WO2020131421A2 - Dispositifs de coupe en diamant polycristallin prѐs de la forme désirée et leurs procédés de fabrication - Google Patents
Dispositifs de coupe en diamant polycristallin prѐs de la forme désirée et leurs procédés de fabrication Download PDFInfo
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- WO2020131421A2 WO2020131421A2 PCT/US2019/064871 US2019064871W WO2020131421A2 WO 2020131421 A2 WO2020131421 A2 WO 2020131421A2 US 2019064871 W US2019064871 W US 2019064871W WO 2020131421 A2 WO2020131421 A2 WO 2020131421A2
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- diamond
- cutter
- substrate
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- feed layer
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- 239000010432 diamond Substances 0.000 title claims abstract description 446
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 446
- 238000000034 method Methods 0.000 title claims abstract description 55
- 239000000758 substrate Substances 0.000 claims abstract description 149
- 239000002245 particle Substances 0.000 claims abstract description 29
- 239000000463 material Substances 0.000 claims description 56
- 239000003054 catalyst Substances 0.000 claims description 55
- 238000005245 sintering Methods 0.000 claims description 46
- 238000003754 machining Methods 0.000 claims description 28
- 239000013078 crystal Substances 0.000 claims description 22
- 230000002093 peripheral effect Effects 0.000 claims description 19
- 238000000227 grinding Methods 0.000 claims description 16
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000002386 leaching Methods 0.000 claims description 10
- 238000005498 polishing Methods 0.000 claims description 8
- 238000009760 electrical discharge machining Methods 0.000 claims description 7
- 238000003698 laser cutting Methods 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 3
- 230000001737 promoting effect Effects 0.000 description 14
- 239000011230 binding agent Substances 0.000 description 9
- 238000005553 drilling Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
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- 238000000429 assembly Methods 0.000 description 8
- 230000000712 assembly Effects 0.000 description 8
- 239000010941 cobalt Substances 0.000 description 8
- 229910017052 cobalt Inorganic materials 0.000 description 8
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 8
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- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 4
- 230000035515 penetration Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- 229910009043 WC-Co Inorganic materials 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 2
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- 238000001556 precipitation Methods 0.000 description 2
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- 238000007493 shaping process Methods 0.000 description 2
- -1 tantalum (Ta) Chemical class 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
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- 230000001427 coherent effect Effects 0.000 description 1
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- 229910001092 metal group alloy Inorganic materials 0.000 description 1
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- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 238000004663 powder metallurgy Methods 0.000 description 1
- 229910000753 refractory alloy Inorganic materials 0.000 description 1
- 239000011949 solid catalyst Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/52—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite
- C04B35/528—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on carbon, e.g. graphite obtained from carbonaceous particles with or without other non-organic components
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
- C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
- C04B37/021—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles in a direct manner, e.g. direct copper bonding [DCB]
-
- E—FIXED CONSTRUCTIONS
- E21—EARTH OR ROCK DRILLING; MINING
- E21B—EARTH OR ROCK DRILLING; OBTAINING OIL, GAS, WATER, SOLUBLE OR MELTABLE MATERIALS OR A SLURRY OF MINERALS FROM WELLS
- E21B10/00—Drill bits
- E21B10/46—Drill bits characterised by wear resisting parts, e.g. diamond inserts
- E21B10/56—Button-type inserts
- E21B10/567—Button-type inserts with preformed cutting elements mounted on a distinct support, e.g. polycrystalline inserts
- E21B10/573—Button-type inserts with preformed cutting elements mounted on a distinct support, e.g. polycrystalline inserts characterised by support details, e.g. the substrate construction or the interface between the substrate and the cutting element
- E21B10/5735—Interface between the substrate and the cutting element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2203/00—Processes utilising sub- or super atmospheric pressure
- B01J2203/06—High pressure synthesis
- B01J2203/065—Composition of the material produced
- B01J2203/0655—Diamond
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/42—Non metallic elements added as constituents or additives, e.g. sulfur, phosphor, selenium or tellurium
- C04B2235/422—Carbon
- C04B2235/427—Diamond
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/94—Products characterised by their shape
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
- C04B2237/36—Non-oxidic
- C04B2237/363—Carbon
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/84—Joining of a first substrate with a second substrate at least partially inside the first substrate, where the bonding area is at the inside of the first substrate, e.g. one tube inside another tube
Definitions
- the present disclosure relates generally to polycrystalline diamond cutters and methods of making thereof. Specifically, the present disclosure relates to methods of making near net shape polycrystalline diamond cutters using a shaped refractory cup and/or shaped substrate to form a shaped diamond feed layer that alleviates differences in the propagation of sintering through the diamond feed layer; as well as to near net shape polycrystalline diamond cutters, which can be used in their as-sintered state, or which only need minimal post-sintering processing.
- Tools used in the drilling industry such as drag bit 100 shown in FIG. 1, often incorporate multiple polycrystalline diamond cutters 200 arranged along a peripheral region of a fin or blade 101 of the drag bit 100.
- a conventional cylindrical shaped polycrystalline diamond cutter 200 is shown in a schematic, perspective view in FIG. 2A and in a side, cross-sectional view in FIG. 2B.
- the cutter 200 includes an optional substrate 201 , which is made of hard metal, alloy, or composite, and most typically of cemented carbide or cobalt sintered tungsten carbide (WC-Co); and a polycrystalline diamond composite volume 202, also called a diamond table or diamond body, attached or joined coherently to the substrate along an interface 203.
- WC-Co cemented carbide or cobalt sintered tungsten carbide
- Polycrystalline diamond cutters are commonly made using a high pressure and high temperature (HPHT) manufacturing process.
- HPHT high pressure and high temperature
- a mass of diamond crystals is placed into a refractory metal container and a cemented carbide substrate is placed in the container such that a surface of the substrate is adjacent to, if not in contact with, the mass of diamond crystals.
- One or both of the diamond mass and the substrate may contain sintering promoting materials, such as a suitable binder material, additive, or catalyst that promotes sintering of the diamond mass and coherent attachment of the sintered diamond mass to the substrate.
- the binder material of the substrate can act as a catalyst in the diamond powders.
- a catalyst can also be added as a powder or foil adjacent to the diamond particles, between the substrate and the diamond particles and this catalyst can also promote sintering.
- An example of a sintering promoting material is cobalt.
- HPHT conditions include pressures at or above about 4-5 GPa, and temperatures at or above about 1200 °C.
- the sintering promoting materials melt and sweep through the mass of diamond.
- diamond crystals are bonded to each other in diamond-to-diamond bonds by a dissolution-precipitation process to form a sintered compact in which a polycrystalline diamond mass, i.e., a diamond table, is formed, and which is attached to the substrate (if present).
- the presence of the sintering promoting materials facilitates formation of diamond-to-diamond bonds and, where applicable, the attachment of the diamond table to the substrate.
- the sintering promoting material When present in the substrate, e.g., as the binder in the substrate, the sintering promoting material typically melts and propagates into the mass of diamond crystals.
- the binder material of the substrate is selected to function as a catalyst for melting and sintering the diamond crystals. That is, in existing processes for forming a polycrystalline diamond cutter, the cobalt or other binder material from the substrate will melt under HPHT conditions and“sweep" from the carbide substrate, into and across the diamond powder to create the polycrystalline diamond cutter. The sweep propagates as a front that moves from an interface between the substrate and the diamond crystals toward a distal surface of the diamond. With reference to FIG. 2B, the front moves from the interface 203, though the body of the polycrystalline diamond composite volume 202, and toward the top surface 205. In the presence of the liquefied binder material, diamond crystals bond to each other by a dissolution-precipitation process to form a polycrystalline diamond mass attached to the cemented carbide substrate.
- the sintering promoting material such as a catalyst
- chemically distinct residues thereof remain in the diamond table, and its presence can have various effects on the polycrystalline diamond’s overall performance when used in cutting and machining applications.
- a nonuniform or incomplete distribution of the catalyst or related residues can have detrimental effects on the mechanical properties of the polycrystalline diamond cutter when used in intended applications, such as drilling geologic formations.
- a nonuniform or incomplete distribution of the catalyst in the diamond body may, for example, be the result of a sweep that did not reach all the regions of the diamond feed layer, resulting in a diamond body including incompletely or weakly bonded diamond crystals.
- Detrimental effects include, for example, a less than average useable lifetime for the polycrystalline diamond cutter as reflected in a faster than average wear, or a higher than average propensity for fracturing of the diamond body.
- the polycrystalline diamond cutter 200 may subsequently be machined into a desired shape, including machining to specified outer diameter, height, and/or the addition of various chamfers or beveled surfaces. Examples of chamfers or beveled surfaces 204 can be seen in side view in FIG. 2B, along with other surfaces of the polycrystalline diamond cutter 200, such as the top surface 205, and side surface 206.
- the working surface or surfaces of the polycrystalline diamond cutter 200 can be any and all portions of the top surface 205, beveled surface 204, and side surface 206, i.e., any surface of the polycrystalline diamond cutter 200 that contacts the geological formation being drilled.
- a method of making a near net shape polycrystalline diamond cutter including a substrate and a diamond body includes: forming an assembly including along an axis of the assembly a refractory container, a diamond feed layer, and a substrate; the forming including: providing a refractory container including an inner bottom side, an outer bottom side, and an inner edge side; depositing a layer of diamond feed in the refractory container in contact with the inner bottom side; positioning a substrate over the diamond feed layer, the substrate including a first side and a second side opposite the first side; and, in some cases, positioning a cap over the contents of the refractory container and sealing; and processing the assembly under high pressure high temperature sintering conditions (HPHT) from 5 GPa to 8 GPa, and from 1300 °C to 1600“C, to sinter the diamond feed into a diamond body affixed to the substrate; wherein the second side of the substrate is positioned over the diamond feed layer; and wherein at
- the inner bottom side of the refractory container includes a convex portion.
- the second side of the substrate includes a convex portion.
- the convex portion of the substrate or of the refractory container includes one or more of a spherical segment, a frustum of a cone, and a hyperboloid.
- the maximum thickness of the diamond feed layer is at a portion of the diamond feed layer adjacent to the inner edge side of the refractory container.
- the minimum thickness of the diamond feed layer is at a portion of the diamond feed layer distally radially separated from the inner edge side of the refractory container.
- Other configurations can also be used, including having the thickness of a portion of the diamond feed layer, as measured in a direction parallel to the axis of the assembly between the second side of the substrate and the inner bottom side of the refractory container, vary as a function of radial position; vary at a constant rate as a function of radial position; vary at a variable rate as a function of radial position; vary radially according to a polynomial function; or constant as a function of radial position.
- the polycrystalline diamond cutter includes: a substrate including a first side, a second side opposite the first side, and an edge side connecting the first side to the second side, wherein a periphery of the first side intersects with the edge side, and a portion of the first side is included in a diamond cutter mounting surface; and a diamond body including a first side, a second side opposite the first side, and an edge side connecting the first side to the second side, wherein a periphery of the second side intersects with the edge side and a portion of the second side is included in a diamond body working surface; wherein the first side of the diamond body is attached to the second side of the substrate, wherein the edge side of the diamond body is substantially aligned with the edge side of the substrate along an axis of the cutter; wherein at least a portion of the surface of the concave portion on the second side of the diamond body includes a plurality of exposed sintered diamond particles that retain a physical structure of as-
- the concave portion extends radially inward from a peripheral region adjacent to the edge side toward the axis of the cutter.
- the second side of the diamond body includes a chamfered portion in a peripheral region adjacent to the edge side.
- a concave portion includes one or more of a spherical segment, a frustum of a cone, and a hyperboloid.
- the maximum thickness of the diamond body is at a portion of the diamond body adjacent to the edge side connecting the first side to the second side.
- the minimum thickness of the diamond body as measured in a direction parallel to the axis of the cutter between the first side and the second side, is at a portion of the diamond body distally radially separated from the edge side connecting the first side to the second side.
- the thickness of a portion of the diamond body varies as a function of radial position; varies at a constant rate as a function of radial position; varies at a variable rate as a function of radial position; varies radially according to a polynomial function; or is constant as a function of radial position.
- FIG, 1 shows an example of a tool used In the drilling Industry, in this case a conventional drag bit.
- FIG. 2A shows a schematic perspective view of a conventional cylindrical shaped polycrystalline diamond cutter
- FIG. 2B shows a conventional cylindrical shaped polycrystalline diamond cutter in cross-sectional view, including optional chamfers or beveled surfaces at an edge of the diamond table.
- FIGS. 3A-3C are schematic representations of a sweep of molten catalyst material moving through a packed bed of polycrystalline diamond particles.
- FIG. 3D shows a cross-sectional schematic of a refractory container having an inner bottom side including a convex portion (or an outer bottom side including a concave portion)
- FIG. 3E is a photograph of a cross-sectioned refractory container having an inner bottom side including a convex portion (or an outer bottom side including a concave portion).
- FIG. 4A shows a cross-sectional view of an assembly used in a method of making a near net shape polycrystalline diamond cutter, the assembly including a refractory container, a diamond feed layer, and a substrate, the refractory container having an inner bottom side Including a convex portion protruding into the diamond feed layer.
- FIGS. 4B, 4C, 4D, and 4E shows, in cross-section, various alternative shapes that a portion (Portion D in FIG. 4A) of the interface between the substrate and the diamond feed layer can have.
- FIG. 4F shows a cross-sectional view of another embodiment of an assembly used in a method of making a near net shape polycrystalline diamond cutter, the assembly including a refractory container, a diamond feed layer, and a substrate, the refractory container having an inner bottom side including a convex-like portion that includes a complex surface that includes surfaces of different angles relative to the axis.
- FIG. 4G shows a cross-sectional view of another embodiment of an assembly used in a method of making a near net shape polycrystalline diamond cutter, the assembly including a refractory container, a diamond feed layer, a substrate, and an insert at the bottom of the refractory container, the insert including a convex portion protruding into the diamond feed layer.
- FIG. 4H shows a cross-sectional view of an embodiment of an assembly used in a method of making a near net shape polycrystalline diamond cutter, the assembly including a refractory container, a diamond feed layer, and a substrate, the substrate side adjacent to the diamond feed layer including a convex portion protruding into the diamond feed layer.
- FIGS. 5A, 5B, and 5C show cross-sectional views of several embodiments of an assembly during a sweep-through HPHT sintering process; the arrows indicate the general directions of the catalyst sweep through the diamond feed layer.
- FIG. 6A shows a cross-sectional view of a first embodiment of a polycrystalline diamond cutter Including a substrate and diamond body, the end of the diamond body, distally axially separated from the substrate, including a concave portion.
- the dotted lines indicate various planar, cylindrical, conical, or hyperboloid surfaces along which the as- sintered diamond cutter can be finish machined by laser cutting, electrical discharge machining, grinding, lapping, and/or polishing; but this finish processing does not extend to the concave portion, and, therefore, at least a portion of the exposed sintered diamond particles on the surface of the concave portion retains the physical structure of the as- sintered diamond particles.
- FIG. 6B shows a cross-sectional view of a second embodiment of a polycrystalline diamond cutter including a substrate and diamond body, the end of the diamond body, distally axially separated from the substrate, including a concave portion.
- the dotted lines indicate various planar, cylindrical, conical, or hyperboloid surfaces along which the as- sintered diamond cutter can be finish machined by laser cutting, electrical discharge machining, grinding, lapping, and/or polishing; but this finish processing does not extend to the concave portion, and, therefore, at least a portion of the exposed sintered diamond partides on the surface of the concave portion retains the physical structure of the as- sintered diamond particles.
- FIG. 7 shows a cross-sectional view of polycrystalline diamond cutter including a substrate and diamond body, the substrate side adjacent to the diamond body including a convex portion protruding into the diamond body.
- the dotted lines indicate various planar, cylindrical, conical, or hyperboloid surfaces along which the as-sintered diamond cutter can be finish machined by laser cutting, electrical discharge machining, grinding, lapping, and/or polishing.
- the disclosure relates to methods of making near net shape polycrystalline diamond cutters, as well as to near net shape polycrystalline diamond cutters, which can be used in their as-sintered state, or which only need minimal post-sintering processing compared to cutters made by traditional methods.
- methods of manufacture include forming an assembly for subsequent high pressure - high temperature (HPHT) processing during which polycrystalline diamond particles, with the aid of a sintering promoting material, such as a catalyst, are consolidated and sintered into a diamond body that is bonded to the substrate.
- HPHT high pressure - high temperature
- a front of molten catalyst material sweeps or moves from an interface between the substrate and the diamond crystals toward a region of the diamond feed layer distally separated from the interface (FIGS. 3A-3C), where distally separated means both spatially separated from and at a distance from a reference location.
- the compressed diamond crystals 300 prior to any movement of molten sintering promoting material from its source, for example, the binder material in the substrate, the compressed diamond crystals 300 are in intimate direct contact with their nearest neighbors according to their ability to pack together under high pressure. The packing is not complete because the diamond crystals 300 are resistant to total crushing.
- the pre-sweep condition therefore includes open spaces 302 between the diamond crystals 300. Such open spaces 302 are subsequently filled with the molten sintering promoting material 304 as the sweep front 306 passes them (See FIGS. 3B and 3C).
- a“front” refers to the movement of molten sintering promoting material, such as molten catalyst material, through the diamond feed layer, that is, between and around the diamond crystals, filling in the spaces between the diamond crystals (see FIGS. 3B and 3C). It also refers, in some contexts, to a moving boundary between the unfilled spaces and the spaces filled with molten material.
- the front can be uniform, or non-uniform.
- the uniformity of a sweep front relates to the speed at which the molten sintering promoting material or the boundary or interface between molten and non-molten sintering promoting material advances through the assembly and the components located within the assembly.
- a non-uniform front may result when the speed of the catalyst material is higher in a region of the diamond feed layer adjacent to the side walls of the refractory cup, comparative to a lower speed of the catalyst material in a region of the diamond feed layer adjacent to a central axis of the assembly including the refractory cup, the substrate, and the diamond feed layer.
- the sintered diamond body may include structural differences between the various parts thereof where the sweep-through front arrived at different times, which further result in different and nonuniform mechanical performance of the various parts of the diamond body.
- the diamond body may include portions where the sweep did not reach the diamond feed layer, resulting in incomplete sintering or resulting in gaps between the diamond particles, such portions having a higher rate of wear and higher propensity to fracture compared to the rest of the diamond body.
- the diamond body can be further finished to remove the parts of the diamond body with these less than desirable mechanical properties resulted from the non-uniform sweep, but at the expense of disposing of large portions of the as-sintered diamond body.
- the method includes providing a shaped refractory cup and/or shaped substrate, and by implication a shaped diamond feed layer, that allows for alleviating the differences in the speed of the sweep front through the diamond feed layer, and minimal differences in the arrival time of the sweep front at the bottom of the refractory cup.
- This sweep-through HPHT sintering results in an as-sintered diamond body having improved mechanical properties such as resistance to wear and low propensity to fractures.
- the method of making a near net shape polycrystalline diamond cutter including a substrate and a diamond body includes forming an assembly including (along an axis of the assembly) a refractory container, a diamond feed layer, and a substrate.
- the forming of the assembly includes providing a refractory container including an inner bottom side, an outer bottom side, and an inner edge side; depositing a layer of diamond feed in the refractory container in contact with the inner bottom side; positioning a substrate over the diamond feed layer, the substrate including a first side and a second side opposite the first side; sealing the container, for example, by positioning a cap over the contents of the refractory container and sealing the container; and processing the assembly under high pressure high temperature sintering conditions (HPHT) from 5 GPa to 8 GPa, and from 1300 °C to 1600 6 C, to sinter the diamond feed into a diamond body affixed to the substrate; wherein the second side of the substrate is positioned over the diamond feed layer; and wherein at least one of the inner bottom side of the refractory container and the second side of the substrate includes a convex portion.
- HPHT high pressure high temperature sintering conditions
- FIG. 3D depicts a cross-sectional schematic of such a refractory container 310 having an inner bottom side including a spherical segment convex portion (or an outer bottom side Including a concave portion).
- FIG. 3E is a photograph of a cross-sectioned refractory container 310 having an inner bottom side including a convex portion (or an outer bottom side including a concave portion).
- the convex portion of the refractory container 310 includes one or more of a spherical segment, a frustum of a cone, and a hyperboloid.
- the refractory container 310 is typically made from a refractory alloy including one or more metals such as tantalum (Ta), niobium (Nb), molybdenum (Mo), and/or zirconium
- the refractory container 310 can be made by any suitable method.
- the refractory container 310 is seamless and is formed by a sheet metal forming process that includes a drawing operation, for example deep drawing.
- a convex or concave portion is present, it also can be formed by a sheet metal forming process that includes a drawing operation, for example deep drawing.
- An assembly 400, 420, 450, 470 can be formed in one of several ways.
- a layer of diamond feed 403 is placed in a refractory container 401 having an inner bottom side 409 including a convex portion
- Layer 403 can be formed by pouring or otherwise adding the diamond feed into the interior volume of the refractory container 401.
- the diamond feed 403 is distributed in a layer on the bottom of the refractory container 401 and has a desired distribution and thickness. In some embodiments, the diamond feed 403 is distributed in a variable thickness layer of between 1 mm and 5 mm.
- a carbide or other suitable substrate 404 is thereafter placed with its second side 408 on the diamond feed layer 403, creating a relatively planar interface 405.
- both sides of substrate 404 are generally planar and the diamond feed layer is shaped, on a first side, in conformity to the shape of a side of the substrate 404 and, on a second side, in conformity to the shape of the inner bottom side of the refractory cup 401, which has a convex portion 402 protruding into the diamond layer 403.
- the convex portion 402 of the refractory container includes one or more of a spherical segment, a frustum of a cone, and a hyperboloid.
- the maximum thickness of the diamond feed layer is at a portion of the diamond feed layer adjacent to the inner edge side of the refractory container.
- the minimum thickness of the diamond feed layer is at a portion of the diamond feed layer distally separated from the inner edge side of the refractory container.
- FIG. 4A for example, the convex portion 402 of the inner bottom side of refractory cup
- the thickness of the diamond feed layer 403 in a portion ⁇ " closer to the axis 407, is smaller than the thickness of the diamond feed layer 403 in a portion“C” radially distally separated from the axis 407.
- a portion of the substrate and a portion of the refractory container are substantially cylindrical and the thickness of a portion of the diamond feed layer, as measured in a direction parallel to the axis of the assembly between the second side of the substrate and the inner bottom side of the refractory container, varies as a function of radial position.
- the thickness of the diamond feed layer increases in a radial direction from the axis of the assembly toward the walls of the refractory container.
- any convex and concave diamond feed layer, or refractory cup portions described herein can take any convex and/or concave shape or form as described for example by reference to the shape or form of its cross-section.
- the convex portion 402 as described for example in FIG. 4A can take any shape or form, for example as described by the shape of a portion of its cross-section (see FIGS. 4A, 4B, 4C, 4D, and 4E, detail“D").
- the thickness of a portion of the diamond feed layer varies at a constant rate as a function of radial position.
- the thickness of the diamond feed layer increases at a constant rate in a radial direction from the axis of the assembly toward the walls of the refractory container.
- the cross-section of a convex portion can include a straight line 410 at an angle to interface 405, therefore the thickness increases at a constant rate (FIG. 4B, detail“D").
- the thickness of a portion of the diamond feed layer varies at a variable rate as a function of radial position.
- the thickness of the diamond feed layer increases at a variable rate in a radial direction from the axis of the assembly toward the walls of the refractory container.
- the cross-section of a convex portion can include two straight lines 412 at an angle to each other, and at an angle to interface 405, therefore varying the rate at which the thickness increases (FIG.
- the cross-section of a convex portion can include a curve 414 also varying the rate at which the thickness increases (FIG. 4D, detail
- the thickness of a portion of the diamond feed layer varies radially according to a polynomial function.
- the thickness of the diamond feed layer increases according to a polynomial function in a radial direction from the axis of the assembly toward the walls of the refractory container.
- the curve 414 shown in FIG. 4D is an example of a surface that varies as a polynomial function, but other polynomial functions can also be used.
- a function y ox 2 + bx + c can be used.
- the thickness of a portion of the diamond feed layer is constant as a function of radial position.
- the thickness of the diamond feed layer is constant in a radial direction from the axis of the assembly toward the walls of the refractory container.
- the cross-section of a convex portion can include a straight line 416 parallel to the cross-section of the interface 405
- the inner bottom side of the refractory container can have a convex-like portion that includes a complex surface but retains an overall convex character across the area of the inner bottom side.
- an assembly 420 can also be formed as shown in FIG. 4F along an axis 427.
- a layer of diamond feed 423 is located in a refractory container 421 having an inner bottom side 429 including a convex- like portion 422 that includes a complex surface.
- the layer 423 can be formed by pouring or otherwise adding the diamond feed into the interior volume of the refractory container
- the diamond feed 423 is distributed in a layer on the bottom of the refractory container 421 and has a desired distribution and thickness, for example, is distributed in a variable thickness layer of between 1 mm and 5 mm.
- a carbide or other suitable substrate 424 is thereafter placed with its second side 428 on the diamond feed layer 423 creating an interface 425.
- the complex surface of the convex-like portion 422 includes surfaces 430 of different angles relative to the axis 427.
- the complex surface includes portions that project toward the interior volume of the refractory container
- the overall character of the shape of the inner bottom side 429 is convex (when considered, in cross-sectional view, from a first end 432 of the inner bottom side 429 to a second end 434 of the inner bottom side 429).
- the angular positioning of at least some of the surfaces 430 of the convex-like portion 422 of the inner bottom side 429 can mirror the surfaces of the second side 428 of the substrate 424.
- this mirroring can result in a diamond feed layer 423 having a constant thickness In that region (as measured in a direction parallel to the axis of the cutter between the first side and the second side).
- An assembly 450 can also be formed as shown in FIG. 4G along an axis 457.
- a variable thickness diamond feed layer 455 can be prepared in an otherwise relatively planar inner bottom side refractory cup 451 , by using an insert 453 having a convex portion 454.
- Layer 455 can be formed by pouring or otherwise adding the diamond feed into the interior volume of the refractory container 451 that includes insert 453 sitting on the flat end 452 of container 451.
- the diamond feed 455 is distributed in a layer over insert 453, and has a desired distribution and thickness.
- the convex portion 454 of insert is distributed in a layer over insert 453, and has a desired distribution and thickness.
- the diamond feed 455 functions as an inner bottom side of the refractory cup having a convex portion.
- the diamond feed 455 is distributed in a variable thickness layer of between 1 mm and 5 mm.
- a carbide or other suitable substrate 456 is thereafter placed on the diamond feed layer 455, typically with the second side 459 toward the diamond feed layer 455.
- assembly 450 includes sweep convergence reservoirs 458 (FIG. 4G, detail“A”), which are generally the lowest portions of the volume created between the refractory cup 451 and insert 453, the reservoirs occupying a relatively low fraction of the volume.
- the catalyst solid can be incorporated into any of the assemblies disclosed herein whether using a refractory container having an inner bottom side Including a convex portion protruding into the diamond feed layer, or a substrate having a convex portion protruding into the diamond feed layer.
- Sealing can be by any suitable means that secures the components and contents in the refractory container.
- portions of the ends of the cup can be crimped over the substrate surface.
- a cap typically of the same material as the refractory container, can optionally be placed over the formed assembly, to cover the contents of the refractory container before sealing.
- the cap can be a disc or foil or similar planar structure that is placed over the opening of the container and its content, and then the peripheral edge of the cap and the peripheral edge of the opening of the container are crimped or otherwise pressed together or folded over so as to seal the cap and the container to form a capped assembly.
- the cap is typically of the same material as the refractory container, e.g., tantalum.
- Assemblies formed as described herein can be processed under high pressure - high temperature (HPHT) processing conditions.
- One or more assemblies are loaded into a cell for high pressure - high temperature (HPHT) processing.
- the cell includes a gasketing material which transmits pressure and retains the contents of the cell under pressure, a heating element the assemblies, and insulating materials.
- An example of a suitable cell is disclosed in U.S. Patent No. 4,807,402, the entire contents of which are incorporated herein by reference. The cell is then subjected to high pressure
- the HPHT sintering methods described herein include a sweep-through step of molten catalyst through the diamond feed layer, the sweep including a front of catalyst generally moving from the interface between the substrate and the diamond feed layer, toward the bottom of the refractory container.
- the diamond feed layer is formed with a variable thickness, a feature which alleviates any discrepancies between the relative speed of the sweep through various portions of the diamond feed layer, ensuring that the sweep reaches the bottom of the refractory container at generally the same time across its entire surface, and/or cross-section.
- 5A and 5B also exists with respect to the assembly 420 shown and described in FIG. 4F.
- the sweep converges in sweep convergence reservoirs 438, occupying a relatively low fraction of the lower volume of the refractory container.
- Assembly 570 in FIG. 5C can be used in an HPHT sintering method as described herein. For example and with respect to the assembly as shown and described in FIG.
- the sweep starting at the interface between side 574 of the substrate can move faster through a region of the diamond feed layer 572 adjacent to the container 571 inner walls, and slower through a region of the diamond feed layer 572 adjacent to the central axis
- the diamond feed layer 572 is relatively thicker at the region of the diamond feed layer adjacent to the container 571 inner walls, and thinner at the region of the diamond feed layer 572 adjacent to the central axis 577 of the assembly 570, and thus the sweep is reaching the bottom of the container at relatively the same time across its entire surface or cross-section.
- the sweep then converges in sweep convergence reservoirs 576, which occupy a relatively low fraction of the lower volume of the refractory container. Without wishing to be bound by any particular theory, it is believed that any residual discrepancy in the quality and/or uniformity of the sweep penetration through the diamond feed layer is isolated to the relatively smaller volume of the sweep convergence reservoirs 576.
- the methods described herein can further include finishing steps or finish machining of the diamond body to final form. Such processing can include finish wire shaping or grinding of the surfaces of the diamond body, lapping or grinding of the diamond body to planarize some portions of the top surface of the diamond body, grinding to add a bevel or chamfer to the diamond body and/or substrate, rotational grinding to finish grind the cylindrical sides of the cutter, and leaching of the catalyst in one or more portions of the diamond body.
- the methods include finish machining the diamond body.
- finish machining includes one or more of laser cutting, electrical discharge machining, grinding, lapping, and polishing.
- the method further includes leaching a portion of the sintered diamond body to form interstitial regions substantially free of catalyst material or sintering residue thereof.
- Interstitial regions are microstructural features of the sintered diamond body that refers to the spaces within the matrix phase of the sinter bonded polycrystalline diamond material typically occupied by a catalyst material like Co and/or fillers upon formation of the sintered diamond body using HPHT techniques and which form empty spaces, pores or voids as a result of the catalyst material being removed therefrom in, for example, a subsequent leaching step.
- the diamond body portion including interstitial regions substantially free of catalyst material or sintering residue thereof extends from a working surface Into an interior volume of the diamond body.
- the removal of catalyst, such as cobalt, from diamond bodies improves abrasion resistance of the diamond body.
- Such leaching can occur in at least a portion of the diamond body and renders the diamond body in that portion substantially free of catalyst material.
- Leaching can occur, for example, by chemical etching in acids in which portions to be leached are exposed to an acid or a mixture of acids, such as aqua regia, for a period of time sufficient to dissolve the catalyst material to a depth from the surface of the diamond body. The time varies by strength of acid, temperature and pressure as well as the desired depth. Exemplary depths from which the catalyst material has been removed range from 50 microns to 800 microns, alternatively less than 300 microns or less than 200 microns or less than 100 microns.
- the depth may be at least half of the overall thickness of the diamond body, but the depth is no closer to the interface between the lower side of the diamond body and the upper side of the substrate than about 200 microns.
- the disclosure also relates to a polycrystalline diamond cutter per se.
- the polycrystalline diamond cutter includes a substrate including a first side, a second side opposite the first side, and an edge side connecting the first side to the second side, wherein a periphery of the first side intersects with the edge side, and a portion of the first side is included in a diamond cutter mounting surface; and a diamond body including a first side, a second side opposite the first side, and an edge side connecting the first side to the second side, wherein a periphery of the second side intersects with the edge side and a portion of the second side is included in a diamond body working surface; wherein the first side of the diamond body is attached to the second side of the substrate, wherein the edge side of the diamond body is substantially aligned with the edge side of the substrate along an axis of the cutter; wherein the second side of the diamond body includes a concave portion, and wherein at least a portion of the surface of the concave portion on
- the concave portion 603 of the diamond body 602 has the general shape of the convex portion of the inner bottom side of the refractory container used to make the cutter.
- the minimum thickness of the diamond body as measured in a direction parallel to the axis of the cutter between the first side and the second side, is at a portion of the diamond body distally separated from the edge side connecting the first side to the second side.
- a portion of the edge side of the diamond body and the edge side of the substrate are cylindrical.
- the thickness of a portion of the diamond body varies as a function of radial position. In some embodiments, the thickness increases radially in a direction from the axis of the polycrystalline cutter toward an outer circumference of the polycrystalline cutter. As shown in FIG. 6A detail“D" for example, the thickness of the diamond body in a portion
- the manner and direction of thickness variation in a diamond body include a) increase at a constant rate radially in a direction from the axis of the polycrystalline cutter toward an outer circumference of the polycrystalline cutter; b) increases radially at a variable rate in a direction from the axis of the polycrystalline cutter toward an outer circumference of the polycrystalline cutter; c) increase according to a polynomial function radially in a direction from the axis of the polycrystalline cutter toward an outer circumference of the polycrystalline cutter; and/or d) remain constant as a function of radial position.
- a function y - ax 2 + bx + c can be used.
- a convex and/or concave portion of a diamond body described herein includes one or more of a spherical segment, a frustum of a cone, and a hyperboloid.
- the features and geometry of the substrate and the diamond body that form the polycrystalline diamond cutter can vary, and the various embodiments of the polycrystalline diamond cutter can be further processed to final form.
- processing can include finish wire shaping or grinding of the surfaces of the passage, lapping or grinding of the diamond body to planarize the top surface of the grinder, grinding to add a bevel or chamfer to the diamond body and/or substrate, rotational grinding to finish grind the cylindrical sides of the cutter, and leaching of the catalyst in one or more portions of the diamond body.
- further processing includes machining along various surfaces, including planar, cylindrical, or hyperboloid surfaces.
- a diamond cutter 600 including the as-sintered diamond body 602 can be machined to: i) reduce the height of the substrate by machining along plane 605; ii) reduce the overall diameter and/or circumference of the cutter by machining along cylinder 604; iii) reduce the height of the diamond body by machining along plane 606; and/or iv) add chamfered and/or beveled surfaces by machining along the frustum of cone 607.
- Such machining generally removes the mass of the diamond body 602 that includes the sweep convergence reservoirs, such as the peripheral protuberances 620 having the general shape of sweep convergence reservoirs present in the refractory containers used to make the cutter.
- the maximum thickness of the diamond body 702, as measured in a direction parallel to the axis 709 of the cutter 700 between the first side 710 including concave portion 704, and the second side 703, is at a region 711 of the diamond body 702 adjacent to the edge side 712 connecting the first side 710 to the second side 703.
- diamond cutter 700 including the as-sintered diamond body 702 can be machined to: i) reduce the height of the substrate by machining along plane 706; ii) reduce the overall diameter and/or circumference of the cutter by machining along cylinder 705; iii) reduce the height of the diamond body by machining along plane 707; and/or iv) add chamfered and/or beveled surfaces by machining along the frustum of cone 708.
- an exemplary polycrystalline diamond cutter 650 formed using the assembly 420 of FIG. 4F includes (along an axis 670) a substrate 654, and a diamond body 652.
- the second side 672 of the diamond body 652 includes a concave portion 680 extending radially inward from a peripheral region 674 adjacent to the edge side 676 toward the axis 670 of the cutter.
- the concave portion 680 of the diamond body 652 has the general shape of the convex portion 422 of the inner bottom side of the refractory container 421 used to make the cutter (see FIG. 4F).
- the first side 678 of the diamond body 652 is attached to the substrate 654.
- the exemplary polycrystalline diamond cutter 650 formed using the assembly 420 of FIG. 4F can be further processed by machining along various surfaces
- planar, cylindrical, or hyperboloid surfaces For example, and as shown In FIG.
- the diamond cutter 650 with as-sintered diamond body 652 and substrate 654 formed using the assembly 420 in FIG. 4F can be machined to: i) reduce the height of the substrate by machining along plane 660; ii) reduce the overall diameter and/or circumference of the cutter by machining along cylinder 662; iii) reduce the height of the diamond body by machining along plane 664; and/or iv) add chamfered and/or beveled surfaces by machining along the frustum of cone 666.
- Such machining generally removes the mass of the diamond table 652 that includes the sweep convergence reservoirs, such as the peripheral protuberances 656 having the general shape of sweep convergence reservoirs present in the refractory containers used to make the cutter.
- finish machining such as laser cutting, electrical discharge machining, grinding, lapping, and/or polishing
- the reservoir regions and sides can be further finish machined as long as the concave portion 680 (or at least a portion of the concave portion, alternatively a majority portion of the area of the concave portion or at least 75% of the area of the concave portion) is not finish machined.
- the portion of the concave portion indicated by dashed line 682 can be the portion that is not finish machined. Such a portion may be, but is not necessarily, symmetric about axis 670.
- any residual refractory cup from the HPHT process that remains in contact with or attached to the concave portion 603, 680 can be removed by acid leaching with, e.g., HCI or aqua regia, or by grit blasting with media such as SiC,
- the exposed sintered diamond particles on such treated/blasted surfaces retain the physical structure of the as-sintered diamond particles, for example, the crystal facets of the as-sintered diamond partides.
- the surface of the concave portion 680 (alternatively a majority portion of the surface of the concave portion or at least 75% of the surface of the concave portion) retain the physical structure of the as-sintered diamond pumice.
- the surface of the concave portion is finish machined as in conventional processing, e.g., with laser cutting, electrical discharge machining, grinding, lapping, and/or polishing, the surface of the concave portion is altered by the mechanical process of removal and the crystal facets of exposed, as-sintered diamond particles do not have the physical structure of the as-sintered diamond particles.
- the beveled or chamfered surfaces described herein can have any size.
- the beveled or chamfered surface may have a vertical height, i.e., length in the axial direction, of 0.5 mm to about 1 mm and an angle of 45 degrees which may provide a particularly strong and fracture resistant tool component.
- the beveled or chamfered surface has a vertical height, i.e,, length in the axial direction, which is the same as the thickness, i.e., axial thickness, of the planar oriented portion.
- the diamond bodies described herein include a plurality of bonded diamond crystals and a plurality of interstitial regions.
- the composition of diamond bodies described herein includes sintered diamond particles sized between about 1 micron to about 50 microns, and a catalyst metal phase between about 8 percent by weight (wt.%) to about 25 percent by weight (wt.%).
- the diamond bodies are formed integrally to the substrate through a high pressure - high temperature sintering process as described herein during which catalyst diffuses into the diamond body and not only densities the diamond body, but also serves to mechanically bond the diamond body to the substrate.
- a portion of the interstitial regions include a catalyst material or catalyst material sintering residue. In some embodiments, a portion of the interstitial regions are substantially free of catalyst material or catalyst material sintering residue. In some embodiments, the portion of the diamond body including interstitial regions substantially free of catalyst material or catalyst material sintering residue, extends from the working surface into an interior volume of the diamond body.
- the refractory cup, insert, substrate, diamond feed layer and type of concave portion can be mixed and matched and intermingled from any of the several embodiments described and disclosed herein to form additional embodiments.
- the exemplary cutters described and disclosed herein can be incorporated in drilling tools used, for example, in drilling geological formations.
- drilling tools can incorporate flushing media supplied to the drill head to facilitate removing debris from the drilling zone as well as to remove heat from the drill head that Is generated in the drilling operation.
- drilling tools include drag bits having polycrystalline diamond cutters arranged along a periphery region of a fin or blade.
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Abstract
L'invention concerne des dispositifs de coupe en diamant à lignes polycristallines (600, 650) et leurs procédés de fabrication, les dispositifs de coupe (600, 650) comprenant un substrat (601, 654) et un corps en diamant (602, 652), le corps en diamant (602, 652) ayant au moins un côté comprenant une partie concave et au moins une partie de la surface de la partie concave (603, 680) sur le second côté du corps de diamant (602, 652) comprend une pluralité de particules de diamant frittées apparentes qui conservent une structure physique de particules de diamant frittées.
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US11719050B2 (en) | 2021-06-16 | 2023-08-08 | Baker Hughes Oilfield Operations Llc | Cutting elements for earth-boring tools and related earth-boring tools and methods |
US11920409B2 (en) | 2022-07-05 | 2024-03-05 | Baker Hughes Oilfield Operations Llc | Cutting elements, earth-boring tools including the cutting elements, and methods of forming the earth-boring tools |
US12049788B2 (en) | 2020-02-05 | 2024-07-30 | Baker Hughes Oilfield Operations Llc | Cutter geometry utilizing spherical cutouts |
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US12049788B2 (en) | 2020-02-05 | 2024-07-30 | Baker Hughes Oilfield Operations Llc | Cutter geometry utilizing spherical cutouts |
US11719050B2 (en) | 2021-06-16 | 2023-08-08 | Baker Hughes Oilfield Operations Llc | Cutting elements for earth-boring tools and related earth-boring tools and methods |
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US11920409B2 (en) | 2022-07-05 | 2024-03-05 | Baker Hughes Oilfield Operations Llc | Cutting elements, earth-boring tools including the cutting elements, and methods of forming the earth-boring tools |
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