WO2021224353A1 - Verfahren zum herstellen von reflektiven optischen elementen für den euv-wellenlängenbereich sowie reflektive optische elemente für den euv-wellenlängenbereich - Google Patents
Verfahren zum herstellen von reflektiven optischen elementen für den euv-wellenlängenbereich sowie reflektive optische elemente für den euv-wellenlängenbereich Download PDFInfo
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- WO2021224353A1 WO2021224353A1 PCT/EP2021/061915 EP2021061915W WO2021224353A1 WO 2021224353 A1 WO2021224353 A1 WO 2021224353A1 EP 2021061915 W EP2021061915 W EP 2021061915W WO 2021224353 A1 WO2021224353 A1 WO 2021224353A1
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- WO
- WIPO (PCT)
- Prior art keywords
- layer
- structurable layer
- reflective optical
- materials
- structurable
- Prior art date
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- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
- C03C17/3663—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties specially adapted for use as mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/067—Construction details
Definitions
- the present invention relates to a method for producing reflective optical elements for the EUV wavelength range with the following steps:
- a reflective optical element for the EUV wavelength range produced by means of this method, to a reflective optical element for the EUV wavelength range, having a substrate and a reflective coating, a structurable layer being arranged between the substrate and the reflective coating and the structurable layer has at least two layers each of different materials, and on a reflective optical element for the EUV wavelength range, having a substrate and a reflective coating, a structurable layer being arranged between the substrate and the reflective coating.
- Reflective optical elements for the EUV wavelength range can have structures in order to be able to use them, for example, as phase shift masks or for filtering out or deflecting radiation of undesired wavelengths.
- a known possibility of producing reflective optical elements with lateral structures consists, for example, in using lithographic processes in which a radiation-sensitive layer, also called a resist, is exposed to photons, ions or electrons, so to speak, with the desired pattern being transferred to the radiation-sensitive layer and this is then structured by, for example, etching or selective deposition. This structure can be transferred to the reflective optical element.
- This procedure enables high-resolution structures in Create nanometer range. This procedure requires intensive cleaning processes, in particular to combat particle contamination. Since the cleanliness requirements for optical elements for the EUV wavelength range are particularly high, this procedure is very complex.
- a surface shape correction of EUV mirrors already provided with a reflective coating is carried out by irradiating them with electrons of an energy that leads to such high penetration depths that into the substrate, especially if it is made of glass, glass ceramic or Ceramic is, a laterally varying compaction is introduced. Due to the low mass of the electrons, the interaction with the reflective coating can be neglected.
- This object is achieved in a first aspect by a method for producing reflective optical elements for the EUV wavelength range with the steps:
- the inventor has recognized that the application of a structurable layer as at least two layers of different material, which is structured by local irradiation and is an integral part of the resulting reflective optical element, has advantages.
- materials are applied which mix exothermically under the influence of the local irradiation and / or react exothermically with one another, namely at the locally irradiated areas of the structured layer.
- the structurable layer is metastable before irradiation. Only when activation energy is introduced by irradiation does the materials mix or react, creating a stable state. In this way, permanent structures can be introduced in the production of reflective optical elements by local irradiation, be it before or after the reflective coating is applied to the structurable layer.
- the structuring can be carried out without a resist, so that no complex cleaning steps are required. It is also made possible, as required, to introduce the structures by local irradiation before or after the application of the reflective coating. In particular, by means of targeted irradiation of the structurable layer, it is possible to avoid negatively influencing the substrate and / or the reflective coating during the structuring process by, for example, selecting the type, energy, etc. of the irradiation accordingly.
- the structurable layer is more advantageously locally irradiated with electrons. It is generally possible without great effort to focus electron beams more or less strongly depending on requirements and to regulate their energy in such a way that with generally known means and devices available at low acquisition costs it can be ensured that, in particular, even if the reflective coating has already been applied is, when the structurable layer is irradiated, neither the reflective coating nor the substrate are exposed to a significant input of energy and thus remain essentially unchanged and retain their respective properties. It has been found to be particularly advantageous if electrons with an energy in the range between 5 keV and 80 keV, preferably 5 keV to 40 keV, particularly preferably 10 keV to 25 keV, are irradiated.
- Electrodes are irradiated with a diameter in the range between 5 nm and 1000 ⁇ m. Diameters of up to 1000 ⁇ m are more suitable, for example, in order to introduce binary grids for bending out of the beam path of false rays in the infrared range. With diameters in the range up to 5 nm, for example, high-resolution structures such as for phase shift masks can be introduced.
- At least one of the materials of the layers of the structurable layer preferably has a high absorption or a low penetration depth for electrons so that the electron energy can be converted as efficiently as possible into activation energy for triggering the reaction or mixing small total thickness of the structurable layer can be sufficient for the change in thickness desired to be achieved by the local irradiation.
- the layer materials are preferably selected in such a way that when mixing or reacting under the influence of the irradiation, the free Gibbs energy in a range between -10 kJ / mol and -900 kJ / mole. This can ensure that when the exothermic mixing or reacting of the layer materials of the structurable layer triggered by the radiation does not release too much heat which could otherwise damage the substrate material or in particular the reflective coating.
- At least one of the layers of the at least two layers of the structurable layer is smoothed.
- the smoothing can be carried out both before, during and after the deposition of the at least one layer in order to reduce any roughening effect that may be present.
- any method can be used, such as, for example, ion-assisted smoothing (see also US Pat. No. 6,441,963 B2; A. Kloidt et al.
- At least two layers of different materials are applied as the structurable layer, the materials mixing and / or reacting with one another under the influence of the local irradiation, thereby causing a change in the thickness of the structurable layer, namely at the irradiated point (s), and the layer thicknesses are selected in such a way that no further change in thickness occurs after a desired change in thickness of the structurable layer has been achieved.
- this procedure has the great advantage that the process of structural change in the structurable layer is self-terminating due to the irradiation.
- the thicknesses of the individual layers of the structurable layer can be selected in such a way that after a certain irradiation dose the individual layers have completely mixed or reacted with one another, so that the structuring process cannot continue even with irradiation that goes beyond this.
- a precision of the structuring that goes beyond the control of the irradiation itself, in particular of the resulting change in thickness and thus of the surface profile of the reflective optical element produced, can be achieved.
- the object is achieved by a reflective optical element, which was produced as described above, or achieved by a reflective optical element for the EUV wavelength range, having a substrate and a reflective coating, wherein between the substrate and the reflective Coating a structurable layer is arranged and the structurable layer has at least two layers each of different materials, the materials of the layers being materials that react exothermically with each other or can mix exothermically and by a reflective optical element for the EUV wavelength range , comprising a substrate and a reflective coating, a structurable layer being arranged between the substrate and the reflective coating, the structurable layer having at least two materials which have a very low solubility at room temperature and have high solubility with one another at temperatures of 300 ° C and higher.
- the inventor has recognized that the provision of a structurable layer - in particular with the material properties mentioned - that is structured by irradiation and more integral Is part of the resulting reflective optical element, has advantages.
- the provision of a dedicated structurable layer enables the subsequent introduction of structures into a reflective optical element without noticeably negatively influencing the substrate and / or the reflective coating during the structuring process.
- the structurable layer advantageously has density fluctuations laterally. Density fluctuations can have been caused by a local irradiation of the structurable layer and can lead to a local change in the thickness of the structurable layer and thus a structuring of this layer. These density fluctuations can be introduced in such a way that they give the reflective optical element, for example, the effect of a phase shift mask or a spectral filter, for example in the form of a diffraction grating.
- the density fluctuations can correlate, among other things, with structural and / or stoichiometric differences between the materials at the points of different density.
- the structurable layer has at least one material with a density of 12 g / cm 3 or more, preferably 15 g / cm 3 or more, particularly preferably 18 g / cm 3 . It is known that the depth of penetration into a material when irradiated with photons, ions and in particular electrons is inversely proportional to the density of the material.
- the provision of material with the specified minimum densities in the structurable layer makes it possible, on the one hand, to prevent the local irradiation from penetrating through the structurable layer into the substrate of the reflective optical element and there, for example, to undesired compaction of the substrate material, and, on the other hand, to prevent the structurable layer to be kept as thin as possible in order to reduce negative effects such as high layer tension or excessive roughening.
- the structurable layer preferably has at least two layers, each of which is a different material.
- the structurable layer particularly preferably has a plurality of layers made of at least two materials, which are arranged alternately. This structure of the structurable layer enables a structure to be introduced into the structurable layer in that activation energy is supplied to the at least two materials by irradiating this layer, so that mixing or reaction of the at least two materials is triggered on the surfaces where they adjoin one another .
- the materials of the layers are very particularly preferably materials which react exothermically with one another or can mix exothermically. This has the advantage that the structurable layer is metastable. Only when activation energy is introduced, for example by irradiation, does it come about Mixing or reacting of the materials to form a stable state.
- the layer materials are advantageously selected in such a way that when mixing or reacting with the introduction of activation energy into the structurable layer, for example by irradiation, the free Gibbs energy is in a range between -10 kJ / mol and -900 kJ / mol. This can ensure that too much heat is not released which could otherwise damage the substrate material or, in particular, the reflective coating.
- the structurable layer advantageously has one or more of the materials tungsten, rhenium, osmium, iridium, tantalum, hafnium, ruthenium, platinum, gold, their alloys, their oxides, their carbides, their nitrides and their borides.
- this allows the thickness of the structurable layer to be kept as small as possible in order to avoid additional layer stresses as much as possible, and on the other hand, during operation of the reflective optical element, EUV radiation penetrates into the substrate, which can lead to damage to the substrate due to a to avoid high absorption of EUV radiation by the materials mentioned.
- the structurable layer can have metallic and ceramic materials, for example.
- the structurable layer preferably has at least one further material from the group consisting of carbon, boron, silicon, boron carbide and boron nitride.
- these materials can react well with, in particular, materials from the group consisting of tungsten, rhenium, osmium, iridium, tantalum, hafnium, ruthenium, platinum, gold and form compounds that have a significantly different density than the respective starting materials , whereby structures with different thicknesses can be introduced into the structured layer or can already be introduced by local irradiation.
- the structurable layer has at least two materials which have very low solubility at room temperature and high solubility with one another at temperatures of 300 ° C. and higher. These at least two materials are particularly preferably arranged alternately in the form of a plurality of layers each. A structurable layer made of at least two materials with such different solubility is in a metastable state at room temperature. If it is heated locally to a sufficiently high temperature through the input of energy through irradiation, these materials can mix, which can lead to a change in density and thus structuring.
- the structurable layer particularly preferably has a first material from the group consisting of tungsten, Has tantalum and indium and another material of the group consisting of vanadium, titanium, rhodium, platinum and chromium.
- FIG. 1 shows a schematic diagram of a first embodiment variant of a reflective optical element with a layer that can be structured
- FIG. 2 shows a schematic diagram of a second embodiment variant of a reflective optical element with a layer that can be structured
- FIG. 3 shows a schematic diagram of a third embodiment variant of a reflective optical element with a layer that can be structured in a first state
- FIG. 4 shows a schematic diagram of the third embodiment variant of a reflective optical element with a layer that can be structured in a second state
- Figure 5 schematically the sequence of a first proposed method for
- FIG. 6 shows a schematic of the sequence of a second proposed method for producing a reflective optical element.
- a reflective optical element 50 which has a structurable layer 60 on a substrate 59 and a reflective coating 54 thereon, which in the present example includes alternately applied layers of a material with a higher real part of the refractive index on a substrate 51 the working wavelength at which, for example, the lithographic exposure is carried out (also called spacer 56) and a material with a lower real part of the refractive index at the working wavelength (also called absorber 57), with an absorber-spacer pair forming a stack 55.
- spacer 56 the working wavelength at which, for example, the lithographic exposure is carried out
- absorber 57 a material with a lower real part of the refractive index at the working wavelength
- Usually reflective optical elements for an EUV lithography device or an optical system are designed in such a way that the respective wavelength of maximum reflectivity essentially coincides with the working wavelength of the lithography process or other applications of the optical system.
- the thicknesses of the individual layers 56, 57 as well as the repeating stacks 55 can be constant over the entire multilayer system 54 or also vary over the area or the total thickness of the multilayer system 54, depending on which spectral or angle-dependent reflection profile or which maximum reflectivity at the working wavelength is to be achieved. If the layer thicknesses are essentially constant over the entire multilayer system 54, one speaks of a period 55 instead of a stack 55.
- the reflection profile can also be specifically influenced by adding more and less absorbing materials to the basic structure of absorber 57 and spacer 56 is supplemented to increase the possible maximum reflectivity at the respective working wavelength.
- absorber and / or spacer materials can be exchanged for one another in some stacks or the stacks can be constructed from more than one absorber and / or spacer material.
- additional layers can also be provided as diffusion barriers between spacer and absorber layers 56, 57.
- a period 55 often has a thickness of approx. 6.7 nm, the spacer layer 56 usually being thicker than the absorber layer 57.
- Other common material combinations include silicon-ruthenium or molybdenum-beryllium.
- a protective layer 53 can be provided on the multi-layer system 54, which protective layer can also be designed in multiple layers.
- Typical substrate materials for reflective optical elements for EUV lithography are silicon, silicon carbide, silicon-infiltrated silicon carbide, quartz glass, titanium-doped quartz glass, glass and glass ceramic.
- a layer can additionally be provided between reflective coating 54 and substrate 59, which is made of a material that has a high absorption for radiation in the EUV wavelength range, which is used during operation of reflective optical element 50, around the substrate 59 to protect against radiation damage, for example unwanted compaction.
- the substrate can also be made of copper, aluminum, a copper alloy, an aluminum alloy or a copper-aluminum alloy.
- the structurable layer can have at least two layers, each with a different material. It can preferably have a plurality of layers made of at least two materials, which are arranged alternately.
- the structurable layer 60 has a plurality of layers 63, 64 made of - without restricting the generality - two different materials which are arranged alternately. It is particularly preferred that these are materials which react exothermically with one another or can mix exothermically. Such material combinations form a structurable layer 60 in an initially metastable state. If you bring a certain amount of energy into the structurable layer 60, which is sufficient to as To serve activation energy, these two materials can react with one another to form one or more other materials, or mix with one another or go into solution with one another.
- the structurable layer 60 is in a more stable state than before at the points into which the activation energy was introduced.
- the change in the structurable layer 60 caused by the activation energy is accompanied by more or less large changes in density, so that permanent structures such as binary gratings or phase shifters can be introduced into the reflective optical element 50 in this way.
- the structurable layer 60 should advantageously not be designed to be too thick if possible.
- At least one of the selected materials has a high absorption for the radiation used to introduce the activation energy, on the one hand to be able to convert the radiation energy to a sufficient extent into activation energy and, on the other hand, to be able to protect the substrate 59 from damage by the structuring radiation and / or a high absorption for the EUV radiation used in the operation of the reflective optical element 50 in order to protect the substrate 59 from corresponding radiation damage.
- an additional layer can also be provided between the structurable layer 60 and the substrate 59.
- a structurable layer 60 that has tungsten layers 63 or 64 and a total thickness of approx. 300 nm could be provided for electrons with an energy of 10 keV and a total thickness of approx. 600 nm for electrons with an energy of approx. 20 keV.
- a dedicated polishable or smoothable layer can be provided between the structurable layer 60 and the reflective coating 54 so that any roughening of the structurable layer 60 does not continue into the reflective coating 54 and reduce the reflectivity of the reflective optical element 50.
- the structurable layer can be made up of two or more subsections, each of at least one layer, with a polishable or smoothable layer being arranged between each two subsections.
- Any smoothing method can be used, such as ion-assisted smoothing, plasma-assisted smoothing, reactive ion-assisted smoothing, reactive plasma-assisted smoothing, plasma immersion smoothing, bias plasma-assisted smoothing, smoothing by means of magnetron sputtering with pulsed direct current, atomic layer smoothing.
- smoothing can be carried out on at least one or more or, if necessary, also on all layers 63, 64 of the structurable layer. This has proven to be advantageous in particular in the case of structurable layers which have thicker layers in order to be able to reduce the surface roughness of the finished reflective optical element, which could otherwise have a negative effect on the reflectivity in particular.
- the smoothing can be carried out both before, during and after the deposition of the at least one layer in order to reduce any roughening effect that may be present.
- any method can be used such as, for example, ion-assisted smoothing, plasma-assisted smoothing, reactive ion-assisted smoothing, reactive plasma-assisted smoothing, plasma immersion smoothing, bias-plasma-assisted smoothing, smoothing by means of magnetron sputtering with pulsed direct current, and atomic direct current.
- the structurable layer 61 which is arranged between the substrate 59 and the reflective coating 54, which can be configured as already explained in connection with FIG. 1, has a plurality of layers 65 , 66, 67 made of three different materials arranged in repeating stacks.
- the third material can also be a material that reacts exothermically or mixes with the other two materials.
- a material can also be provided which reduces or even completely compensates for stresses which are caused by the reflective coating 54 and the structurable layer 61.
- the materials as well as the number of layers and the thicknesses of at least one of the layers 65, 66, 67 can be optimized with regard to a compensation of the stress caused by the reflective coating 54.
- all other known measures for stress compensation or reduction can be taken, such as the symmetrical coating of the opposite side of the substrate, the provision of an additional layer between the substrate and the structurable layer or between the structurable layer and the reflective coating, whereby this layer can also have a multilayer structure.
- the material of the structurable layer or possibly the layers forming the structurable layer can be selected so that the overall layer tension both before and after structuring by local irradiation is as low as possible or the layer tension of the structurable layer is caused by the reflective coating Layer tension is opposite.
- the layer tension can also be influenced by the coating parameters. By reducing the overall layer tension, the risk of delamination can be reduced.
- At least one material as the layer material of the structurable layer that is derived from the structuring and / or layer tension resulting deformation can plastically adapt to this.
- One measure against detachment of the structurable layer and the substrate can be to provide an adhesion promoter layer between them.
- FIGS. 3 and 4 show a third exemplary embodiment of a reflective optical element 52, 52 'for the EUV wavelength range at the beginning of local irradiation (FIG. 3) and after the end of local irradiation (FIG. 4).
- a structurable layer 62, 62' is arranged between the substrate 59 and the reflective coating 54.
- a structurable layer 62, 62 'in the example shown here analogously to the example from FIG Mix exothermically by irradiation and / or react exothermically with one another.
- the layer materials are selected in such a way that, when mixing or reacting under the influence of the irradiation, the free Gibbs energy is in a range between -10 kJ / mol and -900 kJ / mol.
- the generation of heat is low enough not to damage the substrate or any reflective coating that may already be present.
- the state of the structurable layer after the reaction or mixing is noticeably more stable than in the initial state.
- the diameter of the electron beam it is also possible to work with two or more electron beams one after the other or in parallel, it is preferred to work with diameters in the range between 5 nm and 1000 ⁇ m. Diameters of up to 1000 ⁇ m are more suitable, for example, in order to introduce binary grids for bending out of the beam path of false rays in the infrared range. With diameters in the range of up to 5 nm, for example, high-resolution structures such as phase shift masks can be introduced.
- the local irradiation of the structurable layer can cause a local change in the thickness of the structurable layer and thus a structuring of this layer be evoked.
- the density fluctuations can correlate, among other things, with structural and / or stoichiometric differences between the materials at the points of different density.
- the irradiation with electrons has the effect of compacting, so that a depression has formed under the reflective coating 54 at the irradiated point.
- a phase shift can occur with smaller values, for example.
- any false radiation of higher wavelengths that may be present can be bent out of the beam path.
- the structurable layer has at least one layer of a material with a density of 12 g / cm 3 or more, preferably 15 g / cm 3 or more, particularly preferably 18 g / cm 3 , as much as possible to the penetration depth of the irradiation to limit the structurable layer and to avoid a negative effect on the substrate material.
- the materials of the layers 68, 69 are selected such that they have a very low solubility at room temperature and a high solubility with one another at temperatures of 300 ° C. and higher.
- the structurable layer is in a metastable state at room temperature. If it is heated locally to a sufficiently high temperature through the input of energy through irradiation, these materials can mix, which can lead to a change in density and thus structuring.
- the structurable layer particularly preferably has a first material from the group consisting of tungsten, tantalum and iridium and a further material from the group consisting of vanadium, titanium, rhodium, platinum and chromium.
- the structurable layer 62, 62 has one or more of the materials of the group consisting of tungsten, rhenium, osmium, iridium, tantalum, hafnium, ruthenium, platinum, gold, their alloys, their oxides, their carbides, their, Nitrides and their borides.
- These materials have the advantage that they can protect the substrate from radiation damage when the reflective optical element is operated with EUV radiation. In addition, they have a high absorption for electrons, so that the electron energy can be converted particularly well into activation energy.
- the total thickness of the structurable layer 62, 62 ' can be kept smaller than in the case of materials with lower absorption for electrons and EUV radiation, so that any layer stress that may occur can be minimized more easily.
- the structurable layer 62, 62 ' at least one further material from the group consisting of carbon, boron, silicon, boron carbide and boron nitride.
- Boron carbide and boron nitride can also be applied in non-stoichiometric proportions as B x C y or B X N Z , so that the individual elements boron, carbon and nitrogen can react well, in particular with the aforementioned metals.
- Carbon layers can preferably be applied as amorphous or diamond-like layers.
- layers of tantalum, platinum and titanium in particular have the property of being able to adapt plastically to deformations. If the structurable layer on the substrate side with a layer of chromium, tantalum, niobium, molybdenum, titanium terminates one of their alloys or compounds and the substrate is made of silicon, silicon carbide, silicon-infiltrated silicon carbide, quartz glass, titanium-doped quartz glass, glass and glass ceramic, an adhesion promoter layer can be between the structurable Layer and substrate have a particularly good adhesive effect.
- Tungsten disilicide resulting from an irradiation-induced reaction results from a density of 9.3 g / cm 3 and a molar mass of 240.01 g / mol, a molar volume of 25.81 g / mol.
- the molar ratio of tungsten to silicon should be 1: 2 in the structurable layer, the shrinkage of the structurable layer as a result of the irradiation, if it is completely converted into tungsten disilicide at the irradiated areas, is about 23%.
- the structurable layer should have a total thickness of 4.2 nm if a reduction by 1 nm is sought. This procedure can be transferred accordingly to any material combination.
- the layer thicknesses are selected in such a way that no further change in thickness occurs after a desired change in thickness of the structurable layer has been achieved.
- the thicknesses of the individual layers of the structurable layer should then be selected such that after a certain irradiation dose the individual layers have completely mixed or reacted with one another, so that the structuring process cannot continue even if the irradiation goes a little further, i.e. the structuring process is self-terminating.
- FIGS. 5 and 6 the sequence of the two basic possibilities is shown schematically as to how the reflective optical elements described above for the EUV wavelength range can be produced in the manner proposed here.
- the sequence shown in FIG. 5 corresponds to the procedure that was explained in connection with the previous examples.
- a structurable layer is first applied to a substrate, then in a step 503 a reflective coating is applied to the substrate provided with a structurable layer, so that the structurable layer is arranged between the substrate and the reflective coating.
- the structurable layer arranged below the reflective coating is irradiated in order to structure it.
- At least two layers of different materials can be applied as a structurable layer.
- the materials of the layers can be materials which react exothermically with one another or can mix exothermically.
- the applied structurable layer can also have at least two materials which have a very low solubility at room temperature and a high solubility with one another at temperatures of 300 ° C. and higher. In this case, these materials can advantageously be applied as at least two layers of different materials in each case in order to form the layer that can be structured.
- the structuring can be carried out by local irradiation in two or more partial steps using different irradiation parameters such as energy, dose, type of irradiation and / or appropriate design of the structurable layer by dividing it into two or more partial stacks and varying the layer material and thickness in which the structuring is initially carried out in the area of the structurable layer facing away from the substrate and the structuring is carried out ever closer to the substrate in the or subsequent irradiation steps by working at different penetration depths.
- different irradiation parameters such as energy, dose, type of irradiation and / or appropriate design of the structurable layer by dividing it into two or more partial stacks and varying the layer material and thickness in which the structuring is initially carried out in the area of the structurable layer facing away from the substrate and the structuring is carried out ever closer to the substrate in the or subsequent irradiation steps by working at different penetration depths.
- the reflectivity can be increased by adding one of the layers, preferably several or even all layers, during coating or after Application of the respective layer and before the next layer is applied to it, it is smoothed by irradiation with ions.
- a surface roughness that is too high can otherwise lead to poorer reflectivity than would be expected on the basis of the structure of the reflective coating.
- a particularly positive effect was observed with silicon layers.
- the reflective optical elements proposed here for the EUV wavelength range can in particular be used as EUV mirrors, for example in EUV lithography devices or in mask or wafer inspection systems. They can also be used as masks in EUV lithography devices. If necessary, these reflective optical elements can be repaired by measuring the surface profile of the reflective coating and comparing it with a target profile and, in the case of one or more locations in the surface profile that deviate from the target profile, the substrate at this or these locations and / or the structurable layer is irradiated. By locally irradiating the substrate and / or the structurable layer, a change in thickness can be introduced there, in particular through a change in density, which can lead to the deviation of the actual surface profile from the target profile becoming smaller there.
- Electron irradiation is also advantageously used for repairs, in which case electrons with a higher energy can be used than with the structuring that has already been carried out in order to be able to achieve a greater penetration depth and thus a local change in density in deeper areas.
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JP2022567427A JP2023524792A (ja) | 2020-05-07 | 2021-05-05 | Euv波長域用の反射光学素子を製造する方法及びeuv波長域用の反射光学素子 |
EP21725451.5A EP4147093A1 (de) | 2020-05-07 | 2021-05-05 | Verfahren zum herstellen von reflektiven optischen elementen für den euv-wellenlängenbereich sowie reflektive optische elemente für den euv-wellenlängenbereich |
KR1020227042392A KR20230009414A (ko) | 2020-05-07 | 2021-05-05 | Euv 파장 범위용 반사 광학 요소의 제조 방법 및 euv 파장 범위용 반사 광학 요소 |
US17/981,798 US20230253129A1 (en) | 2020-05-07 | 2022-11-07 | Method for producing reflective optical elements for the euv wavelength range, and reflective optical elements for the euv wavelength range |
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US20230253129A1 (en) | 2023-08-10 |
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