JP2023068907A - Absorber, gas treatment device, absorption method and gas treatment method - Google Patents

Abstract

To increase a recovery amount of reaction heat when absorbing an acidic compound using treatment liquid.SOLUTION: There is provided an absorber 20 which is configured so that, a treated gas including an acidic compound, is brought into contact with treatment liquid in which phase separation occurs by absorption of the acidic compound, for causing the treatment liquid to absorb the acidic compound. The absorber comprises: an absorption container 21; a treatment liquid supply path 13 having a treatment liquid supply hole 13a opened in the absorption container 21, and supplying the treatment liquid into the absorption container 21; a reaction heat recovery tool 60a arranged to be immersed in the treatment liquid in the absorption container 21 and recovering reaction heat generated by absorption of the acidic compound by the treatment liquid; and a gas supply path 11 supplying the treated gas into the absorption container 21, from a position in a height range of the reaction heat recovery tool 60a, wherein the treatment liquid supply hole 13a is arranged at a position below a liquid level of the treatment liquid during operation.SELECTED DRAWING: Figure 1

Description

The present invention relates to an absorber, a gas treatment apparatus comprising the absorber, an absorption method and a gas treatment method in which the absorption method is implemented.

Conventionally, as disclosed in Patent Document 1 below, for example, there is known a gas treatment apparatus that separates an acidic compound by bringing the acidic compound contained in the gas to be treated into contact with a treatment liquid. In Patent Document 1, a treatment liquid is used that undergoes liquid phase separation into a first phase portion having a high acid compound content and a second phase portion having a low acid compound content.

A gas treatment apparatus disclosed in Patent Document 1 includes an absorber, a heat exchanger, a regenerator, and a heat pump. The absorber brings the exhaust gas (gas to be treated) containing carbon dioxide into contact with the treatment liquid. The treatment liquid undergoes liquid phase separation into a first phase portion with a high carbon dioxide content (CO2 _- rich phase) and a second phase portion with a low _CO2 content (CO2 _- lean phase). The liquid-phase-separated treatment liquid is sent to the regenerator via a heat exchanger. A heat exchanger is placed in the flow path connecting the absorber and the regenerator to preheat the process liquid going to the regenerator. The regenerator separates carbon dioxide from the processing liquid by heating the processing liquid. The carbon dioxide separated from the treated liquid is recovered through the recovery path, while the treated liquid that has released carbon dioxide is returned to the absorber via the heat exchanger. The heat pump has a closed-loop circulation path, an evaporator located within an absorber, a compressor, a condenser located within a regenerator, and an expander. As the refrigerant circulates along the circulation path in the evaporator, compressor, condenser, and expander, the reaction heat generated by the exothermic reaction between the treated liquid and the acidic compounds in the treated gas in the absorber is transferred to the regenerator. heat transported.

JP 2018-187553 A

In the gas treatment apparatus disclosed in Patent Document 1, contact between the gas to be treated and the liquid to be treated in the absorber can be achieved by spraying the liquid to be treated into the flow path of the gas to be treated, or by spraying the liquid to be treated in the flow path of the gas to be treated. It is carried out by means of, for example, allowing the treatment liquid to flow down along the filler. In such a configuration in which the gas to be treated and the liquid to be treated are brought into contact with each other, the contact may not be sufficient, and the heat of reaction when the acidic compounds are absorbed may not be recovered.

Therefore, the present invention has been made in view of the above-mentioned prior art, and an object of the present invention is to provide a first phase portion having a high content of acidic compounds and a second phase portion having a low content of acidic compounds. An object of the present invention is to increase the amount of reaction heat recovered when absorbing an acidic compound using a phase-separating treatment liquid.

In order to achieve the above object, an absorption apparatus according to the present invention brings a gas to be treated containing an acidic compound into contact with a treatment liquid that undergoes phase separation due to the absorption of the acid compound, and absorbs the acid compound into the treatment liquid. a container, a processing liquid supply passage having a processing liquid supply port that opens in the container and supplying the processing liquid into the container; a reaction heat recovery device for recovering reaction heat generated when the treatment liquid absorbs the acidic compound, and a position within the height range of the reaction heat recovery device to the inside of the container. a gas supply path for supplying the gas to be processed, wherein the processing liquid supply port is arranged so as to be positioned below the liquid surface of the processing liquid during operation.

In the absorption apparatus of the present invention, the gas to be treated is supplied into the treatment liquid through the gas supply passage from a position within the height range of the reaction heat recovery device in which the treatment liquid is stored in the container and immersed in the treatment liquid. be done. Therefore, it is possible to prevent the gas to be processed from passing through the container without coming into contact with the processing liquid. Therefore, the heat of reaction increases due to the sufficient reaction between the treatment liquid and the acidic compounds in the gas to be treated, so that the amount of reaction heat recovered by the reaction heat recovery device can be increased. Since the processing liquid is stored in the container so that the reaction heat recovery device is immersed in the processing liquid, it is possible to prevent the reaction heat recovery device from being exposed from the processing liquid even when the liquid surface fluctuates. . That is, since the state in which the reaction heat recovery device is immersed in the treatment liquid can be maintained, a decrease in the amount of reaction heat recovered by the reaction heat recovery device can be suppressed.

In addition, since the processing liquid supply port supplies the processing liquid from below the liquid surface and the gas to be processed is supplied from a position within the height range of the reaction heat recovery device immersed in the processing liquid, the processing liquid supply port The reaction heat generated in the vicinity of is easily transferred to the reaction heat recovery device. Therefore, the amount of reaction heat recovered by the reaction heat recovery device can be increased.

The processing liquid supply port may be arranged at a position closer to the reaction heat recovery device than a connecting portion where the processing liquid supply path is connected to the container. In this aspect, even when the connecting portion where the processing liquid supply path is connected to the container is distant from the reaction heat recovery device, the processing liquid supply port can be brought closer to the reaction heat recovery device than the connection portion. Therefore, the amount of reaction heat recovered by the reaction heat recovery device can be increased.

The processing liquid supply port may be positioned between the liquid surface and the upper end of the reaction heat recovery device. In this aspect, the processing liquid supply port can be brought closer to the upper end of the reaction heat recovery device than when the processing liquid supply port is arranged at a position above the surface of the processing liquid. Therefore, more reaction heat generated in the vicinity of the processing liquid supply port can be efficiently transferred to the upper end portion of the reaction heat recovery device, and more reaction heat can be recovered by the upper end portion.

The processing liquid supply port may be arranged within a height range of the reaction heat recovery device. In this aspect, by arranging the processing liquid supply port within the height range of the reaction heat recovery device, the processing liquid recovery port can be brought closer to the reaction heat recovery device. Thereby, the amount of reaction heat recovered by the reaction heat recovery device can be increased.

The processing liquid supply port may be arranged at or near the lower end of the reaction heat recovery device. In this aspect, the processing liquid supply port supplies the processing liquid at or near the lower end of the reaction heat recovery device, and the gas to be processed is supplied from a position within the height range of the reaction heat recovery device immersed in the processing liquid. Therefore, it is possible to absorb the acidic compound in the processing liquid near the reaction heat recovery device and recover the reaction heat generated by this absorption.

The absorption device may further include a meandering part arranged so as to be immersed in the treatment liquid inside the container, and causing the gas to be treated to meander and rise in the treatment liquid. In this aspect, the to-be-processed gas is made to meander and rise in the processing liquid by the meandering part, so that the residence time of the to-be-processed gas in the processing liquid is longer than when the to-be-processed gas immediately rises in the processing liquid. can do. This increases the contact time between the treatment liquid and the gas to be treated. Therefore, a large amount of the acid compound in the gas to be treated is absorbed by the treatment liquid, so that a large amount of reaction heat can be generated.

The absorption device may further include a dispersing section arranged so as to be immersed in the processing liquid inside the container, and dispersing the processing gas by allowing the processing gas to pass therethrough. In this aspect, the surface area of the gas to be treated can be increased by dispersing the gas to be treated by the dispersing section. As a result, since the contact area between the treatment liquid and the gas to be treated increases, more acid compounds in the gas to be treated are absorbed by the treatment liquid, thereby generating a large amount of reaction heat.

In the vessel, the treatment liquid in contact with the gas to be treated is composed of a first phase portion having a high acid compound content and a second phase having a low acid compound content and a lower specific gravity than the first phase portion. The container may have a first discharge section and a second discharge section arranged at a position higher than the first discharge section in the vertical direction. In this aspect, the phase-separated first phase portion and second phase portion of the treated liquid that has come into contact with the gas to be treated are removed from the vessel through the first discharge section and the second discharge section, respectively, whereby the removed treated liquid It is possible to stabilize the ratio between the first phase portion and the second phase portion. That is, in the container, the treatment liquid that has come into contact with the gas to be treated containing acidic compounds undergoes phase separation into a first phase portion with a high acidic compound content and a second phase portion with a low acidic compound content. Since the second phase portion has a lower specific gravity than the first phase portion, the second phase portion exists at a higher position than the first phase portion in the container. Then, the processing liquid containing mainly the first phase portion is removed from the container through the first outlet, and the processing liquid containing mainly the second phase portion is removed from the container through the second outlet. Therefore, the ratio of the first phase portion to the second phase portion can be stabilized in the treatment liquid containing the first phase portion and the second phase portion taken out from the container.

The vessel contains the reaction heat recovery device and has an absorption part filled with the treatment liquid and opening upward, and the second discharge part is the second phase portion overflowing from the absorption part. and the first discharge section may discharge a processing liquid other than the processing liquid discharged through the second discharge section. In this aspect, by allowing the second phase portion, which has a lower specific gravity than the first phase portion, to overflow from the main body portion, the processing liquid mainly containing the second phase portion can be taken out from the container through the second discharge portion, and A processing liquid comprising a one-phase portion can be removed from the vessel through the first outlet.

further comprising an inlet chamber for introducing a refrigerant for recovering the reaction heat into the reaction heat recovery device and an outlet chamber for leading the refrigerant from the reaction heat recovery device, which are connected to the outer surface of the bottom of the vessel; The reaction heat recovery device has an inverted U-shaped tube vertically standing from the inner surface of the bottom, one end of the tube communicating with the inlet chamber, and the other end of the tube. A section may communicate with the outlet chamber. In this embodiment, since the reaction heat recovery device is erected on the inner surface of the bottom of the container in an inverted U shape, both ends of the inverted U shape are connected to the outer surface of the bottom of the container, respectively. can be concatenated to In addition, since the reaction heat recovery device stands vertically, the heat of reaction due to the contact between the treatment liquid and the gas to be treated can be sufficiently recovered over the lengthwise length of the reaction heat recovery device.

A gas treatment apparatus according to the present invention comprises the above absorption apparatus, a regeneration apparatus for heating the treatment liquid in contact with the gas to be treated to separate the acidic compound, and the a liquid sending unit that sends the treatment liquid to the regeneration device.

In the present invention, it is possible to separate acidic compounds from the treated liquid that has come into contact with the gas to be treated while increasing the amount of reaction heat recovered in the absorber.

The absorption method according to the present invention is an absorption method in which a gas to be treated containing an acidic compound and a treatment liquid that undergoes phase separation due to the absorption of the acid compound are brought into contact in a container, and the treatment liquid absorbs the acid compound. wherein the processing liquid is supplied from a processing liquid supply port located below the liquid surface of the processing liquid to the processing liquid stored in the container with the reaction heat recovery device immersed therein, and A gas is supplied from a position within the height range of the reaction heat recovery device to the treatment liquid stored inside the container, and the treatment liquid absorbs the acid compound in the gas to be treated. The reaction heat generated is recovered by the reaction heat recovery device.

In the absorption method of the present invention, the processing liquid is stored in the container, and the gas to be processed is supplied into the processing liquid through the gas supply path from a position within the height range of the reaction heat recovery device immersed in the processing liquid. Therefore, it is possible to prevent the gas to be processed from passing through the container without coming into contact with the processing liquid. Therefore, the heat of reaction increases due to the sufficient reaction between the treatment liquid and the acidic compounds in the gas to be treated, so that the amount of reaction heat recovered by the reaction heat recovery device can be increased. Since the processing liquid is stored in the container so that the reaction heat recovery device is immersed in the processing liquid, it is possible to prevent the reaction heat recovery device from being exposed from the processing liquid even when the liquid surface fluctuates. . That is, since the state in which the reaction heat recovery device is immersed in the treatment liquid can be maintained, a decrease in the amount of reaction heat recovered by the reaction heat recovery device can be suppressed.

In addition, since the processing liquid supply port supplies the processing liquid from below the liquid surface and the gas to be processed is supplied from a position within the height range of the reaction heat recovery device immersed in the processing liquid, the processing liquid supply port The reaction heat generated in the vicinity of is easily transferred to the reaction heat recovery device. Therefore, the amount of reaction heat recovered by the reaction heat recovery device can be increased.

A gas treatment method according to the present invention includes a liquid feeding step of sending a treated liquid in which acidic compounds contained in the gas to be treated are absorbed by the absorption apparatus by carrying out the absorption method described above from the absorption apparatus to the regeneration apparatus. and, in the regeneration device, a regeneration step of heating the treatment liquid to separate the acidic compound from the treatment liquid.

In the present invention, by carrying out the absorption method described above, it is possible to separate acidic compounds from the treated liquid that has come into contact with the gas to be treated while increasing the amount of reaction heat recovered.

As described above, according to the present invention, an acidic compound is absorbed using a treatment liquid that undergoes phase separation into a first phase portion having a high content of acidic compounds and a second phase portion having a low content of acidic compounds. It is possible to increase the amount of reaction heat recovered during the reaction.

BRIEF DESCRIPTION OF THE DRAWINGS It is a figure which shows roughly the whole structure of the gas treatment apparatus which concerns on 1st Embodiment of this invention. It is a figure which shows roughly the whole structure of the gas treatment apparatus which concerns on 2nd Embodiment of this invention. It is a figure which shows roughly the whole structure of the gas treatment apparatus which concerns on the modification of 2nd Embodiment of this invention. It is a figure which shows roughly the whole structure of the gas treatment apparatus which concerns on 3rd Embodiment of this invention. FIG. 4 is a diagram schematically showing the configuration of an absorber according to another aspect of the present invention; It is a figure which shows roughly the whole structure of the gas treatment apparatus which concerns on the other aspect of this invention.

EMBODIMENT OF THE INVENTION Hereinafter, it demonstrates in detail, referring drawings for the form for implementing this invention.

(First embodiment)
The gas treatment apparatus 10 according to the first embodiment is a gas treatment apparatus that separates the acid-acid compounds from the gas to be treated containing the acid compounds using a treatment liquid that undergoes phase separation by absorption of the acid compounds.

As shown in FIG. 1 , the gas treatment device 10 includes an absorber 20 , a regenerator 30 , a circulation path 40 , a heat exchanger 50 and a heat transfer section 60 . The circulation path 40 includes a first flow path 41 that introduces the treated liquid extracted from the absorber 20 into the regenerator 30, and a second flow path 42 that extracts the treated liquid from the regenerator 30 and returns it to the absorber 20. including. A pump 46 is provided in the second channel 42 and a pump 55 is provided in the first channel 41 . If a heat exchange destination is separately provided as shown in FIG. 6 (in the example of FIG. 6, the heat exchange destination of the refrigerant heat in the outlet chamber 25 is the regeneration device 30), the heat exchanger 50 is omitted. Is possible.

The absorber 20 causes the gas to be treated and the liquid to be treated to be brought into contact with each other to absorb acidic compounds in the gas to be treated, and discharges the gas from which the acidic compounds have been removed. The absorber 20 includes an absorber vessel (container) 21 , an inlet chamber 24 and an outlet chamber 25 .

The absorbent container 21 includes a body portion 22 and a widened portion 23 that is connected to cover the body portion 22 from above and that is wider than the body portion 22 .

The body portion 22 has a bottomed cylindrical shape having a height in the vertical direction and having a bottom portion 22a, a side portion 22b extending upward from the periphery of the bottom portion 22a, and an upper end opening 22c opening upward at the upper end portion of the side portion 22b. is configured to

The widened portion 23 is configured in a lid shape wider than the body portion 22 so as to cover the upper end opening 22c. The widened portion 23 includes a lower end portion 23a connected to the periphery of the body portion 22, a side portion 23b extending upward from the lower end portion 23a, and an upper portion connected to the upper end portion so as to seal the upper end portion of the side portion 23b. 23c and. A lower end portion 23a of the widened portion 23 extends in the circumferential direction along the outer surface of the side portion 22b of the body portion 22 below the upper end opening 22c. In this embodiment, the lower end portion 23a of the widened portion 23 is located below the upper end opening 22c and above the center portion in the vertical direction of the side portion 22b of the main body portion 22. connected to the outside. A space S<b>1 is provided between the outer surface of the side portion 22 b of the body portion 22 and the inner surface of the side portion 23 b of the widened portion 23 . A space S<b>2 is provided between the upper end opening 22 c and the inner surface of the upper portion 23 c of the widened portion 23 .

A reaction heat recovery device 60 a is arranged inside the body portion 22 . The reaction heat recovery device 60a has a pipe that penetrates through the bottom portion 22a and allows a refrigerant to flow therein. In the present embodiment, the tube has an inverted U shape and stands vertically from the inner surface of the bottom portion 22 a of the main body portion 22 . The tube is connected at each of its inverted U-shaped ends to an inlet chamber 24 and an outlet chamber 25, respectively. That is, one end of the tube communicates with the inlet chamber 24, and refrigerant is introduced into the tube from the inlet chamber 24 through one end of the tube. The other end of the pipe communicates with the outlet chamber 25, and the refrigerant in the pipe is discharged to the outlet chamber 25 through the other end of the pipe. The reaction heat recovery device 60a is composed of, for example, a bundle of a plurality of inverted U-shaped tubes.

The length of the reaction heat recovery device 60a in the vertical direction, that is, the length from the lower end to the upper end of the inverted U-shape, is set so that the reaction heat recovery device 60a is accommodated inside the main body 22. Shorter than vertical length. The width of the reaction heat recovery device 60 a is smaller than the width of the body portion 22 , and the reaction heat recovery device 60 a is arranged so as to be separated from the inner surface of the side portion 22 b of the body portion 22 .

A plurality of baffle plates 70 arranged alternately are attached to the inner surface of the body portion 22 . The plurality of baffle plates 70 form a meandering portion that causes the fluid containing the gas to be treated and the liquid to be treated in the body portion 22 to meander and rise. The plurality of baffle plates 70 have a first plate member extending from one inner surface of the side portion 22b toward the other inner surface in a vertical cross-sectional view, and a second plate member extending from the other inner surface toward the one inner surface, The first plate members and the second plate members are alternately arranged. Thereby, a meandering flow path is formed in the body portion 22 . Here, the “longitudinal section” is a section in the direction along the paper surface of FIG. 1 .

A plurality of baffle plates 70 are arranged around the reaction heat recovery device 60a so as not to interfere with the reaction heat recovery device 60a. For example, the first member has a shape that surrounds about half of the reaction heat recovery device 60a on one of the inner surfaces, and the second member has a shape that surrounds about half of the reaction heat recovery device 60a on the other inner surface. be able to. However, not limited to this, the plurality of baffle plates 70 may also be arranged inside the reaction heat recovery device 60a.

The body portion 22 is connected with a gas supply path 11 that supplies a gas to be processed such as a process gas, and a first discharge portion 14 that discharges part of the processing liquid from the body portion 22 . The gas supply path 11 is connected to the main body 22 at a position within the height range of the reaction heat recovery device 60a. In this embodiment, the gas supply path 11 is connected to the bottom portion 22a of the main body portion 22 or the side portion 22b near the bottom portion 22a corresponding to the lower end portion or the vicinity of the lower end portion of the reaction heat recovery device 60a. The first discharge portion 14 is connected to the vicinity of the bottom portion 22a of the side portion 22b.

Connected to the widened portion 23 are a gas discharge passage 12 for discharging gas after processing, a second discharge portion 15 for discharging a part of the processing liquid from the widened portion 23, and a second flow path 42. . The gas discharge path 12 is connected to the upper portion 23c of the widened portion 23. As shown in FIG. The second ejection part 15 is located higher than the first ejection part 14 in the vertical direction, and is connected to a position communicating with the space S1. The second flow path 42 is connected to the side portion 23 b of the widened portion 23 . In addition, when the pipes such as the gas discharge path 12, the second discharge part 15 and the second flow path 42 are "connected" to the object such as the widened part 23, for example, the pipes pass through the object. It includes connecting the space within the pipe to the space within the object.

A processing liquid supply path 13 for supplying the processing liquid to the main body portion 22 is provided in the widened portion 23 . The processing liquid supply path 13 has a supply path body portion 13a and a supply pipe provided at the tip of the supply path body portion 13a. The supply channel body portion 13 a is connected to the second channel 42 . In this embodiment, the supply channel body portion 13 a is connected to the second channel 42 at the side portion 23 b of the widened portion 23 . A connection portion (penetration portion) 16 between the supply channel main body portion 13a and the widened portion 23 is provided at a position higher than the height position of the upper end opening 22c.

The supply channel main body portion 13 a is configured to extend from the connecting portion 16 into the main body portion 22 . Specifically, the supply path main body portion 13a extends from the connecting portion 16 to above the upper end opening 22c, and also extends downward from above the upper end opening 22c toward the inside of the main body portion 22. As shown in FIG.

A processing liquid supply port 13b is formed in the supply pipe. The processing liquid supply port 13b may be one opening formed in the supply pipe. be. The treatment liquid supply port 13 b opens inside the main body 22 . The processing liquid supply port 13b is arranged so as to be located below the surface of the processing liquid stored in the main body 22 when the absorber 20 is in operation. In the present embodiment, the processing liquid supply port 13b is arranged in the main body 22 between the surface of the processing liquid and the upper end of the reaction heat recovery device 60a during operation of the absorber 20. As shown in FIG. The processing liquid supply port 13b is arranged at a position closer to the reaction heat recovery device 60a than the connecting portion 16 in the main body portion 22 . When viewed from above, the range of the supply pipe where the processing liquid supply port 13b is formed overlaps with the reaction heat recovery device 60a.

The body portion 22 described above corresponds to the absorption portion 28 which is filled with the processing liquid in a state in which the reaction heat recovery device 60a is accommodated and which is open upward.

The absorber 20 is provided with a liquid level gauge 75 for measuring the liquid level of the treatment liquid within the space S1. In this embodiment, the liquid level gauge 75 is connected to the side portion 23b of the widened portion 23 so as to communicate with the space S1. A processing liquid amount control unit 76 is electrically connected to the liquid level meter 75 . The processing liquid amount control unit 76 controls the amount of processing liquid supplied to the main body 22 from the processing liquid supply port 13b. In the present embodiment, the processing liquid amount control unit 76 compares the liquid level of the processing liquid in the space S1 measured by the liquid level meter 75 with a predetermined liquid level threshold, and the liquid level of the processing liquid is equal to the predetermined liquid level. The pump 46 and the pump 55 are controlled so as to reach the threshold. As a result, the ratio of the amount of processing liquid supplied to the main body 22 and the amount of processing liquid discharged from the absorption container 21 through the first discharge section 14 and the second discharge section 15 approximately match, and the liquid level is kept within a predetermined range. fits in.

A gas flowmeter 77 for measuring the flow rate of the gas to be processed supplied to the main body 22 is attached to the gas supply path 11 . A coolant amount control unit 78 is electrically connected to the gas flow meter 77 . The refrigerant amount control unit 78 compares the flow rate of the gas to be treated measured by the gas flow meter 77 with a predetermined gas amount threshold, and controls the rotation of the compressor 60c and the pump 60d of the heat transfer unit 60, which will be described later, based on the comparison result. control the numbers. For example, when the flow rate of the gas to be treated exceeds a predetermined gas amount threshold value, the refrigerant amount control unit 78 increases the rotational speed of the compressor 60c and the pump 60d to supply liquid refrigerant from the inlet chamber 24 to the reaction heat recovery device 60a. Use more refrigerant. On the other hand, when the flow rate of the gas to be treated is below a predetermined gas amount threshold, the refrigerant amount control unit 78 reduces the rotational speeds of the compressor 60c and the pump 60d to supply the liquid refrigerant from the inlet chamber 24 to the reaction heat recovery device 60a. Use less refrigerant. Thereby, the refrigerant amount is adjusted according to the supply amount of the gas to be treated to the main body 22 . It should be noted that the pump 60d is not required if the compressor 60c has sufficient pressure.

A first channel 41 and a second channel 42 are connected to the regeneration device 30 . The first flow path 41 is connected to the upper portion of the regenerating device 30 and introduces the treatment liquid drawn out from the pump 55 into the regenerating device 30 . The second flow path 42 is connected to the lower end of the regenerating device 30 or in the vicinity of the lower end of the regenerating device 30 to lead out the processing liquid stored in the regenerating device 30 .

The regeneration device 30 stores a processing liquid, and heats the stored processing liquid to desorb acidic compounds. Desorption of acidic compounds from this treatment liquid is an endothermic reaction. When the treatment liquid is heated in the regenerator 30, not only the acidic compound is desorbed, but also the water in the treatment liquid is evaporated.

A supply channel 80 and a heating channel 82 are connected to the regeneration device 30 . The supply path 80 supplies the acidic compound obtained in the regenerator 30 to the supply destination. The supply path 80 is provided with a condenser 84 for cooling a mixed gas of an acidic compound gas evaporated from the processing liquid and water vapor. As the gas mixture cools, the water vapor condenses so that the water vapor can be separated. The separated water vapor is returned to the regenerator 30 . As the condenser 84, a heat exchanger using inexpensive cooling water such as river water can be used.

One end of the heating channel 82 is connected to the second channel 42 , but the heating channel 82 may be connected to the lower end of the regeneration device 30 or in the vicinity of the lower end. The other end of the heating channel 82 is connected to the bottom of the regeneration device 30 . A reboiler 86 that heats the processing liquid stored in the regeneration device 30 is provided in the heating flow path 82 . The reboiler 86 may be arranged to heat the processing liquid inside the regenerator 30, or may be configured to heat the processing liquid drawn out from the regenerator 30 as shown in the figure. good. In this case, the reboiler 86 can be disposed in the heating flow path 82 for refluxing the regenerator 30 after heating. As the reboiler 86, for example, one that directly or indirectly heats the treatment liquid by any heat source such as electricity, steam, or burner can be used.

The heat transfer section 60 transfers the refrigerant in the outlet chamber 25 to the heat exchanger 50 . The heat transfer section 60 includes a closed-loop circulation flow path 60b in which a coolant is sealed. The inlet chamber 24, the reaction heat recovery device 60a, the outlet chamber 25, the compressor 60c, the heat exchanger 50, the pump 60d and the expansion mechanism 60e are arranged in this order in the circulation flow path 60b. A condenser 60 f is arranged in the heat exchanger 50 . Incidentally, the pump 60d can be omitted.

The heat exchanger 50 is connected to the first flow path 41, the second flow path 42, and the circulation flow path 60b. Heat is exchanged with the refrigerant flowing through the path 60b. The heat exchanger 50 is configured by, for example, a plate heat exchanger or the like, but may be configured by a microchannel heat exchanger capable of exchanging heat between fluids with a relatively small temperature difference. Thereby, energy efficiency can be improved.

The acidic compound separated by the gas treatment device 10 is not particularly limited as long as the aqueous solution becomes acidic, and examples thereof include hydrogen chloride, carbon dioxide, sulfur dioxide, and carbon disulfide.

The treatment liquid used in the gas treatment apparatus 10 is an absorbent capable of reversibly absorbing and desorbing acidic compounds. The treatment liquid is, for example, an alkaline absorbent containing water, an amine compound and an organic solvent. Desirably, the amine compound is 30 wt%, the organic solvent is 60 wt%, and water is 10 wt%.

Examples of amine compounds include 2-aminoethanol (MEA: solubility parameter=14.3 (cal/cm ³ ) ^1/2 ), 2-(2-aminoethoxy)ethanol (AEE: solubility parameter=12.7 ( cal/cm ³ ) ^1/2 ), primary amines such as 2-(methylamino)ethanol (MAE), 2-(ethylamino)ethanol (EAE), 2-(butylamino)ethanol (BAE), etc. secondary amines such as triethanolamine (TEA), N-methyldiethanolamine (MDEA), tetramethylethylenediamine (TEMED), pentamethyldiethylenetriamine (PMDETA), hexamethyltriethylenetetramine, bis(2-dimethylaminoethyl) ether, etc. and tertiary amines of.

Examples of organic solvents include 1-butanol (solubility parameter=11.3 (cal/cm ³ ) ^1/2 ), 1-pentanol (solubility parameter=11.0 (cal/cm ³ ) ^1/2 ), octanol , diethylene glycol diethyl ether (DEGDEE), diethylene glycol dimethyl ether (DEGDME), etc., and a plurality of types may be mixed and used.

Next, a gas processing method using the above gas processing apparatus 10 will be described. The gas treatment method includes an absorption method in which the acidic compounds contained in the gas to be treated are absorbed into the treated liquid in the absorption device 20, and a regeneration method in which the acidic compounds are released from the treated liquid by heating in the regeneration device 30.

In the absorption method, the treatment liquid is supplied from the second channel 42 to the absorption device 20 in a state in which the reaction heat recovery device 60a and the plurality of baffle plates 70 are immersed in the treatment liquid in the main body 22 (absorbing section 28). be. That is, the processing liquid introduced from the second channel 42 is supplied into the absorption section 28 through the processing liquid supply port 13 b of the processing liquid supply path 13 . At this time, the processing liquid supply port 13b is in a state of being soaked with the processing liquid in the absorbing section . The processing liquid in the absorbing portion 28 overflows from the upper end opening 22 c of the absorbing portion 28 and flows into the space S<b>1 of the widened portion 23 . That is, the side portion 22b of the absorbing portion 28 (main body portion 22) positioned inside the widened portion 23 serves as a weir for storing the processing liquid in the absorbing portion 28 until the processing liquid overflows from the upper end opening 22c into the space S1. fulfill

Further, in the absorber 20, the gas to be treated is supplied while the treatment liquid is being supplied. That is, the gas to be treated is supplied through the gas supply path 11 from the lower end of the reaction heat recovery device 60a or from the vicinity of the lower end. Also, the amount of liquid refrigerant introduced from the inlet chamber 24 into the reaction heat recovery device 60 a is controlled by the refrigerant amount control unit 78 based on the flow rate of the gas to be treated measured by the gas flow meter 77 .

When the gas to be treated is supplied into the liquid to be treated, the gas to be treated and the liquid to be treated come into contact with each other, and the acid compounds in the gas to be treated are absorbed by the liquid. Specifically, in a state in which the processing liquid is stored in the absorbing section 28, the gas to be processed in the form of bubbles rises in the processing liquid from the lower end portion or the vicinity of the lower end portion of the reaction heat recovery device 60a due to buoyancy. In this embodiment, the to-be-processed gas rises meanderingly in the process liquid by a plurality of baffle plates 70 . As a result, the contact time between the treatment liquid and the treatment gas is longer than when the treatment gas immediately rises in the treatment liquid. Therefore, many acidic compounds in the gas to be treated are absorbed by the treatment liquid.

The reaction when the treatment liquid absorbs the acidic compounds in the gas to be treated is an exothermic reaction, and heat of reaction is generated. The reaction heat recovery device 60a recovers this reaction heat. That is, of the refrigerant introduced into the reaction heat recovery device 60a from the inlet chamber 24, the liquid refrigerant is vaporized by the reaction heat to become a gaseous refrigerant, whereby the reaction heat recovery device 60a recovers the reaction heat. do. The gaseous refrigerant is discharged to the outlet chamber 25 from the reaction heat recovery device 60a. Since the residence time of the gas to be treated in the treatment liquid is lengthened by the plurality of baffle plates 70, more reaction heat can be recovered by the reaction heat recovery device 60a.

In addition, in the present embodiment, since the range of the supply pipe in which the processing liquid supply port 13b is formed and the reaction heat recovery device 60a overlap when viewed from above, the reaction heat recovery device 60a passes through the processing liquid supply port 13b. The processing liquid is supplied over the entire width dimension of the . Therefore, the lean treatment liquid and the gas to be treated can be brought into contact in the vicinity of the reaction heat recovery device 60a, and the reaction heat can be recovered by the reaction heat recovery device 60a.

The treatment liquid that has come into contact with the gas to be treated undergoes phase separation into a first phase portion having a high acid compound content and a second phase portion having a low acid compound content. The specific gravity of the second phase portion is less than the specific gravity of the first phase portion. Therefore, the second phase portion moves toward the upper portion of the absorbing portion 28, overflows from the upper end opening 22c of the absorbing portion 28, flows into the space S1 in the widened portion 23, and accumulates in the space S1. The processing liquid mainly containing the second phase portion is taken out from the widened portion 23 through the second discharge portion 15 . On the other hand, the first phase portion is directed to the lower portion of the absorption section 28 , and the treatment liquid containing mainly the first phase portion is taken out from the absorption section 28 through the first discharge section 14 . In this way, the second phase portion having a specific gravity smaller than that of the first phase portion overflows from the absorption portion 28 and is introduced into the space S1 of the widening portion 23, whereby the treatment liquid mainly containing the second phase portion is discharged to the second discharge portion. 15 can be removed from the absorber 28 , and the treatment liquid containing mainly the first phase portion can be removed from the absorber 28 through the first outlet 14 . Therefore, it is possible to stabilize the ratio of the first phase portion to the second phase portion in the treatment liquid containing the first phase portion and the second phase portion taken out from the absorbing section 28 .

Next, the treatment liquid that has undergone liquid phase separation in the absorption device 20 is sent to the regeneration device 30 . Specifically, the treated liquid mainly containing the first phase portion taken out from the absorbing portion 28 through the first discharge portion 14 and the treated liquid mainly containing the second phase portion taken out from the absorbing portion 28 through the second discharging portion 15 are combined and sent to the regeneration device 30 through the first flow path 41 by the pump 55 . That is, the entire amount of the treatment liquid taken out from the absorption device 20 is introduced into the regeneration device 30 . The treatment liquid is heated by heat exchanger 50 before being introduced into regenerator 30 .

The gaseous refrigerant discharged from the reaction heat recovery device 60 a to the outlet chamber 25 is compressed by the compressor 60 c and flows into the condenser 60 f in the heat exchanger 50 . The gaseous refrigerant flowing in the condenser 60f heats the processing liquid flowing in the first flow path 41, thereby lowering its temperature and condensing. This condensed liquid refrigerant is sent by the pump 60d, expanded by the expansion mechanism 60e, and flows through the inlet chamber 24 into the reaction heat recovery device 60a. Due to such circulation of the refrigerant, the treatment liquid sent to the regenerator 30 is heated by the reaction heat of the absorber 20 . Therefore, the regeneration energy required for regeneration can be reduced by using the heat transfer section 60 . Incidentally, the pump 60d can be omitted.

In the regeneration method, the processing liquid introduced into the regeneration device 30 is heated to separate the acidic compound from the processing liquid. In the regenerator 30, the treatment liquid in which the first phase portion and the second phase portion are mixed flows down and is heated. This separates the acidic compounds from the treatment liquid. Furthermore, water vapor evaporated from the processing liquid may be obtained. Acidic compounds and water vapor separated from the treatment liquid flow through the supply channel 80 . In supply line 80 the water vapor condenses in condenser 84 and is returned to regenerator 30 . Therefore, only the acidic compounds separated from the treatment liquid are supplied to the supply destination. The processing liquid stored in the regeneration device 30 flows through the second flow path 42 and returns to the absorption device 20 . Since the heat of the processing liquid flowing through the second flow path 42 is used in the heat exchanger 50 to heat the processing liquid flowing through the first flow path 41, the temperature of the processing liquid decreases.

In addition, by introducing the entire processing liquid including the processing liquid including the first phase portion and the processing liquid including the second phase portion into the regeneration device 30 to return to the one-phase processing liquid, the processing liquid returned to the one-phase WHEREIN: The ratio of the solvent contained in a 1st phase part and a solvent contained in a 2nd phase part can be stabilized. For example, when the treatment liquid is an alkaline absorbent containing water, an amine compound and an organic solvent, the ratio of water, amine compound and organic solvent can be stabilized.

As described above, in the first embodiment, the processing liquid is stored in the absorption container 21, and the gas to be processed passes through the gas supply path 11 at a position within the height range of the reaction heat recovery device 60a immersed in the processing liquid. A gas is supplied into the processing liquid. Therefore, it is possible to prevent the gas to be treated from passing through the absorption container 21 without coming into contact with the treatment liquid. Therefore, the heat of reaction increases due to the sufficient reaction between the treatment liquid and the acidic compounds in the gas to be treated, so that the amount of reaction heat recovered by the reaction heat recovery device 60a can be increased. Since the processing liquid is stored in the absorption vessel 21 so that the reaction heat recovery device 60a is immersed in the processing liquid, exposure of the absorption vessel 21 from the processing liquid can be suppressed even when the liquid surface fluctuates. can be done. That is, since the absorption container 21 can be maintained in a state of being immersed in the treatment liquid, a decrease in the amount of reaction heat recovered by the absorption container 21 can be suppressed.

In addition, since the processing liquid is supplied from the processing liquid supply port 13b arranged between the surface of the processing liquid and the upper end of the reaction heat recovery device 60a, the reaction heat generated in the vicinity of the processing liquid supply port 13b is easily transmitted to the reaction heat recovery device 60a. Therefore, the amount of reaction heat recovered by the reaction heat recovery device 60a can be increased. That is, a lean treatment liquid having a high absorption rate of acidic compounds in the gas to be treated is supplied to the absorption container 21 from the treatment liquid supply port 13b. Therefore, in the vicinity of the processing liquid supply port 13b, the processing liquid absorbs a large amount of acidic compounds in the gas to be processed, thereby generating a large amount of reaction heat. Therefore, compared to the case where the processing liquid supply port 13b is arranged above the liquid surface of the processing liquid, the reaction heat generated in the vicinity of the processing liquid supply port 13b is efficiently transferred to the reaction heat recovery device 60a. It is well communicated and more reaction heat can be recovered by the reaction heat recoverer 60a. Further, the amount of reaction heat recovered by the reaction heat recovery device 60a can also be increased by increasing the contact time between the treatment liquid and the gas to be treated by means of the plurality of baffle plates 70 .

Further, in the present embodiment, since the processing liquid supply path 13 extends from the connection portion 16 with the widened portion 23 into the absorption portion 28, even when the connection portion 16 is separated from the reaction heat recovery device 60a, the processing liquid The supply port 13b can be brought closer to the reaction heat recovery device 60a than the connecting portion 16. Therefore, the treatment liquid can be supplied to a position closer to the reaction heat recovery device 60a, so that the amount of reaction heat recovered by the reaction heat recovery device 60a can be increased.

Furthermore, since the reaction heat recovery device 60a stands vertically, the heat of reaction due to the contact between the treatment liquid and the gas to be treated is transferred to the vertical length range of the reaction heat recovery device 60a along the direction in which the gas to be treated rises. can be sufficiently recovered over a period of time.

In addition, since the absorber 20 is configured in a vertically long tower shape, the time for which the gas to be treated contacts the liquid to be treated can be lengthened, so that more heat of reaction is generated and recovered. can do.

(Second embodiment)
FIG. 2 shows a second embodiment of the invention. Here, the same reference numerals are given to the same components as in the first embodiment, and detailed description thereof will be omitted. The absorber 20 according to the second embodiment differs from the absorber 20 according to the first embodiment in the position of the treatment liquid supply port 13b.

The processing liquid supply port 13b may be arranged so as to be lower than the liquid surface of the processing liquid in the main body 22 (absorbing section 28). The supply port 13b is arranged within the height range of the reaction heat recovery device 60a. That is, the processing liquid supply port 13b is arranged between the upper end portion and the lower end portion of the reaction heat recovery device 60a. By bringing the processing liquid supply port 13b close to the reaction heat recovery device 60a, the amount of reaction heat recovered by the reaction heat recovery device 60a can be increased.

In the present embodiment, the second flow path 42 is positioned within the height range of the reaction heat recovery device 60a in the main body 22 so that the processing liquid supply port 13b is arranged within the height range of the reaction heat recovery device 60a. (connecting portion 16). The supply channel body portion 13 a is connected to the second flow path 42 at the connection portion 16 and extends from the connection portion 16 into the body portion 22 . The processing liquid supply port 13b opens at the tip of the supply path main body 13a and is positioned within the height range of the reaction heat recovery device 60a. The supply channel body 13a and the processing liquid supply port 13b are arranged so as not to interfere with the reaction heat recovery device 60a. That is, in the example of FIG. 2, the supply path main body portion 13a extends from the connecting portion 16 to the inside of the reaction heat recovery device 60a so as not to interfere with the reaction heat recovery device 60a, and the processing liquid supply port 13b extends to the inside of the reaction heat recovery device 60a. located inside the vessel 60a. However, the present invention is not limited to this, and the supply path body portion 13a may extend from the connection portion 16 to the front of the reaction heat recovery device 60a, and the processing liquid supply port 13b may be positioned before the reaction heat recovery device 60a. In addition, in the example of FIG. 2, the processing liquid supply port 13b is one opening, but it may be a plurality of openings. Also, in the example of FIG. 2, the orientation of the opening of the processing liquid supply port 13b is horizontal, but it may be downward.

As shown in FIG. 3, the processing liquid supply port 13b may be arranged at or near the lower end of the reaction heat recovery device 60a, that is, near the bottom portion 22a in the absorption portion . As a result, both the liquid to be treated and the gas to be treated having a high acid compound absorption rate are supplied from the lower end or near the lower end of the reaction heat recovery device 60a. As a result, the processing liquid can absorb the acidic compound at or near the lower end of the reaction heat recovery device 60a, and the reaction heat generated by this absorption can be recovered by the reaction heat recovery device 60a.

It should be noted that the plurality of processing liquid supply ports 13b are not limited to the form shown in FIGS. For example, one processing liquid supply port 13b is arranged between the surface of the processing liquid and the upper end of the reaction heat recovery device 60a, and the other processing liquid supply port 13b is located at the lower end or lower end of the reaction heat recovery device 60a. may be located nearby.

(Third Embodiment)
FIG. 4 shows a third embodiment of the invention. Here, the same reference numerals are given to the same components as in the first embodiment, and detailed description thereof will be omitted. In the absorber 20 according to the first embodiment, the main body 22 corresponds to the absorber 28 which is filled with the treatment liquid in a state in which the reaction heat recovery device 60a is accommodated and which is open upward. The absorbent device 20 is different in that the separation wall 100 arranged in the body portion 22 functions as the absorbent portion 28 .

The widened portion 23 is connected to the main body portion 22 so that the upper end of the main body portion 22 and the lower end portion 23a of the widened portion 23 are continuous.

A separation wall 100 is arranged inside the body portion 22 and the widened portion 23 . The separation wall 100 is configured in a vertically elongated cylindrical shape that opens upward and downward. The width of the separation wall 100 is smaller than the width of the side portion 22b of the body portion 22, and the separation wall 100 is spaced apart from the inner surface of the side portion 22b of the body portion 22 and the inner surface of the side portion 23b of the widened portion 23. . A space S<b>1 is provided between the outer surface of the separation wall 100 and the inner surface of the side portion 22 b of the main body portion 22 and the inner surface of the side portion 23 b of the widened portion 23 . A space S<b>2 is provided between the upper end of the separation wall 100 and the inner surface of the upper portion 23 c of the widened portion 23 . The separation wall 100 is arranged such that the upper end of the separation wall 100 is higher than the upper end of the main body portion 22 and the lower end portion 23 a of the widened portion 23 . The upper end of the separation wall 100 is configured as a weir for overflowing the processing liquid inside the separation wall 100 , that is, inside the absorption section 28 . A lower end of the separation wall 100 is separated from the inner surface of the bottom portion 22 a of the main body portion 22 . It is also possible to extend the processing liquid supply path 13 to the lower end of the separation wall 100 by using this isolated space, and insert the processing liquid supply port 13b into the separation wall 100 from the lower end of the separation wall 100 .

A reaction heat recovery device 60a is arranged in the interior surrounded by the separation wall 100 . In other words, the separation wall 100 constitutes the absorption section 28 which is filled with the processing liquid in a state in which the reaction heat recovery device 60a is accommodated and which opens upward. That is, the absorption container 21 has an absorption part 28 . The reaction heat recovery device 60a is almost entirely inserted into the separation wall 100 (absorbing section 28) in a manner that it stands vertically in an inverted U shape from the inner surface of the bottom section 22a of the main body section 22. As shown in FIG.

In the interior surrounded by the separation wall 100, the processing liquid supply port 13b is arranged between the surface of the processing liquid and the upper end of the reaction heat recovery device 60a.

A plurality of oblique baffle plates 110 are attached to the inner surface of the separation wall 100 . The plurality of oblique baffle plates 110 constitute a meandering portion that causes the flow of the fluid containing the gas to be treated and the liquid to be treated in the main body portion 22 to meander in a spiral manner. In the example of FIG. 4, each oblique baffle plate 110 is made of a metal plate having a plurality of holes. For example, each plate member is made of plate-shaped SUS having holes. A bundle of tubes constituting the reaction heat recovery device 60a passes through the hole of the oblique baffle plate 110 . In this embodiment, vertically adjacent plate members are supported in an inclined state on the inner wall of the separation wall 100 so that the directions of inclination are different from each other. The plurality of oblique baffle plates 110 may be attached to the separation wall 100 so as to contact the reaction heat recovery device 60a. In FIG. 4, the oblique baffle plate 110 indicated by the solid line is located on the front side of the paper with respect to the plane passing through the centerline of the absorber 20 in plan view, while the oblique baffle plate 110 indicated by the broken line passes through the centerline. It is positioned on the back side of the paper surface with respect to the plane.

The second ejection part 15 is located higher than the first ejection part 14 in the vertical direction, and is connected to a position communicating with the space S1. In this embodiment, the second ejection portion 15 is connected to the side portion 22b of the body portion 22 and the side portion 23b of the widened portion 23 . The second ejection portion 15 may be connected to at least one of the side portion 22b of the body portion 22 and the side portion 23b of the widened portion 23. As shown in FIG.

The processing liquid is supplied into the absorption section 28 through the processing liquid supply port 13b while the reaction heat recovery device 60a and the plurality of oblique baffle plates 110 are immersed in the processing liquid within the separation wall 100 (absorption section 28). When the gas to be processed is supplied from the gas supply path 11 to the processing liquid in this state, the gas to be processed passes through the plurality of holes of the plurality of oblique baffle plates 110 and rises in the processing liquid while being dispersed. In the present embodiment, the gas supply path 11 supplies the gas to be processed into the absorption section 28 from two opposite directions in a cross-sectional view. When the treatment liquid and the gas to be treated come into contact with each other, the treatment liquid absorbs the acidic compounds in the gas to be treated and undergoes liquid phase separation into a first phase portion and a second phase portion. The heat of reaction generated by this absorption is recovered by the reaction heat recoverer 60a. Since the plurality of oblique baffle plate dispersing sections 110 meander the absorbing liquid and the gas to be treated spirally, the retention time of the absorbing liquid and the gas to be treated in the absorption section 28 can be ensured, and the reaction heat recovery device 60a for the reaction heat can be obtained. The heat transfer rate to is improved. This increases the contact area between the treatment liquid and the gas to be treated. Therefore, a large amount of the acid compound in the gas to be treated is absorbed by the treatment liquid, so that a large amount of reaction heat can be generated. When the plurality of oblique baffle plates 110 are in contact with the reaction heat recovery device 60a, the heat recovered by the plurality of oblique baffle plates 110 can be transferred to the reaction heat recovery device 60a. The liquid phase-separated second phase portion overflows from the upper opening of the absorbing portion 28, flows into the space S1, and accumulates in the space S1. The processing liquid containing mainly the second phase portion is taken out from the second discharge portion 15 , and the processing liquid containing mainly the first phase portion is taken out from the first discharge portion 14 .

In the third embodiment as well, the processing liquid supply ports 13b may be arranged at the positions shown in FIGS. may be provided.

In addition, in the first and second embodiments, a plurality of oblique baffle plates 110 may be provided instead of the plurality of baffle plates 70 . Also, in the third embodiment, a plurality of baffle plates 70 may be provided instead of the plurality of oblique baffle plates 110 .

In addition, the present invention is not limited to the above-described embodiments, and for example, the following aspects can be employed.

(A) Regarding the meandering portion The plurality of baffle plates 70 are not limited to being attached to the inner wall surface of the main body portion 22 (absorbing portion 28) as shown in the first and second embodiments. may be attached to the In the example of FIG. 5, the plurality of baffle plates 70 includes a first baffle plate portion 70a attached to the reaction heat recovery device 60a and a second baffle plate portion 70b attached to the inner wall surface of the absorber 28. . The first baffle plate portion 70a is attached across one tube and the other tube of the inverted U-shape of the reaction heat recovery device 60a. The first baffle plate portion 70a is not attached to the inner wall surface of the absorbing portion 28. As shown in FIG. The second baffle plate portion 70b extends from one of the inner wall surfaces facing each other in the absorbing portion 28 until it vertically overlaps the first baffle plate portion 70a. Thereby, a meandering flow path is formed in the absorbing portion 28 .

(B) Heat Transfer Section The condenser 60f of the heat transfer section 60 may be arranged in the regeneration device 30 as shown in FIG. Of the refrigerant led out from the reaction heat recovery device 60a to the outlet chamber 25, the liquid refrigerant is heated by the reaction heat of the exothermic reaction and vaporized. Gaseous refrigerant is compressed by the compressor 60c and flows into the condenser 60f. The gaseous refrigerant flowing inside the condenser 60 f is condensed by the endothermic reaction inside the regenerator 30 . This condensed liquid refrigerant is sent by the pump 60d, expanded by the expansion mechanism 60e, and flows through the inlet chamber 24 into the reaction heat recovery device 60a. Thus, the heat of reaction of the absorber 20 is transported to the regenerator 30 by circulation of the refrigerant. By using the heat transfer section 60, the regeneration energy required for regeneration can be reduced.

(C) Others In the above-described embodiment, the plurality of baffle plates 70, the liquid level meter 75, the processing liquid amount control section 76, the gas flow meter 77 and the refrigerant amount control section 78 can be omitted as appropriate. Moreover, the inlet chamber 24 and the outlet chamber 25 can also be omitted as long as the refrigerant can be circulated to the reaction heat recovery device 60a.

Reference Signs List 10: gas treatment device 11: gas supply path 13: treatment liquid supply path 13b: treatment liquid supply port 14: first discharge section 15: second discharge section 16: connection portion 20: absorption device 21: absorption container 22: main body 24 : inlet chamber 25 : outlet chamber 28 : absorption section 41 : first channel 42 : second channel 60a : reaction heat recovery device 70 : baffle plate 100 : separation wall 110 : oblique baffle plate

Claims (12)

An absorption apparatus for bringing a gas to be treated containing an acidic compound into contact with a treatment liquid that undergoes phase separation due to absorption of the acidic compound, and causing the treatment liquid to absorb the acidic compound,
a container;
a processing liquid supply path having a processing liquid supply port that opens in the container and supplying the processing liquid into the container;
a reaction heat recovery device disposed in the container so as to be immersed in the processing liquid, and recovering reaction heat generated when the processing liquid absorbs the acidic compound;
a gas supply path for supplying the gas to be treated from a position within the height range of the reaction heat recovery device to the inside of the container;
The absorber, wherein the processing liquid supply port is arranged so as to be located below the surface of the processing liquid during operation. The absorber of claim 1, wherein
The absorber, wherein the processing liquid supply port is arranged at a position closer to the reaction heat recovery device than a connecting portion where the processing liquid supply path is connected to the vessel. 3. The absorber according to claim 1 or 2,
The absorber, wherein the processing liquid supply port is located between the liquid surface and the upper end of the reaction heat recovery device. 3. The absorber according to claim 1 or 2,
The absorber, wherein the processing liquid supply port is arranged within a height range of the reaction heat recovery device. An absorber according to any one of claims 1, 2 or 4,
The absorber, wherein the processing liquid supply port is arranged at or near the lower end of the reaction heat recovery device. The absorber according to any one of claims 1 to 5,
The absorber further comprises a meandering part arranged to be immersed in the treatment liquid inside the container and causing the to-be-treated gas to meander and rise in the treatment liquid. The absorber according to any one of claims 1 to 6,
In the vessel, the treatment liquid in contact with the gas to be treated is composed of a first phase portion having a high acid compound content and a second phase having a low acid compound content and a lower specific gravity than the first phase portion. phase-separated into a portion and
The absorbing device, wherein the container has a first discharge section and a second discharge section arranged at a position higher than the first discharge section in the vertical direction. An absorber according to claim 7,
The container has an absorption part filled with the treatment liquid in a state in which the reaction heat recovery device is accommodated and is open upward,
The second discharge section discharges the processing liquid containing the second phase portion overflowing from the absorption section, and the first discharge section discharges the processing liquid other than the processing liquid discharged through the second discharge section. Absorber. The absorber according to any one of claims 1 to 8,
further comprising an inlet chamber for introducing a refrigerant for recovering the reaction heat into the reaction heat recovery device and an outlet chamber for leading the refrigerant from the reaction heat recovery device, which are connected to the outer surface of the bottom of the vessel;
The reaction heat recovery device has an inverted U-shaped tube vertically standing from the inner surface of the bottom, one end of the tube communicating with the inlet chamber, and the other end of the tube. an absorber in which a section communicates with said outlet chamber. an absorber according to any one of claims 1 to 9;
a regenerating device for heating the treatment liquid in contact with the gas to be treated to separate the acidic compound;
a liquid sending unit that sends the treatment liquid that has come into contact with the gas to be treated in the container to the regeneration device. An absorption method in which a gas to be treated containing an acidic compound and a treatment liquid that undergoes phase separation due to absorption of the acidic compound are brought into contact in a container to absorb the acidic compound in the treatment liquid,
supplying the processing liquid from a processing liquid supply port positioned below the liquid surface of the processing liquid to the processing liquid stored in the container with the reaction heat recovery device immersed therein;
supplying the gas to be treated from a position within the height range of the reaction heat recovery device to the treatment liquid stored inside the container;
The absorption method, wherein reaction heat generated when the treatment liquid absorbs the acidic compound in the gas to be treated is recovered by the reaction heat recovery device. a liquid feeding step of sending the treated liquid in which the acidic compound contained in the gas to be treated is absorbed by the absorption apparatus according to claim 11 from the absorption apparatus to the regeneration apparatus;
and a regeneration step of heating the treated liquid to separate the acidic compound from the treated liquid in the regeneration device.

Images