WO2020257136A1 - High side current monitor - Google Patents
High side current monitor Download PDFInfo
- Publication number
- WO2020257136A1 WO2020257136A1 PCT/US2020/037838 US2020037838W WO2020257136A1 WO 2020257136 A1 WO2020257136 A1 WO 2020257136A1 US 2020037838 W US2020037838 W US 2020037838W WO 2020257136 A1 WO2020257136 A1 WO 2020257136A1
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- WIPO (PCT)
- Prior art keywords
- voltage
- signal
- current
- low
- adjusted signal
- Prior art date
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
- G01R19/0092—Arrangements for measuring currents or voltages or for indicating presence or sign thereof measuring current only
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/146—Measuring arrangements for current not covered by other subgroups of G01R15/14, e.g. using current dividers, shunts, or measuring a voltage drop
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/202—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices using Hall-effect devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R23/00—Arrangements for measuring frequencies; Arrangements for analysing frequency spectra
- G01R23/16—Spectrum analysis; Fourier analysis
- G01R23/165—Spectrum analysis; Fourier analysis using filters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
- G01R27/26—Measuring inductance or capacitance; Measuring quality factor, e.g. by using the resonance method; Measuring loss factor; Measuring dielectric constants ; Measuring impedance or related variables
- G01R27/2605—Measuring capacitance
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/50—Testing of electric apparatus, lines, cables or components for short-circuits, continuity, leakage current or incorrect line connections
- G01R31/52—Testing for short-circuits, leakage current or ground faults
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
- H01L21/6833—Details of electrostatic chucks
Definitions
- the present invention relates generally to monitoring power, and more particularly, to a method and apparatus for monitoring current provided to a load.
- electrostatic chucks are used to support workpieces (e.g., wafers) in a variety of processing systems.
- a deposition system for example, an electrostatic chuck may be used to clamp a wafer in place while a thin film is deposited on the wafer.
- an electrostatic chuck may be used to clamp a wafer in place while material is being chemically etched from the wafer.
- Electrostatic chucks use electrostatic force to hold the workpiece in place.
- An electrostatic chuck has electrodes that are energized with a clamping voltage, which electrostatically clamps the workpiece to the surface of the electrostatic chuck.
- the electrodes in the electrostatic chuck are coupled to an electrostatic power supply and a controller.
- the electrostatic power supply receives the control signal from the controller and generates a clamping voltage adapted to clamp the substrate with a clamping force.
- Proper positioning of the workpiece relative to the electrostatic chuck is important at various times before, during, and after typical workpiece processes. For example, it is important to ensure that a workpiece is properly loaded onto the electrostatic chuck before applying the clamping voltage. As another example, it may be desirable to determine whether the workpiece is clamped or unclamped at certain times.
- the electrostatic power supply may include a direct current (DC) voltage generator configured to generate a DC clamping voltage for the clamping electrode assembly of the electrostatic chuck and an alternating current (AC) voltage generator configured to generate an AC signal.
- DC direct current
- AC alternating current
- the position of the workpiece may be detected by monitoring a capacitance of a combination of the workpiece and the electrostatic chuck. For example, when the workpiece is properly positioned on the electrostatic chuck, the sensed capacitance may be higher than when the workpiece is not properly positioned.
- the varying level of current provided to the electrostatic chuck (in response to the application of the AC voltage) enables the capacitance of the electrostatic chuck to be monitored, and as a consequence, the position of the workpiece may be monitored by monitoring the current provided to the electrostatic chuck.
- Prior art approaches to monitoring current typically utilize a shunt resistor on a return side (between the electrostatic chuck and ground) of the electrostatic chuck power supply because the output side needs to operate in the range of thousands of volts.
- Low side sensing avoids the problems of isolating the high voltage from the measurement output but often at the expense of noise.
- High side current sensing avoids the problem of noise but requires a means of isolation. Isolation amplifiers are available that can separate the high voltage output of the electrostatic chuck power supply from the measured signal, but unfortunately, isolation amplifiers typically have a lot of electrical noise that limits the lowest possible resolution of the system.
- An aspect may be characterized as a current monitor that includes a high- voltage side configured to obtain a signal indicative of current through a conductor and apply different levels of gain to different frequency bands of the signal to produce an adjusted signal.
- a low-voltage side is electrically isolated from the high-voltage side and configured to split the adjusted signal to produce a plurality of output signals wherein each of the plurality of output signals is indicative of a level of current at one of the different frequency bands.
- An isolation amplifier is configured to communicate the adjusted signal from the high-voltage side to the low-voltage side while electrically isolating the high-voltage side from the low- voltage side.
- Another aspect is a method for monitoring current that comprises obtaining a signal indicative of current through a conductor, splitting the signal into at least two frequency bands to obtain at least two high-voltage-side signals, and separately applying gain to each of the at least two high-voltage- side signals.
- the at least two high-voltage-side signals are combined to produce an adjusted signal that is communicated to a low-voltage-side via a galvanically isolated path.
- the adjusted signal is split on the low-voltage-side into at least two frequency bands to obtain at least two output signals, and one or more of the at least two output signals is used to monitor the current in the conductor.
- Yet another aspect is a system for current monitoring comprising a power supply configured to apply a voltage to an electrostatic chuck that includes a direct current (DC) component and an alternating current (AC) component.
- the system also comprises a current monitor that comprises means for obtaining a signal indicative of current through a conductor that couples the power supply to the electrostatic chuck.
- the system also comprises means for splitting the signal into at least two frequency bands to obtain at least two high-voltage-side signals, means for separately applying gain to each of the at least two high-voltage-side signals, and means for combining the at least two high-voltage- side signals to produce an adjusted signal.
- the system comprises means for communicating the adjusted signal to a low-voltage- side via a galvanically isolated path, and the low-voltage-side comprises means for splitting the adjusted signal on the low-voltage-side into at least two frequency bands to obtain at least two output signals.
- the system also comprises means for using one or more of the at least two output signals to monitor the current in the conductor.
- FIG. 1 illustrates a block diagram depicting an exemplary environment in which a high side current monitor may be utilized
- FIG. 2 is a block diagram depicting an exemplary embodiment of the high side current monitor depicted in FIG. 1 ;
- FIG. 3 is a flowchart depicting a method that may be traversed in connection with embodiments disclosed herein;
- FIG. 4 is a block diagram depicting processing components that may be utilized in connection with embodiments disclosed herein. DETAILED DESCRIPTION
- the electrostatic chucking system 100 includes an electrostatic chuck power supply 102, a high side current monitor 103, and an electrostatic chuck 104.
- the electrostatic chuck 104 is positioned within a plasma processing chamber 106, and a workpiece 110 is shown clamped to the electrostatic chuck 104.
- a workpiece position module 107 that is configured to provide an indication of a position of the workpiece 110 based upon current measured by the high side current monitor 103.
- the plasma processing chamber 106 may be realized by chambers of substantially conventional construction (e.g., including a vacuum enclosure which is evacuated by a pump or pumps (not shown)). And, as one of ordinary skill in the art will appreciate, the plasma excitation in the plasma processing chamber 106 may be achieved by any one of a variety of sources including, for example, a helicon type plasma source, which includes magnetic coil and antenna to ignite and sustain a plasma 114 in the reactor, and a gas inlet may be provided for introduction of a gas into the plasma processing chamber 106.
- a helicon type plasma source which includes magnetic coil and antenna to ignite and sustain a plasma 114 in the reactor
- a gas inlet may be provided for introduction of a gas into the plasma processing chamber 106.
- the workpiece 110 to be treated (e.g., a semiconductor wafer), is supported at least in part by the electrostatic chuck 104, and power is applied to the electrostatic chuck 104 via one or more conductors (e.g., cables).
- conductors e.g., cables
- a single conductor 116 is shown coupled the electrostatic chuck 104, but it should be recognized that aspects described herein are applicable to monopolar chucks and multipolar chucks.
- six power lines and six corresponding high side current monitors may be employed in connection with a hexapolar electrostatic chuck.
- the electrostatic chuck power supply 102 may be realized by any of a variety of known, or yet to be developed, power supplies that are capable of applying a voltage that includes DC and AC components.
- the electrostatic chuck power supply 102 may be capable of applying 1000 volts DC and 10 to 20 volts AC (peak-to-peak) at 1kHz, but these voltages and frequency are exemplary only and may vary depending upon the many factors.
- the DC voltage effectuates a DC clamping voltage at the electrostatic chuck 104 that draws the workpiece 110 to the electrostatic chuck while the AC voltage may be utilized to detect a position of the workpiece 110 relative to the electrostatic chuck 104.
- FIG. 2 shown is an exemplary high side current monitor 203 that may be used to realize the high side current monitor 103 shown in FIG. 1.
- a shunt impedance, Z is disposed along a conduction path that includes a conductor 216 that couples a power source such as the electrostatic chuck power supply 102 to a node, vl, on one side of the shunt impedance, Z.
- the conduction path also includes the shunt impedance, Z, and another portion of the conductor 216 that couples another side of the shunt impedance, Z, at node v2 to the electrostatic chuck 104.
- the shunt impedance, Z is disposed in a current path from a power source (e.g., the electrostatic chuck power supply 102) to a load (e.g., the electrostatic chuck 104).
- the voltage across the shunt impedance, Z, (between nodes vl and v2) varies with the current provided to the electrostatic chuck 104; thus, the voltage between nodes vl and v2 may be used as a signal that is indicative of the current provided to the electrical load (e.g., the electrostatic chuck 104).
- a first lead 220 is coupled to the node vl and a second lead 221 is coupled to the node v2.
- the signal (indicative of the current) in obtained in the embodiment of FIG. 2 by coupling the leads 220, 221 across the shunt impedance, Z, positioned in a current path of the conductor 216.
- the voltage applied to vl may be about 1000 VDC and the voltage at v2 is a floating ground, which is a local reference that varies with the output voltage of a power source (such as the electrostatic chuck power supply 102).
- the floating ground at v2 may be about 1 volt different than the voltage applied at node vl.
- the shunt impedance, Z is a complex quantity that includes resistive and reactive components, but in many implementations, the shunt impedance, Z, may be implemented as a resistor with a reactance that is substantially zero.
- the shunt impedance, Z may be realized by a 100-ohm resistor, and a full-scale current through the shunt impedance, Z, may be 10 milliamps.
- the voltage across the shunt impedance, Z may be about 1 volt or less. Because the voltage differential between vl and v2 is due to the current, a positive voltage at vl relative to v2 indicates current is going into the electrostatic chuck 104.
- the shunt impedance, Z is only one way to sense and obtain a signal indicative of current through the conductor 216 and that there are several other ways to sense current such as, for example, Hall effect sensors, fluxgate sensors, and transformers.
- the node, vl is coupled to a high-voltage-side band splitter 218 via the lead 220, and the high-voltage- side band splitter 218 is coupled to a gain component 222, which is coupled to a summer 224.
- the output of the summer 224 is coupled to a high-voltage side of an isolation amplifier 226, and a low-voltage side of the isolation amplifier 226 is coupled to a low- voltage-side band splitter 228, which provides a plurality of output signals including first output signal 230 and a second output signal 232.
- a filter and gain amplifier may be implemented by a common operational amplifier (op-amp) or may be implemented by separate physical components.
- op-amp operational amplifier
- the depicted functions may be implemented by hardware or a combination of hardware and software.
- the isolation amplifier 226 functions to galvanically isolate the high-voltage side of the current monitor 203 from the low- voltage side of the current monitor 203 while allowing signal information to be passed across a barrier without any ohmic path between input and output.
- Isolation can be implemented using an all-analog isolation amplifier.
- a subcircuit comprised of a non-isolated amplifier followed by an analog-to-digital converter and isolator (which may use optical, capacitive, magnetic principles) may be utilized.
- An isolated power supply that is independent of the electrostatic chuck power supply 102 may be used to power the components of the isolation amplifier.
- the isolation amplifier 226 may be realized by an isolation amplifier identified by part No. IS0224ADWVR sold by Texas Instruments, Inc, which may be powered by an isolated power supply identified by part No. NMS0515C sold by Murata Manufacturing Co., Ltd., but it should be recognized that other parts from other sources may be utilized to realize, and provide power to, the isolation amplifier 226.
- FIG. 3 is a flowchart depicting an exemplary method that may be traversed in connection with the embodiment depicted in FIG. 2.
- a power source such as the electrostatic chuck power supply 102
- a load such as the electrostatic chuck 104
- the current through the shunt impedance, Z will create a voltage signal at the vl node, which is indicative of the level of current flowing through the shunt impedance, Z (Block 304).
- the voltage signal (also referred to herein more simply as a signal) is provided to the high- voltage-side band splitter 218 and then split into at least two frequency bands by the high-voltage-side band splitter 218 to obtain at least two high-voltage-side signals (Block 306).
- the high- voltage-side band splitter 218 may include two or more filters and the gain component 222 may include the same number of gain amplifiers to produce two or more signals that are summed by the summer 224 to produce an adjusted voltage signal that is applied at the high voltage side of the isolation amplifier 226.
- the high-voltage side band splitter 218 includes two filters: a high pass filter 234 to pass frequencies of the signal above a first frequency (to obtain a first signal 238 for a first frequency band) and a low pass filter 236 to pass frequencies of the signal below a second frequency to obtain a second signal 240 for a second frequency band.
- the current monitor 203 depicted in FIG. 2 includes a first gain amplifier 242 to apply a first gain level to the first signal 238 and a second gain amplifier 244 to apply a second gain level to the second signal 240.
- the summer 224 is positioned and configured to combine the gain-adjusted first signal and the gain-adjusted second signal to produce an adjusted signal that is applied to the isolation amplifier 226.
- the low pass filter 236 may pass DC information below 10 Hz and the high pass filter 234 may pass AC information above 100 Hz.
- the filtering is performed in the analog domain by any of a variety of analog filtering techniques such as Sallen-Key filtering, but other types of active filtering and/or passive filtering may be used.
- the voltage signal at vl may be converted to a digital signal and then filtered, digitally amplified, and summed in the digital domain.
- the high pass filter 234, the low pass filter 236, the first gain amplifier 242, the second gain amplifier 244, and the summer 224 may be realized by digital components.
- gain is separately applied to the at least two high- side-voltage signals (Block 308).
- the first gain amplifier 242 that applies a gain equal to x is coupled to the high pass filter 234, and a second gain amplifier 244 with a gain equal to y is coupled to the low pass filter 236 (where x may be equal, or inequal, to y); thus, the DC information (e.g., below 10 Hz) and the AC information (e.g., above 100 Hz) may be separately amplified with different gain values.
- the separate amplification beneficially allows the higher-frequency band information (also referred to as AC current information) to be amplified to a much higher level to more accurately detect changes in AC current (which are indicative of changes in the capacitance of the workpiece 110 and electrostatic chuck 104).
- the amplification of the constituent components of the voltage signal is beneficially performed before the isolation amplifier 226 so that gain in subsequent stages is not required and any noise produced by the isolation amplifier 226 is not amplified further.
- the at least two high-voltage- side signals are combined by the summer 224 to produce an adjusted signal (Block 310).
- the summer 224 may also be implemented as an op-amp as one of ordinary skill in the art will appreciate.
- the isolation amplifier 226 is then used to communicate the adjusted signal from the high-voltage side to the low-voltage side while electrically isolating the high-voltage side from the low-voltage side (Block 312).
- the isolation amplifier 226 operates to separate the low- voltage side from the high-voltage side by creating galvanic isolation as is known in the art.
- the isolation amplifier 226 separates the high-voltage-side of the current monitor 203 (operating with the floating ground) from the low-voltage side of the current monitor 203 (that operates with reference to earth ground); thus, protecting the low- voltage-side from damage.
- the adjusted voltage signal on the low- voltage side (also referred to as a low- voltage- side combined signal) is split by the low- voltage-side band splitter 228 to obtain at least two low- voltage-side output signals (Block 314).
- the low- voltage-side band splitter 228 may mirror the high- voltage-side band splitter 218 with respect to the number of frequency bands that are used.
- the low- voltage-side band splitter 228 includes a high pass filter 246 and a low pass filter 248, which may have the same frequency response as the high pass filter 234 and low pass filter 236, respectively, of the high-voltage- side band splitter 218.
- the high pass filter 246 and the low pass filter 248 on the low voltage side may, or may not, be implemented using the same technology as the high pass filter 234 and a low pass filter 236 on the high-voltage-filter side.
- the one or more of the at least two low- voltage- side output signals may be used to monitor the current through the conductor 216 (Block 316).
- the monitored higher frequency current (as indicated by the first output signal 230) may be used by the workpiece position module 107 to assess a position of the workpiece 110, and the monitored lower frequency current (as indicated by the second output signal) may be used to assess leakage current in the electrostatic chuck 104.
- the DC current through the shunt impedance, Z is 10 milliamps and the impedance of the shunt impedance, Z, is 100 ohms (without any reactive component), to produce 1 volt across the shunt impedance, Z.
- the gain of y is set to be equal to 1.0 and the gain of x is set to equal 50.0.
- the low pass filter 236 will produce a voltage signal of 1 VDC and the corresponding second gain amplifier 244 will apply unity gain to produce 1 VDC.
- the isolation amplifier 226 will show 1 VDC as an output and the low pass filter 248 on the low-voltage-side will produce 1 VDC relative to earth ground.
- the gains of the high-pass and low pass processing chains may be set so that when a maximum capacitive load is observed with the maximum DC current, the rails of the isolation amplifier 226 do not exceed specifications of the isolation amplifier 226 (so clipping does not occur). This capability contrasts with prior art approaches that simply allow a setting of volts per amp. Moreover, prior art systems employ gain amplification after an isolation amplifier, which amplifies the inherent noise of the isolation amplifier.
- the relationship between capacitance and positions of workpiece may be empirically determined, and threshold capacitances may be established that are indicative of, for example, the workpiece 110 in place or the workpiece 110 in clamp.
- the threshold capacitance values may be stored in nonvolatile memory in connection with workpiece position data to enable a mapping between capacitance values and workpiece position.
- the workpiece position module 107 may use the empirically obtained data in connection with the current
- capacitance of a load may be determined based upon the time- varying AC voltage and current as follows:
- the position of the workpiece 110 may be obtained from nonvolatile memory.
- the second output signal 232 beneficially provides an indication of low frequency current through the conductor 216, which typically provides an indication of a level of low frequency (e.g., below 10 Hz) leakage current in the electrostatic chuck 104.
- a level of low frequency e.g., below 10 Hz
- the low frequency current may be below 1 Hz.
- FIG. 4 shown is a block diagram depicting physical components that may be utilized to realize one or more aspects of the high side current monitor 103 and its various embodiments (such as the current monitor 203). Moreover, the multiple instances of the computing device depicted in FIG. 4 may be implemented in the systems described herein.
- a display 1112 and nonvolatile memory 1120 are coupled to a bus 1122 that is also coupled to random access memory (“RAM”) 1124, a processing portion (which includes N processing components) 1126, a field programmable gate array (FPGA) or microcontroller! 127, and a transceiver component 1128 that includes N transceivers.
- RAM random access memory
- processing portion which includes N processing components
- FPGA field programmable gate array
- FPGA field programmable gate array
- transceiver component 1128 that includes N transceivers.
- the display 1112 generally operates to provide a user interface for a user, and in several implementations, the display 1112 is realized by a touchscreen display.
- display 1112 can be implemented as a part of the high side current monitor 103 to enable a user to control gain settings of the first gain amplifier 242 and second gain amplifier 244 and/or time constants of the high pass filter 234 and low pass filter 236.
- the display 1112 may also be utilized as a part of the workpiece position monitor to display information about the position of the workpiece 110.
- the nonvolatile memory 1120 is non-transitory memory that functions to store (e.g., persistently store) data and machine readable (e.g., processor executable) code (including executable code that is associated with effectuating the methods described herein).
- the nonvolatile memory 1120 includes bootloader code, operating system code, file system code, and non-transitory processor-executable code to facilitate the execution of the methods described with reference to FIG. 3 described above.
- the nonvolatile memory 1120 may also be used to store empirically obtained data that relates workpiece position to capacitance data.
- the nonvolatile memory 1120 is realized by flash memory (e.g., NAND or ONENAND memory), but it is contemplated that other memory types may also be utilized. Although it may be possible to execute the code from the nonvolatile memory 1120, the executable code in the nonvolatile memory is typically loaded into RAM 1124 and executed by one or more of the N processing components in the processing portion 1126.
- flash memory e.g., NAND or ONENAND memory
- the N processing components in connection with RAM 1124 may generally operate to execute the instructions stored in nonvolatile memory 1120 to realize the functionality of one or more components of embodiments of the high side current monitor 103 and/or the workpiece position module 107.
- the processing portion 1126 may include a video processor, digital signal processor (DSP), graphics processing unit (GPU), and other processing components.
- DSP digital signal processor
- GPU graphics processing unit
- a DSP may be used to effectuate the high pass filter 234, low pass filter 236, first gain amplifier 242, and second gain amplifier 244 depicted in FIG. 2.
- the field programmable gate array (FPGA) 1127 may be configured to effectuate one or more aspects of the functions and methodologies described herein.
- non-transitory FPGA-configuration- instructions may be persistently stored in nonvolatile memory 1120 and accessed by the FPGA 1127 (e.g., during boot up) to configure the FPGA 1127 to effectuate the functions of the current monitor 103.
- the input component may operate to receive signals (e.g., from the high side current monitor 103) that are indicative of the monitored current.
- the output component generally operates to provide one or more analog or digital signals to effectuate an operational aspect of components described herein. For example, if the computing device 1100 is implemented as a part of the high side current monitor 103, the output portion may transmit output signal(s) (e.g., first output signal 230 and second output signal 232) indicative of current levels to the workpiece position module 107.
- the depicted transceiver component 1128 includes N transceiver chains, which may be used for communicating with external devices via wireless or wireline networks.
- Each of the N transceiver chains may represent a transceiver associated with a particular communication scheme (e.g., WiFi, Ethernet, Profibus, etc.).
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- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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Abstract
Description
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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CN202080051937.5A CN114127910A (en) | 2019-06-17 | 2020-06-16 | High side current monitor |
JP2021574958A JP2022536936A (en) | 2019-06-17 | 2020-06-16 | High side current monitor |
EP20825717.0A EP3984062A4 (en) | 2019-06-17 | 2020-06-16 | High side current monitor |
KR1020227001560A KR20220024621A (en) | 2019-06-17 | 2020-06-16 | High Side Current Monitor |
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US201962862459P | 2019-06-17 | 2019-06-17 | |
US62/862,459 | 2019-06-17 |
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WO2020257136A1 true WO2020257136A1 (en) | 2020-12-24 |
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PCT/US2020/037838 WO2020257136A1 (en) | 2019-06-17 | 2020-06-16 | High side current monitor |
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US (2) | US11280811B2 (en) |
EP (1) | EP3984062A4 (en) |
JP (1) | JP2022536936A (en) |
KR (1) | KR20220024621A (en) |
CN (1) | CN114127910A (en) |
TW (1) | TW202102861A (en) |
WO (1) | WO2020257136A1 (en) |
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US11804362B2 (en) * | 2018-12-21 | 2023-10-31 | Advanced Energy Industries, Inc. | Frequency tuning for modulated plasma systems |
US11280811B2 (en) | 2019-06-17 | 2022-03-22 | Advanced Energy Industries, Inc. | High side current monitor |
US12038464B2 (en) * | 2021-03-17 | 2024-07-16 | Advanced Energy Industries, Inc. | Capacitance sensing systems and methods |
Citations (5)
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US20200400719A1 (en) | 2020-12-24 |
US12019099B2 (en) | 2024-06-25 |
TW202102861A (en) | 2021-01-16 |
EP3984062A1 (en) | 2022-04-20 |
KR20220024621A (en) | 2022-03-03 |
JP2022536936A (en) | 2022-08-22 |
US20220244294A1 (en) | 2022-08-04 |
EP3984062A4 (en) | 2023-07-19 |
CN114127910A (en) | 2022-03-01 |
US11280811B2 (en) | 2022-03-22 |
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