WO2020048107A1 - Mechanical analysis method for mems v-beam structure under bending condition of flexible substrate - Google Patents

Mechanical analysis method for mems v-beam structure under bending condition of flexible substrate Download PDF

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WO2020048107A1
WO2020048107A1 PCT/CN2019/078321 CN2019078321W WO2020048107A1 WO 2020048107 A1 WO2020048107 A1 WO 2020048107A1 CN 2019078321 W CN2019078321 W CN 2019078321W WO 2020048107 A1 WO2020048107 A1 WO 2020048107A1
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mems
beam structure
flexible substrate
deformation
driving
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PCT/CN2019/078321
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Chinese (zh)
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韩磊
于洋
刘星
陈柳宏
吴虹剑
徐粲然
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东南大学
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    • G06F30/20Design optimisation, verification or simulation

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  • the invention relates to a mechanical analysis method, in particular to a MEMS V-beam structure mechanical analysis method based on a flexible substrate bending condition.
  • flexible electronic devices In the current wave of informatization development, flexible electronic devices have very broad application prospects in the fields of national defense, information, medical, energy and other fields due to their unique bendable ductility and their efficient and low-cost manufacturing processes.
  • Flexible electronic devices as a popular development direction of next-generation semiconductor devices, are emerging electronic technologies based on flexible / stretchable substrates. They make active / passive organic / inorganic electronic devices on flexible substrates, which have both traditional rigid electronic systems. The performance also has the unique characteristics of stretching, twisting and folding, so it has unparalleled importance and advantages in conformity, miniaturization, light weight, and intelligence for complex environmental space applications.
  • MEMS microelectromechanical systems
  • RFMEMS radio frequency fingerprinting
  • RF MEMS flexible electrowetting-semiconductor
  • Flexible devices due to their wide application prospects in airborne / spaceborne radar and IoT communication systems, have made various RF MEMS flexible actuators / sensors a hot topic in recent years.
  • RF MEMS flexible device As an RF MEMS flexible device, its primary characteristic is nothing more than its unique bendability, which is also the application basis and research motivation for the development of related flexible devices. Therefore, the bending characteristics of RF MEMS flexible devices is the scientific problem that needs to be studied most.
  • the present invention provides a MEMS V-beam structure mechanics based on complex environmental space, including a MEMS V-beam structure and a flexible substrate double deformation model. Analytical method.
  • the present invention provides a MEMS V-beam structure mechanical analysis method based on a flexible substrate bending condition, including the following steps:
  • Step 1 Establish a deformation coupling model based on the double deformation of the MEMS V-beam structure and the flexible substrate. Assume that the length of the V-beam beam is L, the initial distance between the membrane bridge and the substrate is g, and the bending radius of the flexible substrate is R. The increment of the distance between the anchor areas at both ends of the beam is:
  • Step 2 Assume that the length of a single beam in the basic unit of the V-beam structure is L, the width is w, and the thickness is t. The angle between the beam in the plane where the V-beam is located and the horizontal direction is The heat distribution of the V-beam can be calculated from the heat conduction equation as:
  • T is the temperature of the V-beam
  • I the heat generated per unit volume of the material at a certain voltage
  • V the applied voltage
  • R is the resistance
  • V R is the volume of the resistive material
  • k is the thermal conductivity
  • C p is the specific heat capacity of the material
  • is the material density.
  • the distribution of the temperature increase ⁇ T on the V-beam can be obtained from the boundary conditions as:
  • is the thermal expansion coefficient of the material.
  • the displacement of the single V-beam in the driving direction is:
  • I is the driving current to drive the MEMS V-beam.
  • Step 3 After the flexible substrate is bent, the deformation of the MEMS V-beam will cause the distance between the anchor areas at both ends to change, which in turn will cause the angle between the beam in the plane where the V-beam is located and the horizontal direction, and the middle pusher of the V-beam to recede. Affects the driving distance of the V-beam and thus the driving current of the V-beam. According to the geometric relationship, after the flexible substrate is bent, the angle between the beam in the plane where the V-beam is located and the horizontal direction changes is:
  • the retreat distance of the V-beam middle pusher is:
  • the included angle And the intermediate pusher receding distance Y ′ are brought into the driving distance formula in step 2 above, and at the same time, considering the V-beam structure intermediate pusher receding, the driving distance formula based on the MEMS V-beam structure under flexible substrate bending conditions can be obtained as :
  • the present invention provides an estimation method for the variation law of mechanical performance parameters of MEMS V-beam structure under the condition of bending deformation of flexible substrate.
  • the invention mainly takes two steps. The first step is to establish a deformation coupling model based on the double deformation of the MEMS V-beam structure and the flexible substrate. The second step is to obtain the V-beam structure / substrate based on the MEMS V-beam structure bending characteristic model. Deformation of double deformation. Based on the above parameters, the mechanical model of the MEMS V-beam structure was reconstructed, and the influence of bending deformation on the mechanical properties of the MEMS V-beam structure was analyzed.
  • the present invention establishes for the first time a deformation coupling model based on double deformation of a MEMS V-beam structure and a flexible substrate.
  • the pull-in voltage model of the MEMS V-beam structure after bending deformation is further established to realize the model characterization of the mechanical characteristics of the MEMS V-beam structure.
  • a complex environmental space-based model including the double deformation model of the V-beam structure and the flexible substrate is provided.
  • the mechanical analysis method of MEMS V-beam structure fills the gaps in domestic and foreign research on the flexible device model of MEMS V-beam structure.
  • FIG. 1 is a flowchart of the present invention
  • FIG. 2 is a structural schematic diagram of a MEMS V-beam in the present invention.
  • FIG. 3 is a comparison diagram of the analysis method, simulation and test results provided by the present invention.
  • the present invention takes an RF MEMS V-beam as an example.
  • the RF MEMS V-beam is fixedly connected to the substrate through the anchor zone 1 and the V-beam is connected to the push rod 2, 3
  • a signal transmission line provided on the substrate, 4 is a single V-shaped beam, and its length is L.
  • the parameters are taken.
  • the curvature of the substrate is gradually increased from 0 to 33.3 m -1 .
  • the present invention proposes the following technical solution.
  • Step 1 Establish a deformation coupling model based on the double deformation of the MEMS V-beam structure and the flexible substrate. Assume that the length of the V-beam beam is L, the initial distance between the membrane bridge and the substrate is g, and the bending curvature radius of the flexible substrate is R. The increment of the distance between the anchor areas at both ends of the beam is:
  • Step 2 Assume that the basic element of the V-beam structure includes multiple beams.
  • the length of a single beam is the same as the length of the V-beam.
  • the angle is The heat distribution of the V-beam can be calculated from the heat conduction equation as:
  • T is the temperature of the V-beam
  • I the heat generated in a unit volume of the material at a certain voltage
  • V the applied voltage
  • R is the resistance
  • V R is the volume of the resistive material
  • k is the thermal conductivity
  • C p is the specific heat capacity of the material
  • is the material density.
  • the distribution of the temperature increase ⁇ T on the V-beam can be obtained from the boundary conditions as:
  • is the thermal expansion coefficient of the material.
  • the displacement of the single V-beam in the driving direction is:
  • I is the driving current to drive the MEMS V-beam.
  • Step 3 After the flexible substrate is bent, the deformation of the MEMS V-beam will cause the distance between the anchor areas at both ends to change, which in turn will cause the angle between the beam in the plane where the V-beam is located and the horizontal direction, and the middle pusher of the V-beam to recede. Affects the driving distance of the V-beam and thus the driving current of the V-beam. According to the geometric relationship, after the flexible substrate is bent, the angle between the beam in the plane where the V-beam is located and the horizontal direction changes is:
  • the retreat distance of the V-beam middle pusher is:
  • the included angle And the intermediate pusher receding distance Y ′ are brought into the driving distance formula in step 2 above, and at the same time, considering the V-beam structure intermediate pusher receding, the driving distance formula based on the MEMS V-beam structure under flexible substrate bending conditions can be obtained as :
  • the present invention takes an RF MEMS V-beam as an example.
  • the material of the RF MEMS V-beam thermally driven switch beam is gold, and the flexible substrate material is liquid crystal polymer.
  • the curvature of the substrate is gradually increased from 0 to 33.3 m -1 .
  • the driving distance for applying a current of 0.6A to the V-beam structure under the bending conditions of the flexible substrate obtained by the method provided by the present invention is almost completely similar to the simulation result, and is almost completely consistent with the test result.
  • the method provided by the present invention can be applied to a complex environmental space, and includes a double deformation model of a V-beam structure and a flexible substrate, which fills a gap in the research of MEMS V-beam structure flexible device models at home and abroad.

Abstract

Disclosed in the present invention is a mechanical analysis method for a MEMS V-beam structure under a bending condition of a flexible substrate. The purpose is to provide a method for estimating a parameter variation law of mechanical properties of a V-beam structure under a bending deformation condition of a flexible substrate. The present invention mainly adopts two steps to deal with the modeling of bending characteristics of the MEMS V-beam structure under the bending condition of the flexible substrate, thereby obtaining an analytical model for the influence of the deformation of the V-beam structure on the mechanical properties of a device. One is establishing a deformation coupling model based on double deformation of the MEMS V-beam structure and the flexible substrate, and the other is obtaining a deformation amount of V-beam structure/substrate double deformation on the basis of the bending characteristic model of the MEMS V-beam structure. Based on the above parameters, the mechanical model of the MEMS V-beam structure is reconstructed, and the influence of the bending deformation on the mechanical properties of the V-beam structure is analyzed. In order to fill the gap in the research on flexible device models of MEMS V-beam structures at home and abroad, the present invention provides a mechanical analysis method for a MEMS V-beam structure comprising a double deformation model of the V-beam structure and a flexible substrate based on a complex environment space.

Description

一种基于柔性基板弯曲条件下的MEMS V型梁结构力学分析方法Mechanical analysis method of MEMS V-beam structure based on flexible substrate bending conditions 技术领域Technical field
本发明涉及一种力学分析方法,特别涉及一种基于柔性基板弯曲条件下的MEMS V型梁结构力学分析方法。The invention relates to a mechanical analysis method, in particular to a MEMS V-beam structure mechanical analysis method based on a flexible substrate bending condition.
背景技术Background technique
在当今信息化发展的浪潮中,柔性电子器件以其独特的可弯曲延展性及其高效、低成本的制造工艺,在国防、信息、医疗、能源等领域具有非常广阔的应用前景。柔性电子器件作为新一代半导体器件的热门发展方向,是建立在可弯曲/延展基板上的新兴电子技术,其将主动/被动的有机/无机电子器件制作在柔性基板上,既具有传统刚性电子系统的性能,也具有拉伸、扭曲、折叠这种独特的特性,因此在对复杂环境空间应用的保形、小型化、轻量化、智能化等方面具有无可比拟的重要性和优势。MEMS(微机电系统)柔性器件作为柔性电子器件的重要分支,其保形、高性能、小体积、智能化的传感器/执行器成为当今柔性电子系统中必不可少的组成部分,特别是RF MEMS(射频微机电系统)柔性器件,由于其在机载/星载雷达和物联网通信系统中的广泛应用前景,使得各种RF MEMS柔性执行器/传感器成为了近年来的研究热点。作为RF MEMS柔性器件,其首要特性无非是具备独特的可弯曲性,这也是相关柔性器件发展的应用基础和研究动力,因此RF MEMS柔性器件弯曲特性是最需要研究的科学问题。目前无论是基于硅基的还是基于各类柔性基板的RF MEMS柔性器件,其主要的研究内容和目的还都处于器件设计、制备和非弯曲条件下的性能测试阶段,RF MEMS柔性器件的弯曲特性建模和实验表征验证的研究目前还处于空白。然而,不管从科学研究角度还是工程应用层面,都迫切需要建立起基于柔性基板的RF MEMS器件的弯曲特性模型,以推动RF MEMS柔性器件的深入研究和开发应用。In the current wave of informatization development, flexible electronic devices have very broad application prospects in the fields of national defense, information, medical, energy and other fields due to their unique bendable ductility and their efficient and low-cost manufacturing processes. Flexible electronic devices, as a popular development direction of next-generation semiconductor devices, are emerging electronic technologies based on flexible / stretchable substrates. They make active / passive organic / inorganic electronic devices on flexible substrates, which have both traditional rigid electronic systems. The performance also has the unique characteristics of stretching, twisting and folding, so it has unparalleled importance and advantages in conformity, miniaturization, light weight, and intelligence for complex environmental space applications. As an important branch of flexible electronic devices, MEMS (microelectromechanical systems) flexible devices, its conformal, high performance, small size, and intelligent sensors / actuators have become an indispensable part of today's flexible electronic systems, especially RFMEMS. (RF MEMS) Flexible devices, due to their wide application prospects in airborne / spaceborne radar and IoT communication systems, have made various RF MEMS flexible actuators / sensors a hot topic in recent years. As an RF MEMS flexible device, its primary characteristic is nothing more than its unique bendability, which is also the application basis and research motivation for the development of related flexible devices. Therefore, the bending characteristics of RF MEMS flexible devices is the scientific problem that needs to be studied most. At present, whether it is silicon-based or various types of flexible substrate-based RF MEMS flexible devices, its main research content and purpose are still in the stage of device design, preparation, and performance testing under non-bending conditions. The bending characteristics of RF MEMS flexible devices Research on modeling and experimental characterization verification is currently blank. However, no matter from the perspective of scientific research or engineering application, it is urgent to establish a bending characteristic model of RF MEMS devices based on flexible substrates in order to promote the in-depth research and development of RF MEMS flexible devices.
发明内容Summary of the Invention
发明目的:为了填补国内外对MEMS V型梁结构柔性器件模型的研究空白,本发明提供了一种基于复杂环境空间,包含MEMS V型梁结构与柔性基板双变形模型的MEMS V型梁结构力学分析方法。Purpose of the invention: In order to fill the research gap of MEMS V-beam structure flexible device models at home and abroad, the present invention provides a MEMS V-beam structure mechanics based on complex environmental space, including a MEMS V-beam structure and a flexible substrate double deformation model. Analytical method.
技术方案:本发明提供了一种基于柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,包括以下步骤:Technical solution: The present invention provides a MEMS V-beam structure mechanical analysis method based on a flexible substrate bending condition, including the following steps:
步骤1:建立基于MEMS V型梁结构与柔性基板双变形的形变耦合模型,假设V型梁梁长为L,膜桥到基板初始间距为g,柔性基板弯曲曲率半径为R,可得V型梁两端锚区之间距离的增量为:Step 1: Establish a deformation coupling model based on the double deformation of the MEMS V-beam structure and the flexible substrate. Assume that the length of the V-beam beam is L, the initial distance between the membrane bridge and the substrate is g, and the bending radius of the flexible substrate is R. The increment of the distance between the anchor areas at both ends of the beam is:
Figure PCTCN2019078321-appb-000001
Figure PCTCN2019078321-appb-000001
步骤2:假设V型梁结构基本单元中单根梁的长度为L,宽度为w,厚度为t,V型梁所在平面内梁与水平方向的夹角为
Figure PCTCN2019078321-appb-000002
由热传导方程可计算出V型梁的热分布情况为:
Step 2: Assume that the length of a single beam in the basic unit of the V-beam structure is L, the width is w, and the thickness is t. The angle between the beam in the plane where the V-beam is located and the horizontal direction is
Figure PCTCN2019078321-appb-000002
The heat distribution of the V-beam can be calculated from the heat conduction equation as:
Figure PCTCN2019078321-appb-000003
Figure PCTCN2019078321-appb-000003
其中,T为V型梁温度,
Figure PCTCN2019078321-appb-000004
为在一定电压下材料单位体积内产生的热量,V为施加的电压,R为电阻,V R为阻性材料的体积,k为热导率,C p为材料的比热容,ρ为材料密度。假设V型梁材料单位体积内产生的热量q均为常数,且结构处于稳定状态,则上式可以简化为:
Where T is the temperature of the V-beam,
Figure PCTCN2019078321-appb-000004
Is the heat generated per unit volume of the material at a certain voltage, V is the applied voltage, R is the resistance, V R is the volume of the resistive material, k is the thermal conductivity, C p is the specific heat capacity of the material, and ρ is the material density. Assuming that the heat q generated in the unit volume of the V-beam material is constant and the structure is in a stable state, the above formula can be simplified as:
Figure PCTCN2019078321-appb-000005
Figure PCTCN2019078321-appb-000005
进一步,由边界条件可得V型梁上温度增量ΔT的分布为:Further, the distribution of the temperature increase ΔT on the V-beam can be obtained from the boundary conditions as:
Figure PCTCN2019078321-appb-000006
Figure PCTCN2019078321-appb-000006
进一步,可得V型梁在长度方向上的位移为:Further, it can be obtained that the displacement of the V-shaped beam in the length direction is:
Figure PCTCN2019078321-appb-000007
Figure PCTCN2019078321-appb-000007
其中,α为材料的热膨胀系数。Where α is the thermal expansion coefficient of the material.
进一步,带入参数可得单根V型梁在驱动方向上的位移为:Further, by taking in the parameters, the displacement of the single V-beam in the driving direction is:
Figure PCTCN2019078321-appb-000008
Figure PCTCN2019078321-appb-000008
其中,I为驱动MEMS V型梁的驱动电流。Among them, I is the driving current to drive the MEMS V-beam.
步骤3:柔性基板弯曲后,MEMS V型梁变形会导致两端锚区之间距离变化,进而导致V型梁所在平面内梁与水平方向的夹角变化,以及V型梁中间推杆后退,影响V型梁的驱动距离,从而影响V型梁的驱动电流。由几何关系可得柔性基板弯曲后,V型梁所在平面内梁与水平方向的夹角变化为:Step 3: After the flexible substrate is bent, the deformation of the MEMS V-beam will cause the distance between the anchor areas at both ends to change, which in turn will cause the angle between the beam in the plane where the V-beam is located and the horizontal direction, and the middle pusher of the V-beam to recede. Affects the driving distance of the V-beam and thus the driving current of the V-beam. According to the geometric relationship, after the flexible substrate is bent, the angle between the beam in the plane where the V-beam is located and the horizontal direction changes is:
Figure PCTCN2019078321-appb-000009
Figure PCTCN2019078321-appb-000009
进一步,由几何关系可得柔性基板弯曲后,V型梁中间推杆后退距离为:Further, from the geometric relationship, after the flexible substrate is bent, the retreat distance of the V-beam middle pusher is:
Figure PCTCN2019078321-appb-000010
Figure PCTCN2019078321-appb-000010
将得到的夹角
Figure PCTCN2019078321-appb-000011
和中间推杆后退距离Y′带入所述步骤2中驱动距离公式中,同时考虑V型梁结构中间推杆后退,可得基于柔性基板弯曲条件下的MEMS V型梁结构的驱动距离公式为:
The included angle
Figure PCTCN2019078321-appb-000011
And the intermediate pusher receding distance Y ′ are brought into the driving distance formula in step 2 above, and at the same time, considering the V-beam structure intermediate pusher receding, the driving distance formula based on the MEMS V-beam structure under flexible substrate bending conditions can be obtained as :
Figure PCTCN2019078321-appb-000012
Figure PCTCN2019078321-appb-000012
进一步,由此得到公式中驱动电流I的大小。Further, the magnitude of the driving current I in the formula is obtained from this.
工作原理:本发明为了填补国内外对MEMS V型梁结构柔性器件模型的研究空白,提供一种柔性基板弯曲变形条件下MEMS V型梁结构力学性能参数变化规律的估计方法。本发明主要采取两个步骤,第一步是建立基于MEMS V型梁结构与柔性基板双变形的形变耦合模型,第二步是基于MEMS V型梁结构弯曲特性模型,获得V型梁结构/基板双变形的形变量。通过以上参数为基础,重建MEMS V型梁结构力学模型,分析弯曲变形对MEMS V型梁结构力学性能的影响。Working principle: In order to fill the research gaps of MEMS V-beam structure flexible device models at home and abroad, the present invention provides an estimation method for the variation law of mechanical performance parameters of MEMS V-beam structure under the condition of bending deformation of flexible substrate. The invention mainly takes two steps. The first step is to establish a deformation coupling model based on the double deformation of the MEMS V-beam structure and the flexible substrate. The second step is to obtain the V-beam structure / substrate based on the MEMS V-beam structure bending characteristic model. Deformation of double deformation. Based on the above parameters, the mechanical model of the MEMS V-beam structure was reconstructed, and the influence of bending deformation on the mechanical properties of the MEMS V-beam structure was analyzed.
有益效果:与现有技术相比,本发明首次建立基于MEMS V型梁结构与柔性基板双变形的形变耦合模型。进一步建立弯曲变形后MEMS V型梁结构的吸合电压模型,实现对MEMS V型梁结构力学特性的模型表征,提供了一种基于复杂环境空间,包含V型梁结构与柔性基板双变形模型的MEMS V型梁结构力学分析方法,填补国内外对MEMS V型梁结构柔性器件模型的研究空白。Beneficial effect: Compared with the prior art, the present invention establishes for the first time a deformation coupling model based on double deformation of a MEMS V-beam structure and a flexible substrate. The pull-in voltage model of the MEMS V-beam structure after bending deformation is further established to realize the model characterization of the mechanical characteristics of the MEMS V-beam structure. A complex environmental space-based model including the double deformation model of the V-beam structure and the flexible substrate is provided. The mechanical analysis method of MEMS V-beam structure fills the gaps in domestic and foreign research on the flexible device model of MEMS V-beam structure.
附图说明BRIEF DESCRIPTION OF THE DRAWINGS
图1是本发明的流程图;Figure 1 is a flowchart of the present invention;
图2是本发明中MEMS V型梁结构示意图;2 is a structural schematic diagram of a MEMS V-beam in the present invention;
图3是本发明提供的分析方法与模拟、测试结果对比图。FIG. 3 is a comparison diagram of the analysis method, simulation and test results provided by the present invention.
具体实施方式detailed description
下面结合附图对本发明做更进一步的解释。The invention is explained further below with reference to the drawings.
如图1-2所示,本发明以RF MEMS V型梁为例,参见图,2,RF MEMS V型梁通过锚区1与衬底固支连接,V型梁连接推杆2,3为设置在衬底上的信号传输线,4为单根V型梁、其长度为L。在本实施例中对各参数取值,RF MEMS V型梁热驱动开关梁的材料为金,柔性衬底材料为液晶聚合物(LCP),MEMS V型梁结构梁的长度L=400μm,梁的宽度w=7μm,梁的厚度t=10μm,V型梁所在平面内梁与水平方向的夹角
Figure PCTCN2019078321-appb-000013
中间推杆的尺寸为长L′=355μm;宽w′=50μm,随着柔性基板逐渐弯曲,基板的曲率由0逐渐增大至33.3m -1
As shown in Figure 1-2, the present invention takes an RF MEMS V-beam as an example. Referring to FIG. 2, the RF MEMS V-beam is fixedly connected to the substrate through the anchor zone 1 and the V-beam is connected to the push rod 2, 3 A signal transmission line provided on the substrate, 4 is a single V-shaped beam, and its length is L. In this embodiment, the parameters are taken. The material of the RF MEMS V-beam thermally driven switch beam is gold, the flexible substrate material is liquid crystal polymer (LCP), the length of the MEMS V-beam structure beam is L = 400 μm, and the beam The width w = 7μm, the thickness of the beam t = 10μm, the angle between the beam in the plane where the V-beam is located and the horizontal direction
Figure PCTCN2019078321-appb-000013
The size of the intermediate pusher is L ′ = 355 μm; width w ′ = 50 μm. As the flexible substrate is gradually bent, the curvature of the substrate is gradually increased from 0 to 33.3 m -1 .
为了研究柔性基板发生弯曲后,对MEMS V型梁结构力学性能的影响,本发明提出如下技术方案。In order to study the influence of the flexible substrate on the mechanical properties of the MEMS V-beam structure after bending, the present invention proposes the following technical solution.
具体步骤如下所示:The specific steps are as follows:
步骤1:建立基于MEMS V型梁结构与柔性基板双变形的形变耦合模型,假设V型梁梁长为L,膜桥到基板初始间距为g,柔性基板弯曲曲率半径为R,可得V型梁两端锚区之间距离的增量为:Step 1: Establish a deformation coupling model based on the double deformation of the MEMS V-beam structure and the flexible substrate. Assume that the length of the V-beam beam is L, the initial distance between the membrane bridge and the substrate is g, and the bending curvature radius of the flexible substrate is R. The increment of the distance between the anchor areas at both ends of the beam is:
Figure PCTCN2019078321-appb-000014
Figure PCTCN2019078321-appb-000014
其中,
Figure PCTCN2019078321-appb-000015
为V型梁所在平面内梁与水平方向的夹角。
among them,
Figure PCTCN2019078321-appb-000015
The angle between the beam in the plane where the V-beam is located and the horizontal direction.
步骤2:假设V型梁结构基本单元中包括多根梁,单根梁的长度与V型梁的长度一致、为L,宽度为w,厚度为t,V型梁所在平面内梁与水平方向的夹角为
Figure PCTCN2019078321-appb-000016
由热传导方程可计算出V型梁的热分布情况为:
Step 2: Assume that the basic element of the V-beam structure includes multiple beams. The length of a single beam is the same as the length of the V-beam. The angle is
Figure PCTCN2019078321-appb-000016
The heat distribution of the V-beam can be calculated from the heat conduction equation as:
Figure PCTCN2019078321-appb-000017
Figure PCTCN2019078321-appb-000017
其中,T为V型梁温度,
Figure PCTCN2019078321-appb-000018
是在一定电压下材料单位体积内产生的热量,V 为施加的电压,R为电阻,V R为阻性材料的体积,k为热导率,C p为材料的比热容,ρ为材料密度。假设V型梁材料单位体积内产生的热量q均为常数,且结构处于稳定状态,则上式可以简化为:
Where T is the temperature of the V-beam,
Figure PCTCN2019078321-appb-000018
Is the heat generated in a unit volume of the material at a certain voltage, V is the applied voltage, R is the resistance, V R is the volume of the resistive material, k is the thermal conductivity, C p is the specific heat capacity of the material, and ρ is the material density. Assuming that the heat q generated in the unit volume of the V-beam material is constant and the structure is in a stable state, the above formula can be simplified as:
Figure PCTCN2019078321-appb-000019
Figure PCTCN2019078321-appb-000019
进一步,由边界条件可得V型梁上温度增量ΔT的分布为:Further, the distribution of the temperature increase ΔT on the V-beam can be obtained from the boundary conditions as:
Figure PCTCN2019078321-appb-000020
Figure PCTCN2019078321-appb-000020
进一步,可得V型梁在长度方向上的位移为:Further, it can be obtained that the displacement of the V-shaped beam in the length direction is:
Figure PCTCN2019078321-appb-000021
Figure PCTCN2019078321-appb-000021
其中,α为材料的热膨胀系数。Where α is the thermal expansion coefficient of the material.
进一步,带入参数可得单根V型梁在驱动方向上的位移为:Further, by taking in the parameters, the displacement of the single V-beam in the driving direction is:
Figure PCTCN2019078321-appb-000022
Figure PCTCN2019078321-appb-000022
其中,I为驱动MEMS V型梁的驱动电流。Among them, I is the driving current to drive the MEMS V-beam.
步骤3:柔性基板弯曲后,MEMS V型梁变形会导致两端锚区之间距离变化,进而导致V型梁所在平面内梁与水平方向的夹角变化,以及V型梁中间推杆后退,影响V型梁的驱动距离,从而影响V型梁的驱动电流。由几何关系可得柔性基板弯曲后,V型梁所在平面内梁与水平方向的夹角变化为:Step 3: After the flexible substrate is bent, the deformation of the MEMS V-beam will cause the distance between the anchor areas at both ends to change, which in turn will cause the angle between the beam in the plane where the V-beam is located and the horizontal direction, and the middle pusher of the V-beam to recede. Affects the driving distance of the V-beam and thus the driving current of the V-beam. According to the geometric relationship, after the flexible substrate is bent, the angle between the beam in the plane where the V-beam is located and the horizontal direction changes is:
Figure PCTCN2019078321-appb-000023
Figure PCTCN2019078321-appb-000023
进一步,由几何关系可得柔性基板弯曲后,V型梁中间推杆后退距离为:Further, from the geometric relationship, after the flexible substrate is bent, the retreat distance of the V-beam middle pusher is:
Figure PCTCN2019078321-appb-000024
Figure PCTCN2019078321-appb-000024
将得到的夹角
Figure PCTCN2019078321-appb-000025
和中间推杆后退距离Y′带入所述步骤2中驱动距离公式中,同时考虑V型梁结构中间推杆后退,可得基于柔性基板弯曲条件下的MEMS V型梁结构的驱动距离公式为:
The included angle
Figure PCTCN2019078321-appb-000025
And the intermediate pusher receding distance Y ′ are brought into the driving distance formula in step 2 above, and at the same time, considering the V-beam structure intermediate pusher receding, the driving distance formula based on the MEMS V-beam structure under flexible substrate bending conditions can be obtained as :
Figure PCTCN2019078321-appb-000026
Figure PCTCN2019078321-appb-000026
进一步,由此得到公式中驱动电流I的大小。Further, the magnitude of the driving current I in the formula is obtained from this.
如图2所示,本发明以RF MEMS V型梁为例,在本实施例中对各参数取值,RF MEMS V型梁热驱动开关梁的材料为金,柔性衬底材料为液晶聚合物(LCP),MEMS V型梁结构梁的长度L=400μm,梁的宽度w=7μm,梁的厚度t=10μm,V型梁所在平面内梁与水平方向的夹角
Figure PCTCN2019078321-appb-000027
中间推杆的尺寸为长L′=355μm;宽w′=50μm,随着柔性基板逐渐弯曲,基板的曲率由0逐渐增大至33.3m -1。采用本发明提供的方法分析获得的基于柔性基板弯曲条件下V型梁结构施加0.6A电流的驱动距离与模拟的结果几乎完全相似,并且与测试结果几乎完全吻合。本发明提供的方法可以应用于复杂环境空间,包含V型梁结构与柔性基板双变形模型,填补国内外对MEMS V型梁结构柔性器件模型的研究空白。
As shown in FIG. 2, the present invention takes an RF MEMS V-beam as an example. In this embodiment, parameters are set. The material of the RF MEMS V-beam thermally driven switch beam is gold, and the flexible substrate material is liquid crystal polymer. (LCP), the length of the MEMS V-beam structure beam is L = 400μm, the width of the beam is w = 7μm, the thickness of the beam is t = 10μm, the angle between the beam in the plane where the V-beam is located and the horizontal direction
Figure PCTCN2019078321-appb-000027
The size of the intermediate pusher is L ′ = 355 μm; width w ′ = 50 μm. As the flexible substrate is gradually bent, the curvature of the substrate is gradually increased from 0 to 33.3 m -1 . The driving distance for applying a current of 0.6A to the V-beam structure under the bending conditions of the flexible substrate obtained by the method provided by the present invention is almost completely similar to the simulation result, and is almost completely consistent with the test result. The method provided by the present invention can be applied to a complex environmental space, and includes a double deformation model of a V-beam structure and a flexible substrate, which fills a gap in the research of MEMS V-beam structure flexible device models at home and abroad.
以上所述仅为本发明的较佳实施方式,本发明的保护范围并不以上述实施方式为限,但凡本领域普通技术人员根据本发明所揭示内容所作的等效修饰或变化,皆应纳入权利要求书中记载的保护范围内。The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. Any equivalent modification or change made by a person of ordinary skill in the art based on the disclosure of the present invention should be included Within the scope of protection described in the claims.

Claims (7)

  1. 一种基于柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,其特征在于:包括以下步骤:A mechanical analysis method of a MEMS V-beam structure based on a flexible substrate bending condition is characterized in that it includes the following steps:
    建立基于RF MEMS V型梁结构与柔性基板双变形的形变耦合模型;所述RF MEMS V型梁结构通过固支锚区与所述柔性基板相连接;Establishing a deformation coupling model based on the double deformation of the RF MEMS V-beam structure and the flexible substrate; the RF MEMS V-beam structure is connected to the flexible substrate through a fixed anchor area;
    基于所述形变耦合模型:所述柔性基板弯曲变形后,获取所述RF MEMS V型梁结构夹角变化量和中间推杆后退距离;Based on the deformation coupling model: after the flexible substrate is bent and deformed, obtaining an angle change amount of the RF MEMS V-beam structure and a receding distance of the intermediate push rod;
    基于所述柔性基板变形后的参数值,重建RF MEMS V型梁结构的力学特性模型;Reconstructing a mechanical characteristic model of the RF MEMS V-beam structure based on the parameter values after the flexible substrate is deformed;
    基于所述重建的RF MEMS V型梁结构的力学特性模型,获取柔性基板弯曲对RF MEMS V型梁结构力学特性的影响。Based on the reconstructed mechanical characteristic model of the RF MEMS V-shaped beam structure, the influence of the flexible substrate bending on the mechanical characteristics of the RF MEMS V-shaped beam structure is obtained.
  2. 根据权利要求1所述的柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,其特征在于:The mechanical analysis method of a MEMS V-beam structure under flexible substrate bending conditions according to claim 1, wherein:
    基于MEMS V型梁结构与柔性基板双变形的形变耦合模型,所述V型梁两端锚区之间的距离的增量X为:Based on the deformation coupling model of the double deformation of the MEMS V-beam structure and the flexible substrate, the increment X of the distance between the anchor areas at both ends of the V-beam is:
    Figure PCTCN2019078321-appb-100001
    Figure PCTCN2019078321-appb-100001
    其中,L为V型梁梁长,g为V型梁膜桥到基板初始间距,R柔性基板弯曲曲率半径,
    Figure PCTCN2019078321-appb-100002
    为V型梁所在平面内梁与水平方向的夹角。
    Among them, L is the length of the V-beam beam, g is the initial distance from the V-beam membrane bridge to the substrate, and the radius of curvature of the flexible substrate bending curvature
    Figure PCTCN2019078321-appb-100002
    The angle between the beam in the plane where the V-beam is located and the horizontal direction.
  3. 根据权利要求1或2所述的柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,其特征在于:The mechanical analysis method of a MEMS V-beam structure under flexible substrate bending conditions according to claim 1 or 2, wherein:
    所述MEMS V型梁被热驱动后,驱动中间推杆向前位移实现开关吸合;获取所述MEMS V型梁结构在驱动方向上的位移。After the MEMS V-shaped beam is thermally driven, the middle push rod is driven to move forward to realize the switch pull-in; and the displacement of the MEMS V-shaped beam structure in the driving direction is obtained.
  4. 根据权利要求3所述的柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,其特征在于:所述MEMS V型梁结构在驱动方向上的位移为:The mechanical analysis method for a MEMS V-beam structure under flexible substrate bending conditions according to claim 3, wherein the displacement of the MEMS V-beam structure in the driving direction is:
    Figure PCTCN2019078321-appb-100003
    Figure PCTCN2019078321-appb-100003
    其中,I为驱动MEMS V型梁的驱动电流,α为材料的热膨胀系数,ρ为材料密度,k为热导率,L为V型梁结构基本单元中单根梁的长度、w为宽度、t为厚度。Among them, I is the driving current driving the MEMS V-beam, α is the thermal expansion coefficient of the material, ρ is the material density, k is the thermal conductivity, L is the length of a single beam in the basic unit of the V-beam structure, w is the width, t is the thickness.
  5. 根据权利要求1或2所述的柔性基板弯曲条件下的MEMS V型梁结构力学分析 方法,其特征在于:所述柔性基板弯曲变形后,导致MEMS V型梁两端锚区之间距离变化,进而导致V型梁所在平面内梁与水平方向的夹角变化,以及V型梁中间推杆后退,影响V型梁的驱动距离,从而影响V型梁的驱动电流。The method for mechanically analyzing a MEMS V-beam structure under flexible substrate bending conditions according to claim 1 or 2, characterized in that after the flexible substrate is bent and deformed, the distance between the anchor regions at both ends of the MEMS V-beam is changed, In addition, the angle between the beam in the plane where the V-beam is located and the horizontal direction changes, and the middle pusher of the V-beam recedes, which affects the driving distance of the V-beam and thus the driving current of the V-beam.
  6. 根据权利要求5所述的柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,其特征在于:获取所述柔性基板弯曲变形后的MEMS V型梁结构夹角和中间推杆后退距离,并根据驱动距离公式,得到基于柔性基板弯曲条件下的MEMS V型梁结构的力学特性包括测试所述V型梁的驱动距离。The method for mechanically analyzing a MEMS V-beam structure under a flexible substrate bending condition according to claim 5, characterized in that: acquiring the included angle of the MEMS V-beam structure after the flexible substrate is bent and deformed, and the intermediate pusher receding distance, and According to the driving distance formula, obtaining the mechanical characteristics of the MEMS V-beam structure based on the flexure of the flexible substrate includes testing the driving distance of the V-beam.
  7. 根据权利要求6所述的柔性基板弯曲条件下的MEMS V型梁结构力学分析方法,其特征在于:所述驱动距离公式为:The mechanical analysis method of a MEMS V-beam structure under flexible substrate bending conditions according to claim 6, wherein the driving distance formula is:
    Figure PCTCN2019078321-appb-100004
    Figure PCTCN2019078321-appb-100004
    其中,⊿Y为MEMS V型梁结构在驱动方向上的位移,I为驱动MEMS V型梁的驱动电流,α为材料的热膨胀系数,ρ为材料密度,k为热导率,L为V型梁结构基本单元中单根梁的长度、w为宽度、t为厚度。Among them, ⊿Y is the displacement of the MEMS V-beam structure in the driving direction, I is the driving current driving the MEMS V-beam, α is the thermal expansion coefficient of the material, ρ is the material density, k is the thermal conductivity, and L is the V-shape. The length, w is the width and t is the thickness of a single beam in the basic unit of a beam structure.
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