WO2021082180A1

WO2021082180A1 - Dt-star material laser cutting lens etchant and use method therefor

Info

Publication number: WO2021082180A1
Application number: PCT/CN2019/123277
Authority: WO
Inventors: 郑资来; 陈光进
Original assignee: 惠州市清洋实业有限公司
Priority date: 2019-10-30
Filing date: 2019-12-05
Publication date: 2021-05-06
Also published as: CN112745034A

Abstract

A DT-STAR material laser cutting lens etchant and a use method therefor. In terms of parts by weight, the etchant comprises 30-35 parts of a sulfuric acid solution, 10-12 parts of a hydrofluoric acid solution, and 55-60 parts of water. A chemically-strengthened glass product prepared and produced using the etchant is stable in terms of quality, has no large area of pitting and scratches on the surface and a 0% defective rate, is simple to prepare, and obviates the need for a polishing treatment.

Description

DT-STAR material laser cutting lens etching solution and its use method

Technical field

The invention belongs to the technical field of glass etching, and particularly relates to a DT-STAR material laser cutting lens etching solution and a use method thereof.

Background technique

After laser cutting and edging of the lens glass for mobile phones, there will be many micro-cracks on the edge of the lens glass, resulting in a very low bending strength of the glass, generally less than 200MP. In order to enhance the strength of the lens glass, hydrofluoric acid is often used to etch the edge surface of the glass, remove microcracks, and improve the strength and impact resistance of the glass; at the same time, it is thinned by etching with hydrofluoric acid etching solution.

At present, the thickness of the DT-STAR glass material is 0.55mm, and the etching reduction is 50um. In the etching solution used in the traditional etching process of laser cutting lenses, sulfuric acid 30%, hydrofluoric acid 10%, hydrochloric acid 20%, or add Active agent 0.01%, water 40%, with the current etching solution, combined with the existing spot etching process, after the etching, the glass surface shows a large area of pitting and irregular scratches, the defect rate is 100%, in order to meet the shipment, 100% polishing is required, which severely restricts production capacity and delivery capacity, and product quality stability cannot be ensured. As a result, the etching process is relatively complicated, the production cycle is long, and the yield is low, which requires further improvement.

Summary of the invention

In view of the shortcomings of the prior art, the present invention discloses a DT-STAR material laser cutting lens etching solution and a method of use. After the acid solution is etched, the chemically strengthened glass surface is etched without pitting and scratches, and the glass is defective. The rate reaches 0%, and the product quality is stable. The technical content of the present invention is as follows:

The technical point of the DT-STAR material laser cutting lens etching solution of the present invention is that the laser acid solution for chemically strengthened glass is calculated in parts by weight, and its preparation raw materials include: 30-35 parts of sulfuric acid solution, 10-12 Parts of hydrofluoric acid solution and 55-60 parts of water.

In some embodiments of the present invention, the thickness of the chemically strengthened glass is 0.5 to 0.6 mm, the hardness of the chemically strengthened glass is 7-9 in Mohs, and the melting point of the chemically strengthened glass is 2000 -3000°C, the light transmittance of the chemically strengthened glass is 90-100%, and the density of the chemically strengthened glass is 20-30 g/cm ³ .

In some embodiments of the present invention, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75-98.3 wt%.

In some embodiments of the present invention, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10-40 wt%, and the content of chlorides contained in the hydrofluoric acid solution is 0 to 40% by weight. 0.001wt%, the content of sulfate contained in the hydrofluoric acid solution is 0-0.002wt%.

In some embodiments of the present invention, the weight ratio of the sulfuric acid solution and the hydrofluoric acid solution is 2.5-3:1.

The present invention also provides a laser etching method using the above-mentioned laser acid for etching chemically strengthened glass. The technical point is that the laser etching method includes the following steps:

S1 respectively take pretreated chemically strengthened glass, coat photoresist on its outer surface, and pattern the photoresist;

S2 takes the chemically strengthened glass processed in step S1, and places it in the acid solution for wet etching treatment;

S3 takes the chemically strengthened glass cleaning treatment processed in step S2.

In some embodiments of the present invention, the method for pretreatment of the chemically strengthened glass in step S1 is: take the chemically strengthened glass and sequentially perform the first pre-cleaning, the first polishing, the second pre-cleaning, The second polishing, the third pre-cleaning, the fourth pre-cleaning and washing.

In some embodiments of the present invention, the etching thinning of the chemically strengthened glass after cleaning in the step S3 is 40-60 μm.

Compared with the prior art, the beneficial effects of the present invention are:

The DT-STAR material laser cutting lens etching solution of the present invention is based on parts by weight, including 30 to 35 parts of sulfuric acid solution, 10 to 12 parts of hydrofluoric acid solution and 55 to 60 parts of water, prepared by using the present invention The quality temperature of chemically strengthened glass products, the surface of chemically strengthened glass has no large area pits and scratches, the defect rate is 0%, the preparation is simple, and no polishing treatment is required.

Detailed ways

The technical solutions in the embodiments of the present invention will be described clearly and completely below, so that those skilled in the art can better understand the advantages and features of the present invention, so as to make a clearer definition of the protection scope of the present invention. The described embodiments of the present invention are only a part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other implementations obtained by those of ordinary skill in the art without creative work Examples are all within the protection scope of the present invention.

Example 1

The DT-STAR material laser cutting lens etching solution is calculated in parts by weight, and its preparation raw materials include: 32 parts of sulfuric acid solution, 11 parts of hydrofluoric acid solution and 57 parts of water, as shown in Table 1.

Wherein, the thickness of the chemically strengthened glass is 0.55mm, the hardness of the chemically strengthened glass is 8 Mohs, the melting point of the chemically strengthened glass is 2500°C, and the light transmittance of the chemically strengthened glass is 95% The density of the chemically strengthened glass is 25 g/cm ³ .

Wherein, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 80 wt%.

Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 25wt%, the content of chlorides contained in the hydrofluoric acid solution is 0.0005wt%, and the sulfuric acid contained in the hydrofluoric acid solution The salt content is 0.001% by weight.

Among them, the weight ratio of sulfuric acid solution and hydrofluoric acid solution is 2.9:1.

A method for laser etching using the above-mentioned laser acid for etching chemically strengthened glass includes the following steps:

Among them, the etching thinning of the chemically strengthened glass after cleaning in step S3 is 50 μm.

Example 2

The DT-STAR material laser cutting lens etching solution is calculated in parts by weight, and its preparation materials include: 30 parts of sulfuric acid solution, 10 parts of hydrofluoric acid solution and 60 parts of water, as shown in Table 1.

Wherein, the thickness of the chemically strengthened glass is 0.5mm, the hardness of the chemically strengthened glass is 7 Mohs, the melting point of the chemically strengthened glass is 2000°C, and the light transmittance of the chemically strengthened glass is 90% The density of the chemically strengthened glass is 20 g/cm ³ .

Wherein, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75 wt%.

Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10wt%, the content of chlorides contained in the hydrofluoric acid solution is 0wt%, and the sulfates contained in the hydrofluoric acid solution The content is 0wt%.

Among them, the weight ratio of sulfuric acid solution and hydrofluoric acid solution is 3:1.

Among them, the etching thinning of the chemically strengthened glass after cleaning in step S3 is 40 μm.

Example 3

The DT-STAR material laser cutting lens etching solution is calculated in parts by weight, and its preparation raw materials include: 35 parts of sulfuric acid solution, 12 parts of hydrofluoric acid solution and 55 parts of water, as shown in Table 1.

Wherein, the thickness of the chemically strengthened glass is 0.6mm, the hardness of the chemically strengthened glass is 9 Mohs, the melting point of the chemically strengthened glass is 3000°C, and the light transmittance of the chemically strengthened glass is 100% The density of the chemically strengthened glass is 30 g/cm ³ .

Among them, the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 98.3% by weight.

Wherein, the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 40% by weight, the chloride content contained in the hydrofluoric acid solution is 0.001% by weight, and the sulfuric acid contained in the hydrofluoric acid solution is 0.001% by weight. The salt content is 0.002wt%.

Among them, the etching thinning amount of the chemically strengthened glass after cleaning in step S3 is 60 μm.

Comparative example 1

The acid solution in Comparative Example 1 is calculated in parts by weight, and its formula includes: 32 parts of sulfuric acid, 11 parts of hydrofluoric acid, 23 parts of hydrochloric acid, and 35 parts of water. The other operations are the same as those of Example 1, as shown in Table 1. Show.

Comparative example 2

The acid solution in Comparative Example 1 is calculated in parts by weight, and its formula includes: 33 parts of sulfuric acid, 11 parts of hydrofluoric acid, 17 parts of hydrochloric acid, and 42 parts of water. The other operations are the same as in Example 1, as shown in Table 1. Show.

Comparative example 3

The acid solution in Comparative Example 1 is calculated in parts by weight, and its formula includes: 32 parts of sulfuric acid, 11 parts of hydrofluoric acid, 12 parts of hydrochloric acid, and 48 parts of water. The other operations are the same as in Example 2, as shown in Table 1. Show.

Comparative example 4

The acid solution in Comparative Example 1 is calculated in parts by weight, and its formula includes: 33 parts of sulfuric acid, 11 parts of hydrofluoric acid, 8 parts of hydrochloric acid, and 52 parts of water. The other operations are the same as in Example 3, as shown in Table 1. Show.

Comparative example 5

The acid solution in Comparative Example 1 is calculated in parts by weight, and its formula includes: 32 parts of sulfuric acid, 11 parts of hydrofluoric acid, 5 parts of hydrochloric acid, and 57 parts of water. The other operations are the same as in Example 2, as shown in Table 1. Show.

Table 1

Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the scope of protection of the present invention. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand The technical solution of the present invention can be modified or equivalently replaced without departing from the essence and scope of the technical solution of the present invention.

Claims

The DT-STAR material laser cutting lens etching solution is characterized in that the laser acid solution for chemically strengthened glass is calculated in parts by weight, and its preparation raw materials include: 30 to 35 parts of sulfuric acid solution, 10 to 12 parts of hydrogen fluoride Acid solution and 55-60 parts of water.
The DT-STAR material laser cutting lens etching solution according to claim 1, wherein the thickness of the chemically strengthened glass is 0.5 to 0.6 mm, and the hardness of the chemically strengthened glass is 7 to 9 on the Mohs scale. The melting point of the chemically strengthened glass is 2000-3000°C, the light transmittance of the chemically strengthened glass is 90-100%, and the density of the chemically strengthened glass is 20-30 g/cm 3 .
The DT-STAR material laser cutting lens etching solution according to claim 1, wherein the weight fraction of sulfuric acid molecules contained in the sulfuric acid solution is 75-98.3 wt%.
The DT-STAR material laser cutting lens etching solution according to claim 1, wherein the weight fraction of hydrofluoric acid molecules contained in the hydrofluoric acid solution is 10-40% by weight, and the hydrofluoric acid The content of the chloride contained in the solution is 0-0.001 wt%, and the content of the sulfate contained in the hydrofluoric acid solution is 0-0.002 wt%.
The DT-STAR material laser cutting lens etching solution according to claim 1, wherein the weight ratio of the sulfuric acid solution and the hydrofluoric acid solution is 2.5-3:1.
A method for laser etching using the DT-STAR material laser cutting lens etching solution of claim 1, wherein the laser etching method comprises the following steps:

S1 respectively take pretreated chemically strengthened glass, coat photoresist on its outer surface, and pattern the photoresist;

S2 takes the chemically strengthened glass processed in step S1, and places it in the acid solution for wet etching treatment;

S3 takes the chemically strengthened glass cleaning treatment processed in step S2.
The method of using DT-STAR material laser cutting lens etching solution according to claim 6, characterized in that: the pretreatment method of chemically strengthened glass in step S1 is: take chemically strengthened glass and sequentially pass through the first Pre-cleaning, first polishing, second pre-cleaning, second polishing, third pre-cleaning, fourth pre-cleaning and water washing.
The method of using DT-STAR material laser cutting lens etching solution according to claim 6, characterized in that the chemically strengthened glass after cleaning in the step S3 has an etching thinning amount of 40-60 μm.