WO2021200809A1 - Ceramic circuit board, electronic device, and metal member - Google Patents

Ceramic circuit board, electronic device, and metal member Download PDF

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Publication number
WO2021200809A1
WO2021200809A1 PCT/JP2021/013260 JP2021013260W WO2021200809A1 WO 2021200809 A1 WO2021200809 A1 WO 2021200809A1 JP 2021013260 W JP2021013260 W JP 2021013260W WO 2021200809 A1 WO2021200809 A1 WO 2021200809A1
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WIPO (PCT)
Prior art keywords
metal member
face
circuit board
boundary
brazing material
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PCT/JP2021/013260
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French (fr)
Japanese (ja)
Inventor
良太 青野
穣 牛島
田中 淳一
辰雄 猿渡
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デンカ株式会社
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Priority to JP2022512203A priority Critical patent/JPWO2021200809A1/ja
Publication of WO2021200809A1 publication Critical patent/WO2021200809A1/en

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    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/13Mountings, e.g. non-detachable insulating substrates characterised by the shape
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal

Definitions

  • the present invention relates to ceramic circuit boards, electronic devices, and metal members.
  • Ceramic circuit boards in which a metal member is bonded to a ceramic substrate are widely used for electronic parts, mechanical parts, and the like.
  • electronic devices in which semiconductor elements are mounted on a ceramic circuit substrate are used.
  • a method of joining the ceramic substrate and the metal member there is a method of joining the ceramic substrate and the metal member using a brazing material.
  • a brazing material containing silver / copper and an active metal is applied to a ceramic substrate, a metal member is placed on the brazing material, and heat treatment is performed at an appropriate temperature to form a ceramic substrate and a metal plate.
  • Patent Document 1 in a ceramic circuit substrate in which a metal plate is integrally bonded to the surface of a ceramic substrate via a brazing material layer, the area of the bonding surface between the metal plate and the brazing material layer is the non-bonding surface of the metal plate.
  • a ceramic circuit substrate is disclosed, which is smaller than the surface area on the side and the area of the joint surface between the brazing material layer and the ceramics substrate is larger than the area of the joint surface between the metal plate and the brazing material layer.
  • a ceramic circuit board formed by joining a plate-shaped metal member to at least one surface of a ceramic substrate via a brazing material.
  • the metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
  • the end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
  • the metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
  • the present invention is a plate-shaped metal member bonded to one surface of a ceramic substrate with a brazing material.
  • the metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
  • the end face has a recess located inside the metal member with respect to the boundary between the end face and the second face.
  • a ceramic circuit board having a convex portion located outside the boundary between the end face and the first surface or the boundary between the end face and the second surface is provided. ..
  • an electronic device including the ceramic circuit board is provided.
  • a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
  • the metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
  • the end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
  • the metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
  • a ceramic circuit board that prevents the brazing material from rising to the surface of the metal member when joining a plate-shaped metal member to the ceramic substrate via a brazing material, and an electronic device including the ceramics circuit board. Also, it is possible to provide a metal member to be bonded to a ceramic substrate.
  • FIG. 1 is a cross-sectional view schematically showing the overall configuration of the ceramic circuit board 100 according to the present embodiment.
  • the ceramic circuit board 100 according to the present embodiment includes a ceramic substrate 10, a brazing material 20, and a plate-shaped metal member 30.
  • a plate-shaped metal member 30 is bonded to at least one surface of the ceramic substrate 10 via a brazing material 20, and the ceramic substrate 10, the brazing material 20, and the metal member 30 are fixed to each other by joining.
  • the ceramic substrate 10 has a first surface 11 and a second surface 12.
  • a plate-shaped metal member 30 is joined to the ceramic substrate 10 on the second surface 12 via a brazing material 20.
  • the structure of the ceramic circuit board 100 according to the present embodiment is not limited to the above structure.
  • the ceramic circuit board 100 has a first surface 11 or a second surface 12 as shown in FIG. 1 (a).
  • a plate-shaped metal member 30 may be joined to either of them, or as shown in FIG. 1 (b), the metal member 30 is joined to both sides of the first surface 11 and the second surface 12. You may.
  • FIG. 2 shows a top view schematically showing the ceramic circuit board 100 according to the present embodiment.
  • one metal member 30 may be bonded to the first surface 11 and the second surface 12, respectively, or one metal member 30 may be bonded to the first surface 11 and the second surface 11 is bonded to the second surface 11.
  • Two or more metal members 30 may be joined to the surface 12, or two or more metal members 30 are joined to the first surface 11, and one metal member 30 is joined to the second surface 12.
  • two or more metal members 30 may be joined to the first surface 11 and the second surface 12, respectively.
  • the metal member 30 is polygonal in a plan view, and is preferably rectangular.
  • FIG. 3 is a cross-sectional view schematically showing the configuration of the ceramic circuit board 100 of the first embodiment.
  • the metal member 30 exists between the first surface 31 facing the ceramic substrate, the second surface 32 opposite to the first surface 31, and the outer peripheral ends of both sides thereof. It has an end face 33 to be formed.
  • the end face 33 has a convex portion 36 that is convex outward of the metal member 30.
  • the convex portion 36 is located outside the metal member 30 than either the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32. It is preferable that the convex portion 36 is provided so as to orbit the entire circumference of the end surface 33.
  • FIG. 2B two rectangular metal members 30 are provided in a top view, but a convex portion 36 is provided so as to orbit all four sides of the rectangle of the end face 33 of each metal member 30. May be done.
  • the metal member 30 has an angle formed by the lower end of the end surface 33 and the first surface 31 at any of the cut surfaces in the thickness direction along the diagonal line, as shown here in the region ⁇ . Is ⁇ A , the following equation (1) is satisfied. Equation (1) 0 ° ⁇ A ⁇ 90 °
  • the lower limit of ⁇ A is preferably 35 ° or more, and particularly preferably 40 ° or more.
  • the upper limit of ⁇ A is preferably 87 ° or less, particularly preferably 82 ° or less.
  • any of the cut surfaces of the metal member 30 in the thickness direction along the diagonal line refers to, for example, a cross section when cut along the straight lines a to d in FIG. When the metal member 30 is rectangular, it is preferable that the two diagonal cut surfaces satisfy the above range of ⁇ A.
  • the ceramic circuit board according to the first embodiment is a ceramic circuit board capable of more reliably suppressing the rising of the brazing material by forming the end face 33 of the metal member 30 into the above shape. That is, conventionally, in the brazing step of joining the ceramic substrate 10 and the metal member 30 via the brazing material 20, the brazing material 20 travels along the end surface 33 of the metal member 30 at the joint end portion and is the upper surface of the metal member 30. It may rise to the (second surface 32), and when a semiconductor chip or the like is mounted on the upper surface (second surface 32) of the metal member 30 in a subsequent process, the solder wettability is reduced by the raised brazing material. As a result, poor soldering and poor appearance occurred, which contributed to the decrease in yield.
  • the end surface 33 of the metal member 30 is more than the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32.
  • the brazing material is the second metal member 30. Since the path to reach the surface 32 of the surface 32 has a plurality of inversions, becomes more complicated, and becomes longer, it is possible to reliably suppress the rise of the brazing material.
  • the amount of protrusion of the convex portion must be increased, and the metal member having the convex portion at the end must be used. , There is a risk that a discharge will occur between the metal member having a convex portion at another adjacent end and the withstand voltage will decrease.
  • the angle ⁇ A formed by the lower end of the end surface 33 and the first surface 31 is an acute angle, it is possible to surely suppress the rising of the brazing material and to make it convex. Since the amount of protrusion of the portion 36 can be suppressed, the risk of discharge can be reduced, and restrictions on circuit design such as the distance between patterns must be set to a certain level or more in consideration of the amount of protrusion can be relaxed. Can be done.
  • the convex portion 36 is outside the metal member 30 of either the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32. It is preferably located at.
  • the path for the brazing material to reach the second surface 32 of the metal member 30 has three or more inversions, is more complicated, and becomes longer, so that the brazing material is more reliable. It is possible to suppress the rise of metal.
  • the metal member 30 preferably satisfies the following formula (2) when the angle formed by the upper end of the end surface 33 and the second surface 32 is ⁇ B. Equation (2) 0 ° ⁇ B ⁇ 90 °
  • the lower limit of ⁇ B is preferably 40 ° or more, and particularly preferably 45 ° or more.
  • the upper limit of ⁇ B is preferably 88 ° or less, and particularly preferably 83 ° or less.
  • the method for measuring ⁇ B is the same as the method for measuring ⁇ A described above, and will be described with reference to FIG.
  • ⁇ B be the angle formed by the inclination B.
  • the above ⁇ B can generally be approximated to the angle formed by the second surface 32 and the inclination B at the upper end (boundary 35) of the end surface 33.
  • the risk of withstand voltage reduction can be suppressed and the brazing material can be reliably inserted.
  • the rise can be suppressed.
  • the amount of the brazing material applied also affects the liftability of the brazing material.
  • the coating amount of the brazing material is the dry film thickness of the brazing material paste before the joining step, and can be, for example, 2 ⁇ m or more and 40 ⁇ m or less.
  • FIG. 4 is a cross-sectional view schematically showing the configuration of the ceramic circuit board 101 of the second embodiment.
  • the metal member 30 exists between the first surface 31 facing the ceramic substrate, the second surface 32 opposite to the first surface 31, and the outer peripheral ends of both sides thereof. It has an end face 33.
  • the end surface 33 has a recess 37 located inside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32, and the end surface 33 is the boundary 34 between the end surface 33 and the first surface 31.
  • it has a convex portion 36 located outside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32.
  • the metal member 30 has a recess 37 located inside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32, and the end surface 33 and the first surface 32.
  • the brazing material is the third of the metal member 30. Since the path to reach the second surface 32 has a plurality of inversions, becomes more complicated, and becomes longer, it is possible to more reliably suppress the rise of the brazing material.
  • the end face 33 has the concave portion 37 and the convex portion 36, so that the protrusion amount of the convex portion 36 can be suppressed and the brazing material can be reliably lifted. Since it can be suppressed, it is possible to suppress the decrease in the withstand voltage and surely suppress the rise of the brazing material.
  • the end surface 33 is located on the first curved surface 38, which is concave inside the metal member 30, and on the second surface 32 side of the first curved surface 38, and the metal member 30. It is preferable to have a concave second curved surface 39 and a ridge line 40 sandwiched between the first curved surface 38 and the second curved surface 39 on the inner side.
  • the route for the brazing material to reach the second surface 32 of the metal member 30 is three times. Since it has the above inversion, is more complicated, and becomes longer, it is possible to more reliably suppress the rising of the brazing material.
  • the convex portion 36 is more than one of the boundary 34 between the end surface 33 and the first surface 31 and the boundary 35 between the end surface 33 and the second surface 32. It is preferably located on the outside of the metal member 30. Further, in the second embodiment, it is preferable that the ridge line 40 of the metal member 30 is located at the outer edge of the metal member rather than the outer peripheral ends of the first surface 31 and the second surface 32. With the above shape, the path for the brazing material to reach the second surface 32 of the metal member 30 is more complicated and longer, so that the brazing material can be more reliably suppressed from rising. ..
  • the risk of withstand voltage reduction can be suppressed and the brazing material can be reliably inserted.
  • the rise can be suppressed.
  • the liftability of the brazing material is also affected by the amount of the brazing material applied, the pressure applied to the laminate of the ceramic substrate 10 and the metal member 30 at the time of joining, and the like.
  • the amount of the material applied is large, or when the pressure applied to the laminate is large, the horizontal distance between the boundary 34 between the end surface 33 and the first surface 31 and the apex of the convex portion 36 is increased, and so on. It is preferable to adjust the shape of the metal member 30 in consideration of the balance between the factors that promote the rise and the factors that suppress the rise.
  • FIG. 5 is a cross-sectional view schematically showing the configuration of the ceramic circuit board 102 of the third embodiment.
  • FIG. 6 shows an example of a cross-sectional photograph when a copper plate is used as the metal member 30 of the third embodiment.
  • the shape of the end face 33 of the metal member 30, which is different from the first and second embodiments, will be described.
  • the end surface 33 is located on the first curved surface 38 recessed inside the metal member 30 and on the second surface 32 side of the first curved surface 38, and is inside the metal member 30. It has a concave second curved surface 39, and a convex portion 36 having a curved convex shape 45 on the outer side sandwiched between the first curved surface 38 and the second curved surface 39.
  • the first curved surface 38 and the convex portion 36 are continuous at the inflection point 43.
  • the second curved surface 39 and the convex portion 36 are continuous at the inflection point 44.
  • the metal member 30 according to the third embodiment has a metal brazing material because the end face 33 has two concave portions 37 (first curved surface 38 and second curved surface 39) and a convex portion 36. Since the path to reach the second surface 32 of the member 30 has three or more inversions, is more complicated, and becomes longer, it is possible to more reliably suppress the rise of the brazing material.
  • a plate-shaped metal material having a predetermined masking is individually separated by etching.
  • the method for etching is as shown below.
  • the surface of the metal material is masked by a known method.
  • masking it is preferable that the same pattern is applied to both sides of the metal material by aligning both sides by a known method.
  • the masked metal material is separated by etching.
  • a known etching solution can be used as the etching solution.
  • specific examples thereof include ferric chloride, cupric chloride, sulfuric acid, and hydrogen peroxide solution.
  • the masking patterns are etched from both sides, and the metal member 30 having a specific end shape according to the present embodiment can be obtained.
  • the shape of the metal member 30 can be adjusted by etching conditions and the like. For example, by adjusting the concentration of the etching solution and the etching time, it is possible to adjust the amount of protrusion of ⁇ A , ⁇ B, and the convex portion 36 of the metal member 30. Subsequently, by removing the masking, the metal member 30 is obtained.
  • Examples of the metal used for the metal member 30 according to the present embodiment include copper, aluminum, iron, nickel, chromium, silver, molybdenum, cobalt alone or an alloy thereof.
  • copper is preferable from the viewpoint of joining the metal member 30 to the ceramic substrate 10 with a brazing material containing an active metal, and from the viewpoint of conductivity and heat dissipation.
  • its purity is preferably 90% or more.
  • a ceramic circuit board having sufficient conductivity and heat dissipation can be obtained, and when the ceramic substrate and the copper plate are joined, the reaction between the copper plate and the brazing material proceeds sufficiently, and the reliability is high.
  • a ceramic circuit board can be obtained.
  • the thickness of the metal member 30 according to the present embodiment is not particularly limited, but is generally 0.1 mm or more and 1.5 mm or less.
  • the thickness of the metal member 30 is particularly preferably 0.2 mm or more from the viewpoint of heat dissipation, and preferably 0.5 mm or less from the viewpoint of heat resistance cycle characteristics.
  • the ceramic substrate 10 used in the ceramic circuit substrate according to the present embodiment is not particularly limited, and is not particularly limited. Examples thereof include carbide-based ceramics such as silicon carbide and boron-based ceramics such as lanthanum boring. As will be described later, non-oxide ceramics such as aluminum nitride and silicon nitride are preferable from the viewpoint of joining the metal member 30 to the ceramic substrate 10 with a silver-copper brazing material containing an active metal. From the viewpoint of excellent thermal conductivity, an aluminum nitride substrate is preferable.
  • the thickness of the ceramic substrate 10 according to the present embodiment is not particularly limited, but is preferably 0.2 mm or more and 1.5 mm or less. By setting the value within the above numerical range, sufficient strength and durability can be maintained and thermal resistance can be suppressed.
  • the brazing material 20 is a silver-copper system containing at least one active metal selected from titanium, zirconium, hafnium, niobium, tantalum, vanadium, aluminum, and tin in the brazing material. It is preferably composed of brazing material.
  • the Ag / Cu ratio in the brazing filler metal is increased from 72% by mass: 28% by mass, which is the eutectic composition of Ag and Cu, to prevent coarsening of the Cu-rich phase and to be Ag-rich. It is possible to form a brazing layer structure in which the phases are continuous.
  • the blending ratio of Ag powder and Cu powder, Sn powder or In powder is Ag powder: 85.0 parts by mass or more and 95.0 parts by mass or less, Cu powder: 5.0 parts by mass or more and 13.0 parts by mass or less. , Sn powder or In powder: preferably composed of 0.4 parts by mass or more and 3.5 parts by mass or less.
  • the amount of the active metal such as titanium added is preferably 1.5 parts by mass or more and 5.0 parts by mass or less with respect to 100 parts by mass in total of Ag powder, Cu powder, Sn powder or In powder.
  • the method for manufacturing the ceramic circuit board according to the present embodiment will be described below.
  • the ceramic substrate 10 and the metal member 30 are prepared.
  • the aspects of the ceramic substrate 10 and the metal member 30 are as described above.
  • a brazing paste is prepared.
  • the composition of the metal component of the brazing filler metal is as described above.
  • Ag powder 85.0 parts by mass or more and 95.0 parts by mass or less
  • Cu powder 5.0 parts by mass or more and 13.0 parts by mass or less
  • Sn powder or In Powder A powder consisting of 0.4 parts by mass or more and 3.5 parts by mass or less is preferable.
  • the amount of the active metal such as titanium added is preferably 1.5 parts by mass or more and 5.0 parts by mass or less with respect to 100 parts by mass in total of Ag powder, Cu powder, Sn powder or In powder.
  • a brazing paste can be obtained by mixing these metal powders with a resin, a solvent, and if necessary, a dispersant or the like by a known method. Subsequently, the brazing material paste is applied to one side or both sides of the ceramic substrate 10.
  • the coating method is not particularly limited, and coating can be performed by, for example, screen printing.
  • the dry film thickness of the applied brazing paste is preferably, for example, 1 ⁇ m or more and 50 ⁇ m or less.
  • the metal member 30 is stacked so as to be in contact with the brazing paste applied to the ceramic substrate 10 and heated in a heating furnace to join the ceramic substrate 10 and the metal member 30.
  • the joining temperature for joining the ceramic substrate 10 and the metal member 30 is preferably 780 ° C. or higher and 850 ° C. or lower, and more preferably lower than 800 ° C.
  • the degree of vacuum at the time of joining is preferably 1 ⁇ 10 -3 Pa or less. Further, it is desirable that the holding time at the joining temperature is 10 minutes or more and 60 minutes or less.
  • the joining temperature, the degree of vacuum, and the joining time are set within the above ranges, a compound containing an active metal is sufficiently generated, and the ceramic substrate 10 and the metal member 30 can be joined over the entire surface.
  • the bonding temperature is high or the holding time is too long, the thickness unevenness of the brazing material layer after bonding may increase, and cracks may occur due to ultrasonic bonding.
  • the degree of vacuum and the bonding time within the above ranges, it is possible to reduce uneven thickness of the brazing material after bonding. As described above, the ceramic circuit board according to the present embodiment can be obtained.
  • the ceramic circuit board according to this embodiment can be used for an electronic device, and can also undergo a circuit pattern forming step by etching.
  • the metal member 30 can be etched by applying an etching resist.
  • the etching resist There are no particular restrictions on the etching resist, and known ultraviolet curable types and thermosetting types can be used.
  • the method for applying the etching resist is not particularly limited, and a known application method such as a screen printing method can be adopted.
  • the etching solution is not particularly limited, and a known etching solution can be used.
  • the metal member 30 is a copper plate, a ferric chloride solution, a cupric chloride solution, sulfuric acid, a hydrogen peroxide solution, or the like is used.
  • a ferric chloride solution or a cupric chloride solution is preferable.
  • a brazing material, its alloy layer, a nitride layer, etc. may remain on the ceramic circuit board from which unnecessary metal parts have been removed by etching.
  • an aqueous solution of ammonium halide, an inorganic acid such as sulfuric acid or nitric acid It is common to remove them with a solution containing aqueous hydrogen peroxide.
  • the etching resist can be peeled off by a known method.
  • the peeling method is not particularly limited, and examples thereof include a method of immersing in an alkaline aqueous solution.
  • the ceramic circuit boards 100, 101, and 102 according to the present embodiment can be made into an electronic device, for example, by mounting a semiconductor chip or the like on the second surface 32 of the metal member 30.
  • the ceramic circuit boards 100, 101 and 102 according to the present embodiment can be particularly preferably applied to power devices that require high voltage and large current operation, such as those for electric railways, vehicles, and industrial machines.
  • the present invention is not limited to the above-described embodiment, and modifications, improvements, and the like within the range in which the object of the present invention can be achieved are included in the present invention.
  • a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
  • the metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
  • the end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
  • the metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
  • a ceramic circuit board that satisfies the following formula (1). Equation (1) 0 ° ⁇ A ⁇ 90 ° 2.
  • the metal member is rectangular.
  • the ceramic circuit board described in. 3. When the angle formed by the upper end of the end face and the second face is ⁇ B , 1. Satisfy the following equation (2). Or 2.
  • the ceramic circuit board described in. Equation (2) 0 ° ⁇ B ⁇ 90 ° 4.
  • the convex portion is provided so as to orbit the entire circumference of the end face. Or 2.
  • the ceramic circuit board described in. 5. In a ceramic circuit board in which a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
  • the metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
  • the end face has a recess located inside the metal member with respect to the boundary between the end face and the second face.
  • the end face is a ceramic circuit board having a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface. 6.
  • the end face First curved surface concave inside the metal member,
  • the second curved surface which is located on the second surface side of the first curved surface and is concave inside the metal member, and It has a ridgeline sandwiched between the first curved surface and the second curved surface.
  • the ceramic circuit board described in. 7.
  • the end face has a convex portion located outside the metal member from the boundary between the end face and the first surface and the boundary between the end face and the second surface.
  • the ridgeline is located at the outer edge of the metal member rather than the outer peripheral ends of the first surface and the second surface.
  • the metal member is a copper plate.
  • the brazing material comprises at least one metal selected from titanium, zirconium, hafnium, niobium, tantalum, vanadium, aluminum, and tin.
  • the ceramic substrate is at least one selected from silicon nitride and aluminum nitride. ⁇ 10.
  • the end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
  • the metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
  • ⁇ A A metal member satisfying the following formula (1). Equation (1) 0 ° ⁇ A ⁇ 90 ° 16.
  • the convex portion is provided so as to orbit the entire circumference of the end face.
  • Table 1 shows the evaluation results of Examples 1 to 3 and Comparative Examples 1 and 2.
  • “ ⁇ ” indicates “no rise”
  • “ ⁇ ” indicates “slight rise”
  • "x” indicates “clear rise”.
  • the presence / absence of the item "convex portion” in the table is more metal than the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32 on the end surface 33.
  • the case where the convex portion 36 located outside the member 30 is provided is described as “yes”
  • the case where the convex portion 36 does not protrude outward from the boundaries 34 and 35 is described as “absent”.
  • Example 1 A silicon nitride substrate (50 mm ⁇ 50 mm, thickness 0.32 mm) and a copper plate 1 (50 mm ⁇ 50 mm, thickness 0.8 mm) were prepared.
  • the copper plate 1 was subjected to the same masking pattern on both sides and immersed in an aqueous ferric chloride solution to etch from both sides of the copper plate and to be individualized.
  • the copper plate 1 was cut along the diagonal line with a contour machine to expose the cross section, and the cross section was observed with a metallurgical microscope.
  • ⁇ A formed by the lower end of the end surface 33 and the first surface 31 of the copper plate 1 was measured from the cross-sectional photograph, ⁇ A was as shown in Table 1.
  • the angle ⁇ B formed by the upper end of the end surface 33 of the copper plate 1 and the second surface 32 was measured, it was as shown in Table 1.
  • a brazing paste (Ag-Cu-Ti brazing material) was prepared. (Blazed material) The above brazing paste was printed on a silicon nitride substrate by screen printing and dried. The brazing paste was applied so that the thickness after drying was 20 ⁇ m. Then, the copper plate 1 was superposed on the brazing material, and the copper plate and the silicon nitride substrate were joined in a vacuum atmosphere to manufacture a ceramic circuit board.
  • Examples 2 to 3 Comparative Examples 1 to 2
  • etching was performed from both sides of the copper plate 1 to lengthen the immersion time in the ferric chloride aqueous solution to increase the angle, or to shorten the immersion time to reduce the angle. bottom.
  • Example 1 there was no rise in Example 2, the degree of rise in Example 3 was small, and the rise was clearly confirmed in Comparative Examples 1 and 2.
  • Ceramic substrate 11 First surface 12 Second surface 20 Brazing material 30 Metal member 31 First surface 32 Second surface 33 End surface 34 Boundary 35 Boundary 36 Convex 37 Concave 38 First curved surface 39 Second curved surface 40 Ridge line 43, 44 Inflection points 100, 101, 102 Ceramic circuit board

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Abstract

Provided is a ceramic circuit board (100) formed by joining a plate-shaped metal member (30) to at least one surface of a ceramic board (10) by means of a brazing material (20), wherein: the metal member (30) has a first surface (31) which faces the ceramic board (10), a second surface (32) which is the opposite surface from the first surface (31), and an edge face (33) which is present in the space between the outer peripheral edges of the first and second surfaces; the edge face (33) has a protruding portion (36) which is positioned further outward from the metal member than the boundary between the first surface (31) and the edge face (33) or the boundary (34) between the second surface (32) and the edge face; and the metal member (30) has a polygonal shape and satisfies formula (1), where θA is the angle formed between the first surface (31) and the lower end of the edge face (33) in any cross-section in the thickness direction along a diagonal of the polygon. Formula (1): 0°<θA<90°

Description

セラミックス回路基板、電子デバイス、及び、金属部材Ceramic circuit boards, electronic devices, and metal parts
 本発明は、セラミックス回路基板、電子デバイス、及び、金属部材に関する。 The present invention relates to ceramic circuit boards, electronic devices, and metal members.
 セラミックス基板に金属部材を接合したセラミックス回路基板は、電子部品や機械部品等に広く用いられている。例えば、電鉄、車両、産業機械向けといった高電圧、大電流動作を必要とするパワーデバイスにおいて、セラミックス回路基板上に半導体素子を搭載した電子デバイスが用いられている。
 セラミックス基板と金属部材を接合する方法の一つとして、セラミックス基板と金属部材とをろう材を用いて接合する方法がある。この場合、一般的には、銀・銅と活性金属を含むろう材をセラミックス基板に塗布し、ろう材上に金属部材を配置し、適当な温度で加熱処理することでセラミックス基板と金属板とを接合する。
Ceramic circuit boards in which a metal member is bonded to a ceramic substrate are widely used for electronic parts, mechanical parts, and the like. For example, in power devices such as those for electric railways, vehicles, and industrial machines that require high-voltage and large-current operations, electronic devices in which semiconductor elements are mounted on a ceramic circuit substrate are used.
As one of the methods for joining the ceramic substrate and the metal member, there is a method of joining the ceramic substrate and the metal member using a brazing material. In this case, in general, a brazing material containing silver / copper and an active metal is applied to a ceramic substrate, a metal member is placed on the brazing material, and heat treatment is performed at an appropriate temperature to form a ceramic substrate and a metal plate. To join.
 例えば、特許文献1には、セラミックス基板表面にろう材層を介して金属板を一体に接合したセラミックス回路基板において、金属板とろう材層との接合面の面積が、金属板の非接合面側の表面積より小さく、ろう材層とセラミックス基板との接合面の面積が金属板とろう材層との接合面の面積より大きいことを特徴とするセラミックス回路基板が開示されている。 For example, in Patent Document 1, in a ceramic circuit substrate in which a metal plate is integrally bonded to the surface of a ceramic substrate via a brazing material layer, the area of the bonding surface between the metal plate and the brazing material layer is the non-bonding surface of the metal plate. A ceramic circuit substrate is disclosed, which is smaller than the surface area on the side and the area of the joint surface between the brazing material layer and the ceramics substrate is larger than the area of the joint surface between the metal plate and the brazing material layer.
特開2001-332854号公報Japanese Unexamined Patent Publication No. 2001-332854
発明者らが検討したところ、特許文献1に開示された形状のセラミックス回路基板では、セラミックス基板に金属部材を接合する工程において、ろう材が金属部材表面にはい上がり、はい上がったろう材によってハンダ濡れ性が低下する場合があることが明らかになった。 As a result of examination by the inventors, in the ceramic circuit board having the shape disclosed in Patent Document 1, the brazing material rises to the surface of the metal member in the step of joining the metal member to the ceramic substrate, and the brazing material gets wet with solder. It has become clear that the sex may be reduced.
 本発明によれば、セラミックス基板の少なくとも一面にろう材を介して板状の金属部材を接合してなるセラミックス回路基板において、
 前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
 前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有し、
 前記金属部材は多角形であって、その対角線に沿った厚み方向のいずれかの切断面において、
 前記端面の下端と前記第一の面とが成す角をθとしたとき、下記式(1)を満たす、セラミックス回路基板が提供される。
 式(1) 0°<θ<90°
According to the present invention, in a ceramic circuit board formed by joining a plate-shaped metal member to at least one surface of a ceramic substrate via a brazing material.
The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
The metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
When the angle formed by the lower end of the end surface and the first surface is θ A , a ceramic circuit board satisfying the following equation (1) is provided.
Equation (1) 0 ° <θ A <90 °
 また、本発明によれば、セラミックス基板の一面にろう材で接合される板状の金属部材であって、
 前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
 当該端面は、当該端面と第二の面との境界よりも金属部材の内側に位置する凹部を有し、
 前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有するセラミックス回路基板が提供される。
Further, according to the present invention, it is a plate-shaped metal member bonded to one surface of a ceramic substrate with a brazing material.
The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
The end face has a recess located inside the metal member with respect to the boundary between the end face and the second face.
As the end face, a ceramic circuit board having a convex portion located outside the boundary between the end face and the first surface or the boundary between the end face and the second surface is provided. ..
 また、本発明によれば、前記セラミックス回路基板を備える電子デバイスが提供される。 Further, according to the present invention, an electronic device including the ceramic circuit board is provided.
 セラミックス基板の少なくとも一面にろう材を介して板状の金属部材を接合してなるセラミックス回路基板において、
 前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
 前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有し、
 前記金属部材は多角形であって、その対角線に沿った厚み方向のいずれかの切断面において、
 前記端面の下端と前記第一の面とが成す角をθとしたとき、
 下記式(1)を満たす、金属部材が提供される。
 式(1) 0°<θ<90°
In a ceramic circuit board in which a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
The metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
When the angle formed by the lower end of the end surface and the first surface is θ A ,
A metal member satisfying the following formula (1) is provided.
Equation (1) 0 ° <θ A <90 °
 本発明によれば、セラミックス基板にろう材を介して板状の金属部材を接合する際に、ろう材が金属部材表面にはい上がることを抑制したセラミックス回路基板、該セラミックス回路基板を備える電子デバイス、また、セラミックス基板に接合される金属部材を提供することができる。 According to the present invention, a ceramic circuit board that prevents the brazing material from rising to the surface of the metal member when joining a plate-shaped metal member to the ceramic substrate via a brazing material, and an electronic device including the ceramics circuit board. Also, it is possible to provide a metal member to be bonded to a ceramic substrate.
実施形態に係るセラミックス回路基板の構成を模式的に示す断面図である。It is sectional drawing which shows typically the structure of the ceramics circuit board which concerns on embodiment. 実施形態に係るセラミックス回路基板の構成を模式的に示す上面図である。It is a top view which shows typically the structure of the ceramics circuit board which concerns on embodiment. 第一の実施形態に係るセラミックス回路基板における金属部材の構成を模式的に示す断面図である。It is sectional drawing which shows typically the structure of the metal member in the ceramics circuit board which concerns on 1st Embodiment. 第二の実施形態に係るセラミックス回路基板の構成を模式的に示す断面図である。It is sectional drawing which shows typically the structure of the ceramic circuit board which concerns on 2nd Embodiment. 第三の実施形態に係るセラミックス回路基板の構成を模式的に示す断面図である。It is sectional drawing which shows typically the structure of the ceramic circuit board which concerns on 3rd Embodiment. 第三の実施形態に係る金属部材の断面写真の例を示す図である。It is a figure which shows the example of the cross-sectional photograph of the metal member which concerns on 3rd Embodiment.
 以下、本発明の実施の形態について、図面を用いて説明する。尚、すべての図面において、同様な構成要素には同様の符号を付し、適宜説明を省略する。また、図は概略図であり、実際の寸法比率とは一致していない。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In all drawings, similar components are designated by the same reference numerals, and description thereof will be omitted as appropriate. Moreover, the figure is a schematic view and does not match the actual dimensional ratio.
<セラミックス回路基板>
 はじめに、図1及び図2を用いて本実施形態に係るセラミックス回路基板の概要について説明する。
 図1は、本実施形態に係るセラミックス回路基板100の全体の構成を模式的に示す断面図である。本実施形態に係るセラミックス回路基板100は、セラミックス基板10、ろう材20、板状の金属部材30を備えるものである。セラミックス基板10の少なくとも一面にろう材20を介して板状の金属部材30が接合されており、接合によりセラミックス基板10、ろう材20、金属部材30が互いに固定されている。
<Ceramics circuit board>
First, the outline of the ceramic circuit board according to the present embodiment will be described with reference to FIGS. 1 and 2.
FIG. 1 is a cross-sectional view schematically showing the overall configuration of the ceramic circuit board 100 according to the present embodiment. The ceramic circuit board 100 according to the present embodiment includes a ceramic substrate 10, a brazing material 20, and a plate-shaped metal member 30. A plate-shaped metal member 30 is bonded to at least one surface of the ceramic substrate 10 via a brazing material 20, and the ceramic substrate 10, the brazing material 20, and the metal member 30 are fixed to each other by joining.
 セラミックス基板10は第一の面11と第二の面12とを有する。セラミックス基板10には、第二の面12上に、ろう材20を介し、板状の金属部材30が接合されている。本実施形態に係るセラミックス回路基板100の構造は、上記構造に限定されず、例えばセラミックス回路基板100は、図1の(a)に示すように、第一の面11又は第二の面12のいずれかに板状の金属部材30が接合されていてもよいし、図1の(b)に示すように、第一の面11及び第二の面12の両面に金属部材30が接合されていてもよい。また、図2に、本実施形態に係るセラミックス回路基板100を模式的に示す上面図を示す。セラミックス回路基板100は第一の面11及び第二の面12に、それぞれ一つの金属部材30が接合されていてもよいし、第一の面11に一つの金属部材30が接合され、第二の面12に2以上の金属部材30が接合されていてもよいし、第一の面11に2以上の金属部材30が接合され、第二の面12に一つの金属部材30が接合されていてもよいし、第一の面11及び第二の面12に、それぞれ2以上の金属部材30が接合されていてもよい。金属部材30は平面視で多角形であり、矩形であることが好ましい。 The ceramic substrate 10 has a first surface 11 and a second surface 12. A plate-shaped metal member 30 is joined to the ceramic substrate 10 on the second surface 12 via a brazing material 20. The structure of the ceramic circuit board 100 according to the present embodiment is not limited to the above structure. For example, the ceramic circuit board 100 has a first surface 11 or a second surface 12 as shown in FIG. 1 (a). A plate-shaped metal member 30 may be joined to either of them, or as shown in FIG. 1 (b), the metal member 30 is joined to both sides of the first surface 11 and the second surface 12. You may. Further, FIG. 2 shows a top view schematically showing the ceramic circuit board 100 according to the present embodiment. In the ceramic circuit board 100, one metal member 30 may be bonded to the first surface 11 and the second surface 12, respectively, or one metal member 30 may be bonded to the first surface 11 and the second surface 11 is bonded to the second surface 11. Two or more metal members 30 may be joined to the surface 12, or two or more metal members 30 are joined to the first surface 11, and one metal member 30 is joined to the second surface 12. Alternatively, two or more metal members 30 may be joined to the first surface 11 and the second surface 12, respectively. The metal member 30 is polygonal in a plan view, and is preferably rectangular.
 以下、本実施形態に係るセラミックス回路基板の各構成について詳述する。 Hereinafter, each configuration of the ceramic circuit board according to this embodiment will be described in detail.
<金属部材>
(第一の実施形態)
 図3を参照し、第一の実施形態について詳述する。図3は第一の実施形態のセラミックス回路基板100の構成を模式的に示す断面図である。
<Metal member>
(First Embodiment)
The first embodiment will be described in detail with reference to FIG. FIG. 3 is a cross-sectional view schematically showing the configuration of the ceramic circuit board 100 of the first embodiment.
 第一の実施形態において、金属部材30はセラミックス基板に対向する第一の面31と、当該第一の面31とは逆の第二の面32と、その両面の外周端の相互間に存在する端面33とを有する。端面33は、金属部材30の外方向に凸の、凸部36を有する。また、凸部36は、端面33と第一の面31との境界34、又は、端面33と第二の面32との境界35のいずれか一方よりも金属部材30の外側に位置する。凸部36は、端面33の周全体にわたって周回するように設けられていることが好ましい。例えば、図2(b)では、上面視で矩形の二つの金属部材30が設けられているが、それぞれの金属部材30の端面33の矩形の4辺全てを周回するように凸部36が設けられてもよい。 In the first embodiment, the metal member 30 exists between the first surface 31 facing the ceramic substrate, the second surface 32 opposite to the first surface 31, and the outer peripheral ends of both sides thereof. It has an end face 33 to be formed. The end face 33 has a convex portion 36 that is convex outward of the metal member 30. Further, the convex portion 36 is located outside the metal member 30 than either the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32. It is preferable that the convex portion 36 is provided so as to orbit the entire circumference of the end surface 33. For example, in FIG. 2B, two rectangular metal members 30 are provided in a top view, but a convex portion 36 is provided so as to orbit all four sides of the rectangle of the end face 33 of each metal member 30. May be done.
 第一の実施形態において、金属部材30はその対角線に沿った厚み方向のいずれかの切断面において、ここでは領域αに示すように、端面33の下端と前記第一の面31とが成す角をθとしたとき、下記式(1)を満たす。
 式(1) 0°<θ<90°
 θの下限値35°以上が好ましく、40°以上が特に好ましい。θの上限値87°以下が好ましく、82°以下が特に好ましい。
 ここで、金属部材30のその対角線に沿った厚み方向のいずれかの切断面とは、例えば図2の直線a~dで切断したときの断面をいう。なお、金属部材30が矩形の場合には、二つの対角線の切断面において、上記のθの範囲を満たすことが好ましい。
In the first embodiment, the metal member 30 has an angle formed by the lower end of the end surface 33 and the first surface 31 at any of the cut surfaces in the thickness direction along the diagonal line, as shown here in the region α. Is θ A , the following equation (1) is satisfied.
Equation (1) 0 ° <θ A <90 °
The lower limit of θ A is preferably 35 ° or more, and particularly preferably 40 ° or more. The upper limit of θ A is preferably 87 ° or less, particularly preferably 82 ° or less.
Here, any of the cut surfaces of the metal member 30 in the thickness direction along the diagonal line refers to, for example, a cross section when cut along the straight lines a to d in FIG. When the metal member 30 is rectangular, it is preferable that the two diagonal cut surfaces satisfy the above range of θ A.
 以下、図3を用いて、θの測定方法について詳説する。一方の端面33の下端(境界34)と、他方の端面(図示せず)の下端(図示せず)とを結んだ直線と、端面33の下端(境界34)における傾斜Aとの成す角をθとする。上記θは、一般には第一の面31と、端面33の下端(境界34)における傾斜Aとの成す角と近似することができる。 Hereinafter, with reference to FIG. 3 will be described in detail a method for measuring theta A. The angle formed by the straight line connecting the lower end (boundary 34) of one end face 33 and the lower end (not shown) of the other end face (not shown) and the inclination A at the lower end (boundary 34) of the end face 33. Let θ A. The above θ A can generally be approximated to the angle formed by the first surface 31 and the inclination A at the lower end (boundary 34) of the end surface 33.
 第一の実施形態に係るセラミックス回路基板は、金属部材30の端面33を上記形状とすることにより、ろう材のはい上がりをより確実に抑制することができるセラミックス回路基板となる。すなわち、従来、セラミックス基板10と金属部材30とを、ろう材20を介して接合するろう付け工程では、接合端部において、ろう材20が金属部材30の端面33を伝って金属部材30の上面(第二の面32)にはい上がる場合があり、後工程において、金属部材30の上面(第二の面32)に半導体チップ等を搭載する際に、はい上がったろう材によってハンダ濡れ性が低下してハンダ付け不良が発生したり、外観不良が発生したりし、歩留り低下の一因となっていた。 The ceramic circuit board according to the first embodiment is a ceramic circuit board capable of more reliably suppressing the rising of the brazing material by forming the end face 33 of the metal member 30 into the above shape. That is, conventionally, in the brazing step of joining the ceramic substrate 10 and the metal member 30 via the brazing material 20, the brazing material 20 travels along the end surface 33 of the metal member 30 at the joint end portion and is the upper surface of the metal member 30. It may rise to the (second surface 32), and when a semiconductor chip or the like is mounted on the upper surface (second surface 32) of the metal member 30 in a subsequent process, the solder wettability is reduced by the raised brazing material. As a result, poor soldering and poor appearance occurred, which contributed to the decrease in yield.
 第一の実施形態によれば、金属部材30の端面33が、前記端面33と前記第一の面31との境界34、又は、前記端面33と前記第二の面32との境界35よりも前記金属部材30の外側に位置する凸部36を有する形状とし、かつ、端面33の下端と前記第一の面31とが成す角を鋭角とすることによって、ろう材が金属部材30の第二の面32に到達するまでの経路が、複数回の反転を有し、より複雑になり、かつ、長くなるため、確実にろう材のはい上がりを抑制することができる。 According to the first embodiment, the end surface 33 of the metal member 30 is more than the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32. By forming the shape having the convex portion 36 located on the outside of the metal member 30 and making the angle formed by the lower end of the end surface 33 and the first surface 31 an acute angle, the brazing material is the second metal member 30. Since the path to reach the surface 32 of the surface 32 has a plurality of inversions, becomes more complicated, and becomes longer, it is possible to reliably suppress the rise of the brazing material.
 また、ろう材のはい上がりを抑制するために、例えば金属部材の端部に凸部を設けた場合、凸部の突出量を増大させざるを得ず、端部に凸部を有する金属部材と、隣り合う他の端部に凸部を有する金属部材との間で放電が起き、耐電圧が低下するリスクがある。
 第一の実施形態によれば、端面33の下端と前記第一の面31とが成す角θを鋭角とすることによって、確実にろう材のはい上がりを抑制することができ、かつ、凸部36の突出量を抑えることができるので、放電のリスクを低下させることができ、突出量を勘案してパターン間の距離を一定以上にしなければならない等の回路設計上の制約を緩和することができる。
Further, in order to suppress the rising of the brazing material, for example, when a convex portion is provided at the end of the metal member, the amount of protrusion of the convex portion must be increased, and the metal member having the convex portion at the end must be used. , There is a risk that a discharge will occur between the metal member having a convex portion at another adjacent end and the withstand voltage will decrease.
According to the first embodiment, by setting the angle θ A formed by the lower end of the end surface 33 and the first surface 31 to be an acute angle, it is possible to surely suppress the rising of the brazing material and to make it convex. Since the amount of protrusion of the portion 36 can be suppressed, the risk of discharge can be reduced, and restrictions on circuit design such as the distance between patterns must be set to a certain level or more in consideration of the amount of protrusion can be relaxed. Can be done.
 第一の実施形態において、凸部36は、端面33と第一の面31との境界34、及び、端面33と第二の面32との境界35のいずれか一方よりも金属部材30の外側に位置することが好ましい。
 上記形状とすることにより、ろう材が金属部材30の第二の面32に到達するまでの経路は、3回以上の反転を有し、より複雑、かつ、長くなるため、より確実にろう材のはい上がりを抑制することができる。
In the first embodiment, the convex portion 36 is outside the metal member 30 of either the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32. It is preferably located at.
With the above shape, the path for the brazing material to reach the second surface 32 of the metal member 30 has three or more inversions, is more complicated, and becomes longer, so that the brazing material is more reliable. It is possible to suppress the rise of metal.
 また、第一の実施形態において、金属部材30は、前記端面33の上端と前記第二の面32とが成す角をθとしたとき、下記式(2)を満たすことが好ましい。
 式(2) 0°<θ<90°
 θの下限値は40°以上が好ましく、45°以上が特に好ましい。θの上限値88°以下が好ましく、83°以下が特に好ましい。
 θを鋭角とすることで、ろう材は金属部材30の第二の面32に到達するまでの経路の後半において、再度反転することとなり、より確実にろう材のはい上がりを抑制することができる。
Further, in the first embodiment, the metal member 30 preferably satisfies the following formula (2) when the angle formed by the upper end of the end surface 33 and the second surface 32 is θ B.
Equation (2) 0 ° <θ B <90 °
The lower limit of θ B is preferably 40 ° or more, and particularly preferably 45 ° or more. The upper limit of θ B is preferably 88 ° or less, and particularly preferably 83 ° or less.
By setting θ B to an acute angle, the brazing material is inverted again in the latter half of the path until it reaches the second surface 32 of the metal member 30, and the brazing material can be more reliably suppressed from rising. can.
 θの測定方法は上述したθの測定方法と同様であり、図3を参照して説明する。領域βに示すように、一方の端面33の上端(境界35)と、他方の端面(図示せず)の上端(図示せず)とを結んだ直線と、端面33の上端(境界35)における傾斜Bとの成す角をθとする。上記θは、一般には第二の面32と、端面33の上端(境界35)における傾斜Bとの成す角と近似することができる。 The method for measuring θ B is the same as the method for measuring θ A described above, and will be described with reference to FIG. As shown in the region β, at the straight line connecting the upper end (boundary 35) of one end face 33 and the upper end (not shown) of the other end face (not shown) and at the upper end (boundary 35) of the end face 33. Let θ B be the angle formed by the inclination B. The above θ B can generally be approximated to the angle formed by the second surface 32 and the inclination B at the upper end (boundary 35) of the end surface 33.
 端面33と第一の面31との境界34と、凸部36の頂点との水平間距離を適正に設定することで、耐電圧低下のリスクを抑制しつつ、かつ、確実にろう材のはい上がりを抑制することができる。 By appropriately setting the horizontal distance between the boundary 34 between the end surface 33 and the first surface 31 and the apex of the convex portion 36, the risk of withstand voltage reduction can be suppressed and the brazing material can be reliably inserted. The rise can be suppressed.
 なお、ろう材のはい上がり性には、金属部材30の形状に加え、ろう材の塗布量も影響する。ろう材の塗布量は、接合工程前におけるろう材ペーストの乾燥膜厚で、例えば2μm以上40μm以下とすることができる。 In addition to the shape of the metal member 30, the amount of the brazing material applied also affects the liftability of the brazing material. The coating amount of the brazing material is the dry film thickness of the brazing material paste before the joining step, and can be, for example, 2 μm or more and 40 μm or less.
(第二の実施形態)
 以下、図4を参照し、第二の実施形態について詳述する。図4は第二の実施形態のセラミックス回路基板101の構成を模式的に示す断面図である。
 第二の実施形態において、金属部材30はセラミックス基板に対向する第一の面31と、当該第一の面31とは逆の第二の面32と、その両面の外周端の相互間に存する端面33とを有する。端面33は、端面33と第二の面32との境界35よりも金属部材30の内側に位置する凹部37を有し、端面33は、前記端面33と前記第一の面31との境界34、又は、前記端面33と前記第二の面32との境界35よりも前記金属部材30の外側に位置する凸部36を有する。
(Second embodiment)
Hereinafter, the second embodiment will be described in detail with reference to FIG. FIG. 4 is a cross-sectional view schematically showing the configuration of the ceramic circuit board 101 of the second embodiment.
In the second embodiment, the metal member 30 exists between the first surface 31 facing the ceramic substrate, the second surface 32 opposite to the first surface 31, and the outer peripheral ends of both sides thereof. It has an end face 33. The end surface 33 has a recess 37 located inside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32, and the end surface 33 is the boundary 34 between the end surface 33 and the first surface 31. Alternatively, it has a convex portion 36 located outside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32.
 第二の実施形態において、金属部材30は、端面33と第二の面32との境界35よりも金属部材30の内側に位置する凹部37を有し、かつ、前記端面33と前記第一の面31との境界34、又は、前記端面33と前記第二の面32との境界35よりも前記金属部材30の外側に位置する凸部36を有することにより、ろう材が金属部材30の第二の面32に到達するまでの経路が、複数回の反転を有し、より複雑になり、かつ、長くなるため、より確実にろう材のはい上がりを抑制することができる。また、本実施形態に係るセラミックス回路基板によれば、端面33が、凹部37と凸部36とを有することにより、凸部36の突出量を抑えつつ、かつ、確実にろう材のはい上がりを抑制することができるため、耐電圧の低下を抑制しつつ、かつ、確実にろう材のはい上がりを抑制することができる。 In the second embodiment, the metal member 30 has a recess 37 located inside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32, and the end surface 33 and the first surface 32. By having the boundary 34 with the surface 31 or the convex portion 36 located outside the metal member 30 with respect to the boundary 35 between the end surface 33 and the second surface 32, the brazing material is the third of the metal member 30. Since the path to reach the second surface 32 has a plurality of inversions, becomes more complicated, and becomes longer, it is possible to more reliably suppress the rise of the brazing material. Further, according to the ceramic circuit board according to the present embodiment, the end face 33 has the concave portion 37 and the convex portion 36, so that the protrusion amount of the convex portion 36 can be suppressed and the brazing material can be reliably lifted. Since it can be suppressed, it is possible to suppress the decrease in the withstand voltage and surely suppress the rise of the brazing material.
 第二の実施形態において、金属部材30は、端面33が、金属部材30の内側に凹の第一曲面38と、第一曲面38よりも第二の面32側に位置し、金属部材30の内側に凹の第二曲面39、及び、第一曲面38と当該第二曲面39に挟まれた稜線40を有することが好ましい。第二の実施形態に係る金属部材30は、端面33が、2つの凹部37と稜線40を有することにより、ろう材が金属部材30の第二の面32に到達するまでの経路が、3回以上の反転を有し、より複雑、かつ、長くなるため、より確実にろう材のはい上がりを抑制することができる。 In the second embodiment, in the metal member 30, the end surface 33 is located on the first curved surface 38, which is concave inside the metal member 30, and on the second surface 32 side of the first curved surface 38, and the metal member 30. It is preferable to have a concave second curved surface 39 and a ridge line 40 sandwiched between the first curved surface 38 and the second curved surface 39 on the inner side. In the metal member 30 according to the second embodiment, since the end surface 33 has two recesses 37 and a ridge line 40, the route for the brazing material to reach the second surface 32 of the metal member 30 is three times. Since it has the above inversion, is more complicated, and becomes longer, it is possible to more reliably suppress the rising of the brazing material.
 第二の実施形態において、金属部材30は、凸部36は、端面33と第一の面31との境界34、及び、端面33と第二の面32との境界35のいずれか一方よりも金属部材30の外側に位置することが好ましい。
 また、第二の実施形態において、金属部材30における稜線40が、第一の面31及び第二の面32の外周端部よりも前記金属部材の外縁に位置することが好ましい。
 上記形状とすることにより、ろう材が金属部材30の第二の面32に到達するまでの経路は、より複雑、かつ、長くなるため、より確実にろう材のはい上がりを抑制することができる。
In the second embodiment, in the metal member 30, the convex portion 36 is more than one of the boundary 34 between the end surface 33 and the first surface 31 and the boundary 35 between the end surface 33 and the second surface 32. It is preferably located on the outside of the metal member 30.
Further, in the second embodiment, it is preferable that the ridge line 40 of the metal member 30 is located at the outer edge of the metal member rather than the outer peripheral ends of the first surface 31 and the second surface 32.
With the above shape, the path for the brazing material to reach the second surface 32 of the metal member 30 is more complicated and longer, so that the brazing material can be more reliably suppressed from rising. ..
 端面33と第一の面31との境界34と、凸部36の頂点との水平間距離を適正に設定することで、耐電圧低下のリスクを抑制しつつ、かつ、確実にろう材のはい上がりを抑制することができる。 By appropriately setting the horizontal distance between the boundary 34 between the end surface 33 and the first surface 31 and the apex of the convex portion 36, the risk of withstand voltage reduction can be suppressed and the brazing material can be reliably inserted. The rise can be suppressed.
 なお、ろう材のはい上がり性には、金属部材30の形状に加え、ろう材の塗布量、接合時にセラミックス基板10と金属部材30との積層体にかかる圧力等も影響するため、例えば、ろう材の塗布量が多い場合、又は、積層体にかかる圧力が大きい場合、端面33と第一の面31との境界34と凸部36の頂点との水平間距離を大きくする等、ろう材のはい上がりを促進する因子と抑制する因子のバランスを考慮して金属部材30の形状を調整することが好ましい。 In addition to the shape of the metal member 30, the liftability of the brazing material is also affected by the amount of the brazing material applied, the pressure applied to the laminate of the ceramic substrate 10 and the metal member 30 at the time of joining, and the like. When the amount of the material applied is large, or when the pressure applied to the laminate is large, the horizontal distance between the boundary 34 between the end surface 33 and the first surface 31 and the apex of the convex portion 36 is increased, and so on. It is preferable to adjust the shape of the metal member 30 in consideration of the balance between the factors that promote the rise and the factors that suppress the rise.
(第三の実施形態)
 以下、図5及び図6を参照し、第三の実施形態について詳述する。図5は第三の実施形態のセラミックス回路基板102の構成を模式的に示す断面図である。図6は第三の実施形態の金属部材30として銅板を用いたときの断面写真の例を示す。以下では、第一及び第二の実施形態と異なる構成である金属部材30の端面33の形状に着目して説明する。
(Third embodiment)
Hereinafter, the third embodiment will be described in detail with reference to FIGS. 5 and 6. FIG. 5 is a cross-sectional view schematically showing the configuration of the ceramic circuit board 102 of the third embodiment. FIG. 6 shows an example of a cross-sectional photograph when a copper plate is used as the metal member 30 of the third embodiment. Hereinafter, the shape of the end face 33 of the metal member 30, which is different from the first and second embodiments, will be described.
 第三の実施形態の金属部材30では、端面33が、金属部材30の内側に凹の第一曲面38と、第一曲面38よりも第二の面32側に位置し、金属部材30の内側に凹の第二曲面39、及び、第一曲面38と第二曲面39に挟まれたて外側に曲面凸形状45の凸部36とを有する。 In the metal member 30 of the third embodiment, the end surface 33 is located on the first curved surface 38 recessed inside the metal member 30 and on the second surface 32 side of the first curved surface 38, and is inside the metal member 30. It has a concave second curved surface 39, and a convex portion 36 having a curved convex shape 45 on the outer side sandwiched between the first curved surface 38 and the second curved surface 39.
 第一曲面38と凸部36は、変曲点43で連続している。第二曲面39と凸部36は、変曲点44で連続している。 The first curved surface 38 and the convex portion 36 are continuous at the inflection point 43. The second curved surface 39 and the convex portion 36 are continuous at the inflection point 44.
 このような構成において、第三の実施形態に係る金属部材30は、端面33が、2つの凹部37(第一曲面38、第二曲面39)と凸部36を有することにより、ろう材が金属部材30の第二の面32に到達するまでの経路が、3回以上の反転を有し、より複雑、かつ、長くなるため、より確実にろう材のはい上がりを抑制することができる。 In such a configuration, the metal member 30 according to the third embodiment has a metal brazing material because the end face 33 has two concave portions 37 (first curved surface 38 and second curved surface 39) and a convex portion 36. Since the path to reach the second surface 32 of the member 30 has three or more inversions, is more complicated, and becomes longer, it is possible to more reliably suppress the rise of the brazing material.
 以上の、第一の実施形態から第三の実施形態に係る特定の端部形状を有する金属部材30の作製方法としては、エッチングにより、所定のマスキングをされた板状の金属素材を個片化する方法が挙げられ、具体的には以下に示す通りである。
 まず、金属素材の表面に、公知の手法によりマスキングを施す。ここで、マスキングは、公知の手法で両面の位置合わせを行うことにより、金属素材の両面に同一のパターンが施されることが好ましい。
 次に、マスキングされた金属素材をエッチングにより個片化する。エッチング液は、公知のエッチング液を使用することができ、例えば金属素材が銅板である場合、具体例は、塩化第二鉄、塩化第二銅、硫酸、過酸化水素水等が挙げられる。両面に同一のマスキングを有する板状の金属素材をエッチングすることにより、両面からマスキングパターン間がエッチングされ、本実施形態に係る特定の端部形状を有する金属部材30を得ることができる。
 金属部材30の形状は、エッチング条件等によって調整することができる。例えば、エッチング液の濃度や、エッチング時間を調整することにより、金属部材30におけるθ、θ、凸部36の突出量を調整することが可能である。
 引き続き、マスキングを除去することにより、金属部材30が得られる。
As a method for producing the metal member 30 having a specific end shape according to the first to third embodiments as described above, a plate-shaped metal material having a predetermined masking is individually separated by etching. The method for etching is as shown below.
First, the surface of the metal material is masked by a known method. Here, in masking, it is preferable that the same pattern is applied to both sides of the metal material by aligning both sides by a known method.
Next, the masked metal material is separated by etching. A known etching solution can be used as the etching solution. For example, when the metal material is a copper plate, specific examples thereof include ferric chloride, cupric chloride, sulfuric acid, and hydrogen peroxide solution. By etching a plate-shaped metal material having the same masking on both sides, the masking patterns are etched from both sides, and the metal member 30 having a specific end shape according to the present embodiment can be obtained.
The shape of the metal member 30 can be adjusted by etching conditions and the like. For example, by adjusting the concentration of the etching solution and the etching time, it is possible to adjust the amount of protrusion of θ A , θ B, and the convex portion 36 of the metal member 30.
Subsequently, by removing the masking, the metal member 30 is obtained.
 本実施形態に係る金属部材30に使用する金属は、銅、アルミニウム、鉄、ニッケル、クロム、銀、モリブテン、コバルトの単体またはその合金等が挙げられる。後述のように、金属部材30を、活性金属を含有するろう材でセラミックス基板10に接合する観点や、導電性、放熱性の観点から銅が好ましい。 Examples of the metal used for the metal member 30 according to the present embodiment include copper, aluminum, iron, nickel, chromium, silver, molybdenum, cobalt alone or an alloy thereof. As will be described later, copper is preferable from the viewpoint of joining the metal member 30 to the ceramic substrate 10 with a brazing material containing an active metal, and from the viewpoint of conductivity and heat dissipation.
 銅板を使用する場合、その純度は、90%以上であることが好ましい。純度を90%以上とすることにより、十分な導電性、放熱性を有するセラミックス回路基板となり、またセラミックス基板と銅板とを接合する際、銅板とろう材の反応が十分進行し、信頼性の高いセラミックス回路基板を得ることができる。 When using a copper plate, its purity is preferably 90% or more. By setting the purity to 90% or more, a ceramic circuit board having sufficient conductivity and heat dissipation can be obtained, and when the ceramic substrate and the copper plate are joined, the reaction between the copper plate and the brazing material proceeds sufficiently, and the reliability is high. A ceramic circuit board can be obtained.
 本実施形態に係る金属部材30の厚みは特に限定されないが、0.1mm以上1.5mm以下のものが一般的である。金属部材30の厚みは、特に、放熱性の観点から0.2mm以上が好ましく、耐熱サイクル特性の観点から0.5mm以下が好ましい。 The thickness of the metal member 30 according to the present embodiment is not particularly limited, but is generally 0.1 mm or more and 1.5 mm or less. The thickness of the metal member 30 is particularly preferably 0.2 mm or more from the viewpoint of heat dissipation, and preferably 0.5 mm or less from the viewpoint of heat resistance cycle characteristics.
<セラミックス基板>
 本実施形態に係るセラミックス回路基板に使用されるセラミックス基板10としては、特に限定されるものではなく、窒化ケイ素、窒化アルミニウムなどの窒化物系セラミックス、酸化アルミニウム、酸化ジルコニウムなどの酸化物系セラミックス、炭化ケイ素等の炭化物系セラミックス、ほう化ランタン等のほう化物系セラミックス等が挙げられる。後述のように、金属部材30を、活性金属を含有する銀-銅系ろう材でセラミックス基板10に接合する観点からは、窒化アルミニウム、窒化ケイ素等の非酸化物系セラミックスが好適であり、更に、優れた熱伝導性の観点からは窒化アルミニウム基板が好ましい。
<Ceramics substrate>
The ceramic substrate 10 used in the ceramic circuit substrate according to the present embodiment is not particularly limited, and is not particularly limited. Examples thereof include carbide-based ceramics such as silicon carbide and boron-based ceramics such as lanthanum boring. As will be described later, non-oxide ceramics such as aluminum nitride and silicon nitride are preferable from the viewpoint of joining the metal member 30 to the ceramic substrate 10 with a silver-copper brazing material containing an active metal. From the viewpoint of excellent thermal conductivity, an aluminum nitride substrate is preferable.
 本実施形態に係るセラミックス基板10の厚みは特に限定されないが、0.2mm以上、1.5mm以下が好ましい。上記数値範囲内とすることにより、十分に強度・耐久性を維持することができ、かつ、熱抵抗を抑制することができる。 The thickness of the ceramic substrate 10 according to the present embodiment is not particularly limited, but is preferably 0.2 mm or more and 1.5 mm or less. By setting the value within the above numerical range, sufficient strength and durability can be maintained and thermal resistance can be suppressed.
<ろう材>
 本実施形態に係るセラミックス回路基板において、ろう材20は、ろう材中にチタン、ジルコニウム、ハフニウム、ニオブ、タンタル、バナジウム、アルミニウム、錫から選択される少なくとも一種の活性金属を含有する銀-銅系ろう材で構成されることが好ましい。ろう材の配合におけるAg/Cu比は、AgとCuの共晶組成である72質量%:28質量%よりAg粉末の配合比を高めることで、Cuリッチ相の粗大化を防止し、Agリッチ相が連続したろう材層組織を形成することができる。
 また、Ag粉末の配合量が多くCu粉末の配合量が少ないと、接合時にAg粉末が溶解しきれずに接合ボイドとして残る場合がある。よって、Ag粉末と、Cu粉末、Sn粉末またはIn粉末の配合比は、Ag粉末:85.0質量部以上95.0質量部以下、Cu粉末:5.0質量部以上13.0質量部以下、Sn粉末またはIn粉末:0.4質量部以上3.5質量部以下からなるものが好ましく挙げられる。上記数値範囲内とすることで、ろう材の融解温度が過度に上昇することを防ぎ、適度な温度での接合が可能となり、接合時の熱膨張率差に由来する熱ストレスを低下させることができ、耐熱サイクル性を向上することができる。
<Blazed material>
In the ceramics circuit substrate according to the present embodiment, the brazing material 20 is a silver-copper system containing at least one active metal selected from titanium, zirconium, hafnium, niobium, tantalum, vanadium, aluminum, and tin in the brazing material. It is preferably composed of brazing material. The Ag / Cu ratio in the brazing filler metal is increased from 72% by mass: 28% by mass, which is the eutectic composition of Ag and Cu, to prevent coarsening of the Cu-rich phase and to be Ag-rich. It is possible to form a brazing layer structure in which the phases are continuous.
Further, if the amount of Ag powder compounded is large and the amount of Cu powder compounded is small, the Ag powder may not be completely dissolved at the time of bonding and may remain as a bonding void. Therefore, the blending ratio of Ag powder and Cu powder, Sn powder or In powder is Ag powder: 85.0 parts by mass or more and 95.0 parts by mass or less, Cu powder: 5.0 parts by mass or more and 13.0 parts by mass or less. , Sn powder or In powder: preferably composed of 0.4 parts by mass or more and 3.5 parts by mass or less. By keeping the value within the above numerical range, it is possible to prevent the melting temperature of the brazing material from rising excessively, to enable joining at an appropriate temperature, and to reduce the thermal stress caused by the difference in the coefficient of thermal expansion during joining. It is possible to improve the heat resistance cycle property.
 チタン等の活性金属の添加量は、Ag粉末と、Cu粉末と、Sn粉末またはIn粉末の合計100質量部に対して、1.5質量部以上5.0質量部以下が好ましい。活性金属の添加量を適切に調整することで、セラミックス板に対する濡れ性を一層高めることができ、接合不良の発生を一層抑えることができる。また、未反応の活性金属の残存が抑えられ、Agリッチ相の不連続化なども抑えることができる。 The amount of the active metal such as titanium added is preferably 1.5 parts by mass or more and 5.0 parts by mass or less with respect to 100 parts by mass in total of Ag powder, Cu powder, Sn powder or In powder. By appropriately adjusting the amount of the active metal added, the wettability to the ceramic plate can be further enhanced, and the occurrence of bonding defects can be further suppressed. In addition, the residual unreacted active metal can be suppressed, and discontinuity of the Ag-rich phase can be suppressed.
<セラミックス回路基板の製造方法>
 以下に本実施形態に係るセラミックス回路基板の製造方法について説明する。
 まず、セラミックス基板10、及び、金属部材30を準備する。セラミックス基板10、及び、金属部材30の態様については前述のとおりである。
 次にろう材ペーストを調製する。ろう材の金属成分の配合は上述の通りであり、Ag粉末:85.0質量部以上95.0質量部以下、Cu粉末:5.0質量部以上13.0質量部以下、Sn粉末またはIn粉末:0.4質量部以上3.5質量部以下からなるものが好ましく挙げられる。チタン等の活性金属の添加量は、Ag粉末と、Cu粉末と、Sn粉末またはIn粉末の合計100質量部に対して、1.5質量部以上5.0質量部以下が好ましい。
 これらの金属粉末と、樹脂、溶剤、必要に応じて分散剤等を公知の手法で混合することにより、ろう材ペーストを得ることができる。
 続いて、セラミックス基板10の片面又は両面に、ろう材ペーストを塗布する。塗布方法は特に限定されず、例えばスクリーン印刷により塗布を行うことができる。塗布されたろう材ペーストの乾燥膜厚は、例えば1μm以上50μm以下とすることが好ましい。
<Manufacturing method of ceramic circuit board>
The method for manufacturing the ceramic circuit board according to the present embodiment will be described below.
First, the ceramic substrate 10 and the metal member 30 are prepared. The aspects of the ceramic substrate 10 and the metal member 30 are as described above.
Next, a brazing paste is prepared. The composition of the metal component of the brazing filler metal is as described above. Ag powder: 85.0 parts by mass or more and 95.0 parts by mass or less, Cu powder: 5.0 parts by mass or more and 13.0 parts by mass or less, Sn powder or In Powder: A powder consisting of 0.4 parts by mass or more and 3.5 parts by mass or less is preferable. The amount of the active metal such as titanium added is preferably 1.5 parts by mass or more and 5.0 parts by mass or less with respect to 100 parts by mass in total of Ag powder, Cu powder, Sn powder or In powder.
A brazing paste can be obtained by mixing these metal powders with a resin, a solvent, and if necessary, a dispersant or the like by a known method.
Subsequently, the brazing material paste is applied to one side or both sides of the ceramic substrate 10. The coating method is not particularly limited, and coating can be performed by, for example, screen printing. The dry film thickness of the applied brazing paste is preferably, for example, 1 μm or more and 50 μm or less.
 次に、セラミックス基板10に塗布されたろう材ペーストに接するように金属部材30を重ね、加熱炉内で加熱し、セラミックス基板10と金属部材30とを接合する。
 本実施形態において、セラミックス基板10と金属部材30とを接合する接合温度は、780℃以上850℃以下であることが好ましく、より好ましくは800℃未満である。また、接合時の真空度は、1×10-3Pa以下とすることが好ましい。また、上記接合温度での保持時間は10分以上60分以下であることが望ましい。
 接合温度・真空度・接合時間を上記範囲内とすることにより、活性金属を含む化合物が十分に生成され、セラミックス基板10と金属部材30とを全面にわたって接合することができる。また、接合温度が高温であったり、保持時間が長すぎたりする場合には、接合後のろう材層の厚みムラが大きくなり、超音波接合によるクラックが発生する場合があるが、接合温度・真空度・接合時間を上記範囲内とすることにより、接合後のろう材の厚みムラを低減することができる。
 以上のようにして、本実施形態に係るセラミックス回路基板を得ることができる。
Next, the metal member 30 is stacked so as to be in contact with the brazing paste applied to the ceramic substrate 10 and heated in a heating furnace to join the ceramic substrate 10 and the metal member 30.
In the present embodiment, the joining temperature for joining the ceramic substrate 10 and the metal member 30 is preferably 780 ° C. or higher and 850 ° C. or lower, and more preferably lower than 800 ° C. The degree of vacuum at the time of joining is preferably 1 × 10 -3 Pa or less. Further, it is desirable that the holding time at the joining temperature is 10 minutes or more and 60 minutes or less.
By setting the joining temperature, the degree of vacuum, and the joining time within the above ranges, a compound containing an active metal is sufficiently generated, and the ceramic substrate 10 and the metal member 30 can be joined over the entire surface. In addition, if the bonding temperature is high or the holding time is too long, the thickness unevenness of the brazing material layer after bonding may increase, and cracks may occur due to ultrasonic bonding. By setting the degree of vacuum and the bonding time within the above ranges, it is possible to reduce uneven thickness of the brazing material after bonding.
As described above, the ceramic circuit board according to the present embodiment can be obtained.
 本実施形態に係るセラミックス回路基板は、電子デバイスに用いることができ、エッチングによる回路パターン形成工程を経ることもできる。本実施形態に係るセラミックス回路基板に回路パターンを形成する場合、金属部材30にエッチングレジストを塗布してエッチングすることができる。エッチングレジストに関して特に制限はなく、公知の紫外線硬化型や熱硬化型のものが使用できる。また、エッチングレジストの塗布方法に関しては特に制限はなく、例えばスクリーン印刷法等の公知の塗布方法を採用することができる。
 エッチング液に関しても特に制限はなく、公知のエッチング液を用いることができ、金属部材30が銅板である場合、塩化第二鉄溶液や塩化第二銅溶液、硫酸、過酸化水素水等を使用することができ、塩化第二鉄溶液や塩化第二銅溶液が好ましい。
The ceramic circuit board according to this embodiment can be used for an electronic device, and can also undergo a circuit pattern forming step by etching. When forming a circuit pattern on the ceramic circuit board according to the present embodiment, the metal member 30 can be etched by applying an etching resist. There are no particular restrictions on the etching resist, and known ultraviolet curable types and thermosetting types can be used. Further, the method for applying the etching resist is not particularly limited, and a known application method such as a screen printing method can be adopted.
The etching solution is not particularly limited, and a known etching solution can be used. When the metal member 30 is a copper plate, a ferric chloride solution, a cupric chloride solution, sulfuric acid, a hydrogen peroxide solution, or the like is used. A ferric chloride solution or a cupric chloride solution is preferable.
 エッチングによって不要な金属部分を除去したセラミックス回路基板には、ろう材、その合金層、窒化物層等が残っている場合があり、その場合、ハロゲン化アンモニウム水溶液、硫酸、硝酸等の無機酸、過酸化水素水を含む溶液を用いて、それらを除去するのが一般的である。回路形成後、公知の方法でエッチングレジストの剥離を行うことができる。剥離方法は特に限定されず、例えば、アルカリ水溶液に浸漬させる方法などを挙げることができる。 A brazing material, its alloy layer, a nitride layer, etc. may remain on the ceramic circuit board from which unnecessary metal parts have been removed by etching. In that case, an aqueous solution of ammonium halide, an inorganic acid such as sulfuric acid or nitric acid, It is common to remove them with a solution containing aqueous hydrogen peroxide. After forming the circuit, the etching resist can be peeled off by a known method. The peeling method is not particularly limited, and examples thereof include a method of immersing in an alkaline aqueous solution.
 本実施形態に係るセラミックス回路基板100、101及び102は、例えば、金属部材30の第二の面32に半導体チップ等を搭載し、電子デバイスとすることができる。
 本実施形態に係るセラミックス回路基板100、101及び102は、例えば、電鉄、車両、産業機械向けといった高電圧、大電流動作を必要とするパワーデバイスに特に好適に適用することができる。
 なお、本発明は前述の実施形態に限定されるものではなく、本発明の目的を達成できる範囲での変形、改良等は本発明に含まれるものである。
The ceramic circuit boards 100, 101, and 102 according to the present embodiment can be made into an electronic device, for example, by mounting a semiconductor chip or the like on the second surface 32 of the metal member 30.
The ceramic circuit boards 100, 101 and 102 according to the present embodiment can be particularly preferably applied to power devices that require high voltage and large current operation, such as those for electric railways, vehicles, and industrial machines.
The present invention is not limited to the above-described embodiment, and modifications, improvements, and the like within the range in which the object of the present invention can be achieved are included in the present invention.
 以下、本願発明の形態の例を纏めて付記する。これら形態は本願発明に含まれる。
1. セラミックス基板の少なくとも一面にろう材を介して板状の金属部材を接合してなるセラミックス回路基板において、
 前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
 前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有し、
 前記金属部材は多角形であって、その対角線に沿った厚み方向のいずれかの切断面において、
 前記端面の下端と前記第一の面とが成す角をθとしたとき、
 下記式(1)を満たす、セラミックス回路基板。
 式(1) 0°<θ<90°
2. 前記金属部材が矩形である、1.に記載のセラミックス回路基板。
3. 前記端面の上端と前記第二の面とが成す角をθとしたとき、
 下記式(2)を満たす、1.又は2.に記載のセラミックス回路基板。
 式(2) 0°<θ<90°
4. 前記凸部は前記端面の周全体にわたって周回するように設けられている、1.または2.に記載のセラミックス回路基板。
5. セラミックス基板の少なくとも一面にろう材を介して板状の金属部材を接合してなるセラミックス回路基板において、
 前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
 当該端面は、当該端面と前記第二の面との境界よりも金属部材の内側に位置する凹部を有し、
 前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有するセラミックス回路基板。
6. 前記端面が、
 金属部材の内側に凹の第一曲面、
 当該第一曲面よりも前記第二の面側に位置し金属部材の内側に凹の第二曲面、及び、
 当該第一曲面と当該第二曲面に挟まれた稜線を有する、5.に記載のセラミックス回路基板。
7. 前記端面は、前記端面と前記第一の面との境界、及び、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有する、1.~6.のいずれか一つに記載のセラミックス回路基板。
8. 前記稜線が、前記第一の面及び前記第二の面の外周端部よりも前記金属部材の外縁に位置する、6.に記載のセラミックス回路基板。
9. 前記金属部材が銅板である、1.~8.のいずれか一つに記載のセラミックス回路基板。
10. 前記ろう材が、チタン、ジルコニウム、ハフニウム、ニオブ、タンタル、バナジウム、アルミニウム、及び、錫から選択される少なくとも1つの金属を含む、1.~9.のいずれか一つに記載のセラミックス回路基板。
11. 前記セラミックス基板が窒化ケイ素及び窒化アルミニウムから選択される少なくとも1つである、1.~10.のいずれか一つに記載のセラミックス回路基板。
12. 1.~11.のいずれか一つに記載のセラミックス回路基板であって、前記セラミックス基板の両面にろう材を介し板状の金属部材を接合した、セラミックス回路基板。
13. 1.~12.のいずれか一つに記載のセラミックス回路基板を備える電子デバイス。
14. 13.に記載の電子デバイスであって、パワーデバイスである電子デバイス。
15. セラミックス基板の一面にろう材で接合される板状の金属部材であって、
 前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
 前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有し、
 前記金属部材は多角形であって、その対角線に沿った厚み方向のいずれかの切断面において、
 前記端面の下端と前記第一の面とが成す角をθとしたとき、
 下記式(1)を満たす、金属部材。
式(1) 0°<θ<90°
16. 前記凸部は前記端面の周全体にわたって周回するように設けられている、15.に記載の金属部材。
Hereinafter, examples of the embodiments of the present invention will be added together. These forms are included in the present invention.
1. 1. In a ceramic circuit board in which a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
The metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
When the angle formed by the lower end of the end surface and the first surface is θ A ,
A ceramic circuit board that satisfies the following formula (1).
Equation (1) 0 ° <θ A <90 °
2. 1. The metal member is rectangular. The ceramic circuit board described in.
3. 3. When the angle formed by the upper end of the end face and the second face is θ B ,
1. Satisfy the following equation (2). Or 2. The ceramic circuit board described in.
Equation (2) 0 ° <θ B <90 °
4. The convex portion is provided so as to orbit the entire circumference of the end face. Or 2. The ceramic circuit board described in.
5. In a ceramic circuit board in which a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
The end face has a recess located inside the metal member with respect to the boundary between the end face and the second face.
The end face is a ceramic circuit board having a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
6. The end face
First curved surface concave inside the metal member,
The second curved surface, which is located on the second surface side of the first curved surface and is concave inside the metal member, and
It has a ridgeline sandwiched between the first curved surface and the second curved surface. The ceramic circuit board described in.
7. The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface and the boundary between the end face and the second surface. ~ 6. The ceramic circuit board according to any one of the above.
8. 6. The ridgeline is located at the outer edge of the metal member rather than the outer peripheral ends of the first surface and the second surface. The ceramic circuit board described in.
9. 1. The metal member is a copper plate. ~ 8. The ceramic circuit board according to any one of the above.
10. 1. The brazing material comprises at least one metal selected from titanium, zirconium, hafnium, niobium, tantalum, vanadium, aluminum, and tin. ~ 9. The ceramic circuit board according to any one of the above.
11. 1. The ceramic substrate is at least one selected from silicon nitride and aluminum nitride. ~ 10. The ceramic circuit board according to any one of the above.
12. 1. 1. ~ 11. The ceramic circuit board according to any one of the above, wherein a plate-shaped metal member is bonded to both sides of the ceramic substrate via a brazing material.
13. 1. 1. ~ 12. An electronic device including the ceramic circuit board according to any one of the above.
14. 13. An electronic device according to the above, which is a power device.
15. A plate-shaped metal member that is joined to one surface of a ceramic substrate with a brazing material.
The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
The metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
When the angle formed by the lower end of the end surface and the first surface is θ A ,
A metal member satisfying the following formula (1).
Equation (1) 0 ° <θ A <90 °
16. The convex portion is provided so as to orbit the entire circumference of the end face. The metal member described in.
 以下、本発明について実施例を参照して詳細に説明するが、本発明は、これらの実施例の記載に何ら限定されるものではない。表1に実施例1~3及び比較例1~2の評価結果を示す。表中の評価において、「◎」は「はい上がり無し」、「○」は「はい上がり僅か」、「×」は「はい上がりが明確」を示す。また、表中の項目「凸部」の有り/無しは、端面33において、端面33と第一の面31との境界34、又は、端面33と第二の面32との境界35よりも金属部材30の外側に位置する凸部36を有している場合を「有」、凸部36があっても上記境界34、35より外側に突出しない場合を「無し」と表記している。 Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited to the description of these Examples. Table 1 shows the evaluation results of Examples 1 to 3 and Comparative Examples 1 and 2. In the evaluation in the table, "◎" indicates "no rise", "○" indicates "slight rise", and "x" indicates "clear rise". Further, the presence / absence of the item "convex portion" in the table is more metal than the boundary 34 between the end surface 33 and the first surface 31 or the boundary 35 between the end surface 33 and the second surface 32 on the end surface 33. The case where the convex portion 36 located outside the member 30 is provided is described as "yes", and the case where the convex portion 36 does not protrude outward from the boundaries 34 and 35 is described as "absent".
[実施例1]
 窒化ケイ素基板(50mm×50mm、厚み0.32mm)、及び、銅板1(50mm×50mm、厚み0.8mm)を準備した。
 なお、銅板1は、両面に同一のマスキングパターンを施し、塩化第二鉄水溶液に浸漬することにより、銅板の両側からエッチングし、個片化した。銅板1をその対角線に沿ってコンターマシンで切断し断面を露出させ、金属顕微鏡で断面観察を行った。断面形写真から、銅板1における端面33の下端と第一の面31とが成す角θを測定したところ、θは表1に示す通りであった。また、銅板1における端面33の上端と前記第二の面32とが成す角θとを測定したところ、表1に示す通りであった。
[Example 1]
A silicon nitride substrate (50 mm × 50 mm, thickness 0.32 mm) and a copper plate 1 (50 mm × 50 mm, thickness 0.8 mm) were prepared.
The copper plate 1 was subjected to the same masking pattern on both sides and immersed in an aqueous ferric chloride solution to etch from both sides of the copper plate and to be individualized. The copper plate 1 was cut along the diagonal line with a contour machine to expose the cross section, and the cross section was observed with a metallurgical microscope. When the angle θ A formed by the lower end of the end surface 33 and the first surface 31 of the copper plate 1 was measured from the cross-sectional photograph, θ A was as shown in Table 1. Further, when the angle θ B formed by the upper end of the end surface 33 of the copper plate 1 and the second surface 32 was measured, it was as shown in Table 1.
 ろう材ペースト(Ag-Cu-Ti系ろう材)を調製した。
(ろう材)
 上記のろう材ペーストをスクリーン印刷で、窒化ケイ素基板に印刷し、乾燥した。なお、ろう材ペーストは、乾燥後の厚さが20μmとなるよう塗布した。
 その後、ろう材の上に、銅板1を重ね、真空雰囲気下で銅板と窒化ケイ素基板の接合し、セラミックス回路基板を製造した。
A brazing paste (Ag-Cu-Ti brazing material) was prepared.
(Blazed material)
The above brazing paste was printed on a silicon nitride substrate by screen printing and dried. The brazing paste was applied so that the thickness after drying was 20 μm.
Then, the copper plate 1 was superposed on the brazing material, and the copper plate and the silicon nitride substrate were joined in a vacuum atmosphere to manufacture a ceramic circuit board.
 得られたセラミックス回路基板の外観を観察したところ、銅板1の第二の面32上にはろう材のはい上がりが確認されなかった。 When the appearance of the obtained ceramic circuit board was observed, it was not confirmed that the brazing material had risen on the second surface 32 of the copper plate 1.
 [実施例2~3、比較例1~2]
 銅板1の両側からエッチングし、塩化第二鉄水溶液への浸漬時間を長くして角度を大きくする、又は浸漬時間を短くして角度を小さくする変更を行った以外は実施例1と同様に実施した。実施例2は実施例1と同様にはい上がりは無く、実施例3ははい上がったものの程度は小さく、比較例1及び2は明確にはい上がりが確認できた。
Figure JPOXMLDOC01-appb-T000001
[Examples 2 to 3, Comparative Examples 1 to 2]
The same procedure as in Example 1 was carried out except that etching was performed from both sides of the copper plate 1 to lengthen the immersion time in the ferric chloride aqueous solution to increase the angle, or to shorten the immersion time to reduce the angle. bottom. As in Example 1, there was no rise in Example 2, the degree of rise in Example 3 was small, and the rise was clearly confirmed in Comparative Examples 1 and 2.
Figure JPOXMLDOC01-appb-T000001
 この出願は、2020年3月30日に出願された日本出願特願2020-059763号を基礎とする優先権を主張し、その開示の全てをここに取り込む。 This application claims priority based on Japanese Application Japanese Patent Application No. 2020-059763 filed on March 30, 2020, and incorporates all of its disclosures herein.
10 セラミックス基板
11 第一の面
12 第二の面
20 ろう材
30 金属部材
31 第一の面
32 第二の面
33 端面
34 境界
35 境界
36 凸部
37 凹部
38 第一曲面
39 第二曲面
40 稜線
43、44 変曲点
100、101、102 セラミックス回路基板
10 Ceramic substrate 11 First surface 12 Second surface 20 Brazing material 30 Metal member 31 First surface 32 Second surface 33 End surface 34 Boundary 35 Boundary 36 Convex 37 Concave 38 First curved surface 39 Second curved surface 40 Ridge line 43, 44 Inflection points 100, 101, 102 Ceramic circuit board

Claims (7)

  1.  セラミックス基板の少なくとも一面にろう材を介して板状の金属部材を接合してなるセラミックス回路基板において、
     前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
     前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有し、
     前記金属部材は多角形であって、その対角線に沿った厚み方向のいずれかの切断面において、
     前記端面の下端と前記第一の面とが成す角をθとしたとき、
     下記式(1)を満たす、セラミックス回路基板。
     式(1) 0°<θ<90°
    In a ceramic circuit board in which a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
    The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
    The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
    The metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
    When the angle formed by the lower end of the end surface and the first surface is θ A ,
    A ceramic circuit board that satisfies the following formula (1).
    Equation (1) 0 ° <θ A <90 °
  2.  前記端面の上端と前記第二の面とが成す角をθとしたとき、
     下記式(2)を満たす、請求項1に記載のセラミックス回路基板。
     式(2) 0°<θ<90°
    When the angle formed by the upper end of the end face and the second face is θ B ,
    The ceramic circuit board according to claim 1, which satisfies the following formula (2).
    Equation (2) 0 ° <θ B <90 °
  3.  セラミックス基板の少なくとも一面にろう材を介して板状の金属部材を接合してなるセラミックス回路基板において、
     前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
     当該端面は、当該端面と前記第二の面との境界よりも金属部材の内側に位置する凹部を有し、
     前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有するセラミックス回路基板。
    In a ceramic circuit board in which a plate-shaped metal member is bonded to at least one surface of a ceramic substrate via a brazing material.
    The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
    The end face has a recess located inside the metal member with respect to the boundary between the end face and the second face.
    The end face is a ceramic circuit board having a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
  4.  前記凸部は前記端面の周全体にわたって周回するように設けられている、請求項1~3までのいずれか一項に記載のセラミックス回路基板。 The ceramic circuit board according to any one of claims 1 to 3, wherein the convex portion is provided so as to orbit the entire circumference of the end face.
  5.  請求項1~4のいずれか一項に記載のセラミックス回路基板を備える電子デバイス。 An electronic device including the ceramic circuit board according to any one of claims 1 to 4.
  6.  セラミックス基板の一面にろう材で接合される板状の金属部材であって、
     前記金属部材はセラミックス基板に対向する第一の面と、当該第一の面とは逆の第二の面と、その両面の外周端の相互間に存する端面とを有し、
     前記端面は、前記端面と前記第一の面との境界、又は、前記端面と前記第二の面との境界よりも前記金属部材の外側に位置する凸部を有し、
     前記金属部材は多角形であって、その対角線に沿った厚み方向のいずれかの切断面において、
     前記端面の下端と前記第一の面とが成す角をθとしたとき、
     下記式(1)を満たす、金属部材。
    式(1) 0°<θ<90°
    A plate-shaped metal member that is joined to one surface of a ceramic substrate with a brazing material.
    The metal member has a first surface facing the ceramic substrate, a second surface opposite to the first surface, and end faces existing between the outer peripheral ends of both sides thereof.
    The end face has a convex portion located outside the metal member from the boundary between the end face and the first surface or the boundary between the end face and the second surface.
    The metal member is polygonal and at any of the cut surfaces in the thickness direction along its diagonal.
    When the angle formed by the lower end of the end surface and the first surface is θ A ,
    A metal member satisfying the following formula (1).
    Equation (1) 0 ° <θ A <90 °
  7.  前記凸部は前記端面の周全体にわたって周回するように設けられている、請求項6に記載の金属部材。 The metal member according to claim 6, wherein the convex portion is provided so as to orbit the entire circumference of the end face.
PCT/JP2021/013260 2020-03-30 2021-03-29 Ceramic circuit board, electronic device, and metal member WO2021200809A1 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010238753A (en) * 2009-03-30 2010-10-21 Kyocera Corp Heat radiating member, and module using the same
WO2019221174A1 (en) * 2018-05-16 2019-11-21 株式会社 東芝 Ceramic copper circuit board and method for producing same

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010238753A (en) * 2009-03-30 2010-10-21 Kyocera Corp Heat radiating member, and module using the same
WO2019221174A1 (en) * 2018-05-16 2019-11-21 株式会社 東芝 Ceramic copper circuit board and method for producing same

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