WO2021166379A1 - Light control panel - Google Patents

Light control panel Download PDF

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Publication number
WO2021166379A1
WO2021166379A1 PCT/JP2020/045346 JP2020045346W WO2021166379A1 WO 2021166379 A1 WO2021166379 A1 WO 2021166379A1 JP 2020045346 W JP2020045346 W JP 2020045346W WO 2021166379 A1 WO2021166379 A1 WO 2021166379A1
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WO
WIPO (PCT)
Prior art keywords
substrate
holes
auxiliary electrode
electrode layer
electrode
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Application number
PCT/JP2020/045346
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French (fr)
Japanese (ja)
Inventor
貴広 加藤
将史 平田
崇夫 今奥
Original Assignee
パナソニック液晶ディスプレイ株式会社
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Publication of WO2021166379A1 publication Critical patent/WO2021166379A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153Constructional details
    • G02F1/155Electrodes

Definitions

  • This disclosure relates to a dimming panel.
  • Patent Document 1 discloses an electrochromic element provided with a low resistance auxiliary electrode in order to suppress a voltage drop in the transparent electrode.
  • Patent Document 1 discloses that an ITO film is provided between the auxiliary electrode and the electrochromic layer, but the ITO film contains crystal defects and is insufficient as a protective film for the auxiliary electrode. be. The melting of the auxiliary electrode impairs the resistance-reducing function of the transparent electrode.
  • the present disclosure provides a dimming panel capable of suppressing a voltage drop in the electrode.
  • the dimming panel includes a first substrate having translucency, a second substrate having translucency arranged opposite to the first substrate, the first substrate, and the above.
  • An electrochromic layer arranged between the second substrate, a translucent first electrode layer arranged between the electrochromic layer and the first substrate, and the electrochromic layer and the first substrate.
  • a translucent first insulating layer arranged between the auxiliary electrode and the first electrode layer is provided, and the first insulating layer has a plurality of first through holes, and the first insulating layer has a plurality of first through holes.
  • the electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes.
  • the voltage drop in the electrode can be suppressed.
  • FIG. 1 is a diagram showing a configuration of a dimming panel according to the first embodiment.
  • FIG. 2 is a cross-sectional view of the dimming panel at the positions indicated by the lines IIA-IIA and IIB-IIB of FIG.
  • FIG. 3A is a cross-sectional view of the dimming panel in the transparent state at the position shown by lines III-III in FIG.
  • FIG. 3B is a cross-sectional view of the dimming panel in the reflective state at the position shown by lines III-III in FIG.
  • FIG. 4 is a plan view showing a first example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel.
  • FIG. 5 is a plan view showing a second example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel.
  • FIG. 6 is a plan view showing a third example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel.
  • FIG. 7 is a plan view showing a fourth example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel.
  • FIG. 8 is an enlarged plan view of the first through hole and the first auxiliary electrode.
  • FIG. 9 is a cross-sectional view of a dimming panel according to a modified example of the first embodiment.
  • FIG. 10 is a diagram showing a configuration of a dimming panel according to a second embodiment.
  • FIG. 11 is a cross-sectional view of the dimming panel at the positions indicated by the XIA-XIA line and the XIB-XIB line of FIG.
  • FIG. 12A is a cross-sectional view of the dimming panel in the transparent state at the position shown by the line XII-XII in FIG.
  • FIG. 12B is a cross-sectional view of the light control panel in the reflection state at the position shown by the line XII-XII in FIG.
  • FIG. 13 is a plan view showing a first example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel.
  • FIG. 14 is a plan view showing a second example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel.
  • FIG. 15 is a plan view showing a third example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel.
  • FIG. 16 is a plan view showing a fourth example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel.
  • FIG. 17 is a cross-sectional view of a dimming panel according to a modified example of the second embodiment.
  • FIG. 18 is a cross-sectional view of the dimming panel according to the third embodiment.
  • FIG. 19 is a plan view showing an arrangement example of the first through hole provided in the first insulating layer of the light control panel according to the third embodiment.
  • the dimming panel includes a first substrate having translucency, a second substrate having translucency arranged opposite to the first substrate, the first substrate, and the above.
  • An electrochromic layer arranged between the second substrate, a translucent first electrode layer arranged between the electrochromic layer and the first substrate, and the electrochromic layer and the first substrate.
  • a translucent first insulating layer arranged between the auxiliary electrode and the first electrode layer is provided.
  • the first insulating layer has a plurality of first through holes.
  • the first electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes.
  • the portion other than the plurality of first through holes is covered with the first insulating layer, so that the entire surface of the first auxiliary electrode is covered with the first electrode layer, as compared with the case where the entire surface of the first auxiliary electrode is covered with the first electrode layer.
  • the elution of the metal of the first auxiliary electrode can be suppressed.
  • the first electrode layer is arranged between the first insulating layer and the electrochromic layer so that the first insulating layer does not come into direct contact with the electrochromic layer. Therefore, the change in the optical state of the electrochromic layer is likely to occur uniformly in the plane.
  • the in-plane uniformity of the change in the optical state can be enhanced, and the voltage drop in the electrode can be suppressed.
  • the reaction rate and in-plane uniformity of changes in the optical state can be improved.
  • each of the first auxiliary electrodes may include a plurality of first metal wires extending in the first direction.
  • the first auxiliary electrode can be formed in a striped shape, so that the first auxiliary electrode can be made inconspicuous by, for example, thinning the first metal wire.
  • the first auxiliary electrode further extends a plurality of second metal wires each extending in a second direction intersecting the first direction and intersecting at least one of the plurality of first metal wires. It may be included.
  • the first auxiliary electrode can be formed in a grid pattern, so that the first auxiliary electrode can be made inconspicuous by thinning the first metal wire and the second metal wire, for example. Further, even when one of the first metal wire and the second metal wire is broken, the in-plane potential uniformity can be maintained by wrapping around from the other metal wire. Therefore, the voltage drop in the electrode can be suppressed.
  • the plurality of first through holes may be provided at the intersection of the first metal wire and the second metal wire in a plan view.
  • the first electrode layer and the first auxiliary electrode are electrically connected at the intersection, so that even if one of the first metal wire and the second metal wire is broken, the other metal wire is connected.
  • the uniformity of the in-plane potential can be maintained by wrapping around from. Therefore, the voltage drop in the electrode can be suppressed.
  • each of the plurality of first through holes may be arranged inside the first metal wire in a plan view.
  • the step of the first electrode layer provided in the plurality of first through holes is suppressed while covering the first insulating layer, so that the occurrence of film breakage of the first electrode can be suppressed.
  • the first insulating layer may be formed by using an inorganic material.
  • the dimming panel according to one aspect of the present disclosure further includes a second auxiliary electrode containing metal, which is arranged between the second electrode layer and the second substrate, and the second auxiliary electrode.
  • a second insulating layer having translucency, which is arranged between the second electrode layer and the second electrode layer, may be provided.
  • the second insulating layer has a plurality of second through holes.
  • the second electrode layer is electrically connected to the second auxiliary electrode via the plurality of second through holes.
  • the voltage drop can be suppressed in both the first electrode layer and the second electrode layer. Therefore, the reaction rate and in-plane uniformity of changes in the optical state can be further increased.
  • first auxiliary electrode and the second auxiliary electrode each include a plurality of first metal wires extending in the first direction, and the plurality of first metal wires included in the first auxiliary electrode and the first metal wire are included.
  • the plurality of first metal wires included in the two auxiliary electrodes may be arranged so as not to overlap with each other in a plan view.
  • the dimming panel includes a first substrate having translucency, a second substrate having translucency arranged opposite to the first substrate, and the first substrate.
  • a translucent first electrode layer arranged between the electrochromic layer and the first substrate, an electrochromic layer arranged between the electrochromic layer and the second substrate, and the electrochromic layer.
  • the first insulating layer has a plurality of first through holes.
  • the first electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes. In a plan view, at least one of the arrangement densities and areas of the plurality of first through holes differs depending on the region.
  • the portion other than the plurality of first through holes is covered with the first insulating layer, so that the entire surface of the first auxiliary electrode is covered with the first electrode layer, as compared with the case where the entire surface of the first auxiliary electrode is covered with the first electrode layer.
  • the elution of the metal of the first auxiliary electrode can be suppressed.
  • the first electrode layer is arranged between the first insulating layer and the electrochromic layer so that the first insulating layer does not come into direct contact with the electrochromic layer. Therefore, the change in the optical state of the electrochromic layer is likely to occur uniformly in the plane.
  • the dimming panel according to this aspect, at least one of the arrangement density and the area of the first through hole differs depending on the region in the plan view, so that the region having different resistance in the plane of the first electrode layer is formed. It is formed. Therefore, for example, by reducing the resistance in the region where the current is difficult to flow, the current flowing in the region can be increased. By making the resistance different depending on the region, the current flowing in the plane can be made uniform.
  • the in-plane uniformity of the change in the optical state can be enhanced, and the voltage drop in the electrode can be suppressed.
  • the reaction rate and in-plane uniformity of changes in the optical state can be improved.
  • the areas of the plurality of first through holes are equal to each other, and the arrangement densities of the plurality of first through holes may differ depending on the region.
  • the contact area between the first auxiliary electrode and the first electrode layer per unit area changes depending on the arrangement density of the first through holes (the number of holes per unit area).
  • the arrangement density of the plurality of first through holes is uniform, and the areas of the plurality of first through holes may differ depending on the region.
  • the contact area between the first auxiliary electrode and the first electrode layer changes depending on the area of the first through hole. Therefore, the resistance of the region can be made different by adjusting the area, and the current flowing in the plane can be made uniform.
  • the dimming panel according to one aspect of the present disclosure may further include a first power feeding terminal portion connected to an end portion of the first electrode layer. At least one of the arrangement density and the area may be increased as the distance from the first power feeding terminal portion increases.
  • the dimming panel according to one aspect of the present disclosure further includes a second auxiliary electrode containing metal, which is arranged between the second electrode layer and the second substrate, and the second auxiliary electrode.
  • a second insulating layer having translucency, which is arranged between the second electrode layer and the second electrode layer, may be provided.
  • the second insulating layer has a plurality of second through holes.
  • the second electrode layer is electrically connected to the second auxiliary electrode via the plurality of second through holes. In a plan view, at least one of the arrangement density and the area of the plurality of second through holes may differ depending on the region.
  • the voltage drop can be suppressed in both the first electrode layer and the second electrode layer, and the current flowing in the plane can be brought close to uniform. Therefore, the reaction rate and in-plane uniformity of changes in the optical state can be further increased.
  • each figure is a schematic view and is not necessarily exactly illustrated. Therefore, for example, the scales and the like do not always match in each figure. Further, in each figure, substantially the same configuration is designated by the same reference numerals, and duplicate description will be omitted or simplified.
  • the terms “upper” and “lower” do not refer to the upward direction (vertically upward) and the downward direction (vertically downward) in absolute spatial recognition, but are based on the stacking order in the stacking configuration. It is used as a term defined by the relative positional relationship with. Also, the terms “upper” and “lower” are used not only when the two components are spaced apart from each other and another component exists between the two components, but also when the two components It also applies when the two components are placed in close contact with each other and touch each other.
  • the x-axis, y-axis, and z-axis indicate the three axes of the three-dimensional Cartesian coordinate system.
  • the positive direction of the z-axis is vertically above.
  • the "thickness direction” means the thickness direction of the dimming panel, and is the direction perpendicular to the main surfaces of the first substrate and the second substrate
  • the "planar view” means. It refers to a view from a direction perpendicular to the main surface of the first substrate or the second substrate.
  • FIG. 1 is a diagram showing a configuration of a dimming panel 1 according to the present embodiment.
  • the first substrate 10 and the second substrate 20 are shown diagonally offset.
  • the first substrate 10 and the second substrate 20 are arranged so that most of them overlap each other in a plan view.
  • the first electrode layer 30, the second electrode layer 40, the electrochromic layer 50, the first insulating layer 80, and the second insulating layer 90 (see FIG. 2) included in the dimming panel 1 are not shown. doing.
  • the IIA-IIA line shown in FIG. 1 is a line along the first metal wire 61 extending in the x-axis direction of the first auxiliary electrode 60.
  • the IIB-IIB wire is a wire along the first metal wire 71 extending in the x-axis direction of the second auxiliary electrode 70.
  • the IIA-IIA line and the IIB-IIB line are positions that do not overlap in a plan view. That is, the first metal wire 61 included in the first auxiliary electrode 60 and the first metal wire 71 included in the second auxiliary electrode 70 are arranged at positions where they do not overlap in a plan view.
  • FIG. 2 is a cross-sectional view of the dimming panel 1 at the positions indicated by the lines IIA-IIA and IIB-IIB of FIG. Specifically, FIG. 2A shows a cross section of the first substrate 10 side in the IIA-IIA line, and FIG. 2B shows a cross section of the second substrate 20 side in the IIB-IIB line. ing. FIG. 2 shows a combination of cross sections of the dimming panel 1 at different positions. This is to show the positional relationship between the first through hole 81 and the second through hole 91 in an easy-to-understand manner. Note that FIG. 2 shows the vicinity of the center of each of the first substrate 10 and the second substrate 20, and the end portions (near the vicinity of the first bus bar 65 and the second bus bar 75) are not shown.
  • the dimming panel 1 includes a first substrate 10, a second substrate 20, a first electrode layer 30, a second electrode layer 40, an electrochromic layer 50, and a second substrate.
  • Auxiliary electrode 60, a second auxiliary electrode 70, a first insulating layer 80, and a second insulating layer 90 are provided.
  • the dimming panel 1 has a flat plate shape. As shown in FIG. 2, along the thickness direction (z-axis direction) of the dimming panel 1, the first substrate 10, the first auxiliary electrode 60, the first insulating layer 80, the first electrode layer 30, and the electrochromic layer. 50, the second electrode layer 40, the second insulating layer 90, the second auxiliary electrode 70, and the second substrate 20 are arranged side by side in this order.
  • the optical state of the dimming panel 1 is changed by controlling the power supply 2 by the control circuit 3 shown in FIG.
  • the optical state of the dimming panel 1 is a translucent state (transparent state) that transmits the light incident on the dimming panel 1 and a reflective state that reflects the light incident on the dimming panel 1. It can be changed.
  • the translucent state means that when the dimming panel 1 is irradiated with light, the amount of light passing through the dimming panel 1 (intensity) is the amount of light reflected by the dimming panel 1 (intensity). There are more.
  • the reflection state is a state in which the amount of light reflected by the dimming panel 1 (intensity) is larger than the amount of light passing through the dimming panel 1 (intensity) when the dimming panel 1 is irradiated with light. Is.
  • FIG. 3A is a cross-sectional view of the dimming panel 1 in a transparent state at the position shown by lines III-III in FIG.
  • FIG. 3B is a cross-sectional view of the dimming panel 1 in the reflection state at the position shown by lines III-III in FIG.
  • each component of the dimming panel 1 will be described in detail with reference to FIGS. 1 to 3B as appropriate.
  • the first substrate 10 and the second substrate 20 are arranged so as to face each other.
  • the first substrate 10 and the second substrate 20 are translucent plates.
  • the first substrate 10 and the second substrate 20 are arranged in parallel so that the distance between the substrates is uniform.
  • the distance between the substrates is, for example, 200 ⁇ m, but is not limited to this.
  • the first substrate 10 and the second substrate 20 are formed by using an insulating and translucent material such as glass or resin.
  • the first substrate 10 and the second substrate 20 have substantially the same size as each other.
  • the plan-view shape of each of the first substrate 10 and the second substrate 20 is, for example, a rectangle (rectangle or square) having a side length of 1 m or more.
  • both the vertical and horizontal lengths of the first substrate 10 in a plan view may be 2 m or more.
  • Area in plan view of each of the first substrate 10 and the second substrate 20 is, for example, is 1 m 2 or more, it may also be 3m 2 or more, may be 5 m 2 or more.
  • the plan-view shape of the first substrate 10 and the second substrate 20 may be a polygon such as a triangle, a parallelogram, a hexagon or an octagon, or a shape including a curve such as a circle or an ellipse. ..
  • the first electrode layer 30 and the second electrode layer 40 are conductive thin films having translucency.
  • the first electrode layer 30 and the second electrode layer 40 are transparent conductive oxide films such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).
  • ITO Indium Tin Oxide
  • IZO Indium Zinc Oxide
  • At least one of the first electrode layer 30 and the second electrode layer 40 may be a metal thin film sufficiently thin enough to transmit visible light.
  • the first electrode layer 30 and the second electrode layer 40 are formed by, for example, sputtering or a coating method.
  • the first electrode layer 30 and the second electrode layer 40 are arranged so as to face each other with the electrochromic layer 50 interposed therebetween.
  • the first electrode layer 30 is arranged between the first substrate 10 and the electrochromic layer 50. More specifically, the first electrode layer 30 is in contact with the main surface of the electrochromic layer 50 on the first substrate 10 side.
  • the first electrode layer 30 covers the first auxiliary electrode 60 and the first insulating layer 80.
  • the first electrode layer 30 is electrically connected to the first auxiliary electrode 60 via a plurality of first through holes 81 provided in the first insulating layer 80.
  • the first electrode layer 30 is in contact with the surface of the first auxiliary electrode 60 exposed in the first through hole 81 inside each of the plurality of first through holes 81.
  • the plan view shape of the first electrode layer 30 substantially matches the plan view shape of the first substrate 10.
  • the film thickness of the first electrode layer 30 is, for example, 50 nm, but the film thickness is not limited to this.
  • the second electrode layer 40 is arranged between the second substrate 20 and the electrochromic layer 50. More specifically, the second electrode layer 40 is in contact with the main surface of the electrochromic layer 50 on the second substrate 20 side.
  • the second electrode layer 40 covers the second auxiliary electrode 70 and the second insulating layer 90.
  • the second electrode layer 40 is electrically connected to the second auxiliary electrode 70 via a plurality of second through holes 91 provided in the second insulating layer 90.
  • the second electrode layer 40 is in contact with the surface of the second auxiliary electrode 70 exposed in the second through hole 91 inside each of the plurality of second through holes 91.
  • the plan view shape of the second electrode layer 40 substantially matches the plan view shape of the second substrate 20.
  • the film thickness of the second electrode layer 40 is, for example, 50 nm, but the film thickness is not limited to this.
  • the electrochromic layer 50 is arranged between the first substrate 10 and the second substrate 20. Specifically, the electrochromic layer 50 is located between the first electrode layer 30 and the second electrode layer 40, and is provided in contact with each other.
  • the optical state of the electrochromic layer 50 changes due to the movement of electric charges inside the electrochromic layer 50 by applying a voltage to each of the first electrode layer 30 and the second electrode layer 40, and the chemical change caused by the transferred charges. Change.
  • the optical state of the electrochromic layer 50 changes reversibly because the transfer of electric charge is reversibly controlled by the direction and magnitude of the voltage.
  • the electrochromic layer 50 contains an electrolytic solution containing an electrochromic material.
  • An electrochromic material is a material that undergoes a redox reaction due to the transfer of electric charge.
  • the electrochromic material is a metal compound that is a salt containing metal ions.
  • the electrochromic material can transmit light when it contains a metal as an ion, and can reflect light when it contains a metal as a metal atom.
  • metal ions are deposited as the metal thin film 52 along the surface of the first electrode layer 30. Since the metal thin film 52 has light reflectivity, the optical state of the electrochromic layer 50 becomes a reflective state. For example, when a voltage is applied between the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40, the metal thin film 52 is the first. It is formed along the surface of the electrode layer 30. When a voltage of opposite polarity is applied, the metal thin film 52 is formed along the surface of the second electrode layer 40. In either case, the metal thin film 52 reflects the light incident on the dimming panel 1.
  • the precipitated metal thin film 52 can be dissolved and eliminated.
  • the optical state of the electrochromic layer 50 becomes transparent.
  • the voltage having the opposite polarity is such that the metal thin film 52 does not deposit on the opposite electrode layer (for example, the second electrode layer 40 in the example shown in FIG. 3B).
  • the metal ion contained in the electrochromic layer 50 is, for example, a silver (Ag) ion.
  • a silver compound which is a salt containing silver ions is used as the electrochromic material.
  • Silver compounds include, but are not limited to, for example, silver nitrate (AgNO 3 ), silver perchlorate (AgClO 4 ), silver bromide (AgBr) and silver chloride (AgCl).
  • the metal ion may be an ion of a noble metal such as gold (Au), platinum (Pt) or palladium (Pd).
  • the metal ion may be a copper (Cu) ion. Since the electrochromic layer 50 contains an electrochromic material containing ions of a metal having an ionization tendency lower than that of hydrogen, such as a noble metal, the metal thin film 52 can be stably deposited when a voltage is applied.
  • the electrolytic solution may further contain a supporting electrolyte, a mediator, and a solvent such as dimethyl sulfoxide (DMSO).
  • a supporting electrolyte for example, the materials described in Patent Document 1 can be used.
  • the electrochromic material used for the electrochromic layer 50 may be tungsten oxide (WO 3).
  • the electrochromic layer 50, a WO 3 film disposed on the first electrode layer 30, WO 3 film and the electrolytic solution or the electrolyte provided in contact with the WO 3 film between the second electrode layer 40 It may include layers.
  • the electrochromic layer 50 is, for example, in a liquid state or a solid state.
  • the first auxiliary electrode 60 is arranged between the first electrode layer 30 and the first substrate 10.
  • the first auxiliary electrode 60 is formed by using a material having a lower resistance than that of the first electrode layer 30.
  • the first auxiliary electrode 60 contains a metal.
  • the first auxiliary electrode 60 contains silver (Ag), copper (Cu), aluminum (Al), or the like as a metal.
  • the first auxiliary electrode 60 has a light-shielding property.
  • the first auxiliary electrode 60 includes a plurality of first metal wires 61 and a plurality of second metal wires 62.
  • FIG. 4 is a plan view showing a first example of the arrangement of the first through hole 81 provided in the first insulating layer 80 of the dimming panel 1.
  • Each of the plurality of first metal wires 61 extends in the x-axis direction (first direction).
  • Each of the plurality of second metal wires 62 extends in the y-axis direction (second direction).
  • the first metal wire 61 and the second metal wire 62 are orthogonal to each other. That is, the plan view shape of the first auxiliary electrode 60 is a grid shape having a square opening shape.
  • the plurality of first metal wires 61 are arranged parallel to each other and at equal intervals.
  • the plurality of second metal wires 62 are arranged parallel to each other and at equal intervals.
  • the distance between the adjacent first metal wires 61 and the distance between the adjacent second metal wires 62 are equal to each other, for example, 10 ⁇ m or more.
  • the plurality of first metal wires 61 have the same size and shape as each other.
  • the width of the first metal wire 61 and the width of the second metal wire 62 are, for example, 4 ⁇ m or less.
  • the thickness of the first metal wire 61 and the thickness of the second metal wire 62 are, for example, less than 1 ⁇ m.
  • the thickness of the intersection between the first metal wire 61 and the second metal wire 62 is also the same.
  • the thickness of the first auxiliary electrode 60 is uniform in the plane.
  • the first auxiliary electrode 60 is formed by, for example, forming a metal thin film on the main surface of the first substrate 10 by sputtering or vapor deposition, and patterning the formed metal thin film by photolithography and etching.
  • a metal thin film may be formed by sputtering or vapor deposition so as to cover the resist pattern, and a grid-like first auxiliary electrode 60 may be formed by lift-off.
  • the second auxiliary electrode 70 is arranged between the second electrode layer 40 and the second substrate 20.
  • the second auxiliary electrode 70 is formed by using a material having a lower resistance than the second electrode layer 40.
  • the second auxiliary electrode 70 contains a metal.
  • the second auxiliary electrode 70 contains silver (Ag), copper (Cu), aluminum (Al), or the like as a metal.
  • the second auxiliary electrode 70 has a light-shielding property.
  • the shape, size, and forming method of the second auxiliary electrode 70 are the same as, for example, the first auxiliary electrode 60.
  • the first auxiliary electrode 60 and the second auxiliary electrode 70 are arranged so as to be offset from each other so as not to match in a plan view.
  • the plurality of first metal wires 61 included in the first auxiliary electrode 60 and the plurality of first metal wires 71 included in the second auxiliary electrode 70 are arranged so as not to overlap in a plan view.
  • the first metal wire 61 of the first auxiliary electrode 60 is arranged between two adjacent first metal wires 71 of the second auxiliary electrode 70.
  • the first metal wire 61 is arranged at the center between two adjacent first metal wires 71.
  • the second metal wires 62 and 72 are arranged so as not to overlap in a plan view.
  • the second metal wire 62 of the first auxiliary electrode 60 is arranged between two adjacent second metal wires 72 of the second auxiliary electrode 70.
  • the second metal wire 62 is arranged at the center between two adjacent second metal wires 72.
  • first auxiliary electrode 60 and the second auxiliary electrode 70 By arranging the first auxiliary electrode 60 and the second auxiliary electrode 70 so as not to overlap with each other in this way, it is possible to suppress current concentration and improve the in-plane uniformity of the optical state. Further, it is possible to suppress the occurrence of moire caused by the first auxiliary electrode 60 and the second auxiliary electrode 70.
  • the first insulating layer 80 is arranged between the first auxiliary electrode 60 and the first electrode layer 30. Specifically, the first insulating layer 80 is formed on the main surface of the first substrate 10 so as to cover the first auxiliary electrode 60.
  • the plan view shape of the first insulating layer 80 is substantially the same as the plan view shape of the first substrate 10.
  • the first insulating layer 80 is a translucent insulating film.
  • the first insulating layer 80 is formed by using an inorganic material or an organic material.
  • silicon nitride, silicon oxide or silicon oxynitride can be used.
  • organic material a resin material such as acrylate or epoxy can be used.
  • the first insulating layer 80 has a plurality of first through holes 81.
  • Each of the plurality of first through holes 81 is a contact hole for exposing a part of the first auxiliary electrode 60 and making an electrical connection with the first electrode layer 30.
  • the shapes and sizes of the plurality of first through holes 81 are the same as each other.
  • the areas of the plurality of first through holes 81 are equal to each other. The arrangement of the plurality of first through holes 81 will be described later with reference to FIGS. 4 to 8.
  • the first insulating layer 80 is formed with a uniform film thickness by a CVD (Chemical Vapor Deposition) method or a coating method.
  • a plurality of first through holes 81 are formed by removing a part of the insulating film by photolithography and etching.
  • the first insulating layer 80 in which a plurality of first through holes 81 are formed may be formed by the lift-off method.
  • the thickness of the first insulating layer 80 is, for example, in the range of several hundred nm or more and several ⁇ m or less.
  • the thickness of the first insulating layer 80 is thicker than that of the first auxiliary electrode 60.
  • the thickness of the first insulating layer 80 may be equal to the thickness of the first auxiliary electrode 60, or may be thinner than the thickness of the first auxiliary electrode 60.
  • the second insulating layer 90 is arranged between the second auxiliary electrode 70 and the second electrode layer 40. Specifically, the second insulating layer 90 is formed on the main surface of the second substrate 20 so as to cover the second auxiliary electrode 70.
  • the plan view shape of the second insulating layer 90 is substantially the same as the plan view shape of the second substrate 20.
  • the second insulating layer 90 is a translucent insulating film.
  • the second insulating layer 90 is formed by using an inorganic material or an organic material.
  • silicon nitride, silicon oxide or silicon oxynitride can be used.
  • organic material a resin material such as acrylate or epoxy can be used.
  • the second insulating layer 90 has a plurality of second through holes 91.
  • Each of the plurality of second through holes 91 is a contact hole for exposing a part of the second auxiliary electrode 70 and making an electrical connection with the second electrode layer 40.
  • the shapes and sizes of the plurality of second through holes 91 are the same as each other.
  • the shape and size of the second through hole 91 are the same as the shape and size of the first through hole 81.
  • the areas of the plurality of second through holes 91 are equal to each other.
  • the arrangement of the plurality of second through holes 91 is the same as the arrangement of the first through holes 81, and details will be described later.
  • the thickness of the second insulating layer 90 is, for example, in the range of several hundred nm or more and several ⁇ m or less.
  • the thickness of the second insulating layer 90 is thicker than that of the second auxiliary electrode 70.
  • the thickness of the second insulating layer 90 may be equal to the thickness of the second auxiliary electrode 70, or may be thinner than the thickness of the second auxiliary electrode 70.
  • the dimming panel 1 includes an annular sealing member formed along the outer periphery of each of the first substrate 10 and the second substrate 20.
  • the sealing member has a function of preventing the electrolytic solution of the electrochromic layer 50 from leaking and maintaining the distance between the first substrate 10 and the second substrate 20.
  • the sealing member is formed of, for example, an ultraviolet curable resin or a thermosetting resin.
  • a first bus bar 65 for supplying power to the first electrode layer 30 is provided at the end of the first substrate 10.
  • the first bus bar 65 is an example of a first power feeding terminal portion connected to an end portion of the first electrode layer 30.
  • a part of the first electrode layer 30 and the first auxiliary electrode 60 is drawn out from the sealing member and is electrically connected to the first bus bar 65.
  • a second bus bar 75 for supplying power to the second electrode layer 40 is provided at the end of the second substrate 20 at the end of the second substrate 20, a second bus bar 75 for supplying power to the second electrode layer 40 is provided.
  • the second bus bar 75 is an example of a second power feeding terminal portion connected to the end portion of the second electrode layer 40. A part of the second electrode layer 40 is drawn out from the sealing member and is electrically connected to the second bus bar 75.
  • the first bus bar 65 and the second bus bar 75 are provided along the opposite sides of the respective boards.
  • the first bus bar 65 and the second bus bar 75 may be provided on adjacent sides in a plan view.
  • the first bus bar 65 may be provided along two opposite sides of the first substrate 10
  • the second bus bar 75 may be provided along two opposite sides of the second substrate 20.
  • the first bus bar 65 and the second bus bar 75 may be provided along the four sides of each substrate, respectively.
  • the power supply 2 is connected to the first bus bar 65 and the second bus bar 75.
  • the voltage from the power supply 2 is supplied to the first electrode layer 30 and the second electrode layer 40 via the first bus bar 65 and the second bus bar 75.
  • the dimming panel 1 can be formed as follows, for example. First, the first auxiliary electrode 60, the first insulating layer 80, and the first electrode layer 30 are formed on the main surface of the first substrate 10 in this order. Similarly, the second auxiliary electrode 70, the second insulating layer 90, and the second electrode layer 40 are formed on the main surface of the second substrate 20 in this order. After forming a sealing member in an annular shape on at least one of the first substrate 10 and the second substrate 20, an electrolytic solution containing an electrochromic material is arranged, and the first substrate 10 and the second substrate 20 are bonded and sealed. Harden the stop member. As a result, the dimming panel 1 is formed. The method for manufacturing the dimming panel 1 is not particularly limited.
  • FIGS. 4 to 7 are diagrams showing first to fourth examples of arrangement of the first through hole 81 provided in the first insulating layer 80 of the dimming panel 1, respectively.
  • the plurality of first through holes 81 are provided at the intersection of the first metal wire 61 and the second metal wire 62 in a plan view. As a result, even if one of the first metal wire 61 and the second metal wire 62 is broken, the in-plane potential uniformity can be maintained by wrapping around through the other metal wire. By providing the first through hole 81 at the intersection, the wraparound distance can be shortened, so that the uniformity of the potential can be improved.
  • the plurality of first through holes 81 may be provided so as to overlap the plurality of first metal wires 61 in a plan view, and may be provided in any of the second metal wires 62. It does not have to overlap.
  • the plurality of first through holes 81 may be provided so as to overlap the plurality of second metal wires 62 in a plan view, and may be provided in any of the first metal wires 61. It does not have to overlap.
  • the first through hole 81 is provided in the center of two adjacent intersections of the first metal wire 61 or the second metal wire 62, respectively.
  • the plurality of first through holes 81 may include a through hole provided at the intersection and a through hole provided at a place other than the intersection in a mixed manner. ..
  • FIG. 7 shows an example in which the first through hole 81 provided other than the intersection overlaps with the second metal wire 62, it may overlap with the first metal wire 61.
  • the plurality of first through holes 81 provided other than the intersection may include a through hole that overlaps the first metal wire 61 and a through hole that overlaps the second metal wire 62.
  • the arrangement of the second through hole 91 is the same as the arrangement of the first through hole 81. That is, as shown in FIG. 4 or 7, the plurality of second through holes 91 may be provided at the intersection of the first metal wire 71 and the second metal wire 72. Alternatively, as shown in FIG. 5 or 6, the plurality of second through holes 91 may be provided at a portion other than the intersection of the first metal wire 71 and the second metal wire 72.
  • the first through hole 81 is larger than the line width of the first metal wire 61 and the line width of the second metal wire 62. Specifically, the first through hole 81 completely exposes the intersection of the first metal wire 61 and the second metal wire 62. As a result, the contact area between the first electrode layer 30 provided in the first through hole 81 and the first metal wire 61 and the second metal wire 62 can be increased, so that the contact resistance can be reduced. Further, since the size of the first through hole 81 is large, the step formed in the first electrode layer 30 becomes small, and the occurrence of film breakage can be suppressed. The same applies to the examples shown in FIGS. 5 to 7.
  • each of the plurality of first through holes 81 may be arranged inside the first metal wire 61 in a plan view.
  • FIG. 8 is an enlarged plan view of the first through hole 81 and the first auxiliary electrode 60.
  • the first through hole 81 may be provided inside the intersection of the first metal wire 61 and the second metal wire 62.
  • the plan view shape of the first through hole 81 is square, one side w of the opening of the first through hole 81 is larger than the line width w1 of the first metal wire 61 and the line width w2 of the second metal wire 62. short. As a result, the step difference of the first electrode layer 30 is suppressed, so that the occurrence of film breakage of the first electrode layer 30 can be suppressed.
  • the plan view shape of the first through hole 81 is a rectangle such as a square, but it may be a circle.
  • the opening diameter of the first through hole 81 may be shorter than the line width w1 of the first metal wire 61 and the line width w2 of the second metal wire 62.
  • the shape and size of the second through hole 91 in a plan view are the same as those of the first through hole 81.
  • the optical state of the dimming panel 1 is controlled by the control circuit 3 shown in FIG. Specifically, the control circuit 3 controls the power supply 2 and changes the magnitude and polarity of the voltage applied to each of the first electrode layer 30 and the second electrode layer 40 to change the optics of the dimming panel 1. The state can be changed.
  • the power supply 2 is a voltage source for supplying a predetermined voltage to each of the first electrode layer 30 and the second electrode layer 40.
  • the power supply 2 is a DC power supply that generates and supplies a pulsed pulsating voltage (DC voltage) based on power supplied from an external power source such as a commercial power supply or a storage battery.
  • the power supply 2 can change the magnitude and polarity of the output voltage under the control of the control circuit 3.
  • the control circuit 3 is realized by, for example, an LSI (Large Scale Integration) which is an integrated circuit (IC: Integrated Circuit).
  • the integrated circuit is not limited to the LSI, and may be a dedicated circuit or a general-purpose processor.
  • the control circuit 3 may be a microcontroller.
  • the control circuit 3 may be a programmable FPGA (Field Programmable Gate Array) or a reconfigurable processor in which the connection and setting of circuit cells in the LSI can be reconfigured.
  • the function executed by the control circuit 3 may be realized by software or hardware.
  • the dimming panel 1 is used by being installed in a window of a building or a moving body.
  • the power supply 2 and the control circuit 3 are installed, for example, inside a window frame or a wall on which the dimming panel 1 is installed.
  • the power supply 2 and the control circuit 3 may be provided at the end of the first substrate 10 or the second substrate 20 of the dimming panel 1.
  • the optical state of the dimming panel 1 is the translucent state (transparent state) shown in FIG. 3A.
  • the applied voltage is 0V
  • the metal ions contained in the electrochromic layer 50 are not precipitated. Therefore, the electrochromic layer 50 is in a translucent state in which light is transmitted.
  • the refractive indexes of the first substrate 10, the first insulating layer 80, the first electrode layer 30, the electrochromic layer 50, the second electrode layer 40, the second insulating layer 90, and the second substrate 20 are substantially equal. The incident light passes as it is. That is, the optical state of the dimming panel 1 becomes a transparent state.
  • the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40.
  • the optical state of the dimming panel 1 is the reflection state shown in FIG. 3B. Since the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40, the metal in the electrochromic layer 50 is deposited on the surface of the first electrode layer 30 as a metal thin film 52. Therefore, the dimming panel 1 is in a reflective state that reflects light.
  • the metal thin film 52 is formed on the surface of the first electrode layer 30 in FIG. 3B, the metal thin film 52 may be formed on the surface of the second electrode layer 40.
  • the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is higher than the potential of the second electrode layer 40, thereby forming a metal thin film. 52 is formed on the surface of the second electrode layer 40.
  • FIG. 9 is a cross-sectional view of the dimming panel 101 according to this modified example.
  • the dimming panel 101 shown in FIG. 9 is not provided with the second auxiliary electrode 70 and the second insulating layer 90 as compared with the dimming panel 1 according to the embodiment.
  • the second electrode layer 40 is directly provided on the main surface of the second substrate 20.
  • the arrangement of the first through hole and the second through hole is different from that of the first embodiment.
  • the differences from the first embodiment will be mainly described, and the common points will be omitted or simplified.
  • FIG. 10 is a diagram showing the configuration of the dimming panel 201 according to the present embodiment. The method of illustration in FIG. 10 is the same as that in FIG.
  • the XIA-XIA line shown in FIG. 10 is a line along the first metal wire 61 extending in the x-axis direction of the first auxiliary electrode 60.
  • the XIB-XIB line is a line along the first metal wire 71 extending in the x-axis direction of the second auxiliary electrode 70.
  • the XIA-XIA line and the XIB-XIB line are positions that do not overlap in a plan view. That is, the first metal wire 61 included in the first auxiliary electrode 60 and the first metal wire 71 included in the second auxiliary electrode 70 are arranged at positions where they do not overlap in a plan view.
  • FIG. 11 is a cross-sectional view of the dimming panel 201 at the positions indicated by the XIA-XIA line and the XIB-XIB line of FIG. Specifically, FIG. 11A shows a cross section of the first substrate 10 side in the XIA-XIA line, and FIG. 11B shows a cross section of the second substrate 20 side in the XIB-XIB line. ing. The method of illustration in FIG. 11 is the same as that in FIG.
  • the dimming panel 201 includes a first substrate 10, a second substrate 20, a first electrode layer 30, a second electrode layer 40, an electrochromic layer 50, and a first substrate. 1 Auxiliary electrode 60, a second auxiliary electrode 70, a first insulating layer 80, and a second insulating layer 90 are provided.
  • the dimming panel 201 has a flat plate shape. As shown in FIG. 11, along the thickness direction (z-axis direction) of the dimming panel 201, the first substrate 10, the first auxiliary electrode 60, the first insulating layer 80, the first electrode layer 30, and the electrochromic layer. 50, the second electrode layer 40, the second insulating layer 90, the second auxiliary electrode 70, and the second substrate 20 are arranged side by side in this order.
  • the first through hole 81 is formed in the first insulating layer 80 as compared with the dimming panel 1 according to the first embodiment. The difference is that the first through hole 281 is provided instead of the second through hole 281 and the second through hole 291 is provided in the second insulating layer 90 instead of the second through hole 91.
  • the optical state of the dimming panel 201 is changed by controlling the power supply 2 by the control circuit 3 shown in FIG.
  • the optical state of the dimming panel 201 is a translucent state (transparent state) for transmitting the light incident on the dimming panel 201 and a reflecting state for reflecting the light incident on the dimming panel 201. It can be changed.
  • FIG. 12A is a cross-sectional view of the dimming panel 201 in a transparent state at the position shown by the line XII-XII in FIG.
  • FIG. 12B is a cross-sectional view of the dimming panel 201 in the reflection state at the position shown by the line XII-XII in FIG. 12A and 12B correspond to FIGS. 3A and 3B according to the first embodiment.
  • FIGS. 13 to 16 are diagrams showing first to fourth examples of arrangement of the first through hole 281 provided in the first insulating layer 80 of the dimming panel 201, respectively.
  • the plurality of first through holes 281 are provided at the intersection of the first metal wire 61 and the second metal wire 62 in a plan view. As a result, even if one of the first metal wire 61 and the second metal wire 62 is broken, the in-plane potential uniformity can be maintained by wrapping around through the other metal wire. By providing the first through hole 281 at the intersection, the wraparound distance can be shortened, so that the uniformity of the potential can be improved.
  • the arrangement densities of the plurality of first through holes 281 differ depending on the region in a plan view.
  • the arrangement density is the number of first through holes 281 provided per unit area.
  • the unit area is, for example, an area of 10% or more and 20% or less of the area of the first substrate 10 in a plan view.
  • the number of first through holes 281 included in the first region 211 is different from the number of first through holes 281 included in the second region 212.
  • Both the first region 211 and the second region 212 are square regions having the above unit area and do not overlap with each other.
  • Both the first region 211 and the second region 212 include nine intersections of the first auxiliary electrode 60.
  • the first region 211 is a region closer to the first bus bar 65 than the second region 212.
  • the first through hole 281 is a contact hole for electrically connecting the first auxiliary electrode 60 and the first electrode layer 30. Therefore, the arrangement density of the first through hole 281 corresponds to the connection area between the first auxiliary electrode 60 and the first electrode layer 30 per unit area. That is, as the number of the first through holes 281 increases, the connection area between the first auxiliary electrode 60 and the first electrode layer 30 increases, so that the current easily flows through the first auxiliary electrode 60. As the number of the first through holes 281 is reduced, the connection area between the first auxiliary electrode 60 and the first electrode layer 30 becomes smaller, so that it becomes difficult for current to flow.
  • the influence of the resistance component of the first electrode layer 30 is small in the first region 211 near the first bus bar 65, so that a current easily flows.
  • the influence of the resistance component of the first electrode layer 30 becomes large, and it is difficult for the current to flow. That is, when the first auxiliary electrode 60 is not provided, the current flowing in the plane is not uniform.
  • the arrangement density of the first through hole 281 is adjusted based on the distance from the first bus bar 65. Specifically, the arrangement density of the first through hole 281 increases as the distance from the first bus bar 65 increases. The arrangement density of the first through hole 281 is smaller as it is closer to the first bus bar 65. For example, the number of first through holes 281 included in the first region 211 near the first bus bar 65 is smaller than the number of first through holes 281 included in the second region 212 away from the first bus bar 65. In the second region 212, which has a large number of first through holes 281, the resistance becomes small and current easily flows. Since the current easily flows in the second region 212 away from the first bus bar 65, the current flowing in the plane can be made uniform.
  • the plurality of first through holes 281 may be provided so as to overlap the plurality of first metal wires 61 in a plan view, and may be provided in any of the second metal wires 62. It does not have to overlap.
  • the plurality of first through holes 281 may be provided so as to overlap the plurality of second metal wires 62 in a plan view, and may be provided in any of the first metal wires 61. It does not have to overlap.
  • the first through hole 281 is provided in the center of two adjacent intersections of the first metal wire 61 or the second metal wire 62, respectively.
  • the plurality of first through holes 281 may include a through hole provided at the intersection and a through hole provided at a place other than the intersection in a mixed manner. ..
  • the plurality of first through holes 281 provided other than the intersection include a through hole overlapping the first metal wire 61 and a through hole overlapping the second metal wire 62.
  • the arrangement of the second through hole 291 is the same as the arrangement of the first through hole 281. That is, the plurality of second through holes 291 may be provided at the intersection of the first metal wire 71 and the second metal wire 72, as shown in FIG. 13 or FIG. Alternatively, as shown in FIG. 14 or 15, the plurality of second through holes 291 may be provided at a portion other than the intersection of the first metal wire 71 and the second metal wire 72.
  • the arrangement densities of the plurality of second through holes 291 differ depending on the region.
  • the arrangement density of the second through hole 291 increases as the distance from the second bus bar 75 increases.
  • the first bus bar 65 is provided on the negative side in the x-axis direction
  • the second bus bar 75 is provided on the positive side in the x-axis direction. Therefore, as shown in FIG. 11, the first through hole 281 is arranged so that the arrangement density increases toward the positive side in the x-axis direction.
  • the second through hole 291 is arranged so that the arrangement density increases toward the negative side in the x-axis direction.
  • the first through hole 281 is larger than the line width of the first metal wire 61 and the line width of the second metal wire 62. Specifically, the first through hole 281 completely exposes the intersection of the first metal wire 61 and the second metal wire 62. As a result, the contact area between the first electrode layer 30 provided in the first through hole 281 and the first metal wire 61 and the second metal wire 62 can be increased, so that the contact resistance can be reduced. Further, since the size of the first through hole 281 is large, the step formed in the first electrode layer 30 becomes small, and the occurrence of film breakage can be suppressed. The same applies to the examples shown in FIGS. 14 to 16.
  • each of the plurality of first through holes 281 may be arranged inside the first metal wire 61 in a plan view, as in FIG.
  • the plan view shape of the first through hole 281 is a rectangle such as a square, but it may be a circle.
  • the opening diameter of the first through hole 281 may be shorter than the line width w1 of the first metal wire 61 and the line width w2 of the second metal wire 62.
  • the shape and size of the second through hole 291 in a plan view are the same as those of the first through hole 281.
  • the optical state of the dimming panel 201 is controlled by the control circuit 3 shown in FIG. Specifically, the control circuit 3 controls the power supply 2 and changes the magnitude and polarity of the voltage applied to each of the first electrode layer 30 and the second electrode layer 40 to change the optics of the dimming panel 201. The state can be changed.
  • the optical state of the dimming panel 201 is the translucent state (transparent state) shown in FIG. 12A.
  • the applied voltage is 0V
  • the metal ions contained in the electrochromic layer 50 are not precipitated. Therefore, the electrochromic layer 50 is in a translucent state in which light is transmitted.
  • the refractive indexes of the first substrate 10, the first insulating layer 80, the first electrode layer 30, the electrochromic layer 50, the second electrode layer 40, the second insulating layer 90, and the second substrate 20 are substantially equal. The incident light passes as it is. That is, the optical state of the dimming panel 201 becomes a transparent state.
  • the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40.
  • the optical state of the dimming panel 201 is the reflection state shown in FIG. 12B. Since the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40, the metal in the electrochromic layer 50 is deposited on the surface of the first electrode layer 30 as a metal thin film 52. Therefore, the dimming panel 201 is in a reflective state that reflects light.
  • the metal thin film 52 is formed on the surface of the first electrode layer 30 in FIG. 12B, the metal thin film 52 may be formed on the surface of the second electrode layer 40.
  • the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is higher than the potential of the second electrode layer 40, thereby forming a metal thin film. 52 is formed on the surface of the second electrode layer 40.
  • FIG. 17 is a cross-sectional view of the dimming panel 301 according to this modified example.
  • the dimming panel 101 shown in FIG. 17 is not provided with the second auxiliary electrode 70 and the second insulating layer 90 as compared with the dimming panel 201 according to the second embodiment.
  • the second electrode layer 40 is directly provided on the main surface of the second substrate 20.
  • the arrangement and size of the first through hole and the second through hole are different from those in the second embodiment.
  • the differences from the second embodiment will be mainly described, and the common points will be omitted or simplified.
  • FIG. 18 is a cross-sectional view of the dimming panel 401 according to the present embodiment.
  • the cross-sectional view shown in FIG. 18 is the same as that in FIG. Specifically, FIG. 18A shows a cross section of the first substrate 10 side along a line along the first metal wire 61 (corresponding to the XIA-XIA wire in FIG. 10).
  • FIG. 18B shows a cross section of the second substrate 20 side along a line along the first metal wire 71 (corresponding to the XIB-XIB wire of FIG. 10).
  • the first insulating layer 80 is replaced with the first through hole 281 as compared with the dimming panel 201 according to the second embodiment.
  • the difference is that the first through hole 481 is provided and the second through hole 491 is provided in the second insulating layer 90 instead of the second through hole 291.
  • the arrangement densities of the plurality of first through holes 481 are uniform.
  • the area of the plurality of first through holes 481 varies depending on the region.
  • the placement densities of the plurality of second through holes 491 are uniform.
  • the area of the plurality of second through holes 491 varies depending on the region.
  • FIG. 19 is a plan view showing an arrangement example of the first through hole 481 provided in the first insulating layer 80 of the dimming panel 401 according to the present embodiment.
  • a plurality of first through holes 481 are provided at the intersection of the first metal wire 61 and the second metal wire 62 in a plan view.
  • the plurality of first through holes 481 include through holes having different sizes in the plan view.
  • the area of the first through hole 481 is larger as the distance from the first bus bar 65 is larger, and is smaller as the area is closer to the first bus bar 65.
  • the area of the first through hole 481 gradually increases as the distance from the first bus bar 65 increases.
  • the area of the first through hole 481 overlapping the one second metal wire 62 is different from the area of the first through hole 481 overlapping the second metal wire 62 adjacent thereto. That is, in the nine first through holes 481 included in the first region 211, the area of the first through hole 481 closest to the first bus bar 65 is the area of the first through hole 481 farthest from the first bus bar 65.
  • the plurality of first through holes 481 may include two types of through holes having different areas.
  • the first substrate 10 is divided into two by a dividing line parallel to the y-axis, and the areas of the first through holes 481 in the region on the first bus bar 65 side are equal to each other and opposite to those of the first bus bar 65. It may be smaller than the area of the first through hole 481 in the side region.
  • the nine first through holes 481 included in the first region 211 are all the same size, and are smaller than the nine first through holes 481 included in the second region 212.
  • the plurality of first through holes 481 may include three or more types of through holes having different areas.
  • the first substrate 10 may be virtually divided into a plurality of regions according to the distance from the first bus bar 65, and the areas of the first through holes 481 may be equal to each other in the divided regions. ..
  • the second through hole 491 The same applies to the second through hole 491. Specifically, the area of the second through hole 491 increases as the distance from the second bus bar 75 increases, and decreases as the area approaches the second bus bar 75. Therefore, as shown in FIG. 18, the first through hole 481 is provided so that the area increases toward the positive side in the x-axis direction. The second through hole 491 is arranged so that the area increases toward the negative side in the x-axis direction.
  • the first through hole 481 is provided at the intersection of the first metal wire 61 and the second metal wire 62, but is not limited to this. Similar to the case shown in FIGS. 14 to 16, the first through hole 481 may be provided at a portion other than the intersection of the first metal wire 61 and the second metal wire 62. That is, at least one of the plurality of first through holes 481 does not have to overlap the first metal wire 61 and the second metal wire 62 in a plan view. Alternatively, at least one of the plurality of first through holes 481 may overlap the second metal wire 62 and not overlap the first metal wire 61 in a plan view. The same applies to the second through hole 491.
  • the first insulating layer 80 may be provided with a plurality of first through holes 281 having different arrangement densities depending on the region, as in the second embodiment.
  • the second insulating layer 90 may be provided with a plurality of second through holes 291 having different arrangement densities depending on the region, as in the second embodiment. That is, the second embodiment and the third embodiment may be combined.
  • the plurality of first through holes 481 may differ not only in area but also in arrangement density depending on the region.
  • the arrangement density of the plurality of second through holes 491 may differ depending on the region.
  • one of the plurality of first through holes 281 or 481 and the plurality of second through holes 291 or 491 may have a uniform arrangement density and may have the same area.
  • the dimming panel according to one or more embodiments has been described above based on the embodiments, but the present disclosure is not limited to these embodiments. As long as the gist of the present disclosure is not deviated, various modifications that can be conceived by those skilled in the art are applied to the present embodiment, and a form constructed by combining components in different embodiments is also included in the scope of the present disclosure. Is done.
  • the optical state of the electrochromic layer 50 may include a transparent state having a sufficiently high transmittance and a colored state having a low transmittance (semi-transparent state).
  • a transparent state having a sufficiently high transmittance and a colored state having a low transmittance (semi-transparent state).
  • the thickness of the deposited metal thin film 52 can be adjusted.
  • a colored state can be formed by precipitating the thin metal thin film 52.
  • the first auxiliary electrode 60 and the second auxiliary electrode 70 may have a striped shape in a plan view.
  • the first auxiliary electrode 60 may include a plurality of first metal wires 61 and may not include the second metal wire 62.
  • the first auxiliary electrode 60 may include a plurality of second metal wires 62 and may not include the first metal wire 61.
  • the second auxiliary electrode 70 may be square regions including three metal wires. ..
  • first auxiliary electrode 60 and the second auxiliary electrode 70 may coincide with each other in a plan view.
  • the plurality of first metal wires 61 and the plurality of first metal wires 71 may partially or completely overlap in a plan view.
  • the plurality of second metal wires 62 and the plurality of second metal wires 72 may partially or completely overlap in a plan view.
  • first metal wire 61 and the second metal wire 62 may intersect at an angle. Further, the line width and spacing of the first metal wire 61 do not have to be uniform in the plane. The same applies to the second metal wire 62. The same applies to the first metal wire 71 and the second metal wire 72 of the second auxiliary electrode 70.
  • the first auxiliary electrode 60 and the second auxiliary electrode 70 may be made of a material having a lower resistance than the material constituting the first electrode layer 30 and the second electrode layer 40, and may be a material having translucency. It may be formed by using.
  • the refractive indexes of the first auxiliary electrode 60 and the second auxiliary electrode 70 are the first substrate 10, the second substrate 20, the first electrode layer 30, the second electrode layer 40, the first insulating layer 80, and the first.
  • the refractive index of each of the two insulating layers 90 may be equal to or different from each other. By making the refractive indexes of the layers equal, the transparency of the dimming panel 1 in the translucent state can be enhanced.
  • the placement density may be high.
  • the arrangement density of the first through holes 281 becomes larger toward the center of the first substrate 10.
  • the arrangement density of the first through holes 281. Becomes larger.
  • the arrangement density of the first through holes 281 becomes larger toward the center of the first substrate 10.
  • At least one of the arrangement density and the area of the first through hole 281 may be adjusted independently of the distance from the first bus bar 65. For example, in a region where the thickness of the first electrode layer 30 is smaller than the others, the resistance of the first electrode layer 30 increases, so that at least one of the arrangement density and the area of the first through hole 281 may be increased. The same may be applied to at least one of the arrangement density and the area of the second through hole 291.
  • one aspect of the present disclosure may be realized as a panel device including a dimming panel according to each embodiment and a control circuit 3 for controlling the power supply 2.
  • the panel device may include a power supply 2.
  • the present disclosure can be used as a dimming panel capable of suppressing a voltage drop in an electrode, and can be used, for example, as a building material such as a window of a building or a moving body.
  • Control circuit 10 1st substrate 20 2nd substrate 30 1st electrode layer 40 2nd electrode layer 50 Electrochromic layer 52 Metal thin film 60 1st auxiliary electrode 61, 71 1st metal wire 62, 72 2nd metal wire 65 1st bus bar 70 2nd auxiliary electrode 75 2nd bus bar 80 1st insulating layer 81, 281, 481 1st through hole 90 2nd insulating layer 91, 291, 491 2nd Through hole 211 1st region 212 2nd region

Abstract

This light control panel (1) is provided with: a first substrate (10) that has light transmitting properties; a second substrate (20) that is arranged so as to face the first substrate (10), while having light transmitting properties; an electrochromic layer (50) that is arranged between the first substrate (10) and the second substrate (20); a first electrode layer (30) that is arranged between the electrochromic layer (50) and the first substrate (10), while having light transmitting properties; a second electrode layer (40) that is arranged between the electrochromic layer (50) and the second substrate (20), while having light transmitting properties; a first auxiliary electrode (60) that is arranged between the first electrode layer (30) and the first substrate (10), while containing a metal; and a first insulating layer (80) that is arranged between the first auxiliary electrode (60) and the first electrode layer (30), while having light transmitting properties. The first insulating layer (80) has a plurality of first through holes (81). The first electrode layer (30) is electrically connected to the first auxiliary electrode (60) via the plurality of first through holes (81).

Description

調光パネルDimming panel
 本開示は、調光パネルに関する。 This disclosure relates to a dimming panel.
 特許文献1には、透明電極内での電圧降下を抑制するために、低抵抗な補助電極を備えるエレクトロクロミック素子が開示されている。 Patent Document 1 discloses an electrochromic element provided with a low resistance auxiliary electrode in order to suppress a voltage drop in the transparent electrode.
特開2016-133648号公報Japanese Unexamined Patent Publication No. 2016-133648
 上記従来のエレクトロクロミック素子では、金属材料を用いて形成された補助電極が用いられている。しかしながら、補助電極に含まれる金属は、エレクトロクロミック層に含まれる溶媒に接触した場合に溶解するという問題がある。特許文献1では、補助電極とエレクトロクロミック層との間にITO膜が設けられていることが開示されているが、ITO膜は結晶欠陥を含んでおり、補助電極の保護膜としては不十分である。補助電極が溶け出すことにより、透明電極の低抵抗化機能が損なわれる。 In the above-mentioned conventional electrochromic element, an auxiliary electrode formed by using a metal material is used. However, there is a problem that the metal contained in the auxiliary electrode dissolves when it comes into contact with the solvent contained in the electrochromic layer. Patent Document 1 discloses that an ITO film is provided between the auxiliary electrode and the electrochromic layer, but the ITO film contains crystal defects and is insufficient as a protective film for the auxiliary electrode. be. The melting of the auxiliary electrode impairs the resistance-reducing function of the transparent electrode.
 そこで、本開示は、電極内での電圧降下を抑制することができる調光パネルを提供する。 Therefore, the present disclosure provides a dimming panel capable of suppressing a voltage drop in the electrode.
 本開示の一態様に係る調光パネルは、透光性を有する第1基板と、前記第1基板に対向して配置された、透光性を有する第2基板と、前記第1基板と前記第2基板との間に配置されたエレクトロクロミック層と、前記エレクトロクロミック層と前記第1基板との間に配置された、透光性を有する第1電極層と、前記エレクトロクロミック層と前記第2基板との間に配置された、透光性を有する第2電極層と、前記第1電極層と前記第1基板との間に配置された、金属を含む第1補助電極と、前記第1補助電極と前記第1電極層との間に配置された、透光性を有する第1絶縁層とを備え、前記第1絶縁層は、複数の第1貫通孔を有し、前記第1電極層は、前記複数の第1貫通孔を介して前記第1補助電極に電気的に接続されている。 The dimming panel according to one aspect of the present disclosure includes a first substrate having translucency, a second substrate having translucency arranged opposite to the first substrate, the first substrate, and the above. An electrochromic layer arranged between the second substrate, a translucent first electrode layer arranged between the electrochromic layer and the first substrate, and the electrochromic layer and the first substrate. A second electrode layer having translucency arranged between the two substrates, a first auxiliary electrode containing metal arranged between the first electrode layer and the first substrate, and the first auxiliary electrode. A translucent first insulating layer arranged between the auxiliary electrode and the first electrode layer is provided, and the first insulating layer has a plurality of first through holes, and the first insulating layer has a plurality of first through holes. The electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes.
 本開示によれば、電極内での電圧降下を抑制することができる。 According to the present disclosure, the voltage drop in the electrode can be suppressed.
図1は、実施の形態1に係る調光パネルの構成を示す図である。FIG. 1 is a diagram showing a configuration of a dimming panel according to the first embodiment. 図2は、図1のIIA-IIA線及びIIB-IIB線で示される位置での調光パネルの断面図である。FIG. 2 is a cross-sectional view of the dimming panel at the positions indicated by the lines IIA-IIA and IIB-IIB of FIG. 図3Aは、図1のIII-III線で示される位置での、透明状態における調光パネルの断面図である。FIG. 3A is a cross-sectional view of the dimming panel in the transparent state at the position shown by lines III-III in FIG. 図3Bは、図1のIII-III線で示される位置での、反射状態における調光パネルの断面図である。FIG. 3B is a cross-sectional view of the dimming panel in the reflective state at the position shown by lines III-III in FIG. 図4は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第1例を示す平面図である。FIG. 4 is a plan view showing a first example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel. 図5は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第2例を示す平面図である。FIG. 5 is a plan view showing a second example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel. 図6は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第3例を示す平面図である。FIG. 6 is a plan view showing a third example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel. 図7は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第4例を示す平面図である。FIG. 7 is a plan view showing a fourth example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel. 図8は、第1貫通孔と第1補助電極との拡大平面図である。FIG. 8 is an enlarged plan view of the first through hole and the first auxiliary electrode. 図9は、実施の形態1の変形例に係る調光パネルの断面図である。FIG. 9 is a cross-sectional view of a dimming panel according to a modified example of the first embodiment. 図10は、実施の形態2に係る調光パネルの構成を示す図である。FIG. 10 is a diagram showing a configuration of a dimming panel according to a second embodiment. 図11は、図10のXIA-XIA線及びXIB-XIB線で示される位置での調光パネルの断面図である。FIG. 11 is a cross-sectional view of the dimming panel at the positions indicated by the XIA-XIA line and the XIB-XIB line of FIG. 図12Aは、図10のXII-XII線で示される位置での、透明状態における調光パネルの断面図である。FIG. 12A is a cross-sectional view of the dimming panel in the transparent state at the position shown by the line XII-XII in FIG. 図12Bは、図10のXII-XII線で示される位置での、反射状態における調光パネルの断面図である。FIG. 12B is a cross-sectional view of the light control panel in the reflection state at the position shown by the line XII-XII in FIG. 図13は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第1例を示す平面図である。FIG. 13 is a plan view showing a first example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel. 図14は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第2例を示す平面図である。FIG. 14 is a plan view showing a second example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel. 図15は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第3例を示す平面図である。FIG. 15 is a plan view showing a third example of the arrangement of the first through holes provided in the first insulating layer of the dimming panel. 図16は、調光パネルの第1絶縁層に設けられた第1貫通孔の配置の第4例を示す平面図である。FIG. 16 is a plan view showing a fourth example of the arrangement of the first through hole provided in the first insulating layer of the dimming panel. 図17は、実施の形態2の変形例に係る調光パネルの断面図である。FIG. 17 is a cross-sectional view of a dimming panel according to a modified example of the second embodiment. 図18は、実施の形態3に係る調光パネルの断面図である。FIG. 18 is a cross-sectional view of the dimming panel according to the third embodiment. 図19は、実施の形態3に係る調光パネルの第1絶縁層に設けられた第1貫通孔の配置例を示す平面図である。FIG. 19 is a plan view showing an arrangement example of the first through hole provided in the first insulating layer of the light control panel according to the third embodiment.
 (本開示の概要)
 本開示の一態様に係る調光パネルは、透光性を有する第1基板と、前記第1基板に対向して配置された、透光性を有する第2基板と、前記第1基板と前記第2基板との間に配置されたエレクトロクロミック層と、前記エレクトロクロミック層と前記第1基板との間に配置された、透光性を有する第1電極層と、前記エレクトロクロミック層と前記第2基板との間に配置された、透光性を有する第2電極層と、前記第1電極層と前記第1基板との間に配置された、金属を含む第1補助電極と、前記第1補助電極と前記第1電極層との間に配置された、透光性を有する第1絶縁層とを備える。前記第1絶縁層は、複数の第1貫通孔を有する。前記第1電極層は、前記複数の第1貫通孔を介して前記第1補助電極に電気的に接続されている。
(Summary of this disclosure)
The dimming panel according to one aspect of the present disclosure includes a first substrate having translucency, a second substrate having translucency arranged opposite to the first substrate, the first substrate, and the above. An electrochromic layer arranged between the second substrate, a translucent first electrode layer arranged between the electrochromic layer and the first substrate, and the electrochromic layer and the first substrate. A second electrode layer having translucency arranged between the two substrates, a first auxiliary electrode containing metal arranged between the first electrode layer and the first substrate, and the first auxiliary electrode. (1) A translucent first insulating layer arranged between the auxiliary electrode and the first electrode layer is provided. The first insulating layer has a plurality of first through holes. The first electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes.
 これにより、第1補助電極は、複数の第1貫通孔以外の部分が第1絶縁層によって覆われているので、第1補助電極の全面が第1電極層に覆われている場合に比べて、第1補助電極の金属の溶出を抑制することができる。また、第1絶縁層がエレクトロクロミック層に直接接触しないように、第1絶縁層とエレクトロクロミック層との間に第1電極層が配置されている。このため、エレクトロクロミック層の光学状態の変化が面内で均一に行われやすくなる。 As a result, in the first auxiliary electrode, the portion other than the plurality of first through holes is covered with the first insulating layer, so that the entire surface of the first auxiliary electrode is covered with the first electrode layer, as compared with the case where the entire surface of the first auxiliary electrode is covered with the first electrode layer. , The elution of the metal of the first auxiliary electrode can be suppressed. Further, the first electrode layer is arranged between the first insulating layer and the electrochromic layer so that the first insulating layer does not come into direct contact with the electrochromic layer. Therefore, the change in the optical state of the electrochromic layer is likely to occur uniformly in the plane.
 このように、本態様に係る調光パネルによれば、光学状態の変化の面内均一性を高めることができ、かつ、電極内での電圧降下を抑制することができる。電圧降下が抑制されることで、光学状態の変化の反応速度及び面内均一性を高めることができる。 As described above, according to the dimming panel according to this aspect, the in-plane uniformity of the change in the optical state can be enhanced, and the voltage drop in the electrode can be suppressed. By suppressing the voltage drop, the reaction rate and in-plane uniformity of changes in the optical state can be improved.
 また、例えば、前記第1補助電極は、各々が、第1方向に延びる複数の第1金属線を含んでもよい。 Further, for example, each of the first auxiliary electrodes may include a plurality of first metal wires extending in the first direction.
 これにより、第1補助電極をストライプ状に形成することができるので、例えば、第1金属線の細線化によって第1補助電極を目立ちにくくすることができる。 As a result, the first auxiliary electrode can be formed in a striped shape, so that the first auxiliary electrode can be made inconspicuous by, for example, thinning the first metal wire.
 また、例えば、前記第1補助電極は、さらに、各々が、前記第1方向に交差する第2方向に延び、前記複数の第1金属線の少なくとも1つに交差する複数の第2金属線を含んでもよい。 Further, for example, the first auxiliary electrode further extends a plurality of second metal wires each extending in a second direction intersecting the first direction and intersecting at least one of the plurality of first metal wires. It may be included.
 これにより、第1補助電極を格子状に形成することができるので、例えば、第1金属線及び第2金属線の細線化によって第1補助電極を目立ちにくくすることができる。また、第1金属線及び第2金属線の1本が断線した場合であっても、他の金属線からの回り込みによって面内の電位の均一性を保つことができる。このため、電極内での電圧降下を抑制することができる。 As a result, the first auxiliary electrode can be formed in a grid pattern, so that the first auxiliary electrode can be made inconspicuous by thinning the first metal wire and the second metal wire, for example. Further, even when one of the first metal wire and the second metal wire is broken, the in-plane potential uniformity can be maintained by wrapping around from the other metal wire. Therefore, the voltage drop in the electrode can be suppressed.
 また、例えば、前記複数の第1貫通孔は、平面視において、前記第1金属線と前記第2金属線との交差部に設けられていてもよい。 Further, for example, the plurality of first through holes may be provided at the intersection of the first metal wire and the second metal wire in a plan view.
 これにより、交差部で第1電極層と第1補助電極とが電気的に接続されるので、第1金属線及び第2金属線の1本が断線した場合であっても、他の金属線からの回り込みによって面内の電位の均一性を保つことができる。このため、電極内での電圧降下を抑制することができる。 As a result, the first electrode layer and the first auxiliary electrode are electrically connected at the intersection, so that even if one of the first metal wire and the second metal wire is broken, the other metal wire is connected. The uniformity of the in-plane potential can be maintained by wrapping around from. Therefore, the voltage drop in the electrode can be suppressed.
 また、例えば、前記複数の第1貫通孔の各々は、平面視において、前記第1金属線の内側に配置されていてもよい。 Further, for example, each of the plurality of first through holes may be arranged inside the first metal wire in a plan view.
 これにより、第1絶縁層を覆い、かつ、複数の第1貫通孔内に設けられる第1電極層の段差が抑制されるので、第1電極の膜切れの発生を抑制することができる。 As a result, the step of the first electrode layer provided in the plurality of first through holes is suppressed while covering the first insulating layer, so that the occurrence of film breakage of the first electrode can be suppressed.
 また、例えば、前記第1絶縁層は、無機材料を用いて形成されていてもよい。 Further, for example, the first insulating layer may be formed by using an inorganic material.
 これにより、金属の溶出抑制機能に優れた第1絶縁層を形成することができる。 This makes it possible to form a first insulating layer having an excellent metal elution suppressing function.
 また、例えば、本開示の一態様に係る調光パネルは、さらに、前記第2電極層と前記第2基板との間に配置された、金属を含む第2補助電極と、前記第2補助電極と前記第2電極層との間に配置された、透光性を有する第2絶縁層とを備えてもよい。前記第2絶縁層は、複数の第2貫通孔を有する。前記第2電極層は、前記複数の第2貫通孔を介して前記第2補助電極に電気的に接続されている。 Further, for example, the dimming panel according to one aspect of the present disclosure further includes a second auxiliary electrode containing metal, which is arranged between the second electrode layer and the second substrate, and the second auxiliary electrode. A second insulating layer having translucency, which is arranged between the second electrode layer and the second electrode layer, may be provided. The second insulating layer has a plurality of second through holes. The second electrode layer is electrically connected to the second auxiliary electrode via the plurality of second through holes.
 これにより、第1電極層及び第2電極層の両方において電圧降下を抑制することができる。したがって、光学状態の変化の反応速度及び面内均一性を更に高めることができる。 Thereby, the voltage drop can be suppressed in both the first electrode layer and the second electrode layer. Therefore, the reaction rate and in-plane uniformity of changes in the optical state can be further increased.
 また、例えば、前記第1補助電極と前記第2補助電極とはそれぞれ、第1方向に延びる複数の第1金属線を含み、前記第1補助電極が含む複数の第1金属線と、前記第2補助電極が含む複数の第1金属線とは、平面視で重ならないように配置されていてもよい。 Further, for example, the first auxiliary electrode and the second auxiliary electrode each include a plurality of first metal wires extending in the first direction, and the plurality of first metal wires included in the first auxiliary electrode and the first metal wire are included. The plurality of first metal wires included in the two auxiliary electrodes may be arranged so as not to overlap with each other in a plan view.
 第1補助電極と第2補助電極とが平面視で重なる部分では電流集中が起こりやすくなる。第1補助電極と第2補助電極とを重ならないように配置することで、電流集中を抑制し、光学状態の面内均一性を高めることができる。また、第1補助電極及び第2補助電極に起因するモアレの発生を抑制することができる。 Current concentration is likely to occur in the portion where the first auxiliary electrode and the second auxiliary electrode overlap in a plan view. By arranging the first auxiliary electrode and the second auxiliary electrode so as not to overlap each other, current concentration can be suppressed and in-plane uniformity of the optical state can be improved. In addition, it is possible to suppress the occurrence of moire caused by the first auxiliary electrode and the second auxiliary electrode.
 また、本開示の一態様に係る調光パネルは、透光性を有する第1基板と、前記第1基板に対向して配置された、透光性を有する第2基板と、前記第1基板と前記第2基板との間に配置されたエレクトロクロミック層と、前記エレクトロクロミック層と前記第1基板との間に配置された、透光性を有する第1電極層と、前記エレクトロクロミック層と前記第2基板との間に配置された、透光性を有する第2電極層と、前記第1電極層と前記第1基板との間に配置された、金属を含む第1補助電極と、前記第1補助電極と前記第1電極層との間に配置された、透光性を有する第1絶縁層とを備える。前記第1絶縁層は、複数の第1貫通孔を有する。前記第1電極層は、前記複数の第1貫通孔を介して前記第1補助電極に電気的に接続されている。平面視において、前記複数の第1貫通孔の配置密度及び面積の少なくとも一方は、領域によって異なっている。 Further, the dimming panel according to one aspect of the present disclosure includes a first substrate having translucency, a second substrate having translucency arranged opposite to the first substrate, and the first substrate. A translucent first electrode layer arranged between the electrochromic layer and the first substrate, an electrochromic layer arranged between the electrochromic layer and the second substrate, and the electrochromic layer. A second electrode layer having translucency, which is arranged between the second substrate, and a first auxiliary electrode containing metal, which is arranged between the first electrode layer and the first substrate. It includes a translucent first insulating layer arranged between the first auxiliary electrode and the first electrode layer. The first insulating layer has a plurality of first through holes. The first electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes. In a plan view, at least one of the arrangement densities and areas of the plurality of first through holes differs depending on the region.
 これにより、第1補助電極は、複数の第1貫通孔以外の部分が第1絶縁層によって覆われているので、第1補助電極の全面が第1電極層に覆われている場合に比べて、第1補助電極の金属の溶出を抑制することができる。また、第1絶縁層がエレクトロクロミック層に直接接触しないように、第1絶縁層とエレクトロクロミック層との間に第1電極層が配置されている。このため、エレクトロクロミック層の光学状態の変化が面内で均一に行われやすくなる。 As a result, in the first auxiliary electrode, the portion other than the plurality of first through holes is covered with the first insulating layer, so that the entire surface of the first auxiliary electrode is covered with the first electrode layer, as compared with the case where the entire surface of the first auxiliary electrode is covered with the first electrode layer. , The elution of the metal of the first auxiliary electrode can be suppressed. Further, the first electrode layer is arranged between the first insulating layer and the electrochromic layer so that the first insulating layer does not come into direct contact with the electrochromic layer. Therefore, the change in the optical state of the electrochromic layer is likely to occur uniformly in the plane.
 さらに、本態様に係る調光パネルによれば、第1貫通孔の配置密度及び面積の少なくとも一方が、平面視における領域によって異なっているので、第1電極層の面内で抵抗の異なる領域が形成される。このため、例えば、電流が流れにくい領域の抵抗を小さくすることで、当該領域を流れる電流を大きくすることができる。領域によって抵抗を異ならせることで、面内で流れる電流を均一に近づけることができる。 Further, according to the dimming panel according to this aspect, at least one of the arrangement density and the area of the first through hole differs depending on the region in the plan view, so that the region having different resistance in the plane of the first electrode layer is formed. It is formed. Therefore, for example, by reducing the resistance in the region where the current is difficult to flow, the current flowing in the region can be increased. By making the resistance different depending on the region, the current flowing in the plane can be made uniform.
 このように、本態様に係る調光パネルによれば、光学状態の変化の面内均一性を高めることができ、かつ、電極内での電圧降下を抑制することができる。電圧降下が抑制されることで、光学状態の変化の反応速度及び面内均一性を高めることができる。 As described above, according to the dimming panel according to this aspect, the in-plane uniformity of the change in the optical state can be enhanced, and the voltage drop in the electrode can be suppressed. By suppressing the voltage drop, the reaction rate and in-plane uniformity of changes in the optical state can be improved.
 また、例えば、前記複数の第1貫通孔の面積は、互いに等しく、前記複数の第1貫通孔の配置密度は、領域によって異なっていてもよい。 Further, for example, the areas of the plurality of first through holes are equal to each other, and the arrangement densities of the plurality of first through holes may differ depending on the region.
 これにより、第1貫通孔の配置密度(単位面積当たりの個数)によって、第1補助電極と第1電極層との単位面積当たりの接触面積が変化する。接触面積が大きい程、抵抗を小さくすることができ、接触面積が小さい程、抵抗を大きくすることができる。このため、配置密度の調整によって領域の抵抗を異ならせることができ、面内で流れる電流を均一に近づけることができる。 As a result, the contact area between the first auxiliary electrode and the first electrode layer per unit area changes depending on the arrangement density of the first through holes (the number of holes per unit area). The larger the contact area, the smaller the resistance, and the smaller the contact area, the larger the resistance. Therefore, the resistance of the region can be made different by adjusting the arrangement density, and the current flowing in the plane can be made uniform.
 また、例えば、前記複数の第1貫通孔の配置密度は、均一であり、前記複数の第1貫通孔の面積は、領域によって異なっていてもよい。 Further, for example, the arrangement density of the plurality of first through holes is uniform, and the areas of the plurality of first through holes may differ depending on the region.
 これにより、第1貫通孔の面積によって、第1補助電極と第1電極層との接触面積が変化する。このため、面積の調整によって領域の抵抗を異ならせることができ、面内で流れる電流を均一に近づけることができる。 As a result, the contact area between the first auxiliary electrode and the first electrode layer changes depending on the area of the first through hole. Therefore, the resistance of the region can be made different by adjusting the area, and the current flowing in the plane can be made uniform.
 また、例えば、本開示の一態様に係る調光パネルは、さらに、前記第1電極層の端部に接続された第1給電端子部を備えてもよい。前記配置密度及び前記面積の少なくとも一方は、前記第1給電端子部から離れる程、大きくてもよい。 Further, for example, the dimming panel according to one aspect of the present disclosure may further include a first power feeding terminal portion connected to an end portion of the first electrode layer. At least one of the arrangement density and the area may be increased as the distance from the first power feeding terminal portion increases.
 第1給電端子部に近い領域では電流が流れやすく、第1給電端子部から離れた領域では電流が流れにくい。このため、第1給電端子部から離れる程、配置密度及び面積の少なくとも一方が大きくなることで、面内で流れる電流を均一に近づけることができる。 Current easily flows in the region near the first power supply terminal, and it is difficult for current to flow in the region away from the first power supply terminal. Therefore, as the distance from the first power feeding terminal portion increases, at least one of the arrangement density and the area increases, so that the current flowing in the plane can be made uniform.
 また、例えば、本開示の一態様に係る調光パネルは、さらに、前記第2電極層と前記第2基板との間に配置された、金属を含む第2補助電極と、前記第2補助電極と前記第2電極層との間に配置された、透光性を有する第2絶縁層とを備えてもよい。前記第2絶縁層は、複数の第2貫通孔を有する。前記第2電極層は、前記複数の第2貫通孔を介して前記第2補助電極に電気的に接続されている。平面視において、前記複数の第2貫通孔の配置密度及び面積の少なくとも一方は、領域によって異なっていてもよい。 Further, for example, the dimming panel according to one aspect of the present disclosure further includes a second auxiliary electrode containing metal, which is arranged between the second electrode layer and the second substrate, and the second auxiliary electrode. A second insulating layer having translucency, which is arranged between the second electrode layer and the second electrode layer, may be provided. The second insulating layer has a plurality of second through holes. The second electrode layer is electrically connected to the second auxiliary electrode via the plurality of second through holes. In a plan view, at least one of the arrangement density and the area of the plurality of second through holes may differ depending on the region.
 これにより、第1電極層及び第2電極層の両方において電圧降下を抑制することができ、かつ、面内で流れる電流を均一に近づけることができる。したがって、光学状態の変化の反応速度及び面内均一性を更に高めることができる。 As a result, the voltage drop can be suppressed in both the first electrode layer and the second electrode layer, and the current flowing in the plane can be brought close to uniform. Therefore, the reaction rate and in-plane uniformity of changes in the optical state can be further increased.
 以下では、実施の形態について、図面を参照しながら具体的に説明する。 Hereinafter, the embodiment will be specifically described with reference to the drawings.
 なお、以下で説明する実施の形態は、いずれも包括的又は具体的な例を示すものである。以下の実施の形態で示される数値、形状、材料、構成要素、構成要素の配置位置及び接続形態、ステップ、ステップの順序などは、一例であり、本開示を限定する主旨ではない。また、以下の実施の形態における構成要素のうち、独立請求項に記載されていない構成要素については、任意の構成要素として説明される。 Note that all of the embodiments described below show comprehensive or specific examples. Numerical values, shapes, materials, components, arrangement positions and connection forms of components, steps, order of steps, etc. shown in the following embodiments are examples, and are not intended to limit the present disclosure. Further, among the components in the following embodiments, the components not described in the independent claims will be described as arbitrary components.
 また、各図は、模式図であり、必ずしも厳密に図示されたものではない。したがって、例えば、各図において縮尺などは必ずしも一致しない。また、各図において、実質的に同一の構成については同一の符号を付しており、重複する説明は省略又は簡略化する。 In addition, each figure is a schematic view and is not necessarily exactly illustrated. Therefore, for example, the scales and the like do not always match in each figure. Further, in each figure, substantially the same configuration is designated by the same reference numerals, and duplicate description will be omitted or simplified.
 また、本明細書において、平行又は直交などの要素間の関係性を示す用語、及び、矩形又は円形などの要素の形状を示す用語、並びに、数値範囲は、厳格な意味のみを表す表現ではなく、実質的に同等な範囲、例えば数%程度の差異をも含むことを意味する表現である。 Further, in the present specification, terms indicating relationships between elements such as parallel or orthogonal, terms indicating the shape of elements such as rectangles or circles, and numerical ranges are not expressions expressing only strict meanings. , It is an expression meaning that a substantially equivalent range, for example, a difference of about several percent is included.
 また、本明細書において、「上方」及び「下方」という用語は、絶対的な空間認識における上方向(鉛直上方)及び下方向(鉛直下方)を指すものではなく、積層構成における積層順を基に相対的な位置関係により規定される用語として用いる。また、「上方」及び「下方」という用語は、2つの構成要素が互いに間隔を空けて配置されて2つの構成要素の間に別の構成要素が存在する場合のみならず、2つの構成要素が互いに密着して配置されて2つの構成要素が接する場合にも適用される。 Further, in the present specification, the terms "upper" and "lower" do not refer to the upward direction (vertically upward) and the downward direction (vertically downward) in absolute spatial recognition, but are based on the stacking order in the stacking configuration. It is used as a term defined by the relative positional relationship with. Also, the terms "upper" and "lower" are used not only when the two components are spaced apart from each other and another component exists between the two components, but also when the two components It also applies when the two components are placed in close contact with each other and touch each other.
 また、本明細書及び図面において、x軸、y軸及びz軸は、三次元直交座標系の三軸を示している。なお、z軸の正方向を鉛直上方としている。また、本明細書において、「厚み方向」とは、調光パネルの厚み方向を意味し、第1基板及び第2基板の主面に垂直な方向のことであり、「平面視」とは、第1基板又は第2基板の主面に対して垂直な方向から見たときのことをいう。 Further, in the present specification and drawings, the x-axis, y-axis, and z-axis indicate the three axes of the three-dimensional Cartesian coordinate system. The positive direction of the z-axis is vertically above. Further, in the present specification, the "thickness direction" means the thickness direction of the dimming panel, and is the direction perpendicular to the main surfaces of the first substrate and the second substrate, and the "planar view" means. It refers to a view from a direction perpendicular to the main surface of the first substrate or the second substrate.
 (実施の形態1)
 [1-1.構成]
 まず、実施の形態1に係る調光パネルの構成について、図1及び図2を用いて説明する。
(Embodiment 1)
[1-1. composition]
First, the configuration of the dimming panel according to the first embodiment will be described with reference to FIGS. 1 and 2.
 図1は、本実施の形態に係る調光パネル1の構成を示す図である。図1では、調光パネル1の第1補助電極60及び第2補助電極70の形状を示すため、第1基板10と第2基板20とを対角線方向にずらして図示している。実際には、第1基板10と第2基板20とは、その大部分が平面視で重なるように配置されている。また、図1では、調光パネル1が備える第1電極層30、第2電極層40、エレクトロクロミック層50、第1絶縁層80及び第2絶縁層90(図2を参照)の図示を省略している。 FIG. 1 is a diagram showing a configuration of a dimming panel 1 according to the present embodiment. In FIG. 1, in order to show the shapes of the first auxiliary electrode 60 and the second auxiliary electrode 70 of the dimming panel 1, the first substrate 10 and the second substrate 20 are shown diagonally offset. In reality, the first substrate 10 and the second substrate 20 are arranged so that most of them overlap each other in a plan view. Further, in FIG. 1, the first electrode layer 30, the second electrode layer 40, the electrochromic layer 50, the first insulating layer 80, and the second insulating layer 90 (see FIG. 2) included in the dimming panel 1 are not shown. doing.
 図1に示されるIIA-IIA線は、第1補助電極60のx軸方向に延びる第1金属線61に沿った線である。IIB-IIB線は、第2補助電極70のx軸方向に延びる第1金属線71に沿った線である。なお、IIA-IIA線とIIB-IIB線とは、平面視で重複しない位置である。つまり、第1補助電極60に含まれる第1金属線61と第2補助電極70に含まれる第1金属線71とは、平面視で重ならない位置に配置されている。 The IIA-IIA line shown in FIG. 1 is a line along the first metal wire 61 extending in the x-axis direction of the first auxiliary electrode 60. The IIB-IIB wire is a wire along the first metal wire 71 extending in the x-axis direction of the second auxiliary electrode 70. The IIA-IIA line and the IIB-IIB line are positions that do not overlap in a plan view. That is, the first metal wire 61 included in the first auxiliary electrode 60 and the first metal wire 71 included in the second auxiliary electrode 70 are arranged at positions where they do not overlap in a plan view.
 図2は、図1のIIA-IIA線及びIIB-IIB線で示される位置での調光パネル1の断面図である。具体的には、図2の(a)は、IIA-IIA線における第1基板10側の断面を示し、図2の(b)は、IIB-IIB線における第2基板20側の断面を示している。図2では、調光パネル1の異なる位置での断面を組み合わせて示している。これは、第1貫通孔81と第2貫通孔91との位置関係を分かりやすく示すためである。なお、図2では、第1基板10及び第2基板20の各々の中央付近を図示しており、端部(第1バスバー65及び第2バスバー75の近傍)は図示されていない。 FIG. 2 is a cross-sectional view of the dimming panel 1 at the positions indicated by the lines IIA-IIA and IIB-IIB of FIG. Specifically, FIG. 2A shows a cross section of the first substrate 10 side in the IIA-IIA line, and FIG. 2B shows a cross section of the second substrate 20 side in the IIB-IIB line. ing. FIG. 2 shows a combination of cross sections of the dimming panel 1 at different positions. This is to show the positional relationship between the first through hole 81 and the second through hole 91 in an easy-to-understand manner. Note that FIG. 2 shows the vicinity of the center of each of the first substrate 10 and the second substrate 20, and the end portions (near the vicinity of the first bus bar 65 and the second bus bar 75) are not shown.
 図1及び図2に示されるように、調光パネル1は、第1基板10と、第2基板20と、第1電極層30と、第2電極層40と、エレクトロクロミック層50と、第1補助電極60と、第2補助電極70と、第1絶縁層80と、第2絶縁層90とを備える。調光パネル1は、平板形状を有する。図2に示されるように、調光パネル1の厚み方向(z軸方向)に沿って、第1基板10、第1補助電極60、第1絶縁層80、第1電極層30、エレクトロクロミック層50、第2電極層40、第2絶縁層90、第2補助電極70、第2基板20の順に並んで配置されている。 As shown in FIGS. 1 and 2, the dimming panel 1 includes a first substrate 10, a second substrate 20, a first electrode layer 30, a second electrode layer 40, an electrochromic layer 50, and a second substrate. 1 Auxiliary electrode 60, a second auxiliary electrode 70, a first insulating layer 80, and a second insulating layer 90 are provided. The dimming panel 1 has a flat plate shape. As shown in FIG. 2, along the thickness direction (z-axis direction) of the dimming panel 1, the first substrate 10, the first auxiliary electrode 60, the first insulating layer 80, the first electrode layer 30, and the electrochromic layer. 50, the second electrode layer 40, the second insulating layer 90, the second auxiliary electrode 70, and the second substrate 20 are arranged side by side in this order.
 調光パネル1の光学状態は、図1に示される制御回路3によって電源2が制御されることによって変更される。本実施の形態では、調光パネル1の光学状態は、調光パネル1に入射する光を透過させる透光状態(透明状態)と、調光パネル1に入射する光を反射する反射状態とに変更可能である。 The optical state of the dimming panel 1 is changed by controlling the power supply 2 by the control circuit 3 shown in FIG. In the present embodiment, the optical state of the dimming panel 1 is a translucent state (transparent state) that transmits the light incident on the dimming panel 1 and a reflective state that reflects the light incident on the dimming panel 1. It can be changed.
 なお、透光状態とは、調光パネル1に光を照射させた場合に、調光パネル1を通過する光の光量(強度)が、調光パネル1によって反射される光の光量(強度)より多い状態である。反射状態とは、調光パネル1に光を照射させた場合に、調光パネル1によって反射される光の光量(強度)が、調光パネル1を通過する光の光量(強度)より多い状態である。 The translucent state means that when the dimming panel 1 is irradiated with light, the amount of light passing through the dimming panel 1 (intensity) is the amount of light reflected by the dimming panel 1 (intensity). There are more. The reflection state is a state in which the amount of light reflected by the dimming panel 1 (intensity) is larger than the amount of light passing through the dimming panel 1 (intensity) when the dimming panel 1 is irradiated with light. Is.
 図3Aは、図1のIII-III線で示される位置での、透明状態における調光パネル1の断面図である。図3Bは、図1のIII-III線で示される位置での、反射状態における調光パネル1の断面図である。以下では、図1~図3Bを適宜参照しながら、調光パネル1の各構成要素について詳細に説明する。 FIG. 3A is a cross-sectional view of the dimming panel 1 in a transparent state at the position shown by lines III-III in FIG. FIG. 3B is a cross-sectional view of the dimming panel 1 in the reflection state at the position shown by lines III-III in FIG. Hereinafter, each component of the dimming panel 1 will be described in detail with reference to FIGS. 1 to 3B as appropriate.
 第1基板10及び第2基板20は、互いに対向して配置されている。第1基板10及び第2基板20は、透光性を有する板体である。第1基板10と第2基板20とは、基板間距離が均一になるように平行に配置されている。基板間距離は、例えば200μmであるが、これに限らない。第1基板10及び第2基板20は、ガラス又は樹脂などの絶縁性及び透光性の材料を用いて形成されている。 The first substrate 10 and the second substrate 20 are arranged so as to face each other. The first substrate 10 and the second substrate 20 are translucent plates. The first substrate 10 and the second substrate 20 are arranged in parallel so that the distance between the substrates is uniform. The distance between the substrates is, for example, 200 μm, but is not limited to this. The first substrate 10 and the second substrate 20 are formed by using an insulating and translucent material such as glass or resin.
 第1基板10及び第2基板20は、互いに略同じ大きさである。第1基板10及び第2基板20の各々の平面視形状は、例えば、一辺の長さが1m以上の矩形(長方形又は正方形)である。例えば、第1基板10の平面視における縦及び横のいずれの長さも2m以上であってもよい。第2基板20についても同様である。第1基板10及び第2基板20の各々の平面視における面積は、例えば1m以上であるが、3m以上であってもよく、5m以上であってもよい。なお、第1基板10及び第2基板20の平面視形状は、三角形、平行四辺形、六角形若しくは八角形などの多角形、又は、円形若しくは楕円形などの曲線を含む形状であってもよい。 The first substrate 10 and the second substrate 20 have substantially the same size as each other. The plan-view shape of each of the first substrate 10 and the second substrate 20 is, for example, a rectangle (rectangle or square) having a side length of 1 m or more. For example, both the vertical and horizontal lengths of the first substrate 10 in a plan view may be 2 m or more. The same applies to the second substrate 20. Area in plan view of each of the first substrate 10 and the second substrate 20 is, for example, is 1 m 2 or more, it may also be 3m 2 or more, may be 5 m 2 or more. The plan-view shape of the first substrate 10 and the second substrate 20 may be a polygon such as a triangle, a parallelogram, a hexagon or an octagon, or a shape including a curve such as a circle or an ellipse. ..
 第1電極層30及び第2電極層40は、透光性を有する導電性薄膜である。第1電極層30及び第2電極層40は、例えばITO(Indium Tin Oxide)又はIZO(Indium Zinc Oxide)などの透明導電性酸化膜である。なお、第1電極層30及び第2電極層40の少なくとも一方は、可視光を透過できる程度に十分に薄い金属薄膜であってもよい。 The first electrode layer 30 and the second electrode layer 40 are conductive thin films having translucency. The first electrode layer 30 and the second electrode layer 40 are transparent conductive oxide films such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide). At least one of the first electrode layer 30 and the second electrode layer 40 may be a metal thin film sufficiently thin enough to transmit visible light.
 第1電極層30及び第2電極層40は、例えばスパッタリング又は塗布法によって形成される。第1電極層30及び第2電極層40は、間にエレクトロクロミック層50を挟んで、互いに対向して配置されている。 The first electrode layer 30 and the second electrode layer 40 are formed by, for example, sputtering or a coating method. The first electrode layer 30 and the second electrode layer 40 are arranged so as to face each other with the electrochromic layer 50 interposed therebetween.
 第1電極層30は、第1基板10とエレクトロクロミック層50との間に配置されている。より具体的には、第1電極層30は、エレクトロクロミック層50における、第1基板10側の主面に接している。第1電極層30は、第1補助電極60及び第1絶縁層80を覆っている。第1電極層30は、第1絶縁層80に設けられた複数の第1貫通孔81を介して第1補助電極60に電気的に接続されている。第1電極層30は、複数の第1貫通孔81の各々の内部において、第1貫通孔81内に露出した第1補助電極60の表面に接している。 The first electrode layer 30 is arranged between the first substrate 10 and the electrochromic layer 50. More specifically, the first electrode layer 30 is in contact with the main surface of the electrochromic layer 50 on the first substrate 10 side. The first electrode layer 30 covers the first auxiliary electrode 60 and the first insulating layer 80. The first electrode layer 30 is electrically connected to the first auxiliary electrode 60 via a plurality of first through holes 81 provided in the first insulating layer 80. The first electrode layer 30 is in contact with the surface of the first auxiliary electrode 60 exposed in the first through hole 81 inside each of the plurality of first through holes 81.
 第1電極層30の平面視形状は、第1基板10の平面視形状と略一致する。第1電極層30の膜厚は、例えば50nmであるが、これに限らない。 The plan view shape of the first electrode layer 30 substantially matches the plan view shape of the first substrate 10. The film thickness of the first electrode layer 30 is, for example, 50 nm, but the film thickness is not limited to this.
 第2電極層40は、第2基板20とエレクトロクロミック層50との間に配置されている。より具体的には、第2電極層40は、エレクトロクロミック層50における、第2基板20側の主面に接している。第2電極層40は、第2補助電極70及び第2絶縁層90を覆っている。第2電極層40は、第2絶縁層90に設けられた複数の第2貫通孔91を介して第2補助電極70に電気的に接続されている。第2電極層40は、複数の第2貫通孔91の各々の内部において、第2貫通孔91内に露出した第2補助電極70の表面に接している。 The second electrode layer 40 is arranged between the second substrate 20 and the electrochromic layer 50. More specifically, the second electrode layer 40 is in contact with the main surface of the electrochromic layer 50 on the second substrate 20 side. The second electrode layer 40 covers the second auxiliary electrode 70 and the second insulating layer 90. The second electrode layer 40 is electrically connected to the second auxiliary electrode 70 via a plurality of second through holes 91 provided in the second insulating layer 90. The second electrode layer 40 is in contact with the surface of the second auxiliary electrode 70 exposed in the second through hole 91 inside each of the plurality of second through holes 91.
 第2電極層40の平面視形状は、第2基板20の平面視形状と略一致する。第2電極層40の膜厚は、例えば50nmであるが、これに限らない。 The plan view shape of the second electrode layer 40 substantially matches the plan view shape of the second substrate 20. The film thickness of the second electrode layer 40 is, for example, 50 nm, but the film thickness is not limited to this.
 エレクトロクロミック層50は、第1基板10と第2基板20との間に配置されている。具体的には、エレクトロクロミック層50は、第1電極層30と第2電極層40との間に位置し、各々に接触して設けられている。 The electrochromic layer 50 is arranged between the first substrate 10 and the second substrate 20. Specifically, the electrochromic layer 50 is located between the first electrode layer 30 and the second electrode layer 40, and is provided in contact with each other.
 エレクトロクロミック層50は、第1電極層30及び第2電極層40の各々に電圧が印加されることによって内部を電荷が移動し、移動した電荷による化学変化が行われることによって、その光学状態が変化する。電荷の授受が電圧の向き及び大きさによって可逆的に制御されることにより、エレクトロクロミック層50の光学状態が可逆的に変化する。 The optical state of the electrochromic layer 50 changes due to the movement of electric charges inside the electrochromic layer 50 by applying a voltage to each of the first electrode layer 30 and the second electrode layer 40, and the chemical change caused by the transferred charges. Change. The optical state of the electrochromic layer 50 changes reversibly because the transfer of electric charge is reversibly controlled by the direction and magnitude of the voltage.
 本実施の形態では、エレクトロクロミック層50は、エレクトロクロミック材料を含有する電解液を含む。エレクトロクロミック材料は、電荷の移動によって酸化還元反応を起こす材料である。具体的には、エレクトロクロミック材料は、金属イオンを含む塩である金属化合物である。エレクトロクロミック材料は、金属をイオンとして含む場合には、光を透過させることができ、金属を金属原子として含む場合に光を反射することができる。 In the present embodiment, the electrochromic layer 50 contains an electrolytic solution containing an electrochromic material. An electrochromic material is a material that undergoes a redox reaction due to the transfer of electric charge. Specifically, the electrochromic material is a metal compound that is a salt containing metal ions. The electrochromic material can transmit light when it contains a metal as an ion, and can reflect light when it contains a metal as a metal atom.
 エレクトロクロミック層50内を電荷が移動することで、図3Bに示されるように、金属イオンが金属薄膜52として第1電極層30の表面に沿って析出する。金属薄膜52は、光反射性を有するので、エレクトロクロミック層50の光学状態が反射状態になる。例えば、第1電極層30の電位が第2電極層40の電位よりも低くなるように第1電極層30及び第2電極層40間に電圧が印加された場合に、金属薄膜52が第1電極層30の表面に沿って形成される。逆極性の電圧を印加した場合には、金属薄膜52が第2電極層40の表面に沿って形成される。いずれの場合であっても、調光パネル1に入射した光を金属薄膜52が反射する。 As the electric charge moves in the electrochromic layer 50, as shown in FIG. 3B, metal ions are deposited as the metal thin film 52 along the surface of the first electrode layer 30. Since the metal thin film 52 has light reflectivity, the optical state of the electrochromic layer 50 becomes a reflective state. For example, when a voltage is applied between the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40, the metal thin film 52 is the first. It is formed along the surface of the electrode layer 30. When a voltage of opposite polarity is applied, the metal thin film 52 is formed along the surface of the second electrode layer 40. In either case, the metal thin film 52 reflects the light incident on the dimming panel 1.
 金属薄膜52を形成するために印加した電圧とは逆極性の電圧を印加することで、析出した金属薄膜52を溶解させて消失させることができる。これにより、図3Aに示されるように、エレクトロクロミック層50の光学状態は透明状態になる。なお、この場合の逆極性の電圧は、反対側の電極層(例えば、図3Bに示される例では、第2電極層40)に金属薄膜52が析出しない程度の大きさの電圧である。 By applying a voltage having a polarity opposite to the voltage applied to form the metal thin film 52, the precipitated metal thin film 52 can be dissolved and eliminated. As a result, as shown in FIG. 3A, the optical state of the electrochromic layer 50 becomes transparent. In this case, the voltage having the opposite polarity is such that the metal thin film 52 does not deposit on the opposite electrode layer (for example, the second electrode layer 40 in the example shown in FIG. 3B).
 エレクトロクロミック層50が含む金属イオンは、例えば、銀(Ag)イオンである。本実施の形態では、エレクトロクロミック材料として、例えば、銀イオンを含む塩である銀化合物を用いる。銀化合物は、例えば、硝酸銀(AgNO)、過塩素酸銀(AgClO)、臭化銀(AgBr)及び塩化銀(AgCl)などであるが、これに限定されない。 The metal ion contained in the electrochromic layer 50 is, for example, a silver (Ag) ion. In the present embodiment, for example, a silver compound which is a salt containing silver ions is used as the electrochromic material. Silver compounds include, but are not limited to, for example, silver nitrate (AgNO 3 ), silver perchlorate (AgClO 4 ), silver bromide (AgBr) and silver chloride (AgCl).
 例えば、金属イオンは、金(Au)、白金(Pt)又はパラジウム(Pd)などの貴金属のイオンであってもよい。あるいは、金属イオンは、銅(Cu)イオンであってもよい。エレクトロクロミック層50は、貴金属などのイオン化傾向が水素より小さい金属のイオンを含むエレクトロクロミック材料を含有することで、電圧が印加された場合に、安定して金属薄膜52を析出させることができる。 For example, the metal ion may be an ion of a noble metal such as gold (Au), platinum (Pt) or palladium (Pd). Alternatively, the metal ion may be a copper (Cu) ion. Since the electrochromic layer 50 contains an electrochromic material containing ions of a metal having an ionization tendency lower than that of hydrogen, such as a noble metal, the metal thin film 52 can be stably deposited when a voltage is applied.
 なお、電解液には、さらに、支持電解質と、メディエータと、ジメチルスルホキシド(DMSO)などの溶剤とが含まれてもよい。支持電解質、メディエータ、溶剤などは、例えば特許文献1に記載されている材料を用いることができる。 The electrolytic solution may further contain a supporting electrolyte, a mediator, and a solvent such as dimethyl sulfoxide (DMSO). As the supporting electrolyte, mediator, solvent and the like, for example, the materials described in Patent Document 1 can be used.
 また、エレクトロクロミック層50に用いられるエレクトロクロミック材料は、酸化タングステン(WO)であってもよい。例えば、エレクトロクロミック層50は、第1電極層30上に設けられたWO膜と、WO膜と第2電極層40との間にWO膜に接するように設けられた電解液又は電解質層とを含んでもよい。エレクトロクロミック層50は、例えば、液体状態又は固体状態である。 Further, the electrochromic material used for the electrochromic layer 50 may be tungsten oxide (WO 3). For example, the electrochromic layer 50, a WO 3 film disposed on the first electrode layer 30, WO 3 film and the electrolytic solution or the electrolyte provided in contact with the WO 3 film between the second electrode layer 40 It may include layers. The electrochromic layer 50 is, for example, in a liquid state or a solid state.
 第1補助電極60は、第1電極層30と第1基板10との間に配置されている。第1補助電極60は、第1電極層30よりも低抵抗な材料を用いて形成されている。具体的には、第1補助電極60は、金属を含んでいる。具体的には、第1補助電極60は、銀(Ag)、銅(Cu)又はアルミニウム(Al)などを金属として含んでいる。第1補助電極60は、遮光性を有する。 The first auxiliary electrode 60 is arranged between the first electrode layer 30 and the first substrate 10. The first auxiliary electrode 60 is formed by using a material having a lower resistance than that of the first electrode layer 30. Specifically, the first auxiliary electrode 60 contains a metal. Specifically, the first auxiliary electrode 60 contains silver (Ag), copper (Cu), aluminum (Al), or the like as a metal. The first auxiliary electrode 60 has a light-shielding property.
 図1及び図4に示されるように、第1補助電極60は、複数の第1金属線61と、複数の第2金属線62とを含んでいる。なお、図4は、調光パネル1の第1絶縁層80に設けられた第1貫通孔81の配置の第1例を示す平面図である。 As shown in FIGS. 1 and 4, the first auxiliary electrode 60 includes a plurality of first metal wires 61 and a plurality of second metal wires 62. Note that FIG. 4 is a plan view showing a first example of the arrangement of the first through hole 81 provided in the first insulating layer 80 of the dimming panel 1.
 複数の第1金属線61はそれぞれ、x軸方向(第1方向)に延びている。複数の第2金属線62はそれぞれ、y軸方向(第2方向)に延びている。本実施の形態では、第1金属線61と第2金属線62とが直交している。つまり、第1補助電極60の平面視形状は、開口形状が正方形の格子状である。 Each of the plurality of first metal wires 61 extends in the x-axis direction (first direction). Each of the plurality of second metal wires 62 extends in the y-axis direction (second direction). In the present embodiment, the first metal wire 61 and the second metal wire 62 are orthogonal to each other. That is, the plan view shape of the first auxiliary electrode 60 is a grid shape having a square opening shape.
 具体的には、複数の第1金属線61は、互いに平行で等間隔に配置されている。複数の第2金属線62は、互いに平行で等間隔に配置されている。隣り合う第1金属線61の間隔と、隣り合う第2金属線62の間隔とは、互いに等しく、例えば10μm以上である。複数の第1金属線61はそれぞれ、互いに同じ大きさ及び同じ形状である。第1金属線61の幅及び第2金属線62の幅は、例えば4μm以下である。これにより、第1基板10を目視した場合に、第1補助電極60が目立ちにくくすることができる。また、第1金属線61の厚み及び第2金属線62の厚みは、例えば1μm未満である。第1金属線61と第2金属線62との交差部の厚みも同じである。第1補助電極60は、面内で厚みが均一である。 Specifically, the plurality of first metal wires 61 are arranged parallel to each other and at equal intervals. The plurality of second metal wires 62 are arranged parallel to each other and at equal intervals. The distance between the adjacent first metal wires 61 and the distance between the adjacent second metal wires 62 are equal to each other, for example, 10 μm or more. The plurality of first metal wires 61 have the same size and shape as each other. The width of the first metal wire 61 and the width of the second metal wire 62 are, for example, 4 μm or less. As a result, the first auxiliary electrode 60 can be made inconspicuous when the first substrate 10 is visually observed. Further, the thickness of the first metal wire 61 and the thickness of the second metal wire 62 are, for example, less than 1 μm. The thickness of the intersection between the first metal wire 61 and the second metal wire 62 is also the same. The thickness of the first auxiliary electrode 60 is uniform in the plane.
 第1補助電極60は、例えば、スパッタリング又は蒸着によって第1基板10の主面に金属薄膜を形成し、形成した金属薄膜をフォトリソグラフィ及びエッチングによってパターニングすることにより形成される。あるいは、第1基板10の主面にレジストパターンを形成した後、レジストパターンを覆うようにスパッタリング又は蒸着によって金属薄膜を形成し、リフトオフによって格子状の第1補助電極60を形成してもよい。 The first auxiliary electrode 60 is formed by, for example, forming a metal thin film on the main surface of the first substrate 10 by sputtering or vapor deposition, and patterning the formed metal thin film by photolithography and etching. Alternatively, after forming a resist pattern on the main surface of the first substrate 10, a metal thin film may be formed by sputtering or vapor deposition so as to cover the resist pattern, and a grid-like first auxiliary electrode 60 may be formed by lift-off.
 第2補助電極70は、第2電極層40と第2基板20との間に配置されている。第2補助電極70は、第2電極層40よりも低抵抗な材料を用いて形成されている。具体的には、第2補助電極70は、金属を含んでいる。具体的には、第2補助電極70は、銀(Ag)、銅(Cu)又はアルミニウム(Al)などを金属として含んでいる。第2補助電極70は、遮光性を有する。 The second auxiliary electrode 70 is arranged between the second electrode layer 40 and the second substrate 20. The second auxiliary electrode 70 is formed by using a material having a lower resistance than the second electrode layer 40. Specifically, the second auxiliary electrode 70 contains a metal. Specifically, the second auxiliary electrode 70 contains silver (Ag), copper (Cu), aluminum (Al), or the like as a metal. The second auxiliary electrode 70 has a light-shielding property.
 第2補助電極70の形状、大きさ及び形成方法は、例えば第1補助電極60と同じである。本実施の形態では、第1補助電極60と第2補助電極70とは、平面視において一致しないように互いにずれて配置されている。 The shape, size, and forming method of the second auxiliary electrode 70 are the same as, for example, the first auxiliary electrode 60. In the present embodiment, the first auxiliary electrode 60 and the second auxiliary electrode 70 are arranged so as to be offset from each other so as not to match in a plan view.
 具体的には、第1補助電極60が含む複数の第1金属線61と、第2補助電極70が含む複数の第1金属線71とは、平面視で重ならないように配置されている。例えば、図3A及び図3Bの断面視で示されるように、第1補助電極60の第1金属線61は、第2補助電極70の隣り合う2つの第1金属線71の間に配置されている。本実施の形態では、平面視において、第1金属線61は、隣り合う2つの第1金属線71間の中央に配置されている。 Specifically, the plurality of first metal wires 61 included in the first auxiliary electrode 60 and the plurality of first metal wires 71 included in the second auxiliary electrode 70 are arranged so as not to overlap in a plan view. For example, as shown in the cross-sectional views of FIGS. 3A and 3B, the first metal wire 61 of the first auxiliary electrode 60 is arranged between two adjacent first metal wires 71 of the second auxiliary electrode 70. There is. In the present embodiment, in a plan view, the first metal wire 61 is arranged at the center between two adjacent first metal wires 71.
 第2金属線62及び72についても同様である。具体的には、第1補助電極60が含む複数の第2金属線62と、第2補助電極70が含む複数の第2金属線72とは、平面視で重ならないように配置されている。例えば、第1補助電極60の第2金属線62は、第2補助電極70の隣り合う2つの第2金属線72の間に配置されている。本実施の形態では、平面視において、第2金属線62は、隣り合う2つの第2金属線72間の中央に配置されている。 The same applies to the second metal wires 62 and 72. Specifically, the plurality of second metal wires 62 included in the first auxiliary electrode 60 and the plurality of second metal wires 72 included in the second auxiliary electrode 70 are arranged so as not to overlap in a plan view. For example, the second metal wire 62 of the first auxiliary electrode 60 is arranged between two adjacent second metal wires 72 of the second auxiliary electrode 70. In the present embodiment, in a plan view, the second metal wire 62 is arranged at the center between two adjacent second metal wires 72.
 このように、第1補助電極60と第2補助電極70とを重ならないように配置することで、電流集中を抑制し、光学状態の面内均一性を高めることができる。また、第1補助電極60及び第2補助電極70に起因するモアレの発生を抑制することができる。 By arranging the first auxiliary electrode 60 and the second auxiliary electrode 70 so as not to overlap with each other in this way, it is possible to suppress current concentration and improve the in-plane uniformity of the optical state. Further, it is possible to suppress the occurrence of moire caused by the first auxiliary electrode 60 and the second auxiliary electrode 70.
 第1絶縁層80は、第1補助電極60と第1電極層30との間に配置されている。具体的には、第1絶縁層80は、第1補助電極60を覆うように第1基板10の主面に形成されている。例えば、第1絶縁層80の平面視形状は、第1基板10の平面視形状と略同じである。 The first insulating layer 80 is arranged between the first auxiliary electrode 60 and the first electrode layer 30. Specifically, the first insulating layer 80 is formed on the main surface of the first substrate 10 so as to cover the first auxiliary electrode 60. For example, the plan view shape of the first insulating layer 80 is substantially the same as the plan view shape of the first substrate 10.
 第1絶縁層80は、透光性を有する絶縁膜である。第1絶縁層80は、無機材料又は有機材料を用いて形成されている。無機材料としては、シリコン窒化物、シリコン酸化物又はシリコン酸窒化物を用いることができる。有機材料としては、アクリレート又はエポキシなどの樹脂材料を用いることができる。 The first insulating layer 80 is a translucent insulating film. The first insulating layer 80 is formed by using an inorganic material or an organic material. As the inorganic material, silicon nitride, silicon oxide or silicon oxynitride can be used. As the organic material, a resin material such as acrylate or epoxy can be used.
 第1絶縁層80は、複数の第1貫通孔81を有する。複数の第1貫通孔81はそれぞれ、第1補助電極60の一部を露出させ、第1電極層30との電気的な接続を行うためのコンタクトホールである。本実施の形態では、複数の第1貫通孔81の形状及び大きさは、互いに同じである。平面視において、複数の第1貫通孔81の面積は、互いに等しい。複数の第1貫通孔81の配置については、図4~図8を用いて後で説明する。 The first insulating layer 80 has a plurality of first through holes 81. Each of the plurality of first through holes 81 is a contact hole for exposing a part of the first auxiliary electrode 60 and making an electrical connection with the first electrode layer 30. In the present embodiment, the shapes and sizes of the plurality of first through holes 81 are the same as each other. In a plan view, the areas of the plurality of first through holes 81 are equal to each other. The arrangement of the plurality of first through holes 81 will be described later with reference to FIGS. 4 to 8.
 第1絶縁層80は、CVD(Chemical Vapor Deposition)法又は塗布法によって均一な膜厚で形成される。フォトリソグラフィ及びエッチングによって、絶縁膜の一部を除去することにより、複数の第1貫通孔81が形成される。あるいは、リフトオフ法によって、複数の第1貫通孔81が形成された第1絶縁層80を形成してもよい。 The first insulating layer 80 is formed with a uniform film thickness by a CVD (Chemical Vapor Deposition) method or a coating method. A plurality of first through holes 81 are formed by removing a part of the insulating film by photolithography and etching. Alternatively, the first insulating layer 80 in which a plurality of first through holes 81 are formed may be formed by the lift-off method.
 第1絶縁層80の厚さは、例えば数百nm以上、数μm以下の範囲である。第1絶縁層80の厚さは、第1補助電極60の厚さよりも厚い。これにより、第1補助電極60の線幅より小さい第1貫通孔81を形成した場合に、第1貫通孔81の近傍での段差が少なくなり、第1電極層30の膜切れを抑制することができる。なお、第1絶縁層80の厚さは、第1補助電極60の厚さと等しくてもよく、第1補助電極60の厚さより薄くてもよい。 The thickness of the first insulating layer 80 is, for example, in the range of several hundred nm or more and several μm or less. The thickness of the first insulating layer 80 is thicker than that of the first auxiliary electrode 60. As a result, when the first through hole 81 smaller than the line width of the first auxiliary electrode 60 is formed, the step in the vicinity of the first through hole 81 is reduced, and the film breakage of the first electrode layer 30 is suppressed. Can be done. The thickness of the first insulating layer 80 may be equal to the thickness of the first auxiliary electrode 60, or may be thinner than the thickness of the first auxiliary electrode 60.
 第2絶縁層90は、第2補助電極70と第2電極層40との間に配置されている。具体的には、第2絶縁層90は、第2補助電極70を覆うように第2基板20の主面に形成されている。例えば、第2絶縁層90の平面視形状は、第2基板20の平面視形状と略同じである。 The second insulating layer 90 is arranged between the second auxiliary electrode 70 and the second electrode layer 40. Specifically, the second insulating layer 90 is formed on the main surface of the second substrate 20 so as to cover the second auxiliary electrode 70. For example, the plan view shape of the second insulating layer 90 is substantially the same as the plan view shape of the second substrate 20.
 第2絶縁層90は、透光性を有する絶縁膜である。第2絶縁層90は、無機材料又は有機材料を用いて形成されている。無機材料としては、シリコン窒化物、シリコン酸化物又はシリコン酸窒化物を用いることができる。有機材料としては、アクリレート又はエポキシなどの樹脂材料を用いることができる。 The second insulating layer 90 is a translucent insulating film. The second insulating layer 90 is formed by using an inorganic material or an organic material. As the inorganic material, silicon nitride, silicon oxide or silicon oxynitride can be used. As the organic material, a resin material such as acrylate or epoxy can be used.
 第2絶縁層90は、複数の第2貫通孔91を有する。複数の第2貫通孔91はそれぞれ、第2補助電極70の一部を露出させ、第2電極層40との電気的な接続を行うためのコンタクトホールである。本実施の形態では、複数の第2貫通孔91の形状及び大きさは、互いに同じである。また、第2貫通孔91の形状及び大きさは、第1貫通孔81の形状及び大きさと同じである。平面視において、複数の第2貫通孔91の面積は、互いに等しい。複数の第2貫通孔91の配置については、第1貫通孔81の配置と同様であるので、詳細については後で説明する。 The second insulating layer 90 has a plurality of second through holes 91. Each of the plurality of second through holes 91 is a contact hole for exposing a part of the second auxiliary electrode 70 and making an electrical connection with the second electrode layer 40. In the present embodiment, the shapes and sizes of the plurality of second through holes 91 are the same as each other. The shape and size of the second through hole 91 are the same as the shape and size of the first through hole 81. In plan view, the areas of the plurality of second through holes 91 are equal to each other. The arrangement of the plurality of second through holes 91 is the same as the arrangement of the first through holes 81, and details will be described later.
 第2絶縁層90の厚さは、例えば数百nm以上、数μm以下の範囲である。第2絶縁層90の厚さは、第2補助電極70の厚さよりも厚い。これにより、第2補助電極70の線幅より小さい第2貫通孔91を形成した場合に、第2貫通孔91の近傍での段差が少なくなり、第2電極層40の膜切れを抑制することができる。なお、第2絶縁層90の厚さは、第2補助電極70の厚さと等しくてもよく、第2補助電極70の厚さより薄くてもよい。 The thickness of the second insulating layer 90 is, for example, in the range of several hundred nm or more and several μm or less. The thickness of the second insulating layer 90 is thicker than that of the second auxiliary electrode 70. As a result, when the second through hole 91 smaller than the line width of the second auxiliary electrode 70 is formed, the step in the vicinity of the second through hole 91 is reduced, and the film breakage of the second electrode layer 40 is suppressed. Can be done. The thickness of the second insulating layer 90 may be equal to the thickness of the second auxiliary electrode 70, or may be thinner than the thickness of the second auxiliary electrode 70.
 図示されていないが、調光パネル1は、第1基板10及び第2基板20の各々の外周に沿って形成された環状の封止部材を備える。封止部材は、エレクトロクロミック層50の電解液が漏出するのを防止し、かつ、第1基板10と第2基板20との基板間距離を保持する機能を有する。封止部材は、例えば紫外線硬化樹脂又は熱硬化樹脂などによって形成されている。 Although not shown, the dimming panel 1 includes an annular sealing member formed along the outer periphery of each of the first substrate 10 and the second substrate 20. The sealing member has a function of preventing the electrolytic solution of the electrochromic layer 50 from leaking and maintaining the distance between the first substrate 10 and the second substrate 20. The sealing member is formed of, for example, an ultraviolet curable resin or a thermosetting resin.
 また、第1基板10の端部には、図1に示されるように、第1電極層30に給電するための第1バスバー65が設けられている。第1バスバー65は、第1電極層30の端部に接続された第1給電端子部の一例である。第1電極層30及び第1補助電極60は、一部が封止部材より外側に引き出されており、第1バスバー65に電気的に接続されている。 Further, as shown in FIG. 1, a first bus bar 65 for supplying power to the first electrode layer 30 is provided at the end of the first substrate 10. The first bus bar 65 is an example of a first power feeding terminal portion connected to an end portion of the first electrode layer 30. A part of the first electrode layer 30 and the first auxiliary electrode 60 is drawn out from the sealing member and is electrically connected to the first bus bar 65.
 また、第2基板20の端部には、第2電極層40に給電するための第2バスバー75が設けられている。第2バスバー75は、第2電極層40の端部に接続された第2給電端子部の一例である。第2電極層40は、一部が封止部材より外側に引き出されており、第2バスバー75に電気的に接続されている。 Further, at the end of the second substrate 20, a second bus bar 75 for supplying power to the second electrode layer 40 is provided. The second bus bar 75 is an example of a second power feeding terminal portion connected to the end portion of the second electrode layer 40. A part of the second electrode layer 40 is drawn out from the sealing member and is electrically connected to the second bus bar 75.
 第1バスバー65と第2バスバー75とは、各基板の対向する辺に沿って設けられている。あるいは、第1バスバー65と第2バスバー75とは、平面視で隣り合う辺に設けられていてもよい。例えば、第1バスバー65は、第1基板10の対向する二辺に沿って設けられ、第2バスバー75は、第2基板20の対向する二辺に沿って設けられていてもよい。第1バスバー65及び第2バスバー75はそれぞれ、各基板の四辺に沿って設けられていてもよい。 The first bus bar 65 and the second bus bar 75 are provided along the opposite sides of the respective boards. Alternatively, the first bus bar 65 and the second bus bar 75 may be provided on adjacent sides in a plan view. For example, the first bus bar 65 may be provided along two opposite sides of the first substrate 10, and the second bus bar 75 may be provided along two opposite sides of the second substrate 20. The first bus bar 65 and the second bus bar 75 may be provided along the four sides of each substrate, respectively.
 第1バスバー65及び第2バスバー75に、図1に示されるように、電源2が接続されている。第1バスバー65及び第2バスバー75を介して、電源2からの電圧が第1電極層30及び第2電極層40に供給される。 As shown in FIG. 1, the power supply 2 is connected to the first bus bar 65 and the second bus bar 75. The voltage from the power supply 2 is supplied to the first electrode layer 30 and the second electrode layer 40 via the first bus bar 65 and the second bus bar 75.
 調光パネル1は、例えば、以下のように形成することができる。まず、第1基板10の主面に、第1補助電極60、第1絶縁層80及び第1電極層30をこの順で形成する。同様に、第2基板20の主面に、第2補助電極70、第2絶縁層90及び第2電極層40をこの順で形成する。第1基板10及び第2基板20の少なくとも一方に、環状に封止部材を形成した後、エレクトロクロミック材料を含む電解液を配置し、第1基板10と第2基板20とを貼り合わせて封止部材を硬化させる。これにより、調光パネル1が形成される。なお、調光パネル1の製造方法については、特に限定されない。 The dimming panel 1 can be formed as follows, for example. First, the first auxiliary electrode 60, the first insulating layer 80, and the first electrode layer 30 are formed on the main surface of the first substrate 10 in this order. Similarly, the second auxiliary electrode 70, the second insulating layer 90, and the second electrode layer 40 are formed on the main surface of the second substrate 20 in this order. After forming a sealing member in an annular shape on at least one of the first substrate 10 and the second substrate 20, an electrolytic solution containing an electrochromic material is arranged, and the first substrate 10 and the second substrate 20 are bonded and sealed. Harden the stop member. As a result, the dimming panel 1 is formed. The method for manufacturing the dimming panel 1 is not particularly limited.
 [1-2.貫通孔の配置]
 次に、第1貫通孔81の配置例について、図4~図7を用いて説明する。図4~図7はそれぞれ、調光パネル1の第1絶縁層80に設けられた第1貫通孔81の配置の第1例~第4例を示す図である。
[1-2. Arrangement of through holes]
Next, an arrangement example of the first through hole 81 will be described with reference to FIGS. 4 to 7. 4 to 7 are diagrams showing first to fourth examples of arrangement of the first through hole 81 provided in the first insulating layer 80 of the dimming panel 1, respectively.
 複数の第1貫通孔81は、図4に示されるように、平面視において、第1金属線61と第2金属線62との交差部に設けられている。これにより、仮に第1金属線61及び第2金属線62の1つが断線した場合であっても、他の金属線を介した回り込みによって面内の電位の均一性を保つことができる。交差部に第1貫通孔81が設けられることによって、回り込みの距離が短くて済むので、電位の均一性を高めることができる。 As shown in FIG. 4, the plurality of first through holes 81 are provided at the intersection of the first metal wire 61 and the second metal wire 62 in a plan view. As a result, even if one of the first metal wire 61 and the second metal wire 62 is broken, the in-plane potential uniformity can be maintained by wrapping around through the other metal wire. By providing the first through hole 81 at the intersection, the wraparound distance can be shortened, so that the uniformity of the potential can be improved.
 また、図5に示されるように、複数の第1貫通孔81は、平面視において、複数の第1金属線61に重なるように設けられていてもよく、第2金属線62のいずれにも重なっていなくてもよい。あるいは、図6に示されるように、複数の第1貫通孔81は、平面視において、複数の第2金属線62に重なるように設けられていてもよく、第1金属線61のいずれにも重なっていなくてもよい。例えば、第1貫通孔81は、第1金属線61又は第2金属線62の各々において、隣り合う2つの交差部の中央に設けられている。 Further, as shown in FIG. 5, the plurality of first through holes 81 may be provided so as to overlap the plurality of first metal wires 61 in a plan view, and may be provided in any of the second metal wires 62. It does not have to overlap. Alternatively, as shown in FIG. 6, the plurality of first through holes 81 may be provided so as to overlap the plurality of second metal wires 62 in a plan view, and may be provided in any of the first metal wires 61. It does not have to overlap. For example, the first through hole 81 is provided in the center of two adjacent intersections of the first metal wire 61 or the second metal wire 62, respectively.
 また、図7に示されるように、複数の第1貫通孔81には、交差部に設けられた貫通孔と、交差部以外に設けられた貫通孔とが混在して含まれていてもよい。図7では、交差部以外に設けられた第1貫通孔81は、第2金属線62に重なる例が示されているが、第1金属線61に重なっていてもよい。あるいは、交差部以外に設けられた複数の第1貫通孔81には、第1金属線61に重なる貫通孔と、第2金属線62に重なる貫通孔とが含まれていてもよい。 Further, as shown in FIG. 7, the plurality of first through holes 81 may include a through hole provided at the intersection and a through hole provided at a place other than the intersection in a mixed manner. .. Although FIG. 7 shows an example in which the first through hole 81 provided other than the intersection overlaps with the second metal wire 62, it may overlap with the first metal wire 61. Alternatively, the plurality of first through holes 81 provided other than the intersection may include a through hole that overlaps the first metal wire 61 and a through hole that overlaps the second metal wire 62.
 第2貫通孔91の配置は、第1貫通孔81の配置と同様である。つまり、複数の第2貫通孔91は、図4又は図7に示されるように、第1金属線71と第2金属線72との交差部に設けられていてもよい。あるいは、複数の第2貫通孔91は、図5又は図6に示されるように、第1金属線71と第2金属線72との交差部以外に設けられていてもよい。 The arrangement of the second through hole 91 is the same as the arrangement of the first through hole 81. That is, as shown in FIG. 4 or 7, the plurality of second through holes 91 may be provided at the intersection of the first metal wire 71 and the second metal wire 72. Alternatively, as shown in FIG. 5 or 6, the plurality of second through holes 91 may be provided at a portion other than the intersection of the first metal wire 71 and the second metal wire 72.
 図4に示される例では、第1貫通孔81は、第1金属線61の線幅及び第2金属線62の線幅よりも大きい。具体的には、第1貫通孔81は、第1金属線61と第2金属線62との交差部を完全に露出させている。これにより、第1貫通孔81内に設けられる第1電極層30と第1金属線61及び第2金属線62との接触面積を大きくすることができるので、コンタクト抵抗を低減することができる。また、第1貫通孔81の大きさが大きいので、第1電極層30に形成される段差が小さくなり、膜切れの発生を抑制することができる。図5~図7に示される例でも同様である。 In the example shown in FIG. 4, the first through hole 81 is larger than the line width of the first metal wire 61 and the line width of the second metal wire 62. Specifically, the first through hole 81 completely exposes the intersection of the first metal wire 61 and the second metal wire 62. As a result, the contact area between the first electrode layer 30 provided in the first through hole 81 and the first metal wire 61 and the second metal wire 62 can be increased, so that the contact resistance can be reduced. Further, since the size of the first through hole 81 is large, the step formed in the first electrode layer 30 becomes small, and the occurrence of film breakage can be suppressed. The same applies to the examples shown in FIGS. 5 to 7.
 あるいは、複数の第1貫通孔81の各々は、平面視において、第1金属線61の内側に配置されていてもよい。図8は、第1貫通孔81と第1補助電極60との拡大平面図である。図8に示されるように、第1貫通孔81は、第1金属線61と第2金属線62との交差部の内側に設けられていてもよい。例えば、第1貫通孔81の平面視形状が正方形であるので、第1貫通孔81の開口の一辺wは、第1金属線61の線幅w1及び第2金属線62の線幅w2よりも短い。これにより、第1電極層30の段差が抑制されるので、第1電極層30の膜切れの発生を抑制することができる。 Alternatively, each of the plurality of first through holes 81 may be arranged inside the first metal wire 61 in a plan view. FIG. 8 is an enlarged plan view of the first through hole 81 and the first auxiliary electrode 60. As shown in FIG. 8, the first through hole 81 may be provided inside the intersection of the first metal wire 61 and the second metal wire 62. For example, since the plan view shape of the first through hole 81 is square, one side w of the opening of the first through hole 81 is larger than the line width w1 of the first metal wire 61 and the line width w2 of the second metal wire 62. short. As a result, the step difference of the first electrode layer 30 is suppressed, so that the occurrence of film breakage of the first electrode layer 30 can be suppressed.
 なお、第1貫通孔81の平面視形状は、例えば正方形などの矩形であるが、円形であってもよい。この場合、第1貫通孔81の開口径は、第1金属線61の線幅w1及び第2金属線62の線幅w2よりも短くてもよい。第2貫通孔91の平面視形状及び大きさについても、第1貫通孔81と同様である。 The plan view shape of the first through hole 81 is a rectangle such as a square, but it may be a circle. In this case, the opening diameter of the first through hole 81 may be shorter than the line width w1 of the first metal wire 61 and the line width w2 of the second metal wire 62. The shape and size of the second through hole 91 in a plan view are the same as those of the first through hole 81.
 [1-3.光学状態の変化]
 次に、本実施の形態に係る調光パネルの光学状態の変化について説明する。
[1-3. Change in optical state]
Next, a change in the optical state of the dimming panel according to the present embodiment will be described.
 調光パネル1の光学状態は、図1に示される制御回路3によって制御される。具体的には、制御回路3が電源2を制御し、第1電極層30及び第2電極層40の各々に印加される電圧の大きさ及び極性を変更することにより、調光パネル1の光学状態を変化させることができる。 The optical state of the dimming panel 1 is controlled by the control circuit 3 shown in FIG. Specifically, the control circuit 3 controls the power supply 2 and changes the magnitude and polarity of the voltage applied to each of the first electrode layer 30 and the second electrode layer 40 to change the optics of the dimming panel 1. The state can be changed.
 電源2は、第1電極層30及び第2電極層40の各々に所定の電圧を供給するための電圧源である。電源2は、例えば、商用電源又は蓄電池などの外部電源から供給された電力に基づいて、パルス状の脈流電圧(直流電圧)を生成して供給する直流電源である。電源2は、制御回路3による制御によって出力する電圧の大きさ及び極性を変更可能である。 The power supply 2 is a voltage source for supplying a predetermined voltage to each of the first electrode layer 30 and the second electrode layer 40. The power supply 2 is a DC power supply that generates and supplies a pulsed pulsating voltage (DC voltage) based on power supplied from an external power source such as a commercial power supply or a storage battery. The power supply 2 can change the magnitude and polarity of the output voltage under the control of the control circuit 3.
 制御回路3は、例えば、集積回路(IC:Integrated Circuit)であるLSI(Large Scale Integration)によって実現される。なお、集積回路は、LSIに限られず、専用回路又は汎用プロセッサであってもよい。例えば、制御回路3は、マイクロコントローラであってもよい。制御回路3は、プログラム可能なFPGA(Field Programmable Gate Array)、又は、LSI内の回路セルの接続及び設定が再構成可能なリコンフィギュラブルプロセッサであってもよい。制御回路3が実行する機能は、ソフトウェアで実現されてもよく、ハードウェアで実現されてもよい。 The control circuit 3 is realized by, for example, an LSI (Large Scale Integration) which is an integrated circuit (IC: Integrated Circuit). The integrated circuit is not limited to the LSI, and may be a dedicated circuit or a general-purpose processor. For example, the control circuit 3 may be a microcontroller. The control circuit 3 may be a programmable FPGA (Field Programmable Gate Array) or a reconfigurable processor in which the connection and setting of circuit cells in the LSI can be reconfigured. The function executed by the control circuit 3 may be realized by software or hardware.
 なお、本実施の形態に係る調光パネル1は、建物又は移動体の窓などに設置して使用される。電源2及び制御回路3は、例えば、調光パネル1が設置される窓枠又は壁の内部などに設置される。あるいは、電源2及び制御回路3は、調光パネル1の第1基板10又は第2基板20の端部に設けられていてもよい。 The dimming panel 1 according to the present embodiment is used by being installed in a window of a building or a moving body. The power supply 2 and the control circuit 3 are installed, for example, inside a window frame or a wall on which the dimming panel 1 is installed. Alternatively, the power supply 2 and the control circuit 3 may be provided at the end of the first substrate 10 or the second substrate 20 of the dimming panel 1.
 [1-3-1.透光状態(透明状態)]
 制御回路3が、第1電極層30と第2電極層40との間に印加する電圧を0Vにする。この場合、調光パネル1の光学状態は、図3Aに示される透光状態(透明状態)になる。印加電圧が0Vである場合、エレクトロクロミック層50に含まれる金属イオンが析出されない。このため、エレクトロクロミック層50は、光を透過させる透光状態になる。第1基板10、第1絶縁層80、第1電極層30、エレクトロクロミック層50、第2電極層40、第2絶縁層90、第2基板20の各々の屈折率が実質的に等しい場合、入射する光がそのまま通過する。つまり、調光パネル1の光学状態は、透明状態になる。
[1-3-1. Translucent state (transparent state)]
The voltage applied by the control circuit 3 between the first electrode layer 30 and the second electrode layer 40 is set to 0V. In this case, the optical state of the dimming panel 1 is the translucent state (transparent state) shown in FIG. 3A. When the applied voltage is 0V, the metal ions contained in the electrochromic layer 50 are not precipitated. Therefore, the electrochromic layer 50 is in a translucent state in which light is transmitted. When the refractive indexes of the first substrate 10, the first insulating layer 80, the first electrode layer 30, the electrochromic layer 50, the second electrode layer 40, the second insulating layer 90, and the second substrate 20 are substantially equal. The incident light passes as it is. That is, the optical state of the dimming panel 1 becomes a transparent state.
 [1-3-2.反射状態]
 また、制御回路3は、第1電極層30の電位が第2電極層40の電位より低くなるように、第1電極層30と第2電極層40とに電圧を印加する。この場合、調光パネル1の光学状態は、図3Bに示される反射状態になる。第1電極層30の電位が第2電極層40の電位より低いので、エレクトロクロミック層50内の金属が金属薄膜52として第1電極層30の表面に析出する。このため、調光パネル1は、光を反射させる反射状態になる。
[1-3-2. Reflection state]
Further, the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40. In this case, the optical state of the dimming panel 1 is the reflection state shown in FIG. 3B. Since the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40, the metal in the electrochromic layer 50 is deposited on the surface of the first electrode layer 30 as a metal thin film 52. Therefore, the dimming panel 1 is in a reflective state that reflects light.
 なお、図3Bでは、第1電極層30の表面に金属薄膜52が形成されているが、第2電極層40の表面に金属薄膜52が形成されてもよい。例えば、制御回路3が、第1電極層30の電位が第2電極層40の電位より高くなるように、第1電極層30と第2電極層40とに電圧を印加することで、金属薄膜52は、第2電極層40の表面に形成される。 Although the metal thin film 52 is formed on the surface of the first electrode layer 30 in FIG. 3B, the metal thin film 52 may be formed on the surface of the second electrode layer 40. For example, the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is higher than the potential of the second electrode layer 40, thereby forming a metal thin film. 52 is formed on the surface of the second electrode layer 40.
 [1-4.変形例]
 続いて、実施の形態1の変形例について説明する。以下の変形例では、実施の形態1との相違点を中心に説明し、共通点の説明を省略又は簡略化する。
[1-4. Modification example]
Subsequently, a modified example of the first embodiment will be described. In the following modification, the differences from the first embodiment will be mainly described, and the common points will be omitted or simplified.
 図9は、本変形例に係る調光パネル101の断面図である。図9に示される調光パネル101は、実施の形態に係る調光パネル1と比較して、第2補助電極70及び第2絶縁層90が設けられていない。具体的には、第2電極層40が第2基板20の主面に直接設けられている。 FIG. 9 is a cross-sectional view of the dimming panel 101 according to this modified example. The dimming panel 101 shown in FIG. 9 is not provided with the second auxiliary electrode 70 and the second insulating layer 90 as compared with the dimming panel 1 according to the embodiment. Specifically, the second electrode layer 40 is directly provided on the main surface of the second substrate 20.
 この場合、図9に示されるように、第1電極層30の表面に金属薄膜52が形成された場合、第2基板20側(z軸の正側)から調光パネル1を見たときに第1補助電極60が見えなくなる。つまり、金属薄膜52の手前に補助電極が設けられていないので、金属薄膜52の析出時の見栄えを良くすることができる。 In this case, as shown in FIG. 9, when the metal thin film 52 is formed on the surface of the first electrode layer 30, when the dimming panel 1 is viewed from the second substrate 20 side (the positive side of the z-axis). The first auxiliary electrode 60 disappears. That is, since the auxiliary electrode is not provided in front of the metal thin film 52, the appearance of the metal thin film 52 at the time of precipitation can be improved.
 (実施の形態2)
 続いて、実施の形態2について説明する。
(Embodiment 2)
Subsequently, the second embodiment will be described.
 実施の形態2では、実施の形態1と比較して、第1貫通孔及び第2貫通孔の配置が相違する。以下では、実施の形態1との相違点を中心に説明し、共通点の説明を省略又は簡略化する。 In the second embodiment, the arrangement of the first through hole and the second through hole is different from that of the first embodiment. In the following, the differences from the first embodiment will be mainly described, and the common points will be omitted or simplified.
 [2-1.概要]
 まず、実施の形態2に係る調光パネルの概要について、図10及び図11を用いて説明する。
[2-1. Overview]
First, the outline of the dimming panel according to the second embodiment will be described with reference to FIGS. 10 and 11.
 図10は、本実施の形態に係る調光パネル201の構成を示す図である。図10の図示の仕方は、図1と同様である。 FIG. 10 is a diagram showing the configuration of the dimming panel 201 according to the present embodiment. The method of illustration in FIG. 10 is the same as that in FIG.
 図10に示されるXIA-XIA線は、第1補助電極60のx軸方向に延びる第1金属線61に沿った線である。XIB-XIB線は、第2補助電極70のx軸方向に延びる第1金属線71に沿った線である。なお、XIA-XIA線とXIB-XIB線とは、平面視で重複しない位置である。つまり、第1補助電極60に含まれる第1金属線61と第2補助電極70に含まれる第1金属線71とは、平面視で重ならない位置に配置されている。 The XIA-XIA line shown in FIG. 10 is a line along the first metal wire 61 extending in the x-axis direction of the first auxiliary electrode 60. The XIB-XIB line is a line along the first metal wire 71 extending in the x-axis direction of the second auxiliary electrode 70. The XIA-XIA line and the XIB-XIB line are positions that do not overlap in a plan view. That is, the first metal wire 61 included in the first auxiliary electrode 60 and the first metal wire 71 included in the second auxiliary electrode 70 are arranged at positions where they do not overlap in a plan view.
 図11は、図10のXIA-XIA線及びXIB-XIB線で示される位置での調光パネル201の断面図である。具体的には、図11の(a)は、XIA-XIA線における第1基板10側の断面を示し、図11の(b)は、XIB-XIB線における第2基板20側の断面を示している。図11の図示の仕方は、図2と同様である。 FIG. 11 is a cross-sectional view of the dimming panel 201 at the positions indicated by the XIA-XIA line and the XIB-XIB line of FIG. Specifically, FIG. 11A shows a cross section of the first substrate 10 side in the XIA-XIA line, and FIG. 11B shows a cross section of the second substrate 20 side in the XIB-XIB line. ing. The method of illustration in FIG. 11 is the same as that in FIG.
 図10及び図11に示されるように、調光パネル201は、第1基板10と、第2基板20と、第1電極層30と、第2電極層40と、エレクトロクロミック層50と、第1補助電極60と、第2補助電極70と、第1絶縁層80と、第2絶縁層90とを備える。調光パネル201は、平板形状を有する。図11に示されるように、調光パネル201の厚み方向(z軸方向)に沿って、第1基板10、第1補助電極60、第1絶縁層80、第1電極層30、エレクトロクロミック層50、第2電極層40、第2絶縁層90、第2補助電極70、第2基板20の順に並んで配置されている。 As shown in FIGS. 10 and 11, the dimming panel 201 includes a first substrate 10, a second substrate 20, a first electrode layer 30, a second electrode layer 40, an electrochromic layer 50, and a first substrate. 1 Auxiliary electrode 60, a second auxiliary electrode 70, a first insulating layer 80, and a second insulating layer 90 are provided. The dimming panel 201 has a flat plate shape. As shown in FIG. 11, along the thickness direction (z-axis direction) of the dimming panel 201, the first substrate 10, the first auxiliary electrode 60, the first insulating layer 80, the first electrode layer 30, and the electrochromic layer. 50, the second electrode layer 40, the second insulating layer 90, the second auxiliary electrode 70, and the second substrate 20 are arranged side by side in this order.
 図10及び図11に示されるように、本実施の形態に係る調光パネル201では、実施の形態1に係る調光パネル1と比較して、第1絶縁層80には第1貫通孔81の代わりに第1貫通孔281が設けられている点と、第2絶縁層90には第2貫通孔91の代わりに第2貫通孔291が設けられている点とが相違する。 As shown in FIGS. 10 and 11, in the dimming panel 201 according to the present embodiment, the first through hole 81 is formed in the first insulating layer 80 as compared with the dimming panel 1 according to the first embodiment. The difference is that the first through hole 281 is provided instead of the second through hole 281 and the second through hole 291 is provided in the second insulating layer 90 instead of the second through hole 91.
 調光パネル201の光学状態は、図10に示される制御回路3によって電源2が制御されることによって変更される。本実施の形態では、調光パネル201の光学状態は、調光パネル201に入射する光を透過させる透光状態(透明状態)と、調光パネル201に入射する光を反射する反射状態とに変更可能である。 The optical state of the dimming panel 201 is changed by controlling the power supply 2 by the control circuit 3 shown in FIG. In the present embodiment, the optical state of the dimming panel 201 is a translucent state (transparent state) for transmitting the light incident on the dimming panel 201 and a reflecting state for reflecting the light incident on the dimming panel 201. It can be changed.
 図12Aは、図10のXII-XII線で示される位置での、透明状態における調光パネル201の断面図である。図12Bは、図10のXII-XII線で示される位置での、反射状態における調光パネル201の断面図である。図12A及び図12Bは、実施の形態1に係る図3A及び図3Bに対応している。 FIG. 12A is a cross-sectional view of the dimming panel 201 in a transparent state at the position shown by the line XII-XII in FIG. FIG. 12B is a cross-sectional view of the dimming panel 201 in the reflection state at the position shown by the line XII-XII in FIG. 12A and 12B correspond to FIGS. 3A and 3B according to the first embodiment.
 [2-2.貫通孔の配置]
 次に、第1貫通孔281の配置例について、図13~図16を用いて説明する。図13~図16はそれぞれ、調光パネル201の第1絶縁層80に設けられた第1貫通孔281の配置の第1例~第4例を示す図である。
[2-2. Arrangement of through holes]
Next, an arrangement example of the first through hole 281 will be described with reference to FIGS. 13 to 16. 13 to 16 are diagrams showing first to fourth examples of arrangement of the first through hole 281 provided in the first insulating layer 80 of the dimming panel 201, respectively.
 複数の第1貫通孔281は、図13に示されるように、平面視において、第1金属線61と第2金属線62との交差部に設けられている。これにより、仮に第1金属線61及び第2金属線62の1つが断線した場合であっても、他の金属線を介した回り込みによって面内の電位の均一性を保つことができる。交差部に第1貫通孔281が設けられることによって、回り込みの距離が短くて済むので、電位の均一性を高めることができる。 As shown in FIG. 13, the plurality of first through holes 281 are provided at the intersection of the first metal wire 61 and the second metal wire 62 in a plan view. As a result, even if one of the first metal wire 61 and the second metal wire 62 is broken, the in-plane potential uniformity can be maintained by wrapping around through the other metal wire. By providing the first through hole 281 at the intersection, the wraparound distance can be shortened, so that the uniformity of the potential can be improved.
 本実施の形態では、平面視において、複数の第1貫通孔281の配置密度は、領域によって異なっている。配置密度は、単位面積当たりに設けられた第1貫通孔281の個数である。単位面積は、例えば、平面視における第1基板10の面積の10%以上20%以下の面積である。例えば、図13に示されるように、平面視において、第1領域211に含まれる第1貫通孔281の個数は、第2領域212に含まれる第1貫通孔281の個数とは異なっている。第1領域211及び第2領域212はいずれも、上記単位面積を有する正方形の領域であり、互いに重複しない領域である。第1領域211及び第2領域212のいずれも、第1補助電極60の交差部を9つ含んでいる。第1領域211は、第2領域212よりも第1バスバー65に近い領域である。 In the present embodiment, the arrangement densities of the plurality of first through holes 281 differ depending on the region in a plan view. The arrangement density is the number of first through holes 281 provided per unit area. The unit area is, for example, an area of 10% or more and 20% or less of the area of the first substrate 10 in a plan view. For example, as shown in FIG. 13, in a plan view, the number of first through holes 281 included in the first region 211 is different from the number of first through holes 281 included in the second region 212. Both the first region 211 and the second region 212 are square regions having the above unit area and do not overlap with each other. Both the first region 211 and the second region 212 include nine intersections of the first auxiliary electrode 60. The first region 211 is a region closer to the first bus bar 65 than the second region 212.
 第1貫通孔281は、上述したように、第1補助電極60と第1電極層30との電気的な接続を行うためのコンタクトホールである。したがって、第1貫通孔281の配置密度は、単位面積当たりの、第1補助電極60と第1電極層30との接続面積に相当する。つまり、第1貫通孔281の個数を多くする程、第1補助電極60と第1電極層30との接続面積が大きくなるので、第1補助電極60によって電流が流れやすくなる。第1貫通孔281の個数を少なくする程、第1補助電極60と第1電極層30との接続面積が小さくなるので、電流が流れにくくなる。 As described above, the first through hole 281 is a contact hole for electrically connecting the first auxiliary electrode 60 and the first electrode layer 30. Therefore, the arrangement density of the first through hole 281 corresponds to the connection area between the first auxiliary electrode 60 and the first electrode layer 30 per unit area. That is, as the number of the first through holes 281 increases, the connection area between the first auxiliary electrode 60 and the first electrode layer 30 increases, so that the current easily flows through the first auxiliary electrode 60. As the number of the first through holes 281 is reduced, the connection area between the first auxiliary electrode 60 and the first electrode layer 30 becomes smaller, so that it becomes difficult for current to flow.
 ところで、第1補助電極60が設けられていない場合、第1バスバー65に近い第1領域211では、第1電極層30の抵抗成分の影響が小さいため、電流が流れやすい。一方で、第1バスバー65から離れた第2領域212では、第1電極層30の抵抗成分の影響が大きくなり、電流が流れにくい。つまり、第1補助電極60が設けられていない場合、面内で流れる電流が均一にならない。 By the way, when the first auxiliary electrode 60 is not provided, the influence of the resistance component of the first electrode layer 30 is small in the first region 211 near the first bus bar 65, so that a current easily flows. On the other hand, in the second region 212 away from the first bus bar 65, the influence of the resistance component of the first electrode layer 30 becomes large, and it is difficult for the current to flow. That is, when the first auxiliary electrode 60 is not provided, the current flowing in the plane is not uniform.
 これに対して、本実施の形態では、第1貫通孔281の配置密度は、第1バスバー65からの距離に基づいて調整される。具体的には、第1貫通孔281の配置密度は、第1バスバー65から離れる程、大きい。第1貫通孔281の配置密度は、第1バスバー65に近い程、小さい。例えば、第1バスバー65に近い第1領域211に含まれる第1貫通孔281の個数は、第1バスバー65から離れた第2領域212に含まれる第1貫通孔281の個数より少ない。第1貫通孔281の個数が多い第2領域212では、抵抗が小さくなって電流が流れやすくなる。第1バスバー65から離れた第2領域212で電流が流れやすくなるので、面内で流れる電流を均一に近づけることができる。 On the other hand, in the present embodiment, the arrangement density of the first through hole 281 is adjusted based on the distance from the first bus bar 65. Specifically, the arrangement density of the first through hole 281 increases as the distance from the first bus bar 65 increases. The arrangement density of the first through hole 281 is smaller as it is closer to the first bus bar 65. For example, the number of first through holes 281 included in the first region 211 near the first bus bar 65 is smaller than the number of first through holes 281 included in the second region 212 away from the first bus bar 65. In the second region 212, which has a large number of first through holes 281, the resistance becomes small and current easily flows. Since the current easily flows in the second region 212 away from the first bus bar 65, the current flowing in the plane can be made uniform.
 また、図14に示されるように、複数の第1貫通孔281は、平面視において、複数の第1金属線61に重なるように設けられていてもよく、第2金属線62のいずれにも重なっていなくてもよい。あるいは、図15に示されるように、複数の第1貫通孔281は、平面視において、複数の第2金属線62に重なるように設けられていてもよく、第1金属線61のいずれにも重なっていなくてもよい。例えば、第1貫通孔281は、第1金属線61又は第2金属線62の各々において、隣り合う2つの交差部の中央に設けられている。 Further, as shown in FIG. 14, the plurality of first through holes 281 may be provided so as to overlap the plurality of first metal wires 61 in a plan view, and may be provided in any of the second metal wires 62. It does not have to overlap. Alternatively, as shown in FIG. 15, the plurality of first through holes 281 may be provided so as to overlap the plurality of second metal wires 62 in a plan view, and may be provided in any of the first metal wires 61. It does not have to overlap. For example, the first through hole 281 is provided in the center of two adjacent intersections of the first metal wire 61 or the second metal wire 62, respectively.
 また、図16に示されるように、複数の第1貫通孔281には、交差部に設けられた貫通孔と、交差部以外に設けられた貫通孔とが混在して含まれていてもよい。図16では、交差部以外に設けられた複数の第1貫通孔281には、第1金属線61に重なる貫通孔と、第2金属線62に重なる貫通孔とが含まれている。 Further, as shown in FIG. 16, the plurality of first through holes 281 may include a through hole provided at the intersection and a through hole provided at a place other than the intersection in a mixed manner. .. In FIG. 16, the plurality of first through holes 281 provided other than the intersection include a through hole overlapping the first metal wire 61 and a through hole overlapping the second metal wire 62.
 第2貫通孔291の配置は、第1貫通孔281の配置と同様である。つまり、複数の第2貫通孔291は、図13又は図16に示されるように、第1金属線71と第2金属線72との交差部に設けられていてもよい。あるいは、複数の第2貫通孔291は、図14又は図15に示されるように、第1金属線71と第2金属線72との交差部以外に設けられていてもよい。 The arrangement of the second through hole 291 is the same as the arrangement of the first through hole 281. That is, the plurality of second through holes 291 may be provided at the intersection of the first metal wire 71 and the second metal wire 72, as shown in FIG. 13 or FIG. Alternatively, as shown in FIG. 14 or 15, the plurality of second through holes 291 may be provided at a portion other than the intersection of the first metal wire 71 and the second metal wire 72.
 第1貫通孔281と同様に、平面視において、複数の第2貫通孔291の配置密度は、領域によって異なっている。第2貫通孔291の配置密度は、第2バスバー75から離れる程、大きい。図10に示されるように、第1バスバー65がx軸方向の負側に設けられ、第2バスバー75がx軸方向の正側に設けられている。このため、図11に示されるように、第1貫通孔281は、x軸方向の正側に向かう程、配置密度が大きくなるように配置されている。第2貫通孔291は、x軸方向の負側に向かう程、配置密度が大きくなるように配置されている。 Similar to the first through hole 281, in a plan view, the arrangement densities of the plurality of second through holes 291 differ depending on the region. The arrangement density of the second through hole 291 increases as the distance from the second bus bar 75 increases. As shown in FIG. 10, the first bus bar 65 is provided on the negative side in the x-axis direction, and the second bus bar 75 is provided on the positive side in the x-axis direction. Therefore, as shown in FIG. 11, the first through hole 281 is arranged so that the arrangement density increases toward the positive side in the x-axis direction. The second through hole 291 is arranged so that the arrangement density increases toward the negative side in the x-axis direction.
 なお、図13に示される例では、第1貫通孔281は、第1金属線61の線幅及び第2金属線62の線幅よりも大きい。具体的には、第1貫通孔281は、第1金属線61と第2金属線62との交差部を完全に露出させている。これにより、第1貫通孔281内に設けられる第1電極層30と第1金属線61及び第2金属線62との接触面積を大きくすることができるので、コンタクト抵抗を低減することができる。また、第1貫通孔281の大きさが大きいので、第1電極層30に形成される段差が小さくなり、膜切れの発生を抑制することができる。図14~図16に示される例でも同様である。 In the example shown in FIG. 13, the first through hole 281 is larger than the line width of the first metal wire 61 and the line width of the second metal wire 62. Specifically, the first through hole 281 completely exposes the intersection of the first metal wire 61 and the second metal wire 62. As a result, the contact area between the first electrode layer 30 provided in the first through hole 281 and the first metal wire 61 and the second metal wire 62 can be increased, so that the contact resistance can be reduced. Further, since the size of the first through hole 281 is large, the step formed in the first electrode layer 30 becomes small, and the occurrence of film breakage can be suppressed. The same applies to the examples shown in FIGS. 14 to 16.
 あるいは、複数の第1貫通孔281の各々は、図8と同様に、平面視において、第1金属線61の内側に配置されていてもよい。 Alternatively, each of the plurality of first through holes 281 may be arranged inside the first metal wire 61 in a plan view, as in FIG.
 なお、第1貫通孔281の平面視形状は、例えば正方形などの矩形であるが、円形であってもよい。この場合、第1貫通孔281の開口径は、第1金属線61の線幅w1及び第2金属線62の線幅w2よりも短くてもよい。第2貫通孔291の平面視形状及び大きさについても、第1貫通孔281と同様である。 The plan view shape of the first through hole 281 is a rectangle such as a square, but it may be a circle. In this case, the opening diameter of the first through hole 281 may be shorter than the line width w1 of the first metal wire 61 and the line width w2 of the second metal wire 62. The shape and size of the second through hole 291 in a plan view are the same as those of the first through hole 281.
 [2-3.光学状態の変化]
 次に、本実施の形態に係る調光パネル201の光学状態の変化について説明する。
[2-3. Change in optical state]
Next, a change in the optical state of the dimming panel 201 according to the present embodiment will be described.
 調光パネル201の光学状態は、図10に示される制御回路3によって制御される。具体的には、制御回路3が電源2を制御し、第1電極層30及び第2電極層40の各々に印加される電圧の大きさ及び極性を変更することにより、調光パネル201の光学状態を変化させることができる。 The optical state of the dimming panel 201 is controlled by the control circuit 3 shown in FIG. Specifically, the control circuit 3 controls the power supply 2 and changes the magnitude and polarity of the voltage applied to each of the first electrode layer 30 and the second electrode layer 40 to change the optics of the dimming panel 201. The state can be changed.
 [2-3-1.透光状態(透明状態)]
 制御回路3が、第1電極層30と第2電極層40との間に印加する電圧を0Vにする。この場合、調光パネル201の光学状態は、図12Aに示される透光状態(透明状態)になる。印加電圧が0Vである場合、エレクトロクロミック層50に含まれる金属イオンが析出されない。このため、エレクトロクロミック層50は、光を透過させる透光状態になる。第1基板10、第1絶縁層80、第1電極層30、エレクトロクロミック層50、第2電極層40、第2絶縁層90、第2基板20の各々の屈折率が実質的に等しい場合、入射する光がそのまま通過する。つまり、調光パネル201の光学状態は、透明状態になる。
[2-3-1. Translucent state (transparent state)]
The voltage applied by the control circuit 3 between the first electrode layer 30 and the second electrode layer 40 is set to 0V. In this case, the optical state of the dimming panel 201 is the translucent state (transparent state) shown in FIG. 12A. When the applied voltage is 0V, the metal ions contained in the electrochromic layer 50 are not precipitated. Therefore, the electrochromic layer 50 is in a translucent state in which light is transmitted. When the refractive indexes of the first substrate 10, the first insulating layer 80, the first electrode layer 30, the electrochromic layer 50, the second electrode layer 40, the second insulating layer 90, and the second substrate 20 are substantially equal. The incident light passes as it is. That is, the optical state of the dimming panel 201 becomes a transparent state.
 [2-3-2.反射状態]
 また、制御回路3は、第1電極層30の電位が第2電極層40の電位より低くなるように、第1電極層30と第2電極層40とに電圧を印加する。この場合、調光パネル201の光学状態は、図12Bに示される反射状態になる。第1電極層30の電位が第2電極層40の電位より低いので、エレクトロクロミック層50内の金属が金属薄膜52として第1電極層30の表面に析出する。このため、調光パネル201は、光を反射させる反射状態になる。
[2-3-2. Reflection state]
Further, the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40. In this case, the optical state of the dimming panel 201 is the reflection state shown in FIG. 12B. Since the potential of the first electrode layer 30 is lower than the potential of the second electrode layer 40, the metal in the electrochromic layer 50 is deposited on the surface of the first electrode layer 30 as a metal thin film 52. Therefore, the dimming panel 201 is in a reflective state that reflects light.
 なお、図12Bでは、第1電極層30の表面に金属薄膜52が形成されているが、第2電極層40の表面に金属薄膜52が形成されてもよい。例えば、制御回路3が、第1電極層30の電位が第2電極層40の電位より高くなるように、第1電極層30と第2電極層40とに電圧を印加することで、金属薄膜52は、第2電極層40の表面に形成される。 Although the metal thin film 52 is formed on the surface of the first electrode layer 30 in FIG. 12B, the metal thin film 52 may be formed on the surface of the second electrode layer 40. For example, the control circuit 3 applies a voltage to the first electrode layer 30 and the second electrode layer 40 so that the potential of the first electrode layer 30 is higher than the potential of the second electrode layer 40, thereby forming a metal thin film. 52 is formed on the surface of the second electrode layer 40.
 [2-4.変形例]
 続いて、実施の形態2の変形例について説明する。以下の変形例では、実施の形態2との相違点を中心に説明し、共通点の説明を省略又は簡略化する。
[2-4. Modification example]
Subsequently, a modified example of the second embodiment will be described. In the following modification, the differences from the second embodiment will be mainly described, and the common points will be omitted or simplified.
 図17は、本変形例に係る調光パネル301の断面図である。図17に示される調光パネル101は、実施の形態2に係る調光パネル201と比較して、第2補助電極70及び第2絶縁層90が設けられていない。具体的には、第2電極層40が第2基板20の主面に直接設けられている。 FIG. 17 is a cross-sectional view of the dimming panel 301 according to this modified example. The dimming panel 101 shown in FIG. 17 is not provided with the second auxiliary electrode 70 and the second insulating layer 90 as compared with the dimming panel 201 according to the second embodiment. Specifically, the second electrode layer 40 is directly provided on the main surface of the second substrate 20.
 この場合、図17に示されるように、第1電極層30の表面に金属薄膜52が形成された場合、第2基板20側(z軸の正側)から調光パネル301を見たときに第1補助電極60が見えなくなる。つまり、金属薄膜52の手前に補助電極が設けられていないので、金属薄膜52の析出時の見栄えを良くすることができる。 In this case, as shown in FIG. 17, when the metal thin film 52 is formed on the surface of the first electrode layer 30, when the dimming panel 301 is viewed from the second substrate 20 side (the positive side of the z-axis). The first auxiliary electrode 60 disappears. That is, since the auxiliary electrode is not provided in front of the metal thin film 52, the appearance of the metal thin film 52 at the time of precipitation can be improved.
 (実施の形態3)
 続いて、実施の形態3について説明する。
(Embodiment 3)
Subsequently, the third embodiment will be described.
 実施の形態3では、実施の形態2と比較して第1貫通孔及び第2貫通孔の配置及び大きさが相違する。以下では、実施の形態2との相違点を中心に説明し、共通点の説明を省略又は簡略化する。 In the third embodiment, the arrangement and size of the first through hole and the second through hole are different from those in the second embodiment. In the following, the differences from the second embodiment will be mainly described, and the common points will be omitted or simplified.
 [3-1.概要]
 図18は、本実施の形態に係る調光パネル401の断面図である。図18に示される断面図は、図11と同様である。具体的には、図18の(a)は、第1金属線61に沿った線(図10のXIA-XIA線に相当)での第1基板10側の断面を示している。図18の(b)は、第1金属線71に沿った線(図10のXIB-XIB線に相当)での第2基板20側の断面を示している。
[3-1. Overview]
FIG. 18 is a cross-sectional view of the dimming panel 401 according to the present embodiment. The cross-sectional view shown in FIG. 18 is the same as that in FIG. Specifically, FIG. 18A shows a cross section of the first substrate 10 side along a line along the first metal wire 61 (corresponding to the XIA-XIA wire in FIG. 10). FIG. 18B shows a cross section of the second substrate 20 side along a line along the first metal wire 71 (corresponding to the XIB-XIB wire of FIG. 10).
 図18に示されるように、本実施の形態に係る調光パネル401では、実施の形態2に係る調光パネル201と比較して、第1絶縁層80には第1貫通孔281の代わりに第1貫通孔481が設けられている点と、第2絶縁層90には第2貫通孔291の代わりに第2貫通孔491が設けられている点とが相違する。 As shown in FIG. 18, in the dimming panel 401 according to the present embodiment, the first insulating layer 80 is replaced with the first through hole 281 as compared with the dimming panel 201 according to the second embodiment. The difference is that the first through hole 481 is provided and the second through hole 491 is provided in the second insulating layer 90 instead of the second through hole 291.
 本実施の形態では、複数の第1貫通孔481の配置密度は、均一である。複数の第1貫通孔481の面積は、領域によって異なっている。同様に、複数の第2貫通孔491の配置密度は、均一である。複数の第2貫通孔491の面積は、領域によって異なっている。 In the present embodiment, the arrangement densities of the plurality of first through holes 481 are uniform. The area of the plurality of first through holes 481 varies depending on the region. Similarly, the placement densities of the plurality of second through holes 491 are uniform. The area of the plurality of second through holes 491 varies depending on the region.
 [3-2.貫通孔の配置及び大きさ]
 以下では、第1貫通孔481の配置及び大きさについて、図19を用いて説明する。図19は、本実施の形態に係る調光パネル401の第1絶縁層80に設けられた第1貫通孔481の配置例を示す平面図である。
[3-2. Arrangement and size of through holes]
Hereinafter, the arrangement and size of the first through hole 481 will be described with reference to FIG. FIG. 19 is a plan view showing an arrangement example of the first through hole 481 provided in the first insulating layer 80 of the dimming panel 401 according to the present embodiment.
 図19に示されるように、複数の第1貫通孔481は、平面視において、第1金属線61と第2金属線62との交差部に設けられている。本実施の形態では、平面視において、複数の第1貫通孔481には、平面視における大きさが異なる貫通孔が含まれている。具体的には、第1貫通孔481の面積は、第1バスバー65から離れる程、大きく、第1バスバー65に近い程、小さい。図19に示される例では、第1貫通孔481の面積は、第1バスバー65からの距離が大きくなる程、徐々に大きくなっている。例えば、一の第2金属線62に重なる第1貫通孔481の面積と、その隣の第2金属線62に重なる第1貫通孔481の面積とは異なっている。つまり、第1領域211内に含まれる9個の第1貫通孔481では、第1バスバー65に最も近い第1貫通孔481の面積は、第1バスバー65から最も遠い第1貫通孔481の面積よりも小さい。 As shown in FIG. 19, a plurality of first through holes 481 are provided at the intersection of the first metal wire 61 and the second metal wire 62 in a plan view. In the present embodiment, in the plan view, the plurality of first through holes 481 include through holes having different sizes in the plan view. Specifically, the area of the first through hole 481 is larger as the distance from the first bus bar 65 is larger, and is smaller as the area is closer to the first bus bar 65. In the example shown in FIG. 19, the area of the first through hole 481 gradually increases as the distance from the first bus bar 65 increases. For example, the area of the first through hole 481 overlapping the one second metal wire 62 is different from the area of the first through hole 481 overlapping the second metal wire 62 adjacent thereto. That is, in the nine first through holes 481 included in the first region 211, the area of the first through hole 481 closest to the first bus bar 65 is the area of the first through hole 481 farthest from the first bus bar 65. Smaller than
 あるいは、複数の第1貫通孔481には、面積が異なる2種類の貫通孔が含まれていてもよい。例えば、例えば、y軸に平行な分割線で第1基板10を二分割し、第1バスバー65側の領域における第1貫通孔481の面積は、互いに等しく、かつ、第1バスバー65とは反対側の領域における第1貫通孔481の面積よりも小さくてもよい。この場合、第1領域211に含まれる9個の第1貫通孔481は全て同じ大きさになり、第2領域212に含まれる9個の第1貫通孔481よりも小さくなる。 Alternatively, the plurality of first through holes 481 may include two types of through holes having different areas. For example, the first substrate 10 is divided into two by a dividing line parallel to the y-axis, and the areas of the first through holes 481 in the region on the first bus bar 65 side are equal to each other and opposite to those of the first bus bar 65. It may be smaller than the area of the first through hole 481 in the side region. In this case, the nine first through holes 481 included in the first region 211 are all the same size, and are smaller than the nine first through holes 481 included in the second region 212.
 なお、複数の第1貫通孔481には、面積が異なる3種類以上の貫通孔が含まれていてもよい。例えば、平面視において、第1バスバー65からの距離に応じて、第1基板10を複数の領域に仮想的に分割し、分割した領域内では第1貫通孔481の面積が互いに等しくてもよい。 Note that the plurality of first through holes 481 may include three or more types of through holes having different areas. For example, in a plan view, the first substrate 10 may be virtually divided into a plurality of regions according to the distance from the first bus bar 65, and the areas of the first through holes 481 may be equal to each other in the divided regions. ..
 第1貫通孔481の面積が大きい程、第1貫通孔481を介した、第1電極層30と第1補助電極60との接続面積が大きくなる。したがって、第1バスバー65から離れた第2領域212では、第1バスバー65に近い第1領域211よりも、第1貫通孔481の面積が大きいので、第1電極層30と第1補助電極60との接続面積が大きくなる。したがって、第1バスバー65から離れた第2領域212で電流が流れやすくなるので、面内で流れる電流を均一に近づけることができる。 The larger the area of the first through hole 481, the larger the connection area between the first electrode layer 30 and the first auxiliary electrode 60 via the first through hole 481. Therefore, in the second region 212 away from the first bus bar 65, the area of the first through hole 481 is larger than that of the first region 211 near the first bus bar 65, so that the first electrode layer 30 and the first auxiliary electrode 60 The connection area with is large. Therefore, since the current easily flows in the second region 212 away from the first bus bar 65, the current flowing in the plane can be made uniform.
 第2貫通孔491についても同様である。具体的には、第2貫通孔491の面積は、第2バスバー75から離れる程、大きく、第2バスバー75に近い程、小さくなる。このため、図18に示されるように、第1貫通孔481は、x軸方向の正側に向かう程、面積が大きくなるように設けられている。第2貫通孔491は、x軸方向の負側に向かう程、面積が大きくなるように配置されている。 The same applies to the second through hole 491. Specifically, the area of the second through hole 491 increases as the distance from the second bus bar 75 increases, and decreases as the area approaches the second bus bar 75. Therefore, as shown in FIG. 18, the first through hole 481 is provided so that the area increases toward the positive side in the x-axis direction. The second through hole 491 is arranged so that the area increases toward the negative side in the x-axis direction.
 なお、図19に示される例では、第1貫通孔481は、第1金属線61と第2金属線62との交差部に設けられているが、これに限らない。図14~図16で示した場合と同様に、第1貫通孔481は、第1金属線61と第2金属線62との交差部以外の部分に設けられていてもよい。つまり、複数の第1貫通孔481のうちの少なくとも1つは、平面視において、第1金属線61には重複し、第2金属線62には重複していなくてもよい。あるいは、複数の第1貫通孔481のうちの少なくとも1つは、平面視において、第2金属線62には重複し、第1金属線61には重複していなくてもよい。第2貫通孔491についても同様である。 In the example shown in FIG. 19, the first through hole 481 is provided at the intersection of the first metal wire 61 and the second metal wire 62, but is not limited to this. Similar to the case shown in FIGS. 14 to 16, the first through hole 481 may be provided at a portion other than the intersection of the first metal wire 61 and the second metal wire 62. That is, at least one of the plurality of first through holes 481 does not have to overlap the first metal wire 61 and the second metal wire 62 in a plan view. Alternatively, at least one of the plurality of first through holes 481 may overlap the second metal wire 62 and not overlap the first metal wire 61 in a plan view. The same applies to the second through hole 491.
 なお、本実施の形態では、第1絶縁層80には、実施の形態2と同様に、配置密度が領域によって異なる複数の第1貫通孔281が設けられていてもよい。あるいは、第2絶縁層90には、実施の形態2と同様に、配置密度が領域によって異なる複数の第2貫通孔291が設けられていてもよい。つまり、実施の形態2と実施の形態3とが組み合わされていてもよい。 In the present embodiment, the first insulating layer 80 may be provided with a plurality of first through holes 281 having different arrangement densities depending on the region, as in the second embodiment. Alternatively, the second insulating layer 90 may be provided with a plurality of second through holes 291 having different arrangement densities depending on the region, as in the second embodiment. That is, the second embodiment and the third embodiment may be combined.
 また、例えば、複数の第1貫通孔481は、面積だけでなく、配置密度も領域によって異なっていてもよい。複数の第2貫通孔491も同様に、面積だけでなく、配置密度も領域によって異なっていてもよい。あるいは、例えば、複数の第1貫通孔281又は481と、複数の第2貫通孔291又は491との一方は、配置密度が均一であり、面積が互いに等しくてもよい。 Further, for example, the plurality of first through holes 481 may differ not only in area but also in arrangement density depending on the region. Similarly, not only the area but also the arrangement density of the plurality of second through holes 491 may differ depending on the region. Alternatively, for example, one of the plurality of first through holes 281 or 481 and the plurality of second through holes 291 or 491 may have a uniform arrangement density and may have the same area.
 (他の実施の形態)
 以上、1つ又は複数の態様に係る調光パネルについて、実施の形態に基づいて説明したが、本開示は、これらの実施の形態に限定されるものではない。本開示の主旨を逸脱しない限り、当業者が思いつく各種変形を本実施の形態に施したもの、及び、異なる実施の形態における構成要素を組み合わせて構築される形態も、本開示の範囲内に含まれる。
(Other embodiments)
The dimming panel according to one or more embodiments has been described above based on the embodiments, but the present disclosure is not limited to these embodiments. As long as the gist of the present disclosure is not deviated, various modifications that can be conceived by those skilled in the art are applied to the present embodiment, and a form constructed by combining components in different embodiments is also included in the scope of the present disclosure. Is done.
 例えば、エレクトロクロミック層50の光学状態には、透過率が十分に高い透明状態と、透過率が低い着色状態(半透明状態)とが含まれてもよい。第1電極層30と第2電極層40とに印加する電圧の大きさを調整することにより、析出される金属薄膜52の厚みを調整することができる。薄い金属薄膜52を析出させることにより、着色状態を形成することができる。 For example, the optical state of the electrochromic layer 50 may include a transparent state having a sufficiently high transmittance and a colored state having a low transmittance (semi-transparent state). By adjusting the magnitude of the voltage applied to the first electrode layer 30 and the second electrode layer 40, the thickness of the deposited metal thin film 52 can be adjusted. A colored state can be formed by precipitating the thin metal thin film 52.
 また、例えば、第1補助電極60及び第2補助電極70の少なくとも一方は、平面視形状がストライプ状であってもよい。例えば、第1補助電極60は、複数の第1金属線61を含み、第2金属線62を含んでいなくてもよい。あるいは、第1補助電極60は、複数の第2金属線62を含み、第1金属線61を含んでいなくてもよい。第2補助電極70についても同様である。なお、第1補助電極60又は第2補助電極70の平面視形状がストライプ状である場合、第1領域211及び第2領域212は、3本の金属線を含む正方形の領域であってもよい。 Further, for example, at least one of the first auxiliary electrode 60 and the second auxiliary electrode 70 may have a striped shape in a plan view. For example, the first auxiliary electrode 60 may include a plurality of first metal wires 61 and may not include the second metal wire 62. Alternatively, the first auxiliary electrode 60 may include a plurality of second metal wires 62 and may not include the first metal wire 61. The same applies to the second auxiliary electrode 70. When the plan view shape of the first auxiliary electrode 60 or the second auxiliary electrode 70 is striped, the first region 211 and the second region 212 may be square regions including three metal wires. ..
 また、第1補助電極60と第2補助電極70とは、平面視において一致していてもよい。例えば、複数の第1金属線61と複数の第1金属線71とは、平面視において、一部のみ又は完全に重なっていてもよい。例えば、複数の第2金属線62と複数の第2金属線72とは、平面視において、一部のみ又は完全に重なっていてもよい。 Further, the first auxiliary electrode 60 and the second auxiliary electrode 70 may coincide with each other in a plan view. For example, the plurality of first metal wires 61 and the plurality of first metal wires 71 may partially or completely overlap in a plan view. For example, the plurality of second metal wires 62 and the plurality of second metal wires 72 may partially or completely overlap in a plan view.
 また、例えば、第1金属線61と第2金属線62とは、斜めに交差していてもよい。また、第1金属線61の線幅及び間隔は、面内で均一でなくてもよい。第2金属線62についても同様である。第2補助電極70の第1金属線71及び第2金属線72についても同様である。 Further, for example, the first metal wire 61 and the second metal wire 62 may intersect at an angle. Further, the line width and spacing of the first metal wire 61 do not have to be uniform in the plane. The same applies to the second metal wire 62. The same applies to the first metal wire 71 and the second metal wire 72 of the second auxiliary electrode 70.
 また、例えば、第1補助電極60及び第2補助電極70は、第1電極層30及び第2電極層40を構成する材料よりも低抵抗な材料であればよく、透光性を有する材料を用いて形成されていてもよい。この場合、第1補助電極60及び第2補助電極70の各々の屈折率は、第1基板10、第2基板20、第1電極層30、第2電極層40、第1絶縁層80及び第2絶縁層90の各々の屈折率と等しくてもよく、異なっていてもよい。各層の屈折率を等しくすることにより、調光パネル1の透光状態における透明性を高めることができる。 Further, for example, the first auxiliary electrode 60 and the second auxiliary electrode 70 may be made of a material having a lower resistance than the material constituting the first electrode layer 30 and the second electrode layer 40, and may be a material having translucency. It may be formed by using. In this case, the refractive indexes of the first auxiliary electrode 60 and the second auxiliary electrode 70 are the first substrate 10, the second substrate 20, the first electrode layer 30, the second electrode layer 40, the first insulating layer 80, and the first. The refractive index of each of the two insulating layers 90 may be equal to or different from each other. By making the refractive indexes of the layers equal, the transparency of the dimming panel 1 in the translucent state can be enhanced.
 また、例えば、第1基板10の二辺に沿って2本の第1バスバー65が設けられている場合、2本の第1バスバー65の各々からの距離が大きい程、第1貫通孔281の配置密度は大きくなってもよい。例えば、第1基板10の向かい合う二辺に2本の第1バスバー65が設けられている場合、第1貫通孔281の配置密度は、第1基板10の中央程、大きくなる。第1基板10の隣り合う二辺に2本の第1バスバー65が設けられている場合、2本の第1バスバー65がなす角の対角に近い領域程、第1貫通孔281の配置密度が大きくなる。第1基板10の四辺に沿って4本の第1バスバー65が設けられている場合、第1貫通孔281の配置密度は、第1基板10の中央程、大きくなる。これらのことは、第2貫通孔291についても、第2バスバー75との関係において同様である。また、第1貫通孔481の面積、及び、第2貫通孔491の面積についても同様である。 Further, for example, when two first bus bars 65 are provided along two sides of the first substrate 10, the larger the distance from each of the two first bus bars 65, the more the first through hole 281 is formed. The placement density may be high. For example, when two first bus bars 65 are provided on two opposite sides of the first substrate 10, the arrangement density of the first through holes 281 becomes larger toward the center of the first substrate 10. When two first bus bars 65 are provided on two adjacent sides of the first substrate 10, the area closer to the diagonal of the angle formed by the two first bus bars 65 is the arrangement density of the first through holes 281. Becomes larger. When four first bus bars 65 are provided along the four sides of the first substrate 10, the arrangement density of the first through holes 281 becomes larger toward the center of the first substrate 10. These things are the same for the second through hole 291 in relation to the second bus bar 75. The same applies to the area of the first through hole 481 and the area of the second through hole 491.
 また、例えば、第1貫通孔281の配置密度及び面積の少なくとも一方は、第1バスバー65からの距離に依存せずに調整されていてもよい。例えば、第1電極層30の厚みが他より小さい領域では、第1電極層30の抵抗が大きくなるので、第1貫通孔281の配置密度及び面積の少なくとも一方を大きくしてもよい。第2貫通孔291の配置密度及び面積の少なくとも一方についても同様であってもよい。 Further, for example, at least one of the arrangement density and the area of the first through hole 281 may be adjusted independently of the distance from the first bus bar 65. For example, in a region where the thickness of the first electrode layer 30 is smaller than the others, the resistance of the first electrode layer 30 increases, so that at least one of the arrangement density and the area of the first through hole 281 may be increased. The same may be applied to at least one of the arrangement density and the area of the second through hole 291.
 また、例えば、本開示の一態様は、各実施の形態に係る調光パネルと、電源2を制御する制御回路3とを備えるパネル装置として実現されてもよい。また、パネル装置は、電源2を備えてもよい。 Further, for example, one aspect of the present disclosure may be realized as a panel device including a dimming panel according to each embodiment and a control circuit 3 for controlling the power supply 2. Further, the panel device may include a power supply 2.
 また、上記の各実施の形態は、請求の範囲又はその均等の範囲において種々の変更、置き換え、付加、省略などを行うことができる。 Further, in each of the above embodiments, various changes, replacements, additions, omissions, etc. can be made within the claims or the equivalent range thereof.
 本開示は、電極内での電圧降下を抑制することができる調光パネルとして利用でき、例えば、建築物又は移動体の窓などの建材に利用することができる。 The present disclosure can be used as a dimming panel capable of suppressing a voltage drop in an electrode, and can be used, for example, as a building material such as a window of a building or a moving body.
1、101、201、301、401 調光パネル
2 電源
3 制御回路
10 第1基板
20 第2基板
30 第1電極層
40 第2電極層
50 エレクトロクロミック層
52 金属薄膜
60 第1補助電極
61、71 第1金属線
62、72 第2金属線
65 第1バスバー
70 第2補助電極
75 第2バスバー
80 第1絶縁層
81、281、481 第1貫通孔
90 第2絶縁層
91、291、491 第2貫通孔
211 第1領域
212 第2領域
1, 101, 201, 301, 401 Dimming panel 2 Power supply 3 Control circuit 10 1st substrate 20 2nd substrate 30 1st electrode layer 40 2nd electrode layer 50 Electrochromic layer 52 Metal thin film 60 1st auxiliary electrode 61, 71 1st metal wire 62, 72 2nd metal wire 65 1st bus bar 70 2nd auxiliary electrode 75 2nd bus bar 80 1st insulating layer 81, 281, 481 1st through hole 90 2nd insulating layer 91, 291, 491 2nd Through hole 211 1st region 212 2nd region

Claims (13)

  1.  透光性を有する第1基板と、
     前記第1基板に対向して配置された、透光性を有する第2基板と、
     前記第1基板と前記第2基板との間に配置されたエレクトロクロミック層と、
     前記エレクトロクロミック層と前記第1基板との間に配置された、透光性を有する第1電極層と、
     前記エレクトロクロミック層と前記第2基板との間に配置された、透光性を有する第2電極層と、
     前記第1電極層と前記第1基板との間に配置された、金属を含む第1補助電極と、
     前記第1補助電極と前記第1電極層との間に配置された、透光性を有する第1絶縁層とを備え、
     前記第1絶縁層は、複数の第1貫通孔を有し、
     前記第1電極層は、前記複数の第1貫通孔を介して前記第1補助電極に電気的に接続されている、
     調光パネル。
    The first substrate having translucency and
    A second substrate having translucency, which is arranged to face the first substrate, and
    An electrochromic layer arranged between the first substrate and the second substrate,
    A translucent first electrode layer arranged between the electrochromic layer and the first substrate,
    A second electrode layer having translucency, which is arranged between the electrochromic layer and the second substrate,
    A first auxiliary electrode containing a metal, which is arranged between the first electrode layer and the first substrate,
    A translucent first insulating layer arranged between the first auxiliary electrode and the first electrode layer is provided.
    The first insulating layer has a plurality of first through holes and has a plurality of first through holes.
    The first electrode layer is electrically connected to the first auxiliary electrode through the plurality of first through holes.
    Dimming panel.
  2.  平面視において、前記複数の第1貫通孔の配置密度及び面積の少なくとも一方は、領域によって異なっている、
     請求項1に記載の調光パネル。
    In plan view, at least one of the arrangement densities and areas of the plurality of first through holes differs depending on the region.
    The dimming panel according to claim 1.
  3.  前記複数の第1貫通孔の面積は、互いに等しく、
     前記複数の第1貫通孔の配置密度は、領域によって異なっている、
     請求項2に記載の調光パネル。
    The areas of the plurality of first through holes are equal to each other,
    The arrangement densities of the plurality of first through holes differ depending on the region.
    The dimming panel according to claim 2.
  4.  前記複数の第1貫通孔の配置密度は、均一であり、
     前記複数の第1貫通孔の面積は、領域によって異なっている、
     請求項2に記載の調光パネル。
    The arrangement density of the plurality of first through holes is uniform,
    The areas of the plurality of first through holes differ depending on the region.
    The dimming panel according to claim 2.
  5.  さらに、前記第1電極層の端部に接続された第1給電端子部を備え、
     前記配置密度及び前記面積の少なくとも一方は、前記第1給電端子部から離れる程、大きい、
     請求項2~4のいずれか1項に記載の調光パネル。
    Further, a first feeding terminal portion connected to the end portion of the first electrode layer is provided.
    At least one of the arrangement density and the area increases as the distance from the first power feeding terminal portion increases.
    The dimming panel according to any one of claims 2 to 4.
  6.  前記第1補助電極は、各々が、第1方向に延びる複数の第1金属線を含む、
     請求項1~5のいずれか1項に記載の調光パネル。
    Each of the first auxiliary electrodes includes a plurality of first metal wires extending in the first direction.
    The dimming panel according to any one of claims 1 to 5.
  7.  前記第1補助電極は、さらに、各々が、前記第1方向に交差する第2方向に延び、前記複数の第1金属線の少なくとも1つに交差する複数の第2金属線を含む、
     請求項6に記載の調光パネル。
    The first auxiliary electrode further comprises a plurality of second metal wires, each extending in a second direction intersecting the first direction and intersecting at least one of the plurality of first metal wires.
    The dimming panel according to claim 6.
  8.  前記複数の第1貫通孔は、平面視において、前記第1金属線と前記第2金属線との交差部に設けられている、
     請求項7に記載の調光パネル。
    The plurality of first through holes are provided at the intersection of the first metal wire and the second metal wire in a plan view.
    The dimming panel according to claim 7.
  9.  前記複数の第1貫通孔の各々は、平面視において、前記第1金属線の内側に配置されている、
     請求項6~8のいずれか1項に記載の調光パネル。
    Each of the plurality of first through holes is arranged inside the first metal wire in a plan view.
    The dimming panel according to any one of claims 6 to 8.
  10.  前記第1絶縁層は、無機材料を用いて形成されている、
     請求項1~9のいずれか1項に記載の調光パネル。
    The first insulating layer is formed by using an inorganic material.
    The dimming panel according to any one of claims 1 to 9.
  11.  さらに、
     前記第2電極層と前記第2基板との間に配置された、金属を含む第2補助電極と、
     前記第2補助電極と前記第2電極層との間に配置された、透光性を有する第2絶縁層とを備え、
     前記第2絶縁層は、複数の第2貫通孔を有し、
     前記第2電極層は、前記複数の第2貫通孔を介して前記第2補助電極に電気的に接続されている、
     請求項1~10のいずれか1項に記載の調光パネル。
    Moreover,
    A second auxiliary electrode containing a metal, which is arranged between the second electrode layer and the second substrate,
    A second insulating layer having translucency, which is arranged between the second auxiliary electrode and the second electrode layer, is provided.
    The second insulating layer has a plurality of second through holes and has a plurality of second through holes.
    The second electrode layer is electrically connected to the second auxiliary electrode through the plurality of second through holes.
    The dimming panel according to any one of claims 1 to 10.
  12.  平面視において、前記複数の第2貫通孔の配置密度及び面積の少なくとも一方は、領域によって異なっている、
     請求項11に記載の調光パネル。
    In plan view, at least one of the arrangement densities and areas of the plurality of second through holes differs depending on the region.
    The dimming panel according to claim 11.
  13.  前記第1補助電極と前記第2補助電極とはそれぞれ、第1方向に延びる複数の第1金属線を含み、
     前記第1補助電極が含む複数の第1金属線と、前記第2補助電極が含む複数の第1金属線とは、平面視で重ならないように配置されている、
     請求項11又は12に記載の調光パネル。
    The first auxiliary electrode and the second auxiliary electrode each include a plurality of first metal wires extending in the first direction.
    The plurality of first metal wires included in the first auxiliary electrode and the plurality of first metal wires included in the second auxiliary electrode are arranged so as not to overlap in a plan view.
    The dimming panel according to claim 11 or 12.
PCT/JP2020/045346 2020-02-21 2020-12-04 Light control panel WO2021166379A1 (en)

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JPH01237527A (en) * 1988-03-17 1989-09-22 Toyoda Gosei Co Ltd Substrate with auxiliary electrode for electrochromic element
JP2016164686A (en) * 2010-07-01 2016-09-08 株式会社半導体エネルギー研究所 Electric field driving type display device
US20170168363A1 (en) * 2015-12-15 2017-06-15 Lg Display Co., Ltd. Light controlling device, transparent display device including the same and method for manufacturing the same

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JPH01237527A (en) * 1988-03-17 1989-09-22 Toyoda Gosei Co Ltd Substrate with auxiliary electrode for electrochromic element
JP2016164686A (en) * 2010-07-01 2016-09-08 株式会社半導体エネルギー研究所 Electric field driving type display device
US20170168363A1 (en) * 2015-12-15 2017-06-15 Lg Display Co., Ltd. Light controlling device, transparent display device including the same and method for manufacturing the same

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