WO2021124938A1 - Curable composition - Google Patents

Curable composition Download PDF

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Publication number
WO2021124938A1
WO2021124938A1 PCT/JP2020/045359 JP2020045359W WO2021124938A1 WO 2021124938 A1 WO2021124938 A1 WO 2021124938A1 JP 2020045359 W JP2020045359 W JP 2020045359W WO 2021124938 A1 WO2021124938 A1 WO 2021124938A1
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Prior art keywords
silicate
curable composition
group
formula
weight
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PCT/JP2020/045359
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French (fr)
Japanese (ja)
Inventor
大祐 伊藤
吉田 司
田井 利弘
直樹 高尾
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株式会社ダイセル
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Publication of WO2021124938A1 publication Critical patent/WO2021124938A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/36Amides or imides
    • C08F22/40Imides, e.g. cyclic imides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/34Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
    • C08G65/48Polymers modified by chemical after-treatment
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate

Definitions

  • the present disclosure relates to a curable composition and a cured or semi-cured product thereof.
  • the present application claims the priority of Japanese Patent Application No. 2019-229223 filed in Japan on December 19, 2019, the contents of which are incorporated herein by reference.
  • Engineering plastics are plastics with improved heat resistance and mechanical properties, and are heavily used as essential materials for miniaturization, weight reduction, high performance, and high reliability of various parts.
  • engineering plastics have a problem of poor workability because they have a high melting temperature and low solvent solubility.
  • the polyimide described in Patent Document 1 and the like has excellent heat resistance and strength characteristics, but is sparingly soluble and sparingly meltable, so that it cannot be melt-molded or used as a matrix resin for composite materials. It was difficult.
  • Polyetheretherketone also called super engineering plastic, is a thermoplastic resin having excellent heat resistance, flame retardancy, and electrical characteristics at a continuous use temperature of 260 ° C., but has a melting point of 343 ° C. Therefore, it is particularly difficult to melt and is difficult to dissolve in a solvent, so that it is inferior in processability (for example, Patent Document 2).
  • an object of the present disclosure is to provide a curable composition capable of forming a cured product having heat resistance and flexibility. Another object of the present disclosure is to provide a curable composition capable of forming a cured product having low CTE (coefficient of linear expansion), heat resistance, and flexibility. Another object of the present disclosure is to provide a curable composition capable of forming a cured product having excellent processability, low CTE, heat resistance, and flexibility. Another object of the present disclosure is to provide a semi-cured product capable of forming a cured product having heat resistance and flexibility. Another object of the present disclosure is to provide a semi-cured product capable of forming a cured product having low CTE, heat resistance, and flexibility.
  • Another object of the present disclosure is to provide a cured product having heat resistance and flexibility. Another object of the present disclosure is to provide a cured product having low CTE, heat resistance, and flexibility. Another object of the present disclosure is to provide a laminate in which the cured product is laminated on a substrate. Another object of the present disclosure is to provide an electronic device comprising the laminate.
  • the present disclosure provides a curable composition containing a curable compound and a silicate, wherein the content of the silicate is 0.01 to 95 parts by weight with respect to 100 parts by weight of the curable compound.
  • the present disclosure also provides the curable composition in which the silicate is a flaky silicate.
  • the present disclosure also provides the curable composition in which the silicate has the following properties 1 and 2.
  • Characteristic 1 A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises.
  • Characteristic 2 Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface.
  • the billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes. Does not cause swelling on the surface of
  • the present disclosure also provides the curable composition in which the maximum diameter L 1 of the silicate, the diameter L 2 orthogonal to the maximum diameter L 1 , and the thickness W satisfy the following formulas (a) and (b). To do. 0.2L 1 ⁇ L 2 ⁇ L 1 (a) 0.001L 1 ⁇ W ⁇ 0.08L 1 (b)
  • the present disclosure also provides the curable composition in which the silicate is a lipophilic silicate.
  • the present disclosure also provides the curable composition in which the silicate comprises an alkali metal.
  • the present disclosure also provides the curable composition having a magnesium content of silicate of 10% by weight or more.
  • the present disclosure also provides the curable composition in which the silicate is flaky silicate and the sodium content is less than 3.0% by weight.
  • the present disclosure also provides the curable composition in which the silicate is a flaky silicate and the potassium content is 1.0% by weight or more.
  • the present disclosure also provides the curable composition in which the silicate is a flaky silicate and the aluminum content is 0.5% by weight or more.
  • the present disclosure also provides the curable composition in which the silicate contains a fluorine atom.
  • the present disclosure also provides the curable composition in which the silicate is mica.
  • the curable compound is also described in the following formula (1).
  • R 1 and R 2 indicate the same or different curable functional groups, and D 1 and D 2 indicate the same or different single bond or linking group.
  • L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
  • Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group.
  • X indicates -CO-, -S-.
  • the present disclosure also provides the curable composition in which R 1 and R 2 in the formula (1) are the same or different curable functional groups having a cyclic imide structure.
  • R 1 and R 2 in the formula (1) are the same or different groups selected from the groups represented by the following formulas (r-1) to (r-6).
  • a curable composition is provided. (The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
  • the present disclosure also provides a cured product of the curable composition.
  • the present disclosure also provides a semi-cured product of the curable composition.
  • the present disclosure also provides a laminate having a structure in which the cured product is laminated on a substrate.
  • the present disclosure also provides the laminate in which the substrate is a copper substrate.
  • the present disclosure also provides an electronic device having a printed circuit board with conductor wiring on a substrate made of a cured product of the curable composition.
  • the curable composition of the present disclosure can be heated to obtain a cured product having heat resistance and flexibility.
  • the cured product preferably has a low CTE and has a heat ray expansion integer comparable to that of copper. Therefore, the laminated body in which the cured product is laminated on the copper substrate prevents the laminated body from being curled due to the shrinkage of the cured product even when exposed to a high temperature environment. Can be done. Therefore, the curable composition can be suitably used, for example, as a raw material for an electronic circuit substrate to which copper wiring is applied.
  • the curable composition of the present disclosure is a curable composition containing a curable compound and a silicate.
  • the curable compound is a compound capable of forming a cured product by subjecting it to heat treatment.
  • a compound represented by the following formula (1) is preferable in that the melting temperature is low, the solvent solubility is excellent, the usability is excellent, and the cured product has super heat resistance.
  • R 1 and R 2 represent the same or different curable functional group, and D 1 and D 2 represent the same or different single bond or linking group.
  • L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
  • Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group.
  • X indicates -CO-, -S-. , Or -SO 2- , Y indicates the same or different, -S-, -SO 2- , -O-, -CO-, -COO-, or -CONH-.
  • N is 0 or more. Indicates an integer
  • R 1 and R 2 represent curable functional groups.
  • R 1 and R 2 may be the same or different from each other.
  • a curable functional group having a cyclic imide structure such as a group represented by the following formula (r) is preferable. (The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
  • Q represents C or CH.
  • the two Qs in the formula are bonded via a single bond or a double bond.
  • n' is an integer of 0 or more (for example, an integer of 0 to 3, preferably 0 or 1).
  • R 3 to R 6 are the same or different, and have a hydrogen atom, a saturated or unsaturated aliphatic hydrocarbon group (preferably an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and 2 to 10 carbon atoms).
  • aromatic hydrocarbon groups preferably aryl groups having 6 to 10 carbon atoms such as phenyl groups and naphthyl groups
  • saturated or unsaturated aliphatic hydrocarbon groups and aromatic hydrocarbon groups Indicates a group to which two or more selected groups are bonded.
  • the two groups selected from R 3 to R 6 may be bonded to each other to form a ring with adjacent carbon atoms.
  • Examples of the ring in which two groups selected from R 3 to R 6 may be bonded to each other to form together with adjacent carbon atoms include, for example, an alicyclic having 3 to 20 carbon atoms and 6 to 14 carbon atoms. Aromatic rings can be mentioned.
  • the alicyclic having 3 to 20 carbon atoms has, for example, about 3 to 20 members (preferably 3 to 15 members, particularly preferably 5 to 8 members) such as a cyclopropane ring, a cyclobutane ring, a cyclopentane ring, and a cyclohexane ring.
  • Cycloalkane ring cycloalkene ring having about 3 to 20 members (preferably 3 to 15 members, particularly preferably 5 to 8 members) such as cyclopentene ring and cyclohexene ring; perhydronaphthalene ring, norbornane ring, norbornene ring, adamantane. Ring, tricyclo [5.2.1.0 2,6 ] decane ring, tetracyclo [4.4.0.1 2,5 . 17 and 10 ] Cross-linked cyclic hydrocarbon groups such as dodecane rings are included.
  • the aromatic ring having 6 to 14 carbon atoms includes a benzene ring, a naphthalene ring and the like.
  • a curable functional group having a cyclic imide structure a curable functional group having a cyclic unsaturated imide structure or a curable functional group having a cyclic imide structure having an arylethynyl group is preferable, and particularly preferably. It is a group selected from the groups represented by the following formulas (r-1) to (r-6), and particularly preferably a group represented by the following formula (r-1) or (r-5). (The bond extending from the nitrogen atom in the formula binds to D 1 or D 2 in the formula (1))
  • One or more substituents may be bonded to the groups represented by the formulas (r-1) to (r-6).
  • substituents include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom and the like.
  • alkyl group having 1 to 6 carbon atoms examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group, a t-butyl group, a pentyl group, a hexyl group and the like.
  • Chain-like or branched chain-like alkyl groups can be mentioned.
  • alkoxy group having 1 to 6 carbon atoms examples include a linear or branched alkoxy group such as a methoxy group, an ethoxy group, a butoxy group, and a t-butyloxy group.
  • D 1 and D 2 represent a single bond or a linking group, which are the same or different.
  • the linking group include a divalent hydrocarbon group, a divalent heterocyclic group, a carbonyl group, an ether bond, an ester bond, a carbonate bond, an amide bond, an imide bond, and a group in which a plurality of these are linked. Can be mentioned.
  • the divalent hydrocarbon group includes a divalent aliphatic hydrocarbon group, a divalent alicyclic hydrocarbon group, and a divalent aromatic hydrocarbon group.
  • Examples of the divalent aliphatic hydrocarbon group include a linear or branched alkylene group having 1 to 18 carbon atoms and a linear or branched alkaneylene group having 2 to 18 carbon atoms. Can be mentioned.
  • Examples of the linear or branched alkylene group having 1 to 18 carbon atoms include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, a propylene group and a trimethylene group.
  • Examples of the linear or branched alkenylene group having 2 to 18 carbon atoms include a vinylene group, a 1-methylvinylene group, a propenylene group, a 1-butenylene group, a 2-butenylene group and the like.
  • divalent alicyclic hydrocarbon group examples include a divalent alicyclic hydrocarbon group having 3 to 18 carbon atoms, for example, 1,2-cyclopentylene group and 1,3-cyclopenti.
  • Cycloalkylene groups such as len group, cyclopentylidene group, 1,2-cyclohexylene group, 1,3-cyclohexylene group, 1,4-cyclohexylene group, cyclohexylidene group Can be mentioned.
  • divalent aromatic hydrocarbon group examples include an arylene group having 6 to 14 carbon atoms, for example, a 1,4-phenylene group, a 1,3-phenylene group, a 4,4'-biphenylene group, and 3 , 3'-biphenylene group, 2,6-naphthalenediyl group, 2,7-naphthalenediyl group, 1,8-naphthalenediyl group, anthracendiyl group and the like.
  • arylene group having 6 to 14 carbon atoms for example, a 1,4-phenylene group, a 1,3-phenylene group, a 4,4'-biphenylene group, and 3 , 3'-biphenylene group, 2,6-naphthalenediyl group, 2,7-naphthalenediyl group, 1,8-naphthalenediyl group, anthracendiyl group and the like.
  • the heterocycle constituting the divalent heterocyclic group includes an aromatic heterocycle and a non-aromatic heterocycle.
  • a heterocycle includes a 3 to 10-membered ring (preferably 4 to 6-membered) having a carbon atom and at least one heteroatom (for example, an oxygen atom, a sulfur atom, a nitrogen atom, etc.) in the atoms constituting the ring. Rings) and fused rings thereof.
  • a heterocycle containing an oxygen atom as a heteroatom for example, a 3-membered ring such as an oxyran ring; a 4-membered ring such as an oxetane ring; a furan ring, a tetrahydrofuran ring, an oxazole ring, an isooxazole ring, a ⁇ -butyrolactone ring).
  • 5-membered rings such as 4-oxo-4H-pyran ring, tetrahydropyran ring, morpholin ring and the like; benzofuran ring, isobenzofuran ring, 4-oxo-4H-chromen ring, chroman ring, isochroman ring and the like.
  • a 5-membered ring such as a fused ring such as a benzothiophene ring or a heterocycle containing a nitrogen atom as a heteroatom (for example, a pyrrol ring, a pyrrolidine ring, a pyrazole ring, an imidazole ring, a triazole ring, etc.; isocyanul ring, a pyridine ring, a pyridazine
  • 6-membered rings such as a ring, a pyrimidine ring, a pyrazine ring, a piperidine ring, a piperazine ring; an indole ring, an indolin ring, a quinoline ring, an acridin ring, a naphthylidine ring, a quinazoline ring, a fused ring such as a purine ring, etc.
  • the divalent heterocyclic group is a group obtained by removing two hydrogen atoms from the structural formula of the heterocycle.
  • a divalent aromatic hydrocarbon group in that a cured product having particularly excellent heat resistance can be obtained.
  • a divalent aromatic hydrocarbon group having 6 to 14 carbon atoms is preferable, and a group represented by the following formulas (d-1) to (d-4) is more preferable. It is a group selected from, and particularly preferably a group represented by the following formula (d-1) (1,2-phenylene group, 1,3-phenylene group, or 1,4-phenylene group).
  • D 1 and D 2 are at least one group selected from the group consisting of a carbonyl group, an ether bond, an ester bond, a carbonate bond, an amide bond, and an imide bond together with the divalent aromatic hydrocarbon group. Is preferable, and a group in which an ether bond is linked to the divalent aromatic hydrocarbon group is particularly preferable.
  • the R 1- D 1 -group and the R 2- D 2- group in the formula (1) are the same or different and are represented by the following formula (rd-1) or (rd-2).
  • a group containing the above is preferable, and a group represented by the following formula (rd-1-1) or (rd-2-1) is particularly preferable.
  • (A bond extending from a phenylene group or an oxygen atom in the formula binds to L in the formula (1))
  • L in the formula (1) represents a divalent group having a repeating unit including the structure represented by the above formula (I) and the structure represented by the above formula (II).
  • Ars 1 to Ar 3 in the formula (I) and the formula (II) represent the same or different arylene groups, or groups in which two or more arylene groups are bonded via a single bond or a linking group.
  • X is -CO -, - S-, or -SO 2 - indicates, Y are the same or different, -S -, - SO 2 - , - O -, - CO -, - COO-, or -CONH -Indicates.
  • n represents an integer of 0 or more, for example, an integer of 0 to 5, preferably an integer of 1 to 5, and particularly preferably an integer of 1 to 3.
  • aromatic ring include aromatic rings having 6 to 14 carbon atoms such as benzene, naphthalene, anthracene, and phenanthrene.
  • aromatic ring an aromatic ring having 6 to 10 carbon atoms such as benzene and naphthalene is preferable, and as the allylene group, an arylene group having 6 to 10 carbon atoms is preferable.
  • linking group examples include a divalent hydrocarbon group having 1 to 5 carbon atoms, a group in which one or more hydrogen atoms of a divalent hydrocarbon group having 1 to 5 carbon atoms are substituted with halogen atoms, and the like. Can be mentioned.
  • the divalent hydrocarbon group having 1 to 5 carbon atoms includes, for example, a linear or branched alkylene having 1 to 5 carbon atoms such as a methylene group, a methylmethylene group, a dimethylmethylene group, a dimethylene group, and a trimethylene group.
  • a linear or branched alkynylene group or the like is included.
  • As the hydrocarbon group a linear or branched alkylene group having 1 to 5 carbon atoms is preferable, and a branched chain alkylene group having 1 to 5 carbon atoms is particularly preferable.
  • the Ar 1 to Ar 3 are the same or different, and two or more of the arylene groups having 6 to 14 carbon atoms or the arylene groups having 6 to 14 carbon atoms are single bonds and are directly linked to those having 1 to 5 carbon atoms.
  • two or more arylene groups having 6 to 14 carbon atoms or arylene groups having 6 to 14 carbon atoms are single bonds, branched chain alkylene groups having 1 to 5 carbon atoms, or 1 to 5 carbon atoms. It is preferable that one or more of the hydrogen atoms of the branched alkylene group are bonded via a group substituted with a halogen atom.
  • Ars 1 to Ar 3 groups selected from the groups represented by the following formulas (a-1) to (a-5), which are the same or different from each other, are particularly preferable.
  • the position of the joint in the following formula is not particularly limited.
  • an arylene group having 6 to 14 carbon atoms is preferable, and a group represented by the above formula (a-1) or (a-2) is particularly preferable. ..
  • the X in the formula (I) inter alia, -CO- or -SO 2 - it is preferred.
  • the structure represented by the formula (I) preferably includes a structure derived from benzophenone.
  • the proportion of the structure derived from the aromatic ring in the total amount of the compound represented by the formula (1) is 50% by weight or more, for example, 50 to 90% by weight, preferably 60 to 90% by weight, particularly preferably 65 to 80% by weight. Is.
  • the proportion of the structural unit derived from benzophenone in the total amount of the compound represented by the formula (1) is, for example, 5% by weight or more, preferably 10 to 62% by weight, and particularly preferably 15 to 60% by weight.
  • Ar 3 in the formula (II) a group selected from the groups represented by the above formulas (a-1), (a-4), and (a-5) is preferable. Further, as Y, -S-, -O-, or -SO 2- is preferable.
  • the structures represented by the formula (II) include, in particular, hydroquinone, resorcinol, 2,6-naphthalenediol, 2,7-naphthalenediol, 4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenyl ether, 4, It preferably contains a structure derived from at least one compound selected from 4'-dihydroxybenzophenone, 4,4'-dihydroxydiphenylsulfide, 4,4'-dihydroxydiphenylsulphon, and bisphenol A, in particular hydroquinone, resorcinol. , And structures derived from at least one compound selected from bisphenol A.
  • Hydroquinone resorcinol, 2,6-naphthalenediol, 2,7-naphthalenediol, 4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenyl ether, 4,4'in the total amount of the compound represented by the formula (1).
  • the proportion of structural units derived from ⁇ dihydroxybenzophenone, 4,4′-dihydroxydiphenylsulfide, 4,4′-dihydroxydiphenylsulphon, and bisphenol A is, for example, 5% by weight or more, preferably 10 to 55% by weight, particularly preferably. Is 15 to 53% by weight.
  • the proportion of the structural units derived from hydroquinone, resorcinol, and bisphenol A in the total amount of the compound represented by the formula (1) is, for example, 5% by weight or more, preferably 10 to 55% by weight, and particularly preferably 15 to 53. By weight%.
  • a divalent group represented by the following formula (L-1) is preferable in that a cured product having particularly excellent heat resistance can be obtained.
  • the degree of polymerization is, for example, 2 to 50, preferably 3 to 40, more preferably 4 to 30, particularly preferably 5 to 20, and most preferably 5 to 10.
  • m is less than 2
  • the strength and heat resistance of the obtained cured product tend to be insufficient.
  • m is more than 50
  • the melting temperature tends to be high.
  • solvent solubility There is also a tendency for solvent solubility to decrease.
  • the value of m can be obtained by GPC measurement or NMR spectrum analysis.
  • n "in the above formula (L-1) indicates an integer of 0 or more, and Ar 1 to Ar 3 , X, and Y are the same as above.
  • a plurality of Ar 1 in the above formula (L-1). Indicates the same group. The same applies to Ar 2 and Ar 3.
  • the L in the formula (1) is particularly preferably a divalent group represented by the following formula (L-1-1) or (L-1-2).
  • the number of units, that is, the average degree of polymerization is, for example, 2 to 50, preferably 3 to 40, more preferably 4 to 30, particularly preferably 5 to 20, and most preferably 5 to 10.
  • the values of m1 and m2 can be obtained by GPC measurement or NMR spectrum analysis.
  • L in the formula (1) is a divalent group represented by the above formula (L-1-1) or (L-1-2). Since the compounds having m1 and m2 of 5 to 10 in the formula melt at 300 ° C. or lower (about 250 ° C.), they can be melt-molded at a lower temperature than PEEK or the like, and are particularly excellent in processability.
  • the average degree of polymerization of the molecular chains is less than the above range, the obtained cured product tends to be brittle and the mechanical properties tend to deteriorate. Further, when the average degree of polymerization of the molecular chain exceeds the above range, the solubility in a solvent is lowered, the melt viscosity is increased, and the processability tends to be lowered.
  • the number average molecular weight (Mn) of the curable compound is, for example, 1000 to 15000, preferably 1000 to 14000, particularly preferably 1100 to 12000, and most preferably 1200 to 10000.
  • the curable compound having a number average molecular weight has high solubility in a solvent, low melt viscosity, easy molding, and the obtained cured product (or molded product after curing) exhibits high toughness. To do. When the number average molecular weight is less than the above range, the toughness of the obtained cured product tends to decrease.
  • Mn is obtained by subjecting it to gel permeation chromatography (GPC) measurement (solvent: chloroform, standard polystyrene conversion).
  • the curable compound has good solvent solubility.
  • the solvent include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; formamide, acetamide, N-methyl-2-pyrrolidone (NMP), N, N-dimethylformamide, N, N-dimethylacetamide and the like.
  • halogenated hydrocarbons such as methylene chloride, chloroform, 1,2-dichloroethane, chlorobenzene, bromobenzene, dichlorobenzene, benzotrifluoride, hexafluoro-2-propanol; dimethyl sulfoxide (DMSO), diethyl sulfoxide, benzylphenyl sulfoxide Sulfoxides such as: diethyl ether, diisopropyl ether, dibutyl ether, tetrahydrofuran (THF), dioxane, 1,2-dimethoxyethane, cyclopentylmethyl ether and the like; esters such as ethyl acetate; nitriles such as acetonitrile and benzonitrile; benzene, Aromatic hydrocarbons such as toluene and xylene; and a mixture of two or more of these can be mentioned.
  • DMSO dimethyl sul
  • the curable compound is at least one solvent selected from ethers, ketones, amides, halogenated hydrocarbons, and sulfoxides (particularly, at least one selected from ethers, amides, halogenated hydrocarbons, and sulfoxides). It shows excellent solubility in one type of solvent).
  • the solubility of the curable compound in a solvent is, for example, 1 g or more, preferably 5 g or more, particularly preferably 10 g or more, with respect to 100 g of the solvent at 25 ° C.
  • the nitrogen atom content of the curable compound is, for example, 2.8 to 0.1% by weight, preferably 2.5 to 0.15% by weight, more preferably 2.0 to 0.20% by weight, and particularly preferably 2.0 to 0.20% by weight. It is 1.8 to 0.40% by weight, most preferably 1.5 to 0.70.
  • the nitrogen atom content can be determined, for example, by CHN elemental analysis.
  • a curable compound having a nitrogen atom content in the above range can form a cured product having excellent solvent solubility and excellent toughness and heat resistance.
  • the nitrogen atom content is less than the above range, it tends to be difficult to form a cured product having excellent toughness and heat resistance. Further, when the nitrogen atom content exceeds the above range, the solvent solubility tends to decrease.
  • the glass transition temperature (Tg) of the curable compound is, for example, 280 ° C. or lower (for example, 80 to 280 ° C.), preferably 80 to 250 ° C., and particularly preferably 100 to 200 ° C.
  • Tg glass transition temperature
  • the melting temperature is low (that is, when the curable compound is melted, it can be melted by heating at a low temperature), so that the processability is excellent.
  • the Tg of the curable compound exceeds the above range, the melting temperature rises and the processability tends to decrease.
  • the compound represented by the above formula (1) can be produced, for example, by using the synthetic method described in Polymer 1989, p978.
  • An example of a method for producing a compound represented by the above formula (1) is shown below, but the compound represented by the above formula (1) is not limited to that produced by this production method.
  • the compound represented by the following formula (1a) can be produced, for example, through the following steps [1] to [3].
  • Ar 1 to Ar 3 , X, Y, n, R 3 to R 6 , Q, n' are the same as above.
  • D represents a linking group and Z represents a halogen atom.
  • m is the average degree of polymerization of the repeating unit, for example, 3 to 50, preferably 4 to 30, particularly preferably 5 to 20.
  • compounds other than the compound represented by the following formula (1a) can also be produced according to the following method.
  • Examples of the compound represented by the above formula (2) include halides such as benzophenone, 2-naphthylphenyl ketone, and bis (2-naphthyl) ketone, and derivatives thereof.
  • Examples of the compound represented by the above formula (3) include hydroquinone, resorcinol, 2,6-naphthalene diol, 2,7-naphthalene diol, 1,5-naphthalene diol, 4,4'-dihydroxybiphenyl, 4, 4'-dihydroxydiphenyl ether, 4,4'-dihydroxybenzophenone, 4,4'-dihydroxydiphenylsulfide, 4,4'-dihydroxydiphenyl sulfone, bisphenol A, bisphenol F, bisphenol S, 2,5-dihydroxybiphenyl, and these. Derivatives of
  • Examples of the derivative include a compound represented by the above formula (2) and a compound in which a substituent is bonded to an aromatic hydrocarbon group of the compound represented by the formula (3).
  • Examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom and the like.
  • the amount of the compound represented by the formula (2) and the compound represented by the formula (3) is usually represented by the formula (2) with respect to 1 mol of the compound represented by the formula (3). It is desirable that the amount of the compound is 1 mol or more, and the amount of the compound represented by the formula (2) used is adjusted according to the average degree of polymerization of the molecular chains in the desired compound (1). For example, in the case of an average degree of polymerization of 5, about 1.2 mol of the compound represented by the formula (2) is about 1.2 mol (for example, 1.18 to 1.22 mol) with respect to 1 mol of the compound represented by the formula (3).
  • the compound represented by the formula (2) is represented by about 1.1 mol (for example, 1.08 to 1.12 mol), and when the average degree of polymerization is 20, the compound represented by the formula (2) is represented. It is preferable to use about 1.05 mol (for example, 1.04 to 1.06 mol) of the compound to be used.
  • the compound represented by the formula (2) it is preferable to use at least a halide of benzophenone, and the amount of the halide of benzophenone used in the total amount of the compound represented by the formula (2) (100 mol%).
  • the upper limit is 100 mol%.
  • Examples of the compound represented by the formula (3) include hydroquinone, resorcinol, 2,6-naphthalene diol, 2,7-naphthalene diol, 4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenyl ether, and 4,4'. At least one selected from ⁇ dihydroxybenzophenone, 4,4′-dihydroxydiphenylsulfide, 4,4′-dihydroxydiphenylsulphon, and bisphenol A (particularly at least one selected from hydroquinone, resorcinol, and bisphenol A).
  • the compound is preferably used, and the total amount of the compounds used is, for example, 10 mol% or more, preferably 30 mol% or more, of the total amount of the compound represented by the formula (3) (100 mol%). , Particularly preferably 50 mol% or more, and most preferably 80 mol% or more. The upper limit is 100 mol%.
  • the reaction between the compound represented by the formula (2) and the compound represented by the formula (3) is a base (for example, sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, etc.).
  • a base for example, sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, etc.
  • Inorganic bases at least one selected from organic bases such as pyridine and triethylamine.
  • the amount of base used can be appropriately adjusted depending on the type of base.
  • the amount of the diacid base such as calcium hydroxide used is about 1.0 to 2.0 mol with respect to 1 mol of the compound represented by the formula (3).
  • this reaction can be carried out in the presence of a solvent.
  • a solvent for example, an organic solvent such as N-methyl-2-pyrrolidone, dimethylformamide, dimethyl sulfoxide, acetone, tetrahydrofuran, or toluene, or a mixed solvent of two or more of these can be used.
  • the amount of the solvent used is, for example, about 5 to 20 times by weight with respect to the total (weight) of the reaction substrates. If the amount of the solvent used exceeds the above range, the concentration of the reaction substrate tends to decrease, and the reaction rate tends to decrease.
  • the reaction atmosphere is not particularly limited as long as it does not inhibit the reaction, and may be, for example, an air atmosphere, a nitrogen atmosphere, an argon atmosphere, or the like.
  • the reaction temperature is, for example, about 100 to 200 ° C.
  • the reaction time is, for example, about 5 to 24 hours. Further, this reaction can be carried out by any method such as batch type, semi-batch type and continuous type.
  • reaction product After completion of this reaction, the obtained reaction product can be separated and purified by, for example, separation means such as filtration, concentration, distillation, extraction, crystallization, adsorption, recrystallization, column chromatography, or a separation means combining these. ..
  • Step [2] Examples of the compound represented by the above formula (5) include 4-aminophenol, 2-amino-6-hydroxynaphthalene, and positional isomers and derivatives thereof.
  • the amount of the compound represented by the above formula (5) can be appropriately adjusted according to the average degree of polymerization of the molecular chains in the desired curable compound.
  • the amount in the case of an average degree of polymerization of 5, the amount is about 0.4 to 0.6 mol with respect to 1 mol of the compound represented by the formula (3), and in the case of an average degree of polymerization of 10, it is represented by the formula (3).
  • the amount is about 15 mol.
  • this reaction produces hydrogen halide as it progresses, it is preferable to carry out the reaction in the presence of a base that traps the generated hydrogen halide, because the effect of accelerating the progress of the reaction can be obtained.
  • a base include inorganic bases such as sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate, potassium carbonate and sodium hydrogen carbonate; and organic bases such as pyridine and triethylamine. These can be used alone or in combination of two or more.
  • the amount of the base used can be appropriately adjusted depending on the type of base.
  • the amount of a monoacid base such as sodium hydroxide used is about 1.0 to 3.0 mol with respect to 1 mol of the compound represented by the above formula (5).
  • this reaction can be carried out in the presence of a solvent.
  • a solvent the same solvent as that used in the step [1] can be used.
  • the reaction temperature is, for example, about 100 to 200 ° C.
  • the reaction time is, for example, about 1 to 15 hours. Further, this reaction can be carried out by any method such as batch type, semi-batch type and continuous type.
  • reaction product After completion of this reaction, the obtained reaction product can be separated and purified by, for example, separation means such as filtration, concentration, distillation, extraction, crystallization, adsorption, recrystallization, column chromatography, or a separation means combining these. ..
  • cyclic acid anhydride examples include maleic anhydride, 2-phenylmaleic anhydride, 4-phenylethynyl-phthalic anhydride, and 4- (1-naphthylethaneyl).
  • -Maleic anhydride, bicyclo [2.2.1] hept-5-ene-2,3-dicarboxylic acid anhydride, derivatives thereof and the like can be mentioned.
  • the amount of the cyclic acid anhydride used can be appropriately adjusted according to the average degree of polymerization of the molecular chains in the desired curable compound. For example, when the average degree of polymerization is 5, the amount is about 0.4 to 0.8 mol with respect to 1 mol of the compound represented by the formula (3), and when the average degree of polymerization is 10, it is represented by the formula (3). In the case of an amount of about 0.2 to 0.4 mol with respect to 1 mol of the compound to be obtained and an average degree of polymerization of 20, 0.1 to 0. The amount is about 15 mol.
  • This reaction can be carried out in the presence of a solvent.
  • a solvent the same solvent as that used in the step [1] can be used.
  • This reaction is preferably carried out at room temperature (1 to 30 ° C.).
  • the reaction time is, for example, about 1 to 30 hours. Further, this reaction can be carried out by any method such as batch type, semi-batch type and continuous type.
  • this reaction involves removing the by-produced water by azeotroping with a solvent that azeotropes with water (for example, toluene or the like) or by using a dehydrating agent (for example, acetic anhydride). It is preferable in that it promotes the progress of. Further, the removal of the produced water with a dehydrating agent is preferably performed in the presence of a basic catalyst (for example, triethylamine or the like).
  • a basic catalyst for example, triethylamine or the like.
  • reaction product After completion of this reaction, the obtained reaction product can be separated and purified by, for example, separation means such as filtration, concentration, distillation, extraction, crystallization, adsorption, recrystallization, column chromatography, or a separation means combining these. ..
  • the exothermic peak temperature of the compound represented by the formula (1) depends on the type of curable functional group, but is, for example, 170 to 450 ° C., preferably 200 to 430 ° C., particularly preferably 220 to 420 ° C.
  • the exothermic peak temperature is about 250 ° C.
  • the exothermic peak temperature is determined by DSC measurement.
  • the curable composition may contain one of the curable compounds alone, or may contain two or more of the curable compounds in combination.
  • the content of the curable compound in the total amount of the curable composition (or the total amount of the non-volatile content in the curable composition) (or the total amount when two or more kinds are contained) is, for example, 30% by weight or more, preferably 50. By weight or more, particularly preferably 70% by weight or more, most preferably 90% by weight or more.
  • the upper limit is, for example, 95% by weight.
  • the silicate for example a plurality of anions consisting of SiO 4 tetrahedron is a compound having less SiO tetrahedral sheet structure continuous to plane. Then, a part of Si forming the tetrahedral sheet structure may be replaced with cations such as Al 3+ , Fe 3+ , B 3+ , and Ge 4+. Further, the silicate may have an octahedral sheet structure in addition to the tetrahedral sheet structure, and the octahedral sheet structure is positive such as Li + , Mg 2+ , Fe 2+ , AL 3+ , Fe 3+ and the like. It may contain ions. Furthermore, the silicate may have alkali metal ions between layers of a sheet structure such as a tetrahedral sheet structure or an octahedral sheet structure.
  • the silicate includes, for example, mica (mica), kaolin, talc, silica, montmorillonite and the like. Of these, mica is preferable because it has excellent dispersibility.
  • the shape of the silicate includes various shapes such as flaky, particulate, and needle-like, and among them, flaky silicate is preferable in terms of excellent dispersibility.
  • the thickness W of the flaky silicate is, for example, 0.5 ⁇ m or less, preferably 0.01 to 0.5 ⁇ m, and particularly preferably 0.05 to 0.5 ⁇ m.
  • the maximum diameter L 1 of the flaky silicate is, for example, 5 to 40 ⁇ m, preferably 6 to 35 ⁇ m, and particularly preferably 7 to 30 ⁇ m.
  • the diameter L 2 (hereinafter, may be referred to as “cross diameter L 2 ”) orthogonal to the maximum diameter L 1 of the flaky silicate is, for example, 3 to 30 ⁇ m, preferably 5 to 20 ⁇ m, and particularly preferably 8 to. It is 15 ⁇ m.
  • the maximum diameter L 1 of the flaky silicate, the cross diameter L 2 and the thickness W preferably satisfy the following formulas (a) and (b). 0.2L 1 ⁇ L 2 ⁇ L 1 (a) 0.001L 1 ⁇ W ⁇ 0.08L 1 (b)
  • the maximum diameter L 1 of the flaky silicate, the cross diameter L 2 and the thickness W satisfy the following formulas (a'), (b) and (c). 0.3L 1 ⁇ L 2 ⁇ 0.9L 1 (a') 0.001L 1 ⁇ W ⁇ 0.08L 1 (b) 0.005L 2 ⁇ W ⁇ 0.4L 2 (c)
  • the diameters L 1 , L 2 and the thickness W of the flaky silicate are obtained by, for example, an image analysis method. That is, an electron microscope (SEM) is used to take an electron microscope image of a sufficient number (for example, 10 or more) of particulate matter, and the maximum diameter, cross diameter, and thickness of these particulate matter are measured. Is calculated by arithmetically averaging.
  • SEM electron microscope
  • the silicate includes hydrophilic silicate and lipophilic silicate.
  • the hydrophilic silicate in the form of flakes is superior in dispersibility as in the form of thick film, and has the effect of imparting low CTE property to the curable composition.
  • the lipophilic silicate has excellent dispersibility regardless of the particle size.
  • the lipophilic silicate is one in which at least a part of the alkali metal ions contained between the layers of the sheet structure is replaced with an organic ion exhibiting lipophilicity (for example, a quaternary ammonium ion).
  • the quaternary ammonium ion is represented by, for example, the following formula (d).
  • R a , R b , R c and R d represent alkyl groups having 1 to 20 carbon atoms which may have the same or different hydroxy groups).
  • the shape of the lipophilic silicate is in the form of flakes or particles.
  • the maximum diameter L 3 of the lipophilic silicate is, for example, 1 to 30 ⁇ m, preferably 2 to 25 ⁇ m, and particularly preferably 3 to 20 ⁇ m.
  • the cross diameter L 4 perpendicular to the maximum diameter L 3 is from 0.1 to 0.9 times the maximum diameter L 3, preferably 0.2 to 0.8 times.
  • the thickness W 1 is 0.05 to 1.0 times, preferably 0.1 to 0.9 times, the maximum diameter L 3.
  • the silicates include swelling silicates and non-swelling silicates.
  • Non-swelling silicate has excellent heat resistance.
  • the swollen silicate contains Na + between layers and is excellent in heat resistance when it exhibits hydrophilicity, but when the Na + is replaced with an organic ion, it acquires lipophilicity and is heat resistant. The sex tends to decrease.
  • the silicate has an appropriate stress absorption property from the viewpoint of excellent dispersibility.
  • a silicate having the following characteristics 1 and 2 is preferable.
  • Characteristic 1 A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises.
  • Characteristic 2 Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface.
  • the billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes. Does not cause swelling on the surface of
  • the silicate having both the above-mentioned characteristics 1 and the above-mentioned property 2 is a non-swelling type silicate (preferably a non-swelling type silicate having the above diameters L 1 , L 2 and the thickness W.
  • a silicate containing an alkali metal (more specifically, a silicate containing an alkali metal between the layers of the sheet structure, that is, a non-swelling silicate) has dispersibility and heat resistance. It is preferable because it has excellent properties.
  • the alkali metal content (when two or more kinds are contained, the total amount thereof) is preferably, for example, 7.0% by weight or more, more preferably 8.0% by weight or more, and particularly preferably 9 of the total amount of silicate. It is 0.0% by weight or more, most preferably 9.5% by weight or more.
  • the upper limit of the alkali metal content is, for example, 20% by weight, preferably 15% by weight, and particularly preferably 10% by weight.
  • the content of potassium is preferably, for example, 1.0% by weight or more, more preferably 3.0% by weight or more, and particularly preferably 5.0% by weight, based on the total amount of silicate. As mentioned above, it is most preferably 7.0% by weight or more.
  • the upper limit of the potassium content is, for example, 20% by weight, preferably 15% by weight, and particularly preferably 10% by weight.
  • the content of sodium is preferably, for example, 5.0% by weight or less, more preferably 3.0% by weight or less, still more preferably less than 3.0% by weight, based on the total amount of silicate. It is particularly preferably 1.0% by weight or less, most preferably 0.5% by weight or less, and particularly preferably 0.1% by weight or less.
  • Silicates containing alkali metals (particularly potassium and sodium) in the above range include non-swelling silicates (particularly non-swelling mica).
  • a silicate containing magnesium (more specifically, a silicate having an octahedral sheet structure containing magnesium) is preferable in that it has excellent dispersibility.
  • the magnesium content is preferably 10% by weight or more (for example, 10 to 30% by weight) of the total amount of silicate, and more preferably 15% by weight or more (for example, 15 to 20% by weight).
  • silicate containing magnesium in the above range examples include the above-mentioned flaky silicate and lipophilic silicate.
  • a silicate containing aluminum (more specifically, a silicate having an octahedral sheet structure containing aluminum) is preferable in that it has excellent dispersibility.
  • the aluminum content is preferably 0.5% by weight or more, more preferably 1.0% by weight or more, particularly preferably 3.0% by weight or more, and most preferably 5.0% by weight of the total amount of silicate. % Or more.
  • the upper limit of the aluminum content is, for example, 15% by weight, preferably 10% by weight, and particularly preferably 8% by weight.
  • silicate containing aluminum in the above range examples include the above-mentioned flaky silicate and lipophilic silicate.
  • the silicate since the silicate containing a fluorine atom has excellent heat resistance and electrical properties (specifically, the dielectric constant and the dielectric loss tangent are low), the obtained cured product has excellent electrical properties. It is preferable in that it can exert.
  • the fluorine atom content is preferably 0.5% by weight or more, more preferably 1.0% by weight or more, particularly preferably 3.0% by weight or more, and most preferably 5.0% by weight of the total amount of silicate. Weight% or more.
  • the upper limit of the content of fluorine atoms is, for example, 20% by weight, preferably 15% by weight, and particularly preferably 10% by weight.
  • silicate containing a fluorine atom in the above range examples include synthetic mica.
  • the content of the silicate is 0.01 to 95 parts by weight, preferably 40 to 70 parts by weight, more preferably 45 to 65 parts by weight, and particularly preferably 50 to 60 parts by weight with respect to 100 parts by weight of the curable compound. Is. Since the curable composition contains a silicate in the above range, a cured product having heat resistance (for example, heat resistance of about 200 ° C.) and flexibility can be formed.
  • a non-swelling silicate, a hydrophilic swelling silicate, or a flaky silicate is contained in the above range as the silicate, heat resistance (for example, heat resistance of 300 ° C. or higher) and possible A cured product having flexibility (in a mandrel test, for example, a diameter of 5 mm or less, preferably a diameter of 3 mm or less) can be formed.
  • the silicate contains a non-swelling silicate, a lipophilic swelling silicate, or a flaky silicate in the above range, low CTE and flexibility (in a mandrel test, for example, A cured product having a diameter of 5 mm or less, preferably 3 mm or less in diameter) can be formed.
  • flaky silicate preferably non-swelling flaky silicate
  • low CTE heat resistance
  • heat resistance for example, heat resistance of 300 ° C. or higher
  • a cured product having flexibility in a mandrel test, for example, a diameter of 5 mm or less, preferably a diameter of 3 mm or less
  • the CTE (coefficient of linear expansion) of the cured product is, for example, 10 ⁇ 10 -6 to 50 ⁇ 10 -6 / ° C, preferably 10 ⁇ 10 -6 to 30 ⁇ 10 -6 / ° C.
  • the CTE of the cured product changes little even if the temperature range is different.
  • the difference between the coefficient of linear expansion ( ⁇ 1) in the region lower than Tg and the coefficient of linear expansion ( ⁇ 2) in the region higher than Tg is small, and ⁇ 2 / ⁇ 1 is, for example, 2.0 or less.
  • the silicate can be imparted to a curable composition or a cured product of the curable composition depending on the particle shape and properties (hydrophilic / lipophilic, swelling type / non-swelling type). Have a difference in. Therefore, it is preferable to select and use a silicate according to the application and required characteristics.
  • the curable composition may contain other components, if necessary, in addition to the curable compound and the silicate.
  • Other components include, for example, catalysts, radical polymerization initiators, organic resins (silicone resins, epoxy resins, fluororesins, etc.), solvents, stabilizers (antioxidants, UV absorbers, light retardant stabilizers, thermal stabilization).
  • flame retardants phosphorus flame retardants, halogen flame retardants, inorganic flame retardants, etc.
  • flame retardants reinforcing materials, nucleating agents, coupling agents, lubricants, waxes, plasticizers, mold release agents, Impact resistance improver, hue improver, fluidity improver, colorant (dye, pigment, etc.), dispersant, defoaming agent, defoaming agent, antibacterial agent, preservative, viscosity modifier, thickener, etc. Can be mentioned. These can be used alone or in combination of two or more.
  • the content of other components is, for example, 50% by weight or less, preferably 40% by weight or less, more preferably 40% by weight or less, based on the total amount of the curable composition. Is 30% by weight or less, particularly preferably 20% by weight or less, most preferably 10% by weight or less, and particularly preferably 5% by weight or less.
  • the curable composition preferably contains at least the compound represented by the above formula (1) as a curable compound.
  • a curable compound other than the compound represented by the above formula (1) may be contained, but it is represented by the above formula (1) in the total amount (100% by weight) of the curable compound contained in the curable composition.
  • the proportion of the compound is, for example, 70% by weight or more, preferably 80% by weight or more, and particularly preferably 90% by weight or more.
  • the upper limit is 100% by weight. Therefore, the content of the curable compound other than the compound represented by the above formula (1) is, for example, 30% by weight or less, preferably 20% by weight, based on the total amount (100% by weight) of the curable compound contained in the curable composition. % Or less, particularly preferably 10% by weight or less.
  • the curable composition contains a compound represented by the above formula (1) as a curable compound
  • the compound represented by the above formula (1) is, for example, a ketone, an amide, a halogenated hydrocarbon, a sulfoxide, or the like. Since it has excellent solubility in ethers, esters, nitriles, aromatic hydrocarbons, and a mixture of two or more of these, these solvents can be contained.
  • a cured product having heat resistance and flexibility By heating the curable composition, a cured product having heat resistance and flexibility can be formed. Further, when a specific silicate is contained, a cured product having low CTE, heat resistance, and flexibility can be formed. Further, the cured product of the curable composition has flame retardancy and good dielectric properties (low relative permittivity and dielectric loss tangent).
  • the curable composition can form a semi-cured product (B stage) by adjusting the heating temperature and the heating time and stopping the curing reaction in the middle without completing the curing reaction.
  • the curable composition has the above characteristics, for example, harsh environmental temperatures in the fields of electronic information equipment, home appliances, automobiles, precision machinery, aircraft, space industry equipment, energy fields (oil drilling pipes / tubes, fuel containers), etc. Molding materials (eg, sizing agents) for composites (fiber reinforced plastics, prepregs, etc.) used under conditions, shielding materials, conductive materials (eg, heat conductive materials, etc.), insulating materials, adhesives (eg, heat resistant). It can be suitably used as a functional material such as a sex adhesive).
  • sealants, paints, coating agents, inks, sealants, resists, molding materials, forming materials automotive parts such as thrust washers, oil filters, seals, bearings, gears, cylinder head covers, bearing retainers, intake manifolds, pedals, etc.; Base material, electronic circuit board (especially electronic circuit board to which copper wiring is applied), electrical insulating material (insulating film, etc.), laminated board, electronic paper, touch panel, solar cell board, optical waveguide, light guide plate, holographic memory, silicon Semiconductor / liquid crystal manufacturing equipment parts such as wafer carriers, IC chip trays, electrolytic condenser trays, and insulating films; optical parts such as lenses; compressor parts such as pumps, valves, and seals; aircraft cabin interior parts; sterilization equipment, columns, and piping Medical equipment parts such as, food and beverage manufacturing equipment parts; housings used for personal computers, mobile phones, etc., and electricity represented by keyboard supports, which are members that support keyboards inside personal computers. -It can be preferably used
  • the curable composition can form a cured product having heat resistance and a low CTE comparable to that of copper, it is particularly preferably used as a raw material for an electronic circuit substrate to which copper wiring is applied. it can.
  • the cured product (or semi-cured product) of the present disclosure is a cured product (or semi-cured product) of the above-mentioned curable composition.
  • the cured product (or semi-cured product) is preferably represented by the formula (1), and R 1 and R 2 in the formula are cured functional groups having the same or different cyclic imide structure.
  • a sex compound (particularly preferably, selected from the groups represented by the above formula (1), in which R 1 and R 2 in the formula are the same or different and are represented by the formulas (r-1) to (r-6). It is a cured product (or semi-cured product) of the curable compound which is the group to be formed.
  • the cured product (or semi-cured product) can be produced by subjecting the curable composition to heat treatment (heating temperature is, for example, 180 to 250 ° C.).
  • the heat treatment may be performed while the temperature is kept constant, or the temperature may be changed stepwise.
  • the heat treatment temperature can be appropriately adjusted according to the heating time. For example, when it is desired to shorten the heating time, it is preferable to set the heating temperature higher.
  • the curable composition can be cured under normal pressure, reduced pressure or pressurized.
  • the curable composition contains a compound represented by the formula (1) as a curable compound
  • the compound represented by the formula (1) has a high proportion of a structure derived from an aromatic ring, and therefore, at a high temperature.
  • a cured product (specifically, a cured product having heat resistance) can be formed without decomposition even when heated, and a cured product can be efficiently formed with excellent workability by heating at a high temperature for a short time. Can be done.
  • the heating means is not particularly limited, and known or commonly used means can be used.
  • the semi-cured product (B stage) can be produced by adjusting the heating temperature and the heating time of the curable composition and stopping the curing reaction in the middle without completing the curing reaction.
  • the degree of curing of the semi-cured product is, for example, 85% or less (for example, 10 to 85%, preferably 15 to 75%, and more preferably 20 to 70%).
  • the semi-cured product When the semi-cured product is a semi-cured product of a curable composition containing a compound represented by the formula (1) as a curable compound, the semi-cured product temporarily exhibits fluidity by heating. It can be made to follow a step. Further, by applying the heat treatment, a cured product having excellent heat resistance can be formed.
  • the cured product has a low CTE of the copper substrate and the same degree, the linear expansion coefficient, for example, 10 ⁇ 10 -6 ⁇ 50 ⁇ 10 -6 / °C, preferably 10 ⁇ 10 -6 ⁇ 30 ⁇ 10 -6 / °C.
  • the coefficient of linear expansion does not change much even if the temperature range is different.
  • the difference between the coefficient of linear expansion ( ⁇ 1) in the region lower than Tg and the coefficient of linear expansion ( ⁇ 2) in the region higher than Tg is small, and ⁇ 2 / ⁇ 1 is, for example, 2.0 or less. Therefore, even if the laminated body of the cured product and the copper foil is exposed to a high temperature environment, curling of the laminated body can be suppressed.
  • the cured product has, for example, a 5% weight loss temperature (T d5 ) of 300 ° C. or higher, and a nitrogen atom content of 2.8 to 0.1 after being subjected to heat treatment at 320 ° C. for 30 minutes. By weight%.
  • T d5 5% weight loss temperature
  • the 5% weight loss temperature (T d5 ) of the cured product measured at a heating rate of 10 ° C./min (in nitrogen) is, for example, 300 ° C. or higher, preferably 400 ° C. or higher, particularly preferably 450 ° C. or higher, most preferably. It is preferably 500 ° C. or higher.
  • the upper limit of the 5% weight loss temperature (T d5 ) is, for example, 600 ° C., preferably 550 ° C., particularly preferably 530 ° C.
  • the nitrogen atom content after subjecting the cured product to heat treatment at 320 ° C. for 30 minutes is, for example, 2.8 to 0.1% by weight, preferably 2.5 to 0.15% by weight, more preferably. Is 2.0 to 0.20% by weight, particularly preferably 1.8 to 0.40% by weight, and most preferably 1.5 to 0.70% by weight. Therefore, the cured product is excellent in toughness and heat resistance. On the other hand, when the nitrogen atom content is lower than the above range, the toughness and heat resistance of the cured product tend to decrease.
  • the nitrogen atom content in the cured product after being subjected to the heat treatment can be determined, for example, by CHN elemental analysis.
  • the cured product may contain additives in addition to the polymer of the curable compound, but when the cured product is heat-treated at 320 ° C. for 30 minutes, it has a decomposition point and a boiling point of less than 320 ° C. Additives are decomposed and disappear, leaving only the polymer of the curable compound. Therefore, the nitrogen atom content in the cured product after the heat treatment can be estimated to be the nitrogen atom content contained in the polymer of the curable compound.
  • the curing treatment can also be a heat treatment from the viewpoint of heat history.
  • the cured product has a peak in the region of 1620 to 1750 cm -1 of the IR spectrum.
  • the cured product has excellent flame retardancy, and the flame resistance of the cured product having a thickness of 0.15 mm by a method conforming to UL94V is V-1 grade, that is, the following conditions 1 to 5 are satisfied.
  • Burning duration is 30 seconds or less
  • Total burning time of 5 samples is 250 seconds or less
  • Red heat duration after the second flame contact is 60 seconds or less
  • Fixing clamp Does not burn to the part (5) Does not drop burning particles and burn the cotton laid underneath
  • the cured product has excellent insulating properties, and the relative permittivity is, for example, 6 or less (for example, 1 to 6), preferably 5 or less (for example, 1 to 5), and particularly preferably 4 or less (for example, 1 to 4). ..
  • the dielectric loss tangent is, for example, 0.05 or less (for example, 0.0001 to 0.05), preferably 0.0001 to 0.03, and particularly preferably 0.0001 to 0.015.
  • the "relative permittivity" and “dielectric loss tangent” are values measured at a measurement frequency of 1 MHz and a measurement temperature of 23 ° C. in accordance with JIS-C2138, or at frequencies of 1 GHz and 23 ° C. in accordance with ASTM D2520. It is a value to be measured.
  • the laminate of the present disclosure has a structure in which a cured product or semi-cured product of the curable composition and a substrate are laminated.
  • the laminate includes a cured product or semi-cured product / substrate of the curable composition and a cured product or semi-cured product / substrate of the substrate / curable composition.
  • the laminate can be produced, for example, by applying the curable composition onto a substrate and subjecting it to heat treatment.
  • the curable composition is applied onto a support, and the semi-cured product obtained by heat-treating and semi-curing is peeled off from the support and placed on a substrate. It can also be produced by a method of further heat treatment.
  • the substrate material examples include semiconductor materials (for example, ceramics, SiC, gallium nitride, etc.), paper, coated paper, plastic films, wood, cloth, non-woven fabrics, metals (for example, stainless steel, aluminum alloys, copper). And so on.
  • semiconductor materials for example, ceramics, SiC, gallium nitride, etc.
  • paper coated paper
  • plastic films wood, cloth, non-woven fabrics
  • metals for example, stainless steel, aluminum alloys, copper. And so on.
  • the curable composition has a low CTE, curling can be suppressed even when laminated on a base material having a small coefficient of linear expansion (for example, a metal foil such as copper), resulting in shape stability. Excellent.
  • the tensile shear force between the substrate and the cured product is, for example, 1 MPa or more, preferably 5 MPa or more, and particularly preferably 10 MPa or more.
  • the tensile shear force can be measured at a tensile speed of 300 mm / min and a peeling angle of 180 ° using a tensile retesting machine (Tencilon UCT-5T manufactured by Orientec Co., Ltd.).
  • the laminated body also has a structure in which a substrate is laminated via a cured product having excellent heat resistance, flame retardancy, and insulating properties. Therefore, the laminated body can be suitably used as, for example, an electronic circuit board or the like.
  • the printed circuit board of the present disclosure has a structure in which conductor wiring is applied on a substrate made of a cured product of the curable composition. Further, the electronic device has the printed circuit board.
  • the conductor wiring includes wiring using a conductor such as copper or aluminum. Of these, copper wiring is preferable because it has excellent conductivity.
  • the curable composition has excellent heat resistance and low CTE. Therefore, the surface of the substrate made of the cured product of the curable composition is exposed to thermal stress such as being subjected to a solder reflow process in which conductor wiring such as copper or aluminum having a small coefficient of linear expansion is applied. However, since the difference between the coefficient of thermal expansion of the substrate and the coefficient of thermal expansion of the conductor wiring is extremely small, it is possible to prevent the wiring from breaking.
  • the electronic device since the electronic device includes a printed circuit board having thermal stress resistance, it has high reliability.
  • This powdery solid was repeatedly washed with methanol and water and then dried under reduced pressure at 100 ° C. for 8 hours to obtain a powdery solid (diamine (1), compound represented by the following formula, yield: 95%). ..
  • the obtained powdery solid was subjected to GPC measurement (solvent: THF, standard polystyrene conversion) to obtain a number average molecular weight of 2920, a weight average molecular weight of 5100, and an average degree of polymerization (m-2) of 6.2. there were.
  • the 1 H-NMR spectrum of the obtained diamine (1) is shown in FIG. 1, and the FTIR spectrum is shown in FIG.
  • curable compound A 5.88 g of maleic anhydride, 50 mL of N-methyl-2-pyrrolidone, and 200 mL of toluene were placed in a 1000 mL (three-necked) flask equipped with a stirrer, a nitrogen introduction tube and a drying tube, and nitrogen was substituted. did.
  • the viscosity of the curable compound A at 200 ° C. and a shear rate of 10 (1 / s) was measured by a rheometer and found to be 14 Pa ⁇ s.
  • the number average molecular weight and the weight average molecular weight of the obtained curable compound A were determined by GPC measurement (solvent THF, standard polystyrene conversion). As a result, the number average molecular weight (Mn) was 3160 and the weight average molecular weight (Mw) was 5190.
  • the Tg of the obtained curable compound A was determined by DSC measurement. As a result, it was 131 ° C.
  • Example 1 As shown in Table 1 below, 45 parts by weight of the curable compound A and 55 parts by weight of toluene obtained in the preparation example and a radical polymerization initiator (t-butyl peroxybenzoate, trade name "Perbutyl Z", Nippon Oil & Fats Co., Ltd.) (Manufactured by) 0.45 parts by weight was blended and stirred with a rotation / revolution mixer (trade name "Awatori Rentaro ARE-310", manufactured by Shinky Co., Ltd.) for 4 hours. Then, 24 parts by weight of mica was further added and stirred for 5 minutes, and then defoamed for 5 minutes to obtain a curable composition.
  • a radical polymerization initiator t-butyl peroxybenzoate, trade name "Perbutyl Z", Nippon Oil & Fats Co., Ltd.
  • a rotation / revolution mixer trade name "Awatori Rentaro ARE-310", manufactured by Shinky Co., Ltd.
  • the obtained curable composition was placed on a copper foil (trade name "CF-T9DA-SV-18", manufactured by Fukuda Metal Foil Powder Industry Co., Ltd., 10 cm x 10 cm) with a thickness of 100 ⁇ m in a wet state. It was applied using an applicator so as to obtain a coating film / copper foil laminate.
  • the obtained coating film / copper foil laminate is heated at 105 ° C. for 10 minutes and then at 150 ° C. for 10 minutes to volatilize toluene using a hot plate to obtain a dry coating film / copper foil laminate. It was. Then, the obtained dry coating film / copper foil laminate was heated at 250 ° C. for 1 hour under vacuum conditions to cure the coating film to obtain a cured product / copper foil laminate.
  • the obtained cured product / copper foil laminate was immersed in an aqueous iron (III) chloride solution (40% by weight) overnight to remove the copper foil at room temperature to obtain a cured product.
  • ⁇ 1 (coefficient of linear expansion in a region lower than Tg) and ⁇ 2 (coefficient of linear expansion in a region higher than Tg) were obtained from the strain-temperature curve obtained under the following conditions.
  • TMA Tension> Measuring device: TMA SS7100 / Hitachi High-Tech Science Atmosphere: N 2 Temperature range: 1st heat / 0 °C ⁇ 250 °C 2nd heat / 00C ⁇ 250 °C 20 minutes standby at the start temperature Temperature rise rate: 5 ° C / min Measured load: 20mN
  • Examples 2-4 As shown in Table 1 below, a curable composition was obtained in the same manner as in Example 1 except that the type of mica to be added was changed, and a dry coating film / copper foil laminate, a cured product / copper foil laminate, and A cured product was obtained.
  • Comparative Example 1 A curable composition was obtained in the same manner as in Examples except that mica was not added, and a dry coating film / copper foil laminate, a cured product / copper foil laminate, and a cured product were obtained.
  • the cured product / copper foil laminate (10 cm ⁇ 10 cm) was placed on a flat plate with the cured product surface facing up, and allowed to stand in an oven set at 200 ° C. for 60 minutes, after which the laminate was placed.
  • the height of the four corners of the laminate was measured from the surface of the flat plate after 5 minutes had passed since the product was placed on the flat plate in an environment of room temperature (25 ° C.) and the curl amount was measured from the average value. Then, the curl resistance was evaluated according to the following criteria. If the evaluation result is ⁇ , it means that the CTE of the cured product is equivalent to the CTE of the copper foil (about 17 / ppm).
  • NK-8G Synthetic mica, trade name "NK-8G", MAE manufactured by Nippon Koken Kogyo Co., Ltd .: Dimethyldialkylammonium modified synthetic mica, trade name "Somasif MAE", ME100 manufactured by Katakura Corp. Agri Co., Ltd .: Synthetic mica , Product name "Somasif ME100", MK200 manufactured by Katakura Corp. Agri Co., Ltd .: Synthetic mica, Product name "Micromica MK200", manufactured by Katakura Corp. Agri Co., Ltd.
  • the constituent elements were identified by irradiating with X-rays and measuring the generated unique fluorescent X-rays, and the content (% by weight) of the elements was analyzed.
  • Characteristic 1 A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises.
  • Characteristic 2 Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface.
  • the billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes.
  • the maximum diameter L 1 of the silicate, the diameter L 2 orthogonal to the maximum diameter L 1 , and the thickness W satisfy the following formulas (a) and (b), [1] ] To [3].
  • the curable composition according to any one of. 0.2L 1 ⁇ L 2 ⁇ L 1 (a) 0.001L 1 ⁇ W ⁇ 0.08L 1 (b) [5]
  • the curable compound has the following formula (1).
  • R 1 and R 2 indicate the same or different curable functional groups, and D 1 and D 2 indicate the same or different single bond or linking group.
  • L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
  • Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group.
  • X indicates -CO-, -S-.
  • R 3 to R 6 are the same. Or differently, a hydrogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aromatic hydrocarbon group, or two or more groups selected from the saturated or unsaturated aliphatic hydrocarbon group and an aromatic hydrocarbon group. Indicates a bonded group. Two groups selected from R 3 to R 6 may be bonded to each other to form a ring with adjacent carbon atoms.
  • R 1 and R 2 in the formula (1) are the same or different groups selected from the groups represented by the following formulas (r-1) to (r-6), [17]
  • the curable composition according to. (The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 ) [21]
  • a method for producing a laminate which comprises producing a laminate having a structure in which a cured product of a curable composition is laminated on a substrate.
  • a printed circuit board having conductor wiring on the substrate wherein the substrate is a substrate made of a cured product of the curable composition according to any one of [1] to [27].
  • a method of manufacturing a printed circuit board which includes a step of making a printed circuit board.
  • a method for manufacturing an electronic device which comprises a step of forming a conductor wiring on a substrate made of a cured product of an object.
  • the curable composition of the present disclosure can be heated to obtain a cured product having heat resistance and flexibility. Further, the cured product preferably has a low CTE and has a heat ray expansion integer comparable to that of copper. Therefore, the curable composition can be suitably used as a raw material for an electronic circuit substrate to which copper wiring is applied.

Abstract

Provided is a curable composition with which it is possible to form a flexible and heat-resistant cured article. This curable composition contains a curable compound and a silicate. The silicate is preferably a flaky silicate or a lipophilic silicate. The curable compound is preferably a compound represented by formula (1). In the formula, R1 and R2 each indicate a curable functional group, and D1 and D2 each indicate a single bond or a linking group. L indicates a divalent group including the structures represented by formulas (I) and (II). Ar1 to Ar3 each indicate an arylene group, or a group in which two or more arylene groups are bonded by a single bond or a linking group. X indicates -CO-, -S-, or -SO2-, and Y may be the same as or different from each other and indicate -S-, -SO2-, -O-, -CO-, -COO-, or -CONH-.

Description

硬化性組成物Curable composition
 本開示は、硬化性組成物、及びその硬化物又は半硬化物に関する。本願は、2019年12月19日に日本に出願した、特願2019−229223号の優先権を主張し、その内容をここに援用する。 The present disclosure relates to a curable composition and a cured or semi-cured product thereof. The present application claims the priority of Japanese Patent Application No. 2019-229223 filed in Japan on December 19, 2019, the contents of which are incorporated herein by reference.
 エンジニアリングプラスチックは耐熱性や機械特性を向上させたプラスチックであり、各種部品の小型化、軽量化、高性能化、高信頼性化に必須の材料として重用されている。しかし、エンジニアリングプラスチックは溶融温度が高く、溶剤溶解性が低いため加工性に乏しいことが問題であった。 Engineering plastics are plastics with improved heat resistance and mechanical properties, and are heavily used as essential materials for miniaturization, weight reduction, high performance, and high reliability of various parts. However, engineering plastics have a problem of poor workability because they have a high melting temperature and low solvent solubility.
 例えば、特許文献1等に記載のポリイミドは、卓越した耐熱性と強度特性を有するが、難溶解性且つ難融解性であるため、溶融成形を行ったり、複合材のマトリックス樹脂として使用することは困難であった。 For example, the polyimide described in Patent Document 1 and the like has excellent heat resistance and strength characteristics, but is sparingly soluble and sparingly meltable, so that it cannot be melt-molded or used as a matrix resin for composite materials. It was difficult.
 スーパーエンジニアリングプラスチックとも呼ばれるポリエーテルエーテルケトン(PEEK)は、連続使用温度が260℃で、耐熱性、難燃性、及び電気特性に優れた性能を有する熱可塑性樹脂であるが、融点が343℃であるためとりわけ融解し難く、溶剤にも溶解し難いため、加工性に劣る点が問題であった(例えば、特許文献2)。 Polyetheretherketone (PEEK), also called super engineering plastic, is a thermoplastic resin having excellent heat resistance, flame retardancy, and electrical characteristics at a continuous use temperature of 260 ° C., but has a melting point of 343 ° C. Therefore, it is particularly difficult to melt and is difficult to dissolve in a solvent, so that it is inferior in processability (for example, Patent Document 2).
 そのため、加工性に優れ、耐熱性を有する硬化物を形成することができる硬化性組成物が求められている。 Therefore, there is a demand for a curable composition capable of forming a cured product having excellent processability and heat resistance.
特開2000−219741号公報Japanese Unexamined Patent Publication No. 2000-219741 特公昭60−32642号公報Special Publication No. 60-322642
 従って、本開示の目的は、耐熱性と可とう性を有する硬化物を形成することができる硬化性組成物を提供することにある。
 本開示の他の目的は、低CTE(低線膨張係数)、耐熱性、及び可とう性を有する硬化物を形成することができる硬化性組成物を提供することにある。
 本開示の他の目的は、加工性に優れ、低CTE、耐熱性、及び可とう性を有する硬化物を形成することができる硬化性組成物を提供することにある。
 本開示の他の目的は、耐熱性及び可とう性を有する硬化物を形成することができる半硬化物を提供することにある。
 本開示の他の目的は、低CTE、耐熱性、及び可とう性を有する硬化物を形成することができる半硬化物を提供することにある。
 本開示の他の目的は、耐熱性及び可とう性を有する硬化物を提供することにある。
 本開示の他の目的は、低CTE、耐熱性、及び可とう性を有する硬化物を提供することにある。
 本開示の他の目的は、前記硬化物が基板に積層されてなる積層体を提供することにある。
 本開示の他の目的は、前記積層体を備える電子デバイスを提供することにある。
Therefore, an object of the present disclosure is to provide a curable composition capable of forming a cured product having heat resistance and flexibility.
Another object of the present disclosure is to provide a curable composition capable of forming a cured product having low CTE (coefficient of linear expansion), heat resistance, and flexibility.
Another object of the present disclosure is to provide a curable composition capable of forming a cured product having excellent processability, low CTE, heat resistance, and flexibility.
Another object of the present disclosure is to provide a semi-cured product capable of forming a cured product having heat resistance and flexibility.
Another object of the present disclosure is to provide a semi-cured product capable of forming a cured product having low CTE, heat resistance, and flexibility.
Another object of the present disclosure is to provide a cured product having heat resistance and flexibility.
Another object of the present disclosure is to provide a cured product having low CTE, heat resistance, and flexibility.
Another object of the present disclosure is to provide a laminate in which the cured product is laminated on a substrate.
Another object of the present disclosure is to provide an electronic device comprising the laminate.
 本発明者等は上記課題を解決するため鋭意検討した結果、硬化性化合物に特定量のケイ酸塩を添加して得られる組成物が上記課題を解決できることを見いだした。本開示はこれらの知見に基づいて完成させたものである。 As a result of diligent studies to solve the above problems, the present inventors have found that a composition obtained by adding a specific amount of silicate to a curable compound can solve the above problems. This disclosure has been completed based on these findings.
 すなわち、本開示は、硬化性化合物とケイ酸塩を含み、前記ケイ酸塩の含有量が硬化性化合物100重量部に対して0.01~95重量部である硬化性組成物を提供する。 That is, the present disclosure provides a curable composition containing a curable compound and a silicate, wherein the content of the silicate is 0.01 to 95 parts by weight with respect to 100 parts by weight of the curable compound.
 本開示は、また、ケイ酸塩が薄片状ケイ酸塩である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate is a flaky silicate.
 本開示は、また、ケイ酸塩が、下記特性1と特性2とを兼ね備える前記硬化性組成物を提供する。
特性1:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが5.0mmとなるまでケイ酸塩を充填し、最大加圧7MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じる
特性2:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが3.0mmとなるまでケイ酸塩を充填し、最大加圧5MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じない
The present disclosure also provides the curable composition in which the silicate has the following properties 1 and 2.
Characteristic 1: A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises. Characteristic 2: Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface. The billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes. Does not cause swelling on the surface of
 本開示は、また、ケイ酸塩の最大径Lと、前記最大径Lに直交する径Lと厚みWが、下記式(a)、(b)を満たす前記硬化性組成物を提供する。
 0.2L≦L≦L   (a)
 0.001L≦W≦0.08L   (b)
The present disclosure also provides the curable composition in which the maximum diameter L 1 of the silicate, the diameter L 2 orthogonal to the maximum diameter L 1 , and the thickness W satisfy the following formulas (a) and (b). To do.
0.2L 1 ≤ L 2 ≤ L 1 (a)
0.001L 1 ≤ W ≤ 0.08L 1 (b)
 本開示は、また、ケイ酸塩が親油性ケイ酸塩である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate is a lipophilic silicate.
 本開示は、また、ケイ酸塩がアルカリ金属を含む前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate comprises an alkali metal.
 本開示は、また、ケイ酸塩のマグネシウム含有量が10重量%以上である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition having a magnesium content of silicate of 10% by weight or more.
 本開示は、また、ケイ酸塩が薄片状ケイ酸塩であり、ナトリウム含有量が3.0重量%未満である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate is flaky silicate and the sodium content is less than 3.0% by weight.
 本開示は、また、ケイ酸塩が薄片状ケイ酸塩であり、カリウム含有量が1.0重量%以上である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate is a flaky silicate and the potassium content is 1.0% by weight or more.
 本開示は、また、ケイ酸塩が薄片状ケイ酸塩であり、アルミニウム含有量が0.5重量%以上である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate is a flaky silicate and the aluminum content is 0.5% by weight or more.
 本開示は、また、ケイ酸塩がフッ素原子を含む前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate contains a fluorine atom.
 本開示は、また、ケイ酸塩がマイカである前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which the silicate is mica.
 本開示は、また、硬化性化合物が、下記式(1)
Figure JPOXMLDOC01-appb-C000004
[式中、R、Rは、同一又は異なって、硬化性官能基を示し、D、Dは、同一又は異なって、単結合又は連結基を示す。Lは、下記式(I)で表される構造と下記式(II)で表される構造とを含む繰り返し単位を有する2価の基を示す。
Figure JPOXMLDOC01-appb-C000005
(式中、Ar~Arは、同一又は異なって、アリーレン基、又は2個以上のアリーレン基が単結合若しくは連結基を介して結合した基を示す。Xは−CO−、−S−、又は−SO−を示し、Yは、同一又は異なって、−S−、−SO−、−O−、−CO−、−COO−、又は−CONH−を示す。nは0以上の整数を示す)]
で表される化合物である前記硬化性組成物を提供する。
In the present disclosure, the curable compound is also described in the following formula (1).
Figure JPOXMLDOC01-appb-C000004
[In the formula, R 1 and R 2 indicate the same or different curable functional groups, and D 1 and D 2 indicate the same or different single bond or linking group. L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
Figure JPOXMLDOC01-appb-C000005
(In the formula, Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group. X indicates -CO-, -S-. , Or -SO 2- , Y indicates the same or different, -S-, -SO 2- , -O-, -CO-, -COO-, or -CONH-. N is 0 or more. Indicates an integer)]
The curable composition which is a compound represented by is provided.
 本開示は、また、式(1)中のR、Rが、同一又は異なって、環状イミド構造を有する硬化性官能基である前記硬化性組成物を提供する。 The present disclosure also provides the curable composition in which R 1 and R 2 in the formula (1) are the same or different curable functional groups having a cyclic imide structure.
 本開示は、また、式(1)中のR、Rが、同一又は異なって、下記式(r−1)~(r−6)で表される基から選択される基である前記硬化性組成物を提供する。
Figure JPOXMLDOC01-appb-C000006
(式中の窒素原子から伸びる結合手は、D又はDと結合する)
In the present disclosure, R 1 and R 2 in the formula (1) are the same or different groups selected from the groups represented by the following formulas (r-1) to (r-6). A curable composition is provided.
Figure JPOXMLDOC01-appb-C000006
(The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
 本開示は、また、前記硬化性組成物の硬化物を提供する。 The present disclosure also provides a cured product of the curable composition.
 本開示は、また、前記硬化性組成物の半硬化物を提供する。 The present disclosure also provides a semi-cured product of the curable composition.
 本開示は、また、前記硬化物が基板に積層された構成を有する積層体を提供する。 The present disclosure also provides a laminate having a structure in which the cured product is laminated on a substrate.
 本開示は、また、基板が銅基板である前記積層体を提供する。 The present disclosure also provides the laminate in which the substrate is a copper substrate.
 本開示は、また、前記硬化性組成物の硬化物からなる基板上に、導体配線が施されたプリント基板を有する電子デバイスを提供する。 The present disclosure also provides an electronic device having a printed circuit board with conductor wiring on a substrate made of a cured product of the curable composition.
 本開示の硬化性組成物は、加熱することにより、耐熱性及び可とう性を有する硬化物が得られる。また、前記硬化物は、好ましくは低CTEであり、銅と同程度の熱線膨張整数を有する。そのため、前記硬化物が銅基板に積層されてなる積層体は、高温環境下に曝した場合にも、硬化物が収縮することによって、積層体がカールするという事態が発生するのを防止することができる。
 そのため、前記硬化性組成物は、例えば、銅配線を施す電子回路基板の原料として好適に使用することができる。
The curable composition of the present disclosure can be heated to obtain a cured product having heat resistance and flexibility. Further, the cured product preferably has a low CTE and has a heat ray expansion integer comparable to that of copper. Therefore, the laminated body in which the cured product is laminated on the copper substrate prevents the laminated body from being curled due to the shrinkage of the cured product even when exposed to a high temperature environment. Can be done.
Therefore, the curable composition can be suitably used, for example, as a raw material for an electronic circuit substrate to which copper wiring is applied.
調製例で得られたジアミン(1)のH−NMRスペクトル(DMSO−d)を示す図である。It is a figure which shows the 1 H-NMR spectrum (DMSO-d 6 ) of the diamine (1) obtained in the preparation example. 調製例で得られたジアミン(1)のFTIRスペクトルを示す図である。It is a figure which shows the FTIR spectrum of the diamine (1) obtained in the preparation example. 調製例で得られた硬化性化合物AのH−NMRスペクトル(CDCl)を示す図である。It is a figure which shows the 1 H-NMR spectrum (CDCl 3 ) of the curable compound A obtained in the preparation example. 調製例で得られた硬化性化合物AのFTIRスペクトルを示す図である。It is a figure which shows the FTIR spectrum of the curable compound A obtained in the preparation example. 実施例で使用したマイカ(NK−8G)の走査型電子顕微鏡像(SEM像)を示す図である。It is a figure which shows the scanning electron microscope image (SEM image) of the mica (NK-8G) used in an Example. 実施例で使用したマイカ(MAE)の走査型電子顕微鏡像(SEM像)を示す図である。It is a figure which shows the scanning electron microscope image (SEM image) of the mica (MAE) used in an Example. 実施例で使用したマイカ(ME100)の走査型電子顕微鏡像(SEM像)を示す図である。It is a figure which shows the scanning electron microscope image (SEM image) of the mica (ME100) used in an Example. 実施例で使用したマイカ(MK200)の走査型電子顕微鏡像(SEM像)を示す図である。It is a figure which shows the scanning electron microscope image (SEM image) of the mica (MK200) used in an Example.
 [硬化性組成物]
 本開示の硬化性組成物は、硬化性化合物とケイ酸塩とを含む硬化性組成物である。
[Curable composition]
The curable composition of the present disclosure is a curable composition containing a curable compound and a silicate.
 (硬化性化合物)
 前記硬化性化合物は、加熱処理を施すことにより硬化物を形成可能な化合物である。前記硬化性化合物としては、溶融温度が低く、且つ、溶剤溶解性に優れるため使用性に優れ、硬化物は超耐熱性を有する点で、下記式(1)で表される化合物が好ましい。
Figure JPOXMLDOC01-appb-C000007
(Curable compound)
The curable compound is a compound capable of forming a cured product by subjecting it to heat treatment. As the curable compound, a compound represented by the following formula (1) is preferable in that the melting temperature is low, the solvent solubility is excellent, the usability is excellent, and the cured product has super heat resistance.
Figure JPOXMLDOC01-appb-C000007
 式(1)中、R、Rは、同一又は異なって、硬化性官能基を示し、D、Dは、同一又は異なって、単結合又は連結基を示す。Lは、下記式(I)で表される構造と下記式(II)で表される構造とを含む繰り返し単位を有する2価の基を示す。
Figure JPOXMLDOC01-appb-C000008
(式中、Ar~Arは、同一又は異なって、アリーレン基、又は2個以上のアリーレン基が単結合若しくは連結基を介して結合した基を示す。Xは−CO−、−S−、又は−SO−を示し、Yは、同一又は異なって、−S−、−SO−、−O−、−CO−、−COO−、又は−CONH−を示す。nは0以上の整数を示す)
In formula (1), R 1 and R 2 represent the same or different curable functional group, and D 1 and D 2 represent the same or different single bond or linking group. L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
Figure JPOXMLDOC01-appb-C000008
(In the formula, Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group. X indicates -CO-, -S-. , Or -SO 2- , Y indicates the same or different, -S-, -SO 2- , -O-, -CO-, -COO-, or -CONH-. N is 0 or more. Indicates an integer)
 式中、R、Rは硬化性官能基を示す。R、Rは、それぞれ同一であっても、異なっていてもよい。R、Rにおける硬化性官能基としては、例えば、下記式(r)で表される基等の、環状イミド構造を有する硬化性官能基が好ましい。
Figure JPOXMLDOC01-appb-C000009
(式中の窒素原子から伸びる結合手は、D又はDと結合する)
In the formula, R 1 and R 2 represent curable functional groups. R 1 and R 2 may be the same or different from each other. As the curable functional group in R 1 and R 2 , for example, a curable functional group having a cyclic imide structure such as a group represented by the following formula (r) is preferable.
Figure JPOXMLDOC01-appb-C000009
(The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
 上記式(r)中、QはC又はCHを示す。式中の2個のQは単結合又は二重結合を介して結合する。n’は0以上の整数(例えば0~3の整数、好ましくは0又は1)である。R~Rは、同一又は異なって、水素原子、飽和又は不飽和脂肪族炭化水素基(好ましくは、炭素数1~10のアルキル基、炭素数2~10のアルケニル基、炭素数2~10のアルキニル基)、芳香族炭化水素基(好ましくは、フェニル基、ナフチル基等の炭素数6~10のアリール基)、又は前記飽和又は不飽和脂肪族炭化水素基と芳香族炭化水素基から選択される2個以上の基が結合した基を示す。R~Rから選択される2つの基は、互いに結合して、隣接する炭素原子と共に環を形成していてもよい。 In the above formula (r), Q represents C or CH. The two Qs in the formula are bonded via a single bond or a double bond. n'is an integer of 0 or more (for example, an integer of 0 to 3, preferably 0 or 1). R 3 to R 6 are the same or different, and have a hydrogen atom, a saturated or unsaturated aliphatic hydrocarbon group (preferably an alkyl group having 1 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and 2 to 10 carbon atoms). From 10 alkynyl groups), aromatic hydrocarbon groups (preferably aryl groups having 6 to 10 carbon atoms such as phenyl groups and naphthyl groups), or the saturated or unsaturated aliphatic hydrocarbon groups and aromatic hydrocarbon groups. Indicates a group to which two or more selected groups are bonded. The two groups selected from R 3 to R 6 may be bonded to each other to form a ring with adjacent carbon atoms.
 R~Rから選択される2つの基が互いに結合して、隣接する炭素原子と共に形成していてもよい環としては、例えば、炭素数3~20の脂環、及び炭素数6~14の芳香環を挙げることができる。前記炭素数3~20の脂環には、例えば、シクロプロパン環、シクロブタン環、シクロペンタン環、シクロヘキサン環等の3~20員(好ましくは3~15員、特に好ましくは5~8員)程度のシクロアルカン環;シクロペンテン環、シクロヘキセン環等の3~20員(好ましくは3~15員、特に好ましくは5~8員)程度のシクロアルケン環;パーヒドロナフタレン環、ノルボルナン環、ノルボルネン環、アダマンタン環、トリシクロ[5.2.1.02,6]デカン環、テトラシクロ[4.4.0.12,5.17,10]ドデカン環等の橋かけ環式炭化水素基等が含まれる。前記炭素数6~14の芳香環には、ベンゼン環、ナフタレン環等が含まれる。 Examples of the ring in which two groups selected from R 3 to R 6 may be bonded to each other to form together with adjacent carbon atoms include, for example, an alicyclic having 3 to 20 carbon atoms and 6 to 14 carbon atoms. Aromatic rings can be mentioned. The alicyclic having 3 to 20 carbon atoms has, for example, about 3 to 20 members (preferably 3 to 15 members, particularly preferably 5 to 8 members) such as a cyclopropane ring, a cyclobutane ring, a cyclopentane ring, and a cyclohexane ring. Cycloalkane ring; cycloalkene ring having about 3 to 20 members (preferably 3 to 15 members, particularly preferably 5 to 8 members) such as cyclopentene ring and cyclohexene ring; perhydronaphthalene ring, norbornane ring, norbornene ring, adamantane. Ring, tricyclo [5.2.1.0 2,6 ] decane ring, tetracyclo [4.4.0.1 2,5 . 17 and 10 ] Cross-linked cyclic hydrocarbon groups such as dodecane rings are included. The aromatic ring having 6 to 14 carbon atoms includes a benzene ring, a naphthalene ring and the like.
 前記環状イミド構造を有する硬化性官能基としては、なかでも、環状不飽和イミド構造を有する硬化性官能基、又はアリールエチニル基を備えた環状イミド構造を有する硬化性官能基が好ましく、特に好ましくは下記式(r−1)~(r−6)で表される基から選択される基であり、とりわけ好ましくは下記式(r−1)又は(r−5)で表される基である。
Figure JPOXMLDOC01-appb-C000010
(式中の窒素原子から伸びる結合手は、式(1)中のD又はDと結合する)
As the curable functional group having a cyclic imide structure, a curable functional group having a cyclic unsaturated imide structure or a curable functional group having a cyclic imide structure having an arylethynyl group is preferable, and particularly preferably. It is a group selected from the groups represented by the following formulas (r-1) to (r-6), and particularly preferably a group represented by the following formula (r-1) or (r-5).
Figure JPOXMLDOC01-appb-C000010
(The bond extending from the nitrogen atom in the formula binds to D 1 or D 2 in the formula (1))
 前記式(r−1)~(r−6)で表される基には1種又は2種以上の置換基が結合していてもよい。前記置換基としては、例えば、炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、及びハロゲン原子等が挙げられる。 One or more substituents may be bonded to the groups represented by the formulas (r-1) to (r-6). Examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom and the like.
 前記炭素数1~6のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、s−ブチル基、t−ブチル基、ペンチル基、ヘキシル基等の直鎖状又は分岐鎖状アルキル基を挙げることができる。 Examples of the alkyl group having 1 to 6 carbon atoms include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, an s-butyl group, a t-butyl group, a pentyl group, a hexyl group and the like. Chain-like or branched chain-like alkyl groups can be mentioned.
 前記炭素数1~6のアルコキシ基としては、例えば、メトキシ基、エトキシ基、ブトキシ基、t−ブチルオキシ基等の直鎖状又は分岐鎖状アルコキシ基を挙げることができる。 Examples of the alkoxy group having 1 to 6 carbon atoms include a linear or branched alkoxy group such as a methoxy group, an ethoxy group, a butoxy group, and a t-butyloxy group.
 式(1)中、D、Dは、同一又は異なって、単結合又は連結基を示す。前記連結基としては、例えば、2価の炭化水素基、2価の複素環式基、カルボニル基、エーテル結合、エステル結合、カーボネート結合、アミド結合、イミド結合、及びこれらが複数個連結した基等が挙げられる。 In formula (1), D 1 and D 2 represent a single bond or a linking group, which are the same or different. Examples of the linking group include a divalent hydrocarbon group, a divalent heterocyclic group, a carbonyl group, an ether bond, an ester bond, a carbonate bond, an amide bond, an imide bond, and a group in which a plurality of these are linked. Can be mentioned.
 前記2価の炭化水素基には、2価の脂肪族炭化水素基、2価の脂環式炭化水素基、及び2価の芳香族炭化水素基が含まれる。 The divalent hydrocarbon group includes a divalent aliphatic hydrocarbon group, a divalent alicyclic hydrocarbon group, and a divalent aromatic hydrocarbon group.
 前記2価の脂肪族炭化水素基としては、例えば、炭素数1~18の直鎖状又は分岐鎖状のアルキレン基、及び炭素数2~18の直鎖状又は分岐鎖状のアルケニレン基等が挙げられる。炭素数1~18の直鎖状又は分岐鎖状のアルキレン基としては、例えば、メチレン基、メチルメチレン基、ジメチルメチレン基、エチレン基、プロピレン基、トリメチレン基等が挙げられる。炭素数2~18の直鎖状又は分岐鎖状のアルケニレン基としては、例えば、ビニレン基、1−メチルビニレン基、プロペニレン基、1−ブテニレン基、2−ブテニレン基等が挙げられる。 Examples of the divalent aliphatic hydrocarbon group include a linear or branched alkylene group having 1 to 18 carbon atoms and a linear or branched alkaneylene group having 2 to 18 carbon atoms. Can be mentioned. Examples of the linear or branched alkylene group having 1 to 18 carbon atoms include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, a propylene group and a trimethylene group. Examples of the linear or branched alkenylene group having 2 to 18 carbon atoms include a vinylene group, a 1-methylvinylene group, a propenylene group, a 1-butenylene group, a 2-butenylene group and the like.
 前記2価の脂環式炭化水素基としては、炭素数3~18の2価の脂環式炭化水素基等が挙げられ、例えば、1,2−シクロペンチレン基、1,3−シクロペンチレン基、シクロペンチリデン基、1,2−シクロヘキシレン基、1,3−シクロヘキシレン基、1,4−シクロヘキシレン基、シクロヘキシリデン基等のシクロアルキレン基(シクロアルキリデン基を含む)等が挙げられる。 Examples of the divalent alicyclic hydrocarbon group include a divalent alicyclic hydrocarbon group having 3 to 18 carbon atoms, for example, 1,2-cyclopentylene group and 1,3-cyclopenti. Cycloalkylene groups (including cycloalkylidene group) such as len group, cyclopentylidene group, 1,2-cyclohexylene group, 1,3-cyclohexylene group, 1,4-cyclohexylene group, cyclohexylidene group Can be mentioned.
 前記2価の芳香族炭化水素基としては、炭素数6~14のアリーレン基等が挙げられ、例えば、1,4−フェニレン基、1,3−フェニレン基、4,4’−ビフェニレン基、3,3’−ビフェニレン基、2,6−ナフタレンジイル基、2,7−ナフタレンジイル基、1,8−ナフタレンジイル基、アントラセンジイル基等が挙げられる。 Examples of the divalent aromatic hydrocarbon group include an arylene group having 6 to 14 carbon atoms, for example, a 1,4-phenylene group, a 1,3-phenylene group, a 4,4'-biphenylene group, and 3 , 3'-biphenylene group, 2,6-naphthalenediyl group, 2,7-naphthalenediyl group, 1,8-naphthalenediyl group, anthracendiyl group and the like.
 前記2価の複素環式基を構成する複素環には、芳香族性複素環及び非芳香族性複素環が含まれる。このような複素環としては、環を構成する原子に炭素原子と少なくとも1種のヘテロ原子(例えば、酸素原子、イオウ原子、窒素原子等)を有する3~10員環(好ましくは4~6員環)、及びこれらの縮合環を挙げることができる。具体的には、ヘテロ原子として酸素原子を含む複素環(例えば、オキシラン環等の3員環;オキセタン環等の4員環;フラン環、テトラヒドロフラン環、オキサゾール環、イソオキサゾール環、γ−ブチロラクトン環等の5員環;4−オキソ−4H−ピラン環、テトラヒドロピラン環、モルホリン環等の6員環;ベンゾフラン環、イソベンゾフラン環、4−オキソ−4H−クロメン環、クロマン環、イソクロマン環等の縮合環;3−オキサトリシクロ[4.3.1.14,8]ウンデカン−2−オン環、3−オキサトリシクロ[4.2.1.04,8]ノナン−2−オン環等の橋かけ環)、ヘテロ原子としてイオウ原子を含む複素環(例えば、チオフェン環、チアゾール環、イソチアゾール環、チアジアゾール環等の5員環;4−オキソ−4H−チオピラン環等の6員環;ベンゾチオフェン環等の縮合環等)、ヘテロ原子として窒素原子を含む複素環(例えば、ピロール環、ピロリジン環、ピラゾール環、イミダゾール環、トリアゾール環等の5員環;イソシアヌル環、ピリジン環、ピリダジン環、ピリミジン環、ピラジン環、ピペリジン環、ピペラジン環等の6員環;インドール環、インドリン環、キノリン環、アクリジン環、ナフチリジン環、キナゾリン環、プリン環等の縮合環等)等が挙げられる。2価の複素環式基は上記複素環の構造式から2個の水素原子を除いた基である。 The heterocycle constituting the divalent heterocyclic group includes an aromatic heterocycle and a non-aromatic heterocycle. Such a heterocycle includes a 3 to 10-membered ring (preferably 4 to 6-membered) having a carbon atom and at least one heteroatom (for example, an oxygen atom, a sulfur atom, a nitrogen atom, etc.) in the atoms constituting the ring. Rings) and fused rings thereof. Specifically, a heterocycle containing an oxygen atom as a heteroatom (for example, a 3-membered ring such as an oxyran ring; a 4-membered ring such as an oxetane ring; a furan ring, a tetrahydrofuran ring, an oxazole ring, an isooxazole ring, a γ-butyrolactone ring). 5-membered rings such as 4-oxo-4H-pyran ring, tetrahydropyran ring, morpholin ring and the like; benzofuran ring, isobenzofuran ring, 4-oxo-4H-chromen ring, chroman ring, isochroman ring and the like. Fused rings; 3- oxatricyclo [4.3.1.1 4,8 ] undecane-2-one ring, 3-oxatricyclo [4.2.1.0 4,8 ] nonane-2-one ring , Etc.), Heterocycles containing sulfur atoms as heteroatoms (eg, 5-membered rings such as thiophene ring, thiazole ring, isothiazole ring, thiazizole ring; 6-membered ring such as 4-oxo-4H-thiopyran ring) A 5-membered ring such as a fused ring such as a benzothiophene ring or a heterocycle containing a nitrogen atom as a heteroatom (for example, a pyrrol ring, a pyrrolidine ring, a pyrazole ring, an imidazole ring, a triazole ring, etc.; isocyanul ring, a pyridine ring, a pyridazine). 6-membered rings such as a ring, a pyrimidine ring, a pyrazine ring, a piperidine ring, a piperazine ring; an indole ring, an indolin ring, a quinoline ring, an acridin ring, a naphthylidine ring, a quinazoline ring, a fused ring such as a purine ring, etc.) and the like. The divalent heterocyclic group is a group obtained by removing two hydrogen atoms from the structural formula of the heterocycle.
 前記D、Dとしては、なかでも、特に優れた耐熱性を有する硬化物が得られる点で、2価の芳香族炭化水素基を含むことが好ましい。前記2価の芳香族炭化水素基としては、炭素数6~14の2価の芳香族炭化水素基が好ましく、より好ましくは下記式(d−1)~(d−4)で表される基から選択される基であり、とりわけ好ましくは下記式(d−1)で表される基(1,2−フェニレン基、1,3−フェニレン基、又は1,4−フェニレン基)である。
Figure JPOXMLDOC01-appb-C000011
Among the D 1 and D 2 , it is preferable to contain a divalent aromatic hydrocarbon group in that a cured product having particularly excellent heat resistance can be obtained. As the divalent aromatic hydrocarbon group, a divalent aromatic hydrocarbon group having 6 to 14 carbon atoms is preferable, and a group represented by the following formulas (d-1) to (d-4) is more preferable. It is a group selected from, and particularly preferably a group represented by the following formula (d-1) (1,2-phenylene group, 1,3-phenylene group, or 1,4-phenylene group).
Figure JPOXMLDOC01-appb-C000011
 また、前記D、Dは、前記2価の芳香族炭化水素基と共に、カルボニル基、エーテル結合、エステル結合、カーボネート結合、アミド結合、及びイミド結合からなる群より選択される少なくとも1つの基が連結した基が好ましく、とりわけ前記2価の芳香族炭化水素基にエーテル結合が連結した基が好ましい。 Further, D 1 and D 2 are at least one group selected from the group consisting of a carbonyl group, an ether bond, an ester bond, a carbonate bond, an amide bond, and an imide bond together with the divalent aromatic hydrocarbon group. Is preferable, and a group in which an ether bond is linked to the divalent aromatic hydrocarbon group is particularly preferable.
 従って、式(1)中のR−D−基、及びR−D−基としては、同一又は異なって、下記式(rd−1)又は(rd−2)で表される基を含む基が好ましく、特に、下記式(rd−1−1)又は(rd−2−1)で表される基が好ましい。
Figure JPOXMLDOC01-appb-C000012
(式中のフェニレン基又は酸素原子から伸びる結合手は、式(1)中のLと結合する)
Therefore, the R 1- D 1 -group and the R 2- D 2- group in the formula (1) are the same or different and are represented by the following formula (rd-1) or (rd-2). A group containing the above is preferable, and a group represented by the following formula (rd-1-1) or (rd-2-1) is particularly preferable.
Figure JPOXMLDOC01-appb-C000012
(A bond extending from a phenylene group or an oxygen atom in the formula binds to L in the formula (1))
 式(1)中のLは、上記式(I)で表される構造と上記式(II)で表される構造とを含む繰り返し単位を有する2価の基を示す。式(I)、及び式(II)中のAr~Arは、同一又は異なって、アリーレン基、又は2個以上のアリーレン基が単結合若しくは連結基を介して結合した基を示す。Xは−CO−、−S−、又は−SO−を示し、Yは、同一又は異なって、−S−、−SO−、−O−、−CO−、−COO−、又は−CONH−を示す。nは0以上の整数を示し、例えば0~5の整数、好ましくは1~5の整数、特に好ましくは1~3の整数である。 L in the formula (1) represents a divalent group having a repeating unit including the structure represented by the above formula (I) and the structure represented by the above formula (II). Ars 1 to Ar 3 in the formula (I) and the formula (II) represent the same or different arylene groups, or groups in which two or more arylene groups are bonded via a single bond or a linking group. X is -CO -, - S-, or -SO 2 - indicates, Y are the same or different, -S -, - SO 2 - , - O -, - CO -, - COO-, or -CONH -Indicates. n represents an integer of 0 or more, for example, an integer of 0 to 5, preferably an integer of 1 to 5, and particularly preferably an integer of 1 to 3.
 前記アリーレン基は、芳香環(=芳香族炭化水素環)の構造式から2個の水素原子を除いた基である。そして、前記芳香環としては、例えば、ベンゼン、ナフタレン、アントラセン、フェナントレン等の炭素数6~14の芳香環が挙げられる。前記芳香環としては、なかでも、ベンゼン、ナフタレン等の炭素数6~10の芳香環が好ましく、前記アリーレン基としては、なかでも、炭素数6~10のアリーレン基が好ましい。 The arylene group is a group obtained by removing two hydrogen atoms from the structural formula of an aromatic ring (= aromatic hydrocarbon ring). Examples of the aromatic ring include aromatic rings having 6 to 14 carbon atoms such as benzene, naphthalene, anthracene, and phenanthrene. As the aromatic ring, an aromatic ring having 6 to 10 carbon atoms such as benzene and naphthalene is preferable, and as the allylene group, an arylene group having 6 to 10 carbon atoms is preferable.
 前記連結基としては、例えば、炭素数1~5の2価の炭化水素基や、炭素数1~5の2価の炭化水素基の水素原子の1個以上がハロゲン原子で置換された基等が挙げられる。 Examples of the linking group include a divalent hydrocarbon group having 1 to 5 carbon atoms, a group in which one or more hydrogen atoms of a divalent hydrocarbon group having 1 to 5 carbon atoms are substituted with halogen atoms, and the like. Can be mentioned.
 前記炭素数1~5の2価の炭化水素基には、例えば、メチレン基、メチルメチレン基、ジメチルメチレン基、ジメチレン基、トリメチレン基等の炭素数1~5の直鎖状又は分岐鎖状アルキレン基;ビニレン基、1−メチルビニレン基、プロペニレン基等の炭素数2~5の直鎖状又は分岐鎖状アルケニレン基;エチニレン基、プロピニレン基、1−メチルプロピニレン等の炭素数2~5の直鎖状又は分岐鎖状アルキニレン基等が含まれる。前記炭化水素基としては、なかでも、炭素数1~5の直鎖状又は分岐鎖状アルキレン基が好ましく、特に炭素数1~5の分岐鎖状アルキレン基が好ましい。 The divalent hydrocarbon group having 1 to 5 carbon atoms includes, for example, a linear or branched alkylene having 1 to 5 carbon atoms such as a methylene group, a methylmethylene group, a dimethylmethylene group, a dimethylene group, and a trimethylene group. Group: Linear or branched alkenylene group having 2 to 5 carbon atoms such as vinylene group, 1-methylvinylene group and propenylene group; 2 to 5 carbon atoms such as ethynylene group, propynylene group and 1-methylpropinylene group. A linear or branched alkynylene group or the like is included. As the hydrocarbon group, a linear or branched alkylene group having 1 to 5 carbon atoms is preferable, and a branched chain alkylene group having 1 to 5 carbon atoms is particularly preferable.
 従って、前記Ar~Arとしては、同一又は異なって、炭素数6~14のアリーレン基、又は炭素数6~14のアリーレン基の2個以上が、単結合、炭素数1~5の直鎖状又は分岐鎖状アルキレン基、又は炭素数1~5の直鎖状又は分岐鎖状アルキレン基の水素原子の1個以上がハロゲン原子で置換された基を介して結合した基であることが好ましく、特に、炭素数6~14のアリーレン基、又は炭素数6~14のアリーレン基の2個以上が、単結合、炭素数1~5の分岐鎖状アルキレン基、又は炭素数1~5の分岐鎖状アルキレン基の水素原子の1個以上がハロゲン原子で置換された基を介して結合した基であることが好ましい。 Therefore, the Ar 1 to Ar 3 are the same or different, and two or more of the arylene groups having 6 to 14 carbon atoms or the arylene groups having 6 to 14 carbon atoms are single bonds and are directly linked to those having 1 to 5 carbon atoms. A chain or branched alkylene group, or a group in which one or more hydrogen atoms of a linear or branched alkylene group having 1 to 5 carbon atoms are bonded via a group substituted with a halogen atom. Preferably, in particular, two or more arylene groups having 6 to 14 carbon atoms or arylene groups having 6 to 14 carbon atoms are single bonds, branched chain alkylene groups having 1 to 5 carbon atoms, or 1 to 5 carbon atoms. It is preferable that one or more of the hydrogen atoms of the branched alkylene group are bonded via a group substituted with a halogen atom.
 前記Ar~Arとしては、とりわけ、同一又は異なって、下記式(a−1)~(a−5)で表される基から選択される基が好ましい。尚、下記式中の結合手の付き位置は、特に制限されない。
Figure JPOXMLDOC01-appb-C000013
As the Ars 1 to Ar 3 , groups selected from the groups represented by the following formulas (a-1) to (a-5), which are the same or different from each other, are particularly preferable. The position of the joint in the following formula is not particularly limited.
Figure JPOXMLDOC01-appb-C000013
 式(I)中のAr、Arとしては、なかでも、炭素数6~14のアリーレン基が好ましく、特に、上記式(a−1)又は(a−2)で表される基が好ましい。また、式(I)中のXとしては、なかでも、−CO−又は−SO−が好ましい。式(I)で表される構造としては、とりわけ、ベンゾフェノン由来の構造を含むことが好ましい。 As Ar 1 and Ar 2 in the formula (I), an arylene group having 6 to 14 carbon atoms is preferable, and a group represented by the above formula (a-1) or (a-2) is particularly preferable. .. As the X in the formula (I), inter alia, -CO- or -SO 2 - it is preferred. The structure represented by the formula (I) preferably includes a structure derived from benzophenone.
 式(1)で表される化合物全量における、芳香環由来の構造の割合は50重量%以上であり、例えば50~90重量%、好ましくは60~90重量%、特に好ましくは65~80重量%である。 The proportion of the structure derived from the aromatic ring in the total amount of the compound represented by the formula (1) is 50% by weight or more, for example, 50 to 90% by weight, preferably 60 to 90% by weight, particularly preferably 65 to 80% by weight. Is.
 式(1)で表される化合物全量における、ベンゾフェノン由来の構造単位の占める割合は、例えば5重量%以上、好ましくは10~62重量%、特に好ましくは15~60重量%である。 The proportion of the structural unit derived from benzophenone in the total amount of the compound represented by the formula (1) is, for example, 5% by weight or more, preferably 10 to 62% by weight, and particularly preferably 15 to 60% by weight.
 式(II)中のArとしては、なかでも、上記式(a−1)、(a−4)、及び(a−5)で表される基から選択される基が好ましい。また、Yとしては、なかでも、−S−、−O−、又は−SO−が好ましい。式(II)で表される構造としては、特に、ハイドロキノン、レゾルシノール、2,6−ナフタレンジオール、2,7−ナフタレンジオール、4,4’−ジヒドロキシビフェニル、4,4’−ジヒドロキシジフェニルエーテル、4,4’−ジヒドロキシベンゾフェノン、4,4’−ジヒドロキシジフェニルスルフィド、4,4’−ジヒドロキシジフェニルスルフォン、及びビスフェノールAから選択される少なくとも1種の化合物由来の構造を含むことが好ましく、とりわけ、ハイドロキノン、レゾルシノール、及びビスフェノールAから選択される少なくとも1種の化合物由来の構造を含むことが好ましい。 As Ar 3 in the formula (II), a group selected from the groups represented by the above formulas (a-1), (a-4), and (a-5) is preferable. Further, as Y, -S-, -O-, or -SO 2- is preferable. The structures represented by the formula (II) include, in particular, hydroquinone, resorcinol, 2,6-naphthalenediol, 2,7-naphthalenediol, 4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenyl ether, 4, It preferably contains a structure derived from at least one compound selected from 4'-dihydroxybenzophenone, 4,4'-dihydroxydiphenylsulfide, 4,4'-dihydroxydiphenylsulphon, and bisphenol A, in particular hydroquinone, resorcinol. , And structures derived from at least one compound selected from bisphenol A.
 式(1)で表される化合物全量における、ハイドロキノン、レゾルシノール、2,6−ナフタレンジオール、2,7−ナフタレンジオール、4,4’−ジヒドロキシビフェニル、4,4’−ジヒドロキシジフェニルエーテル、4,4’−ジヒドロキシベンゾフェノン、4,4’−ジヒドロキシジフェニルスルフィド、4,4’−ジヒドロキシジフェニルスルフォン、及びビスフェノールA由来の構造単位の占める割合は、例えば5重量%以上、好ましくは10~55重量%、特に好ましくは15~53重量%である。 Hydroquinone, resorcinol, 2,6-naphthalenediol, 2,7-naphthalenediol, 4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenyl ether, 4,4'in the total amount of the compound represented by the formula (1). The proportion of structural units derived from −dihydroxybenzophenone, 4,4′-dihydroxydiphenylsulfide, 4,4′-dihydroxydiphenylsulphon, and bisphenol A is, for example, 5% by weight or more, preferably 10 to 55% by weight, particularly preferably. Is 15 to 53% by weight.
 また、式(1)で表される化合物全量における、ハイドロキノン、レゾルシノール、及びビスフェノールA由来の構造単位の占める割合は、例えば5重量%以上、好ましくは10~55重量%、特に好ましくは15~53重量%である。 The proportion of the structural units derived from hydroquinone, resorcinol, and bisphenol A in the total amount of the compound represented by the formula (1) is, for example, 5% by weight or more, preferably 10 to 55% by weight, and particularly preferably 15 to 53. By weight%.
 式(1)中のLとしては、なかでも、耐熱性に特に優れた硬化物が得られる点で、下記式(L−1)で表される2価の基が好ましい。
Figure JPOXMLDOC01-appb-C000014
As L in the formula (1), a divalent group represented by the following formula (L-1) is preferable in that a cured product having particularly excellent heat resistance can be obtained.
Figure JPOXMLDOC01-appb-C000014
 上記式(L−1)中のmは、分子鎖(=上記式(L−1)で表される2価の基)中に含まれる丸括弧内に示される繰り返し単位の数、すなわち、平均重合度であり、例えば2~50、好ましくは3~40、より好ましくは4~30、特に好ましくは5~20、最も好ましくは5~10である。mが2未満である場合は、得られる硬化物の強度や耐熱性が不十分となる傾向がある。一方、mが50超である場合は、溶融温度が高くなる傾向がある。また、溶剤溶解性が低下する傾向もある。尚、mの値は、GPC測定やNMRのスペクトル解析により求めることができる。また、上記式(L−1)中のn”は0以上の整数を示し、Ar~Ar、X、Yは上記に同じ。尚、上記式(L−1)中の複数のArは同じ基を示す。Ar、Arについても同様である。 M in the above formula (L-1) is the number of repeating units shown in parentheses contained in the molecular chain (= divalent group represented by the above formula (L-1)), that is, the average. The degree of polymerization is, for example, 2 to 50, preferably 3 to 40, more preferably 4 to 30, particularly preferably 5 to 20, and most preferably 5 to 10. When m is less than 2, the strength and heat resistance of the obtained cured product tend to be insufficient. On the other hand, when m is more than 50, the melting temperature tends to be high. There is also a tendency for solvent solubility to decrease. The value of m can be obtained by GPC measurement or NMR spectrum analysis. Further, n "in the above formula (L-1) indicates an integer of 0 or more, and Ar 1 to Ar 3 , X, and Y are the same as above. In addition, a plurality of Ar 1 in the above formula (L-1). Indicates the same group. The same applies to Ar 2 and Ar 3.
 式(1)中のLとしては、とりわけ、下記式(L−1−1)又は(L−1−2)で表される2価の基であることが好ましい。
Figure JPOXMLDOC01-appb-C000015
The L in the formula (1) is particularly preferably a divalent group represented by the following formula (L-1-1) or (L-1-2).
Figure JPOXMLDOC01-appb-C000015
 上記式中のm1、m2は、分子鎖(=上記式(L−1−1)又は(L−1−2)で表される2価の基)中に含まれる丸括弧内に示される繰り返し単位の数、すなわち、平均重合度であり、例えば2~50、好ましくは3~40、より好ましくは4~30、特に好ましくは5~20、最も好ましくは5~10である。尚、m1、m2の値は、GPC測定やNMRのスペクトル解析により求めることができる。 M1 and m2 in the above formula are repetitions shown in parentheses contained in the molecular chain (= divalent group represented by the above formula (L-1-1) or (L-1-2)). The number of units, that is, the average degree of polymerization, is, for example, 2 to 50, preferably 3 to 40, more preferably 4 to 30, particularly preferably 5 to 20, and most preferably 5 to 10. The values of m1 and m2 can be obtained by GPC measurement or NMR spectrum analysis.
 また、式(1)で表される化合物のうち、式(1)中のLが上記式(L−1−1)又は(L−1−2)で表される2価の基であり、式中のm1、m2が5~10である化合物は、300℃以下(250℃程度)で溶融するため、PEEK等に比べて低温で溶融成形することができ、加工性に特に優れる。 Further, among the compounds represented by the formula (1), L in the formula (1) is a divalent group represented by the above formula (L-1-1) or (L-1-2). Since the compounds having m1 and m2 of 5 to 10 in the formula melt at 300 ° C. or lower (about 250 ° C.), they can be melt-molded at a lower temperature than PEEK or the like, and are particularly excellent in processability.
 一方、分子鎖の平均重合度が上記範囲を下回ると、得られる硬化物がもろくなり機械特性が低下する傾向がある。また、分子鎖の平均重合度が上記範囲を上回ると、溶剤への溶解性が低下したり、溶融粘度が高くなる等により、加工性が低下する傾向がある。 On the other hand, if the average degree of polymerization of the molecular chains is less than the above range, the obtained cured product tends to be brittle and the mechanical properties tend to deteriorate. Further, when the average degree of polymerization of the molecular chain exceeds the above range, the solubility in a solvent is lowered, the melt viscosity is increased, and the processability tends to be lowered.
 前記硬化性化合物の数平均分子量(Mn)は、例えば1000~15000、好ましくは1000~14000、特に好ましくは1100~12000、最も好ましくは1200~10000である。前記数平均分子量を有する硬化性化合物は、溶剤への溶解性は高く、溶融粘度は低く、成形加工が容易であるとともに、得られる硬化物(若しくは、硬化後の成形体)が高い靱性を発現する。数平均分子量が上記範囲を下回ると、得られる硬化物の靱性が低下する傾向がある。一方、数平均分子量が上記範囲を上回ると、硬化性化合物の溶剤溶解性が低下したり、溶融粘度が高くなりすぎて、加工性が低下する傾向がある。尚、Mnはゲル・パーミエーション・クロマトグラフィー(GPC)測定(溶剤:クロロホルム、標準ポリスチレン換算)に付して求められる。 The number average molecular weight (Mn) of the curable compound is, for example, 1000 to 15000, preferably 1000 to 14000, particularly preferably 1100 to 12000, and most preferably 1200 to 10000. The curable compound having a number average molecular weight has high solubility in a solvent, low melt viscosity, easy molding, and the obtained cured product (or molded product after curing) exhibits high toughness. To do. When the number average molecular weight is less than the above range, the toughness of the obtained cured product tends to decrease. On the other hand, when the number average molecular weight exceeds the above range, the solvent solubility of the curable compound tends to decrease, or the melt viscosity tends to become too high, resulting in a decrease in processability. Mn is obtained by subjecting it to gel permeation chromatography (GPC) measurement (solvent: chloroform, standard polystyrene conversion).
 前記硬化性化合物は良好な溶剤溶解性を有する。前記溶剤としては、例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン;ホルムアミド、アセトアミド、N−メチル−2−ピロリドン(NMP)、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等のアミド;塩化メチレン、クロロホルム、1,2−ジクロロエタン、クロロベンゼン、ブロモベンゼン、ジクロロベンゼン、ベンゾトリフルオライド、ヘキサフルオロ−2−プロパノール等のハロゲン化炭化水素;ジメチルスルホキシド(DMSO)、ジエチルスルホキシド、ベンジルフェニルスルホキシド等のスルホキシド;ジエチルエーテル、ジイソプロピルエーテル、ジブチルエーテル、テトラヒドロフラン(THF)、ジオキサン、1,2−ジメトキシエタン、シクロペンチルメチルエーテル等のエーテル;酢酸エチル等のエステル;アセトニトリル、ベンゾニトリル等のニトリル;ベンゼン、トルエン、キシレン等の芳香族炭化水素;及びこれらの2種以上の混合液等が挙げられる。前記硬化性化合物は、なかでも、エーテル、ケトン、アミド、ハロゲン化炭化水素、及びスルホキシドから選択される少なくとも1種の溶剤(とりわけ、エーテル、アミド、ハロゲン化炭化水素、及びスルホキシドから選択される少なくとも1種の溶剤)に対して優れた溶解性を示す。 The curable compound has good solvent solubility. Examples of the solvent include ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; formamide, acetamide, N-methyl-2-pyrrolidone (NMP), N, N-dimethylformamide, N, N-dimethylacetamide and the like. Amides; halogenated hydrocarbons such as methylene chloride, chloroform, 1,2-dichloroethane, chlorobenzene, bromobenzene, dichlorobenzene, benzotrifluoride, hexafluoro-2-propanol; dimethyl sulfoxide (DMSO), diethyl sulfoxide, benzylphenyl sulfoxide Sulfoxides such as: diethyl ether, diisopropyl ether, dibutyl ether, tetrahydrofuran (THF), dioxane, 1,2-dimethoxyethane, cyclopentylmethyl ether and the like; esters such as ethyl acetate; nitriles such as acetonitrile and benzonitrile; benzene, Aromatic hydrocarbons such as toluene and xylene; and a mixture of two or more of these can be mentioned. The curable compound is at least one solvent selected from ethers, ketones, amides, halogenated hydrocarbons, and sulfoxides (particularly, at least one selected from ethers, amides, halogenated hydrocarbons, and sulfoxides). It shows excellent solubility in one type of solvent).
 前記硬化性化合物の溶剤に対する溶解度は、25℃において溶剤100gに対して、例えば1g以上、好ましくは5g以上、特に好ましくは10g以上である。 The solubility of the curable compound in a solvent is, for example, 1 g or more, preferably 5 g or more, particularly preferably 10 g or more, with respect to 100 g of the solvent at 25 ° C.
 前記硬化性化合物の窒素原子含有量は、例えば2.8~0.1重量%、好ましくは2.5~0.15重量%、より好ましくは2.0~0.20重量%、特に好ましくは1.8~0.40重量%、最も好ましくは1.5~0.70である。窒素原子含有量は、例えばCHN元素分析により求めることができる。窒素原子含有量が上記範囲である硬化性化合物は、溶剤溶解性に優れ、靱性や耐熱性に優れた硬化物を形成することができる。一方、窒素原子含有量が上記範囲を下回ると、靱性や耐熱性に優れた硬化物を形成することが困難となる傾向がある。また、窒素原子含有量が上記範囲を上回ると、溶剤溶解性が低下する傾向がある。 The nitrogen atom content of the curable compound is, for example, 2.8 to 0.1% by weight, preferably 2.5 to 0.15% by weight, more preferably 2.0 to 0.20% by weight, and particularly preferably 2.0 to 0.20% by weight. It is 1.8 to 0.40% by weight, most preferably 1.5 to 0.70. The nitrogen atom content can be determined, for example, by CHN elemental analysis. A curable compound having a nitrogen atom content in the above range can form a cured product having excellent solvent solubility and excellent toughness and heat resistance. On the other hand, when the nitrogen atom content is less than the above range, it tends to be difficult to form a cured product having excellent toughness and heat resistance. Further, when the nitrogen atom content exceeds the above range, the solvent solubility tends to decrease.
 前記硬化性化合物のガラス転移温度(Tg)は、例えば280℃以下(例えば80~280℃)、好ましくは80~250℃、特に好ましくは100~200℃である。前記硬化性化合物が上記範囲のTgを有すると、溶融温度が低いので(すなわち、該硬化性化合物を溶融する際に、低い温度での加熱により溶融することができるので)、加工性に優れる。一方、前記硬化性化合物のTgが上記範囲を上回ると、溶融温度が高くなるため、加工性が低下する傾向がある。 The glass transition temperature (Tg) of the curable compound is, for example, 280 ° C. or lower (for example, 80 to 280 ° C.), preferably 80 to 250 ° C., and particularly preferably 100 to 200 ° C. When the curable compound has Tg in the above range, the melting temperature is low (that is, when the curable compound is melted, it can be melted by heating at a low temperature), so that the processability is excellent. On the other hand, when the Tg of the curable compound exceeds the above range, the melting temperature rises and the processability tends to decrease.
 上記式(1)で表される化合物は、例えば、Polymer 1989 p978に記載されている合成法を利用して製造することができる。下記に、上記式(1)で表される化合物の製造方法の一例を示すが、上記式(1)で表される化合物は、この製造方法によって製造されるものに限定されない。 The compound represented by the above formula (1) can be produced, for example, by using the synthetic method described in Polymer 1989, p978. An example of a method for producing a compound represented by the above formula (1) is shown below, but the compound represented by the above formula (1) is not limited to that produced by this production method.
 下記式(1a)で表される化合物は、例えば下記工程[1]~[3]を経て製造することができる。下記式中、Ar~Ar、X、Y、n、R~R、Q、n’は上記に同じ。Dは連結基を示し、Zはハロゲン原子を示す。mは繰り返し単位の平均重合度であり、例えば3~50、好ましくは4~30、特に好ましくは5~20である。上記式(1)で表される化合物のうち、下記式(1a)で表される化合物以外の化合物も、下記方法に準じて製造することができる。
工程[1]:反応基質である下記式(2)で表される化合物と下記式(3)で表される化合物とを、塩基の存在下で反応させることにより、下記式(4)で表される化合物を得る。
工程[2]:下記式(4)で表される化合物に、アミノアルコール(下記式(5)で表される化合物)を反応させることにより、下記式(6)で表されるジアミンを得る。
工程[3]:下記式(6)で表されるジアミンに環状酸無水物(下記式(7)で表される化合物)を反応させることにより下記式(1a)で表される化合物を得る。
The compound represented by the following formula (1a) can be produced, for example, through the following steps [1] to [3]. In the following formula, Ar 1 to Ar 3 , X, Y, n, R 3 to R 6 , Q, n'are the same as above. D represents a linking group and Z represents a halogen atom. m is the average degree of polymerization of the repeating unit, for example, 3 to 50, preferably 4 to 30, particularly preferably 5 to 20. Among the compounds represented by the above formula (1), compounds other than the compound represented by the following formula (1a) can also be produced according to the following method.
Step [1]: The reaction substrate is represented by the following formula (4) by reacting the compound represented by the following formula (2) with the compound represented by the following formula (3) in the presence of a base. Obtain the compound to be.
Step [2]: A diamine represented by the following formula (6) is obtained by reacting a compound represented by the following formula (4) with an amino alcohol (a compound represented by the following formula (5)).
Step [3]: A compound represented by the following formula (1a) is obtained by reacting a diamine represented by the following formula (6) with a cyclic acid anhydride (a compound represented by the following formula (7)).
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 (工程[1])
 上記式(2)で表される化合物としては、例えば、ベンゾフェノン、2−ナフチルフェニルケトン、及びビス(2−ナフチル)ケトン等のハロゲン化物、及びこれらの誘導体等が挙げられる。
(Step [1])
Examples of the compound represented by the above formula (2) include halides such as benzophenone, 2-naphthylphenyl ketone, and bis (2-naphthyl) ketone, and derivatives thereof.
 上記式(3)で表される化合物としては、例えば、ハイドロキノン、レゾルシノール、2,6−ナフタレンジオール、2,7−ナフタレンジオール、1,5−ナフタレンジオール、4,4’−ジヒドロキシビフェニル、4,4’−ジヒドロキシジフェニルエーテル、4,4’−ジヒドロキシベンゾフェノン、4,4’−ジヒドロキシジフェニルスルフィド、4,4’−ジヒドロキシジフェニルスルフォン、ビスフェノールA、ビスフェノールF、ビスフェノールS、2,5−ジヒドロキシビフェニル、及びこれらの誘導体などが挙げられる。 Examples of the compound represented by the above formula (3) include hydroquinone, resorcinol, 2,6-naphthalene diol, 2,7-naphthalene diol, 1,5-naphthalene diol, 4,4'-dihydroxybiphenyl, 4, 4'-dihydroxydiphenyl ether, 4,4'-dihydroxybenzophenone, 4,4'-dihydroxydiphenylsulfide, 4,4'-dihydroxydiphenyl sulfone, bisphenol A, bisphenol F, bisphenol S, 2,5-dihydroxybiphenyl, and these. Derivatives of
 上記誘導体としては、例えば、上記式(2)で表される化合物や式(3)で表される化合物の芳香族炭化水素基に置換基が結合した化合物などが挙げられる。前記置換基としては、例えば、炭素数1~6のアルキル基、炭素数1~6のアルコキシ基、及びハロゲン原子等が挙げられる。 Examples of the derivative include a compound represented by the above formula (2) and a compound in which a substituent is bonded to an aromatic hydrocarbon group of the compound represented by the formula (3). Examples of the substituent include an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a halogen atom and the like.
 式(2)で表される化合物と式(3)で表される化合物の使用量としては、通常、式(3)で表される化合物1モルに対して、式(2)で表される化合物を1モル以上であり、所望の化合物(1)における分子鎖の平均重合度に応じて、式(2)で表される化合物の使用量を調整することが望ましい。例えば、平均重合度5の場合、式(3)で表される化合物1モルに対して、式(2)で表される化合物を1.2モル程度(例えば1.18~1.22モル)、平均重合度10の場合は、式(2)で表される化合物を1.1モル程度(例えば1.08~1.12モル)、平均重合度20の場合は、式(2)で表される化合物を1.05モル程度(例えば1.04~1.06モル)使用することが好ましい。 The amount of the compound represented by the formula (2) and the compound represented by the formula (3) is usually represented by the formula (2) with respect to 1 mol of the compound represented by the formula (3). It is desirable that the amount of the compound is 1 mol or more, and the amount of the compound represented by the formula (2) used is adjusted according to the average degree of polymerization of the molecular chains in the desired compound (1). For example, in the case of an average degree of polymerization of 5, about 1.2 mol of the compound represented by the formula (2) is about 1.2 mol (for example, 1.18 to 1.22 mol) with respect to 1 mol of the compound represented by the formula (3). When the average degree of polymerization is 10, the compound represented by the formula (2) is represented by about 1.1 mol (for example, 1.08 to 1.12 mol), and when the average degree of polymerization is 20, the compound represented by the formula (2) is represented. It is preferable to use about 1.05 mol (for example, 1.04 to 1.06 mol) of the compound to be used.
 式(2)で表される化合物としては、少なくともベンゾフェノンのハロゲン化物を使用することが好ましく、式(2)で表される化合物の総使用量(100モル%)におけるベンゾフェノンのハロゲン化物の使用量は、例えば10モル%以上、好ましくは30モル%以上、特に好ましくは50モル%以上、最も好ましくは80モル%以上である。尚、上限は100モル%である。 As the compound represented by the formula (2), it is preferable to use at least a halide of benzophenone, and the amount of the halide of benzophenone used in the total amount of the compound represented by the formula (2) (100 mol%). Is, for example, 10 mol% or more, preferably 30 mol% or more, particularly preferably 50 mol% or more, and most preferably 80 mol% or more. The upper limit is 100 mol%.
 式(3)で表される化合物としては、ハイドロキノン、レゾルシノール、2,6−ナフタレンジオール、2,7−ナフタレンジオール、4,4’−ジヒドロキシビフェニル、4,4’−ジヒドロキシジフェニルエーテル、4,4’−ジヒドロキシベンゾフェノン、4,4’−ジヒドロキシジフェニルスルフィド、4,4’−ジヒドロキシジフェニルスルフォン、及びビスフェノールAから選択される少なくとも1種(とりわけ、ハイドロキノン、レゾルシノール、及びビスフェノールAから選択される少なくとも1種)の化合物を使用することが好ましく、前記化合物の使用量の合計は、式(3)で表される化合物の総使用量(100モル%)の、例えば10モル%以上、好ましくは30モル%以上、特に好ましくは50モル%以上、最も好ましくは80モル%以上である。尚、上限は100モル%である。 Examples of the compound represented by the formula (3) include hydroquinone, resorcinol, 2,6-naphthalene diol, 2,7-naphthalene diol, 4,4'-dihydroxybiphenyl, 4,4'-dihydroxydiphenyl ether, and 4,4'. At least one selected from −dihydroxybenzophenone, 4,4′-dihydroxydiphenylsulfide, 4,4′-dihydroxydiphenylsulphon, and bisphenol A (particularly at least one selected from hydroquinone, resorcinol, and bisphenol A). The compound is preferably used, and the total amount of the compounds used is, for example, 10 mol% or more, preferably 30 mol% or more, of the total amount of the compound represented by the formula (3) (100 mol%). , Particularly preferably 50 mol% or more, and most preferably 80 mol% or more. The upper limit is 100 mol%.
 前記式(2)で表される化合物と式(3)で表される化合物の反応は、塩基(例えば、水酸化ナトリウム、水酸化カリウム、水酸化カルシウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム等の無機塩基;ピリジン、トリエチルアミン等の有機塩基から選択される少なくとも1種)の存在下で行われる。塩基の使用量は塩基の種類によって適宜調整することができる。例えば、水酸化カルシウム等の二酸塩基の使用量は、式(3)で表される化合物1モルに対して1.0~2.0モル程度である。 The reaction between the compound represented by the formula (2) and the compound represented by the formula (3) is a base (for example, sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate, potassium carbonate, sodium hydrogencarbonate, etc.). Inorganic bases; at least one selected from organic bases such as pyridine and triethylamine). The amount of base used can be appropriately adjusted depending on the type of base. For example, the amount of the diacid base such as calcium hydroxide used is about 1.0 to 2.0 mol with respect to 1 mol of the compound represented by the formula (3).
 また、この反応は溶剤の存在下で行うことができる。前記溶剤としては、例えば、N−メチル−2−ピロリドン、ジメチルホルムアミド、ジメチルスルホキシド、アセトン、テトラヒドロフラン、トルエン等の有機溶剤、或いはこれらの2種以上の混合溶剤を用いることができる。 Also, this reaction can be carried out in the presence of a solvent. As the solvent, for example, an organic solvent such as N-methyl-2-pyrrolidone, dimethylformamide, dimethyl sulfoxide, acetone, tetrahydrofuran, or toluene, or a mixed solvent of two or more of these can be used.
 前記溶剤の使用量としては、反応基質の合計(重量)に対して、例えば5~20重量倍程度である。溶剤の使用量が上記範囲を上回ると反応基質の濃度が低くなり、反応速度が低下する傾向がある。 The amount of the solvent used is, for example, about 5 to 20 times by weight with respect to the total (weight) of the reaction substrates. If the amount of the solvent used exceeds the above range, the concentration of the reaction substrate tends to decrease, and the reaction rate tends to decrease.
 反応雰囲気としては反応を阻害しない限り特に限定されず、例えば、空気雰囲気、窒素雰囲気、アルゴン雰囲気等の何れであってもよい。 The reaction atmosphere is not particularly limited as long as it does not inhibit the reaction, and may be, for example, an air atmosphere, a nitrogen atmosphere, an argon atmosphere, or the like.
 反応温度は、例えば100~200℃程度である。反応時間は、例えば5~24時間程度である。また、この反応はバッチ式、セミバッチ式、連続式等の何れの方法でも行うことができる。 The reaction temperature is, for example, about 100 to 200 ° C. The reaction time is, for example, about 5 to 24 hours. Further, this reaction can be carried out by any method such as batch type, semi-batch type and continuous type.
 この反応終了後、得られた反応生成物は、例えば、濾過、濃縮、蒸留、抽出、晶析、吸着、再結晶、カラムクロマトグラフィー等の分離手段や、これらを組み合わせた分離手段により分離精製できる。 After completion of this reaction, the obtained reaction product can be separated and purified by, for example, separation means such as filtration, concentration, distillation, extraction, crystallization, adsorption, recrystallization, column chromatography, or a separation means combining these. ..
 (工程[2])
 上記式(5)で表される化合物としては、例えば、4−アミノフェノール、2−アミノ−6−ヒドロキシナフタレン、及びこれらの位置異性体や誘導体等が挙げられる。
(Step [2])
Examples of the compound represented by the above formula (5) include 4-aminophenol, 2-amino-6-hydroxynaphthalene, and positional isomers and derivatives thereof.
 上記式(5)で表される化合物の使用量は、所望の硬化性化合物における分子鎖の平均重合度に応じて適宜調整することができる。例えば、平均重合度5の場合、式(3)で表される化合物1モルに対して、0.4~0.6モル程度となる量、平均重合度10の場合、式(3)で表される化合物1モルに対して、0.2~0.4モル程度となる量、平均重合度20の場合、式(3)で表される化合物1モルに対して、0.1~0.15モル程度となる量である。 The amount of the compound represented by the above formula (5) can be appropriately adjusted according to the average degree of polymerization of the molecular chains in the desired curable compound. For example, in the case of an average degree of polymerization of 5, the amount is about 0.4 to 0.6 mol with respect to 1 mol of the compound represented by the formula (3), and in the case of an average degree of polymerization of 10, it is represented by the formula (3). In the case of an amount of about 0.2 to 0.4 mol with respect to 1 mol of the compound to be obtained and an average degree of polymerization of 20, 0.1 to 0. The amount is about 15 mol.
 この反応は進行に伴いハロゲン化水素が生成するため、生成したハロゲン化水素をトラップする塩基の存在下で反応を行うことが、反応の進行を促進する効果が得られる点で好ましい。前記塩基としては、例えば、水酸化ナトリウム、水酸化カリウム、水酸化カルシウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム等の無機塩基;ピリジン、トリエチルアミン等の有機塩基を挙げることができる。これらは1種を単独で、又は2種以上を組み合わせて使用することができる。 Since this reaction produces hydrogen halide as it progresses, it is preferable to carry out the reaction in the presence of a base that traps the generated hydrogen halide, because the effect of accelerating the progress of the reaction can be obtained. Examples of the base include inorganic bases such as sodium hydroxide, potassium hydroxide, calcium hydroxide, sodium carbonate, potassium carbonate and sodium hydrogen carbonate; and organic bases such as pyridine and triethylamine. These can be used alone or in combination of two or more.
 前記塩基の使用量は塩基の種類によって適宜調整することができる。例えば、水酸化ナトリウム等の一酸塩基の使用量は、上記式(5)で表される化合物1モルに対して1.0~3.0モル程度である。 The amount of the base used can be appropriately adjusted depending on the type of base. For example, the amount of a monoacid base such as sodium hydroxide used is about 1.0 to 3.0 mol with respect to 1 mol of the compound represented by the above formula (5).
 また、この反応は溶剤の存在下で行うことができる。溶剤としては、工程[1]において使用されるものと同様のものを使用することができる。 Also, this reaction can be carried out in the presence of a solvent. As the solvent, the same solvent as that used in the step [1] can be used.
 反応温度は、例えば100~200℃程度である。反応時間は、例えば1~15時間程度である。また、この反応はバッチ式、セミバッチ式、連続式等の何れの方法でも行うことができる。 The reaction temperature is, for example, about 100 to 200 ° C. The reaction time is, for example, about 1 to 15 hours. Further, this reaction can be carried out by any method such as batch type, semi-batch type and continuous type.
 この反応終了後、得られた反応生成物は、例えば、濾過、濃縮、蒸留、抽出、晶析、吸着、再結晶、カラムクロマトグラフィー等の分離手段や、これらを組み合わせた分離手段により分離精製できる。 After completion of this reaction, the obtained reaction product can be separated and purified by, for example, separation means such as filtration, concentration, distillation, extraction, crystallization, adsorption, recrystallization, column chromatography, or a separation means combining these. ..
 (工程[3])
 前記環状酸無水物(上記式(7)で表される化合物)としては、例えば、無水マレイン酸、2−フェニル無水マレイン酸、4−フェニルエチニル−無水フタル酸、4−(1−ナフチルエチニル)−無水フタル酸、ビシクロ[2.2.1]ヘプト−5−エン−2,3−ジカルボン酸無水物、及びこれらの誘導体等が挙げられる。
(Step [3])
Examples of the cyclic acid anhydride (compound represented by the above formula (7)) include maleic anhydride, 2-phenylmaleic anhydride, 4-phenylethynyl-phthalic anhydride, and 4- (1-naphthylethaneyl). -Maleic anhydride, bicyclo [2.2.1] hept-5-ene-2,3-dicarboxylic acid anhydride, derivatives thereof and the like can be mentioned.
 前記環状酸無水物の使用量は、所望の硬化性化合物における分子鎖の平均重合度に応じて適宜調整することができる。例えば、平均重合度5の場合、式(3)で表される化合物1モルに対して、0.4~0.8モル程度となる量、平均重合度10の場合、式(3)で表される化合物1モルに対して、0.2~0.4モル程度となる量、平均重合度20の場合、式(3)で表される化合物1モルに対して、0.1~0.15モル程度となる量である。 The amount of the cyclic acid anhydride used can be appropriately adjusted according to the average degree of polymerization of the molecular chains in the desired curable compound. For example, when the average degree of polymerization is 5, the amount is about 0.4 to 0.8 mol with respect to 1 mol of the compound represented by the formula (3), and when the average degree of polymerization is 10, it is represented by the formula (3). In the case of an amount of about 0.2 to 0.4 mol with respect to 1 mol of the compound to be obtained and an average degree of polymerization of 20, 0.1 to 0. The amount is about 15 mol.
 この反応は溶剤の存在下で行うことができる。溶剤としては、工程[1]において使用されるものと同様のものを使用することができる。 This reaction can be carried out in the presence of a solvent. As the solvent, the same solvent as that used in the step [1] can be used.
 この反応は、室温(1~30℃)で行うことが好ましい。反応時間は、例えば1~30時間程度である。また、この反応はバッチ式、セミバッチ式、連続式等の何れの方法でも行うことができる。 This reaction is preferably carried out at room temperature (1 to 30 ° C.). The reaction time is, for example, about 1 to 30 hours. Further, this reaction can be carried out by any method such as batch type, semi-batch type and continuous type.
 また、この反応は、水と共沸する溶剤(例えば、トルエン等)を用いた共沸や、脱水剤(例えば、無水酢酸等)の使用により、副生する生成水を除去することが、反応の進行を促進する点で好ましい。また、脱水剤による生成水の除去は、塩基性触媒(例えば、トリエチルアミン等)の存在下で行うことが好ましい。 Further, this reaction involves removing the by-produced water by azeotroping with a solvent that azeotropes with water (for example, toluene or the like) or by using a dehydrating agent (for example, acetic anhydride). It is preferable in that it promotes the progress of. Further, the removal of the produced water with a dehydrating agent is preferably performed in the presence of a basic catalyst (for example, triethylamine or the like).
 この反応終了後、得られた反応生成物は、例えば、濾過、濃縮、蒸留、抽出、晶析、吸着、再結晶、カラムクロマトグラフィー等の分離手段や、これらを組み合わせた分離手段により分離精製できる。 After completion of this reaction, the obtained reaction product can be separated and purified by, for example, separation means such as filtration, concentration, distillation, extraction, crystallization, adsorption, recrystallization, column chromatography, or a separation means combining these. ..
 式(1)で表される化合物の発熱ピーク温度は、硬化性官能基の種類に依存するが、例えば170~450℃、好ましくは200~430℃、特に好ましくは220~420℃である。例えば、式(1)で表される化合物であって、R,Rが上記式(r−5)で表される基である場合、発熱ピーク温度は250℃程度である。尚、発熱ピーク温度は、DSC測定により求められる。 The exothermic peak temperature of the compound represented by the formula (1) depends on the type of curable functional group, but is, for example, 170 to 450 ° C., preferably 200 to 430 ° C., particularly preferably 220 to 420 ° C. For example, in the case of the compound represented by the formula (1) and R 1 and R 2 are the groups represented by the above formula (r-5), the exothermic peak temperature is about 250 ° C. The exothermic peak temperature is determined by DSC measurement.
 前記硬化性組成物は、上記硬化性化合物の1種を単独で含有してもよいし、上記硬化性化合物の2種以上を組み合わせて含有していてもよい。前記硬化性組成物全量(若しくは、前記硬化性組成物における不揮発分全量)における前記硬化性化合物の含有量(2種以上含有する場合は、その総量)は、例えば30重量%以上、好ましくは50重量%以上、特に好ましくは70重量%以上、最も好ましくは90重量%以上である。尚、上限は例えば95重量%である。 The curable composition may contain one of the curable compounds alone, or may contain two or more of the curable compounds in combination. The content of the curable compound in the total amount of the curable composition (or the total amount of the non-volatile content in the curable composition) (or the total amount when two or more kinds are contained) is, for example, 30% by weight or more, preferably 50. By weight or more, particularly preferably 70% by weight or more, most preferably 90% by weight or more. The upper limit is, for example, 95% by weight.
 (ケイ酸塩)
 前記ケイ酸塩は、例えばSiO四面体からなるアニオンの複数個が平面的に連なったSi−O四面体シート構造を少なく有する化合物である。そして、前記四面体シート構造を形成するSiの一部は、Al3+、Fe3+、B3+、Ge4+等の陽イオンで置換されていてもよい。また、前記ケイ酸塩は、四面体シート構造以外にも八面体シート構造を有していてもよく、八面体シート構造は、Li、Mg2+、Fe2+、AL3+、Fe3+等の陽イオンを含んでいてもよい。更にまた、前記ケイ酸塩は、四面体シート構造や八面体シート構造等のシート構造の層間にアルカリ金属イオンを有していてもよい。
(Silicate)
The silicate, for example a plurality of anions consisting of SiO 4 tetrahedron is a compound having less SiO tetrahedral sheet structure continuous to plane. Then, a part of Si forming the tetrahedral sheet structure may be replaced with cations such as Al 3+ , Fe 3+ , B 3+ , and Ge 4+. Further, the silicate may have an octahedral sheet structure in addition to the tetrahedral sheet structure, and the octahedral sheet structure is positive such as Li + , Mg 2+ , Fe 2+ , AL 3+ , Fe 3+ and the like. It may contain ions. Furthermore, the silicate may have alkali metal ions between layers of a sheet structure such as a tetrahedral sheet structure or an octahedral sheet structure.
 前記ケイ酸塩には、例えば、マイカ(雲母)、カオリン、タルク、シリカ、モンモリロナイト等が含まれる。なかでも、分散性に優れる点でマイカが好ましい。 The silicate includes, for example, mica (mica), kaolin, talc, silica, montmorillonite and the like. Of these, mica is preferable because it has excellent dispersibility.
 前記ケイ酸塩の形状には、薄片状、粒子状、針状等の種々の形状が含まれるが、なかでも、分散性に優れる点で、薄片状ケイ酸塩が好ましい。 The shape of the silicate includes various shapes such as flaky, particulate, and needle-like, and among them, flaky silicate is preferable in terms of excellent dispersibility.
 前記薄片状ケイ酸塩の厚みWは、例えば0.5μm以下、好ましくは0.01~0.5μm、特に好ましくは0.05~0.5μmである。 The thickness W of the flaky silicate is, for example, 0.5 μm or less, preferably 0.01 to 0.5 μm, and particularly preferably 0.05 to 0.5 μm.
 前記薄片状ケイ酸塩の最大径Lは、例えば5~40μm、好ましくは6~35μm、特に好ましくは7~30μmである。 The maximum diameter L 1 of the flaky silicate is, for example, 5 to 40 μm, preferably 6 to 35 μm, and particularly preferably 7 to 30 μm.
 前記薄片状ケイ酸塩の最大径Lに直交する径L(以後、「交差径L」と称する場合がある)は、例えば3~30μm、好ましくは5~20μm、特に好ましくは8~15μmである。 The diameter L 2 (hereinafter, may be referred to as “cross diameter L 2 ”) orthogonal to the maximum diameter L 1 of the flaky silicate is, for example, 3 to 30 μm, preferably 5 to 20 μm, and particularly preferably 8 to. It is 15 μm.
 前記薄片状ケイ酸塩の最大径Lと交差径Lと厚みWは、下記式(a)、(b)を満たすことが好ましい。
 0.2L≦L≦L   (a)
 0.001L≦W≦0.08L   (b)
The maximum diameter L 1 of the flaky silicate, the cross diameter L 2 and the thickness W preferably satisfy the following formulas (a) and (b).
0.2L 1 ≤ L 2 ≤ L 1 (a)
0.001L 1 ≤ W ≤ 0.08L 1 (b)
 前記薄片状ケイ酸塩の最大径Lと交差径Lと厚みWは、下記式(a’)、(b)、(c)を満たすことが更に好ましい。
 0.3L≦L≦0.9L   (a’)
 0.001L≦W≦0.08L   (b)
 0.005L≦W≦0.4L   (c)
It is more preferable that the maximum diameter L 1 of the flaky silicate, the cross diameter L 2 and the thickness W satisfy the following formulas (a'), (b) and (c).
0.3L 1 ≤ L 2 ≤ 0.9L 1 (a')
0.001L 1 ≤ W ≤ 0.08L 1 (b)
0.005L 2 ≤ W ≤ 0.4L 2 (c)
 尚、前記薄片状ケイ酸塩の径L、L、及び厚みWは、例えば、画像解析法により求められる。すなわち、電子顕微鏡(SEM)を用いて十分な数(例えば10個以上)の粒子状物質について電子顕微鏡像を撮影し、これらの粒子状物質の最大径、交差径、及び厚みを計測し、これを算術平均することにより求められる。 The diameters L 1 , L 2 and the thickness W of the flaky silicate are obtained by, for example, an image analysis method. That is, an electron microscope (SEM) is used to take an electron microscope image of a sufficient number (for example, 10 or more) of particulate matter, and the maximum diameter, cross diameter, and thickness of these particulate matter are measured. Is calculated by arithmetically averaging.
 また、前記ケイ酸塩には親水性ケイ酸塩及び親油性ケイ酸塩が含まれる。そして、親水性ケイ酸塩は薄片状のものは、厚膜状のものに比べて分散性に優れ、硬化性組成物に低CTE性を付与する効果を有する。また、親油性ケイ酸塩は、粒径にかかわらず分散性に優れる。 In addition, the silicate includes hydrophilic silicate and lipophilic silicate. The hydrophilic silicate in the form of flakes is superior in dispersibility as in the form of thick film, and has the effect of imparting low CTE property to the curable composition. Further, the lipophilic silicate has excellent dispersibility regardless of the particle size.
 前記親油性ケイ酸塩は、シート構造の層間に有するアルカリ金属イオンの少なくとも一部が、親油性を示す有機イオン(例えば、第四級アンモニウムイオン等)に置換されたものである。 The lipophilic silicate is one in which at least a part of the alkali metal ions contained between the layers of the sheet structure is replaced with an organic ion exhibiting lipophilicity (for example, a quaternary ammonium ion).
 前記第四級アンモニウムイオンは、例えば、下記式(d)で示される。
Figure JPOXMLDOC01-appb-C000017
(式中、R、R、R及びRは、同一又は異なって、ヒドロキシ基を有していてもよい炭素数1~20のアルキル基を表す)
The quaternary ammonium ion is represented by, for example, the following formula (d).
Figure JPOXMLDOC01-appb-C000017
(In the formula, R a , R b , R c and R d represent alkyl groups having 1 to 20 carbon atoms which may have the same or different hydroxy groups).
 前記親油性ケイ酸塩の形状は、厚片状或いは粒子状である。親油性ケイ酸塩の最大径Lは例えば1~30μm、好ましくは2~25μm、特に好ましくは3~20μmである。前記最大径Lに直交する交差径Lは、最大径Lの0.1~0.9倍、好ましくは0.2~0.8倍である。また、厚みWは、最大径Lの0.05~1.0倍、好ましくは0.1~0.9倍である。 The shape of the lipophilic silicate is in the form of flakes or particles. The maximum diameter L 3 of the lipophilic silicate is, for example, 1 to 30 μm, preferably 2 to 25 μm, and particularly preferably 3 to 20 μm. The cross diameter L 4 perpendicular to the maximum diameter L 3 is from 0.1 to 0.9 times the maximum diameter L 3, preferably 0.2 to 0.8 times. The thickness W 1 is 0.05 to 1.0 times, preferably 0.1 to 0.9 times, the maximum diameter L 3.
 更に、前記ケイ酸塩には、膨潤型ケイ酸塩及び非膨潤型ケイ酸塩が含まれる。非膨潤型ケイ酸塩は耐熱性に優れる。一方、膨潤型ケイ酸塩は、層間にNaを含有し、親水性を示す場合は耐熱性に優れるが、前記Naが有機イオンで置換された場合には、親油性を獲得し、耐熱性が低下する傾向がある。 Further, the silicates include swelling silicates and non-swelling silicates. Non-swelling silicate has excellent heat resistance. On the other hand, the swollen silicate contains Na + between layers and is excellent in heat resistance when it exhibits hydrophilicity, but when the Na + is replaced with an organic ion, it acquires lipophilicity and is heat resistant. The sex tends to decrease.
 更にまた、前記ケイ酸塩は、適度の応力吸収性を備えることが、分散性に優れる点で好ましい。そして、適度の応力吸収性を備えるケイ酸塩としては、下記特性1と特性2とを兼ね備えるケイ酸塩が好ましい。
特性1:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが5.0mmとなるまでケイ酸塩を充填し、最大加圧7MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じる
特性2:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが3.0mmとなるまでケイ酸塩を充填し、最大加圧5MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じない
Furthermore, it is preferable that the silicate has an appropriate stress absorption property from the viewpoint of excellent dispersibility. As the silicate having appropriate stress absorption, a silicate having the following characteristics 1 and 2 is preferable.
Characteristic 1: A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises. Characteristic 2: Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface. The billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes. Does not cause swelling on the surface of
 上記特性1と特性2とを兼ね備えるケイ酸塩としては、非膨潤型のケイ酸塩(好ましくは、非膨潤型のケイ酸塩であって、上記径L、L、及び厚みWが上記式(a)、(b)を満たすケイ酸塩)が挙げられる。 The silicate having both the above-mentioned characteristics 1 and the above-mentioned property 2 is a non-swelling type silicate (preferably a non-swelling type silicate having the above diameters L 1 , L 2 and the thickness W. A silicate that satisfies the formulas (a) and (b)).
 更にまた、前記ケイ酸塩としては、アルカリ金属を含むケイ酸塩(より詳細には、シート構造の層間にアルカリ金属を含むケイ酸塩、すなわち非膨潤型ケイ酸塩)が、分散性と耐熱性に優れる点で好ましい。 Furthermore, as the silicate, a silicate containing an alkali metal (more specifically, a silicate containing an alkali metal between the layers of the sheet structure, that is, a non-swelling silicate) has dispersibility and heat resistance. It is preferable because it has excellent properties.
 前記アルカリ金属含有量(2種以上含有する場合はその総量)は、ケイ酸塩全量の例えば7.0重量%以上であることが好ましく、より好ましくは8.0重量%以上、特に好ましくは9.0重量%以上、最も好ましくは9.5重量%以上である。尚、アルカリ金属含有量の上限は、例えば20重量%、好ましくは15重量%、特に好ましくは10重量%である。 The alkali metal content (when two or more kinds are contained, the total amount thereof) is preferably, for example, 7.0% by weight or more, more preferably 8.0% by weight or more, and particularly preferably 9 of the total amount of silicate. It is 0.0% by weight or more, most preferably 9.5% by weight or more. The upper limit of the alkali metal content is, for example, 20% by weight, preferably 15% by weight, and particularly preferably 10% by weight.
 また、アルカリ金属のなかでも特にカリウムの含有量は、ケイ酸塩全量の例えば1.0重量%以上であることが好ましく、より好ましくは3.0重量%以上、特に好ましくは5.0重量%以上、最も好ましくは7.0重量%以上である。尚、カリウムの含有量の上限は、例えば20重量%、好ましくは15重量%、特に好ましくは10重量%である。 Further, among the alkali metals, the content of potassium is preferably, for example, 1.0% by weight or more, more preferably 3.0% by weight or more, and particularly preferably 5.0% by weight, based on the total amount of silicate. As mentioned above, it is most preferably 7.0% by weight or more. The upper limit of the potassium content is, for example, 20% by weight, preferably 15% by weight, and particularly preferably 10% by weight.
 アルカリ金属のなかでも特にナトリウムの含有量は、ケイ酸塩全量の例えば5.0重量%以下であることが好ましく、より好ましくは3.0重量%以下、更に好ましくは3.0重量%未満、特に好ましくは1.0重量%下、最も好ましくは0.5重量%以下、とりわけ好ましくは0.1重量%以下である。 Among the alkali metals, the content of sodium is preferably, for example, 5.0% by weight or less, more preferably 3.0% by weight or less, still more preferably less than 3.0% by weight, based on the total amount of silicate. It is particularly preferably 1.0% by weight or less, most preferably 0.5% by weight or less, and particularly preferably 0.1% by weight or less.
 アルカリ金属(特にカリウムとナトリウム)を上記範囲で含有するケイ酸塩には、非膨潤型ケイ酸塩(特に、非膨潤型マイカ)が含まれる。 Silicates containing alkali metals (particularly potassium and sodium) in the above range include non-swelling silicates (particularly non-swelling mica).
 また、前記ケイ酸塩としては、マグネシウムを含むケイ酸塩(より詳細には、マグネシウムを含む八面体シート構造を有するケイ酸塩)が分散性に優れる点で好ましい。前記マグネシウム含有量は、ケイ酸塩全量の10重量%以上(例えば10~30重量%)であることが好ましく、なかでも15重量%以上(例えば15~20重量%)であることが好ましい。 Further, as the silicate, a silicate containing magnesium (more specifically, a silicate having an octahedral sheet structure containing magnesium) is preferable in that it has excellent dispersibility. The magnesium content is preferably 10% by weight or more (for example, 10 to 30% by weight) of the total amount of silicate, and more preferably 15% by weight or more (for example, 15 to 20% by weight).
 マグネシウムを上記範囲で含有するケイ酸塩としては、例えば、上記薄片状ケイ酸塩や親油性ケイ酸塩が挙げられる。 Examples of the silicate containing magnesium in the above range include the above-mentioned flaky silicate and lipophilic silicate.
 更に、前記ケイ酸塩としては、アルミニウムを含むケイ酸塩(より詳細には、アルミニウムを含む八面体シート構造を有するケイ酸塩)が分散性に優れる点で好ましい。前記アルミニウム含有量は、ケイ酸塩全量の0.5重量%以上であることが好ましく、より好ましくは1.0重量%以上、特に好ましくは3.0重量%以上、最も好ましくは5.0重量%以上である。尚、アルミニウムの含有量の上限は、例えば15重量%、好ましくは10重量%、特に好ましくは8重量%である。 Further, as the silicate, a silicate containing aluminum (more specifically, a silicate having an octahedral sheet structure containing aluminum) is preferable in that it has excellent dispersibility. The aluminum content is preferably 0.5% by weight or more, more preferably 1.0% by weight or more, particularly preferably 3.0% by weight or more, and most preferably 5.0% by weight of the total amount of silicate. % Or more. The upper limit of the aluminum content is, for example, 15% by weight, preferably 10% by weight, and particularly preferably 8% by weight.
 アルミニウムを上記範囲で含有するケイ酸塩としては、例えば、上記薄片状ケイ酸塩や親油性ケイ酸塩が挙げられる。 Examples of the silicate containing aluminum in the above range include the above-mentioned flaky silicate and lipophilic silicate.
 更にまた、前記ケイ酸塩としては、フッ素原子を含むケイ酸塩が、耐熱性及び電気特性に優れるため(詳細には、誘電率や誘電正接が低い)、得られる硬化物が優れた電気特性を発揮することができる点で好ましい。前記フッ素原子含有量は、ケイ酸塩全量の0.5重量%以上であることが好ましく、より好ましくは1.0重量%以上、特に好ましくは3.0重量%以上、最も好ましくは5.0重量%以上である。尚、フッ素原子の含有量の上限は、例えば20重量%、好ましくは15重量%、特に好ましくは10重量%である。 Furthermore, as the silicate, since the silicate containing a fluorine atom has excellent heat resistance and electrical properties (specifically, the dielectric constant and the dielectric loss tangent are low), the obtained cured product has excellent electrical properties. It is preferable in that it can exert. The fluorine atom content is preferably 0.5% by weight or more, more preferably 1.0% by weight or more, particularly preferably 3.0% by weight or more, and most preferably 5.0% by weight of the total amount of silicate. Weight% or more. The upper limit of the content of fluorine atoms is, for example, 20% by weight, preferably 15% by weight, and particularly preferably 10% by weight.
 フッ素原子を上記範囲で含有するケイ酸塩としては、合成マイカが挙げられる。 Examples of the silicate containing a fluorine atom in the above range include synthetic mica.
 ケイ酸塩の含有量は、硬化性化合物100重量部に対して0.01~95重量部、好ましくは40~70重量部、より好ましくは45~65重量部、特に好ましくは50~60重量部である。前記硬化性組成物はケイ酸塩を上記範囲で含有するため、耐熱性(例えば、200℃程度の耐熱性)及び可とう性を有する硬化物を形成することができる。 The content of the silicate is 0.01 to 95 parts by weight, preferably 40 to 70 parts by weight, more preferably 45 to 65 parts by weight, and particularly preferably 50 to 60 parts by weight with respect to 100 parts by weight of the curable compound. Is. Since the curable composition contains a silicate in the above range, a cured product having heat resistance (for example, heat resistance of about 200 ° C.) and flexibility can be formed.
 特に、ケイ酸塩として非膨潤型ケイ酸塩又は親水性の膨潤型ケイ酸塩、若しくは薄片状ケイ酸塩を上記範囲で含有する場合、耐熱性(例えば、300℃以上の耐熱性)及び可とう性(マンドレル試験にて、例えば直径5mm以下、好ましくは直径3mm以下)を有する硬化物を形成することができる。 In particular, when a non-swelling silicate, a hydrophilic swelling silicate, or a flaky silicate is contained in the above range as the silicate, heat resistance (for example, heat resistance of 300 ° C. or higher) and possible A cured product having flexibility (in a mandrel test, for example, a diameter of 5 mm or less, preferably a diameter of 3 mm or less) can be formed.
 また、ケイ酸塩として、非膨潤型ケイ酸塩又は親油性の膨潤型ケイ酸塩、若しくは薄片状ケイ酸塩を上記範囲で含有する場合、低CTE及び可とう性(マンドレル試験にて、例えば直径5mm以下、好ましくは直径3mm以下)を有する硬化物を形成することができる。 Further, when the silicate contains a non-swelling silicate, a lipophilic swelling silicate, or a flaky silicate in the above range, low CTE and flexibility (in a mandrel test, for example, A cured product having a diameter of 5 mm or less, preferably 3 mm or less in diameter) can be formed.
 更に、ケイ酸塩として薄片状ケイ酸塩(好ましくは、非膨潤型の薄片状ケイ酸塩)を上記範囲で含有する場合、低CTE、耐熱性(例えば、300℃以上の耐熱性)、及び可とう性(マンドレル試験にて、例えば直径5mm以下、好ましくは直径3mm以下)を有する硬化物を形成することができる。 Further, when flaky silicate (preferably non-swelling flaky silicate) is contained in the above range as the silicate, low CTE, heat resistance (for example, heat resistance of 300 ° C. or higher), and A cured product having flexibility (in a mandrel test, for example, a diameter of 5 mm or less, preferably a diameter of 3 mm or less) can be formed.
 前記硬化物のCTE(線膨張係数)は、例えば10×10−6~50×10−6/℃、好ましくは10×10−6~30×10−6/℃である。そして、前記硬化物のCTEは、温度範囲が異なっても変化が小さい。例えば、Tgより低温領域における線膨張係数(α1)と、Tgより高温領域における線膨張係数(α2)の差は小さく、α2/α1は、例えば2.0以下である。 The CTE (coefficient of linear expansion) of the cured product is, for example, 10 × 10 -6 to 50 × 10 -6 / ° C, preferably 10 × 10 -6 to 30 × 10 -6 / ° C. The CTE of the cured product changes little even if the temperature range is different. For example, the difference between the coefficient of linear expansion (α1) in the region lower than Tg and the coefficient of linear expansion (α2) in the region higher than Tg is small, and α2 / α1 is, for example, 2.0 or less.
 前記ケイ酸塩は、上述の通り、粒子形状や性質(親水性/親油性、膨潤型/非膨潤型)によって、硬化性組成物や前記硬化性組成物の硬化物に付与することができる性能に差異を有する。そのため、用途や求められる特性に応じてケイ酸塩を選択して使用することが好ましい。 As described above, the silicate can be imparted to a curable composition or a cured product of the curable composition depending on the particle shape and properties (hydrophilic / lipophilic, swelling type / non-swelling type). Have a difference in. Therefore, it is preferable to select and use a silicate according to the application and required characteristics.
 (他の成分)
 前記硬化性組成物は、前記硬化性化合物とケイ酸塩以外にも、必要に応じて他の成分を含有していてもよい。他の成分としては、例えば、触媒、ラジカル重合開始剤、有機樹脂(シリコーン樹脂、エポキシ樹脂、フッ素樹脂など)、溶剤、安定化剤(酸化防止剤、紫外線吸収剤、耐光安定剤、熱安定化剤など)、難燃剤(リン系難燃剤、ハロゲン系難燃剤、無機系難燃剤など)、難燃助剤、補強材、核剤、カップリング剤、滑剤、ワックス、可塑剤、離型剤、耐衝撃性改良剤、色相改良剤、流動性改良剤、着色剤(染料、顔料など)、分散剤、消泡剤、脱泡剤、抗菌剤、防腐剤、粘度調整剤、増粘剤等が挙げられる。これらは、1種を単独で、又は2種以上を組み合わせて使用することができる。
(Other ingredients)
The curable composition may contain other components, if necessary, in addition to the curable compound and the silicate. Other components include, for example, catalysts, radical polymerization initiators, organic resins (silicone resins, epoxy resins, fluororesins, etc.), solvents, stabilizers (antioxidants, UV absorbers, light retardant stabilizers, thermal stabilization). Agents, etc.), flame retardants (phosphorus flame retardants, halogen flame retardants, inorganic flame retardants, etc.), flame retardants, reinforcing materials, nucleating agents, coupling agents, lubricants, waxes, plasticizers, mold release agents, Impact resistance improver, hue improver, fluidity improver, colorant (dye, pigment, etc.), dispersant, defoaming agent, defoaming agent, antibacterial agent, preservative, viscosity modifier, thickener, etc. Can be mentioned. These can be used alone or in combination of two or more.
 他の成分(特に、他の不揮発成分)の含有量(2種以上含有する場合はその総量)は、上記硬化性組成物全量の、例えば50重量%以下、好ましくは40重量%以下、更に好ましくは30重量%以下、特に好ましくは20重量%以下、最も好ましくは10重量%以下、とりわけ好ましくは5重量%以下である。 The content of other components (particularly, other non-volatile components) (the total amount when two or more types are contained) is, for example, 50% by weight or less, preferably 40% by weight or less, more preferably 40% by weight or less, based on the total amount of the curable composition. Is 30% by weight or less, particularly preferably 20% by weight or less, most preferably 10% by weight or less, and particularly preferably 5% by weight or less.
 前記硬化性組成物は、硬化性化合物として上記式(1)で表される化合物を少なくとも含有することが好ましい。また、上記式(1)で表される化合物以外の硬化性化合物も含有していてもよいが、硬化性組成物に含まれる硬化性化合物全量(100重量%)における上記式(1)で表される化合物の占める割合は、例えば70重量%以上、好ましくは80重量%以上、特に好ましくは90重量%以上である。尚、上限は100重量%である。従って、上記式(1)で表される化合物以外の硬化性化合物の含有量は、硬化性組成物に含まれる硬化性化合物全量(100重量%)の、例えば30重量%以下、好ましくは20重量%以下、特に好ましくは10重量%以下である。 The curable composition preferably contains at least the compound represented by the above formula (1) as a curable compound. Further, a curable compound other than the compound represented by the above formula (1) may be contained, but it is represented by the above formula (1) in the total amount (100% by weight) of the curable compound contained in the curable composition. The proportion of the compound is, for example, 70% by weight or more, preferably 80% by weight or more, and particularly preferably 90% by weight or more. The upper limit is 100% by weight. Therefore, the content of the curable compound other than the compound represented by the above formula (1) is, for example, 30% by weight or less, preferably 20% by weight, based on the total amount (100% by weight) of the curable compound contained in the curable composition. % Or less, particularly preferably 10% by weight or less.
 前記硬化性組成物が硬化性化合物として上記式(1)で表される化合物を含有する場合、上記式(1)で表される化合物は、例えば、ケトン、アミド、ハロゲン化炭化水素、スルホキシド、エーテル、エステル、ニトリル、芳香族炭化水素、及びこれらの2種以上の混合液への溶解性に優れるため、これらの溶剤を含有することができる。 When the curable composition contains a compound represented by the above formula (1) as a curable compound, the compound represented by the above formula (1) is, for example, a ketone, an amide, a halogenated hydrocarbon, a sulfoxide, or the like. Since it has excellent solubility in ethers, esters, nitriles, aromatic hydrocarbons, and a mixture of two or more of these, these solvents can be contained.
 前記硬化性組成物は加熱することにより、耐熱性及び可とう性を有する硬化物を形成することができる。また、特定のケイ酸塩を含有する場合は、低CTE、耐熱性、及び可とう性を有する硬化物を形成することができる。更に、前記硬化性組成物の硬化物は、難燃性、及び良好な誘電特性(低い比誘電率及び誘電正接)を有する。 By heating the curable composition, a cured product having heat resistance and flexibility can be formed. Further, when a specific silicate is contained, a cured product having low CTE, heat resistance, and flexibility can be formed. Further, the cured product of the curable composition has flame retardancy and good dielectric properties (low relative permittivity and dielectric loss tangent).
 また、前記硬化性組成物は、加熱温度及び加熱時間を調整して、硬化反応を完了させず途中で停止させることにより、半硬化物(Bステージ)を形成することができる。 Further, the curable composition can form a semi-cured product (B stage) by adjusting the heating temperature and the heating time and stopping the curing reaction in the middle without completing the curing reaction.
 前記硬化性組成物は上記特性を有するため、例えば、電子情報機器、家電、自動車、精密機械、航空機、宇宙産業用機器、エネルギー分野(油田掘削パイプ/チューブ、燃料容器)等の過酷な環境温度条件下で使用される複合材(繊維強化プラスチック、プリプレグ等)の成形材料(例えば、サイジング剤)や、遮蔽材料、伝導材料(例えば、熱伝導材料等)、絶縁材料、接着剤(例えば、耐熱性接着剤等)などの機能材料として好適に使用することができる。その他、封止剤、塗料、コーティング剤、インク、シーラント、レジスト、造形材、形成材[スラストワッシャー、オイルフィルター、シール、ベアリング、ギア、シリンダーヘッドカバー、ベアリングリテーナー、インテークマニホールド、ペダル等の自動車部品;基材、電子回路基板(特に、銅配線を施す電子回路基板)、電気絶縁材(絶縁膜等)、積層板、電子ペーパー、タッチパネル、太陽電池基板、光導波路、導光板、ホログラフィックメモリ、シリコンウェハキャリアー、ICチップトレイ、電解コンデンサトレイ、絶縁フィルム等の半導体・液晶製造装置部品;レンズ等の光学部品;ポンプ、バルブ、シール等のコンプレッサー部品;航空機のキャビン内装部品;滅菌器具、カラム、配管等の医療器具部品や食品・飲料製造設備部品;パーソナルコンピューター、携帯電話などに使用されるような筐体、パーソナルコンピューターの内部でキーボードを支持する部材であるキーボード支持体に代表されるような電気・電子機器用部材等の形成材]等として好ましく使用できる。 Since the curable composition has the above characteristics, for example, harsh environmental temperatures in the fields of electronic information equipment, home appliances, automobiles, precision machinery, aircraft, space industry equipment, energy fields (oil drilling pipes / tubes, fuel containers), etc. Molding materials (eg, sizing agents) for composites (fiber reinforced plastics, prepregs, etc.) used under conditions, shielding materials, conductive materials (eg, heat conductive materials, etc.), insulating materials, adhesives (eg, heat resistant). It can be suitably used as a functional material such as a sex adhesive). In addition, sealants, paints, coating agents, inks, sealants, resists, molding materials, forming materials [automotive parts such as thrust washers, oil filters, seals, bearings, gears, cylinder head covers, bearing retainers, intake manifolds, pedals, etc.; Base material, electronic circuit board (especially electronic circuit board to which copper wiring is applied), electrical insulating material (insulating film, etc.), laminated board, electronic paper, touch panel, solar cell board, optical waveguide, light guide plate, holographic memory, silicon Semiconductor / liquid crystal manufacturing equipment parts such as wafer carriers, IC chip trays, electrolytic condenser trays, and insulating films; optical parts such as lenses; compressor parts such as pumps, valves, and seals; aircraft cabin interior parts; sterilization equipment, columns, and piping Medical equipment parts such as, food and beverage manufacturing equipment parts; housings used for personal computers, mobile phones, etc., and electricity represented by keyboard supports, which are members that support keyboards inside personal computers. -It can be preferably used as a forming material for electronic device members, etc.].
 前記硬化性組成物は、耐熱性を有し、且つ銅と同程度の低CTEを有する硬化物を形成することができるので、特に、銅配線を施す電子回路基板の原料として好ましく使用することができる。 Since the curable composition can form a cured product having heat resistance and a low CTE comparable to that of copper, it is particularly preferably used as a raw material for an electronic circuit substrate to which copper wiring is applied. it can.
 [硬化物、半硬化物]
 本開示の硬化物(或いは、半硬化物)は、上記硬化性組成物の硬化物(或いは、半硬化物)である。
[Cured product, semi-cured product]
The cured product (or semi-cured product) of the present disclosure is a cured product (or semi-cured product) of the above-mentioned curable composition.
 前記硬化物(或いは、半硬化物)は、好ましくは、式(1)で表され、式中のR、Rが、同一又は異なって、環状イミド構造を有する硬化性官能基である硬化性化合物(特に好ましくは、上記式(1)で表され、式中のR、Rが、同一又は異なって、式(r−1)~(r−6)で表される基から選択される基である硬化性化合物)の硬化物(或いは、半硬化物)である。 The cured product (or semi-cured product) is preferably represented by the formula (1), and R 1 and R 2 in the formula are cured functional groups having the same or different cyclic imide structure. A sex compound (particularly preferably, selected from the groups represented by the above formula (1), in which R 1 and R 2 in the formula are the same or different and are represented by the formulas (r-1) to (r-6). It is a cured product (or semi-cured product) of the curable compound which is the group to be formed.
 前記硬化物(或いは、半硬化物)は、上記硬化性組成物に加熱処理(加熱温度は、例えば180~250℃)を施すことによって製造することができる。 The cured product (or semi-cured product) can be produced by subjecting the curable composition to heat treatment (heating temperature is, for example, 180 to 250 ° C.).
 前記加熱処理は、温度を一定に保持した状態で行ってもよく、温度を段階的に変更して行ってもよい。加熱処理温度は、加熱時間に応じて適宜調整することができ、例えば、加熱時間の短縮を所望する場合は加熱温度を高めに設定することが好ましい。 The heat treatment may be performed while the temperature is kept constant, or the temperature may be changed stepwise. The heat treatment temperature can be appropriately adjusted according to the heating time. For example, when it is desired to shorten the heating time, it is preferable to set the heating temperature higher.
 上記硬化性組成物の硬化は、常圧下で行うこともできるし、減圧下又は加圧下で行うこともできる。 The curable composition can be cured under normal pressure, reduced pressure or pressurized.
 例えば、前記硬化性組成物が、硬化性化合物として式(1)で表される化合物を含有する場合、式(1)で表される化合物は芳香環由来の構造の割合が高いため、高温で加熱しても分解することなく硬化物(詳細には、耐熱性を有する硬化物)を形成することができ、高温で短時間加熱することにより優れた作業性で効率よく硬化物を形成することができる。また、加熱手段は特に制限されることがなく、公知乃至慣用の手段を利用することができる。 For example, when the curable composition contains a compound represented by the formula (1) as a curable compound, the compound represented by the formula (1) has a high proportion of a structure derived from an aromatic ring, and therefore, at a high temperature. A cured product (specifically, a cured product having heat resistance) can be formed without decomposition even when heated, and a cured product can be efficiently formed with excellent workability by heating at a high temperature for a short time. Can be done. Further, the heating means is not particularly limited, and known or commonly used means can be used.
 そして、上記硬化性組成物を、加熱温度及び加熱時間を調整して硬化反応を完了させず途中で停止させることにより、半硬化物(Bステージ)を製造することができる。前記半硬化物の硬化度は、例えば85%以下(例えば10~85%、好ましくは15~75%、更に好ましくは20~70%)である。 Then, the semi-cured product (B stage) can be produced by adjusting the heating temperature and the heating time of the curable composition and stopping the curing reaction in the middle without completing the curing reaction. The degree of curing of the semi-cured product is, for example, 85% or less (for example, 10 to 85%, preferably 15 to 75%, and more preferably 20 to 70%).
 尚、半硬化物の硬化度は、硬化性組成物の発熱量、及びその半硬化物の発熱量をDSCにより測定し、以下の式から算出できる。
 硬化度(%)=[1−(半硬化物の発熱量/硬化性組成物の発熱量)]×100
The degree of curing of the semi-cured product can be calculated from the following formula by measuring the calorific value of the curable composition and the calorific value of the semi-cured product by DSC.
Curing degree (%) = [1- (calorific value of semi-cured product / calorific value of curable composition)] x 100
 前記半硬化物が、硬化性化合物として式(1)で表される化合物を含有する硬化性組成物の半硬化物である場合、前記半硬化物は加熱により一時的に流動性を発現し、段差に追従させることができる。また、加熱処理を施すことにより耐熱性に優れた硬化物を形成することができる。 When the semi-cured product is a semi-cured product of a curable composition containing a compound represented by the formula (1) as a curable compound, the semi-cured product temporarily exhibits fluidity by heating. It can be made to follow a step. Further, by applying the heat treatment, a cured product having excellent heat resistance can be formed.
 前記硬化物は、銅基板と同程度に低CTEであり、線膨張係数は、例えば10×10−6~50×10−6/℃、好ましくは10×10−6~30×10−6/℃である。そして、前記線膨張係数は、温度範囲が異なっても変化が小さい。例えば、Tgより低温領域における線膨張係数(α1)と、Tgより高温領域における線膨張係数(α2)の差は小さく、α2/α1は、例えば2.0以下である。そのため、前記硬化物と銅箔との積層体を高温環境下に曝しても、積層体がカールするのを抑制することができる。 The cured product has a low CTE of the copper substrate and the same degree, the linear expansion coefficient, for example, 10 × 10 -6 ~ 50 × 10 -6 / ℃, preferably 10 × 10 -6 ~ 30 × 10 -6 / ℃. The coefficient of linear expansion does not change much even if the temperature range is different. For example, the difference between the coefficient of linear expansion (α1) in the region lower than Tg and the coefficient of linear expansion (α2) in the region higher than Tg is small, and α2 / α1 is, for example, 2.0 or less. Therefore, even if the laminated body of the cured product and the copper foil is exposed to a high temperature environment, curling of the laminated body can be suppressed.
 また、前記硬化物は、例えば、5%重量減少温度(Td5)が300℃以上であり、320℃で30分の加熱処理に付した後の窒素原子含有量が2.8~0.1重量%である。 Further, the cured product has, for example, a 5% weight loss temperature (T d5 ) of 300 ° C. or higher, and a nitrogen atom content of 2.8 to 0.1 after being subjected to heat treatment at 320 ° C. for 30 minutes. By weight%.
 前記硬化物の、昇温速度10℃/分(窒素中)で測定される5%重量減少温度(Td5)は、例えば300℃以上、好ましくは400℃以上、特に好ましくは450℃以上、最も好ましくは500℃以上である。5%重量減少温度(Td5)の上限は、例えば600℃、好ましくは550℃、特に好ましくは530℃である。 The 5% weight loss temperature (T d5 ) of the cured product measured at a heating rate of 10 ° C./min (in nitrogen) is, for example, 300 ° C. or higher, preferably 400 ° C. or higher, particularly preferably 450 ° C. or higher, most preferably. It is preferably 500 ° C. or higher. The upper limit of the 5% weight loss temperature (T d5 ) is, for example, 600 ° C., preferably 550 ° C., particularly preferably 530 ° C.
 また、前記硬化物を320℃で30分の加熱処理に付した後の窒素原子含有量は、例えば2.8~0.1重量%、好ましくは2.5~0.15重量%、より好ましくは2.0~0.20重量%、特に好ましくは1.8~0.40重量%、最も好ましくは1.5~0.70重量%である。そのため、前記硬化物は靱性や耐熱性に優れる。一方、窒素原子含有量が上記範囲を下回ると、硬化物の靱性や耐熱性が低下する傾向がある。 The nitrogen atom content after subjecting the cured product to heat treatment at 320 ° C. for 30 minutes is, for example, 2.8 to 0.1% by weight, preferably 2.5 to 0.15% by weight, more preferably. Is 2.0 to 0.20% by weight, particularly preferably 1.8 to 0.40% by weight, and most preferably 1.5 to 0.70% by weight. Therefore, the cured product is excellent in toughness and heat resistance. On the other hand, when the nitrogen atom content is lower than the above range, the toughness and heat resistance of the cured product tend to decrease.
 前記加熱処理に付した後の硬化物中の窒素原子含有量は、例えばCHN元素分析により求めることができる。 The nitrogen atom content in the cured product after being subjected to the heat treatment can be determined, for example, by CHN elemental analysis.
 前記硬化物には、硬化性化合物の重合体以外にも添加物を含有する場合があるが、硬化物を320℃で30分の加熱処理に付すと、320℃未満に分解点や沸点を有する添加物は分解されて消失し、硬化性化合物の重合体のみが残存する。そのため、加熱処理後の硬化物中の窒素原子含有量は、硬化性化合物の重合体に含まれる窒素原子含有量と推定できる。なお、熱履歴の観点から硬化処理を加熱処理とすることもできる。 The cured product may contain additives in addition to the polymer of the curable compound, but when the cured product is heat-treated at 320 ° C. for 30 minutes, it has a decomposition point and a boiling point of less than 320 ° C. Additives are decomposed and disappear, leaving only the polymer of the curable compound. Therefore, the nitrogen atom content in the cured product after the heat treatment can be estimated to be the nitrogen atom content contained in the polymer of the curable compound. The curing treatment can also be a heat treatment from the viewpoint of heat history.
 また、前記硬化物は、IRスペクトルの1620~1750cm−1の領域にピークを有する。前記ピークは、「−C(=O)−N−C(=O)−」ユニットに由来する。 In addition, the cured product has a peak in the region of 1620 to 1750 cm -1 of the IR spectrum. The peak is derived from the "-C (= O) -NC (= O)-" unit.
 更にまた、前記硬化物は難燃性に優れ、厚み0.15mmの硬化物の、UL94Vに準拠した方法による燃えにくさはV−1グレード、すなわち、下記1~5の条件を具備する。
(1)燃焼持続時間は30秒以下
(2)5個の試料の燃焼持続時間の合計が250秒以下
(3)2回目の接炎後の赤熱持続時間が60秒以下
(4)固定用クランプ部まで燃えない
(5)燃焼する粒子を落下させて、下に敷いた綿を燃やすことがない
Furthermore, the cured product has excellent flame retardancy, and the flame resistance of the cured product having a thickness of 0.15 mm by a method conforming to UL94V is V-1 grade, that is, the following conditions 1 to 5 are satisfied.
(1) Burning duration is 30 seconds or less (2) Total burning time of 5 samples is 250 seconds or less (3) Red heat duration after the second flame contact is 60 seconds or less (4) Fixing clamp Does not burn to the part (5) Does not drop burning particles and burn the cotton laid underneath
 また、前記硬化物は絶縁性に優れ、比誘電率は、例えば6以下(例えば1~6)、好ましくは5以下(例えば1~5)、特に好ましくは4以下(例えば1~4)である。誘電正接は、例えば0.05以下(例えば0.0001~0.05)、好ましくは0.0001~0.03、特に好ましくは0.0001~0.015である。 Further, the cured product has excellent insulating properties, and the relative permittivity is, for example, 6 or less (for example, 1 to 6), preferably 5 or less (for example, 1 to 5), and particularly preferably 4 or less (for example, 1 to 4). .. The dielectric loss tangent is, for example, 0.05 or less (for example, 0.0001 to 0.05), preferably 0.0001 to 0.03, and particularly preferably 0.0001 to 0.015.
 尚、前記「比誘電率」及び「誘電正接」は、JIS−C2138に準拠して測定周波数1MHz、測定温度23℃で測定される値、または、ASTM D2520に準拠して周波数1GHz、23℃で測定される値である。 The "relative permittivity" and "dielectric loss tangent" are values measured at a measurement frequency of 1 MHz and a measurement temperature of 23 ° C. in accordance with JIS-C2138, or at frequencies of 1 GHz and 23 ° C. in accordance with ASTM D2520. It is a value to be measured.
 [積層体]
 本開示の積層体は、上記硬化性組成物の硬化物又は半硬化物と基板とが積層された構成を有する。前記積層体には、硬化性組成物の硬化物又は半硬化物/基板、及び基板/硬化性組成物の硬化物又は半硬化物/基板の構成が含まれる。
[Laminate]
The laminate of the present disclosure has a structure in which a cured product or semi-cured product of the curable composition and a substrate are laminated. The laminate includes a cured product or semi-cured product / substrate of the curable composition and a cured product or semi-cured product / substrate of the substrate / curable composition.
 前記積層体は、例えば上記硬化性組成物を基板上に塗布して、加熱処理を施すことによって製造することができる。
 前記積層体は、また、上記硬化性組成物を支持体上に塗布し、加熱処理を施して半硬化させて得られた半硬化物を支持体から剥離し、それを基板上に載置して、更に加熱処理を施す方法でも製造することができる。
The laminate can be produced, for example, by applying the curable composition onto a substrate and subjecting it to heat treatment.
In the laminated body, the curable composition is applied onto a support, and the semi-cured product obtained by heat-treating and semi-curing is peeled off from the support and placed on a substrate. It can also be produced by a method of further heat treatment.
 前記基板の素材としては、例えば、半導体材料(例えば、セラミック、SiC、窒化ガリウム等)、紙、塗工紙、プラスチックフィルム、木材、布、不織布、金属(例えば、ステンレス鋼、アルミ合金、銅)等が挙げられる。 Examples of the substrate material include semiconductor materials (for example, ceramics, SiC, gallium nitride, etc.), paper, coated paper, plastic films, wood, cloth, non-woven fabrics, metals (for example, stainless steel, aluminum alloys, copper). And so on.
 上記硬化性組成物は低CTEであるため、線膨張係数が小さい基材(例えば、銅等の金属箔)に積層しても、カールが発生するのを抑制することができ、形状安定性に優れる。 Since the curable composition has a low CTE, curling can be suppressed even when laminated on a base material having a small coefficient of linear expansion (for example, a metal foil such as copper), resulting in shape stability. Excellent.
 前記積層体が、硬化物/基板又は基板/硬化物/基板の構成を有する場合、硬化物と基板の密着性に優れる。前記基板と硬化物との引張りせん断力(JIS K6850(1999)準拠)は、例えば1MPa以上、好ましくは5MPa以上、特に好ましくは10MPa以上である。尚、引張りせん断力は、引張リ試験機(オリエンテック社製、テンシロンUCT−5T)を使用して、引張り速度300mm/分、剥離角度180°で測定できる。 When the laminate has a cured product / substrate or substrate / cured product / substrate configuration, the adhesion between the cured product and the substrate is excellent. The tensile shear force between the substrate and the cured product (based on JIS K6850 (1999)) is, for example, 1 MPa or more, preferably 5 MPa or more, and particularly preferably 10 MPa or more. The tensile shear force can be measured at a tensile speed of 300 mm / min and a peeling angle of 180 ° using a tensile retesting machine (Tencilon UCT-5T manufactured by Orientec Co., Ltd.).
 前記積層体は、また、基板が、耐熱性、難燃性、及び絶縁性に優れた硬化物を介して積層された構成を有する。そのため、前記積層体は、例えば電子回路基板等として好適に使用できる。 The laminated body also has a structure in which a substrate is laminated via a cured product having excellent heat resistance, flame retardancy, and insulating properties. Therefore, the laminated body can be suitably used as, for example, an electronic circuit board or the like.
 [プリント基板、及び電子デバイス]
 本開示のプリント基板は、上記硬化性組成物の硬化物からなる基板上に、導体配線が施された構成を有する。また、前記電子デバイスは、前記プリント基板を有する。
[Printed circuit boards and electronic devices]
The printed circuit board of the present disclosure has a structure in which conductor wiring is applied on a substrate made of a cured product of the curable composition. Further, the electronic device has the printed circuit board.
 前記導体配線としては、銅、アルミニウム等の導体による配線が含まれる。なかでも、導電性に優れる点で銅配線が好ましい。 The conductor wiring includes wiring using a conductor such as copper or aluminum. Of these, copper wiring is preferable because it has excellent conductivity.
 前記硬化性組成物は耐熱性に優れ、且つ低CTEである。そのため、前記硬化性組成物の硬化物からなる基板の表面に、線膨張係数が小さい銅やアルミニウムなどの導体配線を行ったものを、例えば、半田リフロー工程に付す等の熱的ストレスに曝されても、基板の熱膨張率と導体配線の熱膨張率の差が極めて小さいため、配線が破断するのを防止することができる。 The curable composition has excellent heat resistance and low CTE. Therefore, the surface of the substrate made of the cured product of the curable composition is exposed to thermal stress such as being subjected to a solder reflow process in which conductor wiring such as copper or aluminum having a small coefficient of linear expansion is applied. However, since the difference between the coefficient of thermal expansion of the substrate and the coefficient of thermal expansion of the conductor wiring is extremely small, it is possible to prevent the wiring from breaking.
 そして、前記電子デバイスは、熱的ストレス耐性を有するプリント基板を備えるため、高い信頼性を有する。 And since the electronic device includes a printed circuit board having thermal stress resistance, it has high reliability.
 以上、本開示の各構成及びそれらの組み合わせ等は一例であって、本開示の主旨から逸脱しない範囲において、適宜、構成の付加、省略、置換、及び変更が可能である。また、本開示は、実施形態によって限定されることはなく、請求の範囲の記載によってのみ限定される。 As described above, each configuration of the present disclosure and combinations thereof are examples, and the configurations can be added, omitted, replaced, and changed as appropriate without departing from the gist of the present disclosure. In addition, the present disclosure is not limited by the embodiments, but is limited only by the description of the scope of claims.
 以下、実施例により本開示をより具体的に説明するが、本開示はこれらの実施例により限定されるものではない。 Hereinafter, the present disclosure will be described in more detail with reference to Examples, but the present disclosure is not limited to these Examples.
 尚、測定は下記条件で行った。
<NMR測定>
測定装置:BRUKER 400MHz/54mm又はBRUKER AVANCE600MHz
測定溶剤:重DMSO、重クロロホルム、又は重クロロホルム/ペンタフルオロフェノール(PFP)=2/1(wt/wt)の混合液
化学シフト:TMSを規準とした
<GPC測定>
装置:ポンプ「LC−20AD」((株)島津製作所製)
検出器:RID−10A((株)島津製作所製)又はTDA−301およびUV2501(Viscotek製)
溶剤:THF又はクロロホルム
カラム:shodex GPC K−806L×1本+shodex GPC K−803×1本+shodex GPC K−801×2本
流速:1.0mL/min
温度:40℃
試料濃度:0.1%(wt/vol)
標準ポリスチレン換算
<DSC測定>
装置:TA Q20
昇温速度:10℃/min
雰囲気:窒素雰囲気
<TG/DTA測定>
装置:NETZSCH TG209F3
昇温速度:10℃/min
雰囲気:窒素雰囲気
<IR測定>
装置:Perkin Elmer Spectrum RX1(ATR法)
The measurement was performed under the following conditions.
<NMR measurement>
Measuring device: BRUKER 400MHz / 54mm or BRUKER AVANCE 600MHz
Measuring solvent: Deuterated DMSO, deuterated chloroform, or deuterated chloroform / pentafluorophenol (PFP) = 2/1 (wt / wt) mixed solution Chemical shift: <GPC measurement based on TMS>
Equipment: Pump "LC-20AD" (manufactured by Shimadzu Corporation)
Detector: RID-10A (manufactured by Shimadzu Corporation) or TDA-301 and UV2501 (manufactured by Viscotek)
Solvent: THF or chloroform column: shodex GPC K-806L x 1 + shodex GPC K-803 x 1 + shodex GPC K-801 x 2 Flow velocity: 1.0 mL / min
Temperature: 40 ° C
Sample concentration: 0.1% (wt / vol)
Standard polystyrene conversion <DSC measurement>
Equipment: TA Q20
Temperature rise rate: 10 ° C / min
Atmosphere: Nitrogen atmosphere <TG / DTA measurement>
Equipment: NETZSCH TG209F3
Temperature rise rate: 10 ° C / min
Atmosphere: Nitrogen atmosphere <IR measurement>
Equipment: Perkin Elmer Spectram RX1 (ATR method)
 調製例1
 ジアミン(1)の調製
 撹拌装置、窒素導入管、およびディーンスターク装置を備えた500mL(三ツ口)フラスコに、4,4’−ジフルオロベンゾフェノン27.50g、ビスフェノールA23.98g、無水炭酸カリウム(KCO)21.77g、N−メチル−2−ピロリドン220mL、およびトルエン110mLを入れ、窒素雰囲気下で撹拌しながら加熱し、130~140℃で4時間トルエンを還流させた。その後、さらに加熱して170~180℃でトルエンを留去した。さらに、170~180℃で10時間撹拌を継続した後、室温に戻した。
Preparation Example 1
Preparation of Diamine (1) In a 500 mL (three-necked) flask equipped with a stirrer, a nitrogen introduction tube, and a Dean-Stark apparatus, 27.50 g of 4,4'-difluorobenzophenone, 23.98 g of bisphenol A, and anhydrous potassium carbonate (K 2 CO). 3 ) 21.77 g, 220 mL of N-methyl-2-pyrrolidone, and 110 mL of toluene were added and heated with stirring under a nitrogen atmosphere, and toluene was refluxed at 130 to 140 ° C. for 4 hours. Then, the mixture was further heated to distill off toluene at 170 to 180 ° C. Further, after continuing stirring at 170 to 180 ° C. for 10 hours, the temperature was returned to room temperature.
 得られた生成物が入ったフラスコに、4−アミノフェノール5.04g、無水炭酸カリウム6.39g、N−メチル−2−ピロリドン30mL、及びトルエン150mLを添加し、再び窒素雰囲気下で撹拌しながら加熱し、130~140℃で3時間トルエンを還流させた。その後、加熱して170~180℃でトルエンを留去し、さらに170~180℃を保持しつつ4時間撹拌を継続した。その後、室温まで冷却し、反応液を3000mLのメタノールに添加、ろ過することで粉末状固体を得た。この粉末状固体をメタノールおよび水で繰返し洗浄した後、100℃で8時間減圧乾燥して、粉末状固体を得た(ジアミン(1)、下記式で表される化合物、収率:95%)。得られた粉末状固体をGPC測定(溶剤:THF、標準ポリスチレン換算)に付して求めた数平均分子量は2920、重量平均分子量は5100、及び平均重合度(m−2)は6.2であった。得られたジアミン(1)のH−NMRスペクトルを図1に、FTIRスペクトルを図2に示す。 To the flask containing the obtained product, 5.04 g of 4-aminophenol, 6.39 g of anhydrous potassium carbonate, 30 mL of N-methyl-2-pyrrolidone, and 150 mL of toluene were added, and the mixture was stirred again in a nitrogen atmosphere. It was heated and the toluene was refluxed at 130-140 ° C. for 3 hours. Then, the mixture was heated to distill off toluene at 170 to 180 ° C., and stirring was continued for 4 hours while maintaining 170 to 180 ° C. Then, the mixture was cooled to room temperature, the reaction solution was added to 3000 mL of methanol, and the mixture was filtered to obtain a powdery solid. This powdery solid was repeatedly washed with methanol and water and then dried under reduced pressure at 100 ° C. for 8 hours to obtain a powdery solid (diamine (1), compound represented by the following formula, yield: 95%). .. The obtained powdery solid was subjected to GPC measurement (solvent: THF, standard polystyrene conversion) to obtain a number average molecular weight of 2920, a weight average molecular weight of 5100, and an average degree of polymerization (m-2) of 6.2. there were. The 1 H-NMR spectrum of the obtained diamine (1) is shown in FIG. 1, and the FTIR spectrum is shown in FIG.
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 硬化性化合物Aの調製
 撹拌装置、窒素導入管および乾燥管を備えた1000mL(三ツ口)フラスコに、無水マレイン酸を5.88g、N−メチル−2−ピロリドンを50mL、トルエンを200mL入れ、窒素置換した。そこへ、得られたジアミン(1)48.57gを330mLのNMPに溶解させた溶液を添加し、窒素雰囲気下、室温で24時間撹拌した。その後、パラトルエンスルボン酸一水和物0.761gを添加し、140℃に加熱して、8時間攪拌を継続し、トルエンを還流して水分を除去した。反応液を室温に戻した後、反応液を3000mLのメタノールに添加、ろ過することで粉末状固体を得た。この粉末状固体をメタノールおよび水で繰返し洗浄した後、100℃で8時間減圧乾燥して、粉末状固体(硬化性化合物A、下記式(A)で表される化合物、芳香環由来の構造の割合:71重量%、収率:90%)を得た。硬化性化合物AのH−NMRスペクトルを図3に、FTIRスペクトルを図4に示す。
H−NMR(CDCl)δ:1.71(s),6.87(s),7.02(m),7.09(m),7.17(d,J=8.8Hz),7.26(m),7.37(d,J=8.8Hz),7.80(m)
Preparation of curable compound A 5.88 g of maleic anhydride, 50 mL of N-methyl-2-pyrrolidone, and 200 mL of toluene were placed in a 1000 mL (three-necked) flask equipped with a stirrer, a nitrogen introduction tube and a drying tube, and nitrogen was substituted. did. A solution prepared by dissolving 48.57 g of the obtained diamine (1) in 330 mL of NMP was added thereto, and the mixture was stirred at room temperature for 24 hours under a nitrogen atmosphere. Then, 0.761 g of paratoluene sulphonic acid monohydrate was added, heated to 140 ° C., stirring was continued for 8 hours, and toluene was refluxed to remove water. After returning the reaction solution to room temperature, the reaction solution was added to 3000 mL of methanol and filtered to obtain a powdery solid. This powdery solid is repeatedly washed with methanol and water, and then dried under reduced pressure at 100 ° C. for 8 hours to obtain a powdery solid (curable compound A, a compound represented by the following formula (A), a structure derived from an aromatic ring). Ratio: 71% by weight, yield: 90%) was obtained. The 1 H-NMR spectrum of the curable compound A is shown in FIG. 3, and the FTIR spectrum is shown in FIG.
1 1 H-NMR (CDCl 3 ) δ: 1.71 (s), 6.87 (s), 7.02 (m), 7.09 (m), 7.17 (d, J = 8.8 Hz) , 7.26 (m), 7.37 (d, J = 8.8Hz), 7.80 (m)
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 また、硬化性化合物Aの200℃、せん断速度10(1/s)における粘度をレオメーターにより測定したところ、14Pa・sであった。 Further, the viscosity of the curable compound A at 200 ° C. and a shear rate of 10 (1 / s) was measured by a rheometer and found to be 14 Pa · s.
 更に、得られた硬化性化合物Aの数平均分子量と、重量平均分子量をGPC測定(溶剤THF、標準ポリスチレン換算)によって求めた。その結果、数平均分子量(Mn)3160、重量平均分子量(Mw)5190であった。 Further, the number average molecular weight and the weight average molecular weight of the obtained curable compound A were determined by GPC measurement (solvent THF, standard polystyrene conversion). As a result, the number average molecular weight (Mn) was 3160 and the weight average molecular weight (Mw) was 5190.
 更にまた、得られた硬化性化合物AのTgをDSC測定により求めた。その結果、131℃であった。 Furthermore, the Tg of the obtained curable compound A was determined by DSC measurement. As a result, it was 131 ° C.
 実施例1
 下記表1に記載の通り、調製例で得られた硬化性化合物A45重量部とトルエン55重量部とラジカル重合開始剤(t−ブチルパーオキシベンゾエート、商品名「パーブチルZ」、日本油脂(株)製)0.45重量部を配合して、自転・公転ミキサー(商品名「あわとり練太郎 ARE−310」、(株)シンキー製)にて4時間撹拌した。
 その後、更にマイカ24重量部を配合して5分間撹拌し、その後、5分間脱泡処理を行って硬化性組成物を得た。
Example 1
As shown in Table 1 below, 45 parts by weight of the curable compound A and 55 parts by weight of toluene obtained in the preparation example and a radical polymerization initiator (t-butyl peroxybenzoate, trade name "Perbutyl Z", Nippon Oil & Fats Co., Ltd.) (Manufactured by) 0.45 parts by weight was blended and stirred with a rotation / revolution mixer (trade name "Awatori Rentaro ARE-310", manufactured by Shinky Co., Ltd.) for 4 hours.
Then, 24 parts by weight of mica was further added and stirred for 5 minutes, and then defoamed for 5 minutes to obtain a curable composition.
 得られた硬化性組成物を、銅箔(商品名「CF−T9DA−SV−18」、福田金属箔粉工業(株)製、10cm×10cm)上に、ウエットな状態での厚みが100μmとなるようアプリケーターを使用して塗布して、塗膜/銅箔積層体を得た。
 得られた塗膜/銅箔積層体を、ホットプレートを使用して、105℃で10分、その後150℃で10分加熱してトルエンを揮発させて、乾燥塗膜/銅箔積層体を得た。
 その後、得られた乾燥塗膜/銅箔積層体を、真空条件下において250℃で1時間加熱して、塗膜を硬化させて、硬化物/銅箔積層体を得た。
The obtained curable composition was placed on a copper foil (trade name "CF-T9DA-SV-18", manufactured by Fukuda Metal Foil Powder Industry Co., Ltd., 10 cm x 10 cm) with a thickness of 100 μm in a wet state. It was applied using an applicator so as to obtain a coating film / copper foil laminate.
The obtained coating film / copper foil laminate is heated at 105 ° C. for 10 minutes and then at 150 ° C. for 10 minutes to volatilize toluene using a hot plate to obtain a dry coating film / copper foil laminate. It was.
Then, the obtained dry coating film / copper foil laminate was heated at 250 ° C. for 1 hour under vacuum conditions to cure the coating film to obtain a cured product / copper foil laminate.
 得られた硬化物/銅箔積層体について、室温下、塩化鉄(III)水溶液(40重量%)に一晩浸漬して銅箔を除去して、硬化物を得た。得られた硬化物について、下記条件下で得たひずみ−温度曲線からα1(Tgより低温領域における線膨張係数)およびα2(Tgより高温領域における線膨張係数)を求めた。
<TMA:引張>
測定装置:TMA SS7100/日立ハイテクサイエンス
雰囲気:N
温度範囲:1st heat/0℃~250℃
     2nd heat/00C~250℃
開始温度で20分待機
昇温速度:5℃/min
測定荷重:20mN
The obtained cured product / copper foil laminate was immersed in an aqueous iron (III) chloride solution (40% by weight) overnight to remove the copper foil at room temperature to obtain a cured product. For the obtained cured product, α1 (coefficient of linear expansion in a region lower than Tg) and α2 (coefficient of linear expansion in a region higher than Tg) were obtained from the strain-temperature curve obtained under the following conditions.
<TMA: Tension>
Measuring device: TMA SS7100 / Hitachi High-Tech Science Atmosphere: N 2
Temperature range: 1st heat / 0 ℃ ~ 250 ℃
2nd heat / 00C ~ 250 ℃
20 minutes standby at the start temperature Temperature rise rate: 5 ° C / min
Measured load: 20mN
 実施例2~4
 下記表1に記載の通り、添加するマイカの種類を変更した以外は実施例1と同様にして硬化性組成物を得、乾燥塗膜/銅箔積層体、硬化物/銅箔積層体、及び硬化物を得た。
Examples 2-4
As shown in Table 1 below, a curable composition was obtained in the same manner as in Example 1 except that the type of mica to be added was changed, and a dry coating film / copper foil laminate, a cured product / copper foil laminate, and A cured product was obtained.
 比較例1
 マイカを添加しなかった以外は実施例と同様にして硬化性組成物を得、乾燥塗膜/銅箔積層体、硬化物/銅箔積層体、及び硬化物を得た。
Comparative Example 1
A curable composition was obtained in the same manner as in Examples except that mica was not added, and a dry coating film / copper foil laminate, a cured product / copper foil laminate, and a cured product were obtained.
 実施例及び比較例で得られた乾燥塗膜/銅箔積層体、及び硬化物/銅箔積層体について、以下の評価を行った。 The following evaluations were performed on the dry coating film / copper foil laminate and the cured product / copper foil laminate obtained in Examples and Comparative Examples.
 (耐カール性評価)
 硬化物/銅箔積層体(10cm×10cm)を、硬化物面が上になる向きにて平板上に設置して、200℃に設定したオーブン内に60分間静置し、その後、積層体を平板に設置した状態のままオーブンから室温(25℃)環境下に出して5分経過後に、平板の表面から積層体の四隅の高さを測定し、平均値からカール量を測定した。そして、下記基準により耐カール性を評価した。尚、評価結果が○であることは、硬化物のCTEが銅箔のCTE(約17/ppm)と同等であることを示す。
<評価基準>
○(良):平均カール量が2cm以下
△(並):平均カール量が2cm超、5cm以下
×(不良):平均カール量が5cm超、又は筒状となるまでカールした
(Curl resistance evaluation)
The cured product / copper foil laminate (10 cm × 10 cm) was placed on a flat plate with the cured product surface facing up, and allowed to stand in an oven set at 200 ° C. for 60 minutes, after which the laminate was placed. The height of the four corners of the laminate was measured from the surface of the flat plate after 5 minutes had passed since the product was placed on the flat plate in an environment of room temperature (25 ° C.) and the curl amount was measured from the average value. Then, the curl resistance was evaluated according to the following criteria. If the evaluation result is ◯, it means that the CTE of the cured product is equivalent to the CTE of the copper foil (about 17 / ppm).
<Evaluation criteria>
○ (Good): Average curl amount is 2 cm or less △ (Normal): Average curl amount is more than 2 cm, 5 cm or less × (Poor): Average curl amount is more than 5 cm, or curled until it becomes tubular
 (可とう性評価)
 硬化物/銅箔積層体(10cm×10cm)について、JIS K5600−5−1(耐屈曲性(円筒形マンドレル))に準拠して、屈曲試験機(商品名「マンドレル屈曲試験機」、(株)東洋精機製作所製)を使用して、積層体を硬化物層が外側になるよう直径5mmのマンドレルに巻き付け、下記基準で可とう性を評価した。
<評価基準>
○(良):クラックなし
×(不良):クラックあり
(Flexibility evaluation)
For the cured product / copper foil laminate (10 cm x 10 cm), in accordance with JIS K5600-5-1 (bending resistance (cylindrical mandrel)), bending tester (trade name "mandrel bending tester", Co., Ltd.) ) Toyo Seiki Seisakusho) was used to wrap the laminate around a mandrel with a diameter of 5 mm so that the cured product layer was on the outside, and the flexibility was evaluated according to the following criteria.
<Evaluation criteria>
○ (Good): No crack × (Bad): With crack
 (耐熱性評価)
 乾燥塗膜/銅箔積層体を真空条件下において250℃で1時間加熱して、加熱前後における塗膜の色変化を目視で観察して、下記基準で耐熱性を評価した。
<評価基準>
○(良):変色なし
×(不良):変色あり
(Heat resistance evaluation)
The dry coating film / copper foil laminate was heated at 250 ° C. for 1 hour under vacuum conditions, and the color change of the coating film before and after heating was visually observed, and the heat resistance was evaluated according to the following criteria.
<Evaluation criteria>
○ (Good): No discoloration × (Bad): Discoloration
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000020
NK−8G:合成マイカ、商品名「NK−8G」、日本光研工業(株)製
MAE:ジメチルジアルキルアンモニウム変性合成マイカ、商品名「ソマシフMAE」、片倉コープアグリ(株)製
ME100:合成マイカ、商品名「ソマシフME100」、片倉コープアグリ(株)製
MK200:合成マイカ、商品名「ミクロマイカMK200」、片倉コープアグリ(株)製
NK-8G: Synthetic mica, trade name "NK-8G", MAE manufactured by Nippon Koken Kogyo Co., Ltd .: Dimethyldialkylammonium modified synthetic mica, trade name "Somasif MAE", ME100 manufactured by Katakura Corp. Agri Co., Ltd .: Synthetic mica , Product name "Somasif ME100", MK200 manufactured by Katakura Corp. Agri Co., Ltd .: Synthetic mica, Product name "Micromica MK200", manufactured by Katakura Corp. Agri Co., Ltd.
 尚、実施例に用いたマイカを下記試験に付してその特性を確認した。結果を下記表2にまとめて示す。 The mica used in the examples was subjected to the following test to confirm its characteristics. The results are summarized in Table 2 below.
 (粒子形状)
 SEMを用いて、10個のマイカ粒子について電子顕微鏡像を撮影し、これらの粒子状物質の最大径L、交差径L、及び厚みWを算術平均することにより求めた(図5~8)。
(Particle shape)
Using SEM, electron microscope images of 10 mica particles were taken, and the maximum diameter L 1 , cross diameter L 2 , and thickness W of these particulate matter were calculated by arithmetic mean (FIGS. 5 to 8). ).
 (元素分析)
 X線を照射して、発生する固有の蛍光X線を測定することにより、構成元素を同定し、前記元素の含有量(重量%)を分析した。
(Elemental analysis)
The constituent elements were identified by irradiating with X-rays and measuring the generated unique fluorescent X-rays, and the content (% by weight) of the elements was analyzed.
 (マイカの塩ビリング試験1)
 平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが5.0mmとなるまでマイカを充填し、最大加圧7MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じるか否かを目視で観察した。盛り上がりを生じた場合を「+」、生じなかった場合を「−」と記載した。
(Mica PVC ring test 1)
Fill the PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface with mica until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and apply for 3 minutes at a maximum pressure of 7 MPa. The surface of the vinyl chloride ring was smoothed by pressing, and it was visually observed whether or not the surface of the vinyl chloride ring was raised 5 minutes after the decompression. The case where the swelling occurred was described as "+", and the case where the swelling did not occur was described as "-".
 (マイカの塩ビリング試験2)
平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが3.0mmとなるまでマイカを充填し、最大加圧5MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じるか否かを目視で観察した。盛り上がりを生じた場合を「+」、生じなかった場合を「−」と記載した。
(Mica PVC ring test 2)
Fill the PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface with mica until the height from the upper flat surface of the vinyl chloride ring reaches 3.0 mm, and apply for 3 minutes at a maximum pressure of 5 MPa. The surface of the vinyl chloride ring was smoothed by pressing, and it was visually observed whether or not the surface of the vinyl chloride ring was raised 5 minutes after the decompression. The case where the swelling occurred was described as "+", and the case where the swelling did not occur was described as "-".
Figure JPOXMLDOC01-appb-T000021
Figure JPOXMLDOC01-appb-T000021
 以上のまとめとして、本開示の構成及びそのバリエーションを以下に付記する。
[1] 硬化性化合物とケイ酸塩を含み、前記ケイ酸塩の含有量が硬化性化合物100重量部に対して0.01~95重量部である硬化性組成物。
[2] ケイ酸塩が薄片状ケイ酸塩である、[1]に記載の硬化性組成物。
[3] ケイ酸塩が、下記特性1と特性2とを兼ね備える、[1]又は[2]に記載の硬化性組成物。
特性1:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが5.0mmとなるまでケイ酸塩を充填し、最大加圧7MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じる
特性2:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが3.0mmとなるまでケイ酸塩を充填し、最大加圧5MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じない
[4] ケイ酸塩の最大径Lと、前記最大径Lに直交する径Lと厚みWが、下記式(a)、(b)を満たす、[1]~[3]の何れか1つに記載の硬化性組成物。
 0.2L≦L≦L   (a)
 0.001L≦W≦0.08L   (b)
[5] ケイ酸塩が親油性ケイ酸塩である、[1]~[4]の何れか1つに記載の硬化性組成物。
[6] ケイ酸塩がアルカリ金属を含む、[1]~[5]の何れか1つに記載の硬化性組成物。
[7] ケイ酸塩が非膨潤型ケイ酸塩である、[1]~[6]の何れか1つに記載の硬化性組成物。
[8] ケイ酸塩が、最大径Lと、前記最大径Lに直交する径Lと厚みWが、下記式(a)、(b)を満たす、非膨潤型のケイ酸塩である、[1]~[7]の何れか1つに記載の硬化性組成物。
 0.2L≦L≦L   (a)
 0.001L≦W≦0.08L   (b)
[9] ケイ酸塩のマグネシウム含有量が10重量%以上である、[1]~[8]の何れか1つに記載の硬化性組成物。
[10] ケイ酸塩のナトリウム含有量が3.0重量%未満であり、カリウム含有量が1.0重量%以上である、[1]~[9]の何れか1つに記載の硬化性組成物。
[11] ケイ酸塩が薄片状ケイ酸塩であり、ナトリウム含有量が3.0重量%未満である、[1]~[10]の何れか1つに記載の硬化性組成物。
[12] ケイ酸塩が薄片状ケイ酸塩であり、カリウム含有量が1.0重量%以上である、[1]~[11]の何れか1つに記載の硬化性組成物。
[13] ケイ酸塩が薄片状ケイ酸塩であり、アルミニウム含有量が0.5重量%以上である、[1]~[12]の何れか1つに記載の硬化性組成物。
[14] ケイ酸塩がフッ素原子を含む、[1]~[13]の何れか1つに記載の硬化性組成物。
[15] ケイ酸塩が、フッ素原子を含むケイ酸塩であり、前記フッ素原子の含有量がケイ酸塩全量の0.5重量%以上である、[1]~[14]の何れか1つに記載の硬化性組成物。
[16] ケイ酸塩がマイカである、[1]~[15]の何れか1つに記載の硬化性組成物。
[17] 硬化性化合物が、下記式(1)
Figure JPOXMLDOC01-appb-C000022
[式中、R、Rは、同一又は異なって、硬化性官能基を示し、D、Dは、同一又は異なって、単結合又は連結基を示す。Lは、下記式(I)で表される構造と下記式(II)で表される構造とを含む繰り返し単位を有する2価の基を示す。
Figure JPOXMLDOC01-appb-C000023
(式中、Ar~Arは、同一又は異なって、アリーレン基、又は2個以上のアリーレン基が単結合若しくは連結基を介して結合した基を示す。Xは−CO−、−S−、又は−SO−を示し、Yは、同一又は異なって、−S−、−SO−、−O−、−CO−、−COO−、又は−CONH−を示す。nは0以上の整数を示す)]
で表される化合物である、[1]~[16]の何れか1つに記載の硬化性組成物。
[18] 式(1)中のR、Rが、同一又は異なって、環状イミド構造を有する硬化性官能基である、[17]に記載の硬化性組成物。
[19] 式(1)中のR、Rが、下記式(r)で表される基である、[17]に記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000024
(式中、QはC又はCHを示す。式中の2個のQは単結合又は二重結合を介して結合する。n’は0以上の整数である。R~Rは、同一又は異なって、水素原子、飽和又は不飽和脂肪族炭化水素基、芳香族炭化水素基、又は前記飽和又は不飽和脂肪族炭化水素基と芳香族炭化水素基から選択される2個以上の基が結合した基を示す。R~Rから選択される2つの基は、互いに結合して、隣接する炭素原子と共に環を形成していてもよい。式中の窒素原子から伸びる結合手は、D又はDと結合する)
[20] 式(1)中のR、Rが、同一又は異なって、下記式(r−1)~(r−6)で表される基から選択される基である、[17]に記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000025
(式中の窒素原子から伸びる結合手は、D又はDと結合する)
[21] 式(1)中のR、Rが、同一又は異なって、下記式(r−1)又は(r−5)で表される基である、[17]に記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000026
(式中の窒素原子から伸びる結合手は、D又はDと結合する)
[22] 式(1)中のR−D−基、及びR−D−基が、同一又は異なって、下記式(rd−1)又は(rd−2)で表される基を含む基である、[17]に記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000027
(式中のフェニレン基から伸びる結合手が、式(1)中のL側に結合する)
[23] 式(1)中のR−D−基、及びR−D−基が、同一又は異なって、下記式(rd−1−1)又は(rd−2−1)で表される基である、[17]に記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000028
(式中の酸素原子から伸びる結合手は、式(1)中のLと結合する)
[24] 式(1)中のLが、下記式(L−1)で表される2価の基である、[17]~[23]の何れか1つに記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000029
(式中、Ar~Arは、同一又は異なって、アリーレン基、又は2個以上のアリーレン基が単結合若しくは連結基を介して結合した基を示す。Xは−CO−、−S−、又は−SO−を示し、Yは、同一又は異なって、−S−、−SO−、−O−、−CO−、−COO−、又は−CONH−を示す。n”は0以上の整数を示し、mは2~50の数を示す)
[25] 式(1)中のLが、下記式(L−1−1)又は(L−1−2)で表される2価の基である、[17]~[23]の何れか1つに記載の硬化性組成物。
Figure JPOXMLDOC01-appb-C000030
(式中、m1、m2は2~50の数を示す)
[26] 硬化性化合物の、GPC測定により求められる、標準ポリスチレン換算の数平均分子量が1000~15000である、[1]~[25]の何れか1つに記載の硬化性組成物。
[27] 硬化性化合物のガラス転移温度が80~280℃である、[1]~[26]の何れか1つに記載の硬化性組成物。
[28] [1]~[27]の何れか1つに記載の硬化性組成物の硬化物。
[29] [1]~[27]の何れか1つに記載の硬化性組成物の半硬化物。
[30] [29]に記載の硬化物が基板に積層された構成を有する積層体。
[31] 基板が銅基板である[30]に記載の積層体。
[32] [1]~[27]の何れか1つに記載の硬化性組成物を、基板上に塗布し、加熱処理を施して前記硬化性組成物を硬化させることにより、前記硬化性組成物の硬化物が基板に積層された構成を有する積層体を製造する、積層体の製造方法。
[33] [1]~[27]の何れか1つに記載の硬化性組成物の半硬化物を基板上に載置し、加熱処理を施して前記半硬化物を硬化させることにより、前記硬化性組成物の硬化物が基板に積層された構成を有する積層体を製造する、積層体の製造方法。
[34] 基板上に導体配線を備えるプリント基板であって、前記基板が[1]~[27]の何れか1つに記載の硬化性組成物の硬化物からなる基板である、プリント基板。
[35] 基板上に導体配線を備えるプリント基板の製造方法であって、[1]~[27]の何れか1つに記載の硬化性組成物の硬化物からなる基板上に導体配線を形成する工程を含む、プリント基板の製造方法。
[36] プリント基板を有する電子デバイスであって、前記プリント基板が、[1]~[27]の何れか1つに記載の硬化性組成物の硬化物からなる基板上に導体配線を備えるプリント基板である、電子デバイス。
[37] プリント基板を備えた電子デバイスの製造方法であって、前記プリント基板は基板上に導体配線を備えるものであり、[1]~[27]の何れか1つに記載の硬化性組成物の硬化物からなる基板上に導体配線を形成する工程を含む、電子デバイスの製造方法。
As a summary of the above, the configuration and variations thereof of the present disclosure are added below.
[1] A curable composition containing a curable compound and a silicate, wherein the content of the silicate is 0.01 to 95 parts by weight with respect to 100 parts by weight of the curable compound.
[2] The curable composition according to [1], wherein the silicate is a flaky silicate.
[3] The curable composition according to [1] or [2], wherein the silicate has the following characteristics 1 and 2.
Characteristic 1: A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises. Characteristic 2: Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface. The billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes. [4] The maximum diameter L 1 of the silicate, the diameter L 2 orthogonal to the maximum diameter L 1 , and the thickness W satisfy the following formulas (a) and (b), [1] ] To [3]. The curable composition according to any one of.
0.2L 1 ≤ L 2 ≤ L 1 (a)
0.001L 1 ≤ W ≤ 0.08L 1 (b)
[5] The curable composition according to any one of [1] to [4], wherein the silicate is a lipophilic silicate.
[6] The curable composition according to any one of [1] to [5], wherein the silicate contains an alkali metal.
[7] The curable composition according to any one of [1] to [6], wherein the silicate is a non-swelling silicate.
[8] silicate, the maximum diameter L 1, the maximum diameter L 1 diameter L 2 and a thickness W which is orthogonal to the following formula (a), in satisfying the (b), the non-swelling silicate The curable composition according to any one of [1] to [7].
0.2L 1 ≤ L 2 ≤ L 1 (a)
0.001L 1 ≤ W ≤ 0.08L 1 (b)
[9] The curable composition according to any one of [1] to [8], wherein the magnesium content of the silicate is 10% by weight or more.
[10] The curability according to any one of [1] to [9], wherein the sodium content of the silicate is less than 3.0% by weight and the potassium content is 1.0% by weight or more. Composition.
[11] The curable composition according to any one of [1] to [10], wherein the silicate is a flaky silicate and the sodium content is less than 3.0% by weight.
[12] The curable composition according to any one of [1] to [11], wherein the silicate is a flaky silicate and the potassium content is 1.0% by weight or more.
[13] The curable composition according to any one of [1] to [12], wherein the silicate is a flaky silicate and the aluminum content is 0.5% by weight or more.
[14] The curable composition according to any one of [1] to [13], wherein the silicate contains a fluorine atom.
[15] Any one of [1] to [14], wherein the silicate is a silicate containing a fluorine atom, and the content of the fluorine atom is 0.5% by weight or more of the total amount of the silicate. The curable composition according to 1.
[16] The curable composition according to any one of [1] to [15], wherein the silicate is mica.
[17] The curable compound has the following formula (1).
Figure JPOXMLDOC01-appb-C000022
[In the formula, R 1 and R 2 indicate the same or different curable functional groups, and D 1 and D 2 indicate the same or different single bond or linking group. L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
Figure JPOXMLDOC01-appb-C000023
(In the formula, Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group. X indicates -CO-, -S-. , Or -SO 2- , Y indicates the same or different, -S-, -SO 2- , -O-, -CO-, -COO-, or -CONH-. N is 0 or more. Indicates an integer)]
The curable composition according to any one of [1] to [16], which is a compound represented by.
[18] The curable composition according to [17], wherein R 1 and R 2 in the formula (1) are the same or different curable functional groups having a cyclic imide structure.
[19] The curable composition according to [17], wherein R 1 and R 2 in the formula (1) are groups represented by the following formula (r).
Figure JPOXMLDOC01-appb-C000024
(In the formula, Q indicates C or CH. Two Qs in the formula are bonded via a single bond or a double bond. N'is an integer of 0 or more. R 3 to R 6 are the same. Or differently, a hydrogen atom, a saturated or unsaturated aliphatic hydrocarbon group, an aromatic hydrocarbon group, or two or more groups selected from the saturated or unsaturated aliphatic hydrocarbon group and an aromatic hydrocarbon group. Indicates a bonded group. Two groups selected from R 3 to R 6 may be bonded to each other to form a ring with adjacent carbon atoms. The bond extending from the nitrogen atom in the equation is Combine with D 1 or D 2 )
[20] R 1 and R 2 in the formula (1) are the same or different groups selected from the groups represented by the following formulas (r-1) to (r-6), [17] The curable composition according to.
Figure JPOXMLDOC01-appb-C000025
(The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
[21] The curability according to [17], wherein R 1 and R 2 in the formula (1) are the same or different and are groups represented by the following formula (r-1) or (r-5). Composition.
Figure JPOXMLDOC01-appb-C000026
(The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
[22] A group represented by the following formula (rd-1) or (rd-2) in which the R 1- D 1 -group and the R 2- D 2- group in the formula (1) are the same or different. The curable composition according to [17], which is a group containing.
Figure JPOXMLDOC01-appb-C000027
(The bond extending from the phenylene group in the formula binds to the L side in the formula (1))
[23] The R 1- D 1 -group and the R 2- D 2- group in the formula (1) are the same or different, and are represented by the following formula (rd-1-1) or (rd-2-1). The curable composition according to [17], which is the group represented.
Figure JPOXMLDOC01-appb-C000028
(The bond extending from the oxygen atom in the formula bonds with L in the formula (1))
[24] The curable composition according to any one of [17] to [23], wherein L in the formula (1) is a divalent group represented by the following formula (L-1).
Figure JPOXMLDOC01-appb-C000029
(In the formula, Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group. X indicates -CO-, -S-. , Or -SO 2- , Y indicates the same or different, -S-, -SO 2- , -O-, -CO-, -COO-, or -CONH-. N "is 0 or more. Indicates an integer of, and m indicates a number from 2 to 50)
[25] Any one of [17] to [23], wherein L in the formula (1) is a divalent group represented by the following formula (L-1-1) or (L-1-2). The curable composition according to one.
Figure JPOXMLDOC01-appb-C000030
(In the formula, m1 and m2 indicate numbers from 2 to 50)
[26] The curable composition according to any one of [1] to [25], wherein the curable compound has a standard polystyrene-equivalent number average molecular weight of 1000 to 15000, which is determined by GPC measurement.
[27] The curable composition according to any one of [1] to [26], wherein the glass transition temperature of the curable compound is 80 to 280 ° C.
[28] The cured product of the curable composition according to any one of [1] to [27].
[29] The semi-cured product of the curable composition according to any one of [1] to [27].
[30] A laminated body having a structure in which the cured product according to [29] is laminated on a substrate.
[31] The laminate according to [30], wherein the substrate is a copper substrate.
[32] The curable composition according to any one of [1] to [27] is applied onto a substrate and heat-treated to cure the curable composition. A method for manufacturing a laminate, which comprises producing a laminate having a structure in which a cured product of a product is laminated on a substrate.
[33] The semi-cured product of the curable composition according to any one of [1] to [27] is placed on a substrate and heat-treated to cure the semi-cured product. A method for producing a laminate, which comprises producing a laminate having a structure in which a cured product of a curable composition is laminated on a substrate.
[34] A printed circuit board having conductor wiring on the substrate, wherein the substrate is a substrate made of a cured product of the curable composition according to any one of [1] to [27].
[35] A method for manufacturing a printed circuit board having conductor wiring on a substrate, wherein the conductor wiring is formed on a substrate made of a cured product of the curable composition according to any one of [1] to [27]. A method of manufacturing a printed circuit board, which includes a step of making a printed circuit board.
[36] An electronic device having a printed circuit board, wherein the printed circuit board is provided with conductor wiring on a substrate made of a cured product of the curable composition according to any one of [1] to [27]. An electronic device that is a substrate.
[37] A method for manufacturing an electronic device including a printed circuit board, wherein the printed circuit board is provided with conductor wiring on the substrate, and the curable composition according to any one of [1] to [27]. A method for manufacturing an electronic device, which comprises a step of forming a conductor wiring on a substrate made of a cured product of an object.
 本開示の硬化性組成物は、加熱することにより、耐熱性及び可とう性を有する硬化物が得られる。また、前記硬化物は、好ましくは低CTEであり、銅と同程度の熱線膨張整数を有する。そのため、前記硬化性組成物は、銅配線を施す電子回路基板の原料として好適に使用することができる。 The curable composition of the present disclosure can be heated to obtain a cured product having heat resistance and flexibility. Further, the cured product preferably has a low CTE and has a heat ray expansion integer comparable to that of copper. Therefore, the curable composition can be suitably used as a raw material for an electronic circuit substrate to which copper wiring is applied.

Claims (20)

  1.  硬化性化合物とケイ酸塩を含み、前記ケイ酸塩の含有量が硬化性化合物100重量部に対して0.01~95重量部である硬化性組成物。 A curable composition containing a curable compound and a silicate, wherein the content of the silicate is 0.01 to 95 parts by weight with respect to 100 parts by weight of the curable compound.
  2.  ケイ酸塩が薄片状ケイ酸塩である、請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein the silicate is a flaky silicate.
  3.  ケイ酸塩が、下記特性1と特性2とを兼ね備える、請求項1又は2に記載の硬化性組成物。
    特性1:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが5.0mmとなるまでケイ酸塩を充填し、最大加圧7MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じる
    特性2:平面に設置した、高さ5.0mm、直径10mmの粉体試料用塩ビリングに、塩ビリング上部平面からの高さが3.0mmとなるまでケイ酸塩を充填し、最大加圧5MPaで3分間加圧して塩ビリング表面を平滑化し、除圧後5分で塩ビリングの表面に盛り上がりを生じない
    The curable composition according to claim 1 or 2, wherein the silicate has the following properties 1 and 2.
    Characteristic 1: A PVC ring for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface is filled with silicate until the height from the upper flat surface of the vinyl chloride ring reaches 5.0 mm, and the maximum pressurization is performed. Pressurize at 7 MPa for 3 minutes to smooth the PVC ring surface, and 5 minutes after decompression, the PVC ring surface rises. Characteristic 2: Salt for powder samples with a height of 5.0 mm and a diameter of 10 mm installed on a flat surface. The billing is filled with silicate until the height from the upper plane of the vinyl chloride ring reaches 3.0 mm, and the surface of the vinyl chloride ring is smoothed by pressurizing at a maximum pressurization of 5 MPa for 3 minutes. Does not cause swelling on the surface of
  4.  ケイ酸塩の最大径Lと、前記最大径Lに直交する径Lと厚みWが、下記式(a)、(b)を満たす、請求項1~3の何れか1項に記載の硬化性組成物。
     0.2L≦L≦L   (a)
     0.001L≦W≦0.08L   (b)
    The maximum diameter L 1 of the silicate, the maximum diameter L 1 diameter L 2 and a thickness W which is orthogonal to the following formula (a), satisfies the (b), according to any one of claims 1 to 3 Curable composition.
    0.2L 1 ≤ L 2 ≤ L 1 (a)
    0.001L 1 ≤ W ≤ 0.08L 1 (b)
  5.  ケイ酸塩が親油性ケイ酸塩である、請求項1に記載の硬化性組成物。 The curable composition according to claim 1, wherein the silicate is a lipophilic silicate.
  6.  ケイ酸塩がアルカリ金属を含む、請求項1~5の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 5, wherein the silicate contains an alkali metal.
  7.  ケイ酸塩のマグネシウム含有量が10重量%以上である、請求項1~6の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 6, wherein the magnesium content of the silicate is 10% by weight or more.
  8.  ケイ酸塩が薄片状ケイ酸塩であり、ナトリウム含有量が3.0重量%未満である、請求項1~7の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 7, wherein the silicate is a flaky silicate and the sodium content is less than 3.0% by weight.
  9.  ケイ酸塩が薄片状ケイ酸塩であり、カリウム含有量が1.0重量%以上である、請求項1~4,6~8の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 4, 6 to 8, wherein the silicate is a flaky silicate and the potassium content is 1.0% by weight or more.
  10.  ケイ酸塩が薄片状ケイ酸塩であり、アルミニウム含有量が0.5重量%以上である、請求項1~4,6~9の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 4, 6 to 9, wherein the silicate is a flaky silicate and the aluminum content is 0.5% by weight or more.
  11.  ケイ酸塩がフッ素原子を含む、請求項1~10の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 10, wherein the silicate contains a fluorine atom.
  12.  ケイ酸塩がマイカである、請求項1~11の何れか1項に記載の硬化性組成物。 The curable composition according to any one of claims 1 to 11, wherein the silicate is mica.
  13.  硬化性化合物が、下記式(1)
    Figure JPOXMLDOC01-appb-C000001
    [式中、R、Rは、同一又は異なって、硬化性官能基を示し、D、Dは、同一又は異なって、単結合又は連結基を示す。Lは、下記式(I)で表される構造と下記式(II)で表される構造とを含む繰り返し単位を有する2価の基を示す。
    Figure JPOXMLDOC01-appb-C000002
    (式中、Ar~Arは、同一又は異なって、アリーレン基、又は2個以上のアリーレン基が単結合若しくは連結基を介して結合した基を示す。Xは−CO−、−S−、又は−SO−を示し、Yは、同一又は異なって、−S−、−SO−、−O−、−CO−、−COO−、又は−CONH−を示す。nは0以上の整数を示す)]
    で表される化合物である、請求項1~12の何れか1項に記載の硬化性組成物。
    The curable compound has the following formula (1)
    Figure JPOXMLDOC01-appb-C000001
    [In the formula, R 1 and R 2 indicate the same or different curable functional groups, and D 1 and D 2 indicate the same or different single bond or linking group. L represents a divalent group having a repeating unit including a structure represented by the following formula (I) and a structure represented by the following formula (II).
    Figure JPOXMLDOC01-appb-C000002
    (In the formula, Ar 1 to Ar 3 are the same or different, and represent an arylene group or a group in which two or more arylene groups are bonded via a single bond or a linking group. X indicates -CO-, -S-. , Or -SO 2- , Y indicates the same or different, -S-, -SO 2- , -O-, -CO-, -COO-, or -CONH-. N is 0 or more. Indicates an integer)]
    The curable composition according to any one of claims 1 to 12, which is a compound represented by.
  14.  式(1)中のR、Rが、同一又は異なって、環状イミド構造を有する硬化性官能基である、請求項13に記載の硬化性組成物。 The curable composition according to claim 13, wherein R 1 and R 2 in the formula (1) are the same or different curable functional groups having a cyclic imide structure.
  15.  式(1)中のR、Rが、同一又は異なって、下記式(r−1)~(r−6)で表される基から選択される基である、請求項13に記載の硬化性組成物。
    Figure JPOXMLDOC01-appb-C000003
    (式中の窒素原子から伸びる結合手は、D又はDと結合する)
    The thirteenth aspect of the present invention, wherein R 1 and R 2 in the formula (1) are the same or different groups selected from the groups represented by the following formulas (r-1) to (r-6). Curable composition.
    Figure JPOXMLDOC01-appb-C000003
    (The bond extending from the nitrogen atom in the formula bonds with D 1 or D 2 )
  16.  請求項1~15の何れか1項に記載の硬化性組成物の硬化物。 A cured product of the curable composition according to any one of claims 1 to 15.
  17.  請求項1~15の何れか1項に記載の硬化性組成物の半硬化物。 A semi-cured product of the curable composition according to any one of claims 1 to 15.
  18.  請求項16に記載の硬化物が基板に積層された構成を有する積層体。 A laminated body having a structure in which the cured product according to claim 16 is laminated on a substrate.
  19.  基板が銅基板である請求項18に記載の積層体。 The laminate according to claim 18, wherein the substrate is a copper substrate.
  20.  請求項1~15の何れか1項に記載の硬化性組成物の硬化物からなる基板上に、導体配線が施されたプリント基板を有する電子デバイス。 An electronic device having a printed circuit board having conductor wiring on a substrate made of a cured product of the curable composition according to any one of claims 1 to 15.
PCT/JP2020/045359 2019-12-19 2020-11-26 Curable composition WO2021124938A1 (en)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934541A (en) * 1972-08-02 1974-03-30
JPH03121112A (en) * 1989-10-03 1991-05-23 Mitsubishi Kasei Corp Resin composition for semiconductor sealing
JP2000119422A (en) * 1998-10-14 2000-04-25 Mitsubishi Gas Chem Co Inc Prepreg and laminate
JP2003026939A (en) * 2000-12-08 2003-01-29 Sekisui Chem Co Ltd Material for insulating substrate, printed wiring board, laminate, copper foil with resin, copper-clad laminate, polyimide film, film for tab, and prepreg
JP2009256626A (en) * 2008-03-28 2009-11-05 Sekisui Chem Co Ltd Epoxy-based resin composition, prepreg, cured product, sheet-like molded form, laminated board, and multi-layer laminated board
JP2012215717A (en) * 2011-03-31 2012-11-08 Taiyo Ink Mfg Ltd Curable resin composition, and dry film and printed wiring board using the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4934541A (en) * 1972-08-02 1974-03-30
JPH03121112A (en) * 1989-10-03 1991-05-23 Mitsubishi Kasei Corp Resin composition for semiconductor sealing
JP2000119422A (en) * 1998-10-14 2000-04-25 Mitsubishi Gas Chem Co Inc Prepreg and laminate
JP2003026939A (en) * 2000-12-08 2003-01-29 Sekisui Chem Co Ltd Material for insulating substrate, printed wiring board, laminate, copper foil with resin, copper-clad laminate, polyimide film, film for tab, and prepreg
JP2009256626A (en) * 2008-03-28 2009-11-05 Sekisui Chem Co Ltd Epoxy-based resin composition, prepreg, cured product, sheet-like molded form, laminated board, and multi-layer laminated board
JP2012215717A (en) * 2011-03-31 2012-11-08 Taiyo Ink Mfg Ltd Curable resin composition, and dry film and printed wiring board using the same

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