WO2021152882A1 - Gas treatment device and gas treatment method - Google Patents

Abstract

In a gas treatment device and a gas treatment method according to the present invention, a treatment solution is used to separate an acidic compound from a gas to be treated, wherein the gas to be treated is brought into contact with the treatment solution in an absorber, and the treatment solution that has come into contact with the gas to be treated is heated in a regenerator to separate out the acidic compound. Furthermore, in the present invention, at least one of the absorber and the regenerator includes at least one tank.

Description

Gas treatment equipment and gas treatment method

The present invention relates to a gas treatment apparatus and a gas treatment method for separating a predetermined substance from a gas to be treated by using a predetermined treatment liquid.

Conventionally, a gas treatment device and a gas treatment method for separating a predetermined substance from a gas to be treated are known. For example, Patent Document 1 discloses a carbon dioxide gas recovery device that separates and recovers carbon dioxide gas by using a chemical absorption separation method. The carbon dioxide gas recovery device disclosed in Patent Document 1 introduces and contacts a gas to be separated containing carbon dioxide gas and a lean absorbing liquid, and uses the carbon dioxide gas in the gas to be separated as an absorbing liquid. An absorption tower that absorbs and produces a rich absorption liquid, and the rich absorption liquid are supplied from the absorption tower, and the rich absorption liquid is heated to separate the carbon dioxide gas to regenerate the lean absorption liquid. It is equipped with a regeneration tower.

By the way, as a method of separating substances, there is a method of using a treatment liquid for phase separation (liquid phase separation) in a liquid phase between a first phase portion and a second phase portion (see, for example, Japanese Patent Application Laid-Open No. 2018-187553). In this method using a treatment liquid for liquid phase separation, from the viewpoint of efficient interaction, it is preferable that the area (contact area) at the gas / liquid interface on the treatment liquid surface is large on the absorption side, and the treatment liquid surface on the regeneration side. It is preferable that the area (contact area) at each interface of gas / liquid / liquid in the treated liquid separated by the liquid phase is large. The surface of the treatment liquid includes not only the outer surface of the treatment liquid but also the surface generated in the treatment liquid by, for example, air bubbles. When the method using the liquid phase separating treatment liquid is applied to the apparatus disclosed in Patent Document 1, since the absorption tower and the regeneration tower are used in Patent Document 1, the column diameter It is difficult to increase the area (contact area) of the interface.

Japanese Unexamined Patent Publication No. 2011-212510

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a gas treatment apparatus and a gas treatment method capable of efficiently interacting with each other when a liquid phase separation treatment liquid is used. ..

The gas treatment apparatus and gas treatment method according to the present invention separate an acidic compound from a gas to be treated by using a treatment liquid, and the gas to be treated is brought into contact with the treatment liquid by an absorber to be treated. The treatment liquid in contact with the gas is heated in a regenerator to separate acidic compounds. and. In the present invention, at least one of the absorber and the regenerator includes at least one tank. The gas treatment apparatus and the gas treatment method according to the present invention can interact efficiently when a treatment liquid for liquid phase separation is used.

The above and other purposes, features and advantages of the present invention will be clarified from the following detailed description and accompanying drawings.

It is a figure which shows schematic the structure of the gas processing apparatus in 1st Embodiment. It is a figure which shows schematic structure of the gas processing apparatus in 2nd Embodiment. It is a figure which shows roughly the structure of the gas processing apparatus in 3rd Embodiment. It is a figure for demonstrating the interface area increase part of the 1st aspect provided in the tank of the gas processing apparatus. It is a figure for demonstrating each interface area increase part of the 2nd and 3rd aspects provided in the tank of the gas processing apparatus. It is a figure for demonstrating the interface area increase part of the 4th aspect provided in the tank of the gas processing apparatus. It is a figure for demonstrating the spray pattern in the interface area increase part of the 4th aspect. It is a figure for demonstrating each interface area increase part of 5th and 6th aspects provided in the tank of the gas processing apparatus.

Hereinafter, one or more embodiments of the present invention will be described with reference to the drawings. However, the scope of the invention is not limited to the disclosed embodiments. It should be noted that the configurations with the same reference numerals in the respective drawings indicate that they are the same configurations, and the description thereof will be omitted as appropriate. In the present specification, when they are generically referred to, they are indicated by reference numerals without subscripts, and when they refer to individual configurations, they are indicated by reference numerals with subscripts.

The gas treatment apparatus according to the embodiment uses a gas to be treated containing an acidic compound that produces an acid when dissolved in water and a treatment liquid that undergoes phase separation by absorbing the acidic compound, and separates the acidic compound from the gas to be treated. It is a device to do. This gas treatment device includes an absorber that brings the gas to be treated into contact with the treatment liquid, and a regenerator that heats the treatment liquid that comes into contact with the gas to be treated to separate acidic compounds. Then, in this gas processing apparatus, at least one of the absorber and the regenerator includes at least one tank. Hereinafter, such a gas treatment apparatus will be described more specifically using the first to third embodiments.

(First Embodiment)
FIG. 1 is a diagram schematically showing a configuration of a gas treatment apparatus according to the first embodiment. FIG. 1A shows a case where a heat pump is used in which the flow of the refrigerant and the absorbing liquid in the heat pump is countercurrent in the absorber and the flow of the refrigerant and the absorbing liquid in the heat pump is parallel in the regenerator. On the contrary, in 1B, a heat pump is used in which the flow of the refrigerant and the absorbing liquid in the heat pump is parallel in the absorber and the flow of the refrigerant and the absorbing liquid in the heat pump is in the countercurrent in the regenerator. Show the case.

The gas treatment devices S1a and S1b according to the first embodiment include one absorber 10 and one regenerator 21, and the one regenerator 21 includes one tank. In the gas treatment devices S1a and S1b according to the first embodiment, first, the gas treatment device S1a using the heat pump HPa shown in FIG. 1A will be described, and then the gas treatment device using the heat pump HPb shown in FIG. 1B will be described. S1b will be described.

This gas treatment device S1a includes, for example, an absorber 10, a regenerator 21, a first flow path 31, a second flow path 32, and a parallel flow heat pump HPa, as shown in FIG. 1A.

The first flow path 31 is a member that extracts the treatment liquid from the absorber 10 and introduces it into the regenerator 21, and the second flow path 32 is a member that extracts the treatment liquid from the regenerator 21 and returns it to the absorber 10. be. The first and second flow paths 31 and 32 form a circulation path for circulating the treatment liquid between the absorber 10 and the regenerator 21. In the present embodiment, the heat exchanger 44 that exchanges heat between the treatment liquid from the absorber 10 to the regenerator 21 and the treatment liquid from the regenerator 21 to the absorber 10 is on the first flow path and the second. It is provided on the flow path. The heat exchanger 44 is configured to include, for example, a plate heat exchanger or a microchannel heat exchanger. This can improve energy efficiency. The heat exchanger 44 may be omitted.

The absorber 10 is a device that brings the gas to be treated and the treatment liquid into contact with each other, and in the first embodiment, the absorber 10 is provided with a container of a tower for accommodating the gas to be treated and the treatment liquid. The gas to be treated is a gas containing an acidic compound that produces an acid when dissolved in water, and is, for example, combustion exhaust gas. The treatment liquid is a liquid that undergoes phase separation in a liquid phase by absorbing an acidic compound, and absorbs and separates the acidic compound according to predetermined conditions. By bringing the gas to be treated into contact with the treatment liquid, the absorber 10 absorbs the acidic compound in the gas to be treated into the treatment liquid, discharges the gas from which the acidic compound has been removed (treatment gas), and discharges the acidic compound. Store the absorbed treatment liquid. Such an absorber 10 may be a device that allows the gas to be treated and the treatment liquid to be continuously brought into contact with each other. A device that allows the treatment liquid to flow down through a filler arranged in the path, a gas to be treated and a treatment liquid are introduced into a large number of fine flow paths, respectively, to form a fine flow path of the treatment gas and a fine flow path of the treatment liquid. Can be used such as those that merge with each other. The absorption of the acidic compound into the treatment liquid in the absorber 10 causes an exothermic reaction. When the acidic compound is carbon dioxide, the calorific value per ton of carbon dioxide absorbed is about 1.8 GJ. The heat of reaction generated in the absorber 10 raises the temperature of the gas to be treated and the treatment liquid.

The absorber 10 includes a gas supply path 12 for supplying the gas to be processed, a gas discharge path 13 for discharging the processed gas after processing, a first flow path 31 for sending the processing liquid to the regenerator 21, and a regeneration device. A second flow path 32 for returning the processing liquid from the vessel 21 to the absorber 10 is connected. The gas supply path 12 is connected to the lower part of the absorber 10, and the gas discharge path 13 is connected to the upper end of the absorber 10. The first flow path 31 is connected to the lower end portion or the vicinity of the lower end portion of the absorber 10. That is, the first flow path 31 is connected to a position where the processing liquid accumulated in the absorber 10 can be taken out. The first flow path 31 is provided with a pump 42 that sends out the processing liquid at a predetermined pressure and a control valve 43 that adjusts the flow rate of the processing liquid. In the example shown in FIG. 1A, the pump 42 and the control valve 43 are arranged between the absorber 10 and the heat exchanger 44. The pump 42 is, for example, a pump having a vane-shaped rotor (centrifugal pump, axial flow pump, etc.), a gear pump, a screw pump, a reciprocating pump, or the like. The second flow path 32 is connected to the upper part of the absorber 10. That is, the second flow path 32 is connected to a position where the processing liquid refluxed from the regenerator 21 can flow down from above. A cooler 41 for cooling the processing liquid is arranged in the second flow path 32. In the example shown in FIG. 1A, the cooler 41 is arranged between the absorber 10 and the heat exchanger 44.

Here, the lower end is the bottom of the container, the upper end is the ceiling of the container, the vicinity of the lower end is the wall near the bottom of the container, and the vicinity of the upper end is the vicinity of the ceiling of the container. Wall.

The regenerator 21 is a device that heats the treatment liquid in contact with the gas to be treated by the absorber 10 to separate the acidic compound, and in the first embodiment, the regenerator 21 includes a container of a tank for accommodating the treatment liquid and the acidic compound. It is composed of. In this document, the term "tank" means that the ratio of the height to the diameter of the tank is less than 3.5 when the shape of the horizontal cross section of the tank is circular ((tank height) / (tank diameter) <3.5). ), When the shape of the horizontal cross section of the tank is elliptical or polygonal, a circle with the same horizontal cross section area (equivalent circle) is obtained, and the diameter of the obtained equivalent circle (converted diameter) is the same as the tank diameter. ((Tank height) / (Conversion diameter) <3.5). The same applies to the following. According to this definition, in one example, a hollow cylindrical container with a diameter of 1 m and a height of 3 m corresponds to the tank in this document, while a hollow cylindrical container with a diameter of 1 m and a height of 4 m corresponds to the tank in this document. It does not correspond to the tank in this book, but corresponds to the tower. The tank is, for example, a hollow box having a horizontal cross-sectional shape of a circle, an ellipse, a polygon, or the like. For example, a hollow cylindrical container with a bottomed lid or a hollow rectangular parallelepiped shape with a bottomed lid. Container etc. The regenerator 21 stores the treatment liquid from the absorber 10 and heats the stored treatment liquid to desorb the acidic compound. The desorption of the acidic compound from the treatment liquid in the regenerator 21 causes an endothermic reaction. When the treatment liquid is heated in the regenerator 21, not only the acidic compound is eliminated but also the water in the treatment liquid evaporates.

The first flow path 31 and the second flow path 32 are connected to the regenerator 21. The first flow path 31 is connected to the upper part of the regenerator 21, and introduces the processing liquid derived from the absorber 10 into the regenerator 21. The second flow path 32 is connected to the lower end portion or the vicinity of the lower end portion of the regenerator 21 to lead out the processing liquid stored in the regenerator 21. The second flow path 32 is provided with a pump 46 that sends out the processing liquid at a predetermined pressure and a control valve 45 that adjusts the flow rate of the processing liquid. In the example shown in FIG. 1A, a pump 46 and a control valve 45 are arranged between the regenerator 21 and the heat exchanger 44.

The regenerator 21 is provided with a supply unit 50 and a heat source 57.

The supply unit 50 is a device that supplies the acidic compound obtained in the regenerator 21 to the supply destination. The supply unit 50 includes, for example, a first supply path 51, a condenser (capacitor) 52, a storage container 53, a second supply path 54, and a third supply path 55. One of the first supply passages 51 is connected to the upper end of the regenerator 21, and the other is connected to the upper part of the storage container 53. The gas is sent from the regenerator 21 to the storage container 53. A condenser 52 is provided in the first supply path 51, and the condenser 52 condenses water vapor by cooling the mixed gas and separates the water vapor from the mixed gas as water. As the condenser 52, a heat exchanger using inexpensive cooling water such as river water can be used. The storage container 53 stores the gas and water of the acidic compound. The second supply path 54 is connected to the upper end of the storage container 53 and sends the gas of the acidic compound to the supply destination. One of the third supply passages 55 is connected to the lower end of the storage container 53, and the other is connected to the upper part of the regenerator 21 to return the water stored in the storage container 53 to the regenerator 21.

The heat source 57 is a device that heats the regenerator 21 and is an independent device separate from the heat pump HPa. The heat source 57 can be used in various forms as long as the processing liquid in the regenerator 21 can be heated. For example, the heat source 57 is connected to the lower part of the regenerator 21, and has a heating circulation path in which the treatment liquid is taken out from the regenerator 21 and introduced into the regenerator 21 again, and a heater provided in the heating circulation path. Is configured with. The heater is, for example, a device that heats with electricity, steam, a burner, or the like. Alternatively, for example, the heat source 57 is provided inside the regenerator 21 and includes a heater that directly heats the treatment liquid.

The heat pump HPa is a device that transfers heat between the absorber 10 and the regenerator 21. In the example shown in FIG. 1A, in the heat pump HPa, the flow of the refrigerant and the absorbing liquid in the heat pump is countercurrent in the absorber 10, and the flow of the refrigerant and the absorbing liquid in the heat pump is parallel in the regenerator 21. .. Then, this heat pump HPa heats the processing liquid by allowing a refrigerant to flow in parallel with the treatment liquid introduced into the regenerator 21 and in contact with the gas to be processed by the absorber 10. The parallel flow heat pump is a device in which two fluids for heat exchange flow in the same direction based on the flow of the absorbed liquid. Therefore, in the regenerator 21 of the heat pump HPa, the treatment liquid and the refrigerant are used during heat exchange. Flows basically in the same direction. Such a heat pump HPa includes, for example, an evaporator 60, an outward flow path 61, a compressor 62, a condenser 63, a return path passage 64, and an expander 65. One of the outward flow paths 61 is connected to the upper part of the absorber 10, is connected to the other of the evaporator 60 disposed in the absorber 10, and the other is connected to the upper part of the regenerator 21. It is connected to one of the condensers 63 arranged in 21. One of the return flow paths 64 is connected to the lower part of the evaporator 21, is connected to the other of the condenser 63 disposed in the evaporator 21, and the other is connected to the lower part of the evaporator 10. It is connected to one of the evaporators 60 arranged in 10. Therefore, the evaporator 60, the outward flow path 61, the condenser 63, and the return path flow path 64 are sequentially connected in this order, and the return path flow path 64 is connected to the evaporator 60 to form a closed loop circulation path. It is formed and the refrigerant in this circulation path is sealed. The compressor 62 is provided in the outward flow path 61, and the inflator 65 is provided in the return path passage 64. The evaporator 60 is configured to include, for example, one or more heat transfer tubes and is arranged in the absorber 10. In the absorber 10, an exothermic reaction occurs as described above. The liquid refrigerant flowing in the evaporator 60 is heated by this heat and evaporates. The gaseous refrigerant is compressed by the compressor 62 and flows into the condenser 63 via the outward flow path 61. The condenser 63 is configured to include, for example, one or a plurality of heat transfer tubes that allow the refrigerant to flow in parallel with the processing liquid that is introduced into the regenerator 21 and is in contact with the gas to be processed by the absorber 10. Be placed. In the regenerator 21, an endothermic reaction occurs as described above. The gaseous refrigerant flowing in the condenser 63 is condensed by this endothermic reaction. The condensed liquid refrigerant expands by the expander 65 and returns to the evaporator 60 via the return flow path 64. In this way, the reaction heat of the absorber 10 is heat-transported to the regenerator 21 by the circulation of the refrigerant.

Here, the heat transfer rate of heat exchange depends on the heat transfer area. In the first embodiment, since the absorber 10 is configured to include the container of the tower, the heat transfer tube arranged in the absorber 10 of the tower is restricted by the diameter of the tower, and therefore the heat transfer area is also the tower. Constrained by diameter. On the other hand, since the regenerator 21 is configured to include the container of the tank, it is released from the restriction of the heat transfer area due to the tower diameter, and at least one of the width and the depth is extended without increasing the height of the regenerator 21. Therefore, it becomes easy to secure a sufficient heat transfer area. As a result, the amount of heat exchange of the heat pump can be improved.

Next, the gas processing device S1b using the heat pump HPb will be described. As shown in FIG. 1B, the gas treatment device S1b has the same residual configuration as the gas treatment device S1a shown in FIG. 1A, except that the heat pump HPb is used instead of the heat pump HPa in the gas treatment device S1a shown in FIG. 1A. The same is true. Hereinafter, only the difference heat pump HPb will be described, and the description of the remaining configuration will be omitted.

The heat pump HPb is a device that transfers heat between the absorber 10 and the regenerator 21. In the example shown in FIG. 1B, in the heat pump HPb, the flow of the refrigerant and the absorbing liquid in the heat pump is parallel in the absorber 10, and the flow of the refrigerant and the absorbing liquid in the heat pump is countercurrent in the regenerator 21. .. Then, the heat pump HPb heats the treatment liquid by directing a refrigerant to the treatment liquid introduced into the regenerator 21 and in contact with the gas to be treated by the absorber 10. The countercurrent heat pump is a device in which two fluids that exchange heat flow in directions facing each other based on the flow of the absorbed liquid. Therefore, in the regenerator 21 of the heat pump HPb, the processing liquid and the refrigerant are used during heat exchange. And basically flow in opposite directions. Such a heat pump HPb includes, for example, an evaporator 66, a return path 67, an expander 68, a condenser 69, an outward flow path 70, and a compressor 71. One of the outward flow paths 70 is connected to the lower part of the absorber 10, is connected to the other of the evaporator 66 disposed in the absorber 10, and the other is connected to the lower part of the regenerator 21. It is connected to one of the condensers 69 arranged in 21. One of the return flow paths 67 is connected to the upper part of the evaporator 21, is connected to the other of the condenser 69 disposed in the evaporator 21, and the other is connected to the upper part of the evaporator 10. It is connected to one of the evaporators 66 arranged in 10. Therefore, the evaporator 66, the outward flow path 70, the condenser 69, and the return path flow path 67 are sequentially connected in this order, and the return path flow path 67 is connected to the evaporator 66 to form a closed loop circulation path. It is formed and the refrigerant in this circulation path is sealed. The compressor 71 is provided in the outward flow path 70, and the inflator 68 is provided in the return path flow path 67. The evaporator 66 is configured to include, for example, one or more heat transfer tubes and is arranged in the absorber 10. In the absorber 10, an exothermic reaction occurs as described above. The liquid refrigerant flowing in the evaporator 66 is heated by this heat and evaporates. The gaseous refrigerant is compressed by the compressor 71 and flows into the condenser 69 via the outward flow path 70. The condenser 69 is configured to include, for example, one or a plurality of heat transfer tubes for directing the refrigerant to the processing liquid in contact with the gas to be processed by the absorber 10 introduced into the regenerator 21. Be placed. In the regenerator 21, an endothermic reaction occurs as described above. The gaseous refrigerant flowing in the condenser 69 is condensed by this endothermic reaction. The condensed liquid refrigerant expands by the expander 68 and returns to the evaporator 66 via the return flow path 67. In this way, the reaction heat of the absorber 10 is heat-transported to the regenerator 21 by the circulation of the refrigerant.

Next, the acidic oxides and the treatment liquid in these gas treatment devices S1a and S1b will be described.

The acidic compound is not particularly limited as long as the aqueous solution becomes acidic. For example, hydrogen chloride, carbon dioxide, sulfur dioxide, carbon disulfide and the like can be mentioned.

The treatment liquid (absorbent) is an absorbent that can reversibly absorb and desorb acidic compounds. The treatment liquid is, for example, an alkaline absorbent containing water, an amine compound and an organic solvent. It is desirable that the amine compound is 30 wt%, the organic solvent is 60 wt%, and the water is 10 wt%.

Amine compounds include, for example, 1,3-diaminopropane (DAP: solubility parameter = 14.6 (cal / cm ³ ) ^1/2 ), 2-aminoethanol (MEA: solubility parameter = 14.3 (cal / cm ³ )). ^1/2 ), DL-2-amino-1-propanol (AP: solubility parameter = 13.3 (cal / cm ³ ) ^1/2 ), 2- (2-aminoethoxy) ethanol (AEE: solubility parameter = 12) .7 (cal / cm ³ ) ^1/2 ), (R) -4-amino-2-methyl-1-butanol (AMB) and other primary amines such as 2 (methylamino) ethanol (MAE), 2- Secondary amines such as (ethylamino) ethanol (EAE), 2- (butylamino) ethanol (BAE), such as triethanolamine (TEA), N-methyldiethanolamine (MDEA), tetramethylethylenediamine (TEMED), pentamethyl Examples thereof include tertiary amines such as diethylenetriamine (PMDETA), hexamethyltriethylenetetramine, and bis (2-dimethylaminoethyl) ether.

Organic solvents include, for example, 1-butanol (solubility parameter = 11.3 (cal / cm ³ ) ^1/2 ), 1-pentanol (solubility parameter = 11.0 (cal / cm ³ ) ^1/2 ), octanol. , Diethylene glycol diethyl ether (DEGDEE), diethylene glycol dimethyl ether (DEGDME) and the like, and a plurality of types may be mixed and used.

It is preferable that the solubility parameters of the amine compound and the organic solvent are within a predetermined range. The solubility parameter is represented by the following formula 1.
Equation 1; δ = ((ΔH-RT) / V) ^1/2
Here, ΔH is the molar heat of vaporization, R is the gas constant, T is the absolute temperature, and V is the molar volume. From Formula 1, the solubility parameters of the amine compounds EAE and MAE and the organic solvent DEGDME are calculated to be 10.94, 11.58 and 7.75, respectively.

As shown in Table 1, in the absorbent containing water, an amine compound and an organic solvent, the value obtained by subtracting the solubility parameter of the organic solvent from the solubility parameter of the amine compound is 1.1 (cal / cm ³ ) ^1/2 or more 4 ^{By selecting the combination of the amine compound and the organic solvent so that the content is 1/2} (cal / cm ³ ) or less, the phase having a high content of the acidic compound due to the absorption of the acidic compound and the content of the acidic compound can be increased. Two phases are separated into a lower phase. If the solubility parameter is less than the lower limit, the treatment liquid may not separate into two phases even if it absorbs the acidic compound. On the other hand, when the solubility parameter exceeds the upper limit value, the treatment liquid and the treatment gas are separated into two phases before the treatment liquid absorbs the acidic compound, and the treatment liquid is brought into contact with the treatment gas containing the acidic compound. The contact state with the gas may become non-uniform, and the absorption efficiency may decrease. In Table 1, "good" means that the phase was a single liquid phase before the absorption of carbon dioxide and was separated into two liquid phases by the absorption of carbon dioxide. "Miscible" means that a single liquid phase was not formed in the two liquid phase state before the absorption of carbon dioxide. "Not separated" means that it was a single liquid phase even after the absorption of carbon dioxide.

In the gas treatment devices S1a and S1b according to the first embodiment, first, the gas to be treated and the treatment liquid are brought into contact with each other in the absorber 10 (absorption step). More specifically, the absorber 10 is supplied with a gas to be treated such as a process gas containing at least carbon dioxide through the gas supply path 12. The absorbent liquid is introduced into the absorber 10 through the second flow path 32. The absorbing liquid flows down in the absorber 10 and comes into contact with carbon dioxide contained in the gas to be treated to absorb the carbon dioxide. A treatment liquid that has absorbed carbon dioxide is stored in the absorber 10. The treatment liquid in contact with carbon dioxide undergoes phase separation into a first phase portion having a high carbon dioxide content and a second phase portion having a low carbon dioxide separation content. The treatment liquid in contact with carbon dioxide is led out from the absorber 10 to the first flow path 31, the pressure is adjusted by the pump 42, the flow rate is adjusted by the control valve 43, and the liquid is introduced into the regenerator 21. The absorption causes an exothermic reaction, and the liquid refrigerant flowing in the evaporators 60 and 66 is heated by this heat and evaporated. The gaseous refrigerant is compressed by the compressors 62 and 71 and flows into the condensers 63 and 69 via the outward flow paths 61 and 70.

Next, carbon dioxide is separated from the treatment liquid by heating the treatment liquid in the regenerator 21 (regeneration step). More specifically, in the regenerator 21, the treatment liquid is heated while flowing down, and carbon dioxide is separated from the treatment liquid. When the treatment liquid is heated, water vapor evaporated from the treatment liquid may be obtained. Carbon dioxide and water vapor separated from the treatment liquid flow through the supply unit 50. In the supply unit 50, the water vapor is condensed by the condenser 52 and returned to the regenerator 21 via the storage container 53 and the third supply passage 55. In the separation, an endothermic reaction occurs, and the gaseous refrigerant flowing in the condensers 63 and 69 is condensed by this endothermic reaction. The condensed liquid refrigerant is depressurized by the expanders 65 and 68 and returned to the evaporators 60 and 66 via the return paths 64 and 67.

As described above, the gas treatment devices S1a and S1b according to the first embodiment include at least one tank of at least one of the absorber 10 and the regenerator 21. In the above example, the regenerator 21 includes one tank. Since the tank is not restricted by the tower diameter, the gas treatment devices S1a and S1b can increase the area (contact area) of the interface and can interact efficiently.

Since the gas treatment devices S1a and S1b are provided with heat pumps HPa and HPb, energy saving can be achieved and energy input to the regenerator 21 from the outside for regeneration can be reduced.

In heat pumps, in general, the smaller the temperature difference between heat exchanges, the better (higher) the exchange efficiency. In the gas treatment devices S1a and S1b, the heat recovery efficiency in the heat pump can be improved by selecting parallel flow or countercurrent flow according to the temperature distributions of the absorber 10 and the regenerator 21 in which the heat pump is arranged.

Since the gas treatment devices S1a and S1b include an independent heat source 57, the heat of the independent heat source 57 can be supplied to the regenerator 21 in addition to the heat of the heat pumps HPa and HPb. In particular, when the heat of the heat pumps HPa and HPb is insufficient for regeneration, the shortage can be supplemented by the independent heat source 57.

The gas treatment devices S1a and S1b according to the first embodiment described above include an absorber 10 including a tower and a regenerator 21 including a tank. It may be configured with.

Next, another embodiment will be described.

(Second Embodiment)
FIG. 2 is a diagram schematically showing the configuration of the gas treatment apparatus according to the second embodiment. In FIG. 2A, the absorber is countercurrent to the flow of the absorbent (that is, the flow of the refrigerant and the absorbent in the heat pump is countercurrent) and the regenerator is parallel to the flow of the absorbent (ie). , The flow of the refrigerant and the absorbing liquid in the heat pump is parallel), and FIG. 2B shows the case where the flow of the refrigerant and the absorbing liquid in the heat pump is parallel in the absorber. The case where a heat pump is used in which the flow of the refrigerant and the absorbing liquid in the heat pump is countercurrent in the regenerator due to the flow is shown.

The gas treatment devices S1a and S1b according to the first embodiment include a regenerator 21 including a tank, while the gas treatment devices S2a and S2b according to the second embodiment include an absorber 10 including a tower. A regenerator 21 is provided, and an absorber 11 including a tank is provided. That is, the gas treatment devices S2a and S2b according to the second embodiment include one absorber 11 and one regenerator 21, and the one absorber 11 includes one tank, and the first one. The regenerator 21 includes one tank. The gas treatment device S2a in the second embodiment includes a heat pump HPa, and the gas treatment device S2b in the second embodiment includes a heat pump HPb.

As shown in FIGS. 2A and 2B, the gas treatment devices S2a and S2b in the second embodiment replace the absorber 10 including the tower in the gas treatment devices S1a and S1b shown in FIGS. 1A and 1B, respectively. The remaining configuration is the same as that of the gas treatment devices S1a and S1b shown in FIGS. 1A and 1B, except that the absorber 11 including the tank is used. Hereinafter, only the difference absorber 11 will be described, and the description of the remaining configuration will be omitted.

Similar to the first embodiment, the absorber 11 is a device for bringing the gas to be treated and the treatment liquid into contact with each other, and in the second embodiment, the absorber 11 is provided with a container of a tank for accommodating the gas to be treated and the treatment liquid. Will be done. Similar to the tank of the regenerator 21, the tank is, for example, a hollow box having a horizontal cross section of a circular shape, an elliptical shape, a polygonal shape, or the like, and in one example, a hollow rectangular parallelepiped shape container. The absorber 11 brings the gas to be treated into contact with the treatment liquid to absorb the acidic compound in the gas to be treated into the treatment liquid, discharges the treatment gas from which the acidic compound has been removed, and absorbs the acidic compound. Store the liquid. As with the absorber 10 of the first embodiment, such an absorber 11 may be any device that can continuously bring the gas to be treated and the treatment liquid into contact with each other. The heat of reaction generated in the absorber 11 raises the temperature of the gas to be treated and the treatment liquid.

The gas supply path 12, the gas discharge path 13, and the first and second flow paths 31 and 32 are connected to the absorber 11. The gas supply path 12 is connected to the lower part of the absorber 11, and the gas discharge path 13 is connected to the upper end of the absorber 11. The first flow path 31 is connected to the lower end portion or the vicinity of the lower end portion of the absorber 11. That is, the first flow path 31 is connected to a position where the processing liquid accumulated in the absorber 11 can be taken out. The second flow path 32 is connected to the upper part of the absorber 11. That is, the second flow path 32 is connected to a position where the processing liquid refluxed from the regenerator 21 can flow down from above.

The gas treatment devices S2a and S2b in the second embodiment have the same effects as those of the gas treatment devices S1a and S1b in the first embodiment.

Next, another embodiment will be described.

(Third Embodiment)
FIG. 3 is a diagram schematically showing the configuration of the gas treatment apparatus according to the third embodiment. FIG. 3A shows a case where a plurality of heat pumps that transfer heat one-to-one between a plurality of absorbers and a plurality of regenerators are used, and FIG. 3B shows a case where the plurality of absorbers and the plurality of regenerators are used, respectively. The case where a heat pump for transferring heat is used is shown. 3A and 3B show the case where a heat pump is used in which the absorber is countercurrent to the flow of the absorbent and the regenerator is parallel to the flow of the absorbent.

The gas treatment devices S1a, S1b; S2a, S2b according to the first and second embodiments are configured to include one absorbers 10 and 11, one regenerator 21, and one heat pump HPa, HPb. However, the gas treatment devices S3a and S3c according to the third embodiment are configured to include a plurality of absorbers 10 and 11 and a plurality of regenerators 21. The gas treatment device S3a is configured to include a plurality of heat pumps that transfer heat one-to-one between the plurality of absorbers 10 and 11 and the plurality of regenerators 21. On the other hand, the gas treatment device S3c is configured to include a heat pump for transferring heat between the absorber set including the plurality of absorbers 10 and 11 and the regenerator set including the plurality of regenerators 21. In the gas treatment devices S3a and S3c according to the third embodiment, first, the gas treatment device S3a using a one-to-one heat pump will be described, and then the gas treatment device S3c using the heat pump in the set will be described. explain. In the following description, an example in which two absorbers 11 (11-1, 11-2) are configured in two stages and two regenerators 21 (21-1, 21-2) are configured in two stages. However, the present invention is not limited to this, and the gas treatment devices S3a and S3c according to the third embodiment have a plurality of absorbers 11 having three or more (for example, three or four). The regenerator 21 of the above may be three or more (for example, three or four, etc.) and may be composed of three or more stages (for example, three or four stages, etc.).

As shown in FIG. 3A, the gas treatment device S3a according to the third embodiment is the gas treatment device S2a shown in FIG. 2A, instead of one absorber 11, two first and second absorbers 11-. The point of using 1, 11-2, the point of using two first and second regenerators 21-1 and 21-2 instead of one regenerator 21, and the point of using one heat pump HPa, 2 The remaining configuration is the same as that of the gas treatment apparatus S2a shown in FIG. 2A, except that the first and second heat pumps HPa-1 and HPa-2 are used. Hereinafter, only these above-mentioned differences will be described, and the description of the remaining configuration will be omitted.

The two first and second absorbers 11-1 and 11-2 are devices for bringing the gas to be treated and the treatment liquid into contact with each other, respectively, as in the second embodiment, and the gas to be treated and the treatment liquid are contacted with each other. Consists of a tank container for accommodating and. Then, in the third embodiment, the two first and second absorbers 11-1 and 11-2 are composed of two stages, and therefore, the gas treatment device S3a is configured with these two first and second absorbers. The first and second absorption side communication passages (absorption side communication paths) 14 and 15 that communicate (communicate) between the second absorbers 11-1 and 11-2 are provided.

The gas discharge passage 13, the second flow path 32, and the first and second absorption side communication passages 14 and 15 are connected to the first absorber 11-1. The gas discharge path 13 is connected to the upper end of the first absorber 11-1, and the second flow path 32 is connected to the upper part of the first absorber 11-1. The first absorption side communication passage 14 is connected to the lower end portion of the first absorber 11-1, and the second absorption side communication passage 15 is connected to the lower portion of the first absorber 11-1.

The gas supply passage 12, the first flow path 31, and the first and second absorption side communication passages 14 and 15 are connected to the second absorber 11-2. The gas supply path 12 is connected to the lower portion of the second absorber 11-2, and the first flow path 31 is connected to the lower end portion or the vicinity of the lower end portion of the second absorber 11-2. The first absorption side communication passage 14 is connected to the upper part of the second absorber 11-2, and the second absorption side communication passage 15 is connected to the upper end portion of the absorber 11-2 on the upstream side.

The two first and second regenerators 21-1 and 21-2 are devices for separating acidic compounds by heating the treatment liquid in contact with the gas to be treated on the absorption side, respectively, as in the second embodiment. It is configured to include a container of a tank for accommodating the treatment liquid and the acidic compound. Then, in the third embodiment, the two first and second regenerators 21-1 and 21-2 are composed of two stages, and therefore, the gas processing device S3a is the two regenerators 21. The first and second regenerative side communication passages (regeneration side communication paths) 22 and 23 that communicate (communicate) between -1 and 21-2 are provided.

The first flow path 31 and the first and second regeneration side communication passages 22 and 23 are connected to the first regenerator 21-1, and the supply unit 50 and the heat source 57-1 similar to the heat source 57 are connected. , Attached. The first flow path 31 is connected to the upper part of the first regenerator 21-1. The first regeneration side communication passage 22 is connected to the lower portion of the first regeneration device 21-1, and the second regeneration side communication passage 23 is connected to the lower end portion of the first regeneration device 21-1. The first supply path 51 of the supply unit 50 is connected to the upper end of the first regenerator 21-1, and the third supply path 55 of the supply unit 50 is connected to the upper part of the first regenerator 21-1.

The second regenerator 21-2 is connected to the second flow path 32 and the first and second regeneration side communication passages 22 and 23, and is provided with a heat source 57-2 similar to the heat source 57. The second flow path 32 is connected to the lower end portion or the vicinity of the lower end portion of the second regenerator 21-2. The first regeneration side communication passage 22 is connected to the upper end portion of the second regeneration device 21-1, and the second regeneration side communication passage 23 is connected to the upper portion of the second regeneration device 21-2.

Here, in the example shown in FIG. 3, in order to more efficiently separate the acidic compounds in the treatment liquid, the first flow path 31 is more specifically divided into two on the downstream side of the heat exchanger 44. It is branched to include a first A flow path 31-1 and a first B flow path 31-2, the first A flow path 31-1 is connected to the upper part of the first regenerator 21-1, and the first B flow path 31-2 is connected. It is connected to the upper part of the second regenerator 21-2. In order to adjust the flow rate (including the case where the flow rate is 0), the first A flow path 31-1 is provided with a control valve 47-1, and the first B flow path 31-2 is provided with a control valve 47.2. Is provided. The first flow path 31 may be connected only to the first regenerator 21-1 without branching.

The second absorber 11-2 includes the gas to be processed supplied from the gas supply path 12, the second flow path 32 from the second regenerator 21-2, the first absorber 11-1, and the first absorption side continuous passage. By contacting with the treatment liquid (middle stage liquid on the absorption side) introduced via 14, the acidic compound in the gas to be treated is absorbed by the treatment liquid for treatment. The gas after this treatment (middle stage gas on the absorption side) is supplied to the first absorber 11-1 via the second absorption side communication passage 15. The treated liquid after the treatment is stored in the second absorber 11-2, is taken out in the first flow path 31, and is led out to the regeneration side in the first flow path 31. More specifically, in the example shown in FIG. 3, the treated liquid after the treatment is supplied to the first regenerator 21-1 via the first A flow path 31-1 and is supplied to the first regenerator 21-1 via the first B flow path 31-2. It is supplied to the second regenerator 21-2.

The first absorber 11-1 is introduced from the second regenerator 21-2 via the second flow path 32 and the gas to be processed (middle stage gas on the absorption side) supplied from the second absorption side communication passage 15. By contacting with the treatment liquid to be treated, the acidic compound in the gas to be treated is absorbed by the treatment liquid for treatment. The treated gas (treated gas) is discharged from the gas discharge path 13. The treated liquid (middle stage liquid on the absorption side) after the treatment is stored in the first absorber 11-1 and is taken out in the first absorption side communication passage 14, and is taken out through the first absorption side communication passage 14. It is supplied to the second absorber 11-2.

The first and second absorbers 11-1 and 11-2 may be devices that can continuously bring the gas to be treated and the treatment liquid into contact with each other, as in the case of the absorber 11 of the second embodiment, respectively. do not have. The heat of reaction generated in each of the first and second absorbers 11-1 and 11-2 raises the temperature of the gas to be treated and the treatment liquid in each of the first and second absorbers 11-1 and 11-2, respectively. Let me.

In this way, the gas treatment apparatus S3a brings the gas to be treated supplied from the gas supply path 12 into contact with the treatment liquid in two stages in each of the second absorber 11-2 and the first absorber 11-1, and is subject to treatment. The acidic compound in the treatment gas is reliably absorbed by the treatment liquid, and the acidic compound is more reliably removed from the gas to be treated. From the viewpoint of the gas to be treated, it is processed by the second absorber 11-2, processed by the first absorber 11-1, the second absorber 11-2 is on the upstream side, and the first absorber 11-1. Is on the downstream side. On the other hand, from the viewpoint of the treatment liquid, it is processed by the first absorber 11-1 and the second absorber 11-2, the first absorber 11-1 is on the upstream side, and the second absorber 11- 2 is the downstream side.

The first regenerator 21-1 stores the treatment liquid introduced from the absorption side via the first A flow path 31-1 and heats and treats the stored treatment liquid. The acidic compound desorbed by this treatment is supplied to the supply destination via the supply unit 50. The treated liquid (middle stage liquid on the regeneration side) after the treatment is stored in the first regenerator 21-1, is taken out in the second regeneration side communication passage 23, and is taken out through the second regeneration side communication passage 23. It is supplied to the second regenerator 21-2.

The second regenerator 21-2 is a treatment liquid introduced from the absorption side via the first B flow path 31-2 and a process introduced from the first regenerator 21-1 via the second regeneration side continuous passage 23. The liquid (middle stage liquid on the regeneration side) is stored, and the stored treatment liquid is heated for treatment. The acidic compound desorbed by this treatment (gaseous acidic compound (middle stage gas on the regeneration side)) is supplied to the first regenerator 21-1 via the first regeneration side communication passage 22. The treated liquid after the treatment is stored in the second regenerator 21-2, is taken out in the second flow path 32, and is supplied to the first absorber 11-1 via the second flow path 31.

In this way, the gas treatment apparatus S3a heats the treatment liquid treated on the absorption side and supplied from the absorption side in the first regenerator 21-1 and the second regenerator 21-2, respectively, and removes the acidic compound from the treatment liquid. Detach more efficiently. The treatment liquid heated by the first regenerator 21-1 is reheated by the second regenerator 21-2 to more reliably remove the acidic compound from the treatment liquid. From the viewpoint of the treatment liquid, the first regenerator 21-1 is processed, the second regenerator 21-2 is processed, the first regenerator 21-1 is on the upstream side, and the second regenerator 21-2 is. It will be on the downstream side.

The first and second heat pumps HPa-1 and HPa-2 transfer heat one-to-one between a plurality of absorbers 11 and a plurality of regenerators 21. In the example shown in FIG. 3A, the first heat pump HPa-1 transfers heat one-to-one between the first absorber 11-1 and the first regenerator 21-1, and the second heat pump HPa-2 is the second heat pump HPa-2. 2 Heat is transferred between the absorber 11-2 and the second regenerator 21-2 on a one-to-one basis. The first heat pump HPa-1 includes a first evaporator 60-1, a first outward flow path 61-1, a first compressor 62-1, a first condenser 63-1 and a first return flow path. It includes a 64-1 and a first expander 65-1. In these first heat pump HPa-1, the first evaporator 60-1, the first outward flow path 61-1, the first compressor 62-1, the first condenser 63-1, the first return flow path 64-1 and The first inflator 65-1 is the same as the evaporator 60, the outbound flow path 61, the compressor 62, the condenser 63, the inbound flow path 64, and the inflator 65 in the heat pump HPa of the first embodiment, respectively. The description will be omitted. The second heat pump HPa-2 includes a second evaporator 60-2, a second outward flow path 61-2, a second compressor 62-2, a second condenser 63-2, and a second return flow path. It includes 64-2 and a second expander 65-2. The second evaporator 60-2, the second outward flow path 61-2, the second compressor 62-2, the second condenser 63-2, the second return flow path 64-2, and the second heat pump HPa-2. The second expander 65-2 is the same as the evaporator 60, the outward flow path 61, the compressor 62, the condenser 63, the return path flow path 64, and the expander 65 in the heat pump HPa of the first embodiment, respectively. The description will be omitted.

Next, the gas treatment device S3c according to the third embodiment will be described. As shown in FIG. 3B, the gas processing apparatus S3c is the remainder except that the gas processing apparatus S3a shown in FIG. 3A uses the heat pump HPc instead of the first and second heat pumps HPa-1 and HPa-2. The configuration is the same as that of the gas treatment apparatus S3a shown in FIG. 3A. Hereinafter, only the difference heat pump HPc will be described, and the description of the remaining configuration will be omitted.

This heat pump HPc transfers heat between an absorber set composed of a plurality of absorbers 11 and a regenerator set composed of a plurality of regenerators 21. In the example shown in FIG. 3B, the heat pump HPc is an absorber set consisting of the first and second absorbers 11-1 and 11-2 and a regenerator set consisting of the first and second regenerators 21-1 and 21-2. Transfer heat to and from. As shown in FIG. 3B, for example, the heat pump HPc is countercurrent to the flow of the absorbent liquid in the absorbers 11-1 and 11-2, and is directed to the flow of the absorbent liquid in the regenerators 21-1 and 21-2. On the other hand, it is a parallel flow, and the first A and the first B outbound flow paths 72-1 and 72-2, the outbound merging device 73, the second outbound flow path 74, the compressor 75, the outbound shunt 76, and the first 3A and 3B outbound flow paths 77-1, 77-2, first and second control valves 78-1, 78-2, first and second condensers 79-1, 79-2, and first A. And the 1st B return flow paths 80-1, 80-2, the return path merging device 81, the 2nd return path flow path 82, the return path shunt 83, and the 3A and 3B return path flow paths 84-1 and 84-2. , The first and second expanders 85-1 and 85-2, and the first and second evaporators 86-1 and 86-2.

One of the 1A outbound flow paths 72-1 is connected to the upper part of the first absorber 11-1 and is connected to the other of the first evaporator 86-1 arranged in the first absorber 11-1. The other person is connected to the outbound merging device 73. One of the first B outbound flow paths 72-2 is connected to the upper part of the second absorber 11-2, and is connected to the other of the second evaporator 86-2 arranged in the second absorber 11-2. The other person is connected to the outbound merging device 73. One of the second outbound flow paths 74 is connected to the outbound merging device 73, the other is connected to the outbound shunt 76, and the second outbound flow path 74 is provided with a compressor 75. One of the 3A outbound flow paths 77-1 was connected to the outbound shunt 76, the other was connected to the upper part of the first regenerator 21-1, and was arranged in the first regenerator 21-1. It is connected to one of the first shunts 79-1. A first control valve 78-1 is provided in the third A outbound flow path 77-1. One of the 3B outbound flow paths 77-2 was connected to the outbound shunt 76, the other was connected to the upper part of the second regenerator 21-2, and was arranged in the second regenerator 21-2. It is connected to one of the second condensers 79-2. A second control valve 78-2 is provided in the third B outbound flow path 77-2.

One of the first A return flow paths 80-1 is connected to the lower part of the first regenerator 21-1, and is connected to the other of the first condenser 79-1 arranged in the first regenerator 21-1. The other person is connected to the return junction 81. One of the first B return flow paths 80-2 is connected to the lower part of the second regenerator 21-2, and is connected to the other of the second condenser 79-2 arranged in the second regenerator 21-2. The other person is connected to the return junction 81. One of the second return flow paths 82 is connected to the return route shunt 81, and the other is connected to the return shunt 83. One of the third A return flow paths 84-1 was connected to the return shunt 83, and the other was connected to the lower part of the first absorber 11-1, and was arranged in the first absorber 11-1. It is connected to one of the first evaporators 86-1. A first inflator 85-1 is provided in the third A return flow path 84-1. One of the 3B return flow paths 84-2 is connected to the return shunt 83, and the other is connected to the lower part of the second absorber 11-2 and is arranged in the second absorber 11-2. It is connected to one of the second evaporators 86-2. A second inflator 85-2 is provided in the third B return flow path 84-2. A refrigerant is sealed in the heat pump HPc having such a configuration.

The first evaporator 86-1 is configured to include, for example, one or a plurality of heat transfer tubes, and is arranged in the first absorber 11-1. The second evaporator 86-2 is configured to include, for example, one or more heat transfer tubes and is arranged in the second absorber 11-2. Exothermic reactions occur in the first and second absorbers 11-1 and 11-2, respectively. The liquid refrigerant flowing in the first evaporator 86-1 is heated by this heat and evaporated, and is led out to the outward merging device 73 via the first A outward flow path 72-1. The liquid refrigerant flowing in the second evaporator 86-2 is heated by this heat and evaporated, and is led out to the outward merging device 73 via the first B outward flow path 72-2. The outbound merging device 73 merges the refrigerant from the first A outbound flow path 72-1 and the refrigerant from the first B outbound flow path 72-2, and is led out to the outbound shunt 76 via the second outbound flow path 74. NS. At this time, the gaseous refrigerant is compressed by the compressor 75 provided in the second outward flow path 74. The outbound shunt 76 divides the refrigerant, one of which is led out to the first condenser 79-1 via the third A outbound flow path 77-1, and the other is led out via the third B outbound flow path 77-2. It is led out to the second condenser 79-2. The first condenser 79-1 includes, for example, one or a plurality of heat transfer tubes, which are introduced into the first regenerator 21-1 and allow the refrigerant to flow in parallel with the treatment liquid in contact with the gas to be treated on the absorption side. And placed in the first regenerator 21-1. The second condenser 79-2 includes, for example, one or a plurality of heat transfer tubes, which are introduced into the second regenerator 21-2 and allow the refrigerant to flow in parallel with the treatment liquid in contact with the gas to be treated on the absorption side. And is placed in the second regenerator 21-2. Endothermic reactions occur in the first and second regenerators 21-1 and 21-2, respectively. The gaseous refrigerant flowing in the first condenser 79-1 is condensed by this endothermic reaction and is led out to the return junction 81 via the first A return passage 80-1. The gaseous refrigerant flowing in the second condenser 79-2 is condensed by this endothermic reaction and is led out to the return junction 81 via the first B return passage 80-2. The return shunt 81 merges the refrigerant from the first A return flow path 80-1 and the refrigerant from the first B return flow path 80-2, and is led out to the return shunt 83 via the second return flow path 82. NS. The return shunt 83 divides the refrigerant, one of which is led out to the first evaporator 86-1 via the third A return shunt 84-1 and the other through the 3B return shunt 84-2. It is led out to the second evaporator 86-2. When being led out to the first evaporator 86-1, the first expander 85-1 decompresses the condensed liquid refrigerant and supplies it to the first evaporator 86-1. When being led out to the second evaporator 86-2, the second expander 85-2 decompresses the condensed liquid refrigerant and supplies it to the second evaporator 86-2.

1st evaporator 86-1, 1A outbound flow path 72-1, outbound merging device 73, 2nd outbound flow path 74, outbound shunt 76, 3A outbound flow path 77-1, 1st condenser 79-1 , 1A return path 80-1, return junction 81, 2nd return shunt 82, return shunt 83 and 3A return shunt 84-1 are connected in this order, and 3A return channel 84- By connecting 1 to the first evaporator 86-1, a closed loop-shaped circulation path is formed, and the first evaporator 86-1, the first A outbound flow path 72-1, the outbound shunt 73, and the first 2 Outward flow path 74, Outward shunt 76, 3B Outward flow path 77-2, 2nd condenser 79-2, 1B Return path flow path 80-2, Return path merging device 81, 2nd return path flow path 82, Return path The shunt 83 and the 3A return channel 84-1 are connected in this order, and the 3A return channel 84-1 is connected to the first evaporator 86-1 to form a closed loop circulation path. Will be done. Then, the second evaporator 86-2, the first B outbound flow path 72-2, the outbound merging device 73, the second outbound flow path 74, the outbound shunt 76, the third A outbound flow path 77-1, and the first condenser 79. -1, 1A return path 80-1, return merger 81, 2nd return shunt 82, return shunt 83 and 3B return flow 84-2 are connected in this order, and the 3B return flow path By connecting 84-2 to the second evaporator 86-2, a closed loop-shaped circulation path is formed, and the second evaporator 86-2, the first B outbound flow path 72-2, and the outbound shunt 73. , 2nd outbound flow path 74, outbound shunt 76, 3B outbound flow path 77-2, 2nd condenser 79-2, 1st B return path flow path 80-2, return path merging device 81, 2nd return path flow path 82 , The return shunt 83 and the 3B return shunt 84-2 are connected in this order, and the 3B return shunt 84-2 is connected to the second evaporator 86-2 to form a closed loop circulation path. Is formed.

In this way, the heat generated by the exothermic reaction in the first and second absorbers 11-1 and 11-2 is collected by the outward merging device 73, and is collected by the outward shunt 76 in the first and second regenerators 21-1 and 21. -Distributed to each. The heat from the endothermic reaction in the first and second regenerators 21-1 and 21-2 is collected by the return shunt 81, and is collected by the return shunt 83 in the first and second absorbers 11-1 and 11-2, respectively. Will be distributed to.

Similar to the use of parallel or countercurrent in the first and second embodiments, the one-to-one heat pump shown in FIG. 3A or the heat pump in the set shown in FIG. 3B is selected in the third embodiment. Therefore, the heat recovery efficiency in the heat pump can be improved.

The gas treatment devices S3a and S3b in the third embodiment have the same effects as the gas treatment devices S1a and S1b; S2a and S2b in the first and second embodiments.

Since the gas treatment devices S3a and S3b in the third embodiment provide the heat pump HP for the plurality of absorbers 11 and the plurality of regenerators 21, heat is transferred between the plurality of absorbers 11 and the plurality of regenerators 21. It can be used effectively.

The gas treatment device S3a according to the third embodiment described above is configured to include two heat pumps HPa-1 and HPa-2, but may be configured to include two heat pumps similar to the heat pump HPb. I do not care. Similarly, the gas treatment apparatus S3c according to the third embodiment described above includes a heat pump HPc which is countercurrent in the absorbers 11-1 and 11-2 and parallel in the regenerators 21-1 and 21-2. Although it is configured, it may be configured to include a heat pump which is parallel flow in the absorbers 11-1 and 11-2 and countercurrent in the regenerators 21-1 and 21-2.

Further, the gas treatment device S3c according to the third embodiment described above is a set of a plurality of absorbers 11 on the absorption side grouped together and a plurality of regenerators 21 on the regeneration side grouped together. Although it is configured to include the heat pump HPc of the above, it may be configured to include a heat pump in which at least one of the plurality of absorbers 11 on the absorption side and the plurality of regenerators 21 on the regeneration side are grouped into a plurality of groups. .. For example, two heat pumps HPc (HPc-1, HPc) in a set, in which four absorbers 11 are grouped into two groups of two and four regenerators 21 are grouped into two groups of two each. -2) may be used.

Further, in the gas treatment devices S3a and S3c according to the third embodiment described above, the one-to-one heat pump as shown in FIG. 3A and the heat pump in the set as shown in FIG. 3B may be mixed. For example, one heat pump HPc in a set in which two of the three absorbers 11 are grouped together and two of the three regenerators 21 are grouped together, and the remainder. A one-to-one heat pump HPa for the absorber 11 and the regenerator 21 may be used.

Further, the gas treatment devices S3a and S3c according to the third embodiment described above are configured to include the same number of absorbers 11 and 21 on the absorption side and the regeneration side, but the absorption side and the regeneration side are configured with each other. It may be configured to include a different number of absorbers 11 and regenerators 21. If the absorbers 11 and the regenerators 21 are different from each other and a plurality of heat pumps are used on a one-to-one basis, an absorber 11 or a regenerator 21 without a heat pump will occur. By using the one-to-one heat pump and the set heat pump in a mixed manner, the absorber 11 or the regenerator 21 without the heat pump is not generated.

Further, in the gas treatment devices S1a, S1b; S2a, S2b; S3a, S3c in the first to third embodiments, the absorbers 10; 11; 11-1, 11-2 are directed against the flow of the absorbing liquid. The heat pump HPa; HPa; HPa-1, HPa-2; HPc, which is parallel to the flow of the absorbing liquid in the regenerators 21; 21; 21-1, 21-2, is used, or the absorber 10 11; 11-1 and 11-2 are parallel to the flow of the absorbing liquid and the regenerator 21; 21; 21 and 21-2 are countercurrent to the flow of the absorbing liquid. HPb; HPb-1 and HPb-2 were used. However, the heat pump is not limited to these, and a heat pump that combines parallel flow and countercurrent flow, or two fluids that exchange heat based on a refrigerant instead of an absorbent liquid are crossed (for example, orthogonal or oblique). ) It may be a heat pump that flows. In such a combination, for example, in the absorbers 10; 11; 11-1, 11-2, the gas to be processed flows in parallel flow and the processing liquid flows in a countercurrent flow with reference to the refrigerant. At the intersection, for example, in the absorbers 10; 11; 11-1, 11-2, the gas to be processed and the processing liquid each flow orthogonally to the refrigerant. At this intersection, when the refrigerant flows through a plurality of pipes, each refrigerant in each pipe may flow in the same direction, and each refrigerant in each pipe flows in alternating directions (alternate directions). It doesn't matter. Similarly, in the regenerators 21; 21; 21-1, 21-2, the combination may be used, or the difference may be used.

Further, in the gas treatment devices S1a, S1b; S2a, S2b; S3a, S3c according to the first to third embodiments, the tank may include one or a plurality of interface area increasing portions for increasing the interface area. The interface area increasing portion increases the area of the interface during its operation from the area of the interface during its stop, as in the first to fifth aspects described later. Since such a gas treatment device S (S1a, S1b; S2a, S2b; S3a, S3c) includes the interface area increasing portion, it can interact efficiently. Since the interaction can be performed efficiently, the gas treatment device S can be made compact. Since the area of the interface is increased, the performance of the treatment liquid can be maximized. When the tank is included in the absorber 11, the interface area increasing portion can increase the area at the gas / liquid interface on the surface of the treatment liquid, and can interact efficiently on the absorption side. When the tank is included in the regenerator 21, the interface area increasing portion can increase each area at each interface of gas / liquid / liquid in the treatment liquid surface and the liquid phase separated treatment liquid, and is efficient on the regeneration side. Can interact well.

The interface area increasing portion may be one of the absorber 11 and the regenerator 21, or the absorber 11 and the regenerator 21, for example, by considering the absorption rate in the absorber 11 and the separation rate in the regenerator 21. It is provided on both sides of the regenerator 21. In order to improve the contact efficiency and operate continuously, for example, the interface area increasing portion is provided so that the absorption rate in the absorber 11 and the separation rate in the regenerator 21 are balanced. Therefore, the number of the interface area increasing portions provided on the absorption side and the number of the interface area increasing portions provided on the regeneration side may be the same number or different numbers.

FIG. 4 is a diagram for explaining an interface area increasing portion of the first aspect provided in the tank of the gas treatment apparatus. FIG. 4A shows a case where the tank included in the absorber 11 is provided with a stirrer which is an example of the interface area increasing portion of the first aspect, and FIG. 4B shows a case where the tank included in the regenerator 21 is provided with the stirrer. Indicates the case. FIG. 5 is a diagram for explaining each interface area increasing portion of the second and third aspects provided in the tank of the gas treatment apparatus. FIG. 5A shows the interface area increase portion of the second aspect, and FIG. 5B shows the interface area increase portion of the third aspect. FIG. 6 is a diagram for explaining an interface area increasing portion of the fourth aspect provided in the tank of the gas treatment apparatus. FIG. 6A shows the interface area increase portion of the fourth aspect in the first spray pattern, and FIG. 6B shows the interface area increase portion of the fourth aspect in the second spray pattern. FIG. 7 is a diagram for explaining a spray pattern in the interface area increasing portion of the fourth aspect. 7A to 7F show the spray patterns of the first to sixth aspects, the upper part shows the shape of the side view, and the lower part shows the shape of the horizontal cross section orthogonal to the direction of injection. FIG. 8 is a diagram for explaining each interface area increasing portion of the fifth and sixth aspects provided in the tank of the gas treatment apparatus. FIG. 8A shows the interface area increasing portion of the fifth aspect, and FIG. 8B shows the interface area increasing portion of the sixth aspect.

In one example, the interface area increasing portion may be a stirrer for stirring the treatment liquid (first aspect). The gas treatment device S provided with such a stirrer can increase the area of the interface by stirring and can interact efficiently.

As shown in FIG. 4A, for example, such a stirrer 91a is arranged in the tank of the absorber 11, and the agitator 11 stirs the processing liquid in the tank. Further, for example, as shown in FIG. 4B, the stirrer 101a is arranged in the tank of the regenerator 21 and agitates the processing liquid in the tank in the regenerator 21. The stirrers 91a and 101a include, for example, one or a plurality of blades and an actuator such as a motor for rotating the blades.

4A and 4B show a case where each tank of the absorber 11 and the regenerator 21 in the gas treatment apparatus S2a of the second embodiment shown in FIG. 2A is provided with agitators 91a and 101a as an example of the interface area increasing portion. show. The case where the other gas treatment apparatus S1a, S1b; S2b; S3a, S3c includes the interface area increasing portion can be similarly illustrated, but the illustration thereof will be omitted.

As can be seen from FIGS. 4A and 4B, the above-mentioned gas supply path 12, gas discharge path 13, first flow path 31 and second flow path 32 are connected to the absorber 11, and the heat used for the heat pump HP is used. While the exchanger is attached, the regenerator 21 is connected to the first flow path 31 and the second flow path 32 described above, and is provided with the heat exchanger used for the heat pump HP, the supply unit 50, and the heat source 57. However, the tank of the absorber 11 and the tank of the regenerator 21 are the same in that the stirrers 91a and 101a are provided as the first aspect of the interface area increasing portion. In a more specific description of each interface area increasing portion in the sixth aspect, as shown in FIG. 4, the interface area increasing portion is provided in the tank of the absorber 11, and the interface area increasing portion is provided in the tank of the regenerator 21. Each interface area increase portion in the second to sixth aspects will be collectively described without distinguishing from the case where the gas is provided. In FIGS. 5, 6 and 8, the reference numerals in the regenerator 21 are written in parentheses following the reference numerals in the absorber 11.

In another example, the interface area increasing portion may be a bubble nozzle that sends bubbles into the treatment liquid (second aspect). The gas treatment device S provided with such a bubble nozzle can increase the area of the interface by sending bubbles, and can interact efficiently.

Such a bubble nozzle 91b (101b) is provided in the tank 11 (21), for example, as shown in FIG. 5A, and sends the bubble BL into the tank 11 (21). The bubble nozzle 91b (101b) is, for example, an air supply tube extending in the tank 11 (21) and having a plurality of holes for generating bubble BL, and supplying gas to the air supply tube, for example, a compressor or the like. It is equipped with a gas supply device. The air supply tube may have a circular tubular shape with a circular cross section or a plate shape with a rectangular cross section. The gas that becomes the bubble BL may be any gas. In addition, instead of the hole, a nozzle for generating air bubbles may be provided in the air supply tube.

In another example, the interface area increasing portion may be a circulation machine that draws out the treatment liquid from the tank and introduces it into the tank again (third aspect). The gas treatment device S provided with such a circulator can be agitated by generating a flow by circulation, can increase the area of the interface, and can interact efficiently.

As shown in FIG. 5B, for example, in such a circulation machine 91c (101c), one is connected to the lower end portion of the tank 11 (21) and the other is connected to the upper portion of the tank 11 (21). A 92 (102) and a pump 93 (103) provided in the circulation path 92 (102) are provided. By operating the pump 93 (103), the processing liquid in the tank 11 (21) is sucked into the circulation path 92 (102) from the lower end thereof and flows through the circulation path 92 (102), and the tank 11 (21) It is discharged from the circulation path 92 (102) at the upper part and returned to the tank 11 (21) again. The position where the treatment liquid is discharged from the circulation path 92 (102) may be below the treatment liquid or above the treatment liquid.

When the circulator 91c is provided in the absorber 11, a part of the circulation path 92 may also be used as a part of the first flow path 31, and the pump 93 may also be used as the pump 42. When the circulator 101c is provided in the regenerator 21, a part of the circulation path 92 may also be used as a part of the second flow path 32, and the pump 93 may also be used as the pump 46.

In another example, the interface area increasing portion may be an injection nozzle for injecting the treatment liquid into the tank (fourth aspect). The gas treatment device S provided with such an injection nozzle can increase the area of the interface by diffusing the treatment liquid with the injection nozzle, and can interact efficiently.

Such injection nozzles 91da (101da); 91db (101db) are provided in the tank 11 (21), for example, as shown in FIGS. 6A and 6B, and the tank 11 (21) is provided from the upper portion to the lower portion thereof. ) Is sprayed with the treatment liquid. As shown in FIG. 7, the spray pattern of the treatment liquid injected from the injection nozzle may be of various types. For example, as shown in FIGS. 7A and 6A, the spray pattern may be a solid cross section with respect to the direction of injection, and the outer shape thereof may be circular, more specifically, a perfect circle. Alternatively, for example, as shown in FIG. 7B, the spray pattern may have an annular (hollow shape) and a circular outer shape in cross section with respect to the direction of injection. Alternatively, for example, as shown in FIGS. 7C and 6B, the spray pattern may have a cross section crossing the direction of injection, a solid state, and an outer shape thereof having a point shape. Alternatively, for example, as shown in FIG. 7D, the spray pattern may have a cross section intersecting the direction of injection, be solid, and have a linear outer shape. Alternatively, for example, as shown in FIG. 7E, the spray pattern may have a cross section intersecting the direction of injection, be solid, and have a circular outer shape, more specifically an ellipse. The circular shape includes not only a perfect circular shape but also an elliptical shape. Alternatively, for example, as shown in FIG. 7F, the spray pattern may have a cross section intersecting the direction of injection, be solid, and have a polygonal outer shape, for example, a quadrangle. In the examples shown in FIGS. 7E and 7F, although it is solid, it may be hollow (annular).

In another example, the interface area increasing portion may be a wet wall forming a liquid film of the treatment liquid (fifth aspect). The gas treatment device S provided with such a wet wall can increase the area of the interface by forming a liquid film on the wet wall, and can interact efficiently.

Such a wet wall 91e (101e) is provided in the tank 11 (21), for example, as shown in FIG. 8A, and forms a liquid film of the treatment liquid in the tank 11 (21). The wet wall 91e (101e) is, for example, a liquid feeding pipe extending in the tank 11 (21) and having a plurality of holes through which the treatment liquid flows out are formed at intervals in the extending direction, and the liquid feeding pipe. It is provided with a liquid film plate that allows the treatment liquid that has flowed out from the water to flow down in the form of a liquid film. Alternatively, the wet wall 91e (101e) may include a plurality of pipes extending from the upper part to the lower part in the tank 11 (21), and a liquid film of the treatment liquid may be formed on the wall surface of each pipe.

As another example, the interface area increasing portion may be a filler that separates a plurality of spaces in the tank (sixth aspect). The gas treatment device S provided with such a wet wall can increase the area of the interface by partitioning the space in the tank into a plurality of spaces with a filler, and can interact efficiently.

As shown in FIG. 8B, for example, such a filler 91f (101f) includes a plurality of members (fillers) having a three-dimensional shape such as a sphere or a polygon, and the plurality of fillers are tanks. It is filled in 11 (21). In the tank 11 (21), a plurality of spaces (gap) are formed between the fillers. These plurality of spaces communicate with each other to form a liquid and / or gas passage (flow path). The filler is formed of a material that does not react with a treatment liquid such as ceramic, stainless steel, nickel alloy or resin.

When the absorber or regenerator is composed of a tower container, the weight of the treatment liquid has dropped, so it is difficult for the phase-separated first and second phase portions to mix with each other. However, when the gas treatment device S is provided with the interface area increasing portion, the phase-separated first and second phase portions can easily be mixed and interact with each other by stirring or diffusion. Therefore, it is preferable that the regenerator 21 includes a tank, and the tank is provided with the interface area increasing portion.

When the absorber or regenerator is composed of a tower container, the size of the interface area increase portion is restricted by the tower diameter, and for example, a stirrer having relatively large blades for efficient interaction. Depending on the mode of the interface area increase portion such as 91a (101a) or a wet wall 91e (101e) having a relatively large area, it is difficult for the tower to accommodate the interface area increase portion. However, since the interface area increasing portion is provided in the tank, it can be easily accommodated.

When the absorber or the regenerator is composed of the container of the tower, it is necessary to provide a plurality of the interface area increasing portions in the height direction of the tower according to the height of the tower in order to make the treatment liquid uniform. However, since the interface area increasing portion is provided in the tank, it is easy to make the treatment liquid uniform even if a plurality of the interface area increasing portions are not provided in the height direction.

Then, the interface area increasing portion may be a plurality of combinations selected from these agitators, bubble nozzles, circulators, injection nozzles, wet walls and fillers. As a result, the area of the interface can be increased and the interaction can be performed more efficiently. 6A and 6B show an example in which the bubble nozzle 91b (101b) and the injection nozzle 91da (101da); 91db (101db) are combined. FIG. 8A shows an example in which the stirrer 91a (101a) and the wet wall 91e (101e) are combined. FIG. 8B shows an example in which the bubble nozzle 91b (101b), the circulation machine 91c (101c), the injection nozzle 91da (101da), and the filler 91f (101f) are combined. 6 and 8 are examples, for example, a combination of a stirrer 91a (101a) and a bubble nozzle 91b (101b), a combination of a bubble nozzle 91b (101b) and a circulation machine 91c (101c), or a bubble nozzle. Other combinations such as a combination of 91b (101b), a circulation machine 91c (101c), an injection nozzle 91da (101da), and a filler 91f (101f) may be used. Various other combinations are possible.

Further, when a plurality of absorbers 11 and a plurality of regenerators 21 are used, the interface area increasing portions provided in the plurality of absorbers 11 and the plurality of regenerators 21 may have the same embodiment, and are different. It may be an embodiment. For example, stirrers 91a (91a-1, 91a-2) and 101a (101a-1, 101a-2) are used for the two absorbers 11 and the two regenerators 21, respectively. Alternatively, for example, a stirrer 91a (91a-1, 91a-2), 101a is used for each of the two absorbers 11 and one regenerator 21, and an injection nozzle 101da is used for the other regenerator 21. Be done. Alternatively, for example, a stirrer 91a (91a-1, 91a-2) is used for each of the two absorbers 11, and an injection nozzle 101da (101da-1, 101da-2) is used for each of the two regenerators 21. ..

This specification discloses various modes of technology as described above, and the main technologies are summarized below.

The gas treatment apparatus according to one embodiment uses a gas to be treated containing an acidic compound that produces an acid when dissolved in water and a treatment liquid that undergoes phase separation by absorbing the acidic compound, and removes the acidic compound from the gas to be treated. A device for separating, the absorber including an absorber that brings the gas to be treated into contact with the treatment liquid and a regenerator that heats the treatment liquid that comes into contact with the gas to be treated to separate acidic compounds. And at least one of the regenerators comprises at least one tank.

Such a gas treatment device includes at least one tank of at least one of the absorber and the regenerator. Since the tank is not restricted by the tower diameter, the gas treatment apparatus can increase the area (contact area) of the interface and can interact efficiently. Here, the term "tank" means that, in this document, when the shape of the horizontal cross section of the tank is circular, the ratio of the height to the diameter of the tank is less than 3.5 ((tank height) / (tank diameter) <3. .5)) When the shape of the horizontal cross section of the tank is elliptical or polygonal, a circle with the same horizontal cross section area (equivalent circle) is obtained, and the diameter of the obtained equivalent circle (converted diameter) is the above. It is the tank diameter ((tank height) / (converted diameter) <3.5).

In another aspect, the gas treatment apparatus described above further includes a heat pump that transfers heat between the absorber and the regenerator.

Since such a gas treatment device is equipped with a heat pump, it is possible to save energy and reduce the energy input to the regenerator from the outside for regeneration.

In another aspect, in the gas treatment apparatus described above, the absorber is a plurality, the regenerator is a plurality, and the heat pump is a pair of the absorpt and the regenerator. A plurality of heat pumps for transferring heat in 1, or a heat pump for transferring heat between an absorber set including the plurality of absorbers and a regenerator set including the plurality of regenerators.

Since such a gas treatment device provides heat pumps for a plurality of absorbers and a plurality of regenerators, heat can be effectively utilized between the plurality of absorbers and the plurality of regenerators.

In another aspect, in these gas treatment devices described above, the heat pump performs the heating by parallel flow or countercurrent flow.

In heat pumps, in general, the smaller the temperature difference between heat exchanges, the better (higher) the exchange efficiency. In the gas treatment device, the heat recovery efficiency in the heat pump can be improved by selecting parallel flow or countercurrent flow according to each temperature distribution of the absorber and the regenerator in which the heat pump is arranged.

In another aspect, these gas treatment devices further include an independent heat source separate from the heat pump that heats the regenerator.

Since such a gas treatment device is provided with an independent heat source, the heat of the independent heat source can be supplied to the regenerator in addition to the heat of the heat pump. In particular, when the heat of the heat pump is insufficient for regeneration, the shortage can be supplemented by an independent heat source.

In another aspect, in these gas treatment devices described above, the tank comprises one or more interface area increasing portions that increase the interface area. The tank including the interface area increasing portion is preferably included in the regenerator. It is preferable that the tank including the interface area increasing portion is included in each of the regenerator and the absorber.

Since such a gas treatment device is provided with an interface area increasing portion, it can interact efficiently. Since the interaction can be performed efficiently, the gas treatment device can be made compact. Since the area of the interface is increased, the performance of the treatment liquid can be maximized. When the tank is included in the absorber, the interface area increasing portion can increase the area at the gas / liquid interface on the surface of the treatment liquid, and can interact efficiently on the absorption side. When the tank is included in the regenerator, the interface area increasing portion can increase each area at each interface of gas / liquid / liquid in the treatment liquid surface and the liquid phase separated treatment liquid, and is efficient on the regeneration side. Can interact well.

In another aspect, in the above-mentioned gas treatment apparatus, as one of the one or a plurality of interface area increasing portions, a stirrer for stirring the treatment liquid is included.

Such a gas treatment device can increase the area of the interface by stirring and can interact efficiently.

In another aspect, in the above-mentioned gas treatment apparatus, as one of the one or a plurality of interface area increasing portions, a bubble nozzle for sending bubbles into the treatment liquid is included.

Such a gas treatment device can increase the area of the interface by sending bubbles and can interact efficiently.

In another aspect, in the above-mentioned gas treatment apparatus, as one of the one or a plurality of interface area increasing portions, a circulator that draws out the treatment liquid from the tank and introduces the treatment liquid into the tank again is included.

Such a gas treatment device can be agitated by generating a flow in circulation, can increase the area of the interface, and can interact efficiently.

In another aspect, in the above-mentioned gas treatment apparatus, as one of the one or a plurality of interface area increasing portions, an injection nozzle for injecting the treatment liquid into the tank is included. Preferably, in the above-mentioned gas treatment apparatus, the spray pattern of the treatment liquid injected from the injection nozzle has a cross section crossing the direction of the injection, is solid or annular, and has a dot-like or linear outer shape. It is one of a shape, a circle shape, and a polygonal shape. Here, the circular shape includes not only a perfect circle but also an ellipse.

In such a gas treatment device, the area of the interface can be increased by diffusing the treatment liquid with the injection nozzle, and the interaction can be performed efficiently.

In another aspect, in the above-mentioned gas treatment apparatus, as one of the one or a plurality of interface area increasing portions, a wet wall forming a liquid film of the treatment liquid is included.

In such a gas treatment device, the area of the interface can be increased by forming a liquid film on the wet wall, and the interaction can be performed efficiently.

In another aspect, in the above-mentioned gas treatment apparatus, as one of the one or a plurality of interface area increasing portions, a filler that separates a plurality of spaces in the tank is included.

In such a gas treatment device, the area of the interface can be increased by separating the space in the tank into a plurality of spaces with a filler, and the interaction can be performed efficiently.

In the gas treatment method according to the other aspect, a gas to be treated containing an acidic compound that produces an acid when dissolved in water and a treatment liquid that undergoes phase separation by absorption of the acidic compound are used, and the acidity is obtained from the gas to be treated. A method for separating compounds, that is, an absorption step in which the gas to be treated is brought into contact with the treatment liquid by an absorber, and a regeneration in which the treatment liquid in contact with the gas to be treated is heated by a regenerator to separate acidic compounds. It comprises a step and at least one of the absorber and the regenerator comprises at least one tank.

Such a gas treatment method includes at least one tank in at least one of the absorber and the regenerator. Since the tank is not restricted by the tower diameter, the gas treatment method can increase the area (contact area) of the interface and can interact efficiently.

This application is based on Japanese Patent Application No. 2020-12253 filed on January 29, 2020, the contents of which are included in the present application.

In order to express the present invention, the present invention has been appropriately and sufficiently described through the embodiments with reference to the drawings described above, but those skilled in the art can easily change and / or improve the above-described embodiments. It should be recognized that it can be done. Therefore, unless the modified or improved form implemented by a person skilled in the art is at a level that deviates from the scope of rights of the claims stated in the claims, the modified form or the improved form is the scope of rights of the claims. It is interpreted as being comprehensively included in.

According to the present invention, it is possible to provide a gas treatment apparatus and a gas treatment method for separating a predetermined substance from a gas to be treated by using a predetermined treatment liquid.

Claims (14)

1. A gas treatment apparatus that separates the acidic compound from the gas to be treated by using a gas to be treated containing an acidic compound that produces an acid when dissolved in water and a treatment liquid that undergoes phase separation by absorbing the acidic compound.
   An absorber that brings the gas to be treated into contact with the treatment liquid,
   A regenerator that heats the treatment liquid in contact with the gas to be treated to separate acidic compounds is provided.
   At least one of the absorber and the regenerator comprises at least one tank.
   Gas processing equipment.
2. A heat pump for transferring heat between the absorber and the regenerator is further provided.
   The gas treatment apparatus according to claim 1.
3. There are a plurality of the absorbers,
   There are a plurality of the regenerators,
   The heat pump is a plurality of heat pumps that transfer heat one-to-one between the plurality of absorbers and the plurality of regenerators, or a regenerator composed of the plurality of absorbers and the plurality of regenerators. A heat pump that transfers heat to and from the vessel set,
   The gas treatment apparatus according to claim 2.
4. The heat pump performs the heating by parallel flow or countercurrent.
   The gas treatment apparatus according to claim 2 or 3.
5. Further provided with an independent heat source separate from the heat pump, which heats the regenerator.
   The gas treatment apparatus according to claim 2 or 3.
6. The tank comprises one or more interface area increases that increase the area of the interface.
   The gas treatment apparatus according to any one of claims 1 to 3.
7. As one of the one or a plurality of interface area increasing portions, a stirrer for stirring the treatment liquid is included.
   The gas treatment apparatus according to claim 6.
8. As one of the one or a plurality of interface area increasing portions, a bubble nozzle for feeding bubbles into the treatment liquid is included.
   The gas treatment apparatus according to claim 6.
9. As one of the one or a plurality of interface area increasing portions, a circulator that draws out the treatment liquid from the tank and introduces it into the tank again is included.
   The gas treatment apparatus according to claim 6.
10. As one of the one or a plurality of interface area increasing portions, an injection nozzle for injecting the treatment liquid into the tank is included.
    The gas treatment apparatus according to claim 6.
11. The spray pattern of the treatment liquid ejected from the injection nozzle has a cross section crossing the direction of the injection, is solid or annular, and has an outer shape of a point shape, a linear shape, a circular shape, or a polygonal shape. Either,
    The gas treatment apparatus according to claim 10.
12. As one of the one or a plurality of interface area increasing portions, a wet wall forming a liquid film of the treatment liquid is included.
    The gas treatment apparatus according to claim 6.
13. As one of the one or a plurality of interface area increasing portions, a filler that separates a plurality of spaces in the tank is included.
    The gas treatment apparatus according to claim 6.
14. A gas treatment method for separating the acidic compound from the gas to be treated by using a gas to be treated containing an acidic compound that produces an acid when dissolved in water and a treatment liquid that undergoes phase separation by absorbing the acidic compound.
    An absorption step in which the gas to be treated is brought into contact with the treatment liquid by an absorber, and
    It is provided with a regeneration step of heating the treatment liquid in contact with the gas to be treated with a regenerator to separate acidic compounds.
    At least one of the absorber and the regenerator comprises at least one tank.
    Gas treatment method.
    

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