WO2021182342A1 - Block copolymer - Google Patents

Block copolymer Download PDF

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Publication number
WO2021182342A1
WO2021182342A1 PCT/JP2021/008782 JP2021008782W WO2021182342A1 WO 2021182342 A1 WO2021182342 A1 WO 2021182342A1 JP 2021008782 W JP2021008782 W JP 2021008782W WO 2021182342 A1 WO2021182342 A1 WO 2021182342A1
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Prior art keywords
block
block copolymer
aromatic polysulfone
polyoxyalkylene
molecular weight
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PCT/JP2021/008782
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French (fr)
Japanese (ja)
Inventor
伊藤 和幸
健典 前川
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住友化学株式会社
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Publication of WO2021182342A1 publication Critical patent/WO2021182342A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/38Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
    • C08G65/40Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/20Polysulfones
    • C08G75/23Polyethersulfones
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G81/00Macromolecular compounds obtained by interreacting polymers in the absence of monomers, e.g. block polymers

Definitions

  • the present invention relates to block copolymers.
  • the present application claims priority based on Japanese Patent Application No. 2020-040190 filed in Japan on March 9, 2020, the contents of which are incorporated herein by reference.
  • Aromatic polysulfone is used for various purposes as a material for molded products because it has excellent heat resistance and chemical resistance. Hydrophilized aromatic polysulfone may be required depending on the application.
  • Patent Document 1 discloses a method for producing a polyaryl ether sulfone-polyalkylene oxide-block copolymer.
  • hydrophilized block copolymer improvement of thermal properties and mechanical properties may be required.
  • the present invention has been made to solve the above-mentioned problems, and is a block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B), which has thermal properties and mechanical properties. It is an object of the present invention to provide a block copolymer having excellent properties.
  • the present inventors have, to solve the above problems, a result of intensive studies, calculated by 1 H-NMR, the number average of the number average molecular weight of the polyoxyalkylene block (B) / the aromatic polysulfone block (A)
  • the present invention has the following aspects.
  • the ratio represented by the number average molecular weight of the polyoxyalkylene block (B) / the number average molecular weight of the aromatic polysulfone block (A) calculated by 1 H-NMR is 0.005 to 0.030.
  • ⁇ 3> The block copolymer according to ⁇ 1> or ⁇ 2>, wherein the block copolymer has a weight average molecular weight of 20,000 to 70,000, which is obtained as an absolute molecular weight by gel permeation chromatography.
  • a linear diblock copolymer having the above two blocks of an alkylene block (B) and the aromatic polysulfone block (A) The block copolymer according to any one of ⁇ 1> to ⁇ 3>, which comprises at least one of.
  • ⁇ 6> The above-described one of ⁇ 1> to ⁇ 5>, wherein the polyoxyalkylene block (B) is composed of a polymer chain having a structural unit represented by the following formula (2-1).
  • Block copolymer. ⁇ 7> The block copolymer according to any one of ⁇ 1> to ⁇ 6>, wherein the glass transition point of the block copolymer is 200 ° C. or higher.
  • ⁇ 8> The block copolymer according to any one of ⁇ 1> to ⁇ 7>, wherein the 1% mass reduction temperature of the block copolymer is 370 ° C. or higher.
  • ⁇ 9> The block according to any one of ⁇ 1> to ⁇ 8>, wherein the tensile strength of the molded product obtained by molding the block copolymer, which is obtained by the following measuring method, is 100 MPa or more. Copolymer. (Measuring method)
  • a JIS K6251 dumbbell-shaped No. 3 test piece having a thickness of 30 ⁇ m was used, and in accordance with JIS K7127, an autograph was used to pull the product at a grip interval of 50 mm and a tensile speed of 5 mm / min at 23 ° C. The tensile strength when the test piece is cut (broken) in an atmosphere of 50% relative humidity is determined.
  • the block copolymer of the embodiment is a block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B), and the number average of the polyoxyalkylene block (B) calculated by 1 H-NMR.
  • the ratio represented by the molecular weight / the number average molecular weight of the aromatic polysulfone block (A) is 0.005 to 0.030.
  • the aromatic polysulfone block (A) has a structural unit containing at least a structure in which a sulfonyl group (-SO 2- ), an arylene group (-Ar-), and an ether bond (-O-) are bonded in this order. Examples thereof include those composed of polymer chains.
  • the aromatic polysulfone block (A) preferably has a structural unit represented by the following general formula (1) from the viewpoint of heat resistance and chemical resistance.
  • R 1 and R 2 independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a halogen atom.
  • n1 and n2 are independently integers of 0 to 4, respectively. When n1 or n2 is 2 or more, plural R 1 and R 2 may be the same or different from each other.
  • Examples of the alkyl group having 1 to 10 carbon atoms in R 1 and R 2 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, and a t-butyl group. Examples thereof include a group, an n-hexyl group, a 2-ethylhexyl group, an n-octyl group, an n-decyl group and the like.
  • Examples of the aryl group having 6 to 20 carbon atoms in R 1 and R 2 include a phenyl group, an o-trill group, an m-trill group, a p-trill group, a 1-naphthyl group, a 2-naphthyl group and the like. Be done.
  • Examples of the halogen atom in R 1 and R 2 include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
  • n1 and n2 are independently integers of 0 to 4, preferably 0 to 2, and more preferably 0 to 1.
  • the structural unit represented by the general formula (1) is contained in an amount of 80 mol% or more and 100 mol% or less with respect to a total amount of 100 mol% of all the structural units constituting the aromatic polysulfone block (A). It may be contained in an amount of 90 mol% or more and 100 mol% or less, or may be contained in a content of 98 mol% or more and 100 mol% or less.
  • polyoxyalkylene block (B) examples include those composed of a polymer chain having an oxyalkylene group as a structural unit.
  • the polyoxyalkylene block (B) preferably has a structural unit represented by the following formula (2).
  • R 3 represents an alkylene group having 2 to 6 carbon atoms.
  • alkylene group having 2 to 6 carbon atoms in R 3 examples include an ethylene group, a trimethylene group, -CH (CH 3 ) CH 2- , tetramethylene group, -CH 2 CH 2 CH (CH 3 )-, and hexamethylene.
  • ethylene group a trimethylene group
  • -CH (CH 3 ) CH 2- a trimethylene group
  • tetramethylene group a trimethylene group
  • -CH 2 CH 2 CH (CH 3 )- hexamethylene.
  • the basis etc. can be mentioned.
  • the polyoxyalkylene block (B) preferably has a structural unit represented by the following formula (2-1).
  • the structural unit represented by the above general formula (2-1) is 80 mol% or more and 100 mol% or less with respect to the total amount of 100 mol% of all the structural units constituting the polyoxyalkylene block (B). It may be contained, may be contained in 90 mol% or more and 100 mol% or less, and may be contained in 98 mol% or more and 100 mol% or less.
  • the block copolymers of the embodiment are a linear triblock copolymer having the above three blocks in the order of polyoxyalkylene block (B), aromatic polysulfone block (A), and polyoxyalkylene block (B), and polyoxy. It may contain at least one of a linear diblock copolymer having the above two blocks of an alkylene block (B) and an aromatic polysulfone block (A).
  • the block copolymers of the embodiment are a linear triblock copolymer having the above three blocks in the order of polyoxyalkylene block (B), aromatic polysulfone block (A), and polyoxyalkylene block (B), and polyoxy. It may contain at least one block copolymer selected from the group consisting of a linear diblock copolymer having the above two blocks of an alkylene block (B) and an aromatic polysulfone block (A).
  • the linearity referred to here may mean that the block copolymer does not have a branched structure (branched chain).
  • the linear triblock copolymer for example, the end of the main chain of the polymer chain of the aromatic polysulfone block (A) and the end of the main chain of the polymer chain of the polyoxyalkylene block (B) are directly linked to each other. Examples include combined ones.
  • R 1 , R 2 , R 3 , n1 and n2 have the same meanings as those in the above equations (1) and (2).
  • n is an integer of 0 or more
  • m is an integer of 1 or more
  • R 3 existing in plural numbers may be the same or different from each other, the m there are a plurality, it may be the same or different from each other.
  • n is the number of repetitions of the structural unit of the aromatic polysulfone block (A) in the formula (I).
  • m is the number of repetitions of the structural unit of the polyoxyalkylene block (B) in the formula (I).
  • the ratio of the aromatic polysulfone block (A) and the polyoxyalkylene block (B) to the whole block copolymer of the embodiment may be 80% by mass or more and 100% by mass or less, and 90% by mass or more and 100% or more. It may be 98% by mass or less, and may be 98% by mass or more and 100% by mass or less.
  • the ratio represented by the number average molecular weight of the polyoxyalkylene block (B) and the number average molecular weight of the aromatic polysulfone block (A) calculated by 1 H-NMR is 0.005. It is ⁇ 0.030, preferably 0.010 to 0.025, and more preferably 0.015 to 0.020.
  • the hydrophilicity of the block copolymer becomes good, which is preferable.
  • the thermal properties and mechanical properties of the block copolymer are improved, which is preferable. Improvements in the thermal and mechanical properties of block copolymers are confirmed by comparison with block copolymers containing aromatic polysulfone blocks (A) and polyoxyalkylene blocks (B), where the above ratio values exceed the above upper limits. can.
  • the number average molecular weight of the aromatic polysulfone block (A) may be, for example, 20,000 to 60,000, 25,000 to 50,000, or 27,000 to 40,000. It may be 30,000 to 36,000.
  • the number average molecular weight of the polyoxyalkylene block (B) is, for example, preferably 900 or less, preferably 300 to 900, more preferably 400 to 700, further preferably 450 to 600, and further preferably 500 to 600. 550 is particularly preferable.
  • the block copolymers of the embodiments are among those exemplified above.
  • the number average molecular weight of the aromatic polysulfone block (A) may be 20000 to 60,000
  • the number average molecular weight of the polyoxyalkylene block (B) may be 300 to 900
  • 25,000 to 50,000 the number average molecular weight of the polyoxyalkylene block (B) may be 400 to 700
  • the number average molecular weight of the aromatic polysulfone block (A) is 27,000 to 40,000
  • the polyoxyalkylene block is 27,000 to 40,000
  • the number average molecular weight of (B) may be 450 to 600, the number average molecular weight of the aromatic polysulfone block (A) is 30,000 to 36,000, and the number average molecular weight of the polyoxyalkylene block (B) is 500 to 550. May be.
  • the number average molecular weight of the polyoxyalkylene block (B) (Mn of the block) and the number average molecular weight of the aromatic polysulfone block (A) (Mn of the block) can be specified by the NMR method and obtained by 1 H-NMR measurement of solution 1.
  • the NMR-converted number average molecular weight calculated based on the obtained spectrum can be adopted.
  • the Mn of the polyoxyalkylene block (B) corresponds to the peak intensity I PAO-Main corresponding to the main chain of the polyoxyalkylene and the binding site of the polyoxyalkylene bound to the aromatic polysulfone as the NMR-equivalent molecular weight M n PAO.
  • the number of repeating units of polyoxyalkylene calculated from the ratio of peak intensity I PAO-Link (I PAO-Main / I PAO-Link ) n PAO can be calculated from the value obtained by multiplying the molecular weight per repeating unit of polyoxyalkylene. ..
  • the Mn of the aromatic polysulfone block (A) corresponds to the peak intensity I PES-Main corresponding to the main chain of the aromatic polysulfone and the binding site of the aromatic polysulfone bonded to polyoxyalkylene as the NMR-equivalent molecular weight M n PES.
  • the number of repeating units of aromatic polysulfone calculated from the ratio of peak intensity I PES-Link (IPES-Main / I PES-Link ) n PES can be calculated from the value obtained by multiplying the molecular weight per repeating unit of aromatic polysulfone. ..
  • the weight average molecular weight (Mw) of the block copolymer of the embodiment may be 20000 to 70000, 30000 to 65000, 40500 to 60000, 43000 to 55000, and 44000. It may be ⁇ 54000.
  • the block copolymer of the embodiment contains a polymer that does not contain the aromatic polysulfone block (A) and the polyoxyalkylene block (B) due to unintended decomposition or residual unreacted raw materials. It is also assumed that a very small amount is mixed.
  • the weight average molecular weight (Mw) of the block copolymer may be the weight average molecular weight (Mw) of the resin composition containing the block copolymer of the embodiment.
  • the resin composition contains 95% by mass or more and 100% by mass or less of a block copolymer containing the aromatic polysulfone block (A) and the polyoxyalkylene block (B) with respect to the total mass of the resin composition. It may be contained in an amount of 98% by mass or more and 100% by mass or less.
  • the weight average molecular weight (Mw) is the weight average absolute molecular weight measured by gel permeation chromatography (GPC).
  • the block copolymer of the embodiment has moderate hydrophilicity and is excellent in thermal properties and mechanical properties.
  • As an index of the hydrophilicity of the block copolymer for example, the value of the contact angle of the film obtained by molding the block copolymer with water can be adopted.
  • the following glass transition temperature (Tg) and 1% mass loss temperature values can be used as indicators of the thermal properties of block copolymers.
  • the following values of tensile strength and tensile elongation of the molded product can be adopted as an index of the mechanical properties of the block copolymer.
  • the glass transition temperature (Tg) of the block copolymer of the embodiment is preferably 200 ° C. or higher, more preferably 210 ° C. or higher, still more preferably 215 ° C. or higher.
  • the upper limit of the glass transition temperature is not particularly limited, and for example, it may be 250 ° C. or lower, 240 ° C. or lower, or 230 ° C. or lower.
  • the upper limit value and the lower limit value of the glass transition temperature can be arbitrarily combined, and the glass transition temperature (Tg) of the block copolymer of the embodiment may be, for example, 200 ° C. or higher and 250 ° C. or lower, and 210 ° C. or higher and 240 ° C. or higher.
  • the temperature may be 215 ° C or higher and 230 ° C or lower.
  • the glass transition temperature can be measured by a method according to JIS-K7121 (differential scanning calorimetry (DSC)), and the glass transition temperature when the temperature is raised to 400 ° C. at 10 ° C./min is measured.
  • DSC differential scanning calorimetry
  • the block copolymer of the embodiment in which the glass transition temperature (Tg) is at least the above lower limit value is preferable because it is more excellent in heat resistance.
  • the block copolymer of the embodiment in which the glass transition temperature (Tg) is not more than the above upper limit value is preferable because it facilitates molding.
  • the 1% mass reduction temperature of the block copolymer of the embodiment is preferably 370 ° C. or higher, more preferably 400 ° C. or higher, still more preferably 430 ° C. or higher.
  • the upper limit of the 1% mass reduction temperature is not particularly limited, and for example, it may be 500 ° C. or lower, 480 ° C. or lower, or 450 ° C. or lower.
  • the upper limit value and the lower limit value of the above 1% mass reduction temperature can be arbitrarily combined, and the 1% mass reduction temperature of the block copolymer of the embodiment may be, for example, 370 ° C. or higher and 500 ° C. or lower, and 400 ° C. or higher. It may be 480 ° C. or lower, and may be 430 ° C. or higher and 450 ° C. or lower.
  • the 1% mass reduction temperature indicates the temperature at which the temperature is raised to 800 ° C. at a heating rate of 10 ° C./min and the mass is reduced by 1% based on the mass of the sample at 200 ° C.
  • the block copolymer of the embodiment in which the 1% mass reduction temperature is at least the above lower limit value is more excellent in heat resistance.
  • the molded article of the embodiment contains the block copolymer of the embodiment.
  • the molded product of the embodiment is molded from the block copolymer of the embodiment.
  • the molded product of the embodiment can be made by using the block copolymer of the embodiment as a molding material.
  • the content ratio of the block copolymer of the embodiment with respect to the total mass of the molded product of the embodiment may be, for example, 50 to 100% by mass, 80 to 99.5% by mass, or 90 to 99% by mass. It may be there.
  • Examples of the method for producing a molded product include a method having a step of molding the block copolymer of the embodiment into a desired shape.
  • the molding method a method of molding the material containing the block copolymer of the embodiment by a solution casting method, extrusion molding, T-die molding, blow molding, injection molding or the like can be exemplified.
  • the block copolymer of the embodiment can be molded into various shapes by selecting a molding method according to the desired shape of the molded product and the like.
  • a film containing the block copolymer of the embodiment can be exemplified.
  • the thickness of the film of the embodiment is not particularly limited, but may be, for example, 5 to 200 ⁇ m, 7 to 100 ⁇ m, or 10 to 50 ⁇ m.
  • the molded product of the embodiment contains the block copolymer of the embodiment, it can have appropriate hydrophilicity and is excellent in thermal properties and mechanical properties.
  • the tensile strength of the molded product obtained by molding the block copolymer of the embodiment is preferably 100 MPa or more, more preferably 101 MPa or more, still more preferably 103 MPa or more.
  • the upper limit of the tensile strength is not particularly limited, and for example, it may be 150 MPa or less, 130 MPa or less, or 120 MPa or less.
  • the upper limit value and the lower limit value of the tensile strength can be arbitrarily combined, and the tensile strength of the molded product obtained by molding the block copolymer of the embodiment may be, for example, 100 MPa or more and 150 MPa or less, and 101 MPa. It may be 130 MPa or more, and may be 103 MPa or more and 120 MPa or less.
  • the above tensile strength can be obtained by the method described in Examples.
  • the molded product of the block copolymer of the embodiment in which the tensile strength is equal to or higher than the lower limit value is further excellent in mechanical properties.
  • the tensile elongation of the molded product obtained by molding the block copolymer of the embodiment is preferably 6% or more, more preferably 7% or more, still more preferably 8% or more.
  • the upper limit of the tensile elongation is not particularly limited, and for example, it may be 30% or less, 20% or less, or 15% or less.
  • the upper limit value and the lower limit value of the tensile elongation can be arbitrarily combined, and the tensile elongation of the molded product obtained by molding the block copolymer of the embodiment may be, for example, 6% or more and 30% or less. It may be% or more and 20% or less, and may be 8% or more and 15% or less.
  • the tensile elongation can be obtained by the method described in Examples. (Measurement of tensile properties of film) Tensile strength and tensile elongation at break are measured according to JIS K7127. Using a JIS K6251 dumbbell-shaped No. 3 test piece obtained by punching a film with a thickness of 30 ⁇ m, the test piece was pulled by an autograph at a grip interval of 50 mm and a tensile speed of 5 mm / min, at 23 ° C. and a relative humidity of 50%.
  • the tensile strength (the value obtained by dividing the tensile load value by the cross-sectional area of the test piece) and the tensile elongation (%) are measured.
  • the tensile elongation was calculated by the following formula. The larger the tensile elongation, the larger the film elongation.
  • Tensile elongation (%) (L-Lo) / Lo ⁇ 100 Lo: Gripping interval before test (50 mm), L: Gripping interval at break (mm)
  • the molded product of the block copolymer of the embodiment in which the tensile elongation is equal to or higher than the above lower limit value is further excellent in mechanical properties.
  • the block copolymer of the embodiment has moderate hydrophilicity and is excellent in thermal properties and mechanical properties.
  • the block copolymer of the embodiment has appropriate hydrophilicity by containing the polyoxyalkylene block (B).
  • the method for producing the block copolymer of the embodiment is not particularly limited, but as one embodiment, the following method for producing the block copolymer can be exemplified.
  • the method for producing a block copolymer of the embodiment is a step of reacting an aromatic polysulfone (a) having at least one Cl atom at the end with a polyoxyalkylene compound (b) having at least one hydroxy group at the end ( It may include a block copolymer manufacturing process).
  • the method for producing a block copolymer of the embodiment is intended to react a prepolymerized aromatic polysulfone (a) with a polyoxyalkylene compound (b), and a step of preparing the aromatic polysulfone (a) in advance is performed. It may also be included.
  • the method for producing the block copolymer of the embodiment includes a step of preparing an aromatic polysulfone (a) having at least one Cl atom at the terminal in advance and a step of preparing the aromatic polysulfone (a) in advance. It may include a step (block copolymer manufacturing step) of reacting the aromatic polysulfone (a) with a polyoxyalkylene compound (b) having at least one hydroxy group at the terminal.
  • the step of preparing the aromatic polysulfone (a) in advance includes obtaining the aromatic polysulfone (a) and simply preparing a commercially available aromatic polysulfone (a).
  • the method for producing the block copolymer of the embodiment may further include a step of producing the aromatic polysulfone (a) (aromatic polysulfone production step).
  • the method for producing a block copolymer of the embodiment includes a step of obtaining an aromatic polysulfone (a) having at least one Cl atom at the terminal by a polycondensation reaction. It may include a step (block copolymer manufacturing step) of reacting the aromatic polysulfone (a) with a polyoxyalkylene compound (b) having at least one hydroxy group at the terminal.
  • aromatic polysulfone (a) for example, by a polycondensation reaction between a compound represented by the following general formula (a1) and a compound represented by the following general formula (a2), the following general formula (a-1) ) Can be obtained.
  • aromatic polysulfone (a) obtained by the above polycondensation reaction examples include compounds represented by the following general formula (a-1).
  • R 1 , R 2, n1, n2 and n represent the same meaning as in the formula (I).
  • -X 1 and -X 2 are independently -OH or -Cl, and at least one of -X 1 and -X 2 is -Cl.
  • N is the number of repetitions of the structural unit of the aromatic polysulfone (a-1).
  • aromatic polysulfone (a) In the reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b), examples of the aromatic polysulfone (a) include those described above.
  • the value of the weight average molecular weight of the aromatic polysulfone (a) used as a raw material may be appropriately determined according to the weight average molecular weight of the produced block copolymer. From the viewpoint of improving the molecular weight of the produced block copolymer, the weight average molecular weight of the above aromatic polysulfone (a) used as a raw material may be 30,000 or more, 30,000 or more and 70,000 or less. It may be 40,000 or more and 65,000 or less.
  • Examples of the polyoxyalkylene compound (b) include compounds represented by the following general formula (b-1).
  • R 3 and m represent the same meaning as in the formula (I).
  • -Y is an alkyl group having 1 to 3 carbon atoms.
  • Examples of the alkyl group having 1 to 3 carbon atoms of —Y include a methyl group, an ethyl group, an n-propyl group, an isopropyl group and the like, and a methyl group is preferable.
  • a compound represented by the general formula (a-1) and a compound represented by the general formula (b-1) As an example of the reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b), a compound represented by the general formula (a-1) and a compound represented by the general formula (b-1)
  • the reaction of can be exemplified.
  • the reaction can be represented by the following reaction formula.
  • a block copolymer represented by the general formula (I-1) is obtained.
  • Aromatic polysulfone (a) may be used alone or in combination of two or more.
  • polyoxyalkylene compound (b) one type may be used alone, or two or more types may be used in combination.
  • the amount of the polyoxyalkylene compound (b) having at least one hydroxy group at the terminal is 0.4 to 2.0 with respect to 1 mol of the aromatic polysulfone (a) having at least one Cl atom at the end. It is preferably mol, more preferably 0.4 to 1.5 mol, even more preferably 0.5 to 1.2 mol, and particularly preferably 0.5 to 0.9 mol. When the amount is within the above range, the Mw measured by GPC of the obtained block copolymer can be further improved, which is preferable.
  • the aromatic polysulfone (a) having at least one Cl atom at the terminal the compound represented by the general formula (a-1) is preferable.
  • the polyoxyalkylene compound (b) having at least one hydroxy group at the terminal the compound represented by the general formula (b-1) is preferable.
  • the reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b) is preferably carried out using an alkali metal carbonate and / or an alkali metal bicarbonate as the base of the catalyst. Further, the reaction is preferably carried out in an organic solvent as a solvent, and more preferably carried out in an organic solvent using an alkali metal salt of carbonic acid as a base.
  • the alkali metal salt of carbonic acid may be an alkali carbonate (alkali metal carbonate) which is a positive salt, or a bicarbonate alkali (hydrogen carbonate alkali, alkali metal hydrogen carbonate) which is an acidic salt. It may be a mixture of these (alkali carbonate and alkali bicarbonate).
  • alkali carbonate include sodium carbonate, potassium carbonate and the like.
  • alkali bicarbonate include sodium bicarbonate (sodium hydrogen carbonate), potassium bicarbonate (potassium hydrogen carbonate) and the like.
  • the blending ratio of the alkali metal salt of carbonic acid is preferably 0.90 mol or more and 1.30 mol or less as the alkali metal with respect to 1 mol of the polyoxyalkylene compound (b), and 0.95 mol or more and 1 mol. More preferably, it is 20 mol or less.
  • the organic solvent examples include an aprotic polar solvent, and the boiling point of the aprotic polar solvent under 1 atm is preferably 250 ° C. or lower.
  • the reaction can proceed while refluxing the aprotic polar solvent at a relatively low temperature to remove by-products.
  • the boiling point of the aprotic polar solvent is preferably 250 ° C. or lower, and may be 230 ° C. or lower, or 210 ° C. or lower.
  • the boiling point of the aprotic polar solvent may be 120 ° C. or higher, 140 ° C. or higher, or 150 ° C. or higher.
  • the numerical range of the boiling point of the above-mentioned aprotic polar solvent it may be 120 ° C. or higher and 230 ° C. or lower, 140 ° C. or higher and 210 ° C. or lower, or 150 ° C. or higher and 210 ° C. or lower. May be good.
  • aprotonic polar solvent having a boiling point of 250 ° C. or lower examples include sulfonic solvents such as dimethylsulfone and diethylsulfone, N, N-dimethylacetamide, N-methyl-pyrrolidone, N-ethyl-pyrrolidone, N-methylcaprolactam, N, Amide solvents such as N-dimethylformamide, N, N-diethylformamide, N, N-diethylacetamide, N-methylpropionamide, dimethylimidazolidinone, lactone solvents such as ⁇ -butyllactone and ⁇ -butyllactone, Examples thereof include sulfoxide-based solvents such as methyl sulfoxide and methylphenyl sulfoxide, cellosolve-based solvents such as tetramethylphosphoric amide and hexamethylphosphoric amide, and cellosolve-based solvents such as ethyl cellosolve a
  • water may be produced as a by-product, and for the purpose of removing this water, a solvent "a solvent that forms an azeotropic mixture with water” is used. May be added.
  • an azeotropic mixture with water is formed with respect to the total amount of the solvent used in the reaction.
  • the proportion of the solvent to be used is preferably 0 to 20% by mass, more preferably 0 to 10% by mass, further preferably 0 to 3% by mass, and the solvent used for the reaction is water. It is particularly preferred that it contains substantially no solvent to form an azeotropic mixture with.
  • the boiling point of the solvent forming the azeotropic mixture with water is preferably 250 ° C. or lower, and may be 230 ° C. or lower, or 210 ° C. or lower.
  • the boiling point of the solvent forming the azeotropic mixture with water may be 40 ° C. or higher, 80 ° C. or higher, or 100 ° C. or higher.
  • the numerical range of the boiling point of the solvent forming the azeotropic mixture with water it may be 40 ° C. or higher and 250 ° C. or lower, 80 ° C. or higher and 230 ° C. or lower, and 100 ° C. or higher and 210 ° C. It may be as follows.
  • Examples of the solvent for forming an azeotropic mixture with water having a boiling point of 250 ° C. or lower include benzene, chlorobenzene, toluene, xylene, ethylbenzene, methyl isobutyl ketone, hexane, cyclohexane and the like.
  • the reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b) is preferably carried out at 250 ° C. or lower.
  • the reaction temperature is preferably 250 ° C. or lower, may be 230 ° C. or lower, or may be 210 ° C. or lower.
  • the lower limit of the reaction temperature is not limited, but may be 100 ° C. or higher, 120 ° C. or higher, or 140 ° C. or higher.
  • the temperature may be 100 ° C. or higher and 250 ° C. or lower, or 120 ° C. or higher and 230 ° C. or lower. It may be 140 ° C. or higher and 210 ° C. or lower.
  • the organic solvent may be removed by distilling off the organic solvent directly from the solution, or the solution may be mixed with a poor solvent of the block copolymer to precipitate the block copolymer, which may be filtered or centrifuged. It may be done by separating. A predetermined amount of the organic solvent may remain.
  • poor solvents for block copolymers include methanol, ethanol, 2-propanol, acetone, hexane, heptane and water, with preference given to water and methanol due to their low cost.
  • one type of poor solvent for the block copolymer may be used alone, or two or more types may be used in combination.
  • Solution 1 for calculating NMR-equivalent molecular weight For 1 H-NMR measurement, a sample dissolved in deuterated dimethylsulfoxide was used so that the concentration of the block copolymer to be measured was 50 mg / ml.
  • the measurement conditions are as follows.
  • Measuring device PS400WB (manufactured by Varian) Static magnetic field strength: 9.4 Tesla (resonance frequency: 400 MHz ( 1 H)) Spinning: 16Hz Repeat time: 1.5s Number of integrations: 128 times Temperature: 40 ° C Chemical shift reference material: Tetramethylsilane
  • NMR equivalent number average molecular weight (Mn of the block) of the polyether sulfone (PES) block and the polyoxyalkylene (PAO) block contained in the block copolymer to be measured is calculated based on the spectrum obtained by the solution 1 H-NMR measurement. bottom.
  • the Mn / PES block Mn ratio of the PAO block contained in the block copolymer was calculated by dividing M n PAO by M n PES.
  • Tg glass transition temperature of block copolymers, etc.
  • the glass transition temperature was measured by a method according to JIS-K7121 (differential scanning calorific value measurement (DSC)), and the glass transition temperature when the temperature was raised to 400 ° C. at 10 ° C./min was measured.
  • DSC differential scanning calorific value measurement
  • the 1% mass reduction temperature indicates the temperature at which the temperature was raised to 800 ° C. at a heating rate of 10 ° C./min and the mass was reduced by 1% based on the mass of the sample at 200 ° C.
  • Tensile strength and tensile elongation at break were measured according to JIS K7127. Using a JIS K6251 dumbbell-shaped No. 3 test piece obtained by punching a film with a thickness of 30 ⁇ m, the test piece was pulled by an autograph at a grip interval of 50 mm and a tensile speed of 5 mm / min, at 23 ° C. and a relative humidity of 50%. The tensile strength (the value obtained by dividing the tensile load value by the cross-sectional area of the test piece) and the tensile elongation (%) when the test piece was cut (broken) in an atmosphere were measured.
  • the tensile elongation was calculated by the following formula. The larger the tensile elongation, the larger the film elongation.
  • Tensile elongation (%) (L-Lo) / Lo ⁇ 100 Lo: Gripping interval before test (50 mm), L: Gripping interval at break (mm)
  • Example 5 The above-mentioned polyether sulfone (Sumika Excel PES 5900P, manufactured by Sumitomo Chemical Co., Ltd.) was used as a sample of Experimental Example 5.
  • ⁇ Making cast film> In a heating container, 18 parts by mass of the aromatic polysulfone block copolymer of Experimental Examples 1 to 4 or 18 parts by mass of aromatic polysulfone and 82 parts by mass of NMP of Experimental Example 5 are mixed and stirred at 80 ° C. for 2 hours to obtain a pale yellow color. Solution was obtained. This was applied to one surface of a glass plate having a thickness of 3 mm using a film applicator, and then dried at 60 ° C. using a high-temperature hot air dryer to form a coating film. This coating film was heat-treated at 250 ° C. while flowing nitrogen to form a film having a thickness of 30 ⁇ m on a glass plate. A film was obtained by peeling this film from a glass plate. For the obtained film, the contact angle with water, the tensile strength and the tensile elongation were measured.

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Abstract

The present invention relates to a block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B), wherein the ratio of [the number average molecular weight of the polyoxyalkylene block (B)] / [the number average molecular weight of the aromatic polysulfone block (A)], as calculated using 1H-NMR, is 0.010-0.030.

Description

ブロックコポリマーBlock copolymer
 本発明は、ブロックコポリマーに関する。
 本願は、2020年3月9日に、日本に出願された特願2020-040190号に基づき優先権を主張し、その内容をここに援用する。
The present invention relates to block copolymers.
The present application claims priority based on Japanese Patent Application No. 2020-040190 filed in Japan on March 9, 2020, the contents of which are incorporated herein by reference.
 芳香族ポリスルホンは、耐熱性や耐薬品性に優れることから、成形体用の材料として各種用途に用いられている。用途によっては、親水化された芳香族ポリスルホンが求められる場合がある。 Aromatic polysulfone is used for various purposes as a material for molded products because it has excellent heat resistance and chemical resistance. Hydrophilized aromatic polysulfone may be required depending on the application.
 従来、芳香族ポリスルホンを高分子鎖として有する、ブロック共重合体が製造されている。芳香族ポリスルホンブロック(A)に、更にポリオキシアルキレンブロック(B)を含むブロックコポリマーは、親水性に優れる傾向にある。
 特許文献1には、ポリアリールエーテルスルホン-ポリアルキレンオキシド-ブロックコポリマーの製造方法が開示されている。
Conventionally, block copolymers having aromatic polysulfone as a polymer chain have been produced. Block copolymers containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B) tend to have excellent hydrophilicity.
Patent Document 1 discloses a method for producing a polyaryl ether sulfone-polyalkylene oxide-block copolymer.
特表2016-516875号公報Special Table 2016-516875A
 しかし、上記の親水化されたブロックコポリマーにおいて、熱的特性や機械的特性の向上が求められる場合がある。 However, in the above-mentioned hydrophilized block copolymer, improvement of thermal properties and mechanical properties may be required.
 本発明は、上記のような問題点を解消するためになされたものであり、芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーであって、熱的特性及び機械的特性に優れる、ブロックコポリマーを提供することを目的とする。 The present invention has been made to solve the above-mentioned problems, and is a block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B), which has thermal properties and mechanical properties. It is an object of the present invention to provide a block copolymer having excellent properties.
 本発明者らは、上記課題を解決すべく、鋭意検討した結果、H-NMRにより算出された、ポリオキシアルキレンブロック(B)の数平均分子量/前記芳香族ポリスルホンブロック(A)の数平均分子量で表される比を特定の範囲とすることで、熱的特性及び機械的特性の向上が可能であること見出し、本発明を完成するに至った。
 すなわち、本発明は以下の態様を有する。
The present inventors have, to solve the above problems, a result of intensive studies, calculated by 1 H-NMR, the number average of the number average molecular weight of the polyoxyalkylene block (B) / the aromatic polysulfone block (A) We have found that it is possible to improve thermal properties and mechanical properties by setting the ratio represented by the molecular weight within a specific range, and have completed the present invention.
That is, the present invention has the following aspects.
<1>芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーであって、
 H-NMRにより算出された、前記ポリオキシアルキレンブロック(B)の数平均分子量/前記芳香族ポリスルホンブロック(A)の数平均分子量で表される比が、0.005~0.030である、ブロックコポリマー。
<2>H-NMRにより算出された、前記ポリオキシアルキレンブロック(B)の数平均分子量が、900以下である、前記<1>に記載のブロックコポリマー。
<3>ゲル浸透クロマトグラフィーにより絶対分子量として取得された、前記ブロックコポリマーの重量平均分子量が、20000~70000である、前記<1>又は<2>に記載のブロックコポリマー。
<4>前記ポリオキシアルキレンブロック(B)、前記芳香族ポリスルホンブロック(A)、及び前記ポリオキシアルキレンブロック(B)の順に、上記3つのブロックを有する直鎖状トリブロックコポリマー、並びに
 前記ポリオキシアルキレンブロック(B)及び前記芳香族ポリスルホンブロック(A)の上記2つのブロックを有する直鎖状ジブロックコポリマー、
 の少なくとも一方を含む、前記<1>~<3>のいずれか一つに記載のブロックコポリマー。
<5>前記芳香族ポリスルホンブロック(A)が、下記式(1)で表される構造単位を有する高分子鎖からなる、前記<1>~<4>のいずれか一つに記載のブロックコポリマー。
Figure JPOXMLDOC01-appb-C000003
[式(1)中、
 R及びRは、それぞれ独立に、炭素数1~10のアルキル基、炭素数6~20のアリール基又はハロゲン原子を表し、
 n1及びn2は、それぞれ独立に、0~4の整数であり、
 n1又はn2が2以上である場合、複数個のR及びRは互いに同一でも異なっていてもよい。]
<6>前記ポリオキシアルキレンブロック(B)が、下記式(2-1)で表される構造単位を有する高分子鎖からなる、前記<1>~<5>のいずれか一つに記載のブロックコポリマー。
Figure JPOXMLDOC01-appb-C000004
<7>前記ブロックコポリマーのガラス転移点が、200℃以上である、前記<1>~<6>のいずれか一つに記載のブロックコポリマー。
<8>前記ブロックコポリマーの1%質量減少温度が、370℃以上である、前記<1>~<7>のいずれか一つに記載のブロックコポリマー。
<9>下記測定方法にて求められる、前記ブロックコポリマーを成形して得られる成形体の引張強さが、100MPa以上である、前記<1>~<8>のいずれか一つに記載のブロックコポリマー。
(測定方法)
 前記成形体として、厚さ30μmのJIS K6251 ダンベル状3号形の試験片を用いて、JIS K7127に準拠して、オートグラフにて、つかみ間隔50mm、引張速度5mm/分で引張り、23℃、相対湿度50%の雰囲気下における、試験片が切断(破断)したときの引張強さを求める。
<1> A block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B).
1 The ratio represented by the number average molecular weight of the polyoxyalkylene block (B) / the number average molecular weight of the aromatic polysulfone block (A) calculated by 1 H-NMR is 0.005 to 0.030. , Block copolymer.
<2> 1 The block copolymer according to <1>, wherein the number average molecular weight of the polyoxyalkylene block (B) calculated by 1 H-NMR is 900 or less.
<3> The block copolymer according to <1> or <2>, wherein the block copolymer has a weight average molecular weight of 20,000 to 70,000, which is obtained as an absolute molecular weight by gel permeation chromatography.
<4> A linear triblock copolymer having the above three blocks and the polyoxy in the order of the polyoxyalkylene block (B), the aromatic polysulfone block (A), and the polyoxyalkylene block (B). A linear diblock copolymer having the above two blocks of an alkylene block (B) and the aromatic polysulfone block (A),
The block copolymer according to any one of <1> to <3>, which comprises at least one of.
<5> The block copolymer according to any one of <1> to <4>, wherein the aromatic polysulfone block (A) is composed of a polymer chain having a structural unit represented by the following formula (1). ..
Figure JPOXMLDOC01-appb-C000003
[In equation (1),
R 1 and R 2 independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a halogen atom.
n1 and n2 are independently integers of 0 to 4, respectively.
When n1 or n2 is 2 or more, plural R 1 and R 2 may be the same or different from each other. ]
<6> The above-described one of <1> to <5>, wherein the polyoxyalkylene block (B) is composed of a polymer chain having a structural unit represented by the following formula (2-1). Block copolymer.
Figure JPOXMLDOC01-appb-C000004
<7> The block copolymer according to any one of <1> to <6>, wherein the glass transition point of the block copolymer is 200 ° C. or higher.
<8> The block copolymer according to any one of <1> to <7>, wherein the 1% mass reduction temperature of the block copolymer is 370 ° C. or higher.
<9> The block according to any one of <1> to <8>, wherein the tensile strength of the molded product obtained by molding the block copolymer, which is obtained by the following measuring method, is 100 MPa or more. Copolymer.
(Measuring method)
As the molded body, a JIS K6251 dumbbell-shaped No. 3 test piece having a thickness of 30 μm was used, and in accordance with JIS K7127, an autograph was used to pull the product at a grip interval of 50 mm and a tensile speed of 5 mm / min at 23 ° C. The tensile strength when the test piece is cut (broken) in an atmosphere of 50% relative humidity is determined.
 本発明によれば、芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーであって、熱的特性及び機械的特性に優れる、ブロックコポリマーを提供できる。 According to the present invention, it is possible to provide a block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B), which is excellent in thermal properties and mechanical properties.
 以下、本発明のブロックコポリマーの実施形態を説明する。 Hereinafter, embodiments of the block copolymer of the present invention will be described.
≪ブロックコポリマー≫
 実施形態のブロックコポリマーは、芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーであって、H-NMRにより算出された、前記ポリオキシアルキレンブロック(B)の数平均分子量/前記芳香族ポリスルホンブロック(A)の数平均分子量で表される比が、0.005~0.030であるものである。
≪Block Copolymer≫
The block copolymer of the embodiment is a block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B), and the number average of the polyoxyalkylene block (B) calculated by 1 H-NMR. The ratio represented by the molecular weight / the number average molecular weight of the aromatic polysulfone block (A) is 0.005 to 0.030.
 芳香族ポリスルホンブロック(A)としては、スルホニル基(-SO-)とアリーレン基(-Ar-)とエーテル結合(-O-)とがこの順で結合した構造を少なくとも含む構造単位、を有する高分子鎖からなるものが挙げられる。 The aromatic polysulfone block (A) has a structural unit containing at least a structure in which a sulfonyl group (-SO 2- ), an arylene group (-Ar-), and an ether bond (-O-) are bonded in this order. Examples thereof include those composed of polymer chains.
 芳香族ポリスルホンブロック(A)は、耐熱性や耐薬品性の点から、下記一般式(1)で表される構造単位を有することが好ましい。 The aromatic polysulfone block (A) preferably has a structural unit represented by the following general formula (1) from the viewpoint of heat resistance and chemical resistance.
Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005
[式(1)中、
 R及びRは、それぞれ独立に、炭素数1~10のアルキル基、炭素数6~20のアリール基又はハロゲン原子を表し、
 n1及びn2は、それぞれ独立に、0~4の整数であり、
 n1又はn2が2以上である場合、複数個のR及びRは互いに同一でも異なっていてもよい。]
[In equation (1),
R 1 and R 2 independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a halogen atom.
n1 and n2 are independently integers of 0 to 4, respectively.
When n1 or n2 is 2 or more, plural R 1 and R 2 may be the same or different from each other. ]
 R及びRにおける、前記炭素数1~10のアルキル基としては、例えばメチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、s-ブチル基、t-ブチル基、n-ヘキシル基、2-エチルヘキシル基、n-オクチル基、n-デシル基等が挙げられる。
 R及びRにおける、前記炭素数6~20のアリール基としては、例えばフェニル基、o-トリル基、m-トリル基、p-トリル基、1-ナフチル基、2-ナフチル基等が挙げられる。
 R及びRにおける、前記ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられる。
 n1及びn2は、それぞれ独立に、0~4の整数であり、0~2が好ましく、0~1がより好ましい。
Examples of the alkyl group having 1 to 10 carbon atoms in R 1 and R 2 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, and a t-butyl group. Examples thereof include a group, an n-hexyl group, a 2-ethylhexyl group, an n-octyl group, an n-decyl group and the like.
Examples of the aryl group having 6 to 20 carbon atoms in R 1 and R 2 include a phenyl group, an o-trill group, an m-trill group, a p-trill group, a 1-naphthyl group, a 2-naphthyl group and the like. Be done.
Examples of the halogen atom in R 1 and R 2 include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
n1 and n2 are independently integers of 0 to 4, preferably 0 to 2, and more preferably 0 to 1.
 例えば、芳香族ポリスルホンブロック(A)を構成する全構造単位の合計量100モル%に対して、上記一般式(1)で表される構造単位が、80モル%以上100モル%以下で含まれていてもよく、90モル%以上100モル%以下で含まれていてもよく、98モル%以上100モル%以下で含まれていてもよい。 For example, the structural unit represented by the general formula (1) is contained in an amount of 80 mol% or more and 100 mol% or less with respect to a total amount of 100 mol% of all the structural units constituting the aromatic polysulfone block (A). It may be contained in an amount of 90 mol% or more and 100 mol% or less, or may be contained in a content of 98 mol% or more and 100 mol% or less.
 ポリオキシアルキレンブロック(B)としては、オキシアルキレン基を構造単位として有する高分子鎖からなるものが挙げられる。ポリオキシアルキレンブロック(B)は、下記式(2)で表される構造単位を有することが好ましい。 Examples of the polyoxyalkylene block (B) include those composed of a polymer chain having an oxyalkylene group as a structural unit. The polyoxyalkylene block (B) preferably has a structural unit represented by the following formula (2).
Figure JPOXMLDOC01-appb-C000006
Figure JPOXMLDOC01-appb-C000006
[式(2)中、Rは、炭素数2~6のアルキレン基を表す。] [In the formula (2), R 3 represents an alkylene group having 2 to 6 carbon atoms. ]
 Rにおける、前記炭素数2~6のアルキレン基としては、エチレン基、トリメチレン基、-CH(CH)CH-、テトラメチレン基、-CHCHCH(CH)-、ヘキサメチレン基等が挙げられる。 Examples of the alkylene group having 2 to 6 carbon atoms in R 3 include an ethylene group, a trimethylene group, -CH (CH 3 ) CH 2- , tetramethylene group, -CH 2 CH 2 CH (CH 3 )-, and hexamethylene. The basis etc. can be mentioned.
 上記で例示したうち、ポリオキシアルキレンブロック(B)としては、下記式(2-1)で表される構造単位を有することが好ましい。 Of the above examples, the polyoxyalkylene block (B) preferably has a structural unit represented by the following formula (2-1).
Figure JPOXMLDOC01-appb-C000007
Figure JPOXMLDOC01-appb-C000007
 例えば、ポリオキシアルキレンブロック(B)を構成する全構造単位の合計量100モル%に対して、上記一般式(2-1)で表される構造単位が、80モル%以上100モル%以下で含まれていてもよく、90モル%以上100モル%以下で含まれていてもよく、98モル%以上100モル%以下で含まれていてもよい。 For example, the structural unit represented by the above general formula (2-1) is 80 mol% or more and 100 mol% or less with respect to the total amount of 100 mol% of all the structural units constituting the polyoxyalkylene block (B). It may be contained, may be contained in 90 mol% or more and 100 mol% or less, and may be contained in 98 mol% or more and 100 mol% or less.
 実施形態のブロックコポリマーは、ポリオキシアルキレンブロック(B)、芳香族ポリスルホンブロック(A)、及びポリオキシアルキレンブロック(B)の順に、上記3つのブロックを有する直鎖状トリブロックコポリマー、並びに
 ポリオキシアルキレンブロック(B)及び芳香族ポリスルホンブロック(A)の上記2つのブロックを有する直鎖状ジブロックコポリマー、の少なくとも一方を含むものであってよい。
The block copolymers of the embodiment are a linear triblock copolymer having the above three blocks in the order of polyoxyalkylene block (B), aromatic polysulfone block (A), and polyoxyalkylene block (B), and polyoxy. It may contain at least one of a linear diblock copolymer having the above two blocks of an alkylene block (B) and an aromatic polysulfone block (A).
 実施形態のブロックコポリマーは、ポリオキシアルキレンブロック(B)、芳香族ポリスルホンブロック(A)、及びポリオキシアルキレンブロック(B)の順に、上記3つのブロックを有する直鎖状トリブロックコポリマー、並びに
 ポリオキシアルキレンブロック(B)及び芳香族ポリスルホンブロック(A)の上記2つのブロックを有する直鎖状ジブロックコポリマー、からなる群から選ばれる少なくとも一種のブロックコポリマーを含むものであってよい。
The block copolymers of the embodiment are a linear triblock copolymer having the above three blocks in the order of polyoxyalkylene block (B), aromatic polysulfone block (A), and polyoxyalkylene block (B), and polyoxy. It may contain at least one block copolymer selected from the group consisting of a linear diblock copolymer having the above two blocks of an alkylene block (B) and an aromatic polysulfone block (A).
 ここでいう直鎖状とは、ブロックコポリマーが、枝分かれの構造(分岐鎖)を有していないものであってよい。直鎖状トリブロックコポリマーとしては、例えば、芳香族ポリスルホンブロック(A)の高分子鎖の主鎖の末端と、ポリオキシアルキレンブロック(B)の高分子鎖の主鎖の末端とが、直接に結合したものが挙げられる。 The linearity referred to here may mean that the block copolymer does not have a branched structure (branched chain). As the linear triblock copolymer, for example, the end of the main chain of the polymer chain of the aromatic polysulfone block (A) and the end of the main chain of the polymer chain of the polyoxyalkylene block (B) are directly linked to each other. Examples include combined ones.
 ポリオキシアルキレンブロック(B)、芳香族ポリスルホンブロック(A)、及びポリオキシアルキレンブロック(B)の順に、上記3つのブロックを有する直鎖状トリブロックコポリマーの一例として、下記一般式(I)で表されるものが例示できる。 As an example of a linear triblock copolymer having the above three blocks in the order of polyoxyalkylene block (B), aromatic polysulfone block (A), and polyoxyalkylene block (B), the following general formula (I) is used. What is represented can be exemplified.
Figure JPOXMLDOC01-appb-C000008
Figure JPOXMLDOC01-appb-C000008
[式(I)中、
 R、R、R、n1及びn2は、上記式(1)及び式(2)におけるものと同一の意味を表す。
 nは0以上の整数であり、mは1以上の整数であり、複数存在するRは、互いに同一でも異なっていてもよく、複数存在するmは、互いに同一でも異なっていてもよい。]
[In formula (I),
R 1 , R 2 , R 3 , n1 and n2 have the same meanings as those in the above equations (1) and (2).
n is an integer of 0 or more, m is an integer of 1 or more, R 3 existing in plural numbers may be the same or different from each other, the m there are a plurality, it may be the same or different from each other. ]
 nは、上記式(I)における、芳香族ポリスルホンブロック(A)の有する上記構造単位の繰り返し数である。
 mは、上記式(I)における、ポリオキシアルキレンブロック(B)の有する上記構造単位の繰り返し数である。
n is the number of repetitions of the structural unit of the aromatic polysulfone block (A) in the formula (I).
m is the number of repetitions of the structural unit of the polyoxyalkylene block (B) in the formula (I).
 実施形態のブロックコポリマーの全体に占める、前記芳香族ポリスルホンブロック(A)及び前記ポリオキシアルキレンブロック(B)の割合は、80質量%以上100質量%以下であってもよく、90質量%以上100質量%以下であってもよく、98質量%以上100質量%以下であってもよい。 The ratio of the aromatic polysulfone block (A) and the polyoxyalkylene block (B) to the whole block copolymer of the embodiment may be 80% by mass or more and 100% by mass or less, and 90% by mass or more and 100% or more. It may be 98% by mass or less, and may be 98% by mass or more and 100% by mass or less.
 実施形態のブロックコポリマーは、H-NMRにより算出された、ポリオキシアルキレンブロック(B)の数平均分子量/前記芳香族ポリスルホンブロック(A)の数平均分子量で表される比が、0.005~0.030であり、0.010~0.025が好ましく、0.015~0.020がより好ましい。
 上記の比の値が上記下限値以上であると、ブロックコポリマーの親水性が良好となることから好ましい。上記の比の値が上記上限値以下であると、ブロックコポリマーの熱的特性及び機械的特性が向上することから好ましい。ブロックコポリマーの熱的特性及び機械的特性の向上は、上記の比の値が上記上限値を超える、芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーとの対比により確認できる。
In the block copolymer of the embodiment, the ratio represented by the number average molecular weight of the polyoxyalkylene block (B) and the number average molecular weight of the aromatic polysulfone block (A) calculated by 1 H-NMR is 0.005. It is ~ 0.030, preferably 0.010 to 0.025, and more preferably 0.015 to 0.020.
When the value of the above ratio is not more than the above lower limit value, the hydrophilicity of the block copolymer becomes good, which is preferable. When the value of the above ratio is not more than the above upper limit value, the thermal properties and mechanical properties of the block copolymer are improved, which is preferable. Improvements in the thermal and mechanical properties of block copolymers are confirmed by comparison with block copolymers containing aromatic polysulfone blocks (A) and polyoxyalkylene blocks (B), where the above ratio values exceed the above upper limits. can.
 芳香族ポリスルホンブロック(A)の数平均分子量(ブロック(A)のMn)は、例えば、20000~60000であってもよく、25000~50000であってもよく、27000~40000であってもよく、30000~36000であってもよい。 The number average molecular weight of the aromatic polysulfone block (A) (Mn of the block (A)) may be, for example, 20,000 to 60,000, 25,000 to 50,000, or 27,000 to 40,000. It may be 30,000 to 36,000.
 ポリオキシアルキレンブロック(B)の数平均分子量(ブロック(B)のMn)は、例えば、900以下が好ましく、300~900が好ましく、400~700がより好ましく、450~600がさらに好ましく、500~550が特に好ましい。 The number average molecular weight of the polyoxyalkylene block (B) (Mn of the block (B)) is, for example, preferably 900 or less, preferably 300 to 900, more preferably 400 to 700, further preferably 450 to 600, and further preferably 500 to 600. 550 is particularly preferable.
 実施形態のブロックコポリマーは、上記に例示したもののなかでも、
 芳香族ポリスルホンブロック(A)の数平均分子量が20000~60000であり、ポリオキシアルキレンブロック(B)の数平均分子量が300~900であってもよく、 芳香族ポリスルホンブロック(A)の数平均分子量が25000~50000であり、ポリオキシアルキレンブロック(B)の数平均分子量が400~700であってもよく、 芳香族ポリスルホンブロック(A)の数平均分子量が27000~40000であり、ポリオキシアルキレンブロック(B)の数平均分子量が450~600であってもよく、 芳香族ポリスルホンブロック(A)の数平均分子量が30000~36000であり、ポリオキシアルキレンブロック(B)の数平均分子量が500~550であってもよい。 芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)の数平均分子量が上記の数値範囲内とすることで、親水性と、熱的特性及び機械的特性とのバランスに優れる、実施形態のブロックコポリマーが容易に得られる。
The block copolymers of the embodiments are among those exemplified above.
The number average molecular weight of the aromatic polysulfone block (A) may be 20000 to 60,000, the number average molecular weight of the polyoxyalkylene block (B) may be 300 to 900, and the number average molecular weight of the aromatic polysulfone block (A). 25,000 to 50,000, the number average molecular weight of the polyoxyalkylene block (B) may be 400 to 700, the number average molecular weight of the aromatic polysulfone block (A) is 27,000 to 40,000, and the polyoxyalkylene block. The number average molecular weight of (B) may be 450 to 600, the number average molecular weight of the aromatic polysulfone block (A) is 30,000 to 36,000, and the number average molecular weight of the polyoxyalkylene block (B) is 500 to 550. May be. By setting the number average molecular weights of the aromatic polysulfone block (A) and the polyoxyalkylene block (B) within the above numerical range, the balance between hydrophilicity, thermal properties and mechanical properties is excellent. Block copolymers are easily obtained.
 ポリオキシアルキレンブロック(B)の数平均分子量(ブロックのMn)および前記芳香族ポリスルホンブロック(A)の数平均分子量(ブロックのMn)は、NMR法により特定でき、溶液H-NMR測定により取得されたスペクトルに基づき算出したNMR換算数平均分子量を採用できる。 The number average molecular weight of the polyoxyalkylene block (B) (Mn of the block) and the number average molecular weight of the aromatic polysulfone block (A) (Mn of the block) can be specified by the NMR method and obtained by 1 H-NMR measurement of solution 1. The NMR-converted number average molecular weight calculated based on the obtained spectrum can be adopted.
 ポリオキシアルキレンブロック(B)のMnは、NMR換算分子量M PAOとして、ポリオキシアルキレンの主鎖に対応するピーク強度IPAO-Mainと、芳香族ポリスルホンに結合したポリオキシアルキレンの結合部位に対応するピーク強度IPAO-Linkの比率(IPAO-Main/IPAO-Link)から算出したポリオキシアルキレンの繰り返し単位数nPAOに、ポリオキシアルキレンの繰り返し単位あたりの分子量を乗じた値から算出できる。 The Mn of the polyoxyalkylene block (B) corresponds to the peak intensity I PAO-Main corresponding to the main chain of the polyoxyalkylene and the binding site of the polyoxyalkylene bound to the aromatic polysulfone as the NMR-equivalent molecular weight M n PAO. The number of repeating units of polyoxyalkylene calculated from the ratio of peak intensity I PAO-Link (I PAO-Main / I PAO-Link ) n PAO can be calculated from the value obtained by multiplying the molecular weight per repeating unit of polyoxyalkylene. ..
 芳香族ポリスルホンブロック(A)のMnは、NMR換算分子量M PESとして、芳香族ポリスルホンの主鎖に対応するピーク強度IPES-Mainと、ポリオキシアルキレンに結合した芳香族ポリスルホンの結合部位に対応するピーク強度IPES-Linkの比率(IPES-Main/IPES-Link)から算出する芳香族ポリスルホンの繰り返し単位数nPESに、芳香族ポリスルホンの繰り返し単位あたりの分子量を乗じた値から算出できる。 The Mn of the aromatic polysulfone block (A) corresponds to the peak intensity I PES-Main corresponding to the main chain of the aromatic polysulfone and the binding site of the aromatic polysulfone bonded to polyoxyalkylene as the NMR-equivalent molecular weight M n PES. The number of repeating units of aromatic polysulfone calculated from the ratio of peak intensity I PES-Link (IPES-Main / I PES-Link ) n PES can be calculated from the value obtained by multiplying the molecular weight per repeating unit of aromatic polysulfone. ..
 実施形態のブロックコポリマーの重量平均分子量(Mw)は、一例として、20000~70000であってよく、30000~65000であってよく、40500~60000であってよく、43000~55000であってよく、44000~54000であってよい。 As an example, the weight average molecular weight (Mw) of the block copolymer of the embodiment may be 20000 to 70000, 30000 to 65000, 40500 to 60000, 43000 to 55000, and 44000. It may be ~ 54000.
 なお、実施形態のブロックコポリマーは、意図しない分解が進んだり、未反応の原料が残留していたりなどして、芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含まないポリマーが、ごく微量混入している場合も想定される。そのような場合には、ブロックコポリマーの重量平均分子量(Mw)とは、実施形態のブロックコポリマーを含む樹脂組成物を対象に前記重量平均分子量(Mw)を求めてもよい。当該樹脂組成物には、芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーが、樹脂組成物の総質量に対して、95質量%以上100質量%以下含まれていてよく、98質量%以上100質量%以下含まれていてよい。 The block copolymer of the embodiment contains a polymer that does not contain the aromatic polysulfone block (A) and the polyoxyalkylene block (B) due to unintended decomposition or residual unreacted raw materials. It is also assumed that a very small amount is mixed. In such a case, the weight average molecular weight (Mw) of the block copolymer may be the weight average molecular weight (Mw) of the resin composition containing the block copolymer of the embodiment. The resin composition contains 95% by mass or more and 100% by mass or less of a block copolymer containing the aromatic polysulfone block (A) and the polyoxyalkylene block (B) with respect to the total mass of the resin composition. It may be contained in an amount of 98% by mass or more and 100% by mass or less.
 本明細書において、重量平均分子量(Mw)とは、ゲル浸透クロマトグラフィー(GPC)にて測定された重量平均絶対分子量である。 In the present specification, the weight average molecular weight (Mw) is the weight average absolute molecular weight measured by gel permeation chromatography (GPC).
 実施形態のブロックコポリマーは、適度な親水性を有し、熱的特性及び機械的特性に優れる。
 ブロックコポリマーの有する親水性の指標として、例えば、ブロックコポリマーを成形して得られるフィルムの、水との接触角の値を採用できる。
 ブロックコポリマーの熱的特性の指標として、下記のガラス転移温度(Tg)及び1%質量減少温度の値を採用できる。
 ブロックコポリマーの機械的特性の指標として、下記の成形体の引張強さ及び引張伸びの値を採用できる。
The block copolymer of the embodiment has moderate hydrophilicity and is excellent in thermal properties and mechanical properties.
As an index of the hydrophilicity of the block copolymer, for example, the value of the contact angle of the film obtained by molding the block copolymer with water can be adopted.
The following glass transition temperature (Tg) and 1% mass loss temperature values can be used as indicators of the thermal properties of block copolymers.
The following values of tensile strength and tensile elongation of the molded product can be adopted as an index of the mechanical properties of the block copolymer.
 実施形態のブロックコポリマーのガラス転移温度(Tg)は、200℃以上が好ましく、210℃以上がより好ましく、215℃以上がさらに好ましい。
 ガラス転移温度の上限値は特に限定されず、一例を挙げると、250℃以下であってよく、240℃以下であってよく、230℃以下であってよい。
 上記ガラス転移温度の上限値及び下限値は任意に組み合わせることができ、実施形態のブロックコポリマーのガラス転移温度(Tg)は、一例として、200℃以上250℃以下であってよく、210℃以上240℃以下であってよく、215℃以上230℃以下であってもよい。
The glass transition temperature (Tg) of the block copolymer of the embodiment is preferably 200 ° C. or higher, more preferably 210 ° C. or higher, still more preferably 215 ° C. or higher.
The upper limit of the glass transition temperature is not particularly limited, and for example, it may be 250 ° C. or lower, 240 ° C. or lower, or 230 ° C. or lower.
The upper limit value and the lower limit value of the glass transition temperature can be arbitrarily combined, and the glass transition temperature (Tg) of the block copolymer of the embodiment may be, for example, 200 ° C. or higher and 250 ° C. or lower, and 210 ° C. or higher and 240 ° C. or higher. The temperature may be 215 ° C or higher and 230 ° C or lower.
 ガラス転移温度は、JIS-K7121に準じた方法(示差走査熱量測定(DSC))で測定でき、10℃/分で400℃まで昇温した時のガラス転移温度を測定する。 The glass transition temperature can be measured by a method according to JIS-K7121 (differential scanning calorimetry (DSC)), and the glass transition temperature when the temperature is raised to 400 ° C. at 10 ° C./min is measured.
 ガラス転移温度(Tg)が上記下限値以上である実施形態のブロックコポリマーは、耐熱性により一層優れることから好ましい。ガラス転移温度(Tg)が上記上限値以下である実施形態のブロックコポリマーは、成形が容易となることから好ましい。 The block copolymer of the embodiment in which the glass transition temperature (Tg) is at least the above lower limit value is preferable because it is more excellent in heat resistance. The block copolymer of the embodiment in which the glass transition temperature (Tg) is not more than the above upper limit value is preferable because it facilitates molding.
 実施形態のブロックコポリマーの1%質量減少温度は、370℃以上が好ましく、400℃以上がより好ましく、430℃以上がさらに好ましい。
 1%質量減少温度の上限値は特に限定されず、一例を挙げると、500℃以下であってよく、480℃以下であってよく、450℃以下であってよい。
 上記1%質量減少温度の上限値及び下限値は任意に組み合わせることができ、実施形態のブロックコポリマーの1%質量減少温度は、一例として、370℃以上500℃以下であってよく、400℃以上480℃以下であってよく、430℃以上450℃以下であってよい。
The 1% mass reduction temperature of the block copolymer of the embodiment is preferably 370 ° C. or higher, more preferably 400 ° C. or higher, still more preferably 430 ° C. or higher.
The upper limit of the 1% mass reduction temperature is not particularly limited, and for example, it may be 500 ° C. or lower, 480 ° C. or lower, or 450 ° C. or lower.
The upper limit value and the lower limit value of the above 1% mass reduction temperature can be arbitrarily combined, and the 1% mass reduction temperature of the block copolymer of the embodiment may be, for example, 370 ° C. or higher and 500 ° C. or lower, and 400 ° C. or higher. It may be 480 ° C. or lower, and may be 430 ° C. or higher and 450 ° C. or lower.
 1%質量減少温度は、昇温速度10℃/分で800℃まで昇温し、200℃における試料の質量を基準として1%質量減少したときの温度を示す。 The 1% mass reduction temperature indicates the temperature at which the temperature is raised to 800 ° C. at a heating rate of 10 ° C./min and the mass is reduced by 1% based on the mass of the sample at 200 ° C.
 1%質量減少温度が上記下限値以上である実施形態のブロックコポリマーは、耐熱性により一層優れる。 The block copolymer of the embodiment in which the 1% mass reduction temperature is at least the above lower limit value is more excellent in heat resistance.
(成形体)
 実施形態の成形体は、実施形態のブロックコポリマーを含むものである。実施形態の成形体は、実施形態のブロックコポリマーより成形されたものである。
 実施形態の成形体は、実施形態のブロックコポリマーを成形材料として作製することができる。
(Molded body)
The molded article of the embodiment contains the block copolymer of the embodiment. The molded product of the embodiment is molded from the block copolymer of the embodiment.
The molded product of the embodiment can be made by using the block copolymer of the embodiment as a molding material.
 実施形態の成形体の総質量に対する、実施形態のブロックコポリマーの含有割合は、例えば、50~100質量%であってよく、80~99.5質量%であってよく、90~99質量%であってよい。 The content ratio of the block copolymer of the embodiment with respect to the total mass of the molded product of the embodiment may be, for example, 50 to 100% by mass, 80 to 99.5% by mass, or 90 to 99% by mass. It may be there.
 成形体の製造方法として、実施形態のブロックコポリマーを所望の形状に成形する工程を有する方法が挙げられる。 Examples of the method for producing a molded product include a method having a step of molding the block copolymer of the embodiment into a desired shape.
 当該成形方法としては、実施形態のブロックコポリマーを含む材料を、溶液キャスト法、押し出し成形、T-ダイ成形、ブロー成形、射出成形等により成形する方法を例示できる。所望の成形体の形状等に応じた成形方法を選択して、実施形態のブロックコポリマーを種々の形状に成形することができる。 As the molding method, a method of molding the material containing the block copolymer of the embodiment by a solution casting method, extrusion molding, T-die molding, blow molding, injection molding or the like can be exemplified. The block copolymer of the embodiment can be molded into various shapes by selecting a molding method according to the desired shape of the molded product and the like.
 実施形態の成形体の一例として、実施形態のブロックコポリマーを含むフィルムを例示できる。
 実施形態のフィルムの厚さは、特に限定されるものではないが、例えば、5~200μmであってもよく、7~100μmであってもよく、10~50μmであってもよい。
As an example of the molded product of the embodiment, a film containing the block copolymer of the embodiment can be exemplified.
The thickness of the film of the embodiment is not particularly limited, but may be, for example, 5 to 200 μm, 7 to 100 μm, or 10 to 50 μm.
 実施形態の成形体は、実施形態のブロックコポリマーを含むものであるので、適度な親水性を有し、熱的特性及び機械的特性に優れるものとできる。 Since the molded product of the embodiment contains the block copolymer of the embodiment, it can have appropriate hydrophilicity and is excellent in thermal properties and mechanical properties.
 実施形態のブロックコポリマーを成形して得られる成形体の引張強さは、100MPa以上が好ましく、101MPa以上がより好ましく、103MPa以上がさらに好ましい。
 上記引張強さの上限値は特に限定されず、一例を挙げると、150MPa以下であってよく、130MPa以下であってよく、120MPa以下であってよい。
 上記引張強さの上限値及び下限値は任意に組み合わせることができ、実施形態のブロックコポリマーを成形して得られる成形体の引張強さは、一例として、100MPa以上150MPa以下であってよく、101MPa以上130MPa以下であってよく、103MPa以上120MPa以下であってよい。
The tensile strength of the molded product obtained by molding the block copolymer of the embodiment is preferably 100 MPa or more, more preferably 101 MPa or more, still more preferably 103 MPa or more.
The upper limit of the tensile strength is not particularly limited, and for example, it may be 150 MPa or less, 130 MPa or less, or 120 MPa or less.
The upper limit value and the lower limit value of the tensile strength can be arbitrarily combined, and the tensile strength of the molded product obtained by molding the block copolymer of the embodiment may be, for example, 100 MPa or more and 150 MPa or less, and 101 MPa. It may be 130 MPa or more, and may be 103 MPa or more and 120 MPa or less.
 上記引張強さは、実施例に記載の方法により取得できる。 The above tensile strength can be obtained by the method described in Examples.
 上記引張強さが上記下限値以上である実施形態のブロックコポリマーの成形体は、機械的特性により一層優れる。 The molded product of the block copolymer of the embodiment in which the tensile strength is equal to or higher than the lower limit value is further excellent in mechanical properties.
 実施形態のブロックコポリマーを成形して得られる成形体の引張伸びは、6%以上が好ましく、7%以上がより好ましく、8%以上がさらに好ましい。
 上記引張伸びの上限値は特に限定されず、一例を挙げると、30%以下であってよく、20%以下であってよく、15%以下であってよい。
 上記引張伸びの上限値及び下限値は任意に組み合わせることができ、実施形態のブロックコポリマーを成形して得られる成形体の引張伸びは、一例として、6%以上30%以下であってよく、7%以上20%以下であってよく、8%以上15%以下であってよい。
The tensile elongation of the molded product obtained by molding the block copolymer of the embodiment is preferably 6% or more, more preferably 7% or more, still more preferably 8% or more.
The upper limit of the tensile elongation is not particularly limited, and for example, it may be 30% or less, 20% or less, or 15% or less.
The upper limit value and the lower limit value of the tensile elongation can be arbitrarily combined, and the tensile elongation of the molded product obtained by molding the block copolymer of the embodiment may be, for example, 6% or more and 30% or less. It may be% or more and 20% or less, and may be 8% or more and 15% or less.
 上記引張伸びは、実施例に記載の方法により取得できる。
(フィルムの引張特性の測定)
 JIS K7127に準拠して、引張強さと引張破断伸びを測定する。厚さ30μmのフィルムを打抜きして得たJIS K6251 ダンベル状3号形の試験片を用いて、オートグラフにて、つかみ間隔50mm、引張速度5mm/分で引張り、23℃、相対湿度50%の雰囲気下における、試験片が切断(破断)したときの、引張強さ(引張り荷重値を試験片の断面積で除した値)及び引張伸び(%)を測定する。
 引張伸びは次の式によって算出した。引張伸びが大きいほど、フィルム伸度が大きいことを意味する。
 引張伸び(%)=(L-Lo)/Lo×100
Lo:試験前のつかみ間隔(50mm)、L:破断時のつかみ間隔(mm)
The tensile elongation can be obtained by the method described in Examples.
(Measurement of tensile properties of film)
Tensile strength and tensile elongation at break are measured according to JIS K7127. Using a JIS K6251 dumbbell-shaped No. 3 test piece obtained by punching a film with a thickness of 30 μm, the test piece was pulled by an autograph at a grip interval of 50 mm and a tensile speed of 5 mm / min, at 23 ° C. and a relative humidity of 50%. When the test piece is cut (broken) in an atmosphere, the tensile strength (the value obtained by dividing the tensile load value by the cross-sectional area of the test piece) and the tensile elongation (%) are measured.
The tensile elongation was calculated by the following formula. The larger the tensile elongation, the larger the film elongation.
Tensile elongation (%) = (L-Lo) / Lo × 100
Lo: Gripping interval before test (50 mm), L: Gripping interval at break (mm)
 上記引張伸びが上記下限値以上である実施形態のブロックコポリマーの成形体は、機械的特性により一層優れる。 The molded product of the block copolymer of the embodiment in which the tensile elongation is equal to or higher than the above lower limit value is further excellent in mechanical properties.
 実施形態のブロックコポリマーは、適度な親水性を有し、熱的特性及び機械的特性に優れる。
 実施形態のブロックコポリマーは、ポリオキシアルキレンブロック(B)を含むことで、適度な親水性を有する。
 実施形態のブロックコポリマーは、H-NMRにより算出された、ポリオキシアルキレンブロック(B)の数平均分子量/前記芳香族ポリスルホンブロック(A)の数平均分子量で表される比が、上記の特定の数値範囲内であることで、熱的特性及び機械的特性に優れる。
The block copolymer of the embodiment has moderate hydrophilicity and is excellent in thermal properties and mechanical properties.
The block copolymer of the embodiment has appropriate hydrophilicity by containing the polyoxyalkylene block (B).
Block copolymers of embodiments 1 calculated by H-NMR, the ratio represented by the number-average molecular weight of the number average molecular weight of the polyoxyalkylene block (B) / the aromatic polysulfone block (A) is, the specific When it is within the numerical range of, the thermal characteristics and the mechanical characteristics are excellent.
≪ブロックコポリマーの製造方法≫
 実施形態のブロックコポリマーの製造方法は、特に限定されるものではないが、一実施形態として、下記のブロックコポリマーの製造方法を例示できる。
≪Manufacturing method of block copolymer≫
The method for producing the block copolymer of the embodiment is not particularly limited, but as one embodiment, the following method for producing the block copolymer can be exemplified.
 実施形態のブロックコポリマーの製造方法は、末端に少なくとも1つのCl原子を有する芳香族ポリスルホン(a)と、末端に少なくとも1つのヒドロキシ基を有するポリオキシアルキレン化合物(b)と、を反応させる工程(ブロックコポリマー製造工程)を含むものであってよい。 The method for producing a block copolymer of the embodiment is a step of reacting an aromatic polysulfone (a) having at least one Cl atom at the end with a polyoxyalkylene compound (b) having at least one hydroxy group at the end ( It may include a block copolymer manufacturing process).
 実施形態のブロックコポリマーの製造方法は、予め重合された芳香族ポリスルホン(a)とポリオキシアルキレン化合物(b)と、を反応させることを意図し、芳香族ポリスルホン(a)を予め準備する工程をさらに含んでいてもよい。 The method for producing a block copolymer of the embodiment is intended to react a prepolymerized aromatic polysulfone (a) with a polyoxyalkylene compound (b), and a step of preparing the aromatic polysulfone (a) in advance is performed. It may also be included.
 実施形態のブロックコポリマーの製造方法は、末端に少なくとも1つのCl原子を有する芳香族ポリスルホン(a)を予め準備する工程と、
 前記芳香族ポリスルホン(a)と、末端に少なくとも1つのヒドロキシ基を有するポリオキシアルキレン化合物(b)と、を反応させる工程(ブロックコポリマー製造工程)を含むものであってよい。
The method for producing the block copolymer of the embodiment includes a step of preparing an aromatic polysulfone (a) having at least one Cl atom at the terminal in advance and a step of preparing the aromatic polysulfone (a) in advance.
It may include a step (block copolymer manufacturing step) of reacting the aromatic polysulfone (a) with a polyoxyalkylene compound (b) having at least one hydroxy group at the terminal.
 前記芳香族ポリスルホン(a)を予め準備する工程とは、芳香族ポリスルホン(a)を入手していればよく、単に、市販の芳香族ポリスルホン(a)を用意することも含まれる。
 又は、実施形態のブロックコポリマーの製造方法は、芳香族ポリスルホン(a)を製造する工程(芳香族ポリスルホン製造工程)を、さらに含んでいてもよい。
The step of preparing the aromatic polysulfone (a) in advance includes obtaining the aromatic polysulfone (a) and simply preparing a commercially available aromatic polysulfone (a).
Alternatively, the method for producing the block copolymer of the embodiment may further include a step of producing the aromatic polysulfone (a) (aromatic polysulfone production step).
 実施形態のブロックコポリマーの製造方法は、末端に少なくとも1つのCl原子を有する芳香族ポリスルホン(a)を、重縮合反応により得る工程と、
 前記芳香族ポリスルホン(a)と、末端に少なくとも1つのヒドロキシ基を有するポリオキシアルキレン化合物(b)と、を反応させる工程(ブロックコポリマー製造工程)を含むものであってよい。
The method for producing a block copolymer of the embodiment includes a step of obtaining an aromatic polysulfone (a) having at least one Cl atom at the terminal by a polycondensation reaction.
It may include a step (block copolymer manufacturing step) of reacting the aromatic polysulfone (a) with a polyoxyalkylene compound (b) having at least one hydroxy group at the terminal.
 芳香族ポリスルホン(a)の一例として、例えば、下記一般式(a1)で表される化合物と、下記一般式(a2)で表される化合物との重縮合反応により、下記一般式(a-1)で表される化合物を得ることができる。 As an example of the aromatic polysulfone (a), for example, by a polycondensation reaction between a compound represented by the following general formula (a1) and a compound represented by the following general formula (a2), the following general formula (a-1) ) Can be obtained.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000009
[式(a1)中、R、R、n1及びn2は、上記式(1)におけるものと同一の意味を表す。] Wherein (a1), R 1, R 2, n1 and n2 represent the same meaning as in the formula (1). ]
Figure JPOXMLDOC01-appb-C000010
Figure JPOXMLDOC01-appb-C000010
[式(a2)中、R、R、n1及びn2は、上記式(1)におけるものと同一の意味を表す。] Wherein (a2), R 1, R 2, n1 and n2 represent the same meaning as in the formula (1). ]
 上記の重縮合反応で得られる芳香族ポリスルホン(a)として、下記一般式(a-1)で表される化合物が挙げられる。 Examples of the aromatic polysulfone (a) obtained by the above polycondensation reaction include compounds represented by the following general formula (a-1).
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
[式(a-1)中、R、R、n1、n2及びnは、上記式(I)におけるものと同一の意味を表す。
 -X及び-Xは、それぞれ独立に、-OH又は-Clであり、-X及び-Xの少なくとも一方は、-Clである。]
Wherein (a-1), R 1 , R 2, n1, n2 and n represent the same meaning as in the formula (I).
-X 1 and -X 2 are independently -OH or -Cl, and at least one of -X 1 and -X 2 is -Cl. ]
 nは、芳香族ポリスルホン(a-1)の有する上記構造単位の繰り返し数である。 N is the number of repetitions of the structural unit of the aromatic polysulfone (a-1).
 芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)との反応において、芳香族ポリスルホン(a)としては、上記で説明したものが挙げられる。 In the reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b), examples of the aromatic polysulfone (a) include those described above.
 原料として使用される上記芳香族ポリスルホン(a)の重量平均分子量の値は、製造されるブロックコポリマーの重量平均分子量に応じて適宜定めればよい。
 製造されるブロックコポリマーの分子量を向上させる観点から、原料として使用される上記の芳香族ポリスルホン(a)の重量平均分子量は、30000以上であってもよく、30000以上70000以下であってもよく、40000以上65000以下であってもよい。
The value of the weight average molecular weight of the aromatic polysulfone (a) used as a raw material may be appropriately determined according to the weight average molecular weight of the produced block copolymer.
From the viewpoint of improving the molecular weight of the produced block copolymer, the weight average molecular weight of the above aromatic polysulfone (a) used as a raw material may be 30,000 or more, 30,000 or more and 70,000 or less. It may be 40,000 or more and 65,000 or less.
 ポリオキシアルキレン化合物(b)としては、例えば、下記一般式(b-1)で表される化合物が挙げられる。 Examples of the polyoxyalkylene compound (b) include compounds represented by the following general formula (b-1).
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
[式(b-1)中、R及びmは、上記式(I)におけるものと同一の意味を表す。
 -Yは、炭素数1~3のアルキル基である。]
Wherein (b-1), R 3 and m represent the same meaning as in the formula (I).
-Y is an alkyl group having 1 to 3 carbon atoms. ]
 上記-Yの炭素数1~3のアルキル基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基等が挙げられ、メチル基が好ましい。 Examples of the alkyl group having 1 to 3 carbon atoms of —Y include a methyl group, an ethyl group, an n-propyl group, an isopropyl group and the like, and a methyl group is preferable.
 芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)と、の反応の一例として、一般式(a-1)で表される化合物と、一般式(b-1)で表される化合物と、の反応を例示できる。当該反応は、下記反応式で表すことができる。当該反応により、一例として一般式(I-1)で表されるブロックコポリマーが得られる。 As an example of the reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b), a compound represented by the general formula (a-1) and a compound represented by the general formula (b-1) The reaction of, can be exemplified. The reaction can be represented by the following reaction formula. By this reaction, as an example, a block copolymer represented by the general formula (I-1) is obtained.
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
[式中、R、R、R、n1、n2、n、m、X、X及びYは、上記式(a-1)、式(b-1)及び式(I)におけるものと同一の意味を表す。] [In the formula, R 1 , R 2 , R 3 , n1, n2, n, m, X 1 , X 2 and Y are in the above formula (a-1), formula (b-1) and formula (I). Represents the same meaning as. ]
 芳香族ポリスルホン(a)は、1種を単独で用いてもよく、2種以上を併用してもよい。 Aromatic polysulfone (a) may be used alone or in combination of two or more.
 ポリオキシアルキレン化合物(b)は、1種を単独で用いてもよく、2種以上を併用してもよい。 As the polyoxyalkylene compound (b), one type may be used alone, or two or more types may be used in combination.
 末端に少なくとも1つのヒドロキシ基を有するポリオキシアルキレン化合物(b)の使用量としては、末端に少なくとも1つのCl原子を有する芳香族ポリスルホン(a)1モルに対して、0.4~2.0モルが好ましく、0.4~1.5モルがより好ましく、0.5~1.2モルがさらに好ましく、0.5~0.9モルが特に好ましい。上記使用量の範囲内であると、得られるブロックコポリマーのGPCで測定したMwを、より一層向上可能であることから好ましい。
 ここで、末端に少なくとも1つのCl原子を有する芳香族ポリスルホン(a)としては、前記一般式(a-1)で表される化合物が好ましい。末端に少なくとも1つのヒドロキシ基を有するポリオキシアルキレン化合物(b)としては、前記一般式(b-1)で表される化合物が好ましい。
The amount of the polyoxyalkylene compound (b) having at least one hydroxy group at the terminal is 0.4 to 2.0 with respect to 1 mol of the aromatic polysulfone (a) having at least one Cl atom at the end. It is preferably mol, more preferably 0.4 to 1.5 mol, even more preferably 0.5 to 1.2 mol, and particularly preferably 0.5 to 0.9 mol. When the amount is within the above range, the Mw measured by GPC of the obtained block copolymer can be further improved, which is preferable.
Here, as the aromatic polysulfone (a) having at least one Cl atom at the terminal, the compound represented by the general formula (a-1) is preferable. As the polyoxyalkylene compound (b) having at least one hydroxy group at the terminal, the compound represented by the general formula (b-1) is preferable.
 芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)と、の反応は、触媒の塩基として炭酸のアルカリ金属塩及び/又はアルカリ金属重炭酸塩を用いて行われることが好ましい。また、当該反応は溶媒として有機溶媒中で行われることが好ましく、塩基として炭酸のアルカリ金属塩を用い、且つ有機溶媒中で行われることがより好ましい。 The reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b) is preferably carried out using an alkali metal carbonate and / or an alkali metal bicarbonate as the base of the catalyst. Further, the reaction is preferably carried out in an organic solvent as a solvent, and more preferably carried out in an organic solvent using an alkali metal salt of carbonic acid as a base.
 炭酸のアルカリ金属塩は、正塩である炭酸アルカリ(アルカリ金属の炭酸塩)であってもよいし、酸性塩である重炭酸アルカリ(炭酸水素アルカリ、アルカリ金属の炭酸水素塩)であってもよいし、これら(炭酸アルカリ及び重炭酸アルカリ)の混合物であってもよい。好ましい炭酸アルカリの例としては、炭酸ナトリウム、炭酸カリウム等が挙げられる。好ましい重炭酸アルカリの例としては、重炭酸ナトリウム(炭酸水素ナトリウム)、重炭酸カリウム(炭酸水素カリウム)等が挙げられる。 The alkali metal salt of carbonic acid may be an alkali carbonate (alkali metal carbonate) which is a positive salt, or a bicarbonate alkali (hydrogen carbonate alkali, alkali metal hydrogen carbonate) which is an acidic salt. It may be a mixture of these (alkali carbonate and alkali bicarbonate). Examples of preferable alkali carbonate include sodium carbonate, potassium carbonate and the like. Examples of preferable alkali bicarbonate include sodium bicarbonate (sodium hydrogen carbonate), potassium bicarbonate (potassium hydrogen carbonate) and the like.
 炭酸のアルカリ金属塩の配合比率としては、ポリオキシアルキレン化合物(b)1モルに対して、アルカリ金属として、0.90モル以上1.30モル以下であることが好ましく、0.95モル以上1.20モル以下であることがより好ましい。 The blending ratio of the alkali metal salt of carbonic acid is preferably 0.90 mol or more and 1.30 mol or less as the alkali metal with respect to 1 mol of the polyoxyalkylene compound (b), and 0.95 mol or more and 1 mol. More preferably, it is 20 mol or less.
 有機溶媒としては、非プロトン性極性溶媒が挙げられ、前記非プロトン性極性溶媒の1気圧下での沸点が250℃以下であることが好ましい。沸点が250℃以下である非プロトン性極性溶媒を用いることで、比較的低い温度で非プロトン性極性溶媒を還流させ副生成物を除去しながら反応を進行させることができる。 Examples of the organic solvent include an aprotic polar solvent, and the boiling point of the aprotic polar solvent under 1 atm is preferably 250 ° C. or lower. By using an aprotic polar solvent having a boiling point of 250 ° C. or lower, the reaction can proceed while refluxing the aprotic polar solvent at a relatively low temperature to remove by-products.
 前記非プロトン性極性溶媒の沸点は250℃以下であることが好ましく、230℃以下であってもよく、210℃以下であってもよい。前記非プロトン性極性溶媒の沸点は、120℃以上であってもよく、140℃以上であってもよく、150℃以上であってもよい。
 上記の非プロトン性極性溶媒の沸点の数値範囲の一例としては、120℃以上230℃以下であってもよく、140℃以上210℃以下であってもよく、150℃以上210℃以下であってもよい。
The boiling point of the aprotic polar solvent is preferably 250 ° C. or lower, and may be 230 ° C. or lower, or 210 ° C. or lower. The boiling point of the aprotic polar solvent may be 120 ° C. or higher, 140 ° C. or higher, or 150 ° C. or higher.
As an example of the numerical range of the boiling point of the above-mentioned aprotic polar solvent, it may be 120 ° C. or higher and 230 ° C. or lower, 140 ° C. or higher and 210 ° C. or lower, or 150 ° C. or higher and 210 ° C. or lower. May be good.
 沸点が250℃以下の非プロトン性極性溶媒としてはジメチルスルホン、ジエチルスルホン等のスルホン系溶媒、N、N-ジメチルアセトアミド、N-メチル-ピロリドン、N-エチル-ピロリドン、N-メチルカプロラクタム、N、N-ジメチルホルムアミド、N、N-ジエチルホルムアミド、N、N-ジエチルアセトアミド、N-メチルプロピオンアミド、ジメチルイミダゾリジノン等のアミド系溶媒、γ-ブチルラクトン、β-ブチルラクトン等のラクトン系溶媒、メチルスルホキシド、メチルフェニルスルホキシド等のスルホキシド系溶媒、テトラメチルホスホリックアミド、ヘキサメチルホスホリックアミド等のセロソルブ系溶媒、エチルセロソルブアセテート、メチルセロソルブアセテート等のセロソルブ系溶媒等が挙げられる。 Examples of the aprotonic polar solvent having a boiling point of 250 ° C. or lower include sulfonic solvents such as dimethylsulfone and diethylsulfone, N, N-dimethylacetamide, N-methyl-pyrrolidone, N-ethyl-pyrrolidone, N-methylcaprolactam, N, Amide solvents such as N-dimethylformamide, N, N-diethylformamide, N, N-diethylacetamide, N-methylpropionamide, dimethylimidazolidinone, lactone solvents such as γ-butyllactone and β-butyllactone, Examples thereof include sulfoxide-based solvents such as methyl sulfoxide and methylphenyl sulfoxide, cellosolve-based solvents such as tetramethylphosphoric amide and hexamethylphosphoric amide, and cellosolve-based solvents such as ethyl cellosolve acetate and methyl cellosolve acetate.
 芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)と、の反応において、水が副生する場合があり、この水の除去を目的として、溶媒に“水と共沸混合物を形成する溶媒”が添加される場合がある。 In the reaction of the aromatic polysulfone (a) and the polyoxyalkylene compound (b), water may be produced as a by-product, and for the purpose of removing this water, a solvent "a solvent that forms an azeotropic mixture with water" is used. May be added.
 しかし、本実施形態の製造方法においては、芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)と、の反応において、該反応に使用される溶媒の総量に対する、水と共沸混合物を形成する溶媒の割合は、0~20質量%であることが好ましく、0~10質量%であることがより好ましく、0~3質量%であることがさらに好ましく、該反応に使用される溶媒が水と共沸混合物を形成する溶媒を実質的に含有しないことが特に好ましい。
 芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)と、の反応において、水と共沸混合物を形成する溶媒の使用量を低減することにより、製造されるブロックコポリマーの分子量を向上可能である。
However, in the production method of the present embodiment, in the reaction of the aromatic polysulfone (a) and the polyoxyalkylene compound (b), an azeotropic mixture with water is formed with respect to the total amount of the solvent used in the reaction. The proportion of the solvent to be used is preferably 0 to 20% by mass, more preferably 0 to 10% by mass, further preferably 0 to 3% by mass, and the solvent used for the reaction is water. It is particularly preferred that it contains substantially no solvent to form an azeotropic mixture with.
By reducing the amount of solvent used to form an azeotropic mixture with water in the reaction of aromatic polysulfone (a) and polyoxyalkylene compound (b), the molecular weight of the block copolymer produced can be increased. be.
 水と共沸混合物を形成する溶媒の沸点は、250℃以下であることが好ましく、230℃以下であってもよく、210℃以下であってもよい。水と共沸混合物を形成する溶媒の沸点は40℃以上であってもよく、80℃以上であってもよく、100℃以上であってもよい。
 上記の水と共沸混合物を形成する溶媒の沸点の数値範囲の一例としては、40℃以上250℃以下であってもよく、80℃以上230℃以下であってもよく、100℃以上210℃以下であってもよい。
The boiling point of the solvent forming the azeotropic mixture with water is preferably 250 ° C. or lower, and may be 230 ° C. or lower, or 210 ° C. or lower. The boiling point of the solvent forming the azeotropic mixture with water may be 40 ° C. or higher, 80 ° C. or higher, or 100 ° C. or higher.
As an example of the numerical range of the boiling point of the solvent forming the azeotropic mixture with water, it may be 40 ° C. or higher and 250 ° C. or lower, 80 ° C. or higher and 230 ° C. or lower, and 100 ° C. or higher and 210 ° C. It may be as follows.
 沸点が250℃以下の、水と共沸混合物を形成する溶媒としては、ベンゼン、クロロベンゼン、トルエン、キシレン、エチルベンゼン、メチルイソブチルケトン、ヘキサン、シクロヘキサン等が挙げられる。 Examples of the solvent for forming an azeotropic mixture with water having a boiling point of 250 ° C. or lower include benzene, chlorobenzene, toluene, xylene, ethylbenzene, methyl isobutyl ketone, hexane, cyclohexane and the like.
 芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)との反応は、250℃以下で行うことが好ましい。250℃以下の比較的低い温度で反応を行うことで、エネルギー負荷を低く抑えることができる。反応の温度は、250℃以下が好ましく、230℃以下であってもよく、210℃以下であってもよい。反応の温度の下限は、限定されないが、100℃以上であってもよく、120℃以上であってもよく、140℃以上であってもよい。
 上記の芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)との反応温度の数値範囲の一例としては、100℃以上250℃以下であってもよく、120℃以上230℃以下であってもよく、140℃以上210℃以下であってもよい。
The reaction between the aromatic polysulfone (a) and the polyoxyalkylene compound (b) is preferably carried out at 250 ° C. or lower. By carrying out the reaction at a relatively low temperature of 250 ° C. or lower, the energy load can be kept low. The reaction temperature is preferably 250 ° C. or lower, may be 230 ° C. or lower, or may be 210 ° C. or lower. The lower limit of the reaction temperature is not limited, but may be 100 ° C. or higher, 120 ° C. or higher, or 140 ° C. or higher.
As an example of the numerical range of the reaction temperature between the aromatic polysulfone (a) and the polyoxyalkylene compound (b), the temperature may be 100 ° C. or higher and 250 ° C. or lower, or 120 ° C. or higher and 230 ° C. or lower. It may be 140 ° C. or higher and 210 ° C. or lower.
 次いで、芳香族ポリスルホン(a)と、ポリオキシアルキレン化合物(b)との反応で得られた反応混合物から、未反応の塩基、副生成物(塩基としてアルカリ金属塩を用いた場合には、ハロゲン化アルカリ)、及び有機溶媒を、濾過、抽出、遠心分離等で除去して、ブロックコポリマーを反応混合物から分離することができる。 Next, from the reaction mixture obtained by the reaction of the aromatic polysulfone (a) and the polyoxyalkylene compound (b), unreacted bases and by-products (halogen when an alkali metal salt is used as the base). Alkali chemicals) and organic solvents can be removed by filtration, extraction, centrifugation, etc. to separate the block copolymer from the reaction mixture.
 有機溶媒の除去は、前記溶液から直接、有機溶媒を留去することにより行ってもよいし、前記溶液をブロックコポリマーの貧溶媒と混合して、ブロックコポリマーを析出させ、濾過や遠心分離等で分離することにより行ってもよい。有機溶媒を所定量残存させてもよい。 The organic solvent may be removed by distilling off the organic solvent directly from the solution, or the solution may be mixed with a poor solvent of the block copolymer to precipitate the block copolymer, which may be filtered or centrifuged. It may be done by separating. A predetermined amount of the organic solvent may remain.
 ブロックコポリマーの貧溶媒の例としては、メタノール、エタノール、2-プロパノール、アセトン、ヘキサン、ヘプタン及び水が挙げられ、安価であることから好ましくは水及びメタノールが挙げられる。
 本実施形態において、ブロックコポリマーの貧溶媒は、1種を単独で用いてもよいし、2種以上を併用してもよい。
Examples of poor solvents for block copolymers include methanol, ethanol, 2-propanol, acetone, hexane, heptane and water, with preference given to water and methanol due to their low cost.
In the present embodiment, one type of poor solvent for the block copolymer may be used alone, or two or more types may be used in combination.
 次に実施例を示して本発明をさらに詳細に説明するが、本発明は以下の実施例に限定されるものではない。 Next, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to the following Examples.
<ブロックコポリマー等における、MnおよびMwの測定、Mw/Mnの算出>
 各ポリマー(各ブロックコポリマー及び原料ポリエチレングリコールモノメチルエーテル)における、重量平均分子量(Mw)、数平均分子量(Mn)および多分散度(Mw/Mn)は、GPC測定により求めた。なお、MnおよびMwはいずれも2回測定し、その平均値を求めて、それぞれMnおよびMwとし、Mw/Mnの平均値を求めた。
[測定条件]
 試料:10mM臭化リチウム含有N,N-ジメチルホルムアミド溶液1mLに対し、芳香族ポリスルホン0.002gを配合
 試料注入量:100μL
 カラム(固定相):東ソー株式会社製「TSKgel GMHHR-H」(7.8mmφ×300mm)を2本直列に連結
 カラム温度:40℃
 溶離液(移動相):10mM臭化リチウム含有N,N-ジメチルホルムアミド
 溶離液流量:0.8mL/分
 検出器:示差屈折率計(RI)+光散乱光度計(LS)
 標準試薬:ポリスチレン
 分子量算出法:光散乱光度計(LS)の測定結果から絶対分子量を算出
<Measurement of Mn and Mw and calculation of Mw / Mn in block copolymers, etc.>
The weight average molecular weight (Mw), number average molecular weight (Mn), and polydispersity (Mw / Mn) of each polymer (each block copolymer and raw material polyethylene glycol monomethyl ether) were determined by GPC measurement. Both Mn and Mw were measured twice, and the average value thereof was calculated as Mn and Mw, respectively, and the average value of Mw / Mn was obtained.
[Measurement condition]
Sample: 0.002 g of aromatic polysulfone is mixed with 1 mL of N, N-dimethylformamide solution containing 10 mM lithium bromide Sample injection amount: 100 μL
Column (stationary phase): Two "TSKgel GMHHR-H" (7.8 mmφ x 300 mm) manufactured by Tosoh Corporation are connected in series. Column temperature: 40 ° C.
Eluent (mobile phase): N, N-dimethylformamide containing 10 mM lithium bromide Eluent flow rate: 0.8 mL / min Detector: Differential refractive index meter (RI) + light scattering photometric meter (LS)
Standard reagent: Polystyrene Molecular weight calculation method: Absolute molecular weight is calculated from the measurement results of a light scattering photometer (LS).
 <溶液H-NMRの測定>
 NMR換算分子量を算出するための溶液H-NMR測定には、測定対象のブロックコポリマーの濃度が50mg/mlとなるよう重ジメチルスルホキシドに溶解させた試料を用いた。測定条件は次のとおりである。
< Measurement of solution 1 1 H-NMR>
Solution 1 for calculating NMR-equivalent molecular weight For 1 H-NMR measurement, a sample dissolved in deuterated dimethylsulfoxide was used so that the concentration of the block copolymer to be measured was 50 mg / ml. The measurement conditions are as follows.
 測定装置:PS400WB(バリアン製)
 静磁場強度:9.4テスラ(共鳴周波数:400MHz(H))
 スピニング:16Hz
 繰り返し時間:1.5s
 積算回数:128回
 温度:40℃
 化学シフト標準物質:テトラメチルシラン
Measuring device: PS400WB (manufactured by Varian)
Static magnetic field strength: 9.4 Tesla (resonance frequency: 400 MHz ( 1 H))
Spinning: 16Hz
Repeat time: 1.5s
Number of integrations: 128 times Temperature: 40 ° C
Chemical shift reference material: Tetramethylsilane
<PESブロック及びPAOブロックのNMR換算分子量の算出>
 測定対象のブロックコポリマーが含む、ポリエーテルスルホン(PES)ブロック及びポリオキシアルキレン(PAO)ブロックのNMR換算数平均分子量(ブロックのMn)は、溶液H-NMR測定により取得されたスペクトルに基づき算出した。
<Calculation of NMR-equivalent molecular weight of PES block and PAO block>
The NMR equivalent number average molecular weight (Mn of the block) of the polyether sulfone (PES) block and the polyoxyalkylene (PAO) block contained in the block copolymer to be measured is calculated based on the spectrum obtained by the solution 1 H-NMR measurement. bottom.
 ブロックコポリマーが含む、PAOブロックのMnは、NMR換算数平均分子量M PAOとして、PAOの主鎖に対応するピーク強度IPAO-Mainと、PESに結合したPAOの結合部位に対応するピーク強度IPAO-Linkの比率(IPAO-Main/IPAO-Link)から算出したPAOの繰り返し単位数nPAOに、PAOの繰り返し単位あたりの分子量を乗じた値から算出した。本実施例においては、nPAOは下記式により算出した。
(IPAO-Main/IPAO-Link)=(4×nPAO)/4
The Mn of the PAO block contained in the block copolymer has a peak intensity I PAO-Main corresponding to the main chain of PAO and a peak intensity I corresponding to the binding site of PAO bound to PES as an NMR equivalent number average molecular weight M n PAO. It was calculated from the value obtained by multiplying the number of repeating units of PAO n PAO calculated from the ratio of PAO-Link (I PAO-Main / I PAO-Link ) by the molecular weight per repeating unit of PAO. In this example, n PAO was calculated by the following formula.
(I PAO-Main / I PAO-Link ) = (4 × n PAO ) / 4
 ブロックコポリマーが含む、PESブロックのMnは、NMR換算分子量M PESとして、PESの主鎖に対応するピーク強度IPES-Mainと、PAOに結合したPESの結合部位に対応するピーク強度IPES-Linkの比率(IPES-Main/IPES-Link)から算出するPESの繰り返し単位数nPESに、PESの繰り返し単位あたりの分子量を乗じた値から算出した。PAOブロックとしてPEGブロックを含む本実施例に係るブロックコポリマーにおいては、nPESは下記式により算出した。
(IPES-Main/IPES-Link)=[{(4×nPES)+4}-4]/4
The Mn of the PES block contained in the block copolymer has a peak intensity I PES-Main corresponding to the main chain of PES and a peak intensity I PES- corresponding to the binding site of PES bound to PAO as an NMR-equivalent molecular weight M n PES. It was calculated from the value obtained by multiplying the number of repeating units of PES n PES calculated from the ratio of Link (IPES-Main / I PES-Link ) by the molecular weight per repeating unit of PES. In the block copolymer according to this example, which contains a PEG block as a PAO block, n PES was calculated by the following formula.
(I PES-Main / I PES-Link ) = [{(4 × n PES ) + 4} -4] / 4
 ブロックコポリマーが含む、PAOブロックのMn/PESブロックのMnで表される比は、M PAOをM PESで除することにより算出した。 The Mn / PES block Mn ratio of the PAO block contained in the block copolymer was calculated by dividing M n PAO by M n PES.
<ブロックコポリマー等のガラス転移温度(Tg)の測定>
ガラス転移温度は、JIS-K7121に準じた方法(示差走査熱量測定(DSC))にて測定し、10℃/分で400℃まで昇温した時のガラス転移温度を測定した。
<Measurement of glass transition temperature (Tg) of block copolymers, etc.>
The glass transition temperature was measured by a method according to JIS-K7121 (differential scanning calorific value measurement (DSC)), and the glass transition temperature when the temperature was raised to 400 ° C. at 10 ° C./min was measured.
<ブロックコポリマー等の1%質量減少温度の測定>
 1%質量減少温度は、昇温速度10℃/分で800℃まで昇温し、200℃における試料の質量を基準として1%質量減少したときの温度を示した。
<Measurement of 1% mass reduction temperature of block copolymers, etc.>
The 1% mass reduction temperature indicates the temperature at which the temperature was raised to 800 ° C. at a heating rate of 10 ° C./min and the mass was reduced by 1% based on the mass of the sample at 200 ° C.
<フィルムの接触角の測定>
 平滑なガラス板にフィルムを張り付け、その上に純水2μLを滴下した。着滴から10秒後の接触角を測定した。
 測定装置:DM-501(協和界面科学製)
 温度:23℃
 測定方法:θ/2法
<Measurement of film contact angle>
A film was attached to a smooth glass plate, and 2 μL of pure water was dropped onto the film. The contact angle was measured 10 seconds after the droplet was applied.
Measuring device: DM-501 (manufactured by Kyowa Interface Science)
Temperature: 23 ° C
Measurement method: θ / 2 method
<フィルムの引張特性の測定>
 JIS K7127に準拠して、引張強さと引張破断伸びを測定した。厚さ30μmのフィルムを打抜きして得たJIS K6251 ダンベル状3号形の試験片を用いて、オートグラフにて、つかみ間隔50mm、引張速度5mm/分で引張り、23℃、相対湿度50%の雰囲気下における、試験片が切断(破断)したときの、引張強さ(引張り荷重値を試験片の断面積で除した値)及び引張伸び(%)を測定した。
 引張伸びは次の式によって算出した。引張伸びが大きいほど、フィルム伸度が大きいことを意味する。
 引張伸び(%)=(L-Lo)/Lo×100
Lo:試験前のつかみ間隔(50mm)、L:破断時のつかみ間隔(mm)
<Measurement of film tensile properties>
Tensile strength and tensile elongation at break were measured according to JIS K7127. Using a JIS K6251 dumbbell-shaped No. 3 test piece obtained by punching a film with a thickness of 30 μm, the test piece was pulled by an autograph at a grip interval of 50 mm and a tensile speed of 5 mm / min, at 23 ° C. and a relative humidity of 50%. The tensile strength (the value obtained by dividing the tensile load value by the cross-sectional area of the test piece) and the tensile elongation (%) when the test piece was cut (broken) in an atmosphere were measured.
The tensile elongation was calculated by the following formula. The larger the tensile elongation, the larger the film elongation.
Tensile elongation (%) = (L-Lo) / Lo × 100
Lo: Gripping interval before test (50 mm), L: Gripping interval at break (mm)
<ブロックコポリマーの製造>
[実験例1]
 撹拌機、窒素導入管、温度計、及び先端に受器を付したコンデンサーを備えた重合槽に、ポリエチレングリコールモノメチルエーテル(東京化成製、重量平均分子量570)1.5g、炭酸カリウム0.46g及びN-メチル-2-ピロリドン(NMP)150gを混合し、100℃に昇温後、ポリエーテルスルホン(住友化学株式会社製、スミカエクセルPES 5900P,ゲル浸透クロマトグラフィーによりDMF溶媒で測定された絶対重量平均分子量30000以上)100gを加えた。ポリエーテルスルホンが溶解した後、200℃で加熱し14時間反応させた。次いで、得られた反応混合溶液を、NMPで希釈し、室温まで冷却して、未反応の炭酸カリウム及び副生した塩化カリウムを析出させた。上述の溶液を水中に滴下し、芳香族ポリスルホンを析出させ、ろ過で不要なNMPを除去することにより、析出物を得た。
 得られた析出物を、入念にメタノールおよび水で繰返し洗浄し、150℃で加熱乾燥させることにより、ポリエチレングリコールを末端に有する芳香族ポリスルホンブロックコポリマーを得た。
<Manufacturing of block copolymers>
[Experimental Example 1]
In a polymerization tank equipped with a stirrer, a nitrogen introduction tube, a thermometer, and a condenser with a receiver at the tip, 1.5 g of polyethylene glycol monomethyl ether (manufactured by Tokyo Kasei, weight average molecular weight 570), 0.46 g of potassium carbonate, and 150 g of N-methyl-2-pyrrolidone (NMP) is mixed, the temperature is raised to 100 ° C., and then the absolute weight measured with a DMF solvent by polyether sulfone (manufactured by Sumitomo Chemical Co., Ltd., Sumika Excel PES 5900P, gel permeation chromatography). (Average molecular weight of 30,000 or more) 100 g was added. After the polyether sulfone was dissolved, it was heated at 200 ° C. and reacted for 14 hours. The resulting reaction mixture was then diluted with NMP and cooled to room temperature to precipitate unreacted potassium carbonate and by-product potassium chloride. The above solution was added dropwise to water to precipitate aromatic polysulfone, and unnecessary NMP was removed by filtration to obtain a precipitate.
The obtained precipitate was carefully washed repeatedly with methanol and water and dried by heating at 150 ° C. to obtain an aromatic polysulfone block copolymer having polyethylene glycol at the end.
[実験例2~4]
 上記で用いたポリエチレングリコールモノメチルエーテルの分子量及び配合量を、表1に記載のとおり変更(東京化成製、重量平均分子量1000,東京化成製、重量平均分子量4600)した以外は、上記の実験例1と同様にして、ポリエチレングリコールを末端に有する芳香族ポリスルホンブロックコポリマーを得た。
[Experimental Examples 2-4]
Experimental Example 1 above, except that the molecular weight and compounding amount of the polyethylene glycol monomethyl ether used above were changed as shown in Table 1 (Tokyo Kasei, weight average molecular weight 1000, Tokyo Kasei, weight average molecular weight 4600). In the same manner as above, an aromatic polysulfone block copolymer having polyethylene glycol at the end was obtained.
[実験例5]
 上記のポリエーテルスルホン(住友化学株式会社製、スミカエクセルPES 5900P)を実験例5の試料とした。
[Experimental Example 5]
The above-mentioned polyether sulfone (Sumika Excel PES 5900P, manufactured by Sumitomo Chemical Co., Ltd.) was used as a sample of Experimental Example 5.
 上記の実験例1~2が、本発明を適用した実施例に該当する。 Experimental Examples 1 and 2 above correspond to Examples to which the present invention is applied.
Figure JPOXMLDOC01-appb-T000014
Figure JPOXMLDOC01-appb-T000014
 実験例1~4の芳香族ポリスルホンブロックコポリマー、及び実験例5の芳香族ポリスルホンについて、重量平均絶対分子量(Mw)、多分散度(Mw/Mn)、PESブロックのMn、PEGブロックのMn、PEGブロックのMn/PESブロックのMn、Tg、1%質量減少温度の値を測定した。 For the aromatic polysulfone block copolymers of Experimental Examples 1 to 4 and the aromatic polysulfone of Experimental Example 5, weight average absolute molecular weight (Mw), polydispersity (Mw / Mn), Mn of PES block, Mn of PEG block, PEG. The values of Mn, Tg and 1% mass reduction temperature of the Mn / PES block of the block were measured.
<キャストフィルムの作製>
 加熱容器内で、上記の実験例1~4の芳香族ポリスルホンブロックコポリマー、又は実験例5の芳香族ポリスルホン18質量部およびNMP82質量部を混合し、80℃で2時間撹拌することで、淡黄色の溶液を得た。これを、厚さ3mmのガラス板の一面にフィルムアプリケーターを用いて塗布した後、高温熱風乾燥器を用いて60℃で乾燥することで、塗膜を形成した。この塗膜を、窒素を流しながら、250℃で熱処理することで、ガラス板上に厚さ30μmのフィルムを形成した。このフィルムをガラス板から剥離することにより、フィルムを得た。
 得られたフィルムについて、水との接触角、引張強さ及び引張伸びの値を測定した。
<Making cast film>
In a heating container, 18 parts by mass of the aromatic polysulfone block copolymer of Experimental Examples 1 to 4 or 18 parts by mass of aromatic polysulfone and 82 parts by mass of NMP of Experimental Example 5 are mixed and stirred at 80 ° C. for 2 hours to obtain a pale yellow color. Solution was obtained. This was applied to one surface of a glass plate having a thickness of 3 mm using a film applicator, and then dried at 60 ° C. using a high-temperature hot air dryer to form a coating film. This coating film was heat-treated at 250 ° C. while flowing nitrogen to form a film having a thickness of 30 μm on a glass plate. A film was obtained by peeling this film from a glass plate.
For the obtained film, the contact angle with water, the tensile strength and the tensile elongation were measured.
 上記の測定結果を表2及び表3に示す。 The above measurement results are shown in Tables 2 and 3.
Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015
 表2に示される結果から、実験例1~2の芳香族ポリスルホンブロックコポリマーから得られたフィルムは、実験例5の芳香族ポリスルホンから得られたフィルムよりも、接触角の値が小さく、親水性が向上していることが示された。 From the results shown in Table 2, the films obtained from the aromatic polysulfone block copolymers of Experimental Examples 1 and 2 have smaller contact angle values and are hydrophilic than the films obtained from the aromatic polysulfone of Experimental Example 5. Was shown to be improving.
Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016
 表3に示される結果から、PEGブロックMn/PESブロックMnの値が、0.005~0.030を満たす実験例1~2の芳香族ポリスルホンブロックコポリマーは、当該値を満たしていない実験例3~4の芳香族ポリスルホンブロックコポリマーよりも、Tg及び1%質量減少温度の値が高く、熱的特性に優れることが示された。 From the results shown in Table 3, the aromatic polysulfone block copolymers of Experimental Examples 1 and 2 in which the values of PEG block Mn / PES block Mn satisfy 0.005 to 0.030 do not satisfy the values in Experimental Example 3. It was shown that the values of Tg and 1% mass reduction temperature were higher than those of the aromatic polysulfone block copolymers of -4, and the thermal properties were excellent.
 表3に示される結果から、PEGブロックMn/PESブロックMnの値が、0.005~0.030を満たす実験例1~2の芳香族ポリスルホンブロックコポリマーは、当該値を満たしていない実験例3~4の芳香族ポリスルホンブロックコポリマーよりも、引張強さ及び引張伸びの値が高く、機械的特性に優れることが示された。 From the results shown in Table 3, the aromatic polysulfone block copolymers of Experimental Examples 1 and 2 in which the values of PEG block Mn / PES block Mn satisfy 0.005 to 0.030 do not satisfy the values in Experimental Example 3. It was shown that the values of tensile strength and tensile elongation were higher and the mechanical properties were superior to those of the aromatic polysulfone block copolymers of ~ 4.
 各実施形態における各構成及びそれらの組み合わせ等は一例であり、本発明の趣旨を逸脱しない範囲で、構成の付加、省略、置換、およびその他の変更が可能である。また、本発明は各実施形態によって限定されることはなく、請求項(クレーム)の範囲によってのみ限定される。 Each configuration in each embodiment and a combination thereof are examples, and the configuration can be added, omitted, replaced, and other changes are possible without departing from the spirit of the present invention. Moreover, the present invention is not limited to each embodiment, but is limited only to the scope of claims.

Claims (9)

  1.  芳香族ポリスルホンブロック(A)及びポリオキシアルキレンブロック(B)を含むブロックコポリマーであって、
     H-NMRにより算出された、前記ポリオキシアルキレンブロック(B)の数平均分子量/前記芳香族ポリスルホンブロック(A)の数平均分子量で表される比が、0.005~0.030である、ブロックコポリマー。
    A block copolymer containing an aromatic polysulfone block (A) and a polyoxyalkylene block (B).
    1 The ratio represented by the number average molecular weight of the polyoxyalkylene block (B) / the number average molecular weight of the aromatic polysulfone block (A) calculated by 1 H-NMR is 0.005 to 0.030. , Block copolymer.
  2.  H-NMRにより算出された、前記ポリオキシアルキレンブロック(B)の数平均分子量が、900以下である、請求項1に記載のブロックコポリマー。 1 The block copolymer according to claim 1, wherein the number average molecular weight of the polyoxyalkylene block (B) calculated by 1 H-NMR is 900 or less.
  3.  ゲル浸透クロマトグラフィーにより絶対分子量として取得された、前記ブロックコポリマーの重量平均分子量が、20000~70000である、請求項1又は2に記載のブロックコポリマー。 The block copolymer according to claim 1 or 2, wherein the block copolymer has a weight average molecular weight of 20,000 to 70,000, which is obtained as an absolute molecular weight by gel permeation chromatography.
  4.  前記ポリオキシアルキレンブロック(B)、前記芳香族ポリスルホンブロック(A)、及び前記ポリオキシアルキレンブロック(B)の順に、上記3つのブロックを有する直鎖状トリブロックコポリマー、並びに
     前記ポリオキシアルキレンブロック(B)及び前記芳香族ポリスルホンブロック(A)の上記2つのブロックを有する直鎖状ジブロックコポリマー、
     の少なくとも一方を含む、請求項1~3のいずれか一項に記載のブロックコポリマー。
    A linear triblock copolymer having the above three blocks, and the polyoxyalkylene block (B) in the order of the polyoxyalkylene block (B), the aromatic polysulfone block (A), and the polyoxyalkylene block (B). A linear diblock copolymer having the above two blocks of B) and the aromatic polysulfone block (A),
    The block copolymer according to any one of claims 1 to 3, which comprises at least one of the above.
  5.  前記芳香族ポリスルホンブロック(A)が、下記式(1)で表される構造単位を有する高分子鎖からなる、請求項1~4のいずれか一項に記載のブロックコポリマー。
    Figure JPOXMLDOC01-appb-C000001
    [式(1)中、
     R及びRは、それぞれ独立に、炭素数1~10のアルキル基、炭素数6~20のアリール基又はハロゲン原子を表し、
     n1及びn2は、それぞれ独立に、0~4の整数であり、
     n1又はn2が2以上である場合、複数個のR及びRは互いに同一でも異なっていてもよい。]
    The block copolymer according to any one of claims 1 to 4, wherein the aromatic polysulfone block (A) comprises a polymer chain having a structural unit represented by the following formula (1).
    Figure JPOXMLDOC01-appb-C000001
    [In equation (1),
    R 1 and R 2 independently represent an alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, or a halogen atom.
    n1 and n2 are independently integers of 0 to 4, respectively.
    When n1 or n2 is 2 or more, plural R 1 and R 2 may be the same or different from each other. ]
  6.  前記ポリオキシアルキレンブロック(B)が、下記式(2-1)で表される構造単位を有する高分子鎖からなる、請求項1~5のいずれか一項に記載のブロックコポリマー。
    Figure JPOXMLDOC01-appb-C000002
    The block copolymer according to any one of claims 1 to 5, wherein the polyoxyalkylene block (B) is composed of a polymer chain having a structural unit represented by the following formula (2-1).
    Figure JPOXMLDOC01-appb-C000002
  7.  前記ブロックコポリマーのガラス転移点が、200℃以上である、請求項1~6のいずれか一項に記載のブロックコポリマー。 The block copolymer according to any one of claims 1 to 6, wherein the glass transition point of the block copolymer is 200 ° C. or higher.
  8.  前記ブロックコポリマーの1%質量減少温度が、370℃以上である、請求項1~7のいずれか一項に記載のブロックコポリマー。 The block copolymer according to any one of claims 1 to 7, wherein the 1% mass reduction temperature of the block copolymer is 370 ° C. or higher.
  9.  下記測定方法にて求められる、前記ブロックコポリマーを成形して得られる成形体の引張強さが、100MPa以上である、請求項1~8のいずれか一項に記載のブロックコポリマー。
    (測定方法)
     前記成形体として、厚さ30μmのJIS K6251 ダンベル状3号形の試験片を用いて、JIS K7127に準拠して、オートグラフにて、つかみ間隔50mm、引張速度5mm/分で引張り、23℃、相対湿度50%の雰囲気下における、試験片が切断(破断)したときの引張強さを求める。
    The block copolymer according to any one of claims 1 to 8, wherein the tensile strength of the molded product obtained by molding the block copolymer, which is obtained by the following measuring method, is 100 MPa or more.
    (Measuring method)
    As the molded body, a JIS K6251 dumbbell-shaped No. 3 test piece having a thickness of 30 μm was used, and in accordance with JIS K7127, an autograph was used to pull the product at a grip interval of 50 mm and a tensile speed of 5 mm / min at 23 ° C. The tensile strength when the test piece is cut (broken) in an atmosphere of 50% relative humidity is determined.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023033164A1 (en) * 2021-09-06 2023-03-09 住友化学株式会社 Block copolymer

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10212347A (en) * 1996-03-29 1998-08-11 Teijin Ltd Application of polyalkyl-ether-unit-containing sulfone and ketone to medical materials
JP2000239385A (en) * 1999-02-23 2000-09-05 Bayer Ag Production of polyether block copolysulfone
JP2002523537A (en) * 1998-08-25 2002-07-30 サース・バイオメディカル・インコーポレーテッド Highly branched block copolymer
JP2003292625A (en) * 2002-04-01 2003-10-15 Asahi Medical Co Ltd Polysulfone copolymer
JP2008507614A (en) * 2004-07-22 2008-03-13 ソルヴェイ アドバンスド ポリマーズ リミテッド ライアビリティ カンパニー Polysulfone-polyether block copolymer, process for its synthesis, membrane made from the copolymer
JP2010058096A (en) * 2008-09-08 2010-03-18 Toray Ind Inc Hydrophilic polyethersulfone separation membrane and method for manufacturing the same
JP2015227391A (en) * 2014-05-30 2015-12-17 東レ株式会社 Amorphous thermoplastic resin and manufacturing method therefor

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10212347A (en) * 1996-03-29 1998-08-11 Teijin Ltd Application of polyalkyl-ether-unit-containing sulfone and ketone to medical materials
JP2002523537A (en) * 1998-08-25 2002-07-30 サース・バイオメディカル・インコーポレーテッド Highly branched block copolymer
JP2000239385A (en) * 1999-02-23 2000-09-05 Bayer Ag Production of polyether block copolysulfone
JP2003292625A (en) * 2002-04-01 2003-10-15 Asahi Medical Co Ltd Polysulfone copolymer
JP2008507614A (en) * 2004-07-22 2008-03-13 ソルヴェイ アドバンスド ポリマーズ リミテッド ライアビリティ カンパニー Polysulfone-polyether block copolymer, process for its synthesis, membrane made from the copolymer
JP2010058096A (en) * 2008-09-08 2010-03-18 Toray Ind Inc Hydrophilic polyethersulfone separation membrane and method for manufacturing the same
JP2015227391A (en) * 2014-05-30 2015-12-17 東レ株式会社 Amorphous thermoplastic resin and manufacturing method therefor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023033164A1 (en) * 2021-09-06 2023-03-09 住友化学株式会社 Block copolymer

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