WO2020258639A1 - System and method for testing discharge of electric spark at nanoscale gap - Google Patents

System and method for testing discharge of electric spark at nanoscale gap Download PDF

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Publication number
WO2020258639A1
WO2020258639A1 PCT/CN2019/115731 CN2019115731W WO2020258639A1 WO 2020258639 A1 WO2020258639 A1 WO 2020258639A1 CN 2019115731 W CN2019115731 W CN 2019115731W WO 2020258639 A1 WO2020258639 A1 WO 2020258639A1
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silicon wafer
gap
discharge
insulating film
micro
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PCT/CN2019/115731
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French (fr)
Chinese (zh)
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佟浩
权冉
孔全存
李勇
李俊杰
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清华大学
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/12Testing dielectric strength or breakdown voltage ; Testing or monitoring effectiveness or level of insulation, e.g. of a cable or of an apparatus, for example using partial discharge measurements; Electrostatic testing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/40Testing power supplies

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  • the invention relates to the technical field of micro-special processing, in particular to a nano-level gap electric spark discharge test system and method.
  • micro-EDM technology can realize high-precision machining of micro-holes, micro-grooves, and micro-three-dimensional structures on conductive materials such as metal alloys. It has the advantage of not being restricted by the mechanical properties of the strength, stiffness and hardness of the workpiece material. Precision processing and manufacturing play an important role.
  • micro-EDM With the in-depth research on the removal of micro-EDM at the nanometer scale, it is necessary to realize the research of micro-EDM with nano-level gaps, which urgently needs to solve the performance test and optimization of the more micro-energy pulse discharge power supply under the given nano-level gap. problem.
  • the smaller energy pulse power supply can obtain the required smaller energy by reducing the pulse width of a single discharge to the order of nanoseconds.
  • the present invention aims to solve one of the technical problems in the related art at least to a certain extent.
  • an object of the present invention is to provide a nano-level gap electric spark discharge test system, which has simple and convenient operation process, low cost, high reliability, and easy realization of automatic control and test processes.
  • Another object of the present invention is to provide a nanometer gap spark discharge test method.
  • one aspect of the present invention proposes a nano-gap electric spark discharge test system, which includes: a micro tool electrode, used as a tool electrode for micro spark discharge; a silicon wafer, used as a workpiece electrode for micro spark discharge Spark discharge, an insulating film prepared with a predetermined thickness on the conductive film of the silicon wafer is used as a breakdown medium to provide a target nano-scale discharge gap; a one-dimensional mobile platform is used to fix and move the silicon wafer to make The insulating film on the silicon wafer is in contact with the electrode of the micro tool and causes the suspended conductive wire to twist at a target angle; a torque suspension system is used to generate torque by using the twist of the conductive wire at the target angle to make the micro tool
  • the electrode is in micro-force contact with the insulating film on the silicon wafer, and does not pierce the insulating film, so as to obtain the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap.
  • the nano-level gap electric spark discharge test system of the embodiment of the present invention precisely controls the nano-level discharge gap by accurately and controllably preparing an insulating film with a nano-level thickness, and can realize the precise and repeated discharge test of the same nano-level discharge gap; The size is ensured by adjusting the thickness of the prepared insulating film.
  • the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; through the torque suspension system, the micro-tool electrode and the insulating film are in micro-force contact, thereby Ensure the precise size of the nano-level gap, such a physical contact method is not easily affected by external factors such as vibration, and improves the repeatability and reliability of nano-level gap control; the operation process is simple and convenient, low cost, high reliability, and easy to implement Automated regulation and testing process.
  • nano-gap electric spark discharge test system may also have the following additional technical features:
  • it further includes: a dual-channel digital oscilloscope for displaying the discharge waveform in the performance test.
  • the conductive film may be a gold-plated film
  • the insulating film may be an aluminum oxide film
  • another embodiment of the present invention proposes a nanoscale gap electric spark discharge test method, which adopts the test system described in the above embodiment, wherein the method includes: preparing the micro tool electrode and the electrode The conductive film and insulating film of the silicon wafer; use dilute acid to remove half of the insulating film; build the torque suspension system, and fix the silicon wafer on the one-dimensional mobile platform; conduct the test system Circuit, and move the silicon chip to twist the conductive wire; obtain the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap.
  • the nano-level gap electric spark discharge test method of the embodiment of the present invention precisely controls the nano-level discharge gap by precisely and controllably preparing an insulating film with a nano-level thickness, and can realize the precise and repeated discharge test of the same nano-level discharge gap; The size is ensured by adjusting the thickness of the prepared insulating film.
  • the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; through the torque suspension system, the micro-tool electrode and the insulating film are in micro-force contact, thereby Ensure the precise size of the nano-level gap, such a physical contact method is not easily affected by external factors such as vibration, and improves the repeatability and reliability of nano-level gap control; the operation process is simple and convenient, low cost, high reliability, and easy to implement Automated regulation and testing process.
  • nano-gap electric spark discharge test method may also have the following additional technical features:
  • the method further includes: turning on the power of the dual-channel digital oscilloscope to observe the discharge waveform through the dual-channel digital oscilloscope.
  • FIG. 1 is a schematic diagram of the structure of a nano-scale gap electric spark discharge test system according to an embodiment of the present invention
  • FIG. 2 is a physical schematic diagram of a nano-scale gap electric spark discharge test system according to an embodiment of the present invention
  • FIG. 3 is a schematic diagram and a physical diagram of a thin film on a silicon wafer according to an embodiment of the present invention
  • FIG. 4 is a flowchart of a nano-gap electric spark discharge test method according to an embodiment of the present invention.
  • Fig. 5 is a flowchart of a nano-gap electric spark discharge test method according to an embodiment of the present invention.
  • Fig. 6 is a waveform diagram of a nano-gap electric spark discharge test according to an embodiment of the present invention.
  • Fig. 1 is a schematic structural diagram of a nano-gap electric spark discharge test system according to an embodiment of the present invention.
  • the nanometer gap electric spark discharge test system 10 includes: a micro tool electrode 100, a silicon wafer 200, a one-dimensional mobile platform 300 and a torque suspension system 400.
  • the fine tool electrode 100 is used as a tool electrode for fine spark discharge.
  • the silicon wafer 200 is used as a workpiece electrode for fine spark discharge, and an insulating film prepared with a predetermined thickness on the conductive film of the silicon wafer 200 is used as a breakdown medium to provide a target nanometer-scale discharge gap.
  • the one-dimensional mobile platform 300 is used to fix and move the silicon wafer 200 to make the insulating film on the silicon wafer 200 contact the micro tool electrode 100 and cause the suspended conductive wire to twist at a target angle.
  • the torque suspension system 400 is used to generate torque by using the torsion of the conductive wire at the target angle, so that the micro tool electrode 100 and the silicon wafer 200 insulating film are in micro force contact without piercing the insulating film, so as to obtain a smaller energy under the target nanometer gap Pulse discharge power supply performance test results.
  • the operation process of the system 10 of the embodiment of the present invention is simple and convenient, low in cost, high in reliability, and easy to realize automatic control and testing processes.
  • the conductive wire may be a slender conductive wire, for example, a slender steel wire, wherein the diameter of the conductive wire should be small enough to ensure that the torque generated when it has a small twist angle is small enough.
  • the conductive film may be a gold-plated film
  • the insulating film may be an aluminum oxide film.
  • both the conductive film and the insulating film may also be films of other materials. The specific material needs to be selected, which is only used as an example here, without specific restrictions.
  • a preparation process of conductive film and insulating film is: depositing a conductive film (a gold film as an example) on a silicon wafer with a smooth surface by physical vapor deposition or chemical vapor deposition; Atomic layer deposition method deposits an insulating film with a given nanometer thickness (taking aluminum oxide film as an example); immersing the silicon wafer vertically in a dilute acid solution (taking dilute sulfuric acid as an example) to wash away a part of the insulating film ; Finally, use deionized water to clean the remaining silicon wafer and dry it.
  • the system 10 of the embodiment of the present invention further includes: a dual-channel digital oscilloscope.
  • a dual-channel digital oscilloscope is used to display the discharge waveform in the performance test.
  • the nanometer gap spark discharge test system 10 is mainly composed of a micro tool electrode 100, a silicon wafer 200 covered with a conductive film (a gold film as an example) and an insulating film (alumina film as an example), a one-dimensional It consists of a mobile platform 300, a torque suspension system 400, and a dual-channel digital oscilloscope.
  • the micro tool electrode 100 is used as the tool electrode for micro spark discharge; the conductive film on the silicon wafer 200 is used as the workpiece electrode for micro spark discharge, and the insulating film prepared with a given thickness on the conductive film is used as a breakdown medium, with a given nanometer One-dimensional discharge gap; the one-dimensional mobile platform 300 is used to fix and move the silicon chip, so that the insulating film on the silicon chip is in contact with the micro tool electrode and the elongated conductive wire (take the elongated steel wire as an example) is produced Slightly twisted; the torque suspension system uses the tiny torque generated by the small twisting of the slender conductive wire to ensure that the micro tool electrode is in contact with the insulating film on the silicon chip and does not pierce the film.
  • the main components of the system 10 of the embodiment of the present invention include: (1) Micro tool electrode 100: as a tool electrode for micro spark discharge; (2) Cover thin film silicon wafer 200: It is covered with a conductive film to be used as a workpiece electrode for fine spark discharge.
  • a gold film is used as an example to improve conductivity, and then a nano-thickness insulating film is covered with a given nano-level discharge gap, and an aluminum oxide film is used as an example for breakdown Medium, remove part of the aluminum oxide film to expose the gold film, as shown in Figure 3; (3) One-dimensional mobile platform 300: used to fix and move the silicon wafer; (4) Torque suspension system 400: insulate the silicon wafer The membrane is in contact with the micro tool electrode and hangs it on the slender conductive wire.
  • the slender conductive wire takes a slender steel wire as an example.
  • the slender steel wire is used to provide a small twist angle to generate a small torque to ensure that the tip of the micro tool electrode and silicon
  • the on-chip insulating film is in contact with little force and does not pierce the film;
  • Dual-channel digital oscilloscope used to observe the discharge waveform between the micro tool electrode and the gold film on the silicon wafer.
  • the smooth surface of the silicon wafer with gold or silver film, and then cover the gold or silver film with a certain thickness of insulating film as a breakdown medium, and use acid to wash away a part of the insulating film to expose the gold or silver film connection
  • the negative pole of the pulse power supply; the one-dimensional mobile platform is used to fix and move the silicon wafer; the torque suspension system uses the slender filament to twist at a small angle to adjust the tiny torque to ensure that the micro tool electrode is in contact with the insulating film on the silicon wafer and does not penetrate the film.
  • the nano-thickness insulating film is the discharge breakdown gap. This method is used to simulate the nano-scale discharge gap to test the discharge characteristics of the micro-EDM pulse power supply at a given nano-gap.
  • the nano-level discharge gap can be precisely controlled by accurately and controllably preparing an insulating film of nano-level thickness, which can realize the precise and repeated discharge test of the same nano-level discharge gap;
  • the size of the gap is ensured by adjusting the thickness of the prepared insulating film. Since the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; the micro-tool electrode and the insulating film can be contacted by a torque suspension system.
  • Fig. 4 is a flowchart of a nano-gap spark discharge test method according to an embodiment of the present invention.
  • the nano-scale gap electric spark discharge test method adopts the test system of the above-mentioned embodiment, wherein the method includes the following steps:
  • step S401 the conductive film and insulating film of the micro tool electrode and the silicon wafer are prepared.
  • step S402 a half area of the insulating film is removed with dilute acid.
  • the existing micro-machining method (take the micro electrochemical machining method as an example) is used to prepare a micro tool electrode with a micro-nano-scale tip. First deposit a conductive film (a gold film as an example) on a silicon wafer with a smooth surface, then deposit an insulating film with a given nanometer thickness (aluminum oxide film as an example), and then remove a part of the insulating film to expose the conductive film .
  • a conductive film a gold film as an example
  • an insulating film with a given nanometer thickness as an example
  • step S403 a torque suspension system is built, and the silicon wafer is fixed on a one-dimensional mobile platform.
  • the micro tool electrode is fixed to one end of a slender metal rod (take a tungsten rod as an example), and two slender conductive wires (take a slender steel wire as an example) are used to hang the slender metal rod on the fixed rod.
  • a slender metal rod take a tungsten rod as an example
  • two slender conductive wires take a slender steel wire as an example
  • step S404 the circuit of the test system is turned on, and the silicon chip is moved to twist the conductive wire.
  • the one-dimensional moving platform is adjusted to make the insulating film on the silicon chip contact the micro tool electrode and cause the elongated conductive wire to produce a small twist angle.
  • step S405 the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap is obtained.
  • the method of the embodiment of the present invention further includes: turning on the power of the dual-channel digital oscilloscope to observe the discharge waveform through the dual-channel digital oscilloscope.
  • the nano-level discharge gap can be precisely controlled by accurately and controllably preparing an insulating film of nano-level thickness, which can realize the precise and repeated discharge test of the same nano-level discharge gap;
  • the size of the gap is ensured by adjusting the thickness of the prepared insulating film. Since the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; the micro-tool electrode and the insulating film can be contacted by a torque suspension system.
  • first and second are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with “first” and “second” may explicitly or implicitly include at least one of the features. In the description of the present invention, "a plurality of” means at least two, such as two, three, etc., unless otherwise specifically defined.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

Abstract

A system (10) and method for testing discharge of an electric spark at a nanoscale gap. The system (10) comprises: a micro tool electrode (100) used as a tool electrode for micro electric spark discharge; a silicon wafer (200) used as a workpiece electrode for micro electric spark discharge, wherein a prepared insulation film having a pre-configured thickness and located on a conductive film of the silicon wafer (200) is used as a breakdown medium to provide a target nanoscale discharge gap; a one-dimensionally movable platform (300) used to fix, move, and position the silicon wafer (200) such that the insulation film on the silicon wafer (200) contacts the micro tool electrode (100), and a suspended conductive wire twists by a target angle; and a torque suspension system (400) used to generate torque by using the twisting of the conductive wire by the target angle, such that the micro tool electrode (100) lightly contacts the insulation film on the silicon wafer (200) without piercing the insulation film, thereby acquiring a performance test result of a small energy pulsed discharge power supply at a target nanoscale gap. The system (10) has a simple and easy operating process and low costs, is reliable, and performs automated control and testing easily.

Description

纳米级间隙电火花放电测试系统及方法Nanometer gap electric spark discharge test system and method
相关申请的交叉引用Cross references to related applications
本申请要求清华大学于2019年06月25日提交的、发明名称为“纳米级间隙电火花放电测试系统及方法”的、中国专利申请号“201910557063.X”的优先权。This application claims the priority of the Chinese Patent Application No. “201910557063.X” filed by Tsinghua University on June 25, 2019, with the title of “Nano-Gap Electric Spark Discharge Test System and Method”.
技术领域Technical field
本发明涉及微细特种加工技术领域,特别涉及一种纳米级间隙电火花放电测试系统及方法。The invention relates to the technical field of micro-special processing, in particular to a nano-level gap electric spark discharge test system and method.
背景技术Background technique
微细电火花加工技术可在金属合金等导电材料上实现微孔、微槽、微三维结构的较高精度加工,具有不受工件材料强度、刚度和硬度的机械性能限制优点,在难加工材料微细精密加工制造方面发挥着重要作用。The micro-EDM technology can realize high-precision machining of micro-holes, micro-grooves, and micro-three-dimensional structures on conductive materials such as metal alloys. It has the advantage of not being restricted by the mechanical properties of the strength, stiffness and hardness of the workpiece material. Precision processing and manufacturing play an important role.
随着微细电火花加工在纳米级尺度去除量级研究深入,有待实现纳米级间隙的微细电火花加工研究,这迫切需要解决给定纳米级间隙情况下的更微能量脉冲放电电源性能测试及优化问题。更微能量脉冲电源可通过减小单次放电脉宽至纳秒量级,获得需要的更微能量。然而,重复且准确给定工具电极和工件之间的纳米间隙具有挑战性和技术难度。With the in-depth research on the removal of micro-EDM at the nanometer scale, it is necessary to realize the research of micro-EDM with nano-level gaps, which urgently needs to solve the performance test and optimization of the more micro-energy pulse discharge power supply under the given nano-level gap. problem. The smaller energy pulse power supply can obtain the required smaller energy by reducing the pulse width of a single discharge to the order of nanoseconds. However, it is challenging and technically difficult to repeatedly and accurately specify the nano-gap between the tool electrode and the workpiece.
目前,用于纳秒量级脉宽的微能量脉冲电源性能测试及优化的给定纳米放电间隙研究较少。常用的准确控制纳米间隙方法是利用压电陶瓷驱动的纳米定位平台,这是通过压电效应准确控制进给步长达到纳秒级定位精度来调控距离,但这种压电定位平台不仅整个系统复杂且昂贵、操作控制过程复杂,并且易受机械振动、刚度等自身和外界因素影响,难以实现重复精确给定一致性精度非常高的纳米级间隙。At present, there are few studies on the performance test and optimization of a given nanometer discharge gap for micro-energy pulsed power supplies with nanosecond pulse widths. The commonly used method to accurately control the nano-gap is to use a piezoelectric ceramic-driven nano-positioning platform, which is to accurately control the feed step by the piezoelectric effect to achieve nanosecond positioning accuracy to adjust the distance, but this piezoelectric positioning platform is not only the entire system It is complex and expensive, the operation and control process is complicated, and it is easily affected by mechanical vibration, rigidity and other internal and external factors. It is difficult to achieve repeatability and precise setting of nano-level gaps with very high consistency.
为实现给定纳米级间隙情况下更微能量脉冲放电电源性能测试,目前尚缺少一种简便、准确度高、可靠的给定纳米级放电间隙的系统及方法。In order to realize the performance test of a pulsed discharge power supply with lower energy under the condition of a given nanometer gap, there is still a lack of a simple, highly accurate and reliable system and method for a given nanometer discharge gap.
发明内容Summary of the invention
本发明旨在至少在一定程度上解决相关技术中的技术问题之一。The present invention aims to solve one of the technical problems in the related art at least to a certain extent.
为此,本发明的一个目的在于提出一种纳米级间隙电火花放电测试系统,该系统操作过程简单方便、成本低、可靠性高,易于实现自动化调控和测试过程。For this reason, an object of the present invention is to provide a nano-level gap electric spark discharge test system, which has simple and convenient operation process, low cost, high reliability, and easy realization of automatic control and test processes.
本发明的另一个目的在于提出一种纳米级间隙电火花放电测试方法。Another object of the present invention is to provide a nanometer gap spark discharge test method.
为达到上述目的,本发明一方面实施例提出了一种纳米级间隙电火花放电测试系统,包括:微细工具电极,作为工具电极用于微细电火花放电;硅片,作为工件电极用于微细 电火花放电,所述硅片的导电膜上预设厚度制备的绝缘膜用作击穿介质,以给目标纳米级放电间隙;一维移动平台,用于固定并移动定位所述硅片,以使所述硅片上的绝缘膜与所述微细工具电极接触并使悬挂的导电丝产生目标角度扭转;扭矩悬挂系统,用于利用所述导电丝的目标角度的扭转生成扭矩,使所述微细工具电极与所述硅片上的绝缘薄膜微力接触,且不刺穿所述绝缘薄膜,以得到在所述目标纳米级间隙情况下更微能量脉冲放电电源性能测试结果。In order to achieve the above objective, one aspect of the present invention proposes a nano-gap electric spark discharge test system, which includes: a micro tool electrode, used as a tool electrode for micro spark discharge; a silicon wafer, used as a workpiece electrode for micro spark discharge Spark discharge, an insulating film prepared with a predetermined thickness on the conductive film of the silicon wafer is used as a breakdown medium to provide a target nano-scale discharge gap; a one-dimensional mobile platform is used to fix and move the silicon wafer to make The insulating film on the silicon wafer is in contact with the electrode of the micro tool and causes the suspended conductive wire to twist at a target angle; a torque suspension system is used to generate torque by using the twist of the conductive wire at the target angle to make the micro tool The electrode is in micro-force contact with the insulating film on the silicon wafer, and does not pierce the insulating film, so as to obtain the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap.
本发明实施例的纳米级间隙电火花放电测试系统,通过精确可控地制备纳米级厚度的绝缘膜来精确调控纳米级放电间隙,可实现相同纳米级放电间隙的精确重复放电测试;纳米级间隙大小通过调整制备的绝缘膜厚度来保证,由于绝缘膜厚度可以精确调控甚至1nm量级,这样可以方便地实现精确调控纳米级间隙大小;通过扭矩悬挂系统实现微细工具电极与绝缘薄膜微力接触,从而保证纳米级间隙的准确大小,这样的物理接触方式不易受振动等外在因素影响,提高了纳米级间隙调控的重复性精度和可靠性;操作过程简单方便、成本低、可靠性高,易于实现自动化调控和测试过程。The nano-level gap electric spark discharge test system of the embodiment of the present invention precisely controls the nano-level discharge gap by accurately and controllably preparing an insulating film with a nano-level thickness, and can realize the precise and repeated discharge test of the same nano-level discharge gap; The size is ensured by adjusting the thickness of the prepared insulating film. Since the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; through the torque suspension system, the micro-tool electrode and the insulating film are in micro-force contact, thereby Ensure the precise size of the nano-level gap, such a physical contact method is not easily affected by external factors such as vibration, and improves the repeatability and reliability of nano-level gap control; the operation process is simple and convenient, low cost, high reliability, and easy to implement Automated regulation and testing process.
另外,根据本发明上述实施例的纳米级间隙电火花放电测试系统还可以具有以下附加的技术特征:In addition, the nano-gap electric spark discharge test system according to the foregoing embodiment of the present invention may also have the following additional technical features:
进一步地,在本发明的一个实施例中,还包括:双通道数字示波器,用于显示性能测试中放电波形。Further, in an embodiment of the present invention, it further includes: a dual-channel digital oscilloscope for displaying the discharge waveform in the performance test.
进一步地,在本发明的一个实施例中,其中,所述导电膜可以为镀金膜,所述绝缘膜可以为氧化铝膜。Further, in an embodiment of the present invention, the conductive film may be a gold-plated film, and the insulating film may be an aluminum oxide film.
为达到上述目的,本发明另一方面实施例提出了一种纳米级间隙电火花放电测试方法,采用上述实施例所述的测试系统,其中,所述方法包括:制备所述微细工具电极与所述硅片的导电膜和绝缘膜;利用稀酸去除一半面积的绝缘膜;搭建所述扭矩悬挂系统,并且将所述硅片固定在所述一维移动平台上;导通所述测试系统的电路,并移动所述硅片使所述导电丝扭转;获取在所述目标纳米级间隙情况下更微能量脉冲放电电源性能测试结果。In order to achieve the above objective, another embodiment of the present invention proposes a nanoscale gap electric spark discharge test method, which adopts the test system described in the above embodiment, wherein the method includes: preparing the micro tool electrode and the electrode The conductive film and insulating film of the silicon wafer; use dilute acid to remove half of the insulating film; build the torque suspension system, and fix the silicon wafer on the one-dimensional mobile platform; conduct the test system Circuit, and move the silicon chip to twist the conductive wire; obtain the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap.
本发明实施例的纳米级间隙电火花放电测试方法,通过精确可控地制备纳米级厚度的绝缘膜来精确调控纳米级放电间隙,可实现相同纳米级放电间隙的精确重复放电测试;纳米级间隙大小通过调整制备的绝缘膜厚度来保证,由于绝缘膜厚度可以精确调控甚至1nm量级,这样可以方便地实现精确调控纳米级间隙大小;通过扭矩悬挂系统实现微细工具电极与绝缘薄膜微力接触,从而保证纳米级间隙的准确大小,这样的物理接触方式不易受振动等外在因素影响,提高了纳米级间隙调控的重复性精度和可靠性;操作过程简单方便、成本低、可靠性高,易于实现自动化调控和测试过程。The nano-level gap electric spark discharge test method of the embodiment of the present invention precisely controls the nano-level discharge gap by precisely and controllably preparing an insulating film with a nano-level thickness, and can realize the precise and repeated discharge test of the same nano-level discharge gap; The size is ensured by adjusting the thickness of the prepared insulating film. Since the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; through the torque suspension system, the micro-tool electrode and the insulating film are in micro-force contact, thereby Ensure the precise size of the nano-level gap, such a physical contact method is not easily affected by external factors such as vibration, and improves the repeatability and reliability of nano-level gap control; the operation process is simple and convenient, low cost, high reliability, and easy to implement Automated regulation and testing process.
另外,根据本发明上述实施例的纳米级间隙电火花放电测试方法还可以具有以下附加的技术特征:In addition, the nano-gap electric spark discharge test method according to the foregoing embodiment of the present invention may also have the following additional technical features:
进一步地,在本发明的一个实施例中,还包括:开启所述双通道数字示波器的电源, 以通过所述双通道数字示波器观测所述放电波形。Further, in an embodiment of the present invention, the method further includes: turning on the power of the dual-channel digital oscilloscope to observe the discharge waveform through the dual-channel digital oscilloscope.
本发明附加的方面和优点将在下面的描述中部分给出,部分将从下面的描述中变得明显,或通过本发明的实践了解到。The additional aspects and advantages of the present invention will be partly given in the following description, and partly will become obvious from the following description, or be understood through the practice of the present invention.
附图说明Description of the drawings
本发明上述的和/或附加的方面和优点从下面结合附图对实施例的描述中将变得明显和容易理解,其中:The above and/or additional aspects and advantages of the present invention will become obvious and easy to understand from the following description of the embodiments in conjunction with the accompanying drawings, in which:
图1为根据本发明实施例的纳米级间隙电火花放电测试系统的结构示意图;FIG. 1 is a schematic diagram of the structure of a nano-scale gap electric spark discharge test system according to an embodiment of the present invention;
图2为根据本发明实施例的纳米级间隙电火花放电测试系统的实物示意图;2 is a physical schematic diagram of a nano-scale gap electric spark discharge test system according to an embodiment of the present invention;
图3为根据本发明实施例的硅片上薄膜结构示意图及实物图;3 is a schematic diagram and a physical diagram of a thin film on a silicon wafer according to an embodiment of the present invention;
图4为根据本发明实施例的纳米级间隙电火花放电测试方法的流程图;4 is a flowchart of a nano-gap electric spark discharge test method according to an embodiment of the present invention;
图5为根据本发明一个实施例的纳米级间隙电火花放电测试方法的流程图;Fig. 5 is a flowchart of a nano-gap electric spark discharge test method according to an embodiment of the present invention;
图6为根据本发明实施例的纳米级间隙电火花放电测试波形图。Fig. 6 is a waveform diagram of a nano-gap electric spark discharge test according to an embodiment of the present invention.
具体实施方式Detailed ways
下面详细描述本发明的实施例,所述实施例的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的,旨在用于解释本发明,而不能理解为对本发明的限制。The embodiments of the present invention are described in detail below. Examples of the embodiments are shown in the accompanying drawings, in which the same or similar reference numerals indicate the same or similar elements or elements with the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary, and are intended to explain the present invention, but should not be construed as limiting the present invention.
下面参照附图描述根据本发明实施例提出的纳米级间隙电火花放电测试系统及方法,首先将参照附图描述根据本发明实施例提出的纳米级间隙电火花放电测试系统。The following describes the nano-gap electric spark discharge test system and method according to the embodiments of the present invention with reference to the drawings. First, the nano-gap electric spark discharge test system according to the embodiments of the present invention will be described with reference to the drawings.
图1是本发明一个实施例的纳米级间隙电火花放电测试系统的结构示意图。Fig. 1 is a schematic structural diagram of a nano-gap electric spark discharge test system according to an embodiment of the present invention.
如图1所示,该纳米级间隙电火花放电测试系统10包括:微细工具电极100、硅片200、一维移动平台300和扭矩悬挂系统400。As shown in FIG. 1, the nanometer gap electric spark discharge test system 10 includes: a micro tool electrode 100, a silicon wafer 200, a one-dimensional mobile platform 300 and a torque suspension system 400.
其中,微细工具电极100作为工具电极用于微细电火花放电。硅片200作为工件电极用于微细电火花放电,硅片200的导电膜上预设厚度制备的绝缘膜用作击穿介质,以给目标纳米级放电间隙。一维移动平台300用于固定并移动定位硅片200,以使硅片200上的绝缘膜与微细工具电极100接触并使悬挂的导电丝产生目标角度扭转。扭矩悬挂系统400用于利用导电丝的目标角度的扭转生成扭矩,使微细工具电极100与硅片200绝缘薄膜微力接触,且不刺穿绝缘薄膜,以得到在目标纳米级间隙情况下更微能量脉冲放电电源性能测试结果。本发明实施例的系统10操作过程简单方便、成本低、可靠性高,易于实现自动化调控和测试过程。Among them, the fine tool electrode 100 is used as a tool electrode for fine spark discharge. The silicon wafer 200 is used as a workpiece electrode for fine spark discharge, and an insulating film prepared with a predetermined thickness on the conductive film of the silicon wafer 200 is used as a breakdown medium to provide a target nanometer-scale discharge gap. The one-dimensional mobile platform 300 is used to fix and move the silicon wafer 200 to make the insulating film on the silicon wafer 200 contact the micro tool electrode 100 and cause the suspended conductive wire to twist at a target angle. The torque suspension system 400 is used to generate torque by using the torsion of the conductive wire at the target angle, so that the micro tool electrode 100 and the silicon wafer 200 insulating film are in micro force contact without piercing the insulating film, so as to obtain a smaller energy under the target nanometer gap Pulse discharge power supply performance test results. The operation process of the system 10 of the embodiment of the present invention is simple and convenient, low in cost, high in reliability, and easy to realize automatic control and testing processes.
其中,本领域技术人员可以根据实际情况设置预设厚度,在此不做具体限定。导电丝可以为细长导电丝,比如,细长钢丝,其中,导电丝的直径应足够小,从而可以保证当其 为小扭转角时产生的扭矩足够小。Among them, those skilled in the art can set the preset thickness according to the actual situation, which is not specifically limited here. The conductive wire may be a slender conductive wire, for example, a slender steel wire, wherein the diameter of the conductive wire should be small enough to ensure that the torque generated when it has a small twist angle is small enough.
进一步地,在本发明的一个实施例中,导电膜可以为镀金膜,绝缘膜可以为氧化铝膜,当然,导电膜和绝缘膜均还可以为其他材质的膜,本领域技术人员可以根据实际需求选择具体材质,在此仅作为示例,不做具体限定。Further, in an embodiment of the present invention, the conductive film may be a gold-plated film, and the insulating film may be an aluminum oxide film. Of course, both the conductive film and the insulating film may also be films of other materials. The specific material needs to be selected, which is only used as an example here, without specific restrictions.
具体地,导电膜和绝缘膜的一种制备工艺为:在表面光滑的硅片上利用物理气相沉积或者化学气相沉积方法沉积一层导电膜(以金膜为例);再在导电膜上利用原子层沉积方法沉积一定给定纳米厚度的绝缘膜(以氧化铝膜为例);将硅片竖直半浸泡在稀酸溶液(以稀硫酸为例)中,从而洗掉一部分面积的绝缘膜;最后用去离子水清洗留有薄膜的硅片并烘干。Specifically, a preparation process of conductive film and insulating film is: depositing a conductive film (a gold film as an example) on a silicon wafer with a smooth surface by physical vapor deposition or chemical vapor deposition; Atomic layer deposition method deposits an insulating film with a given nanometer thickness (taking aluminum oxide film as an example); immersing the silicon wafer vertically in a dilute acid solution (taking dilute sulfuric acid as an example) to wash away a part of the insulating film ; Finally, use deionized water to clean the remaining silicon wafer and dry it.
进一步地,在本发明的一个实施例中,本发明实施例的系统10还包括:双通道数字示波器。其中,双通道数字示波器,用于显示性能测试中放电波形。Further, in an embodiment of the present invention, the system 10 of the embodiment of the present invention further includes: a dual-channel digital oscilloscope. Among them, a dual-channel digital oscilloscope is used to display the discharge waveform in the performance test.
可以理解的是,纳米级间隙电火花放电测试系统10主要由微细工具电极100、覆盖有导电膜(以金膜为例)和绝缘膜(以氧化铝膜为例)的硅片200、一维移动平台300、扭矩悬挂系统400、双通道数字示波器组成。微细工具电极100作为微细电火花放电的工具电极;硅片200上的导电膜用作微细电火花放电的工件电极,导电膜上给定厚度制备的绝缘膜用作击穿介质,以给定纳米级放电间隙;一维移动平台300用于固定硅片并移动定位硅片,从而使硅片上绝缘膜与微细工具电极接触并使其悬挂的细长导电丝(以细长钢丝为例)产生小幅度扭转;扭矩悬挂系统是利用细长导电丝小幅度扭转而产生的微小扭矩,使保证微细工具电极与硅片上绝缘薄膜微力接触并且不刺穿薄膜。It is understandable that the nanometer gap spark discharge test system 10 is mainly composed of a micro tool electrode 100, a silicon wafer 200 covered with a conductive film (a gold film as an example) and an insulating film (alumina film as an example), a one-dimensional It consists of a mobile platform 300, a torque suspension system 400, and a dual-channel digital oscilloscope. The micro tool electrode 100 is used as the tool electrode for micro spark discharge; the conductive film on the silicon wafer 200 is used as the workpiece electrode for micro spark discharge, and the insulating film prepared with a given thickness on the conductive film is used as a breakdown medium, with a given nanometer One-dimensional discharge gap; the one-dimensional mobile platform 300 is used to fix and move the silicon chip, so that the insulating film on the silicon chip is in contact with the micro tool electrode and the elongated conductive wire (take the elongated steel wire as an example) is produced Slightly twisted; the torque suspension system uses the tiny torque generated by the small twisting of the slender conductive wire to ensure that the micro tool electrode is in contact with the insulating film on the silicon chip and does not pierce the film.
具体而言,如图1和图2所示,本发明实施例的系统10主要组成包括:(1)微细工具电极100:作为微细电火花放电的工具电极;(2)覆盖薄膜硅片200:覆盖有导电膜用作微细电火花放电的工件电极,以金膜为例用以改善导电性,再覆盖纳米级厚度的绝缘膜以给定纳米级放电间隙,以氧化铝膜为例作为击穿介质,去除部分氧化铝薄膜以露出金膜,如图3所示;(3)一维移动平台300:用作固定硅片并移动硅片;(4)扭矩悬挂系统400:使硅片上绝缘膜与微细工具电极接触并使其悬挂在细长导电丝上,细长导电丝以细长钢丝为例,通过细长钢丝来提供小幅度扭转角以产生微小扭矩,保证微细工具电极针尖与硅片上绝缘薄膜微力接触并且不刺穿薄膜;(5)双通道数字示波器:用于观测微细工具电极与硅片上金膜之间的放电波形。Specifically, as shown in FIG. 1 and FIG. 2, the main components of the system 10 of the embodiment of the present invention include: (1) Micro tool electrode 100: as a tool electrode for micro spark discharge; (2) Cover thin film silicon wafer 200: It is covered with a conductive film to be used as a workpiece electrode for fine spark discharge. A gold film is used as an example to improve conductivity, and then a nano-thickness insulating film is covered with a given nano-level discharge gap, and an aluminum oxide film is used as an example for breakdown Medium, remove part of the aluminum oxide film to expose the gold film, as shown in Figure 3; (3) One-dimensional mobile platform 300: used to fix and move the silicon wafer; (4) Torque suspension system 400: insulate the silicon wafer The membrane is in contact with the micro tool electrode and hangs it on the slender conductive wire. The slender conductive wire takes a slender steel wire as an example. The slender steel wire is used to provide a small twist angle to generate a small torque to ensure that the tip of the micro tool electrode and silicon The on-chip insulating film is in contact with little force and does not pierce the film; (5) Dual-channel digital oscilloscope: used to observe the discharge waveform between the micro tool electrode and the gold film on the silicon wafer.
综上,在硅片光滑表面覆盖金膜或银膜,并在金膜或银膜上再覆盖一定厚度的绝缘膜作为击穿介质,用酸洗掉一部分绝缘膜以露出金膜或银膜连接脉冲电源负极;一维移动平台用于固定并移动定位硅片;扭矩悬挂系统利用细长丝小角度扭转调控微小扭矩,保证微细工具电极与硅片上绝缘薄膜微力接触并且不刺穿薄膜。纳米级厚度绝缘膜即为放电击穿间隙,通过此方法模拟纳米级放电间隙,用于测试微细电火花加工脉冲电源在给定纳米间隙的放电特性。In summary, cover the smooth surface of the silicon wafer with gold or silver film, and then cover the gold or silver film with a certain thickness of insulating film as a breakdown medium, and use acid to wash away a part of the insulating film to expose the gold or silver film connection The negative pole of the pulse power supply; the one-dimensional mobile platform is used to fix and move the silicon wafer; the torque suspension system uses the slender filament to twist at a small angle to adjust the tiny torque to ensure that the micro tool electrode is in contact with the insulating film on the silicon wafer and does not penetrate the film. The nano-thickness insulating film is the discharge breakdown gap. This method is used to simulate the nano-scale discharge gap to test the discharge characteristics of the micro-EDM pulse power supply at a given nano-gap.
根据本发明实施例提出的纳米级间隙电火花放电测试系统,通过精确可控地制备纳米级厚度的绝缘膜来精确调控纳米级放电间隙,可实现相同纳米级放电间隙的精确重复放电测试;纳米级间隙大小通过调整制备的绝缘膜厚度来保证,由于绝缘膜厚度可以精确调控甚至1nm量级,这样可以方便地实现精确调控纳米级间隙大小;通过扭矩悬挂系统实现微细工具电极与绝缘薄膜微力接触,从而保证纳米级间隙的准确大小,这样的物理接触方式不易受振动等外在因素影响,提高了纳米级间隙调控的重复性精度和可靠性;操作过程简单方便、成本低、可靠性高,易于实现自动化调控和测试过程。According to the nano-level gap electric spark discharge test system proposed by the embodiment of the present invention, the nano-level discharge gap can be precisely controlled by accurately and controllably preparing an insulating film of nano-level thickness, which can realize the precise and repeated discharge test of the same nano-level discharge gap; The size of the gap is ensured by adjusting the thickness of the prepared insulating film. Since the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; the micro-tool electrode and the insulating film can be contacted by a torque suspension system. , So as to ensure the precise size of the nano-level gap, such a physical contact method is not easily affected by external factors such as vibration, and improves the repeatability and reliability of nano-level gap control; the operation process is simple and convenient, low cost, and high reliability. It is easy to realize automatic control and testing process.
其次参照附图描述根据本发明实施例提出的纳米级间隙电火花放电测试方法。Next, the nano-gap electric spark discharge test method proposed according to the embodiment of the present invention will be described with reference to the accompanying drawings.
图4是本发明一个实施例的纳米级间隙电火花放电测试方法的流程图。Fig. 4 is a flowchart of a nano-gap spark discharge test method according to an embodiment of the present invention.
如图4所示,该纳米级间隙电火花放电测试方法,采用上述实施例的测试系统,其中,方法包括以下步骤:As shown in FIG. 4, the nano-scale gap electric spark discharge test method adopts the test system of the above-mentioned embodiment, wherein the method includes the following steps:
在步骤S401中,制备微细工具电极与硅片的导电膜和绝缘膜。In step S401, the conductive film and insulating film of the micro tool electrode and the silicon wafer are prepared.
在步骤S402中,利用稀酸去除一半面积的绝缘膜。In step S402, a half area of the insulating film is removed with dilute acid.
可以理解的是,采用现有的微细加工方法(以微细电解加工方法为例),制备出具有微纳米级尺度尖端的微细工具电极。在表面光滑的硅片上先沉积一层导电膜(以金膜为例),再沉积一层给定纳米厚度的绝缘膜(以氧化铝膜为例),然后去除一部分绝缘膜以露出导电膜。It is understandable that the existing micro-machining method (take the micro electrochemical machining method as an example) is used to prepare a micro tool electrode with a micro-nano-scale tip. First deposit a conductive film (a gold film as an example) on a silicon wafer with a smooth surface, then deposit an insulating film with a given nanometer thickness (aluminum oxide film as an example), and then remove a part of the insulating film to expose the conductive film .
在步骤S403中,搭建扭矩悬挂系统,并且将硅片固定在一维移动平台上。In step S403, a torque suspension system is built, and the silicon wafer is fixed on a one-dimensional mobile platform.
可以理解的是,将微细工具电极固定在细长金属棒(以钨棒为例)的一端,再用两根细长导电丝(以细长钢丝为例)将细长金属棒悬挂在固定杆上,调整固定位置使细长金属棒保持平衡,将细长导电丝接电火花加工放电用脉冲电源正极和示波器一端;将硅片固定在一维移动平台上,将露出的导电膜接电火花加工放电用脉冲电源负极和示波器另一端。It is understandable that the micro tool electrode is fixed to one end of a slender metal rod (take a tungsten rod as an example), and two slender conductive wires (take a slender steel wire as an example) are used to hang the slender metal rod on the fixed rod. , Adjust the fixed position to keep the slender metal rod in balance, connect the slender conductive wire to the positive electrode of the pulse power supply for electric discharge machining and one end of the oscilloscope; fix the silicon wafer on the one-dimensional mobile platform, and connect the exposed conductive film to the electric spark The negative pole of the pulse power supply for machining discharge and the other end of the oscilloscope.
在步骤S404中,导通测试系统的电路,并移动硅片使导电丝扭转。In step S404, the circuit of the test system is turned on, and the silicon chip is moved to twist the conductive wire.
可以理解的是,调整一维移动平台使硅片上绝缘膜与微细工具电极接触并使细长导电丝产生小扭转角。It is understandable that the one-dimensional moving platform is adjusted to make the insulating film on the silicon chip contact the micro tool electrode and cause the elongated conductive wire to produce a small twist angle.
在步骤S405中,获取在目标纳米级间隙情况下更微能量脉冲放电电源性能测试结果。In step S405, the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap is obtained.
进一步地,在本发明的一个实施例中,本发明实施例的方法还包括:开启双通道数字示波器的电源,以通过双通道数字示波器观测放电波形。Further, in an embodiment of the present invention, the method of the embodiment of the present invention further includes: turning on the power of the dual-channel digital oscilloscope to observe the discharge waveform through the dual-channel digital oscilloscope.
可以理解的是,打开电火花加工放电用脉冲电源,通过示波器观测放电波形。It is understandable that the pulse power supply for EDM discharge is turned on and the discharge waveform is observed through an oscilloscope.
下面将通过具体实施例对纳米级间隙电火花放电测试方法进行进一步阐述。The following will further illustrate the nanometer gap spark discharge test method through specific embodiments.
如图5所示,纳米级间隙电火花放电测试方法操作流程为:As shown in Figure 5, the operation flow of the nanometer gap electric spark discharge test method is:
(1)利用微细电解加工方法制备微细工具电极,所得到微细工具电极针尖直径~4μm;(1) Use the micro electrochemical machining method to prepare the micro tool electrode, and the diameter of the needle tip of the micro tool electrode is ~ 4 μm;
(2)在表面粗糙度为Ra0.1nm的硅片上利用蒸镀法沉积一层50nm厚的金膜,再在金膜上利用原子层沉积方法沉积一层20nm厚的氧化铝膜;(2) Deposit a 50nm thick gold film on a silicon wafer with a surface roughness of Ra0.1nm by evaporation, and then deposit a 20nm thick aluminum oxide film on the gold film by atomic layer deposition;
(3)配置2mol/L的稀硫酸溶液,将覆盖有薄膜的硅片竖直半浸泡在稀硫酸溶液中,2min后取出硅片,用去离子水由氧化铝膜到金膜方向冲洗硅片,在60℃温度下烘干10min,得到覆盖薄膜硅片的结构如图3所示;(3) Configure 2mol/L dilute sulfuric acid solution, immerse the silicon wafer covered with the thin film in the dilute sulfuric acid solution vertically, take out the silicon wafer after 2 minutes, and rinse the silicon wafer from the aluminum oxide film to the gold film with deionized water , Drying at 60°C for 10 minutes, the structure of the film-covered silicon wafer is shown in Figure 3;
(4)将硅片固定在一维移动平台上,将硅片上露出金膜部分同时与电火花加工放电用脉冲电源负极和示波器一端电连接;(4) Fix the silicon wafer on a one-dimensional mobile platform, and electrically connect the exposed gold film part of the silicon wafer with the negative electrode of the pulse power supply for electric discharge machining and one end of the oscilloscope;
(5)将微细工具电极固定在长为10cm、直径为0.4mm的钨棒一端,用两根长度为15cm、直径为0.12mm的细长钢丝将钨棒悬挂在固定杆上,调整钢丝的固定位置使长细钨棒保持平衡,将细长钢丝接电火花加工放电用脉冲电源正极和示波器另一端,实验系统如图2所示;(5) Fix the micro tool electrode on one end of a tungsten rod with a length of 10cm and a diameter of 0.4mm. Use two slender wires with a length of 15cm and a diameter of 0.12mm to hang the tungsten rod on the fixed rod to adjust the fixing of the wire Position the long and thin tungsten rod to maintain balance, connect the long and thin steel wire to the positive pole of the pulse power supply for electric discharge machining and the other end of the oscilloscope. The experimental system is shown in Figure 2;
(6)调整一维移动平台使硅片上氧化铝膜与微细工具电极接触,并使细长钢丝产生~1°的扭转角并保持平衡;(6) Adjust the one-dimensional mobile platform so that the aluminum oxide film on the silicon wafer is in contact with the micro tool electrode, and the slender steel wire produces a torsion angle of ~1° and maintains a balance;
(7)打开电火花加工放电用脉冲电源,观测示波器波形,在间隙放电击穿前得到波形如图6(a),间隙放电击穿时得到波形如图6(b)。(7) Turn on the pulse power supply for EDM discharge and observe the waveform of the oscilloscope. The waveform obtained before the gap discharge breakdown is shown in Figure 6(a), and the waveform obtained during the gap discharge breakdown is shown in Figure 6(b).
根据本发明实施例提出的纳米级间隙电火花放电测试方法,通过精确可控地制备纳米级厚度的绝缘膜来精确调控纳米级放电间隙,可实现相同纳米级放电间隙的精确重复放电测试;纳米级间隙大小通过调整制备的绝缘膜厚度来保证,由于绝缘膜厚度可以精确调控甚至1nm量级,这样可以方便地实现精确调控纳米级间隙大小;通过扭矩悬挂系统实现微细工具电极与绝缘薄膜微力接触,从而保证纳米级间隙的准确大小,这样的物理接触方式不易受振动等外在因素影响,提高了纳米级间隙调控的重复性精度和可靠性;操作过程简单方便、成本低、可靠性高,易于实现自动化调控和测试过程。According to the nano-level gap electric spark discharge test method proposed by the embodiment of the present invention, the nano-level discharge gap can be precisely controlled by accurately and controllably preparing an insulating film of nano-level thickness, which can realize the precise and repeated discharge test of the same nano-level discharge gap; The size of the gap is ensured by adjusting the thickness of the prepared insulating film. Since the thickness of the insulating film can be precisely adjusted to the order of 1nm, it is convenient to accurately adjust the size of the nano-level gap; the micro-tool electrode and the insulating film can be contacted by a torque suspension system. , So as to ensure the precise size of the nano-level gap, such a physical contact method is not easily affected by external factors such as vibration, and improves the repeatability and reliability of nano-level gap control; the operation process is simple and convenient, low cost, and high reliability. It is easy to realize automatic control and testing process.
此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本发明的描述中,“多个”的含义是至少两个,例如两个,三个等,除非另有明确具体的限定。In addition, the terms "first" and "second" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features. Therefore, the features defined with "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, "a plurality of" means at least two, such as two, three, etc., unless otherwise specifically defined.
在本说明书的描述中,参考术语“一个实施例”、“一些实施例”、“示例”、“具体示例”、或“一些示例”等的描述意指结合该实施例或示例描述的具体特征、结构、材料或者特点包含于本发明的至少一个实施例或示例中。在本说明书中,对上述术语的示意性表述不必须针对的是相同的实施例或示例。而且,描述的具体特征、结构、材料或者特点可以在任一个或多个实施例或示例中以合适的方式结合。此外,在不相互矛盾的情况下,本领域的技术人员可以将本说明书中描述的不同实施例或示例以及不同实施例或示例的特征进行结合和组合。In the description of this specification, descriptions with reference to the terms "one embodiment", "some embodiments", "examples", "specific examples", or "some examples" etc. mean specific features described in conjunction with the embodiment or example , Structure, materials or features are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the described specific features, structures, materials or characteristics can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and combine the different embodiments or examples and the characteristics of the different embodiments or examples described in this specification without contradicting each other.
尽管上面已经示出和描述了本发明的实施例,可以理解的是,上述实施例是示例性的,不能理解为对本发明的限制,本领域的普通技术人员在本发明的范围内可以对上述实施例进行变化、修改、替换和变型。Although the embodiments of the present invention have been shown and described above, it can be understood that the above-mentioned embodiments are exemplary and should not be construed as limiting the present invention. Those of ordinary skill in the art can comment on the foregoing within the scope of the present invention. The embodiment undergoes changes, modifications, substitutions and modifications.

Claims (5)

  1. 一种纳米级间隙电火花放电测试系统,其特征在于,包括:A nanometer gap electric spark discharge test system is characterized in that it comprises:
    微细工具电极,作为工具电极用于微细电火花放电;Micro tool electrode, used as a tool electrode for micro spark discharge;
    硅片,作为工件电极用于微细电火花放电,所述硅片的导电膜上预设厚度制备的绝缘膜用作击穿介质,以给目标纳米级放电间隙;A silicon wafer is used as a workpiece electrode for fine spark discharge, and an insulating film prepared with a predetermined thickness on the conductive film of the silicon wafer is used as a breakdown medium to provide a target nanometer-scale discharge gap;
    一维移动平台,用于固定并移动定位所述硅片,以使所述硅片上的绝缘膜与所述微细工具电极接触并使悬挂的导电丝产生目标角度扭转;A one-dimensional mobile platform for fixing and moving the silicon wafer so that the insulating film on the silicon wafer contacts the micro tool electrode and the suspended conductive wire is twisted at a target angle;
    扭矩悬挂系统,用于利用所述导电丝的目标角度的扭转生成扭矩,使所述微细工具电极与所述硅片上的绝缘薄膜微力接触,且不刺穿所述绝缘薄膜,以得到在所述目标纳米级间隙情况下更微能量脉冲放电电源性能测试结果。The torque suspension system is used to generate torque using the twisting of the conductive wire at the target angle, so that the micro tool electrode is in contact with the insulating film on the silicon wafer without piercing the insulating film to obtain the The performance test results of a smaller energy pulse discharge power supply under the target nanometer gap.
  2. 根据权利要求1所述的测试系统,其特征在于,还包括:The test system according to claim 1, further comprising:
    双通道数字示波器,用于显示性能测试中放电波形。Dual-channel digital oscilloscope, used to display the discharge waveform in the performance test.
  3. 根据权利要求1所述的测试系统,其特征在于,其中,The test system according to claim 1, wherein:
    所述导电膜为镀金膜,所述绝缘膜为氧化铝膜。The conductive film is a gold-plated film, and the insulating film is an aluminum oxide film.
  4. 一种纳米级间隙电火花放电测试方法,其特征在于,采用如权利要求1-3任一项所述的测试系统,其中,所述方法包括:A nano-level gap electric spark discharge test method, characterized in that the test system according to any one of claims 1 to 3 is used, wherein the method comprises:
    制备所述微细工具电极与所述硅片的导电膜和绝缘膜;Preparing the conductive film and insulating film of the micro tool electrode and the silicon wafer;
    利用稀酸去除一半面积的绝缘膜;Use dilute acid to remove half of the insulating film;
    搭建所述扭矩悬挂系统,并且将所述硅片固定在所述一维移动平台上;Build the torque suspension system, and fix the silicon wafer on the one-dimensional mobile platform;
    导通所述测试系统的电路,并移动所述硅片使所述导电丝扭转;以及Turn on the circuit of the test system, and move the silicon chip to twist the conductive wire; and
    获取在所述目标纳米级间隙情况下更微能量脉冲放电电源性能测试结果。Obtain the performance test result of the pulse discharge power supply with a smaller energy under the target nanometer gap.
  5. 根据权利要求4所述的方法,其特征在于,还包括:The method according to claim 4, further comprising:
    开启所述双通道数字示波器的电源,以通过所述双通道数字示波器观测所述放电波形。Turn on the power of the dual-channel digital oscilloscope to observe the discharge waveform through the dual-channel digital oscilloscope.
PCT/CN2019/115731 2019-06-25 2019-11-05 System and method for testing discharge of electric spark at nanoscale gap WO2020258639A1 (en)

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