WO2021070289A1 - 電子銃 - Google Patents

電子銃 Download PDF

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Publication number
WO2021070289A1
WO2021070289A1 PCT/JP2019/039850 JP2019039850W WO2021070289A1 WO 2021070289 A1 WO2021070289 A1 WO 2021070289A1 JP 2019039850 W JP2019039850 W JP 2019039850W WO 2021070289 A1 WO2021070289 A1 WO 2021070289A1
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WO
WIPO (PCT)
Prior art keywords
electrode
electron gun
cable
region
emitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2019/039850
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English (en)
French (fr)
Japanese (ja)
Inventor
太邦 後藤
元英 石川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
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Nikon Corp
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Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to PCT/JP2019/039850 priority Critical patent/WO2021070289A1/ja
Priority to JP2021551009A priority patent/JP7294438B2/ja
Publication of WO2021070289A1 publication Critical patent/WO2021070289A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/14—Arrangements for focusing or reflecting ray or beam
    • H01J3/18—Electrostatic lenses

Definitions

  • the present invention relates to an electron gun.
  • an extraction electrode that creates an electric field between an electron emitting surface that emits electrons and emits electrons from the electron emitting surface, and a cone having the same potential as the electron emitting surface around the electron emitting surface.
  • a pierce-type electron gun in which a shaped electrode is arranged is used (Patent Document 1).
  • the electron gun according to the first aspect includes an emitter having an electron emitting surface, a first electrode as a drawing electrode, and a second electrode having a second surface facing the first surface of the first electrode.
  • the second surface of the second electrode has a first region and a second region in which distances from the center of the electron emission surface are different from each other, and the curvature in the first region is different from the curvature in the second region. ..
  • the electron gun according to the second aspect is composed of an emitter having an electron emitting surface, a first electrode as a drawing electrode, a second electrode having a second surface facing the first surface of the first electrode, and the emitter.
  • the electrode surface of the shield electrode has a first region and a second region in which distances from the center of the opening are different from each other, and the shield electrode is provided with a shield electrode having an opening into which the electrons of the above are incident.
  • the curvature is different from the curvature of the second region.
  • the electron gun according to the third aspect is composed of an emitter having an electron emitting surface, a first electrode as a drawing electrode, a second electrode having a second surface facing the first surface of the first electrode, and the emitter.
  • a shield electrode having an aperture for incident of electrons, an emitter cable that supplies a predetermined voltage to the emitter, a first electrode cable that supplies a predetermined voltage to the first electrode, and a predetermined voltage to the second electrode.
  • the emitter cable, the second electrode cable, the shield electrode cable, and the first electrode cable are provided with a second electrode cable for supplying the shield electrode and a shield electrode cable for supplying a predetermined voltage to the shield electrode.
  • the distance between the emitter cable, the second electrode cable, and the shield electrode cable is larger than the distance between the two.
  • the cross-sectional view which shows the structure of the electron gun of 1st Embodiment.
  • FIG. 1 is a cross-sectional view showing the electron gun 100 of the first embodiment
  • FIG. 2 is an enlarged cross-sectional view of the electron gun 100 of the first embodiment, which is an enlarged portion of a region BL shown by a broken line in FIG. It is a figure.
  • the direction indicated by the arrows is the + direction.
  • the X, Y, and Z directions are orthogonal to each other.
  • the electron gun 100 has an emitter 30, a first electrode 10, a second electrode 20, a shield electrode 40, and an acceleration electrode 50 arranged inside the housing 60 along an optical axis AX extending in the Z direction, which is the central axis. It has.
  • the accelerating electrode 50 may form a part of the outer wall of the electron gun 100 like the housing 60.
  • the emitter 30, the first electrode 10, the second electrode 20, the shield electrode 40, and the acceleration electrode 50 all have a shape that is rotationally symmetric with respect to the optical axis AX in a portion close to the optical axis AX.
  • Each of the emitter 30, the first electrode 10, the second electrode 20, and the shield electrode 40 is electrically insulated and held in the housing 60.
  • the emitter 30 is a substantially cylindrical electrode whose central axis coincides with the optical axis AX.
  • the end face on the + Z side of the emitter 30 is an electron emitting surface 31 (not shown in FIG. 1, see FIG. 2), and its shape is a concave spherical surface as an example.
  • the center 32 of the electron emitting surface 31 is the geometric center position of the electron emitting surface 31 or the intersection of the electron emitting surface 31 and the optical axis AX.
  • the electron emitting surface 31 may be a flat surface, a convex spherical surface, a concave paraboloid, or a concave hyperboloid.
  • the first electrode 10 is an extraction electrode for forming an electric field with the electron emitting surface 31 to emit electrons from the electron emitting surface 31, and is emitted from the electron emitting surface 31 in the vicinity of the optical axis AX. It has an opening 12 for passing electrons.
  • the first surface 11, which is the end surface of the first electrode 10 on the emitter 30 side ( ⁇ Z side), is, for example, a convex surface that is convex toward the emitter 30 side ( ⁇ Z side).
  • the first surface 11 may be a concave surface that is concave on the emitter 30 side ( ⁇ Z side), or may be a flat surface.
  • a predetermined negative voltage is applied (supplied) to the first electrode 10 from the first voltage source V1 (not shown in FIG. 2, see FIG. 1) via the first electrode cable 15.
  • the second surface 21 (not shown in FIG. 1, see FIG. 2), which is the surface on the + Z side of the second electrode 20, is arranged so as to face the first surface 11 of the first electrode 10.
  • the second electrode 20 is an electrode also called a Wenert electrode, which is an electrode that forms an electric field for converging electrons emitted from the electron emitting surface 31 of the emitter 30 in a pierce type electron gun.
  • the acceleration electrode 50 is an electrode for forming an electric field for accelerating the electrons emitted from the emitter 30, and its potential is usually set to the ground potential (0V, reference voltage). Also in the electron gun 100 of the first embodiment, the acceleration electrode 50 is held in the housing 60, and the potential thereof is set to the ground potential by the ground wiring 65 connected via the housing 60. An opening 52 for passing electrons emitted from the emitter 30 is formed in the vicinity of the optical axis AX of the accelerating electrode 50.
  • a negative voltage of about ⁇ 50 kV to ⁇ 100 kV is applied (supplied) to the emitter 30 from the third voltage source V3 via the emitter cable 35 as an example.
  • the electrons emitted from the electron emitting surface 31 of the emitter 30 which is a negative voltage are accelerated in the + Z direction toward the accelerating electrode 50 which is the ground potential (reference voltage), and pass through the opening 52 of the accelerating electrode 50.
  • the inside of the housing 60 is connected to a low pressure source such as a vacuum pump through the opening 52 of the acceleration electrode 50 or through an exhaust port (not shown) provided in the housing 60, and the pressure is reduced to vacuum.
  • At least a part of the shield electrode 40 is arranged between the first electrode 10 and the acceleration electrode 50.
  • a predetermined negative voltage is applied (supplied) to the shield electrode 40 from the fourth voltage source V4 via the shield electrode cable 45.
  • the voltage applied to the shield electrode 40 is, for example, a voltage that is about 2 to 5 kV higher than the voltage of the emitter 30 (voltage on the positive side of the voltage of the emitter 30). Therefore, a high voltage of about 50 kV or more is applied between the shield electrode 40 and the acceleration electrode 50.
  • An opening 42 for passing electrons emitted from the emitter 30 is formed in the vicinity of the optical axis AX of the shield electrode 40.
  • the shield electrode 40 is an electrode having a width in the Z direction as well, and the opening 42 has a minimum diameter near the end of the shield electrode 40 on the + Z side (acceleration electrode 50 side) as an example. ..
  • at least a part of the first electrode 10 may be arranged between the emitter 30 and the shield electrode 40.
  • the second electrode 20 is arranged so as to surround the emitter 30 along the peripheral surface of the emitter 30 having a substantially cylindrical shape.
  • the second surface 21 which is the surface on the + Z side of the second electrode 20 is, for example, a concave surface whose center of curvature is on the + Z side. Further, the position of the inner peripheral end of the second surface 21 of the second electrode 20 in the Z direction substantially coincides with the position of the spherical surface of the electron emitting surface 31 of the emitter 30 in the Z direction.
  • the second surface 21 of the second electrode 20 is not limited to the above shape and may be a convex surface or a flat surface.
  • a predetermined negative voltage is applied (supplied) to the second electrode 20 from the second voltage source V2 via the second electrode cable 25.
  • a voltage equal to the voltage of the emitter 30 is applied to the second electrode 20.
  • a voltage different from the voltage of the emitter 30 may be applied to the second electrode 20.
  • the first electrode cable 15, the second electrode cable 25, the emitter cable 35, and the shield electrode cable 45 are provided from the outside of the housing 60 via current introduction terminals 61a to 61d provided on the outer wall of the housing 60, respectively. It is installed inside.
  • the negative voltage applied to the electron emitting surface 31 of the emitter 30 and the second surface 21 of the second electrode 20 is approximately the optical axis AX between the emitter 30 and the first electrode 10.
  • An electric field is formed in the space including the region Ee, which is a space along the above. Then, this electric field acts so as to converge a large number of electrons moving in the + Z direction in the region Ee to the vicinity of the optical axis AX.
  • the second surface 21 of the second electrode 20 is a concave surface whose center of curvature is on the + Z side, and the distances from the center 32 of the electron emitting surface 31 are different from each other.
  • the curvature of the surface is different in each region of the region 21a and the second region 21b.
  • the curvature of the second region 21b is set to the first region. It may be set larger than the curvature of 21a.
  • the curvature of the second region 21b may be 2.5 times or more the curvature of the first region 21a.
  • the curvature of the second region 21b may be smaller than the curvature of the first region 21a.
  • the second surface 21 is not limited to a surface having two regions having different curvatures, and the curvature of each part of the second surface 21 depends on the distance from the center 32 of the electron emitting surface 31 to that portion. It may be a changing surface. With this configuration, the electrons can be converged with higher accuracy. In this case, the curvature of the second surface 21 may increase according to the distance from the center 32 of the electron emitting surface 31. With this configuration, the electrons can be converged with higher accuracy. On the contrary, the curvature of the second surface 21 may decrease according to the distance from the center 32 of the electron emitting surface 31.
  • the third region 11a and the fourth region 11b which are different in distance from the center 32 of the electron emitting surface 31, respectively.
  • the curvature of the surface may be different in the region.
  • the curvature of the fourth region 11b is set to the third region. It may be larger than the curvature of 11a.
  • the curvature of the fourth region 11b may be 2.5 times or more the curvature of the third region 11a.
  • the curvature of the fourth region 11b may be smaller than the curvature of the third region 11a.
  • the first surface 11 is not limited to a surface having two regions having different curvatures, and the curvature of each part of the first surface 11 depends on the distance from the center 32 of the electron emitting surface 31 to that portion. It may be a changing surface. In this case, the curvature of the first surface 11 may increase according to the distance from the center 32 of the electron emitting surface 31. On the contrary, the curvature of the first surface 11 may decrease according to the distance from the center 32 of the electron emitting surface 31. In the above configuration, instead of the distance from the center of the electron emitting surface 31, the curvature of each region of the second surface 21 or the curvature of each region of the first surface 11 is set according to the distance from the optical axis AX. You may have.
  • a high voltage of about 50 kV or more is applied between the shield electrode 40 and the acceleration electrode 50. Therefore, if there is a convex portion having a large curvature on the surface of one of the shield electrode 40 or the accelerating electrode 50 that opposes the other, an electric field is concentrated on the convex portion, and a discharge is discharged from the convex portion to the other electrode. May occur.
  • the third surface 41 which is the electrode surface of the shield electrode 40 facing the acceleration electrode 50, is formed by the fifth region 41a and the sixth region 41b, which are different in distance from the opening 52 of the shield electrode 40. The curvature of the surface may be different in each region.
  • the curvature of the sixth region 41b is set to the curvature of the fifth region 41a. It may be set larger than the curvature.
  • the curvature of the sixth region 41b may be 2.5 times or more the curvature of the fifth region 41a.
  • the curvature of the sixth region 41b may be smaller than the curvature of the fifth region 41a.
  • Each of the fifth region 41a and the sixth region 41b of the third surface 41 of the shield electrode 40 may be a curved surface having a center of curvature on the emitter 30 side with respect to the opening 42 of the shield electrode 40. In the above configuration, the curvature of each region of the third surface 41 may be set according to the distance from the optical axis AX instead of the distance from the center of the opening 42.
  • a predetermined negative voltage is supplied to the first electrode 10 from the first voltage source V1 via the first electrode cable 15.
  • the emission and suppression of electrons from the electron emission surface 31 are controlled by controlling the voltage of the first electrode 10. That is, electrons are sent from the electron emitting surface 31 by supplying a voltage higher than the voltage of the emitter 30 by 2 kV or more (a voltage on the positive side of the voltage of the emitter 30) from the first voltage source V1 to the first electrode 10. Release. Further, by supplying a voltage (more negative voltage) lower than the voltage of the emitter 30 to the first electrode 10 from the first voltage source V1 by 2 kV or more as an example, the emission of electrons from the electron emitting surface 31 is suppressed.
  • a high frequency (not limited, but here, for example, 5 MHz) is transmitted from the first voltage source V1 to the first electrode 10 via the first electrode cable 15. It is necessary to supply a voltage that fluctuates with. In this case, an electromagnetic wave accompanying the fluctuation of the voltage is radiated around the first electrode cable 15. When this electromagnetic wave is absorbed by any of the emitter cable 35, the second electrode cable 25, or the shield electrode cable 45, the voltage of the emitter 30, the second electrode 20, or the shield electrode 40 fluctuates, and the electron gun 100 The characteristics may fluctuate.
  • the first electrode cable 15 is wired at a position away from the emitter cable 35, the second electrode cable 25, and the shield electrode cable 45. Is also good. That is, the distance L1 between the emitter cable 35, the second electrode cable 25, and the shield electrode cable 45 and the first electrode cable 15 is the distance between the emitter cable 35, the second electrode cable 25, and the shield electrode cable 45. It may be set larger than L2, L3, and L4.
  • FIG. 3 is a diagram showing an example of the configuration of the first electrode cable 15, the second electrode cable 25, the emitter cable 35, and the shield electrode cable 45 in the regions W1 and W2 shown by the broken lines in FIG.
  • the emitter cable 35, the second electrode cable 25, and the shielded electrode cable 45 are arranged in the multi-core shielded cable 26, and the first electrode cable 15 is a shield different from the multi-core shielded cable 26. It may be arranged in the cable 16.
  • the emitter cable 35, the second electrode cable 25, and the shielded electrode cable 45 are covered with a shield 27 made of a mesh conductor as an example, and electromagnetic waves from the outside are blocked by the shield 27.
  • the shielded cable 16 the first electrode cable 15 is covered with a shield 17 made of a mesh conductor, and the shield 17 reduces leakage of electromagnetic waves to the outside.
  • each of the emitter 30, the first electrode 10, the second electrode 20, the shield electrode 40, and the acceleration electrode 50 has a rotationally symmetric shape with the optical axis AX as the center of rotation. It does not have to be.
  • the electron gun 100 of the first embodiment has an emitter 30 having an electron emitting surface 31, a first electrode 10 as an extraction electrode, and a second surface 21 facing the first surface 11 of the first electrode 10.
  • the second electrode 20 is provided with the second electrode 20, and the second surface 21 of the second electrode 20 has a first region 21a and a second region 21b having different distances from the center 32 of the electron emitting surface 31 and is the first.
  • the curvature in the region 21a is different from the curvature in the second region 21b.
  • the distance of the second region 21b from the center 32 of the electron emitting surface 31 is larger than the distance of the first region 21a from the center 32 of the electron emitting surface 31, and the curvature of the second region 21b is the first.
  • the curvature of the second surface 21 is configured to change according to the distance from the center 32 of the electron emitting surface 31, so that a large number of electrons emitted from the emitter 30 are converged with higher accuracy. Can be made to.
  • the curvature of the second surface 21 is configured to increase according to the distance from the center 32 of the electron emitting surface 31, so that a large number of electrons emitted from the emitter 30 are converged with higher accuracy.
  • the first surface 11 of the first electrode 10 has a third region 11a and a fourth region 11b having different distances from the center 32 of the electron emitting surface 31, and the curvature in the third region 11a is By having a configuration different from the curvature in the fourth region 11b, a large number of electrons emitted from the emitter 30 can be converged with higher accuracy.
  • the distance of the fourth region 11b from the center 32 of the electron emitting surface 31 is larger than the distance of the third region 11a from the center 32 of the electron emitting surface 31, and the curvature of the fourth region 11b is the third.
  • the curvature of the first surface 11 of the first electrode 10 is configured to change according to the distance from the center 32 of the electron emitting surface 31, so that a large number of electrons emitted from the emitter 30 can be emitted. It can be converged with higher accuracy.
  • the curvature of the first surface 11 of the first electrode 10 is configured to increase according to the distance from the center 32 of the electron emitting surface 31, so that a large number of electrons emitted from the emitter 30 can be emitted. It can be converged with higher accuracy.
  • the second surface 21 of the second electrode 20 is concave, a large number of electrons emitted from the emitter 30 can be converged with higher accuracy.
  • the same voltage as the voltage applied to the emitter 30 is applied to the second surface 21 of the second electrode 20, a large number of electrons emitted from the emitter 30 can be made more accurate. Can be converged to.
  • the second surface 21 of the second electrode 20 has a distance from the center 32 of the electron emitting surface 31 of the first region 21a and the second region 21b, respectively. It was assumed that the curvatures of the surfaces were different in the regions. In the electron gun 100 of the second embodiment, the second surface 21 of the second electrode 20 does not necessarily have the distances from the center 32 of the electron emitting surface 31 different from each other in the first region 21a and the second region 21b, respectively. The curvature of the surface does not have to be different in the region.
  • the third surface 41 which is the electrode surface of the shield electrode 40 facing the acceleration electrode 50, has a fifth region 41a and a sixth region in which the distances from the opening 52 of the shield electrode 40 are different from each other.
  • the curvature of the surface is different in each region with 41b.
  • the configuration of the electrode surface (third surface 41) of the shield electrode 40 in the electron gun of the second embodiment is the electrode surface (third surface 41) of the shield electrode 40 in the electron gun 100 of the first embodiment described above. Since it is the same as the configuration of the configuration, detailed description thereof will be omitted.
  • the above-mentioned fifth region 41a of the third surface 41 which is the electrode surface of the shield electrode 40, is interpreted as the "first region” instead of the above-mentioned first region 21a.
  • the above-mentioned sixth region 41b may be interpreted as the "second region” instead of the above-mentioned second region 21b.
  • the electron gun of the second embodiment has an emitter 30 having an electron emitting surface 31, a first electrode 10 as an extraction electrode, and a second surface 21 facing the first surface 11 of the first electrode 10.
  • a second electrode 20 and a shield electrode 40 having an opening 42 in which electrons from the emitter 30 are incident are provided, and the electrode surfaces (third surface 41) of the shield electrode 40 are different from each other in distance from the center of the opening 42. It has a first region (fifth region 41a) and a second region (sixth region 41b), and the curvature in the first region (fifth region 41a) is different from the curvature in the second region (sixth region 41b). .
  • the electron gun 100 of the second embodiment can relax the local concentration of the electric field in the vicinity of the shield electrode 40 and prevent the discharge from the shield electrode 40.
  • the distance of the second region (sixth region 41b) from the center of the opening 42 of the shield electrode 40 is larger than the distance of the first region (fifth region 41a) from the center of the opening 42 of the shield electrode 40.
  • the curvature of the second region (sixth region 41b) on the electrode surface (third surface 41) of the shield electrode 40 is large, and the curvature of the first region (fifth region 41a) on the electrode surface (third surface 41) of the shield electrode 40 is large.
  • the configuration of the electron gun 100 of the third embodiment is almost the same as the configuration of the electron gun of the first embodiment described above. Therefore, in the following, only the differences between the electron gun of the third embodiment and the electron gun of the first embodiment will be described. Further, the configuration common to the electron gun of the third embodiment and the electron gun of the first embodiment will be described with the same reference numerals.
  • the second surface 21 of the second electrode 20 has a distance from the center 32 of the electron emitting surface 31 of the first region 21a and the second region 21b, respectively. It was assumed that the curvatures of the surfaces were different in the regions.
  • the second surface 21 of the second electrode 20 does not necessarily have the distances from the center 32 of the electron emitting surface 31 different from each other in the first region 21a and the second region 21b, respectively. The curvature of the surface does not have to be different in the region.
  • the distance L1 between the emitter cable 35, the second electrode cable 25, and the shield electrode cable 45 and the first electrode cable 15 is the emitter cable 35, the second electrode cable 25, and the shield.
  • the distance between the electrode cables 45 is larger than the distances L2, L3, and L4.
  • the configurations of the first electrode cable 15, the emitter cable 35, the second electrode cable 25, and the shield electrode cable 45 in the electron gun of the third embodiment are the cables (15, 35) in the electron gun 100 of the first embodiment. , 25, 45), and therefore detailed description thereof will be omitted.
  • the electron gun of the third embodiment has an emitter 30 having an electron emitting surface 31, a first electrode 10 as an extraction electrode, and a second surface 21 facing the first surface 11 of the first electrode 10.
  • the electrode cable 15, the second electrode cable 25 that supplies a predetermined voltage to the second electrode 20, and the shield electrode cable 45 that supplies a predetermined voltage to the shield electrode 40 are provided, and the emitter cable 35 and the second electrode cable are provided.
  • the distance L1 between the 25 and the shield electrode cable 45 and the first electrode cable 15 is larger than the distance L2, L3, and L4 between the emitter cable 35, the second electrode cable 25, and the shield electrode cable 45.
  • the emitter cable 35, the second electrode cable 25, and the shielded electrode cable 45 are arranged on the multi-core shielded cable 26, and the first electrode cable 15 is a shielded cable 16 different from the multi-core shielded cable 26.
  • the adverse effect of the electromagnetic waves radiated from the first electrode cable 15 on the emitter cable 35, the second electrode cable 25, and the shielded electrode cable 45 can be further reduced.
  • 100 Electronic gun, 10: 1st electrode, 11: 1st surface, 11a: 3rd region, 11b: 4th region, 20: 2nd electrode, 21: 2nd surface, 21a: 1st region, 21b: 1st 2 regions, 30: emitter, 31: electron emitting surface, 40: shield electrode, 41: third surface (electrode surface), 41a: fifth region, 41b: sixth region, 50: accelerating electrode, 60: housing, 15: 1st electrode cable, 25: 2nd electrode cable, 35: emitter cable, 45: shielded electrode cable, V1: 1st voltage source, V2: 2nd voltage source, V3: 3rd voltage source, V4: 4th Voltage source, 61a to 61d: Current introduction terminal, 16: Single-core shielded cable, 26: Multi-core shielded cable

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PCT/JP2019/039850 2019-10-09 2019-10-09 電子銃 Ceased WO2021070289A1 (ja)

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PCT/JP2019/039850 WO2021070289A1 (ja) 2019-10-09 2019-10-09 電子銃
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120413392A (zh) * 2025-04-27 2025-08-01 电子科技大学 一种用于回旋波保护器的新型电子枪

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50146263A (https=) * 1974-05-13 1975-11-22
JPS54117058U (https=) * 1978-02-06 1979-08-16
JPH0963489A (ja) * 1995-08-28 1997-03-07 Toshiba Corp 電子管
JPH1167111A (ja) * 1997-08-12 1999-03-09 Nec Corp 冷陰極搭載電子管の電極電圧印加方法および装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50146263A (https=) * 1974-05-13 1975-11-22
JPS54117058U (https=) * 1978-02-06 1979-08-16
JPH0963489A (ja) * 1995-08-28 1997-03-07 Toshiba Corp 電子管
JPH1167111A (ja) * 1997-08-12 1999-03-09 Nec Corp 冷陰極搭載電子管の電極電圧印加方法および装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120413392A (zh) * 2025-04-27 2025-08-01 电子科技大学 一种用于回旋波保护器的新型电子枪

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