WO2020140570A1 - 压电式麦克风 - Google Patents
压电式麦克风 Download PDFInfo
- Publication number
- WO2020140570A1 WO2020140570A1 PCT/CN2019/113284 CN2019113284W WO2020140570A1 WO 2020140570 A1 WO2020140570 A1 WO 2020140570A1 CN 2019113284 W CN2019113284 W CN 2019113284W WO 2020140570 A1 WO2020140570 A1 WO 2020140570A1
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- WIPO (PCT)
- Prior art keywords
- piezoelectric
- cantilever beam
- diaphragm
- support
- piezoelectric cantilever
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Classifications
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R17/00—Piezoelectric transducers; Electrostrictive transducers
- H04R17/02—Microphones
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R2201/00—Details of transducers, loudspeakers or microphones covered by H04R1/00 but not provided for in any of its subgroups
- H04R2201/003—Mems transducers or their use
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/02—Diaphragms for electromechanical transducers; Cones characterised by the construction
- H04R7/04—Plane diaphragms
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
- H04R7/00—Diaphragms for electromechanical transducers; Cones
- H04R7/16—Mounting or tensioning of diaphragms or cones
Definitions
- the invention relates to the field of acoustoelectric conversion, in particular to a piezoelectric microphone.
- the traditional MEMS microphone is mainly a condenser microphone, which includes a substrate, a back plate and a diaphragm formed on the substrate.
- the diaphragm and the back plate constitute a capacitor system.
- the vibration of the sound wave will drive the diaphragm of the microphone to reciprocate, thereby changing the distance between the diaphragm and the back plate and the capacitance value of the panel.
- By detecting changes in capacitance you can convert sound signals into electrical signals.
- the manufacturing process of the piezoelectric microphone is simple. Because the design structure of the single-layer membrane is not restricted by the air damping, the SNR is naturally improved. In addition, the piezoelectric microphone only contains the diaphragm and does not contain the back plate, which fundamentally eliminates the harm caused by the particulate matter and water vapor in the air to the microphone, and greatly improves the reliability of the microphone.
- many of the diaphragms of the diaphragm of the piezoelectric microphone are a cantilever beam structure with one end fixed and one end free.
- the sound pressure causes the cantilever beam to deform and produce a voltage change, thereby Perceive acoustic signals.
- the piezoelectric microphone in the related art is not provided with a supporting structure.
- the cantilever beam structure undergoes a large deformation
- the cantilever beam often suffers from stress due to the weak material of the diaphragm. The concentrated place is broken, which greatly affects the stability of the piezoelectric microphone.
- the present invention provides a piezoelectric microphone with better stability .
- a piezoelectric microphone includes a substrate with a back cavity and a piezoelectric cantilever beam diaphragm fixed on the substrate.
- the piezoelectric cantilever beam diaphragm includes a fixed end fixedly connected to the substrate and the The fixed end is connected and suspended at the movable end above the back cavity, the piezoelectric microphone further includes a support back plate, the support back plate includes a spaced opposite to the movable end of the piezoelectric cantilever beam diaphragm A support arm and a fixed arm fixing the support arm.
- the support arm is disposed on a side of the piezoelectric cantilever beam diaphragm away from the back cavity.
- the fixed arm is fixed to the fixed end of the base or the piezoelectric cantilever beam diaphragm.
- the extending direction of the fixed arm is perpendicular to the extending direction of the supporting arm.
- the support arm is disposed on a side of the piezoelectric cantilever beam diaphragm close to the back cavity, and the piezoelectric microphone further includes the support back plate and the piezoelectric cantilever beam diaphragm
- the spacing layer between the fixed ends makes the movable end of the piezoelectric cantilever beam diaphragm and the support arm of the support back plate spaced apart.
- the supporting backplate includes a first supporting backplate disposed on a side of the piezoelectric cantilever beam diaphragm away from the back cavity and a side of the piezoelectric cantilever diaphragm near the back cavity
- the second support backplane, the piezoelectric microphone further includes a spacer layer disposed between the second support backplane and the fixed end of the piezoelectric cantilever beam diaphragm.
- the piezoelectric cantilever beam diaphragm is composed of a plurality of diaphragms of the same size, and each adjacent two of the diaphragms are arranged at intervals, and each of the diaphragms includes a fixed connection with the substrate The fixed end and the movable end opposite to the fixed end.
- all four flaps have a triangular structure, and the four flaps surround the piezoelectric cantilever beam diaphragm into a rectangular structure.
- the four diaphragms there are four diaphragms, all of which have a fan-shaped structure, and the four diaphragms surround the piezoelectric cantilever beam diaphragm into a circular structure.
- the support arm supporting the back plate has a hollow ring structure.
- the piezoelectric microphone of the present invention is provided with the supporting back plate, so that under a large sound pressure, when the piezoelectric cantilever beam diaphragm undergoes a large deformation, the supporting back plate can
- the piezoelectric cantilever beam diaphragm provides certain support protection to prevent the piezoelectric cantilever beam diaphragm from being broken, thereby increasing the stability of the piezoelectric microphone.
- Embodiment 1 is a schematic structural diagram of Embodiment 1 of a piezoelectric microphone provided by the present invention
- FIG. 2 is a cross-sectional view taken along line A-A shown in FIG. 1;
- FIG. 3 is a cross-sectional view of a second embodiment of a piezoelectric microphone provided by the present invention.
- FIG. 4 is a cross-sectional view of a third embodiment of a piezoelectric microphone provided by the present invention.
- FIG. 5 is a schematic structural diagram of Embodiment 4 of a piezoelectric microphone provided by the present invention.
- This embodiment provides a piezoelectric microphone 100 including a base 20 having a back cavity 10, a piezoelectric cantilever beam diaphragm 30 fixed on the base 20, and a supporting back plate fixed on the base 20 40.
- the piezoelectric cantilever beam diaphragm 30 is composed of four diaphragms 31 of the same size, and each adjacent diaphragm 31 is spaced apart.
- the four flaps 31 all have a triangular structure, and the four flaps 31 surround the piezoelectric cantilever diaphragm 30 into a rectangular structure.
- the diaphragm 31 is provided with four and all are triangular structures, and the piezoelectric cantilever diaphragm 30 is enclosed into a rectangular structure.
- the number of the flaps 31 may be any desired number, and the structure of the flaps 31 may be any shape, and at the same time, the flaps 31 use the piezoelectric cantilever diaphragm 30
- the enclosed structure can also be of any shape. In this embodiment, only the rectangular piezoelectric cantilever diaphragm 30 surrounded by the four triangular flaps 31 will be described as an example.
- the valve flap 31 includes a fixed end 311 fixedly connected to the base 10 and a movable end 312 connected to the fixed end 311 and suspended above the back cavity 10.
- the support backboard 40 includes a fixed arm 41 fixedly connected to the base 20 and a support arm 42 connected to the fixed arm 41.
- the support arm 42 of the support backboard 40 is a hollow ring structure.
- the support arm 42 is located on the side of the piezoelectric cantilever beam 30 away from the back cavity 10, and the support arm 42 is spaced from the movable end 312 of the piezoelectric cantilever beam 30 Settings.
- the support arm 42 is used to provide a certain support protection for the piezoelectric cantilever diaphragm 30 when the piezoelectric cantilever diaphragm 30 undergoes a large deformation to prevent the piezoelectric cantilever diaphragm 30 from breaking .
- the extending direction of the fixed arm 41 is perpendicular to the extending direction of the supporting arm 42.
- the fixing arm 41 is fixed on the base 20.
- the fixed arm 41 may be fixed to the edge of the piezoelectric cantilever beam diaphragm 30, that is, to the fixed end 311. That is to say, the support back plate 40 can be fixed at any position, as long as the support back plate 40 can produce a protective effect on the piezoelectric cantilever beam diaphragm 30.
- the support arm 42 includes a connection end 421 connected to the fixed arm 41 and a support end 422 connected to an end of the connection end 421 away from the fixed arm 41, and a plurality of the support ends 422 are staggered to form a mesh structure .
- the four supporting ends 422 are staggered together to form a “well” shape structure.
- the supporting ends 422 are alternately arranged to form a “well” type structure.
- the number of the supporting ends 422 may be any number, and a plurality of the supporting ends 422 may also constitute any structure. That is, the present invention does not limit the number and arrangement of the support ends 422, as long as the support back plate 40 can protect the piezoelectric cantilever beam 30.
- a piezoelectric microphone 200 which includes a substrate 120 having a back cavity 110, a piezoelectric cantilever diaphragm 130, a supporting back plate 140, and a spacer layer 150.
- the spacer layer 150 is disposed between the supporting back plate 140 and the fixed end of the piezoelectric cantilever beam diaphragm 130, so that the movable end of the piezoelectric cantilever beam diaphragm 130 and the supporting back plate 140 Support arms are set at intervals.
- the structure of the piezoelectric cantilever beam diaphragm 130 is basically the same as the structure of the piezoelectric cantilever beam diaphragm 30 in the first embodiment.
- the supporting back plate 140 includes a fixing arm 141 fixed to the base 120 and a supporting arm 142 connected to the fixing arm 141.
- the support arm 142 is disposed opposite to the piezoelectric cantilever beam diaphragm 130 at intervals.
- the support arm 142 is used to provide a certain support protection for the piezoelectric cantilever beam diaphragm 130 when the piezoelectric cantilever beam diaphragm 130 undergoes a large deformation to prevent the piezoelectric cantilever beam diaphragm 130 from being broken .
- the fixed arm 141 is located between the substrate 120 and the spacer layer 150, and the support arm 142 is located on the side of the piezoelectric cantilever beam diaphragm 130 close to the back cavity 110.
- the support back plate 140 is fixedly connected to the base 120.
- the supporting back plate 140 may be fixedly connected to the piezoelectric cantilever beam diaphragm 130. That is, the fixing method of the supporting back plate 140 is not limited in the present invention, as long as the supporting back plate 140 can play a protective effect on the piezoelectric cantilever diaphragm 130.
- a piezoelectric microphone 300 which includes a substrate 220 having a back cavity 210, a piezoelectric cantilever diaphragm 230, a first support back plate 240, a second support back plate 250, and a spacer layer 260.
- the first supporting back plate 240 is disposed on a side of the piezoelectric cantilever diaphragm 230 away from the back cavity 210
- the second supporting back plate 250 is disposed on the piezoelectric cantilever diaphragm 230 near the
- the spacer layer 260 is disposed between the second support back plate 250 and the fixed end of the piezoelectric cantilever beam diaphragm 230.
- the structures of the piezoelectric cantilever beam diaphragm 230 and the first supporting back plate 240 are basically the same as the structures of the piezoelectric cantilever beam diaphragm 30 and the supporting back plate 40 in the first embodiment.
- the first supporting back plate 240 is fixed on the spacer layer 260.
- the structure of the second support back plate 250 is the same as the structure of the support back plate 140 in the second embodiment.
- first supporting back plate 240 and the second supporting back plate 250 are all fixedly connected to the spacer layer 260.
- the first supporting back plate 240 and the second supporting back plate 250 may be fixedly connected to the piezoelectric cantilever beam diaphragm 230. That is, the fixing method of the first support back plate 240 and the second support back plate 250 is not limited in the present invention, and only the first support back plate 240 and the second support back plate 250 can fix the The piezoelectric cantilever beam diaphragm 230 may have a protective effect.
- This embodiment provides a piezoelectric microphone 400.
- the structure of the piezoelectric microphone 400 is basically the same as the structure of the piezoelectric microphone 100 described in the first embodiment, except for:
- the piezoelectric cantilever beam diaphragm 330 is composed of four diaphragm 331 having a fan-shaped structure, and the four diaphragm 331 surrounds the piezoelectric cantilever diaphragm 330 into a circular structure. Every two adjacent flaps 331 are arranged at intervals.
- the support backboard 340 includes a fixed arm 341 fixed to the base 320 and a support arm 342 connected to the fixed arm 341.
- the support arm 342 includes a connection end 3421 connected to the fixed arm 341 and a support end 3422 connected to an end of the connection end 3421 away from the fixed arm 341.
- the support end 3422 faces the piezoelectric cantilever beam diaphragm 330 The orthographic projection above completely falls into the area enclosed by the four flaps 331.
- the supporting end 3422 has a ring shape, and the center of the supporting end 3422 is on the same straight line as the center of the piezoelectric cantilever diaphragm 330, and there are four connecting ends 3421, four of which The orthographic projections of the connection end 3421 onto the piezoelectric cantilever beam diaphragm 330 respectively correspond to the gaps between every two adjacent flaps 331.
- the piezoelectric microphone of the present invention is provided with the supporting back plate, so that under a large sound pressure, when the piezoelectric cantilever beam diaphragm undergoes a large deformation, the supporting back plate can
- the piezoelectric cantilever beam diaphragm provides certain support protection to prevent the piezoelectric cantilever beam diaphragm from being broken, thereby increasing the stability of the piezoelectric microphone.
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Piezo-Electric Transducers For Audible Bands (AREA)
Abstract
本发明提供了一种压电式麦克风,包括具有背腔的基底及固定于所述基底上的压电悬臂梁振膜,所述压电悬臂梁振膜包括与所述基底固定连接的固定端及与所述固定端连接并悬置于所述背腔上方的活动端,所述压电式麦克风还包括支撑背板,所述支撑背板包括与所述压电悬臂梁振膜的活动端间隔相对设置的支撑臂以及固定所述支撑臂的固定臂。与相关技术相比,本发明提供的压电式麦克风的稳定性更佳。
Description
本发明涉及声电转换领域,尤其涉及一种压电式麦克风。
MEMS麦克风现已应用普及在消费性电子产品中。传统的MEMS麦克风主要为电容式麦克风,其包括基底以及形成在基底上的背板、振膜。所述振膜与背板构成了电容系统。声波的振动会带动麦克风的振膜做往复振动,进而改变振膜和背板之间的距离以及平板电容值。通过检测电容的变化,就可以把声音信号转换为电信号。当移动设备处于多尘环境中,空气中的颗粒物容易进入并卡在麦克风的振膜和背板之间,导致振膜无法移动;当移动设备处于潮湿环境中,麦克风的振膜和背板之间容易凝结水珠,从而使得振膜和背板被水珠粘连。以上两种情况均会导致麦克风失效。为了避免此类问题,压电式MEMS麦克风应运而生。
压电式麦克风的制作工艺简单,因采用单层膜的设计架构使其不受空气阻尼的限制,SNR自然提升。此外压电式麦克风只包含振膜,不包含背板,从根本上杜绝了空气中的颗粒物和水汽对麦克风带来的危害,极大地提高了麦克风的可靠性。
相关技术中的压电式麦克风的振膜的膜瓣很多都是一端固定一端自由的悬臂梁结构,当外部的声音信号从声孔中传入,声压引起悬臂梁形变,产生电压变化,从而感知声学信号。
然而,相关技术中的压电式麦克风并未设置支撑结构,当压电式麦克风受到较大的声压悬臂梁结构发生较大形变时,由于振膜的材料较为脆弱,悬臂梁常常会从应力集中的地方折断,这样极大的影响到了压电式麦克风的稳定性。
因此,有必要提供一种改进的压电式麦克风来解决上述问题。
针对相关技术中的压电式麦克风在受到较大声压下,振膜容易发生断裂,从而影响压电式麦克风的稳定性的技术问题,本发明提供了一种稳定性更佳的压电式麦克风。
一种压电式麦克风,包括具有背腔的基底及固定于所述基底上的压电悬臂梁振膜,所述压电悬臂梁振膜包括与所述基底固定连接的固定端及与所述固定端连接并悬置于所述背腔上方的活动端,所述压电式麦克风还包括支撑背板,所述支撑背板包括与所述压电悬臂梁振膜的活动端间隔相对设置的支撑臂以及固定所述支撑臂的固定臂。
优选的,所述支撑臂设置于所述压电悬臂梁振膜远离所述背腔的一侧。
优选的,所述固定臂固定于所述基底或所述压电悬臂梁振膜的固定端。
优选的,所述固定臂的延伸方向垂直于所述支撑臂的延伸方向。
优选的,所述支撑臂设置于所述压电悬臂梁振膜靠近所述背腔的一侧,所述压电式麦克风还包括设置于所述支撑背板与所述压电悬臂梁振膜固定端之间的间隔层,从而使得所述压电悬臂梁振膜的活动端与所述支撑背板的支撑臂间隔设置。
优选的,所述支撑背板包括设置于所述压电悬臂梁振膜远离所述背腔一侧的第一支撑背板以及设置于所述压电悬臂梁振膜靠近所述背腔一侧的第二支撑背板,所述压电式麦克风还包括设置于所述第二支撑背板与所述压电悬臂梁振膜固定端之间的间隔层。
优选的,所述压电悬臂梁振膜由若干大小相同的膜瓣共同组成,且每两相邻所述膜瓣之间间隔设置,各所述膜瓣均包括与所述基底固定连接的所述固定端及与所述固定端相对的所述活动端。
优选的,所述膜瓣为四个,四个所述膜瓣均呈三角形结构,四个所述膜瓣将所述压电悬臂梁振膜围成矩形结构。
优选的,所述膜瓣为四个,四个所述膜瓣均呈扇形结构,四个所述膜瓣将所述压电悬臂梁振膜围成圆形结构。
优选的,所述支撑背板的支撑臂为空心环状结构。
与相关技术相比,本发明的压电式麦克风通过设置所述支撑背板,使得在较大声压下,所述压电悬臂梁振膜发生较大形变时,所述支撑背板可以对所述压电悬臂梁振膜提供一定的支撑保护,防止所述压电悬臂梁振膜折断,从而增加了所述压电式麦克风的稳定性。
为了更清楚地说明本发明实施例中的技术方案,下面将对实施例描述中所需要使用的附图作简单地介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据这些附图获得其它的附图,其中:
图1为本发明提供的压电式麦克风实施例一的结构示意图;
图2为沿图1所示A-A线的剖视图;
图3为本发明提供的压电式麦克风实施例二的剖视图;
图4为本发明提供的压电式麦克风实施例三的剖视图;
图5为本发明提供的压电式麦克风实施例四的结构示意图。
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明的一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例,都属于本发明保护的范围。
实施例一
请结合参阅图1和图2。本实施例提供了一种压电式麦克风100,其包括具有背腔10的基底20、固定于所述基底20上的压电悬臂梁振膜30及固定于所述基底20上的支撑背板40。
所述压电悬臂梁振膜30由四个大小相同的膜瓣31共同组成,且每相邻所述膜瓣31之间间隔设置。在本实施例中,四个所述膜瓣31均呈三角形结构,且四个所述膜瓣31将所述压电悬臂梁振膜30围成矩形结构。
需要说明的是,在本实施例中所述膜瓣31设有四个且均为三角形结构,并将所述压电悬臂梁振膜30围成矩形结构。当然,在其他实施例中,所述膜瓣31数量可为任意所需数量,并且所述膜瓣31结构也可为任意形状,同时所述膜瓣31将所述压电悬臂梁振膜30围成的结构也可为任意形状。在本实施例中仅以四片三角形的所述膜瓣31围成的矩形的所述压电悬臂梁振膜30为例进行说明。
所述膜瓣31包括与所述基底10固定连接的固定端311及与所述固定端311连接并悬置于所述背腔10上方的活动端312。
所述支撑背板40包括与所述基底20固定连接的固定臂41及与所述固定臂41连接的支撑臂42。所述支撑背板40的支撑臂42为空心环状结构。所述支撑臂42位于所述压电悬臂梁振膜30的远离所述背腔10的一侧,且所述支撑臂42与所述压电悬臂梁振膜30的所述活动端312间隔相对设置。所述支撑臂42用于在所述压电悬臂梁振膜30产生较大形变时对所述压电悬臂梁振膜30提供一定的支撑保护,防止所述压电悬臂梁振膜30发生折断。
所述固定臂41的延伸方向垂直于所述支撑臂42的延伸方向。
需要说明的是,在本实施例中所述固定臂41固定于所述基底20上。当然,在其他实施例中,所述固定臂41可以固定于所述压电悬臂梁振膜30边缘,即固定于所述固定端311。也就是说,所述支撑背板40可固定于任意位置,只需能实现所述支撑背板40能对所述压电悬臂梁振膜30产生保护效果即可。
所述支撑臂42包括与所述固定臂41连接的连接端421及与所述连接端421远离所述固定臂41一端连接的支撑端422,多个所述支撑端422交错设置形成网状结构。
在本实施例中,四个所述支撑端422交错设置共同组成“井”字型结构。
需要说明的是,在本实施例中,所述支撑端422交错设置共同组成“井”字型结构。当然,在其他实施例中,所述支撑端422可为任意数量,同时多个所述支撑端422也可组成任意结构。即本发明对所述支撑端422的数量和设置方式均不作限定,只需所述支撑背板40能对所述压电悬臂梁振膜30起到保护效果即可。
实施例二
请结合参阅图3。本实施例中提供了一种压电式麦克风200,其包括具有背腔110的基底120、压电悬臂梁振膜130、支撑背板140及间隔层150。所述间隔层150设置于所述支撑背板140与所述压电悬臂梁振膜130固定端之间,从而使得所述压电悬臂梁振膜130的活动端与所述支撑背板140的支撑臂间隔设置。
所述压电悬臂梁振膜130的结构与实施例一中的所述压电悬臂梁振膜30结构基本相同。
所述支撑背板140包括与所述基底120固定的固定臂141及与所述固定臂141连接的支撑臂142。所述支撑臂142与所述压电悬臂梁振膜130间隔相对设置。所述支撑臂142用于在所述压电悬臂梁振膜130产生较大形变时对所述压电悬臂梁振膜130提供一定的支撑保护,防止所述压电悬臂梁振膜130发生折断。
具体的,所述固定臂141位于所述基底120与所述间隔层150之间,所述支撑臂142位于所述压电悬臂梁振膜130的靠近所述背腔110的一侧。
需要说明的是,在本实施例中,所述支撑背板140与所述基底120固定连接。当然,在其他实施例中,所述支撑背板140可与所述压电悬臂梁振膜130固定连接。即所述支撑背板140的固定方式本发明并不作限定,只需所述支撑背板140能对所述压电悬臂梁振膜130起到保护效果即可。
实施例三
请结合参阅图4。本实施例中提供了一种压电式麦克风300,其包括具有背腔210的基底220、压电悬臂梁振膜230第一支撑背板240、第二支撑背板250及间隔层260。所述第一支撑背板240设置于所述压电悬臂梁振膜230远离所述背腔210一侧,所述第二支撑背板250设置于所述压电悬臂梁振膜230靠近所述背腔210一侧,所述间隔层260设置于所述第二支撑背板250与所述压电悬臂梁振膜230固定端之间。
所述压电悬臂梁振膜230与所述第一支撑背板240的结构与实施例一中所述压电悬臂梁振膜30与所述支撑背板40的结构基本相同。在本实施例中所述第一支撑背板240固定于所述间隔层260上。
所述第二支撑背板250的结构与实施例二中所述支撑背板140的结构相同。
需要说明的是,在本实施例中,所述第一支撑背板240 、所述第二支撑背板250均与所述间隔层260固定连接。当然,在其他实施例中,所述第一支撑背板240、所述第二支撑背板250可与所述压电悬臂梁振膜230固定连接。即所述第一支撑背板240、所述第二支撑背板250的固定方式本发明并不作限定,只需所述第一支撑背板240、所述第二支撑背板250能对所述压电悬臂梁振膜230起到保护效果即可。
实施例四
请结合参阅图5。本实施例提供了一种压电式麦克风400,所述压电式麦克风400的结构与实施例一中所述压电式麦克风100的结构基本相同,不同点在于:
在本实施例中,压电悬臂梁振膜330由四个呈扇形结构的膜瓣331组成,四个所述膜瓣331将所述压电悬臂梁振膜330围成圆形结构。每相邻两所述膜瓣331之间间隔设置。
支撑背板340包括与基底320固定的固定臂341及与固定臂341连接的支撑臂342。
所述支撑臂342包括与固定臂341连接的连接端3421及与所述连接端3421远离所述固定臂341一端连接的支撑端3422,所述支撑端3422向所述压电悬臂梁振膜330上的正投影完全落入四个所述膜瓣331所围成的区域内。
具体的,所述支撑端3422呈环形,且所述支撑端3422的圆心与所述压电悬臂梁振膜330的圆心位于同一直线上,所述连接端3421设有四个,四个所述连接端3421向所述压电悬臂梁振膜330上的正投影分别对应位于每两相邻的所述膜瓣331的间隙处。
与相关技术相比,本发明的压电式麦克风通过设置所述支撑背板,使得在较大声压下,所述压电悬臂梁振膜发生较大形变时,所述支撑背板可以对所述压电悬臂梁振膜提供一定的支撑保护,防止所述压电悬臂梁振膜折断,从而增加了所述压电式麦克风的稳定性。
以上所述的仅是本发明的实施方式,在此应当指出,对于本领域的普通技术人员来说,在不脱离本发明创造构思的前提下,还可以做出改进,但这些均属于本发明的保护范围。
Claims (10)
- 一种压电式麦克风,包括具有背腔的基底及固定于所述基底上的压电悬臂梁振膜,所述压电悬臂梁振膜包括与所述基底固定连接的固定端及与所述固定端连接并悬置于所述背腔上方的活动端,其特征在于,所述压电式麦克风还包括支撑背板,所述支撑背板包括与所述压电悬臂梁振膜的活动端间隔相对设置的支撑臂以及固定所述支撑臂的固定臂。
- 根据权利要求1所述的压电式麦克风,其特征在于,所述支撑臂设置于所述压电悬臂梁振膜远离所述背腔的一侧。
- 根据权利要求2所述的压电式麦克风,其特征在于,所述固定臂固定于所述基底或所述压电悬臂梁振膜的固定端。
- 根据权利要求2所述的压电式麦克风,其特征在于,所述固定臂的延伸方向垂直于所述支撑臂的延伸方向。
- 根据权利要求1所述的压电式麦克风,其特征在于,所述支撑臂设置于所述压电悬臂梁振膜靠近所述背腔的一侧,所述压电式麦克风还包括设置于所述支撑背板与所述压电悬臂梁振膜固定端之间的间隔层,从而使得所述压电悬臂梁振膜的活动端与所述支撑背板的支撑臂间隔设置。
- 根据权利要求1所述的压电式麦克风,其特征在于,所述支撑背板包括设置于所述压电悬臂梁振膜远离所述背腔一侧的第一支撑背板以及设置于所述压电悬臂梁振膜靠近所述背腔一侧的第二支撑背板,所述压电式麦克风还包括设置于所述第二支撑背板与所述压电悬臂梁振膜固定端之间的间隔层。
- 根据权利要求1所述的压电式麦克风,其特征在于,所述压电悬臂梁振膜由若干大小相同的膜瓣共同组成,且每两相邻所述膜瓣之间间隔设置,各所述膜瓣均包括与所述基底固定连接的所述固定端及与所述固定端相对的所述活动端。
- 根据权利要求7所述的压电式麦克风,其特征在于,所述膜瓣为四个,四个所述膜瓣均呈三角形结构,四个所述膜瓣将所述压电悬臂梁振膜围成矩形结构。
- 根据权利要求7所述的压电式麦克风,其特征在于,所述膜瓣为四个,四个所述膜瓣均呈扇形结构,四个所述膜瓣将所述压电悬臂梁振膜围成圆形结构。
- 根据权利要求1所述的压电式麦克风,其特征在于,所述支撑背板的支撑臂为空心环状结构。
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| DE102019116080A1 (de) * | 2019-06-13 | 2020-12-17 | USound GmbH | MEMS-Schallwandler mit einer aus Polymer ausgebildeten Membran |
| CN111372178B (zh) * | 2019-12-15 | 2022-01-11 | 瑞声科技(新加坡)有限公司 | 一种mems麦克风、阵列结构及加工方法 |
| CN111405441B (zh) * | 2020-04-16 | 2021-06-15 | 瑞声声学科技(深圳)有限公司 | 一种压电式mems麦克风 |
| CN111682097B (zh) * | 2020-06-12 | 2022-05-31 | 瑞声声学科技(深圳)有限公司 | 一种压电结构及压电装置 |
| CN111918179B (zh) * | 2020-07-10 | 2021-07-09 | 瑞声科技(南京)有限公司 | 发声装置及具有其的电子设备 |
| KR102941737B1 (ko) * | 2020-12-28 | 2026-03-23 | 썬전 샥 컴퍼니, 리미티드 | 진동센서 |
| CN113115188B (zh) * | 2021-03-29 | 2023-07-04 | 瑞声声学科技(深圳)有限公司 | Mems压电麦克风 |
| CN220123070U (zh) * | 2023-06-07 | 2023-12-01 | 瑞声声学科技(深圳)有限公司 | 一种振膜及mems麦克风 |
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| CN104602170B (zh) * | 2008-06-30 | 2019-08-13 | 密歇根大学董事会 | 压电mems麦克风 |
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| CN206948611U (zh) * | 2017-06-16 | 2018-01-30 | 歌尔科技有限公司 | 一种压电麦克风 |
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| EP3070963A1 (fr) * | 2015-03-20 | 2016-09-21 | Commissariat à l'Énergie Atomique et aux Énergies Alternatives | Capteur de pression dynamique mems et/ou nems a performances améliorées et microphone comportant un tel capteur |
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| CN109803217A (zh) * | 2018-12-31 | 2019-05-24 | 瑞声声学科技(深圳)有限公司 | 压电式麦克风 |
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| US20200213769A1 (en) | 2020-07-02 |
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