WO2020153137A1 - Structure, decorative film, method for manufacturing structure, and method for manufacturing decorative film - Google Patents

Structure, decorative film, method for manufacturing structure, and method for manufacturing decorative film Download PDF

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Publication number
WO2020153137A1
WO2020153137A1 PCT/JP2020/000461 JP2020000461W WO2020153137A1 WO 2020153137 A1 WO2020153137 A1 WO 2020153137A1 JP 2020000461 W JP2020000461 W JP 2020000461W WO 2020153137 A1 WO2020153137 A1 WO 2020153137A1
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WO
WIPO (PCT)
Prior art keywords
metal layer
light
gap
fine cracks
layer
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PCT/JP2020/000461
Other languages
French (fr)
Japanese (ja)
Inventor
斉藤 揚訓
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ソニー株式会社
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Publication date
Application filed by ソニー株式会社 filed Critical ソニー株式会社
Priority to JP2020568061A priority Critical patent/JPWO2020153137A1/en
Publication of WO2020153137A1 publication Critical patent/WO2020153137A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon

Definitions

  • the present technology relates to a structure, a decorative film, a method for manufacturing the structure, and a method for manufacturing the decorative film that can be applied to electronic devices, vehicles, and the like.
  • Patent Document 1 discloses an exterior part for mounting an automobile radar on an emblem of an automobile.
  • indium is vapor-deposited on a resin film, and this film is attached to the surface layer of the emblem by the insert molding method. This makes it possible to manufacture an exterior part that has a decorative metallic luster and does not have an absorption band in the electromagnetic wave frequency band due to the island-shaped structure of indium (paragraph [0006] in the specification of Patent Document 1, etc.). ).
  • the method of forming the island-shaped structure of indium has a problem that it is difficult to form a uniform film thickness on the whole when the deposition area is large. There is also a problem that the island-shaped structure is easily destroyed by the temperature of the poured resin when molding the housing component (paragraphs [0007] [0008] in the specification of Patent Document 1).
  • Patent Document 1 discloses the following technique. That is, a sea-island structure in which a metal region is an island and a metal-free region surrounding the island is the sea is artificially formed with regularity. The metal regions are insulated from each other by the non-metal regions, and the area of the metal regions and the space between the metal regions adjacent to each other are appropriately controlled. According to this, an electromagnetic wave transmitting material which is comparable to the film on which indium is vapor-deposited can be obtained (paragraph [0013] in the specification of Patent Document 1).
  • an object of the present technology is to provide a structure having a metallic appearance and a high design property capable of transmitting radio waves, a decorative film, a method for manufacturing the structure, and a decorative film. It is to provide a manufacturing method.
  • the decorating section has a first surface, a second surface, a metal layer, and a light shielding section.
  • the second surface is a surface opposite to the first surface.
  • the metal layer has fine cracks.
  • the light shielding portion is formed in at least one of the gap between the fine cracks or between the metal layer and the second surface.
  • the member has a decorated region to which the decorative portion is adhered so that the first surface is on the front surface side.
  • a light shielding part is formed in at least one of the gap between the fine cracks or between the metal layer and the second surface. This makes it possible to suppress the light transmitted through the gaps of the minute cracks. As a result, it is possible to realize a highly-designed structure that can transmit radio waves while having a metallic appearance.
  • the light-shielding portion may include a gap light-shielding portion formed in the gap between the minute cracks.
  • the light shielding portion may include a light shielding layer formed between the metal layer and the second surface.
  • the light-shielding portion is a gap light-shielding portion formed in a gap of the minute crack, and a light-shielding layer located between the metal layer and the second surface and integrally formed with the gap light-shielding portion. May be included.
  • the decorating section may include a decorating function section having a decorating function that is configured in at least one of the gap between the fine cracks or between the metal layer and the second surface.
  • the decoration function section may have a decoration function using at least one of transmission and reflection of light.
  • the decorating function unit may include a gap decorating function unit configured in the gap of the fine crack.
  • the decorating functional section may include a decorating functional layer formed between the metal layer and the second surface.
  • the decorating functional section is located between the gap decorating functional section configured in the gap of the fine crack and the metal layer and the second surface, and is integrally formed with the gap decorating functional section.
  • the decorative functional layer may be included.
  • the metal layer may be any one of aluminum, titanium, chromium, and an alloy containing at least one of these.
  • the metal layer may have a thickness of 30 nm or more and 300 nm or less.
  • the fine cracks may be included in a pitch range of 1 ⁇ m or more and 500 ⁇ m or less.
  • the structure may be configured as at least a part of a housing part, a vehicle, or a building.
  • the decoration section may have a fixing layer for fixing the fine cracks.
  • a decorative film according to an aspect of the present technology includes a base film and the decorative portion formed on the base film.
  • a method for manufacturing a structure according to an aspect of the present technology includes forming a metal layer on a base film by vapor deposition. By stretching the base film, fine cracks are formed in the metal layer.
  • a transfer film is formed by adhering a carrier film to the decorative film.
  • a molded component is formed by an in-mold molding method, a hot stamping method, or a vacuum molding method so that the decorative film is transferred from the transfer film.
  • the metal layer in which the fine cracks are formed the gap between the fine cracks, or between the metal layer and the surface opposite to the design surface.
  • a transfer film including at least one light-shielding portion is formed.
  • a molded component is formed by an in-mold molding method, a hot stamping method, or a vacuum molding method so that the metal layer and the light shielding portion separated from the base film are transferred.
  • a molded part is integrally formed with the decorative film by an insert molding method.
  • the base film may be biaxially stretched at a stretching ratio of 5% or less in each axial direction.
  • a method for manufacturing a decorative film according to an aspect of the present technology includes forming a metal layer on a base film by vapor deposition. By stretching the base film, fine cracks are formed in the metal layer. A light-shielding portion is formed in at least one of the gap between the fine cracks and the surface of the metal layer opposite to the design surface.
  • FIG. 1 is a schematic diagram showing a configuration example of a mobile terminal as an electronic device according to an embodiment of the present technology.
  • 1A is a front view showing the front side of the mobile terminal 100
  • FIG. 1B is a perspective view showing the back side of the mobile terminal 100.
  • the mobile terminal 100 has a housing 101 and electronic parts (not shown) housed in the housing 101.
  • a telephone unit 103, a touch panel 104, and a face-to-face camera 105 are provided on the front surface portion 102, which is the front surface side of the housing portion 101.
  • the call unit 103 is provided to talk with the other party of the call, and includes a speaker unit 106 and a voice input unit 107. The voice of the other party is output from the speaker unit 106, and the voice of the user is transmitted to the other party via the voice input unit 107.
  • Various images and GUI are displayed on the touch panel 104.
  • the user can browse a still image or a moving image via the touch panel 104.
  • the user also inputs various touch operations via the touch panel 104.
  • the face-to-face camera 105 is used when photographing the user's face or the like.
  • the specific configuration of each device is not limited.
  • the back surface portion 108 which is the back surface side of the housing portion 101, is provided with a metal decoration portion 10 that is decorated to have a metallic appearance.
  • the metal decoration portion 10 has a metallic appearance and is capable of transmitting radio waves.
  • the decorated region 11 is formed in a predetermined region of the back surface portion 108.
  • the decorative metal film 10 is formed by adhering the decorative film 12 to the decorated region 11. Therefore, the decorated region 11 corresponds to a region in which the metal decorative portion 10 is formed.
  • the decorative film 12 corresponds to the decorative portion.
  • the casing 101 in which the decorated region 11 is formed corresponds to a member.
  • the housing 101 having the decorated area 11 and the decorative film 12 bonded to the decorated area 11 configure the structure according to the present technology as a housing component. Note that the structure according to the present technology may be used for a part of the housing component.
  • the metal decoration portion 10 is partially formed in the approximate center of the back surface portion 108.
  • the position where the metal decoration portion 10 is formed is not limited and may be set appropriately.
  • the metal decoration portion 10 may be formed on the entire back surface portion 108. This allows the entire back surface 108 to have a uniform metallic appearance.
  • the entire back surface portion 108 has a uniform metallic appearance by making the other portions around the metallic decoration portion 10 have an appearance that is substantially the same as that of the metallic decoration portion 10.
  • the position and size of the metal decorative portion 10 and the appearance of other portions may be appropriately set so that the design desired by the user is exhibited.
  • the decorative film 12 bonded to the decorated region 11 has a design surface 12a.
  • the design surface 12a is a surface that can be visually recognized by the user who uses the mobile terminal 100, and is a surface that is one of the elements that configure the appearance (design) of the housing unit 101.
  • the surface on the front surface side of the back surface portion 108 becomes the design surface 12 a of the decorative film 12. That is, the surface opposite to the bonding surface 12b (see FIG. 2) bonded to the decorated region 11 becomes the design surface 12a.
  • the design surface 12a corresponds to the first surface of the decorative portion.
  • the adhesive surface 12b (see FIG. 2) on the side opposite to the design surface 12a corresponds to the second surface on the side opposite to the first surface.
  • the decorative film 12 is adhered to the decorated region 11 such that the design surface 12a is on the front surface side.
  • the antenna unit 15 (see FIG. 2) capable of communicating with an external reader/writer or the like via radio waves is housed.
  • the antenna unit 15 includes, for example, a base substrate (not shown), an antenna coil 16 (see FIG. 2) formed on the base substrate, and a signal processing circuit unit (not shown) electrically connected to the antenna coil 16.
  • a specific configuration of the antenna unit 15 is not limited.
  • the electronic components housed in the casing 101 are not limited, and various electronic components such as IC chips and capacitors may be housed.
  • FIG. 2 is a schematic cross-sectional view showing a configuration example of the metal decoration portion 10.
  • the metal decoration portion 10 is composed of the decorated area 11 formed in the area corresponding to the position of the antenna portion 15 and the like, and the decoration film 12 adhered to the decorated area 11. ..
  • the decorative film 12 has a base film 19, a metal layer 20, a sealing resin 21, and an adhesive layer 18.
  • the base film 19 is made of a material having transparency and stretchability, and a resin film is typically used.
  • a material of the base film 19 for example, PET (polyethylene terephthalate), PC (polycarbonate), PMMA (polymethylmethacrylate), PP (polypropylene) or the like is used. Other materials may be used.
  • the base film 19 is a layer in contact with a metal, if a vinyl chloride-based material is used, for example, free chlorine may accelerate the corrosion of the metal. Therefore, by selecting a non-vinyl chloride material as the base film 19, it is possible to prevent metal corrosion. Of course, it is not limited to this.
  • the surface of the base film 19, that is, the surface of the base film 19 opposite to the surface on the housing 101 side is the design surface 12 a of the decorative film 12.
  • a protective layer, a printed image, etc. may be formed on the base film 19.
  • the surface of the protective layer, the printing layer, or the like becomes the design surface 12a of the decorative film 12.
  • the base film 19 may have a function as a protective layer.
  • the base film 19 may be provided with a decoration function by printing, coloring, or the like. This makes it possible to improve the design.
  • the decoration function includes an arbitrary function for realizing a predetermined design property.
  • an arbitrary decorating function such as a decorating function of expressing a predetermined color or the like by utilizing transmission or reflection of light, a decorating function of visually recognizing a predetermined pattern or pattern by using printing or the like can be given.
  • the decorating function of visually recognizing a predetermined pattern or the like by using printing or the like can be said to be a decorating function using light transmission or reflection.
  • the metal layer 20 is formed so that the decorated region 11 has a metallic appearance.
  • the metal layer 20 is a layer formed on the base film 19 by vacuum vapor deposition, and has a large number of fine cracks (hereinafter referred to as fine cracks) 22 formed therein.
  • a plurality of discontinuous surfaces are formed on the metal layer 20 due to the fine cracks 22, and the surface resistance value is almost in an insulating state. Therefore, it is possible to sufficiently suppress the generation of the eddy current when the radio wave hits the casing 101. As a result, reduction of electromagnetic wave energy due to eddy current loss can be sufficiently suppressed, and high radio wave transparency is realized.
  • the film thickness of the metal layer 20 is set in the range of 30 nm or more and 300 nm or less, for example. If the film thickness is too small, the light is transmitted, so that the reflectance in the visible light region is lowered. If the film thickness is too large, the surface shape is apt to be roughened, and the reflectance is lowered. Further, the smaller the film thickness, the greater the amount of decrease in reflectance after the high temperature and high humidity test (for example, after 75° C. 90% RH48H). RH is relative humidity (Relative Humidity).
  • the film thickness By setting the film thickness within the above range in consideration of these points, it was possible to realize a radio wave transmitting surface that maintains high reflectance. In particular, by setting the film thickness in the range of 30 nm or more and 150 nm or less, high reflectance was sufficiently maintained and high radio wave transmission was exhibited.
  • the thickness is not limited to these ranges, and the film thickness of the metal layer 20 may be appropriately set so that desired characteristics can be exhibited.
  • the optimum numerical range may be set again.
  • the sealing resin 21 functions as a protective layer (hard coat layer) that protects the metal layer 20.
  • the sealing resin 21 is formed by applying, for example, a UV curable resin, a thermosetting resin, a two-component curable resin, or the like. By forming the sealing resin 21, for example, smoothing, antifouling, peeling prevention, scratch prevention, etc. are realized.
  • the protective layer may be coated with acrylic resin or the like. By selecting a non-vinyl chloride material as the sealing resin 21, it is advantageous in preventing metal corrosion.
  • the sealing resin 21 also has a function of fixing the fine cracks 22 in the metal layer 20 and preventing re-adhesion. That is, the sealing resin 21 also functions as a fixed layer. As a result, it becomes possible to exhibit sufficient radio wave transparency, and it is possible to maintain the radio wave transparency for a long time.
  • a layer that functions as a protective layer and a layer that functions as a fixed layer may be formed separately from each other and may be formed on the metal layer 20 as a cover layer having a two-layer structure.
  • the adhesive layer 18 is a layer for adhering the decorative film 12 to the decorated region 11.
  • the adhesive layer 18 is formed by applying an adhesive material to the surface of the sealing resin 21 opposite to the side covering the metal layer 20 (the surface on the side of the housing 101).
  • the type of adhesive material and the coating method are not limited.
  • the surface of the pressure-sensitive adhesive layer 18 that is bonded to the decorated region 11 becomes the bonding surface 12b of the decorative film 12.
  • the decorative film 12 when the decorative film 12 is formed, first, the gloss film 23 including the base film 19 and the metal layer 20 is formed. After that, the sealing resin 21 and the adhesive layer 18 are formed on the glossy film 23.
  • the order in which each layer is formed is not limited to this.
  • FIGS. 3 and 4 are photographs taken by enlarging the surface state of the metal layer 20 of the glossy film 23 with a microscope. Note that the photograph M2 shown in FIG. 4 was taken with the scale (scale) included, but in order to make it easier to recognize the scale, lines are reinforced from the top of the photograph. Of course, the photographs in FIGS. 3 and 4 are examples of the glossy film 23 according to the present technology.
  • the base film 19 is biaxially stretched under the conditions of a stretching ratio (stretching amount with respect to the original size) of 2% and substrate heating of 130° C., whereby the fine cracks 22 are formed.
  • fine cracks 22 are formed on the metal layer 20 in a mesh shape along the biaxial direction. That is, the fine cracks 22 are formed so as to intersect with each other along two directions that are substantially orthogonal to each other.
  • a metal layer 20 in which a high hardness layer made of chromium and a high reflection layer made of aluminum are laminated is formed on the base film 19. Then, the base film 19 is biaxially stretched under the conditions of a stretching rate of 2% and a substrate heating temperature of 130° C., whereby fine cracks 22 are formed.
  • fine cracks 22 are irregularly formed in the metal layer 20.
  • the irregular formation means that the formation mode of the fine cracks 22 has no regularity, and it can be said that the fine cracks 22 are randomly formed.
  • the pitch (crack interval) of the fine cracks 22 is set in the range of 1 ⁇ m or more and 500 ⁇ m or less, for example.
  • the pitch is reduced, the area of the gap (void) of the microcracks 22 relatively increases.
  • the pitch is increased, the area of the gap between the fine cracks 22 is relatively reduced.
  • the pitch is too small, a large amount of light reflected by the surface of the metal layer 20 is generated, which has an effect on design.
  • the radio wave transmittance was found to decrease.
  • the pitch in the range of 1 ⁇ m or more and 500 ⁇ m or less, it was possible to achieve radio wave transparency while maintaining high designability. For example, it becomes possible to sufficiently transmit an electromagnetic wave (wavelength of about 12.2 cm) of 2.45 GHz of WiFi or Bluetooth (registered trademark).
  • the pitch of the fine cracks 22 is not limited to this range, and may be appropriately set so that desired characteristics are exhibited. For example, by setting the pitch in the range of 50 ⁇ m or more and 200 ⁇ m or less, high reflectance and high radio wave transparency were sufficiently exhibited. In addition, for example, an optimum numerical range may be newly set within the range of 1 ⁇ m or more and 500 ⁇ m or less.
  • the surface reflectance of the design surface 12a decreases by about 5%. Can be. Even considering this, by using the decorative film 12 according to the present technology, the surface reflectance can be set to a high value of 65% or more.
  • FIG. 5 is a schematic diagram showing a configuration example of a vacuum vapor deposition device.
  • the vacuum vapor deposition apparatus 200 has a film transport mechanism 201, a partition wall 202, a mounting table 203, and a heating source (not shown) arranged in a vacuum chamber (not shown).
  • the film transport mechanism 201 has a first roll 205, a rotating drum 206, and a second roll 207.
  • the rotary drum 206 rotates to the right, the base film 19 is conveyed from the first roll 205 to the second roll 207 along the peripheral surface of the rotary drum 206.
  • the rotary drum 206 rotates counterclockwise, the base film 19 is conveyed from the second roll 207 to the first roll 205.
  • the mounting table 203 is arranged at a position facing the rotary drum 206.
  • a crucible 208 containing a metal material forming the metal layer 20 formed on the base film 19 is arranged on the mounting table 203.
  • a region of the rotary drum 206 facing the crucible 208 is a film forming region 210.
  • the partition wall 202 regulates the fine particles 91 of the film-forming material 90 that advance at an angle toward the area other than the film-forming area 210.
  • the base film 19 is conveyed with the rotary drum 206 sufficiently cooled.
  • the rotating drum 206 is rotated clockwise, and the base film 19 is conveyed from the first roll 205 toward the second roll 207.
  • the metal material in the crucible 208 is heated by a heating source (not shown) such as a heater, a laser, or an electron gun in accordance with the conveyance of the base film 19. As a result, vapor containing fine particles 91 is generated from the crucible 208. By depositing the fine particles 91 of the metal material contained in the vapor on the base film 19 which advances through the film formation region 210, the metal layer 20 is formed on the base film 19.
  • a heating source such as a heater, a laser, or an electron gun
  • aluminum is contained in the crucible 208 as a metal material.
  • An oxygen introduction mechanism (not shown) is arranged on the upstream side of the film formation region 210 (on the unwinding roll 205 side). Oxygen is blown toward the base film 19 by the oxygen introduction mechanism in accordance with the conveyance of the base film 19 and the heating of the crucible 208 by the heating source. This makes it possible to easily form the metal layer 20 made of the oxygen-added aluminum layer illustrated in FIG.
  • the crucible 208 containing the chromium that constitutes the high hardness layer is placed on the placing table 203. Then, the rotary drum 206 is rotated clockwise, and the base film 19 is conveyed from the first roll 205 toward the second roll 207. The crucible 208 is heated in accordance with the conveyance of the base film 19, and a high hardness layer made of chromium is formed on the base film 19.
  • the crucible 208 containing aluminum which is a metal forming the high-reflection layer, is mounted on the mounting table 203.
  • the rotary drum 206 is rotated counterclockwise, and the base film 19 having the high hardness layer formed thereon is conveyed from the second roll 207 to the first roll 205.
  • the high reflection layer is formed on the high hardness layer. This makes it possible to easily form the metal layer 20 in which the high hardness layer made of chromium and the high reflection layer made of aluminum are laminated as illustrated in FIG.
  • FIG. 6 is a schematic diagram showing a configuration example of a biaxial stretching device.
  • the biaxial stretching device 250 includes a base member 251 and four stretching mechanisms 252 arranged on the base member 251 and having substantially the same configuration.
  • the four stretching mechanisms 252 are arranged so that two of each of the two axes (x axis and y axis) orthogonal to each other are opposed to each other on each axis.
  • description will be given with reference to the stretching mechanism 252a that stretches the glossy film 23' in the direction opposite to the arrow in the y-axis direction.
  • the stretching mechanism 252a has a fixed block 253, a movable block 254, and a plurality of clips 255.
  • the fixed block 253 is fixed to the base member 251.
  • a stretching screw 256 extending in the stretching direction (y direction) penetrates through the fixed block 253.
  • the movable block 254 is movably arranged on the base member 251.
  • the movable block 254 is connected to an extension screw 256 penetrating the fixed block 253. Therefore, by operating the extension screw 256, the movable block 254 can be moved in the y direction.
  • the plurality of clips 255 are arranged along the direction (x direction) orthogonal to the stretching direction.
  • a slide shaft 257 extending in the x direction penetrates each of the plurality of clips 255.
  • the position of each clip 255 can be changed along the slide shaft 257 in the x direction.
  • Each of the plurality of clips 255 and the movable block 254 are connected by a connecting link 258 and a connecting pin 259.
  • Draw ratio is controlled by the operation amount of draw screw 256.
  • the stretching ratio can also be controlled by appropriately setting the number and positions of the plurality of clips 255, the length of the connecting link 258, and the like.
  • the configuration of the biaxial stretching device 250 is not limited.
  • the biaxial stretching device 250 according to the present embodiment biaxially stretches a film by full-cut sheets, but it is also possible to continuously roll biaxially with a roll.
  • continuous biaxial stretching is possible by applying tension in the running direction between the rolls and a clip 255 provided between the rolls and moving in synchronization with the running to give tension perpendicular to the running direction.
  • the gloss film 23' after vacuum deposition is arranged on the base member 251, and a plurality of clips 255 of the stretching mechanism 252 are attached to each of the four sides. Biaxial stretching is performed by operating the four stretching screws 256 while the gloss film 23' is heated by a temperature-controlled heating lamp or a temperature-controlled hot air (not shown).
  • the base film 19 is biaxially stretched under the conditions of a stretching rate of 2% in each axial direction and substrate heating of 130°C.
  • mesh-like fine cracks 22 are formed along the direction (biaxial direction) orthogonal to the stretching direction.
  • fine cracks 22 are irregularly formed.
  • the stretching ratio is too low, appropriate fine cracks 22 will not be formed, and the metal layer 20 will have conductivity. In this case, due to the influence of eddy current and the like, sufficient radio wave transmission cannot be exhibited.
  • the stretching ratio is too large, damage to the base film 19 after stretching becomes large.
  • the yield may be deteriorated due to the trapping of air or the generation of wrinkles.
  • the design of the metal decorative portion 10 may be deteriorated due to the deformation of the base film 19 and the metal layer 20 itself. This problem can also occur when the metal layer 20 is peeled from the base film 19 and transferred.
  • the fine cracks 22 can be properly formed at a low stretch ratio of 2% or less in each axis direction. This makes it possible to sufficiently prevent damage to the base film 19 and improve the yield.
  • the design of the metal decoration portion 10 to which the decoration film 12 is bonded can be maintained high.
  • the stretching ratio can be appropriately set, and if the above-mentioned problems do not occur, a stretching ratio of 2% or more may be set. For example, if the stretching ratio is in the range of 5% or less, it is possible to properly form the fine cracks 22 with a high yield without causing the above problems. Of course, a value larger than 5% may be set.
  • the sealing resin 21 is made of a transparent material having high light transmittance.
  • the gap between the fine cracks 22 becomes a region having light transparency.
  • the design surface 12a is irradiated with light from the outside, the light is transmitted through the gaps of the fine cracks 22, so that the reflectance of the design surface 12a may decrease.
  • the inventor configures a light shielding portion that shields light in at least one of the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface).
  • a light blocking portion that blocks light in the visible light region is configured.
  • the light blocking in the present disclosure is not limited to the case of completely blocking light as in the case of complete light blocking, and also includes the case of allowing light transmission within a range that does not impair the effects of the present technology.
  • the light shielding in the present disclosure is a concept including absorbing light and reflecting light.
  • the light shielding in the present disclosure can be expressed as the light transmittance being equal to or less than a predetermined threshold value (for example, 10%). Of course, it is not limited to this.
  • the sealing resin 21 is formed of a light shielding material having a light shielding property. This makes it possible to fill the gaps between the fine cracks 22 with the light-shielding material.
  • a layer made of a light shielding material can be realized between the metal layer 20 and the adhesive surface 12b.
  • the light-shielding material formed in the gaps of the fine cracks 22 is hereinafter referred to as a gap light-shielding portion 31.
  • a layer of light-shielding material formed between the metal layer 20 and the adhesive surface 12b is referred to as a light-shielding layer 32.
  • the gloss film 23 is formed, and the fine cracks 22 are formed by stretching.
  • a resin made of a light shielding material is applied so as to cover the metal layer 20 to form the sealing resin 21.
  • the light shielding portion 30 is configured by the sealing resin 21 that functions as the gap light shielding portion 31 and the light shielding layer 32.
  • the light-shielding portion 30 By configuring the light-shielding portion 30, it is possible to sufficiently suppress the light that passes through the gaps between the fine cracks 22 and realize a metallic luster having a high reflectance. Further, it becomes possible to sufficiently suppress unnecessary leakage light from the inside of the casing 101. As a result, it is possible to realize extremely high designability.
  • the state where the sealing resin 21 is formed on the metal layer 20 so as to fill the gaps of the fine cracks 22 is formed so that the sealing resin 21 is the same layer as the metal layer 20. It can also be said that it is in the state of being.
  • FIG. 7 and 8 are schematic diagrams showing another configuration example of the light shielding unit.
  • the sealing resin 21 functioning as the light shielding portion 30 can be provided with an adhesive function.
  • the adhesive layer 18 can be omitted, and the manufacturing process can be simplified.
  • the gap light-shielding portion 31 may be configured as the light-shielding portion 30.
  • the gloss film 23 is formed, and the fine cracks 22 are formed by stretching. After that, by applying a light-shielding material so as to fill the gaps of the fine cracks 22, the gap light-shielding portions 31 are formed.
  • the sealing resin 21 is formed by applying a resin so as to cover the metal layer 20 and the gap light-shielding portion 31.
  • the sealing resin 21 is formed of a material that does not have a light shielding property.
  • the light-shielding portion 30 can sufficiently suppress the light that passes through the gaps of the fine cracks 22 and sufficiently suppress unnecessary leaked light from the inside. As a result, it is possible to realize extremely high designability.
  • the sealing resin 21 is formed of a light blocking material, it can function as the light blocking layer 32.
  • the state in which the gap light-shielding portion 31 is formed in the gap between the fine cracks 22 may be referred to as the state in which the gap light-shielding portion 31 is formed so as to be in the same layer as the metal layer 20. It is possible.
  • only the light shielding layer 32 may be configured as the light shielding unit 30.
  • the sealing resin 21 is formed so as to cover the metal layer 20.
  • the light-shielding material 32 is applied to the surface of the sealing resin 21 opposite to the side covering the metal layer 20 to form the light-shielding layer 32.
  • the adhesive layer 18 is formed on the light shielding layer 32.
  • the gap light shielding unit 31 and the light shielding layer 32 may be separately configured.
  • the light-shielding material is applied so as to fill the gaps between the fine cracks 22 to form the gap light-shielding portions 31.
  • the sealing resin 21 is formed, the light shielding layer 32 is formed by applying a light shielding material to the surface of the sealing resin 21 opposite to the side covering the metal layer 20. Even with such a configuration, high designability can be realized.
  • the adhesive layer 18 is formed on the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed. Then, the base film 19 side of the decorative film 12 is bonded to the decorated region 11 of the housing 101. Therefore, the surface of the sealing resin 21 opposite to the side covering the metal layer 20 becomes the design surface 12 a of the decorative film 12.
  • the base film 19 is formed of a light shielding material.
  • the light shielding layer 32 can be easily formed as the light shielding portion 30. As a result, unnecessary leakage of light from the inside can be sufficiently suppressed, and high designability can be realized.
  • the adhesive layer 18 and the sealing resin 21 may be omitted depending on the molding conditions of the housing 101 and the like.
  • the gloss film 23 is bonded to the decorated region 11 as a decorative film according to the present technology.
  • the light shielding portion 30 is realized by the base film 19.
  • the present invention is not limited to this, and as shown in FIG. 8C, the gap light-shielding portion 31 and the light-shielding layer 32 may be newly added.
  • the gap light-shielding portion 31 is formed by applying the light-shielding material so as to fill the gaps between the fine cracks 22 after the fine cracks 22 are formed by stretching, for example.
  • the light-shielding material 32 is applied to the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed, whereby the light-shielding layer 32 is formed. Even with such a configuration, high designability can be realized. Of course, only one of the gap light-shielding portion 31 and the light-shielding layer 32 may be formed.
  • any material may be used as the light-shielding material used to realize the light-shielding portion 30 (the gap light-shielding portion 31, the light-shielding layer 32).
  • the light-shielding portion 30 is realized by an element having other functions such as the sealing resin 21 and the base film 19, the material may be appropriately selected so that the other functions are also exhibited.
  • the light shielding portion 30 is formed in at least one of the gaps of the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface).
  • the light-shielding portion 30 formed on at least one of the metal layer 20 in which the fine cracks 22 are formed and the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface).
  • the decorative film 12 including and is formed. This makes it possible to suppress the light transmitted through the gaps of the fine cracks 22. As a result, it is possible to realize the housing portion 101 having a metallic appearance and a high design property that allows transmission of radio waves.
  • the inventor provides a decorating function portion having a decorating function in at least one of the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). Invented to make up anew. Specifically, a decoration function unit having a decoration function using at least one of transmission and reflection of light is configured.
  • the transmitted light transmitted through the decoration function unit or the reflected light reflected by the decoration function unit is used to realize a predetermined design property. It includes any configuration capable of functioning.
  • a light-transmissive member or layer that is colored with a predetermined color can function as a decorative function unit that can express the color. Further, it has a laminated structure, and the light emitted from one layer by transmission or reflection causes interference by the other layer. By utilizing this light interference, it is possible to achieve a predetermined design property such as color adjustment.
  • a member, layer, or the like having such a laminated structure can function as a decoration function unit.
  • the print layer and the like can also function as the decoration function unit.
  • the sealing resin 21 is formed as the decorative function part 40 having a decorative function. This makes it possible to fill the gaps between the fine cracks 22 with a material having a decorating function. In addition, a layer made of a material having a decorating function can be realized between the metal layer 20 and the adhesive surface 12b.
  • a material having a decoration function part formed in the gap of the fine crack 22 is referred to as a gap decoration function part 41.
  • a layer having a decorative function diagram formed between the metal layer 20 and the adhesive surface 12b is referred to as a decorative function layer 42.
  • the configuration illustrated in FIG. 9 includes the light-shielding portion 30 (the gap light-shielding portion 31, the light-shielding layer 32), the decoration function portion 40 (the gap decoration function portion 41, the decoration This corresponds to the one obtained by replacing the functional layer 42).
  • the configuration is not limited to this.
  • the gloss film 23 is formed, and the fine cracks 22 are formed by stretching.
  • a resin made of a material having a decorating function is applied so as to cover the metal layer 20 to form the sealing resin 21. This makes it possible to easily form the gap decoration function part 41 and the decoration function layer 42 integrally.
  • the sealing resin 21 that functions as the gap decoration function section 41 and the decoration function layer 42 configures the decoration function section 40.
  • the decoration function unit 40 By configuring the decoration function unit 40, light that enters the gap between the fine cracks 22 from the outside and light that enters the gap between the fine cracks 22 from the inside is positively used to improve the design. It becomes possible.
  • the designability of the design surface 12a by using the transmitted light that passes through the decoration function part 40 (the gap decoration function part 41 and the decoration function layer 42). Further, it is possible to improve the designability of the design surface 12a by using the reflected light reflected by the decoration function part 40 (the gap decoration function part 41, the decoration function layer 42). In addition, it is also possible to reflect the light transmitted through the gap decoration function unit 41 by the decoration function layer 42 and transmit the light through the gap decoration function unit 41 again.
  • design example a design in which the fine cracks 22 are colored, or a design in which light decorated from the fine cracks 22 is transmitted is considered. Of course, it is not limited to such a design.
  • the decoration function section 40 By configuring the decoration function section 40 in this way, it is possible to control the influence of the light incident on the gaps of the microcracks 22 on the design. As a result, it is possible to realize extremely high designability. Since the decorative function section 40 is formed in the same layer or a back layer (inner layer) with respect to the metal layer 20, it is easy to arrange the metal layer 20 on the front surface side (design surface side). Become. As a result, it is possible to realize a metallic luster having a high reflectance.
  • FIGS. 10 and 11 are schematic diagrams showing another configuration example of the decoration function unit.
  • the configuration illustrated in FIGS. 10 and 11 corresponds to the decorative film 12 illustrated in FIGS. 7 and 8 in which the light shielding unit 30 is replaced with the decorative function unit 40.
  • FIGS. 7 and 8 are schematic diagrams showing another configuration example of the decoration function unit.
  • the sealing resin 21 functioning as the decoration function unit 40 can be provided with an adhesive function.
  • the adhesive layer 18 can be omitted, and the manufacturing process can be simplified.
  • the gap decoration function unit 41 may be configured as the decoration function unit 40.
  • the gloss film 23 is formed, and the fine cracks 22 are formed by stretching. Thereafter, a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 to form the gap decorating function part 41.
  • the sealing resin 21 is formed by applying a resin so as to cover the metal layer 20 and the gap decoration function part 41.
  • the sealing resin 21 is formed of a material having no decoration function.
  • the decorative function unit 40 positively utilizes light that enters the gap between the fine cracks 22 from the outside and light that enters the gap between the fine cracks 22 from the inside to improve the design. It is possible to improve.
  • the sealing resin 21 is made of a material having a decoration function, it can function as the decoration function layer 42.
  • only the decorative function layer 42 may be configured as the decorative function unit 40.
  • the light-transmitting sealing resin 21 is formed so as to cover the metal layer 20.
  • the decorative functional layer 42 is formed by applying a material having a decorative function to the surface of the sealing resin 21 opposite to the side covering the metal layer 20.
  • the adhesive layer 18 is formed on the decorative functional layer 42.
  • the gap decoration function section 41 and the decoration function layer 42 may be separately configured.
  • a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 to form the gap decorating function part 41.
  • a decorative function layer 42 is formed by applying a material having a decorative function to the surface of the sealing resin 21 opposite to the side covering the metal layer 20. Even with such a configuration, high designability can be realized.
  • the adhesive layer 18 is formed on the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed. Then, the base film 19 side of the decorative film 12 is bonded to the decorated region 11 of the housing 101. Therefore, the surface of the sealing resin 21 opposite to the side covering the metal layer 20 becomes the design surface 12 a of the decorative film 12.
  • the base film 19 is formed of a material having a decorating function.
  • the decorative function layer 42 can be easily formed as the decorative function section 40.
  • the adhesive layer 18 and the sealing resin 21 may be omitted depending on the molding conditions of the housing 101 and the like.
  • the gloss film 23 is bonded to the decorated region 11 as a decorative film according to the present technology.
  • the decorative function unit 40 is realized by the base film 19.
  • the present invention is not limited to this, and as shown in FIG. 11C, the gap decoration function part 41 and the decoration function layer 42 may be newly added.
  • a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 to form the gap decorating function part 41.
  • the decorative function layer 42 is formed by applying a material having a decorative function to the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed. Even with such a configuration, high designability can be realized. Of course, only one of the gap decoration function part 41 and the decoration function layer 42 may be formed.
  • any material may be used as a material having a decorating function used to realize the decorating functional unit 40 (the gap decorating functional unit 41, the decorating functional layer 42).
  • the decorative function section 40 is realized by an element having another function such as the sealing resin 21 and the base film 19, the material may be appropriately selected so that the other function is also exhibited.
  • the decoration function part 40 is provided in at least one of the gaps of the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface).
  • the decorating function configured in at least one of the metal layer 20 in which the fine cracks 22 are formed and the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface).
  • the decorative film 12 including the part 40 is formed. This makes it possible to improve the design by positively utilizing the light that enters the gap between the fine cracks 22 from the outside and the light that enters the gap between the fine cracks 22 from the inside. As a result, it is possible to realize the housing portion 101 having a metallic appearance and a high design property that allows transmission of radio waves.
  • FIG. 12 is a schematic diagram showing a configuration example in which the light shielding unit 30 and the decoration function unit 40 are combined.
  • a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 so that the gap decorating function part 41 decorates. It is formed as the functional unit 40.
  • a light shielding material is applied to the surface of the sealing resin 21 opposite to the side covering the metal layer 20, so that the light shielding layer 32 is formed as the light shielding portion 30.
  • the sealing resin 21 may be formed of a material having a decorating function, and the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the sealing resin 21. In this case, the gap decoration function part 41, the decoration function layer 42, and the light shielding layer 32 can be easily formed.
  • the sealing resin 21 may be formed as the light shielding layer 32 of a light shielding material after forming the gap decoration function portion 41.
  • a combination of the decorative functional layer 42 and the light shielding layer 32 is also possible.
  • the decorative functional layer 42 is formed on the back layer (inner layer) of the sealing resin 21.
  • the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the decorative function layer 42.
  • any configuration may be adopted.
  • a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 so that the gap decorating function unit 41 decorates. It is formed as the functional unit 40. Further, the light-shielding material is applied to the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed, whereby the light-shielding layer 32 is formed as the light-shielding portion 30. Even with such a configuration, high designability can be realized.
  • the base film 19 may be formed of a material having a decorating function, and the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the base film 19.
  • the gap decoration function part 41, the decoration function layer 42, and the light shielding layer 32 can be easily formed.
  • the base film 19 may be formed of a light-shielding material, and the gap decoration function part 41 may be formed in the gap between the fine cracks 22.
  • a combination of the decorative functional layer 42 and the light shielding layer 32 is also possible.
  • the decorative functional layer 42 is formed on the back layer (inner layer) of the base film 19.
  • the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the decorative function layer 42.
  • any configuration may be adopted.
  • the light shielding portion 30 is formed in at least one of the gaps between the fine cracks 22 or between the metal layer 20 and the adhesive surface 12b (second surface). Further, the decorating function part 40 is formed in at least one of the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). That is, the light shielding unit 30 and the decoration function unit 40 are combined. As a result, it is possible to realize the housing portion 101 having a metallic appearance and a high design property that allows transmission of radio waves.
  • FIG. 13 is a schematic diagram for explaining the in-mold molding method.
  • the in-mold molding is performed by a molding device 300 having a cavity mold 301 and a core mold 302 as shown in FIG.
  • the cavity mold 301 is provided with a recess 303 corresponding to the shape of the casing 101.
  • the transfer film 50 is arranged so as to cover the recess 303.
  • the transfer film 50 is formed by adhering the decorative film 12 shown in FIG.
  • the transfer film 50 is supplied from the outside of the molding apparatus 300 by, for example, a roll-to-roll method.
  • the cavity mold 301 and the core mold 302 are clamped, and the molding resin 55 is injected into the recess 303 through the gate portion 306 formed on the core mold 302.
  • the cavity mold 301 is formed with a sprue portion 508 to which the molding resin 55 is supplied and a runner portion 509 connected to the sprue portion 508.
  • the runner portion 509 and the gate portion 306 are connected.
  • the molding resin 55 supplied to the sprue portion 508 is injected into the recess 303.
  • the structure for injecting the molding resin 55 is not limited.
  • the molding resin 55 for example, a general-purpose resin such as ABS (acrylonitrile-butadiene-styrene) resin, a PC resin, an engineering plastic such as a mixed resin of ABS and PC, and the like are used.
  • the material and color (transparency) of the molding resin may be appropriately selected so as to obtain a desired housing part (housing part) without being limited thereto.
  • the molding resin 55 is injected into the recess 303 while being melted at a high temperature.
  • the molding resin 55 is injected so as to press the inner surface of the recess 303.
  • the transfer film 50 disposed in the recess 303 is pressed by the molding resin 55 to be deformed.
  • the adhesive layer 18 formed on the transfer film 50 is melted by the heat of the molding resin 55, and the decorative film 12 is bonded to the surface of the molding resin 55.
  • the molding resin 55 is injected, the cavity mold 301 and the core mold 302 are cooled and the clamp is released.
  • the molding resin 55 to which the decorative film 12 is transferred is attached to the core mold 302.
  • the housing 101 in which the metal decorative portion 10 is formed in a predetermined region is manufactured.
  • the carrier film 51 is peeled off when the clamp is released.
  • the positioning of the decorative film 12 becomes easy, and the metal decorative portion 10 can be easily formed. Further, the degree of freedom in designing the shape of the casing 101 is high, and the casing 101 having various shapes can be manufactured.
  • the antenna unit 15 housed inside the housing unit 101 may be attached by an in-mold molding method when the housing unit 101 is molded. Alternatively, the antenna unit 15 may be attached to the inside of the housing unit 101 after the housing unit 101 is molded. In addition, the antenna unit 15 may be built in the housing.
  • FIG. 14 is a schematic diagram for explaining the insert molding method.
  • the decorative film 12 is arranged as an insert film in the cavity mold 351 of the molding device 350.
  • the cavity mold 351 and the core mold 352 are clamped, and the molding resin 55 is injected into the cavity mold 351 via the gate portion 356.
  • the casing 101 is formed integrally with the decorative film 12.
  • the metal decoration portion 10 can be easily formed by using the insert molding method.
  • the casing 101 having various shapes can be manufactured.
  • the configuration of the molding device that performs in-mold molding and insert molding is not limited.
  • FIG. 15 is a schematic diagram showing a configuration example of a transfer film including a base film and a metal layer.
  • the transfer film 450 includes a base film 419, a peeling layer 481, a hard coat layer 482, a metal layer 420, a sealing resin 421, and an adhesive layer 418.
  • the peeling layer 481 and the hard coat layer 482 are formed on the base film 419 in this order.
  • the metal layer 420 is formed on the base film 419 on which the peeling layer 481 and the hard coat layer 482 are formed. Then, by stretching the base film 419, fine cracks 422 are formed in the metal layer 420.
  • the sealing resin 421 is configured as a light shielding portion or a decoration function portion. Of course, it is not limited to such a configuration.
  • the base film 419 and the peeling layer 481 are peeled off, and the metal layer 420 and the light shielding portion (or the decoration function portion) are included.
  • the decorative portion 412 is bonded to the decorated region 411.
  • the base film 419 may be used as a carrier film.
  • the base film 419 on which the peeling layer 481 is formed can be regarded as the base film according to the present technology.
  • the decorative portion 412 separated from the base film 419 can also be referred to as a decorative film.
  • the vapor deposition start surface of the metal layer 420 is the design surface 412a side
  • the vapor deposition end surface is the adhesion surface 412b side.
  • the transfer film may be formed so that the vapor deposition end surface becomes the design surface 412a side and the vapor deposition start surface becomes the adhesive surface 412b side surface.
  • a decorative film (decorative part) including the metal layer 20 and the light shielding part (or the decorative functional part) in the decorated region 11 by the hot stamping method using the transfer films 50 and 450 shown in FIGS. 13 and 15. )12 may be transferred to form the casing 101.
  • the decorative film 12 may be adhered to the housing 101 by an arbitrary method such as sticking. Further, vacuum forming, pressure forming and the like may be used.
  • the metal material to which the present technology can be applied is not limited to aluminum, and other metal materials such as silver (Ag) may be used.
  • silver Ag
  • metal material aluminum, titanium, chromium, or an alloy containing at least one of these as the metal material.
  • These metals are so-called valve metals, and it becomes possible to sufficiently exert the effect of preventing oxidation by the oxide film. As a result, high designability can be maintained for a long time.
  • the element to be added is not limited to oxygen, and nitrogen (N) may be added, for example.
  • nitrogen (N) may be added, for example.
  • a nitrogen introduction mechanism may be arranged and nitrogen may be blown as the introduction gas.
  • the supply amount may be appropriately set within a range from the addition amount at which the surface of the metal film becomes insulating after the stretching step to the nitriding of the metal layer. For example, high designability is exhibited by changing the addition concentration of nitrogen in the film thickness direction. Further, by setting the ratio of the metal that has not been combined with nitrogen in the vicinity of both surfaces of the metal layer to a predetermined threshold value or more, it becomes possible to prevent the progress of nitriding. Note that other elements may be added.
  • the reflectance is about 50% to 60%. This is due to the optical constants of the materials, and it is very difficult to realize a reflectance of 70% or more like the gloss film 23 according to this embodiment. Further, In is a rare metal, so that material cost is required.
  • a film of a metal material is formed by vacuum deposition, it is possible to use a material such as Al or Ti that is difficult to form on a resin by wet plating such as electroless plating. Therefore, the selection range of usable metal materials is very wide, and metal materials having high reflectance can be used. Further, since the fine cracks 22 are formed by biaxial stretching, it is possible to form the metal layer 20 with high adhesion in vacuum vapor deposition. As a result, during in-mold molding or insert molding, it is possible to properly mold the casing 101 without the metal layer 20 flowing down. Further, the durability of the metal decoration portion 10 itself can be improved.
  • the method for forming the metal layer to which oxygen or nitrogen is added is not limited to the case of blowing a gas toward the film transport mechanism 201.
  • the metal material in the crucible may contain oxygen or the like.
  • Such technology can be applied to almost all electronic devices that have a built-in antenna and the like housed inside.
  • electronic devices include mobile phones, smartphones, personal computers, game machines, digital cameras, audio devices, TVs, projectors, car navigation systems, GPS terminals, wearable information devices (glasses type, wristband type), and other electronic devices.
  • a remote controller for operating the vehicle by wireless communication or the like an operating device such as a mouse or a touch pen, an electronic device provided in the vehicle such as an in-vehicle radar or an in-vehicle antenna. It is also applicable to IoT devices connected to the Internet or the like.
  • the present technology is not limited to housing parts such as electronic devices, but can be applied to vehicles and buildings. That is, the structure including the decorative portion according to the present technology and the member having the decorated region to which the decorative portion is bonded may be used for all or part of a vehicle or a building. As a result, it is possible to realize a vehicle or a building having a wall surface or the like that can transmit radio waves while having a metallic appearance, and it is possible to exhibit extremely high designability.
  • the vehicle includes any vehicle such as a car, a bus, and a train.
  • the building includes any building such as a detached house, an apartment house, a facility, and a bridge.
  • the method for forming the fine cracks 22 is not limited.
  • the present technique Even when a thin film having an island structure of In or Sn is used, or when a crack is generated in a metal film such as nickel or copper by performing post-baking using electroless plating, the present technique The designability can be improved by configuring the light-shielding portion and the decoration function portion according to the above.
  • FIG. 16 is a sectional view showing a configuration example of a glossy film according to another embodiment.
  • the support layer 550 having a tensile breaking strength smaller than that of the metal layer 520 is provided as a layer that supports the metal layer 520.
  • the stretching ratio required for forming the fine cracks 522 For example, it is possible to form the fine cracks 522 at a draw ratio smaller than the draw ratio required to break the metal layer 520 itself (mainly the high hardness layer etc.). It is considered that this is because, as shown in FIGS. 16A and 16B, the metal layer 520 ruptures following the rupture of the surface of the support layers 550A and 550 having low tensile rupture strength.
  • a base film having a small tensile breaking strength may be used as the supporting layer 550A.
  • the tensile breaking strength of biaxially stretched PET is about 200 to about 250 MPa, which is often higher than the tensile breaking strength of the metal layer 520.
  • the tensile breaking strengths of unstretched PET, PC, PMMA, and PP are as follows.
  • a non-vinyl chloride material as the support layer 550A, it is advantageous to prevent metal corrosion.
  • a coating layer may be formed on the base film 519.
  • the hard coat layer can be easily formed as the support layer 550B.
  • FIG. 17 is a diagram showing the relationship between the thickness of the coating layer formed as the support layer 550B and the pitch (crack interval) of the fine cracks 522 formed in the metal layer 520.
  • FIG. 17 shows the relationship when an acrylic layer is formed as a coating layer.
  • the pitch of the fine cracks 522 was 50 ⁇ m to 100 ⁇ m.
  • the thickness of the acrylic layer was set in the range of 1 ⁇ m to 5 ⁇ m, the pitch of the fine cracks 522 was 100 ⁇ m to 200 ⁇ m.
  • the pitch of the fine cracks 522 can be adjusted.
  • the thickness of the acrylic layer is not limited to this range, and for example, an optimum numerical range may be newly set within a range of 0.1 ⁇ m or more and 10 ⁇ m or less.
  • any configuration may be adopted in order to realize the light shielding unit and the decoration function unit.
  • Extending for forming fine cracks is not limited to biaxial stretching. Uniaxial stretching or triaxial or more stretching may be performed. Further, the base film 19 wound on the second roll 207 shown in FIG. 5 may be biaxially stretched by a roll-to-roll method. After further vacuum deposition, biaxial stretching may be performed before being wound on the second roll 207.
  • the present technology can also take the following configurations.
  • the light-shielding portion is a gap light-shielding portion formed in a gap of the minute crack, and a light-shielding layer located between the metal layer and the second surface and integrally formed with the gap light-shielding portion.
  • a structure that contains. The structure according to (1), The said decoration part is a structure containing the decoration function part which has a decoration function comprised in the clearance gap of the said minute crack, or at least one between the said metal layer and the said 2nd surface.
  • the decorating function section is a structure having a decorating function utilizing at least one of transmission and reflection of light.
  • the decorating functional unit is a structure including a gap decorating functional unit configured in a gap of the fine crack.
  • the said decoration functional part is a structure containing the decoration functional layer comprised between the said metal layer and the said 2nd surface.
  • the decorating functional section is located between the gap decorating functional section configured in the gap of the fine crack and the metal layer and the second surface, and is integrally formed with the gap decorating functional section.
  • a structure including a decorative functional layer configured.
  • the structure according to any one of (1) to (10), The metal layer is a structure having a thickness of 30 nm or more and 300 nm or less.
  • the structure according to any one of (1) to (11), The fine cracks are structures included in a pitch range of 1 ⁇ m to 500 ⁇ m.
  • the structure according to any one of (1) to (13), The said decoration part is a structure body which has a fixed layer which fixes the said fine crack.
  • a base film Formed on the base film, The first side, A second surface opposite the first surface; A metal layer having fine cracks, A decorative portion having a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and the second surface.
  • the above-mentioned decoration part is a structure which has a supporting layer which has a tensile breaking strength smaller than the above-mentioned metal layer and supports the above-mentioned metal layer.
  • the manufacturing method according to any one of (16) to (19), The step of forming the metal layer is a method for manufacturing a structure, in which vacuum deposition is performed on the base film conveyed along a peripheral surface of a rotary drum from a winding roll to a winding roll.

Abstract

A structure according to an embodiment of the present technology is provided with a decoration part and a member. The decoration part has a first surface, a second surface, a metal layer, and a light shielding portion. The second surface is a surface on the reverse side of the first surface. The metal layer has fine cracks. The light shielding portion is formed in at least one among a gap between the fine cracks or a region between the metal layer and the second surface. The member has a region to be decorated to which the decoration part is adhered so that the first surface serves as the front-surface side.

Description

構造体、加飾フィルム、構造体の製造方法、及び加飾フィルムの製造方法Structure, decorative film, method of manufacturing structure, and method of manufacturing decorative film
 本技術は、電子機器や車両等に適用可能な構造体、加飾フィルム、構造体の製造方法、及び加飾フィルムの製造方法に関する。 The present technology relates to a structure, a decorative film, a method for manufacturing the structure, and a method for manufacturing the decorative film that can be applied to electronic devices, vehicles, and the like.
 従来、電子機器等の筐体部品として、金属的な外観を有しつつもミリ波等の電磁波を透過可能である部材が考案されている。例えば特許文献1には、自動車のエンブレムに自動車レーダーを搭載するための外装部品について開示されている。例えば樹脂フィルム上にインジウムが蒸着され、このフィルムがインサートモールド法により、エンブレムの表層に取り付けられる。これにより装飾的に金属光沢を持ち、かつインジウムの島状構造によって電磁波周波数帯で吸収域を持たない外装部品を製造することが可能となっている(特許文献1の明細書段落[0006]等)。 Conventionally, a member that has a metallic appearance and is capable of transmitting electromagnetic waves such as millimeter waves has been devised as a case component for electronic devices and the like. For example, Patent Document 1 discloses an exterior part for mounting an automobile radar on an emblem of an automobile. For example, indium is vapor-deposited on a resin film, and this film is attached to the surface layer of the emblem by the insert molding method. This makes it possible to manufacture an exterior part that has a decorative metallic luster and does not have an absorption band in the electromagnetic wave frequency band due to the island-shaped structure of indium (paragraph [0006] in the specification of Patent Document 1, etc.). ).
 しかしながらインジウムの島状構造を形成する方法では、蒸着面積が大きい場合等において、全体に均一な膜厚を作るのが難しいという問題がある。また筐体部品を成形する際に、流し込まれる樹脂の温度により、容易に島状構造が破壊されてしまうという問題もある(特許文献1の明細書段落[0007][0008]等)。 However, the method of forming the island-shaped structure of indium has a problem that it is difficult to form a uniform film thickness on the whole when the deposition area is large. There is also a problem that the island-shaped structure is easily destroyed by the temperature of the poured resin when molding the housing component (paragraphs [0007] [0008] in the specification of Patent Document 1).
 この問題を解決するために特許文献1には、以下の技術が開示されている。すなわち金属領域を島とし、この島をとりまく無金属領域を海とした海島構造を、人工的に規則性をもたせて形成する。そして各金属領域を無金属領域で互いに絶縁するとともに、金属領域の面積及び隣接する金属領域との間隔を適正に制御する。これにより、インジウムが蒸着されたフィルムと遜色のない電磁波透過性の材料が得られるとのことである(特許文献1の明細書段落[0013]等)。 In order to solve this problem, Patent Document 1 discloses the following technique. That is, a sea-island structure in which a metal region is an island and a metal-free region surrounding the island is the sea is artificially formed with regularity. The metal regions are insulated from each other by the non-metal regions, and the area of the metal regions and the space between the metal regions adjacent to each other are appropriately controlled. According to this, an electromagnetic wave transmitting material which is comparable to the film on which indium is vapor-deposited can be obtained (paragraph [0013] in the specification of Patent Document 1).
特開2010-251899号公報JP, 2010-251899, A
 このように金属の光沢を有しつつも電波を透過可能であり、さらに意匠性の高い部材を製造するための技術が求められている。 There is a demand for a technology for manufacturing components that have a metallic luster and can transmit radio waves, and that are highly aesthetic.
 以上のような事情に鑑み、本技術の目的は、金属的な外観を有しつつも電波を透過可能な意匠性の高い構造体、加飾フィルム、構造体の製造方法、及び加飾フィルムの製造方法を提供することにある。 In view of the circumstances as described above, an object of the present technology is to provide a structure having a metallic appearance and a high design property capable of transmitting radio waves, a decorative film, a method for manufacturing the structure, and a decorative film. It is to provide a manufacturing method.
 上記目的を達成するため、本技術の一形態に係る構造体は、加飾部と、部材とを具備する。
 前記加飾部は、第1の面と、第2の面と、金属層と、遮光部とを有する。
 前記第2の面は、前記第1の面とは反対側の面である。
 前記金属層は、微細なクラックを有する。
 前記遮光部は、前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成される。
 前記部材は、前記第1の面が表面側となるように前記加飾部が接着される被加飾領域を有する。
In order to achieve the above-mentioned object, a structure concerning one form of this art is provided with a decoration part and a member.
The decorating section has a first surface, a second surface, a metal layer, and a light shielding section.
The second surface is a surface opposite to the first surface.
The metal layer has fine cracks.
The light shielding portion is formed in at least one of the gap between the fine cracks or between the metal layer and the second surface.
The member has a decorated region to which the decorative portion is adhered so that the first surface is on the front surface side.
 この構造体では、微細なクラックの隙間、又は金属層と第2の面との間の少なくとも一方に遮光部が構成される。これにより微細なクラックの隙間を透過する光を抑制することが可能となる。この結果、金属的な外観を有しつつも電波を透過可能な意匠性の高い構造体を実現することができる。 In this structure, a light shielding part is formed in at least one of the gap between the fine cracks or between the metal layer and the second surface. This makes it possible to suppress the light transmitted through the gaps of the minute cracks. As a result, it is possible to realize a highly-designed structure that can transmit radio waves while having a metallic appearance.
 前記遮光部は、前記微細なクラックの隙間に構成される隙間遮光部を含んでもよい。 The light-shielding portion may include a gap light-shielding portion formed in the gap between the minute cracks.
 前記遮光部は、前記金属層と前記第2の面との間に構成される遮光層を含んでもよい。 The light shielding portion may include a light shielding layer formed between the metal layer and the second surface.
 前記遮光部は、前記微細なクラックの隙間に構成される隙間遮光部と、前記金属層と前記第2の面との間に位置し、前記隙間遮光部と一体的に構成される遮光層とを含んでもよい。 The light-shielding portion is a gap light-shielding portion formed in a gap of the minute crack, and a light-shielding layer located between the metal layer and the second surface and integrally formed with the gap light-shielding portion. May be included.
 前記加飾部は、前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成され加飾機能を有する加飾機能部を含んでもよい。 The decorating section may include a decorating function section having a decorating function that is configured in at least one of the gap between the fine cracks or between the metal layer and the second surface.
 前記加飾機能部は、光の透過又は反射の少なくとも一方を利用した加飾機能を有してもよい。 The decoration function section may have a decoration function using at least one of transmission and reflection of light.
 前記加飾機能部は、前記微細なクラックの隙間に構成される隙間加飾機能部を含んでもよい。 The decorating function unit may include a gap decorating function unit configured in the gap of the fine crack.
 前記加飾機能部は、前記金属層と前記第2の面との間に構成される加飾機能層を含んでもよい。 The decorating functional section may include a decorating functional layer formed between the metal layer and the second surface.
 前記加飾機能部は、前記微細なクラックの隙間に構成される隙間加飾機能部と、前記金属層と前記第2の面との間に位置し、前記隙間加飾機能部と一体的に構成される加飾機能層とを含んでもよい。 The decorating functional section is located between the gap decorating functional section configured in the gap of the fine crack and the metal layer and the second surface, and is integrally formed with the gap decorating functional section. The decorative functional layer may be included.
 前記金属層は、アルミニウム、チタン、クロム、及びこれらのうち少なくとも1つを含む合金のうちのいずれかであってもよい。 The metal layer may be any one of aluminum, titanium, chromium, and an alloy containing at least one of these.
 前記金属層は、30nm以上300nm以下の厚みを有してもよい。 The metal layer may have a thickness of 30 nm or more and 300 nm or less.
 前記微細なクラックは、ピッチが1μm以上500μm以下の範囲に含まれてもよい。 The fine cracks may be included in a pitch range of 1 μm or more and 500 μm or less.
 前記構造体は、筐体部品、車両、又は建築物の少なくとも一部として構成されてもよい。 The structure may be configured as at least a part of a housing part, a vehicle, or a building.
 前記加飾部は、前記微細のクラックを固定化する固定層を有してもよい。 The decoration section may have a fixing layer for fixing the fine cracks.
 本技術の一形態に係る加飾フィルムは、ベースフィルムと、前記ベースフィルムに形成された前記加飾部とを具備する。 A decorative film according to an aspect of the present technology includes a base film and the decorative portion formed on the base film.
 本技術の一形態に係る構造体の製造方法は、ベースフィルムに蒸着により金属層を形成することを含む。
 前記ベースフィルムを延伸することで前記金属層に微細なクラックが形成される。
 前記微細クラックが形成された金属層と、前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部とを含む加飾フィルムが形成される。
 前記加飾フィルムにキャリアフィルムを接着することで転写用フィルムが形成される。
 インモールド成形法、ホットスタンプ法、又は真空成形法により前記転写用フィルムから前記加飾フィルムが転写されるように成型部品が形成される。
A method for manufacturing a structure according to an aspect of the present technology includes forming a metal layer on a base film by vapor deposition.
By stretching the base film, fine cracks are formed in the metal layer.
A decorative film including a metal layer in which the fine cracks are formed, a gap between the fine cracks, or a light-shielding portion formed on at least one of the surface opposite to the metal layer and the design surface. It is formed.
A transfer film is formed by adhering a carrier film to the decorative film.
A molded component is formed by an in-mold molding method, a hot stamping method, or a vacuum molding method so that the decorative film is transferred from the transfer film.
 本技術の他の形態に係る構造体の製造方法では、前記微細クラックが形成された金属層と、前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部とを含む転写用フィルムが形成される。またインモールド成形法、ホットスタンプ法、又は真空成形法により前記ベースフィルムから剥離した前記金属層及び前記遮光部が転写されるように成型部品が形成される。 In the method for manufacturing a structure according to another aspect of the present technology, the metal layer in which the fine cracks are formed, the gap between the fine cracks, or between the metal layer and the surface opposite to the design surface. A transfer film including at least one light-shielding portion is formed. In addition, a molded component is formed by an in-mold molding method, a hot stamping method, or a vacuum molding method so that the metal layer and the light shielding portion separated from the base film are transferred.
 本技術の他の形態に係る構造体の製造方法では、インサート成形法により前記加飾フィルムと一体的に成形部品が形成される。 In a method of manufacturing a structure according to another aspect of the present technology, a molded part is integrally formed with the decorative film by an insert molding method.
 前記微細なクラックの形成ステップは、前記ベースフィルムを各々の軸方向の延伸率5%以下で2軸延伸してもよい。 In the step of forming the fine cracks, the base film may be biaxially stretched at a stretching ratio of 5% or less in each axial direction.
 本技術の一形態に係る加飾フィルムの製造方法は、ベースフィルムに蒸着により金属層を形成することを含む。
 前記ベースフィルムを延伸することで前記金属層に微細なクラックが形成される。
 前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に、遮光部が形成される。
A method for manufacturing a decorative film according to an aspect of the present technology includes forming a metal layer on a base film by vapor deposition.
By stretching the base film, fine cracks are formed in the metal layer.
A light-shielding portion is formed in at least one of the gap between the fine cracks and the surface of the metal layer opposite to the design surface.
一実施形態に係る電子機器としての携帯端末の構成例を示す概略図である。It is a schematic diagram showing an example of composition of a personal digital assistant as an electronic device concerning one embodiment. 図1に示す金属加飾部の構成例を示す模式的な断面図である。It is a typical sectional view showing an example of composition of a metal decoration part shown in Drawing 1. 金属層の表面状態を顕微鏡にて拡大して撮影した写真である。It is the photograph which expanded and photographed the surface state of a metal layer with a microscope. 金属層の表面状態を顕微鏡にて拡大して撮影した写真である。It is the photograph which expanded and photographed the surface state of a metal layer with a microscope. 真空蒸着装置の構成例を示す模式図である。It is a schematic diagram which shows the structural example of a vacuum evaporation system. 2軸延伸装置の構成例を示す模式図である。It is a schematic diagram which shows the structural example of a biaxial stretching apparatus. 遮光部の他の構成例を示す模式図である。It is a schematic diagram which shows the other structural example of a light-shielding part. 遮光部の他の構成例を示す模式図である。It is a schematic diagram which shows the other structural example of a light-shielding part. 金属加飾部の他の構成例を示す模式的な断面図である。It is a typical sectional view showing other examples of composition of a metal decoration part. 加飾機能部の他の構成例を示す模式図である。It is a schematic diagram which shows the other structural example of a decoration function part. 加飾機能部の他の構成例を示す模式図である。It is a schematic diagram which shows the other structural example of a decoration function part. 遮光部及び加飾機能部を組み合わせた場合の構成例を示す模式図である。It is a schematic diagram which shows the structural example at the time of combining a light-shielding part and a decoration function part. インモールド成形法を説明するための模式的な図である。It is a schematic diagram for explaining the in-mold forming method. インサート成形法を説明するための模式的な図である。It is a schematic diagram for explaining an insert molding method. ベースフィルムと金属層とを含む転写用フィルムの構成例を示す概略図である。It is a schematic diagram showing an example of composition of a transfer film containing a base film and a metal layer. 他の実施形態に係る光沢フィルムの構成例を示す断面図である。It is sectional drawing which shows the structural example of the glossy film which concerns on other embodiment. 支持層として形成されたコーティング層の厚みと微細クラックのピッチとの関係を示す図である。It is a figure which shows the relationship between the thickness of the coating layer formed as a support layer, and the pitch of a microcrack.
 以下、本技術に係る実施形態を、図面を参照しながら説明する。 Hereinafter, an embodiment according to the present technology will be described with reference to the drawings.
 [電子機器の構成]
 図1は、本技術の一実施形態に係る電子機器としての携帯端末の構成例を示す概略図である。図1Aは、携帯端末100の正面側を示す正面図であり、図1Bは、携帯端末100の背面側を示す斜視図である。
[Electronic equipment configuration]
FIG. 1 is a schematic diagram showing a configuration example of a mobile terminal as an electronic device according to an embodiment of the present technology. 1A is a front view showing the front side of the mobile terminal 100, and FIG. 1B is a perspective view showing the back side of the mobile terminal 100.
 携帯端末100は、筐体部101と、筐体部101内に収容される図示しない電子部品とを有する。図1Aに示すように筐体部101の前面側である前面部102には、通話部103と、タッチパネル104と、対面カメラ105とが設けられる。通話部103は、電話の相手と通話するために設けられ、スピーカ部106及び音声入力部107を有する。スピーカ部106から相手の音声が出力され、音声入力部107を介してユーザの声が相手側に送信される。 The mobile terminal 100 has a housing 101 and electronic parts (not shown) housed in the housing 101. As shown in FIG. 1A, a telephone unit 103, a touch panel 104, and a face-to-face camera 105 are provided on the front surface portion 102, which is the front surface side of the housing portion 101. The call unit 103 is provided to talk with the other party of the call, and includes a speaker unit 106 and a voice input unit 107. The voice of the other party is output from the speaker unit 106, and the voice of the user is transmitted to the other party via the voice input unit 107.
 タッチパネル104には、種々の画像やGUI(Graphical User Interface)が表示される。ユーザは、タッチパネル104を介して静止画や動画を閲覧可能である。またユーザは、タッチパネル104を介して種々のタッチ操作を入力する。対面カメラ105は、ユーザの顔等を撮影するときに用いられる。各デバイスの具体的な構成は限定されない。 Various images and GUI (Graphical User Interface) are displayed on the touch panel 104. The user can browse a still image or a moving image via the touch panel 104. The user also inputs various touch operations via the touch panel 104. The face-to-face camera 105 is used when photographing the user's face or the like. The specific configuration of each device is not limited.
 図1Bに示すように、筐体部101の背面側である背面部108には、金属的な外観となるように加飾された金属加飾部10が設けられる。金属加飾部10は、金属的な外観を有しつつも電波を透過することが可能である。 As shown in FIG. 1B, the back surface portion 108, which is the back surface side of the housing portion 101, is provided with a metal decoration portion 10 that is decorated to have a metallic appearance. The metal decoration portion 10 has a metallic appearance and is capable of transmitting radio waves.
 後に詳しく説明するが、背面部108の所定の領域に被加飾領域11が形成される。当該被加飾領域11に、加飾フィルム12が接着されることで、金属加飾部10が構成される。従って被加飾領域11は、金属加飾部10が形成される領域に相当する。 As will be described later in detail, the decorated region 11 is formed in a predetermined region of the back surface portion 108. The decorative metal film 10 is formed by adhering the decorative film 12 to the decorated region 11. Therefore, the decorated region 11 corresponds to a region in which the metal decorative portion 10 is formed.
 本実施形態では、加飾フィルム12が、加飾部に相当する。また被加飾領域11が形成される筐体部101が部材に相当する。被加飾領域11を有する筐体部101と、被加飾領域11に接着される加飾フィルム12とにより、本技術に係る構造体が筐体部品として構成される。なお筐体部品の一部に、本技術に係る構造体が用いられる場合もあり得る。 In the present embodiment, the decorative film 12 corresponds to the decorative portion. Further, the casing 101 in which the decorated region 11 is formed corresponds to a member. The housing 101 having the decorated area 11 and the decorative film 12 bonded to the decorated area 11 configure the structure according to the present technology as a housing component. Note that the structure according to the present technology may be used for a part of the housing component.
 図1Bに示す例では、背面部108の略中央に部分的に金属加飾部10が形成される。金属加飾部10が形成される位置は限定されず適宜設定されてよい。例えば背面部108全体に金属加飾部10が形成されてもよい。これにより背面部108の全体を一様に金属的な外観とすることが可能である。 In the example shown in FIG. 1B, the metal decoration portion 10 is partially formed in the approximate center of the back surface portion 108. The position where the metal decoration portion 10 is formed is not limited and may be set appropriately. For example, the metal decoration portion 10 may be formed on the entire back surface portion 108. This allows the entire back surface 108 to have a uniform metallic appearance.
 金属加飾部10の周囲の他の部分を金属加飾部10と略等しい外観とすることで、背面部108の全体を一様に金属的な外観とすることも可能である。その他、金属加飾部10以外の部分は木目調等の他の外観にすることで、意匠性を向上させることも可能である。ユーザが所望する意匠性が発揮されるように、金属加飾部10の位置や大きさ、その他の部分の外観等が適宜設定されればよい。 It is also possible to make the entire back surface portion 108 have a uniform metallic appearance by making the other portions around the metallic decoration portion 10 have an appearance that is substantially the same as that of the metallic decoration portion 10. In addition, it is possible to improve the design by making the parts other than the metal decorative part 10 have another appearance such as wood grain. The position and size of the metal decorative portion 10 and the appearance of other portions may be appropriately set so that the design desired by the user is exhibited.
 被加飾領域11に接着される加飾フィルム12は、意匠面12aを有する。意匠面12aは、携帯端末100を使用するユーザが視認可能な面であり、筐体部101の外観(デザイン)を構成する要素の1つとなる面である。本実施形態では、背面部108の表面側となる面が、加飾フィルム12の意匠面12aとなる。すなわち被加飾領域11に接着される接着面12b(図2参照)とは反対側の面が、意匠面12aとなる。 The decorative film 12 bonded to the decorated region 11 has a design surface 12a. The design surface 12a is a surface that can be visually recognized by the user who uses the mobile terminal 100, and is a surface that is one of the elements that configure the appearance (design) of the housing unit 101. In the present embodiment, the surface on the front surface side of the back surface portion 108 becomes the design surface 12 a of the decorative film 12. That is, the surface opposite to the bonding surface 12b (see FIG. 2) bonded to the decorated region 11 becomes the design surface 12a.
 本実施形態において、意匠面12aは、加飾部の第1の面に相当する。また意匠面12aとは反対側の接着面12b(図2参照)が、第1の面とは反対側の第2の面に相当する。加飾フィルム12は、意匠面12aが表面側となるように、被加飾領域11に接着される。 In the present embodiment, the design surface 12a corresponds to the first surface of the decorative portion. Further, the adhesive surface 12b (see FIG. 2) on the side opposite to the design surface 12a corresponds to the second surface on the side opposite to the first surface. The decorative film 12 is adhered to the decorated region 11 such that the design surface 12a is on the front surface side.
 筐体部101内に収容される電子部品として、本実施形態では、外部のリーダーライタ等と電波を介して通信することが可能なアンテナ部15(図2参照)が収容される。アンテナ部15は、例えばベース基板(図示なし)、ベース基板上に形成されたアンテナコイル16(図2参照)、及びアンテナコイル16に電気的に接続される信号処理回路部(図示なし)等を有する。アンテナ部15の具体的な構成は限定されない。なお筐体部101に収容される電子部品は限定されず、ICチップやコンデンサ等の種々の電子部品が収容されてよい。 In the present embodiment, as the electronic component housed in the housing unit 101, the antenna unit 15 (see FIG. 2) capable of communicating with an external reader/writer or the like via radio waves is housed. The antenna unit 15 includes, for example, a base substrate (not shown), an antenna coil 16 (see FIG. 2) formed on the base substrate, and a signal processing circuit unit (not shown) electrically connected to the antenna coil 16. Have. The specific configuration of the antenna unit 15 is not limited. Note that the electronic components housed in the casing 101 are not limited, and various electronic components such as IC chips and capacitors may be housed.
 図2は、金属加飾部10の構成例を示す模式的な断面図である。上記したように金属加飾部10は、アンテナ部15等の位置に応じた領域に形成された被加飾領域11と、被加飾領域11に接着される加飾フィルム12とで構成される。 FIG. 2 is a schematic cross-sectional view showing a configuration example of the metal decoration portion 10. As described above, the metal decoration portion 10 is composed of the decorated area 11 formed in the area corresponding to the position of the antenna portion 15 and the like, and the decoration film 12 adhered to the decorated area 11. ..
 加飾フィルム12は、ベースフィルム19と、金属層20と、密封樹脂21と、粘着層18とを有する。 The decorative film 12 has a base film 19, a metal layer 20, a sealing resin 21, and an adhesive layer 18.
 ベースフィルム19は、透明性及び延伸性を有する材料からなり、典型的には樹脂フィルムが用いられる。ベースフィルム19の材料としては、例えばPET(ポリエチレンテレフタレート)、PC(ポリカーボネート)、PMMA(ポリメタクリル酸メチル)、又はPP(ポリプロピレン)等が用いられる。その他の材料が用いられてもよい。 The base film 19 is made of a material having transparency and stretchability, and a resin film is typically used. As a material of the base film 19, for example, PET (polyethylene terephthalate), PC (polycarbonate), PMMA (polymethylmethacrylate), PP (polypropylene) or the like is used. Other materials may be used.
 なおベースフィルム19は金属と接する層であるので、例えば塩化ビニル系の材料を用いると、遊離した塩素が金属の腐食を促進させることもあり得る。従ってベースフィルム19として、非塩化ビニル系の材料を選択することで、金属の腐食を防止することが可能である。もちろんこれに限定される訳ではない。 Since the base film 19 is a layer in contact with a metal, if a vinyl chloride-based material is used, for example, free chlorine may accelerate the corrosion of the metal. Therefore, by selecting a non-vinyl chloride material as the base film 19, it is possible to prevent metal corrosion. Of course, it is not limited to this.
 ベースフィルム19の表面、すなわちベースフィルム19の筐体部101側の面とは反対側の面が、加飾フィルム12の意匠面12aとなる。なおベースフィルム19上に保護層や印刷像等が形成されてもよい。この場合には、保護層や印刷層等の表面が、加飾フィルム12の意匠面12aとなる。もちろんベースフィルム19に保護層としての機能が備えられてもよい。また印刷や着色等によりベースフィルム19に加飾機能が備えられてもよい。これにより意匠性を向上させることが可能である。 The surface of the base film 19, that is, the surface of the base film 19 opposite to the surface on the housing 101 side is the design surface 12 a of the decorative film 12. A protective layer, a printed image, etc. may be formed on the base film 19. In this case, the surface of the protective layer, the printing layer, or the like becomes the design surface 12a of the decorative film 12. Of course, the base film 19 may have a function as a protective layer. The base film 19 may be provided with a decoration function by printing, coloring, or the like. This makes it possible to improve the design.
 なお本開示において、加飾機能は、所定の意匠性を実現するための任意の機能を含む。
例えば光の透過や反射を利用して所定の色等を表現するといった加飾機能や、印刷等を利用して所定の模様や絵柄を視認させるといった加飾機能等、任意の加飾機能が挙げられる。もちろん印刷等を利用して所定の絵柄等を視認させる加飾機能は、光の透過や反射を利用した加飾機能とも言える。
In the present disclosure, the decoration function includes an arbitrary function for realizing a predetermined design property.
For example, an arbitrary decorating function such as a decorating function of expressing a predetermined color or the like by utilizing transmission or reflection of light, a decorating function of visually recognizing a predetermined pattern or pattern by using printing or the like can be given. To be Of course, the decorating function of visually recognizing a predetermined pattern or the like by using printing or the like can be said to be a decorating function using light transmission or reflection.
 金属層20は、被加飾領域11を金属的な外観とするために形成される。金属層20は、真空蒸着によりベースフィルム19に形成される層であり、多数の微細なクラック(以下、微細クラックと記載する)22が形成されている。 The metal layer 20 is formed so that the decorated region 11 has a metallic appearance. The metal layer 20 is a layer formed on the base film 19 by vacuum vapor deposition, and has a large number of fine cracks (hereinafter referred to as fine cracks) 22 formed therein.
 この微細クラック22により、金属層20に複数の不連続面が形成され、面抵抗値がほぼ絶縁状態となる。従って電波が筐体部101に当たる際に渦電流が発生することを十分に抑制することが可能となる。この結果、渦電流損失による電磁波エネルギーの低減を十分に抑制することができ、高い電波透過性が実現される。 A plurality of discontinuous surfaces are formed on the metal layer 20 due to the fine cracks 22, and the surface resistance value is almost in an insulating state. Therefore, it is possible to sufficiently suppress the generation of the eddy current when the radio wave hits the casing 101. As a result, reduction of electromagnetic wave energy due to eddy current loss can be sufficiently suppressed, and high radio wave transparency is realized.
 金属層20の膜厚は、例えば30nm以上300nm以下の範囲に設定される。膜厚が小さすぎると光が透過するため可視光領域の反射率が低下し、膜厚が大きすぎると表面形状が荒れやすくなるので反射率が低下する。また膜厚が小さい程、高温高湿試験後(例えば75℃90%RH48H後)の反射率低下量が大きくなる。なおRHは、相対湿度(Relative Humidity)である。 The film thickness of the metal layer 20 is set in the range of 30 nm or more and 300 nm or less, for example. If the film thickness is too small, the light is transmitted, so that the reflectance in the visible light region is lowered. If the film thickness is too large, the surface shape is apt to be roughened, and the reflectance is lowered. Further, the smaller the film thickness, the greater the amount of decrease in reflectance after the high temperature and high humidity test (for example, after 75° C. 90% RH48H). RH is relative humidity (Relative Humidity).
 これらの点を考慮して上記の範囲で膜厚を設定することで、高い反射率を維持した電波透過面を実現することが可能であった。特に30nm以上150nm以下の範囲で膜厚を設定することで、高い反射率が十分に維持され、また高い電波透過性が発揮された。もちろんこれらの範囲に限定されず、所望の特性が発揮されるように、金属層20の膜厚は適宜設定されてよい。また例えば30nm以上300nm以下の範囲の中で、最適な数値範囲が改めて設定されてもよい。 By setting the film thickness within the above range in consideration of these points, it was possible to realize a radio wave transmitting surface that maintains high reflectance. In particular, by setting the film thickness in the range of 30 nm or more and 150 nm or less, high reflectance was sufficiently maintained and high radio wave transmission was exhibited. Of course, the thickness is not limited to these ranges, and the film thickness of the metal layer 20 may be appropriately set so that desired characteristics can be exhibited. In addition, for example, within the range of 30 nm or more and 300 nm or less, the optimum numerical range may be set again.
 密封樹脂21は、金属層20を保護する保護層(ハードコート層)として機能する。密封樹脂21は、例えばUV硬化樹脂、熱硬化樹脂又は2液硬化性樹脂等が塗布されることで形成される。密封樹脂21が形成されることで、例えば平滑化、防汚、剥離防止、傷防止等が実現される。なお保護層として、アクリル樹脂等がコーティングされてもよい。密封樹脂21として、非塩化ビニル系の材料を選択することで、金属の腐食の防止に有利である。 The sealing resin 21 functions as a protective layer (hard coat layer) that protects the metal layer 20. The sealing resin 21 is formed by applying, for example, a UV curable resin, a thermosetting resin, a two-component curable resin, or the like. By forming the sealing resin 21, for example, smoothing, antifouling, peeling prevention, scratch prevention, etc. are realized. The protective layer may be coated with acrylic resin or the like. By selecting a non-vinyl chloride material as the sealing resin 21, it is advantageous in preventing metal corrosion.
 また密封樹脂21は、金属層20内の微細クラック22を固定化して再度の接着を防止する機能も有している。すなわち密封樹脂21は、固定層としても機能する。これにより十分な電波透過性を発揮することが可能となり、また電波透過性を長く維持することが可能となる。なお保護層として機能する層と、固定層として機能する層とが互いに分離して構成され、2層構造を有するカバー層として金属層20に対して形成されてもよい。 Further, the sealing resin 21 also has a function of fixing the fine cracks 22 in the metal layer 20 and preventing re-adhesion. That is, the sealing resin 21 also functions as a fixed layer. As a result, it becomes possible to exhibit sufficient radio wave transparency, and it is possible to maintain the radio wave transparency for a long time. A layer that functions as a protective layer and a layer that functions as a fixed layer may be formed separately from each other and may be formed on the metal layer 20 as a cover layer having a two-layer structure.
 粘着層18は、加飾フィルム12を被加飾領域11に接着するための層である。粘着層18は、密封樹脂21の金属層20を覆う側とは反対側の面(筐体部101側の面)に、粘着材料が塗布されることで形成される。粘着材料の種類や塗布方法等は限定されない。粘着層18の被加飾領域11に接着される面が、加飾フィルム12の接着面12bとなる。 The adhesive layer 18 is a layer for adhering the decorative film 12 to the decorated region 11. The adhesive layer 18 is formed by applying an adhesive material to the surface of the sealing resin 21 opposite to the side covering the metal layer 20 (the surface on the side of the housing 101). The type of adhesive material and the coating method are not limited. The surface of the pressure-sensitive adhesive layer 18 that is bonded to the decorated region 11 becomes the bonding surface 12b of the decorative film 12.
 本実施形態では、加飾フィルム12が形成される際には、まずベースフィルム19及び金属層20からなる光沢フィルム23が形成される。その後光沢フィルム23に密封樹脂21及び粘着層18が形成される。なお各層が形成される順番がこれに限定される訳ではない。 In this embodiment, when the decorative film 12 is formed, first, the gloss film 23 including the base film 19 and the metal layer 20 is formed. After that, the sealing resin 21 and the adhesive layer 18 are formed on the glossy film 23. The order in which each layer is formed is not limited to this.
 図3及び図4は、光沢フィルム23の金属層20の表面状態を顕微鏡にて拡大して撮影した写真である。なお図4に示す写真M2は、スケール(目盛り)を含めて撮影されたものであるが、当該スケールを認識しやすくするために、写真の上から線を補強して図示している。もちろん図3及び図4の写真は、本技術に係る光沢フィルム23の一例である。 3 and 4 are photographs taken by enlarging the surface state of the metal layer 20 of the glossy film 23 with a microscope. Note that the photograph M2 shown in FIG. 4 was taken with the scale (scale) included, but in order to make it easier to recognize the scale, lines are reinforced from the top of the photograph. Of course, the photographs in FIGS. 3 and 4 are examples of the glossy film 23 according to the present technology.
 図3の写真M1に示す光沢フィルム23では、ベースフィルム19に、所定の元素として酸素が添加されたアルミニウム層が、金属層20として形成される。そして延伸率(元の大きさに対する延伸量)2%、基板加熱130℃の条件で、ベースフィルム19が2軸延伸されることで、微細クラック22が形成される。 In the glossy film 23 shown in the photograph M1 of FIG. 3, an aluminum layer to which oxygen is added as a predetermined element is formed as the metal layer 20 on the base film 19. Then, the base film 19 is biaxially stretched under the conditions of a stretching ratio (stretching amount with respect to the original size) of 2% and substrate heating of 130° C., whereby the fine cracks 22 are formed.
 写真M1に示すように、金属層20に、2軸方向に沿って網目状に微細クラック22が形成される。すなわち互いに略直交する2方向に沿って、互いに交差するように、微細クラック22が形成される。 As shown in Photo M1, fine cracks 22 are formed on the metal layer 20 in a mesh shape along the biaxial direction. That is, the fine cracks 22 are formed so as to intersect with each other along two directions that are substantially orthogonal to each other.
 図4の写真M2に示す光沢フィルム23では、ベースフィルム19に、クロムからなる高硬度層と、アルミニウムからなる高反射層とが積層された金属層20が形成される。そして延伸率2%、基板加熱130℃の条件で、ベースフィルム19が2軸延伸されることで、微細クラック22が形成される。 In the glossy film 23 shown in the photograph M2 of FIG. 4, a metal layer 20 in which a high hardness layer made of chromium and a high reflection layer made of aluminum are laminated is formed on the base film 19. Then, the base film 19 is biaxially stretched under the conditions of a stretching rate of 2% and a substrate heating temperature of 130° C., whereby fine cracks 22 are formed.
 写真M2に示すように、金属層20に、微細クラック22が不規則に形成される。不規則に形成されるとは、微細クラック22の形成態様に規則性がないことを意味し、微細クラック22がランダムに形成されているとも言える。 As shown in Photo M2, fine cracks 22 are irregularly formed in the metal layer 20. The irregular formation means that the formation mode of the fine cracks 22 has no regularity, and it can be said that the fine cracks 22 are randomly formed.
 写真M2に示すように、微細クラック22の方向に規則性がなく、ランダムな方向に無数のクラック22が形成される状態となっている。微細クラック22に囲まれる領域の形状に規則性がなく、微細クラック22によりランダムな形状の無数の領域が形成される状態とも言える。 As shown in Photo M2, there is no regularity in the direction of the fine cracks 22 and countless cracks 22 are formed in random directions. It can be said that there is no regularity in the shape of the region surrounded by the fine cracks 22 and a myriad of randomly shaped regions are formed by the fine cracks 22.
 微細クラック22のピッチ(クラック間隔)は、例えば1μm以上500μm以下の範囲に設定される。ピッチを小さくすると、微細クラック22の隙間(空隙)の面積が相対的に増加する。ピッチを大きくすると、微細クラック22の隙間の面積が相対的に減少する。 The pitch (crack interval) of the fine cracks 22 is set in the range of 1 μm or more and 500 μm or less, for example. When the pitch is reduced, the area of the gap (void) of the microcracks 22 relatively increases. When the pitch is increased, the area of the gap between the fine cracks 22 is relatively reduced.
 例えばピッチが小さすぎると、金属層20の表面にて反射される光の散乱が多く発生し、意匠性への影響が見受けられた。一方、ピッチが大きすぎると電波透過性の低下が見受けられた。ピッチを1μm以上500μm以下の範囲に設定することで、高い意匠性を維持しつつ電波透過性を実現することが可能であった。例えば、WiFiやBluetooth(登録商標)の2.45GHzでの電磁波(波長約12.2cm)を十分に透過させることが可能となる。 For example, if the pitch is too small, a large amount of light reflected by the surface of the metal layer 20 is generated, which has an effect on design. On the other hand, when the pitch was too large, the radio wave transmittance was found to decrease. By setting the pitch in the range of 1 μm or more and 500 μm or less, it was possible to achieve radio wave transparency while maintaining high designability. For example, it becomes possible to sufficiently transmit an electromagnetic wave (wavelength of about 12.2 cm) of 2.45 GHz of WiFi or Bluetooth (registered trademark).
 もちろんこの範囲に限定されず、所望の特性が発揮されるように、微細クラック22のピッチは適宜設定されてよい。例えばピッチを50μm以上200μm以下の範囲に設定することで、高い反射率及び高い電波透過性が十分に発揮された。その他、例えば1μm以上500μm以下の範囲の中で、最適な数値範囲が改めて設定されてもよい。 Of course, the pitch of the fine cracks 22 is not limited to this range, and may be appropriately set so that desired characteristics are exhibited. For example, by setting the pitch in the range of 50 μm or more and 200 μm or less, high reflectance and high radio wave transparency were sufficiently exhibited. In addition, for example, an optimum numerical range may be newly set within the range of 1 μm or more and 500 μm or less.
 写真M1及びM2の金属層20の面抵抗を4探針抵抗器で評価したところ絶縁性を示した。また分光光度計(U-4100「株式会社 日立製作所製」)を用いて、可視光領域(400nm~700nm)の表面反射率(平均反射率)を測定したところ、70%以上の値となった。すなわち高い反射率を有する金属光沢の表面を有し、また十分な電波透過性を有する金属層20を実現することが可能となった。 When the surface resistance of the metal layers 20 in Photos M1 and M2 was evaluated with a 4-probe resistor, it showed insulation. The surface reflectance (average reflectance) in the visible light region (400 nm to 700 nm) was measured with a spectrophotometer (U-4100 "Hitachi, Ltd."), and the value was 70% or more. .. That is, it is possible to realize the metal layer 20 having a metal glossy surface having a high reflectance and having sufficient radio wave transmission.
 なお金属層20の表面側にベースフィルム19が形成される場合や、密封樹脂やハードコート層等の保護層が形成される場合では、意匠面12aの表面反射率が約5%程度低下する場合があり得る。このことを考慮しても、本技術に係る加飾フィルム12を用いることで、表面反射率を65%以上の高い値にすることが可能となる。 When the base film 19 is formed on the surface side of the metal layer 20 or when a protective layer such as a sealing resin or a hard coat layer is formed, the surface reflectance of the design surface 12a decreases by about 5%. Can be. Even considering this, by using the decorative film 12 according to the present technology, the surface reflectance can be set to a high value of 65% or more.
 図3に示すように微細クラック22が規則的に形成される場合と、図4に示すように微細クラック22が不規則に形成される場合とを比較する。そうすると不規則に形成される場合の方が微細クラック22の視認性(目立ち度)を軽減させることが可能であることが分かった。これは、微細クラック22の方向が揃っている場合には、微細クラック22が目立つからだと考えられる。 Compare the case where the fine cracks 22 are regularly formed as shown in FIG. 3 and the case where the fine cracks 22 are irregularly formed as shown in FIG. Then, it has been found that the visibility (the degree of conspicuity) of the fine cracks 22 can be reduced when the irregular cracks are formed. It is considered that this is because the fine cracks 22 are conspicuous when the directions of the fine cracks 22 are aligned.
 従って、例えば微細クラック22が不規則に形成されるように光沢フィルム23を形成することで、意匠面12aの意匠性を向上させることが可能である。 Therefore, for example, by forming the glossy film 23 so that the fine cracks 22 are irregularly formed, it is possible to improve the designability of the design surface 12a.
 図5は、真空蒸着装置の構成例を示す模式図である。真空蒸着装置200は、真空槽(図示なし)内に配置されたフィルム搬送機構201、隔壁202、載置台203、及び加熱源(図示なし)を有する。 FIG. 5 is a schematic diagram showing a configuration example of a vacuum vapor deposition device. The vacuum vapor deposition apparatus 200 has a film transport mechanism 201, a partition wall 202, a mounting table 203, and a heating source (not shown) arranged in a vacuum chamber (not shown).
 フィルム搬送機構201は、第1のロール205と、回転ドラム206と、第2のロール207とを有する。回転ドラム206が右回転すると、ベースフィルム19は、第1のロール205から第2のロール207に向けて、回転ドラム206の周面に沿って搬送される。回転ドラム206が左回転すると、ベースフィルム19は、第2のロール207から第1のロール205に向けて搬送される。 The film transport mechanism 201 has a first roll 205, a rotating drum 206, and a second roll 207. When the rotary drum 206 rotates to the right, the base film 19 is conveyed from the first roll 205 to the second roll 207 along the peripheral surface of the rotary drum 206. When the rotary drum 206 rotates counterclockwise, the base film 19 is conveyed from the second roll 207 to the first roll 205.
 載置台203は、回転ドラム206に対向する位置に配置される。載置台203には、ベースフィルム19に形成される金属層20を構成する金属材料が収容された坩堝208が配置される。回転ドラム206の坩堝208に対向する領域が成膜領域210となる。隔壁202は、成膜領域210以外の領域に向かう角度で進む成膜材料90の微粒子91を規制する。 The mounting table 203 is arranged at a position facing the rotary drum 206. On the mounting table 203, a crucible 208 containing a metal material forming the metal layer 20 formed on the base film 19 is arranged. A region of the rotary drum 206 facing the crucible 208 is a film forming region 210. The partition wall 202 regulates the fine particles 91 of the film-forming material 90 that advance at an angle toward the area other than the film-forming area 210.
 回転ドラム206が十分に冷却された状態でベースフィルム19が搬送される。例えば回転ドラム206が右回転され、第1のロール205から第2のロール207に向けて、ベースフィルム19が搬送される。 The base film 19 is conveyed with the rotary drum 206 sufficiently cooled. For example, the rotating drum 206 is rotated clockwise, and the base film 19 is conveyed from the first roll 205 toward the second roll 207.
 ベースフィルム19の搬送に合わせて、例えばヒーター、レーザー又は電子銃等の図示しない加熱源により、坩堝208内の金属材料が加熱される。これにより坩堝208から微粒子91を含む蒸気が発生する。蒸気に含まれる金属材料の微粒子91が、成膜領域210を進むベースフィルム19に堆積することで、ベースフィルム19に、金属層20が製膜される。 The metal material in the crucible 208 is heated by a heating source (not shown) such as a heater, a laser, or an electron gun in accordance with the conveyance of the base film 19. As a result, vapor containing fine particles 91 is generated from the crucible 208. By depositing the fine particles 91 of the metal material contained in the vapor on the base film 19 which advances through the film formation region 210, the metal layer 20 is formed on the base film 19.
 例えば、坩堝208内に金属材料としてアルミウムが収容される。また成膜領域210の上流側(巻出ロール205側)に、酸素導入機構(図示は省略)が配置される。ベースフィルム19の搬送、及び加熱源による坩堝208の加熱に合わせて、酸素導入機構によりベースフィルム19に向けて酸素を吹き付ける。これにより、図3で例示した酸素が添加されたアルミニウム層からなる金属層20を容易に形成することが可能となる。 For example, aluminum is contained in the crucible 208 as a metal material. An oxygen introduction mechanism (not shown) is arranged on the upstream side of the film formation region 210 (on the unwinding roll 205 side). Oxygen is blown toward the base film 19 by the oxygen introduction mechanism in accordance with the conveyance of the base film 19 and the heating of the crucible 208 by the heating source. This makes it possible to easily form the metal layer 20 made of the oxygen-added aluminum layer illustrated in FIG.
 他の例として、まず高硬度層を構成するクロムが収容された坩堝208が、載置台203に載置される。そして回転ドラム206が右回転され、第1のロール205から第2のロール207に向けて、ベースフィルム19が搬送される。ベースフィルム19の搬送に合わせて坩堝208が加熱され、クロムからなる高硬度層が、ベースフィルム19に成膜される。 As another example, first, the crucible 208 containing the chromium that constitutes the high hardness layer is placed on the placing table 203. Then, the rotary drum 206 is rotated clockwise, and the base film 19 is conveyed from the first roll 205 toward the second roll 207. The crucible 208 is heated in accordance with the conveyance of the base film 19, and a high hardness layer made of chromium is formed on the base film 19.
 次に、高反射層を構成する金属であるアルミニウムが収容された坩堝208が、載置台203に載置される。回転ドラム206が左回転され、第2のロール207から第1のロール205に向けて、高硬度層が形成されたベースフィルム19が搬送される。搬送に合わせて、坩堝208内のアルミニウムを加熱することで、高硬度層上に高反射層が成膜される。これにより、図4に例示してクロムからなる高硬度層と、アルミニウムからなる高反射層とが積層された金属層20を容易に形成することが可能となる。 Next, the crucible 208 containing aluminum, which is a metal forming the high-reflection layer, is mounted on the mounting table 203. The rotary drum 206 is rotated counterclockwise, and the base film 19 having the high hardness layer formed thereon is conveyed from the second roll 207 to the first roll 205. By heating the aluminum in the crucible 208 in accordance with the transportation, the high reflection layer is formed on the high hardness layer. This makes it possible to easily form the metal layer 20 in which the high hardness layer made of chromium and the high reflection layer made of aluminum are laminated as illustrated in FIG.
 図5に示す例では、ロールツーロール方式による連続した真空蒸着が可能であるので、大幅なコスト低減、生産性の向上を図ることができる。もちろんバッチ方式の真空蒸着装置が用いられる場合にも、本技術は適用可能である。 In the example shown in FIG. 5, continuous vacuum deposition by the roll-to-roll method is possible, so it is possible to significantly reduce costs and improve productivity. Of course, the present technology can be applied even when a batch-type vacuum vapor deposition apparatus is used.
 図6は、2軸延伸装置の構成例を示す模式図である。2軸延伸装置250は、ベース部材251と、ベース部材251上に配置される、互いに略等しい構成を有する4つの延伸機構252を有する。4つの延伸機構252は、互いに直交する2軸(x軸及びy軸)の各々に2つずつ、各軸上で互いに対向するように配置される。以下、y軸方向の矢印の反対向きに光沢フィルム23'を延伸する延伸機構252aを参照しながら説明を行う。 FIG. 6 is a schematic diagram showing a configuration example of a biaxial stretching device. The biaxial stretching device 250 includes a base member 251 and four stretching mechanisms 252 arranged on the base member 251 and having substantially the same configuration. The four stretching mechanisms 252 are arranged so that two of each of the two axes (x axis and y axis) orthogonal to each other are opposed to each other on each axis. Hereinafter, description will be given with reference to the stretching mechanism 252a that stretches the glossy film 23' in the direction opposite to the arrow in the y-axis direction.
 延伸機構252aは、固定ブロック253と、可動ブロック254と、複数のクリップ255とを有する。固定ブロック253は、ベース部材251に固定される。固定ブロック253には、延伸方向(y方向)に延在する延伸ネジ256が貫通されている。 The stretching mechanism 252a has a fixed block 253, a movable block 254, and a plurality of clips 255. The fixed block 253 is fixed to the base member 251. A stretching screw 256 extending in the stretching direction (y direction) penetrates through the fixed block 253.
 可動ブロック254は、ベース部材251に移動可能に配置される。可動ブロック254は、固定ブロック253を貫通する延伸ネジ256に接続される。従って延伸ネジ256が操作されることで、可動ブロック254がy方向に移動可能となる。 The movable block 254 is movably arranged on the base member 251. The movable block 254 is connected to an extension screw 256 penetrating the fixed block 253. Therefore, by operating the extension screw 256, the movable block 254 can be moved in the y direction.
 複数のクリップ255は、延伸方向に直交する方向(x方向)に沿って並べられる。複数のクリップ255の各々には、x方向に延在するスライドシャフト257が貫通している。各クリップ255は、スライドシャフト257に沿ってx方向における位置を変更可能である。複数のクリップ255の各々と、可動ブロック254とは、連結リンク258及び連結ピン259により連結されている。 The plurality of clips 255 are arranged along the direction (x direction) orthogonal to the stretching direction. A slide shaft 257 extending in the x direction penetrates each of the plurality of clips 255. The position of each clip 255 can be changed along the slide shaft 257 in the x direction. Each of the plurality of clips 255 and the movable block 254 are connected by a connecting link 258 and a connecting pin 259.
 延伸ネジ256の操作量によって、延伸率が制御される。また複数のクリップ255の数や位置、連結リンク258の長さ等を適宜設定することでも、延伸率の制御が可能である。なお2軸延伸装置250の構成は限定されない。本実施形態に係る2軸延伸装置250は、フィルムをフルカットされた枚葉で2軸延伸するものであるが、ロールで連続して2軸延伸することも可能である。例えばロール間の走行方向による張力と、ロール間に設けられた走行に同期して動くクリップ255により走行方向に直角な張力を与えることにより、連続した2軸延伸が可能となる。 Draw ratio is controlled by the operation amount of draw screw 256. The stretching ratio can also be controlled by appropriately setting the number and positions of the plurality of clips 255, the length of the connecting link 258, and the like. The configuration of the biaxial stretching device 250 is not limited. The biaxial stretching device 250 according to the present embodiment biaxially stretches a film by full-cut sheets, but it is also possible to continuously roll biaxially with a roll. For example, continuous biaxial stretching is possible by applying tension in the running direction between the rolls and a clip 255 provided between the rolls and moving in synchronization with the running to give tension perpendicular to the running direction.
 ベース部材251上に真空蒸着後の光沢フィルム23'が配置され、4つ辺の各々に延伸機構252の複数のクリップ255が取り付けられる。図示しない温調された加熱ランプ又は温調された熱風により光沢フィルム23'が加熱されている状態で、4つの延伸ネジ256が操作されて2軸延伸が行われる。本実施形態では、各軸方向における延伸率2%、基板加熱130℃の条件で、ベースフィルム19が2軸延伸される。これにより図3に示すように、延伸方向に直交する方向(2軸方向)に沿って、網目状となる微細クラック22が形成される。あるいは、図4に示すように、微細クラック22が不規則に形成される。 The gloss film 23' after vacuum deposition is arranged on the base member 251, and a plurality of clips 255 of the stretching mechanism 252 are attached to each of the four sides. Biaxial stretching is performed by operating the four stretching screws 256 while the gloss film 23' is heated by a temperature-controlled heating lamp or a temperature-controlled hot air (not shown). In this embodiment, the base film 19 is biaxially stretched under the conditions of a stretching rate of 2% in each axial direction and substrate heating of 130°C. As a result, as shown in FIG. 3, mesh-like fine cracks 22 are formed along the direction (biaxial direction) orthogonal to the stretching direction. Alternatively, as shown in FIG. 4, fine cracks 22 are irregularly formed.
 延伸率が低すぎると適正な微細クラック22が形成されず、金属層20が導電性を有してしまう。この場合、渦電流等の影響により、十分な電波透過性が発揮されない。一方で、延伸率が大きすぎると、延伸後のベースフィルム19へのダメージが大きくなる。その結果、加飾フィルム12を被加飾領域11に接着する際に、エアの噛み込みやしわの発生等により、歩留りが悪化してしまう可能性がある。またベースフィルム19や金属層20自体の変形により、金属加飾部10の意匠性が低下してしまうこともある。この問題は、金属層20がベースフィルム19から剥離されて転写される場合にも起こり得る。 If the stretching ratio is too low, appropriate fine cracks 22 will not be formed, and the metal layer 20 will have conductivity. In this case, due to the influence of eddy current and the like, sufficient radio wave transmission cannot be exhibited. On the other hand, if the stretching ratio is too large, damage to the base film 19 after stretching becomes large. As a result, when the decorative film 12 is bonded to the decorated region 11, the yield may be deteriorated due to the trapping of air or the generation of wrinkles. Further, the design of the metal decorative portion 10 may be deteriorated due to the deformation of the base film 19 and the metal layer 20 itself. This problem can also occur when the metal layer 20 is peeled from the base film 19 and transferred.
 本実施形態に係る光沢フィルム23では、各軸の方向において2%以下のという低い延伸率にて、微細クラック22を適正に形成することができる。これによりベースフィルム19へのダメージを十分に防止することが可能となり、歩留を向上させることができる。また加飾フィルム12が接着された金属加飾部10の意匠性を高く維持することができる。もちろん延伸率は適宜設定可能であり、上記のような不具合が発生しないのであれば、2%以上の延伸率が設定されてもよい。例えば延伸率が5%以下の範囲であれば、上記のような不具合が発生することなく、高い歩留で微細クラック22を適正に形成することが可能であった。もちろん5%よりも大きい値が設定されてもよい。 In the glossy film 23 according to the present embodiment, the fine cracks 22 can be properly formed at a low stretch ratio of 2% or less in each axis direction. This makes it possible to sufficiently prevent damage to the base film 19 and improve the yield. In addition, the design of the metal decoration portion 10 to which the decoration film 12 is bonded can be maintained high. Of course, the stretching ratio can be appropriately set, and if the above-mentioned problems do not occur, a stretching ratio of 2% or more may be set. For example, if the stretching ratio is in the range of 5% or less, it is possible to properly form the fine cracks 22 with a high yield without causing the above problems. Of course, a value larger than 5% may be set.
 [微細クラックの隙間と意匠性について]
 ここで発明者は、微細クラック22の隙間と、意匠面12aにおける意匠性について検討した。具体的には、微細クラック22の隙間の光の透過性と、意匠面12aの意匠性について検討した。
[Gap of fine cracks and design]
Here, the inventor examined the gap between the fine cracks 22 and the designability of the design surface 12a. Specifically, the light transmittance of the gap between the fine cracks 22 and the designability of the design surface 12a were examined.
 例えば図2に例示する加飾フィルム12において、密封樹脂21を高い光透過性を有する透明な材料で構成する。これにより微細クラック22の隙間は、光透過性を有する領域となる。この場合、外部側から意匠面12aに光が照射した場合に、微細クラック22の隙間を光が透過することにより、意匠面12aの反射率の低下が発生し得る。この結果、意匠性の高い金属光沢を実現することが難しくなる場合があり得る。 For example, in the decorative film 12 illustrated in FIG. 2, the sealing resin 21 is made of a transparent material having high light transmittance. As a result, the gap between the fine cracks 22 becomes a region having light transparency. In this case, when the design surface 12a is irradiated with light from the outside, the light is transmitted through the gaps of the fine cracks 22, so that the reflectance of the design surface 12a may decrease. As a result, it may be difficult to realize a metallic luster having a high design property.
 また筐体部101の内部側で発生した光が外部側に出射される場合には、光が微細クラック22の隙間を透過して漏れてしまう可能性もあり得る。この場合、微細クラック22の隙間から出射される漏れ光の影響により、意匠性が低下してしまう可能性もあり得る。 Further, when the light generated inside the housing 101 is emitted to the outside, there is a possibility that the light may pass through the gaps of the fine cracks 22 and leak. In this case, there is a possibility that the designability may be deteriorated due to the influence of leaked light emitted from the gap of the fine crack 22.
 このような検討から、発明者は、意匠性を向上させるために、以下のポイントを実現することを新たに考案した。
(A)微細クラック22の隙間を透過する光を十分に抑制すること
(B)微細クラック22の隙間に入射する光の意匠性への影響をコントロールすること
(C)これら2つのポイントを組み合わせること
 以下、これらポイント(A)~(C)について説明する。
From such a study, the inventor newly devised to realize the following points in order to improve the designability.
(A) Sufficiently suppressing the light that passes through the gaps of the microcracks 22 (B) Controlling the influence of the light incident on the gaps of the microcracks 22 on the designability (C) Combining these two points Hereinafter, these points (A) to (C) will be described.
 [ポイントAについて]
 発明者は、ポイントAを実現するために、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に、光を遮光する遮光部を構成することを新たに考案した。特に可視光領域の光を遮光する遮光部が構成される。
[About point A]
In order to achieve the point A, the inventor configures a light shielding portion that shields light in at least one of the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). Was newly devised. In particular, a light blocking portion that blocks light in the visible light region is configured.
 なお本開示における遮光とは、完全遮光のように光を完全に遮断する場合に限定されず、本技術の効果を阻害しない範囲で光の透過を許容する場合も含まれる。また本開示における遮光は、光を吸収することや光を反射することを含む概念である。例えば本開示における遮光を、光の透過率が所定の閾値(例えば10%)以下であることと表現することも可能である。もちろんこれに限定される訳ではない。 Note that the light blocking in the present disclosure is not limited to the case of completely blocking light as in the case of complete light blocking, and also includes the case of allowing light transmission within a range that does not impair the effects of the present technology. Further, the light shielding in the present disclosure is a concept including absorbing light and reflecting light. For example, the light shielding in the present disclosure can be expressed as the light transmittance being equal to or less than a predetermined threshold value (for example, 10%). Of course, it is not limited to this.
 図2に例示する加飾フィルム12において、遮光性を有する遮光性材料により、密封樹脂21を形成する。これにより微細クラック22の隙間を、遮光性材料により埋めることが可能となる。また金属層20と接着面12bとの間に、遮光性材料による層を実現することが可能となる。 In the decorative film 12 illustrated in FIG. 2, the sealing resin 21 is formed of a light shielding material having a light shielding property. This makes it possible to fill the gaps between the fine cracks 22 with the light-shielding material. In addition, a layer made of a light shielding material can be realized between the metal layer 20 and the adhesive surface 12b.
 図2に示すように、以下、微細クラック22の隙間に構成される遮光性材料を、隙間遮光部31とする。金属層20と接着面12bとの間に構成される遮光性材料の層を、遮光層32とする。 As shown in FIG. 2, the light-shielding material formed in the gaps of the fine cracks 22 is hereinafter referred to as a gap light-shielding portion 31. A layer of light-shielding material formed between the metal layer 20 and the adhesive surface 12b is referred to as a light-shielding layer 32.
 例えば光沢フィルム23が形成され、延伸により微細クラック22が形成される。その後に、金属層20を覆うように遮光性材料からなる樹脂を塗布することで、密封樹脂21が形成される。これにより隙間遮光部31と遮光層32とを、一体的に容易に形成することが可能となる。図2に示す例では、隙間遮光部31及び遮光層32として機能する密封樹脂21により、遮光部30が構成される。 For example, the gloss film 23 is formed, and the fine cracks 22 are formed by stretching. After that, a resin made of a light shielding material is applied so as to cover the metal layer 20 to form the sealing resin 21. This makes it possible to easily form the gap light-shielding portion 31 and the light-shielding layer 32 integrally. In the example shown in FIG. 2, the light shielding portion 30 is configured by the sealing resin 21 that functions as the gap light shielding portion 31 and the light shielding layer 32.
 遮光部30を構成することで、微細クラック22の隙間を透過する光を十分に抑制することが可能となり、高い反射率を有する金属光沢を実現することが可能となる。また筐体部101の内部からの不要な漏れ光を十分に抑制することが可能となる。この結果、非常に高い意匠性を実現することが可能となる。 By configuring the light-shielding portion 30, it is possible to sufficiently suppress the light that passes through the gaps between the fine cracks 22 and realize a metallic luster having a high reflectance. Further, it becomes possible to sufficiently suppress unnecessary leakage light from the inside of the casing 101. As a result, it is possible to realize extremely high designability.
 なお図2に示すように、金属層20に対して、微細クラック22の隙間を埋めるように密封樹脂21が形成されている状態を、金属層20と同層となるように密封樹脂21が形成されている状態と言うことも可能である。 As shown in FIG. 2, the state where the sealing resin 21 is formed on the metal layer 20 so as to fill the gaps of the fine cracks 22 is formed so that the sealing resin 21 is the same layer as the metal layer 20. It can also be said that it is in the state of being.
 図7及び図8は、遮光部の他の構成例を示す模式図である。例えば図7Aに示すように、遮光部30として機能する密封樹脂21に、粘着機能を備えさせることも可能である。これにより粘着層18を省略することが可能となり、製造工程の簡素化を図ることが可能となる。 7 and 8 are schematic diagrams showing another configuration example of the light shielding unit. For example, as shown in FIG. 7A, the sealing resin 21 functioning as the light shielding portion 30 can be provided with an adhesive function. As a result, the adhesive layer 18 can be omitted, and the manufacturing process can be simplified.
 図7Bに示すように、遮光部30として、隙間遮光部31のみが構成されてもよい。例えば光沢フィルム23が形成され、延伸により微細クラック22が形成される。その後に、微細クラック22の隙間を埋めるように遮光性材料を塗布することで、隙間遮光部31が形成される。その後、金属層20及び隙間遮光部31を覆うように樹脂を塗布することで、密封樹脂21が形成される。密封樹脂21は、遮光性を有さない材料で形成される。 As shown in FIG. 7B, only the gap light-shielding portion 31 may be configured as the light-shielding portion 30. For example, the gloss film 23 is formed, and the fine cracks 22 are formed by stretching. After that, by applying a light-shielding material so as to fill the gaps of the fine cracks 22, the gap light-shielding portions 31 are formed. Then, the sealing resin 21 is formed by applying a resin so as to cover the metal layer 20 and the gap light-shielding portion 31. The sealing resin 21 is formed of a material that does not have a light shielding property.
 このような構成でも、遮光部30により、微細クラック22の隙間を透過する光を十分に抑制することが可能となり、また内部からの不要な漏れ光を十分に抑制することが可能となる。この結果、非常に高い意匠性を実現することが可能となる。なお、遮光性材料により密封樹脂21が形成される場合には、遮光層32として機能させることが可能である。 Even with such a configuration, the light-shielding portion 30 can sufficiently suppress the light that passes through the gaps of the fine cracks 22 and sufficiently suppress unnecessary leaked light from the inside. As a result, it is possible to realize extremely high designability. When the sealing resin 21 is formed of a light blocking material, it can function as the light blocking layer 32.
 なお図7Bに示すように、微細クラック22の隙間に隙間遮光部31が形成されている状態を、金属層20と同層となるように隙間遮光部31が形成されている状態と言うことも可能である。 Note that, as shown in FIG. 7B, the state in which the gap light-shielding portion 31 is formed in the gap between the fine cracks 22 may be referred to as the state in which the gap light-shielding portion 31 is formed so as to be in the same layer as the metal layer 20. It is possible.
 図7Cに示すように、遮光部30として、遮光層32のみが構成されてもよい。例えば延伸により微細クラック22が形成されたのちに、金属層20を覆うように密封樹脂21が形成される。密封樹脂21の金属層20を覆う側とは反対側の面に、遮光性材料を塗布することで、遮光層32が形成される。遮光層32上には、粘着層18が形成される。 As shown in FIG. 7C, only the light shielding layer 32 may be configured as the light shielding unit 30. For example, after the fine cracks 22 are formed by stretching, the sealing resin 21 is formed so as to cover the metal layer 20. The light-shielding material 32 is applied to the surface of the sealing resin 21 opposite to the side covering the metal layer 20 to form the light-shielding layer 32. The adhesive layer 18 is formed on the light shielding layer 32.
 遮光層32のみが形成される場合には、外部側から意匠面12aに照射する光に対しては、微細クラック22の隙間を透過することを抑制することは難しい。一方で、内部からの不要な漏れ光を十分に抑制することは可能である。すなわち内部側から微細クラック22の隙間を透過する光を十分に抑制することは可能である。この結果、意匠性の向上を図ることが可能である。 When only the light shielding layer 32 is formed, it is difficult to suppress the light radiated from the outside to the design surface 12 a from passing through the gaps of the fine cracks 22. On the other hand, it is possible to sufficiently suppress unnecessary leaked light from the inside. That is, it is possible to sufficiently suppress the light transmitted from the inside through the gap of the fine crack 22. As a result, it is possible to improve the design.
 図8Aに示すように、遮光部30として、隙間遮光部31及び遮光層32が、別個に構成されてもよい。例えば延伸により微細クラック22が形成されたのちに、微細クラック22の隙間を埋めるように遮光性材料を塗布することで、隙間遮光部31が形成される。その後密封樹脂21が形成された後に、密封樹脂21の金属層20を覆う側とは反対側の面に遮光性材料を塗布することで、遮光層32が形成される。このような構成でも、高い意匠性を実現することが可能となる。 As shown in FIG. 8A, as the light shielding unit 30, the gap light shielding unit 31 and the light shielding layer 32 may be separately configured. For example, after the fine cracks 22 are formed by stretching, the light-shielding material is applied so as to fill the gaps between the fine cracks 22 to form the gap light-shielding portions 31. Then, after the sealing resin 21 is formed, the light shielding layer 32 is formed by applying a light shielding material to the surface of the sealing resin 21 opposite to the side covering the metal layer 20. Even with such a configuration, high designability can be realized.
 図8Bに示す例では、ベースフィルム19の金属層20が形成される面とは反対側の面に粘着層18が形成される。そして加飾フィルム12のベースフィルム19側が筐体部101の被加飾領域11に接着される。従って、密封樹脂21の金属層20を覆う側とは反対側の面が、加飾フィルム12の意匠面12aとなる。 In the example shown in FIG. 8B, the adhesive layer 18 is formed on the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed. Then, the base film 19 side of the decorative film 12 is bonded to the decorated region 11 of the housing 101. Therefore, the surface of the sealing resin 21 opposite to the side covering the metal layer 20 becomes the design surface 12 a of the decorative film 12.
 このような構成において、遮光性材料によりベースフィルム19を形成する。これにより遮光部30として、遮光層32を容易に形成することが可能となる。この結果、内部からの不要な漏れ光を十分に抑制することが可能となり、高い意匠性を実現することが可能となる。 In such a structure, the base film 19 is formed of a light shielding material. As a result, the light shielding layer 32 can be easily formed as the light shielding portion 30. As a result, unnecessary leakage of light from the inside can be sufficiently suppressed, and high designability can be realized.
 なお筐体部101の成形条件等においては、粘着層18及び密封樹脂21が省略される場合もある。この場合、光沢フィルム23が本技術に係る加飾フィルムとして被加飾領域11に接着される。 Note that the adhesive layer 18 and the sealing resin 21 may be omitted depending on the molding conditions of the housing 101 and the like. In this case, the gloss film 23 is bonded to the decorated region 11 as a decorative film according to the present technology.
 図8Bではベースフィルム19により遮光部30が実現された。もちろんこれに限定されず、図8Cに示すように、隙間遮光部31及び遮光層32が新たに付加されてもよい。 In FIG. 8B, the light shielding portion 30 is realized by the base film 19. Of course, the present invention is not limited to this, and as shown in FIG. 8C, the gap light-shielding portion 31 and the light-shielding layer 32 may be newly added.
 例えば延伸により微細クラック22が形成されたのちに、微細クラック22の隙間を埋めるように遮光性材料を塗布することで、隙間遮光部31が形成される。またベースフィルム19の金属層20が形成される面とは反対側の面に遮光性材料を塗布することで、遮光層32が形成される。このよううな構成でも、高い意匠性を実現することが可能となる。もちろん、隙間遮光部31又は遮光層32のいずれか一方のみが形成されてもよい。 The gap light-shielding portion 31 is formed by applying the light-shielding material so as to fill the gaps between the fine cracks 22 after the fine cracks 22 are formed by stretching, for example. The light-shielding material 32 is applied to the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed, whereby the light-shielding layer 32 is formed. Even with such a configuration, high designability can be realized. Of course, only one of the gap light-shielding portion 31 and the light-shielding layer 32 may be formed.
 遮光部30(隙間遮光部31、遮光層32)を実現するために用いられる遮光材料として、任意の材料が用いられてよい。もちろん密封樹脂21やベースフィルム19等の他の機能も有する要素にて遮光部30が実現される場合には、その他の機能も発揮されるように、適宜材料が選択されればよい。 Any material may be used as the light-shielding material used to realize the light-shielding portion 30 (the gap light-shielding portion 31, the light-shielding layer 32). Of course, when the light-shielding portion 30 is realized by an element having other functions such as the sealing resin 21 and the base film 19, the material may be appropriately selected so that the other functions are also exhibited.
 図2、図7及び図8を参照して説明したように、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に、遮光部30を構成する。具体的には、微細クラック22が形成された金属層20と、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に構成される遮光部30とを含む加飾フィルム12を形成する。これにより、微細クラック22の隙間を透過する光を抑制することが可能となる。この結果、金属的な外観を有しつつも電波を透過可能な意匠性の高い筐体部101を実現することが可能となる。 As described with reference to FIG. 2, FIG. 7 and FIG. 8, the light shielding portion 30 is formed in at least one of the gaps of the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). To do. Specifically, the light-shielding portion 30 formed on at least one of the metal layer 20 in which the fine cracks 22 are formed and the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). The decorative film 12 including and is formed. This makes it possible to suppress the light transmitted through the gaps of the fine cracks 22. As a result, it is possible to realize the housing portion 101 having a metallic appearance and a high design property that allows transmission of radio waves.
 [ポイントBについて]
 発明者は、ポイントBを実現するために、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に、加飾機能を有する加飾機能部を構成することを新たに考案した。具体的には、光の透過又は反射の少なくとも一方を利用した加飾機能を有する加飾機能部を構成する。
[About point B]
In order to realize the point B, the inventor provides a decorating function portion having a decorating function in at least one of the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). Invented to make up anew. Specifically, a decoration function unit having a decoration function using at least one of transmission and reflection of light is configured.
 光の透過又は反射を利用した加飾機能を有する加飾機能部としては、加飾機能部を透過する透過光又は加飾機能部により反射される反射光を、所定の意匠性を実現するために機能させることが可能な任意の構成を含む。 As the decoration function unit having a decoration function using the transmission or reflection of light, the transmitted light transmitted through the decoration function unit or the reflected light reflected by the decoration function unit is used to realize a predetermined design property. It includes any configuration capable of functioning.
 例えば所定の色で着色された光透過性を有する部材や層等は、その色を表現可能な加飾機能部として機能し得る。また積層構造を有し、透過又は反射により一方の層から出射される光に対して、他方の層により干渉を生じさせる。この光の干渉を利用して、色彩の調整等、所定の意匠性の実現を図ることが可能である。このような積層構造を有する部材や層等は、加飾機能部として機能し得る。また印刷層等も、加飾機能部として機能し得る。 For example, a light-transmissive member or layer that is colored with a predetermined color can function as a decorative function unit that can express the color. Further, it has a laminated structure, and the light emitted from one layer by transmission or reflection causes interference by the other layer. By utilizing this light interference, it is possible to achieve a predetermined design property such as color adjustment. A member, layer, or the like having such a laminated structure can function as a decoration function unit. In addition, the print layer and the like can also function as the decoration function unit.
 図9に例示する加飾フィルム12において、加飾機能を有する加飾機能部40として、密封樹脂21を形成する。これにより微細クラック22の隙間を、加飾機能を有する材料により埋めることが可能となる。また金属層20と接着面12bとの間に、加飾機能を有する材料による層を実現することが可能となる。 In the decorative film 12 illustrated in FIG. 9, the sealing resin 21 is formed as the decorative function part 40 having a decorative function. This makes it possible to fill the gaps between the fine cracks 22 with a material having a decorating function. In addition, a layer made of a material having a decorating function can be realized between the metal layer 20 and the adhesive surface 12b.
 図9に示すように、以下、微細クラック22の隙間に構成される加飾機能部を有する材料を、隙間加飾機能部41とする。金属層20と接着面12bとの間に構成される加飾機能図を有する層を、加飾機能層42とする。なお図9に例示する構成は、図2に例示する加飾フィルム12において、遮光部30(隙間遮光部31、遮光層32)を、加飾機能部40(隙間加飾機能部41、加飾機能層42)に代えたものに相当する。もちろんこの構成に限定される訳ではない。 As shown in FIG. 9, hereinafter, a material having a decoration function part formed in the gap of the fine crack 22 is referred to as a gap decoration function part 41. A layer having a decorative function diagram formed between the metal layer 20 and the adhesive surface 12b is referred to as a decorative function layer 42. In the decorative film 12 illustrated in FIG. 2, the configuration illustrated in FIG. 9 includes the light-shielding portion 30 (the gap light-shielding portion 31, the light-shielding layer 32), the decoration function portion 40 (the gap decoration function portion 41, the decoration This corresponds to the one obtained by replacing the functional layer 42). Of course, the configuration is not limited to this.
 例えば光沢フィルム23が形成され、延伸により微細クラック22が形成される。その後に、金属層20を覆うように加飾機能を有する材料からなる樹脂を塗布することで、密封樹脂21が形成される。これにより隙間加飾機能部41と加飾機能層42とを、一体的に容易に形成することが可能となる。図9に示す例では、隙間加飾機能部41及び加飾機能層42として機能する密封樹脂21により、加飾機能部40が構成される。 For example, the gloss film 23 is formed, and the fine cracks 22 are formed by stretching. After that, a resin made of a material having a decorating function is applied so as to cover the metal layer 20 to form the sealing resin 21. This makes it possible to easily form the gap decoration function part 41 and the decoration function layer 42 integrally. In the example shown in FIG. 9, the sealing resin 21 that functions as the gap decoration function section 41 and the decoration function layer 42 configures the decoration function section 40.
 加飾機能部40を構成することで、外部側から微細クラック22の隙間に入射する光や、内部側から微細クラック22の隙間に入射する光を積極的に利用して、意匠性を向上させることが可能となる。 By configuring the decoration function unit 40, light that enters the gap between the fine cracks 22 from the outside and light that enters the gap between the fine cracks 22 from the inside is positively used to improve the design. It becomes possible.
 例えば加飾機能部40(隙間加飾機能部41、加飾機能層42)を透過する透過光を利用して、意匠面12aの意匠性を向上させることが可能である。また加飾機能部40(隙間加飾機能部41、加飾機能層42)により反射される反射光を利用して、意匠面12aの意匠性を向上させることが可能である。その他、隙間加飾機能部41を透過した光を、加飾機能層42により反射させ、再度隙間加飾機能部41を透過させることも可能である。 For example, it is possible to improve the designability of the design surface 12a by using the transmitted light that passes through the decoration function part 40 (the gap decoration function part 41 and the decoration function layer 42). Further, it is possible to improve the designability of the design surface 12a by using the reflected light reflected by the decoration function part 40 (the gap decoration function part 41, the decoration function layer 42). In addition, it is also possible to reflect the light transmitted through the gap decoration function unit 41 by the decoration function layer 42 and transmit the light through the gap decoration function unit 41 again.
 具体的には、意匠例(デザイン例)として、微細クラック22が着色されたデザインや、微細クラック22から加飾された光が透過しているようなデザインが考えられる。もちろんこのようなデザインに限定される訳ではない。 Specifically, as a design example (design example), a design in which the fine cracks 22 are colored, or a design in which light decorated from the fine cracks 22 is transmitted is considered. Of course, it is not limited to such a design.
 このように加飾機能部40を構成することで、微細クラック22の隙間に入射する光の意匠性への影響をコントロールすることが可能となる。この結果、非常に高い意匠性を実現することが可能となる。なお、金属層20に対して、同層あるいは裏層(内部側の層)に加飾機能部40が構成されるので、金属層20を表面側(意匠面側)に配置することが容易となる。この結果、高い反射率を有する金属光沢を実現することが可能となる。 By configuring the decoration function section 40 in this way, it is possible to control the influence of the light incident on the gaps of the microcracks 22 on the design. As a result, it is possible to realize extremely high designability. Since the decorative function section 40 is formed in the same layer or a back layer (inner layer) with respect to the metal layer 20, it is easy to arrange the metal layer 20 on the front surface side (design surface side). Become. As a result, it is possible to realize a metallic luster having a high reflectance.
 図10及び図11は、加飾機能部の他の構成例を示す模式図である。なお図10及び図11に例示する構成は、図7及び図8に例示する加飾フィルム12において、遮光部30を加飾機能部40に代えたものに相当する。以下、改めてこれらの構成について説明する。 10 and 11 are schematic diagrams showing another configuration example of the decoration function unit. The configuration illustrated in FIGS. 10 and 11 corresponds to the decorative film 12 illustrated in FIGS. 7 and 8 in which the light shielding unit 30 is replaced with the decorative function unit 40. Hereinafter, these configurations will be described again.
 例えば図10Aに示すように、加飾機能部40として機能する密封樹脂21に、粘着機能を備えさせることも可能である。これにより粘着層18を省略することが可能となり、製造工程の簡素化を図ることが可能となる。 For example, as shown in FIG. 10A, the sealing resin 21 functioning as the decoration function unit 40 can be provided with an adhesive function. As a result, the adhesive layer 18 can be omitted, and the manufacturing process can be simplified.
 図10Bに示すように、加飾機能部40として、隙間加飾機能部41のみが構成されてもよい。例えば光沢フィルム23が形成され、延伸により微細クラック22が形成される。その後に、微細クラック22の隙間を埋めるように加飾機能を有する材料を塗布することで、隙間加飾機能部41が形成される。その後、金属層20及び隙間加飾機能部41を覆うように樹脂を塗布することで、密封樹脂21が形成される。密封樹脂21は、加飾機能を有さない材料で形成される。 As shown in FIG. 10B, only the gap decoration function unit 41 may be configured as the decoration function unit 40. For example, the gloss film 23 is formed, and the fine cracks 22 are formed by stretching. Thereafter, a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 to form the gap decorating function part 41. Then, the sealing resin 21 is formed by applying a resin so as to cover the metal layer 20 and the gap decoration function part 41. The sealing resin 21 is formed of a material having no decoration function.
 このような構成でも、加飾機能部40により、外部側から微細クラック22の隙間に入射する光や、内部側から微細クラック22の隙間に入射する光を積極的に利用して、意匠性を向上させることが可能となる。なお、加飾機能を有する材料により密封樹脂21が形成される場合には、加飾機能層42として機能させることが可能である。 Even with such a configuration, the decorative function unit 40 positively utilizes light that enters the gap between the fine cracks 22 from the outside and light that enters the gap between the fine cracks 22 from the inside to improve the design. It is possible to improve. When the sealing resin 21 is made of a material having a decoration function, it can function as the decoration function layer 42.
 図10Cに示すように、加飾機能部40として、加飾機能層42のみが構成されてもよい。例えば延伸により微細クラック22が形成されたのちに、金属層20を覆うように光透過性を有する密封樹脂21が形成される。密封樹脂21の金属層20を覆う側とは反対側の面に、加飾機能を有する材料を塗布することで、加飾機能層42が形成される。加飾機能層42上には、粘着層18が形成される。 As shown in FIG. 10C, only the decorative function layer 42 may be configured as the decorative function unit 40. For example, after the fine cracks 22 are formed by stretching, the light-transmitting sealing resin 21 is formed so as to cover the metal layer 20. The decorative functional layer 42 is formed by applying a material having a decorative function to the surface of the sealing resin 21 opposite to the side covering the metal layer 20. The adhesive layer 18 is formed on the decorative functional layer 42.
 このような構成でも、外部側から微細クラック22の隙間に入射する光や、内部側から微細クラック22の隙間に入射する光を積極的に利用して、意匠性を向上させることが可能となる。 Even with such a configuration, it is possible to improve the design by positively utilizing the light that enters the gap between the fine cracks 22 from the outside and the light that enters the gap between the fine cracks 22 from the inside. ..
 図11Aに示すように、加飾機能部40として、隙間加飾機能部41及び加飾機能層42が、別個に構成されてもよい。例えば延伸により微細クラック22が形成されたのちに、微細クラック22の隙間を埋めるように加飾機能を有する材料を塗布することで、隙間加飾機能部41が形成される。その後密封樹脂21が形成された後に、密封樹脂21の金属層20を覆う側とは反対側の面に加飾機能を有する材料を塗布することで、加飾機能層42が形成される。このような構成でも、高い意匠性を実現することが可能となる。 As shown in FIG. 11A, as the decoration function section 40, the gap decoration function section 41 and the decoration function layer 42 may be separately configured. For example, after the fine cracks 22 are formed by stretching, a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 to form the gap decorating function part 41. Then, after the sealing resin 21 is formed, a decorative function layer 42 is formed by applying a material having a decorative function to the surface of the sealing resin 21 opposite to the side covering the metal layer 20. Even with such a configuration, high designability can be realized.
 図11Bに示す例では、ベースフィルム19の金属層20が形成される面とは反対側の面に粘着層18が形成される。そして加飾フィルム12のベースフィルム19側が筐体部101の被加飾領域11に接着される。従って、密封樹脂21の金属層20を覆う側とは反対側の面が、加飾フィルム12の意匠面12aとなる。 In the example shown in FIG. 11B, the adhesive layer 18 is formed on the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed. Then, the base film 19 side of the decorative film 12 is bonded to the decorated region 11 of the housing 101. Therefore, the surface of the sealing resin 21 opposite to the side covering the metal layer 20 becomes the design surface 12 a of the decorative film 12.
 このような構成において、加飾機能を有する材料によりベースフィルム19を形成する。これにより加飾機能部40として、加飾機能層42を容易に形成することが可能となる。この結果、外部側から微細クラック22の隙間に入射する光や、内部側から微細クラック22の隙間に入射する光を積極的に利用して、意匠性を向上させることが可能となる。 In such a structure, the base film 19 is formed of a material having a decorating function. As a result, the decorative function layer 42 can be easily formed as the decorative function section 40. As a result, it is possible to improve the design by positively utilizing the light that enters the gap between the fine cracks 22 from the outside and the light that enters the gap between the fine cracks 22 from the inside.
 なお筐体部101の成形条件等においては、粘着層18及び密封樹脂21が省略される場合もある。この場合、光沢フィルム23が本技術に係る加飾フィルムとして被加飾領域11に接着される。 Note that the adhesive layer 18 and the sealing resin 21 may be omitted depending on the molding conditions of the housing 101 and the like. In this case, the gloss film 23 is bonded to the decorated region 11 as a decorative film according to the present technology.
 図11Bではベースフィルム19により加飾機能部40が実現された。もちろんこれに限定されず、図11Cに示すように、隙間加飾機能部41及び加飾機能層42が新たに付加されてもよい。 In FIG. 11B, the decorative function unit 40 is realized by the base film 19. Of course, the present invention is not limited to this, and as shown in FIG. 11C, the gap decoration function part 41 and the decoration function layer 42 may be newly added.
 例えば延伸により微細クラック22が形成されたのちに、微細クラック22の隙間を埋めるように加飾機能を有する材料を塗布することで、隙間加飾機能部41が形成される。またベースフィルム19の金属層20が形成される面とは反対側の面に加飾機能を有する材料を塗布することで、加飾機能層42が形成される。このよううな構成でも、高い意匠性を実現することが可能となる。もちろん、隙間加飾機能部41又は加飾機能層42のいずれか一方のみが形成されてもよい。 For example, after the fine cracks 22 are formed by stretching, a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 to form the gap decorating function part 41. The decorative function layer 42 is formed by applying a material having a decorative function to the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed. Even with such a configuration, high designability can be realized. Of course, only one of the gap decoration function part 41 and the decoration function layer 42 may be formed.
 加飾機能部40(隙間加飾機能部41、加飾機能層42)を実現するために用いられる加飾機能を有する材料として、任意の材料が用いられてよい。もちろん密封樹脂21やベースフィルム19等の他の機能も有する要素にて加飾機能部40が実現される場合には、その他の機能も発揮されるように、適宜材料が選択されればよい。 Any material may be used as a material having a decorating function used to realize the decorating functional unit 40 (the gap decorating functional unit 41, the decorating functional layer 42). Of course, when the decorative function section 40 is realized by an element having another function such as the sealing resin 21 and the base film 19, the material may be appropriately selected so that the other function is also exhibited.
 図9、図10及び図11を参照して説明したように、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に、加飾機能部40を構成する。具体的には、微細クラック22が形成された金属層20と、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に構成される加飾機能部40とを含む加飾フィルム12を形成する。これにより、外部側から微細クラック22の隙間に入射する光や、内部側から微細クラック22の隙間に入射する光を積極的に利用して、意匠性を向上させることが可能となる。この結果、金属的な外観を有しつつも電波を透過可能な意匠性の高い筐体部101を実現することが可能となる。 As described with reference to FIG. 9, FIG. 10 and FIG. 11, the decoration function part 40 is provided in at least one of the gaps of the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). Make up. Specifically, the decorating function configured in at least one of the metal layer 20 in which the fine cracks 22 are formed and the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). The decorative film 12 including the part 40 is formed. This makes it possible to improve the design by positively utilizing the light that enters the gap between the fine cracks 22 from the outside and the light that enters the gap between the fine cracks 22 from the inside. As a result, it is possible to realize the housing portion 101 having a metallic appearance and a high design property that allows transmission of radio waves.
 [ポイントCについて]
 図12は、遮光部30及び加飾機能部40を組み合わせた場合の構成例を示す模式図である。図12Aに示す例では、例えば延伸により微細クラック22が形成されたのちに、微細クラック22の隙間を埋めるように加飾機能を有する材料を塗布することで、隙間加飾機能部41が加飾機能部40として形成される。その後密封樹脂21が形成された後に、密封樹脂21の金属層20を覆う側とは反対側の面に遮光性材料を塗布することで、遮光層32が遮光部30として形成される。
[About point C]
FIG. 12 is a schematic diagram showing a configuration example in which the light shielding unit 30 and the decoration function unit 40 are combined. In the example shown in FIG. 12A, after the fine cracks 22 are formed by stretching, for example, a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 so that the gap decorating function part 41 decorates. It is formed as the functional unit 40. Then, after the sealing resin 21 is formed, a light shielding material is applied to the surface of the sealing resin 21 opposite to the side covering the metal layer 20, so that the light shielding layer 32 is formed as the light shielding portion 30.
 このように遮光部30及び加飾機能部40を組み合わせることで、筐体部101の内部からの不要な漏れ光を十分に抑制することが可能となる。また外部側から微細クラック22の隙間に入射する光の意匠性への影響をコントロールすることが可能となる。この結果、高い意匠性を実現することが可能となる。 By combining the light shielding unit 30 and the decoration function unit 40 in this manner, it becomes possible to sufficiently suppress unnecessary leakage light from the inside of the housing unit 101. Further, it becomes possible to control the influence of the light incident on the gap of the fine crack 22 from the outside on the design. As a result, high designability can be realized.
 なお、加飾機能を有する材料により密封樹脂21が形成され、その裏層(内部側の層)に遮光層32が形成されてもよい。この場合、隙間加飾機能部41、加飾機能層42、及び遮光層32を容易に形成することが可能となる。あるいは、隙間加飾機能部41を形成したのちに、遮光性材料により密封樹脂21が遮光層32として形成されてもよい。 The sealing resin 21 may be formed of a material having a decorating function, and the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the sealing resin 21. In this case, the gap decoration function part 41, the decoration function layer 42, and the light shielding layer 32 can be easily formed. Alternatively, the sealing resin 21 may be formed as the light shielding layer 32 of a light shielding material after forming the gap decoration function portion 41.
 また加飾機能層42及び遮光層32の組み合わせも考えられる。例えば密封樹脂21の裏層(内部側の層)に、加飾機能層42が形成される。そして加飾機能層42の裏層(内部側の層)に遮光層32が形成されてもよい。その他、任意の構成が採用されてよい。 A combination of the decorative functional layer 42 and the light shielding layer 32 is also possible. For example, the decorative functional layer 42 is formed on the back layer (inner layer) of the sealing resin 21. Then, the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the decorative function layer 42. Besides, any configuration may be adopted.
 図12Bに示す例では、例えば延伸により微細クラック22が形成されたのちに、微細クラック22の隙間を埋めるように加飾機能を有する材料を塗布することで、隙間加飾機能部41が加飾機能部40として形成される。またベースフィルム19の金属層20が形成される面とは反対側の面に遮光性材料を塗布することで、遮光層32が遮光部30として形成される。このような構成でも、高い意匠性を実現することが可能となる。 In the example shown in FIG. 12B, for example, after the fine cracks 22 are formed by stretching, a material having a decorating function is applied so as to fill the gaps between the fine cracks 22 so that the gap decorating function unit 41 decorates. It is formed as the functional unit 40. Further, the light-shielding material is applied to the surface of the base film 19 opposite to the surface on which the metal layer 20 is formed, whereby the light-shielding layer 32 is formed as the light-shielding portion 30. Even with such a configuration, high designability can be realized.
 なお、加飾機能を有する材料によりベースフィルム19が形成され、その裏層(内部側の層)に遮光層32が形成されてもよい。この場合、隙間加飾機能部41、加飾機能層42、及び遮光層32を容易に形成することが可能となる。あるいは、遮光性材料によりベースフィルム19を形成し、微細クラック22の隙間に隙間加飾機能部41が形成されてもよい。 The base film 19 may be formed of a material having a decorating function, and the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the base film 19. In this case, the gap decoration function part 41, the decoration function layer 42, and the light shielding layer 32 can be easily formed. Alternatively, the base film 19 may be formed of a light-shielding material, and the gap decoration function part 41 may be formed in the gap between the fine cracks 22.
 また加飾機能層42及び遮光層32の組み合わせも考えられる。例えばベースフィルム19の裏層(内部側の層)に、加飾機能層42が形成される。そして加飾機能層42の裏層(内部側の層)に遮光層32が形成されてもよい。その他、任意の構成が採用されてよい。 A combination of the decorative functional layer 42 and the light shielding layer 32 is also possible. For example, the decorative functional layer 42 is formed on the back layer (inner layer) of the base film 19. Then, the light shielding layer 32 may be formed on the back layer (layer on the inner side) of the decorative function layer 42. Besides, any configuration may be adopted.
 図12を参照して説明したように、微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に、遮光部30を構成する。また微細クラック22の隙間、又は金属層20と接着面12b(第2の面)との間の少なくとも一方に、加飾機能部40を構成する。すなわち遮光部30と加飾機能部40とを組み合わせる。これにより、金属的な外観を有しつつも電波を透過可能な意匠性の高い筐体部101を実現することが可能となる。 As described with reference to FIG. 12, the light shielding portion 30 is formed in at least one of the gaps between the fine cracks 22 or between the metal layer 20 and the adhesive surface 12b (second surface). Further, the decorating function part 40 is formed in at least one of the gap between the fine cracks 22 or between the metal layer 20 and the bonding surface 12b (second surface). That is, the light shielding unit 30 and the decoration function unit 40 are combined. As a result, it is possible to realize the housing portion 101 having a metallic appearance and a high design property that allows transmission of radio waves.
 図13は、インモールド成形法を説明するための模式的な図である。インモールド成形は、図13に示すようなキャビティ型301とコア型302とを有する成形装置300により行われる。図13Aに示すように、キャビティ型301には、筐体部101の形状に応じた凹部303が形成されている。この凹部303を覆うようにして転写用フィルム50が配置される。転写用フィルム50は、キャリアフィルム51に、図2等に示す加飾フィルム12が接着されることで形成される。転写用フィルム50は、例えばロールツーロール方式によって、成形装置300の外部から供給される。 FIG. 13 is a schematic diagram for explaining the in-mold molding method. The in-mold molding is performed by a molding device 300 having a cavity mold 301 and a core mold 302 as shown in FIG. As shown in FIG. 13A, the cavity mold 301 is provided with a recess 303 corresponding to the shape of the casing 101. The transfer film 50 is arranged so as to cover the recess 303. The transfer film 50 is formed by adhering the decorative film 12 shown in FIG. The transfer film 50 is supplied from the outside of the molding apparatus 300 by, for example, a roll-to-roll method.
 図13Bに示すように、キャビティ型301とコア型302とがクランプされ、コア型302に形成されたゲート部306を介して、凹部303に成形樹脂55が射出される。キャビティ型301には、成形樹脂55が供給されるスプルー部508と、これに連結するランナー部509とが形成されている。キャビティ型301とコア型302とがクランプされると、ランナー部509とゲート部306とが連結される。これによりスプルー部508に供給された成形樹脂55が、凹部303に射出される。なお成形樹脂55を射出するための構成は限定されない。 As shown in FIG. 13B, the cavity mold 301 and the core mold 302 are clamped, and the molding resin 55 is injected into the recess 303 through the gate portion 306 formed on the core mold 302. The cavity mold 301 is formed with a sprue portion 508 to which the molding resin 55 is supplied and a runner portion 509 connected to the sprue portion 508. When the cavity mold 301 and the core mold 302 are clamped, the runner portion 509 and the gate portion 306 are connected. As a result, the molding resin 55 supplied to the sprue portion 508 is injected into the recess 303. The structure for injecting the molding resin 55 is not limited.
 成形樹脂55としては、例えばABS(アクリロニトリル・ブタジエン・スチレン)樹脂等の汎用樹脂、PC樹脂、ABSとPCの混合樹脂等のエンジニアリングプラスチック等が用いられる。これらに限定されず、所望の筐体部(筐体部品)が得られるように、成形樹脂の材料や色(透明度)が適宜選択されてよい。 As the molding resin 55, for example, a general-purpose resin such as ABS (acrylonitrile-butadiene-styrene) resin, a PC resin, an engineering plastic such as a mixed resin of ABS and PC, and the like are used. The material and color (transparency) of the molding resin may be appropriately selected so as to obtain a desired housing part (housing part) without being limited thereto.
 成形樹脂55は、高温で溶かされた状態で凹部303に射出される。成形樹脂55は、凹部303の内面を押圧するように射出される。この際、凹部303に配置された転写用フィルム50は成形樹脂55により押圧されて変形する。成形樹脂55の熱により、転写用フィルム50に形成された粘着層18が溶かされ、成形樹脂55の表面に加飾フィルム12が接着される。 The molding resin 55 is injected into the recess 303 while being melted at a high temperature. The molding resin 55 is injected so as to press the inner surface of the recess 303. At this time, the transfer film 50 disposed in the recess 303 is pressed by the molding resin 55 to be deformed. The adhesive layer 18 formed on the transfer film 50 is melted by the heat of the molding resin 55, and the decorative film 12 is bonded to the surface of the molding resin 55.
 成形樹脂55射出された後、キャビティ型301及びコア型302は冷却され、クランプが解除される。コア型302には、加飾フィルム12が転写された成形樹脂55が付着している。当該成形樹脂55が取り出されることで、所定の領域に金属加飾部10が形成された筐体部101が製造される。なおクランプが解除される際に、キャリアフィルム51は剥離される。 After the molding resin 55 is injected, the cavity mold 301 and the core mold 302 are cooled and the clamp is released. The molding resin 55 to which the decorative film 12 is transferred is attached to the core mold 302. By taking out the molding resin 55, the housing 101 in which the metal decorative portion 10 is formed in a predetermined region is manufactured. The carrier film 51 is peeled off when the clamp is released.
 インモールド成形法が用いられることで、加飾フィルム12の位置合わせが容易となり、簡単に金属加飾部10を形成することができる。また筐体部101の形状の設計自由度が高く、種々の形状を有する筐体部101を製造することができる。 By using the in-mold molding method, the positioning of the decorative film 12 becomes easy, and the metal decorative portion 10 can be easily formed. Further, the degree of freedom in designing the shape of the casing 101 is high, and the casing 101 having various shapes can be manufactured.
 なお筐体部101の内側に収容されるアンテナ部15が、筐体部101の成形時にインモールド成形法により取り付けられてもよい。あるいは筐体部101の成形後に、筐体部101の内側にアンテナ部15が貼り付けられてもよい。また、筺体内部にアンテナ部15が内蔵される場合もあり得る。 The antenna unit 15 housed inside the housing unit 101 may be attached by an in-mold molding method when the housing unit 101 is molded. Alternatively, the antenna unit 15 may be attached to the inside of the housing unit 101 after the housing unit 101 is molded. In addition, the antenna unit 15 may be built in the housing.
 図14は、インサート成形法を説明するための模式的な図である。インサート成形では、成形装置350のキャビティ型351内に、加飾フィルム12がインサートフィルムとして配置される。そして図14Bに示すように、キャビティ型351とコア型352とがクランプされ、ゲート部356を介して、キャビティ型351内に成形樹脂55が射出される。これにより加飾フィルム12と一体的に筐体部101が形成される。インサート成形法が用いられることでも、簡単に金属加飾部10を形成することができる。また種々の形状を有する筐体部101を製造することができる。なおインモールド成形及びインサート成形を実行する成形装置の構成は限定されない。 FIG. 14 is a schematic diagram for explaining the insert molding method. In insert molding, the decorative film 12 is arranged as an insert film in the cavity mold 351 of the molding device 350. Then, as shown in FIG. 14B, the cavity mold 351 and the core mold 352 are clamped, and the molding resin 55 is injected into the cavity mold 351 via the gate portion 356. As a result, the casing 101 is formed integrally with the decorative film 12. The metal decoration portion 10 can be easily formed by using the insert molding method. In addition, the casing 101 having various shapes can be manufactured. The configuration of the molding device that performs in-mold molding and insert molding is not limited.
 図15は、ベースフィルムと金属層とを含む転写用フィルムの構成例を示す概略図である。この転写用フィルム450は、ベースフィルム419と、剥離層481と、ハードコート層482と、金属層420と、密封樹脂421と、粘着層418とを有する。剥離層481及びハードコート層482は、この順でベースフィルム419上に形成される。 FIG. 15 is a schematic diagram showing a configuration example of a transfer film including a base film and a metal layer. The transfer film 450 includes a base film 419, a peeling layer 481, a hard coat layer 482, a metal layer 420, a sealing resin 421, and an adhesive layer 418. The peeling layer 481 and the hard coat layer 482 are formed on the base film 419 in this order.
 従って金属層420は、剥離層481及びハードコート層482が形成されたベースフィルム419上に形成される。そしてベースフィルム419が延伸されることで、金属層420に微細クラック422が形成される。 Therefore, the metal layer 420 is formed on the base film 419 on which the peeling layer 481 and the hard coat layer 482 are formed. Then, by stretching the base film 419, fine cracks 422 are formed in the metal layer 420.
 なお図15に示す例では、密封樹脂421が、遮光部又は加飾機能部として構成される。もちろんそのような構成に限定される訳ではない。 Note that, in the example shown in FIG. 15, the sealing resin 421 is configured as a light shielding portion or a decoration function portion. Of course, it is not limited to such a configuration.
 図15Bに示すように、インモールド成形法により筐体部101が形成される際には、ベースフィルム419及び剥離層481が剥離され、金属層420及び遮光部(又は加飾機能部)を含む加飾部412が、被加飾領域411に接着される。このようにベースフィルム419がキャリアフィルムとして用いられてもよい。なお剥離層481が形成されたベースフィルム419を、本技術に係るベースフィルムとみなすこともできる。またベースフィルム419から剥離された加飾部412を加飾フィルムと言うこともできる。 As shown in FIG. 15B, when the housing 101 is formed by the in-mold molding method, the base film 419 and the peeling layer 481 are peeled off, and the metal layer 420 and the light shielding portion (or the decoration function portion) are included. The decorative portion 412 is bonded to the decorated region 411. Thus, the base film 419 may be used as a carrier film. The base film 419 on which the peeling layer 481 is formed can be regarded as the base film according to the present technology. The decorative portion 412 separated from the base film 419 can also be referred to as a decorative film.
 なお図15に示す例では、金属層420の蒸着開始面が意匠面412a側の面となり、蒸着終了面が接着面412b側の面となる。この構成に代えて、蒸着終了面が意匠面412a側の面となり、蒸着開始面が接着面412b側の面となるように、転写用フィルムが作成されてもよい。 In the example shown in FIG. 15, the vapor deposition start surface of the metal layer 420 is the design surface 412a side, and the vapor deposition end surface is the adhesion surface 412b side. Instead of this configuration, the transfer film may be formed so that the vapor deposition end surface becomes the design surface 412a side and the vapor deposition start surface becomes the adhesive surface 412b side surface.
 図13及び図15に示す転写用フィルム50及び450を用いて、ホットスタンプ法により、被加飾領域11に金属層20及び遮光部(又は加飾機能部)を含む加飾フィルム(加飾部)12が転写された筐体部101が形成されてもよい。その他、貼り付け等の任意の方法により、加飾フィルム12が筐体部101に接着されてもよい。また真空成形や圧空成形等が用いられてもよい。 A decorative film (decorative part) including the metal layer 20 and the light shielding part (or the decorative functional part) in the decorated region 11 by the hot stamping method using the transfer films 50 and 450 shown in FIGS. 13 and 15. )12 may be transferred to form the casing 101. Alternatively, the decorative film 12 may be adhered to the housing 101 by an arbitrary method such as sticking. Further, vacuum forming, pressure forming and the like may be used.
 本技術を適用可能な金属材料はアルミニウムに限定されず、銀(Ag)等の他の金属材料が用いられてもよい。例えば酸素を添加することで、2%以下の延伸率にて微細クラック22を適正に形成することが可能となり、反射率が70%以上の金属層20を実現することが可能となる。 The metal material to which the present technology can be applied is not limited to aluminum, and other metal materials such as silver (Ag) may be used. For example, by adding oxygen, the fine cracks 22 can be properly formed at a draw ratio of 2% or less, and the metal layer 20 having a reflectivity of 70% or more can be realized.
 また金属材料として、アルミニウム、チタン、クロム、及びこれらのうち少なくとも1つを含む合金を用いることも可能である。これらの金属はいわゆる弁金属であり、酸化被膜による酸化の防止効果を十分に発揮させることが可能となる。この結果、高い意匠性を長期間維持することが可能となる。 It is also possible to use aluminum, titanium, chromium, or an alloy containing at least one of these as the metal material. These metals are so-called valve metals, and it becomes possible to sufficiently exert the effect of preventing oxidation by the oxide film. As a result, high designability can be maintained for a long time.
 添加される元素も酸素に限定されず、例えば窒素(N)が添加されてもよい。例えば酸素導入機構に代えて、窒素導入機構が配置され、導入ガスとして窒素が吹き付けられてもよい。例えば延伸工程後の金属膜の表面が絶縁状態となる添加量から、金属層が窒化するまでの範囲で、供給量が適宜設定されればよい。例えば膜厚方向において窒素の添加濃度を異ならせることで高い意匠性が発揮される。また金属層の両面の近傍領域において窒素と化合していない金属の割合を所定の閾値以上とすることで、窒化の進行を防止することが可能となる。なお、その他の元素が添加されてもよい。 The element to be added is not limited to oxygen, and nitrogen (N) may be added, for example. For example, instead of the oxygen introduction mechanism, a nitrogen introduction mechanism may be arranged and nitrogen may be blown as the introduction gas. For example, the supply amount may be appropriately set within a range from the addition amount at which the surface of the metal film becomes insulating after the stretching step to the nitriding of the metal layer. For example, high designability is exhibited by changing the addition concentration of nitrogen in the film thickness direction. Further, by setting the ratio of the metal that has not been combined with nitrogen in the vicinity of both surfaces of the metal layer to a predetermined threshold value or more, it becomes possible to prevent the progress of nitriding. Note that other elements may be added.
 電波を透過する金属膜としてInやSnの島状構造を有する薄膜を使用した場合、反射率は、50%~60%程度となる。これは材料の光学定数に起因しており、本実施形態に係る光沢フィルム23のように、70%以上の反射率を実現することは非常に難しい。またInは希少金属であるため材料コストがかかってしまう。 When a thin film having an island structure of In or Sn is used as a metal film that transmits radio waves, the reflectance is about 50% to 60%. This is due to the optical constants of the materials, and it is very difficult to realize a reflectance of 70% or more like the gloss film 23 according to this embodiment. Further, In is a rare metal, so that material cost is required.
 また無電解メッキを用いて、アフターベーキングを行うことでニッケルや銅等の金属皮膜にクラックを発生させる場合も、70%以上の反射率を実現することは難しい。またシリコンと金属を合金化させ、表面抵抗率を上げることで電波透過性を発生させることも考えられるが、この場合も、70%以上の反射率を実現することは難しい。 Also, it is difficult to achieve a reflectance of 70% or higher even when cracking occurs in a metal film such as nickel or copper by performing after-baking using electroless plating. It is also conceivable to generate radio wave transparency by alloying silicon with a metal and increasing the surface resistivity, but in this case as well, it is difficult to achieve a reflectance of 70% or more.
 また本実施形態では、真空蒸着により金属材料の膜が形成されるので、無電解メッキ等の湿式のメッキでは樹脂上に成膜することが難しいAlやTi等の材料を用いることができる。従って使用可能な金属材料の選択範囲が非常に広く、反射率が高い金属材料を用いることができる。また2軸延伸により微細クラック22を形成するので、真空蒸着においては、高い密着性にて金属層20を形成することが可能となる。その結果、インモールド成形時やインサート成形時において、金属層20が流れ落ちるといったことがなく適正に筐体部101を成形することが可能となる。また金属加飾部10自体の耐久性も向上させることができる。 Further, in the present embodiment, since a film of a metal material is formed by vacuum deposition, it is possible to use a material such as Al or Ti that is difficult to form on a resin by wet plating such as electroless plating. Therefore, the selection range of usable metal materials is very wide, and metal materials having high reflectance can be used. Further, since the fine cracks 22 are formed by biaxial stretching, it is possible to form the metal layer 20 with high adhesion in vacuum vapor deposition. As a result, during in-mold molding or insert molding, it is possible to properly mold the casing 101 without the metal layer 20 flowing down. Further, the durability of the metal decoration portion 10 itself can be improved.
 また本実施形態では、簡易な蒸着源の構成による簡易な蒸着プロセスを用いることが可能となるので、装置コスト等を抑制することができる。なお酸素や窒素が添加された金属層の形成方法は、フィルム搬送機構201に向けてガスを吹き付ける場合に限定されない。例えば坩堝内の金属材料に酸素等を含ませてもよい。 In addition, in the present embodiment, since it is possible to use a simple vapor deposition process with a simple vapor deposition source configuration, it is possible to suppress equipment costs and the like. Note that the method for forming the metal layer to which oxygen or nitrogen is added is not limited to the case of blowing a gas toward the film transport mechanism 201. For example, the metal material in the crucible may contain oxygen or the like.
 本技術は内蔵アンテナ等が内部に収容されたほぼ全ての電子機器に適用可能である。例えばそのような電子機器として、携帯電話、スマートフォン、パソコン、ゲーム機、デジタルカメラ、オーディオ機器、TV、プロジェクタ、カーナビ、GPS端末、ウエアラブル情報機器(眼鏡型、リストバンド型)等の電子機器、これらを無線通信等により操作するリモコン、マウス、タッチペンン等の操作機器、車載レーダーや車載アンテナ等の車両に備えられる電子機器等種々のものが挙げられる。またインターネット等に接続されたIoT機器にも適用可能である。 -This technology can be applied to almost all electronic devices that have a built-in antenna and the like housed inside. For example, such electronic devices include mobile phones, smartphones, personal computers, game machines, digital cameras, audio devices, TVs, projectors, car navigation systems, GPS terminals, wearable information devices (glasses type, wristband type), and other electronic devices. There are various types such as a remote controller for operating the vehicle by wireless communication or the like, an operating device such as a mouse or a touch pen, an electronic device provided in the vehicle such as an in-vehicle radar or an in-vehicle antenna. It is also applicable to IoT devices connected to the Internet or the like.
 また本技術は、電子機器等の筐体部品に限定されず、車両や建築物に対しても適用可能である。すなわち本技術に係る加飾部と、加飾部が接着される被加飾領域を有する部材とを具備する構造体が、車両や建築物の全部又は一部に用いられてもよい。これにより金属的な外観を有しつつも電波を透過可能な壁面等を有する車両や建築物を実現することが可能となり、非常に高い意匠性を発揮させることが可能となる。なお車両は、自動車、バス、電車等、任意の車両を含む。建築物は、一戸建、集合住宅、施設、橋等、任意の建築物を含む。 Also, the present technology is not limited to housing parts such as electronic devices, but can be applied to vehicles and buildings. That is, the structure including the decorative portion according to the present technology and the member having the decorated region to which the decorative portion is bonded may be used for all or part of a vehicle or a building. As a result, it is possible to realize a vehicle or a building having a wall surface or the like that can transmit radio waves while having a metallic appearance, and it is possible to exhibit extremely high designability. The vehicle includes any vehicle such as a car, a bus, and a train. The building includes any building such as a detached house, an apartment house, a facility, and a bridge.
 <その他の実施形態>
 本技術は、以上説明した実施形態に限定されず、他の種々の実施形態を実現することができる。
<Other embodiments>
The present technology is not limited to the embodiments described above, and various other embodiments can be realized.
 図2等に例示する筐体部101に、遮光部や加飾機能部の機能を備えさせることも可能である。この場合でも、高い意匠性を実現することが可能となる。 It is also possible to provide the casing 101 illustrated in FIG. 2 and the like with the functions of a light-shielding portion and a decoration function portion. Even in this case, high designability can be realized.
 本技術の適用に関して、微細クラック22を形成する方法は限定されない。例えば、InやSnの島状構造を有する薄膜が用いられる場合や、た無電解メッキを用いて、アフターベーキングを行うことでニッケルや銅等の金属皮膜にクラックを発生させる場合においても、本技術に係る遮光部や加飾機能部を構成させることで意匠性を向上させることが可能である。 Regarding the application of the present technology, the method for forming the fine cracks 22 is not limited. For example, even when a thin film having an island structure of In or Sn is used, or when a crack is generated in a metal film such as nickel or copper by performing post-baking using electroless plating, the present technique The designability can be improved by configuring the light-shielding portion and the decoration function portion according to the above.
 図16は、他の実施形態に係る光沢フィルムの構成例を示す断面図である。この光沢フィルム523では、引張破断強度が金属層520よりも小さい支持層550が、金属層520を支持する層として設けられる。これにより微細クラック522を形成するために必要な延伸率を低下させることが可能となった。例えば金属層520自体(主に高硬度層等)を破断させるのに必要な延伸率よりも小さい延伸率にて、微細クラック522を形成することも可能である。これは図16A及びBに示すように、引張破断強度の小さい支持層550A及びBの表面の破断に追従して、金属層520が破断するからだと考えられる。 FIG. 16 is a sectional view showing a configuration example of a glossy film according to another embodiment. In the gloss film 523, the support layer 550 having a tensile breaking strength smaller than that of the metal layer 520 is provided as a layer that supports the metal layer 520. As a result, it became possible to reduce the stretching ratio required for forming the fine cracks 522. For example, it is possible to form the fine cracks 522 at a draw ratio smaller than the draw ratio required to break the metal layer 520 itself (mainly the high hardness layer etc.). It is considered that this is because, as shown in FIGS. 16A and 16B, the metal layer 520 ruptures following the rupture of the surface of the support layers 550A and 550 having low tensile rupture strength.
 図16Aに示すように、支持層550Aとして引張破断強度が小さいベースフィルムが用いられてもよい。例えば二軸延伸PETは引張破断強度が約200~約250MPaとなり、金属層520の引張破断強度よりも高くなる場合が多い。 As shown in FIG. 16A, a base film having a small tensile breaking strength may be used as the supporting layer 550A. For example, the tensile breaking strength of biaxially stretched PET is about 200 to about 250 MPa, which is often higher than the tensile breaking strength of the metal layer 520.
 一方で無延伸PET、PC、PMMA、及びPPの引張破断強度は以下のようになる。
 無延伸PET:約70MPa
 PC:約69~約72MPa
 PMMA:約80MPa
 PP:約30~約72MPa
 従ってこれらの材料からなるベースフィルムを支持層550Aとして用いることで、低い延伸率にて微細クラック522を適正に形成することが可能となる。なお支持層550Aとして、非塩化ビニル系の材料を選択することで、金属の腐食の防止に有利である。
On the other hand, the tensile breaking strengths of unstretched PET, PC, PMMA, and PP are as follows.
Unstretched PET: Approx. 70 MPa
PC: About 69 to about 72 MPa
PMMA: About 80 MPa
PP: about 30 to about 72 MPa
Therefore, by using the base film made of these materials as the support layer 550A, it becomes possible to properly form the fine cracks 522 with a low stretching rate. By selecting a non-vinyl chloride material as the support layer 550A, it is advantageous to prevent metal corrosion.
 図16Bに示すように、支持層550Bとして、ベースフィルム519上にコーティング層が形成されてもよい。例えばアクリル樹脂等をコーティングしてハードコート層を形成することで、当該ハードコート層を支持層550Bとして簡単に形成することができる。 As shown in FIG. 16B, as the support layer 550B, a coating layer may be formed on the base film 519. For example, by coating an acrylic resin or the like to form the hard coat layer, the hard coat layer can be easily formed as the support layer 550B.
 引張破断強度が大きいベースフィルム519と金属層520との間に引張破断強度が小さいコーティング層を形成することで、光沢フィルム523Bの耐久性を高く維持しつつも、低い延伸率による微細クラック522の形成を実現することができる。また製造工程上PETを使用しなければならない場合等にも有効である。なお図16A及びBに示す支持層550A及びBとして機能するベースフィルムやハードコート層の表面の破断は、微細クラック522の幅程度の非常に小さいものである。従ってエアの噛み込み等や意匠性の低下等を引き起こすものではない。 By forming a coating layer having a small tensile breaking strength between the base film 519 having a large tensile breaking strength and the metal layer 520, while maintaining the durability of the glossy film 523B at a high level, fine cracks 522 due to a low stretching ratio are formed. The formation can be realized. It is also effective when PET must be used in the manufacturing process. Note that the base film or the hard coat layer functioning as the supporting layers 550A and 550 shown in FIGS. 16A and 16B has a very small surface rupture such that the width of the microcracks 522 is very small. Therefore, it does not cause trapping of air or deterioration of design.
 図17は、支持層550Bとして形成されたコーティング層の厚みと、金属層520に形成される微細クラック522のピッチ(クラック間隔)との関係を示す図である。図17は、コーティング層としてアクリル層が形成された場合の関係が示されている。 FIG. 17 is a diagram showing the relationship between the thickness of the coating layer formed as the support layer 550B and the pitch (crack interval) of the fine cracks 522 formed in the metal layer 520. FIG. 17 shows the relationship when an acrylic layer is formed as a coating layer.
 図17に示すように、アクリル層の厚みが1μm以下の場合、微細クラック522のピッチは、50μm~100μmとなった。一方で、アクリル層の厚みを1μm~5μmの範囲に設定すると、微細クラック522のピッチは、100μm~200μmとなった。このように、アクリル層の厚みを大きくするほど、微細クラック522のピッチが大きくなることが分かった。従って、アクリル層の厚みを適宜制御することで、微細クラック522のピッチを調整することが可能となる。例えばアクリル層の厚みを0.1μm以上10μm以下とすることで、微細クラック522の厚みを所望の範囲で調整することが可能である。もちろんこの範囲に限定されるわけではなく、例えば0.1μm以上10μm以下の範囲の中で、最適な数値範囲が改めて設定されてもよい。 As shown in FIG. 17, when the thickness of the acrylic layer was 1 μm or less, the pitch of the fine cracks 522 was 50 μm to 100 μm. On the other hand, when the thickness of the acrylic layer was set in the range of 1 μm to 5 μm, the pitch of the fine cracks 522 was 100 μm to 200 μm. As described above, it was found that the pitch of the fine cracks 522 increased as the thickness of the acrylic layer increased. Therefore, by appropriately controlling the thickness of the acrylic layer, the pitch of the fine cracks 522 can be adjusted. For example, by setting the thickness of the acrylic layer to be 0.1 μm or more and 10 μm or less, the thickness of the fine cracks 522 can be adjusted within a desired range. Of course, the range is not limited to this range, and for example, an optimum numerical range may be newly set within a range of 0.1 μm or more and 10 μm or less.
 なお図16及び図17を参照して説明した構成において、遮光部や加飾機能部を実現するために、任意の構成が採用されてよい。 Note that, in the configuration described with reference to FIGS. 16 and 17, any configuration may be adopted in order to realize the light shielding unit and the decoration function unit.
 微細クラックを形成するための延伸は2軸延伸に限定されない。1軸延伸や3軸以上の延伸が実行されてもよい。また図5に示す第2のロール207に巻き取られたベースフィルム19に対して、さらにロールツーロール方式で2軸延伸が実行されてもよい。さらに真空蒸着が行われた後、第2のロール207に巻き取られる前に2軸延伸が実行されてもよい。 Extending for forming fine cracks is not limited to biaxial stretching. Uniaxial stretching or triaxial or more stretching may be performed. Further, the base film 19 wound on the second roll 207 shown in FIG. 5 may be biaxially stretched by a roll-to-roll method. After further vacuum deposition, biaxial stretching may be performed before being wound on the second roll 207.
 以上説明した本技術に係る特徴部分のうち、少なくとも2つの特徴部分を組み合わせることも可能である。すなわち各実施形態で説明した種々の特徴部分は、各実施形態の区別なく、任意に組み合わされてもよい。また上記で記載した種々の効果は、あくまで例示であって限定されるものではなく、また他の効果が発揮されてもよい。 It is also possible to combine at least two characteristic parts among the characteristic parts according to the present technology described above. That is, the various characteristic portions described in each embodiment may be arbitrarily combined without distinguishing each embodiment. Further, the various effects described above are merely examples and are not limited, and other effects may be exhibited.
 なお、本技術は以下のような構成も採ることができる。
(1)
  第1の面と、
  前記第1の面とは反対側の第2の面と、
  微細なクラックを有する金属層と、
  前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成される遮光部と
 を有する加飾部と、
 前記第1の面が表面側となるように前記加飾部が接着される被加飾領域を有する部材と
 を具備する構造体。
(2)請求項1に記載の構造体であって、
 前記遮光部は、前記微細なクラックの隙間に構成される隙間遮光部を含む
 構造体。
(3)(1)又は(2)に記載の構造体であって、
 前記遮光部は、前記金属層と前記第2の面との間に構成される遮光層を含む
 構造体。
(4)(1)から(3)のうちいずれか1つに記載の構造体であって、
 前記遮光部は、前記微細なクラックの隙間に構成される隙間遮光部と、前記金属層と前記第2の面との間に位置し、前記隙間遮光部と一体的に構成される遮光層とを含む
 構造体。
(5)(1)に記載の構造体であって、
 前記加飾部は、前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成され加飾機能を有する加飾機能部を含む
 構造体。
(6)(5)に記載の構造体であって、
 前記加飾機能部は、光の透過又は反射の少なくとも一方を利用した加飾機能を有する
 構造体。
(7)(5)又は(6)に記載の構造体であって、
 前記加飾機能部は、前記微細なクラックの隙間に構成される隙間加飾機能部を含む
 構造体。
(8)(5)から(7)のうちいずれか1つに記載の構造体であって、
 前記加飾機能部は、前記金属層と前記第2の面との間に構成される加飾機能層を含む
 構造体。
(9)(5)から(8)のうちいずれか1つに記載の構造体であって、
 前記加飾機能部は、前記微細なクラックの隙間に構成される隙間加飾機能部と、前記金属層と前記第2の面との間に位置し、前記隙間加飾機能部と一体的に構成される加飾機能層とを含む
 構造体。
(10)(1)から(9)のうちいずれか1つに記載の構造体であって、
 前記金属層は、アルミニウム、チタン、クロム、及びこれらのうち少なくとも1つを含む合金のうちのいずれかである
 構造体。
(11)(1)から(10)のうちいずれか1つに記載の構造体であって、
 前記金属層は、30nm以上300nm以下の厚みを有する
 構造体。
(12)(1)から(11)のうちいずれか1つに記載の構造体であって、
 前記微細なクラックは、ピッチが1μm以上500μm以下の範囲に含まれる
 構造体。
(13)(1)から(12)のうちいずれか1つに記載の構造体であって、
 筐体部品、車両、又は建築物の少なくとも一部として構成される
 構造体。
(14)(1)から(13)のうちいずれか1つに記載の構造体であって、
 前記加飾部は、前記微細のクラックを固定化する固定層を有する
 構造体。
(15)
 ベースフィルムと、
 前記ベースフィルムに形成され、
  第1の面と、
  前記第1の面とは反対側の第2の面と、
  微細なクラックを有する金属層と、
  前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成される遮光部と
 を有する加飾部と
 を具備する加飾フィルム。
(16)
 ベースフィルムに蒸着により金属層を形成し、
 前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
  前記微細クラックが形成された金属層と、
  前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部と
 を含む加飾フィルムを形成し、
 前記加飾フィルムにキャリアフィルムを接着することで転写用フィルムを形成し、
 インモールド成形法、ホットスタンプ法、又は真空成形法により前記転写用フィルムから前記加飾フィルムが転写されるように成型部品を形成する
 構造体の製造方法。
(17)
 ベースフィルムに蒸着により金属層を形成し、
 前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
  前記微細クラックが形成された金属層と、
  前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部と
 を含む転写用フィルムを形成し、
 インモールド成形法、ホットスタンプ法、又は真空成形法により前記ベースフィルムから剥離した前記金属層及び前記遮光部が転写されるように成型部品を形成する
 構造体の製造方法。
(18)
 ベースフィルムに蒸着により金属層を形成し、
 前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
  前記微細クラックが形成された金属層と、
  前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部と
 を含む加飾フィルムを形成し、
 インサート成形法により前記加飾フィルムと一体的に成形部品を形成する
 構造体の製造方法。
(19)(16)から(18)のうちいずれか1つに記載の製造方法であって、
 前記微細なクラックの形成ステップは、前記ベースフィルムを各々の軸方向の延伸率5%以下で2軸延伸する
 構造体の製造方法。
(20)
 ベースフィルムに蒸着により金属層を形成し、
 前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
 前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に、遮光部を形成する
 加飾フィルムの製造方法。
(21)(1)から(13)のうちいずれか1つに記載の構造体であって、
 前記微細なクラックは、不規則に形成されている
 構造体。
(22)(1)から(13)及び(21)のうちいずれか1つに記載の構造体であって、
 前記加飾部は、引張破断強度が前記金属層よりも小さく前記金属層を支持する支持層を有する
 構造体。
(23)(22)に記載の構造体であって、
 前記支持層部は、ベースフィルムである
 構造体。
(24)(26)に記載の構造体であって、
 前記支持層は、ベースフィルムに形成されたコーティング層である
 構造体。
(25)(16)から(19)のうちいずれか1つに記載の製造方法であって、
 前記金属層の形成ステップは、巻出ロールから巻取ロールに向けて回転ドラムの周面に沿って搬送される前記ベースフィルムに対して真空蒸着を行う
 構造体の製造方法。
Note that the present technology can also take the following configurations.
(1)
The first side,
A second surface opposite the first surface;
A metal layer having fine cracks,
A decoration portion having a gap between the fine cracks or a light shielding portion formed on at least one of the metal layer and the second surface;
A member having a decorated region to which the decorative portion is bonded such that the first surface is on the front surface side.
(2) The structure according to claim 1, wherein
The light shielding part is a structure including a gap light shielding part formed in a gap of the fine crack.
(3) The structure according to (1) or (2),
The light shielding part includes a light shielding layer formed between the metal layer and the second surface.
(4) The structure according to any one of (1) to (3),
The light-shielding portion is a gap light-shielding portion formed in a gap of the minute crack, and a light-shielding layer located between the metal layer and the second surface and integrally formed with the gap light-shielding portion. A structure that contains.
(5) The structure according to (1),
The said decoration part is a structure containing the decoration function part which has a decoration function comprised in the clearance gap of the said minute crack, or at least one between the said metal layer and the said 2nd surface.
(6) The structure according to (5),
The decorating function section is a structure having a decorating function utilizing at least one of transmission and reflection of light.
(7) The structure according to (5) or (6),
The decorating functional unit is a structure including a gap decorating functional unit configured in a gap of the fine crack.
(8) The structure according to any one of (5) to (7),
The said decoration functional part is a structure containing the decoration functional layer comprised between the said metal layer and the said 2nd surface.
(9) The structure according to any one of (5) to (8),
The decorating functional section is located between the gap decorating functional section configured in the gap of the fine crack and the metal layer and the second surface, and is integrally formed with the gap decorating functional section. A structure including a decorative functional layer configured.
(10) The structure according to any one of (1) to (9),
The structure in which the metal layer is one of aluminum, titanium, chromium, and an alloy containing at least one of them.
(11) The structure according to any one of (1) to (10),
The metal layer is a structure having a thickness of 30 nm or more and 300 nm or less.
(12) The structure according to any one of (1) to (11),
The fine cracks are structures included in a pitch range of 1 μm to 500 μm.
(13) The structure according to any one of (1) to (12),
A structure that is configured as at least part of a housing part, vehicle, or building.
(14) The structure according to any one of (1) to (13),
The said decoration part is a structure body which has a fixed layer which fixes the said fine crack.
(15)
A base film,
Formed on the base film,
The first side,
A second surface opposite the first surface;
A metal layer having fine cracks,
A decorative portion having a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and the second surface.
(16)
Form a metal layer on the base film by vapor deposition,
Forming fine cracks in the metal layer by stretching the base film,
A metal layer on which the fine cracks are formed,
Forming a decorative film including a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and a surface opposite to the design surface,
A transfer film is formed by adhering a carrier film to the decorative film,
A method for producing a structure, wherein a molded part is formed so that the decorative film is transferred from the transfer film by an in-mold forming method, a hot stamping method, or a vacuum forming method.
(17)
Form a metal layer on the base film by vapor deposition,
Forming fine cracks in the metal layer by stretching the base film,
A metal layer on which the fine cracks are formed,
Forming a transfer film including a gap between the fine cracks, or a light-shielding portion formed on at least one of the metal layer and a surface opposite to the design surface,
A method for manufacturing a structure, wherein a molded part is formed by an in-mold molding method, a hot stamping method, or a vacuum molding method so that the metal layer and the light-shielding portion separated from the base film are transferred.
(18)
Form a metal layer on the base film by vapor deposition,
Forming fine cracks in the metal layer by stretching the base film,
A metal layer on which the fine cracks are formed,
Forming a decorative film including a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and a surface opposite to the design surface,
A method of manufacturing a structure, wherein a molded part is integrally formed with the decorative film by an insert molding method.
(19) The manufacturing method according to any one of (16) to (18),
The step of forming the fine cracks is a method of manufacturing a structure in which the base film is biaxially stretched at a stretching ratio of 5% or less in each axial direction.
(20)
Form a metal layer on the base film by vapor deposition,
Forming fine cracks in the metal layer by stretching the base film,
A method for producing a decorative film, wherein a light-shielding portion is formed in at least one of the gap between the fine cracks or the surface of the metal layer opposite to the design surface.
(21) The structure according to any one of (1) to (13),
The structure in which the fine cracks are irregularly formed.
(22) The structure according to any one of (1) to (13) and (21),
The above-mentioned decoration part is a structure which has a supporting layer which has a tensile breaking strength smaller than the above-mentioned metal layer and supports the above-mentioned metal layer.
(23) The structure according to (22),
The structure in which the support layer portion is a base film.
(24) The structure according to (26),
The structure in which the support layer is a coating layer formed on the base film.
(25) The manufacturing method according to any one of (16) to (19),
The step of forming the metal layer is a method for manufacturing a structure, in which vacuum deposition is performed on the base film conveyed along a peripheral surface of a rotary drum from a winding roll to a winding roll.
 10…金属加飾部
 11、411…被加飾領域
 12…加飾フィルム
 12a、412a…意匠面
 12b…接着面
 19、419、519…ベースフィルム
 20、420、520…金属層
 21、421…密封樹脂
 22、422、522…微細クラック
 30…遮光部
 31…隙間遮光部
 32…遮光層
 40…加飾機能部
 41…隙間加飾機能部
 42…加飾機能層
 50、450…転写用フィルム
 100…携帯端末
 101…筐体部
 200…真空蒸着装置
 250…軸延伸装置
 300、350…成形装置
DESCRIPTION OF SYMBOLS 10... Metal decoration part 11, 411... Decorated area 12... Decorative film 12a, 412a... Design surface 12b... Adhesive surface 19, 419, 519... Base film 20, 420, 520... Metal layer 21, 421... Sealing Resin 22, 422, 522... Fine crack 30... Light-shielding part 31... Gap light-shielding part 32... Light-shielding layer 40... Decorative function part 41... Gap-decorating function part 42... Decorative function layer 50, 450... Transfer film 100... Mobile terminal 101... Casing part 200... Vacuum deposition device 250... Axial stretching device 300, 350... Molding device

Claims (20)

  1.   第1の面と、
      前記第1の面とは反対側の第2の面と、
      微細なクラックを有する金属層と、
      前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成される遮光部と
     を有する加飾部と、
     前記第1の面が表面側となるように前記加飾部が接着される被加飾領域を有する部材と
     を具備する構造体。
    The first side,
    A second surface opposite the first surface;
    A metal layer having fine cracks,
    A decoration part having a gap between the fine cracks or a light shielding part formed on at least one of the metal layer and the second surface;
    A member having a decorated region to which the decorative portion is bonded such that the first surface is on the front surface side.
  2.  請求項1に記載の構造体であって、
     前記遮光部は、前記微細なクラックの隙間に構成される隙間遮光部を含む
     構造体。
    The structure according to claim 1, wherein
    The light shielding part is a structure including a gap light shielding part formed in a gap of the fine crack.
  3.  請求項1に記載の構造体であって、
     前記遮光部は、前記金属層と前記第2の面との間に構成される遮光層を含む
     構造体。
    The structure according to claim 1, wherein
    The light shielding part includes a light shielding layer formed between the metal layer and the second surface.
  4.  請求項1に記載の構造体であって、
     前記遮光部は、前記微細なクラックの隙間に構成される隙間遮光部と、前記金属層と前記第2の面との間に位置し、前記隙間遮光部と一体的に構成される遮光層とを含む
     構造体。
    The structure according to claim 1, wherein
    The light-shielding portion is a gap light-shielding portion formed in a gap of the minute crack, and a light-shielding layer located between the metal layer and the second surface and integrally formed with the gap light-shielding portion. A structure that contains.
  5.  請求項1に記載の構造体であって、
     前記加飾部は、前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成され加飾機能を有する加飾機能部を含む
     構造体。
    The structure according to claim 1, wherein
    The said decoration part is a structure containing the decoration function part which has a decoration function comprised in the clearance gap of the said minute crack, or at least one between the said metal layer and the said 2nd surface.
  6.  請求項5に記載の構造体であって、
     前記加飾機能部は、光の透過又は反射の少なくとも一方を利用した加飾機能を有する
     構造体。
    The structure according to claim 5, wherein
    The decorating function section is a structure having a decorating function utilizing at least one of transmission and reflection of light.
  7.  請求項5に記載の構造体であって、
     前記加飾機能部は、前記微細なクラックの隙間に構成される隙間加飾機能部を含む
     構造体。
    The structure according to claim 5, wherein
    The decorating functional unit is a structure including a gap decorating functional unit configured in a gap of the fine crack.
  8.  請求項5に記載の構造体であって、
     前記加飾機能部は、前記金属層と前記第2の面との間に構成される加飾機能層を含む
     構造体。
    The structure according to claim 5, wherein
    The said decoration functional part is a structure containing the decoration functional layer comprised between the said metal layer and the said 2nd surface.
  9.  請求項5に記載の構造体であって、
     前記加飾機能部は、前記微細なクラックの隙間に構成される隙間加飾機能部と、前記金属層と前記第2の面との間に位置し、前記隙間加飾機能部と一体的に構成される加飾機能層とを含む
     構造体。
    The structure according to claim 5, wherein
    The decorating functional section is located between the gap decorating functional section configured in the gap of the fine crack and the metal layer and the second surface, and is integrally formed with the gap decorating functional section. A structure including a decorative functional layer configured.
  10.  請求項1に記載の構造体であって、
     前記金属層は、アルミニウム、チタン、クロム、及びこれらのうち少なくとも1つを含む合金のうちのいずれかである
     構造体。
    The structure according to claim 1, wherein
    The structure in which the metal layer is one of aluminum, titanium, chromium, and an alloy containing at least one of them.
  11.  請求項1に記載の構造体であって、
     前記金属層は、30nm以上300nm以下の厚みを有する
     構造体。
    The structure according to claim 1, wherein
    The metal layer is a structure having a thickness of 30 nm or more and 300 nm or less.
  12.  請求項1に記載の構造体であって、
     前記微細なクラックは、ピッチが1μm以上500μm以下の範囲に含まれる
     構造体。
    The structure according to claim 1, wherein
    The fine cracks are structures included in a pitch range of 1 μm to 500 μm.
  13.  請求項1に記載の構造体であって、
     筐体部品、車両、又は建築物の少なくとも一部として構成される
     構造体。
    The structure according to claim 1, wherein
    A structure that is configured as at least part of a housing part, vehicle, or building.
  14.  請求項1に記載の構造体であって、
     前記加飾部は、前記微細のクラックを固定化する固定層を有する
     構造体。
    The structure according to claim 1, wherein
    The said decoration part is a structure body which has a fixed layer which fixes the said fine crack.
  15.  ベースフィルムと、
     前記ベースフィルムに形成され、
      第1の面と、
      前記第1の面とは反対側の第2の面と、
      微細なクラックを有する金属層と、
      前記微細なクラックの隙間、又は前記金属層と前記第2の面との間の少なくとも一方に構成される遮光部と
     を有する加飾部と
     を具備する加飾フィルム。
    A base film,
    Formed on the base film,
    The first side,
    A second surface opposite the first surface;
    A metal layer having fine cracks,
    A decorative portion having a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and the second surface.
  16.  ベースフィルムに蒸着により金属層を形成し、
     前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
      前記微細クラックが形成された金属層と、
      前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部と
     を含む加飾フィルムを形成し、
     前記加飾フィルムにキャリアフィルムを接着することで転写用フィルムを形成し、
     インモールド成形法、ホットスタンプ法、又は真空成形法により前記転写用フィルムから前記加飾フィルムが転写されるように成型部品を形成する
     構造体の製造方法。
    Form a metal layer on the base film by vapor deposition,
    Forming fine cracks in the metal layer by stretching the base film,
    A metal layer on which the fine cracks are formed,
    Forming a decorative film including a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and a surface opposite to the design surface,
    A transfer film is formed by adhering a carrier film to the decorative film,
    A method for manufacturing a structure, wherein a molded part is formed so that the decorative film is transferred from the transfer film by an in-mold forming method, a hot stamping method, or a vacuum forming method.
  17.  ベースフィルムに蒸着により金属層を形成し、
     前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
      前記微細クラックが形成された金属層と、
      前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部と
     を含む転写用フィルムを形成し、
     インモールド成形法、ホットスタンプ法、又は真空成形法により前記ベースフィルムから剥離した前記金属層及び前記遮光部が転写されるように成型部品を形成する
     構造体の製造方法。
    Form a metal layer on the base film by vapor deposition,
    Forming fine cracks in the metal layer by stretching the base film,
    A metal layer on which the fine cracks are formed,
    Forming a transfer film including a gap between the fine cracks, or a light-shielding portion formed on at least one of the metal layer and a surface opposite to the design surface,
    A method for manufacturing a structure, wherein a molded part is formed by an in-mold molding method, a hot stamping method, or a vacuum molding method so that the metal layer and the light-shielding portion separated from the base film are transferred.
  18.  ベースフィルムに蒸着により金属層を形成し、
     前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
      前記微細クラックが形成された金属層と、
      前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に構成される遮光部と
     を含む加飾フィルムを形成し、
     インサート成形法により前記加飾フィルムと一体的に成形部品を形成する
     構造体の製造方法。
    Form a metal layer on the base film by vapor deposition,
    Forming fine cracks in the metal layer by stretching the base film,
    A metal layer on which the fine cracks are formed,
    Forming a decorative film including a gap between the fine cracks or a light-shielding portion formed on at least one of the metal layer and a surface opposite to the design surface,
    A method of manufacturing a structure, wherein a molded part is integrally formed with the decorative film by an insert molding method.
  19.  請求項16に記載の製造方法であって、
     前記微細なクラックの形成ステップは、前記ベースフィルムを各々の軸方向の延伸率5%以下で2軸延伸する
     構造体の製造方法。
    The manufacturing method according to claim 16, wherein
    The step of forming fine cracks is a method of manufacturing a structure in which the base film is biaxially stretched at a stretching ratio of 5% or less in each axial direction.
  20.  ベースフィルムに蒸着により金属層を形成し、
     前記ベースフィルムを延伸することで前記金属層に微細なクラックを形成し、
     前記微細なクラックの隙間、又は前記金属層と意匠面とは反対側の面との間の少なくとも一方に、遮光部を形成する
     加飾フィルムの製造方法。
    Form a metal layer on the base film by vapor deposition,
    Forming fine cracks in the metal layer by stretching the base film,
    A method for producing a decorative film, wherein a light-shielding portion is formed in at least one of the gap between the fine cracks or the surface of the metal layer opposite to the design surface.
PCT/JP2020/000461 2019-01-25 2020-01-09 Structure, decorative film, method for manufacturing structure, and method for manufacturing decorative film WO2020153137A1 (en)

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WO2021132456A1 (en) * 2019-12-26 2021-07-01 大日本印刷株式会社 Metallic decorative sheet and metallic decorative molded body provided with same
WO2021132461A1 (en) * 2019-12-27 2021-07-01 大日本印刷株式会社 Metal tone decorative sheet and metal tone decorative molded body provided with metal tone decorative sheet

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WO2021132456A1 (en) * 2019-12-26 2021-07-01 大日本印刷株式会社 Metallic decorative sheet and metallic decorative molded body provided with same
WO2021132461A1 (en) * 2019-12-27 2021-07-01 大日本印刷株式会社 Metal tone decorative sheet and metal tone decorative molded body provided with metal tone decorative sheet
TWI729965B (en) * 2020-12-04 2021-06-01 財團法人金屬工業研究發展中心 Composite laminate plate, housing and mobile communication device

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