WO2021008998A1

WO2021008998A1 - Coating assembly and method

Info

Publication number: WO2021008998A1
Application number: PCT/EP2020/069388
Authority: WO
Inventors: Maik Vieluf; Daniel Fritsche; David Tucholski
Original assignee: VON ARDENNE Asset GmbH & Co. KG
Priority date: 2019-07-12
Filing date: 2020-07-09
Publication date: 2021-01-21
Also published as: DE102019118936A1

Abstract

According to different embodiments, the coating assembly (200) can have: a particle feed; a collecting container (204) facing the particle feed, a cavity (206) being formed between the particle feed and the collecting container; and a coating material source (208) for evaporating a coating material into the cavity (206); wherein the particle feed (202) has a feed gap (202s) which extends along a closed path, and the cavity (206) extends from the feed gap (202s) to the collecting container (204) and partly surrounds the coating material source (208).

Description

description

Coating arrangement and procedure

Various exemplary embodiments relate to a coating arrangement and a method.

In general, a solid, e.g. its surface, can be coated in order to change its function (also known as functionalization), i.e. to change its properties. Functionalized solids, such as particles, are used, for example, in a wide variety of technical areas, such as for the production of a battery, for example of the lithium-ion battery type, but also in a fuel cell (PEM), e.g. for soot particles (graphite), which coated with platinum serve as a catalyst.

In a lithium-ion battery, e.g. a battery based on liquid electrolyte or solid electrolyte (so-called "solid state" or "all solid state"), several so-called active materials as part of the battery electrodes form the essential components for maximizing the energy storage capacity and thus the volume density, energy density and power density. Their ionic or electrical properties are determined by the type of active material selected for the anode or the cathode in conjunction with the

Determined electrolyte material.

Active material in the form of particles (DE 10 2015 116 351) offers a possibility of influencing this interaction. However, the electrical connection of particles to one another or in interaction with the current collector of the cathode is particularly difficult on the cathode side. In addition, the surface of the particles in the electrochemical potential of a cell in interaction with the electrolyte must be protected from degradation effects. There is therefore a need for the functionalization of particles, in particular for the

Increase the power density of the battery.

To functionalize particles, a free-fall fluidized bed granulator or a sol-gel process is conventionally used, which, for example, coats particles of lithium-nickel-manganese-cobalt oxide (LNMC) with a very thin LiNb0 ₃ layer, which is extremely time-consuming . A PVD process (PVD - physical vapor deposition) or a CVD process (CVD - chemical vapor deposition) - in particular ALD (atomic layer deposition) or spatial ALD - can in principle offer a possible alternative to such a wet-chemical process. CVD and ALD are, however, in their choice of

Combination of materials and their throughput - measured against the expenditure - severely limited and therefore less interesting from an economic point of view. Alternatively or in addition, a powder membrane coating device can be used

(CN 201 883 142 U) belonging to the technical field of

Membrane coating plant belongs and essentially a vacuum chamber, a

Includes a hot filament electrode (the so-called hot wire), a multi-stage rotation target and an ion source. This “rebound vibration device” is arranged in such a way that the ion beam from the ion source is directed onto a vibrating crucible (filled with powder) as the target. A vibrating powder membrane increases the distance between neighboring particles of the powder so that an almost spherical 3D particle coating can be achieved.

However, it does not allow any of the foregoing conventional processes to be rolled into one

to stay within a comparable cost framework, such as the established wet chemical process of the fluidized bed granulator. The wet chemical process is limited in terms of layer thickness and the number of possible material combinations.

According to various embodiments, a coating arrangement and a method are provided which enable the coating of particles in a vacuum at low cost, with a high throughput and a large layer thickness, and are accessible for a large number of material combinations. The coated particles can, for example, be used to store an energy store, for example a battery (e.g. a

Accumulator). A highly economical, continuous separation and provision of particles for the functionalization of the surface become clear

provided.

The coating arrangement and the method essentially enable one

Coherent and reverse coating (e.g. two-sided or more, i.e. from two or more directions, e.g. three-sided) of particles. The coating can be used to functionalize the surface of individual and / or particles isolated from one another. This coating on the reverse side is achieved in that the particles can clearly fall freely. The free fall favors, for example, that the particles are turned over so that they continuously change their orientation and / or are exposed to the coating material on the reverse side. If, on the other hand, the particles clump together, this coating on the reverse side can be more difficult. This can be counteracted by separating the particles.

According to various embodiments, the coating arrangement can have: a particle feed and a collecting container facing this, between which a

Cavity is formed; a source of coating material for vaporizing a

Coating material into the cavity; wherein the particle feed a

Having feed gap extending along a self-contained path; wherein the cavity has a first region and a second region, the first region extending from the feed gap to the collecting container and surrounding the second region, and wherein the second region is adjacent to the coating material source

Show it

FIG. 1 shows a particle separation device according to various embodiments in a schematic side view or cross-sectional view;

Figure 2 shows a coating arrangement according to various embodiments in one

schematic side view or cross-sectional view;

FIG. 3 shows the kinetics of the electrical isolation according to various embodiments in a schematic flow chart;

FIG. 4, FIG. 5 and FIG. 21A each show a coating arrangement according to various

Embodiments in various schematic views;

Figure 6A, Figure 7, Figure 8, Figure 9A, Figures 11 to 15 each have one

Particle singulation device according to various embodiments in various schematic views

FIG. 6B and FIG. 6C each show the kinetics of mechanical separation in one

schematic diagram;

FIG. 9B, FIG. 10A, FIG. 10B and FIG. 16 each show the kinetics of the electrical isolation in a schematic diagram;

FIGS. 17 to 20 each show a coating arrangement according to various

Embodiments in various schematic views;

FIG. 21B shows the kinetics of the uniformly distributed feed in a schematic diagram;

FIGS. 22 to 24 each show a coating arrangement according to various

Embodiments in various schematic views; and

FIGS. 25 and 26 each show a method according to various embodiments in a schematic flow diagram. In the following detailed description, reference is made to the accompanying drawings, which form a part hereof and in which specific illustrations are given

Embodiments are shown in which the invention can be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "back", etc. is used with reference to the orientation of the character (s) being described. As components of embodiments come in a number of different orientations

position, the directional terminology is used for purposes of illustration and is in no way limiting. It goes without saying that other embodiments can be used and structural or logical changes can be made without relying on the

The scope of the present invention. It goes without saying that the features of the various exemplary embodiments described herein can be combined with one another, unless specifically stated otherwise. The following detailed

The description is therefore not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

In the context of this description, the terms “connected”, “connected” and “coupled” are used to describe both a direct and an indirect one

Connection (e.g. ohmic and / or electrically conductive, e.g. an electrically conductive

Connection), a direct or indirect connection and a direct or indirect coupling. In the figures, identical or similar elements are identified with identical

Provided reference numerals as far as this is appropriate.

According to various embodiments, the term "coupled" or "coupling" may be used in the sense of a (e.g. mechanical, hydrostatic, thermal and / or electrical), e.g.

direct or indirect, connection and / or interaction are understood. Several elements can, for example, be coupled to one another along an interaction chain, along which the interaction (e.g. a signal) can be transmitted.

For example, two elements that are coupled to one another can exchange an interaction with one another, e.g. mechanical, hydrostatic, thermal and / or electrical

Interaction. According to various embodiments, "coupled" can be understood to mean a mechanical (e.g. physical) coupling, e.g., by means of direct physical contact. A clutch can be set up to transmit a mechanical interaction (e.g. force, torque, etc.). A gas coupling can enable a gas to be exchanged. A vacuum coupling can have a gas coupling that is encapsulated in a vacuum-tight manner.

Controlling can be understood as an intended influencing of a system. The state of the system can be changed according to a specification. Rules can be understood as controlling, with a change in the state of the system due to disturbances is counteracted. The controller can clearly have a control path directed towards the front and thus clearly implement a sequence control which is a

Converts input variable into an output variable. The control path can, however, also be part of a control loop, so that regulation is implemented. In contrast to the pure forward control, the regulation has a continuous influence of the output variable on the input variable, which is effected by the control loop (feedback). In other words, a regulation can be used as an alternative or in addition to the control or regulation can take place as an alternative or in addition to the control. In the case of regulation, an actual value of the controlled variable (e.g. determined based on a measured value) is compared with a reference value (a setpoint or a specification or a default value) and the controlled variable can be influenced accordingly by means of a manipulated variable (using an actuator) that there is as little deviation as possible of the respective actual value of the controlled variable from the reference value.

In the context of this description, particles (also referred to as solid particles) can be understood as bodies (clearly grains) which have a solid or are formed from it, ie matter present in a solid state of aggregation (whereby the matter can have several atoms and / or molecules) . A large number of particles can clearly be present as a loose amount (also referred to as a mixture or conglomerate), i.e. isolated, e.g. as granules (e.g. powder). The particles can have an extension (clearly particle size) greater than 5 nm (nanometers), for example greater than 0.1 mih (micrometers) and / or less than 1 mm (millimeters), for example in a range from approximately 10 nm to approximately 500 pm or in a range from about 0.1 pm to about 1 mm. The particle size of an individual particle can clearly correspond to the diameter of a sphere which has the volume of the particle. The particle size related to a large number of particles can correspond to the particle size averaged over the individual particles. In the following, a single particle is referred to in a simplified manner. What has been described can apply analogously to each particle of the plurality of particles. Depending on the progress of their processing, two or more particles can be individually (i.e. separated from one another) or

adhering to one another (also referred to as particle clusters). For example, what has been described can also apply analogously to each particle cluster of the plurality of particles. However, it is not necessary that all of the particles that are fed to the processing also be processed. Some particles can also be lost on the way (visual loss).

A plurality of particles can each be coated by means of a coating material, so that each particle is composed of a layer (also referred to as a particle coating)

Coating material is surrounded (for example enveloped), wherein the coated particles can again be present as a conglomerate (ie isolated). In general, several Particles differ from one another and / or from the coating material in their chemical composition and / or have at least one material of the following materials or be formed from them: a metal, a transition metal, an oxide (eg a

Metal oxide or a transition metal oxide), a dielectric, an organic or

inorganic polymer (e.g. a carbon-based polymer or a silicon-based polymer), an oxynitride, a nitride, a carbide, a ceramic, a semi-metal (e.g. carbon), a perovskite, a glass or vitreous material (e.g. a sulfidic glass or a super ionic glass), a semiconductor, a semiconductor oxide, a semi-organic material and / or an organic material. For example, the carbon can be in a carbon configuration, e.g., graphite or nano-crystalline amorphous carbon.

For example, the coating material can be at least one metal (e.g. aluminum,

Zirconium, lanthanum, nickel, titanium and / or chromium comprising or formed therefrom) have or be formed therefrom. Alternatively or additionally, the particles and / or the

Coating material have a battery active material or be formed therefrom. As a battery active material (also referred to simply as active material) a material can be understood which absorbs or releases electrical charges under a chemical reaction (in other words, which converts electrical energy into chemical energy, and vice versa). For a lithium-ion battery, the active material can be a

Have lithium compound or be formed therefrom. Examples of a battery active material of the cathode are for example nickel-manganese-cobalt (NMC), lithium-iron-phosphate (LFP), lithium-nickel-cobalt-aluminum oxide (NCA), lithium manganese oxide (LMO) and / or lithium nickel manganese oxide (LNMO). Examples of a battery active material of the anode are graphite (or carbon in a different configuration), nanocrystalline and / or amorphous silicon, a silicon-carbon composite, lithium-titanate (spinel) oxide, metallic lithium or tin dioxide (SnCL ).

According to various embodiments, the large number of particles (e.g. to be coated) (also referred to as powder or powder material) are collectively guided and separated in a vertical arrangement of several successive mechanical and / or electrostatic dispersion stages. Alternatively or in addition, a uniform

Distribution (dissemination) of the plurality of particles take place over a coating device (for example a material vapor source). The coating device can, for example, provide one or more than one electron beam-induced material vapor, by means of which an almost uniform all-round coating of the particles can be achieved. With regard to subliming materials such as carbon, the corresponding material vapor source can alternatively or additionally also be arranged laterally. According to various embodiments, a loosening device can have a particle support and a vibration source. The vibration source or one of the vibration sources described herein can be set up to couple a vibration into the particle support (also referred to as a vibratable particle support). The vibration can die

Stimulate particle support to a vibration (i.e. a periodic movement), which transfers kinetic energy to the particles (i.e. stimulates them to move). As an alternative or in addition to the vibration source, the loosening device can also have another drive which is set up to mechanically stimulate the particle support (e.g. by means of impacts (from inside or outside), rotation of the particle support or others

Movements), so that the particles lying on the particle support are excited to move. The particle support can, for example, comprise a membrane, a flat plate (e.g. a disk) or an everted plate (e.g. a plate). In the case of vibration, the particle layer can, for example, be deformed periodically, e.g. according to a vibration mode.

The particles stimulated to move can experience impacts with one another and with the particle support, which increases their distance from one another and thus clearly “loosens” them. For example, the loosening can have that binding and / or

Adhesion forces of the particles to one another and / or to the particle support by means of mechanical excitation (e.g. energy input from vibration or the like) are reduced or canceled.

In this state, the loosened particles can behave like a fluid (also referred to as fluidized particles or particle fluid). For example, the particles can flow in their entirety (i.e. all of the particle fluid) and the particle fluid can continuously deform under the influence of shear forces. The particle fluid can alternatively or additionally (to the transfer of kinetic energy to this) be made available by blowing a gas between the particles. However, the gas can make it difficult to maintain a vacuum.

Optionally, the oscillation source can be set up to vary the coupled oscillation (e.g. temporally and / or spatially) so that the oscillation mode of the particle layer oscillates according to several oscillation modes. The vibration source can be set up, for example, to generate various frequencies (also referred to as vibration frequencies). Alternatively or additionally, the vibration source can be set up to couple the vibration at different points (also referred to as coupling points) of the particle support.

The vibration source can generally have one or more than one actuator (also referred to as a converter) which is set up to transmit an electrical signal (for example an electrical Vibration, e.g. an alternating voltage) into a mechanical vibration. The or each actuator can for example have a piezo actuator, an eccentric, an unbalance motor and / or an electrical coil. The multiple coupling points (for example supplied from inside or outside) can be provided, for example, by means of multiple actuators. The plurality of oscillation frequencies can be provided, for example, by controlling an actuator (for example piezo actuators) with different signals.

For example, the particle support can be excited by means of an oscillation in accordance with a (e.g. cyclic) scheme, the scheme having several phases that differ from one another in terms of the frequency and / or the location of the coupled-in oscillation. The different frequencies or points do not necessarily have to be coupled in cyclically in a fixed sequence, but can also be varied randomly.

By means of the multiple oscillation frequencies and / or multiple coupling points, the particle support can be excited to oscillate in accordance with individual and / or multiple oscillation modes, which, for example, are continuously changed. This prevents the formation of standing wave crests or troughs by changing the oscillation pattern (e.g. the Chladni’s figure) locally and temporally, whereby the fluid-like

The suspended state of the particles is maintained constant and longer.

The vibration of the particle support can optionally cause a separation of the particles (or

Effect particle clusters) according to their size and / or mass. Clearly, with increasing size and / or mass of the particles (or particle clusters), their weight force can dominate, so that they become inert, which inhibits the stimulation of movement. In this way, isolated, lighter and / or smaller particles can clearly "float" and thus be separated from the larger or more massive particles in clusters.

The vibration source can be controlled, for example, by means of a control device, for example according to the diagram.

An electron source described herein can be configured to deliver electrons, e.g., into a vacuum or into a solid. The electron source can for example be set up for thermal emission of electrons into the vacuum, for

Secondary emission of electrons into the vacuum, for the formation of a plasma (which has the electrons), for the emission of microwaves (which releases electrons) and / or to transfer the electrons on contact with the solid body (ie to charge it electrically). In other words, the electron source can also have a plasma source or a microwave source. The electron source can do this with a power supply be coupled, which supplies the electron source with an electric current so that the electrons released are tracked.

In various embodiments, a coating material can be evaporated by means of an electron beam (also referred to as electron beam evaporation). Optionally, the coating material (also referred to as evaporation material) can be or will be provided in the form of subliming (or semi-subliming) material, e.g.

which can be arranged below the coating room and / or (i.e. alternatively or in addition to this) also to the side of the coating room.

Fig.l illustrates a particle separation device 100 according to various

Embodiments in a schematic side view or cross-sectional view.

The particle singulation device 100 may have an inlet opening 102e and a

Having exit opening 102a, and a plurality of isolation stages 104, which the

Couple inlet port 102e with outlet port 102a. The several

Isolation stages 104 can guide the particles 106 picked up through the inlet opening 102e to the outlet opening 102a, for example along a path 111 (also referred to as a guide path 111). The particles 106 can be picked up at the inlet opening 102e continuously or in batches. The guide path 111 can describe, for example, the path that the mean center of gravity of the plurality of particles 106 takes.

Along the guide path 111, the multiple separation stages 104 can be arranged, for example, in series, for example one behind the other. However, immediately successive separation stages 104 can also interlock along the guide path 111 or at least have common components.

The multiple isolation stages 104 can have at least a first isolation stage 104a and a second isolation stage 104b. The first isolation stage 104a can be of the electrical isolation type (also referred to in simplified terms as an electrical isolation stage 104a). The second separation stage 104b can be of the mechanical separation type (also referred to in simplified form as a mechanical separation stage 104b). The first

Isolation stage 104a and the second isolation stage 104b can optionally be provided by means of a common arrangement in which one or more than one component is optionally a component of the first isolation stage 104a and the second second

Isolation stage 104b can be. This will be described in more detail later.

Electrons 113 can be introduced into the multiplicity of particles 106 by means of the electrical isolation stage 104a, the particles 106 being charged thereby separates from each other (also referred to as electrical isolation lOlv or electrical isolation lOlv). In other words, electrons can be supplied 101 to the particles (also referred to as electron inflow 101 or “introduction 101 of electrons”). For this purpose, the isolation stage 104a can have an electron source, as will be described in more detail below, which provides the electrons 113. The electrons can for example be or are provided as free electrons, for example by means of a non-thermal

Dark discharge or by means of a hot cathode.

The particles 106 can be electrically charged by means of the electrons, so that an electrical force is imparted between them (for example according to Coulomb's law), which repels the particles 106 from one another (also referred to as a repulsive force). The electrical power introduced into the particles 106 can be so small that a temperature of the particles 106 remains lower than a temperature at which the particles 106 their

Change state of aggregation (e.g. melt, evaporate and / or sublimate). In other words, the particles 106 can remain solid during the electrical isolation.

By means of the mechanical isolation stage 104b, the particles 106 can be accelerated 103 in the direction of an impact surface 104p. In other words, kinetic energy can be supplied 103 to the particles 106, which accelerates 103 the particles 106 (also referred to as acceleration 103). The acceleration 103 can for example take place obliquely to or against the direction 155 of the gravitational force (also referred to as vertical 155) and / or in addition to an acceleration by the gravitational force.

By means of the impact on the impact surface 104p, the particles 106 can be given a mechanical force (also referred to as impact force) which separates the particles 106 from one another (also referred to as mechanical separation 103v or mechanical separation 103v). The particles 106 can remain fixed during the mechanical separation 103v. The

Impact surface 104p can be provided, for example, by means of an impact wall 104p (e.g., an impact plate 104p).

In general, the (e.g. mechanical and / or electrical) isolation 10lv, 103v can cause two or more particles that adhere to one another to be separated from one another (i.e. separated) (also referred to as the isolation process). The individual particles can be preserved in their integrity (also referred to as non-destructive separation). The

Two or more particles adhering to one another are also referred to herein as particle clusters or particle aggregates. By means of isolation, one or more than one particle can be detached from a particle cluster, so that a particle cluster with fewer particles or a single particle results. In each level of isolation of the several

Isolation stages, a variety of isolation processes can take place so that the The number and / or size of the particle clusters which are fed to the separation stage is greater than the number or size of the particle clusters which are discharged from the separation stage. The number and / or size of the particle clusters can be related to a time interval, for example.

Within each isolation stage of the plurality of isolation stages 104, a vacuum can be provided through which the guide path 111 leads. In other words, the isolation 10lv, 103v can take place in a vacuum. The sequence of the isolation stages 104a, 104b shown here can also be different. With regard to the guide path 111, the electrical isolation stage 104a of the mechanical isolation stage 104b

be downstream or vice versa. Both mechanical isolation stages 104b can also be connected in parallel to one another.

Optionally, the particle singulation device 100 can be more than one electrical

Separation stage 104a and / or more than one mechanical separation stage 104b, e.g. to improve the reliability of the separation.

The or each mechanical separation stage 104b (also referred to as a mechanical dispersion stage) can bring about the acceleration 103 of the particle clusters by means of a rotational movement, the rotational movement transferring a centrifugal force to a particle or particle cluster (also referred to as an agglomerate), which accelerates 103 causes. The particle cluster accelerated in this way can absorb a sufficiently large impulse and can be effectively broken up when it hits the impact surface 104p.

The separated particles 106 can subsequently be processed, e.g. this material can be added (e.g. by means of coating), this material can be removed (e.g.

by ablation), or they can be chemically converted (e.g. by heating or irradiation). The separated particles 106 can be fed, for example, to a coating arrangement for coating, as will be described below. If the particles are isolated before they are coated, this can result in smaller units that provide a larger functionalized surface. This increases the effect of the coating or the functionalization provided thereby.

The separation of the particles (e.g. before they are coated) does not have to be

necessarily or can only be done in part, depending on the prevailing requirement or economic efficiency. For example, only particle clusters or a

Mixtures of particles and particle clusters are processed (e.g. coated). In the following, for a simplified understanding, reference is made to already isolated particles. That for isolated particles What has been described can also apply analogously to particle clusters or the mixture.

2 illustrates a coating arrangement 200 according to various

Embodiments in a schematic side view or cross-sectional view.

The coating arrangement 200 can have a particle feed 202 and a collecting container 204, between which a cavity 206 (also referred to as coating space 206) is formed. Furthermore, the coating arrangement 200 can have a coating material source 208 which, for example, has a coating material with which the particles 106 are to be coated. The coating material source 208 may generally be a coating material holding device (e.g., a crucible) for holding the

Have coating material. Optionally, the coating material source can have a drive for rotating and / or tracking the coating material in order to ensure a stable process.

For example, the coating material source 208 can be used to perform a

physical vapor deposition (PVD) be set up, for example by means of

Evaporation of the coating material. For example, the coating material source 208 may be part of a coating device such as a PVD coating device or CVD coating device, as will be described in more detail below. The

Coating apparatus may also include a power supply (e.g. a

Electron beam gun, a gas discharge device or a heating device in the form of a boat evaporator), which is set up to evaporate the

To supply the coating material required power.

A coating device can according to various embodiments for

Coating 2600 of particles which are exposed to the coating material emitted by the coating device. For example, the

Coating apparatus can be arranged to provide a gaseous coating material (e.g. material vapor) which, for example, can be deposited on the particles to form a layer. A coating device can include at least one of

Include: a sputtering device, a thermal evaporation device (e.g., a laser beam evaporator, an arc evaporator, a boat evaporator, an electron beam evaporator, and / or a resistive thermal evaporator). A

Sputtering device can be set up for atomizing the coating material by means of a plasma. A thermal evaporation device can be used to evaporate the

Coating material be set up by means of thermal energy. The thermal energy can for example by means of an electron beam and / or by means of a resistive Heating device (eg in the so-called boat evaporation) are fed to the coating material. Depending on the nature of the coating material, alternatively or in addition to thermal evaporation, ie thermal conversion of a liquid state (liquid phase) into a gaseous state (gaseous phase), a

Sublimation, i.e. a thermal transfer of a solid state (solid phase) into a gaseous state, occur. In other words, the thermal evaporation device can also sublime the coating material. The sputtering device for sputtering can for example be arranged centrally in the coating room, e.g. by means of a vertical arrangement of sputtering targets (e.g. tubular magnetrons which are driven, for example, according to a planetary motion.

In the following, reference is made to a coating device in the form of a thermal evaporation device (also referred to in simplified terms as an evaporation device). What has been described can also apply analogously to a coating device of another type, as described above. The coating material may be vaporized 109 (more generally emitted 109) into cavity 206. In the sense of a subliming or semi-subliming coating material, it is also possible to vaporize into the coating room from a lateral direction, e.g. at any angle to the vertical.

The particle feed 202 can have a feed gap 202s. The feed gap 202s can be provided in the form of an annular gap and / or adjoin the outlet opening 102a.

An annular gap can be understood here as a gap which extends along a self-contained path 202p (also referred to as gap path 202p), for example over more than 90% of gap path 202p. For example, the annular gap can be contiguous. Alternatively, the annular gap can be interrupted one or more than once or have at least several segments separated from one another. For example, the annular gap can have at least two sections (e.g., segments separated from one another) arranged on opposite sides of the gap path 202p.

The cavity 206 may include or be formed from multiple areas, e.g., a first area 206a and a second area 206b. The first region 206a can extend from the feed gap 202s to the collecting container 204 and surround the second region 206b (e.g. adjacent thereto). The second area 206b (also called

Vapor expansion region 206b) can adjoin the coating material source 208. Clearly, the first area 206a (also referred to as the fall area 206a) can be cut out on the inside, and the steam spreading area 206b can be arranged in the cutout. The steam spreading area 206b can for example be cylindrical (for example with the cylinder axis parallel to the vertical 155) or at least have a lateral surface which is completely covered by the falling area 206a.

During operation, for example, a vacuum into which the coating material is evaporated can be formed in the cavity 206.

By means of the particle feed 202, a plurality of particles 106 can be introduced into the cavity 206 (e.g. the vacuum therein), e.g. into the drop area 206a and / or through the feed gap 202s. In the cavity 206, the particles 106 can then be accelerated (also referred to as falling) by the force of gravity, e.g.

Collection container 204 towards and / or along a free fall path 211 which, for example, continues the guide path 111. The falling of the particles 106 can cause this on the

Pass steam expansion area 206b. For example, the particles 106 can fall outside of the vapor spreading region 206b. Due to the acceleration, the distances between the particles can increase when they fall, which makes it easier, for example, that they are exposed to the coating material on the reverse side.

The free fall path 211 may be substantially perpendicular (i.e., parallel to vertical 155) in cavity 206 (e.g., less than 10 degrees therefrom). For example, the deviation can arise when electrons and / or the coating material interact with the particles 106, e.g. drive them slightly outwards. Under certain circumstances, this can also be done to a greater extent. For example, particularly small particles, e.g. nanoparticles with a particle size of much less than 1 μm, can get into motion and be carried outwards (i.e. towards the chamber wall), right down to areas of lower metal vapor densities. It can also be that with unfavorable material conditions (e.g. a high rate, heavy atoms, with high specific evaporation energies together with light particles (e.g. graphite) and small volumes) the particles can be blown up. For this case, a ring electrode or an electrical potential can be arranged (for example directly on the insert) in such a way that a force is transmitted downwards to the charged particles.

The particles 106 can be introduced through the feed gap 202s along the free fall path 211. The feed gap 202s can be set up in such a way that the

Free fall path 211 from gap path 202p (for example from any point of gap path 202p) leads past steam spreading area 206b and / or is arranged within falling area 206a, for example up into collecting container 204. This achieves that the multiplicity of particles 106 which fall along the free fall path 211 surround the vapor spreading area 206b. The coating material evaporated into the vapor spreading area 206b can thus flow radially outward from the steam spreading area 206b through the falling particles 106, so that the plurality of particles 106 is coated 2600 with the coating material (also referred to as coating 2600).

The spatial distribution of the plurality of particles 106 with which they are transported by the

Feed gap 202s may be essentially statistical (also referred to as statistical distribution) (along gap path 202p). The particles 106 can clearly be distributed evenly along the entire feed gap 202s. This achieves the most uniform possible utilization of the coating material in the cavity 206.

For example, for each gap section of the feed gap 202s (e.g. of the same size), the amount of particles that are summed up over a time interval through the gap section converge towards the same value with increasing length of the time interval.

In simple terms, the probability that a specific particle 106 will make its way through the gap section can be essentially the same for each gap section (also referred to as uniform distribution). This type of feed (also referred to as uniformly distributed feed) of the particles 106 can be provided by means of the particle feed 202, as will be described in more detail below.

By means of the uniformly distributed supply, it can be achieved that the mean distance between directly adjacent particles in the case (also referred to as a particle curtain) is minimized and / or the statistical deviation from this mean distance is minimized. This achieves a coating of the particles that is as homogeneous as possible.

In the following, the mechanisms of the above-described separation, the coating and their interaction are described with the aid of exemplary embodiments. The particle separation device 100 can be part of the

Coating arrangement 200. However, these can also be provided separately from one another, e.g. if the individual particles are to be processed otherwise or if particle clusters are to be coated.

The vapor spread area 206b can, for example, remain free of particles and / or at least be arranged next to the free fall path. FIG. 3 illustrates the kinetics of the electrical isolation 10lv according to various embodiments in a schematic flow diagram 300, the time profile pointing downwards. Here and below, reference is made to a particle cluster 106c, which consists of two particles 106 (also referred to as a dicluster 106c). What has been described for the dicluster 106c can also apply analogously to a particle cluster composed of more than two particles.

The electrical separation 10v can for example take place electrostatically (also referred to as electrostatic separation or electrostatic dispersion). The electrical isolation can take place by loading the particles 106 with (e.g. free) electrons, so that the particle cluster 106c can be broken down into smaller subunits (e.g. into two particle clusters 106c and / or individual particles). The electrical isolation lOlv can be based on Coulomb's repulsion, which describes the driving electrostatic force that drives two or more particles (assumed charge centers) away from each other (through electrostatic charging) and thus stimulates their separation.

The radius r of a particle of any shape and size can correspond to the radius of a sphere (i.e. a spherical particle) which has the same volume as the particle of any shape and size. In simplified terms, a spherical (e.g. electrically conductive) particle with the radius r can be considered.

The electrostatically induced charge q and repulsion force Fc on this particle 106 can satisfy the following relation:

F _c = 0.6 where

q = 4ne ₀ rU [ _s

Here e _{0 is} the electric field constant. The repulsive force Fc induced by the charge q counteracts an adhesive force FH, which describes how strongly the particles 106 adhere to one another. If the repulsive force Fc exceeds the adhesive force FH, the particles 106 separate from one another (ie, they are separated from one another). The adhesive force FH can be estimated with the Hamaker constant A of the surfaces, the molecular distance s between the surfaces (exemplarily approx. 0.4 nm) as: where with

ß = - can be written in abbreviated form

F _H = ßr.

If the induced repulsive force Fc is set equal to the adhesive force FH, the voltage U, above the particles of the radius r and the adhesive constant ß are electrostatically separated from one another from the above relations

In addition to the numerical determination of an adhesive size, there are also experimentally determined estimates that relate to a ratio of weight force to adhesive force FH. It can thus be assumed that the adhesive force FH is generally a factor of up to 10 ⁹ higher than the weight of a particle 106. This corresponds to an exemplary adhesive constant of ß = 0.3 kg / s ² (kilograms per second squared) . The following description can be based on this exemplary sticking constant.

The separation and coating are described below by way of example together with the aid of different coating arrangements, but can also be provided separately from one another.

4 illustrates a coating arrangement 400 according to various

Embodiments in a schematic side view or cross-sectional view.

The vertically extending coating arrangement 400 may have a chamber housing 802k in which one or more than one vacuum chamber 802 is provided. Several

Vacuum chambers 802 can, for example, be coupled to one another in terms of vacuum technology and connected to one another by means of an opening 202s (e.g. the feed gap 202s).

The chamber housing 802k can be configured to be rotationally symmetrical, for example. The chamber housing 802k may, for example, be grounded or on another

Reference potential. In other words, the reference potential can be electrical earth, for example. An electrical voltage described herein can be related to the reference potential, for example. The electrical voltage can correspond, for example, to an electrical potential which has a difference from the reference potential in the amount of the voltage. Each vacuum chamber 802 can provide one or more than one cavity (also referred to as a processing space) through which the particles 106 are passed and in which they are processed (eg coated). Processing in the processing room can take place by means of a processing stage 400a to 400f, which has the respective processing room.

Material tracking can take place by means of a first processing stage 400a. For this purpose, the first processing stage 400a can have a tracking mechanism 402 which is set up to continuously convey powder material into a processing space of a second processing stage 400b or an alternative or additional third processing stage 400c.

The particles 106 can be separated by means of the second processing stage 400b and the alternative or additional third processing stage 400c. For example, the second processing stage 400b can have or be formed from one or more than one mechanical separation stage 104b. Alternatively or in addition, the third processing stage 400c can have one or more than one electrical isolation stage 104a or be formed therefrom. The electrical isolation stage 104a shown here can be used for example

Be provided emitting free electrons (also referred to as electron emitter isolation stage 104a), as will be described in more detail later.

Depending on the case and circumstances, such as the material, the morphology and / or the particle size of the particles 106, only one mechanical separation stage 104b or only one electrical separation stage 104a may be sufficient.

The uniformly distributed supply can take place by means of a fourth processing stage 400d (then also referred to as uniform distribution stage 400d). For example, the

Equal distribution stage 400d have the particle feed 202, as described above. The uniform distribution stage 400d can clearly show a homogenized powder supply and supply into a processing room 206 (also as a coating room 206 or

Coating zone 206 referred to) of a fifth processing stage 400e (also as

Coating stage 400e designated) provide.

The uniform distribution stage 400d can optionally have a vibratable and / or rotatable circular membrane 202m or disk 202m (e.g. comprising metal or formed therefrom). The membrane 202m (e.g. its outer circular contour) can delimit the feed gap 202s (e.g. its inner contour). The membrane 202m can, for example, have a media feed, cooling water, electrical connection, sensors and / or

Vibration coupling (e.g. inside and / or outside). The uniform distribution stage 400d can clearly show a thinly falling through the feed gap 202s

Provide particle curtain. In the coating room 206 of the coating stage 400e, the functionalization of the particles 106 can take place by means of the coating material source 208. The coating material source 208 can, for example, be set up for electron beam evaporation (EB evaporation) or be part of another high-rate evaporation device. The

Coating space 206 can, for example, fall area 206a and / or the

Have vapor spreading area 206b.

The coating device can also be provided by means of a PVD chamber (with, for example, vertically arranged tubular magnetrons) or a CVD chamber. The

Coating apparatus can also perform boat evaporation. In the

Boat evaporation does not necessarily involve irradiating the

Coating material by means of an electron beam.

The particles 106 can fall through the coating space 206 into the collecting container 204 (also referred to as a collector) of a sixth processing stage 400f. By means of the collecting container 204, the particles can be collected and / or concentrated and optionally discharged 204a out of or into this.

The coating device, which has the coating material source 208, can furthermore have an electron beam source 404, which is configured to generate an electron beam 23 in the direction of the coating material source 208. The

Electron beam source 404 can also be part of an electron beam gun 404, which further comprises a deflection system 142 a for deflecting the electron beam 23 in the direction of the coating material source 208. The deflection system 142a may include one or more than one electrical coil or one or more than one capacitor, for example. The electron beam source 404 may include a primary electrode (e.g., a primary cathode, e.g., a hot cathode) and a beam shaping unit (e.g., a primary anode). In general, one or more than one electron beam source can be used, of which

For example, a first electron beam source 404 vaporizes the coating material 208m and a second or the first electron beam source 404 provides electrons for separation.

The multiple processing stages 400a to 400f can clearly be stacked one on top of the other, so that they are arranged one behind the other along a particle path 111, 211, which has the guide path 111 and / or the free fall path 211.

By means of the coating material source 208, the evaporation of the

Coating material 208m and the coupled functionalization of a flow of falling particles 106 (also referred to as particle flow) take place. The Particles 106 can for example be separated before coating, for example by means of the one or more than one separation step 104a, 104b.

The evaporation 109 of the coating material (also referred to as the formation of material vapor) can take place by means of the electron beam 23. For this purpose, the electron beam 23 can be directed onto the coating material 208m to be evaporated. Optionally, the coating material 208m can be evaporated from a crucible (also referred to as an evaporation crucible) and / or consist of a strand. For example, this can

Coating material can be arranged in the evaporation crucible. If the strand is fed in from below, the evaporation crucible can be of tubular design and extend through the collecting container 204 or be surrounded by it.

Due to this design, the electron beam 23 can be fed into a channel 406 (also called

Designated beam guiding channel 406, e.g. a pipeline, also simplified as

Beam guide tube 406), which for example leads for the most part through the entire structure and / or is arranged centrally in the chamber housing 802k.

The electron beam 23 can primarily be directed onto the coating material of the coating material source 208 in order to vaporize the coating material which is arranged in the lower part of the chamber housing 802k. Optionally, the electron beam 23 for

Provision of free electrons can be used. The electrical isolation can take place by means of the free electrons, i.e. adhering (i.e. agglomerated) particles can be electrostatically dispersed. In other words, the

Electron beam 23 optionally the or each electrical isolation stage 104a are electrically supplied.

In order to prevent unwanted permanent parasitic coating of the chamber housing 802k (e.g. its chamber wall) and / or other components arranged therein, one or more than one sacrificial sheet 408 (or more generally shielding 408) can be arranged within the chamber housing 802k. At least one shield 408 can, for example, between the

Chamber wall and the fall area 206a be or will be arranged. For example, the at least one shield 408 can be conical and / or designed in the form of an exchangeable insert (also referred to as an inlay). By analogy, at least one additional shield can be arranged on other important components and / or can be exchanged.

It can clearly be achieved by means of the insert 408 that the interior of the

Chamber housing, seen as an outer jacket, free of the accumulated coating material obese, whereas the insert (e.g. a sheet metal cone) acts as a stray steam victim and can be replaced at regular intervals. Optionally, a fluid chamber can be arranged on the chamber housing, for example its chamber wall, and / or between the chamber wall and the insert 408. The fluid chamber can, for example, to a

Temperature control device (e.g. having a cooling and / or heating circuit)

be or will be connected. Optionally, the coating arrangement 400 can be a

Have gas supply device 1716 for supplying a gas into the chamber housing 802k. Optionally, the depositor or a separate one can be taken into account

Ringel electrode carry an electrical potential so that the intrinsically (for example via secondary electron bombardment) or separately charged particles can be consciously influenced in their trajectory. For example, can be directional at very high

Coating rates via atomic impact processes and small particle masses that cause the particles to float - up to the lightest fraction of a corresponding one

Particle distribution («1 pm) are moved upwards.

A process gas can be supplied to the vacuum chamber housing 802k by means of the gas supply device 1716 in order to form a process atmosphere in the

Vacuum chamber housing 802k. The process gas can, for example, comprise a precursor gas, a reactive gas and / or an inert gas or be formed therefrom. The inert gas can, for example, comprise argon or be formed from it. The reactive gas can for example contain nitrogen or oxygen or be formed from them. The precursor gas can, for example, have gas molecules that have more than 4 atoms. For example, the gas supply device 1716 can be coupled to a gas source for a chemical-physical reaction process.

Furthermore, the vacuum chamber housing 802k can be coupled to a pump system 804 (having at least one rough vacuum pump and optionally at least one high vacuum pump). The pump system 804 can be configured to withdraw a gas (eg the process gas) from the vacuum chamber housing 802k, so that a vacuum (ie a pressure less than 0.3 bar) and / or a pressure in a range of approximately 1 mbar to about 10 ³ mbar (in other words fine vacuum) and / or a pressure in a range from about 10 ³ mbar to about 10 ⁷ mbar (in other words high vacuum) or a pressure less than high vacuum, e.g. less than about 10 ⁷ mbar (in other words ultra-high vacuum) be provided or can be provided. The process pressure can form from an equilibrium of process gas which is supplied by means of the gas supply device 1716 and withdrawn by means of the pump system 804.

Optionally, the coating material source 208 can have a plurality of spatially separated coating materials, each of which coating material is evaporated can for coating the particles 106. Optionally, the coating material source 208 can be or be actively cooled, for example by means of a cooling fluid which flows through the or each crucible 208t of the coating material source 208.

The lateral extent of the coating material source 208 can be smaller than the distance between opposing sections of the feed gap 202s (e.g. the

Diameter of the dissemination membrane 202m). This enables contamination of the coating material source 208 by the particle flow to be inhibited. When the electron beam 23 collides with the coating material (also referred to as evaporation material), it can (e.g. due to elastic and inelastic collisions with the core atoms or

Electrons of the coating material) also come to the emission of secondary electrons from the coating material.

The secondary electrons can, for example, electrically charge the particles in the falling region 206a (also referred to as a particle curtain or particle curtain). This allows a

Electron pressure (clearly also referred to as wind) arise, which drives the particles away from the coating material source 208. A high power of the electron beam 23 and the comparatively fast evaporation of the coating material (e.g. a metal rod) result in a rapid tracking of the material vapor.

As described above, the coating material 208m (e.g. a metal rod) can be replenished through the chamber wall into the coating space 206. Alternatively or additionally, the coating material source can have a magazine (e.g. within the vacuum chamber) in which several rods are removed from the

Coating material are recorded and can be tracked from this.

As described above, the gas delivery device 1716 may include one or more than one gas inlet valve (e.g., located on the chamber walls of the chamber housing 802k). By means of the one or more than one gas inlet valve, a reactive gas can be fed into the coating space 206, e.g. for a chemical-physical

Reactions with the particles 106 and / or the material vapor 109. The amount of

Material vapor 109 (e.g. metal vapor) and / or the evaporation rate can be controlled and / or regulated (e.g. by means of the control device) via the power of the coupled-in electron beam 23. This allows the thickness of the particle coating (also called

Coating thickness). After the coated particles have passed through the coating space 206 (also referred to as the functionalization zone), they can be fed to the sixth processing stage 400f. The collecting container 204 (also referred to as a collector) can provide the function of collecting the coated particles 106, concentrating and using a

Discharge mechanism 1710 continuously. The bottom of the receptacle 204 may provide a particle support which is inclined, i.e., inclined in an illustrative manner. During operation, the particle support can enclose an angle (also referred to as an angle of inclination) with the horizontal.

Optionally, the collecting container 204 can be designed to be able to vibrate, for example by means of a vibration source 1704 (see FIG. 18). For example, the collection container 204 can provide a loosening device.

The inclination and certain vibration frequencies can guide the particles in the collecting container 204 in a fluid and gentle manner into a recessed section of the collecting container 204, instead of which they can be discharged by means of the discharging mechanism 1710 through an outlet opening of the collecting container 204. The

The discharge mechanism 1710 can, for example, have a screw conveyor (then also referred to as a screw conveyor) which, for example, compresses the particles and thus helps to maintain the existing vacuum in the chamber housing 802k.

The collecting container 204 can for example by means of a flange connection with the

Chamber housing 802k be connected so that it can be rotated to one side if necessary. This makes it easier to replace the shield 408 (this can then be removed downwards).

5 illustrates a coating arrangement 500 according to various

Embodiments in a schematic detailed view, e.g. their first processing stage 400a.

In general, the particles can be removed from a bed 511 (clearly a supply of particles) by means of the feed mechanism 402 and brought through an opening into one of the processing rooms, i.e. fed to it. This can take place, for example, through an opening 102e, 202s. The opening 102e, 202s can be the inlet opening 102e or the feed gap 202s. In other words, the particles can, for example, be fed to one or more than one separation stage 104a, 104b or to the coating stage 400e. The opening 102e, 202s can optionally be provided in the form of an annular gap.

The bed 511 can be arranged in a storage container 504. In order to achieve continuous material tracking and the transfer of particles from an atmospheric environment 501 into a vacuum, the tracking mechanism 402 can have a screw conveyor 502 (then also referred to as screw conveyor 402). The particles 106, which are moved by the screw conveyor 502, are compressed and thereby and due to the structural shape (length, circumference, etc.) of the screw conveyor 502 provide a gas separation from the atmospheric environment 501, so that not

a clocked inward and outward transfer is necessary. Using the

Conveyor screw 502, for example, the particles 106 can be fed in continuously.

Alternatively or in addition, a so-called stack filling can take place. For this purpose, a supply container 404 under negative pressure can be continuously filled with material via an inward and outward transfer mechanism, for example a shorter screw conveyor 502 and / or a conveyor belt transporting the particles from the negative pressure container 504 through the opening 102e, 202s.

As an alternative or in addition to the screw conveyor 502, the feed mechanism 402 can have a metering plate (e.g. having the annular gap).

Alternatively or additionally, the powder material to be functionalized can also be - and remain - in the form of a storage and collecting container in a vacuum.

6A illustrates a particle isolation device 600 according to various embodiments in a schematic detailed view, for example with a view of a mechanical isolation stage 104b thereof. FIG. 6B and FIG. 6C each illustrate the kinetics of the mechanical isolation in a schematic diagram 600b, 600c.

The still partially aggregated particles 106 (clearly the agglomerate-containing powder) can be brought to a mechanical acceleration device 602, for example by means of the feed mechanism 402. The mechanical acceleration device 602 can be set up to effect a mechanical acceleration 103 of the particles.

The mechanical acceleration device 602 can for this purpose a rotatably mounted

Have particle support 602 on which the particles are placed (e.g. on

fall down). The particle support 602 can, for example, have a flat rotary disk 602 or an uneven rotary plate 602 or be formed therefrom. As an alternative or in addition to the rotatable mounting, the particle support 602 can be coupled to a vibration source in order to set the particle support 602 in vibration. In that case, the particle support 602 can be turned out upwards, for example convexly or concavely. in the In the following, reference is made in simplified form to a rotatably mounted rotary disk 602, whereby the same can also apply to a differently shaped particle support 602.

By rotating 601 the rotating disk 602, the particles lying thereon can be carried along with the rotation and thus execute a movement that encircles the axis of rotation of the rotating disk 602. Because of the orbiting movement, a centrifugal force can act on the particles, which accelerates 103 the particles 106 away from the axis of rotation, so that they absorb kinetic energy. The accelerated 103 particles 106 can be thrown against the impact surface 104p. The baffle 104p can be, for example, a surface of the chamber housing 802k, e.g., a chamber wall thereof, or can be provided by means of a baffle (e.g. a baffle) attached to the chamber housing 802k.

Diagram 600b shows the speed 601 of the rotating disk 602 (e.g. in 1 / s) above the

Particle size 603 which causes a separation. This mechanical action of the second isolation stage 104b, e.g. its rotating disk 602, can be sufficient to effectively break up larger agglomerates, as is illustrated schematically in diagram 600b using the example of a particle cluster 106c consisting of two particles (also referred to as dicluster 106c) different diameter d the

Rotating disk 602.

To break up the dicluster 106c (for example consisting of two spherical particles of the same size adhering to one another), kinetic energy may be required which can be translated into a velocity v. The following relation can apply to this:

Here n = 2 is the number, p is the mass density and thus the molecular distance between the particles 106 of the cluster 106c. For a particle cluster with more particles, n can also be greater than 2.

This speed v can then be converted into a speed 601 based on the design of the rotating disk (e.g. the disk diameter d). So it turns out

for example a speed of rotation of around 2.5 s for a case with a relatively large adhesion constant of β = 0.5 kg / s ² , a disk diameter d of 20 cm and 100 nm particles.

The speed 601 illustrated in diagram 600b decreases with increasing particle size 603 and illustrates the case that the entire kinetic energy of the cluster 106c is expended to overcome the adhesive force Hp (also referred to as energy transfer). For a smaller particle size 603 can have a higher kinetic energy or a higher one

Speed of the dicluster 106c may be required for dispersing, since the energy transfer does not consume all of the kinetic energy.

In contrast, in the experiment, even lower speeds can be sufficient to separate larger macroscopic agglomerates (> 1 mm). But this does not have to be

necessarily or can only partially apply to microscopic agglomerates (<100 pm).

The relationship between the particle size 603 and the required speed 601 illustrated in diagram 600b is illustrated in a generalized manner in diagram 600c,

for example for a second isolation stage 104b, which does not necessarily have to have a rotary disk 602. Diagram 600c shows the speed 605 of the dicluster 106c (e.g. in 1 / s) over the particle size 603, to which this is accelerated 103 for separation.

In addition to the relationship illustrated in the diagrams 600b, 600c between

In the case of a microscopic agglomerate 106c, particle size 603 and the required kinetic energy can furthermore occur microphysical effects which are difficult to determine and which influence the energy transfer predicted by the theory. The actual energy transfer, i.e. the amount of energy that is converted from the speed when a dicluster 106c hits the impact surface 104p into energy for breaking the adhesion, can also be from

Be dependent on the angle of impact.

In order to cover as different angles of impact and probabilities of loosening the adhesion as possible, the impact surface 104p can be uneven. For example, the impact surface 104p can have a large number of macroscopic cones, pyramids and / or hemispheres or other protuberances or depressions.

Depending on the material and degree of utilization, the rotary disk 602 can be different

Have surface profiles, angles of inclination and / or spiral guide grooves in order to accelerate the particles 106 with a high energy transfer against the impact surface 104p.

Optionally, one or more than one mechanical shredding process can take place,

for example by means of a rotating knife block on the rotating disk 602 or above, for example at the entrance opening 102e.

On the output side, the mechanical isolation stage 104b can be an optional

Have guide device 604 which, for example, has a plurality of beveled and / or inclined guide surfaces (for example baffles) between which a gap 604s is provided. The gap 604s can be in the form of an annular gap, for example. The guide surfaces 604 can focus the particles 106 to form a (eg, rotationally symmetrical) particle curtain and / or, more generally, guide them to the next processing stage. Optionally, the guide device 604 can have a switchable vibration source which excites a vibration of the guide surfaces (for example up to ultrasound excitation), which improves the flowability of the powder. The mechanical separation stage 104b can be used as

Pre-isolation stage act and preferably separate larger agglomerates in the macroscopic range.

7 illustrates a particle isolation device 700 according to various

Embodiments in a schematic side view or cross-sectional view and a detailed view 700a, on a plurality of isolation stages 104a, 104b of these.

The electrical isolation stage 104a can have at least one (i.e. one or more than one) electrode 104e, which is provided with a first electrical potential. The

Guide path 111 can lead to the at least one electrode 104e, so that the particles 106 are brought into physical contact with the electrode 104e. When in contact with the at least one electrode 104e, the particles 106 can absorb electrical charges therefrom, which excites an electrical isolation 110v of the particles 106 electrically charged in this way.

The mechanical isolation stage 104b can have an electrical acceleration device 602 which is set up to provide an electrical field 602e. The electric field 602e can transmit a force to the electrically charged particles 106 which accelerates the particles 106 towards the acceleration device 602 (clearly attracts them). The force can be proportional to the charge q received by the particle 106 and proportional to the field strength of the electric field 602e.

The electrical acceleration device 602 can, for example, have a counter-electrode 602 (e.g. anode) which is assigned to the electrode 104e (e.g. cathode) and to which a second electrical potential is provided. The second electrical potential can differ from the first electrical potential (and optionally from the potential of the chamber wall 802k), so that the electrical field 602e (or an electrical voltage) between them

is provided. The counter electrode can have the baffle surface 104p. The particles 106 can be mechanically separated upon contact with the impact surface 104p and at the same time at least partially release their electrical charges to them (clearly discharged). The particles 106 discharged in this way can ricochet off the impact surface 104p and / or be accelerated by the electric field 602e to the electrode 104e, where they are recharged so that the process begins anew. Between the electrode 104e and the counterelectrode 602 (also referred to as channel walls 104e, 602 or contact electrodes 104e, 602), a channel 702 (also referred to as guide channel 702s) can be formed, through which the particles 106 are guided under the action of their weight and alternately makes one or more contact with each channel wall of the two channel walls 104e, 602. The guide channel 702s can for example be designed as an annular gap. The guide path 111 can be extended through the guide channel 702s.

In the opposite pole guide channel 702s, a mechanical and electrical

Isolation take place. Similarly, the particles can optionally be crushed upon contact with electrode 104e. For example, one side of the channel can be or become electrically positively charged and the other electrically negatively charged, so that the particles 106 falling through are each accelerated 103 towards both channel walls 104p and are broken up when they impact. Depending on the electrical voltage and particle size distribution, the particles fluctuate more or less back and forth between the channel walls 104e, 104p and thus experience a large number of impacts that stimulate isolation.

8 illustrates a particle separation device 800 according to various

Embodiments in a schematic detailed view, e.g. on several processing stages 400b, 400c of these. A mechanical isolation stage 104b can have a rotary disk 602 or provide mechanical acceleration of the particles 106 by means of the rotating rotary disk 602. An electrical isolation stage 104a can be a

Have electrode 104e, by means of which electrons are introduced into the particles 106. An additional mechanical isolation stage 114a can have a counter electrode 602 of the guide channel 702s, and by means of this provide an electric field, so that the particles 106 are accelerated by means of the electric field.

9A illustrates a particle separation device 900 according to various embodiments in a schematic detailed view, at least on one electrical separation stage 104a of this. As described above, the effect of the electrostatic, Coulombic repulsion of two or more charged particles 106 adhering to one another can be provided by means of an electrical isolation stage 104a.

The electrical isolation stage 104a of the particle isolation device 900 can be provided in electron emitter configuration (then also referred to as electron emitter isolation stage 104a). By means of the electron emitter isolation stage 104a, the particles, which for example fall out of a preceding processing stage, can pass through a vacuum area 911 (also referred to as the charging area 911), in which free electrons are located.

The free electrons can be emitted from an electron source 902, for example a glow electrode 902, wound around the beam guiding channel 406 and / or with its full circumference. The glow cathode 902 can be set up to provide thermally emitted electrons. The hot cathode 902 can, for example, have a heating device which is set up to release thermal energy. As an alternative or in addition to the hot cathode 902, a field emission cathode can also be used. What is described for the hot cathode 902 can also apply analogously to the field emission cathode. The field emission cathode can

for example have one or more than one silicon field emission array. Compared to the hot cathode, a field emission cathode reduces the generation of heat.

The glow electrode 902 can, for example, be electrically isolated from the beam guiding channel 406, e.g. by means of a dielectric layer which separates them from one another. One of the

The first electrode 904 associated with the glow electrode 902 (e.g. perforated) is accelerated

(for example via an extraction electrode) the electrons emitted by the glow electrode 902 outwards (e.g. rotationally symmetrical and / or in a radial direction), e.g. in

Direction towards the charging area 911 through which the guide path 111 extends or the (e.g. vertically) falling particles 106 are arranged.

The first electrode 904 (e.g., an accelerating electrode 904) can, for example, comprise or be formed from a metallic extraction grid 904.

A (e.g. perforated) second electrode 906 (e.g., a delimitation electrode) assigned to the glow electrode 902 and arranged, for example, on the chamber wall 802k, accelerates and limits the free electrons to the charging area 911, through which the guide path 111 extends. The first electrode 904 and the second electrode 906 can differ from one another, for example, in terms of their electrical potential.

In this way, the electrons are clearly guided through the powder curtain. The accelerated electrons collide with the particles 106, penetrate them and thus induce an electrical charge in the particles 106. If a sufficiently high electrical charge has been achieved, particles 106 with the same charge and sticking together repel each other due to the Coulomb repulsion.

9B illustrates the kinetics of electrical isolation in a schematic diagram 900b using the glow electrode 902 as an example. The one described for this purpose Correlation can also apply analogously to electrical isolation, which introduces electrons into the particles 106 in a different way.

In the diagram 900b, the electrical voltage 901 of the glow electrode 902 (based on the limiting electrode 906 or a reference potential) is plotted against the particle size 603 of the particles 106, which causes electrical isolation. As can be seen, a potential difference 901 of 30 V can already be sufficient to electrostatically separate two 1 mih particles 106 from one another. Because of the great influences of air humidity and surface topology, the adhesive force FH between two or more particles 106 is not always exact

to predict. The consideration of the adhesive force FH can, however, be based on the proportionality of the adhesive force FH to the particle size 603 of the particles 106 (eg their radius r) and their decrease with s ² . The decrease with s ² reflects that the adhesive force FH or the adhesive constant β decreases very quickly if the distance s between the particles 106 (or between their surfaces) is increased, as described above.

Diagram 900b shows the relationship for different sizes of adhesion constants (ß = 0.00015 kg / s ² ; ß = 0.0087 kg / s ² and ß = 0.5 kg / s ² ). Based on this, the

Charges and voltage, which caused an electrical isolation of the adhering particles 106, i.e. that the particles 106 of a certain particle size 603 are detached from one another. The same relationship is illustrated in a generalized manner in FIGS. 10A and 10B.

10A and 10B each illustrate the kinetics of electrical isolation in a schematic diagram 1000a, 1000b. In the diagram 1000a, the electrical charge 1001 introduced per particle 106 of a particle cluster (also referred to as charge, in coulombs) is plotted over the particle size 603 of the particle 106. In the diagram 1000b, the electric field 1003 (in volts / meter) is between the glow electrode 902 and the

Boundary electrode 906 applied over the particle size 603 of the particles.

If the particle stream has a throughput rh of 35 g / s (mass m of the particles 106 per

Time interval, in grams per second), about 1000 particles (e.g. having a diameter of about 1 μm) per second pass through the charging area 911 on the glow electrode 902. The glow electrode 902 can be electrically supplied in such a way that it generates enough free electrons to load each particle 106, for example with up to 30 V (or even more).

The current strength I with which the glow electrode 902 is supplied for separating one

Particle of current with mass m (whose time derivative is m), can satisfy the following relation: Here, P denotes the mass density of the particles 106 and q denotes the charge per particle (for example in coulombs). The example results in a current I of up to 0.03 A (ampere) for a mass flow of 35 g / s, a density P of 2.4 g / cm ³ and an electrical potential of

30 V. Depending on the material of the glow electrode 902 (also referred to as electrode material), the current intensity I represents a temperature of the glow electrode 902 (e.g. a

Filament, such as a filament), which generates enough free thermally emitted electrons, which is described by the following relation. w

l = A _* A _{e *} T ² _* e 'kr

The Richardson constant Ao can be, for example, 600,000 A / m ² K ² (amperes per meter squared and Kelvin squared) for tungsten or, for example, 100 A / m ² K ² for barium strontium oxide (BaO-SrO). The Boltzmann constant k is 8.617-10 ⁵ eV / K (electron volts per Kelvin). The following table provides an overview of various electrode materials in various exemplary configurations 1 to 4.

Here, D is the diameter of the hot cathode, H the height of the hot electrode 902 (also referred to in simplified form as hot cathode 902) and S the wire diameter. Several parameters are shown in the following table for the various configurations, such as the current I (in milliamps) with which the hot cathode 902 is supplied

Temperature T (in Kelvin) of the hot cathode 902, the power P (in watts) with which the

Hot cathode 902 is supplied, the recommended temperature TA of the hot cathode 902 (also referred to as working temperature, in Kelvin), and the expected service life tL (in hours) of the hot cathode 902.

The tables show that a current intensity of 30 mA (milliamps) is not necessarily sufficient to reach the recommended working temperature TA of the hot cathode 902. In order to achieve this, the hot cathode 902 can be supplied with a current I greater than 30 mA until its working temperature TA is reached. A tungsten wire can be operated at up to 2600 Kelvin, which can correspond to a current I of up to 8.3 amps. In the case of a barium-strontium oxide wire ring, the working temperature can correspond to a current I of approximately 3 amperes. The current I, which corresponds to the working temperature TA, can thus deliver enough free electrons to electrostatically separate (i.e. disperse) a particle flow of 35 g / s.

FIG. 11 illustrates a particle isolation device 1100 according to various embodiments in a schematic detailed view (for example, looking along the guide path 111 and / or along the vertical 155) onto an electron emitter isolation stage 104a of this. The particle singulation device 1100 can have: a beam guiding channel 406 through which an electron beam 23 can be guided, and the

Electron emitter isolation stage 104a. The electron emitter isolation stage 104a may include: a holding device 1102 for holding the electron emitting

Glow electrode 902 (also referred to as hot cathode 902), acceleration electrode 904 (also referred to as acceleration anode 904) and limiting electrode 906. Between the limiting electrode 906 and the acceleration electrode 904, the

Charging area 911 may be arranged, e.g., surrounding accelerating electrode 904.

The glow electrode 902 can for example have a glow wire or be formed from it. The charging area 911 can be provided, for example, in the form of an annular gap. The acceleration electrode 904 can, for example, have a grid or the like or be formed therefrom. The glow electrode 902 can, for example, be coupled to a power supply (not shown), for example by means of a power cable.

FIG. 12 illustrates a particle separation device 1200 according to various embodiments in a schematic detailed view, for example of an electron emitter separation stage 104a thereof. The electron emitter isolation stage 104a can be set up to emit free electrons in the form of secondary electrons (also referred to as free secondary electrons). For example, free secondary electrons can be used for the electrostatic dispersion, which are generated by direct coupling of the electron beam 23 into the electron source 902, for example a secondary electron emitter electrode 902 (also referred to as an electron beam-supplied secondary electrode 902 or secondary electrode 902 for short).

The emission of secondary electrons (also referred to as secondary emission) can be understood as the emission of electrons from the surface of a solid, which is caused by "primary" electrons (also referred to as primary electrons). The primary electrons can be provided by means of the electron beam 23, which is directed onto the secondary electrode 902. Alternatively or in addition to the primary electrons, another radiation can be used, e.g. X-ray or

Gamma radiation.

The secondary electrons generated by the electron beam 23 can be in the

Charging area 911 (ie into the particle flow) are emitted. As an alternative or in addition, the secondary electrode 902 can be set up (for example, beveled, concave, convex and / or conical) in such a way that the electron beam 23 is reflected by means of the secondary electrode 902 in the direction of the charging area 911. Part of the power of the electron beam 23 can thus be used for electrical isolation. The secondary electrode 902 can, for example, have or be formed from a metal ring, onto which the electron beam 23 is directed. The charge of the by the in the

Electrons emitted into charging area 911 may be sufficient to generate a

Particle flow of 35 g / s to be charged with up to 30 volts, so that electrostatic dispersion can take place.

13 illustrates a particle separation device 1300 according to various embodiments in a schematic detailed view, for example of an electron emitter separation stage 104a thereof. The electron emitter isolation stage 104a can have: the secondary electrode 902, the optional beam guidance channel 406, and the

Electron beam source 404. The electron emitter isolation stage 104a can be configured to emit free electrons 1202 into the charging area 911. The free electrons 1202 can electrons of the reflected from the secondary electrode 902

Electron beam 23 and / or secondary electrons emitted by the secondary electrode 902 or be formed therefrom. The metal ring 902 of the electron emitter isolation stage 104a can, for example, have a beveled ring-shaped metal blank. Optionally, the beam guiding channel 406 can have two dielectric segments 1302, between which the secondary electrode 902 is arranged.

For example, the electron beam 23 can be controlled according to a cycle, the cycle having several phases (for example each of a few milliseconds in duration), of which the electron beam 23 is directed onto the secondary electrode 902 in a first phase, and of which in a second phase the Electron beam 23 is directed onto the coating material source 208 (for example through a passage opening of the secondary electrode 902 or past it).

14 illustrates a particle isolation device 1400 according to various embodiments in a schematic detailed view, e.g. of several isolation stages 104a, 114a thereof. By means of the coating arrangement 1400, for example, particles 106 can be processed particularly well, all of which have a similar particle size (e.g. not

necessarily having a size distribution).

By means of the electrical isolation stage 104a, the electrostatic isolation can take place by means of secondary electrons, which are emitted from a metal ring 902 in that the latter is bombarded with the electron beam 23. Alternatively or additionally, an additional electrical isolation stage 114a can be used to perform electrostatic isolation by means of thermally emitted electrons from a glow electrode 902. Furthermore, by means of the coating arrangement 1400, an electrostatic selection of the particles 106 can take place. For this purpose, the coating arrangement 1400 can have a selection chamber 1401. The still agglomerated particles 106 are guided into the selection chamber 1401, for example by means of a dosing unit of the tracking mechanism 402. The bottom of the selection chamber 1401 can be vibratable and / or electrically conductive

Particle support 602 (e.g. having a membrane 202m) which is enclosed, for example, in a rigid and / or electrically insulated or electrically conductive and / or electrically insulated or electrically conductive frame. The electrostatic emission can make it possible, for example, to supply mainly (or only) dispersed, that is to say completely isolated, particles 106 to the downstream processing space, as will be described in more detail below.

FIG. 15 illustrates a particle isolation device 1500 according to various embodiments in a schematic detailed view, e.g. of several isolation stages 104a, 114a thereof.

The particle support 602 can provide a floor of the selection chamber 1401, for example. The selection chamber 1401 can, for example, have an oscillating and / or electrically conductive chamber floor 602 (also referred to as emission floor 602). The chamber bottom 602 can, for example, have a membrane 202m and / or a plate 602b (e.g. disc, e.g. vibrating disc) or be formed therefrom. The particles 106 to be separated can be fed to the selection chamber 1401, for example by means of the tracking mechanism 402.

The selection chamber 1401, e.g. its emission base 602 and / or upper chamber part 1402, can be made by means of one or more than one dielectric (clearly electrically isolated)

Connection piece 1504 be stored. Each connecting piece 1504 can, for example, comprise or be formed from a ceramic. Alternatively or additionally, the

Emission base 602 and the upper chamber part 1402 can be coupled to one another by means of the one or more than one connecting piece 1504. For example, at least one connecting piece 1504 can provide a chamber side wall of the selection chamber 1401, which extends from the emission base 602 to the chamber upper part 1402.

For example, the at least one chamber side wall can have one or more than one lateral outlet opening 1501. The outlet opening 1501 can be provided, for example, in the form of an annular gap.

The membrane 202m can provide an electrode and the upper chamber part 1402 can provide a counterelectrode, assigned to it, of the additional electrical isolation stage 114a. The For this purpose, membrane 202m can be or will be provided with an electrical potential (then also referred to as contact electrode 202m), which, as described above, can be set up as a function of particle size 603 and / or the adhesion constant β. An electrical charge can be introduced into the particles 106 by means of the electrical potential of the membrane 202m.

For the selection effect, the upper chamber part 1402 can for example be electrically grounded (or more generally have the reference potential) and clearly provide the counter potential to the electrically charged membrane 202m. The potential difference (i.e. electrical voltage) between the membrane 202m and the chamber top 1402, which is spatially and / or electrically separated for this purpose, can provide an electrical field in the chamber interior between them. The electric field inside the chamber can transmit a force to the electrically charged particles 106, so that they move along the field lines of the electric field towards the upper chamber part 1402 (e.g. analogous to the opposing polarity

Channel walls 104e, 104p).

For ideally spherical particles 106, the following relation can describe the relationship between the kinetics and the particle size as a function of the adhesion:

The effect of the adhesion of the particles 106 to one another and to the chamber floor 602 has an influence on the kinetics of the charged particles 106. If the particle size exceeds a threshold value, the field strength can no longer decrease coherently with the particle, but above the threshold value depending on the Increase the liability constant.

This relationship is illustrated in Fig. 16.

Fig. 16 illustrates the kinetics of electrical isolation in a schematic

Diagram 1600. In diagram 1600 the electric field 1003 (in volts / meter) is im

Chamber interior applied over the particle size 603 of the particles for various different adhesion constants. Optionally, a vibration can be coupled into the selection chamber 1401, for example its chamber bottom 602, by means of the vibration disk 602b or, more generally, a vibration source. For example, the plate 602b can couple the vibration source with the membrane 202m or have the vibration source (eg a coil). For example, the vibration source can be set up to excite the membrane 202m to vibrate. Depending on the frequency of the oscillation (also referred to as oscillation frequency), the oscillation may be able to move the particles 106 on the chamber floor 602 (for example the

To put membrane 202m) in a fluid-like state of suspension and thereby reduce the influence of the adhesion to the chamber bottom 602. This makes it possible to use a lower field strength.

For example, the fluid-like state of suspension of particles (for example with a particle size between 10 μm and 100 μm) can set in at an electrical field E of approximately 2-10 ⁵ V / m for an adhesion constant of approximately β = 0.00015 kg / s ² . The electric field E can

for example by means of an electrical voltage of approximately 20 kilovolts (kV) at a distance of the particle support 602 from the upper chamber part 1402 (or more generally electrode 202m from counter electrode 1402) of 10 cm (also referred to as electrode distance). However, other combinations of

Electrode spacing and electrical voltage can be used.

For example, an electrode spacing of 10 cm or more can have the effect that mainly smaller particles are accelerated sufficiently in such a way that they overcome the exemplary electrode spacing of 10 cm. The movement of larger particles or particle clusters can be dominated by their weight, whereupon they fall down again after they have lifted off. This clearly makes it possible to control the particle size of the particles 106 brought out of the lateral openings 1501 of the selection chamber 1401 (e.g. by means of the voltage).

Optionally, free electrons 1202 can also be emitted into the interior of the chamber (clearly an electron wind is provided), e.g. by means of electron beam bombardment of a metal ring 902 and / or thermally emitted electrons from a glow electrode 902.

The free electrons 1202 can electrically charge the particles 106 inside the chamber, for example above the emission potential until the Coulomb repulsion is reached.

Agglomerated particles 106 are thus effectively separated so that they too can now overcome the exemplary electrode spacing (e.g. of 10 cm). The gradually provided composition of the particles inside the chamber (clearly a powder mist) can be attracted (also referred to as electrostatic attraction) through the lateral openings 1501 of the selection chamber 1401 by the limiting electrode 906 of the electrical isolation stage 104a (e.g. on the chamber wall 802k). The one from the

Particles emitted from the selection chamber 1401 hit an impact surface 104p of the

Limiting electrode 906, to which they give off their electrical charge and then fall down and can be guided into the next process space. Optionally, a plasma source can be arranged in the interior of the chamber, for example as an alternative or in addition to electrical isolation stage 104a and / or the additional electrical isolation stage 114a. The plasma source can for example at the

Secondary electrode 902 (e.g. glow electrode 902). The falling particles 106 can experience collisions with electrons and / or ions of the plasma by means of a plasma formed inside the chamber (e.g. as an alternative or in addition to the free electrons). This effect supports the dispersion of agglomerates while at the same time

Surface treatment to reduce possible oxides, carbides, nitrides and to improve the adhesive strength and electrical properties in interaction with the functional layer to be deposited.

17 illustrates a coating arrangement 1700 according to various

Embodiments in a schematic side view or cross-sectional view. The

Coating arrangement 1700 can include rotating disk 602 and a glow electrode 902.

The coating arrangement 1700 can have a vibration source 1704 (e.g. vibration disk) which is coupled to the collecting container 204 and optionally carries an electrical potential which charges the particles and can thus be influenced in the course of their trajectory. The coating arrangement 1700 can furthermore have a holding device 1702 for holding (e.g. screw connection point) the shield 408, which can be introduced into the shield 408 in a form-fitting manner.

The coating arrangement 1700 can furthermore have a discharge channel 1710 coupled to the collecting container 204 for discharging 204a the particles 106 after they have been coated.

18 illustrates a coating arrangement 1800 according to various

Embodiments in a schematic side view or cross-sectional view. The

Coating arrangement 1800 can have the selection chamber 1401, in which the electron beam-supplied secondary electrode 902 and a horizontally extending contact electrode 202m have. An electrically charged impact surface 104p can be arranged next to the selection chamber 1401.

19 illustrates a coating arrangement 1900 according to various

Embodiments in a schematic side view or cross-sectional view. The

Coating arrangement 1900 can have the rotating disk 602 and an electron beam supplied secondary electrode 902. FIG. 20 illustrates a coating arrangement 2000 according to various embodiments in a schematic side view or cross-sectional view. The

Coating arrangement 2000 can exemplarily include the rotating disk 602 and a

Have glow electrode 902, but can also be set up one of the preceding

Coating arrangements.

In the case of the coating arrangement 2000, a lateral coupling of the electron beam 23 into the vacuum chamber 802 can be provided. For example, the beam guiding channel 406 can be arranged on the upper third of the coating space 206. With the lateral coupling of the electron beam 23, a central guidance of the electron beam 23 in the

Vacuum chamber 802 may not be necessary. This simplifies the upper components of the coating arrangement 2000, e.g. the assemblies for dispersion and / or for dissemination.

When the electron beam 23 is coupled in from the side, it can be guided through the falling area 206a and thereby come into contact with the vertically falling particles 106. When the particles 106 come into contact with the electron beam 23, they can be heated strongly, so that there can be an evaporation of material from the particles 106, as a result of which material is partially volatilized and the system or the particle coating can be contaminated. This can be desirable but can also be compensated for by interrupting the feed gap 202s locally above the beam guiding channel 406 so that a narrow shadowing is provided in the particle curtain 106. This reduces the risk of particle-electron collisions.

21A illustrates a coating arrangement 2100 according to various

Embodiments in a schematic detailed view, e.g. of a uniform distribution stage 400d of this. FIG. 21B illustrates the kinetics of the uniformly distributed feed in a schematic diagram 2100b.

The uniform distribution stage 400d can have a particle support 1602 which has a membrane 202m, for example. The particle support 1602 can delimit the feed gap 202s or the feed gap 202s can surround the particle support 1602. The

Feed gap 202s can be formed, for example, between the particle support 1602 and a wall element 2104 surrounding the particle support 1602. The wall element 2104 can be part of the chamber housing 802k, for example.

For example, the particle support 1602 can have a circular outer edge which delimits the feed gap 202s, i.e. can be rotationally symmetrical. The outer edge of the

Particle pad 1602 may also have a different symmetry. The particle support 1602 can be set up to couple a force (also referred to as an output force) into the particles 106 resting thereon, which force is directed towards the feed gap 202s.

The output force can have the same symmetry as the outer edge of the particle support 1602. The output force can, for example, be set up essentially radially symmetrically, wherein the center of symmetry can be arranged in the interior (e.g. in the center of the circular outer edge) of the particle support 1602.

The less the symmetry of the output force and the outer edge of the particle support 1602 deviate from one another, the more evenly distributed the supply of the particles through the supply gap 202s can be.

The output force can be or be provided in various ways, as will be described by way of example below.

To provide the downforce, the particle support 1602 can, for example, have a convex (e.g. conical or at least tapering) upper surface, i.e. sloping towards the edge. A concave or surface can also be used. For example, with certain wave-like oscillations of a membrane or disk, particles can also move uphill. This can bring dosage benefits. In operation, the particle support 1602 can form an angle (also referred to as an angle of inclination) with the horizontal 153, 151. This can provide the particles 106 with a downhill force, which can be part of the downhill force.

To provide the output force, the particle support 1602 can, for example, be set in a rotary movement so that the particles revolve around the center of symmetry. This can couple a centrifugal force to the particles 106, which can be part of the output force. Optionally, the uniform distribution stage 400d can have a vibration source 202v which is set up to vibrate the particle support 1602 (e.g. the membrane 202m)

to be coupled, so that a loosening device 202v, 1602 is provided. This can stimulate the movement of the particles according to the output force and / or, for example, enable a flatter surface.

For example, particles can be fed to the uniform distribution stage 400d from at least one (i.e. one or more than one) isolation stage 104a, 104b, e.g. along the

Guide path 111. By means of the at least one isolation stage 104a, 104b

for example, electrical and / or mechanical separation of the particles takes place before these are fed to the uniform distribution stage 400d. The falling stream of particles 106 from the at least one isolation stage 104a, 104b can, for example, fall onto a plane 202m capable of inclining and vibrating in the form of a vibrating membrane 202m.

As an alternative or in addition, the particles 106 emitted by the uniform distribution stage 400d can be fed to the coating space 206, for example by falling into the coating space 206 over the outer edge of the particle support 1602.

The particle support 1602 can optionally have a clamping frame 2106 (e.g. a rigid frame) in which the membrane 202m is enclosed (also referred to as an edge restraint). The tenter frame 2106 may have the outer edge. The edge of the membrane 202m, which is coupled to the tensioning frame 2106, can be configured, for example, corrugated and / or profiled (e.g. provided as a bead), as clearly shown in the case of a loudspeaker. Alternatively or in addition, the edge of the membrane 202m can for example comprise an elastic material, for example an elastomer. The edge restraint of the membrane 202m (i.e. that the edge of the membrane 202m is not open) can provide defined boundary conditions so that the

Differential equations of the coupled vibration (e.g. the Bessel function) provide a technical solution.

The vibration source 202v can be set up, for example, to vary the coupled vibration over time, i.e. provide the particle support 1602 with multiple vibration modes. The vibration source 202v can be set up, for example, to generate different frequencies (also referred to as vibration frequencies). As an alternative or in addition, the vibration source 202v can be set up to couple the vibration at different points 202e (also referred to as coupling points) of the particle support 1602.

Due to the angle of inclination of the particle support, a continuous, radially symmetrical particle flow to the outer edge of the particle support 1602 (e.g. a disk 1602) can be provided. For example, the membrane 202m of the particle support 1602 can be higher in the center than at the edge. Optionally, the particle support 1602 can have a multiplicity of depressions and / or grooves which are systematically or stochastically distributed over their entire surface. In addition to a directed particle flow over the edge of the particle support 1602, this also provides many smaller, locally concentrated particle flows, which increase the particle throughput and thus improve the economy.

According to various embodiments, the spatial filling of the particles 106 falling over the outer edge of the particle support 1602 can be controlled and / or regulated, for example by the amount of particles supplied (eg their number and / or mass) is changed per time. Alternatively or additionally, the space filling of the particles 106 can be controlled and / or regulated by changing the distance between the particle support 1602 or the feed gap 202s from the coating material source 208. This can be done for example by means of

Control device take place. The volume of the particles 106 clearly describes the amount of particles per unit volume.

For this purpose, the particle support 1602 can, for example, be mounted displaceably (e.g. along the vertical and / or horizontal) and / or inclined so that, for example, its relative position and / or orientation relative to the coating material source 208 can be changed, e.g. their distance from one another. This can be done for example by means of

Control device take place.

The diagram 2100b shows a normalized spatial filling 2101 of the particles 106 along the free fall path 211 above the position 2103 on the free fall path for different distances hstart of the particle support 1602 from a reference position. This shows the effect of the linear expansion or the change in the volume of a particle flow caused by the length of the fall.

22 illustrates a coating arrangement 2200 according to various

Embodiments in a schematic detailed view, e.g. of a coating room 400e of this.

Optionally, the particle support 1602 can have a multiplicity of through openings 2204 which, for example, are systematically or stochastically distributed over their entire area. The through opening 2204 of the particle support 1602 can, for example, by means of

Protective plates 2206 are protected from vapor deposition and sealing. The

Through openings 2204 can be provided, for example, in the form of an annular gap and / or concentric to one another.

The particle support 1602 (e.g. its frame) can optionally be enclosed in a water-cooled housing. The lower part of the case can optionally be replaced with a replaceable

Heat shield 2206, which can additionally function as a sacrificial shield, so that the particle support 1602 (e.g. its dissemination membrane 202m) is shielded from the directed coating steam. In addition to the water-cooled housing (also referred to as the membrane housing), the sacrificial shield 2206 can also be optional

water-cooled and / or optionally vibration-decoupled to the particle support 1602 (eg its membrane). Decoupling and cooling protect the particle support 1602 (eg its membrane 202m) from the material vapor and the temperature resulting therefrom. If the particles 106 get over the outer edge of the particle support 1602, gravity takes hold of them and the particles 106 fall through the material vapor below, the material vapor being the

Comprises or is formed from coating material (also referred to as coating material vapor, e.g. a metal vapor). The thickness of the particle coating (also called

Coating thickness) can be influenced by means of at least two parameters. The first parameter is the rate at which the coating material is evaporated (also referred to as the evaporation rate), or a corresponding vapor density. The second parameter is the distance of the particle support 1602 (e.g. its dissemination membrane 202m) from the coating material source 208 (e.g. evaporation source), which corresponds to the flight or residence time of the particles 106 in the material vapor. The optional

The beam guide channel 406 (e.g. a central electron beam tube) to which the particle support 1602 is attached or at least arranged (e.g. its dissemination membrane) can for example be set up so as to be adjustable in height, e.g. by means of a telescopic connection. The evaporation rate can be controlled and / or regulated by means of the power introduced into the coating material source 208 (e.g. the electron beam 23).

Optionally, the particle support 1602 can have a multiplicity of segments, of which segments directly adjacent to one another are separated from one another by means of a feed gap 202s. The segments can be arranged concentrically, for example, and / or offset in height relative to one another. The segments can, for example, provide two or more particle streams radially symmetrically into the fall region 206a.

To compensate for the effect that the material vapor has a variable vapor density in the vertical course depending on the distance from the coating material source 208

Coating space 206 has, and thus different

Interaction probabilities between the particle flow and the material vapor result, the particles can flow through the at different speeds

Material vapor are guided. The segments (also as

Functionalization areas referred to) may be arranged offset in height, such as, for example, over several feed gaps 202s arranged in a stepped manner. It also becomes a free-falling

Particle stream pulled apart over the length of its fall or the distance from particle 106 to the next particle increases. In order to prevent a first particle stream from shading a second particle stream located behind it from the material vapor, the first particle stream can be supplied from a higher position from free fall into the fall region 206a than the second particle streams. The second particle stream can in turn be supplied from a higher position than an optional additional third particle stream, etc. The material vapor (coating material vapor) can thus flow through the front and less dense first particle and is also able to functionalize one or more than one second particle flow located behind it.

Optionally, each particle stream can be exposed to a plasma (e.g. prior to coating) so that additional pretreatment and / or better dispersion can be provided.

FIG. 23 illustrates a coating arrangement 2300 and FIG. 24 illustrates a coating arrangement 2400 in each case according to various embodiments in a schematic detailed view, which several cascade-like interconnected

Coating stages 400e, of which each coating stage 400e has one

Coating space 206 and a coating material source 208 supplying this with material vapor. The coating stages 400e can be mutually by means of a

Particle feed 202, which for example has the feed gap 202s, and / or a uniform distribution device.

The or each coating room 206 can clearly be set up for a coating process (or for the formation of precisely one particle coating). In the event that a

Layer system with several layers is to be applied to the particles 106, several coating stages 400e can also be arranged sequentially. Optionally, after the second coating stage, no additional separation stage may be necessary.

25 illustrates a method 2500 (e.g. for singulating 2500 a multiplicity of particles) according to various embodiments in a schematic flow diagram.

The method 2500 can comprise, in 101, introducing electrons into the plurality of particles, a charge caused thereby separating the particles from one another; and in 103, accelerating the plurality of particles toward an impact surface, an impact thereby caused separating the particles from one another. The introduction of 101 electrons and that

Acceleration 103 can take place in a vacuum, i.e. the particles are arranged in the vacuum during the introduction 101 of electrons and during acceleration 103. After impact, the particles can move away from the impact surface (i.e. it is not necessarily coated with the particles).

The method 2500 can optionally comprise, in 2600, one-time or more than one-time coating of the plurality of particles after the introduction 101 of electrons and the acceleration 103. 26 illustrates a method 2600 (for example for coating 2600 the plurality of particles) according to various embodiments in a schematic flow diagram.

The method 2600 can optionally include, in 2600, singling out a plurality of particles once or more than once 2500, for example by means of the introduction 101 of electrons and the acceleration 103 of the particles against the impact surface.

The method 2600 may include, in 107, introducing a plurality of particles into a vacuum, and in 109, evaporating a coating material into the vacuum such that the plurality of particles are coated with the coating material.

In the vacuum, the multitude of particles can move past the vapor expansion area, accelerated by a gravitational force. The particles can be introduced into the vacuum, for example, through the feed gap 202s, which extends, for example, along a path that is closed in itself, so that the multiplicity of particles surrounds the vapor expansion area.

Various examples are described below that relate to the preceding

Described and shown in the figures refer to.

Example 1 is a coating arrangement comprising: a particle feed and a collecting container facing the latter, between which a cavity is formed; a

Coating material source for emitting (e.g., vaporising and / or atomizing) a coating material into the cavity; the particle feeder having a (e.g.

has annular) feed gap; wherein the cavity extends from the feed gap to the collecting container and partially surrounds the source of coating material, for example the feed gap (e.g. in the form of an annular gap) extending along a self-contained path; wherein the cavity has, for example, a first area and / or a second area, wherein the first area extends from the feed gap to the collecting container and surrounds the second area, and wherein, for example, the second area (e.g. an underside thereof) to the coating material source adjoins (which is arranged, for example, at a distance from the first area and / or below the second area). The emission can take place, for example, by means of PVD.

Example 2 is the coating arrangement according to Example 1, with the coating material source extending through the receptacle.

Example 3 is the coating arrangement according to Example 1 or 2, where the

Coating material source has an evaporation crucible, which of the Collecting container is surrounded; and / or wherein the particle feed is arranged above the cavity and the cavity is arranged above the collecting container.

Example 4 is the coating arrangement according to Example 3, wherein the coating material source has a coating material tracking mechanism which is derived from the

Evaporation crucible is extended through the collecting container.

Example 5 is the coating arrangement according to one of Examples 1 to 4, the collecting container having an exit opening and / or depression on the bottom.

Example 6 is the coating arrangement according to Example 5, further comprising: a

Screw conveyor, which is arranged within the bottom exit opening (which is for example channel-shaped) of the collecting container.

Example 7 is the coating arrangement according to Example 6, further comprising: a first drive (e.g. a vibration source) which is set up, the collecting container

mechanically stimulated.

Example 8 is the coating arrangement according to Example 7, further comprising: the first drive being set up to mechanically excite the collecting container by means of a vibration coupled into it.

Example 9 is the coating arrangement according to one of Examples 1 to 8, wherein the particle feed is a (e.g. rotatable or fixedly mounted) particle support which the

Feed gap limited (eg inside and / or surrounded by this), and has a second drive, the second drive being set up to mechanically excite and / or rotate the particle support, so that, for example, particles falling onto the particle support in the direction of an edge of the Particle support are driven.

Example 10 is the coating arrangement according to Example 9, wherein the particle support is convex (e.g. everted in the direction away from the cavity) and / or wherein the second drive is set up to mechanically excite the particle support by means of an oscillation coupled into it; and / or wherein the drive is set up to rotate the particle support.

Example 11 is the coating arrangement according to any one of Examples 1 to 10, wherein the path is circular and / or wherein the path surrounds the particle support; and / or where the

Particle feed is set up to convert a flow of particles of the first particle density into a flow of particles of the second particle density (particles per volume) and to feed the flow of particles of the second particle density to the feed gap, the first particle density and the second particle density differ from one another, wherein, for example, the second particle density is smaller than the first particle density (so that the transfer of the flow of particles is a loosening of the flow of particles), wherein, for example, the flow of particles of the first particle density has a larger mean particle distance ( e.g. mean particle-to-particle distance) than the flow of particles of second particle density.

Example 12 is the coating arrangement according to any one of Examples 1 to 11, FIGS

Coating arrangement further comprising an electron beam gun which is set up to direct an electron beam onto the coating material source; and / or wherein the coating material source has a resistive heating device (e.g. an electro-thermal converter), which is set up, for example, to supply thermal energy to the coating material source; and / or wherein the coating material source is part of a CVD coating device.

Example 13 is the coating arrangement according to one of Examples 1 to 12, further comprising: a channel through which the electron beam is directed at the

Directing the source of coating material with the feed gap extending around the channel; and / or wherein the channel through the particle feed and / or the

Particle singulation device is extended therethrough.

Example 14 is the coating arrangement according to one of Examples 1 to 13, the particle feed having an additional feed gap which is surrounded by the feed gap and / or follows the feed gap in its course and / or is concentric with it; and / or wherein the particle feed, the cavity and the collecting container are designed to be essentially vertically rotationally symmetrical.

Example 15 is the coating arrangement according to one of Examples 1 to 14, further comprising: a vacuum chamber in which the cavity is arranged, wherein the

Vacuum chamber is coupled to the particle separation device, for example by vacuum technology, e.g. by means of the outlet opening.

Example 16 is the coating arrangement according to one of Examples 1 to 15, furthermore having a particle separation device, for example the particle feeder coupling the particle separation device (eg its outlet opening) to the cavity; the particle singulation device comprising: an entrance opening and an exit opening, the exit opening facing towards the cavity; at least one (ie one or more than one) separation stage which is set up to separate particles guided from the inlet opening to the outlet opening, wherein for example from the at least one separation stage: an optional first separation stage is set up, electrons into the Introducing particles, so that an electrical charge caused thereby separates the particles from one another; and / or an optional second isolation stage has a baffle wall and is set up to accelerate the particles in the direction of a baffle wall, so that an impact of the particles on the baffle wall caused thereby separates them from one another.

Example 17 is the coating arrangement according to Example 16, the first being

Isolation stage has an electron source for providing the electrons, the electron source for example having a hot cathode for providing free electrons (e.g. by means of thermal emission), the electron source for example a

Gas discharge device (e.g. a plasma source) for providing a

Gas discharge (e.g. of a plasma) that contains the electrons, the electron source for example having a contact electrode (which introduces the electrons on contact with the particles).

Example 18 is the coating arrangement according to Example 16 or 17, furthermore one

Having electron beam gun and wherein the electron source has a secondary electron emission cathode, the electron beam gun is set up to electrically supply the secondary electron emission cathode by means of an electron beam (so that secondary electrons are emitted, for example).

Example 19 is the coating arrangement according to any one of Examples 16 to 18, wherein the secondary electron emission cathode has a through opening and an (e.g., conical) emission surface surrounding the through opening; and where the

The electron beam gun is set up to alternately target the electron beam

Through opening and to be directed at the emission surface.

Example 20 is the coating arrangement according to one of Examples 16 to 19, the second separation stage having a rotatably mounted support surface by means of which the acceleration takes place, the support surface (e.g. completely) being surrounded by the impact surface.

Example 21 is the coating arrangement according to one of Examples 16 to 20, the particle coating having a rotationally symmetrical surface.

Example 22 is the coating arrangement according to one of Examples 16 to 21, the second isolation stage being set up to provide an electric field by means of the (eg positively charged) impact surface to accelerate the particles by means of the electrical field towards the impact surface. Example 23 is the coating arrangement according to one of Examples 16 to 22, the first separation stage having, for example, an electron source in the form of an electrode, with a (e.g. annular) gap being provided between the electron source and the impact surface through which the particles are guided.

Example 24 is the coating arrangement according to any one of Examples 16-23, further comprising: a (e.g. vacuum-tight or open) container having the inlet opening.

Example 25 is the coating arrangement according to one of Examples 16 to 24, further comprising: a screw conveyor which is arranged within the inlet opening (which is for example channel-shaped).

Example 26 is the coating arrangement according to one of Examples 16 to 25, further comprising: a vacuum chamber in which the at least one isolation stage is arranged.

Example 27 is the coating arrangement according to any one of Examples 16 to 26, wherein the inlet opening is arranged (e.g. vertically) above the outlet opening so that a gravitational force acting on the particles moves the particles from the inlet opening to the

Exit opening.

Example 28 is the coating arrangement according to one of Examples 16 to 27, further comprising: a guide device for feeding the particles to the first

Isolation stage and / or the second isolation stage, the guide device having at least one funnel-shaped surface and / or a vibration source.

Example 29 is the coating arrangement according to one of Examples 16 to 28, the first separation stage and / or the second separation stage having a loosening device, the loosening device having a (e.g. rotatably mounted) particle support and a drive, the drive being set up, the particle support mechanically stimulated, so that, for example, particles falling on the loosening device in

Are driven towards an edge of the particle support, the particle support for example having the electron source or is formed therefrom.

Example 30 is the coating arrangement according to one of Examples 16 to 29, wherein the particle support is curved (eg convex or concave) and / or the drive is set up to mechanically excite the particle support (eg by means of one of these coupled in mechanical vibration); and / or wherein the drive is set up to rotate the particle support.

Example 31 is a coating arrangement (e.g. the coating arrangement according to any one of Examples 1 to 30), comprising: a particle feeder and a collecting container facing this, between which a cavity is formed; a coating material source for emitting a coating material into the cavity (206); where the

Particle feed has a feed gap; the cavity of the

Feed gap extends to the collection container and partially surrounds the source of coating material; a channel through which the electron beam hits the

Coating material source is directed, wherein the feed gap extends around the channel.

Example 32 is a coating arrangement (e.g. the coating arrangement according to any one of Examples 1 to 31), comprising: a particle feeder and a collecting container facing this, between which a cavity is formed; a coating material source for emitting a coating material into the cavity; where the

Particle feed has a feed gap; the cavity of the

Feed gap extends to the collection container and partially surrounds the source of coating material; wherein the particle feed has an additional feed gap which is surrounded by the feed gap and / or is concentric to it.

Example 33 is a method (eg for operating the coating arrangement according to one of Examples 1 to 32), comprising: introducing a multiplicity of particles into a vacuum (eg the cavity in which the vacuum is formed) in which the multiplicity of particles of a gravitational force accelerates past a vapor expansion area, the particles being introduced through a gap (which, for example, extends along a self-contained path) so that the plurality of particles surrounds the vapor expansion area; and vaporizing a coating material (e.g., by means of the coating material source) into the vapor spreading area such that the plurality of particles are coated with the coating material.

Example 34 is the method according to claim 33, further comprising: singulating the plurality of particles before introducing them into the vacuum.

Example 35 is the method according to claim 34, the singulation comprising: introduction of electrons into the plurality of particles, a charge caused thereby separating the particles from one another; and / or accelerating the multitude of particles towards a baffle plate, an impact caused thereby separating the particles from one another; the introduction of electrons and / or the acceleration taking place, for example, in a vacuum.

Claims

1. Coating arrangement (200), comprising:

• a particle feed (202) and a collecting container (204) facing this, between which a cavity (206) is formed;

A coating material source (208) for emitting a

Coating material into the cavity (206);

• wherein the particle feed (202) has a feed gap (202s) in the form of an annular gap;

• wherein the cavity (206) from the feed gap (202s) to the

Collection container (204) is extended and the coating material source (208) partially surrounds.

2. The coating arrangement (200) according to claim 1, wherein the coating material source (208) extends through the collecting container (204).

3. Coating arrangement (200) according to claim 1 or 2, wherein the collecting container (204) has an exit opening on the bottom.

4. Coating arrangement (200) according to one of claims 1 to 3, further comprising: a first drive (1704) which is set up to mechanically excite the collecting container (204).

5. Coating arrangement (200) according to one of claims 1 to 4,

wherein the particle feed (202) above the cavity (206) and the cavity above the collecting container (204) are arranged such that the feed gap (202s) projects down onto the collecting container (204), partially or completely from the collecting container (204) is overlapped.

6. Coating arrangement (200) according to one of claims 1 to 5,

wherein the particle supply (202) comprises a particle support (602) which the

Feed gap (202s), and has a second drive (202v) which is set up to mechanically excite and / or rotate the particle support (1602).

7. Coating arrangement (200) according to claims 1 to 6,

wherein the particle feed (202), the cavity (206) and the collecting container (204) are designed to be essentially vertically rotationally symmetrical.

8. Coating arrangement (200) according to claim 6 or 7, wherein the particle support (1602) is curved.

9. coating arrangement (200) according to any one of claims 1 to 8, wherein the

Feed gap is closed all around and / or circular.

10. Coating arrangement (200) according to one of claims 1 to 9,

the coating arrangement further comprising an electron beam gun (404) which is configured to direct an electron beam (23) onto the coating material source (208); or

wherein the source of coating material comprises a resistive heater; or wherein the coating material source is part of a CVD coating device.

11. Coating arrangement (200) according to claim 10, further comprising:

• a channel (406) through which the electron beam (23) hits the

Coating material source (208) is directed,

• wherein the feed gap (202s) extends around the channel (406).

12. Coating arrangement (200) according to one of claims 1 to 11, wherein the

Particle feed (202) has an additional feed gap (202s) which is surrounded by the feed gap (202s) and / or is concentric to it.

13. Coating arrangement (200) according to one of claims 1 to 12, further comprising: a vacuum chamber (802) in which the cavity (206) is arranged.

14. Coating arrangement (200) according to one of claims 1 to 13, further a

Having particle separation device (100), the particle separation device (100) having:

• an inlet opening (102e) and an outlet opening (102a), wherein the

Exit opening (102a) is directed towards the cavity (206);

• at least one isolation stage (104) which is set up by the

Inlet opening (102e) to separate particles guided to the outlet opening (102a).

15. Method (2500, 2600), comprising:

• Introducing (107) a large number of particles (106) into a vacuum, in which the large number of particles (106) accelerated by a gravitational force (105) move past a vapor expansion region (206b), the introduction the particle (106) passes through a gap (202s) so that the plurality of particles (106) surrounds the vapor propagation region (206b); and • vaporizing (109) a coating material into the vapor spreading area (206b), so that the plurality of particles (106) with the

Coating material is coated.