WO2020133531A1 - X-ray dual-phase grating phase-contrast imaging system - Google Patents

X-ray dual-phase grating phase-contrast imaging system Download PDF

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WO2020133531A1
WO2020133531A1 PCT/CN2018/125859 CN2018125859W WO2020133531A1 WO 2020133531 A1 WO2020133531 A1 WO 2020133531A1 CN 2018125859 W CN2018125859 W CN 2018125859W WO 2020133531 A1 WO2020133531 A1 WO 2020133531A1
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grating
phase
phase grating
source
ray
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PCT/CN2018/125859
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Chinese (zh)
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李冀
雷耀虎
黄建衡
刘鑫
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深圳大学
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/041Phase-contrast imaging, e.g. using grating interferometers

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  • the invention relates to a phase contrast imaging system, in particular to an X-ray dual phase grating phase contrast imaging system.
  • phase contrast imaging technology based on the Tiberau interferometer can provide absorption contrast, phase contrast and dark contrast while rid of the dependence on the synchrotron radiation source.
  • image of the multi-contrast mechanism such as field image, reflecting the internal structure of the object, is a major change in X-ray imaging technology. It has clinical early diagnosis of lesions, the characterization of polymers in materials science, industrial and safe nondestructive testing, etc. Potential application value.
  • F. Pfeiffer et al. modified the Taber interferometer based on the Taber-Laur principle and proposed to use a common X-ray source and absorption grating to form a spatially coherent array X-ray source. This not only solves the problem of partial coherent light illumination, but also improves the brightness of the light source at the same time. It is an X-ray Taber-Laur interferometer. It makes the technology get rid of the dependence on synchrotron radiation source, and may enter ordinary laboratories or even clinical, becoming a research hotspot in this field.
  • the geometric conditions of the spatial coherence of the X-ray source require that the period of the beam splitting grating be in the range of several microns. In this way, the period of "self-imaging" is also a few microns (slightly larger).
  • the pixels of ordinary X-ray image detectors are in the range of 20-200 microns, that is, it is impossible to directly record such interference fringes, let alone the shear variables of fringes.
  • the existing interference fringe and shear detection method is to introduce another absorption grating to sample the interference fringe with a small period, that is, to form a moiré fringe to amplify the shear variable and record it.
  • absorption gratings reduces the photon utilization efficiency, resulting in deterioration of the signal-to-noise ratio of the image signal or prolonged exposure time.
  • recording isophase lines without relying on the absorption grating, that is, enlarging the fringe period is the best way to solve this dilemma.
  • the technical problem to be solved by the present invention is to provide an X-ray dual phase grating phase contrast imaging system, which can avoid the use of a small period, high aspect ratio source grating and a large area, small period, high aspect ratio absorption grating, Reduce the difficulty of realizing grating phase contrast imaging system.
  • An X-ray dual-phase grating phase contrast imaging system includes an X-ray tube, a source grating G 0 , a phase grating and an X-ray detector arranged in sequence along the X-ray emission direction, the phase grating includes first phase gratings G arranged at intervals 1 and a second phase grating G′ 1 , the first phase grating G 1 and the second phase grating G′ 1 are located between the source grating G 0 and the X-ray detector, and form a self-imaging after the first phase grating G 1
  • the secondary source G 2 ; the X-rays emitted by the X-ray tube, the source grating G 0 and the first phase grating G 1 form a Tiberium system; the self-imaging secondary source G 2 and the second phase grating G′ 1 Formed the inverse Tiberium system.
  • the position and period of the first phase grating G 1 satisfy that the coherence length of the X-ray propagating to the first phase grating G 1 after passing through the source grating G 0 is not less than The period of the first phase grating G 1 ; the position and period of the second phase grating G′ 1 satisfy: the coherence length propagated from the imaging secondary source G 2 to the second phase grating G′ 1 is not less than the second phase grating G′ 1 cycle
  • the secondary source G 2 is located at the Taber distance of the first phase grating G 1 .
  • p 1 is the period of the first phase grating G 1
  • R 1 is the distance between the source grating G 0 and the first phase grating G 1
  • is the wavelength of the X-ray
  • k is a constant, and for the phase of ⁇ /2
  • the periods of the first phase grating G 1 and the second phase grating G′ 1 are the same; between the source grating G 0 and the first phase grating G 1 R 1 , the distance R 2 ′ between the second phase grating G′ 1 and its self-imaging fringe G′ 2 is equal;
  • the period of the self-imaging fringe of the second phase grating G′ 1 is 20-300 ⁇ m.
  • the source grating G 0 is an absorption grating that modulates incident light into coherent light, or a source grating G 0 structure coupled to the X-ray anode target.
  • the period of the source grating G 0 is 5-50 ⁇ m and the duty ratio is 0.25-0.5; or the period of the source grating G 0 is 1-5 Microns, the duty cycle is 1.
  • the distance between the X-ray tube and the source grating G 0 is 0 mm-100 mm; the distance between the source grating G 0 and the first phase grating G 1 The distance is 5 mm-1000 mm; the distance between the second phase grating G′ 1 and the X-ray detector is 100 mm-2000 mm.
  • the first phase grating G 1 and the second phase grating G′ 1 each include an alternately arranged transmission layer and phase change layer that transmit X-rays.
  • the same absorption as the self-imaging fringe period G′ 2 can be provided at the Taber distance of the second phase grating G′ 1 in front of the X-ray detector Raster.
  • the X-ray tube is an X-ray tube that emits X-ray photons with an energy range of 8 keV-70 keV.
  • the X-ray dual-phase grating phase contrast imaging system of the present invention can realize phase contrast imaging by using an ordinary X-ray source, a large period source grating, and two phase gratings.
  • the first phase The grating G 1 and the second phase grating G′ 1 have a large degree of linkage between the periods of all gratings and the distance between them.
  • the phase grating of the present invention is a dual-phase grating, which is composed of two A single-phase grating phase contrast imaging system is combined to form a Tiberium and inverse Tiberium imaging system.
  • the Tiberium system can provide structured light with a period of micrometers.
  • the inverse Tiberium system can obtain a large period Self-imaging stripes.
  • a large-period absorption grating can be used as a sampling grating, thereby greatly reducing the difficulty of manufacturing an absorption grating with a large area and a high aspect ratio.
  • dual-phase grating phase contrast imaging systems use images (interference fringes) generated by ordinary Taber-Lao systems as "self-imaging secondary sources".
  • the adjustment of the period size of the "self-imaging secondary source” can be obtained by adjusting the period of the source grating and the phase grating of the Taber-Lao system and the distance between them.
  • the second phase grating is used. It is possible to obtain a self-imaging fringe with a large period in a short distance. If the fringes at this time are still not enough to be detected, a large area of absorption grating can be added to assist detection.
  • the aspect ratio is not large, so it is not difficult to manufacture.
  • FIG. 1 is a schematic structural diagram of an embodiment of the present invention
  • FIG. 2 is a schematic structural diagram of another implementation manner of an example of the present invention.
  • FIG. 3 is a schematic diagram of structural analysis of an embodiment of the present invention.
  • Figures 6a-6c are the absorption image, phase contrast image and dark field image in the phase contrast experiment.
  • an X-ray dual-phase grating phase contrast imaging system of the present invention includes an X-ray tube, a source grating G0, a phase grating and an X-ray detector arranged in sequence along the X-ray emission direction.
  • the phase grating The first phase grating G1 and the second phase grating G'1 are arranged at intervals. Specifically, as shown in FIG. 1, from left to right are: X-ray tube, source grating G0, first phase grating G1, second phase grating G′1 and X-ray detector.
  • the first phase grating G1 and the second phase grating G′1 are located between the source grating G0 and the X-ray detector, and the position and period of the first phase grating G1 satisfy: X-rays propagate through the source grating G0
  • the coherence length to the first phase grating G1 is not less than the period of the first phase grating G1.
  • his self-imaging is formed at the Taber distance of the first phase grating G1, that is, the self-imaging secondary source G2 is obtained.
  • This self-imaging secondary source G2 is a virtual source, thereby illuminating the second phase grating G'1.
  • the position of the second phase grating G′1 is related to the period and the period of the virtual source, that is, the position and period of the second phase grating G′1 satisfy: the self-imaging secondary source G2 propagates to the second phase grating G′1
  • the coherence length at is no less than the period of the second phase grating G'1.
  • the above structure of the imaging system of the present invention is actually a Tiberium system and an inverse Tiberium system, wherein the X-rays emitted by the X-ray tube, the source grating G0 and the first phase grating G1 form a Tiberium system, which can provide a period It is micron-level structured light, that is, self-imaging secondary source G2.
  • an inverse Tiberau system is formed by the self-imaging secondary source G2 and the second phase grating G′1, and finally detected by the X-ray detector.
  • This scheme can provide sufficient magnification for the fringes and obtain large-period self-imaging fringes so that they can be directly resolved by the X-ray detector.
  • p0, p1, and p2 are the periods of the source grating G0, the first phase grating G1, and the self-imaging secondary source G2, respectively.
  • the constant ⁇ is 1 or 2, the specific value depends on the first phase grating G1 is ⁇ /2 grating ⁇ grating.
  • the Taber distance R2 of the first phase grating G1 satisfies:
  • p1 is the period of the first phase grating G1
  • R1 is the distance between the source grating G0 and the first phase grating G1
  • is the X-ray wavelength
  • k is a constant
  • the source grating G0 of the Tiberium system modulates the incident light into coherent light that satisfies the imaging conditions, so a self-imaging secondary source will be formed after the first phase grating G1.
  • the self-imaging fringes of these self-imaging secondary sources can be used as the “light source” of the subsequent inverse Tiberau system, that is, as shown in FIG. 3, the self-imaging sub-grid is formed after the first phase grating G1 and before the second phase grating G′1 Level source.
  • the periods of the first phase grating G1 and the second phase grating G′1 may be the same or different.
  • the symmetrically placed Tiberium and inverse Tiberium systems are selected, so that only two specifications of gratings are required, while the traditional Tiberium systems require three specifications of gratings.
  • the invention reduces the number of grating specifications.
  • the period of the self-imaging fringes of the second phase grating G'1 is 20-300 microns.
  • the X-ray tube is selected to produce an X-ray beam with an X-ray energy range of 17 keV to 70 keV, a large radiation flux and a wide emission angle.
  • the source grating G0 is an absorption grating that modulates incident light into coherent light.
  • the source grating G0 has a modulation effect on the X-rays generated by the X-ray tube.
  • the modulated X-rays are a group of parallel line arrays, and each line is an X-ray line source.
  • the structure of the source grating G0 is as follows: a transmission layer and an absorption material layer are alternately arranged on the substrate, and the width ratio of the absorption material layer and the transmission layer is 2:1 to 4:1.
  • the area should cover the entire imaging field of view.
  • the base material is selected from silicon.
  • the shape of the silicon substrate is adapted to the imaging field of view.
  • the absorption material layer is selected from gold, bismuth, gold-tin alloy and other materials.
  • the source grating G0 is a large-period source grating, and the period of the source grating is 5-50 microns, and the duty ratio is 0.25-0.5; for example, the line width of X-rays after modulation by the source grating is 5-100 microns
  • the optimized numerical range is 10-20 microns; its length range is 0.3-2mm, and the optimized range is 0.6-1.2mm.
  • the line emitter array has a duty cycle range of 0.1-0.5 and an optimized duty cycle of 0.2-0.35.
  • the distance between the X-ray tube and the source grating G0 is 0mm-100mm; the distance between the source grating G0 and the first phase grating G1 The distance is 2 mm-1000 mm; the distance between the second phase grating G′1 and the X-ray detector is 100 mm-2000 mm.
  • the positions and sizes of the above devices can be designed and calculated according to actual needs, and any data within the above range can meet the needs of the present invention without specifying a certain data.
  • the first phase grating G1 and the second phase grating G′1 are a microstructure composed of a fully transparent layer and a phase change layer spaced on the base material. That is, it is preferable that the first phase grating G1 and the second phase grating G′1 each include an alternating transmission layer and a phase change layer that transmit X-rays.
  • the phase change layer is made of silicon, aluminum, nickel, gold It is made of other materials, such as air and photoresist.
  • the first phase grating G1 and the second phase grating G′1 have a diffractive effect.
  • the X-rays modulated by the source grating G0 pass through the first phase grating G1 to generate diffraction, which minimizes the 0th order diffracted light energy and ⁇ 1st order diffracted light energy The largest, ⁇ 1st order diffracted light interacts to produce a differential interference effect.
  • the X-ray detector is a flat panel detector or adopts an indirect way to detect X-rays.
  • the X-ray detector is an existing product, which is not described here. Repeat again.
  • an absorption grating G′ 2 is provided in front of the X-ray detector at a Taber distance of the second phase grating G′ 1.
  • the self-imaging fringe period formed by the reverse Tiberau system is relatively large, not less than twice the pixel size of the X-ray detector, That is, it can be directly resolved. In this case, the above-mentioned absorption grating G′ 2 can be omitted.
  • the period of the self-imaging fringes formed by the reverse Tiberau system is less than twice the size of the X-ray detector, then the above absorption grating G′ 2 cannot be omitted.
  • the resolution of the X-ray detector used is still insufficient to resolve the self-imaging fringes formed by the inverse Tiberau system at this position (the advantage of the dual-phase grating imaging system of the present invention is If the fringe period becomes larger (about tens of microns or even larger), an absorption grating G′2 should be used.
  • the period of the absorption grating G′2 is equal to the period of the self-imaging fringes formed by the inverse Tiberau system, as shown in Figure 2 In front of the X-ray detector, there is an absorption grating G′2. In this way, moiré fringes can be formed to facilitate detection by the X-ray detector, and at the same time, the fabrication of the absorption grating G′ 2 with such a large period is also relatively difficult.
  • the present invention is preferably applicable to a large-period source grating G0, and also to a small-period source grating G0.
  • Equation (2) can be transformed into:
  • R1 and R2 can be exchanged, and (1) p0 and p2 can be exchanged, that is, a small period of source grating G0 can obtain a large period of self-imaging fringes.
  • the source grating G0 is a small period source grating G0, and the period of the source grating G0 is 1-5 microns, and the duty ratio is 1.
  • the periods of the first phase grating G1 and the second phase grating G′1 are different; the distance R1 between the source grating G0 and the first phase grating G1, the second The distance R2' between the phase grating G'1 and its self-imaging fringes G'2 is different.
  • an X-ray dual-phase grating phase contrast imaging system includes an X-ray tube and a source grating G0, which are arranged in sequence along the X-ray emission direction (from left to right as shown in FIG. 1).
  • the source grating G0 has a duty ratio of 25%, and a depth of 130 ⁇ m.
  • the absorption grating has a duty ratio of 50% and a depth of 130 ⁇ m. Both absorption materials used are bismuth.
  • the X-ray wavelength used is 0.043 nm, that is, the photon energy is 28 keV, and the corresponding thicknesses of the first phase grating G1 and the second phase grating are both 36 ⁇ m.
  • the above embodiment is only a specific implementation manner, and the position and size of each device can be designed and calculated according to actual needs, which is not limited by the present invention.
  • the effective focal spot area of the X-ray source emitted by the X-ray tube is 1 ⁇ 0.8 mm 2, the applied voltage is 40 kV, and the current is 4 mA.
  • the flat panel detector is used as the X-ray detector, and the pixel size of the X-ray detector is 74.8 ⁇ m.
  • the exposure time is 3s.
  • the displayed field of view is the overlapping part of the absorption grating (diameter: 10.5cm) and the area of the X-ray detector (11.5 ⁇ 6.5cm2).
  • the parameters of the imaging system of the present invention are the same as those obtained when the Moiré fringe is obtained, except that the X-ray detector is replaced with a visible light CCD (Spectral Instruments), 4096 ⁇ 4096 pixels, 9 ⁇ m/pixel and scintillator CsI ( Tl) (thickness: 400 ⁇ m) coupling through 2:1 light cone.
  • CCD visible light
  • Tl scintillator CsI
  • a voltage value of 40 kV and a current value of 4 mA were applied to the X-ray source, the exposure time was set to 60 s, the image effective area was 70 ⁇ 70 mm2, and the absorption, phase contrast, and dark field images of lemon were obtained by the 4-step phase shift method, as shown in Figure 6a -6c shown.
  • phase contrast and dark field images show that the dual phase grating phase contrast imaging of the present invention can be performed like an ordinary Tiberium system. And because the dual-phase grating system is composed of a Tiberium and an inverse Tiberium system, while retaining the advantages of the two systems, they abandon their respective shortcomings. That is to allow the use of large-period source gratings, avoiding the production of small-period source gratings.
  • the system can greatly amplify interference fringes, for example, it can be amplified to a period of tens of microns or even hundreds of microns, thereby avoiding the production of small period absorption gratings, and even using a flat panel X-ray detector can directly Distinguish.

Abstract

An X-ray dual-phase grating phase-contrast imaging system. The system comprises an X-ray tube, a source grating G 0, a phase grating and an X-ray detector which are successively arranged in the emission direction of X-rays; the phase grating comprises a first phase grating G 1 and a second phase grating G 1' which are arranged at intervals; the first phase grating G 1 and the second phase grating G 1' are located between the source grating G 0 and the X-ray detector; a self-imaging secondary source G 2 is formed after the first phase grating G 1; the X-rays emitted by the X-ray tube, the source grating G 0 and the first phase grating G 1 form a Talbot-Lau system; and the self-imaging secondary source G 2 and the second phase grating G 1' form an inverse Talbot-Lau system. According to the imaging system, the use of source gratings with small periods and high aspect ratio, and the use of absorption gratings with large area, small periods and high aspect ratio can be avoided, thereby reducing the difficulty of implementing the grating phase-contrast imaging system.

Description

X射线双相位光栅相衬成像系统X-ray dual-phase grating phase contrast imaging system 技术领域Technical field
本发明涉及相衬成像系统,尤其涉及一种X射线双相位光栅相衬成像系统。The invention relates to a phase contrast imaging system, in particular to an X-ray dual phase grating phase contrast imaging system.
背景技术Background technique
国际上近20年众多X射线相位衬度成像技术的研究比较表明,基于泰伯劳干涉仪的相衬成像技术在摆脱对同步辐射源依赖的同时,能够提供包括吸收衬度、相位衬度和暗场像等多衬度机制的图像,反映物体的内在结构,是X射线成像技术的重大变革,在临床上对病变早期诊断,材料科学中聚合物的表征,产业和安全的无损检验等领域具有潜在的应用价值。The comparison of many X-ray phase contrast imaging technologies in the past 20 years in the world has shown that the phase contrast imaging technology based on the Tiberau interferometer can provide absorption contrast, phase contrast and dark contrast while rid of the dependence on the synchrotron radiation source. The image of the multi-contrast mechanism such as field image, reflecting the internal structure of the object, is a major change in X-ray imaging technology. It has clinical early diagnosis of lesions, the characterization of polymers in materials science, industrial and safe nondestructive testing, etc. Potential application value.
2006年,F.Pfeiffer等人根据泰伯-劳原理修改泰伯干涉仪,提出利用普通X射线源和吸收光栅构成空间相干阵列X射线源。这既解决了部分相干光照明问题,又同时提高了光源亮度,是为X射线泰伯-劳干涉仪。它使该技术摆脱了对同步辐射源的依赖,有可能进入普通实验室甚至临床,成为这一领域的研究热点。In 2006, F. Pfeiffer et al. modified the Taber interferometer based on the Taber-Laur principle and proposed to use a common X-ray source and absorption grating to form a spatially coherent array X-ray source. This not only solves the problem of partial coherent light illumination, but also improves the brightness of the light source at the same time. It is an X-ray Taber-Laur interferometer. It makes the technology get rid of the dependence on synchrotron radiation source, and may enter ordinary laboratories or even clinical, becoming a research hotspot in this field.
技术问题technical problem
现有的泰伯或泰伯-劳干涉仪获得以X射线相位梯度为衬度的图像。它所依赖的是干涉条纹切变量的测量。这些干涉条纹源自作为分束器的光栅(一般是相位光栅)的不同衍射束的相互干涉。当用平行光照明时,这些干涉条纹具有与分束光栅相同的周期(或一半,取决于光栅的性质),即所谓“自成像”。锥束照明时,干涉条纹周期与分束光栅的周期满足一个投影放大的比例关系。X射线源的空间相干性的几何条件要求分束光栅的周期在几个微米范围内。这样“自成像”的周期也是几个微米的尺度(略大)。而普通的X射线图像探测器的像素在20-200微米,即,不可能直接记录这样的干涉条纹,更遑论条纹的切变量。Existing Taber or Taber-Laur interferometers obtain images with X-ray phase gradient as contrast. It relies on the measurement of the interference fringe shear variable. These interference fringes originate from the mutual interference of different diffracted beams of a grating (generally a phase grating) as a beam splitter. When illuminated with parallel light, these interference fringes have the same period as the beam splitting grating (or half, depending on the nature of the grating), so-called "self-imaging". When the cone beam is illuminated, the period of the interference fringe and the period of the beam splitting grating satisfy a proportional relationship of projection magnification. The geometric conditions of the spatial coherence of the X-ray source require that the period of the beam splitting grating be in the range of several microns. In this way, the period of "self-imaging" is also a few microns (slightly larger). The pixels of ordinary X-ray image detectors are in the range of 20-200 microns, that is, it is impossible to directly record such interference fringes, let alone the shear variables of fringes.
现有的干涉条纹和切变探测方法是引入另一个吸收光栅,对小周期的干涉条纹取样,即,形成莫尔条纹放大切变量而记录之。但大面积、高深宽比的吸收光栅的制作却一直是个技术瓶颈。而且,吸收光栅的使用降低了光子利用效率,导致图像信号信噪比恶化或曝光时间延长。很明显,不依赖吸收光栅而记录等相位线,即放大条纹周期是解决该困局的上选之道。但根据空间相干性的几何条件,直接放大条纹导致必须减小光源的发射面积。解决之道有二:制作更小狭缝的源光栅;发展发射尺度小于几个微米的结构阳极。前者更加增加了深宽比,更难以实现(虽然面积减小);后者的实现目前看是以小的X射线光子能量(铜的特征谱)和功率容量为代价。The existing interference fringe and shear detection method is to introduce another absorption grating to sample the interference fringe with a small period, that is, to form a moiré fringe to amplify the shear variable and record it. However, the production of large-area, high-aspect-ratio absorption gratings has always been a technical bottleneck. Moreover, the use of absorption gratings reduces the photon utilization efficiency, resulting in deterioration of the signal-to-noise ratio of the image signal or prolonged exposure time. Obviously, recording isophase lines without relying on the absorption grating, that is, enlarging the fringe period is the best way to solve this dilemma. However, according to the geometric conditions of spatial coherence, directly amplifying the fringes leads to the need to reduce the emission area of the light source. There are two solutions: making source gratings with smaller slits; developing structural anodes with emission scales less than a few microns. The former increases the aspect ratio more, and is more difficult to achieve (although the area is reduced); the realization of the latter is currently seen at the expense of small X-ray photon energy (copper characteristic spectrum) and power capacity.
技术解决方案Technical solution
本发明要解决的技术问题在于,提供一种X射线双相位光栅相衬成像系统,该系统能够避免小周期、高深宽比的源光栅和大面积、小周期、高深宽比吸收光栅的使用,降低光栅相衬成像系统的实现难度。The technical problem to be solved by the present invention is to provide an X-ray dual phase grating phase contrast imaging system, which can avoid the use of a small period, high aspect ratio source grating and a large area, small period, high aspect ratio absorption grating, Reduce the difficulty of realizing grating phase contrast imaging system.
本发明解决其技术问题所采用的技术方案是:The technical solutions adopted by the present invention to solve its technical problems are:
一种X射线双相位光栅相衬成像系统,包括沿X射线发射方向依次设置的X射线管、源光栅G 0、相位光栅和X射线探测器,所述相位光栅包括间隔设置第一相位光栅G 1和第二相位光栅G′ 1,所述第一相位光栅G 1、第二相位光栅G′ 1位于源光栅G 0和X射线探测器之间,在第一相位光栅G 1后形成自成像次级源G 2;所述X射线管发出的X射线、源光栅G 0与第一相位光栅G 1组成一个泰伯劳系统;所述自成像次级源G 2、第二相位光栅G′ 1组成逆泰伯劳系统。 An X-ray dual-phase grating phase contrast imaging system includes an X-ray tube, a source grating G 0 , a phase grating and an X-ray detector arranged in sequence along the X-ray emission direction, the phase grating includes first phase gratings G arranged at intervals 1 and a second phase grating G′ 1 , the first phase grating G 1 and the second phase grating G′ 1 are located between the source grating G 0 and the X-ray detector, and form a self-imaging after the first phase grating G 1 The secondary source G 2 ; the X-rays emitted by the X-ray tube, the source grating G 0 and the first phase grating G 1 form a Tiberium system; the self-imaging secondary source G 2 and the second phase grating G′ 1 Formed the inverse Tiberium system.
进一步地,X射线双相位光栅相衬成像系统中,优选第一相位光栅G 1的位置与周期满足:使X射线经源光栅G 0后传播到第一相位光栅G 1处的相干长度不小于第一相位光栅G 1的周期;第二相位光栅G′ 1的位置与周期满足:自成像次级源G 2传播到第二相位光栅G′ 1处的相干长度不小于第二相位光栅G′ 1的周期 Further, in the X-ray dual-phase grating phase-contrast imaging system, it is preferable that the position and period of the first phase grating G 1 satisfy that the coherence length of the X-ray propagating to the first phase grating G 1 after passing through the source grating G 0 is not less than The period of the first phase grating G 1 ; the position and period of the second phase grating G′ 1 satisfy: the coherence length propagated from the imaging secondary source G 2 to the second phase grating G′ 1 is not less than the second phase grating G′ 1 cycle
进一步地,X射线双相位光栅相衬成像系统中,优选所述次级源G 2位于所述第一相位光栅G 1的泰伯距离处。 Further, in the X-ray dual phase grating phase contrast imaging system, it is preferable that the secondary source G 2 is located at the Taber distance of the first phase grating G 1 .
所述第一相位光栅G 1的泰伯距离R 2满足: The Taber distance R 2 of the first phase grating G 1 satisfies:
Figure PCTCN2018125859-appb-000001
Figure PCTCN2018125859-appb-000001
其中,p 1是第一相位光栅G 1的周期,R 1是源光栅G 0与第一相位光栅G 1之间的间距,λ是X射线的波长,k为常数,对于π/2的相位光栅,k=1/2,3/2,5/2,…,对于π的相位光栅,k=1/8,3/8,5/8,…。 Where p 1 is the period of the first phase grating G 1 , R 1 is the distance between the source grating G 0 and the first phase grating G 1 , λ is the wavelength of the X-ray, k is a constant, and for the phase of π/2 For gratings, k = 1/2, 3/2, 5/2, ..., for a phase grating of π, k = 1/8, 3/8, 5/8, ....
进一步地,X射线双相位光栅相衬成像系统中,优选所述第一相位光栅G 1和第二相位光栅G′ 1的周期相同;所述源光栅G 0与第一相位光栅G 1之间的间距R 1、第二相位光栅G′ 1与其自成像条纹G′ 2之间的间距R 2′相等; Further, in the X-ray dual phase grating phase contrast imaging system, it is preferable that the periods of the first phase grating G 1 and the second phase grating G′ 1 are the same; between the source grating G 0 and the first phase grating G 1 R 1 , the distance R 2 ′ between the second phase grating G′ 1 and its self-imaging fringe G′ 2 is equal;
或者所述第一相位光栅G 1和第二相位光栅G′ 1的周期不同;所述源光栅G 0与第一相位光栅G 1之间的间距R 1、第二相位光栅G′ 1与其自成像条纹G′ 2之间的间距R 2′不同。 Or the first and second phase grating G 1 phase grating G '1 of different periods; distance R between the source 1 and a first grating G 0 phase grating G 1, the second phase grating G' 1 thereto from The distance R 2 ′ between the imaging stripes G′ 2 is different.
进一步地,X射线双相位光栅相衬成像系统中,优选所述第二相位光栅G′ 1的自成像条纹的周期为20-300微米。 Further, in the X-ray dual phase grating phase contrast imaging system, it is preferable that the period of the self-imaging fringe of the second phase grating G′ 1 is 20-300 μm.
进一步地,X射线双相位光栅相衬成像系统中,优选所述源光栅G 0为将入射光调制为相干光的吸收光栅,或者为耦合到X射线阳极靶上的源光栅G 0结构。 Further, in the X-ray dual-phase grating phase contrast imaging system, it is preferable that the source grating G 0 is an absorption grating that modulates incident light into coherent light, or a source grating G 0 structure coupled to the X-ray anode target.
进一步地,X射线双相位光栅相衬成像系统中,优选所述源光栅G 0的周期为5-50微米,占空比为0.25-0.5;或者所述源光栅G 0的周期为1-5微米,占空比为1。 Further, in the X-ray dual phase grating phase contrast imaging system, it is preferable that the period of the source grating G 0 is 5-50 μm and the duty ratio is 0.25-0.5; or the period of the source grating G 0 is 1-5 Microns, the duty cycle is 1.
进一步地,X射线双相位光栅相衬成像系统中,优选所述X射线管与所述源光栅G 0的距离为0mm-100mm;所述源光栅G 0与所述第一相位光栅G 1的距离为5mm-1000mm;所述第二相位光栅G′ 1与所述X射线探测器的距离为100mm-2000mm。 Further, in the X-ray dual phase grating phase contrast imaging system, it is preferable that the distance between the X-ray tube and the source grating G 0 is 0 mm-100 mm; the distance between the source grating G 0 and the first phase grating G 1 The distance is 5 mm-1000 mm; the distance between the second phase grating G′ 1 and the X-ray detector is 100 mm-2000 mm.
进一步地,X射线双相位光栅相衬成像系统中,优选所述第一相位光栅G 1和第二相位光栅G′ 1都各自包括交替设置的透过X光线的透过层和相位改变层。 Further, in the X-ray dual-phase grating phase contrast imaging system, it is preferable that the first phase grating G 1 and the second phase grating G′ 1 each include an alternately arranged transmission layer and phase change layer that transmit X-rays.
进一步地,X射线双相位光栅相衬成像系统中,优选所述X射线探测器前的在第二相位光栅G′ 1的泰伯距离处可设有一与自成像条纹周期G′ 2相同的吸收光栅。 Further, in the X-ray dual-phase grating phase contrast imaging system, it is preferable that the same absorption as the self-imaging fringe period G′ 2 can be provided at the Taber distance of the second phase grating G′ 1 in front of the X-ray detector Raster.
进一步地,X射线双相位光栅相衬成像系统中,优选所述X射线管为发射X射线光子能量范围为8keV-70keV的X射线管。Further, in the X-ray dual phase grating phase contrast imaging system, it is preferred that the X-ray tube is an X-ray tube that emits X-ray photons with an energy range of 8 keV-70 keV.
有益效果Beneficial effect
本发明的X射线双相位光栅相衬成像系统,利用普通X射线源和大周期的源光栅、两个相位光栅就能够实现相衬成像,关于本发明设置的两个相位光栅--第一相位光栅G 1和第二相位光栅G′ 1,由于所有光栅的周期与相互之间的距离具有很大程度的联动性,本发明的相位光栅为双相位光栅,单从结构上来说是由两个单相位光栅相衬成像系统组合而成,分别形成泰伯劳和逆泰伯劳成像系统,其中,泰伯劳系统可以提供周期为微米级的结构光,接着,通过逆泰伯劳系统,能够获得大周期的自成像条纹。并且大周期的吸收光栅能够作为取样光栅,从而大大降低了制作大面积和高深宽比吸收光栅的难度。 The X-ray dual-phase grating phase contrast imaging system of the present invention can realize phase contrast imaging by using an ordinary X-ray source, a large period source grating, and two phase gratings. Regarding the two phase gratings provided by the present invention-the first phase The grating G 1 and the second phase grating G′ 1 have a large degree of linkage between the periods of all gratings and the distance between them. The phase grating of the present invention is a dual-phase grating, which is composed of two A single-phase grating phase contrast imaging system is combined to form a Tiberium and inverse Tiberium imaging system. The Tiberium system can provide structured light with a period of micrometers. Then, the inverse Tiberium system can obtain a large period Self-imaging stripes. In addition, a large-period absorption grating can be used as a sampling grating, thereby greatly reducing the difficulty of manufacturing an absorption grating with a large area and a high aspect ratio.
为避免小尺度光源和大面积、小周期、高深宽比吸收光栅的制作,双相位光栅相衬成像系统利用普通泰伯-劳系统产生的像(干涉条纹)作为“自成像次级源”,该“自成像次级源”的周期大小的调节可通过调节泰伯-劳系统的源光栅与相位光栅的周期及它们之间的距离获得,当其周期较小时,通过第二个相位光栅,便能在较短的距离内获得周期较大的自成像条纹。若此时的条纹仍不足以被探测到,可通过加入一块大面积的吸收光栅来辅助探测,但该吸收光栅由于周期较大,故深宽比不大,制作难度不大。In order to avoid the production of small-scale light sources and large-area, small-period, high-aspect-ratio absorption gratings, dual-phase grating phase contrast imaging systems use images (interference fringes) generated by ordinary Taber-Lao systems as "self-imaging secondary sources". The adjustment of the period size of the "self-imaging secondary source" can be obtained by adjusting the period of the source grating and the phase grating of the Taber-Lao system and the distance between them. When the period is small, the second phase grating is used. It is possible to obtain a self-imaging fringe with a large period in a short distance. If the fringes at this time are still not enough to be detected, a large area of absorption grating can be added to assist detection. However, due to the large period of the absorption grating, the aspect ratio is not large, so it is not difficult to manufacture.
附图说明BRIEF DESCRIPTION
下面将结合附图及实施例对本发明作进一步说明,附图中:The present invention will be further described below with reference to the drawings and embodiments. In the drawings:
图1是本发明实施例的结构示意图;FIG. 1 is a schematic structural diagram of an embodiment of the present invention;
图2是本发明实施例另一种实施方式的结构示意图;2 is a schematic structural diagram of another implementation manner of an example of the present invention;
图3是本发明实施例的结构分析示意图;3 is a schematic diagram of structural analysis of an embodiment of the present invention;
图4是本发明获得的莫尔条纹;4 is a Moiré fringe obtained by the present invention;
图5是本发明实施例的沿着水平线上的条纹对比度;5 is the fringe contrast along the horizontal line of the embodiment of the present invention;
图6a-6c是相衬实验中吸收像、相衬像和暗场像。Figures 6a-6c are the absorption image, phase contrast image and dark field image in the phase contrast experiment.
本发明的最佳实施方式Best Mode of the Invention
为了对本发明的技术特征、目的和效果有更加清楚的理解,现对照附图详细说明本发明的具体实施方式。In order to have a clearer understanding of the technical features, purposes and effects of the present invention, the specific embodiments of the present invention will now be described in detail with reference to the drawings.
如图1所示,本发明的一种X射线双相位光栅相衬成像系统,包括沿X射线发射方向依次设置的X射线管、源光栅G0、相位光栅和X射线探测器,所述相位光栅包括间隔设置第一相位光栅G1和第二相位光栅G′1。即具体如图1所示,从左至右为:X射线管、源光栅G0、第一相位光栅G1、第二相位光栅G′1和X射线探测器。As shown in FIG. 1, an X-ray dual-phase grating phase contrast imaging system of the present invention includes an X-ray tube, a source grating G0, a phase grating and an X-ray detector arranged in sequence along the X-ray emission direction. The phase grating The first phase grating G1 and the second phase grating G'1 are arranged at intervals. Specifically, as shown in FIG. 1, from left to right are: X-ray tube, source grating G0, first phase grating G1, second phase grating G′1 and X-ray detector.
具体地,所述第一相位光栅G1、第二相位光栅G′1位于源光栅G0和X射线探测器之间,第一相位光栅G1的位置与周期满足:使X射线经源光栅G0后传播到第一相位光栅G1处的相干长度不小于第一相位光栅G1的周期,这样,在第一相位光栅G1的泰伯距离处便形成了他的自成像,即得到自成像次级源G2,这个自成像次级源G2为虚源,从而照亮第二相位光栅G′1。同理,第二相位光栅G′1的位置与周期与虚源的周期有关,即第二相位光栅G′1的位置与周期满足:自成像次级源G2传播到第二相位光栅G′1处的相干长度不小于第二相位光栅G′1的周期。Specifically, the first phase grating G1 and the second phase grating G′1 are located between the source grating G0 and the X-ray detector, and the position and period of the first phase grating G1 satisfy: X-rays propagate through the source grating G0 The coherence length to the first phase grating G1 is not less than the period of the first phase grating G1. In this way, his self-imaging is formed at the Taber distance of the first phase grating G1, that is, the self-imaging secondary source G2 is obtained. This self-imaging secondary source G2 is a virtual source, thereby illuminating the second phase grating G'1. Similarly, the position of the second phase grating G′1 is related to the period and the period of the virtual source, that is, the position and period of the second phase grating G′1 satisfy: the self-imaging secondary source G2 propagates to the second phase grating G′1 The coherence length at is no less than the period of the second phase grating G'1.
本发明的成像系统的上述结构实际上就是一个泰伯劳系统和一个逆泰伯劳系统,其中,X射线管发出的X射线、源光栅G0和第一相位光栅G1组成一个泰伯劳系统,可以提供周期为微米级的结构光,即自成像次级源G2。接着,通过自成像次级源G2与第二相位光栅G′1组成逆泰伯劳系统,最后被X射线探测器探测。该方案能够为条纹提供足够大的放大倍率,获得大周期的自成像条纹,以便直接被X射线探测器能够分辨。The above structure of the imaging system of the present invention is actually a Tiberium system and an inverse Tiberium system, wherein the X-rays emitted by the X-ray tube, the source grating G0 and the first phase grating G1 form a Tiberium system, which can provide a period It is micron-level structured light, that is, self-imaging secondary source G2. Next, an inverse Tiberau system is formed by the self-imaging secondary source G2 and the second phase grating G′1, and finally detected by the X-ray detector. This scheme can provide sufficient magnification for the fringes and obtain large-period self-imaging fringes so that they can be directly resolved by the X-ray detector.
在泰伯劳系统中,劳条件可写为:In the Tiberium system, labor conditions can be written as:
Figure PCTCN2018125859-appb-000002
Figure PCTCN2018125859-appb-000002
其中p0、p1、和p2分别为源光栅G0、第一相位光栅G1和自成像次级源G2的周期,常数α为1或2,具体取值取决于第一相位光栅G1为π/2光栅还是π光栅。Where p0, p1, and p2 are the periods of the source grating G0, the first phase grating G1, and the self-imaging secondary source G2, respectively. The constant α is 1 or 2, the specific value depends on the first phase grating G1 is π/2 grating Π grating.
所述第一相位光栅G1的泰伯距离R2满足:The Taber distance R2 of the first phase grating G1 satisfies:
Figure PCTCN2018125859-appb-000003
Figure PCTCN2018125859-appb-000003
其中,p1是第一相位光栅G1的周期,R1是源光栅G0与第一相位光栅G1之间的间距,λ是X射线的波长,k为常数,对于π/2的相位光栅,k=1/2,3/2,5/2,…,对于π的相位光栅,k=1/8,3/8,5/8,…。Where p1 is the period of the first phase grating G1, R1 is the distance between the source grating G0 and the first phase grating G1, λ is the X-ray wavelength, k is a constant, and for the π/2 phase grating, k=1 /2, 3/2, 5/2, ..., for a phase grating of π, k = 1/8, 3/8, 5/8, ....
从功能上来说,泰伯劳系统的源光栅G0将入射光调制为满足成像条件的相干光,于是,在第一相位光栅G1后会形成自成像次级源。这些自成像次级源的自成像条纹可作为后续逆泰伯劳系统的“光源”,即如图3所示,所述第一相位光栅G1后、第二相位光栅G′1前形成自成像次级源。Functionally, the source grating G0 of the Tiberium system modulates the incident light into coherent light that satisfies the imaging conditions, so a self-imaging secondary source will be formed after the first phase grating G1. The self-imaging fringes of these self-imaging secondary sources can be used as the “light source” of the subsequent inverse Tiberau system, that is, as shown in FIG. 3, the self-imaging sub-grid is formed after the first phase grating G1 and before the second phase grating G′1 Level source.
所述第一相位光栅G1和第二相位光栅G′1的周期可以相同,也可以不同。优选第一相位光栅G1的周期p1与第二相位光栅G′1周期p1′相同(p1′=p1)。即形成对称的泰伯劳系统和逆泰伯劳系统。选择了对称放置泰伯劳和逆泰伯劳系统,这样只需制作两种规格的光栅,而在传统泰伯劳系统需要三种规格的光栅,本发明减少了光栅规格种类。所述源光栅G0与第一相位光栅G1之间的间距R1、第二相位光栅G′1与其形成的自成像条纹G′2之间的间距R2′相等(R1=R2′),并且第一相位光栅G1与形成的自成像次级源之间的间距R2、自成像次级源与第二相位光栅G′1之间的间距R1′相等(R2=R1′)。The periods of the first phase grating G1 and the second phase grating G′1 may be the same or different. Preferably, the period p1 of the first phase grating G1 is the same as the period p1′ of the second phase grating G′1 (p1′=p1). That is, a symmetrical Tiberium system and an inverse Tiberium system are formed. The symmetrically placed Tiberium and inverse Tiberium systems are selected, so that only two specifications of gratings are required, while the traditional Tiberium systems require three specifications of gratings. The invention reduces the number of grating specifications. The spacing R1 between the source grating G0 and the first phase grating G1, the spacing R2' between the second phase grating G′1 and the self-imaging fringes G′2 formed by them are equal (R1=R2′), and the first The interval R2 between the phase grating G1 and the formed self-imaging secondary source and the interval R1′ between the self-imaging secondary source and the second phase grating G′1 are equal (R2=R1′).
所述第二相位光栅G′1的自成像条纹的周期为20-300微米。The period of the self-imaging fringes of the second phase grating G'1 is 20-300 microns.
以下对本发明具体结构进行详细说明:The following describes the specific structure of the present invention in detail:
X射线管选择能产生X射线能量范围在17keV~70keV、具有大辐射通量和宽发射角的X射线束。The X-ray tube is selected to produce an X-ray beam with an X-ray energy range of 17 keV to 70 keV, a large radiation flux and a wide emission angle.
所述源光栅G0为将入射光调制为相干光的吸收光栅。源光栅G0对X射线管产生的X射线有调制作用,调制后的X射线是一组平行线阵列,每条线都是一个X射线的线源。The source grating G0 is an absorption grating that modulates incident light into coherent light. The source grating G0 has a modulation effect on the X-rays generated by the X-ray tube. The modulated X-rays are a group of parallel line arrays, and each line is an X-ray line source.
源光栅G0结构为:在基底上制作交替设置的透过层和吸收材料层,吸收材料层和透过层的宽度比例为2:1至4:1。面积以能够覆盖整个成像视场为宜。基底材料选择硅基底形状适配成像视场,吸收材料层选择金、铋、金锡合金等材料,透过层选择硅、光刻胶、空气等材料制成。The structure of the source grating G0 is as follows: a transmission layer and an absorption material layer are alternately arranged on the substrate, and the width ratio of the absorption material layer and the transmission layer is 2:1 to 4:1. The area should cover the entire imaging field of view. The base material is selected from silicon. The shape of the silicon substrate is adapted to the imaging field of view. The absorption material layer is selected from gold, bismuth, gold-tin alloy and other materials.
优选所述源光栅G0为大周期源光栅,其所述源光栅的周期为5-50微米,占空比为0.25-0.5;例如:源光栅调制后X射线的线宽范围为5-100微米,最佳化数值范围是10-20微米;其长度范围为0.3-2mm,优化范围是0.6-1.2mm。线发射体阵列的占空比范围为 0.1-0.5,优化占空比为0.2-0.35。Preferably, the source grating G0 is a large-period source grating, and the period of the source grating is 5-50 microns, and the duty ratio is 0.25-0.5; for example, the line width of X-rays after modulation by the source grating is 5-100 microns The optimized numerical range is 10-20 microns; its length range is 0.3-2mm, and the optimized range is 0.6-1.2mm. The line emitter array has a duty cycle range of 0.1-0.5 and an optimized duty cycle of 0.2-0.35.
进一步地,所述的X射线双相位光栅相衬成像系统中,优选所述X射线管与所述源光栅G0的距离为0mm-100mm;所述源光栅G0与所述第一相位光栅G1的距离为2mm-1000mm;所述第二相位光栅G′1与所述X射线探测器的距离为100mm-2000mm。上述各器件位置及其尺寸可以根据实际需要进行设计和计算,只需在上述范围内任意数据即可满足本发明的需要,并无需特定某个数据。Further, in the X-ray dual-phase grating phase contrast imaging system, it is preferable that the distance between the X-ray tube and the source grating G0 is 0mm-100mm; the distance between the source grating G0 and the first phase grating G1 The distance is 2 mm-1000 mm; the distance between the second phase grating G′1 and the X-ray detector is 100 mm-2000 mm. The positions and sizes of the above devices can be designed and calculated according to actual needs, and any data within the above range can meet the needs of the present invention without specifying a certain data.
所述第一相位光栅G1和第二相位光栅G′1是在基底材料上覆盖一层由完全透过层和相位改变层相间隔构成的微结构。即优选所述第一相位光栅G1和第二相位光栅G′1都各自包括交替设置的透过X光线的透过层和相位改变层,所述相位改变层,用硅、铝、镍、金等材料制成,完全透过层采用空气、光刻胶等材料。通过改变光栅的厚度使其中心波长对应的光子能量可在17-70keV范围内调节,允许的X射线带宽为±20%。第一相位光栅G1和第二相位光栅G′1具有衍射作用,经过源光栅G0调制的X射线透过第一相位光栅G1后产生衍射,使0级衍射光能量最小,±1级衍射光能量最大,±1级衍射光相互作用产生微分干涉效果。The first phase grating G1 and the second phase grating G′1 are a microstructure composed of a fully transparent layer and a phase change layer spaced on the base material. That is, it is preferable that the first phase grating G1 and the second phase grating G′1 each include an alternating transmission layer and a phase change layer that transmit X-rays. The phase change layer is made of silicon, aluminum, nickel, gold It is made of other materials, such as air and photoresist. By changing the thickness of the grating, the photon energy corresponding to the center wavelength can be adjusted within the range of 17-70 keV, and the allowable X-ray bandwidth is ±20%. The first phase grating G1 and the second phase grating G′1 have a diffractive effect. The X-rays modulated by the source grating G0 pass through the first phase grating G1 to generate diffraction, which minimizes the 0th order diffracted light energy and ±1st order diffracted light energy The largest, ±1st order diffracted light interacts to produce a differential interference effect.
进一步地,所述的X射线双相位光栅相衬成像系统中,优选所述X射线探测器为平板探测器或采用间接探测X射线的方式,该X射线探测器为现有产品,在此不再赘述。Further, in the X-ray dual-phase grating phase contrast imaging system, preferably, the X-ray detector is a flat panel detector or adopts an indirect way to detect X-rays. The X-ray detector is an existing product, which is not described here. Repeat again.
进一步地,优选所述X射线探测器前设有一吸收光栅G′2,在第二相位光栅G′1的泰伯距离处。当源光栅G0与第一相位光栅G1和第二相位光栅G′1具有合适的配合时,逆泰伯劳系统形成的自成像条纹周期较大,不小于X射线探测器像素尺寸的2倍时,即能被直接分辨,此时可以省去上述吸收光栅G′2,当逆泰伯劳系统形成的自成像条纹周期小于X射线探测器尺寸的2倍时,则上述吸收光栅G′2不能省略。即实际上,在吸收光栅G′2的位置,若使用的X射线探测器的分辨率仍不足以分辨该位置的逆泰伯劳系统形成的自成像条纹(本发明双相位光栅成像系统的优势就是把条纹周期变大,约几十微米,甚至更大),则应使用一个吸收光栅G′2,该吸收光栅G′2的周期与逆泰伯劳系统形成的自成像条纹周期相等,如图2中在X射线探测器前设有吸收光栅G′2。这样能够形成莫尔条纹以方便X射线探测器探测,同时,这样大周期的吸收光栅G′2制作难度也较低。Further, it is preferable that an absorption grating G′ 2 is provided in front of the X-ray detector at a Taber distance of the second phase grating G′ 1. When the source grating G0 and the first phase grating G1 and the second phase grating G′1 have a suitable fit, the self-imaging fringe period formed by the reverse Tiberau system is relatively large, not less than twice the pixel size of the X-ray detector, That is, it can be directly resolved. In this case, the above-mentioned absorption grating G′ 2 can be omitted. When the period of the self-imaging fringes formed by the reverse Tiberau system is less than twice the size of the X-ray detector, then the above absorption grating G′ 2 cannot be omitted. In fact, at the position of the absorption grating G′2, if the resolution of the X-ray detector used is still insufficient to resolve the self-imaging fringes formed by the inverse Tiberau system at this position (the advantage of the dual-phase grating imaging system of the present invention is If the fringe period becomes larger (about tens of microns or even larger), an absorption grating G′2 should be used. The period of the absorption grating G′2 is equal to the period of the self-imaging fringes formed by the inverse Tiberau system, as shown in Figure 2 In front of the X-ray detector, there is an absorption grating G′2. In this way, moiré fringes can be formed to facilitate detection by the X-ray detector, and at the same time, the fabrication of the absorption grating G′ 2 with such a large period is also relatively difficult.
本发明优选适用于大周期源光栅G0,同时也适用于小周期源光栅G0。The present invention is preferably applicable to a large-period source grating G0, and also to a small-period source grating G0.
可以将式(2)变换为:Equation (2) can be transformed into:
Figure PCTCN2018125859-appb-000004
Figure PCTCN2018125859-appb-000004
其中:among them:
Figure PCTCN2018125859-appb-000005
Figure PCTCN2018125859-appb-000005
在(3)中,R1和R2可交换位置,(1)中p0和p2可交换位置,即由小周期的源光栅G0可获得大周期的自成像条纹。所述源光栅G0为小周期源光栅G0,其所述源光栅G0的周期为1-5微米,占空比为1。In (3), R1 and R2 can be exchanged, and (1) p0 and p2 can be exchanged, that is, a small period of source grating G0 can obtain a large period of self-imaging fringes. The source grating G0 is a small period source grating G0, and the period of the source grating G0 is 1-5 microns, and the duty ratio is 1.
除了上述实施例外,另外在其他实施例中,所述第一相位光栅G1和第二相位光栅G′1的周期不同;所述源光栅G0与第一相位光栅G1之间的间距R1、第二相位光栅G′1与其自成像条纹G′2之间的间距R2′不同。In addition to the above embodiments, in other embodiments, the periods of the first phase grating G1 and the second phase grating G′1 are different; the distance R1 between the source grating G0 and the first phase grating G1, the second The distance R2' between the phase grating G'1 and its self-imaging fringes G'2 is different.
以下以一个具体实施例进行详细说明:The following is a detailed description with a specific embodiment:
如图2-3所示,一种X射线双相位光栅相衬成像系统,包括包括沿X射线发射方向(如图1所示的自左至右)依次设置的X射线管、源光栅G0、第一相位光栅G1、第二相位光栅G′1、吸收光栅G′2和X射线探测器,各器件位置及其尺寸为:R1=R2′=0.763m,R2=R1′=0.101m,p1′=p1=5.6μm,p2′=p0=24μm,源光栅G0占空比25%,深度130μm。吸收光栅占空比50%,深度130μm,两者所用吸收材料均为铋。所用的X射线波长为0.043nm,即光子能量为28keV,对应的第一相位光栅G1和第二相位光栅厚度均为36μm。上述实施例只是一个具体的实施方式,各器件位置及其尺寸可以根据实际需要进行设计和计算,本发明并限定。As shown in FIG. 2-3, an X-ray dual-phase grating phase contrast imaging system includes an X-ray tube and a source grating G0, which are arranged in sequence along the X-ray emission direction (from left to right as shown in FIG. 1). The first phase grating G1, the second phase grating G'1, the absorption grating G'2 and the X-ray detector, the position and size of each device are: R1 = R2' = 0.763m, R2 = R1' = 0.101m, p1 '=p1=5.6 μm, p2′=p0=24 μm, the source grating G0 has a duty ratio of 25%, and a depth of 130 μm. The absorption grating has a duty ratio of 50% and a depth of 130 μm. Both absorption materials used are bismuth. The X-ray wavelength used is 0.043 nm, that is, the photon energy is 28 keV, and the corresponding thicknesses of the first phase grating G1 and the second phase grating are both 36 μm. The above embodiment is only a specific implementation manner, and the position and size of each device can be designed and calculated according to actual needs, which is not limited by the present invention.
X射线管发射的X射线源有效焦斑面积为1×0.8mm2,施加电压为40kV,电流4mA。The effective focal spot area of the X-ray source emitted by the X-ray tube is 1×0.8 mm 2, the applied voltage is 40 kV, and the current is 4 mA.
X射线探测器采用平板探测器,X射线探测器像素大小为74.8μm。曝光时间为3s,如图4所示,显示的视场范围为吸收光栅(直径:10.5cm)和X射线探测器面积(11.5×6.5cm2)的重合部分。通过测量图4中的水平线上的像素值,可计算得条纹对比度为约17%,因此,我们可推断在G2′处的自成像周期。如图5所示为沿着水平线上的条纹对比度。The flat panel detector is used as the X-ray detector, and the pixel size of the X-ray detector is 74.8 μm. The exposure time is 3s. As shown in FIG. 4, the displayed field of view is the overlapping part of the absorption grating (diameter: 10.5cm) and the area of the X-ray detector (11.5×6.5cm2). By measuring the pixel values on the horizontal line in FIG. 4, the fringe contrast can be calculated to be about 17%. Therefore, we can infer the self-imaging period at G2′. As shown in Figure 5, the fringe contrast along the horizontal line.
相衬实验:Phase contrast experiment:
以柠檬为样品,本发明成像系统参数与上述获得莫尔条纹时的一样,只是X射线探测器换为可见光CCD(Spectral Instruments Inc.,4096×4096像素数,9μm/pixel)与闪烁体CsI(Tl)(thickness:400μm)通过2:1的光锥耦合。电压值40kV和电流值4mA施加到X射线源上,曝光时间设为60s,图像有效面积为70×70mm2,通过4步相移法获得了柠檬 的吸收、相衬和暗场图像,如图6a-6c所示。Taking lemon as a sample, the parameters of the imaging system of the present invention are the same as those obtained when the Moiré fringe is obtained, except that the X-ray detector is replaced with a visible light CCD (Spectral Instruments), 4096×4096 pixels, 9 μm/pixel and scintillator CsI ( Tl) (thickness: 400 μm) coupling through 2:1 light cone. A voltage value of 40 kV and a current value of 4 mA were applied to the X-ray source, the exposure time was set to 60 s, the image effective area was 70×70 mm2, and the absorption, phase contrast, and dark field images of lemon were obtained by the 4-step phase shift method, as shown in Figure 6a -6c shown.
通过上述相衬和暗场图像表明本发明的双相位光栅相衬成像能够像普通泰伯劳系统一样。并且由于双相位光栅系统由一个泰伯劳和一个逆泰伯劳系统组成,保留两种系统优点的同时,摒弃了它们各自的缺点。即允许使用大周期源光栅,避免了小周期源光栅的制作。更为重要的是,该系统能够很大程度地放大干涉条纹,如可放大至周期几十微米,甚至几百微米,从而避免了小周期吸收光栅的制作,甚至使用平板X射线探测器可直接分辨。The above-mentioned phase contrast and dark field images show that the dual phase grating phase contrast imaging of the present invention can be performed like an ordinary Tiberium system. And because the dual-phase grating system is composed of a Tiberium and an inverse Tiberium system, while retaining the advantages of the two systems, they abandon their respective shortcomings. That is to allow the use of large-period source gratings, avoiding the production of small-period source gratings. More importantly, the system can greatly amplify interference fringes, for example, it can be amplified to a period of tens of microns or even hundreds of microns, thereby avoiding the production of small period absorption gratings, and even using a flat panel X-ray detector can directly Distinguish.

Claims (10)

  1. 一种X射线双相位光栅相衬成像系统,包括沿X射线发射方向依次设置的X射线管、源光栅G0、相位光栅和X射线探测器,其特征在于,所述相位光栅包括间隔设置第一相位光栅G1和第二相位光栅G′1,所述第一相位光栅G1、第二相位光栅G′1位于源光栅G0和X射线探测器之间,在第一相位光栅G1后形成自成像次级源G2;所述X射线管发出的X射线、源光栅G0与第一相位光栅G1组成一个泰伯劳系统;所述自成像次级源G2与第二相位光栅G′1组成逆泰伯劳系统。An X-ray dual-phase grating phase contrast imaging system, including an X-ray tube, a source grating G0, a phase grating and an X-ray detector arranged in sequence along the X-ray emission direction, characterized in that the phase grating includes first intervals A phase grating G1 and a second phase grating G′1, the first phase grating G1 and the second phase grating G′1 are located between the source grating G0 and the X-ray detector, and form a self-imaging order after the first phase grating G1 Level source G2; the X-ray emitted by the X-ray tube, the source grating G0 and the first phase grating G1 form a Tiberium system; the self-imaging secondary source G2 and the second phase grating G′1 form an inverse Tiberium system .
  2. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述第一相位光栅G 1的位置与周期满足:使X射线经源光栅G 0后传播到第一相位光栅G 1处的相干长度不小于第一相位光栅G 1的周期;所述第二相位光栅G′ 1的位置与周期满足:自成像次级源G 2传播到第二相位光栅G′ 1处的相干长度不小于第二相位光栅G′ 1的周期。 The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein the position and period of the first phase grating G 1 satisfy: make X-rays propagate to the first phase grating after passing through the source grating G 0 The coherence length at G 1 is not less than the period of the first phase grating G 1 ; the position and period of the second phase grating G′ 1 satisfy: the self-imaging secondary source G 2 propagates to the position of the second phase grating G′ 1 The coherence length is not less than the period of the second phase grating G′ 1 .
  3. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述自成像次级源G 2位于所述第一相位光栅G 1的泰伯距离处。 The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein the self-imaging secondary source G 2 is located at the Taber distance of the first phase grating G 1 .
  4. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述第一相位光栅G1和第二相位光栅G′1的周期相同;所述源光栅G0与第一相位光栅G1之间的间距R1、第二相位光栅G′1与其形成的自成像条纹G′2之间的间距R2′相等;The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein the periods of the first phase grating G1 and the second phase grating G'1 are the same; the source grating G0 and the first phase grating The distance R1 between G1 and the distance R2′ between the second phase grating G′1 and the self-imaging fringes G′2 formed by it are equal;
    或者所述第一相位光栅G1和第二相位光栅G′1的周期不同;所述源光栅G0与第一相位光栅G1之间的间距R1、第二相位光栅G′1与其形成的自成像条纹G′2之间的间距R2′不同。Or the periods of the first phase grating G1 and the second phase grating G'1 are different; the distance R1 between the source grating G0 and the first phase grating G1, the second phase grating G'1 and the self-imaging fringes formed by them The distance R2' between G'2 is different.
  5. 根据权利要求4所述的X射线双相位光栅相衬成像系统,其特征在于,所述第二相位光栅G′1形成的自成像条纹G′2的周期为20-300微米。The X-ray dual-phase grating phase contrast imaging system according to claim 4, wherein the period of the self-imaging fringes G'2 formed by the second phase grating G'1 is 20-300 microns.
  6. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述源光栅G0为将入射光调制为相干光的吸收光栅,或者为耦合到X射线阳极靶上的源光栅结构。The X-ray dual-phase grating phase contrast imaging system of claim 1, wherein the source grating G0 is an absorption grating that modulates incident light into coherent light, or a source grating coupled to an X-ray anode target structure.
  7. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述源光栅G0的周期为1-50微米,占空比为0.25-0.5。The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein the period of the source grating G0 is 1-50 microns, and the duty ratio is 0.25-0.5.
  8. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述X射线管与所述源光栅G0的距离为0mm-100mm;所述源光栅G0与所述第一相位光栅G1的距离为5mm-1000mm;所述第二相位光栅G′1与所述X射线探测器的距离为100mm-2000mm。The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein the distance between the X-ray tube and the source grating G0 is 0mm-100mm; the source grating G0 and the first phase The distance between the grating G1 is 5mm-1000mm; the distance between the second phase grating G'1 and the X-ray detector is 100mm-2000mm.
  9. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述第一相位光栅G1和第二相位光栅G′1都各自包括交替设置的透过X光线的透过层和相位改变层。The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein each of the first phase grating G1 and the second phase grating G'1 includes an alternating transmission layer for transmitting X-rays And phase change layer.
  10. 根据权利要求1所述的X射线双相位光栅相衬成像系统,其特征在于,所述X射线探测器前,并在第二相位光栅G′1的泰伯距离处可设有一周期与自成像条纹G′2相同的吸收光栅。The X-ray dual-phase grating phase contrast imaging system according to claim 1, wherein a periodic and self-imaging can be provided in front of the X-ray detector and at the Taber distance of the second phase grating G′1 The absorption grating with the same fringe G'2.
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