WO2020214015A1 - Dual-polarized base station antenna radiator - Google Patents

Dual-polarized base station antenna radiator Download PDF

Info

Publication number
WO2020214015A1
WO2020214015A1 PCT/KR2020/095071 KR2020095071W WO2020214015A1 WO 2020214015 A1 WO2020214015 A1 WO 2020214015A1 KR 2020095071 W KR2020095071 W KR 2020095071W WO 2020214015 A1 WO2020214015 A1 WO 2020214015A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
metal pattern
base station
station antenna
radiator
Prior art date
Application number
PCT/KR2020/095071
Other languages
French (fr)
Korean (ko)
Inventor
김호용
태재훈
곽은혁
엥흐바야르바양뭉흐
Original Assignee
주식회사 에이스테크놀로지
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 에이스테크놀로지 filed Critical 주식회사 에이스테크놀로지
Publication of WO2020214015A1 publication Critical patent/WO2020214015A1/en

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/12—Supports; Mounting means
    • H01Q1/22—Supports; Mounting means by structural association with other equipment or articles
    • H01Q1/24—Supports; Mounting means by structural association with other equipment or articles with receiving set
    • H01Q1/241—Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM
    • H01Q1/246—Supports; Mounting means by structural association with other equipment or articles with receiving set used in mobile communications, e.g. GSM specially adapted for base stations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/44—Details of, or arrangements associated with, antennas using equipment having another main function to serve additionally as an antenna, e.g. means for giving an antenna an aesthetic aspect
    • H01Q1/46—Electric supply lines or communication lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q21/00—Antenna arrays or systems
    • H01Q21/24—Combinations of antenna units polarised in different directions for transmitting or receiving circularly and elliptically polarised waves or waves linearly polarised in any direction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q9/00—Electrically-short antennas having dimensions not more than twice the operating wavelength and consisting of conductive active radiating elements
    • H01Q9/04—Resonant antennas
    • H01Q9/0407—Substantially flat resonant element parallel to ground plane, e.g. patch antenna

Definitions

  • the present invention relates to a base station antenna radiator, and more particularly, to a base station antenna radiator having a double polarization structure.
  • the base station antenna is an antenna installed in the base station that transmits and receives signals to and from terminals within a preset radius.
  • Conventional base station antennas generally transmit and receive signals in a relatively low frequency band, and thus have a relatively large size.
  • Massive MIMO antenna is a technology that integrates active modules for each radiator and increases the capacity of the system through digital beamforming.
  • the active module is also integrated with radiators, calibration networks and filters.
  • a miniaturized size and low profile are required, and conventionally, a microstrip patch radiator using L-probe feed is used for this structure, but the L-probe feeding is a divider using a delay line having a phase difference of 180 degrees. There is a problem in that it does not have a stable polarization characteristic with respect to the frequency to use.
  • the present invention proposes a dual polarized base station antenna radiator that provides stable polarization characteristics with respect to frequency.
  • a power supply line is formed on the upper surface, and a'c' shape or a'C' shape first metal pattern and a second metal pattern are formed on the lower surface, A first substrate placed perpendicular to the reflector; A second substrate having a power supply line formed on the upper surface, a first metal pattern and a second metal pattern having a'c' shape or a'C' shape on the lower surface, and being perpendicular to the reflector and perpendicular to the first substrate ; And a third substrate coupled to the vertically placed first and second substrates and positioned parallel to the reflector and having a radiation patch formed on an upper surface thereof, wherein the first substrate and the second substrate The metal pattern is electrically connected to the radiation patch through the hole formed in the third substrate, the first metal pattern and the second metal pattern are disposed to be spaced apart while openings are formed in opposite directions, and the power supply line is A radiator of the base station antenna that provides a feed signal to the second metal pattern through
  • the first substrate and the second substrate include a first protrusion protruding upward, and a first extension part of the first metal pattern is formed on the first protrusion to be electrically connected to the radiation patch.
  • the first substrate and the second substrate include a second protrusion protruding downward, a second extension of the first metal pattern is formed on the second protrusion, and the second extension is electrically connected to a ground.
  • a +45 degree polarized signal is supplied to the power supply line of the first substrate, and a -45 degree polarized signal is supplied to the power supply line of the second substrate.
  • a third metal pattern having the same shape as the first metal pattern and a fourth metal pattern having the same shape as the second metal pattern are further formed on each of the first and second substrates, and the fourth metal pattern Is connected to the feed line through the via hole to receive a feed signal.
  • the third metal pattern and the fourth metal pattern are disposed to be spaced apart while openings are formed in opposite directions.
  • a feed line and a'c'-shaped or'C'-shaped second metal pattern are formed on the upper surface, and a'c'-shaped or'C'-shaped first metal pattern is formed on the lower surface.
  • a power supply line and a'c'-shaped or'C'-shaped second metal pattern is formed on the upper surface, and a'c'-shaped or'C'-shaped first metal pattern is formed on the lower surface, and is placed perpendicular to the reflector.
  • the metal pattern is electrically connected to the radiation patch through the hole formed in the third substrate, the first metal pattern and the second metal pattern have openings formed in opposite directions, and the power supply line is the second metal
  • a radiator of a base station antenna is provided that is coupled to the pattern to provide a feed signal.
  • the dual polarization base station antenna radiator of the present invention can provide stable polarization characteristics with respect to frequency.
  • FIG. 1 is a perspective view showing the structure of a base station antenna radiator according to an embodiment of the present invention.
  • FIG 2 is a perspective view of a state in which the upper third substrate is removed from the base station antenna radiator according to an embodiment of the present invention.
  • FIG 3 is a view showing a top surface structure of a first substrate according to a first embodiment of the present invention.
  • FIG 4 is a view showing the structure of the lower surface of the first substrate according to the first embodiment of the present invention.
  • FIG. 5 is a view showing a top surface structure of a first substrate according to a second embodiment of the present invention.
  • FIG. 6 is a view showing a structure of a lower surface of a first substrate according to a second embodiment of the present invention.
  • Fig. 7 is a diagram showing the top surface structure of a second substrate according to the first embodiment of the present invention.
  • FIG. 8 is a view showing a structure of a lower surface of a second substrate according to the first embodiment of the present invention.
  • FIG. 9 is a view showing the top surface structure of a second substrate according to a second embodiment of the present invention.
  • FIG. 10 is a view showing a structure of a lower surface of a second substrate according to a second embodiment of the present invention.
  • FIG. 11 is a perspective view showing the structure of a third substrate according to an embodiment of the present invention.
  • FIG. 12 is a diagram showing the structure of a base station antenna using a radiator of the base station antenna according to an embodiment of the present invention.
  • FIG. 1 is a perspective view showing the structure of a base station antenna radiator according to an embodiment of the present invention
  • FIG. 2 is a perspective view of a state in which an upper third substrate is removed from the base station antenna radiator according to an embodiment of the present invention.
  • a base station antenna includes a first substrate 100, a second substrate 110, and a third substrate 120.
  • the third substrate 120 functions as a radiator of a base station antenna according to an embodiment of the present invention, and a radiation patch 125 for radiating an RF signal is formed on the third substrate 120.
  • the radiation patch 125 is formed on the upper surface of the third substrate 120, and for example, a rectangular patch is formed.
  • the shape of the patch is not limited to a square, and may have various shapes based on a required radiation pattern and a resonance frequency.
  • a radiation patch 125 is formed on the third substrate 120, but a separate element is not formed on the lower surface of the third substrate 120. That is, the lower portion of the third substrate 120 is made of a dielectric material.
  • the first substrate 100 and the second substrate 110 function as elements that provide a feed signal to the radiation patch 125 and perform impedance matching.
  • the first substrate 100 and the second substrate 110 are vertically placed on a reflector (not shown) of the base station antenna, and a feed signal is provided to the first substrate 100 and the second substrate 110.
  • the first substrate 100 and the second substrate are vertically placed on a reflector (not shown) so as to cross each other to form a cross shape.
  • a groove for crossing the second substrate 110 in a cross shape may be formed in the first substrate 100.
  • the third substrate 120 is positioned parallel to the reflector (not shown) while being coupled to the first substrate 100 and the second substrate 110.
  • Metal patterns for supplying a +45 degree polarized signal to the radiation patch 125 and impedance matching are formed on the upper and lower surfaces of the first substrate 100. Further, metal patterns for supplying a -45 degree polarized signal to the radiation patch 125 and impedance matching are formed on the upper and lower surfaces of the second substrate 110.
  • the metal patterns formed on the first substrate 100 and the second substrate 110 preferably have the same structure, but may have different structures as necessary.
  • the radiation patch 125 formed on the third substrate 120 emits a +45 degree polarized signal and a -45 degree polarized signal provided through the first substrate 100 and the second substrate 110, respectively. Since a +45 degree polarized signal and a -45 degree polarized signal are radiated together through one radiation patch 125, there is a problem in that the base station antenna using the existing radiation patch does not sufficiently secure inter-polarization isolation. In addition, in a 5G system transmitting and receiving a broadband signal, the conventional base station antenna has a problem in that it does not provide a stable polarization characteristic for a broadband frequency.
  • the present invention proposes a power supply and impedance matching structure capable of providing stable polarization characteristics in order to solve such a problem, and the power supply and impedance matching structure includes the upper surfaces of the first substrate 100 and the second substrate 110. And formed on the lower surface.
  • the radiator of the base station antenna as shown in FIG. 1 has an arrangement structure in which a plurality of radiators are arranged on a reflector. At this time, signals of different phases are supplied to the radiators of each base station antenna, and a desired radiation pattern is formed through the phase adjustment.
  • a phase shifter may be used to adjust the phase of a signal fed to the radiator of each base station antenna.
  • FIG 3 is a diagram showing a top surface structure of a first substrate according to a first embodiment of the present invention.
  • a feed line 104 is formed on the upper surface of the first substrate 100.
  • the feed line 104 includes a feed point connection part 200, a branch part 210, a first feed line part 220 and a second feed line part 230.
  • the feed point connection part 200 is connected to an external cable or a metal pattern providing a feed signal.
  • the feed point connection unit 200 is connected to the inner core of the coaxial cable.
  • the feed line is divided into two parts, and as shown in FIG. 3, the first feed line part 220 and the second feed line part 230 are separated. From the separating part 210 to each of the first feed line part 220 and the second feed line part 230, it is preferable to configure a feed line so that the directions of currents are opposite to each other.
  • a first via hole 240 and a second via hole 250 are formed at each end of the first feed line part 220 and the second feed line part 230, and the feed signal of the feed line 104 is a first via hole. It is directly provided to the second metal pattern 302 and the fourth metal pattern 306 to be described later through the 240 and the second via hole 250.
  • a direct feeding structure is used for the second metal pattern 302, in order to maintain a stable polarization characteristic for a broadband.
  • the power supply line 104 formed on the first substrate 100 may be formed on the first substrate by various methods such as patterning, etching, and printing.
  • FIG. 4 is a diagram showing a structure of a lower surface of a first substrate according to a first embodiment of the present invention.
  • two metal patterns 300 and 302 spaced apart from each other are formed on the left side of the lower surface of the first substrate 100.
  • the number of metal patterns is not limited to two, and a metal pattern corresponding to a multiple of 2 may be formed on the lower surface of the first substrate 100.
  • the number of metal patterns spaced apart from each other may be 2, 4, or 6.
  • the metal pattern formed under the first substrate 100 has a'C' shape or a'C' shape, and the two metal patterns are disposed to face each other.
  • the first metal pattern 300 has a'C' shape with an opening formed on the left side
  • the second metal pattern 302 has a'C' shape with an opening formed on the right side.
  • the openings of the two metal patterns are formed in opposite directions.
  • the two metal patterns 300 and 302 may form a rectangle having a split structure.
  • the two metal patterns may form a circle having a split structure.
  • the second metal pattern 302 is directly connected to the feed line 104 through the first via hole 240 to receive a feed signal.
  • the first metal pattern 300 spaced apart from the second metal pattern 302 receives a power supply signal from the second metal pattern 302 through coupling.
  • the arrangement of the two metal patterns 300 and 302 so that the openings are in opposite directions is to allow the first metal pattern 300 and the second metal pattern 302 to form currents in the same direction.
  • a current is formed in the clockwise direction in the first metal pattern 300
  • a current is also formed in the clockwise direction in the second metal pattern 302.
  • the via hole 250 must be formed in an appropriate position.
  • a third metal pattern 304 and a fourth metal pattern 306, which are two spaced apart metal patterns, are also formed on the right side of the lower surface of the first substrate 100.
  • the third metal pattern 304 and the fourth metal pattern 306 have a symmetric structure with the first metal pattern 300 and the second metal pattern 302 on the left side.
  • the third metal pattern 304 has a symmetrical structure with the first metal pattern 300
  • the fourth metal pattern 306 has a symmetrical structure with the second metal pattern 302.
  • the metal pattern formed on the right side may also be formed in a multiple of 2 as the left side, and the openings are formed in opposite directions.
  • first metal pattern 300 and the third metal pattern 304 may be electrically connected.
  • the fourth metal pattern 306 receives a feed signal directly from the feed line 104 through the second via hole 250, and the third metal pattern 304 spaced apart from the fourth metal pattern 306 performs coupling.
  • the feed signal is provided through.
  • the magnetic field is strengthened.
  • the strengthened magnetic field strengthens the electric field of each polarization.
  • the improved cross-polarization ratio and inter-polarization isolation, respectively, can be well secured for each frequency and beam direction.
  • a plurality of first protrusions 105 are formed in an upward direction on the first substrate 100, and a plurality of first protrusions 105 extend upward from the first metal pattern 300 and the third metal pattern 304.
  • a plurality of first extensions 108 are formed. The first protrusion 105 and the first extension 108 penetrate through a hole formed in the third substrate, and the first extension 108 is electrically connected to the radiation patch 125 formed on the third substrate 120. Contact.
  • a plurality of second protrusions 106 are formed in a downward direction on the first substrate 100, and a first metal pattern 300 and a third metal pattern are formed on the plurality of second protrusions 106 in a downward direction.
  • a plurality of second extension portions 109 extending downward from 304 are formed.
  • the plurality of protrusions 105 pass through a reflector on which a radiator for a base station antenna according to the present invention is placed, and the second extension 109 is connected to a reflector or an element having the same ground potential as the reflector.
  • FIG. 5 is a diagram showing a top surface structure of a first substrate according to a second embodiment of the present invention.
  • a power supply line 104, a second metal pattern 302, and a fourth metal pattern 306 are formed on an upper surface of the first substrate 100.
  • the feed line 104 includes a feed point connection part 200, a branch part 210, a first feed line part 220 and a second feed line part 230.
  • the second embodiment is different from the first embodiment in that the second metal pattern 302 and the fourth metal pattern 306 are formed on the upper surface of the first substrate rather than the lower surface.
  • the end of the first feed line part 220 is directly connected to the second metal pattern 302, and the end of the second feed line part 230 is directly connected to the fourth metal pattern 306.
  • the shapes of the second metal pattern 302 and the fourth metal pattern 306 are the same as those of the first embodiment.
  • FIG. 6 is a diagram illustrating a structure of a lower surface of a first substrate according to a second embodiment of the present invention.
  • a first metal pattern 300 and a third metal pattern 304 are formed on the lower surface of the first substrate 100.
  • the first metal pattern 300 is formed on the left side of the lower surface of the first substrate 100
  • the third metal pattern 304 is formed on the right side of the lower surface of the first substrate 100.
  • the second metal pattern 302 and the fourth metal pattern 304 are not formed on the lower surface of the first substrate 100.
  • the first and second embodiments differ only in the positions of the second metal pattern 302 and the fourth metal pattern 304, but the operation principle is the same.
  • the first metal pattern 300 receives a feed signal from the second metal pattern 302 through coupling, and the third metal pattern 304 receives a feed signal from the fourth metal pattern 306.
  • FIG. 7 is a diagram showing a structure of an upper surface of a second substrate according to a first embodiment of the present invention
  • FIG. 8 is a view showing a structure of a lower surface of a second substrate according to the first embodiment of the present invention.
  • the lower surface structure of the second substrate according to the first embodiment is the same as the lower surface structure of the first substrate according to the first embodiment, and the first to fourth metal patterns are the same as the first substrate. It can be confirmed that it is formed.
  • the top surface structure of the second substrate according to the first embodiment is also the same as the top surface structure of the first substrate according to the first embodiment.
  • the first substrate and the second substrate have substantially the same structure, and the first substrate forms a good electric field of each polarized wave by strengthening the magnetic field for the +45 degree polarized signal, and then power supply and impedance matching are performed.
  • the substrate performs the supply and impedance matching for the -45 degree single plate signal.
  • the second substrate also includes a plurality of first protrusions 405 and second protrusions 406 protruding upward, and a plurality of first extensions 408 are formed on each of the plurality of first protrusions 405, Each of the second protrusions 406 is formed with a plurality of second extensions.
  • the first extension 408 is electrically connected to the radiation patch 125
  • the second extension 409 is electrically connected to a reflector or an element having the same ground potential as that of the reflector.
  • FIG. 9 is a view showing a structure of a top surface of a second substrate according to a second embodiment of the present invention
  • FIG. 10 is a view showing a structure of a lower surface of a second substrate according to a second embodiment of the present invention.
  • the structure of the upper and lower surfaces of the second substrate according to the second exemplary embodiment is also the same as the upper and lower surfaces of the first substrate according to the second exemplary embodiment.
  • FIG. 11 is a perspective view showing the structure of a third substrate according to an embodiment of the present invention.
  • a radiation patch 125 is formed on a third substrate 120, and a plurality of first protrusions 105 and a second substrate 110 of the first substrate 100 are formed on the third substrate and the radiation patch. ) A hole through which the plurality of first protrusions 405 can pass is formed.
  • a plurality of first protrusions 105 of the first substrate 100 are arranged in a direction of +45 degrees, and a plurality of first protrusions 405 of the second substrate 110 are arranged in a direction of -45 degrees, respectively. It provides a degree polarized signal and a -45 degree polarized signal.
  • the structure in which power is supplied directly to the second metal pattern and the fourth metal pattern, and the first metal pattern and the third metal pattern are fed by coupling can provide stable polarization characteristics for a broadband frequency. There is an advantage that can be effectively used in a 5G base station antenna that requires a low profile.
  • FIG. 12 is a diagram illustrating a structure of a base station antenna using a radiator of the base station antenna according to an embodiment of the present invention.
  • a plurality of radiators are arranged on a reflector 800 of a base station antenna.
  • a +45 degree polarized signal and a -45 degree polarized signal are supplied to each of the plurality of radiators forming the array, and a phase shifter may be used to adjust the phase of the signal supplied to each of the plurality of radiators.
  • each component described as a single type may be implemented in a distributed manner, and similarly, components described as being distributed may also be implemented in a combined form.

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)
  • Waveguide Aerials (AREA)

Abstract

A dual-polarized base station antenna radiator is provided. The disclosed base station antenna radiator comprises: a first substrate placed perpendicularly to a reflector plate, a feeding line being formed on the upper surface of the first substrate, and a first metal pattern and a second metal pattern being formed on the lower surface thereof in "ㄷ" shapes or "C" shapes; a second substrate placed perpendicularly to the reflector plate and perpendicularly to the first substrate, a feeding line being formed on the upper surface of the second substrate, and a first metal pattern and a second metal pattern being formed on the lower surface thereof in "ㄷ" shapes or "C" shapes; and a third substrate coupled to the first substrate and the second substrate placed perpendicularly to each other, the third substrate being positioned parallel to the reflector plate, and a radiation patch being formed on the upper surface of the third substrate. The first metal patterns of the first substrate and the second substrate are electrically connected to the radiation patch through holes formed in the third substrate. The first metal patterns and the second metal patterns have openings formed in opposite directions and disposed to be spaced apart from each other. The feeding line provides a feeding signal to the second metal patterns through via-holes. The disclosed base station antenna radiator may provide stable polarization characteristics with regard to frequencies.

Description

이중 편파 기지국 안테나 방사체Dual polarized base station antenna radiator
본 발명은 기지국 안테나 방사체에 관한 것으로서, 더욱 상세하게는 이중 편파 구조를 가지는 기지국 안테나 방사체에 관한 것이다. The present invention relates to a base station antenna radiator, and more particularly, to a base station antenna radiator having a double polarization structure.
기지국 안테나는 기지국에 설치되어 미리 설정된 반경 내에 있는 단말들과 신호를 송수신하는 안테나이다. 기존의 기지국 안테나들은 비교적 낮은 주파수 대역의 신호를 송수신 하였기에 비교적 큰 사이즈를 가지는 것이 일반적이었다. The base station antenna is an antenna installed in the base station that transmits and receives signals to and from terminals within a preset radius. Conventional base station antennas generally transmit and receive signals in a relatively low frequency band, and thus have a relatively large size.
그러나, 5G 시스템이 도입되면서 비교적 높은 주파수 대역에서 통신이 이루어질 것이 예상되고 매시브(Massive) MIMO가 도입되어 많은 수의 안테나가 기지국에 도입될 것으로 예상되고 있다. However, with the introduction of the 5G system, communication is expected to be performed in a relatively high frequency band, and a large number of antennas are expected to be introduced in the base station due to the introduction of Massive MIMO.
매시브 MIMO 안테나는 각 방사체별로 액티브 모듈을 집적화하고 디지털 빔포밍을 통해 시스템의 용량을 증대시키는 기술이며, 매시브 MIMO 안테나는 방사체, 캘리브레이션 네트워크 및 필터와 함께 액티브 모듈 또한 통합 된다. Massive MIMO antenna is a technology that integrates active modules for each radiator and increases the capacity of the system through digital beamforming. In the massive MIMO antenna, the active module is also integrated with radiators, calibration networks and filters.
매시브 MIMO의 도입 및 밀리미터파 대역에서의 통신이 예상되면서 기지국 안테나에 대한 소형화가 강하게 요구되고 있으며, 기지국 시스템의 물리적 면적이 중요한 경쟁력 중 하나로 평가받고 있다.As the introduction of massive MIMO and communication in the millimeter wave band are expected, miniaturization of the base station antenna is strongly required, and the physical area of the base station system is evaluated as one of important competitiveness.
결국, 소형화된 사이즈와 로우 프로파일이 요구되고 있으며, 종래에는 이러한 구조를 위해 L-프로브 급전을 이용한 마이크로스트립 패치 방사체를 사용하고 있으나 L-프로브 피딩은 위상이 180도 차이를 가지는 지연 선로를 이용한 디바이더를 사용하기에 주파수에 대해 안정적인 편파 특성을 가지지 못하는 문제점이 있었다. In the end, a miniaturized size and low profile are required, and conventionally, a microstrip patch radiator using L-probe feed is used for this structure, but the L-probe feeding is a divider using a delay line having a phase difference of 180 degrees. There is a problem in that it does not have a stable polarization characteristic with respect to the frequency to use.
본 발명은 주파수에 대해 안정적인 편파 특성을 제공하는 이중 편파 기지국 안테나 방사체를 제안한다. The present invention proposes a dual polarized base station antenna radiator that provides stable polarization characteristics with respect to frequency.
상기와 같은 목적을 달성하기 위해, 본 발명의 일 측면에 따르면, 상부면에 급전 선로가 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴 및 제2 금속 패턴이 형성되고 반사판에 대해 수직으로 놓여지는 제1 기판; 상부면에 급전 선로가 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴 및 제2 금속 패턴이 형성되며 상기 반사판에 대해 수직으로 놓이면서 상기 제1 기판과 직교하는 제2 기판; 및 상기 수직으로 놓여진 제1 기판 및 제2 기판상에 결합되며 상기 반사판에 평행하게 위치하고 상부면에 방사 패치가 형성되는 제3 기판을 포함하되, 상기 제1 기판 및 상기 제2 기판의 상기 제1 금속 패턴은 상기 제3기판의 형성된 홀을 통해 상기 방사 패치와 전기적으로 연결되며, 상기 제1 금속 패턴 및 상기 제2 금속 패턴은 개구부가 서로 반대 방향으로 형성되면서 이격되어 배치되고, 상기 급전 선로는 비아홀을 통해 상기 제2 금속 패턴에 급전 신호를 제공하는 기지국 안테나의 방사체가 제공된다. In order to achieve the above object, according to an aspect of the present invention, a power supply line is formed on the upper surface, and a'c' shape or a'C' shape first metal pattern and a second metal pattern are formed on the lower surface, A first substrate placed perpendicular to the reflector; A second substrate having a power supply line formed on the upper surface, a first metal pattern and a second metal pattern having a'c' shape or a'C' shape on the lower surface, and being perpendicular to the reflector and perpendicular to the first substrate ; And a third substrate coupled to the vertically placed first and second substrates and positioned parallel to the reflector and having a radiation patch formed on an upper surface thereof, wherein the first substrate and the second substrate The metal pattern is electrically connected to the radiation patch through the hole formed in the third substrate, the first metal pattern and the second metal pattern are disposed to be spaced apart while openings are formed in opposite directions, and the power supply line is A radiator of the base station antenna that provides a feed signal to the second metal pattern through the via hole is provided.
상기 제1 기판 및 상기 제2 기판은 상향으로 돌출되는 제1 돌출부를 포함하고, 상기 제1 금속 패턴의 제1 연장부가 상기 제1 돌출부에 형성되어 상기 방사 패치에 전기적으로 연결된다. The first substrate and the second substrate include a first protrusion protruding upward, and a first extension part of the first metal pattern is formed on the first protrusion to be electrically connected to the radiation patch.
상기 제1 기판 및 상기 제2 기판은 하향으로 돌출되는 제2 돌출부를 포함하고, 상기 제1 금속 패턴의 제2 연장부가 상기 제2 돌출부에 형성되고 상기 제2 연장부는 접지와 전기적으로 연결된다. The first substrate and the second substrate include a second protrusion protruding downward, a second extension of the first metal pattern is formed on the second protrusion, and the second extension is electrically connected to a ground.
상기 제1 기판의 급전 선로에는 +45도 편파 신호가 급전되고, 상기 제2 기판의 급전 선로에는 -45도 편파 신호가 급전된다. A +45 degree polarized signal is supplied to the power supply line of the first substrate, and a -45 degree polarized signal is supplied to the power supply line of the second substrate.
상기 제1 기판 및 상기 제2 기판 각각에는 상기 제1 금속 패턴과 동일한 형태를 가지는 제3 금속 패턴 및 상기 제2 금속 패턴과 동일한 형태를 가지는 제4 금속 패턴이 더 형성되고, 상기 제4 금속 패턴은 상기 급전 선로와 비아홀을 통해 연결되어 급전 신호를 제공받는다. A third metal pattern having the same shape as the first metal pattern and a fourth metal pattern having the same shape as the second metal pattern are further formed on each of the first and second substrates, and the fourth metal pattern Is connected to the feed line through the via hole to receive a feed signal.
상기 제3 금속 패턴 및 상기 제4 금속 패턴은 개구부가 서로 반대 방향으로 형성되면서 이격되어 배치된다. The third metal pattern and the fourth metal pattern are disposed to be spaced apart while openings are formed in opposite directions.
본 발명의 다른 측면에 따르면, 상부면에 급전 선로 및 'ㄷ'자형 또는 'C'자형의 제2 금속 패턴이 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴이 형성되며 반사판에 대해 수직으로 놓여지는 제1 기판; 상부면에 급전 선로 및 'ㄷ'자형 또는 'C'자형의 제2 금속 패턴이 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴이 형성되며 상기 반사판에 대해 수직으로 놓이면서 상기 제1 기판과 직교하는 제2 기판; 및 상기 수직으로 놓여진 제1 기판 및 제2 기판상에 결합되며 상기 반사판에 평행하게 위치하고 상부면에 방사 패치가 형성되는 제3 기판을 포함하되, 상기 제1 기판 및 상기 제2 기판의 상기 제1 금속 패턴은 상기 제3기판의 형성된 홀을 통해 상기 방사 패치와 전기적으로 연결되며, 상기 제1 금속 패턴 및 상기 제2 금속 패턴은 개구부가 서로 반대 방향으로 형성되며, 상기 급전 선로는 상기 제2 금속 패턴에 결합되어 급전 신호를 제공하는 기지국 안테나의 방사체가 제공된다. According to another aspect of the present invention, a feed line and a'c'-shaped or'C'-shaped second metal pattern are formed on the upper surface, and a'c'-shaped or'C'-shaped first metal pattern is formed on the lower surface. A first substrate that is placed perpendicular to the reflector; A power supply line and a'c'-shaped or'C'-shaped second metal pattern is formed on the upper surface, and a'c'-shaped or'C'-shaped first metal pattern is formed on the lower surface, and is placed perpendicular to the reflector. A second substrate orthogonal to the first substrate; And a third substrate coupled to the vertically placed first and second substrates and positioned parallel to the reflector and having a radiation patch formed on an upper surface thereof, wherein the first substrate and the second substrate The metal pattern is electrically connected to the radiation patch through the hole formed in the third substrate, the first metal pattern and the second metal pattern have openings formed in opposite directions, and the power supply line is the second metal A radiator of a base station antenna is provided that is coupled to the pattern to provide a feed signal.
본 발명의 이중 편파 기지국 안테나 방사체는 주파수에 대해 안정적인 편파 특성을 제공할 수 있다. The dual polarization base station antenna radiator of the present invention can provide stable polarization characteristics with respect to frequency.
도 1은 본 발명의 일 실시예에 따른 기지국 안테나 방사체의 구조를 도시한 사시도.1 is a perspective view showing the structure of a base station antenna radiator according to an embodiment of the present invention.
도 2는 본 발명의 일 실시예에 따른 기지국 안테나 방사체에서 상부의 제 3기판을 제거한 상태의 사시도.2 is a perspective view of a state in which the upper third substrate is removed from the base station antenna radiator according to an embodiment of the present invention.
도 3은 본 발명의 제1 실시예에 따른 제1 기판의 상부면 구조를 도시한 도면.3 is a view showing a top surface structure of a first substrate according to a first embodiment of the present invention.
도 4는 본 발명의 제1 실시예에 따른 제1 기판의 하부면 구조를 도시한 도면.4 is a view showing the structure of the lower surface of the first substrate according to the first embodiment of the present invention.
도 5는 본 발명의 제2 실시예에 따른 제1 기판의 상부면 구조를 도시한 도면.5 is a view showing a top surface structure of a first substrate according to a second embodiment of the present invention.
도 6은 본 발명의 제2 실시예에 따른 제1 기판의 하부면 구조를 도시한 도면.6 is a view showing a structure of a lower surface of a first substrate according to a second embodiment of the present invention.
도7은 본 발명의 제1 실시예에 따른 제2 기판의 상부면 구조를 도시한 도면.Fig. 7 is a diagram showing the top surface structure of a second substrate according to the first embodiment of the present invention.
도 8은 본 발명의 제1 실시예에 따른 제2 기판의 하부면 구조를 도시한 도면.8 is a view showing a structure of a lower surface of a second substrate according to the first embodiment of the present invention.
도9는 본 발명의 제2 실시예에 따른 제2 기판의 상부면 구조를 도시한 도면.9 is a view showing the top surface structure of a second substrate according to a second embodiment of the present invention.
도 10은 본 발명의 제2 실시예에 따른 제2 기판의 하부면 구조를 도시한 도면.10 is a view showing a structure of a lower surface of a second substrate according to a second embodiment of the present invention.
도 11은 본 발명의 일 실시예에 따른 제3 기판의 구조를 나타낸 사시도.11 is a perspective view showing the structure of a third substrate according to an embodiment of the present invention.
도 12는 본 발명의 일 실시예에 따른 기지국 안테나의 방사체를 사용하는 기지국 안테나의 구조를 도시한 도면.12 is a diagram showing the structure of a base station antenna using a radiator of the base station antenna according to an embodiment of the present invention.
이하에서는 첨부한 도면을 참조하여 본 발명을 설명하기로 한다. 그러나 본 발명은 여러 가지 상이한 형태로 구현될 수 있으며, 따라서 여기에서 설명하는 실시예로 한정되는 것은 아니다.Hereinafter, the present invention will be described with reference to the accompanying drawings. However, the present invention may be implemented in various different forms, and therefore is not limited to the embodiments described herein.
그리고 도면에서 본 발명을 명확하게 설명하기 위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 유사한 부분에 대해서는 유사한 도면 부호를 붙였다.In the drawings, parts irrelevant to the description are omitted in order to clearly describe the present invention, and similar reference numerals are assigned to similar parts throughout the specification.
명세서 전체에서, 어떤 부분이 다른 부분과 "연결"되어 있다고 할 때, 이는 "직접적으로 연결"되어 있는 경우뿐 아니라, 그 중간에 다른 부재를 사이에 두고 "간접적으로 연결"되어 있는 경우도 포함한다.Throughout the specification, when a part is said to be "connected" to another part, this includes not only "directly connected" but also "indirectly connected" with another member interposed therebetween. .
또한 어떤 부분이 어떤 구성 요소를 "포함"한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성 요소를 제외하는 것이 아니라 다른 구성 요소를 더 구비할 수 있다는 것을 의미한다.In addition, when a certain part "includes" a certain component, it means that other components may be further provided without excluding other components unless otherwise specified.
이하 첨부된 도면을 참고하여 본 발명의 실시예를 상세히 설명하기로 한다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 1은 본 발명의 일 실시예에 따른 기지국 안테나 방사체의 구조를 도시한 사시도이고, 도 2는 본 발명의 일 실시예에 따른 기지국 안테나 방사체에서 상부의 제 3기판을 제거한 상태의 사시도이다. 1 is a perspective view showing the structure of a base station antenna radiator according to an embodiment of the present invention, and FIG. 2 is a perspective view of a state in which an upper third substrate is removed from the base station antenna radiator according to an embodiment of the present invention.
도 1을 참조하면, 본 발명의 일 실시예에 따른 기지국 안테나는 제1 기판(100), 제2 기판(110) 및 제3 기판(120)을 포함한다. Referring to FIG. 1, a base station antenna according to an embodiment of the present invention includes a first substrate 100, a second substrate 110, and a third substrate 120.
제3 기판(120)은 본 발명의 일 실시예에 따른 기지국 안테나의 방사체로서 기능하며, 제3 기판(120)에는 RF 신호의 방사를 위한 방사 패치(125)가 형성된다. The third substrate 120 functions as a radiator of a base station antenna according to an embodiment of the present invention, and a radiation patch 125 for radiating an RF signal is formed on the third substrate 120.
도 1을 참조하면 방사 패치(125)는 제3 기판(120)의 상부면에 형성되며, 일례로 사각형 형태의 패치가 형성되어 있다. 여기서 패치의 형태는 사각형에 국한되는 것은 아니며, 요구되는 방사 패턴 및 공진 주파수에 기초하여 다양한 형태를 가질 수 있다. Referring to FIG. 1, the radiation patch 125 is formed on the upper surface of the third substrate 120, and for example, a rectangular patch is formed. Here, the shape of the patch is not limited to a square, and may have various shapes based on a required radiation pattern and a resonance frequency.
제3 기판(120)의 상부에는 방사 패치(125)가 형성되지만, 제3 기판(120)의 하부면에는 별도의 엘리먼트가 형성되지 않는다. 즉, 제3 기판(120)의 하부는 유전체 재질로 이루어지는 것이다. A radiation patch 125 is formed on the third substrate 120, but a separate element is not formed on the lower surface of the third substrate 120. That is, the lower portion of the third substrate 120 is made of a dielectric material.
제1 기판(100) 및 제2 기판(110)은 방사 패치(125)에 급전 신호를 제공하고 임피던스 매칭을 수행하는 엘리먼트로 기능한다. The first substrate 100 and the second substrate 110 function as elements that provide a feed signal to the radiation patch 125 and perform impedance matching.
제1 기판(100) 및 제2 기판(110)은 기지국 안테나의 반사판(미도시)에 수직으로 놓여지며, 제1 기판(100) 및 제2 기판(110)으로는 급전 신호가 제공된다. 도 2를 참조하면 제1 기판(100) 및 제2 기판은 상호 교차하여 십자 형태를 이루도록 반사판(미도시)상에 수직으로 놓여진다. 일례로, 제1 기판(100)에는 제2 기판(110)이 십자 형태로 교차하도록 하기 위한 홈이 형성될 수 있다. 한편, 제3 기판(120)은 제1 기판(100) 및 제2 기판(110) 상부에 결합되면서 반사판(미도시)과는 평행하게 위치한다. The first substrate 100 and the second substrate 110 are vertically placed on a reflector (not shown) of the base station antenna, and a feed signal is provided to the first substrate 100 and the second substrate 110. Referring to FIG. 2, the first substrate 100 and the second substrate are vertically placed on a reflector (not shown) so as to cross each other to form a cross shape. For example, a groove for crossing the second substrate 110 in a cross shape may be formed in the first substrate 100. Meanwhile, the third substrate 120 is positioned parallel to the reflector (not shown) while being coupled to the first substrate 100 and the second substrate 110.
제1 기판(100)의 상부면 및 하부면에는 방사 패치(125)로의 +45도 편파 신호의 급전 및 임피던스 매칭을 위한 금속 패턴이 형성된다. 또한, 제2 기판(110)의 상부면 및 하부면에는 방사 패치(125)로의 -45도 편파 신호의 급전 및 임피던스 매칭을 위한 금속 패턴이 형성된다. Metal patterns for supplying a +45 degree polarized signal to the radiation patch 125 and impedance matching are formed on the upper and lower surfaces of the first substrate 100. Further, metal patterns for supplying a -45 degree polarized signal to the radiation patch 125 and impedance matching are formed on the upper and lower surfaces of the second substrate 110.
제1 기판(100) 및 제2 기판(110)에 형성되는 금속 패턴은 서로 동일한 구조를 가지는 것이 바람직하나 필요에 따라 서로 다른 구조를 가질 수도 있을 것이다. The metal patterns formed on the first substrate 100 and the second substrate 110 preferably have the same structure, but may have different structures as necessary.
제3 기판(120)에 형성되는 방사 패치(125)는 제1 기판(100) 및 제2 기판(110)을 통해 제공되는 +45도 편파 신호 및 -45도 편파 신호를 각각 방사한다. 하나의 방사 패치(125)를 통해 +45도 편파 신호 및 -45도 편파 신호를 함께 방사하기 때문에 기존의 방사 패치를 이용하는 기지국 안테나는 편파간 아이솔레이션이 충분히 확보되지 못하는 문제점이 있었다. 또한, 광대역 신호를 송수신하는 5G 시스템에서, 기존의 기지국 안테나는 광대역의 주파수에 대해 안정적인 편파 특성을 제공하지 못하는 문제점이 있었다. The radiation patch 125 formed on the third substrate 120 emits a +45 degree polarized signal and a -45 degree polarized signal provided through the first substrate 100 and the second substrate 110, respectively. Since a +45 degree polarized signal and a -45 degree polarized signal are radiated together through one radiation patch 125, there is a problem in that the base station antenna using the existing radiation patch does not sufficiently secure inter-polarization isolation. In addition, in a 5G system transmitting and receiving a broadband signal, the conventional base station antenna has a problem in that it does not provide a stable polarization characteristic for a broadband frequency.
본 발명은 이와 같은 문제점을 해결하기 위해 안정적인 편파 특성을 제공할 수 있는 급전 및 임피던스 매칭 구조를 제안하며, 이러한 급전 및 임피던스 매칭 구조는 제1 기판(100) 및 제2 기판(110)의 상부면 및 하부면에 형성된다. The present invention proposes a power supply and impedance matching structure capable of providing stable polarization characteristics in order to solve such a problem, and the power supply and impedance matching structure includes the upper surfaces of the first substrate 100 and the second substrate 110. And formed on the lower surface.
한편, 도 1에 도시된 바와 같은 기지국 안테나의 방사체는 반사판상에 다수개가 배열되는 배열 구조를 가진다. 이때, 각 기지국 안테나의 방사체로는 서로 다른 위상의 신호가 급전되며, 이러한 위상 조절을 통해 원하는 방사 패턴을 형성하게 된다. 각 기지국 안테나의 방사체로 급전되는 신호의 위상의 조절을 위해 페이즈 쉬프터가 사용될 수 있다. Meanwhile, the radiator of the base station antenna as shown in FIG. 1 has an arrangement structure in which a plurality of radiators are arranged on a reflector. At this time, signals of different phases are supplied to the radiators of each base station antenna, and a desired radiation pattern is formed through the phase adjustment. A phase shifter may be used to adjust the phase of a signal fed to the radiator of each base station antenna.
도 3은 본 발명의 제1 실시예에 따른 제1 기판의 상부면 구조를 도시한 도면이다. 3 is a diagram showing a top surface structure of a first substrate according to a first embodiment of the present invention.
도 3을 참조하면, 제1 기판(100)의 상부면에는 급전 선로(104)가 형성된다. 급전 선로(104)는 급전점 연결부(200), 분기부(210), 제1 급전 선로부(220) 및 제2 급전 선로부(230)를 포함한다. Referring to FIG. 3, a feed line 104 is formed on the upper surface of the first substrate 100. The feed line 104 includes a feed point connection part 200, a branch part 210, a first feed line part 220 and a second feed line part 230.
급전점 연결부(200)는 급전 신호를 제공하는 외부 케이블 또는 금속 패턴과 연결된다. 예를 들어, 동축 케이블을 통해 급전 신호가 제공되는 경우 급전점 연결부(200)는 동축 케이블의 내심과 연결된다. The feed point connection part 200 is connected to an external cable or a metal pattern providing a feed signal. For example, when a feed signal is provided through a coaxial cable, the feed point connection unit 200 is connected to the inner core of the coaxial cable.
분기부(210)에서 급전 선로는 두 개의 파트로 분리되며, 도 3에 도시된 바와 같이, 제1 급전 선로부(220)와 제2 급전 선로부(230)로 분리된다. 상기 분리부(210)로 부터제1 급전 선로부(220)와 제2 급전 선로부(230) 각각으로는 전류의 방향이 서로 반대가 되도록 급전선로를 구성되는 것이 바람직하다. In the branch part 210, the feed line is divided into two parts, and as shown in FIG. 3, the first feed line part 220 and the second feed line part 230 are separated. From the separating part 210 to each of the first feed line part 220 and the second feed line part 230, it is preferable to configure a feed line so that the directions of currents are opposite to each other.
제1 급전 선로부(220)와 제2 급전 선로부(230)의 종단 각각에는 제1 비아홀(240) 및 제2 비아홀 (250)이 형성되고, 급전 선로(104)의 급전 신호는 제1 비아홀(240) 및 제2 비아홀(250)을 통해 후술하는 제2 금속 패턴(302) 및 제4 금속 패턴(306)에 직접 제공된다. A first via hole 240 and a second via hole 250 are formed at each end of the first feed line part 220 and the second feed line part 230, and the feed signal of the feed line 104 is a first via hole. It is directly provided to the second metal pattern 302 and the fourth metal pattern 306 to be described later through the 240 and the second via hole 250.
본 발명은 기존이 L-프로브 급전과는 달리 제2 금속 패턴(302)에 직접 급전 구조를 사용하도록 하는 것이며, 이는 광대역에 대한 안정적인 편파 특성을 유지하기 위해서이다. In the present invention, unlike the conventional L-probe feeding, a direct feeding structure is used for the second metal pattern 302, in order to maintain a stable polarization characteristic for a broadband.
제1 기판(100)에 형성되는 급전 선로(104)는 패터닝, 에칭, 프린팅과 같은 다양한 방식에 의해 제1 기판상에 형성될 수 있을 것이다. The power supply line 104 formed on the first substrate 100 may be formed on the first substrate by various methods such as patterning, etching, and printing.
도 4는 본 발명의 제1 실시예에 따른 제1 기판의 하부면 구조를 도시한 도면이다. 4 is a diagram showing a structure of a lower surface of a first substrate according to a first embodiment of the present invention.
도 4를 참조하면, 제1 기판(100)의 하부면의 좌측부에는 두 개의 서로 이격된 금속 패턴(300, 302)이 형성된다. 도 4에는 예시적으로 두 개의 금속 패턴이 형성되나 금속 패턴의 수는 두 개에 한정되는 것은 아니며 2의 배수에 해당되는 금속 패턴이 제1 기판(100)의 하부면에 형성될 수 있을 것이다. 예를 들어, 서로 이격되는 금속 패턴의 수는 2개, 4개 또는 6개일 수 있는 것이다. Referring to FIG. 4, two metal patterns 300 and 302 spaced apart from each other are formed on the left side of the lower surface of the first substrate 100. Although two metal patterns are exemplarily formed in FIG. 4, the number of metal patterns is not limited to two, and a metal pattern corresponding to a multiple of 2 may be formed on the lower surface of the first substrate 100. For example, the number of metal patterns spaced apart from each other may be 2, 4, or 6.
제1 기판(100)의 하부에 형성되는 금속 패턴은 'ㄷ'자 형상 또는 'C'자 형상을 가지며 두 개의 금속 패턴은 서로 마주보도록 배치된다. 도 4에 도시된 바와 같이, 제1 금속 패턴(300)은 좌측에 개구부가 형성된 'ㄷ'자 형태를 가지고, 제2 금속 패턴(302)은 우측에 개구부가 형성된 'ㄷ'자 형태를 가지고 있어 두 금속 패턴의 개구부는 반대 방향으로 형성된다. The metal pattern formed under the first substrate 100 has a'C' shape or a'C' shape, and the two metal patterns are disposed to face each other. As shown in FIG. 4, the first metal pattern 300 has a'C' shape with an opening formed on the left side, and the second metal pattern 302 has a'C' shape with an opening formed on the right side. The openings of the two metal patterns are formed in opposite directions.
도 4에는 제1 금속 패턴(300)과 제2 금속 패턴(302)의 사이즈가 상이한 경우가 도시되어 있으나 제1 금속 패턴(300)과 제2 금속 패턴(302)의 사이즈는 다양할 수 있다. 만일 'ㄷ'자 형태의 두 개의 금속 패턴(300, 302)의 사이즈가 같다면 두 개의 금속 패턴이 스플릿(split) 구조의 직사각형을 형성할 수 있을 것이다. 또한, 'C자 형태의 두 개의 금속 패턴의 사이즈가 같다면 두 개의 금속 패턴이 스플릿(split) 구조의 원형을 형성할 수도 있을 것이다. 4 illustrates a case where the sizes of the first metal pattern 300 and the second metal pattern 302 are different, but the sizes of the first metal pattern 300 and the second metal pattern 302 may vary. If the sizes of the two metal patterns 300 and 302 in the shape of a'c' are the same, the two metal patterns may form a rectangle having a split structure. In addition, if the sizes of the'C-shaped two metal patterns are the same, the two metal patterns may form a circle having a split structure.
앞서 설명한 바와 같이, 제2 금속 패턴(302)은 제1 비아홀(240)을 통해 급전 선로(104)와 직접 연결되어 급전 신호를 제공받는다. 제2 금속 패턴(302)과 이격된 제1 금속 패턴(300)은 커플링을 통해 제2 금속 패턴(302)로부터 급전 신호를 제공받는다. As described above, the second metal pattern 302 is directly connected to the feed line 104 through the first via hole 240 to receive a feed signal. The first metal pattern 300 spaced apart from the second metal pattern 302 receives a power supply signal from the second metal pattern 302 through coupling.
개구부가 서로 반대 방향이 되도록 두 개의 금속 패턴(300, 302)을 배치하는 것은 제1 금속 패턴(300)과 제2 금속 패턴(302)이 서로 같은 방향으로 전류가 형성되도록 하기 위함이다. 예를 들어, 제1 금속 패턴(300)에서 시계 방향으로 전류가 형성될 경우, 제2 금속 패턴(302) 역시 시계 방향으로 인한 전류가 형성된다. 이를 위해 적정위치에 비아홀(250)이 형성되어야 함은 당연하다.The arrangement of the two metal patterns 300 and 302 so that the openings are in opposite directions is to allow the first metal pattern 300 and the second metal pattern 302 to form currents in the same direction. For example, when a current is formed in the clockwise direction in the first metal pattern 300, a current is also formed in the clockwise direction in the second metal pattern 302. For this, it is natural that the via hole 250 must be formed in an appropriate position.
한편, 제1 기판(100)의 하부면의 우측부에도 두 개의 서로 이격된 금속 패턴인 제3 금속 패턴(304) 및 제4 금속 패턴(306)이 형성된다. 제3 금속 패턴(304) 및 제4 금속 패턴(306)은 좌측부의 제1 금속 패턴(300) 및 제2 금속 패턴(302)과 대칭 구조를 가진다. 제3 금속 패턴(304)은 제1 금속 패턴(300)과 대칭 구조이며, 제4 금속 패턴(306)은 제2 금속 패턴(302)과 대칭 구조이다. 우측부에 형성되는 금속 패턴 역시 좌측부와 동일하게 2의 배수의 수로 형성될 수 있으며, 개구부는 서로 반대 방향으로 형성된다. Meanwhile, a third metal pattern 304 and a fourth metal pattern 306, which are two spaced apart metal patterns, are also formed on the right side of the lower surface of the first substrate 100. The third metal pattern 304 and the fourth metal pattern 306 have a symmetric structure with the first metal pattern 300 and the second metal pattern 302 on the left side. The third metal pattern 304 has a symmetrical structure with the first metal pattern 300, and the fourth metal pattern 306 has a symmetrical structure with the second metal pattern 302. The metal pattern formed on the right side may also be formed in a multiple of 2 as the left side, and the openings are formed in opposite directions.
한편, 제1 금속 패턴(300)과 제3 금속 패턴(304)은 전기적으로 연결될 수도 있다. Meanwhile, the first metal pattern 300 and the third metal pattern 304 may be electrically connected.
제4 금속 패턴(306)은 제2 비아홀(250)을 통해 급전 선로(104)로부터 직접 급전 신호를 제공받으며, 제4 금속 패턴(306)과 이격된 제3 금속 패턴(304)은 커플링을 통해 급전 신호를 제공받는다. The fourth metal pattern 306 receives a feed signal directly from the feed line 104 through the second via hole 250, and the third metal pattern 304 spaced apart from the fourth metal pattern 306 performs coupling. The feed signal is provided through.
제1 금속 패턴(300) 및 제2 금속 패턴(302) 쌍과 제3 금속 패턴(304) 및 제4 금속 패턴(306) 쌍은 각각의 편파에 따라 전류 방향을 동일하게 여기 시키므로 자계가 강화되고, 강화된 자계는 각 편파의 전계를 강화 시키게 된다. 각각 개선된 교차 편파 비와 편파간 아이솔레이션은 주파수 및 빔 방향별로 양호하게 확보될 수 있도록 한다. Since the first metal pattern 300 and the second metal pattern 302 pair and the third metal pattern 304 and the fourth metal pattern 306 pair equally excite the current direction according to each polarization, the magnetic field is strengthened. , The strengthened magnetic field strengthens the electric field of each polarization. The improved cross-polarization ratio and inter-polarization isolation, respectively, can be well secured for each frequency and beam direction.
제1 기판(100)에는 상향 방향으로 다수의 제1 돌출부(105)가 형성되며, 다수의 제1 돌출부(105)에는 제1 금속 패턴(300) 및 제3 금속 패턴(304)으로부터 상향으로 연장되는 다수의 제1 연장부(108)가 형성된다. 제1 돌출부(105) 및 제1 연장부(108)는 제3 기판에 형성된 홀을 통해 관통하며, 제1 연장부(108)는 제3 기판(120)에 형성된 방사 패치(125)와 전기적으로 접촉한다. A plurality of first protrusions 105 are formed in an upward direction on the first substrate 100, and a plurality of first protrusions 105 extend upward from the first metal pattern 300 and the third metal pattern 304. A plurality of first extensions 108 are formed. The first protrusion 105 and the first extension 108 penetrate through a hole formed in the third substrate, and the first extension 108 is electrically connected to the radiation patch 125 formed on the third substrate 120. Contact.
또한, 제1 기판(100)에는 하향 방향으로 다수의 제2 돌출부(106)가 형성되며, 하향 방향으로의 다수의 제2 돌출부(106)에는 제1 금속 패턴(300) 및 제3 금속 패턴(304)으로부터 하향으로 연장되는 다수의 제2 연장부(109)가 형성된다. 다수의 돌출부(105)는 본 발명에 따른 기지국 안테나용 방사체가 놓여지는 반사판을 관통하며, 제2 연장부(109)는 반사판 또는 반사판과 동일한 접지 전위를 가지는 엘리먼트와 연결된다. In addition, a plurality of second protrusions 106 are formed in a downward direction on the first substrate 100, and a first metal pattern 300 and a third metal pattern are formed on the plurality of second protrusions 106 in a downward direction. A plurality of second extension portions 109 extending downward from 304 are formed. The plurality of protrusions 105 pass through a reflector on which a radiator for a base station antenna according to the present invention is placed, and the second extension 109 is connected to a reflector or an element having the same ground potential as the reflector.
도 5는 본 발명의 제2 실시예에 따른 제1 기판의 상부면 구조를 도시한 도면이다. 5 is a diagram showing a top surface structure of a first substrate according to a second embodiment of the present invention.
도 5를 참조하면, 제1 기판(100)의 상부면에는 급전 선로(104) 및 제2 금속 패턴(302) 및 제4 금속 패턴(306)이 형성된다. 급전 선로(104)는 급전점 연결부(200), 분기부(210), 제1 급전 선로부(220) 및 제2 급전 선로부(230)를 포함한다. Referring to FIG. 5, a power supply line 104, a second metal pattern 302, and a fourth metal pattern 306 are formed on an upper surface of the first substrate 100. The feed line 104 includes a feed point connection part 200, a branch part 210, a first feed line part 220 and a second feed line part 230.
제2 실시예는 제2 금속 패턴(302) 및 제4 금속 패턴(306)이 제1 기판의 하부면이 아닌 상부면에 형성된다는 점에서 제1 실시예와 상이하다. The second embodiment is different from the first embodiment in that the second metal pattern 302 and the fourth metal pattern 306 are formed on the upper surface of the first substrate rather than the lower surface.
제1 급전 선로부(220)의 종단은 제2 금속 패턴(302)과 직접 연결되고, 제2 급전 선로부(230)의 종단은 제4 금속 패턴(306)과 직접 연결된다. 제2 금속 패턴(302) 및 제4 금속 패턴(306)의 형태는 제1 실시예와 동일하다. The end of the first feed line part 220 is directly connected to the second metal pattern 302, and the end of the second feed line part 230 is directly connected to the fourth metal pattern 306. The shapes of the second metal pattern 302 and the fourth metal pattern 306 are the same as those of the first embodiment.
도 6은 본 발명의 제2 실시예에 따른 제1 기판의 하부면 구조를 도시한 도면이다. 6 is a diagram illustrating a structure of a lower surface of a first substrate according to a second embodiment of the present invention.
도 6을 참조하면, 제1 기판(100)의 하부면에는 제1 금속 패턴(300) 및 제3 금속 패턴(304)이 형성된다. 제1 금속 패턴(300)은 제1 기판(100)의 하부면 좌측부에 형성되고, 제3 금속 패턴(304)은 제1 기판(100)의 하부면 우측부에 형성된다. Referring to FIG. 6, a first metal pattern 300 and a third metal pattern 304 are formed on the lower surface of the first substrate 100. The first metal pattern 300 is formed on the left side of the lower surface of the first substrate 100, and the third metal pattern 304 is formed on the right side of the lower surface of the first substrate 100.
제1 실시예와는 달리 제2 실시예에서 제2 금속 패턴(302) 및 제4 금속 패턴(304)은 제1 기판(100)의 하부면에 형성되지 않는다. Unlike the first embodiment, in the second embodiment, the second metal pattern 302 and the fourth metal pattern 304 are not formed on the lower surface of the first substrate 100.
제1 실시예와 제2 실시예는 제2 금속 패턴(302) 및 제4 금속 패턴(304)의 위치에 있어서만 차이가 있을 뿐 동작 원리는 동일하다. The first and second embodiments differ only in the positions of the second metal pattern 302 and the fourth metal pattern 304, but the operation principle is the same.
제1 금속 패턴(300)은 커플링을 통해 제2 금속 패턴(302)로부터 급전 신호를 제공받으며, 제3 금속 패턴(304)은 제4 금속 패턴(306)으로부터 급전 신호를 제공받는다. The first metal pattern 300 receives a feed signal from the second metal pattern 302 through coupling, and the third metal pattern 304 receives a feed signal from the fourth metal pattern 306.
도7은 본 발명의 제1 실시예에 따른 제2 기판의 상부면 구조를 도시한 도면이고, 도 8은 본 발명의 제1 실시예에 따른 제2 기판의 하부면 구조를 도시한 도면이다. FIG. 7 is a diagram showing a structure of an upper surface of a second substrate according to a first embodiment of the present invention, and FIG. 8 is a view showing a structure of a lower surface of a second substrate according to the first embodiment of the present invention.
도 8을 참조하면, 제1 실시예에 따른 제2 기판의 하부면 구조는 제1 실시예에 따른 제1 기판의 하부면 구조와 동일하며 제1 기판과 동일하게 제1 내지 제4 금속 패턴이 형성되는 것을 확인할 수 있다. 8, the lower surface structure of the second substrate according to the first embodiment is the same as the lower surface structure of the first substrate according to the first embodiment, and the first to fourth metal patterns are the same as the first substrate. It can be confirmed that it is formed.
도 7를 참조하면, 제1 실시예에 따른 제2 기판의 상부면 구조 역시 제1 실시예에 따른 제1 기판의 상부면 구조와 동일하다. Referring to FIG. 7, the top surface structure of the second substrate according to the first embodiment is also the same as the top surface structure of the first substrate according to the first embodiment.
결국, 제1 기판과 제2 기판은 실질적으로 동일한 구조를 가지며, 제1 기판은 +45도 편파 신호에 대한 자계 강화를 통하여 각 편파의 양호한 전계를 형성한 후 급전 및 임피던스 매칭을 수행하며, 제2 기판은 -45도 편판 신호에 대한 급전 및 임피던스 매칭을 수행하는 것이다. As a result, the first substrate and the second substrate have substantially the same structure, and the first substrate forms a good electric field of each polarized wave by strengthening the magnetic field for the +45 degree polarized signal, and then power supply and impedance matching are performed. 2 The substrate performs the supply and impedance matching for the -45 degree single plate signal.
제2 기판 역시 상향으로 돌출되는 다수의 제1 돌출부(405)와 제2 돌출부(406)를 포함하며, 다수의 제1 돌출부(405) 각각에는 다수의 제1 연장부(408)가 형성되고, 제2 돌출부(406) 각각에는 다수의 제2 연장부가 형성된다. 제1 기판과 동일하게 제1 연장부(408)는 방사 패치(125)와 전기적으로 연결되며, 제2 연장부(409)는 반사판 또는 반사판과 동일한 접지 전위를 가지는 엘리먼트와 전기적으로 연결된다.The second substrate also includes a plurality of first protrusions 405 and second protrusions 406 protruding upward, and a plurality of first extensions 408 are formed on each of the plurality of first protrusions 405, Each of the second protrusions 406 is formed with a plurality of second extensions. Like the first substrate, the first extension 408 is electrically connected to the radiation patch 125, and the second extension 409 is electrically connected to a reflector or an element having the same ground potential as that of the reflector.
도9는 본 발명의 제2 실시예에 따른 제2 기판의 상부면 구조를 도시한 도면이고, 도 10은 본 발명의 제2 실시예에 따른 제2 기판의 하부면 구조를 도시한 도면이다. 9 is a view showing a structure of a top surface of a second substrate according to a second embodiment of the present invention, and FIG. 10 is a view showing a structure of a lower surface of a second substrate according to a second embodiment of the present invention.
도 9 및 도 10을 참조하면, 제2 실시예에 따른 제2 기판의 상부면 및 하부면 구조 역시 제2 실시예에 따른 제1 기판의 상부면 및 하부면 구조와 동일하다. 9 and 10, the structure of the upper and lower surfaces of the second substrate according to the second exemplary embodiment is also the same as the upper and lower surfaces of the first substrate according to the second exemplary embodiment.
도 11은 본 발명의 일 실시예에 따른 제3 기판의 구조를 나타낸 사시도이다. 11 is a perspective view showing the structure of a third substrate according to an embodiment of the present invention.
도 11을 참조하면, 제3 기판(120)에는 방사 패치(125)가 형성되며, 제3 기판 및 방사 패치에는 제1 기판(100)의 다수의 제1 돌출부(105) 및 제2 기판(110)의 다수의 제1 돌출부(405)가 관통할 수 있는 홀이 형성된다. Referring to FIG. 11, a radiation patch 125 is formed on a third substrate 120, and a plurality of first protrusions 105 and a second substrate 110 of the first substrate 100 are formed on the third substrate and the radiation patch. ) A hole through which the plurality of first protrusions 405 can pass is formed.
도 11에 도시된 바와 같이, 제1 기판의 다수의 제1 돌출부(105) 및 제2 기판의 다수의 제2 돌출부(405)가 방사 패치에 대해 상향으로 돌출되어 있는 것을 확인할 수 있다. As shown in FIG. 11, it can be seen that the plurality of first protrusions 105 of the first substrate and the plurality of second protrusions 405 of the second substrate protrude upward with respect to the radiation patch.
제1 기판(100)의 다수의 제1 돌출부(105)는 +45도 방향으로 배열되고, 제2 기판(110)의 다수의 제1 돌출부(405)는 -45도 방향으로 배열되어 각각 +45도 편파 신호 및 -45도 편파 신호를 제공하게 된다. A plurality of first protrusions 105 of the first substrate 100 are arranged in a direction of +45 degrees, and a plurality of first protrusions 405 of the second substrate 110 are arranged in a direction of -45 degrees, respectively. It provides a degree polarized signal and a -45 degree polarized signal.
제2 금속 패턴 및 제4 금속 패턴에 직접 급전이 이루어지고, 제1 금속 패턴 및 제3 금속 패턴이 커플링에 의한 급전이 이루어지는 구조는 광대역의 주파수에 대해 안정적인 편파 특성을 제공할 수 있으며 특히, 로우 프로파일(Low Profile)이 요구되는 5G용 기지국 안테나에서 효과적으로 활용될 수 있는 장점이 있다.The structure in which power is supplied directly to the second metal pattern and the fourth metal pattern, and the first metal pattern and the third metal pattern are fed by coupling can provide stable polarization characteristics for a broadband frequency. There is an advantage that can be effectively used in a 5G base station antenna that requires a low profile.
도 12는 본 발명의 일 실시예에 따른 기지국 안테나의 방사체를 사용하는 기지국 안테나의 구조를 도시한 도면이다. 12 is a diagram illustrating a structure of a base station antenna using a radiator of the base station antenna according to an embodiment of the present invention.
도 12를 참조하면, 다수의 방사체가 기지국 안테나의 반사판(800)상에 배열된다. 배열을 이루는 다수의 방사체 각각에는 +45도 편파 신호 및 -45도 편파 신호가 급전되며, 다수의 방사체 각각으로 급전되는 신호의 위상을 조절하기 위해 페이즈 쉬프터가 사용될 수 있다. Referring to FIG. 12, a plurality of radiators are arranged on a reflector 800 of a base station antenna. A +45 degree polarized signal and a -45 degree polarized signal are supplied to each of the plurality of radiators forming the array, and a phase shifter may be used to adjust the phase of the signal supplied to each of the plurality of radiators.
전술한 본 발명의 설명은 예시를 위한 것이며, 본 발명이 속하는 기술분야의 통상의 지식을 가진 자는 본 발명의 기술적 사상이나 필수적인 특징을 변경하지 않고서 다른 구체적인 형태로 쉽게 변형이 가능하다는 것을 이해할 수 있을 것이다.The above description of the present invention is for illustrative purposes only, and those of ordinary skill in the art to which the present invention pertains will be able to understand that it can be easily modified into other specific forms without changing the technical spirit or essential features of the present invention. will be.
그러므로 이상에서 기술한 실시예들은 모든 면에서 예시적인 것이며 한정적이 아닌 것으로 이해해야만 한다.Therefore, it should be understood that the embodiments described above are illustrative in all respects and not limiting.
예를 들어, 단일형으로 설명되어 있는 각 구성 요소는 분산되어 실시될 수도 있으며, 마찬가지로 분산된 것으로 설명되어 있는 구성 요소들도 결합된 형태로 실시될 수 있다.For example, each component described as a single type may be implemented in a distributed manner, and similarly, components described as being distributed may also be implemented in a combined form.
본 발명의 범위는 후술하는 특허청구범위에 의하여 나타내어지며, 특허청구범위의 의미 및 범위 그리고 그 균등 개념으로부터 도출되는 모든 변경 또는 변형된 형태가 본 발명의 범위에 포함되는 것으로 해석되어야 한다.The scope of the present invention is indicated by the claims to be described later, and all changes or modified forms derived from the meaning and scope of the claims and their equivalent concepts should be interpreted as being included in the scope of the present invention.

Claims (12)

  1. 상부면에 급전 선로가 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴 및 제2 금속 패턴이 형성되고 반사판에 대해 수직으로 놓여지는 제1 기판;A first substrate on which a power supply line is formed on an upper surface, a first metal pattern and a second metal pattern of a'c' shape or a'C' shape are formed on the lower surface, and which are placed perpendicular to the reflector;
    상부면에 급전 선로가 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴 및 제2 금속 패턴이 형성되며 상기 반사판에 대해 수직으로 놓이면서 상기 제1 기판과 직교하는 제2 기판; 및A second substrate having a power supply line formed on the upper surface, a first metal pattern and a second metal pattern having a'c' shape or a'C' shape on the lower surface, and being perpendicular to the reflector and perpendicular to the first substrate ; And
    상기 수직으로 놓여진 제1 기판 및 제2 기판상에 결합되며 상기 반사판에 평행하게 위치하고 상부면에 방사 패치가 형성되는 제3 기판을 포함하되,And a third substrate coupled to the first and second substrates placed vertically and positioned parallel to the reflector and having a radiation patch formed on an upper surface thereof,
    상기 제1 기판 및 상기 제2 기판의 상기 제1 금속 패턴은 상기 제3기판의 형성된 홀을 통해 상기 방사 패치와 전기적으로 연결되며,The first metal pattern of the first substrate and the second substrate is electrically connected to the radiation patch through a hole formed in the third substrate,
    상기 제1 금속 패턴 및 상기 제2 금속 패턴은 개구부가 서로 반대 방향으로 형성되면서 이격되어 배치되고, 상기 급전 선로는 비아홀을 통해 상기 제2 금속 패턴에 급전 신호를 제공하는 것을 특징으로 하는 기지국 안테나의 방사체. The first metal pattern and the second metal pattern are spaced apart from each other with openings formed in opposite directions, and the feed line provides a feed signal to the second metal pattern through a via hole. Emitter.
  2. 제1 항에 있어서,The method of claim 1,
    상기 제1 기판 및 상기 제2 기판은 상향으로 돌출되는 제1 돌출부를 포함하고, 상기 제1 금속 패턴의 제1 연장부가 상기 제1 돌출부에 형성되어 상기 방사 패치에 전기적으로 연결되는 것을 특징으로 하는 기지국 안테나의 방사체. Wherein the first substrate and the second substrate include a first protrusion protruding upward, and a first extension part of the first metal pattern is formed on the first protrusion and is electrically connected to the radiation patch. Base station antenna radiator.
  3. 제2 항에 있어서,The method of claim 2,
    상기 제1 기판 및 상기 제2 기판은 하향으로 돌출되는 제2 돌출부를 포함하고, 상기 제1 금속 패턴의 제2 연장부가 상기 제2 돌출부에 형성되고 상기 제2 연장부는 접지와 전기적으로 연결되는 것을 특징으로 하는 기지국 안테나의 방사체.The first substrate and the second substrate include a second protrusion protruding downward, and a second extension of the first metal pattern is formed on the second protrusion, and the second extension is electrically connected to a ground. A radiator of a base station antenna, characterized in that.
  4. 제1항에 있어서,The method of claim 1,
    상기 제1 기판의 급전 선로에는 +45도 편파 신호가 급전되고, 상기 제2 기판의 급전 선로에는 -45도 편파 신호가 급전되는 것을 특징으로 하는 기지국 안테나의 방사체.A radiator of a base station antenna, characterized in that a +45 degree polarized signal is supplied to a feed line of the first substrate and a -45 degree polarized signal is supplied to a feed line of the second substrate.
  5. 제1항에 있어서,The method of claim 1,
    상기 제1 기판 및 상기 제2 기판 각각에는 상기 제1 금속 패턴과 동일한 형태를 가지는 제3 금속 패턴 및 상기 제2 금속 패턴과 동일한 형태를 가지는 제4 금속 패턴이 더 형성되고, 상기 제4 금속 패턴은 상기 급전 선로와 비아홀을 통해 연결되어 급전 신호를 제공받는 것을 특징으로 하는 기지국 안테나의 방사체. A third metal pattern having the same shape as the first metal pattern and a fourth metal pattern having the same shape as the second metal pattern are further formed on each of the first and second substrates, and the fourth metal pattern Is a radiator of a base station antenna, characterized in that the feed line is connected to the via hole to receive a feed signal.
  6. 제5항에 있어서,The method of claim 5,
    상기 제3 금속 패턴 및 상기 제4 금속 패턴은 개구부가 서로 반대 방향으로 형성되면서 이격되어 배치되는 것을 특징으로 하는 기지국 안테나의 방사체.The radiator of the base station antenna, wherein the third metal pattern and the fourth metal pattern are spaced apart from each other while openings are formed in opposite directions.
  7. 상부면에 급전 선로 및 'ㄷ'자형 또는 'C'자형의 제2 금속 패턴이 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴이 형성되며 반사판에 대해 수직으로 놓여지는 제1 기판;A power supply line and a'C'-shaped or'C'-shaped second metal pattern is formed on the upper surface, and a'c'-shaped or'C'-shaped first metal pattern is formed on the lower surface, and is placed perpendicular to the reflector. A first substrate;
    상부면에 급전 선로 및 'ㄷ'자형 또는 'C'자형의 제2 금속 패턴이 형성되고 하부면에 'ㄷ'자형 또는 'C'자형의 제1 금속 패턴이 형성되며 상기 반사판에 대해 수직으로 놓이면서 상기 제1 기판과 직교하는 제2 기판; 및A power supply line and a'c'-shaped or'C'-shaped second metal pattern is formed on the upper surface, and a'c'-shaped or'C'-shaped first metal pattern is formed on the lower surface, and is placed perpendicular to the reflector. A second substrate orthogonal to the first substrate; And
    상기 수직으로 놓여진 제1 기판 및 제2 기판상에 결합되며 상기 반사판에 평행하게 위치하고 상부면에 방사 패치가 형성되는 제3 기판을 포함하되,And a third substrate coupled to the first and second substrates placed vertically and positioned parallel to the reflector and having a radiation patch formed on an upper surface thereof,
    상기 제1 기판 및 상기 제2 기판의 상기 제1 금속 패턴은 상기 제3기판의 형성된 홀을 통해 상기 방사 패치와 전기적으로 연결되며,The first metal pattern of the first substrate and the second substrate is electrically connected to the radiation patch through a hole formed in the third substrate,
    상기 제1 금속 패턴 및 상기 제2 금속 패턴은 개구부가 서로 반대 방향으로 형성되며, 상기 급전 선로는 상기 제2 금속 패턴에 결합되어 급전 신호를 제공하는 것을 특징으로 하는 기지국 안테나의 방사체. The first metal pattern and the second metal pattern has openings formed in opposite directions, and the feed line is coupled to the second metal pattern to provide a feed signal.
  8. 제7 항에 있어서,The method of claim 7,
    상기 제1 기판 및 상기 제2 기판은 상향으로 돌출되는 제1 돌출부를 포함하고, 상기 제1 금속 패턴의 제1 연장부가 상기 제1 돌출부에 형성되어 상기 방사 패치에 전기적으로 연결되는 것을 특징으로 하는 기지국 안테나의 방사체. Wherein the first substrate and the second substrate include a first protrusion protruding upward, and a first extension part of the first metal pattern is formed on the first protrusion and is electrically connected to the radiation patch. Base station antenna radiator.
  9. 제8 항에 있어서,The method of claim 8,
    상기 제1 기판 및 상기 제2 기판은 하향으로 돌출되는 제2 돌출부를 포함하고, 상기 제1 금속 패턴의 제2 연장부가 상기 제2 돌출부에 형성되고 상기 제2 연장부는 접지와 전기적으로 연결되는 것을 특징으로 하는 기지국 안테나의 방사체.The first substrate and the second substrate include a second protrusion protruding downward, and a second extension of the first metal pattern is formed on the second protrusion, and the second extension is electrically connected to a ground. A radiator of a base station antenna, characterized in that.
  10. 제7항에 있어서,The method of claim 7,
    상기 제1 기판의 급전 선로에는 +45도 편파 신호가 급전되고, 상기 제2 기판의 급전 선로에는 -45도 편파 신호가 급전되는 것을 특징으로 하는 기지국 안테나의 방사체.A radiator of a base station antenna, characterized in that a +45 degree polarized signal is supplied to a feed line of the first substrate and a -45 degree polarized signal is supplied to a feed line of the second substrate.
  11. 제7항에 있어서,The method of claim 7,
    상기 제1 기판 및 상기 제2 기판 각각에는 상기 제1 금속 패턴과 동일한 형태를 가지는 제3 금속 패턴 및 상기 제2 금속 패턴과 동일한 형태를 가지는 제4 금속 패턴이 더 형성되고, 상기 제4 금속 패턴은 상기 급전 선로와 결합되어 급전 신호를 제공받는 것을 특징으로 하는 기지국 안테나의 방사체. A third metal pattern having the same shape as the first metal pattern and a fourth metal pattern having the same shape as the second metal pattern are further formed on each of the first and second substrates, and the fourth metal pattern Is a radiator of a base station antenna, characterized in that it is coupled to the feed line to receive a feed signal.
  12. 제11항에 있어서,The method of claim 11,
    상기 제3 금속 패턴 및 상기 제4 금속 패턴은 개구부가 서로 반대 방향으로 형성되면서 이격되어 배치되는 것을 특징으로 하는 기지국 안테나의 방사체.The radiator of the base station antenna, wherein the third metal pattern and the fourth metal pattern are spaced apart from each other while openings are formed in opposite directions.
PCT/KR2020/095071 2019-04-19 2020-04-16 Dual-polarized base station antenna radiator WO2020214015A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020190045847A KR102125971B1 (en) 2019-04-19 2019-04-19 Dual Polarization Base Station Antenna
KR10-2019-0045847 2019-04-19

Publications (1)

Publication Number Publication Date
WO2020214015A1 true WO2020214015A1 (en) 2020-10-22

Family

ID=71400131

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2020/095071 WO2020214015A1 (en) 2019-04-19 2020-04-16 Dual-polarized base station antenna radiator

Country Status (2)

Country Link
KR (1) KR102125971B1 (en)
WO (1) WO2020214015A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102414079B1 (en) 2021-03-15 2022-06-29 주식회사 에이스테크놀로지 Low profile dual polarization antenna

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011244244A (en) * 2010-05-19 2011-12-01 Denki Kogyo Co Ltd Polarization diversity antenna
JP2013026707A (en) * 2011-07-19 2013-02-04 Denki Kogyo Co Ltd Polarization diversity array antenna device
JP2016119551A (en) * 2014-12-19 2016-06-30 電気興業株式会社 Polarized wave shared antenna device
JP2016225956A (en) * 2015-06-04 2016-12-28 日本電気株式会社 Antenna and radio communication equipment
CN106816697A (en) * 2016-12-26 2017-06-09 上海交通大学 The broadband circle polarized handheld terminal antennas of UHF of low section

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011244244A (en) * 2010-05-19 2011-12-01 Denki Kogyo Co Ltd Polarization diversity antenna
JP2013026707A (en) * 2011-07-19 2013-02-04 Denki Kogyo Co Ltd Polarization diversity array antenna device
JP2016119551A (en) * 2014-12-19 2016-06-30 電気興業株式会社 Polarized wave shared antenna device
JP2016225956A (en) * 2015-06-04 2016-12-28 日本電気株式会社 Antenna and radio communication equipment
CN106816697A (en) * 2016-12-26 2017-06-09 上海交通大学 The broadband circle polarized handheld terminal antennas of UHF of low section

Also Published As

Publication number Publication date
KR102125971B1 (en) 2020-06-25

Similar Documents

Publication Publication Date Title
WO2019124844A1 (en) Dual polarized antenna and dual polarized antenna assembly comprising same
WO2020231077A1 (en) Base station antenna radiator having function for suppressing unwanted resonances
WO2015041422A1 (en) Antenna apparatus and electronic device having same
WO2011105650A1 (en) Internal mimo antenna capable of selectively controlling isolation characteristic by isolation aid in multiband including lte band
WO2015190675A1 (en) Omnidirectional mimo antenna using electro-polarization
KR101127683B1 (en) A triple polarized patch antenna
WO2019156281A1 (en) Array antenna
WO2014208993A1 (en) Dual linear polarization horn antenna element for planar array antenna
WO2018182109A1 (en) Multiband base station antenna
WO2023090763A1 (en) Dual-band dual-polarization antenna radiation element
WO2018088669A1 (en) Antenna device including parabolic-hyperbolic reflector
US11916298B2 (en) Patch antenna
WO2010071304A2 (en) Power divider using a coupling
WO2020214015A1 (en) Dual-polarized base station antenna radiator
WO2019066308A1 (en) Antenna device including phase shifter
WO2022173193A1 (en) Antenna structure and electronic device comprising same
WO2016056715A1 (en) Directional mimo antenna using electro-polarization
EP3516738A1 (en) Antenna device including parabolic-hyperbolic reflector
WO2020231045A1 (en) Dual polarized antenna using shift series feed
WO2019216721A1 (en) Dual polarized antenna and antenna array
WO2011065706A9 (en) N-port feeding system using slow-wave structure and feeding device included in same
WO2016076595A1 (en) Waveguide slot array antenna
WO2021107423A1 (en) Multiple broadband antenna and mimo antenna using same
KR20190015419A (en) Circuit board assembly for supplying signals to radiators
WO2024122764A1 (en) Radiator module and antenna device carrying out broadside radiation and end-fire radiation

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 20791675

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 20791675

Country of ref document: EP

Kind code of ref document: A1