WO2020258244A1 - Chemical-mechanical polishing method and polishing device for integral impeller - Google Patents

Chemical-mechanical polishing method and polishing device for integral impeller Download PDF

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Publication number
WO2020258244A1
WO2020258244A1 PCT/CN2019/093669 CN2019093669W WO2020258244A1 WO 2020258244 A1 WO2020258244 A1 WO 2020258244A1 CN 2019093669 W CN2019093669 W CN 2019093669W WO 2020258244 A1 WO2020258244 A1 WO 2020258244A1
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Prior art keywords
polishing
integral impeller
motor
hole
mounting plate
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PCT/CN2019/093669
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French (fr)
Chinese (zh)
Inventor
张振宇
廖龙兴
孟凡宁
孟祥东
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大连理工大学
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Priority to PCT/CN2019/093669 priority Critical patent/WO2020258244A1/en
Publication of WO2020258244A1 publication Critical patent/WO2020258244A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/02Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving rotary barrels
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09GPOLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00Polishing compositions
    • C09G1/02Polishing compositions containing abrasives or grinding agents

Definitions

  • the invention belongs to the technical field of mechanical processing, and specifically relates to a chemical mechanical polishing method and a polishing device for an integral impeller.
  • the impeller is a key component of power machinery such as turbine engines and turbochargers. Compared with the traditional combined impeller, the new generation of integral impeller is characterized by the design and manufacture of a single blade and the disc as a whole, making it compact and strong. The advantages of high, long service life and large thrust-to-weight ratio are widely used in aerospace, energy and power, ships and other fields.
  • precision forging manufacturing is a manufacturing process for mass production of impellers. This process has high requirements for equipment manufacturing accuracy, high abrasive manufacturing costs, and poor versatility. It is generally used for the blank manufacturing of impellers; multi-axis CNC milling processing is At present, the most commonly used machining method can realize the rough and fine machining of the impeller. However, this machining method requires high rigidity of the machine tool, cutting tool, and fixture. It is necessary to write a special processing program.
  • the main problems existing in the processing of integral impellers at home and abroad are: difficulty in manufacturing processing equipment, poor versatility, high cost, low processing efficiency, and poor overall processing quality.
  • the present invention provides a chemical mechanical polishing method and polishing device for an integral impeller.
  • the purpose of the present invention is to provide an integral impeller polishing method with good polishing quality and high efficiency, and an integral impeller polishing device with simple structure, low cost, convenient operation and good versatility.
  • a chemical mechanical polishing device for integral impeller including motor 1, bolt 2, mounting plate 3, positioning support plate 4, base 5, plastic foam 6, container 7, polishing liquid 8, coupling 9, connecting piece 10, integral Impeller 11, motor mounting through hole 12, mounting plate through hole 13, positioning support plate through hole 14, shaft end 15, bottom end surface 16, connector through hole 17 and bottom end surface groove 18;
  • the rotating shaft of the motor 1 passes through the mounting plate 3 downwards, and it is ensured that the motor 1 is vertically installed and fixed on the mounting plate 3; the rotating shaft of the motor 1 is connected to a shaft end of the connecting piece 10 through a coupling 9, and the connecting piece 10 The other end is connected and fixed with the large end face of the integral impeller;
  • the mounting plate 3 includes two rectangular steel plates with the same structure, which are fixed on the base 5 through a positioning support plate 4; there are four holes in the steel plate, two of which are motor mounting through holes 12 to realize the positioning of the motor 1. Installation: A mounting plate through hole 13 is provided at both ends of the steel plate to realize the positioning and installation of the steel plate;
  • the supporting and positioning plate 4 includes two "L"-shaped plates with the same structure.
  • the surface of one plate is provided with positioning and supporting plate through holes 14 to realize that the supporting and positioning plate 4 is fixed on the base 5;
  • the threaded holes matched with the through holes 13 of the mounting plate realize the installation of the mounting plate 3;
  • the connecting piece 10 includes a shaft end 15 and a bottom end surface 16, which are an integral structure.
  • the cross section of the connecting piece 10 is an "inverted T" shape; the bottom end surface of the connecting piece 10 is provided with no less than 3 connecting pieces on the periphery.
  • the holes 20 are matched respectively;
  • the base 5 is provided with a concave cavity and threaded holes, wherein the diameter of the inscribed circle of the concave cavity is greater than or equal to the diameter of the circumscribed circle of the container 7, and the threaded hole matches the through hole 14 of the positioning support plate;
  • the inner surface of the container 7 has corrosion resistance, and the diameter of the inscribed circle of the container should be larger than the maximum outer diameter of the polished integral impeller;
  • the container is placed in the concave cavity of the base 5 and the gap between the two is filled with plastic foam 6.
  • a chemical mechanical polishing method for an integral impeller includes the following steps:
  • the abrasive includes one or more of alumina abrasive grains, silicon carbide abrasive grains, and boron carbide abrasive grains.
  • the abrasive grain size includes one or two of 1000 ⁇ m, 150 ⁇ m, and 45 ⁇ m. Mix of the above;
  • the polishing liquid includes an oxidant, a surfactant, a pH regulator and deionized water;
  • the oxidant includes a 65 wt% nitric acid solution and/or a 30 wt% hydrogen peroxide solution, which accounts for the volume of the polishing solution The ratio is 5-12%;
  • the surfactant is a 10 wt% nonylphenol polyoxyethylene ether solution, and its volume ratio in the polishing liquid is 0.1 ⁇ 0.5%;
  • the pH adjuster is 85 wt% phosphoric acid solution and/or 40 wt% hydrofluoric acid solution, adjust the polishing liquid pH to 0.5 ⁇ 3;
  • step 2) Slowly add the abrasive and chemical polishing liquid prepared in step 2) and step 3) to the container at the same time; after the abrasive and chemical polishing liquid are mixed, the integral impeller needs to be completely immersed, and the volume of the chemical polishing liquid and the abrasive The ratio is controlled at 1:1 ⁇ 2;
  • the beneficial effect of the present invention is that the present invention proposes a method for chemical mechanical polishing of an integral impeller.
  • the integral impeller is rotated in the polishing liquid under the drive of a motor.
  • chemical reagents react with various parts on the surface of the integral impeller, the surface material structure is corroded and softened.
  • the uneven parts on the surface of the integral impeller are scraped off to achieve high precision and high efficiency processing. It can be applied to precision polishing processing of integral impellers of various sizes; in addition, the invention also provides a device of the polishing method, which has simple structure, convenient manufacture, easy operation, stability and reliability, and low cost.
  • Figure 1 is a front view of the chemical mechanical polishing assembly of the integral impeller
  • Figure 2 is an oblique two-dimensional view of the chemical mechanical polishing assembly of the integral impeller
  • Figure 3 is a cross-sectional view of the connector parts
  • Figure 4 is a schematic diagram of the structure of integral impeller parts
  • Figure 5 is a curve diagram of the roughness detection result at a certain point of the integral impeller blade
  • the polishing device of the integral impeller includes: a motor 1, a bolt 2, a mounting plate 3, a supporting and positioning plate 4, a base 5, a plastic foam 6, a container 7, a coupling 9 and a connecting piece 10.
  • a plastic drum 7 with an inner diameter of ⁇ 540mm and an outer diameter of ⁇ 550mm is selected and placed in the circular cavity of the cast iron base 5.
  • the diameter of the circular cavity is ⁇ 570mm.
  • the gaps are filled with plastic foam 6, and the base 5 is also provided with threaded holes matching the through holes 14.
  • the mounting plate 3 includes two rectangular steel plates with the same structure, two motor mounting through holes 12 are provided in the middle of the steel plates, and a through hole 13 is provided at each end.
  • the supporting and positioning plate 4 includes two "L"-shaped plates with the same structure. Both ends of a horizontal plane of the plate are provided with a through hole 14, and the two ends of the vertical plane perpendicular to the surface are provided with a threaded hole.
  • the through holes 13 on the mounting board 3 match.
  • the connecting piece 10 includes a shaft end 15 and a bottom end surface 16.
  • the bottom end surface is provided with three through holes 17 and a circular groove 18; the outer diameter of the shaft end 15 is the same as the shaft of the motor 1, the circular groove 18 and The relevant size of the through hole 17 matches the circular boss 19 and the threaded hole 20 on the large end face 21 of the integral impeller 11.
  • the components in the polishing solution are specifically: the volume fraction of the 65% by weight nitric acid solution in the polishing solution is 4%, and the 30% by weight hydrogen peroxide solution in the polishing solution.
  • the volume fraction of the nonylphenol polyoxyethylene ether solution with a mass fraction of 5% and a mass fraction of 10 wt% in the polishing liquid is 0.5%, the remaining volume ratio is deionized water, and the mass fraction is 85 wt%
  • the phosphoric acid solution adjusts the pH of the polishing liquid solution to 1.2.
  • step 2) Slowly add step 2) and step 3) the prepared abrasive and chemical polishing liquid to the container 7 until the mixed polishing liquid 8 completely immerses the integral impeller 11; the volume ratio of the abrasive to the chemical polishing liquid is 4 : 3.

Abstract

A chemical-mechanical polishing device for an integral impeller. The device comprises an electric motor (1), a bolt (2), a coupling (9), a mounting plate (3), a positioning support plate (4), a connection piece (10), a base (5), a container (7) and a plastic foam (6), wherein the electric motor (1) is mounted on the base (5) by means of the mounting plate (3) and the positioning support plate (4), and a rotary shaft of the electric motor (1) is connected to an integral impeller (11) by means of the coupling (9) and the connection piece (10). The polishing device is simple in structure, easy to manufacture, convenient to operate, stable and reliable, and low in cost. Further provided is a chemical-mechanical polishing method for an integral impeller, in which method chemical reagents and abrasives are mixed to form a polishing liquid; the whole of the integral impeller is immersed in the polishing liquid and is driven by the electric motor to rotate; under the combined action of chemical corrosion softening of the polishing liquid and mechanical scraping removal, precise polishing of various parts of an integral impeller surface is carried out. The polishing method has strong versatility, high polishing efficiency, and good polishing quality.

Description

一种整体叶轮的化学机械抛光方法与抛光装置Chemical mechanical polishing method and polishing device for integral impeller 技术领域Technical field
本发明属于机械加工技术领域,具体涉及一种整体叶轮的化学机械抛光方法与抛光装置。The invention belongs to the technical field of mechanical processing, and specifically relates to a chemical mechanical polishing method and a polishing device for an integral impeller.
背景技术Background technique
叶轮是涡轮式发动机、涡轮增压器等动力机械的关键部件,现新一代整体式叶轮较传统组合式叶轮的特点是将单个叶片与轮盘设计制造成一个整体,使之具有结构紧凑、强度高、使用寿命长以及推重比大等优点,被广泛应用于航空航天、能源动力、船舶等领域。The impeller is a key component of power machinery such as turbine engines and turbochargers. Compared with the traditional combined impeller, the new generation of integral impeller is characterized by the design and manufacture of a single blade and the disc as a whole, making it compact and strong. The advantages of high, long service life and large thrust-to-weight ratio are widely used in aerospace, energy and power, ships and other fields.
目前国内外整体叶轮的加工方式有:精锻制造、多轴数控铣削、电解加工、磨料流加工、人工抛光。其中精锻制造是针对大批量的叶轮生产的一种制造工艺,该工艺对设备制造精度要求很高,磨具制造成本高,通用性差,一般用于叶轮的毛坯制造;多轴数控铣削加工是目前应用最为普遍的一种加工方式,可以实现叶轮的粗、精加工,但该加工方式对机床、刀具、夹具的刚性要求较高,需要编写专门的加工程序,对于叶片间距小的叶轮加工时很容易发生刀具干涉,表面加工质量一般,粗糙度Ra≥1.6μm;电解加工通常用于整体叶轮的精加工,针对不同的叶片需要设计专门的电极,且前期制造与后续修正困难;磨料流抛光加工针对的是整体叶轮的精抛,该工艺对设备要求非常高,加工成本高,加工过程中需要控制的参数非常多,比如压力、循环次数;人工抛光是为提高整体叶轮表面光洁度,目前多数企业仍采用该方式,但人工抛光效率低、成本高、叶片型面精度一致性差,且对操作者的身体健康不利。At present, the processing methods of integral impellers at home and abroad are: precision forging manufacturing, multi-axis CNC milling, electrolytic machining, abrasive flow machining, and manual polishing. Among them, precision forging manufacturing is a manufacturing process for mass production of impellers. This process has high requirements for equipment manufacturing accuracy, high abrasive manufacturing costs, and poor versatility. It is generally used for the blank manufacturing of impellers; multi-axis CNC milling processing is At present, the most commonly used machining method can realize the rough and fine machining of the impeller. However, this machining method requires high rigidity of the machine tool, cutting tool, and fixture. It is necessary to write a special processing program. For impeller processing with small blade spacing Tool interference is prone to occur, the surface processing quality is average, and the roughness Ra≥1.6μm; electrochemical machining is usually used for the finishing of the integral impeller, and special electrodes are required for different blades, and the pre-manufacturing and subsequent correction are difficult; abrasive flow polishing The processing is aimed at the precision polishing of the overall impeller. The process requires very high equipment and high processing costs. There are many parameters that need to be controlled during the processing, such as pressure and cycle times; manual polishing is to improve the surface finish of the overall impeller. Enterprises still use this method, but the manual polishing efficiency is low, the cost is high, the blade profile accuracy is poor, and it is not good for the health of the operator.
综上知,目前国内外整体叶轮加工存在的主要问题有:加工装备制造困难、通用性差、成本高,加工效率低,整体加工质量差。为解决该问题,本发明提供了一种整体叶轮的化学机械抛光方法与抛光装置。In summary, the main problems existing in the processing of integral impellers at home and abroad are: difficulty in manufacturing processing equipment, poor versatility, high cost, low processing efficiency, and poor overall processing quality. To solve this problem, the present invention provides a chemical mechanical polishing method and polishing device for an integral impeller.
技术问题technical problem
本发明的目的:提供一种抛光质量好、效率高的整体叶轮抛光方法和一种结构简单、成本低廉、操作方便及通用性好的整体叶轮抛光装置。The purpose of the present invention is to provide an integral impeller polishing method with good polishing quality and high efficiency, and an integral impeller polishing device with simple structure, low cost, convenient operation and good versatility.
技术解决方案Technical solutions
本发明技术方案:The technical scheme of the present invention:
一种整体叶轮的化学机械抛光装置,包括电机1、螺栓2、安装板3、定位支撑板4、底座5、塑料泡沫6、容器7、抛光液8、联轴器9、连接件10、整体叶轮11、电机安装通孔12、安装板通孔13、定位支撑板通孔14、轴端15、底端面16、连接件通孔17和底端面凹槽18;A chemical mechanical polishing device for integral impeller, including motor 1, bolt 2, mounting plate 3, positioning support plate 4, base 5, plastic foam 6, container 7, polishing liquid 8, coupling 9, connecting piece 10, integral Impeller 11, motor mounting through hole 12, mounting plate through hole 13, positioning support plate through hole 14, shaft end 15, bottom end surface 16, connector through hole 17 and bottom end surface groove 18;
所述电机1的转轴朝下穿过安装板3,并确保电机1竖直安装固定于安装板3上;电机1的转轴通过联轴器9与连接件10的一轴端连接,连接件10的另一端与整体叶轮的大端面连接固定;The rotating shaft of the motor 1 passes through the mounting plate 3 downwards, and it is ensured that the motor 1 is vertically installed and fixed on the mounting plate 3; the rotating shaft of the motor 1 is connected to a shaft end of the connecting piece 10 through a coupling 9, and the connecting piece 10 The other end is connected and fixed with the large end face of the integral impeller;
所述安装板3包括2根结构相同的长方形钢板,其通过定位支撑板4固定在底座5上;钢板上开有4个孔,其中间2个为电机安装通孔12,实现电机1的定位安装;钢板两端设有一安装板通孔13,实现钢板的定位安装;The mounting plate 3 includes two rectangular steel plates with the same structure, which are fixed on the base 5 through a positioning support plate 4; there are four holes in the steel plate, two of which are motor mounting through holes 12 to realize the positioning of the motor 1. Installation: A mounting plate through hole 13 is provided at both ends of the steel plate to realize the positioning and installation of the steel plate;
所述支撑定位板4包括2个结构相同的“L”型板,一支板的表面开有定位支撑板通孔14,实现支撑定位板4固定在底座5上;另一支板上开有与安装板通孔13匹配的螺纹孔,实现安装板3的安装; The supporting and positioning plate 4 includes two "L"-shaped plates with the same structure. The surface of one plate is provided with positioning and supporting plate through holes 14 to realize that the supporting and positioning plate 4 is fixed on the base 5; The threaded holes matched with the through holes 13 of the mounting plate realize the installation of the mounting plate 3;
所述连接件10包括轴端15和底端面16,二者为一体结构,连接件10的截面为“倒T”型;连接件10底端面上设有周边的不少于3个连接件通孔17和中间的底端面凹槽18;轴端15外径与电机转轴相同,底端面凹槽18及连接件通孔17的尺寸与整体叶轮大端面圆形凸台19及整体叶轮大端面螺纹孔20分别相匹配;The connecting piece 10 includes a shaft end 15 and a bottom end surface 16, which are an integral structure. The cross section of the connecting piece 10 is an "inverted T" shape; the bottom end surface of the connecting piece 10 is provided with no less than 3 connecting pieces on the periphery. Hole 17 and the bottom end surface groove 18 in the middle; the outer diameter of the shaft end 15 is the same as that of the motor shaft, the size of the bottom end surface groove 18 and the connecting piece through hole 17 are the same as the integral impeller large end circular boss 19 and the integral impeller large end thread The holes 20 are matched respectively;
所述底座5上设有凹型腔体和螺纹孔,其中凹型腔体的内切圆直径大于或等于容器7的外接圆直径,螺纹孔与定位支撑板通孔14相匹配;The base 5 is provided with a concave cavity and threaded holes, wherein the diameter of the inscribed circle of the concave cavity is greater than or equal to the diameter of the circumscribed circle of the container 7, and the threaded hole matches the through hole 14 of the positioning support plate;
所述容器7内表面具有耐腐蚀性,容器的内切圆直径应大于被抛光整体叶轮的最大端面外径;The inner surface of the container 7 has corrosion resistance, and the diameter of the inscribed circle of the container should be larger than the maximum outer diameter of the polished integral impeller;
所述容器放置于底座5的凹型腔体内,且在两者缝隙间填满塑料泡沫6。The container is placed in the concave cavity of the base 5 and the gap between the two is filled with plastic foam 6.
一种整体叶轮的化学机械抛光方法,包括以下步骤:A chemical mechanical polishing method for an integral impeller includes the following steps:
(1)低速启动电机:使整体叶轮转速控制在5~9rpm;(1) Start the motor at low speed: control the overall impeller speed at 5-9rpm;
(2)准备好磨料,磨料包括氧化铝磨粒、碳化硅磨粒、碳化硼磨粒中的一种或两种以上混合,磨粒粒径包括1000μm、150μm、45μm中的一种或两种以上混合;(2) Prepare the abrasive. The abrasive includes one or more of alumina abrasive grains, silicon carbide abrasive grains, and boron carbide abrasive grains. The abrasive grain size includes one or two of 1000μm, 150μm, and 45μm. Mix of the above;
(3)配制好化学抛光液:抛光液包括氧化剂、表面活性剂、pH调节剂和去离子水;其中氧化剂包括65 wt%硝酸溶液和/或30 wt%双氧水溶液,其在抛光液中体积占比为5~12%;表面活性剂为10 wt%壬基酚聚氧乙烯醚溶液,其在抛光液中体积占比为0.1~0.5%;pH调节剂为85 wt%磷酸溶液和/或40 wt%氢氟酸溶液,调节抛光液pH调为0.5~3;(3) Prepare a chemical polishing liquid: the polishing liquid includes an oxidant, a surfactant, a pH regulator and deionized water; the oxidant includes a 65 wt% nitric acid solution and/or a 30 wt% hydrogen peroxide solution, which accounts for the volume of the polishing solution The ratio is 5-12%; the surfactant is a 10 wt% nonylphenol polyoxyethylene ether solution, and its volume ratio in the polishing liquid is 0.1~0.5%; the pH adjuster is 85 wt% phosphoric acid solution and/or 40 wt% hydrofluoric acid solution, adjust the polishing liquid pH to 0.5~3;
(4)向容器中缓慢地同时添加步骤2)、步骤3)中准备好的磨料和化学抛光液;磨料和化学抛光液混合后,需将整体叶轮完全浸没,其中化学抛光液与磨料的体积比控制在1:1~2;(4) Slowly add the abrasive and chemical polishing liquid prepared in step 2) and step 3) to the container at the same time; after the abrasive and chemical polishing liquid are mixed, the integral impeller needs to be completely immersed, and the volume of the chemical polishing liquid and the abrasive The ratio is controlled at 1:1~2;
(5)磨料和化学抛光液添加完毕后,提高电机转速,使整体叶轮旋转速度控制在60~110rpm,抛光60~90min后,关闭电机,将整体叶轮拆卸下来,用无水乙醇清洗干净,并吹干,完成整个抛光过程。(5) After the abrasive and chemical polishing liquid are added, increase the motor speed to control the rotation speed of the overall impeller at 60~110rpm. After polishing for 60~90 minutes, turn off the motor, disassemble the overall impeller, and clean it with absolute ethanol. Blow dry to complete the entire polishing process.
有益效果Beneficial effect
本发明的有益效果在于:本发明提出了一种整体叶轮化学机械抛光的方法,通过研制一种化学试剂与磨料混合的抛光液,在电机的驱动下,使整体叶轮在抛光液中旋转,此时化学试剂与整体叶轮表面各部位发生化学反应,使表面材料组织腐蚀软化,再加上磨料的机械去除作用,将整体叶轮表面凹凸不平的部位刮擦掉,实现其高精高效加工,该方法可适用各种尺寸规格的整体叶轮精密抛光加工;另外,本发明还提供了一种该抛光方法的装置,装置结构简单、制造方便、操作容易、稳定可靠、成本低。The beneficial effect of the present invention is that the present invention proposes a method for chemical mechanical polishing of an integral impeller. By developing a polishing liquid mixed with chemical reagents and abrasives, the integral impeller is rotated in the polishing liquid under the drive of a motor. When chemical reagents react with various parts on the surface of the integral impeller, the surface material structure is corroded and softened. Coupled with the mechanical removal of abrasives, the uneven parts on the surface of the integral impeller are scraped off to achieve high precision and high efficiency processing. It can be applied to precision polishing processing of integral impellers of various sizes; in addition, the invention also provides a device of the polishing method, which has simple structure, convenient manufacture, easy operation, stability and reliability, and low cost.
附图说明Description of the drawings
图1为整体叶轮化学机械抛光装配体正视图;Figure 1 is a front view of the chemical mechanical polishing assembly of the integral impeller;
图2为整体叶轮化学机械抛光装配体斜二测图;Figure 2 is an oblique two-dimensional view of the chemical mechanical polishing assembly of the integral impeller;
图3为连接件零件剖视图;Figure 3 is a cross-sectional view of the connector parts;
图4为整体叶轮零件结构示意图;Figure 4 is a schematic diagram of the structure of integral impeller parts;
图5为整体叶轮叶片某点处粗糙度检测结果曲线图;Figure 5 is a curve diagram of the roughness detection result at a certain point of the integral impeller blade;
图中:1电机;2螺栓;3安装板;4定位支撑板;5底座;6塑料泡沫;7容器;8抛光液;9联轴器;10连接件;11整体叶轮;12电机安装通孔;13安装板通孔;14定位支撑板通孔;15连接件轴端;16连接件底端面;17连接件通孔;18连接件底端面凹槽;19整体叶轮大端面圆形凸台;20整体叶轮大端面螺纹孔;21整体叶轮大端面; W整体叶轮转速。 In the picture: 1 motor; 2 bolts; 3 mounting plate; 4 positioning support plate; 5 base; 6 plastic foam; 7 container; 8 polishing liquid; 9 coupling; 10 connecting piece; 11 integral impeller; 12 motor mounting through hole 13 mounting plate through hole; 14 positioning support plate through hole; 15 connecting piece shaft end; 16 connecting piece bottom end surface; 17 connecting piece through hole; 18 connecting piece bottom end surface groove; 19 integral impeller large end surface circular boss; 20 integral impeller large end face threaded hole; 21 integral impeller large end face; W integral impeller speed.
本发明的实施方式Embodiments of the invention
以下结合附图和技术方案,进一步说明本发明的具体实施方式。The specific embodiments of the present invention will be further described below with reference to the drawings and technical solutions.
下面以大端面直径为φ500mm、材料为FV520B的离心式整体叶轮为例,参照图1至图5阐述其抛光方法与抛光装置的具体实施过程:Taking the centrifugal integral impeller with a large end face diameter of φ500mm and a material of FV520B as an example, the polishing method and the specific implementation process of the polishing device are described with reference to Figures 1 to 5:
整体叶轮的抛光装置包括:电机1、螺栓2、安装板3、支撑定位板4、底座5、塑料泡沫6、容器7、联轴器9和连接件10。The polishing device of the integral impeller includes: a motor 1, a bolt 2, a mounting plate 3, a supporting and positioning plate 4, a base 5, a plastic foam 6, a container 7, a coupling 9 and a connecting piece 10.
本实例中选用一内径为φ540mm,外径为φ550mm的塑料圆桶7,将其放入铸铁底座5的圆形腔体中,该圆形腔体直径为φ570mm,在腔体和圆桶7的缝隙间填充满塑料泡沫6,底座5上还设置有与通孔14相匹配的螺纹孔。In this example, a plastic drum 7 with an inner diameter of φ540mm and an outer diameter of φ550mm is selected and placed in the circular cavity of the cast iron base 5. The diameter of the circular cavity is φ570mm. The gaps are filled with plastic foam 6, and the base 5 is also provided with threaded holes matching the through holes 14.
选用最大功率为1.5KW的三相异步电动机1,通过螺栓2将其竖直的安装固定于安装板3上,使其转轴朝下,并用联轴器9将该转轴与连接件10的一轴端15连接起来,而连接件10的底端面16则与整体叶轮的大端面21连接固定。Choose a three-phase asynchronous motor 1 with a maximum power of 1.5KW, install it vertically on the mounting plate 3 with bolts 2 so that its shaft faces downwards, and use a coupling 9 to connect the shaft to a shaft of the connecting piece 10 The ends 15 are connected, and the bottom end surface 16 of the connecting member 10 is connected and fixed to the large end surface 21 of the integral impeller.
安装板3包括两根结构相同的长方形钢板,钢板中间设有两个电机安装通孔12,两端各设有一通孔13。The mounting plate 3 includes two rectangular steel plates with the same structure, two motor mounting through holes 12 are provided in the middle of the steel plates, and a through hole 13 is provided at each end.
支撑定位板4包括两个结构相同的“L”型板,板的一水平面两端各设有一通孔14,与该面垂直的竖直面正上方两端各设有一螺纹孔,相关尺寸与安装板3上的通孔13相匹配。The supporting and positioning plate 4 includes two "L"-shaped plates with the same structure. Both ends of a horizontal plane of the plate are provided with a through hole 14, and the two ends of the vertical plane perpendicular to the surface are provided with a threaded hole. The through holes 13 on the mounting board 3 match.
连接件10包括一轴端15和一底端面16,底端面上设有三个通孔17和一圆形凹槽18;轴端15的外径尺寸与电机1转轴相同,圆形凹槽18及通孔17的相关尺寸与整体叶轮11大端面21上的圆形凸台19及螺纹孔20相匹配。The connecting piece 10 includes a shaft end 15 and a bottom end surface 16. The bottom end surface is provided with three through holes 17 and a circular groove 18; the outer diameter of the shaft end 15 is the same as the shaft of the motor 1, the circular groove 18 and The relevant size of the through hole 17 matches the circular boss 19 and the threaded hole 20 on the large end face 21 of the integral impeller 11.
整体叶轮的化学机械抛光方法,其具体操作步骤如下:The chemical mechanical polishing method of integral impeller, its specific operation steps are as follows:
1)启动电机1,并将叶轮转速 W设置为6rpm。 1) Start motor 1 and set the impeller speed W to 6rpm.
2)准备好粒径为1000μm、150μm、45μm的碳化硅磨料,将这三种粒径的磨料等体积混合。2) Prepare silicon carbide abrasives with particle sizes of 1000 μm, 150 μm, and 45 μm, and mix the three abrasives with equal volume.
3)配制好化学抛光液;抛光液中各组分具体为:质量分数为65 wt%的硝酸溶液在抛光液中的体积分数为4%,质量分数为30 wt%的双氧水溶液在抛光液中的体积分数为5%,质量分数为10 wt%的壬基酚聚氧乙烯醚溶液在抛光液中的体积分数为0.5%,剩余体积比为去离子水,同时添加质量分数为85 wt%的磷酸溶液调节抛光液溶液pH,使之为1.2。3) Prepare the chemical polishing solution; the components in the polishing solution are specifically: the volume fraction of the 65% by weight nitric acid solution in the polishing solution is 4%, and the 30% by weight hydrogen peroxide solution in the polishing solution The volume fraction of the nonylphenol polyoxyethylene ether solution with a mass fraction of 5% and a mass fraction of 10 wt% in the polishing liquid is 0.5%, the remaining volume ratio is deionized water, and the mass fraction is 85 wt% The phosphoric acid solution adjusts the pH of the polishing liquid solution to 1.2.
4)向容器7中缓慢地同时添加步骤2)、步骤3)已准备好的磨料与化学抛光液,直至混合抛光液8将整体叶轮11完全浸没;其中磨料与化学抛光液的体积比为4:3。4) Slowly add step 2) and step 3) the prepared abrasive and chemical polishing liquid to the container 7 until the mixed polishing liquid 8 completely immerses the integral impeller 11; the volume ratio of the abrasive to the chemical polishing liquid is 4 : 3.
5)磨料和化学抛光液添加完毕后,提高电机1的转速,使整体叶轮旋转速度 W为78rpm。 5) After the abrasive and chemical polishing liquid are added, increase the rotation speed of the motor 1 to make the overall impeller rotation speed W 78rpm.
6)抛光80min后,关闭电机1,将整体叶轮11拆卸下来,用无水乙醇清洗干净,并吹干,完成整个抛光过程。6) After polishing for 80 minutes, turn off the motor 1, disassemble the integral impeller 11, clean it with absolute ethanol, and blow dry to complete the entire polishing process.
7)采用粗糙度仪对整体叶轮叶片抛光表面粗糙度进行测量,本实例中,测量结果为Ra0.4~0.7μm,如图5所示为整体叶轮叶片表面某点处粗糙度检测结果曲线图Ra0.502μm。7) Use a roughness meter to measure the roughness of the polished surface of the integral impeller blade. In this example, the measurement result is Ra0.4~0.7μm. As shown in Figure 5, the roughness test result curve at a certain point on the surface of the integral impeller blade Ra0.502μm.
本说明书实施例所述的内容仅仅是对发明构思的实现形式的列举,本发明的保护范围不应当被视为仅限于实施例所陈述的具体形式,本发明的保护范围也包括本领域技术人员根据本发明构思所能够想到的等同技术手段。The content described in the embodiments of this specification is merely an enumeration of the realization forms of the inventive concept. The protection scope of the present invention should not be regarded as limited to the specific forms stated in the embodiments. The protection scope of the present invention also includes those skilled in the art. Equivalent technical means conceivable according to the inventive concept.

Claims (2)

  1. 一种整体叶轮(11)的化学机械抛光装置,其特征在于,所述的化学机械抛光装置包括电机(1)、螺栓(2)、安装板(3)、定位支撑板(4)、底座(5)、塑料泡沫(6)、容器(7)、抛光液(8)、联轴器(9)、连接件(10)、整体叶轮(11)、电机安装通孔(12)、安装板通孔(13)、定位支撑板通孔(14)、轴端(15)、底端面(16)、连接件通孔(17)和底端面凹槽(18);A chemical mechanical polishing device for an integral impeller (11), characterized in that the chemical mechanical polishing device includes a motor (1), a bolt (2), a mounting plate (3), a positioning support plate (4), and a base ( 5), plastic foam (6), container (7), polishing liquid (8), coupling (9), connecting piece (10), integral impeller (11), motor mounting through hole (12), mounting plate through Hole (13), positioning support plate through hole (14), shaft end (15), bottom end surface (16), connector through hole (17) and bottom end surface groove (18);
    所述电机(1)的转轴朝下穿过安装板(3),并确保电机(1)竖直安装固定于安装板(3)上;电机(1)的转轴通过联轴器(9)与连接件(10)的一轴端连接,连接件(10)的另一端与整体叶轮(11)的大端面连接固定;The shaft of the motor (1) passes through the mounting plate (3) downwards, and it is ensured that the motor (1) is vertically installed and fixed on the mounting plate (3); the shaft of the motor (1) is connected to the mounting plate (3) through a coupling (9) One shaft end of the connecting piece (10) is connected, and the other end of the connecting piece (10) is connected and fixed with the large end surface of the integral impeller (11);
    所述安装板(3)包括2根结构相同的长方形钢板,其通过定位支撑板(4)固定在底座(5)上;钢板上开有4个孔,其中间2个为电机安装通孔(12),实现电机(1)的定位安装;钢板两端设有一安装板通孔(13),实现钢板的定位安装;The mounting plate (3) includes two rectangular steel plates with the same structure, which are fixed on the base (5) through the positioning support plate (4); the steel plate has four holes, two of which are motor mounting through holes ( 12) To realize the positioning and installation of the motor (1); a mounting plate through hole (13) is provided at both ends of the steel plate to realize the positioning and installation of the steel plate;
    所述支撑定位板(4)包括2个结构相同的“L”型板,一支板的表面开有定位支撑板通孔(14),实现支撑定位板(4)固定在底座(5)上;另一支板上开有与安装板通孔(13)匹配的螺纹孔,实现安装板(3)的安装; The supporting and positioning plate (4) includes two "L"-shaped plates with the same structure, and a positioning supporting plate through hole (14) is opened on the surface of one plate, so that the supporting and positioning plate (4) is fixed on the base (5) ; There is a threaded hole matching the through hole (13) of the mounting plate on the other support plate to realize the installation of the mounting plate (3);
    所述连接件(10)包括轴端(15)和底端面(16),二者为一体结构,连接件(10)的截面为“倒T”型;连接件(10)底端面上设有周边的不少于3个连接件通孔(17)和中间的底端面凹槽(18);轴端(15)外径与电机转轴相同,底端面凹槽(18)及连接件通孔(17)的尺寸与整体叶轮大端面圆形凸台(19)及整体叶轮大端面螺纹孔(20)分别相匹配;The connecting piece (10) includes a shaft end (15) and a bottom end surface (16), which are an integral structure, and the cross section of the connecting piece (10) is an "inverted T" shape; the bottom end surface of the connecting piece (10) is provided with There are no less than 3 connecting part through holes (17) on the periphery and the bottom end surface groove (18) in the middle; the outer diameter of the shaft end (15) is the same as the motor shaft, the bottom end surface groove (18) and the connecting part through hole ( 17) The size of the integral impeller large end circular boss (19) and the integral impeller large end threaded hole (20) respectively match;
    所述底座(5)上设有凹型腔体和螺纹孔,其中凹型腔体的内切圆直径大于或等于容器(7)的外接圆直径,螺纹孔与定位支撑板通孔(14)相匹配;The base (5) is provided with a concave cavity and threaded holes, wherein the diameter of the inscribed circle of the concave cavity is greater than or equal to the diameter of the circumscribed circle of the container (7), and the threaded hole matches the through hole (14) of the positioning support plate ;
    所述容器(7)内表面具有耐腐蚀性,容器的内切圆直径应大于被抛光整体叶轮(11)的最大端面外径;The inner surface of the container (7) has corrosion resistance, and the diameter of the inscribed circle of the container should be larger than the maximum end surface outer diameter of the polished integral impeller (11);
    所述容器放置于底座(5)的凹型腔体内,且在两者缝隙间填满塑料泡沫(6)。The container is placed in the concave cavity of the base (5), and the gap between the two is filled with plastic foam (6).
  2. 一种整体叶轮(11)的化学机械抛光方法,其特征在于,包括以下步骤:A chemical mechanical polishing method for an integral impeller (11) is characterized in that it comprises the following steps:
    (1)低速启动电机:使整体叶轮(11)转速控制在5~9rpm;(1) Start the motor at low speed: control the speed of the integral impeller (11) at 5-9rpm;
    (2)准备好磨料,磨料包括氧化铝磨粒、碳化硅磨粒、碳化硼磨粒中的一种或两种以上混合,磨粒粒径包括1000μm、150μm、45μm中的一种或两种以上混合;(2) Prepare the abrasive. The abrasive includes one or more of alumina abrasive grains, silicon carbide abrasive grains, and boron carbide abrasive grains. The abrasive grain size includes one or two of 1000μm, 150μm, and 45μm. Mix of the above;
    (3)配制好化学抛光液:抛光液包括氧化剂、表面活性剂、pH调节剂和去离子水;其中氧化剂包括65 wt%硝酸溶液和/或30 wt%双氧水溶液,其在抛光液中体积占比为5~12%;表面活性剂为10 wt%壬基酚聚氧乙烯醚溶液,其在抛光液中体积占比为0.1~0.5%;pH调节剂为85 wt%磷酸溶液和/或40 wt%氢氟酸溶液,调节抛光液pH调为0.5~3;(3) Prepare a chemical polishing liquid: the polishing liquid includes an oxidant, a surfactant, a pH regulator and deionized water; the oxidant includes a 65 wt% nitric acid solution and/or a 30 wt% hydrogen peroxide solution, which accounts for the volume of the polishing solution The ratio is 5-12%; the surfactant is a 10 wt% nonylphenol polyoxyethylene ether solution, and its volume ratio in the polishing liquid is 0.1~0.5%; the pH adjuster is 85 wt% phosphoric acid solution and/or 40 wt% hydrofluoric acid solution, adjust the polishing liquid pH to 0.5~3;
    (4)向容器中缓慢地同时添加步骤2)、步骤3)中准备好的磨料和化学抛光液;磨料和化学抛光液混合后,需将整体叶轮(11)完全浸没,其中化学抛光液与磨料的体积比控制在1:1~2;(4) Slowly add the abrasive and chemical polishing liquid prepared in step 2) and step 3) to the container at the same time; after the abrasive and chemical polishing liquid are mixed, the integral impeller (11) needs to be completely immersed, where the chemical polishing liquid and The volume ratio of abrasive is controlled at 1:1~2;
    (5)磨料和化学抛光液添加完毕后,提高电机转速,使整体叶轮(11)旋转速度控制在60~110rpm,抛光60~90min后,关闭电机,将整体叶轮(11)拆卸下来,用无水乙醇清洗干净,并吹干,完成整个抛光过程。(5) After the abrasive and chemical polishing solution are added, increase the motor speed to control the rotation speed of the integral impeller (11) at 60~110rpm. After polishing for 60~90min, turn off the motor and disassemble the integral impeller (11). Clean with water and ethanol and blow dry to complete the entire polishing process.
PCT/CN2019/093669 2019-06-28 2019-06-28 Chemical-mechanical polishing method and polishing device for integral impeller WO2020258244A1 (en)

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CN106826529A (en) * 2017-03-03 2017-06-13 浙江佳力科技股份有限公司 Centrifugal pump impeller waterpower sanding apparatus

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JP2002046056A (en) * 2000-08-02 2002-02-12 Kia Motors Corp Apparatus for deburring workpiece
CN101092552A (en) * 2006-06-23 2007-12-26 天津晶岭电子材料科技有限公司 Grinding fluid for silicon wafer
WO2010023226A1 (en) * 2008-08-29 2010-03-04 Snecma Method of polishing bladed disks (blisks) for a turbomachine and polishing device
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