WO2020143484A1 - Light-sensitive device, x-ray detector and display apparatus - Google Patents

Light-sensitive device, x-ray detector and display apparatus Download PDF

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Publication number
WO2020143484A1
WO2020143484A1 PCT/CN2019/129308 CN2019129308W WO2020143484A1 WO 2020143484 A1 WO2020143484 A1 WO 2020143484A1 CN 2019129308 W CN2019129308 W CN 2019129308W WO 2020143484 A1 WO2020143484 A1 WO 2020143484A1
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Prior art keywords
electrode
photosensitive
photosensitive device
light
ray detector
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PCT/CN2019/129308
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French (fr)
Chinese (zh)
Inventor
卓恩宗
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惠科股份有限公司
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Priority to US17/253,065 priority Critical patent/US11476379B2/en
Publication of WO2020143484A1 publication Critical patent/WO2020143484A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/085Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors the device being sensitive to very short wavelength, e.g. X-ray, Gamma-rays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14643Photodiode arrays; MOS imagers
    • H01L27/14658X-ray, gamma-ray or corpuscular radiation imagers
    • H01L27/14659Direct radiation imagers structures
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61BDIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B6/00Apparatus for radiation diagnosis, e.g. combined with radiation therapy equipment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/0272Selenium or tellurium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0352Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14609Pixel-elements with integrated switching, control, storage or amplification elements
    • H01L27/14612Pixel-elements with integrated switching, control, storage or amplification elements involving a transistor

Definitions

  • the present application relates to the field of detectors, in particular to a photosensitive device, an X-ray detector and a display device.
  • X-ray detectors are widely used in medical instruments. For example, X-rays are used for chest radiography.
  • the photoelectric conversion function of X-ray detectors is mainly completed by amorphous silicon photosensitive devices.
  • X-rays are converted by scintillators (currently CsI) Into visible light, and then converts the visible light into an electrical signal through an amorphous silicon photosensitive device, and is converted into a thin film transistor (TFT). Since the structure of amorphous silicon is not stable enough and the light conversion efficiency is low, the light wave range absorbed by the amorphous silicon photosensitive device is wide, and the light conversion is not sensitive enough, which reduces the light absorption efficiency and light conversion efficiency of the X-ray detector.
  • CsI scintillators
  • the main purpose of the present application is to provide a photosensitive device, an X-ray detector and a display device, which improve the light absorption efficiency and light conversion efficiency of the X-ray detector.
  • the photosensitive device proposed in this application includes:
  • a photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
  • a first electrode provided on the light incident side of the photosensitive layer
  • a second electrode provided on the light exit side of the photosensitive layer.
  • the pore diameter of the nanopore structure is 2 nm to 10 nm.
  • the gas selenium can be filled into the nanopore structure in a pulsed manner.
  • the filler is formed by SixOy.
  • the filler is a strip-shaped filler.
  • the first electrode is electrically connected to the photosensitive layer
  • the second electrode is electrically connected to the signal reading element
  • the first electrode is a transparent electrode
  • the second electrode is a metal electrode
  • the second electrode has an in-line structure.
  • the second electrode has a T-shaped structure.
  • the photosensitive device is a direct photosensitive detector.
  • the X-ray detector includes a substrate and a photosensitive device, and the photosensitive device is provided on the light incident side of the X-ray detector to sense the X-ray light intensity and convert it into an electrical signal;
  • the X-ray detector also includes:
  • a signal reading element provided on the substrate and electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device.
  • the photosensitive device includes:
  • a photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
  • a first electrode provided on the light incident side of the photosensitive layer
  • a second electrode provided on the light exit side of the photosensitive layer.
  • the pore diameter of the nanopore structure is 2 nm to 10 nm.
  • the filler is formed by SixOy.
  • the first electrode is a transparent electrode
  • the second electrode is a metal electrode
  • the X-ray detector further includes a protective layer that fills the gap between the signal reading element and the photosensitive device to isolate the signal reading element from the external environment.
  • the thickness of the protective layer is 500 nm to 2000 nm.
  • the second electrode penetrates the protective layer and is electrically connected to the drain of the signal reading element.
  • the second electrode is electrically connected to the drain of the signal reading element through a wire.
  • the display device includes, for example, an X-ray detector, and the X-ray detector includes a substrate and a photosensitive device, and the photosensitive device is provided on a light incident side of the X-ray detector to sense the light of X-rays Strength, and converted into electrical signals;
  • the X-ray detector also includes:
  • a signal reading element provided on the substrate and electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device;
  • the photosensitive device includes:
  • a photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
  • a first electrode provided on the light incident side of the photosensitive layer
  • a second electrode provided on the light exit side of the photosensitive layer.
  • the display device further includes an imaging device electrically connected to the signal reading element.
  • the present application provides a photosensitive device, an X-ray detector, and a display device.
  • the photosensitive device includes: a photosensitive layer, a first electrode, and a second electrode; the photosensitive layer is formed by stacking a plurality of fillers, and the fillers are evenly distributed Nanopore structure, and the nanopore structure is filled with gaseous selenium; the first electrode is provided on the light incident side of the photosensitive layer; the second electrode is provided on the light emitting side of the photosensitive layer.
  • the photosensitive device of the embodiment of the present application is formed by stacking a plurality of fillers in the photosensitive layer.
  • the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium to increase the contact area of light and increase the photosensitive layer The light sensitivity of the photosensitive layer, thereby improving the light absorption efficiency of the photosensitive layer and the light conversion efficiency of the photosensitive layer.
  • FIG. 1 is a schematic structural diagram of a photosensitive device according to an embodiment of the application.
  • FIG. 2 is a schematic structural diagram of a photosensitive device according to another embodiment of this application.
  • FIG. 3 is a schematic structural diagram of an X-ray detector according to an embodiment of the present application.
  • FIG. 4 is a schematic structural diagram of an X-ray detector according to another embodiment of the present application.
  • first, second, etc. in this application are for descriptive purposes only, and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of indicated technical features.
  • the features defined as “first” and “second” may include at least one of the features either explicitly or implicitly.
  • the technical solutions between the various embodiments can be combined with each other, but they must be based on the ability of those skilled in the art to achieve. When the combination of technical solutions conflicts with each other or cannot be realized, it should be considered that the combination of such technical solutions does not exist , Nor within the scope of protection required by this application.
  • this application proposes a photosensitive device.
  • the photosensitive device includes a photosensitive layer 1, a first electrode 2 and a second electrode 3; wherein, the photosensitive layer 1 is configured to sense the intensity of light and convert the light signal of the light into an electrical signal
  • the photosensitive layer 1 is in direct contact with light, that is, the light is directly irradiated on the photosensitive layer 1, that is, the photosensitive device of the present application is a direct photosensitive detector.
  • the light received by the photosensitive layer 1 is X-ray, and through its photoelectric conversion function, the X-ray optical signal is converted into an electrical signal, which is transmitted to the signal reading element through the second electrode 3 for The signal reading element reads; that is, the photosensitive device of the present application is a direct X-ray detector.
  • the first electrode 2 and the second electrode 3 are disposed on opposite sides of the photosensitive layer 1, that is, the first electrode 2 is disposed on the light incident side of the photosensitive layer 1, and the second electrode 3 is disposed on the photosensitive layer 1 Light exit side; the definition of the light entrance side and the light exit side in this embodiment is set for the X-rays emitted by an external X-ray generator.
  • the position of the X-ray generator changes, that is, the light entrance side and the light exit side of the photosensitive layer 1 The location of the has also changed, and will not be repeated here.
  • the second electrode 3 is electrically connected to the above-mentioned signal reading element to convert the optical signal received by the photosensitive layer 1 into an electrical signal and then directly transmitted to the signal reading element through the second electrode 3 without the need for external X After the radiation is converted into visible light, it is transmitted to the signal reading element, thereby improving the efficiency of light absorption.
  • the photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium (Se).
  • the filler is a strip-shaped filler and has a uniformly distributed nanopore structure inside.
  • the nanopore structure is similar to a honeycomb hole.
  • gaseous selenium is filled into the nanopore structure to
  • the contact area of the photosensitive layer 1 is increased, that is, when light is irradiated on the photosensitive layer 1, the light directly acts on the filler and acts on the gaseous selenium of the nanopore structure, thereby increasing the contact area of the light to increase the sensitivity
  • the light sensitivity of the layer 1 improves the light absorption efficiency of the photosensitive layer 1, that is, indirectly improves the light conversion efficiency of the photosensitive layer 1.
  • a plurality of fillers are stacked in the photosensitive layer 1, and the photosensitive layer 1 can be in a saturated state, so that the light absorption efficiency is higher.
  • the number of fillers can be set according to the preparation of the photosensitive layer 1, which is not limited herein.
  • the gas selenium can be filled into the nanopore structure in a pulsed manner.
  • it may also be filled in other ways, and there is no limitation here.
  • the first electrode 2 is electrically connected to the photosensitive layer 1, and the second electrode 3 is electrically connected to the signal reading element.
  • the photosensitive layer 1 senses the light, detects the intensity of the light, and converts the light signal of the light It is an electrical signal.
  • the electrical signal is a current signal, that is, when the light intensity is strong, the current signal is large; when the light intensity is weak, the current signal is small.
  • the photosensitive layer 1 transmits the converted electrical signal to the signal reading element through the second electrode 3.
  • the photosensitive layer 1 can be directly in contact with light, which can reduce the loss of light, thereby improving the utilization of light.
  • the photosensitive layer 1 is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium; the first electrode 2 is provided On the light incident side of the photosensitive layer 1; the second electrode 3 is provided on the light emitting side of the photosensitive layer 1.
  • the photosensitive device of the embodiment of the present application is formed by stacking a plurality of fillers in the photosensitive layer 1, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium to increase the contact area of light and increase the sensitivity
  • the light sensitivity of the layer 1 improves the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
  • the pore diameter of the nanopore structure is 2 nm-10 nm.
  • the pore diameter of the nanopore structure is 6 nm, so that gaseous selenium can be accommodated in the nanopore structure more, so that the space of the nanopore structure reaches a saturation state, thereby improving the utilization rate of the nanopore structure and providing light Absorption efficiency.
  • the pore diameter of the nanopore structure is any value from 2 nm to 10 nm (not including 6 nm), which is not limited herein.
  • the filler is formed of SixOy (silicon oxide), that is, the filler is a silicon oxide material.
  • the silicon oxide crystal is dissolved in an alcohol solution, and the alcohol solution contains a surfactant to induce silicon oxide.
  • the concentration of the surfactant is increased due to the volatilization of alcohol.
  • the concentration of the surfactant is close to 10%, the oxidation Silicon begins to form a pore structure.
  • the concentration reaches 35% the pore structure of silicon oxide is relatively uniform, and they are closely arranged in a honeycomb shape. This state continues until the concentration of the surfactant exceeds 70%.
  • the concentration of the surfactant can control the size of the nanopore, and the diameter of the nanopore is between 2 nm and 10 nm.
  • the type of surfactant can also control the size of the nanopore.
  • the surfactant is P123
  • the pore diameter of the nanopore is in the range of 5nm to 10nm.
  • the pore of the nanopore The diameter is in the range of 2nm ⁇ 4.5nm, when the surfactant is F127, the pore diameter of the nanopore is in the range of 2.5nm ⁇ 4.5nm; at this time, the filling is controlled by controlling the pore diameter of the nanopore to control the filler to absorb a specific wavelength
  • the light enables the filler to absorb light with a wavelength within a certain range steadily. Therefore, gaseous selenium in nanopores has a more sensitive response to light and higher photoelectric conversion efficiency than amorphous silicon. It can be understood that the types of surfactants are not limited to the above three.
  • the first electrode 2 is set as a transparent electrode, that is, light can directly pass through the first electrode 2, it should be understood that light can be directly transmitted through
  • the first electrode 2 irradiates the photosensitive layer 1, that is, the transparent electrode also has high light transmittance to transmit light, thereby reducing the loss of light and improving the utilization rate of light.
  • the second electrode 3 is electrically connected to the above-mentioned signal reading element 5, that is, the second electrode 3 is set as a metal electrode, while the electrical signal can be conducted, the opacity of the metal can be used to Covering the signal reading element 5 prevents light from entering the signal reading element, thereby causing inaccuracy in reading the signal.
  • the material of the metal electrode may include metal materials including copper, nickel and the like, which is not limited herein.
  • the second electrode 3 may be a straight structure (see FIG. 1) or a T-shaped structure (see FIG. 2).
  • the second electrode 3 may also be For other structures, there are no restrictions in this application.
  • the photosensitive layer 1 is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium; the first electrode 2 is provided On the light incident side of the photosensitive layer 1; the second electrode 3 is provided on the light emitting side of the photosensitive layer 1.
  • the photosensitive device of the embodiment of the present application is formed by stacking a plurality of fillers in the photosensitive layer 1, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium to increase the contact area of light and increase the sensitivity
  • the light sensitivity of the layer 1 improves the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
  • the X-ray detector includes a substrate 4 and the photosensitive device in the foregoing embodiment.
  • the photosensitive device is provided on the X-ray
  • the light entrance side of the detector can sense the X-ray light intensity and convert it into an electrical signal.
  • the definition of the light incident side in this embodiment is set for the X-rays emitted by the external X-ray generator.
  • the photosensitive device includes a photosensitive layer 1, a first electrode 2, and a second electrode 3.
  • the photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanometers
  • the pore structure is filled with gaseous selenium (Se).
  • the first electrode 2 is located on the light-incident side of the photosensitive layer 1 and the second electrode 3 is located on the light-exiting side of the photosensitive layer 1 to increase the light contact area.
  • the light sensitivity of the photosensitive layer 1 is increased, thereby improving the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
  • the pore diameter of the nanopore structure is 2 nm to 10 nm.
  • the pore diameter of the nanopore structure can be selected to be 6 nm, so that gaseous selenium can be accommodated in the nanopore structure more, so that the space of the nanopore structure reaches a saturation state, thereby improving the utilization rate of the nanopore structure, Provides light absorption efficiency.
  • the pore diameter of the nanopore structure is any value from 2 nm to 10 nm (not including 6 nm), which is not limited herein.
  • the filler is formed by SixOy, that is, the filler is a silicon oxide material.
  • the silicon oxide crystal is dissolved in an alcohol solution, and the alcohol solution contains a surfactant to induce silicon oxide.
  • the concentration of the surfactant is increased due to the volatilization of alcohol.
  • the concentration of the surfactant is close to 10%, the oxidation Silicon begins to form a pore structure.
  • the concentration reaches 35% the pore structure of silicon oxide is relatively uniform, and they are closely arranged in a honeycomb shape. This state continues until the concentration of the surfactant exceeds 70%.
  • the first electrode 2 is set as a transparent electrode, that is, light can directly pass through the first electrode 2, it should be understood that light can be directly transmitted through the first
  • the electrode 2 also irradiates the photosensitive layer 1, that is, the transparent electrode also has high light transmittance to transmit light, thereby reducing the loss of light and improving the utilization rate of light.
  • the second electrode 3 is electrically connected to the above-mentioned signal reading element 5, that is, the second electrode 3 is set as a metal electrode, while the electrical signal can be conducted, the signal can be utilized by the opacity of the metal
  • the reading element 5 is covered to prevent light from entering the signal reading element, thereby causing inaccuracy in reading the signal.
  • the material of the metal electrode may include metal materials including copper, nickel and the like, which is not limited herein.
  • the X-ray detector further includes a signal reading element 5 which is provided on the substrate 4 and is electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device.
  • the signal reading element 5 may be a TFT (thin film transistor) structure, and is configured to read the electrical signal of the photosensitive device, and the electrical signal is a current signal.
  • the substrate 4 may be a glass substrate 4, a silicon wafer, a polyimide PI plastic substrate 4, etc., which is not limited herein.
  • the X-ray detector is also provided with an X-ray generator (not shown), which is arranged to emit X-rays, and the X-ray detector is provided on the light incident side of the X-ray generator, that is, the photosensitive device Layer 1 is provided on the light incident side of the X-ray detector.
  • the photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium, which is configured to convert X-ray optical signals into electrical signals and transmit Into the signal reading element 5.
  • the drain of the signal reading element 5 is provided on the substrate 4 and is electrically connected to the second electrode 3 of the photosensitive device to conduct electrical signals.
  • the second electrode 3 is a T-shaped electrode, that is, the second electrode 3 penetrates the protective layer 6 and is electrically connected to the drain of the signal reading element 5 to make an electrical signal Is more efficient and faster; of course, in another embodiment, as shown in FIG. 4, the second electrode 3 is an in-line electrode. At this time, the second electrode 3 is connected to the leakage of the signal reading element 5 through a wire There is no restriction on the electrical connection in this application.
  • the X-ray detector further includes a protective layer 6, the protective layer 6 fills the gap between the signal reading element 5 and the photosensitive device, and is configured to isolate the signal reading element 5 from the external environment.
  • the thickness of the protective layer 6 is set to 500 nm to 2000 nm, which can make the structure of the entire X-ray detector more stable and ensure the flatness of the X-ray detector.
  • the technical solution of the present application uses the above-mentioned photosensitive device, and a plurality of fillers are stacked in the photosensitive layer 1 of the photosensitive device.
  • the filler is a uniformly distributed nanopore structure, and the nanopore structure is filled with gaseous selenium to increase light contact
  • the area increases the light sensitivity of the photosensitive layer 1, thereby improving the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
  • an embodiment of the present application further proposes a display device including the aforementioned X-ray detector and imaging device (not shown).
  • the X-ray detector and imaging device Connected, the electrical signal generated by the X-ray detector due to the photoelectric effect forms an image through the imaging device.
  • the photosensitive device includes a photosensitive layer 1, a first electrode 2, and a second electrode 3.
  • the photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanometers
  • the pore structure is filled with gaseous selenium (Se).
  • the first electrode 2 is disposed on the light-incident side of the photosensitive layer 1 and the second electrode 3 is disposed on the light-emitting side of the photosensitive layer 1.
  • the X-ray detector includes a substrate 4 and the photosensitive device in the above embodiment.
  • the photosensitive device is provided on the light incident side of the X-ray detector to sense the X-ray light Strength, and converted into electrical signals.
  • the X-ray detector further includes a signal reading element 5 which is provided on the substrate 4 and is electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device.
  • the signal reading element 5 may be a TFT (thin film transistor) structure, and is configured to read the electrical signal of the photosensitive device, and the electrical signal is a current signal.
  • the photosensitive device in the X-ray detector that has the photoelectric conversion function has sensitive and efficient photoelectric conversion performance, under the same imaging effect, the X-ray irradiation intensity or irradiation time can be reduced, and the exposure to the patient can be reduced. influences.
  • the technical solution of the present application adopts the above-mentioned X-ray detector, and a plurality of fillers are stacked in the photosensitive layer 1 of the photosensitive device in the X-ray detector.
  • the filler is a uniformly distributed nanopore structure, and the nanopore structure is filled with a gaseous state Selenium can increase the contact area of light and increase the light sensitivity of the photosensitive layer 1, thereby improving the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.

Abstract

Disclosed in the present application is a light-sensitive device, comprising: a light-sensitive layer (1), a first electrode (2) and a second electrode (3); the light-sensitive layer (1) is made by stacking a plurality of fillers, the fillers being evenly distributed nanopore structures, and the nanopore structures being filled with gaseous selenium; the first electrode (2) is disposed at the light entry side of the light-sensitive layer (1), and the second electrode (3) is disposed at the light exit side of the light-sensitive layer (1). Further disclosed in the present application are an X-ray detector and a display apparatus.

Description

感光器件、X射线探测器及显示装置Photosensitive device, X-ray detector and display device
本申请要求2019年1月11日申请的,申请号为201910030104.X,名称为“感光器件、X射线探测器及显示装置”的中国专利申请的优先权,在此将其全文引入作为参考。This application requires the priority of the Chinese patent application with the application number 201910030104.X and the name "Photosensitive Device, X-ray Detector and Display Device", which was applied on January 11, 2019, and the entire content of which is hereby incorporated by reference.
技术领域Technical field
本申请涉及探测器领域,特别涉及一种感光器件、X射线探测器及显示装置。The present application relates to the field of detectors, in particular to a photosensitive device, an X-ray detector and a display device.
背景技术Background technique
这里的陈述仅提供与本申请有关的背景信息,而不必然地构成示例性技术。The statements herein provide only background information related to the present application and do not necessarily constitute exemplary technology.
X射线探测器广泛使用在医疗仪器上,如,利用X射线进行胸透成像,X射线探测器的光电转换功能主要由非晶硅感光器件完成,X射线经闪烁体(目前主要为CsI)转换成可见光,再经非晶硅感光器件将可见光转换成电信号由薄膜晶体管(Thin film transistor,简称TFT)。由于非晶硅的结构不够稳定、光转换效率低,导致非晶硅感光器件吸收的光波范围较宽,对光的转换不够灵敏,降低了X射线探测器光吸收效率以及光转换效率。X-ray detectors are widely used in medical instruments. For example, X-rays are used for chest radiography. The photoelectric conversion function of X-ray detectors is mainly completed by amorphous silicon photosensitive devices. X-rays are converted by scintillators (currently CsI) Into visible light, and then converts the visible light into an electrical signal through an amorphous silicon photosensitive device, and is converted into a thin film transistor (TFT). Since the structure of amorphous silicon is not stable enough and the light conversion efficiency is low, the light wave range absorbed by the amorphous silicon photosensitive device is wide, and the light conversion is not sensitive enough, which reduces the light absorption efficiency and light conversion efficiency of the X-ray detector.
技术解决方案Technical solution
本申请的主要目的是提供一种感光器件、X射线探测器及显示装置,提高了X射线探测器光吸收效率以及光转换效率。The main purpose of the present application is to provide a photosensitive device, an X-ray detector and a display device, which improve the light absorption efficiency and light conversion efficiency of the X-ray detector.
为实现上述目的,本申请提出的感光器件,所述感光器件包括:To achieve the above objective, the photosensitive device proposed in this application includes:
感光层,所述感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;A photosensitive layer, the photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
第一电极,所述第一电极设于所述感光层的入光侧;A first electrode provided on the light incident side of the photosensitive layer;
第二电极,所述第二电极设于所述感光层的出光侧。A second electrode provided on the light exit side of the photosensitive layer.
可选地,所述纳米孔结构的孔直径为2nm~10nm。Optionally, the pore diameter of the nanopore structure is 2 nm to 10 nm.
可选地,所述气体硒可通过脉冲的方式填充至纳米孔结构。Optionally, the gas selenium can be filled into the nanopore structure in a pulsed manner.
可选地,所述填充物由SixOy形成。Optionally, the filler is formed by SixOy.
可选地,所述填充物为条状填充物。Optionally, the filler is a strip-shaped filler.
可选地,所述第一电极与所述感光层电连接,所述第二电极与信号读取元件电连接。Optionally, the first electrode is electrically connected to the photosensitive layer, and the second electrode is electrically connected to the signal reading element.
可选地,所述第一电极为透明电极,所述第二电极为金属电极。Optionally, the first electrode is a transparent electrode, and the second electrode is a metal electrode.
可选地,所述第二电极为一字形结构。Optionally, the second electrode has an in-line structure.
可选地,所述第二电极为T字形结构。Optionally, the second electrode has a T-shaped structure.
可选地,所述感光器件为直接式光敏探测器。Optionally, the photosensitive device is a direct photosensitive detector.
可选地,所述X射线探测器包括基板以及感光器件,所述感光器件设于所述X射线探测器的入光侧,以感知X射线的光强度,并转换成电信号;Optionally, the X-ray detector includes a substrate and a photosensitive device, and the photosensitive device is provided on the light incident side of the X-ray detector to sense the X-ray light intensity and convert it into an electrical signal;
所述X射线探测器还包括:The X-ray detector also includes:
信号读取元件,所述信号读取元件设于所述基板上且与所述感光器件电连接,以接收并读取所述感光器件转换后的电信号。A signal reading element provided on the substrate and electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device.
其中,所述感光器件包括:Wherein, the photosensitive device includes:
感光层,所述感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;A photosensitive layer, the photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
第一电极,所述第一电极设于所述感光层的入光侧;以及A first electrode provided on the light incident side of the photosensitive layer; and
第二电极,所述第二电极设于所述感光层的出光侧。A second electrode provided on the light exit side of the photosensitive layer.
可选地,所述纳米孔结构的孔直径为2nm~10nm。Optionally, the pore diameter of the nanopore structure is 2 nm to 10 nm.
可选地,所述填充物由SixOy形成。Optionally, the filler is formed by SixOy.
可选地,所述第一电极为透明电极,所述第二电极为金属电极。Optionally, the first electrode is a transparent electrode, and the second electrode is a metal electrode.
可选地,所述X射线探测器还包括保护层,所述保护层填充于所述信号读取元件与所述感光器件之间的空隙,将所述信号读取元件与外界环境隔离。Optionally, the X-ray detector further includes a protective layer that fills the gap between the signal reading element and the photosensitive device to isolate the signal reading element from the external environment.
可选地,所述保护层的厚度为500nm~2000nm。Optionally, the thickness of the protective layer is 500 nm to 2000 nm.
可选地,所述第二电极穿透所述保护层与所述信号读取元件的漏极电连接。Optionally, the second electrode penetrates the protective layer and is electrically connected to the drain of the signal reading element.
可选地,所述第二电极通过导线与所述信号读取元件的漏极电连接。Optionally, the second electrode is electrically connected to the drain of the signal reading element through a wire.
可选地,所述显示装置包括如X射线探测器,所述X射线探测器包括基板以及感光器件,所述感光器件设于所述X射线探测器的入光侧,以感知X射线的光强度,并转换成电信号;Optionally, the display device includes, for example, an X-ray detector, and the X-ray detector includes a substrate and a photosensitive device, and the photosensitive device is provided on a light incident side of the X-ray detector to sense the light of X-rays Strength, and converted into electrical signals;
所述X射线探测器还包括:The X-ray detector also includes:
信号读取元件,所述信号读取元件设于所述基板上且与所述感光器件电连接,以接收并读取所述感光器件转换后的电信号;A signal reading element provided on the substrate and electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device;
其中,所述感光器件包括:Wherein, the photosensitive device includes:
感光层,所述感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;A photosensitive layer, the photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
第一电极,所述第一电极设于所述感光层的入光侧;以及A first electrode provided on the light incident side of the photosensitive layer; and
第二电极,所述第二电极设于所述感光层的出光侧。A second electrode provided on the light exit side of the photosensitive layer.
可选地,所述显示装置还包括成像装置,所述成像装置与所述信号读取元件电连接。Optionally, the display device further includes an imaging device electrically connected to the signal reading element.
本申请提供了一种感光器件、X射线探测器以及显示装置,感光器件包括:感光层、第一电极以及第二电极;感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;第一电极设于感光层的入光侧;第二电极设于感光层的出光侧。本申请实施例的感光器件采用在感光层由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒,以增加光线的接触面积,增加感光层的光灵敏度,从而提高感光层的光吸收效率,提高感光层的光转换效率。The present application provides a photosensitive device, an X-ray detector, and a display device. The photosensitive device includes: a photosensitive layer, a first electrode, and a second electrode; the photosensitive layer is formed by stacking a plurality of fillers, and the fillers are evenly distributed Nanopore structure, and the nanopore structure is filled with gaseous selenium; the first electrode is provided on the light incident side of the photosensitive layer; the second electrode is provided on the light emitting side of the photosensitive layer. The photosensitive device of the embodiment of the present application is formed by stacking a plurality of fillers in the photosensitive layer. The fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium to increase the contact area of light and increase the photosensitive layer The light sensitivity of the photosensitive layer, thereby improving the light absorption efficiency of the photosensitive layer and the light conversion efficiency of the photosensitive layer.
附图说明BRIEF DESCRIPTION
为了更清楚地说明本申请实施例或示例性中的技术方案,下面将对实施例或示例性描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图示出的结构获得其他的附图。In order to more clearly explain the technical solutions in the embodiments or exemplary embodiments of the present application, the drawings required in the embodiments or exemplary descriptions will be briefly described below. Obviously, the drawings in the following description are only For some embodiments of the application, those of ordinary skill in the art can obtain other drawings according to the structures shown in the drawings without creative efforts.
图1为本申请的一个实施例的感光器件的结构示意图;1 is a schematic structural diagram of a photosensitive device according to an embodiment of the application;
图2为本申请的另一个实施例的感光器件的结构示意图;2 is a schematic structural diagram of a photosensitive device according to another embodiment of this application;
图3为本申请的一个实施例的X射线探测器的结构示意图;3 is a schematic structural diagram of an X-ray detector according to an embodiment of the present application;
图4为本申请的另一个实施例的X射线探测器的结构示意图。4 is a schematic structural diagram of an X-ray detector according to another embodiment of the present application.
本申请目的的实现、功能特点及优点将结合实施例,参照附图做进一步说明。The implementation, functional characteristics and advantages of the present application will be further described in conjunction with the embodiments and with reference to the drawings.
本发明的实施方式Embodiments of the invention
在下面将结合本申请实施例中的附图,对本申请实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅仅是本申请的一部分实施例,而不是全部的实施例。基于本申请中的实施例,本领域普通技术人员在没有作出创造性劳动前提下所获得的所有其他实施例,都属于本申请保护的范围。The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all the embodiments . Based on the embodiments in the present application, all other embodiments obtained by a person of ordinary skill in the art without creative work fall within the scope of protection of the present application.
需要说明,本申请实施例中所有方向性指示(诸如上、下、左、右、前、后……)仅为了解释在某一特定姿态(如附图所示)下各部件之间的相对位置关系、运动情况等,如果该特定姿态发生改变时,则该方向性指示也相应地随之改变。It should be noted that all the directional indicators (such as up, down, left, right, front, back, etc.) in the embodiments of the present application are only to explain the relative between the components in a certain posture (as shown in the drawings) If the specific posture changes, such as positional relationship, movement, etc., the directional indication changes accordingly.
另外,在本申请中涉及“第一”、“第二”等的描述仅为了描述目的,而不能理解为指示或暗示其相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。另外,各个实施例之间的技术方案可以相互结合,但是必须是以本领域普通技术人员能够实现为基础,当技术方案的结合出现相互矛盾或无法实现时应当认为这种技术方案的结合不存在,也不在本申请要求的保护范围之内。In addition, the descriptions of "first", "second", etc. in this application are for descriptive purposes only, and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of indicated technical features. Thus, the features defined as "first" and "second" may include at least one of the features either explicitly or implicitly. In addition, the technical solutions between the various embodiments can be combined with each other, but they must be based on the ability of those skilled in the art to achieve. When the combination of technical solutions conflicts with each other or cannot be realized, it should be considered that the combination of such technical solutions does not exist , Nor within the scope of protection required by this application.
如图1~2所示,本申请提出了一种感光器件。As shown in FIGS. 1-2, this application proposes a photosensitive device.
参照图1和图2所示,感光器件包括感光层1、第一电极2以及第二电极3;其中,该感光层1设置为感知光线的强度,并将该光线的光信号转化成电信号,从而将电信号传输至信号读取元件中,可选地,感光层1是直接与光线接触,即光线直接照射于该感光层1上,即本申请的感光器件为直接式光敏探测器。具体地,感光层1接收的光线为X射线(X-ray),并通过其光电转换功能将X射线的光信号转换为电信号,通过第二电极3传输至信号读取元件中,以供信号读取元件读取;即本申请的感光器件为直接式X射线探测器。1 and 2, the photosensitive device includes a photosensitive layer 1, a first electrode 2 and a second electrode 3; wherein, the photosensitive layer 1 is configured to sense the intensity of light and convert the light signal of the light into an electrical signal In order to transmit the electrical signal to the signal reading element, optionally, the photosensitive layer 1 is in direct contact with light, that is, the light is directly irradiated on the photosensitive layer 1, that is, the photosensitive device of the present application is a direct photosensitive detector. Specifically, the light received by the photosensitive layer 1 is X-ray, and through its photoelectric conversion function, the X-ray optical signal is converted into an electrical signal, which is transmitted to the signal reading element through the second electrode 3 for The signal reading element reads; that is, the photosensitive device of the present application is a direct X-ray detector.
在一实施例中,第一电极2、第二电极3设置在感光层1相对的两侧,即第一电极2设于感光层1的入光侧,第二电极3设于感光层1的出光侧;本实施例中入光侧和出光侧的限定是针对外部X射线发生器发射的X射线来设置,当X射线发生器的位置发生变化时,即感光层1入光侧和出光侧的位置也随着变化,在此不再赘述。第二电极3与上述的信号读取元件电连接,以将感光层1接收到的光信号转换成电信号后通过第二电极3直接传输至信号读取元件中,而不需要将外部的X射线转换成可见光之后,再传输至信号读取元件,从而提高光吸收的效率。In an embodiment, the first electrode 2 and the second electrode 3 are disposed on opposite sides of the photosensitive layer 1, that is, the first electrode 2 is disposed on the light incident side of the photosensitive layer 1, and the second electrode 3 is disposed on the photosensitive layer 1 Light exit side; the definition of the light entrance side and the light exit side in this embodiment is set for the X-rays emitted by an external X-ray generator. When the position of the X-ray generator changes, that is, the light entrance side and the light exit side of the photosensitive layer 1 The location of the has also changed, and will not be repeated here. The second electrode 3 is electrically connected to the above-mentioned signal reading element to convert the optical signal received by the photosensitive layer 1 into an electrical signal and then directly transmitted to the signal reading element through the second electrode 3 without the need for external X After the radiation is converted into visible light, it is transmitted to the signal reading element, thereby improving the efficiency of light absorption.
在一实施例中,感光层1由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒(Se)。具体地,该填充物为条状填充物,且在其内部为均匀分布的纳米孔结构,该纳米孔结构类似于蜂窝孔,本实施例中将气态的硒填充至该纳米孔结构中,以使感光层1的接触面积增大,即当光线照射于感光层1上时,光线直接作用于填充物上,并作用于纳米孔结构的气态硒上,从而增加光线的接触面积,以增加感光层1的光灵敏度,提高感光层1的光吸收效率,即间接提高了感光层1的光转换效率。In an embodiment, the photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium (Se). Specifically, the filler is a strip-shaped filler and has a uniformly distributed nanopore structure inside. The nanopore structure is similar to a honeycomb hole. In this embodiment, gaseous selenium is filled into the nanopore structure to The contact area of the photosensitive layer 1 is increased, that is, when light is irradiated on the photosensitive layer 1, the light directly acts on the filler and acts on the gaseous selenium of the nanopore structure, thereby increasing the contact area of the light to increase the sensitivity The light sensitivity of the layer 1 improves the light absorption efficiency of the photosensitive layer 1, that is, indirectly improves the light conversion efficiency of the photosensitive layer 1.
在一实施例中,多个填充物堆叠于感光层1中,且能够使感光层1处于饱和状态,从而使光线的吸收效率更高。本实施例中,填充物的数量可以根据感光层1的制备来设定,在此并无限制。In an embodiment, a plurality of fillers are stacked in the photosensitive layer 1, and the photosensitive layer 1 can be in a saturated state, so that the light absorption efficiency is higher. In this embodiment, the number of fillers can be set according to the preparation of the photosensitive layer 1, which is not limited herein.
在一实施例中,将气体硒可通过脉冲的方式填充至纳米孔结构。当然,在其他实施例中,还可以通过其他方式填充,在此并无限制。In one embodiment, the gas selenium can be filled into the nanopore structure in a pulsed manner. Of course, in other embodiments, it may also be filled in other ways, and there is no limitation here.
在一实施例中,第一电极2与感光层1电连接,第二电极3与信号读取元件电连接。当第一电极2和第二电极3之间施加电压时,光线从第一电极2入射于感光层1,感光层1感受到光线后,检测该光线的强度,并将该光线的光信号转换为电信号,本实施例电信号为电流信号,即当光线强度较强时,电流信号大;当光线强度较弱时,电流信号小。感光层1将转换后的电信号通过第二电极3传输至信号读取元件中。In one embodiment, the first electrode 2 is electrically connected to the photosensitive layer 1, and the second electrode 3 is electrically connected to the signal reading element. When a voltage is applied between the first electrode 2 and the second electrode 3, light is incident on the photosensitive layer 1 from the first electrode 2, the photosensitive layer 1 senses the light, detects the intensity of the light, and converts the light signal of the light It is an electrical signal. In this embodiment, the electrical signal is a current signal, that is, when the light intensity is strong, the current signal is large; when the light intensity is weak, the current signal is small. The photosensitive layer 1 transmits the converted electrical signal to the signal reading element through the second electrode 3.
在一实施例中,该感光层1可直接与光线接触,即可减少光线的损失,从而提高光线的利用率。In one embodiment, the photosensitive layer 1 can be directly in contact with light, which can reduce the loss of light, thereby improving the utilization of light.
在本申请的实施例中,包括感光层1由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;第一电极2设于感光层1的入光侧;第二电极3设于感光层1的出光侧。本申请实施例的感光器件采用在感光层1由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒,以增加光线的接触面积,增加感光层1的光灵敏度,从而提高感光层1的光吸收效率,提高感光层1的光转换效率。In the embodiment of the present application, the photosensitive layer 1 is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium; the first electrode 2 is provided On the light incident side of the photosensitive layer 1; the second electrode 3 is provided on the light emitting side of the photosensitive layer 1. The photosensitive device of the embodiment of the present application is formed by stacking a plurality of fillers in the photosensitive layer 1, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium to increase the contact area of light and increase the sensitivity The light sensitivity of the layer 1 improves the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
在一实施例中,纳米孔结构的孔直径为2nm~10nm。In one embodiment, the pore diameter of the nanopore structure is 2 nm-10 nm.
进一步地,纳米孔结构的孔直径为6nm,以使气态硒能够更多地容纳于该纳米孔结构中,使该纳米孔结构的空间达到饱和状态,从而提高纳米孔结构的利用率,提供光线的吸收效率。当然,在其他实施例中,纳米孔结构的孔直径为2nm~10nm中的任意值(不包括6nm),在此并无限制。Further, the pore diameter of the nanopore structure is 6 nm, so that gaseous selenium can be accommodated in the nanopore structure more, so that the space of the nanopore structure reaches a saturation state, thereby improving the utilization rate of the nanopore structure and providing light Absorption efficiency. Of course, in other embodiments, the pore diameter of the nanopore structure is any value from 2 nm to 10 nm (not including 6 nm), which is not limited herein.
在一实施例中,填充物由SixOy(氧化硅)形成,即填充物为氧化硅材料。In one embodiment, the filler is formed of SixOy (silicon oxide), that is, the filler is a silicon oxide material.
具体地,氧化硅晶体溶于酒精溶液中,使该酒精溶液中含有表面活性剂诱导氧化硅,由于酒精的挥发使表面活性剂的浓度升高,当表面活性剂的浓度接近10%时,氧化硅开始形成孔状结构,当浓度达到35%以后,氧化硅的孔结构相对均匀,且相互间紧密排列成蜂窝状,这种状态一直持续到表面活性剂的浓度超过70%,当浓度超过70%后,氧化硅形成层状液晶,此时,气态硒不便于填充该氧化硅填充物中。即当氧化硅晶体溶于酒精溶液中,且酒精溶液中含有表面活性剂的浓度为35%~70%时,气态硒便于填充至该填充物中。Specifically, the silicon oxide crystal is dissolved in an alcohol solution, and the alcohol solution contains a surfactant to induce silicon oxide. The concentration of the surfactant is increased due to the volatilization of alcohol. When the concentration of the surfactant is close to 10%, the oxidation Silicon begins to form a pore structure. When the concentration reaches 35%, the pore structure of silicon oxide is relatively uniform, and they are closely arranged in a honeycomb shape. This state continues until the concentration of the surfactant exceeds 70%. When the concentration exceeds 70 After %, silicon oxide forms a layered liquid crystal, at this time, gaseous selenium is not convenient to fill the silicon oxide filler. That is, when silicon oxide crystals are dissolved in an alcohol solution and the concentration of the surfactant in the alcohol solution is 35% to 70%, gaseous selenium can be easily filled into the filler.
在一实施例中,表面活性剂的浓度可以控制纳米孔的大小,且纳米孔的孔直径为2nm~10nm之间。当然,表面活性剂的种类也可以控制纳米孔的大小,比如,当表面活性剂为P123时,使纳米孔的孔直径处于5nm~10nm范围内,当表面活性剂为CTAB时,纳米孔的孔直径处于2nm~4.5nm范围内,当表面活性剂为F127时,纳米孔的孔直径处于2.5nm~4.5nm范围内;此时,填通过控制纳米孔的孔直径,以控制填充物吸收特定波长的光,使得填充物能够稳定地吸收波长在特定范围内的光,因此纳米孔中的气态硒相较于非晶硅对光具有更灵敏的反应和更高效率的光电转换效率。可以理解的是,表面活性剂的种类并不仅限于上述三种。In an embodiment, the concentration of the surfactant can control the size of the nanopore, and the diameter of the nanopore is between 2 nm and 10 nm. Of course, the type of surfactant can also control the size of the nanopore. For example, when the surfactant is P123, the pore diameter of the nanopore is in the range of 5nm to 10nm. When the surfactant is CTAB, the pore of the nanopore The diameter is in the range of 2nm~4.5nm, when the surfactant is F127, the pore diameter of the nanopore is in the range of 2.5nm~4.5nm; at this time, the filling is controlled by controlling the pore diameter of the nanopore to control the filler to absorb a specific wavelength The light enables the filler to absorb light with a wavelength within a certain range steadily. Therefore, gaseous selenium in nanopores has a more sensitive response to light and higher photoelectric conversion efficiency than amorphous silicon. It can be understood that the types of surfactants are not limited to the above three.
在一实施例中,为了使感光层1的光吸收效率更高,第一电极2设为透明电极,即光线可直接透过该第一电极2,应当理解的是,可将光线直接透过该第一电极2并照射感光层1,即该透明电极还具备高透光性,以能够透过光线,从而减少光线的损失,提高光线的利用率。In an embodiment, in order to make the light absorption efficiency of the photosensitive layer 1 higher, the first electrode 2 is set as a transparent electrode, that is, light can directly pass through the first electrode 2, it should be understood that light can be directly transmitted through The first electrode 2 irradiates the photosensitive layer 1, that is, the transparent electrode also has high light transmittance to transmit light, thereby reducing the loss of light and improving the utilization rate of light.
在一实施例中,由于第二电极3与上述的信号读取元件5电连接,即第二电极3设为金属电极,在可的传导电信号的同时,利用金属的不透光性,可将该信号读取元件5罩住,防止光线进入信号读取元件,从而导致读取信号的不准确性。具体的,该金属电极的材料可采用包括铜、镍等金属材料,在此并无限制。In one embodiment, since the second electrode 3 is electrically connected to the above-mentioned signal reading element 5, that is, the second electrode 3 is set as a metal electrode, while the electrical signal can be conducted, the opacity of the metal can be used to Covering the signal reading element 5 prevents light from entering the signal reading element, thereby causing inaccuracy in reading the signal. Specifically, the material of the metal electrode may include metal materials including copper, nickel and the like, which is not limited herein.
在一实施例中,该第二电极3可为一字形结构(如图1),还可为T字形结构(如图2),当然,为了配合信号读取元件,该第二电极3还可以为其他结构,在本申请中并无限制。In an embodiment, the second electrode 3 may be a straight structure (see FIG. 1) or a T-shaped structure (see FIG. 2). Of course, in order to cooperate with the signal reading element, the second electrode 3 may also be For other structures, there are no restrictions in this application.
在本申请的实施例中,包括感光层1由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;第一电极2设于感光层1的入光侧;第二电极3设于感光层1的出光侧。本申请实施例的感光器件采用在感光层1由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒,以增加光线的接触面积,增加感光层1的光灵敏度,从而提高感光层1的光吸收效率,提高感光层1的光转换效率。In the embodiment of the present application, the photosensitive layer 1 is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium; the first electrode 2 is provided On the light incident side of the photosensitive layer 1; the second electrode 3 is provided on the light emitting side of the photosensitive layer 1. The photosensitive device of the embodiment of the present application is formed by stacking a plurality of fillers in the photosensitive layer 1, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium to increase the contact area of light and increase the sensitivity The light sensitivity of the layer 1 improves the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
基于上述实施例,本申请另一实施例还提供了一种X射线探测器,参照图3所示,该X射线探测器包括基板4以及上述实施例中的感光器件,感光器件设于X射线探测器的入光侧,以感知X射线的光强度,并转换成电信号。其中,本实施例中入光侧的限定是针对外部X射线发生器发射的X射线来设置,当X射线发生器的位置发生变化时,即X射线探测器的入光侧的位置也随着变化,在此不再赘述。Based on the foregoing embodiment, another embodiment of the present application further provides an X-ray detector. Referring to FIG. 3, the X-ray detector includes a substrate 4 and the photosensitive device in the foregoing embodiment. The photosensitive device is provided on the X-ray The light entrance side of the detector can sense the X-ray light intensity and convert it into an electrical signal. Among them, the definition of the light incident side in this embodiment is set for the X-rays emitted by the external X-ray generator. When the position of the X-ray generator changes, that is, the position of the light incident side of the X-ray detector also follows Changes will not be repeated here.
在一实施例中,如图1~2所示,感光器件包括感光层1、第一电极2以及第二电极3,感光层1由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒(Se),第一电极2设于感光层1的入光侧,第二电极3设于感光层1的出光侧,以增加光线的接触面积,增加感光层1的光灵敏度,从而提高感光层1的光吸收效率,提高感光层1的光转换效率。In one embodiment, as shown in FIGS. 1-2, the photosensitive device includes a photosensitive layer 1, a first electrode 2, and a second electrode 3. The photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanometers The pore structure is filled with gaseous selenium (Se). The first electrode 2 is located on the light-incident side of the photosensitive layer 1 and the second electrode 3 is located on the light-exiting side of the photosensitive layer 1 to increase the light contact area. The light sensitivity of the photosensitive layer 1 is increased, thereby improving the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
进一步地,所述纳米孔结构的孔直径为2nm~10nm。本申请中纳米孔结构的孔直径可选为6nm,以使气态硒能够更多地容纳于该纳米孔结构中,使该纳米孔结构的空间达到饱和状态,从而提高纳米孔结构的利用率,提供光线的吸收效率。当然,在其他实施例中,纳米孔结构的孔直径为2nm~10nm中的任意值(不包括6nm),在此并无限制。Further, the pore diameter of the nanopore structure is 2 nm to 10 nm. In this application, the pore diameter of the nanopore structure can be selected to be 6 nm, so that gaseous selenium can be accommodated in the nanopore structure more, so that the space of the nanopore structure reaches a saturation state, thereby improving the utilization rate of the nanopore structure, Provides light absorption efficiency. Of course, in other embodiments, the pore diameter of the nanopore structure is any value from 2 nm to 10 nm (not including 6 nm), which is not limited herein.
进一步地,所述填充物由SixOy形成,即填充物为氧化硅材料。Further, the filler is formed by SixOy, that is, the filler is a silicon oxide material.
具体地,氧化硅晶体溶于酒精溶液中,使该酒精溶液中含有表面活性剂诱导氧化硅,由于酒精的挥发使表面活性剂的浓度升高,当表面活性剂的浓度接近10%时,氧化硅开始形成孔状结构,当浓度达到35%以后,氧化硅的孔结构相对均匀,且相互间紧密排列成蜂窝状,这种状态一直持续到表面活性剂的浓度超过70%,当浓度超过70%后,氧化硅形成层状液晶,此时,气态硒不便于填充该氧化硅填充物中。即当氧化硅晶体溶于酒精溶液中,且酒精溶液中含有表面活性剂的浓度为35%~70%时,气态硒便于填充至该填充物中。Specifically, the silicon oxide crystal is dissolved in an alcohol solution, and the alcohol solution contains a surfactant to induce silicon oxide. The concentration of the surfactant is increased due to the volatilization of alcohol. When the concentration of the surfactant is close to 10%, the oxidation Silicon begins to form a pore structure. When the concentration reaches 35%, the pore structure of silicon oxide is relatively uniform, and they are closely arranged in a honeycomb shape. This state continues until the concentration of the surfactant exceeds 70%. When the concentration exceeds 70 After %, silicon oxide forms a layered liquid crystal, at this time, gaseous selenium is not convenient to fill the silicon oxide filler. That is, when silicon oxide crystals are dissolved in an alcohol solution and the concentration of the surfactant in the alcohol solution is 35% to 70%, gaseous selenium can be easily filled into the filler.
进一步地,为了使感光层1的光吸收效率更高,第一电极2设为透明电极,即光线可直接透过该第一电极2,应当理解的是,可将光线直接透过该第一电极2并照射感光层1,即该透明电极还具备高透光性,以能够透过光线,从而减少光线的损失,提高光线的利用率。Further, in order to make the light absorption efficiency of the photosensitive layer 1 higher, the first electrode 2 is set as a transparent electrode, that is, light can directly pass through the first electrode 2, it should be understood that light can be directly transmitted through the first The electrode 2 also irradiates the photosensitive layer 1, that is, the transparent electrode also has high light transmittance to transmit light, thereby reducing the loss of light and improving the utilization rate of light.
进一步地,由于第二电极3与上述的信号读取元件5电连接,即第二电极3设为金属电极,在可的传导电信号的同时,利用金属的不透光性,可将该信号读取元件5罩住,防止光线进入信号读取元件,从而导致读取信号的不准确性。具体的,该金属电极的材料可采用包括铜、镍等金属材料,在此并无限制。Further, since the second electrode 3 is electrically connected to the above-mentioned signal reading element 5, that is, the second electrode 3 is set as a metal electrode, while the electrical signal can be conducted, the signal can be utilized by the opacity of the metal The reading element 5 is covered to prevent light from entering the signal reading element, thereby causing inaccuracy in reading the signal. Specifically, the material of the metal electrode may include metal materials including copper, nickel and the like, which is not limited herein.
在一实施例中,该X射线探测器还包括信号读取元件5,信号读取元件5设于基板4上且与感光器件电连接,以接收并读取感光器件转换后的电信号。具体地,信号读取元件5可选为TFT(薄膜晶体管)结构,设置为读取感光器件的电信号,该电信号为电流信号。In one embodiment, the X-ray detector further includes a signal reading element 5 which is provided on the substrate 4 and is electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device. Specifically, the signal reading element 5 may be a TFT (thin film transistor) structure, and is configured to read the electrical signal of the photosensitive device, and the electrical signal is a current signal.
在一实施例中,基板4可以采用玻璃基板4、硅片以及聚酰亚胺PI塑料基板4等,在此并无限制。In one embodiment, the substrate 4 may be a glass substrate 4, a silicon wafer, a polyimide PI plastic substrate 4, etc., which is not limited herein.
在一实施例中,X射线探测器上还设有一X射线发生器(图未示),设置为发射X射线,X射线探测器设于X射线发生器的入光侧,即感光器件的感光层1设于X射线探测器的入光侧。具体地,感光层1由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒,设置为将X射线的光信号转换成电信号,并传输至信号读取元件5中。In one embodiment, the X-ray detector is also provided with an X-ray generator (not shown), which is arranged to emit X-rays, and the X-ray detector is provided on the light incident side of the X-ray generator, that is, the photosensitive device Layer 1 is provided on the light incident side of the X-ray detector. Specifically, the photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium, which is configured to convert X-ray optical signals into electrical signals and transmit Into the signal reading element 5.
在一实施例中,信号读取元件5的漏极设于基板4上,并与感光器件的第二电极3电连接,以传导电信号。当然,可选地,如图3所示,第二电极3为T形电极,即第二电极3穿透所述保护层6与所述信号读取元件5的漏极电连接,使电信号的传导更加高效、快捷;当然,在另一实施例中,如图4所示,第二电极3为一字形电极,此时,第二电极3通过导线与所述信号读取元件5的漏极电连接,在本申请中并无限制。In one embodiment, the drain of the signal reading element 5 is provided on the substrate 4 and is electrically connected to the second electrode 3 of the photosensitive device to conduct electrical signals. Of course, optionally, as shown in FIG. 3, the second electrode 3 is a T-shaped electrode, that is, the second electrode 3 penetrates the protective layer 6 and is electrically connected to the drain of the signal reading element 5 to make an electrical signal Is more efficient and faster; of course, in another embodiment, as shown in FIG. 4, the second electrode 3 is an in-line electrode. At this time, the second electrode 3 is connected to the leakage of the signal reading element 5 through a wire There is no restriction on the electrical connection in this application.
在一具体的实施例中,该X射线探测器还包括保护层6,保护层6填充于信号读取元件5与感光器件之间的空隙,设置为将信号读取元件5与外界环境隔离。In a specific embodiment, the X-ray detector further includes a protective layer 6, the protective layer 6 fills the gap between the signal reading element 5 and the photosensitive device, and is configured to isolate the signal reading element 5 from the external environment.
在一实施例中,为了能够支撑该感光器件,保护层6的厚度设为500nm~2000nm,即可使整个X射线探测器的结构更加稳定,且能够保证X射线探测器的平坦度。In an embodiment, in order to support the photosensitive device, the thickness of the protective layer 6 is set to 500 nm to 2000 nm, which can make the structure of the entire X-ray detector more stable and ensure the flatness of the X-ray detector.
本申请技术方案采用上述的感光器件,并在感光器件的感光层1中堆叠多个填充物,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒,以增加光线的接触面积,增加感光层1的光灵敏度,从而提高感光层1的光吸收效率,提高感光层1的光转换效率。The technical solution of the present application uses the above-mentioned photosensitive device, and a plurality of fillers are stacked in the photosensitive layer 1 of the photosensitive device. The filler is a uniformly distributed nanopore structure, and the nanopore structure is filled with gaseous selenium to increase light contact The area increases the light sensitivity of the photosensitive layer 1, thereby improving the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
基于上述所有实施例,参照图1-图4,本申请实施例还提出一种显示装置,该显示装置包括前述X射线探测器及成像装置(图未示),X射线探测器与成像装置电连接,X射线探测器因光电效应产生的电信号经成像装置形成影像。Based on all the above-mentioned embodiments, referring to FIGS. 1-4, an embodiment of the present application further proposes a display device including the aforementioned X-ray detector and imaging device (not shown). The X-ray detector and imaging device Connected, the electrical signal generated by the X-ray detector due to the photoelectric effect forms an image through the imaging device.
在一实施例中,如图1~2所示,感光器件包括感光层1、第一电极2以及第二电极3,感光层1由多个填充物堆叠而成,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒(Se),第一电极2设于感光层1的入光侧,第二电极3设于感光层1的出光侧。In one embodiment, as shown in FIGS. 1-2, the photosensitive device includes a photosensitive layer 1, a first electrode 2, and a second electrode 3. The photosensitive layer 1 is formed by stacking a plurality of fillers, and the fillers are uniformly distributed nanometers The pore structure is filled with gaseous selenium (Se). The first electrode 2 is disposed on the light-incident side of the photosensitive layer 1 and the second electrode 3 is disposed on the light-emitting side of the photosensitive layer 1.
在一实施例中,如图3~4所示,该X射线探测器包括基板4以及上述实施例中的感光器件,感光器件设于X射线探测器的入光侧,以感知X射线的光强度,并转换成电信号。In one embodiment, as shown in FIGS. 3 to 4, the X-ray detector includes a substrate 4 and the photosensitive device in the above embodiment. The photosensitive device is provided on the light incident side of the X-ray detector to sense the X-ray light Strength, and converted into electrical signals.
进一步地,X射线探测器还包括信号读取元件5,信号读取元件5设于基板4上且与感光器件电连接,以接收并读取感光器件转换后的电信号。具体地,信号读取元件5可选为TFT(薄膜晶体管)结构,设置为读取感光器件的电信号,该电信号为电流信号。Further, the X-ray detector further includes a signal reading element 5 which is provided on the substrate 4 and is electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device. Specifically, the signal reading element 5 may be a TFT (thin film transistor) structure, and is configured to read the electrical signal of the photosensitive device, and the electrical signal is a current signal.
可选地,由于X射线探测器内起光电转换功能的感光器件具有灵敏且高效的光电转换性能,因此,在同样的成像效果下,可以降低X射线的照射强度或照射时间,减少对病人的影响。Optionally, because the photosensitive device in the X-ray detector that has the photoelectric conversion function has sensitive and efficient photoelectric conversion performance, under the same imaging effect, the X-ray irradiation intensity or irradiation time can be reduced, and the exposure to the patient can be reduced. influences.
本申请技术方案采用上述的X射线探测器,且该X射线探测器中感光器件的感光层1中堆叠多个填充物,填充物为均匀分布的纳米孔结构,且纳米孔结构内填充有气态硒,以增加光线的接触面积,增加感光层1的光灵敏度,从而提高感光层1的光吸收效率,提高感光层1的光转换效率。The technical solution of the present application adopts the above-mentioned X-ray detector, and a plurality of fillers are stacked in the photosensitive layer 1 of the photosensitive device in the X-ray detector. The filler is a uniformly distributed nanopore structure, and the nanopore structure is filled with a gaseous state Selenium can increase the contact area of light and increase the light sensitivity of the photosensitive layer 1, thereby improving the light absorption efficiency of the photosensitive layer 1 and the light conversion efficiency of the photosensitive layer 1.
以上所述仅为本申请的可选实施例,并非因此限制本申请的专利范围,凡是在本申请的构思下,利用本申请说明书及附图内容所作的等效结构变换,或直接/间接运用在其他相关的技术领域均包括在本申请的专利保护范围内。The above is only an optional embodiment of the present application, and does not limit the patent scope of the present application. Any equivalent structural transformation or direct/indirect use of the content of the description and drawings of this application under the concept of this application All other related technical fields are included in the patent protection scope of this application.

Claims (20)

  1. 一种感光器件,其中,所述感光器件包括: A photosensitive device, wherein the photosensitive device comprises:
    感光层,所述感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;A photosensitive layer, the photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
    第一电极,所述第一电极设于所述感光层的入光侧;以及A first electrode provided on the light incident side of the photosensitive layer; and
    第二电极,所述第二电极设于所述感光层的出光侧。A second electrode provided on the light exit side of the photosensitive layer.
  2. 根据权利要求1所述的感光器件,其中,所述纳米孔结构的孔直径为2nm~10nm。 The photosensitive device according to claim 1, wherein the nanopore structure has a pore diameter of 2 nm to 10 nm.
  3. 根据权利要求1所述的感光器件,其中,所述气体硒可通过脉冲的方式填充至纳米孔结构。 The photosensitive device according to claim 1, wherein the gas selenium can be filled into the nanopore structure in a pulse manner.
  4. 根据权利要求1所述的感光器件,其中,所述填充物由SixOy形成。 The photosensitive device according to claim 1, wherein the filler is formed of SixOy.
  5. 根据权利要求4所述的感光器件,其中,所述填充物为条状填充物。 The photosensitive device according to claim 4, wherein the filler is a strip-shaped filler.
  6. 根据权利要求1所述的感光器件,其中,所述第一电极与所述感光层电连接,所述第二电极与信号读取元件电连接。 The photosensitive device according to claim 1, wherein the first electrode is electrically connected to the photosensitive layer, and the second electrode is electrically connected to a signal reading element.
  7. 根据权利要求6所述的感光器件,其中,所述第一电极为透明电极,所述第二电极为金属电极。 The photosensitive device according to claim 6, wherein the first electrode is a transparent electrode and the second electrode is a metal electrode.
  8. 根据权利要求1所述的感光器件,其中,所述第二电极为一字形结构。 The photosensitive device according to claim 1, wherein the second electrode has an in-line structure.
  9. 根据权利要求1所述的感光器件,其中,所述第二电极为T字形结构。 The photosensitive device according to claim 1, wherein the second electrode has a T-shaped structure.
  10. 根据权利要求1所述的感光器件,其中,所述感光器件为直接式光敏探测器。 The photosensitive device according to claim 1, wherein the photosensitive device is a direct photosensitive detector.
  11. 一种X射线探测器,其中,所述X射线探测器包括基板以及感光器件,所述感光器件设于所述X射线探测器的入光侧,以感知X射线的光强度,并转换成电信号; An X-ray detector, wherein the X-ray detector includes a substrate and a photosensitive device, the photosensitive device is provided on the light incident side of the X-ray detector to sense the X-ray light intensity and convert it into electricity signal;
    所述X射线探测器还包括:The X-ray detector also includes:
    信号读取元件,所述信号读取元件设于所述基板上且与所述感光器件电连接,以接收并读取所述感光器件转换后的电信号;A signal reading element provided on the substrate and electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device;
    其中,所述感光器件包括:Wherein, the photosensitive device includes:
    感光层,所述感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;A photosensitive layer, the photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
    第一电极,所述第一电极设于所述感光层的入光侧;以及A first electrode provided on the light incident side of the photosensitive layer; and
    第二电极,所述第二电极设于所述感光层的出光侧。A second electrode provided on the light exit side of the photosensitive layer.
  12. 根据权利要求11所述的感光器件,其中,所述纳米孔结构的孔直径为2nm~10nm。 The photosensitive device according to claim 11, wherein the pore diameter of the nanopore structure is 2 nm to 10 nm.
  13. 根据权利要求11所述的感光器件,其中,所述填充物由SixOy形成。The photosensitive device according to claim 11, wherein the filler is formed of SixOy.
  14. 根据权利要求11所述的感光器件,其中,所述第一电极为透明电极,所述第二电极为金属电极。The photosensitive device according to claim 11, wherein the first electrode is a transparent electrode and the second electrode is a metal electrode.
  15. 根据权利要求11所述的X射线探测器,其中,所述X射线探测器还包括保护层,所述保护层填充于所述信号读取元件与所述感光器件之间的空隙,将所述信号读取元件与外界环境隔离。The X-ray detector according to claim 11, wherein the X-ray detector further includes a protective layer, the protective layer is filled in a gap between the signal reading element and the photosensitive device, and the The signal reading element is isolated from the external environment.
  16. 根据权利要求15所述的X射线探测器,其中,所述保护层的厚度为500nm~2000nm。The X-ray detector according to claim 15, wherein the protective layer has a thickness of 500 nm to 2000 nm.
  17. 根据权利要求16所述的X射线探测器,其中,所述第二电极穿透所述保护层与所述信号读取元件的漏极电连接。The X-ray detector according to claim 16, wherein the second electrode penetrates the protective layer and is electrically connected to the drain of the signal reading element.
  18. 根据权利要求16所述的X射线探测器,其中,所述第二电极通过导线与所述信号读取元件的漏极电连接。The X-ray detector according to claim 16, wherein the second electrode is electrically connected to the drain of the signal reading element through a wire.
  19. 一种显示装置,其中,包括X射线探测器,所述X射线探测器包括基板以及感光器件,所述感光器件设于所述X射线探测器的入光侧,以感知X射线的光强度,并转换成电信号;A display device, comprising an X-ray detector, the X-ray detector includes a substrate and a photosensitive device, the photosensitive device is provided on the light entrance side of the X-ray detector to sense the light intensity of X-rays, And converted into electrical signals;
    所述X射线探测器还包括:The X-ray detector also includes:
    信号读取元件,所述信号读取元件设于所述基板上且与所述感光器件电连接,以接收并读取所述感光器件转换后的电信号;A signal reading element provided on the substrate and electrically connected to the photosensitive device to receive and read the converted electrical signal of the photosensitive device;
    其中,所述感光器件包括:Wherein, the photosensitive device includes:
    感光层,所述感光层由多个填充物堆叠而成,所述填充物为均匀分布的纳米孔结构,且所述纳米孔结构内填充有气态硒;A photosensitive layer, the photosensitive layer is formed by stacking a plurality of fillers, the fillers are uniformly distributed nanopore structures, and the nanopore structures are filled with gaseous selenium;
    第一电极,所述第一电极设于所述感光层的入光侧;以及A first electrode provided on the light incident side of the photosensitive layer; and
    第二电极,所述第二电极设于所述感光层的出光侧。A second electrode provided on the light exit side of the photosensitive layer.
  20. 根据权利要求19所述的显示装置,其中,所述显示装置还包括成像装置,所述成像装置与所述信号读取元件电连接。The display device according to claim 19, wherein the display device further comprises an imaging device electrically connected to the signal reading element.
PCT/CN2019/129308 2019-01-11 2019-12-27 Light-sensitive device, x-ray detector and display apparatus WO2020143484A1 (en)

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Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109860329B (en) * 2019-01-11 2020-12-22 惠科股份有限公司 Photosensitive device, X-ray detector and medical equipment
CN116806370A (en) * 2022-01-25 2023-09-26 京东方科技集团股份有限公司 Detection substrate and radiation detector

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1336785A (en) * 2000-03-29 2002-02-20 新电元工业株式会社 X rays testing plate
US20050092992A1 (en) * 2000-03-07 2005-05-05 Sharp Kabushiki Kaisha Image sensor and method of manufacturing the same
US20150063543A1 (en) * 2013-09-02 2015-03-05 Samsung Electronics Co., Ltd. Radiation detectors, methods of manufacturing the radiation detectors, and radiation imaging systems including the radiation detectors
CN104823280A (en) * 2012-12-10 2015-08-05 富士胶片株式会社 Radiation detector
CN105514029A (en) * 2016-01-20 2016-04-20 京东方科技集团股份有限公司 Pixel structure of X-ray flat-panel detector, manufacturing method of pixel structure of X-ray flat-panel detector and camera system
CN109860329A (en) * 2019-01-11 2019-06-07 惠科股份有限公司 Sensor devices, X-ray detector and medical equipment

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6507026B2 (en) * 2000-01-12 2003-01-14 Kabushiki Kaisha Toshiba Planar X-ray detector
JP2001255376A (en) * 2000-03-08 2001-09-21 Shindengen Electric Mfg Co Ltd Radiation detector
JP2008288318A (en) * 2007-05-16 2008-11-27 Fujifilm Corp Radiographic image detector
US7977643B2 (en) * 2008-01-14 2011-07-12 Irving Weinberg Radiation detector assembly, radiation detector, and method for radiation detection
WO2014072833A2 (en) * 2012-11-09 2014-05-15 Nanoco Technologies, Ltd. Molybdenum substrates for cigs photovoltaic devices
US20150007890A1 (en) * 2013-07-08 2015-01-08 Tsmc Solar Ltd. Photovoltaic device comprising heat resistant buffer layer, and method of making the same
US9306098B2 (en) * 2014-01-24 2016-04-05 Tsmc Solar Ltd. Method of making photovoltaic device comprising an absorber having a surface layer
US10158035B2 (en) * 2015-04-22 2018-12-18 Sumitomo Electric Industries, Ltd. Semiconductor stack, light-receiving device, and method for producing semiconductor stack
US10020235B2 (en) * 2016-11-01 2018-07-10 Lawrence Livermore National Security, Llc Selective surface treatment of thallium bromide (TLBR)-based detectors to improve longevity and/or restore operational capacity thereof
CN109755332B (en) * 2018-12-11 2020-10-16 惠科股份有限公司 Photoreceptor, panel and manufacturing method of photoreceptor

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050092992A1 (en) * 2000-03-07 2005-05-05 Sharp Kabushiki Kaisha Image sensor and method of manufacturing the same
CN1336785A (en) * 2000-03-29 2002-02-20 新电元工业株式会社 X rays testing plate
CN104823280A (en) * 2012-12-10 2015-08-05 富士胶片株式会社 Radiation detector
US20150063543A1 (en) * 2013-09-02 2015-03-05 Samsung Electronics Co., Ltd. Radiation detectors, methods of manufacturing the radiation detectors, and radiation imaging systems including the radiation detectors
CN105514029A (en) * 2016-01-20 2016-04-20 京东方科技集团股份有限公司 Pixel structure of X-ray flat-panel detector, manufacturing method of pixel structure of X-ray flat-panel detector and camera system
CN109860329A (en) * 2019-01-11 2019-06-07 惠科股份有限公司 Sensor devices, X-ray detector and medical equipment

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