WO2020230966A1 - Polyimide precursor composition, method for preparing same, and polyimide - Google Patents

Polyimide precursor composition, method for preparing same, and polyimide Download PDF

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Publication number
WO2020230966A1
WO2020230966A1 PCT/KR2019/014422 KR2019014422W WO2020230966A1 WO 2020230966 A1 WO2020230966 A1 WO 2020230966A1 KR 2019014422 W KR2019014422 W KR 2019014422W WO 2020230966 A1 WO2020230966 A1 WO 2020230966A1
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Prior art keywords
precursor composition
polyimide precursor
monomer
viscosity
dianhydride
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PCT/KR2019/014422
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French (fr)
Korean (ko)
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황인환
이익상
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피아이첨단소재 주식회사
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Publication of WO2020230966A1 publication Critical patent/WO2020230966A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1075Partially aromatic polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1042Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound

Definitions

  • the present application relates to a polyimide precursor composition, a method for preparing the same, and a polyimide.
  • Polyimide (PI) is a polymer material with thermal stability based on a rigid aromatic backbone and has mechanical properties such as excellent strength, chemical resistance, weather resistance, and heat resistance based on the chemical stability of the imide ring.
  • polyimide is in the spotlight as a high-functional polymer material applicable to a wide range of industries such as electronics, communication, and optics due to its excellent electrical properties such as insulation and low dielectric constant.
  • a polyimide film is prepared by applying a polyamic acid prepared by polymerization reaction of dianhydride and diamine onto a support and imidizing it to form a film, and peeling it from the support.
  • the polyamic acid contains both an amine group and a carboxylic acid group, and in particular, the hydroxy group in the carboxylic acid group may be hydrolyzed as it reacts with an adjacent amine group, so that the storage stability and viscosity stability of the polyimide precursor composition including the same are poor. Is known. In addition, this phenomenon is known to be more pronounced at room temperature or higher than at low temperature.
  • the viscosity of the polyimide precursor composition may change significantly during the process or during a long time thawing process, and thus, the application and imidization of the polyimide precursor composition may be unstable.
  • the viscosity of the polyamic acid changes, it may cause a decrease in mechanical and thermal properties of the polyimide film.
  • the present application provides a polyimide precursor composition capable of securing storage stability and dimensional stability after curing for a polyimide precursor composition requiring storage or storage for a certain period of time, and a method of manufacturing the same.
  • the present application relates to a polyimide precursor composition.
  • the polyimide precursor composition of the present application may include a diamine monomer and a dianhydride monomer as polymerized units, and may include a first bonding unit having a bond dissociation energy of 650 KJ/mol or less.
  • the range of the bond dissociation energy is not particularly limited, but the upper limit may be 650 KJ/mol or less, 630 KJ/mol or less, or 620 KJ/mol or less, and the lower limit is 300 KJ/mol or more or 500 KJ/mol or more.
  • the present application includes the polymer having the above-described binding unit, thereby maintaining the viscosity characteristics of the low-viscosity polyimide precursor composition, so that the precursor composition can semi-permanently secure storage stability.
  • the polyimide precursor composition of the present application may be a composition having low viscosity characteristics.
  • the polyimide precursor composition of the present application may have a viscosity of 10,000 cP or less and 9,000 cP or less as measured by a Brookfield viscometer on the RV-7 spindle at 23° C. and a rotation speed of 0.5 rpm.
  • the lower limit is not particularly limited, but may be 500 cP or more or 1000 cP or more.
  • the present application provides a precursor composition having excellent processability by adjusting the viscosity range, so that a film or substrate having desired physical properties can be formed when forming a film or substrate.
  • the polyimide precursor composition has an important low viscosity property, but it is not easy to maintain it.
  • Polyamic acid contains both an amine group and a carboxylic acid group, and in particular, the hydroxy group in the carboxylic acid group may be hydrolyzed as it reacts with an adjacent amine group, and it is known that the storage stability and viscosity stability of the polyimide precursor composition containing the same are poor. . Accordingly, when the polyimide precursor composition is stored or stored for a certain period of time, there is a problem that some side reactions occur. However, the polyimide precursor composition according to the present application may semi-permanently reverse reaction or dissociate some bonding units, and thus, a polyimide precursor composition in a desired state may be provided with respect to the precursor composition at any time.
  • the diamine monomer and the dianhydride monomer may include a monomer including two or more aromatic rings connected by the first bonding unit.
  • the polyimide precursor composition may further include a diamine monomer from which the first bonding unit is dissociated or a dianhydride monomer from which the first bonding unit is dissociated.
  • a diamine monomer is polymerized at the terminal, or a dianhydride monomer from which the first binding unit is dissociated is bonded to the diamine monomer polymerized at the terminal, or at the terminal.
  • the diamine monomer from which the first bonding unit is dissociated may be bonded.
  • the amine group of the diamine monomer at the terminal may be dissociated from some bonding units before the amide bond is formed.
  • the viscosity when a diamine monomer is polymerized at the end of the polyimide precursor composition, the viscosity may increase as the remaining dianhydride proceeds with some side reactions with the diamine monomer at the end.
  • the present application may dissociate the first binding unit of the dianhydride subjected to a side reaction. Accordingly, a monomer from which the first binding unit of the dianhydride is dissociated may be present in the polymerization unit. Alternatively, the present application may dissociate the first binding unit of the diamine monomer at the terminal in which the side reaction has been performed.
  • the present application may dissociate some bonding units during the process of forming an amide bond in the amine group of the diamine monomer polymerized at the terminal.
  • the polyimide precursor composition may be present in a state in which some of the bonding units are dissociated, and the present application may maintain the viscosity again at a low viscosity through this.
  • the method for dissociating the bonding unit is not particularly limited, and a known method can be used.
  • the polyimide precursor composition of the present application may include a monomer including two or more aromatic rings in which the diamine monomer is connected by a first bonding unit. Even when the diamine monomer includes the first bonding unit, as described above, the first bonding unit may be dissociated, and the amine group of the terminal diamine monomer may be dissociated from some bonding units prior to formation of the amide bond. . In this case, the diamine monomer polymerized at the terminal may be in a state in which the first bonding unit is dissociated. Alternatively, the present application may dissociate some bonding units during the process of forming an amide bond in the amine group of the diamine monomer polymerized at the terminal.
  • a low molecular weight substance and an unreacted substance may occur due to some side reactions occurring at room temperature or high temperature.
  • the polyimide precursor composition of the present application suppresses the above side reactions, so the distribution of molecular weight is narrow. I can.
  • its polydispersity may be 2.2 or less, 2.0 or less, 1.9 or less, or 1.8 or less.
  • the lower limit of the polydispersity is not particularly limited, and may be 1.2 or more, 1.3 or more, or 1.5 or more.
  • the present application may improve the storage stability of the precursor composition at room temperature and high temperature by adjusting the polydispersity.
  • the polyimide precursor composition may have a thermal decomposition temperature of 560°C or higher, 562°C or higher, 570°C or higher, 573°C or higher, 576°C or higher, and 577°C or higher after curing.
  • the upper limit value is not particularly limited, but may be 1000° C. or less, or 800° C. or less.
  • the polyimide precursor composition of the present application can minimize unreacted monomers by controlling the thermal decomposition temperature, and thereby provide a polyimide having a desired physical property.
  • the polyimide precursor composition of the present application may have a weight average molecular weight of 10,000 to 100,000, 15,000 to 80,000, 18,000 to 70,000, 20,000 to 60,000, 25,000 to 55,000, or 30,000 to 50,000 after curing.
  • weight average molecular weight means a value converted to standard polystyrene measured by GPC (Gel permeation Chromatograph).
  • the polyimide precursor composition of the present application may have an elongation of 15% or more, 20% or more, or 30% or more after curing.
  • the upper limit value is not particularly limited, but may be 50% or less or 45% or less.
  • the polyimide precursor composition of the present application may include a polyamic acid solution in which a diamine monomer and a dianhydride monomer are polymerized.
  • the polyimide precursor composition may have the same meaning as the polyamic acid solution.
  • the dianhydride monomer that can be used in the preparation of the polyamic acid solution may be an aromatic tetracarboxylic dianhydride, and the aromatic tetracarboxylic dianhydride is pyromellitic dianhydride (or PMDA), 3,3 ',4,4'-biphenyltetracarboxylic dianhydride (or BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (or a-BPDA), oxydiphthalic Dianhydride (or ODPA), diphenylsulfone-3,4,3',4'-tetracarboxylic dianhydride (or DSDA), bis(3,4-dicarboxyphenyl)sulfide dianhydride, 2 ,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 2,3,3',4'-benzophen
  • the dianhydride monomer may be used alone or in combination of two or more as necessary, but the present application considers the aforementioned bond dissociation energy, for example, pyromellitic dianhydride (PMDA), 3, 3',4,4'-biphenyltetracarboxylic dianhydride (s-BPDA) or 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA).
  • PMDA pyromellitic dianhydride
  • s-BPDA 3, 3',4,4'-biphenyltetracarboxylic dianhydride
  • a-BPDA 2,3,3',4'-biphenyltetracarboxylic dianhydride
  • the diamine monomer that can be used for preparing the polyamic acid solution is an aromatic diamine, and is classified as follows and examples thereof are given.
  • 1,4-diaminobenzene or paraphenylenediamine, PDA
  • 1,3-diaminobenzene 2,4-diaminotoluene
  • 2,6-diaminotoluene 3,5-diaminobenzo
  • a diamine having one benzene nucleus in structure such as an acid acid (or DABA)
  • a diamine having a relatively rigid structure such as an acid acid (or DABA)
  • Diaminodiphenyl ether such as 4,4'-diaminodiphenyl ether (or oxydianiline, ODA), 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane (Methylenediamine), 3,3'-dimethyl-4,4'-diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl, 2,2'-bis (trifluoromethyl )-4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 3,3'-dicarboxy-4,4'-diaminodiphenylmethane , 3,3',5,5'-tetramethyl-4,4'-diaminodiphenylmethane, bis(4-aminophenyl)sulfide, 4,4'-diaminobenz
  • the diamine monomer may be used alone or in combination of two or more, as needed, and the present application considers the aforementioned bond dissociation energy, for example, 1,4-diaminobenzene (PPD), 1,3 -Diaminobenzene (MPD), 2,4-diaminotoluene, 2,6-diaminotoluene or 4,4'-methylenediamine (MDA).
  • PPD 1,4-diaminobenzene
  • MPD 1,3 -Diaminobenzene
  • MDA 4,4'-methylenediamine
  • the polyimide precursor composition may include an organic solvent.
  • the organic solvent is not particularly limited as long as it is an organic solvent in which polyamic acid can be dissolved, but may be an aprotic polar solvent as an example.
  • the aprotic polar solvent is, for example, an amide solvent such as N,N'-dimethylformamide (DMF), N,N'-dimethylacetamide (DMAc), p-chlorophenol, o-chlorophenol, etc.
  • amide solvent such as N,N'-dimethylformamide (DMF), N,N'-dimethylacetamide (DMAc), p-chlorophenol, o-chlorophenol, etc.
  • the solubility of polyamic acid may be adjusted by using an auxiliary solvent such as toluene, tetrahydrofuran, acetone, methyl ethyl ketone, methanol, ethanol, and water in some cases.
  • an auxiliary solvent such as toluene, tetrahydrofuran, acetone, methyl ethyl ketone, methanol, ethanol, and water in some cases.
  • the organic solvent may be, for example, N-methyl-pyrrolidone (NMP).
  • the polyimide precursor composition of the present application may include a filler for the purpose of improving various properties of the film such as sliding property, thermal conductivity, conductivity, corona resistance, and loop hardness.
  • the filler to be added is not particularly limited, and examples thereof include silica, titanium oxide, alumina, silicon nitride, boron nitride, calcium hydrogen phosphate, calcium phosphate, and mica.
  • the particle diameter of the filler is not particularly limited, and may be determined according to the characteristics of the film to be modified and the type of filler to be added.
  • the average particle diameter may be 0.05 to 20 ⁇ m, 0.1 to 10 ⁇ m, 0.1 to 5 ⁇ m, or 0.1 to 3 ⁇ m. In the present specification, the average particle diameter may be an average particle diameter measured according to D50 particle size analysis unless otherwise specified.
  • the modification effect may be sufficiently maintained, and the surface properties may not be impaired and the mechanical properties may not be deteriorated.
  • the present application is not particularly limited to the amount of the filler added, and may be determined by film properties to be modified or the particle diameter of the filler.
  • the amount of the filler added may be 0.01 to 10 parts by weight, 0.01 to 5 parts by weight, or 0.02 to 1 part by weight based on 100 parts by weight of the polyimide resin. According to the present application, by adjusting the content, the mechanical properties of the film may not be damaged while sufficiently maintaining the modifying effect of the filler.
  • the method of adding the filler is not particularly limited, and a method known in the same industry may be used.
  • the polyimide precursor composition may contain 10 to 15% by weight of solids based on the total weight.
  • a method of polymerizing by adding the total amount of the diamine monomer into a solvent, and then adding the dianhydride monomer to be substantially equimolar or excess with the diamine monomer, or the total amount of the dianhydride monomer into a solvent.
  • a diamine monomer is added so as to be substantially equimolar or excessive with the dianhydride monomer to perform polymerization.
  • the polyamic acid solution polymerized so that the diamine monomer or the dianhydride monomer is substantially equimolar or excessive is left standing during the process of applying the polyamic acid on the support or thawed and left at room temperature for a long time before use. If the viscosity of the polyamic acid changes during the process, a problem in which the thickness of the target polyimide film changes may occur. However, the polyimide precursor composition according to the present application may exhibit excellent dimensional stability and storage stability even after the above application.
  • the polyimide precursor composition has a viscosity change rate defined by Formula 1 below -10 to +10%, -9 to 9%, -8 to 8% -7 to 7%, -5 to 5%,- 3 to 3% or -1.5 to 1.5%.
  • Viscosity change rate (2nd viscosity-1st viscosity) / 1st viscosity ⁇ 100
  • the first viscosity is a viscosity measured by a Brookfield viscometer on the RV-7 spindle under conditions of 23° C. and a rotation speed of 0.5 rpm at an arbitrary point in time after the polyimide precursor composition is prepared
  • the second viscosity is After heating the polyimide precursor composition at any one temperature of 62 to 100° C. for any one hour of 30 minutes to 5 hours at any one point after 7 days from the first viscosity measurement point, a temperature of 23° C. and 0.5 This is the viscosity measured with a Brookfield viscometer on the RV-7 spindle under the condition of the rotational speed of rpm.
  • the change in the viscosity of the polyimide precursor composition means that the polyimide precursor composition is denatured, it can be understood as an index indicating the degree of modification of the polyimide precursor composition.
  • the present application also relates to a method of preparing a polyimide precursor composition.
  • the manufacturing method may be a method of manufacturing the above-described polyimide precursor composition.
  • the method for preparing a polyimide precursor composition of the present application may include a step of polymerizing a diamine monomer and a dianhydride monomer to prepare a polyamic acid, followed by heating.
  • the polyimide precursor composition may undergo a side reaction after a certain time.
  • the polyimide precursor composition having a specific bond dissociation energy binding unit according to the present application may semi-permanently provide a desired polyimide precursor composition through a step of heating after a predetermined time. The heating step may be different from the imidization curing step.
  • the heating step may be performed 3 days after polymerization of the diamine monomer and the dianhydride monomer.
  • heating may proceed, and the time is not particularly limited, but after 3 days, 3 to 30 days, 4 It may be 1 to 13 days, 5 to 12 days, or 6 to 10 days.
  • the polyimide precursor composition subjected to constant heating may be provided as a polyimide having excellent dimensional stability as unreacted materials are minimized when imidization is performed thereafter.
  • the heating step is not necessarily limited to the time.
  • heating may be performed when the viscosity of the polyimide precursor composition changes by 5% or more.
  • the viscosity change may be a change in viscosity at an arbitrary point in time, and for example, heating may be performed when the viscosity changes by 1% or more from an arbitrary point in time (right after polymerization).
  • the rate of change is not particularly limited, and may be any one of 1% or more and 30% or less, and the present application may proceed with heating at the time point.
  • the heating may be performed within a range of 62 to 100°C.
  • the temperature range is not particularly limited, but its lower limit may be 63°C, 64°C, 65°C, 66°C, 68°C, 73°C or 75°C.
  • the upper limit may be, for example, 95°C, 90°C, 88°C, 83°C or 75°C.
  • the present application may secure storage stability within the above temperature range, particularly for a precursor composition having a binding unit of the aforementioned bond dissociation energy.
  • the heating step may be performed for 30 minutes to 5 hours.
  • the heating time is not particularly limited, but its lower limit may be 40 minutes, 45 minutes, 50 minutes, 55 minutes or 90 minutes.
  • the upper limit may be, for example, 4 hours, 3 hours, 150 minutes or 100 minutes. The present application can minimize unreacted substances and secure storage stability of the precursor composition within the heating time range.
  • the present application also relates to a polyimide that is a cured product of the polyimide precursor composition.
  • the polyimide may be a cured product of the precursor composition prepared by the method for preparing the polyimide precursor composition described above.
  • the polyimide may be a polyimide film or sheet in the form of a film or sheet.
  • the polyimide may have a coefficient of thermal expansion (CTE) of 15 ppm/°C or less, 13 ppm/°C or less, 10 ppm/°C or less, or 5 ppm/°C or less.
  • the lower limit is not particularly limited, but may be 0 ppm/°C or 2 ppm/°C.
  • the CTE may be measured at elevated or lower temperature from 100°C to 350°C, for example.
  • by controlling the physical properties of the polyimide it is possible to implement excellent adhesion while maintaining mechanical properties such as excellent strength, chemical resistance, weather resistance, and heat resistance of the existing polyimide.
  • the polyimide may have a light transmittance of 55% or more, 60% or more, 61% or more, 62.5% or more, 64% or more, 65% or more, or 67.5% or more at 550 nm.
  • the upper limit of the light transmittance is not particularly limited, but may be 100% or less, 90% or less, or 80% or less.
  • the present application relates to a method of manufacturing a polyimide film.
  • the present application comprises the steps of preparing a gel film by forming a film of the polyimide precursor composition on a support and drying it; And it may provide a method for producing a polyimide film comprising the step of curing the gel film.
  • a conventionally known method may be used for a method of imidizing the above polyimide precursor composition to prepare a polyimide film.
  • the present application provides a polyimide precursor composition capable of securing storage stability and dimensional stability after curing for a polyimide precursor composition requiring storage or storage for a certain period of time, and a method of manufacturing the same.
  • NMP N-methyl-pyrrolidone
  • PPD 1,4-diaminobenzene
  • BPDA biphenyltetracarboxylic dianhydride
  • PMDA pyromellitic dianhydride
  • Example 1 a polyimide precursor composition was prepared in the same manner as in Example 1, except that the monomer and its content, and post-treatment conditions were changed as shown in Table 1 below, respectively.
  • Air bubbles were removed from the polyimide precursor compositions prepared in Examples and Comparative Examples through high-speed rotation of 1,500 rpm or more. Thereafter, the defoamed polyimide precursor composition was applied to the glass substrate using a spin coater. Thereafter, a gel film was prepared by drying in a nitrogen atmosphere and at a temperature of 120° C. for 30 minutes, and the gel film was heated to 450° C. at a rate of 2° C./min, heat-treated at 450° C. for 60 minutes, and then until 30° C. The polyimide film was obtained by cooling at a rate of 2° C./min. Thereafter, the polyimide film was removed from the glass substrate by dipping in distilled water. The physical properties of the prepared polyimide film were measured using the following method, and the results are shown in Table 2 below.
  • the thickness of the prepared polyimide film was measured.
  • the rate of change of the first viscosity and the second viscosity was calculated. If the rate of change is 5% or less, it may be classified as excellent, if it is 10% or less, it may be classified as normal, and if it is more than 10%, it may be classified as defective.
  • thermogravimetric analysis Q50 model was used, and the polyimide film was heated to 150°C at a rate of 10 min/°C in a nitrogen atmosphere, and then maintained isothermal for 30 minutes to remove moisture. Thereafter, the temperature was increased to 600° C. at a rate of 10 min/° C., and the temperature at which a weight loss of 1% occurred was measured.
  • thermomechanical analyzer Q400 model was used, and a polyimide film was cut into 2 mm in width and 10 mm in length, and then 500 N at room temperature at a rate of 10 °C/min while applying a tension of 0.05 N in a nitrogen atmosphere. After raising the temperature to °C, while cooling at a rate of 10 °C/min again, the slope of the section from 100 °C to 350 °C was measured.
  • Polydispersity was measured using Agilent Technologies' HPLC 1260 Infinity II model. Specifically, the polyimide precursor composition was dissolved in a mobile phase NMP solution at a concentration of 1% by weight, and then filtered through a 0.45 ⁇ m filter, and then measured. Using PLgel 5 mm Mixed-D as a column, the PD value of the polyimide precursor composition was measured at a flow rate of 0.9 ml/min under the measurement temperature condition of 50°C. Before the measurement, using polystyrene as a molecular weight standard sample, the PD value was calculated by a calibration curve carried out in the same manner as the above measurement conditions.
  • Example 1 15.3 5100 575 3.5 1.8 62 +1
  • Example 2 15.3 5100 570 3.7 1.9 63 +2
  • Example 3 15 6000 578 4.3 2.0 67 +4
  • Example 4 15 6000 576 4.5 2.0 68 +4
  • Example 5 15.3 5100 555 8.4 2.2 57 +8
  • Example 6 15.3 5100 556 8.4 2.2 58 +8 Comparative Example 1 15.1 4800 550 -2.5 2.3 45 +13 Comparative Example 2 15.1 4800 560 2.0 2.3 50 +15 Comparative Example 3 15 5000 535 32 2.3 66 -15

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Abstract

The present application relates to a polyimide precursor composition, a method for preparing same, and polyimide. With respect to a polyimide precursor which needs to be kept or stored for a predetermined time, the present application provides a polyimide precursor composition which can secure storage stability and dimensional stability after curing and a method for preparing same.

Description

폴리이미드 전구체 조성물, 이의 제조 방법 및 폴리이미드Polyimide precursor composition, preparation method thereof, and polyimide
관련 출원들과의 상호 인용Mutual citation with related applications
본 출원은 2019년 5월 10일자 한국 특허 출원 제10-2019-0055103호에 기초한 우선권의 이익을 주장하며, 해당 한국 특허 출원의 문헌에 개시된 모든 내용은 본 명세서의 일부로서 포함된다. This application claims the benefit of priority based on Korean Patent Application No. 10-2019-0055103 filed May 10, 2019, and all contents disclosed in the documents of the Korean patent application are included as part of this specification.
기술분야Technical field
본 출원은 폴리이미드 전구체 조성물, 이의 제조 방법 및 폴리이미드에 관한 것이다.The present application relates to a polyimide precursor composition, a method for preparing the same, and a polyimide.
폴리이미드(polyimide, PI)는 강직한 방향족 주쇄를 기본으로 하는 열적 안정성을 가진 고분자 물질로 이미드 고리의 화학적 안정성을 기초로 하여 우수한 강도, 내화학성, 내후성, 내열성 등의 기계적 특성을 가진다. Polyimide (PI) is a polymer material with thermal stability based on a rigid aromatic backbone and has mechanical properties such as excellent strength, chemical resistance, weather resistance, and heat resistance based on the chemical stability of the imide ring.
또한, 폴리이미드는 절연 특성, 낮은 유전율과 같은 뛰어난 전기적 특성으로 전자, 통신, 광학 등 광범위한 산업 분야에 적용 가능한 고기능성 고분자 재료로 각광받고 있다.In addition, polyimide is in the spotlight as a high-functional polymer material applicable to a wide range of industries such as electronics, communication, and optics due to its excellent electrical properties such as insulation and low dielectric constant.
최근에는 각종 전자기기가 박형화, 경량화 및 소형화됨에 따라 가볍고 유연성이 우수한 박형의 폴리이미드 필름을 회로기판의 절연소재 또는 디스플레이용 유리기판을 대체할 수 있는 디스플레이 기판으로 사용하고자 하는 연구가 많이 진행되고 있다.Recently, as various electronic devices become thinner, lighter, and smaller, many studies are being conducted to use a thin polyimide film with excellent flexibility as a display substrate that can replace an insulating material for a circuit board or a glass substrate for a display. .
일반적으로 폴리이미드 필름은 디안하이드라이드와 디아민의 중합 반응으로 제조되는 폴리아믹산을 지지체 상에 도포하고 이미드화하여 필름의 형태로 제조하고, 이를 지지체로부터 박리하는 방법으로 제조된다.In general, a polyimide film is prepared by applying a polyamic acid prepared by polymerization reaction of dianhydride and diamine onto a support and imidizing it to form a film, and peeling it from the support.
이때, 폴리아믹산은 아민기와 카르복실산기를 모두 포함하고 있으며 특히 카르복실산기 중의 히드록시기가 인접한 아민기와 반응함에 따라 가수분해될 수 있어, 이를 포함하는 폴리이미드 전구체 조성물의 저장 안정성 및 점도 안정성이 불량한 것으로 알려져 있다. 또한, 이러한 현상은 저온일 때보다 상온 또는 그 이상의 조건에서 두드러지는 것으로 알려져 있다.At this time, the polyamic acid contains both an amine group and a carboxylic acid group, and in particular, the hydroxy group in the carboxylic acid group may be hydrolyzed as it reacts with an adjacent amine group, so that the storage stability and viscosity stability of the polyimide precursor composition including the same are poor. Is known. In addition, this phenomenon is known to be more pronounced at room temperature or higher than at low temperature.
폴리이미드 전구체 조성물의 저장 안정성 및 점도 안정성이 불량할 경우, 공정 중 혹은 장시간 해동 과정에서 점도가 크게 변화할 수 있고, 이에 따라 폴리이미드 전구체 조성물의 도포 및 이미드화가 불안정하게 진행될 수 있다. 또한, 폴리아믹산의 점도가 변화하는 경우에는 폴리이미드 필름의 기계적, 열적 특성의 저하를 야기할 수 있다.When the storage stability and viscosity stability of the polyimide precursor composition are poor, the viscosity may change significantly during the process or during a long time thawing process, and thus, the application and imidization of the polyimide precursor composition may be unstable. In addition, when the viscosity of the polyamic acid changes, it may cause a decrease in mechanical and thermal properties of the polyimide film.
본 출원은 일정 시간 보관 또는 저장이 필요한 폴리이미드 전구체 조성물에 대해, 저장 안정성 및 경화 후 치수 안정성을 확보할 수 있는 폴리이미드 전구체 조성물 및 이의 제조방법을 제공한다.The present application provides a polyimide precursor composition capable of securing storage stability and dimensional stability after curing for a polyimide precursor composition requiring storage or storage for a certain period of time, and a method of manufacturing the same.
본 출원은 폴리이미드 전구체 조성물에 관한 것이다.The present application relates to a polyimide precursor composition.
본 출원의 폴리이미드 전구체 조성물은 디아민 단량체 및 디안하이드라이드 단량체를 중합 단위로 포함하고, 결합 해리 에너지가 650 KJ/mol 이하인 제 1 결합 단위를 포함할 수 있다. 상기 결합 해리에너지의 범위는 특별히 제한되지 않으나, 그 상한은 650 KJ/mol 이하, 630 KJ/mol 이하, 또는 620 KJ/mol 이하일 수 있으며, 그 하한은 300 KJ/mol 이상 또는 500 KJ/mol 이상일 수 있다. 본 출원은 상기의 결합 단위를 가지는 중합체를 포함함으로써, 저점도의 폴리이미드 전구체 조성물의 점도 특성을 유지하여 상기 전구체 조성물이 반영구적으로 저장 안정성을 확보할 수 있다.The polyimide precursor composition of the present application may include a diamine monomer and a dianhydride monomer as polymerized units, and may include a first bonding unit having a bond dissociation energy of 650 KJ/mol or less. The range of the bond dissociation energy is not particularly limited, but the upper limit may be 650 KJ/mol or less, 630 KJ/mol or less, or 620 KJ/mol or less, and the lower limit is 300 KJ/mol or more or 500 KJ/mol or more. I can. The present application includes the polymer having the above-described binding unit, thereby maintaining the viscosity characteristics of the low-viscosity polyimide precursor composition, so that the precursor composition can semi-permanently secure storage stability.
본 출원의 폴리이미드 전구체 조성물은 저점도 특성을 갖는 조성물일 수 있다. 본 출원의 폴리이미드 전구체 조성물은 23℃ 온도 및 0.5 rpm의 회전속도 조건으로 RV-7번 스핀들에서 브룩필드 점도계로 측정한 점도가 10,000cP 이하, 9,000 cP 이하일 수 있다. 그 하한은 특별히 한정되지 않으나, 500 cP 이상 또는 1000 cP 이상일 수 있다. 본 출원은 상기 점도 범위를 조절함으로써, 우수한 공정성을 갖는 전구체 조성물을 제공하여, 필름 또는 기판 형성 시 목적하는 물성의 필름 또는 기판을 형성할 수 있다.The polyimide precursor composition of the present application may be a composition having low viscosity characteristics. The polyimide precursor composition of the present application may have a viscosity of 10,000 cP or less and 9,000 cP or less as measured by a Brookfield viscometer on the RV-7 spindle at 23° C. and a rotation speed of 0.5 rpm. The lower limit is not particularly limited, but may be 500 cP or more or 1000 cP or more. The present application provides a precursor composition having excellent processability by adjusting the viscosity range, so that a film or substrate having desired physical properties can be formed when forming a film or substrate.
이와 같이, 폴리이미드 전구체 조성물은 저점도 특성이 중요한데, 이를 유지하는 것이 쉽지 않다. 폴리아믹산은 아민기와 카르복실산기를 모두 포함하고 있으며 특히 카르복실산기 중의 히드록시기가 인접한 아민기와 반응함에 따라 가수분해될 수 있고, 이를 포함하는 폴리이미드 전구체 조성물의 저장 안정성 및 점도 안정성이 불량한 것으로 알려져 있다. 이에 따라, 상기 폴리이미드 전구체 조성물을 일정 시간 보관 또는 저장하게 될 경우, 일부 부반응이 발생하는 문제가 있다. 그러나, 본 출원에 따른 폴리이미드 전구체 조성물은 반영구적으로 역반응 또는 일부 결합 단위 해리가 가능하고, 이에 따라, 상기 전구체 조성물에 대해 언제든지 목적하는 상태의 폴리이미드 전구체 조성물을 제공할 수 있다. As such, the polyimide precursor composition has an important low viscosity property, but it is not easy to maintain it. Polyamic acid contains both an amine group and a carboxylic acid group, and in particular, the hydroxy group in the carboxylic acid group may be hydrolyzed as it reacts with an adjacent amine group, and it is known that the storage stability and viscosity stability of the polyimide precursor composition containing the same are poor. . Accordingly, when the polyimide precursor composition is stored or stored for a certain period of time, there is a problem that some side reactions occur. However, the polyimide precursor composition according to the present application may semi-permanently reverse reaction or dissociate some bonding units, and thus, a polyimide precursor composition in a desired state may be provided with respect to the precursor composition at any time.
본 출원의 구체예에서, 상기 디아민 단량체 및 디안하이드라이드 단량체 중 적어도 하나는 상기 제 1 결합 단위로 연결된 2 이상의 방향족 고리를 포함하는 단량체를 포함할 수 있다. 또한, 하나의 예시에서, 폴리이미드 전구체 조성물은 상기 제 1 결합 단위가 해리된 디아민 단량체 또는 상기 제 1 결합 단위가 해리된 디안하이드라이드 단량체를 추가로 포함할 수 있다.In a specific example of the present application, at least one of the diamine monomer and the dianhydride monomer may include a monomer including two or more aromatic rings connected by the first bonding unit. In addition, in one example, the polyimide precursor composition may further include a diamine monomer from which the first bonding unit is dissociated or a dianhydride monomer from which the first bonding unit is dissociated.
또한, 본 출원의 구체예에서, 폴리이미드 전구체 조성물은 말단에 디아민 단량체가 중합되어 있거나, 말단에 중합된 디아민 단량체에 상기 제 1 결합 단위가 해리된 디안하이드라이드 단량체가 결합되어 있거나, 또는 말단에 제 1 결합 단위가 해리된 디아민 단량체가 결합되어 있을 수 있다. 상기 첫 번째 예시인 말단에 디아민 단량체가 중합되어 있는 경우, 상기 말단의 디아민 단량체의 아민기가 아마이드 결합 형성 전에 일부 결합 단위에서 해리될 수 있다.In addition, in the specific example of the present application, in the polyimide precursor composition, a diamine monomer is polymerized at the terminal, or a dianhydride monomer from which the first binding unit is dissociated is bonded to the diamine monomer polymerized at the terminal, or at the terminal. The diamine monomer from which the first bonding unit is dissociated may be bonded. In the case where the diamine monomer is polymerized at the terminal as the first example, the amine group of the diamine monomer at the terminal may be dissociated from some bonding units before the amide bond is formed.
일 구체예에서, 폴리이미드 전구체 조성물은 말단에 디아민 단량체가 중합되어 있는 경우, 잔존하는 디안하이드라이드가 상기 말단의 디아민 단량체와 일부 부반응이 진행되면서 점도가 상승할 수 있다. 이 경우, 점도를 다시 되돌리는 수단으로서, 본 출원은 부반응이 진행된 상기 디안하이드라이드의 제 1 결합단위를 해리시킬 수 있다. 이에 따라, 상기 디안하이드라이드의 제 1 결합단위가 해리된 단량체가 중합 단위에 존재할 수 있다. 또는, 본 출원은 상기 부반응이 진행된 상기 말단의 디아민 단량체의 제 1 결합단위를 해리시킬 수 있다. 또 다른 예시에서, 본 출원은 말단에 중합되어 있는 디아민 단량체의 아민기가 아마이드 결합을 형성하는 과정 중에, 일부 결합 단위를 해리시킬 수 있다. 이 경우, 상기 일부 결합 단위가 해리된 상태로 폴리이미드 전구체 조성물이 존재할 수 있고, 본 출원은 이를 통해 점도를 다시 저점도로 유지할 수 있다. 상기 결합 단위를 해리시키는 방법은 특별히 제한되지 않고, 공지의 방법을 사용할 수 있다.In one embodiment, when a diamine monomer is polymerized at the end of the polyimide precursor composition, the viscosity may increase as the remaining dianhydride proceeds with some side reactions with the diamine monomer at the end. In this case, as a means of returning the viscosity again, the present application may dissociate the first binding unit of the dianhydride subjected to a side reaction. Accordingly, a monomer from which the first binding unit of the dianhydride is dissociated may be present in the polymerization unit. Alternatively, the present application may dissociate the first binding unit of the diamine monomer at the terminal in which the side reaction has been performed. In another example, the present application may dissociate some bonding units during the process of forming an amide bond in the amine group of the diamine monomer polymerized at the terminal. In this case, the polyimide precursor composition may be present in a state in which some of the bonding units are dissociated, and the present application may maintain the viscosity again at a low viscosity through this. The method for dissociating the bonding unit is not particularly limited, and a known method can be used.
하나의 예시에서, 상술한 바와 같이, 본 출원의 폴리이미드 전구체 조성물은 상기 디아민 단량체가 제 1 결합 단위로 연결된 2 이상의 방향족 고리를 포함하는 단량체를 포함할 수 있다. 디아민 단량체가 상기 제 1 결합 단위를 포함하는 경우도, 상술한 바와 같이, 제 1 결합 단위가 해리될 수 있으며, 또한, 말단의 디아민 단량체의 아민기가 아마이드 결합 형성 전에 일부 결합 단위에서 해리될 수 있다. 이 경우, 말단에 중합된 디아민 단량체는 상기 제 1 결합 단위가 해리된 상태일 수 있다. 또는, 본 출원은 말단에 중합되어 있는 디아민 단량체의 아민기가 아마이드 결합을 형성하는 과정 중에, 일부 결합 단위를 해리시킬 수 있다.In one example, as described above, the polyimide precursor composition of the present application may include a monomer including two or more aromatic rings in which the diamine monomer is connected by a first bonding unit. Even when the diamine monomer includes the first bonding unit, as described above, the first bonding unit may be dissociated, and the amine group of the terminal diamine monomer may be dissociated from some bonding units prior to formation of the amide bond. . In this case, the diamine monomer polymerized at the terminal may be in a state in which the first bonding unit is dissociated. Alternatively, the present application may dissociate some bonding units during the process of forming an amide bond in the amine group of the diamine monomer polymerized at the terminal.
폴리이미드 전구체 조성물의 경우, 상온 또는 고온에서 일부 부반응이 발생함으로써 저분자량 물질, 미반응 물질이 발생할 수 있는데, 본 출원의 폴리이미드 전구체 조성물은 상기의 부반응이 억제되므로, 분자량의 분포도가 좁게 형성될 수 있다. 일 구체예에서, 상기 폴리이미드 전구체 조성물이 경화된 후, 그 다분산도는 2.2 이하, 2.0 이하, 1.9 이하 또는 1.8 이하일 수 있다. 상기 다분산도의 하한은 특별히 한정되지 않고, 1.2 이상, 1.3 이상 또는 1.5 이상일 수 있다. 본 출원은 상기 다분산도를 조절함으로써, 전구체 조성물의 상온 및 고온에서의 저장 안정성을 향상시킬 수 있다.In the case of a polyimide precursor composition, a low molecular weight substance and an unreacted substance may occur due to some side reactions occurring at room temperature or high temperature.The polyimide precursor composition of the present application suppresses the above side reactions, so the distribution of molecular weight is narrow. I can. In one embodiment, after the polyimide precursor composition is cured, its polydispersity may be 2.2 or less, 2.0 or less, 1.9 or less, or 1.8 or less. The lower limit of the polydispersity is not particularly limited, and may be 1.2 or more, 1.3 or more, or 1.5 or more. The present application may improve the storage stability of the precursor composition at room temperature and high temperature by adjusting the polydispersity.
하나의 예시에서, 상기 폴리이미드 전구체 조성물은 경화 후 열분해 온도가 560℃ 이상, 562℃ 이상, 570℃ 이상, 573℃ 이상, 576℃ 이상, 577℃ 이상일 수 있다. 그 상한 값은 특별히 한정되지 않으나, 1000℃ 이하, 또는 800℃ 이하일 수 있다. 본 출원의 폴리이미드 전구체 조성물은 상기 열분해 온도를 조절함으로써, 미반응 단량체들을 최소화할 수 있고, 이를 통해 목적하는 물성의 폴리이미드를 제공할 수 있다.In one example, the polyimide precursor composition may have a thermal decomposition temperature of 560°C or higher, 562°C or higher, 570°C or higher, 573°C or higher, 576°C or higher, and 577°C or higher after curing. The upper limit value is not particularly limited, but may be 1000° C. or less, or 800° C. or less. The polyimide precursor composition of the present application can minimize unreacted monomers by controlling the thermal decomposition temperature, and thereby provide a polyimide having a desired physical property.
일 구체예에서, 본 출원의 폴리이미드 전구체 조성물은 경화 후 중량평균분자량이 10,000 내지 100,000, 15,000 내지 80,000, 18,000 내지 70,000, 20,000 내지 60,000, 25,000 내지 55,000 또는 30,000 내지 50,000의 범위 내일 수 있다. 본 출원에서 용어 중량평균분자량은, GPC(Gel permeation Chromatograph)로 측정한 표준 폴리스티렌에 대한 환산 수치를 의미한다. 본 출원의 상기 중량평균분자량을 갖는 폴리이미드에 대한 전술한 다분산도를 조절함으로써, 미반응 모노머를 최소화할 수 있다.In one embodiment, the polyimide precursor composition of the present application may have a weight average molecular weight of 10,000 to 100,000, 15,000 to 80,000, 18,000 to 70,000, 20,000 to 60,000, 25,000 to 55,000, or 30,000 to 50,000 after curing. In the present application, the term weight average molecular weight means a value converted to standard polystyrene measured by GPC (Gel permeation Chromatograph). By controlling the polydispersity of the polyimide having the weight average molecular weight of the present application, it is possible to minimize the unreacted monomer.
또한, 하나의 예시에서 본 출원의 폴리이미드 전구체 조성물은 경화 후 신율이 15% 이상, 20% 이상 또는 30% 이상일 수 있다. 그 상한 값은 특별히 제한되지 않으나, 50% 이하 또는 45% 이하일 수 있다.In addition, in one example, the polyimide precursor composition of the present application may have an elongation of 15% or more, 20% or more, or 30% or more after curing. The upper limit value is not particularly limited, but may be 50% or less or 45% or less.
하나의 예시에서, 본 출원의 폴리이미드 전구체 조성물은 디아민 단량체 및 디안하이드라이드 단량체가 중합된 폴리아믹산 용액을 포함할 수 있다. 본 명세서에서 상기 폴리이미드 전구체 조성물은 상기 폴리아믹산 용액과 동일한 의미로 사용될 수 있다.In one example, the polyimide precursor composition of the present application may include a polyamic acid solution in which a diamine monomer and a dianhydride monomer are polymerized. In the present specification, the polyimide precursor composition may have the same meaning as the polyamic acid solution.
폴리아믹산 용액의 제조에 사용될 수 있는 디안하이드라이드 단량체는 방향족 테트라카르복실릭 디안하이드라이드일 수 있으며, 상기 방향족 테트라카르복실릭 디안하이드라이드는 피로멜리틱 디안하이드라이드(또는 PMDA), 3,3',4,4'-바이페닐테트라카르복실릭 디안하이드라이드(또는 BPDA), 2,3,3',4'-바이페닐테트라카르복실릭 디안하이드라이드(또는 a-BPDA), 옥시디프탈릭 디안하이드라이드(또는 ODPA), 디페닐설폰-3,4,3',4'-테트라카르복실릭 디안하이드라이드(또는 DSDA), 비스(3,4-디카르복시페닐)설파이드 디안하이드라이드, 2,2-비스(3,4-디카르복시페닐)-1,1,1,3,3,3-헥사플루오로프로페인 디안하이드라이드, 2,3,3',4'- 벤조페논테트라카르복실릭 디안하이드라이드, 3,3',4,4'-벤조페논테트라카르복실릭 디안하이드라이드(또는 BTDA), 비스(3,4-디카르복시페닐)메테인 디안하이드라이드, 2,2-비스(3,4-디카르복시페닐)프로페인 디안하이드라이드, p-페닐렌비스(트라이멜리틱 모노에스터 애시드 안하이드라이드), p-바이페닐렌비스(트라이멜리틱 모노에스터 애시드 안하이드라이드), m-터페닐-3,4,3',4'-테트라카르복실릭 디안하이드라이드, p-터페닐-3,4,3',4'-테트라카르복실릭 디안하이드라이드, 1,3-비스(3,4-디카르복시페녹시)벤젠 디안하이드라이드, 1,4-비스(3,4-디카르복시페녹시)벤젠 디안하이드라이드, 1,4-비스(3,4-디카르복시페녹시)바이페닐 디안하이드라이드, 2,2-비스〔(3,4-디카르복시 페녹시)페닐〕프로페인 디안하이드라이드(BPADA), 2,3,6,7-나프탈렌테트라카복실산 디안하이드라이드, 1,4,5,8-나프탈렌테트라카르복실릭 디안하이드라이드, 4,4'-(2,2-헥사플루오로아이소프로필리덴)디프탈산 디안하이드라이드 등을 예로 들 수 있다. The dianhydride monomer that can be used in the preparation of the polyamic acid solution may be an aromatic tetracarboxylic dianhydride, and the aromatic tetracarboxylic dianhydride is pyromellitic dianhydride (or PMDA), 3,3 ',4,4'-biphenyltetracarboxylic dianhydride (or BPDA), 2,3,3',4'-biphenyltetracarboxylic dianhydride (or a-BPDA), oxydiphthalic Dianhydride (or ODPA), diphenylsulfone-3,4,3',4'-tetracarboxylic dianhydride (or DSDA), bis(3,4-dicarboxyphenyl)sulfide dianhydride, 2 ,2-bis(3,4-dicarboxyphenyl)-1,1,1,3,3,3-hexafluoropropane dianhydride, 2,3,3',4'-benzophenonetetracarboxyl Rick dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride (or BTDA), bis(3,4-dicarboxyphenyl)methane dianhydride, 2,2-bis (3,4-dicarboxyphenyl) propane dianhydride, p-phenylenebis (trimelitic monoester acid anhydride), p-biphenylenebis (trimelitic monoester acid anhydride), m-terphenyl-3,4,3',4'-tetracarboxylic dianhydride, p-terphenyl-3,4,3',4'-tetracarboxylic dianhydride, 1,3- Bis(3,4-dicarboxyphenoxy)benzene dianhydride, 1,4-bis(3,4-dicarboxyphenoxy)benzene dianhydride, 1,4-bis(3,4-dicarboxyphenoxy) ) Biphenyl dianhydride, 2,2-bis [(3,4-dicarboxyphenoxy)phenyl] propane dianhydride (BPADA), 2,3,6,7-naphthalenetetracarboxylic acid dianhydride, 1 ,4,5,8-naphthalenetetracarboxylic dianhydride, 4,4'-(2,2-hexafluoroisopropylidene)diphthalic acid dianhydride, etc. are mentioned.
상기 디안하이드라이드 단량체는 필요에 따라, 단독 또는 2 종 이상을 조합하여 이용할 수 있지만, 본 출원은 전술한 결합 해리에너지를 고려하여, 예를 들면, 피로멜리틱 디안하이드라이드(PMDA), 3,3',4,4'-바이페닐테트라카르복실릭 디안하이드라이드(s-BPDA) 또는 2,3,3',4'-바이페닐테트라카르복실릭 디안하이드라이드(a-BPDA)를 포함할 수 있다.The dianhydride monomer may be used alone or in combination of two or more as necessary, but the present application considers the aforementioned bond dissociation energy, for example, pyromellitic dianhydride (PMDA), 3, 3',4,4'-biphenyltetracarboxylic dianhydride (s-BPDA) or 2,3,3',4'-biphenyltetracarboxylic dianhydride (a-BPDA). I can.
또한, 폴리아믹산 용액 제조에 사용될 수 있는 디아민 단량체는 방향족 디아민으로서, 이하와 같이 분류하여 예를 들 수 있다.In addition, the diamine monomer that can be used for preparing the polyamic acid solution is an aromatic diamine, and is classified as follows and examples thereof are given.
1) 1,4-디아미노벤젠(또는 파라페닐렌디아민, PDA), 1,3-디아미노벤젠, 2,4-디아미노톨루엔, 2,6-디아미노톨루엔, 3,5-디아미노벤조익 애시드(또는 DABA) 등과 같이, 구조 상 벤젠 핵 1개를 갖는 디아민으로서, 상대적으로 강직한 구조의 디아민;1) 1,4-diaminobenzene (or paraphenylenediamine, PDA), 1,3-diaminobenzene, 2,4-diaminotoluene, 2,6-diaminotoluene, 3,5-diaminobenzo As a diamine having one benzene nucleus in structure, such as an acid acid (or DABA), a diamine having a relatively rigid structure;
2) 4,4'-디아미노디페닐에테르(또는 옥시디아닐린, ODA), 3,4'-디아미노디페닐에테르 등의 디아미노디페닐에테르, 4,4'-디아미노디페닐메테인(메틸렌디아민), 3,3'-디메틸-4,4'-디아미노바이페닐, 2,2'-디메틸-4,4'-디아미노바이페닐, 2,2'-비스(트라이플루오로메틸)-4,4'-디아미노바이페닐, 3,3'-디메틸-4,4'-디아미노디페닐메테인, 3,3'-디카복시-4,4'-디아미노디페닐메테인, 3,3',5,5'-테트라메틸-4,4'-디아미노디페닐메테인, 비스(4-아미노페닐)설파이드, 4,4'-디아미노벤즈아닐라이드, 3,3'-디클로로벤지딘, 3,3'-디메틸벤지딘(또는 o-톨리딘), 2,2'-디메틸벤지딘(또는 m-톨리딘), 3,3'-디메톡시벤지딘, 2,2'-디메톡시벤지딘, 3,3'-디아미노디페닐에테르, 3,4'-디아미노디페닐에테르, 4,4'-디아미노디페닐에테르, 3,3'-디아미노디페닐설파이드, 3,4'-디아미노디페닐설파이드, 4,4'-디아미노디페닐설파이드, 3,3'-디아미노디페닐설폰, 3,4'-디아미노디페닐설폰, 4,4'-디아미노디페닐설폰, 3,3'-디아미노벤조페논, 4,4'-디아미노벤조페논, 3,3'-디아미노-4,4'-디클로로벤조페논, 3,3'-디아미노-4,4'-디메톡시벤조페논, 3,3'-디아미노디페닐메테인, 3,4'-디아미노디페닐메테인, 4,4'-디아미노디페닐메테인, 2,2-비스(3-아미노페닐)프로페인, 2,2-비스(4-아미노페닐)프로페인, 2,2-비스(3-아미노페닐)-1,1,1,3,3,3-헥사플루오로프로페인, 2,2-비스(4-아미노페닐)-1,1,1,3,3,3-헥사플루오로프로페인, 3,3'-디아미노디페닐설폭사이드, 3,4'-디아미노디페닐설폭사이드, 4,4'-디아미노디페닐설폭사이드 등과 같이, 구조 상 벤젠 핵 2개를 갖는 디아민;2) Diaminodiphenyl ether, such as 4,4'-diaminodiphenyl ether (or oxydianiline, ODA), 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane (Methylenediamine), 3,3'-dimethyl-4,4'-diaminobiphenyl, 2,2'-dimethyl-4,4'-diaminobiphenyl, 2,2'-bis (trifluoromethyl )-4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 3,3'-dicarboxy-4,4'-diaminodiphenylmethane , 3,3',5,5'-tetramethyl-4,4'-diaminodiphenylmethane, bis(4-aminophenyl)sulfide, 4,4'-diaminobenzanilide, 3,3' -Dichlorobenzidine, 3,3'-dimethylbenzidine (or o-tolidine), 2,2'-dimethylbenzidine (or m-tolidine), 3,3'-dimethoxybenzidine, 2,2'-dimethoxy Benzidine, 3,3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl ether, 3,3'-diaminodiphenylsulfide, 3,4' -Diaminodiphenylsulfide, 4,4'-diaminodiphenylsulfide, 3,3'-diaminodiphenylsulfone, 3,4'-diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfone , 3,3'-diaminobenzophenone, 4,4'-diaminobenzophenone, 3,3'-diamino-4,4'-dichlorobenzophenone, 3,3'-diamino-4,4' -Dimethoxybenzophenone, 3,3'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 2,2-bis(3- Aminophenyl)propane, 2,2-bis(4-aminophenyl)propane, 2,2-bis(3-aminophenyl)-1,1,1,3,3,3-hexafluoropropane, 2,2-bis(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropane, 3,3'-diaminodiphenylsulfoxide, 3,4'-diaminodi Diamines having two benzene nuclei in structure, such as phenyl sulfoxide and 4,4'-diaminodiphenyl sulfoxide;
3) 1,3-비스(3-아미노페닐)벤젠, 1,3-비스(4-아미노페닐)벤젠, 1,4-비스(3-아미노페닐)벤젠, 1,4-비스(4-아미노 페닐)벤젠, 1,3-비스(4-아미노페녹시)벤젠, 1,4-비스(3-아미노페녹시)벤젠(또는 TPE-Q), 1,4-비스(4-아미노페녹시)벤젠(또는 TPE-Q), 1,3-비스(3-아미노페녹시)-4-트라이플루오로메틸벤젠, 3,3'-디아미노-4-(4-페닐)페녹시벤조페논, 3,3'-디아미노-4,4'-디(4-페닐페녹시)벤조페논, 1,3-비스(3-아미노페닐설파이드)벤젠, 1,3-비스(4-아미노페닐설파이 드)벤젠, 1,4-비스(4-아미노페닐설파이드)벤젠, 1,3-비스(3-아미노페닐설폰)벤젠, 1,3-비스(4-아미노페닐설폰)벤젠, 1,4-비스(4-아미노페닐설폰)벤젠, 1,3-비스〔2-(4-아미노페닐)아이소프로필〕벤젠, 1,4-비스〔2-(3-아미노페닐)아이소프로필〕벤젠, 1,4-비스〔2-(4-아미노페닐)아이소프로필〕벤젠 등과 같이, 구조 상 벤젠 핵 3개를 갖는 디아민;3) 1,3-bis(3-aminophenyl)benzene, 1,3-bis(4-aminophenyl)benzene, 1,4-bis(3-aminophenyl)benzene, 1,4-bis(4-amino Phenyl)benzene, 1,3-bis(4-aminophenoxy)benzene, 1,4-bis(3-aminophenoxy)benzene (or TPE-Q), 1,4-bis(4-aminophenoxy) Benzene (or TPE-Q), 1,3-bis(3-aminophenoxy)-4-trifluoromethylbenzene, 3,3'-diamino-4-(4-phenyl)phenoxybenzophenone, 3 ,3'-diamino-4,4'-di(4-phenylphenoxy)benzophenone, 1,3-bis(3-aminophenylsulfide)benzene, 1,3-bis(4-aminophenylsulfide) Benzene, 1,4-bis(4-aminophenylsulfide)benzene, 1,3-bis(3-aminophenylsulfone)benzene, 1,3-bis(4-aminophenylsulfone)benzene, 1,4-bis( 4-aminophenylsulfone)benzene, 1,3-bis[2-(4-aminophenyl)isopropyl]benzene, 1,4-bis[2-(3-aminophenyl)isopropyl]benzene, 1,4- Diamines having three benzene nuclei in structure, such as bis[2-(4-aminophenyl)isopropyl]benzene;
4) 3,3'-비스(3-아미노페녹시)바이페닐, 3,3'-비스(4-아미노페녹시)바이페닐, 4,4'-비스(3-아미노페녹시)바이페닐, 4,4'-비스(4-아미노페녹시)바이페닐, 비스〔3-(3-아미노페녹시)페닐〕에테르, 비스〔3-(4-아미노페녹시)페닐〕에테르, 비스〔4-(3-아미노페녹시)페닐〕에테르, 비스〔4-(4-아미노페녹시)페닐〕에테르, 비스〔3-(3-아미노페녹시)페닐〕케톤, 비스〔3-(4-아미노페녹시)페닐〕케톤, 비스〔4-(3-아미노페녹시)페닐〕케톤, 비스〔4-(4-아미노 페녹시)페닐〕케톤, 비스〔3-(3-아미노페녹시)페닐〕설파이드, 비스〔3-(4-아미노페녹시)페닐〕설파이드, 비스 〔4-(3-아미노페녹시)페닐〕설파이드, 비스〔4-(4-아미노페녹시)페닐〕설파이드, 비스〔3-(3-아미노페녹시)페닐〕설폰, 비스〔3-(4-아미노페녹시)페닐〕설폰, 비스〔4-(3-아미노페녹시)페닐〕설폰, 비스〔4-(4-아미노페녹시)페닐〕설폰, 비스〔3-(3-아미노페녹시)페닐〕메테인, 비스〔3-(4-아미노페녹시)페닐〕메테인, 비스〔4-(3-아미노페녹시)페닐〕메테인, 비스〔4-(4-아미노페녹시)페닐〕메테인, 2,2-비스〔3-(3-아미노페녹시)페닐〕프로페인, 2,2-비스〔3-(4-아미노페녹시)페닐〕프로페인, 2,2-비스〔4-(3-아미노페녹시)페닐〕프로페인, 2,2-비스〔4-(4-아미노페녹시)페닐〕프로페인(BAPP), 2,2-비스〔3-(3-아미노페녹시)페닐〕-1,1,1,3,3,3-헥사플루오로프로페인, 2,2-비스〔3-(4-아미노페녹시)페닐〕-1,1,1,3,3,3-헥사플루오로프로페인, 2,2-비스〔4-(3-아미노페녹시)페닐〕-1,1,1,3,3,3-헥사플루오로프로페인, 2,2-비스〔4-(4-아미노페녹시)페닐〕-1,1,1,3,3,3-헥사플루오로프로페인 등과 같이, 구조 상 벤젠 핵 4개를 갖는 디아민.4) 3,3'-bis(3-aminophenoxy)biphenyl, 3,3'-bis(4-aminophenoxy)biphenyl, 4,4'-bis(3-aminophenoxy)biphenyl, 4,4'-bis(4-aminophenoxy)biphenyl, bis [3-(3-aminophenoxy)phenyl] ether, bis [3-(4-aminophenoxy)phenyl] ether, bis [4- (3-aminophenoxy)phenyl] ether, bis (4- (4-aminophenoxy) phenyl) ether, bis (3- (3-aminophenoxy) phenyl) ketone, bis (3- (4-aminophenoxy) Si) phenyl] ketone, bis (4-(3-aminophenoxy) phenyl) ketone, bis (4- (4-amino phenoxy) phenyl) ketone, bis (3- (3-aminophenoxy) phenyl) sulfide , Bis [3-(4-aminophenoxy)phenyl] sulfide, bis [4-(3-aminophenoxy) phenyl] sulfide, bis [4-(4-aminophenoxy) phenyl] sulfide, bis [3- (3-aminophenoxy)phenyl] sulfone, bis (3-(4-aminophenoxy) phenyl) sulfone, bis (4- (3-aminophenoxy) phenyl) sulfone, bis (4- (4-aminophenoxy) Si) phenyl] sulfone, bis (3-(3-aminophenoxy) phenyl) methane, bis (3- (4-aminophenoxy) phenyl) methane, bis (4- (3-aminophenoxy) phenyl ] Methane, bis [4-(4-aminophenoxy) phenyl] methane, 2,2-bis [3-(3-aminophenoxy) phenyl] propane, 2,2-bis [3-(4 -Aminophenoxy)phenyl] propane, 2,2-bis (4- (3-aminophenoxy) phenyl) propane, 2,2-bis (4- (4-aminophenoxy) phenyl) propane ( BAPP), 2,2-bis [3-(3-aminophenoxy) phenyl]-1,1,1,3,3,3-hexafluoropropane, 2,2-bis [3-(4- Aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, 2,2-bis[4-(3-aminophenoxy)phenyl]-1,1,1,3 ,3,3-hexafluoropropane, 2,2-bis[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropane, etc. Diamine with four phase benzene nuclei.
상기 디아민 단량체는 필요에 따라, 단독 또는 2 종 이상을 조합하여 이용할 수 있으며, 본 출원은 전술한 결합 해리 에너지를 고려하여, 예를 들면, 1,4-디아미노벤젠(PPD), 1,3-디아미노벤젠(MPD), 2,4-디아미노톨루엔, 2,6-디아미노톨루엔 또는 4,4'-메틸렌디아민(MDA)를 포함할 수 있다.The diamine monomer may be used alone or in combination of two or more, as needed, and the present application considers the aforementioned bond dissociation energy, for example, 1,4-diaminobenzene (PPD), 1,3 -Diaminobenzene (MPD), 2,4-diaminotoluene, 2,6-diaminotoluene or 4,4'-methylenediamine (MDA).
본 출원은 상기 폴리이미드 전구체 조성물이 유기용매를 포함할 수 있다. 상기 유기 용매는 폴리아믹산이 용해될 수 있는 유기 용매라면 특별히 한정되지는 않으나, 하나의 예로서 비양성자성 극성 용매(aprotic polar solvent)일 수 있다.In the present application, the polyimide precursor composition may include an organic solvent. The organic solvent is not particularly limited as long as it is an organic solvent in which polyamic acid can be dissolved, but may be an aprotic polar solvent as an example.
상기 비양성자성 극성 용매는 예를 들어, N,N'-디메틸포름아미드(DMF), N,N'-디메틸아세트아미드(DMAc) 등의 아미드계 용매, p-클로로페놀, o-클로로페놀 등의 페놀계 용매, N-메틸-피롤리돈(NMP), 감마 브티로 락톤(GBL) 및 디그림(Diglyme) 등을 들 수 있고, 이들은 단독으로 또는 2종 이상 조합되어 사용될 수 있다.The aprotic polar solvent is, for example, an amide solvent such as N,N'-dimethylformamide (DMF), N,N'-dimethylacetamide (DMAc), p-chlorophenol, o-chlorophenol, etc. Phenolic solvents, N-methyl-pyrrolidone (NMP), gamma butyrolactone (GBL), and Diglyme, and these may be used alone or in combination of two or more.
본 출원은, 경우에 따라서 톨루엔, 테트라히드로푸란, 아세톤, 메틸에틸케톤, 메탄올, 에탄올, 물 등의 보조적 용매를 사용하여, 폴리아믹산의 용해도를 조절할 수도 있다.According to the present application, the solubility of polyamic acid may be adjusted by using an auxiliary solvent such as toluene, tetrahydrofuran, acetone, methyl ethyl ketone, methanol, ethanol, and water in some cases.
하나의 예시에서, 상기 유기 용매는 예를 들어, N-메틸-피롤리돈(NMP) 일 수 있다.In one example, the organic solvent may be, for example, N-methyl-pyrrolidone (NMP).
한편, 본 출원의 폴리이미드 전구체 조성물은 접동성, 열전도성, 도전성, 코로나 내성, 루프 경도 등의 필름의 여러 가지 특성을 개선할 목적으로 충전재가 포함될 수 있다. 첨가되는 충전재는 특별히 한정되는 것은 아니지만, 예를 들어, 실리카, 산화티탄, 알루미나, 질화규소, 질화붕소, 인산수소칼슘, 인산칼슘, 운모 등을 들 수 있다.On the other hand, the polyimide precursor composition of the present application may include a filler for the purpose of improving various properties of the film such as sliding property, thermal conductivity, conductivity, corona resistance, and loop hardness. The filler to be added is not particularly limited, and examples thereof include silica, titanium oxide, alumina, silicon nitride, boron nitride, calcium hydrogen phosphate, calcium phosphate, and mica.
상기 충전재의 입경은 특별히 한정되는 것은 아니며, 개질하여야 할 필름 특성과 첨가하는 충전재의 종류에 따라서 결정할 수 있다. 상기 평균 입경은 0.05 내지 20 ㎛, 0.1 내지 10 ㎛, 0.1 내지 5 ㎛ 또는 0.1 내지 3 ㎛일 수 있다. 본 명세서에서 평균 입경은 특별히 달리 규정하지 않는 한, D50 입도 분석에 따라 측정한 평균 입경일 수 있다.The particle diameter of the filler is not particularly limited, and may be determined according to the characteristics of the film to be modified and the type of filler to be added. The average particle diameter may be 0.05 to 20 µm, 0.1 to 10 µm, 0.1 to 5 µm, or 0.1 to 3 µm. In the present specification, the average particle diameter may be an average particle diameter measured according to D50 particle size analysis unless otherwise specified.
본 출원은 상기 입경 범위를 조절함으로써, 개질 효과를 충분히 유지하면서도 표면성을 손상시키지 않고 기계적 특성을 저하시키지 않을 수 있다.In the present application, by adjusting the particle diameter range, the modification effect may be sufficiently maintained, and the surface properties may not be impaired and the mechanical properties may not be deteriorated.
또한, 본 출원은 충전재의 첨가량에 대해서도 특별히 한정되는 것은 아니고, 개질하여야 할 필름 특성이나 충전재 입경 등에 의해 결정할 수 있다. 본 출원에서, 상기 충전재의 첨가량은 폴리이미드 수지 100 중량부에 대하여 0.01 내지 10 중량부, 0.01 내지 5 중량부, 또는 0.02 내지 1 중량부일 수 있다. 본 출원은 상기 함량을 조절함으로써, 충전재의 개질 효과를 충분히 유지하면서도 필름의 기계적 특성을 손상시키지 않을 수 있다.In addition, the present application is not particularly limited to the amount of the filler added, and may be determined by film properties to be modified or the particle diameter of the filler. In the present application, the amount of the filler added may be 0.01 to 10 parts by weight, 0.01 to 5 parts by weight, or 0.02 to 1 part by weight based on 100 parts by weight of the polyimide resin. According to the present application, by adjusting the content, the mechanical properties of the film may not be damaged while sufficiently maintaining the modifying effect of the filler.
상기 충전재의 첨가 방법은 특별히 한정되는 것은 아니고, 동종 업계의 공지의 방법을 이용할 수도 있다.The method of adding the filler is not particularly limited, and a method known in the same industry may be used.
하나의 구체적인 예에서, 상기 폴리이미드 전구체 조성물은 전체 중량을 기준으로 고형분을 10 내지 15 중량% 포함할 수 있다.In one specific example, the polyimide precursor composition may contain 10 to 15% by weight of solids based on the total weight.
본 출원은 상기 폴리이미드 전구체 조성물의 고형분 함량을 조절함으로써, 점도 상승을 제어하면서 경화 과정에서 다량의 용매를 제거해야 하는 제조 비용과 공정 시간 증가를 방지할 수 있다.In the present application, by controlling the solid content of the polyimide precursor composition, it is possible to prevent an increase in manufacturing cost and process time required to remove a large amount of solvent during the curing process while controlling viscosity increase.
한편, 폴리아믹산 용액의 제조는 예를 들어, 디아민 단량체 전량을 용매 중에 넣고, 그 후 디안하이드라이드 단량체를 디아민 단량체와 실질적으로 등몰 또는 과량이 되도록 첨가하여 중합하는 방법 또는 디안하이드라이드 단량체 전량을 용매 중에 넣고, 그 후 디아민 단량체를 디안하이드라이드 단량체와 실질적으로 등몰 또는 과량이 되도록 첨가하여 중합하는 방법 등을 사용한다.On the other hand, in the preparation of a polyamic acid solution, for example, a method of polymerizing by adding the total amount of the diamine monomer into a solvent, and then adding the dianhydride monomer to be substantially equimolar or excess with the diamine monomer, or the total amount of the dianhydride monomer into a solvent. Into, and then, a diamine monomer is added so as to be substantially equimolar or excessive with the dianhydride monomer to perform polymerization.
상기와 같이, 디아민 단량체 또는 디안하이드라이드 단량체가 실질적으로 등몰 또는 과량이 되도록 중합된 폴리아믹산 용액은 상기 폴리아믹산을 지지체 상에 도포하는 공정 중에 방치된 상태 혹은 사용하기 전 상온에서 장시간 해동, 방치하는 과정에서 폴리아믹산의 점도가 변화하는 경우, 목표로 한 폴리이미드 필름의 두께가 변화하는 문제가 발생할 수 있다. 그러나, 본 출원에 따른 폴리이미드 전구체 조성물은 상기의 도포 후에도 치수 안정성 및 저장 안정성을 우수하게 구현할 수 있다.As described above, the polyamic acid solution polymerized so that the diamine monomer or the dianhydride monomer is substantially equimolar or excessive is left standing during the process of applying the polyamic acid on the support or thawed and left at room temperature for a long time before use. If the viscosity of the polyamic acid changes during the process, a problem in which the thickness of the target polyimide film changes may occur. However, the polyimide precursor composition according to the present application may exhibit excellent dimensional stability and storage stability even after the above application.
하나의 예시에서, 폴리이미드 전구체 조성물은 하기 수식 1로 정의되는 점도 변화율이 -10 내지 +10%, -9 내지 9%, -8 내지 8% -7 내지 7%, -5 내지 5%, -3 내지 3% 또는 -1.5 내지 1.5%의 범위일 수 있다.In one example, the polyimide precursor composition has a viscosity change rate defined by Formula 1 below -10 to +10%, -9 to 9%, -8 to 8% -7 to 7%, -5 to 5%,- 3 to 3% or -1.5 to 1.5%.
[수식 1][Equation 1]
점도 변화율 = (제2점도 - 제1점도) / 제1점도 × 100Viscosity change rate = (2nd viscosity-1st viscosity) / 1st viscosity × 100
상기 제1점도는 상기 폴리이미드 전구체 조성물이 제조된 후 임의의 시점에서, 23℃ 온도 및 0.5 rpm의 회전속도 조건으로 RV-7번 스핀들에서 브룩필드 점도계로 측정한 점도이고, 상기 제2점도는 상기 제1점도 측정 시점으로부터 7 일 이후 어느 한 시점에서 상기 폴리이미드 전구체 조성물에 대해 62 내지 100℃ 중 어느 한 온도로 30분 내지 5시간 중 어느 한 시간 동안 가열 처리한 후, 23℃ 온도 및 0.5 rpm의 회전속도 조건으로 RV-7번 스핀들에서 브룩필드 점도계로 측정한 점도이다.The first viscosity is a viscosity measured by a Brookfield viscometer on the RV-7 spindle under conditions of 23° C. and a rotation speed of 0.5 rpm at an arbitrary point in time after the polyimide precursor composition is prepared, and the second viscosity is After heating the polyimide precursor composition at any one temperature of 62 to 100° C. for any one hour of 30 minutes to 5 hours at any one point after 7 days from the first viscosity measurement point, a temperature of 23° C. and 0.5 This is the viscosity measured with a Brookfield viscometer on the RV-7 spindle under the condition of the rotational speed of rpm.
이러한 폴리이미드 전구체 조성물의 점도 변화는 곧 폴리이미드 전구체 조성물에 변성이 일어났음을 의미하므로, 이는 폴리이미드 전구체 조성물의 변성 정도롤 나타내는 하나의 지표로서 이해될 수 있다.Since the change in the viscosity of the polyimide precursor composition means that the polyimide precursor composition is denatured, it can be understood as an index indicating the degree of modification of the polyimide precursor composition.
통상적인 폴리이믹산은 상온에서 약 7 일간 저장하는 경우, ±300 cP를 초과하는 점도 변화를 나타내는바, 이는 폴리아믹산에 상당한 정도의 변성이 발생하였음을 의미하고, 저장 안정성이 불량하여 우수한 물성의 폴리이미드 필름이 구현되기 어려울 수 있다.Conventional polyimic acid shows a change in viscosity exceeding ±300 cP when stored at room temperature for about 7 days, which means that a considerable degree of denaturation has occurred in the polyamic acid. It can be difficult to implement a mid film.
본 출원은 또한, 폴리이미드 전구체 조성물의 제조 방법에 관한 것이다. 상기 제조 방법은 전술한 폴리이미드 전구체 조성물의 제조 방법일 수 있다.The present application also relates to a method of preparing a polyimide precursor composition. The manufacturing method may be a method of manufacturing the above-described polyimide precursor composition.
본 출원의 폴리이미드 전구체 조성물 제조 방법은 디아민 단량체 및 디안하이드라이드 단량체를 중합하여 폴리아믹산 제조 후, 가열하는 단계를 포함할 수 있다. 전술한 바와 같이, 폴리이미드 전구체 조성물은 일정 시간 이후에 부반응이 진행될 수 있다. 그러나, 본 출원에 따른 특정 결합 해리 에너지 결합단위를 가지는 폴리이미드 전구체 조성물은 일정 시간 이후에 가열하는 단계를 통해, 반영구적으로 목적하는 폴리이미드 전구체 조성물을 제공할 수 있다. 상기 가열하는 단계는 이미드화 경화 단계와는 상이할 수 있다. The method for preparing a polyimide precursor composition of the present application may include a step of polymerizing a diamine monomer and a dianhydride monomer to prepare a polyamic acid, followed by heating. As described above, the polyimide precursor composition may undergo a side reaction after a certain time. However, the polyimide precursor composition having a specific bond dissociation energy binding unit according to the present application may semi-permanently provide a desired polyimide precursor composition through a step of heating after a predetermined time. The heating step may be different from the imidization curing step.
일 예시에서, 가열하는 단계는 디아민 단량체 및 디안하이드라이드 단량체를 중합 후 3일 이후에 진행할 수 있다. 상기에서, 디아민 단량체 및 디안하이드라이드 단량체를 중합 후, 일정 부반응이 진행된 경우, 즉, 일정 시간 이후 가열을 진행할 수 있으며, 그 시간은 특별히 한정되지 않으나, 3일 이후, 3일 내지 30일, 4일 내지 13일, 5일 내지 12일 또는 6일 내지 10일일 수 있다. 일정 가열이 진행된 폴리이미드 전구체 조성물은 이후 이미드화가 진행되면, 미반응 물질이 최소화되어 치수 안정성이 우수한 폴리이미드로 제공될 수 있다.In one example, the heating step may be performed 3 days after polymerization of the diamine monomer and the dianhydride monomer. In the above, after polymerization of the diamine monomer and the dianhydride monomer, when a certain side reaction proceeds, that is, after a certain time, heating may proceed, and the time is not particularly limited, but after 3 days, 3 to 30 days, 4 It may be 1 to 13 days, 5 to 12 days, or 6 to 10 days. The polyimide precursor composition subjected to constant heating may be provided as a polyimide having excellent dimensional stability as unreacted materials are minimized when imidization is performed thereafter.
상기 가열하는 단계는 상기 시간에 반드시 한정되는 것은 아니다. 상기 가열하는 단계는 디아민 단량체 및 디안하이드라이드 단량체를 중합 후, 폴리이미드 전구체 조성물의 점도가 5% 이상 변화한 경우 가열을 진행할 수 있다. 상기 점도 변화는 임의의 한 시점에서의 점도 변화일 수 있으며, 예를 들어, 임의의 한 시점(중합 직후)으로부터 점도가 1% 이상 변화한 경우 가열을 진행할 수 있다. 상기 변화율은 특별히 한정되지 않고, 1% 이상 30% 이하 중 어느 한 시점일 수 있으며, 본 출원은 상기 시점에서 가열을 진행할 수 있다.The heating step is not necessarily limited to the time. In the heating step, after polymerization of the diamine monomer and the dianhydride monomer, heating may be performed when the viscosity of the polyimide precursor composition changes by 5% or more. The viscosity change may be a change in viscosity at an arbitrary point in time, and for example, heating may be performed when the viscosity changes by 1% or more from an arbitrary point in time (right after polymerization). The rate of change is not particularly limited, and may be any one of 1% or more and 30% or less, and the present application may proceed with heating at the time point.
하나의 예시에서, 상기 가열하는 단계는 62 내지 100℃의 범위 내로 진행될 수 있다. 상기 온도 범위는 특별히 제한되지 않으나, 그 하한은 63℃, 64℃, 65℃, 66℃, 68℃, 73℃ 또는 75℃일 수 있다. 또한, 그 상한은 예를 들어, 95℃, 90℃, 88℃, 83℃ 또는 75℃일 수 있다. 본 출원은 상기 온도 범위 내에서, 특히 전술한 결합 해리 에너지의 결합단위를 갖는 전구체 조성물에 대해, 저장 안정성을 확보할 수 있다.In one example, the heating may be performed within a range of 62 to 100°C. The temperature range is not particularly limited, but its lower limit may be 63°C, 64°C, 65°C, 66°C, 68°C, 73°C or 75°C. Further, the upper limit may be, for example, 95°C, 90°C, 88°C, 83°C or 75°C. The present application may secure storage stability within the above temperature range, particularly for a precursor composition having a binding unit of the aforementioned bond dissociation energy.
또한, 하나의 예시에서, 상기 가열하는 단계는 30분 내지 5시간 동안 진행될 수 있다. 상기 가열 시간은 특별히 제한되지 않으나, 그 하한은 40분, 45분, 50분, 55분 또는 90분일 수 있다. 또한, 그 상한 예를 들어, 4시간, 3시간, 150분 또는 100분일 수 있다. 본 출원은 상기 가열 시간 범위 내에서, 미반응 물질을 최소화하고 전구체 조성물의 저장 안정성을 확보할 수 있다.In addition, in one example, the heating step may be performed for 30 minutes to 5 hours. The heating time is not particularly limited, but its lower limit may be 40 minutes, 45 minutes, 50 minutes, 55 minutes or 90 minutes. In addition, the upper limit may be, for example, 4 hours, 3 hours, 150 minutes or 100 minutes. The present application can minimize unreacted substances and secure storage stability of the precursor composition within the heating time range.
본 출원은 또한, 상기 폴리이미드 전구체 조성물의 경화물인 폴리이미드에 관한 것이다. 일 예시에서, 상기 폴리이미드는 전술한 폴리이미드 전구체 조성물의 제조방법으로 제조된 전구체 조성물의 경화물일 수 있다. 상기 폴리이미드는 필름 또는 시트 형태의 폴리이미드 필름 또는 시트일 수 있다.The present application also relates to a polyimide that is a cured product of the polyimide precursor composition. In one example, the polyimide may be a cured product of the precursor composition prepared by the method for preparing the polyimide precursor composition described above. The polyimide may be a polyimide film or sheet in the form of a film or sheet.
상기 폴리이미드는 열팽창계수(CTE)가 15ppm/℃ 이하, 13 ppm/℃ 이하, 10 ppm/℃ 이하 또는 5 ppm/℃ 이하일 수 있다. 그 하한은 특별히 한정되지 않으나, 0 ppm/℃ 또는 2 ppm/℃일 수 있다. 상기 CTE는 예를 들어, 100℃에서 350℃까지 승온 또는 하온 시 측정한 것일 수 있다. 본 출원은 상기 폴리이미드의 물성을 조절함으로써, 기존의 폴리이미드의 우수한 강도, 내화학성, 내후성, 내열성 등의 기계적 특성을 유지하면서도 우수한 접착력을 구현할 수 있다.The polyimide may have a coefficient of thermal expansion (CTE) of 15 ppm/℃ or less, 13 ppm/℃ or less, 10 ppm/℃ or less, or 5 ppm/℃ or less. The lower limit is not particularly limited, but may be 0 ppm/°C or 2 ppm/°C. The CTE may be measured at elevated or lower temperature from 100°C to 350°C, for example. In the present application, by controlling the physical properties of the polyimide, it is possible to implement excellent adhesion while maintaining mechanical properties such as excellent strength, chemical resistance, weather resistance, and heat resistance of the existing polyimide.
또한, 상기 폴리이미드는 550nm에서의 광투과율이 55% 이상, 60% 이상, 61% 이상, 62.5% 이상, 64% 이상, 65% 이상 또는 67.5% 이상일 수 있다. 상기 광투과율의 상한은 특별히 한정되지 않으나, 100% 이하, 90% 이하, 80% 이하일 수 있다.In addition, the polyimide may have a light transmittance of 55% or more, 60% or more, 61% or more, 62.5% or more, 64% or more, 65% or more, or 67.5% or more at 550 nm. The upper limit of the light transmittance is not particularly limited, but may be 100% or less, 90% or less, or 80% or less.
하나의 예시에서, 본 출원은 폴리이미드 필름의 제조방법에 관한 것이다. 본 출원은 상기 폴리이미드 전구체 조성물을 지지체에 제막하고 건조하여 겔 필름을 제조하는 단계; 및 상기 겔 필름을 경화하는 단계를 포함하는, 폴리이미드 필름의 제조방법을 제공할 수 있다.In one example, the present application relates to a method of manufacturing a polyimide film. The present application comprises the steps of preparing a gel film by forming a film of the polyimide precursor composition on a support and drying it; And it may provide a method for producing a polyimide film comprising the step of curing the gel film.
구체적으로, 상기한 폴리이미드 전구체 조성물을 이미드화하여 폴리이미드 필름을 제조하는 방법에 대해서는, 종래 공지된 방법을 사용할 수 있다.Specifically, for a method of imidizing the above polyimide precursor composition to prepare a polyimide film, a conventionally known method may be used.
이러한 이미드화의 구체적인 방법으로는 열 이미드화법, 화학 이미드화법 또는 상기 열 이미드화법과 화학 이미드화법을 병용하는 복합 이미드화법을 예로 들수 있으며, 이들에 대해서는 이하의 비제한적인 예를 통해 보다 구체적으로 설명한다.Specific methods of such imidization include thermal imidation, chemical imidation, or a complex imidization method in which the thermal imidation and chemical imidation are used in combination, and the following non-limiting examples are given. It will be described in more detail through.
본 출원은 일정 시간 보관 또는 저장이 필요한 폴리이미드 전구체 조성물에 대해, 저장 안정성 및 경화 후 치수 안정성을 확보할 수 있는 폴리이미드 전구체 조성물 및 이의 제조방법을 제공한다.The present application provides a polyimide precursor composition capable of securing storage stability and dimensional stability after curing for a polyimide precursor composition requiring storage or storage for a certain period of time, and a method of manufacturing the same.
이하 본 발명에 따르는 실시예 및 본 발명에 따르지 않는 비교예를 통하여 본 발명을 보다 상세히 설명하나, 본 발명의 범위가 하기 제시된 실시예에 의해 제한되는 것은 아니다.Hereinafter, the present invention will be described in more detail through examples according to the present invention and comparative examples not according to the present invention, but the scope of the present invention is not limited by the examples presented below.
실시예 1Example 1
교반기 및 질소 주입 배출관을 구비한 500 ㎖ 반응기에 질소를 주입시키면서 N-메틸-피롤리돈(NMP)을 투입하고 반응기의 온도를 30℃로 설정한 후 디아민 단량체로서 1,4-디아미노벤젠(PPD), 디안하이드라이드 단량체로서 바이페닐테트라카르복실릭 디안하이드라이드(BPDA) 및 피로멜리틱 디안하이드라이드(PMDA)를 투입하여 완전히 용해된 것을 확인한다. 질소 분위기하에 40℃로 온도를 올려 가열하면서 120 분간 교반을 계속한 후, 23℃에서의 점도가 7,000 cP를 나타내는 폴리아믹산 용액을 제조하였다.N-methyl-pyrrolidone (NMP) was introduced into a 500 ml reactor equipped with a stirrer and a nitrogen injection and discharge pipe, and the temperature of the reactor was set to 30°C. As a diamine monomer, 1,4-diaminobenzene ( PPD), biphenyltetracarboxylic dianhydride (BPDA) and pyromellitic dianhydride (PMDA) were added as dianhydride monomers to confirm that they were completely dissolved. After the temperature was raised to 40° C. in a nitrogen atmosphere and stirring was continued for 120 minutes while heating, a polyamic acid solution having a viscosity of 7,000 cP at 23° C. was prepared.
이이서, 질소 분위기하에 80℃로 온도를 올려 가열하면서 2 시간 동안 추가적으로 교반을 계속한 후, 23℃까지 냉각하여 점도가 5,100 cP를 나타내고, 디아민 단량체 및 디안하이드라이드 단량체를 하기 표 1과 같이 포함하는 폴리이미드 전구체 조성물을 제조하였다.Then, stirring was continued for 2 hours while heating by raising the temperature to 80° C. in a nitrogen atmosphere, and then cooled to 23° C. to show a viscosity of 5,100 cP, and a diamine monomer and a dianhydride monomer were included as shown in Table 1 below. The following polyimide precursor composition was prepared.
상기 폴리이미드 전구체 조성물 제조 7일 후에, 80℃ 온도로 1시간 동안 후처리를 실시하였다.After 7 days of preparing the polyimide precursor composition, a post-treatment was performed at 80°C for 1 hour.
실시예 2 내지 6 및 비교예 1Examples 2 to 6 and Comparative Example 1
실시예 1에서, 단량체 및 이의 함량, 및 후처리 조건을 각각 하기 표 1과 같이 변경한 것을 제외하고, 실시예 1과 동일한 방법으로 폴리이미드 전구체 조성물을 제조하였다.In Example 1, a polyimide precursor composition was prepared in the same manner as in Example 1, except that the monomer and its content, and post-treatment conditions were changed as shown in Table 1 below, respectively.
디아민(몰%)Diamine (mol%) 디안하이드라이드(몰%)Dianhydride (mol%) 후처리 조건Post-treatment conditions
PPD(몰%)PPD (mol%) BPDA(몰%)BPDA (mol%) PMDA(몰%)PMDA (mol%) 온도(℃)Temperature(℃) 시간time
실시예 1Example 1 100100 5050 5050 8080 1시간1 hours
실시예 2Example 2 100100 5050 5050 8080 2시간2 hours
실시예 3Example 3 100100 100100 -- 7070 1시간1 hours
실시예 4Example 4 100100 100100 -- 7070 2시간2 hours
실시예 5Example 5 100100 5050 5050 6060 1시간1 hours
실시예 6Example 6 100100 5050 5050 6060 2시간2 hours
비교예 1Comparative Example 1 100100 00 100100 8080 1시간1 hours
비교예 2Comparative Example 2 100100 00 100100 -- --
비교예 3Comparative Example 3 ODA(4,4'-OxyDiAniline) 100%ODA(4,4'-OxyDiAniline) 100% 00 100100 8080 1시간1 hours
상기 실시예 및 비교예에서 제조된 폴리이미드 전구체 조성물을 1,500 rpm 이상의 고속 회전을 통해 기포를 제거하였다. 이후 스핀 코터를 이용하여 유리 기판에 탈포된 폴리이미드 전구체 조성물을 도포하였다. 이후 질소 분위기하 및 120℃의 온도에서 30 분 동안 건조하여 겔 필름을 제조하고, 상기 겔 필름을 450℃까지 2 ℃/분의 속도로 승온하고, 450℃에서 60 분 동안 열처리하고, 30℃까지 2 ℃/분의 속도로 냉각하여 폴리이미드 필름을 수득하였다.이후 증류수에 디핑(dipping)하여 유리 기판에서 폴리이미드 필름을 박리시켰다. 제조된 폴리이미드 필름의 물성을 하기 방식을 이용하여 측정하고, 그 결과를 하기 표 2에 나타내었다.Air bubbles were removed from the polyimide precursor compositions prepared in Examples and Comparative Examples through high-speed rotation of 1,500 rpm or more. Thereafter, the defoamed polyimide precursor composition was applied to the glass substrate using a spin coater. Thereafter, a gel film was prepared by drying in a nitrogen atmosphere and at a temperature of 120° C. for 30 minutes, and the gel film was heated to 450° C. at a rate of 2° C./min, heat-treated at 450° C. for 60 minutes, and then until 30° C. The polyimide film was obtained by cooling at a rate of 2° C./min. Thereafter, the polyimide film was removed from the glass substrate by dipping in distilled water. The physical properties of the prepared polyimide film were measured using the following method, and the results are shown in Table 2 below.
실험예 1 - 두께Experimental Example 1-Thickness
상기 제조된 폴리이미드 필름의 두께를 측정하였다.The thickness of the prepared polyimide film was measured.
실험예 2 - 점도 측정Experimental Example 2-Viscosity Measurement
실시예 및 비교예에서 제조된 폴리이미드 전구체 조성물에 대해, Brookfield 점도계(RVDV-II+P)를 25℃에서 7 번 scandal을 사용하여 50 rpm에서 2 회 측정하여 평균값을 계산하여 제 1 점도를 측정하였다.For the polyimide precursor compositions prepared in Examples and Comparative Examples, a Brookfield viscometer (RVDV-II+P) was measured twice at 50 rpm using a 7 scandal at 25°C, and the average value was calculated to measure the first viscosity. I did.
상기 점도 측정 이후, 상온에서 7 일간 방치하였다. 이후, 후처리 공정 이후 동일한 방식으로 제 2 점도를 측정하였다.After the viscosity measurement, it was left at room temperature for 7 days. Thereafter, the second viscosity was measured in the same manner after the post-treatment process.
상기 제 1 점도 및 제 2 점도의 변화율을 계산하였다. 상기 변화율이 5% 이하인 경우 우수, 10% 이하인 경우 보통, 10% 초과인 경우 불량으로 분류될 수 있다.The rate of change of the first viscosity and the second viscosity was calculated. If the rate of change is 5% or less, it may be classified as excellent, if it is 10% or less, it may be classified as normal, and if it is more than 10%, it may be classified as defective.
실험예 3 - 열분해 온도(Td)Experimental Example 3-Pyrolysis temperature (Td)
TA사 열무게 분석(thermogravimetric analysis) Q50 모델을 사용하였으며, 폴리이미드 필름을 질소 분위기하에서 10 min/℃의 속도로 150℃까지 승온시킨 후 30 분간 등온을 유지하여 수분을 제거했다. 이후 10 min/℃의 속도로 600℃까지 승온하여 1 %의 중량 감소가 발생하는 온도를 측정하였다.TA's thermogravimetric analysis Q50 model was used, and the polyimide film was heated to 150°C at a rate of 10 min/°C in a nitrogen atmosphere, and then maintained isothermal for 30 minutes to remove moisture. Thereafter, the temperature was increased to 600° C. at a rate of 10 min/° C., and the temperature at which a weight loss of 1% occurred was measured.
실험예 4 - CTEExperimental Example 4-CTE
TA사 열기계 분석기(thermomechanical analyzer) Q400 모델을 사용하였으며, 폴리이미드 필름을 폭 2 mm, 길이 10 mm로 자른 후 질소 분위기하에서 0.05 N의 장력을 가하면서, 10 ℃/min의 속도로 상온에서 500℃까지 승온 후 다시 10 ℃/min의 속도로 냉각하면서 100℃에서 350℃ 구간의 기울기를 측정하였다.TA's thermomechanical analyzer Q400 model was used, and a polyimide film was cut into 2 mm in width and 10 mm in length, and then 500 N at room temperature at a rate of 10 °C/min while applying a tension of 0.05 N in a nitrogen atmosphere. After raising the temperature to °C, while cooling at a rate of 10 °C/min again, the slope of the section from 100 °C to 350 °C was measured.
실험예 5 - 투과율Experimental Example 5-Transmittance
상기에서 제조한 폴리이미드 필름에 대하여 UV-Vis Spectrometer를 이용하여 550nm에서의 광투과율을 측정하였다.For the polyimide film prepared above, light transmittance at 550 nm was measured using a UV-Vis Spectrometer.
실험예 6 - PD(다분산도)Experimental Example 6-PD (polydispersity)
다분산도는 Agilent Technologies사 HPLC 1260 Infinity Ⅱ모델을 사용하여 측정하였다. 구체적으로, 상기 폴리이미드 전구체 조성물을 이동상 NMP 용액에 1 중량%의 농도로 용해시킨 후 0.45 ㎛ 필터에 여과시킨후 측정하였다. 컬럼으로 PLgel 5 mm Mixed-D를 사용하고, 0.9 ml/min의 유속으로, 50℃의 측정 온도조건에서 폴리이미드 전구체 조성물의 PD값을 측정하였다. 측정전, 분자량 표준시료로서 폴리스티렌를 활용해 상기의 측정 조건과 동일하게 실시한 검량선으로 PD값을 산출하였다.Polydispersity was measured using Agilent Technologies' HPLC 1260 Infinity II model. Specifically, the polyimide precursor composition was dissolved in a mobile phase NMP solution at a concentration of 1% by weight, and then filtered through a 0.45 μm filter, and then measured. Using PLgel 5 mm Mixed-D as a column, the PD value of the polyimide precursor composition was measured at a flow rate of 0.9 ml/min under the measurement temperature condition of 50°C. Before the measurement, using polystyrene as a molecular weight standard sample, the PD value was calculated by a calibration curve carried out in the same manner as the above measurement conditions.
두께(㎛)Thickness(㎛) 제1점도(cP)1st viscosity (cP) 열분해온도(℃)Pyrolysis temperature (℃) CTE(ppm/℃)CTE(ppm/℃) PDPD 투과율(%)Transmittance (%) 점도 변화율(%)Viscosity change rate (%)
실시예 1Example 1 15.315.3 51005100 575575 3.53.5 1.81.8 6262 +1+1
실시예 2Example 2 15.315.3 51005100 570570 3.73.7 1.91.9 6363 +2+2
실시예 3Example 3 1515 60006000 578578 4.34.3 2.02.0 6767 +4+4
실시예 4Example 4 1515 60006000 576576 4.54.5 2.02.0 6868 +4+4
실시예 5Example 5 15.315.3 51005100 555555 8.48.4 2.22.2 5757 +8+8
실시예 6Example 6 15.315.3 51005100 556556 8.48.4 2.22.2 5858 +8+8
비교예 1Comparative Example 1 15.115.1 48004800 550550 -2.5-2.5 2.32.3 4545 +13+13
비교예 2Comparative Example 2 15.115.1 48004800 560560 2.02.0 2.32.3 5050 +15+15
비교예 3Comparative Example 3 1515 50005000 535535 3232 2.32.3 6666 -15-15

Claims (19)

  1. 디아민 단량체 및 디안하이드라이드 단량체를 중합 단위로 포함하고, 결합 해리 에너지가 650 KJ/mol 이하인 제 1 결합 단위를 포함하는 폴리이미드 전구체 조성물.A polyimide precursor composition comprising a diamine monomer and a dianhydride monomer as a polymerization unit, and a first bonding unit having a bond dissociation energy of 650 KJ/mol or less.
  2. 제 1 항에 있어서, 디아민 단량체 및 디안하이드라이드 단량체 중 적어도 하나는 상기 제 1 결합 단위로 연결된 2 이상의 방향족 고리를 포함하는 단량체를 포함하는 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 1, wherein at least one of a diamine monomer and a dianhydride monomer comprises a monomer including two or more aromatic rings connected by the first bonding unit.
  3. 제 2 항에 있어서, 상기 제 1 결합 단위가 해리된 디아민 단량체 또는 디안하이드라이드 단량체를 추가로 포함하는 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 2, wherein the first bonding unit further comprises a dissociated diamine monomer or a dianhydride monomer.
  4. 제 2 항에 있어서, 말단에 디아민 단량체가 중합되어 있거나, 말단에 중합된 디아민 단량체에 상기 제 1 결합 단위가 해리된 디안하이드라이드 단량체가 결합되어 있거나, 또는 말단에 제 1 결합 단위가 해리된 디아민 단량체가 결합되어 있는 폴리이미드 전구체 조성물.The diamine according to claim 2, wherein a diamine monomer is polymerized at the terminal, or a dianhydride monomer from which the first binding unit is dissociated is bonded to the diamine monomer polymerized at the terminal, or the first bonding unit is dissociated at the terminal. Polyimide precursor composition to which a monomer is bound.
  5. 제 4 항에 있어서, 말단에 디아민 단량체가 중합되어 있는 경우, 상기 말단의 디아민 단량체의 아민기가 아마이드 결합 형성 전에 일부 결합 단위에서 해리된 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 4, wherein, when the diamine monomer is polymerized at the terminal, the amine group of the diamine monomer at the terminal is dissociated from some bonding units prior to formation of an amide bond.
  6. 제 1 항에 있어서, 경화 후 다분산도가 2.2 이하인 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 1, wherein the polyimide precursor composition has a polydispersity of 2.2 or less after curing.
  7. 제 1 항에 있어서, 경화 후 열분해 온도가 560℃ 이상인 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 1, wherein the thermal decomposition temperature after curing is 560°C or higher.
  8. 제 1 항에 있어서, 경화 후 중량평균분자량이 10,000 내지 100,000의 범위 내인 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 1, wherein the weight average molecular weight after curing is in the range of 10,000 to 100,000.
  9. 제 1 항에 있어서, 경화 후 신율이 15% 이상인 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 1, wherein the elongation after curing is 15% or more.
  10. 제 1 항에 있어서, 23℃ 온도 및 0.5 rpm의 회전속도 조건으로 RV-7번 스핀들에서 브룩필드 점도계로 측정한 점도가 10,000cP 이하인 폴리이미드 전구체 조성물.The polyimide precursor composition according to claim 1, wherein the viscosity measured with a Brookfield viscometer on the RV-7 spindle at 23° C. and a rotation speed of 0.5 rpm is 10,000 cP or less.
  11. 제 1 항에 있어서, 디아민 단량체는 1,4-디아미노벤젠(PPD), 1,3-디아미노벤젠(MPD), 2,4-디아미노톨루엔, 2,6-디아미노톨루엔 또는 4,4'-메틸렌디아민(MDA)를 포함하는 폴리이미드 전구체 조성물.The method of claim 1, wherein the diamine monomer is 1,4-diaminobenzene (PPD), 1,3-diaminobenzene (MPD), 2,4-diaminotoluene, 2,6-diaminotoluene or 4,4 '- A polyimide precursor composition comprising methylenediamine (MDA).
  12. 제 1 항에 있어서, 디안하이드라이드 단량체는 피로멜리틱 디안하이드라이드(PMDA), 3,3',4,4'-바이페닐테트라카르복실릭 디안하이드라이드(s-BPDA) 또는 2,3,3',4'-바이페닐테트라카르복실릭 디안하이드라이드(a-BPDA)를 포함하는 폴리이미드 전구체 조성물.The method of claim 1, wherein the dianhydride monomer is pyromellitic dianhydride (PMDA), 3,3',4,4'-biphenyltetracarboxylic dianhydride (s-BPDA) or 2,3, A polyimide precursor composition comprising 3',4'-biphenyltetracarboxylic dianhydride (a-BPDA).
  13. 제 1 항에 있어서, 하기 수식 1로 정의되는 점도 변화율이 -10 내지 +10%인 폴리이미드 전구체 조성물:The polyimide precursor composition according to claim 1, wherein the viscosity change rate defined by the following Equation 1 is -10 to +10%:
    [수식 1][Equation 1]
    점도 변화율 = (제2점도 - 제1점도) / 제1점도 X 100Viscosity change rate = (2nd viscosity-1st viscosity) / 1st viscosity X 100
    상기 제1점도는 상기 폴리이미드 전구체 조성물이 제조된 후 임의의 시점에서, 23℃ 온도 및 0.5 rpm의 회전속도 조건으로 RV-7번 스핀들에서 브룩필드 점도계로 측정한 점도이고, 상기 제2점도는 상기 제1점도 측정 시점으로부터 7 일 이후 어느 한 시점에서 상기 폴리이미드 전구체 조성물에 대해 62 내지 100℃ 중 어느 한 온도로 30분 내지 5시간 중 어느 한 시간 동안 가열 처리한 후, 23℃ 온도 및 0.5 rpm의 회전속도 조건으로 RV-7번 스핀들에서 브룩필드 점도계로 측정한 점도이다.The first viscosity is a viscosity measured by a Brookfield viscometer on the RV-7 spindle under conditions of 23° C. and a rotation speed of 0.5 rpm at an arbitrary point in time after the polyimide precursor composition is prepared, and the second viscosity is After heating the polyimide precursor composition at any one temperature of 62 to 100° C. for any one hour of 30 minutes to 5 hours at any one point after 7 days from the first viscosity measurement point, a temperature of 23° C. and 0.5 This is the viscosity measured with a Brookfield viscometer on the RV-7 spindle under the condition of the rotational speed of rpm.
  14. 디아민 단량체 및 디안하이드라이드 단량체를 중합하여 폴리아믹산 제조 후, 가열하는 단계를 포함하는 제 1 항에 따른 폴리이미드 전구체 조성물 제조 방법.A method for preparing a polyimide precursor composition according to claim 1, comprising polymerizing a diamine monomer and a dianhydride monomer to prepare a polyamic acid, followed by heating.
  15. 제 14 항에 있어서, 가열하는 단계는 디아민 단량체 및 디안하이드라이드 단량체를 중합 후 3일 이후에 진행하는 폴리이미드 전구체 조성물 제조 방법.The method of claim 14, wherein the heating step is performed 3 days after polymerization of the diamine monomer and the dianhydride monomer.
  16. 제 14 항에 있어서, 가열하는 단계는 디아민 단량체 및 디안하이드라이드 단량체를 중합 후, 폴리이미드 전구체 조성물의 점도가 5% 이상 변화한 경우 가열하는 폴리이미드 전구체 조성물 제조 방법.15. The method of claim 14, wherein the heating is performed when the diamine monomer and the dianhydride monomer are polymerized and the viscosity of the polyimide precursor composition is changed by 5% or more.
  17. 제 14 항에 있어서, 가열하는 단계는 62 내지 100℃의 범위 내로 가열하는 폴리이미드 전구체 조성물 제조 방법.The method of claim 14, wherein the heating step is heated to within the range of 62 to 100°C.
  18. 제 14 항에 있어서, 가열하는 단계는 30분 내지 5시간 동안 진행하는 폴리이미드 전구체 조성물 제조 방법.The method of claim 14, wherein the heating step is performed for 30 minutes to 5 hours.
  19. 제 1 항의 폴리이미드 전구체 조성물의 경화물인 폴리이미드.A polyimide which is a cured product of the polyimide precursor composition of claim 1.
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Citations (5)

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Publication number Priority date Publication date Assignee Title
JP2004285355A (en) * 2003-03-05 2004-10-14 Kaneka Corp Method for manufacturing polyimide resin powder
JP2007056196A (en) * 2005-08-26 2007-03-08 Tokyo Institute Of Technology Polyimide precursor composition, method for producing polyimide film and semiconductor device
KR20100102058A (en) * 2009-03-10 2010-09-20 주식회사 엘지화학 Polyimide-based polymer and copolymer thereof, and positive type photoresist composition comprising the same
KR20190003328A (en) * 2017-06-30 2019-01-09 에스케이씨코오롱피아이 주식회사 Polyimide precursor composition, preparation method thereof and polyimide substrate prepared from the composition
KR101949316B1 (en) * 2018-02-19 2019-02-18 에스케이씨코오롱피아이 주식회사 Polyamic Acid Composition with Improved Storage Stability, Method for Preparing Polyimide Film by Using the Same and Polyimide Film Prepared by the Same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004285355A (en) * 2003-03-05 2004-10-14 Kaneka Corp Method for manufacturing polyimide resin powder
JP2007056196A (en) * 2005-08-26 2007-03-08 Tokyo Institute Of Technology Polyimide precursor composition, method for producing polyimide film and semiconductor device
KR20100102058A (en) * 2009-03-10 2010-09-20 주식회사 엘지화학 Polyimide-based polymer and copolymer thereof, and positive type photoresist composition comprising the same
KR20190003328A (en) * 2017-06-30 2019-01-09 에스케이씨코오롱피아이 주식회사 Polyimide precursor composition, preparation method thereof and polyimide substrate prepared from the composition
KR101949316B1 (en) * 2018-02-19 2019-02-18 에스케이씨코오롱피아이 주식회사 Polyamic Acid Composition with Improved Storage Stability, Method for Preparing Polyimide Film by Using the Same and Polyimide Film Prepared by the Same

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