WO2021046929A1 - Large-diameter ni-cr rotating target containing trace elements and preparation method therefor - Google Patents

Large-diameter ni-cr rotating target containing trace elements and preparation method therefor Download PDF

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WO2021046929A1
WO2021046929A1 PCT/CN2019/108215 CN2019108215W WO2021046929A1 WO 2021046929 A1 WO2021046929 A1 WO 2021046929A1 CN 2019108215 W CN2019108215 W CN 2019108215W WO 2021046929 A1 WO2021046929 A1 WO 2021046929A1
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diameter
rotating target
trace elements
containing trace
target containing
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PCT/CN2019/108215
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French (fr)
Chinese (zh)
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吴宇宁
卿海标
周其刚
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南京达迈科技实业有限公司
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Publication of WO2021046929A1 publication Critical patent/WO2021046929A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21CMANUFACTURE OF METAL SHEETS, WIRE, RODS, TUBES OR PROFILES, OTHERWISE THAN BY ROLLING; AUXILIARY OPERATIONS USED IN CONNECTION WITH METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL
    • B21C37/00Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape
    • B21C37/06Manufacture of metal sheets, bars, wire, tubes or like semi-manufactured products, not otherwise provided for; Manufacture of tubes of special shape of tubes or metal hoses; Combined procedures for making tubes, e.g. for making multi-wall tubes
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/02Making non-ferrous alloys by melting
    • C22C1/023Alloys based on nickel
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C19/00Alloys based on nickel or cobalt
    • C22C19/03Alloys based on nickel or cobalt based on nickel
    • C22C19/05Alloys based on nickel or cobalt based on nickel with chromium
    • C22C19/058Alloys based on nickel or cobalt based on nickel with chromium without Mo and W
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/002Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working by rapid cooling or quenching; cooling agents used therefor
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering

Definitions

  • the invention relates to a magnetron sputtering target material and its preparation, in particular to a large-diameter Ni-Cr rotating target material containing trace elements and a preparation method thereof.
  • One of the objectives of the present invention is to provide a large-diameter Ni-Cr rotating target material containing trace elements.
  • the addition of trace elements enables the alloy to be effectively fed during the later stage of solidification, reducing the area of defect formation, and It can inhibit the initiation of cracks, improve the bonding force of the grain boundary, and refine the grains, thereby increasing the yield;
  • the second purpose of the present invention is to improve the preparation method of a large-diameter Ni-Cr rotating target containing trace elements.
  • the obtained rotating target material has high utilization rate, can be applied to special coating industry, and can overcome the problems of nickel-chromium tube cracking, inclusions, defects, eccentricity and processing difficulties during the preparation process.
  • the content of Fe as an impurity in the rotating target is less than 0.01%.
  • Impurity iron has the greatest impact on the target magnetron sputtering, so the appropriate raw material composition ratio and preparation process are adopted to reduce the impurity iron content in the rotating target.
  • the present invention also provides a method for preparing the large-diameter Ni-Cr rotating target material containing trace elements.
  • the preparation steps mainly include raw material preparation, vacuum melting, hot forging, machining, hot extrusion, pickling treatment, Solution treatment, cold rolling or boring, annealing treatment, machining or binding; the specific process is:
  • Vacuum smelting prepare raw materials before smelting, including photoelectric carbon with purity ⁇ 99.9%, boron particles with purity ⁇ 99.5%, metallic zirconium with purity ⁇ 99.5%, metallic magnesium or nickel-magnesium intermediate alloy with purity ⁇ 99.9%, purity ⁇ 99.43% metallic chromium, 99.96% electrolytic nickel; then the raw materials are mixed with electrolytic nickel, metallic chromium, and photoelectric carbon according to the content of the above components, and then vacuum smelted at 1400 ⁇ 1550°C for 70 ⁇ 90min, and then zirconium is added , Magnesium or nickel-magnesium master alloy and boron are refined for 10-20 minutes, and then cast in a protective atmosphere to obtain an ingot; wherein the vacuum degree is maintained at less than 4Pa during the entire smelting process; the protective atmosphere during casting can be argon;
  • Hot forging rough machining of the ingot before hot forging.
  • the lathe can be used to remove the surface oxide scale and some defects, and the riser can be cut to obtain a round truncated cone-shaped bright ingot, which is carefully ground to remove microcracks, etc.;
  • the ingot is hot forged.
  • the ingot is heated to 1100 ⁇ 1300°C, and after holding for 20 ⁇ 50min, forging is carried out, the forging temperature is 1100 ⁇ 1300°C, and the final forging temperature is 950 ⁇ 1050°C; the ingot is repeatedly roughed and then drawn Long, the deformation is greater than 50%; the deformation of the drawing here is greater than 50%, which is compared with the forging rod after the pier is thick.
  • Hot extrusion The alloy cylinder obtained in step (3) is heated by induction heating at a heating temperature of 1100-1200°C; then the hole is expanded at a speed of 150-220mm/s; then a secondary induction is used Heat treatment, the heating temperature is 1110-1220 DEG C, and the hot extruder is used for extrusion, and the extrusion speed is 120-150mm/s, to obtain the waste tube of the rotating target.
  • the waste tube can be processed to an outer diameter of 170-200mm, an inner diameter of 130-160mm, and a length of 2500-4500mm; it can also be adjusted according to the actual needs of the final target processed.
  • the pickling treatment pickling the waste pipe to remove defects such as surface pits; the pickling treatment can adopt the common pickling process in the prior art;
  • Solution treatment The acid-washed waste pipe is solid-solution treated to obtain a single-phase austenite structure at room temperature, so that the material has the best corrosion resistance, high plasticity, good formability, and can refine the waste pipe The grain structure.
  • the surface-treated waste tube is rolled or bored with high precision to obtain a bright tube with an inner hole size tolerance of ⁇ 0.2mm.
  • Annealing treatment the bright tube is annealed, the annealing temperature is 840 ⁇ 870°C, and the heat preservation is 80 ⁇ 90min.
  • the bright tube is processed to the overall rotating target of the required size, or processed to a certain size, and then the binding rotating target of the required size is made by binding.
  • the electrolytic nickel is baked at 550-650°C for 5-8 hours. Long-term baking can effectively remove most of the hydrogen contained in electrolytic nickel.
  • zirconium, magnesium, and boron are added in the vacuum melting process by enclosing the zirconium, magnesium, and boron by nickel foil; and the trace alloy elements metal zirconium and metal magnesium are added in the vacuum melting process in the above manner.
  • Boron particles can avoid boiling and sputtering of molten steel caused by direct addition.
  • the waste pipe is heated to 1000-1100° C. for heat preservation, and then water quenched.
  • a solution treatment at a lower temperature and rapid cooling are adopted to obtain a waste tube with fine grains and improve the plasticity and corrosion resistance of the material.
  • Electrolytic nickel can effectively remove the hydrogen contained in electrolytic nickel through long-term high-temperature baking; through repeated thickening and elongation forging process, reaming after induction heating and extrusion, finishing rolling or finishing after secondary induction heating Processes such as boring can improve the concentricity and yield rate of the rotating target;
  • Ni-Cr rotating target containing trace elements of the present invention has simple production process, high yield, high precision, low cost, large pipe diameter, and broad application prospects.
  • composition and content of the large-diameter Ni-Cr rotating target in this embodiment are as follows in terms of mass percentage: C 0.04%, B 0.06%, Zr 0.03%, Mg 0.09%, Cr 44% and the balance Ni and Inevitable impurities.
  • Vacuum melting prepare raw materials of photoelectric carbon, boron particles, metal zirconium, metal magnesium, metal chromium, and electrolytic nickel.
  • the raw materials are: photoelectric carbon with a purity of 99.9%, 99.83% boron particles, and 99.9% metal zirconium. 99.9% metallic magnesium, 99.95% metallic chromium, 99.96% electrolytic nickel;
  • the surface oil stains and oxides of electrolytic nickel and metallic chromium are cleaned and dried and weighed. Then, the electrolytic nickel is kept at 600°C for 6 hours and bake; then the raw materials are prepared according to the content of the above components.
  • the electrolytic nickel, metallic chromium Put the photoelectric carbon into a vacuum melting crucible and smelt with electricity. The melting temperature is 1500°C, and the melting time is 80min. Then add the metal zirconium, metal magnesium and boron particles wrapped in nickel foil successively, and then refining for 15min. The whole melting process is vacuum The degree is less than 4Pa; after smelting, the casting is carried out. Before casting, argon gas 4Mpa is passed in a vacuum state, and the casting is carried out under the condition of protective atmosphere. After 40 minutes of casting, the mold is demolded to obtain the ingot.
  • the second machining remove the surface oxide scale of the cylindrical forging rod, and process both ends of the forging rod to be flat to ensure that the end surface is perpendicular to the cylindrical surface. After processing, it will be a cylinder with a diameter of 299 ⁇ 1mm and a length greater than 500mm. Processed a central through hole with a diameter of 30mm, and processed a tapered hole with a 20° taper at one end to obtain an alloy cylinder;
  • Annealing treatment under the annealing temperature condition of 850°C, heat preservation for 85min for annealing treatment;
  • the preparation method of the large-diameter Ni-Cr rotating target of this embodiment is basically the same as that of embodiment 1, except that:
  • step (4) a central through hole with a diameter of 20mm is machined, and one end is machined into a tapered hole with a 30° taper;
  • step (9) the annealing temperature is 870°C and the temperature is kept for 90 minutes.
  • the preparation method of the large-diameter Ni-Cr rotating target of this embodiment is basically the same as that of embodiment 1, except that:
  • step (5) the induction heating temperature is 1200°C, and the second induction heating temperature is 1220°C;
  • step (7) the solution treatment is heated to 1100°C;
  • the Ni-Cr rotating targets containing trace elements prepared in Examples 1 to 5 were subjected to ICP chemical composition detection and purity testing, and the results are shown in Table 1 and Table 2 respectively. It can be seen from Table 1 that the actual detection content of chromium is slightly higher than the theoretical content (combined purity and input ratio). Trace elements such as zirconium, boron, magnesium, and carbon are all burnt, especially the content of magnesium is very small, so it is not Influencing the purity of the target material, on the contrary, it purifies some impurities and improves the purity; among them, impurity iron has the greatest influence on the magnetron sputtering of the target material, and the iron content of the rotating target material of the present invention is less than 0.01%.
  • the rotating target of the present invention can maintain the purity above 99.9% through the addition of trace elements and vacuum smelting, and can also prepare a high-purity nickel-chromium rotating target of greater than 99.95%, which satisfies most of the rotating sputtering materials. The purity requirements of the shooting target.

Abstract

A large-diameter Ni-Cr rotating target containing trace elements, comprising the following raw material components in mass percentage: C 0.01-0.05%, B 0.02-0.08%, Zr 0.01-0.06%, Mg 0.05-0.1%, Cr 7-44%, and the balance being Ni and inevitable impurities. Also provided is a preparation method for a large-diameter Ni-Cr rotating target containing trace elements.

Description

一种含微量元素的大管径Ni-Cr旋转靶材及其制备方法Large-diameter Ni-Cr rotating target material containing trace elements and preparation method thereof 技术领域Technical field
本发明涉及磁控溅射靶材及其制备,特别是涉及一种含微量元素的大管径Ni-Cr旋转靶材及其制备方法。The invention relates to a magnetron sputtering target material and its preparation, in particular to a large-diameter Ni-Cr rotating target material containing trace elements and a preparation method thereof.
背景技术Background technique
随着电子、新能源、建筑等工业领域的快速发展,薄膜电阻、太阳能光谱选择吸收膜、镀膜玻璃等的应用要求也日益提高。因此,磁控溅射镀膜技术需要更加完善,而靶材作为磁控溅射镀膜过程中最为关键的基本耗材,如何提高靶材的利用率和沉积薄膜的质量,通过研究发现只有致密度高、晶粒尺寸小且均匀的靶材,才具备高导电性、高导热性及高强度等优点。With the rapid development of electronics, new energy, construction and other industrial fields, the application requirements for thin film resistors, solar spectrum selective absorption films, and coated glass are also increasing. Therefore, the magnetron sputtering coating technology needs to be more perfect, and the target material is the most critical basic consumable in the magnetron sputtering coating process. How to improve the utilization rate of the target material and the quality of the deposited film? Targets with small and uniform grain size have the advantages of high electrical conductivity, high thermal conductivity, and high strength.
目前,国内使用的镍铬靶材大部分为平面靶材,旋转靶材只占很少的一部分。受到国外技术的封锁,国内目前只能生产一些小管径的镍铬旋转靶材。相较于利用率只有20~30%的平面靶材而言,旋转靶材的利用率可以高达70%,甚至超过70%,尤其大管径的镍铬旋转靶材利用率更高。而且大管径的镍铬旋转靶材可应用于特殊的产品镀膜,从而满足更多的市场需求。但是大管径镍铬合金管在传统的穿管、轧管工艺过程中,需要多次扩孔与更换模具,成本相当大,而且常出现开裂、夹杂物及偏心等缺陷,成品率很低,从而使镍铬合金管的生产成本居高不下。另外,由于环境保护的可持续发展理念,在合金熔炼过程中,使用发热剂来提高钢锭补缩的方式被取缔,为提高成材率,寻求一种生产工艺简单、成材率高、精度高、成本较低的大管径镍铬旋转靶材的制备方法势在必行。At present, most of the nickel-chromium targets used in China are plane targets, and rotating targets account for only a small part. Blocked by foreign technology, only a few small diameter nickel-chromium rotating targets can be produced in China. Compared with a flat target with a utilization rate of only 20-30%, the utilization rate of a rotating target material can be as high as 70%, or even more than 70%, especially a large-diameter nickel-chromium rotating target material has a higher utilization rate. In addition, large-diameter nickel-chromium rotating targets can be applied to special product coatings, so as to meet more market demands. However, in the traditional pipe-piercing and rolling process of large-diameter nickel-chromium alloy pipes, multiple reaming and mold replacement are required, which is quite costly, and defects such as cracks, inclusions and eccentricity often occur, and the yield is very low. As a result, the production cost of nickel-chromium alloy pipes remains high. In addition, due to the sustainable development concept of environmental protection, the use of heating agents to increase the feeding rate of steel ingots in the alloy smelting process has been banned. In order to improve the yield rate, a simple production process, high yield rate, high precision, and cost are sought. The preparation method of the lower large diameter Ni-Cr rotating target is imperative.
发明内容Summary of the invention
发明目的:本发明的目的之一是提供一种含微量元素的大管径Ni-Cr旋转靶材,利用微量元素的添加,使合金在凝固后期能够有效补缩,减少缺陷的形成面积,且能抑制裂纹的萌生,提高晶界结合力,细化晶粒,从而提高成材率;本发明的目的之二是提高一种含微量元素的大管径Ni-Cr旋转靶材的制备方法,制备得到的旋转靶材具备高利用率,可应用于特殊镀膜行业,且在制备过程中能够克服镍铬管开裂、夹杂物、缺陷、偏心及加工困难等问题。Objective of the invention: One of the objectives of the present invention is to provide a large-diameter Ni-Cr rotating target material containing trace elements. The addition of trace elements enables the alloy to be effectively fed during the later stage of solidification, reducing the area of defect formation, and It can inhibit the initiation of cracks, improve the bonding force of the grain boundary, and refine the grains, thereby increasing the yield; the second purpose of the present invention is to improve the preparation method of a large-diameter Ni-Cr rotating target containing trace elements. The obtained rotating target material has high utilization rate, can be applied to special coating industry, and can overcome the problems of nickel-chromium tube cracking, inclusions, defects, eccentricity and processing difficulties during the preparation process.
技术方案:本发明的含微量元素的大管径Ni-Cr旋转靶材,包括按质量百分比计的如下组分:C 0.01~0.05%,B 0.02~0.08%,Zr 0.01~0.06%,Mg 0.05~0.1%,Cr 7~44%以及余量Ni和不可避免的杂质。其中不可避免的杂质如Al、Fe等。Technical solution: The large diameter Ni-Cr rotating target containing trace elements of the present invention includes the following components in terms of mass percentage: C 0.01~0.05%, B 0.02~0.08%, Zr 0.01~0.06%, Mg 0.05 ~0.1%, Cr 7~44%, the balance Ni and unavoidable impurities. Among them, the inevitable impurities such as Al, Fe and so on.
优选地,所述旋转靶材的杂质Fe的含量小于0.01%。杂质铁对靶材磁控溅射的影响最大,因此采用合适的原料组分配比和制备工艺,降低旋转靶材中杂质铁的含量。Preferably, the content of Fe as an impurity in the rotating target is less than 0.01%. Impurity iron has the greatest impact on the target magnetron sputtering, so the appropriate raw material composition ratio and preparation process are adopted to reduce the impurity iron content in the rotating target.
本发明还提供了一种所述含微量元素的大管径Ni-Cr旋转靶材的制备方法,制备步骤主要包括原料准备、真空熔炼、热锻、机加工、热挤压、酸洗处理、固溶处理、冷轧或镗孔、退火处理、机加工或绑定;具体过程为:The present invention also provides a method for preparing the large-diameter Ni-Cr rotating target material containing trace elements. The preparation steps mainly include raw material preparation, vacuum melting, hot forging, machining, hot extrusion, pickling treatment, Solution treatment, cold rolling or boring, annealing treatment, machining or binding; the specific process is:
(1)真空熔炼:熔炼前准备原料,纯度≥99.9%的光电碳、纯度≥99.5%的硼粒、纯度≥99.5%的金属锆、纯度≥99.9%的金属镁或者镍-镁中间合金、纯度≥99.43%的金属铬、99.96%的电解镍;后将原料按照上述各组分含量将电解镍、金属铬、光电碳混合,后在1400~1550℃条件下真空熔炼70~90min,再加入锆、镁或镍-镁中间合金、硼精炼10~20min,后在保护气氛下浇铸得到铸锭;其中整个熔炼过程中真空度保持在小于4Pa;浇铸时的保护气氛可以是氩气;(1) Vacuum smelting: prepare raw materials before smelting, including photoelectric carbon with purity ≥99.9%, boron particles with purity ≥99.5%, metallic zirconium with purity ≥99.5%, metallic magnesium or nickel-magnesium intermediate alloy with purity ≥99.9%, purity ≥99.43% metallic chromium, 99.96% electrolytic nickel; then the raw materials are mixed with electrolytic nickel, metallic chromium, and photoelectric carbon according to the content of the above components, and then vacuum smelted at 1400~1550℃ for 70~90min, and then zirconium is added , Magnesium or nickel-magnesium master alloy and boron are refined for 10-20 minutes, and then cast in a protective atmosphere to obtain an ingot; wherein the vacuum degree is maintained at less than 4Pa during the entire smelting process; the protective atmosphere during casting can be argon;
(2)热锻:热锻前对铸锭进行粗加工,可以利用车床去除表面氧化皮和一些缺陷,切除冒口,得到圆台型光亮锭,并仔细修磨,去除微裂纹等;后将铸锭进行热锻,将铸锭加热至1100~1300℃,保温20~50min后,进行锻造,开锻温度为1100~1300℃,终锻温度为950~1050℃;将铸锭反复墩粗后拔长,变形量大于50%;此处的拔长的变形量大于50%,是和墩粗后的锻棒相对比的。(2) Hot forging: rough machining of the ingot before hot forging. The lathe can be used to remove the surface oxide scale and some defects, and the riser can be cut to obtain a round truncated cone-shaped bright ingot, which is carefully ground to remove microcracks, etc.; The ingot is hot forged. The ingot is heated to 1100~1300℃, and after holding for 20~50min, forging is carried out, the forging temperature is 1100~1300℃, and the final forging temperature is 950~1050℃; the ingot is repeatedly roughed and then drawn Long, the deformation is greater than 50%; the deformation of the drawing here is greater than 50%, which is compared with the forging rod after the pier is thick.
(3)机加工:将经过热锻的圆柱型锻件表面氧化皮去除,将锻件两端加工平整,确保端面与圆柱面垂直,然后根据要求加工出中心通孔,并在锻棒的一端加工出锥形孔,得到合金圆柱。(3) Machining: remove the oxide scale on the surface of the hot forged cylindrical forgings, and process the two ends of the forgings smoothly to ensure that the end surface is perpendicular to the cylindrical surface, and then process the center through hole according to the requirements, and process one end of the forging rod Taper holes to obtain alloy cylinders.
(4)热挤压:通过感应加热对步骤(3)得到的合金圆柱进行加热,加热温度为1100~1200℃;后进行扩孔,扩孔速度为150~220mm/s;再采用二次感应加热处理,加热温度为1110~1220℃,采用热挤压机进行挤压,挤压速度为120~150mm/s,得到旋转靶材的荒管。其中荒管可加工为外径170~200mm,内径为130~160mm,长度为2500~4500mm;也可以根据实际需要加工得到的最终靶材的管径进行调整。(4) Hot extrusion: The alloy cylinder obtained in step (3) is heated by induction heating at a heating temperature of 1100-1200°C; then the hole is expanded at a speed of 150-220mm/s; then a secondary induction is used Heat treatment, the heating temperature is 1110-1220 DEG C, and the hot extruder is used for extrusion, and the extrusion speed is 120-150mm/s, to obtain the waste tube of the rotating target. The waste tube can be processed to an outer diameter of 170-200mm, an inner diameter of 130-160mm, and a length of 2500-4500mm; it can also be adjusted according to the actual needs of the final target processed.
(5)对荒管依次进行酸洗处理、固溶处理、冷轧或镗孔、退火处理、机加工或绑定。(5) Pickling treatment, solution treatment, cold rolling or boring, annealing treatment, machining or binding are carried out on the waste pipe in sequence.
上述工艺中,酸洗处理:将荒管进行酸洗,去除表面凹坑等缺陷;酸洗处理可采用现有技术中的常用酸洗工艺;In the above process, the pickling treatment: pickling the waste pipe to remove defects such as surface pits; the pickling treatment can adopt the common pickling process in the prior art;
固溶处理:将酸洗过的荒管进行固溶处理,室温下得到单相奥氏体组织,使材料具有最好的耐蚀性,并且塑性高、成形性好,并且能够细化荒管的晶粒组织。Solution treatment: The acid-washed waste pipe is solid-solution treated to obtain a single-phase austenite structure at room temperature, so that the material has the best corrosion resistance, high plasticity, good formability, and can refine the waste pipe The grain structure.
冷轧或镗孔:将表面处理过的荒管进行高精度的轧制或者进行镗孔,得到内孔尺寸公差为±0.2mm光亮管。Cold rolling or boring: the surface-treated waste tube is rolled or bored with high precision to obtain a bright tube with an inner hole size tolerance of ±0.2mm.
退火处理:对光亮管进行退火处理,退火温度为840~870℃,保温80~90min。Annealing treatment: the bright tube is annealed, the annealing temperature is 840~870℃, and the heat preservation is 80~90min.
机加工或绑定:最后将光亮管加工到所需尺寸的整体旋转靶材,或加工到一定的尺 寸,再通过绑定的方式制作所需尺寸的绑定旋转靶材。Machining or binding: Finally, the bright tube is processed to the overall rotating target of the required size, or processed to a certain size, and then the binding rotating target of the required size is made by binding.
优选地,上述制备过程中的步骤(1)中电解镍在550~650℃条件下烘烤5~8小时。长时间的烘烤,可以有效去除电解镍中含有的大部分氢气。Preferably, in step (1) of the above preparation process, the electrolytic nickel is baked at 550-650°C for 5-8 hours. Long-term baking can effectively remove most of the hydrogen contained in electrolytic nickel.
优选地,所述步骤(1)中真空熔炼过程中添加锆、镁、硼采用镍箔包住锆、镁、硼的方式加入;真空熔炼过程中采用上述方式加入微量合金元素金属锆、金属镁、硼粒,可以避免直接加入引起钢液沸腾及溅射。Preferably, in the step (1), zirconium, magnesium, and boron are added in the vacuum melting process by enclosing the zirconium, magnesium, and boron by nickel foil; and the trace alloy elements metal zirconium and metal magnesium are added in the vacuum melting process in the above manner. , Boron particles can avoid boiling and sputtering of molten steel caused by direct addition.
优选地,所述步骤(2)中墩粗的变形量为45~60%。在锻造过程中,反复墩粗和拔长,其墩粗变形量为45~60%,充分破碎粗大晶粒组织,从而提高挤压成材率。Preferably, the deformation of the pier thickness in the step (2) is 45-60%. In the forging process, the roughness and lengthening are repeated, and the deformation of the roughness is 45-60%, which can fully crush the coarse grain structure, thereby increasing the extrusion yield.
优选地,所述步骤(3)中心通孔的直径为20~40mm,所述锥形孔的锥度为20°~40°。此处的中心通孔、锥形孔方便扩孔头与合金对应,防止扩歪造成偏心。Preferably, the diameter of the central through hole in the step (3) is 20-40 mm, and the taper of the tapered hole is 20°-40°. The central through hole and tapered hole here facilitate the reaming head to correspond to the alloy, and prevent eccentricity caused by reaming.
优选地,所述步骤(4)中,二次感应加热的温度比前一次感应加热的温度高10~20℃。通过感应加热后再扩孔,二次感应加热后再挤压,并且二次感应加热温度略高10~20℃,可以防止挤压准备过程中温度下降而造成的缺陷或报废。Preferably, in the step (4), the temperature of the secondary induction heating is 10-20°C higher than the temperature of the previous induction heating. The hole is expanded after induction heating, and then extruded after the second induction heating, and the temperature of the second induction heating is slightly higher than 10-20℃, which can prevent defects or scraps caused by the temperature drop during the extrusion preparation process.
优选地,所述步骤(5)固溶处理将荒管加热到1000~1100℃保温,然后水淬。采用较低温度的固溶处理,快速冷却,从而得到细小晶粒的荒管,提高材料的塑性和耐蚀性。Preferably, in the step (5) solution treatment, the waste pipe is heated to 1000-1100° C. for heat preservation, and then water quenched. A solution treatment at a lower temperature and rapid cooling are adopted to obtain a waste tube with fine grains and improve the plasticity and corrosion resistance of the material.
优选地,所述步骤(5)的退火处理具体为:退火温度为840~870℃,保温80~90min。Preferably, the annealing treatment in the step (5) is specifically: the annealing temperature is 840-870° C., and the heat preservation is 80-90 min.
发明原理:本发明通过在真空熔炼过程中添加微量的合金元素C、B、Zr、Mg进行成分优化,使合金在凝固后期能够有效补缩,减少缺陷的形成面积,降低氧、硫、氢、氮等含量,且能抑制裂纹的萌生,提高靶材的晶界结合力,细化晶粒,从而提高成材率。其中,添加B元素,B偏聚在晶界或空位型缺陷上,提高晶界结合力,形成细小的M 3B 2型硼化物,减少由杂质元素结合形成的TCP相的形成,抑制裂纹的产生,使合金在凝固后期能够有效补缩,减少显微缩孔的产生;添加Zr元素,Zr在加热时能大量地吸收氧、氢等气体,尤其在高温熔炼时能猛烈地吸收氮气,同时,Zr能够促进Cr弥散分布,并细化晶粒;添加C、Mg元素,能够进一步脱氧、去硫,净化金属液,而且高温下会挥发,不影响金属液的纯度,从而降低镍铬合金中的氢、氧、氮等间隙气体含量,同时去除有害杂质硫与细化晶粒,从而提高合金的质量,优化合金成分。 Principle of the invention: The present invention optimizes the composition by adding a small amount of alloying elements C, B, Zr, and Mg during the vacuum melting process, so that the alloy can be effectively fed in the later stage of solidification, reducing the formation area of defects, and reducing oxygen, sulfur, hydrogen, Nitrogen and other content, and can inhibit the initiation of cracks, improve the grain boundary bonding force of the target material, refine the crystal grains, thereby increasing the yield. Among them, the addition of B element, B segregates on the grain boundary or vacancy type defects, improves the grain boundary bonding force, forms fine M 3 B 2 type borides, reduces the formation of TCP phase formed by the combination of impurity elements, and inhibits cracks. It can effectively feed the alloy in the later stage of solidification and reduce the generation of microscopic shrinkage; adding Zr element, Zr can absorb a large amount of oxygen, hydrogen and other gases when heating, especially during high-temperature smelting, it can violently absorb nitrogen, and at the same time , Zr can promote the dispersion of Cr and refine the crystal grains; adding C and Mg elements can further deoxidize, desulfurize, purify the molten metal, and will volatilize at high temperatures without affecting the purity of the molten metal, thereby reducing the purity of the nickel-chromium alloy. The content of interstitial gases such as hydrogen, oxygen, nitrogen, etc., while removing harmful sulfur impurities and refining crystal grains, thereby improving the quality of the alloy and optimizing the alloy composition.
本发明的两个关键技术环节分别为Ni-Cr旋转靶材原材料的配比设计及工艺条件的控制,两者相辅相成。通过合适的成分配比、结合优化的制备方法,成功制备得到了Ni-Cr旋转靶材,可以制作整体旋转靶材或者绑定旋转靶材,满足更多的使用需求。The two key technical links of the present invention are the design of the ratio of the raw materials of the Ni-Cr rotating target and the control of the process conditions, which are complementary to each other. Through suitable component ratio and optimized preparation method, Ni-Cr rotating target is successfully prepared, which can be used to manufacture integral rotating target or bind rotating target to meet more usage requirements.
有益效果:与现有技术相比,Beneficial effect: Compared with the prior art,
(1)本发明在Ni-Cr的基础上,添加微量的合金元素C、B、Zr、Mg进行成分优化,使合金在凝固后期能够有效补缩,减少缺陷的形成面积,降低氧、硫、氢、氮等含量, 且能抑制裂纹的萌生,提高靶材的晶界结合力,细化晶粒,从而提高成材率;(1) On the basis of Ni-Cr, the present invention adds a small amount of alloying elements C, B, Zr, and Mg to optimize the composition, so that the alloy can be effectively fed in the later stage of solidification, reducing the area of defect formation, and reducing oxygen, sulfur, The content of hydrogen, nitrogen, etc., and can inhibit the initiation of cracks, improve the bonding force of the grain boundary of the target material, and refine the grains, thereby increasing the yield;
(2)电解镍通过长时间高温烘烤,能有效去除电解镍中含有的氢气;通过反复墩粗和拔长的锻造工艺、感应加热后扩孔及二次感应加热后挤压、精轧或镗孔等工艺过程,能够提高旋转靶材的同心率和成材率;(2) Electrolytic nickel can effectively remove the hydrogen contained in electrolytic nickel through long-term high-temperature baking; through repeated thickening and elongation forging process, reaming after induction heating and extrusion, finishing rolling or finishing after secondary induction heating Processes such as boring can improve the concentricity and yield rate of the rotating target;
(3)本发明通过微量元素的添加、固溶处理及退火处理,使旋转靶材的晶粒均匀,且晶粒大小在80μm以下可调节;(3) The present invention makes the crystal grains of the rotating target material uniform through the addition of trace elements, solution treatment and annealing treatment, and the crystal grain size can be adjusted below 80 μm;
(4)通过制作整体旋转靶或绑定旋转靶,其利用率可达到70%-80%,既能满足更多的市场需求和特殊需求,又能提高材料的利用率,降低成本;(4) The utilization rate can reach 70%-80% by making the whole rotating target or binding rotating target, which can not only meet more market demands and special needs, but also increase the utilization rate of materials and reduce costs;
(5)本发明的含微量元素的Ni-Cr旋转靶材生产工艺简单、成材率高、精度高、成本较低、管径大,应用前景广阔。(5) The Ni-Cr rotating target containing trace elements of the present invention has simple production process, high yield, high precision, low cost, large pipe diameter, and broad application prospects.
附图说明Description of the drawings
图1是实施例1制备的大管径Ni-Cr旋转靶材的100倍金相照片;Figure 1 is a 100-fold metallographic photograph of the large-diameter Ni-Cr rotating target prepared in Example 1;
图2是实施例2制备的大管径Ni-Cr旋转靶材的100倍金相照片;2 is a 100-fold metallographic photograph of the large-diameter Ni-Cr rotating target prepared in Example 2;
图3是实施例3制备的大管径Ni-Cr旋转靶材的100倍金相照片;3 is a 100-fold metallographic photograph of the large-diameter Ni-Cr rotating target prepared in Example 3;
图4是实施例4制备的大管径Ni-Cr旋转靶材的100倍金相照片;4 is a 100 times metallographic photograph of the large-diameter Ni-Cr rotating target prepared in Example 4;
图5是实施例5制备的大管径Ni-Cr旋转靶材的100倍金相照片。FIG. 5 is a 100-fold metallographic photograph of the large-diameter Ni-Cr rotating target prepared in Example 5. FIG.
具体实施方式detailed description
下面结合实施例对本发明进行详细说明。The present invention will be described in detail below in conjunction with embodiments.
以下实施例中用于制备大管径Ni-Cr旋转靶材的试剂和材料均为市售。The reagents and materials used to prepare the large-diameter Ni-Cr rotating target in the following examples are all commercially available.
实施例1:Example 1:
本实施例中大管径Ni-Cr旋转靶材的组分及含量,按质量百分比计分别为:C 0.04%,B 0.06%,Zr 0.03%,Mg 0.09%,Cr 44%以及余量Ni和不可避免的杂质。The composition and content of the large-diameter Ni-Cr rotating target in this embodiment are as follows in terms of mass percentage: C 0.04%, B 0.06%, Zr 0.03%, Mg 0.09%, Cr 44% and the balance Ni and Inevitable impurities.
该大管径Ni-Cr旋转靶材的制备方法包括如下步骤:The preparation method of the large diameter Ni-Cr rotating target includes the following steps:
(1)真空熔炼:准备原料光电碳、硼粒、金属锆、金属镁、金属铬、电解镍,其中原料为:纯度为99.9%的光电碳、99.83%的硼粒、99.9%的金属锆、99.9%的金属镁、99.95%的金属铬、99.96%的电解镍;(1) Vacuum melting: prepare raw materials of photoelectric carbon, boron particles, metal zirconium, metal magnesium, metal chromium, and electrolytic nickel. The raw materials are: photoelectric carbon with a purity of 99.9%, 99.83% boron particles, and 99.9% metal zirconium. 99.9% metallic magnesium, 99.95% metallic chromium, 99.96% electrolytic nickel;
将电解镍、金属铬的表面油污及氧化物处理干净并干燥称重,再将电解镍600℃,保温6小时烘烤;然后将原料按照上述各组分含量,首先将电解镍、金属铬、光电碳放入真空熔炼坩埚中,通电熔炼,熔炼温度为1500℃,熔炼时间为80min,再先后加入用镍箔包好的金属锆、金属镁和硼粒,再精炼15min,整个熔炼过程中真空度小于4Pa;熔炼后进行浇铸,浇铸前在真空状态中先通氩气4Mpa,在保护气氛的条件下进行浇注,浇注40min后脱模得到铸锭。The surface oil stains and oxides of electrolytic nickel and metallic chromium are cleaned and dried and weighed. Then, the electrolytic nickel is kept at 600°C for 6 hours and bake; then the raw materials are prepared according to the content of the above components. First, the electrolytic nickel, metallic chromium, Put the photoelectric carbon into a vacuum melting crucible and smelt with electricity. The melting temperature is 1500℃, and the melting time is 80min. Then add the metal zirconium, metal magnesium and boron particles wrapped in nickel foil successively, and then refining for 15min. The whole melting process is vacuum The degree is less than 4Pa; after smelting, the casting is carried out. Before casting, argon gas 4Mpa is passed in a vacuum state, and the casting is carried out under the condition of protective atmosphere. After 40 minutes of casting, the mold is demolded to obtain the ingot.
(2)第一次机加工:利用车床去除铸锭表面氧化皮和一些缺陷,切除冒口,得到圆 台型光亮锭,并仔细修磨,去除微裂纹等;(2) The first machining: Use a lathe to remove the oxide scale and some defects on the surface of the ingot, cut off the riser, and obtain a round cone-shaped bright ingot, and carefully grind to remove microcracks, etc.;
(3)热锻:将经机加工处理后的铸锭加热至1100℃,保温30min后,进行锻造,开锻温度为1100℃,终锻温度为950℃;将铸锭反复墩粗,墩粗的变形量为50%,后进行拔长,变形量为60%,拔长变形量是和墩粗后的锻棒相对比的。最终锻造至
Figure PCTCN2019108215-appb-000001
的锻棒;
(3) Hot forging: heat the machined ingot to 1100°C, hold for 30 minutes, and then perform forging. The forging temperature is 1100°C and the final forging temperature is 950°C; the ingot is repeatedly thickened and thickened. The deformation is 50%, and then it is drawn, and the deformation is 60%. The deformation of the drawing is compared with the forging rod after the pier is thick. Finally forged to
Figure PCTCN2019108215-appb-000001
Forging rod
(4)第二次机加工:将圆柱型锻棒的表面氧化皮去除,将锻棒两端加工平整,确保端面与圆柱面垂直,加工后为直径299±1mm,长度大于500mm的圆柱,然后加工出直径为30mm的中心通孔,并在其中一端加工出成20°锥度的锥形孔,得到合金圆柱;(4) The second machining: remove the surface oxide scale of the cylindrical forging rod, and process both ends of the forging rod to be flat to ensure that the end surface is perpendicular to the cylindrical surface. After processing, it will be a cylinder with a diameter of 299±1mm and a length greater than 500mm. Processed a central through hole with a diameter of 30mm, and processed a tapered hole with a 20° taper at one end to obtain an alloy cylinder;
(5)热挤压:通过感应加热对合金圆柱进行加热,加热温度为1130℃,再利用扩孔头进行扩孔,扩孔速度为200mm/s,再经过二次感应加热,加热温度为1140℃,再利用6500吨热挤压机进行挤压,挤压速度为130mm/s;通过热挤压得到外径为170~200mm,内径为130~160mm,长度为2500~4500mm的荒管;(5) Hot extrusion: The alloy cylinder is heated by induction heating at a heating temperature of 1130°C, and then a reaming head is used for reaming at a reaming speed of 200mm/s, and then after a second induction heating, the heating temperature is 1140 ℃, and then use a 6500-ton hot extruder to extrude, the extrusion speed is 130mm/s; through hot extrusion, a waste pipe with an outer diameter of 170-200mm, an inner diameter of 130-160mm, and a length of 2500-4500mm is obtained;
(6)酸洗处理:将荒管进行酸洗,去除表面凹坑等缺陷;(6) Pickling treatment: pickling the waste pipe to remove defects such as surface pits;
(7)固溶处理:将荒管加热到1000℃保温,保温1小时,然后水淬;(7)Solution treatment: heat the waste pipe to 1000°C for 1 hour, then water quench;
(8)冷轧或镗孔:将表面处理过的荒管进行高精度的轧制或者进行镗孔,得到内孔尺寸公差为±0.2mm光亮管;(8) Cold rolling or boring: high-precision rolling or boring of the surface-treated waste tube to obtain a bright tube with an inner hole size tolerance of ±0.2mm;
(9)退火处理:在850℃的退火温度条件下,保温85min进行退火处理;(9) Annealing treatment: under the annealing temperature condition of 850℃, heat preservation for 85min for annealing treatment;
(10)机加工或绑定:将光亮管加工到所需尺寸的整体旋转靶材,或加工到一定的尺寸,再通过绑定的方式制作所需尺寸的绑定旋转靶材。(10) Machining or binding: the bright tube is processed to the overall rotating target of the required size, or processed to a certain size, and then the binding rotating target of the required size is made by binding.
对本实施例制备得到的大管径Ni-Cr旋转靶材进行金相分析,100倍下的金相图片如图1所示,可以看出晶粒细小均匀,晶粒度大小平均在45~58μm。The metallographic analysis of the large-diameter Ni-Cr rotating target prepared in this example is carried out. The metallographic picture under 100 times is shown in Figure 1. It can be seen that the crystal grains are fine and uniform, and the average grain size is 45-58 μm. .
实施例2:Example 2:
本实施例中大管径Ni-Cr旋转靶材的组分及含量,按质量百分比计分别为:C 0.05%,B 0.08%,Zr 0.01%,Mg 0.1%,Cr 40%以及余量Ni和不可避免的杂质。The composition and content of the large-diameter Ni-Cr rotating target in this embodiment are as follows in mass percentage: C 0.05%, B 0.08%, Zr 0.01%, Mg 0.1%, Cr 40%, and the balance Ni and Inevitable impurities.
本实施例的大管径Ni-Cr旋转靶材的制备方法与实施例1基本相同,不同之处在于:The preparation method of the large-diameter Ni-Cr rotating target of this embodiment is basically the same as that of embodiment 1, except that:
步骤(1)中,其中原料的纯度为99.9%的光电碳、99.83%的硼粒、99.9%的金属锆、99.9%的金属镁、99.43%的金属铬、99.96%的电解镍;电解镍在550℃,保温5小时进行烘烤;熔炼温度为1400℃,熔炼时间70min,精炼时间为10min;In step (1), the purity of the raw materials is 99.9% of photovoltaic carbon, 99.83% of boron particles, 99.9% of metallic zirconium, 99.9% of metallic magnesium, 99.43% of metallic chromium, and 99.96% of electrolytic nickel; Bake at 550℃, heat preservation for 5 hours; smelting temperature is 1400℃, smelting time is 70min, refining time is 10min;
步骤(3)中,铸锭加热至1250℃,保温20min;开锻温度为1250℃,终锻温度为1050℃;墩粗的变形量为45%;In step (3), the ingot is heated to 1250°C and kept for 20 minutes; the opening forging temperature is 1250°C, and the final forging temperature is 1050°C; the deformation of the pier thickness is 45%;
步骤(4)中,机加工出直径为20mm的中心通孔,并在其中一端加工出成30°锥度的锥形孔;In step (4), a central through hole with a diameter of 20mm is machined, and one end is machined into a tapered hole with a 30° taper;
步骤(5)中,感应加热温度为1160℃,扩孔速度为150mm/s;第二次感应加热温 度为1180℃,挤压速度为120mm/s;In step (5), the induction heating temperature is 1160°C, and the hole expanding speed is 150mm/s; the second induction heating temperature is 1180°C, and the extrusion speed is 120mm/s;
步骤(7)中,固溶处理加热到1100℃;In step (7), the solution treatment is heated to 1100°C;
步骤(9)中,退火温度为840℃,保温80min。In step (9), the annealing temperature is 840° C., and the temperature is kept for 80 minutes.
对本实施例制备得到的大管径Ni-Cr旋转靶材进行金相分析,100倍下的金相图片如图2所示,可以看出晶粒细小,且比较均匀,晶粒度大小平均在55~76μm。The metallographic analysis of the large-diameter Ni-Cr rotating target prepared in this example is carried out. The metallographic picture at 100 times is shown in Figure 2. It can be seen that the crystal grains are fine and relatively uniform, and the average grain size is 55~76μm.
实施例3:Example 3:
本实施例中大管径Ni-Cr旋转靶材的组分及含量,按质量百分比计分别为:C 0.02%,B 0.04%,Zr 0.04%,Mg 0.06%,Cr 10%以及余量Ni和不可避免的杂质。The composition and content of the large-diameter Ni-Cr rotating target in this embodiment are as follows in terms of mass percentage: C 0.02%, B 0.04%, Zr 0.04%, Mg 0.06%, Cr 10% and the balance Ni and Inevitable impurities.
本实施例的大管径Ni-Cr旋转靶材的制备方法与实施例1基本相同,不同之处在于:The preparation method of the large-diameter Ni-Cr rotating target of this embodiment is basically the same as that of embodiment 1, except that:
步骤(1)中,其中原料的纯度为99.9%的光电碳、99.83%的硼粒、99.9%的金属锆、99.9%的金属镁、99.43%的金属铬、99.96%的电解镍;电解镍在580℃,保温8小时进行烘烤;熔炼温度为1550℃,熔炼时间90min,精炼时间为20min;In step (1), the purity of the raw materials is 99.9% of photovoltaic carbon, 99.83% of boron particles, 99.9% of metallic zirconium, 99.9% of metallic magnesium, 99.43% of metallic chromium, and 99.96% of electrolytic nickel; Bake at 580℃, heat preservation for 8 hours; smelting temperature is 1550℃, smelting time is 90min, refining time is 20min;
步骤(3)中,铸锭加热至1300℃,保温40min;开锻温度为1300℃,终锻温度为1020℃;墩粗的变形量为60%;In step (3), the ingot is heated to 1300°C for 40 minutes; the opening forging temperature is 1300°C, and the final forging temperature is 1020°C; the deformation of the pier thickness is 60%;
步骤(4)中,机加工出直径为30mm的中心通孔,并在其中一端加工出成40°锥度的锥形孔;In step (4), a central through hole with a diameter of 30mm is machined, and a tapered hole with a 40° taper is machined at one end;
步骤(5)中,感应加热温度为1100℃,扩孔速度为160mm/s;第二次感应加热温度为1110℃,挤压速度为150mm/s;In step (5), the induction heating temperature is 1100°C, and the hole expanding speed is 160mm/s; the second induction heating temperature is 1110°C, and the extrusion speed is 150mm/s;
步骤(7)中,固溶处理加热到1100℃;In step (7), the solution treatment is heated to 1100°C;
步骤(9)中,退火温度为870℃,保温90min。In step (9), the annealing temperature is 870°C and the temperature is kept for 90 minutes.
对本实施例制备得到的大管径Ni-Cr旋转靶材进行金相分析,100倍下的金相图片如图3所示,可以看出晶粒细小,且比较均匀,晶粒度大小平均在50~69μm。The metallographic analysis of the large-diameter Ni-Cr rotating target prepared in this example is carried out. The metallographic picture at 100 times is shown in Figure 3. It can be seen that the crystal grains are fine and relatively uniform, and the average grain size is 50~69μm.
实施例4:Example 4:
本实施例中大管径Ni-Cr旋转靶材的组分及含量,按质量百分比计分别为:C 0.01%,B 0.02%,Zr 0.06%,Mg 0.05%,Cr 7%以及余量Ni和不可避免的杂质。The composition and content of the large-diameter Ni-Cr rotating target in this embodiment are as follows in terms of mass percentage: C 0.01%, B 0.02%, Zr 0.06%, Mg 0.05%, Cr 7%, and the balance Ni and Inevitable impurities.
本实施例的大管径Ni-Cr旋转靶材的制备方法与实施例1基本相同,不同之处在于:The preparation method of the large-diameter Ni-Cr rotating target of this embodiment is basically the same as that of embodiment 1, except that:
步骤(1)中,其中原料的纯度为99.96%的光电碳、99.83%的硼粒、99.9%的金属锆、99.9%的金属镁、99.43%的金属铬、99.96%的电解镍;电解镍在650℃,保温7小时进行烘烤;In step (1), the purity of the raw materials is 99.96% of photovoltaic carbon, 99.83% of boron particles, 99.9% of metallic zirconium, 99.9% of metallic magnesium, 99.43% of metallic chromium, and 99.96% of electrolytic nickel; Bake at 650℃, keep warm for 7 hours;
步骤(3)中,铸锭加热至1200℃,保温50min;开锻温度为1200℃,终锻温度为1030℃;墩粗的变形量为55%;In step (3), the ingot is heated to 1200°C for 50 minutes; the opening forging temperature is 1200°C, and the final forging temperature is 1030°C; the deformation of the pier thickness is 55%;
步骤(4)中,机加工出直径为40mm的中心通孔,并在其中一端加工出成40°锥度的锥形孔;In step (4), a central through hole with a diameter of 40mm is machined, and a tapered hole with a 40° taper is machined at one end;
步骤(5)中,感应加热温度为1180℃,扩孔速度为220mm/s;第二次感应加热温度为1200℃,挤压速度为140mm/s;In step (5), the induction heating temperature is 1180°C, and the hole expanding speed is 220mm/s; the second induction heating temperature is 1200°C, and the extrusion speed is 140mm/s;
步骤(7)中,固溶处理加热到1000℃;In step (7), the solution treatment is heated to 1000°C;
步骤(9)中,退火温度为860℃,保温85min。In step (9), the annealing temperature is 860° C., and the temperature is kept for 85 minutes.
对本实施例制备得到的大管径Ni-Cr旋转靶材进行金相分析,100倍下的金相图片如图4所示,可以看出晶粒细小均匀,晶粒度大小平均在40~53.5μm。The metallographic analysis of the large-diameter Ni-Cr rotating target prepared in this example is carried out. The metallographic picture at 100 times is shown in Figure 4, and it can be seen that the crystal grains are fine and uniform, and the average grain size is 40-53.5 μm.
实施例5:Example 5:
本实施例中大管径Ni-Cr旋转靶材的组分及含量,按质量百分比计分别为:C 0.03%,B 0.05%,Zr 0.05%,Mg 0.08%,Cr 20%以及余量Ni和不可避免的杂质。The composition and content of the large-diameter Ni-Cr rotating target in this embodiment are as follows in mass percentage: C 0.03%, B 0.05%, Zr 0.05%, Mg 0.08%, Cr 20%, and the balance Ni and Inevitable impurities.
本实施例的大管径Ni-Cr旋转靶材的制备方法与实施例1基本相同,不同之处在于:The preparation method of the large-diameter Ni-Cr rotating target of this embodiment is basically the same as that of embodiment 1, except that:
步骤(1)中,其中原料的纯度为99.9%的光电碳、99.83%的硼粒、99.9%的金属锆、99.9%的金属镁、99.43%的金属铬、99.96%的电解镍;电解镍在620℃,保温6小时进行烘烤;In step (1), the purity of the raw materials is 99.9% of photovoltaic carbon, 99.83% of boron particles, 99.9% of metallic zirconium, 99.9% of metallic magnesium, 99.43% of metallic chromium, and 99.96% of electrolytic nickel; Bake at 620℃, keep heat for 6 hours;
步骤(3)中,墩粗的变形量为48%;In step (3), the deformation of the pier thickness is 48%;
步骤(4)中,机加工出直径为20mm的中心通孔,并在其中一端加工出成40°锥度的锥形孔;In step (4), a central through hole with a diameter of 20mm is machined, and a tapered hole with a 40° taper is machined at one end;
步骤(5)中,感应加热温度为1200℃,第二次感应加热温度为1220℃;In step (5), the induction heating temperature is 1200°C, and the second induction heating temperature is 1220°C;
步骤(7)中,固溶处理加热到1100℃;In step (7), the solution treatment is heated to 1100°C;
对本实施例制备得到的大管径Ni-Cr旋转靶材进行金相分析,100倍下的金相图片如图5所示,可以看出晶粒细小均匀,晶粒度大小平均在47~60μm。The metallographic analysis of the large-diameter Ni-Cr rotating target prepared in this example is carried out. The metallographic picture under 100 times is shown in Figure 5. It can be seen that the crystal grains are fine and uniform, and the average grain size is 47-60 μm. .
后分别对实施例1~实施例5制备得到的含微量元素的Ni-Cr旋转靶材进行ICP化学成分检测和纯度测试,结果分别如表1、表2所示。从表1可以看出,铬的实际检测含量比理论(结合纯度和投入比例)含量要略高,锆、硼、镁、碳这些微量元素都有烧损,尤其是镁的含量非常小,所以不影响靶材的纯度,反而净化部分杂质,提高纯度;其中,杂质铁对靶材磁控溅射的影响最大,本发明旋转靶材的铁的含量小于0.01%。Then, the Ni-Cr rotating targets containing trace elements prepared in Examples 1 to 5 were subjected to ICP chemical composition detection and purity testing, and the results are shown in Table 1 and Table 2 respectively. It can be seen from Table 1 that the actual detection content of chromium is slightly higher than the theoretical content (combined purity and input ratio). Trace elements such as zirconium, boron, magnesium, and carbon are all burnt, especially the content of magnesium is very small, so it is not Influencing the purity of the target material, on the contrary, it purifies some impurities and improves the purity; among them, impurity iron has the greatest influence on the magnetron sputtering of the target material, and the iron content of the rotating target material of the present invention is less than 0.01%.
从表2可以看出,本发明的旋转靶材通过微量元素的添加和真空冶炼,可以将纯度保持在99.9%以上,也可以制备大于99.95%的高纯镍铬旋转靶材,满足绝大部分旋转溅射靶材的纯度要求。It can be seen from Table 2 that the rotating target of the present invention can maintain the purity above 99.9% through the addition of trace elements and vacuum smelting, and can also prepare a high-purity nickel-chromium rotating target of greater than 99.95%, which satisfies most of the rotating sputtering materials. The purity requirements of the shooting target.
表1 含微量元素的Ni-Cr旋转靶材化学成分测试结果Table 1 Test results of chemical composition of Ni-Cr rotating target containing trace elements
Figure PCTCN2019108215-appb-000002
Figure PCTCN2019108215-appb-000002
表2.含微量元素的Ni-Cr旋转靶材纯度测试结果Table 2. Purity test results of Ni-Cr rotating target containing trace elements
Figure PCTCN2019108215-appb-000003
Figure PCTCN2019108215-appb-000003

Claims (10)

  1. 一种含微量元素的大管径Ni-Cr旋转靶材,其特征在于包括按质量百分比计的如下原料组分:C 0.01~0.05%,B 0.02~0.08%,Zr 0.01~0.06%,Mg 0.05~0.1%,Cr 7~44%以及余量Ni和不可避免的杂质。A large-diameter Ni-Cr rotating target containing trace elements, which is characterized by including the following raw material components in terms of mass percentage: C 0.01~0.05%, B 0.02~0.08%, Zr 0.01~0.06%, Mg 0.05 ~0.1%, Cr 7~44%, the balance Ni and unavoidable impurities.
  2. 根据权利要求1所述的含微量元素的大管径Ni-Cr旋转靶材,其特征在于:所述旋转靶材的杂质Fe的含量小于0.01%。The large-diameter Ni-Cr rotating target containing trace elements according to claim 1, wherein the content of Fe as an impurity in the rotating target is less than 0.01%.
  3. 一种制备权利要求1或2所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于包括如下步骤:A method for preparing the large-diameter Ni-Cr rotary target containing trace elements according to claim 1 or 2, characterized in that it comprises the following steps:
    (1)真空熔炼:按各原料组分含量将电解镍、金属铬、光电碳混合,后在1400~1550℃条件下真空熔炼70~90min,再加入锆、镁、硼精炼10~20min,后在保护气氛下浇铸得到铸锭;(1) Vacuum smelting: mix electrolytic nickel, metallic chromium, and photoelectric carbon according to the content of each raw material component, and then vacuum smelt at 1400 to 1550 ℃ for 70 to 90 minutes, then add zirconium, magnesium, and boron to refine for 10 to 20 minutes. Cast in a protective atmosphere to obtain ingots;
    (2)热锻:将铸锭经机加工处理后加热至1100~1300℃,保温20~50min后,进行锻造,开锻温度为1100~1300℃,终锻温度为950~1050℃;将铸锭反复墩粗后拔长,变形量大于50%;(2) Hot forging: heat the ingot to 1100~1300℃ after machining treatment, hold for 20~50min, then carry out forging, the forging temperature is 1100~1300℃, and the final forging temperature is 950~1050℃; The ingot is elongated after repeated thickening, and the deformation is greater than 50%;
    (3)机加工:将步骤(2)得到的锻棒进行外表面机加处理,根据要求加工出中心通孔,锻棒的一端加工出锥形孔,得到合金圆柱;(3) Machining: the forging rod obtained in step (2) is subjected to external surface machining treatment, a central through hole is machined according to requirements, and one end of the forging rod is machined with a tapered hole to obtain an alloy cylinder;
    (4)热挤压:通过感应加热对步骤(3)得到的合金圆柱进行加热,加热温度为1100~1200℃;后进行扩孔,扩孔速度为150~220mm/s;再采用二次感应加热处理,加热温度为1110~1220℃,采用热挤压机进行挤压,挤压速度为120~150mm/s,得到荒管;(4) Hot extrusion: The alloy cylinder obtained in step (3) is heated by induction heating at a heating temperature of 1100-1200°C; then the hole is expanded at a speed of 150-220mm/s; then a secondary induction is used Heat treatment, the heating temperature is 1110~1220℃, and the hot extruder is used for extrusion, and the extrusion speed is 120~150mm/s to obtain a waste tube;
    (5)对荒管依次进行酸洗处理、固溶处理、冷轧或镗孔、退火处理、机加工或绑定。(5) Pickling treatment, solution treatment, cold rolling or boring, annealing treatment, machining or binding are carried out on the waste pipe in sequence.
  4. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于:所述步骤(1)中电解镍在550~650℃条件下烘烤5~8小时。The method for preparing a large-diameter Ni-Cr rotating target containing trace elements according to claim 3, wherein the electrolytic nickel in the step (1) is baked at 550-650°C for 5-8 hours .
  5. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于:所述步骤(1)中真空熔炼过程中添加锆、镁、硼采用镍箔包住锆、镁、硼的方式加入。The method for preparing a large-diameter Ni-Cr rotary target containing trace elements according to claim 3, characterized in that: in the step (1), the addition of zirconium, magnesium, and boron during the vacuum melting process is covered by nickel foil Zirconium, magnesium, boron are added.
  6. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于:所述步骤(2)中墩粗的变形量为45~60%。The method for preparing a large-diameter Ni-Cr rotating target containing trace elements according to claim 3, wherein the deformation of the pier thickness in the step (2) is 45-60%.
  7. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于:所述步骤(3)中心通孔的直径为20~40mm,所述锥形孔的锥度为20°~40°。The method for preparing a large-diameter Ni-Cr rotating target containing trace elements according to claim 3, wherein the diameter of the central through hole in the step (3) is 20-40 mm, and the diameter of the tapered hole The taper is 20°~40°.
  8. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于:所述步骤(4)中,二次感应加热的温度比前一次感应加热的温度高10~20℃。The method for preparing a large-diameter Ni-Cr rotating target containing trace elements according to claim 3, characterized in that: in the step (4), the temperature of the secondary induction heating is higher than the temperature of the previous induction heating 10~20℃.
  9. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特征在于:所述步骤(5)固溶处理将荒管加热到1000~1100℃保温,然后水淬。The method for preparing a large-diameter Ni-Cr rotating target containing trace elements according to claim 3, wherein the step (5) solution treatment heats the waste pipe to 1000-1100°C for heat preservation, and then water Quenched.
  10. 根据权利要求3所述的含微量元素的大管径Ni-Cr旋转靶材的制备方法,其特 征在于:所述步骤(5)的退火处理具体为:退火温度为840~870℃,保温80~90min。The method for preparing a large-diameter Ni-Cr rotating target containing trace elements according to claim 3, characterized in that: the annealing treatment in the step (5) is specifically: annealing temperature is 840 to 870°C, heat preservation is 80°C. ~90min.
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