WO2020062941A1 - 对焦补偿的方法及其设备 - Google Patents

对焦补偿的方法及其设备 Download PDF

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Publication number
WO2020062941A1
WO2020062941A1 PCT/CN2019/091252 CN2019091252W WO2020062941A1 WO 2020062941 A1 WO2020062941 A1 WO 2020062941A1 CN 2019091252 W CN2019091252 W CN 2019091252W WO 2020062941 A1 WO2020062941 A1 WO 2020062941A1
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Prior art keywords
line width
measured
focus
compensation
exposure machine
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PCT/CN2019/091252
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English (en)
French (fr)
Inventor
桂宇畅
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Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Priority to US16/613,422 priority Critical patent/US11119418B2/en
Publication of WO2020062941A1 publication Critical patent/WO2020062941A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70641—Focus
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/70—Circuitry for compensating brightness variation in the scene
    • H04N23/73—Circuitry for compensating brightness variation in the scene by influencing the exposure time
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals

Definitions

  • the invention relates to a method and a device for focus compensation, in particular to a method and a device for focus compensation of an exposure machine.
  • the requirements for high integration and miniaturization of semiconductor integrated circuits have made stricter requirements on the accuracy of focusing.
  • the requirements for the resolution of liquid crystal screens become higher and higher, the focusing accuracy of the exposure machine has become higher.
  • the current technology mainly improves the stability of focusing through the measurement of multiple points by an exposure machine.
  • the low-temperature polysilicon manufacturing process of the display still has the following problems in the focusing use of the actual exposure machine. For example, because of the complicated layer stacking in the low-temperature polysilicon manufacturing process, and the parameters such as the flatness and deflection of the mask itself, the exposure machine will focus The accuracy has a greater impact.
  • the present invention provides a method for focus compensation to solve the problem of insufficient focus accuracy of an exposure machine in the prior art.
  • the main object of the present invention is to provide a method for focus compensation, which can improve the accuracy of the focus of the exposure machine.
  • a secondary object of the present invention is to provide a method for focus compensation, which can consider the flatness and deflection of the object to be measured, and then correct the focus of the exposure machine so as to improve the focus accuracy of the exposure machine.
  • an embodiment of the present invention provides a method for focus compensation, including steps:
  • a test object is provided, and a plurality of line widths are measured for a plurality of points in an axis direction of a plurality of line segments with a plurality of different focusing conditions on the test object to obtain a plurality of measurement values. , Forming the plurality of measured values into at least one line width curve; and
  • a compensation value is obtained through the at least one line width curve, so as to use the compensation value to focus the exposure machine lens group on a focusing operation at a plurality of points in a plurality of axis directions of the plurality of line segments. Correction.
  • the plurality of different focusing conditions are that the test object is placed under a plurality of different focal planes, and the line width is measured on the test object.
  • the plurality of different focusing conditions is that the object to be measured is placed under five focal planes, wherein the five focal planes are the focal point -40 microns, and the focal point- 20 microns, the focal point, the focal point +20 microns, and the focal point +40 microns.
  • step (S12) further includes:
  • step (S13) further includes:
  • Another embodiment of the present invention provides a method of focus compensation, wherein the method of focus compensation includes: (S11) providing an exposure machine lens group with a focus; (S12) providing a test object, and The measurement object measures a plurality of line widths at a plurality of points in an axis direction of a plurality of line segments under a plurality of different focusing conditions to obtain a plurality of measurement values, and the plurality of measurement values form at least a line width. A curve; and (S13) correcting a focusing operation of the exposure machine lens group according to the at least one line width curve.
  • the plurality of different focusing conditions are that the test object is placed under a plurality of different focal planes, and the line width is measured on the test object.
  • the plurality of different focusing conditions is that the object to be measured is placed under five focal planes, wherein the five focal planes are the focal point -40 microns, and the focal point- 20 microns, the focal point, the focal point +20 microns, and the focal point +40 microns.
  • the step (S12) further includes: subtracting a first line width measured at the focal point from a second line width at a lowest point in the line width curve. To obtain a compensation value; and use the compensation value to correct a focusing operation of the exposure machine lens group.
  • the step (S12) further includes: measuring the multiple line widths at multiple points in multiple axial directions of the multiple line segments to obtain multiple line widths. Curves; and obtaining a plurality of compensation values through the plurality of line width curves, so as to use the plurality of compensation values to align the exposure machine lens group to a plurality of points in a plurality of axis directions of the plurality of line segments. The focusing operation is corrected.
  • an embodiment of the present invention further provides a device for focus compensation, wherein the device for focus compensation includes: an exposure machine lens group having a focus; a test object platform configured to place a test object , The exposure machine lens group measures a plurality of line widths for a plurality of points in an axis direction of a plurality of line segments with a plurality of different focusing conditions on the object to be measured to obtain a plurality of measurement values; A processing module configured to form the plurality of measured values into at least one line width curve and generate a compensation signal according to the at least one line width curve; and a communication module configured to transmit the compensation signal to The exposure machine lens group is corrected by a focusing operation of the exposure machine lens group.
  • the test object platform includes a height adjustment mechanism configured to set the test object platform to different heights for placing the test object on a plurality of different focal planes. And measuring the line width of the object to be measured.
  • the height adjustment mechanism has five different focal planes corresponding to five focal planes of the exposure machine lens group, and the five focal planes are respectively the focal point -40 microns, the The focal point is -20 microns, the focal point, the focal point +20 microns, and the focal point +40 microns.
  • the processing module is further configured to subtract a first line width measured at the focal point and a second line width at a lowest point in the line width curve, To obtain a compensation value and convert it into the compensation signal.
  • the exposure machine lens group further includes a plurality of lens groups configured to simultaneously measure the plurality of line widths at a plurality of points in a plurality of axial directions of the plurality of line segments.
  • the processing module is configured to obtain a plurality of compensation values through the plurality of line width curves, so as to use the plurality of compensation values to align the exposure lens group with each other.
  • the focusing operation is performed at a plurality of points in a plurality of axial directions of the plurality of line segments.
  • the focus compensation method of the present invention can not only improve the focusing accuracy of the exposure machine, but also allow the exposure machine to focus on the flatness and deflection of the object to be measured, and then focus the exposure machine. Correction to improve the accuracy of the exposure machine focus.
  • FIG. 1 is a schematic flowchart of a focus compensation method according to an embodiment of the present invention.
  • FIG. 2 is a block diagram of a focus compensation device according to an embodiment of the present invention.
  • FIG. 3 is a schematic diagram of an object to be measured in a focus compensation method according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram of multiple line width curves measured by a focus compensation method according to an embodiment of the present invention.
  • 5A shows a schematic diagram before the measurement of the exposure machine lens group is corrected in a focus compensation method according to an embodiment of the present invention
  • FIG. 5B shows a schematic diagram of the measurement of the lens group of the exposure machine in the focus compensation method according to the embodiment of the present invention after the measurement is corrected.
  • a processing module or “at least one processing module” may include a plurality of processing modules, including a composition thereof.
  • the focus compensation method mainly includes the following steps: (S11) providing an exposure machine lens group with a focus; (S12) providing a test object to the test object Measuring a plurality of line widths at a plurality of points in an axis direction of a plurality of line segments under a plurality of different focusing conditions to obtain a plurality of measurement values, and forming the plurality of measurement values into at least a line width curve; And (S13) correcting a focusing operation of the exposure machine lens group according to the at least one line width curve.
  • FIG. 1, FIG. 2 and FIG. 3, show a focus compensation method and an exposure machine lens group 21 in the device according to the embodiment of the present invention, for example, an exposure machine 2 used in a photolithography process.
  • the exposure machine lens group 21 has a focus; the exposure machine 2 further includes a test object platform 22 configured to place a test object 1.
  • the exposure machine lens group 21 measures a plurality of line widths on the object under test 1 at a plurality of points in an axis direction of a plurality of line segments under a plurality of different focusing conditions to obtain a plurality of measured values;
  • a processing module 24 configured to form the plurality of measured values into at least one line width curve and generating a compensation signal according to the at least one line width curve; and
  • a communication module 25 configured to convert the compensation
  • the signal is transmitted to the exposure machine lens group 21 and is corrected by a focusing operation of the exposure machine lens group 21.
  • the test object platform 22 includes a height adjustment mechanism 23 configured to set the test object platform 22 to different heights.
  • the plurality of different focusing conditions is that the test object 1 is placed under five focal planes (31, 32, 33, 34, and 35), where the five The focal planes are: the first focal plane 31 is located at the focal point -40 microns, the second focal plane 32 is located at the focal point -20 microns, the third focal plane 33 is located at the focal point, and the fourth focal plane 34 is located at The focal point +20 micrometers and the fifth focal plane 35 are located at the focal point +40 micrometers.
  • the height adjusting mechanism 23 has five different heights corresponding to the five focal planes of the exposure machine lens group 21.
  • the exposure machine lens group 21 measures a plurality of line widths of the object to be measured 1 at a plurality of points in an axis direction of a plurality of line segments under a plurality of different focusing conditions, for example,
  • the test object 1 is placed under a plurality of different focal planes, and a line width of the plurality of line segments 11 of a line on the test object 1 is measured.
  • the height adjustment mechanism 23 sets the DUT 22 as the first focal plane 31 (that is, when the focal point is at -40 micrometers), along X In the direction of the axis, the plurality of line widths of the plurality of line segments 11 of the test object 1 are measured at M3 to obtain a first measurement value.
  • the height of the object platform 22 is set to the second focal plane 32 (that is, when the focal point is -20 micrometers) by the height adjustment mechanism 23, and the X-axis direction
  • the plurality of line segments 11 of the object under test 1 are also measured at the plurality of line widths at M3 to obtain a second measurement value.
  • the object-to-be-measured platform 22 is set to the third focal plane 33 (that is, when it is located at the focal point) through the height adjustment mechanism 23, and the object-to-be-measured is along the X-axis direction.
  • the plurality of line segments 11 of 1 are also measured at the plurality of line widths at M3 to obtain a third measurement value.
  • the object platform 22 is set to the fourth focal plane 34 (that is, when it is at the focal point +20 micrometers) by the height adjustment mechanism 23, and the direction of the The plurality of line segments 11 of the object 1 are also measured at the plurality of line widths at M3 to obtain a fourth measurement value.
  • the height-adjusting mechanism 23 is used to set the object-to-be-measured platform 22 as the fifth focal plane 35 (that is, when it is located at the focal point +40 micrometers), in the direction along the X axis,
  • the plurality of line segments 11 of the object 1 are also measured at the plurality of line widths at M3 to obtain a fifth measurement value.
  • Combining the plurality of measurement values (for example, the first measurement value, the second measurement value, the third measurement value, the fourth measurement value, and the fifth measurement value) ) Draw a line width curve.
  • the multiple line widths may be measured at multiple points in multiple axial directions of the multiple line segments to obtain multiple line width curves.
  • the height adjustment mechanism 23 sets the object platform 22 as the first focal plane 31 (that is, when the focal point is at -40 micrometers)
  • the X-axis The plurality of line segments 11 of the object under test 1 measure the plurality of line widths at M3, and then move a distance along the Y axis to measure the plurality of line widths at M4 and finally move a distance along the Y axis at The plurality of line widths are measured at M5 to obtain a first measurement value.
  • the height of the object platform 22 is set to the second focal plane 32 (that is, when the focal point is -20 micrometers) by the height adjustment mechanism 23, and the X-axis direction
  • the plurality of line segments 11 of the object under test 1 measure the plurality of line widths at M3, and then move a distance along the Y axis to measure the plurality of line widths at M4 and finally move a distance along the Y axis at
  • the plurality of line widths are measured at M5 to obtain a second measurement value.
  • the object-to-be-measured platform 22 is set to the third focal plane 33 (that is, when it is located at the focal point) through the height adjustment mechanism 23, and the object-to-be-measured is along the X axis direction.
  • the multiple line segments 11 of 1 measure the multiple line widths at M3, and then measure the multiple line widths at a distance along the Y axis at M4 and finally measure the multiple line widths at a distance along the Y axis at M5.
  • the plurality of line widths are measured to obtain a third measurement value.
  • the object platform 22 is set to the fourth focal plane 34 (that is, when it is at the focal point +20 micrometers) by the height adjustment mechanism 23, and the direction of the The plurality of line segments 11 of the object under test 1 measure the plurality of line widths at M3, and then move a distance along the Y axis to measure the plurality of line widths at M4 and finally move a distance along the Y axis at The plurality of line widths are measured at M5 to obtain a fourth measurement value.
  • the height-adjusting mechanism 23 is used to set the object-to-be-measured platform 22 as the fifth focal plane 35 (that is, when it is located at the focal point +40 micrometers), in the direction along the X axis,
  • the plurality of line segments 11 of the object under test 1 measure the plurality of line widths at M3, and then move a distance along the Y axis to measure the plurality of line widths at M4 and finally move a distance along the Y axis at
  • the plurality of line widths are measured at M5 to obtain a fifth measurement value.
  • Combining the plurality of measurement values (for example, the first measurement value, the second measurement value, the third measurement value, the fourth measurement value, and the fifth measurement value) ) Draw into multiple one-line-width curves.
  • FIG. 4 illustrates a schematic diagram of multiple line width curves measured according to the method of focus compensation of the present invention.
  • the plurality of measured values for example, the first measured value, the second measured value, the third measured value, the fourth measured value, and the first measured value
  • Five measured values) of the plurality of line width curves for example, M3, M4, and M5.
  • the plurality of line width curves may be formed by the processing module 24 into a plurality of line width curves. Subtract a first line width measured at the focal point from a second line width at the lowest point in the line width curve to obtain a compensation value.
  • the compensation value may be processed by the processing module 24 or other processing modules to subtract a first line width measured at the focal point and a second line width at a lowest point in the line width curve. To generate and convert into the compensation signal.
  • the exposure machine lens group 21 may further include a plurality of lens groups configured to measure a plurality of points (such as M3, M4, and M5) in a plurality of axis directions of the plurality of line segments 11 at the same time.
  • the machine lens group 21 corrects the focusing operation at a plurality of points in a plurality of axial directions of the plurality of line segments.
  • FIG. 5A shows a schematic diagram before the measurement of the exposure machine lens group 21 is corrected in a focus compensation method according to an embodiment of the present invention
  • FIG. 5B shows an embodiment of the present invention
  • the schematic diagram of the method of the focus compensation method after the measurement of the exposure machine lens group 21 is corrected.
  • the accuracy of the measured line width and the actual line width in FIG. 5A is insufficient, and the exposure lens group 21 cannot achieve the best focus.
  • At least one compensation value is obtained through the at least one line width curve, and after a focusing operation of the exposure machine lens group 21 is corrected, as shown in FIG. 5B, the measurement value of the line width is closer to the optimal measurement value, which is significantly larger. Improved focus accuracy.
  • the method and device for focusing compensation of the present invention can correct the focusing operation of the lens group of the exposure machine by measuring multiple line widths on the object to be measured.
  • the focus of the exposure machine is fine, which improves the stability of the focus.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

本发明公开一种对焦补偿的方法及其设备，包含以下步骤：（S11）提供一曝光机镜组；（S12）提供一待测物，对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值，将所述多个量测值形成至少一线宽曲线；以及（S13）依照所述至少一线宽曲线对所述曝光机镜组的一对焦作业进行补正。本发明通过对产品量测线宽，并反馈所述曝光机以对曝光机对焦补正，以达到改善曝光机对焦的精度。

Description

对焦补偿的方法及其设备 技术领域
本发明是有关于一种对焦补偿的方法及其设备，特别是有关于一种曝光机台的对焦补偿的方法及其设备。
 背景技术
近年来，半导体集成电路的高集成化及微细化的需求，对于对焦的精度要求越加严格。以液晶显示器行业为例，随着对液晶屏幕分辨率的要求越来越高，产品对曝光机的对焦精度随着具有更高的要求。一般而言，目前技术主要通过曝光机对多个点位计测来提高对焦的稳定性。
 技术问题
然而，显示器的低温多晶硅制程在实际曝光机的对焦使用上仍具有下述问题，例如：因低温多晶硅制程中层别堆叠复杂，且光罩自身平整度、挠曲量等参数，会对曝光机对焦的精度造成较大的影响。
故，有必要提供一种对焦补偿的方法，以解决现有技术所存在的问题。
 技术解决方案
有鉴于此，本发明提供一种对焦补偿的方法，以解决现有技术所存在的曝光机对焦精度不足的问题。
本发明的主要目的在于提供一种对焦补偿的方法，其可以改善曝光机对焦的精度。
本发明的次要目的在于提供一种对焦补偿的方法，其可以考量待测物自身平整度、挠曲量，进而对曝光机的对焦进行补正，以达到改善曝光机对焦的精度。
为达成本发明的前述目的，本发明一实施例提供一种对焦补偿的方法，包含步骤：
（S11）提供使用于光刻工艺中的一曝光机镜组，所述曝光机镜组具有一焦点；
（S12）提供一待测物，对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值，将所述多个量测值形成至少一线宽曲线；以及
（S13）通过所述至少一线宽曲线得到一补偿值，以利用所述补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的一对焦作业进行补正。
在本发明的一实施例中，所述多个不同的对焦条件为将所述待测物置于多个不同焦平面下，并对所述待测物进行量测所述线宽。
在本发明的一实施例中，所述多个不同的对焦条件为将所述待测物置于五个焦平面下，其中所述五个焦平面为所述焦点-40微米、所述焦点-20微米、所述焦点、所述焦点+20微米及所述焦点+40微米。
在本发明的一实施例中，所述的步骤（S12）更包含：
将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到所述补偿值；及
利用所述补偿值对所述曝光机镜组的所述对焦作业进行补正。
在本发明的一实施例中，所述的步骤（S13）更包含：
对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线；及
通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
本发明另一实施例提供一种对焦补偿的方法，其中所述对焦补偿的方法包含：（S11）提供一曝光机镜组，具有一焦点；（S12）提供一待测物，对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值，将所述多个量测值形成至少一线宽曲线；以及（S13）依照所述至少一线宽曲线对所述曝光机镜组的一对焦作业进行补正。
在本发明的一实施例中，所述多个不同的对焦条件为将所述待测物置于多个不同焦平面下，并对所述待测物进行量测所述线宽。
在本发明的一实施例中，所述多个不同的对焦条件为将所述待测物置于五个焦平面下，其中所述五个焦平面为所述焦点-40微米、所述焦点-20微米、所述焦点、所述焦点+20微米及所述焦点+40微米。
在本发明的一实施例中，所述的步骤（S12）更包含：将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到一补偿值；及利用所述补偿值对所述曝光机镜组的一对焦作业进行补正。
在本发明的一实施例中，所述的步骤（S12）更包含：对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线；及通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
再者，本发明一实施例另提供一种对焦补偿的设备，其中所述对焦补偿的设备包含：一曝光机镜组，具有一焦点；一待测物平台，配置用以放置一待测物，所述曝光机镜组对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值；一处理模组，配置用以将所述多个量测值形成至少一线宽曲线，并依照所述至少一线宽曲线生成一补偿信号；及一通信模组，配置用以将所述补偿信号传送至所述曝光机镜组，以所述曝光机镜组的一对焦作业进行补正。
在本发明的一实施例中，所述待测物平台包含一高度调整机构，配置用以将所述待测物平台设置为不同高度，用于将所述待测物置于多个不同焦平面下，并对所述待测物进行量测所述线宽。
在本发明的一实施例中，所述高度调整机构具有五个不同高度对应于所述曝光机镜组的五个焦平面，所述五个焦平面分别为所述焦点-40微米、所述焦点-20微米、所述焦点、所述焦点+20微米及所述焦点+40微米。
在本发明的一实施例中，所述处理模组更配置用以将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到一补偿值并转换成所述补偿信号。
在本发明的一实施例中，所述曝光机镜组更包含多个镜组，配置用以同时对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线；及所述处理模组，配置用以通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
 有益效果
与现有技术相比较，本发明的对焦补偿的方法，这样不但可改善曝光机对焦的精度，还可以使得曝光机对焦考量待测物自身平整度、挠曲量，进而对曝光机的对焦进行补正，以达到改善曝光机对焦的精度。
 附图说明
为让本发明的上述内容能更明显易懂，下文特举优选实施例，并配合所附图式，作详细说明如下：
图1是本发明实施例的对焦补偿方法的流程示意图；
图2是本发明实施例对焦补偿设备的方块图；
图3是本发明实施例的对焦补偿方法的一待测物示意图；
图4是本发明实施例的对焦补偿方法量测的多个线宽曲线示意图；
图5A示出了本发明实施例的对焦补偿方法中对所述曝光机镜组的量测进行补正前的示意图；
图5B示出了本发明实施例的对焦补偿方法中对所述曝光机镜组的量测进行补正后的示意图。
 本发明的实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。再者，本发明所提到的方向用语，例如上、下、顶、底、前、后、左、右、内、外、侧面、周围、中央、水平、横向、垂直、纵向、轴向、径向、最上层或最下层等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
本文所用术语“包含”、“具有”及其词形变化是指“包含但不限于”。
本文所用术语“一”、“一个”及“至少一”包含复数引用，除非上下文另有明确规定。例如，术语“一处理模组”或“至少一处理模组”可以包含多个处理模组，包含其组合物。
本文所用术语“多个”、“数个”除另有说明外皆可选自二个、三个或以上，而“至少一个”除另有说明外皆可选自一个、二个、三个或以上。
本文中所揭露的大小及数值不应意图被理解为严格限于所述精确数值。相反的，除非另外指明，各种大小旨在表示所引用的数值以及功能上与所述数值相同的范围。例如所揭露的大小为“10微米”是指“约10微米”。
本文所用术语“可选择地”表示在一些实施例中提供，而在其它实施例中不提供。任何本发明的特定实施例可以包含多个“可选择的”特征，除非此类特征相冲突。
请参照图1所示，本发明实施例的对焦补偿的方法主要包含以下步骤：（S11）提供一曝光机镜组，具有一焦点；（S12）提供一待测物，对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值，将所述多个量测值形成至少一线宽曲线；以及（S13）依照所述至少一线宽曲线对所述曝光机镜组的一对焦作业进行补正。
本发明将于下文利用图1至图2逐一详细说明实施例上述各元件的细部构造、组装关系及其运作原理。
请参照图1、图2及图3所示，示出了本发明实施例的对焦补偿的方法及其设备中的一曝光机镜组21，例如使用于光刻工艺中的一曝光机台2中的所述曝光机镜组21，所述曝光机镜组21具有一焦点；所述曝光机台2更包含一待测物平台22，配置用以放置一待测物1。所述曝光机镜组21对所述待测物1以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值；一处理模组24，配置用以将所述多个量测值形成至少一线宽曲线，并依照所述至少一线宽曲线生成一补偿信号；及一通信模组25，配置用以将所述补偿信号传送至所述曝光机镜组21，以所述曝光机镜组21的一对焦作业进行补正。所述待测物平台22包含一高度调整机构23，配置用以将所述待测物平台22设置为不同高度。根据本发明的一个示例性实施例，所述多个不同的对焦条件为将所述待测物1置于五个焦平面（31、32、33、34及35）下，其中所述五个焦平面为：第一焦平面31位于所述焦点-40微米处、第二焦平面32位于所述焦点-20微米处、第三焦平面33位于所述焦点处、第四焦平面34位于所述焦点+20微米处及第五焦平面35位于所述焦点+40微米处。所述高度调整机构23具有五个不同高度对应于所述曝光机镜组21的所述五个焦平面上。
请参照图3所示，所述曝光机镜组21对所述待测物1以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，例如将所述待测物1置于多个不同焦平面下，量测所述待测物1上一线路的所述多个线段11的线宽。根据本发明的一个示例性实施例，当所述高度调整机构23将所述待测物平台22设置为所述第一焦平面31（即位于所述焦点-40微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11于M3处量测所述多个线宽，以得到一第一量测值。接着，通过所述高度调整机构23将所述待测物平台22设置为所述第二焦平面32（即位于所述焦点-20微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11同样于M3处量测所述多个线宽，以得到一第二量测值。然后，通过所述高度调整机构23将所述待测物平台22设置为所述第三焦平面33（即位于所述焦点处时），沿着X轴的方向上，对所述待测物1的所述多个线段11同样于M3处量测所述多个线宽，以得到一第三量测值。再来，通过所述高度调整机构23将所述待测物平台22设置为所述第四焦平面34（即位于所述焦点+20微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11同样于M3处量测所述多个线宽，以得到一第四量测值。最后，通过所述高度调整机构23将所述待测物平台22设置为所述第五焦平面35（即位于所述焦点+40微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11同样于M3处量测所述多个线宽，以得到一第五量测值。将所述多个量测值（例如，所述第一量测值、所述第二量测值、所述第三量测值、所述第四量测值及所述第五量测值）绘制成一线宽曲线。
同样参照图3所示，本发明另一个实施中，更可以对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线。例如，当所述高度调整机构23将所述待测物平台22设置为所述第一焦平面31（即位于所述焦点-40微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11于M3处量测所述多个线宽，再沿Y轴位移一距离于M4处量测所述多个线宽及最后沿Y轴位移一距离于M5处量测所述多个线宽，以得到一第一量测值。接着，通过所述高度调整机构23将所述待测物平台22设置为所述第二焦平面32（即位于所述焦点-20微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11于M3处量测所述多个线宽，再沿Y轴位移一距离于M4处量测所述多个线宽及最后沿Y轴位移一距离于M5处量测所述多个线宽，以得到一第二量测值。然后，通过所述高度调整机构23将所述待测物平台22设置为所述第三焦平面33（即位于所述焦点处时），沿着X轴的方向上，对所述待测物1的所述多个线段11于M3处量测所述多个线宽，再沿Y轴位移一距离于M4处量测所述多个线宽及最后沿Y轴位移一距离于M5处量测所述多个线宽，以得到一第三量测值。再来，通过所述高度调整机构23将所述待测物平台22设置为所述第四焦平面34（即位于所述焦点+20微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11于M3处量测所述多个线宽，再沿Y轴位移一距离于M4处量测所述多个线宽及最后沿Y轴位移一距离于M5处量测所述多个线宽，以得到一第四量测值。最后，通过所述高度调整机构23将所述待测物平台22设置为所述第五焦平面35（即位于所述焦点+40微米处时），沿着X轴的方向上，对所述待测物1的所述多个线段11于M3处量测所述多个线宽，再沿Y轴位移一距离于M4处量测所述多个线宽及最后沿Y轴位移一距离于M5处量测所述多个线宽，以得到一第五量测值。将所述多个量测值（例如，所述第一量测值、所述第二量测值、所述第三量测值、所述第四量测值及所述第五量测值）绘制成多个一线宽曲线。
请参照图4所示，示出了根据本发明对焦补偿的方法量测的多个线宽曲线示意图。根据量测到的所述多个量测值（例如，所述第一量测值、所述第二量测值、所述第三量测值、所述第四量测值及所述第五量测值）绘制成的所述多个线宽曲线（例如M3、M4及M5）。所述多个线宽曲线可以通过所述处理模组24将所述多个量测值形成所述多个线宽曲线。将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到一补偿值。所述补偿值可以通过所述处理模组24或其他的处理模组处理将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减来生成并转换成所述补偿信号。所述曝光机镜组21更可包含多个镜组，配置用以同时对所述多个线段11的多个轴线方向上的多个点（例如M3、M4及M5）量测所述多个线宽，以得到所述多个线宽曲线；及所述处理模组24，配置用以通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组21对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
请参照图5A及图5B所示，图5A示出了本发明实施例的对焦补偿方法中对所述曝光机镜组21的量测进行补正前的示意图；图5B示出了本发明实施例的对焦补偿方法中对所述曝光机镜组21的量测进行补正后的示意图。图5A中量测的线宽与实际的线宽的精度不足，所述曝光机镜组21无法达到最佳的对焦。通过所述至少一线宽曲线得到至少一补偿值，对所述曝光机镜组21的一对焦作业进行补正后，如图5B所示，线宽的量测值较接近最佳量测值，大幅提升了对焦的精度。
如上所述，相较于现有对焦补偿的方法虽能通过曝光机对多个点位计测来提高对焦的稳定性，却也常层别堆叠复杂，且自身平整度、挠曲量等参数，而导致无法提供高精度的对焦等缺点，本发明对焦补偿的方法及其设备通过在待测物上量测多个线宽以对曝光机镜组的对焦作业进行补正，其确实可以有效改善曝光机对焦的精，进而提高对焦的稳定性。
相关技术人员将理解，为简单及清楚起见，在图中所示的元件不一定按比例绘制。也就是说，在各种实施例中，图示所选择的元件以强化功能的理解及功能的设置。在市面上实施的案例中，一般容易理解且可能是有用或必需的元件，为方便以下的实施例的示意图不一定会描述。另外应了解的是，描述或描绘一方法的实施例中的某些动作及/或步骤，不一定需要以特定的顺序出现，对于本领域的技术人员而言，这样的特异性序列不一定需要。另外要了解的是，在说明书中所使用的词汇及用语皆具有一般的含义，除非本文所记载的还有其他特定的含义，不然对于这些词汇及用语皆为各自相应领域调查及研究的含义。
虽然本发明的具体实施例在本文中已经有说明及描述，但应理解的是，通过本技术领域的技术人员可利用存在的各种替代及/或等效的方式实现。应当认识到，所述示例性实施例或示例性实施例仅作为示例，并不会限制其范围、适用性或配置。相反地，前面的概述及详细描述在至少一个示例性实施例中实施而为本领域的技术人员提供方便的指示，可理解的是，在不脱离所附属的权利要求及其合法规定的范围下，一个示例性实施例中描述的元件的功能及设置可以作出各种改变，在一般情况下，本申请案涵盖本文所讨论的具体实施例的任何修改或变更。
可以理解，本发明中的特定特征，为清楚起见，在分开的实施例的内文中描述，也可以在单一实施例的组合中提供。相反地，本发明中，为简洁起见，在单一实施例的内文中所描述的各种特征，也可以分开地、或者以任何合适的子组合、或者在适用于本发明的任何其他描述的实施例中提供。在各种实施例的内文中所描述的特定特征，并不被认为是那些实施方案的必要特征，除非该实施例没有那些元素就不起作用。
虽然本发明结合其具体实施例而被描述，应该理解的是，许多替代、修改及变化对于那些本领域的技术人员将是显而易见的。因此，其意在包含落入所附权利要求书的范围内的所有替代、修改及变化。

Claims (15)

  1. 一种对焦补偿的方法，包含步骤：
    （S11）提供使用于光刻工艺中的一曝光机镜组，所述曝光机镜组具有一焦点；
    （S12）提供一待测物，对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值，将所述多个量测值形成至少一线宽曲线；以及
    （S13）通过所述至少一线宽曲线得到一补偿值，以利用所述补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的一对焦作业进行补正。
  2. 如权利要求1所述的对焦补偿的方法，其中所述多个不同的对焦条件为将所述待测物置于多个不同焦平面下，并对所述待测物进行量测所述线宽。
  3. 如权利要求2所述的对焦补偿的方法，其中所述多个不同的对焦条件为将所述待测物置于五个焦平面下，其中所述五个焦平面为所述焦点-40微米、所述焦点-20微米、所述焦点、所述焦点+20微米及所述焦点+40微米。
  4. 如权利要求3所述的对焦补偿的方法，其中所述的步骤（S12）更包含：
    将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到所述补偿值；及
    利用所述补偿值对所述曝光机镜组的所述对焦作业进行补正。
  5. 如权利要求1所述的对焦补偿的方法，其中所述的步骤（S13）更包含：
    对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线；及
    通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
  6. 一种对焦补偿的方法，包含步骤：
    （S11）提供一曝光机镜组，具有一焦点；
    （S12）提供一待测物，对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值，将所述多个量测值形成至少一线宽曲线；以及
    （S13）依照所述至少一线宽曲线对所述曝光机镜组的一对焦作业进行补正。
  7. 如权利要求6所述的对焦补偿的方法，其中所述多个不同的对焦条件为将所述待测物置于多个不同焦平面下，并对所述待测物进行量测所述线宽。
  8. 如权利要求7所述的对焦补偿的方法，其中所述多个不同的对焦条件为将所述待测物置于五个焦平面下，其中所述五个焦平面为所述焦点-40微米、所述焦点-20微米、所述焦点、所述焦点+20微米及所述焦点+40微米。
  9. 如权利要求8所述的对焦补偿的方法，其中所述的步骤（S12）更包含：
    将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到一补偿值；及
    利用所述补偿值对所述曝光机镜组的一对焦作业进行补正。
  10. 如权利要求6所述的对焦补偿的方法，其中所述的步骤（S12）更包含：
    对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线；及
    通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
  11. 一种对焦补偿的设备，包含：
    一曝光机镜组，具有一焦点；
    一待测物平台，配置用以放置一待测物，所述曝光机镜组对所述待测物以多个不同的对焦条件对多个线段的一轴线方向上的多个点进行量测多个线宽，以得到多个量测值；
    一处理模组，配置用以将所述多个量测值形成至少一线宽曲线，并依照所述至少一线宽曲线生成一补偿信号；及
    一通信模组，配置用以将所述补偿信号传送至所述曝光机镜组，以所述曝光机镜组的一对焦作业进行补正。
  12. 如权利要求11所述的对焦补偿的设备，其中所述待测物平台包含一高度调整机构，配置用以将所述待测物平台设置为不同高度，用于将所述待测物置于多个不同焦平面下，并对所述待测物进行量测所述线宽。
  13. 如权利要求12所述的对焦补偿的设备，其中所述高度调整机构具有五个不同高度对应于所述曝光机镜组的五个焦平面，所述五个焦平面分别为所述焦点-40微米、所述焦点-20微米、所述焦点、所述焦点+20微米及所述焦点+40微米。
  14. 如权利要求13所述的对焦补偿的设备，其中所述处理模组更配置用以将所述焦点处量测的一第一线宽与所述线宽曲线中的最低点处的一第二线宽相减，以得到一补偿值并转换成所述补偿信号。
  15. 如权利要求14所述的对焦补偿的设备，其中所述曝光机镜组更包含多个镜组，配置用以同时对所述多个线段的多个轴线方向上的多个点量测所述多个线宽，以得到多个线宽曲线；及
    所述处理模组，配置用以通过所述多个线宽曲线得到多个补偿值，以利用所述多个补偿值将所述曝光机镜组对所述多个线段的多个轴线方向上的多个点处的所述对焦作业进行补正。
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