WO2020255609A1 - Photoelectric conversion element - Google Patents

Photoelectric conversion element Download PDF

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WO2020255609A1
WO2020255609A1 PCT/JP2020/019867 JP2020019867W WO2020255609A1 WO 2020255609 A1 WO2020255609 A1 WO 2020255609A1 JP 2020019867 W JP2020019867 W JP 2020019867W WO 2020255609 A1 WO2020255609 A1 WO 2020255609A1
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group
photoelectric conversion
conversion element
organic semiconductor
compound
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PCT/JP2020/019867
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French (fr)
Japanese (ja)
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崇 倉田
良樹 今西
紅里 山上
光 田中
一剛 萩谷
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東洋紡株式会社
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Priority to JP2020552924A priority Critical patent/JPWO2020255609A1/ja
Publication of WO2020255609A1 publication Critical patent/WO2020255609A1/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80Constructional details
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G61/00Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
    • C08G61/12Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells

Definitions

  • the present invention has a photoelectric conversion element having a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer has a polymer compound having a specific benzobisthiazole structural unit and a specific structure.
  • the present invention relates to a photoelectric conversion element containing an aromatic compound.
  • Organic semiconductor materials are one of the most important materials in the field of organic electronics, and can be classified into electron-donating p-type organic semiconductor compounds and electron-accepting n-type organic semiconductor compounds.
  • Various semiconductor devices can be manufactured by appropriately combining such p-type organic semiconductor compounds and n-type organic semiconductor compounds.
  • Semiconductor devices include, for example, organic electroluminescence that emits light by the action of excitons (exciton) formed by the recombination of electrons and holes, organic thin-film transistor cells that convert light into electric power, and organic that controls current and voltage. It is used in organic electronic devices such as thin film transistors.
  • An example of an organic semiconductor material used in an organic electronic device is disclosed in, for example, Patent Document 1.
  • Patent Document 1 contains a polymer compound having a structural unit having a specific benzobisthiazole skeleton. Further, Patent Documents 2 and 3 describe a photoelectric conversion element containing a polymer compound having a specific benzobisthiazole structural unit.
  • Organic thin-film solar cells are useful for environmental conservation because they do not emit carbon dioxide into the atmosphere, and because they have a simple structure and are easy to manufacture, demand is increasing.
  • the short-circuit current density (Jsc) is known to correlate with the amount of energy received by the organic semiconductor compound.
  • the organic semiconductor compound is exposed to the visible region to the near infrared. It is necessary to absorb light in a wide wavelength range up to the region.
  • the wavelength of the light having the lowest energy is the absorption edge wavelength, and the energy corresponding to this wavelength corresponds to the band gap energy. Therefore, in order for the organic semiconductor compound to absorb light in a wide wavelength range, the energy of the bandgap [HOMO level (highest occupied orbital level) and LUMO level (lowest empty orbital level) of the p-type organic semiconductor compound) Difference] needs to be narrowed.
  • An object of the present invention is to provide a photoelectric conversion element having a high open circuit voltage (Voc) and a short circuit current density (Jsc). Another object of the present invention is to provide an organic thin film solar cell provided with the photoelectric conversion element.
  • the present invention includes the following inventions.
  • T 1 and T 2 are independently alkoxy groups, thioalkoxy groups, or thiophene rings that may be substituted with a hydrocarbon group or an organosilyl group.
  • a thiazole ring optionally substituted with a hydrocarbon group or an organosilyl group, or even if substituted with a hydrocarbon group, an organosilyl group, an alkoxy group, an thioalkoxy group, a trifluoromethyl group, or a halogen atom.
  • B 1 and B 2 each independently represent a thiophene ring which may be substituted with a hydrocarbon group, a thiazole ring which may be substituted with a hydrocarbon group, or an ethynylene group. ..
  • R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom.
  • R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl.
  • T 1 and T 2 are independent groups represented by any of the following formulas (t1) to (t5). Wherein (t1) ⁇ formula (t5), R 13, R 14 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
  • R 15 and R 16 each independently represent a hydrocarbon group having 6 to 30 carbon atoms or a group represented by * -Si (R 18 ) 3 .
  • Each of R 17 independently contains a hydrocarbon group having 6 to 30 carbon atoms, * -Si (R 18 ) 3 , * -OR 19 , * -SR 20 , * -CF 3 , or a halogen atom.
  • n1 represents an integer of 1 to 3
  • n2 represents an integer of 1 or 2
  • n3 represents an integer of 1 to 5
  • a plurality of R 15s may be the same or different
  • a plurality of R 16s may be the same or different.
  • Multiple R 17s may be the same or different.
  • Each of R 18 independently represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different.
  • R 19 and R 20 each independently represent a hydrocarbon group having 6 to 30 carbon atoms. * Represents a bond.
  • B 1 and B 2 are independent groups represented by any of the following formulas (b1) to (b3).
  • R 21 and R 22 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
  • n4 represents an integer of 0 to 2
  • n5 represents 0 or 1
  • a plurality of R 21s may be the same or different.
  • [4] The photoelectric conversion element according to any one of [1] to [3], wherein the polymer compound containing the benzobisthiazole structural unit represented by the formula (1) is a donor-acceptor type semiconductor polymer compound. .. [5]
  • the photoelectric conversion element according to any one of [1] to [4] which has an electron transport layer between the cathode and the active layer.
  • the photoelectric conversion element of the present invention has a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer is a specific polymer compound having a specific benzobisthiazole structural unit. It contains an aromatic compound having a structure.
  • Voc open circuit voltage
  • Jsc short-circuit current density
  • FIG. 1 is a schematic view showing an embodiment of a photoelectric conversion element of the present invention.
  • FIG. 2 is a schematic view showing another embodiment of the photoelectric conversion element of the present invention.
  • the present inventors have been diligently studying with the aim of increasing the energy conversion efficiency PCE of the photoelectric conversion element by improving both the open circuit voltage (Voc) and the short-circuit current density (Jsc).
  • the photoelectric conversion element according to the present invention is a photoelectric conversion element having a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer is a benzobis represented by the following formula (1).
  • Polymer compound having a thiazole structural unit [hereinafter, may be referred to as polymer compound (1). ]
  • an aromatic compound represented by the following formula (2) hereinafter, may be referred to as an aromatic compound (2).
  • And / or an aromatic compound represented by the following formula (3) [hereinafter, may be referred to as an aromatic compound (3). ]
  • T 1 and T 2 are independently alkoxy groups, thioalkoxy groups, or thiophene rings that may be substituted with a hydrocarbon group or an organosilyl group.
  • a thiazole ring optionally substituted with a hydrocarbon group or an organosilyl group, or even if substituted with a hydrocarbon group, an organosilyl group, an alkoxy group, an thioalkoxy group, a trifluoromethyl group, or a halogen atom. Represents a good phenyl group.
  • B 1 and B 2 each independently represent a thiophene ring which may be substituted with a hydrocarbon group, a thiazole ring which may be substituted with a hydrocarbon group, or an ethynylene group. .. ]
  • R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
  • R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
  • the photoelectric conversion element according to the present invention has a structure in which a cathode, an active layer, and an anode are arranged in this order, and one embodiment of the present invention will be specifically described with reference to the drawings.
  • the photoelectric conversion element according to the present invention is not limited to the configuration shown in the drawings.
  • FIG. 1 is a schematic view showing an embodiment of the photoelectric conversion element of the present invention, and shows a configuration example of a photoelectric conversion element used in a general organic thin film solar cell.
  • the photoelectric conversion element (I) shown in FIG. 1 has a structure in which a cathode (electrode) (C), an active layer (X), and an anode (electrode) (A) are arranged in this order.
  • the base material (B) is arranged on one side of the cathode (C)
  • the active layer (X) is arranged on the other side of the cathode (C).
  • the photoelectric conversion element (I) shown in FIG. 1 has an electron transport layer (E) between the cathode (C) and the active layer (X), and has an anode (A) and an active layer (X). It has a hole transport layer (H) between the two. Therefore, in the embodiment shown in FIG. 1, the base material (B), the cathode (C), the electron transport layer (E) as the buffer layer, the active layer (X), and the hole transport layer (H) as the buffer layer. ) And the anode (A) are arranged in this order.
  • FIG. 2 is a schematic view showing another embodiment of the photoelectric conversion element of the present invention, and shows a configuration example of the photoelectric conversion element used in a general organic thin film solar cell.
  • the photoelectric conversion element (II) shown in FIG. 2 has a structure in which a cathode (electrode) (C), an active layer (X), and an anode (electrode) (A) are arranged in this order.
  • the base material (B) is arranged on one side of the anode (A)
  • the active layer (X) is arranged on the other side of the anode (A).
  • the photoelectric conversion element (II) shown in FIG. 2 has an electron transport layer (E) between the cathode (C) and the active layer (X), and has an anode (A) and an active layer (X). It has a hole transport layer (H) between the two. Therefore, in the embodiment shown in FIG. 2, the base material (B), the anode (A), the hole transport layer (H) as the buffer layer, the active layer (X), and the electron transport layer (E) as the buffer layer. ) And the cathode (C) are arranged in this order. Each of these parts will be described below.
  • the active layer (X) refers to a layer on which photoelectric conversion is performed.
  • the photoelectric conversion element receives light, the light is absorbed by the active layer (X), and the interface between the p-type organic semiconductor compound and the n-type organic semiconductor compound. Electricity is generated at, and the generated electricity is taken out from the cathode (C) and the anode (A).
  • the active layer (X) is a polymer compound [polymer compound (1)] having a benzobisthiazole structural unit represented by the above formula (1) and an aromatic compound represented by the above formula (2). It contains [aromatic compound (2)] and / or an aromatic compound represented by the above formula (3) [aromatic compound (3)].
  • the polymer compound (1) is a p-type organic semiconductor compound, and the aromatic compound (2) and the aromatic compound (3) are n-type organic semiconductor compounds.
  • the active layer (X) may contain one kind of polymer compound [polymer compound (1)] having a benzobisthiazole structural unit represented by the above formula (1), or may contain two or more kinds. May be good. Further, the active layer (X) may further contain an organic semiconductor compound having no benzobisthiazole structural unit represented by the above formula (1) as the p-type organic semiconductor compound.
  • the organic semiconductor compound having no benzobisthiazole structural unit represented by the above formula (1) may be hereinafter referred to as an organic semiconductor compound (11).
  • the active layer (X) may contain either the aromatic compound (2) or the aromatic compound (3), or the aromatic compound (2) and the aromatic compound (3). It may contain both of the above, and it is preferable to contain either the aromatic compound (2) or the aromatic compound (3). Further, the active layer (X) may further contain an n-type organic semiconductor compound other than the aromatic compound (2) or the aromatic compound (3).
  • the film thickness of the active layer (X) is not particularly limited, but is preferably 70 nm or more and 1000 nm or less, for example. By setting the film thickness of the active layer (X) to 70 nm or more, improvement in the energy conversion efficiency PCE of the photoelectric conversion element can be expected. Further, by setting the film thickness of the active layer (X) to 70 nm or more, a through-short circuit in the film can be prevented.
  • the film thickness of the active layer (X) is preferably 70 nm or more, more preferably 90 nm or more, and further preferably 100 nm or more.
  • the active layer (X) is thick as described above, the region capable of absorbing light increases, but it is difficult to transport the electric charge generated by the light absorption, so that the energy conversion efficiency PCE is lowered. Therefore, by setting the film thickness of the active layer (X) to 1000 nm or less, the distance between the electrodes is not too large, the charge diffusion is good, and the internal resistance of the active layer (X) is also reduced.
  • the film thickness of the active layer (X) is preferably 1000 nm or less, more preferably 750 nm or less, and further preferably 500 nm or less. Further, by setting the film thickness of the active layer (X) to 70 nm or more and 1000 nm or less, the reproducibility in the process of producing the active layer (X) is further improved. Further, it is preferable that the film thickness of the active layer (X) is 70 nm or more and 500 nm or less because the open circuit voltage (Voc) can be secured in addition to the improvement of the energy conversion efficiency PCE.
  • the layer structure of the active layer (X) includes a thin film laminated type in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are laminated, or a layer in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are mixed. Bulk heterojunction type and the like can be mentioned. Of these, a bulk heterojunction type active layer is preferable because the energy conversion efficiency PCE can be further improved.
  • the bulk heterojunction type active layer has a layer in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are mixed (hereinafter, may be referred to as i-layer).
  • the i-layer has a structure in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are phase-separated, carrier separation occurs at the phase interface, and the generated carriers (holes and electrons) are transported to the electrode.
  • the content of the polymer compound (1) is preferably 50% by mass or more, more preferably 70% by mass or more, and further preferably 90% by mass. % Or more, most preferably 100% by mass. Since the polymer compound (1) has properties suitable as a p-type organic semiconductor compound, it is most preferable to contain only the polymer compound (1) as the p-type organic semiconductor compound contained in the i-layer.
  • the mass ratio of the p-type organic semiconductor compound to the n-type organic semiconductor compound in the i-layer improves the energy conversion efficiency PCE by obtaining a good phase-separated structure. From the viewpoint of the above, 0.2 or more is preferable, 0.5 or more is more preferable, 1 or more is more preferable, 5 or less is preferable, 4 or less is more preferable, 3 or less is more preferable, and 2 or less is particularly preferable. is there.
  • the i-layer can be formed by any method including a coating method and a vapor deposition method (for example, a co-evaporation method), but it is preferable to use the coating method because the i-layer can be formed more easily.
  • the polymer compound (1) is preferable because it has good solubility in a solvent and is excellent in coating film-forming property.
  • a coating liquid containing a p-type organic semiconductor compound and an n-type organic semiconductor compound may be prepared and the coating liquid may be applied.
  • the coating liquid containing the p-type organic semiconductor compound and the n-type organic semiconductor compound may be prepared by preparing a solution containing the p-type organic semiconductor compound and a solution containing the n-type organic semiconductor compound, and then mixing them. It may be prepared by dissolving a p-type organic semiconductor compound and an n-type organic semiconductor compound in a solvent.
  • the total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound in the coating liquid is not particularly limited, but is 1.0 with respect to the entire coating liquid from the viewpoint of forming the active layer (X) having a sufficient thickness. It is preferably 4.0% by mass or more, and preferably 4.0% by mass or less with respect to the entire coating liquid from the viewpoint of sufficiently dissolving the semiconductor compound.
  • any method can be used as the coating method, for example, spin coating method, inkjet method, doctor blade method, drop casting method, reverse roll coating method, gravure coating method, kiss coating method, roll brushing method, spray coating method, etc.
  • Examples include the air knife coating method, the wire barber coating method, the pipe doctor method, the impregnation / coating method, the curtain coating method, and the flexo coating method.
  • a drying treatment such as heating may be performed.
  • the solvent of the coating liquid is not particularly limited as long as it can uniformly dissolve the p-type organic semiconductor compound and the n-type organic semiconductor compound, and is, for example, an aliphatic such as hexane, heptane, octane, isooctane, nonane, or decane.
  • Hydrocarbons such as toluene, xylene, mesityrene, indan, tetraline, cyclohexylbenzene, chlorobenzene, or orthodichlorobenzene; fats such as cyclopentane, cyclohexane, methylcyclohexane, cycloheptane, cyclooctane, or decalin Cyclic hydrocarbons; lower alcohols such as methanol, ethanol, propanol, or anisole; aliphatic ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), cyclopentanone, or cyclohexanone; acetophenone, or propiophenone Aromatic ketones such as; esters such as ethyl acetate, isopropyl acetate, butyl acetate, or methyl lactate; halogen hydrocarbons such as
  • aromatic hydrocarbons such as toluene, xylene, mesitylene, tetraline, cyclohexylbenzene, chlorobenzene, or orthodichlorobenzene; alicyclics such as cyclopentane, cyclohexane, methylcyclohexane, cycloheptane, cyclooctane, or decalin.
  • hydrocarbons such as acetone, methyl ethyl ketone, cyclopentane, or cyclohexanone; or ethers such as ethyl ether, tetrahydrofuran, or dioxane.
  • an additive may be added to the coating liquid containing the p-type organic semiconductor compound and the n-type organic semiconductor compound.
  • the phase-separated structure of the p-type organic semiconductor compound and the n-type organic semiconductor compound in the bulk heterojunction type active layer is used in the light absorption process, exciton diffusion process, exciton dissociation (carrier separation) process, carrier transport process, etc. Affects Therefore, it is considered that good energy conversion efficiency PCE can be realized by optimizing the phase separation structure of the p-type organic semiconductor compound and the n-type organic semiconductor compound in the bulk heterojunction type active layer.
  • an active layer having a preferable phase separation structure can be obtained, and the energy conversion efficiency PCE can be improved. Conceivable.
  • the additive is preferably a solid or a liquid having a high boiling point in that it is not easily lost from the active layer (X).
  • the melting point (1 atm) of the additive is usually preferably 35 ° C. or higher, more preferably 50 ° C. or higher, still more preferably 80 ° C. or higher, and particularly preferably 150 ° C. or higher. Most preferably, it is 200 ° C. or higher.
  • the upper limit of the melting point is, for example, preferably 400 ° C. or lower, more preferably 350 ° C. or lower, still more preferably 300 ° C. or lower.
  • the solid additive include aliphatic hydrocarbons having 10 or more and 20 or less carbon atoms, aromatic compounds having 10 or more and 20 or less carbon atoms which may have a substituent, and the like, and have a substituent.
  • Aromatic compounds having 10 or more and 20 or less carbon atoms which may be used are preferable.
  • Specific examples of the aromatic compound include naphthalene compounds, and a compound in which a substituent of 1 to 8 is bonded to naphthalene is particularly preferable.
  • Substituents bonded to naphthalene include halogen atom, hydroxyl group, cyano group, amino group, amide group, carbonyloxy group, carboxyl group, carbonyl group, oxycarbonyl group, silyl group, alkenyl group, alkynyl group and alkoxy group. , Aryloxy group, alkylthio group, arylthio group or aromatic group.
  • the boiling point (1 atm) of the additive is preferably 80 ° C. or higher, more preferably 100 ° C. or higher, and further preferably 150 ° C. or higher.
  • the upper limit of the boiling point is, for example, preferably 300 ° C. or lower, more preferably 250 ° C. or lower, still more preferably 200 ° C. or lower.
  • the liquid additive include aliphatic hydrocarbons having 8 to 9 carbon atoms and aromatic compounds having 8 to 9 carbon atoms which may have a substituent.
  • Specific examples of the aliphatic hydrocarbons include dihalogen hydrocarbon compounds, and compounds in which a substituent of 1 to 8 is bonded to octane are particularly preferable.
  • Substituents bonded to octane include halogen atoms, hydroxyl groups, thiol groups, alkoxy groups, thioalkoxy groups, cyano groups, amino groups, amide groups, carbonyloxy groups, carboxyl groups, carbonyl groups, or aromatic groups.
  • aromatic compound include benzene, which includes a halogen atom, a hydroxyl group, a thiol group, an alkoxy group, a thioalkoxy group, a cyano group, an amino group, an amide group, a carbonyloxy group, a carboxyl group, or a carbonyl group.
  • a benzene compound having a substituent such as, or a benzene compound in which 4 or more and 6 or less halogen atoms are bonded is preferable. More specifically, anisole; a benzene compound substituted with one or more alkoxy groups such as 2-methoxytoluene, 3-methoxytoluene, 4-methoxytoluene, 2,5-dimethylanisole and an alkyl group; thioanisole; Ethylphenyl sulfide; 4- (methylthio) toluene and its positional isomers; 2-methoxythioanisole and its positional isomers; methoxynaphthalene positional isomers such as 1-methoxynaphthalene and 2-methoxynaphthalene; 1,4-dimethoxynaphthalene , 1,6-Dimethoxynaphthalene, 1,7-dimethoxynaphthalene, 2,3-dimethoxynaphthalen
  • the additive is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and 10% by mass or more, based on the total mass of the coating liquid containing the p-type organic semiconductor compound and the n-type organic semiconductor compound. It is preferably 5% by mass or less, more preferably 5% by mass or less. When the amount of the additive is in this range, a preferable phase separation structure can be obtained.
  • the active layer (X) contains a polymer compound (1) as a p-type organic semiconductor compound.
  • the polymer compound (1) is a p-type organic semiconductor compound, and may be referred to as a benzobisthiazole structural unit represented by the following formula (1) (hereinafter, referred to as a “structural unit represented by the formula (1)”. .).
  • the polymer compound (1) has a benzobisthiazole structural unit represented by the above formula (1), the band gap can be narrowed while deepening the HOMO level, and the energy conversion efficiency PCE can be improved. It is advantageous.
  • the polymer compound (1) is preferably a donor-acceptor type semiconductor polymer compound obtained by copolymerizing a benzobisthiazole structural unit represented by the above formula (1) with a copolymerization component (12) described later.
  • the donor-acceptor type semiconductor polymer compound means a polymer compound in which donor units and acceptor units are alternately arranged.
  • a donor unit means an electron-donating structural unit
  • an acceptor-like unit means an electron-accepting structural unit.
  • the donor-acceptor type semiconductor polymer compound is preferably a polymer compound in which the structural unit represented by the formula (1) and the copolymerization component (12) described later are alternately arranged. With such a structure, it can be suitably used as a p-type organic semiconductor compound.
  • T 1 and T 2 are independently an alkoxy group, a thioalkoxy group, a thiophene ring, or a thiazole ring, respectively.
  • the thiophene ring may be substituted with a hydrocarbon group or an organosilyl group
  • the thiazole ring may be substituted with a hydrocarbon group or an organosilyl group
  • the phenyl group may be a hydrocarbon group, an organosilyl group, It may be substituted with an alkoxy group, a thioalkoxy group, a trifluoromethyl group, or a halogen atom.
  • the halogen atom any of fluorine, chlorine, bromine and iodine can be used.
  • the organosilyl group means a monovalent group in which one or more hydrocarbon groups are substituted for Si atoms, and the number of hydrocarbon groups substituted for Si atoms is preferably two or more, preferably three. More preferred.
  • the T 1 and T 2 may be the same or different from each other, but are preferably the same from the viewpoint of easy production.
  • the T 1 and T 2 are preferably groups represented by any of the following formulas (t1) to (t5) independently. That is, the alkoxy group represented by T 1 and T 2 is preferably the group represented by the following formula (t 1), and the thioalkoxy group represented by T 1 and T 2 is represented by the following formula (t 2). preferably a group represented, preferably a group represented by the following formula (t3) as thiophene ring represented by T 1, T 2, the following formula is a thiazole ring represented by T 1, T 2
  • the group represented by (t4) is preferable, and the phenyl group represented by T 1 and T 2 is preferably the group represented by the following formula (t 5).
  • T 1 and T 2 are groups represented by any of the following formulas (t1) to (t5), they can absorb light having a short wavelength and have high flatness, which is efficient. Since ⁇ - ⁇ stacking is formed in, the energy conversion efficiency PCE can be further improved.
  • R 13, R 14 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
  • R 15 and R 16 each independently represent a hydrocarbon group having 6 to 30 carbon atoms or a group represented by * -Si (R 18 ) 3 .
  • Each of R 17 independently contains a hydrocarbon group having 6 to 30 carbon atoms, * -Si (R 18 ) 3 , * -OR 19 , * -SR 20 , * -CF 3 , or a halogen atom. Represent.
  • n1 represents an integer of 1 to 3
  • n2 represents an integer of 1 or 2
  • n3 represents an integer of 1 to 5
  • a plurality of R 15s may be the same or different
  • a plurality of R 16s may be the same or different
  • Multiple R 17s may be the same or different.
  • Each of R 18 independently represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different.
  • R 19 and R 20 each independently represent a hydrocarbon group having 6 to 30 carbon atoms. * Represents a bond.
  • the number of carbon atoms of the hydrocarbon group represented by R 13 to R 17 is preferably 6 to 30, more preferably 8 to 25, still more preferably 8 to 20, and particularly preferably 8 to 16.
  • hydrocarbon group represented by R 13 to R 17 include an alkyl group having 6 carbon atoms such as an n-hexyl group; an alkyl group having 7 carbon atoms such as an n-heptyl group; and n-octyl.
  • Alkyl group Alkyl group; n-tridecyl group, 1-n-pentyloctyl group, 2-n-pentyloctyl group, 1-n-butylnonyl group, 2-n-butylnonyl group, 1-methyldodecyl group, 2-methyldodecyl group
  • Such as an alkyl group having 13 carbon atoms n-tetradecyl group, 1-n-heptyl heptyl group, 1-n-hexyl octyl group, 2-n-hexyl octyl group, 1-n-pentyl nonyl group, 2-n- 14-carbon alkyl group such as pentyl-nonyl group; 15-carbon alkyl group such as n-pentadecyl group, 1-n-heptyloctyl group, 1-n-hexylnonyl group, 2-n-hexylnonyl group; n -
  • the polymer compound (1) has improved solubility in an organic solvent and has appropriate crystallinity.
  • the hydrocarbon group represented by R 13 to R 17 is particularly preferably a branched chain alkyl group having 8 to 16 carbon atoms.
  • R 18 in the * -Si (R 18) 3 of the groups represented by R 15 ⁇ R 17 are each independently of 1 to 20 carbon atoms aliphatic hydrocarbon It represents a group or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different.
  • R 15 to R 17 are groups represented by * -Si (R 18 ) 3 , the solubility of the polymer compound (1) in an organic solvent is improved.
  • the halogen atom represented by R 17 is preferably fluorine, chlorine, bromine or iodine.
  • the number of carbon atoms of the aliphatic hydrocarbon group represented by R 18 is preferably 1 to 18, and more preferably 1 to 8.
  • Examples of the aliphatic hydrocarbon group represented by R 18 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, an isobutyl group, an n-pentyl group and a tert-.
  • Pentyl group isopentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, 2-octylbutyl
  • Examples thereof include a group, an n-tridecyl group, an n-tetradecyl group, an n-pentadecyl group, an n-hexadecyl group, a 2-hexadecyl group, an n-heptadecyl group and an octadecyl group.
  • the number of carbon atoms of the aromatic hydrocarbon group represented by R 18 is preferably 6 to 8, more preferably 6 or 7, and particularly preferably 6.
  • Examples of the aromatic hydrocarbon group represented by R 18 include a phenyl group and the like.
  • R 18 is preferably an aliphatic hydrocarbon group having 1 to 20 carbon atoms, more preferably a branched aliphatic hydrocarbon group having 1 to 20 carbon atoms, and particularly preferably an isopropyl group.
  • the plurality of R 18s may be the same or different, but are preferably the same.
  • the groups of * -Si (R 18 ) 3 represented by R 15 to R 17 are specifically trimethylsilyl groups, ethyldimethylsilyl groups, and isopropyldimethylsilyl groups.
  • Alkylsilyl groups such as groups, triisopropylsilyl groups, tert-butyldimethylsilyl groups, triethylsilyl groups, triisobutylsilyl groups, tripropylsilyl groups, tributylsilyl groups, dimethylphenylsilyl groups, methyldiphenylsilyl groups; triphenylsilyl groups.
  • Examples thereof include an arylsilyl group such as a tert-butylchlorodiphenylsilyl group; and the like. Of these, an alkylsilyl group is preferable, and a trimethylsilyl group or a triisopropylsilyl group is particularly preferable.
  • R 19 or R 20 in the group * -O-R 19 or * -S-R 20 represented by R 17 are each independently a hydrocarbon group having 6 to 30 carbon atoms
  • the hydrocarbon group having 6 to 30 carbon atoms the group exemplified as the hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 can be preferably used.
  • the plurality of R 15s may be the same or different, but are preferably the same.
  • n1 is preferably 1 or 2, more preferably 1.
  • the plurality of R 16s may be the same or different, but are preferably the same.
  • n2 is preferably 1.
  • the plurality of R 17s may be the same or different, but are preferably the same.
  • n3 is preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.
  • an electron donating group or an electron attracting group can be used.
  • the electron donating group include a group represented by any of the formulas (t1) to (t3).
  • * represents a bond that binds to the thiazole ring of the benzobisthiazole structural unit.
  • R 13 to R 15 represent the same groups as described above.
  • n1 is synonymous with the above.
  • the group represented by the above formula (t1) or the above formula (t3) is more preferable, and the above formula is more preferable from the viewpoint of excellent flatness as a whole structural unit represented by the above formula (1).
  • the group represented by (t3) is more preferable, and the group represented by the following formulas (t3-1) to (t3-16) is particularly preferable.
  • * represents a bond.
  • Examples of the electron-attracting group include a group represented by the following formula (t4) or the following formula (t5).
  • * represents a bond that binds to the thiazole ring of the benzobisthiazole structural unit.
  • R 16 and R 17 represent the same groups as described above. n2 and n3 are synonymous with the above.
  • B 1 and B 2 independently represent a thiophene ring, a thiazole ring, or an ethynylene group.
  • the thiophene ring may be substituted with a hydrocarbon group, and the thiazole ring may be substituted with a hydrocarbon group.
  • the above B 1 and B 2 may be the same or different from each other, but are preferably the same from the viewpoint of easy production.
  • B 1 and B 2 are preferably groups represented by any of the following formulas (b1) to (b3) independently. That is, the thiophene ring represented by B 1 and B 2 is preferably a group represented by the following formula (b 1), and the thiazole ring represented by B 1 and B 2 is represented by the following formula (b 2).
  • the group represented by the following formula (b3) is preferable as the ethynylene group represented by B 1 and B 2 .
  • the benzobisthiazole structural unit represented by the above formula (1) as a whole is excellent in flatness and can be obtained.
  • the polymer compound (1) as a whole has excellent flatness.
  • B 1 and B 2 are groups represented by the following formulas (b1) and (b2)
  • an interaction between S atoms and N atoms occurs in the benzobisthiazole structural unit, and the flatness is further improved. improves.
  • the energy conversion efficiency PCE can be further increased.
  • R 21 and R 22 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
  • n4 represents an integer of 0 to 2
  • n5 represents 0 or 1
  • * Represents a bond
  • * on the left represents a bond that binds to the benzene ring of the benzobisthiazole structural unit.
  • R 21 and R 22 are hydrocarbon groups having 6 to 30 carbon atoms because the energy conversion efficiency PCE may be further enhanced.
  • the hydrocarbon group having 6 to 30 carbon atoms represented by R 21 and R 22 is a hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 above.
  • the group exemplified as the hydrogen group can be preferably used.
  • the plurality of R 21s may be the same or different, but are preferably the same.
  • n4 is preferably 0 or 1, more preferably 0. When n4 is 0, it is preferable because the donor-acceptor type semiconductor polymer can be easily formed.
  • n5 is preferably 0. When n5 is 0, it is preferable because the donor-acceptor type semiconductor polymer can be easily formed.
  • benzobisthiazole structural unit represented by the above formula (1) include structural units represented by the following formulas (1-1) to (1-48).
  • the polymer compound containing the benzobisthiazole structural unit represented by the above formula (1) is preferably a donor-acceptor type semiconductor polymer compound.
  • the copolymerization component (12) for forming the donor-acceptor type semiconductor polymer compound in combination with the benzobisthiazole structural unit represented by the above formula (1).
  • the polymerization component (12) may be a donor unit or an acceptor unit.
  • Specific examples of the copolymerization component (12) include the following structural units.
  • R 30 to R 81 each independently represent a group similar to the hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 , and A 30 , A 31 independently represent the same groups as T 1 and T 2, and are specifically substituted with an alkoxy group, a thioalkoxy group, a hydrocarbon group or an organosilyl group, respectively.
  • It may be a thiophene ring, a thiazole ring which may be substituted with a hydrocarbon group or an organosilyl group, a hydrocarbon group, an organosilyl group, an alkoxy group, a thioalkoxy group, a trifluoromethyl group, or Represents a phenyl group that may be substituted with a halogen atom.
  • j represents an integer from 0 to 4.
  • represents a bond that binds to B 1 or B 2 of the benzobisthiazole structural unit represented by the formula (1).
  • the group represented by the above formula (c33) may act as an acceptor unit or a donor unit depending on the types of A 30 and A 31 .
  • the ratio of the structural unit represented by the formula (1) in the polymer compound (1) to the repeating unit of the copolymerization component (12) is not particularly limited, but is usually preferably 1 mol% or more. It is preferably 5 mol% or more, more preferably 15 mol% or more, and particularly preferably 30 mol% or more. On the other hand, it is usually preferably 99 mol% or less, more preferably 95 mol% or less, still more preferably 85 mol% or less, and particularly preferably 70 mol% or less.
  • the ratio of the structural unit represented by the formula (1) to the repeating unit of the copolymerization component (12) is the molecular weight of the structural unit represented by the formula (1) and the structure represented by the formula (1). It may be calculated based on the molecular weight of the copolymerization component (12) that copolymerizes with the unit.
  • the arrangement state of the benzobisthiazole structural unit represented by the formula (1) and the copolymerization component (12) may be alternating, blocked or random. That is, the polymer compound (1) may be any of an alternating copolymer, a block copolymer, and a random copolymer, and more preferably an alternating copolymer.
  • the benzobisthiazole structural unit represented by the formula (1) and the copolymerization component (12) may each contain only one type. Further, two or more kinds of benzobisthiazole structural units represented by the above formula (1) may be contained, and two or more kinds of copolymerization component (12) may be contained.
  • the type of the benzobisthiazole structural unit and the copolymerization component (12) represented by the above formula (1) is not limited, but is usually preferably 8 or less, and more preferably 5 or less. Particularly preferably, it is a polymer compound (1) containing one of the benzobisthiazole structural units represented by the formula (1) and one of the copolymerization components (12) alternately, and most preferably. It is a polymer compound (1) containing only one type of structural unit represented by the formula (1) and only one type of copolymerization component (12) alternately.
  • RT is an n-octyl group, a 2-ethylhexyl group, a 3,7-dimethyloctyl group, a 2-n-butyloctyl group, a 2-n-hexyldecyl group, a 2-n-octyldodecyl group.
  • 2-n-decyltetradecyl group triisopropylsilyl group.
  • R 43 represents an n-octyl group, a 2-ethylhexyl group, a 3,7-dimethyloctyl group, a 2-n-butyloctyl group, and a 2-n-hexyldecyl group.
  • the ratio of the number of each repeating unit is arbitrary.
  • the polymer compound (1) preferably has absorption in a long wavelength region (600 nm or more). Further, the photoelectric conversion element using the polymer compound (1) exhibits a high open circuit voltage (Voc) and a high energy conversion efficiency PCE.
  • the polymer compound (1) is a p-type organic semiconductor compound, and the aromatic compound represented by the formula (2) described later and / or the aromatic compound represented by the formula (3) is an n-type organic semiconductor compound. When combined, they exhibit particularly high energy conversion efficiency PCE.
  • the polymer compound (1) has an advantage that the HOMO energy level is low and it is difficult to be oxidized. Further, since the polymer compound (1) exhibits high solubility in a solvent, it has an advantage that coating film formation is easy.
  • the range of selection of the solvent is widened when the coating film is formed, a solvent more suitable for the film formation can be selected, and the film quality of the formed active layer can be improved. This is also considered to be one of the reasons why the photoelectric conversion element using the polymer compound (1) exhibits high energy conversion efficiency PCE.
  • the weight average molecular weight (Mw) of the polymer compound (1) is generally preferably 2000 or more and 500,000 or less, and more preferably 3000 or more and 200,000 or less.
  • the number average molecular weight (Mn) of the polymer compound (1) is generally preferably 2000 or more and 500,000 or less, and more preferably 3000 or more and 200,000 or less.
  • the weight average molecular weight (Mw) and number average molecular weight (Mn) of the polymer compound (1) can be calculated based on a calibration curve prepared by using gel permeation chromatography and polystyrene as a standard sample.
  • the maximum light absorption wavelength ( ⁇ max) of the polymer compound (1) is preferably 400 nm or more, more preferably 450 nm or more, while usually 1200 nm or less, more preferably 1000 nm or less, still more preferably 900 nm or less. is there.
  • the half width is usually preferably 10 nm or more, more preferably 20 nm or more, and usually 300 nm or less. Further, it is desirable that the absorption wavelength region of the polymer compound (1) is closer to the absorption wavelength region of sunlight.
  • the solubility of the polymer compound (1) is not particularly limited, but the solubility in chlorobenzene at 25 ° C. is usually 0.1% by mass or more, more preferably 0.4% by mass or more, still more preferably 0.8% by mass. % Or more, on the other hand, usually 30% by mass or less, more preferably 20% by mass or less. High solubility is preferable in that the active layer can be formed thicker.
  • the polymer compound (1) is preferably one that interacts between molecules.
  • the interaction between molecules means that the distance between polymer chains is shortened due to the interaction of ⁇ - ⁇ stacking between molecules of the polymer compound and the like. The stronger the interaction, the higher the carrier mobility and / or crystallinity of the polymeric compound tends to be. That is, since charge transfer between molecules is likely to occur in a polymer compound that interacts between molecules, a p-type organic semiconductor compound (polymer compound (1)) and an n-type organic semiconductor compound in the active layer (X) It is considered that the holes generated at the interface with and can be efficiently transported to the anode (A).
  • the polymer compound (1) can be produced by coupling a compound having a benzobisthiazole structural unit represented by the formula (1) with the following copolymer component (12).
  • the compound having the benzobisthiazole structural unit represented by the above formula (1) can be produced, for example, by the method described in International Publication No. WO2016 / 132917.
  • the coupling reaction between the compound having the benzobisthiazole structural unit represented by the above formula (1) and the following copolymer component (12) may be carried out in the presence of a metal catalyst. That is, it can be carried out by reacting a compound having a benzobisthiazole structural unit represented by the above formula (1) with any of the compounds represented by the following formulas (C1) to (C45).
  • the polymer compound (1) thus obtained becomes a donor-acceptor type polymer compound.
  • R 30 to R 81 independently represent groups similar to the hydrocarbon groups having 6 to 30 carbon atoms represented by R 13 to R 17 , and A 30 , A 31 independently represent the same groups as T 1 and T 2, and are specifically substituted with an alkoxy group, a thioalkoxy group, a hydrocarbon group or an organosilyl group, respectively.
  • It may be a thiophene ring, a thiazole ring which may be substituted with a hydrocarbon group or an organosilyl group, a hydrocarbon group, an organosilyl group, an alkoxy group, a thioalkoxy group, a trifluoromethyl group, or Represents a phenyl group that may be substituted with a halogen atom.
  • j represents an integer from 0 to 4.
  • X represents a halogen atom.
  • the active layer (X) contains the polymer compound (1) as a p-type organic semiconductor compound, and further does not have the benzobisthiazole structural unit represented by the formula (1). ) May be contained. That is, the polymer compound (1) and the organic semiconductor compound (11) may be mixed and / or laminated to form the active layer (X).
  • the organic semiconductor compound (11) that can be used in combination will be described below.
  • the organic semiconductor compound (11) may be a high molecular weight organic semiconductor compound or a low molecular weight organic semiconductor compound, but a high molecular weight organic semiconductor compound is preferable.
  • organic semiconductor compound (11) examples include conjugated copolymer semiconductor compounds such as polythiophene, polyfluorene, polyphenylene vinylene, polythienylene vinylene, polyacetylene and polyaniline; copolymers such as oligothiophene substituted with an alkyl group or other substituents. Semiconductor compounds; copolymer semiconductor compounds obtained by copolymerizing two or more kinds of monomer units; and the like.
  • Conjugated copolymers include, for example, Handbook of Control Polymers, 3rd Ed. (2 volumes in total), 2007, J. Mol. Polymer. Sci. Part A: Polym. Chem. 2013, 51, 743-768, J. Mol. Am. Chem. Soc. 2009,131,13886-13887, Angew.Chem. Int. Ed. 2013, 52, 8341-8344, Adv. Mater. Copolymers that can be synthesized by combining the copolymers and derivatives thereof described in known literature such as 2009, 21, 2093-2097, and the monomers described can be used.
  • the organic semiconductor compound (11) may be one kind of compound or a mixture of a plurality of kinds of compounds. By using the organic semiconductor compound (11), it is expected that the amount of absorbance will increase due to the addition of the absorption wavelength band.
  • Specific examples of the organic semiconductor compound (11) include, but are not limited to, the following.
  • the HOMO (maximum occupied orbital) energy level of the p-type organic semiconductor compound is not particularly limited and can be selected depending on the type of the n-type organic semiconductor compound described later.
  • the lower limit of the HOMO energy level of the p-type organic semiconductor compound is usually set. It is preferably ⁇ 7 eV or higher, more preferably ⁇ 6.5 eV or higher, and particularly preferably ⁇ 6.2 eV or higher.
  • the upper limit of the HOMO energy level is usually preferably -4.0 eV or less, more preferably -4.5 eV or less, and particularly preferably -5.1 eV or less.
  • the HOMO energy level of the p-type organic semiconductor compound is -6.2 eV or more, the characteristics as a p-type semiconductor are improved, and the HOMO energy level of the p-type organic semiconductor compound is -5.1 eV or less.
  • the stability of the p-type organic semiconductor compound is improved, and the open circuit voltage (Voc) is also improved.
  • the LUMO (minimum empty orbit) energy level of the p-type organic semiconductor compound is not particularly limited and can be selected depending on the type of the n-type organic semiconductor compound described later.
  • the LUMO energy level of the p-type organic semiconductor compound is usually -4. It is preferably .5 eV or more, more preferably -4.3 eV or more.
  • the LUMO energy level of the p-type organic semiconductor compound is ⁇ 4.5 eV or more, electron transfer to the n-type organic semiconductor compound is likely to occur, and the short-circuit current density (Jsc) is improved.
  • the upper limit of the LUMO energy level is usually preferably ⁇ 2.5 eV or less, more preferably ⁇ 2.7 eV or less.
  • the band gap is adjusted, long-wavelength light energy can be effectively absorbed, and the short-circuit current density (Jsc) is improved.
  • the method for calculating the LUMO energy level and the HOMO energy level include a method of theoretically calculating the calculated value and a method of actually measuring the LUMO energy level.
  • Examples of the method for theoretically calculating the calculated value include a semi-empirical molecular orbital method and an ab initio molecular orbital method.
  • Examples of the actual measurement method include an ultraviolet-visible absorption spectrum measurement method or a method of measuring the ionization potential with an ultraviolet photoelectron analyzer (“AC-3” manufactured by RIKEN Keiki Co., Ltd.) under normal temperature and pressure. Among them, it is preferable to measure using an ultraviolet photoelectron analyzer, and in the present invention, "AC-3" manufactured by RIKEN KEIKI is used as the ultraviolet photoelectron analyzer.
  • the active layer (X) is an aromatic compound [aromatic compound (2)] represented by the following formula (2) and / or an aromatic compound [fragrance] represented by the following formula (3).
  • Group compound (3)] is contained.
  • the aromatic compound (2) and the aromatic compound (3) are both n-type organic semiconductor compounds.
  • the speed and efficiency are increased. Charge separation is possible.
  • the aromatic compound (2) is a compound represented by the following formula (2).
  • R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or benzene. It is a ring or represents a thiophene ring.
  • the benzene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom
  • the thiophene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom.
  • the alkyl group represented by R 101 to R 116 and the alkyl group substituted with the benzene ring or thiophene ring represented by R 101 to R 116 are preferably hydrocarbon groups having 1 to 10 carbon atoms, and are hydrocarbons. The group may be linear or may have a branch.
  • the alkoxy group represented by R 101 to R 116 and the alkoxy group substituted with the benzene ring or the thiophene ring represented by R 101 to R 116 are some carbons of the hydrocarbon group having 1 to 10 carbon atoms. A group in which is replaced with oxygen is preferable.
  • the thioalkoxy group represented by R 101 to R 116 and the thioalkoxy group substituted with the benzene ring or thiophene ring represented by R 101 to R 116 are one of the hydrocarbon groups having 1 to 10 carbon atoms. A group in which the carbon of the portion is replaced with sulfur is preferable.
  • Each of R 101 to R 116 is independently a hydrogen atom, an alkyl group, a fluorine atom, or a benzene ring substituted with an alkyl group, an alkoxy group, or a thioalkoxy group.
  • a thiophene ring substituted with an alkyl group is preferable, and a benzene ring substituted with a hydrogen atom or an alkyl group is particularly preferable.
  • the aromatic compound (3) is a compound represented by the following formula (3).
  • R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or benzene. It is a ring or represents a thiophene ring.
  • the benzene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom
  • the thiophene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom.
  • the alkyl group represented by R 201 to R 214 and the alkyl group substituted with the benzene ring or the thiophene ring represented by R 201 to R 214 are preferably hydrocarbon groups having 1 to 10 carbon atoms, and are hydrocarbons. The group may be linear or may have a branch.
  • the alkoxy group represented by R 201 to R 214 and the alkoxy group substituted with the benzene ring or the thiophene ring represented by R 201 to R 214 are carbons of a part of the hydrocarbon groups having 1 to 10 carbon atoms. A group in which is replaced with oxygen is preferable.
  • the thioalkoxy group represented by R 201 to R 214 and the thioalkoxy group substituted with the benzene ring or thiophene ring represented by R 201 to R 214 are one of the hydrocarbon groups having 1 to 10 carbon atoms. A group in which carbon in the portion is replaced with sulfur is preferable.
  • R 201 to R 214 are independently substituted with an alkyl group, an alkyl group, an alkoxy group, a fluorine atom, an alkyl group, an alkoxy group, or a thioalkoxy group, respectively.
  • a benzene ring is preferable, and a benzene ring which is a hydrogen atom or is substituted with an alkyl group is more preferable.
  • the energy conversion efficiency PCE tends to be higher when the aromatic compound (2) is used as the n-type organic semiconductor compound. It is preferable because there is.
  • the active layer (X) contains the aromatic compound (2) and / or the aromatic compound (3) as an n-type organic semiconductor compound, and further contains the aromatic compound (2) and the aromatic compound.
  • An n-type organic semiconductor compound other than the sex compound (3) may be contained.
  • the active layer (X) may be formed by mixing and / or laminating the aromatic compound (2) and / or the aromatic compound (3) and the n-type organic semiconductor compound.
  • the n-type organic semiconductor compound that can be used in combination will be described below.
  • the n-type organic semiconductor compound may be a high molecular weight organic semiconductor compound or a low molecular weight organic semiconductor compound, but a high molecular weight organic semiconductor compound is preferable.
  • the lowest empty orbital (LUMO) level is generally -3.5 to -4.5 eV.
  • a ⁇ -electron conjugated compound such as a ⁇ -electron conjugated compound, for example, a ⁇ -electron conjugated compound containing a thiophene ring and a benzene ring, fullerene or a derivative thereof, octaazaporphyrin, etc., in which the hydrogen atom of a p-type organic semiconductor compound is replaced with a fluorine atom.
  • Aromatic carboxylic acid anhydrides such as perfluoro compounds (for example, perfluoropentacene and perfluorophthalocyanine), naphthalenetetracarboxylic acid anhydrides, naphthalenetetracarboxylic acid diimides, perylenetetracarboxylic acid anhydrides, and perylenetetracarboxylic acid diimides and the like.
  • perfluoro compounds for example, perfluoropentacene and perfluorophthalocyanine
  • naphthalenetetracarboxylic acid anhydrides naphthalenetetracarboxylic acid diimides
  • perylenetetracarboxylic acid anhydrides perylenetetracarboxylic acid diimides and the like.
  • Examples thereof include polymer compounds containing an imidized product as a skeleton.
  • fullerenes or derivatives thereof are preferable because they can perform charge separation from the polymer compound (1) at high speed and efficiently
  • Fullerenes and their derivatives include C60 fullerenes, C70 fullerenes, C76 fullerenes, C78 fullerenes, C84 fullerenes, C240 fullerenes, C540 fullerenes, mixed fullerenes, fullerene nanotubes, and some of these hydrogen atoms, halogen atoms, substitutions or absences.
  • Examples thereof include fullerene derivatives substituted with substituted alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cycloalkyl groups, silyl groups, ether groups, thioether groups, amino groups, silyl groups and the like.
  • phenyl-C61-butyric acid ester diphenyl-C62-bis (butyric acid ester), phenyl-C71-butyric acid ester, phenyl-C85-butyric acid ester or thienyl-C61-butyric acid ester is preferable, and the above-mentioned butyric acid ester is used.
  • the carbon number of the alcohol moiety is preferably 1 to 30, more preferably 1 to 8, still more preferably 1 to 4, and most preferably 1.
  • Examples of preferred fullerene derivatives are phenyl-C61-butyric acid methyl ester ([60] PCBM), phenyl-C61-butyric acid n-butyl ester ([60] PCBnB), phenyl-C61-butyric acid isobutyl ester ([60] PCBiB).
  • Phenyl-C61-butyric acid n-hexyl ester [60] PCBH
  • phenyl-C61-butyric acid n-octyl ester [60] PCBO
  • diphenyl-C62-bis butyric acid methyl ester) (bis [60] PCBM)
  • Phenyl-C71-butyric acid methyl ester [70] PCBM
  • phenyl-C85-butyric acid methyl ester [84] PCBM
  • thienyl-C61-butyric acid methyl ester [60] ThCBM
  • C60 pyrrolidinetrisic acid C60 pyrrolidine Trisic acid ethyl ester, N-methylfuraropyrrolidine (MP-C60), (1,2-methanoflarene C60) -61-carboxylic acid, (1,2-methanoflarene C60) -61-carboxylic acid t-butyl ester
  • the cathode (C) and anode (A) have a function of collecting holes and electrons generated by light absorption. Therefore, it is preferable to use an electrode suitable for collecting electrons [that is, a cathode (C)] and an electrode suitable for collecting holes [that is, an anode (A)] as the pair of electrodes.
  • One of the pair of electrodes may be translucent, and both may be translucent. Translucent means that 40% or more of sunlight is transmitted. Further, it is preferable that the translucent transparent electrode has a sunlight transmittance of 70% or more in order to allow the transparent electrode to pass through and allow light to reach the active layer (X). The light transmittance can be measured with a normal spectrophotometer.
  • the cathode (C) is preferably an electrode having a function of smoothly extracting electrons generated in the active layer (X).
  • the film thickness of the cathode (C) is not particularly limited, but is usually preferably 10 nm or more, more preferably 20 nm or more, and further preferably 50 nm or more. On the other hand, it is usually preferably 10 ⁇ m or less, more preferably 1 ⁇ m or less, still more preferably 500 nm or less.
  • the film thickness of the cathode (C) is 10 nm or more, the sheet resistance is suppressed, and when the film thickness of the cathode (C) is 10 ⁇ m or less, the light is efficiently transferred to electricity without lowering the light transmittance. Can be converted.
  • the sheet resistance of the cathode (C) is not particularly limited, but is usually preferably 1 ⁇ / sq or more, while it is preferably 1000 ⁇ / sq or less, more preferably 500 ⁇ / sq or less, and further preferably 100 ⁇ / sq or less.
  • the anode (A) is preferably an electrode having a function of smoothly extracting holes generated in the active layer (X).
  • the film thickness of the anode (A) is not particularly limited, but is usually preferably 10 nm or more, more preferably 20 nm or more, and further preferably 50 nm or more. On the other hand, it is usually preferably 10 ⁇ m or less, more preferably 1 ⁇ m or less, still more preferably 500 nm or less.
  • the film thickness of the anode (A) is 10 nm or more, the sheet resistance is suppressed, and when the film thickness of the anode (A) is 10 ⁇ m or less, the light is efficiently transferred to electricity without lowering the light transmittance. Can be converted.
  • the sheet resistance of the anode (A) is not particularly limited, but is usually preferably 1 ⁇ / sq or more, while it is preferably 1000 ⁇ / sq or less, more preferably 500 ⁇ / sq or less, and further preferably 100 ⁇ / sq or less.
  • the cathode (C) and the anode (A) may have a laminated structure of two or more layers. Further, the characteristics (electrical characteristics, wet characteristics, etc.) may be improved by performing surface treatment on the cathode (C) and the anode (A).
  • the materials of the cathode (C) and the anode (A) will be described.
  • the materials of the cathode (C) and the anode (A) differ depending on the laminated structure with respect to the substrate.
  • the material of the cathode (C) when the base material is arranged on one side of the cathode (C) and the active layer (X) is arranged on the other side of the cathode (C), the material of the cathode (C).
  • the material of the cathode (C) examples include conductive metal oxides such as nickel oxide, tin oxide, indium oxide, indium tin oxide (ITO), indium-zirconium oxide (IZO), titanium oxide or zinc oxide; gold, platinum, silver, chromium. , Metals such as aluminum, magnesium or cobalt, or alloys thereof.
  • the cathode (C) has translucency.
  • the cathode (C) is a transparent electrode, it is preferable to use a translucent conductive metal oxide such as ITO, zinc oxide or tin oxide, and it is more preferable to use ITO.
  • Examples of the method for forming the cathode (C) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
  • Examples of the material of the anode (A) include metals such as platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, cesium, calcium or magnesium and their alloys; Inorganic salts such as lithium oxide and cesium fluoride; metal oxides such as nickel oxide, aluminum oxide, lithium oxide, indium tin oxide (ITO) or cesium oxide; sulfone to polythiophene, polypyrrole, polyacetylene, triphenylenediamine or polyaniline, etc.
  • metals such as platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, cesium, calcium or magnesium and their alloys
  • Inorganic salts such as lithium oxide and cesium fluoride
  • metal oxides such as nickel oxide, aluminum oxide, lithium oxide, indium tin oxide (ITO) or cesium oxide
  • sulfone to polythiophene polypyrrole
  • the anode (A) is preferably a metal electrode formed of a metal such as platinum, gold, silver, copper, iron, tin, aluminum, calcium or indium and an alloy using these metals.
  • Examples of the method for forming the anode (A) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
  • the material of the cathode (C) examples include metals such as platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, cesium, calcium or magnesium and their alloys; lithium fluoride and cesium fluoride.
  • Inorganic salts such as: nickel oxide, aluminum oxide, lithium oxide, indium tin oxide (ITO), metal oxides such as cesium oxide, and the like.
  • the cathode (C) is preferably a metal electrode formed of a metal such as platinum, gold, silver, copper, iron, tin, aluminum, calcium or indium and an alloy using these metals.
  • Examples of the method for forming the cathode (C) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
  • Examples of the material of the anode (A) include conductive metal oxides such as nickel oxide, tin oxide, indium oxide, indium tin oxide (ITO), indium-zinc oxide (IZO), titanium oxide or zinc oxide; gold. , Platinum, silver, chromium, cobalt and other metals or alloys thereof; polythiophene, polypyrrole, polyacetylene, triphenylenediamine, polyaniline and the like, and having a conductive polymer and sulfonyl group doped with sulfonic acid and / or iodine as substituents. Examples thereof include polythiophene derivatives and conductive organic compounds such as arylamine.
  • the anode (A) has translucency.
  • the anode (A) is a transparent electrode, it is preferable to use a translucent conductive metal oxide such as ITO, zinc oxide or tin oxide, and it is particularly preferable to use ITO.
  • Examples of the method for forming the anode (A) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
  • the photoelectric conversion element usually has a base material (B) as a support. That is, a cathode (C), an anode (A), and an active layer (X) are formed as electrodes on the base material (B).
  • the material of the base material (B) is not particularly limited as long as the effect of the present invention is not significantly impaired.
  • Preferable examples of the material of the base material (B) are inorganic materials such as quartz, glass, sapphire or titania; polyethylene terephthalate, polyethylene naphthalate, polyether sulfone, polyimide, nylon, polystyrene, polyvinyl alcohol, ethylene vinyl alcohol.
  • the glass include soda glass, blue plate glass, non-alkali glass and the like. Of these, non-alkali glass is preferable because there are few elution ions from the glass.
  • the shape of the base material (B) is not limited, and for example, a plate shape, a film shape, a sheet shape, or the like can be used.
  • the film thickness of the base material (B) is not limited, but is usually preferably 5 ⁇ m or more, more preferably 20 ⁇ m or more, while usually 20 mm or less, more preferably 10 mm or less. It is preferable that the film thickness of the base material (B) is 5 ⁇ m or more because the possibility that the strength of the photoelectric conversion element is insufficient is reduced. It is preferable that the film thickness of the base material (B) is 20 mm or less because the cost can be suppressed and the weight does not become heavy. In particular, when the material of the base material (B) is glass, the film thickness is usually preferably 0.01 mm or more, more preferably 0.1 mm or more, while it is usually preferably 10 mm or less, more preferably 5 mm or less.
  • the film thickness of the glass base material (B) is 0.01 mm or more because the mechanical strength increases and it becomes difficult to crack. Further, it is preferable that the film thickness of the glass base material (B) is 5 mm or less because the weight does not become heavy.
  • the photoelectric conversion element has an electron transport layer (E) as a buffer layer between the active layer (X) and the cathode (C), and holes as a buffer layer between the active layer (X) and the anode (A). It is preferable to have a transport layer (H). By providing the buffer layer, the movement of electrons or holes between the active layer (X) and the cathode (C) or the anode (A) can be facilitated, and a short circuit between the electrodes can be prevented.
  • the hole transport layer (H) and the electron transport layer (E) are arranged so as to sandwich the active layer (X) between a pair of electrodes (cathode and anode). That is, when the photoelectric conversion element includes both the hole transport layer (H) and the electron transport layer (E), the anode (A), the hole transport layer (H), the active layer (X), and the electron transport layer (E). , And the cathode (C) are arranged in this order.
  • the photoelectric conversion element contains the hole transport layer (H) and does not include the electron transport layer (E), the anode (A), the hole transport layer (H), the active layer (X), and the cathode (C) are in this order. Be placed.
  • the photoelectric conversion element contains the electron transport layer (E) and does not include the hole transport layer (H), the anode (A), the active layer (X), the electron transport layer (E), and the cathode (C) are in this order. Be placed.
  • the electron transport layer (E) is a layer for extracting electrons from the active layer (X) to the cathode (C), and is not particularly limited as long as it is an electron transporting material that improves the efficiency of electron extraction, and is organic. It may be a compound or an inorganic compound, but an inorganic compound is preferable.
  • the material of the inorganic compound include alkali metal salts such as lithium, sodium, potassium, and cesium, metal oxides, and the like.
  • alkali metal salt a fluoride salt such as lithium fluoride, sodium fluoride, potassium fluoride, or cesium fluoride is preferable.
  • the metal oxide a metal oxide having n-type semiconductor characteristics such as titanium oxide (TiOx) and zinc oxide (ZnO) is preferable.
  • a more preferable material for the inorganic compound is a metal oxide having n-type semiconductor properties, such as titanium oxide (TiOx) or zinc oxide (ZnO). Titanium oxide (diox) is particularly preferable.
  • the film thickness of the electron transport layer (E) is not particularly limited, but is usually preferably 0.1 nm or more, more preferably 0.5 nm or more, still more preferably 1.0 nm or more, and usually 200 nm or less. It is more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 70 nm or less.
  • the film thickness of the electron transport layer (E) is 0.1 nm or more, it functions as a buffer material.
  • the film thickness of the electron transport layer (E) is 200 nm or less, electrons can be easily taken out, and the energy conversion efficiency PCE can be improved.
  • the hole transport layer (H) is a layer for extracting holes from the active layer (X) to the anode (A), and is a hole transporting material capable of improving the efficiency of hole extraction.
  • a hole transporting material capable of improving the efficiency of hole extraction.
  • a conductive polymer obtained by doping polythiophene, polypyrrole, polyacetylene, triphenylenediamine, polyaniline, etc. with sulfonic acid and / or iodine, a polythiophene derivative having a sulfonyl group as a substituent, a conductive organic substance such as arylamine, etc.
  • Examples thereof include compounds, metal oxides having p-type semiconductor properties such as molybdenum trioxide, vanadium pentoxide or nickel oxide, and the above-mentioned p-type organic semiconductor compounds.
  • a conductive polymer doped with sulfonic acid is preferable, and poly (3,4-ethylenedioxythiophene) poly (styrene sulfonic acid) (PEDOT: PSS) and molybdenum oxide obtained by doping a polythiophene derivative with polystyrene sulfonic acid can be mentioned.
  • metal oxides such as vanadium oxide are more preferred.
  • a thin film of a metal such as gold, indium, silver or palladium can also be used. The thin film such as metal may be formed alone or in combination with the above-mentioned organic material.
  • the film thickness of the hole transport layer (H) is not particularly limited, but is usually preferably 0.2 nm or more, more preferably 0.5 nm or more, still more preferably 1.0 nm or more, and usually 400 nm or less. It is more preferably 200 nm or less, further preferably 100 nm or less, and particularly preferably 70 nm or less.
  • the film thickness of the hole transport layer (H) is 0.2 nm or more, it functions as a buffer material.
  • the film thickness of the hole transport layer (H) is 400 nm or less, holes can be easily taken out, and the energy conversion efficiency PCE can be improved.
  • the electron transport layer (E) and the hole transport layer (H) there are no restrictions on the method of forming the electron transport layer (E) and the hole transport layer (H).
  • a material having sublimation property it can be formed by a vacuum vapor deposition method or the like.
  • a material soluble in a solvent it can be formed by a wet coating method such as spin coating or an inkjet.
  • the precursor may be converted into the semiconductor compound after forming a layer containing the semiconductor compound precursor as in the active layer (X).
  • the method for manufacturing the photoelectric conversion element is not particularly limited, but the photoelectric conversion element can be manufactured according to the following method.
  • the photoelectric conversion element (I) is formed by sequentially laminating a base material (B), a cathode (C), an electron transport layer (E), an active layer (X), a hole transport layer (H), and an anode (A). Can be made. As described above, the electron transport layer (E) and / or the hole transport layer (H) may not necessarily be provided.
  • a glass substrate manufactured by Geomatec in which an indium tin oxide (ITO) transparent conductive film is patterned as a cathode (C) is ultrasonically cleaned with acetone, and then ultrasonically cleaned with ethanol. After that, it is dried by a nitrogen blow and UV-ozone treatment is carried out to form a base material (B) with a cathode.
  • an electron transport layer converted into zinc oxide by applying a 0.5 M zinc acetate / 0.5 M aminoethanol / 2-methoxyethanol solution with a spin coater (3000 rpm, 40 seconds) and then annealing at 175 ° C. for 30 minutes. (E) can be formed.
  • a photoelectric conversion element having a different configuration for example, a photoelectric conversion element having at least one of an electron transport layer (E) and a hole transport layer (H) can be manufactured by the same method.
  • the photoelectric conversion element (II) is formed by sequentially laminating a base material (B), an anode (A), a hole transport layer (H), an active layer (X), an electron transport layer (E), and a cathode (C). Can be made. As described above, the electron transport layer (E) and / or the hole transport layer (H) may not necessarily be provided.
  • a glass substrate manufactured by Geomatec in which an indium tin oxide (ITO) transparent conductive film is patterned as an anode (A) is ultrasonically cleaned with acetone, and then ultrasonically cleaned with ethanol. After that, it is dried by a nitrogen blow and UV-ozone treatment is carried out to form a base material (B) with an anode. Then, a PEDOT-PSS (poly (3,4-ethylenedioxythiophene) -poly (styrene sulfonic acid)) aqueous dispersion was applied with a spin coater (5000 rpm, 50 seconds) and then annealed at 200 ° C.
  • ITO indium tin oxide
  • the hole transport layer (H) can be formed. Next, it is carried into a glove box, spin-coated with a mixed solution of a p-type organic semiconductor compound and an n-type organic semiconductor compound in an inert gas atmosphere, and activated by annealing or drying under reduced pressure on a hot plate. A layer (X) can be formed. Next, in the atmosphere, an ethanol solution (about 0.3 v%) of tetraisopropyl orthotitamate can be spin-coated and converted into titanium oxide by the moisture in the atmosphere to prepare an electron transport layer (E). Finally, aluminum, which is an electrode, is vapor-deposited and used as a cathode (C) to obtain a photoelectric conversion element (II). Further, a photoelectric conversion element having a different configuration, for example, a photoelectric conversion element having at least one of a hole transport layer (H) and an electron transport layer (E) can be manufactured by the same method.
  • the photoelectric conversion characteristics of the photoelectric conversion element can be obtained as follows.
  • Organic thin-film solar cell according to the present invention is preferably used as a solar cell element of a solar cell, particularly an organic thin film solar cell.
  • the organic thin-film solar cell according to the present invention is, for example, a solar cell for building materials, a solar cell for automobiles, a solar cell for interiors, a solar cell for sensors, a solar cell for railways, a solar cell for ships, a solar cell for airplanes, and a spacecraft. It can be used as a solar cell, a solar cell for home appliances, a solar cell for a mobile phone, a solar cell for a toy, or the like.
  • the organic thin-film solar cell according to the present invention may be used as it is, or the organic thin-film solar cell according to the present invention may be installed on the base material (B) and used as a solar cell module.
  • a solar cell panel can be manufactured as a solar cell module by providing the organic thin film solar cell according to the present invention on the surface of the plate material.
  • the measurement method used in the examples is as follows.
  • NMR spectrum measurement For the compound, NMR spectrum measurement was performed using an NMR spectrum measuring device (“400MR” manufactured by Agilent (formerly Varian)).
  • GPC Gel Permeation Chromatography
  • Mn number average molecular weight
  • Mw weight average molecular weight
  • the reaction solution was added to methanol (60 mL), the precipitated solid was collected by filtration, and the obtained solid was washed with Soxhlet (methanol, acetone, hexane). Then, Soxhlet extraction was performed using chloroform to obtain 85 mg of P-THDT-DBTH-EH-IMTH as a black solid (yield 90%).
  • the number average molecular weight (Mn) was 25,000 and the weight average molecular weight (Mw) was 63000.
  • Example 1 the polymer compound having the structure of P-THDT-DBTH-EH-IMTH obtained in Synthesis Example 5 was used as the p-type organic semiconductor compound, and is represented by the following formula as the n-type organic semiconductor compound.
  • An ITIC manufactured by 1-Material Co., Ltd. was used.
  • the total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass.
  • the obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more.
  • the mixed solution 1 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 ⁇ m filter.
  • the obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more.
  • the mixed solution 2 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 ⁇ m filter.
  • Example 3 the polymer compound having the structure of P-THDT-DBTH-O-IMTH obtained in Synthesis Example 6 was used as the p-type organic semiconductor compound, and is represented by the following formula as the n-type organic semiconductor compound.
  • 1-Material ITIC-M manufactured by Material was used.
  • the total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass.
  • the obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more.
  • the mixed solution 3 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 ⁇ m filter.
  • Example 4 the polymer compound having the structure of P-THDT-DBTH-O-IMTH obtained in Synthesis Example 6 was used as the p-type organic semiconductor compound, and is represented by the following formula as the n-type organic semiconductor compound.
  • a 4TIC manufactured by 1-Material Co., Ltd. was used.
  • the total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass.
  • the obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more.
  • the mixed solution 4 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 ⁇ m filter.
  • Example 5 the polymer compound having the structure of P-THDT-DBTH-DMO-IMTH obtained in Synthesis Example 7 was used as the p-type organic semiconductor compound, and the n-type organic semiconductor compound was used in Example 1 above.
  • the ITIC manufactured by 1-Material used in 1 was used.
  • the total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass.
  • the obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more.
  • the mixed solution 5 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 ⁇ m filter.
  • Example 6 a polymer compound having the structure of P-THDT-DBTH-DMO-IMTH obtained in Synthesis Example 7 was used as the p-type organic semiconductor compound, and Example 1 was used as the n-type organic semiconductor compound.
  • the total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass.
  • the obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more.
  • the mixed solution 6 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 ⁇ m filter.
  • a photoelectric conversion element was prepared using the mixed solutions obtained in Examples 1 to 6, and evaluated by the following procedure.
  • a glass substrate manufactured by Geomatec in which an electrode, an indium tin oxide (ITO) transparent conductive film (cathode), was patterned, was ultrasonically cleaned with acetone, then ultrasonically cleaned with ethanol, and then dried with a nitrogen blow. After UV-ozone treatment was performed on the dried glass substrate, an electron transport layer was formed.
  • the electron transport layer was formed by applying a 0.5 M zinc acetate / 0.5 M aminoethanol / 2-methoxyethanol solution to a glass substrate with a spin coater (3000 rpm, 40 seconds) and then annealing at 175 ° C. for 30 minutes. ..
  • the glass substrate on which the electron transport layer is formed is carried into the glove box, and a mixed solution 1 to 6 of the p-type organic semiconductor compound and the n-type organic semiconductor compound is spin-coated in an inert gas atmosphere and annealed on a hot plate. The process was carried out. The annealing treatment was carried out at 110 ° C. for 15 minutes. Next, molybdenum oxide, which is a hole transport layer, was deposited with a thin-film deposition machine. Then, silver, which is an electrode (anode), was vapor-deposited to produce a photoelectric conversion element, which is an inverted configuration device. For the obtained inverted configuration device, the photoelectric conversion element was evaluated using a solar simulator according to the following procedure.
  • a 0.05027 mm square metal mask is attached to the photoelectric conversion element, and a solar simulator (OTENTO-SUNIII, AM1.5G filter, radiant intensity 100 mW / cm 2 , manufactured by a spectroscope) is used as an irradiation light source, and a source meter (manufactured by Keithley Co., Ltd.)
  • the current-voltage characteristic between the ITO electrode and the silver electrode was measured by the 2400 type). From this measurement result, the short-circuit current density Jsc (mA / cm 2 ), the open circuit voltage Voc (V), the curve factor FF, and the energy conversion efficiency PCE (%) were calculated.
  • the short-circuit current density Jsc is the current density when the voltage value is 0V.
  • the open circuit voltage Voc is a voltage value when the current value is 0 mA / cm 2 .
  • the energy conversion efficiency PCE is given by the following equation, where the incident energy is Pin.
  • the photoelectric conversion element of the present invention has a high short-circuit current density (Jsc) and an open circuit voltage (Voc), and has a high energy conversion efficiency PCE. Further, it can be seen that the energy conversion efficiency PCE is larger when the aromatic compound (2) is used as the n-type organic semiconductor compound.

Abstract

Provided is a photoelectric conversion element having a high open circuit voltage (Voc) and a high short circuit current density (Jsc). Furthermore, an organic thin film solar cell including said photoelectric conversion element is provided. The photoelectric conversion element has a structure in which a cathode, an active layer, and an anode are arranged in this order, wherein the active layer contains a polymer compound having a benzobisthiazole structure unit represented by Formula (1), an aromatic compound represented by Formula (2), and an aromatic compound represented by Formula (3).

Description

光電変換素子Photoelectric conversion element
 本発明は、カソードと、活性層と、アノードとがこの順に配置された構造を有する光電変換素子について、活性層に、特定のベンゾビスチアゾール構造単位を有する高分子化合物と、特定の構造を有する芳香族性化合物とを含有する光電変換素子に関する。 The present invention has a photoelectric conversion element having a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer has a polymer compound having a specific benzobisthiazole structural unit and a specific structure. The present invention relates to a photoelectric conversion element containing an aromatic compound.
 有機半導体材料は、有機エレクトロニクス分野において最も重要な材料の1つであり、電子供与性のp型有機半導体化合物や電子受容性のn型有機半導体化合物に分類できる。こうしたp型有機半導体化合物やn型有機半導体化合物を適切に組合せることによって様々な半導体素子を製造できる。半導体素子は、例えば、電子と正孔が再結合して形成する励起子(エキシトン)の作用によって発光する有機エレクトロルミネッセンスや、光を電力に変換する有機薄膜太陽電池、電流や電圧を制御する有機薄膜トランジスタなどの有機電子デバイスに用いられている。有機電子デバイスに用いられる有機半導体材料の一例が、例えば、特許文献1に開示されている。特許文献1に記載されている有機半導体材料は、特定のベンゾビスチアゾール骨格を有する構造単位を有する高分子化合物を含んでいる。また、特許文献2、3には、特定のベンゾビスチアゾール構造単位を有する高分子化合物を含有する光電変換素子が記載されている。 Organic semiconductor materials are one of the most important materials in the field of organic electronics, and can be classified into electron-donating p-type organic semiconductor compounds and electron-accepting n-type organic semiconductor compounds. Various semiconductor devices can be manufactured by appropriately combining such p-type organic semiconductor compounds and n-type organic semiconductor compounds. Semiconductor devices include, for example, organic electroluminescence that emits light by the action of excitons (exciton) formed by the recombination of electrons and holes, organic thin-film transistor cells that convert light into electric power, and organic that controls current and voltage. It is used in organic electronic devices such as thin film transistors. An example of an organic semiconductor material used in an organic electronic device is disclosed in, for example, Patent Document 1. The organic semiconductor material described in Patent Document 1 contains a polymer compound having a structural unit having a specific benzobisthiazole skeleton. Further, Patent Documents 2 and 3 describe a photoelectric conversion element containing a polymer compound having a specific benzobisthiazole structural unit.
国際公開第2015/122321号International Publication No. 2015/122321 国際公開第2016/125822号International Publication No. 2016/125822 国際公開第2016/132917号International Publication No. 2016/132917
 ところで、有機電子デバイスの中でも有機薄膜太陽電池は、大気中への二酸化炭素放出がないため環境保全に有用であり、また簡単な構造で製造も容易であることから、需要が高まっている。有機薄膜太陽電池は、太陽光のエネルギーを電力に変換する効率(エネルギー変換効率PCE)が高いことが望まれており、エネルギー変換効率PCEは、短絡電流密度(Jsc)、開放電圧(Voc)、曲線因子(FF)、および入射エネルギー(Pin)に基づいて、次式で算出できる。
PCE=(Jsc×Voc×FF/Pin)×100
By the way, among organic electronic devices, organic thin-film solar cells are useful for environmental conservation because they do not emit carbon dioxide into the atmosphere, and because they have a simple structure and are easy to manufacture, demand is increasing. Organic thin-film solar cells are desired to have high efficiency of converting sunlight energy into electric power (energy conversion efficiency PCE), and the energy conversion efficiency PCE includes short-circuit current density (Jsc), open circuit voltage (Voc), and so on. It can be calculated by the following equation based on the curve factor (FF) and the incident energy (Pin).
PCE = (Jsc x Voc x FF / Pin) x 100
 光電変換素子のエネルギー変換効率PCEを高めるには、短絡電流密度(Jsc)、開放電圧(Voc)、または曲線因子(FF)のいずれかを向上させるか、入射エネルギー(Pin)を下げることが考えられる。これらのうち開放電圧(Voc)を向上させると、電力の高出力化が可能となり、安定した電力供給を実現できる。一方、短絡電流密度(Jsc)は、有機半導体化合物が受け取るエネルギーの量と相関することが知られており、短絡電流密度(Jsc)を向上させるには、有機半導体化合物に可視領域から近赤外領域までの広い波長範囲の光を吸収させる必要がある。有機半導体化合物が吸収できる光のうち、もっとも低いエネルギーの光の波長(もっとも長い波長)が吸収端波長であり、この波長に対応したエネルギーがバンドギャップエネルギーに相当する。そのため、有機半導体化合物により広い波長範囲の光を吸収させるには、バンドギャップ[p型有機半導体化合物のHOMO準位(最高被占軌道準位)とLUMO準位(最低空軌道準位)のエネルギー差]を狭くする必要がある。 In order to increase the energy conversion efficiency PCE of the photoelectric conversion element, it is conceivable to improve either the short-circuit current density (Jsc), the open circuit voltage (Voc), or the curve factor (FF), or lower the incident energy (Pin). Be done. By improving the open circuit voltage (Voc) among these, it is possible to increase the output of electric power and realize stable electric power supply. On the other hand, the short-circuit current density (Jsc) is known to correlate with the amount of energy received by the organic semiconductor compound. In order to improve the short-circuit current density (Jsc), the organic semiconductor compound is exposed to the visible region to the near infrared. It is necessary to absorb light in a wide wavelength range up to the region. Among the light that can be absorbed by the organic semiconductor compound, the wavelength of the light having the lowest energy (the longest wavelength) is the absorption edge wavelength, and the energy corresponding to this wavelength corresponds to the band gap energy. Therefore, in order for the organic semiconductor compound to absorb light in a wide wavelength range, the energy of the bandgap [HOMO level (highest occupied orbital level) and LUMO level (lowest empty orbital level) of the p-type organic semiconductor compound) Difference] needs to be narrowed.
 本発明の目的は、開放電圧(Voc)および短絡電流密度(Jsc)が高い光電変換素子を提供することにある。また、本発明の他の目的は、上記光電変換素子を備えた有機薄膜太陽電池を提供することにある。 An object of the present invention is to provide a photoelectric conversion element having a high open circuit voltage (Voc) and a short circuit current density (Jsc). Another object of the present invention is to provide an organic thin film solar cell provided with the photoelectric conversion element.
 本発明は、以下の発明を含む。
 [1] カソードと、活性層と、アノードとがこの順に配置された構造を有する光電変換素子であって、前記活性層は、下記式(1)で表されるベンゾビスチアゾール構造単位を有する高分子化合物と、下記式(2)で表される芳香族性化合物、および/または、下記式(3)で表される芳香族性化合物を含有することを特徴とする光電変換素子。
Figure JPOXMLDOC01-appb-C000006

 [式(1)中、T1、T2は、それぞれ独立に、アルコキシ基であるか、チオアルコキシ基であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチオフェン環であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチアゾール環であるか、炭化水素基、オルガノシリル基、アルコキシ基、チオアルコキシ基、トリフルオロメチル基、またはハロゲン原子で置換されていてもよいフェニル基を表す。
 また、B1、B2は、それぞれ独立に、炭化水素基で置換されていてもよいチオフェン環であるか、炭化水素基で置換されていてもよいチアゾール環であるか、またはエチニレン基を表す。]
Figure JPOXMLDOC01-appb-C000007

 [式(2)中、R101~R116は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいベンゼン環であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいチオフェン環を表す。]
Figure JPOXMLDOC01-appb-C000008

 [式(3)中、R201~R214は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいベンゼン環であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいチオフェン環を表す。]
 [2] T1、T2が、それぞれ独立に、下記式(t1)~式(t5)のいずれかで表される基である[1]に記載の光電変換素子。
Figure JPOXMLDOC01-appb-C000009

 [式(t1)~式(t5)中、R13、R14は、それぞれ独立に、炭素数6~30の炭化水素基を表す。
 R15、R16は、それぞれ独立に、炭素数6~30の炭化水素基、または*-Si(R183で表される基を表す。
 R17は、それぞれ独立に、炭素数6~30の炭化水素基、*-Si(R183、*-O-R19、*-S-R20、*-CF3、またはハロゲン原子を表す。
 n1は1~3の整数、n2は1または2、n3は1~5の整数をそれぞれ表し、複数のR15は同一でも異なっていてもよく、複数のR16は同一でも異なっていてもよく、複数のR17は同一でも異なっていてもよい。
 R18は、それぞれ独立に、炭素数1~20の脂肪族炭化水素基、または炭素数6~10の芳香族炭化水素基を表し、複数のR18は同一でも異なっていてもよい。
 R19、R20は、それぞれ独立に、炭素数6~30の炭化水素基を表す。
 *は、結合手を表す。]
 [3] B1、B2が、それぞれ独立に、下記式(b1)~式(b3)のいずれかで表される基である[1]または[2]に記載の光電変換素子。
Figure JPOXMLDOC01-appb-C000010

 [式(b1)~式(b3)中、R21、R22は、それぞれ独立に、炭素数6~30の炭化水素基を表す。
 n4は0~2の整数、n5は0または1を表し、複数のR21は同一でも異なっていてもよい。
 *は、結合手を表し、左側の*は、ベンゾビスチアゾール構造単位のベンゼン環に結合する結合手を表す。]
 [4] 前記式(1)で表されるベンゾビスチアゾール構造単位を含む高分子化合物は、ドナー-アクセプター型半導体高分子化合物である[1]~[3]のいずれかに記載の光電変換素子。
 [5] 前記カソードと前記活性層との間に電子輸送層を有する[1]~[4]のいずれかに記載の光電変換素子。
 [6] 前記アノードと前記活性層との間にホール輸送層を有する[1]~[5]のいずれかに記載の光電変換素子。
 [7] 前記カソードの一方の側に基材が配置され、前記カソードの他方の側に前記活性層が配置されている[1]~[6]のいずれかに記載の光電変換素子。
 [8] 前記アノードの一方の側に基材が配置され、前記アノードの他方の側に前記活性層が配置されている[1]~[6]のいずれかに記載の光電変換素子。
 [9] [1]~[8]のいずれかに記載の光電変換素子を備えることを特徴とする有機薄膜太陽電池。
The present invention includes the following inventions.
[1] A photoelectric conversion element having a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer has a high molecular weight having a benzobisthiazole structural unit represented by the following formula (1). A photoelectric conversion element containing a molecular compound, an aromatic compound represented by the following formula (2), and / or an aromatic compound represented by the following formula (3).
Figure JPOXMLDOC01-appb-C000006

[In formula (1), whether T 1 and T 2 are independently alkoxy groups, thioalkoxy groups, or thiophene rings that may be substituted with a hydrocarbon group or an organosilyl group. , A thiazole ring optionally substituted with a hydrocarbon group or an organosilyl group, or even if substituted with a hydrocarbon group, an organosilyl group, an alkoxy group, an thioalkoxy group, a trifluoromethyl group, or a halogen atom. Represents a good phenyl group.
Further, B 1 and B 2 each independently represent a thiophene ring which may be substituted with a hydrocarbon group, a thiazole ring which may be substituted with a hydrocarbon group, or an ethynylene group. .. ]
Figure JPOXMLDOC01-appb-C000007

[In formula (2), R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
Figure JPOXMLDOC01-appb-C000008

[In formula (3), R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
[2] The photoelectric conversion element according to [1], wherein T 1 and T 2 are independent groups represented by any of the following formulas (t1) to (t5).
Figure JPOXMLDOC01-appb-C000009

Wherein (t1) ~ formula (t5), R 13, R 14 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
R 15 and R 16 each independently represent a hydrocarbon group having 6 to 30 carbon atoms or a group represented by * -Si (R 18 ) 3 .
Each of R 17 independently contains a hydrocarbon group having 6 to 30 carbon atoms, * -Si (R 18 ) 3 , * -OR 19 , * -SR 20 , * -CF 3 , or a halogen atom. Represent.
n1 represents an integer of 1 to 3, n2 represents an integer of 1 or 2, n3 represents an integer of 1 to 5, and a plurality of R 15s may be the same or different, and a plurality of R 16s may be the same or different. , Multiple R 17s may be the same or different.
Each of R 18 independently represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different.
R 19 and R 20 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
* Represents a bond. ]
[3] The photoelectric conversion element according to [1] or [2], wherein B 1 and B 2 are independent groups represented by any of the following formulas (b1) to (b3).
Figure JPOXMLDOC01-appb-C000010

[In formulas (b1) to (b3), R 21 and R 22 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
n4 represents an integer of 0 to 2, n5 represents 0 or 1, and a plurality of R 21s may be the same or different.
* Represents a bond, and * on the left represents a bond that binds to the benzene ring of the benzobisthiazole structural unit. ]
[4] The photoelectric conversion element according to any one of [1] to [3], wherein the polymer compound containing the benzobisthiazole structural unit represented by the formula (1) is a donor-acceptor type semiconductor polymer compound. ..
[5] The photoelectric conversion element according to any one of [1] to [4], which has an electron transport layer between the cathode and the active layer.
[6] The photoelectric conversion element according to any one of [1] to [5], which has a hole transport layer between the anode and the active layer.
[7] The photoelectric conversion element according to any one of [1] to [6], wherein the base material is arranged on one side of the cathode and the active layer is arranged on the other side of the cathode.
[8] The photoelectric conversion element according to any one of [1] to [6], wherein the base material is arranged on one side of the anode and the active layer is arranged on the other side of the anode.
[9] An organic thin-film solar cell including the photoelectric conversion element according to any one of [1] to [8].
 本発明の光電変換素子は、カソードと、活性層と、アノードとがこの順に配置された構造を有しており、活性層が、特定のベンゾビスチアゾール構造単位を有する高分子化合物と、特定の構造を有する芳香族性化合物とを含有している。その結果、光電変換素子の開放電圧(Voc)および短絡電流密度(Jsc)の両方が高くなるため、電力の高出力化が可能となり、安定した電力供給を実現でき、しかもエネルギー変換効率PCEの向上も可能となる。また、本発明によれば、上記光電変換素子を備えた有機薄膜太陽電池を提供できる。 The photoelectric conversion element of the present invention has a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer is a specific polymer compound having a specific benzobisthiazole structural unit. It contains an aromatic compound having a structure. As a result, both the open circuit voltage (Voc) and the short-circuit current density (Jsc) of the photoelectric conversion element become high, so that the power output can be increased, a stable power supply can be realized, and the energy conversion efficiency PCE is improved. Is also possible. Further, according to the present invention, it is possible to provide an organic thin film solar cell provided with the above photoelectric conversion element.
図1は、本発明の光電変換素子の一実施形態を示す模式図である。FIG. 1 is a schematic view showing an embodiment of a photoelectric conversion element of the present invention. 図2は、本発明の光電変換素子の他の実施形態を示す模式図である。FIG. 2 is a schematic view showing another embodiment of the photoelectric conversion element of the present invention.
 本発明者らは、開放電圧(Voc)および短絡電流密度(Jsc)の両方を向上させることによって、光電変換素子のエネルギー変換効率PCEを高めることを目指して、鋭意検討を重ねてきた。その結果、活性層に、後述する式(1)で表されるベンゾビスチアゾール構造単位を有する高分子化合物と、後述する式(2)で表される芳香族性化合物、および/または、後述する式(3)で表される芳香族性化合物とを含有させれば、可視光領域全体に幅広い光吸収を有するとともに、HOMO準位やLUMO準位を適切な範囲に調整できるため、開放電圧(Voc)を向上しながら短絡電流密度(Jsc)を向上でき、光電変換素子のエネルギー変換効率PCEを高められることを見出し、本発明を完成した。以下、本発明の実施形態について詳細に説明する。以下に記載する構成要件の説明は、本発明の実施形態の一例(代表例)であり、本発明はその要旨を超えない限り、これらの内容に限定はされない。 The present inventors have been diligently studying with the aim of increasing the energy conversion efficiency PCE of the photoelectric conversion element by improving both the open circuit voltage (Voc) and the short-circuit current density (Jsc). As a result, in the active layer, a polymer compound having a benzobisthiazole structural unit represented by the formula (1) described later, an aromatic compound represented by the formula (2) described later, and / or described later. If it contains an aromatic compound represented by the formula (3), it has a wide range of light absorption over the entire visible light region, and the HOMO level and LUMO level can be adjusted to an appropriate range. We have found that the short-circuit current density (Jsc) can be improved while improving Voc), and the energy conversion efficiency PCE of the photoelectric conversion element can be increased, and the present invention has been completed. Hereinafter, embodiments of the present invention will be described in detail. The description of the constituent elements described below is an example (representative example) of the embodiment of the present invention, and the present invention is not limited to these contents as long as the gist thereof is not exceeded.
 <1.光電変換素子>
 本発明に係る光電変換素子は、カソードと、活性層と、アノードとがこの順に配置された構造を有する光電変換素子であって、前記活性層は、下記式(1)で表されるベンゾビスチアゾール構造単位を有する高分子化合物[以下、高分子化合物(1)ということがある。]と、下記式(2)で表される芳香族性化合物[以下、芳香族性化合物(2)ということがある。]、および/または、下記式(3)で表される芳香族性化合物[以下、芳香族性化合物(3)ということがある。]とを含有する光電変換素子である。
<1. Photoelectric conversion element>
The photoelectric conversion element according to the present invention is a photoelectric conversion element having a structure in which a cathode, an active layer, and an anode are arranged in this order, and the active layer is a benzobis represented by the following formula (1). Polymer compound having a thiazole structural unit [hereinafter, may be referred to as polymer compound (1). ] And an aromatic compound represented by the following formula (2) [hereinafter, may be referred to as an aromatic compound (2). ], And / or an aromatic compound represented by the following formula (3) [hereinafter, may be referred to as an aromatic compound (3). ] Is a photoelectric conversion element containing.
Figure JPOXMLDOC01-appb-C000011
Figure JPOXMLDOC01-appb-C000011
 [式(1)中、T1、T2は、それぞれ独立に、アルコキシ基であるか、チオアルコキシ基であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチオフェン環であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチアゾール環であるか、炭化水素基、オルガノシリル基、アルコキシ基、チオアルコキシ基、トリフルオロメチル基、またはハロゲン原子で置換されていてもよいフェニル基を表す。
 また、B1、B2は、それぞれ独立に、炭化水素基で置換されていてもよいチオフェン環であるか、炭化水素基で置換されていてもよいチアゾール環であるか、またはエチニレン基を表す。]
[In formula (1), whether T 1 and T 2 are independently alkoxy groups, thioalkoxy groups, or thiophene rings that may be substituted with a hydrocarbon group or an organosilyl group. , A thiazole ring optionally substituted with a hydrocarbon group or an organosilyl group, or even if substituted with a hydrocarbon group, an organosilyl group, an alkoxy group, an thioalkoxy group, a trifluoromethyl group, or a halogen atom. Represents a good phenyl group.
Further, B 1 and B 2 each independently represent a thiophene ring which may be substituted with a hydrocarbon group, a thiazole ring which may be substituted with a hydrocarbon group, or an ethynylene group. .. ]
Figure JPOXMLDOC01-appb-C000012
Figure JPOXMLDOC01-appb-C000012
 [式(2)中、R101~R116は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいベンゼン環であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいチオフェン環を表す。] [In formula (2), R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
Figure JPOXMLDOC01-appb-C000013
Figure JPOXMLDOC01-appb-C000013
 [式(3)中、R201~R214は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいベンゼン環であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいチオフェン環を表す。] [In formula (3), R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
 本発明に係る光電変換素子は、カソードと、活性層と、アノードとがこの順に配置された構造を有しており、本発明の一実施形態について、図面を用いて具体的に説明するが、本発明に係る光電変換素子は、図面に示した構成に限定されるわけではない。 The photoelectric conversion element according to the present invention has a structure in which a cathode, an active layer, and an anode are arranged in this order, and one embodiment of the present invention will be specifically described with reference to the drawings. The photoelectric conversion element according to the present invention is not limited to the configuration shown in the drawings.
 図1は、本発明の光電変換素子の一実施形態を示す模式図であり、一般的な有機薄膜太陽電池に用いられる光電変換素子の構成例を示している。図1に示した光電変換素子(I)は、カソード(電極)(C)と、活性層(X)と、アノード(電極)(A)とがこの順に配置された構造を有している。図1に示した実施形態では、カソード(C)の一方の側に基材(B)が配置され、カソード(C)の他方の側に活性層(X)が配置されている。図1に示した光電変換素子(I)は、更に、バッファ層として、電子輸送層(E)とホール輸送層(H)とを有している。即ち、図1に示した光電変換素子(I)は、カソード(C)と活性層(X)との間に電子輸送層(E)を有し、アノード(A)と活性層(X)との間にホール輸送層(H)を有している。従って、図1に示した実施形態では、基材(B)と、カソード(C)と、バッファ層として電子輸送層(E)と、活性層(X)と、バッファ層としてホール輸送層(H)と、アノード(A)と、がこの順に配置されている。 FIG. 1 is a schematic view showing an embodiment of the photoelectric conversion element of the present invention, and shows a configuration example of a photoelectric conversion element used in a general organic thin film solar cell. The photoelectric conversion element (I) shown in FIG. 1 has a structure in which a cathode (electrode) (C), an active layer (X), and an anode (electrode) (A) are arranged in this order. In the embodiment shown in FIG. 1, the base material (B) is arranged on one side of the cathode (C), and the active layer (X) is arranged on the other side of the cathode (C). The photoelectric conversion element (I) shown in FIG. 1 further has an electron transport layer (E) and a hole transport layer (H) as a buffer layer. That is, the photoelectric conversion element (I) shown in FIG. 1 has an electron transport layer (E) between the cathode (C) and the active layer (X), and has an anode (A) and an active layer (X). It has a hole transport layer (H) between the two. Therefore, in the embodiment shown in FIG. 1, the base material (B), the cathode (C), the electron transport layer (E) as the buffer layer, the active layer (X), and the hole transport layer (H) as the buffer layer. ) And the anode (A) are arranged in this order.
 図2は、本発明の光電変換素子の他の実施形態を示す模式図であり、一般的な有機薄膜太陽電池に用いられる光電変換素子の構成例を示している。図2に示した光電変換素子(II)は、カソード(電極)(C)と、活性層(X)と、アノード(電極)(A)とがこの順に配置された構造を有している。図2に示した実施形態では、アノード(A)の一方の側に基材(B)が配置され、アノード(A)の他方の側に活性層(X)が配置されている。図2に示した光電変換素子(II)は、更に、バッファ層として、電子輸送層(E)とホール輸送層(H)とを有している。即ち、図2に示した光電変換素子(II)は、カソード(C)と活性層(X)との間に電子輸送層(E)を有し、アノード(A)と活性層(X)との間にホール輸送層(H)を有している。従って、図2に示した実施形態では、基材(B)と、アノード(A)と、バッファ層としてホール輸送層(H)と、活性層(X)と、バッファ層として電子輸送層(E)と、カソード(C)と、がこの順に配置されている。以下、これらの各部について説明する。 FIG. 2 is a schematic view showing another embodiment of the photoelectric conversion element of the present invention, and shows a configuration example of the photoelectric conversion element used in a general organic thin film solar cell. The photoelectric conversion element (II) shown in FIG. 2 has a structure in which a cathode (electrode) (C), an active layer (X), and an anode (electrode) (A) are arranged in this order. In the embodiment shown in FIG. 2, the base material (B) is arranged on one side of the anode (A), and the active layer (X) is arranged on the other side of the anode (A). The photoelectric conversion element (II) shown in FIG. 2 further has an electron transport layer (E) and a hole transport layer (H) as a buffer layer. That is, the photoelectric conversion element (II) shown in FIG. 2 has an electron transport layer (E) between the cathode (C) and the active layer (X), and has an anode (A) and an active layer (X). It has a hole transport layer (H) between the two. Therefore, in the embodiment shown in FIG. 2, the base material (B), the anode (A), the hole transport layer (H) as the buffer layer, the active layer (X), and the electron transport layer (E) as the buffer layer. ) And the cathode (C) are arranged in this order. Each of these parts will be described below.
 <1.1 活性層(X)>
 活性層(X)は、光電変換が行われる層を指し、光電変換素子が光を受けると、光が活性層(X)に吸収され、p型有機半導体化合物とn型有機半導体化合物との界面で電気が発生し、発生した電気がカソード(C)およびアノード(A)から取り出される。
<1.1 Active layer (X)>
The active layer (X) refers to a layer on which photoelectric conversion is performed. When the photoelectric conversion element receives light, the light is absorbed by the active layer (X), and the interface between the p-type organic semiconductor compound and the n-type organic semiconductor compound. Electricity is generated at, and the generated electricity is taken out from the cathode (C) and the anode (A).
 上記活性層(X)は、上記式(1)で表されるベンゾビスチアゾール構造単位を有する高分子化合物[高分子化合物(1)]と、上記式(2)で表される芳香族性化合物[芳香族性化合物(2)]、および/または、上記式(3)で表される芳香族性化合物[芳香族性化合物(3)]とを含有する。高分子化合物(1)は、p型有機半導体化合物であり、芳香族性化合物(2)と芳香族性化合物(3)は、n型有機半導体化合物である。 The active layer (X) is a polymer compound [polymer compound (1)] having a benzobisthiazole structural unit represented by the above formula (1) and an aromatic compound represented by the above formula (2). It contains [aromatic compound (2)] and / or an aromatic compound represented by the above formula (3) [aromatic compound (3)]. The polymer compound (1) is a p-type organic semiconductor compound, and the aromatic compound (2) and the aromatic compound (3) are n-type organic semiconductor compounds.
 上記活性層(X)は、上記式(1)で表されるベンゾビスチアゾール構造単位を有する高分子化合物[高分子化合物(1)]を一種含有してもよいし、二種以上含有してもよい。また、上記活性層(X)は、p型有機半導体化合物として、更に、上記式(1)で表されるベンゾビスチアゾール構造単位を有しない有機半導体化合物を含有してもよい。以下、上記式(1)で表されるベンゾビスチアゾール構造単位を有しない有機半導体化合物を、以下、有機半導体化合物(11)ということがある。 The active layer (X) may contain one kind of polymer compound [polymer compound (1)] having a benzobisthiazole structural unit represented by the above formula (1), or may contain two or more kinds. May be good. Further, the active layer (X) may further contain an organic semiconductor compound having no benzobisthiazole structural unit represented by the above formula (1) as the p-type organic semiconductor compound. Hereinafter, the organic semiconductor compound having no benzobisthiazole structural unit represented by the above formula (1) may be hereinafter referred to as an organic semiconductor compound (11).
 上記活性層(X)は、芳香族性化合物(2)または芳香族性化合物(3)のいずれか一方を含有してもよいし、芳香族性化合物(2)および芳香族性化合物(3)の両方を含有してもよく、芳香族性化合物(2)または芳香族性化合物(3)のいずれか一方を含有することが好ましい。また、上記活性層(X)は、更に、芳香族性化合物(2)または芳香族性化合物(3)以外のn型有機半導体化合物を含有してもよい。 The active layer (X) may contain either the aromatic compound (2) or the aromatic compound (3), or the aromatic compound (2) and the aromatic compound (3). It may contain both of the above, and it is preferable to contain either the aromatic compound (2) or the aromatic compound (3). Further, the active layer (X) may further contain an n-type organic semiconductor compound other than the aromatic compound (2) or the aromatic compound (3).
 上記活性層(X)の膜厚は特に限定されないが、例えば、70nm以上、1000nm以下が好ましい。活性層(X)の膜厚を70nm以上とすることにより、光電変換素子のエネルギー変換効率PCEの向上が期待できる。また、活性層(X)の膜厚を70nm以上とすることにより、膜内の貫通短絡を防止できる。活性層(X)の膜厚は、70nm以上が好ましく、より好ましくは90nm以上、更に好ましくは100nm以上である。一方、一般的に、活性層(X)を厚くすればするほど、活性層(X)中で発生した電荷が、電極まで移動する距離が増加することから、電荷の電極への輸送が妨げられる。このように活性層(X)が厚い場合、光を吸収できる領域は増えるものの、光吸収によって生じた電荷の輸送が困難であることから、エネルギー変換効率PCEが低下する。そこで活性層(X)の膜厚を1000nm以下とすることにより、電極間の距離が離れすぎず電荷の拡散が良好となり、且つ活性層(X)の内部抵抗も小さくなる。活性層(X)の膜厚は、1000nm以下が好ましく、より好ましくは750nm以下、更に好ましくは500nm以下である。また、活性層(X)の膜厚を70nm以上、1000nm以下とすることにより、活性層(X)を作製するプロセスにおける再現性が一層向上する。また、活性層(X)の膜厚を70nm以上、500nm以下とすることにより、エネルギー変換効率PCEの向上に加えて、開放電圧(Voc)を確保できるため好ましい。 The film thickness of the active layer (X) is not particularly limited, but is preferably 70 nm or more and 1000 nm or less, for example. By setting the film thickness of the active layer (X) to 70 nm or more, improvement in the energy conversion efficiency PCE of the photoelectric conversion element can be expected. Further, by setting the film thickness of the active layer (X) to 70 nm or more, a through-short circuit in the film can be prevented. The film thickness of the active layer (X) is preferably 70 nm or more, more preferably 90 nm or more, and further preferably 100 nm or more. On the other hand, in general, the thicker the active layer (X), the greater the distance that the electric charge generated in the active layer (X) travels to the electrode, which hinders the transport of the electric charge to the electrode. .. When the active layer (X) is thick as described above, the region capable of absorbing light increases, but it is difficult to transport the electric charge generated by the light absorption, so that the energy conversion efficiency PCE is lowered. Therefore, by setting the film thickness of the active layer (X) to 1000 nm or less, the distance between the electrodes is not too large, the charge diffusion is good, and the internal resistance of the active layer (X) is also reduced. The film thickness of the active layer (X) is preferably 1000 nm or less, more preferably 750 nm or less, and further preferably 500 nm or less. Further, by setting the film thickness of the active layer (X) to 70 nm or more and 1000 nm or less, the reproducibility in the process of producing the active layer (X) is further improved. Further, it is preferable that the film thickness of the active layer (X) is 70 nm or more and 500 nm or less because the open circuit voltage (Voc) can be secured in addition to the improvement of the energy conversion efficiency PCE.
 [1.1.1 活性層の層構成]
 活性層(X)の層構成としては、p型有機半導体化合物とn型有機半導体化合物とが積層された薄膜積層型、またはp型有機半導体化合物とn型有機半導体化合物とが混合した層を有するバルクヘテロ接合型等が挙げられる。なかでも、エネルギー変換効率PCEがより向上しうる点で、バルクヘテロ接合型の活性層が好ましい。
[1.1.1 Layer structure of active layer]
The layer structure of the active layer (X) includes a thin film laminated type in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are laminated, or a layer in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are mixed. Bulk heterojunction type and the like can be mentioned. Of these, a bulk heterojunction type active layer is preferable because the energy conversion efficiency PCE can be further improved.
 上記バルクヘテロ接合型の活性層は、p型有機半導体化合物とn型有機半導体化合物とが混合された層(以下、i層ということがある。)を有する。i層は、p型有機半導体化合物とn型有機半導体化合物とが相分離した構造を有し、相界面でキャリア分離が起こり、生じたキャリア(正孔および電子)が電極まで輸送される。 The bulk heterojunction type active layer has a layer in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are mixed (hereinafter, may be referred to as i-layer). The i-layer has a structure in which a p-type organic semiconductor compound and an n-type organic semiconductor compound are phase-separated, carrier separation occurs at the phase interface, and the generated carriers (holes and electrons) are transported to the electrode.
 i層に含まれるp型有機半導体化合物の質量を100%としたとき、高分子化合物(1)の含有量は、50質量%以上が好ましく、より好ましくは70質量%以上、更に好ましくは90質量%以上、最も好ましくは100質量%である。高分子化合物(1)はp型有機半導体化合物として好適な性質を有するため、i層に含まれるp型有機半導体化合物として高分子化合物(1)のみを含むことが最も好ましい。 When the mass of the p-type organic semiconductor compound contained in the i-layer is 100%, the content of the polymer compound (1) is preferably 50% by mass or more, more preferably 70% by mass or more, and further preferably 90% by mass. % Or more, most preferably 100% by mass. Since the polymer compound (1) has properties suitable as a p-type organic semiconductor compound, it is most preferable to contain only the polymer compound (1) as the p-type organic semiconductor compound contained in the i-layer.
 i層中でのp型有機半導体化合物とn型有機半導体化合物との質量比(p型有機半導体化合物/n型有機半導体化合物)は、良好な相分離構造を得ることによりエネルギー変換効率PCEを向上させる観点から、0.2以上が好ましく、より好ましくは0.5以上、更に好ましくは1以上であり、5以下が好ましく、より好ましくは4以下、更に好ましくは3以下、特に好ましくは2以下である。 The mass ratio of the p-type organic semiconductor compound to the n-type organic semiconductor compound in the i-layer (p-type organic semiconductor compound / n-type organic semiconductor compound) improves the energy conversion efficiency PCE by obtaining a good phase-separated structure. From the viewpoint of the above, 0.2 or more is preferable, 0.5 or more is more preferable, 1 or more is more preferable, 5 or less is preferable, 4 or less is more preferable, 3 or less is more preferable, and 2 or less is particularly preferable. is there.
 i層は、塗布法および蒸着法(例えば共蒸着法)を含む任意の方法によって形成できるが、塗布法を用いることによってより簡単にi層を形成できるため好ましい。上記高分子化合物(1)は、溶媒に対して良好な溶解性を有するため、塗布成膜性に優れる点で好ましい。塗布法によってi層を形成する場合、p型有機半導体化合物およびn型有機半導体化合物を含む塗布液を調製し、この塗布液を塗布すればよい。p型有機半導体化合物およびn型有機半導体化合物を含む塗布液は、p型有機半導体化合物を含む溶液とn型有機半導体化合物を含む溶液をそれぞれ調製してから混合して作製してもよいし、溶媒にp型有機半導体化合物およびn型有機半導体化合物を溶解して作製してもよい。 The i-layer can be formed by any method including a coating method and a vapor deposition method (for example, a co-evaporation method), but it is preferable to use the coating method because the i-layer can be formed more easily. The polymer compound (1) is preferable because it has good solubility in a solvent and is excellent in coating film-forming property. When the i-layer is formed by the coating method, a coating liquid containing a p-type organic semiconductor compound and an n-type organic semiconductor compound may be prepared and the coating liquid may be applied. The coating liquid containing the p-type organic semiconductor compound and the n-type organic semiconductor compound may be prepared by preparing a solution containing the p-type organic semiconductor compound and a solution containing the n-type organic semiconductor compound, and then mixing them. It may be prepared by dissolving a p-type organic semiconductor compound and an n-type organic semiconductor compound in a solvent.
 塗布液中のp型有機半導体化合物とn型有機半導体化合物との合計濃度は特に限定されないが、充分な膜厚の活性層(X)を形成する観点から、塗布液全体に対して1.0質量%以上が好ましく、半導体化合物を充分に溶解させる観点から、塗布液全体に対して4.0質量%以下が好ましい。 The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound in the coating liquid is not particularly limited, but is 1.0 with respect to the entire coating liquid from the viewpoint of forming the active layer (X) having a sufficient thickness. It is preferably 4.0% by mass or more, and preferably 4.0% by mass or less with respect to the entire coating liquid from the viewpoint of sufficiently dissolving the semiconductor compound.
 塗布方法としては任意の方法を用いることができ、例えば、スピンコート法、インクジェット法、ドクターブレード法、ドロップキャスティング法、リバースロールコート法、グラビアコート法、キスコート法、ロールブラッシュ法、スプレーコート法、エアナイフコート法、ワイヤーバーバーコート法、パイプドクター法、含浸・コート法、カーテンコート法、またはフレキソコート法等が挙げられる。塗布液を塗布した後に、加熱等による乾燥処理を行ってもよい。 Any method can be used as the coating method, for example, spin coating method, inkjet method, doctor blade method, drop casting method, reverse roll coating method, gravure coating method, kiss coating method, roll brushing method, spray coating method, etc. Examples include the air knife coating method, the wire barber coating method, the pipe doctor method, the impregnation / coating method, the curtain coating method, and the flexo coating method. After applying the coating liquid, a drying treatment such as heating may be performed.
 塗布液の溶媒としては、p型有機半導体化合物およびn型有機半導体化合物を均一に溶解できるものであれば特に限定されないが、例えば、ヘキサン、ヘプタン、オクタン、イソオクタン、ノナン、またはデカン等の脂肪族炭化水素類;トルエン、キシレン、メシチレン、インダン、テトラリン、シクロヘキシルベンゼン、クロロベンゼン、またはオルトジクロロベンゼン等の芳香族炭化水素類;シクロペンタン、シクロヘキサン、メチルシクロヘキサン、シクロヘプタン、シクロオクタン、またはデカリン等の脂環式炭化水素類;メタノール、エタノール、プロパノール、またはアニソール等の低級アルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン(MIBK)、シクロペンタノン、またはシクロヘキサノン等の脂肪族ケトン類;アセトフェノン、またはプロピオフェノン等の芳香族ケトン類;酢酸エチル、酢酸イソプロピル、酢酸ブチル、または乳酸メチル等のエステル類;クロロホルム、塩化メチレン、ジクロロエタン、トリクロロエタン、またはトリクロロエチレン等のハロゲン炭化水素類;エチルエーテル、テトラヒドロフラン、シクロペンチルメチルエーテル、ジブチルエーテル、ジフェニルエーテル、またはジオキサン等のエーテル類;または、ジメチルホルムアミド、N-メチルピロリドン(NMP)、1,3-ジメチル-2-イミダゾリジノン(DMI)、またはジメチルアセトアミド等のアミド類;等が挙げられ、これらを単独で用いても複数を混合して用いてもよい。なかでも好ましくは、トルエン、キシレン、メシチレン、テトラリン、シクロヘキシルベンゼン、クロロベンゼン、またはオルトジクロロベンゼン等の芳香族炭化水素類;シクロペンタン、シクロヘキサン、メチルシクロヘキサン、シクロヘプタン、シクロオクタン、またはデカリン等の脂環式炭化水素類;アセトン、メチルエチルケトン、シクロペンタノン、またはシクロヘキサノン等の脂肪族ケトン類;または、エチルエーテル、テトラヒドロフラン、またはジオキサン等のエーテル類である。 The solvent of the coating liquid is not particularly limited as long as it can uniformly dissolve the p-type organic semiconductor compound and the n-type organic semiconductor compound, and is, for example, an aliphatic such as hexane, heptane, octane, isooctane, nonane, or decane. Hydrocarbons; aromatic hydrocarbons such as toluene, xylene, mesityrene, indan, tetraline, cyclohexylbenzene, chlorobenzene, or orthodichlorobenzene; fats such as cyclopentane, cyclohexane, methylcyclohexane, cycloheptane, cyclooctane, or decalin Cyclic hydrocarbons; lower alcohols such as methanol, ethanol, propanol, or anisole; aliphatic ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone (MIBK), cyclopentanone, or cyclohexanone; acetophenone, or propiophenone Aromatic ketones such as; esters such as ethyl acetate, isopropyl acetate, butyl acetate, or methyl lactate; halogen hydrocarbons such as chloroform, methylene chloride, dichloroethane, trichloroethane, or trichloroethylene; ethyl ether, tetrahydrofuran, cyclopentylmethyl ether , Dibutyl ethers, diphenyl ethers, or ethers such as dioxane; or amides such as dimethylformamide, N-methylpyrrolidone (NMP), 1,3-dimethyl-2-imidazolidinone (DMI), or dimethylacetamide; etc. These may be used alone or in combination of two or more. Of these, aromatic hydrocarbons such as toluene, xylene, mesitylene, tetraline, cyclohexylbenzene, chlorobenzene, or orthodichlorobenzene; alicyclics such as cyclopentane, cyclohexane, methylcyclohexane, cycloheptane, cyclooctane, or decalin. Formula hydrocarbons; aliphatic ketones such as acetone, methyl ethyl ketone, cyclopentane, or cyclohexanone; or ethers such as ethyl ether, tetrahydrofuran, or dioxane.
 バルクヘテロ接合型の活性層を塗布法によって形成する場合、p型有機半導体化合物とn型有機半導体化合物とを含む塗布液に添加剤を加えてもよい。バルクヘテロ接合型の活性層におけるp型有機半導体化合物とn型有機半導体化合物との相分離構造は、光吸収過程、励起子の拡散過程、励起子の乖離(キャリア分離)過程、キャリア輸送過程等に対して影響を及ぼす。従ってバルクヘテロ接合型の活性層におけるp型有機半導体化合物とn型有機半導体化合物との相分離構造を最適化することにより、良好なエネルギー変換効率PCEを実現できると考えられる。そこで、塗布液に、p型有機半導体化合物またはn型有機半導体化合物と親和性の高い添加剤を含有させることによって、好ましい相分離構造を有する活性層が得られ、エネルギー変換効率PCEを向上できると考えられる。 When the bulk heterojunction type active layer is formed by the coating method, an additive may be added to the coating liquid containing the p-type organic semiconductor compound and the n-type organic semiconductor compound. The phase-separated structure of the p-type organic semiconductor compound and the n-type organic semiconductor compound in the bulk heterojunction type active layer is used in the light absorption process, exciton diffusion process, exciton dissociation (carrier separation) process, carrier transport process, etc. Affects Therefore, it is considered that good energy conversion efficiency PCE can be realized by optimizing the phase separation structure of the p-type organic semiconductor compound and the n-type organic semiconductor compound in the bulk heterojunction type active layer. Therefore, by incorporating an additive having a high affinity with the p-type organic semiconductor compound or the n-type organic semiconductor compound in the coating liquid, an active layer having a preferable phase separation structure can be obtained, and the energy conversion efficiency PCE can be improved. Conceivable.
 上記添加剤は、活性層(X)から失われにくくなる点で、固体であるか、高沸点の液体であることが好ましい。 The additive is preferably a solid or a liquid having a high boiling point in that it is not easily lost from the active layer (X).
 具体的には、添加剤が固体の場合は、添加剤の融点(1気圧)は、通常35℃以上が好ましく、より好ましくは50℃以上、更に好ましくは80℃以上、特に好ましくは150℃以上、最も好ましくは200℃以上である。融点の上限は、例えば、400℃以下が好ましく、より好ましくは350℃以下、更に好ましくは300℃以下である。固体の添加剤としては、例えば、炭素数10以上20以下の脂肪族炭化水素類または置換基を有していてもよい炭素数10以上20以下の芳香族化合物等が挙げられ、置換基を有していてもよい炭素数10以上20以下の芳香族化合物が好ましい。芳香族化合物の具体的な例としてはナフタレン化合物が挙げられ、特にナフタレンに1以上8以下の置換基が結合した化合物が好ましい。ナフタレンに結合している置換基としては、ハロゲン原子、水酸基、シアノ基、アミノ基、アミド基、カルボニルオキシ基、カルボキシル基、カルボニル基、オキシカルボニル基、シリル基、アルケニル基、アルキニル基、アルコキシ基、アリールオキシ基、アルキルチオ基、アリールチオ基または芳香族基が挙げられる。 Specifically, when the additive is a solid, the melting point (1 atm) of the additive is usually preferably 35 ° C. or higher, more preferably 50 ° C. or higher, still more preferably 80 ° C. or higher, and particularly preferably 150 ° C. or higher. Most preferably, it is 200 ° C. or higher. The upper limit of the melting point is, for example, preferably 400 ° C. or lower, more preferably 350 ° C. or lower, still more preferably 300 ° C. or lower. Examples of the solid additive include aliphatic hydrocarbons having 10 or more and 20 or less carbon atoms, aromatic compounds having 10 or more and 20 or less carbon atoms which may have a substituent, and the like, and have a substituent. Aromatic compounds having 10 or more and 20 or less carbon atoms which may be used are preferable. Specific examples of the aromatic compound include naphthalene compounds, and a compound in which a substituent of 1 to 8 is bonded to naphthalene is particularly preferable. Substituents bonded to naphthalene include halogen atom, hydroxyl group, cyano group, amino group, amide group, carbonyloxy group, carboxyl group, carbonyl group, oxycarbonyl group, silyl group, alkenyl group, alkynyl group and alkoxy group. , Aryloxy group, alkylthio group, arylthio group or aromatic group.
 添加剤が液体の場合は、添加剤の沸点(1気圧)は、80℃以上が好ましく、より好ましくは100℃以上、更に好ましくは150℃以上である。沸点の上限は、例えば、300℃以下が好ましく、より好ましくは250℃以下、更に好ましくは200℃以下である。液体の添加剤としては、例えば、炭素数8以上9以下の脂肪族炭化水素類または置換基を有していてもよい炭素数8以上9以下の芳香族化合物等が挙げられる。脂肪族炭化水素類の具体的な例としては、ジハロゲン炭化水素化合物が挙げられ、特にオクタンに1以上8以下の置換基が結合した化合物が好ましい。オクタンに結合している置換基としては、ハロゲン原子、水酸基、チオール基、アルコキシ基、チオアルコキシ基、シアノ基、アミノ基、アミド基、カルボニルオキシ基、カルボキシル基、カルボニル基、または芳香族基が挙げられる。芳香族化合物の具体的な例としては、ベンゼンが挙げられ、ハロゲン原子、水酸基、チオール基、アルコキシ基、チオアルコキシ基、シアノ基、アミノ基、アミド基、カルボニルオキシ基、カルボキシル基、またはカルボニル基などの置換基を有するベンゼン化合物、或いはハロゲン原子が4以上6以下結合しているベンゼン化合物が好ましい。より具体的には、アニソール;2-メトキシトルエン、3-メトキシトルエン、4-メトキシトルエン、2,5-ジメチルアニソールなどの1つ以上のアルコキシ基とアルキル基で置換されたベンゼン化合物;チオアニソール;エチルフェニルスルフィド;4-(メチルチオ)トルエンおよびその位置異性体;2-メトキシチオアニソールおよびその位置異性体;1-メトキシナフタレン、2-メトキシナフタレンなどのメトキシナフタレン位置異性体;1,4-ジメトキシナフタレン、1,6-ジメトキシナフタレン、1,7-ジメトキシナフタレン、2,3-ジメトキシナフタレン、2,6-ジメトキシナフタレン、2,7-ジメトキシナフタレンなどのジメトキシナフタレン位置異性体;などが挙げられる。 When the additive is a liquid, the boiling point (1 atm) of the additive is preferably 80 ° C. or higher, more preferably 100 ° C. or higher, and further preferably 150 ° C. or higher. The upper limit of the boiling point is, for example, preferably 300 ° C. or lower, more preferably 250 ° C. or lower, still more preferably 200 ° C. or lower. Examples of the liquid additive include aliphatic hydrocarbons having 8 to 9 carbon atoms and aromatic compounds having 8 to 9 carbon atoms which may have a substituent. Specific examples of the aliphatic hydrocarbons include dihalogen hydrocarbon compounds, and compounds in which a substituent of 1 to 8 is bonded to octane are particularly preferable. Substituents bonded to octane include halogen atoms, hydroxyl groups, thiol groups, alkoxy groups, thioalkoxy groups, cyano groups, amino groups, amide groups, carbonyloxy groups, carboxyl groups, carbonyl groups, or aromatic groups. Can be mentioned. Specific examples of the aromatic compound include benzene, which includes a halogen atom, a hydroxyl group, a thiol group, an alkoxy group, a thioalkoxy group, a cyano group, an amino group, an amide group, a carbonyloxy group, a carboxyl group, or a carbonyl group. A benzene compound having a substituent such as, or a benzene compound in which 4 or more and 6 or less halogen atoms are bonded is preferable. More specifically, anisole; a benzene compound substituted with one or more alkoxy groups such as 2-methoxytoluene, 3-methoxytoluene, 4-methoxytoluene, 2,5-dimethylanisole and an alkyl group; thioanisole; Ethylphenyl sulfide; 4- (methylthio) toluene and its positional isomers; 2-methoxythioanisole and its positional isomers; methoxynaphthalene positional isomers such as 1-methoxynaphthalene and 2-methoxynaphthalene; 1,4-dimethoxynaphthalene , 1,6-Dimethoxynaphthalene, 1,7-dimethoxynaphthalene, 2,3-dimethoxynaphthalene, 2,6-dimethoxynaphthalene, dimethoxynaphthalene positional isomers such as 2,7-dimethoxynaphthalene; and the like.
 上記添加剤は、p型有機半導体化合物とn型有機半導体化合物とを含む塗布液全体の質量に対して、0.1質量%以上が好ましく、より好ましくは0.5質量%以上であり、10質量%以下が好ましく、より好ましくは5質量%以下である。添加剤の量がこの範囲にあることにより、好ましい相分離構造を得ることができる。 The additive is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, and 10% by mass or more, based on the total mass of the coating liquid containing the p-type organic semiconductor compound and the n-type organic semiconductor compound. It is preferably 5% by mass or less, more preferably 5% by mass or less. When the amount of the additive is in this range, a preferable phase separation structure can be obtained.
 [1.1.2 p型有機半導体化合物]
 上記活性層(X)は、p型有機半導体化合物として、高分子化合物(1)を含有する。上記高分子化合物(1)は、p型有機半導体化合物であり、下記式(1)で表されるベンゾビスチアゾール構造単位(以下、「式(1)で表される構造単位」ということがある。)を有する。
[1.1.2 p-type organic semiconductor compound]
The active layer (X) contains a polymer compound (1) as a p-type organic semiconductor compound. The polymer compound (1) is a p-type organic semiconductor compound, and may be referred to as a benzobisthiazole structural unit represented by the following formula (1) (hereinafter, referred to as a “structural unit represented by the formula (1)”. .).
Figure JPOXMLDOC01-appb-C000014
Figure JPOXMLDOC01-appb-C000014
 上記高分子化合物(1)は、上記式(1)で表されるベンゾビスチアゾール構造単位を有するため、HOMO準位を深くしながらバンドギャップを狭めることができ、エネルギー変換効率PCEを高めるのに有利である。高分子化合物(1)は、上記式(1)で表されるベンゾビスチアゾール構造単位と、後述する共重合成分(12)とを共重合したドナー-アクセプター型半導体高分子化合物が好ましい。ドナー-アクセプター型半導体高分子化合物は、ドナー性ユニットとアクセプター性ユニットが交互に配置した高分子化合物を意味する。ドナー性ユニットは、電子供与性の構造単位を意味し、アクセプター性ユニットは、電子受容性の構造単位を意味する。前記ドナー-アクセプター型半導体高分子化合物は、式(1)で表される構造単位と、後述する共重合成分(12)とが交互に配置した高分子化合物であることが好ましい。このような構造とすることで、p型有機半導体化合物として好適に用いることができる。 Since the polymer compound (1) has a benzobisthiazole structural unit represented by the above formula (1), the band gap can be narrowed while deepening the HOMO level, and the energy conversion efficiency PCE can be improved. It is advantageous. The polymer compound (1) is preferably a donor-acceptor type semiconductor polymer compound obtained by copolymerizing a benzobisthiazole structural unit represented by the above formula (1) with a copolymerization component (12) described later. The donor-acceptor type semiconductor polymer compound means a polymer compound in which donor units and acceptor units are alternately arranged. A donor unit means an electron-donating structural unit, and an acceptor-like unit means an electron-accepting structural unit. The donor-acceptor type semiconductor polymer compound is preferably a polymer compound in which the structural unit represented by the formula (1) and the copolymerization component (12) described later are alternately arranged. With such a structure, it can be suitably used as a p-type organic semiconductor compound.
 上記式(1)で表されるベンゾビスチアゾール構造単位では、T1、T2は、それぞれ独立に、アルコキシ基であるか、チオアルコキシ基であるか、チオフェン環であるか、チアゾール環であるか、フェニル基を表す。チオフェン環は、炭化水素基またはオルガノシリル基で置換されていてもよく、チアゾール環は、炭化水素基またはオルガノシリル基で置換されていてもよく、フェニル基は、炭化水素基、オルガノシリル基、アルコキシ基、チオアルコキシ基、トリフルオロメチル基、またはハロゲン原子で置換されていてもよい。上記ハロゲン原子としては、フッ素、塩素、臭素、ヨウ素のいずれも用いることができる。 In the benzobisthiazole structural unit represented by the above formula (1), T 1 and T 2 are independently an alkoxy group, a thioalkoxy group, a thiophene ring, or a thiazole ring, respectively. Or represents a phenyl group. The thiophene ring may be substituted with a hydrocarbon group or an organosilyl group, the thiazole ring may be substituted with a hydrocarbon group or an organosilyl group, and the phenyl group may be a hydrocarbon group, an organosilyl group, It may be substituted with an alkoxy group, a thioalkoxy group, a trifluoromethyl group, or a halogen atom. As the halogen atom, any of fluorine, chlorine, bromine and iodine can be used.
 上記オルガノシリル基は、Si原子に1個以上の炭化水素基が置換した1価の基を意味するものとし、Si原子に置換する炭化水素基の数は、2個以上が好ましく、3個がさらに好ましい。 The organosilyl group means a monovalent group in which one or more hydrocarbon groups are substituted for Si atoms, and the number of hydrocarbon groups substituted for Si atoms is preferably two or more, preferably three. More preferred.
 上記T1、T2は、互いに同一であっても異なっていてもよいが、製造が容易である観点からは、同一であることが好ましい。 The T 1 and T 2 may be the same or different from each other, but are preferably the same from the viewpoint of easy production.
 上記T1、T2は、それぞれ独立に、下記式(t1)~式(t5)のいずれかで表される基が好ましい。即ち、上記T1、T2で表されるアルコキシ基としては下記式(t1)で表される基が好ましく、上記T1、T2で表されるチオアルコキシ基としては下記式(t2)で表される基が好ましく、上記T1、T2で表されるチオフェン環としては下記式(t3)で表される基が好ましく、上記T1、T2で表されるチアゾール環としては下記式(t4)で表される基が好ましく、上記T1、T2で表されるフェニル基としては下記式(t5)で表される基が好ましい。上記T1、T2が下記式(t1)~式(t5)のいずれかで表される基であると、短波長の光を吸収することができるとともに、高い平面性を有することから効率的にπ-πスタッキングが形成されるため、エネルギー変換効率PCEをより一層高めることができる。 The T 1 and T 2 are preferably groups represented by any of the following formulas (t1) to (t5) independently. That is, the alkoxy group represented by T 1 and T 2 is preferably the group represented by the following formula (t 1), and the thioalkoxy group represented by T 1 and T 2 is represented by the following formula (t 2). preferably a group represented, preferably a group represented by the following formula (t3) as thiophene ring represented by T 1, T 2, the following formula is a thiazole ring represented by T 1, T 2 The group represented by (t4) is preferable, and the phenyl group represented by T 1 and T 2 is preferably the group represented by the following formula (t 5). When the above T 1 and T 2 are groups represented by any of the following formulas (t1) to (t5), they can absorb light having a short wavelength and have high flatness, which is efficient. Since π-π stacking is formed in, the energy conversion efficiency PCE can be further improved.
Figure JPOXMLDOC01-appb-C000015
Figure JPOXMLDOC01-appb-C000015
 上記式(t1)~式(t5)中、R13、R14は、それぞれ独立に、炭素数6~30の炭化水素基を表す。R15、R16は、それぞれ独立に、炭素数6~30の炭化水素基、または*-Si(R183で表される基を表す。R17は、それぞれ独立に、炭素数6~30の炭化水素基、*-Si(R183、*-O-R19、*-S-R20、*-CF3、またはハロゲン原子を表す。n1は1~3の整数、n2は1または2、n3は1~5の整数をそれぞれ表し、複数のR15は同一でも異なっていてもよく、複数のR16は同一でも異なっていてもよく、複数のR17は同一でも異なっていてもよい。R18は、それぞれ独立に、炭素数1~20の脂肪族炭化水素基、または炭素数6~10の芳香族炭化水素基を表し、複数のR18は同一でも異なっていてもよい。R19、R20は、それぞれ独立に、炭素数6~30の炭化水素基を表す。*は、結合手を表す。 The formula (t1) in to Formula (t5), R 13, R 14 each independently represent a hydrocarbon group having 6 to 30 carbon atoms. R 15 and R 16 each independently represent a hydrocarbon group having 6 to 30 carbon atoms or a group represented by * -Si (R 18 ) 3 . Each of R 17 independently contains a hydrocarbon group having 6 to 30 carbon atoms, * -Si (R 18 ) 3 , * -OR 19 , * -SR 20 , * -CF 3 , or a halogen atom. Represent. n1 represents an integer of 1 to 3, n2 represents an integer of 1 or 2, n3 represents an integer of 1 to 5, and a plurality of R 15s may be the same or different, and a plurality of R 16s may be the same or different. , Multiple R 17s may be the same or different. Each of R 18 independently represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different. R 19 and R 20 each independently represent a hydrocarbon group having 6 to 30 carbon atoms. * Represents a bond.
 上記式(t1)~式(t5)において、R13~R17で表される炭素数6~30の炭化水素基としては、分岐を有する炭化水素基が好ましく、より好ましくは分岐鎖状飽和炭化水素基である。R13~R17で表される炭化水素基が分岐を有することにより、有機溶剤への溶解度を上げることができ、高分子化合物(1)は適度な結晶性を得ることができる。 In the above formulas (t1) to (t5), as the hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 , a branched hydrocarbon group is preferable, and a branched chain saturated hydrocarbon is more preferable. It is a hydrogen group. Since the hydrocarbon groups represented by R 13 to R 17 have branches, the solubility in an organic solvent can be increased, and the polymer compound (1) can obtain appropriate crystallinity.
 上記R13~R17で表される炭化水素基の炭素数は、大きいほど有機溶剤への溶解度を向上させることができるが、大きくなり過ぎると後述するカップリング反応における反応性が低下するため、高分子化合物(1)の合成が困難となる。そのためR13~R17で表される炭化水素基の炭素数は6~30が好ましく、より好ましくは8~25、更に好ましくは8~20、特に好ましくは8~16である。 The larger the number of carbon atoms of the hydrocarbon groups represented by R 13 to R 17 , the better the solubility in an organic solvent, but if it becomes too large, the reactivity in the coupling reaction described later will decrease. It becomes difficult to synthesize the polymer compound (1). Therefore, the number of carbon atoms of the hydrocarbon group represented by R 13 to R 17 is preferably 6 to 30, more preferably 8 to 25, still more preferably 8 to 20, and particularly preferably 8 to 16.
 上記R13~R17で表される炭化水素基としては、具体的には、n-ヘキシル基等の炭素数6のアルキル基;n-ヘプチル基等の炭素数7のアルキル基;n-オクチル基、1-n-ブチルブチル基、1-n-プロピルペンチル基、1-エチルヘキシル基、2-エチルヘキシル基、3-エチルヘキシル基、4-エチルヘキシル基、1-メチルヘプチル基、2-メチルヘプチル基、6-メチルヘプチル基、2,4,4-トリメチルペンチル基、2,5-ジメチルヘキシル基等の炭素数8のアルキル基;n-ノニル基、1-n-プロピルヘキシル基、2-n-プロピルヘキシル基、1-エチルヘプチル基、2-エチルヘプチル基、1-メチルオクチル基、2-メチルオクチル基、6-メチルオクチル基、2,3,3,4-テトラメチルペンチル基、3,5,5-トリメチルヘキシル基等の炭素数9のアルキル基;n-デシル基、1-n-ペンチルペンチル基、1-n-ブチルヘキシル基、2-n-ブチルヘキシル基、1-n-プロピルヘプチル基、1-エチルオクチル基、2-エチルオクチル基、1-メチルノニル基、2-メチルノニル基、3,7-ジメチルオクチル基等の炭素数10のアルキル基;n-ウンデシル基、1-n-ブチルヘプチル基、2-n-ブチルヘプチル基、1-n-プロピルオクチル基、2-n-プロピルオクチル基、1-エチルノニル基、2-エチルノニル基等の炭素数11のアルキル基;n-ドデシル基、1-n-ペンチルヘプチル基、2-n-ペンチルヘプチル基、1-n-ブチルオクチル基、2-n-ブチルオクチル基、1-n-プロピルノニル基、2-n-プロピルノニル基等の炭素数12のアルキル基;n-トリデシル基、1-n-ペンチルオクチル基、2-n-ペンチルオクチル基、1-n-ブチルノニル基、2-n-ブチルノニル基、1-メチルドデシル基、2-メチルドデシル基等の炭素数13のアルキル基;n-テトラデシル基、1-n-ヘプチルヘプチル基、1-n-ヘキシルオクチル基、2-n-ヘキシルオクチル基、1-n-ペンチルノニル基、2-n-ペンチルノニル基等の炭素数14のアルキル基;n-ペンタデシル基、1-n-ヘプチルオクチル基、1-n-ヘキシルノニル基、2-n-ヘキシルノニル基等の炭素数15のアルキル基;n-ヘキサデシル基、2-n-ヘキシルデシル基、1-n-オクチルオクチル基、1-n-ヘプチルノニル基、2-n-ヘプチルノニル基等の炭素数16のアルキル基;n-ヘプタデシル基、1-n-オクチルノニル基等の炭素数17のアルキル基;n-オクタデシル基、1-n-ノニルノニル基等の炭素数18のアルキル基;n-ノナデシル基等の炭素数19のアルキル基;n-エイコシル基、2-n-オクチルドデシル基等の炭素数20のアルキル基;n-ヘンエイコシル基等の炭素数21のアルキル基;n-ドコシル基等の炭素数22のアルキル基;n-トリコシル基等の炭素数23のアルキル基;n-テトラコシル基、2-n-デシルテトラデシル基等の炭素数24のアルキル基;等が挙げられる。中でも、特に好ましくは2-エチルヘキシル基、3,7-ジメチルオクチル基、2-n-ブチルオクチル基、2-n-ヘキシルデシル基、2-n-オクチルドデシル基、2-n-デシルテトラデシル基である。R13~R17で表される炭化水素基が上記の基であると、高分子化合物(1)は、有機溶剤への溶解度が向上し、適度な結晶性を有する。 Specific examples of the hydrocarbon group represented by R 13 to R 17 include an alkyl group having 6 carbon atoms such as an n-hexyl group; an alkyl group having 7 carbon atoms such as an n-heptyl group; and n-octyl. Group, 1-n-butylbutyl group, 1-n-propylpentyl group, 1-ethylhexyl group, 2-ethylhexyl group, 3-ethylhexyl group, 4-ethylhexyl group, 1-methylheptyl group, 2-methylheptyl group, 6 -Alkyl group having 8 carbon atoms such as methylheptyl group, 2,4,4-trimethylpenttyl group, 2,5-dimethylhexyl group; n-nonyl group, 1-n-propylhexyl group, 2-n-propylhexyl Group, 1-ethylheptyl group, 2-ethylheptyl group, 1-methyloctyl group, 2-methyloctyl group, 6-methyloctyl group, 2,3,3,4-tetramethylpentyl group, 3,5,5 -Alkyl group having 9 carbon atoms such as trimethylhexyl group; n-decyl group, 1-n-pentylpentyl group, 1-n-butylhexyl group, 2-n-butylhexyl group, 1-n-propylheptyl group, Alkyl group having 10 carbon atoms such as 1-ethyloctyl group, 2-ethyloctyl group, 1-methylnonyl group, 2-methylnonyl group, 3,7-dimethyloctyl group; n-undecyl group, 1-n-butylheptyl group , 2-n-butylheptyl group, 1-n-propyloctyl group, 2-n-propyloctyl group, 1-ethylnonyl group, 2-ethylnonyl group and other 11-carbon alkyl groups; n-dodecyl group, 1- 12 carbon atoms such as n-pentylheptyl group, 2-n-pentylheptyl group, 1-n-butyloctyl group, 2-n-butyloctyl group, 1-n-propylnonyl group, 2-n-propylnonyl group, etc. Alkyl group; n-tridecyl group, 1-n-pentyloctyl group, 2-n-pentyloctyl group, 1-n-butylnonyl group, 2-n-butylnonyl group, 1-methyldodecyl group, 2-methyldodecyl group Such as an alkyl group having 13 carbon atoms; n-tetradecyl group, 1-n-heptyl heptyl group, 1-n-hexyl octyl group, 2-n-hexyl octyl group, 1-n-pentyl nonyl group, 2-n- 14-carbon alkyl group such as pentyl-nonyl group; 15-carbon alkyl group such as n-pentadecyl group, 1-n-heptyloctyl group, 1-n-hexylnonyl group, 2-n-hexylnonyl group; n -Hexadecyl group, 2-n-hexyldecyl group, 1-n-octyloctyl group, 1-n-heptylnonyl group, 2-n-hepti Alkyl group having 16 carbon atoms such as lunayl group; alkyl group having 17 carbon atoms such as n-heptadecyl group and 1-n-octylnonyl group; alkyl having 18 carbon atoms such as n-octadecyl group and 1-n-nonylnonyl group. Group; Alkyl group having 19 carbon atoms such as n-nonadecyl group; Alkyl group having 20 carbon atoms such as n-eicosyl group and 2-n-octyldodecyl group; Alkyl group having 21 carbon atoms such as n-heneicosyl group; n -Alkyl group having 22 carbon atoms such as docosyl group; alkyl group having 23 carbon atoms such as n-tricosyl group; alkyl group having 24 carbon atoms such as n-tetracosyl group and 2-n-decyltetradecyl group; and the like. Be done. Among them, particularly preferably 2-ethylhexyl group, 3,7-dimethyloctyl group, 2-n-butyloctyl group, 2-n-hexyldecyl group, 2-n-octyldodecyl group, 2-n-decyltetradecyl group. Is. When the hydrocarbon group represented by R 13 to R 17 is the above group, the polymer compound (1) has improved solubility in an organic solvent and has appropriate crystallinity.
 上記R13~R17で表される炭化水素基は、特に炭素数8~16の分岐鎖状アルキル基が好ましい。 The hydrocarbon group represented by R 13 to R 17 is particularly preferably a branched chain alkyl group having 8 to 16 carbon atoms.
 上記式(t3)~式(t5)において、R15~R17で表される*-Si(R183の基におけるR18は、それぞれ独立に、炭素数1~20の脂肪族炭化水素基、または炭素数6~10の芳香族炭化水素基を表し、複数のR18は同一でも異なっていてもよい。R15~R17が*-Si(R183で表される基であると、高分子化合物(1)は、有機溶剤への溶解度が向上する。 The formula (t3) ~ formula (t5), R 18 in the * -Si (R 18) 3 of the groups represented by R 15 ~ R 17 are each independently of 1 to 20 carbon atoms aliphatic hydrocarbon It represents a group or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different. When R 15 to R 17 are groups represented by * -Si (R 18 ) 3 , the solubility of the polymer compound (1) in an organic solvent is improved.
 上記R17で表されるハロゲン原子は、フッ素、塩素、臭素、ヨウ素が好ましい。 The halogen atom represented by R 17 is preferably fluorine, chlorine, bromine or iodine.
 上記R18で表される脂肪族炭化水素基の炭素数は、好ましくは1~18であり、より好ましくは1~8である。R18で表される脂肪族炭化水素基としては、例えば、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、tert-ブチル基、イソブチル基、n-ペンチル基、tert-ペンチル基、イソペンチル基、n-ヘキシル基、n-ヘプチル基、n-オクチル基、2-エチルヘキシル基、n-ノニル基、n-デシル基、n-ウンデシル基、n-ドデシル基、2-オクチルブチル基、n-トリデシル基、n-テトラデシル基、n-ペンタデシル基、n-ヘキサデシル基、2-ヘキサデシル基、n-ヘプタデシル基、オクタデシル基等が挙げられる。R18で表される芳香族炭化水素基の炭素数は、好ましくは6~8であり、より好ましくは6または7であり、特に好ましくは6である。R18で表される芳香族炭化水素基としては、例えば、フェニル基等が挙げられる。中でも、R18としては、炭素数1~20の脂肪族炭化水素基が好ましく、より好ましくは分岐を有する炭素数1~20の脂肪族炭化水素基であり、特に好ましくはイソプロピル基である。 The number of carbon atoms of the aliphatic hydrocarbon group represented by R 18 is preferably 1 to 18, and more preferably 1 to 8. Examples of the aliphatic hydrocarbon group represented by R 18 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, a tert-butyl group, an isobutyl group, an n-pentyl group and a tert-. Pentyl group, isopentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethylhexyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group, 2-octylbutyl Examples thereof include a group, an n-tridecyl group, an n-tetradecyl group, an n-pentadecyl group, an n-hexadecyl group, a 2-hexadecyl group, an n-heptadecyl group and an octadecyl group. The number of carbon atoms of the aromatic hydrocarbon group represented by R 18 is preferably 6 to 8, more preferably 6 or 7, and particularly preferably 6. Examples of the aromatic hydrocarbon group represented by R 18 include a phenyl group and the like. Among them, R 18 is preferably an aliphatic hydrocarbon group having 1 to 20 carbon atoms, more preferably a branched aliphatic hydrocarbon group having 1 to 20 carbon atoms, and particularly preferably an isopropyl group.
 複数のR18は、同一でも異なっていてもよいが、同一であることが好ましい。 The plurality of R 18s may be the same or different, but are preferably the same.
 上記式(t3)~式(t5)において、R15~R17で表される*-Si(R183の基としては、具体的には、トリメチルシリル基、エチルジメチルシリル基、イソプロピルジメチルシリル基、トリイソプロピルシリル基、tert-ブチルジメチルシリル基、トリエチルシリル基、トリイソブチルシリル基、トリプロピルシリル基、トリブチルシリル基、ジメチルフェニルシリル基、メチルジフェニルシリル基等のアルキルシリル基;トリフェニルシリル基、tert-ブチルクロロジフェニルシリル基等のアリールシリル基;等が挙げられる。中でも、アルキルシリル基が好ましく、トリメチルシリル基またはトリイソプロピルシリル基が特に好ましい。 In the above formulas (t3) to (t5), the groups of * -Si (R 18 ) 3 represented by R 15 to R 17 are specifically trimethylsilyl groups, ethyldimethylsilyl groups, and isopropyldimethylsilyl groups. Alkylsilyl groups such as groups, triisopropylsilyl groups, tert-butyldimethylsilyl groups, triethylsilyl groups, triisobutylsilyl groups, tripropylsilyl groups, tributylsilyl groups, dimethylphenylsilyl groups, methyldiphenylsilyl groups; triphenylsilyl groups. Examples thereof include an arylsilyl group such as a tert-butylchlorodiphenylsilyl group; and the like. Of these, an alkylsilyl group is preferable, and a trimethylsilyl group or a triisopropylsilyl group is particularly preferable.
 上記式(t5)において、R17で表される*-O-R19または*-S-R20の基におけるR19またはR20は、それぞれ独立に、炭素数6~30の炭化水素基を表し、炭素数6~30の炭化水素基としては、上記R13~R17で表される炭素数6~30の炭化水素基として例示した基を好ましく用いることができる。 In the above formula (t5), R 19 or R 20 in the group * -O-R 19 or * -S-R 20 represented by R 17 are each independently a hydrocarbon group having 6 to 30 carbon atoms As the hydrocarbon group having 6 to 30 carbon atoms, the group exemplified as the hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 can be preferably used.
 上記式(t3)において、複数のR15は、同一でも異なっていてもよいが、同一であることが好ましい。n1は1または2が好ましく、より好ましくは1である。上記式(t4)において、複数のR16は、同一でも異なっていてもよいが、同一であることが好ましい。n2は1が好ましい。上記式(t5)において、複数のR17は、同一でも異なっていてもよいが、同一であることが好ましい。n3は1~3の整数が好ましく、より好ましくは1または2であり、更に好ましくは1である。 In the above formula (t3), the plurality of R 15s may be the same or different, but are preferably the same. n1 is preferably 1 or 2, more preferably 1. In the above formula (t4), the plurality of R 16s may be the same or different, but are preferably the same. n2 is preferably 1. In the above formula (t5), the plurality of R 17s may be the same or different, but are preferably the same. n3 is preferably an integer of 1 to 3, more preferably 1 or 2, and even more preferably 1.
 T1、T2としては、電子供与性の基、或いは電子求引性の基を用いることができる。電子供与性の基としては、式(t1)~式(t3)のいずれかで表される基が挙げられる。 As T 1 and T 2 , an electron donating group or an electron attracting group can be used. Examples of the electron donating group include a group represented by any of the formulas (t1) to (t3).
Figure JPOXMLDOC01-appb-C000016
Figure JPOXMLDOC01-appb-C000016
 上記式(t1)~式(t3)中、*は、ベンゾビスチアゾール構造単位のチアゾール環に結合する結合手を表す。 In the above formulas (t1) to (t3), * represents a bond that binds to the thiazole ring of the benzobisthiazole structural unit.
 上記R13~R15は、前記と同様の基を表す。n1は、上記と同義である。 The above R 13 to R 15 represent the same groups as described above. n1 is synonymous with the above.
 電子供与性の基としては、上記式(1)で表される構造単位全体として平面性に優れる観点から、上記式(t1)または上記式(t3)で表される基がより好ましく、上記式(t3)で表される基がさらに好ましく、下記式(t3-1)~(t3-16)で表される基が特に好ましい。下記式(t3-1)~(t3-16)中、*は結合手を表す。 As the electron donating group, the group represented by the above formula (t1) or the above formula (t3) is more preferable, and the above formula is more preferable from the viewpoint of excellent flatness as a whole structural unit represented by the above formula (1). The group represented by (t3) is more preferable, and the group represented by the following formulas (t3-1) to (t3-16) is particularly preferable. In the following formulas (t3-1) to (t3-16), * represents a bond.
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000017
Figure JPOXMLDOC01-appb-C000018
Figure JPOXMLDOC01-appb-C000018
 電子求引性の基としては、下記式(t4)または下記式(t5)で表される基が挙げられる。 Examples of the electron-attracting group include a group represented by the following formula (t4) or the following formula (t5).
Figure JPOXMLDOC01-appb-C000019
Figure JPOXMLDOC01-appb-C000019
 上記式(t4)、式(t5)中、*は、ベンゾビスチアゾール構造単位のチアゾール環に結合する結合手を表す。 In the above formulas (t4) and (t5), * represents a bond that binds to the thiazole ring of the benzobisthiazole structural unit.
 上記R16、R17は、前記と同様の基を表す。n2、n3は、上記と同義である。 The above R 16 and R 17 represent the same groups as described above. n2 and n3 are synonymous with the above.
 上記式(1)で表されるベンゾビスチアゾール構造単位では、B1、B2は、それぞれ独立に、チオフェン環であるか、チアゾール環であるか、またはエチニレン基を表す。チオフェン環は、炭化水素基で置換されていてもよく、チアゾール環は、炭化水素基で置換されていてもよい。 In the benzobisthiazole structural unit represented by the above formula (1), B 1 and B 2 independently represent a thiophene ring, a thiazole ring, or an ethynylene group. The thiophene ring may be substituted with a hydrocarbon group, and the thiazole ring may be substituted with a hydrocarbon group.
 上記B1、B2は、互いに同一であっても異なっていてもよいが、製造が容易である観点からは、同一であることが好ましい。 The above B 1 and B 2 may be the same or different from each other, but are preferably the same from the viewpoint of easy production.
 上記B1、B2は、それぞれ独立に、下記式(b1)~式(b3)のいずれかで表される基が好ましい。即ち、上記B1、B2で表されるチオフェン環としては下記式(b1)で表される基が好ましく、上記B1、B2で表されるチアゾール環としては下記式(b2)で表される基が好ましく、上記B1、B2で表されるエチニレン基としては下記式(b3)で表される基が好ましい。上記B1、B2が下記式(b1)、式(b2)で表される基であると、上記式(1)で表されるベンゾビスチアゾール構造単位全体として平面性に優れるとともに、得られる高分子化合物(1)全体としても平面性に優れる。また、上記B1、B2が下記式(b1)、式(b2)で表される基であると、ベンゾビスチアゾール構造単位中でS原子とN原子の相互作用が生じ、平面性がさらに向上する。その結果、エネルギー変換効率PCEをより一層高めることができる。 B 1 and B 2 are preferably groups represented by any of the following formulas (b1) to (b3) independently. That is, the thiophene ring represented by B 1 and B 2 is preferably a group represented by the following formula (b 1), and the thiazole ring represented by B 1 and B 2 is represented by the following formula (b 2). The group represented by the following formula (b3) is preferable as the ethynylene group represented by B 1 and B 2 . When the above B 1 and B 2 are groups represented by the following formulas (b1) and (b2), the benzobisthiazole structural unit represented by the above formula (1) as a whole is excellent in flatness and can be obtained. The polymer compound (1) as a whole has excellent flatness. Further, when the above B 1 and B 2 are groups represented by the following formulas (b1) and (b2), an interaction between S atoms and N atoms occurs in the benzobisthiazole structural unit, and the flatness is further improved. improves. As a result, the energy conversion efficiency PCE can be further increased.
Figure JPOXMLDOC01-appb-C000020
Figure JPOXMLDOC01-appb-C000020
 上記式(b1)~式(b3)中、R21、R22は、それぞれ独立に、炭素数6~30の炭化水素基を表す。n4は0~2の整数、n5は0または1を表し、複数のR21は同一でも異なっていてもよい。*は、結合手を表し、左側の*は、ベンゾビスチアゾール構造単位のベンゼン環に結合する結合手を表す。 In the above formulas (b1) to (b3), R 21 and R 22 each independently represent a hydrocarbon group having 6 to 30 carbon atoms. n4 represents an integer of 0 to 2, n5 represents 0 or 1, and a plurality of R 21s may be the same or different. * Represents a bond, and * on the left represents a bond that binds to the benzene ring of the benzobisthiazole structural unit.
 上記式(b1)、式(b2)において、R21、R22が炭素数6~30の炭化水素基であると、エネルギー変換効率PCEをより一層高められる可能性があるため好ましい。上記式(b1)、式(b2)において、R21、R22で表される炭素数6~30の炭化水素基としては、上記R13~R17で表される炭素数6~30の炭化水素基として例示した基を好ましく用いることができる。 In the above formulas (b1) and (b2), it is preferable that R 21 and R 22 are hydrocarbon groups having 6 to 30 carbon atoms because the energy conversion efficiency PCE may be further enhanced. In the above formulas (b1) and (b2), the hydrocarbon group having 6 to 30 carbon atoms represented by R 21 and R 22 is a hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 above. The group exemplified as the hydrogen group can be preferably used.
 上記式(b1)において、複数のR21は、同一でも異なっていてもよいが、同一であることが好ましい。n4は0または1が好ましく、より好ましくは0である。n4が0であると、ドナー-アクセプター型半導体ポリマーの形成が容易であるため好ましい。上記式(b2)において、n5は0が好ましい。n5が0であると、ドナー-アクセプター型半導体ポリマーの形成が容易であるため好ましい。 In the above formula (b1), the plurality of R 21s may be the same or different, but are preferably the same. n4 is preferably 0 or 1, more preferably 0. When n4 is 0, it is preferable because the donor-acceptor type semiconductor polymer can be easily formed. In the above formula (b2), n5 is preferably 0. When n5 is 0, it is preferable because the donor-acceptor type semiconductor polymer can be easily formed.
 上記式(1)で表されるベンゾビスチアゾール構造単位としては、具体的には、下記式(1-1)~式(1-48)で表される構造単位が挙げられる。 Specific examples of the benzobisthiazole structural unit represented by the above formula (1) include structural units represented by the following formulas (1-1) to (1-48).
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000021
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000022
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000023
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000024
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000025
Figure JPOXMLDOC01-appb-C000026
Figure JPOXMLDOC01-appb-C000026
 上記式(1)で表されるベンゾビスチアゾール構造単位を含む高分子化合物は、ドナー-アクセプター型半導体高分子化合物であることが好ましい。 The polymer compound containing the benzobisthiazole structural unit represented by the above formula (1) is preferably a donor-acceptor type semiconductor polymer compound.
 上記式(1)で表されるベンゾビスチアゾール構造単位と組み合わせて、ドナー-アクセプター型半導体高分子化合物を形成する共重合成分(12)としては、従来公知の構造単位を用いることができ、共重合成分(12)は、ドナー性ユニットであってもよいし、アクセプター性ユニットであってもよい。共重合成分(12)としては、具体的には、以下の構造単位を挙げることができる。 Conventionally known structural units can be used as the copolymerization component (12) for forming the donor-acceptor type semiconductor polymer compound in combination with the benzobisthiazole structural unit represented by the above formula (1). The polymerization component (12) may be a donor unit or an acceptor unit. Specific examples of the copolymerization component (12) include the following structural units.
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000027
Figure JPOXMLDOC01-appb-C000028
Figure JPOXMLDOC01-appb-C000028
 [式(c1)~(c45)中、R30~R81は、それぞれ独立に、上記R13~R17で表される炭素数6~30の炭化水素基と同様の基を表し、A30、A31は、それぞれ独立に、T1、T2と同様の基を表し、具体的には、アルコキシ基であるか、チオアルコキシ基であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチオフェン環であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチアゾール環であるか、炭化水素基、オルガノシリル基、アルコキシ基、チオアルコキシ基、トリフルオロメチル基、またはハロゲン原子で置換されていてもよいフェニル基を表す。式(c13)中、jは0~4の整数を表す。●は、式(1)で表されるベンゾビスチアゾール構造単位のB1またはB2に結合する結合手を表す。] [In the formulas (c1) to (c45), R 30 to R 81 each independently represent a group similar to the hydrocarbon group having 6 to 30 carbon atoms represented by R 13 to R 17 , and A 30 , A 31 independently represent the same groups as T 1 and T 2, and are specifically substituted with an alkoxy group, a thioalkoxy group, a hydrocarbon group or an organosilyl group, respectively. It may be a thiophene ring, a thiazole ring which may be substituted with a hydrocarbon group or an organosilyl group, a hydrocarbon group, an organosilyl group, an alkoxy group, a thioalkoxy group, a trifluoromethyl group, or Represents a phenyl group that may be substituted with a halogen atom. In equation (c13), j represents an integer from 0 to 4. ● represents a bond that binds to B 1 or B 2 of the benzobisthiazole structural unit represented by the formula (1). ]
 上記式(c1)~式(c32)で表される基は、アクセプター性ユニットとして作用する基であり、上記式(c34)~式(c45)で表される基は、ドナー性ユニットとして作用する基である。 The groups represented by the above formulas (c1) to (c32) act as acceptor units, and the groups represented by the above formulas (c34) to (c45) act as donor units. Is the basis.
 上記式(c33)で表される基は、A30、A31の種類により、アクセプター性ユニットとして作用することもあれば、ドナー性ユニットとして作用することもある。 The group represented by the above formula (c33) may act as an acceptor unit or a donor unit depending on the types of A 30 and A 31 .
 上記高分子化合物(1)中の式(1)で表される構造単位と、共重合成分(12)の繰り返し単位の比率は、特段の制限は無いが、通常1モル%以上が好ましく、より好ましくは5モル%以上、さらに好ましくは15モル%以上、特に好ましくは30モル%以上である。一方、通常99モル%以下が好ましく、より好ましくは95モル%以下、さらに好ましくは85モル%以下、特に好ましくは70モル%以下である。なお、式(1)で表される構造単位と、共重合成分(12)の繰り返し単位の比率は、式(1)で表される構造単位の分子量と、式(1)で表される構造単位と共重合する共重合成分(12)の分子量に基づいて算出すればよい。 The ratio of the structural unit represented by the formula (1) in the polymer compound (1) to the repeating unit of the copolymerization component (12) is not particularly limited, but is usually preferably 1 mol% or more. It is preferably 5 mol% or more, more preferably 15 mol% or more, and particularly preferably 30 mol% or more. On the other hand, it is usually preferably 99 mol% or less, more preferably 95 mol% or less, still more preferably 85 mol% or less, and particularly preferably 70 mol% or less. The ratio of the structural unit represented by the formula (1) to the repeating unit of the copolymerization component (12) is the molecular weight of the structural unit represented by the formula (1) and the structure represented by the formula (1). It may be calculated based on the molecular weight of the copolymerization component (12) that copolymerizes with the unit.
 上記高分子化合物(1)において、上記式(1)で表されるベンゾビスチアゾール構造単位と、共重合成分(12)との配列状態は、交互、ブロックおよびランダムのいずれでもよい。すなわち、上記高分子化合物(1)は、交互コポリマー、ブロックコポリマー、およびランダムコポリマーのいずれでもよく、より好ましくは交互コポリマーである。 In the polymer compound (1), the arrangement state of the benzobisthiazole structural unit represented by the formula (1) and the copolymerization component (12) may be alternating, blocked or random. That is, the polymer compound (1) may be any of an alternating copolymer, a block copolymer, and a random copolymer, and more preferably an alternating copolymer.
 上記高分子化合物(1)において、上記式(1)で表されるベンゾビスチアゾール構造単位および共重合成分(12)は、それぞれ1種のみを含んでいてもよい。また、上記式(1)で表されるベンゾビスチアゾール構造単位を2種以上含んでいてもよいし、また、共重合成分(12)を2種以上含んでいてもよい。上記式(1)で表されるベンゾビスチアゾール構造単位および共重合成分(12)の種類に制限はないが、通常8以下が好ましく、より好ましくは5以下である。特に好ましくは式(1)で表されるベンゾビスチアゾール構造単位のうち1種と、共重合成分(12)のうち1種を交互に含んでいる高分子化合物(1)であり、最も好ましくは式(1)で表される構成単位1種のみと、共重合成分(12)1種のみを交互に含んでいる高分子化合物(1)である。 In the polymer compound (1), the benzobisthiazole structural unit represented by the formula (1) and the copolymerization component (12) may each contain only one type. Further, two or more kinds of benzobisthiazole structural units represented by the above formula (1) may be contained, and two or more kinds of copolymerization component (12) may be contained. The type of the benzobisthiazole structural unit and the copolymerization component (12) represented by the above formula (1) is not limited, but is usually preferably 8 or less, and more preferably 5 or less. Particularly preferably, it is a polymer compound (1) containing one of the benzobisthiazole structural units represented by the formula (1) and one of the copolymerization components (12) alternately, and most preferably. It is a polymer compound (1) containing only one type of structural unit represented by the formula (1) and only one type of copolymerization component (12) alternately.
 上記高分子化合物(1)の好ましい具体例を以下に示す。以下の具体例において、RTはn-オクチル基、2-エチルヘキシル基、3,7-ジメチルオクチル基、2-n-ブチルオクチル基、2-n-ヘキシルデシル基、2-n-オクチルドデシル基、2-n-デシルテトラデシル基、トリイソプロピルシリル基を表す。R43はn-オクチル基、2-エチルヘキシル基、3,7-ジメチルオクチル基、2-n-ブチルオクチル基、2-n-ヘキシルデシル基を表す。高分子化合物(1)が複数の繰り返し単位を含む場合は、各繰り返し単位の数の比率は任意である。 Preferred specific examples of the above polymer compound (1) are shown below. In the following specific examples, RT is an n-octyl group, a 2-ethylhexyl group, a 3,7-dimethyloctyl group, a 2-n-butyloctyl group, a 2-n-hexyldecyl group, a 2-n-octyldodecyl group. , 2-n-decyltetradecyl group, triisopropylsilyl group. R 43 represents an n-octyl group, a 2-ethylhexyl group, a 3,7-dimethyloctyl group, a 2-n-butyloctyl group, and a 2-n-hexyldecyl group. When the polymer compound (1) contains a plurality of repeating units, the ratio of the number of each repeating unit is arbitrary.
Figure JPOXMLDOC01-appb-C000029
Figure JPOXMLDOC01-appb-C000029
 上記高分子化合物(1)は、長波長領域(600nm以上)に吸収を持つことが好ましい。また、高分子化合物(1)を用いた光電変換素子は、高い開放電圧(Voc)を示し、高いエネルギー変換効率PCEを示す。高分子化合物(1)をp型有機半導体化合物とし、後述する式(2)で表される芳香族性化合物および/または式(3)で表される芳香族性化合物をn型有機半導体化合物として組み合わせると、特に高いエネルギー変換効率PCEを示す。また、上記高分子化合物(1)は、HOMOエネルギー準位が低く酸化されにくい利点もある。また、上記高分子化合物(1)は溶媒に対して高溶解性を示すために、塗布成膜が容易であるという利点がある。また、塗布成膜を行う際に溶媒の選択の幅が広がるために、成膜により適した溶媒を選択でき、形成された活性層の膜質を向上させることができる。このことも、上記高分子化合物(1)を用いた光電変換素子が高いエネルギー変換効率PCEを示す一因であると考えられる。 The polymer compound (1) preferably has absorption in a long wavelength region (600 nm or more). Further, the photoelectric conversion element using the polymer compound (1) exhibits a high open circuit voltage (Voc) and a high energy conversion efficiency PCE. The polymer compound (1) is a p-type organic semiconductor compound, and the aromatic compound represented by the formula (2) described later and / or the aromatic compound represented by the formula (3) is an n-type organic semiconductor compound. When combined, they exhibit particularly high energy conversion efficiency PCE. In addition, the polymer compound (1) has an advantage that the HOMO energy level is low and it is difficult to be oxidized. Further, since the polymer compound (1) exhibits high solubility in a solvent, it has an advantage that coating film formation is easy. Further, since the range of selection of the solvent is widened when the coating film is formed, a solvent more suitable for the film formation can be selected, and the film quality of the formed active layer can be improved. This is also considered to be one of the reasons why the photoelectric conversion element using the polymer compound (1) exhibits high energy conversion efficiency PCE.
 上記高分子化合物(1)の重量平均分子量(Mw)は、一般に、2000以上、500000以下が好ましく、より好ましくは3000以上、200000以下である。上記高分子化合物(1)の数平均分子量(Mn)は、一般に、2000以上、500000以下が好ましく、より好ましくは3000以上、200000以下である。上記高分子化合物(1)の重量平均分子量(Mw)、数平均分子量(Mn)は、ゲル浸透クロマトグラフィーを用い、標準試料としてポリスチレンを用いて作成した較正曲線に基づいて算出できる。 The weight average molecular weight (Mw) of the polymer compound (1) is generally preferably 2000 or more and 500,000 or less, and more preferably 3000 or more and 200,000 or less. The number average molecular weight (Mn) of the polymer compound (1) is generally preferably 2000 or more and 500,000 or less, and more preferably 3000 or more and 200,000 or less. The weight average molecular weight (Mw) and number average molecular weight (Mn) of the polymer compound (1) can be calculated based on a calibration curve prepared by using gel permeation chromatography and polystyrene as a standard sample.
 上記高分子化合物(1)の光吸収極大波長(λmax)は、400nm以上が好ましく、より好ましくは450nm以上であり、一方、通常1200nm以下が好ましく、より好ましくは1000nm以下、さらに好ましくは900nm以下である。また、半値幅は、通常10nm以上が好ましく、より好ましくは20nm以上であり、一方、通常300nm以下が好ましい。また、上記高分子化合物(1)の吸収波長領域は太陽光の吸収波長領域に近いほど望ましい。 The maximum light absorption wavelength (λmax) of the polymer compound (1) is preferably 400 nm or more, more preferably 450 nm or more, while usually 1200 nm or less, more preferably 1000 nm or less, still more preferably 900 nm or less. is there. The half width is usually preferably 10 nm or more, more preferably 20 nm or more, and usually 300 nm or less. Further, it is desirable that the absorption wavelength region of the polymer compound (1) is closer to the absorption wavelength region of sunlight.
 上記高分子化合物(1)の溶解度は特に限定は無いが、好ましくは25℃におけるクロロベンゼンに対する溶解度が通常0.1質量%以上、より好ましくは0.4質量%以上、さらに好ましくは0.8質量%以上であり、一方、通常30質量%以下が好ましく、より好ましくは20質量%以下である。溶解性が高いことは、活性層をより厚く成膜できる点で好ましい。 The solubility of the polymer compound (1) is not particularly limited, but the solubility in chlorobenzene at 25 ° C. is usually 0.1% by mass or more, more preferably 0.4% by mass or more, still more preferably 0.8% by mass. % Or more, on the other hand, usually 30% by mass or less, more preferably 20% by mass or less. High solubility is preferable in that the active layer can be formed thicker.
 上記高分子化合物(1)は分子間で相互作用するものが好ましい。本発明において、分子間で相互作用するということは、高分子化合物の分子間でのπ-πスタッキングの相互作用等によってポリマー鎖間の距離が短くなることを意味する。相互作用が強いほど、高分子化合物が高いキャリア移動度および/または結晶性を示す傾向がある。すなわち、分子間で相互作用する高分子化合物においては分子間での電荷移動が起こりやすいため、活性層(X)内のp型有機半導体化合物(高分子化合物(1))とn型有機半導体化合物との界面で生成した正孔(ホール)を効率よくアノード(A)へ輸送できると考えられる。 The polymer compound (1) is preferably one that interacts between molecules. In the present invention, the interaction between molecules means that the distance between polymer chains is shortened due to the interaction of π-π stacking between molecules of the polymer compound and the like. The stronger the interaction, the higher the carrier mobility and / or crystallinity of the polymeric compound tends to be. That is, since charge transfer between molecules is likely to occur in a polymer compound that interacts between molecules, a p-type organic semiconductor compound (polymer compound (1)) and an n-type organic semiconductor compound in the active layer (X) It is considered that the holes generated at the interface with and can be efficiently transported to the anode (A).
 次に、上記高分子化合物(1)を製造できる方法について説明する。 Next, a method capable of producing the above polymer compound (1) will be described.
 上記高分子化合物(1)は、上記式(1)で表されるベンゾビスチアゾール構造単位を有する化合物と、下記共重合成分(12)とをカップリング反応させることによって製造できる。 The polymer compound (1) can be produced by coupling a compound having a benzobisthiazole structural unit represented by the formula (1) with the following copolymer component (12).
 上記式(1)で表されるベンゾビスチアゾール構造単位を有する化合物は、例えば、国際公開第WO2016/132917号に記載の方法で製造できる。 The compound having the benzobisthiazole structural unit represented by the above formula (1) can be produced, for example, by the method described in International Publication No. WO2016 / 132917.
 上記式(1)で表されるベンゾビスチアゾール構造単位を有する化合物と、下記共重合成分(12)とのカップリング反応は、金属触媒の存在下で行えばよい。即ち、上記式(1)で表されるベンゾビスチアゾール構造単位を有する化合物と、下記式(C1)~(C45)で表される化合物のいずれかと反応させることによって行うことが可能である。こうして得られた高分子化合物(1)は、ドナー-アクセプター型高分子化合物となる。 The coupling reaction between the compound having the benzobisthiazole structural unit represented by the above formula (1) and the following copolymer component (12) may be carried out in the presence of a metal catalyst. That is, it can be carried out by reacting a compound having a benzobisthiazole structural unit represented by the above formula (1) with any of the compounds represented by the following formulas (C1) to (C45). The polymer compound (1) thus obtained becomes a donor-acceptor type polymer compound.
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000030
Figure JPOXMLDOC01-appb-C000031
Figure JPOXMLDOC01-appb-C000031
 [式(C1)~(C45)中、R30~R81は、それぞれ独立に、上記R13~R17で表される炭素数6~30の炭化水素基と同様の基を表し、A30、A31は、それぞれ独立に、T1、T2と同様の基を表し、具体的には、アルコキシ基であるか、チオアルコキシ基であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチオフェン環であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチアゾール環であるか、炭化水素基、オルガノシリル基、アルコキシ基、チオアルコキシ基、トリフルオロメチル基、またはハロゲン原子で置換されていてもよいフェニル基を表す。式(C13)中、jは0~4の整数を表す。Xはハロゲン原子を表す。] [In the formulas (C1) to (C45), R 30 to R 81 independently represent groups similar to the hydrocarbon groups having 6 to 30 carbon atoms represented by R 13 to R 17 , and A 30 , A 31 independently represent the same groups as T 1 and T 2, and are specifically substituted with an alkoxy group, a thioalkoxy group, a hydrocarbon group or an organosilyl group, respectively. It may be a thiophene ring, a thiazole ring which may be substituted with a hydrocarbon group or an organosilyl group, a hydrocarbon group, an organosilyl group, an alkoxy group, a thioalkoxy group, a trifluoromethyl group, or Represents a phenyl group that may be substituted with a halogen atom. In equation (C13), j represents an integer from 0 to 4. X represents a halogen atom. ]
 (その他のp型有機半導体化合物)
 上記活性層(X)は、p型有機半導体化合物として、上記高分子化合物(1)を含有し、更に、上記式(1)で表されるベンゾビスチアゾール構造単位を有しない有機半導体化合物(11)を含有してもよい。即ち、上記高分子化合物(1)と、有機半導体化合物(11)とを、混合および/または積層して上記活性層(X)を構成してもよい。併用できる有機半導体化合物(11)について、以下説明する。なお、有機半導体化合物(11)は、高分子有機半導体化合物であっても、低分子有機半導体化合物であってもよいが、高分子有機半導体化合物が好ましい。
(Other p-type organic semiconductor compounds)
The active layer (X) contains the polymer compound (1) as a p-type organic semiconductor compound, and further does not have the benzobisthiazole structural unit represented by the formula (1). ) May be contained. That is, the polymer compound (1) and the organic semiconductor compound (11) may be mixed and / or laminated to form the active layer (X). The organic semiconductor compound (11) that can be used in combination will be described below. The organic semiconductor compound (11) may be a high molecular weight organic semiconductor compound or a low molecular weight organic semiconductor compound, but a high molecular weight organic semiconductor compound is preferable.
 (有機半導体化合物(11))
 有機半導体化合物(11)としては、例えば、ポリチオフェン、ポリフルオレン、ポリフェニレンビニレン、ポリチエニレンビニレン、ポリアセチレンまたはポリアニリン等の共役コポリマー半導体化合物;アルキル基やその他の置換基で置換されたオリゴチオフェン等のコポリマー半導体化合物;二種以上のモノマー単位を共重合させたコポリマー半導体化合物;等が挙げられる。
(Organic semiconductor compound (11))
Examples of the organic semiconductor compound (11) include conjugated copolymer semiconductor compounds such as polythiophene, polyfluorene, polyphenylene vinylene, polythienylene vinylene, polyacetylene and polyaniline; copolymers such as oligothiophene substituted with an alkyl group or other substituents. Semiconductor compounds; copolymer semiconductor compounds obtained by copolymerizing two or more kinds of monomer units; and the like.
 共役コポリマーは、例えば、Handbook of Conducting Polymers,3rd Ed.(全2巻),2007、J.Polym. Sci.Part A:Polym.Chem.2013,51,743-768、J.Am.Chem.Soc.2009,131,13886-13887、Angew.Chem.Int.Ed.2013,52,8341-8344、Adv.Mater.2009,21,2093-2097等の公知文献に記載されたコポリマーやその誘導体、および記載されているモノマーの組み合わせによって合成し得るコポリマーを用いることができる。 Conjugated copolymers include, for example, Handbook of Control Polymers, 3rd Ed. (2 volumes in total), 2007, J. Mol. Polymer. Sci. Part A: Polym. Chem. 2013, 51, 743-768, J. Mol. Am. Chem. Soc. 2009,131,13886-13887, Angew.Chem. Int. Ed. 2013, 52, 8341-8344, Adv. Mater. Copolymers that can be synthesized by combining the copolymers and derivatives thereof described in known literature such as 2009, 21, 2093-2097, and the monomers described can be used.
 有機半導体化合物(11)は、一種の化合物でも複数種の化合物の混合物でもよい。有機半導体化合物(11)を用いることで吸収波長帯の追加による吸光量の増加などが期待できる。有機半導体化合物(11)の具体例としては以下のものが挙げられるが、以下のものに限定されるわけではない。 The organic semiconductor compound (11) may be one kind of compound or a mixture of a plurality of kinds of compounds. By using the organic semiconductor compound (11), it is expected that the amount of absorbance will increase due to the addition of the absorption wavelength band. Specific examples of the organic semiconductor compound (11) include, but are not limited to, the following.
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000032
Figure JPOXMLDOC01-appb-C000033
Figure JPOXMLDOC01-appb-C000033
 p型有機半導体化合物のHOMO(最高被占軌道)エネルギー準位は特に限定は無く、後述のn型有機半導体化合物の種類によって選択できる。特に、n型有機半導体化合物として、芳香族性化合物(2)および/または芳香族性化合物(3)と、フラーレン化合物を併用する場合、p型有機半導体化合物のHOMOエネルギー準位の下限は、通常-7eV以上が好ましく、より好ましくは-6.5eV以上、特に好ましくは-6.2eV以上である。一方、HOMOエネルギー準位の上限は、通常-4.0eV以下が好ましく、より好ましくは-4.5eV以下、特に好ましくは-5.1eV以下である。特に、p型有機半導体化合物のHOMOエネルギー準位が-6.2eV以上であることによりp型半導体としての特性が向上し、p型有機半導体化合物のHOMOエネルギー準位が-5.1eV以下であることによりp型有機半導体化合物の安定性が向上し、開放電圧(Voc)も向上する。 The HOMO (maximum occupied orbital) energy level of the p-type organic semiconductor compound is not particularly limited and can be selected depending on the type of the n-type organic semiconductor compound described later. In particular, when the aromatic compound (2) and / or the aromatic compound (3) and the fullerene compound are used in combination as the n-type organic semiconductor compound, the lower limit of the HOMO energy level of the p-type organic semiconductor compound is usually set. It is preferably −7 eV or higher, more preferably −6.5 eV or higher, and particularly preferably −6.2 eV or higher. On the other hand, the upper limit of the HOMO energy level is usually preferably -4.0 eV or less, more preferably -4.5 eV or less, and particularly preferably -5.1 eV or less. In particular, when the HOMO energy level of the p-type organic semiconductor compound is -6.2 eV or more, the characteristics as a p-type semiconductor are improved, and the HOMO energy level of the p-type organic semiconductor compound is -5.1 eV or less. As a result, the stability of the p-type organic semiconductor compound is improved, and the open circuit voltage (Voc) is also improved.
 p型有機半導体化合物のLUMO(最低空軌道)エネルギー準位は特に限定は無く、後述のn型有機半導体化合物の種類によって選択できる。特に、n型有機半導体化合物として、芳香族性化合物(2)および/または芳香族性化合物(3)と、フラーレン化合物を併用する場合、p型有機半導体化合物のLUMOエネルギー準位は、通常-4.5eV以上が好ましく、より好ましくは-4.3eV以上である。p型有機半導体化合物のLUMOエネルギー準位が-4.5eV以上であることによりn型有機半導体化合物への電子移動が起こりやすくなり短絡電流密度(Jsc)が向上する。一方、LUMOエネルギー準位の上限は、通常-2.5eV以下が好ましく、より好ましくは-2.7eV以下である。p型有機半導体化合物のLUMOエネルギー準位が-2.5eV以下であることにより、バンドギャップが調整され長波長の光エネルギーを有効に吸収でき、短絡電流密度(Jsc)が向上する。 The LUMO (minimum empty orbit) energy level of the p-type organic semiconductor compound is not particularly limited and can be selected depending on the type of the n-type organic semiconductor compound described later. In particular, when the aromatic compound (2) and / or the aromatic compound (3) and the fullerene compound are used in combination as the n-type organic semiconductor compound, the LUMO energy level of the p-type organic semiconductor compound is usually -4. It is preferably .5 eV or more, more preferably -4.3 eV or more. When the LUMO energy level of the p-type organic semiconductor compound is −4.5 eV or more, electron transfer to the n-type organic semiconductor compound is likely to occur, and the short-circuit current density (Jsc) is improved. On the other hand, the upper limit of the LUMO energy level is usually preferably −2.5 eV or less, more preferably −2.7 eV or less. When the LUMO energy level of the p-type organic semiconductor compound is −2.5 eV or less, the band gap is adjusted, long-wavelength light energy can be effectively absorbed, and the short-circuit current density (Jsc) is improved.
 p型有機半導体化合物のLUMOエネルギー準位が-4.5eV以上であることによりn型有機半導体化合物への電子移動が起こりやすくなり短絡電流密度(Jsc)が向上する。LUMOエネルギー準位およびHOMOエネルギー準位の算出方法は、理論的に計算値で求める方法と実際に測定する方法が挙げられる。理論的に計算値で求める方法としては、半経験的分子軌道法および非経験的分子軌道法が挙げられる。実際に測定する方法としては、紫外可視吸収スペクトル測定法または常温常圧下で、紫外線光電子分析装置(理研計器社製、「AC-3」)によりイオン化ポテンシャルを測定する方法が挙げられる。その中でも紫外線光電子分析装置を用いて測定することが好ましく、本発明では紫外線光電子分析装置として理研計器製の「AC-3」を用いるものとする。 When the LUMO energy level of the p-type organic semiconductor compound is -4.5 eV or more, electron transfer to the n-type organic semiconductor compound is likely to occur, and the short-circuit current density (Jsc) is improved. Examples of the method for calculating the LUMO energy level and the HOMO energy level include a method of theoretically calculating the calculated value and a method of actually measuring the LUMO energy level. Examples of the method for theoretically calculating the calculated value include a semi-empirical molecular orbital method and an ab initio molecular orbital method. Examples of the actual measurement method include an ultraviolet-visible absorption spectrum measurement method or a method of measuring the ionization potential with an ultraviolet photoelectron analyzer (“AC-3” manufactured by RIKEN Keiki Co., Ltd.) under normal temperature and pressure. Among them, it is preferable to measure using an ultraviolet photoelectron analyzer, and in the present invention, "AC-3" manufactured by RIKEN KEIKI is used as the ultraviolet photoelectron analyzer.
 [1.1.3 n型有機半導体化合物]
 上記活性層(X)は、下記式(2)で表される芳香族性化合物[芳香族性化合物(2)]、および/または、下記式(3)で表される芳香族性化合物[芳香族性化合物(3)]を含有する。
[1.1.3 n-type organic semiconductor compounds]
The active layer (X) is an aromatic compound [aromatic compound (2)] represented by the following formula (2) and / or an aromatic compound [fragrance] represented by the following formula (3). Group compound (3)] is contained.
 上記芳香族性化合物(2)、および芳香族性化合物(3)は、いずれもn型有機半導体化合物である。n型有機半導体化合物として芳香族性化合物(2)および/または芳香族性化合物(3)を用い、p型有機半導体化合物として、上記高分子化合物(1)を用いることによって、高速かつ効率的に電荷分離ができる。 The aromatic compound (2) and the aromatic compound (3) are both n-type organic semiconductor compounds. By using the aromatic compound (2) and / or the aromatic compound (3) as the n-type organic semiconductor compound and the above-mentioned polymer compound (1) as the p-type organic semiconductor compound, the speed and efficiency are increased. Charge separation is possible.
 (芳香族性化合物(2))
 芳香族性化合物(2)は、下記式(2)で表される化合物である。
(Aromatic compound (2))
The aromatic compound (2) is a compound represented by the following formula (2).
Figure JPOXMLDOC01-appb-C000034
Figure JPOXMLDOC01-appb-C000034
 上記式(2)中、R101~R116は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、ベンゼン環であるか、チオフェン環を表す。ベンゼン環は、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよく、チオフェン環は、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよい。R101~R116で表されるアルキル基、およびR101~R116で表されるベンゼン環またはチオフェン環に置換しているアルキル基は、炭素数1~10の炭化水素基が好ましく、炭化水素基は、直鎖状であってもよいし、分岐を有していてもよい。R101~R116で表されるアルコキシ基、およびR101~R116で表されるベンゼン環またはチオフェン環に置換しているアルコキシ基は、炭素数1~10の炭化水素基の一部の炭素が酸素に置き換わった基が好ましい。R101~R116で表されるチオアルコキシ基は、およびR101~R116で表されるベンゼン環またはチオフェン環に置換しているチオアルコキシ基は、炭素数1~10の炭化水素基の一部の炭素が硫黄に置き換わった基が好ましい。R101~R116は、それぞれ独立に、水素原子であるか、アルキル基であるか、フッ素原子であるか、アルキル基、アルコキシ基、またはチオアルコキシ基で置換されているベンゼン環であるか、アルキル基で置換されているチオフェン環が好ましく、特に、水素原子であるか、アルキル基で置換されているベンゼン環がより好ましい。 In the above formula (2), R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or benzene. It is a ring or represents a thiophene ring. The benzene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom, and the thiophene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom. The alkyl group represented by R 101 to R 116 and the alkyl group substituted with the benzene ring or thiophene ring represented by R 101 to R 116 are preferably hydrocarbon groups having 1 to 10 carbon atoms, and are hydrocarbons. The group may be linear or may have a branch. The alkoxy group represented by R 101 to R 116 and the alkoxy group substituted with the benzene ring or the thiophene ring represented by R 101 to R 116 are some carbons of the hydrocarbon group having 1 to 10 carbon atoms. A group in which is replaced with oxygen is preferable. The thioalkoxy group represented by R 101 to R 116 and the thioalkoxy group substituted with the benzene ring or thiophene ring represented by R 101 to R 116 are one of the hydrocarbon groups having 1 to 10 carbon atoms. A group in which the carbon of the portion is replaced with sulfur is preferable. Each of R 101 to R 116 is independently a hydrogen atom, an alkyl group, a fluorine atom, or a benzene ring substituted with an alkyl group, an alkoxy group, or a thioalkoxy group. A thiophene ring substituted with an alkyl group is preferable, and a benzene ring substituted with a hydrogen atom or an alkyl group is particularly preferable.
 上記芳香族性化合物(2)の好ましい具体例を以下に示す。 A preferable specific example of the aromatic compound (2) is shown below.
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000035
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000036
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000037
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000038
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000039
Figure JPOXMLDOC01-appb-C000040
Figure JPOXMLDOC01-appb-C000040
 (芳香族性化合物(3))
 芳香族性化合物(3)は、下記式(3)で表される化合物である。
(Aromatic compound (3))
The aromatic compound (3) is a compound represented by the following formula (3).
Figure JPOXMLDOC01-appb-C000041
Figure JPOXMLDOC01-appb-C000041
 上記式(3)中、R201~R214は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、ベンゼン環であるか、チオフェン環を表す。ベンゼン環は、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよく、チオフェン環は、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよい。R201~R214で表されるアルキル基、およびR201~R214で表されるベンゼン環またはチオフェン環に置換しているアルキル基は、炭素数1~10の炭化水素基が好ましく、炭化水素基は、直鎖状であってもよいし、分岐を有していてもよい。R201~R214で表されるアルコキシ基、およびR201~R214で表されるベンゼン環またはチオフェン環に置換しているアルコキシ基は、炭素数1~10の炭化水素基の一部の炭素が酸素に置き換わった基が好ましい。R201~R214で表されるチオアルコキシ基は、およびR201~R214で表されるベンゼン環またはチオフェン環に置換しているチオアルコキシ基は、炭素数1~10の炭化水素基の一部の炭素が硫黄に置き換わった基が好ましい。R201~R214は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、またはチオアルコキシ基で置換されているベンゼン環が好ましく、特に、水素原子であるか、アルキル基で置換されているベンゼン環がより好ましい。 In the above formula (3), R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or benzene. It is a ring or represents a thiophene ring. The benzene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom, and the thiophene ring may be substituted with an alkyl group, an alkoxy group, a thioalkoxy group, or a fluorine atom. The alkyl group represented by R 201 to R 214 and the alkyl group substituted with the benzene ring or the thiophene ring represented by R 201 to R 214 are preferably hydrocarbon groups having 1 to 10 carbon atoms, and are hydrocarbons. The group may be linear or may have a branch. The alkoxy group represented by R 201 to R 214 and the alkoxy group substituted with the benzene ring or the thiophene ring represented by R 201 to R 214 are carbons of a part of the hydrocarbon groups having 1 to 10 carbon atoms. A group in which is replaced with oxygen is preferable. The thioalkoxy group represented by R 201 to R 214 and the thioalkoxy group substituted with the benzene ring or thiophene ring represented by R 201 to R 214 are one of the hydrocarbon groups having 1 to 10 carbon atoms. A group in which carbon in the portion is replaced with sulfur is preferable. R 201 to R 214 are independently substituted with an alkyl group, an alkyl group, an alkoxy group, a fluorine atom, an alkyl group, an alkoxy group, or a thioalkoxy group, respectively. A benzene ring is preferable, and a benzene ring which is a hydrogen atom or is substituted with an alkyl group is more preferable.
 上記芳香族性化合物(3)の好ましい具体例を以下に示す。 A preferable specific example of the aromatic compound (3) is shown below.
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000045
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000046
Figure JPOXMLDOC01-appb-C000047
Figure JPOXMLDOC01-appb-C000047
 上記芳香族性化合物(2)と上記芳香族性化合物(3)とを比較すると、n型有機半導体化合物として上記芳香族性化合物(2)を用いた方が、エネルギー変換効率PCEが大きくなる傾向があるため好ましい。 Comparing the aromatic compound (2) and the aromatic compound (3), the energy conversion efficiency PCE tends to be higher when the aromatic compound (2) is used as the n-type organic semiconductor compound. It is preferable because there is.
 (その他のn型有機半導体化合物)
 上記活性層(X)は、n型有機半導体化合物として、上記芳香族性化合物(2)および/または芳香族性化合物(3)を含有し、更に、上記芳香族性化合物(2)および芳香族性化合物(3)以外のn型有機半導体化合物を含有してもよい。
(Other n-type organic semiconductor compounds)
The active layer (X) contains the aromatic compound (2) and / or the aromatic compound (3) as an n-type organic semiconductor compound, and further contains the aromatic compound (2) and the aromatic compound. An n-type organic semiconductor compound other than the sex compound (3) may be contained.
 即ち、上記芳香族性化合物(2)および/または芳香族性化合物(3)と、n型有機半導体化合物とを、混合および/または積層して上記活性層(X)を構成してもよい。併用できるn型有機半導体化合物について、以下説明する。なお、n型有機半導体化合物は、高分子有機半導体化合物であっても、低分子有機半導体化合物であってもよいが、高分子有機半導体化合物が好ましい。 That is, the active layer (X) may be formed by mixing and / or laminating the aromatic compound (2) and / or the aromatic compound (3) and the n-type organic semiconductor compound. The n-type organic semiconductor compound that can be used in combination will be described below. The n-type organic semiconductor compound may be a high molecular weight organic semiconductor compound or a low molecular weight organic semiconductor compound, but a high molecular weight organic semiconductor compound is preferable.
 上記芳香族性化合物(2)および芳香族性化合物(3)以外のn型有機半導体化合物としては、一般的に、その最低空軌道(LUMO)準位が-3.5~-4.5eVであるようなπ電子共役系化合物であり、例えば、チオフェン環およびベンゼン環を含むπ電子共役系化合物、フラーレンもしくはその誘導体、オクタアザポルフィリン等、p型有機半導体化合物の水素原子をフッ素原子に置換したパーフルオロ体(例えば、パーフルオロペンタセンやパーフルオロフタロシアニン)、ナフタレンテトラカルボン酸無水物、ナフタレンテトラカルボン酸ジイミド、ペリレンテトラカルボン酸無水物、ペリレンテトラカルボン酸ジイミド等の芳香族カルボン酸無水物やそのイミド化物を骨格として含む高分子化合物等を挙げる事ができる。これらのn型有機半導体化合物のうち、上記高分子化合物(1)と高速かつ効率的に電荷分離ができるためフラーレンもしくはその誘導体が好ましい。 As the n-type organic semiconductor compound other than the aromatic compound (2) and the aromatic compound (3), the lowest empty orbital (LUMO) level is generally -3.5 to -4.5 eV. A π-electron conjugated compound such as a π-electron conjugated compound, for example, a π-electron conjugated compound containing a thiophene ring and a benzene ring, fullerene or a derivative thereof, octaazaporphyrin, etc., in which the hydrogen atom of a p-type organic semiconductor compound is replaced with a fluorine atom. Aromatic carboxylic acid anhydrides such as perfluoro compounds (for example, perfluoropentacene and perfluorophthalocyanine), naphthalenetetracarboxylic acid anhydrides, naphthalenetetracarboxylic acid diimides, perylenetetracarboxylic acid anhydrides, and perylenetetracarboxylic acid diimides and the like. Examples thereof include polymer compounds containing an imidized product as a skeleton. Among these n-type organic semiconductor compounds, fullerenes or derivatives thereof are preferable because they can perform charge separation from the polymer compound (1) at high speed and efficiently.
 フラーレンやその誘導体としては、C60フラーレン、C70フラーレン、C76フラーレン、C78フラーレン、C84フラーレン、C240フラーレン、C540フラーレン、ミックスドフラーレン、フラーレンナノチューブ、およびこれらの一部が水素原子、ハロゲン原子、置換または無置換のアルキル基、アルケニル基、アルキニル基、アリール基、ヘテロアリール基、シクロアルキル基、シリル基、エーテル基、チオエーテル基、アミノ基、シリル基等によって置換されたフラーレン誘導体を挙げることができる。フラーレン誘導体としては、フェニル-C61-酪酸エステル、ジフェニル-C62-ビス(酪酸エステル)、フェニル-C71-酪酸エステル、フェニル-C85-酪酸エステルまたはチエニル-C61-酪酸エステルが好ましく、上記の酪酸エステルのアルコール部分の炭素数は1~30が好ましく、より好ましくは1~8、さらに好ましくは1~4、最も好ましくは1である。好ましいフラーレン誘導体を例示すると、フェニル-C61-酪酸メチルエステル([60]PCBM)、フェニル-C61-酪酸n-ブチルエステル([60]PCBnB)、フェニル-C61-酪酸イソブチルエステル([60]PCBiB)、フェニル-C61-酪酸n-ヘキシルエステル([60]PCBH)、フェニル-C61-酪酸n-オクチルエステル([60]PCBO)、ジフェニル-C62-ビス(酪酸メチルエステル)(ビス[60]PCBM)、フェニル-C71-酪酸メチルエステル([70]PCBM)、フェニル-C85-酪酸メチルエステル([84]PCBM)、チエニル-C61-酪酸メチルエステル([60]ThCBM)、C60ピロリジントリス酸、C60ピロリジントリス酸エチルエステル、N-メチルフラロピロリジン(MP-C60)、(1,2-メタノフラーレンC60)-61-カルボン酸、(1,2-メタノフラーレンC60)-61-カルボン酸t-ブチルエステル、特開2008-130889号公報等のメタロセン化フラーレン、米国特許第7,329,709号明細書等の環状エーテル基を有するフラーレンが挙げられる。これらを単一で用いても、2種類以上を混合して用いても問題ない。 Fullerenes and their derivatives include C60 fullerenes, C70 fullerenes, C76 fullerenes, C78 fullerenes, C84 fullerenes, C240 fullerenes, C540 fullerenes, mixed fullerenes, fullerene nanotubes, and some of these hydrogen atoms, halogen atoms, substitutions or absences. Examples thereof include fullerene derivatives substituted with substituted alkyl groups, alkenyl groups, alkynyl groups, aryl groups, heteroaryl groups, cycloalkyl groups, silyl groups, ether groups, thioether groups, amino groups, silyl groups and the like. As the fullerene derivative, phenyl-C61-butyric acid ester, diphenyl-C62-bis (butyric acid ester), phenyl-C71-butyric acid ester, phenyl-C85-butyric acid ester or thienyl-C61-butyric acid ester is preferable, and the above-mentioned butyric acid ester is used. The carbon number of the alcohol moiety is preferably 1 to 30, more preferably 1 to 8, still more preferably 1 to 4, and most preferably 1. Examples of preferred fullerene derivatives are phenyl-C61-butyric acid methyl ester ([60] PCBM), phenyl-C61-butyric acid n-butyl ester ([60] PCBnB), phenyl-C61-butyric acid isobutyl ester ([60] PCBiB). , Phenyl-C61-butyric acid n-hexyl ester ([60] PCBH), phenyl-C61-butyric acid n-octyl ester ([60] PCBO), diphenyl-C62-bis (butyric acid methyl ester) (bis [60] PCBM) , Phenyl-C71-butyric acid methyl ester ([70] PCBM), phenyl-C85-butyric acid methyl ester ([84] PCBM), thienyl-C61-butyric acid methyl ester ([60] ThCBM), C60 pyrrolidinetrisic acid, C60 pyrrolidine Trisic acid ethyl ester, N-methylfuraropyrrolidine (MP-C60), (1,2-methanoflarene C60) -61-carboxylic acid, (1,2-methanoflarene C60) -61-carboxylic acid t-butyl ester , Japanese Patent Application Laid-Open No. 2008-1330889, etc., metallosenized fullerene, and US Pat. No. 7,329,709, etc., which have a cyclic ether group. There is no problem whether these are used alone or in combination of two or more.
 <1.2 カソード(C)、アノード(A)>
 カソード(C)およびアノード(A)は、光吸収により生じた正孔および電子を捕集する機能を有する。したがって、一対の電極には、電子の捕集に適した電極[即ち、カソード(C)]と、正孔の捕集に適した電極[即ち、アノード(A)]とを用いることが好ましい。一対の電極は、いずれか一方が透光性であればよく、両方が透光性であっても構わない。透光性があるとは、太陽光を40%以上透過することを指す。また、透光性を有する透明電極の太陽光線透過率は70%以上であることが、透明電極を透過させて活性層(X)に光を到達させるために好ましい。光の透過率は、通常の分光光度計で測定できる。
<1.2 Cathode (C), Anode (A)>
The cathode (C) and anode (A) have a function of collecting holes and electrons generated by light absorption. Therefore, it is preferable to use an electrode suitable for collecting electrons [that is, a cathode (C)] and an electrode suitable for collecting holes [that is, an anode (A)] as the pair of electrodes. One of the pair of electrodes may be translucent, and both may be translucent. Translucent means that 40% or more of sunlight is transmitted. Further, it is preferable that the translucent transparent electrode has a sunlight transmittance of 70% or more in order to allow the transparent electrode to pass through and allow light to reach the active layer (X). The light transmittance can be measured with a normal spectrophotometer.
 カソード(C)は、活性層(X)で発生した電子をスムーズに取り出す機能を有する電極であることが好ましい。カソード(C)の膜厚は特に制限は無いが、通常10nm以上が好ましく、より好ましくは20nm以上、さらに好ましくは50nm以上である。一方、通常10μm以下が好ましく、より好ましくは1μm以下、さらに好ましくは500nm以下である。カソード(C)の膜厚が10nm以上であることにより、シート抵抗が抑えられ、カソード(C)の膜厚が10μm以下であることにより、光透過率を低下させずに光を電気に効率よく変換できる。カソード(C)が透明電極である場合には、光透過率とシート抵抗とを両立できる膜厚を選ぶ必要がある。カソード(C)のシート抵抗は特に制限は無いが、通常1Ω/sq以上が好ましく、一方、1000Ω/sq以下が好ましく、より好ましくは500Ω/sq以下、さらに好ましくは100Ω/sq以下である。 The cathode (C) is preferably an electrode having a function of smoothly extracting electrons generated in the active layer (X). The film thickness of the cathode (C) is not particularly limited, but is usually preferably 10 nm or more, more preferably 20 nm or more, and further preferably 50 nm or more. On the other hand, it is usually preferably 10 μm or less, more preferably 1 μm or less, still more preferably 500 nm or less. When the film thickness of the cathode (C) is 10 nm or more, the sheet resistance is suppressed, and when the film thickness of the cathode (C) is 10 μm or less, the light is efficiently transferred to electricity without lowering the light transmittance. Can be converted. When the cathode (C) is a transparent electrode, it is necessary to select a film thickness that can achieve both light transmittance and sheet resistance. The sheet resistance of the cathode (C) is not particularly limited, but is usually preferably 1 Ω / sq or more, while it is preferably 1000 Ω / sq or less, more preferably 500 Ω / sq or less, and further preferably 100 Ω / sq or less.
 アノード(A)は、活性層(X)で発生した正孔をスムーズに取り出す機能を有する電極であることが好ましい。アノード(A)の膜厚は特に制限は無いが、通常10nm以上が好ましく、より好ましくは20nm以上、さらに好ましくは50nm以上である。一方、通常10μm以下が好ましく、より好ましくは1μm以下、さらに好ましくは500nm以下である。アノード(A)の膜厚が10nm以上であることにより、シート抵抗が抑えられ、アノード(A)の膜厚が10μm以下であることにより、光透過率を低下させずに光を電気に効率よく変換できる。アノード(A)が透明電極である場合には、光透過率とシート抵抗とを両立できる膜厚を選ぶ必要がある。アノード(A)のシート抵抗は特に制限は無いが、通常1Ω/sq以上が好ましく、一方、1000Ω/sq以下が好ましく、より好ましくは500Ω/sq以下、さらに好ましくは100Ω/sq以下である。 The anode (A) is preferably an electrode having a function of smoothly extracting holes generated in the active layer (X). The film thickness of the anode (A) is not particularly limited, but is usually preferably 10 nm or more, more preferably 20 nm or more, and further preferably 50 nm or more. On the other hand, it is usually preferably 10 μm or less, more preferably 1 μm or less, still more preferably 500 nm or less. When the film thickness of the anode (A) is 10 nm or more, the sheet resistance is suppressed, and when the film thickness of the anode (A) is 10 μm or less, the light is efficiently transferred to electricity without lowering the light transmittance. Can be converted. When the anode (A) is a transparent electrode, it is necessary to select a film thickness capable of achieving both light transmittance and sheet resistance. The sheet resistance of the anode (A) is not particularly limited, but is usually preferably 1 Ω / sq or more, while it is preferably 1000 Ω / sq or less, more preferably 500 Ω / sq or less, and further preferably 100 Ω / sq or less.
 カソード(C)およびアノード(A)は、2層以上の積層構造を有していてもよい。また、カソード(C)およびアノード(A)に対して表面処理を行うことにより、特性(電気特性やぬれ特性等)を改良してもよい。 The cathode (C) and the anode (A) may have a laminated structure of two or more layers. Further, the characteristics (electrical characteristics, wet characteristics, etc.) may be improved by performing surface treatment on the cathode (C) and the anode (A).
 次に、カソード(C)とアノード(A)の材料について説明する。カソード(C)とアノード(A)の材料は、基材に対する積層構造によって異なる。 Next, the materials of the cathode (C) and the anode (A) will be described. The materials of the cathode (C) and the anode (A) differ depending on the laminated structure with respect to the substrate.
 (図1に示した光電変換素子の場合)
 図1に示したように、カソード(C)の一方の側に基材が配置され、カソード(C)の他方の側に活性層(X)が配置されている場合、カソード(C)の材料としては、例えば、酸化ニッケル、酸化錫、酸化インジウム、酸化インジウムスズ(ITO)、インジウム-ジルコニウム酸化物(IZO)、酸化チタンまたは酸化亜鉛等の導電性金属酸化物;金、白金、銀、クロム、アルミニウム、マグネシウムまたはコバルト等の金属あるいはその合金等が挙げられる。
(In the case of the photoelectric conversion element shown in FIG. 1)
As shown in FIG. 1, when the base material is arranged on one side of the cathode (C) and the active layer (X) is arranged on the other side of the cathode (C), the material of the cathode (C). Examples include conductive metal oxides such as nickel oxide, tin oxide, indium oxide, indium tin oxide (ITO), indium-zirconium oxide (IZO), titanium oxide or zinc oxide; gold, platinum, silver, chromium. , Metals such as aluminum, magnesium or cobalt, or alloys thereof.
 図1に示した光電変換素子では、カソード(C)が透光性を有することが好ましい。カソード(C)が透明電極である場合には、ITO、酸化亜鉛または酸化錫等の透光性がある導電性金属酸化物を用いることが好ましく、特にITOを用いることがより好ましい。 In the photoelectric conversion element shown in FIG. 1, it is preferable that the cathode (C) has translucency. When the cathode (C) is a transparent electrode, it is preferable to use a translucent conductive metal oxide such as ITO, zinc oxide or tin oxide, and it is more preferable to use ITO.
 カソード(C)の形成方法としては、蒸着法若しくはスパッタ法等の真空成膜方法、またはナノ粒子や前駆体を含有するインクを塗布して成膜する湿式塗布法等が挙げられる。 Examples of the method for forming the cathode (C) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
 アノード(A)の材料としては、例えば、白金、金、銀、銅、鉄、錫、亜鉛、アルミニウム、インジウム、クロム、リチウム、ナトリウム、カリウム、セシウム、カルシウムまたはマグネシウム等の金属およびその合金;フッ化リチウムやフッ化セシウム等の無機塩;酸化ニッケル、酸化アルミニウム、酸化リチウム、酸化インジウムスズ(ITO)または酸化セシウムのような金属酸化物;ポリチオフェン、ポリピロール、ポリアセチレン、トリフェニレンジアミンまたはポリアニリン等に、スルホン酸および/またはヨウ素等がドーピングされた導電性ポリマー、スルホニル基を置換基として有するポリチオフェン誘導体、アリールアミン等の導電性有機化合物等が挙げられる。電極保護の観点から、アノード(A)は、白金、金、銀、銅、鉄、錫、アルミニウム、カルシウムまたはインジウム等の金属およびこれらの金属を用いた合金から形成される金属電極が好ましい。 Examples of the material of the anode (A) include metals such as platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, cesium, calcium or magnesium and their alloys; Inorganic salts such as lithium oxide and cesium fluoride; metal oxides such as nickel oxide, aluminum oxide, lithium oxide, indium tin oxide (ITO) or cesium oxide; sulfone to polythiophene, polypyrrole, polyacetylene, triphenylenediamine or polyaniline, etc. Examples thereof include a conductive polymer doped with an acid and / or iodine, a polythiophene derivative having a sulfonyl group as a substituent, and a conductive organic compound such as arylamine. From the viewpoint of electrode protection, the anode (A) is preferably a metal electrode formed of a metal such as platinum, gold, silver, copper, iron, tin, aluminum, calcium or indium and an alloy using these metals.
 アノード(A)の形成方法としては、蒸着法若しくはスパッタ法等の真空成膜方法、またはナノ粒子や前駆体を含有するインクを塗布して成膜する湿式塗布法等が挙げられる。 Examples of the method for forming the anode (A) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
 (図2に示した光電変換素子の場合)
 図2に示したように、アノード(A)の一方の側に基材が配置され、アノード(A)の他方の側に活性層(X)が配置されている場合、カソード(C)の材料としては、例えば、白金、金、銀、銅、鉄、錫、亜鉛、アルミニウム、インジウム、クロム、リチウム、ナトリウム、カリウム、セシウム、カルシウム又はマグネシウム等の金属及びその合金;フッ化リチウムやフッ化セシウム等の無機塩;酸化ニッケル、酸化アルミニウム、酸化リチウム、酸化インジウムスズ(ITO)又は酸化セシウムのような金属酸化物等が挙げられる。電極保護の観点から、カソード(C)は、白金、金、銀、銅、鉄、錫、アルミニウム、カルシウム又はインジウム等の金属及びこれらの金属を用いた合金から形成される金属電極が好ましい。
(In the case of the photoelectric conversion element shown in FIG. 2)
As shown in FIG. 2, when the base material is arranged on one side of the anode (A) and the active layer (X) is arranged on the other side of the anode (A), the material of the cathode (C). Examples include metals such as platinum, gold, silver, copper, iron, tin, zinc, aluminum, indium, chromium, lithium, sodium, potassium, cesium, calcium or magnesium and their alloys; lithium fluoride and cesium fluoride. Inorganic salts such as: nickel oxide, aluminum oxide, lithium oxide, indium tin oxide (ITO), metal oxides such as cesium oxide, and the like. From the viewpoint of electrode protection, the cathode (C) is preferably a metal electrode formed of a metal such as platinum, gold, silver, copper, iron, tin, aluminum, calcium or indium and an alloy using these metals.
 カソード(C)の形成方法としては、蒸着法若しくはスパッタ法等の真空成膜方法、またはナノ粒子や前駆体を含有するインクを塗布して成膜する湿式塗布法等が挙げられる。 Examples of the method for forming the cathode (C) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
 アノード(A)の材料としては、例えば、酸化ニッケル、酸化錫、酸化インジウム、酸化インジウムスズ(ITO)、インジウム-ジルコニウム酸化物(IZO)、酸化チタン又は酸化亜鉛等の導電性金属酸化物;金、白金、銀、クロム又はコバルト等の金属あるいはその合金;ポリチオフェン、ポリピロール、ポリアセチレン、トリフェニレンジアミンまたはポリアニリン等に、スルホン酸および/またはヨウ素等がドーピングされた導電性ポリマー、スルホニル基を置換基として有するポリチオフェン誘導体、アリールアミン等の導電性有機化合物等が挙げられる。 Examples of the material of the anode (A) include conductive metal oxides such as nickel oxide, tin oxide, indium oxide, indium tin oxide (ITO), indium-zinc oxide (IZO), titanium oxide or zinc oxide; gold. , Platinum, silver, chromium, cobalt and other metals or alloys thereof; polythiophene, polypyrrole, polyacetylene, triphenylenediamine, polyaniline and the like, and having a conductive polymer and sulfonyl group doped with sulfonic acid and / or iodine as substituents. Examples thereof include polythiophene derivatives and conductive organic compounds such as arylamine.
 図2に示した光電変換素子では、アノード(A)が透光性を有することが好ましい。アノード(A)が透明電極である場合には、ITO、酸化亜鉛又は酸化錫等の透光性がある導電性金属酸化物を用いることが好ましく、特にITOを用いることが好ましい。 In the photoelectric conversion element shown in FIG. 2, it is preferable that the anode (A) has translucency. When the anode (A) is a transparent electrode, it is preferable to use a translucent conductive metal oxide such as ITO, zinc oxide or tin oxide, and it is particularly preferable to use ITO.
 アノード(A)の形成方法としては、蒸着法若しくはスパッタ法等の真空成膜方法、またはナノ粒子や前駆体を含有するインクを塗布して成膜する湿式塗布法等が挙げられる。 Examples of the method for forming the anode (A) include a vacuum film forming method such as a vapor deposition method or a sputtering method, or a wet coating method in which an ink containing nanoparticles or a precursor is applied to form a film.
 <1.3 基材(B)>
 光電変換素子は、通常は支持体となる基材(B)を有する。すなわち、基材(B)上に、電極としてカソード(C)、アノード(A)と、活性層(X)とが形成される。
<1.3 Base material (B)>
The photoelectric conversion element usually has a base material (B) as a support. That is, a cathode (C), an anode (A), and an active layer (X) are formed as electrodes on the base material (B).
 基材(B)の材料は、本発明の効果を著しく損なわない限り特に限定されない。基材(B)の材料の好適な例を挙げると、石英、ガラス、サファイアまたはチタニア等の無機材料;ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリエーテルスルホン、ポリイミド、ナイロン、ポリスチレン、ポリビニルアルコール、エチレンビニルアルコール共重合体、フッ素樹脂フィルム、塩化ビニル若しくはポリエチレン等のポリオレフィン、セルロース、ポリ塩化ビニリデン、アラミド、ポリフェニレンスルフィド、ポリウレタン、ポリカーボネート、ポリアリレート、ポリノルボルネンまたはエポキシ樹脂等の有機材料;紙または合成紙等の紙材料;ステンレス、チタンまたはアルミニウム等の金属に、絶縁性を付与するために表面をコートまたはラミネートしたもの等の複合材料;等である。ガラスとしてはソーダガラス、青板ガラスまたは無アルカリガラス等が挙げられる。ガラスからの溶出イオンが少ない点で、これらの中でも無アルカリガラスが好ましい。 The material of the base material (B) is not particularly limited as long as the effect of the present invention is not significantly impaired. Preferable examples of the material of the base material (B) are inorganic materials such as quartz, glass, sapphire or titania; polyethylene terephthalate, polyethylene naphthalate, polyether sulfone, polyimide, nylon, polystyrene, polyvinyl alcohol, ethylene vinyl alcohol. Copolymers, fluororesin films, polyolefins such as vinyl chloride or polyethylene, organic materials such as cellulose, polyvinylidene chloride, aramid, polyphenylene sulfide, polyurethane, polycarbonate, polyarylate, polynorbornene or epoxy resins; paper or synthetic paper, etc. Paper material; a composite material such as a metal such as stainless steel, titanium, or aluminum coated or laminated on the surface to impart insulating properties; and the like. Examples of the glass include soda glass, blue plate glass, non-alkali glass and the like. Of these, non-alkali glass is preferable because there are few elution ions from the glass.
 基材(B)の形状に制限はなく、例えば、板状、フィルム状、またはシート状等のものを用いることができる。 The shape of the base material (B) is not limited, and for example, a plate shape, a film shape, a sheet shape, or the like can be used.
 基材(B)の膜厚に制限はないが、通常5μm以上が好ましく、より好ましくは20μm以上であり、一方、通常20mm以下が好ましく、より好ましくは10mm以下である。基材(B)の膜厚が5μm以上であることは、光電変換素子の強度が不足する可能性が低くなるために好ましい。基材(B)の膜厚が20mm以下であることは、コストが抑えられ、かつ重量が重くならないために好ましい。特に、基材(B)の材料がガラスである場合の膜厚は、通常0.01mm以上が好ましく、より好ましくは0.1mm以上であり、一方、通常10mm以下が好ましく、より好ましくは5mm以下である。ガラス基材(B)の膜厚が0.01mm以上であることは、機械的強度が増加し、割れにくくなるために好ましい。また、ガラス基材(B)の膜厚が5mm以下であることは、重量が重くならないために好ましい。 The film thickness of the base material (B) is not limited, but is usually preferably 5 μm or more, more preferably 20 μm or more, while usually 20 mm or less, more preferably 10 mm or less. It is preferable that the film thickness of the base material (B) is 5 μm or more because the possibility that the strength of the photoelectric conversion element is insufficient is reduced. It is preferable that the film thickness of the base material (B) is 20 mm or less because the cost can be suppressed and the weight does not become heavy. In particular, when the material of the base material (B) is glass, the film thickness is usually preferably 0.01 mm or more, more preferably 0.1 mm or more, while it is usually preferably 10 mm or less, more preferably 5 mm or less. Is. It is preferable that the film thickness of the glass base material (B) is 0.01 mm or more because the mechanical strength increases and it becomes difficult to crack. Further, it is preferable that the film thickness of the glass base material (B) is 5 mm or less because the weight does not become heavy.
 <1.4 バッファ層(E)、(H)>
 光電変換素子は、活性層(X)とカソード(C)との間にバッファ層として電子輸送層(E)を有し、活性層(X)とアノード(A)との間にバッファ層としてホール輸送層(H)を有することが好ましい。バッファ層を設けることで、活性層(X)と、カソード(C)またはアノード(A)との間での電子または正孔の移動が容易となるほか、電極間の短絡が防止されうる。
<1.4 Buffer layers (E), (H)>
The photoelectric conversion element has an electron transport layer (E) as a buffer layer between the active layer (X) and the cathode (C), and holes as a buffer layer between the active layer (X) and the anode (A). It is preferable to have a transport layer (H). By providing the buffer layer, the movement of electrons or holes between the active layer (X) and the cathode (C) or the anode (A) can be facilitated, and a short circuit between the electrodes can be prevented.
 ホール輸送層(H)と電子輸送層(E)は、1対の電極(カソードとアノード)の間に、活性層(X)を挟むように配置される。すなわち、光電変換素子がホール輸送層(H)と電子輸送層(E)との両方を含む場合、アノード(A)、ホール輸送層(H)、活性層(X)、電子輸送層(E)、およびカソード(C)がこの順に配置される。光電変換素子がホール輸送層(H)を含み電子輸送層(E)を含まない場合は、アノード(A)、ホール輸送層(H)、活性層(X)、およびカソード(C)がこの順に配置される。光電変換素子が電子輸送層(E)を含みホール輸送層(H)を含まない場合は、アノード(A)、活性層(X)、電子輸送層(E)、およびカソード(C)がこの順に配置される。 The hole transport layer (H) and the electron transport layer (E) are arranged so as to sandwich the active layer (X) between a pair of electrodes (cathode and anode). That is, when the photoelectric conversion element includes both the hole transport layer (H) and the electron transport layer (E), the anode (A), the hole transport layer (H), the active layer (X), and the electron transport layer (E). , And the cathode (C) are arranged in this order. When the photoelectric conversion element contains the hole transport layer (H) and does not include the electron transport layer (E), the anode (A), the hole transport layer (H), the active layer (X), and the cathode (C) are in this order. Be placed. When the photoelectric conversion element contains the electron transport layer (E) and does not include the hole transport layer (H), the anode (A), the active layer (X), the electron transport layer (E), and the cathode (C) are in this order. Be placed.
 [1.4.1 電子輸送層(E)]
 電子輸送層(E)は、活性層(X)からカソード(C)へ電子の取り出しを行う層であり、電子取り出しの効率を向上させる電子輸送性の材料であれば特段の制限はなく、有機化合物でも無機化合物でもよいが、無機化合物が好ましい。
[1.4.1 Electron transport layer (E)]
The electron transport layer (E) is a layer for extracting electrons from the active layer (X) to the cathode (C), and is not particularly limited as long as it is an electron transporting material that improves the efficiency of electron extraction, and is organic. It may be a compound or an inorganic compound, but an inorganic compound is preferable.
 無機化合物の材料の好ましい例としては、リチウム、ナトリウム、カリウム、若しくはセシウム等のアルカリ金属の塩、または金属酸化物等が挙げられる。なかでも、アルカリ金属の塩としては、フッ化リチウム、フッ化ナトリウム、フッ化カリウム、またはフッ化セシウムのようなフッ化物塩が好ましい。金属酸化物としては、酸化チタン(TiOx)や酸化亜鉛(ZnO)のようなn型半導体特性を有する金属酸化物が好ましい。無機化合物の材料としてより好ましくは、酸化チタン(TiOx)または酸化亜鉛(ZnO)のような、n型半導体特性を有する金属酸化物である。特に好ましくは酸化チタン(TiOx)である。このような材料の動作機構は不明であるが、カソード(VI)と組み合わされた際に、仕事関数を小さくし、太陽電池素子内部に印加される電圧を上げる事が考えられる。 Preferred examples of the material of the inorganic compound include alkali metal salts such as lithium, sodium, potassium, and cesium, metal oxides, and the like. Among them, as the alkali metal salt, a fluoride salt such as lithium fluoride, sodium fluoride, potassium fluoride, or cesium fluoride is preferable. As the metal oxide, a metal oxide having n-type semiconductor characteristics such as titanium oxide (TiOx) and zinc oxide (ZnO) is preferable. A more preferable material for the inorganic compound is a metal oxide having n-type semiconductor properties, such as titanium oxide (TiOx) or zinc oxide (ZnO). Titanium oxide (diox) is particularly preferable. Although the operating mechanism of such a material is unknown, it is conceivable to reduce the work function and increase the voltage applied to the inside of the solar cell element when combined with the cathode (VI).
 電子輸送層(E)の膜厚は特に限定はないが、通常0.1nm以上が好ましく、より好ましくは0.5nm以上、さらに好ましくは1.0nm以上であり、一方、通常200nm以下が好ましく、より好ましくは150nm以下、さらに好ましくは100nm以下、特に好ましくは70nm以下である。電子輸送層(E)の膜厚が0.1nm以上であることでバッファ材料としての機能を果たすことになる。電子輸送層(E)の膜厚が200nm以下であることで電子が取り出しやすくなり、エネルギー変換効率PCEが向上しうる。 The film thickness of the electron transport layer (E) is not particularly limited, but is usually preferably 0.1 nm or more, more preferably 0.5 nm or more, still more preferably 1.0 nm or more, and usually 200 nm or less. It is more preferably 150 nm or less, further preferably 100 nm or less, and particularly preferably 70 nm or less. When the film thickness of the electron transport layer (E) is 0.1 nm or more, it functions as a buffer material. When the film thickness of the electron transport layer (E) is 200 nm or less, electrons can be easily taken out, and the energy conversion efficiency PCE can be improved.
 [1.4.2 ホール輸送層(H)]
 ホール輸送層(H)は、活性層(X)からアノード(A)へ正孔の取り出しを行う層であり、正孔取り出しの効率を向上させることが可能な正孔輸送性の材料であれば特に限定されない。具体的には、ポリチオフェン、ポリピロール、ポリアセチレン、トリフェニレンジアミンまたはポリアニリン等に、スルホン酸および/またはヨウ素等がドーピングされた導電性ポリマー、スルホニル基を置換基として有するポリチオフェン誘導体、アリールアミン等の導電性有機化合物、三酸化モリブデン、五酸化バナジウムまたは酸化ニッケル等のp型半導体特性を有する金属酸化物、上述のp型有機半導体化合物等が挙げられる。その中でも好ましくはスルホン酸をドーピングした導電性ポリマーが挙げられ、ポリチオフェン誘導体にポリスチレンスルホン酸をドーピングしたポリ(3,4-エチレンジオキシチオフェン)ポリ(スチレンスルホン酸)(PEDOT:PSS)、酸化モリブデンや酸化バナジウムなどの金属酸化物がより好ましい。また、金、インジウム、銀またはパラジウム等の金属等の薄膜も使用することができる。金属等の薄膜は、単独で形成してもよいし、上記の有機材料と組み合わせて用いることもできる。
[14.2 Hole Transport Layer (H)]
The hole transport layer (H) is a layer for extracting holes from the active layer (X) to the anode (A), and is a hole transporting material capable of improving the efficiency of hole extraction. There is no particular limitation. Specifically, a conductive polymer obtained by doping polythiophene, polypyrrole, polyacetylene, triphenylenediamine, polyaniline, etc. with sulfonic acid and / or iodine, a polythiophene derivative having a sulfonyl group as a substituent, a conductive organic substance such as arylamine, etc. Examples thereof include compounds, metal oxides having p-type semiconductor properties such as molybdenum trioxide, vanadium pentoxide or nickel oxide, and the above-mentioned p-type organic semiconductor compounds. Among them, a conductive polymer doped with sulfonic acid is preferable, and poly (3,4-ethylenedioxythiophene) poly (styrene sulfonic acid) (PEDOT: PSS) and molybdenum oxide obtained by doping a polythiophene derivative with polystyrene sulfonic acid can be mentioned. And metal oxides such as vanadium oxide are more preferred. Further, a thin film of a metal such as gold, indium, silver or palladium can also be used. The thin film such as metal may be formed alone or in combination with the above-mentioned organic material.
 ホール輸送層(H)の膜厚は特に限定はないが、通常0.2nm以上が好ましく、より好ましくは0.5nm以上、さらに好ましくは1.0nm以上であり、一方、通常400nm以下が好ましく、より好ましくは200nm以下、さらに好ましくは100nm以下、特に好ましくは70nm以下である。ホール輸送層(H)の膜厚が0.2nm以上であることでバッファ材料としての機能を果たすことになる。ホール輸送層(H)の膜厚が400nm以下であることで正孔が取り出し易くなり、エネルギー変換効率PCEが向上しうる。 The film thickness of the hole transport layer (H) is not particularly limited, but is usually preferably 0.2 nm or more, more preferably 0.5 nm or more, still more preferably 1.0 nm or more, and usually 400 nm or less. It is more preferably 200 nm or less, further preferably 100 nm or less, and particularly preferably 70 nm or less. When the film thickness of the hole transport layer (H) is 0.2 nm or more, it functions as a buffer material. When the film thickness of the hole transport layer (H) is 400 nm or less, holes can be easily taken out, and the energy conversion efficiency PCE can be improved.
 電子輸送層(E)およびホール輸送層(H)の形成方法に制限はない。例えば、昇華性を有する材料を用いる場合は、真空蒸着法等により形成できる。また、例えば、溶媒に可溶な材料を用いる場合は、スピンコートやインクジェット等の湿式塗布法等により形成できる。電子輸送層(E)に半導体化合物を用いる場合は、活性層(X)と同様に、半導体化合物前駆体を含む層を形成した後に、前駆体を半導体化合物に変換してもよい。 There are no restrictions on the method of forming the electron transport layer (E) and the hole transport layer (H). For example, when a material having sublimation property is used, it can be formed by a vacuum vapor deposition method or the like. Further, for example, when a material soluble in a solvent is used, it can be formed by a wet coating method such as spin coating or an inkjet. When a semiconductor compound is used for the electron transport layer (E), the precursor may be converted into the semiconductor compound after forming a layer containing the semiconductor compound precursor as in the active layer (X).
 <1.5 光電変換素子の製造方法>
 光電変換素子の製造方法に特に制限は無いが、下記の方法に従って作製できる。
<1.5 Manufacturing method of photoelectric conversion element>
The method for manufacturing the photoelectric conversion element is not particularly limited, but the photoelectric conversion element can be manufactured according to the following method.
 (光電変換素子(I))
 光電変換素子(I)は、基材(B)、カソード(C)、電子輸送層(E)、活性層(X)、ホール輸送層(H)、およびアノード(A)を順次積層することによって作製できる。なお、上述したように、電子輸送層(E)および/またはホール輸送層(H)は必ずしも設けなくてもよい。
(Photoelectric conversion element (I))
The photoelectric conversion element (I) is formed by sequentially laminating a base material (B), a cathode (C), an electron transport layer (E), an active layer (X), a hole transport layer (H), and an anode (A). Can be made. As described above, the electron transport layer (E) and / or the hole transport layer (H) may not necessarily be provided.
 上記光電変換素子(I)は、例えば、カソード(C)として酸化インジウムスズ(ITO)透明導電膜がパターニングされたガラス基板(ジオマテック社製)を、アセトンによる超音波洗浄、ついでエタノールによる超音波洗浄の後、窒素ブローで乾燥させ、UV-オゾン処理を実施しカソード付き基材(B)ができる。次いで、0.5M酢酸亜鉛・0.5Mアミノエタノール/2-メトキシエタノール溶液をスピンコーターで塗布(3000rpm、40秒)した後に175℃で30分間アニールすることによって、酸化亜鉛に変換した電子輸送層(E)を形成できる。次いで、グローブボックス内に搬入し、不活性ガス雰囲気下でp型有機半導体化合物とn型有機半導体化合物との混合溶液をスピンコートし、ホットプレート上でアニール処理もしくは減圧乾燥を実施することで活性層(X)を形成できる。次いで、減圧下にて酸化モリブデンを蒸着してホール輸送層(H)を作製できる。最後に電極である銀を蒸着し、これをアノード(A)とし、光電変換素子(I)を得ることができる。また、異なる構成を有する光電変換素子、例えば、電子輸送層(E)およびホール輸送層(H)のうちの少なくとも1つを有さない光電変換素子も、同様の方法によって作製できる。 In the photoelectric conversion element (I), for example, a glass substrate (manufactured by Geomatec) in which an indium tin oxide (ITO) transparent conductive film is patterned as a cathode (C) is ultrasonically cleaned with acetone, and then ultrasonically cleaned with ethanol. After that, it is dried by a nitrogen blow and UV-ozone treatment is carried out to form a base material (B) with a cathode. Next, an electron transport layer converted into zinc oxide by applying a 0.5 M zinc acetate / 0.5 M aminoethanol / 2-methoxyethanol solution with a spin coater (3000 rpm, 40 seconds) and then annealing at 175 ° C. for 30 minutes. (E) can be formed. Next, it is carried into a glove box, spin-coated with a mixed solution of a p-type organic semiconductor compound and an n-type organic semiconductor compound in an inert gas atmosphere, and activated by annealing or drying under reduced pressure on a hot plate. A layer (X) can be formed. Then, molybdenum oxide is vapor-deposited under reduced pressure to prepare a hole transport layer (H). Finally, silver, which is an electrode, is vapor-deposited, and this is used as an anode (A) to obtain a photoelectric conversion element (I). Further, a photoelectric conversion element having a different configuration, for example, a photoelectric conversion element having at least one of an electron transport layer (E) and a hole transport layer (H) can be manufactured by the same method.
 (光電変換素子(II))
 光電変換素子(II)は、基材(B)、アノード(A)、ホール輸送層(H)、活性層(X)、電子輸送層(E)、およびカソード(C)を順次積層することによって作製できる。なお、上述したように、電子輸送層(E)および/またはホール輸送層(H)は必ずしも設けなくてもよい。
(Photoelectric conversion element (II))
The photoelectric conversion element (II) is formed by sequentially laminating a base material (B), an anode (A), a hole transport layer (H), an active layer (X), an electron transport layer (E), and a cathode (C). Can be made. As described above, the electron transport layer (E) and / or the hole transport layer (H) may not necessarily be provided.
 上記光電変換素子(II)は、例えば、アノード(A)として酸化インジウムスズ(ITO)透明導電膜がパターニングされたガラス基板(ジオマテック社製)を、アセトンによる超音波洗浄、ついでエタノールによる超音波洗浄の後、窒素ブローで乾燥させ、UV-オゾン処理を実施しアノード付き基材(B)ができる。次いで、PEDOT-PSS(ポリ(3,4-エチレンジオキシチオフェン)-ポリ(スチレンスルホン酸))水分散体をスピンコーターで塗布(5000rpm、50秒)した後に200℃で10分間アニールすることによって、ホール輸送層(H)を形成できる。次いで、グローブボックス内に搬入し、不活性ガス雰囲気下でp型有機半導体化合物とn型有機半導体化合物との混合溶液をスピンコートし、ホットプレート上でアニール処理もしくは減圧乾燥を実施することで活性層(X)を形成できる。次いで、大気中にて、オルトチタン酸テトライソプロピルのエタノール溶液(約0.3v%)をスピンコートして雰囲気中の水分により酸化チタンに変換し、電子輸送層(E)を作製できる。最後に電極であるアルミニウムを蒸着し、これをカソード(C)とし、光電変換素子(II)を得ることができる。また、異なる構成を有する光電変換素子、例えば、ホール輸送層(H)および電子輸送層(E)のうちの少なくとも1つを有さない光電変換素子も、同様の方法によって作製できる。 In the photoelectric conversion element (II), for example, a glass substrate (manufactured by Geomatec) in which an indium tin oxide (ITO) transparent conductive film is patterned as an anode (A) is ultrasonically cleaned with acetone, and then ultrasonically cleaned with ethanol. After that, it is dried by a nitrogen blow and UV-ozone treatment is carried out to form a base material (B) with an anode. Then, a PEDOT-PSS (poly (3,4-ethylenedioxythiophene) -poly (styrene sulfonic acid)) aqueous dispersion was applied with a spin coater (5000 rpm, 50 seconds) and then annealed at 200 ° C. for 10 minutes. , The hole transport layer (H) can be formed. Next, it is carried into a glove box, spin-coated with a mixed solution of a p-type organic semiconductor compound and an n-type organic semiconductor compound in an inert gas atmosphere, and activated by annealing or drying under reduced pressure on a hot plate. A layer (X) can be formed. Next, in the atmosphere, an ethanol solution (about 0.3 v%) of tetraisopropyl orthotitamate can be spin-coated and converted into titanium oxide by the moisture in the atmosphere to prepare an electron transport layer (E). Finally, aluminum, which is an electrode, is vapor-deposited and used as a cathode (C) to obtain a photoelectric conversion element (II). Further, a photoelectric conversion element having a different configuration, for example, a photoelectric conversion element having at least one of a hole transport layer (H) and an electron transport layer (E) can be manufactured by the same method.
 <1.6 光電変換特性>
 光電変換素子の光電変換特性は次のようにして求めることができる。光電変換素子にソーラーシミュレーターでAM1.5G条件の光を照射強度100mW/cm2で照射して、電流-電圧特性を測定する。得られた電流-電圧曲線から、短絡電流密度(Jsc)、開放電圧(Voc)、曲線因子(FF)、直列抵抗、シャント抵抗、入射エネルギー(Pin)といった光電変換特性を求めることができる。また、短絡電流密度(Jsc)、開放電圧(Voc)、曲線因子(FF)、および入射エネルギー(Pin)に基づいて、次式でエネルギー変換効率PCEを算出できる。
PCE=(Jsc×Voc×FF/Pin)×100
<1.6 Photoelectric conversion characteristics>
The photoelectric conversion characteristics of the photoelectric conversion element can be obtained as follows. The photoelectric conversion element is irradiated with light under AM 1.5G condition with a solar simulator at an irradiation intensity of 100 mW / cm 2 , and the current-voltage characteristics are measured. From the obtained current-voltage curve, photoelectric conversion characteristics such as short-circuit current density (Jsc), open circuit voltage (Voc), curve factor (FF), series resistance, shunt resistance, and incident energy (Pin) can be obtained. Further, the energy conversion efficiency PCE can be calculated by the following equation based on the short-circuit current density (Jsc), the open circuit voltage (Voc), the curve factor (FF), and the incident energy (Pin).
PCE = (Jsc x Voc x FF / Pin) x 100
 <2.本発明に係る有機薄膜太陽電池>
 本発明に係る光電変換素子は、太陽電池、なかでも有機薄膜太陽電池の太陽電池素子として用いることが好ましい。
<2. Organic thin-film solar cell according to the present invention>
The photoelectric conversion element according to the present invention is preferably used as a solar cell element of a solar cell, particularly an organic thin film solar cell.
 本発明に係る有機薄膜太陽電池の用途に制限はなく、任意の用途に用いることができる。本発明に係る有機薄膜太陽電池は、例えば、建材用太陽電池、自動車用太陽電池、インテリア用太陽電池、センサー用太陽電池、鉄道用太陽電池、船舶用太陽電池、飛行機用太陽電池、宇宙機用太陽電池、家電用太陽電池、携帯電話用太陽電池または玩具用太陽電池等として用いることができる。 There is no limitation on the use of the organic thin-film solar cell according to the present invention, and it can be used for any purpose. The organic thin-film solar cell according to the present invention is, for example, a solar cell for building materials, a solar cell for automobiles, a solar cell for interiors, a solar cell for sensors, a solar cell for railways, a solar cell for ships, a solar cell for airplanes, and a spacecraft. It can be used as a solar cell, a solar cell for home appliances, a solar cell for a mobile phone, a solar cell for a toy, or the like.
 本発明に係る有機薄膜太陽電池はそのまま用いてもよいし、基材(B)上に本発明に係る有機薄膜太陽電池を設置して太陽電池モジュールとして用いてもよい。具体例を挙げると、基材(B)として建材用板材を用いる場合、この板材の表面に本発明に係る有機薄膜太陽電池を設けることによって、太陽電池モジュールとして太陽電池パネルを作製できる。 The organic thin-film solar cell according to the present invention may be used as it is, or the organic thin-film solar cell according to the present invention may be installed on the base material (B) and used as a solar cell module. To give a specific example, when a plate material for building materials is used as the base material (B), a solar cell panel can be manufactured as a solar cell module by providing the organic thin film solar cell according to the present invention on the surface of the plate material.
 本願は、2019年6月17日に出願された日本国特許出願第2019-112104号に基づく優先権の利益を主張するものである。上記日本国特許出願第2019-112104号の明細書の全内容が、本願に参考のため援用される。 This application claims the benefit of priority based on Japanese Patent Application No. 2019-112104 filed on June 17, 2019. The entire contents of the specification of Japanese Patent Application No. 2019-112104 are incorporated herein by reference.
 以下、実施例を挙げて本発明を具体的に説明するが、本発明は下記実施例によって制限を受けるものではなく、前記および後記の趣旨に適合し得る範囲で変更を加えて実施することも可能であり、それらはいずれも本発明の技術的範囲に包含される。 Hereinafter, the present invention will be specifically described with reference to Examples, but the present invention is not limited by the following Examples, and may be modified to the extent that it can be adapted to the above and the following purposes. It is possible, and they are all within the technical scope of the invention.
 実施例で用いた測定方法は、下記の通りである。 The measurement method used in the examples is as follows.
 (NMRスペクトル測定)
 化合物について、NMRスペクトル測定装置(Agilent製(旧Varian製)の「400MR」を用いて、NMRスペクトル測定を行った。
(NMR spectrum measurement)
For the compound, NMR spectrum measurement was performed using an NMR spectrum measuring device (“400MR” manufactured by Agilent (formerly Varian)).
 (ゲル浸透クロマトグラフィー(GPC))
 化合物について、ゲル浸透クロマトグラフィー(GPC)を用い、分子量測定を行った。測定に際しては、化合物を0.5g/Lの濃度となるように移動相溶媒(クロロホルム)に溶解し、下記条件で測定を行い、ポリスチレンを標準試料として作成した較正曲線に基づいて換算することによって、化合物の数平均分子量(Mn)および重量平均分子量(Mw)を算出した。測定におけるGPC条件は、下記の通りである。
  移動相:クロロホルム流速は0.6mL/min
  装置 :HLC-8320GPC(東ソー製)
  カラム:TSKgel(登録商標)、SuperHM-H’2 + TSKgel(登録商標)、SuperH2000(東ソー製)
(Gel Permeation Chromatography (GPC))
The compounds were measured for molecular weight using gel permeation chromatography (GPC). In the measurement, the compound is dissolved in a mobile phase solvent (chloroform) so as to have a concentration of 0.5 g / L, the measurement is performed under the following conditions, and the conversion is performed based on the calibration curve prepared using polystyrene as a standard sample. , The number average molecular weight (Mn) and the weight average molecular weight (Mw) of the compound were calculated. The GPC conditions in the measurement are as follows.
Mobile phase: Chloroform flow rate is 0.6 mL / min
Equipment: HLC-8320GPC (manufactured by Tosoh)
Column: TSKgel (registered trademark), SuperHM-H'2 + TSKgel (registered trademark), SuperH2000 (manufactured by Tosoh)
 まず、実施例で用いた化合物の合成条件について説明する。 First, the synthetic conditions of the compound used in the examples will be described.
 (合成例1)
 2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DBTH-HDTH)の合成
(Synthesis Example 1)
Synthesis of 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] benzo [1,2-d; 4,5-d'] bistiazole (DBTH-HDTH)
 300mLフラスコに2,6-ジヨードベンゾ[1,2-d;4,5-d’]ビスチアゾール(DBTH-DI、5.2g、11.7mmol)、トリブチル[5-(2-ヘキシルデシル)チオフェン-2-イル]スタンナン(HDT-Sn、23.2g、38.6mmol)、トリス(2-フリル)ホスフィン(443mg、1.87mmol)、トリス(ジベンジリデンアセトン)ジパラジウム(0)-クロロホルム付加体(490mg、0.47mol)、およびN,N-ジメチルホルムアミド(115mL)を加えて120℃で23時間反応した。反応終了後、室温まで冷却した後に水を加えクロロホルムで2回抽出して、有機層を水洗した後に無水硫酸マグネシウムで乾燥した。次いで、ろ過・濃縮して得られた粗品をカラムクロマトグラフィー(シリカゲル、クロロホルム/ヘキサン=1/1)で精製することで、2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DBTH-HDTH)が5.62g、薄黄色固体として得られた(収率60%)。1H-NMR測定により、目的とする化合物が生成したことを確認した。
1H-NMR(400MHz,CDCl3):δ 8.39 (s, 2H), 7.53 (d, J= 3.6 Hz, 2H), 6.81 (d, J = 3.6 Hz, 2H), 2.81 (m, 4H), 1.66 (m, 2H), 1.37-1.24 (m, 48H), 0.90 (t, J = 6.4 Hz, 6H), 0.88 (t, J = 6.4 Hz, 6H).
2,6-Diiodobenzo [1,2-d; 4,5-d'] bistazole (DBTH-DI, 5.2 g, 11.7 mmol), tributyl [5- (2-hexyldecyl) thiophene-in a 300 mL flask. 2-Il] Stannane (HDT-Sn, 23.2 g, 38.6 mmol), Tris (2-furyl) phosphine (443 mg, 1.87 mmol), Tris (dibenzylideneacetone) dipalladium (0) -chloroform adduct (0) 490 mg, 0.47 mol) and N, N-dimethylformamide (115 mL) were added and reacted at 120 ° C. for 23 hours. After completion of the reaction, the mixture was cooled to room temperature, water was added, the mixture was extracted twice with chloroform, the organic layer was washed with water, and then dried over anhydrous magnesium sulfate. Then, the crude product obtained by filtration and concentration was purified by column chromatography (silica gel, chloroform / hexane = 1/1) to obtain 2,6-bis [5- (2-hexyldecyl) thiophene-2-. Il] benzo [1,2-d; 4,5-d'] bistazole (DBTH-HDTH) was obtained in an amount of 5.62 g as a pale yellow solid (yield 60%). 1 It was confirmed by 1 H-NMR measurement that the target compound was produced.
1 1 H-NMR (400 MHz, CDCl 3 ): δ 8.39 (s, 2H), 7.53 (d, J = 3.6 Hz, 2H), 6.81 (d, J = 3.6 Hz, 2H), 2.81 (m, 4H), 1.66 (m, 2H), 1.37-1.24 (m, 48H), 0.90 (t, J = 6.4 Hz, 6H), 0.88 (t, J = 6.4 Hz, 6H).
Figure JPOXMLDOC01-appb-C000048
Figure JPOXMLDOC01-appb-C000048
 (合成例2)
 2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ジヨードベンゾ[1,2-d;4,5-d’]ビスチアゾール(DI-DBTH-HDTH)の合成
(Synthesis Example 2)
Of 2,6-bis [5- (2-hexyldecyl) thiophene-2-yl] -4,8-diiodobenzo [1,2-d; 4,5-d'] bistiazole (DI-DBTH-HDTH) Synthetic
 100mLフラスコに、上記合成例1で得られた2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DBTH-HDTH、4g、4.97mmol)と、テトラヒドロフラン(80mL)を加えて-40℃に冷却した後にリチウムジイソプロピルアミド(2M溶液、5.5mL、10.9mmol)を滴下して30分攪拌した。次いで、ヨウ素(3.8g、14.9mol)を加えた後に室温で2時間反応した。反応終了後、10質量%亜硫酸水素ナトリウムを加えクロロホルムで抽出して、得られた有機層を飽和重曹水、次いで飽和食塩水で洗浄して無水硫酸マグネシウムを用いて乾燥した。次いで、ろ過・濃縮して得られた粗品をカラムクロマトグラフィー(シリカゲル、クロロホルム/ヘキサン=1/1)で精製することで、2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ジヨードベンゾ[1,2-d;4,5-d’]ビスチアゾール(DI-DBTH-HDTH)が2.66g、黄色固体として得られた(収率51%)。1H-NMR測定により、目的とする化合物が生成したことを確認した。
1H-NMR(400MHz,CDCl3):δ 7.53 (d, J = 3.6 Hz, 2H), 6.81 (d, J = 3.6 Hz, 2H), 2.80 (m, 4H), 1.70 (m, 2H), 1.36-1.24 (m, 48H), 0.89 (t, J = 6.4 Hz, 6H), 0.86 (t, J= 6.4 Hz, 6H).
In a 100 mL flask, the 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] benzo [1,2-d; 4,5-d'] bistazole obtained in Synthesis Example 1 above ( DBTH-HDTH (4 g, 4.97 mmol) and tetrahydrofuran (80 mL) were added and cooled to −40 ° C., then lithium diisopropylamide (2M solution, 5.5 mL, 10.9 mmol) was added dropwise, and the mixture was stirred for 30 minutes. Then, iodine (3.8 g, 14.9 mol) was added, and then the reaction was carried out at room temperature for 2 hours. After completion of the reaction, 10 mass% sodium hydrogen sulfite was added and extracted with chloroform, and the obtained organic layer was washed with saturated aqueous sodium hydrogen carbonate and then saturated brine, and dried over anhydrous magnesium sulfate. Then, the crude product obtained by filtration and concentration was purified by column chromatography (silica gel, chloroform / hexane = 1/1) to obtain 2,6-bis [5- (2-hexyldecyl) thiophene-2-. Il] -4,8-diiodobenzo [1,2-d; 4,5-d'] bistazole (DI-DBTH-HDTH) was obtained in an amount of 2.66 g as a yellow solid (yield 51%). 1 It was confirmed by 1 H-NMR measurement that the target compound was produced.
1 1 H-NMR (400 MHz, CDCl 3 ): δ 7.53 (d, J = 3.6 Hz, 2H), 6.81 (d, J = 3.6 Hz, 2H), 2.80 (m, 4H), 1.70 (m, 2H), 1.36-1.24 (m, 48H), 0.89 (t, J = 6.4 Hz, 6H), 0.86 (t, J = 6.4 Hz, 6H).
Figure JPOXMLDOC01-appb-C000049
Figure JPOXMLDOC01-appb-C000049
 (合成例3)
 2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ジチオフェン-2-イル-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH)の合成
(Synthesis Example 3)
2,6-bis [5- (2-hexyldecyl) thiophene-2-yl] -4,8-dithiophene-2-yl-benzo [1,2-d; 4,5-d'] bistiazole (DTH) -DBTH-HDTH) synthesis
 50mLフラスコに、上記合成例2で得られた2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ジヨードベンゾ[1,2-d;4,5-d’]ビスチアゾール(DI-DBTH-HDTH、1.1g、1.04mmol)と、トリブチルチオフェン-2-イル-スタンナン(830μL、2.60mmol)、トリス(2-フリル)ホスフィン(40mg、0.17mmol)、トリス(ジベンジリデンアセトン)ジパラジウム(0)-クロロホルム付加体(45mg、0.04mmol)、およびN,N-ジメチルホルムアミド(22mL)を加えて80℃で19時間反応した。反応終了後、室温まで冷却した後に水を加えクロロホルムで2回抽出して、有機層を水洗した後に無水硫酸マグネシウムで乾燥した。次いで、ろ過・濃縮して得られた粗品をカラムクロマトグラフィー(シリカゲル、クロロホルム/ヘキサン=1/1~クロロホルム)で精製することで、2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ジチオフェン-2-イル-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH)が1.01g、黄色固体として得られた(収率100%)。1H-NMR測定により、目的とする化合物が生成したことを確認した。
1H-NMR(400MHz,CDCl3):δ 8.00 (dd, J = 4.0, 0.8 Hz, 2H), 7.58 (dd, J = 5.2, 0.8 Hz, 2H), 7.55 (d, J = 4.0 Hz, 2H), 7.27 (dd, J = 5.2, 4.0 Hz, 2H), 6.81 (d, J = 4.0 Hz, 2H), 2.81 (m, 4H), 1.72 (m, 2H), 1.34-1.25 (m, 48H), 0.89 (t, J = 6.4 Hz, 6H), 0.87 (t, J = 6.4 Hz, 12H).
In a 50 mL flask, the 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] -4,8-diiodobenzo [1,2-d; 4,5-d] obtained in Synthesis Example 2 above '] Bistiazole (DI-DBTH-HDTH, 1.1 g, 1.04 mmol), tributylthiophene-2-yl-stannan (830 μL, 2.60 mmol), tris (2-furyl) phosphine (40 mg, 0.17 mmol) ), Tris (dibenzylideneacetone) dipalladium (0) -chloroform adduct (45 mg, 0.04 mmol), and N, N-dimethylformamide (22 mL) were added and reacted at 80 ° C. for 19 hours. After completion of the reaction, the mixture was cooled to room temperature, water was added, the mixture was extracted twice with chloroform, the organic layer was washed with water, and then dried over anhydrous magnesium sulfate. Then, the crude product obtained by filtration and concentration was purified by column chromatography (silica gel, chloroform / hexane = 1/1 to chloroform) to obtain 2,6-bis [5- (2-hexyldecyl) thiophene-. 2-Il] -4,8-dithiophene-2-yl-benzo [1,2-d; 4,5-d'] Bistiazole (DTH-DBTH-HDTH) was obtained in an amount of 1.01 g as a yellow solid. (Yield 100%). 1 It was confirmed by 1 H-NMR measurement that the target compound was produced.
1 1 H-NMR (400 MHz, CDCl 3 ): δ 8.00 (dd, J = 4.0, 0.8 Hz, 2H), 7.58 (dd, J = 5.2, 0.8 Hz, 2H), 7.55 (d, J = 4.0 Hz, 2H) ), 7.27 (dd, J = 5.2, 4.0 Hz, 2H), 6.81 (d, J = 4.0 Hz, 2H), 2.81 (m, 4H), 1.72 (m, 2H), 1.34-1.25 (m, 48H) , 0.89 (t, J = 6.4 Hz, 6H), 0.87 (t, J = 6.4 Hz, 12H).
Figure JPOXMLDOC01-appb-C000050
Figure JPOXMLDOC01-appb-C000050
 (合成例4)
 2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ビス(5-トリメチルスタンニルチオフェン-2-イル)-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH-DSM)の合成
(Synthesis Example 4)
2,6-bis [5- (2-hexyldecyl) thiophene-2-yl] -4,8-bis (5-trimethylstannylthiophene-2-yl) -benzo [1,2-d; 4,5 -D'] Synthesis of bistiazole (DTH-DBTH-HDTH-DSM)
 30mLフラスコに、上記合成例3で得られた2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ジチオフェン-2-イル-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH、700mg、0.72mmol)と、テトラヒドロフラン(14mL)を加え-50℃に冷却してリチウムジイソプロピルアミド(2M溶液、0.79mL、1.58mmol)を滴下して30分攪拌した。その後、トリメチルすずクロリド(1M溶液、16mL、1.58mmol)を加え室温に昇温して2時間攪拌した。反応終了後、水を加えトルエンで2回抽出して、有機層を水洗した後に無水硫酸マグネシウムで乾燥した。次いで、ろ過・濃縮して得られた粗品をGPC-HPLC(JAIGEL-1H、2H、クロロホルム)で精製することで、2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ビス(5-トリメチルスタンニルチオフェン-2-イル)-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH-DSM)が518mg、黄色固体として得られた(収率55%)。1H-NMR測定により、目的とする化合物が生成したことを確認した。
1H-NMR(400MHz,CDCl3):δ 8.16 (d, J = 3.6 Hz, 2H), 7.56 (d, J = 3.6 Hz, 2H), 7.37 (d, J = 3.6 Hz, 2H), 6.82 (d, J = 3.6 Hz, 2H), 2.82 (m, 4H), 1.71 (m, 2H), 1.35-1.25 (m, 48H), 0.88 (t, J = 6.4 Hz, 6H), 0.87 (t, J= 6.4 Hz, 6H), 0.47 (s, 18H).
In a 30 mL flask, the 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] -4,8-dithiophene-2-yl-benzo [1,2-d] obtained in Synthesis Example 3 above 4,5-d'] Bistiazole (DTH-DBTH-HDTH, 700 mg, 0.72 mmol) and tetrahydrofuran (14 mL) were added and cooled to -50 ° C to lithium diisopropylamide (2M solution, 0.79 mL, 1). .58 mmol) was added dropwise and the mixture was stirred for 30 minutes. Then, trimethyltin chloride (1M solution, 16 mL, 1.58 mmol) was added, the temperature was raised to room temperature, and the mixture was stirred for 2 hours. After completion of the reaction, water was added, the mixture was extracted twice with toluene, the organic layer was washed with water, and then dried over anhydrous magnesium sulfate. Then, the crude product obtained by filtration and concentration was purified by GPC-HPLC (JAIGEL-1H, 2H, chloroform) to obtain 2,6-bis [5- (2-hexyldecyl) thiophene-2-yl]. -4,8-bis (5-trimethylstannylthiophene-2-yl) -benzo [1,2-d; 4,5-d'] bistazole (DTH-DBTH-HDTH-DSM) 518 mg, yellow solid (Yield 55%). 1 It was confirmed by 1 H-NMR measurement that the target compound was produced.
1 1 H-NMR (400 MHz, CDCl 3 ): δ 8.16 (d, J = 3.6 Hz, 2H), 7.56 (d, J = 3.6 Hz, 2H), 7.37 (d, J = 3.6 Hz, 2H), 6.82 ( d, J = 3.6 Hz, 2H), 2.82 (m, 4H), 1.71 (m, 2H), 1.35-1.25 (m, 48H), 0.88 (t, J = 6.4 Hz, 6H), 0.87 (t, J = 6.4 Hz, 6H), 0.47 (s, 18H).
Figure JPOXMLDOC01-appb-C000051
Figure JPOXMLDOC01-appb-C000051
 (合成例5)
 P-THDT-DBTH-EH-IMTHの合成
(Synthesis Example 5)
Synthesis of P-THDT-DBTH-EH-IMTH
 20mLフラスコに、上記合成例4で得られた2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ビス(5-トリメチルスタンニルチオフェン-2-イル)-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH-DSM、100mg、0.08mmol)と、1,3-ジブロモ-5-(2-エチルヘキシル)チエノ-[3,4-c]ピローロ-4,6-ジオン(EH-IMTH-DB、33mg、0.08mmol)、トリス(ジベンジリデンアセトン)ジパラジウム(0)-クロロホルム付加体(3mg、3μmol)、トリス(2-メトキシフェニル)ホスフィン(5mg、12μmol)、およびクロロベンゼン(6mL)を加え120℃で24時間反応した。反応終了後、メタノール(60mL)に反応液を加えて析出した固体をろ取し、得られた固体をソックスレー洗浄(メタノール、アセトン、ヘキサン)した。次いで、クロロホルムを用いてソックスレー抽出し、P-THDT-DBTH-EH-IMTHを85mg、黒色固体として得た(収率90%)。得られた黒色固体について、GPCを用いて分子量測定を行った結果、数平均分子量(Mn)は25000、重量平均分子量(Mw)は63000であった。 In a 20 mL flask, 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] -4,8-bis (5-trimethylstannylthiophen-2-yl) obtained in Synthesis Example 4 above. -Benzo [1,2-d; 4,5-d'] bistazole (DTH-DBTH-HDTH-DSM, 100 mg, 0.08 mmol) and 1,3-dibromo-5- (2-ethylhexyl) thieno- [3,4-c] Pyrolo-4,6-dione (EH-IMTH-DB, 33 mg, 0.08 mmol), tris (dibenzylideneacetone) dipalladium (0) -chloroform adduct (3 mg, 3 μmol), tris (2-methoxyphenyl) phosphine (5 mg, 12 μmol) and chlorobenzene (6 mL) were added and reacted at 120 ° C. for 24 hours. After completion of the reaction, the reaction solution was added to methanol (60 mL), the precipitated solid was collected by filtration, and the obtained solid was washed with Soxhlet (methanol, acetone, hexane). Then, Soxhlet extraction was performed using chloroform to obtain 85 mg of P-THDT-DBTH-EH-IMTH as a black solid (yield 90%). As a result of measuring the molecular weight of the obtained black solid using GPC, the number average molecular weight (Mn) was 25,000 and the weight average molecular weight (Mw) was 63000.
Figure JPOXMLDOC01-appb-C000052
Figure JPOXMLDOC01-appb-C000052
 (合成例6)
 P-THDT-DBTH-O-IMTHの合成
(Synthesis Example 6)
Synthesis of P-THDT-DBTH-O-IMTH
 20mLフラスコに、上記合成例4で得られた2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ビス(5-トリメチルスタンニルチオフェン-2-イル)-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH-DSM、90mg、0.07mmol)と、1,3-ジブロモ-5-オクチルチエノ[3,4-c]ピローロ-4,6-ジオン(O-IMTH-DB、30mg、0.07mmol)、トリス(ジベンジリデンアセトン)ジパラジウム(0)-クロロホルム付加体(3mg、2μmol)、トリス(2-メトキシフェニル)ホスフィン(4mg、12μmol)、およびクロロベンゼン(7mL)を加え120℃で24時間反応した。反応終了後、メタノール(50mL)に反応液を加えて析出した固体をろ取し、得られた固体をソックスレー洗浄(メタノール、アセトン、ヘキサン)した。次いで、クロロホルムを用いてソックスレー抽出し、P-THDT-DBTH-O-IMTHを74mg、黒色固体として得た(収率87%)。得られた黒色固体について、GPCを用いて分子量測定を行った結果、数平均分子量(Mn)は7100、重量平均分子量(Mw)は15100であった。 In a 20 mL flask, 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] -4,8-bis (5-trimethylstannylthiophen-2-yl) obtained in Synthesis Example 4 above. -Benzo [1,2-d; 4,5-d'] bistazole (DTH-DBTH-HDTH-DSM, 90 mg, 0.07 mmol) and 1,3-dibromo-5-octylthioeno [3,4-c ] Pyrolo-4,6-dione (O-IMTH-DB, 30 mg, 0.07 mmol), tris (dibenzylideneacetone) dipalladium (0) -chloroform adduct (3 mg, 2 μmol), tris (2-methoxyphenyl) Phosphene (4 mg, 12 μmol) and chloroform (7 mL) were added and reacted at 120 ° C. for 24 hours. After completion of the reaction, the reaction solution was added to methanol (50 mL), the precipitated solid was collected by filtration, and the obtained solid was washed with Soxhlet (methanol, acetone, hexane). Then, Soxhlet extraction was performed using chloroform to obtain 74 mg of P-THDT-DBTH-O-IMTH as a black solid (yield 87%). As a result of measuring the molecular weight of the obtained black solid using GPC, the number average molecular weight (Mn) was 7100 and the weight average molecular weight (Mw) was 15100.
Figure JPOXMLDOC01-appb-C000053
Figure JPOXMLDOC01-appb-C000053
 (合成例7)
 P-THDT-DBTH-DMO-IMTHの合成
(Synthesis Example 7)
Synthesis of P-THDT-DBTH-DMO-IMTH
 20mLフラスコに、上記合成例4で得られた2,6-ビス[5-(2-ヘキシルデシル)チオフェン-2-イル]-4,8-ビス(5-トリメチルスタンニルチオフェン-2-イル)-ベンゾ[1,2-d;4,5-d’]ビスチアゾール(DTH-DBTH-HDTH-DSM、100mg、0.08mmol)と、1,3-ジブロモ-5-(3,7-ジメチルオクチル)チエノ[3,4-c]ピローロ-4,6-ジオン(DMO-IMTH-DB、35mg、0.08mmol)、トリス(ジベンジリデンアセトン)ジパラジウム(0)-クロロホルム付加体(3mg、3μmol)、トリス(2-メトキシフェニル)ホスフィン(4mg、12μmol)、およびクロロベンゼン(4mL)を加え120℃で24時間反応した。反応終了後、メタノール(50mL)に反応液を加えて析出した固体をろ取し、得られた固体をソックスレー洗浄(メタノール、アセトン、ヘキサン)した。次いで、クロロホルムを用いてソックスレー抽出し、P-THDT-DBTH-DMO-IMTHを80mg、黒色固体として得た(収率83%)。得られた黒色固体について、GPCを用いて分子量測定を行った結果、数平均分子量(Mn)は11000、重量平均分子量(Mw)は24000であった。 In a 20 mL flask, 2,6-bis [5- (2-hexyldecyl) thiophen-2-yl] -4,8-bis (5-trimethylstannylthiophen-2-yl) obtained in Synthesis Example 4 above. -Benzo [1,2-d; 4,5-d'] bistazole (DTH-DBTH-HDTH-DSM, 100 mg, 0.08 mmol) and 1,3-dibromo-5- (3,7-dimethyloctyl). ) Thieno [3,4-c] pyrolo-4,6-dione (DMO-IMTH-DB, 35 mg, 0.08 mmol), tris (dibenzylideneacetone) dipalladium (0) -chloroform adduct (3 mg, 3 μmol) , Tris (2-methoxyphenyl) phosphine (4 mg, 12 μmol), and chlorobenzene (4 mL) were added and reacted at 120 ° C. for 24 hours. After completion of the reaction, the reaction solution was added to methanol (50 mL), the precipitated solid was collected by filtration, and the obtained solid was washed with Soxhlet (methanol, acetone, hexane). Then, Soxhlet extraction was performed using chloroform to obtain 80 mg of P-THDT-DBTH-DMO-IMTH as a black solid (yield 83%). As a result of measuring the molecular weight of the obtained black solid using GPC, the number average molecular weight (Mn) was 11,000 and the weight average molecular weight (Mw) was 24,000.
Figure JPOXMLDOC01-appb-C000054
Figure JPOXMLDOC01-appb-C000054
 次に、上記合成例5~7で得られた高分子化合物をp型有機半導体化合物として用い、p型有機半導体化合物とn型有機半導体化合物との混合溶液を作製した。 Next, the polymer compounds obtained in Synthesis Examples 5 to 7 were used as the p-type organic semiconductor compound to prepare a mixed solution of the p-type organic semiconductor compound and the n-type organic semiconductor compound.
 <実施例1>
 実施例1では、p型有機半導体化合物として、上記合成例5で得られたP-THDT-DBTH-EH-IMTHの構造を有する高分子化合物を用い、n型有機半導体化合物として、下記式で示される1-Material社製のITICを用いた。p型有機半導体化合物とn型有機半導体化合物の質量比を、p型有機半導体化合物:n型有機半導体化合物=1:1としてクロロベンゼンに溶解させて溶液を調製した。p型有機半導体化合物とn型有機半導体化合物の合計濃度は2.4質量%とした。得られた溶液をホットスターラー上で100℃の温度にて2時間以上攪拌混合した。攪拌混合後の溶液を0.45μmのフィルターで濾過することにより、p型有機半導体化合物とn型有機半導体化合物との混合溶液1を作製した。
<Example 1>
In Example 1, the polymer compound having the structure of P-THDT-DBTH-EH-IMTH obtained in Synthesis Example 5 was used as the p-type organic semiconductor compound, and is represented by the following formula as the n-type organic semiconductor compound. An ITIC manufactured by 1-Material Co., Ltd. was used. The mass ratio of the p-type organic semiconductor compound to the n-type organic semiconductor compound was set to p-type organic semiconductor compound: n-type organic semiconductor compound = 1: 1 and dissolved in chlorobenzene to prepare a solution. The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass. The obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more. The mixed solution 1 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 μm filter.
Figure JPOXMLDOC01-appb-C000055
Figure JPOXMLDOC01-appb-C000055
 <実施例2>
 実施例2では、p型有機半導体化合物として、上記合成例5で得られたP-THDT-DBTH-EH-IMTHの構造を有する高分子化合物を用い、n型有機半導体化合物として、上記実施例1で用いた1-Material社製のITIC、およびフロンティアカーボン社製のPC61BM(フェニルC61酪酸メチルエステル)を用いた。p型有機半導体化合物、ITIC、およびPC61BMの質量比を、p型有機半導体化合物:ITIC:PC61BM=1:1:1としてクロロベンゼンに溶解させて溶液を調製した。p型有機半導体化合物とn型有機半導体化合物の合計濃度は2.4質量%とした。得られた溶液をホットスターラー上で100℃の温度にて2時間以上攪拌混合した。攪拌混合後の溶液を0.45μmのフィルターで濾過することにより、p型有機半導体化合物とn型有機半導体化合物との混合溶液2を作製した。
<Example 2>
In Example 2, as the p-type organic semiconductor compound, the polymer compound having the structure of P-THDT-DBTH-EH-IMTH obtained in Synthesis Example 5 was used, and as the n-type organic semiconductor compound, the above-mentioned Example 1 The ITIC manufactured by 1-Material and PC61BM (phenyl C61 butyric acid methyl ester) manufactured by Frontier Carbon were used. The mass ratio of the p-type organic semiconductor compound, ITIC, and PC61BM was set to p-type organic semiconductor compound: ITIC: PC61BM = 1: 1: 1 and dissolved in chlorobenzene to prepare a solution. The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass. The obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more. The mixed solution 2 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 μm filter.
 <実施例3>
 実施例3では、p型有機半導体化合物として、上記合成例6で得られたP-THDT-DBTH-O-IMTHの構造を有する高分子化合物を用い、n型有機半導体化合物として、下記式で示される1-Material社製のITIC-Mを用いた。p型有機半導体化合物とn型有機半導体化合物の質量比を、p型有機半導体化合物:n型有機半導体化合物=1:1としてクロロベンゼンに溶解させて溶液を調製した。p型有機半導体化合物とn型有機半導体化合物の合計濃度は2.4質量%とした。得られた溶液をホットスターラー上で100℃の温度にて2時間以上攪拌混合した。攪拌混合後の溶液を0.45μmのフィルターで濾過することにより、p型有機半導体化合物とn型有機半導体化合物との混合溶液3を作製した。
<Example 3>
In Example 3, the polymer compound having the structure of P-THDT-DBTH-O-IMTH obtained in Synthesis Example 6 was used as the p-type organic semiconductor compound, and is represented by the following formula as the n-type organic semiconductor compound. 1-Material ITIC-M manufactured by Material was used. The mass ratio of the p-type organic semiconductor compound to the n-type organic semiconductor compound was set to p-type organic semiconductor compound: n-type organic semiconductor compound = 1: 1 and dissolved in chlorobenzene to prepare a solution. The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass. The obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more. The mixed solution 3 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 μm filter.
Figure JPOXMLDOC01-appb-C000056
Figure JPOXMLDOC01-appb-C000056
 <実施例4>
 実施例4では、p型有機半導体化合物として、上記合成例6で得られたP-THDT-DBTH-O-IMTHの構造を有する高分子化合物を用い、n型有機半導体化合物として、下記式で示される1-Material社製の4TICを用いた。p型有機半導体化合物とn型有機半導体化合物の質量比を、p型有機半導体化合物:n型有機半導体化合物=1:1としてクロロベンゼンに溶解させて溶液を調製した。p型有機半導体化合物とn型有機半導体化合物の合計濃度は2.4質量%とした。得られた溶液をホットスターラー上で100℃の温度にて2時間以上攪拌混合した。攪拌混合後の溶液を0.45μmのフィルターで濾過することにより、p型有機半導体化合物とn型有機半導体化合物との混合溶液4を作製した。
<Example 4>
In Example 4, the polymer compound having the structure of P-THDT-DBTH-O-IMTH obtained in Synthesis Example 6 was used as the p-type organic semiconductor compound, and is represented by the following formula as the n-type organic semiconductor compound. A 4TIC manufactured by 1-Material Co., Ltd. was used. The mass ratio of the p-type organic semiconductor compound to the n-type organic semiconductor compound was set to p-type organic semiconductor compound: n-type organic semiconductor compound = 1: 1 and dissolved in chlorobenzene to prepare a solution. The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass. The obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more. The mixed solution 4 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 μm filter.
Figure JPOXMLDOC01-appb-C000057
Figure JPOXMLDOC01-appb-C000057
 <実施例5>
 実施例5では、p型有機半導体化合物として、上記合成例7で得られたP-THDT-DBTH-DMO-IMTHの構造を有する高分子化合物を用い、n型有機半導体化合物として、上記実施例1で用いた1-Material社製のITICを用いた。p型有機半導体化合物とn型有機半導体化合物の質量比を、p型有機半導体化合物:n型有機半導体化合物=1:1としてクロロベンゼンに溶解させて溶液を調製した。p型有機半導体化合物とn型有機半導体化合物の合計濃度は2.4質量%とした。得られた溶液をホットスターラー上で100℃の温度にて2時間以上攪拌混合した。攪拌混合後の溶液を0.45μmのフィルターで濾過することにより、p型有機半導体化合物とn型有機半導体化合物との混合溶液5を作製した。
<Example 5>
In Example 5, the polymer compound having the structure of P-THDT-DBTH-DMO-IMTH obtained in Synthesis Example 7 was used as the p-type organic semiconductor compound, and the n-type organic semiconductor compound was used in Example 1 above. The ITIC manufactured by 1-Material used in 1 was used. The mass ratio of the p-type organic semiconductor compound to the n-type organic semiconductor compound was set to p-type organic semiconductor compound: n-type organic semiconductor compound = 1: 1 and dissolved in chlorobenzene to prepare a solution. The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass. The obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more. The mixed solution 5 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 μm filter.
 <実施例6>
 実施例6では、p型有機半導体化合物として、上記合成例7で得られたP-THDT-DBTH-DMO-IMTHの構造を有する高分子化合物を用い、n型有機半導体化合物として、上記実施例1で用いた1-Material社製のITIC、およびフロンティアカーボン社製のPC71BM(フェニルC71酪酸メチルエステル)を用いた。p型有機半導体化合物、ITIC、およびPC71BMの質量比を、p型有機半導体化合物:ITIC:PC71BM=2:1:1としてクロロベンゼンに溶解させて溶液を調製した。p型有機半導体化合物とn型有機半導体化合物の合計濃度は2.4質量%とした。得られた溶液をホットスターラー上で100℃の温度にて2時間以上攪拌混合した。攪拌混合後の溶液を0.45μmのフィルターで濾過することにより、p型有機半導体化合物とn型有機半導体化合物との混合溶液6を作製した。
<Example 6>
In Example 6, a polymer compound having the structure of P-THDT-DBTH-DMO-IMTH obtained in Synthesis Example 7 was used as the p-type organic semiconductor compound, and Example 1 was used as the n-type organic semiconductor compound. The ITIC manufactured by 1-Material and PC71BM (phenylC71 butyrate methyl ester) manufactured by Frontier Carbon Co., Ltd. used in the above were used. The mass ratio of the p-type organic semiconductor compound, ITIC, and PC71BM was set to p-type organic semiconductor compound: ITIC: PC71BM = 2: 1: 1 and dissolved in chlorobenzene to prepare a solution. The total concentration of the p-type organic semiconductor compound and the n-type organic semiconductor compound was set to 2.4% by mass. The obtained solution was stirred and mixed on a hot stirrer at a temperature of 100 ° C. for 2 hours or more. The mixed solution 6 of the p-type organic semiconductor compound and the n-type organic semiconductor compound was prepared by filtering the solution after stirring and mixing with a 0.45 μm filter.
 次に、実施例1~6で得られた混合溶液を用いて光電変換素子を作製し、下記の手順で評価した。 Next, a photoelectric conversion element was prepared using the mixed solutions obtained in Examples 1 to 6, and evaluated by the following procedure.
 (光電変換素子の作製)
 電極である酸化インジウムスズ(ITO)透明導電膜(カソード)がパターニングされたジオマテック社製のガラス基板を、アセトンによる超音波洗浄し、次いでエタノールによる超音波洗浄した後、窒素ブローで乾燥させた。乾燥したガラス基板にUV-オゾン処理を実施した後、電子輸送層を形成した。電子輸送層は、ガラス基板に、0.5M酢酸亜鉛・0.5Mアミノエタノール/2-メトキシエタノール溶液をスピンコーターで塗布(3000rpm、40秒)した後、175℃で30分間アニールして形成した。電子輸送層を形成したガラス基板をグローブボックス内に搬入し、不活性ガス雰囲気下でp型有機半導体化合物とn型有機半導体化合物との混合溶液1~6をスピンコートし、ホットプレート上でアニール処理を実施した。アニール処理は、110℃で15分間行った。次に、蒸着機にて、ホール輸送層である酸化モリブデンを蒸着した。その後、電極(アノード)である銀を蒸着して逆型構成デバイスである光電変換素子を作製した。得られた逆型構成デバイスについて、光電変換素子の評価を下記手順でソーラーシミュレーターを用いて行った。
(Manufacturing of photoelectric conversion element)
A glass substrate manufactured by Geomatec, in which an electrode, an indium tin oxide (ITO) transparent conductive film (cathode), was patterned, was ultrasonically cleaned with acetone, then ultrasonically cleaned with ethanol, and then dried with a nitrogen blow. After UV-ozone treatment was performed on the dried glass substrate, an electron transport layer was formed. The electron transport layer was formed by applying a 0.5 M zinc acetate / 0.5 M aminoethanol / 2-methoxyethanol solution to a glass substrate with a spin coater (3000 rpm, 40 seconds) and then annealing at 175 ° C. for 30 minutes. .. The glass substrate on which the electron transport layer is formed is carried into the glove box, and a mixed solution 1 to 6 of the p-type organic semiconductor compound and the n-type organic semiconductor compound is spin-coated in an inert gas atmosphere and annealed on a hot plate. The process was carried out. The annealing treatment was carried out at 110 ° C. for 15 minutes. Next, molybdenum oxide, which is a hole transport layer, was deposited with a thin-film deposition machine. Then, silver, which is an electrode (anode), was vapor-deposited to produce a photoelectric conversion element, which is an inverted configuration device. For the obtained inverted configuration device, the photoelectric conversion element was evaluated using a solar simulator according to the following procedure.
 (光電変換素子の評価方法)
 光電変換素子に0.05027mm角のメタルマスクを付け、照射光源としてソーラーシミュレーター(OTENTO-SUNIII、AM1.5Gフィルター、放射強度100mW/cm2、分光計器製)を用い、ソースメーター(ケイスレー社製,2400型)により、ITO電極と銀電極との間における電流-電圧特性を測定した。この測定結果から、短絡電流密度Jsc(mA/cm2)、開放電圧Voc(V)、曲線因子FF、およびエネルギー変換効率PCE(%)を算出した。短絡電流密度Jscとは、電圧値が0Vのときの電流密度である。開放電圧Vocとは、電流値が0mA/cm2のときの電圧値である。曲線因子FFとは、内部抵抗を表すファクターであり、最大出力をPmaxとすると次式で表される。
FF=Pmax/(Jsc×Voc)
エネルギー変換効率PCEは、入射エネルギーをPinとすると次式で与えられる。
PCE=(Pmax/Pin)×100=(Jsc×Voc×FF/Pin)×100
(Evaluation method of photoelectric conversion element)
A 0.05027 mm square metal mask is attached to the photoelectric conversion element, and a solar simulator (OTENTO-SUNIII, AM1.5G filter, radiant intensity 100 mW / cm 2 , manufactured by a spectroscope) is used as an irradiation light source, and a source meter (manufactured by Keithley Co., Ltd.) The current-voltage characteristic between the ITO electrode and the silver electrode was measured by the 2400 type). From this measurement result, the short-circuit current density Jsc (mA / cm 2 ), the open circuit voltage Voc (V), the curve factor FF, and the energy conversion efficiency PCE (%) were calculated. The short-circuit current density Jsc is the current density when the voltage value is 0V. The open circuit voltage Voc is a voltage value when the current value is 0 mA / cm 2 . The curve factor FF is a factor representing the internal resistance, and is expressed by the following equation where the maximum output is Pmax.
FF = Pmax / (Jsc × Voc)
The energy conversion efficiency PCE is given by the following equation, where the incident energy is Pin.
PCE = (Pmax / Pin) x 100 = (Jsc x Voc x FF / Pin) x 100
Figure JPOXMLDOC01-appb-T000058
Figure JPOXMLDOC01-appb-T000058
 本発明の光電変換素子は、短絡電流密度(Jsc)および開放電圧(Voc)が高く、エネルギー変換効率PCEが高くなっている。また、n型有機半導体化合物として上記芳香族性化合物(2)を用いた方が、エネルギー変換効率PCEが大きくなることが分かる。 The photoelectric conversion element of the present invention has a high short-circuit current density (Jsc) and an open circuit voltage (Voc), and has a high energy conversion efficiency PCE. Further, it can be seen that the energy conversion efficiency PCE is larger when the aromatic compound (2) is used as the n-type organic semiconductor compound.
 I、II 光電変換素子
 A  アノード
 H  ホール輸送層
 X  活性層
 E  電子輸送層
 C  カソード
 B  基材
I, II Photoelectric conversion element A Anode H Hall transport layer X Active layer E Electron transport layer C Cathode B Base material

Claims (9)

  1.  カソードと、活性層と、アノードとがこの順に配置された構造を有する光電変換素子であって、
     前記活性層は、
     下記式(1)で表されるベンゾビスチアゾール構造単位を有する高分子化合物と、
     下記式(2)で表される芳香族性化合物、および/または、下記式(3)で表される芳香族性化合物を含有することを特徴とする光電変換素子。
    Figure JPOXMLDOC01-appb-C000001

     [式(1)中、T1、T2は、それぞれ独立に、アルコキシ基であるか、チオアルコキシ基であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチオフェン環であるか、炭化水素基またはオルガノシリル基で置換されていてもよいチアゾール環であるか、炭化水素基、オルガノシリル基、アルコキシ基、チオアルコキシ基、トリフルオロメチル基、またはハロゲン原子で置換されていてもよいフェニル基を表す。
     また、B1、B2は、それぞれ独立に、炭化水素基で置換されていてもよいチオフェン環であるか、炭化水素基で置換されていてもよいチアゾール環であるか、またはエチニレン基を表す。]
    Figure JPOXMLDOC01-appb-C000002

     [式(2)中、R101~R116は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいベンゼン環であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいチオフェン環を表す。]
    Figure JPOXMLDOC01-appb-C000003

     [式(3)中、R201~R214は、それぞれ独立に、水素原子であるか、アルキル基であるか、アルコキシ基であるか、チオアルコキシ基であるか、フッ素原子であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいベンゼン環であるか、アルキル基、アルコキシ基、チオアルコキシ基、またはフッ素原子で置換されていてもよいチオフェン環を表す。]
    A photoelectric conversion element having a structure in which a cathode, an active layer, and an anode are arranged in this order.
    The active layer is
    A polymer compound having a benzobisthiazole structural unit represented by the following formula (1) and
    A photoelectric conversion element containing an aromatic compound represented by the following formula (2) and / or an aromatic compound represented by the following formula (3).
    Figure JPOXMLDOC01-appb-C000001

    [In formula (1), whether T 1 and T 2 are independently alkoxy groups, thioalkoxy groups, or thiophene rings that may be substituted with a hydrocarbon group or an organosilyl group. , A thiazole ring optionally substituted with a hydrocarbon group or an organosilyl group, or even if substituted with a hydrocarbon group, an organosilyl group, an alkoxy group, an thioalkoxy group, a trifluoromethyl group, or a halogen atom. Represents a good phenyl group.
    Further, B 1 and B 2 each independently represent a thiophene ring which may be substituted with a hydrocarbon group, a thiazole ring which may be substituted with a hydrocarbon group, or an ethynylene group. .. ]
    Figure JPOXMLDOC01-appb-C000002

    [In formula (2), R 101 to R 116 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
    Figure JPOXMLDOC01-appb-C000003

    [In formula (3), R 201 to R 214 are independently hydrogen atoms, alkyl groups, alkoxy groups, thioalkoxy groups, fluorine atoms, or alkyl. Represents a benzene ring that may be substituted with a group, alkoxy group, thioalkoxy group, or fluorine atom, or a thiophene ring that may be substituted with an alkyl group, alkoxy group, thioalkoxy group, or fluorine atom. ]
  2.  T1、T2が、それぞれ独立に、下記式(t1)~式(t5)のいずれかで表される基である請求項1に記載の光電変換素子。
    Figure JPOXMLDOC01-appb-C000004

     [式(t1)~式(t5)中、R13、R14は、それぞれ独立に、炭素数6~30の炭化水素基を表す。
     R15、R16は、それぞれ独立に、炭素数6~30の炭化水素基、または*-Si(R183で表される基を表す。
     R17は、それぞれ独立に、炭素数6~30の炭化水素基、*-Si(R183、*-O-R19、*-S-R20、*-CF3、またはハロゲン原子を表す。
     n1は1~3の整数、n2は1または2、n3は1~5の整数をそれぞれ表し、複数のR15は同一でも異なっていてもよく、複数のR16は同一でも異なっていてもよく、複数のR17は同一でも異なっていてもよい。
     R18は、それぞれ独立に、炭素数1~20の脂肪族炭化水素基、または炭素数6~10の芳香族炭化水素基を表し、複数のR18は同一でも異なっていてもよい。
     R19、R20は、それぞれ独立に、炭素数6~30の炭化水素基を表す。
     *は、結合手を表す。]
    The photoelectric conversion element according to claim 1 , wherein T 1 and T 2 are independently represented by any of the following formulas (t1) to (t5).
    Figure JPOXMLDOC01-appb-C000004

    Wherein (t1) ~ formula (t5), R 13, R 14 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
    R 15 and R 16 each independently represent a hydrocarbon group having 6 to 30 carbon atoms or a group represented by * -Si (R 18 ) 3 .
    Each of R 17 independently contains a hydrocarbon group having 6 to 30 carbon atoms, * -Si (R 18 ) 3 , * -OR 19 , * -SR 20 , * -CF 3 , or a halogen atom. Represent.
    n1 represents an integer of 1 to 3, n2 represents an integer of 1 or 2, n3 represents an integer of 1 to 5, and a plurality of R 15s may be the same or different, and a plurality of R 16s may be the same or different. , Multiple R 17s may be the same or different.
    Each of R 18 independently represents an aliphatic hydrocarbon group having 1 to 20 carbon atoms or an aromatic hydrocarbon group having 6 to 10 carbon atoms, and a plurality of R 18s may be the same or different.
    R 19 and R 20 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
    * Represents a bond. ]
  3.  B1、B2が、それぞれ独立に、下記式(b1)~式(b3)のいずれかで表される基である請求項1または2に記載の光電変換素子。
    Figure JPOXMLDOC01-appb-C000005

     [式(b1)~式(b3)中、R21、R22は、それぞれ独立に、炭素数6~30の炭化水素基を表す。
     n4は0~2の整数、n5は0または1を表し、複数のR21は同一でも異なっていてもよい。
     *は、結合手を表し、左側の*は、ベンゾビスチアゾール構造単位のベンゼン環に結合する結合手を表す。]
    The photoelectric conversion element according to claim 1 or 2, wherein B 1 and B 2 are independently represented by any of the following formulas (b1) to (b3).
    Figure JPOXMLDOC01-appb-C000005

    [In formulas (b1) to (b3), R 21 and R 22 each independently represent a hydrocarbon group having 6 to 30 carbon atoms.
    n4 represents an integer of 0 to 2, n5 represents 0 or 1, and a plurality of R 21s may be the same or different.
    * Represents a bond, and * on the left represents a bond that binds to the benzene ring of the benzobisthiazole structural unit. ]
  4.  前記式(1)で表されるベンゾビスチアゾール構造単位を含む高分子化合物は、ドナー-アクセプター型半導体高分子化合物である請求項1~3のいずれかに記載の光電変換素子。 The photoelectric conversion element according to any one of claims 1 to 3, wherein the polymer compound containing the benzobisthiazole structural unit represented by the formula (1) is a donor-acceptor type semiconductor polymer compound.
  5.  前記カソードと前記活性層との間に電子輸送層を有する請求項1~4のいずれかに記載の光電変換素子。 The photoelectric conversion element according to any one of claims 1 to 4, which has an electron transport layer between the cathode and the active layer.
  6.  前記アノードと前記活性層との間にホール輸送層を有する請求項1~5のいずれかに記載の光電変換素子。 The photoelectric conversion element according to any one of claims 1 to 5, which has a hole transport layer between the anode and the active layer.
  7.  前記カソードの一方の側に基材が配置され、前記カソードの他方の側に前記活性層が配置されている請求項1~6のいずれかに記載の光電変換素子。 The photoelectric conversion element according to any one of claims 1 to 6, wherein a base material is arranged on one side of the cathode and the active layer is arranged on the other side of the cathode.
  8.  前記アノードの一方の側に基材が配置され、前記アノードの他方の側に前記活性層が配置されている請求項1~6のいずれかに記載の光電変換素子。 The photoelectric conversion element according to any one of claims 1 to 6, wherein a base material is arranged on one side of the anode and the active layer is arranged on the other side of the anode.
  9.  請求項1~8のいずれかに記載の光電変換素子を備えることを特徴とする有機薄膜太陽電池。 An organic thin-film solar cell including the photoelectric conversion element according to any one of claims 1 to 8.
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