WO2021248848A1 - Method for manufacturing perforated copper coil for shielded cathode plate - Google Patents

Method for manufacturing perforated copper coil for shielded cathode plate Download PDF

Info

Publication number
WO2021248848A1
WO2021248848A1 PCT/CN2020/132524 CN2020132524W WO2021248848A1 WO 2021248848 A1 WO2021248848 A1 WO 2021248848A1 CN 2020132524 W CN2020132524 W CN 2020132524W WO 2021248848 A1 WO2021248848 A1 WO 2021248848A1
Authority
WO
WIPO (PCT)
Prior art keywords
cathode plate
shielding
copper foil
manufacturing
perforated copper
Prior art date
Application number
PCT/CN2020/132524
Other languages
French (fr)
Chinese (zh)
Inventor
江泱
杨帅国
Original Assignee
九江德福科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 九江德福科技股份有限公司 filed Critical 九江德福科技股份有限公司
Publication of WO2021248848A1 publication Critical patent/WO2021248848A1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02Electroplating of selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48After-treatment of electroplated surfaces

Definitions

  • the present invention relates to the technical field of copper foil manufacturing, in particular to a method for manufacturing a perforated copper foil for shielding a cathode plate.
  • the thickness of the negative electrode material on both sides of the copper foil is inconsistent, which will reduce the efficiency of the electrochemical reaction of the positive and negative electrodes, and cause a decrease in capacitance.
  • the perforated copper foil is convenient for double-sided precision coating to ensure that the coating amount on both sides is equal.
  • the perforated copper foil can effectively reduce the surface density of the copper foil, and has the same effect of reducing the thickness of the copper foil.
  • the current copper foil drilling method usually adopts mechanical processing or laser drilling. Through the perforated copper foil process of setting shielding points on the cathode plate, the increase in the process steps of copper foil production is avoided, and the possibility of copper foil defects caused by subsequent processing and performance degradation is reduced.
  • the present invention proposes a method for manufacturing a perforated copper foil for shielding a cathode plate, which can overcome the above-mentioned shortcomings of the prior art.
  • a manufacturing method of perforated copper foil for shielding a cathode plate comprising the following steps:
  • the electrode plate is a cathode plate.
  • the shielding points are uniformly distributed shielding points.
  • the size of the shielding points is ⁇ 0.3mm, and the distribution spacing is 0.8mm.
  • the temperature is controlled at 50-55°C, wherein the most suitable temperature range is 51-54°C.
  • the distance between the cathode plate and the anode plate is 2 cm.
  • the current is 50A
  • the electroplating time is 80s.
  • Fig. 1 is a flow chart of a method for manufacturing a perforated copper foil for shielding a cathode plate according to an embodiment of the present invention.
  • a method for manufacturing a perforated copper foil for shielding a cathode plate includes the following steps:
  • the electrode plate is a cathode plate.
  • the shielding points are uniformly distributed shielding points.
  • the size of the shielding points is 0.3 mm, and the distribution pitch is 0.8 mm.
  • the temperature is controlled at 50-55°C, wherein the most suitable temperature range is 51-54°C.
  • the distance between the cathode plate and the anode plate is 2 cm.
  • the current is 50A
  • the electroplating time is 80s.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Cell Electrode Carriers And Collectors (AREA)

Abstract

A method for manufacturing perforated copper coil for a shielded cathode plate. The method comprises the following steps: imprinting a shielding point on a separator according to an expected distribution mode, attaching the separator to a cathode plate to be processed, and tearing off the separator after a material is formed to obtain the shielding point; adding a hot acid copper electrolyte to an electrolyzer, adding a prepared additive solution, turning on mechanical stirring, slowly stirring to keep the temperature in the electrolyzer uniform; mounting an anode plate and the shielded cathode plate in the electrolyzer, keeping the anode and cathode plates parallel, adjusting a stirring speed, turning on a constant-current rectifying machine, and timing; adjusting a current, and turning off the constant-current rectifying machine after timing is completed to obtain a cathode plate plated with copper foil; and performing passivation processing on the cathode plate plated with copper foil, cleaning, drying by blowing, and peeling off perforated copper coil from the cathode plate. According to the method, cation transmission of the shielding point is hindered, and naturally grown perforated copper foil is obtained, thereby avoiding cumbersome steps of later machining and the resulting mechanical property defects.

Description

一种屏蔽阴极板的打孔铜箔制作方法Manufacturing method of perforated copper foil for shielding cathode plate 技术领域Technical field
本发明涉及铜箔制作技术领域,具体来说,涉及一种屏蔽阴极板的打孔铜箔制作方法。The present invention relates to the technical field of copper foil manufacturing, in particular to a method for manufacturing a perforated copper foil for shielding a cathode plate.
背景技术Background technique
[根据细则9.2改正14.12.2020] 
近年来,动力电池的发展受到新能源汽车的大力推动,产品技术持续改进,对基材的要求也不断提升。作为动力电池的负极载体材料,锂电铜箔的技术要求也在不断提升。随着近年来国内锂电铜箔的产能越来越大,铜箔市场竞争越发激烈。然而,市场上的高端锂电铜箔产品一直处于紧俏状态,并为日本等少数海外或有海外背景的企业所垄断。
[Corrected in accordance with Rule 9.2 14.12.2020]
In recent years, the development of power batteries has been vigorously promoted by new energy vehicles, product technology has continued to improve, and the requirements for substrates have also been continuously improved. As the negative electrode carrier material of power batteries, the technical requirements of lithium battery copper foil are also constantly improving. With the increasing production capacity of domestic lithium battery copper foil in recent years, the competition in the copper foil market has become increasingly fierce. However, the high-end lithium battery copper foil products on the market have been in short supply and are monopolized by a few overseas or overseas background companies such as Japan.
对于一般的锂电铜箔,铜箔两面负极材料的厚度不一致会导致正负极电化学反应效率降低,引起电容量下降。为避免这种情况,打孔铜箔方便进行双面精密涂覆,以保证两侧的涂覆量相等。此外,打孔铜箔可以有效降低铜箔的面密度,起到降低铜箔厚度的相同效果。For general lithium battery copper foil, the thickness of the negative electrode material on both sides of the copper foil is inconsistent, which will reduce the efficiency of the electrochemical reaction of the positive and negative electrodes, and cause a decrease in capacitance. In order to avoid this situation, the perforated copper foil is convenient for double-sided precision coating to ensure that the coating amount on both sides is equal. In addition, the perforated copper foil can effectively reduce the surface density of the copper foil, and has the same effect of reducing the thickness of the copper foil.
目前的铜箔打孔方式通常采用机械加工或激光打孔的方式。通过在阴极板上设置屏蔽点的打孔铜箔工艺,避免了铜箔生产的工艺步骤的增加,降低了铜箔因后续加工造成缺陷,导致性能下降的可能。The current copper foil drilling method usually adopts mechanical processing or laser drilling. Through the perforated copper foil process of setting shielding points on the cathode plate, the increase in the process steps of copper foil production is avoided, and the possibility of copper foil defects caused by subsequent processing and performance degradation is reduced.
发明内容Summary of the invention
针对相关技术中的上述技术问题,本发明提出一种屏蔽阴极板的打孔铜箔制作方法,能够克服现有技术的上述不足。In view of the above-mentioned technical problems in the related art, the present invention proposes a method for manufacturing a perforated copper foil for shielding a cathode plate, which can overcome the above-mentioned shortcomings of the prior art.
为实现上述技术目的,本发明的技术方案是这样实现的:In order to achieve the above technical objectives, the technical solution of the present invention is achieved as follows:
一种屏蔽阴极板的打孔铜箔制作方法,该方法包括以下步骤:A manufacturing method of perforated copper foil for shielding a cathode plate, the method comprising the following steps:
S1、将屏蔽点按照预期的分布方式刻印在隔膜上,将隔膜贴在待处理的极板上,涂敷屏蔽材料,待材料成型后撕下隔膜,得到屏蔽点;S1. Mark the shielding points on the diaphragm according to the expected distribution, stick the diaphragm on the electrode plate to be processed, apply the shielding material, and tear off the diaphragm after the material is formed to obtain the shielding point;
S2、将热的酸铜电解液加入电解槽中,加入配好的添加剂溶液,打开机械搅拌,缓慢搅拌保持槽内温度均匀;S2. Put the hot acid copper electrolyte into the electrolytic tank, add the prepared additive solution, turn on the mechanical stirring, and slowly stir to keep the temperature in the tank uniform;
S3、将阳极板与屏蔽后的阴极板安装在电解槽内,通过电解槽壁上的凹槽和底部的底座固定,两块极板保持平行,调节搅拌速率,打开恒流整流机, 开始计时;S3. Install the anode plate and the shielded cathode plate in the electrolytic cell, fix them through the groove on the wall of the electrolytic cell and the base at the bottom, keep the two plates parallel, adjust the stirring rate, turn on the constant current rectifier, and start timing ;
S4、调整电流,待计时结束后,关闭恒流整流机,得到镀有铜箔的阴极板;S4. Adjust the current. After the timing is over, turn off the constant current rectifier to obtain a cathode plate coated with copper foil;
S5、将镀有铜箔的阴极板进行钝化处理,清洗,吹干,将打孔铜箔从阴极板上剥离。S5. Passivate the cathode plate coated with copper foil, wash and blow dry, and peel off the perforated copper foil from the cathode plate.
进一步的,所述步骤S1中,极板为阴极板。Further, in the step S1, the electrode plate is a cathode plate.
进一步的,所述步骤S1中,屏蔽点为均匀分布的屏蔽点。Further, in the step S1, the shielding points are uniformly distributed shielding points.
进一步的,所述屏蔽点尺寸为Ф0.3mm,分布间距为0.8mm。Further, the size of the shielding points is Φ0.3mm, and the distribution spacing is 0.8mm.
进一步的,所述步骤S2中,所述温度控制在50-55℃,其中,最合适所述温度范围为51-54℃。Further, in the step S2, the temperature is controlled at 50-55°C, wherein the most suitable temperature range is 51-54°C.
进一步的,所述阴极板、阳极板间距为2cm。Further, the distance between the cathode plate and the anode plate is 2 cm.
进一步的,所述电流为50A,电镀时间为80s。Further, the current is 50A, and the electroplating time is 80s.
本发明的有益效果:通过该方法,阻碍屏蔽点的阳离子传输,得到自然生长的打孔铜箔,避免了后期机械加工的繁琐步骤,以及因此造成的力学性能缺陷。The beneficial effects of the present invention: through this method, the transmission of cations at the shielding point is hindered, and naturally-grown perforated copper foil is obtained, which avoids the cumbersome steps of later mechanical processing and the mechanical performance defects caused thereby.
附图说明Description of the drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施例中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其他的附图。In order to explain the embodiments of the present invention or the technical solutions in the prior art more clearly, the drawings needed in the embodiments will be briefly introduced below. Obviously, the drawings in the following description are only some of the present invention. Embodiments, for those of ordinary skill in the art, without creative work, other drawings can be obtained based on these drawings.
图1是根据本发明实施例所述的一种屏蔽阴极板的打孔铜箔制作方法的流程框图。Fig. 1 is a flow chart of a method for manufacturing a perforated copper foil for shielding a cathode plate according to an embodiment of the present invention.
具体实施方式detailed description
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员所获得的所有其他实施例,都属于本发明保护的范围。The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art fall within the protection scope of the present invention.
如图1所示,根据本发明实施例所述的一种屏蔽阴极板的打孔铜箔制作方法,包括以下步骤:As shown in FIG. 1, a method for manufacturing a perforated copper foil for shielding a cathode plate according to an embodiment of the present invention includes the following steps:
S1、将屏蔽点按照预期的分布方式刻印在隔膜上,将隔膜贴在待处理的极板上,涂敷屏蔽材料,待材料成型后撕下隔膜,得到屏蔽点;S1. Mark the shielding points on the diaphragm according to the expected distribution, stick the diaphragm on the electrode plate to be processed, apply the shielding material, and tear off the diaphragm after the material is formed to obtain the shielding point;
S2、将热的酸铜电解液加入电解槽中,加入配好的添加剂溶液,打开机械搅拌,缓慢搅拌保持槽内温度均匀;S2. Put the hot acid copper electrolyte into the electrolytic tank, add the prepared additive solution, turn on the mechanical stirring, and slowly stir to keep the temperature in the tank uniform;
S3、将阳极板与屏蔽后的阴极板安装在电解槽内,通过电解槽壁上的凹槽和底部的底座固定,两块极板保持平行,调节搅拌速率,打开恒流整流机,开始计时;S3. Install the anode plate and the shielded cathode plate in the electrolytic cell, fix them by the groove on the wall of the electrolytic cell and the base at the bottom, keep the two plates in parallel, adjust the stirring rate, turn on the constant current rectifier, and start timing ;
S4、调整电流,待计时结束后,关闭恒流整流机,得到镀有铜箔的阴极板;S4. Adjust the current. After the timing is over, turn off the constant current rectifier to obtain a cathode plate coated with copper foil;
S5、将镀有铜箔的阴极板进行钝化处理,清洗,吹干,将打孔铜箔从阴极板上剥离。S5. Passivate the cathode plate coated with copper foil, wash and blow dry, and peel off the perforated copper foil from the cathode plate.
在本发明的一个具体实施例中,所述步骤S1中,极板为阴极板。In a specific embodiment of the present invention, in the step S1, the electrode plate is a cathode plate.
在本发明的一个具体实施例中,所述步骤S1中,屏蔽点为均匀分布的屏蔽点。In a specific embodiment of the present invention, in the step S1, the shielding points are uniformly distributed shielding points.
在本发明的一个具体实施例中,所述屏蔽点尺寸为Ф0.3mm,分布间距为0.8mm。In a specific embodiment of the present invention, the size of the shielding points is 0.3 mm, and the distribution pitch is 0.8 mm.
在本发明的一个具体实施例中,所述步骤S2中,所述温度控制在50-55℃,其中,最合适所述温度范围为51-54℃。In a specific embodiment of the present invention, in the step S2, the temperature is controlled at 50-55°C, wherein the most suitable temperature range is 51-54°C.
在本发明的一个具体实施例中,所述阴极板、阳极板间距为2cm。In a specific embodiment of the present invention, the distance between the cathode plate and the anode plate is 2 cm.
在本发明的一个具体实施例中,所述电流为50A,电镀时间为80s。In a specific embodiment of the present invention, the current is 50A, and the electroplating time is 80s.
为了方便理解本发明的上述技术方案,以下对本发明的上述技术方案进行详细说明。In order to facilitate the understanding of the above-mentioned technical solution of the present invention, the above-mentioned technical solution of the present invention will be described in detail below.
带屏蔽点的阴极板的制作:Production of cathode plate with shielding point:
取一般的阴极板,根据阴极板电镀区域裁剪出大小合适的隔膜。根据图二所示的预期屏蔽点分布状况,在隔膜上裁剪出孔,其尺寸为Ф0.3mm,分布间距为0.8mm。将隔膜贴在阴极板上,涂覆屏蔽材料,在自然情况下风干5-10日,确认屏蔽材料成型后,剥离隔膜,再次风干2-3日,得到带屏蔽点的阴极板。Take a general cathode plate, and cut out a diaphragm of a suitable size according to the electroplating area of the cathode plate. According to the expected shielding point distribution shown in Figure 2, cut out holes on the diaphragm with a size of Ф0.3mm and a distribution pitch of 0.8mm. Stick the diaphragm on the cathode plate, coat the shielding material, and air dry for 5-10 days under natural conditions. After confirming that the shielding material is formed, peel off the diaphragm and air dry again for 2-3 days to obtain a cathode plate with shielding points.
电解小试系统的安装:Installation of the electrolysis pilot system:
将热的酸铜电解液加入电解槽中,加入配好的添加剂溶液。打开机械搅拌,先缓慢搅拌保持槽内温度均匀。将阳极板与带屏蔽点的阴极板安装在电解槽内,通过电解槽壁上的凹槽和底部的底座固定,两块极板保持平行,间距为2cm。Put the hot acid copper electrolyte into the electrolytic cell, and add the prepared additive solution. Turn on the mechanical stirring and stir slowly to keep the temperature in the tank uniform. Install the anode plate and the cathode plate with shielding points in the electrolytic cell, and fix them through the groove on the wall of the electrolytic cell and the base at the bottom. The two polar plates are kept parallel with a distance of 2 cm.
打孔铜箔的制取:Preparation of perforated copper foil:
将机械搅拌开到最大,打开恒流整流机,将电解液温度加热至50-55℃调节电流为50A,进行电解操作。80秒后关闭电源,获得附着在阴极板上的打孔铜箔小试样品,将打孔铜箔样品连同阴极板浸入钝化液中,进行钝化处理。将样品剥离,晾干,在电子显微镜下观察样品上孔的形貌。Turn on the mechanical stirring to the maximum, turn on the constant current rectifier, heat the electrolyte temperature to 50-55°C, adjust the current to 50A, and perform the electrolysis operation. After 80 seconds, the power was turned off to obtain a small test sample of perforated copper foil attached to the cathode plate. The perforated copper foil sample and the cathode plate were immersed in the passivation solution for passivation treatment. The sample was peeled off, dried, and the morphology of the holes on the sample was observed under an electron microscope.
综上所述,借助于本发明的上述技术方案,通过该方法,阻碍屏蔽点的阳离子传输,得到自然生长的打孔铜箔,避免了后期机械加工的繁琐步骤,以及因此造成的力学性能缺陷。In summary, with the help of the above technical solution of the present invention, through this method, the transmission of cations at the shielding point is hindered, and a naturally grown perforated copper foil is obtained, which avoids the cumbersome steps of later mechanical processing and the mechanical performance defects caused thereby. .
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The foregoing descriptions are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the present invention. Within the scope of protection.

Claims (7)

  1. 一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,包括以下步骤:A manufacturing method of perforated copper foil for shielding a cathode plate is characterized in that it comprises the following steps:
    S1:将屏蔽点按照预期的分布方式刻印在隔膜上,将隔膜贴在待处理的极板上,涂敷屏蔽材料,待材料成型后撕下隔膜,得到屏蔽点;S1: Mark the shielding points on the diaphragm according to the expected distribution, stick the diaphragm on the electrode plate to be processed, apply the shielding material, and tear off the diaphragm after the material is formed to obtain the shielding point;
    S2:将热的酸铜电解液加入电解槽中,加入配好的添加剂溶液,打开机械搅拌,缓慢搅拌保持槽内温度均匀;S2: Put the hot acid copper electrolyte into the electrolytic tank, add the prepared additive solution, turn on the mechanical stirring, and slowly stir to keep the temperature in the tank uniform;
    S3:将阳极板与屏蔽后的阴极板安装在电解槽内,通过电解槽壁上的凹槽和底部的底座固定,两块极板保持平行,调节搅拌速率,打开恒流整流机,开始计时;S3: Install the anode plate and the shielded cathode plate in the electrolytic cell, fix them through the groove on the wall of the electrolytic cell and the base at the bottom, keep the two plates parallel, adjust the stirring rate, turn on the constant current rectifier, and start timing ;
    S4:调整电流,待计时结束后,关闭恒流整流机,得到镀有铜箔的阴极板;S4: Adjust the current. After the timing is over, turn off the constant current rectifier to obtain a cathode plate coated with copper foil;
    S5:将镀有铜箔的阴极板进行钝化处理,清洗,吹干,将打孔铜箔从阴极板上剥离。S5: Passivate the cathode plate coated with copper foil, wash and blow dry, and peel off the perforated copper foil from the cathode plate.
  2. 根据权利要求1所述的一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,所述步骤S1中,极板为阴极板。The manufacturing method of perforated copper foil for shielding the cathode plate according to claim 1, wherein in the step S1, the electrode plate is a cathode plate.
  3. 根据权利要求1所述的一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,所述步骤S1中,屏蔽点为均匀分布的屏蔽点。The manufacturing method of perforated copper foil for shielding the cathode plate according to claim 1, wherein in the step S1, the shielding points are uniformly distributed shielding points.
  4. 根据权利要求1或3所述的一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,所述屏蔽点尺寸为Ф0.3mm,分布间距为0.8mm。The manufacturing method of perforated copper foil for shielding cathode plates according to claim 1 or 3, characterized in that the size of the shielding points is Φ0.3mm, and the distribution pitch is 0.8mm.
  5. 根据权利要求1所述的一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,所述步骤S2中,所述温度控制在50-55℃,其中,最合适所述温度范围为51-54℃。The manufacturing method of perforated copper foil for shielding cathode plates according to claim 1, characterized in that, in the step S2, the temperature is controlled at 50-55°C, wherein the most suitable temperature range is 51 -54°C.
  6. 根据权利要求1所述的一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,所述阴极板、阳极板间距为2cm。The manufacturing method of perforated copper foil for shielding the cathode plate according to claim 1, wherein the distance between the cathode plate and the anode plate is 2 cm.
  7. 根据权利要求1所述的一种屏蔽阴极板的打孔铜箔制作方法,其特征在于,所述电流为50A,电镀时间为80s。The manufacturing method of perforated copper foil for shielding the cathode plate according to claim 1, wherein the current is 50A, and the electroplating time is 80s.
PCT/CN2020/132524 2020-06-12 2020-11-28 Method for manufacturing perforated copper coil for shielded cathode plate WO2021248848A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN202010533945.5A CN111850628A (en) 2020-06-12 2020-06-12 Method for manufacturing punched copper foil of shielding cathode plate
CN202010533945.5 2020-06-12

Publications (1)

Publication Number Publication Date
WO2021248848A1 true WO2021248848A1 (en) 2021-12-16

Family

ID=72986138

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2020/132524 WO2021248848A1 (en) 2020-06-12 2020-11-28 Method for manufacturing perforated copper coil for shielded cathode plate

Country Status (2)

Country Link
CN (1) CN111850628A (en)
WO (1) WO2021248848A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111850628A (en) * 2020-06-12 2020-10-30 九江德福科技股份有限公司 Method for manufacturing punched copper foil of shielding cathode plate
CN114351191B (en) * 2022-01-12 2023-09-12 九江德福科技股份有限公司 Copper foil surface density adjusting device and acting surface manufacturing method thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102931414A (en) * 2012-11-01 2013-02-13 彩虹集团公司 Preparation process for copper foil for lithium ion battery current collector
CN108560026A (en) * 2018-06-15 2018-09-21 九江德福科技股份有限公司 A kind of small test system of electrolysis foil
CN108859397A (en) * 2018-08-30 2018-11-23 广东工业大学 A kind of method and apparatus using silk-screen printing production electrode
CN109728254A (en) * 2018-12-03 2019-05-07 浙江大学 A kind of technology of preparing of negative electrode of lithium ion battery porous copper foil
CN209685929U (en) * 2019-01-22 2019-11-26 灵宝华鑫铜箔有限责任公司 It is a kind of for making the electroplating bath of porous copper foil
CN111850628A (en) * 2020-06-12 2020-10-30 九江德福科技股份有限公司 Method for manufacturing punched copper foil of shielding cathode plate

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3904492A (en) * 1969-12-17 1975-09-09 Ibm Dual resist usage in construction of apertured multilayer printed circuit articles
JPS53119228A (en) * 1977-03-29 1978-10-18 Toppan Printing Co Ltd Production of perforated plated metal foil
KR20010031571A (en) * 1998-09-14 2001-04-16 미야무라 심뻬이 Porous copper foil, use thereof and method for preparation thereof
WO2001077420A1 (en) * 2000-04-05 2001-10-18 Nikko Materials Company, Limited Laser hole drilling copper foil
CN106544703A (en) * 2016-08-10 2017-03-29 姚晓宁 Perforation Copper Foil foil machine and its production technology
KR101809985B1 (en) * 2017-03-30 2017-12-18 와이엠티 주식회사 Manufacturing method of porous copper film and porous copper film using the same
CN108796582B (en) * 2018-06-19 2020-01-03 新疆中亚新材料科技有限公司 Manufacturing method of porous double-sided smooth copper foil
CN108950608B (en) * 2018-08-16 2019-08-02 安徽铜冠铜箔有限公司 A kind of new netted copper foil preparation method
CN109778247A (en) * 2019-04-02 2019-05-21 台州思碳科技有限公司 A kind of preparation method of ultra-thin porous copper foil

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102931414A (en) * 2012-11-01 2013-02-13 彩虹集团公司 Preparation process for copper foil for lithium ion battery current collector
CN108560026A (en) * 2018-06-15 2018-09-21 九江德福科技股份有限公司 A kind of small test system of electrolysis foil
CN108859397A (en) * 2018-08-30 2018-11-23 广东工业大学 A kind of method and apparatus using silk-screen printing production electrode
CN109728254A (en) * 2018-12-03 2019-05-07 浙江大学 A kind of technology of preparing of negative electrode of lithium ion battery porous copper foil
CN209685929U (en) * 2019-01-22 2019-11-26 灵宝华鑫铜箔有限责任公司 It is a kind of for making the electroplating bath of porous copper foil
CN111850628A (en) * 2020-06-12 2020-10-30 九江德福科技股份有限公司 Method for manufacturing punched copper foil of shielding cathode plate

Also Published As

Publication number Publication date
CN111850628A (en) 2020-10-30

Similar Documents

Publication Publication Date Title
WO2021248848A1 (en) Method for manufacturing perforated copper coil for shielded cathode plate
CN209974927U (en) Processing equipment of electrolytic copper foil
US8377567B2 (en) Highly corrosion-resistant porous metal member
CN110760920B (en) Segmented anode device, electroplating equipment and method for improving coating uniformity
WO2013062026A1 (en) Method for manufacturing porous aluminum foil, porous aluminum foil, positive electrode collector for electricity storage device, electrode for electricity storage device, and electricity storage device
CN108110258B (en) Method for constructing three-dimensional structure on surface of copper foil
CN114883560B (en) Three-dimensional current collector/Zn/Zn-E composite negative electrode, preparation thereof and application thereof in water-based zinc ion battery
CN108893763A (en) A kind of clutch gold production method for preventing lithium ion from generating lithium dendrite arm
CN109473629A (en) Compound cathode of lithium and preparation method thereof and lithium ion battery
CN108987678B (en) Preparation method of lead-acid storage battery electrode containing lead-tin/graphene composite coating
CN112133883A (en) Porous structure lithium battery negative electrode and preparation method thereof
CN116741923A (en) Preparation method of zinc cathode with high (002) texture coefficient
CN113328060A (en) Method for preparing flexible electrode on nano needle cone nickel substrate
CN111655906B (en) Electrolytic copper foil having excellent handling characteristics in post-treatment, and method for manufacturing same
CN105304867A (en) Green plate pickling process for internal formation
CN114824263B (en) Zn@Zn-E composite negative electrode, preparation method thereof and application thereof in water-based zinc ion battery
CN115440989A (en) Negative current collector for lithium ion battery, pole piece and preparation method of negative current collector
CN109994737A (en) A kind of lithium battery composite metal lithium type negative electrode tab and its manufacturing process
CN114657562A (en) Porous metal current collector and preparation method thereof
CN101580954B (en) Composition used for plating rhenium and use method thereof
CN113972374A (en) Preparation method and application of gelatin modified zinc metal negative electrode
CN109524615B (en) Method for improving coating appearance of lithium ion battery cathode
JP5588043B2 (en) Electrolytic copper foil for secondary battery current collector
CN112779574A (en) Electroplating solution for enhancing conductivity of electronic copper foil, preparation method and electroplating process
CN108712830B (en) Palladium-free chemical copper plating process for circuit board

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20939562

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20939562

Country of ref document: EP

Kind code of ref document: A1