WO2020226086A1 - Plasma generating device - Google Patents

Plasma generating device Download PDF

Info

Publication number
WO2020226086A1
WO2020226086A1 PCT/JP2020/017916 JP2020017916W WO2020226086A1 WO 2020226086 A1 WO2020226086 A1 WO 2020226086A1 JP 2020017916 W JP2020017916 W JP 2020017916W WO 2020226086 A1 WO2020226086 A1 WO 2020226086A1
Authority
WO
WIPO (PCT)
Prior art keywords
discharge electrode
plasma
plasma gas
main
electrode
Prior art date
Application number
PCT/JP2020/017916
Other languages
French (fr)
Japanese (ja)
Inventor
尚寿 河村
雅章 永津
Original Assignee
株式会社クメタ製作所
国立大学法人静岡大学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社クメタ製作所, 国立大学法人静岡大学 filed Critical 株式会社クメタ製作所
Priority to JP2020541606A priority Critical patent/JP6782952B1/en
Publication of WO2020226086A1 publication Critical patent/WO2020226086A1/en

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/3065—Plasma etching; Reactive-ion etching

Definitions

  • the present invention relates to a plasma generator capable of generating even under atmospheric pressure.
  • Patent Document 1 a plasma generator for manufacturing a flat panel display or a solar cell in which side electrodes covered with a dielectric are arranged on both sides of a main electrode covered with a dielectric through a preliminary discharge region. Is disclosed.
  • the shape includes the width of the gap in the pre-discharge region.
  • it is difficult to form a wide plasma processing space because a sufficient gap of the preliminary discharge region may not be supplied to the plasma processing space. ..
  • the present invention has been made to deal with the above problems, and an object of the present invention is to provide a plasma generator capable of expanding the degree of freedom in designing a preliminary discharge region and expanding the processing space by plasma.
  • the features of the present invention include a pre-discharge electrode in which a long conductor is covered with a dielectric, and a common discharge electrode arranged adjacent to the pre-discharge electrode and extending along the pre-discharge electrode.
  • a pre-discharge power supply for applying an AC voltage between the pre-discharge electrode and the common discharge electrode to generate pre-plasma, and a common discharge electrode and pre-discharge at a position farther from the pre-discharge electrode with respect to the common discharge electrode.
  • It consists of a main discharge electrode that extends so as to face each of the electrodes, and a dielectric that is arranged between the main discharge electrode and the pre-discharge electrode and the common discharge electrode and extends along the pre-discharge electrode, the common discharge electrode, and the main discharge electrode. It is provided with a main discharge dielectric and a main discharge power source for applying an AC voltage between the main discharge electrode and the common discharge electrode to generate main plasma, and the common discharge electrode is located adjacent to the preliminary discharge electrode. Is provided with a plasma gas output port for outputting plasma gas along the extending direction of the preliminary discharge electrode.
  • the plasma gas output port for outputting the plasma gas is formed in the common discharge electrode adjacent to the preliminary discharge electrode along the preliminary discharge electrode. It is possible to increase the degree of freedom in designing the region where the preliminary plasma is generated between the preliminary discharge electrode and the common discharge electrode. This means that the region where the preliminary plasma is generated can be set between the preliminary discharge electrode and the common discharge electrode by paying attention only to the ease of generating the preliminary plasma, and the preliminary plasma is effectively generated. It means that it can be made to. Further, in the plasma generator according to the present invention, the flow rate of plasma gas can be freely set even if the width of the region where the preliminary plasma is generated between the preliminary discharge electrode and the common discharge electrode is narrowed. It is also possible to expand the processing space by.
  • Another feature of the present invention is that in the plasma generator, plasma gas output ports are formed on both sides of the preliminary discharge electrode.
  • the plasma generation device forms a wider and more uniform plasma gas atmosphere because the plasma gas output ports are formed on both sides of the preliminary discharge electrode. It is possible to effectively expand the processing space by the main plasma.
  • the plasma gas output port is composed of a plurality of holes formed along the extending direction of the preliminary discharge electrode.
  • the plasma gas output port is composed of a plurality of holes formed along the extending direction of the preliminary discharge electrode, the common discharge electrode It is easy to secure the rigidity of the gas, and it is possible to prevent foreign matter from entering the plasma gas output port.
  • plasma gas output ports are formed on both sides of the preliminary discharge electrode, and also constitutes a plasma gas output port on one of the two sides. Each hole is formed at a position deviated from each hole constituting the plasma gas output port on the other side.
  • plasma gas output ports are formed on both sides of the preliminary discharge electrode, and the plasma gas output port on one side of these both sides is formed. Since each hole constituting the above and each hole constituting the plasma gas output port on the other side are formed at positions shifted from each other, unevenness of the output plasma gas is suppressed and a uniform main plasma is generated. be able to.
  • the plasma generator further includes a plasma gas jacket that temporarily stores the plasma gas supplied to the plasma gas output port while facing the plasma gas output port. It is in.
  • the plasma generator has a plasma gas jacket that temporarily stores the plasma gas supplied to the plasma gas output port while facing the plasma gas output port. Since it is provided, it is possible to output plasma gas evenly within one hole constituting the plasma gas output port or between a plurality of holes.
  • the plasma gas jacket further has a porous body having a large number of through holes, and the plasma gas is transmitted through the porous body to the plasma gas output port.
  • the plasma gas jacket has a porous body having a large number of through holes, and the plasma gas is output through the porous body. Since it is guided to the mouth, it is possible to output the plasma gas evenly in one hole or between a plurality of holes constituting the plasma gas output port.
  • the porous body can be composed of a punching plate having a large number of through holes formed in the plate-like body, or a porous body such as a sponge having innumerable cavities or an aggregate of fibers.
  • the plasma generator further includes a cooler provided adjacent to the plasma gas jacket to cool the plasma gas in the plasma gas jacket.
  • the plasma generator is provided adjacent to the plasma gas jacket and includes a cooler for cooling the plasma gas in the plasma gas jacket.
  • the preliminary discharge electrode, the common discharge electrode, and the main discharge electrode can be cooled via the gas, and the heating of the object to be processed can be prevented.
  • the main discharge electrode includes a second plasma gas output port that outputs plasma gas toward the main discharge dielectric.
  • the main discharge electrode includes a second plasma gas output port for outputting plasma gas toward the main discharge dielectric.
  • Plasma gas can be supplied to the main discharge electrode side with respect to the main discharge dielectric, and the main plasma can be generated and maintained at an early stage and in a wide range.
  • FIG. 5 is a plan view schematically showing an external configuration of a common discharge electrode provided with a preliminary discharge electrode in the plasma generator shown in FIG. 1. It is a bottom view which shows typically the appearance structure of the common electrode in the plasma generation apparatus shown in FIG. It is a bottom view which shows typically the appearance structure of the jacket cover body in the plasma generation apparatus shown in FIG. It is a front view schematically showing the state which generated the preliminary plasma by applying an AC voltage between the preliminary discharge electrode and the common discharge electrode in the plasma generation apparatus shown in FIG.
  • FIG. Is A front view schematically showing a state in which an AC voltage is applied between a preliminary discharge electrode and a common discharge electrode and between a main discharge electrode and a common discharge electrode to generate a main plasma in the plasma generator shown in FIG. Is. It is a top view which schematically showed the appearance structure of the common discharge electrode provided with the preliminary discharge electrode in the plasma generation apparatus which concerns on the modification of this invention. It is a side sectional view schematically showing the outline of the structure of the plasma generation apparatus which concerns on the modification of this invention.
  • FIG. 1 is a side sectional view schematically showing an outline of the configuration of the plasma generator 100 according to the present invention.
  • FIG. 2 is a front sectional view schematically showing an outline of the configuration of the plasma generation device 100 shown in FIG.
  • FIG. 3 is a plan view schematically showing the external configuration of the common discharge electrode 104 provided with the preliminary discharge electrode 101 in the plasma generation device 100 shown in FIG. 1.
  • the plasma generator 100 is a mechanical device that generates plasma in an environment open to the atmosphere of a standard atmospheric pressure and irradiates the WK to be treated made of food to sterilize it.
  • the plasma generator 100 includes four pre-discharge electrodes 101.
  • Each priming discharge electrode 101 is a part for generating the pre-plasma P P, it is formed in a rod shape extending in the respective long.
  • Each of these pre-discharge electrodes 101 is mainly configured to include a conductor 102 and a pre-discharge dielectric 103, respectively.
  • the conductor 102 is an electrode that forms a pair with the common discharge electrode 104 described later, and is formed by extending a conductive material in a long length.
  • the conductor 102 is composed of a copper wire having a diameter of 1.8 mm and a length of 250 mm.
  • the conductor 102 may be any material as long as it has conductivity, and may be made of a material other than copper, such as silver, gold, titanium, or aluminum.
  • the conductor 102 is electrically connected to the preliminary discharge power supply 150, which will be described later, and is grounded via the ground 151.
  • the preliminary discharge dielectric 103 is a component that covers the conductor 102 and electrically insulates the conductor 102 from the common discharge electrode 104, and is composed of a non-conductor having a size that covers the conductor 102. There is.
  • the preliminary discharge dielectric 103 is composed of a transparent quartz tube formed by forming a quartz material into a bottomed cylindrical shape having a diameter of 4 mm, an inner diameter of 2 mm and a length of 230 mm.
  • the preliminary discharge dielectric 103 may be any non-conductor that covers the conductor 102, and may be made of, for example, translucent or opaque glass, a ceramic material other than glass, a resin material, or a rubber material.
  • the size of the priming discharge electrode 101 made of a conductor 102 and a pre-discharge dielectric 103 which is designed appropriately in accordance with the need to generate a preliminary plasma P P, limited to the present embodiment Of course not.
  • the preliminary discharge dielectric 103 is supported by a common discharge electrode 104 by accommodating a portion other than the same end portion in a state where the end portion of the conductor 102 connected to the preliminary discharge power supply 150 is exposed.
  • Common discharge electrode 104 is a part for generating a main plasma P M constituting the main discharge electrodes 120 and the pair together to generate a pre-plasma P P constitutes a preliminary discharge electrodes 101 and the pair, electrically conductive It is formed by extending the material to be held in a long length. More specifically, the common discharge electrode 104 is formed of a plate-like body that extends long along the preliminary discharge electrode 101 and faces the main discharge electrode 120. In the present embodiment, the common discharge electrode 104 is formed by forming an aluminum material into a plate-like body having a length of 200 mm, a width of 60 mm, and a thickness of 15 mm. The common discharge electrode 104 may be made of a material having conductivity, and may be made of a material other than an aluminum material such as silver, gold, titanium, or copper.
  • an electrode accommodating portion 105 is formed on a main electrode facing surface 104a facing the main discharge electrode 120, and a plasma gas output port 106 is formed along the electrode accommodating portion 105. Further, the common discharge electrode 104 is formed with a plasma gas jacket 110 on the main electrode facing surface 104a and the back side of the electrode accommodating portion 105.
  • the main electrodes facing surface 104a is a portion for generating a main plasma P M facing the main discharge electrodes 120, it is formed on the main discharge electrodes 120 and the parallel plane.
  • the main electrode facing surface 104a is formed in a curved shape in which each end portion in the longitudinal direction of the common discharge electrode 104 and the width direction orthogonal to the longitudinal direction and the edge portion through which the electrode accommodating portion 105 opens are rounded. This prevents local discharge from occurring.
  • the electrode accommodating portion 105 is a portion accommodating each of the four pre-discharge electrodes 101, and is formed in a groove shape extending in a concave shape along each pre-discharge electrode 101. More specifically, the electrode accommodating portion 105 is formed in a groove shape having a depth that covers the other portion of the preliminary discharge electrode 101 with the outer surface on the main discharge electrode 120 side exposed. In this case, the electrode accommodating portion 105 is formed in a shape accommodating the preliminary discharge electrodes 101 with respect to both side surfaces with a slight gap. In the present embodiment, the electrode accommodating portion 105 is formed in a state of having a depth of 3 mm and a width of 4.1 mm and penetrating along the longitudinal direction of the main discharge electrode 120.
  • each electrode accommodating portion 105 is formed in the width direction orthogonal to the longitudinal direction of the common discharge electrode 104.
  • the four electrode accommodating portion 105 is formed to extend equidistantly in and parallel to each other in the width direction of the common discharge electrode 104 as main plasma P M is uniformly generated.
  • four pre-discharge electrodes 101 are accommodated and supported in a state of being fixed by the ceramic adhesive 105a.
  • Plasma gas output port 106 a portion for ejecting the plasma gas for pre-plasma P P a preliminary plasma P P which is generated together is likely to occur leading to the main discharge electrodes 120 side main plasma P M generated and maintained
  • One end (lower end in the drawing) communicates with the plasma gas jacket 110, and the other end (upper end in the drawing) is formed by a through hole that opens into the main electrode facing surface 104a.
  • the plasma gas output port 106 is configured such that a plurality of through holes are arranged at equal intervals along the longitudinal direction in which the preliminary discharge electrode 101 extends at a position adjacent to the preliminary discharge electrode 101 housed in the electrode accommodating portion 105. Has been done.
  • the plasma gas output ports 106 are formed side by side in a row on both sides of the pre-discharge electrode 101 so as to sandwich the pre-discharge electrode 101.
  • both sides of the preliminary discharge electrode 101 are width directions orthogonal to the longitudinal direction in which the preliminary discharge electrode 101 extends on the main electrode facing surface 104a.
  • the length of the preliminary discharge electrode 101 is such that the single row of through holes constituting the two plasma gas output ports 106 adjacent to each other in the width direction of the main electrode facing surface 104a are not adjacent to each other in the width direction. They are arranged so that they are offset in the direction.
  • the plasma gas output port 106 is formed in a cylindrical shape having a diameter of 1 mm, but it is natural that the diameter, pitch, shape, and number are appropriately set according to the specifications of the plasma generator 100. Is. In addition, in FIGS. 1 to 4, the size of the plasma gas output port 106 is exaggerated.
  • a gas having an ionization voltage lower than that of air such as nitrogen, argon and helium is used alone or in a mixture thereof, and a gas such as water vapor or ammonia is added thereto.
  • This plasma gas is supplied from a plasma gas supply facility (not shown) including a pump or a tank to the plasma gas output port 106 via the plasma gas jacket 110.
  • the plasma gas jacket 110 is a portion for temporarily storing the plasma gas injected from the plasma gas output port 106, and is a hollow portion in which the back surface side of the common discharge electrode 104 is recessed. It is composed of.
  • the plasma gas jacket 110 is formed in a substantially rectangular shape when viewed from the back surface side of the common discharge electrode 104.
  • a porous body 111, 112 and a spacer 113 are provided in the plasma gas jacket 110, respectively.
  • the common discharge electrode 104 is electrically connected to the pre-discharge power supply 150 via the jacket cover 114 and is electrically connected to the main discharge power supply 152 via the pre-discharge power supply 150 for main discharge. It is supported by the electrode support 130 at a position with respect to the electrode 120 via a predetermined distance.
  • the porous bodies 111 and 112 are parts for buffering the flow of plasma gas introduced into the plasma gas jacket 110 from the above-mentioned plasma gas supply facility, and are made of metal, resin, or ceramic, respectively. It is configured. These porous bodies 111 and 112 are so-called punching plates in which a large number of through holes 111a and 112a are formed on the entire plate surface.
  • the through hole 111a of the porous body 111 and the through hole 112a of the porous body 112 are the through hole 111a and the through hole 112a when the porous body 111 and the porous body 112 are arranged to face each other in the vertical direction shown in the drawing. They are formed so that they do not overlap each other.
  • These porous bodies 111 and 112 are arranged in the plasma gas jacket 110 so that their plate surfaces are overlapped with each other so as to face each other with a gap.
  • the spacer 113 prevents the porous bodies 111 and 112 from being in close contact with each other and overlapping each other, and also prevents the plate surfaces of the porous bodies 111 and 112 from being in close contact with the plasma gas jacket 110 and the jacket covering body 114, respectively. It is a component for forming a gap between each.
  • the spacer 113 is formed by forming a metal material, a resin material, or a ceramic material into a flat plate ring shape.
  • the spacer 113 is provided between the ceiling portion of the plasma gas jacket 110 and the porous body 111, between the porous body 111 and the porous body 112, and between the porous body 112 and the illustrated upper surface of the jacket covering body 114. It is arranged in each.
  • the plasma gas jacket 110 is shown by a broken line, but the porous bodies 111 and 112 and the spacer 113 are not shown.
  • the jacket covering body 114 covers the opening of the plasma gas jacket 110 that opens downward in the drawing to seal the inside of the plasma gas jacket 110 and guide the plasma gas into the plasma gas jacket 110.
  • a conductive metal material is formed in a rectangular plate shape having the same size as the common discharge electrode 104 in a plan view.
  • the jacket covering 114 is made of a conductive metal material, but when the common discharge electrode 104 is directly electrically connected to the preliminary discharge power supply 150, it is not necessarily made of a conductive material. It is not necessary to use a resin material or a ceramic material.
  • the jacket cover 114 is formed with an introduction path 115, a cooler mounting portion 116, a first mounting hole 117a, and a second mounting hole 117b, respectively.
  • the introduction path 115 is a flow path for guiding the plasma gas supplied from the plasma gas supply facility to the plasma gas jacket 110, and is composed of a through hole penetrating in the thickness direction of the jacket covering body 114.
  • the introduction paths 115 are formed so as to be substantially evenly arranged at a plurality of positions (six in the present embodiment) facing the plasma gas jacket 110.
  • Each introduction path 115 is connected to the plasma gas supply facility via a pipe (not shown).
  • the plasma gas jacket 110 is shown by a chain double-dashed line.
  • the cooler mounting portion 116 is a portion for mounting the cooler 118, and is formed by being recessed in the lower surface of the jacket covering 114 as shown. In this case, the cooler mounting portion 116 is formed at a portion facing the plasma gas jacket 110 and at a position adjacent to the introduction path 115. In this embodiment, two cooler mounting portions 116 are formed corresponding to the two coolers 118.
  • the first mounting holes 117a are through holes through which bolts (not shown) for mounting the jacket covering body 114 to the common discharge electrode 104 penetrate, and are formed in six in the present embodiment.
  • the second mounting holes 117b are bottomed holes through which bolts (not shown) for mounting the jacket covering body 114 to the electrode support 130 are screw-fitted, and are four in the present embodiment. It is formed.
  • the cooler 118 is a device for cooling plasma gas, and is configured by embedding a pipe 118a through which a coolant flows in a metal plate-like body such as copper having high thermal conductivity.
  • the cooler 118 is mounted in a state of being fitted in each of the two cooler mounting portions 116 formed on the lower surface of the jacket cover 114 in the drawing.
  • the pipes 118a of each other are connected in series via a hose (not shown), and a coolant made of water or the like is supplied by a coolant supply facility including a pump (not shown) or the like.
  • the main discharge electrodes 120 is a part for generating a main plasma P M constitute a common discharge electrode 104 and the pair, a conductive material is formed by extending the long. More specifically, the main discharge electrode 120 is composed of a plate-like body having a common electrode facing surface 120a facing the main electrode facing surface 104a of the common discharge electrode 104 via a main discharge dielectric 140. , It is arranged at a position farther from the preliminary discharge electrode 101 with respect to the common discharge electrode 104. In the present embodiment, the main discharge electrode 120 is formed by forming an aluminum material into a plate-like body having a length of 200 mm, a width of 60 mm and a thickness of 15 mm. The main discharge electrode 120 is electrically connected to the main discharge power supply 152 in a state of being supported by the electrode support 130 at a position with respect to the common discharge electrode 104 via a predetermined distance.
  • Common electrode opposing surface 120a is a portion for generating a main plasma P M facing the common discharge electrode 104 are formed on the main electrode opposing surface 104a parallel to the plane.
  • the common electrode facing surface 120a is formed so that each end of the main discharge electrode 120 in the longitudinal direction and the width direction orthogonal to the longitudinal direction is formed into a rounded curved surface shape to generate local discharge. Is being prevented.
  • the main discharge electrode 120 may be made of a material having conductivity, and may be made of a material other than an aluminum material such as silver, gold, titanium or copper.
  • the electrode support 130 is a component that holds the common discharge electrode 104 and the main discharge electrode 120 at positions separated from each other via a predetermined distance, and the common discharge electrode 104 and the main discharge electrode 120 are separated from articles other than these. It is composed of non-conductors that are electrically insulated. In the present embodiment, the electrode support 130 is made of a fluororesin material.
  • the electrode support 130 is mainly composed of a common electrode support 131, a main electrode support 132, and a support column 133, respectively.
  • the common electrode support 131 is a component that supports the common discharge electrode 104 via the jacket cover 114 from below in the drawing, and is composed of a square plate having a larger area than the jacket cover 114 in a plan view. .. In this case, the common electrode support 131 is formed with a through hole 131a through which a plasma gas pipe (not shown) connected to each introduction path 115 of the jacket covering body 114 penetrates.
  • the common electrode support 131 fixedly supports the jacket covering 114 from below in the drawing by screw-fitting a bolt (not shown) into the second mounting hole 117b.
  • the main electrode support 132 is a component that supports the main discharge electrode 120 in a state of facing the common discharge electrode 104 from above in the drawing, and is composed of a square plate having a larger area than the main discharge electrode 120 in a plan view. ing.
  • the main electrode support 132 fixedly supports the main discharge electrode 120 from above in the drawing via bolts (not shown).
  • the support column 133 supports the main electrode support 132 in a state of facing the common electrode support 131 via a predetermined distance, so that the main discharge electrode 120 is passed through a predetermined gap with respect to the common discharge electrode 104. It is a component for arranging facing the position, and is formed in a round bar shape.
  • the columns 133 are fixedly connected to the common electrode support 131 and the main electrode support 132 via bolts (not shown) provided at the four corners of the common electrode support 131 and the main electrode support 132, respectively.
  • FIG. 1, FIG. 2, FIG. 6 and FIG. 7, the central portion of the support column 133 is not shown.
  • the support column 133 is formed to have a length such that the common electrode facing surface 120a of the main discharge electrode 120 is opposed to the main electrode facing surface 104a of the common discharge electrode 104 at a position separated by 10 mm. ..
  • the electrode support 130 is limited to the present embodiment as long as the common discharge electrode 104 and the main discharge electrode 120 can be supported at positions via a predetermined distance in a state of being electrically insulated from each other. Of course not. Further, in FIGS. 1 to 3, 6 and 7, the electrode support 130 is shown by a chain double-dashed line.
  • the main discharge dielectric 140 is a component for electrically insulating the preliminary discharge electrode 101 and the common discharge electrode 104 and the main discharge electrode 120 and supporting the WK to be processed, and faces the main electrode. It is composed of a non-conductor having a size that covers both the surface 104a and the common electrode facing surface 120a. More specifically, the main discharge dielectric 140 is made of an annular sheet material made of fluororesin having a length longer than the length of the main electrode facing surface 104a and the common electrode facing surface 120a in each longitudinal direction and each width direction. It is formed in the shape of an endless belt. In the present embodiment, the main discharge dielectric 140 uses a fluororesin sheet having a thickness of 1 mm.
  • the main discharge dielectric 140 is erected between a drive roller and a driven roller (not shown) in a horizontally stretched state, and is fed in an endless track shape by rotational drive of the drive roller. That is, the main discharge dielectric 140 constitutes a transport belt in the belt conveyor.
  • the main discharge dielectric 140 in the present embodiment may be made of a non-conductor that flexibly bends along the circumferential direction of the endless belt, and is a resin material other than the fluororesin material (for example, a polyamide resin material). ) May be a sheet material.
  • the preliminary discharge power supply 150 is an electric device for applying an AC voltage to the preliminary discharge electrode 101 and the common discharge electrode 104.
  • the preliminary discharge power supply 150 receives power from a general household power supply (100V) and has a voltage in the range of ⁇ 1 kV to ⁇ 20 kV and a frequency with respect to the preliminary discharge electrode 101 and the common discharge electrode 104.
  • An AC voltage of a desired voltage and frequency can be applied in the range of 100 Hz to 30 kHz.
  • the preliminary discharge power supply 150 includes a phase shifter (not shown) that changes the phase of the output voltage.
  • the preliminary discharge power supply 150 may continuously or intermittently output any AC voltage of a square wave, a sine wave, a trapezoidal wave, and a triangular wave.
  • the ground 151 is an electric circuit that applies an AC voltage between the preliminary discharge electrode 101 and the common discharge electrode 104, and an electric circuit that applies an AC voltage between the main discharge electrode 120 and the common discharge electrode 104. This is an electric circuit for grounding each of the main discharge electric circuits.
  • the pre-discharge electrode 101 is electrically connected to the pre-discharge power supply 150 and the main discharge power supply 152, respectively.
  • the ground 151 may be provided on the common discharge electrode 104 electrically connected to the preliminary discharge power supply 150 and the main discharge power supply 152, respectively (see FIG. 5). Further, the ground 151 may be provided in common for the pre-discharge electric circuit and the main discharge electric circuit, or may be provided separately for the pre-discharge electric circuit and the main discharge electric circuit. Further, the earth 151 may be omitted.
  • the main discharge power supply 152 is an electric device for applying an AC voltage to the main discharge electrode 120 and the common discharge electrode 104.
  • the main discharge power supply 152 receives power from a general household power supply (100 V) and has a voltage in the range of ⁇ 1 kV to ⁇ 20 kV and a frequency with respect to the main discharge electrode 120 and the common discharge electrode 104.
  • An AC voltage of a desired voltage and frequency can be applied in the range of 100 Hz to 30 kHz.
  • the main discharge power supply 152 includes a phase shifter (not shown) that changes the phase of the output voltage.
  • main discharge power supply 152 may continuously or intermittently output any AC voltage of a square wave, a sine wave, a trapezoidal wave, and a triangular wave, but has the same waveform as the preliminary discharge power supply 150. Is preferably output in opposite phase.
  • the output voltage and frequency of these preliminary discharge power supply 150 and a main discharge power supply 152 be one that is appropriately set in accordance generated preliminary plasma P P and the main plasma P M is limited to the present embodiment It is natural that it is not.
  • the plasma generator 100 is provided by directly placing or mounting it on an indoor or outdoor workbench for irradiating the object WK with plasma, and also for irradiating the object WK with plasma. It is provided by being incorporated into a part of a processing device or a transport device for a WK to be processed.
  • the plasma generator 100 is incorporated into a production processing line for powdery or granular foods such as beans, wheat, sesame, pepper or tea leaves (including tencha and matcha), and these are incorporated into a processed product WK.
  • a production processing line for powdery or granular foods such as beans, wheat, sesame, pepper or tea leaves (including tencha and matcha)
  • these are incorporated into a processed product WK.
  • sterilization and disinfection treatment will be described.
  • the plasma generator 100 is installed in a state of being directly exposed to the atmosphere of standard atmospheric pressure.
  • a plasma generating apparatus 100 worker performing plasma irradiation to the object to be processed WK first, to generate a pre-plasma P P between the priming discharge electrode 101 in the plasma generating apparatus 100 and the common discharge electrode 104.
  • the operator operates the preliminary discharge power supply 150 in the plasma generation device 100 to apply an AC voltage between the preliminary discharge electrode 101 and the common discharge electrode 104.
  • the operator and outputs a voltage and an AC voltage of a frequency for generating the pre-plasma P P needed to generate the main plasma P M by operating the pre-discharge power supply 150.
  • the preliminary discharge power supply 150 outputs an AC voltage having a voltage of ⁇ 5 kV, a current of 20 mA, and a frequency of 10 kHz.
  • the AC voltage and frequency pre-discharge power supply 150 is outputted can be determined experimentally in advance in accordance with the main generating plasma P M.
  • a part of the atmosphere existing between the two is ionized and activated to activate the preliminary plasma PP. Occurs.
  • pre-plasma P P is generated four linear along each of the four priming discharge electrode 101. That is, pre-plasma P P is generated by dielectric barrier discharge in atmospheric pressure.
  • FIG. 6 shows a preliminary plasma P P thin hatching.
  • the operator in generating the pre-plasma P P can be output a plasma gas from the plasma gas output port 106.
  • the operator operates a plasma gas supply facility (not shown) to start supplying plasma gas to the plasma gas jacket 110.
  • the plasma gas introduced into the plasma gas jacket 110 passes through the two porous bodies 111 and 112 while meandering and reaches the plasma gas output port 106, and then faces the main electrode by the plasma gas output port 106. It is injected onto the surface 104a.
  • a part of the plasma gas injected from the plasma gas output port 106 is directly guided to the preliminary discharge electrode 101 side or indirectly via the main discharge dielectric 140 or the like.
  • the operator can cool the plasma gas. Specifically, the operator operates a cooling water supply facility (not shown) to start supplying cooling water to each of the two coolers 118. As a result, the plasma gas in the plasma gas jacket 110 is cooled by the cooler 118 and ejected from the plasma gas output port 106 onto the main electrode facing surface 104a. In this case, the plasma gas supplied into the plasma gas jacket 110 is effectively cooled because the flow is hindered by the porous body 112 and the porous body 111. As a result, the plasma gas prevents the preliminary discharge electrode 101 and the common discharge electrode 104 from being heated.
  • the operator generates a primary plasma P M between the main discharge electrodes 120 and the common discharge electrode 104.
  • the operator operates the main discharge power supply 152 in the plasma generator 100 to apply an AC voltage between the main discharge electrode 120 and the common discharge electrode 104.
  • the operator outputs an AC voltage of the voltage and frequency required for generating a main plasma P M by operating the main discharge power supply 152.
  • the main discharge power supply 152 outputs an AC voltage having a voltage of ⁇ 9 kV, a current of 20 mA, and a frequency of 10 kHz and having a phase opposite to the output voltage of the preliminary discharge power supply 150.
  • the AC voltage and frequency output by the main discharge power supply 152 can be experimentally obtained in advance according to the plasma processing content required for the object to be processed WK.
  • electrons or activity is part of the atmosphere that exists between them generated by the preliminary plasma P P It is activated with ionizing species triggers the main plasma P M is generated.
  • the plasma generating apparatus 100 may be uniform discharge between the main discharge electrodes 120 and the common discharge electrode 104 to form a primary plasma P M which rises in column spreads in a planar shape.
  • the region in this case, the operator, the plasma gas supply equipment by operating the (not shown) to increase the supply amount of the plasma gas by promoting the formation of the main plasma P M is the main plasma P M is generated Can be expanded.
  • the flow of plasma gas is indicated by a broken line arrow.
  • the plasma gas cooled by the cooler 118 is supplied on the main electrode facing surface 104a.
  • the plasma gas prevents heating of the object WK to be processed on the main discharge electrode 120 and the main discharge dielectric 140 in addition to the preliminary discharge electrode 101 and the common discharge electrode 104.
  • the operator operates a cooling water supply facility (not shown) to increase the amount of cooling water supplied to the cooler 118, thereby increasing the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120. the main plasma P M to improve the cooling capacity for it can be widened areas created.
  • FIG. 7 shows the main plasma P M dark hatching than preliminary plasma P P. Moreover, the main plasma P M to uniform discharge between the main discharge electrodes 120 and the common discharge electrode 104 rises to columnar spread in planar a level of at least a person can be confirmed uniform visually.
  • the operator rotationally drives the main discharge dielectric 140. Specifically, the operator rotates and drives the main discharge dielectric 140 by operating a control device of a belt conveyor (not shown) (see the broken line arrow in FIG. 7).
  • the operator performs a plasma irradiation process on the object to be processed WK.
  • the operator covers the main discharge dielectric 140 by initiating the operation of a supply device (not shown) that continuously supplies the object WK to be processed on the main discharge dielectric 140.
  • the processed product WK is continuously supplied.
  • the main discharge treatment object placed on the dielectric 140 WK is plasma irradiation by passing through a main plasma P M in which is formed between the main discharge electrodes 120 and the common discharge electrode 104 Is sterilized.
  • the main plasma P M treatment object WK irradiated is is recovered by the recovery device of the object WK not shown. Even in this case, the object WK to be processed on the main discharge dielectric 140 is prevented from being heated by the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120 by the plasma gas output from the plasma gas output port 106.
  • the present inventors have made experiments of irradiating a primary plasma P M beans using the plasma generating device 100 with respect to the treatment object WK adhered with E. coli, the mounting of the main discharge dielectric 140 It was confirmed that a uniform bactericidal effect was exhibited regardless of the location.
  • the present inventors used a plasma generator 100 for a biological indicator in which a strip made of cellulose fibers was impregnated with spore-forming bacteria (for example, Geobacillus Stearothermophilus) and wrapped in glassine paper. It was confirmed that this spore-forming bacterium could be killed by irradiating with plasma in the range of about 30 seconds to about 120 seconds.
  • the operator stops the operation of the preliminary discharge power supply 150 and the main discharge power supply 152, and stops the operation of the preliminary discharge power supply 150, the common discharge electrode 104, and the main discharge.
  • the application of the AC voltage to the electrode 120 is stopped.
  • the plasma generator 100, a preliminary plasma P P and the main plasma P M is extinguished, it is possible to terminate the plasma irradiation treatment to the object to be processed WK.
  • the plasma generator 100 can be terminated plasma irradiation treatment by stopping the operation of the main discharge power supply 152 by extinguishing the main plasma P M to the object to be processed WK, preliminary discharge power supply it can be terminated plasma irradiation treatment also be stopped by eliminating the main plasma P M to the object to be processed WK operation of 150. That is, the operator can terminate the plasma irradiation treatment to the object to be processed WK by one of the working is extinguished the main plasma P M by stopping of the preliminary discharge power supply 150 and a main discharge power supply 152. In this case, the operator stops the operation of one of the preliminary discharge power supply 150 and the main discharge power supply 152, and then stops the operation of the other.
  • the operator can extinguish a preliminary plasma P P and the main plasma P M also by stopping the supply of the plasma gas by operating a plasma gas supply installation (not shown). For this, the operator, together with the disappearance of the pre-plasma P P and the main plasma P M, the supply of the workpiece WK into the main discharge dielectric 140, the rotary drive and the cooler 118 of the main discharge dielectric 140 The supply of cooling water is also stopped.
  • the plasma gas output port 106 for outputting the plasma gas is connected to the common discharge electrode 104 adjacent to the preliminary discharge electrode 101. Since it is formed along the 101, the degree of freedom in designing the region where the preliminary plasma PP is generated between the preliminary discharge electrode 101 and the common discharge electrode 104 can be expanded.
  • This pre-plasma P P preliminary plasma P means that can set the region to produce a preliminary plasma P P between the priming discharge electrode 101 by focusing only on the occurrence ease the common discharge electrode 104 of the It means that P can be generated effectively.
  • the plasma generating apparatus 100 freely set the flow rate of even a plasma gas preliminary plasma P P and narrower the width of the area causing between the common discharge electrode 104 and the preliminary discharge electrode 101 it is also possible that spread the processing space by the can be the main plasma P M.
  • the implementation of the present invention is not limited to the above embodiment, and various changes can be made as long as the object of the present invention is not deviated.
  • the same components as those in the above-described embodiment in each of the referenced figures are designated by the same reference numerals or corresponding reference numerals, and some configurations are appropriately omitted for parts that are not directly related to the components. , Their description is also omitted.
  • the plasma gas output ports 106 are provided in a row on each side of the preliminary discharge electrode 101.
  • the plasma gas output port 106 may be provided adjacent to the preliminary discharge electrode 101. Therefore, the plasma gas output port 106 can be configured by providing one row or two or more rows on one side of the preliminary discharge electrode 101. Further, the plasma gas output ports 106 may be configured by providing two or more rows on each side of the preliminary discharge electrode 101.
  • the plasma gas output port 106 is pre-discharged so that the through holes constituting the plasma gas output port 106 adjacent to each other in the width direction of the common discharge electrode 104 are not adjacent to each other in the width direction.
  • the dielectric 103 is arranged so as to be offset in the longitudinal direction.
  • the plasma generator 100 it is possible to suppress the unevenness of the ejected plasma gas to produce a uniform preliminary plasma P P and the main plasma P M.
  • the plasma gas output port 106 may be arranged so that the through holes constituting the array of plasma gas output ports 106 adjacent to each other in the width direction of the common discharge electrode 104 are adjacent to each other in the width direction.
  • the plasma gas output port 106 is composed of a plurality of cylindrical through holes arranged in a row along the longitudinal direction of the preliminary discharge electrode 101.
  • the plasma generation device 100 can easily secure the rigidity of the common discharge electrode 104 and prevent foreign matter from entering the plasma gas output port 106.
  • the plasma gas output port 106 may also be composed of one or more elongated slits extending along the longitudinal direction of the preliminary discharge dielectric 103.
  • the plasma generator 100 is configured to have a plasma gas jacket 110 that temporarily stores the plasma gas supplied to the plasma gas output port 106.
  • the plasma generation device 100 can output uniform plasma gas in one hole or between a plurality of holes constituting the plasma gas output port 106.
  • the plasma generation device 100 may be configured by directly connecting the introduction path 115 or the plasma gas supply facility (not shown) to the plasma gas output port 106 and omitting the plasma gas jacket 110.
  • the plasma generation device 100 can be configured by omitting the jacket covering body 114.
  • the plasma generator 100 is configured to include the porous bodies 111 and 112 in the plasma gas jacket 110.
  • the plasma generation device 100 can output uniform plasma gas in one hole or between a plurality of holes constituting the plasma gas output port 106.
  • the plasma generation device 100 may be configured by omitting the porous bodies 111 and 112 in the plasma gas jacket 110.
  • the porous bodies 111 and 112 are composed of two punching plates.
  • the porous bodies 111, 112 can be composed of one or more punching plates.
  • the porous body when the porous body is composed of two or more, it is preferable to shift the positions so that the pores in each porous body do not overlap each other.
  • the porous body can also be composed of a porous body such as a sponge or an aggregate of fibers having innumerable cavities in the block body.
  • the plasma generator 100 is configured to include a water-cooled cooler 118.
  • the plasma generator 100 can cool the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120 via the plasma gas, and can also prevent the object WK to be heated.
  • the plasma generator 100 can also be configured to include a cooler 118 other than the water cooling system.
  • the plasma generator 100 may be configured to send cooling air to the cooler mounting portion 116 of the jacket covering body 114 by a fan (not shown), or may be configured to send cooling air to the cooler mounting portion 116, or instead of the cooler mounting portion 116, folds may be sent. It can also be configured by forming a shaped heat sink. Further, the plasma generator 100 may be configured by omitting the cooler 118.
  • the plasma generator 100 is configured by providing the plasma gas output port 106 only on the common discharge electrode 104.
  • the plasma generation device 100 can be configured by providing a second plasma gas output port 121 similar to the plasma gas output port 106 on the main discharge electrode 120 facing the common discharge electrode 104. ..
  • the second plasma gas output port 121 can be formed at a position facing the plasma gas output port 106 or at a position deviated from the plasma gas output port 106, and the common electrode facing surface of the main discharge electrode 120. It can also be formed by evenly arranging the front surface of the 120a.
  • the main discharge electrode 120 is provided with a second plasma gas jacket 122 similar to the plasma gas jacket 110, and a large number of through holes 123a, 124a are provided in the second plasma gas jacket 122 as well as the porous bodies 111 and 112.
  • the second porous bodies 123 and 124 having the above can be provided via the same spacer 125 as the spacer 113, respectively.
  • the main discharge electrode 120 is airtightly closed in the second plasma gas jacket 122 by the plate-shaped second jacket covering body 126 provided with the introduction path 127 communicating with the second plasma gas jacket 122. ing.
  • the plasma generator 100 configured in this way, the plasma gas supplied from the plasma gas supply facility (not shown) through the through hole 132a provided in the main electrode support 132 is supplied to the second plasma gas jacket 122 and the second plasma gas jacket 122. 2 The gas is injected toward the main discharge dielectric 140 via the plasma gas output port 121 (see the broken line arrow).
  • the plasma generator 100 can be generated and maintained in early and extensive range can be main plasma P M to supply plasma gas to the main discharge electrodes 120 side of the main discharge dielectric 140 it can. It goes without saying that the plasma generator 100 can be configured by omitting the second plasma gas jacket 122 and the second jacket cover 126, respectively.
  • the operator outputs an AC voltage having a voltage of ⁇ 5 kV and a frequency of 10 kHz to the preliminary discharge power supply 150, and an AC voltage having a voltage of ⁇ 9 kV and a frequency of 10 kHz to the main discharge power supply 152. Adjusted to output.
  • the specifications of the output of the pre-discharge power supply 150 and a main discharge power supply 152 is intended to be set appropriately according to the amount and intensity of the main plasma P M required for treatment object WK, the above-described embodiment It is not limited to. Therefore, the AC voltage output from the preliminary discharge power supply 150 is one of higher voltage, higher frequency, lower voltage, lower frequency, same voltage, and same frequency than the AC voltage output from the main discharge power supply 152. Can naturally occur.
  • the plasma generation device 100 can also include the preliminary discharge power supply 150 and the main discharge power supply 152 in one power supply facility.
  • the main discharge power supply 152 is connected to the common discharge electrode 104 via the preliminary discharge power supply 150.
  • the main discharge power supply 152 is not necessarily limited to the above embodiment as long as it is connected between the main discharge electrode 120 and the common discharge electrode 104 so that an AC voltage can be applied. Therefore, the main discharge power supply 152 can be directly connected to the common discharge electrode 104, for example, without using the preliminary discharge power supply 150.
  • the preliminary discharge power supply 150 is not necessarily limited to the above embodiment as long as it is connected between the preliminary discharge electrode 101 and the common discharge electrode 104 so that an AC voltage can be applied.
  • the plasma generator 100 is configured to include four preliminary discharge electrodes 101.
  • the plasma generating apparatus 100 can generate a main plasma P M of the longitudinal width direction perpendicular to the wider surface shaped preliminary discharge electrodes 101.
  • the arrangement interval of the preliminary discharge electrodes 101 is experimentally obtained in advance according to the applied voltage and the distance between the electrodes.
  • the plasma generator 100 can be configured to include at least one pre-discharge electrode 101, and is not necessarily limited to the above embodiment. Therefore, the plasma generator 100 can also be configured to include five or more pre-discharge electrodes 101.
  • spacing the main plasma P M is not formed in the wide surface between the arrangement interval of preliminary discharge electrodes 101 and the main discharge electrodes 120 and the common discharge electrode 104, i.e., the It can also be arranged at intervals of preliminary discharge electrodes 101 forming the main plasma P M linear or strip alone.
  • the preliminary discharge electrode 101 is configured by providing a slight gap through air between the outer peripheral surface of the conductor 102 and the inner peripheral surface of the preliminary discharge dielectric 103.
  • the pre-discharge electrode 101 is configured such that the outer peripheral surface of the conductor 102 and the inner peripheral surface of the pre-discharge dielectric 103 are in close contact with each other, or the space between the two is closed with a vacuum or a non-conductor (for example, ceramic adhesive). You can also do it. According to this, it is possible to prevent discharge from occurring in the space between the outer peripheral surface of the conductor 102 and the inner peripheral surface of the preliminary discharge dielectric 103.
  • the plasma generator 100 arranges the preliminary discharge electrode 101 in which the conductor 102 is arranged in the preliminary discharge dielectric 103 made of a glass tube in the electrode accommodating portion 105 formed in the common discharge electrode 104. And configured.
  • the preliminary discharge electrode 101 may be configured by covering a long conductor 102 with a dielectric material.
  • the preliminary discharge electrode 101 can be formed in a rod shape or a plate shape.
  • the common discharge electrode 104 may be formed adjacent to the preliminary discharge electrode 101 and extending along the preliminary discharge electrode 101.
  • the preliminary discharge electrode 101 is arranged in a state where the main discharge electrode 120 side is exposed in the electrode accommodating portion 105 formed in a groove shape on the main electrode facing surface 104a of the common discharge electrode 104.
  • the preliminary discharge electrode 101 can be easily fitted and attached to the open electrode accommodating portion 105, and the orientation can be accurately arranged.
  • the preliminary discharge electrode 101 is stably held by the groove itself of the electrode accommodating portion 105 and the adhesive applied in the groove, and the main discharge dielectric 140 existing around the preliminary discharge electrode 101 and the object to be treated. It is possible to prevent damage due to physical contact with an object WK or the like and scattering when the preliminary discharge electrode 101 is damaged.
  • priming discharge electrode 101 it is possible to maintain the pre-plasma P P which is generated along with it easier to generate a pre-plasma P P by being surrounded by a common discharge electrode 104 stably.
  • the electrode accommodating portion 105 is formed to have a depth that covers more than half, more preferably two-thirds or more in the radial direction of the preliminary discharge electrode 101, and the preliminary discharge electrode that faces the groove width orthogonal to the depth direction. It is preferable to form the groove width so as to accommodate both side surfaces of 101 with a slight gap. However, the electrode accommodating portion 105 is formed to have a depth that covers less than half of the pre-discharge electrode 101 in the radial direction, and the groove width is in contact with both side surfaces of the pre-discharge electrode 101, that is, the pre-discharge electrode 101. It does not exclude the formation of the same groove width as the outer diameter of.
  • the electrode accommodating portion 105 may be formed in a tubular shape completely covering the preliminary discharge electrode 101, for example, in a horizontal hole shape or a horizontal hole shape formed in a through hole shape or a blind hole shape on the side surface of the common discharge electrode 104. ..
  • the preliminary discharge electrodes 101 may be disposed so as to be able to generate a preliminary plasma P P between the common discharge electrode 104. Therefore, the preliminary discharge electrode 101 can be arranged directly on, for example, the flat main electrode facing surface 104a on which the electrode accommodating portion 105 is not formed.
  • the main discharge dielectric 140 is formed in an endless belt shape.
  • the main discharge dielectric 140 is arranged between the main discharge electrode 120 and the pre-discharge electrode 101 and the common discharge electrode 104, and extends along the pre-discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120. It suffices to be composed of the body. Therefore, as shown in FIG. 9, the main discharge dielectric 140 is simply a flat sheet or plate in which non-conductors such as a ceramic material including glass, a resin material, or a rubber material are not formed in an annular shape. Can be formed and constructed in. In this case, the main discharge dielectric 140 can be supported by the support column 133.
  • the main discharge dielectric 140 is configured to support the object to be processed WK. However, if the main discharge dielectric 140 is configured to support the object to be processed WK by another support member, it does not necessarily have to be configured to support the object to be processed WK.
  • the plasma generator 100 is configured to sterilize against treatment object WK consisting food by irradiating the primary plasma P M.
  • the plasma generator 100, non-food article to be treated WK e.g., medical instruments
  • may be configured to sterilized by irradiating a primary plasma P M with respect to other than sterilization ⁇ it may be irradiated with the main plasma P M with respect to the object to be processed WK purposes.
  • the plasma generator 100 can be used, for example, for surface treatment such as ashing, etching or film formation, improvement of adhesiveness and wettability, and surface modification such as surface hardening.
  • WK ... the object to be treated, P P ... preliminary plasma, P M ... main plasma, 100 ... Plasma generator, 101 ... preliminary discharge electrode, 102 ... conductor, 103 ... preliminary discharge dielectric, 104 ... common discharge electrode, 104a ... main electrode facing surface, 105 ... electrode housing, 105a ... ceramic adhesive, 106 ... plasma gas output port, 110 ... Plasma gas jacket, 111, 112 ... Porous body, 111a, 112a ... Through hole, 113 ... Spacer, 114 ... Jacket cover, 115 ... Introduction path, 116 ... Cooler mounting part, 117a ... First mounting hole, 117b ... second mounting hole, 118 ... cooler, 118a ... piping, 120 ...
  • main discharge electrode 120a ... common electrode facing surface, 121 ... second plasma gas output port, 122 ... second plasma gas jacket, 123, 124 ... second porous body, 123a, 124a ... through hole, 125 ... spacer, 126 ... 2nd jacket cover, 127 ... Introduction path, 130 ... Electrode support, 131 ... Common electrode support, 131a ... Through hole, 132 ... Main electrode support, 132a ... Through hole, 133 ... Support, 140 ... Dielectric for main discharge, 150 ... preliminary discharge power supply, 151 ... ground, 152 ... main discharge power supply.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)

Abstract

Provided is a plasma generating device with which it is possible to expand the degree of freedom for designing a preliminary electric discharge region, and to expand a plasma processing space. A plasma generating device 100 is provided with a preliminary discharge electrode 101, a common discharge electrode 104, and a main discharge electrode 120. The preliminary discharge electrode 101 is formed in the shape of an elongate rod in which a conducting wire 102 is accommodated in a preliminary discharge dielectric 103 made from a glass tube. The common discharge electrode 104 is configured as a plate-shaped body extending along the preliminary discharge electrode 101, and has formed therein a groove shaped electrode accommodating portion 105 which accommodates the preliminary discharge electrode 101 in an exposed state. Further, a plasma gas output port 106 consisting of a plurality of through holes for ejecting plasma gas is formed along the preliminary discharge electrode 101 in the common discharge electrode 104. The main discharge electrode 120 consists of a plate-shaped body extending along the common discharge electrode 104, and is arranged facing the common discharge electrode 104.　Figure 1

Description

プラズマ生成装置Plasma generator
　本発明は、大気圧下でも生成可能なプラズマ生成装置に関する。 The present invention relates to a plasma generator capable of generating even under atmospheric pressure.
　従来から、アッシング、エッチングまたは被膜形成などの表面処理、接着性や濡れ性の改善または表面硬化などの表面改質、および医療器具や食べ物の洗浄や殺菌などの洗浄殺菌処理にプラズマ生成装置が用いられている。例えば、下記特許文献１には、誘電体で覆われた主電極の両側に誘電体で覆われた側電極を予備放電領域を介して配置したフラットパネルディスプレイまたは太陽電池の製造用のプラズマ生成装置が開示されている。 Conventionally, plasma generators have been used for surface treatments such as ashing, etching or film formation, surface modification such as improvement of adhesiveness and wettability or surface hardening, and cleaning and sterilization treatments such as cleaning and sterilization of medical equipment and food. Has been done. For example, in Patent Document 1 below, a plasma generator for manufacturing a flat panel display or a solar cell in which side electrodes covered with a dielectric are arranged on both sides of a main electrode covered with a dielectric through a preliminary discharge region. Is disclosed.
特開２００５－２６８１７０号公報Japanese Unexamined Patent Publication No. 2005-268170
　しかしながら、上記特許文献１に示されたプラズマ生成装置においては、主電極と側電極との間の予備放電領域がプラズマガスの流路も兼ねているため、予備放電領域の隙間の幅を含む形状がプラズマガスの流路としても機能するように設計しなければならず、予備放電領域の設計の自由度が低いという問題がある。また、上記プラズマ生成装置においては、予備放電領域の隙間が狭いためプラズマ処理空間に十分なプラズマガスを供給することができない場合もありプラズマ処理空間を広く形成することが困難であるという問題もある。 However, in the plasma generator shown in Patent Document 1, since the pre-discharge region between the main electrode and the side electrode also serves as a flow path for the plasma gas, the shape includes the width of the gap in the pre-discharge region. Must be designed to function as a flow path for plasma gas, and there is a problem that the degree of freedom in designing the preliminary discharge region is low. Further, in the above plasma generator, there is a problem that it is difficult to form a wide plasma processing space because a sufficient gap of the preliminary discharge region may not be supplied to the plasma processing space. ..
　本発明は上記問題に対処するためなされたもので、その目的は、予備放電領域の設計の自由度を広げるとともにプラズマによる処理空間を広げることもできるプラズマ生成装置を提供することにある。 The present invention has been made to deal with the above problems, and an object of the present invention is to provide a plasma generator capable of expanding the degree of freedom in designing a preliminary discharge region and expanding the processing space by plasma.
　上記目的を達成するため、本発明の特徴は、長尺に延びる導体を誘電体で覆った予備放電電極と、予備放電電極に隣接配置されて同予備放電電極に沿って延びる共通放電電極と、予備放電電極と共通放電電極との間に交流電圧を印加して予備プラズマを発生させるための予備放電電源と、共通放電電極に対して予備放電電極よりも離れた位置に共通放電電極および予備放電電極にそれぞれ対向した状態で延びる主放電電極と、主放電電極と予備放電電極および共通放電電極との間に配置されて予備放電電極、共通放電電極および主放電電極に沿って延びる誘電体からなる主放電用誘電体と、主放電電極と共通放電電極との間に交流電圧を印加して主プラズマを発生させるための主放電電源とを備え、共通放電電極は、予備放電電極に隣接する位置に同予備放電電極の延びる方向に沿ってプラズマガスを出力させるプラズマガス出力口を備えることにある。 In order to achieve the above object, the features of the present invention include a pre-discharge electrode in which a long conductor is covered with a dielectric, and a common discharge electrode arranged adjacent to the pre-discharge electrode and extending along the pre-discharge electrode. A pre-discharge power supply for applying an AC voltage between the pre-discharge electrode and the common discharge electrode to generate pre-plasma, and a common discharge electrode and pre-discharge at a position farther from the pre-discharge electrode with respect to the common discharge electrode. It consists of a main discharge electrode that extends so as to face each of the electrodes, and a dielectric that is arranged between the main discharge electrode and the pre-discharge electrode and the common discharge electrode and extends along the pre-discharge electrode, the common discharge electrode, and the main discharge electrode. It is provided with a main discharge dielectric and a main discharge power source for applying an AC voltage between the main discharge electrode and the common discharge electrode to generate main plasma, and the common discharge electrode is located adjacent to the preliminary discharge electrode. Is provided with a plasma gas output port for outputting plasma gas along the extending direction of the preliminary discharge electrode.
　このように構成した本発明の特徴によれば、プラズマ生成装置は、プラズマガスを出力させるプラズマガス出力口が予備放電電極に隣接する共通放電電極に同予備放電電極に沿って形成されているため予備放電電極と共通放電電極との間の予備プラズマを生じさせる領域の設計の自由度を広げることができる。このことは、予備プラズマの発生のし易さのみに着目して予備放電電極と共通放電電極との間の予備プラズマを生じさせる領域を設定できることを意味しており、予備プラズマを効果的に発生させることができることを意味している。また、本発明に係るプラズマ生成装置は、予備放電電極と共通放電電極との間の予備プラズマを生じさせる領域の幅を狭く形成してもプラズマガスの流量を自由に設定することができ主プラズマによる処理空間を広げることもできる。 According to the feature of the present invention configured as described above, in the plasma generator, the plasma gas output port for outputting the plasma gas is formed in the common discharge electrode adjacent to the preliminary discharge electrode along the preliminary discharge electrode. It is possible to increase the degree of freedom in designing the region where the preliminary plasma is generated between the preliminary discharge electrode and the common discharge electrode. This means that the region where the preliminary plasma is generated can be set between the preliminary discharge electrode and the common discharge electrode by paying attention only to the ease of generating the preliminary plasma, and the preliminary plasma is effectively generated. It means that it can be made to. Further, in the plasma generator according to the present invention, the flow rate of plasma gas can be freely set even if the width of the region where the preliminary plasma is generated between the preliminary discharge electrode and the common discharge electrode is narrowed. It is also possible to expand the processing space by.
　また、本発明の他の特徴は、前記プラズマ生成装置において、プラズマガス出力口は、予備放電電極の両側にそれぞれ形成されていることにある。 Another feature of the present invention is that in the plasma generator, plasma gas output ports are formed on both sides of the preliminary discharge electrode.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、プラズマガス出力口が予備放電電極の両側にそれぞれ形成されているため、より広範で均一なプラズマガス雰囲気を形成することができ効果的に主プラズマによる処理空間を広げることができる。 According to another feature of the present invention configured in this way, the plasma generation device forms a wider and more uniform plasma gas atmosphere because the plasma gas output ports are formed on both sides of the preliminary discharge electrode. It is possible to effectively expand the processing space by the main plasma.
　また、本発明の他の特徴は、前記プラズマ生成装置において、プラズマガス出力口は、予備放電電極の延びる方向に沿って形成された複数の孔で構成されていることにある。 Another feature of the present invention is that in the plasma generator, the plasma gas output port is composed of a plurality of holes formed along the extending direction of the preliminary discharge electrode.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、プラズマガス出力口が予備放電電極の延びる方向に沿って形成された複数の孔で構成されているため、共通放電電極の剛性を確保し易いとともにプラズマガス出力口への異物の侵入を防止することができる。 According to another feature of the present invention configured in this way, since the plasma gas output port is composed of a plurality of holes formed along the extending direction of the preliminary discharge electrode, the common discharge electrode It is easy to secure the rigidity of the gas, and it is possible to prevent foreign matter from entering the plasma gas output port.
　また、本発明の他の特徴は、前記プラズマ生成装置において、プラズマガス出力口は、予備放電電極の両側にそれぞれ形成されているとともに、前記両側のうちの一方側のプラズマガス出力口を構成する各孔は他方側のプラズマガス出力口を構成する各孔に対してずれた位置にそれぞれ形成されていることにある。 Another feature of the present invention is that in the plasma generator, plasma gas output ports are formed on both sides of the preliminary discharge electrode, and also constitutes a plasma gas output port on one of the two sides. Each hole is formed at a position deviated from each hole constituting the plasma gas output port on the other side.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、プラズマガス出力口が予備放電電極の両側にそれぞれ形成されるとともに、これらの両側のうちの一方側のプラズマガス出力口を構成する各孔と他方側のプラズマガス出力口を構成する各孔とが互いにずれた位置にそれぞれ形成されているため、出力されたプラズマガスのムラを抑制して均一な主プラズマを生成することができる。 According to another feature of the present invention configured in this way, in the plasma generator, plasma gas output ports are formed on both sides of the preliminary discharge electrode, and the plasma gas output port on one side of these both sides is formed. Since each hole constituting the above and each hole constituting the plasma gas output port on the other side are formed at positions shifted from each other, unevenness of the output plasma gas is suppressed and a uniform main plasma is generated. be able to.
　また、本発明の他の特徴は、前記プラズマ生成装置において、さらに、プラズマガス出力口に面した状態で同プラズマガス出力口に供給されるプラズマガスを一時的に貯留するプラズマガスジャケットを備えることにある。 Another feature of the present invention is that the plasma generator further includes a plasma gas jacket that temporarily stores the plasma gas supplied to the plasma gas output port while facing the plasma gas output port. It is in.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、プラズマガス出力口に面した状態で同プラズマガス出力口に供給されるプラズマガスを一時的に貯留するプラズマガスジャケットを備えているため、プラズマガス出力口を構成する一つの孔内においてまたは複数の孔同士間でムラのないプラズマガスを出力させることができる。 According to another feature of the present invention configured in this way, the plasma generator has a plasma gas jacket that temporarily stores the plasma gas supplied to the plasma gas output port while facing the plasma gas output port. Since it is provided, it is possible to output plasma gas evenly within one hole constituting the plasma gas output port or between a plurality of holes.
　また、本発明の他の特徴は、前記プラズマ生成装置において、さらに、プラズマガスジャケットは、多数の貫通孔を有した多孔体を有しており、プラズマガスを多孔体を介してプラズマガス出力口に導くことにある。 Further, another feature of the present invention is that in the plasma generator, the plasma gas jacket further has a porous body having a large number of through holes, and the plasma gas is transmitted through the porous body to the plasma gas output port. To lead to.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、プラズマガスジャケットが多数の貫通孔を有した多孔体を有しておりプラズマガスをこの多孔体を介してプラズマガス出力口に導くため、プラズマガス出力口を構成する一つの孔内または複数の孔間でムラのないプラズマガスを出力させることができる。この場合、多孔体としては、板状体に多数の貫通孔を形成したパンチングプレートのほか、無数の空洞を有したスポンジまたは繊維の集合体などの多孔質体で構成することができる。 According to another feature of the present invention configured in this way, in the plasma generation device, the plasma gas jacket has a porous body having a large number of through holes, and the plasma gas is output through the porous body. Since it is guided to the mouth, it is possible to output the plasma gas evenly in one hole or between a plurality of holes constituting the plasma gas output port. In this case, the porous body can be composed of a punching plate having a large number of through holes formed in the plate-like body, or a porous body such as a sponge having innumerable cavities or an aggregate of fibers.
　また、本発明の他の特徴は、前記プラズマ生成装置において、さらに、プラズマガスジャケットに隣接して設けられて同プラズマガスジャケット内のプラズマガスを冷却する冷却器を備えることにある。 Another feature of the present invention is that the plasma generator further includes a cooler provided adjacent to the plasma gas jacket to cool the plasma gas in the plasma gas jacket.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、プラズマガスジャケットに隣接して設けられて同プラズマガスジャケット内のプラズマガスを冷却する冷却器を備えているため、プラズマガスを介して予備放電電極、共通放電電極および主放電電極を冷却することができるとともに被処理物の加熱も防止することができる。 According to another feature of the present invention configured in this way, the plasma generator is provided adjacent to the plasma gas jacket and includes a cooler for cooling the plasma gas in the plasma gas jacket. The preliminary discharge electrode, the common discharge electrode, and the main discharge electrode can be cooled via the gas, and the heating of the object to be processed can be prevented.
　また、本発明の他の特徴は、前記プラズマ生成装置において、主放電電極は、主放電用誘電体に向けてプラズマガスを出力させる第２プラズマガス出力口を備えることにある。 Another feature of the present invention is that in the plasma generator, the main discharge electrode includes a second plasma gas output port that outputs plasma gas toward the main discharge dielectric.
　このように構成した本発明の他の特徴によれば、プラズマ生成装置は、主放電電極は、主放電用誘電体に向けてプラズマガスを出力させる第２プラズマガス出力口を備えているため、主放電用誘電体に対して主放電電極側にプラズマガスを供給することができ主プラズマを早期にかつ広範な範囲で発生および維持させることができる。 According to another feature of the present invention configured as described above, in the plasma generator, the main discharge electrode includes a second plasma gas output port for outputting plasma gas toward the main discharge dielectric. Plasma gas can be supplied to the main discharge electrode side with respect to the main discharge dielectric, and the main plasma can be generated and maintained at an early stage and in a wide range.
本発明に係るプラズマ生成装置の構成の概略を模式的に示した側面断面図である。It is a side sectional view schematically showing the outline of the structure of the plasma generation apparatus which concerns on this invention. 図１に示すプラズマ生成装置の構成の概略を模式的に示した正面断面図である。It is a front sectional view schematically showing the outline of the structure of the plasma generation apparatus shown in FIG. 図１に示すプラズマ生成装置における予備放電電極を備えた共通放電電極の外観構成を模式的に示した平面図である。FIG. 5 is a plan view schematically showing an external configuration of a common discharge electrode provided with a preliminary discharge electrode in the plasma generator shown in FIG. 1. 図１に示すプラズマ生成装置における共通電極の外観構成を模式的に示した底面図である。It is a bottom view which shows typically the appearance structure of the common electrode in the plasma generation apparatus shown in FIG. 図１に示すプラズマ生成装置におけるジャケット覆い体の外観構成を模式的に示した底面図である。It is a bottom view which shows typically the appearance structure of the jacket cover body in the plasma generation apparatus shown in FIG. 図２に示すプラズマ生成装置における予備放電電極と共通放電電極との間に交流電圧を印加して予備プラズマを生成した状態を模式的に示す正面図である。It is a front view schematically showing the state which generated the preliminary plasma by applying an AC voltage between the preliminary discharge electrode and the common discharge electrode in the plasma generation apparatus shown in FIG. 図２に示すプラズマ生成装置における予備放電電極と共通放電電極との間および主放電電極および共通放電電極との間にそれぞれ交流電圧を印加して主プラズマを生成した状態を模式的に示す正面図である。A front view schematically showing a state in which an AC voltage is applied between a preliminary discharge electrode and a common discharge electrode and between a main discharge electrode and a common discharge electrode to generate a main plasma in the plasma generator shown in FIG. Is. 本発明の変形例に係るプラズマ生成装置における予備放電電極を備えた共通放電電極の外観構成を模式的に示した平面図である。It is a top view which schematically showed the appearance structure of the common discharge electrode provided with the preliminary discharge electrode in the plasma generation apparatus which concerns on the modification of this invention. 本発明の変形例に係るプラズマ生成装置の構成の概略を模式的に示した側面断面図である。It is a side sectional view schematically showing the outline of the structure of the plasma generation apparatus which concerns on the modification of this invention.
　以下、本発明に係るプラズマ生成装置の一実施形態について図面を参照しながら説明する。図１は、本発明に係るプラズマ生成装置１００の構成の概略を模式的に示した側面断面図である。また、図２は、図１に示すプラズマ生成装置１００の構成の概略を模式的に示した正面断面図である。また、図３は、図１に示すプラズマ生成装置１００における予備放電電極１０１を備えた共通放電電極１０４の外観構成を模式的に示した平面図である。なお、本明細書において参照する図は、本発明の理解を容易にするために一部の構成要素を誇張して表わすなど模式的に表している。このため、各構成要素間の寸法や比率などは異なっていることがある。このプラズマ生成装置１００は、標準大気圧の大気に開放された環境下でプラズマを生成して食品からなる被処理物ＷＫに照射して殺菌する機械装置である。 Hereinafter, an embodiment of the plasma generator according to the present invention will be described with reference to the drawings. FIG. 1 is a side sectional view schematically showing an outline of the configuration of the plasma generator 100 according to the present invention. Further, FIG. 2 is a front sectional view schematically showing an outline of the configuration of the plasma generation device 100 shown in FIG. Further, FIG. 3 is a plan view schematically showing the external configuration of the common discharge electrode 104 provided with the preliminary discharge electrode 101 in the plasma generation device 100 shown in FIG. 1. It should be noted that the figures referred to in the present specification are schematically shown by exaggerating some of the components in order to facilitate the understanding of the present invention. Therefore, the dimensions and ratios between the components may be different. The plasma generator 100 is a mechanical device that generates plasma in an environment open to the atmosphere of a standard atmospheric pressure and irradiates the WK to be treated made of food to sterilize it.
（プラズマ生成装置１００の構成）
　プラズマ生成装置１００は、４つの予備放電電極１０１を備えている。各予備放電電極１０１は、予備プラズマＰＰを発生させるための部品であり、それぞれ長尺に延びる棒状に形成されている。これらの各予備放電電極１０１は、主として、導体１０２および予備放電用誘電体１０３をそれぞれ備えて構成されている。 (Configuration of Plasma Generator 100)
The plasma generator 100 includes four pre-discharge electrodes 101. Each priming discharge electrode 101 is a part for generating the pre-plasma P P, it is formed in a rod shape extending in the respective long. Each of these pre-discharge electrodes 101 is mainly configured to include a conductor 102 and a pre-discharge dielectric 103, respectively.
　導体１０２は、後述する共通放電電極１０４と対を構成する電極であり、導電性を有する材料を長尺に延ばして形成されている。本実施形態においては、導体１０２は、直径１．８ｍｍで長さが２５０ｍｍの銅線で構成されている。なお、導体１０２は、導電性を有する材料であれば良く、例えば、銀、金、チタンまたはアルミニウム材など銅以外の材料で構成することもできる。この導体１０２は、後述する予備放電電源１５０に電気的に接続されているとともにアース１５１を介して接地されている。 The conductor 102 is an electrode that forms a pair with the common discharge electrode 104 described later, and is formed by extending a conductive material in a long length. In the present embodiment, the conductor 102 is composed of a copper wire having a diameter of 1.8 mm and a length of 250 mm. The conductor 102 may be any material as long as it has conductivity, and may be made of a material other than copper, such as silver, gold, titanium, or aluminum. The conductor 102 is electrically connected to the preliminary discharge power supply 150, which will be described later, and is grounded via the ground 151.
　予備放電用誘電体１０３は、導体１０２を覆うとともに導体１０２と共通放電電極１０４との間で両者を電気的に絶縁するための部品であり、導体１０２を覆う大きさの不導体で構成されている。本実施形態においては、予備放電用誘電体１０３は、石英材を直径が４ｍｍ、内径が２ｍｍおよび長さが２３０ｍｍの有底円筒状に形成した透明な石英管で構成されている。 The preliminary discharge dielectric 103 is a component that covers the conductor 102 and electrically insulates the conductor 102 from the common discharge electrode 104, and is composed of a non-conductor having a size that covers the conductor 102. There is. In the present embodiment, the preliminary discharge dielectric 103 is composed of a transparent quartz tube formed by forming a quartz material into a bottomed cylindrical shape having a diameter of 4 mm, an inner diameter of 2 mm and a length of 230 mm.
　なお、予備放電用誘電体１０３は、導体１０２を覆う不導電体であれば良く、例えば、半透明または不透明のガラス、ガラス以外のセラミック材、樹脂材またはゴム材などで構成することもできる。また、導体１０２および予備放電用誘電体１０３からなる予備放電電極１０１の大きさは、予備プラズマＰＰを生成する必要性に応じて適宜設計されるものであり、本実施形態に限定されるものではないことは当然である。この予備放電用誘電体１０３は、導体１０２における予備放電電源１５０に接続される端部を露出させた状態で同端部以外の部分を収容して共通放電電極１０４に支持されている。 The preliminary discharge dielectric 103 may be any non-conductor that covers the conductor 102, and may be made of, for example, translucent or opaque glass, a ceramic material other than glass, a resin material, or a rubber material. The size of the priming discharge electrode 101 made of a conductor 102 and a pre-discharge dielectric 103, which is designed appropriately in accordance with the need to generate a preliminary plasma P P, limited to the present embodiment Of course not. The preliminary discharge dielectric 103 is supported by a common discharge electrode 104 by accommodating a portion other than the same end portion in a state where the end portion of the conductor 102 connected to the preliminary discharge power supply 150 is exposed.
　共通放電電極１０４は、予備放電電極１０１と対を構成して予備プラズマＰＰを発生させるとともに主放電電極１２０と対を構成して主プラズマＰＭを発生させるための部品であり、導電性を有する材料を長尺に延ばして形成されている。より具体的には、共通放電電極１０４は、予備放電電極１０１に沿って長尺に延びるとともに主放電電極１２０に対して対向する板状体で構成されている。本実施形態においては、共通放電電極１０４は、アルミニウム材を長さが２００ｍｍ、幅が６０ｍｍおよび厚さが１５ｍｍの板状体に形成して構成されている。なお、共通放電電極１０４は、導電性を有する材料であれば良く、例えば、銀、金、チタンまたは銅などアルミニウム材以外の材料で構成することもできる。 Common discharge electrode 104 is a part for generating a main plasma P M constituting the main discharge electrodes 120 and the pair together to generate a pre-plasma P P constitutes a preliminary discharge electrodes 101 and the pair, electrically conductive It is formed by extending the material to be held in a long length. More specifically, the common discharge electrode 104 is formed of a plate-like body that extends long along the preliminary discharge electrode 101 and faces the main discharge electrode 120. In the present embodiment, the common discharge electrode 104 is formed by forming an aluminum material into a plate-like body having a length of 200 mm, a width of 60 mm, and a thickness of 15 mm. The common discharge electrode 104 may be made of a material having conductivity, and may be made of a material other than an aluminum material such as silver, gold, titanium, or copper.
　この共通放電電極１０４には、主放電電極１２０に対向する主電極対向面１０４ａに電極収容部１０５が形成されているとともにこの電極収容部１０５に沿ってプラズマガス出力口１０６が形成されている。また、共通放電電極１０４には、主電極対向面１０４ａおよび電極収容部１０５の裏側にプラズマガスジャケット１１０が形成されている。 In this common discharge electrode 104, an electrode accommodating portion 105 is formed on a main electrode facing surface 104a facing the main discharge electrode 120, and a plasma gas output port 106 is formed along the electrode accommodating portion 105. Further, the common discharge electrode 104 is formed with a plasma gas jacket 110 on the main electrode facing surface 104a and the back side of the electrode accommodating portion 105.
　主電極対向面１０４ａは、主放電電極１２０に面して主プラズマＰＭを発生させるための部分であり、主放電電極１２０と平行な平面状に形成されている。この場合、主電極対向面１０４ａは、共通放電電極１０４の長手方向および同長手方向に直交する幅方向の各端部および電極収容部１０５が開口する縁部分がそれぞれ丸みを帯びた曲面形状に形成されて局所的な放電が発生すること防止している。 The main electrodes facing surface 104a is a portion for generating a main plasma P M facing the main discharge electrodes 120, it is formed on the main discharge electrodes 120 and the parallel plane. In this case, the main electrode facing surface 104a is formed in a curved shape in which each end portion in the longitudinal direction of the common discharge electrode 104 and the width direction orthogonal to the longitudinal direction and the edge portion through which the electrode accommodating portion 105 opens are rounded. This prevents local discharge from occurring.
　電極収容部１０５は、４つの予備放電電極１０１をそれぞれ収容する部分であり、各予備放電電極１０１に沿って凹状に窪んで延びる溝状に形成されている。より具体的には、電極収容部１０５は、予備放電電極１０１における主放電電極１２０側の外表面を露出させた状態でその他の部分を覆う深さの溝状に形成されている。この場合、電極収容部１０５は、予備放電電極１０１の両側面に対して僅かな空隙を介して収容する形状に形成されている。本実施形態においては、電極収容部１０５は、深さが３ｍｍ、幅が４．１ｍｍで主放電電極１２０の長手方向に沿って貫通した状態で形成されている。 The electrode accommodating portion 105 is a portion accommodating each of the four pre-discharge electrodes 101, and is formed in a groove shape extending in a concave shape along each pre-discharge electrode 101. More specifically, the electrode accommodating portion 105 is formed in a groove shape having a depth that covers the other portion of the preliminary discharge electrode 101 with the outer surface on the main discharge electrode 120 side exposed. In this case, the electrode accommodating portion 105 is formed in a shape accommodating the preliminary discharge electrodes 101 with respect to both side surfaces with a slight gap. In the present embodiment, the electrode accommodating portion 105 is formed in a state of having a depth of 3 mm and a width of 4.1 mm and penetrating along the longitudinal direction of the main discharge electrode 120.
　また、電極収容部１０５は、共通放電電極１０４の長手方向に直交する幅方向に４つ形成されている。この場合、４つの電極収容部１０５は、主プラズマＰＭが均一に生成されるように共通放電電極１０４の幅方向に等間隔でかつ互いに平行に延びて形成されている。そして、各電極収容部１０５内には、４つの予備放電電極１０１がそれぞれセラミック接着剤１０５ａによって固着された状態で収容され支持されている。 Further, four electrode accommodating portions 105 are formed in the width direction orthogonal to the longitudinal direction of the common discharge electrode 104. In this case, the four electrode accommodating portion 105 is formed to extend equidistantly in and parallel to each other in the width direction of the common discharge electrode 104 as main plasma P M is uniformly generated. Then, in each electrode accommodating portion 105, four pre-discharge electrodes 101 are accommodated and supported in a state of being fixed by the ceramic adhesive 105a.
　プラズマガス出力口１０６は、予備プラズマＰＰを発生し易くさせるとともに発生させた予備プラズマＰＰを主放電電極１２０側に導いて主プラズマＰＭを発生および維持させるためのプラズマガスを噴出させる部分であり、一方の端部（図示下端部）がプラズマガスジャケット１１０に連通するとともに他方の端部（図示上端部）が主電極対向面１０４ａに開口する貫通孔で形成されている。このプラズマガス出力口１０６は、電極収容部１０５内に収容される予備放電電極１０１に隣接する位置に同予備放電電極１０１が延びる長手方向に沿って複数の貫通孔が等間隔に配置されて構成されている。 Plasma gas output port 106, a portion for ejecting the plasma gas for pre-plasma P P a preliminary plasma P P which is generated together is likely to occur leading to the main discharge electrodes 120 side main plasma P M generated and maintained One end (lower end in the drawing) communicates with the plasma gas jacket 110, and the other end (upper end in the drawing) is formed by a through hole that opens into the main electrode facing surface 104a. The plasma gas output port 106 is configured such that a plurality of through holes are arranged at equal intervals along the longitudinal direction in which the preliminary discharge electrode 101 extends at a position adjacent to the preliminary discharge electrode 101 housed in the electrode accommodating portion 105. Has been done.
　この場合、プラズマガス出力口１０６は、予備放電電極１０１を挟むように予備放電電極１０１の両側にそれぞれ一列に並んで形成されている。ここで、予備放電電極１０１の両側とは、主電極対向面１０４ａ上において予備放電電極１０１が延びる長手方向に直交する幅方向である。また、この場合、主電極対向面１０４ａの幅方向に互いに隣接する２つのプラズマガス出力口１０６をそれぞれ構成する一列の貫通孔は、幅方向において互いに隣接し合わないように予備放電電極１０１の長手方向にずれて配置されている。 In this case, the plasma gas output ports 106 are formed side by side in a row on both sides of the pre-discharge electrode 101 so as to sandwich the pre-discharge electrode 101. Here, both sides of the preliminary discharge electrode 101 are width directions orthogonal to the longitudinal direction in which the preliminary discharge electrode 101 extends on the main electrode facing surface 104a. Further, in this case, the length of the preliminary discharge electrode 101 is such that the single row of through holes constituting the two plasma gas output ports 106 adjacent to each other in the width direction of the main electrode facing surface 104a are not adjacent to each other in the width direction. They are arranged so that they are offset in the direction.
　このプラズマガス出力口１０６は、本実施形態においては、直径１ｍｍの円筒形に形成されているが、直径、ピッチ、形状および数はプラズマ生成装置１００の仕様に応じて適宜設定されることは当然である。なお、図１～図４においては、プラズマガス出力口１０６の大きさを誇張して示している。 In the present embodiment, the plasma gas output port 106 is formed in a cylindrical shape having a diameter of 1 mm, but it is natural that the diameter, pitch, shape, and number are appropriately set according to the specifications of the plasma generator 100. Is. In addition, in FIGS. 1 to 4, the size of the plasma gas output port 106 is exaggerated.
　このプラズマガス出力口１０６から噴出されるプラズマガスは、予備プラズマＰＰを発生させ易くするとともに生成された予備プラズマＰＰを主放電電極１２０側に導いて主プラズマＰＭを発生および維持させるための気体であり、窒素、アルゴンおよびヘリウムなどの空気よりも電離電圧の低い気体を単体でまたはこれらを混合して、さらには、これらに水蒸気またはアンモニアなどのガスを添加して構成されている。このプラズマガスは、ポンプまたはタンクからなるプラズマガス供給設備（図示せず）からプラズマガスジャケット１１０を介してプラズマガス出力口１０６に供給される。 Plasma gas ejected from the plasma gas output port 106, for generating and maintaining the main plasma P M led to preliminary plasma P P generated in the main discharge electrodes 120 side as well as easier to generate a preliminary plasma P P A gas having an ionization voltage lower than that of air such as nitrogen, argon and helium is used alone or in a mixture thereof, and a gas such as water vapor or ammonia is added thereto. This plasma gas is supplied from a plasma gas supply facility (not shown) including a pump or a tank to the plasma gas output port 106 via the plasma gas jacket 110.
　プラズマガスジャケット１１０は、図４に示すように、プラズマガス出力口１０６から噴射させるプラズマガスを一時的に貯留するための部分であり、共通放電電極１０４の裏面側を凹状に切り欠いた空洞部で構成されている。本実施形態においては、プラズマガスジャケット１１０は、共通放電電極１０４の裏面側から見た平面視で略長方形状に形成されている。このプラズマガスジャケット１１０内には、多孔体１１１，１１２およびスペーサ１１３がそれぞれ設けられている。 As shown in FIG. 4, the plasma gas jacket 110 is a portion for temporarily storing the plasma gas injected from the plasma gas output port 106, and is a hollow portion in which the back surface side of the common discharge electrode 104 is recessed. It is composed of. In the present embodiment, the plasma gas jacket 110 is formed in a substantially rectangular shape when viewed from the back surface side of the common discharge electrode 104. A porous body 111, 112 and a spacer 113 are provided in the plasma gas jacket 110, respectively.
　この共通放電電極１０４は、ジャケット覆い体１１４を介して予備放電電源１５０に電気的に接続されているとともにこの予備放電電源１５０を介して主放電電源１５２に電気的に接続された状態で主放電電極１２０に対して所定の距離を介した位置に電極支持体１３０によって支持されている。 The common discharge electrode 104 is electrically connected to the pre-discharge power supply 150 via the jacket cover 114 and is electrically connected to the main discharge power supply 152 via the pre-discharge power supply 150 for main discharge. It is supported by the electrode support 130 at a position with respect to the electrode 120 via a predetermined distance.
　多孔体１１１，１１２は、前記したプラズマガス供給設備からプラズマガスジャケット１１０内に導入されたプラズマガスの流れを緩衝するための部品であり、金属製、樹脂製またはセラミック製の板状体でそれぞれ構成されている。これらの多孔体１１１，１１２は、板面の全体に多数の貫通孔１１１ａ，１１２ａが形成された所謂パンチングプレートである。 The porous bodies 111 and 112 are parts for buffering the flow of plasma gas introduced into the plasma gas jacket 110 from the above-mentioned plasma gas supply facility, and are made of metal, resin, or ceramic, respectively. It is configured. These porous bodies 111 and 112 are so-called punching plates in which a large number of through holes 111a and 112a are formed on the entire plate surface.
　この場合、多孔体１１１の貫通孔１１１ａと多孔体１１２の貫通孔１１２ａとは、多孔体１１１と多孔体１１２とが図示上下方向に互いに対向配置された際に貫通孔１１１ａと貫通孔１１２ａとが互いに重ならないように互いにずれた位置に形成されている。これらの多孔体１１１，１１２は、互いの板面が隙間を介して対向するように重ねられてプラズマガスジャケット１１０内に配置されている。 In this case, the through hole 111a of the porous body 111 and the through hole 112a of the porous body 112 are the through hole 111a and the through hole 112a when the porous body 111 and the porous body 112 are arranged to face each other in the vertical direction shown in the drawing. They are formed so that they do not overlap each other. These porous bodies 111 and 112 are arranged in the plasma gas jacket 110 so that their plate surfaces are overlapped with each other so as to face each other with a gap.
　スペーサ１１３は、多孔体１１１，１１２が互いに密着して重なること防止するとともに、多孔体１１１，１１２の各板面がプラズマガスジャケット１１０およびジャケット覆い体１１４にそれぞれ密着することを防止してこれらの各間に隙間を形成するための部品である。このスペーサ１１３は、金属材、樹脂材またはセラミック材を平板リング状に形成して構成されている。 The spacer 113 prevents the porous bodies 111 and 112 from being in close contact with each other and overlapping each other, and also prevents the plate surfaces of the porous bodies 111 and 112 from being in close contact with the plasma gas jacket 110 and the jacket covering body 114, respectively. It is a component for forming a gap between each. The spacer 113 is formed by forming a metal material, a resin material, or a ceramic material into a flat plate ring shape.
　本実施形態においては、スペーサ１１３は、プラズマガスジャケット１１０の天井部分と多孔体１１１との間、多孔体１１１と多孔体１１２との間、多孔体１１２とジャケット覆い体１１４の図示上面との間にそれぞれ配置されている。なお、図２においては、プラズマガスジャケット１１０を破線で示しているが多孔体１１１，１１２およびスペーサ１１３の図示を省略している。 In the present embodiment, the spacer 113 is provided between the ceiling portion of the plasma gas jacket 110 and the porous body 111, between the porous body 111 and the porous body 112, and between the porous body 112 and the illustrated upper surface of the jacket covering body 114. It is arranged in each. In FIG. 2, the plasma gas jacket 110 is shown by a broken line, but the porous bodies 111 and 112 and the spacer 113 are not shown.
　ジャケット覆い体１１４は、図５に示すように、プラズマガスジャケット１１０の図示下方に向かって開口する開口部を覆ってプラズマガスジャケット１１０内を密閉するとともにプラズマガスジャケット１１０内にプラズマガスを導くための部品であり、導電性を有する金属材料を平面視で共通放電電極１０４と同じ大きさの方形の板状に形成して構成されている。 As shown in FIG. 5, the jacket covering body 114 covers the opening of the plasma gas jacket 110 that opens downward in the drawing to seal the inside of the plasma gas jacket 110 and guide the plasma gas into the plasma gas jacket 110. A conductive metal material is formed in a rectangular plate shape having the same size as the common discharge electrode 104 in a plan view.
　この場合、ジャケット覆い体１１４は、導電性を有する金属材料で構成されているが、共通放電電極１０４が直接予備放電電源１５０に電気的に接続される場合には必ずしも導電性を有する材料で構成する必要はなく樹脂材またはセラミック材で構成することもできる。このジャケット覆い体１１４には、導入路１１５、冷却器取付部１１６、第１取付孔１１７ａおよび第２取付孔１１７ｂがそれぞれ形成されている。 In this case, the jacket covering 114 is made of a conductive metal material, but when the common discharge electrode 104 is directly electrically connected to the preliminary discharge power supply 150, it is not necessarily made of a conductive material. It is not necessary to use a resin material or a ceramic material. The jacket cover 114 is formed with an introduction path 115, a cooler mounting portion 116, a first mounting hole 117a, and a second mounting hole 117b, respectively.
　導入路１１５は、前記したプラズマガス供給設備から供給されるプラズマガスをプラズマガスジャケット１１０に導くための流路であり、ジャケット覆い体１１４の厚み方向に貫通する貫通孔で構成されている。この導入路１１５は、プラズマガスジャケット１１０に対向する複数（本実施形態においては６つ）の位置に略均等に配置されて形成されている。そして、各導入路１１５は、前記プラズマガス供給設備に対して図示しない配管を介して接続されている。なお、図５においては、プラズマガスジャケット１１０を二点鎖線で示している。 The introduction path 115 is a flow path for guiding the plasma gas supplied from the plasma gas supply facility to the plasma gas jacket 110, and is composed of a through hole penetrating in the thickness direction of the jacket covering body 114. The introduction paths 115 are formed so as to be substantially evenly arranged at a plurality of positions (six in the present embodiment) facing the plasma gas jacket 110. Each introduction path 115 is connected to the plasma gas supply facility via a pipe (not shown). In FIG. 5, the plasma gas jacket 110 is shown by a chain double-dashed line.
　冷却器取付部１１６は、冷却器１１８を取り付ける部分であり、ジャケット覆い体１１４における図示下面に凹状に切り欠かれて形成されている。この場合、冷却器取付部１１６は、プラズマガスジャケット１１０に対向する部分に形成されているとともに、前記導入路１１５に隣接する位置に形成されている。本実施形態においては、冷却器取付部１１６は、２つの冷却器１１８に対応して２つ形成されている。 The cooler mounting portion 116 is a portion for mounting the cooler 118, and is formed by being recessed in the lower surface of the jacket covering 114 as shown. In this case, the cooler mounting portion 116 is formed at a portion facing the plasma gas jacket 110 and at a position adjacent to the introduction path 115. In this embodiment, two cooler mounting portions 116 are formed corresponding to the two coolers 118.
　第１取付孔１１７ａは、ジャケット覆い体１１４を共通放電電極１０４に取り付けるためのボルト（図示せず）が貫通する貫通孔であり、本実施形態においては６つ形成されている。また、第２取付孔１１７ｂは、ジャケット覆い体１１４を電極支持体１３０に取り付けるためのボルト（図示せず）がネジ嵌合する貫通する有底の孔部であり、本実施形態においては４つ形成されている。 The first mounting holes 117a are through holes through which bolts (not shown) for mounting the jacket covering body 114 to the common discharge electrode 104 penetrate, and are formed in six in the present embodiment. Further, the second mounting holes 117b are bottomed holes through which bolts (not shown) for mounting the jacket covering body 114 to the electrode support 130 are screw-fitted, and are four in the present embodiment. It is formed.
　冷却器１１８は、プラズマガスを冷却するための装置であり、熱伝導率の高い銅などの金属製の板状体内に冷却液が流通する配管１１８ａが埋め込まれて構成されている。この冷却器１１８は、ジャケット覆い体１１４における図示下面に形成された２つの冷却器取付部１１６内にそれぞれ嵌め込まれた状態で取り付けられている。これら２つの冷却器１１８は、互いの配管１１８ａが図示しないホースを介して直列的に連結されており、図示しないポンプなどからなる冷却液供給設備によって水などからなる冷却液が供給される。 The cooler 118 is a device for cooling plasma gas, and is configured by embedding a pipe 118a through which a coolant flows in a metal plate-like body such as copper having high thermal conductivity. The cooler 118 is mounted in a state of being fitted in each of the two cooler mounting portions 116 formed on the lower surface of the jacket cover 114 in the drawing. In these two coolers 118, the pipes 118a of each other are connected in series via a hose (not shown), and a coolant made of water or the like is supplied by a coolant supply facility including a pump (not shown) or the like.
　主放電電極１２０は、共通放電電極１０４と対を構成して主プラズマＰＭを発生させるための部品であり、導電性を有する材料を長尺に延ばして形成されている。より具体的には、主放電電極１２０は、共通放電電極１０４の主電極対向面１０４ａに主放電用誘電体１４０を介して対向する共通電極対向面１２０ａを有した板状体で構成されており、共通放電電極１０４に対して予備放電電極１０１よりも離れた位置に配置されている。本実施形態においては、主放電電極１２０は、アルミニウム材を長さが２００ｍｍ、幅が６０ｍｍおよび厚さが１５ｍｍの板状体に形成して構成されている。この主放電電極１２０は、共通放電電極１０４に対して所定の距離を介した位置に電極支持体１３０によって支持された状態で主放電電源１５２に電気的に接続されている。 The main discharge electrodes 120 is a part for generating a main plasma P M constitute a common discharge electrode 104 and the pair, a conductive material is formed by extending the long. More specifically, the main discharge electrode 120 is composed of a plate-like body having a common electrode facing surface 120a facing the main electrode facing surface 104a of the common discharge electrode 104 via a main discharge dielectric 140. , It is arranged at a position farther from the preliminary discharge electrode 101 with respect to the common discharge electrode 104. In the present embodiment, the main discharge electrode 120 is formed by forming an aluminum material into a plate-like body having a length of 200 mm, a width of 60 mm and a thickness of 15 mm. The main discharge electrode 120 is electrically connected to the main discharge power supply 152 in a state of being supported by the electrode support 130 at a position with respect to the common discharge electrode 104 via a predetermined distance.
　共通電極対向面１２０ａは、共通放電電極１０４に面して主プラズマＰＭを発生させるための部分であり、主電極対向面１０４ａと平行な平面に形成されている。この場合、共通電極対向面１２０ａは、主放電電極１２０の長手方向および同長手方向に直交する幅方向の各端部がそれぞれ丸みを帯びた曲面形状に形成されて局所的な放電が発生することを防止している。なお、主放電電極１２０は、導電性を有する材料であれば良く、例えば、銀、金、チタンまたは銅などアルミニウム材以外の材料で構成することもできる。 Common electrode opposing surface 120a is a portion for generating a main plasma P M facing the common discharge electrode 104 are formed on the main electrode opposing surface 104a parallel to the plane. In this case, the common electrode facing surface 120a is formed so that each end of the main discharge electrode 120 in the longitudinal direction and the width direction orthogonal to the longitudinal direction is formed into a rounded curved surface shape to generate local discharge. Is being prevented. The main discharge electrode 120 may be made of a material having conductivity, and may be made of a material other than an aluminum material such as silver, gold, titanium or copper.
　電極支持体１３０は、共通放電電極１０４と主放電電極１２０とを互いに所定の距離を介した離隔した位置にそれぞれ保持する部品であり、共通放電電極１０４および主放電電極１２０をこれら以外の物品から電気的に絶縁する不導体で構成されている。本実施形態においては、電極支持体１３０は、フッ素樹脂材で構成されている。この電極支持体１３０は、主として、共通電極支持体１３１、主電極支持体１３２および支柱１３３をそれぞれ備えて構成されている。 The electrode support 130 is a component that holds the common discharge electrode 104 and the main discharge electrode 120 at positions separated from each other via a predetermined distance, and the common discharge electrode 104 and the main discharge electrode 120 are separated from articles other than these. It is composed of non-conductors that are electrically insulated. In the present embodiment, the electrode support 130 is made of a fluororesin material. The electrode support 130 is mainly composed of a common electrode support 131, a main electrode support 132, and a support column 133, respectively.
　共通電極支持体１３１は、共通放電電極１０４をジャケット覆い体１１４を介して図示下方から支持する部品であり、平面視でジャケット覆い体１１４よりも大きな面積の方形の板状体で構成されている。この場合、共通電極支持体１３１には、ジャケット覆い体１１４の各導入路１１５にそれぞれ連結されるプラズマガスの配管（図示せず）が貫通する貫通孔１３１ａが形成されている。この共通電極支持体１３１は、図示しないボルトが第２取付孔１１７ｂにネジ嵌合することでジャケット覆い体１１４を図示下方から固定的に支持している。 The common electrode support 131 is a component that supports the common discharge electrode 104 via the jacket cover 114 from below in the drawing, and is composed of a square plate having a larger area than the jacket cover 114 in a plan view. .. In this case, the common electrode support 131 is formed with a through hole 131a through which a plasma gas pipe (not shown) connected to each introduction path 115 of the jacket covering body 114 penetrates. The common electrode support 131 fixedly supports the jacket covering 114 from below in the drawing by screw-fitting a bolt (not shown) into the second mounting hole 117b.
　主電極支持体１３２は、主放電電極１２０を共通放電電極１０４に対向した状態で図示上方から支持する部品であり、平面視で主放電電極１２０よりも大きな面積の方形の板状体で構成されている。この主電極支持体１３２は、図示しないボルトを介して主放電電極１２０を図示上方から固定的に支持している。 The main electrode support 132 is a component that supports the main discharge electrode 120 in a state of facing the common discharge electrode 104 from above in the drawing, and is composed of a square plate having a larger area than the main discharge electrode 120 in a plan view. ing. The main electrode support 132 fixedly supports the main discharge electrode 120 from above in the drawing via bolts (not shown).
　支柱１３３は、共通電極支持体１３１に対して所定の距離を介して対向した状態で主電極支持体１３２を支持することで主放電電極１２０を共通放電電極１０４に対して所定の空隙を介した位置に対向配置するための部品であり、丸棒状に形成されている。この支柱１３３は、共通電極支持体１３１および主電極支持体１３２の各四隅に設けられた図示しないボルトを介して共通電極支持体１３１および主電極支持体１３２にそれぞれ固定的に連結されている。なお、図１、図２、図６および図７においては、支柱１３３の中央部分の図示を省略している。 The support column 133 supports the main electrode support 132 in a state of facing the common electrode support 131 via a predetermined distance, so that the main discharge electrode 120 is passed through a predetermined gap with respect to the common discharge electrode 104. It is a component for arranging facing the position, and is formed in a round bar shape. The columns 133 are fixedly connected to the common electrode support 131 and the main electrode support 132 via bolts (not shown) provided at the four corners of the common electrode support 131 and the main electrode support 132, respectively. In addition, in FIG. 1, FIG. 2, FIG. 6 and FIG. 7, the central portion of the support column 133 is not shown.
　本実施形態においては、支柱１３３は、共通放電電極１０４の主電極対向面１０４ａに対して主放電電極１２０の共通電極対向面１２０ａを１０ｍｍだけ離隔した位置に対向配置する長さに形成されている。なお、この電極支持体１３０は、共通放電電極１０４と主放電電極１２０とを互いに所定の距離を介した位置で互いに電気的に絶縁した状態で支持することができれば本実施形態に限定されるものでないことは当然である。また、図１～図３、図６および図７においては、電極支持体１３０を二点鎖線で示している。 In the present embodiment, the support column 133 is formed to have a length such that the common electrode facing surface 120a of the main discharge electrode 120 is opposed to the main electrode facing surface 104a of the common discharge electrode 104 at a position separated by 10 mm. .. The electrode support 130 is limited to the present embodiment as long as the common discharge electrode 104 and the main discharge electrode 120 can be supported at positions via a predetermined distance in a state of being electrically insulated from each other. Of course not. Further, in FIGS. 1 to 3, 6 and 7, the electrode support 130 is shown by a chain double-dashed line.
　主放電用誘電体１４０は、予備放電電極１０１および共通放電電極１０４と主放電電極１２０との間で両者を電気的に絶縁するとともに被処理物ＷＫを支持するための部品であり、主電極対向面１０４ａと共通電極対向面１２０ａとの間で両者を覆う大きさの不導体で構成されている。より具体的には、主放電用誘電体１４０は、主電極対向面１０４ａおよび共通電極対向面１２０ａの各長手方向および各幅方向の長さよりも長い長さのフッ素樹脂製のシート材を環状の無端ベルト状に形成して構成されている。本実施形態においては、主放電用誘電体１４０は、厚さが１ｍｍのフッ素樹脂製のシートを用いている。 The main discharge dielectric 140 is a component for electrically insulating the preliminary discharge electrode 101 and the common discharge electrode 104 and the main discharge electrode 120 and supporting the WK to be processed, and faces the main electrode. It is composed of a non-conductor having a size that covers both the surface 104a and the common electrode facing surface 120a. More specifically, the main discharge dielectric 140 is made of an annular sheet material made of fluororesin having a length longer than the length of the main electrode facing surface 104a and the common electrode facing surface 120a in each longitudinal direction and each width direction. It is formed in the shape of an endless belt. In the present embodiment, the main discharge dielectric 140 uses a fluororesin sheet having a thickness of 1 mm.
　この主放電用誘電体１４０は、図示しない駆動ローラと従動ローラとの間に水平方向に張られた状態で架設されて駆動ローラの回転駆動によって無限軌道状に送られる。すなわち、主放電用誘電体１４０は、ベルトコンベアにおける搬送ベルトを構成している。なお、本実施形態における主放電用誘電体１４０は、無端ベルトの周方向に沿って柔軟に屈曲する不導体で構成されていればよく、フッ素樹脂材以外の樹脂材（例えば、ポリアミド樹脂材など）からなるシート材であってもよい。 The main discharge dielectric 140 is erected between a drive roller and a driven roller (not shown) in a horizontally stretched state, and is fed in an endless track shape by rotational drive of the drive roller. That is, the main discharge dielectric 140 constitutes a transport belt in the belt conveyor. The main discharge dielectric 140 in the present embodiment may be made of a non-conductor that flexibly bends along the circumferential direction of the endless belt, and is a resin material other than the fluororesin material (for example, a polyamide resin material). ) May be a sheet material.
　予備放電電源１５０は、予備放電電極１０１と共通放電電極１０４とに対して交流電圧を印加するための電気機器である。本実施形態においては、予備放電電源１５０は、一般家庭用電源（１００Ｖ）から電力供給を受けて予備放電電極１０１および共通放電電極１０４に対して電圧が±１ｋＶ～±２０ｋＶの範囲でかつ周波数が１００Ｈｚ～３０ｋＨｚの範囲で所望の電圧および周波数の交流電圧を印加することができる。この場合、予備放電電源１５０は、出力電圧の位相を変化させる図示しない移相器を備えている。また、予備放電電源１５０は、矩形波、正弦波、台形波および三角波のうちのいずれの交流電圧を連続的または間欠的に出力するものであってもよい。 The preliminary discharge power supply 150 is an electric device for applying an AC voltage to the preliminary discharge electrode 101 and the common discharge electrode 104. In the present embodiment, the preliminary discharge power supply 150 receives power from a general household power supply (100V) and has a voltage in the range of ± 1 kV to ± 20 kV and a frequency with respect to the preliminary discharge electrode 101 and the common discharge electrode 104. An AC voltage of a desired voltage and frequency can be applied in the range of 100 Hz to 30 kHz. In this case, the preliminary discharge power supply 150 includes a phase shifter (not shown) that changes the phase of the output voltage. Further, the preliminary discharge power supply 150 may continuously or intermittently output any AC voltage of a square wave, a sine wave, a trapezoidal wave, and a triangular wave.
　アース１５１は、予備放電電極１０１と共通放電電極１０４との間に交流電圧を印加する電気回路である予備放電回路および主放電電極１２０と共通放電電極１０４との間で交流電圧を印加する電気回路である主放電電気回路についてそれぞれ接地するための電気回路である。本実施形態においては、予備放電電源１５０および主放電電源１５２にそれぞれ電気的に接続された予備放電電極１０１に設けられている。 The ground 151 is an electric circuit that applies an AC voltage between the preliminary discharge electrode 101 and the common discharge electrode 104, and an electric circuit that applies an AC voltage between the main discharge electrode 120 and the common discharge electrode 104. This is an electric circuit for grounding each of the main discharge electric circuits. In the present embodiment, the pre-discharge electrode 101 is electrically connected to the pre-discharge power supply 150 and the main discharge power supply 152, respectively.
　なお、アース１５１は、予備放電電源１５０および主放電電源１５２にそれぞれ電気的に接続された共通放電電極１０４に設けられていてもよい（図５参照）。また、アース１５１は、予備放電電気回路および主放電電気回路に対して共通に設けてもよいし、予備放電電気回路および主放電電気回路に対してそれぞれ別々に設けてもよい。さらに、アース１５１は、省略してもよい。 The ground 151 may be provided on the common discharge electrode 104 electrically connected to the preliminary discharge power supply 150 and the main discharge power supply 152, respectively (see FIG. 5). Further, the ground 151 may be provided in common for the pre-discharge electric circuit and the main discharge electric circuit, or may be provided separately for the pre-discharge electric circuit and the main discharge electric circuit. Further, the earth 151 may be omitted.
　主放電電源１５２は、主放電電極１２０と共通放電電極１０４とに対して交流電圧を印加するための電気機器である。本実施形態においては、主放電電源１５２は、一般家庭用電源（１００Ｖ）から電力供給を受けて主放電電極１２０および共通放電電極１０４に対して電圧が±１ｋＶ～±２０ｋＶの範囲でかつ周波数が１００Ｈｚ～３０ｋＨｚの範囲で所望の電圧および周波数の交流電圧を印加することができる。この場合、主放電電源１５２は、出力電圧の位相を変化させる図示しない移相器を備えている。また、主放電電源１５２は、矩形波、正弦波、台形波および三角波のうちのいずれの交流電圧を連続的にまたは間欠的に出力するものであってもよいが、予備放電電源１５０と同じ波形を逆位相で出力することが好ましい。 The main discharge power supply 152 is an electric device for applying an AC voltage to the main discharge electrode 120 and the common discharge electrode 104. In the present embodiment, the main discharge power supply 152 receives power from a general household power supply (100 V) and has a voltage in the range of ± 1 kV to ± 20 kV and a frequency with respect to the main discharge electrode 120 and the common discharge electrode 104. An AC voltage of a desired voltage and frequency can be applied in the range of 100 Hz to 30 kHz. In this case, the main discharge power supply 152 includes a phase shifter (not shown) that changes the phase of the output voltage. Further, the main discharge power supply 152 may continuously or intermittently output any AC voltage of a square wave, a sine wave, a trapezoidal wave, and a triangular wave, but has the same waveform as the preliminary discharge power supply 150. Is preferably output in opposite phase.
　なお、これらの予備放電電源１５０および主放電電源１５２の出力電圧および周波数は、生成する予備プラズマＰＰおよび主プラズマＰＭに応じて適宜設定されるものであって本実施形態に限定されるものでないことは当然である。また、このプラズマ生成装置１００は、被処理物ＷＫにプラズマを照射する作業を行う屋内または屋外の作業台上に直接載置または取り付けて設けられるほか、被処理物ＷＫにプラズマを照射する作業を含む被処理物ＷＫの加工装置や搬送装置の一部に組み込んで設けられる。 The output voltage and frequency of these preliminary discharge power supply 150 and a main discharge power supply 152, be one that is appropriately set in accordance generated preliminary plasma P P and the main plasma P M is limited to the present embodiment It is natural that it is not. Further, the plasma generator 100 is provided by directly placing or mounting it on an indoor or outdoor workbench for irradiating the object WK with plasma, and also for irradiating the object WK with plasma. It is provided by being incorporated into a part of a processing device or a transport device for a WK to be processed.
（プラズマ生成装置１００の作動）
　次に、上記のように構成したプラズマ生成装置１００の作動について説明する。本実施形態においては、プラズマ生成装置１００は、豆、小麦、ゴマ、胡椒または茶葉（碾茶や抹茶を含む）などの粉状または粒状の食品の製造加工ラインに組み込まれてこれらを被処理物ＷＫとして殺菌消毒処理を行う場合について説明する。この場合、プラズマ生成装置１００は、標準大気圧の大気中に直接露出した状態で設置される。 (Operation of plasma generator 100)
Next, the operation of the plasma generator 100 configured as described above will be described. In the present embodiment, the plasma generator 100 is incorporated into a production processing line for powdery or granular foods such as beans, wheat, sesame, pepper or tea leaves (including tencha and matcha), and these are incorporated into a processed product WK. The case where sterilization and disinfection treatment is performed will be described. In this case, the plasma generator 100 is installed in a state of being directly exposed to the atmosphere of standard atmospheric pressure.
　プラズマ生成装置１００を使用して被処理物ＷＫにプラズマ照射を行う作業者は、まず、プラズマ生成装置１００における予備放電電極１０１と共通放電電極１０４との間に予備プラズマＰＰを発生させる。具体的には、作業者は、プラズマ生成装置１００における予備放電電源１５０を操作して予備放電電極１０１と共通放電電極１０４との間に交流電圧を印加する。この場合、作業者は、予備放電電源１５０を操作して主プラズマＰＭを発生させるために必要な予備プラズマＰＰを発生させるための電圧および周波数の交流電圧を出力する。 Using a plasma generating apparatus 100 worker performing plasma irradiation to the object to be processed WK, first, to generate a pre-plasma P P between the priming discharge electrode 101 in the plasma generating apparatus 100 and the common discharge electrode 104. Specifically, the operator operates the preliminary discharge power supply 150 in the plasma generation device 100 to apply an AC voltage between the preliminary discharge electrode 101 and the common discharge electrode 104. In this case, the operator, and outputs a voltage and an AC voltage of a frequency for generating the pre-plasma P P needed to generate the main plasma P M by operating the pre-discharge power supply 150.
　本実施形態においては、予備放電電源１５０は、電圧が±５ｋＶ、電流が２０ｍＡおよび周波数が１０ｋＨｚの交流電圧を出力する。この場合、予備放電電源１５０が出力する交流電圧および周波数は、発生させる主プラズマＰＭに応じて予め実験的に求めることができる。これにより、プラズマ生成装置１００における予備放電電極１０１と共通放電電極１０４との間では、図６に示すように、両者間に存在する大気の一部が電離するとともに活性化されて予備プラズマＰＰが発生する。 In the present embodiment, the preliminary discharge power supply 150 outputs an AC voltage having a voltage of ± 5 kV, a current of 20 mA, and a frequency of 10 kHz. In this case, the AC voltage and frequency pre-discharge power supply 150 is outputted can be determined experimentally in advance in accordance with the main generating plasma P M. As a result, between the preliminary discharge electrode 101 and the common discharge electrode 104 in the plasma generator 100, as shown in FIG. 6, a part of the atmosphere existing between the two is ionized and activated to activate the preliminary plasma PP. Occurs.
　この場合、予備プラズマＰＰは、４つの予備放電電極１０１にそれぞれ沿って４つの線状に生成される。すなわち、予備プラズマＰＰは、大気圧下における誘電体バリア放電によって生成される。なお、図６においては、予備プラズマＰＰを薄いハッチングで示している。 In this case, pre-plasma P P is generated four linear along each of the four priming discharge electrode 101. That is, pre-plasma P P is generated by dielectric barrier discharge in atmospheric pressure. In FIG. 6 shows a preliminary plasma P P thin hatching.
　また、この予備プラズマＰＰの生成に際して作業者は、プラズマガス出力口１０６からプラズマガスを出力させることができる。具体的には、作業者は、プラズマガス供給設備（図示せず）を操作してプラズマガスジャケット１１０にプラズマガスの供給を開始させる。プラズマガスジャケット１１０内に導入されたプラズマガスは、２つの多孔体１１１，１１２に遮られながら通過して蛇行しながらプラズマガス出力口１０６に達した後、このプラズマガス出力口１０６によって主電極対向面１０４ａ上に噴射される。この場合、プラズマガス出力口１０６から噴射されたプラズマガスは、その一部が予備放電電極１０１側に直接または主放電用誘電体１４０などを介して間接的に導かれる。 Moreover, the operator in generating the pre-plasma P P can be output a plasma gas from the plasma gas output port 106. Specifically, the operator operates a plasma gas supply facility (not shown) to start supplying plasma gas to the plasma gas jacket 110. The plasma gas introduced into the plasma gas jacket 110 passes through the two porous bodies 111 and 112 while meandering and reaches the plasma gas output port 106, and then faces the main electrode by the plasma gas output port 106. It is injected onto the surface 104a. In this case, a part of the plasma gas injected from the plasma gas output port 106 is directly guided to the preliminary discharge electrode 101 side or indirectly via the main discharge dielectric 140 or the like.
　これにより、予備プラズマＰＰの発生および成長が促進される。この場合、主電極対向面１０４ａ上においては、複数のプラズマガス出力口１０６間でプラズマガスの噴出量のムラが抑えられることで噴出されたプラズマガスの雰囲気内におけるプラズマガスの濃度のムラが抑えられるため、予備放電電極１０１の長さ方向に沿って均一な予備プラズマＰＰの発生および成長が促進される。なお、均一な予備プラズマＰＰとは、少なくとも人が目視で均一と確認できるレベルである。また、図１および図６においては、プラズマガスの流れを破線矢印で示している。 Thereby, generation and growth of the pre-plasma P P is promoted. In this case, on the main electrode facing surface 104a, unevenness in the amount of plasma gas ejected between the plurality of plasma gas output ports 106 is suppressed, so that unevenness in the concentration of plasma gas in the atmosphere of the ejected plasma gas is suppressed. Therefore , the generation and growth of uniform pre-plasma PP along the length direction of the pre-discharge electrode 101 is promoted. Note that the uniform preliminary plasma P P, at a level of at least a person can be confirmed uniform visually. Further, in FIGS. 1 and 6, the flow of plasma gas is indicated by a broken line arrow.
　また、プラズマガス出力口１０６からプラズマガスを噴出させる場合には、作業者は、プラズマガスを冷却することができる。具体的には、作業者は、冷却水供給設備（図示せず）を操作して２つの冷却器１１８に対してそれぞれ冷却水の供給を開始させる。これにより、プラズマガスジャケット１１０内のプラズマガスは冷却器１１８によって冷却されてプラズマガス出力口１０６から主電極対向面１０４ａ上に噴出される。この場合、プラズマガスジャケット１１０内に供給されたプラズマガスは、多孔体１１２および多孔体１１１によって流動が妨げられているため効果的に冷却される。これにより、プラズマガスは、予備放電電極１０１および共通放電電極１０４の加熱を防止する。 Further, when the plasma gas is ejected from the plasma gas output port 106, the operator can cool the plasma gas. Specifically, the operator operates a cooling water supply facility (not shown) to start supplying cooling water to each of the two coolers 118. As a result, the plasma gas in the plasma gas jacket 110 is cooled by the cooler 118 and ejected from the plasma gas output port 106 onto the main electrode facing surface 104a. In this case, the plasma gas supplied into the plasma gas jacket 110 is effectively cooled because the flow is hindered by the porous body 112 and the porous body 111. As a result, the plasma gas prevents the preliminary discharge electrode 101 and the common discharge electrode 104 from being heated.
　次に、作業者は、主放電電極１２０と共通放電電極１０４との間に主プラズマＰＭを発生させる。具体的には、作業者は、プラズマ生成装置１００における主放電電源１５２を操作して主放電電極１２０と共通放電電極１０４との間に交流電圧を印加する。この場合、作業者は、主放電電源１５２を操作して主プラズマＰＭを発生させるために必要な電圧および周波数の交流電圧を出力する。 Next, the operator generates a primary plasma P M between the main discharge electrodes 120 and the common discharge electrode 104. Specifically, the operator operates the main discharge power supply 152 in the plasma generator 100 to apply an AC voltage between the main discharge electrode 120 and the common discharge electrode 104. In this case, the operator outputs an AC voltage of the voltage and frequency required for generating a main plasma P M by operating the main discharge power supply 152.
　本実施形態においては、主放電電源１５２は、電圧が±９ｋＶ、電流が２０ｍＡおよび周波数が１０ｋＨｚで予備放電電源１５０の出力電圧とは逆位相の交流電圧を出力する。この場合、主放電電源１５２が出力する交流電圧および周波数は、被処理物ＷＫに必要なプラズマ処理内容に応じて予め実験的に求めることができる。これにより、プラズマ生成装置１００における主放電電極１２０と共通放電電極１０４との間では、図７に示すように、両者間に存在する大気の一部が前記予備プラズマＰＰによって発生した電子または活性種をトリガとして電離するとともに活性化されて主プラズマＰＭが発生する。 In the present embodiment, the main discharge power supply 152 outputs an AC voltage having a voltage of ± 9 kV, a current of 20 mA, and a frequency of 10 kHz and having a phase opposite to the output voltage of the preliminary discharge power supply 150. In this case, the AC voltage and frequency output by the main discharge power supply 152 can be experimentally obtained in advance according to the plasma processing content required for the object to be processed WK. Thus, between the main discharge electrodes 120 in the plasma generating apparatus 100 and the common discharge electrode 104, as shown in FIG. 7, electrons or activity is part of the atmosphere that exists between them generated by the preliminary plasma P P It is activated with ionizing species triggers the main plasma P M is generated.
　この場合、主電極対向面１０４ａ上においては、前記したように、プラズマガスの雰囲気内におけるプラズマガスの濃度のムラが抑えられる。これにより、主プラズマＰＭは、４つの線状に形成された予備プラズマＰＰのうちの外側に形成された２つの予備プラズマＰＰ間における方形の面状の領域内で放電が一様で柱状に延びて形成される。すなわち、本発明に係るプラズマ生成装置１００は、主放電電極１２０と共通放電電極１０４との間で均一な放電が面状に広がって柱状に立ち上る主プラズマＰＭを形成することができる。また、この場合、作業者は、プラズマガス供給設備（図示せず）を操作してプラズマガスの供給量を増加させて主プラズマＰＭの生成を促進させて主プラズマＰＭが生成される領域を広げることができる。なお、図７においては、プラズマガスの流れを破線矢印で示している。 In this case, on the main electrode facing surface 104a, as described above, unevenness in the concentration of plasma gas in the atmosphere of plasma gas is suppressed. Accordingly, the main plasma P M, the discharge is uniform in four linearly formed pre plasma P in the region of the rectangular planar between the two auxiliary plasma P P formed outside of P It extends in a columnar shape. That is, the plasma generating apparatus 100 according to the present invention may be uniform discharge between the main discharge electrodes 120 and the common discharge electrode 104 to form a primary plasma P M which rises in column spreads in a planar shape. The region in this case, the operator, the plasma gas supply equipment by operating the (not shown) to increase the supply amount of the plasma gas by promoting the formation of the main plasma P M is the main plasma P M is generated Can be expanded. In FIG. 7, the flow of plasma gas is indicated by a broken line arrow.
　また、この場合、主電極対向面１０４ａ上においては、前記したように、冷却器１１８によって冷却されたプラズマガスが供給される。これにより、プラズマガスは、予備放電電極１０１および共通放電電極１０４に加えて主放電電極１２０および主放電用誘電体１４０上の被処理物ＷＫの加熱を防止する。また、この場合、作業者は、冷却水供給設備（図示せず）を操作して冷却器１１８に対する冷却水の供給量を増加させることで予備放電電極１０１、共通放電電極１０４および主放電電極１２０に対する冷却能力を向上させることで主プラズマＰＭが生成される領域を広げることができる。 Further, in this case, as described above, the plasma gas cooled by the cooler 118 is supplied on the main electrode facing surface 104a. As a result, the plasma gas prevents heating of the object WK to be processed on the main discharge electrode 120 and the main discharge dielectric 140 in addition to the preliminary discharge electrode 101 and the common discharge electrode 104. Further, in this case, the operator operates a cooling water supply facility (not shown) to increase the amount of cooling water supplied to the cooler 118, thereby increasing the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120. the main plasma P M to improve the cooling capacity for it can be widened areas created.
　なお、図７においては、主プラズマＰＭを予備プラズマＰＰよりも濃いハッチングで示している。また、主放電電極１２０と共通放電電極１０４との間で均一な放電が面状に広がって柱状に立ち上る主プラズマＰＭとは、少なくとも人が目視で均一と確認できるレベルである。 Incidentally, in FIG. 7 shows the main plasma P M dark hatching than preliminary plasma P P. Moreover, the main plasma P M to uniform discharge between the main discharge electrodes 120 and the common discharge electrode 104 rises to columnar spread in planar a level of at least a person can be confirmed uniform visually.
　次に、作業者は、主放電用誘電体１４０を回転駆動させる。具体的には、作業者は、図示しないベルトコンベアの制御装置を操作することで主放電用誘電体１４０を回転駆動させる（図７における破線矢印参照）。 Next, the operator rotationally drives the main discharge dielectric 140. Specifically, the operator rotates and drives the main discharge dielectric 140 by operating a control device of a belt conveyor (not shown) (see the broken line arrow in FIG. 7).
　次に、作業者は、被処理物ＷＫへのプラズマ照射処理を行う。具体的には、作業者は、主放電用誘電体１４０上に被処理物ＷＫを連続的に供給する供給装置（図示せず）の作動を開始させることによって主放電用誘電体１４０上に被処理物ＷＫを連続的に供給する。これにより、主放電用誘電体１４０上に載置された被処理物ＷＫは、主放電電極１２０と共通放電電極１０４との間に形成された主プラズマＰＭ中を通過することでプラズマ照射されて殺菌処理が行なわれる。そして、主プラズマＰＭが照射された被処理物ＷＫは、図示しない被処理物ＷＫの回収装置によって回収される。この場合においても、主放電用誘電体１４０上の被処理物ＷＫは、プラズマガス出力口１０６から出力されるプラズマガスによって予備放電電極１０１、共通放電電極１０４および主放電電極１２０による加熱が防止される。 Next, the operator performs a plasma irradiation process on the object to be processed WK. Specifically, the operator covers the main discharge dielectric 140 by initiating the operation of a supply device (not shown) that continuously supplies the object WK to be processed on the main discharge dielectric 140. The processed product WK is continuously supplied. Thus, the main discharge treatment object placed on the dielectric 140 WK is plasma irradiation by passing through a main plasma P M in which is formed between the main discharge electrodes 120 and the common discharge electrode 104 Is sterilized. The main plasma P M treatment object WK irradiated is is recovered by the recovery device of the object WK not shown. Even in this case, the object WK to be processed on the main discharge dielectric 140 is prevented from being heated by the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120 by the plasma gas output from the plasma gas output port 106. To.
　なお、本発明者らは、プラズマ生成装置１００を用いて豆に大腸菌を付着させた被処理物ＷＫに対して主プラズマＰＭを照射する実験を行ったところ、主放電用誘電体１４０の載置場所に因らず均一な殺菌効果が発揮されたことを確認した。また、本発明者らは、セルロースの繊維でできた短冊に芽胞菌（例えば、Geobacillus Stearothermophilus）を浸み込ませたものをグラシン紙で包装したバイオロジカルインディケータに対してプラズマ生成装置１００を用いて約３０秒～約１２０秒の範囲のプラズマ照射したところ、この芽胞菌を死滅させることができることを確認した。 The present inventors have made experiments of irradiating a primary plasma P M beans using the plasma generating device 100 with respect to the treatment object WK adhered with E. coli, the mounting of the main discharge dielectric 140 It was confirmed that a uniform bactericidal effect was exhibited regardless of the location. In addition, the present inventors used a plasma generator 100 for a biological indicator in which a strip made of cellulose fibers was impregnated with spore-forming bacteria (for example, Geobacillus Stearothermophilus) and wrapped in glassine paper. It was confirmed that this spore-forming bacterium could be killed by irradiating with plasma in the range of about 30 seconds to about 120 seconds.
　次に、作業者は、被処理物ＷＫへのプラズマ照射処理を終了する場合には、予備放電電源１５０および主放電電源１５２の作動を停止させて予備放電電極１０１、共通放電電極１０４および主放電電極１２０への交流電圧の印加を停止させる。これにより、プラズマ生成装置１００は、予備プラズマＰＰおよび主プラズマＰＭが消滅するため、被処理物ＷＫへのプラズマ照射処理を終了することができる。 Next, when the operator finishes the plasma irradiation process on the object to be processed WK, the operator stops the operation of the preliminary discharge power supply 150 and the main discharge power supply 152, and stops the operation of the preliminary discharge power supply 150, the common discharge electrode 104, and the main discharge. The application of the AC voltage to the electrode 120 is stopped. Thus, the plasma generator 100, a preliminary plasma P P and the main plasma P M is extinguished, it is possible to terminate the plasma irradiation treatment to the object to be processed WK.
　なお、この場合、プラズマ生成装置１００は、主放電電源１５２の作動を停止させることで主プラズマＰＭを消滅させて被処理物ＷＫへのプラズマ照射処理を終了することができるが、予備放電電源１５０の作動を停止させることでも主プラズマＰＭを消滅させて被処理物ＷＫへのプラズマ照射処理を終了させることができる。すなわち、作業者は、予備放電電源１５０および主放電電源１５２のうちの一方の作動を停止させることで主プラズマＰＭを消滅させて被処理物ＷＫへのプラズマ照射処理を終了することができる。この場合、作業者は、予備放電電源１５０および主放電電源１５２のうちの一方の作動を停止させた後、他方の作動を停止させることになる。 In this case, the plasma generator 100 can be terminated plasma irradiation treatment by stopping the operation of the main discharge power supply 152 by extinguishing the main plasma P M to the object to be processed WK, preliminary discharge power supply it can be terminated plasma irradiation treatment also be stopped by eliminating the main plasma P M to the object to be processed WK operation of 150. That is, the operator can terminate the plasma irradiation treatment to the object to be processed WK by one of the working is extinguished the main plasma P M by stopping of the preliminary discharge power supply 150 and a main discharge power supply 152. In this case, the operator stops the operation of one of the preliminary discharge power supply 150 and the main discharge power supply 152, and then stops the operation of the other.
　また、作業者は、プラズマガス供給設備（図示せず）を操作してプラズマガスの供給を停止させることによっても予備プラズマＰＰおよび主プラズマＰＭを消滅させることができる。これの場合、作業者は、予備プラズマＰＰおよび主プラズマＰＭの消滅とともに、主放電用誘電体１４０への被処理物ＷＫの供給、主放電用誘電体１４０の回転駆動および冷却器１１８への冷却水の供給もそれぞれ停止させる。 Also, the operator can extinguish a preliminary plasma P P and the main plasma P M also by stopping the supply of the plasma gas by operating a plasma gas supply installation (not shown). For this, the operator, together with the disappearance of the pre-plasma P P and the main plasma P M, the supply of the workpiece WK into the main discharge dielectric 140, the rotary drive and the cooler 118 of the main discharge dielectric 140 The supply of cooling water is also stopped.
　上記作動説明からも理解できるように、上記実施形態によれば、プラズマ生成装置１００は、プラズマガスを出力させるプラズマガス出力口１０６が予備放電電極１０１に隣接する共通放電電極１０４に同予備放電電極１０１に沿って形成されているため予備放電電極１０１と共通放電電極１０４との間の予備プラズマＰＰを生じさせる領域の設計の自由度を広げることができる。このことは、予備プラズマＰＰの発生のし易さのみに着目して予備放電電極１０１と共通放電電極１０４との間の予備プラズマＰＰを生じさせる領域を設定できることを意味して予備プラズマＰＰを効果的に発生させることができることを意味している。また、本発明に係るプラズマ生成装置１００は、予備放電電極１０１と共通放電電極１０４との間の予備プラズマＰＰを生じさせる領域の幅を狭く形成してもプラズマガスの流量を自由に設定することができ主プラズマＰＭによる処理空間を広げることもできる。 As can be understood from the above operation description, according to the above embodiment, in the plasma generator 100, the plasma gas output port 106 for outputting the plasma gas is connected to the common discharge electrode 104 adjacent to the preliminary discharge electrode 101. Since it is formed along the 101, the degree of freedom in designing the region where the preliminary plasma PP is generated between the preliminary discharge electrode 101 and the common discharge electrode 104 can be expanded. This pre-plasma P P preliminary plasma P means that can set the region to produce a preliminary plasma P P between the priming discharge electrode 101 by focusing only on the occurrence ease the common discharge electrode 104 of the It means that P can be generated effectively. The plasma generating apparatus 100 according to the present invention, freely set the flow rate of even a plasma gas preliminary plasma P P and narrower the width of the area causing between the common discharge electrode 104 and the preliminary discharge electrode 101 it is also possible that spread the processing space by the can be the main plasma P M.
　さらに、本発明の実施にあたっては、上記実施形態に限定されるものではなく、本発明の目的を逸脱しない限りにおいて種々の変更が可能である。なお、下記変形例の説明においては、参照する各図における上記実施形態と同様の構成部分に同じ符号または対応する符号を付すとともに直接関わらない部分については一部の構成を適宜省略して示して、それらの説明も省略する。 Furthermore, the implementation of the present invention is not limited to the above embodiment, and various changes can be made as long as the object of the present invention is not deviated. In the description of the following modified examples, the same components as those in the above-described embodiment in each of the referenced figures are designated by the same reference numerals or corresponding reference numerals, and some configurations are appropriately omitted for parts that are not directly related to the components. , Their description is also omitted.
　例えば、上記実施形態においては、プラズマガス出力口１０６は、予備放電電極１０１の両側にそれぞれ一列ずつ設けて構成した。しかし、プラズマガス出力口１０６は、予備放電電極１０１に隣接して設けられていればよい。したがって、プラズマガス出力口１０６は、予備放電電極１０１の片側に一列または２列以上設けて構成することもできる。また、プラズマガス出力口１０６は、予備放電電極１０１の両側にそれぞれ２列以上ずつ設けて構成することもできる。 For example, in the above embodiment, the plasma gas output ports 106 are provided in a row on each side of the preliminary discharge electrode 101. However, the plasma gas output port 106 may be provided adjacent to the preliminary discharge electrode 101. Therefore, the plasma gas output port 106 can be configured by providing one row or two or more rows on one side of the preliminary discharge electrode 101. Further, the plasma gas output ports 106 may be configured by providing two or more rows on each side of the preliminary discharge electrode 101.
　また、上記実施形態においては、プラズマガス出力口１０６は、共通放電電極１０４の幅方向に互いに隣接するプラズマガス出力口１０６を構成する各貫通孔が幅方向において互いに隣接し合わないように予備放電用誘電体１０３の長手方向にずれて配置されている。これにより、プラズマ生成装置１００は、噴出されたプラズマガスのムラを抑制して均一な予備プラズマＰＰおよび主プラズマＰＭを生成することができる。しかし、プラズマガス出力口１０６は、共通放電電極１０４の幅方向に互いに隣接する一列のプラズマガス出力口１０６を構成する各貫通孔が幅方向において互いに隣接し合うように配置することもできる。 Further, in the above embodiment, the plasma gas output port 106 is pre-discharged so that the through holes constituting the plasma gas output port 106 adjacent to each other in the width direction of the common discharge electrode 104 are not adjacent to each other in the width direction. The dielectric 103 is arranged so as to be offset in the longitudinal direction. Thus, the plasma generator 100, it is possible to suppress the unevenness of the ejected plasma gas to produce a uniform preliminary plasma P P and the main plasma P M. However, the plasma gas output port 106 may be arranged so that the through holes constituting the array of plasma gas output ports 106 adjacent to each other in the width direction of the common discharge electrode 104 are adjacent to each other in the width direction.
　また、上記実施形態においては、プラズマガス出力口１０６は、予備放電電極１０１の長手方向に沿って一列に並ぶ複数の円筒形の貫通孔で構成した。これにより、プラズマ生成装置１００は、共通放電電極１０４の剛性を確保し易いとともにプラズマガス出力口１０６への異物の侵入を防止することができる。しかし、プラズマガス出力口１０６は、図８に示すように、予備放電用誘電体１０３の長手方向に沿って延びる１つまたは複数の長孔状のスリットで構成することもできる。 Further, in the above embodiment, the plasma gas output port 106 is composed of a plurality of cylindrical through holes arranged in a row along the longitudinal direction of the preliminary discharge electrode 101. As a result, the plasma generation device 100 can easily secure the rigidity of the common discharge electrode 104 and prevent foreign matter from entering the plasma gas output port 106. However, as shown in FIG. 8, the plasma gas output port 106 may also be composed of one or more elongated slits extending along the longitudinal direction of the preliminary discharge dielectric 103.
　また、上記実施形態においては、プラズマ生成装置１００は、プラズマガス出力口１０６に供給されるプラズマガスを一時的に貯留するプラズマガスジャケット１１０を有して構成した。これにより、プラズマ生成装置１００は、プラズマガス出力口１０６を構成する一つの孔内または複数の孔間でムラのないプラズマガスを出力させることができる。しかし、プラズマ生成装置１００は、プラズマガス出力口１０６に導入路１１５またはプラズマガス供給設備（図示せず）を直結してプラズマガスジャケット１１０を省略して構成することもできる。この場合、プラズマ生成装置１００は、ジャケット覆い体１１４を省略して構成することができる。 Further, in the above embodiment, the plasma generator 100 is configured to have a plasma gas jacket 110 that temporarily stores the plasma gas supplied to the plasma gas output port 106. As a result, the plasma generation device 100 can output uniform plasma gas in one hole or between a plurality of holes constituting the plasma gas output port 106. However, the plasma generation device 100 may be configured by directly connecting the introduction path 115 or the plasma gas supply facility (not shown) to the plasma gas output port 106 and omitting the plasma gas jacket 110. In this case, the plasma generation device 100 can be configured by omitting the jacket covering body 114.
　また、上記実施形態においては、プラズマ生成装置１００は、プラズマガスジャケット１１０内に多孔体１１１，１１２を備えて構成した。これにより、プラズマ生成装置１００は、プラズマガス出力口１０６を構成する一つの孔内または複数の孔間でムラのないプラズマガスを出力させることができる。しかし、プラズマ生成装置１００は、プラズマガスジャケット１１０内に多孔体１１１，１１２を省略して構成することもできる。 Further, in the above embodiment, the plasma generator 100 is configured to include the porous bodies 111 and 112 in the plasma gas jacket 110. As a result, the plasma generation device 100 can output uniform plasma gas in one hole or between a plurality of holes constituting the plasma gas output port 106. However, the plasma generation device 100 may be configured by omitting the porous bodies 111 and 112 in the plasma gas jacket 110.
　また、上記実施形態においては、多孔体１１１，１１２は、２つのパンチングプレートで構成した。しかし、多孔体１１１，１１２は、１つまたは３つ以上のパンチングプレートで構成することができる。この場合、多孔体を２つ以上で構成する場合には、各多孔体における孔部同士が重ならないように位置をずらして形成するとよい。また、多孔体は、ブロック体内に無数の空洞を有したスポンジまたは繊維の集合体などの多孔質体で構成することもできる。 Further, in the above embodiment, the porous bodies 111 and 112 are composed of two punching plates. However, the porous bodies 111, 112 can be composed of one or more punching plates. In this case, when the porous body is composed of two or more, it is preferable to shift the positions so that the pores in each porous body do not overlap each other. Further, the porous body can also be composed of a porous body such as a sponge or an aggregate of fibers having innumerable cavities in the block body.
　また、上記実施形態においては、プラズマ生成装置１００は、水冷方式の冷却器１１８を備えて構成した。これにより、プラズマ生成装置１００は、プラズマガスを介して予備放電電極１０１、共通放電電極１０４および主放電電極１２０を冷却することができるとともに被処理物ＷＫの加熱も防止することができる。しかし、プラズマ生成装置１００は、水冷方式以外の冷却器１１８を備えて構成することもできる。例えば、プラズマ生成装置１００は、ジャケット覆い体１１４における冷却器取付部１１６に対してファン（図示せず）によって冷却風を送るように構成してもよいし、冷却器取付部１１６に代えてヒダ状のヒートシンクを形成して構成することもできる。また、プラズマ生成装置１００は、冷却器１１８を省略して構成することもできる。 Further, in the above embodiment, the plasma generator 100 is configured to include a water-cooled cooler 118. As a result, the plasma generator 100 can cool the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120 via the plasma gas, and can also prevent the object WK to be heated. However, the plasma generator 100 can also be configured to include a cooler 118 other than the water cooling system. For example, the plasma generator 100 may be configured to send cooling air to the cooler mounting portion 116 of the jacket covering body 114 by a fan (not shown), or may be configured to send cooling air to the cooler mounting portion 116, or instead of the cooler mounting portion 116, folds may be sent. It can also be configured by forming a shaped heat sink. Further, the plasma generator 100 may be configured by omitting the cooler 118.
　また、上記実施形態においては、プラズマ生成装置１００は、共通放電電極１０４にのみプラズマガス出力口１０６を設けて構成した。しかし、プラズマ生成装置１００は、図９に示すように、共通放電電極１０４に対向する主放電電極１２０にプラズマガス出力口１０６と同様の第２プラズマガス出力口１２１を設けて構成することができる。 Further, in the above embodiment, the plasma generator 100 is configured by providing the plasma gas output port 106 only on the common discharge electrode 104. However, as shown in FIG. 9, the plasma generation device 100 can be configured by providing a second plasma gas output port 121 similar to the plasma gas output port 106 on the main discharge electrode 120 facing the common discharge electrode 104. ..
　この場合、第２プラズマガス出力口１２１は、プラズマガス出力口１０６と対向する位置またはプラズマガス出力口１０６に対してずれた位置に形成することができるほか、主放電電極１２０における共通電極対向面１２０ａの前面に均等配置して形成することもできる。また、主放電電極１２０には、プラズマガスジャケット１１０と同様の第２プラズマガスジャケット１２２を設けるとともに、この第２プラズマガスジャケット１２２内に多孔体１１１，１１２と同様に多数の貫通孔１２３ａ，１２４ａを有した第２多孔体１２３，１２４がスペーサ１１３と同様のスペーサ１２５を介してそれぞれ設けることができる。また、この場合、主放電電極１２０は、第２プラズマガスジャケット１２２に連通する導入路１２７を備えた板状の第２ジャケット覆い体１２６によって第２プラズマガスジャケット１２２内が気密的に塞がれている。 In this case, the second plasma gas output port 121 can be formed at a position facing the plasma gas output port 106 or at a position deviated from the plasma gas output port 106, and the common electrode facing surface of the main discharge electrode 120. It can also be formed by evenly arranging the front surface of the 120a. Further, the main discharge electrode 120 is provided with a second plasma gas jacket 122 similar to the plasma gas jacket 110, and a large number of through holes 123a, 124a are provided in the second plasma gas jacket 122 as well as the porous bodies 111 and 112. The second porous bodies 123 and 124 having the above can be provided via the same spacer 125 as the spacer 113, respectively. Further, in this case, the main discharge electrode 120 is airtightly closed in the second plasma gas jacket 122 by the plate-shaped second jacket covering body 126 provided with the introduction path 127 communicating with the second plasma gas jacket 122. ing.
　このように構成したプラズマ生成装置１００は、主電極支持体１３２に設けられた貫通孔１３２ａを介してプラズマガス供給設備（図示せず）から供給されるプラズマガスが第２プラズマガスジャケット１２２および第２プラズマガス出力口１２１を介して主放電用誘電体１４０に向けて噴射される（破線矢印参照）。これにより、プラズマ生成装置１００は、主放電用誘電体１４０に対して主放電電極１２０側にプラズマガスを供給することができ主プラズマＰＭを早期にかつ広範な範囲で発生および維持させることができる。なお、プラズマ生成装置１００は、第２プラズマガスジャケット１２２および第２ジャケット覆い体１２６をそれぞれ省略して構成することができることは当然である。 In the plasma generator 100 configured in this way, the plasma gas supplied from the plasma gas supply facility (not shown) through the through hole 132a provided in the main electrode support 132 is supplied to the second plasma gas jacket 122 and the second plasma gas jacket 122. 2 The gas is injected toward the main discharge dielectric 140 via the plasma gas output port 121 (see the broken line arrow). Thus, the plasma generator 100, can be generated and maintained in early and extensive range can be main plasma P M to supply plasma gas to the main discharge electrodes 120 side of the main discharge dielectric 140 it can. It goes without saying that the plasma generator 100 can be configured by omitting the second plasma gas jacket 122 and the second jacket cover 126, respectively.
　また、上記実施形態においては、作業者は、予備放電電源１５０は電圧が±５ｋＶで周波数が１０ｋＨｚの交流電圧を出力するとともに、主放電電源１５２は電圧が±９ｋＶで周波数が１０ｋＨｚの交流電圧を出力するように調整した。しかし、予備放電電源１５０および主放電電源１５２の各出力の仕様は、被処理物ＷＫに対して必要な主プラズマＰＭの量および強さに応じて適宜設定されるものであり、上記実施形態に限定されるものではない。したがって、予備放電電源１５０から出力される交流電圧が主放電電源１５２から出力される交流電圧よりも高電圧、高周波数、低電圧、低周波、同電圧および同周波数のうちのいずれかであることは当然に生じ得ることである。なお、プラズマ生成装置１００は、予備放電電源１５０および主放電電源１５２を１つの電源設備で構成することもできる。 Further, in the above embodiment, the operator outputs an AC voltage having a voltage of ± 5 kV and a frequency of 10 kHz to the preliminary discharge power supply 150, and an AC voltage having a voltage of ± 9 kV and a frequency of 10 kHz to the main discharge power supply 152. Adjusted to output. However, the specifications of the output of the pre-discharge power supply 150 and a main discharge power supply 152 is intended to be set appropriately according to the amount and intensity of the main plasma P M required for treatment object WK, the above-described embodiment It is not limited to. Therefore, the AC voltage output from the preliminary discharge power supply 150 is one of higher voltage, higher frequency, lower voltage, lower frequency, same voltage, and same frequency than the AC voltage output from the main discharge power supply 152. Can naturally occur. The plasma generation device 100 can also include the preliminary discharge power supply 150 and the main discharge power supply 152 in one power supply facility.
　また、予備放電電極１０１、共通放電電極１０４および主放電電極１２０にそれぞれ印加する交流電圧の電圧および周波数についても被処理物ＷＫに対して必要な主プラズマＰＭの量および強さに応じて適宜設定されるものであり、上記実施形態に限定されるものではない。したがって、予備放電電極１０１、共通放電電極１０４および主放電電極１２０にそれぞれ印加する交流電圧の電圧値および周波数は、±１ｋＶ以下または±２０ｋＶ以上の電圧値であってもよいし、１００Ｈｚ以下または１０ｋＨｚ以上の周波数であってもよい。 Further, the preliminary discharge electrodes 101, the common discharge electrode 104 and appropriately according to the amount and intensity of the main plasma P M required even for the object to be processed WK the voltage and frequency of the AC voltage applied respectively to the main discharge electrodes 120 It is set, and is not limited to the above embodiment. Therefore, the voltage value and frequency of the AC voltage applied to the preliminary discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120 may be ± 1 kV or less or ± 20 kV or more, or 100 Hz or less or 10 kHz. The frequency may be higher than that.
　また、上記実施形態においては、主放電電源１５２は、共通放電電極１０４に対して予備放電電源１５０を介して接続した。しかし、主放電電源１５２は、主放電電極１２０と共通放電電極１０４との間に交流電圧を印加できるように接続されていれば、必ずしも上記実施形態に限定されるものではない。したがって、主放電電源１５２は、例えば、共通放電電極１０４に対して予備放電電源１５０を介することなく直接接続することもできる。なお、予備放電電源１５０についても同様に、予備放電電極１０１と共通放電電極１０４との間に交流電圧を印加できるように接続されていれば、必ずしも上記実施形態に限定されるものではない。 Further, in the above embodiment, the main discharge power supply 152 is connected to the common discharge electrode 104 via the preliminary discharge power supply 150. However, the main discharge power supply 152 is not necessarily limited to the above embodiment as long as it is connected between the main discharge electrode 120 and the common discharge electrode 104 so that an AC voltage can be applied. Therefore, the main discharge power supply 152 can be directly connected to the common discharge electrode 104, for example, without using the preliminary discharge power supply 150. Similarly, the preliminary discharge power supply 150 is not necessarily limited to the above embodiment as long as it is connected between the preliminary discharge electrode 101 and the common discharge electrode 104 so that an AC voltage can be applied.
　また、上記実施形態においては、プラズマ生成装置１００は、４つの予備放電電極１０１を備えて構成した。この場合、４つの予備放電電極１０１は、主放電電極１２０と共通放電電極１０４との間で主プラズマＰＭが面状に形成される間隔で配置した。これにより、プラズマ生成装置１００は、予備放電電極１０１の長手方向に直交する幅方向にも幅広な面状の主プラズマＰＭを生成することができる。なお、この場合、予備放電電極１０１の配置間隔は、印加電圧や電極間距離に応じて予め実験的に求められる。しかし、プラズマ生成装置１００は、少なくとも１つの予備放電電極１０１を備えて構成することができるものであり、必ずしも上記実施形態に限定されるものではない。したがって、プラズマ生成装置１００は、５つ以上の予備放電電極１０１を備えて構成することもできる。 Further, in the above embodiment, the plasma generator 100 is configured to include four preliminary discharge electrodes 101. In this case, four priming discharge electrode 101, the main plasma P M between the main discharge electrodes 120 and the common discharge electrode 104 is arranged at intervals are formed in a planar shape. Accordingly, the plasma generating apparatus 100 can generate a main plasma P M of the longitudinal width direction perpendicular to the wider surface shaped preliminary discharge electrodes 101. In this case, the arrangement interval of the preliminary discharge electrodes 101 is experimentally obtained in advance according to the applied voltage and the distance between the electrodes. However, the plasma generator 100 can be configured to include at least one pre-discharge electrode 101, and is not necessarily limited to the above embodiment. Therefore, the plasma generator 100 can also be configured to include five or more pre-discharge electrodes 101.
　また、複数の予備放電電極１０１を設ける場合、予備放電電極１０１の配置間隔を主放電電極１２０と共通放電電極１０４との間で主プラズマＰＭが幅広な面状に形成されない間隔、すなわち、各予備放電電極１０１が単独で線状または帯状の主プラズマＰＭを形成する間隔で配置することもできる。 Also, in the case of providing a plurality of pre-discharge electrodes 101, spacing the main plasma P M is not formed in the wide surface between the arrangement interval of preliminary discharge electrodes 101 and the main discharge electrodes 120 and the common discharge electrode 104, i.e., the It can also be arranged at intervals of preliminary discharge electrodes 101 forming the main plasma P M linear or strip alone.
　また、上記実施形態においては、予備放電電極１０１は、導体１０２の外周面と予備放電用誘電体１０３の内周面との間に空気を介した僅かな空隙を設けて構成されている。しかし、予備放電電極１０１は、導体１０２の外周面と予備放電用誘電体１０３の内周面とを密着、または両者の間の空間を真空または不導体（例えば、セラミック接着剤）で塞いで構成することもできる。これによれば、導体１０２の外周面と予備放電用誘電体１０３の内周面との間の空間内で放電が生じることを防止することができる。 Further, in the above embodiment, the preliminary discharge electrode 101 is configured by providing a slight gap through air between the outer peripheral surface of the conductor 102 and the inner peripheral surface of the preliminary discharge dielectric 103. However, the pre-discharge electrode 101 is configured such that the outer peripheral surface of the conductor 102 and the inner peripheral surface of the pre-discharge dielectric 103 are in close contact with each other, or the space between the two is closed with a vacuum or a non-conductor (for example, ceramic adhesive). You can also do it. According to this, it is possible to prevent discharge from occurring in the space between the outer peripheral surface of the conductor 102 and the inner peripheral surface of the preliminary discharge dielectric 103.
　また、上記実施形態においては、プラズマ生成装置１００は、導体１０２をガラス管製の予備放電用誘電体１０３内に配置した予備放電電極１０１を共通放電電極１０４に形成した電極収容部１０５内に配置して構成した。しかし、予備放電電極１０１は、長尺に延びる導体１０２を誘電体で覆って構成されていればよい。この場合、予備放電電極１０１は、棒状または板状に形成することができる。また、共通放電電極１０４は、予備放電電極１０１に隣接配置されて同予備放電電極１０１に沿って延びて形成されていればよい。 Further, in the above embodiment, the plasma generator 100 arranges the preliminary discharge electrode 101 in which the conductor 102 is arranged in the preliminary discharge dielectric 103 made of a glass tube in the electrode accommodating portion 105 formed in the common discharge electrode 104. And configured. However, the preliminary discharge electrode 101 may be configured by covering a long conductor 102 with a dielectric material. In this case, the preliminary discharge electrode 101 can be formed in a rod shape or a plate shape. Further, the common discharge electrode 104 may be formed adjacent to the preliminary discharge electrode 101 and extending along the preliminary discharge electrode 101.
　また、上記実施形態においては、予備放電電極１０１は、共通放電電極１０４の主電極対向面１０４ａに溝状に形成した電極収容部１０５内に主放電電極１２０側を露出させた状態で配置した。これにより、予備放電電極１０１は、開口した電極収容部１０５に容易に嵌め込んで取り付けることができるとともに向きも正確に配置することができる。また、予備放電電極１０１は、電極収容部１０５の溝自身や溝内に塗布した接着剤によって安定的に保持されるとともに、予備放電電極１０１の周囲に存在する主放電用誘電体１４０や被処理物ＷＫなどとの物理的接触による破損および予備放電電極１０１の破損時における飛散を防止することができる。さらに、予備放電電極１０１は、共通放電電極１０４で囲まれることで予備プラズマＰＰを発生させ易くできるとともに発生させた予備プラズマＰＰを安定的に持続させることができる。 Further, in the above embodiment, the preliminary discharge electrode 101 is arranged in a state where the main discharge electrode 120 side is exposed in the electrode accommodating portion 105 formed in a groove shape on the main electrode facing surface 104a of the common discharge electrode 104. As a result, the preliminary discharge electrode 101 can be easily fitted and attached to the open electrode accommodating portion 105, and the orientation can be accurately arranged. Further, the preliminary discharge electrode 101 is stably held by the groove itself of the electrode accommodating portion 105 and the adhesive applied in the groove, and the main discharge dielectric 140 existing around the preliminary discharge electrode 101 and the object to be treated. It is possible to prevent damage due to physical contact with an object WK or the like and scattering when the preliminary discharge electrode 101 is damaged. Furthermore, priming discharge electrode 101, it is possible to maintain the pre-plasma P P which is generated along with it easier to generate a pre-plasma P P by being surrounded by a common discharge electrode 104 stably.
　この場合、電極収容部１０５は、予備放電電極１０１の径方向の半分以上、より好ましくは２／３以上を覆う深さに形成するとともに、深さ方向に直交する溝幅を対向する予備放電電極１０１の両側面に対して僅かな空隙を介して収容する溝幅に形成するとよい。しかし、電極収容部１０５は、予備放電電極１０１の径方向の半分以下を覆う深さに形成すること、および溝幅を予備放電電極１０１の両側面に接触する溝幅、すなわち、予備放電電極１０１の外径と同じ溝幅に形成することを排除するものではない。また、電極収容部１０５は、予備放電電極１０１を完全に覆う筒状、例えば、共通放電電極１０４の側面に貫通孔状または止り穴状に形成した横孔状または横穴状に形成することもできる。 In this case, the electrode accommodating portion 105 is formed to have a depth that covers more than half, more preferably two-thirds or more in the radial direction of the preliminary discharge electrode 101, and the preliminary discharge electrode that faces the groove width orthogonal to the depth direction. It is preferable to form the groove width so as to accommodate both side surfaces of 101 with a slight gap. However, the electrode accommodating portion 105 is formed to have a depth that covers less than half of the pre-discharge electrode 101 in the radial direction, and the groove width is in contact with both side surfaces of the pre-discharge electrode 101, that is, the pre-discharge electrode 101. It does not exclude the formation of the same groove width as the outer diameter of. Further, the electrode accommodating portion 105 may be formed in a tubular shape completely covering the preliminary discharge electrode 101, for example, in a horizontal hole shape or a horizontal hole shape formed in a through hole shape or a blind hole shape on the side surface of the common discharge electrode 104. ..
　一方で、予備放電電極１０１は、共通放電電極１０４との間で予備プラズマＰＰを生成することができるように配置されていればよい。したがって、予備放電電極１０１は、例えば、電極収容部１０５が形成されていない平面状の主電極対向面１０４ａ上に直接配置することもできる。 On the other hand, the preliminary discharge electrodes 101 may be disposed so as to be able to generate a preliminary plasma P P between the common discharge electrode 104. Therefore, the preliminary discharge electrode 101 can be arranged directly on, for example, the flat main electrode facing surface 104a on which the electrode accommodating portion 105 is not formed.
　また、上記実施形態においては、主放電用誘電体１４０は、無端ベルト状に形成した。しかし、主放電用誘電体１４０は、主放電電極１２０と予備放電電極１０１および共通放電電極１０４との間に配置されて予備放電電極１０１、共通放電電極１０４および主放電電極１２０に沿って延びる誘電体で構成されていればよい。したがって、主放電用誘電体１４０は、例えば、図９に示すように、ガラスを含むセラミック材、樹脂材またはゴム材などの不導体を環状に形成されていない単なる平面状のシート状または板状に形成して構成することができる。この場合、主放電用誘電体１４０は、支柱１３３で支持することができる。 Further, in the above embodiment, the main discharge dielectric 140 is formed in an endless belt shape. However, the main discharge dielectric 140 is arranged between the main discharge electrode 120 and the pre-discharge electrode 101 and the common discharge electrode 104, and extends along the pre-discharge electrode 101, the common discharge electrode 104, and the main discharge electrode 120. It suffices to be composed of the body. Therefore, as shown in FIG. 9, the main discharge dielectric 140 is simply a flat sheet or plate in which non-conductors such as a ceramic material including glass, a resin material, or a rubber material are not formed in an annular shape. Can be formed and constructed in. In this case, the main discharge dielectric 140 can be supported by the support column 133.
　また、上記実施形態においては、主放電用誘電体１４０は、被処理物ＷＫを支持するように構成した。しかし、主放電用誘電体１４０は、他の支持部材で被処理物ＷＫを支持するように構成すれば、必ずしも被処理物ＷＫを支持するように構成する必要はない。 Further, in the above embodiment, the main discharge dielectric 140 is configured to support the object to be processed WK. However, if the main discharge dielectric 140 is configured to support the object to be processed WK by another support member, it does not necessarily have to be configured to support the object to be processed WK.
　また、上記実施形態においては、プラズマ生成装置１００は、食品からなる被処理物ＷＫに対して主プラズマＰＭを照射して殺菌消毒するように構成した。しかし、プラズマ生成装置１００は、食品以外の被処理物ＷＫ（例えば、医療器具など）に対して主プラズマＰＭを照射して殺菌消毒するように構成してもよいし、殺菌挿毒以外の目的で被処理物ＷＫに対して主プラズマＰＭを照射してもよい。プラズマ生成装置１００は、例えば、アッシング、エッチングまたは被膜形成などの表面処理、接着性や濡れ性の改善または表面硬化などの表面改質に用いることができる。 In the embodiment described above, the plasma generator 100 is configured to sterilize against treatment object WK consisting food by irradiating the primary plasma P M. However, the plasma generator 100, non-food article to be treated WK (e.g., medical instruments) may be configured to sterilized by irradiating a primary plasma P M with respect to other than sterilization挿毒it may be irradiated with the main plasma P M with respect to the object to be processed WK purposes. The plasma generator 100 can be used, for example, for surface treatment such as ashing, etching or film formation, improvement of adhesiveness and wettability, and surface modification such as surface hardening.
ＷＫ…被処理物、ＰＰ…予備プラズマ、ＰＭ…主プラズマ、
１００…プラズマ生成装置、
１０１…予備放電電極、１０２…導体、１０３…予備放電用誘電体、１０４…共通放電電極、１０４ａ…主電極対向面、１０５…電極収容部、１０５ａ…セラミック接着剤、１０６…プラズマガス出力口、
１１０…プラズマガスジャケット、１１１，１１２…多孔体、１１１ａ，１１２ａ…貫通孔、１１３…スペーサ、１１４…ジャケット覆い体、１１５…導入路、１１６…冷却器取付部、１１７ａ…第１取付孔、１１７ｂ…第２取付孔、１１８…冷却器、１１８ａ…配管、
１２０…主放電電極、１２０ａ…共通電極対向面、１２１…第２プラズマガス出力口、１２２…第２プラズマガスジャケット、１２３，１２４…第２多孔体、１２３ａ，１２４ａ…貫通孔、１２５…スペーサ、１２６…第２ジャケット覆い体、１２７…導入路、
１３０…電極支持体、１３１…共通電極支持体、１３１ａ…貫通孔、１３２…主電極支持体、１３２ａ…貫通孔、１３３…支柱、
１４０…主放電用誘電体、
１５０…予備放電電源、１５１…アース、１５２…主放電電源。 WK ... the object to be treated, P P ... preliminary plasma, P M ... main plasma,
100 ... Plasma generator,
101 ... preliminary discharge electrode, 102 ... conductor, 103 ... preliminary discharge dielectric, 104 ... common discharge electrode, 104a ... main electrode facing surface, 105 ... electrode housing, 105a ... ceramic adhesive, 106 ... plasma gas output port,
110 ... Plasma gas jacket, 111, 112 ... Porous body, 111a, 112a ... Through hole, 113 ... Spacer, 114 ... Jacket cover, 115 ... Introduction path, 116 ... Cooler mounting part, 117a ... First mounting hole, 117b ... second mounting hole, 118 ... cooler, 118a ... piping,
120 ... main discharge electrode, 120a ... common electrode facing surface, 121 ... second plasma gas output port, 122 ... second plasma gas jacket, 123, 124 ... second porous body, 123a, 124a ... through hole, 125 ... spacer, 126 ... 2nd jacket cover, 127 ... Introduction path,
130 ... Electrode support, 131 ... Common electrode support, 131a ... Through hole, 132 ... Main electrode support, 132a ... Through hole, 133 ... Support,
140 ... Dielectric for main discharge,
150 ... preliminary discharge power supply, 151 ... ground, 152 ... main discharge power supply.

Claims (8)

  1. 　長尺に延びる導体を誘電体で覆った予備放電電極と、
    　前記予備放電電極に隣接配置されて同予備放電電極に沿って延びる共通放電電極と、
    　前記予備放電電極と前記共通放電電極との間に交流電圧を印加して予備プラズマを発生させるための予備放電電源と、
    　前記共通放電電極に対して前記予備放電電極よりも離れた位置に前記共通放電電極および前記予備放電電極にそれぞれ対向した状態で延びる主放電電極と、
    　前記主放電電極と前記予備放電電極および前記共通放電電極との間に配置されて前記予備放電電極、前記共通放電電極および前記主放電電極に沿って延びる誘電体からなる主放電用誘電体と、
    　前記主放電電極と前記共通放電電極との間に交流電圧を印加して主プラズマを発生させるための主放電電源とを備え、
    　前記共通放電電極は、
    　前記予備放電電極に隣接する位置に同予備放電電極の延びる方向に沿ってプラズマガスを出力させるプラズマガス出力口を備えることを特徴とするプラズマ生成装置。     A pre-discharge electrode with a long conductor covered with a dielectric,
    A common discharge electrode arranged adjacent to the preliminary discharge electrode and extending along the preliminary discharge electrode,
    A pre-discharge power supply for applying an AC voltage between the pre-discharge electrode and the common discharge electrode to generate a pre-plasma,
    A main discharge electrode extending at a position distant from the pre-discharge electrode with respect to the common discharge electrode while facing the common discharge electrode and the pre-discharge electrode, respectively.
    A main discharge dielectric, which is arranged between the main discharge electrode, the pre-discharge electrode, and the common discharge electrode, and is composed of the pre-discharge electrode, the common discharge electrode, and a dielectric extending along the main discharge electrode.
    A main discharge power source for applying an AC voltage between the main discharge electrode and the common discharge electrode to generate a main plasma is provided.
    The common discharge electrode is
    A plasma generation device including a plasma gas output port for outputting plasma gas along the extending direction of the preliminary discharge electrode at a position adjacent to the preliminary discharge electrode.
  2. 　請求項１に記載したプラズマ生成装置において、
    　前記プラズマガス出力口は、
    　前記予備放電電極の両側にそれぞれ形成されていることを特徴とするプラズマ生成装置。     In the plasma generator according to claim 1,
    The plasma gas output port is
    A plasma generator characterized in that it is formed on both sides of the preliminary discharge electrode.
  3. 　請求項１または請求項２に記載したプラズマ生成装置において、
    　前記プラズマガス出力口は、
    　前記予備放電電極の延びる方向に沿って形成された複数の孔で構成されていることを特徴とするプラズマ生成装置。     In the plasma generator according to claim 1 or 2.
    The plasma gas output port is
    A plasma generator characterized by being composed of a plurality of holes formed along the extending direction of the pre-discharge electrode.
  4. 　請求項３に記載したプラズマ生成装置において、
    　前記プラズマガス出力口は、
    　前記予備放電電極の両側にそれぞれ形成されているとともに、前記両側のうちの一方側の前記プラズマガス出力口を構成する各孔は他方側の前記プラズマガス出力口を構成する各孔に対してずれた位置にそれぞれ形成されていることを特徴とするプラズマ生成装置。     In the plasma generator according to claim 3,
    The plasma gas output port is
    Each of the holes forming the plasma gas output port on one side of the two sides is displaced from each hole forming the plasma gas output port on the other side, as well as being formed on both sides of the preliminary discharge electrode. A plasma generator characterized in that it is formed at each position.
  5. 　請求項１ないし請求項４のうちのいずれか１つに記載したプラズマ生成装置において、さらに、
    　前記プラズマガス出力口に面した状態で同プラズマガス出力口に供給される前記プラズマガスを一時的に貯留するプラズマガスジャケットを備えることを特徴とするプラズマ生成装置。     In the plasma generator according to any one of claims 1 to 4, further
    A plasma generation device including a plasma gas jacket that temporarily stores the plasma gas supplied to the plasma gas output port while facing the plasma gas output port.
  6. 　請求項５に記載したプラズマ生成装置において、さらに、
    　前記プラズマガスジャケットは、
    　多数の貫通孔を有した多孔体を有しており、前記プラズマガスを前記多孔体を介して前記プラズマガス出力口に導くことを特徴とするプラズマ生成装置。     In the plasma generator according to claim 5, further
    The plasma gas jacket is
    A plasma generation device having a porous body having a large number of through holes, and guiding the plasma gas to the plasma gas output port via the porous body.
  7. 　請求項１ないし請求項６のうちのいずれか１つに記載したプラズマ生成装置において、さらに、
    　前記プラズマガスジャケットに隣接して設けられて同プラズマガスジャケット内の前記プラズマガスを冷却する冷却器を備えることを特徴とするプラズマ生成装置。     In the plasma generator according to any one of claims 1 to 6, further
    A plasma generation device provided adjacent to the plasma gas jacket and provided with a cooler for cooling the plasma gas in the plasma gas jacket.
  8. 　請求項１ないし請求項７のうちのいずれか１つに記載したプラズマ生成装置において、
    　前記主放電電極は、
    　前記主放電用誘電体に向けて前記プラズマガスを出力させる第２プラズマガス出力口を備えることを特徴とするプラズマ生成装置。     In the plasma generator according to any one of claims 1 to 7.
    The main discharge electrode is
    A plasma generation device including a second plasma gas output port that outputs the plasma gas toward the main discharge dielectric.
PCT/JP2020/017916 2019-05-08 2020-04-27 Plasma generating device WO2020226086A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2020541606A JP6782952B1 (en) 2019-05-08 2020-04-27 Plasma generator

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019-087983 2019-05-08
JP2019087983 2019-05-08

Publications (1)

Publication Number Publication Date
WO2020226086A1 true WO2020226086A1 (en) 2020-11-12

Family

ID=73050600

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2020/017916 WO2020226086A1 (en) 2019-05-08 2020-04-27 Plasma generating device

Country Status (1)

Country Link
WO (1) WO2020226086A1 (en)

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000167336A (en) * 1998-12-04 2000-06-20 Fuji Electric Co Ltd Method and apparatus for decomposing organic matter in exhaust gas by pulse corona discharge
JP2002151295A (en) * 2000-11-13 2002-05-24 Yaskawa Electric Corp Discharge generating device
JP2007294414A (en) * 2006-04-24 2007-11-08 New Power Plasma Co Ltd Inductively coupled plasma reactor coupled with multiplex magnetic core
JP2007317501A (en) * 2006-05-25 2007-12-06 Sharp Corp Atmospheric pressure plasma processing device
JP2013089285A (en) * 2011-10-13 2013-05-13 Hitachi Ltd Plasma processing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000167336A (en) * 1998-12-04 2000-06-20 Fuji Electric Co Ltd Method and apparatus for decomposing organic matter in exhaust gas by pulse corona discharge
JP2002151295A (en) * 2000-11-13 2002-05-24 Yaskawa Electric Corp Discharge generating device
JP2007294414A (en) * 2006-04-24 2007-11-08 New Power Plasma Co Ltd Inductively coupled plasma reactor coupled with multiplex magnetic core
JP2007317501A (en) * 2006-05-25 2007-12-06 Sharp Corp Atmospheric pressure plasma processing device
JP2013089285A (en) * 2011-10-13 2013-05-13 Hitachi Ltd Plasma processing apparatus

Similar Documents

Publication Publication Date Title
JP5926775B2 (en) Plasma generator, sterilizer equipped with plasma generator and use of plasma generator
CN103619712B (en) The sterilization of packaging article
KR101824805B1 (en) Plasma Sterilize
KR101948063B1 (en) Plasma Sterilize
US9849202B2 (en) Plasma pouch
JP6998806B2 (en) Gas plasma sterilization equipment
JP6621036B2 (en) Plasma generator
JP6782952B1 (en) Plasma generator
WO2020226086A1 (en) Plasma generating device
WO2021261286A1 (en) Plasma generation device
KR20220016857A (en) Plasma Surface Sterilizer and Related Methods
JP7058032B1 (en) Plasma generator
WO2021059784A1 (en) Plasma generation device
WO2022091730A1 (en) Plasma generation device
US20050019025A1 (en) Product stream heater
CN113117109B (en) System and method for quickly killing surface pathogenic microorganisms by array jet plasma
CN110572924B (en) Plasma system for rolling fruit and vegetable surface microorganism control
JP2004248989A (en) Plasma sterilizing device
JP2005278809A (en) Sterilizer utilizing high voltage
JP2006239230A (en) Sterilizing apparatus and method using barrier discharge
KR20190083116A (en) Sterilizer using plasma and plasma generator
WO2022070347A1 (en) Freshness-keeping device and panel attachment structure
WO2023127836A1 (en) Gas treatment device and gas treatment method
WO2020250787A1 (en) Plasma generation device
JP2015217028A (en) Plasma sterilizer

Legal Events

Date Code Title Description
ENP Entry into the national phase

Ref document number: 2020541606

Country of ref document: JP

Kind code of ref document: A

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20802449

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20802449

Country of ref document: EP

Kind code of ref document: A1