WO2020118874A1 - Method for preparing display - Google Patents

Method for preparing display Download PDF

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Publication number
WO2020118874A1
WO2020118874A1 PCT/CN2019/072834 CN2019072834W WO2020118874A1 WO 2020118874 A1 WO2020118874 A1 WO 2020118874A1 CN 2019072834 W CN2019072834 W CN 2019072834W WO 2020118874 A1 WO2020118874 A1 WO 2020118874A1
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Prior art keywords
layer
organic layer
pixel
sub
pixel organic
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PCT/CN2019/072834
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French (fr)
Chinese (zh)
Inventor
顾宇
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武汉华星光电半导体显示技术有限公司
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Publication of WO2020118874A1 publication Critical patent/WO2020118874A1/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

Definitions

  • the present invention relates to the field of displays, and in particular to a method for preparing displays.
  • Organic light-emitting device due to its ability to actively emit light, can work at low temperatures, light-emitting response speed, wide viewing angle, high efficiency, can be made flexible display device, driving voltage and low energy consumption, etc.
  • OLED organic light-emitting device
  • OLED displays have been given more expectations, such as a wider color gamut, higher contrast, lower energy consumption, and higher resolution.
  • Figures 1 and 2 The traditional RGB sub-pixel arrangement is shown in Figures 1 and 2.
  • the three sub-pixels of the red, green and blue primary colors are used for arrangement.
  • Figure 1 shows the arrangement of the sub-pixels side by side
  • Figure 2 shows the arrangement of the sub-pixels pentile.
  • the large material area reduces the difficulty of the process and reduces the cost, but the clarity will also be reduced.
  • FMM Feine-Metal-Mask, precision mask
  • the production, transportation, cleaning, and maintenance costs of FMM are relatively high.
  • the production method of high-resolution FMM is only mastered by a few manufacturers and has limited production capacity. Therefore, it is necessary to develop new high-resolution display manufacturing technology.
  • the technical difficulty of the existing high-PPI FMM is that in order to reduce the shadow effect of the mask, an ultra-thin mask is required. It is very difficult to make holes in such a thin metal sheet and ensure that the openings and the pixel area of the substrate can be accurately aligned even after the mask is opened.
  • the purpose of the present invention is to solve the problem that the manufacturing, transportation, cleaning and maintenance of precision mask plates are relatively high in the existing OLED production process. Opening holes in ultra-thin mask plates and ensuring that the mask plates are still opened It can make technical problems such as the difficulty of accurately aligning the opening and the pixel area of the substrate.
  • the present invention provides a method for manufacturing a display, including the following steps: S1 pixel definition layer preparation step, providing a substrate on which a pixel definition layer is coated, including more than two pixel unit areas; S2 through hole setting Step, the pixel definition layer in each pixel unit area is provided with three through holes, namely a first through hole, a second through hole and a third through hole; S3 the first functional layer preparation step, on the pixel definition layer A first functional layer is evaporated; S4 pixel organic layer preparation step, three sub-pixel organic layers are prepared in sequence, corresponding to three through holes; S5 second functional layer preparation step, vapor deposition on the pixel functional layer A second functional layer; and an S6 electrode layer preparation step, an electrode layer is evaporated on the upper surface of the second functional layer.
  • the pixel organic layer preparation step includes, in order: S41 a first sub-pixel organic layer preparation step to prepare a first sub-pixel organic layer; S42 a second sub-pixel organic layer preparation step to prepare a second sub-pixel organic layer; And S43 a third sub-pixel organic layer preparation step to prepare a third sub-pixel organic layer.
  • the first sub-pixel organic layer preparation step includes: S411 first sulfur layer preparation step, using a mask to block the first through hole and its surrounding area, and steaming on the first functional layer The first sulfur layer is plated and the mask is removed; S412 the first pixel organic layer preparation step, a first pixel organic layer material is evaporated on the upper surface of the first functional layer to obtain a first pixel organic layer ; And S413 the first heating step, heating the substrate, so that the first sulfur layer is evaporated or sublimed, the first pixel organic layer above the first sulfur layer is stripped, and the remaining first pixel organic layer is the first A sub-pixel organic layer.
  • the second sub-pixel organic layer preparation step includes: S421 second sulfur layer preparation step, using a mask to block the second through hole and its surrounding area, in the first sub-pixel organic layer And a second sulfur layer is vapor-deposited on the first functional layer to remove the mask plate; S422 second pixel organic layer preparation step, a second pixel organic layer is vapor-deposited on the upper surface of the first functional layer Material to obtain a second pixel organic layer; and S423 the second heating step, heating the substrate so that the second sulfur layer evaporates or sublimes, the second pixel organic layer above the second sulfur layer is peeled off, remaining The second pixel organic layer is the second sub-pixel organic layer.
  • the step of preparing the third sub-pixel organic layer includes: a step of preparing a third sulfur layer of S431, a third mask is used to block the third through hole and its surrounding area, and the first sub-pixel organic layer and A third sulfur layer is vapor-deposited on the second sub-pixel organic layer to remove the mask; S432 third pixel organic layer preparation step, a third pixel organic layer is vapor-deposited on the upper surface of the first functional layer Layer material to obtain a third pixel organic layer; and a third heating step of S433, heating the substrate so that the third sulfur layer is evaporated or sublimed, and the third pixel organic layer above the third sulfur layer is stripped, The remaining third organic layer is the third sub-pixel organic layer.
  • first sub-pixel organic layer, the second sub-pixel organic layer and the third sub-pixel organic layer in the same pixel unit area are connected in sequence.
  • the first sub-pixel organic layer, the second sub-pixel organic layer, and the third sub-pixel organic layer are one of a green organic layer, a blue organic layer, and a red organic layer and are different from each other.
  • the first functional layer includes at least one of a hole injection layer and a hole transport layer.
  • the second functional layer includes at least one of a hole blocking layer, an electron transport layer, and an electron injection layer.
  • the electrode layer includes a light extraction layer.
  • the technical effect of the present invention is to replace the original precision masks with different sizes and shapes of through holes by ordinary masks with large through holes, without using precision masks, a high pixel density display can be prepared, and the manufacturing process is reduced The difficulty and cost savings. Taking advantage of sulfur's volatile and sublimable characteristics, the organic layer material above the sulfur layer covered area is stripped away, leaving the sub-pixel organic layer not covered by the sulfur layer, achieving the purpose of high pixel density display. Aperture ordinary mask is easier to operate than precision mask, and it greatly reduces cleaning and maintenance costs.
  • FIG. 1 is an arrangement diagram of a conventional RGB sub-pixel in the prior art
  • FIG. 3 is a flowchart of a method for manufacturing a display according to an embodiment of the invention.
  • FIG. 4 is a schematic structural diagram of a display after the step of setting a through hole according to an embodiment of the present invention.
  • FIG. 5 is a schematic structural diagram of a display after the first functional layer preparation step according to an embodiment of the present invention.
  • FIG. 6 is a flowchart of steps for preparing a pixel organic layer according to an embodiment of the invention.
  • FIG. 7 is a flowchart of steps for preparing a first sub-pixel organic layer according to an embodiment of the invention.
  • FIG. 8 is a schematic structural diagram of a display after the first sulfur layer preparation step according to an embodiment of the present invention.
  • FIG. 9 is a schematic structural diagram of a display after a step of preparing a first pixel organic layer according to an embodiment of the present invention.
  • FIG. 10 is a schematic structural diagram of a display during the first heating step according to an embodiment of the present invention.
  • FIG. 11 is a schematic structural diagram of a display after the first heating step according to an embodiment of the present invention.
  • FIG. 13 is a schematic structural diagram of a display after the second sulfur layer preparation step according to an embodiment of the present invention.
  • FIG. 14 is a schematic diagram of the display structure after the step of preparing the second pixel organic layer according to the embodiment of the present invention.
  • FIG. 15 is a schematic structural diagram of a display during a second heating step according to an embodiment of the present invention.
  • 16 is a schematic structural diagram of a display after a second heating step according to an embodiment of the present invention.
  • 17 is a flowchart of steps for preparing a third sub-pixel organic layer according to an embodiment of the present invention.
  • FIG. 18 is a schematic structural diagram of a display after the third sulfur layer preparation step according to an embodiment of the present invention.
  • FIG. 19 is a schematic structural diagram of a display after a step of preparing a third pixel organic layer according to an embodiment of the present invention.
  • FIG. 20 is a schematic structural diagram of a display during a third heating step according to an embodiment of the present invention.
  • 21 is a schematic structural diagram of a display after a third heating step according to an embodiment of the present invention.
  • FIG. 22 is a schematic diagram of the display structure after the step of preparing the second functional layer according to the embodiment of the present invention.
  • FIG. 23 is a schematic structural diagram of the display after the preparation is completed according to an embodiment of the present invention.
  • Pixel definition layer 21, through hole; 211, first through hole; 212, second through hole; 213, third through hole;
  • the component When certain components are described as “on” another component, the component may be directly placed on the other component; there may also be an intermediate component, which is placed on the intermediate component , And the intermediate component is placed on another component.
  • the two When a component is described as “installed to” or “connected to” another component, the two can be understood to be “installed” or “connected” directly, or a component “installed to” or “connected to” through an intermediate component Another component.
  • the present invention provides a method for manufacturing a display, which specifically includes steps S1 to S6.
  • S1 The step of preparing the pixel definition layer, providing the substrate 1, coating a layer of pixel definition layer material on the surface of the substrate 1 to obtain the pixel definition layer 2, including more than two pixel unit regions.
  • the pixel defining layer 2 in each pixel unit area is provided with three through holes 21, namely a first through hole 211, a second through hole 212, and a third through hole 213, the first through hole 211,
  • the second through hole 212 and the third through hole 213 penetrate through the pixel definition layer 2 and are attached to the upper surface of the substrate 1.
  • the first through hole 211, the second through hole 212, and the third through hole 213 It is one of R, G, and B pixel vias, which are different from each other (see Figure 4).
  • the first functional layer preparation step using a common mask with a large opening to evaporate the first functional layer 3 on the pixel definition layer 2, the first functional layer 3 includes at least one of a hole injection layer and a hole transport layer Species (see Figure 5).
  • the S4 pixel organic layer preparation step sequentially prepares three sub-pixel organic layers, including the S41 first sub-pixel organic layer preparation step to prepare the first sub-pixel organic layer; S42 the second sub-pixel organic layer preparation step , Preparing a second sub-pixel organic layer; and S43 preparing a third sub-pixel organic layer, preparing a third sub-pixel organic layer.
  • the step of preparing the organic layer of the first sub-pixel in S41 specifically includes steps S411 to S413.
  • the first sulfur layer preparation step a first mask layer is used to block the first through hole 211 and its surrounding area, and the first sulfur layer 401 is vapor-deposited on the first functional layer 3, without considering the shadow effect, only covering the second sulfur layer
  • the first functional layer 3 above the through hole 212 and the third through hole 213 need not cover the first functional layer 3 above the first through hole 211 (see FIG. 8 ).
  • S412 Step of preparing the first pixel organic layer, using a common mask with a large opening to vapor-deposit a first pixel organic layer material on the upper surface of the first functional layer 3 to obtain a first pixel organic layer (see FIG. 9).
  • the entire surface of the substrate 1 is heated to evaporate or sublimate the sulfur layer, and at the same time, the organic layer of the first pixel attached to the first sulfur layer 401 is peeled off (refer to FIG. 10)
  • the first pixel organic layer is the first sub-pixel organic layer 41 (see FIG. 11).
  • step S42 of preparing the second sub-pixel organic layer specifically includes steps S421-S423.
  • the entire surface of the substrate 1 is heated, so that the second sulfur layer 402 evaporates or sublimes, and at the same time, the organic layer of the second pixel attached to the second sulfur layer 402 is peeled off (see FIG. 15), leaving The second pixel organic layer is the second sub-pixel organic layer 42 (see FIG. 16).
  • the step of preparing the organic layer of the third sub-pixel in S43 specifically includes steps S431 to S433.
  • S431 a third sulfur layer preparation step, using a mask to block the third through hole 213 and its surrounding area, and depositing a third sulfur layer 403 on the first sub-pixel organic layer 41 and the second sub-pixel organic layer 42, Regardless of the shadow effect, only the first sub-pixel organic layer 41 and the second sub-pixel organic layer 42 are covered, and the first functional layer 3 of the third through hole 213 is not covered (see FIG. 18 ).
  • the third heating step is to heat the entire surface of the substrate 1 to evaporate or sublimate the third sulfur layer 403, and at the same time, the organic layer of the third pixel attached to the third sulfur layer 403 is peeled off (see FIG. 20) and exposed The first sub-pixel organic layer 41 and the second sub-pixel organic layer 42, and the remaining third pixel organic layer is the third sub-pixel organic layer 43 (see FIG. 21 ).
  • the first sub-pixel organic layer 41, the second sub-pixel organic layer 42, and the third sub-pixel organic layer 43 in the same pixel unit area are connected in sequence, the first sub-pixel organic layer 41, the second sub-pixel organic layer 42, and the third sub-pixel
  • the organic layer 43 is one of a green organic layer, a blue organic layer, and a red organic layer and is different from each other, that is, the order of the preparation steps of the green organic layer, the blue organic layer, and the red organic layer may be Arbitrary exchange does not affect the final display production.
  • a second functional layer 5 is vapor-deposited on the upper surface of the pixel organic layer 4 using a common mask with a large opening, and the second functional layer 5 includes a hole blocking layer, an electron transport layer, and electrons At least one of the injection layers (see FIG. 22).
  • an electrode layer 6 is vapor deposited on the upper surface of the second functional layer 5 using a common mask plate with a large opening, the electrode layer 6 is a cathode layer, including a CPL (Capping layer, light extraction layer), and finally The prepared display is shown in FIG. 23.
  • CPL Capping layer, light extraction layer
  • the display includes a substrate 1, a pixel definition layer 2, a first functional layer 3, a pixel organic layer 4, a second functional layer 5, and an electrode layer 6.
  • the pixel definition layer 2 is provided on the upper surface of the substrate 1, three through holes 21 penetrate downwardly through the pixel definition layer 2 and are attached to the upper surface of the substrate 1; the first functional layer 3 is attached to the pixel definition layer 2 and the through holes The upper surface of 21; the pixel organic layer 4 is provided on the upper surface of the first functional layer 3; the second functional layer 5 is provided on the upper surface of the pixel organic layer 4; the electrode layer 6 is provided on the upper surface of the second functional layer 5.
  • the pixel organic layer 4 is divided into three parts, including: a first sub-pixel organic layer 41, a second sub-pixel organic layer 42 and a third sub-pixel organic layer 43, a first sub-pixel organic layer 41, a second sub-pixel organic layer 42 And the third sub-pixel organic layer 43 is sequentially connected and provided on the upper surface of the first functional layer 3.
  • the sublimation temperature of sulfur in the atmospheric atmosphere is 95°, and the sublimation temperature in vacuum is lower than 80°.
  • the current display is baked at 120° for 1 hour, which will not affect the use efficiency and service life of the display. Therefore, the heating process of sulfur will not affect the performance of the display itself.
  • the organic layer material overlying the sulfur layer is stripped off as the sulfur sublimates and evaporates, leaving the organic layer material not covering the sulfur area to complete the evaporation of the organic material of each pixel.
  • the prepared display is a display with high pixel density, without using a precision mask, the preparation process is simple and easy to operate, and the cost of manufacturing and cleaning is saved.
  • the display can be used as: portable wearable devices such as smart watches and other devices; mobile phones; e-books and electronic newspapers; TV sets; personal portable computers; flexible OLED displays such as foldable and rollable OLED; new and efficient OLED displays; OLED monitors; mobile tools such as in-car displays for cars, trains, etc.; control panels for mechanical equipment, etc.

Abstract

A method for preparing a display, comprising the following steps: a pixel definition layer (2) preparation step, a through hole (21) setting step, a first functional layer (3) preparation step, a pixel organic layer (4) preparation step, a second functional layer (5) preparation step and an electrode layer (6) preparation step. The technical effect lies in that a high-pixel-density display can be prepared without using a precise mask plate, which saves on costs, and has a simple and easy manufacturing process. A vapor deposition sulfur layer is easier to operate than a precise mask plate, thereby greatly reducing cleaning and maintenance costs.

Description

显示器的制备方法Display preparation method 技术领域Technical field
本发明涉及显示器领域,特别涉及一种显示器的制备方法。The present invention relates to the field of displays, and in particular to a method for preparing displays.
背景技术Background technique
有机电致发光器件(organic light-emitting device,OLED)由于具有能主动发光、可在低温下工作、发光响应速度快、视角广、效率高、可制作柔性显现器件、驱动电压及能耗低等优点吸引了全球众多显示厂商的目光,被认为下一代的显示技术。Organic light-emitting device (organic light-emitting device, OLED) due to its ability to actively emit light, can work at low temperatures, light-emitting response speed, wide viewing angle, high efficiency, can be made flexible display device, driving voltage and low energy consumption, etc. The advantages have attracted the attention of many display manufacturers around the world and are considered the next generation of display technology.
随着新型显示技术的飞速发展, OLED显示器被赋予了更多的期待,例如更广的色域、更高的对比度、更低的能耗、更高的分辨率等。With the rapid development of new display technologies, OLED displays have been given more expectations, such as a wider color gamut, higher contrast, lower energy consumption, and higher resolution.
传统的RGB子像素排列如图1、2所示,使用红绿蓝三基色的三个子像素进行排列,图1为子像素并排排列,图2为子像素pentile排列,即相邻像素共用子像素的排列方式,相对于并排排列而言,材料面积大,降低了工艺难度,同时降低了成本,但是清晰度也会随之降低。The traditional RGB sub-pixel arrangement is shown in Figures 1 and 2. The three sub-pixels of the red, green and blue primary colors are used for arrangement. Figure 1 shows the arrangement of the sub-pixels side by side, and Figure 2 shows the arrangement of the sub-pixels pentile. Compared with the side-by-side arrangement, the large material area reduces the difficulty of the process and reduces the cost, but the clarity will also be reduced.
当前主流的OLED生产工艺中,需要使用多套FMM(Fine-Metal-Mask,精密掩膜版)来完成全彩显示器的制备。而FMM的制作、运输、清洗、维护成本都较为高昂,同时高解析度的FMM的制作方法只掌握在少数厂商之中且产能有限。因此需要开发新的高解析度显示器制作技术。In the current mainstream OLED production process, multiple sets of FMM (Fine-Metal-Mask, precision mask) are required to complete the preparation of full-color displays. The production, transportation, cleaning, and maintenance costs of FMM are relatively high. At the same time, the production method of high-resolution FMM is only mastered by a few manufacturers and has limited production capacity. Therefore, it is necessary to develop new high-resolution display manufacturing technology.
现有的高PPI FMM的技术难点在于为了减小mask的shadow effect,需要超薄mask。而在如此薄的金属片上开孔,并且保证在mask张网后仍然能够使开孔和基板像素区域准确对位是十分困难的。The technical difficulty of the existing high-PPI FMM is that in order to reduce the shadow effect of the mask, an ultra-thin mask is required. It is very difficult to make holes in such a thin metal sheet and ensure that the openings and the pixel area of the substrate can be accurately aligned even after the mask is opened.
技术问题technical problem
本发明的目的在于,解决现有的OLED生产工艺中,精密掩膜版的制作、运输、清洗、维护成本都较为高昂,在超薄掩膜版上开孔且保证掩膜版张网后依然能够使开孔和基板像素区域准确对位的难度较大等技术问题。The purpose of the present invention is to solve the problem that the manufacturing, transportation, cleaning and maintenance of precision mask plates are relatively high in the existing OLED production process. Opening holes in ultra-thin mask plates and ensuring that the mask plates are still opened It can make technical problems such as the difficulty of accurately aligning the opening and the pixel area of the substrate.
技术解决方案Technical solution
本发明提供一种显示器的制备方法,包括如下步骤:S1 像素定义层制备步骤,提供一基板,在所述基板上涂布出一像素定义层,包括两个以上像素单元区; S2 通孔设置步骤,每一像素单元区内的像素定义层设置三个通孔,分别为第一通孔、第二通孔及第三通孔;S3 第一功能层制备步骤,在所述像素定义层上蒸镀出一第一功能层;S4 像素有机层制备步骤,依次制备三个亚像素有机层,分别对应三个通孔;S5 第二功能层制备步骤,在所述像素功能层上表面蒸镀出一第二功能层;以及S6 电极层制备步骤,在所述第二功能层上表面蒸镀出一电极层。The present invention provides a method for manufacturing a display, including the following steps: S1 pixel definition layer preparation step, providing a substrate on which a pixel definition layer is coated, including more than two pixel unit areas; S2 through hole setting Step, the pixel definition layer in each pixel unit area is provided with three through holes, namely a first through hole, a second through hole and a third through hole; S3 the first functional layer preparation step, on the pixel definition layer A first functional layer is evaporated; S4 pixel organic layer preparation step, three sub-pixel organic layers are prepared in sequence, corresponding to three through holes; S5 second functional layer preparation step, vapor deposition on the pixel functional layer A second functional layer; and an S6 electrode layer preparation step, an electrode layer is evaporated on the upper surface of the second functional layer.
进一步地,所述像素有机层制备步骤,依次包括:S41 第一亚像素有机层制备步骤,制备第一亚像素有机层;S42 第二亚像素有机层制备步骤,制备第二亚像素有机层;以及S43 第三亚像素有机层制备步骤,制备第三亚像素有机层。Further, the pixel organic layer preparation step includes, in order: S41 a first sub-pixel organic layer preparation step to prepare a first sub-pixel organic layer; S42 a second sub-pixel organic layer preparation step to prepare a second sub-pixel organic layer; And S43 a third sub-pixel organic layer preparation step to prepare a third sub-pixel organic layer.
进一步地,所述第一亚像素有机层制备步骤,包括:S411 第一硫层制备步骤,利用一掩膜版遮挡所述第一通孔及其周围区域,在所述第一功能层上蒸镀出第一硫层,去除所述掩膜版;S412 第一像素有机层制备步骤,在所述第一功能层的上表面蒸镀一第一像素有机层材料,得到一第一像素有机层;以及S413 第一加热步骤,加热所述基板,使得所述第一硫层蒸发或者升华,所述第一硫层上方的第一像素有机层被剥离,剩余的第一像素有机层即为第一亚像素有机层。Further, the first sub-pixel organic layer preparation step includes: S411 first sulfur layer preparation step, using a mask to block the first through hole and its surrounding area, and steaming on the first functional layer The first sulfur layer is plated and the mask is removed; S412 the first pixel organic layer preparation step, a first pixel organic layer material is evaporated on the upper surface of the first functional layer to obtain a first pixel organic layer ; And S413 the first heating step, heating the substrate, so that the first sulfur layer is evaporated or sublimed, the first pixel organic layer above the first sulfur layer is stripped, and the remaining first pixel organic layer is the first A sub-pixel organic layer.
进一步地,所述第二亚像素有机层制备步骤,包括:S421 第二硫层制备步骤,利用一掩膜版遮挡所述第二通孔及其周围区域,在所述第一亚像素有机层及所述第一功能层上蒸镀出第二硫层,去除所述掩膜版;S422 第二像素有机层制备步骤,在所述第一功能层的上表面蒸镀一第二像素有机层材料,得到一第二像素有机层;以及S423 第二加热步骤,加热所述基板,使得所述第二硫层蒸发或者升华,所述第二硫层上方的第二像素有机层被剥离,剩余的第二像素有机层即为第二亚像素有机层。Further, the second sub-pixel organic layer preparation step includes: S421 second sulfur layer preparation step, using a mask to block the second through hole and its surrounding area, in the first sub-pixel organic layer And a second sulfur layer is vapor-deposited on the first functional layer to remove the mask plate; S422 second pixel organic layer preparation step, a second pixel organic layer is vapor-deposited on the upper surface of the first functional layer Material to obtain a second pixel organic layer; and S423 the second heating step, heating the substrate so that the second sulfur layer evaporates or sublimes, the second pixel organic layer above the second sulfur layer is peeled off, remaining The second pixel organic layer is the second sub-pixel organic layer.
进一步地,所述第三亚像素有机层制备步骤,包括:S431 第三硫层制备步骤,利用一掩膜版遮挡所述第三通孔及其周围区域,在所述第一亚像素有机层以及所述第二亚像素有机层上蒸镀出第三硫层,去除所述掩膜版;S432 第三像素有机层制备步骤,在所述第一功能层上表面以蒸镀一第三像素有机层材料,得到一第三像素有机层;以及S433 第三加热步骤,加热所述基板,使得所述第三硫层蒸发或者升华,所述第三硫层上方的第三像素有机层被剥离,剩余的第三有机层即为第三亚像素有机层。Further, the step of preparing the third sub-pixel organic layer includes: a step of preparing a third sulfur layer of S431, a third mask is used to block the third through hole and its surrounding area, and the first sub-pixel organic layer and A third sulfur layer is vapor-deposited on the second sub-pixel organic layer to remove the mask; S432 third pixel organic layer preparation step, a third pixel organic layer is vapor-deposited on the upper surface of the first functional layer Layer material to obtain a third pixel organic layer; and a third heating step of S433, heating the substrate so that the third sulfur layer is evaporated or sublimed, and the third pixel organic layer above the third sulfur layer is stripped, The remaining third organic layer is the third sub-pixel organic layer.
进一步地,同一像素单元区内的第一亚像素有机层、第二亚像素有机层以及第三亚像素有机层依次连接。Further, the first sub-pixel organic layer, the second sub-pixel organic layer and the third sub-pixel organic layer in the same pixel unit area are connected in sequence.
进一步地,所述第一亚像素有机层、所述第二亚像素有机层、所述第三亚像素有机层为绿色有机层、蓝色有机层、红色有机层中的一种且互不相同。Further, the first sub-pixel organic layer, the second sub-pixel organic layer, and the third sub-pixel organic layer are one of a green organic layer, a blue organic layer, and a red organic layer and are different from each other.
进一步地,所述第一功能层包括空穴注入层、空穴传输层中的至少一层。Further, the first functional layer includes at least one of a hole injection layer and a hole transport layer.
进一步地,所述第二功能层包括空穴阻挡层、电子传输层、电子注入层中的至少一种。Further, the second functional layer includes at least one of a hole blocking layer, an electron transport layer, and an electron injection layer.
进一步地,所述电极层包括光取出层。Further, the electrode layer includes a light extraction layer.
有益效果Beneficial effect
本发明的技术效果在于,用大通孔的普通掩膜版代替原有的通孔大小与形状各异的精密掩膜版,无需使用精密掩膜版即可制备高像素密度的显示器,降低制作工序的难度,节省成本。利用硫易挥发易升华的特性,将硫层覆盖区域上方的有机层材料剥离掉,保留了未被硫层覆盖的亚像素有机层,实现了高像素密度显示的目的,蒸镀硫层的大通孔普通掩膜版相对于精密掩膜版更易操作,且大大降低清洗维护成本。The technical effect of the present invention is to replace the original precision masks with different sizes and shapes of through holes by ordinary masks with large through holes, without using precision masks, a high pixel density display can be prepared, and the manufacturing process is reduced The difficulty and cost savings. Taking advantage of sulfur's volatile and sublimable characteristics, the organic layer material above the sulfur layer covered area is stripped away, leaving the sub-pixel organic layer not covered by the sulfur layer, achieving the purpose of high pixel density display. Aperture ordinary mask is easier to operate than precision mask, and it greatly reduces cleaning and maintenance costs.
附图说明BRIEF DESCRIPTION
图1为现有技术中一种传统RGB子像素的排列图;1 is an arrangement diagram of a conventional RGB sub-pixel in the prior art;
图2为现有技术中另一种传统RGB子像素的排列图;2 is an arrangement diagram of another conventional RGB sub-pixel in the prior art;
图3为本发明实施例所述显示器的制备方法的流程图;3 is a flowchart of a method for manufacturing a display according to an embodiment of the invention;
图4为本发明实施例所述通孔设置步骤后的显示器结构示意图;4 is a schematic structural diagram of a display after the step of setting a through hole according to an embodiment of the present invention;
图5为本发明实施例所述第一功能层制备步骤后的显示器结构示意图;5 is a schematic structural diagram of a display after the first functional layer preparation step according to an embodiment of the present invention;
图6为本发明实施例所述像素有机层制备步骤的流程图;6 is a flowchart of steps for preparing a pixel organic layer according to an embodiment of the invention;
图7 为本发明实施例所述的第一亚像素有机层制备步骤的流程图;7 is a flowchart of steps for preparing a first sub-pixel organic layer according to an embodiment of the invention;
图8为本发明实施例所述第一硫层制备步骤后的显示器结构示意图;8 is a schematic structural diagram of a display after the first sulfur layer preparation step according to an embodiment of the present invention;
图9为本发明实施例所述第一像素有机层制备步骤后的显示器结构示意图;9 is a schematic structural diagram of a display after a step of preparing a first pixel organic layer according to an embodiment of the present invention;
图10为本发明实施例所述第一加热步骤时的显示器结构示意图;10 is a schematic structural diagram of a display during the first heating step according to an embodiment of the present invention;
图11为本发明实施例所述第一加热步骤后的显示器结构示意图;11 is a schematic structural diagram of a display after the first heating step according to an embodiment of the present invention;
图12为本发明实施例所述的第二亚像素有机层制备步骤的流程图;12 is a flowchart of steps for preparing a second sub-pixel organic layer according to an embodiment of the invention;
图13为本发明实施例所述第二硫层制备步骤后的显示器结构示意图;13 is a schematic structural diagram of a display after the second sulfur layer preparation step according to an embodiment of the present invention;
图14为本发明实施例所述第二像素有机层制备步骤后的显示器结构示意图;14 is a schematic diagram of the display structure after the step of preparing the second pixel organic layer according to the embodiment of the present invention;
图15为本发明实施例所述第二加热步骤时的显示器结构示意图;15 is a schematic structural diagram of a display during a second heating step according to an embodiment of the present invention;
图16为本发明实施例所述第二加热步骤后的显示器结构示意图;16 is a schematic structural diagram of a display after a second heating step according to an embodiment of the present invention;
图17为本发明实施例所述的第三亚像素有机层制备步骤的流程图;17 is a flowchart of steps for preparing a third sub-pixel organic layer according to an embodiment of the present invention;
图18为本发明实施例所述第三硫层制备步骤后的显示器结构示意图;18 is a schematic structural diagram of a display after the third sulfur layer preparation step according to an embodiment of the present invention;
图19为本发明实施例所述第三像素有机层制备步骤后的显示器结构示意图;19 is a schematic structural diagram of a display after a step of preparing a third pixel organic layer according to an embodiment of the present invention;
图20为本发明实施例所述第三加热步骤时的显示器结构示意图;20 is a schematic structural diagram of a display during a third heating step according to an embodiment of the present invention;
图21为本发明实施例所述第三加热步骤后的显示器结构示意图;21 is a schematic structural diagram of a display after a third heating step according to an embodiment of the present invention;
图22为本发明实施例所述第二功能层制备步骤后的显示器结构示意图;22 is a schematic diagram of the display structure after the step of preparing the second functional layer according to the embodiment of the present invention;
图23为本发明实施例所述的制备完成后的显示器的结构示意图。23 is a schematic structural diagram of the display after the preparation is completed according to an embodiment of the present invention.
部分组件标识如下Some components are identified as follows
100、B亚像素;200、G亚像素;300、R亚像素;100, B sub-pixel; 200, G sub-pixel; 300, R sub-pixel;
1、基板;1. Substrate;
2、像素定义层;21、通孔;211、第一通孔;212、第二通孔;213、第三通孔;2. Pixel definition layer; 21, through hole; 211, first through hole; 212, second through hole; 213, third through hole;
3、第一功能层;3. The first functional layer;
4、像素有机层;41、第一亚像素有机层;42、第二亚像素有机层;43、第三亚像素有机层;401、第一硫层;402、第二硫层;403、第三硫层;4. Pixel organic layer; 41, first sub-pixel organic layer; 42, second sub-pixel organic layer; 43, third sub-pixel organic layer; 401, first sulfur layer; 402, second sulfur layer; 403, third Sulfur layer
5、第二功能层;5. The second functional layer;
6、电极层。6. Electrode layer.
本发明的最佳实施方式Best Mode of the Invention
以下结合说明书附图详细说明本发明的优选实施例,以向本领域中的技术人员完整介绍本发明的技术内容,以举例证明本发明可以实施,使得本发明公开的技术内容更加清楚,使得本领域的技术人员更容易理解如何实施本发明。然而本发明可以通过许多不同形式的实施例来得以体现,本发明的保护范围并非仅限于文中提到的实施例,下文实施例的说明并非用来限制本发明的范围。The following describes the preferred embodiments of the present invention in detail in conjunction with the accompanying drawings of the specification to fully introduce the technical content of the present invention to those skilled in the art, to exemplify that the present invention can be implemented, so that the technical content disclosed by the present invention is more clear and makes the present Those skilled in the art can more easily understand how to implement the present invention. However, the present invention can be embodied by many different forms of embodiments. The protection scope of the present invention is not limited to the embodiments mentioned in the text, and the description of the embodiments below is not intended to limit the scope of the present invention.
本发明所提到的方向用语,例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等,仅是附图中的方向,本文所使用的方向用语是用来解释和说明本发明,而不是用来限定本发明的保护范围。Directional terms mentioned in the present invention, such as "up", "down", "front", "rear", "left", "right", "inner", "outer", "side", etc. The directions in the figures and the direction words used herein are used to explain and explain the present invention, rather than to limit the protection scope of the present invention.
在附图中,结构相同的部件以相同数字标号表示,各处结构或功能相似的组件以相似数字标号表示。此外,为了便于理解和描述,附图所示的每一组件的尺寸和厚度是任意示出的,本发明并没有限定每个组件的尺寸和厚度。In the drawings, components with the same structure are denoted by the same numerals, and components with similar structures or functions are denoted by similar numerals. In addition, for ease of understanding and description, the size and thickness of each component shown in the drawings are arbitrarily shown, and the present invention does not limit the size and thickness of each component.
当某些组件,被描述为“在”另一组件“上”时,所述组件可以直接置于所述另一组件上;也可以存在一中间组件,所述组件置于所述中间组件上,且所述中间组件置于另一组件上。当一个组件被描述为“安装至”或“连接至”另一组件时,二者可以理解为直接“安装”或“连接”,或者一个组件通过一中间组件“安装至”或“连接至”另一个组件。When certain components are described as "on" another component, the component may be directly placed on the other component; there may also be an intermediate component, which is placed on the intermediate component , And the intermediate component is placed on another component. When a component is described as "installed to" or "connected to" another component, the two can be understood to be "installed" or "connected" directly, or a component "installed to" or "connected to" through an intermediate component Another component.
如图3所示,本发明提供一种显示器的制备方法,具体包括步骤S1~S6。As shown in FIG. 3, the present invention provides a method for manufacturing a display, which specifically includes steps S1 to S6.
S1 像素定义层制备步骤,提供基板1,在基板1上表面涂布一层像素定义层材料,获得像素定义层2,包括两个以上像素单元区。S1 The step of preparing the pixel definition layer, providing the substrate 1, coating a layer of pixel definition layer material on the surface of the substrate 1 to obtain the pixel definition layer 2, including more than two pixel unit regions.
S2 通孔设置步骤,每一像素单元区内的像素定义层2设有三个通孔21,分别为第一通孔211、第二通孔212以及第三通孔213,第一通孔211、第二通孔212以及第三通孔213贯穿于像素定义层2且贴合至基板1的上表面,在本实施例中,第一通孔211、第二通孔212、第三通孔213为R、G、B像素通孔中的一种,且互不相同(参见图4)。In the step of setting S2 through holes, the pixel defining layer 2 in each pixel unit area is provided with three through holes 21, namely a first through hole 211, a second through hole 212, and a third through hole 213, the first through hole 211, The second through hole 212 and the third through hole 213 penetrate through the pixel definition layer 2 and are attached to the upper surface of the substrate 1. In this embodiment, the first through hole 211, the second through hole 212, and the third through hole 213 It is one of R, G, and B pixel vias, which are different from each other (see Figure 4).
S3 第一功能层制备步骤,使用大开口的普通掩膜版在像素定义层2上蒸镀出第一功能层3,第一功能层3包含空穴注入层、空穴传输层中的至少一种(参见图5)。S3 The first functional layer preparation step, using a common mask with a large opening to evaporate the first functional layer 3 on the pixel definition layer 2, the first functional layer 3 includes at least one of a hole injection layer and a hole transport layer Species (see Figure 5).
如图6所示,S4 像素有机层制备步骤,依次制备三个亚像素有机层,包括S41 第一亚像素有机层制备步骤,制备第一亚像素有机层;S42 第二亚像素有机层制备步骤,制备第二亚像素有机层;以及S43 第三亚像素有机层制备步骤,制备第三亚像素有机层。As shown in FIG. 6, the S4 pixel organic layer preparation step sequentially prepares three sub-pixel organic layers, including the S41 first sub-pixel organic layer preparation step to prepare the first sub-pixel organic layer; S42 the second sub-pixel organic layer preparation step , Preparing a second sub-pixel organic layer; and S43 preparing a third sub-pixel organic layer, preparing a third sub-pixel organic layer.
如图7所示,S41第一亚像素有机层制备步骤,具体包括步骤S411~S413。As shown in FIG. 7, the step of preparing the organic layer of the first sub-pixel in S41 specifically includes steps S411 to S413.
S411 第一硫层制备步骤,利用一掩膜版遮挡第一通孔211及其周围区域,在第一功能层3上蒸镀出第一硫层401,不用考虑shadow影响,只覆盖于第二通孔212以及第三通孔213上方的第一功能层3,不覆盖第一通孔211上方的第一功能层3即可(参见图8)。S411 The first sulfur layer preparation step, a first mask layer is used to block the first through hole 211 and its surrounding area, and the first sulfur layer 401 is vapor-deposited on the first functional layer 3, without considering the shadow effect, only covering the second sulfur layer The first functional layer 3 above the through hole 212 and the third through hole 213 need not cover the first functional layer 3 above the first through hole 211 (see FIG. 8 ).
S412 第一像素有机层制备步骤,利用大开口的普通掩膜版在第一功能层3的上表面蒸镀一第一像素有机层材料,得到一第一像素有机层(参见图9)。S412: Step of preparing the first pixel organic layer, using a common mask with a large opening to vapor-deposit a first pixel organic layer material on the upper surface of the first functional layer 3 to obtain a first pixel organic layer (see FIG. 9).
S413 第一加热步骤,对基板1整面进行加热处理,使得所述硫层蒸发或者升华,同时,附着在第一硫层401上方的第一像素有机层被剥离,(参考图10)剩余的第一像素有机层即为第一亚像素有机层41(参见图11)。S413 In the first heating step, the entire surface of the substrate 1 is heated to evaporate or sublimate the sulfur layer, and at the same time, the organic layer of the first pixel attached to the first sulfur layer 401 is peeled off (refer to FIG. 10) The first pixel organic layer is the first sub-pixel organic layer 41 (see FIG. 11).
如图12所示,S42第二亚像素有机层制备步骤,具体包括步骤S421~S423。As shown in FIG. 12, step S42 of preparing the second sub-pixel organic layer specifically includes steps S421-S423.
S421第二硫层制备步骤,利用大开口的普通掩膜版在所述第一亚像素有机层以及第一功能层3上蒸镀出第二硫层402,不用考虑shadow影响,只覆盖于所述第一亚像素有机层、第三通孔213上方的第一功能层3,不覆盖第二通孔212上方的第一功能层3即可(参见图13)。S421 The second sulfur layer preparation step, using a common mask plate with a large opening to evaporate the second sulfur layer 402 on the first sub-pixel organic layer and the first functional layer 3, without considering the shadow effect, only covering the The first sub-pixel organic layer and the first functional layer 3 above the third through hole 213 need not cover the first functional layer 3 above the second through hole 212 (see FIG. 13 ).
S422 第二像素有机层制备步骤,利用大开口的普通掩膜版在第一亚像素有机层41以及第一功能层3的上表面蒸镀一第二像素有机层材料,得到一第二像素有机层(参见图14)。S422 Step of preparing the second pixel organic layer, using a common mask with a large opening to vapor-deposit a second pixel organic layer material on the upper surfaces of the first sub-pixel organic layer 41 and the first functional layer 3 to obtain a second pixel organic layer Layer (see Figure 14).
S423 第二加热步骤,对基板1整面进行加热处理,使得第二硫层402蒸发或者升华,同时,附着在第二硫层402上方的第二像素有机层被剥离(参见图15),剩余的第二像素有机层即为第二亚像素有机层42(参见图16)。S423 In the second heating step, the entire surface of the substrate 1 is heated, so that the second sulfur layer 402 evaporates or sublimes, and at the same time, the organic layer of the second pixel attached to the second sulfur layer 402 is peeled off (see FIG. 15), leaving The second pixel organic layer is the second sub-pixel organic layer 42 (see FIG. 16).
如图17所示,S43 第三亚像素有机层制备步骤,具体包括步骤S431~S433。As shown in FIG. 17, the step of preparing the organic layer of the third sub-pixel in S43 specifically includes steps S431 to S433.
S431 第三硫层制备步骤,利用一掩膜版遮挡第三通孔213及其周围区域,在第一亚像素有机层41以及第二亚像素有机层42上蒸镀出第三硫层403,不用考虑shadow影响,只覆盖于第一亚像素有机层41以及第二亚像素有机层42,不覆盖第三通孔213的第一功能层3即可(参见图18)。S431: a third sulfur layer preparation step, using a mask to block the third through hole 213 and its surrounding area, and depositing a third sulfur layer 403 on the first sub-pixel organic layer 41 and the second sub-pixel organic layer 42, Regardless of the shadow effect, only the first sub-pixel organic layer 41 and the second sub-pixel organic layer 42 are covered, and the first functional layer 3 of the third through hole 213 is not covered (see FIG. 18 ).
S432 第三像素有机层制备步骤,利用大开口的普通掩膜版在第三硫层403以及第三通孔213上方未被第三硫层403覆盖的第一功能层3的上表面蒸镀一第三像素有机层材料,得到一第三像素有机层(参见图19)。S432 The third pixel organic layer preparation step, using a common mask with a large opening to vapor-deposit an upper surface of the first functional layer 3 not covered by the third sulfur layer 403 above the third sulfur layer 403 and the third through hole 213 With the third pixel organic layer material, a third pixel organic layer is obtained (see FIG. 19).
S433 第三加热步骤,对基板1整面进行加热处理,使得第三硫层403蒸发或者升华,同时,附着在第三硫层403上方的第三像素有机层被剥离(参见图20),露出第一亚像素有机层41以及第二亚像素有机层42,剩余的第三像素有机层即为第三亚像素有机层43(参见图21)。S433 The third heating step is to heat the entire surface of the substrate 1 to evaporate or sublimate the third sulfur layer 403, and at the same time, the organic layer of the third pixel attached to the third sulfur layer 403 is peeled off (see FIG. 20) and exposed The first sub-pixel organic layer 41 and the second sub-pixel organic layer 42, and the remaining third pixel organic layer is the third sub-pixel organic layer 43 (see FIG. 21 ).
同一像素单元区内的第一亚像素有机层41、第二亚像素有机层42、第三亚像素有机层43依次连接,第一亚像素有机层41、第二亚像素有机层42、第三亚像素有机层43为绿色有机层、蓝色有机层、红色有机层中的一种且互不相同,即所述绿色有机层、所述蓝色有机层以及所述红色有机层的制备步骤的顺序可任意调换,不影响最终的显示器的制作。The first sub-pixel organic layer 41, the second sub-pixel organic layer 42, and the third sub-pixel organic layer 43 in the same pixel unit area are connected in sequence, the first sub-pixel organic layer 41, the second sub-pixel organic layer 42, and the third sub-pixel The organic layer 43 is one of a green organic layer, a blue organic layer, and a red organic layer and is different from each other, that is, the order of the preparation steps of the green organic layer, the blue organic layer, and the red organic layer may be Arbitrary exchange does not affect the final display production.
S5 第二功能层制备步骤,利用大开口的普通掩膜版在像素有机层4的上表面蒸镀出一第二功能层5,第二功能层5包含空穴阻挡层、电子传输层、电子注入层中的至少一种(参见图22)。S5 The second functional layer preparation step, a second functional layer 5 is vapor-deposited on the upper surface of the pixel organic layer 4 using a common mask with a large opening, and the second functional layer 5 includes a hole blocking layer, an electron transport layer, and electrons At least one of the injection layers (see FIG. 22).
S6 电极层制备步骤,利用大开口的普通掩膜版在第二功能层5的上表面蒸镀出一电极层6,电极层6为阴极层,包括CPL( Capping layer,光取出层),最后制备得到的显示器如图23所示。S6 electrode layer preparation step, an electrode layer 6 is vapor deposited on the upper surface of the second functional layer 5 using a common mask plate with a large opening, the electrode layer 6 is a cathode layer, including a CPL (Capping layer, light extraction layer), and finally The prepared display is shown in FIG. 23.
如图23所示,所述显示器包括:基板1、像素定义层2、第一功能层3、像素有机层4、第二功能层5以及电极层6。As shown in FIG. 23, the display includes a substrate 1, a pixel definition layer 2, a first functional layer 3, a pixel organic layer 4, a second functional layer 5, and an electrode layer 6.
像素定义层2设于基板1上表面,三个通孔21向下贯穿于像素定义层2,且贴合至基板1的上表面;第一功能层3贴附于像素定义层2以及通孔21的上表面;像素有机层4设于第一功能层3的上表面;第二功能层5设于像素有机层4的上表面;电极层6设于第二功能层5的上表面。The pixel definition layer 2 is provided on the upper surface of the substrate 1, three through holes 21 penetrate downwardly through the pixel definition layer 2 and are attached to the upper surface of the substrate 1; the first functional layer 3 is attached to the pixel definition layer 2 and the through holes The upper surface of 21; the pixel organic layer 4 is provided on the upper surface of the first functional layer 3; the second functional layer 5 is provided on the upper surface of the pixel organic layer 4; the electrode layer 6 is provided on the upper surface of the second functional layer 5.
像素有机层4分为三个部分,包括:第一亚像素有机层41、第二亚像素有机层42以及第三亚像素有机层43,第一亚像素有机层41、第二亚像素有机层42以及第三亚像素有机层43依次连接,设于第一功能层3的上表面。The pixel organic layer 4 is divided into three parts, including: a first sub-pixel organic layer 41, a second sub-pixel organic layer 42 and a third sub-pixel organic layer 43, a first sub-pixel organic layer 41, a second sub-pixel organic layer 42 And the third sub-pixel organic layer 43 is sequentially connected and provided on the upper surface of the first functional layer 3.
硫在大气氛围中的升华温度为95°,真空中的升华温度低于80°。而目前的显示器在120°环境下烘烤 1小时,不会影响显示器的使用效率和使用寿命的长短。因此硫的加热制程不会影响显示器本身的性能。The sublimation temperature of sulfur in the atmospheric atmosphere is 95°, and the sublimation temperature in vacuum is lower than 80°. However, the current display is baked at 120° for 1 hour, which will not affect the use efficiency and service life of the display. Therefore, the heating process of sulfur will not affect the performance of the display itself.
利用硫易升华蒸发的特性,将覆盖于硫层上方的有机层材料随着硫的升华蒸发而被剥离脱落,保留了未覆盖硫区域的有机层材料,完成各像素有机材料的蒸镀工作,实现了高像素密度显示的目的。Taking advantage of sulfur's easy sublimation and evaporation characteristics, the organic layer material overlying the sulfur layer is stripped off as the sulfur sublimates and evaporates, leaving the organic layer material not covering the sulfur area to complete the evaporation of the organic material of each pixel. To achieve the purpose of high pixel density display.
同时,制备所得的显示器为高像素密度的显示器,无需使用精密掩膜版,制备工序简单易操作,节省制作清洗的成本。At the same time, the prepared display is a display with high pixel density, without using a precision mask, the preparation process is simple and easy to operate, and the cost of manufacturing and cleaning is saved.
所述显示器可用作:便携可穿戴设备如智能手表等设备;移动电话机;电子书和电子报纸;电视机;个人便携电脑;可折叠以及可卷曲OLED等柔性OLED显示器;新型高效OLED显示器;OLED监视器;移动工具如汽车、火车等的车载显示器;机械设备等的操控面板等应用领域。The display can be used as: portable wearable devices such as smart watches and other devices; mobile phones; e-books and electronic newspapers; TV sets; personal portable computers; flexible OLED displays such as foldable and rollable OLED; new and efficient OLED displays; OLED monitors; mobile tools such as in-car displays for cars, trains, etc.; control panels for mechanical equipment, etc.
以上对本发明实施例所提供的显示器及其制备方法进行了详细介绍。应理解,本文所述的示例性实施方式应仅被认为是描述性的,用于帮助理解本发明的方法及其核心思想,而并不用于限制本发明。在每个示例性实施方式中对特征或方面的描述通常应被视作适用于其他示例性实施例中的类似特征或方面。尽管参考示例性实施例描述了本发明,但可建议所属领域的技术人员进行各种变化和更改。本发明意图涵盖所附权利要求书的范围内的这些变化和更改,这些变化盒更改也应视为本发明的保护范围。The display and the preparation method thereof provided by the embodiments of the present invention have been described in detail above. It should be understood that the exemplary embodiments described herein should be considered descriptive only, to help understand the method of the present invention and its core idea, but not to limit the present invention. Descriptions of features or aspects in each exemplary embodiment should generally be considered as applicable to similar features or aspects in other exemplary embodiments. Although the present invention has been described with reference to exemplary embodiments, various changes and modifications may be suggested to those skilled in the art. The present invention is intended to cover these changes and modifications within the scope of the appended claims, and these change box modifications should also be regarded as the protection scope of the present invention.

Claims (10)

  1. 一种显示器的制备方法,其包括如下步骤:A preparation method of a display includes the following steps:
    S1 像素定义层制备步骤,提供一基板,在所述基板上涂布出一像素定义层,包括两个以上像素单元区;S1: a pixel definition layer preparation step, providing a substrate, and coating a pixel definition layer on the substrate, including more than two pixel unit areas;
    S2 通孔设置步骤,在每一像素单元区内的像素定义层设置三个通孔,分别为第一通孔、第二通孔及第三通孔;In the step of setting S2 through holes, three through holes are provided in the pixel definition layer of each pixel unit area, which are respectively a first through hole, a second through hole and a third through hole;
    S3 第一功能层制备步骤,在所述像素定义层上蒸镀出一第一功能层;S3: a first functional layer preparation step, a first functional layer is evaporated on the pixel definition layer;
    S4 像素有机层制备步骤,依次制备三个亚像素有机层,分别对应三个通孔;S4 pixel organic layer preparation step, sequentially preparing three sub-pixel organic layers, corresponding to three through holes;
    S5 第二功能层制备步骤,在所述像素功能层上表面蒸镀出一第二功能层;以及S5: a second functional layer preparation step, a second functional layer is evaporated on the upper surface of the pixel functional layer; and
    S6 电极层制备步骤,在所述第二功能层上表面蒸镀出一电极层。S6: an electrode layer preparation step, an electrode layer is evaporated on the upper surface of the second functional layer.
  2. 如权利要求1所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 1, wherein:
    所述像素有机层制备步骤,依次包括The steps for preparing the pixel organic layer include:
    S41 第一亚像素有机层制备步骤,制备第一亚像素有机层;S41: a first sub-pixel organic layer preparation step, to prepare a first sub-pixel organic layer;
    S42 第二亚像素有机层制备步骤,制备第二亚像素有机层;以及S42: preparing a second sub-pixel organic layer, preparing a second sub-pixel organic layer; and
    S43 第三亚像素有机层制备步骤,制备第三亚像素有机层。S43: a third sub-pixel organic layer preparation step, to prepare a third sub-pixel organic layer.
  3. 如权利要求2所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 2, wherein:
    所述第一亚像素有机层制备步骤,包括The step of preparing the first sub-pixel organic layer includes:
    S411 第一硫层制备步骤,利用一掩膜版遮挡所述第一通孔及其周围区域,在所述第一功能层上蒸镀出第一硫层,去除所述掩膜版;S411: a first sulfur layer preparation step, a mask plate is used to block the first through hole and its surrounding area, a first sulfur layer is evaporated on the first functional layer, and the mask plate is removed;
    S412 第一像素有机层制备步骤,在所述第一功能层的上表面蒸镀一第一像素有机层材料,得到一第一像素有机层;以及S412: preparing a first pixel organic layer, vapor-depositing a first pixel organic layer material on the upper surface of the first functional layer to obtain a first pixel organic layer; and
    S413 第一加热步骤,加热所述基板,使得所述第一硫层蒸发或者升华,所述第一硫层上方的第一像素有机层被剥离,剩余的第一像素有机层即为第一亚像素有机层。S413 The first heating step, heating the substrate, so that the first sulfur layer is evaporated or sublimed, the first pixel organic layer above the first sulfur layer is stripped, and the remaining first pixel organic layer is the first sub-layer Pixel organic layer.
  4. 如权利要求3所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 3, wherein
    所述第二亚像素有机层制备步骤,包括The step of preparing the second sub-pixel organic layer includes:
    S421 第二硫层制备步骤,利用一掩膜版遮挡所述第二通孔及其周围区域,在所述第一亚像素有机层及所述第一功能层上蒸镀出第二硫层,去除所述掩膜版;S421: preparing a second sulfur layer, using a mask to block the second through hole and its surrounding area, and evaporating a second sulfur layer on the first sub-pixel organic layer and the first functional layer, Remove the mask plate;
    S422 第二像素有机层制备步骤,在所述第一功能层的上表面蒸镀一第二像素有机层材料,得到一第二像素有机层;以及S422: preparing a second pixel organic layer, vapor-depositing a second pixel organic layer material on the upper surface of the first functional layer to obtain a second pixel organic layer; and
    S423 第二加热步骤,加热所述基板,使得所述第二硫层蒸发或者升华,所述第二硫层上方的第二像素有机层被剥离,剩余的第二像素有机层即为第二亚像素有机层。S423 The second heating step, heating the substrate, so that the second sulfur layer is evaporated or sublimed, the second pixel organic layer above the second sulfur layer is stripped, and the remaining second pixel organic layer is the second sub-layer Pixel organic layer.
  5. 如权利要求4所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 4, wherein:
    所述第三亚像素有机层制备步骤,包括The step of preparing the third sub-pixel organic layer includes:
    S431 第三硫层制备步骤,利用一掩膜版遮挡所述第三通孔及其周围区域,在所述第一亚像素有机层以及所述第二亚像素有机层上蒸镀出第三硫层,去除所述掩膜版;S431: a third sulfur layer preparation step, a third mask is used to block the third through hole and its surrounding area, and third sulfur is evaporated on the first sub-pixel organic layer and the second sub-pixel organic layer Layer to remove the mask;
    S432 第三像素有机层制备步骤,在所述第一功能层上表面以蒸镀一第三像素有机层材料,得到一第三像素有机层;以及S432: a third pixel organic layer preparation step, a third pixel organic layer material is deposited on the upper surface of the first functional layer to obtain a third pixel organic layer; and
    S433 第三加热步骤,加热所述基板,使得所述第三硫层蒸发或者升华,所述第三硫层上方的第三像素有机层被剥离,剩余的第三有机层即为第三亚像素有机层。S433 The third heating step, heating the substrate, so that the third sulfur layer is evaporated or sublimed, the third pixel organic layer above the third sulfur layer is stripped, and the remaining third organic layer is the third sub-pixel organic Floor.
  6. 如权利要求1所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 1, wherein:
    同一像素单元区内的第一亚像素有机层、第二亚像素有机层以及第三亚像素有机层依次连接。The first sub-pixel organic layer, the second sub-pixel organic layer and the third sub-pixel organic layer in the same pixel unit area are connected in sequence.
  7. 如权利要求2所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 2, wherein:
    所述第一亚像素有机层、所述第二亚像素有机层、所述第三亚像素有机层为绿色有机层、蓝色有机层、红色有机层中的一种且互不相同。The first sub-pixel organic layer, the second sub-pixel organic layer, and the third sub-pixel organic layer are one of a green organic layer, a blue organic layer, and a red organic layer and are different from each other.
  8. 如权利要求1所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 1, wherein:
    所述第一功能层包括空穴注入层、空穴传输层中的至少一层。The first functional layer includes at least one of a hole injection layer and a hole transport layer.
  9. 如权利要求1所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 1, wherein:
    所述第二功能层包括空穴阻挡层、电子传输层、电子注入层中的至少一种。The second functional layer includes at least one of a hole blocking layer, an electron transport layer, and an electron injection layer.
  10. 如权利要求1所述的显示器的制备方法,其中,The method for manufacturing a display according to claim 1, wherein:
    所述电极层包括光取出层。The electrode layer includes a light extraction layer.
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