WO2020073386A1 - 一种显示面板和制作方法 - Google Patents

一种显示面板和制作方法 Download PDF

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Publication number
WO2020073386A1
WO2020073386A1 PCT/CN2018/113371 CN2018113371W WO2020073386A1 WO 2020073386 A1 WO2020073386 A1 WO 2020073386A1 CN 2018113371 W CN2018113371 W CN 2018113371W WO 2020073386 A1 WO2020073386 A1 WO 2020073386A1
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filter
transparent
sub
forming
pixel
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PCT/CN2018/113371
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English (en)
French (fr)
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何怀亮
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惠科股份有限公司
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Priority to US16/331,983 priority Critical patent/US11480718B2/en
Publication of WO2020073386A1 publication Critical patent/WO2020073386A1/zh

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters

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  • the present application relates to the field of display technology, and more specifically, to a display panel and manufacturing method.
  • the display panel includes a color filter substrate (Color Filter Substrate, CF Substrate, also known as a color filter substrate), a thin film transistor array substrate (Thin Film Transistor Substrate, TFT Substrate), and a transparent electrode exists on the opposite inner side of the substrate.
  • CF Substrate Color Filter Substrate
  • TFT Substrate Thin Film Transistor Substrate
  • the display continues to move toward high resolution, such as 4K UHD (Ultra-High Definition, ultra high definition) TV continues to be popular among the public.
  • high resolution such as 4K UHD (Ultra-High Definition, ultra high definition) TV continues to be popular among the public.
  • the most effective way to increase the resolution of the panel is to make the number of pixels on the screen the smaller the size. And usually we also need a panel with high penetration rate.
  • the resolution and penetration rate of the display panel are not high, and cannot meet people's increasing demands.
  • the purpose of the present application is to provide a display panel and a manufacturing method to solve the problem of improving the resolution and penetration rate of the display panel.
  • the present application provides a method for manufacturing a display panel, including the following steps:
  • the step of making the filter includes the step of forming a transparent filter; wherein, the step of forming the transparent filter and the step of forming a flat layer on the filter use the same transparent photoresist material.
  • the steps of manufacturing the optical filter and forming the flat layer on the optical filter include using an on-array color filter technology to fabricate the array substrate.
  • the steps of manufacturing the optical filter and forming the flat layer on the optical filter include using an on-array color filter technology to manufacture on a color film substrate opposite to the array substrate.
  • the step of forming a transparent filter includes: using a transparent photoresist material to form a transparent photoresist layer; using a photomask to expose and develop the transparent photoresist layer to obtain the transparent filter.
  • the step of exposing and developing the transparent photoresist layer using a photomask includes baking the transparent photoresist layer after exposure and development.
  • the step of forming a flat layer on the optical filter includes: coating a transparent photoresist layer with the same material as the transparent filter; baking the transparent photoresist layer to form The flat layer.
  • the step of making the filter includes forming a color filter.
  • the forming of the color filter includes: coating a layer of color photoresist with a color photoresist material; exposing the color photoresist layer with a photomask; and exposing the color photoresist layer with a developing solution Developing to obtain the color filter pattern; baking to form the color filter.
  • a flat layer is formed on the color filter.
  • the forming a flat layer on the color filter includes: coating a transparent photoresist layer with a transparent photoresist material; baking the transparent photoresist layer to form a flat layer.
  • the application also discloses a method for manufacturing a display panel, including the following steps:
  • a step of forming a filter includes:
  • a step of forming a transparent filter wherein the step of forming a transparent filter includes:
  • forming a flat layer on the color filter and the transparent filter includes the following steps:
  • the transparent photoresist layer is baked to form the flat layer.
  • the present application also discloses a display panel, including: a plurality of pixels, each pixel including a plurality of sub-pixels; a plurality of filters corresponding to each pixel, wherein each filter includes a plurality of sub-filters Each sub-filter has a one-to-one correspondence with sub-pixels in its corresponding pixels; each of the filters includes a plurality of colored sub-filters and at least one transparent filter; the display panel also It includes a flat layer disposed above the filter, wherein the flat layer and the transparent filter are made of the same transparent photoresist material; the transparent filter and the flat layer are developed by two exposures Processed.
  • a developing boundary layer is formed between the contact surface of the transparent filter and the flat layer.
  • the developing boundary layer formed between the transparent filter and the contact surface of the flat layer has a developing solution remaining.
  • the average value of the total thickness of all film layers at the transparent filter is consistent with the average value of the total thickness of all film layers at the color filter.
  • each filter includes a red sub-filter, a green sub-filter, a blue sub-filter, and a transparent filter; each pixel includes a red sub-filter A red sub-pixel corresponding to the light sheet, a green sub-pixel corresponding to the green sub-filter, a blue sub-pixel corresponding to the blue sub-filter, and a white sub-pixel corresponding to the transparent filter;
  • the sub-pixels in each pixel are arranged in a row, in the following order: red sub-pixel, green sub-pixel, blue sub-pixel and white sub-pixel.
  • each filter includes a red sub-filter, a green sub-filter, a blue sub-filter, and a transparent filter; each pixel includes a red sub-filter A red sub-pixel corresponding to the light sheet, a green sub-pixel corresponding to the green sub-filter, a blue sub-pixel corresponding to the blue sub-filter, and a white sub-pixel corresponding to the transparent filter;
  • the sub-pixels in each pixel are arranged in a 2 ⁇ 2 arrangement, wherein the order of the first row is: red sub-pixels, green sub-pixels; the order of the second row is: blue sub-pixels and white sub-pixels.
  • the materials used to make the transparent filter in the filter are the same as the materials used to form the flat layer, which are all transparent photoresist materials.
  • the filter is made and formed on the filter.
  • this design allows the thickness of the transparent filter to be adjusted as needed, so that the height of the transparent filter position is close to other filters The height at the position of the light sheet, the flat layer formed on the filter is more flat and evenly distributed.
  • FIG. 1 is a schematic flowchart of a method for manufacturing a display panel according to an embodiment of the present application
  • FIG. 2 is a schematic flowchart of a method for manufacturing a display panel according to another embodiment of the present application.
  • FIG. 3 is a schematic flowchart of a method for manufacturing a display panel according to another embodiment of the present application.
  • FIG. 4 is a schematic flowchart of a method for manufacturing a display panel according to another embodiment of the present application.
  • FIG. 5 is a schematic flowchart of a method for manufacturing a display panel according to another embodiment of the present application.
  • FIG. 6 is a schematic diagram of a cross section of a display panel according to another embodiment of the present application.
  • FIG. 7 is a schematic diagram of arranging sub-pixels in a row according to another embodiment of the present application.
  • FIG. 8 is a schematic diagram of 2 ⁇ 2 arrangement of sub-pixels according to another embodiment of the present application.
  • the features defined as “first” and “second” may explicitly or implicitly include one or more features.
  • the meaning of “plurality” is two or more.
  • the term “including” and any variations thereof are intended to cover non-exclusive inclusions.
  • connection should be understood in a broad sense, for example, it can be fixed or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • installation should be understood in a broad sense, for example, it can be fixed or detachable Connected, or connected integrally; either mechanically or electrically; directly connected, or indirectly connected through an intermediary, or internally connected between two components.
  • an embodiment of the present application discloses a method for manufacturing a display panel, including the following steps:
  • the same transparent photoresist material is used in the step of forming a transparent filter in S11 and the step of forming a flat layer on the filter in S12.
  • the manufacturing process of the display panel includes the steps of making a filter and forming a flat layer on the filter.
  • the manufacturing of the filter will include the formation of a transparent filter.
  • the material is the same as the material used to form the flat layer on the filter.
  • the thickness of the transparent filter and other filters are the same.
  • the flat layer formed on the filter is more flat and evenly distributed.
  • the steps of manufacturing the filter and forming the flat layer on the filter include using an on-array color filter technology to fabricate the array substrate.
  • the steps of manufacturing the filter and forming the flat layer on the filter include using an on-array color filter technology to fabricate the color filter substrate opposite to the array substrate.
  • the steps of S11 and S12 can be formed on the array substrate (Array Substrate) using COA (Color Filter on Array) technology, or can be formed on the color film substrate (Color Film Sub-strate).
  • COA Color Filter on Array
  • Color Film Sub-strate Color Film Sub-strate
  • the step of forming a transparent filter in S114 includes: S1141 is coated with a transparent photoresist material to form a transparent photoresist layer; S1142 is exposed to the transparent photoresist layer using a photomask.
  • the step of exposing and developing the transparent photoresist layer using a photomask includes baking the transparent photoresist layer after exposure and development.
  • the transparent photoresist layer After the transparent photoresist layer is exposed and developed, it needs to be baked to obtain a transparent filter.
  • the step of S12 forming a flat layer on the filter includes:
  • a transparent photoresist material When forming a transparent filter, a transparent photoresist material is used. A flat layer is formed on the filter and coated with the same material. The transparent photoresist layer is baked to form a flat layer. The materials used are all the same transparent photoresist material, the flatness of the flat layer is better, and the flat layer formed is more uniform.
  • the step of making the filter includes forming a color filter.
  • the color filter is also made at the same time when the filter is made. After all the filters are made at the same time, the next process is performed.
  • the steps of forming a color filter include: coating a layer of color photoresist with a color photoresist material; exposing the color photoresist layer with a photomask; and developing the color photoresist layer with a developing solution, Obtain a color filter pattern; bake to form a color filter.
  • the specific process of forming the color filter needs to first coat the color photoresist material on the color photoresist layer, then expose and develop it to obtain the color filter pattern, and finally bake the filter to obtain the color Filter.
  • a flat layer is formed on the color filter.
  • the forming a flat layer on the color filter includes: coating a transparent photoresist layer with a transparent photoresist material; baking the transparent photoresist layer to form a flat layer.
  • the specific process of forming the flat layer first coats the material of the transparent photoresist layer, bakes the transparent photoresist layer again to form a flat layer.
  • an embodiment of the present application further discloses a method for manufacturing a display panel, including the following steps:
  • step of forming the first color filter includes:
  • S112 the step of forming the second color filter, the specific steps are similar to the steps of forming the first color filter;
  • S113 the step of forming the third color filter, the specific steps are similar to the steps of forming the first color filter;
  • Step of forming a transparent filter wherein the step of forming a transparent filter includes:
  • S1141 use a transparent photoresist material to coat a layer of transparent photoresist
  • forming a flat layer on the color filter and the transparent filter includes the following steps:
  • the same transparent photoresist material is used in the step of forming a transparent filter in S114 and the step of coating a transparent photoresist layer with the transparent photoresist material of S121.
  • the step of forming the first / second / third color filter and the step of forming the transparent filter are not limited in sequence.
  • the manufacturing process of the display panel includes the steps of manufacturing a filter and forming a flat layer on the filter.
  • the manufacturing of the filter will include the formation of a transparent filter.
  • the material used to form the transparent filter is a transparent photoresist material This material is the same as the material used to form the flat layer on the filter.
  • the thickness of the transparent filter and other filters are the same.
  • the flat layer formed on the filter is more flat and evenly distributed. When using a photoresist material to form a transparent photoresist layer, the formed transparent photoresist layer is exposed and developed to obtain a transparent filter.
  • a mask process is added.
  • a transparent photoresist material is used.
  • a flat layer is formed on the filter and coated with the same material.
  • the transparent photoresist layer is baked to form a flat layer.
  • the materials used are all the same transparent photoresist material, the flatness of the flat layer is better, and the flat layer formed is more uniform.
  • an embodiment of the present application further discloses a display panel, including:
  • each pixel includes a plurality of sub-pixels; a plurality of pixels and a filter corresponding to each pixel in one-to-one correspondence, wherein each filter includes a plurality of sub-filters; each sub-filter and its corresponding pixel The sub-pixels in the one-to-one correspondence; each filter includes a plurality of colored sub-filters 100 and at least one transparent filter 200; the display panel also includes a flat layer 300 disposed above the filter, wherein, flat The layer 300 and the transparent filter 200 are made of the same transparent photoresist material; the transparent filter 200 and the flat layer 300 are made by two exposure and development processes.
  • the display panel includes a filter and a flat layer 300 is formed on the filter.
  • the filter includes at least one transparent filter 200 and a plurality of colored sub-filters 100.
  • the material used to form the transparent filter 200 is transparent
  • the photoresist material is the same as the material used to form the flat layer 300 on the filter.
  • the thickness of the transparent filter 200 and other filters are the same.
  • the flat layer 300 formed on the filter is more flat and evenly distributed. .
  • a developing boundary layer 400 is formed between the contact surface of the transparent filter 200 and the flat layer 300.
  • a transparent photoresist layer is used to form a transparent photoresist layer.
  • a mask process is added.
  • a transparent photoresist layer is formed, which is coated again to form a flat layer 300.
  • a developing boundary layer 400 is formed between the contact surface of the optical sheet 200 and the flat layer 300.
  • the developer boundary layer 400 formed between the transparent filter 200 and the contact surface of the flat layer 300 has a developer solution remaining.
  • the developing solution at the time of development remains between the contact surface of the transparent filter 200 and the flat layer 300, and the developing boundary layer 400 has the remaining developing solution.
  • the average value of the total thickness of all the film layers at the transparent filter 200 is consistent with the average value of the total thickness of all the film layers at the color filter 100.
  • the average thickness of all the film layers in the area of the transparent filter 200 is the same as the average thickness of all the film layers in the area of the color filter 100, so that the thickness of the transparent filter 200 and the color filter 100 are consistent and flat
  • the flatness of the layer 300 is better and the distribution is more uniform.
  • the above thickness consistency is consistent within the processing accuracy range, and within a certain processing accuracy range threshold, the thickness is considered to be consistent.
  • each filter includes a red sub-filter 110, a green sub-filter 120, a blue sub-filter 130, and a transparent filter 200; each pixel includes A red sub-pixel 510 corresponding to the sub-filter 110, a green sub-pixel 520 corresponding to the green sub-filter 120, a blue sub-pixel 530 corresponding to the blue sub-filter 130, and a transparent filter 200 corresponds to one white sub-pixel 540; the sub-pixels in each pixel are arranged in a row, in the order of: red sub-pixel 510, green sub-pixel 520, blue sub-pixel 530 and white sub-pixel 540.
  • each filter includes a red sub-filter 110, a green sub-filter 120, a blue sub-filter 130 and a transparent filter 200, of which four kinds of filters It corresponds to four sub-pixels, which are distributed in a row, followed by red sub-pixel 510, green sub-pixel 520, blue sub-pixel 530 and white sub-pixel 540.
  • This architecture drives high transmittance and resolution .
  • each filter includes a red sub-filter 110, a green sub-filter 120, a blue sub-filter 130, and a transparent filter 200; each pixel includes A red sub-pixel 510 corresponding to the sub-filter 110, a green sub-pixel 520 corresponding to the green sub-filter 120, a blue sub-pixel 530 corresponding to the blue sub-filter 130, and a transparent filter 200 corresponds to a white sub-pixel 540; the sub-pixels in each pixel are arranged in a 2 ⁇ 2 arrangement, where the order of the first row is: red sub-pixel 510, green sub-pixel 520; the order of the second row is: blue The color sub-pixel 530 and the white sub-pixel 540.
  • each filter includes a red sub-filter 110, a green sub-filter 120, a blue sub-filter 130, and a transparent filter 200, of which four filters
  • the slices correspond to four sub-pixels.
  • the four sub-pixels are arranged in a 2 ⁇ 2 arrangement.
  • the first row is sequentially red sub-pixel 510 and green sub-pixel 520, and the second row is: blue sub-pixel 530 and white sub-pixel 540, this architecture is driven by high penetration rate and resolution.
  • the panel of this application can be a TN panel (full name Twisted Nematic, namely twisted nematic panel), IPS panel (In-PaneSwitcing, plane conversion), VA panel (Multi-domain Vertica Aignment, multi-quadrant vertical alignment technology), of course , Can also be other types of panels, just apply.
  • TN panel full name Twisted Nematic, namely twisted nematic panel
  • IPS panel In-PaneSwitcing, plane conversion
  • VA panel Multi-domain Vertica Aignment, multi-quadrant vertical alignment technology

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Abstract

本申请公开了一种显示面板和制作方法,所述显示面板包括:多个像素和对应的滤光片;平坦层设置在所述滤光片上,所述平坦层与透明滤光片采用相同的透明光阻材料制成。

Description

一种显示面板和制作方法
本申请要求于2018年10月8日提交中国专利局、申请号为201811167007.7、发明名称为“一种显示面板和制作方法”的中国专利申请的优先权,其全部内容通过引用结合在本申请中。
技术领域
本申请涉及显示技术领域,更具体的说,涉及一种显示面板和制作方法。
背景技术
这里的陈述仅提供与本申请有关的背景信息,而不必然地构成现有技术。
随着科技的发展和进步,显示器具有机身薄、省电、无辐射等众多优点,得到了广泛的应用。市场上的显示器大部分为背光型显示器,其包括显示面板及背光模组(Backlight Module)。显示面板包括彩膜基板(Color Filter Substrate,CF Substrate,也称彩色滤光片基板)、薄膜晶体管阵列基板(Thin Film Transistor Substrate,TFT Substrate),上述基板的相对内侧存在透明电极。
显示器持续走向高解析化,如4K UHD(Ultra-HighDefinition,超高清)电视持续为大众所钟爱。随着显示器尺寸的不断放大,使用者需求的解析度也越来越高。提高面板解析度最有效的方法就是使像素在屏幕上的个数越多,尺寸越小。并且通常我们也更需求高穿透率的面板,其一是由于通过改变显示器的某些设计可以达到减少耗电的需求,再者就是穿透率越高,画面更鲜艳,画质更细腻。显示面板的解析度和穿透率并不高,不能满足人们日益增长的需求。
技术解决方案
本申请的目的在于提供一种显示面板和制作方法,以解决提高显示面板解析度和穿透率的问题。
为实现上述目的,本申请提供了一种显示面板的制作方法,包括以下步骤:
制作滤光片;
在滤光片上形成平坦层;
所述制作滤光片的步骤中包括形成透明滤光片的步骤;其中,所述形成透明滤光片的步骤中和在滤光片上形成平坦层的步骤中采用的是同样的透明光阻材料。
可选的,所述制作滤光片和所述在滤光片上形成平坦层的步骤包括,采用阵列上彩色滤光片技术在阵列基板上进行制作。
所述制作滤光片和所述在滤光片上形成平坦层的步骤包括,采用阵列上彩色滤光片技术在与阵列基板对置的彩膜基板上进行制作。
可选的,所述形成透明滤光片的步骤包括:使用透明光阻材料形成一层透明光阻层;使用光罩对所述透明光阻层曝光显影,得到所述透明滤光片。
可选的,所述使用光罩对所述透明光阻层曝光显影的步骤包括,对曝光显影后的透明光阻层进行烘烤。
可选的,所述在滤光片上形成平坦层的步骤包括:使用和所述透明滤光片同样的材料涂布一层透明光阻层;对所述透明光阻层进行烘烤,形成所述平坦层。
可选的,所述制作滤光片的步骤中包括形成彩色滤光片。
可选的,所述形成彩色滤光片包括:使用彩色光阻材料涂布一层彩色光阻层;使用光罩对所述彩色光阻层曝光;以及使用显影液对所述彩色光阻层显影,得到所述彩色滤光片图案;烘烤,形成彩色滤光片。
可选的,所述形成彩色滤光片步骤后,在彩色滤光片上形成平坦层。
可选的,所述在彩色滤光片上形成平坦层包括:使用透明光阻材料涂布一层透明光阻层;对透明光阻层进行烘烤,形成平坦层。
本申请还公开了一种显示面板的制作方法,包括以下步骤:
形成滤光片的步骤,所述形成滤光片的步骤包括:
形成第一彩色滤光片的步骤;
形成第二彩色滤光片的步骤;
形成第三彩色滤光片的步骤;
形成透明滤光片的步骤,其中,所述形成透明滤光片的步骤包括:
使用透明光阻材料涂布一层透明光阻层;
使用光罩对所述透明光阻层曝光;
使用显影液对所述透明光阻层显影,得到所述透明滤光片图案;
烘烤,形成所述透明滤光片;
在形成滤光片的步骤之后,在彩色滤光片和透明滤光片上形成平坦层,包括以下步骤:
使用透明光阻材料涂布一层透明光阻层;
对所述透明光阻层进行烘烤,形成所述平坦层。
本申请还公开了一种显示面板,包括:多个像素,每个像素包括多个子像素;多个与每个像素一一对应的滤光片,其中每个滤光片包括多个子滤光片;所述每个子滤光片与与其对应的像素中的子像素一一对应;所述每个滤光片包括有多个彩色子滤光片和至少一个透明滤光片;所述显示面板还包括设置在所述滤光片上方的平坦层,其中,所述平坦层与所述透明滤光片采用相同的透明光阻材料制成;所述透明滤光片与平坦层 由两道曝光显影制程制成。
可选的,所述透明滤光片与所述平坦层的接触面之间形成有一层显影分界层。
可选的,所述透明滤光片与所述平坦层的接触面之间形成的显影分界层中有显影液残留。
可选的,所述透明滤光片处的所有膜层总厚度的平均值与所述彩色滤光片处的所有膜层总厚度的平均值一致。
可选的,所述每个滤光片包括一个红色子滤光片、一个绿色子滤光片、一个蓝色子滤光片和一个透明滤光片;所述每个像素包括与红色子滤光片对应的一个红色子像素、与绿色子滤光片对应的一个绿色子像素、与蓝色子滤光片对应的一个蓝色子像素和与透明滤光片对应的一个白色子像素;所述每个像素内的子像素呈一行排布,顺序分别为:红色子像素、绿色子像素、蓝色子像素和白色子像素。
可选的,所述每个滤光片包括一个红色子滤光片、一个绿色子滤光片、一个蓝色子滤光片和一个透明滤光片;所述每个像素包括与红色子滤光片对应的一个红色子像素、与绿色子滤光片对应的一个绿色子像素、与蓝色子滤光片对应的一个蓝色子像素和与透明滤光片对应的一个白色子像素;所述每个像素内的子像素呈2×2排布,其中,第一行的顺序为:红色子像素、绿色子像素;第二行的顺序为:蓝色子像素和白色子像素。
本申请显示面板制作过程中,制作滤光片中的透明滤光片所用的材料与形成平坦层的材料相同,皆为透明光阻材料,同时,在制作滤光片和在滤光片上形成平坦层的两个步骤中,分别使用同样的材料形成透明滤光片和平坦层,这样的设计使得透明滤光片的厚度可以根据需要调节,从而使透明滤光片位置处的高度接近其他滤光片位置处的高度,在滤光片上形成的平坦层更加平坦,分布均匀。
附图说明
所包括的附图用来提供对本申请实施例的的理解,其构成了说明书的一部分,进行例示本申请的实施方式,并与文字描述一起来阐释本申请的原理。显而易见地,下面描述中的附图仅仅是本申请的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动性的前提下,还可以根据这些附图获得其他的附图。在附图中:
图1是本申请实施例一种显示面板的制作方法流程示意图;
图2是本申请另一实施例一种显示面板的制作方法流程示意图;
图3是本申请另一实施例一种显示面板的制作方法流程示意图;
图4是本申请另一实施例一种显示面板的制作方法流程示意图;
图5是本申请另一实施例一种显示面板的制作方法流程示意图;
图6是本申请另一实施例一种显示面板剖面的示意图;
图7是本申请另一实施例一行排布子像素的示意图;
图8是本申请另一实施例2×2排布子像素的示意图。
本申请的实施方式
这里所公开的具体结构和功能细节仅仅是代表性的,并且是用于描述本申请的示例性实施例的目的。但是本申请可以通过许多替换形式来具体实现,并且不应当被解释成仅仅受限于这里所阐述的实施例。
在本申请的描述中,需要理解的是,术语“中心”、“横向”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有 特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此,限定有“第一”、“第二”的特征可以明示或者隐含地包括一个或者更多个特征。在本申请的描述中,除非另有说明,“多个”的含义是两个或两个以上。另外,术语“包括”及其任何变形,意图在于覆盖不排他的包含。
在本申请的描述中,需要说明的是,除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本申请中的具体含义。
这里所使用的术语仅仅是为了描述具体实施例而不意图限制示例性实施例。除非上下文明确地另有所指,否则这里所使用的单数形式“一个”、“一项”还意图包括复数。还应当理解的是,这里所使用的术语“包括”和/或“包含”规定所陈述的特征、整数、步骤、操作、单元和/或组件的存在,而不排除存在或添加一个或更多其他特征、整数、步骤、操作、单元、组件和/或其组合。
下面结合附图和较佳的实施例对本申请作说明。
参考图1至5,本申请实施例公开了一种显示面板的制作方法,包括以下步骤:
S11:制作滤光片,包括形成透明滤光片的步骤;
S12:在滤光片上形成平坦层;
S11形成透明滤光片的步骤中和S12在滤光片上形成平坦层的步骤中采用的是同样的透明光阻材料。
显示面板制作过程包括制作滤光片和在滤光片上形成平坦层的步骤,同时制作滤光片中会包括形成透明滤光片,形成透明滤光片所用的 材料为透明光阻材料,这种材料和在滤光片形成平坦层用的材料相同,透明滤光片和其他滤光片厚度一致,在滤光片上形成的平坦层更加平坦,分布均匀。
在一实施例中,所述制作滤光片和所述在滤光片上形成平坦层的步骤包括,采用阵列上彩色滤光片技术在阵列基板上进行制作。
在一实施例中,制作滤光片和所述在滤光片上形成平坦层的步骤包括,采用阵列上彩色滤光片技术在与阵列基板对置的彩膜基板上进行制作。
其中,S11和S12的步骤可以采用COA(Color Filter on Array,阵列上彩色滤光片)技术,形成在阵列基板(Array Substrate)上,也可以形成在与阵列基板对置的彩膜基板(Color Film Sub-strate)上。在整个显示面板的制作方法中,本领域技术人员可以根据需要,灵活设计与其他结构制程的先后顺序,如TFT(Thin Film Transistor,薄膜晶体管)的相关的制程。
在一实施例中,S114形成透明滤光片的步骤包括:S1141使用透明光阻材料涂布形成一层透明光阻层;S1142使用光罩对透明光阻层曝光。
这是具体的使用光阻材料涂布形成一层透明光阻层的方法,对形成的透明光阻层进行曝光显影,相对于三原色滤光片来说增加了一道光罩制程。
在一实施例中,使用光罩对所述透明光阻层曝光显影的步骤包括,对曝光显影后的透明光阻层进行烘烤。
对透明光阻层曝光显影之后,需要对其进行烘烤,得到透明滤光片。
在一实施例中,S12在滤光片上形成平坦层的步骤包括:
S121:使用和透明滤光片同样的材料涂布一层透明光阻层;
S122:对透明光阻层进行烘烤,形成的平坦层。
在形成透明滤光片时使用的是透明的光阻材料,在滤光片上形成平坦层采用相同的材料进行涂布,对透明光阻层进行烘烤后形成平坦层。使用的材料都是相同的透明光阻材料,平坦层的平坦度更好,形成的平坦层更均匀。
在一实施例中,制作滤光片的步骤中包括形成彩色滤光片。
制作滤光片同时也进行制作彩色滤光片,所有滤光片同时制作完成后,进行下一道工序。
在一实施例中,形成彩色滤光片的步骤包括:使用彩色光阻材料涂布一层彩色光阻层;使用光罩对彩色光阻层曝光;以及使用显影液对彩色光阻层显影,得到彩色滤光片图案;烘烤,形成彩色滤光片。
具体的形成彩色滤光片的过程,需要首先在彩色光阻层上涂布彩色光阻材料,再对其进行曝光显影,得到彩色滤光片图案,最后对滤光片进行烘烤,得到彩色滤光片。
在一实施例中,形成彩色滤光片步骤后,在彩色滤光片上形成平坦层。
形成彩色滤光片后,需要在彩色滤光片上形成平坦层。
在一实施例中,所述在彩色滤光片上形成平坦层包括:使用透明光阻材料涂布一层透明光阻层;对透明光阻层进行烘烤,形成平坦层。
形成平坦层的具体过程,首先涂布透明光阻层材料,对透明光阻层进行再次烘烤,形成平坦层。
参考图1至5,本申请实施例还公开了一种显示面板的制作方法,包括以下步骤:
S11:形成滤光片的步骤,包括:
S111:形成第一彩色滤光片的步骤,形成第一彩色滤光片的步骤 包括:
S1111:使用第一彩色光阻材料涂布一层第一彩色光阻层;
S1112:使用光罩对所述第一彩色光阻层曝光;
S1113:使用显影液对所述第一彩色光阻层显影,得到所述第一彩色滤光片图案;
S1114:烘烤,形成第一彩色滤光片;
S112:形成第二彩色滤光片的步骤,具体的步骤与形成第一彩色滤光片的步骤类似;
S113:形成第三彩色滤光片的步骤,具体的步骤与形成第一彩色滤光片的步骤类似;
S114:形成透明滤光片的步骤,其中,形成透明滤光片的步骤包括:
S1141:使用透明光阻材料涂布一层透明光阻层;
S1142:使用光罩对透明光阻层曝光;
S1143:使用显影液对透明光阻层显影,得到的透明滤光片图案;
S1144:烘烤,形成的透明滤光片;
在形成滤光片的步骤之后,在彩色滤光片和透明滤光片上形成平坦层,包括以下步骤:
S121:使用透明光阻材料涂布一层透明光阻层;
S122:对透明光阻层进行烘烤,形成平坦层。
其中,S114形成透明滤光片的步骤中和S121透明光阻材料涂布一层透明光阻层的步骤中采用的是同样的透明光阻材料。
上述制作方法中,形成第一/第二/第三彩色滤光片的步骤和形 成透明滤光片的步骤无先后限定。显示面板制作过程中,包括制作滤光片和在滤光片上形成平坦层的步骤,同时制作滤光片中会包括形成透明滤光片,形成透明滤光片所用的材料为透明光阻材料,这种材料和在滤光片形成平坦层用的材料形同,透明滤光片和其他滤光片厚度一致,在滤光片上形成的平坦层更加平坦,分布均匀。使用光阻材料形成一层透明光阻层时,对形成的透明光阻层进行曝光显影,得到透明滤光片,相对于三原色滤光片来说增加了一道光罩制程。在形成透明滤光片时使用的是透明的光阻材料,在滤光片上形成平坦层采用相同的材料进行涂布,对透明光阻层进行烘烤后形成平坦层。使用的材料都是相同的透明光阻材料,平坦层的平坦度更好,形成的平坦层更均匀。
参考图6至图8,本申请实施例还公开了一种显示面板,包括:
多个像素,每个像素包括多个子像素;多个像素与每个像素一一对应的滤光片,其中每个滤光片包括多个子滤光片;每个子滤光片与与其对应的像素中的子像素一一对应;每个滤光片包括有多个彩色子滤光片100和至少一个透明滤光片200;显示面板还包括设置在滤光片上方的平坦层300,其中,平坦层300与透明滤光片200采用相同的透明光阻材料制成;透明滤光片200与平坦层300由两道曝光显影制程制成。
显示面板包括滤光片和在滤光片上形成平坦层300,滤光片中包括至少一个透明滤光片200和多个彩色子滤光片100,形成透明滤光片200所用的材料为透明光阻材料,这种材料和在滤光片形成平坦层300用的材料形同,透明滤光片200和其他滤光片厚度一致,在滤光片上形成的平坦层300更加平坦,分布均匀。
在一实施例中,透明滤光片200与平坦层300的接触面之间形成有一层显影分界层400。
具体的使用透明光阻材料形成一层透明光阻层方法,相对于三原色滤光片来说增加一道光罩制程,通过曝光显影后形成透明光阻层,再次涂布形成平坦层300,透明滤光片200和平坦层300的接触面之间形成有 一层显影分界层400。
在一实施例中,透明滤光片200与平坦层300的接触面之间形成的显影分界层400中有显影液残留。
在显影时的显影液会残留在透明滤光片200与平坦层300的接触面之间,显影分界层400中存在显影液残留。
在一实施例中,透明滤光片200处的所有膜层总厚度的平均值与彩色滤光片100处的所有膜层总厚度的平均值一致。
透明滤光片200区域的所有膜层厚度平均值和彩色滤光片100区域所有的膜层厚度平均值一致,这样保证了透明滤光片200和彩色滤光片100的膜层厚度一致,平坦层300的平坦度更好,分布更加均匀。当然,上述厚度一致是在加工精度范围内的一致,在一定的加工精度范围阈值内,都认为厚度是一致的。
在一实施例中,每个滤光片包括一个红色子滤光片110、一个绿色子滤光片120、一个蓝色子滤光片130和一个透明滤光片200;每个像素包括与红色子滤光片110对应的一个红色子像素510、与绿色子滤光片120对应的一个绿色子像素520、与蓝色子滤光片130对应的一个蓝色子像素530和与透明滤光片200对应的一个白色子像素540;每个像素内的子像素呈一行排布,顺序分别为:红色子像素510、绿色子像素520、蓝色子像素530和白色子像素540。
一种具体的RGBW像素架构,每个滤光片包括红色子滤光片110、绿色子滤光片120、蓝色子滤光片130和透明滤光片200各一个,其中四种滤光片分相对应四种子像素,四种子像素呈一行分布,依次为红色子像素510、绿色子像素520、蓝色子像素530和白色子像素540,这种架构进行驱动的穿透率和解析度高。
在一实施例中,每个滤光片包括一个红色子滤光片110、一个绿色子滤光片120、一个蓝色子滤光片130和一个透明滤光片200;每个像素包括与红色子滤光片110对应的一个红色子像素510、与绿色子滤光片 120对应的一个绿色子像素520、与蓝色子滤光片130对应的一个蓝色子像素530和与透明滤光片200对应的一个白色子像素540;每个像素内的子像素呈2×2排布,其中,第一行的顺序为:红色子像素510、绿色子像素520;第二行的顺序为:蓝色子像素530和白色子像素540。
另一种具体的RGBW像素架构,每个滤光片包括红色子滤光片110、绿色子滤光片120、蓝色子滤光片130和透明滤光片200各一个,其中四种滤光片分相对应四种子像素,四种子像素呈2×2排布,第一行顺序依次为红色子像素510、绿色子像素520,第二行的顺序为:蓝色子像素530和白色子像素540,这种架构进行驱动的穿透率和分辨率高。
需要说明的是,本方案中涉及到的各步骤的限定,在不影响具体方案实施的前提下,并不认定为对步骤先后顺序做出限定,写在前面的步骤可以是在先执行的,也可以是在后执行的,甚至也可以是同时执行的,只要能实施本方案,都应当视为属于本申请的保护范围。
本申请的面板可以是TN面板(全称为Twisted Nematic,即扭曲向列型面板)、IPS面板(In-PaneSwitcing,平面转换)、VA面板(Multi-domain Vertica Aignment,多象限垂直配向技术),当然,也可以是其他类型的面板,适用即可。
以上内容是结合具体的优选实施方式对本申请所作的详细说明,不能认定本申请的具体实施只局限于这些说明。对于本申请所属技术领域的普通技术人员来说,在不脱离本申请构思的前提下,还可以做出若干简单推演或替换,都应当视为属于本申请的保护范围。

Claims (17)

  1. 一种显示面板的制作方法,包括以下步骤:
    制作滤光片;
    在滤光片上形成平坦层;
    所述制作滤光片的步骤中包括形成透明滤光片的步骤;其中,所述形成透明滤光片的步骤中和在滤光片上形成平坦层的步骤中采用的是同样的透明光阻材料。
  2. 如权利要求1所述的一种显示面板的制作方法,其中,所述制作滤光片和所述在滤光片上形成平坦层的步骤包括,采用阵列上彩色滤光片技术在阵列基板上进行制作。
  3. 如权利要求1所述的一种显示面板的制作方法,其中,所述制作滤光片和所述在滤光片上形成平坦层的步骤包括,采用阵列上彩色滤光片技术在与阵列基板对置的彩膜基板上进行制作。
  4. 如权利要求1所述的一种显示面板的制作方法,其中,所述形成透明滤光片的步骤包括:
    使用透明光阻材料形成一层透明光阻层;
    使用光罩对所述透明光阻层曝光显影,得到所述透明滤光片。
  5. 如权利要求4所述的一种显示面板的制作方法,其中,所述使用光罩对所述透明光阻层曝光显影的步骤包括,对曝光显影后的透明光阻层进行烘烤。
  6. 如权利要求1所述的一种显示面板的制作方法,所述在滤光片上形成平坦层的步骤包括:
    使用和所述透明滤光片同样的材料涂布一层透明光阻层;
    对所述透明光阻层进行烘烤,形成所述平坦层。
  7. 如权利要求1所述的一种显示面板的制作方法,其中,所述制作滤光片的步骤中包括形成彩色滤光片。
  8. 如权利要求7所述的一种显示面板的制作方法,其中,所述形成彩色滤光片包括:
    使用彩色光阻材料涂布一层彩色光阻层;
    使用光罩对所述彩色光阻层曝光;
    以及使用显影液对所述彩色光阻层显影,得到所述彩色滤光片图案;
    烘烤,形成彩色滤光片。
  9. 如权利要求8所述的一种显示面板的制作方法,其中,所述形成彩色滤光片步骤后,在彩色滤光片上形成平坦层。
  10. 如权利要求9所述的一种显示面板的制作方法,其中,所述在彩色滤光片上形成平坦层包括:
    使用透明光阻材料涂布一层透明光阻层;
    对透明光阻层进行烘烤,形成平坦层。
  11. 一种显示面板的制作方法,包括以下步骤:
    形成滤光片的步骤,所述形成滤光片的步骤包括:
    形成第一彩色滤光片的步骤;
    形成第二彩色滤光片的步骤;
    形成第三彩色滤光片的步骤;
    形成透明滤光片的步骤,其中,所述形成透明滤光片的步骤包括:
    使用透明光阻材料涂布一层透明光阻层;
    使用光罩对所述透明光阻层曝光;
    以及使用显影液对所述透明光阻层显影,得到所述透明滤光片图案;
    烘烤,形成所述透明滤光片;
    在形成滤光片的步骤之后,在彩色滤光片和透明滤光片上形成平坦层,包括以下步骤:
    使用透明光阻材料涂布一层透明光阻层;
    对所述透明光阻层进行烘烤,形成所述平坦层。
  12. 一种显示面板,包括:
    多个像素单元,每个像素单元包括多个子像素;多个与每个像素一一对应的滤光片,其中每个滤光片包括多个子滤光片;所述每个子滤光片与与其对应的像素中的子像素一一对应;所述每个滤光片包括有多个彩色子滤光片和至少一个透明滤光片;所述显示面板还包括设置在所述滤光片上方的平坦层,其中,所述平坦层与所述透明滤光片采用相同的透明光阻材料制成;所述透明滤光片与平坦层由两道曝光显影制程制成。
  13. 如权利要求12所述的一种显示面板,其中,所述透明滤光片与所述平坦层的接触面之间形成有一层显影分界层。
  14. 如权利要求13所述的一种显示面板,其中,所述透明滤光片与所述平坦层的接触面之间形成的显影分界层中有显影液残留。
  15. 如权利要求12所述的一种显示面板,其中,所述透明滤光片处的所有膜层总厚度的平均值与所述彩色滤光片处的所有膜层总厚度的平均值一致。
  16. 如权利要求12所述的一种显示面板,其中,所述每个滤光片包括一个红色子滤光片、一个绿色子滤光片、一个蓝色子滤光片和一个透明滤光片;所述每个像素包括与红色子滤光片对应的一个红色子像素、与绿色子滤光片对应的一个绿色子像素、与蓝色子滤光片对应的一个蓝色子像素和与透明滤光片对应的一个白色子像素;所述每个像素内的子像素呈一行排布,顺序分别为:红色子像素、绿色子像素、蓝色子像素和白色子像素。
  17. 如权利要求12所述的一种显示面板,其中,所述每个滤光片包括一个红色子滤光片、一个绿色子滤光片、一个蓝色子滤光片和一个透明滤光片;所述每个像素包括与红色子滤光片对应的一个红色子像素、与绿色子滤光片对应的一个绿色子像素、与蓝色子滤光片对应的一个蓝色子像素和与透明滤光片对应的一个白色子像素;所述每个像素内的子像素呈2×2排布,其中,第一行的顺序为:红色子像素、绿色子像素;第二行的顺序为:蓝色子像素和白色子像素。
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