WO2021057892A1 - 一种感应式等离子体加速装置及方法 - Google Patents

一种感应式等离子体加速装置及方法 Download PDF

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Publication number
WO2021057892A1
WO2021057892A1 PCT/CN2020/117682 CN2020117682W WO2021057892A1 WO 2021057892 A1 WO2021057892 A1 WO 2021057892A1 CN 2020117682 W CN2020117682 W CN 2020117682W WO 2021057892 A1 WO2021057892 A1 WO 2021057892A1
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Prior art keywords
pulse
assembly
working medium
excitation coil
reflector
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PCT/CN2020/117682
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English (en)
French (fr)
Inventor
李小康
程谋森
吴建军
车碧轩
王墨戈
郭大伟
杨雄
Original Assignee
国防科技大学
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Application filed by 国防科技大学 filed Critical 国防科技大学
Priority to US17/605,565 priority Critical patent/US11933282B2/en
Publication of WO2021057892A1 publication Critical patent/WO2021057892A1/zh

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00—Using plasma to produce a reactive propulsive thrust
    • F03H1/0081—Electromagnetic plasma thrusters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00—Using plasma to produce a reactive propulsive thrust
    • F03H1/0006—Details applicable to different types of plasma thrusters
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F03—MACHINES OR ENGINES FOR LIQUIDS; WIND, SPRING, OR WEIGHT MOTORS; PRODUCING MECHANICAL POWER OR A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H—PRODUCING A REACTIVE PROPULSIVE THRUST, NOT OTHERWISE PROVIDED FOR
    • F03H1/00—Using plasma to produce a reactive propulsive thrust
    • F03H1/0006—Details applicable to different types of plasma thrusters
    • F03H1/0012—Means for supplying the propellant

Definitions

  • the invention relates to the technical field of electric propulsion, in particular to an induction plasma acceleration device and method.
  • the propulsion device In the aerospace field, the propulsion device, as the part that provides power, is extremely important to the spacecraft and is the basis for the spacecraft to complete its mission.
  • electric propulsion uses electric energy to accelerate the propellant to obtain thrust. Its propulsion energy comes from outside the propellant and can obtain a higher jet velocity, which can effectively reduce the propellant consumption and increase the effectiveness of the spacecraft. Load.
  • electric propulsion technology has been widely used in spacecraft, and more than half of high-orbit communication satellites have been equipped with electric propulsion systems, and it has become one of the signs of whether the satellite platform is advanced.
  • PPT Pulsed Plasma Thruster
  • Pulsed Plasma Thruster Pulsed Plasma Thruster
  • a small discharge through a spark plug initiates a main discharge between two parallel plate electrodes.
  • the main discharge generates a large discharge current to establish its own induced magnetic field, and at the same time ablate and peel off a layer of solid working fluid to further form plasma.
  • the plasma current interacts with the magnetic field to generate the Lorentz force to accelerate the jet and generate a pulse of thrust. Due to the presence of electrodes, this type of propulsion device will inevitably cause problems such as shortened life, plasma component pollution, and poor working fluid compatibility due to electrode ablation, which restricts the practical application of the propulsion device to a certain extent.
  • an electrodeless pulse induction plasma thruster also known as an induction pulse plasma thruster
  • This kind of device uses the principle of pulse induction discharge and the principle of induced eddy current repulsion to realize the ionization and acceleration of the working fluid.
  • the working fluid used is gas, which is controlled by a pulsed gas valve.
  • the pulse gas supply valve upstream of the injector is opened quickly, and the working fluid gas is injected to the surface of the excitation coil group through the tower injector to reach the specified gas mass.
  • the post-pulse gas valve closes quickly; the working fluid gas moves along the surface of the excitation coil group and spreads out until it reaches the expected gas distribution; in the second stage, the energy storage capacitor triggers the discharge to generate a strong pulse current in the excitation coil group; pulse current
  • the induced pulse electromagnetic field is excited by the excitation coil group, and its circumferential electric field component breaks down the gas and establishes a circular plasma current; its radial magnetic field component interacts with the plasma current to generate axial Lorentz force to accelerate the plasma, thereby generating thrust , Complete a work pulse.
  • the device can obtain a continuous driving effect.
  • the existing gaseous working fluid pulse induction plasma thruster uses a pulse gas valve that opens and closes at a high speed to achieve pulse gas supply. If the valve opens and closes too slowly, the pulse discharge has not yet started when part of the gas reaches the excitation coil Or the discharge has ended, so a large amount of working fluid will be wasted due to dissipation, which is unacceptable for aerospace applications where the working fluid is very precious. Therefore, the thruster has extremely high requirements for the pulse gas supply subsystem.
  • the delay time, opening time, and closing time of the valve are extremely demanding. The opening and closing time needs to be as short as a hundred microseconds or even tens of microseconds.
  • the existing pulse induction plasma thrusters based on high-speed pulse gas valves still have the following problems:
  • the present invention provides an induction plasma acceleration device and method.
  • the device is designed as a whole to solve the problem of life bottleneck in its use, so as to achieve the purpose of efficient use of working fluid, give full play to the advantages of this type of propulsion device, and promote the practical application of various devices.
  • the present invention provides an inductive plasma acceleration device, including a pulsed laser assembly, a pulsed discharge assembly, an excitation coil assembly, a solid-state working medium and a control assembly;
  • the excitation coil assembly is electrically connected to the pulse discharge assembly so that a strong pulse current is generated in the excitation coil assembly during the discharge of the pulse discharge assembly, and an induced pulse electromagnetic field is further excited around the excitation coil assembly;
  • the solid-state working medium is located on the optical path of the pulsed laser emitted by the pulsed laser assembly so that the solid-state working medium generates pulsed gas under the ablation action of the pulsed laser, and the induced pulsed electromagnetic field is located in the circulation of the pulsed gas On the gas path so that the pulsed gas can enter the induction pulsed electromagnetic field;
  • Both the pulse laser component and the pulse discharge component are electrically connected to the control component for controlling the power and frequency of the pulse laser emitted by the pulse laser component.
  • the optical path of the pulsed laser emitted by the pulsed laser assembly is provided with a reflective assembly capable of changing the direction of the optical path so that the laser can be accurately irradiated on the solid-state working medium according to a predetermined intensity distribution.
  • the reflection assembly includes a first mirror and a second mirror provided on the bracket, the first mirror is an axisymmetric cone configuration, and the second mirror is an axis Symmetrical ring configuration;
  • the first reflector is located in the annular opening of the second reflector, the reflector of the first reflector is located on the conical surface of the conical configuration, and the reflector of the second reflector is located on the The inner ring surface of the ring configuration;
  • the solid-state working medium and the excitation coil assembly are both arranged on the support and located between the reflective surface of the first reflector and the reflective surface of the second reflector, and the excitation coil assembly is located in the solid state Exciting an induced pulse electromagnetic field below the solid working medium and above the solid working medium;
  • the pulse laser emitted by the pulse laser assembly passes through the reflective surface of the first reflective mirror and the reflective surface of the second reflective mirror, and then irradiates the solid-state working medium.
  • the generatrix of the first reflector and the generatrix of the second reflector are in a linear configuration or a curved configuration.
  • the support assembly includes a support base and a tower arranged on the support base, and the excitation coil assembly is arranged on the support base and coiled around the tower. around;
  • the solid working medium is a columnar structure, one end of the solid working medium abuts on the supporting base frame, the other end is located in the tower tube, and the solid working medium is located on the outer wall of the part inside the tower tube Contact and connect with the inner wall of the tower;
  • the reflecting assembly includes a reflecting base frame suspended above the tower, and a third reflecting mirror and a lens arranged on the reflecting base frame.
  • the third reflecting mirror is located above the lens and the second
  • the reflecting surface of the three-mirror faces the lens, and a downwardly extending annular skirt is provided around the lens.
  • the lens is located directly above the tower and faces the end of the solid working medium.
  • An annular nozzle facing the excitation coil assembly is enclosed between the inner wall of the annular skirt and the outer wall of the tower tube;
  • the pulse laser emitted by the pulse laser assembly is irradiated on the end of the solid-state working medium after passing through the reflecting surface of the third reflecting mirror and the lens.
  • the supporting base frame is provided with a ring-shaped restraining member, and the excitation coil assembly is located between the inner wall of the restraining member and the outer wall of the tower.
  • a supporting spring is provided on the supporting base frame at a position corresponding to the solid working medium, and the end of the solid working medium abuts on the supporting spring.
  • the excitation coil assembly is formed by overlapping multiple spiral antennas in an axisymmetric manner.
  • the solid working medium is made of high polymer material or metal material.
  • the present invention also provides an inductive plasma acceleration method, which adopts the above inductive plasma acceleration device and specifically includes the following steps:
  • Pulsed laser ablation of the solid working medium produces pulsed gaseous ablation products, that is, pulsed gas flow
  • the output and pulse frequency of pulsed gaseous ablation products are controlled by controlling the power and frequency of the pulsed laser.
  • the inductive plasma acceleration device of the present invention is based on pulsed laser ablation of a solid working medium to realize working medium supply, and further adopts the principle of pulse induction discharge and the principle of induced eddy current repulsion to realize plasma ionization and acceleration.
  • the ablation of the solid working fluid is controlled by adjusting the pulse period of the pulsed laser.
  • the pulse frequency of the pulsed airflow generated later replaces the pulse frequency of the pulsed airflow formed by controlling the airflow through a pulsed airflow valve in the prior art.
  • adjusting the period of the pulsed laser only needs to be controlled from the circuit, and there is no need for high-frequency mechanical actions like the pulsed air flow valve, which solves the life bottleneck problem and improves the system efficiency;
  • the inductive plasma acceleration device of the present invention uses solid working fluid, components such as working fluid storage tanks, pipes and valves are omitted, and the system complexity is effectively reduced;
  • a photoelectrolytic coupling is realized between a working fluid supply part composed of a pulsed laser component and a solid working fluid and a strong discharge part composed of a pulse discharge component and an excitation coil component. It greatly reduces the possibility of crosstalk between the working fluid supply part and the main discharge part and malfunctions.
  • the electrodeless structure of the induction plasma acceleration device of the present invention does not have the electrode ablation problem that plagues various electromagnetic thrusters, has excellent long-life operation potential and high-power load capacity, and does not require additional magnetic fields , There is only a single-stage discharge process, the structure is simple, and it works in pulse mode at the same time. The average thrust and power can be flexibly adjusted by changing the pulse frequency. It has a good application prospect in the field of space propulsion.
  • FIG. 1 is a schematic diagram of a first implementation structure of an induction plasma acceleration device in an embodiment of the present invention
  • FIG. 2 is a schematic structural diagram of the excitation coil assembly of the first implementation structure of the induction plasma acceleration device in the embodiment of the present invention
  • FIG. 3 is a schematic diagram of a second implementation structure of an induction plasma acceleration device in an embodiment of the present invention.
  • FIG. 4 is a schematic structural diagram of the excitation coil assembly of the second implementation structure of the induction plasma acceleration device in the embodiment of the present invention.
  • FIG. 5 is a circuit diagram of a pulse switch, an energy storage capacitor group, and an excitation coil assembly for exciting an induction pulse electromagnetic field of the second implementation structure of the induction plasma acceleration device in the embodiment of the present invention
  • FIG. 6 is a schematic diagram of a third implementation structure of an induction plasma acceleration device in an embodiment of the present invention.
  • FIG. 7 is a circuit diagram of a pulse switch, an energy storage capacitor group, and an excitation coil assembly for exciting an induction pulse electromagnetic field of the third implementation structure of the induction plasma acceleration device in the embodiment of the present invention
  • Fig. 8 is a schematic flow chart of an induction plasma acceleration method in an embodiment of the present invention.
  • the terms “connected”, “fixed”, etc. should be interpreted in a broad sense.
  • “fixed” can be a fixed connection, a detachable connection, or a whole; It can be a mechanical connection, an electrical connection, a physical connection or a wireless communication connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be a connection between two components or an interaction relationship between two components.
  • “fixed” can be a fixed connection, a detachable connection, or a whole; It can be a mechanical connection, an electrical connection, a physical connection or a wireless communication connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be a connection between two components or an interaction relationship between two components.
  • the specific meanings of the above-mentioned terms in the present invention can be understood according to specific situations.
  • Figure 1 shows the first implementation structure of an induction plasma acceleration device in this embodiment, which includes:
  • the pulsed laser assembly 1 is used to generate pulsed lasers 11.
  • a pulsed laser or other equipment capable of emitting pulsed lasers is used as the pulsed laser assembly 1;
  • the pulse discharge component is composed of a pulse switch 21 and an energy storage capacitor 22, which are used for pulse discharge.
  • the pulse switch 21 uses a high peak current pulse switch 21 or a switch array, and uses a high voltage end of the pulse switch 21.
  • High-temperature epoxy resin is used for overall packaging to improve its insulation performance when used in a near-vacuum environment;
  • the energy storage capacitor 22 is used to store discharge energy, and the terminal of the energy storage capacitor 22 adopts an encapsulated structure to improve the use in a vacuum environment. Insulation and airtightness; the number of energy storage capacitors 22 is one or more. When the number of energy storage capacitors 22 is more than one, all capacitors are closely spaced around the pulse switch 21 in an axisymmetric manner.
  • the excitation coil assembly 3 is formed by overlapping multiple helical antennas in an axisymmetric manner, as shown in Fig. 2; the excitation coil assembly 3 can also be in other forms, which will not be repeated in this embodiment; and Placed in the coil slot 31, the coil slot 31 is made of insulating material; the excitation coil assembly 3 is electrically connected with the pulse switch 21 and the energy storage capacitor 22 to form a complete electrical circuit, so that the pulse discharge assembly is excited during the discharge process of the coil assembly A strong pulse current is generated in 3 to further excite an induced pulse electromagnetic field around the excitation coil assembly 3.
  • each energy storage capacitor One pole of 22 is connected in series with one end of a single helical antenna, the other end of the single helical antenna is connected to one end of the pulse switch 21, and the other pole of the energy storage capacitor 22 is directly connected to the other end of the pulse switch 21;
  • the solid-state working medium 4 made of polymer material or metal material, is arranged on the excitation coil assembly 3 and is located on the optical path of the pulsed laser 11 emitted by the pulsed laser assembly 1 so that the solid-state working medium 4 is ablated by the pulsed laser 11 Pulse gas is generated under the action, and at the same time, the pulse gas generated by laser ablation of the solid working medium 4 can enter the induced pulse electromagnetic field;
  • the control component 5 which is electrically connected with the excitation coil component 3 and the pulse discharge component, is used to control the opening and closing of the pulse laser component 1 and the pulse switch 21.
  • a PLC control box or an electrical control box or a signal generator can be used as the control component 5.
  • a common signal generator on the market is used as the control component 5.
  • a ring-shaped restraining member 32 is provided around the excitation coil assembly 3, and the solid working medium 4 is located in the annular opening of the restraining member 32 to prevent the pulse gas generated by the laser ablating the solid working medium 4 from the edge of the exciting coil assembly 3. overflow.
  • the working process of the inductive plasma acceleration device under this structure is: the control assembly 5 sends out the first control signal 61, starts the pulse laser assembly 1, emits a laser beam to ablate the solid working medium 4, and generates gaseous ablation in the form of pulsed gas Then, the pulse gas moves to a position around the excitation coil assembly 3 that can be affected by the induced pulse electromagnetic field, that is, directly above the excitation coil assembly 3. At this time, the control assembly 5 sends a second control signal 62 to turn on the pulse switch 21 to make The circuit composed of the pulse switch 21, the energy storage capacitor 22 charged to the preset high voltage, and the excitation coil assembly 3 is turned on.
  • the pulse frequency of the pulse switch 21 is consistent with the pulse frequency of the pulse laser assembly 1 for pulse Discharge; a strong pulse current is generated by the discharge, and the strong pulse current is excited by the excitation coil assembly 3 to generate an induced pulse electromagnetic field. Its circumferential electric field component breaks down the pulse gas and establishes a circular plasma current, and its radial magnetic field component interacts with the plasma current The axial Lorentz force is generated to accelerate the plasma, thereby generating propulsion and completing a work pulse. Wherein, the average thrust and average power can be adjusted by adjusting the operating frequency of the pulse laser assembly 1 and the pulse switch 21.
  • Figure 3 shows a second implementation structure of an inductive plasma acceleration device in this embodiment, which includes a pulse laser assembly 1, a pulse discharge assembly, and an excitation coil with the same function and composition as the first implementation structure.
  • Qualitatively 4 The difference from the first implementation structure is that the excitation coil assembly 3 in the second implementation structure is formed by overlapping multiple spiral antennas in an axisymmetric manner.
  • the single spiral antenna is specifically A Kimide spiral line type, that is, as shown in Figure 4 from left to right, a single helical antenna and an excitation coil assembly 3 composed of two and six helical antennas; the excitation coil assembly 3 can also be other The form of expression will not be described in detail in this embodiment.
  • the induction plasma acceleration device further includes a bracket 71, the pulse discharge assembly, the excitation coil assembly 3, the solid working medium 4 and the reflection assembly are all installed on the bracket 71, and the pulse laser assembly 1 and the control assembly 5 are installed On the stand 71 or a position outside the stand 71.
  • the solid working medium 4 under the structure of this embodiment is a ring-shaped sheet structure
  • the reflective assembly includes a first reflector 81 and a second reflector 82 that are detachably mounted on the bracket 71, and the first reflector 81 has an axisymmetric cone configuration.
  • the second reflector 82 has an axially symmetrical ring configuration; the first reflector 81 is located in the annular opening of the second reflector 82, the reflector of the first reflector 81 is located on the conical surface of the conical configuration, and the second reflector The reflecting surface of 82 is located on the inner ring surface of the ring configuration.
  • the solid-state working medium 4 and the excitation coil assembly 3 are both arranged on the support 71 and located between the reflecting surface of the first reflecting mirror 81 and the reflecting surface of the second reflecting mirror 82, that is, the first reflecting mirror 81 is located in the ring shape of the solid-state working medium 4
  • the conical axis of the first reflector 81, the annular axis of the solid working medium 4, and the annular axis of the second reflector 82 coincide; the excitation coil assembly 3 is located under the solid working medium 4 and in the solid working medium. 4
  • the induction pulse electromagnetic field is excited above.
  • a ring-shaped coil slot 31 is installed on the bracket 71, the excitation coil assembly 3 is placed in the coil slot 31, the solid working medium 4 is laid on the coil slot 31, and the first reflector 81 is installed.
  • the second mirror 82 is installed at the outer ring position of the coil groove 31.
  • the pulsed laser 11 emitted by the pulsed laser assembly 1 passes through the reflective surface of the first reflector 81 and the reflective surface of the second reflector 82, and then irradiates the solid-state working medium 4.
  • the pulsed laser assembly 1 The center of the emitted pulsed laser 11 coincides with the tapered axis of the first reflector 81, so that the linear configuration of the pulsed laser 11 emitted from the pulsed laser assembly 1 passes through the reflecting surface of the first reflector 81 and becomes a ring.
  • the laser surface of the surface configuration After passing through the reflective surface of the second reflector 82, the laser surface of the surface configuration radiates the annular area on the solid-state working medium 4, so that the pulsed laser 11 can accurately radiate on the solid-state working medium 4 according to a predetermined intensity distribution.
  • the bus bar of the first reflector 81 and the bus bar of the second reflector 82 are in a linear configuration or a curved configuration, which can be achieved by replacing the bus bar of the first reflector 81 and the second reflector 82 with different bus bar configurations.
  • the working process of the induction plasma acceleration device under this structure is: the control assembly 5 sends out the first control signal 61, starts the pulse laser assembly 1, emits the pulse laser 11, and the linear configuration of the pulse laser 11 passes through the first mirror 81 After the reflecting surface and the reflecting surface of the second reflecting mirror 82 ablate the annular area on the solid working medium 4, a gaseous ablation product in the form of pulse gas is generated, and then the pulse gas moves to the periphery of the excitation coil assembly 3 and can receive induced pulses.
  • the control component 5 sends a second control signal 62 to turn on the pulse switch 21, so that the pulse switch 21, the energy storage capacitor 22 that has been charged to a preset high voltage, and the excitation coil component 3 are turned on ,
  • the pulse frequency of the pulse switch 21 is consistent with the pulse frequency of the pulse laser assembly 1 to perform pulse discharge;
  • the discharge generates a strong pulse current, which is excited by the excitation coil assembly 3 to generate an induced pulse electromagnetic field, and its circumferential electric field component Break down the pulsed gas and establish a circular plasma current.
  • Its radial magnetic field component interacts with the plasma current to generate an axial Lorentz force to accelerate the plasma, thereby generating propulsion and completing a work pulse.
  • the average thrust and average power can be adjusted by adjusting the operating frequency of the pulse laser assembly 1 and the pulse switch 21.
  • the circuit diagram of the pulse switch 21, the energy storage capacitor group and the excitation coil assembly 3 used to excite the induced pulse electromagnetic field is shown in FIG. 5.
  • Figure 6 shows a third implementation structure of an inductive plasma acceleration device in this embodiment, which includes a pulse laser assembly 1, a pulse discharge assembly, and an excitation coil with the same function and composition as the first implementation structure.
  • the specific implementation structure of the excitation coil assembly 3 in the third implementation structure is the same as that in the second implementation structure.
  • the induction plasma acceleration device also includes a support assembly, which includes a support base 72 and a tower 73 arranged on the support base 72.
  • the excitation coil assembly 3 is arranged on the support base 72 and coiled around the tower 73, Specifically, the support base 72 is provided with a ring-shaped coil slot 31, the coil slot 31 is sleeved on the bottom end of the tower 73, and the excitation coil assembly 3 is arranged in the coil slot 31; the pulse discharge assembly and the solid working medium 4 are both Installed on the bracket assembly, the reflection assembly, the pulse laser assembly 1 and the control assembly 5 are installed on the bracket 71 or a position outside the bracket 71.
  • the solid working medium 4 is a columnar structure, the bottom end of the solid working medium 4 abuts on the support base 72, the top of the solid working medium 4 is located in the tower 73, and the solid working medium 4 is located in the tower 73
  • the outer wall of the inner part is in contact with the inner wall of the tower 73;
  • the reflective assembly includes a reflective base frame 85 suspended above the tower 73, and a third reflector 83 and a lens 84 arranged on the reflective base frame 85.
  • the structure of this embodiment The reflective component in the Mirror is connected to the support base 72 through a mounting frame not shown; the third mirror 83 is located above the lens 84 and the reflective surface of the third mirror 83 faces the lens 84, and the lens 84 is surrounded by The annular skirt 86 extends downward, the lens 84 and the annular skirt 86 form a hood-like structure with a lower button; the lens 84 is located directly above the tower 73 and faces the end of the solid working medium 4, and the inner wall of the annular skirt 86 and The outer wall of the tower 73 encloses an annular nozzle facing the excitation coil assembly 3.
  • the pulse laser 11 emitted by the pulse laser assembly 1 passes through the reflective surface of the third mirror 83 and the lens 84 and then irradiates on the end of the solid working medium 4; specifically, the pulse laser 11 emitted by the pulse laser assembly 1 passes through the third
  • the reflecting surface of the reflecting mirror 83 vertically passes through the lens 84 and radiates vertically on the end of the solid working medium 4 after passing through the lens 84.
  • the lens 84 is detachably mounted on the launch base frame, and the detachable connection can be realized by threaded connection or snap connection; the lens 84 can be a focusing lens or a beam expander lens, as a solid working medium 4 When it is thinner, a focusing lens is used as the lens 84 in this embodiment, and when the solid working medium 4 is thicker, a beam expander lens is used as the lens 84 in this embodiment.
  • the support base 72 is provided with a ring-shaped restraining member 32, and the excitation coil assembly 3 is located between the inner wall of the ring-shaped restraining member 32 and the outer wall of the tower 73 to prevent the pulse generated by the laser ablating the solid working medium 4 The gas overflows from the edge of the excitation coil assembly 3.
  • a support spring 74 is provided on the support base 72 at a position corresponding to the solid working medium 4, and the end of the solid working medium 4 abuts on the support spring 74.
  • the support spring 74 has a certain shock absorption effect to prevent induction
  • the solid-state work of the columnar structure of the plasma acceleration device following the movement of the carrier is damaged by external forces.
  • the working process of the inductive plasma acceleration device under this structure is: the control assembly 5 sends out the first control signal 61, starts the pulse laser assembly 1, emits the pulse laser 11, and the linear configuration of the pulse laser 11 passes through the third mirror 83
  • the reflecting surface passes through the lens 84 vertically, and radiates vertically on the end of the solid working medium 4.
  • the solid working medium 4 is ablated from the end to produce gaseous ablation products in the form of pulsed gas, and then the pulsed gas passes through the tower.
  • the top opening of 73 and the annular nozzle move to a position around the excitation coil assembly 3 that can be affected by the induced pulse electromagnetic field, that is, directly above the excitation coil assembly 3; at this time, the control assembly 5 sends a second control signal 62 to turn on the pulse switch 21.
  • the pulse switch 21 Turn on the circuit composed of the pulse switch 21, the energy storage capacitor 22 that has been charged to the preset high voltage, and the excitation coil assembly 3, wherein the pulse frequency of the pulse switch 21 is consistent with the pulse frequency of the pulse laser assembly 1,
  • the pulse strong current is generated by the discharge, and the pulse strong current is excited by the excitation coil assembly 3 to generate an induction pulse electromagnetic field.
  • the average thrust and average power can be adjusted by adjusting the operating frequency of the pulse laser assembly 1 and the pulse switch 21.
  • the circuit diagram of the pulse switch 21, the energy storage capacitor group and the excitation coil assembly 3 used to excite the induced pulse electromagnetic field is shown in FIG. 7.
  • FIG 8 shows an inductive plasma acceleration method provided by this embodiment.
  • the inductive plasma acceleration device described above is adopted, which specifically includes the following steps:
  • Step 801 ablate the solid working medium 4 by the pulse laser 11 to generate a pulsed gaseous ablation product, that is, a pulsed gas flow;
  • Step 802 Break down the gaseous ablation product by inducing the circumferential electric field component of the pulse electromagnetic field and establish a circular plasma current;
  • Step 803 generating an axial Lorentz force to accelerate the plasma through the interaction between the radial magnetic field component of the induced pulse electromagnetic field and the plasma current, thereby generating a propulsion effect;
  • the output and pulse frequency of pulsed gaseous ablation products are controlled by controlling the power and frequency of the pulsed laser 11.

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Abstract

一种感应式等离子体加速装置及方法，包括脉冲激光组件(1)、脉冲放电组件、激励线圈组件(3)、固态工质(4)与控制组件(5)；激励线圈组件(3)与脉冲放电组件电联以使得脉冲放电组件放电过程中在激励线圈组件(3)内产生脉冲强电流，进一步在激励线圈组件(3)周围激发感应脉冲电磁场；固态工质(4)位于脉冲激光组件(1)所射出的脉冲激光(11)的光路上以使得固态工质(4)在脉冲激光(11)的烧蚀作用下产生脉冲气体，感应脉冲电磁场位于脉冲气体的流通气路上以使得脉冲气体能够进入感应脉冲电磁场；脉冲激光组件(1)、脉冲放电组件均与控制组件(5)电联。通过对工质供给方式的创新，解决其使用中的寿命瓶颈问题，达到高效利用工质、充分发挥该类推进装置优点、推动各类装置实用化的目的。

Description

一种感应式等离子体加速装置及方法 【技术领域】
本发明涉及电推进技术领域，具体是一种感应式等离子体加速装置及方法。
【背景技术】
多种工程应用场合需要在实现等离子体的生成并对其进行加速。典型应用包括等离子体喷涂、表面加工领域，或者是航天领域的推进系统。
在航天领域中，推进装置作为提供动力的部分，对航天器极为重要，是航天器能够完成任务的基础。相较于传统的化学推进，电推进通过电能加速推进剂以获得推力，其推进能量来自于推进剂之外，可获得更高的喷射速度，因而可有效减少推进剂消耗，增加航天器的有效载荷。目前，电推进技术在航天器上已经得到了广泛应用，高轨通信卫星上已有半数以上装备了电推进系统，并成为了卫星平台是否具有先进性的标志之一。
电推进中，有一类推进装置采用电磁力加速等离子体，是电推进中的一种重要类别，也是近年来国际研究的热点。其工作原理是依靠电能电离工质获得等离子体、并进一步依靠电磁力对等离子体进行加速，使其达到极快速度向外喷射，与此同时，根据作用力与反作用力原理，喷射的等离子体将对装置自身产生一个反推动力或者冲量。
传统的等离子体加速装置，如脉冲等离子体推力器(PPT，Pulsed PlasmaThruster)，产生等离子体的方式本质上属于电极间放电，故一个必须的部件是放电电极。PPT工作时，通过火花塞进行微量放电引发两个平行板电极之间的主放电，主放电产生较大放电电流建立自身感应磁场，同时烧蚀剥离一层固体工质，进一步形成等离子体。等离子体电流与磁场相互作用产生洛伦兹力使其加速喷射从而产生一个脉冲的推力。由于存在电极，该类推进装置不可避免地会因电极烧蚀而引发寿命缩短、等离子体成分污染、工质兼容性差等问题，使得推进装置的实际应用受到一定制约。
基于上述原因，研究者们提出了一种使用气态工质的无电极的脉冲感应等离子体推力器(亦称感应式脉冲等离子体推力器)。该种装置利用脉冲感应放电原理与感应涡流斥力原理实现工质的电离与加速，采用的工质为气体，通过一个脉冲式的气体阀控制。该装置工作时，分为两个阶段：第一阶段，喷注器上游的脉冲气体供给阀快速开启，工质气体通过塔式喷注器向激励线圈组表面喷注，达到指定的气体团质量后脉冲气体阀迅速关闭；工质气体沿激励线圈组表面运动并铺展开来，直至达到预想的气体分布；第二阶段，储能电容 触发放电，在激励线圈组中产生脉冲强电流；脉冲电流通过激励线圈组激发感应的脉冲电磁场，其周向电场分量击穿气体并建立环形等离子体电流；其径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推力，完成一个工作脉冲。多个工作脉冲以一定重复频率进行工作时，装置就可以获得持续的推动作用。
由上述表述可知，现有的气态工质脉冲感应等离子体推力器采用高速开启和关闭的脉冲气体阀实现脉冲供气，如果阀门开启和关闭过于缓慢，则部分气体到达激励线圈时脉冲放电尚未开始或者放电已经结束，那么大量的工质将因散逸而浪费，这对工质十分宝贵的航天应用场合是不可接受的。因此推力器对脉冲气体供给子系统提出了极高要求，其阀门的延迟时间、开启时间、关闭时间要求都极为苛刻，启闭时间需要短至百微秒甚至数十微秒量级。除此之外，目前已有的基于高速脉冲气体阀的脉冲感应等离子体推力器，还存在如下问题：
1.寿命问题。推力器以重复频率形式工作，每一个脉冲中阀门都需要以极高速度开启和关闭，运动部件必然需要承受极大的力，因此阀门寿命成为了整个装置的瓶颈问题。以美国各核心部件的典型情况为例，其中放电电容寿命可达10 7次，放电开关可达10 5次，但典型的脉冲气体阀的寿命仅10 3次，极大地制约了该类装置的实际应用。
2.功耗问题。阀门的阀芯高速地在静止-高速运动-静止状态之间切换，很大一部分能量将不得不损耗在阀芯的制动上，因此需要较大的额外功率方可驱动阀门工作。这在造成降低系统效率的同时，还带来了散热、系统复杂等问题。
3.干扰问题。阀门的驱动装置和激励线圈组的驱动电路存在电气上连接，可能导致二者之间相互干扰，甚至阀门误动作。这在时序需要密切配合的实际工作中是不允许的。
【发明内容】
针对现有技术中气态工质的感应式脉冲等离子体加速装置中工质供给方面的短板，本发明提供一种感应式等离子体加速装置及方法，通过对工质供给方式的创新，结合推进装置整体进行设计，解决其使用中的寿命瓶颈问题，达到高效利用工质、充分发挥该类推进装置优点、推动各类装置实用化的目的。
为实现上述目的，本发明提供一种感应式等离子体加速装置，包括脉冲激光组件、脉冲放电组件、激励线圈组件、固态工质与控制组件；
所述激励线圈组件与所述脉冲放电组件电联以使得所述脉冲放电组件放电过程中在所述激励线圈组件内产生脉冲强电流，进一步在所述激励线圈组件周围激发感应脉冲电磁场；
所述固态工质位于所述脉冲激光组件所射出的脉冲激光的光路上以使得所述固态工 质在脉冲激光的烧蚀作用下产生脉冲气体，所述感应脉冲电磁场位于所述脉冲气体的流通气路上以使得所述脉冲气体能够进入所述感应脉冲电磁场；
所述脉冲激光组件、所述脉冲放电组件均与所述控制组件电联以用于控制脉冲激光组件所射出的脉冲激光的功率与频率。
进一步优选的，所述脉冲激光组件所射出的脉冲激光的光路上设有能够改变光路方向的反射组件以使得激光能够按照预定强度分布准确地并照射在所述固态工质上。
进一步优选的，还包括支架，所述反射组件包括设在支架上的第一反射镜与第二反射镜，所述第一反射镜为轴对称锥状构型，所述第二反射镜为轴对称环形构型；
所述第一反射镜位于所述第二反射镜的环形口内，所述第一反射镜的反射片位于所述锥状构型的锥面上，所述第二反射镜的反射面位于所述环形构型的内环面上；
所述固态工质、所述激励线圈组件均设在所述支架上且位于所述第一反射镜的反射面与第二反射镜的反射面之间，所述激励线圈组件位于所述固态工质下方并在所述固态工质上方激发感应脉冲电磁场；
所述脉冲激光组件所射出的脉冲激光经过所述第一反射镜的反射面、所述第二反射镜的反射面后照射在所述固态工质上。
进一步优选的，所述第一反射镜的母线与所述第二反射镜的母线为直线构型或曲线构型。
进一步优选的，还包括支架组件，所述支架组件包括支撑基架以及设在所述支撑基架上的塔筒，所述激励线圈组件设在所述支撑基架上且盘绕在所述塔筒周围；
所述固态工质为柱状结构，所述固态工质的一端抵接在所述支撑基架上，另一端位于所述塔筒内，所述固态工质位于所述塔筒内的部分的外壁与所述塔筒的内壁接触相连；
所述反射组件包括悬设在所述塔筒上方的反射基架以及设在所述反射基架上的第三反射镜与透镜，所述第三反射镜位于所述透镜的上方且所述第三反射镜的反射面朝向所述透镜，所述透镜的周围设有向下延伸的环形裙边，所述透镜位于所述塔筒的正上方且朝向所述固态工质的端部，所述环形裙边的内壁与所述塔筒的外壁之间围成朝向所述激励线圈组件的环形喷嘴；
所述脉冲激光组件所射出的脉冲激光经过所述第三反射镜的反射面、所述透镜后照射在所述固态工质的端部上。
进一步优选的，所述支撑基架上设有环形结构的约束件，所述激励线圈组件位于所述约束件的内壁与所述塔筒的外壁之间。
进一步优选的，所述支撑基架上对应所述固态工质的位置设有支撑弹簧，所述固态工 质的端部抵接在所述支撑弹簧上。
进一步优选的，所述激励线圈组件由多支螺旋线形天线按轴对称方式交叠而成。
进一步优选的，所述固态工质由高聚物材料或金属材料制成。
为实现上述目的，本发明还提供一种感应式等离子体加速方法，采用上述感应式等离子体加速装置，具体包括如下步骤：
通过脉冲激光烧蚀固态工质产生脉冲气态烧蚀产物，即脉冲气流；
通过感应脉冲电磁场的周向电场分量来击穿气态烧蚀产物并建立环形等离子体电流；
通过感应脉冲电磁场的径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推进作用；
其中，通过控制脉冲激光的功率与频率来控制脉冲气态烧蚀产物的产量与脉冲频率。
本发明的有益技术效果：
(1)本发明中的感应式等离子体加速装置基于脉冲激光烧蚀固态工质以实现工质供给，并进一步采用脉冲感应放电原理及感应涡流斥力原理实现了等离子体的电离与加速。相较于现有技术中的基于脉冲气体阀的方案，不存在需要高速运动的部件，更不需要对高速阀芯进行制动，通过调整脉冲激光的脉冲周期来控制对固态工质的烧蚀后产生的脉冲气流的脉冲频率，代替现有技术中通过脉冲气流阀对气流控制形成脉冲气流的脉冲频率。而对于脉冲激光组件而言，调整脉冲激光的周期只需从电路上进行控制即可，无需向脉冲气流阀一样高频次机械动作，解决了寿命瓶颈问题，提高了系统效率；
(2)本发明中的感应式等离子体加速装置由于采用固态工质，省去了工质储箱、管道和阀门等部件，有效降低了系统复杂度；
(3)本发明中的感应式等离子体加速装置，由脉冲激光组件、固态工质组成的工质供给部分与由脉冲放电组件、激励线圈组件组成的强放电部分之间实现了光电解耦，极大降低了工质供给部分与主放电部分之间相互串扰、出现误动作的可能性。
(4)本发明中的感应式等离子体加速装置无电极结构，不存在困扰各类电磁式推力器的电极烧蚀问题，具备极佳的长寿命运行潜力及大功率负载能力，并且无需附加磁场，只存在单级放电过程，结构简单，同时以脉冲方式工作，可通过改变脉冲频率灵活调整平均推力与功率，在空间推进领域具备较好的应用前景。
【附图说明】
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根 据这些附图示出的结构获得其他的附图。
图1为本发明实施例中感应式等离子体加速装置的第一种实施结构示意图；
图2为本发明实施例中感应式等离子体加速装置的第一种实施结构的激励线圈组件的结构示意图；
图3为本发明实施例中感应式等离子体加速装置的第二种实施结构示意图；
图4为本发明实施例中感应式等离子体加速装置的第二种实施结构的激励线圈组件的结构示意图；
图5为本发明实施例中感应式等离子体加速装置的第二种实施结构的用以激发感应脉冲电磁场的脉冲开关、储能电容组和激励线圈组件的电路图；
图6为本发明实施例中感应式等离子体加速装置的第三种实施结构示意图；
图7为本发明实施例中感应式等离子体加速装置的第三种实施结构的用以激发感应脉冲电磁场的脉冲开关、储能电容组和激励线圈组件的电路图；
图8为本发明实施例中感应式等离子体加速方法得流程示意图。
附图标号说明：1、脉冲激光组件；11、脉冲激光；21、脉冲开关；22、储能电容；3、激励线圈组件；31、线圈槽；32、约束件；4、固态工质；5、控制组件；61、第一控制信号；62、第二控制信号；71、支架；72、支撑基架；73、塔筒；74、支撑弹簧；81、第一反射镜；82、第二反射镜；83、第三反射镜；84、透镜；85、反射基架；86、环形裙边
本发明目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。
【具体实施方式】
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明的一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
需要说明，本发明实施例中所有方向性指示(诸如上、下、左、右、前、后……)仅用于解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等，如果该特定姿态发生改变时，则该方向性指示也相应地随之改变。
另外，在本发明中如涉及“第一”、“第二”等的描述仅用于描述目的，而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本发明的描述中，“多个”的含义是至少两个，例如两个，三个等，除非另有明确具体的限定。
在本发明中，除非另有明确的规定和限定，术语“连接”、“固定”等应做广义理解， 例如，“固定”可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接，还可以是物理连接或无线通信连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系，除非另有明确的限定。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。
另外，本发明各个实施例之间的技术方案可以相互结合，但是必须是以本领域普通技术人员能够实现为基础，当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在，也不在本发明要求的保护范围之内。
实施例一
图1所示的是本实施例中一种感应式等离子体加速装置的第一种实施结构，其包括：
脉冲激光组件1，用于产生脉冲激光11，本实施例中采用脉冲激光器或者采用其他能够发射出脉冲激光的设备作为脉冲激光组件1；
脉冲放电组件，由脉冲开关21与储能电容22电联组成，用于进行脉冲放电；其中，脉冲开关21选用高峰值电流的脉冲开关21或开关阵列，并对脉冲开关21的高压端采用耐高温环氧树脂进行整体封装，提升其在近真空环境下使用时的绝缘性能；储能电容22用于储存放电能量，储能电容22的接线柱采用封装式结构，以提高真空环境下使用的绝缘性和密封性；储能电容22的数量为一个或多个，当储能电容22的数量为多个时，所有电容器在空间上按轴对称方式紧密环绕于脉冲开关21四周。
激励线圈组件3，由多支螺旋线形天线按轴对称方式交叠而成，即如图2所示；激励线圈组件3也可以是其他的表现形式，本实施例中不再一一赘述；且安置在线圈槽31中，线圈槽31由绝缘材料构成；激励线圈组件3与脉冲开关21、储能电容22电联进而形成一个完整的电回路，以使得脉冲放电组件放电过程中在激励线圈组件3内产生脉冲强电流，进一步在激励线圈组件3周围激发感应脉冲电磁场；其中，激励线圈组件3与脉冲开关21、储能电容22电联进而形成一个完整的电回路时，每个储能电容22的一极与单支螺旋线形天线的一端串联，该单支螺旋线形天线的另一端又连接至脉冲开关21的一端，储能电容22的另一极直接连接至脉冲开关21的另一端；
固态工质4，由高聚物材料或金属材料制成，安置在激励线圈组件3并且位于脉冲激光组件1所射出的脉冲激光11的光路上以使得固态工质4在脉冲激光11的烧蚀作用下产生脉冲气体，同时使得激光烧蚀固态工质4所产生的脉冲气体能够进入感应脉冲电磁场；
控制组件5，与激励线圈组件3、脉冲放电组件电联，用于控制脉冲激光组件1与脉冲开关21的开启与关闭，可以采用PLC控制箱或电气控制箱或信号发生器作为控制组件 5，本实施例中采用市面上常见的信号发生器作为控制组件5，通过将信号发生器设定好产生两个触发脉冲来控制脉冲激光组件1与脉冲开关21的运行，达到脉冲激光组件1与脉冲放电组件二者之间匹配工作的效果，进一步的，这两个触发脉冲以一定频率进行重复工作，可以达到控制推力大小的效果。
优选的，激励线圈组件3周围设有环形结构的约束件32，固态工质4位于约束件32的环形口内，以防止激光烧蚀固态工质4所产生的脉冲气体从激励线圈组件3的边缘溢出。
该结构下的感应式等离子体加速装置的工作过程为：控制组件5发出第一控制信号61，启动脉冲激光组件1，发射激光束烧蚀固态工质4，产生的脉冲气体形式的气态烧蚀产物，随后脉冲气体运动到激励线圈组件3周围能够受感应脉冲电磁场作用的位置，即激励线圈组件3的正上方；此时，控制组件5发出第二控制信号62，接通脉冲开关21，使脉冲开关21、已充电至预设高电压的储能电容22、激励线圈组件3三者组成的回路导通，其中，脉冲开关21的脉冲频率与脉冲激光组件1的脉冲频率一致，以进行脉冲放电；由放电产生脉冲强电流，脉冲强电流通过激励线圈组件3激发产生感应脉冲电磁场，其周向电场分量击穿脉冲气体并建立环形等离子体电流，其径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推进作用，完成一个工作脉冲。其中，可以通过调节脉冲激光组件1与脉冲开关21的工作频率实现平均推力和平均功率的调节。
实施例二
图3所示的是本实施例中一种感应式等离子体加速装置的第二种实施结构，其包括与第一种实施结构中功能、构成相同的脉冲激光组件1、脉冲放电组件、激励线圈组件3、固态工质4与控制组件5；其还包括设在脉冲激光组件1所射出的脉冲激光11的光路上的反射组件，以用于使激光能够按照预定强度分布准确地照射在固态工质4上。与第一种实施结构的不同点在于，第二种实施结构中的激励线圈组件3由多支螺旋线形天线按轴对称方式交叠而成，优选的，其中单支的螺旋线形天线具体为阿基米德螺旋线线型，即如图4从左至右所示出的单支螺旋线形天线以及2只与6只螺旋线形天线组成的激励线圈组件3；激励线圈组件3也可以是其他的表现形式，本实施例中不再一一赘述。
在该种实施结构下，感应式等离子体加速装置还包括支架71，脉冲放电组件、激励线圈组件3、固态工质4与反射组件均安装在支架71上，脉冲激光组件1与控制组件5安装在支架71上或支架71外的位置。
本实施结构下的固态工质4为环形片状结构，反射组件包括可拆卸安装在支架71上的第一反射镜81与第二反射镜82，第一反射镜81为轴对称锥状构型，第二反射镜82为轴对称环形构型；第一反射镜81位于第二反射镜82的环形口内，第一反射镜81的反射 片位于锥状构型的锥面上，第二反射镜82的反射面位于环形构型的内环面上。
固态工质4、激励线圈组件3均设在支架71上且位于第一反射镜81的反射面与第二反射镜82的反射面之间，即第一反射镜81位于固态工质4的环形口内，优选的，第一反射镜81的锥形轴线、固态工质4的环形轴线以及第二反射镜82的环形轴线三者重合；激励线圈组件3位于固态工质4下方并在固态工质4上方激发感应脉冲电磁场，具体的，支架71上安装有环形结构的线圈槽31，激励线圈组件3安置在线圈槽31内，固态工质4铺设在线圈槽31上，第一反射镜81安装在线圈槽31的内环位置，第二反射镜82安装在线圈槽31的外环位置。
在该种实施结构下，脉冲激光组件1所射出的脉冲激光11经过第一反射镜81的反射面、第二反射镜82的反射面后照射在固态工质4上，优选的，脉冲激光组件1所射出的脉冲激光11的中心与第一反射镜81的锥形轴线重合，使得从脉冲激光组件1所射出的线形构型的脉冲激光11经过第一反射镜81的反射面后变成环形面构型的激光面，并经过第二反射镜82的反射面后对固态工质4上环形区域进行辐射，使得脉冲激光11能够按照预定强度分布，准确地辐射在固态工质4上。
优选的，第一反射镜81的母线与第二反射镜82的母线为直线构型或曲线构型，可以通过更换不同母线构型的第一反射镜81的母线与第二反射镜82来达到改变脉冲激光11在固态工质4上的辐射面积与位置的效果。
该结构下的感应式等离子体加速装置的工作过程为：控制组件5发出第一控制信号61，启动脉冲激光组件1，发射脉冲激光11，线形构型的脉冲激光11经过第一反射镜81的反射面、第二反射镜82的反射面后对固态工质4上的环形区域进行烧蚀，产生的脉冲气体形式的气态烧蚀产物，随后脉冲气体运动到激励线圈组件3周围能够受感应脉冲电磁场作用的位置，即激励线圈组件3的正上方，其中，第二反射镜82起到约束件32的效果，以防止激光烧蚀固态工质4所产生的脉冲气体从激励线圈组件3的边缘溢出；此时，控制组件5发出第二控制信号62，接通脉冲开关21，使脉冲开关21、已充电至预设高电压的储能电容22、激励线圈组件3三者组成的回路导通，其中，脉冲开关21的脉冲频率与脉冲激光组件1的脉冲频率一致，以进行脉冲放电；由放电产生脉冲强电流，脉冲强电流通过激励线圈组件3激发产生感应脉冲电磁场，其周向电场分量击穿脉冲气体并建立环形等离子体电流，其径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推进作用，完成一个工作脉冲。其中，可以通过调节脉冲激光组件1与脉冲开关21的工作频率实现平均推力和平均功率的调节。其中，用来激发感应脉冲电磁场的脉冲开关21、储能电容组和激励线圈组件3的电路图如图5所示。
实施例三
图6所示的是本实施例中一种感应式等离子体加速装置的第三种实施结构，其包括与第一种实施结构中功能、构成相同的脉冲激光组件1、脉冲放电组件、激励线圈组件3、固态工质4与控制组件5；其还包括设在脉冲激光组件1所射出的脉冲激光11的光路上的反射组件，以用于使激光能够准确、均匀的照射在固态工质4上。其中，第三种实施结构中的激励线圈组件3的具体实施结构与第二种实施结构中相同。
感应式等离子体加速装置还包括支架组件，支架组件包括支撑基架72以及设在支撑基架72上的塔筒73，激励线圈组件3设在支撑基架72上且盘绕在塔筒73周围，具体的，支撑基架72上设有环形结构的线圈槽31，线圈槽31套设在塔筒73的底端，激励线圈组件3安置在线圈槽31内；脉冲放电组件、固态工质4均安装在支架组件上，反射组件、脉冲激光组件1与控制组件5安装在支架71上或支架71外的位置。在该种实施结构下固态工质4为柱状结构，固态工质4的底端抵接在支撑基架72上，固态工质4的顶端位于塔筒73内，固态工质4位于塔筒73内的部分的外壁与塔筒73的内壁接触相连；反射组件包括悬设在塔筒73上方的反射基架85以及设在反射基架85上的第三反射镜83与透镜84，本实施结构中的反射组件通过并未图示的安装架连接在支撑基架72上；第三反射镜83位于透镜84的上方且第三反射镜83的反射面朝向透镜84，透镜84的周围设有向下延伸的环形裙边86，透镜84与环形裙边86组成一个下扣的罩状结构；透镜84位于塔筒73的正上方且朝向固态工质4的端部，环形裙边86的内壁与塔筒73的外壁之间围成朝向激励线圈组件3的环形喷嘴。
脉冲激光组件1所射出的脉冲激光11经过第三反射镜83的反射面、透镜84后照射在固态工质4的端部上；具体的，脉冲激光组件1所射出的脉冲激光11经过第三反射镜83的反射面后垂直穿过透镜84，并在穿过透镜84后垂直辐射在固态工质4的端部上。在该种实施结构中，透镜84可拆卸的安装在发射基架上，可以通过螺纹连接或卡扣连接的方式实现可拆卸连接；透镜84可以是聚焦透镜或扩束透镜，当固态工质4较细时，则采用聚焦透镜作为本实施例中的透镜84，当固态工质4较粗时，则采用扩束透镜作为本实施例中的透镜84。
优选的，支撑基架72上设有环形结构的约束件32，激励线圈组件3位于环形约束件32的内壁与塔筒73的外壁之间，以防止激光烧蚀固态工质4所产生的脉冲气体从激励线圈组件3的边缘溢出。
优选的，支撑基架72上对应固态工质4的位置设有支撑弹簧74，固态工质4的端部抵接在支撑弹簧74上，支撑弹簧74起到一定的减震作用，防止感应式等离子体加速装置 在跟随载体运动的过程柱状结构的固态工作因外力损坏。
该结构下的感应式等离子体加速装置的工作过程为：控制组件5发出第一控制信号61，启动脉冲激光组件1，发射脉冲激光11，线形构型的脉冲激光11经过第三反射镜83的反射面后垂直穿过透镜84，并垂直辐射在固态工质4的端部，对固态工质4从端部开始烧蚀，产生的脉冲气体形式的气态烧蚀产物，随后脉冲气体经过塔筒73的顶端开口、环形喷嘴后运动到激励线圈组件3周围能够受感应脉冲电磁场作用的位置，即激励线圈组件3的正上方；此时，控制组件5发出第二控制信号62，接通脉冲开关21，使脉冲开关21、已充电至预设高电压的储能电容22、激励线圈组件3三者组成的回路导通，其中，脉冲开关21的脉冲频率与脉冲激光组件1的脉冲频率一致，以进行脉冲放电；由放电产生脉冲强电流，脉冲强电流通过激励线圈组件3激发产生感应脉冲电磁场，其周向电场分量击穿脉冲气体并建立环形等离子体电流，其径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推进作用，完成一个工作脉冲。其中，可以通过调节脉冲激光组件1与脉冲开关21的工作频率实现平均推力和平均功率的调节。其中，用来激发感应脉冲电磁场的脉冲开关21、储能电容组和激励线圈组件3的电路图如图7所示。
图8所示的是本实施例提供的一种感应式等离子体加速方法，采用上述感应式等离子体加速装置，具体包括如下步骤：
步骤801，通过脉冲激光11烧蚀固态工质4产生脉冲气态烧蚀产物，即脉冲气流；
步骤802，通过感应脉冲电磁场的周向电场分量来击穿气态烧蚀产物并建立环形等离子体电流；
步骤803，通过感应脉冲电磁场的径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推进作用；
其中，通过控制脉冲激光11的功率与频率来控制脉冲气态烧蚀产物的产量与脉冲频率。
以上所述仅为本发明的优选实施例，并非因此限制本发明的专利范围，凡是在本发明的发明构思下，利用本发明说明书及附图内容所作的等效结构变换，或直接/间接运用在其他相关的技术领域均包括在本发明的专利保护范围内。

Claims (10)

  1. 一种感应式等离子体加速装置，其特征在于，包括脉冲激光组件(1)、脉冲放电组件、激励线圈组件(3)、固态工质(4)与控制组件(5)；
    所述激励线圈组件(3)与所述脉冲放电组件电联以使得所述脉冲放电组件放电过程中在所述激励线圈组件(3)内产生脉冲强电流，进一步在所述激励线圈组件(3)周围激发感应脉冲电磁场；
    所述固态工质(4)位于所述脉冲激光组件(1)所射出的脉冲激光(11)的光路上以使得所述固态工质(4)在脉冲激光(11)的烧蚀作用下产生脉冲气体，所述感应脉冲电磁场位于所述脉冲气体的流通气路上以使得所述脉冲气体能够进入所述感应脉冲电磁场；
    所述脉冲激光组件(1)、所述脉冲放电组件均与所述控制组件(5)电联以用于控制脉冲激光组件(1)所射出的脉冲激光(11)的功率与频率。
  2. 根据权利要求1所述感应式等离子体加速装置，其特征在于，所述脉冲激光组件(1)所射出的脉冲激光(11)的光路上设有能够改变光路方向的反射组件以使得激光能够按照预定强度分布准确地照射在所述固态工质(4)上。
  3. 根据权利要求2所述感应式等离子体加速装置，其特征在于，还包括支架(71)，所述反射组件包括设在支架(71)上的第一反射镜(81)与第二反射镜(82)，所述第一反射镜(81)为轴对称锥状构型，所述第二反射镜(82)为轴对称环形构型；
    所述第一反射镜(81)位于所述第二反射镜(82)的环形口内，所述第一反射镜(81)的反射片位于所述锥状构型的锥面上，所述第二反射镜(82)的反射面位于所述环形构型的内环面上；
    所述固态工质(4)、所述激励线圈组件(3)均设在所述支架(71)上且位于所述第一反射镜(81)的反射面与第二反射镜(82)的反射面之间，所述激励线圈组件(3)位于所述固态工质(4)下方并在所述固态工质(4)上方激发感应脉冲电磁场；
    所述脉冲激光组件(1)所射出的脉冲激光(11)经过所述第一反射镜(81)的反射面、所述第二反射镜(82)的反射面后照射在所述固态工质(4)上。
  4. 根据权利要求3所述感应式等离子体加速装置，其特征在于，所述第一反射镜(81)的母线与所述第二反射镜(82)的母线为直线构型或曲线构型。
  5. 根据权利要求2所述感应式等离子体加速装置，其特征在于，还包括支架组件，所述支架组件包括支撑基架(72)以及设在所述支撑基架(72)上的塔筒(73)，所述激励线圈组件(3)设在所述支撑基架(72)上且盘绕在所述塔筒(73)周围；
    所述固态工质(4)为柱状结构，所述固态工质(4)的一端抵接在所述支撑基架(72)上，另一端位于所述塔筒(73)内，所述固态工质(4)位于所述塔筒(73)内的部分的外壁与所述塔筒(73)的内壁接触相连；
    所述反射组件包括悬设在所述塔筒(73)上方的反射基架(85)以及设在所述反射基架(85)上的第三反射镜(83)与透镜(84)，所述第三反射镜(83)位于所述透镜(84)的上方且所述第三反射镜(83)的反射面朝向所述透镜(84)，所述透镜(84)的周围设有向下延伸的环形裙边(86)，所述透镜(84)位于所述塔筒(73)的正上方且朝向所述固态工质(4)的端部，所述环形裙边(86)的内壁与所述塔筒(73)的外壁之间围成朝向所述激励线圈组件(3)的环形喷嘴；
    所述脉冲激光组件(1)所射出的脉冲激光(11)经过所述第三反射镜(83)的反射面、所述透镜(84)后照射在所述固态工质(4)的端部上。
  6. 根据权利要求5所述感应式等离子体加速装置，其特征在于，所述支撑基架(72)上设有环形结构的约束件(32)，所述激励线圈组件(3)位于所述约束件(32)的内壁与所述塔筒(73)的外壁之间。
  7. 根据权利要求5所述感应式等离子体加速装置，其特征在于，所述支撑基架(72)上对应所述固态工质(4)的位置设有支撑弹簧(74)，所述固态工质(4)的端部抵接在所述支撑弹簧(74)上。
  8. 根据权利要求1至7任一项所述感应式等离子体加速装置，其特征在于，所述激励线圈组件(3)由多支螺旋线形天线按轴对称方式交叠而成。
  9. 根据权利要求1至7任一项所述感应式等离子体加速装置，其特征在于，所述固态工质(4)由高聚物材料或金属材料制成。
  10. 一种感应式等离子体加速方法，其特征在于，采用权利要求1-9任一项所述感应式等离子体加速装置，具体包括如下步骤：
    通过脉冲激光(11)烧蚀固态工质(4)产生脉冲气态烧蚀产物，即脉冲气流；
    通过感应脉冲电磁场的周向电场分量来击穿气态烧蚀产物并建立环形等离子体电流；
    通过感应脉冲电磁场的径向磁场分量与等离子体电流相互作用产生轴向洛伦兹力加速等离子体，从而产生推进作用；
    其中，通过控制脉冲激光(11)的功率与频率来控制脉冲气态烧蚀产物的产量与脉冲频率。
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