WO2021115247A1 - Sample plate - Google Patents

Sample plate Download PDF

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Publication number
WO2021115247A1
WO2021115247A1 PCT/CN2020/134455 CN2020134455W WO2021115247A1 WO 2021115247 A1 WO2021115247 A1 WO 2021115247A1 CN 2020134455 W CN2020134455 W CN 2020134455W WO 2021115247 A1 WO2021115247 A1 WO 2021115247A1
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WO
WIPO (PCT)
Prior art keywords
sample
sample plate
scale
present disclosure
scale pattern
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Application number
PCT/CN2020/134455
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French (fr)
Chinese (zh)
Inventor
陈睿
夏浩涵
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上海睿钰生物科技有限公司
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Publication of WO2021115247A1 publication Critical patent/WO2021115247A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03Cuvette constructions
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/34Microscope slides, e.g. mounting specimens on microscope slides
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03Cuvette constructions
    • G01N2021/0357Sets of cuvettes

Definitions

  • the present disclosure relates to the field of optical microscopy, and in particular, to a sample plate.
  • the existing sample plates used for cell counting or analysis usually include one or more sample slots.
  • the sample slots are used to hold the cell samples to be tested, and then the number of cells can be obtained through the microscopic imaging system and the image analysis system. Concentration, size and other parameters.
  • the detection of these parameters depends on the observation ability of the microscope or microscopic imaging system. The most important and important characteristic parameter is the magnification, and the actual magnification of many microscopic instruments on the market is inconsistent with its nominal nominal value.
  • the calibration and calibration of microscope magnification mainly adopts micrometer or similar micrometer technology, and the actual magnification of the microscope is calibrated through the cooperation of the eyepiece micrometer and the objective micrometer.
  • the actual magnification of the microscope can be calculated by comparing the size obtained in the microscopic imaging system with the known interval size in the ruler.
  • these technologies have certain defects.
  • the eyepiece or objective lens is changed, it needs to be re-calibrated.
  • the sample to be tested needs to be removed, which leads to duplication and troubles of the operation, and it is necessary to search for the original field of view At the same time, it will also cause the sample to move in the sample tank, which will affect the observation results.
  • the existing cytometer does not have the ability to accurately calibrate the magnification of the microscope, which leads to inconsistencies between the detected parameters and the actual The accuracy of the final result
  • a sample plate including: a sample tank for holding a sample; and a ruler pattern for determining the magnification of the microscopic device.
  • the scale pattern is located at the bottom of the sample tank.
  • the sample plate includes a plurality of sample slots, and the scale pattern is provided at the bottom of each sample slot.
  • the scale pattern is located near the sample groove.
  • the scale pattern includes a first scale line extending in a first direction.
  • the scale pattern includes a plurality of first scale lines, and the plurality of first scale lines are arranged in a second direction different from the first direction.
  • the first direction is perpendicular to the second direction.
  • the sample groove extends in the first direction or the second direction.
  • the scale pattern further includes a second scale line extending in a second direction.
  • the scale pattern further includes a first mark for determining the extension direction and the arrangement direction of the sample groove.
  • the first identification includes a first arrow and a second arrow that are perpendicular to each other.
  • the scale pattern further includes a second mark for identifying the sample plate.
  • the scale pattern further includes a third identification for identifying the sample slot.
  • Figure 1 shows a schematic diagram of a microscopic device according to some embodiments of the present disclosure.
  • Figure 2 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 3 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 4 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 5 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 6A shows a scale pattern on a sample plate according to some embodiments of the present disclosure.
  • FIG. 6B shows an image of a ruler pattern on a sample plate according to some embodiments of the present disclosure.
  • Figure 7 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 8 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 9 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • Figure 10 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • FIG. 11 shows a set of scale lines in a ruler pattern on a sample plate according to some embodiments of the present disclosure.
  • Figure 12 shows a flow chart of the operation of the microscopic device according to some embodiments of the present disclosure.
  • FIG. 13 shows a schematic diagram of the pixel arrangement direction of the image sensor.
  • Fig. 1 shows a schematic diagram of a microscopic device according to an embodiment of the present disclosure.
  • the microscopic apparatus 100 includes an image sensor 101, a memory 102, a processor 103, an optical imaging device 104, a sample stage 105 and a light source 106.
  • the sample plate to be observed is arranged on the sample stage 105.
  • the light emitted by the light source 106 irradiates the sample plate.
  • the optical imaging device 104 may include, for example, an objective lens and an eyepiece (not shown), and each of the objective lens and the eyepiece may be composed of one or more sets of lenses.
  • the optical image formed by the optical device 104 is received by the image sensor 101 and converted into a digital image by the image sensor 101.
  • the image sensor may be, for example, a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), or the like.
  • CCD charge coupled device
  • CMOS complementary metal oxide semiconductor
  • image capturing devices such as mobile phones and cameras may also be arranged in the light path. These image capturing devices also include image sensors and can capture images of samples in the sample plate through the optical device 104 .
  • the digital image obtained by the image sensor 101 is stored in the memory 102, and the processor 103 can read the digital image in the memory 102 and process the digital image.
  • Figure 2 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • the sample plate 200 includes a plurality of sample grooves 201 in which samples to be observed and photographed can be accommodated.
  • the sample plate 200 also has a scale pattern 202.
  • the scale pattern 202 is located at the bottom of the sample tank (that is, on the surface of the sample tank in contact with the sample therein).
  • the optical imaging device 104 usually focuses on the bottom of the sample tank, and setting the scale pattern 202 at the bottom of the sample tank can obtain a clear image of the scale pattern while obtaining the sample image.
  • the scale pattern 202 is a line segment along the horizontal direction, and the length is L.
  • L may be 1 ⁇ m-100 ⁇ m.
  • D is the distance between adjacent pixels in the image sensor 101, that is, the distance from the center of one pixel in the X direction or the Y direction to the center of adjacent pixels.
  • the function sqrt means to calculate the square root.
  • magnification M of the optical imaging device 104 of the microscopic apparatus 100 can be calculated according to the following formula (2):
  • the actual magnification of the microscopic device 100 can be accurately obtained.
  • the pixel array of the image sensor 101 is a rectangular array, and the pitch of adjacent pixels is the same in the X direction and the Y direction. In other embodiments according to the present disclosure, the pitch of adjacent pixels of the image sensor 101 is different in the X direction and the Y direction. For example, if the distance between adjacent pixels in the X direction is D1, and the distance between adjacent pixels in the Y direction is D2, the line segment image formed on the image sensor 101 by the line segment on the sample board can be calculated according to the following formula (3) Size K:
  • the actual magnification M of the microscopic device 100 can be calculated according to the above formula (2).
  • the processor 103 of the microscopic device 100 can be performed by the processor 103 of the microscopic device 100, for example.
  • the pitch of adjacent pixels of the image sensor 101 may be stored in the memory 102 in advance. After the image sensor 101 generates a digital image of the sample plate 200, the digital image is stored in the memory 102.
  • the processor 103 reads the digital image from the memory 102 and recognizes the scale pattern in the digital image. Next, the processor 103 can read the distance between adjacent pixels of the image sensor 101 from the memory, and calculate the actual magnification M of the microscopic device 101 according to the above formulas (1)-(3).
  • magnification M can also be calculated in the following manner.
  • the corresponding magnifications M1, M2, and M3 can be calculated based on the ruler pattern 202 on each sample slot 201, and then the microscopy can be calculated by formula (4) The actual magnification of the device M.
  • the average value of the magnifications M1, M2, and M3 is taken as the actual magnification M of the microscopic device. In this way, the calculation error can be reduced, and the accuracy of the magnification can be further improved.
  • the sum K'of the line segments of each scale pattern 202 can be calculated by the following formula (5).
  • (x1, y1) and (x2, y2) are the coordinates of the two ends of the ruler pattern of the first sample slot 202 in the upper part of FIG. 2 in the digital image
  • (x3, y3) and (x4, y4) are the graphs 2
  • (x5, y5) and (x6, y6) are the two ends of the ruler pattern of the third sample slot 202 in the lower part of Fig. 2 The coordinates in the digital image.
  • the actual magnification M of the microscopic device can be calculated by formula (6).
  • Figure 3 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
  • the sample plate 300 includes a plurality of sample grooves 301, and samples to be observed and photographed can be accommodated in the sample grooves 301.
  • the sample plate 300 also has a scale pattern 302.
  • the scale pattern 302 is located at the bottom of the sample tank.
  • the scale pattern 302 is equal-spaced scale lines (first scale lines), each scale line extends along the horizontal direction (first direction), and the distance between each scale line in the vertical direction (second direction) is D.
  • the pitch D may be, for example, 1 ⁇ m-10 ⁇ m.
  • the processor 103 may obtain the coordinates (x1', y1') of a point on a scale line in the scale pattern 302 according to the digital image generated by the image sensor 101, and obtain the passing point (x1', y1') along The coordinates (x2', y2') of the intersection point between the direction perpendicular to the scale line and the adjacent scale line.
  • the actual magnification of the microscopic device 100 can be calculated.
  • FIG. 4 shows a schematic diagram of a sample plate 400 according to some embodiments of the present disclosure.
  • the scale pattern 402 is provided on the outside of the sample tank 401. In this way, the interference of the ruler pattern 402 on the sample in the sample tank 401 can be avoided, and the sample can be observed and analyzed more clearly.
  • the scale pattern 402 may be located on the same plane as the bottom of the sample tank.
  • FIG. 5 shows a schematic diagram of a sample plate 500 according to some embodiments of the present disclosure.
  • the sample plate 500 includes a plurality of sample slots 501.
  • a cross-shaped ruler pattern 502 is provided at the bottom of each sample slot 501.
  • the scale pattern 502 includes two line segments perpendicular to each other, and the length of the two line segments can be the same or different. For example, one line segment (ie, the first scale line) extends in the horizontal direction, and the other line segment (ie, the second scale line) extends in the vertical direction.
  • the magnification of the microscopic device can also be calculated from the digital image taken by the image sensor 101.
  • the magnification of the microscopic device can be calculated according to the above formulas (1)-(2) and the length of any one of the two line segments in the scale pattern 502.
  • the magnification can be calculated separately based on each of the two line segments, and then the average of the two magnifications can be taken as the magnification of the microscopy device.
  • the scale pattern 502 on the sample plate 500 of FIG. 5 can also be used to identify and correct the distortion of the microscopic device 100.
  • the image of the scale pattern 502 should also be two line segments perpendicular to each other, as shown in FIG. 6A.
  • the processor 103 can recognize that the optical imaging device of the microscopic apparatus 100 is distorted.
  • the processor 103 may also correct the digital image generated by the image sensor 101 based on known parameters such as the size of the scale pattern 502, so as to improve the image quality.
  • FIG. 7 shows a schematic diagram of a sample plate 700 according to some embodiments of the present disclosure.
  • the sample plate 700 includes a plurality of sample grooves 701 extending in a horizontal direction, and the bottom of each sample groove 701 is provided with a scale pattern 702.
  • the scale pattern 702 includes a plurality of scale lines, each scale line extends in the horizontal direction (first direction), and the plurality of scale lines are arranged in the direction of the broken line 703 (second direction).
  • the direction of the broken line 703 is not a vertical direction perpendicular to the horizontal direction. In this way, the scale pattern 702 can cover most of the sample groove 701 area.
  • this form of the ruler pattern 702 can ensure that at least one complete graduation line appears in the field of view. In this way, no matter which position of the sample tank 701 is observed, the magnification of the microscopic device can be accurately calculated.
  • the orientation of the sample plate and the sample slot can also be determined according to the scale pattern on the sample plate.
  • the sample plate 300 shown in FIG. 3 includes a plurality of sample grooves 301 arranged in a vertical direction, and each sample groove 301 extends in a horizontal direction.
  • each scale line in the scale pattern 302 extends in the horizontal direction, that is, the extension direction of the scale line is the same as the extension direction of the sample tank, and the arrangement direction of the multiple scale lines is consistent with the arrangement direction of the multiple sample tanks. . Therefore, although only a part of the sample tank is displayed in the field of view of the microscopic equipment or the photographed picture, the processor 103 or the operator can determine the extension direction and the arrangement direction of the sample tank according to the extension direction and the arrangement direction of the scale line, and according to the determined The extension direction and arrangement direction of the sample slots move the sample plate 300 on the sample stage 105 to realize the observation and shooting of different sample slots 301 or different areas of the same sample slot 301.
  • FIG. 8 shows a schematic diagram of a sample plate 800 according to other embodiments of the present disclosure.
  • the sample plate 800 includes a plurality of sample grooves 801 extending in a horizontal direction, and the plurality of sample grooves 801 are arranged in a vertical direction.
  • a scale pattern 802 is provided at the bottom of each sample tank 801.
  • the scale pattern 802 includes a first identifier for determining the arrangement direction and the extension direction of the sample grooves 801.
  • the first logo is composed of two arrows 803 and 804 perpendicular to each other, wherein the arrow 803 extends in the vertical direction, and the arrow 804 extends in the horizontal direction.
  • the longer arrow indicates the arrangement direction of the sample tanks
  • the shorter arrow indicates the extension direction of the sample tanks.
  • the length of the arrow 803 is greater than the length of the arrow 804. Therefore, according to the extending direction of the arrow 803, it can be determined that the plurality of sample grooves 801 are arranged in the vertical direction, and according to the extending direction of the arrow 804, the sample grooves 802 can be determined to be in the horizontal direction. extend.
  • FIG. 9 shows a schematic diagram of a sample plate 900 according to some embodiments of the present disclosure.
  • the sample plate 900 includes a plurality of sample slots 901 arranged in a horizontal direction, and each sample slot 901 also extends in the horizontal direction.
  • a scale pattern 902 is provided at the bottom of each sample tank 901.
  • the scale pattern 902 includes a first mark for determining the arrangement direction and extension direction of the sample grooves 901.
  • the first mark is composed of arrows 903 and 904, wherein the longer arrow 903 indicates the arrangement direction of the sample tank 901, and the shorter arrow 904 indicates the extension direction of the sample tank 901. In this way, through the extending directions of the arrows 903 and 904, it can be determined that the plurality of sample grooves 901 are arranged in the horizontal direction, and each sample groove 901 also extends in the horizontal direction.
  • FIG. 10 shows a schematic diagram of a sample plate 1000 according to some embodiments of the present disclosure.
  • the sample plate 1000 includes a plurality of sample slots 1001 arranged in a vertical direction, and each sample slot 1001 extends in a horizontal direction.
  • a scale pattern 1002 is provided at the bottom of the sample tank 1001.
  • the ruler pattern 1002 includes a second mark 1004 for identifying the sample plate and a third mark 1003 for identifying the sample slot.
  • the second mark 1004 and the third mark 1003 are composed of a plurality of scale lines, which are arranged in a horizontal direction, and each scale line extends in a vertical direction.
  • the leftmost scale line 1005 and the rightmost scale line 1006 indicate the beginning and end of the second mark 1004 and the third mark 1003.
  • the second mark 1004 and the third mark 1003 are between the scale line 1005 and the scale line 1006. According to the second identification 1004 and the third identification 1003, the number of the sample plate and the number of the sample slot can be determined respectively.
  • the third mark 1003 contains two scale lines, and the number of the sample slot in which the third mark 1003 is located can be determined as 11.
  • the third mark 1003 contains one scale line, and it can be obtained according to the distance between the scale lines. A scale line is missing in front of the scale line. Therefore, the sample where the third mark 1003 is located The slot number can be determined as 01. In the same way, for the third identification 1003 in the sample slot 1001 in the middle, it can be determined that the number of the sample slot is 10.
  • the missing scale lines represent 0, and the number of the sample plate 1000 can be determined to be 1101.
  • scale lines of different lengths can be used to represent 0 and 1 respectively.
  • the longer scale line represents 1
  • the shorter scale line represents 0.
  • a set of tick marks in Figure 11 can be identified as 1011011.
  • FIG. 12 shows a flowchart of the operation of the microscopic device 100 according to some embodiments of the present disclosure.
  • the sample plate is placed on the sample stage 105 (step 1201). There are samples to be observed and photographed in the sample slot of the sample plate.
  • a digital image of the sample is generated by the image sensor 101 (step 1202).
  • the optical image formed by the optical imaging device 104 of the microscopic apparatus 100 is received by the image sensor 101, and a digital image is generated.
  • the digital image can be stored in the memory 102.
  • the processor 103 can read the digital image from the memory 102 and perform various processing (step 1203).
  • the magnification of the microscopy device 100 can be calculated based on the scale pattern in the digital image, the extension direction and arrangement direction of the sample slot can be determined, the sample plate (number) can be identified, or the sample slot can be identified (of Number), etc.
  • embodiments according to the present disclosure may also include the following technical solutions:
  • a sample plate including:
  • a sample tank for holding samples
  • the ruler pattern used to determine the magnification.
  • the scale pattern further includes a first identifier for determining the extension direction and the arrangement direction of the sample groove.
  • the word "exemplary” means “serving as an example, instance, or illustration” and not as a “model” to be copied exactly. Any implementation described exemplarily herein is not necessarily construed as being preferred or advantageous over other implementations. Moreover, the present disclosure is not limited by any expressed or implied theory given in the above technical field, background art, summary of the invention, or specific embodiments.
  • the word “substantially” means to include any minor changes caused by design or manufacturing defects, device or component tolerances, environmental influences, and/or other factors.
  • the word “substantially” also allows for differences between the perfect or ideal situation due to parasitic effects, noise, and other practical considerations that may be present in the actual implementation.
  • connection means that one element/node/feature is electrically, mechanically, logically, or otherwise directly connected (or Direct communication).
  • coupled means that one element/node/feature can be directly or indirectly connected to another element/node/feature mechanically, electrically, logically, or in other ways. Interaction is allowed, even if the two features may not be directly connected. In other words, “coupled” is intended to include direct connection and indirect connection of elements or other features, including the connection of one or more intermediate elements.
  • the term “provide” is used in a broad sense to cover all the ways to obtain an object, so “provide an object” includes but is not limited to “purchase”, “preparation/manufacturing”, “arrangement/setting”, “installation/ “Assemble”, and/or “Order” objects, etc.

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Abstract

A sample plate (200, 300, 400, 500, 700, 800, 900, 1000), which comprises sample grooves (201, 301, 401, 501, 701, 801, 901, 1001) used for containing samples; and gauge patterns (202, 302, 402, 502, 702, 802, 902, 1002) used for determining the magnification of a microscope apparatus 100.

Description

样品板Sample plate
相关申请的交叉引用Cross-references to related applications
本申请要求申请日为2019年12月11日、申请号为CN201911264674.1的中国发明专利申请的优先权的权益,其全部内容通过引用包含于此。This application claims the right of priority for the Chinese invention patent application whose application date is December 11, 2019 and the application number is CN201911264674.1, the entire content of which is incorporated herein by reference.
技术领域Technical field
本公开涉及光学显微领域,具体来说,涉及一种样品板。The present disclosure relates to the field of optical microscopy, and in particular, to a sample plate.
背景技术Background technique
目前,现有用于细胞计数或分析的样品板通常包括1个或多个样品槽,样品槽内用来容纳待检测的细胞样品,再通过显微成像系统,图像分析系统,获得细胞的数目,浓度,大小等参数。但这些参数的检测,取决于显微镜或显微成像系统的观测能力,其中最主要和最重要的特征参数就是放大倍率,而市场上很多显微仪器的实际放大倍率与其标称的名义值不一致。At present, the existing sample plates used for cell counting or analysis usually include one or more sample slots. The sample slots are used to hold the cell samples to be tested, and then the number of cells can be obtained through the microscopic imaging system and the image analysis system. Concentration, size and other parameters. However, the detection of these parameters depends on the observation ability of the microscope or microscopic imaging system. The most important and important characteristic parameter is the magnification, and the actual magnification of many microscopic instruments on the market is inconsistent with its nominal nominal value.
目前对显微镜放大倍数的标定和校准主要采取测微尺或者类似测微尺的技术,通过目镜测微尺和物镜测微尺的配合,来标定显微镜的实际放大倍数。例如,通过标尺中已知的间隔尺寸,来对比在显微成像系统中得到的尺寸,来计算出显微镜的实际放大倍率。但这些技术都存在一定的缺陷,当更换目镜或物镜的时候,就需要重新标定,而这时候待检测的样品就需要取下,导致了操作的重复和麻烦,还需要重新寻找原先观察的视野,同时还会导致样品在样品槽内的移动,影响观察结果。At present, the calibration and calibration of microscope magnification mainly adopts micrometer or similar micrometer technology, and the actual magnification of the microscope is calibrated through the cooperation of the eyepiece micrometer and the objective micrometer. For example, the actual magnification of the microscope can be calculated by comparing the size obtained in the microscopic imaging system with the known interval size in the ruler. However, these technologies have certain defects. When the eyepiece or objective lens is changed, it needs to be re-calibrated. At this time, the sample to be tested needs to be removed, which leads to duplication and troubles of the operation, and it is necessary to search for the original field of view At the same time, it will also cause the sample to move in the sample tank, which will affect the observation results.
因此,对显微镜或显微成像系统的放大倍率进行测量具有十分重要的意义,而现有的细胞计数板不具备对显微镜放大倍数进行准确标定的能力,导致检测出来的参数与实际不一致,影响了最终结果的准确性Therefore, it is very important to measure the magnification of a microscope or microscopic imaging system. The existing cytometer does not have the ability to accurately calibrate the magnification of the microscope, which leads to inconsistencies between the detected parameters and the actual The accuracy of the final result
发明内容Summary of the invention
根据本公开的一个方面,提供了一种样品板,包括:用于容纳样品的样品槽;以及用于确定显微装置的放大倍率的标尺图案。According to an aspect of the present disclosure, there is provided a sample plate including: a sample tank for holding a sample; and a ruler pattern for determining the magnification of the microscopic device.
在根据本公开的一些实施例中,所述标尺图案位于所述样品槽底部。In some embodiments according to the present disclosure, the scale pattern is located at the bottom of the sample tank.
在根据本公开的一些实施例中,所述样品板包括多个样品槽,在每个样品槽底部 都设置有所述标尺图案。In some embodiments according to the present disclosure, the sample plate includes a plurality of sample slots, and the scale pattern is provided at the bottom of each sample slot.
在根据本公开的一些实施例中,所述标尺图案位于所述样品槽附近。In some embodiments according to the present disclosure, the scale pattern is located near the sample groove.
在根据本公开的一些实施例中,所述标尺图案包含沿第一方向延伸的第一刻度线。In some embodiments according to the present disclosure, the scale pattern includes a first scale line extending in a first direction.
在根据本公开的一些实施例中,所述标尺图案包括多个第一刻度线,并且所述多个第一刻度线沿与第一方向不同的第二方向排列。In some embodiments according to the present disclosure, the scale pattern includes a plurality of first scale lines, and the plurality of first scale lines are arranged in a second direction different from the first direction.
在根据本公开的一些实施例中,所述第一方向与所述第二方向垂直。In some embodiments according to the present disclosure, the first direction is perpendicular to the second direction.
在根据本公开的一些实施例中,所述样品槽沿所述第一方向或所述第二方向延伸。In some embodiments according to the present disclosure, the sample groove extends in the first direction or the second direction.
在根据本公开的一些实施例中,所述标尺图案还包含沿第二方向延伸的第二刻度线。In some embodiments according to the present disclosure, the scale pattern further includes a second scale line extending in a second direction.
在根据本公开的一些实施例中,所述标尺图案还包含用于确定所述样品槽的延伸方向和排列方向的第一标识。In some embodiments according to the present disclosure, the scale pattern further includes a first mark for determining the extension direction and the arrangement direction of the sample groove.
在根据本公开的一些实施例中,所述第一标识包含彼此垂直的第一箭头和第二箭头。In some embodiments according to the present disclosure, the first identification includes a first arrow and a second arrow that are perpendicular to each other.
在根据本公开的一些实施例中,所述标尺图案还包含用于识别所述样品板的第二标识。In some embodiments according to the present disclosure, the scale pattern further includes a second mark for identifying the sample plate.
在根据本公开的一些实施例中,所述标尺图案还包含用于识别所述样品槽的第三标识。In some embodiments according to the present disclosure, the scale pattern further includes a third identification for identifying the sample slot.
通过以下参照附图对本公开的示例性实施例的详细描述,本公开的其它特征及其优点将会变得清楚。Through the following detailed description of exemplary embodiments of the present disclosure with reference to the accompanying drawings, other features and advantages of the present disclosure will become clear.
附图说明Description of the drawings
构成说明书的一部分的附图描述了本公开的实施例,并且连同说明书一起用于解释本公开的原理。The drawings constituting a part of the specification describe the embodiments of the present disclosure, and together with the specification, serve to explain the principle of the present disclosure.
参照附图,根据下面的详细描述,可以更加清楚地理解本公开,其中:With reference to the accompanying drawings, the present disclosure can be understood more clearly according to the following detailed description, in which:
图1示出了根据本公开的一些实施例的显微装置的示意图。Figure 1 shows a schematic diagram of a microscopic device according to some embodiments of the present disclosure.
图2示出了根据本公开的一些实施例的样品板的示意图。Figure 2 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图3示出了根据本公开的一些实施例的样品板的示意图。Figure 3 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图4示出了根据本公开的一些实施例的样品板的示意图。Figure 4 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图5示出了根据本公开的一些实施例的样品板的示意图。Figure 5 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图6A示出了根据本公开的一些实施例的样品板上的标尺图案。Figure 6A shows a scale pattern on a sample plate according to some embodiments of the present disclosure.
图6B示出了根据本公开的一些实施例的样品板上的标尺图案的图像。FIG. 6B shows an image of a ruler pattern on a sample plate according to some embodiments of the present disclosure.
图7示出了根据本公开的一些实施例的样品板的示意图。Figure 7 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图8示出了根据本公开的一些实施例的样品板的示意图。Figure 8 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图9示出了根据本公开的一些实施例的样品板的示意图。Figure 9 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图10示出了根据本公开的一些实施例的样品板的示意图。Figure 10 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure.
图11示出了根据本公开的一些实施例的样品板上的标尺图案中的一组刻度线。FIG. 11 shows a set of scale lines in a ruler pattern on a sample plate according to some embodiments of the present disclosure.
图12示出了根据本公开的一些实施例的显微装置的操作的流程图。Figure 12 shows a flow chart of the operation of the microscopic device according to some embodiments of the present disclosure.
图13示出了图像传感器的的像素排列方向的示意图。FIG. 13 shows a schematic diagram of the pixel arrangement direction of the image sensor.
注意,在以下说明的实施方式中,有时在不同的附图之间共同使用同一附图标记来表示相同部分或具有相同功能的部分,而省略其重复说明。在本说明书中,使用相似的标号和字母表示类似项,因此,一旦某一项在一个附图中被定义,则在随后的附图中不需要对其进行进一步讨论。Note that in the embodiments described below, the same reference numerals are sometimes used in common between different drawings to denote the same parts or parts with the same functions, and repeated descriptions thereof are omitted. In this specification, similar reference numerals and letters are used to indicate similar items. Therefore, once a certain item is defined in one figure, it does not need to be further discussed in subsequent figures.
为了便于理解,在附图等中所示的各结构的位置、尺寸及范围等有时不表示实际的位置、尺寸及范围等。因此,所公开的发明并不限于附图等所公开的位置、尺寸及范围等。For ease of understanding, the position, size, range, etc. of each structure shown in the drawings and the like may not indicate the actual position, size, range, etc. Therefore, the disclosed invention is not limited to the position, size, range, etc. disclosed in the drawings and the like.
具体实施方式Detailed ways
现在将参照附图来详细描述本公开的各种示例性实施例。应注意到:除非另外具体说明,否则在这些实施例中阐述的部件和步骤的相对布置、数字表达式和数值不限制本公开的范围。Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. It should be noted that unless specifically stated otherwise, the relative arrangement of components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present disclosure.
以下对至少一个示例性实施例的描述实际上仅仅是说明性的,决不作为对本公开及其应用或使用的任何限制。The following description of at least one exemplary embodiment is actually only illustrative, and in no way serves as any limitation to the present disclosure and its application or use.
对于相关领域普通技术人员已知的技术、方法和设备可能不作详细讨论,但在适当情况下,所述技术、方法和设备应当被视为授权说明书的一部分。The technologies, methods, and equipment known to those of ordinary skill in the relevant fields may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be regarded as part of the authorization specification.
在这里示出和讨论的所有示例中,任何具体值应被解释为仅仅是示例性的,而不是作为限制。因此,示例性实施例的其它示例可以具有不同的值。In all examples shown and discussed herein, any specific value should be interpreted as merely exemplary, rather than as a limitation. Therefore, other examples of the exemplary embodiment may have different values.
图1示出了根据本公开的实施例的显微装置的示意图。Fig. 1 shows a schematic diagram of a microscopic device according to an embodiment of the present disclosure.
如图1所示,该显微装置100包括图像传感器101、存储器102、处理器103、光学成像设备104、样品台105和光源106。在工作时,待观察的样品板被布置在样品 台105上。光源106发出的光照射到样品板上。光学成像设备104可以包括例如物镜和目镜等(未示出),物镜和目镜各自可以由一组或多组透镜构成。通过光学设备104形成的光学图像被图像传感器101接收,并且被图像传感器101转换成数字图像。图像传感器可以为例如电荷耦合器件(CCD)、互补金属氧化物半导体(CMOS)等。在根据本公开的一些实施例中,也可以把例如手机、照相机等图像拍摄装置布置在光路中,这些图像拍摄装置中也包含图像传感器,并且能够通过光学设备104拍摄样品板中的样品的图像。As shown in FIG. 1, the microscopic apparatus 100 includes an image sensor 101, a memory 102, a processor 103, an optical imaging device 104, a sample stage 105 and a light source 106. At work, the sample plate to be observed is arranged on the sample stage 105. The light emitted by the light source 106 irradiates the sample plate. The optical imaging device 104 may include, for example, an objective lens and an eyepiece (not shown), and each of the objective lens and the eyepiece may be composed of one or more sets of lenses. The optical image formed by the optical device 104 is received by the image sensor 101 and converted into a digital image by the image sensor 101. The image sensor may be, for example, a charge coupled device (CCD), a complementary metal oxide semiconductor (CMOS), or the like. In some embodiments according to the present disclosure, image capturing devices such as mobile phones and cameras may also be arranged in the light path. These image capturing devices also include image sensors and can capture images of samples in the sample plate through the optical device 104 .
通过图像传感器101获得的数字图像被存储在存储器102中,处理器103可以读取存储器102中的数字图像并对数字图像进行处理。The digital image obtained by the image sensor 101 is stored in the memory 102, and the processor 103 can read the digital image in the memory 102 and process the digital image.
图2示出了根据本公开的一些实施例的样品板的示意图。如图2所示,样品板200包括多个样品槽201,在样品槽201中可以容纳需要观察和拍摄的样品。此外,样品板200还具有标尺图案202。Figure 2 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure. As shown in FIG. 2, the sample plate 200 includes a plurality of sample grooves 201 in which samples to be observed and photographed can be accommodated. In addition, the sample plate 200 also has a scale pattern 202.
在图2所示的示例性实施例中,标尺图案202位于样品槽底部(即样品槽与其中的样品接触的表面上)。在通过显微装置100获取样品的图像时,光学成像设备104通常聚焦于样品槽底部,将标尺图案202设置在样品槽底部可以在获得样品图像的同时得到清晰的标尺图案的图像。标尺图案202为沿水平方向的线段,长度为L。例如,在一些示例性实施例中,L可以为1μm-100μm。利用该标尺图案202,可以准确地计算显微装置100的放大倍率。In the exemplary embodiment shown in FIG. 2, the scale pattern 202 is located at the bottom of the sample tank (that is, on the surface of the sample tank in contact with the sample therein). When acquiring an image of a sample through the microscopic device 100, the optical imaging device 104 usually focuses on the bottom of the sample tank, and setting the scale pattern 202 at the bottom of the sample tank can obtain a clear image of the scale pattern while obtaining the sample image. The scale pattern 202 is a line segment along the horizontal direction, and the length is L. For example, in some exemplary embodiments, L may be 1 μm-100 μm. Using the scale pattern 202, the magnification of the microscopic device 100 can be accurately calculated.
例如,如图13所示,对于像素沿互相垂直的两个方向(X方向和Y方向)均匀排列的图像传感器101,假设在通过图像传感器101生成的数字图像中,标尺图案202的线段两端的坐标分别为(x1,y1)和(x2,y2)。这里,坐标(x1,y1)和(x2,y2)表示与线段的两端对应的像素在图像传感器101上的位置。那么可以根据公式(1)计算样品板上的线段在图像传感器101上形成的线段图像的尺寸K:For example, as shown in FIG. 13, for an image sensor 101 in which pixels are uniformly arranged in two directions (X direction and Y direction) perpendicular to each other, it is assumed that in the digital image generated by the image sensor 101, the lines at both ends of the ruler pattern 202 The coordinates are (x1, y1) and (x2, y2) respectively. Here, the coordinates (x1, y1) and (x2, y2) represent the positions on the image sensor 101 of pixels corresponding to both ends of the line segment. Then the size K of the line segment image formed on the image sensor 101 by the line segment on the sample board can be calculated according to formula (1):
K=D·sqrt[(x2-x1) 2+(y2-y1) 2]     (1) K=D·sqrt[(x2-x1) 2 +(y2-y1) 2 ] (1)
其中,D为图像传感器101中相邻像素的间距,即从一个像素的中心沿X方向或Y方向到相邻的像素的中心的距离。函数sqrt表示计算平方根。Wherein, D is the distance between adjacent pixels in the image sensor 101, that is, the distance from the center of one pixel in the X direction or the Y direction to the center of adjacent pixels. The function sqrt means to calculate the square root.
那么,可以根据下面公式(2)计算显微装置100的光学成像设备104的放大倍率M:Then, the magnification M of the optical imaging device 104 of the microscopic apparatus 100 can be calculated according to the following formula (2):
M=K/L     (2)M=K/L (2)
通过上面的方式,可以准确地得到显微装置100的实际放大倍率。Through the above method, the actual magnification of the microscopic device 100 can be accurately obtained.
上面的示例性实施例中,图像传感器101的像素阵列为矩形阵列,并且相邻像素的间距在X方向和Y方向相同。在根据本公开的另一些实施例中,图像传感器101的相邻像素的间距在X方向和Y方向不同。例如,沿X方向的相邻像素的间距为D1,沿Y方向的相邻像素的间距为D2,则可以根据下面公式(3)计算样品板上的线段在图像传感器101上形成的线段图像的尺寸K:In the above exemplary embodiment, the pixel array of the image sensor 101 is a rectangular array, and the pitch of adjacent pixels is the same in the X direction and the Y direction. In other embodiments according to the present disclosure, the pitch of adjacent pixels of the image sensor 101 is different in the X direction and the Y direction. For example, if the distance between adjacent pixels in the X direction is D1, and the distance between adjacent pixels in the Y direction is D2, the line segment image formed on the image sensor 101 by the line segment on the sample board can be calculated according to the following formula (3) Size K:
K=sqrt[(D1) 2·(x2-x1) 2+(D2) 2·(y2-y1) 2]    (3) K=sqrt[(D1) 2 ·(x2-x1) 2 +(D2) 2 ·(y2-y1) 2 ] (3)
然后,根据上面的公式(2)可以计算得到显微装置100的实际放大倍率M。Then, the actual magnification M of the microscopic device 100 can be calculated according to the above formula (2).
上述对于实际放大倍率的计算可以由例如显微装置100的处理器103进行。例如,图像传感器101的相邻像素的间距可以预先存储在存储器102中。当图像传感器101生成样品板200的数字图像后,该数字图像被存储在存储器102中。The foregoing calculation of the actual magnification can be performed by the processor 103 of the microscopic device 100, for example. For example, the pitch of adjacent pixels of the image sensor 101 may be stored in the memory 102 in advance. After the image sensor 101 generates a digital image of the sample plate 200, the digital image is stored in the memory 102.
然后,处理器103从存储器102读取该数字图像,识别数字图像中的标尺图案。接下来,处理器103可以从存储器读取图像传感器101的相邻像素的间距,并根据上面的公式(1)-(3)计算得到显微装置101的实际放大倍率M。Then, the processor 103 reads the digital image from the memory 102 and recognizes the scale pattern in the digital image. Next, the processor 103 can read the distance between adjacent pixels of the image sensor 101 from the memory, and calculate the actual magnification M of the microscopic device 101 according to the above formulas (1)-(3).
此外,在根据本公开的一些实施例中,对于具有多个样品槽201的样品板200,还可以采用以下方式来计算放大倍率M。In addition, in some embodiments according to the present disclosure, for a sample plate 200 having a plurality of sample grooves 201, the magnification M can also be calculated in the following manner.
对于图2所示的样品板200具有三个样品槽201,则可以基于每个样品槽201上的标尺图案202分别计算对应的放大倍率M1,M2和M3,然后通过公式(4)计算显微装置的实际放大倍率M。For the sample plate 200 shown in FIG. 2 with three sample slots 201, the corresponding magnifications M1, M2, and M3 can be calculated based on the ruler pattern 202 on each sample slot 201, and then the microscopy can be calculated by formula (4) The actual magnification of the device M.
M=(M1+M2+M3)/3     (4)M=(M1+M2+M3)/3 (4)
即,将放大倍率M1,M2和M3的平均值作为显微装置的实际放大倍率M。采用这种方式,可以减小计算误差,进一步提高放大倍率的准确性。That is, the average value of the magnifications M1, M2, and M3 is taken as the actual magnification M of the microscopic device. In this way, the calculation error can be reduced, and the accuracy of the magnification can be further improved.
此外,在根据本公开的另一些实施例中,可以通过下面公式(5)计算各个标尺 图案202的线段之和K’。In addition, in other embodiments according to the present disclosure, the sum K'of the line segments of each scale pattern 202 can be calculated by the following formula (5).
K’=D·sqrt[(x2-x1) 2+(y2-y1) 2] K'=D·sqrt[(x2-x1) 2 +(y2-y1) 2 ]
+D·sqrt[(x3-x4) 2+(y3-y4) 2] +D·sqrt[(x3-x4) 2 +(y3-y4) 2 ]
+D·sqrt[(x5-x6) 2+(y5-y6) 2]     (5) +D·sqrt[(x5-x6) 2 +(y5-y6) 2 ] (5)
其中,(x1,y1)和(x2,y2)为图2上部第一个样品槽202的标尺图案的线段两端在数字图像中的坐标,(x3,y3)和(x4,y4)为图2中部第二个样品槽202的标尺图案的线段两端在数字图像中的坐标,(x5,y5)和(x6,y6)为图2下部第三个样品槽202的标尺图案的线段两端在数字图像中的坐标。Among them, (x1, y1) and (x2, y2) are the coordinates of the two ends of the ruler pattern of the first sample slot 202 in the upper part of FIG. 2 in the digital image, and (x3, y3) and (x4, y4) are the graphs 2 The coordinates of the two ends of the ruler pattern of the second sample slot 202 in the middle in the digital image, (x5, y5) and (x6, y6) are the two ends of the ruler pattern of the third sample slot 202 in the lower part of Fig. 2 The coordinates in the digital image.
然后,可以通过公式(6)计算显微装置的实际放大倍率M。Then, the actual magnification M of the microscopic device can be calculated by formula (6).
M=K’/(3L)     (6)M=K’/(3L) (6)
采用这种方式,可以减小计算误差,进一步提高放大倍率的准确性。In this way, the calculation error can be reduced, and the accuracy of the magnification can be further improved.
上面简要介绍了如何根据样品板上的标尺图案计算显微装置100的实际放大倍率。应当理解,本公开不限于上述方式。在本公开的教导和启示下,本领域技术人员还可以采用其它方式来根据标尺图案计算显微装置100的实际放大倍率。The above briefly introduces how to calculate the actual magnification of the microscopic device 100 based on the ruler pattern on the sample plate. It should be understood that the present disclosure is not limited to the above-mentioned manner. Under the teaching and enlightenment of the present disclosure, those skilled in the art can also use other methods to calculate the actual magnification of the microscopic device 100 based on the scale pattern.
图3示出了根据本公开的一些实施例的样品板的示意图。如图3所示,样品板300包括多个样品槽301,在样品槽301中可以容纳需要观察和拍摄的样品。此外,样品板300还具有标尺图案302。Figure 3 shows a schematic diagram of a sample plate according to some embodiments of the present disclosure. As shown in FIG. 3, the sample plate 300 includes a plurality of sample grooves 301, and samples to be observed and photographed can be accommodated in the sample grooves 301. In addition, the sample plate 300 also has a scale pattern 302.
在图3所示的示例性实施例中,标尺图案302位于样品槽底部。标尺图案302为等间距的刻度线(第一刻度线),各个刻度线沿着水平方向(第一方向)延伸,各个刻度线在垂直方向(第二方向)的间距为D。在根据本公开的一些示例性实施例中,间距D可以为例如1μm-10μm。利用标尺图案302,可以准确地计算显微装置的放大倍率。In the exemplary embodiment shown in FIG. 3, the scale pattern 302 is located at the bottom of the sample tank. The scale pattern 302 is equal-spaced scale lines (first scale lines), each scale line extends along the horizontal direction (first direction), and the distance between each scale line in the vertical direction (second direction) is D. In some exemplary embodiments according to the present disclosure, the pitch D may be, for example, 1 μm-10 μm. Using the ruler pattern 302, the magnification of the microscopic device can be accurately calculated.
例如,处理器103可以根据图像传感器101生成的数字图像,获得标尺图案302中一条刻度线上的一个点的坐标(x1’,y1’),以及获得通过点(x1’,y1’)沿着与该刻度线垂直的方向与相邻刻度线的交点的坐标(x2’,y2’)。For example, the processor 103 may obtain the coordinates (x1', y1') of a point on a scale line in the scale pattern 302 according to the digital image generated by the image sensor 101, and obtain the passing point (x1', y1') along The coordinates (x2', y2') of the intersection point between the direction perpendicular to the scale line and the adjacent scale line.
利用与上面描述的方法类似的方法,可以计算得到显微装置100的实际放大倍数。Using a method similar to the method described above, the actual magnification of the microscopic device 100 can be calculated.
在图3所示的示例中,在每个样品槽上具有多个刻度线302。在显微装置100的放大倍数较大的情况下,即使视野中仅包含单个样品槽的一部分,也能够准确地得到实际放大倍数。In the example shown in FIG. 3, there are a plurality of scale lines 302 on each sample tank. When the magnification of the microscopic device 100 is large, even if only a part of a single sample tank is included in the field of view, the actual magnification can be accurately obtained.
图4示出了根据本公开的一些实施例的样品板400的示意图。如图4所示,在样品板400中,标尺图案402设置在样品槽401的外部。采用这种方式,可以避免标尺图案402对样品槽401中的样品的干扰,可以更清楚的观察和分析样品。为了得到标尺图案402的清晰的图像,标尺图案402可以与样品槽底部位于同一平面上。FIG. 4 shows a schematic diagram of a sample plate 400 according to some embodiments of the present disclosure. As shown in FIG. 4, in the sample plate 400, the scale pattern 402 is provided on the outside of the sample tank 401. In this way, the interference of the ruler pattern 402 on the sample in the sample tank 401 can be avoided, and the sample can be observed and analyzed more clearly. In order to obtain a clear image of the scale pattern 402, the scale pattern 402 may be located on the same plane as the bottom of the sample tank.
图5示出了根据本公开的一些实施例的样品板500的示意图。如图5所示,样品板500包括多个样品槽501。在每个样品槽501的底部设置有十字形的标尺图案502。该标尺图案502包含两条彼此垂直的线段,两条线段的长度可以相同或者不同。例如,一条线段(即第一刻度线)沿水平方向延伸,另一条线段(即第二刻度线)沿垂直方向延伸。FIG. 5 shows a schematic diagram of a sample plate 500 according to some embodiments of the present disclosure. As shown in FIG. 5, the sample plate 500 includes a plurality of sample slots 501. A cross-shaped ruler pattern 502 is provided at the bottom of each sample slot 501. The scale pattern 502 includes two line segments perpendicular to each other, and the length of the two line segments can be the same or different. For example, one line segment (ie, the first scale line) extends in the horizontal direction, and the other line segment (ie, the second scale line) extends in the vertical direction.
利用图5的样品板500上的标尺图案502,也可以从图像传感器101拍摄的数字图像中计算显微装置的放大倍率。例如,可以根据上述公式(1)-(2)以及标尺图案502中的两个线段中任一个线段的长度计算显微装置的放大倍率。或者,可以根据两个线段中每一个线段分别计算放大倍率,然后取两个放大倍率的平均值作为显微装置的放大倍率。Using the scale pattern 502 on the sample plate 500 of FIG. 5, the magnification of the microscopic device can also be calculated from the digital image taken by the image sensor 101. For example, the magnification of the microscopic device can be calculated according to the above formulas (1)-(2) and the length of any one of the two line segments in the scale pattern 502. Alternatively, the magnification can be calculated separately based on each of the two line segments, and then the average of the two magnifications can be taken as the magnification of the microscopy device.
此外,图5的样品板500上的标尺图案502还可以用来识别和校正显微装置100的畸变。例如,在显微装置100的光学成像设备104不存在畸变的情况下,标尺图案502的图像也应当是两条彼此垂直的线段,如图6A所示。但是,如果显微装置100的光学成像设备104存在畸变,则标尺图案502的图像中,两条线段将不再垂直,如图6B所示。基于两条线段的图像,处理器103可以识别出显微装置100的光学成像设备存在畸变。进一步地,处理器103还可以基于标尺图案502的尺寸等已知参数对图像传感器101生成的数字图像进行校正,从而改善图像质量。In addition, the scale pattern 502 on the sample plate 500 of FIG. 5 can also be used to identify and correct the distortion of the microscopic device 100. For example, when there is no distortion in the optical imaging device 104 of the microscopic apparatus 100, the image of the scale pattern 502 should also be two line segments perpendicular to each other, as shown in FIG. 6A. However, if there is distortion in the optical imaging device 104 of the microscopic apparatus 100, the two line segments in the image of the scale pattern 502 will no longer be perpendicular, as shown in FIG. 6B. Based on the images of the two line segments, the processor 103 can recognize that the optical imaging device of the microscopic apparatus 100 is distorted. Further, the processor 103 may also correct the digital image generated by the image sensor 101 based on known parameters such as the size of the scale pattern 502, so as to improve the image quality.
上面描述了根据本公开的样品板以及如何根据样品板上的标尺图案得到显微装置的放大倍率。应当理解,本申请不限于上述实施例。The above describes the sample plate according to the present disclosure and how to obtain the magnification of the microscope device according to the scale pattern on the sample plate. It should be understood that this application is not limited to the above-mentioned embodiments.
例如,图7示出了根据本公开的一些实施例的样品板700的示意图。如图7所示,样品板700包括多个沿水平方向延伸的样品槽701,每个样品槽701的底部设置有标尺图案702。标尺图案702包含多个刻度线,每个刻度线沿水平方向(第一方向)延伸,并且多个刻度线沿虚线703的方向(第二方向)排列。虚线703的方向不是与水 平方向垂直的垂直方向。采用这种方式,可以使标尺图案702覆盖样品槽701的大部分区域。当显微装置100的放大倍率较大,视野只能覆盖样品槽701的一部分时,这种形式的标尺图案702可以确保在视野中出现至少一个完整的刻度线。这样,无论观察样品槽701的哪个位置处的样品,都能够准确地计算显微装置的放大倍率。For example, FIG. 7 shows a schematic diagram of a sample plate 700 according to some embodiments of the present disclosure. As shown in FIG. 7, the sample plate 700 includes a plurality of sample grooves 701 extending in a horizontal direction, and the bottom of each sample groove 701 is provided with a scale pattern 702. The scale pattern 702 includes a plurality of scale lines, each scale line extends in the horizontal direction (first direction), and the plurality of scale lines are arranged in the direction of the broken line 703 (second direction). The direction of the broken line 703 is not a vertical direction perpendicular to the horizontal direction. In this way, the scale pattern 702 can cover most of the sample groove 701 area. When the magnification of the microscopic device 100 is large and the field of view can only cover a part of the sample tank 701, this form of the ruler pattern 702 can ensure that at least one complete graduation line appears in the field of view. In this way, no matter which position of the sample tank 701 is observed, the magnification of the microscopic device can be accurately calculated.
此外,在根据本公开的一些实施例中,还可以根据样品板上的标尺图案确定样品板和样品槽的朝向。例如,图3所示的样品板300包含沿垂直方向排列的多个样品槽301,并且每个样品槽301沿水平方向延伸。In addition, in some embodiments according to the present disclosure, the orientation of the sample plate and the sample slot can also be determined according to the scale pattern on the sample plate. For example, the sample plate 300 shown in FIG. 3 includes a plurality of sample grooves 301 arranged in a vertical direction, and each sample groove 301 extends in a horizontal direction.
当通过显微装置100观察和拍摄样品槽301中的样品时,由于视野等原因,往往没有办法同时观察和拍摄到全部样品槽301中的样品。因此,需要使样品台105平移,使得样品板在视野中平移,从而观察和拍摄样品板300上不同的样品槽301或者同一个样品槽301的不同部分。When observing and photographing the samples in the sample tank 301 through the microscopic device 100, due to the visual field and other reasons, it is often impossible to observe and photograph all the samples in the sample tank 301 at the same time. Therefore, it is necessary to translate the sample stage 105 so that the sample plate is translated in the field of view, so as to observe and photograph different sample grooves 301 on the sample plate 300 or different parts of the same sample groove 301.
如图3所示,标尺图案302中每个刻度线沿水平方向延伸,即刻度线的延伸方向与样品槽的延伸方向相同,并且多个刻度线的排列方向与多个样品槽的排列方向一致。因此,虽然显微设备的视野或拍摄的图片中仅显示样品槽的一部分,处理器103或者操作人员可以根据刻度线的延伸方向和排列方向确定样品槽的延伸方向和排列方向,并且根据确定的样品槽的延伸方向和排列方向移动样品台105上的样品板300,实现对不同样品槽301或同一样品槽301的不同区域的观察和拍摄。As shown in FIG. 3, each scale line in the scale pattern 302 extends in the horizontal direction, that is, the extension direction of the scale line is the same as the extension direction of the sample tank, and the arrangement direction of the multiple scale lines is consistent with the arrangement direction of the multiple sample tanks. . Therefore, although only a part of the sample tank is displayed in the field of view of the microscopic equipment or the photographed picture, the processor 103 or the operator can determine the extension direction and the arrangement direction of the sample tank according to the extension direction and the arrangement direction of the scale line, and according to the determined The extension direction and arrangement direction of the sample slots move the sample plate 300 on the sample stage 105 to realize the observation and shooting of different sample slots 301 or different areas of the same sample slot 301.
图8示出了根据本公开的另一些实施例的样品板800的示意图。如图8所示,样品板800包括多个沿水平方向延伸的样品槽801,并且多个样品槽801沿垂直方向排列。在每个样品槽801的底部设置有标尺图案802。标尺图案802包含用于确定样品槽801的排列方向和延伸方向的第一标识。该第一标识由两个彼此垂直的箭头803和804的构成,其中箭头803沿垂直方向延伸,箭头804沿水平方向延伸。此外,在该示例中,通过较长的箭头表示样品槽的排列方向,较短的箭头表示样品槽的延伸方向。如图8所示,箭头803的长度大于箭头804的长度,因此,根据箭头803的延伸方向可以确定多个样品槽801沿垂直方向排列,根据箭头804的延伸方向可以确定样品槽802沿水平方向延伸。FIG. 8 shows a schematic diagram of a sample plate 800 according to other embodiments of the present disclosure. As shown in FIG. 8, the sample plate 800 includes a plurality of sample grooves 801 extending in a horizontal direction, and the plurality of sample grooves 801 are arranged in a vertical direction. A scale pattern 802 is provided at the bottom of each sample tank 801. The scale pattern 802 includes a first identifier for determining the arrangement direction and the extension direction of the sample grooves 801. The first logo is composed of two arrows 803 and 804 perpendicular to each other, wherein the arrow 803 extends in the vertical direction, and the arrow 804 extends in the horizontal direction. In addition, in this example, the longer arrow indicates the arrangement direction of the sample tanks, and the shorter arrow indicates the extension direction of the sample tanks. As shown in Figure 8, the length of the arrow 803 is greater than the length of the arrow 804. Therefore, according to the extending direction of the arrow 803, it can be determined that the plurality of sample grooves 801 are arranged in the vertical direction, and according to the extending direction of the arrow 804, the sample grooves 802 can be determined to be in the horizontal direction. extend.
图9示出了根据本公开的一些实施例的样品板900的示意图。如图9所示,样品板900包括多个沿水平方向排列的样品槽901,并且每个样品槽901也是沿水平方向延伸。每个样品槽901的底部设置有标尺图案902。标尺图案902包含用于确定样品槽901的排列方向和延伸方向的第一标识。该第一标识由箭头903和904构成,其中, 较长的箭头903表示样品槽901的排列方向,较短的箭头904表示样品槽901的延伸方向。这样,通过箭头903和904的延伸方向,可以确定多个样品槽901沿水平方向排列,并且每个样品槽901也是沿水平方向延伸。FIG. 9 shows a schematic diagram of a sample plate 900 according to some embodiments of the present disclosure. As shown in FIG. 9, the sample plate 900 includes a plurality of sample slots 901 arranged in a horizontal direction, and each sample slot 901 also extends in the horizontal direction. A scale pattern 902 is provided at the bottom of each sample tank 901. The scale pattern 902 includes a first mark for determining the arrangement direction and extension direction of the sample grooves 901. The first mark is composed of arrows 903 and 904, wherein the longer arrow 903 indicates the arrangement direction of the sample tank 901, and the shorter arrow 904 indicates the extension direction of the sample tank 901. In this way, through the extending directions of the arrows 903 and 904, it can be determined that the plurality of sample grooves 901 are arranged in the horizontal direction, and each sample groove 901 also extends in the horizontal direction.
图10示出了根据本公开的一些实施例的样品板1000的示意图。如图10所示,样品板1000包含多个沿垂直方向排列的样品槽1001,并且每个样品槽1001沿水平方向延伸。在样品槽1001的底部设置有标尺图案1002。标尺图案1002包含用于识别样品板的第二标识1004以及用于识别样品槽的第三标识1003。第二标识1004和第三标识1003由多条刻度线构成,这些刻度线沿水平方向排列,并且每条刻度线沿垂直方向延伸。最左侧的刻度线1005和最右侧的刻度线1006表示第二标识1004和第三标识1003的起始和结尾。第二标识1004和第三标识1003在刻度线1005和刻度线1006之间。根据第二标识1004和第三标识1003可以分别确定样品板的编号和样品槽的编号。FIG. 10 shows a schematic diagram of a sample plate 1000 according to some embodiments of the present disclosure. As shown in FIG. 10, the sample plate 1000 includes a plurality of sample slots 1001 arranged in a vertical direction, and each sample slot 1001 extends in a horizontal direction. A scale pattern 1002 is provided at the bottom of the sample tank 1001. The ruler pattern 1002 includes a second mark 1004 for identifying the sample plate and a third mark 1003 for identifying the sample slot. The second mark 1004 and the third mark 1003 are composed of a plurality of scale lines, which are arranged in a horizontal direction, and each scale line extends in a vertical direction. The leftmost scale line 1005 and the rightmost scale line 1006 indicate the beginning and end of the second mark 1004 and the third mark 1003. The second mark 1004 and the third mark 1003 are between the scale line 1005 and the scale line 1006. According to the second identification 1004 and the third identification 1003, the number of the sample plate and the number of the sample slot can be determined respectively.
如图10所示,在下部的样品槽1001中,第三标识1003包含两条刻度线,则该第三标识1003所在的样品槽的编号可以被确定为11。在上部的样品槽1001中,第三标识1003包含1条刻度线,并且根据刻度线之间的间距可以得到,在该刻度线前面缺少了一条刻度线,因此,该第三标识1003所在的样品槽的编号可以被确定为01。同理,对于中间的样品槽1001中的第三标识1003,可以确定该样品槽的编号为10。As shown in FIG. 10, in the lower sample slot 1001, the third mark 1003 contains two scale lines, and the number of the sample slot in which the third mark 1003 is located can be determined as 11. In the upper sample slot 1001, the third mark 1003 contains one scale line, and it can be obtained according to the distance between the scale lines. A scale line is missing in front of the scale line. Therefore, the sample where the third mark 1003 is located The slot number can be determined as 01. In the same way, for the third identification 1003 in the sample slot 1001 in the middle, it can be determined that the number of the sample slot is 10.
类似的,第二标识1004中,根据刻度线之间的间距,确定缺少的刻度线表示0,则可以确定样品板1000的编号为1101。Similarly, in the second mark 1004, according to the distance between the scale lines, it is determined that the missing scale lines represent 0, and the number of the sample plate 1000 can be determined to be 1101.
此外,在根据本公开的一些实施例中,还可以采用其它方式来表示编号中的0和1。例如,如图11所示的一组刻度线中,可以通过不同长度的刻度线来分别表示0和1。其中,较长的刻度线表示1,较短的刻度线表示0。图11中的一组刻度线可以比识别成1011011。In addition, in some embodiments according to the present disclosure, other ways may also be used to represent 0 and 1 in the number. For example, in a set of scale lines as shown in FIG. 11, scale lines of different lengths can be used to represent 0 and 1 respectively. Among them, the longer scale line represents 1, and the shorter scale line represents 0. A set of tick marks in Figure 11 can be identified as 1011011.
应当理解,在本公开的教导和启示下,本领域技术人员还可以采用其它方式将第一标识、第二标识、第三标识和刻度线结合起来,作为标尺图案。It should be understood that under the teaching and enlightenment of the present disclosure, those skilled in the art may also use other ways to combine the first mark, the second mark, the third mark and the scale line as a ruler pattern.
图12示出了根据本公开的一些实施例的显微装置100的操作的流程图。FIG. 12 shows a flowchart of the operation of the microscopic device 100 according to some embodiments of the present disclosure.
如图12所示,首先,将样品板放置到样品台105上(步骤1201)。在样品板的样品槽中具有待观察和拍摄的样品。As shown in FIG. 12, first, the sample plate is placed on the sample stage 105 (step 1201). There are samples to be observed and photographed in the sample slot of the sample plate.
然后,通过图像传感器101生成样品的数字图像(步骤1202)。通过显微装置100的光学成像设备104形成的光学图像被图像传感器101接收,并且生成数字图像。数字图像可以被存储在存储器102中。Then, a digital image of the sample is generated by the image sensor 101 (step 1202). The optical image formed by the optical imaging device 104 of the microscopic apparatus 100 is received by the image sensor 101, and a digital image is generated. The digital image can be stored in the memory 102.
接下来,处理器103可以从存储器102读取数字图像并进行各种处理(步骤1203)。例如,如上所述,可以根据数字图像中的标尺图案计算显微装置100的放大倍率,可以确定样品槽的延伸方向和排列方向,可以识别样品板(的编号),或者可以识别样品槽(的编号),等等。Next, the processor 103 can read the digital image from the memory 102 and perform various processing (step 1203). For example, as described above, the magnification of the microscopy device 100 can be calculated based on the scale pattern in the digital image, the extension direction and arrangement direction of the sample slot can be determined, the sample plate (number) can be identified, or the sample slot can be identified (of Number), etc.
此外,根据本公开的实施例还可以包括以下技术方案:In addition, the embodiments according to the present disclosure may also include the following technical solutions:
1.一种样品板,包括:1. A sample plate, including:
用于容纳样品的样品槽;以及A sample tank for holding samples; and
用于确定放大倍率的标尺图案。The ruler pattern used to determine the magnification.
2.根据1所述的样品板,其中,所述标尺图案位于所述样品槽底部。2. The sample plate according to 1, wherein the scale pattern is located at the bottom of the sample tank.
3.根据2所述的样品板,其中,所述样品板包括多个样品槽,在每个样品槽底部都设置有所述标尺图案。3. The sample plate according to 2, wherein the sample plate includes a plurality of sample slots, and the scale pattern is provided at the bottom of each sample slot.
4.根据1所述的样品板,其中,所述标尺图案位于所述样品槽附近。4. The sample plate according to 1, wherein the scale pattern is located near the sample slot.
5.根据1-4中任一项所述的样品板,其中,所述标尺图案包含沿第一方向延伸的第一刻度线。5. The sample plate according to any one of 1-4, wherein the scale pattern includes a first scale line extending in a first direction.
6、根据5所述的样品板,其中,所述标尺图案包括多个第一刻度线,并且所述多个第一刻度线沿与第一方向不同的第二方向排列。6. The sample plate according to 5, wherein the scale pattern includes a plurality of first scale lines, and the plurality of first scale lines are arranged in a second direction different from the first direction.
7.根据6所述的样品板,其中,所述第一方向与所述第二方向垂直。7. The sample plate according to 6, wherein the first direction is perpendicular to the second direction.
8.根据6或7所述的样品板,其中,所述样品槽沿所述第一方向或所述第二方向延伸。8. The sample plate according to 6 or 7, wherein the sample groove extends in the first direction or the second direction.
9.根据6-8中任一项所述的样品板,其中,所述标尺图案还包含沿第二方向延伸的第二刻度线。9. The sample plate according to any one of 6-8, wherein the scale pattern further includes a second scale line extending in a second direction.
10.根据1-9中任一项所述的样品板,其中,所述标尺图案还包含用于确定所述样品槽的延伸方向和排列方向的第一标识。10. The sample plate according to any one of 1-9, wherein the scale pattern further includes a first identifier for determining the extension direction and the arrangement direction of the sample groove.
11.根据10所述的样品板,其中,所述第一标识包含彼此垂直的第一箭头和第二箭头。11. The sample plate according to 10, wherein the first mark includes a first arrow and a second arrow perpendicular to each other.
12.根据1-11中任一项所述的样品板,其中,所述标尺图案还包含用于识别所述样品板的第二标识。12. The sample plate according to any one of 1-11, wherein the scale pattern further includes a second mark for identifying the sample plate.
13.根据12所述的样品板,其中,所述标尺图案还包含用于识别所述样品槽的第三标识。13. The sample plate according to 12, wherein the scale pattern further includes a third mark for identifying the sample slot.
在说明书及权利要求中的词语“前”、“后”、“顶”、“底”、“之上”、“之下”等,如果存在的话,用于描述性的目的而并不一定用于描述不变的相对位置。应当理解,这样使用的词语在适当的情况下是可互换的,使得在此所描述的本公开的实施例,例如,能够在与在此所示出的或另外描述的那些取向不同的其他取向上操作。In the specification and claims, the words "front", "rear", "top", "bottom", "above", "below", etc., if they exist, are used for descriptive purposes and are not necessarily used To describe the same relative position. It should be understood that the words used in this way are interchangeable under appropriate circumstances, so that the embodiments of the present disclosure described herein, for example, can be used in other orientations different from those shown or otherwise described herein. Operation in orientation.
如在此所使用的,词语“示例性的”意指“用作示例、实例或说明”,而不是作为将被精确复制的“模型”。在此示例性描述的任意实现方式并不一定要被解释为比其它实现方式优选的或有利的。而且,本公开不受在上述技术领域、背景技术、发明内容或具体实施方式中所给出的任何所表述的或所暗示的理论所限定。As used herein, the word "exemplary" means "serving as an example, instance, or illustration" and not as a "model" to be copied exactly. Any implementation described exemplarily herein is not necessarily construed as being preferred or advantageous over other implementations. Moreover, the present disclosure is not limited by any expressed or implied theory given in the above technical field, background art, summary of the invention, or specific embodiments.
如在此所使用的,词语“基本上”意指包含由设计或制造的缺陷、器件或元件的容差、环境影响和/或其它因素所致的任意微小的变化。词语“基本上”还允许由寄生效应、噪音以及可能存在于实际的实现方式中的其它实际考虑因素所致的与完美的或理想的情形之间的差异。As used herein, the word "substantially" means to include any minor changes caused by design or manufacturing defects, device or component tolerances, environmental influences, and/or other factors. The word "substantially" also allows for differences between the perfect or ideal situation due to parasitic effects, noise, and other practical considerations that may be present in the actual implementation.
上述描述可以指示被“连接”或“耦合”在一起的元件或节点或特征。如在此所使用的,除非另外明确说明,“连接”意指一个元件/节点/特征与另一种元件/节点/特征在电学上、机械上、逻辑上或以其它方式直接地连接(或者直接通信)。类似地,除非另外明确说明,“耦合”意指一个元件/节点/特征可以与另一元件/节点/特征以直接的或间接的方式在机械上、电学上、逻辑上或以其它方式连结以允许相互作用,即使这两个特征可能并没有直接连接也是如此。也就是说,“耦合”意图包含元件或其它特征的直接连结和间接连结,包括利用一个或多个中间元件的连接。The foregoing description may indicate elements or nodes or features that are "connected" or "coupled" together. As used herein, unless expressly stated otherwise, "connected" means that one element/node/feature is electrically, mechanically, logically, or otherwise directly connected (or Direct communication). Similarly, unless expressly stated otherwise, "coupled" means that one element/node/feature can be directly or indirectly connected to another element/node/feature mechanically, electrically, logically, or in other ways. Interaction is allowed, even if the two features may not be directly connected. In other words, "coupled" is intended to include direct connection and indirect connection of elements or other features, including the connection of one or more intermediate elements.
另外,仅仅为了参考的目的,还可以在下面描述中使用某种术语,并且因而并非意图限定。例如,除非上下文明确指出,否则涉及结构或元件的词语“第一”、“第二”和其它此类数字词语并没有暗示顺序或次序。In addition, for reference purposes only, certain terminology may also be used in the following description, and thus is not intended to be limiting. For example, unless the context clearly dictates it, the words "first", "second" and other such numerical words referring to structures or elements do not imply an order or order.
还应理解,“包括/包含”一词在本文中使用时,说明存在所指出的特征、整体、步骤、操作、单元和/或组件,但是并不排除存在或增加一个或多个其它特征、整体、步骤、操作、单元和/或组件以及/或者它们的组合。It should also be understood that when the term "including/comprising" is used in this text, it indicates that the specified features, wholes, steps, operations, units and/or components are present, but it does not exclude the presence or addition of one or more other features, Whole, steps, operations, units and/or components and/or combinations thereof.
在本公开中,术语“提供”从广义上用于涵盖获得对象的所有方式,因此“提供某对象”包括但不限于“购买”、“制备/制造”、“布置/设置”、“安装/装配”、和/或“订购”对象等。In the present disclosure, the term "provide" is used in a broad sense to cover all the ways to obtain an object, so "provide an object" includes but is not limited to "purchase", "preparation/manufacturing", "arrangement/setting", "installation/ "Assemble", and/or "Order" objects, etc.
本领域技术人员应当意识到,在上述操作之间的边界仅仅是说明性的。多个操作可以结合成单个操作,单个操作可以分布于附加的操作中,并且操作可以在时间上至 少部分重叠地执行。而且,另选的实施例可以包括特定操作的多个实例,并且在其他各种实施例中可以改变操作顺序。但是,其它的修改、变化和替换同样是可能的。因此,本说明书和附图应当被看作是说明性的,而非限制性的。Those skilled in the art should realize that the boundaries between the above operations are merely illustrative. Multiple operations can be combined into a single operation, a single operation can be distributed in additional operations, and the operations can be executed at least partially overlapping in time. Also, alternative embodiments may include multiple instances of specific operations, and the order of operations may be changed in other various embodiments. However, other modifications, changes and replacements are also possible. Therefore, this specification and drawings should be regarded as illustrative rather than restrictive.
虽然已经通过示例对本公开的一些特定实施例进行了详细说明,但是本领域的技术人员应该理解,以上示例仅是为了进行说明,而不是为了限制本公开的范围。在此公开的各实施例可以任意组合,而不脱离本公开的精神和范围。本领域的技术人员还应理解,可以对实施例进行多种修改而不脱离本公开的范围和精神。本公开的范围由所附权利要求来限定。Although some specific embodiments of the present disclosure have been described in detail through examples, those skilled in the art should understand that the above examples are only for illustration and not for limiting the scope of the present disclosure. The various embodiments disclosed herein can be combined arbitrarily without departing from the spirit and scope of the present disclosure. Those skilled in the art should also understand that various modifications can be made to the embodiments without departing from the scope and spirit of the present disclosure. The scope of the present disclosure is defined by the appended claims.

Claims (13)

  1. 一种样品板,包括:A sample plate including:
    用于容纳样品的样品槽;以及A sample tank for holding samples; and
    用于确定放大倍率的标尺图案。The ruler pattern used to determine the magnification.
  2. 根据权利要求1所述的样品板,其中,所述标尺图案位于所述样品槽底部。The sample plate according to claim 1, wherein the scale pattern is located at the bottom of the sample tank.
  3. 根据权利要求2所述的样品板,其中,所述样品板包括多个样品槽,在每个样品槽底部都设置有所述标尺图案。The sample plate according to claim 2, wherein the sample plate comprises a plurality of sample grooves, and the scale pattern is provided at the bottom of each sample groove.
  4. 根据权利要求1所述的样品板,其中,所述标尺图案位于所述样品槽附近。The sample plate according to claim 1, wherein the scale pattern is located near the sample groove.
  5. 根据权利要求1-4中任一项所述的样品板,其中,所述标尺图案包含沿第一方向延伸的第一刻度线。The sample plate according to any one of claims 1 to 4, wherein the scale pattern includes a first scale line extending in a first direction.
  6. 根据权利要求5所述的样品板,其中,所述标尺图案包括多个第一刻度线,并且所述多个第一刻度线沿与第一方向不同的第二方向排列。The sample plate of claim 5, wherein the scale pattern includes a plurality of first scale lines, and the plurality of first scale lines are arranged in a second direction different from the first direction.
  7. 根据权利要求6所述的样品板,其中,所述第一方向与所述第二方向垂直。The sample plate according to claim 6, wherein the first direction is perpendicular to the second direction.
  8. 根据权利要求6或7所述的样品板,其中,所述样品槽沿所述第一方向或所述第二方向延伸。The sample plate according to claim 6 or 7, wherein the sample groove extends in the first direction or the second direction.
  9. 根据权利要求6-8中任一项所述的样品板,其中,所述标尺图案还包含沿第二方向延伸的第二刻度线。8. The sample plate according to any one of claims 6-8, wherein the scale pattern further comprises a second scale line extending in a second direction.
  10. 根据权利要求1-9中任一项所述的样品板,其中,所述标尺图案还包含用于确定所述样品槽的延伸方向和排列方向的第一标识。9. The sample plate according to any one of claims 1-9, wherein the scale pattern further comprises a first mark for determining the extension direction and the arrangement direction of the sample groove.
  11. 根据权利要求10所述的样品板,其中,所述第一标识包含彼此垂直的第一 箭头和第二箭头。The sample plate according to claim 10, wherein the first mark includes a first arrow and a second arrow perpendicular to each other.
  12. 根据权利要求1-11中任一项所述的样品板,其中,所述标尺图案还包含用于识别所述样品板的第二标识。The sample plate according to any one of claims 1-11, wherein the scale pattern further comprises a second mark for identifying the sample plate.
  13. 根据权利要求12所述的样品板,其中,所述标尺图案还包含用于识别所述样品槽的第三标识。The sample plate according to claim 12, wherein the scale pattern further includes a third mark for identifying the sample slot.
PCT/CN2020/134455 2019-12-11 2020-12-08 Sample plate WO2021115247A1 (en)

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