WO2021184573A1 - X-ray anode target having composite structure - Google Patents

X-ray anode target having composite structure Download PDF

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Publication number
WO2021184573A1
WO2021184573A1 PCT/CN2020/098685 CN2020098685W WO2021184573A1 WO 2021184573 A1 WO2021184573 A1 WO 2021184573A1 CN 2020098685 W CN2020098685 W CN 2020098685W WO 2021184573 A1 WO2021184573 A1 WO 2021184573A1
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anode target
covering layer
ray
length
rays
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PCT/CN2020/098685
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French (fr)
Chinese (zh)
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宗方轲
郭金川
杨君
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深圳大学
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes

Definitions

  • This application relates to X-ray technology, for example, to an X-ray anode target with a composite structure.
  • X-ray grating imaging technology can simultaneously obtain X-ray absorption images, scatter images, and phase contrast images of the target object, and has very important applications in the fields of medicine, life sciences, materials science, and industrial non-destructive detection.
  • An X-ray source with a periodic structure anode can generate X-rays with a periodic structure. This kind of light source plays an important role in X-ray grating imaging systems such as X-ray grating interference imaging and X-ray grating non-interference imaging.
  • a reflective X-ray tube is usually used as the X-ray source of the X-ray imaging system.
  • the anode target with periodic microstructure is the core of the X-ray source.
  • the surface of the anode target is made with periodic microstructure by mechanical precision machining. Under the bombardment of high-energy electrons, the X-rays generated on the surface of the anode target are radiated, and the X-rays generated at the bottom of the groove are absorbed by the anode target and cannot be radiated. Therefore, the radiated X-rays are periodic Array structure.
  • the X-ray light generated by the X-ray source with this structure is distributed in the optical axis direction, that is, the X-ray generated by each line emitter on the anode target surface and the adjacent line emitter has one X-ray in the propagation direction.
  • the optical path difference so that the X-rays emitted by each line emitter in the array X-ray source have different optical path distances to the flat panel detection surface, which is not conducive to the extraction of imaging information by the flat panel detector, and also limits the X-ray imaging system The field of view range.
  • the embodiments of the present application provide an X-ray anode target with a composite structure, so as to realize that a common X-ray source can radiate X-rays with high flux, large field of view, and high-quality microstructures.
  • the embodiment of the present invention provides an X-ray anode target with a composite structure.
  • the X-ray anode target with a composite structure includes an anode target body and a covering layer, wherein the anode target body is an integrally formed cylinder, and the anode
  • the target body includes a top surface, a side surface, and a bottom surface.
  • the top surface includes a plurality of radiating surfaces and a plurality of connecting surfaces.
  • the connecting surface sequentially connects the multiple radiation surfaces;
  • the covering layer includes at least one of the following: the covering layer is arranged on the multiple connecting surfaces and is arranged to absorb high-energy electrons, and the covering layer is arranged on the A plurality of radiation surfaces are arranged to interact with the high-energy electrons to form X-rays.
  • FIG. 1 is a schematic structural diagram of an X-ray anode target with a composite structure provided in Example 1 of the present application;
  • Example 2 is a schematic top view of the X-ray anode target with a composite structure provided in Example 1 of the present application;
  • Example 3 is a schematic structural diagram of an X-ray anode target with a composite structure provided in Example 1 of the present application;
  • Example 4 is a schematic structural diagram of an X-ray anode target with a composite structure provided in Example 1 of the present application.
  • first”, “second”, etc. may be used herein to describe various directions, actions, steps or elements, etc., but these directions, actions, steps or elements are not limited by these terms. These terms are only used to distinguish a first direction, action, step or element from another direction, action, step or element.
  • the first included angle may be referred to as the second included angle
  • the second included angle may be referred to as the first included angle. Both the first included angle and the second included angle are included angles, but not the same included angle.
  • the terms “first”, “second”, etc. cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features.
  • "a plurality of” means at least two, for example, two, three, etc., unless specifically defined otherwise.
  • Embodiment 1 of the present application provides an X-ray anode target 200 with a composite structure.
  • the X-ray anode target 200 includes an anode target body 100 and a cover layer 500.
  • the anode target body 100 is an integrally formed cylinder.
  • the anode target body 100 includes a top surface 110, a side surface 120, and a bottom surface 130.
  • the top surface 110 includes a plurality of radiating surfaces 111 and a plurality of connecting surfaces 112.
  • the plurality of radiating surfaces 111 and the plurality of connecting surfaces are arranged at intervals, and the connecting surfaces 112 arranged between adjacent radiating surfaces connect the plurality of radiating surfaces 111 in sequence;
  • the covering layer 500 includes at least one of the following:
  • the covering layer is disposed on the plurality of connecting surfaces 112 and configured to absorb high-energy electrons 410, and the covering layer 500 is disposed on the plurality of radiation surfaces 111 and configured to interact with the high-energy electrons 410 to form X
  • connection surfaces 112 are arranged on the connection surfaces 112 to absorb high-energy electrons 410, even if the high-energy electrons 410 interacting with the radiation surface 111 radiate to the connection surface 112, the connection surface 112
  • the above material cannot interact with the high-energy electrons 410 to form X-rays, so there is no connection surface 112 that will generate X-rays, thereby affecting the contrast of the radiated microstructure X-rays.
  • an anode target body and a covering layer are arranged in an X-ray anode target of a composite structure, wherein the anode target body includes a top surface, a side surface and a bottom surface, and the top surface includes a plurality of radiation surfaces and a plurality of connecting surfaces,
  • the multiple radiating surfaces are arranged at intervals, the multiple connecting surfaces connect the radiating surfaces in turn end to end, and the covering layer is arranged on the multiple connecting surfaces for absorbing high-energy electrons and/or the covering layer is arranged
  • the multiple radiation surfaces are used to interact with the high-energy electrons to form X-rays, which solves the problems of low light extraction efficiency and low contrast of the X-ray source, which is not conducive to the extraction of imaging information by the flat panel detector. It realizes the effect that the ordinary X-ray source can radiate X-rays with high flux, large field of view and high-quality microstructures.
  • the X-ray anode target 200 can be used in an X-ray source.
  • the X-ray source also includes an electron source 400 for emitting high-energy electrons 410, and the X-ray anode target 200 is used for receiving high-energy electrons 410.
  • the bombardment emits X-rays.
  • FIG. 2 viewed from the incident direction of the high-energy electrons 410 emitted by the electron source 400, the multiple radiation surfaces 111 of the X-ray anode target 200 form a continuous whole.
  • the first included angle ⁇ between the radiation surface 111 and the side surface 120 is between 20 degrees and 70 degrees.
  • the second included angle ⁇ between the connecting surface 112 and the bottom surface 130 is greater than 90 degrees.
  • the anode target body 100 is set at a preset position such that the third included angle ⁇ between the incident direction of the high-energy electrons 410 and the bottom surface 130 is less than or equal to the second included angle ⁇ .
  • the X-rays obtained by the interaction between the high-energy electrons 410 and the X-ray anode target 200 are microstructured X-rays, which may be linear array X-rays with periodic structures, and the X-ray source further includes an X-ray exit window 300 , The linear array X-rays with a periodic structure will be emitted from the X-ray exit window 300.
  • the projection length of each radiation surface 111 along the side surface 120 is the first length S , That is, the length of the X-ray emitted in the X-ray exit window 300 in a period, the projection length of each connecting surface along the side surface is the second length, and the first length S plus the length of each connecting surface 112 along the
  • the second length of the side surface 120 is P, that is, the length of one period, wherein the length of the connecting surface 112 along the side surface 120 is free of X-rays, and the available duty ratio is S/P.
  • At least one of the first length S or the second length can be adjusted when manufacturing the X-ray anode target 200 to adjust the duty ratio and period of the radiated microstructure X-rays.
  • the length of the first length S ranges from 5 to 100 microns.
  • the length range of the second length P is between 10-200 microns.
  • the material of the anode target body 100 when the covering layer 500 is disposed on the plurality of connecting surfaces 112, the material of the anode target body 100 is capable of interacting with the high-energy electrons to form X-rays.
  • the target material 520 and the covering layer 500 is a non-target material 510 that can absorb the high-energy electrons; as shown in FIG. 4, when the covering layer 500 is disposed on the plurality of radiation surfaces 111, the anode target
  • the material of the body 100 is the non-target material 510 and the covering layer 500 is the target material 520.
  • the target material 520 and the non-target material 510 should be made of good high-temperature-resistant conductors, so that the high-energy electrons 410 after interacting with the X-ray anode target 200 can be conducted away in time, and the X-ray anode target 200 is reduced.
  • the risk of burnout increases the service life.
  • the target material 520 can be a metal material with a high atomic number to generate X-rays under the bombardment of high-energy electrons 410
  • the non-target material 510 can be a metal material or a non-metallic material with a low atomic number to absorb the The high-energy electron 410 does not generate X-rays.
  • the target material 520 includes tungsten or molybdenum
  • the non-target material 510 includes graphite, diamond or beryllium.
  • the covering layer 500 is coated on the plurality of radiation surfaces 111 and/or the connection surfaces 112 by using magnetron sputtering and high temperature sintering fusion method.
  • Magnetron sputtering is based on sputtering, using the mutual electromagnetic interaction between the electric field and the magnetic field of the target material itself, and adding a magnetic field near the target, so that the secondary electrons ionize more argon ions. Increase sputtering efficiency.
  • High-temperature sintering and fusion means that at a high temperature not higher than the melting point, there is mutual attraction between molecules or atoms in the solid state. By heating, the particles can obtain enough energy to migrate, so that the powder body can form particle adhesion, generate strength and lead to densification and re-densification. crystallization.
  • any material can be selected for the anode target body 100, and the covering layer 500 is arranged on the plurality of connecting surfaces 112 for absorbing high-energy electrons 410, and the covering layer 500 is arranged on the plurality of connecting surfaces 112.
  • the two radiating surfaces 111 are used to interact with the high-energy electrons 410 to form X-rays.

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  • X-Ray Techniques (AREA)

Abstract

Disclosed in embodiments of the present application is an X-ray anode target having a composite structure. The X-ray anode target having the composite structure comprises an anode target body and a covering layer; the anode target body is an integrally-formed cylinder and comprises a top face, a side face, and a bottom face; the top face comprises a plurality of radiating faces and a plurality of connecting faces; the plurality of radiating faces and the plurality of connecting faces are arranged at intervals, and each connecting face provided between every two adjacent radiating faces connects the plurality of radiating faces sequentially; the covering layer comprises at least one of the following: the covering layer is provided on the plurality of connecting faces and is configured to absorb high-energy electrons; the covering layer is provided on the plurality of radiating faces and is configured to interact with the high-energy electrons to form X-rays.

Description

复合结构的X射线阳极靶X-ray anode target with composite structure
本申请要求在2020年03月18日提交中国专利局、申请号为202010190037.0的中国专利申请的优先权,该申请的全部内容通过引用结合在本申请中。This application claims the priority of a Chinese patent application filed with the Chinese Patent Office with an application number of 202010190037.0 on March 18, 2020, and the entire content of the application is incorporated into this application by reference.
技术领域Technical field
本申请涉及X射线技术,例如涉及一种复合结构的X射线阳极靶。This application relates to X-ray technology, for example, to an X-ray anode target with a composite structure.
背景技术Background technique
X射线光栅成像技术能够同时获取目标物体的X射线吸收图像、散射图像以及相位衬度图像,在医学、生命科学、材料科学及工业无损探测等领域有着非常重要的应用。具有周期性结构阳极的X射线源可以产生周期性结构的X光,这种光源在X射线光栅干涉成像、X射线光栅非干涉成像等X射线光栅成像系统中具有举足轻重的重要作用。X-ray grating imaging technology can simultaneously obtain X-ray absorption images, scatter images, and phase contrast images of the target object, and has very important applications in the fields of medicine, life sciences, materials science, and industrial non-destructive detection. An X-ray source with a periodic structure anode can generate X-rays with a periodic structure. This kind of light source plays an important role in X-ray grating imaging systems such as X-ray grating interference imaging and X-ray grating non-interference imaging.
通常采用反射式X射线管作为X射线成像系统的X射线源,其中具有周期性微结构的阳极靶是X射线源的核心,在阳极靶表面上利用机械精密加工的办法制作具有周期性微结构的沟槽,在高能电子的轰击下,阳极靶表面产生的X射线被辐射出去,而沟槽底部产生的X射线被阳极靶吸收,不能辐射出去,因此辐射出的X射线就具有周期性的阵列结构。A reflective X-ray tube is usually used as the X-ray source of the X-ray imaging system. The anode target with periodic microstructure is the core of the X-ray source. The surface of the anode target is made with periodic microstructure by mechanical precision machining. Under the bombardment of high-energy electrons, the X-rays generated on the surface of the anode target are radiated, and the X-rays generated at the bottom of the groove are absorbed by the anode target and cannot be radiated. Therefore, the radiated X-rays are periodic Array structure.
但是高能电子中只有一部分轰击到阳极靶表面从而辐射出X射线,而其余的很大一部分高能电子轰击到了阳极靶沟槽底部,这部分高能电子没有产生有效的X射线。这就造成了X射线源的出光效率较低,能耗较高,对X射线源的散热不利,不易提高出光功率。此外,由于这种结构的X射线源产生的X射线光在光轴方向上延展分布,即阳极靶表面的每一个线发射体与相邻的线发射体产生的X射线在传播方向上有一个光程差,从而使阵列X射线源中的每个线发射体发出的X射线到平板探测面的光程距离不等,不利于平板探测器对成像信息的提取,也限制了X射线成像系统的视场范围。However, only part of the high-energy electrons bombarded the surface of the anode target to radiate X-rays, while a large part of the remaining high-energy electrons bombarded the bottom of the anode target groove. This part of the high-energy electrons did not generate effective X-rays. This results in the low light extraction efficiency of the X-ray source and high energy consumption, which is unfavorable to the heat dissipation of the X-ray source, and it is not easy to increase the light output power. In addition, because the X-ray light generated by the X-ray source with this structure is distributed in the optical axis direction, that is, the X-ray generated by each line emitter on the anode target surface and the adjacent line emitter has one X-ray in the propagation direction. The optical path difference, so that the X-rays emitted by each line emitter in the array X-ray source have different optical path distances to the flat panel detection surface, which is not conducive to the extraction of imaging information by the flat panel detector, and also limits the X-ray imaging system The field of view range.
发明内容Summary of the invention
本申请实施例提供一种复合结构的X射线阳极靶,以实现普通X射线源能够辐射出具有高通量、大视场和高质量的微结构X射线。The embodiments of the present application provide an X-ray anode target with a composite structure, so as to realize that a common X-ray source can radiate X-rays with high flux, large field of view, and high-quality microstructures.
本发明实施例提供了一种复合结构的X射线阳极靶,该复合结构的X射线阳极靶包括:阳极靶本体和覆盖层,其中,所述阳极靶本体为一体成型的柱体, 所述阳极靶本体包括顶面、侧面和底面,所述顶面包括多个辐射面和多个连接面,所述多个辐射面和所述多个连接面间隔设置,设置于相邻辐射面之间的连接面将所述多个辐射面依次相连;所述覆盖层包括以下至少之一:所述覆盖层设置于所述多个连接面上并设置为吸收高能电子,所述覆盖层设置于所述多个辐射面上并设置为与所述高能电子相互作用以形成X射线。The embodiment of the present invention provides an X-ray anode target with a composite structure. The X-ray anode target with a composite structure includes an anode target body and a covering layer, wherein the anode target body is an integrally formed cylinder, and the anode The target body includes a top surface, a side surface, and a bottom surface. The top surface includes a plurality of radiating surfaces and a plurality of connecting surfaces. The connecting surface sequentially connects the multiple radiation surfaces; the covering layer includes at least one of the following: the covering layer is arranged on the multiple connecting surfaces and is arranged to absorb high-energy electrons, and the covering layer is arranged on the A plurality of radiation surfaces are arranged to interact with the high-energy electrons to form X-rays.
附图说明Description of the drawings
图1是本申请实施例一提供的复合结构的X射线阳极靶的结构示意图;FIG. 1 is a schematic structural diagram of an X-ray anode target with a composite structure provided in Example 1 of the present application;
图2是本申请实施例一提供的复合结构的X射线阳极靶的俯视结构示意图;2 is a schematic top view of the X-ray anode target with a composite structure provided in Example 1 of the present application;
图3是本申请实施例一提供的复合结构的X射线阳极靶的结构示意图;3 is a schematic structural diagram of an X-ray anode target with a composite structure provided in Example 1 of the present application;
图4是本申请实施例一提供的复合结构的X射线阳极靶的结构示意图。4 is a schematic structural diagram of an X-ray anode target with a composite structure provided in Example 1 of the present application.
具体实施方式Detailed ways
下面结合附图和实施例对本申请进行说明。附图中仅示出了与本申请相关的部分而非全部结构。The application will be described below with reference to the drawings and embodiments. The drawings only show a part of the structure related to the present application, but not all of the structure.
此外,术语“第一”、“第二”等可在本文中用于描述多种方向、动作、步骤或元件等,但这些方向、动作、步骤或元件不受这些术语限制。这些术语仅用于将第一个方向、动作、步骤或元件与另一个方向、动作、步骤或元件区分。举例来说,可以将第一夹角称为第二夹角,且类似地,可将第二夹角称为第一夹角。第一夹角和第二夹角两者都是夹角,但不是同一夹角。术语“第一”、“第二”等不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个所述特征。在本申请实施例的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确限定。In addition, the terms "first", "second", etc. may be used herein to describe various directions, actions, steps or elements, etc., but these directions, actions, steps or elements are not limited by these terms. These terms are only used to distinguish a first direction, action, step or element from another direction, action, step or element. For example, the first included angle may be referred to as the second included angle, and similarly, the second included angle may be referred to as the first included angle. Both the first included angle and the second included angle are included angles, but not the same included angle. The terms "first", "second", etc. cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include one or more of the features. In the description of the embodiments of the present application, "a plurality of" means at least two, for example, two, three, etc., unless specifically defined otherwise.
实施例一Example one
如图1所示,本申请实施例一提供了一种复合结构的X射线阳极靶200,该X射线阳极靶200包括阳极靶本体100和覆盖层500。As shown in FIG. 1, Embodiment 1 of the present application provides an X-ray anode target 200 with a composite structure. The X-ray anode target 200 includes an anode target body 100 and a cover layer 500.
所述阳极靶本体100为一体成型的柱体,所述阳极靶本体100包括顶面110、侧面120和底面130,所述顶面110包括多个辐射面111和多个连接面112,所 述多个辐射面111和所述多个连接面间隔设置,设置于相邻辐射面之间的连接面112将所述多个辐射面111依次相连;所述覆盖层500包括以下至少之一:所述覆盖层设置于所述多个连接面112上并设置为吸收高能电子410,所述覆盖层500设置于所述多个辐射面111上并设置为与所述高能电子410相互作用以形成X射线,示例性的,图1中覆盖层500设置于所述多个连接面112上设置为吸收高能电子410,即使与辐射面111作用后的高能电子410辐射至连接面112,因连接面112上的材料无法与高能电子410相互作用形成X射线,所以不存在连接面112会产生X射线,从而影响辐射出的微结构X射线的对比度。The anode target body 100 is an integrally formed cylinder. The anode target body 100 includes a top surface 110, a side surface 120, and a bottom surface 130. The top surface 110 includes a plurality of radiating surfaces 111 and a plurality of connecting surfaces 112. The plurality of radiating surfaces 111 and the plurality of connecting surfaces are arranged at intervals, and the connecting surfaces 112 arranged between adjacent radiating surfaces connect the plurality of radiating surfaces 111 in sequence; the covering layer 500 includes at least one of the following: The covering layer is disposed on the plurality of connecting surfaces 112 and configured to absorb high-energy electrons 410, and the covering layer 500 is disposed on the plurality of radiation surfaces 111 and configured to interact with the high-energy electrons 410 to form X For example, the covering layer 500 in FIG. 1 is arranged on the connection surfaces 112 to absorb high-energy electrons 410, even if the high-energy electrons 410 interacting with the radiation surface 111 radiate to the connection surface 112, the connection surface 112 The above material cannot interact with the high-energy electrons 410 to form X-rays, so there is no connection surface 112 that will generate X-rays, thereby affecting the contrast of the radiated microstructure X-rays.
本发明申请实施例通过在复合结构的X射线阳极靶中设置阳极靶本体和覆盖层,其中阳极靶本体包括顶面、侧面和底面,所述顶面包括多个辐射面和多个连接面,所述多个辐射面间隔设置,所述多个连接面将所述辐射面依次首尾相连,所述覆盖层设置于所述多个连接面上用于吸收高能电子和/或所述覆盖层设置于所述多个辐射面上用于与所述高能电子相互作用以形成X射线,解决了X射线源的出光效率不高、对比度较低,不利于平板探测器对成像信息的提取等问题,实现了普通X射线源能够辐射出具有高通量、大视场和高质量的微结构X射线的效果。In the embodiments of the present invention, an anode target body and a covering layer are arranged in an X-ray anode target of a composite structure, wherein the anode target body includes a top surface, a side surface and a bottom surface, and the top surface includes a plurality of radiation surfaces and a plurality of connecting surfaces, The multiple radiating surfaces are arranged at intervals, the multiple connecting surfaces connect the radiating surfaces in turn end to end, and the covering layer is arranged on the multiple connecting surfaces for absorbing high-energy electrons and/or the covering layer is arranged The multiple radiation surfaces are used to interact with the high-energy electrons to form X-rays, which solves the problems of low light extraction efficiency and low contrast of the X-ray source, which is not conducive to the extraction of imaging information by the flat panel detector. It realizes the effect that the ordinary X-ray source can radiate X-rays with high flux, large field of view and high-quality microstructures.
本实施例中,该X射线阳极靶200可用于X射线源中,X射线源中还包括有用于发射高能电子410的电子源400,而该X射线阳极靶200用于接收该高能电子410的轰击而发射X射线。如图2所示,从电子源400发射的高能电子410的入射方向看,该X射线阳极靶200的多个辐射面111形成了一个连续的整体。In this embodiment, the X-ray anode target 200 can be used in an X-ray source. The X-ray source also includes an electron source 400 for emitting high-energy electrons 410, and the X-ray anode target 200 is used for receiving high-energy electrons 410. The bombardment emits X-rays. As shown in FIG. 2, viewed from the incident direction of the high-energy electrons 410 emitted by the electron source 400, the multiple radiation surfaces 111 of the X-ray anode target 200 form a continuous whole.
可选的,所述辐射面111和所述侧面120的第一夹角α在20度至70度之间。所述连接面112和所述底面130的第二夹角β大于90度。所述阳极靶本体100设置在预设位置,使得所述高能电子410的入射方向和所述底面130的第三夹角θ小于或等于所述第二夹角β。Optionally, the first included angle α between the radiation surface 111 and the side surface 120 is between 20 degrees and 70 degrees. The second included angle β between the connecting surface 112 and the bottom surface 130 is greater than 90 degrees. The anode target body 100 is set at a preset position such that the third included angle θ between the incident direction of the high-energy electrons 410 and the bottom surface 130 is less than or equal to the second included angle β.
在一实施例中,高能电子410与X射线阳极靶200相互作用得到的X射线为微结构X射线,可以为具有周期性结构的线阵列X射线,X射线源中还包括X射线出射窗300,具有周期性结构的线阵列X射线会从X射线出射窗300中射出,从X射线出射窗300可以清晰的看出,每个辐射面111沿所述侧面120的投影长度为第一长度S,即一个周期内X射线射在X射线出射窗300中的长度,每个连接面沿所述侧面的投影长度为第二长度,所述第一长度S加上每个连接面112沿所述侧面120的第二长度为P,即一个周期的长度,其中,所述连接面112沿所述侧面120的长度上没有X射线,可得占空比为S/P。根据不同的需求可以在制作该X射线阳极靶200时调节所述第一长度S或第二长度中的至 少一个就可以调节辐射出的微结构X射线的占空比和周期。可选的,所述第一长度S的长度范围在5-100微米之间。所述第二长度P的长度范围在10-200微米之间。In an embodiment, the X-rays obtained by the interaction between the high-energy electrons 410 and the X-ray anode target 200 are microstructured X-rays, which may be linear array X-rays with periodic structures, and the X-ray source further includes an X-ray exit window 300 , The linear array X-rays with a periodic structure will be emitted from the X-ray exit window 300. It can be clearly seen from the X-ray exit window 300 that the projection length of each radiation surface 111 along the side surface 120 is the first length S , That is, the length of the X-ray emitted in the X-ray exit window 300 in a period, the projection length of each connecting surface along the side surface is the second length, and the first length S plus the length of each connecting surface 112 along the The second length of the side surface 120 is P, that is, the length of one period, wherein the length of the connecting surface 112 along the side surface 120 is free of X-rays, and the available duty ratio is S/P. According to different requirements, at least one of the first length S or the second length can be adjusted when manufacturing the X-ray anode target 200 to adjust the duty ratio and period of the radiated microstructure X-rays. Optionally, the length of the first length S ranges from 5 to 100 microns. The length range of the second length P is between 10-200 microns.
在一实施例中,如图3所示,所述覆盖层500设置于所述多个连接面112上时,所述阳极靶本体100的材料为可与所述高能电子相互作用以形成X射线的靶材料520且所述覆盖层500为可吸收所述高能电子的非靶材料510;如图4所示,所述覆盖层500设置于所述多个辐射面111上时,所述阳极靶本体100的材料为所述非靶材料510且所述覆盖层500为所述靶材料520。In an embodiment, as shown in FIG. 3, when the covering layer 500 is disposed on the plurality of connecting surfaces 112, the material of the anode target body 100 is capable of interacting with the high-energy electrons to form X-rays. The target material 520 and the covering layer 500 is a non-target material 510 that can absorb the high-energy electrons; as shown in FIG. 4, when the covering layer 500 is disposed on the plurality of radiation surfaces 111, the anode target The material of the body 100 is the non-target material 510 and the covering layer 500 is the target material 520.
本实施例中,靶材料520和非靶材料510应当选用耐高温的良好导体,以便能及时将与该X射线阳极靶200相互作用后的高能电子410导走,降低该X射线阳极靶200被烧毁的风险,提高使用寿命。在一实施例中,靶材料520可以选用高原子序数的金属材料,以在高能电子410的轰击下产生X射线,非靶材料510可以选用低原子序数的金属材料或非金属材料,以吸收该高能电子410不产生X射线。可选的,所述靶材料520包括钨或钼,所述非靶材料510包括石墨、金刚石或铍。所述覆盖层500通过使用磁控溅射和高温烧结融合的方法涂覆在所述多个辐射面111和/或连接面112上。磁控溅射(magnetron sputtering)是在溅射的基础上,运用靶板材料自身的电场与磁场的相互电磁交互作用,在靶板附近添加磁场,使得二次电子电离出更多的氩离子,增加溅射效率。高温烧结融合是指在不高于熔点的高温下,固态中分子或原子间存在互相吸引,通过加热使质点获得足够的能量进行迁移,使粉末体产生颗粒黏结,产生强度并导致致密化和再结晶。In this embodiment, the target material 520 and the non-target material 510 should be made of good high-temperature-resistant conductors, so that the high-energy electrons 410 after interacting with the X-ray anode target 200 can be conducted away in time, and the X-ray anode target 200 is reduced. The risk of burnout increases the service life. In one embodiment, the target material 520 can be a metal material with a high atomic number to generate X-rays under the bombardment of high-energy electrons 410, and the non-target material 510 can be a metal material or a non-metallic material with a low atomic number to absorb the The high-energy electron 410 does not generate X-rays. Optionally, the target material 520 includes tungsten or molybdenum, and the non-target material 510 includes graphite, diamond or beryllium. The covering layer 500 is coated on the plurality of radiation surfaces 111 and/or the connection surfaces 112 by using magnetron sputtering and high temperature sintering fusion method. Magnetron sputtering (magnetron sputtering) is based on sputtering, using the mutual electromagnetic interaction between the electric field and the magnetic field of the target material itself, and adding a magnetic field near the target, so that the secondary electrons ionize more argon ions. Increase sputtering efficiency. High-temperature sintering and fusion means that at a high temperature not higher than the melting point, there is mutual attraction between molecules or atoms in the solid state. By heating, the particles can obtain enough energy to migrate, so that the powder body can form particle adhesion, generate strength and lead to densification and re-densification. crystallization.
在一替代实施例中,阳极靶本体100可以选用任意材料,而将覆盖层500设置于所述多个连接面112上用于吸收高能电子410,且将所述覆盖层500设置于所述多个辐射面111上用于与所述高能电子410相互作用以形成X射线。In an alternative embodiment, any material can be selected for the anode target body 100, and the covering layer 500 is arranged on the plurality of connecting surfaces 112 for absorbing high-energy electrons 410, and the covering layer 500 is arranged on the plurality of connecting surfaces 112. The two radiating surfaces 111 are used to interact with the high-energy electrons 410 to form X-rays.

Claims (10)

  1. 一种复合结构的X射线阳极靶,包括:阳极靶本体和覆盖层,其中,An X-ray anode target with a composite structure, comprising: an anode target body and a covering layer, wherein:
    所述阳极靶本体为一体成型的柱体,所述阳极靶本体包括顶面、侧面和底面,所述顶面包括多个辐射面和多个连接面,所述多个辐射面和所述多个连接面间隔设置,设置于相邻辐射面之间的连接面将所述多个辐射面依次相连;The anode target body is an integrally formed cylinder. The anode target body includes a top surface, a side surface and a bottom surface. The top surface includes a plurality of radiation surfaces and a plurality of connecting surfaces. Connecting surfaces are arranged at intervals, and connecting surfaces arranged between adjacent radiating surfaces connect the multiple radiating surfaces in sequence;
    所述覆盖层包括以下至少之一:所述覆盖层设置于所述多个连接面上并设置为吸收高能电子,所述覆盖层设置于所述多个辐射面上并设置为与所述高能电子相互作用以形成X射线。The covering layer includes at least one of the following: the covering layer is arranged on the plurality of connecting surfaces and arranged to absorb high-energy electrons, and the covering layer is arranged on the plurality of radiation surfaces and arranged to be in contact with the high-energy electrons. Electrons interact to form X-rays.
  2. 根据权利要求1所述的X射线阳极靶,其中,The X-ray anode target according to claim 1, wherein:
    在所述覆盖层设置于所述多个连接面上的情况下,所述阳极靶本体的材料为可与所述高能电子相互作用以形成X射线的靶材料且所述覆盖层为可吸收所述高能电子的非靶材料;In the case that the covering layer is provided on the plurality of connecting surfaces, the material of the anode target body is a target material that can interact with the high-energy electrons to form X-rays, and the covering layer is an absorbable material. The non-target materials of high-energy electrons;
    在所述覆盖层设置于所述多个辐射面上的情况下,所述阳极靶本体的材料为所述非靶材料且所述覆盖层为所述靶材料。In the case where the covering layer is provided on the plurality of radiation surfaces, the material of the anode target body is the non-target material and the covering layer is the target material.
  3. 根据权利要求2所述的X射线阳极靶,其中,所述靶材料包括钨或钼,所述非靶材料包括石墨、金刚石或铍。The X-ray anode target according to claim 2, wherein the target material includes tungsten or molybdenum, and the non-target material includes graphite, diamond or beryllium.
  4. 根据权利要求1所述的X射线阳极靶,其中,所述覆盖层通过使用磁控溅射和高温烧结融合的方法涂覆在以下至少之一:所述多个辐射面、所述多个连接面上。The X-ray anode target according to claim 1, wherein the covering layer is coated on at least one of the following by using magnetron sputtering and high-temperature sintering fusion method: the plurality of radiation surfaces, the plurality of connection Surface.
  5. 根据权利要求1所述的X射线阳极靶,其中,所述多个辐射面和所述侧面的第一夹角在20度至70度之间。The X-ray anode target according to claim 1, wherein the first included angle between the plurality of radiation surfaces and the side surface is between 20 degrees and 70 degrees.
  6. 根据权利要求1所述的X射线阳极靶,其中,所述多个连接面和所述底面的第二夹角大于90度。The X-ray anode target according to claim 1, wherein the second included angle between the plurality of connecting surfaces and the bottom surface is greater than 90 degrees.
  7. 根据权利要求6所述的X射线阳极靶,其中,所述阳极靶本体设置在预设位置,使得所述高能电子的入射方向和所述底面的第三夹角小于或等于所述第二夹角。The X-ray anode target according to claim 6, wherein the anode target body is set at a preset position so that the third angle between the incident direction of the high-energy electrons and the bottom surface is less than or equal to the second angle Horn.
  8. 根据权利要求1所述的X射线阳极靶,其中,所述X射线为微结构X射线,每个辐射面沿所述侧面的投影长度为第一长度,每个连接面沿所述侧面的投影长度为第二长度,通过调节所述第一长度或所述第二长度中的至少一个调节所述微结构X射线的占空比和周期。The X-ray anode target according to claim 1, wherein the X-rays are microstructure X-rays, the projection length of each radiating surface along the side surface is the first length, and the projection of each connecting surface along the side surface The length is the second length, and the duty ratio and period of the microstructure X-ray are adjusted by adjusting at least one of the first length or the second length.
  9. 根据权利要求8所述的X射线阳极靶,其中,所述第一长度的长度范围在5微米~100微米之间。8. The X-ray anode target according to claim 8, wherein the length of the first length ranges from 5 microns to 100 microns.
  10. 根据权利要求8所述的X射线阳极靶,其中,所述第二长度的长度范 围在10微米~200微米之间。The X-ray anode target according to claim 8, wherein the length of the second length ranges from 10 microns to 200 microns.
PCT/CN2020/098685 2020-03-18 2020-06-29 X-ray anode target having composite structure WO2021184573A1 (en)

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