WO2021059552A1 - Nitrogen-containing carbon film, method for manufacturing same, compressor, and sliding member - Google Patents

Nitrogen-containing carbon film, method for manufacturing same, compressor, and sliding member Download PDF

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Publication number
WO2021059552A1
WO2021059552A1 PCT/JP2020/007733 JP2020007733W WO2021059552A1 WO 2021059552 A1 WO2021059552 A1 WO 2021059552A1 JP 2020007733 W JP2020007733 W JP 2020007733W WO 2021059552 A1 WO2021059552 A1 WO 2021059552A1
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Prior art keywords
nitrogen
carbon film
sliding member
film
base material
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PCT/JP2020/007733
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French (fr)
Japanese (ja)
Inventor
梅原 徳次
貴行 野老山
基之 村島
義永 李
典久 洞口
孝生 石本
慎吾 田中
Original Assignee
三菱重工業株式会社
国立大学法人東海国立大学機構
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Publication of WO2021059552A1 publication Critical patent/WO2021059552A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/32Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48Ion implantation
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04BPOSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B39/00Component parts, details, or accessories, of pumps or pumping systems specially adapted for elastic fluids, not otherwise provided for in, or of interest apart from, groups F04B25/00 - F04B37/00
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04CROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/02Rotary-piston pumps specially adapted for elastic fluids of arcuate-engagement type, i.e. with circular translatory movement of co-operating members, each member having the same number of teeth or tooth-equivalents
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04CROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C18/00Rotary-piston pumps specially adapted for elastic fluids
    • F04C18/30Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members
    • F04C18/34Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members
    • F04C18/356Rotary-piston pumps specially adapted for elastic fluids having the characteristics covered by two or more of groups F04C18/02, F04C18/08, F04C18/22, F04C18/24, F04C18/48, or having the characteristics covered by one of these groups together with some other type of movement between co-operating members having the movement defined in group F04C18/08 or F04C18/22 and relative reciprocation between the co-operating members with vanes reciprocating with respect to the outer member
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04CROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C17/00Sliding-contact bearings for exclusively rotary movement
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16CSHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C33/00Parts of bearings; Special methods for making bearings or parts thereof
    • F16C33/02Parts of sliding-contact bearings
    • F16C33/04Brasses; Bushes; Linings
    • F16C33/16Sliding surface consisting mainly of graphite

Definitions

  • the present invention relates to a nitrogen-containing carbon film, a method for producing the film, a compressor, and a sliding member.
  • Patent Document 1 It is known that an amorphous carbon film containing nitrogen is formed on the surface of a base material in order to reduce the loss in the sliding portion (Patent Document 1).
  • Patent Document 1 as a method for manufacturing a member that slides in an environment where a lubricating oil is present, the surface of the base material is subjected to a filtered arc deposition method while irradiating a nitrogen ion beam toward the surface of the base material. It is described that an amorphous carbon film having a nitrogen content of 2 to 11 atomic% (at%) is formed by depositing carbon.
  • Patent Document 1 when a sliding member on which an amorphous carbon film is formed is used, nitrogen on the surface of the film is desorbed on the sliding surface, and the sliding surface has a structural change such as graphite. Layers are formed. The coefficient of friction is reduced by this structural change layer.
  • Patent Document 1 if the nitrogen content is increased to exceed 11 atomic%, it is difficult to form a film. Further, even if a film can be formed, the hardness of the amorphous carbon film is lowered, so that the familiar effect exhibited by the difference in hardness between the structural change layer and the hard layer cannot be sufficiently exhibited.
  • a sliding member having an amorphous carbon film having a nitrogen content of more than 11 atomic% and being subjected to a refrigerant atmosphere and a compressor for a refrigerant containing such a sliding member.
  • the purpose is to sufficiently reduce friction in sliding members used in a refrigerant atmosphere.
  • the nitrogen-containing carbon film of the present disclosure is an amorphous nitrogen-containing carbon film that is applied to a base material and contains nitrogen, and the nitrogen content of the carbon film is 12 to 20 atomic%, and the carbon film has a nitrogen content of 12 to 20 atomic%.
  • the Young rate is 160-250 GPa.
  • the method for producing a nitrogen-containing carbon film of the present disclosure is a method for producing an amorphous carbon film containing nitrogen by being applied to a base material, and the nitrogen ion beam is used as a base material using a gridless ion beam generator. Carbon is deposited on the substrate by the filtered Casodic vacuum arc method while irradiating the substrate.
  • the compressor of the present disclosure is a compressor that compresses a refrigerant containing hydrogen, and includes a sliding member having a nitrogen-containing amorphous carbon film applied to a base material, and the sliding member is a refrigerant. Arranged in an existing atmosphere, the nitrogen content in the carbon film is 12-20 atomic%.
  • the sliding member of the present disclosure is a sliding member constituting a compressor that compresses a refrigerant containing hydrogen, and is arranged in an atmosphere in which the refrigerant is present, and an amorphous carbon film containing nitrogen is used as a base material.
  • the nitrogen content in the carbon film is 12 to 20 atomic%.
  • the sliding member of the present disclosure is a sliding member used in an atmosphere in which a refrigerant is present, and an amorphous carbon film containing nitrogen is applied to a base material, and the nitrogen content in the carbon film is determined. It is 12 to 20 atomic%.
  • the method for manufacturing a sliding member of the present disclosure is a method for manufacturing a sliding member which contains a base material having an amorphous carbon film containing nitrogen and is used in an atmosphere in which a refrigerant is present.
  • a gridless ion beam generator is used to irradiate the substrate with a nitrogen ion beam while depositing carbon on the substrate by a filtered Casodic vacuum arc method.
  • CNx film a nitrogen-containing amorphous carbon film
  • the nitrogen content is increased to 12 to 20 atomic%, as compared with the case where the nitrogen content is smaller. Even if the hardness of the carbon film is reduced, the friction can be sufficiently reduced based on the test results described later.
  • the Young's modulus of the CNx film is reduced to 160-250 GPa, so the Young's modulus of the metal material typically used for the substrate ( A Young's modulus equivalent to (around 200 GPa) will be given to the CNx film.
  • the CNx membrane of the present disclosure is used in a hydrogen-containing refrigerant atmosphere, the combination of carbon and hydrogen produces a soft polymer-like carbon on the surface of the CNx membrane, and thus under boundary lubrication. Can also reduce friction.
  • a CNx film is applied to the base material. It is a graph which shows the relationship between the nitrogen flow rate at the time of film formation, and the nitrogen content of the film about the CNx film shown in FIG. It is a graph which shows the nitrogen content and the friction coefficient under the refrigerant atmosphere about the CNx film shown in FIG. It is a graph which shows the hardness and Young's modulus with respect to the nitrogen flow rate at the time of film formation about the CNx film shown in FIG. It is a schematic diagram which shows the manufacturing apparatus for manufacturing the CNx film shown in FIG. It is a schematic diagram which shows the gridless ion beam generator provided in the manufacturing apparatus shown in FIG.
  • FIG. 1 It is a top view which shows the anode provided in the gridless ion beam generator shown in FIG. It is a top view which shows the cathode provided in the gridless ion beam generator shown in FIG. It is a conceptual diagram which shows the plasma generation by the gridless ion beam generator shown in FIG. It is a conceptual diagram which shows the plasma irradiation by the gridless ion beam generator shown in FIG. It is a schematic diagram which shows the ion beam generator including a grid for comparison with the gridless ion beam generator shown in FIG. It is a schematic diagram which shows the relationship between the voltage and the current density of each of the gridless / grid-bearing ion beam generators. It is a figure which shows the manufacturing procedure of the CNx film.
  • FIG. 1 schematically shows a cross section of a base material 1 of a sliding member 10 according to the present embodiment.
  • An amorphous carbon film 2 containing nitrogen is applied to the surface 1A (sliding surface) of the base material 1.
  • the nitrogen-containing amorphous carbon film 2 applied to the base material 1 will be referred to as a CNx film 2.
  • the base material 1 is typically formed of a metal material, but can be formed of an appropriate material such as resin or ceramic.
  • the "CNx film” is a ta-C (tetrahedralamorphous-Carbon) film rich in sp3 structure and corresponds to a nitrogen-containing film (ta-CNx).
  • the thickness T of the CNx film 2 is, for example, 0.1 to 1 ⁇ m.
  • the CNx film 2 is formed on the base material 1. After that, when the sliding member 10 is used, nitrogen is separated from the surface of the CNx film 2 due to the shearing of the CNx film 2 due to the sliding between the sliding member 10 and the mating member, and carbon is replaced with carbon instead of the separated nitrogen. As shown in the lower part of FIG. 1, a structural change layer 2A containing a structure such as graphite is formed on the surface layer of the base material 1. The hardness of the structural change layer 2A is lower than the hardness of the hard layer 2B in which nitrogen is maintained in the CNx film 2.
  • the bond between nitrogen and carbon in the nitrogen-containing CNx film 2 is inferior to the bond between carbon and carbon in a typical DLC (Diamond-Like Carbon) film, it can be used as a refrigerant in a refrigerant atmosphere.
  • the contained hydrogen and the carbon of the CNx film 2 are likely to be bonded.
  • a chemical reaction between hydrogen in the refrigerant and carbon in the CNx film 2 causes a polymer-like carbon (tribo film) that is soft to the hard layer 2B to be formed on the surface layer of the CNx film 2. It has been confirmed by surface analysis by reflection spectroscopy that polymer-like carbon is formed on the surface layer of the CNx film 2 when used in a refrigerant atmosphere.
  • the structural change layer 2A may contain graphite or a similar structure due to the release of nitrogen and polymer-like carbon due to the bond between hydrogen and carbon.
  • a soft layer structural change layer 2A
  • the shearing force during sliding is reduced, so that a friction reducing effect is exhibited.
  • the nitrogen content in CNx Membrane 2 reaches up to 12-20 atomic%, as shown in FIG. Note that FIG. 3 plots the data of 14.5 atomic% and 17.4 atomic%.
  • the nitrogen content of the nitrogen-containing amorphous carbon film in the present specification refers to the nitrogen content when the total of carbon and nitrogen is 100 atomic%.
  • a gridless type ion beam generator 40 is used to irradiate the base material 1 with a nitrogen ion beam, and the base material 1 is subjected to a filtered Cathodic Vacuum Arc (FCVA) method.
  • FCVA Cathodic Vacuum Arc
  • the nitrogen content of the CNx membrane 2 can be adjusted by setting the flow rate of the nitrogen gas introduced into the gridless ion beam generator 40. As the flow rate of nitrogen gas increases, the partial pressure of nitrogen increases, so that the nitrogen content can be increased.
  • the CNx film 2 causes friction between the sliding member 10 and the mating member, especially when used in an atmosphere in which a refrigerant is present. It can be sufficiently reduced.
  • the term "refrigerant” refers to a gas-phase or liquid-phase refrigerant containing hydrogen such as an HFC (Hydro Fluoro Carbon) -based refrigerant, an HFO (Hydro FluoroOlefin) -based refrigerant, ammonia, and a hydrocarbon-based refrigerant.
  • the refrigerant may be dissolved in the lubricating oil, or the lubricating oil may be mixed in the refrigerant gas.
  • FIG. 3 shows the friction coefficient of the CNx film 2 in a rectangular ( ⁇ ) plot in an atmosphere in which lubricating oil is mixed in the refrigerant gas, and shows the friction coefficient of the CNx film 2 in a refrigerant gas atmosphere in a dry condition in which the lubricating oil is not mixed. It is shown in a diamond-shaped ( ⁇ ) plot.
  • the two plots shown in diamonds in FIG. 3 correspond to Examples 2 and 3 (FIG. 15) described later, respectively.
  • the rectangular plot shown in FIG. 3 corresponds to Example 4 (FIG. 16) described later, and relates to an atmosphere in which a polyol ester (POE) -based lubricating oil is mixed with the refrigerant gas.
  • POE polyol ester
  • the material of the base material 1 is SUJ2 (JIS G 4805: 2008 high carbon chrome bearing steel).
  • the CNx film 2 exhibits a low coefficient of friction of 0.04 or less regardless of whether the refrigerant gas atmosphere is dry or the refrigerant gas atmosphere is mixed with lubricating oil.
  • SCCM Standard Cubic Centimeter per Minute
  • SCCM Standard Cubic Centimeter per Minute
  • the hardness of the CNx film 2 is shown by a solid line
  • the Young's modulus of the CNx film 2 is shown by a broken line.
  • 5 SCCM corresponds to a nitrogen content of 14.5 atomic%
  • 40 SCCM corresponds to a nitrogen content of 17.4 atomic%.
  • the CNx membrane 2 with the nitrogen content increased to 12 to 20 atomic% can be realized by using the gridless ion beam generator 40. Therefore, if the nitrogen content is smaller than that, the grid can be used. It can be considered that an ion beam generator containing the above is used.
  • the CNx film formed using an ion beam generator containing a grid has a low nitrogen content and a high hardness. From such a viewpoint, in the above-mentioned Patent Document 1 (Patent No. 6298019), an ion beam irradiation device including a grid is used.
  • Patent Document 1 discloses that the nitrogen content of the nitrogen-containing amorphous carbon film is 2 to 11%, and the hardness thereof is 25 to 80 GPa.
  • the manufacturing apparatus 3 is a combination of the FCVA film forming apparatus 30 and the gridless type ion beam generator 40, and by supplying carbon and nitrogen to the substrate 1, the CNx film 2 is attached to the substrate 1. To form a film.
  • the FCVA film forming apparatus 30 includes a vacuum arc discharge generating unit 31, a filter unit 32, a droplet collecting unit 33, and a vacuum chamber 34 in which the base material 1 is arranged.
  • the vacuum arc discharge generation unit 31 generates a vacuum arc discharge at a carbon target 312 (cathode) such as a graphite target as a carbon supply source by detonation by the trigger 311 and generates carbon plasma by the arc discharge.
  • the filter unit 32 includes a plurality of solenoid coils 321 and functions as an electromagnetic filter. The filter unit 32 deflects the ionized carbon toward the vacuum chamber 34 in which the base material 1 is arranged with respect to the droplet traveling from the carbon target 312 toward the droplet collecting unit 33. In the example shown in FIG.
  • the duct 322 of the filter unit 32 is orthogonal to the path of the droplet and forms a T-shape, but the present invention is not limited to this, and for example, a Y-shape may be formed.
  • the filter unit 32 extracts fine carbon particles for droplets of about 0.1 to several ⁇ m and deposits them on the base material 1 in the vacuum chamber 34.
  • the gridless ion beam generator 40 ionizes the nitrogen gas and irradiates the nitrogen ion beam toward the base material 1.
  • the flow rate of nitrogen gas introduced into the gridless ion beam generator 40 from a nitrogen source (not shown) is appropriately set according to a predetermined nitrogen content of the CNx film 2 formed on the substrate 1.
  • the gridless ion beam generator 40 does not include a grid electrode.
  • the gridless ion beam generator 40 includes an anode 41, a cathode 42 (42A, 42B), and a permanent magnet 43. As the anode 41 is shown in FIG. 7A and the cathode 42 is shown in FIG.
  • the anode 41 and the cathode 42 are arranged close to each other in the direction orthogonal to the paper surface (the irradiation direction of the ion beam).
  • a permanent magnet 43 is arranged around the anode 41 formed in an annular shape, and in a plan view, the cathode 42A is arranged around the anode 41, and the anode 41 is arranged.
  • the cathode 42B is arranged inside.
  • the direction in which the carbon particles are supplied to the vacuum chamber 34 toward the base material 1 and the direction in which the nitrogen ion beam is irradiated toward the base material 1 intersect are doing.
  • the holder 341 rotates in the vacuum chamber 34 the plurality of base materials 1 installed in the holder 341 move around the rotation axis of the holder 341, so that carbon particles are formed with respect to each of the plurality of base materials 1.
  • the nitrogen ion beam are supplied alternately.
  • the direction in which the carbon particles are supplied toward the base material 1 and the base material 1 It does not necessarily have to intersect the direction in which the nitrogen ion beam is irradiated.
  • the nitrogen ion beam may be irradiated toward the base material 1 from the same direction in which the carbon particles are supplied toward the base material 1. In this case, the carbon particles and the nitrogen ion beam are simultaneously supplied to the same base material 1.
  • the film formation process can be performed on a plurality of base materials 1 installed on the rotatable holder 341 at one time. However, the film forming process may be performed on a single base material 1.
  • FIG. 9 shows a grid type ion beam generator 70.
  • the grid-type and microwave-type ion beam generator 70 includes a microwave source 71, a discharge tube 72, an igniter 73 (igniter), a permanent magnet 75, a grid 74 provided at the outlet of the discharge tube 72, and the like. I have.
  • the nitrogen gas introduced into the discharge tube 72 is ionized by the energy of the microwave emitted from the microwave source 71 and introduced into the discharge tube 72, and accelerated by the grid 74 including a plurality of porous electrodes to which a voltage is applied. Then, it is irradiated to the base material 1 in the vacuum chamber 34 (FIG.
  • the grid 74 includes, for example, three electrodes stacked at predetermined intervals. The functions of plasma generation and plasma irradiation by the grid 74 are separated between these electrodes. On the other hand, in the gridless ion beam generator 40, since the anode 41 and the cathode 42 are arranged close to each other, plasma generation and plasma irradiation are performed at the same time.
  • the current density with respect to the voltage of the ion beam emitted by the gridless ion beam generator 40 is shown by a solid line, and the current density with respect to the voltage of the ion beam irradiated by the ion beam generator 70 provided with the grid 74 is shown by a broken line.
  • the gridless ion beam generator 40 has a wider energy width of the ion beam than the grid type ion beam generator 70. Assuming that the current densities are the same, the gridless ion beam generator 40 can flow a larger amount of current (higher current value) than the grid type ion beam generator 70, and therefore has a high output.
  • the set values in the grid type ion beam generator 70 are 3 k V, 0.33 A, 100 W as an example, while the set values in the gridless ion beam generator 40 are 2 k V, 1 A, 1200 W as an example. Is.
  • the set value referred to here corresponds to the discharge current at the time of irradiating the nitrogen ion beam at the time of film formation in Table 1 described later.
  • the set value corresponds to the upper limit value of each device.
  • a nitrogen content of 12 to 20 atomic% can be realized.
  • the nitrogen content that can be realized in the nitrogen-containing amorphous carbon film remains at about 11 atomic%.
  • the base material 1 is supplied with carbon particles.
  • a CNx film 2 having a thickness of about 0.5 ⁇ m can be formed.
  • the base material 1 is immersed in each of benzene and acetone, and ultrasonic cleaning is performed for, for example, 15 minutes (step S1).
  • the base material 1 that has been ultrasonically cleaned is placed in the holder 341 in the vacuum chamber 34, and the inside of the vacuum chamber 34 is evacuated until, for example, 4 ⁇ 10 -4 Pa or less (step S2).
  • the surface of the carbon target 312 is cleaned for, for example, 2 minutes by generating an arc discharge in the carbon target 312 by the FCVA film forming apparatus 30 (step S3).
  • the solenoid coils 321 for example, 321A to 321D in FIG. 5 are used, and the remaining solenoid coils 321 are not used. Therefore, the carbon particles are not deflected toward the base material 1 in the vacuum chamber 34, and go straight from the carbon target 312 to the droplet collecting portion 33.
  • the base material 1 is cleaned by the gridless ion beam generator 40 (step S4).
  • argon gas is introduced into the gridless ion beam generator 40 from an argon gas source (not shown). While rotating the holder 341 at, for example, 4 rpm, the surface of the base material 1 is irradiated with an argon ion beam generated from argon gas by the gridless ion beam generator 40 toward the base material 1 for, for example, 20 minutes. Impurities and oxides are removed and cleaned. At this time, argon does not remain on the base material 1.
  • Purification of the base material 1 and the carbon target 312 is completed by the above steps S1 to S4. If the base material 1 and the carbon target 312 are properly cleaned, the procedure is not necessarily limited to the above procedure.
  • the CNx film 2 is formed on the base material 1 while rotating the holder 341 in the vacuum chamber 34 at, for example, 4 rpm (step S5).
  • the nitrogen ion beam generated from the nitrogen gas introduced into the gridless ion beam generator 40 and the FCVA film forming apparatus 30 deflect the holder 341 with respect to the path of the droplet.
  • a CNx film 2 having a thickness of about 0.5 ⁇ m is applied to the base material 1.
  • the irradiation of the nitrogen ion beam and the supply of carbon particles may be performed intermittently with a rest time of about 10 seconds as the time for dissipating heat from the base material 1.
  • the base material 1 is cooled in the vacuum chamber 34. Then, the base material 1 is taken out from the manufacturing apparatus 3 (step S6).
  • the table below shows an example of the film formation conditions for the CNx film 2.
  • a dense CNx film 2 containing nitrogen is uniformly formed on the surface of the base material 1.
  • the sliding member 10 provided with the base material 1 coated with the CNx film 2 is manufactured.
  • the CNx film 2 formed on the base material 1 has a nitrogen content of 12 to 20% as described above, and has the hardness and Young's modulus described above.
  • the CNx film 2 formed on the base material 1 of the sliding member 10 slides on the surface of the mating member of the sliding member 10, so that the state of the surface changes.
  • the surface layer of the CNx film 2 changes to a graphite-like structure with the release of nitrogen from the CNx film 2, or instead of that.
  • the hydrogen contained in the refrigerant and the carbon of the CNx film 2 are bonded to form a polymer-like carbon on the surface layer of the CNx film 2. This is confirmed by the results of surface analysis by reflection spectroscopy, as shown in FIGS. 12 and 13.
  • the absolute reflectance spectrum when a test piece coated with a thin film is irradiated with light of a predetermined wavelength is measured, and the measured value of the absolute reflectance spectrum and the multiplexing of the incident light are multiplexed.
  • This is a method of measuring the thickness and optical constant of a thin film by fitting it with the absolute reflectance spectrum calculated from an optical model that takes reflection into consideration.
  • the absolute reflectance R in this method is expressed by the following equation (1). Absolute reflectance R depends on the wavelength of light.
  • I i incident light intensity per unit time
  • I r reflected light intensity per unit time
  • the absolute reflectance R when light is incident on a single-layer thin film in air at an incident angle ⁇ 0 is shown below.
  • d 1 Thin film thickness
  • Light wavelength
  • n Refractive index
  • k Extinction coefficient
  • ⁇ 0 Light incident angle
  • ⁇ 1 Light transmission angle
  • ⁇ 2 Transmission angle to base material ⁇ 0 , ⁇ 1
  • the materials indicated by the subscripts 0, 1, 2 indicate air, thin film, and base material, respectively.
  • the data of various carbon films shown in FIG. 14 are plotted according to the legend from the analysis by reflection spectroscopy using light having a wavelength of 550 nm, and also from the analysis by reflection spectroscopy, the partner in the refrigerant atmosphere.
  • the data of the CNx film 2 that has not been subjected to friction with the member is plotted by white circles ( ⁇ ) (A1, A2, A3, A4) and subjected to friction in a refrigerant atmosphere under dry conditions.
  • the data of the CNx film 2 after that is plotted by black circles ( ⁇ ) (B2, B3).
  • the horizontal axis is the refractive index n
  • the vertical axis is the extinction coefficient k.
  • FIG. 13 the data of the CNx film 2 after being subjected to friction under the refrigerant atmosphere under the boundary lubrication condition from the analysis by reflection spectroscopy using light having a wavelength of 550 nm is shown by black circles ( ⁇ ). It is plotted (C1, C2, C3). Plots C1 to C3 correspond to Examples 7, 4 and 6 (FIG. 16) described later, respectively. Since plots C1 to C3 correspond to Graphite film and Polymer Like Carbon shown in FIG. 14, the surface layer of CNx film 2 has a graphite-like structure or polymer-like carbon due to friction in a refrigerant atmosphere. It is probable that it changed to.
  • Example 1 shown in FIG. 15 shows the friction coefficient of the CNx film 2 under a nitrogen gas atmosphere (under a non-refrigerant atmosphere) under dry conditions where no lubricating oil is used.
  • Examples 2 and 3 show the coefficient of friction of the CNx film 2 under the R32 refrigerant gas atmosphere under dry conditions where no lubricating oil is used.
  • the CNx film is formed by supplying carbon particles by the FCVA method while irradiating the base material 1 of SUSJ2 with a nitrogen ion beam using the gridless ion beam generator 40 as described above. It is the one with 2.
  • Comparative Example 1 shows the coefficient of friction of the base material 1 of SUSJ2 to which the CNx film 2 is not applied under the atmosphere of R32 refrigerant gas.
  • the nitrogen gas flow rate during film formation of the CNx film 2 is 15 SCCM in Example 1 and 40 SCCM in Examples 2 and 3.
  • 40 SCCM corresponds to a nitrogen content of 17.4 atomic%.
  • the pressure of the atmospheric gas was 0.3 MPa.
  • both Examples 4 to 7 and Comparative Example 2 shown in FIG. 16 show the friction coefficient in a refrigerant gas atmosphere and under boundary lubrication conditions (a state in which the refrigerant is dissolved in the lubricating oil).
  • the base material 1 of SUJ2 is irradiated with a nitrogen ion beam using the gridless ion beam generator 40 as described above, and carbon particles are supplied by the FCVA method to supply a CNx film. It is the one with 2.
  • “N increase” in Example 5 means that the same base material 1 was irradiated with a nitrogen ion beam and carbon particles were supplied twice in succession under the same conditions as in Example 4. ..
  • Example 4 In Example 4 and the like without the description of "N increase", it was carried out only once.
  • a graphite layer is further applied on the CNx film 2.
  • This graphite layer is formed on the CNx film 2 by the FCVA film forming apparatus 30 in a state where the introduction of nitrogen gas into the gridless ion beam generator 40 is stopped following the film formation of the CNx film 2 on the base material 1. Is given to.
  • the film thickness of this graphite layer is about 100 nm, and the film thickness of the CNx film 2 is about 300 nm.
  • the graphite layer is soft, and when the CNx film 2 is coated with the graphite layer, a soft structural change layer 2A is formed on the CNx film 2 after sliding (lower side of FIG. 1). A composite layer is formed on the base material 1. Therefore, Example 6 shows a sufficiently low coefficient of friction.
  • the film thickness of the graphite layer of Example 6 is set to be the same as the thickness of the polymer-like carbon layer that appears on the surface layer of the CNx film 2 due to sliding in the refrigerant gas atmosphere. Comparative Example 2 shows the friction coefficient of the base material 1 of SUSJ2 to which the CNx film 2 is not applied.
  • Example 7 shows the coefficient of friction under the atmosphere of R1234yf refrigerant, which is an HFO refrigerant
  • the other Examples 4 to 6 and Comparative Example 2 show the coefficient of friction under the atmosphere of R32 refrigerant gas.
  • a PAG (polyalkylene glycol) -based lubricating oil is used in Example 7, and a POE-based lubricating oil is used in the other Examples 4 to 6 and Comparative Example 2 according to the refrigerant used.
  • the nitrogen gas flow rate during film formation of the CNx film 2 is 40 SCCM in both Examples 4 to 7 and Comparative Example 2.
  • the pressure of the atmospheric gas is 1 MPa
  • the pressure of the atmospheric gas in Example 7 is 0.2 MPa.
  • the friction coefficient of Comparative Example 2 is 0.10
  • the friction coefficient of Examples 4 to 7 is about 0.03 to 0.07. According to Examples 4 to 7, friction can be sufficiently reduced as compared with Comparative Example 2 in which the coating is not applied.
  • the gridless ion beam generator 40 it is possible to realize the CNx film 2 in which the nitrogen content is increased to 12 to 20 atomic%, and the CNx film 2 is applied to the base material 1. According to this, the friction can be sufficiently reduced from the results shown in FIGS. 3, 15, 16 and the like. By reducing friction, high efficiency and energy saving are realized by reducing the loss of sliding parts.
  • the Young's modulus of the CNx film 2 is 160 to 250 GPa, the Young's modulus equivalent to the Young's modulus of the metal material typically used for the base material (around 200 GPa) is obtained. It will be given to the CNx membrane. Therefore, it is possible to prevent the CNx film 2 from cracking and the CNx film 2 from peeling off from the base material 1, and improve the reliability of the sliding member 10 and the device including the sliding member 10.
  • the CNx film 2 described above is preferably applied to a sliding member constituting a compressor that compresses a refrigerant.
  • the compressor and the sliding members provided in the compressor are illustrated below. 17 and 18 show a compressor 5 provided with a scroll compression mechanism 50.
  • the compressor 5 compresses an HFC-based or HFO-based refrigerant, or a refrigerant containing hydrogen such as ammonia, by the scroll compression mechanism 50.
  • the compressor 5 transmits rotational driving force to the scroll compression mechanism 50, the thrust bearing 51 that receives the thrust load from the scroll compression mechanism 50, the thrust plate 58 as a thrust member, and the scroll compression mechanism 50, and the bearings 521 and 521.
  • the refrigerant gas introduced into the housing 55 through the introduction pipe 56 is sucked into the scroll compression mechanism 50, compressed, and discharged to the outside from the discharge pipe 57.
  • Members arranged inside the housing 55, such as the scroll compression mechanism 50, the thrust bearing 51, and the thrust plate 58, are arranged in a refrigerant atmosphere.
  • the scroll compression mechanism 50 includes a fixed scroll 501 fixed to the housing 55, a swivel scroll 502 that revolves around the fixed scroll 501, and an Oldham link 504.
  • the swivel scroll 502 is connected to an eccentric portion 531 provided on one end side 53A of the shaft 53.
  • the thrust bearing 51 receives a thrust load from the scroll compression mechanism 50 at one end side 53A of the shaft 53, and the thrust plate 58 receives a thrust load from the other end 53B of the shaft 53.
  • the end plate 502A of the swivel scroll 502 slides on the thrust bearing 51.
  • the Oldham link 504 engages the thrust bearing 51 and the swivel scroll 502 to regulate the rotation of the swivel scroll 502.
  • the first keys 504A and 504A provided on the Oldham link 504 slide on the inner wall of a key groove (not shown) provided on the upper surface of the thrust bearing 51.
  • the second keys 504B and 504B provided on the Oldham link 504 slide on the inner wall of a key groove (not shown) provided on the end plate 502A of the swivel scroll 502.
  • the CNx film 2 is applied to at least one of the above sliding members, that is, the thrust bearing 51, the thrust plate 58, the lap 501B of the fixed scroll 501, the lap 502B of the swivel scroll 502, and the Oldham link 504. As described above, friction can be sufficiently reduced even under dry conditions and boundary lubrication conditions. It is sufficient that the CNx film 2 is applied to at least the region sliding with the mating member in each of the thrust bearing 51, the thrust plate 58, the lap 501B of the fixed scroll 501, the lap 502B of the swivel scroll 502, and the Oldham link 504. ..
  • the CNx film 2 may be applied only to one surface 58A that slides on the other end 53B of the shaft 53.
  • the CNx film 2 can also be applied to sliding members other than the thrust bearing 51, the thrust plate 58, the laps 501B and 502B, and the Oldham link 504 described above.
  • it is arranged between the sliding surface of the bearings 521 and 522 that receives the radial load of the shaft 53, the outer peripheral portion of the eccentric portion 531 of the shaft 53 that supports the swivel scroll 502, and the inner peripheral portion of the boss 502C of the swivel scroll 502. It is also preferable to apply the CNx film 2 to the sliding surface of the drive bearing 505.
  • FIG. 20 shows a compressor 6 provided with a rotary compression mechanism 60.
  • the compressor 6 compresses the refrigerant containing hydrogen by the rotary compression mechanism 60.
  • the compressor 6 transmits rotational driving force to the rotary compression mechanism 60, thrust bearings 63 and 64 that receive the thrust load from the rotary compression mechanism 60, and the rotary compression mechanism 60, and is rotatably supported by the thrust bearings 63 and 64.
  • the shaft 65, a motor 66 that outputs torque to the shaft 65, and a housing 67 are provided.
  • Members arranged inside the housing 67, such as the rotary compression mechanism 60 and the thrust bearings 63 and 64, are arranged in a refrigerant atmosphere.
  • the rotary compression mechanism 60 includes a first compression mechanism 61 and a second compression mechanism 62.
  • the first compression mechanism 61 includes a cylinder 601, a piston rotor 602 that is rotated inside the cylinder 601 and a blade 603 that partitions a space inside the cylinder 601.
  • the blade 603 is provided in the cylinder 601 so as to be able to advance and retreat in the radial direction of the cylinder 601 and is pressurized from the outside to the inside in the radial direction.
  • the tip of the blade 603 slides on the outer peripheral portion of the rotating piston rotor 602.
  • the second compression mechanism 62 also includes a cylinder 601, a piston rotor 602, and a blade 603.
  • the inside of the cylinder 601 of the first compression mechanism 61 is partitioned by a thrust bearing 63 and a partition wall 68.
  • the inside of the cylinder 601 of the second compression mechanism 62 is partitioned by a thrust bearing 64 and a partition wall 68.
  • the refrigerant gas introduced from the accumulator 69 into the cylinders 601 of the first compression mechanism 61 and the second compression mechanism 62 is compressed in each cylinder 601 with the rotation of the piston rotor 602 coupled to the shaft 65, and the first The gas is discharged from the discharge ports 604 of the compression mechanism 61 and the second compression mechanism 62 into the housing 67, passes through the motor 66, and is discharged to the outside from the discharge pipe 605.
  • the CNx film 2 is applied to at least one of the blade 603 as a sliding member, the thrust bearings 63 and 64, the partition wall 68, the piston rotor 602, and the cylinder 601 to obtain dry conditions and boundary lubrication conditions. Even if it is, the friction can be sufficiently reduced. It suffices that the CNx film 2 is applied to at least a region of the sliding member that slides with the mating member. For example, in the blade 603 (FIG. 21), the CNx film 2 may be applied only to the tip portion 603A that slides on the piston rotor 602. In the piston rotor 602, the CNx film 2 may be applied only to the outer peripheral portion that slides on the inner wall of the cylinder 601.
  • the CNx film 2 it is also preferable to apply the CNx film 2 to the sliding surface or the like of the thrust bearings 63 and 64 that receives the radial load of the shaft 65.
  • the configurations listed in the above embodiments can be selected or appropriately changed to other configurations as long as the gist of the present invention is not deviated.
  • the substrate 1 instead of irradiating the argon ion beam, the substrate 1 is irradiated with an ion beam generated from an inert gas other than argon gas, such as a nitrogen ion beam generated from nitrogen gas.
  • an inert gas other than argon gas such as a nitrogen ion beam generated from nitrogen gas.
  • the surface of the gas may be cleaned.
  • one or more intermediate layers for improving the adhesion of the CNx film 2 to the base material 1 can be provided between the base material 1 and the CNx film 2.
  • the intermediate layer can be formed by using, for example, titanium, chromium, silicon, chromium nitride, titanium nitride, or the like.
  • the CNx film 2 may include a plurality of layers having different hardness. Similarly, the CNx film 2 may contain a plurality of layers having different nitrogen contents.
  • the nitrogen-containing carbon film of the present disclosure is grasped as follows.
  • the present disclosure is an amorphous nitrogen-containing carbon film that is applied to a base material and contains nitrogen, in which the nitrogen content in the carbon film is 12 to 20 atomic%, and the Young's modulus of the carbon film. Is 160-250 GPa.
  • the hardness of the carbon film is 18 to 25 GPa.
  • the present disclosure is a method of producing an amorphous carbon film containing nitrogen by being applied to a base material, while irradiating the base material with a nitrogen ion beam using a gridless ion beam generator.
  • Carbon is deposited on the substrate by the filtered Casodec vacuum arc method.
  • the carbon film is given a nitrogen content of 12 to 20%.
  • the base material is irradiated with an ion beam generated from the inert gas.
  • the present disclosure is a compressor that compresses a refrigerant containing hydrogen, and includes a sliding member having a nitrogen-containing amorphous carbon film applied to a base material, and the sliding member is a refrigerant.
  • the nitrogen content in the carbon film is 12-20 atomic%.
  • a scroll compression mechanism including a first scroll and a second scroll that revolves with respect to the first scroll, a shaft connected to the second scroll and rotatably supported, and a scroll at one end side of the shaft.
  • a thrust bearing that receives a thrust load from a compression mechanism and a thrust member that receives a thrust load from the other end of the shaft are provided, and the sliding member is related to the thrust bearing, the thrust member, the thrust bearing, and the second scroll. In this case, it corresponds to at least one of the Oldham link that regulates the rotation of the second scroll, the lap of the first scroll, and the lap of the second scroll.
  • the sliding member includes a cylinder, a piston rotor rotated inside the cylinder, a rotary compression mechanism including a blade that partitions the space inside the cylinder, and a thrust bearing that receives a thrust load from the rotary compression mechanism. , Thrust bearings and blades.
  • the sliding member of the present disclosure is a sliding member constituting a compressor that compresses a refrigerant containing hydrogen, and is arranged in an atmosphere in which the refrigerant is present, and an amorphous carbon film containing nitrogen is formed. It is applied to the base material, and the nitrogen content in the carbon film is 12 to 20 atomic%.
  • the sliding member is a thrust bearing that receives a thrust load from a scroll compression mechanism provided in the compressor.
  • the sliding member is an oldham link used in the scroll compression mechanism provided in the compressor.
  • the sliding member is a blade that constitutes a rotary compression mechanism provided in the compressor.
  • the sliding member of the present disclosure is a sliding member used in an atmosphere in which a refrigerant is present, and an amorphous carbon film containing nitrogen is applied to a base material, and the carbon film contains nitrogen. The rate is 12 to 20 atomic%.
  • a gridless ion beam generator which is a method of manufacturing a sliding member containing a base material having an amorphous carbon film containing nitrogen and used in an atmosphere in which a refrigerant is present. Including a step of depositing carbon on a substrate by a filtered Casodic vacuum arc method while irradiating the substrate with a nitrogen ion beam.
  • Base material 1A Surface 2 Nitrogen-containing amorphous carbon film (CNx film) 2A Structural change layer 2B Hard layer 3 Manufacturing equipment 5, 6 Compressor 10 Sliding member 30 FCVA deposition equipment 31 Vacuum arc discharge generator 32 Filter unit 33 Droplet collection unit 34 Vacuum chamber 40 Gridless ion beam generator 41 Anode 42, 42A, 42B Cathode 43 Permanent magnet 45 Outlet 50 Scroll compression mechanism 51 Thrust bearing 53 Shaft 53A One end side 53B Other end 54 Motor 55 Housing 56 Introductory pipe 57 Discharge pipe 58 Thrust plate (thrust member) 58A One side 60 Rotary compression mechanism 61 First compression mechanism 62 Second compression mechanism 63, 64 Thrust bearing 65 Shaft 66 Motor 67 Housing 68 Partition 69 Accumulator 70 Grid type ion beam generator 71 Microwave source 72 Discharge tube 73 Ignite 74 Grid 311 Trigger 312 Carbon target 321 Solenoid coil 322 Duct 341 Holder 501 Fixed scroll (1st scroll) 501A end plate

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Abstract

The purpose of the present invention is to sufficiently reduce friction by providing an amorphous carbon film having a nitrogen content of greater than 11 at%, and by providing a method for manufacturing such an amorphous carbon film. A nitrogen-containing amorphous CNx film 2 provided to a substrate 1 has a nitrogen content of 12-20 at% and a Young's modulus of 160-250 GPa. The CNx film 2 is manufactured by depositing carbon on the substrate 1 through a filtered cathodic vacuum arc method while irradiating the substrate 1 with nitrogen ion beams using a gridless ion beam generator 40.

Description

窒素含有炭素皮膜、その製造方法、圧縮機、および摺動部材Nitrogen-containing carbon film, its manufacturing method, compressor, and sliding members
 本発明は、窒素含有炭素皮膜、当該膜の製造方法、圧縮機、および摺動部材に関する。 The present invention relates to a nitrogen-containing carbon film, a method for producing the film, a compressor, and a sliding member.
 摺動部における損失を低減するため、窒素を含有した非晶質炭素皮膜を基材の表面に形成することが知られている(特許文献1)。
 特許文献1には、潤滑油が存在する環境下で摺動する部材の製造方法として、基材の表面に向けて窒素イオンビームを照射しながら、フィルタードアークデポジション法により基材の表面に炭素を蒸着させることで、窒素含有率が2~11原子%(at%)の非晶質炭素皮膜を成膜することが記載されている。
 特許文献1の記載によると、非晶質炭素皮膜が成膜された摺動部材を使用した際に、摺動面において膜の表面の窒素が脱離し、摺動面にはグラファイトの如き構造変化層が形成される。この構造変化層により摩擦係数が低減される。
It is known that an amorphous carbon film containing nitrogen is formed on the surface of a base material in order to reduce the loss in the sliding portion (Patent Document 1).
In Patent Document 1, as a method for manufacturing a member that slides in an environment where a lubricating oil is present, the surface of the base material is subjected to a filtered arc deposition method while irradiating a nitrogen ion beam toward the surface of the base material. It is described that an amorphous carbon film having a nitrogen content of 2 to 11 atomic% (at%) is formed by depositing carbon.
According to the description of Patent Document 1, when a sliding member on which an amorphous carbon film is formed is used, nitrogen on the surface of the film is desorbed on the sliding surface, and the sliding surface has a structural change such as graphite. Layers are formed. The coefficient of friction is reduced by this structural change layer.
特許第6298019号Patent No. 6298019
 特許文献1の記載によれば、11原子%を超える程に窒素含有率を増加させようとすると、成膜が難しい。また、仮に成膜できたとしても、非晶質炭素皮膜の硬度が低下するため、構造変化層と硬質層との硬度差により発現される馴染み効果が十分に発現できない、とされている。 According to the description of Patent Document 1, if the nitrogen content is increased to exceed 11 atomic%, it is difficult to form a film. Further, even if a film can be formed, the hardness of the amorphous carbon film is lowered, so that the familiar effect exhibited by the difference in hardness between the structural change layer and the hard layer cannot be sufficiently exhibited.
 本開示は、11原子%を超える窒素含有率を実現した非晶質炭素皮膜の提供、及びかかる非晶質炭素皮膜の製造方法の提供により、摩擦を十分に低減することを目的とする。
 加えて、11原子%を超える窒素含有率を実現した非晶質炭素皮膜を備え、冷媒雰囲気に供される摺動部材、及び、かかる摺動部材を含む冷媒用の圧縮機を提供することにより、冷媒雰囲気下で使用される摺動部材における摩擦を十分に低減することを目的とする。
It is an object of the present disclosure to sufficiently reduce friction by providing an amorphous carbon film having a nitrogen content of more than 11 atomic% and providing a method for producing such an amorphous carbon film.
In addition, by providing a sliding member having an amorphous carbon film having a nitrogen content of more than 11 atomic% and being subjected to a refrigerant atmosphere, and a compressor for a refrigerant containing such a sliding member. The purpose is to sufficiently reduce friction in sliding members used in a refrigerant atmosphere.
 本開示の窒素含有炭素皮膜は、基材に施され、窒素を含有した非晶質の窒素含有炭素皮膜であって、炭素皮膜における窒素含有率が、12~20原子%であり、炭素皮膜のヤング率は、160~250 GPaである。 The nitrogen-containing carbon film of the present disclosure is an amorphous nitrogen-containing carbon film that is applied to a base material and contains nitrogen, and the nitrogen content of the carbon film is 12 to 20 atomic%, and the carbon film has a nitrogen content of 12 to 20 atomic%. The Young rate is 160-250 GPa.
 本開示の窒素含有炭素皮膜製造方法は、基材に施され、窒素を含有した非晶質の炭素皮膜を製造する方法であって、グリッドレスイオンビーム発生装置を用いて窒素イオンビームを基材に照射しながら、フィルタードカソーディック真空アーク法により基材に炭素を蒸着する。 The method for producing a nitrogen-containing carbon film of the present disclosure is a method for producing an amorphous carbon film containing nitrogen by being applied to a base material, and the nitrogen ion beam is used as a base material using a gridless ion beam generator. Carbon is deposited on the substrate by the filtered Casodic vacuum arc method while irradiating the substrate.
 本開示の圧縮機は、水素を含む冷媒を圧縮する圧縮機であって、窒素を含有した非晶質の炭素皮膜が基材に施された摺動部材を備え、摺動部材は、冷媒が存在する雰囲気に配置され、炭素皮膜における窒素含有率が、12~20原子%である。 The compressor of the present disclosure is a compressor that compresses a refrigerant containing hydrogen, and includes a sliding member having a nitrogen-containing amorphous carbon film applied to a base material, and the sliding member is a refrigerant. Arranged in an existing atmosphere, the nitrogen content in the carbon film is 12-20 atomic%.
 本開示の摺動部材は、水素を含む冷媒を圧縮する圧縮機を構成する摺動部材であって、冷媒が存在する雰囲気に配置され、窒素を含有した非晶質の炭素皮膜が基材に施され、炭素皮膜における窒素含有率が、12~20原子%である。 The sliding member of the present disclosure is a sliding member constituting a compressor that compresses a refrigerant containing hydrogen, and is arranged in an atmosphere in which the refrigerant is present, and an amorphous carbon film containing nitrogen is used as a base material. The nitrogen content in the carbon film is 12 to 20 atomic%.
 本開示の摺動部材は、冷媒が存在する雰囲気下で使用される摺動部材であって、窒素を含有した非晶質の炭素皮膜が基材に施され、炭素皮膜における窒素含有率が、12~20原子%である。 The sliding member of the present disclosure is a sliding member used in an atmosphere in which a refrigerant is present, and an amorphous carbon film containing nitrogen is applied to a base material, and the nitrogen content in the carbon film is determined. It is 12 to 20 atomic%.
 本開示の摺動部材の製造方法は、窒素を含有した非晶質の炭素皮膜が施された基材を含み、冷媒が存在する雰囲気下で使用される摺動部材を製造する方法であって、グリッドレスイオンビーム発生装置を用いて、窒素イオンビームを基材に照射しながら、フィルタードカソーディック真空アーク法により基材に炭素を蒸着するステップを含む。 The method for manufacturing a sliding member of the present disclosure is a method for manufacturing a sliding member which contains a base material having an amorphous carbon film containing nitrogen and is used in an atmosphere in which a refrigerant is present. A gridless ion beam generator is used to irradiate the substrate with a nitrogen ion beam while depositing carbon on the substrate by a filtered Casodic vacuum arc method.
 本開示によれば、窒素含有率を12~20原子%にまで増加させた窒素含有非晶質炭素皮膜(以下、CNx膜)を実現することができ、窒素含有率がより小さい場合と比べて炭素皮膜の硬度が低下したとしても、後述する試験結果に基づいて、摩擦を十分に低減することができる。
 加えて、12~20原子%にまで窒素含有率を増加させたことで、CNx膜のヤング率が160~250 GPaにまで低下するため、基材に典型的に用いられる金属材料のヤング率(200 GPa前後)と同等のヤング率がCNx膜に与えられることとなる。そのため、CNx膜の割れや、基材からの剥離を防ぐことができる。
 さらに、本開示のCNx膜が、水素を含有する冷媒雰囲気下で使用されるならば、炭素と水素との結合によりCNx膜の表層に軟質なポリマーライクカーボンが生成されるため、境界潤滑下においても摩擦を低減させることができる。
According to the present disclosure, it is possible to realize a nitrogen-containing amorphous carbon film (hereinafter referred to as CNx film) in which the nitrogen content is increased to 12 to 20 atomic%, as compared with the case where the nitrogen content is smaller. Even if the hardness of the carbon film is reduced, the friction can be sufficiently reduced based on the test results described later.
In addition, by increasing the nitrogen content to 12-20 atomic%, the Young's modulus of the CNx film is reduced to 160-250 GPa, so the Young's modulus of the metal material typically used for the substrate ( A Young's modulus equivalent to (around 200 GPa) will be given to the CNx film. Therefore, it is possible to prevent the CNx film from cracking and peeling from the base material.
Furthermore, if the CNx membrane of the present disclosure is used in a hydrogen-containing refrigerant atmosphere, the combination of carbon and hydrogen produces a soft polymer-like carbon on the surface of the CNx membrane, and thus under boundary lubrication. Can also reduce friction.
実施形態に係る摺動部材の基材の断面模式図である。基材にはCNx膜が施されている。It is sectional drawing of the base material of the sliding member which concerns on embodiment. A CNx film is applied to the base material. 図1に示すCNx膜について、成膜時の窒素流量と、膜の窒素含有率との関係を示すグラフである。It is a graph which shows the relationship between the nitrogen flow rate at the time of film formation, and the nitrogen content of the film about the CNx film shown in FIG. 図1に示すCNx膜について、窒素含有率と、冷媒雰囲気下における摩擦係数とを示すグラフである。It is a graph which shows the nitrogen content and the friction coefficient under the refrigerant atmosphere about the CNx film shown in FIG. 図1に示すCNx膜について、成膜時の窒素流量に対する硬度およびヤング率を示すグラフである。It is a graph which shows the hardness and Young's modulus with respect to the nitrogen flow rate at the time of film formation about the CNx film shown in FIG. 図1に示すCNx膜を製造するための製造装置を示す模式図である。It is a schematic diagram which shows the manufacturing apparatus for manufacturing the CNx film shown in FIG. 図5に示す製造装置に備わるグリッドレスイオンビーム発生装置を示す模式図である。It is a schematic diagram which shows the gridless ion beam generator provided in the manufacturing apparatus shown in FIG. 図6に示すグリッドレスイオンビーム発生装置に備わるアノードを示す平面図である。It is a top view which shows the anode provided in the gridless ion beam generator shown in FIG. 図6に示すグリッドレスイオンビーム発生装置に備わるカソードを示す平面図である。It is a top view which shows the cathode provided in the gridless ion beam generator shown in FIG. 図6に示すグリッドレスイオンビーム発生装置によるプラズマ発生を示す概念図である。It is a conceptual diagram which shows the plasma generation by the gridless ion beam generator shown in FIG. 図6に示すグリッドレスイオンビーム発生装置によるプラズマ照射を示す概念図である。It is a conceptual diagram which shows the plasma irradiation by the gridless ion beam generator shown in FIG. 図6に示すグリッドレスイオンビーム発生装置と対比するため、グリッドを含むイオンビーム発生装置を示す模式図である。It is a schematic diagram which shows the ion beam generator including a grid for comparison with the gridless ion beam generator shown in FIG. グリッドレス/グリッド有のイオンビーム発生装置それぞれの電圧と電流密度との関係を示す模式図である。It is a schematic diagram which shows the relationship between the voltage and the current density of each of the gridless / grid-bearing ion beam generators. CNx膜の製造手順を示す図である。It is a figure which shows the manufacturing procedure of the CNx film. 反射分光法による表面分析結果を示す図である。It is a figure which shows the surface analysis result by the reflection spectroscopy. 反射分光法による表面分析結果を示す図である。It is a figure which shows the surface analysis result by the reflection spectroscopy. 消衰係数kおよび屈折率nから種々の炭素皮膜の表面状態を表す図である。It is a figure which shows the surface state of various carbon films from the extinction coefficient k and the refractive index n. 冷媒ガス雰囲気ドライ条件下におけるCNx膜の摩擦特性を示す図である。It is a figure which shows the friction characteristic of the CNx film under the dry condition of a refrigerant gas atmosphere. 冷媒ガス雰囲気境界潤滑条件下におけるCNx膜の摩擦特性を示す図である。It is a figure which shows the friction characteristic of the CNx film under the refrigerant gas atmosphere boundary lubrication condition. 冷媒を圧縮する圧縮機の一例を示す縦断面図である。It is a vertical cross-sectional view which shows an example of the compressor which compresses a refrigerant. 圧縮機の部分拡大図であり、スラストプレートを示している。It is a partially enlarged view of a compressor and shows a thrust plate. オルダムリンクの斜視図である。It is a perspective view of the Oldham link. 冷媒を圧縮する圧縮機の他の一例を示す縦断面図である。It is a vertical cross-sectional view which shows another example of the compressor which compresses a refrigerant. 図20に示すロータリー圧縮機構を構成するシリンダ、ピストンロータ、およびブレードを示す図である。It is a figure which shows the cylinder, the piston rotor, and the blade which make up the rotary compression mechanism shown in FIG.
 以下、添付図面を参照しながら、本発明の実施形態について説明する。
(基材に施されたCNx膜の特性)
 図1は、本実施形態に係る摺動部材10の基材1の断面を模式的に示している。基材1の表面1A(摺動面)には、窒素を含有した非晶質の炭素皮膜2が施されている。以下、基材1に施された窒素含有非晶質炭素皮膜2のことをCNx膜2と称するものとする。
Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings.
(Characteristics of CNx film applied to the base material)
FIG. 1 schematically shows a cross section of a base material 1 of a sliding member 10 according to the present embodiment. An amorphous carbon film 2 containing nitrogen is applied to the surface 1A (sliding surface) of the base material 1. Hereinafter, the nitrogen-containing amorphous carbon film 2 applied to the base material 1 will be referred to as a CNx film 2.
 基材1は、典型的には金属材料から形成されるが、樹脂やセラミック等の適宜な材料から形成することができる。
 「CNx膜」は、sp3構造に富むta-C(tetrahedralamorphous-Carbon)膜であって、窒素を含有したもの(ta-CNx)に相当するものとする。CNx膜2の厚さTは、例えば、0.1~1μmである。
The base material 1 is typically formed of a metal material, but can be formed of an appropriate material such as resin or ceramic.
The "CNx film" is a ta-C (tetrahedralamorphous-Carbon) film rich in sp3 structure and corresponds to a nitrogen-containing film (ta-CNx). The thickness T of the CNx film 2 is, for example, 0.1 to 1 μm.
 図1の上部に示すように、CNx膜2が基材1に成膜される。その後、摺動部材10が使用されると、摺動部材10と相手部材との摺動によるCNx膜2のせん断により、CNx膜2の表面から窒素が離脱し、離脱した窒素に代わり炭素が炭素と結合することで、図1の下部に示すように、基材1の表層にグラファイトの如き構造を含む構造変化層2Aが形成される。CNx膜2において窒素が維持された硬質層2Bの硬度と比べると、構造変化層2Aの硬度は低い。 As shown in the upper part of FIG. 1, the CNx film 2 is formed on the base material 1. After that, when the sliding member 10 is used, nitrogen is separated from the surface of the CNx film 2 due to the shearing of the CNx film 2 due to the sliding between the sliding member 10 and the mating member, and carbon is replaced with carbon instead of the separated nitrogen. As shown in the lower part of FIG. 1, a structural change layer 2A containing a structure such as graphite is formed on the surface layer of the base material 1. The hardness of the structural change layer 2A is lower than the hardness of the hard layer 2B in which nitrogen is maintained in the CNx film 2.
 窒素を含有するCNx膜2における窒素と炭素との結合は、典型的なDLC(Diamond-Like Carbon)膜における炭素と炭素との結合と比べると結合力に劣るため、冷媒雰囲気下では、冷媒に含まれる水素とCNx膜2の炭素とが結合し易い。冷媒中の水素とCNx膜2の炭素との化学反応が起こることにより、硬質層2Bに対して軟質なポリマーライクカーボン(tribofilm;トライボフィルム)がCNx膜2の表層に生成される。冷媒雰囲気下での使用によりCNx膜2の表層にポリマーライクカーボンが形成されることは、後述するように、反射分光法による表面分析により確認されている。 Since the bond between nitrogen and carbon in the nitrogen-containing CNx film 2 is inferior to the bond between carbon and carbon in a typical DLC (Diamond-Like Carbon) film, it can be used as a refrigerant in a refrigerant atmosphere. The contained hydrogen and the carbon of the CNx film 2 are likely to be bonded. A chemical reaction between hydrogen in the refrigerant and carbon in the CNx film 2 causes a polymer-like carbon (tribo film) that is soft to the hard layer 2B to be formed on the surface layer of the CNx film 2. It has been confirmed by surface analysis by reflection spectroscopy that polymer-like carbon is formed on the surface layer of the CNx film 2 when used in a refrigerant atmosphere.
 冷媒雰囲気において、構造変化層2Aには、窒素の離脱によるグラファイトあるいはそれに類似した構造と、水素と炭素との結合によるポリマーライクカーボンとが混在しうる。CNx膜2における表層に軟質層(構造変化層2A)が形成されると、摺動時のせん断力が低下するため摩擦低減作用が発現する。 In the refrigerant atmosphere, the structural change layer 2A may contain graphite or a similar structure due to the release of nitrogen and polymer-like carbon due to the bond between hydrogen and carbon. When a soft layer (structural change layer 2A) is formed on the surface layer of the CNx film 2, the shearing force during sliding is reduced, so that a friction reducing effect is exhibited.
 CNx膜2における窒素含有率は、図2に示すように、12~20原子%にまで到達する。なお、図3には、14.5原子%と17.4原子%のデータをプロットしている。
 ここで、本明細書における窒素含有非晶質炭素皮膜の窒素含有率は、炭素と窒素との合計が100原子%であるとした場合の窒素の含有率を言うものとする。
 後述するように、グリッドレスタイプのイオンビーム発生装置40を用いて、窒素イオンビームを基材1に照射しながら、フィルタードカソーディック真空アーク(Filtered Cathodic Vacuum Arc; FCVA)法により基材1に炭素を蒸着してCNx膜2を成膜することで、CNx膜2の窒素含有率を12~20原子%にまで増大させることができる。
 CNx膜2の窒素含有率は、グリッドレスイオンビーム発生装置40に導入される窒素ガスの流量を設定することにより調整することができる。窒素ガスの流量が多いほど、窒素分圧が増加するため、窒素含有率を多くすることができる。
The nitrogen content in CNx Membrane 2 reaches up to 12-20 atomic%, as shown in FIG. Note that FIG. 3 plots the data of 14.5 atomic% and 17.4 atomic%.
Here, the nitrogen content of the nitrogen-containing amorphous carbon film in the present specification refers to the nitrogen content when the total of carbon and nitrogen is 100 atomic%.
As will be described later, a gridless type ion beam generator 40 is used to irradiate the base material 1 with a nitrogen ion beam, and the base material 1 is subjected to a filtered Cathodic Vacuum Arc (FCVA) method. By depositing carbon to form the CNx film 2, the nitrogen content of the CNx film 2 can be increased to 12 to 20 atomic%.
The nitrogen content of the CNx membrane 2 can be adjusted by setting the flow rate of the nitrogen gas introduced into the gridless ion beam generator 40. As the flow rate of nitrogen gas increases, the partial pressure of nitrogen increases, so that the nitrogen content can be increased.
 リングオンディスク摩擦摩耗試験の結果から図3に摩擦係数を示すように、CNx膜2は、特に、冷媒が存在する雰囲気下で使用された際に、摺動部材10と相手部材との摩擦を十分に低減させることができる。
 なお、図15および図16に示すデータも、リングオンディスク摩擦摩耗試験により得られたものである。
 本明細書における「冷媒」は、HFC(Hydro Fluoro Carbon)系の冷媒、HFO(Hydro FluoroOlefin)系の冷媒、アンモニア、および炭化水素系冷媒等の水素を含む気相および液相の冷媒を言うものとする。冷媒が潤滑油に溶解していたり、冷媒ガス中に潤滑油が混入していたりしてもよい。
As shown in FIG. 3 from the results of the ring-on-disk friction and wear test, the CNx film 2 causes friction between the sliding member 10 and the mating member, especially when used in an atmosphere in which a refrigerant is present. It can be sufficiently reduced.
The data shown in FIGS. 15 and 16 were also obtained by the ring-on-disk friction and wear test.
As used herein, the term "refrigerant" refers to a gas-phase or liquid-phase refrigerant containing hydrogen such as an HFC (Hydro Fluoro Carbon) -based refrigerant, an HFO (Hydro FluoroOlefin) -based refrigerant, ammonia, and a hydrocarbon-based refrigerant. And. The refrigerant may be dissolved in the lubricating oil, or the lubricating oil may be mixed in the refrigerant gas.
 図3に、冷媒ガス中に潤滑油が混在した雰囲気におけるCNx膜2の摩擦係数を矩形(■)のプロットで示し、潤滑油が混在しないドライ条件の冷媒ガス雰囲気におけるCNx膜2の摩擦係数を菱形(◆)のプロットで示している。図3に菱形で示す2つのプロットは、それぞれ、後述する実施例2,3(図15)に対応している。図3に示す矩形のプロットは、後述する実施例4(図16)に対応しており、ポリオールエステル(POE)系の潤滑油が冷媒ガスに混在した雰囲気に関する。図3に示すデータに関し、基材1の材質は、SUJ2(JIS G 4805:2008 高炭素クロム軸受鋼鋼材)である。
 ドライ条件の冷媒ガス雰囲気であっても、潤滑油が混在した冷媒ガス雰囲気であっても、CNx膜2は、0.04以下の低い摩擦係数を示す。
FIG. 3 shows the friction coefficient of the CNx film 2 in a rectangular (■) plot in an atmosphere in which lubricating oil is mixed in the refrigerant gas, and shows the friction coefficient of the CNx film 2 in a refrigerant gas atmosphere in a dry condition in which the lubricating oil is not mixed. It is shown in a diamond-shaped (◆) plot. The two plots shown in diamonds in FIG. 3 correspond to Examples 2 and 3 (FIG. 15) described later, respectively. The rectangular plot shown in FIG. 3 corresponds to Example 4 (FIG. 16) described later, and relates to an atmosphere in which a polyol ester (POE) -based lubricating oil is mixed with the refrigerant gas. Regarding the data shown in FIG. 3, the material of the base material 1 is SUJ2 (JIS G 4805: 2008 high carbon chrome bearing steel).
The CNx film 2 exhibits a low coefficient of friction of 0.04 or less regardless of whether the refrigerant gas atmosphere is dry or the refrigerant gas atmosphere is mixed with lubricating oil.
 窒素含有率の増加に伴い、CNx膜2の硬度およびヤング率は低下する。図4に示すグラフの横軸は、後述するグリッドレスイオンビーム発生装置40に導入される窒素ガスの流量を表している。SCCM(Standard Cubic Centimeter per Minute)は、一定の温度・圧力下(標準条件)における体積流量である。
 図4には、CNx膜2の硬度が実線で示され、CNx膜2のヤング率が破線で示されている。5~40 SCCMの範囲に対して、CNx膜2の硬度は18~25GPaであり、CNx膜2のヤング率は160~250 GPaである。5 SCCMは、窒素含有率が14.5原子%であることに相当し、40 SCCMは、窒素含有率が17.4原子%であることに相当する。
As the nitrogen content increases, the hardness and Young's modulus of the CNx film 2 decrease. The horizontal axis of the graph shown in FIG. 4 represents the flow rate of nitrogen gas introduced into the gridless ion beam generator 40 described later. SCCM (Standard Cubic Centimeter per Minute) is a volumetric flow rate under constant temperature and pressure (standard conditions).
In FIG. 4, the hardness of the CNx film 2 is shown by a solid line, and the Young's modulus of the CNx film 2 is shown by a broken line. For the range of 5 to 40 SCCM, the hardness of CNx film 2 is 18 to 25 GPa, and the Young's modulus of CNx film 2 is 160 to 250 GPa. 5 SCCM corresponds to a nitrogen content of 14.5 atomic% and 40 SCCM corresponds to a nitrogen content of 17.4 atomic%.
 窒素含有率を12~20原子%にまで増加させたCNx膜2は、グリッドレスのイオンビーム発生装置40を用いることで実現可能となるから、それよりも小さい窒素含有率に留まる場合は、グリッドを含むイオンビーム発生装置が使用されているとみなせる。グリッドを含むイオンビーム発生装置を使用して成膜されたCNx膜の窒素含有率は小さく、硬度は高い。そうした観点から、上述した特許文献1(特許第6298019号)では、グリッドを含むイオンビーム照射装置が使用されている。特許文献1には、窒素含有非晶質炭素皮膜の窒素含有率が2~11%であること、その硬度が25~80 GPaであることが開示されている。 The CNx membrane 2 with the nitrogen content increased to 12 to 20 atomic% can be realized by using the gridless ion beam generator 40. Therefore, if the nitrogen content is smaller than that, the grid can be used. It can be considered that an ion beam generator containing the above is used. The CNx film formed using an ion beam generator containing a grid has a low nitrogen content and a high hardness. From such a viewpoint, in the above-mentioned Patent Document 1 (Patent No. 6298019), an ion beam irradiation device including a grid is used. Patent Document 1 discloses that the nitrogen content of the nitrogen-containing amorphous carbon film is 2 to 11%, and the hardness thereof is 25 to 80 GPa.
(CNx膜の製造)
 基材1に施されたCNx膜2を製造するために、図5に示す製造装置3を用いる。製造装置3は、FCVA成膜装置30に、グリッドレスタイプのイオンビーム発生装置40を複合させたものであり、炭素と窒素とを基材1に供給することで、CNx膜2を基材1に成膜する。
(Manufacturing of CNx film)
In order to manufacture the CNx film 2 applied to the base material 1, the manufacturing apparatus 3 shown in FIG. 5 is used. The manufacturing apparatus 3 is a combination of the FCVA film forming apparatus 30 and the gridless type ion beam generator 40, and by supplying carbon and nitrogen to the substrate 1, the CNx film 2 is attached to the substrate 1. To form a film.
 FCVA成膜装置30は、真空アーク放電発生部31と、フィルター部32と、ドロップレット捕集部33と、基材1が配置される真空チャンバ34とを備えている。
 真空アーク放電発生部31は、トリガー311による起爆により、炭素供給源としてのグラファイトターゲット等のカーボンターゲット312(カソード)に真空アーク放電を生成し、アーク放電により炭素プラズマを発生させる。
 フィルター部32は、複数のソレノイドコイル321を含み、電磁気的なフィルターとして機能する。カーボンターゲット312から、ドロップレット捕集部33に向けて進むドロップレットに対して、フィルター部32は、イオン化した炭素を基材1が配置された真空チャンバ34に向けて偏向させる。図5に示す例では、ドロップレットの進路に対してフィルター部32のダクト322が直交してT字をなしているが、これに限らず、例えばY字をなしていてもよい。
 フィルター部32により、0.1~数μm程度のドロップレットに対して微細な炭素粒子が抽出されて真空チャンバ34内の基材1に堆積する。
The FCVA film forming apparatus 30 includes a vacuum arc discharge generating unit 31, a filter unit 32, a droplet collecting unit 33, and a vacuum chamber 34 in which the base material 1 is arranged.
The vacuum arc discharge generation unit 31 generates a vacuum arc discharge at a carbon target 312 (cathode) such as a graphite target as a carbon supply source by detonation by the trigger 311 and generates carbon plasma by the arc discharge.
The filter unit 32 includes a plurality of solenoid coils 321 and functions as an electromagnetic filter. The filter unit 32 deflects the ionized carbon toward the vacuum chamber 34 in which the base material 1 is arranged with respect to the droplet traveling from the carbon target 312 toward the droplet collecting unit 33. In the example shown in FIG. 5, the duct 322 of the filter unit 32 is orthogonal to the path of the droplet and forms a T-shape, but the present invention is not limited to this, and for example, a Y-shape may be formed.
The filter unit 32 extracts fine carbon particles for droplets of about 0.1 to several μm and deposits them on the base material 1 in the vacuum chamber 34.
 グリッドレスイオンビーム発生装置40は、窒素ガスをイオン化させるとともに窒素イオンビームを基材1に向けて照射する。図示しない窒素源からグリッドレスイオンビーム発生装置40に導入される窒素ガスの流量が、基材1に成膜されるCNx膜2の所定の窒素含有率に応じて適切に設定される。
 グリッドレスイオンビーム発生装置40は、図6に示すように、グリッド電極を備えていない。グリッドレスイオンビーム発生装置40は、アノード41およびカソード42(42A,42B)と、永久磁石43とを備えている。図7Aにアノード41を示し、図7Bにカソード42を示しているように、アノード41とカソード42とは、紙面に直交する方向(イオンビームの照射方向)において互いに近接して配置されている。図6、図7Aおよび図7Bに示す例によれば、環状に形成されたアノード41の周りに永久磁石43が配置され、平面視において、アノード41の周りにカソード42Aが配置され、アノード41の内側にカソード42Bが配置されている。
 アノード41およびカソード42間に電圧が印加されると、図8Aに示すように、真空チャンバ34に導入された窒素ガスにプラズマが発生して窒素ガスがイオン化され、図8Bに示すように、窒素イオンが窒素イオンビームとしてカソード42A,42Bの間の出口45(図6、図7B)から真空チャンバ34(図5)内の基材1へと照射される。図8Aに示すプラズマ発生の作用と、図8Bに示すプラズマ照射の作用とは、アノード41およびカソード42が配置されている場所で同時に起こる。
The gridless ion beam generator 40 ionizes the nitrogen gas and irradiates the nitrogen ion beam toward the base material 1. The flow rate of nitrogen gas introduced into the gridless ion beam generator 40 from a nitrogen source (not shown) is appropriately set according to a predetermined nitrogen content of the CNx film 2 formed on the substrate 1.
As shown in FIG. 6, the gridless ion beam generator 40 does not include a grid electrode. The gridless ion beam generator 40 includes an anode 41, a cathode 42 (42A, 42B), and a permanent magnet 43. As the anode 41 is shown in FIG. 7A and the cathode 42 is shown in FIG. 7B, the anode 41 and the cathode 42 are arranged close to each other in the direction orthogonal to the paper surface (the irradiation direction of the ion beam). According to the examples shown in FIGS. 6, 7A and 7B, a permanent magnet 43 is arranged around the anode 41 formed in an annular shape, and in a plan view, the cathode 42A is arranged around the anode 41, and the anode 41 is arranged. The cathode 42B is arranged inside.
When a voltage is applied between the anode 41 and the cathode 42, as shown in FIG. 8A, plasma is generated in the nitrogen gas introduced into the vacuum chamber 34 to ionize the nitrogen gas, and as shown in FIG. 8B, nitrogen is generated. Ions are irradiated as a nitrogen ion beam from the outlet 45 (FIGS. 6 and 7B) between the cathodes 42A and 42B to the substrate 1 in the vacuum chamber 34 (FIG. 5). The action of plasma generation shown in FIG. 8A and the action of plasma irradiation shown in FIG. 8B occur simultaneously at the place where the anode 41 and the cathode 42 are arranged.
 本実施形態では、基材1に向けて真空チャンバ34に炭素粒子が供給される方向と、基材1に向けて窒素イオンビームが照射される方向とが交差(図5に示す例では直交)している。真空チャンバ34内におけるホルダ341の回転に伴い、ホルダ341に設置されている複数の基材1がホルダ341の回転軸を中心に移動することで、複数の基材1のそれぞれに対して炭素粒子と窒素イオンビームとが交互に供給される。
 但し、グリッドレスイオンビーム発生装置40の部材の位置と、FCVA成膜装置30の部材の位置とが干渉しない場合など、基材1に向けて炭素粒子が供給される方向と、基材1に向けて窒素イオンビームが照射される方向とが必ずしも交差している必要はない。基材1に向けて炭素粒子が供給される方向と同じ方向から、基材1に向けて窒素イオンビームが照射されるようにしてもよい。この場合は、同一の基材1に対して炭素粒子と窒素イオンビームとが同時に供給される。
 本実施形態では、回転可能なホルダ341に設置された複数の基材1に対して一度に成膜処理を行うことができる。但し、単一の基材1に対して成膜処理を行うようにしてもよい。
In the present embodiment, the direction in which the carbon particles are supplied to the vacuum chamber 34 toward the base material 1 and the direction in which the nitrogen ion beam is irradiated toward the base material 1 intersect (orthogonal in the example shown in FIG. 5). are doing. As the holder 341 rotates in the vacuum chamber 34, the plurality of base materials 1 installed in the holder 341 move around the rotation axis of the holder 341, so that carbon particles are formed with respect to each of the plurality of base materials 1. And the nitrogen ion beam are supplied alternately.
However, when the position of the member of the gridless ion beam generator 40 and the position of the member of the FCVA film forming apparatus 30 do not interfere with each other, the direction in which the carbon particles are supplied toward the base material 1 and the base material 1 It does not necessarily have to intersect the direction in which the nitrogen ion beam is irradiated. The nitrogen ion beam may be irradiated toward the base material 1 from the same direction in which the carbon particles are supplied toward the base material 1. In this case, the carbon particles and the nitrogen ion beam are simultaneously supplied to the same base material 1.
In the present embodiment, the film formation process can be performed on a plurality of base materials 1 installed on the rotatable holder 341 at one time. However, the film forming process may be performed on a single base material 1.
 グリッドレスイオンビーム発生装置40と対比するため、図9に、グリッドタイプのイオンビーム発生装置70を示す。グリッドタイプであり、マイクロ波方式であるイオンビーム発生装置70は、マイクロ波源71、放電管72、イグナイタ73(点火器)、永久磁石75、および放電管72の出口に設けられたグリッド74等を備えている。放電管72に導入される窒素ガスは、マイクロ波源71から発せられて放電管72に導入されたマイクロ波のエネルギーによりイオン化され、電圧が印加される複数の多孔質の電極を含むグリッド74により加速されて窒素イオンビームとして真空チャンバ34(図5)内の基材1へと照射される。
 グリッド74は、所定間隔をおいて積層される例えば3つの電極を含んでいる。グリッド74によるプラズマ発生およびプラズマ照射のそれぞれの機能は、これらの電極間に分かれている。
 一方、グリッドレスイオンビーム発生装置40では、アノード41およびカソード42が近接して配置されているため、プラズマ発生およびプラズマ照射が同時に行われる。
In order to compare with the gridless ion beam generator 40, FIG. 9 shows a grid type ion beam generator 70. The grid-type and microwave-type ion beam generator 70 includes a microwave source 71, a discharge tube 72, an igniter 73 (igniter), a permanent magnet 75, a grid 74 provided at the outlet of the discharge tube 72, and the like. I have. The nitrogen gas introduced into the discharge tube 72 is ionized by the energy of the microwave emitted from the microwave source 71 and introduced into the discharge tube 72, and accelerated by the grid 74 including a plurality of porous electrodes to which a voltage is applied. Then, it is irradiated to the base material 1 in the vacuum chamber 34 (FIG. 5) as a nitrogen ion beam.
The grid 74 includes, for example, three electrodes stacked at predetermined intervals. The functions of plasma generation and plasma irradiation by the grid 74 are separated between these electrodes.
On the other hand, in the gridless ion beam generator 40, since the anode 41 and the cathode 42 are arranged close to each other, plasma generation and plasma irradiation are performed at the same time.
 図10に、グリッドレスイオンビーム発生装置40により発せられるイオンビームの電圧に対する電流密度を実線で示し、グリッド74を備えたイオンビーム発生装置70により照射されるイオンビームの電圧に対する電流密度を破線で示す。図10より、グリッドレスイオンビーム発生装置40の方が、グリッドタイプのイオンビーム発生装置70と比べて、イオンビームのエネルギー幅が広い。電流密度が同一であるとした場合に、グリッドレスイオンビーム発生装置40は、グリッドタイプのイオンビーム発生装置70と比べて多くの電流を流せるため(電流値が高い)、高出力である。グリッドタイプイオンビーム発生装置70における設定値は、一例として、3k V、0.33 A、100 Wであるところ、グリッドレスイオンビーム発生装置40における設定値は、一例として、2k V、1 A、1200 Wである。ここでいう設定値は、後述する表1の成膜時の窒素イオンビーム照射に際しての放電電流に対応している。当該設定値は、各装置の上限値に相当する。
 その結果、グリッドレスイオンビーム発生装置40を使用することで、12~20原子%もの窒素含有率が実現する。グリッドタイプのイオンビーム発生装置70を使用した場合は、窒素含有非晶質炭素皮膜に実現可能な窒素含有率が11原子%程度に留まる。
In FIG. 10, the current density with respect to the voltage of the ion beam emitted by the gridless ion beam generator 40 is shown by a solid line, and the current density with respect to the voltage of the ion beam irradiated by the ion beam generator 70 provided with the grid 74 is shown by a broken line. Shown. From FIG. 10, the gridless ion beam generator 40 has a wider energy width of the ion beam than the grid type ion beam generator 70. Assuming that the current densities are the same, the gridless ion beam generator 40 can flow a larger amount of current (higher current value) than the grid type ion beam generator 70, and therefore has a high output. The set values in the grid type ion beam generator 70 are 3 k V, 0.33 A, 100 W as an example, while the set values in the gridless ion beam generator 40 are 2 k V, 1 A, 1200 W as an example. Is. The set value referred to here corresponds to the discharge current at the time of irradiating the nitrogen ion beam at the time of film formation in Table 1 described later. The set value corresponds to the upper limit value of each device.
As a result, by using the gridless ion beam generator 40, a nitrogen content of 12 to 20 atomic% can be realized. When the grid type ion beam generator 70 is used, the nitrogen content that can be realized in the nitrogen-containing amorphous carbon film remains at about 11 atomic%.
 グリッドレスイオンビーム発生装置40を用いて窒素イオンビームを基材1に照射しながら、FCVA成膜装置30を用いたFCVA法により炭素粒子を基材1に供給することで、基材1に例えば0.5 μm程度の厚さのCNx膜2を成膜することができる。 By irradiating the base material 1 with a nitrogen ion beam using the gridless ion beam generator 40 and supplying carbon particles to the base material 1 by the FCVA method using the FCVA film forming device 30, for example, the base material 1 is supplied with carbon particles. A CNx film 2 having a thickness of about 0.5 μm can be formed.
(成膜例)
 次に、上述の製造装置3を用いて、基材1にCNx膜2を成膜する手順の一例を説明する。
 CNx膜2の品質を向上させるため、図11に示すように、成膜ステップS5を行う前に、カーボンターゲット312の清浄化(ステップS3)、および基材1の清浄化(ステップS1,S4)を行うことが好ましい。
(Example of film formation)
Next, an example of a procedure for forming the CNx film 2 on the base material 1 using the above-mentioned manufacturing apparatus 3 will be described.
In order to improve the quality of the CNx film 2, as shown in FIG. 11, the carbon target 312 is cleaned (step S3) and the base material 1 is cleaned (steps S1 and S4) before the film forming step S5 is performed. Is preferable.
 事前準備として、基材1をベンゼンおよびアセトンのそれぞれに浸漬して、例えば15分間に亘り超音波洗浄を行う(ステップS1)。
 超音波洗浄を終えた基材1を真空チャンバ34内のホルダ341に設置し、真空チャンバ34の内部を例えば4×10-4 Pa以下になるまで真空引きする(ステップS2)。
As a preliminary preparation, the base material 1 is immersed in each of benzene and acetone, and ultrasonic cleaning is performed for, for example, 15 minutes (step S1).
The base material 1 that has been ultrasonically cleaned is placed in the holder 341 in the vacuum chamber 34, and the inside of the vacuum chamber 34 is evacuated until, for example, 4 × 10 -4 Pa or less (step S2).
 カーボンターゲット312の表面における不純物や酸化物を除去するため、FCVA成膜装置30によりカーボンターゲット312にアーク放電を発生させることでカーボンターゲット312の表面を例えば2分間クリーニングする(ステップS3)。このとき、一部のソレノイドコイル321のみ(例えば、図5の321A~321D)が使用され、残りのソレノイドコイル321は使用されない。そのため、炭素粒子が真空チャンバ34内の基材1に向けて偏向されないで、カーボンターゲット312からドロップレット捕集部33へと直進する。 In order to remove impurities and oxides on the surface of the carbon target 312, the surface of the carbon target 312 is cleaned for, for example, 2 minutes by generating an arc discharge in the carbon target 312 by the FCVA film forming apparatus 30 (step S3). At this time, only a part of the solenoid coils 321 (for example, 321A to 321D in FIG. 5) are used, and the remaining solenoid coils 321 are not used. Therefore, the carbon particles are not deflected toward the base material 1 in the vacuum chamber 34, and go straight from the carbon target 312 to the droplet collecting portion 33.
 グリッドレスイオンビーム発生装置40により、基材1のクリーニングを行う(ステップS4)。このときは、成膜時に導入される窒素ガスに代えて、図示しないアルゴンガス源からアルゴンガスがグリッドレスイオンビーム発生装置40に導入される。ホルダ341を例えば4 rpmで回転させながら、グリッドレスイオンビーム発生装置40によりアルゴンガスから生成されたアルゴンイオンビームを基材1に向けて例えば20分間に亘り照射することにより、基材1の表面の不純物や酸化物が除去されて清浄化される。このとき基材1にアルゴンは残存しない。 The base material 1 is cleaned by the gridless ion beam generator 40 (step S4). At this time, instead of the nitrogen gas introduced at the time of film formation, argon gas is introduced into the gridless ion beam generator 40 from an argon gas source (not shown). While rotating the holder 341 at, for example, 4 rpm, the surface of the base material 1 is irradiated with an argon ion beam generated from argon gas by the gridless ion beam generator 40 toward the base material 1 for, for example, 20 minutes. Impurities and oxides are removed and cleaned. At this time, argon does not remain on the base material 1.
 以上のステップS1~S4により基材1およびカーボンターゲット312のそれぞれの清浄化が完了する。なお、基材1およびカーボンターゲット312のそれぞれの清浄化が適切に行われるならば、必ずしも上記の手順には限定されない。 Purification of the base material 1 and the carbon target 312 is completed by the above steps S1 to S4. If the base material 1 and the carbon target 312 are properly cleaned, the procedure is not necessarily limited to the above procedure.
 次に、真空チャンバ34内でホルダ341を例えば4 rpmで回転させながら、基材1にCNx膜2を成膜する(ステップS5)。
 このとき、ホルダ341を例えば4 rpmで回転させながら、グリッドレスイオンビーム発生装置40に導入される窒素ガスから生成された窒素イオンビームと、FCVA成膜装置30によりドロップレットの進路に対して偏向した微細な炭素粒子との両方が、例えば20分間に亘り、基材1に供給されることで、厚さが0.5μm程度のCNx膜2が基材1に施される。
 窒素イオンビームの照射および炭素粒子の供給は、基材1の温度上昇を抑えるため、基材1を放熱させる時間として10秒程度の休止時間を挟みながら間欠的に行われてもよい。
Next, the CNx film 2 is formed on the base material 1 while rotating the holder 341 in the vacuum chamber 34 at, for example, 4 rpm (step S5).
At this time, while rotating the holder 341 at, for example, 4 rpm, the nitrogen ion beam generated from the nitrogen gas introduced into the gridless ion beam generator 40 and the FCVA film forming apparatus 30 deflect the holder 341 with respect to the path of the droplet. By supplying both of the fine carbon particles to the base material 1 for, for example, 20 minutes, a CNx film 2 having a thickness of about 0.5 μm is applied to the base material 1.
In order to suppress the temperature rise of the base material 1, the irradiation of the nitrogen ion beam and the supply of carbon particles may be performed intermittently with a rest time of about 10 seconds as the time for dissipating heat from the base material 1.
 成膜を終えたならば、真空チャンバ34内で基材1を冷却する。その後、基材1を製造装置3から取り出す(ステップS6)。 After the film formation is completed, the base material 1 is cooled in the vacuum chamber 34. Then, the base material 1 is taken out from the manufacturing apparatus 3 (step S6).
 下記の表に、CNx膜2の成膜条件の一例を示す。

 
Figure JPOXMLDOC01-appb-T000001
 
The table below shows an example of the film formation conditions for the CNx film 2.


Figure JPOXMLDOC01-appb-T000001
 以上で説明したCNx膜2の成膜工程により、窒素を含有した緻密なCNx膜2が基材1の表面に均一に成膜される。こうした成膜工程を経て、CNx膜2が施された基材1を備えた摺動部材10が製造される。基材1に成膜されたCNx膜2は、上述したように窒素含有率が12~20%に到達し、上述した硬度およびヤング率を備えている。 By the film formation step of the CNx film 2 described above, a dense CNx film 2 containing nitrogen is uniformly formed on the surface of the base material 1. Through such a film forming step, the sliding member 10 provided with the base material 1 coated with the CNx film 2 is manufactured. The CNx film 2 formed on the base material 1 has a nitrogen content of 12 to 20% as described above, and has the hardness and Young's modulus described above.
(冷媒雰囲気下での使用によるCNx膜の表面状態の変化)
 摺動部材10の基材1に成膜されたCNx膜2は、摺動部材10の相手の部材の表面と摺動することで、表面の状態が変化する。
 ここで、冷媒雰囲気下で摺動部材10が使用されると、CNx膜2からの窒素の離脱に伴い、CNx膜2の表層がグラファイト様の構造へと変化することに代えて、あるいは、それと並行して、冷媒に含まれる水素とCNx膜2の炭素とが結合することで、CNx膜2の表層にポリマーライクカーボンが形成される。このことが、図12および図13に示すように、反射分光法による表面分析結果により確認されている。
(Changes in surface condition of CNx film due to use in refrigerant atmosphere)
The CNx film 2 formed on the base material 1 of the sliding member 10 slides on the surface of the mating member of the sliding member 10, so that the state of the surface changes.
Here, when the sliding member 10 is used in a refrigerant atmosphere, the surface layer of the CNx film 2 changes to a graphite-like structure with the release of nitrogen from the CNx film 2, or instead of that. At the same time, the hydrogen contained in the refrigerant and the carbon of the CNx film 2 are bonded to form a polymer-like carbon on the surface layer of the CNx film 2. This is confirmed by the results of surface analysis by reflection spectroscopy, as shown in FIGS. 12 and 13.
 ここで、反射分光法は、薄膜が施されている試験片に対して所定の波長の光を照射したときの絶対反射率スペクトルを測定し、絶対反射率スペクトルの測定値と、入射光の多重反射が考慮された光学モデルから算出した絶対反射率スペクトルとをフィッティングさせることで薄膜の厚さや光学定数を測定する手法である。
 本手法における絶対反射率Rは、以下の式(1)で表される。絶対反射率Rは光波長に依存する。
Here, in the reflection spectroscopy method, the absolute reflectance spectrum when a test piece coated with a thin film is irradiated with light of a predetermined wavelength is measured, and the measured value of the absolute reflectance spectrum and the multiplexing of the incident light are multiplexed. This is a method of measuring the thickness and optical constant of a thin film by fitting it with the absolute reflectance spectrum calculated from an optical model that takes reflection into consideration.
The absolute reflectance R in this method is expressed by the following equation (1). Absolute reflectance R depends on the wavelength of light.
Figure JPOXMLDOC01-appb-M000002
Figure JPOXMLDOC01-appb-M000002
  Ii:単位時間あたりの入射光強度
  Ir:単位時間あたりの反射光強度
I i: incident light intensity per unit time I r: reflected light intensity per unit time
 光学モデルから絶対反射率を計算する。空気中で1層の薄膜に光が入射角θ0で入射したときの絶対反射率Rを下記に示す。 Calculate the absolute reflectance from the optical model. The absolute reflectance R when light is incident on a single-layer thin film in air at an incident angle θ 0 is shown below.
Figure JPOXMLDOC01-appb-M000003
  
Figure JPOXMLDOC01-appb-M000003
  
  d1:薄膜の厚さ
  λ:光波長
  n:屈折率
  k:消衰係数
  θ0:光の入射角
  θ1:薄膜への透過角
  θ2:基材への透過角
  上記θ0,θ1,θ2について、添字の0,1,2で示される材料はそれぞれ空気、薄膜、基材を示す。
d 1 : Thin film thickness λ: Light wavelength n: Refractive index k: Extinction coefficient θ 0 : Light incident angle θ 1 : Light transmission angle θ 2 : Transmission angle to base material θ 0 , θ 1 For , θ 2 , the materials indicated by the subscripts 0, 1, 2 indicate air, thin film, and base material, respectively.
 ta-Cやa-C等の種々の炭素皮膜のそれぞれの表面状態は、消衰係数kおよび屈折率nから、図14に示すように表されることが知られている。屈折率nが小さくなるほど、柔らかくなる。「Graphite film」は、層状のグラファイトのような表面状態に相当し、「PolymerLike Carbon」は、水素と炭素との結合により軟質化したポリマー様の表面状態に相当する。これらGraphitefilmおよびPolymer Like Carbonは、ta-C等の他の炭素皮膜と比べて柔らかい。なお、図14の「a-C:H」は、水素を含有あるいは水素と結合した炭素皮膜を意味する。 It is known that the surface states of various carbon films such as ta-C and a-C are represented as shown in FIG. 14 from the extinction coefficient k and the refractive index n. The smaller the refractive index n, the softer it becomes. "Graphite film" corresponds to a layered graphite-like surface state, and "PolymerLike Carbon" corresponds to a polymer-like surface state softened by a bond between hydrogen and carbon. These Graphite film and Polymer Like Carbon are softer than other carbon films such as ta-C. In addition, "a-C: H" in FIG. 14 means a carbon film containing or bonded to hydrogen.
 図12には、550nmの波長の光を用いた反射分光法による分析から、図14に示す種々の炭素皮膜のデータを凡例に従いプロットするとともに、同じく反射分光法による分析から、冷媒雰囲気下における相手部材との摩擦に供されたことのないCNx膜2のデータを白い丸(○)によりプロットし(A1,A2,A3,A4)、かつ、ドライ条件での冷媒雰囲気下における摩擦に供された後のCNx膜2のデータを黒い丸(●)によりプロットしている(B2,B3)。図12における横軸は屈折率nであり、縦軸は消衰係数kである。 In FIG. 12, the data of various carbon films shown in FIG. 14 are plotted according to the legend from the analysis by reflection spectroscopy using light having a wavelength of 550 nm, and also from the analysis by reflection spectroscopy, the partner in the refrigerant atmosphere. The data of the CNx film 2 that has not been subjected to friction with the member is plotted by white circles (○) (A1, A2, A3, A4) and subjected to friction in a refrigerant atmosphere under dry conditions. The data of the CNx film 2 after that is plotted by black circles (●) (B2, B3). In FIG. 12, the horizontal axis is the refractive index n, and the vertical axis is the extinction coefficient k.
 摩擦前に対応する白丸のプロットA1,A2,A3,A4を円形Aで囲み、摩擦後に対応する黒丸のプロットB2,B3を円形Bで囲んでいる。プロットB2,B3はそれぞれ、後述する実施例2,3(図15)に対応している。
 図12より、冷媒雰囲気下で摺動部材10が相手部材と摺動することで、CNx膜2の表面状態が、円形Aで囲まれた範囲から、円形Bで囲まれた範囲へと変化することがわかる。円形Bの範囲は、図14に示すPolymer Like Carbonに対応しているから、冷媒雰囲気下での摩擦によって、CNx膜2の表層が、ポリマーライクカーボン(tribofilm)に変化したものと考えられる。
The corresponding white circle plots A1, A2, A3 and A4 before friction are surrounded by a circle A, and the corresponding black circle plots B2 and B3 after friction are surrounded by a circle B. Plots B2 and B3 correspond to Examples 2 and 3 (FIG. 15) described later, respectively.
From FIG. 12, when the sliding member 10 slides with the mating member in a refrigerant atmosphere, the surface state of the CNx film 2 changes from the range surrounded by the circle A to the range surrounded by the circle B. You can see that. Since the range of the circle B corresponds to the Polymer Like Carbon shown in FIG. 14, it is considered that the surface layer of the CNx film 2 is changed to a polymer-like carbon (tribofilm) by friction in a refrigerant atmosphere.
 また、図13には、550nmの波長の光を用いた反射分光法による分析から、境界潤滑条件での冷媒雰囲気下における摩擦に供された後のCNx膜2のデータを黒い丸(●)によりプロットしている(C1,C2,C3)。プロットC1~C3はそれぞれ、後述する実施例7,4,6(図16)に対応している。プロットC1~C3は、図14に示すGraphite filmおよびPolymer Like Carbonに対応しているから、冷媒雰囲気下での摩擦によって、CNx膜2の表層が、グラファイト様の構造、あるいはポリマーライクカーボン(tribofilm)に変化したものと考えられる。 Further, in FIG. 13, the data of the CNx film 2 after being subjected to friction under the refrigerant atmosphere under the boundary lubrication condition from the analysis by reflection spectroscopy using light having a wavelength of 550 nm is shown by black circles (●). It is plotted (C1, C2, C3). Plots C1 to C3 correspond to Examples 7, 4 and 6 (FIG. 16) described later, respectively. Since plots C1 to C3 correspond to Graphite film and Polymer Like Carbon shown in FIG. 14, the surface layer of CNx film 2 has a graphite-like structure or polymer-like carbon due to friction in a refrigerant atmosphere. It is probable that it changed to.
(冷媒雰囲気下におけるCNx膜の摩擦特性)
 以下に、新たな知見として、冷媒雰囲気下においてCNx膜が低摩擦を示すことを開示する。
 リングオンディスク摩擦摩耗試験による測定結果を示す図15および図16を参照し、主に、冷媒ガス雰囲気下におけるCNx膜の摩擦特性を説明する。
 図15に示す実施例1は、潤滑油が使用されない、ドライ条件での窒素ガス雰囲気下(非冷媒雰囲気下)におけるCNx膜2の摩擦係数を示している。
 実施例2,3は、潤滑油が使用されない、ドライ条件でのR32冷媒ガス雰囲気下におけるCNx膜2の摩擦係数を示している。
 実施例1~3のいずれも、SUSJ2の基材1に、上述のようにグリッドレスイオンビーム発生装置40を用いて窒素イオンビームを照射しつつ、FCVA法により炭素粒子を供給することでCNx膜2を施したものである。比較例1は、CNx膜2が施されていないSUSJ2の基材1のR32冷媒ガス雰囲気下における摩擦係数を示している。
 CNx膜2の成膜時の窒素ガス流量は、実施例1では15 SCCMであり、実施例2,3では40 SCCMである。40 SCCMは、窒素含有率17.4原子%に相当する。
 実施例1~3および比較例1のいずれでも、雰囲気ガスの圧力は0.3MPaであった。
 比較例1の摩擦係数が0.34であるのに対し、実施例1~3の摩擦係数は0.02程度であるため、実施例1~3によれば、コーティングが施されていない比較例1に対し、境界潤滑下においても摩擦を十分に低減させることができる。
(Friction characteristics of CNx film in a refrigerant atmosphere)
Below, as a new finding, we disclose that the CNx film exhibits low friction in a refrigerant atmosphere.
The friction characteristics of the CNx film in a refrigerant gas atmosphere will be mainly described with reference to FIGS. 15 and 16 showing the measurement results by the ring-on-disk friction and wear test.
Example 1 shown in FIG. 15 shows the friction coefficient of the CNx film 2 under a nitrogen gas atmosphere (under a non-refrigerant atmosphere) under dry conditions where no lubricating oil is used.
Examples 2 and 3 show the coefficient of friction of the CNx film 2 under the R32 refrigerant gas atmosphere under dry conditions where no lubricating oil is used.
In each of Examples 1 to 3, the CNx film is formed by supplying carbon particles by the FCVA method while irradiating the base material 1 of SUSJ2 with a nitrogen ion beam using the gridless ion beam generator 40 as described above. It is the one with 2. Comparative Example 1 shows the coefficient of friction of the base material 1 of SUSJ2 to which the CNx film 2 is not applied under the atmosphere of R32 refrigerant gas.
The nitrogen gas flow rate during film formation of the CNx film 2 is 15 SCCM in Example 1 and 40 SCCM in Examples 2 and 3. 40 SCCM corresponds to a nitrogen content of 17.4 atomic%.
In both Examples 1 to 3 and Comparative Example 1, the pressure of the atmospheric gas was 0.3 MPa.
Since the friction coefficient of Comparative Example 1 is 0.34 and the friction coefficient of Examples 1 to 3 is about 0.02, according to Examples 1 to 3, the friction coefficient of Comparative Example 1 which is not coated is compared with that of Comparative Example 1. Friction can be sufficiently reduced even under boundary lubrication.
 次に、図16に示す実施例4~7および比較例2のいずれも、冷媒ガス雰囲気でかつ境界潤滑条件(潤滑油に冷媒が溶け込んだ状態)での摩擦係数を示している。
 実施例4~7のいずれも、SUJ2の基材1に、上述のようにグリッドレスイオンビーム発生装置40を用いて窒素イオンビームを照射しつつ、FCVA法により炭素粒子を供給することでCNx膜2を施したものである。実施例5の「N増加」は、同一の基材1に、窒素イオンビームを照射しつつ、炭素粒子を供給することを実施例4と同じ条件で連続して二度繰り返したという意味である。「N増加」の記載がない実施例4等では一度のみ実施した。 実施例6だけは、CNx膜2の上に、さらにグラファイト層を施してある。このグラファイト層は、基材1上へのCNx膜2の成膜に続いて、グリッドレスイオンビーム発生装置40への窒素ガスの導入を停止した状態で、FCVA成膜装置30によりCNx膜2上に施される。このグラファイト層の膜厚は約100 nmであり、CNx膜2の膜厚は約300 nmである。グラファイト層は軟質であって、CNx膜2がグラファイト層によりコーティングされると、摺動後のCNx膜2に軟質の構造変化層2Aが形成される(図1の下側)のと同様に、基材1に複合的な層が形成された状態となる。そのため、実施例6は、十分に低い摩擦係数を示している。なお、実施例6のグラファイト層の膜厚は、冷媒ガス雰囲気における摺動によりCNx膜2の表層に出現したポリマーライクカーボン層の厚さと同等に定められている。
 比較例2は、CNx膜2が施されていないSUSJ2の基材1の摩擦係数を示している。
 実施例7だけは、HFO 冷媒であるR1234yf冷媒雰囲気下における摩擦係数を示し、その他の実施例4~6および比較例2は、R32冷媒ガス雰囲気下における摩擦係数を示している。使用冷媒に合わせて、実施例7ではPAG(ポリアルキレングリコール)系の潤滑油が使用され、その他の実施例4~6および比較例2では、POE系の潤滑油が使用されている。
 CNx膜2の成膜時の窒素ガス流量は、実施例4~7および比較例2のいずれも、40 SCCMである。
 実施例4~6および比較例2のいずれでも、雰囲気ガスの圧力は1 MPaであり、実施例7における雰囲気ガスの圧力は0.2 MPaである。
 比較例2の摩擦係数が0.10であるのに対し、実施例4~7の摩擦係数は0.03~0.07程度である。実施例4~7によれば、コーティングが施されていない比較例2に対し、摩擦を十分に低減することができる。
Next, both Examples 4 to 7 and Comparative Example 2 shown in FIG. 16 show the friction coefficient in a refrigerant gas atmosphere and under boundary lubrication conditions (a state in which the refrigerant is dissolved in the lubricating oil).
In each of Examples 4 to 7, the base material 1 of SUJ2 is irradiated with a nitrogen ion beam using the gridless ion beam generator 40 as described above, and carbon particles are supplied by the FCVA method to supply a CNx film. It is the one with 2. “N increase” in Example 5 means that the same base material 1 was irradiated with a nitrogen ion beam and carbon particles were supplied twice in succession under the same conditions as in Example 4. .. In Example 4 and the like without the description of "N increase", it was carried out only once. In Example 6 only, a graphite layer is further applied on the CNx film 2. This graphite layer is formed on the CNx film 2 by the FCVA film forming apparatus 30 in a state where the introduction of nitrogen gas into the gridless ion beam generator 40 is stopped following the film formation of the CNx film 2 on the base material 1. Is given to. The film thickness of this graphite layer is about 100 nm, and the film thickness of the CNx film 2 is about 300 nm. The graphite layer is soft, and when the CNx film 2 is coated with the graphite layer, a soft structural change layer 2A is formed on the CNx film 2 after sliding (lower side of FIG. 1). A composite layer is formed on the base material 1. Therefore, Example 6 shows a sufficiently low coefficient of friction. The film thickness of the graphite layer of Example 6 is set to be the same as the thickness of the polymer-like carbon layer that appears on the surface layer of the CNx film 2 due to sliding in the refrigerant gas atmosphere.
Comparative Example 2 shows the friction coefficient of the base material 1 of SUSJ2 to which the CNx film 2 is not applied.
Only Example 7 shows the coefficient of friction under the atmosphere of R1234yf refrigerant, which is an HFO refrigerant, and the other Examples 4 to 6 and Comparative Example 2 show the coefficient of friction under the atmosphere of R32 refrigerant gas. A PAG (polyalkylene glycol) -based lubricating oil is used in Example 7, and a POE-based lubricating oil is used in the other Examples 4 to 6 and Comparative Example 2 according to the refrigerant used.
The nitrogen gas flow rate during film formation of the CNx film 2 is 40 SCCM in both Examples 4 to 7 and Comparative Example 2.
In both Examples 4 to 6 and Comparative Example 2, the pressure of the atmospheric gas is 1 MPa, and the pressure of the atmospheric gas in Example 7 is 0.2 MPa.
While the friction coefficient of Comparative Example 2 is 0.10, the friction coefficient of Examples 4 to 7 is about 0.03 to 0.07. According to Examples 4 to 7, friction can be sufficiently reduced as compared with Comparative Example 2 in which the coating is not applied.
 以上より、グリッドレスイオンビーム発生装置40を用いることで窒素含有率を12~20原子%にまで増加させたCNx膜2を実現することができ、そのCNx膜2が基材1に施されることによれば、図3、図15、図16等に示した結果より、十分に摩擦を低減することができることができる。摩擦が低減されることで、摺動部の損失低減による高効率化および省エネルギー化が実現する。
 加えて、図4に示すように、CNx膜2のヤング率が160~250 GPaであることから、基材に典型的に用いられる金属材料のヤング率(200 GPa前後)と同等のヤング率がCNx膜に与えられることとなる。そのため、CNx膜2の割れや、基材1からのCNx膜2の剥離を防いで、摺動部材10、摺動部材10を備える装置の信頼性を向上させることができる。
From the above, by using the gridless ion beam generator 40, it is possible to realize the CNx film 2 in which the nitrogen content is increased to 12 to 20 atomic%, and the CNx film 2 is applied to the base material 1. According to this, the friction can be sufficiently reduced from the results shown in FIGS. 3, 15, 16 and the like. By reducing friction, high efficiency and energy saving are realized by reducing the loss of sliding parts.
In addition, as shown in FIG. 4, since the Young's modulus of the CNx film 2 is 160 to 250 GPa, the Young's modulus equivalent to the Young's modulus of the metal material typically used for the base material (around 200 GPa) is obtained. It will be given to the CNx membrane. Therefore, it is possible to prevent the CNx film 2 from cracking and the CNx film 2 from peeling off from the base material 1, and improve the reliability of the sliding member 10 and the device including the sliding member 10.
 主な機械材料のヤング率を列記する。
 工業用純鉄       205 GPa
 圧延鋼材(SS400)    206 GPa
 中炭素鋼(S45C)    205 GPa
 高張力鋼(HT80)    203 GPa
 ステンレス鋼(SUS631) 204 GPa
 銅           125 GPa
List the Young's modulus of major mechanical materials.
Industrial Pure Iron 205 GPa
Rolled steel (SS400) 206 GPa
Medium carbon steel (S45C) 205 GPa
High-strength steel (HT80) 203 GPa
Stainless steel (SUS631) 204 GPa
Copper 125 GPa
(適用例)
 上述したCNx膜2は、冷媒を圧縮する圧縮機を構成する摺動部材に適用されることが好ましい。以下に、圧縮機と、圧縮機に備わる摺動部材を例示する。
 図17および図18は、スクロール圧縮機構50を備えた圧縮機5を示している。圧縮機5は、HFC系やHFO系の冷媒、あるいはアンモニア等、水素を含む冷媒をスクロール圧縮機構50により圧縮する。
 圧縮機5は、スクロール圧縮機構50と、スクロール圧縮機構50からのスラスト荷重を受けるスラスト軸受51と、スラスト部材としてのスラストプレート58と、スクロール圧縮機構50に回転駆動力を伝達し、軸受521,522により回転可能に支持されるシャフト53と、シャフト53にトルクを出力するモータ54と、ハウジング55とを備えている。
 導入管56を通じてハウジング55内に導入される冷媒ガスは、スクロール圧縮機構50に吸入されて圧縮され、吐出管57から外部に吐出される。
 スクロール圧縮機構50やスラスト軸受51、スラストプレート58等、ハウジング55の内側に配置される部材は、冷媒雰囲気に配置されている。
(Application example)
The CNx film 2 described above is preferably applied to a sliding member constituting a compressor that compresses a refrigerant. The compressor and the sliding members provided in the compressor are illustrated below.
17 and 18 show a compressor 5 provided with a scroll compression mechanism 50. The compressor 5 compresses an HFC-based or HFO-based refrigerant, or a refrigerant containing hydrogen such as ammonia, by the scroll compression mechanism 50.
The compressor 5 transmits rotational driving force to the scroll compression mechanism 50, the thrust bearing 51 that receives the thrust load from the scroll compression mechanism 50, the thrust plate 58 as a thrust member, and the scroll compression mechanism 50, and the bearings 521 and 521. It includes a shaft 53 rotatably supported by 522, a motor 54 that outputs torque to the shaft 53, and a housing 55.
The refrigerant gas introduced into the housing 55 through the introduction pipe 56 is sucked into the scroll compression mechanism 50, compressed, and discharged to the outside from the discharge pipe 57.
Members arranged inside the housing 55, such as the scroll compression mechanism 50, the thrust bearing 51, and the thrust plate 58, are arranged in a refrigerant atmosphere.
 スクロール圧縮機構50は、ハウジング55に固定された固定スクロール501と、固定スクロール501に対して公転旋回運動する旋回スクロール502と、オルダムリンク504とを含んでいる。旋回スクロール502は、シャフト53の一端側53Aに設けられた偏心部531に連結されている。旋回スクロール502の旋回に伴い、固定スクロール501の端板501Aから立ち上がるラップ501Bの側面と、旋回スクロール502の端板502Aから立ち上がるラップ502Bの側面とが摺動する。
 スラスト軸受51は、シャフト53の一端側53Aでスクロール圧縮機構50からのスラスト荷重を受け、スラストプレート58は、シャフト53の他端部53Bからスラスト荷重を受ける。スラスト軸受51上を旋回スクロール502の端板502Aが摺動する。
The scroll compression mechanism 50 includes a fixed scroll 501 fixed to the housing 55, a swivel scroll 502 that revolves around the fixed scroll 501, and an Oldham link 504. The swivel scroll 502 is connected to an eccentric portion 531 provided on one end side 53A of the shaft 53. As the swivel scroll 502 turns, the side surface of the lap 501B rising from the end plate 501A of the fixed scroll 501 and the side surface of the lap 502B rising from the end plate 502A of the swivel scroll 502 slide.
The thrust bearing 51 receives a thrust load from the scroll compression mechanism 50 at one end side 53A of the shaft 53, and the thrust plate 58 receives a thrust load from the other end 53B of the shaft 53. The end plate 502A of the swivel scroll 502 slides on the thrust bearing 51.
 オルダムリンク504(図17、図18および図19)は、スラスト軸受51と旋回スクロール502とに係合して旋回スクロール502の自転を規制する。オルダムリンク504に設けられている第1キー504A,504Aは、スラスト軸受51の上面に設けられた図示しないキー溝の内壁と摺動する。オルダムリンク504に設けられている第2キー504B,504Bは、旋回スクロール502の端板502Aに設けられた図示しないキー溝の内壁と摺動する。 The Oldham link 504 (FIGS. 17, 18 and 19) engages the thrust bearing 51 and the swivel scroll 502 to regulate the rotation of the swivel scroll 502. The first keys 504A and 504A provided on the Oldham link 504 slide on the inner wall of a key groove (not shown) provided on the upper surface of the thrust bearing 51. The second keys 504B and 504B provided on the Oldham link 504 slide on the inner wall of a key groove (not shown) provided on the end plate 502A of the swivel scroll 502.
 CNx膜2が上記の摺動部材、つまり、スラスト軸受51、スラストプレート58、固定スクロール501のラップ501B、旋回スクロール502のラップ502B、およびオルダムリンク504の少なくともいずれかに施されることにより、上述したように、ドライ条件や境界潤滑条件であるとしても、摩擦を十分に低減することができる。
 CNx膜2は、スラスト軸受51、スラストプレート58、固定スクロール501のラップ501B、旋回スクロール502のラップ502B、オルダムリンク504のそれぞれにおいて、少なくとも、相手部材と摺動する領域に施されていれば足りる。例えば、スラストプレート58(図17)においては、シャフト53の他端部53Bと摺動する一面58AのみにCNx膜2が施されていればよい。
The CNx film 2 is applied to at least one of the above sliding members, that is, the thrust bearing 51, the thrust plate 58, the lap 501B of the fixed scroll 501, the lap 502B of the swivel scroll 502, and the Oldham link 504. As described above, friction can be sufficiently reduced even under dry conditions and boundary lubrication conditions.
It is sufficient that the CNx film 2 is applied to at least the region sliding with the mating member in each of the thrust bearing 51, the thrust plate 58, the lap 501B of the fixed scroll 501, the lap 502B of the swivel scroll 502, and the Oldham link 504. .. For example, in the thrust plate 58 (FIG. 17), the CNx film 2 may be applied only to one surface 58A that slides on the other end 53B of the shaft 53.
 上述したスラスト軸受51、スラストプレート58、ラップ501B,502B、およびオルダムリンク504以外の摺動部材にも、CNx膜2を施すことができる。
 例えば、軸受521,522におけるシャフト53のラジアル荷重を受ける摺動面や、旋回スクロール502を支持するシャフト53の偏心部531の外周部と旋回スクロール502のボス502Cの内周部との間に配置されるドライブ軸受505の摺動面にCNx膜2を施すことも好ましい。
The CNx film 2 can also be applied to sliding members other than the thrust bearing 51, the thrust plate 58, the laps 501B and 502B, and the Oldham link 504 described above.
For example, it is arranged between the sliding surface of the bearings 521 and 522 that receives the radial load of the shaft 53, the outer peripheral portion of the eccentric portion 531 of the shaft 53 that supports the swivel scroll 502, and the inner peripheral portion of the boss 502C of the swivel scroll 502. It is also preferable to apply the CNx film 2 to the sliding surface of the drive bearing 505.
 図20は、ロータリー圧縮機構60を備えた圧縮機6を示している。圧縮機6は、水素を含む冷媒をロータリー圧縮機構60により圧縮する。
 圧縮機6は、ロータリー圧縮機構60と、ロータリー圧縮機構60からのスラスト荷重を受けるスラスト軸受63,64と、ロータリー圧縮機構60に回転駆動力を伝達し、スラスト軸受63,64により回転可能に支持されるシャフト65と、シャフト65にトルクを出力するモータ66と、ハウジング67とを備えている。
 ロータリー圧縮機構60やスラスト軸受63,64等、ハウジング67の内側に配置される部材は、冷媒雰囲気に配置されている。
FIG. 20 shows a compressor 6 provided with a rotary compression mechanism 60. The compressor 6 compresses the refrigerant containing hydrogen by the rotary compression mechanism 60.
The compressor 6 transmits rotational driving force to the rotary compression mechanism 60, thrust bearings 63 and 64 that receive the thrust load from the rotary compression mechanism 60, and the rotary compression mechanism 60, and is rotatably supported by the thrust bearings 63 and 64. The shaft 65, a motor 66 that outputs torque to the shaft 65, and a housing 67 are provided.
Members arranged inside the housing 67, such as the rotary compression mechanism 60 and the thrust bearings 63 and 64, are arranged in a refrigerant atmosphere.
 ロータリー圧縮機構60は、第1圧縮機構61と、第2圧縮機構62とからなる。第1圧縮機構61は、図21に示すように、シリンダ601と、シリンダ601の内側で回転されるピストンロータ602と、シリンダ601の内側の空間を仕切るブレード603とを含んでいる。ブレード603は、シリンダ601の径方向に進退可能にシリンダ601に設けられ、径方向の外側から内側に向けて加圧されている。ブレード603の先端は、回転するピストンロータ602の外周部と摺動する。 The rotary compression mechanism 60 includes a first compression mechanism 61 and a second compression mechanism 62. As shown in FIG. 21, the first compression mechanism 61 includes a cylinder 601, a piston rotor 602 that is rotated inside the cylinder 601 and a blade 603 that partitions a space inside the cylinder 601. The blade 603 is provided in the cylinder 601 so as to be able to advance and retreat in the radial direction of the cylinder 601 and is pressurized from the outside to the inside in the radial direction. The tip of the blade 603 slides on the outer peripheral portion of the rotating piston rotor 602.
 第2圧縮機構62も、同様に、シリンダ601、ピストンロータ602、およびブレード603を備えている。第1圧縮機構61のシリンダ601の内部は、スラスト軸受63と隔壁68とにより区画されている。第2圧縮機構62のシリンダ601の内部は、スラスト軸受64と隔壁68とにより区画されている。 Similarly, the second compression mechanism 62 also includes a cylinder 601, a piston rotor 602, and a blade 603. The inside of the cylinder 601 of the first compression mechanism 61 is partitioned by a thrust bearing 63 and a partition wall 68. The inside of the cylinder 601 of the second compression mechanism 62 is partitioned by a thrust bearing 64 and a partition wall 68.
 アキュムレータ69から第1圧縮機構61および第2圧縮機構62のそれぞれのシリンダ601に導入された冷媒ガスは、各シリンダ601内で、シャフト65と結合したピストンロータ602の回転に伴い圧縮され、第1圧縮機構61および第2圧縮機構62のそれぞれの吐出口604からハウジング67の内部に吐出され、モータ66を通過して吐出管605から外部に吐出される。 The refrigerant gas introduced from the accumulator 69 into the cylinders 601 of the first compression mechanism 61 and the second compression mechanism 62 is compressed in each cylinder 601 with the rotation of the piston rotor 602 coupled to the shaft 65, and the first The gas is discharged from the discharge ports 604 of the compression mechanism 61 and the second compression mechanism 62 into the housing 67, passes through the motor 66, and is discharged to the outside from the discharge pipe 605.
 CNx膜2が摺動部材としてのブレード603、スラスト軸受63,64、隔壁68、ピストンロータ602、およびシリンダ601の少なくともいずれかに施されることにより、上述したように、ドライ条件や境界潤滑条件であるとしても、摩擦を十分に低減することができる。
 CNx膜2は、摺動部材において少なくとも相手部材と摺動する領域に施されていれば足りる。例えば、ブレード603(図21)においては、ピストンロータ602と摺動する先端部603AのみにCNx膜2が施されていればよい。ピストンロータ602においては、シリンダ601の内壁と摺動する外周部のみにCNx膜2が施されていればよい。
As described above, the CNx film 2 is applied to at least one of the blade 603 as a sliding member, the thrust bearings 63 and 64, the partition wall 68, the piston rotor 602, and the cylinder 601 to obtain dry conditions and boundary lubrication conditions. Even if it is, the friction can be sufficiently reduced.
It suffices that the CNx film 2 is applied to at least a region of the sliding member that slides with the mating member. For example, in the blade 603 (FIG. 21), the CNx film 2 may be applied only to the tip portion 603A that slides on the piston rotor 602. In the piston rotor 602, the CNx film 2 may be applied only to the outer peripheral portion that slides on the inner wall of the cylinder 601.
 その他、スラスト軸受63,64におけるシャフト65のラジアル荷重を受ける摺動面等にCNx膜2を施すことも好ましい。 In addition, it is also preferable to apply the CNx film 2 to the sliding surface or the like of the thrust bearings 63 and 64 that receives the radial load of the shaft 65.
 上記以外にも、本発明の主旨を逸脱しない限り、上記実施形態で挙げた構成を取捨選択したり、他の構成に適宜変更したりすることが可能である。
 例えば、アルゴンイオンビームの照射に代えて、窒素ガスから生成された窒素イオンビーム等、アルゴンガス以外の他の不活性ガスから生成されたイオンビームを基材1に照射することにより、基材1の表面をクリーニングするようにしてもよい。
In addition to the above, the configurations listed in the above embodiments can be selected or appropriately changed to other configurations as long as the gist of the present invention is not deviated.
For example, instead of irradiating the argon ion beam, the substrate 1 is irradiated with an ion beam generated from an inert gas other than argon gas, such as a nitrogen ion beam generated from nitrogen gas. The surface of the gas may be cleaned.
 また、基材1とCNx膜2との間に、例えば基材1へのCNx膜2の密着性を向上させるための一以上の中間層を設けることもできる。中間層は、例えば、チタン、クロム、シリコン、窒化クロム、窒化チタン等を用いて形成することができる。 Further, one or more intermediate layers for improving the adhesion of the CNx film 2 to the base material 1 can be provided between the base material 1 and the CNx film 2. The intermediate layer can be formed by using, for example, titanium, chromium, silicon, chromium nitride, titanium nitride, or the like.
 さらに、CNx膜2が、硬度の異なる複数の層を含んでいてもよい。これと同様に、CNx膜2が、窒素含有率の異なる複数の層を含んでいてもよい。 Further, the CNx film 2 may include a plurality of layers having different hardness. Similarly, the CNx film 2 may contain a plurality of layers having different nitrogen contents.
(付記)
 本開示の窒素含有炭素皮膜、その製造方法、圧縮機、摺動部材、およびその製造方法は、以下のように把握される。
(1)本開示は、基材に施され、窒素を含有した非晶質の窒素含有炭素皮膜であって、炭素皮膜における窒素含有率が、12~20原子%であり、炭素皮膜のヤング率は、160~250 GPaである。
(2)炭素皮膜の硬度は、18~25 GPaである。
(3)本開示は、基材に施され、窒素を含有した非晶質の炭素皮膜を製造する方法であって、グリッドレスイオンビーム発生装置を用いて窒素イオンビームを基材に照射しながら、フィルタードカソーディック真空アーク法により基材に炭素を蒸着する。
(4)グリッドレスイオンビーム発生装置に導入される窒素ガスの流量を設定することにより、炭素皮膜に、12~20 %の窒素含有率を与える。
(5)基材に炭素皮膜を成膜する前に、不活性ガスから生成されたイオンビームを基材に照射する。
(6)本開示は、水素を含む冷媒を圧縮する圧縮機であって、窒素を含有した非晶質の炭素皮膜が基材に施された摺動部材を備え、摺動部材は、冷媒が存在する雰囲気に配置され、炭素皮膜における窒素含有率が、12~20原子%である。
(7)第1スクロール、および第1スクロールに対して公転旋回運動する第2スクロールを含むスクロール圧縮機構と、第2スクロールに連結され、回転可能に支持されるシャフトと、シャフトにおける一端側でスクロール圧縮機構からのスラスト荷重を受けるスラスト軸受と、シャフトの他端部からスラスト荷重を受けるスラスト部材と、を備え、摺動部材は、スラスト軸受と、スラスト部材と、スラスト軸受および第2スクロールに係合して第2スクロールの自転を規制するオルダムリンクと、第1スクロールのラップと、第2スクロールのラップとの少なくともいずれかに該当する。
(8)シリンダ、シリンダの内側で回転されるピストンロータ、シリンダの内側の空間を仕切るブレードを含むロータリー圧縮機構と、ロータリー圧縮機構からのスラスト荷重を受けるスラスト軸受と、を備え、摺動部材は、スラスト軸受およびブレードの少なくともいずれかに該当する。
(9)本開示の摺動部材は、水素を含む冷媒を圧縮する圧縮機を構成する摺動部材であって、冷媒が存在する雰囲気に配置され、窒素を含有した非晶質の炭素皮膜が基材に施され、炭素皮膜における窒素含有率が、12~20原子%である。
(10)摺動部材は、圧縮機に備わるスクロール圧縮機構からのスラスト荷重を受けるスラスト軸受である。
(11)摺動部材は、圧縮機に備わるスクロール圧縮機構に用いられるオルダムリンクである。
(12)摺動部材は、圧縮機に備わるロータリー圧縮機構を構成するブレードである。
(13)本開示の摺動部材は、冷媒が存在する雰囲気下で使用される摺動部材であって、窒素を含有した非晶質の炭素皮膜が基材に施され、炭素皮膜における窒素含有率が、12~20原子%である。
(14)窒素を含有した非晶質の炭素皮膜が施された基材を含み、冷媒が存在する雰囲気下で使用される摺動部材を製造する方法であって、グリッドレスイオンビーム発生装置を用いて、窒素イオンビームを基材に照射しながら、フィルタードカソーディック真空アーク法により基材に炭素を蒸着するステップを含む。
(Additional note)
The nitrogen-containing carbon film of the present disclosure, its manufacturing method, a compressor, a sliding member, and its manufacturing method are grasped as follows.
(1) The present disclosure is an amorphous nitrogen-containing carbon film that is applied to a base material and contains nitrogen, in which the nitrogen content in the carbon film is 12 to 20 atomic%, and the Young's modulus of the carbon film. Is 160-250 GPa.
(2) The hardness of the carbon film is 18 to 25 GPa.
(3) The present disclosure is a method of producing an amorphous carbon film containing nitrogen by being applied to a base material, while irradiating the base material with a nitrogen ion beam using a gridless ion beam generator. , Carbon is deposited on the substrate by the filtered Casodec vacuum arc method.
(4) By setting the flow rate of the nitrogen gas introduced into the gridless ion beam generator, the carbon film is given a nitrogen content of 12 to 20%.
(5) Before forming a carbon film on the base material, the base material is irradiated with an ion beam generated from the inert gas.
(6) The present disclosure is a compressor that compresses a refrigerant containing hydrogen, and includes a sliding member having a nitrogen-containing amorphous carbon film applied to a base material, and the sliding member is a refrigerant. Arranged in an existing atmosphere, the nitrogen content in the carbon film is 12-20 atomic%.
(7) A scroll compression mechanism including a first scroll and a second scroll that revolves with respect to the first scroll, a shaft connected to the second scroll and rotatably supported, and a scroll at one end side of the shaft. A thrust bearing that receives a thrust load from a compression mechanism and a thrust member that receives a thrust load from the other end of the shaft are provided, and the sliding member is related to the thrust bearing, the thrust member, the thrust bearing, and the second scroll. In this case, it corresponds to at least one of the Oldham link that regulates the rotation of the second scroll, the lap of the first scroll, and the lap of the second scroll.
(8) The sliding member includes a cylinder, a piston rotor rotated inside the cylinder, a rotary compression mechanism including a blade that partitions the space inside the cylinder, and a thrust bearing that receives a thrust load from the rotary compression mechanism. , Thrust bearings and blades.
(9) The sliding member of the present disclosure is a sliding member constituting a compressor that compresses a refrigerant containing hydrogen, and is arranged in an atmosphere in which the refrigerant is present, and an amorphous carbon film containing nitrogen is formed. It is applied to the base material, and the nitrogen content in the carbon film is 12 to 20 atomic%.
(10) The sliding member is a thrust bearing that receives a thrust load from a scroll compression mechanism provided in the compressor.
(11) The sliding member is an oldham link used in the scroll compression mechanism provided in the compressor.
(12) The sliding member is a blade that constitutes a rotary compression mechanism provided in the compressor.
(13) The sliding member of the present disclosure is a sliding member used in an atmosphere in which a refrigerant is present, and an amorphous carbon film containing nitrogen is applied to a base material, and the carbon film contains nitrogen. The rate is 12 to 20 atomic%.
(14) A gridless ion beam generator, which is a method of manufacturing a sliding member containing a base material having an amorphous carbon film containing nitrogen and used in an atmosphere in which a refrigerant is present. Including a step of depositing carbon on a substrate by a filtered Casodic vacuum arc method while irradiating the substrate with a nitrogen ion beam.
1    基材
1A   表面
2    窒素含有非晶質炭素皮膜(CNx膜)
2A   構造変化層
2B   硬質層
3    製造装置
5,6  圧縮機
10   摺動部材
30   FCVA成膜装置
31   真空アーク放電発生部
32   フィルター部
33   ドロップレット捕集部
34   真空チャンバ
40   グリッドレスイオンビーム発生装置
41   アノード
42,42A,42B   カソード
43   永久磁石
45   出口
50   スクロール圧縮機構
51   スラスト軸受
53   シャフト
53A  一端側
53B  他端部
54   モータ
55   ハウジング
56   導入管
57   吐出管
58   スラストプレート(スラスト部材)
58A  一面
60   ロータリー圧縮機構
61   第1圧縮機構
62   第2圧縮機構
63,64   スラスト軸受
65   シャフト
66   モータ
67   ハウジング
68   隔壁
69   アキュムレータ
70   グリッドタイプイオンビーム発生装置
71   マイクロ波源
72   放電管
73   イグナイタ
74   グリッド
311  トリガー
312  カーボンターゲット
321  ソレノイドコイル
322  ダクト
341  ホルダ
501  固定スクロール(第1スクロール)
501A 端板
501B ラップ
502  旋回スクロール(第2スクロール)
502A 端板
502B ラップ
502C ボス
504  オルダムリンク
504A,504B   キー
521,522   軸受
505  ドライブ軸受
531  偏心部
601  シリンダ
602  ピストンロータ
603  ブレード
603A 先端部
604  吐出口
605  吐出管
T    厚さ
1 Base material 1A Surface 2 Nitrogen-containing amorphous carbon film (CNx film)
2A Structural change layer 2B Hard layer 3 Manufacturing equipment 5, 6 Compressor 10 Sliding member 30 FCVA deposition equipment 31 Vacuum arc discharge generator 32 Filter unit 33 Droplet collection unit 34 Vacuum chamber 40 Gridless ion beam generator 41 Anode 42, 42A, 42B Cathode 43 Permanent magnet 45 Outlet 50 Scroll compression mechanism 51 Thrust bearing 53 Shaft 53A One end side 53B Other end 54 Motor 55 Housing 56 Introductory pipe 57 Discharge pipe 58 Thrust plate (thrust member)
58A One side 60 Rotary compression mechanism 61 First compression mechanism 62 Second compression mechanism 63, 64 Thrust bearing 65 Shaft 66 Motor 67 Housing 68 Partition 69 Accumulator 70 Grid type ion beam generator 71 Microwave source 72 Discharge tube 73 Ignite 74 Grid 311 Trigger 312 Carbon target 321 Solenoid coil 322 Duct 341 Holder 501 Fixed scroll (1st scroll)
501A end plate 501B lap 502 swivel scroll (second scroll)
502A End plate 502B Wrap 502C Boss 504 Oldham link 504A, 504B Key 521,522 Bearing 505 Drive bearing 531 Eccentric part 601 Cylinder 602 Piston rotor 603 Blade 603A Tip part 604 Discharge port 605 Discharge pipe T Thickness

Claims (14)

  1.  基材に施され、窒素を含有した非晶質の窒素含有炭素皮膜であって、
     前記炭素皮膜における窒素含有率が、12~20原子%であり、
     前記炭素皮膜のヤング率は、160~250 GPaである、
    窒素含有炭素皮膜。
    An amorphous nitrogen-containing carbon film that is applied to the base material and contains nitrogen.
    The nitrogen content in the carbon film is 12 to 20 atomic%.
    The Young's modulus of the carbon film is 160-250 GPa.
    Nitrogen-containing carbon film.
  2.  前記炭素皮膜の硬度は、18~25 GPaである、
    請求項1に記載の窒素含有炭素皮膜。
    The hardness of the carbon film is 18 to 25 GPa.
    The nitrogen-containing carbon film according to claim 1.
  3.  基材に施され、窒素を含有した非晶質の炭素皮膜を製造する方法であって、
     グリッドレスイオンビーム発生装置を用いて窒素イオンビームを前記基材に照射しながら、フィルタードカソーディック真空アーク法により前記基材に炭素を蒸着する、
    窒素含有炭素皮膜の製造方法。
    A method of producing an amorphous carbon film containing nitrogen, which is applied to a base material.
    While irradiating the base material with a nitrogen ion beam using a gridless ion beam generator, carbon is vapor-deposited on the base material by a filtered Casodic vacuum arc method.
    A method for producing a nitrogen-containing carbon film.
  4.  前記グリッドレスイオンビーム発生装置に導入される窒素ガスの流量を設定することにより、
     前記炭素皮膜に、12~20 %の窒素含有率を与える、
    請求項3に記載の窒素含有炭素皮膜の製造方法。
    By setting the flow rate of nitrogen gas introduced into the gridless ion beam generator,
    To give the carbon film a nitrogen content of 12-20%,
    The method for producing a nitrogen-containing carbon film according to claim 3.
  5.  前記基材に前記炭素皮膜を成膜する前に、
     不活性ガスから生成されたイオンビームを前記基材に照射する、
    請求項3または4に記載の窒素含有炭素皮膜の製造方法。
    Before forming the carbon film on the substrate,
    The substrate is irradiated with an ion beam generated from the inert gas.
    The method for producing a nitrogen-containing carbon film according to claim 3 or 4.
  6.  水素を含む冷媒を圧縮する圧縮機であって、
     窒素を含有した非晶質の炭素皮膜が基材に施された摺動部材を備え、
     前記摺動部材は、前記冷媒が存在する雰囲気に配置され、
     前記炭素皮膜における窒素含有率が、12~20原子%である、
    圧縮機。
    A compressor that compresses a refrigerant containing hydrogen.
    It has a sliding member with a nitrogen-containing amorphous carbon film applied to the base material.
    The sliding member is arranged in an atmosphere in which the refrigerant is present.
    The nitrogen content in the carbon film is 12 to 20 atomic%.
    Compressor.
  7.  第1スクロール、および前記第1スクロールに対して公転旋回運動する第2スクロールを含むスクロール圧縮機構と、
     前記第2スクロールに連結され、回転可能に支持されるシャフトと、
     前記シャフトにおける一端側で前記スクロール圧縮機構からのスラスト荷重を受けるスラスト軸受と、
     前記シャフトの他端部からスラスト荷重を受けるスラスト部材と、を備え、
     前記摺動部材は、
     前記スラスト軸受と、
     前記スラスト部材と、
     前記スラスト軸受および前記第2スクロールに係合して前記第2スクロールの自転を規制するオルダムリンクと、
     前記第1スクロールのラップと、
     前記第2スクロールのラップとの少なくともいずれかに該当する、
    請求項6に記載の圧縮機。
    A scroll compression mechanism including a first scroll and a second scroll that revolves with respect to the first scroll.
    A shaft connected to the second scroll and rotatably supported,
    A thrust bearing that receives a thrust load from the scroll compression mechanism on one end side of the shaft, and a thrust bearing.
    A thrust member that receives a thrust load from the other end of the shaft is provided.
    The sliding member
    With the thrust bearing
    With the thrust member
    An Oldham link that engages with the thrust bearing and the second scroll to regulate the rotation of the second scroll.
    With the lap of the first scroll
    Corresponds to at least one of the laps of the second scroll.
    The compressor according to claim 6.
  8.  シリンダ、前記シリンダの内側で回転されるピストンロータ、前記シリンダの内側の空間を仕切るブレードを含むロータリー圧縮機構と、
     前記ロータリー圧縮機構からのスラスト荷重を受けるスラスト軸受と、を備え、
     前記摺動部材は、
     前記スラスト軸受および前記ブレードの少なくともいずれかに該当する、
    請求項6に記載の圧縮機。
    A cylinder, a piston rotor that rotates inside the cylinder, a rotary compression mechanism that includes blades that partition the space inside the cylinder, and
    A thrust bearing that receives a thrust load from the rotary compression mechanism is provided.
    The sliding member
    Corresponding to at least one of the thrust bearing and the blade.
    The compressor according to claim 6.
  9.  水素を含む冷媒を圧縮する圧縮機を構成する摺動部材であって、
     前記冷媒が存在する雰囲気に配置され、
     窒素を含有した非晶質の炭素皮膜が基材に施され、
     前記炭素皮膜における窒素含有率が、12~20原子%である、
    摺動部材。
    A sliding member that constitutes a compressor that compresses a refrigerant containing hydrogen.
    Arranged in an atmosphere where the refrigerant is present
    An amorphous carbon film containing nitrogen is applied to the base material,
    The nitrogen content in the carbon film is 12 to 20 atomic%.
    Sliding member.
  10.  前記摺動部材は、
     前記圧縮機に備わるスクロール圧縮機構からのスラスト荷重を受けるスラスト軸受である、
    請求項9に記載の摺動部材。
    The sliding member
    A thrust bearing that receives a thrust load from the scroll compression mechanism provided in the compressor.
    The sliding member according to claim 9.
  11.  前記摺動部材は、
     前記圧縮機に備わるスクロール圧縮機構に用いられるオルダムリンクである、
    請求項9に記載の摺動部材。
    The sliding member
    An Oldham link used in the scroll compression mechanism provided in the compressor.
    The sliding member according to claim 9.
  12.  前記摺動部材は、
     前記圧縮機に備わるロータリー圧縮機構を構成するブレードである、
    請求項9に記載の摺動部材。
    The sliding member
    A blade that constitutes a rotary compression mechanism provided in the compressor.
    The sliding member according to claim 9.
  13.  冷媒が存在する雰囲気下で使用される摺動部材であって、
     窒素を含有した非晶質の炭素皮膜が基材に施され、
     前記炭素皮膜における窒素含有率が、12~20原子%である、
    摺動部材。
    A sliding member used in an atmosphere where a refrigerant is present.
    An amorphous carbon film containing nitrogen is applied to the base material,
    The nitrogen content in the carbon film is 12 to 20 atomic%.
    Sliding member.
  14.  窒素を含有した非晶質の炭素皮膜が施された基材を含み、冷媒が存在する雰囲気下で使用される摺動部材を製造する方法であって、
     グリッドレスイオンビーム発生装置を用いて、窒素イオンビームを前記基材に照射しながら、フィルタードカソーディック真空アーク法により前記基材に炭素を蒸着するステップを含む、
    摺動部材の製造方法。
    A method for manufacturing a sliding member that includes a base material having an amorphous carbon film containing nitrogen and is used in an atmosphere in which a refrigerant is present.
    A gridless ion beam generator is used to irradiate the substrate with a nitrogen ion beam while depositing carbon on the substrate by a filtered Casodic vacuum arc method.
    Manufacturing method of sliding member.
PCT/JP2020/007733 2019-09-27 2020-02-26 Nitrogen-containing carbon film, method for manufacturing same, compressor, and sliding member WO2021059552A1 (en)

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JP2019176823A JP7297253B2 (en) 2019-09-27 2019-09-27 COMPRESSOR, SLIDING MEMBER, AND METHOD FOR MANUFACTURING SLIDING MEMBER
JP2019-176823 2019-09-27

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JPH1150988A (en) * 1997-07-31 1999-02-23 Sanyo Electric Co Ltd Rotary compressor
JP2009231294A (en) * 1997-07-25 2009-10-08 Morgan Chemical Products Inc Hall-current ion source apparatus and material processing method
JP2010070848A (en) * 2008-08-19 2010-04-02 Kobe Steel Ltd Nitrogen-containing amorphous carbon film, amorphous carbon layered film, and sliding member
WO2015140869A1 (en) * 2014-03-17 2015-09-24 三菱電機株式会社 Scroll compressor
JP2018141197A (en) * 2017-02-27 2018-09-13 日本ピストンリング株式会社 Sliding member and method for manufacturing the same

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JP2001271741A (en) 2000-03-24 2001-10-05 Taiho Kogyo Co Ltd Shoe for swash plate compressor and swash plate compressor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1025565A (en) * 1996-07-12 1998-01-27 Osamu Takai Production of head thin film and hard thin film
JP2009231294A (en) * 1997-07-25 2009-10-08 Morgan Chemical Products Inc Hall-current ion source apparatus and material processing method
JPH1150988A (en) * 1997-07-31 1999-02-23 Sanyo Electric Co Ltd Rotary compressor
JP2010070848A (en) * 2008-08-19 2010-04-02 Kobe Steel Ltd Nitrogen-containing amorphous carbon film, amorphous carbon layered film, and sliding member
WO2015140869A1 (en) * 2014-03-17 2015-09-24 三菱電機株式会社 Scroll compressor
JP2018141197A (en) * 2017-02-27 2018-09-13 日本ピストンリング株式会社 Sliding member and method for manufacturing the same

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