EP 2021066280W WO 2021255113 A1 WO2021255113 A1 WO 2021255113A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- matrix
- image sensors
- measuring system
- light source
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 12
- 239000011159 matrix material Substances 0.000 claims abstract description 47
- 238000005259 measurement Methods 0.000 claims abstract description 46
- 230000010287 polarization Effects 0.000 claims description 57
- 230000003287 optical effect Effects 0.000 claims description 11
- 230000005540 biological transmission Effects 0.000 claims description 9
- 230000003595 spectral effect Effects 0.000 claims description 8
- 230000001419 dependent effect Effects 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 238000012937 correction Methods 0.000 description 20
- 230000035945 sensitivity Effects 0.000 description 12
- 238000007796 conventional method Methods 0.000 description 3
- 238000012935 Averaging Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 230000003245 working effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/18—Arrangements with more than one light path, e.g. for comparing two specimens
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0411—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using focussing or collimating elements, i.e. lenses or mirrors; Aberration correction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0429—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using polarisation elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
- G01J4/02—Polarimeters of separated-field type; Polarimeters of half-shadow type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/106—Beam splitting or combining systems for splitting or combining a plurality of identical beams or images, e.g. image replication
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
- G02B27/285—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining comprising arrays of elements, e.g. microprisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/288—Filters employing polarising elements, e.g. Lyot or Solc filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J2001/4247—Photometry, e.g. photographic exposure meter using electric radiation detectors for testing lamps or other light sources
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
- G01J2001/4446—Type of detector
- G01J2001/448—Array [CCD]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0205—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows
- G01J3/0218—Optical elements not provided otherwise, e.g. optical manifolds, diffusers, windows using optical fibers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
Definitions
- the invention relates to a measuring system for polarization-independent measuring of a light source, with a camera having a plurality of image sensors arranged in a matrix and with microscope optics.
- the invention also relates to a method that uses such a measuring system.
- Such measuring systems are used to measure light sources microscopically with the aid of the camera and - after suitable calibration - to determine the distribution of the absolute power of the light source.
- the light source can in particular be an arrangement of VCSEL elements (vertical cavity surface emitting laser), for example in the form of a VCSEL matrix on a wafer.
- the light emitted by the individual VCSEL elements is polarized, the direction of polarization being indefinite or changing over time.
- the image sensors in known measuring systems that use CMOS cameras are polarization-dependent. The indeterminate polarization of the light to be measured can result in systematic errors of up to 10% when measuring the light output.
- the depolarizers In order to cancel or reduce the polarization of light, there are various types of depolarizers that convert polarized light into unpolarized light.
- the depolarizers have the disadvantage that they only function extremely inadequately because the light source has a spectrum that is too narrow, as a result of which a residual polarization is retained and / or due to birefringent ones Properties the required spatial resolution when measuring the incident light can no longer be obtained.
- the invention proposes that a linear polarizer is assigned to each of the image sensors, the linear polarizers being arranged in a matrix in front of the image sensors and two or more, preferably four, polarizers forming a matrix block, with the transmission directions adjacent linear polarizers within a matrix block are rotated relative to one another, preferably by 45 ° or by 90 °.
- the invention proposes a method for the polarization-independent measurement of a light source using such a measurement system in which
- the light source emits light that is focused on the camera's image sensors through the microscope optics
- the light passes through the polarizers assigned to the respective image sensors, - and the light is captured by the image sensors, each image sensor converting the light incident on the image sensor into a measurement signal,
- the use of a matrix of polarizers in front of the individual image sensors clearly defines the polarization of the light hitting the respective image sensor.
- the polarization sensitivity of the image sensors is thus compensated and the error budget of the measurement is minimized by averaging the measurement signals.
- averaging over the measurement signals a polarization-independent value is obtained, which is linked to the absolute power via a value obtained through a calibration.
- the spatial resolution when measuring the light power distribution can be specified by the microscope optics in combination with the size of the matrix blocks.
- the transmission direction specifies the direction of the electric field of the electromagnetic light wave that is perpendicular to the direction of the beam path and that can pass through the respective polarizer.
- a rotation of 90 ° of the transmission directions of the adjacent polarizers is sufficient to neutralize the polarization effect. The rotation by 45 ° enables the polarization to be measured.
- micro-lenses are arranged in a matrix in front of the polarization filters.
- the incident light is optimally distributed on the light-sensitive surface of each image sensor, thus increasing the sensitivity of the image sensors and reducing noise.
- a beam splitter is used and the light from the light source of the camera and, at the same time, can be fed to a spectral measuring device by means of the beam splitter.
- a spectral measuring device By using a spectral measuring device, the measurement can be made more precise with regard to the light intensity / power and the spectrum.
- the spectral measuring device can be used to calibrate the camera.
- a spectroradiometer for example, can be used as the spectral measuring device.
- Spectroradiometers have proven themselves through a precise and reliable measurement method.
- the spectroradiometer can be designed to carry out a so-called spot measurement, i.e., unlike the camera, it does not measure with spatial resolution.
- spot measurement i.e., unlike the camera, it does not measure with spatial resolution.
- individual VCSEL elements of the light source can be addressed by a diaphragm that can be moved across the beam path and precisely measured using the spectroradiometer.
- the spectral measuring device can have an optical edge filter that can be swiveled or retracted into the beam path between the light source and the camera. An image is recorded by means of the camera without and another image is recorded with the optical edge filter swiveled in.
- the absorption edge of the edge filter is in the range of the (previously known) mean emission wavelength of the light source, so that an individual absorption value of the edge filter can be assigned to each wavelength. From the comparison of the measurement signals of the two measurements, the wavelength for each individual pixel can then be determined very easily on the basis of the known filter characteristics. This is best done using software.
- each individual VCSEL element can be identified on the basis of its position in the image in order to be able to assign an individual emission wavelength to each VCSEL element.
- this measuring principle also works independently of those assigned to the image sensors Polarizers, ie with any measuring system that has a plurality of camera having a plurality of image sensors arranged in the form of a matrix and in which an optical edge filter is provided which can be swiveled or retracted into the beam path between the light source and the camera.
- the microscope optics have at least one optical filter, for example a neutral density filter, in order to adapt the intensity of the light emission to the sensitivity of the camera.
- the microscope optics have a tube lens. This makes it possible to implement the microscope with so-called “infinite optics”, so that there is flexibility when inserting intermediate elements (filters, beam splitters, etc.) into the beam path.
- a disadvantage of the approach of the invention can be that an interpolation between the image sensors may be necessary in order to obtain the full resolution of the matrix-like arrangement. This is not a fundamental disadvantage, a corresponding interpolation is common with conventional RGB camera sensors.
- the magnification and the numerical aperture of the microscope optics are selected so that the optical resolution is lower than the geometric “digital” resolution that results from the arrangement and size of the matrix blocks. This ensures that the Nyquist criteria are met so that no information is lost.
- FIGS. 1 a and 1 b a schematic 3D view of a measuring system according to the invention with a housing (a) and without a housing (b);
- FIG. 2 Schematically the detail area A from FIG. 1b
- FIGS. 3a and 3b Schematically the structure of the polarizers for use in a measuring system according to the invention
- FIGS. 4a and 4b total power measurement with different polarizations without polarization correction (4a) and with polarization correction (4b);
- FIG. 5 Total power measurement with a conventional camera and, according to the invention, a camera with polarizers including polarization correction.
- FIG. 1b shows the inner workings of the measuring system with the housing 1 removed. Behind the microscope objective 2, further elements of a microscope optics M are arranged, the individual components of which will be discussed further below (see FIG. 2). Furthermore, a beam splitter 3 is provided which guides part of the light via a coupling optics 4 into a light-guiding fiber F, of which only a short section is shown. This leads the light to a spectroradiometer (not shown) in order to carry out a spectral measurement. A camera 5 is also provided which captures the other part of the light for spatially resolved measurement of the light output.
- FIG. 2 shows the microscope optics M from FIG. 1b in detail. Optical filters 6 and a tube lens 7 are arranged behind microscope objective 2.
- FIG. 3 a three matrix arrangements (8, 9, 10) are shown, which are components of the camera 5.
- the matrix arrangement 8 in the foreground is made up of micro-lenses 11.
- the rear matrix arrangement 10 is formed from individual image sensors 12.
- the image sensors 12 are, for example, as CMOS sensors or
- a further matrix arrangement 9 is located between these two matrix arrangements 8, 10.
- the matrix arrangement 8 is made up of polarizers 13. The transmission angles of the polarizers 13 lying next to one another are different. Each polarizer 13 is assigned to an image sensor 12 and a micro lens 11. The polarizers 13 are additionally subdivided into 2 ⁇ 2 matrix blocks 13a. Such a matrix block 13a is shown schematically in FIG. 3b.
- the transmission directions of the individual polarizers 13 of a matrix block 13a are here each rotated by 45 ° with respect to the adjacent polarizers 13 and, in this exemplary embodiment, are at 0 °, 45 °, 90 ° and 135 °.
- the light is emitted by the light source.
- the light is introduced into the measuring system via the microscope objective 2 and passed through the optical filter 6 and the tube lens 7 to the beam splitter 3.
- the light is guided via the beam splitter 3 to the camera 5 and parallel to the spectroradiometer.
- the camera the light hits the image sensors 12 via the micro-lenses 11 and through the polarizers 13.
- the light is detected by the image sensors 12 and converted into electrical measurement signals.
- the measurement signals of the image sensors 12, which are assigned to a 2 ⁇ 2 matrix block 13a are each converted into a power measurement value that has been freed from polarization effects.
- the light output can be determined precisely in a spatially resolved manner.
- a calibration for example by preliminary measurement of a reference light source, is required.
- the opening angle of the light emission can be determined by varying the distance between the light source and the measuring system and thereby observing the change in the image scale on the sensor array 10. This is of particular interest when measuring VCSEL arrays.
- the measuring system enables quick, easy and precise measurement of the absolute power of individual emitters of a VCSEL array.
- a polarization-dependent correction factor can be used to convert the measurement signals into power measurement values.
- the 2D polarization information contained in each matrix block is used to find the correct correction factor for each pixel.
- a typical calibration for a camera consists of a bad pixel correction, a dark current correction (,, img_dark (x, y)) ”), a
- img_cal (x, y) (img_raw (x, y) - img_dark (x, y)) * img_ffc (x, y) * sensitivity (lambda) - “img_raw“ is the image as it is seen by the camera, with the raw camera pixels.
- img_dark is the dark noise of the camera, typically measured with the camera in a black environment without light.
- alpha (x, y) describes the polarization angle at position (x, y), measured by the camera and its polarization-sensitive pixels (matrix blocks),
- alphaO (x, y) describes the zero phase polarization (depending on the polarization filters of the respective matrix block at position x, y of the sensor matrix); - “AOff (x, y)” describes a position-dependent offset of the amplitude.
- a possible offset due to non-ideal polarizers can be calculated from the four different polarization images
- Measure camera This must be done over the entire wavelength calibration range and provides a scalar factor for each wavelength. This is required for the absolute calibration of the camera. This provides the value for the sensitivity correction "sensivity (lambda)".
- sensitivity correction "sensivity (lambda)".
- FIGS. 4a and 4b a total power measurement with and without polarization correction is compared side by side. The measurement was carried out by rotating the light source in 45 ° steps. The measurement was carried out with a polarized light source and a typical CMOS camera with microscope optics. In FIG. 4a, a difference in the pixel sum of more than 10% can only be seen by rotating the polarization of the light source by 90 °.
- FIG. 4b shows the result of the measurement of the same light source using a camera with polarization filters and with the implementation of a polarization correction, as described above. There is almost no more polarization dependency to be recognized.
- FIG. 5 shows a measurement of a polarized light source. The figure shows the total output, measured with a standard CMOS camera (solid line) and measured with the camera with polarizers (dashed line) and correction according to the invention. The polarizers were rotated with a lambda plate. The measurement error due to polarization is greatly reduced.
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US18/011,176 US20230244070A1 (en) | 2020-06-18 | 2021-06-16 | Measuring system and method for measuring light sources |
DE112021003304.2T DE112021003304A5 (de) | 2020-06-18 | 2021-06-16 | Messsystem und Verfahren zur Vermessung von Lichtquellen |
CN202180060835.4A CN116235032A (zh) | 2020-06-18 | 2021-06-16 | 测量系统和用于测量光源的方法 |
KR1020237002213A KR20230025711A (ko) | 2020-06-18 | 2021-06-16 | 광원들을 측정하기 위한 측정 시스템 및 방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102020116167.0A DE102020116167A1 (de) | 2020-06-18 | 2020-06-18 | Messsystem zur Vermessung von Lichtquellen |
DE102020116167.0 | 2020-06-18 |
Publications (1)
Publication Number | Publication Date |
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WO2021255113A1 true WO2021255113A1 (de) | 2021-12-23 |
Family
ID=76765102
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2021/066280 WO2021255113A1 (de) | 2020-06-18 | 2021-06-16 | Messsystem und verfahren zur vermessung von lichtquellen |
Country Status (5)
Country | Link |
---|---|
US (1) | US20230244070A1 (de) |
KR (1) | KR20230025711A (de) |
CN (1) | CN116235032A (de) |
DE (2) | DE102020116167A1 (de) |
WO (1) | WO2021255113A1 (de) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200013819A1 (en) * | 2017-03-03 | 2020-01-09 | Sony Semiconductor Solutions Corporation | Solid-state imaging device and electronic apparatus |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2013031100A1 (ja) | 2011-09-02 | 2013-03-07 | パナソニック株式会社 | 偏光撮像素子および内視鏡 |
EP3054273B8 (de) | 2015-02-09 | 2019-09-11 | Instrument Systems Optische Messtechnik GmbH | Kolorimetriesystem zur Anzeigeprüfung |
-
2020
- 2020-06-18 DE DE102020116167.0A patent/DE102020116167A1/de not_active Withdrawn
-
2021
- 2021-06-16 KR KR1020237002213A patent/KR20230025711A/ko unknown
- 2021-06-16 US US18/011,176 patent/US20230244070A1/en active Pending
- 2021-06-16 WO PCT/EP2021/066280 patent/WO2021255113A1/de active Application Filing
- 2021-06-16 DE DE112021003304.2T patent/DE112021003304A5/de active Pending
- 2021-06-16 CN CN202180060835.4A patent/CN116235032A/zh active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20200013819A1 (en) * | 2017-03-03 | 2020-01-09 | Sony Semiconductor Solutions Corporation | Solid-state imaging device and electronic apparatus |
Non-Patent Citations (4)
Title |
---|
NINA CHEN: "GOING POLARIZED: ADDING A NEW PERSPECTIVE TO INDUSTRIAL IMAGING", 8 November 2018 (2018-11-08), XP055617610, Retrieved from the Internet <URL:https://d1f5bev2h902zo.cloudfront.net/wp-content/uploads/2018/11/Going-Polarized-Presentation.pdf> [retrieved on 20190902] * |
REBHAN DAVID ET AL: "Principle investigations on polarization image sensors", SPIE PROCEEDINGS; [PROCEEDINGS OF SPIE ISSN 0277-786X], SPIE, US, vol. 11144, 17 September 2019 (2019-09-17), pages 111440A - 111440A, XP060124567, ISBN: 978-1-5106-3673-6, DOI: 10.1117/12.2533590 * |
SHARIZAL ALIAS MOHD ET AL: "Comprehensive uniformity analysis of GaAs-based VCSEL epiwafer by utilizing the on-wafer test capability", JOURNAL OF RUSSIAN LASER RESEARCH, 2 July 2009 (2009-07-02), pages 368 - 375, XP055836047, Retrieved from the Internet <URL:https://link.springer.com/content/pdf/10.1007/s10946-009-9082-1.pdf> [retrieved on 20210830], DOI: 10.1007/s10946-009-9082-1 * |
SONY: "Sony Semiconductor Solutions: Polarization Image Sensor", 17 October 2018 (2018-10-17), XP055617604, Retrieved from the Internet <URL:https://www.sony-semicon.co.jp/products_en/IS/sensor0/img/product/cmos/IMX250MZR_MYR_Flyer.pdf> [retrieved on 20190902] * |
Also Published As
Publication number | Publication date |
---|---|
US20230244070A1 (en) | 2023-08-03 |
DE112021003304A5 (de) | 2023-07-06 |
CN116235032A (zh) | 2023-06-06 |
DE102020116167A1 (de) | 2021-12-23 |
KR20230025711A (ko) | 2023-02-22 |
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